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TW201708159A - Magneto-optical material, method for producing same and magneto-optical device - Google Patents

Magneto-optical material, method for producing same and magneto-optical device Download PDF

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TW201708159A
TW201708159A TW105107417A TW105107417A TW201708159A TW 201708159 A TW201708159 A TW 201708159A TW 105107417 A TW105107417 A TW 105107417A TW 105107417 A TW105107417 A TW 105107417A TW 201708159 A TW201708159 A TW 201708159A
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magnetic optical
oxide
cerium
optical
pyrochlore
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TW105107417A
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TWI673249B (en
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松本卓士
碇真憲
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信越化學工業股份有限公司
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Abstract

Provided, as a transparent magneto-optical material which does not absorb fiber laser light within a wavelength range of 0.9-1.1 [mu]m and is thus suitable for constituting a magneto-optical device such as an optical isolator wherein the formation of a thermal lens is suppressed, is a magneto-optical material which is composed of a transparent ceramic that contains a composite oxide represented by formula (1) as a main component, or which is composed of a single crystal of a composite oxide represented by formula (1). Tb2xR2(2-x)O8-x (1) (In the formula, 0.800 < x < 1.00, and R represents at least one element selected from the group consisting of silicon, germanium, titanium, tantalum, tin, hafnium and zirconium (excluding the cases where R represents only silicon, germanium or tantalum)).

Description

磁性光學材料及其製造方法、與磁性光學裝置 Magnetic optical material, manufacturing method thereof, and magnetic optical device

本發明係關於磁性光學材料及磁性光學裝置,更詳細而言係關於適於構成光隔離器等之磁性光學裝置之由包含複合氧化物的透明陶瓷或單晶所構成之磁性光學材料及其製造方法,以及使用該磁性光學材料之磁性光學裝置。 The present invention relates to a magnetic optical material and a magnetic optical device, and more particularly to a magnetic optical material composed of a transparent ceramic or a single crystal containing a composite oxide, which is suitable for a magnetic optical device constituting an optical isolator or the like, and a manufacturing thereof A method, and a magnetic optical device using the magnetic optical material.

近年來,高輸出化成為可能,而使用光纖雷射的雷射加工機之普及化驚人。另外,被組入雷射加工機之雷射光源係若來自外部的光入射,則共振狀態會不安定化,而引起振盪狀態混亂的現象。尤其,若所振盪的光被途中之光學系統所反射而返回至光源,則振盪狀態會被大幅擾亂。為了防止此事,通常在光源的前面等設置光隔離器。 In recent years, high output has become possible, and the popularity of laser processing machines using fiber lasers has been remarkable. Further, when the laser light source incorporated in the laser processing machine is incident from the outside, the resonance state is not stabilized, and the oscillation state is disturbed. In particular, if the oscillated light is reflected by the optical system on the way and returned to the light source, the oscillation state is greatly disturbed. In order to prevent this, an optical isolator is usually provided in front of the light source or the like.

光隔離器係由法拉第轉子、配置於法拉第轉子之光入射側的偏光鏡、以及配置於法拉第轉子之光射出側的分析器所構成。又,法拉第轉子係與光之行進方向平行地施加磁場來進行利用。此時,光的偏振線段係在法拉 第轉子中無論前進或後退皆只會朝一定方向進行旋轉。再者,法拉第轉子係光的偏振線段被調整成剛好45度旋轉的長度。在此,若將偏光鏡與分析器的偏振面朝前進的光之旋轉方向偏移45度,則前進的光之偏振係由於在偏光鏡位置與分析器位置為一致而會透過。另一方面,後退的光之偏振係成為與從分析器位置偏移45度的偏光鏡之偏振面的偏移角方向逆旋轉地45度旋轉。是故,偏光鏡位置之返回光的偏振面係相對於偏光鏡之偏振面而成為45度-(-45度)=90度之偏移,而無法透過偏光鏡。如此般前進的光係進行透過、射出,後退的光係發揮作為進行遮斷的光隔離器之功能。 The optical isolator is composed of a Faraday rotator, a polarizer disposed on the light incident side of the Faraday rotator, and an analyzer disposed on the light exit side of the Faraday rotator. Further, the Faraday rotator system applies a magnetic field in parallel with the traveling direction of the light. At this point, the polarization of the light is tied to Farah No advance or retreat in the first rotor will only rotate in a certain direction. Furthermore, the polarization section of the Faraday rotator light is adjusted to a length of exactly 45 degrees of rotation. Here, when the polarization plane of the polarizer and the analyzer is shifted by 45 degrees in the direction of rotation of the forward light, the polarization of the forward light is transmitted because the position of the polarizer coincides with the position of the analyzer. On the other hand, the polarization of the retreating light is rotated 45 degrees counterclockwise with respect to the offset angle direction of the plane of polarization of the polarizer shifted by 45 degrees from the analyzer position. Therefore, the polarization plane of the returning light at the position of the polarizer is shifted by 45 degrees - (-45 degrees) = 90 degrees with respect to the plane of polarization of the polarizer, and cannot pass through the polarizer. The light that has proceeded in this way is transmitted and emitted, and the light that has been retracted functions as an optical isolator that blocks.

上述,在作為構成光隔離器之法拉第轉子所使用的材料,以往已知有TGG結晶(Tb3Ga5O12)或TSAG結晶(Tb(3-x)Sc2Al3O12)(日本特開2011-213552號公報(專利文獻1)、日本特開2002-293693號公報(專利文獻2))。TGG結晶之伐得常數(Verdet constant)較大,為40rad/(T.m)(亦即,0.14min/(Oe.cm)),目前被廣泛搭載作為標準的光纖雷射裝置用。TSAG結晶之伐得常數為TGG結晶的1.3倍左右(亦即,0.18min/(Oe.cm)左右),此亦為被搭載於光纖雷射裝置的材料。 As described above, in the material used as the Faraday rotator constituting the optical isolator, TGG crystals (Tb 3 Ga 5 O 12 ) or TSAG crystals (Tb (3-x) Sc 2 Al 3 O 12 ) have been known (Japanese special Japanese Laid-Open Patent Publication No. JP-A-2002-293693 (Patent Document 2)). The TGG crystal has a large Verdet constant of 40 rad/(T.m) (i.e., 0.14 min/(Oe.cm)) and is currently widely used as a standard fiber laser device. The TSAG crystal has a reduction constant of about 1.3 times that of the TGG crystal (that is, about 0.18 min/(Oe.cm)), which is also a material that is mounted on a fiber laser device.

除上述以外,於日本特開2010-285299號公報(專利文獻3)係揭示有(TbxR1-x)2O3(x係0.4≦x≦1.0),R係以由鈧、釔、鑭、銪、釓、鐿、鈥、及鎦所成 之群中選出的氧化物作為主成分之單晶或陶瓷。由上述成分所構成的氧化物係伐得常數為0.18min/(Oe.cm)以上,在實施例中係有記載最大至0.33min/(Oe.cm)者。又,於同一文獻之本文中亦記載有TGG之伐得常數為0.13min/(Oe.cm)。兩者之伐得常數之差實際達2.5倍。 In addition to the above, JP-A-2010-285299 (Patent Document 3) discloses (Tb x R 1-x ) 2 O 3 (x-based 0.4≦x≦1.0), and R is derived from 钪, 钇, A single crystal or ceramic in which an oxide selected from the group consisting of ruthenium, osmium, iridium, osmium, iridium, and osmium is used as a main component. The oxide-based constant of the above-mentioned components is 0.18 min/(Oe.cm) or more, and in the examples, the maximum is 0.33 min/(Oe.cm). Further, in the same document, the TGD has a cutting constant of 0.13 min/(Oe.cm). The difference between the two is actually 2.5 times.

於日本特開2011-121837號公報(專利文獻4)中亦揭示有由大致相同成分所構成之氧化物,且記載具有比TGG單晶更大的伐得常數。 An oxide composed of substantially the same component is also disclosed in Japanese Laid-Open Patent Publication No. 2011-121837 (Patent Document 4), and it is described that it has a larger cutting constant than a TGG single crystal.

如上述專利文獻3、4般,若得到伐得常數大的光隔離器,則可縮短為了45度旋轉所必要的全長,使光隔離器之小型化,而為佳。 As in the case of the above-mentioned Patent Documents 3 and 4, when an optical isolator having a large reduction constant is obtained, the total length necessary for the rotation of 45 degrees can be shortened, and the optical isolator can be reduced in size.

然而,上述專利文獻3、4所揭示的(TbxR1-x)2O3氧化物,雖確實與專利文獻1所揭示之TGG結晶,或者專利文獻3之本文中所提及之TGG結晶相比,伐得常數為1.4~2.5倍乃非常大,但該氧化物雖僅少量但仍會吸收其利用所想定之波長範圍0.9~1.1μm之光纖雷射光。近年之光纖雷射裝置係其輸出幾乎功率化,即使為具有少量吸收之光隔離器,若搭載於其,則亦會導致因熱透鏡效果造成之光束品質的劣化而成為問題。 However, the above Patent Documents 3 and 4 disclosed (Tb x R 1-x) 2 O 3 oxide, although indeed TGG crystal disclosed in Patent Document 1, the Patent Document 3 herein or in the crystalline and the mentioned TGG In contrast, the reduction constant is 1.4 to 2.5 times, which is very large, but the oxide is only a small amount, but it still absorbs the optical fiber laser light using the desired wavelength range of 0.9 to 1.1 μm. In recent years, optical fiber laser devices have almost reduced output, and even if they are mounted as optical isolators with a small amount of absorption, they cause problems due to deterioration of beam quality due to the thermal lens effect.

相同地,作為每單位長度之伐得常數為非常大的材料,具有包含鐵(Fe)之釔鐵石榴石(通稱:YIG)單晶(日本特開2000-266947號公報(專利文獻5))。但,鐵(Fe)係於波長0.9μm具有大的光吸收, 於波長0.9~1.1μm範圍之光隔離器係出現此光吸收的影響。因此,使用此釔鐵石榴石單晶的光隔離器成為非常難以利用在高輸出化傾向顯著的光纖雷射裝置。 In the same manner, a material having a very large cutting constant per unit length and having a yttrium iron garnet (general name: YIG) containing iron (Fe) (Japanese Patent Laid-Open Publication No. 2000-266947 (Patent Document 5)) . However, iron (Fe) has a large light absorption at a wavelength of 0.9 μm. This optical absorption occurs in an optical isolator with a wavelength in the range of 0.9 to 1.1 μm. Therefore, an optical isolator using this yttrium iron garnet single crystal is extremely difficult to utilize a fiber laser device which has a high tendency to be high in output.

又,TGG結晶(Tb3Ga5O12)或TSAG結晶((Tb(3-x)Scx)Sc2Al3O12)所屬之石榴石型氧化物係若元素之摻合比率偏離化學計量比,則容易生成石榴石構造以外之結晶相一事乃在該業者之間一般所知悉,因原料摻合時之組成偏離導致的透光性之急遽的降低或良率的降低係成為問題。 Further, the garnet-type oxide of the TGG crystal (Tb 3 Ga 5 O 12 ) or the TSAG crystal ((Tb (3-x) Sc x ) Sc 2 Al 3 O 12 ) belongs to the stoichiometry. In comparison with the fact that it is easy to form a crystal phase other than the garnet structure, it is generally known among the industry, and the rapid decrease in light transmittance or the decrease in yield due to compositional deviation when the raw material is blended is a problem.

作為此等之既存材料的代替係可列舉具有燒綠石型之結晶構造的氧化物。燒綠石型結晶係具有A2B2O7之結晶構造,若A離子與B離子之半徑比在一定之範圍內則具有立方晶構造,此乃大眾所知悉。若選擇結晶構造為成立方晶的材料,則單晶係當然,即使為陶磁體亦成為可製作具有高透明性之材料,因而有望作為各種的光學材料之應用。 As an alternative to such an existing material, an oxide having a crystal structure of a pyrochlore type can be cited. The pyrochlore type crystal system has a crystal structure of A 2 B 2 O 7 , and has a cubic crystal structure when the radius ratio of the A ion to the B ion is within a certain range, which is known to the public. When a crystal structure is selected as a material for forming a cubic crystal, the single crystal system is of course capable of producing a material having high transparency even if it is a ceramic magnet, and thus it is expected to be used as various optical materials.

作為如此之燒綠石型材料之例,於日本特開2005-330138號公報(專利文獻6)中係揭示有一種立方晶系鈦氧化物燒綠石燒結體,其係於A部位具有稀土類元素RE之立方晶系鈦氧化物燒綠石當中,該A部位之元素RE係由Lu、Yb、Tm、Er、Ho、Y、Sc、Dy、Tb、Gd、Eu、Sm、Ce之各元素當中的一個或二個以上所成之複合氧化物RE2-xTi2O7-δ,其特徵為,藉由將前述A部位元素RE之不定比量x對應於該A部位元素RE而設為 0<x<0.5之範圍內的電子導電性陶瓷粉體進行燒結,其後進行還原處理所形成。由於用途為電子導電性陶瓷,因此並無提及該燒結體之透明度,僅普通地燒結,而完成通常不透明燒結體一事乃該業者之間所知悉,雖推定專利文獻6記載之材料亦不可利用作為光學材料用途,但包含Tb之鈦氧化物綠石燒可成為立方晶的資訊乃藉由該專利文獻6所揭示。 An example of such a pyrochlore-type material is disclosed in Japanese Laid-Open Patent Publication No. 2005-330138 (Patent Document 6), which is a cubic-crystalline titanium oxide pyrochlore sintered body having a rare earth in the A portion. In the cubic crystal titanium oxide pyrochlore of element RE, the element RE of the A site is composed of elements of Lu, Yb, Tm, Er, Ho, Y, Sc, Dy, Tb, Gd, Eu, Sm, and Ce. One or more of the composite oxides RE 2-x Ti 2 O 7-δ formed by the fact that the indefinite ratio x of the A-site element RE corresponds to the A-site element RE The electronically conductive ceramic powder in the range of 0 < x < 0.5 is sintered and then subjected to a reduction treatment. Since the use is an electronically conductive ceramic, there is no mention of the transparency of the sintered body, and it is generally sintered, and the completion of the generally opaque sintered body is known to the industry, although it is presumed that the material described in Patent Document 6 is not available. As an optical material, information on the fact that the titanium oxide greenstone containing Tb can be cubic crystal is disclosed by the patent document 6.

