TW201709386A - Wafer container - Google Patents
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- TW201709386A TW201709386A TW105109426A TW105109426A TW201709386A TW 201709386 A TW201709386 A TW 201709386A TW 105109426 A TW105109426 A TW 105109426A TW 105109426 A TW105109426 A TW 105109426A TW 201709386 A TW201709386 A TW 201709386A
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Abstract
一種前部開口晶片容器具有一容器部及一門,該門之尺寸大小適合閉合該容器部之一開口前部。該容器部具有用於固持複數個晶片且界定一擱架安放位置之複數個擱架,並且具有一前向晶片支撐件及一後向晶片支撐件,以將複數個晶片以處於該擱架安放位置上方之一運輸安放位置懸置於該前向晶片支撐件與該後向晶片支撐件之間。鄰近該等晶片之該運輸安放位置配置有複數個衝擊狀態突伸部,以用於在一衝擊狀態期間保護該等晶片。該等突伸部可與前門之底架及該容器部之後壁成整體。 A front open wafer container has a container portion and a door sized to close an open front portion of the container portion. The container portion has a plurality of shelves for holding a plurality of wafers and defining a shelf seating position, and has a forward wafer support and a rear wafer support for placing a plurality of wafers in the shelf A transport placement location above the location is suspended between the forward wafer support and the rear wafer support. The transport location adjacent the wafers is provided with a plurality of impact state protrusions for protecting the wafers during an impact condition. The projections may be integral with the underframe of the front door and the rear wall of the container portion.
Description
本申請案主張2015年3月25日提出申請之第62/138,229號美國臨時專利申請案之優先權,該美國臨時專利申請案之揭露內容以引用方式全文併入本文中。 The present application claims priority to U.S. Provisional Patent Application Serial No. Ser.
半導體晶片被加工成積體電路晶片。在晶片自原始製造商運輸至製作設施期間及在製作設施中之加工步驟中,用晶片容器來固持晶片。該等晶片經歷數十個或數百個加工步驟才能成為最終積體電路產品。該等晶片極其易碎且昂貴。晶片所經歷之加工步驟愈多,投入即愈大,晶片之價值即愈大,且若受到損壞損失即愈大。 The semiconductor wafer is processed into an integrated circuit wafer. The wafer container is used to hold the wafer during the processing of the wafer from the original manufacturer to the fabrication facility and during the processing steps in the fabrication facility. These wafers undergo tens or hundreds of processing steps to become the final integrated circuit product. These wafers are extremely fragile and expensive. The more processing steps a wafer undergoes, the greater the input, the greater the value of the wafer, and the greater the loss if damaged.
晶片可具有各種大小、最高達300毫米之直徑,且正在開發用於加工450毫米晶片之設備。在運輸裝有晶片之容器期間及在晶片裝載及卸載步驟期間以及在將晶片封閉期間,皆需要晶片容器來保護晶片免受污染及損壞。該等晶片通常被支撐於僅藉由晶片之邊緣來支撐晶片之容器中。特別用於300毫米晶片之晶片容器稱為FOUP及FOSB,其係為「front opening unified pod(前開式統一標準盒)」及「front opening shipping box(前開式運輸盒)」之縮寫字。此等前部開口容器具有一前部開口容器部及一 門,該門閉合前部開口且閂鎖至該容器部上。晶片係藉由容器部中的被定位於容器之二個側處之擱架支撐。該等晶片亦由晶片支撐件(亦稱為晶片限動裝置(restraint))進行前向及後向支撐,其中晶片邊緣安放於前向支撐件及後向支撐件中之複數個V形或U形凹槽中,且該等支撐件在前向邊緣及後向邊緣上提供一壓縮力。該等晶片支撐件可係為具有複數個薄聚合物彈簧之緩衝墊,該等聚合物彈簧連接至複數個晶片邊緣嚙合部以對晶片邊緣提供彈性支撐。在前開式統一標準盒中,晶片在裝運期間將通常被抬離擱架且僅由前向支撐件及後向支撐件支撐。該等晶片邊緣嚙合部係為「彈簧支撐式」。依據行業慣例,對前開式統一標準盒及前開式運輸盒應用一x-y-z座標系,其中插入方向及抽出方向與z方向相關聯,垂直方向與y方向相關聯,且橫向方向、左方向及右方向與x方向相關聯。在裝運時,可將前開式運輸盒向後旋轉90度以使晶片垂直懸置於前向晶片支撐件與後向晶片支撐件之間。 Wafers can be of various sizes up to 300 mm in diameter and devices are being developed for processing 450 mm wafers. Wafer containers are required to protect the wafer from contamination and damage during transport of the wafer containing container and during the wafer loading and unloading steps and during wafer sealing. The wafers are typically supported in a container that supports the wafer only by the edges of the wafer. The wafer containers used in particular for 300 mm wafers are called FOUP and FOSB, which are abbreviations of "front opening unified pod" and "front opening shipping box". The front open container has a front open container portion and a door that closes the front opening and latches onto the container portion. The wafer is supported by a shelf in the container portion that is positioned at the two sides of the container. The wafers are also supported forward and backward by a wafer support (also referred to as a wafer restraint), wherein the wafer edges are placed in a plurality of V-shaped or U-shaped members in the forward and backward supports. The shaped grooves provide a compressive force on the forward and rear edges. The wafer support can be a cushion having a plurality of thin polymer springs coupled to a plurality of wafer edge engagement portions to provide resilient support to the wafer edges. In a front open unified standard box, the wafer will typically be lifted off the shelf during shipment and supported only by the forward and rear supports. The wafer edge engaging portions are "spring supported". According to industry practice, an xyz coordinate system is applied to the front open unified standard box and the front open transport box, wherein the insertion direction and the extraction direction are associated with the z direction, the vertical direction is associated with the y direction, and the lateral direction, the left direction and the right direction are associated. Associated with the x direction. At the time of shipment, the front open transport case can be rotated 90 degrees rearward to vertically hang the wafer between the forward wafer support and the backward wafer support.
來自消費者及產品製造商之需求、以及製造效率已推動了積體電路尺寸及厚度之縮減。此在晶片加工層面係由「電路密度」之增加及厚度之減小反映出。特別係對於大尺寸(例如300毫米)晶片,厚度之減小相當於對保護晶片之需求更大,特別係在運輸已裝載晶片容器期間。舉例而言,較薄晶片在衝擊狀態期間之偏轉將大於較厚晶片且具有一更大易碎性。此對前向支撐件及後向支撐件產生更大需求。舉例而言,其可能需要更大的朝向及遠離晶片(z方向)之移動範圍且需要進行更謹慎支撐,此包含需使對晶片之壓縮力更小。 Demand from consumer and product manufacturers, as well as manufacturing efficiencies, have driven the reduction in size and thickness of integrated circuits. This is reflected in the wafer processing level by the increase in "circuit density" and the decrease in thickness. In particular for large size (e.g., 300 mm) wafers, the reduction in thickness is equivalent to the need to protect the wafer, particularly during shipping of the loaded wafer container. For example, a thinner wafer will deflect more during the impact state than a thicker wafer and have a greater friability. This creates greater demand for the forward and backward supports. For example, it may require a larger orientation and a range of movement away from the wafer ( z- direction) and require more careful support, including the need to make the compression force on the wafer smaller.
一般而言,在前部開口晶片容器中,為有效地支撐較薄晶片而對前向晶片支撐件及/或後向晶片支撐件能力所作之改良將深受歡迎。此 外,為在衝擊狀態中預防晶片之損壞及交叉槽所作之晶片支撐改良亦將深受歡迎。 In general, improvements in the ability of the forward wafer support and/or the backward wafer support to effectively support thinner wafers are preferred in front open wafer containers. this In addition, improvements in wafer support for preventing wafer damage and intersecting grooves in an impact state will also be popular.
人們總是希望找到具有成本效益且提供最佳效能之解決方案。因增強之緩衝系統過於昂貴或會產生其他問題(例如難以清潔),故此等解決方案又不那麼合意。 People always want to find solutions that are cost effective and provide the best performance. These solutions are less desirable because the enhanced buffer system is too expensive or can cause other problems (such as difficulty cleaning).
最近,不能夠有效地自身進行支撐之極薄晶片被接合至一載體基板,俾使該等極薄晶片能夠被加工及搬運。因此,「接合式晶片(bonded晶片)」具有一載體基板側及載體基板面以及一經薄化晶片側及經薄化晶片面。在此等接合式晶片中,極薄晶片最後被自載體基板分離,之後最終變成積體電路。可支撐載體基板之邊緣,以使經薄化晶片邊緣相對於載體基板邊緣向內偏移。需要特別用以支撐及保護此等接合式晶片之前向晶片支撐件及/或後向晶片支撐件。 Recently, extremely thin wafers that cannot be effectively supported by themselves are bonded to a carrier substrate so that the extremely thin wafers can be processed and handled. Therefore, a "bonded wafer" has a carrier substrate side and a carrier substrate surface, and a thinned wafer side and a thinned wafer surface. In such bonded wafers, the very thin wafer is finally separated from the carrier substrate and then eventually becomes an integrated circuit. The edges of the carrier substrate can be supported such that the thinned wafer edges are offset inward relative to the edges of the carrier substrate. It is particularly desirable to support and protect such bonded wafers to the wafer support and/or the back wafer support.
一種前部開口晶片容器包含一容器部(container portion)及一門部,該容器部具有複數個內部擱架及位於一後壁處或位於該等晶片擱架之後向部處之一後向晶片邊緣支撐件。前門之尺寸大小適合被接納於開口前部中及閂鎖至容器部,且該前門具有一門底架,其中一可拆卸前向主要晶片支撐件設置於該門之內表面上。各該晶片支撐件具有二行懸伸彈簧指狀部,各該指狀部具有一晶片邊緣接納部,該晶片邊緣接納部具有一V形凹槽。該等彈簧指狀部各自連接至一基礎部,該基礎部附裝至前門之內表面。當門被閂鎖至容器部上時,前向晶片支撐件對容器中之晶片提供一壓縮力,藉以使該等晶片在該等V形凹槽內被以一主要運輸安放位置(primary transport seating position)保持於一第一晶片邊緣嚙合部中,該第一晶片邊 緣嚙合部係由一第一聚合物形成。在某些實施例中,一第二晶片嚙合部定位於該二行懸伸彈簧部中間。該第二晶片嚙合部包含複數個突伸部,各該突伸部呈一線性對準且各該突伸部定位於由該等V形凹槽所界定之槽中間。該等突伸部被定位成預防晶片在一衝擊狀態或其他可能會將晶片驅出其各自之V形凹槽及驅出運輸安放位置之狀態中自該等凹槽脫離。在某些實施例中,該第二晶片嚙合部係由較第一晶片支撐件之聚合物軟之一聚合物形成。該衝擊狀態緩衝墊可係為一彈性材料,且可具有一I形狀。在某些實施例中,該第二晶片嚙合部具有附裝至前向主要晶片支撐件之一垂直條帶,且該等突伸部係自該垂直條帶延伸出。該條帶可用以當晶片在V形凹槽中處於其正常運輸安放位置時嚙合該等晶片。或者,該條帶可用以當晶片在V形凹槽中處於其正常運輸安放位置時不嚙合該等晶片。該前部開口容器可係為一300毫米前開式運輸盒(稱為一「FOSB」),俾使在晶片被水平裝載之後,門被應用及閂鎖,且容器被向後旋轉90度,使得晶片被垂直定向以用於裝運。 A front open wafer container includes a container portion and a door portion having a plurality of inner shelves and a rear wall or a rearward facing wafer edge at or behind the wafer shelves supporting item. The front door is sized to be received in the front of the opening and latched to the container portion, and the front door has a door chassis with a detachable forward main wafer support disposed on the inner surface of the door. Each of the wafer supports has two rows of overhanging spring fingers, each of the fingers having a wafer edge receiving portion having a V-shaped recess. The spring fingers are each connected to a base portion that is attached to the inner surface of the front door. When the door is latched onto the container portion, the forward wafer support provides a compressive force to the wafer in the container whereby the wafer is placed in the V-shaped recess in a primary transport seating position (primary transport seating) Positioned in a first wafer edge engagement portion, the first wafer edge The rim meshing portion is formed of a first polymer. In some embodiments, a second wafer engagement portion is positioned intermediate the two rows of overhanging spring portions. The second wafer engaging portion includes a plurality of protrusions, each of the protrusions being linearly aligned and each of the protrusions being positioned intermediate the groove defined by the V-shaped grooves. The projections are positioned to prevent the wafer from escaping from the grooves in an impact state or other state in which the wafers may be driven out of their respective V-shaped grooves and ejected from the transport position. In some embodiments, the second wafer engagement portion is formed from a polymer softer than the first wafer support. The impact state cushion can be an elastic material and can have an I shape. In some embodiments, the second wafer engagement portion has a vertical strip attached to one of the forward main wafer supports, and the projections extend from the vertical strip. The strip can be used to engage the wafers when they are in their normal transport position in the V-shaped grooves. Alternatively, the strip can be used to not engage the wafers when they are in their normal transport position in the V-groove. The front open container can be a 300 mm front open transport case (referred to as a "FOSB") so that after the wafer is horizontally loaded, the door is applied and latched, and the container is rotated 90 degrees backward to make the wafer Oriented vertically for shipment.
