TW201616562A - Using nano-spheres or micro-spheres and laser to fabricate substrate with nanostructures - Google Patents

Abstract

The present invention discloses a method of using nano-spheres or micro-spheres and laser to fabricate substrate with nanostructures. The method comprises the steps of: providing a substrate; pasting micro balls; performing laser etching; and removing the micro balls to generate a roughened substrate. The micro balls on the substrate focus the laser light on the surface of the substrate, and let the laser etch the substrate. With the implementation of the present invention, the cost of making roughened substrate is reduced, the efficiency of making roughened substrate is promoted due to the disclosed fast method, and can be applied to BIO industry, OLED, LED, 3D IC and Solar cell industries that require roughened or patterned substrates.

Description

Method for manufacturing microstructured roughened substrate by using nanosphere ball and laser

BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a method of fabricating a roughened substrate having microstructures, and more particularly to a method of fabricating a roughened substrate having microstructures using nanosphere spheres and lasers.

With the rise of social modernization and environmental awareness, people's demand for energy-saving products is rising. The rapid progress of LED, OLED and solar cell industry and the significant reduction in cost have made LED, OLED and solar cells gradually become the main lighting components under energy-saving requirements.

Due to the semiconductor and optical properties of LED, OLED and solar cell products, the higher the surface roughness of the substrates used for LEDs, OLEDs and solar cells, the better the optical efficiency that can be produced. Therefore, whether it is academia or the OLED, LED and solar cell industries, great research and development energy has been invested in the research and innovation of substrate roughening.

However, today, the method of manufacturing a substrate roughening method that saves time and money and has high efficiency is still unsuccessful. Most mass production is still yellow lithography The process is in progress.

The yellow light lithography process can produce roughened substrates, but the yellow lithography process is quite expensive, and a large amount of photoresist must be used, which is not only costly, but also indirectly pollutes the global environment.

In view of this, a practical method for manufacturing a roughened substrate having a microstructure by using a nanosphere ball and a laser, with a simple optical device and design, requires a small volume, requires no expensive equipment, and requires low cost. The high-quality roughened substrate can be produced, and the process time is shorter than that of the conventional yellow light lithography process, and the efficiency of manufacturing the roughened substrate can be improved, and LEDs and OLEDs are increasingly used. The solar cell industry is looking forward to it.

The present invention is a method for fabricating a microstructured roughened substrate using nanosphere spheres and lasers, comprising the steps of: providing a substrate; laying microspheres; performing laser illumination etching; and removing microspheres and forming roughness The substrate. Through the implementation of the invention, the manufacturing cost of forming the roughened substrate can be reduced, and the manufacturing efficiency of the roughened substrate can be improved, and the utility model can be widely applied in the field of biotechnology, and the OLED, the LED, the 3D IC and the solar cell need to be roughened or patterned. The industry of substrates.

The invention provides a method for manufacturing a roughened substrate having microstructures by using nanosphere spheres and lasers, comprising the steps of: providing a substrate; laying a microsphere, which is laid on a surface of one of the substrates; The microsphere layer is composed of at least one microsphere; performing laser irradiation etching, irradiating the microsphere layer with a laser, and the microsphere focuses the laser to the surface and etching the surface to form at least one groove And removing the microspheres and forming a roughening base A plate that removes microspheres from the surface and forms a roughened substrate having at least one microstructure.

The invention further provides a method for manufacturing a roughened substrate having a microstructure by using a nanosphere ball and a laser, comprising the steps of: providing a substrate; setting a roughening target region, which is selected on a surface of the substrate; Shrinking the target area and masking the area outside the roughened target area with a mask; laying a microsphere which is laid on the surface having the roughened target area and the mask to lay a microsphere layer, wherein the microsphere layer is composed of at least one Forming a microsphere; performing a laser illumination etching by irradiating the microsphere layer with a laser, and the microsphere focuses the laser to the roughened target area and etching the roughened target area to form at least one groove; The microspheres and mask are removed and a roughened substrate is formed which removes the microspheres and the mask and forms a roughened substrate having at least one microstructure.

With the implementation of the present invention, at least the following advancements can be achieved:

First, save the process equipment and cost of manufacturing roughened substrates.

Second, improve the manufacturing efficiency of the roughened substrate.

