TW201601890A - Method for splitting brittle substrate - Google Patents
Method for splitting brittle substrate Download PDFInfo
- Publication number
- TW201601890A TW201601890A TW104113588A TW104113588A TW201601890A TW 201601890 A TW201601890 A TW 201601890A TW 104113588 A TW104113588 A TW 104113588A TW 104113588 A TW104113588 A TW 104113588A TW 201601890 A TW201601890 A TW 201601890A
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- Taiwan
- Prior art keywords
- line
- brittle substrate
- film
- crack
- breaking
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 219
- 238000000034 method Methods 0.000 title claims description 84
- 238000005520 cutting process Methods 0.000 claims abstract description 31
- 239000011521 glass Substances 0.000 claims description 101
- 238000003825 pressing Methods 0.000 claims description 10
- 229920003002 synthetic resin Polymers 0.000 claims description 8
- 239000000057 synthetic resin Substances 0.000 claims description 8
- 229910010272 inorganic material Inorganic materials 0.000 claims description 5
- 239000011147 inorganic material Substances 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 230000004048 modification Effects 0.000 description 24
- 238000012986 modification Methods 0.000 description 24
- 230000015572 biosynthetic process Effects 0.000 description 23
- 230000035882 stress Effects 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 12
- 229910003460 diamond Inorganic materials 0.000 description 7
- 239000010432 diamond Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 238000005452 bending Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000006355 external stress Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/037—Controlling or regulating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0017—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/033—Apparatus for opening score lines in glass sheets
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
Description
本發明係關於脆性基板之分斷方法,尤其是關於設置有膜之脆性基板之分斷方法。 The present invention relates to a method for breaking a brittle substrate, and more particularly to a method for breaking a brittle substrate provided with a film.
於平面顯示面板或太陽電池平板等電性機器之製造中,常常需要分斷玻璃基板等脆性基板。首先於基板上形成劃線,接著沿著該劃線分斷基板。劃線係可藉由使用銑刀機械性加工基板而形成。藉由銑刀於基板上滑動或滾動,於基板上藉由塑性變形而形成溝槽,同時,於該溝槽之正下方形成垂直裂縫。其後,進行所謂斷裂工序之應力賦予。藉由斷裂工序使裂縫於厚度方向完全行進,藉此分斷基板。 In the manufacture of an electric device such as a flat display panel or a solar cell panel, it is often necessary to separate a brittle substrate such as a glass substrate. First, a scribe line is formed on the substrate, and then the substrate is separated along the scribe line. The scribing system can be formed by mechanically processing the substrate using a milling cutter. By sliding or rolling on the substrate by the milling cutter, grooves are formed on the substrate by plastic deformation, and vertical cracks are formed directly under the grooves. Thereafter, stress is applied in a so-called breaking process. The crack is continuously moved in the thickness direction by the breaking process, thereby breaking the substrate.
有時會於被分斷之脆性基板上設置有膜。於該情形時,與膜一起劃線脆性基板之表面。例如,根據日本特開2000-280234號公報,揭示有平面顯示面板用之彩色濾光片基板之切斷方法。該彩色濾光片基板係藉由噴墨法製造者,具有設置於玻璃基板上之油墨容納層及保護層。如此於基板上設置有膜之情形時,劃線容易變得不穩定。為了對應該問題,根據上述公報之技術,於劃線之形成中,使劃線條件變化。 A film is sometimes provided on the brittle substrate that is broken. In this case, the surface of the brittle substrate is scribed together with the film. A method of cutting a color filter substrate for a flat display panel is disclosed in Japanese Laid-Open Patent Publication No. 2000-280234. The color filter substrate is manufactured by an inkjet method and has an ink containing layer and a protective layer provided on a glass substrate. When the film is provided on the substrate as described above, the scribe line tends to be unstable. In order to cope with the problem, according to the technique of the above publication, the scribing conditions are changed in the formation of the scribing.
[專利文獻1]日本特開2000-280234號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2000-280234
如上述公報之技術般雖有嘗試改善,但要於設置有膜之脆性基板穩定地形成劃線係依然有困難。其原因可認為難以將劃線條件針對膜之材料與脆性基板之材料兩者而最佳化。若劃線之形成不穩定,則使用其之基板之分斷亦不穩定。 Although attempts have been made to improve the technique of the above-mentioned publication, it is still difficult to stably form a scribing system on a brittle substrate provided with a film. The reason for this is considered to be that it is difficult to optimize the scribing conditions for both the material of the film and the material of the brittle substrate. If the formation of the scribe line is unstable, the division of the substrate using the same is also unstable.
本發明係為了解決上述問題而完成者,其目的在於提供一種可穩定的分斷設置有膜之脆性基板之脆性基板之分斷方法。 The present invention has been made to solve the above problems, and an object thereof is to provide a method for breaking a brittle substrate in which a brittle substrate having a film is stably separated.
本發明之脆性基板之分斷方法包含以下工序:準備具有表面、且具有垂直於上述表面之厚度方向之脆性基板;將刀尖按壓於上述脆性基板之上述表面;使藉由上述按壓工序按壓之上述刀尖於上述脆性基板之上述表面上滑動,藉此於上述脆性基板之上述表面上產生塑性變形,而形成具有溝槽形狀之溝槽線。形成上述溝槽線之工序可如下進行:獲得於上述溝槽線之正下方、上述脆性基板於與上述溝槽線交叉之方向上連續相連之狀態即無裂縫狀態。又,本發明之脆性基板之分斷方法更包含以下工序:於形成上述溝槽線之工序後,於上述脆性基板之上述表面,形成至少部分覆蓋上述溝槽線之膜;於形成上述膜之工序後,藉由使上述脆性基板之裂縫沿著上述溝槽線於上述厚度方向伸展,而形成裂縫線。藉由上述裂縫線,於上述溝槽線之正下方、上述脆性基板於與上述溝槽線交叉之方向上之連續相連斷開。本發明之脆性基板之分斷方法更包含沿著上述裂縫線分斷上述脆性基板之工序。 The breaking method of the brittle substrate of the present invention comprises the steps of: preparing a brittle substrate having a surface and having a thickness direction perpendicular to the surface; pressing the blade edge against the surface of the brittle substrate; and pressing the pressing step The blade edge slides on the surface of the brittle substrate to thereby plastically deform the surface of the brittle substrate to form a groove line having a groove shape. The step of forming the trench line may be performed in a state in which the brittle substrate is continuously connected in a direction intersecting the trench line directly under the trench line, that is, in a crack-free state. Further, the breaking method of the brittle substrate of the present invention further includes the step of forming a film at least partially covering the groove line on the surface of the brittle substrate after the step of forming the groove line; After the step, the crack line is formed by stretching the crack of the brittle substrate along the groove line in the thickness direction. The fragile substrate is continuously connected to the brittle substrate in a direction crossing the groove line by the crack line directly under the groove line. The breaking method of the brittle substrate of the present invention further includes the step of dividing the brittle substrate along the crack line.
另,上述所謂「將刀尖按壓於表面」是指將刀尖按壓於「表面」之任意位置者,因此,亦可指將刀尖按壓於「表面」之邊緣。 In addition, the above-mentioned "pressing the blade tip against the surface" means that the blade edge is pressed to any position of the "surface". Therefore, the blade edge may be pressed against the edge of the "surface".
根據本發明,作為規定分斷脆性基板之位置之線,形成於其正下方不具有裂縫之溝槽線。作為分斷之直接契機所使用之裂縫線係於 形成溝槽線後形成。藉此,形成溝槽線後且形成裂縫線前之脆性基板不但藉由溝槽線規定所要分斷之位置,且由於尚未形成裂縫線,故處於不會輕易產生分斷之狀態。於該狀態中,於溝槽線、即規定分斷脆性基板之位置之線上形成膜。其後,作為分斷之直接契機所使用之裂縫線藉由沿著溝槽線使裂縫自行對準地伸展而形成。藉此可幾乎不受膜存在之影響而穩定地形成裂縫線。因此,可穩定地分斷脆性基板。 According to the present invention, as a line defining the position of the brittle substrate, a groove line having no crack directly under it is formed. The crack line used as a direct trigger for breaking is tied to Formed after forming a groove line. Thereby, the brittle substrate before the formation of the groove line and before the formation of the crack line not only defines the position to be broken by the groove line, but also does not easily form a state in which the crack line is not formed. In this state, a film is formed on the groove line, that is, on the line defining the position of the brittle substrate. Thereafter, the crack line used as a direct trigger for the breaking is formed by stretching the crack in a self-aligned manner along the groove line. Thereby, the crack line can be stably formed almost without being affected by the presence of the film. Therefore, the brittle substrate can be stably separated.
4‧‧‧玻璃基板(脆性基板) 4‧‧‧Glass substrate (brittle substrate)
4a‧‧‧基板片 4a‧‧‧Substrate film
4b‧‧‧基板片 4b‧‧‧Substrate film
11‧‧‧構件 11‧‧‧ components
21‧‧‧膜 21‧‧‧ film
21a‧‧‧部分 Section 21a‧‧‧
21b‧‧‧部分 Section 21b‧‧‧
22‧‧‧膜 22‧‧‧ film
22a‧‧‧部分 Section 22a‧‧‧
22b‧‧‧部分 Section 22b‧‧‧
50‧‧‧切割器具 50‧‧‧ cutting instruments
50p‧‧‧割器具 50p‧‧‧ cutting appliances
51‧‧‧刀尖 51‧‧‧Tool tip
51P‧‧‧刀尖 51P‧‧‧ cutting edge
51v‧‧‧刀尖 51v‧‧‧ pointed
52‧‧‧刀柄 52‧‧‧Knife
52p‧‧‧刀柄 52p‧‧‧holder
AL‧‧‧輔助線 AL‧‧‧Auxiliary line
AX‧‧‧軸方向 AX‧‧‧ axis direction
CL‧‧‧裂縫線 CL‧‧‧ crack line
DA‧‧‧方向 DA‧‧‧ directions
DB‧‧‧方向 DB‧‧‧ direction
DC‧‧‧方向 DC‧‧ direction
DT‧‧‧厚度方向 DT‧‧‧ thickness direction
ED1‧‧‧邊(第1邊) ED1‧‧‧ side (1st side)
ED2‧‧‧邊(第2邊) ED2‧‧‧ side (2nd side)
ED3‧‧‧邊 ED3‧‧‧ side
ED4‧‧‧邊 ED4‧‧‧ side
FB‧‧‧外力 FB‧‧‧ external force
HL‧‧‧切口 HL‧‧ cut
IB-IB‧‧‧線 IB-IB‧‧‧ line
IIB-IIB‧‧‧線 IIB-IIB‧‧‧ line
IIIB-IIIB‧‧‧線 Line IIIB-IIIB‧‧
IVB-IVB‧‧‧線 IVB-IVB‧‧‧ line
IXB-IXB‧‧‧線 IXB-IXB‧‧‧ line
N1‧‧‧位置(第1位置) N1‧‧‧ position (1st position)
N2‧‧‧位置(第2位置) N2‧‧‧ position (2nd position)
N3‧‧‧位置 N3‧‧‧ position
N4‧‧‧位置 N4‧‧‧ position
PP‧‧‧突起部 PP‧‧‧Protruding
PPv‧‧‧突起部 PPv‧‧‧Protruding
PS‧‧‧側部 PS‧‧‧ side
PSv‧‧‧側部 PSv‧‧‧ side
SC‧‧‧圓錐面 SC‧‧‧Conical surface
SD1‧‧‧頂面(第1面) SD1‧‧‧ top surface (1st side)
SD2‧‧‧側面(第2面) SD2‧‧‧ side (2nd side)
SD3‧‧‧側面(第3面) SD3‧‧‧ side (3rd side)
SF1‧‧‧上表面(表面) SF1‧‧‧ upper surface (surface)
SF2‧‧‧下表面 SF2‧‧‧ lower surface
SL‧‧‧劃線 SL‧‧‧
S10~S60‧‧‧步驟 S10~S60‧‧‧Steps
TL‧‧‧溝槽線 TL‧‧‧ trench line
UL‧‧‧切口 UL‧‧‧ incision
VB-VB‧‧‧線 VB-VB‧‧‧ line
VIB-VIB‧‧‧線 VIB-VIB‧‧‧ line
XEt‧‧‧端部 XEt‧‧‧ end
XEs‧‧‧端部 XEs‧‧ End
XB-XB‧‧‧線 XB-XB‧‧‧ line
XIB-XIB‧‧‧線 XIB-XIB‧‧‧ line
XIIB-XIIB‧‧‧線 XIIB-XIIB‧‧‧ line
XIIIB-XIIIB‧‧‧線 XIIIB-XIIIB‧‧‧ line
XIVB-XIVB‧‧‧線 XIVB-XIVB‧‧‧ line
XIXB-XIXB‧‧‧線 XIXB-XIXB‧‧‧ line
XVB-XVB‧‧‧線 XVB-XVB‧‧‧ line
XVIB-XVIB‧‧‧線 XVIB-XVIB‧‧‧ line
XVIIB-XVIIB‧‧‧線 XVIIB-XVIIB‧‧‧ line
XVIIIB-XVIIIB‧‧‧線 XVIIIB-XVIIIB‧‧‧ line
XXB‧‧‧箭頭 XXB‧‧‧ arrow
XXXIIIB‧‧‧箭頭 XXXIIIB‧‧‧ arrow
圖1係顯示本發明實施形態1之脆性基板之分斷方法之概略俯視圖(A),與沿著其線IB-IB之概略剖面圖(B)。 Fig. 1 is a schematic plan view (A) showing a method of dividing a brittle substrate according to Embodiment 1 of the present invention, and a schematic cross-sectional view (B) along line IB-IB.