在特別適用於接合式晶片之各種實施例中,晶片邊緣接納部界定V形凹槽且具有一邊緣安放位置,該邊緣安放位置位於凹槽之最底部區域處並界定一運輸安放位置,且一第二晶片嚙合部相對於該運輸安放位置移置且係由較主要位置處之材料軟之一材料形成。在本發明之某些實施例中,V形前向晶片支撐件或V形後向晶片支撐件具有一第一表面,該第一表面與接合式晶片之載體基板側形成一第一夾角且與經薄化晶片側形成一第二夾角。該第二夾角大於該第一夾角。在某些實施例中,晶片邊緣接納凹槽在一端視圖或剖視圖中具有四個支腿,各該支腿對應於該凹槽之一表面或一面。該晶片邊緣接納凹槽具有:一第一支腿,面對載體基板面,該第一支腿連接至一第二支腿,其中接合處界定一最深接納區域;該第二支腿, 面對經薄化晶片面;以及一第三支腿,連接至該第二支腿且亦面對經薄化晶片面,該第二支腿與該第三支腿之接合處界定一衝擊事件限制區域。在某些實施例中,後向晶片支撐件具有二行晶片嚙合部,該等晶片嚙合部具有帶四個支腿(及面)之晶片邊緣接納凹槽。在某些實施例中,晶片邊緣接納部並非係依靠指狀物彈動,亦即,該等接納部並非由各該晶片嚙合部之離散彈簧構件支撐。 In various embodiments particularly suitable for use in a bonded wafer, the wafer edge receiving portion defines a V-shaped groove and has an edge placement location at a bottommost region of the groove and defining a transport placement location, and The second wafer engagement portion is displaced relative to the transport mounting position and is formed from a material that is softer than the material at the primary location. In some embodiments of the invention, the V-shaped forward wafer support or the V-shaped rearward wafer support has a first surface that forms a first angle with the carrier substrate side of the bonded wafer and A second angle is formed on the side of the thinned wafer. The second angle is greater than the first angle. In some embodiments, the wafer edge receiving groove has four legs in an end view or a cross-sectional view, each leg corresponding to one surface or one side of the groove. The wafer edge receiving recess has a first leg facing the carrier substrate surface, the first leg being coupled to a second leg, wherein the joint defines a deepest receiving area; the second leg, Facing the thinned wafer face; and a third leg connected to the second leg and also facing the thinned wafer face, the junction of the second leg and the third leg defining an impact event Restricted area. In some embodiments, the rear wafer support has two rows of wafer engaging portions having wafer edge receiving recesses with four legs (and faces). In some embodiments, the wafer edge receiving portion does not rely on the fingers to spring, that is, the receiving portions are not supported by discrete spring members of each of the wafer engaging portions.
在某些實施例中,一種晶片容器具有複數個晶片嚙合部,各該晶片嚙合部具有一第一面及一第二面,該第一面與該第二面在一接合處連接以界定用於一接合式晶片之一晶片邊緣接納凹槽,該接合式晶片具有一載體基板側表面及一經薄化晶片側表面,當該接合式晶片安放於該晶片邊緣接納凹槽中時,該第一面與該載體基板側表面界定一第一會聚區域,且該第二面與該經薄化晶片側表面界定一第二會聚區域。該第一會聚區域較該第二會聚區域「更尖」且「更窄」。該第二會聚區域較該第一會聚區域「更鈍」且「更寬」。該等晶片嚙合部可係由剛性聚合物(例如聚碳酸酯)形成。 In some embodiments, a wafer container has a plurality of wafer engaging portions, each of the wafer engaging portions having a first surface and a second surface, the first surface and the second surface being joined at a joint for defining Receiving a groove at a wafer edge of a bonded wafer, the bonded wafer having a carrier substrate side surface and a thinned wafer side surface, the first being mounted when the bonded wafer is received in the wafer edge receiving recess The face defines a first converging region with the carrier substrate side surface, and the second face and the thinned wafer side surface define a second converging region. The first converging area is "sharp" and "narrower" than the second converging area. The second converging area is "blurred" and "wider" than the first converging area. The wafer engaging portions may be formed of a rigid polymer such as polycarbonate.
在某些實施例中,一種接合式晶片容器具有複數個晶片嚙合部,各該晶片嚙合部具有一凹槽,該凹槽具有一第一邊沿(margin)及一第二邊沿,其中各該第一邊沿面對該凹槽中所接納之一晶片之一基板載體側,且該第二邊沿面對該凹槽之一經薄化晶片側,該晶片邊緣接納部在高度上被定位成距該第一邊沿較距該第二邊沿更近,藉此在一衝擊狀態中為接合式晶片之經薄化晶片側提供更大空隙。在某些實施例中,在一正常運輸安放位置之外設置有被構形為衝擊狀態晶片嚙合部之複數個輔助晶片嚙合部,以在一衝擊狀態中嚙合接合式晶片。在某些實施例中,該等輔助晶 片嚙合部與接合式晶片達成一彈性嚙合。 In some embodiments, a bonded wafer container has a plurality of wafer engaging portions, each of the wafer engaging portions having a groove having a first margin and a second edge, wherein each of the first One side of the wafer carrier side facing one of the wafers received in the recess, and the second edge facing the one of the recesses through the thinned wafer side, the wafer edge receiving portion being positioned in height from the first One side is closer to the second edge, thereby providing a larger gap for the thinned wafer side of the bonded wafer in an impact state. In some embodiments, a plurality of auxiliary wafer engaging portions configured to be in an impact state wafer engaging portion are disposed outside a normal transport seating position to engage the bonded wafer in an impact state. In some embodiments, the auxiliary crystals The sheet engaging portion achieves a resilient engagement with the mating wafer.
在本發明之各種實施例中,一種前部開口晶片容器具有相對於一晶片運輸安放位置軸向移置之複數個衝擊狀態晶片嚙合部。在本發明之某些實施例中,一種前部開口晶片容器具有除在一衝擊狀態中以外不嚙合晶片之複數個衝擊狀態晶片嚙合部。在本發明之某些實施例中,一種前部開口晶片容器具有由彈簧指狀物支撐之複數個衝擊狀態晶片嚙合部。在本發明之某些實施例中,一種前部開口晶片容器具有係為彈性之複數個衝擊狀態晶片嚙合部。在本發明之某些實施例中,一種前部開口晶片容器具有複數個衝擊狀態晶片嚙合部,且該等衝擊狀態晶片嚙合部各自之相關聯主要嚙合部係藉由彼此上下包覆模製而形成。 In various embodiments of the invention, a front open wafer container has a plurality of impact state wafer engaging portions axially displaced relative to a wafer transport mounting position. In some embodiments of the invention, a front open wafer container has a plurality of impact state wafer engaging portions that do not engage the wafer except in an impact state. In some embodiments of the invention, a front open wafer container has a plurality of impact state wafer engaging portions supported by spring fingers. In some embodiments of the invention, a front open wafer container has a plurality of impact state wafer engaging portions that are elastic. In some embodiments of the present invention, a front open wafer container has a plurality of impact state wafer engaging portions, and the respective main engaging portions of the impact state wafer engaging portions are overmolded by each other. form.
在本發明之各種實施例中,一種具有一前向主要晶片支撐件之晶片容器具有一中心基礎條帶,該中心基礎條帶具有配置成二行之複數對的對置懸伸彈簧指狀部,且該等指狀部向外朝晶片且橫向朝晶片容器之各側延伸,各該彈簧指狀部與被構形為一墊之一晶片邊緣接納部連接且成整體。在某些實施例中,該前向晶片支撐件具有一中心孔口,該中心孔口實質上延伸達晶片支撐件之垂直長度。該門具有一底架,該主要晶片支撐件附裝至該底架。該底架具有複數個突伸部,該等突伸部與該底架成整體且被定位於由彈簧指狀物之V形凹槽所界定之晶片槽中間。該等突伸部朝容器部之中心內部向內延伸且在由前向主要晶片支撐件所嚙合之晶片面上延伸,該等突伸部被定位成除在一衝擊狀態中以外不嚙合晶片。傳統上,門之底架可係由聚碳酸酯形成,且整體式突伸部類似地係由聚碳酸酯形成。人們認為剛性聚碳酸酯表面並不適用於為接合式晶片提供衝擊保護及/或交叉槽預防。 In various embodiments of the invention, a wafer container having a forward main wafer support has a central base strip having opposed overhanging spring fingers arranged in a plurality of pairs of two rows And the fingers extend outwardly toward the wafer and laterally toward each side of the wafer container, each of the spring fingers being integrally connected to a wafer edge receiving portion configured as a pad. In some embodiments, the forward wafer support has a central aperture that extends substantially the vertical length of the wafer support. The door has a chassis to which the main wafer support is attached. The chassis has a plurality of projections integral with the chassis and positioned intermediate the wafer pocket defined by the V-shaped grooves of the spring fingers. The projections extend inwardly toward the interior of the central portion of the container portion and extend over the surface of the wafer that is engaged by the forward main wafer support, the projections being positioned to not engage the wafer except in an impact condition. Traditionally, the chassis of the door can be formed from polycarbonate, and the integral projections are similarly formed from polycarbonate. Rigid polycarbonate surfaces are not considered suitable for providing impact protection and/or cross-slot prevention for bonded wafers.
