[go: up one dir, main page]

TW201623173A - Scribe line forming method and scribe line forming device - Google Patents

Scribe line forming method and scribe line forming device Download PDF

Info

Publication number
TW201623173A
TW201623173A TW104137599A TW104137599A TW201623173A TW 201623173 A TW201623173 A TW 201623173A TW 104137599 A TW104137599 A TW 104137599A TW 104137599 A TW104137599 A TW 104137599A TW 201623173 A TW201623173 A TW 201623173A
Authority
TW
Taiwan
Prior art keywords
glass substrate
scribe line
crack
laser
resin sheet
Prior art date
Application number
TW104137599A
Other languages
Chinese (zh)
Inventor
Toru Kumagai
Kenji Otoda
Shuichi Inoue
Original Assignee
Mitsuboshi Diamond Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsuboshi Diamond Ind Co Ltd filed Critical Mitsuboshi Diamond Ind Co Ltd
Publication of TW201623173A publication Critical patent/TW201623173A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/10Glass-cutting tools, e.g. scoring tools
    • C03B33/102Glass-cutting tools, e.g. scoring tools involving a focussed radiation beam, e.g. lasers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/10Glass-cutting tools, e.g. scoring tools
    • C03B33/105Details of cutting or scoring means, e.g. tips

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Thermal Sciences (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Laser Beam Processing (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

The present invention provides a scribe line forming method and a scribe line forming device, which can use a laser scribe line with high precision to form a segmenting crack, even for a film-like glass substrate. The scribe line forming method of the present invention is to use laser to heat the surface of a glass substrate M absorbed on the absorption station 1 along a predetermined scribe line, and the heating area is then cooled down rapidly by using a coolant, the starting point at the head portion formed on the predetermined scribe line is enabled to progress by the thermal stress generated inside the glass substrate M, hence a segmenting crack S is formed along the predetermined scribe line on the surface of the glass substrate W; the attached surface of the absorption station 1 is formed by a porous plate 3 whose pore diameter is 1~10[mu]m, the porosity is 10~40%; the glass substrate M is then attached to a resin sheet 20, using the resin sheet 20 as the lower side, the glass substrate M is absorbed and held on the absorption station 1. Under aforementioned condition, laser line scribing is performed to form the crack S along the predetermined scribe line.

Description

劃線方法以及劃線裝置 Scribing method and scribing device

本發明係關於一種於包含無鹼玻璃等之薄板玻璃基板加工分斷用裂痕(裂紋)之劃線方法以及劃線裝置。尤其本發明係關於一種對用於液晶顯示器或電漿顯示器等平板顯示器(FPD)之薄板玻璃基板進行劃線之劃線方法以及劃線裝置。 The present invention relates to a scribing method for processing a crack (crack) for breaking a thin glass substrate including an alkali-free glass or the like, and a scribing device. More particularly, the present invention relates to a scribing method and a scribing apparatus for scribing a thin glass substrate for a flat panel display (FPD) such as a liquid crystal display or a plasma display.

自先前以來,已知有如下一種技術:使用雷射劃線法,例如,如專利文獻1般對玻璃基板加工沿斷開預定線之分斷用裂痕(裂紋),或者如專利文獻2般進行完全分斷(全切(full cut)加工),上述雷射劃線法係一面照射雷射束一面進行掃描,使基板產生熱應力分佈而進行劃線之方法。 In the prior art, there has been known a technique in which a laser scribing method is used, for example, a crack (crack) for breaking a glass substrate along a predetermined line is cut as in Patent Document 1, or as in Patent Document 2. The complete cutting process (full cut processing) is a method in which a laser scribing method performs scanning while irradiating a laser beam to cause a thermal stress distribution on a substrate to perform scribing.

迄今為止之雷射劃線法係於具有多個吸氣孔之吸附台上載置玻璃基板並使其固定,使用CO2雷射或YAG(Yttrium Aluminum Garnet,釔-鋁-石榴石)雷射等沿著劃線預定線對玻璃基板之表面附近進行掃描加熱,並且隨之自冷卻機構之噴嘴向加熱區域噴射冷媒。藉此,藉由先實施之加熱而產生壓縮應力,藉由接著實施之急冷而產生拉伸應力,利用由上述壓縮應力與上述拉伸應力產生之熱應力分佈,使初始裂痕(起始點)進展而於玻璃基板之表面產生分斷用裂痕,或者使裂痕滲透整個厚度而進行全切加工。 The laser scribing method has hitherto mounted and fixed a glass substrate on a suction stage having a plurality of suction holes, and uses a CO 2 laser or a YAG (Yttrium Aluminum Garnet) laser. The vicinity of the surface of the glass substrate is scanned and heated along a predetermined line of the scribe line, and the refrigerant is ejected from the nozzle of the cooling mechanism to the heating area. Thereby, the compressive stress is generated by the heating performed first, and the tensile stress is generated by the subsequent quenching, and the initial crack (starting point) is generated by the thermal stress distribution generated by the compressive stress and the tensile stress. As a result, cracks are formed on the surface of the glass substrate, or the cracks are allowed to penetrate the entire thickness to perform full-cut processing.