但,之前,於單純的Tb之矽氧化物中無法成立方晶一事已另外得知("Rare earth disilicates R2Si2O7(R=Gd,Tb,Dy,Ho):type B",Z.,Kristallogr.,Vol.218 No.12 795-801(2003)(非專利文獻1))。 However, it has been previously known that the square crystal cannot be formed in the oxide of pure Tb ("Rare earth disilicates R2Si2O7 (R=Gd, Tb, Dy, Ho): type B", Z., Kristallogr., Vol. 218 No. 12 795-801 (Non-Patent Document 1)).

又,同期間,揭示有雖完全不包含Tb,但某種稀土類鉿氧化物成立方晶燒綠石構造,而具有透光性的事實("Fabrication of transparent La2Hf2O7 ceramics from combustion synthesized powders",Mat.Res.Bull.40(3)553-559(2005)(非專利文獻2))。 In the same period, the fact that there is no Tb at all, but a certain rare earth lanthanum oxide forms a cubic crystal structure and has translucency ("Fabrication of transparent La 2 Hf 2 O 7 ceramics from combustion" Synthesized powders", Mat. Res. Bull. 40 (3) 553-559 (2005) (Non-Patent Document 2)).

再者,於日本特開2010-241677號公報(專利文獻7)中係揭示一種光學陶瓷,其係具有各個結晶之至少95重量%,較佳為至少98重量%為立方晶黃綠石或螢石構造,且包含化學計量之化合物 A2+xByDzE7 Further, in Japanese Laid-Open Patent Publication No. 2010-241677 (Patent Document 7), an optical ceramic having at least 95% by weight of each crystal, preferably at least 98% by weight, is a cubic chlorite or fluorite structure. And contains stoichiometric compound A 2+x B y D z E 7

在此,-1.15≦x≦0及0≦y≦3及0≦x≦1.6以及3x+4y+5z=8,且A係由稀土類金屬氧化物之群中選出的至少1個之3價陽離子,B係至少1個4價陽離子,D係至少1個5價陽離子,及E係至少1個2價陰離子的多結晶、透明光學陶瓷,A係由Y、Gd、Yb、Lu、Sc及La中所選出,B係由Ti、Zr、Hf、Sn及Ge中所選出,可確認雖完全不包含Tb,但包含數種稀土類的鈦氧化物、鋯氧化物、鉿氧化物、錫氧化物、鍺氧化物係可成98重量%以上之立方晶黃綠石(燒綠石)構造。 Here, -1.15≦x≦0 and 0≦y≦3 and 0≦x≦1.6 and 3x+4y+5z=8, and A is a valence of at least one selected from the group of rare earth metal oxides. a cation, B is at least one tetravalent cation, D is at least one pentavalent cation, and E is a polycrystalline or transparent optical ceramic having at least one divalent anion of E, and A is composed of Y, Gd, Yb, Lu, Sc, and Selected from La, B is selected from Ti, Zr, Hf, Sn, and Ge. It is confirmed that titanium oxide, zirconium oxide, niobium oxide, and tin oxide containing several kinds of rare earths are not contained at all. The material and the lanthanum oxide structure may be 98% by weight or more of a cubic yellow chlorite (pyrochlore) structure.

又,燒綠石型氧化物係即使偏離形成A離子與B離子之摻合比率為理想的燒綠石構造之1比1的化學計量比,在某範圍之中亦顯示容許立方晶燒綠石相一事,推測可抑制在石榴石型氧化物所看到的因原料摻合時之組成偏離導致的透光性之急遽的降低或良率的降低("Phase equilibria in the refractory oxide systems of zirconia,hafnia and yttria with rare-earth oxides",J.Eur.Ceram.Soc.28 2363-2388(2008)(非專利文獻3)、"Stuffed rare earth pyrochlore solid solutions",J.solid state chem.179 3126-3135(2006)(非專利文獻4))。 Further, the pyrochlore-type oxide system exhibits a stoichiometric ratio of 1 to 1 which is an ideal pyrochlore structure even if the blend ratio of the formed A ions and B ions is deviated, and the cubic crystal pyrochlore is also allowed to exhibit in a certain range. In contrast, it is speculated that the sharp decrease in light transmittance or the decrease in yield due to compositional deviation when the raw material is blended as seen in the garnet-type oxide can be suppressed ("Phase equilibria in the refractory oxide systems of zirconia," Hafnia and yttria with rare-earth oxides", J. Eur. Ceram. Soc. 28 2363-2388 (2008) (Non-Patent Document 3), "Stuffed rare earth pyrochlore solid solutions", J. solid state chem. 179 3126- 3135 (2006) (Non-Patent Document 4)).

但,迄今仍無對燒綠石型氧化物,且為一邊維持包含Tb離子的立方晶構造,一邊進一步使A離子與B離子之摻合比率積極地偏離化學計量比,藉此而使透明 性更高,因而可利用於高輸出雷射的磁性光學材料加以探討的公知例。 However, there has been no pyrochlore-type oxide until now, and while maintaining the cubic crystal structure containing Tb ions, the blend ratio of A ions and B ions is further deviated from the stoichiometric ratio, thereby making it transparent. A more well-known example of a magnetic optical material that can be utilized for high output lasers.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2011-213552號公報 [Patent Document 1] Japanese Laid-Open Patent Publication No. 2011-213552

[專利文獻2]日本特開2002-293693號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2002-293693

[專利文獻3]日本特開2010-285299號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2010-285299

[專利文獻4]日本特開2011-121837號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2011-121837

[專利文獻5]日本特開2000-266947號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2000-266947

[專利文獻6]日本特開2005-330133號公報 [Patent Document 6] Japanese Patent Laid-Open Publication No. 2005-330133

[專利文獻7]日本特開2010-241677號公報 [Patent Document 7] Japanese Patent Laid-Open Publication No. 2010-241677

[非專利文獻] [Non-patent literature]

[非專利文獻1]"Rare earth disilicates R2Si2O7 (R=Gd, Tb, Dy, Ho) : type B", Z., Kristallogr., Vol.218 No.12 795-801 (2003) [Non-Patent Document 1] "Rare earth disilicates R2Si2O7 (R = Gd, Tb, Dy, Ho) : type B", Z., Kristallogr., Vol. 218 No. 12 795-801 (2003)

[非專利文獻2]"Fabrication of transparent La2Hf2O7 ceramics from combustion synthesized powders", Mat. Res. Bull. 40 (3) 553-559 (2005) [Non-Patent Document 2] "Fabrication of transparent La 2 Hf 2 O 7 ceramics from combustion synthesized powders", Mat. Res. Bull. 40 (3) 553-559 (2005)

[非專利文獻3]"Phase equilibria in the refractory oxide systems of zirconia, hafnia and yttria with rare-earth oxides", J. Eur. Ceram. Soc. 28 2363-2388 (2008) [Non-Patent Document 3] "Phase equilibria in the refractory oxide systems of zirconia, hafnia and yttria with rare-earth oxides", J. Eur. Ceram. Soc. 28 2363-2388 (2008)

[非專利文獻4]"Stuffed rare earth pyrochlore solid solutions", J. solid state chem. 179 3126-3135 (2006) [Non-Patent Document 4] "Stuffed rare earth pyrochlore solid Solutions", J. solid state chem. 179 3126-3135 (2006)

本發明係鑑於上述情事而完成者,其目的為提供一種磁性光學材料,其係適用於構成因不會吸收波長範圍0.9~1.1μm之光纖雷射光而抑制了熱透鏡之發生的光隔離器等之磁性光學裝置之透明的磁性光學材料及其製造方法,以及磁性光學裝置。 The present invention has been made in view of the above circumstances, and an object thereof is to provide a magnetic optical material which is suitable for constituting an optical isolator which suppresses the occurrence of a thermal lens by not absorbing laser light of a fiber having a wavelength range of 0.9 to 1.1 μm. A transparent magnetic optical material of a magnetic optical device, a method of manufacturing the same, and a magnetic optical device.

本發明者們係將以上之先前技術的見解作為基礎,作為相較於(TbxR1-x)2O3氧化物陶瓷,不會吸收波長範圍0.9~1.1μm之光纖雷射光,而可對應於功率雷射用途的全新之材料候補,而進行包含Tb之各種的燒綠石型材料之探討,並完成適於構成光隔離器等之磁性光學裝置的磁性光學材料及磁性光學裝置。 The present inventors have based on the above prior art findings as a fiber laser light having a wavelength range of 0.9 to 1.1 μm as compared with the (Tb x R 1-x ) 2 O 3 oxide ceramic. In view of the new material candidates for power laser applications, various pyrochlore-type materials including Tb are investigated, and magnetic optical materials and magnetic optical devices suitable for constituting magnetic optical devices such as optical isolators are completed.

亦即,本發明係提供下述之磁性光學材料及其製造方法、與磁性光學裝置。 That is, the present invention provides the following magnetic optical material, a method for producing the same, and a magnetic optical device.

[1]一種磁性光學材料,其特徵為,由包含以下述式(1)所表示的複合氧化物作為主成分之透明陶瓷或以下述式(1)所表示的複合氧化物之單晶所構成,Tb2xR2(2-x)O8-x (1) (式中,0.800<x<1.00,R係由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個元素(但,就矽、鍺及鉭而言,係排除單獨為該元素))。 [1] A magnetic optical material comprising: a transparent ceramic containing a composite oxide represented by the following formula (1) as a main component or a single crystal of a composite oxide represented by the following formula (1); , Tb 2x R 2(2-x) O 8-x (1) (wherein, 0.800 < x < 1.00, R is selected from the group consisting of ruthenium, osmium, titanium, iridium, tin, iridium, zirconium At least 1 element (however, for 矽, 锗, and 钽, it is excluded as the element alone)).

[2]如[1]之磁性光學材料,其中,在使波長1064nm之雷射光以光束直徑1.6mm進行入射作為光路徑長10mm的情況,不發生熱透鏡之雷射光的入射功率之最大值為30W以上。 [2] The magnetic optical material according to [1], wherein, when the laser light having a wavelength of 1064 nm is incident at a beam diameter of 1.6 mm as a light path length of 10 mm, the maximum value of the incident power of the laser light that does not generate the thermal lens is 30W or more.

[3]如[1]或[2]之磁性光學材料,其中,每光路徑長10mm之波長1064nm的光之直線透過率為90%以上。 [3] The magnetic optical material according to [1] or [2], wherein the linear transmittance of light having a wavelength of 1064 nm per optical path length of 10 mm is 90% or more.

[4]如[1]~[3]中任一項之磁性光學材料,其係使具有燒綠石晶格之立方晶成為主相。 [4] The magnetic optical material according to any one of [1] to [3], wherein the cubic crystal having a pyrochlore crystal lattice is a main phase.

[5]一種磁性光學材料之製造方法,其係將氧化鋱粉末與由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個氧化物粉末(但,就矽、鍺及鉭而言,係排除單獨為該元素氧化物者)在坩堝內進行燒成而製作以立方晶燒綠石型氧化物為主成分之燒成原料,將該燒成原料進行粉碎作為原料粉末,並使用此原料粉末成形為既定形狀之後進行燒結,進一步進行熱間均壓處理,而得到包含以下述式(1)所表示之複合氧化物作為主成分之透明陶瓷之燒結體,Tb2xR2(2-x)O8-x (1) (式中,0.800<x<1.00,R係由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個元素(但,就矽、鍺及鉭而言,係排除單獨為該元素))。 [5] A method for producing a magnetic optical material, which comprises at least one oxide powder selected from the group consisting of cerium oxide, lanthanum, titanium, cerium, tin, cerium, and zirconium (however, In the case of 锗, 钽 and 钽, the firing of the raw material is carried out in a crucible, and a calcined raw material containing a cubic pyrochlore-type oxide as a main component is produced, and the calcined raw material is pulverized. The raw material powder is formed into a predetermined shape and then sintered, and further subjected to a heat-to-pressure equalization treatment to obtain a sintered body of a transparent ceramic containing a composite oxide represented by the following formula (1) as a main component, Tb 2x R 2(2-x) O 8-x (1) (wherein, 0.800 < x < 1.00, R is at least 1 selected from the group consisting of ruthenium, osmium, titanium, ruthenium, tin, osmium, zirconium) Elements (however, for 矽, 锗, and 钽, exclude the element alone)).

[6]如[5]之磁性光學材料之製造方法,其係將上述氧化鋱粉末與上述由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個氧化物粉末,以使該鋱原子與上述由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個原子之莫耳比率成為x:(2-x)(但,x係大於0.800且小於1.00)的方式進行秤量、混合之後,在坩堝內進行燒成。 [6] The method for producing a magnetic optical material according to [5], wherein the cerium oxide powder and at least one oxide selected from the group consisting of cerium, lanthanum, titanium, cerium, tin, cerium, and zirconium are at least one oxide. a powder having a molar ratio of at least one atom selected from the group consisting of ruthenium, rhodium, titanium, osmium, tin, iridium, and zirconium to x: (2-x) (however, x After weighing and mixing in a manner of more than 0.800 and less than 1.00), the mixture is fired in a crucible.

[7]一種磁性光學裝置,其特徵為,使用如[1]~[4]中任一項之磁性光學材料所構成者。 [7] A magnetic optical device comprising the magnetic optical material according to any one of [1] to [4].

[8]如[7]之磁性光學裝置,其係為可在波長範圍0.9μm以上、1.1μm以下利用的光隔離器,該光隔離器係具備上述磁性光學材料作為法拉第轉子,且於該法拉第轉子之光學軸上的前後具備偏光材料。 [8] The magnetic optical device according to [7], which is an optical isolator usable in a wavelength range of 0.9 μm or more and 1.1 μm or less, wherein the optical isolator comprises the above-mentioned magnetic optical material as a Faraday rotator, and the Faraday A polarizing material is provided on the optical axis of the rotor.