在某些實施例中,該等晶片係為具有一經薄化晶片側之接合式晶片,且該等突伸部在該經薄化晶片側上延伸。在某些實施例中,該等突伸部各自具有面對晶片之經薄化晶片側之一最寬部分。該最寬部分被構形為一凸緣,其中一中心較窄部分與該最寬部分相對。在某些實施例中,該突伸部係為I形狀,且自一整體式基礎部延伸出,該整體式基礎部具有複數個凸塊,以用於附裝至主要晶片支撐件或門底架。 In some embodiments, the wafers are bonded wafers having a thinned wafer side, and the protrusions extend over the thinned wafer side. In some embodiments, the protrusions each have one of the widest portions of the thinned wafer side facing the wafer. The widest portion is configured as a flange with a central narrower portion opposite the widest portion. In some embodiments, the protrusion is I-shaped and extends from an integral base portion having a plurality of bumps for attachment to a primary wafer support or door bottom frame.
一種晶片容器具有:一容器部,具有一開口前部;以及一門,用於閉合該開口前部,該晶片容器具有一前向晶片支撐件或後向晶片支撐件,該前向晶片支撐件或後向晶片支撐件具有複數個晶片邊緣嚙合部,各該晶片邊緣嚙合部為該等晶片其中之一界定一靜態晶片安放位置。在靜態晶片安放位置之外定位有複數個其他輔助晶片衝擊事件嚙合部,以僅在一衝擊狀態中嚙合晶片且通常用於預防交叉槽。在某些實施例中,輔助晶片衝擊嚙合部係為彈性的且具有一I形狀。在某些實施例中,該等輔助晶片衝擊嚙合部係為具有複數個突伸部之一條帶之一部分,該條帶沿著該前向晶片支撐件或後向晶片支撐件之一長度延伸。在某些實施例中,該等輔助晶片衝擊嚙合部包含沿一方向向內延伸之複數個突伸部。 A wafer container having: a container portion having an open front portion; and a door for closing the front portion of the opening, the wafer container having a forward wafer support or a rear wafer support, the forward wafer support or The back wafer support has a plurality of wafer edge engagement portions, each of the wafer edge engagement portions defining a static wafer placement location for one of the wafers. A plurality of other auxiliary wafer impact event engagement portions are positioned outside of the static wafer seating position to engage the wafer only in an impact condition and are typically used to prevent intersection grooves. In some embodiments, the auxiliary wafer impact engagement portion is resilient and has an I shape. In some embodiments, the auxiliary wafer impact engagement portions are portions of a strip having a plurality of projections that extend along a length of one of the forward wafer support or the rear wafer support. In some embodiments, the auxiliary wafer impact engagement portions include a plurality of protrusions extending inwardly in one direction.
在某些實施例中,一種用於接合式晶片之晶片容器具有一前向晶片支撐件或後向晶片支撐件,該前向晶片支撐件或後向晶片支撐件具有一第一晶片支撐件,該第一晶片支撐件具有一接合式晶片邊緣接納部,該接合式晶片邊緣接納部具有接納接合式晶片之邊緣之一凹槽,該晶片容器更具有一輔助晶片支撐部,該輔助晶片支撐部具有在一靜態狀態中嚙合接合式晶片之複數個第一嚙合部及定位於一正常運輸晶片安放區域之外且僅在一衝擊狀態中與晶片接觸之複數個第二嚙合部。該等第一嚙合部及該 等第二嚙合部可位於附裝至該第一晶片支撐件之一整體式彈性條帶中。 In some embodiments, a wafer container for a bonded wafer has a forward wafer support or a backward wafer support, the forward wafer support or the backward wafer support having a first wafer support, The first wafer support has a bonded wafer edge receiving portion having a recess for receiving an edge of the bonded wafer, the wafer container further having an auxiliary wafer support portion, the auxiliary wafer support portion A plurality of first engaging portions that engage the bonded wafer in a static state and a plurality of second engaging portions positioned outside a normal transport wafer seating area and in contact with the wafer in only one impact state. The first meshing portion and the The second engagement portion can be located in an integral elastic strip attached to one of the first wafer supports.
在某些實施例中,當前部開口晶片裝運器被裝載時,晶片被水平安裝成安放於擱架上。該門被應用及閂鎖,進而使晶片跨過前向晶片支撐件及後向晶片支撐件上之斜坡以安放於晶片邊緣接納凹槽中。在前向支撐件中,該等斜坡係為被構形為一墊且與彈簧指狀部成一體之一晶片邊緣接納部之一部分。在門被應用時,晶片邊緣首先嚙合該墊,且該等墊及各自之彈簧指狀部偏轉,且隨後該等晶片邊緣可嚙合被構形為一彈性衝擊狀態緩衝墊之輔助晶片支撐部。在緩衝墊被嚙合後,該緩衝墊隨著該墊及該彈簧指狀部繼續偏轉而偏轉。該墊之偏轉距離小於該墊及該彈簧指狀部之偏轉距離。容器隨後被旋轉90度以使晶片垂直地配置。 In some embodiments, when the current open wafer carrier is loaded, the wafer is mounted horizontally to be placed on the shelf. The door is applied and latched to allow the wafer to straddle the ramps on the forward wafer support and the rear wafer support for placement in the wafer edge receiving recess. In the forward support, the ramps are part of a wafer edge receiving portion that is configured as a pad and integral with the spring fingers. When the door is applied, the wafer edge first engages the pad, and the pads and respective spring fingers are deflected, and then the wafer edges can engage an auxiliary wafer support that is configured as an elastic impact cushion. After the cushion is engaged, the cushion deflects as the mat and the spring fingers continue to deflect. The pad has a deflection distance that is less than a deflection distance of the pad and the spring finger. The container is then rotated 90 degrees to allow the wafer to be vertically aligned.
本發明之各種實施例提供能在衝擊狀態中對晶片載具中之晶片提供增強之保護。 Various embodiments of the present invention provide enhanced protection for wafers in a wafer carrier in an impact state.
20‧‧‧晶片容器 20‧‧‧ wafer container
30‧‧‧容器部 30‧‧‧ Container Department
32‧‧‧前門 32‧‧‧ front door
33‧‧‧開口內部 33‧‧‧open interior
34‧‧‧晶片 34‧‧‧ wafer
36‧‧‧門框架 36‧‧‧ door frame
38‧‧‧開口前部 38‧‧‧ Opening front
42‧‧‧左側 42‧‧‧left side
44‧‧‧右側 44‧‧‧right
45‧‧‧後側 45‧‧‧ Back side
46‧‧‧頂側 46‧‧‧ top side
48‧‧‧底側 48‧‧‧ bottom side
52‧‧‧左側壁 52‧‧‧Left wall
54‧‧‧右側壁 54‧‧‧ right wall
56‧‧‧頂側壁 56‧‧‧ top side wall
57‧‧‧後壁 57‧‧‧ Back wall
58‧‧‧底壁 58‧‧‧ bottom wall
59‧‧‧支腳 59‧‧‧ feet
60‧‧‧閂鎖機構 60‧‧‧Latch mechanism
62‧‧‧閂鎖機構 62‧‧‧Latch mechanism
63‧‧‧閂鎖容納部 63‧‧‧Latch housing
64‧‧‧密封件 64‧‧‧Seal
66‧‧‧周邊 Around 66‧‧
68‧‧‧底架 68‧‧‧ Chassis
70‧‧‧內表面 70‧‧‧ inner surface
72‧‧‧外表面 72‧‧‧ outer surface
80‧‧‧晶片擱架 80‧‧‧ wafer shelf
82‧‧‧後向晶片支撐系統 82‧‧‧Backward wafer support system
84‧‧‧衝擊事件保護特徵 84‧‧‧ Impact event protection features
88‧‧‧前向晶片支撐件 88‧‧‧ forward wafer support
100‧‧‧接合式晶片 100‧‧‧ Bonded wafer
102‧‧‧載體基板/晶片 102‧‧‧ Carrier substrate/wafer
104‧‧‧經薄化晶片 104‧‧‧Thin thinned wafer
106‧‧‧黏附層 106‧‧‧Adhesive layer
108‧‧‧經薄化晶片側 108‧‧‧ Thinned wafer side
110‧‧‧載體基板側 110‧‧‧ Carrier substrate side
112‧‧‧晶片邊緣 112‧‧‧ wafer edge
114‧‧‧邊緣隅角 114‧‧‧Edge corner
120‧‧‧主要晶片支撐件 120‧‧‧Main wafer support
122‧‧‧衝擊事件晶片嚙合緩衝墊 122‧‧‧Impact event wafer mating cushion
124‧‧‧矩形框架 124‧‧‧Rectangular frame
126‧‧‧閂鎖部 126‧‧‧Latch Department
128‧‧‧長軌 128‧‧‧Long track
130‧‧‧窗口 130‧‧‧ window
134‧‧‧中心基礎條帶 134‧‧‧Center base strip
136‧‧‧懸伸彈簧指狀部 136‧‧‧Overhanging spring fingers
140‧‧‧晶片邊緣接納部 140‧‧‧ wafer edge receiver
141‧‧‧V形凹槽 141‧‧‧V-shaped groove
144‧‧‧細長凸肋 144‧‧‧Slim ribs
146‧‧‧中心附裝部 146‧‧‧Center Attachment Department
152‧‧‧凸塊 152‧‧‧Bumps
154‧‧‧孔口 154‧‧‧孔口
160‧‧‧中心條帶 160‧‧‧ center strip
162‧‧‧臂對 162‧‧‧arm pair
164‧‧‧臂 164‧‧‧ Arm
168‧‧‧彈簧指狀物及墊對 168‧‧‧ Spring finger and pad pair
172‧‧‧向內延伸之突伸部 172‧‧‧Inwardly extending projections
176‧‧‧主要運輸安放位置 176‧‧‧Main transport location
180‧‧‧突出部或凸塊 180‧‧‧ protruding parts or bumps
182‧‧‧孔口 182‧‧‧ aperture
186‧‧‧緩衝墊 186‧‧‧ cushion
188‧‧‧主要晶片支撐件 188‧‧‧Main wafer support
189‧‧‧嚙合結構 189‧‧‧Meshing structure
191‧‧‧輔助晶片支撐部 191‧‧‧Auxiliary wafer support
192‧‧‧輔助晶片支撐部/突伸部 192‧‧‧Auxiliary wafer support/extension
193‧‧‧波狀部 193‧‧‧ undulation
194‧‧‧向內突伸部 194‧‧‧Inward projection
196‧‧‧凸塊 196‧‧‧Bumps
197‧‧‧孔口 197‧‧‧孔口
198‧‧‧衝擊偏轉接觸區域 198‧‧‧ Impact deflection contact area
199‧‧‧凹槽 199‧‧‧ Groove
200‧‧‧主要晶片支撐件 200‧‧‧Main wafer support
202‧‧‧衝擊事件緩衝墊 202‧‧‧ Shock event cushion
205‧‧‧條帶 205‧‧‧ strips
206‧‧‧波狀部 206‧‧‧ wavy
207‧‧‧I形突伸部 207‧‧‧I-shaped protrusion
208‧‧‧凸緣 208‧‧‧Flange
209‧‧‧大體平整嚙合表面 209‧‧‧General flat mating surface
210‧‧‧凸塊 210‧‧‧Bumps
222‧‧‧晶片邊緣嚙合部 222‧‧‧ wafer edge meshing
226‧‧‧元件 226‧‧‧ components
228‧‧‧內部V形凹槽 228‧‧‧Internal V-groove
232‧‧‧非衝擊安放位置 232‧‧‧ Non-impact placement
237‧‧‧面對晶片之載體基板側之面 237‧‧‧ facing the side of the carrier substrate side of the wafer
238‧‧‧面對經薄化晶片側之面 238‧‧‧ Faced with thinned wafer side
242‧‧‧支腿 242‧‧‧ legs
246‧‧‧接合處 246‧‧‧ joints
248‧‧‧頂點 248‧‧‧ vertex
250‧‧‧晶片與面對晶片載體基板側之面間之夾角 250‧‧‧An angle between the wafer and the side facing the wafer carrier substrate
252‧‧‧面對經薄化晶片側之面與晶片間之夾角 252‧‧‧ facing the angle between the surface of the thinned wafer side and the wafer
260‧‧‧彈簧墊 260‧‧ ‧spring pad
