TW201632303A - Manufacturing method of precast polish pad - Google Patents
Manufacturing method of precast polish pad Download PDFInfo
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- TW201632303A TW201632303A TW104107597A TW104107597A TW201632303A TW 201632303 A TW201632303 A TW 201632303A TW 104107597 A TW104107597 A TW 104107597A TW 104107597 A TW104107597 A TW 104107597A TW 201632303 A TW201632303 A TW 201632303A
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- polishing pad
- mold
- manufacturing
- injection
- filled
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 34
- 239000002994 raw material Substances 0.000 claims abstract description 20
- 238000000465 moulding Methods 0.000 claims abstract description 6
- 238000005498 polishing Methods 0.000 claims description 105
- 238000002347 injection Methods 0.000 claims description 21
- 239000007924 injection Substances 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 10
- 238000000227 grinding Methods 0.000 claims description 5
- 230000032683 aging Effects 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000001746 injection moulding Methods 0.000 claims description 3
- 239000012948 isocyanate Substances 0.000 claims description 3
- 238000006116 polymerization reaction Methods 0.000 claims description 3
- 239000004809 Teflon Substances 0.000 claims description 2
- 229920006362 Teflon® Polymers 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 238000005187 foaming Methods 0.000 claims description 2
- 150000002513 isocyanates Chemical class 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 229920005862 polyol Polymers 0.000 claims description 2
- 150000003077 polyols Chemical class 0.000 claims description 2
- 229920002635 polyurethane Polymers 0.000 claims description 2
- 239000004814 polyurethane Substances 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims 1
- 238000003756 stirring Methods 0.000 claims 1
- 230000010412 perfusion Effects 0.000 abstract description 5
- 239000000428 dust Substances 0.000 abstract description 4
- 230000003446 memory effect Effects 0.000 abstract description 4
- 238000005520 cutting process Methods 0.000 abstract description 3
- 239000003344 environmental pollutant Substances 0.000 abstract description 2
- 238000003801 milling Methods 0.000 abstract description 2
- 231100000719 pollutant Toxicity 0.000 abstract description 2
- 238000001802 infusion Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000004026 adhesive bonding Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000013064 chemical raw material Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate Chemical compound [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 238000007521 mechanical polishing technique Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
本發明係有關於化學機械研磨技術的領域,特別是有關一種預注式研磨墊之製作方法。 The present invention relates to the field of chemical mechanical polishing techniques, and more particularly to a method of making a pre-filled polishing pad.
為了有效提昇產能及降低成本,生產半導體元件的平坦化製程就變得日趨重要。而平坦化製程中,經常使用化學機械研磨(簡稱CMP)的製程,來移除晶圓表面薄膜多餘部份,進而達成全面的平坦化。 In order to effectively increase production capacity and reduce costs, the flattening process for producing semiconductor components has become increasingly important. In the flattening process, a chemical mechanical polishing (CMP) process is often used to remove excess portions of the wafer surface film to achieve full planarization.
化學機械研磨製程是將研磨墊固定於研磨機台的旋轉盤上,再利用研磨頭將晶圓壓觸於研磨墊上,旋轉盤的旋轉能帶動研磨墊,使晶圓表面與研磨墊間產生相互摩擦,同時將具有酸性或鹼性的化學研磨液或研磨漿持續均勻的注入晶圓與研磨墊之間,以結合機械研磨與濕式化學反應來移除沉積於晶圓表層的薄膜,而使其表面光滑化及平坦化。 The chemical mechanical polishing process fixes the polishing pad on the rotating disk of the polishing machine, and then presses the wafer against the polishing pad by using the polishing head. The rotation of the rotating disk can drive the polishing pad to cause mutual mutual interaction between the wafer surface and the polishing pad. Friction, at the same time, an acidic or alkaline chemical slurry or slurry is continuously and uniformly injected between the wafer and the polishing pad to combine mechanical polishing and wet chemical reaction to remove the film deposited on the surface layer of the wafer. The surface is smooth and flat.
目前應用於CMP製程中的研磨墊,通常是於灌注成型為較大體積的研磨墊塊材之後,再依照不同厚度去切割成好幾片薄片,而後經由電腦數值控制(CNC)後加工,將薄片磨薄並作出溝槽圖形,此製程需費時加工,還會製造微塵汙染物。 Currently used in the CMP process, the polishing pad is usually formed into a large volume of the polishing pad block, and then cut into several pieces according to different thicknesses, and then processed by computer numerical control (CNC). Thinned and grooved, this process takes time to process and creates dust particles.
有鑑於此,本發明遂提出一種預注式研磨墊之製作方法,以有效克服上述先前技術之種種缺失。 In view of the above, the present invention provides a method of fabricating a pre-filled polishing pad to effectively overcome the above-mentioned various deficiencies of the prior art.
