TW201626389A - Resistive memory device - Google Patents
Resistive memory device Download PDFInfo
- Publication number
- TW201626389A TW201626389A TW104100489A TW104100489A TW201626389A TW 201626389 A TW201626389 A TW 201626389A TW 104100489 A TW104100489 A TW 104100489A TW 104100489 A TW104100489 A TW 104100489A TW 201626389 A TW201626389 A TW 201626389A
- Authority
- TW
- Taiwan
- Prior art keywords
- level
- memory cell
- line
- control circuit
- source line
- Prior art date
Links
Landscapes
- Semiconductor Memories (AREA)
Abstract
Description
本發明係有關於一種記憶裝置,特別是有關於一種電阻式記憶裝置。 The present invention relates to a memory device, and more particularly to a resistive memory device.
一般而言,電腦的記憶體分為揮發性記憶體與非揮發性記憶體。非揮發生記憶體包括,唯讀記憶體(ROM)、可規化式唯讀記憶體(PROM)、可擦可規化式唯讀記憶體(EPROM)、以及快閃記憶體。揮發性記憶體包括,動態隨機存取記憶體(DRAME)以及靜態隨機存取記憶體(SRAM)。 In general, computer memory is divided into volatile memory and non-volatile memory. Non-volatile memory includes read only memory (ROM), programmable read only memory (PROM), erasable orchestratable read only memory (EPROM), and flash memory. Volatile memory includes Dynamic Random Access Memory (DRAME) and Static Random Access Memory (SRAM).
目前新型揮發性記憶體包括,鐵電記憶體(ferroelectric memory)、相變化記憶體(phase-change memory)、磁性記憶體(MRAM)及電阻式記憶體(RRAM)。由於電阻式記憶體具有結構簡單、成本低、速度快與低功耗等優點,故大幅被使用。 Current novel volatile memories include ferroelectric memory, phase-change memory, magnetic memory (MRAM), and resistive memory (RRAM). Resistive memory is widely used because of its simple structure, low cost, fast speed and low power consumption.
本發明提供一種電阻式記憶裝置,包括一第一記憶胞、一第二記憶胞以及一控制電路。第一記憶胞耦接一字元線、一第一位元線以及一源極線。第二記憶胞耦接字元線、一第二位元線以及源極線。控制電路控制字元線、第一位元線以及源極線的位準,用以對第一記憶胞進行一設定動作。在進行完設定動作後,第一記憶胞具有一第一阻抗。控制電路控制字 元線、第二位元線以及源極線的位準,用以對第二記憶胞進行一重置動作。在重置動作後,第二記憶胞具有一第二阻抗。第二阻抗大於第一阻抗。在進行設定動作時,控制電路令源極線的位準為一預設位準。在進行重置動作時,控制電路令源極線的位準為預設位準。 The invention provides a resistive memory device comprising a first memory cell, a second memory cell and a control circuit. The first memory cell is coupled to a word line, a first bit line, and a source line. The second memory cell is coupled to the word line, a second bit line, and a source line. The control circuit controls the level of the word line, the first bit line, and the source line to perform a setting action on the first memory cell. After the setting action is performed, the first memory cell has a first impedance. Control circuit control word The levels of the first line, the second bit line, and the source line are used to perform a reset action on the second memory cell. After the reset action, the second memory cell has a second impedance. The second impedance is greater than the first impedance. When the setting action is performed, the control circuit causes the level of the source line to be a predetermined level. When the reset action is performed, the control circuit sets the level of the source line to a preset level.
本發明另提供一種控制方法,適用於一電阻式記 憶裝置。電阻式記憶裝置具有一第一記憶胞以及一第二記憶胞第一記憶胞耦接一字元線、一第一位元線以及一源極線。第二記憶胞耦接字元線、一第二位元線以及源極線。本發明之控制方法包括,執行一設定動作,用以使第一記憶胞具有一第一阻抗以及執行一重置動作,用以使第二記憶胞具有一第二阻抗。 第二阻抗大於第一阻抗。設定及重置動作均包括提供預設位準予源極線。 The invention further provides a control method suitable for a resistive recording Memories. The resistive memory device has a first memory cell and a second memory cell. The first memory cell is coupled to a word line, a first bit line, and a source line. The second memory cell is coupled to the word line, a second bit line, and a source line. The control method of the present invention includes performing a setting operation for causing the first memory cell to have a first impedance and performing a resetting operation for causing the second memory cell to have a second impedance. The second impedance is greater than the first impedance. Both the setting and resetting actions include providing a preset level to the source line.
為讓本發明之特徵和優點能更明顯易懂,下文特舉出較佳實施例,並配合所附圖式,作詳細說明如下: In order to make the features and advantages of the present invention more comprehensible, the preferred embodiments are described below, and are described in detail with reference to the accompanying drawings.