[9]如[8]之磁性光學裝置,其中,上述法拉第轉子係於其光學面具有抗反射膜。 [9] The magnetic optical device according to [8], wherein the Faraday rotator has an anti-reflection film on an optical surface thereof.

依據本發明,可提供一種透明的磁性光學材料,其係適於構成相較於(TbxR1-x)2O3氧化物,不會發生熱透鏡且最大雷射光入射功率為大,即使搭載於波長範圍0.9~1.1μm之光纖雷射裝置,光束品質亦不劣化之光隔離 器等之磁性光學裝置。 According to the present invention, it is possible to provide a transparent magnetic optical material which is suitable for constituting compared to (Tb x R 1-x ) 2 O 3 oxide, which does not generate a thermal lens and has a maximum laser light incident power, even if A magnetic optical device such as an optical isolator that is mounted on a fiber laser device with a wavelength range of 0.9 to 1.1 μm and whose beam quality is not degraded.

100‧‧‧光隔離器 100‧‧‧Optical isolator

110‧‧‧法拉第轉子 110‧‧‧Faraday rotor

120‧‧‧偏光鏡 120‧‧‧Polar mirror

130‧‧‧分析器 130‧‧‧Analyzer

140‧‧‧磁鐵 140‧‧‧ magnet

[第1圖]係顯示使用本發明之磁性光學材料作為法拉第轉子的光隔離器之構成例的剖面示意圖。 [Fig. 1] Fig. 1 is a schematic cross-sectional view showing a configuration example of an optical isolator using the magnetic optical material of the present invention as a Faraday rotator.

[第2圖]係參考例1-1、實施例1-3、1-4、比較例1-1、1-2之陶瓷燒結體(Tb2xHf2(2-x)O8-x)的X射線繞射圖型。 [Fig. 2] A ceramic sintered body of Reference Example 1-1, Examples 1-3, 1-4, and Comparative Examples 1-1 and 1-2 (Tb 2x Hf 2(2-x) O 8-x ) X-ray diffraction pattern.

[第3圖]係第2圖之2 θ=15°附近的X射線繞射圖型放大圖。 [Fig. 3] is an enlarged view of an X-ray diffraction pattern in the vicinity of θ = 15° in Fig. 2 .

[第4圖]係第2圖之2 θ=50°附近的X射線繞射圖型放大圖。 [Fig. 4] is an enlarged view of an X-ray diffraction pattern in the vicinity of θ = 50° in Fig. 2 .

[磁性光學材料] [Magnetic Optical Materials]

以下,針對本發明之磁性光學材料進行說明。 Hereinafter, the magnetic optical material of the present invention will be described.

本發明之磁性光學材料係由包含以下述式(1)所表示的複合氧化物作為主成分之透明陶瓷或以下述式(1)所表示的複合氧化物之單晶所構成,Tb2xR2(2-x)O8-x (1) (式中,0.800<x<1.00,R係由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個元素(但,就矽、鍺及鉭而言,係排除單獨為該元素))。 The magnetic optical material of the present invention is composed of a transparent ceramic containing a composite oxide represented by the following formula (1) as a main component or a single crystal of a composite oxide represented by the following formula (1), Tb 2x R 2 (2-x) O 8-x (1) (wherein, 0.800 < x < 1.00, R is at least one element selected from the group consisting of ruthenium, osmium, titanium, iridium, tin, iridium, and zirconium ( However, in the case of 矽, 锗 and 钽, the exclusion is solely for this element)).

鋱(Tb)係除了鐵(Fe)以外在順磁性元素當中為具有最大的伐得常數之材料,且於波長1.06μm中為透明(光路徑長1mm之光的直線透過率為80%以上),因此為最適合使用於此波長範圍的光隔離器的元素。但,為了活用此透明性,鋱並不為金屬鍵結狀態,而必須成為安定的化合物狀態。 鋱 (Tb) is a material having the largest reduction constant among paramagnetic elements other than iron (Fe), and is transparent at a wavelength of 1.06 μm (linear transmittance of light having a light path length of 1 mm is 80% or more) Therefore, it is the most suitable element for optical isolators in this wavelength range. However, in order to utilize this transparency, ruthenium is not in a metal bond state, but must be a stable compound state.

在此,作為形成安定的化合物之最典型的形態係可列舉氧化物。其中,具有燒綠石型構造之某種的材料(複合氧化物)係由於成立方晶構造(將其稱為具有燒綠石晶格的立方晶(燒綠石型立方晶)),因此可得到無異向性散亂之高度透明的化合物。因而,由鋱進入A部位之系所構成並為燒綠石型氧化物且成立方晶構造之化合物(含鋱之立方晶系燒綠石型氧化物)係較佳作為使用於波長範圍0.9μm以上、1.1μm以下,更詳細而言係1,064±40nm之光隔離器的材料。 Here, the most typical form of the compound which forms a stable compound is an oxide. Among them, a material having a pyrochlore type structure (composite oxide) is formed by a cubic crystal structure (referred to as a cubic crystal having a pyrochlore crystal lattice (gypsumite type cubic crystal)), and thus A highly transparent compound that is free of anisotropic scattering is obtained. Therefore, a compound which is a pyrochlore-type oxide and which has a cubic crystal structure and a cubic crystal-based pyrochlore-type oxide which is formed by a system which enters the A site is preferably used in a wavelength range of 0.9 μm. Above, 1.1 μm or less, more specifically, a material of an optical isolator of 1,064 ± 40 nm.

又,作為用以成立方晶構造之B部位元素係可適宜利用矽、鍺、鈦、鉭、錫、鉿、鋯。 Further, as the B-site element for establishing the cubic crystal structure, ruthenium, rhodium, titanium, iridium, tin, iridium, and zirconium can be suitably used.

但,矽或鍺係由於離子半徑過小,因此若僅以此等之元素填充B部位,則會成為斜方晶而阻礙透明性,故不佳。因此,在選擇矽或鍺的情況係與離子半徑更大的其他元素之鋯組合來利用。 However, since the yttrium or lanthanum is too small in ionic radius, if the B portion is filled only with such an element, it becomes an orthorhombic crystal and hinders transparency, which is not preferable. Therefore, the case where ruthenium or osmium is selected is utilized in combination with zirconium of other elements having a larger ionic radius.

其結果,本發明之磁性光學材料較佳係以具有燒綠石晶格之立方晶(燒綠石型立方晶)成為主相者,更佳係由燒綠石型立方晶所構成者。另外,成為主相係指燒綠石型立方晶佔全體的90體積%以上,較佳為95體積%以上作為結晶構造。或是指由此磁性光學材料之粉末X射線繞射結果所算出的燒綠石化率在上述式(1)中之R單獨為鋯的情況係51.5%以上,在R為其他的情況(亦即,R為由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個元素(但,就矽、鍺及鉭而言係排除單獨為該元素)的情況)係97.3%以上,較佳係99%以上。 As a result, the magnetic optical material of the present invention is preferably a cubic crystal having a pyrochlore crystal lattice (a pyrochlore type cubic crystal) as a main phase, and more preferably a pyrochlore type cubic crystal. In addition, the main phase means that the pyrochlore type cubic crystal accounts for 90% by volume or more, preferably 95% by volume or more, as a crystal structure. Or the calcination rate calculated from the powder X-ray diffraction result of the magnetic optical material is 51.5% or more in the case where R alone is zirconium in the above formula (1), and R is another case (that is, , R is at least one element selected from the group consisting of ruthenium, osmium, titanium, iridium, tin, antimony, and zirconium (however, in the case of yttrium, yttrium, and yttrium, the element is excluded) 97.3% or more, preferably more than 99%.

另外,燒綠石化率係指由對象材料之粉末X射線繞射之相當於立方晶的(622)面之峰值位置(2 θ之值P(622)),根據魏加氏定律(Vegard's law),使用氧化鋱的(622)面之2 θ之值(PTb)及在將對象材料設為理想的燒綠石型立方晶的情況之(622)面之2 θ之值(PTbR)求出的上述對象材料中所佔之理想的燒綠石型立方晶的莫耳分率。另外,(622)面係燒綠石型立方晶之X射線繞射圖型中之4個主繞射面當中,最高角側之繞射面。 In addition, the pyrochlore ratio refers to the peak position of the (622) plane corresponding to the cubic crystal by the powder X-ray diffraction of the target material (the value of 2 θ P (622) ), according to Wegard's law (Vegard's law) Use the value of 2 θ (P Tb ) of the (622) plane of yttrium oxide and the value of 2 θ (P TbR ) of the (622) plane in the case where the target material is an ideal pyrochlore type cubic crystal. The molar fraction of the ideal pyrochlore-type cubic crystal which is occupied by the above-mentioned target material. Further, the (622) surface is a diffractive surface of the highest angle side among the four main diffraction surfaces of the x-ray diffraction pattern of the pyrochlore type cubic crystal.

上述式(1)雖以包含鋱與R為由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個元素(但,就矽、鍺及鉭而言,係排除單獨為該元素)者所構成,但亦可進一步含有其他元素。作為其他元素,若為稀土類元素則可例示:鑭、釓、銩、鈰、鐠、鐿、鏑,作為 各種雜質群,典型而言係可例示:鈣、鋁、磷、鎢、鉬等。 In the above formula (1), at least one element selected from the group consisting of ruthenium, osmium, titanium, iridium, ruthenium, osmium, and zirconium is used. It is excluded from being alone in this element, but may further contain other elements. As other elements, if it is a rare earth element, it can be exemplified: 镧, 釓, 銩, 铈, 鐠, 镱, 镝, as Various impurity groups are typically exemplified by calcium, aluminum, phosphorus, tungsten, molybdenum, and the like.

其他元素之含量較佳係當將鋱之全量設為100時為10以下,更佳係1以下,再更佳係0.1以下,特佳係0.001以下(實質上為零)。 The content of the other element is preferably 10 or less, more preferably 1 or less, still more preferably 0.1 or less, and particularly preferably 0.001 or less (substantially zero) when the total amount of lanthanum is 100.

式(1)中,x係大於0.800,未達1.00,較佳係0.900以上、未達1.00,更佳係0.950以上,未達1.00,特佳係0.950以上、0.999以下。在x為此範圍的情況,由於R離子會優先佔有B部位,其結果Tb離子會有效率地佔有A側,因此Tb之價數(3價)安定性會提昇而提高透光性。但,在x為0.800以下的情況,因燒綠石型立方晶不會成為主相,進而成為混晶而產生雙折射,其結果,透光性會明顯降低,故不佳。 In the formula (1), the x-form is more than 0.800, less than 1.00, preferably 0.900 or more, less than 1.00, more preferably 0.950 or more, less than 1.00, and particularly preferably 0.950 or more and 0.999 or less. In the case where x is in this range, since R ions preferentially occupy the B site, the Tb ions efficiently occupy the A side, so that the valence (trivalent) stability of Tb is improved and the light transmittance is improved. However, when x is 0.800 or less, the pyrochlore-type cubic crystal does not become a main phase, and further, it becomes a mixed crystal and produces birefringence. As a result, light transmittance is remarkably lowered, which is not preferable.

本發明之磁性光學材料係含有以上述式(1)所表示之複合氧化物作為主成分。亦即,本發明之磁性光學材料係只要含有以上述式(1)所表示之複合氧化物作為主成分即可,亦可刻意含有其他成分作為副成分。 The magnetic optical material of the present invention contains the composite oxide represented by the above formula (1) as a main component. In other words, the magnetic optical material of the present invention may contain a composite oxide represented by the above formula (1) as a main component, and may optionally contain other components as an auxiliary component.

在此,作為主成分而含有係意味著含有50質量%以上之以上述式(1)所表示之複合氧化物。以式(1)所表示之複合氧化物的含量較佳為80質量%以上,更佳為90質量%以上,再更佳為99質量%以上,特佳為99.9質量%以上。 Here, the term "containing as a main component" means containing 50% by mass or more of the composite oxide represented by the above formula (1). The content of the composite oxide represented by the formula (1) is preferably 80% by mass or more, more preferably 90% by mass or more, still more preferably 99% by mass or more, and particularly preferably 99.9% by mass or more.

作為一般所例示之其他副成分(主成分以外之成分)係有在單晶成長時所摻雜之摻雜劑或助溶劑,在陶瓷製造 時所添加之燒結助劑等。 Other subcomponents (components other than the main component) generally exemplified are dopants or co-solvents doped during the growth of the single crystal, and are produced in ceramics. A sintering aid or the like added at the time.

作為本發明之磁性光學材料之製法係有浮區法、微下拉法等之單晶製造方法,以及陶瓷製造法,使用任一製法皆無妨。但,一般而言,於單晶製造方法中係於固溶體之濃度比的設計上具有一定程度的限制,因而於本發明中係以陶瓷製造法較佳。 The method for producing the magnetic optical material of the present invention includes a single crystal production method such as a floating zone method or a micro-downdraw method, and a ceramic production method, and any method can be used. However, in general, in the single crystal production method, the design of the concentration ratio of the solid solution has a certain degree of limitation, and therefore, in the present invention, the ceramic production method is preferred.

以下,針對作為本發明之磁性光學材料的製造方法之例的陶瓷製造法進一步詳細敘述,但並非排除沿襲本發明之技術性思想的單晶製造方法者。 Hereinafter, the ceramic production method which is an example of the method for producing a magnetic optical material of the present invention will be described in further detail, but the single crystal production method according to the technical idea of the present invention is not excluded.

<<陶瓷製造法>> <<Ceramic manufacturing method>> [原料] [raw material]

作為本發明所使用之原料係可適宜利用由鋱與元素R(R係由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個元素(但,就矽、鍺及鉭而言,係排除單獨為該元素))所構成之本發明的磁性光學材料之構成元素所成的金屬粉末、或硝酸、硫酸、尿酸等之水溶液,或者上述元素之氧化物粉末等。 As the raw material used in the present invention, at least one element selected from the group consisting of ruthenium and element R (R-based lanthanum, cerium, titanium, lanthanum, tin, cerium, and zirconium) can be suitably used (however, In addition, the metal powder obtained by the constituent elements of the magnetic optical material of the present invention, which is composed of the element (), or an aqueous solution of nitric acid, sulfuric acid, uric acid or the like, or an oxide powder of the above element, etc., is excluded. .

