TW201606813A - 電壓非線性電阻元件及其製法 - Google Patents
電壓非線性電阻元件及其製法 Download PDFInfo
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- TW201606813A TW201606813A TW104108730A TW104108730A TW201606813A TW 201606813 A TW201606813 A TW 201606813A TW 104108730 A TW104108730 A TW 104108730A TW 104108730 A TW104108730 A TW 104108730A TW 201606813 A TW201606813 A TW 201606813A
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- Prior art keywords
- earth metal
- zinc oxide
- rare earth
- metal oxide
- layer
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- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000000034 method Methods 0.000 title claims description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 232
- 239000011787 zinc oxide Substances 0.000 claims abstract description 113
- 239000000919 ceramic Substances 0.000 claims abstract description 96
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims abstract description 76
- 239000004020 conductor Substances 0.000 claims description 19
- 238000004544 sputter deposition Methods 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 12
- 239000011261 inert gas Substances 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 7
- 150000004706 metal oxides Chemical class 0.000 claims description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 6
- 230000001590 oxidative effect Effects 0.000 claims description 6
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 5
- 150000002910 rare earth metals Chemical class 0.000 claims description 4
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 229910000679 solder Inorganic materials 0.000 description 7
- 239000011888 foil Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910017401 Au—Ge Inorganic materials 0.000 description 2