270‧‧‧由載體基板與面對載體基板之V形凹槽面界定之區域 270‧‧‧A region defined by the carrier substrate and the V-shaped groove surface facing the carrier substrate
272‧‧‧由經薄化晶片與面對經薄化晶片之V形凹槽面界定之區域 272‧‧‧A region defined by a thinned wafer and a V-shaped groove surface facing the thinned wafer
273‧‧‧晶片偏轉區域 273‧‧‧ wafer deflection area
283‧‧‧衝擊狀態緩衝嵌件 283‧‧‧ Impact state buffer insert
300‧‧‧前部開口晶片容器 300‧‧‧Front open wafer container
302‧‧‧容器部 302‧‧‧ Container Department
304‧‧‧前門 304‧‧‧ front door
306‧‧‧晶片擱架 306‧‧‧ wafer shelf
310‧‧‧晶片擱架安放位置 310‧‧‧ wafer shelf placement
314‧‧‧前向晶片支撐件 314‧‧‧ forward wafer support
318‧‧‧後向晶片支撐件 318‧‧‧Backward wafer support
320‧‧‧彈簧 320‧‧‧ Spring
324‧‧‧晶片 324‧‧‧ wafer
326‧‧‧前部開口 326‧‧‧ front opening
327‧‧‧運輸位置 327‧‧‧Transportation location
330‧‧‧晶片嚙合部 330‧‧‧ wafer meshing
333‧‧‧衝擊狀態緩衝墊 333‧‧‧ Impact state cushion
350‧‧‧衝擊狀態緩衝墊 350‧‧‧ Impact state cushion
353‧‧‧主要非衝擊運輸安放位置 353‧‧‧Main non-impact transport placement
356‧‧‧晶片邊緣嚙合部 356‧‧‧ wafer edge meshing
360‧‧‧晶片 360‧‧‧chip
364‧‧‧彈簧部 364‧‧‧Spring Department
420‧‧‧前部開口晶片容器 420‧‧‧Front open wafer container
430‧‧‧容器部 430‧‧‧ Container Department
432‧‧‧門 432‧‧‧
438‧‧‧門底架 438‧‧‧door frame
440‧‧‧內壁 440‧‧‧ inner wall
442‧‧‧閂鎖機構 442‧‧‧Latch mechanism
443‧‧‧閂鎖機構 443‧‧‧Latch mechanism
450‧‧‧前向主要晶片支撐件 450‧‧‧ forward main wafer support
454‧‧‧由複數個懸伸彈簧指狀部形成之行 454‧‧‧A line formed by a plurality of overhanging spring fingers
456‧‧‧由複數個懸伸彈簧指狀部形成之行 456‧‧‧A line formed by a plurality of overhanging spring fingers
469‧‧‧懸伸彈簧指狀部 469‧‧‧Overhanging spring fingers
470‧‧‧細長彈簧部 470‧‧‧Slim spring part
472‧‧‧晶片邊緣接納部 472‧‧‧ wafer edge receiver
476‧‧‧V形凹槽 476‧‧‧V-shaped groove
480‧‧‧彈簧閂鎖/結構 480‧‧‧ Spring latch/structure
482‧‧‧突起部/協作式結構 482‧‧‧Protruding/cooperative structure
485‧‧‧面向內部之側 485‧‧‧ facing the inner side
490‧‧‧前向交叉槽預防突伸部/後壁突伸部 490‧‧‧ forward crossing groove prevention protrusion/rear wall extension
492‧‧‧節點 492‧‧‧ nodes
502‧‧‧殼體 502‧‧‧Shell
504‧‧‧整體壁 504‧‧‧Whole wall
505‧‧‧左側 505‧‧‧left side
506‧‧‧右側 506‧‧‧right
507‧‧‧頂部 507‧‧‧ top
508‧‧‧底部 508‧‧‧ bottom
509‧‧‧後側 509‧‧‧ Back side
510‧‧‧機器人凸緣 510‧‧‧Robot flange
512‧‧‧頂部 512‧‧‧ top
516‧‧‧由複數個晶片擱架形成之行 516‧‧‧Formed by a plurality of wafer shelves
517‧‧‧由複數個晶片擱架形成之行 517‧‧‧Formed by a plurality of wafer shelves
518‧‧‧晶片擱架 518‧‧‧ wafer shelf
520‧‧‧內表面 520‧‧‧ inner surface
526‧‧‧運動耦合組件 526‧‧‧Motion coupling components
532‧‧‧附裝結構 532‧‧‧ Attachment structure
536‧‧‧前向門框架 536‧‧‧ forward door frame
537‧‧‧後向後壁結構 537‧‧‧Backward rear wall structure
538‧‧‧側壁結構 538‧‧‧ sidewall structure
540‧‧‧後向主要晶片支撐件 540‧‧‧Backward main wafer support
546‧‧‧下斜坡部 546‧‧‧Lower slope
550‧‧‧V形凹槽 550‧‧‧V-shaped groove
600‧‧‧前部開口晶片容器 600‧‧‧Front Open Wafer Container
602‧‧‧容器部 602‧‧‧ Container Department
604‧‧‧前門 604‧‧‧ front door
606‧‧‧晶片擱架 606‧‧‧ wafer shelf
610‧‧‧晶片擱架安放位置 610‧‧‧ wafer shelf placement
614‧‧‧前向晶片支撐件 614‧‧‧ forward wafer support
617‧‧‧由複數個擱架形成之行 617‧‧‧A line of multiple shelves
618‧‧‧後向晶片支撐件 618‧‧‧Backward wafer support
619‧‧‧斜坡 619‧‧‧ slope
620‧‧‧彈簧臂 620‧‧ ‧ spring arm
621‧‧‧斜坡部 621‧‧‧Ramp Department
624‧‧‧晶片 624‧‧‧ wafer
626‧‧‧開口前部 626‧‧‧ front opening
627‧‧‧運輸安放位置 627‧‧‧Transportation location
654‧‧‧交叉槽預防突伸部 654‧‧‧Intersection of the trough prevention
655‧‧‧交叉槽預防突伸部 655‧‧‧cross groove prevention protrusion
第1圖係為根據本發明一實施例之一300毫米晶片容器之立體圖;第2圖係為第1圖所示前部開口晶片容器之側視立體圖;第3圖係為第1圖所示晶片載具之容器部之前視立體圖;第4圖係為第1圖所示晶片容器之前門之內表面之立體圖,其例示具有衝擊保護之晶片支撐系統;第5圖係為第1圖所示晶片容器之前門之內表面之立體圖,其中前向晶片支撐系統未就位; 第6圖係為第5圖所示門之晶片支撐件之立體圖;第7圖係為第1圖所示晶片支撐件之後側之立面圖,該後側面對門;第8圖係為第4圖所示晶片支撐系統之分解圖;第9A圖係為位於第1圖所示晶片容器之前門之內側上之晶片支撐件之詳細立體圖;第9B圖係為第9A圖所示晶片支撐件之更詳細立體圖,其中以幻影形式顯示一晶片;第9C圖係為穿過二個相鄰晶片邊緣嚙合部之剖視圖,該等晶片邊緣嚙合部被顯示為與複數個接合式晶片嚙合;第9D圖係為一衝擊事件晶片嚙合緩衝墊之後側之立體圖,該後側背對晶片;第10圖係為第3圖所示後向晶片支撐件之立面圖;第11圖係為第10圖所示晶片支撐件之後側之立體圖;第12圖係為第3圖所示具有衝擊保護之後側晶片支撐系統之前側立體圖;第13圖係為第12圖所示晶片支撐系統之分解立體圖;第14圖係為具有適用於接合式晶片之衝擊保護特徵之一後向晶片支撐系統之側視立面圖;第15圖係為一前部開口晶片容器之示意圖,其中晶片安放於複數個擱 架上且門相對於前部開口移置;第16圖係為第15圖所示前部開口晶片容器之示意圖,其中前門就位一閉合;第17圖係為在使晶片垂直之一運輸定向中,第15圖所示前部開口晶片容器之示意圖;第18圖係為將一晶片以一垂直運輸定向懸置於中間之前向晶片支撐件與後向晶片支撐件之剖視圖;第19A圖係為具有一衝擊狀態緩衝墊之一前向晶片容器之立體圖,該衝擊狀態緩衝墊具有沿著一主要晶片支撐部之中心向下延伸之波狀部(undulation);第19B圖係為未附裝一輔助晶片支撐部之第19A圖所示主要晶片支撐件之立體圖;第19C圖係為第19A圖所示彈性輔助晶片支撐部之立體圖;第19D圖係為適用於附裝至第19B圖所示主要晶片支撐件之另一彈性輔助晶片支撐部之立體圖;第19E圖係為附裝至一主要晶片支撐件之第19D圖所示輔助晶片支撐部之剖視圖,其中接合式晶片處於一靜態狀態(非衝擊);第19F圖係為附裝至一主要晶片支撐件之第19D圖所示輔助晶片支撐部之剖視圖,其中晶片處於一衝擊狀態,且薄晶片嚙合彈性衝擊嚙合部; 第19G圖係為具有複數個交叉槽預防突伸部之一彈性輔助晶圓支撐部之立體圖,該等交叉槽預防突伸部具有一I形狀;第19H圖係為第19G圖所示輔助晶圓支撐部之後側之立體圖;第19I圖係為第19G圖及第19H圖所示I形突伸部之前視立面圖;第20圖係為接合式晶片與第19圖所示晶片支撐件之嚙合之剖視圖;第21圖係為一晶片邊緣嚙合部之一側視剖視圖,在對一晶片之壓縮負荷後,該晶片邊緣嚙合部偏轉以使衝擊狀態緩衝墊能夠對晶片暴露出;第22圖係為已偏轉之第19圖所示晶片邊緣嚙合部之剖視圖,其中衝擊緩衝墊被暴露出且相關聯晶片容器處於使晶片垂直之一運輸位置;第23圖係為根據本發明一實施例,具有一容器部及一門之一前部開口晶片容器之立體圖,該容器具有複數個內部組件;第24圖係為第23圖所示容器之前門之底架之內壁之立體圖;第25圖係為根據本發明實施例,附裝至第24圖所示門底架之一晶片緩衝墊之立體圖;第26圖係為第24圖所示底架之內表面之詳視立體圖;第27圖係為第23圖所示晶片容器之容器部之前視立體圖;第28圖係為第27圖所示容器部之上視立體圖;第28A圖係為一行晶片擱架以及一後向主要晶片支撐件之立體圖; 第29圖係為第27圖及第28圖所示容器部之殼體之立體圖;第30圖係為第29圖所示殼體之剖視圖;第31圖係為第29圖及第30圖所示殼體之後向突伸部之詳視圖;第32圖係為根據本發明實施例在門被安放之前,一晶片容器之示意平面圖,其中晶片安放於擱架上;第33圖係為在正常運輸安放位置中,第32圖所示晶片容器之示意平面圖,其中門被安放且晶片被抬離擱架;第34圖係為在門被安放之前第32圖所示晶片容器之示意側視立面剖視圖,其中晶片處於正常擱架安放位置;以及第35圖係為在正常運輸安放位置中,如請求項34所述之晶片容器之示意側視立面剖視圖,其中門被安放且晶片被抬離擱架。 1 is a perspective view of a 300 mm wafer container according to an embodiment of the present invention; and FIG. 2 is a side perspective view of the front open wafer container shown in FIG. 1; FIG. 3 is a first view of FIG. A front view of the container portion of the wafer carrier; Fig. 4 is a perspective view of the inner surface of the front door of the wafer container shown in Fig. 1, illustrating a wafer support system with impact protection; Fig. 5 is a view of Fig. 1 a perspective view of the inner surface of the front door of the wafer container, wherein the forward wafer support system is not in place; Figure 6 is a perspective view of the wafer support of the door shown in Figure 5; Figure 7 is an elevational view of the rear side of the wafer support shown in Figure 1, the rear side is the door; Figure 8 is the fourth The exploded view of the wafer support system is shown in Fig. 9A is a detailed perspective view of the wafer support member on the inner side of the front door of the wafer container shown in Fig. 1; and Fig. 9B is the wafer support member shown in Fig. 9A. A more detailed perspective view in which a wafer is displayed in phantom form; Figure 9C is a cross-sectional view through two adjacent wafer edge engaging portions, the wafer edge engaging portions being shown engaged with a plurality of bonded wafers; A perspective view of the back side of the impact event wafer mating cushion, the back side facing away from the wafer; the 10th drawing is the elevation of the rearward wafer support shown in FIG. 3; and the 11th drawing is the 10th drawing FIG. 12 is a perspective view of the front side of the wafer support system with impact protection shown in FIG. 3; and FIG. 13 is an exploded perspective view of the wafer support system shown in FIG. 12; The figure is to have a punch suitable for the bonded wafer One of the features to protect the rear side elevational view of the wafer support system; FIG. 15 is a schematic system of a front opening wafer container portion, wherein the wafer is mounted on a plurality of resting The upper and lower doors are displaced relative to the front opening; Fig. 16 is a schematic view of the front open wafer container shown in Fig. 15, wherein the front door is closed in position; and Fig. 17 is directed to transport one of the wafers vertically. Figure 15 is a schematic view of the front open wafer container shown in Figure 15; Figure 18 is a cross-sectional view of the wafer support and the backward wafer support before the wafer is suspended in the middle in a vertical transport orientation; Figure 19A a perspective view of a forward wafer container having one of the impact state cushions, the impact state cushion having an undulation extending downward along a center of a main wafer support; the 19B is unattached Fig. 19C is a perspective view of the main wafer support