本發明的主要目的在於提供一種預注式研磨墊之製作方法,採用預置入模板之灌注方式,可減少研磨墊原料的使用量,而減少成本支出,且無須厚度切割及CNC圖形加工等步驟,可縮短加工時間,同時,可避免產生圖形加工過程中的微塵污染物。 The main object of the present invention is to provide a method for manufacturing a pre-injection polishing pad, which can reduce the use amount of the polishing pad raw material by using the preset filling method, and reduce the cost, and does not require steps such as thickness cutting and CNC graphic processing. , can shorten the processing time, at the same time, can avoid the generation of dust particles during the graphics processing.
本發明的另一目的在於提供一種預注式研磨墊之製作方法,所製得的預注式研磨墊的研磨移除率高,能研磨出垂直平整的溝壁,不具記憶效應。 Another object of the present invention is to provide a method for manufacturing a pre-injection polishing pad, which has a high polishing removal rate and can grind a vertically flat groove wall without a memory effect.
因此,為達上述目的,本發明所提供的一種預注式研磨墊之製作方法,其步驟是先提供一研磨墊原料,同時,提供一研磨墊模具,並將一模板置入研磨墊模具,此模板具有溝槽圖形,然後,將研磨墊原料灌注於研磨墊模具內,使研磨墊原料產生聚合反應,待固化成型後,即製得本發明之預注式研磨墊,且於此預注式研磨墊表面形成有對應溝槽圖形之溝槽。 Therefore, in order to achieve the above object, a method for manufacturing a pre-injection polishing pad provided by the present invention is to provide a polishing pad raw material, and at the same time, provide a polishing pad mold, and place a template into the polishing pad mold. The template has a groove pattern, and then the polishing pad raw material is poured into the polishing pad mold to cause polymerization reaction of the polishing pad raw material, and after the curing is formed, the pre-injection polishing pad of the present invention is prepared, and the pre-injection polishing pad is prepared thereon. The surface of the polishing pad is formed with a groove corresponding to the groove pattern.
藉此,根據本發明所提供的預注式研磨墊之製作方法,係可於研磨墊成型之後,再經由脫模及熟成、烘烤等步驟,然後直接進行CNC研磨厚度及背膠貼合,即完成研磨墊產品之製作。也就是說,本發明係可透過預置入之灌注方式,可於模具內直接成型為具有溝槽之研磨墊,無需再進行厚度切割的動作,也不需要溝槽之圖形化,因此,本發明係可簡化製程步驟,縮短加工時間,並可減少或消除加工過程中微塵污染物的產生,更可使研磨墊原料的使用量大幅降低,達到降低成本提高經濟效益的目的;另外,此模板灌注方式會使研磨墊移除率提高,溝壁垂直平整,不具 記憶效應。 Therefore, according to the method for manufacturing the pre-injection polishing pad provided by the present invention, after the polishing pad is formed, the steps of demolding, aging, baking, and the like can be directly performed, and then the CNC grinding thickness and the adhesive bonding are directly performed. That is, the production of the polishing pad product is completed. That is to say, the present invention can be directly formed into a polishing pad having a groove in a mold by a preset infusion method, and the thickness cutting operation is not required, and the pattern of the groove is not required. The invention can simplify the process steps, shorten the processing time, and can reduce or eliminate the generation of dusty pollutants during the processing, and can greatly reduce the use amount of the polishing pad raw materials, thereby achieving the purpose of reducing cost and improving economic efficiency; The filling method will increase the removal rate of the polishing pad, and the groove wall will be vertical and flat. Memory effect.
為使對本發明的目的、特徵及其功能有進一步的了解,茲配合圖式詳細說明如下: In order to further understand the purpose, features and functions of the present invention, the drawings are described in detail as follows:
10‧‧‧研磨墊模具 10‧‧‧ polishing pad mould
20‧‧‧上模 20‧‧‧上模
30‧‧‧下模 30‧‧‧Down
40‧‧‧模板 40‧‧‧ template
41‧‧‧溝槽圖形 41‧‧‧ Groove graphics
50‧‧‧研磨墊原料 50‧‧‧ polishing pad raw materials
60‧‧‧預注式研磨墊 60‧‧‧Pre-injection polishing pad
61‧‧‧溝槽 61‧‧‧ trench
第1圖為本發明之實施例所揭露的預注式研磨墊之製作方法的流程圖。 FIG. 1 is a flow chart showing a method of fabricating a pre-filled polishing pad according to an embodiment of the present invention.
第2A~2C圖為本發明之實施例所揭露的預注式研磨墊之製作方法之灌注成型過程的剖面結構示意圖。 2A-2C are schematic cross-sectional structural views of a perfusion molding process of a method for fabricating a pre-injection polishing pad according to an embodiment of the present invention.