- 206010021143 Hypoxia Diseases 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- 229910015365 Au—Si Inorganic materials 0.000 description 1
- 229910015363 Au—Sn Inorganic materials 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(II) oxide Inorganic materials [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- VASIZKWUTCETSD-UHFFFAOYSA-N manganese(II) oxide Inorganic materials [Mn]=O VASIZKWUTCETSD-UHFFFAOYSA-N 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H01C7/105—Varistor cores
- H01C7/108—Metal oxide
- H01C7/112—ZnO type
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
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Abstract
於氧化鋅系的電壓非線性電阻元件中,將高電流
區域的限制電壓抑制為低。
電壓非線性電阻元件10包括電阻體14以及
一對的電極16、18,前述電阻體14具有1個以氧化鋅為主成分且體積電阻率為小於1.0×10-2Ωcm的氧化鋅陶瓷層12a與以稀土類金屬氧化物為主成分的稀土類金屬氧化物層12b所接合的接合體12,前述電極16、18以導電通路橫穿前述氧化鋅陶瓷層12a與前述稀土類金屬氧化物層12b的接合面之方式形成於前述電阻體14上。此元件10的接合體12的氧化鋅陶瓷層12a,使用比以往的體積電阻率為低者。因此,高電流區域的限制電壓能夠抑制的比以往為低。
Description
本發明是有關於電壓非線性電阻元件及其製法。
電壓非線性電阻元件(壓敏電阻元件)是將電壓非線性電阻體以一對電極挾持的結構之元件,作為從異常電壓保護電子電路等的元件,而廣泛的應用於濕度感測器、溫度感測器等的各種的感測器。作為此種的電壓非線性電阻元件,在專利文獻1中揭示有在一對電極挾持電阻體的電壓非線性電阻元件,其中電阻體是氧化鋅陶瓷層與M1-xAxBO3(M:稀土類元素,A:Sr及Ba的至少其中一方,B:Mn及Co的至少一方,x≦0.4)所表示的金屬氧化物層接合的結構。電阻體是將氧化鋅陶瓷與金屬氧化物在未燒結的狀態接合,並於1200~1350℃燒結為一體而製造。而且,氧化鋅陶瓷層的比電阻為0.001~數Ωmm(=10-4~10-1Ωcm)。尚且,比電阻與體積電阻率相同。
專利文獻1:日本專利第4123957號公報
但是,專利文獻1雖記載在電壓非線性電阻元件流動1mA的電流時的兩端電壓V1mA為4V程度,但是對於高電流區域(例如是流動20A/cm2的電流的情形)的電壓並未進行檢討。
本發明是為了解決上述課題而成者,主要的目的在於在氧化鋅系的電壓非線性電阻元件中,將高電流區域的限制電壓抑制為低。
本發明的電壓非線性電阻元件包括:電壓非線性電阻體,包含至少1個以氧化鋅為主成分且體積電阻率為小於1.0×10-2Ωcm的氧化鋅陶瓷層與以稀土類金屬氧化物為主成分的稀土類金屬氧化物層所接合的接合體;以及一對的電極,以導電通路橫穿前述氧化鋅陶瓷層與前述稀土類金屬氧化物層的接合面之方式形成於前述電壓非線性電阻體上。
此電壓非線性電阻元件,作為電壓非線性電阻體的氧化鋅陶瓷層,使用與以往相比體積電阻率低的氧化鋅陶瓷層。因此,高電流區域(例如是流動20A/cm2的電流的情形)的限制電壓與以往相比能夠抑制為低。其結果,例如即使是因靜電而使大電流於本發明的電壓非線性電阻元件流動,能夠將電壓的上昇抑制為小,並能夠防止元件本身的絕緣破壞的產生。