100‧‧‧電阻式記憶裝置 100‧‧‧Resistive memory device
110‧‧‧記憶陣列 110‧‧‧ memory array
120‧‧‧控制電路 120‧‧‧Control circuit
WL<0>~WL<M>‧‧‧字元線 WL<0>~WL<M>‧‧‧ character line
BL<0>~BL<N>‧‧‧位元線 BL<0>~BL<N>‧‧‧ bit line
SL<0>~SL<M>‧‧‧源極線 SL<0>~SL<M>‧‧‧Source line
M00~MMN‧‧‧記憶胞 M 00 ~M MN ‧‧‧ memory cell
121‧‧‧列解碼器 121‧‧‧ column decoder
122‧‧‧行解碼器 122‧‧‧ line decoder
123‧‧‧寫入緩衝器 123‧‧‧Write buffer
124‧‧‧位準控制器 124‧‧‧ position controller
125‧‧‧感測放大單元 125‧‧‧Sensing amplification unit
AW‧‧‧輸入位址 AW‧‧‧ input address
AB‧‧‧輸入位址 AB‧‧‧Input address
DA‧‧‧輸入資料 DA‧‧‧ Input data
VON1、VON1‧‧‧開啟位準 V ON1 , V ON1 ‧‧‧Open level
VOFF1、VOFF2‧‧‧關閉位準 V OFF1 , V OFF2 ‧‧‧Closed
VSET1、VSET2‧‧‧設定位準 V SET1 , V SET2 ‧‧‧Set level
VSL‧‧‧預設位準 V SL ‧‧‧Preset level
VVRF1、VVRF2‧‧‧讀取位準 V VRF1 , V VRF2 ‧‧‧ reading level
VRESET1、VRESET2‧‧‧重置位準 V RESET1 , V RESET2 ‧‧‧Reset level
310、320、330、340、350、360、410、420、430、440、450、460‧‧‧電流路徑 310, 320, 330, 340, 350, 360, 410, 420, 430, 440, 450, 460‧‧‧ current paths
S510、S520、S530‧‧‧步驟 S510, S520, S530‧‧‧ steps
第1圖為本發明之電阻式記憶裝置之示意圖。 Figure 1 is a schematic view of a resistive memory device of the present invention.
第2圖為本發明之記憶陣列110的內部架構示意圖。 FIG. 2 is a schematic diagram showing the internal structure of the memory array 110 of the present invention.
第3A、3B、4A及4B為字元線、位元線及源極線的位準示意圖。 3A, 3B, 4A, and 4B are schematic diagrams of the level of the word line, the bit line, and the source line.
第5圖為本發明之控制方法之流程圖。 Figure 5 is a flow chart of the control method of the present invention.
第1圖為本發明之電阻式記憶裝置之示意圖。如圖 所示,電阻式記憶裝置100包括一記憶陣列110、一控制電路120、字元線WL<0>~WL<M>、位元線BL<0>~BL<N>以及源極線SL<0>~SL<M>。記憶陣列110包括記憶胞M00~MMN。每一記憶胞耦接一相對應的字元線、位元線以及源極線。以記憶胞M00與M01為例,記憶胞M00耦接字元線WL<0>、位元線BL<0>以及源極線SL<0>;記憶胞M01耦接字元線WL<0>、位元線BL<1>以及源極線SL<0>。 Figure 1 is a schematic view of a resistive memory device of the present invention. As shown, the resistive memory device 100 includes a memory array 110, a control circuit 120, word lines WL<0>~WL<M>, bit lines BL<0>~BL<N>, and source lines. SL<0>~SL<M>. Memory array 110 includes memory cells M 00 ~M MN . Each memory cell is coupled to a corresponding word line, bit line, and source line. Taking the memory cells M 00 and M 01 as an example, the memory cell M 00 is coupled to the word line WL<0>, the bit line BL<0>, and the source line SL<0>; the memory cell M 01 is coupled to the word line. WL<0>, bit line BL<1>, and source line SL<0>.
控制電路120控制字元線WL<0>~WL<M>、位元線 BL<0>~BL<N>以及源極線SL<0>~SL<M>的位準,用以存取記憶胞M00~MMN。舉例而言,在一寫入模式下,控制電路120對記憶胞M00~MMN進行一設定(set)動作或是一重置(reset)動作,用以寫入資料至記憶胞M00~MMN。在一讀取模式下,控制電路120進行一驗證(verify)動作,用以讀取記憶胞M00~MMN所儲存的資料。 The control circuit 120 controls the levels of the word lines WL<0>~WL<M>, the bit lines BL<0>~BL<N>, and the source lines SL<0>~SL<M> for accessing Memory cell M 00 ~M MN . For example, in a write mode, the control circuit 120 performs a set action or a reset action on the memory cells M 00 to M MN for writing data to the memory cell M 00 ~ M MN . In a read mode, the control circuit 120 performs a verify operation for reading data stored by the memory cells M 00 to M MN .