In order to make the technical content of the present invention known to those skilled in the art and to implement the present invention, and in accordance with the disclosure, the scope of the application, and the drawings, the related objects and advantages of the present invention can be easily understood by those skilled in the art. The detailed features and advantages of the present invention will be described in detail in the embodiments.

S100‧‧‧Method for manufacturing a microstructured roughened substrate using nanosphere spheres and lasers

S200‧‧‧Method for manufacturing a microstructured roughened substrate using nanosphere spheres and lasers

S10‧‧‧ provides a substrate

S15‧‧‧Set rough target area

S20‧‧‧ laying miniature spheres

S30‧‧‧Laser illumination etching

S40‧‧‧Remove the microspheres and form a roughened substrate

S50‧‧‧Remove the microspheres and masks and form a roughened substrate

100‧‧‧Substrate

100'‧‧‧Roughened substrate

100"‧‧‧Roughened substrate

200‧‧‧Microsphere layer

10‧‧‧Microspheres

20‧‧‧Laser

30‧‧‧ Groove

40‧‧‧ rough target area

50‧‧‧ mask

1 is a step diagram of a method of manufacturing a roughened substrate having a microstructure by using a nanosphere ball and a laser according to an embodiment of the present invention.

2 is a schematic cross-sectional view of a substrate according to an embodiment of the present invention.

FIG. 3 is a cross-sectional view showing a substrate on which a microsphere is laid according to an embodiment of the present invention.

4A is a cross-sectional view showing a substrate in which a microsphere is laid by laser irradiation according to an embodiment of the present invention.

FIG. 4B is a schematic cross-sectional view showing another embodiment of the present invention for etching a substrate on which a microsphere is laid by laser irradiation.

FIG. 5 is a cross-sectional view showing a substrate on which a microsphere is laid after laser irradiation etching according to an embodiment of the present invention.

Figure 6 is a cross-sectional view showing a roughened substrate having a microstructure according to an embodiment of the present invention.

Fig. 7 is a view showing the steps of a method for manufacturing a roughened substrate having a microstructure by using a nanosphere ball and a laser according to an embodiment of the present invention.

Figure 8 is a cross-sectional view showing a substrate, a roughened target area, and a mask according to an embodiment of the present invention.

Figure 9 is a cross-sectional view showing a substrate, a roughened target region, and a mask and a microsphere layer laid in the embodiment of the present invention.

Figure 10 is a cross-sectional view showing an embodiment of the present invention irradiated with laser light as in the embodiment of Figure 9.

Figure 11 is a cross-sectional view showing a groove formed by roughening a target region according to an embodiment of the present invention.

Figure 12 is a cross-sectional view showing another roughened substrate having a microstructure according to an embodiment of the present invention.

Referring to FIG. 1 , a method S100 for manufacturing a microstructured roughened substrate by using a nanosphere ball and a laser as an embodiment includes the following steps: providing a substrate (step S10); laying a micro The sphere (step S20); performing laser irradiation etching (step S30); and removing the microspheres and forming a roughened substrate (step S40).

As shown in FIGS. 1 and 2, a substrate is provided (step S10), and a substrate 100 to be surface roughened is first fixed. The substrate 100 may be a single crystal germanium material, a polycrystalline germanium material, an amorphous germanium material, a microcrystalline germanium material, a tantalum carbide, a gallium oxide, a sapphire material, a ceramic material, a transparent conductive material, a metal thin film, a flexible substrate, gallium arsenide, and the like. It is formed by five or two groups of materials, and can be used as a substrate 100 for application or manufacture of LEDs, OLEDs, 3D ICs and solar cells in the field of biotechnology.

As shown in FIGS. 1 and 3, a microsphere is laid (step S20), and a microsphere layer 200 is laid on one surface of the substrate 100, and the microsphere layer 200 is composed of at least one microsphere 10, and The two microspheres 10 may not overlap. That is to say, the microsphere layer 200 may be formed by arranging a plurality of single microspheres 10 adjacent to each other without overlapping.

The microsphere layer 200 as shown in FIG. 3 may be composed of a nano-scale microsphere 10, a so-called nanosphere, or a micro-scale microsphere 10, also known as a microsphere. Composition; or a part of the nano-scale microsphere 10 and another micro-scale microsphere 10, namely nanosphere and microsphere.