關於在劃線時吸附保持玻璃基板之吸附台,有由在金屬板具有藉由機械加工而製作之多個抽吸孔的金屬板所形成者、以及使用具有 多個氣孔之陶瓷等多孔質板而形成者,於進行雷射劃線時,吸附台利用抽吸空氣進行抽吸而保持玻璃基板。然而,近年來,由於智慧型手機等影像顯示裝置之輕量化或薄型化而使玻璃基板之薄壁化發展,要求例如0.2mm以下之薄膜狀玻璃基板,若利用吸附台吸附此種薄壁之玻璃基板,則會產生如下問題而難以進行雷射劃線。 The adsorption stage for adsorbing and holding a glass substrate at the time of scribing is formed of a metal plate having a plurality of suction holes formed by machining in a metal plate, and has a use When a porous plate such as a ceramic having a plurality of pores is formed, when the laser scribing is performed, the adsorption stage sucks the suction air to hold the glass substrate. However, in recent years, the thinning of the glass substrate has been progressed due to the weight reduction or thinning of the image display device such as a smart phone. Therefore, for example, a film-shaped glass substrate of 0.2 mm or less is required, and if the thin wall is adsorbed by the adsorption stage, The glass substrate causes the following problems and it is difficult to perform laser scribing.

先前之金屬台之抽吸孔之孔徑一般而言為約1~2mm,多孔質台之氣孔之孔徑小於1~2mm,以約50~60μm形成。若使玻璃基板吸附於該抽吸孔或氣孔之開口部進行雷射劃線,則如圖6所示般於有開口部21之部位與無開口部21之平坦部22之間,因有無接觸於吸附台23而引起之散熱之變化會導致玻璃基板M內之熱應力產生差。該熱應力之差於0.2mm以下之較薄之玻璃基板中更加明顯,從而無法遍及劃線預定線之全長均等地產生熱應力,裂痕不完全、或產生不均而無法精度良好地進行雷射劃線。 The pore diameter of the suction hole of the prior metal table is generally about 1 to 2 mm, and the pore diameter of the pore of the porous stage is less than 1 to 2 mm, and is formed by about 50 to 60 μm. When the glass substrate is adsorbed to the opening of the suction hole or the air hole to perform laser scribing, there is no contact between the portion having the opening 21 and the flat portion 22 having no opening 21 as shown in FIG. The change in heat dissipation caused by the adsorption stage 23 causes a difference in thermal stress in the glass substrate M. The difference in thermal stress is more pronounced in a thin glass substrate of 0.2 mm or less, so that thermal stress cannot be uniformly generated over the entire length of the predetermined line of the scribe line, and the crack is incomplete or uneven, and the laser cannot be accurately performed. Dash.

再者,應對上述散熱之問題,於專利文獻3中揭示有如下一種方法:自玻璃基板之下方吹送空氣而使玻璃基板浮起,於將玻璃基板以非接觸之方式保持於吸附台之狀態下進行雷射劃線。 Further, in order to cope with the above problem of heat dissipation, Patent Document 3 discloses a method in which air is blown from below the glass substrate to float the glass substrate, and the glass substrate is held in a non-contact manner on the adsorption stage. Perform laser scribing.

然而,專利文獻3之方法由於係自下方吹送空氣而使玻璃基板浮起者,故而相較於將玻璃基板以密接於吸附台之姿勢吸附保持之方法而言不穩定。尤其是0.2mm以下之較薄之玻璃基板,會向上方彎曲或產生如起波浪般之現象,故而難以水平地保持。又,有時於劃線過程中空氣會從已分斷之裂痕之間隙向上方漏出,導致玻璃基板振動而使分斷面相互接觸,從而於分斷面產生缺口、或不規則之裂痕延伸而導致產生不合格品。 However, in the method of Patent Document 3, since the glass substrate is floated by blowing air from below, it is unstable compared with the method of adsorbing and holding the glass substrate in a state of being in close contact with the adsorption stage. In particular, a thin glass substrate of 0.2 mm or less is bent upward or has a wave-like phenomenon, so that it is difficult to maintain horizontally. Moreover, sometimes the air leaks upward from the gap of the broken crack during the scribing process, causing the glass substrate to vibrate and the cross-sections to contact each other, thereby causing a gap in the cross-section or an irregular crack extension. Lead to the production of non-conforming products.

因此,於專利文獻4中揭示有如下一種方法:將玻璃基板(玻璃膜)貼附於樹脂片上,藉由自樹脂片之下方吹送空氣,使樹脂片連同玻璃基板一同浮起,而進行雷射劃線。 Therefore, Patent Document 4 discloses a method in which a glass substrate (glass film) is attached to a resin sheet, and the resin sheet is floated together with the glass substrate by blowing air from the lower side of the resin sheet to perform laser irradiation. Dash.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]國際公開號WO2003/008352號公報 [Patent Document 1] International Publication No. WO2003/008352

[專利文獻2]日本專利特開2001-170786號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2001-170786

[專利文獻3]日本專利特開2007-246298號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2007-246298

[專利文獻4]國際公開號WO2012/011445號公報 [Patent Document 4] International Publication No. WO2012/011445