舉例而言,在控制電路120對一第一特定記憶胞進 行完設定動作後,第一特定記憶胞具有低阻抗,用以表示儲存在第一特定記憶胞的資料為0。在重置動作後,一第二特定記憶胞具有高阻抗,用以表示儲存在第二特定記憶胞的資料為1。 因此,控制電路120根據記憶胞M00~MMN的阻抗,便可得知儲存在記憶胞M00~MMN的資料。 For example, after the control circuit 120 performs a setting operation on a first specific memory cell, the first specific memory cell has a low impedance to indicate that the data stored in the first specific memory cell is zero. After the resetting operation, a second specific memory cell has a high impedance to indicate that the data stored in the second specific memory cell is one. Thus, control circuit 120 in accordance with the impedance of the memory cell M 00 ~ M MN, and can be 00 ~ M MN information that is stored in the memory cell M.
在本實施例中,在進行設定、重置及驗證動作時, 控制電路120將源極線SL<0>~SL<M>的位準維持在一預設位準。由於源極線SL<0>~SL<M>的位準維持在預設位準,故控制電路120不需改變源極線SL<0>~SL<M>的位準,因此,可縮 短控制電路120寫入資料至記憶胞M00~MMN的寫入時間。 In the present embodiment, the control circuit 120 maintains the levels of the source lines SL<0>~SL<M> at a preset level during the setting, resetting, and verifying operations. Since the level of the source lines SL<0>~SL<M> is maintained at a preset level, the control circuit 120 does not need to change the level of the source lines SL<0>~SL<M>, and thus can be shortened. The control circuit 120 writes the data to the write time of the memory cells M 00 to M MN .
在另一實施例中,控制電路120同時進行設定與重 置動作。舉例而言,在控制電路120對記憶胞M00進行設定動作的同時,控制電路120對記憶胞M01進行重置動作。在其它實施例中,控制電路120先對記憶胞M00~MMN進行設定動作,再對記憶胞M00~MMN進行重置動作。 In another embodiment, the control circuit 120 performs the set and reset actions simultaneously. For example, while the control circuit 120 performs a setting operation on the memory cell M 00 , the control circuit 120 performs a reset operation on the memory cell M 01 . In other embodiments, the control circuit 120 of the first memory cell M 00 ~ M MN setting operation is performed, and then the memory cell M 00 ~ M MN performs the reset operation.
在本實施例中,控制電路120包括一列解碼器121、 一行解碼器122、一寫入緩衝器123、一位準控制器124以及一感測放大單元125,但並非用以限制本發明。任何可控制字元線WL<0>~WL<M>、位元線BL<0>~BL<N>、源極線SL<0>~SL<M>的位準的電路架構,均可作為控制電路120。 In this embodiment, the control circuit 120 includes a column decoder 121, A row of decoders 122, a write buffer 123, a one-bit controller 124, and a sense amplification unit 125 are not intended to limit the invention. Any circuit structure that can control the level of the word line WL<0>~WL<M>, the bit line BL<0>~BL<N>, and the source line SL<0>~SL<M> As the control circuit 120.
列解碼器121耦接字元線WL<0>~WL<M>,並對輸 入位址AW進行解碼,再根據解碼結果開啟至少一字元線。行解碼器122耦接位元線BL<0>~BL<N>,並對輸入位址AB進行解碼,再根據解碼結果開啟至少一位元線。寫入緩衝器123將輸入資料DA寫入至少一記憶胞之中。 The column decoder 121 is coupled to the word line WL<0>~WL<M>, and is connected to the input. The address AW is decoded, and at least one word line is turned on according to the decoding result. The row decoder 122 is coupled to the bit lines BL<0>~BL<N>, decodes the input address AB, and turns on at least one bit line according to the decoding result. The write buffer 123 writes the input data DA into at least one memory cell.
位準控制器124耦接源極線SL<0>~SL<M>,用以控 制源極線SL<0>~SL<M>的位準。在本實施例中,每一源極線SL<0>~SL<M>耦接到同一位準控制器124。本發明並不限制源極線SL<0>~SL<M>與位準控制器之間的連接關係。在另一可能實施例中,源極線SL<0>~SL<M>先耦接在一起,再耦接至一位準控制器。在其它實施例中,源極線SL<0>~SL<M>被劃分成許多群組。每一群組耦接一相對應的位準控制器。 The level controller 124 is coupled to the source lines SL<0>~SL<M> for controlling The level of the source line SL<0>~SL<M>. In this embodiment, each of the source lines SL<0>~SL<M> is coupled to the same level controller 124. The present invention does not limit the connection relationship between the source lines SL<0>~SL<M> and the level controller. In another possible embodiment, the source lines SL<0>~SL<M> are first coupled together and then coupled to the one-bit controller. In other embodiments, the source lines SL<0>~SL<M> are divided into a number of groups. Each group is coupled to a corresponding level controller.