請參照第1圖,本發明之實施例所揭露之預注式研磨墊之製作方法的製作流程,其詳細步驟包含:首先,如步驟S100,提供研磨墊原料的組成配方,由於本實施例係以製作聚氨酯材料之預注式研磨墊為例,其研磨墊原料的組成即包含化學原料異氰酸酯(ISO)和多元醇(Polyol)(含乙二醇、水)兩料,再按照估計發泡比例1.35:1調整,依程序調配所需用量,並均勻攪拌得到研磨墊原料,即倒入灌注機的攪拌桶槽內,然後,將此研磨墊原料先加熱至110℃的溫度再進行灌注。由於本發明採用預置入模板之灌注成型方式,研磨墊原料約能減少三分之一的使用量,例如可以從4公斤(Kg)用量減少至3公斤左右,使得生產成本大幅減少。 Referring to FIG. 1 , a manufacturing process of a method for manufacturing a pre-filled polishing pad disclosed in an embodiment of the present invention includes the following steps: First, in step S100, a composition formula of a polishing pad raw material is provided, as this embodiment is For example, a pre-filled polishing pad for making a polyurethane material comprises a chemical raw material isocyanate (ISO) and a polyol (containing ethylene glycol, water) in the composition of the polishing pad raw material, and then according to the estimated foaming ratio. 1.35:1 adjustment, according to the program to adjust the required amount, and evenly stirred to obtain the polishing pad raw material, that is, poured into the mixing tank of the filling machine, and then the polishing pad raw material is first heated to a temperature of 110 ° C and then poured. Since the present invention adopts the infusion molding method of presetting the template, the polishing pad raw material can be reduced by about one third, for example, it can be reduced from 4 kg (Kg) to about 3 kg, so that the production cost is greatly reduced.
以下請同時參照第2A~2C圖,說明本發明之實施例所揭露的預注式研磨墊60之製作方法之灌注成型過程。 Hereinafter, the perfusion molding process of the method for fabricating the pre-filled polishing pad 60 disclosed in the embodiment of the present invention will be described with reference to FIGS. 2A-2C.
如步驟S110,提供一研磨墊模具10,如第2A圖所示,此研磨墊模具10包含一上模20與一下模30,並於研磨墊模具10之下模30之模穴內置入具有溝槽圖形41的模板40,然後,將上模20與下模30密合;在實務上,可利用一密封環,如O型環(O-ring)對上模20與下模30的邊緣作密封,並可設置有排氣孔做真空排泡作用,以將多餘的空氣排出於研磨墊模具10。當灌注機在運作時,研磨墊模具10需經加熱循環系統加熱至25~100℃的溫度,所需時間約30分鐘。其中,模板40的材料可選用為鐵氟龍板、鋁板、電木板或壓克力板。 In step S110, a polishing pad mold 10 is provided. As shown in FIG. 2A, the polishing pad mold 10 includes an upper mold 20 and a lower mold 30, and a cavity is formed in the lower mold 30 of the polishing pad mold 10 to have a groove. The template 40 of the groove pattern 41 is then brought into close contact with the lower mold 30; in practice, a sealing ring such as an O-ring can be used for the edges of the upper mold 20 and the lower mold 30. The seal is provided and a vent hole is provided for vacuum defoaming to discharge excess air to the polishing pad mold 10. When the filling machine is in operation, the polishing pad mold 10 is heated to a temperature of 25 to 100 ° C by a heating cycle system, and the time required is about 30 minutes. The material of the template 40 can be selected from a Teflon plate, an aluminum plate, an electric board or an acrylic plate.
然後,如步驟S120,將研磨墊原料50以射出成型方式,直接射入研磨墊模具10內,如第2B圖所示。而後透過灌注機促使研磨墊原料50經70~200巴(Bar)的壓力循環混合,時間持續30分鐘,使研磨墊原料50於研磨墊模具10內進行共聚物之聚合反應。 Then, in step S120, the polishing pad raw material 50 is directly injected into the polishing pad mold 10 by injection molding, as shown in Fig. 2B. Then, the polishing pad raw material 50 is mixed and mixed by a pressure of 70 to 200 bar (Bar) through a perfusion machine for 30 minutes, and the polishing pad raw material 50 is subjected to polymerization of the copolymer in the polishing pad mold 10.
如步驟S130,經高溫、高壓作用後,研磨墊模具10內部的空氣會從排氣孔排出,使研磨墊原料50發泡膨脹成型,待30分鐘後,則可固化成型為本實施例之預注式研磨墊60。此預注式研磨墊60表面乃形成有對應溝槽圖形41之溝槽61,如第2C圖所示。另外,此預注式研磨墊的硬度範圍約為50~60蕭式硬度D。 In step S130, after the high temperature and high pressure are applied, the air inside the polishing pad mold 10 is discharged from the vent hole, and the polishing pad raw material 50 is foamed and expanded. After 30 minutes, the curing can be formed into the pre-form of the embodiment. Injection pad 60. The surface of the pre-filled polishing pad 60 is formed with a groove 61 corresponding to the groove pattern 41 as shown in FIG. 2C. In addition, the hardness of the pre-filled polishing pad ranges from about 50 to 60, and the hardness D is.