於本發明的電壓非線性電阻元件中,前述氧化鋅陶瓷層亦可以含有選自由Al2O3、In2O3以及Ga2O3所組之組群中的1種以上。藉由添加此種的3價的金屬離子,能夠使氧化鋅陶瓷層的體積電阻率比較容易成為低電阻。
於本發明的電壓非線性電阻元件中,前述的稀土類金屬氧化物層亦可以藉由於前述氧化鋅陶瓷層上濺鍍而形成。依此,由於能夠不將氧化鋅陶瓷層暴露於高溫而形成稀土類金屬氧化物層,氧化鋅陶瓷層能夠迴避因受熱的影響而使體積電阻率上昇的疑慮。
於本發明的電壓非線性電阻元件中,前述電壓非線性電阻體亦可以構成為積層2個以上的前述接合體,並於相鄰的氧化鋅陶瓷層彼此之間,挾持有稀土類金屬氧化物層,或挾持有稀土類金屬氧化物層與導體層,或挾持有稀土類金屬氧化物層、導體層與稀土類金屬氧化物層。依此,藉由適當設定電壓非線性電阻元件內所積層的接合體的數目,能夠對應種種的壓敏電阻電壓。
本發明的電壓非線性電阻元件的製法包括:(a)於以氧化鋅為主成分且體積電阻率為小於1.0×10-2Ωcm的氧化鋅陶瓷層上,藉由濺鍍形成以稀土類金屬氧化物為主成分的稀土類金屬氧化物層而得到接合體的步驟;(b)準備至少2個前述接合體,在一方的接合體的前述稀土類金屬氧化物層與另一方的接合體的前述氧化鋅陶瓷層之間挾持導體箔並疊合,或者是未挾持而直接疊合,於此狀態於惰性氣體環境中進行300~700℃的熱處理,藉此將前述接合
體接合並積層以得到電壓非線性電阻體的步驟;以及(c)藉由導電通路橫穿前述氧化鋅陶瓷層與前述稀土類金屬氧化物層的接合面之方式,形成一對的電極的步驟,或是包括:(a)於以氧化鋅為主成分且體積電阻率為小於1.0×10-2Ωcm的氧化鋅陶瓷層上,藉由濺鍍形成以稀土類金屬氧化物為主成分的稀土類金屬氧化物層而得到接合體的步驟;(b)準備至少2個前述接合體,在一方的接合體的前述稀土類金屬氧化物層與另一方的接合體的前述稀土類金屬氧化物層之間挾持導體箔並疊合,或者是未挾持而直接疊合,於此狀態於惰性氣體環境中進行300~700℃的熱處理,藉此將前述接合體接合並積層以得到電壓非線性電阻體的步驟;以及(c)以導電通路橫穿前述氧化鋅陶瓷層與前述稀土類金屬氧化物層的接合面之方式,形成一對的電極的步驟。
藉由此些的製法,能夠較容易的製造在電壓非線性電阻體內積層複數接合體的電壓非線性電阻元件。而且,由於步驟(b)的熱處理的溫度為較低的300~700℃,能夠防止因熱的影響所致的氧化鋅陶瓷層的體積電阻率的上昇。特別是,在步驟(b)的熱處理的溫度在300~500℃的情形,此效果變得顯著。
10、30、40、130、140‧‧‧電壓非線性電阻元件
12、42‧‧‧接合體
12a‧‧‧氧化鋅陶瓷層
12b‧‧‧稀土類金屬氧化物層
14、34、44、134、144‧‧‧電壓非線性電阻體(電阻體)
16、18‧‧‧電極
33、43‧‧‧導體層
第1圖所示為電壓非線性電阻元件10的剖面圖。
第2圖所示為電壓非線性電阻元件30的剖面圖。
第3圖所示為電壓非線性電阻元件130的剖面圖。
第4圖所示為電壓非線性電阻元件40的剖面圖。
第5圖所示為電壓非線性電阻元件140的剖面圖。
第6圖所示為實施例1~3以及比較例1~3的電壓非線性電阻元件的電流-電壓特性的圖。
本發明的較佳實施型態,一邊參照圖式並說明如下。第1圖所示為電壓非線性電阻元件10的剖面圖。
電壓非線性電阻元件10包括電壓非線性電阻體14(簡稱為電阻體)與挾持此電阻體14的一對的電極16、18。
電阻體14具有1個氧化鋅陶瓷層12a與以稀土類金屬氧化物為主成分的稀土類金屬氧化物層12b接合的接合體12。氧化鋅陶瓷層12a為以氧化鋅為主成分、且體積電阻率為小於1.0×10-2Ωcm的層。體積電阻率較佳為1.0×10-3Ωcm以下。依此,高電流區域的限制電壓與以往相比能夠抑制為更進一步的低。稀土類金屬氧化物層12b的厚度較佳為0.01~1μm,更佳為0.05~0.5μm。作為稀土類金屬氧化物並沒有特別的限制,例如較佳是Pr2O3、La2O3、Yb2O3等。