將該等以使鋱對R之莫耳比率成為x:(2-x)(但,x係大於0.800,小於1.00)的方式進行既定量秤量,混合之後進行燒成,而得到將所期望之構成的立方晶燒綠石型氧化物作為主成分之燒成原料。例如,較佳為將氧化鋱粉末與由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個氧化物粉末(就矽、鍺及鉭而言,係排 除單獨為該元素氧化物),以使其鋱原子與上述由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個R之原子之莫耳比率成為x:(2-x)(但,x係大於0.800且小於1.00)的方式進行秤量、混合之後,在坩堝內進行燒成。此時,在由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選擇複數個元素R之氧化物粉末的情況,較佳係以使該等之R原子的莫耳比率成為被均分的莫耳比率之方式進行秤量。例如,在選擇元素R1、R2之2種的氧化物粉末的情況,較佳係以R1:R2之莫耳比率成為1:1的方式將該等進行秤量。 These are quantitatively weighed so that the molar ratio of 鋱 to R becomes x:(2-x) (however, x is more than 0.800 and less than 1.00), and after mixing, baking is performed, and the desired result is obtained. A cubic crystal of pyrochlore-type oxide is used as a raw material for firing. For example, it is preferred to use at least one oxide powder selected from the group consisting of ruthenium, osmium, titanium, iridium, tin, bismuth, and zirconium (in the case of ruthenium, osmium, and iridium, excluding individual For the elemental oxide, the molar ratio of the atom of at least one R selected from the group consisting of ruthenium, osmium, titanium, ruthenium, tin, osmium, and zirconium is x: (2) -x) (however, x is more than 0.800 and less than 1.00), weigh and mix, and then fire in a crucible. In this case, in the case where a plurality of oxide powders of the plurality of elements R are selected from the group consisting of ruthenium, rhodium, titanium, iridium, tin, iridium, and zirconium, it is preferred that the molar ratio of the R atoms be such Weighing is carried out in a manner that is equally divided. For example, in the case of selecting two kinds of oxide powders of the elements R 1 and R 2 , it is preferable to measure the molar ratio of R 1 :R 2 to 1:1.

此時之燒成溫度較佳為1200℃以上,且為比其後所進行之燒結溫度更低的溫度,更佳為1400℃以上,且為比其後所進行之燒結溫度更低的溫度。 The firing temperature at this time is preferably 1200 ° C or higher, and is a temperature lower than the sintering temperature to be performed thereafter, more preferably 1400 ° C or higher, and a temperature lower than the sintering temperature to be performed thereafter.

另外,在此所謂的「作為主成分」係指燒成原料的大部分(例如,體積比率為50%以上)被燒綠石型之結晶構造的氧化物所佔據。又,指由燒成原料之粉末X射線繞射結果所算出的上述燒綠石化率在上述式(1)中之R單獨為鋯的情況係41.5%以上,在R為其他的情況(亦即,R為由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個元素(但,就矽、鍺及鉭而言係排除單獨為該元素)的情況)係50%以上,較佳係55%以上。 In addition, the term "main component" as used herein means that most of the calcination raw material (for example, a volume ratio of 50% or more) is occupied by an oxide of a pyrochlore crystal structure. In addition, the case where the calcination rate calculated from the powder X-ray diffraction result of the calcination raw material is 45.5% or more in the case where R in the above formula (1) is zirconium alone, and R is another case (that is, , R is at least one element selected from the group consisting of ruthenium, osmium, titanium, iridium, tin, antimony, and zirconium (however, in the case of yttrium, yttrium, and yttrium, the element is excluded) More than 50%, preferably more than 55%.

又,上述原料之純度較佳係99.9質量%以上。接著,將所得之燒成原料進行粉碎而作為原料粉末。 Further, the purity of the above raw material is preferably 99.9% by mass or more. Next, the obtained baking raw material is pulverized and used as a raw material powder.

又,最終雖使用所期望之構成的燒綠石型氧 化物粉末來進行陶瓷製造,但針對此時之粉末形狀並無特別限定,可適宜利用例如角狀、球狀、板狀之粉末。又,即使為二次凝聚的粉末亦可適宜利用,即使為藉由噴墨乾燥處理等之造粒處理所造粒而成的顆粒狀粉末亦可適宜利用。進而,針對此等之原料粉末的調製步驟並無特別限定。可適宜利用以共沉澱法、粉碎法、噴霧熱分解法、溶膠-凝膠法、烷氧化物水解法、錯合物聚合法、其他所有的合成方法所製作之原料粉末。又,亦可將所得之原料粉末適當藉由濕式球磨機、珠磨機、噴射磨機或乾式噴射磨機、鎚碎機等進行處理。 In addition, the pyrochlore type oxygen of the desired composition is finally used. The powder is produced by ceramics. However, the shape of the powder at this time is not particularly limited, and for example, an angular, spherical or plate-shaped powder can be suitably used. In addition, even if it is a secondary-aggregated powder, it can be used suitably, and even if it is a granular powder granulated by the granulation process of the ink-jet drying process, etc., it can use suitably. Further, the preparation step of the raw material powders is not particularly limited. A raw material powder produced by a coprecipitation method, a pulverization method, a spray pyrolysis method, a sol-gel method, an alkoxide hydrolysis method, a complex polymerization method, or all other synthesis methods can be suitably used. Further, the obtained raw material powder may be suitably treated by a wet ball mill, a bead mill, a jet mill or a dry jet mill, a hammer mill or the like.

亦可於本發明所使用之燒綠石型氧化物粉末原料中適當添加燒結抑制助劑(燒結助劑)。尤其,較佳係為了得到高透明性,添加與含鋱之燒綠石型氧化物合適的燒結抑制助劑。但,其純度較佳係99.9質量%以上。另外,在不添加燒結抑制助劑的情況,針對所使用之原料粉末較佳係選定其一次粒子之粒徑為奈米級且燒結活性極高者。如此之選擇係適當即可。 A sintering inhibition aid (sintering aid) may be appropriately added to the pyrochlore type oxide powder raw material used in the present invention. In particular, it is preferred to add a sintering inhibiting aid suitable for the pyrochlore-containing oxide containing cerium in order to obtain high transparency. However, the purity thereof is preferably 99.9% by mass or more. Further, in the case where the sintering inhibiting aid is not added, it is preferred that the raw material powder to be used be one in which the primary particle diameter is in the nanometer order and the sintering activity is extremely high. This choice is appropriate.

進而,在製造步驟中之品質安定性或良率提昇的目的下,有時可添加各種有機添加劑。於本發明中,針對此等並無特別限定。亦即,可適宜利用各種之分散劑、黏合劑、潤滑劑、可塑劑等。 Further, various organic additives may be added for the purpose of improving the quality stability or the yield in the production step. In the present invention, there is no particular limitation on these. That is, various dispersants, binders, lubricants, plasticizers, and the like can be suitably used.

[製造步驟] [manufacturing steps]

於本發明中,使用上述原料粉末,加壓成形成既定形 狀之後,進行脫脂,接著進行燒結,而製作相對密度最低為95%以上之緻密化的燒結體。作為其後步驟,較佳係進行熱間均壓(HIP)處理。 In the present invention, the raw material powder is used to pressurize to form a predetermined shape. After the form, degreasing is carried out, followed by sintering to prepare a densified sintered body having a relative density of at least 95% or more. As a subsequent step, it is preferred to carry out a heat-to-pressure (HIP) treatment.

(成形) (forming)

於本發明之製造方法中係可適宜利用通常之加壓成形步驟。亦即,可利用一般常見的將原料粉末填充於模具中從一定方向進行加壓之加壓步驟、或密閉收納於可變形的防水容器以靜水壓進行加壓之CIP(Cold Isostatic Pressing)步驟。另外,施加壓力係只要一邊確認所得成形體之相對密度一邊進行適當調整即可,並無特別限制,但若以例如市售之CIP裝置在可對應之300MPa以下左右的壓力範圍進行管理,則可抑制製造成本。或者,於成形時不僅是成形步驟而是一氣呵成地直至燒結為止所實施之熱壓步驟或放電電漿燒結步驟、微波加熱步驟等亦可適宜利用。進而,不僅是加壓成形法,藉由使原料粉末分散於水及有機溶劑,並流入模具中進行成形之澆注成形法亦可適宜利用。澆鑄成形之方法並無特別限定,可適宜利用加壓澆鑄法、減壓澆注法、固形澆鑄法、離心澆鑄法等。此時,亦可適當添加以漿體之流動性或成形體之保形性提昇作為目的的分散劑以及黏合劑等。 In the production method of the present invention, a usual press forming step can be suitably employed. In other words, a CIP (Cold Isostatic Pressing) step in which a raw material powder is filled in a mold and pressurized in a certain direction, or a CIP (Cold Isostatic Pressing) step which is hermetically stored in a deformable waterproof container and pressurized with hydrostatic pressure can be used. . In addition, the pressure is not particularly limited as long as the relative density of the obtained molded body is confirmed, and it can be managed by, for example, a commercially available CIP device having a pressure range of about 300 MPa or less. Suppress manufacturing costs. Alternatively, a hot pressing step, a discharge plasma sintering step, a microwave heating step, or the like which is carried out not only in the forming step but also in a single step until sintering can be suitably used. Further, not only the press molding method, but also a casting molding method in which a raw material powder is dispersed in water and an organic solvent and is poured into a mold to perform molding can be suitably used. The method of casting molding is not particularly limited, and a pressure casting method, a reduced pressure casting method, a solid casting method, a centrifugal casting method, or the like can be suitably used. In this case, a dispersing agent and a binder which are intended to improve the fluidity of the slurry or the shape retention of the molded body may be appropriately added.

(脫脂) (degreased)

於本發明之製造方法中係可適宜利用通常之脫脂步 驟。亦即,可經過以加熱爐進行之昇溫脫脂步驟。又,此時之環境氣體的種類亦無特別限制,可適宜利用空氣、氧、氫等。脫脂溫度亦無特別限制,但如果在使用混合有機添加劑之原料的情況,較佳係進行昇溫直至其有機成分可分解消除的溫度為止。 In the manufacturing method of the present invention, the usual degreasing step can be suitably utilized. Step. That is, it can be subjected to a temperature rising degreasing step by a heating furnace. Further, the type of the ambient gas at this time is not particularly limited, and air, oxygen, hydrogen, or the like can be suitably used. The degreasing temperature is also not particularly limited. However, when a raw material of a mixed organic additive is used, it is preferred to raise the temperature until the organic component is decomposed and eliminated.

(燒結) (sintering)

於本發明之製造方法中係可適宜利用一般的燒結步驟。亦即,可適宜利用電阻加熱方式、感應加熱方式的加熱燒結步驟。此時之環境並無特別限制,但可適宜利用惰性氣體、氧氣、氫氣等。又,亦可在減壓下(真空中)進行燒結。 In the production method of the present invention, a general sintering step can be suitably employed. That is, a heating and sintering step of a resistance heating method or an induction heating method can be suitably employed. The environment at this time is not particularly limited, but an inert gas, oxygen, hydrogen, or the like can be suitably used. Further, sintering can be carried out under reduced pressure (in a vacuum).

本發明之燒結步驟中之燒結溫度係藉由所選擇的起始原料進行適當調整。一般而言係使用所選擇的起始原料,並適宜選定為較所欲製造之含鋱之燒綠石型氧化物燒結體的熔點更靠低溫側數10℃至100℃或200℃左右的溫度。又,在想要製造於選定之溫度的附近有會相變化成立方晶以外之相的溫度範圍之含鋱之燒綠石型氧化物燒結體時,若嚴格地以成為避開該溫度範圍的條件之方式進行管理、燒結,則可抑制立方晶以外之相的混入,而具有可減低雙折射性之散射的優點。 The sintering temperature in the sintering step of the present invention is suitably adjusted by the selected starting materials. In general, the selected starting materials are used, and it is suitably selected to have a temperature of from 10 ° C to 100 ° C or about 200 ° C on the low temperature side of the melting point of the pyrochlore-type oxide sintered body containing the niobium. . In addition, when it is desired to produce a pyrochlore-type oxide sintered body containing a temperature range in which a phase other than the crystal lattice is changed in the vicinity of the selected temperature, it is strictly to avoid the temperature range. The management and sintering of the conditions can suppress the incorporation of phases other than cubic crystals, and have the advantage of reducing scattering of birefringence.

本發明之燒結步驟中之燒結保持時間係依據所選擇的起始原料進行適當調整。一般而言大多數小時左右即為充分。但,含鋱之燒綠石型氧化物燒結體的相對密 度最低也必須緻密化達95%以上。 The sintering retention time in the sintering step of the present invention is appropriately adjusted depending on the selected starting materials. In general, most hours or so is sufficient. However, the relatively dense structure of the pyrochlore-type oxide sintered body containing bismuth The minimum degree must also be densified to more than 95%.

(熱間均壓(HIP)) (hot room pressure equalization (HIP))

於本發明之製造方法中係可在經過燒結步驟之後,進一步追加設有進行熱間均壓(HIP(Hot Isostatic Pressing))處理的步驟。 In the production method of the present invention, after the sintering step, a step of performing a hot isostatic pressing (HIP) treatment may be further added.

另外,此時之加壓氣體介質種類係可適宜利用氬、氮等之惰性氣體、或者Ar-O2。藉由加壓氣體介質進行加壓的壓力較佳為50~300MPa,更佳為100~300MPa。在壓力未達50MPa時係有無法得到透明性改善效果的情況,在超過300MPa時係即使增加壓力亦無法得到其以上之透明性改善,恐有對裝置之負荷成為過多而損傷裝置之虞。施加壓力係若為以市售之HIP裝置所能處理之196MPa以下,則簡便而為佳。 Further, in the case of the type of the pressurized gas medium at this time, an inert gas such as argon or nitrogen or Ar-O 2 may be suitably used. The pressure for pressurizing by the pressurized gas medium is preferably from 50 to 300 MPa, more preferably from 100 to 300 MPa. When the pressure is less than 50 MPa, the effect of improving the transparency is not obtained. When the pressure exceeds 300 MPa, the transparency is not improved even if the pressure is increased, and the load on the device may be excessive and the device may be damaged. The pressure applied is preferably 196 MPa or less which can be handled by a commercially available HIP device, and is preferably simple.