感測放大單元125驗證記憶胞M00~MMN所儲存的資 料,並以並列(parallel out)或串列(serial out)方式輸出資料。本發明並不限定感測放大單元125如何驗證記憶胞。在一可能實施例中,感測放大單元125係利用一互補式偵測(complement sensing)方法,驗證記憶胞所儲存的資料。在互補式偵測方法中,每一記憶胞包括一第一次記憶胞以及一第二次記憶胞。第一及第二次記憶胞的阻抗具有互補關係。在一可能實施例中,當第一及第二次記憶胞分別具有低阻抗及高阻抗時,表示此記憶胞所儲存的資料為0;若第一及第二次記憶胞分別具有高阻抗及低阻抗時,表示此記憶胞所儲存的資料為1。因此,根據第一及第二次記憶胞的阻抗,便可得知記憶胞所儲存的資料。 The sensing amplifying unit 125 verifies the data stored by the memory cells M 00 to M MN and outputs the data in a parallel out or serial out manner. The present invention does not limit how the sense amplification unit 125 verifies the memory cells. In a possible embodiment, the sensing amplification unit 125 uses a complementary sensing method to verify the data stored by the memory cells. In the complementary detection method, each memory cell includes a first memory cell and a second memory cell. The impedances of the first and second memory cells have a complementary relationship. In a possible embodiment, when the first and second memory cells have low impedance and high impedance respectively, it means that the data stored in the memory cell is 0; if the first and second memory cells have high impedance respectively At low impedance, it means that the data stored in this memory cell is 1. Therefore, based on the impedance of the first and second memory cells, the data stored in the memory cells can be known.
在另一可能實施例中,感測放大單元125係利用一參考偵測(reference sensing)方法,驗證記憶胞所儲存的資料。在參考偵測方法中,感測放大單元125將每一記憶胞的阻抗與一參考阻抗相比較,並根據比較結果,得知記憶胞所儲存的資料。 In another possible embodiment, the sensing amplification unit 125 uses a reference sensing method to verify the data stored by the memory cells. In the reference detection method, the sensing amplification unit 125 compares the impedance of each memory cell with a reference impedance, and according to the comparison result, the data stored by the memory cell is known.
第2圖為本發明之記憶陣列110的內部架構示意圖。為方便說明,第2圖僅顯示字元線WL<0>~WL<3>、位元線BL<0>~BL<3>、源極線SL<0>~SL<2>以及記憶胞M00~M33。在本實施例中,源極線SL<0>~SL<2>耦接在一起。 FIG. 2 is a schematic diagram showing the internal structure of the memory array 110 of the present invention. For convenience of description, FIG. 2 only shows the word line WL<0>~WL<3>, the bit line BL<0>~BL<3>, the source line SL<0>~SL<2>, and the memory cell. M 00 ~ M 33 . In this embodiment, the source lines SL<0>~SL<2> are coupled together.
如圖所示,每一記憶胞具有一電晶體以及一可變電阻。以記憶胞M00為例,電晶體T00的閘極耦接字元線WL<0>。電晶體T00的一端耦接源極線SL<0>。可變電阻R00耦接於電晶體T00的另一端與位元線BL<0>之間。在本實施例中,當控制電路120對記憶胞M00進行設定動作時,可變電阻R00便具有低阻 抗。當控制電路120對記憶胞M00進行重置動作時,可變電阻R00便具有高阻抗。 As shown, each memory cell has a transistor and a variable resistor. Taking the memory cell M 00 as an example, the gate of the transistor T 00 is coupled to the word line WL<0>. One end of the transistor T 00 is coupled to the source line SL<0>. The variable resistor R 00 is coupled between the other end of the transistor T 00 and the bit line BL<0>. In the present embodiment, when the control circuit 120 performs a setting operation on the memory cell M 00 , the variable resistor R 00 has a low impedance. When the control circuit 120 performs a reset operation on the memory cell M 00 , the variable resistor R 00 has a high impedance.
第3A、3B、4A及4B為字元線、位元線及源極線的 位準示意圖。為方便說明,第3A、3B、4A及4B圖僅顯示記憶胞M00~M13、字元線WL<0>~WL<1>、位元線BL<0>~BL<3>及源極線SL<0>~SL<1>。 3A, 3B, 4A, and 4B are schematic diagrams of the level of the word line, the bit line, and the source line. For convenience of description, the 3A, 3B, 4A, and 4B diagrams only show the memory cells M 00 ~ M 13 , the word line WL<0>~WL<1>, the bit line BL<0>~BL<3>, and the source. The polar line SL<0>~SL<1>.
當字元線WL<0>為一開啟位準VON1時,便可開啟 記憶胞M00~M03的電晶體T00~T03。由於字元線WL<1>為一關閉位準VOFF1,故不開啟記憶胞M10~M13的電晶體T10~T13。在一可能實施例中,關閉位準VOFF1係為一接地位準。 When the word line WL<0> is an on level V ON1 , the transistors T 00 to T 03 of the memory cells M 00 to M 03 can be turned on. Since the word line WL<1> is a turn-off level V OFF1 , the transistors T 10 to T 13 of the memory cells M 10 to M 13 are not turned on. In a possible embodiment, the off level V OFF1 is a ground level.