根據專利文獻4之方法,利用樹脂片使空氣不會於劃線過程中向上方漏出,從而能夠解決因空氣漏出而引起之上述問題。然而,由於利用來自下方之空氣使保持玻璃基板之樹脂片浮起而進行雷射劃線,並且樹脂片具有可撓性,故而有玻璃基板之水平保持方面仍存在不穩定性等問題。尤其是0.2mm以下之較薄之玻璃基板,即便略微彎曲,藉由加熱或冷卻而產生之熱應力亦會被緩和,而對雷射劃線之成功與否產生重大影響,故而難以對較薄之玻璃基板利用該方式。 According to the method of Patent Document 4, the resin sheet is used to prevent air from leaking upward during the scribing process, and the above problem caused by air leakage can be solved. However, since the resin sheet holding the glass substrate is floated by the air from the lower side to perform laser scribing, and the resin sheet has flexibility, there is a problem that the glass substrate is unstable in terms of horizontal retention. In particular, a thin glass substrate of 0.2 mm or less, even if it is slightly bent, the thermal stress generated by heating or cooling is alleviated, and has a significant influence on the success of the laser scribing, so it is difficult to be thinner. This method is used for the glass substrate.

因此,本發明之目的在於提供一種即便為0.2mm以下之厚度較薄之膜狀玻璃基板,亦能利用雷射劃線精度良好地形成分斷用裂痕之劃線方法以及劃線裝置。 Therefore, an object of the present invention is to provide a scribing method and a scribing apparatus which are capable of utilizing a laser beam scribing precision and a topographic component to break cracks even when the thickness is 0.2 mm or less.

為了達成上述目的,於本發明中採取如下技術手段。即,本發明之特徵在於:提供一種劃線方法,其係使用雷射沿著劃線預定線對被吸附於吸附台之玻璃基板之表面進行加熱,並且利用冷媒將該加熱區域急冷,藉此利用上述玻璃基板內所產生之熱應力使形成於上述劃線預定線之開頭部之起始點進展,從而於上述玻璃基板之表面產生沿上述劃線預定線之分斷用裂痕;且,由具有氣孔徑為1~10μm、氣孔率為10~40%之氣孔之多孔質板形成上述吸附台之吸附面,將上述玻 璃基板貼附於樹脂片上,且以該樹脂片為下側,使上述玻璃基板吸附保持於上述多孔質吸附台上,於該狀態下進行雷射劃線,藉此沿著上述劃線預定線形成上述裂痕。 In order to achieve the above object, the following technical means are employed in the present invention. That is, the present invention is characterized in that a scribing method is provided in which a surface of a glass substrate adsorbed to a suction stage is heated by a laser along a predetermined line of scribe lines, and the heating area is quenched by a refrigerant. Using the thermal stress generated in the glass substrate to advance the starting point formed at the beginning of the predetermined line of the scribe line, thereby generating a crack for breaking along the predetermined line of the scribe line on the surface of the glass substrate; a porous plate having pores having a pore diameter of 1 to 10 μm and a porosity of 10 to 40% forms an adsorption surface of the adsorption stage, and the glass is The glass substrate is attached to the resin sheet, and the glass substrate is adsorbed and held on the porous adsorption stage with the resin sheet as a lower side, and laser scribing is performed in this state, thereby following the line of the scribe line. The above crack is formed.

上述樹脂片較佳為由能夠耐受因照射雷射而引起之玻璃之溫度上升、且厚度為50~200μm之柔軟素材形成。 The resin sheet is preferably formed of a soft material capable of withstanding a temperature rise of the glass caused by irradiation of a laser and having a thickness of 50 to 200 μm.

又,本發明之特徵亦在於:提供一種劃線裝置,其係使用雷射沿著劃線預定線對被吸附於吸附台之玻璃基板之表面進行加熱,並且利用冷媒將該加熱區域急冷,藉此利用上述玻璃基板內所產生之熱應力使形成於上述劃線預定線之開頭部之起始點進展,從而於上述玻璃基板之表面產生沿上述劃線預定線之分斷用裂痕;上述吸附台之吸附面由具有氣孔徑為1~10μm、氣孔率為10~40%之氣孔之多孔質板形成,上述玻璃基板係以如下方式形成,即,被貼附於樹脂片上,且以使該樹脂片為下側之狀態吸附保持於上述多孔質吸附台。 Further, the present invention is also characterized in that a scribing apparatus is provided which heats a surface of a glass substrate adsorbed to an adsorption stage along a predetermined line of a scribe line by using a laser, and quenches the heating area by a refrigerant. By using the thermal stress generated in the glass substrate, the starting point formed at the beginning of the predetermined line of the scribe line is advanced, and a crack for breaking along the predetermined line of the scribe line is generated on the surface of the glass substrate; The adsorption surface of the stage is formed of a porous plate having pores having a pore diameter of 1 to 10 μm and a porosity of 10 to 40%, and the glass substrate is formed as follows, that is, attached to the resin sheet, and The resin sheet is adsorbed and held on the porous adsorption stage in a state of being on the lower side.

根據本發明,由於多孔質吸附台之氣孔徑小至1~10μm,故而該氣孔之開口部、與無氣孔開口部之部位之向下方散熱之差變小,於雷射掃描過程中玻璃基板內產生之熱應力之差幾乎不存在。藉此,能夠遍及劃線預定線之全長均等地產生熱應力,從而能夠無不均地整齊地形成裂痕。 According to the present invention, since the pore diameter of the porous adsorption stage is as small as 1 to 10 μm, the difference between the opening of the pore and the portion of the opening having no pore opening becomes smaller, and the inside of the glass substrate during the laser scanning is performed. The difference in thermal stress generated is almost non-existent. Thereby, thermal stress can be uniformly generated over the entire length of the line to be scribed, and cracks can be formed neatly without unevenness.

