[go: up one dir, main page]

TW201611903A - Coater with automatic cleaning function and coater automatic cleaning method - Google Patents

Coater with automatic cleaning function and coater automatic cleaning method

Info

Publication number
TW201611903A
TW201611903A TW104117205A TW104117205A TW201611903A TW 201611903 A TW201611903 A TW 201611903A TW 104117205 A TW104117205 A TW 104117205A TW 104117205 A TW104117205 A TW 104117205A TW 201611903 A TW201611903 A TW 201611903A
Authority
TW
Taiwan
Prior art keywords
coater
automatic cleaning
cleaning solution
chamber
cleaning
Prior art date
Application number
TW104117205A
Other languages
English (en)
Other versions
TWI689354B (zh
Inventor
Hui Wang
Fu-Ping Chen
Wen-Jun Wang
hong-chao Yang
Voha Much
Fu-Fa Chen
Jian Wang
Xiao-Yan Zhang
Shu Yang
Original Assignee
Acm Research Shanghai Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Acm Research Shanghai Inc filed Critical Acm Research Shanghai Inc
Publication of TW201611903A publication Critical patent/TW201611903A/zh
Application granted granted Critical
Publication of TWI689354B publication Critical patent/TWI689354B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H10P72/0426—
    • H10P72/0448—
    • H10P72/7612—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
TW104117205A 2014-09-16 2015-05-28 帶有自動清洗功能的塗膠機及塗膠機的自動清洗方法 TWI689354B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/CN2014/086644 WO2016041151A1 (en) 2014-09-16 2014-09-16 Coater with automatic cleaning function and coater automatic cleaning method
WOPCT/CN2014/086644 2014-09-16

Publications (2)

Publication Number Publication Date
TW201611903A true TW201611903A (en) 2016-04-01
TWI689354B TWI689354B (zh) 2020-04-01

Family

ID=55532440

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104117205A TWI689354B (zh) 2014-09-16 2015-05-28 帶有自動清洗功能的塗膠機及塗膠機的自動清洗方法

Country Status (6)

Country Link
US (2) US10816901B2 (zh)
KR (2) KR102284064B1 (zh)
CN (1) CN106180096B (zh)
SG (1) SG11201701411WA (zh)
TW (1) TWI689354B (zh)
WO (1) WO2016041151A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107088487B (zh) * 2017-05-11 2019-04-09 张维秀 一种化学涂料混合喷涂一体化设备
CN109212918B (zh) * 2018-09-04 2025-02-18 宁波润华全芯微电子设备有限公司 一种表面金属及光刻胶去除装置
CN110941143B (zh) * 2018-09-21 2023-11-17 长鑫存储技术有限公司 光阻旋涂装置以及光阻旋涂方法
JP7232737B2 (ja) * 2019-08-07 2023-03-03 東京エレクトロン株式会社 基板処理装置
CN112536169A (zh) * 2020-11-23 2021-03-23 北京嘉顺鸿科科技有限公司 一种用于电梯生产的喷漆设备
CN113964067B (zh) * 2021-11-26 2022-10-25 江苏威森美微电子有限公司 一种晶圆刻蚀设备
CN115228826A (zh) * 2022-06-29 2022-10-25 华虹半导体(无锡)有限公司 一种清洗时序控制方法、装置、介质、模组及涂胶设备
CN114950869B (zh) * 2022-07-15 2023-05-05 上海图双精密装备有限公司 一种便于操作的涂胶机及其操作方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0714811A (ja) * 1993-06-24 1995-01-17 Hitachi Ltd 洗浄乾燥方法及び洗浄乾燥装置
JP3158264B2 (ja) * 1993-08-11 2001-04-23 東京エレクトロン株式会社 ガス処理装置
JP2908224B2 (ja) * 1993-12-20 1999-06-21 大日本スクリーン製造株式会社 回転式塗布装置
US7018943B2 (en) * 1994-10-27 2006-03-28 Asml Holding N.V. Method of uniformly coating a substrate
US6248168B1 (en) * 1997-12-15 2001-06-19 Tokyo Electron Limited Spin coating apparatus including aging unit and solvent replacement unit
US6270576B1 (en) * 1998-08-05 2001-08-07 Tokyo Electron Limited Coating and developing apparatus
JP2001230176A (ja) * 2000-02-15 2001-08-24 Sony Corp 回転処理装置
JP2002143749A (ja) * 2000-11-08 2002-05-21 Sony Corp 回転塗布装置
US6723168B2 (en) * 2001-06-20 2004-04-20 Taiwan Semiconductor Manufacturing Co., Ltd. Spin-coater with self-cleaning cup and method of using
JP3761482B2 (ja) * 2002-03-26 2006-03-29 大日本スクリーン製造株式会社 基板処理装置およびスプラッシュガードの洗浄方法
JP2004335728A (ja) * 2003-05-07 2004-11-25 Hoya Corp 基板塗布装置及び基板塗布方法
JP4410119B2 (ja) 2005-02-03 2010-02-03 東京エレクトロン株式会社 洗浄装置、塗布、現像装置及び洗浄方法
US20080092806A1 (en) 2006-10-19 2008-04-24 Applied Materials, Inc. Removing residues from substrate processing components
JP4312805B2 (ja) * 2007-03-27 2009-08-12 Ｏｋｉセミコンダクタ株式会社 半導体製造装置とそれを用いた半導体ウェハの製造方法およびそのプログラムを記録した記録媒体
JP2009272402A (ja) * 2008-05-02 2009-11-19 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
KR20100013048A (ko) * 2008-07-30 2010-02-09 주식회사 케이씨텍 회수챔버 세척 방법 및 세척 모듈
US9455139B2 (en) * 2009-06-17 2016-09-27 Novellus Systems, Inc. Methods and apparatus for wetting pretreatment for through resist metal plating
JP5635452B2 (ja) * 2010-07-02 2014-12-03 東京エレクトロン株式会社 基板処理システム
JP5454407B2 (ja) * 2010-07-23 2014-03-26 東京エレクトロン株式会社 液処理装置及び液処理方法
JP5518793B2 (ja) * 2011-06-15 2014-06-11 東京エレクトロン株式会社 液処理装置および液処理方法
US20130008602A1 (en) * 2011-07-07 2013-01-10 Lam Research Ag Apparatus for treating a wafer-shaped article
KR101501362B1 (ko) * 2012-08-09 2015-03-10 가부시키가이샤 스크린 홀딩스 기판처리장치 및 기판처리방법
CN203437361U (zh) * 2013-08-20 2014-02-19 中芯国际集成电路制造(北京)有限公司 涂胶显影机上盖清洗装置
CN203764494U (zh) 2014-03-07 2014-08-13 中芯国际集成电路制造(北京)有限公司 涂胶机