在本實施例中,源極線SL<0>~SL<1>的位準為一 預設位準VSL。位元線BL<0>為一設定位準VSET1,並且設定位準VSET1大於預設位準VSL。因此,在記憶胞M00中形成一電流路徑310。由於電流路徑310的電流是由可變電阻R00流向電晶體T00,故對記憶胞M00進行一設定動作。在設定動作後,記憶胞M00具有一低阻抗。在一可能實施例中,記憶胞M00所儲存的資料為0。 In this embodiment, the level of the source lines SL<0>~SL<1> is a preset level V SL . The bit line BL<0> is a set level V SET1 , and the set level V SET1 is greater than the preset level V SL . Therefore, a current path 310 is formed in the memory cell M 00 . Since the current of the current path 310 flows from the variable resistor R 00 to the transistor T 00 , a setting operation is performed on the memory cell M 00 . After setting the action, the memory cell M 00 has a low impedance. In a possible embodiment, the data stored in the memory cell M 00 is zero.
在本實施例中,位元線BL<1>的位準等於預設位準 VSL。由於位元線BL<1>與源極線SL<0>具有相同的位準,故在記憶胞M01內並不會形成電流路徑。因此,不會對記憶胞M01進行設定或重置動作。在其它實施例中,若不需對某些特定的記憶胞進行寫入或重置動作時,則可令特定記憶胞所耦接的位元線的位準等於源極線的位準。 In this embodiment, the level of the bit line BL<1> is equal to the preset level V SL . Since the bit line BL<1> has the same level as the source line SL<0>, a current path is not formed in the memory cell M 01 . Therefore, the memory cell M 01 is not set or reset. In other embodiments, if a specific memory cell is not required to be written or reset, the level of the bit line to which the specific memory cell is coupled may be equal to the level of the source line.
位元線BL<2>~BL<3>為一重置位準VRESET1。在本 實施例中,由於重置位準VRESET1小於預設位準VSL,因此,在記憶胞M02與M03內分別形成電流路徑320與330。由於電流路徑320的電流是由電晶體T02流向可變電阻R02,故對記憶胞M02進行一重置動作。同樣地,記憶胞M03也會進行重置動作。在重置動作後,可變電阻R02與R03均為高阻抗。在本實施例中,儲存在記憶胞M02與M03的資料均為1。 The bit line BL<2>~BL<3> is a reset level V RESET1 . In the present embodiment, since the reset level V RESET1 is smaller than the preset level V SL , current paths 320 and 330 are formed in the memory cells M 02 and M 03 , respectively. Since the current of the current path 320 flows from the transistor T 02 to the variable resistor R 02 , a reset action is performed on the memory cell M 02 . Similarly, the memory cell M 03 will also perform a reset action. After the reset action, the variable resistors R 02 and R 03 are both high impedance. In the present embodiment, the data stored in the memory cells M 02 and M 03 are both 1.
本發明並不限定預設位準VSL的大小。在本實施例 中,預設位準VSL位於設定位準VSET1與重置位準VRESET1之間,並且設定位準VSET1大於重置位準VRESET1。在一可能實施例中,重置位準VRESET1為一接地位準。在此例中,由於不需產生負位準,故可降低電阻式記憶裝置的複雜度。 The invention does not limit the size of the preset level V SL . In this embodiment, the preset level V SL is between the set level V SET1 and the reset level V RESET1 , and the set level V SET1 is greater than the reset level V RESET 1 . In a possible embodiment, the reset level V RESET1 is a ground level. In this case, the complexity of the resistive memory device can be reduced since no negative level is required.
在本實施例中,在進行設定與重置動作時,源極 線SL<0>的位準維持在預設位準VSL。另外,由於設定動作與重置動作同時進行,故可大幅記憶陣列110的寫入時間。 In the present embodiment, when the setting and resetting operations are performed, the level of the source line SL<0> is maintained at the preset level VSL . Further, since the setting operation and the resetting operation are simultaneously performed, the writing time of the array 110 can be largely memorized.