又,此時之處理溫度(既定保持溫度)係只要依據材料之種類及/或燒結狀態而適當設定即可,在例如1000~2000℃,較佳為1300~1800℃之範圍內進行設定。此時,與燒結步驟的情況相同地,必須設為構成燒結體之含鋱之燒綠石型氧化物的熔點以下及/或相轉移點以下,在熱處理溫度超過2000℃時係本發明所想定之含鋱之燒綠石型氧化物燒結體會超過熔點或超過相轉移點,而難以進行適當的HIP處理。又,在熱處理溫度未達1000℃時係無法得到燒結體之透明性改善效果。另外,針對熱處理溫度之保持時間並無特別限制,但較佳係一邊充分確 認構成燒結體之含鋱之燒綠石型氧化物的特性一邊進行適當調整。 In addition, the processing temperature (predetermined holding temperature) at this time may be appropriately set depending on the type of the material and/or the sintered state, and is set, for example, in the range of 1000 to 2000 ° C, preferably 1300 to 1800 ° C. In this case, in the same manner as in the case of the sintering step, it is necessary to set the melting point of the pyrochlore-type oxide containing the sintered body to be lower than the melting point and/or the phase transition point or less, and when the heat treatment temperature exceeds 2000 ° C, it is intended by the present invention. The sintered pyrochlore-type oxide sintered body may exceed the melting point or exceed the phase transition point, and it is difficult to perform an appropriate HIP treatment. Further, when the heat treatment temperature is less than 1000 ° C, the effect of improving the transparency of the sintered body cannot be obtained. In addition, there is no particular limitation on the holding time of the heat treatment temperature, but it is preferable to fully confirm The characteristics of the pyrochlore-type oxide constituting the sintered body are appropriately adjusted.

另外,HIP處理之加熱材、隔熱材、處理容器並無特別限制,但可適宜利用石墨、或鉬(Mo)、鎢(W)。 Further, the heating material, the heat insulating material, and the processing container for the HIP treatment are not particularly limited, but graphite, molybdenum (Mo), or tungsten (W) can be suitably used.

(退火) (annealing)

於本發明之製造方法中,係有在結束HIP處理之後,於所得之含鋱之燒綠石型氧化物燒結體中產生氧缺損,而呈現淡灰色的外觀之情況。於此情況中,較佳係以前述HIP處理溫度以下(例如,1100~1500℃),且在與前述HIP處理壓力相同的條件下,施加微氧化退火處理。於此情況中,若利用與前述HIP處理設備相同的設備來進行微氧化退火處理,則製造製程成為簡便而為佳。藉由此退火處理,呈現淡灰色之外觀的含鋱之燒綠石型氧化物燒結體亦可調整成完全無色透明的陶瓷體。 In the production method of the present invention, after the HIP treatment is completed, an oxygen deficiency is generated in the obtained pyrochlore-type oxide sintered body containing ruthenium, and a pale gray appearance is exhibited. In this case, it is preferred to apply a micro-oxidation annealing treatment under the same conditions as the aforementioned HIP treatment pressure, for example, at a temperature below the HIP treatment temperature (for example, 1100 to 1500 ° C). In this case, if the micro-oxidation annealing treatment is performed using the same equipment as the HIP processing apparatus described above, the manufacturing process is simple and preferable. By this annealing treatment, the bismuth-containing pyrochlore-type oxide sintered body exhibiting a pale gray appearance can also be adjusted to a completely colorless and transparent ceramic body.

(光學研磨) (optical grinding)

於本發明之製造步驟中,較佳係針對經過上述一連串之製造步驟的含鋱之燒綠石型氧化物燒結體(亦即,透明陶瓷),將該光學性地利用之位於軸上的兩端面進行光學研磨。此時之光學面精度係在測定波長λ=633nm的情況,較佳為λ/8以下,特佳為λ/10以下。另外,亦可藉由於光學研磨後的面適當成膜抗反射膜,而進一步減低光 學損失。 In the manufacturing step of the present invention, it is preferable to use the yttrium-containing pyrochlore-type oxide sintered body (that is, transparent ceramic) which has undergone the above-described series of manufacturing steps, and optically utilize the two on the shaft. The end face is optically ground. The optical surface accuracy at this time is in the case of the measurement wavelength λ = 633 nm, preferably λ/8 or less, and particularly preferably λ/10 or less. In addition, it is also possible to further reduce the light by appropriately forming an anti-reflection film on the surface after optical polishing. Learn the loss.

如上述般,可得到熱透鏡之發生受到抑制之磁性光學材料。又,本發明之磁性光學材料,在使波長1064nm之雷射光以光束直徑1.6mm進行入射作為光路徑長10mm的情況,較佳係不發生熱透鏡之雷射光的入射功率之最大值為30W以上,更佳係80W以上。在上述不發生熱透鏡之雷射光的入射功率之最大值未達30W時,會有難以利用在高輸出之光纖雷射裝置的情況。又,本發明之磁性光學材料較佳係每光路徑長10mm之波長1064nm的光透過之直線透過率為90%以上。另外,於本發明中,「直線透過率」係意味著在將於測定光路徑中不放置樣品而以空白(空間)狀態所測定之透過光譜設為100%的情況之直線透過率。 As described above, a magnetic optical material in which the occurrence of a thermal lens is suppressed can be obtained. Further, in the magnetic optical material of the present invention, when laser light having a wavelength of 1064 nm is incident at a beam diameter of 1.6 mm as a light path length of 10 mm, it is preferable that the maximum value of the incident power of the laser light which does not generate the thermal lens is 30 W or more. More preferably 80W or more. When the maximum value of the incident power of the laser light in which the thermal lens does not occur is less than 30 W, it may be difficult to use the high-output optical fiber laser device. Further, the magnetic optical material of the present invention preferably has a linear transmittance of 90% or more of light having a wavelength of 1064 nm per 10 mm of the optical path length. In the present invention, the "linear transmittance" means an in-line transmittance when the transmission spectrum measured in a blank (space) state is not placed in the measurement light path and is 100%.

[磁性光學裝置] [Magnetic Optical Device]

本發明之磁性光學材料係適於磁性光學裝置用途中,尤其適宜使用作為波長0.9~1.1μm之光隔離器的法拉第轉子。 The magnetic optical material of the present invention is suitable for use in a magnetic optical device, and is particularly preferably a Faraday rotator which is an optical isolator having a wavelength of 0.9 to 1.1 μm.

第1圖係顯示具有由本發明之磁性光學材料所構成的法拉第轉子作為光學元件之光學裝置的光隔離器之一例子的剖面示意圖。於第1圖中,光隔離器100係具備有由本發明之磁性光學材料所構成的法拉第轉子110,於該法拉第轉子110前後係具備有作為偏光材料之偏光鏡120及分析器130。又,光隔離器100較佳係以偏光鏡120、法拉 第轉子110、分析器130的順序作配置,於該等之側面當中的至少1面載置磁鐵140。 Fig. 1 is a schematic cross-sectional view showing an example of an optical isolator having an optical device in which a Faraday rotator composed of the magnetic optical material of the present invention is used as an optical element. In the first embodiment, the optical isolator 100 is provided with a Faraday rotator 110 composed of the magnetic optical material of the present invention, and a polarizing mirror 120 and an analyzer 130 as polarizing materials are provided in front of and behind the Faraday rotator 110. Moreover, the optical isolator 100 is preferably a polarizer 120, a farad The first rotor 110 and the analyzer 130 are arranged in this order, and the magnet 140 is placed on at least one of the side faces.

又,上述光隔離器100係可適宜利於產業用光纖雷射裝置。亦即,適於將來自雷射光源所發出的雷射光之反射光返回至光源,而防止振盪成為不安定者。 Further, the above-described optical isolator 100 can be suitably used for an industrial optical fiber laser device. That is, it is suitable for returning the reflected light from the laser light emitted from the laser light source to the light source, and preventing the oscillation from becoming unstable.

[實施例] [Examples]

以下,雖列舉實施例、比較例及參考例以更具體地說明本發明,但本發明並不限定於下述實施例。 Hereinafter, the present invention will be more specifically described by way of examples, comparative examples and reference examples, but the present invention is not limited to the following examples.

[實施例1、比較例1、參考例1] [Example 1, Comparative Example 1, Reference Example 1]

於上述式(1)中,針對作為於B部位位置(於上述式(1)中之R)填充單一元素之例而選定鉿、錫、鈦,並使x變化之例進行說明。 In the above formula (1), an example in which yttrium, tin, and titanium are selected as a case where a single element is filled in the B site position (R in the above formula (1)) and x is changed will be described.

取得信越化學工業(股)製之氧化鋱粉末及Alfa Aesar製之氧化鉿粉末、以及(股)高純度化學研究所製之二氧化錫粉末及氧化鈦粉末。純度皆為99.9質量%以上。 A cerium oxide powder manufactured by Shin-Etsu Chemical Co., Ltd., a cerium oxide powder manufactured by Alfa Aesar, and a tin dioxide powder and a titanium oxide powder manufactured by a high-purity chemical research institute. The purity was 99.9% by mass or more.

使用上述原料,而製作以成為如表1般之最終組成的混合比率之合計13種(1種×7水準+2種×3水準)之混合氧化物原料。亦即,分別準備以使鋱之莫耳數與鉿之莫耳數成為x=0.700、0.800、0.900、0.950、0.990、0.999、1.00的方式進行秤量的混合粉末,及以使鋱之莫耳數與錫或鈦之莫耳數成為x=0.700、0.900、1.00的方式進行秤量 的混合粉末(也就是說,如成為Tb1.40Hf2.60O7.30、Tb1.60Hf2.40O7.20、Tb1.80Hf2.20O7.10、Tb1.90Hf2.10O7.05、Tb1.98Hf2.02O7.01、Tb1.998Hf2.002O7.001、Tb2.00Hf2.00O7.00、Tb1.40Sn2.60O7.30、Tb1.80Sn2.20O7.10、Tb2.00Sn2.00O7.00、Tb1.40Ti2.60O7.30、Tb1.80Ti2.20O7.10、Tb2.00Ti2.00O7.00般之混合粉末)。具體而言,準備將氧化鋱與氧化鉿以使鋱與鉿分別成為合適莫耳比率的方式進行秤量的混合粉末、將氧化鋱與二氧化錫以使鋱與錫分別成為合適莫耳比率的方式進行秤量的混合粉末、將氧化鋱與氧化鈦以使鋱與鈦分別成為合適莫耳比率的方式進行秤量的混合粉末之13種。接著,一邊注意防止各者相互混入一邊在乙醇中以氧化鋯製球磨裝置進行分散/混合處理。處理時間為24小時。其後,進行噴霧乾燥處理,而製作任一者平均粒徑皆為20μm之顆粒狀原料。 Using the above-mentioned raw materials, a total of 13 kinds of mixed oxide raw materials (1 type × 7 level + 2 types × 3 levels) which are a mixture ratio of the final composition as shown in Table 1 were produced. In other words, the mixed powder is prepared so that the molar number of the moles and the number of moles of the crucibles are x=0.700, 0.800, 0.900, 0.950, 0.990, 0.999, and 1.00, and the number of moles of the crucible is adjusted. The mixed powder is weighed in such a manner that the number of moles of tin or titanium becomes x = 0.700, 0.900, and 1.00 (that is, as Tb 1.40 Hf 2.60 O 7.30 , Tb 1.60 Hf 2.40 O 7.20 , Tb 1.80 Hf 2.20 O 7.10 , Tb 1.90 Hf 2.10 O 7.05 , Tb 1.98 Hf 2.02 O 7.01 , Tb 1.998 Hf 2.002 O 7.001 , Tb 2.00 Hf 2.00 O 7.00 , Tb 1.40 Sn 2.60 O 7.30 , Tb 1.80 Sn 2.20 O 7.10 , Tb 2.00 Sn 2.00 O 7.00 , Tb 1.40 Ti 2.60 O 7.30 , Tb 1.80 Ti 2.20 O 7.10 , Tb 2.00 Ti 2.00 O 7.00 mixed powder). Specifically, a mixed powder in which cerium oxide and cerium oxide are mixed so that cerium and lanthanum are respectively suitable molar ratios, and cerium oxide and tin dioxide are prepared so that cerium and tin respectively become suitable molar ratios Thirteen kinds of mixed powders were weighed and weighed, and cerium oxide and titanium oxide were weighed so that cerium and titanium became suitable molar ratios, respectively. Next, the dispersion/mixing treatment was carried out in a zirconia ball mill apparatus in ethanol while taking care to prevent each of them from entering each other. The processing time is 24 hours. Thereafter, a spray drying treatment was carried out to prepare a pelletized material having an average particle diameter of 20 μm.

接著,將此等之粉末放入銥坩堝,在高溫馬弗爐(muffle furnace),以1400℃保持時間3小時進行燒成處理,而得到各組成之燒成原料。將所得之各燒成原料以PANalytical公司製粉末X射線繞射裝置進行繞射圖型解析。由此等之峰值特定出試料之結晶系。在峰值因Cu-K α 1射線及Cu-K α 2射線以外之影響而分流,無法決定單一之晶系的情況係判斷為混晶。另外,在議論磁性光學材料之品質的情況,非單一之晶系的情況雖足以判斷為混晶,但在此係試著藉由與X射線繞射圖型之參考數據的比較或裏特沃爾德解析,而將燒綠石型氧化物之結晶相以 外的相進行特定。 Then, these powders were placed in a crucible, and subjected to a calcination treatment at a high temperature muffle furnace at 1400 ° C for 3 hours to obtain a calcined raw material of each composition. Each of the obtained calcined raw materials was subjected to diffraction pattern analysis by a powder X-ray diffraction apparatus manufactured by PANalytical Co., Ltd. The peak value of the sample is specified to the crystal system of the sample. When the peak is split by the influence of Cu-K α 1 ray and Cu-K α 2 ray, the case where a single crystal system cannot be determined is judged to be a mixed crystal. In addition, in the case of discussing the quality of magnetic optical materials, the case of non-single crystal system is sufficient to judge the mixed crystal, but here is the comparison with the reference data of the X-ray diffraction pattern or Ritvo. Analysis, and the crystal phase of the pyrochlore-type oxide is The outer phase is specific.