進而,此外,於本發明中,藉由使樹脂片介置於吸附台與玻璃基板之間,而有如下等效果:與使吸附台直接抽吸玻璃基板之情形相比,玻璃基板藉由在雷射劃線時產生之熱應力而欲以裂痕為界線向左右裂開之力之自由度變高,而能夠促進裂痕之形成,即便為較薄之玻璃基板,亦能確實地形成裂痕。 Further, in the present invention, by interposing the resin sheet between the adsorption stage and the glass substrate, there is an effect that the glass substrate is compared with the case where the adsorption stage directly sucks the glass substrate. The degree of freedom in the force of the thermal stress generated by the laser scribing and the crack to the right and left by the crack is increased, and the formation of the crack can be promoted, and the crack can be surely formed even in the case of a thin glass substrate.

1‧‧‧吸附台 1‧‧‧Adsorption station

3‧‧‧多孔質板 3‧‧‧Porous board

4‧‧‧框材 4‧‧‧ frame material

5‧‧‧腔室 5‧‧‧ chamber

6‧‧‧軌道 6‧‧‧ Track

7‧‧‧螺桿軸 7‧‧‧ Screw shaft

8‧‧‧旋轉驅動部 8‧‧‧Rotary drive department

9‧‧‧支持柱 9‧‧‧Support column

10‧‧‧橫樑 10‧‧‧ beams

11‧‧‧橋部 11‧‧ ‧Bridge

12‧‧‧導件 12‧‧‧ Guides

13‧‧‧雷射照射部 13‧‧‧Laser Department

14‧‧‧冷媒噴射噴嘴 14‧‧‧Refrigerant spray nozzle

15‧‧‧劃線頭 15‧‧‧ Scribe head

16‧‧‧切割輪 16‧‧‧Cutting wheel

17‧‧‧劃線頭 17‧‧‧ Scribe head

18‧‧‧馬達 18‧‧‧Motor

20‧‧‧樹脂片 20‧‧‧resin tablets

21‧‧‧開口部 21‧‧‧ openings

22‧‧‧平坦部 22‧‧‧ Flat Department

23‧‧‧吸附台 23‧‧‧Adsorption station

A‧‧‧劃線裝置 A‧‧‧ marking device

M‧‧‧玻璃基板 M‧‧‧ glass substrate

P‧‧‧抽吸泵 P‧‧‧ suction pump

S‧‧‧裂痕 S‧‧‧ crack

X‧‧‧方向 X‧‧‧ direction

圖1係表示用於本發明方法之劃線裝置之一實施形態之概略性前 視圖。 Figure 1 is a schematic representation of an embodiment of a scribing apparatus used in the method of the present invention. view.

圖2係表示本發明中之吸附台之剖視圖。 Fig. 2 is a cross-sectional view showing the adsorption stage in the present invention.

圖3係表示使玻璃基板介隔樹脂片吸附於圖2之吸附台之狀態的立體圖。 Fig. 3 is a perspective view showing a state in which a glass substrate is interposed between resin sheets and adsorbed on the adsorption stage of Fig. 2;

圖4(a)、(b)係圖3之狀態之效果之說明圖。 4(a) and 4(b) are explanatory views showing the effects of the state of Fig. 3.

圖5a係表示於玻璃基板未貼附樹脂片之情形時之雷射劃線實驗結果之表。 Fig. 5a is a table showing the results of laser scribing experiments in the case where the resin sheet is not attached to the glass substrate.

圖5b係表示於玻璃基板貼附有樹脂片之情形時之雷射劃線實驗結果之表。 Fig. 5b is a table showing the results of laser scribing experiments in the case where a resin sheet is attached to a glass substrate.

圖6係使玻璃基板吸附於吸附台而進行雷射劃線之情形時之先前問題之說明圖。 Fig. 6 is an explanatory view showing a prior problem in the case where a glass substrate is adsorbed to a suction stage to perform laser scribing.

以下,基於圖中所示之一實施形態對本發明之詳細情況進行說明。於本實施例中,作為劃線對象之玻璃基板,使用厚度為0.03~0.2mm之膜狀之無鹼玻璃板。 Hereinafter, the details of the present invention will be described based on an embodiment shown in the drawings. In the present embodiment, as the glass substrate to be scribed, a film-like alkali-free glass plate having a thickness of 0.03 to 0.2 mm is used.

圖1表示本發明方法中使用之劃線裝置A,且劃線裝置A具備載置並吸附保持玻璃基板M之吸附台1。 Fig. 1 shows a scribing apparatus A used in the method of the present invention, and the scribing apparatus A includes a suction stage 1 on which a glass substrate M is placed and adsorbed.

如圖2所示,吸附台1之吸附面係由具有多個氣孔之陶瓷或碳等多孔質板3形成。多孔質板3由框材4保持,且形成為藉由利用抽吸泵P抽吸形成於下方之腔室5,而於氣孔之開口部產生抽吸力,從而吸附保持玻璃基板M。 As shown in Fig. 2, the adsorption surface of the adsorption stage 1 is formed of a porous plate 3 such as ceramic or carbon having a plurality of pores. The porous plate 3 is held by the frame member 4, and is formed by suctioning the chamber 5 formed below by the suction pump P, thereby generating a suction force at the opening of the air hole, thereby adsorbing and holding the glass substrate M.