圖2係顯示本發明實施形態1之脆性基板之分斷方法之概略俯視圖(A),與沿著其線IIB-IIB之概略剖面圖(B)。 Fig. 2 is a schematic plan view (A) showing a breaking method of the brittle substrate according to the first embodiment of the present invention, and a schematic cross-sectional view (B) along the line IIB-IIB.
圖3係顯示本發明實施形態1之脆性基板之分斷方法之概略俯視圖(A),與沿著其線IIIB-IIIB之概略剖面圖(B)。 Fig. 3 is a schematic plan view (A) showing a method of dividing a brittle substrate according to the first embodiment of the present invention, and a schematic cross-sectional view (B) along the line IIIB-IIIB.
圖4係顯示本發明實施形態1之脆性基板之分斷方法之概略俯視圖(A),與沿著其線IVB-IVB之概略剖面圖(B)。 Fig. 4 is a schematic plan view (A) showing a breaking method of the brittle substrate according to the first embodiment of the present invention, and a schematic cross-sectional view (B) along the line IVB-IVB.
圖5係顯示本發明實施形態1之脆性基板之分斷方法之概略俯視圖(A),與沿著其線VB-VB之概略剖面圖(B)。 Fig. 5 is a schematic plan view (A) showing a breaking method of the brittle substrate according to the first embodiment of the present invention, and a schematic cross-sectional view (B) along the line VB-VB.
圖6係顯示本發明實施形態1之脆性基板之分斷方法之概略俯視圖(A),與沿著其線VIB-VIB之概略剖面圖(B)。 Fig. 6 is a schematic plan view (A) showing a method of dividing a brittle substrate according to the first embodiment of the present invention, and a schematic cross-sectional view (B) taken along line VIB-VIB.
圖7係概略性顯示於本發明實施形態1之脆性基板之分斷方法中形成之溝槽線之構成之剖面圖(A),及概略性顯示裂縫線之構成之剖面圖(B)。 Fig. 7 is a cross-sectional view (A) showing a configuration of a groove line formed in the breaking method of the brittle substrate according to the first embodiment of the present invention, and a cross-sectional view (B) schematically showing the configuration of the crack line.
圖8係概略性顯示本發明實施形態1之脆性基板之分斷方法之構成之流程圖。 Fig. 8 is a flow chart schematically showing the configuration of a breaking method of the brittle substrate according to the first embodiment of the present invention.
圖9係顯示比較例之脆性基板之分斷方法之俯視圖(A)、與沿著其線IXB-IXB之剖面圖(B)。 Fig. 9 is a plan view (A) showing a method of dividing a brittle substrate of a comparative example, and a cross-sectional view (B) along a line IXB-IXB thereof.
圖10係顯示比較例之脆性基板之分斷方法之俯視圖(A)、與沿著其線XB-XB之剖面圖(B)。 Fig. 10 is a plan view (A) showing a method of breaking a brittle substrate of a comparative example, and a cross-sectional view (B) along a line XB-XB thereof.
圖11係顯示本發明實施形態2之脆性基板之分斷方法之概略俯視圖(A),與沿著其線XIB-XIB之概略剖面圖(B)。 Fig. 11 is a schematic plan view (A) showing a method of dividing a brittle substrate according to a second embodiment of the present invention, and a schematic cross-sectional view (B) along the line XIB-XIB.
圖12係顯示本發明實施形態2之脆性基板之分斷方法之概略俯視圖(A),與沿著其線XIIB-XIIB之概略剖面圖(B)。 Fig. 12 is a schematic plan view (A) showing a method of dividing a brittle substrate according to a second embodiment of the present invention, and a schematic cross-sectional view (B) along the line XIIB-XIIB.
圖13係顯示本發明實施形態2之脆性基板之分斷方法之概略俯視圖(A),與沿著其線XIIIB-XIIIB之概略剖面圖(B)。 Fig. 13 is a schematic plan view (A) showing a method of dividing a brittle substrate according to a second embodiment of the present invention, and a schematic cross-sectional view (B) along the line XIIIB-XIIIB.
圖14係顯示本發明實施形態2之脆性基板之分斷方法之概略俯視圖(A),與沿著其線XIVB-XIVB之概略剖面圖(B)。 Fig. 14 is a schematic plan view (A) showing a method of dividing a brittle substrate according to a second embodiment of the present invention, and a schematic cross-sectional view (B) along the line XIVB-XIVB.
圖15係顯示本發明實施形態2之脆性基板之分斷方法之概略俯視圖(A),與沿著其線XVB-XVB之概略剖面圖(B)。 Fig. 15 is a schematic plan view (A) showing a method of dividing a brittle substrate according to a second embodiment of the present invention, and a schematic cross-sectional view (B) along the line XVB-XVB.
圖16係顯示比較例之脆性基板之分斷方法之俯視圖(A),與沿著其線XVIB-XVIB之剖面圖(B)。 Fig. 16 is a plan view (A) showing a method of breaking a brittle substrate of a comparative example, and a sectional view (B) along the line XVIB-XVIB.
圖17係顯示比較例之脆性基板之分斷方法之俯視圖(A),與沿著其線XVIIB-XVIIB之剖面圖(B)。 Fig. 17 is a plan view (A) showing a method of breaking a brittle substrate of a comparative example, and a sectional view (B) along the line XVIIB-XVIIB.
圖18係顯示本發明實施形態2之變化例之脆性基板之分斷方法的概略俯視圖(A),與沿著其線XVIIIB-XVIIIB之概略剖面圖(B)。 Fig. 18 is a schematic plan view (A) showing a method of dividing a brittle substrate according to a modification of the second embodiment of the present invention, and a schematic cross-sectional view (B) along the line XVIIIB-XVIIIB.
圖19係顯示本發明實施形態2之變化例之脆性基板之分斷方法的概略俯視圖(A),與沿著其線XIXB-XIXB之概略剖面圖(B)。 Fig. 19 is a schematic plan view (A) showing a method of dividing a brittle substrate according to a modification of the second embodiment of the present invention, and a schematic cross-sectional view (B) along the line XIXB-XIXB.
圖20係概略性顯示使用於本發明實施形態3之脆性基板之分斷方法之器具之構成之側視圖(A),及於圖20(A)之箭頭XXB視點概略性顯示上述器具所具有之刀尖之構成之俯視圖(B)。 Fig. 20 is a side view (A) schematically showing the configuration of an apparatus used in the breaking method of the brittle substrate according to the third embodiment of the present invention, and schematically showing the apparatus having the arrow XXB in Fig. 20(A). Top view of the configuration of the tip (B).
圖21(A)、(B)係概略性顯示本發明實施形態3之脆性基板之分斷方法之俯視圖。 21(A) and 21(B) are plan views schematically showing a method of dividing a brittle substrate according to a third embodiment of the present invention.
圖22(A)、(B)係概略性顯示本發明實施形態3之第1變化例之脆性 基板之分斷方法之俯視圖。 22(A) and 22(B) are diagrams schematically showing the brittleness of the first modification of the third embodiment of the present invention. A top view of the method of breaking the substrate.
圖23係概略性顯示本發明實施形態3之第2變化例之脆性基板之分斷方法之俯視圖。 Fig. 23 is a plan view schematically showing a method of dividing a brittle substrate according to a second modification of the third embodiment of the present invention.
圖24係概略性顯示本發明實施形態3之第3變化例之脆性基板之分斷方法之俯視圖。 Fig. 24 is a plan view schematically showing a method of dividing a brittle substrate according to a third modification of the third embodiment of the present invention.
圖25係概略性顯示本發明實施形態4之脆性基板之分斷方法之第1工序之俯視圖。 Fig. 25 is a plan view schematically showing a first step of the breaking method of the brittle substrate according to the fourth embodiment of the present invention.
圖26係概略性顯示本發明實施形態4之脆性基板之分斷方法之第2工序之俯視圖。 Fig. 26 is a plan view schematically showing a second step of the breaking method of the brittle substrate according to the fourth embodiment of the present invention.
圖27係概略性顯示本發明實施形態4之脆性基板之分斷方法之第3工序之俯視圖。 Fig. 27 is a plan view schematically showing a third step of the breaking method of the brittle substrate according to the fourth embodiment of the present invention.
圖28(A)、(B)係概略性顯示本發明實施形態4之第1變化例之脆性基板之分斷方法之俯視圖。 28 (A) and (B) are plan views schematically showing a method of dividing a brittle substrate according to a first modification of the fourth embodiment of the present invention.
圖29係概略性顯示本發明實施形態4之第2變化例之脆性基板之分斷方法之俯視圖。 FIG. 29 is a plan view schematically showing a method of dividing a brittle substrate according to a second modification of the fourth embodiment of the present invention.