其結果,於B部位使用Hf(亦即R=Hf)的7種之燒成原料(Tb1.40Hf2.60O7.30、Tb1.60Hf2.40O7.20、Tb1.80Hf2.20O7.10、Tb1.90Hf2.10O7.05、Tb1.98Hf2.02O7.01、Tb1.998Hf2.002O7.001、Tb2.00Hf2.00O7.00)係確認到可推測為燒綠石型氧化物或螢石型氧化物之結晶相的立方晶。但,針對Tb1.60Hf2.40O7.20及Tb1.40Hf2.60O7.30係混合存在有晶格常數不同的複數之立方晶螢石型氧化物。 As a result, seven kinds of calcined raw materials of Hf (i.e., R = Hf) were used in the B site (Tb 1.40 Hf 2.60 O 7.30 , Tb 1.60 Hf 2.40 O 7.20 , Tb 1.80 Hf 2.20 O 7.10 , Tb 1.90 Hf 2.10 O 7.05 Tb 1.98 Hf 2.02 O 7.01 , Tb 1.998 Hf 2.002 O 7.001 , Tb 2.00 Hf 2.00 O 7.00 ) A cubic crystal which is presumably a crystal phase of a pyrochlore type oxide or a fluorite type oxide was confirmed. However, for Tb 1.60 Hf 2.40 O 7.20 and Tb 1.40 Hf 2.60 O 7.30 , a plurality of cubic fluorite-type oxides having different lattice constants are mixed.

相同地,於B部位使用Sn(亦即R=Sn)的3種之燒成原料(Tb1.40Sn2.60O7.30、Tb1.80Sn2.20O7.10、Tb2.00Sn2.00O7.00)係全部皆確認到可推測為燒綠石型氧化物之結晶相的立方晶。但,針對Tb1.40Sn2.60O7.30雖確認到除了立方晶燒綠石型氧化物以外亦混合存在有其他的結晶相之XRD繞射峰值,但缺乏參考數據而無法特定。 Similarly, three types of firing materials (Tb 1.40 Sn 2.60 O 7.30 , Tb 1.80 Sn 2.20 O 7.10 , Tb 2.00 Sn 2.00 O 7.00 ) using Sn (i.e., R = Sn) in the B portion are all confirmed. It is presumed to be a cubic crystal of a crystal phase of a pyrochlore-type oxide. However, for Tb 1.40 Sn 2.60 O 7.30, it was confirmed that XRD diffraction peaks of other crystal phases were mixed in addition to the cubic pyrochlore type oxide, but the reference data was lacking and could not be specified.

最後,於B部位使用Ti(亦即R=Ti)的3種之燒成原料(Tb1.40Ti2.60O7.30、Tb1.80Ti2.20O7.10、Tb2.00Ti2.00O7.00)係全部皆確認到可推測為燒綠石型氧化物之結晶相的立方晶。但,針對Tb1.40Ti2.60O7.30係除了立方晶燒綠石型氧化物以外亦混合存在有晶格常數不同之立方晶的螢石型氧化物相或六方晶之XRD繞射峰值。 Finally, three kinds of calcined raw materials (Tb 1.40 Ti 2.60 O 7.30 , Tb 1.80 Ti 2.20 O 7.10 , Tb 2.00 Ti 2.00 O 7.00 ) using Ti (i.e., R = Ti) at the B site were all confirmed to be presumable. It is a cubic crystal of a crystal phase of a pyrochlore-type oxide. However, for the Tb 1.40 Ti 2.60 O 7.30 series, in addition to the cubic pyrochlore type oxide, the XRD diffraction peak of the cubic fluorite-type oxide phase or the hexagonal crystal having different lattice constants is also mixed.

關於如此所得之原料,分別施加以單軸加壓成形、198MPa之壓力的靜水壓處理而得到CIP成形體。將所得之成形體在馬弗爐中以1000℃、2小時之條件進行脫脂處理。接著,將該乾燥成形體裝入真空加熱爐中,在 2.0×10-3Pa以下之減壓下,以1700℃±20℃進行3小時處理,而得到合計13種(1種×7水準+2種×3水準)之燒結體。此時,以使所有的樣品之燒結相對密度成為95%的方式將燒結溫度進行微調整。 Each of the raw materials thus obtained was subjected to hydrostatic pressure treatment under uniaxial pressure molding and a pressure of 198 MPa to obtain a CIP molded body. The obtained molded body was subjected to degreasing treatment in a muffle furnace at 1000 ° C for 2 hours. Next, the dried molded body was placed in a vacuum heating furnace, and treated under a reduced pressure of 2.0 × 10 -3 Pa or less at 1700 ° C ± 20 ° C for 3 hours to obtain a total of 13 kinds (1 type × 7 level + Two kinds of sintered bodies of ×3 level). At this time, the sintering temperature was finely adjusted so that the sintered relative density of all the samples became 95%.

將所得之各燒結體裝入碳加熱器製HIP爐中,在Ar中、200MPa、1650℃、3小時之條件進行HIP處理。 Each of the obtained sintered bodies was placed in a carbon heater HIP furnace, and subjected to HIP treatment in Ar, at 200 MPa, 1650 ° C, and for 3 hours.

又,作為比較例係參考日本特開2010-285299號公報(專利文獻3)來製作Tb1.2Y0.8O3透光性陶瓷(比較例1-5)。 Further, as a comparative example, a Tb 1.2 Y 0.8 O 3 translucent ceramic (Comparative Example 1-5) was produced by referring to JP-A-2010-285299 (Patent Document 3).

進而,將如此方式所得之各陶瓷燒結體以成為直徑5mm、長度10mm的方式進行研削及研磨處理,接著,將各樣品之光學兩端面以光學面精度λ/8(在測定波長λ=633nm的情況)進行最終光學研磨。 Further, each of the ceramic sintered bodies obtained in this manner was subjected to grinding and polishing treatment so as to have a diameter of 5 mm and a length of 10 mm, and then the optical both end faces of the respective samples were optical surface precision λ/8 (at the measurement wavelength λ = 633 nm). Case) Final optical polishing.

對於R=Hf且x=0.700、0.800、0.900、0.950、1.00之5種的陶瓷燒結體(亦即,Tb1.40Hf2.60O7.30、Tb1.60Hf2.40O7.20、Tb1.80Hf2.20O7.10、Tb1.90Hf2.10O7.05、Tb2.00Hf2.00O7.00),使用Rigaku製粉末X射線繞射裝置(Smart Lab),藉由Out-of-plane XRD法測定繞射圖型(第2圖)。此時之作為XRD條件,係於陽極使用銅,以45kV、200mA產生X射線,掃描範圍設為10~110°。各陶瓷燒結體之反射強度係以2 θ=30°附近之反射(亦即,於燒綠石係(222)面之反射,於螢石係(111)面之反射)強度予以規格化。x=1.00時於2 θ=14.6°附近觀測到歸屬於立方晶燒綠石構造的(111)面 之反射(第3圖)。伴隨著x之減少,於2 θ=14.6°附近所觀測到的(111)面之反射強度係減少。x=0.800及0.700時2 θ=14.6°附近之反射係消滅,因此,判斷為歸屬於立方晶螢石構造的繞射圖型。又,x=0.800及0.700時,高角側之反射(峰值圖型)會因Cu-K α 1射線及Cu-K α 2射線以外之影響而分流,因此判斷為歸屬於混晶者(第4圖)。 Five kinds of ceramic sintered bodies of R = Hf and x = 0.700, 0.800, 0.900, 0.950, and 1.00 (that is, Tb 1.40 Hf 2.60 O 7.30 , Tb 1.60 Hf 2.40 O 7.20 , Tb 1.80 Hf 2.20 O 7.10 , Tb 1.90 Hf 2.10 O 7.05 and Tb 2.00 Hf 2.00 O 7.00 ), and a diffraction pattern (Fig. 2) was measured by an Out-of-plane XRD method using a powder X-ray diffraction apparatus (Smart Lab) manufactured by Rigaku. At this time, as the XRD condition, copper was generated at the anode, and X-rays were generated at 45 kV and 200 mA, and the scanning range was set to 10 to 110°. The reflection intensity of each ceramic sintered body was normalized by reflection at a range of 2 θ = 30° (that is, reflection on a pyrochlore-based (222) surface and reflection on a fluorite-based (111) surface). When x=1.00, the reflection of the (111) plane attributed to the cubic pyrochlore structure was observed in the vicinity of 2θ=14.6° (Fig. 3). With the decrease in x, the reflection intensity of the (111) plane observed in the vicinity of 2 θ = 14.6° is reduced. When x=0.800 and 0.700, the reflection near 2θ=14.6° is eliminated, and therefore, it is judged to be a diffraction pattern attributed to the cubic fluorite structure. Further, when x=0.800 and 0.700, the reflection (peak pattern) on the high-angle side is shunted by influences other than Cu-K α 1 ray and Cu-K α 2 ray, so it is judged that it belongs to the mixed crystal (4th) Figure).

針對經光學研磨之14種全部的樣品,塗佈設計成各自中心波長成為1064nm的抗反射膜。在此所得之樣品的光學外觀亦進行確認。 For all of the 14 kinds of optically polished samples, the coating was designed to have an antireflection film having a center wavelength of 1064 nm. The optical appearance of the sample obtained here was also confirmed.

針對所得之陶瓷樣品,如下述般地測定直線透過率。又,如第1圖所示般,將偏光元件設置於所得到之各陶瓷樣品的前後,將此樣品插入外徑32mm、內徑6mm、長度40mm之釹-鐵-硼磁鐵的中心之後,使用IPG Photonics Japan(股)製高功率雷射(光束直徑1.6mm),從兩端面,將波長1064nm之高功率雷射光線入射,而測定伐得常數以及不發生熱透鏡的入射功率之最大值。 The linear transmittance of the obtained ceramic sample was measured as follows. Further, as shown in Fig. 1, a polarizing element was placed before and after each of the obtained ceramic samples, and the sample was inserted into the center of a 钕-iron-boron magnet having an outer diameter of 32 mm, an inner diameter of 6 mm, and a length of 40 mm, and then used. IPG Photonics Japan (high-power laser) (beam diameter 1.6mm), from the two end faces, the high-power laser light with a wavelength of 1064nm is incident, and the maximum value of the arcing constant and the incident power of the thermal lens are not measured.

(直線透過率之測定方法) (Method for measuring linear transmittance)

直線透過率係採用使用NKT Photonics公司製之光源與Gentec公司製之功率計以及Ge光檢測器內製而成的光學系,將波長1064nm之光藉由當以光束直徑1~3mm 的尺寸透過試料(陶瓷樣品)時的光強度進行測定,根據 以下的式子,依據JIS K7361及JIS K7136來求出。 The linear transmittance is obtained by using a light source made by NKT Photonics, a power meter made by Gentec, and an optical system made of a Ge photodetector. The light having a wavelength of 1064 nm is used as a beam diameter of 1 to 3 mm. The size of the sample was measured by the light intensity at the time of passing through the sample (ceramic sample), and was determined according to the following formula in accordance with JIS K7361 and JIS K7136.

直線透過率(%/cm)=I/Io×100(式中,I係表示透過光強度(直線透過長度10mm(1cm)之試料的光強度),I0係表示入射光強度)。 Linear transmittance (%/cm)=I/Io×100 (wherein I represents the transmitted light intensity (light intensity of a sample having a linear transmission length of 10 mm (1 cm)), and I 0 represents incident light intensity).

針對直線透過率為80%以上之樣品,進行下述伐得常數及不發生熱透鏡之入射功率的最大值之測定,針對直線透過率未達80%之樣品係不實施伐得常數及不發生熱透鏡之入射功率的最大值之測定(以下,其他實施例中亦相同)。 For the sample having a linear transmittance of 80% or more, the following cutting constant and the maximum value of the incident power of the thermal lens are not measured, and the sample having a linear transmittance of less than 80% is not subjected to the cutting constant and does not occur. The measurement of the maximum value of the incident power of the thermal lens (hereinafter, the same applies to other embodiments).

(伐得常數之測定方法) (Method for measuring the reduction constant)

伐得常數V係根據以下的式子來求出。另外,施加於樣品的磁場之大小(H)係使用從上述測定系之尺寸、殘留磁通密度(Br)及保持力(Hc),藉由模擬所算出之值。 The cutting constant V is obtained by the following formula. Further, the magnitude (H) of the magnetic field applied to the sample is a value calculated by simulation from the dimensions of the measurement system, the residual magnetic flux density (Br), and the retention force (Hc).

θ=V×H×L(式中,θ為法拉第旋轉角(min),V為伐得常數,H為磁場之大小(Oe),L為法拉第轉子之長度(此時為1cm))。 θ=V×H×L (where θ is the Faraday rotation angle (min), V is the cutting constant, H is the magnitude of the magnetic field (Oe), and L is the length of the Faraday rotator (in this case, 1 cm)).

另外,作為比較例1-5之Tb1.2Y0.8O3的伐得常數係參 照文獻值(日本特開2010-285299號公報(專利文獻3))。 In addition, the cutting constant of Tb 1.2 Y 0.8 O 3 of Comparative Example 1-5 is a reference value (Japanese Laid-Open Patent Publication No. 2010-285299 (Patent Document 3)).

(不發生熱透鏡的入射功率之最大值的測定方法) (Method for measuring the maximum value of the incident power of the thermal lens)

首先,以不配置陶瓷樣品的狀態,使波長1,064nm之高功率雷射光成為光束直徑1.6mm之空間光而射出,藉由光束分析儀,計測光束腰位置F0(m)。其後,於上述空間光學系統配置測定試料(陶瓷樣品),相同地計測射出光之光束腰位置F1(m)。此時之光束腰位置的變化量(△F)係藉由以下式子表示。 First, a high-power laser light having a wavelength of 1,064 nm was emitted as a spatial light having a beam diameter of 1.6 mm in a state where the ceramic sample was not disposed, and the beam waist position F0 (m) was measured by a beam analyzer. Thereafter, a measurement sample (ceramic sample) was placed in the space optical system, and the beam waist position F1 (m) of the emitted light was measured in the same manner. The amount of change (ΔF) of the beam waist position at this time is expressed by the following expression.