較佳為多孔質板3之氣孔徑以1~10μm形成,氣孔率以10~40%形成,於本實施例中,氣孔徑以5μm形成,氣孔率以35%形成。 Preferably, the pore diameter of the porous plate 3 is 1 to 10 μm, and the porosity is 10 to 40%. In the present embodiment, the pore diameter is 5 μm, and the porosity is 35%.

又,吸附台1能夠沿著水平之軌道6於Y方向(圖1之前後方向)上移動,且由利用馬達(未圖示)而旋轉之螺桿軸7予以驅動。進而,吸附台1能夠利用內置馬達之旋轉驅動部8而於水平面內旋動。 Further, the adsorption stage 1 is movable in the Y direction (the front and rear directions in FIG. 1) along the horizontal rail 6, and is driven by a screw shaft 7 that is rotated by a motor (not shown). Further, the adsorption stage 1 can be rotated in a horizontal plane by the rotation driving unit 8 of the built-in motor.

橋部11係以橫跨吸附台1上之方式設置,該橋部11具備隔著吸附台1而設置之兩側之支持柱9、9、及沿X方向水平延伸之橫樑(橫椽條)10。於橫樑10設置有沿X方向水平延伸之導件12。於該導件12安裝有劃線頭15,該劃線頭15具備用以進行雷射劃線之雷射照射部13、以及將剛照射雷射後之加熱部分急冷之冷媒噴射噴嘴14。 The bridge portion 11 is provided so as to straddle the adsorption stage 1, and the bridge portion 11 includes support columns 9, 9 provided on both sides of the adsorption stage 1, and beams (horizontal bars) extending horizontally in the X direction. 10. The beam 10 is provided with a guide 12 extending horizontally in the X direction. A guide head 15 is attached to the guide member 12. The scribing head 15 includes a laser irradiation unit 13 for performing laser scribing, and a refrigerant injection nozzle 14 for quenching the heating portion immediately after the laser irradiation.

進而,於導件12設置有劃線頭17,該劃線頭17係保持切割輪16,該切割輪16係用以於玻璃基板M之劃線預定線之開頭部分加工起始點(初始裂痕)。劃線頭15、17能夠藉由以馬達18作為驅動源之移動機構(未圖示)而沿著導件12於X方向上移動。 Further, the guide member 12 is provided with a scribing head 17 which holds the cutting wheel 16 for processing the starting point (initial crack) at the beginning of the predetermined line of the scribe line of the glass substrate M. ). The scribing heads 15 and 17 can be moved in the X direction along the guide 12 by a moving mechanism (not shown) that uses the motor 18 as a driving source.

自雷射照射部13照射之雷射可使用CO2雷射或YAG雷射等。 The laser irradiated from the laser irradiation unit 13 may use a CO 2 laser or a YAG laser or the like.

其次,對使用上述裝置之本發明之劃線方法進行說明。 Next, the scribing method of the present invention using the above apparatus will be described.

首先,將玻璃基板M貼附於樹脂片20上,且以使該樹脂片20為下側之狀態載置並吸附保持於具有多孔質板3之吸附台1上。樹脂片20較佳為如下者,即,能夠耐受因照射雷射而導致之玻璃之溫度上升,且選自柔軟之材料、例如聚乙烯、聚氯乙烯、聚丙烯、聚酯等聚合物樹脂,且厚度為50~200μm。 First, the glass substrate M is attached to the resin sheet 20, and the resin sheet 20 is placed on the lower side, and is adsorbed and held on the adsorption stage 1 having the porous sheet 3. The resin sheet 20 is preferably one which can withstand the temperature rise of the glass caused by the irradiation of the laser, and is selected from a soft material such as a polymer resin such as polyethylene, polyvinyl chloride, polypropylene, or polyester. And the thickness is 50~200μm.

而且,於進行雷射劃線之前,先於玻璃基板M表面成為劃線預定線之前端之部分利用切割輪16加工起始點(初始裂痕)。該起始點之加工係於自玻璃基板M之端緣稍向內側進入之位置,藉由使切割輪16朝向玻璃基板M之表面下降而形成。作為用以加工起始點之切割輪16,例如,較佳為使用沿著圓周脊線交替地形成有槽(切口)與刀尖之附有槽之切割輪。 Further, before the laser scribing, the starting point (initial crack) is processed by the cutter wheel 16 before the surface of the glass substrate M becomes the front end of the predetermined line. The processing of the starting point is formed at a position slightly inward from the end edge of the glass substrate M by lowering the cutting wheel 16 toward the surface of the glass substrate M. As the cutting wheel 16 for processing the starting point, for example, it is preferable to use a grooved cutting wheel in which grooves (cuts) and cutting edges are alternately formed along the circumferential ridge line.