圖30(A)、(B)係概略性顯示本發明實施形態5之脆性基板之分斷方法之俯視圖。 30(A) and (B) are plan views schematically showing a method of dividing a brittle substrate according to a fifth embodiment of the present invention.
圖31(A)、(B)係概略性顯示本發明實施形態6之脆性基板之分斷方法之俯視圖。 31(A) and (B) are plan views schematically showing a method of dividing a brittle substrate according to a sixth embodiment of the present invention.
圖32係概略性顯示本發明實施形態6之變化例之脆性基板之分斷方法之俯視圖。 Fig. 32 is a plan view schematically showing a method of dividing a brittle substrate according to a modification of the sixth embodiment of the present invention.
圖33係概略性顯示使用於本發明實施形態7之脆性基板之分斷方法之器具之構成之側視圖(A),及於圖33(A)之箭頭XXXIIIB視點概略性顯示上述器具所具有之刀尖之構成之俯視圖(B)。 Figure 33 is a side view (A) schematically showing the configuration of an apparatus used in the breaking method of the brittle substrate according to the seventh embodiment of the present invention, and schematically showing the above-mentioned apparatus in the viewpoint of the arrow XXXIIIB of Figure 33 (A). Top view of the configuration of the tip (B).
以下,基於圖式對本發明之實施形態進行說明。另,對以下圖 式中相同或相當之部分標註相同之參照編號而不重複其說明。 Hereinafter, embodiments of the present invention will be described based on the drawings. In addition, the following figure The same or corresponding portions in the formula are denoted by the same reference numerals and the description thereof is not repeated.
對本實施形態之脆性基板之分斷方法,於以下進行說明。 The method of breaking the brittle substrate of the present embodiment will be described below.
參照圖1(A)及(B),首先準備玻璃基板4(脆性基板)(圖4:步驟S10)。玻璃基板4具有上表面SF1(表面)、及與其相反之下表面SF2。玻璃基板4具有垂直於上表面SF1之厚度方向DT。又,準備具有刀尖51及刀柄52之切割器具50。刀尖51係藉由固定於作為其支架之刀柄52而被保持。 Referring to Fig. 1 (A) and (B), first, a glass substrate 4 (brittle substrate) is prepared (Fig. 4: step S10). The glass substrate 4 has an upper surface SF1 (surface) and a surface SF2 opposite thereto. The glass substrate 4 has a thickness direction DT perpendicular to the upper surface SF1. Further, a cutting instrument 50 having a blade edge 51 and a shank 52 is prepared. The blade tip 51 is held by being fixed to the shank 52 as its holder.
接著,將刀尖51按壓於玻璃基板4之上表面SF1(圖8:步驟S20)。接著,使被按壓之刀尖51於玻璃基板4之上表面SF1上滑動(參照圖1(A)中之箭頭)。 Next, the blade edge 51 is pressed against the upper surface SF1 of the glass substrate 4 (FIG. 8: Step S20). Next, the pressed blade tip 51 is slid on the upper surface SF1 of the glass substrate 4 (see an arrow in FIG. 1(A)).
參照圖2(A)及(B),藉由刀尖51之上述滑動,於玻璃基板4之上表面SF1上產生塑性變形。藉此於上表面SF1上,形成具有溝槽形狀之溝槽線TL(圖8:步驟S30)。參照圖7(A),形成溝槽線TL之工序係可如下進行:獲得於溝槽線TL之正下方、玻璃基板4與溝槽線TL之延伸方向(圖2(A)之橫方向)交叉之方向DC上連續相連之狀態即無裂縫狀態。於無裂縫狀態下,雖藉由塑性變形形成溝槽線TL,但未形成沿著其之裂縫。因此,即使如先前之斷裂工序般對玻璃基板4單純地施加產生彎曲力矩等之外力,亦不會輕易地產生沿著溝槽線TL之分斷。因此,於無裂縫線之狀態下不進行沿著溝槽線TL之分斷工序。為了獲得無裂縫狀態,施加於刀尖51之載荷設為小至不產生裂縫之程度,且大至產生塑性變形之程度。 Referring to Figs. 2(A) and (B), plastic deformation occurs on the upper surface SF1 of the glass substrate 4 by the above-described sliding of the blade edge 51. Thereby, a groove line TL having a groove shape is formed on the upper surface SF1 (FIG. 8: step S30). Referring to FIG. 7(A), the process of forming the trench line TL may be performed by directly extending the glass substrate 4 and the trench line TL directly under the trench line TL (the horizontal direction of FIG. 2(A)). The state in which the cross direction is continuously connected to the DC is a crack-free state. In the crack-free state, although the groove line TL is formed by plastic deformation, a crack along it is not formed. Therefore, even if a force such as a bending moment is simply applied to the glass substrate 4 as in the previous breaking step, the breaking along the groove line TL is not easily caused. Therefore, the breaking process along the groove line TL is not performed in the state without the crack line. In order to obtain a crack-free state, the load applied to the cutting edge 51 is set to such an extent that cracks are not generated and are large to the extent of plastic deformation.
無裂縫狀態必須維持一段必要之時間。要維持無裂縫狀態,只要避免於溝槽線TL中如對玻璃基板4施加過度應力之操作,例如施加會於基板產生破損之較大之外部應力或伴隨著較大的溫度變化之加熱即可。 The crack-free state must be maintained for a necessary period of time. To maintain the crack-free state, it is only necessary to avoid the operation of applying excessive stress to the glass substrate 4 in the trench line TL, for example, applying a large external stress which may cause damage to the substrate or heating with a large temperature change. .
參照圖3(A)及(B),維持無裂縫狀態,並於玻璃基板4之表面SF1上形成膜21(圖8:步驟S40)。膜21之形成係以至少部分覆蓋溝槽線TL之方式進行。膜21係可由無機材料製成,尤其亦可由金屬製成。 Referring to FIGS. 3(A) and (B), the crack-free state is maintained, and the film 21 is formed on the surface SF1 of the glass substrate 4 (FIG. 8: Step S40). The formation of the film 21 is performed in such a manner as to at least partially cover the groove line TL. The film 21 can be made of an inorganic material, in particular also of metal.
參照圖4(A)及(B),維持無裂縫狀態,進而加工玻璃基板4。例如,於膜21上設置構件11。構件11亦可與溝槽線TL隔開。構件11具有隔著溝槽線TL之部分。又,亦可於下表面SF2上設置構件(未圖示)。設置構件之工序例如可藉由接合預先準備之構件、或沉積原料而進行。 Referring to FIGS. 4(A) and (B), the glass substrate 4 is processed by maintaining the crack-free state. For example, the member 11 is provided on the film 21. The member 11 can also be spaced apart from the groove line TL. The member 11 has a portion that is separated by a groove line TL. Further, a member (not shown) may be provided on the lower surface SF2. The step of providing the member can be performed, for example, by joining a member prepared in advance or depositing a raw material.
進而參照圖5(A)及(B),如上述般形成膜21後,使玻璃基板4之裂縫沿著溝槽線TL於厚度方向DT上伸展。藉此,相對於溝槽線TL而自行對準地形成裂縫線CL(圖8:步驟S50)。參照圖7(B),藉由裂縫線CL,於溝槽線TL正下方,玻璃基板4之於與溝槽線TL的延伸方向(圖5(A)之橫向)交叉之方向DC上之連續相連斷開。此處,所謂「連續相連」,換言之,即未被裂縫切斷之相連。另,於如上述般連續相連斷開之狀態下,玻璃基板4之一部分彼此亦可介隔裂縫線CL之裂縫而接觸。 5 (A) and (B), after the film 21 is formed as described above, the crack of the glass substrate 4 is stretched in the thickness direction DT along the groove line TL. Thereby, the crack line CL is formed in self-alignment with respect to the groove line TL (FIG. 8: Step S50). Referring to FIG. 7(B), the crack line CL is continuous under the groove line TL, and the glass substrate 4 is continuous in the direction DC which intersects with the extending direction of the groove line TL (the lateral direction of FIG. 5(A)). Connected disconnected. Here, the term "continuously connected", in other words, is not connected by a crack. Further, in a state of being continuously connected and disconnected as described above, one portion of the glass substrate 4 may be in contact with each other via a crack of the crack line CL.
裂縫線CL之形成係例如藉由於溝槽線TL之端部XEx或XEt(圖4(A)),對玻璃基板4施加如釋放溝槽線TL附近之內部應力應變般之應力而開始。應力之施加係例如再次將刀尖按壓於已形成之溝槽線TL上產生外部應力而施加,或藉由雷射光之照射等加熱而進行。 The formation of the crack line CL is started by, for example, applying an internal stress-strain-like stress in the vicinity of the groove line TL to the glass substrate 4 by the end portion XEx or XEt (Fig. 4(A)) of the groove line TL. The application of the stress is performed, for example, by pressing the blade tip against the formed groove line TL to generate external stress, or by heating by irradiation of laser light or the like.
進而參照圖6(A)及(B),接著,沿著裂縫線CL將玻璃基板4分斷為基板片4a及4b(圖8:步驟S60)。即,進行所謂之斷裂工序。斷裂工序例如可藉由對玻璃基板4施加外力FB(圖5(B))而進行。藉由分斷玻璃基板4時而施加於膜21之張力,膜21與玻璃基板4一起分斷為部分21a及21b。藉此,獲得設置有膜21之部分21a之基板片4a、與設置有膜21之部分21b之基板片4b。 6(A) and (B), the glass substrate 4 is divided into the substrate sheets 4a and 4b along the crack line CL (FIG. 8: Step S60). That is, a so-called breaking process is performed. The breaking step can be performed, for example, by applying an external force FB to the glass substrate 4 (Fig. 5(B)). The film 21 is separated into the portions 21a and 21b together with the glass substrate 4 by the tension applied to the film 21 when the glass substrate 4 is divided. Thereby, the substrate piece 4a provided with the portion 21a of the film 21 and the substrate piece 4b provided with the portion 21b of the film 21 are obtained.
接著,就比較例之玻璃基板4之分斷方法,於以下進行說明。於本比較例中,進行一般之劃線工序及斷裂工序。 Next, the method of dividing the glass substrate 4 of the comparative example will be described below. In the present comparative example, a general scribing step and a breaking step were performed.
參照圖9(A)及(B),於本比較例中不形成溝槽線TL,而於玻璃基板4上設置膜21及構件11。接著,將刀尖51按壓於玻璃基板4之上表面SF1。接著,使被按壓之刀尖51於設置有膜21之上表面SF1上滑動(參照圖9(A)中之箭頭)。 Referring to FIGS. 9(A) and (B), in the comparative example, the groove line TL is not formed, and the film 21 and the member 11 are provided on the glass substrate 4. Next, the blade edge 51 is pressed against the upper surface SF1 of the glass substrate 4. Next, the pressed blade edge 51 is slid over the upper surface SF1 on which the film 21 is provided (refer to the arrow in FIG. 9(A)).