第3B圖為本發明之驗證(Verify)動作的示意圖。字 元線WL<0>為一開啟位準VON1,用以驗證記憶胞M00~M03所儲存的資料。在本實施例中,在進行驗證動作時,源極線SL<0>的位準仍維持在預設位準VSL。此時,位元線BL<0>~BL<3>的位準為一讀取位準VVRF1。在本實施例中,讀取位準VVRF1大於預設位準VSL。因此,在記憶胞M00、M02與M03中分別形成電流路徑340、350與360。電流路徑340的電流係由可變電阻R00流向電晶體T00。電流路徑350的電流係由可變電阻R02流向電晶體T02。電流路徑360的電流係由可變電阻R03流向電晶體T03。在一可能實施例中,電流路徑340的電流大於電流路徑350與360 的電流。電流路徑340的電流可能為10uA,電流路徑350與360的電流可能為1uA。在本實施例中,根據電流路徑340、350與360的電流,便可得知記憶胞M00~M03的阻抗,再藉由記憶胞M00~M03的阻抗,便可得知記憶胞M00~M03所儲存的資料。 Figure 3B is a schematic diagram of the verify operation of the present invention. The word line WL<0> is an open level V ON1 for verifying the data stored in the memory cells M 00 ~ M 03 . In this embodiment, when the verifying operation is performed, the level of the source line SL<0> is still maintained at the preset level VSL . At this time, the level of the bit line BL<0>~BL<3> is a read level V VRF1 . In this embodiment, the read level V VRF1 is greater than the preset level V SL . Therefore, current paths 340, 350, and 360 are formed in memory cells M 00 , M 02 , and M 03 , respectively. The current of the current path 340 flows from the variable resistor R 00 to the transistor T 00 . The current of the current path 350 flows from the variable resistor R 02 to the transistor T 02 . The current of the current path 360 flows from the variable resistor R 03 to the transistor T 03 . In one possible embodiment, the current of current path 340 is greater than the current of current paths 350 and 360. The current of current path 340 may be 10 uA, and the current of current paths 350 and 360 may be 1 uA. In this embodiment, the impedance of the memory cells M 00 to M 03 can be known from the currents of the current paths 340, 350, and 360, and the memory cells can be known by the impedance of the memory cells M 00 to M 03 . Information stored in M 00 ~ M 03 .
第4A圖為本發明之設定及重置動作之示意圖。第 4A圖相似第3A圖,不同之處在於,第4A圖的源極線SL<0>的位準係為一接地位準GND。由於源極線SL<0>的位準係位於設定位準VSET2與重置位準VRESET2之間,故可得知設定位準VSET2係為一正位準,而重置位準VRESET2係為一負位準。在一可能實施例中,設定位準VSET2與接地位準GND之間的位準差等於重置位準VRESET2與接地位準GND之間的位準差。 Fig. 4A is a schematic view showing the setting and resetting operation of the present invention. Fig. 4A is similar to Fig. 3A except that the level of the source line SL<0> of Fig. 4A is a ground level GND. Since the level of the source line SL<0> is between the set level V SET2 and the reset level V RESET2 , it can be known that the set level V SET2 is a positive level, and the reset level V is reset. RESET2 is a negative level. In a possible embodiment, the level difference between the set level V SET2 and the ground level GND is equal to the level difference between the reset level V RESET2 and the ground level GND.
由於字元線WL<1>的位準係為一關閉位準VOFF2, 故不開啟記憶胞M10~M13裡的電晶體T10~T13。在一可能實施例中,關閉位準VOFF2等於重置位準VRESET2。在另一實施例中,關閉位準VOFF2小於關閉位準VOFF1。在其它實施例中,第4A圖的開啟位準VON2、設定位準VSET2、重置位準VRESET2分別小於第3A圖的開啟位準VON1、設定位準VSET1、重置位準VRESET1。 因此,不需使用大尺寸的高壓元件作為電晶體T00~T13,並且增加記憶裝置的可使用空間並減少記憶裝置的元件成本。在本實施例中,電流路徑410的電流係由可變電阻R00流向電晶體T00;電流路徑420的電流係由電晶體T02流向可變電阻R02;電流路徑430的電流係由電晶體T03流向可變電阻R03。 Since the level of the word line WL<1> is a closed level V OFF2 , the transistors T 10 to T 13 in the memory cells M 10 to M 13 are not turned on. In a possible embodiment, the off level V OFF2 is equal to the reset level V RESET2 . In another embodiment, the off level VOFF2 is less than the off level VOFF1 . In other embodiments, the ON level V ON2 , the set level V SET2 , and the reset level V RESET2 of FIG. 4A are respectively smaller than the ON level V ON1 of the 3A diagram, the set level V SET1 , and the reset level. V RESET1 . Therefore, it is not necessary to use a large-sized high-voltage element as the transistors T 00 to T 13 , and the usable space of the memory device is increased and the component cost of the memory device is reduced. In the present embodiment, the current of the current path 410 flows from the variable resistor R 00 to the transistor T 00 ; the current of the current path 420 flows from the transistor T 02 to the variable resistor R 02 ; the current of the current path 430 is electrically The crystal T 03 flows to the variable resistor R 03 .