繼而,如圖3所示,以上述起始點為起點,沿著劃線預定線自雷射照射部13掃描雷射而進行加熱,並且隨之自冷媒噴射噴嘴14向加熱區域噴射冷媒。藉此,利用藉由先實施之加熱而產生之壓縮應力、及藉由接著實施之急冷而於玻璃基板M之表面產生之拉伸應力,沿著劃 線預定線形成以起始點為起點之分斷用裂痕S。此時,由於玻璃基板M係(介隔樹脂片20而)吸附於吸附台1,故而不會因玻璃基板M彎曲而產生拉伸應力之緩和,玻璃基板M之表面所產生之拉伸應力專門用以形成裂痕S。 Then, as shown in FIG. 3, the laser beam is scanned from the laser irradiation unit 13 along the predetermined line of the scribe line to start heating, and the refrigerant is ejected from the refrigerant injection nozzle 14 to the heating area. Thereby, the compressive stress generated by the heating performed first and the tensile stress generated on the surface of the glass substrate M by the subsequent rapid cooling are used along the stroke. The line predetermined line forms a splitting slit S starting from the starting point. At this time, since the glass substrate M (the resin sheet 20 is interposed) is adsorbed to the adsorption stage 1, the tensile stress is not relieved by the bending of the glass substrate M, and the tensile stress generated on the surface of the glass substrate M is specialized. Used to form the crack S.

於進行該雷射劃線時,由於吸附台1之多孔質板3之氣孔徑小至5μm,故而氣孔之開口部與無氣孔開口部之部位之向下方散熱之差變小,於雷射掃描過程中玻璃基板M內所產生之熱應力之差幾乎不存在。藉此,能夠遍及劃線預定線之全長均等地產生熱應力,從而能夠無不均地整齊地形成裂痕S。 When the laser scribing line is performed, since the pore diameter of the porous plate 3 of the adsorption stage 1 is as small as 5 μm, the difference in heat dissipation between the opening portion of the pore hole and the portion having no pore opening portion becomes small, and the laser scanning is performed. The difference in thermal stress generated in the glass substrate M during the process hardly exists. Thereby, thermal stress can be uniformly generated over the entire length of the line to be scribed, and the crack S can be formed neatly without unevenness.

尤其是藉由使樹脂片20介置於吸附台1與玻璃基板M之間,而能夠獲得如下效果。 In particular, by interposing the resin sheet 20 between the adsorption stage 1 and the glass substrate M, the following effects can be obtained.

圖4(a)係使樹脂片20介置於吸附台1與玻璃基板M之間者,圖4(b)係使玻璃基板M直接吸附於吸附台1者。 4(a) shows that the resin sheet 20 is placed between the adsorption stage 1 and the glass substrate M, and FIG. 4(b) is a method in which the glass substrate M is directly adsorbed to the adsorption stage 1.

於圖4(a)中,樹脂片20由於吸附台1之吸附力而如朝下之箭頭所示般被強力地抽吸保持,於該狀態下,藉由雷射劃線將玻璃基板M加熱及冷卻,從而利用熱應力於玻璃基板M形成裂痕S。此時,以裂痕S為界線,如箭頭所示般欲向左右裂開之力會作用於玻璃基板M,但由於在玻璃基板M與吸附台1之間介置有樹脂片20,故而與圖4(b)之玻璃基板M被直接抽吸之情形相比,玻璃基板M以裂痕S為中心向裂痕S裂開之方向變形之自由度變高,從而助長裂痕S之形成。 In FIG. 4(a), the resin sheet 20 is strongly sucked and held as indicated by the downward arrow due to the adsorption force of the adsorption stage 1, and in this state, the glass substrate M is heated by laser scribing. And cooling, thereby forming a crack S on the glass substrate M by thermal stress. At this time, the crack S is used as a boundary, and the force to be split to the left and right as indicated by the arrow acts on the glass substrate M. However, since the resin sheet 20 is interposed between the glass substrate M and the adsorption stage 1, the In the case where the glass substrate M of 4(b) is directly sucked, the degree of freedom of deformation of the glass substrate M in the direction in which the crack S is split toward the crack S is increased, thereby contributing to the formation of the crack S.

圖5係表示使玻璃基板M被直接吸附於具有氣孔徑為5μm之多孔質板3之吸附台1之情形(圖5a)、以及介置樹脂片20而使玻璃基板M被吸附之情形(圖5b)時之雷射劃線之實驗結果的表。發明者等人分別改變雷射之輸出與掃描速度,並將玻璃基板M之厚度設為0.145mm、0.1mm、0.07mm而進行了實驗。玻璃基板M係使用無鹼玻璃,且使用頻率25kHz之雷射。再者,圖中以影線表示之部分係表示正常地形 成有裂痕之區域。 5 is a view showing a case where the glass substrate M is directly adsorbed to the adsorption stage 1 having the porous plate 3 having a pore diameter of 5 μm ( FIG. 5 a ), and a case where the resin sheet 20 is interposed to adsorb the glass substrate M ( FIG. 5b) A table of experimental results of laser scribing. The inventors and the like performed experiments by changing the output of the laser and the scanning speed, and setting the thickness of the glass substrate M to 0.145 mm, 0.1 mm, and 0.07 mm. The glass substrate M is made of an alkali-free glass and a laser having a frequency of 25 kHz is used. Furthermore, the parts indicated by hatching in the figure indicate normal terrain. A cracked area.