shown in Fig. 19A of the auxiliary wafer support portion; Fig. 19C is a perspective view of the elastic auxiliary wafer support portion shown in Fig. 19A; and Fig. 19D is suitable for attachment to Fig. 19B. A perspective view showing another elastic auxiliary wafer support portion of the main wafer support; FIG. 19E is a cross-sectional view of the auxiliary wafer support portion attached to a main wafer support member shown in FIG. 19D, wherein the bonded wafer is in a static state State (non-impact); FIG. 19F is a cross-sectional view of the auxiliary wafer support portion attached to a main wafer support member in FIG. 19D, wherein the wafer is in an impact state, and the thin wafer is engaged with the elastic impact engagement portion; Figure 19G is a perspective view of an elastic auxiliary wafer support portion having a plurality of intersecting groove preventing protrusion portions, the intersecting groove preventing protrusion portion having an I shape; and the 19H pattern being the auxiliary crystal shown in Fig. 19G Fig. 19I is a front elevational view of the I-shaped projection shown in Figs. 19G and 19H; and Fig. 20 is a bonded wafer and the wafer support shown in Fig. 19. Figure 21 is a side cross-sectional view of a wafer edge engaging portion, the wafer edge engaging portion is deflected after a compressive load on a wafer to enable the impact state cushion to be exposed to the wafer; The figure is a cross-sectional view of the wafer edge engaging portion shown in Fig. 19, wherein the impact cushion is exposed and the associated wafer container is in a transport position for vertical wafer orientation; and Fig. 23 is an embodiment in accordance with the present invention. a perspective view of a container portion and a front open wafer container having a plurality of internal components; and Fig. 24 is a perspective view of the inner wall of the chassis of the front door of the container shown in Fig. 23; According to this In the embodiment, a perspective view of a wafer cushion attached to one of the door frames shown in Fig. 24; Fig. 26 is a detailed perspective view of the inner surface of the chassis shown in Fig. 24; Figure 28 is a front perspective view of the container portion of the wafer container; Figure 28 is a top perspective view of the container portion shown in Figure 27; Figure 28A is a perspective view of a row of wafer shelves and a rearward main wafer support; Figure 29 is a perspective view of the housing of the container portion shown in Figures 27 and 28; Figure 30 is a cross-sectional view of the housing shown in Figure 29; and Figure 31 is the 29th and 30th drawings. A detailed view of the rearward projection of the housing; Fig. 32 is a schematic plan view of a wafer container in which the wafer is placed on the shelf before the door is placed in accordance with an embodiment of the present invention; Figure 33 is normal In the transport position, a schematic plan view of the wafer container shown in Fig. 32, in which the door is placed and the wafer is lifted off the shelf; Fig. 34 is a schematic side view of the wafer container shown in Fig. 32 before the door is placed a cross-sectional view in which the wafer is in a normal shelf seating position; and Figure 35 is a schematic side elevational cross-sectional view of the wafer container in the normal shipping position, as claimed in claim 34, wherein the door is placed and the wafer is lifted Leaving the shelf.
參照第1圖至第6圖,一晶片容器20大體包含一容器部30及一門32,門32界定用於固持複數個晶片34之一開口內部33。該容器部具有界定一開口前部38之一門框架36、一左側42、一右側44、一後側45、一頂側46、及一底側48,該等側分別具有一左側壁52、一右側壁54、一頂側壁56、一後壁57、及一底壁58,各該壁具有一各自之面向內側之表面及一外表面。後壁57在鄰近頂壁及底壁處具有被構形為支腳59之平整表面,以用於在例如為運輸容器而將容器旋轉四分之一圈(90度)之後使該容器安放於後側。 Referring to Figures 1 through 6, a wafer container 20 generally includes a container portion 30 and a door 32 defining an open interior 33 for holding a plurality of wafers 34. The container portion has a door frame 36 defining a front opening portion 38, a left side 42, a right side 44, a rear side 45, a top side 46, and a bottom side 48, each of which has a left side wall 52, A right side wall 54, a top side wall 56, a rear wall 57, and a bottom wall 58, each having a respective inwardly facing surface and an outer surface. The rear wall 57 has a flat surface configured as a leg 59 adjacent the top and bottom walls for placing the container in a quarter turn (90 degrees) after, for example, transporting the container Back side.
前門32具有一對閂鎖機構60、62、複數個閂鎖容納部 (containment)63、及一密封件64,密封件64環繞該門之一周邊66。該門具有一底架68、一內表面70及一外表面72。 The front door 32 has a pair of latch mechanisms 60, 62 and a plurality of latch housings (containment) 63, and a seal 64 surrounding the perimeter 66 of the door. The door has a chassis 68, an inner surface 70 and an outer surface 72.
該晶片容器在容器部上及前門之內表面上具有複數個晶片嚙合特徵。在容器部中,晶片安放於左側壁及右側壁之內表面處之複數個晶片擱架80上且嚙合具有一衝擊事件保護特徵84之一後向晶片支撐系統82。該後向晶片支撐系統與一前向晶片支撐系統協作,以將晶片以壓縮方式約束於該二個系統之間,例如第6,267,245號美國專利中所例示;參見第11B圖。此專利係由本申請案之所有人所擁有且特此以引用併入本文中。本文中以及‘245專利中所例示之晶片容器歸屬於前開式運輸盒範疇內。此等晶片容器用以接納及運輸複數個300毫米晶片。可藉由開口前部接納晶片,隨後將門附裝並閂鎖至容器部,且隨後可將容器向後旋轉90度以將晶片垂直定向,例如第17圖及第18圖中所示。更專門在製作設施情景(而非裝運)中使用之用於300毫米晶片之類似晶片容器稱為FOUPS或前開式統一標準盒(front opening unified pod)。本文中所揭露之各種實施例可適合在前開式統一標準盒中使用且亦可適用於針對其他晶片大小之容器。舉例而言,亦正在開發用於450毫米晶片之前部開口晶片容器,且本文所揭露之實施例適合併入此等容器中。 The wafer container has a plurality of wafer engagement features on the container portion and on the inner surface of the front door. In the container portion, the wafer is placed over a plurality of wafer shelves 80 at the inner surfaces of the left and right side walls and engages a back wafer support system 82 having an impact event protection feature 84. The rearward wafer support system cooperates with a forward wafer support system to constrain the wafer in a compressed manner between the two systems, as exemplified in U.S. Patent No. 6,267,245; This patent is owned by the owner of the present application and is hereby incorporated by reference. The wafer containers exemplified herein and in the '245 patent are within the scope of the front open transport case. These wafer containers are used to receive and transport a plurality of 300 mm wafers. The wafer can be received by the front of the opening, then the door is attached and latched to the container portion, and the container can then be rotated 90 degrees rearward to orient the wafer vertically, such as shown in Figures 17 and 18. Similar wafer containers for 300 mm wafers that are more specifically used in fabrication facility scenarios (rather than shipping) are referred to as FOUPS or front opening unified pods. The various embodiments disclosed herein may be suitable for use in a front open unified standard box and may also be suitable for containers of other wafer sizes. For example, wafer opening containers for 450 mm wafers are also being developed, and the embodiments disclosed herein are suitable for incorporation into such containers.
在所示實施例中,該前向晶片支撐件及該後向晶片支撐件其中之每一者可具備衝擊事件保護部且特別適用於接合式晶片。在某些實施例中,衝擊保護部或交叉槽保護部可相對於晶片支撐件移置。參照第14圖、第18圖及第20圖,接合式晶片100具有一載體基板102、一經薄化晶片104及一黏附層106,在加工期間,黏附層106將經薄化層固定至載體基板。該等接合式晶片具有一經薄化晶片側108、一載體基板側110、一晶片邊緣112及 複數個邊緣隅角114。 In the illustrated embodiment, each of the forward wafer support and the rear wafer support can be provided with an impact event protection and is particularly suitable for use in a bonded wafer. In some embodiments, the impact protection portion or the intersecting groove protection portion can be displaced relative to the wafer support. Referring to Figures 14, 18 and 20, the bonded wafer 100 has a carrier substrate 102, a thinned wafer 104 and an adhesion layer 106. During processing, the adhesion layer 106 is fixed to the carrier substrate via the thinned layer. . The bonded wafer has a thinned wafer side 108, a carrier substrate side 110, a wafer edge 112, and A plurality of edge corners 114.