一對的電極16、18以導電通路橫穿氧化鋅陶瓷層12a以及稀土類金屬氧化物層12b的接合面的方式,形成於電阻體14上。電極16、18只要是與氧化鋅陶瓷呈現良好的歐姆性之導電性佳的材料,並沒有特別的限制,例如是可舉出金、銀、鉑、鋁等。此處,可得到將電極18作為陽極而施加電壓的情形容易使電流流動,相反的將電極16作為陽極而施加電
壓的情形呈現電壓非線性的元件。
其次,以下說明電壓非線性電阻元件10的製造例。
‧氧化鋅陶瓷層12a的製作
氧化鋅陶瓷層12a,可藉由從體積電阻率為小於1.0×10-2Ωcm,較佳為1.0×10-3Ωcm以下的氧化鋅陶瓷塊切割出規定尺寸的板材而得到。氧化鋅陶瓷塊是藉由使作為摻質的Al、Ga、In等的3價離子固溶於氧化鋅陶瓷中,並將氧化鋅粉末於非氧化氣體環境中燒成而導入氧缺陷,而能夠獲得。對於固溶有摻質的氧化鋅陶瓷塊的獲得,首先,以於氧化鋅粉末中Al2O3、Ga2O3、In2O3等的3價金屬氧化物粉末成為0.05~2.0質量%的方式混合,並成形為規定形狀的成形體。其次,將此成形體於非氧化氣體環境(例如是氮氣體環境或氬氣體環境)下,以900~1200℃保持數小時後,再昇溫至1300~1500℃以數小時燒成。依此,能夠較容易的得到體積電阻率低的氧化鋅陶瓷塊。對於成為目的值之體積電阻率的方法,可調整氧化鋅粉末所混合的3價金屬氧化物粉末的質量%、或調整燒成溫度。而且,用作為原料的氧化鋅粉末,平均粒徑較佳為0.02~5μm。3價金屬氧化物粉末的平均粒徑較佳為0.01~0.5μm。作為3價金屬氧化物粉末較佳為Al2O3粉末。作為Al2O3粉末可使用θ氧化鋁,亦可使用γ氧化鋁或勃姆石等。另一方面,對於將氧化鋅粉末於非氧化氣體環境燒成而得到體積電阻率低的氧化鋅陶瓷塊,例如是將氧化鋅粉末於非氧化氣體環境(例如是氮氣體環境或氬氣體環境)下,以1300~1500℃保持數小時而燒成。
‧稀土類金屬氧化物層12b的製作
稀土類金屬氧化物層12b可為1種類的稀土類金屬氧化物、亦可以為2種類以上的稀土類氧化物的混合物,也可以以稀土類金屬氧化物為主成分而含有其他的氧化物(例如是Cr2O3、MnO、CoO、ZnO、SiO2等)作為副成分。於稀土類金屬氧化物層12b僅為稀土類金屬氧化物的情形,例如是可以藉由將稀土類金屬氧化物作為靶材而濺鍍於氧化鋅陶瓷層12a上,以形成稀土類金屬氧化物層12b。除了濺鍍之外亦可以使用真空蒸鍍或離子鍍等。或者是可以將含有稀土類金屬氧化物粉末的糊料塗布於氧化鋅陶瓷層12a並乾燥,並於較低溫(例如是200~700℃,較佳是200~500℃)熱處理以作成稀土類金屬氧化物層12b。另一方面,在稀土類金屬氧化物層12b含有副成分的情形,可以在稀土類金屬氧化物之外亦使用副成分作為靶材,藉由多元同時濺鍍以在氧化鋅陶瓷層12a上形成稀土類金屬氧化物層12b。或者是可以將含有除了稀土類金屬氧化物粉末之外的副成分的粉末之糊料塗布於氧化鋅陶瓷層12a並乾燥,並於較低溫熱處理以作成稀土類金屬氧化物層12b。於熱處理的情形,由於較為低溫而氧化鋅陶瓷層12a幾乎不具有受熱的影響而體積電阻率上昇的疑慮,但在濺鍍的情形由於能夠以更低溫處理,因而能夠確實的迴避此疑慮。
‧電極16、18的製作
於本實施型態,電阻體14具有一個氧化鋅陶瓷層12a與稀土類金屬氧化物層12b所接合的接合體12。電極16、18可藉由將電極材料蒸鍍或濺鍍於此電阻體14的兩面以製作。作
為電極材料,可舉出金、銀、鉑、鋁等。或者是亦可以準備板狀的電極16、18而將此些經由導電性接合材料接合於電阻體14的各面。
如藉由以上所詳述的電壓非線性電阻元件10,在將電極16作為陽極而施加電壓時顯示電壓非線性,並能夠將高電流區域(例如是流動20A/cm2的電流的情形)的限制電壓抑制的比以往為低。其結果,例如即使是因靜電而使大電流於電壓非線性電阻元件10流動,能夠將電壓的上昇抑制為小,並能夠防止元件本身的絕緣破壞的產生。
尚且,本發明並不限定於上述的實施型態,只要是屬於本發明的技術範圍,自然能夠以種種的型態實施。
例如是,上述電壓非線性電阻元件10是在具有1個接合體12的電阻體14的兩面設置電極16、18,亦可以使用複數的接合體12積層的電阻體以取代電阻體14。藉由使用此種的積層型的電阻體,變得能夠控制壓敏電阻電壓,而能夠得到因應用途的壓敏電壓的電壓非線性電阻元件。使用積層型的電阻體的例子如第2圖~第5圖所示。