Also Published As

Publication number Publication date
TWI689354B (zh) 2020-04-01
KR102284064B1 (ko) 2021-08-02
US20210072645A1 (en) 2021-03-11
SG11201701411WA (en) 2017-04-27
US20170248848A1 (en) 2017-08-31
US12111575B2 (en) 2024-10-08
US10816901B2 (en) 2020-10-27
CN106180096A (zh) 2016-12-07
KR20170054399A (ko) 2017-05-17
KR102415684B1 (ko) 2022-07-05
WO2016041151A1 (en) 2016-03-24
KR20210095967A (ko) 2021-08-03
CN106180096B (zh) 2019-12-24
WO2016041151A9 (en) 2017-04-06

Similar Documents

Publication Publication Date Title
TW201611903A (en) Coater with automatic cleaning function and coater automatic cleaning method
TW201613016A (en) Substrate treatment apparatus, and substrate treatment method
MX2016009536A (es) Envase para composicion de tratamiento activada por luz.
SG10201901404XA (en) Washing device and washing method
WO2015145122A3 (en) Method for coating a filter substrate
TW201613012A (en) Substrate processing device
WO2010093568A3 (en) Non-contact substrate processing
EP3472447A4 (en) METHOD FOR DETERMINING THE PROPER OPERATION OF A VALVE IN A GAS TANK SYSTEM
HUE046087T2 (hu) Rendszer hozzávalók tartósítására és kiadagolására, valamint eljárás hozzávalóknak a kiadagolására és egy hordozóra való helyezésére
MX2016012091A (es) Procesos de preparacion de bebida.
SG11201610457YA (en) Wafer chuck, device and method for detaching a substrate
EP4234103A3 (en) Fluid discharge device, fluid discharge method and fluid application device
TW201611899A (en) Coating device
GB2547056B (en) A system for determining the condition of a fluid in a tank, an apparatus including the system and a method for managing the condition of the fluid
IL266865A (en) Absorption chiller-heater, replenishing liquid for absorption chiller-heater, absorption liquid for absorption chiller-heater, and maintenance method
MX2017001639A (es) Aparato y metodo para dispensar soluciones a partir de productos solidos.
GB202209103D0 (en) Coating liquid mixing device, and method for mixing coating liquids
MX378827B (es) Sistema y metodo de extension de tapa de jarra.
EP3442015A4 (en) WAFERHALTEMECHANISM AND METHOD FOR TURNING TABLE AND THREAD-WATER HOLDING DEVICE
PL3747551T3 (pl) Urządzenie uwalniające i sposób dostarczania cieczy
GB201507792D0 (en) Fluid flow device on a porous substrate and method for making the same
MX2016015697A (es) Metodo para elaborar un aparato adaptable para transportar y depositar fluidos.
GB2543197A (en) Methods and apparatus for controlling metals in liquids
GB201518585D0 (en) Apparatus & Method for manufacturing liquid enzyme, and a system & method for coating pellets with the liquid enzyme
MX351142B (es) Máquina y procedimiento para tratar componentes colados.