As shown in FIG. 1 , FIG. 4A and FIG. 4B , laser irradiation etching is performed (step S30 ), which irradiates the microsphere layer 200 with a laser 20 and the microspheres. Each of the microspheres 10 of the bulk layer 200 respectively focuses the laser light of the laser 20 onto the surface of the substrate 100, and etches the surface of the substrate 100 to form at least one recess 30.

As shown in FIGS. 4A and 4B, when the beam emitted by the laser 20 cannot cover the entire surface of the substrate 100 at one time, the laser 20 can be controlled to move so that the laser 20 can illuminate the entire substrate 100. All of the microspheres 10 on the surface are etched by the focus of the microspheres 10, and at least one recess 30 is formed on the surface of the substrate 100.

As shown in FIG. 5, a schematic cross-sectional view of at least one recess 30 formed on the surface of the substrate 100 after the substrate 100 having the microsphere layer 200 is etched by the laser 20 is etched.

As shown in FIGS. 1 and 6, the microspheres are removed and a roughened substrate is formed (step S40), which is removed from the surface of the substrate 100 after the at least one recess 30 is formed on the surface of the substrate 100. The microsphere 10, that is, the microsphere layer 200 is removed, and a roughened substrate 100' having a plurality of microstructures formed by the recesses 30 is formed.

Next, referring to another method S200 for manufacturing a microstructured roughened substrate by using a nanosphere ball and a laser as shown in FIG. 7, the method includes the following steps: providing a substrate (step S10) Setting the roughening target area (step S15); laying the microspheres (step S20); performing laser irradiation etching (step S30); and removing the microspheres and the mask and forming the roughened substrate (step S50).

As shown in FIGS. 7 and 2, a substrate is provided (step S10), and a substrate 100 to be surface roughened is first fixed. The substrate 100 may be a single crystal germanium material, a polycrystalline germanium material, an amorphous germanium material, a microcrystalline germanium material, tantalum carbide, and oxidation. Gallium, sapphire, ceramic, transparent conductive materials, metal film, plastic, metal oxide, flexible substrate, gallium arsenide and other three or five or six or six materials, can be used in the field of biotechnology applications or manufacturing A substrate 100 of LED, OLED, 3D IC and solar cell.

As shown in FIGS. 7 and 8, a roughening target area is set (step S15), which is selected on a surface of the substrate 100 to define a roughened target area 40, and a mask 50 is used to shield the surface from the rough. An area other than the target area 40. The mask 50 is such that the light of the laser is not etched into the substrate 100.

As shown in FIGS. 7 and 9, a microsphere is laid (step S20), and a microsphere layer 200 is laid on the surface having the roughened target region 40 and the mask 50, wherein the microsphere layer 200 is composed of at least one The microspheres 10 are composed, and any two microspheres 10 may not overlap. That is to say, the microsphere layer 200 may be formed by arranging a plurality of single microspheres 10 adjacent to each other without overlapping.

The microsphere layer 200 as shown in FIG. 9 may be composed of a nano-scale microsphere 10, that is, a so-called nanosphere, or a micro-scale microsphere 10, also called a microsphere. Composition; or a part of the nano-scale microsphere 10 and another micro-scale microsphere 10, namely nanosphere and microsphere.

As shown in FIGS. 7 , 10 , and 11 , laser irradiation etching is performed (step S30 ), which irradiates the microsphere layer 200 with a laser 20 and roughens the microsphere 10 on the target region 40, The laser light of the laser 20 can be focused to the surface of the substrate 100 of the roughened target region 40, and the surface of the substrate 100 of the roughened target region 40 is etched and at least one recess 30 is formed.

As shown in FIG. 11, the substrate is provided with the microsphere layer 200 100. A schematic structural cross-sectional view of at least one recess 30 formed on the surface of the substrate 100 of the roughened target region 40 after being irradiated by the laser 20 irradiation.

As shown in FIGS. 7 and 12, the microspheres and the mask are removed and a roughened substrate is formed (step S50), after at least one recess 30 is formed on the surface of the substrate 100 of the roughened target region 40, The surface of the substrate 100 removes the microspheres 10 and the mask 50, that is, removes the microsphere layer 200 and the mask 50, and forms a roughened substrate 100" having a plurality of microstructures, wherein the microstructure is It is formed by at least one groove 30.