△F(m)=F0-F1 △F(m)=F0-F1

此時,△F之變化雖伴隨著輸入雷射功率的增大而變大,但將成為△F=0.1m以下時之最大入射雷射功率[W]作為可忽視熱透鏡之值(不發生熱透鏡的入射功率之最大值)來求出。 At this time, the change of ΔF becomes larger as the input laser power increases, but the maximum incident laser power [W] when ΔF=0.1 m or less is used as the value of the negligible thermal lens (does not occur). The maximum value of the incident power of the thermal lens is obtained.

另外,所使用之功率雷射係由於最大輸出至100W為止,因此其以上之熱透鏡評估係無法進行。 In addition, since the power laser system used has a maximum output of 100 W, the above thermal lens evaluation system cannot be performed.

將以上的結果全部彙整顯示於表1。 The above results are all shown in Table 1.

由上述結果,可確認比較例1-5之Tb1.2Y0.8O3係不發生熱透鏡之入射功率的最大值為20W,相對於此,於上述式(1)中,x=0.900之實施例1-4、1-5、1-6中係透明性優異,可製作不發生熱透鏡之入射功率的最大值為100W以上之磁性光學材料。進而,可確認x=0.999、0.990、0.950之實施例1-1、1-2、1-3亦相同地透明性優異,而可製作不發生熱透鏡之入射功率的最大值為100W以上之磁性光學材料。又,於x=1.00之參考例1-1、1-2、1-3中係不發生熱透鏡之入射功率的最大值為80W或90W,在本實施例中係不發生熱透鏡之入射功率的最大值進一步改善為100W以上。另外,x=0.800之比較例1-1及x=0.700之比較例1-2、1-3、1-4中係全部成為混晶而 失透。 From the above results, it was confirmed that the maximum value of the incident power of the Tb 1.2 Y 0.8 O 3 system of Comparative Example 1-5 in which the thermal lens does not occur is 20 W, whereas in the above formula (1), the example of x = 0.900 1-4, 1-5, and 1-6 are excellent in transparency, and a magnetic optical material having a maximum value of incident power of a thermal lens of 100 W or more can be produced. Further, it was confirmed that Examples 1-1, 1-2, and 1-3 of x=0.999, 0.990, and 0.950 are excellent in transparency, and magnetic properties in which the maximum value of the incident power of the thermal lens does not occur is 100 W or more. Optical material. Further, in Reference Examples 1-1, 1-2, and 1-3 of x = 1.00, the maximum value of the incident power of the thermal lens does not occur is 80 W or 90 W, and in this embodiment, the incident power of the thermal lens does not occur. The maximum value is further improved to 100W or more. Further, in Comparative Example 1-1 of x=0.800 and Comparative Examples 1-2, 1-3, and 1-4 of x=0.700, all of them were mixed crystals and devitrified.

亦即,可確認依據本實施例,可製作不發生熱透鏡之入射功率的最大值為100W以上之磁性光學材料。 That is, it was confirmed that according to the present embodiment, a magnetic optical material in which the maximum value of the incident power of the thermal lens does not occur is 100 W or more can be produced.

[實施例2、比較例2、參考例2] [Example 2, Comparative Example 2, Reference Example 2]

於上述式(1)中,針對作為於B部位位置(於上述式(1)中之R)選定鋯單一元素,並使x變化之例進行說明。 In the above formula (1), an example in which a zirconium single element is selected as the B site position (R in the above formula (1)) and x is changed will be described.

取得信越化學工業(股)製之氧化鋱粉末、及日產化學工業(股)製之氧化鋯粉末。純度皆為99.9質量%以上。使用上述原料,製作x=0.700、0.900、1.00之合計3種的氧化物原料(亦即,Tb1.40Zr2.60O7.30、Tb1.80Zr2.20O7.10、Tb2.00Zr2.00O7.00)。具體而言係準備將氧化鋱與氧化鋯以使鋱與鋯分別成為合適莫耳比率的方式進行秤量之混合粉末之3種。接著,一邊注意防止各者相互混入一邊在乙醇中以氧化鋯製球磨裝置進行分散/混合處理。處理時間為24小時。其後,進行噴霧乾燥處理,而製作任一者平均粒徑皆為20μm之顆粒狀原料。 A cerium oxide powder manufactured by Shin-Etsu Chemical Co., Ltd. and a zirconia powder manufactured by Nissan Chemical Industries Co., Ltd. were obtained. The purity was 99.9% by mass or more. Using the above raw materials, three kinds of oxide raw materials of x=0.700, 0.900, and 1.00 were produced (that is, Tb 1.40 Zr 2.60 O 7.30 , Tb 1.80 Zr 2.20 O 7.10 , Tb 2.00 Zr 2.00 O 7.00 ). Specifically, it is prepared to mix three kinds of mixed powders of cerium oxide and zirconium oxide so that cerium and zirconium each become a suitable molar ratio. Next, the dispersion/mixing treatment was carried out in a zirconia ball mill apparatus in ethanol while taking care to prevent each of them from entering each other. The processing time is 24 hours. Thereafter, a spray drying treatment was carried out to prepare a pelletized material having an average particle diameter of 20 μm.

接著,將此等之粉末放入銥坩堝,在高溫馬弗爐(muffle furnace),以1300℃保持時間3小時進行燒成處理,而得到各組成之燒成原料。將所得之各燒成原料以PANalytical公司製粉末X射線繞射裝置進行繞射圖型解析。由此等之峰值特定出試料之結晶系。在峰值因Cu-K α 1射線及Cu-K α 2射線以外之影響而分流,無法決 定單一之晶系的情況係判斷為混晶。另外,在議論磁性光學材料之品質的情況,非單一之晶系的情況雖足以判斷為混晶,但在此係試著藉由與X射線繞射圖型之參考數據的比較或裏特沃爾德解析,而將燒綠石型氧化物之結晶相以外的相進行特定。 Next, these powders were placed in a crucible, and subjected to a calcination treatment at a high temperature muffle furnace at 1300 ° C for 3 hours to obtain a calcined raw material of each composition. Each of the obtained calcined raw materials was subjected to diffraction pattern analysis by a powder X-ray diffraction apparatus manufactured by PANalytical Co., Ltd. The peak value of the sample is specified to the crystal system of the sample. When the peak is shunted due to influences other than Cu-K α 1 ray and Cu-K α 2 ray, it cannot be determined. The case of determining a single crystal system is judged to be a mixed crystal. In addition, in the case of discussing the quality of magnetic optical materials, the case of non-single crystal system is sufficient to judge the mixed crystal, but here is the comparison with the reference data of the X-ray diffraction pattern or Ritvo. In addition, the phases other than the crystal phase of the pyrochlore-type oxide are specified.

其結果,於B部位使用Zr(亦即R=Zr)的3種之燒成原料(Tb1.40Zr2.60O7.30、Tb1.80Zr2.20O7.10、Tb2.00Zr2.00O7.00)係確認到除了立方晶燒綠石型氧化物的相以外亦混合存在有晶格常數不同之立方晶的螢石型氧化物相。 As a result, three types of calcined raw materials (Tb 1.40 Zr 2.60 O 7.30 , Tb 1.80 Zr 2.20 O 7.10 , Tb 2.00 Zr 2.00 O 7.00 ) using Zr (that is, R = Zr) at the B site were confirmed to be in addition to cubic crystals. A cubic fluorite-type oxide phase having a different lattice constant is also present in addition to the phase of the pyrochlore-type oxide.

關於如此所得之原料,分別施加以單軸加壓成形、198MPa之壓力的靜水壓處理而得到CIP成形體。將所得之成形體在馬弗爐中以1000℃、2小時之條件進行脫脂處理。接著,將該乾燥成形體裝入真空加熱爐中,在2.0×10-3Pa以下之減壓下,以1700℃±20℃進行3小時處理,而得到合計3種之燒結體。此時,以使所有的樣品之燒結相對密度成為95%的方式將燒結溫度進行微調整。 Each of the raw materials thus obtained was subjected to hydrostatic pressure treatment under uniaxial pressure molding and a pressure of 198 MPa to obtain a CIP molded body. The obtained molded body was subjected to degreasing treatment in a muffle furnace at 1000 ° C for 2 hours. Then, the dried molded product was placed in a vacuum heating furnace, and treated at 1700 ° C ± 20 ° C for 3 hours under a reduced pressure of 2.0 × 10 -3 Pa or less to obtain a total of three kinds of sintered bodies. At this time, the sintering temperature was finely adjusted so that the sintered relative density of all the samples became 95%.

將所得之各燒結體裝入碳加熱器製HIP爐中,在Ar中、200MPa、1650℃、3小時之條件進行HIP處理。 Each of the obtained sintered bodies was placed in a carbon heater HIP furnace, and subjected to HIP treatment in Ar, at 200 MPa, 1650 ° C, and for 3 hours.

進而,將如此方式所得之各陶瓷燒結體,與實施例1相同地以成為長度10mm的方式進行研削及研磨處理,接著,塗佈抗反射膜。 Further, each of the ceramic sintered bodies obtained in this manner was subjected to grinding and polishing treatment in the same manner as in Example 1 to have a length of 10 mm, and then an antireflection film was applied.

測定以與實施例1相同方式所得之陶瓷樣品的直線透過率,並且如第1圖所示般,將偏光元件設定於 所得到之各陶瓷樣品的前後之後覆蓋磁鐵,使用IPG Photonics Japan(股)製高功率雷射(光束直徑1.6mm),從兩端面,將波長1064nm之高功率雷射光線入射,以與實施例1相同方式來測定伐得常數以及不發生熱透鏡之入射功率的最大值。 The linear transmittance of the ceramic sample obtained in the same manner as in Example 1 was measured, and as shown in Fig. 1, the polarizing element was set at Each of the obtained ceramic samples was covered with a magnet before and after, and a high-power laser (beam diameter of 1.6 mm) made of IPG Photonics Japan was used, and high-power laser light having a wavelength of 1064 nm was incident from both end faces, and the same example. 1 The same method is used to determine the cutting constant and the maximum value of the incident power of the thermal lens.

將以上的結果彙整顯示於表2。 The above results are shown in Table 2.

由上述結果,可確認於上述式(1)中,x=1.00之參考例2-1中係不發生熱透鏡之入射功率的最大值為20W,x=0.900之實施例2-1係透明性優異,而可製作不發生熱透鏡之入射功率的最大值進一步改善為30W後之磁性光學材料。另外,實施例2-1、參考例2-1雖作為光學外觀皆為無色透明,但發生些許雙折射。又,於x=0.700之比較例2-1中係成為混晶而失透。 From the above results, it was confirmed that in the above-described formula (1), in Reference Example 2-1 where x = 1.00, the maximum value of the incident power of the thermal lens was 20 W, and the transparency of Example 2-1 was x = 0.900. Excellent, and it is possible to produce a magnetic optical material which is further improved to a maximum of 30 W after the incident power of the thermal lens does not occur. Further, in Example 2-1 and Reference Example 2-1, although the optical appearance was colorless and transparent, some birefringence occurred. Further, in Comparative Example 2-1 in which x = 0.700, the crystal was mixed and devitrified.

亦即,可確認依據本實施例,可製作不發生熱透鏡之入射功率的最大值為30W之磁性光學材料。 That is, it was confirmed that according to the present embodiment, a magnetic optical material in which the maximum value of the incident power of the thermal lens does not occur is 30 W can be produced.

[實施例3、比較例3] [Example 3, Comparative Example 3]

針對於上述式(1)中,x=0.900,且於B部位位置由矽、鍺、鈦、鉭、錫所成之群中以成為實施例1的組成以外之組成的方式選擇至少1個之例進行說明。 In the above formula (1), x=0.900 is selected, and at least one of the group consisting of yttrium, lanthanum, titanium, lanthanum, and tin is selected in a group other than the composition of the first embodiment. The example is explained.

取得信越化學工業(股)製之氧化鋱粉末、及(股)高純度化學研究所製之二氧化矽粉末、二氧化鍺粉末、氧化鈦粉末、二氧化錫粉末、以及昭和化學(股)製之五氧化二鉭(tantalum pentoxide)。純度皆為99.9質量%以上。 Acquired cerium oxide powder manufactured by Shin-Etsu Chemical Co., Ltd., and cerium oxide powder, cerium oxide powder, titanium oxide powder, tin dioxide powder, and Showa Chemical Co., Ltd. Tantalum pentoxide. The purity was 99.9% by mass or more.