第4圖至第9D圖及第19A圖至第20圖中提供了複數個前向晶片支撐件之細節。首先參照第7圖至第9D圖,前向晶片支撐件88具有二個組件:一主要晶片支撐件120及一被構形為一衝擊事件晶片嚙合緩衝墊122之輔助晶片支撐部。該主要晶片支撐件具有一矩形框架124,矩形框架124具有位於長軌128上之複數個閂鎖部126。由該矩形框架界定之一窗口130為一中心基礎條帶134構成一框架,中心基礎條帶134具有複數對的對置整體式懸伸彈簧指狀部136,彈簧指狀部136向外朝晶片且橫向朝晶片容器之各側延伸,各該彈簧指狀部與一晶片邊緣接納部140連接且成整體,晶片邊緣接納部140被構形為具有一V形凹槽141之一墊,以用於接納晶片100之邊緣。矩形框架124嚙合門32之內表面70上之複數個細長凸肋144,且中心基礎條帶134安放於中心附裝部146上,中心附裝部146被構形為一凸肋及複數個結構突伸部且附裝有複數個凸塊152,凸塊152嚙合基礎條帶中之複數個孔口154。該基礎條帶在條帶頂部及底部處附裝至矩形框架,且當與容器部中之晶片嚙合時,左側上之彈簧指狀物及墊對該中心基礎條帶所提供之一力矩被右側上之彈簧指狀物及墊所提供之力矩抵消。該等力之此種平衡使得能夠使用較少結構來支撐由前向晶片支撐件提供之壓縮力。 Details of a plurality of forward wafer supports are provided in Figures 4 through 9D and 19A through 20. Referring first to Figures 7 through 9D, the forward wafer support 88 has two components: a primary wafer support member 120 and an auxiliary wafer support portion configured as an impact event wafer engagement cushion 122. The primary wafer support has a rectangular frame 124 having a plurality of latches 126 on the elongated rails 128. A window 130 defined by the rectangular frame forms a frame for a central base strip 134 having a plurality of opposing opposed integral overhanging spring fingers 136 that are outwardly directed toward the wafer And extending laterally toward each side of the wafer container, each of the spring fingers being connected and integral with a wafer edge receiving portion 140, the wafer edge receiving portion 140 being configured to have a pad of a V-shaped groove 141 for use The edge of the wafer 100 is received. The rectangular frame 124 engages a plurality of elongated ribs 144 on the inner surface 70 of the door 32, and the central base strip 134 is seated on the central attachment portion 146, which is configured as a rib and a plurality of structures The projections are provided with a plurality of projections 152 that engage a plurality of apertures 154 in the base strip. The base strip is attached to the rectangular frame at the top and bottom of the strip, and when engaged with the wafer in the container portion, the spring fingers and pads on the left side provide a moment to the center base strip to the right The torque provided by the spring fingers and pads is offset. This balance of forces enables the use of less structure to support the compressive force provided by the forward wafer support.
第7圖至第9D圖所示衝擊事件晶片嚙合緩衝墊122包含一中心條帶160,中心條帶160具有自其延伸之複數對162的臂164,該等對162的臂164與每一對168的彈簧指狀物及墊對應。複數個向內延伸之突伸部172被定位成相對於主要運輸安放位置176軸向及/或沿圓周偏移。在某些實施例中,主要晶片支撐件120係由剛性較衝擊事件緩衝墊122之聚合物大之一聚合物(例如聚碳酸酯、耐綸(nylon)或聚乙烯)形成,衝擊事件緩衝墊122 可係為一熱塑性彈性體或其他彈性材料。該衝擊事件緩衝墊可例如藉由突出部或凸塊180進行附裝,突出部或凸塊180插入至主要晶片支撐件120中之孔口182中。在其他實施例中,可在該晶片支撐件上為各該晶片提供個別離散衝擊事件緩衝墊,例如由第8圖中之緩衝墊186所例示。在其他實施例中,該衝擊事件緩衝墊可係包覆模製於主要晶片支撐件上(或反之)。該衝擊事件緩衝墊可被定位成僅在一衝擊狀態中被嚙合,亦即,在一非衝擊狀態中不被嚙合,或者該衝擊事件緩衝墊可被定位成對其之嚙合度在一非衝擊狀態期間較在一衝擊狀態期間小。或者,該衝擊事件緩衝墊可具有在一正常非衝擊狀態中被嚙合之一部分以及在一衝擊狀態中被嚙合之另一部分。參照第19A圖至第20圖,一主要晶片支撐件188具有用於附裝至前門之一嚙合結構189且具有被構形為一衝擊狀態緩衝墊之一輔助晶片支撐部192。第19D圖例示一輔助晶片支撐部191之另一實施例。該輔助晶片支撐部可係為在主要晶片支撐件上沿長度延伸之一條帶,該條帶具有複數個波狀部193及複數個向內突伸部194。可將例如輔助晶片支撐部之凸塊196等協作式嚙合結構固定至主要晶片支撐部中之孔口197中。在一非衝擊狀態期間,晶片邊緣112可嚙合、輕微嚙合衝擊狀態緩衝墊、或者與衝擊狀態緩衝墊間隔開。突伸部194可被定位成當處於一衝擊狀態時嚙合接合式晶片之經薄化晶片側108,藉此防止經薄化晶片側與將較有可能損壞經薄化晶片之其他表面接觸。第19E圖例示以一靜態正常安放位置處於一凹槽199中之一接合式晶片且例示一晶片偏轉區域273。第19F圖例示一衝擊狀態,其中接合式晶片100之經薄化晶片部嚙合突伸部192之一衝擊偏轉接觸區域198。在衝擊狀態中,晶片可仍與墊嚙合或可不再與墊嚙合。在某些實施例中,該輔助晶圓支撐部可包覆模製於主要晶片支撐部上。 The impact event wafer mating cushion 122 shown in Figures 7 through 9D includes a center strip 160 having a plurality of pairs 162 of arms 164 extending therefrom, arms 164 of each pair 162 and each pair 168 spring fingers and pads correspond. A plurality of inwardly extending projections 172 are positioned axially and/or circumferentially offset relative to the primary transport seating location 176. In some embodiments, the primary wafer support 120 is formed from a polymer that is more rigid than the polymer of the impact event cushion 122 (eg, polycarbonate, nylon, or polyethylene), impact event cushion 122 It can be a thermoplastic elastomer or other elastic material. The impact event cushion can be attached, for example, by a tab or bump 180 that is inserted into the aperture 182 in the primary wafer support 120. In other embodiments, individual discrete impact event cushions may be provided on the wafer support for each of the wafers, such as illustrated by cushion 186 in FIG. In other embodiments, the impact event cushion can be overmolded onto the primary wafer support (or vice versa). The impact event cushion can be positioned to be engaged only in an impact state, that is, not engaged in a non-impact condition, or the impact event cushion can be positioned such that its meshing degree is non-impact The state is smaller during an impact state. Alternatively, the impact event cushion may have one portion that is engaged in a normal non-impact condition and another portion that is engaged in an impact state. Referring to Figures 19A through 20, a primary wafer support 188 has an auxiliary wafer support 192 for attachment to one of the front door engagement features 189 and having one of the impact state cushions configured. Fig. 19D illustrates another embodiment of an auxiliary wafer support portion 191. The auxiliary wafer support portion can be a strip extending along the length of the main wafer support member, the strip having a plurality of undulations 193 and a plurality of inwardly projecting portions 194. A cooperating engagement structure, such as a bump 196 of the auxiliary wafer support, can be secured into the aperture 197 in the main wafer support. During a non-impact condition, the wafer edge 112 can engage, slightly engage the impact state cushion, or be spaced apart from the impact condition cushion. The protrusion 194 can be positioned to engage the thinned wafer side 108 of the bonded wafer when in an impact condition, thereby preventing the thinned wafer side from contacting other surfaces that would be more likely to damage the thinned wafer. Figure 19E illustrates a bonded wafer in a recess 199 in a static normal seating position and illustrates a wafer deflection region 273. FIG. 19F illustrates an impact state in which one of the thinned wafer portion engagement projections 192 of the bonded wafer 100 impacts the deflection contact region 198. In the impact state, the wafer may still engage the pad or may no longer engage the pad. In some embodiments, the auxiliary wafer support can be overmolded onto the main wafer support.
第19G圖、第19H圖、第19I圖繪示與第19E圖及第19F圖相一 致之另一輔助晶圓支撐部。一條帶205具有複數個波狀部206及I形突伸部207。各該突伸部具有一對凸緣208,凸緣208在一衝擊狀態或一近似交叉槽事件中為各晶片面提供一大體平整嚙合表面209。I形狀能以最小收縮率及較少聚合物提供改良之模製效能。一般而言,蕭氏D硬度(Shore D hardness)為30至35之一熱塑性彈性體係為適宜的。在某些實施例中,蕭氏D硬度28至38係為適宜的。複數個凸塊210位於後表面上,以用於附裝於主要晶片支撐件或門內壁之孔口中。 19G, 19H, and 19I are shown in Fig. 19E and 19F. To the other auxiliary wafer support. A strip 205 has a plurality of undulations 206 and an I-shaped projection 207. Each of the projections has a pair of flanges 208 that provide a generally flat engagement surface 209 for each wafer face in an impact condition or an approximately intersecting groove event. The I shape provides improved molding performance with minimal shrinkage and less polymer. In general, a thermoplastic elastomer system having a Shore D hardness of from 30 to 35 is suitable. In certain embodiments, a Shore D hardness of 28 to 38 is suitable. A plurality of bumps 210 are located on the rear surface for attachment to the apertures of the main wafer support or the inner wall of the door.
參照第3圖以及第10圖至第14圖,其例示一後向晶片支撐件82之各種實施例。該後向晶片支撐件包含一主要晶片支撐件200及一衝擊事件緩衝墊202。該主要晶片支撐件具有一矩形結構框架210,矩形結構框架210具有複數個軌212,軌212咬合(snap-in)或以其他方式嚙合後壁57以使後向晶片支撐件保持附裝至後壁57。衝擊狀態緩衝墊可係為第12圖及第13圖中所例示之一條帶,或者可係為針對各該晶片定位之複數個離散緩衝墊。在一非衝擊狀態中,該衝擊狀態緩衝墊如同前向衝擊狀態緩衝墊一樣可嚙合、局部地嚙合晶片邊緣、或者與晶片邊緣分離。在一衝擊狀態中,嚙合度將增大,或者將發生嚙合。該衝擊狀態緩衝墊可係為一彈性材料或者其他較主要後向晶片支撐件之材料軟之材料。該等材料通常係為聚合物。 Referring to Figure 3 and Figures 10 through 14, various embodiments of a rearward wafer support 82 are illustrated. The rear wafer support includes a primary wafer support 200 and an impact event cushion 202. The primary wafer support has a rectangular structural frame 210 having a plurality of rails 212 that snap-in or otherwise engage the rear wall 57 to retain the rear wafer support attached to the rear Wall 57. The impact state cushion may be one of the strips illustrated in Figures 12 and 13, or may be a plurality of discrete cushions positioned for each of the wafers. In a non-impact condition, the impact state cushion can engage, partially engage, or be separated from the edge of the wafer as a forward impact cushion. In an impact state, the degree of engagement will increase or engagement will occur. The impact state cushion can be an elastic material or other material that is softer than the material of the main rearward wafer support. These materials are usually polymers.