實驗之結果為,於圖5a之情形時,以影線表示之正常區域部分較少,尤其是於厚度為0.07mm時,幾乎未正常地形成裂痕,相對於此,於圖5b之情形時,於包含最薄之0.07mm之玻璃基板在內之全部實驗中,能夠於大範圍正常地形成裂痕。認為其原因在於:上述雷射劃線時之玻璃基板M向裂痕S裂開之方向變形之自由度變高,裂痕S之開裂變得容易。 As a result of the experiment, in the case of Fig. 5a, the portion of the normal region indicated by the hatching is small, especially when the thickness is 0.07 mm, the crack is hardly formed normally, whereas in the case of Fig. 5b, In all the experiments including the glass substrate of the thinnest 0.07 mm, cracks were formed normally over a wide range. The reason for this is considered to be that the degree of freedom in deformation of the glass substrate M in the direction in which the crack S is cracked during the laser scribing is high, and cracking of the crack S is facilitated.

再者,於本實施例中,藉由雷射劃線而形成之裂痕S並非完全分斷,而是以玻璃基板M之厚度整體之80~95%之深度作為目標值,但亦可使裂痕S滲透整個厚度而完全分斷。 Further, in the present embodiment, the crack S formed by the laser scribing is not completely broken, but the depth of 80 to 95% of the entire thickness of the glass substrate M is used as a target value, but cracks may also be caused. S penetrates the entire thickness and is completely broken.

以上,對本發明之代表性實施例進行了說明,但本發明未必特定為上述實施形態,可於達成本發明之目的且不脫離申請專利範圍之範圍內適當進行修正、變更。 The present invention has been described with reference to the preferred embodiments of the present invention. The present invention is not limited to the embodiments described above, and may be modified or changed as appropriate without departing from the scope of the invention.

[產業上之可利用性] [Industrial availability]

本發明主要用於在厚度為0.03~0.2mm等較薄之玻璃基板形成分斷用裂痕之雷射劃線。 The invention is mainly used for forming a laser scribing line for breaking cracks on a thin glass substrate having a thickness of 0.03 to 0.2 mm.

1‧‧‧吸附台 1‧‧‧Adsorption station

20‧‧‧樹脂片 20‧‧‧resin tablets

M‧‧‧玻璃基板 M‧‧‧ glass substrate

S‧‧‧裂痕 S‧‧‧ crack

Claims (4)

一種劃線方法,其特徵在於:其係使用雷射沿著劃線預定線對被吸附於吸附台之玻璃基板之表面進行加熱,並且利用冷媒將該加熱區域急冷,藉此利用上述玻璃基板內所產生之熱應力使形成於上述劃線預定線之開頭部之起始點進展,從而於上述玻璃基板之表面產生沿上述劃線預定線之分斷用裂痕;且由具有氣孔徑為1~10μm、氣孔率為10~40%之氣孔之多孔質板形成上述吸附台之吸附面;將上述玻璃基板貼附於樹脂片上,以該樹脂片為下側,使上述玻璃基板吸附保持於上述多孔質之吸附台上,於該狀態下進行雷射劃線,藉此沿著上述劃線預定線形成上述裂痕。 A scribing method characterized in that a surface of a glass substrate adsorbed to an adsorption stage is heated by a laser along a predetermined line of scribe lines, and the heating area is rapidly cooled by a refrigerant, thereby utilizing the inside of the glass substrate The generated thermal stress progresses at a starting point formed at the beginning of the predetermined line of the scribe line, thereby generating a crack for breaking along the predetermined line of the scribe line on the surface of the glass substrate; and having a pore diameter of 1~ a porous plate having a pore size of 10 μm and a porosity of 10 to 40% forms an adsorption surface of the adsorption stage; the glass substrate is attached to a resin sheet, and the resin sheet is used as a lower side, and the glass substrate is adsorbed and held in the porous sheet On the adsorption stage, the laser scribing is performed in this state, whereby the crack is formed along the predetermined line of the scribe line. 如請求項1之劃線方法,其中上述樹脂片之材料係選自聚乙烯、聚氯乙烯、聚丙烯、聚酯之聚合物樹脂,且厚度為50~200μm。 The method according to claim 1, wherein the material of the resin sheet is selected from the group consisting of polyethylene, polyvinyl chloride, polypropylene, and polyester polymer resins, and has a thickness of 50 to 200 μm. 如請求項1或2之劃線方法,其中上述玻璃基板之厚度為0.03~0.2mm。 The method of claim 1 or 2, wherein the glass substrate has a thickness of 0.03 to 0.2 mm. 一種劃線裝置,其係使用雷射沿著劃線預定線對被吸附於吸附台之玻璃基板之表面進行加熱,並且利用冷媒將該加熱區域急冷,藉此利用上述玻璃基板內所產生之熱應力使形成於上述劃線預定線之開頭部之起始點進展,從而於上述玻璃基板之表面產生沿著上述劃線預定線之分斷用裂痕;且上述吸附台之吸附面由具有氣孔徑為1~10μm、氣孔率為10~40%之氣孔之多孔質板形成, 上述玻璃基板係以如下方式形成,即,被貼附於樹脂片上,且以使該樹脂片為下側之狀態吸附保持於上述多孔質吸附台。 A scribing device that heats a surface of a glass substrate adsorbed to an adsorption stage by using a laser along a predetermined line of scribe lines, and quenches the heated area by a refrigerant, thereby utilizing heat generated in the glass substrate The stress progresses the starting point formed at the beginning of the predetermined line of the scribe line, thereby generating a crack for breaking along the predetermined line of the scribe line on the surface of the glass substrate; and the adsorption surface of the adsorption stage has a pore diameter a porous plate of 1 to 10 μm and a porosity of 10 to 40%, The glass substrate is formed by being attached to a resin sheet and adsorbed and held on the porous adsorption stage in a state in which the resin sheet is on the lower side.
TW104137599A 2014-11-13 2015-11-13 Scribe line forming method and scribe line forming device TW201623173A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014230342 2014-11-13