第2圖所示的電壓非線性電阻元件30,是在電阻體34的兩面設置電極16、18,其中電阻體34為將2個接合體12經由導體層33積層並接合而成的積層型的電阻體。電阻體34是在相鄰的氧化鋅陶瓷層12a之間挾持稀土類金屬氧化物層12b以及導體層33。電阻體34的製造例如下所述。首先,準備2個接合體12,將一方的接合體12的氧化鋅陶瓷層12a與另一方的接合體12的稀土類金屬氧化物層12b相對向對
合,於其間挾持、疊合作為導體箔的硬焊料(例如是Au-Ge合金箔、Au-Sn合金箔、Au-Si合金箔等),將此些加壓而一體化。將其於惰性氣體環境中昇溫至特定的接合溫度(例如是300~700℃,較佳為300~500℃),保持預定時間後降溫。依此,由於硬焊料經熔融或軟化後固化而成為導體層33,能夠得到電阻體34。如依此電壓非線性電阻元件30,可得到與上述元件10相同的效果。而且,由於使用2個接合體12所積層的電阻體34,與實施例1的電壓非線性電阻元件10相比能夠使限制電壓約為2倍。進而,使用在作為氧化鋅陶瓷層12a的氧化鋅陶瓷中添加多量的摻質(3價離子)並以惰性氣體環境熱處理而多數形成氧缺陷、藉此而低電阻化者的情形,有可能因接合溫度過高(例如是900℃或1000℃)而使摻質析出且氧缺陷消失而使電阻提高,由於此處的接合溫度為700℃以下,較佳為500℃以下,能夠維持氧化鋅陶瓷層12a的低電阻。
第3圖所示的電壓非線性電阻元件130,是在電阻體134的兩面設置電極16、18,其中電阻體134是將3個接合體12個別經由導體層33積層並接合而成的電阻體。電阻體134是在相鄰的氧化鋅陶瓷層12a之間挾持稀土類金屬氧化物層12b以及導體層33。由於基本的構成與所得的效果與第2圖的電壓非線性電阻元件30相同,此處省略詳細的內容。但是,由於元件130使用3個接合體12積層的電阻體134,與實施例1的電壓非線性電阻元件10相比能夠使限制電壓約為3倍。
第4圖所示的電壓非線性電阻元件40,是在電阻體44的兩面設置電極16、18,其中電阻體44為將2個接合體
12經由導體層43積層並接合而成的積層型的電阻體。電阻體44是在相鄰的氧化鋅陶瓷層12a之間挾持稀土類金屬氧化物層12b、導體層43以及稀土類金屬氧化物層12b。電阻體44的製造例如下所述。首先,準備2個接合體12,將一方的接合體12的稀土類金屬氧化物層12b與另一方的接合體12的稀土類金屬氧化物層12b相對向對合,於其間挾持、疊合前述的硬焊料,將此些加壓而一體化。然後,與電壓非線性電阻元件30的情形相同,藉由於惰性氣體環境中進行熱處理,由於硬焊料經熔融或軟化後固化而成為導體層43,能夠得到電阻體44。如依此電壓非線性電阻元件40,將電極16與電極18的任1個作為陽極而施加電壓的情形亦顯示電壓非線性,此時的限制電壓與實施例1的電壓非線性電阻元件10幾乎相同。進而,與電壓非線性電阻元件30相同的理由,能夠維持氧化鋅陶瓷層12a的低電阻。
第5圖所示的電壓非線性電阻元件140,是在電阻體144的兩面設置電極16、18,其中電阻體144為將2個接合體12與1個3層結構的接合體42經由導體層43積層並接合而成的積層型的電阻體。電阻體144是在相鄰的氧化鋅陶瓷層12a之間挾持稀土類金屬氧化物層12b、導體層43以及稀土類金屬氧化物層12b。電阻體144的製造例如下所述。首先,準備2個接合體12。而且,在氧化鋅陶瓷層12a兩面形成稀土類金屬氧化物層12b而成為3層結構的接合體42。然後,將第1個接合體12的稀土類金屬氧化物層12b與3層結構的接合體42的一方的稀土類金屬氧化物層12b之間挾持前述的硬焊
料,將3層結構的接合體42的另一方的稀土類金屬氧化物層12b與第2個接合體12的稀土類金屬氧化物層12b之間挾持前述硬焊料,並依此狀態將此些加壓而一體化。然後,與電壓非線性電阻元件30的情形相同,藉由於惰性氣體環境中進行熱處理,由於硬焊料經熔融或軟化後固化而成為導體層43,能夠得到電阻體144。如依此電壓非線性電阻元件140,將電極16與電極18的任1個作為陽極而施加電壓的情形亦顯示電壓非線性,此時的限制電壓與實施例1的電壓非線性電阻元件10相比為約2倍。