參照第13圖、第14圖及第18圖,後向主要晶片支撐件具有複數個晶片邊緣嚙合部222,晶片邊緣嚙合部222整體上呈現一U形狀(參見元件226)且具有一內部V形凹槽228,內部V形凹槽228包含用於晶片102之非衝擊安放位置232。該V形凹槽在橫截面中具有一對面238、239或一對支腿242、244,其中一接合處246連接該對面或該對支腿。該接合處本質上界定晶片之非衝擊運輸安放位置且具有一頂點248。晶片與面對晶片載體基板側 110之面237間之夾角250小於面對經薄化晶片側108之面238與晶片間之夾角。換言之,與由經薄化晶片與面對經薄化晶片之V形凹槽面界定之區域272相較,由載體基板與面對載體基板之V形凹槽面界定之區域270朝向運輸安放位置係更尖或更窄。界定了一晶片偏轉區域273,預期在一衝擊狀態中晶片之邊緣會延伸至此區域中。如其他視圖中所例示,一衝擊狀態緩衝墊被適當地定位成在晶片延伸至晶片偏轉區域中時與晶片接觸。上述構形在一衝擊狀態中為經薄化晶片提供更大空隙,俾使經薄化晶片較不可能與主要晶片支撐件嚙合。亦可為前向晶片支撐件之彈簧墊260提供此種構形,亦如第18圖中所示。 Referring to Figures 13, 14, and 18, the rear main wafer support has a plurality of wafer edge engaging portions 222 which collectively assume a U shape (see element 226) and have an internal V shape. The recess 228, the inner V-shaped recess 228 includes a non-impact mounting location 232 for the wafer 102. The V-shaped groove has a pair of faces 238, 239 or a pair of legs 242, 244 in cross section, with a joint 246 joining the opposite face or the pair of legs. The joint essentially defines the non-impact transport location of the wafer and has a vertex 248. Wafer and facing wafer carrier substrate side The angle 250 between the faces 237 of 110 is less than the angle between the face 238 facing the thinned wafer side 108 and the wafer. In other words, the region 270 defined by the carrier substrate and the V-shaped groove surface facing the carrier substrate faces the transport placement position as compared to the region 272 defined by the thinned wafer and the V-shaped groove face facing the thinned wafer. The line is sharper or narrower. A wafer deflection region 273 is defined which is expected to extend into the region in the event of an impact. As illustrated in other views, an impact state cushion is suitably positioned to contact the wafer as it extends into the wafer deflection region. The above configuration provides a larger gap for the thinned wafer in an impact state, making it less likely that the thinned wafer will engage the primary wafer support. This configuration can also be provided for the spring pad 260 of the forward wafer support, as also shown in FIG.
主要後向晶片支撐件之晶片邊緣嚙合部222具有複數個孔口280,孔口280可有助於精確地模製組件且有助於控制經薄化晶片與晶片邊緣嚙合部間之界面。在某些實施例中,孔口可接納用於提供一衝擊狀態緩衝嵌件283之嵌件。可藉由一包覆模製製程來模製此衝擊狀態緩衝嵌件並將其插入或接合至主要晶片支撐件。在某些實施例中,該衝擊狀態緩衝嵌件係為較晶片邊緣嚙合部之聚合物材料軟之一聚合物材料。雖然晶片邊緣嚙合孔口係例示於後向晶片支撐件中,但此等晶片邊緣嚙合孔口亦可用於前向晶片支撐件中。 The wafer edge engagement portion 222 of the primary rearward wafer support has a plurality of apertures 280 that can help to accurately mold the assembly and help control the interface between the thinned wafer and the wafer edge engagement portion. In some embodiments, the aperture can receive an insert for providing an impact condition buffer insert 283. The impact state buffer insert can be molded and inserted or joined to the main wafer support by an overmolding process. In some embodiments, the impact state buffer insert is a polymeric material that is softer than the polymeric material of the wafer edge engagement portion. While the wafer edge engagement apertures are illustrated in the rearward wafer support, such wafer edge engagement apertures can also be used in the forward wafer support.
參照第15圖至第17圖,所示意性例示之一前部開口晶片容器300具有一容器部302、一前門304、界定一晶片擱架安放位置310之複數個晶片擱架306、複數個前向晶片支撐件314及複數個後向晶片支撐件318。該等前向晶片支撐件具有一彈簧320。在使門打開之一水平位置中,晶片324被安放於該等擱架上。當門被閂鎖至前部開口326時,該等晶片由晶片支撐件314、318之晶片嚙合部330抬升至第16圖中所示之運輸位置327。在運輸 時,該晶片容器可被局部旋轉至第17圖所示位置。第17圖例示一衝擊狀態,其中一力衝擊容器之一下部隅角而引起晶片之移置,俾使該等晶片嚙合衝擊狀態緩衝墊333。該衝擊狀態緩衝墊可固定至晶片支撐件,或者可附裝至前門壁或後壁。所例示晶片324可係為本文中所述之一接合式晶片,且其中經薄化晶片側在第15圖及第16圖中係面向上且在第17圖中係面向右,俾使在衝擊狀態中係與經薄化晶片側進行嚙合。 Referring to Figures 15 through 17, a front open wafer container 300 is schematically illustrated having a container portion 302, a front door 304, a plurality of wafer shelves 306 defining a wafer shelf seating location 310, and a plurality of front The wafer support 314 and the plurality of backward wafer supports 318. The forward wafer supports have a spring 320. In a horizontal position in which the door is opened, the wafer 324 is placed on the shelves. When the door is latched to the front opening 326, the wafers are lifted by the wafer engaging portion 330 of the wafer supports 314, 318 to the transport position 327 shown in FIG. In transport At this time, the wafer container can be partially rotated to the position shown in Fig. 17. Figure 17 illustrates an impact condition in which a force impacts one of the lower corners of the container to cause displacement of the wafer, causing the wafers to engage the impact condition cushion 333. The impact state cushion can be secured to the wafer support or can be attached to the front door wall or rear wall. The illustrated wafer 324 can be one of the bonded wafers described herein, and wherein the thinned wafer side faces up in the 15th and 16th views and faces the right in the 17th figure, causing the impact The state is engaged with the thinned wafer side.
參照第21圖及第22圖,本發明之各種實施例可在晶片邊緣嚙合部356之主要非衝擊運輸安放位置353之二個側上具有衝擊狀態緩衝墊350。在一前裝式晶片載具中,晶片360可嚙合晶片嚙合部之一下部斜坡、跨過該斜坡到達主要運輸安放位置353且在門完全閉合後使彈簧部364及墊366偏轉,俾使衝擊狀態緩衝墊350被暴露出。在一衝擊狀態中,該等衝擊狀態緩衝墊可用於保護晶片(例如防止與晶片邊緣嚙合部脫離)且提供衝擊吸收。 Referring to Figures 21 and 22, various embodiments of the present invention can have an impact condition cushion 350 on either side of the primary non-impact transport mounting position 353 of the wafer edge engaging portion 356. In a front loading wafer carrier, the wafer 360 can engage a lower slope of the wafer engaging portion, across the ramp to the primary transport seating location 353, and deflect the spring portion 364 and the pad 366 after the door is fully closed, causing the impact The status cushion 350 is exposed. In an impact state, the impact state cushions can be used to protect the wafer (e.g., prevent detachment from the wafer edge engagement portion) and provide shock absorption.
參照第23圖至第31圖,在一實施例中,一前部開口晶片容器420大體包含一容器部430及一門432。具體參照第23圖至第26圖,該門包含具有一內壁440之一門底架438,其中一對閂鎖機構442、443安裝至該底架且暴露於該門之外側445上。一前向主要晶片支撐件450可安裝於內壁440上且具有一對由複數個懸伸彈簧指狀部469形成之行454、456,懸伸彈簧指狀部469具有一細長彈簧部470及與該等彈簧部成整體之複數個晶片邊緣接納部472。各該晶片邊緣接納部472具有一V形凹槽476,以用於接納一晶片之邊緣。該前向主要晶片支撐件更具有被構形為複數個彈簧閂鎖480之一結構480,以用於附裝至內壁上被構形為複數個突起部(boss)482之一協作式結構482,進而將該前向主要晶片支撐件固定至該門之面向內部之側485。 Referring to Figures 23 through 31, in one embodiment, a front open wafer container 420 generally includes a container portion 430 and a door 432. Referring specifically to Figures 23 through 26, the door includes a door chassis 438 having an inner wall 440 to which a pair of latching mechanisms 442, 443 are mounted and exposed to the outer side 445 of the door. A forward main wafer support 450 can be mounted to the inner wall 440 and has a pair of rows 454, 456 formed by a plurality of overhanging spring fingers 469 having an elongated spring portion 470 and A plurality of wafer edge receiving portions 472 integral with the spring portions. Each of the wafer edge receiving portions 472 has a V-shaped recess 476 for receiving the edge of a wafer. The forward main wafer support further has a structure 480 configured as a plurality of spring latches 480 for attachment to an inner wall configured as a cooperative structure of a plurality of bosses 482 482, in turn, securing the forward main wafer support to the inwardly facing side 485 of the door.
門底架438之內壁440更具有自內壁440延伸之複數個整體形成之突伸部490,以用於預防交叉槽。該等突伸部係與底架一體模製而成且被定位成位於由晶片在擱架上之擱架安放位置所界定之晶片槽中間且位於晶片在由該前向主要晶片支撐件及一後向晶片支撐件支撐時之正常運輸安放位置中間。在例如前開式運輸盒等習用裝運容器中,晶片在由前向主要晶片支撐件及對應後向支撐件支撐時將被抬升至擱架上之運輸安放位置上方,例如第34圖及第35圖所例示。 The inner wall 440 of the door frame 438 further has a plurality of integrally formed projections 490 extending from the inner wall 440 for preventing the intersecting grooves. The projections are integrally molded with the chassis and positioned to be intermediate the wafer pocket defined by the shelf position of the wafer on the shelf and located in the wafer by the forward main wafer support and The middle of the normal transport placement position when the rear wafer support is supported. In a conventional shipping container such as a front-opening transport case, the wafer will be lifted above the transport placement position on the shelf when supported by the front main wafer support and the corresponding rear support, such as Figures 34 and 35. Illustrated.
前向交叉槽預防突伸部490可具有在遠離門之一方向上變窄之一錐形部,且可具有遠離門突伸之複數個節點492。該等節點容許在該等突伸部中使用一最小量之聚合物,此有助於使模製過程中之變形最小化,同時提供適用於嚙合自其運輸安放位置移出之(複數個)晶片之一上接觸表面及一下接觸表面。三個節點係為適宜的。 The forward intersecting groove prevention projection 490 can have a tapered portion that narrows in a direction away from one of the doors, and can have a plurality of nodes 492 that protrude away from the door. The nodes permit the use of a minimum amount of polymer in the projections, which helps to minimize distortion during the molding process, while providing a plurality of wafers adapted to be engaged from the transport position. One of the upper contact surface and the lower contact surface. Three nodes are suitable.