Publications (1)

Publication Number Publication Date
TW201623173A true TW201623173A (en) 2016-07-01

Family

ID=55981525

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104137599A TW201623173A (en) 2014-11-13 2015-11-13 Scribe line forming method and scribe line forming device

Country Status (4)

Country Link
JP (1) JP2016102048A (en)
KR (1) KR20160057334A (en)
CN (1) CN105601093A (en)
TW (1) TW201623173A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110707033A (en) * 2018-07-09 2020-01-17 株式会社迪思科 Porous chuck table, manufacturing method and processing device of multi-hole chuck table

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6924379B2 (en) * 2017-09-08 2021-08-25 日本電気硝子株式会社 Glass film manufacturing method
CN111941124A (en) * 2020-08-17 2020-11-17 深圳市大富方圆成型技术有限公司 Fixtures and Machine Tools

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001170786A (en) * 1999-12-10 2001-06-26 Hitachi Cable Ltd Nonmetallic material substrate processing method and apparatus
JP2007242787A (en) * 2006-03-07 2007-09-20 Disco Abrasive Syst Ltd Wafer division method
JP2007290304A (en) * 2006-04-27 2007-11-08 Casio Comput Co Ltd Brittle sheet material cutting method and apparatus
DE102007033242A1 (en) * 2007-07-12 2009-01-15 Jenoptik Automatisierungstechnik Gmbh Method and device for separating a plane plate made of brittle material into several individual plates by means of laser
JPWO2009081880A1 (en) * 2007-12-20 2011-05-06 立山マシン株式会社 Application method and application device for application material
JP5246583B2 (en) * 2008-02-29 2013-07-24 旭硝子株式会社 Glass substrate adsorption table and glass substrate processing method
JP5280825B2 (en) * 2008-12-17 2013-09-04 株式会社リンクスタージャパン Substrate table and laser processing apparatus using the same
JP2010232603A (en) * 2009-03-30 2010-10-14 Mitsuboshi Diamond Industrial Co Ltd Substrate fixing device
JP5627201B2 (en) * 2009-06-17 2014-11-19 三星ダイヤモンド工業株式会社 Cleaving method of brittle material substrate
JP5532219B2 (en) * 2010-01-18 2014-06-25 日本電気硝子株式会社 Sheet glass cutting method and apparatus
JP5669001B2 (en) * 2010-07-22 2015-02-12 日本電気硝子株式会社 Glass film cleaving method, glass roll manufacturing method, and glass film cleaving apparatus
JP5437333B2 (en) * 2011-08-30 2014-03-12 三星ダイヤモンド工業株式会社 Glass substrate scribing method and processing apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110707033A (en) * 2018-07-09 2020-01-17 株式会社迪思科 Porous chuck table, manufacturing method and processing device of multi-hole chuck table
TWI807065B (en) * 2018-07-09 2023-07-01 日商迪思科股份有限公司 Porous work clamp, manufacturing method and processing device of porous work clamp
CN110707033B (en) * 2018-07-09 2024-03-29 株式会社迪思科 Porous chuck table, method for manufacturing porous chuck table, and processing apparatus

Also Published As

Publication number Publication date
JP2016102048A (en) 2016-06-02
CN105601093A (en) 2016-05-25
KR20160057334A (en) 2016-05-23

Similar Documents

Publication Publication Date Title
CN102026926B (en) Method of machining vulnerable material substrate
JP5314674B2 (en) Processing method of brittle material substrate
TWI491573B (en) Method for scribing a glass board and a processing device
JP5011048B2 (en) Processing method of brittle material substrate
JP2011194644A (en) Method of processing brittle material substrate and laser processing device used for the same
JP2015209357A (en) Break method and break device
CN106458693A (en) Methods and apparatus for cutting radii in flexible thin glass
KR20160038820A (en) Breaking method and breaking apparatus
KR20160038821A (en) Breaking method and breaking apparatus
JP2003292332A (en) Scribing method and scribing device
TW201623173A (en) Scribe line forming method and scribe line forming device
JP2017014032A (en) Scribe method and scribe device
JP2010173316A (en) Scribing device and scribing method
JP2017014031A (en) Scribe method and scribe device
JP2008307747A (en) Splitting method of brittle material
CN105645752B (en) Method for cutting brittle material substrate
JP2009067618A (en) Apparatus and method for breaking substrate made of brittle material
TW202120447A (en) Substrate processing method and substrate processing apparatus
JP5993684B2 (en) Method for dividing brittle material substrate and scribing apparatus
CN111231134B (en) Slicing method
JP2014065629A (en) Dividing method and scribing device of brittle material substrate
JP2013087000A (en) Laser scribing apparatus
TW201424968A (en) Breaking method and breaking device
TW202128581A (en) Processing method and processing device of substrate