使用上述原料,製作各種之複合氧化物原料。亦即,準備將氧化鋱與二氧化矽與氧化鋯以使鋱與矽與鋯之莫耳比成為1.80:1.10:1.10的方式進行秤量之混合粉末、將氧化鋱與二氧化鍺與氧化鋯以使鋱與鍺與鋯之莫耳比成為1.80:1.10:1.10的方式進行秤量之混合粉末、將氧化鋱與二氧化錫與五氧化二鉭以使鋱與錫與鉭之莫耳比成為1.80:1.10:1.10的方式進行秤量之混合粉末、將氧化鋱與氧化鈦與五氧化二鉭以使鋱與鈦與鉭之莫耳比成為1.80:1.10:1.10的方式進行秤量之混合粉末、將氧化鋱與二氧化矽以使鋱與矽之莫耳比成為1.80:2.20的方式進行秤量之混合粉末、將氧化鋱與二氧化鍺以使鋱與鍺之莫耳比成為1.80:2.20的方式進行秤量之混合粉末、將氧化鋱與五氧化二鉭以使鋱與鉭之莫耳比成為1.80:2.20的方式進行秤量之混合粉末。接著,一邊注意防止各者相互混入一邊在乙醇中以氧化鋯製球磨裝置進行分散/混合處理。處理時間為24小時。接著,將此等之粉末放入銥坩 堝,在高溫馬弗爐(muffle furnace),以1400℃ 3小時進行燒成處理。 Various raw oxide raw materials were produced using the above raw materials. That is, a mixed powder of cerium oxide and cerium oxide and zirconium oxide is prepared so that the molar ratio of cerium to cerium to zirconium becomes 1.80:1.10:1.10, and cerium oxide and cerium oxide and zirconium oxide are used. The mixed powder of 鋱 and 锗 and zirconium was made into a 1.80:1.10:1.10 method, and cerium oxide and tin dioxide and bismuth pentoxide were used to make the molar ratio of bismuth to tin to bismuth 1.80: In the method of 1.10:1.10, the mixed powder is weighed, and the mixed powder of cerium oxide is mixed with titanium oxide and lanthanum pentoxide to make the molar ratio of lanthanum to titanium and lanthanum 1.80:1.10:1.10. Weigh the mixed powder with cerium oxide in such a manner that the molar ratio of cerium to lanthanum is 1.80:2.20, and weigh cerium oxide and cerium oxide so that the molar ratio of cerium to lanthanum becomes 1.80:2.20. A mixed powder was weighed and mixed with cerium oxide and antimony pentoxide so that the molar ratio of cerium to lanthanum was 1.80:2.20. Next, the dispersion/mixing treatment was carried out in a zirconia ball mill apparatus in ethanol while taking care to prevent each of them from entering each other. The processing time is 24 hours. Then, put the powder into 铱坩 Thereafter, the firing treatment was carried out at a high temperature muffle furnace at 1400 ° C for 3 hours.

接著,將所得之各種原料再度在乙醇中以氧化鋯製球磨裝置進行分散/混合處理。處理時間為40小時。其後,再度進行噴霧乾燥處理,而製作任一者平均粒徑皆為20μm之顆粒狀複合氧化物原料。 Next, the obtained various raw materials were again subjected to dispersion/mixing treatment in a zirconia ball mill apparatus in ethanol. The processing time is 40 hours. Thereafter, the spray drying treatment was again carried out to prepare a particulate composite oxide raw material having an average particle diameter of 20 μm.

關於如此所得之原料,分別施加以單軸加壓成形、198MPa之壓力的靜水壓處理而得到CIP成形體。將所得之成形體在馬弗爐中以1000℃、2小時之條件進行脫脂處理。接著,將該乾燥成形體裝入真空加熱爐中,以1700℃±20℃進行3小時處理,而得到各種燒結體。此時,以使所有的樣品之燒結相對密度成為95%的方式將燒結溫度進行微調整。 Each of the raw materials thus obtained was subjected to hydrostatic pressure treatment under uniaxial pressure molding and a pressure of 198 MPa to obtain a CIP molded body. The obtained molded body was subjected to degreasing treatment in a muffle furnace at 1000 ° C for 2 hours. Next, the dried compact was placed in a vacuum heating furnace and treated at 1700 ° C ± 20 ° C for 3 hours to obtain various sintered bodies. At this time, the sintering temperature was finely adjusted so that the sintered relative density of all the samples became 95%.

將所得之各燒結體裝入碳加熱器製HIP爐中,在Ar中、200MPa、1650℃、3小時之條件進行HIP處理。關於所得之各燒結體當中的一部分,以氧化鋯製乳缽進行粉碎處理而成為粉末形狀。接著,將以與實施例1相同方式所得之各粉末樣品以PANalytical公司製粉末X射線繞射裝置進行繞射圖型解析。其結果,可確認為立方晶燒綠石型氧化物的組成為Tb1.80Si1.10Zr1.10O7.10、Tb1.80Ge1.10Zr1.10O7.10、Tb1.80Ti1.10Ta1.10O7.10、Tb1.80Sn1.10Ta1.10O7.10之群。又,雖為燒綠石型,但結晶系成為斜方晶的組成為Tb1.80Si2.20O7.10、Tb1.80Ge2.20O7.10之群。最後,針對Tb1.80Ta2.20O7.10係無法得到明確的燒綠 石型之繞射圖型,而得到像是3種左右之不同的相之混合圖型的結果。但,無法正確地鑑定。因此,表記為Tb1.80Ta2.20O7.10+αEach of the obtained sintered bodies was placed in a carbon heater HIP furnace, and subjected to HIP treatment in Ar, at 200 MPa, 1650 ° C, and for 3 hours. A part of each of the obtained sintered bodies was pulverized by a zirconia mash to have a powder shape. Next, each of the powder samples obtained in the same manner as in Example 1 was subjected to diffraction pattern analysis by a powder X-ray diffraction apparatus manufactured by PANalytical Co., Ltd. As a result, it was confirmed that the composition of the cubic pyrochlore-type oxide was Tb 1.80 Si 1.10 Zr 1.10 O 7.10 , Tb 1.80 Ge 1.10 Zr 1.10 O 7.10 , Tb 1.80 Ti 1.10 Ta 1.10 O 7.10 , Tb 1.80 Sn 1.10 Ta 1.10 O 7.10 group. Further, although it is a pyrochlore type, the crystal system has an orthorhombic composition of Tb 1.80 Si 2.20 O 7.10 and Tb 1.80 Ge 2.20 O 7.10 . Finally, for the Tb 1.80 Ta 2.20 O 7.10 system, a clear pyrochlore-type diffraction pattern cannot be obtained, and a result of a mixed pattern of three different phases is obtained. However, it cannot be properly identified. Therefore, the expression is Tb 1.80 Ta 2.20 O 7.10+α .

將如此方式所得之各陶瓷燒結體以成為長度10mm的方式進行研削及研磨處理,接著,將各樣品之光學兩端面以光學面精度λ/8(在測定波長λ=633nm的情況)進行最終光學研磨。進而,塗佈設計成中心波長成為1064nm的抗反射膜。在此所得之樣品的光學外觀亦進行確認。 The ceramic sintered bodies obtained in this manner were subjected to grinding and polishing treatment so as to have a length of 10 mm, and then the optical both end faces of the respective samples were subjected to optical surface precision λ/8 (at the measurement wavelength λ = 633 nm) for final optics. Grinding. Further, an antireflection film having a center wavelength of 1064 nm was applied by coating. The optical appearance of the sample obtained here was also confirmed.

測定以與實施例1相同方式所得之陶瓷樣品的直線透過率,並且如第1圖所示般,將偏光元件設定於所得到之各陶瓷樣品的前後之後覆蓋磁鐵,使用IPG Photonics Japan(股)製高功率雷射(光束直徑1.6mm),從兩端面,將波長1064nm之高功率雷射光線入射,以與實施例1相同方式來測定伐得常數以及不發生熱透鏡之入射功率的最大值。 The linear transmittance of the ceramic sample obtained in the same manner as in Example 1 was measured, and as shown in Fig. 1, the polarizing element was set to cover the magnet before and after the obtained ceramic sample, and IPG Photonics Japan was used. A high-power laser (beam diameter of 1.6 mm) was applied, and high-power laser light having a wavelength of 1064 nm was incident from both end faces, and the cutting constant was measured in the same manner as in Example 1 and the maximum incident power of the thermal lens was not generated. .

將此等結果彙整顯示於表3。 The results are summarized in Table 3.

由上述結果,可確認即使為B部位單質填充時係成為失透或有失透傾向,而無法測定不發生熱透鏡之入射功率的最大值之元素(具體而言係比較例3-1~3-3中之矽、鍺、鉭),在與適當的第3元素一起成為固溶於B部位的組成之情況(實施例3-1~3-4),亦會成為以燒綠石型立方晶作為主相的材料,而不發生熱透鏡之入射功率的最大值成為40W以上。 From the above results, it was confirmed that even if the B site is filled with a single substance, it is devitrified or devitrified, and it is impossible to measure the element which does not cause the maximum value of the incident power of the thermal lens (specifically, Comparative Example 3-1 to 3) -3, 锗, 钽, 钽), in the case of a composition dissolved in the B site together with an appropriate third element (Examples 3-1 to 3-4), it will also become a pyrochlore type cube As the material of the main phase, the maximum value of the incident power of the thermal lens does not occur to be 40 W or more.

另外,目前為止雖以實施形態來說明本發明,但本發明並不限定於上述實施形態,其他之實施形態、追加、變更、刪除等係可在該業者所能想到的範圍內進行變更,於任一樣態中只要能發揮本發明之作用效果,則包含於本發明之範圍內。 Further, the present invention has been described above by way of embodiments, but the present invention is not limited to the above-described embodiments, and other embodiments, additions, changes, deletions, and the like can be changed within the range that can be thought of by those skilled in the art. Any aspect of the present invention is included in the scope of the present invention as long as it exerts the effects of the present invention.

100‧‧‧光隔離器 100‧‧‧Optical isolator

110‧‧‧法拉第轉子 110‧‧‧Faraday rotor

120‧‧‧偏光鏡 120‧‧‧Polar mirror

130‧‧‧分析器 130‧‧‧Analyzer

140‧‧‧磁鐵 140‧‧‧ magnet

Claims (9)

一種磁性光學材料,其特徵為,由包含以下述式(1)所表示的複合氧化物作為主成分之透明陶瓷或以下述式(1)所表示的複合氧化物之單晶所構成,Tb2xR2(2-x)O8-x (1)(式中,0.800<x<1.00,R係由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個元素(但,就矽、鍺及鉭而言,係排除單獨為該元素者))。 A magnetic optical material comprising a transparent ceramic containing a composite oxide represented by the following formula (1) as a main component or a single crystal of a composite oxide represented by the following formula (1), Tb 2x R 2(2-x) O 8-x (1) (wherein 0.800 < x < 1.00, R is at least one selected from the group consisting of ruthenium, osmium, titanium, iridium, tin, iridium, and zirconium) Element (but, in the case of 矽, 锗, and 钽, excludes the element alone)). 如請求項1之磁性光學材料,其中,在使波長1064nm之雷射光以光束直徑1.6mm進行入射作為光路徑長10mm的情況,不發生熱透鏡之雷射光的入射功率之最大值為30W以上。 The magnetic optical material according to claim 1, wherein when the laser light having a wavelength of 1064 nm is incident at a beam diameter of 1.6 mm as the optical path length of 10 mm, the maximum value of the incident power of the laser light without the thermal lens is 30 W or more. 如請求項1或2之磁性光學材料,其中,每光路徑長10mm之波長1064nm的光之直線透過率為90%以上。 The magnetic optical material according to claim 1 or 2, wherein the linear transmittance of light having a wavelength of 1064 nm per optical path of 10 mm is 90% or more. 如請求項1之磁性光學材料,其係使具有燒綠石晶格之立方晶成為主相。 The magnetic optical material of claim 1 which is such that the cubic crystal having the pyrochlore crystal lattice becomes the main phase. 一種磁性光學材料之製造方法,其係將氧化鋱粉末與由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個氧化物粉末(但,就矽、鍺及鉭而言,係排除單獨為該元素氧化物者)在坩堝內進行燒成而製作以立方晶燒綠石型氧化物為主成分之燒成原料,將該燒成原料進行粉 碎作為原料粉末,並使用此原料粉末成形為既定形狀之後進行燒結,進一步進行熱間均壓處理,而得到包含以下述式(1)所表示之複合氧化物作為主成分之透明陶瓷之燒結體,Tb2xR2(2-x)O8-x (1)(式中,0.800<x<1.00,R係由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個元素(但,就矽、鍺及鉭而言,係排除單獨為該元素))。 A method for producing a magnetic optical material, which comprises at least one oxide powder selected from the group consisting of cerium oxide, lanthanum, titanium, cerium, tin, cerium, and zirconium (however, In the case of the cerium, the firing raw material containing the cubic pyrochlore-type oxide as a main component is produced by firing in the crucible, and the calcined raw material is pulverized as a raw material powder. After the raw material powder is formed into a predetermined shape, it is sintered, and further subjected to a heat-to-pressure equalization treatment to obtain a sintered body of a transparent ceramic containing a composite oxide represented by the following formula (1) as a main component, Tb 2x R 2 (2-x )O 8-x (1) (wherein 0.800<x<1.00, R is at least one element selected from the group consisting of ruthenium, osmium, titanium, iridium, tin, iridium, and zirconium ( However, in the case of 矽, 锗 and 钽, the exclusion is solely for this element)). 如請求項5之磁性光學材料之製造方法,其係將上述氧化鋱粉末與上述由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個氧化物粉末,以使該鋱原子與上述由矽、鍺、鈦、鉭、錫、鉿、鋯所成之群中選出的至少1個原子之莫耳比率成為x:(2-x)(但,x係大於0.800且小於1.00)的方式進行秤量、混合之後,在坩堝內進行燒成。 The method for producing a magnetic optical material according to claim 5, wherein the cerium oxide powder and at least one oxide powder selected from the group consisting of cerium, lanthanum, titanium, lanthanum, tin, cerium, and zirconium are The molar ratio of at least one atom selected from the group consisting of ruthenium, rhodium, titanium, osmium, tin, iridium, and zirconium is x: (2-x) (however, the x system is greater than 0.800) After weighing and mixing in a manner of less than 1.00), the mixture is fired in a crucible. 一種磁性光學裝置,其特徵為,使用如請求項1~4中任一項之磁性光學材料所構成者。 A magnetic optical device characterized by using the magnetic optical material according to any one of claims 1 to 4. 如請求項7之磁性光學裝置,其係為可在波長範圍0.9μm以上、1.1μm以下利用的光隔離器,該光隔離器係具備上述磁性光學材料作為法拉第轉子,且於該法拉第轉子之光學軸上的前後具備偏光材料。 The magnetic optical device according to claim 7, which is an optical isolator usable in a wavelength range of 0.9 μm or more and 1.1 μm or less, wherein the optical isolator comprises the above-mentioned magnetic optical material as a Faraday rotator, and the optical body of the Faraday rotator A polarizing material is provided on the front and rear of the shaft. 如請求項8之磁性光學裝置,其中,上述法拉第轉子係於其光學面具有抗反射膜。 The magnetic optical device of claim 8, wherein the Faraday rotator has an anti-reflection film on an optical surface thereof.
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