參照圖10(A)及(B),藉由刀尖51之上述滑動,將膜21分斷為部分21a及21b。又與此同時,於玻璃基板4之上表面SF1上,形成具有裂縫之劃線SL。接著,藉由斷裂工序沿著劃線SL分斷玻璃基板4。 Referring to Figs. 10(A) and (B), the film 21 is divided into portions 21a and 21b by the above sliding of the blade edge 51. At the same time, a scribe line SL having a crack is formed on the upper surface SF1 of the glass substrate 4. Next, the glass substrate 4 is separated along the scribe line SL by a breaking process.
於比較例中,玻璃基板4之上表面SF1與膜21一起被劃線。於此種情形時,作為分斷玻璃基板4之直接契機所使用之劃線SL之形成容易變得不穩定。結果,玻璃基板4之分斷亦容易變得不穩定。又,膜21之切斷面品質容易降低。 In the comparative example, the upper surface SF1 of the glass substrate 4 is scribed together with the film 21. In such a case, the formation of the scribe line SL used as a direct trigger for breaking the glass substrate 4 tends to be unstable. As a result, the breaking of the glass substrate 4 is also liable to become unstable. Moreover, the quality of the cut surface of the film 21 is liable to lower.
相對於此根據本實施形態,作為規定分斷玻璃基板4之位置之線,形成其正下方不具有裂縫之溝槽線TL。作為分斷之直接契機而使用之裂縫線CL係於形成溝槽線TL後而形成。藉此,形成溝槽線TL後且形成裂縫線CL前之玻璃基板4不但藉由溝槽線TL規定分斷玻璃基板4之位置,且因尚未形成裂縫線CL,故處於不會輕易產生分斷之狀態。於該狀態下,於溝槽線TL、即規定分斷玻璃基板4之位置之線上形成膜21。其後,作為分斷之直接契機而使用之裂縫線CL藉由沿著溝槽線TL自行對準地使裂縫伸展而形成。藉此,可幾乎不受膜21存在之影響而穩定地形成裂縫線CL。因此,可穩定地分斷玻璃基板4。 On the other hand, according to the present embodiment, as a line defining the position at which the glass substrate 4 is cut, a groove line TL having no crack directly below is formed. The crack line CL used as a direct trigger for the breaking is formed after the groove line TL is formed. Thereby, the glass substrate 4 before the formation of the trench line TL and before the formation of the crack line CL not only defines the position of the glass substrate 4 by the groove line TL, but also does not easily form a crack because the crack line CL has not been formed. The state of the break. In this state, the film 21 is formed on the groove line TL, that is, the line defining the position at which the glass substrate 4 is separated. Thereafter, the crack line CL used as a direct trigger of the breaking is formed by self-aligning the crack along the groove line TL. Thereby, the crack line CL can be stably formed without being affected by the presence of the film 21. Therefore, the glass substrate 4 can be stably separated.
本實施形態之裂縫線CL之形成工序本質上與所謂之斷裂工序不同。斷裂工序係使已形成之裂縫於厚度方向進一步地伸展而完全地分離基板者。另一方面,裂縫線CL之形成工序係自藉由形成溝槽線TL而獲得之無裂縫狀態向有裂縫之狀態變化者。該變化認為是藉由開放 無裂縫狀態所具有之內部應力而產生。形成溝槽線TL時之塑性變形、及藉由形成溝槽線TL而產生之內部應力之大小或方向性等狀態,在使用旋轉刀之滾動、與如本實施形態般使用刀尖滑動兩者之情形下不同。於使用刀尖滑動之情形時,於較寬之劃線條件下容易產生裂縫。又,開放內部應力需要若干契機,考慮將藉由如上述般利用來自外部之應力施加而產生溝槽線TL上之裂縫作為此種契機而作用。溝槽線TL及裂縫線CL之較佳形成方法之詳情於以下之實施形態3~7中進行說明。 The step of forming the crack line CL of the present embodiment is substantially different from the so-called breaking step. The breaking process is such that the formed crack is further extended in the thickness direction to completely separate the substrate. On the other hand, the step of forming the crack line CL is changed from the crack-free state obtained by forming the groove line TL to the state in which the crack is present. The change is considered to be open Produced by the internal stress of the crack-free state. The plastic deformation at the time of forming the groove line TL and the magnitude or directivity of the internal stress generated by forming the groove line TL are both rolling using a rotary blade and using a blade tip sliding as in the present embodiment. The situation is different. When the blade tip is used for sliding, cracks are likely to occur under a wide scribing condition. Further, opening the internal stress requires a number of opportunities, and it is considered that the crack on the groove line TL is generated by the application of stress from the outside as described above. Details of a preferred method of forming the groove line TL and the crack line CL will be described in the following embodiments 3 to 7.
又,根據本實施形態,於分斷玻璃基板4時,膜21與玻璃基板4一起被分斷。藉此,可隨附玻璃基板4之分斷使膜21分斷。因此,不需要使用切割器具切斷膜21。因此,可避免因膜21之切斷產生切屑。又,與刀尖51同時地劃線膜21與玻璃之情形相比,可抑制刀尖51之磨耗。 Further, according to the present embodiment, when the glass substrate 4 is separated, the film 21 is separated together with the glass substrate 4. Thereby, the film 21 can be separated by the breaking of the glass substrate 4. Therefore, it is not necessary to cut the film 21 using a cutting instrument. Therefore, it is possible to avoid the generation of chips due to the cutting of the film 21. Moreover, the wear of the blade edge 51 can be suppressed compared with the case where the scribe film 21 and the glass are simultaneously with the blade edge 51.
於由無機材料製成膜21之情形時,不將如合成樹脂般難以分斷之材料使用於膜21。藉此,可進而確實地產生隨附玻璃基板4之分斷之膜21之分斷。又,可避免產生無機材料之切屑。又,可避免刀尖51劃線無機材料時產生之磨耗。尤其於由金屬製成膜21之情形時,不將如合成樹脂般難以分斷之材料使用於膜21。藉此,可進而確實地產生隨附玻璃基板4之分斷之膜21之分斷。又,可避免產生金屬之切屑。又,可避免刀尖51劃線金屬時產生之磨耗。 In the case where the film 21 is made of an inorganic material, a material which is difficult to break as a synthetic resin is not used for the film 21. Thereby, the breaking of the film 21 accompanying the division of the glass substrate 4 can be surely produced. Moreover, the generation of chips of inorganic materials can be avoided. Moreover, abrasion caused when the blade tip 51 is scribed with the inorganic material can be avoided. In particular, in the case where the film 21 is made of a metal, a material which is difficult to break as a synthetic resin is not used for the film 21. Thereby, the breaking of the film 21 accompanying the division of the glass substrate 4 can be surely produced. Also, metal chips can be avoided. Moreover, wear caused when the blade tip 51 is scribed to the metal can be avoided.
於本實施形態之脆性基板之分斷方法中,首先進行與實施形態l相同之工序直至圖2(A)及(B)之工序。 In the breaking method of the brittle substrate of the present embodiment, first, the same steps as in the first embodiment are carried out until the steps of FIGS. 2(A) and (B).
參照圖11(A)及(B),接著,維持上述之無裂縫狀態,並於玻璃基板4之表面SF1上形成膜22(圖8:步驟S40)。膜22之形成係以至少部分覆蓋溝槽線TL之方式進行。膜22係可由合成樹脂製成。 Referring to FIGS. 11(A) and (B), the film-free state is maintained on the surface SF1 of the glass substrate 4 (FIG. 8: Step S40). The formation of the film 22 is performed in such a manner as to at least partially cover the trench line TL. The film 22 can be made of synthetic resin.
參照圖12(A)及(B),接著,準備具有刀尖51p及刀柄52p之切割器具50p。刀尖51p係藉由固定於作為其支架之刀柄52p而保持。切割器具50p係設為與切割器具50相比更適合於膜22之加工者。 Referring to Fig. 12 (A) and (B), next, a cutting instrument 50p having a blade edge 51p and a shank 52p is prepared. The blade tip 51p is held by being fixed to the shank 52p as its holder. The cutting tool 50p is preferably a processor that is more suitable for the film 22 than the cutting tool 50.
進而參照圖13(A)及(B),使用刀尖51p,沿著溝槽線TL(參照圖12(A)之箭頭)於膜22切入切口HL。切口HL係藉由於膜22之厚度方向DT上完全切斷膜22而形成。換言之,切口HL係於厚度方向DT上貫穿膜22。藉由切入切口HL膜22分斷為部分22a及22b。 Further, referring to FIGS. 13(A) and (B), the slit HL is cut into the film 22 along the groove line TL (see the arrow of FIG. 12(A)) using the blade edge 51p. The slit HL is formed by completely cutting the film 22 in the thickness direction DT of the film 22. In other words, the slit HL penetrates the film 22 in the thickness direction DT. The portions 22a and 22b are separated by cutting into the slit HL film 22.
參照圖14(A)及(B),接著,藉由與實施形態1(圖5(A)及(B))相同之方法形成裂縫線CL。 Referring to Fig. 14 (A) and (B), the crack line CL is formed by the same method as in the first embodiment (Figs. 5 (A) and (B)).
進而參照圖15(A)及(B),接著,沿著裂縫線CL將玻璃基板4分斷為基板片4a及4b(圖8:步驟S60)。即,進行所謂斷裂工序。斷裂工序係與實施形態1(圖5(B))相同,可藉由對玻璃基板4施加外力FB而進行。藉由分斷玻璃基板4,獲得設置有膜22之部分22a之基板片4a、與設置於膜22之部分22b之基板片4b。 15 (A) and (B), the glass substrate 4 is divided into the substrate sheets 4a and 4b along the crack line CL (FIG. 8: Step S60). That is, a so-called breaking process is performed. The breaking step is the same as in the first embodiment (Fig. 5(B)), and can be performed by applying an external force FB to the glass substrate 4. By dividing the glass substrate 4, the substrate piece 4a provided with the portion 22a of the film 22 and the substrate piece 4b provided to the portion 22b of the film 22 are obtained.
接著對比較例之玻璃基板4之分斷方法,於以下進行說明。於本比較例中,進行一般之劃線工序及斷裂工序。 Next, the method of dividing the glass substrate 4 of the comparative example will be described below. In the present comparative example, a general scribing step and a breaking step were performed.
參照圖16(A)及(B),於本比較例中不形成溝槽線TL,而於玻璃基板4上設置膜22。接著,將刀尖51按壓於玻璃基板4之上表面SF1。接著,使被按壓之刀尖51於設置有膜22之上表面SF1上滑動(參照圖16(A)中之箭頭)。 Referring to FIGS. 16(A) and 16(B), in the comparative example, the trench line TL is not formed, and the film 22 is provided on the glass substrate 4. Next, the blade edge 51 is pressed against the upper surface SF1 of the glass substrate 4. Next, the pressed blade edge 51 is slid over the upper surface SF1 on which the film 22 is provided (refer to the arrow in FIG. 16(A)).
參照圖17(A)及(B),藉由刀尖51之上述滑動,將膜22分斷為部分22a及22b。又與此同時,於玻璃基板4之上表面SF1上,形成具有裂縫之劃線SL。接著,藉由斷裂工序沿著劃線SL分斷基板4。 Referring to Figs. 17(A) and (B), the film 22 is divided into portions 22a and 22b by the above sliding of the blade edge 51. At the same time, a scribe line SL having a crack is formed on the upper surface SF1 of the glass substrate 4. Next, the substrate 4 is separated along the scribe line SL by a breaking process.