It can be seen from the foregoing embodiments that the method S100 for manufacturing a roughened substrate having a microstructure by using a nanosphere ball and a laser, and the method S200 for manufacturing a roughened substrate having a microstructure by using a nanosphere ball and a laser are both The cost of manufacturing the roughened substrate 100' or the roughened substrate 100" can be greatly reduced without using expensive equipment of the conventional yellow light lithography process, or a photoresist material that is conventionally used in the process.

On the other hand, the method S100 for manufacturing a roughened substrate having a microstructure by using a nanosphere ball and a laser to produce a roughened substrate 100', and a nanostructured roughened substrate made of a nanosphere and a laser are used. The method S200 manufactures the roughened substrate 100", and the required use time is shorter than that of the conventional yellow light lithography process, and the efficiency of manufacturing the roughened substrate 100' or the roughened substrate 100" can be improved.

The embodiments are described to illustrate the features of the present invention, and the purpose of the present invention is to enable those skilled in the art to understand the present invention and to implement the present invention without limiting the scope of the present invention. Equivalent modifications or modifications made by the spirit of the disclosure should still be included in the scope of the claims described below.

S100‧‧‧Method for manufacturing a microstructured roughened substrate using nanosphere spheres and lasers

S10‧‧‧ provides a substrate

S20‧‧‧ laying miniature spheres

S30‧‧‧Laser illumination etching

S40‧‧‧Remove the microspheres and form a roughened substrate

Claims (10)

A method for fabricating a microstructured roughened substrate by using a nanosphere ball and a laser, comprising the steps of: providing a substrate; laying a microsphere, which is attached to a surface of the substrate to lay a microsphere layer, the micro The sphere layer is composed of at least one microsphere; performing a laser illumination etching, irradiating the microsphere layer with a laser, and the microsphere focuses the laser to the surface and etching the surface and forming at least a recess; and removing the microsphere and forming a roughened substrate that removes the microsphere from the surface and forms a roughened substrate having at least one microstructure. A method of fabricating a microstructured roughened substrate by nanosphere spheres and lasers as described in claim 1, wherein the microsphere layer is composed of nanoscale microspheres. A method of fabricating a microstructured roughened substrate by nanosphere spheres and lasers as described in claim 1, wherein the microsphere layer is composed of micron-sized microspheres. A method of fabricating a microstructured roughened substrate by nanosphere spheres and lasers as described in claim 1, wherein the microsphere layer is composed of microspheres of micron-scale and nanoscale. A method for manufacturing a roughened substrate having a microstructure by using a nanosphere ball and a laser as described in claim 1, wherein the substrate is a single crystal germanium material, a polycrystalline germanium material, an amorphous germanium material, or a microcrystalline germanium. Material, tantalum carbide, gallium oxide, sapphire, ceramic, transparent conductive material, metal film, plastic, metal oxide Materials, soft substrates, gallium arsenide and other three or five or six family materials. A method for fabricating a microstructured roughened substrate by using a nanosphere ball and a laser, comprising the steps of: providing a substrate; setting a roughened target region, the method of selecting a roughened target on a surface of the substrate a region, and shielding a region other than the roughened target region with a mask; laying a microsphere with a microsphere layer disposed on the surface having the roughened target region and the mask, wherein the microsphere layer is Constructed by at least one microsphere; performing laser irradiation etching, irradiating the microsphere layer with a laser, and the microsphere focuses the laser to the roughened target region and etching the roughened target region Forming at least one recess; and removing the microsphere and the mask and forming a roughened substrate that removes the microsphere and the mask and forms a roughened substrate having at least one microstructure. A method of fabricating a microstructured roughened substrate by nanosphere spheres and lasers as described in claim 6 wherein the microsphere layer is composed of nanoscale microspheres. A method of fabricating a microstructured roughened substrate by nanosphere spheres and lasers as described in claim 6, wherein the microsphere layer is composed of micron-sized microspheres. A method of fabricating a microstructured roughened substrate by nanosphere spheres and lasers as described in claim 6, wherein the microsphere layer is composed of microspheres of micron grade and nanometer grade. Manufactured by nanosphere ball and laser as described in item 6 of the patent application scope A method for roughening a substrate by a microstructure, wherein the substrate is a single crystal germanium material, a polycrystalline germanium material, an amorphous germanium material, a microcrystalline germanium material, a tantalum carbide, a gallium oxide, a sapphire material, a ceramic material, a transparent conductive material, a metal film, Plastic, metal oxide, soft substrate, gallium arsenide and other three or five or six materials.