第4B圖為本發明之驗證動作之示意圖。字元線WL<0>為一開啟位準VON2,用以驗證記憶胞M00~M03所儲存的 資料。在本實施例中,在進行驗證動作時,源極線SL<0>仍為接地位準GND。此時,位元線BL<0>~BL<3>均為一讀取位準VVRF2。在本實施例中,讀取位準VVRF2小於讀取位準VVRF1。另外,電流路徑440、450與460的電流均是由可變電阻流入電晶體。 Figure 4B is a schematic diagram of the verification action of the present invention. The word line WL<0> is an open level V ON2 for verifying the data stored in the memory cells M 00 ~ M 03 . In this embodiment, when the verifying operation is performed, the source line SL<0> is still the ground level GND. At this time, the bit lines BL<0>~BL<3> are all a read level V VRF2 . In the present embodiment, the read level V VRF2 is smaller than the read level V VRF1 . In addition, the currents of the current paths 440, 450, and 460 are all flown into the transistor by the variable resistor.
第5圖為本發明之控制方法之流程圖。本發明之控 制方法適用於一電阻式記憶裝置。在一可能實施例中,電阻式記憶裝置具有一第一記憶胞以及一第二記憶胞。第一記憶胞耦接一字元線、一第一位元線以及一源極線。第二記憶胞耦接該字元線、一第二位元線以及該源極線。 Figure 5 is a flow chart of the control method of the present invention. Control of the invention The method is suitable for a resistive memory device. In a possible embodiment, the resistive memory device has a first memory cell and a second memory cell. The first memory cell is coupled to a word line, a first bit line, and a source line. The second memory cell is coupled to the word line, a second bit line, and the source line.
步驟S510係執行一設定動作。假設,步驟S510係 對第一記憶胞進行設定動作。在一可能實施例中,提供一開啟位準予字元線,提供一設定位準予第一位元線,並提供一預設位準予源極線。執行設定動作後,該第一記憶胞具有一第一阻抗,如低阻抗。 Step S510 performs a setting action. Assume that step S510 is The setting action is performed on the first memory cell. In a possible embodiment, an enable bit is provided to the word line, a set bit is provided to the first bit line, and a preset bit is provided to the source line. After performing the setting action, the first memory cell has a first impedance, such as a low impedance.
步驟S520執行一重置動作。假設,步驟S520係對 第二記憶胞進行重置動作。在一可能實施例中,提供開啟位準予字元線,提供一重置位準予第二位元線,並提供預設位準予源極線。在此例中,執行完重置動作後,第二記憶胞具有一第二阻抗,如高阻抗。在進行設定及重置動作時,提供相同的位準予源極線。因此,不需調整源極線的位準,並且減少電阻式記憶裝置的寫入時間。 Step S520 performs a reset action. Assume that step S520 is correct The second memory cell performs a reset action. In a possible embodiment, an enable bit is provided to the word line, a reset bit is provided to the second bit line, and a preset bit is provided to the source line. In this example, after the reset action is performed, the second memory cell has a second impedance, such as a high impedance. The same level is supplied to the source line during setup and reset operations. Therefore, it is not necessary to adjust the level of the source line and reduce the writing time of the resistive memory device.
在一可能實施例中,步驟S510與S520係同時進行。 在另一實施例中,重置位準小於設定位準。在本實施例中,預 設位準係位於設定位準與重置位準之間。在一可能實施例中,重置位準係為一接地位準。 In a possible embodiment, steps S510 and S520 are performed simultaneously. In another embodiment, the reset level is less than the set level. In this embodiment, the pre The set level is between the set level and the reset level. In a possible embodiment, the reset level is a ground level.
在另一可能實施例中,預設位準係為一接地位準。 在此例中,重置位準係為一負位準。在其它實施例中,若不需對一特定記憶胞進行設定或重置動作時,則可提供預設位準予特定記憶胞所耦接的位元線。在一可能實施例中,特定記憶胞設置於第一及第二記憶胞之間。 In another possible embodiment, the preset level is a ground level. In this example, the reset level is a negative level. In other embodiments, if a specific memory cell is not required to be set or reset, a preset bit can be provided to the bit line to which the specific memory cell is coupled. In a possible embodiment, the specific memory cell is disposed between the first and second memory cells.
在其它實施例中,更包括步驟S530。步驟S530係 進行一驗證動作。在一可能實施例中,步驟S530係偵測第一記憶胞的阻抗,並將偵測結果與一參考阻抗進行比較。在另一可能實施例中,第一及第二記憶胞各自具有一第一次記憶胞以及一第二次記憶胞。以第一記憶胞為例,步驟S530係讀取第一記憶胞的第一及第二次記憶胞的阻抗,並根據讀取結果得知儲存在第一記憶胞的資料數值。 In other embodiments, step S530 is further included. Step S530 Perform a verification action. In a possible embodiment, step S530 detects the impedance of the first memory cell and compares the detection result with a reference impedance. In another possible embodiment, the first and second memory cells each have a first memory cell and a second memory cell. Taking the first memory cell as an example, step S530 reads the impedances of the first and second memory cells of the first memory cell, and learns the data value stored in the first memory cell according to the reading result.