上述第2圖~第5圖的實施型態是將複數的接合體12經由導體層33、43接合,但是於接合時亦可以不使用硬焊料,直接將接合體12彼此直接接合。此時,較佳是接合體12彼此以較低溫(例如是300~700℃,較佳為300~500℃)接合。
[實施例1]
於氧化鋅(平均粒徑1.5μm)中添加0.1質量%θ氧化鋁(平均粒徑0.02μm)、濕式混合後,蒸發乾燥並以網眼為75μm的篩而篩選後,進行成形。將成形體脫脂後在N2氣體環境以1100℃保持5小時後,再昇溫至1400℃進行5小時的燒成,以製作氧化鋅陶瓷塊。此氧化鋅陶瓷塊的體積電阻率為9.0×10-3Ωcm。將所得的氧化鋅陶瓷塊切割為10mm×10mm×1mm的板狀以得到氧化鋅陶瓷薄板。將此薄板的表面研磨、洗淨後,將氧化鐠(Pr2O3)用作為靶材進行高頻電漿濺鍍,於氧化鋅陶瓷薄板的表面成膜氧化鐠的濺鍍膜(厚度0.3μm),以得到接合體。
於濺鍍使用ULVAC機工製RFS-200。成膜條件如下。靶材尺寸:直徑80mm,RF輸出:20W,氣體壓(Ar);2.0Pa,成膜時間:15分。
所得的接合體直接作為電阻體使用,於電阻體的兩面設置Al蒸鍍電極,以得到電壓非線性電阻元件(請參照第1圖)。對此電壓非線性電阻元件的兩電極施加電壓以測定電流-電壓特性。尚且,將設置於氧化鋅陶瓷薄板側的電極作為陽極,將設置於氧化鐠的濺鍍膜的電極作為陰極。測定結果表示於表1以及第6圖。1mA/cm2相當的電流值的限制電壓為3.2V,20A/cm2相當的電流值的限制電壓為5.4V。
[實施例2]
除了於氧化鋅中混合1質量%θ氧化鋁以外,以與實施例1相同的製作氧化鋅陶瓷塊。此氧化鋅陶瓷塊的體積電阻率為9.3×10-4Ωcm。將此氧化鋅陶瓷塊切割為10mm×10mm×1mm的板狀以作為氧化鋅陶瓷薄板。使用此薄板以與實施例1相同的製造接合體。所得的接合體直接作為電阻體使用,於電阻體的兩面設置Al蒸鍍電極,以作為電壓非線性電阻元件。對此電
壓非線性電阻元件的兩電極如同實施例1的施加電壓以測定電流-電壓特性。測定結果表示於表1以及第6圖。1mA/cm2相當的電流值的限制電壓為3.1V,20A/cm2相當的電流值的限制電壓為4.4V。
[實施例3]
除了於氧化鋅中混合2質量%θ氧化鋁以外,以與實施例1相同的製作氧化鋅陶瓷塊。此氧化鋅陶瓷塊的體積電阻率為1.1×10-4Ωcm。將此氧化鋅陶瓷塊切割為10mm×10mm×1mm的板狀以作為氧化鋅陶瓷薄板。使用此薄板以與實施例1相同的製造接合體。所得的接合體直接作為電阻體使用,於電阻體的兩面設置Al蒸鍍電極,以作為電壓非線性電阻元件。對此電壓非線性電阻元件的兩電極如同實施例1的施加電壓以測定電流-電壓特性。測定結果表示於表1以及第6圖。1mA/cm2相當的電流值的限制電壓為3.2V,20A/cm2相當的電流值的限制電壓為3.6V。
[比較例1]
以換算為Al2O3而成為0.01質量%的方式於氧化鋅中添加硝酸鋁水溶液,並以水分量成為50質量%的方式添加水,進而添加微量的結合劑以及消泡劑後,藉由超音波攪拌30分鐘、葉輪攪拌30分鐘以進行混合。混合後藉由噴霧乾燥器造粒以得到造粒物。將造粒物經由網眼為200μm的篩而篩選之後,經成形、脫脂之後於大氣環境以1400℃、5小時燒成,以製作氧化鋅陶瓷塊。此氧化鋅陶瓷塊的體積電阻率為2.0×10-2Ωcm。將所得的氧化鋅陶瓷塊切割為10mm×10mm×1mm的板狀以得
到氧化鋅陶瓷薄板。於此氧化鋅陶瓷薄板的表面如同實施例1的成膜稀土類金屬氧化物的濺鍍膜,以得到接合體。所得的接合體直接作為電阻體使用,於電阻體的兩面設置Al蒸鍍電極,以作為電壓非線性電阻元件。對此電壓非線性電阻元件的兩電極如同實施例1的施加電壓以測定電流-電壓特性。測定結果表示於表1以及第6圖。1mA/cm2相當的電流值的限制電壓為2.9V,20A/cm2相當的電流值的限制電壓為7.3V。
[比較例2]