於本比較例中,玻璃基板4之上表面SF1與膜22一起被劃線。於此種情形時,作為分斷玻璃基板4之直接契機所使用之劃線SL之形成容易變得不穩定。結果,玻璃基板4之分斷亦容易變得不穩定。 In the present comparative example, the upper surface SF1 of the glass substrate 4 is scribed together with the film 22. In such a case, the formation of the scribe line SL used as a direct trigger for breaking the glass substrate 4 tends to be unstable. As a result, the breaking of the glass substrate 4 is also liable to become unstable.
尤其於由合成樹脂製成膜22之情形時,必須同時進行切斷膜22與於玻璃基板4形成劃線SL。然而,於膜22之切斷與劃線SL之形成中,通常,最佳之刀尖51及其使用條件有相當大的差異。因此,難以將刀尖51及其使用條件最佳化,結果,劃線SL之形成尤其容易變得不穩定。 In particular, in the case where the film 22 is made of a synthetic resin, it is necessary to simultaneously form the cut film 22 and form the scribe line SL on the glass substrate 4. However, in the formation of the cut of the film 22 and the formation of the scribe line SL, generally, the optimum tool tip 51 and its use conditions are considerably different. Therefore, it is difficult to optimize the blade edge 51 and its use conditions, and as a result, the formation of the scribe line SL is particularly likely to become unstable.
相對於此,根據本實施形態,與實施形態1相同,可幾乎不受膜22存在之影響而穩定地形成裂縫線CL。因此,可穩定地分斷玻璃基板4。 On the other hand, according to the present embodiment, as in the first embodiment, the crack line CL can be stably formed without being affected by the presence of the film 22. Therefore, the glass substrate 4 can be stably separated.
又,於形成裂縫線CL前,沿著溝槽線TL於膜22切入切口。藉此,確實地分斷膜22。於膜22切入切口之工序係藉由於膜22之厚度方向DT上完全地切斷膜22而進行。藉此,進而更確實地分斷膜22。 Further, before the crack line CL is formed, the slit is cut into the film 22 along the groove line TL. Thereby, the film 22 is surely divided. The step of cutting the slit into the film 22 is performed by completely cutting the film 22 in the thickness direction DT of the film 22. Thereby, the film 22 is further divided more reliably.
尤其於由合成樹脂製成膜22之情形時,由於膜22之韌性較高,難以獲得如實施形態1之僅依存於張力施加之分斷。即使於此種情形,亦可藉由利用切口而分斷膜22。又,合成樹脂之膜22難以產生切屑。又,合成樹脂之膜22使刀尖51p不易磨耗。 In particular, in the case where the film 22 is made of a synthetic resin, since the toughness of the film 22 is high, it is difficult to obtain the breaking depending on the tension application as in the first embodiment. Even in this case, the film 22 can be separated by using the slit. Further, the film 22 of the synthetic resin is less likely to generate chips. Further, the synthetic resin film 22 makes the blade edge 51p less likely to be worn.
另,可代替特別適合膜22之切割器具50p(圖12(B)),而使用切割器具50(圖1(B)),於該情形時,可於2個工序中使用共通之切割器具。 Further, instead of the cutting tool 50p (Fig. 12(B)) which is particularly suitable for the film 22, the cutting tool 50 (Fig. 1(B)) can be used, and in this case, a common cutting tool can be used in two processes.
接著,對本實施形態之第1變化例進行說明。於上述之圖13(A)及(B)中於厚度方向DT上完全地切斷膜22,但於本變化例中,如圖18(A)及(B)所示,於膜22之厚度方向DT上部分地切斷膜22。換言之,於厚度方向DT上進行不完全之切斷。藉此,於膜22切入不貫穿膜22之切口UL。 Next, a first modification of the embodiment will be described. The film 22 is completely cut in the thickness direction DT in the above-described FIGS. 13(A) and (B), but in the present modification, as shown in FIGS. 18(A) and (B), the thickness of the film 22 is shown. The film 22 is partially cut in the direction DT. In other words, incomplete cutting is performed in the thickness direction DT. Thereby, the slit 22 which does not penetrate the film 22 is cut into the film 22.
參照圖19(A)及(B),接著形成裂縫線CL。膜22於該時點未被完全分斷。藉由分斷玻璃基板4時施加於膜22之張力將上述不完全之切口變為於厚度方向DT上完全之切口,而產生膜22之完全分斷。根據本變化例,避免於膜22之切斷時損傷玻璃基板4。 Referring to Figs. 19(A) and (B), a crack line CL is formed next. The film 22 is not completely broken at this point in time. The incomplete slit is changed to a complete slit in the thickness direction DT by the tension applied to the film 22 when the glass substrate 4 is divided, and the film 22 is completely broken. According to the present modification, the glass substrate 4 is prevented from being damaged when the film 22 is cut.
接著,對本實施形態之第2變化例進行說明。於本變化例中,沿著溝槽線TL部分地切斷膜22。換言之,沿著溝槽線TL,於膜22之一部分形成未形成切口之部分。該切口可沿著溝槽線TL斷續地形成於整體、或1個部位。切口係可為於厚度方向完全者,亦可為不完全者。藉此,於沿著膜22之溝槽線TL之一部分切入切口HL(參照圖13)或切口UL(參照圖18)。 Next, a second modification of the embodiment will be described. In the present variation, the film 22 is partially cut along the groove line TL. In other words, along the groove line TL, a portion where the slit is not formed is formed in one portion of the film 22. The slit may be intermittently formed along the groove line TL in the entirety or at one location. The incision system may be either in the thickness direction or incomplete. Thereby, the slit HL (refer to FIG. 13) or the slit UL (refer to FIG. 18) is cut along a portion of the groove line TL of the film 22.
接著,形成裂縫線CL。膜22於該時點未被完全分斷。膜22之完全分斷係藉由分斷玻璃基板4時施加於膜22之張力,將上述不完全之切口變為沿著溝槽線TL連續擴展者而產生。根據膜之種類,有於特定方向容易裂開者,根據本變化例,可藉由分斷時膜22以切口為起點裂開而容易地切斷膜22,且可減小損傷玻璃基板4之虞。 Next, a crack line CL is formed. The film 22 is not completely broken at this point in time. The complete division of the film 22 is caused by the tension applied to the film 22 when the glass substrate 4 is broken, and the incomplete slit is continuously expanded along the groove line TL. According to the type of the film, if the film is easily cracked in a specific direction, according to the present modification, the film 22 can be easily cut by breaking the film 22 at the time of breaking, and the glass substrate 4 can be damaged. Hey.
首先,對使用於本實施形態之脆性基板之分斷方法之刀尖,於以下進行說明。 First, the tip of the cutting method used in the brittle substrate of the present embodiment will be described below.
參照圖20(A)及(B),於刀尖51設置有頂面SD1(第1面)、與包圍頂面SD1之複數個面。該等複數個面包含側面SD2(第2面)及側面SD3(第3面)。頂面SD1、側面SD2及SD3(第1~第3面)朝向互不相同之方向,且彼此相鄰。刀尖51具有頂面SD1、側面SD2及SD3所會合之頂點,並藉由該頂點構成刀尖51之突起部PP。又,側面SD2及SD3呈構成刀尖51之側部PS之稜線。側部PS自突起部PP線狀地延伸。又,由於側部PS係如上述般為稜線,故具有線狀延伸之凸形狀。 Referring to FIGS. 20(A) and (B), the cutting edge 51 is provided with a top surface SD1 (first surface) and a plurality of surfaces surrounding the top surface SD1. The plurality of faces include a side surface SD2 (second surface) and a side surface SD3 (third surface). The top surface SD1, the side surfaces SD2, and the SD3 (the first to third surfaces) are oriented in mutually different directions and adjacent to each other. The blade tip 51 has a vertex at which the top surface SD1, the side surfaces SD2, and SD3 meet, and the apex constitutes the protrusion PP of the blade edge 51. Further, the side faces SD2 and SD3 are ridge lines constituting the side portions PS of the blade edge 51. The side portion PS extends linearly from the protrusion portion PP. Further, since the side portion PS is a ridge line as described above, it has a convex shape extending linearly.
刀尖51較好為金剛石刀頭。即,自可縮小硬度及表面粗糙度之點而言,刀尖51較好為由金剛石製成。更佳為由單晶金剛石製作刀尖51。進而更佳為自結晶學而言,頂面SD1係{001}面,側面SD2及SD3各自係{111}面。於該情形時,側面SD2及側面SD3雖具有不同朝向,但於結晶學上係相互等價之結晶面。 The tip 51 is preferably a diamond cutter head. That is, the tip 51 is preferably made of diamond in terms of the point where the hardness and the surface roughness can be reduced. More preferably, the tip 51 is made of single crystal diamond. More preferably, in terms of crystallography, the top surface SD1 is a {001} plane, and the side surfaces SD2 and SD3 are each a {111} plane. In this case, although the side surface SD2 and the side surface SD3 have different orientations, they are crystallographically equivalent to each other.
另,可使用非單晶之金剛石,例如,使用以CVD(Chemical Vapor Deposition:化學氣相沈積)法合成之多晶體金剛石。或亦可使用自微粒石墨或非石墨狀碳將不包含鐵族元素等之結合材燒結出之多晶體金剛石粒子藉由鐵族元素等結合材予以結合燒結之金剛石。 Further, a non-single crystal diamond may be used, for example, a polycrystalline diamond synthesized by a CVD (Chemical Vapor Deposition) method. Alternatively, the polycrystalline diamond particles obtained by sintering the binder containing no iron group element or the like from the particulate graphite or the non-graphite carbon may be used to bond the sintered diamond by a bonding material such as an iron group element.
刀柄52係沿著軸方向AX延伸。刀尖51係較好為以頂面SD1之法線方向大致沿著軸方向AX之方式安裝於刀柄52。 The shank 52 extends along the axial direction AX. The blade edge 51 is preferably attached to the shank 52 so as to be substantially along the axial direction AX in the normal direction of the top surface SD1.
為了使用切割器具50形成溝槽線TL(圖7(A)),於玻璃基板4之上表面SF1,將刀尖51之突起部PP及側部PS對玻璃基板4所具有之厚度方向DT按壓。接著,大致沿著將側部PS投影於上表面SF1之方向,使刀尖51於上表面SF1上滑動。藉此,於上表面SF1上,形成不具備垂直裂縫之槽狀溝槽線TL。溝槽線TL係藉由玻璃基板4之塑性變形而產生,但此時亦可略微切削玻璃基板4。然而,由於此種切削可能產生細微之碎片,故較好為儘可能地少。 In order to form the groove line TL (FIG. 7(A)) using the cutting tool 50, the protrusion PP and the side portion PS of the blade edge 51 are pressed against the thickness direction DT of the glass substrate 4 on the upper surface SF1 of the glass substrate 4. . Next, the blade edge 51 is slid on the upper surface SF1 substantially along the direction in which the side portion PS is projected on the upper surface SF1. Thereby, a groove-like groove line TL having no vertical crack is formed on the upper surface SF1. The groove line TL is generated by plastic deformation of the glass substrate 4, but the glass substrate 4 may be slightly cut at this time. However, since such cutting may produce fine fragments, it is preferably as small as possible.