接著,如步驟S140,打開研磨墊模具10,並將預注式研磨墊60從模板40上脫離,取出預注式研磨墊60,經熟成及熱烘烤,再經過電腦數值控制(CNC)研磨至適當厚度,最後,再於預注式研磨墊60背面塗佈黏膠,以進行背膠貼合,固化後即可獲得本實施例之預注式研磨墊60產品。 Next, in step S140, the polishing pad mold 10 is opened, and the pre-injection polishing pad 60 is detached from the template 40, and the pre-injection polishing pad 60 is taken out, cooked and hot-baked, and then subjected to computer numerical control (CNC) grinding. To the appropriate thickness, finally, the adhesive is applied to the back surface of the pre-filled polishing pad 60 for adhesive bonding, and the pre-filled polishing pad 60 of the present embodiment can be obtained after curing.
根據本發明所揭露之預注式研磨墊之製作方法,乃是透過預置入模板的灌注方式,研磨墊原料在灌注成型之後,可以直接在研磨墊模具內直接成型具有溝槽的研磨墊,再經由脫模、熟成、烘烤等步驟之後,就可以直接進行CNC研磨厚度及背膠貼合,即完成預注式研磨墊產品之製作。另外,模板的選擇係可根據所需溝槽圖形予以替換,不需重新訂製研磨墊模具,非常節省成本。 The pre-injection polishing pad disclosed in the present invention is formed by injecting a preset template into a template, and after the infusion molding, the polishing pad material can directly form a polishing pad having a groove directly in the polishing pad mold. After the steps of demolding, aging, baking, etc., the thickness of the CNC grinding and the adhesive bonding can be directly performed, that is, the production of the pre-injection polishing pad product is completed. In addition, the choice of template can be replaced according to the required groove pattern, no need to re-order the polishing pad mold, which is very cost-effective.
因此,相較於傳統研磨墊之製程,其灌注成品必須先經厚度切割為好幾片薄片,再經CNC後加工研磨厚度及溝槽圖形;本發明之預注式研磨墊並無需進行厚度切割的動作,也不需進行圖形加工製作溝槽,故,本發明可使製程步驟予以精簡,並可縮短後續CNC圖形銑溝作業的加工時間,同時,也由於不用圖形加工,因此可避免加工過程中微塵污染物的產生,亦可大幅減少研磨墊原料的使用量,藉以達到降低成本及提高經濟效益的目的。再者,本發明採用模板灌注方式所製得的預注式研磨墊,係具有高研磨移除率,可製造出垂直平整的溝壁,不具記憶效應。 Therefore, compared with the traditional polishing pad process, the finished product must first be cut into several pieces by thickness, and then processed by the CNC to grind the thickness and the groove pattern; the pre-injection polishing pad of the invention does not need to be thickness-cut. The operation does not need to perform pattern processing to form the groove. Therefore, the invention can simplify the process steps and shorten the processing time of the subsequent CNC pattern milling operation, and at the same time, avoid the processing process, thereby avoiding the processing process. The generation of dust particles can also greatly reduce the amount of raw materials used in the polishing pad, thereby achieving the goal of reducing costs and improving economic efficiency. Furthermore, the pre-injection polishing pad prepared by the template infusion method has a high grinding removal rate, and can produce a vertically flat groove wall without a memory effect.
雖然本發明以前述之實施例揭露如上,然其並非用以限定本發明。在不脫離本發明之精神和範圍內,所為之更動與潤飾,均屬本發明之專利保護範圍。關於本發明所界定之保護範圍請參考所附之申請專利範圍。 Although the present invention has been disclosed above in the foregoing embodiments, it is not intended to limit the invention. It is within the scope of the invention to be modified and modified without departing from the spirit and scope of the invention. Please refer to the attached patent application for the scope of protection defined by the present invention.
10‧‧‧研磨墊模具 10‧‧‧ polishing pad mould
20‧‧‧上模 20‧‧‧上模
30‧‧‧下模 30‧‧‧Down
40‧‧‧模板 40‧‧‧ template
50‧‧‧研磨墊原料 50‧‧‧ polishing pad raw materials
Claims (8)
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| TW104107597A TW201632303A (en) | 2015-03-10 | 2015-03-10 | Manufacturing method of precast polish pad |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104107597A TW201632303A (en) | 2015-03-10 | 2015-03-10 | Manufacturing method of precast polish pad |
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| Publication Number | Publication Date |
|---|---|
| TW201632303A true TW201632303A (en) | 2016-09-16 |
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