在其它實施例中,在進行驗證動作時,提供開啟 位準予字元線、提供一讀取位準予第一及第二位元線,並提供一預設位準予源極線,用以偵測記憶胞的阻抗。在一可能實施例中,讀取位準大於預設位準,但並非用以限制本發明。由於在執行驗證動作時,提供相同的位準予源極線,因此,不需調整源極線的位準,故可縮短電阻式記憶裝置的讀取時間。 In other embodiments, the opening is provided when the verification action is performed. The bit is given to the word line, a read bit is provided to the first and second bit lines, and a preset bit is provided to the source line for detecting the impedance of the memory cell. In a possible embodiment, the reading level is greater than the preset level, but is not intended to limit the invention. Since the same level is supplied to the source line when the verification operation is performed, the level of the source line is not required to be adjusted, so that the reading time of the resistive memory device can be shortened.
除非另作定義,在此所有詞彙(包含技術與科學詞彙)均屬本發明所屬技術領域中具有通常知識者之一般理解。此外,除非明白表示,詞彙於一般字典中之定義應解釋為與其相關技術領域之文章中意義一致,而不應解釋為理想狀態或過 分正式之語態。 Unless otherwise defined, all terms (including technical and scientific terms) are used in the ordinary meaning In addition, unless explicitly stated, the definition of a vocabulary in a general dictionary should be interpreted as consistent with the meaning of an article in its related technical field, and should not be interpreted as an ideal state or In the official voice.
雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.
WL<0>、WL<1>‧‧‧字元線 WL<0>, WL<1>‧‧‧ character line
BL<0>~BL<3>‧‧‧位元線 BL<0>~BL<3>‧‧‧ bit line
SL<0>~SL<1>‧‧‧源極線 SL<0>~SL<1>‧‧‧Source line
M00~M13‧‧‧記憶胞 M 00 ~M 13 ‧‧‧ memory cells
R00~R13‧‧‧可變電阻 R 00 ~R 13 ‧‧‧Variable resistor
T00~T13‧‧‧電晶體 T 00 ~T 13 ‧‧‧Optoelectronics
VON1‧‧‧開啟位準 V ON1 ‧‧‧Open level
VOFF1‧‧‧關閉位準 V OFF1 ‧‧‧Closed
VSET1‧‧‧設定位準 V SET1 ‧‧‧Set level
VSL‧‧‧預設位準 V SL ‧‧‧Preset level
VRESET1‧‧‧重置位準 V RESET1 ‧‧‧Reset level
310、320、330‧‧‧電流路徑 310, 320, 330‧‧‧ current path
Claims (10)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104100489A TW201626389A (en) | 2015-01-08 | 2015-01-08 | Resistive memory device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104100489A TW201626389A (en) | 2015-01-08 | 2015-01-08 | Resistive memory device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201626389A true TW201626389A (en) | 2016-07-16 |
Family
ID=56985159
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104100489A TW201626389A (en) | 2015-01-08 | 2015-01-08 | Resistive memory device |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW201626389A (en) |
-
2015
- 2015-01-08 TW TW104100489A patent/TW201626389A/en unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10199118B2 (en) | One-time programmable (OTP) memory device for reading multiple fuse bits | |
| CN108573732B (en) | Semiconductor memory device and data writing method | |
| CN105849809B (en) | Nonvolatile sram with multiple storage states | |
| TWI630607B (en) | Memory device | |
| JP6107682B2 (en) | Semiconductor memory device and method for controlling semiconductor memory device | |
| CN102467976A (en) | Memory write error correction circuit | |
| TWI533298B (en) | Varible resistance memory and writing method thereof | |
| CN107112045A (en) | Use the cache MRAM of reference word line read operation | |
| US10319438B2 (en) | Memory with margin current addition and related methods | |
| TWI539457B (en) | Resistive random access memory and manufacturing method thereof | |
| US10796741B1 (en) | Non-volatile memory with a select gate regulator circuit | |
| US9666247B2 (en) | Semiconductor memory apparatus | |
| TW201917734A (en) | Non-volatile memory device and error compensation method for verifying therefor | |
| KR20200145320A (en) | Nonvolatile memory apparatus with mitigating read disturbance and system using the same | |
| US9991000B2 (en) | Memory with margin current addition and related methods | |
| CN104978988B (en) | Memory device | |
| WO2018212082A1 (en) | Memory device and memory device control method | |
| JP2015185191A (en) | Resistance change memory | |
| TW201626389A (en) | Resistive memory device | |
| US20160078937A1 (en) | Resistive memory device and control method thereof | |
| CN106158015A (en) | Resistive formula storage arrangement, read/write circuit unit and operational approach thereof | |
| US9922691B2 (en) | Resistive memory write circuitry with bit line drive strength based on storage cell line resistance | |
| CN205177408U (en) | Memory cell based on hinder and become memory cell RRAM | |
| US20160329096A1 (en) | Semiconductor apparatus for reading stored information of a resistor or cell | |
| CN105989877A (en) | Resistance-type memory device |