有藉由刀尖51之滑動而同時地形成溝槽線TL及裂縫線CL(圖7(B))之情形,與僅形成溝槽線TL之情形。裂縫線CL係自溝槽線TL之凹陷向厚度方向DT伸展之裂縫,於上表面SF1上呈線狀延伸。根據後述之方法,可於僅形成溝槽線TL後,沿著其形成裂縫線CL。 There are cases where the groove line TL and the crack line CL (Fig. 7(B)) are simultaneously formed by the sliding of the blade edge 51, and the case where only the groove line TL is formed. The crack line CL is a slit extending from the depression of the groove line TL in the thickness direction DT, and extends linearly on the upper surface SF1. According to the method described later, the crack line CL can be formed along the groove line TL.
接著,就玻璃基板4之分斷方法,於以下進行說明。 Next, the method of dividing the glass substrate 4 will be described below.
參照圖21(A),於步驟S10(圖8),首先準備玻璃基板4。玻璃基板4具有平坦之上表面SF1。包圍上表面SF1之邊緣包含互相對向之邊ED1(第1邊)及邊ED2(第2邊)。於圖21(A)所示之例中,邊緣係長方形狀。因此,邊ED1及ED2係互相平行之邊。又,於圖21(A)所示之例中,邊ED1及ED2係長方形之短邊。又,玻璃基板4具有垂直於上表面SF1之厚度方向DT(圖20(A))。 Referring to Fig. 21(A), in step S10 (Fig. 8), the glass substrate 4 is first prepared. The glass substrate 4 has a flat upper surface SF1. The edge surrounding the upper surface SF1 includes sides ED1 (first side) and side ED2 (second side) facing each other. In the example shown in Fig. 21(A), the edges are rectangular. Therefore, the sides ED1 and ED2 are parallel to each other. Further, in the example shown in Fig. 21(A), the sides ED1 and ED2 are the short sides of the rectangle. Further, the glass substrate 4 has a thickness direction DT perpendicular to the upper surface SF1 (Fig. 20(A)).
接著,於步驟S20(圖8),於上表面SF1將刀尖51按壓於位置N1。位置N1之詳情如後述。刀尖51之按壓係參照圖20(A),以於玻璃基板4 之上表面SF1上將刀尖51之突起部PP配置於邊ED1及側部PS之間,且將刀尖51之側部PS配置於突起部PP與邊ED2之間之方式進行。 Next, in step S20 (FIG. 8), the blade edge 51 is pressed to the position N1 on the upper surface SF1. Details of the position N1 will be described later. The pressing of the blade tip 51 is referred to FIG. 20(A) for the glass substrate 4 The protrusion PP of the blade edge 51 is disposed between the side ED1 and the side portion PS on the upper surface SF1, and the side portion PS of the blade edge 51 is disposed between the protrusion portion PP and the side ED2.
接著,於步驟S30(圖8),於上表面SF1上形成複數條溝槽線TL(圖中為5條線)。溝槽線TL之形成係於位置N1(第1位置)及位置N3之間進行。位置N2(第2位置)位於位置N1及N3之間。因此,於位置N1及N2之間、及於位置N2及N3之間形成溝槽線TL。 Next, in step S30 (FIG. 8), a plurality of groove lines TL (five lines in the drawing) are formed on the upper surface SF1. The formation of the groove line TL is performed between the position N1 (first position) and the position N3. The position N2 (the second position) is located between the positions N1 and N3. Therefore, the groove line TL is formed between the positions N1 and N2 and between the positions N2 and N3.
位置N1及N3係可如圖21(A)所示般位於與玻璃基板4之上表面SF1之邊緣有間距之位置,或,亦可為其中一者或兩者位於上表面SF1之邊緣。所要形成之溝槽線TL於前者之情形時與玻璃基板4之邊緣有距離,於後者之情形時與玻璃基板4之邊緣相接。 The positions N1 and N3 may be located at a distance from the edge of the upper surface SF1 of the glass substrate 4 as shown in Fig. 21(A), or one or both of them may be located at the edge of the upper surface SF1. The groove line TL to be formed has a distance from the edge of the glass substrate 4 in the former case and the edge of the glass substrate 4 in the latter case.
位置N1及N2中,位置N1較接近邊ED1;又,位置N1及N2中,位置N2較接近邊ED2。另,於圖21(A)所示之例中,位置N1於邊ED1及ED2中較接近邊ED1,位置N2於邊ED1及ED2中較接近邊ED2,但亦可為位置N1及N2兩者均位於接近邊ED1或ED2中任一者之位置。 In the positions N1 and N2, the position N1 is closer to the side ED1; and in the positions N1 and N2, the position N2 is closer to the side ED2. Further, in the example shown in FIG. 21(A), the position N1 is closer to the side ED1 in the sides ED1 and ED2, and the position N2 is closer to the side ED2 in the sides ED1 and ED2, but may be the positions N1 and N2. They are all located close to either of the sides ED1 or ED2.
於形成溝槽線TL時,於本實施形態中,使刀尖51自位置N1向位置N2變位,進而自位置N2向位置N3變位。即,參照圖20(A),使刀尖51於自邊ED1朝向邊ED2之方向、即方向DA變位。方向DA對應於將自刀尖51延伸之軸AX投影於上表面SF1上之方向。於該情形時,藉由刀柄52於上表面SF1上拖曳刀尖51。 In the case where the groove line TL is formed, in the present embodiment, the blade edge 51 is displaced from the position N1 to the position N2, and is displaced from the position N2 to the position N3. That is, referring to Fig. 20(A), the cutting edge 51 is displaced in the direction DA from the side ED1 toward the side ED2. The direction DA corresponds to a direction in which the axis AX extending from the blade edge 51 is projected on the upper surface SF1. In this case, the blade tip 51 is dragged on the upper surface SF1 by the shank 52.
接著,維持實施形態1中說明之無裂縫狀態(圖7(A))經過所期望之時間。於該期間,作為步驟S40(圖8),與實施形態1相同地形成膜21(圖3(A)及(B))、或與實施形態2相同地形成膜22(圖11(A)及(B))。於後者之情形時於上述之期間進而如實施形態2或其變化例說明般,沿著溝槽線TL(參照圖12(A)中之箭頭)於膜22切入切口(例如,參照圖13(B)中之切口HL)。 Next, the crack-free state (Fig. 7(A)) described in the first embodiment is maintained for a desired period of time. In the same period, as the step S40 (Fig. 8), the film 21 (Figs. 3(A) and (B)) is formed in the same manner as in the first embodiment, or the film 22 is formed in the same manner as in the second embodiment (Fig. 11(A) and (B)). In the latter case, in the above-described period, as described in the second embodiment or its modification, the slit is cut into the film 22 along the groove line TL (see the arrow in FIG. 12(A)) (for example, refer to FIG. 13 ( Incision HL) in B).
參照圖21(B),於步驟S50(圖8),形成溝槽線TL後,藉由使玻璃 基板4之裂縫沿著溝槽線TL自位置N2向位置N1(圖中,參照虛線箭頭)於厚度方向DT(圖7(B))上伸展,而形成裂縫線CL。裂縫線CL之形成係藉由輔助線AL及溝槽線TL於位置N2交叉而開始。基於該目的,於形成溝槽線TL後形成輔助線AL。輔助線AL係伴隨著厚度方向DT上之裂縫之一般劃線,且係釋放溝槽線TL附近之內部應力之應變者。輔助線AL之形成方法無特別限定,但可如圖21(B)所示,將上表面SF1之邊緣作為基點而形成。 Referring to FIG. 21(B), in step S50 (FIG. 8), after the trench line TL is formed, by making the glass The crack of the substrate 4 extends along the groove line TL from the position N2 to the position N1 (in the drawing, with reference to the dotted arrow) in the thickness direction DT (Fig. 7(B)) to form the crack line CL. The formation of the crack line CL is started by the intersection of the auxiliary line AL and the groove line TL at the position N2. For this purpose, the auxiliary line AL is formed after the groove line TL is formed. The auxiliary line AL is accompanied by a general scribe line of the crack in the thickness direction DT, and is a strainer that releases the internal stress near the groove line TL. The method of forming the auxiliary line AL is not particularly limited, but as shown in FIG. 21(B), the edge of the upper surface SF1 may be formed as a base point.
另,與自位置N2向位置N1之方向相比,自位置N2向位置N3之方向較難以形成裂縫線CL。即,裂縫線CL之伸展容易度存在方向依存性。因此,可能產生於位置N1及N2之間形成裂縫線CL而未於位置N2及N3之間形成之現象。本實施形態係以沿著位置N1及N2間分斷玻璃基板4為目的,而非以沿著位置N2及N3間分斷玻璃基板4為目的。因此,必須於位置N1及位置N2間形成裂縫線CL,另一方面,於位置N2及位置N3間裂縫線CL之形成難度則不成問題。 Further, it is more difficult to form the crack line CL from the position N2 to the position N3 than in the direction from the position N2 to the position N1. That is, the ease of stretching of the crack line CL has a direction dependency. Therefore, there is a possibility that a crack line CL is formed between the positions N1 and N2 and is not formed between the positions N2 and N3. In the present embodiment, the glass substrate 4 is separated between the positions N1 and N2, and the glass substrate 4 is not separated along the positions N2 and N3. Therefore, it is necessary to form the crack line CL between the position N1 and the position N2. On the other hand, the difficulty in forming the crack line CL between the position N2 and the position N3 is not a problem.
接著,於步驟S60(圖8),沿著裂縫線CL分斷玻璃基板4。具體而言進行斷裂步驟。另,若裂縫線CL於其形成時於厚度方向DT完全行進之情形時,可同時產生裂縫線CL之形成與玻璃基板4之分斷。於該情形時,可省略斷裂步驟。 Next, in step S60 (Fig. 8), the glass substrate 4 is separated along the crack line CL. Specifically, the breaking step is carried out. Further, when the crack line CL completely travels in the thickness direction DT when it is formed, the formation of the crack line CL and the breaking of the glass substrate 4 can be simultaneously generated. In this case, the breaking step can be omitted.
藉由以上進行玻璃基板4之分斷。 The division of the glass substrate 4 is performed by the above.
接著,對上述分斷方法之第1~第3變化例,於以下進行說明。 Next, the first to third modifications of the above-described breaking method will be described below.
參照圖22(A),第1變化例係關於以輔助線AL與溝槽線TL之交叉作為裂縫線CL(圖21(B))開始形成之契機不夠充分之情形者。參照圖22(B),藉由對玻璃基板4施加產生彎曲力矩等之外力,而沿著輔助線AL分離玻璃基板4。藉此開始形成裂縫線CL。 Referring to Fig. 22(A), the first variation is a case where the timing of the formation of the crack line CL (Fig. 21(B)) by the intersection of the auxiliary line AL and the groove line TL is insufficient. Referring to Fig. 22(B), the glass substrate 4 is separated along the auxiliary line AL by applying an external force such as a bending moment to the glass substrate 4. Thereby, the crack line CL is started to be formed.