參照第27圖至第31圖,其繪示第23圖所示前部開口晶片容器之容器部430之細節。該容器部包含一殼體502(獨立地繪示於第29圖中),殼體502提供一整體壁504,整體壁504圍繞左側505、右側506、頂部507、底部508、及後側509延伸。該容器部更包含:一機器人凸緣510,附裝於殼體之頂部512處;一對由複數個晶片擱架518形成之行516、517,附裝至殼體之一內表面520;以及複數個運動耦合組件(kinematic coupling component)526,在殼體之底部508處附裝至外表面528。整體壁504上設置有一附裝結構532,以用於接納左側及右側上之把手,且該殼體包含一前向門框架536。該等擱架附裝至一後向後壁結構537及一側壁結構538。在某些實施例中,該等行516、517之晶片擱架518包含與擱架518成整體之複數個後向主要晶片支撐件540。各該晶片支撐件包含一行晶片嚙合部544,各該晶片嚙合部 544在正常運輸安放位置具有一下斜坡部546及一V形凹槽550。當門被安放於門框架536中時,該等斜坡部將晶片之後向邊緣向上提升離開晶片擱架。 Referring to Figures 27 through 31, the details of the container portion 430 of the front open wafer container shown in Figure 23 are shown. The container portion includes a housing 502 (indicated separately in FIG. 29) that provides an integral wall 504 that extends around the left side 505, the right side 506, the top 507, the bottom 508, and the rear side 509 . The container portion further includes: a robotic flange 510 attached to the top 512 of the housing; a pair of rows 516, 517 formed by a plurality of wafer shelves 518 attached to an inner surface 520 of the housing; A plurality of kinematic coupling components 526 are attached to the outer surface 528 at the bottom 508 of the housing. The integral wall 504 is provided with an attachment structure 532 for receiving the handles on the left and right sides, and the housing includes a forward door frame 536. The shelves are attached to a rearward rear wall structure 537 and a side wall structure 538. In some embodiments, the wafer shelves 518 of the rows 516, 517 include a plurality of rearward main wafer supports 540 integral with the shelves 518. Each of the wafer support members includes a row of wafer engaging portions 544, each of the wafer engaging portions The 544 has a lower ramp portion 546 and a V-shaped recess 550 in the normal transport placement position. When the door is placed in the door frame 536, the ramps lift the wafer back up the edge away from the wafer shelf.
在一衝擊狀態或其他可能會將一或複數個晶片逐出其正常運輸安放位置之狀態下,後壁突伸部490在與該等行之擱架成整體之後晶片支撐件處達成交叉槽預防。由於預期突伸部幾乎不與晶片接觸,因此該等突伸部不會遭受習用晶片支撐件所常見之磨損或其他變形。因此,該等突伸部不需要係為可更換的。與具有突伸部之一可附裝件相較,此提供如下優點:微粒捕獲區域較少且在清潔後乾燥成問題之區亦較少。 In an impact state or other state in which one or more wafers may be ejected from their normal transport position, the rear wall projections 490 may be crossed at the wafer support after being integrated with the shelves of the rows. . Since the projections are expected to be barely in contact with the wafer, the projections are not subject to wear or other deformations common to conventional wafer supports. Therefore, the projections need not be replaceable. This provides the advantage of having fewer particulate capture areas and less problematic drying after cleaning, as compared to an attachable member having a projection.
參照第32圖至第35圖,所示意性例示之一前部開口晶片容器600具有一容器部602、一前門604、界定一晶片擱架安放位置610之複數個晶片擱架606、複數個前向晶片支撐件614、及複數個後向晶片支撐件618。在此實施例中,該等後向晶片支撐件位於由複數個擱架形成之行617處,且該等晶片支撐件包含靠近各該行擱架之最後向部分定位之複數個斜坡619。前向晶片支撐件614具有由一螺旋彈簧符號描繪之一彈簧臂620、及一斜坡部621。在使門打開之一水平位置中,如第32圖及第34圖中所示,晶片624安放於擱架上。當門被閂鎖至開口前部626時,晶片由晶片支撐件614、618之晶片嚙合部630抬升至第33圖及第35圖中所示之運輸安放位置627。為進行運輸,可將晶片容器局部地向後旋轉四分之一圈,藉以使晶片被垂直定向(圖中未顯示)。交叉槽預防突伸部654、655自前門延伸出,且可與前門內壁或殼體後壁成整體、或者可附裝至前門內壁或殼體後壁。 Referring to Figures 32 through 35, a front open wafer container 600 is schematically illustrated having a container portion 602, a front door 604, a plurality of wafer shelves 606 defining a wafer shelf seating position 610, and a plurality of front Wafer support 614, and a plurality of backward wafer supports 618. In this embodiment, the rearward wafer supports are located at a row 617 formed by a plurality of shelves, and the wafer supports comprise a plurality of ramps 619 positioned adjacent the last portion of each row of shelves. The forward wafer support 614 has a spring arm 620 depicted by a helical spring symbol and a ramp portion 621. In a horizontal position in which the door is opened, as shown in Figs. 32 and 34, the wafer 624 is placed on the shelf. When the door is latched to the open front portion 626, the wafer is lifted by the wafer engaging portion 630 of the wafer support members 614, 618 to the transport mounting position 627 shown in Figures 33 and 35. For transport, the wafer container can be rotated partially back a quarter turn to allow the wafer to be oriented vertically (not shown). The intersecting groove prevention projections 654, 655 extend from the front door and may be integral with the front door inner wall or the housing rear wall or may be attached to the front door inner wall or the housing rear wall.
本文中所使用之「衝擊狀態緩衝部」可係指一離散組件、或者一組件之一部分或區段。衝擊狀態緩衝墊、衝擊狀態緩衝部及突伸部可係由不止一種聚合物(例如,一剛性聚合物與由一較軟及/或彈性聚合物形 成之一塗層或經包覆模製部)形成。在某些實施例中,可首先模製較軟塗層,且其次可模製較剛性支撐聚合物。 As used herein, "impact state buffer" may refer to a discrete component, or a portion or section of a component. The impact state cushion, the impact state buffer and the protrusion may be composed of more than one polymer (for example, a rigid polymer and a softer and/or elastic polymer) Formed as one coating or overmolded. In certain embodiments, a softer coating can be molded first, and a more rigid support polymer can be molded second.
本申請案之所有章節中之上述參考文獻出於所有目的以引用方式全文併入本文中。為便於解釋申請專利範圍,除非在一請求項中敍述特定用語「用於...之元件」或「用於...之步驟」,否則明確打算將不援引35 U.S.C.之第112節第6項之規定。 The above references in all of the sections of this application are hereby incorporated by reference in their entirety for all purposes. In order to facilitate the interpretation of the scope of the patent application, unless a specific term "a component for" or "a step for" is described in a request, it is expressly intended not to invoke 35 USC section 112, section 6. The provisions of the item.
本說明書(包含以引用方式併入之參考文獻,包含任何隨附申請專利範圍、摘要及附圖)中所揭露之所有特徵及/或如此揭露之任一方法或製程之所有步驟皆可以任一組合形式進行組合,但不包含此等特徵及/或步驟其中之至少某些相互排斥之組合。 All of the features disclosed in the specification (including any of the accompanying claims, including the accompanying claims, the abstract, and the drawings) and/or all of the methods or processes disclosed herein may be Combinations are combined, but do not include combinations of such features and/or steps, at least some of which are mutually exclusive.
除非另有明確陳述,否則本說明書(包含以引用方式併入之參考文獻,包含任何隨附申請專利範圍、摘要及附圖)中所揭露之每一特徵可由用於相同、等效或類似目的之替代特徵替換。因此,除非另有明確陳述,否則所揭露之每一特徵僅係為一系列泛用等效或類似特徵之一實例。 Every feature disclosed in this specification (including the contents of the accompanying claims, including the accompanying claims, the disclosure and the drawings) Replacement features are replaced. Therefore, unless expressly stated otherwise, each feature disclosed is merely an example of a series of generic equivalents or similar features.
本發明並不限於前述實施例之細節,而是可擴展至本說明書(包含任何以引用方式併入之參考文獻,包含任何隨附申請專利範圍、摘要及附圖)所揭露特徵其中之任一新穎特徵或該等特徵之任一新穎組合,或者擴展至如此揭露之任一方法或製程之步驟其中之任一新穎步驟或該等步驟之任一新穎組合。本申請案之所有章節中之上述參考文獻出於所有目的以引用方式全文併入本文中。 The invention is not limited to the details of the foregoing embodiments, but may be extended to any of the features disclosed in the specification, including any of the accompanying claims, including any accompanying claims, abstracts and drawings. A novel feature or any novel combination of such features, or any novel step or any novel combination of steps of any of the methods or processes disclosed herein. The above references in all of the sections of this application are hereby incorporated by reference in their entirety for all purposes.
雖然本文中已例示及闡述了特定實例,但此項技術領域中具有通常知識者將瞭解,可用旨在達成相同目的之任一配置來替代所示特定 實例。本申請案旨在涵蓋本標的物之更改或變化形式。因此,意欲使本發明由隨附申請專利範圍及其合法等效內容以及以下例示性態樣界定。本發明之上述實施例僅說明本發明之原理且不應被視為限制性。熟習相應技術者將會想到對本文所揭露實施例之其他潤飾,且所有此等潤飾皆被視為處於本發明之範圍內。 Although specific examples have been illustrated and described herein, those of ordinary skill in the art will appreciate that any configuration that is intended to achieve the same purpose can be substituted for the particulars shown. Example. This application is intended to cover alternative or variations of the subject matter. Accordingly, the invention is intended to be defined by the appended claims The above-described embodiments of the present invention are merely illustrative of the principles of the invention and should not be considered as limiting. Other retouchings of the embodiments disclosed herein will be apparent to those skilled in the art, and all such refinements are considered to be within the scope of the invention.
30‧‧‧容器部 30‧‧‧ Container Department
33‧‧‧開口內部 33‧‧‧open interior
34‧‧‧晶片 34‧‧‧ wafer
36‧‧‧門框架 36‧‧‧ door frame
38‧‧‧開口前部 38‧‧‧ Opening front
42‧‧‧左側 42‧‧‧left side
44‧‧‧右側 44‧‧‧right
46‧‧‧頂側 46‧‧‧ top side
48‧‧‧底側 48‧‧‧ bottom side
54‧‧‧右側壁 54‧‧‧ right wall
56‧‧‧頂側壁 56‧‧‧ top side wall
57‧‧‧後壁 57‧‧‧ Back wall
58‧‧‧底壁 58‧‧‧ bottom wall
80‧‧‧晶片擱架 80‧‧‧ wafer shelf
82‧‧‧後向晶片支撐系統 82‧‧‧Backward wafer support system
84‧‧‧衝擊事件保護特徵 84‧‧‧ Impact event protection features
Claims (18)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| US201562138229P | 2015-03-25 | 2015-03-25 |
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| TW201709386A true TW201709386A (en) | 2017-03-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW105109426A TW201709386A (en) | 2015-03-25 | 2016-03-25 | Wafer container |
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| TW (1) | TW201709386A (en) |
| WO (1) | WO2016154536A1 (en) |
Cited By (1)
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|---|---|---|---|---|
| TWI756402B (en) * | 2017-04-06 | 2022-03-01 | 日商未來兒股份有限公司 | Substrate storage container |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US6267245B1 (en) * | 1998-07-10 | 2001-07-31 | Fluoroware, Inc. | Cushioned wafer container |
| JP3938293B2 (en) * | 2001-05-30 | 2007-06-27 | 信越ポリマー株式会社 | Precision substrate storage container and its holding member |
| CN102017118B (en) * | 2008-04-25 | 2013-03-06 | 信越聚合物株式会社 | Holder and substrate storage container including the holder |
| JP2010199189A (en) * | 2009-02-24 | 2010-09-09 | Shin Etsu Polymer Co Ltd | Substrate storage container and method to pick out substrate |
| JP5416154B2 (en) * | 2011-03-22 | 2014-02-12 | Hoya株式会社 | Substrate storage container, glass substrate storage body with film, mask blank storage body, and transfer mask storage body |
-
2016
- 2016-03-25 WO PCT/US2016/024213 patent/WO2016154536A1/en not_active Ceased
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| TWI756402B (en) * | 2017-04-06 | 2022-03-01 | 日商未來兒股份有限公司 | Substrate storage container |
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