另,於圖22(A)中,輔助線AL形成於玻璃基板4之上表面SF1上,但用以分離玻璃基板4之輔助線AL亦可形成於玻璃基板4之下表面SF2 上。於該情形時,輔助線AL與溝槽線TL係於俯視佈局上,於位置N2互相交叉,但未相互直接接觸。 In addition, in FIG. 22(A), the auxiliary line AL is formed on the upper surface SF1 of the glass substrate 4, but the auxiliary line AL for separating the glass substrate 4 may be formed on the lower surface SF2 of the glass substrate 4. on. In this case, the auxiliary line AL and the groove line TL are arranged in a plan view and intersect each other at the position N2, but are not in direct contact with each other.
又,於第1變化例中,藉由分離玻璃基板4而釋放溝槽線TL附近之內部應力之應變,藉此開始形成裂縫線CL。因此,輔助線AL自身亦可為藉由對溝槽線TL施加應力而形成之裂縫線CL。 Further, in the first modification, the strain line CL is started to be formed by separating the glass substrate 4 and releasing the strain of the internal stress in the vicinity of the groove line TL. Therefore, the auxiliary line AL itself may be the crack line CL formed by applying stress to the groove line TL.
參照圖23,於第2變化例中,於步驟S20(圖8),於玻璃基板4之上表面SF1將刀尖51按壓於位置N3。於步驟S30(圖8),於形成溝槽線TL時,於本變化例中,使刀尖51自位置N3向位置N2變位,進而自位置N2向位置N1變位。即,參照圖20,使刀尖51自邊ED2朝向邊ED1之方向、即朝向方向DB變位。方向DB對應於與將自刀尖51延伸之軸AX投影於上表面SF1上之方向相反的方向。於該情形時,藉由刀柄52而於上表面SF1上推進刀尖51。 Referring to Fig. 23, in the second modification, in step S20 (Fig. 8), the blade edge 51 is pressed against the position N3 on the upper surface SF1 of the glass substrate 4. In step S30 (FIG. 8), when the groove line TL is formed, in the present modification, the blade edge 51 is displaced from the position N3 to the position N2, and further displaced from the position N2 to the position N1. That is, referring to Fig. 20, the blade edge 51 is displaced from the side ED2 toward the side ED1, that is, toward the direction DB. The direction DB corresponds to a direction opposite to a direction in which the axis AX extending from the blade edge 51 is projected on the upper surface SF1. In this case, the cutting edge 51 is advanced on the upper surface SF1 by the shank 52.
參照圖24,於第3變化例中,於步驟S30(圖8),於形成溝槽線TL時,與玻璃基板4之上表面SF1之位置N1相比,於位置N2以更大之力按壓刀尖51。具體而言,將位置N4作為位置N1及N2之間之位置,且於溝槽線TL形成到達位置N4之時點,提高刀尖51之載荷。換言之,與位置N1相比,於溝槽線TL之終端部即位置N4及N3之間提高溝槽線TL之載荷。藉此,減輕終端部以外之載荷,可更容易引起裂縫線CL自位置N2起形成。 Referring to Fig. 24, in the third modification, in step S30 (Fig. 8), when the groove line TL is formed, it is pressed with a larger force at the position N2 than the position N1 of the upper surface SF1 of the glass substrate 4. Tip 51. Specifically, the position N4 is set as the position between the positions N1 and N2, and when the groove line TL forms the arrival position N4, the load of the blade edge 51 is increased. In other words, the load of the groove line TL is increased between the positions N4 and N3 which are the end portions of the groove line TL as compared with the position N1. Thereby, the load other than the end portion can be alleviated, and the crack line CL can be more easily formed from the position N2.
根據本實施形態,可自溝槽線TL更確實地形成裂縫線CL。 According to the present embodiment, the crack line CL can be formed more reliably from the groove line TL.
又,於後述之與實施形態4不同之本實施形態中,於形成溝槽線TL之時點(圖21(A))尚未形成輔助線AL。因此,可不受來自輔助線AL之影響,更穩定地維持無裂縫狀態。另,於無裂縫狀態之穩定性不成問題之情形時,可代替未形成輔助線AL(圖21(A))之狀態,而於形成有輔助線AL之圖22(A)之狀態維持無裂縫狀態。 Further, in the present embodiment which is different from the fourth embodiment to be described later, the auxiliary line AL is not formed at the time of forming the groove line TL (Fig. 21(A)). Therefore, it is possible to maintain the crack-free state more stably without being affected by the auxiliary line AL. Further, in the case where the stability of the crack-free state is not a problem, the state in which the auxiliary line AL is not formed (Fig. 21 (A)) can be replaced, and the state in Fig. 22 (A) in which the auxiliary line AL is formed is maintained without cracks. status.
對本實施形態之脆性基板之分斷方法,使用圖25~圖27,於以下進行說明。 The breaking method of the brittle substrate of the present embodiment will be described below with reference to Figs. 25 to 27 .
參照圖25,於本實施形態中,於形成溝槽線TL之前形成輔助線AL。輔助線AL之形成方法本身與圖21(B)(實施形態3)相同。 Referring to Fig. 25, in the present embodiment, the auxiliary line AL is formed before the groove line TL is formed. The method of forming the auxiliary line AL itself is the same as that of Fig. 21 (B) (Embodiment 3).
參照圖26,接著於步驟S20(圖8),將刀尖51按壓於上表面SF1,接著,於步驟S30(圖8),形成溝槽線TL。溝槽線TL之形成方法本身與圖6(A)(實施形態3)相同。輔助線AL及溝槽線TL係於位置N2互相交叉。接著,與實施形態3相同,作為步驟S40(圖8),與實施形態1相同地形成膜21(圖3(A)及(B))、或與實施形態2相同地形成膜22(圖11(A)及(B))。於後者之情形時於上述之期間進而如實施形態2或其變化例說明般,沿著溝槽線TL(參照圖12(A)中之箭頭)於膜22切入切口(例如,參照圖13(B)中之切口HL)。 Referring to Fig. 26, next to step S20 (Fig. 8), the blade edge 51 is pressed against the upper surface SF1, and then, in step S30 (Fig. 8), the groove line TL is formed. The method of forming the trench line TL itself is the same as that of FIG. 6(A) (Embodiment 3). The auxiliary line AL and the groove line TL cross each other at the position N2. Then, in the same manner as in the third embodiment, as the step S40 (Fig. 8), the film 21 is formed in the same manner as in the first embodiment (Figs. 3(A) and (B)), or the film 22 is formed in the same manner as in the second embodiment (Fig. 11). (A) and (B)). In the latter case, in the above-described period, as described in the second embodiment or its modification, the slit is cut into the film 22 along the groove line TL (see the arrow in FIG. 12(A)) (for example, refer to FIG. 13 ( Incision HL) in B).
參照圖27,接著,藉由對玻璃基板4施加產生彎曲力矩等之外力之一般斷裂工序,沿著輔助線AL分離玻璃基板4。藉此,作為步驟S50(圖20),開始裂縫線CL(圖7(B))之形成(圖中,參照虛線箭頭)。 另,於圖25中輔助線AL形成於玻璃基板4之上表面SF1上,但用以分離玻璃基板4之輔助線AL亦可形成於玻璃基板4之下表面SF2上。於該情形時,輔助線AL及溝槽線TL於俯視佈局上,於位置N2互相交叉,但不相互直接接觸。 Referring to Fig. 27, next, a glass substrate 4 is separated along the auxiliary line AL by applying a general breaking step of generating a force such as a bending moment to the glass substrate 4. Thereby, as the step S50 (FIG. 20), the formation of the crack line CL (FIG. 7(B)) is started (in the drawing, the dotted arrow is referred to). Further, in FIG. 25, the auxiliary line AL is formed on the upper surface SF1 of the glass substrate 4, but the auxiliary line AL for separating the glass substrate 4 may be formed on the lower surface SF2 of the glass substrate 4. In this case, the auxiliary line AL and the groove line TL cross each other at the position N2 in a plan view, but are not in direct contact with each other.
另,關於上述以外之構成,與上述實施形態3之構成大致相同。 The configuration other than the above is substantially the same as the configuration of the above-described third embodiment.
參照圖28(A),於第1變化例中,輔助線AL形成於玻璃基板4之下表面SF2上。接著,與圖23(實施形態3)相同,自位置N3向位置N1進行溝槽線TL之形成。參照圖28(B),藉由對玻璃基板4施加產生彎曲力矩等之外力,而沿著輔助線AL分離玻璃基板4。藉此,開始裂縫線CL之形成(圖中,參照虛線箭頭)。 Referring to Fig. 28(A), in the first modification, the auxiliary line AL is formed on the lower surface SF2 of the glass substrate 4. Next, similarly to FIG. 23 (Embodiment 3), the groove line TL is formed from the position N3 to the position N1. Referring to Fig. 28(B), the glass substrate 4 is separated along the auxiliary line AL by applying an external force such as a bending moment to the glass substrate 4. Thereby, the formation of the crack line CL is started (in the drawing, the dotted arrow is referred to).
參照圖29,於第2變化例中,於步驟S30(圖8),於形成溝槽線TL 時,與玻璃基板4之上表面SF1之位置N1相比,於位置N2以更大之力按壓刀尖51。具體而言,將位置N4作為位置N1及N2間之位置,於溝槽線TL形成到達位置N4之時點,提高刀尖51之載荷。換言之,與位置N1相比,於溝槽線TL之終端部即位置N4及N3之間提高溝槽線TL之載荷。藉此,減輕終端部以外之載荷,且可更容易引起裂縫線CL自位置N2起形成。 Referring to Fig. 29, in the second variation, in step S30 (Fig. 8), the groove line TL is formed. At this time, the blade edge 51 is pressed with a greater force at the position N2 than the position N1 of the upper surface SF1 of the glass substrate 4. Specifically, the position N4 is set as the position between the positions N1 and N2, and the load of the blade edge 51 is increased when the groove line TL forms the arrival position N4. In other words, the load of the groove line TL is increased between the positions N4 and N3 which are the end portions of the groove line TL as compared with the position N1. Thereby, the load other than the terminal portion is alleviated, and the crack line CL can be more easily formed from the position N2.
參照圖30(A),於本實施形態之脆性基板之分斷方法中,於步驟S30(圖8),形成自位置N1經由位置N2到達邊ED2之溝槽線TL。接著,維持實施形態1中說明之無裂縫狀態(圖7(A))經過所期望之時間。於該期間,作為步驟S40(圖8),與實施形態1相同地形成膜21(圖3(A)及(B))、或與實施形態2相同地形成膜22(圖11(A)及(B))。於後者之情形時於上述之期間進而如實施形態2或其變化例說明般,沿著溝槽線TL(參照圖12(A)中之箭頭)於膜22切入切口(例如,參照圖13(B)中之切口HL)。 Referring to Fig. 30(A), in the breaking method of the brittle substrate according to the present embodiment, in step S30 (Fig. 8), the groove line TL from the position N1 to the side ED2 via the position N2 is formed. Next, the crack-free state (Fig. 7(A)) described in the first embodiment is maintained for a desired period of time. In the same period, as the step S40 (Fig. 8), the film 21 (Figs. 3(A) and (B)) is formed in the same manner as in the first embodiment, or the film 22 is formed in the same manner as in the second embodiment (Fig. 11(A) and (B)). In the latter case, in the above-described period, as described in the second embodiment or its modification, the slit is cut into the film 22 along the groove line TL (see the arrow in FIG. 12(A)) (for example, refer to FIG. 13 ( Incision HL) in B).
參照圖30(B),接著於位置N2與邊ED2之間,施加釋放溝槽線TL附近之內部應力的應變之應力。藉此,引起裂縫線沿著溝槽線TL形成(圖8:步驟S50)。 Referring to Fig. 30(B), a strain stress which releases the internal stress near the groove line TL is applied between the position N2 and the side ED2. Thereby, the crack line is caused to form along the groove line TL (FIG. 8: step S50).
作為應力之施加,具體而言,於上表面SF1上於位置N2與邊ED2之間(圖中,虛線及邊ED2之間之區域),使按壓之刀尖51滑動。該滑動進行至到達邊ED2為止。刀尖51較好為以交叉於最初形成之溝槽線TL之軌道之方式滑動,更佳為以與最初形成之溝槽線TL之軌道重疊之方式滑動。該再次滑動之長度例如0.5mm左右。又,該再次滑動係可於形成複數條溝槽線TL(圖30(A))後對各個溝槽線TL進行,或,亦可對每條溝槽線TL依序進行1條溝槽線TL之形成及再次滑動之工序。 Specifically, as the application of the stress, the pressed blade edge 51 is slid on the upper surface SF1 between the position N2 and the side ED2 (the area between the broken line and the side ED2 in the drawing). This sliding proceeds until the edge ED2 is reached. The blade edge 51 preferably slides in such a manner as to intersect the track of the groove line TL originally formed, and more preferably slides in a manner overlapping the track of the groove line TL initially formed. The length of the re-sliding is, for example, about 0.5 mm. Moreover, the re-sliding system may be performed on each of the trench lines TL after forming a plurality of trench lines TL (FIG. 30(A)), or one trench line may be sequentially performed for each of the trench lines TL. The process of forming and re-sliding TL.
作為變化例,為了於位置N2與邊ED2之間施加應力,亦可代替上 述刀尖51之再次滑動,而於上表面SF1上之位置N2與邊ED2之間照射雷射光。藉由因此產生之熱應力,亦可釋放溝槽線TL附近之內部應力的應變,藉此引起裂縫線之形成開始。 As a variant, in order to apply a stress between the position N2 and the side ED2, it is also possible to replace The blade tip 51 is again slid, and the laser beam is irradiated between the position N2 on the upper surface SF1 and the side ED2. By the thermal stress thus generated, the strain of the internal stress near the groove line TL can also be released, thereby causing the formation of the crack line to start.
另,關於上述以外之構成,與上述實施形態3之構成大致相同。 The configuration other than the above is substantially the same as the configuration of the above-described third embodiment.
參照圖31(A),於本實施形態之脆性基板之分斷方法中,於步驟S30(圖8),藉由使刀尖51自位置N1向位置N2、接著進而向位置N3變位,形成與上表面SF1之邊緣隔開之溝槽線TL。溝槽線TL之形成方法本身與圖21(A)(實施形態3)大致相同。 Referring to Fig. 31(A), in the breaking method of the brittle substrate according to the present embodiment, in step S30 (Fig. 8), the blade edge 51 is displaced from the position N1 to the position N2 and then to the position N3. A groove line TL spaced apart from the edge of the upper surface SF1. The method of forming the trench line TL itself is substantially the same as that of FIG. 21(A) (Embodiment 3).
接著,維持實施形態1中說明之無裂縫狀態(圖7(A))經過所期望之時間。於該期間,作為步驟S40(圖8),與實施形態1相同地形成膜21(圖3(A)及(B))、或與實施形態2相同地形成膜22(圖11(A)及(B))。於後者之情形時於上述之期間進而如實施形態2或其變化例說明般,沿著溝槽線TL(參照圖12(A)中之箭頭)於膜22切入切口(例如,參照圖13(B)中之切口HL)。 Next, the crack-free state (Fig. 7(A)) described in the first embodiment is maintained for a desired period of time. In the same period, as the step S40 (Fig. 8), the film 21 (Figs. 3(A) and (B)) is formed in the same manner as in the first embodiment, or the film 22 is formed in the same manner as in the second embodiment (Fig. 11(A) and (B)). In the latter case, in the above-described period, as described in the second embodiment or its modification, the slit is cut into the film 22 along the groove line TL (see the arrow in FIG. 12(A)) (for example, refer to FIG. 13 ( Incision HL) in B).
參照圖31(B),進行與圖30(B)(實施形態5或其變化例)相同之應力施加。藉此引起沿著溝槽線TL之裂縫線之形成(圖8:步驟S50)。 Referring to Fig. 31 (B), the same stress application as that of Fig. 30 (B) (Embodiment 5 or a modification thereof) is performed. Thereby, the formation of the crack line along the groove line TL is caused (FIG. 8: step S50).
參照圖32,作為圖31(A)工序之變化例,於溝槽線TL之形成中,亦可使刀尖51自位置N3向位置N2、接著自位置N2向位置N1變位。 Referring to Fig. 32, as a variation of the step of Fig. 31(A), in the formation of the groove line TL, the blade edge 51 may be displaced from the position N3 to the position N2 and then from the position N2 to the position N1.
另,關於上述以外之構成係與上述實施形態3之構成大致相同。 The configuration other than the above is substantially the same as the configuration of the above-described third embodiment.
參照圖33(A)及(B),於上述各實施形態中,亦可代替刀尖51(圖20(A)及(B)),而使用刀尖51v。刀尖51v具有包含頂點與圓錐面SC之圓錐形狀。刀尖51v之突起部PPv係以頂點構成。刀尖之側部PSv係沿著自頂點延伸至圓錐面SC上之虛擬線(圖33(B)之虛線)構成。藉此,側部PSv具有線狀延伸之凸形狀。 Referring to Figs. 33(A) and (B), in the above embodiments, the blade edge 51v may be used instead of the blade edge 51 (Figs. 20(A) and (B)). The blade tip 51v has a conical shape including a vertex and a conical surface SC. The protrusion PPv of the blade edge 51v is constituted by a vertex. The side portion PSv of the blade tip is formed along a virtual line extending from the apex to the conical surface SC (dashed line in Fig. 33(B)). Thereby, the side portion PSv has a convex shape that extends linearly.
於上述各實施形態中,玻璃基板的邊緣之第1及第2邊為長方形之短邊,但第1及第2邊亦可為長方形之長邊。又,邊緣之形狀並非限定於長方形者,例如亦可為正方形。又,第1及第2邊並非限定於直線狀者,亦可為曲線狀。又,於上述各實施形態中,玻璃基板之面為平坦面,但玻璃基板之面亦可彎曲。 In each of the above embodiments, the first and second sides of the edge of the glass substrate are short sides of a rectangle, but the first and second sides may be long sides of a rectangle. Further, the shape of the edge is not limited to a rectangle, and may be, for example, a square. Further, the first and second sides are not limited to a straight line, and may be curved. Further, in each of the above embodiments, the surface of the glass substrate is a flat surface, but the surface of the glass substrate may be curved.
作為特別適合上述之分斷方法之脆性基板雖使用玻璃基板,但脆性基板並非限定於玻璃基板者。脆性基板亦可由玻璃以外製作,例如陶瓷、矽、化合物半導體、藍寶石、或石英。 A glass substrate is used as the brittle substrate which is particularly suitable for the above-described breaking method, but the brittle substrate is not limited to the glass substrate. The brittle substrate can also be made of glass other than ceramics, germanium, compound semiconductors, sapphire, or quartz.
本發明係於其發明範圍內,可自由地組合各實施形態,且可適當變化、省略各實施形態。 The present invention is within the scope of the invention, and the respective embodiments can be freely combined, and the respective embodiments can be appropriately changed and omitted.
4‧‧‧玻璃基板(脆性基板) 4‧‧‧Glass substrate (brittle substrate)
11‧‧‧構件 11‧‧‧ components
21‧‧‧膜 21‧‧‧ film
CL‧‧‧裂縫線 CL‧‧‧ crack line
DT‧‧‧厚度方向 DT‧‧‧ thickness direction
FB‧‧‧外力 FB‧‧‧ external force
SF1‧‧‧上表面(表面) SF1‧‧‧ upper surface (surface)
SF2‧‧‧下表面 SF2‧‧‧ lower surface
TL‧‧‧溝槽線 TL‧‧‧ trench line
XEt‧‧‧端部 XEt‧‧‧ end
XEs‧‧‧端部 XEs‧‧ End
VB-VB‧‧‧線 VB-VB‧‧‧ line
Claims (10)
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| JP2014112647 | 2014-05-30 | ||
| JP2014-112647 | 2014-05-30 |
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| JP (1) | JP6288259B2 (en) |
| KR (1) | KR101856556B1 (en) |
| CN (1) | CN106458691B (en) |
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| JP2000280234A (en) | 1999-01-28 | 2000-10-10 | Canon Inc | Substrate cutting method |
| EP1378495A4 (en) * | 2001-03-16 | 2010-03-03 | Mitsuboshi Diamond Ind Co Ltd | Scribing method, cutter wheel, scribing device using the cutter wheel, and cutter wheel manufacturing device for manufacturing the cutter wheel |
| EP1579971B1 (en) * | 2002-11-22 | 2011-10-05 | Mitsuboshi Diamond Industrial Co., Ltd. | Method for dividing a substrate and a panel production method |
| JP2007331983A (en) * | 2006-06-15 | 2007-12-27 | Sony Corp | Glass scribing method |
| JP2008201629A (en) * | 2007-02-21 | 2008-09-04 | Epson Imaging Devices Corp | Manufacturing method of electrooptical device, separating method of substrate, and substrate separating device |
| EP2199007A4 (en) * | 2007-10-16 | 2011-02-09 | Mitsuboshi Diamond Ind Co Ltd | Method of machining u-shaped groove of substrate of fragile material, removal method, boring method and chamfering method using the same method |
| TWI494284B (en) * | 2010-03-19 | 2015-08-01 | Corning Inc | Mechanical scoring and separation of strengthened glass |
| KR101247571B1 (en) * | 2010-06-14 | 2013-03-26 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | Method for scribing brittle material substrate |
| JP5210356B2 (en) * | 2010-06-14 | 2013-06-12 | 三星ダイヤモンド工業株式会社 | Method for scribing a brittle material substrate |
| JP5244202B2 (en) * | 2011-01-27 | 2013-07-24 | 三星ダイヤモンド工業株式会社 | Method for scribing a brittle material substrate |
| TWI498293B (en) * | 2011-05-31 | 2015-09-01 | Mitsuboshi Diamond Ind Co Ltd | Scribe method, diamond point and scribe apparatus |
| US9701043B2 (en) * | 2012-04-24 | 2017-07-11 | Tokyo Seimitsu Co., Ltd. | Dicing blade |
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| JPWO2015182297A1 (en) | 2017-04-20 |
| KR101856556B1 (en) | 2018-05-10 |
| TWI647081B (en) | 2019-01-11 |
| CN106458691B (en) | 2020-01-14 |
| WO2015182297A1 (en) | 2015-12-03 |
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