比較例2為將氧化鋅成形體在大氣環境燒成的例子(實施例1、2是在N2氣體環境中燒成)。將氧化鋅中添加0.1質量%θ氧化鋁、濕式混合後,蒸發乾燥並以1000℃熱處理的預燒成物,以球磨機粉碎至1μm以下。氧化鋅及θ氧化鋁使用與實施例1相同者。將粉碎物乾燥並以網眼為75μm的篩而篩選後,進行成形並脫脂後在大氣環境以1300℃、5小時進行燒成,以製作氧化鋅陶瓷塊。此氧化鋅陶瓷塊的體積電阻率為7.3×10-1Ωcm。將所得的氧化鋅陶瓷塊切割為10mm×10mm×1mm的板狀以得到氧化鋅陶瓷薄板。於此氧化鋅陶瓷薄板的表面與實施例1相同的成膜稀土類金屬氧化物(氧化鐠)的濺鍍膜,以得到接合體。所得的接合體直接作為電阻體使用,於電阻體的兩面設置Al蒸鍍電極,以作為電壓非線性電阻元件。對此電壓非線性電阻元件的兩電極如同實施例1的施加電壓以測定電流-電壓特性。測定結果表示於表1以及第6圖。1mA/cm2相當的電流值的限制電壓為3.3V,20A/cm2相當的電流值的限制電壓為8.5V。
[比較例3]
除了於氧化鋅中添加1質量%θ氧化鋁以外,以與比較例2相同的製作氧化鋅陶瓷塊。此氧化鋅陶瓷塊的體積電阻率為3.5×10-2Ωcm。將所得的氧化鋅陶瓷塊切割為10mm×10mm×1mm的板狀以得到氧化鋅陶瓷薄板。於此氧化鋅陶瓷薄板的表面與實施例1相同的成膜稀土類金屬氧化物(氧化鐠)的濺鍍膜,以得到接合體。所得的接合體直接作為電阻體使用,於電阻體的兩面設置Al蒸鍍電極,以作為電壓非線性電阻元件。對此電壓非線性電阻元件的兩電極如同實施例1的施加電壓以測定電流-電壓特性。測定結果表示於表1以及第6圖。1mA/cm2相當的電流值的限制電壓為2.9V,20A/cm2相當的電流值的限制電壓為7.4V。
如同上述,可了解與使用體積電阻率為2.0×10-2Ωcm以上的於大氣環境燒成的氧化鋅陶瓷薄板之比較例1~3的電壓非線性電阻元件相較之下,使用體積電阻小於1.0×10-2Ωcm(特別是1.0×10-3Ωcm以下)的氧化鋅陶瓷薄板之實施例1~3的電壓非線性電阻元件,在高電流區域(例如是20A/cm2以上的區域)的產生電壓低,電子電路的保護功能優良。
[實施例4]
準備2個與實施例3相同而製作的接合體。於一方的接合體的氧化鋅陶瓷薄板與另一方的接合體的氧化鐠的濺鍍膜之間挾持Au-Ge合金(以質量比Au/Ge為88/12)的箔(厚度50μm)而將兩接合體重合。於此狀態於惰性氣體環境進行420℃、10分鐘的熱處理,將兩接合體接合而得到積層型的電阻體。於所
得的電阻體的兩面設置Al蒸鍍電極,以得到電壓非線性電阻元件(請參照第2圖)。對此電壓非線性電阻元件的兩電極施加電壓以測定電流-電壓特性。尚且,將設置於氧化鋅陶瓷薄板側的電極作為陽極,將設置於濺鍍膜的電極作為陰極。其結果雖未圖示,但確認得到與實施例3相同的電壓非線性電阻特性。此情形的非線性區域(電流0.01~2A/cm2的區域)的限制電壓與實施例3相比為約2倍。
尚且,上述的實施例僅為本發明的一個例子,本發明並不限定於此些實施例。
10‧‧‧電壓非線性電阻元件
12‧‧‧接合體
12a‧‧‧氧化鋅陶瓷層
12b‧‧‧稀土類金屬氧化物層
14‧‧‧電阻體
16、18‧‧‧電極
Claims (7)
- 一種電壓非線性電阻元件,包括:電壓非線性電阻體,包含至少1個以氧化鋅為主成分且體積電阻率為小於1.0×10-2Ωcm的氧化鋅陶瓷層與以稀土類金屬氧化物為主成分的稀土類金屬氧化物層所接合的接合體;以及一對的電極,以導電通路橫穿前述氧化鋅陶瓷層與前述稀土類金屬氧化物層的接合面之方式形成於前述電壓非線性電阻體上。
- 如申請專利範圍第1項所記載的電壓非線性電阻元件,其中前述氧化鋅陶瓷層含有選自由Al2O3、In2O3以及Ga2O3所組之組群中的1種以上。
- 如申請專利範圍第1或2項所記載的電壓非線性電阻元件,其中前述稀土類金屬氧化物層藉由於前述氧化鋅陶瓷層上濺鍍而形成。
- 如申請專利範圍第1至3項中任一項所記載的電壓非線性電阻元件,其中前述電壓非線性電阻體為積層2個以上的前述接合體,並於相鄰的氧化鋅陶瓷層彼此之間,挾持有稀土類金屬氧化物層,或挾持有稀土類金屬氧化物層與導體層,或挾持有稀土類金屬氧化物層、導體層與稀土類金屬氧化物層。
- 一種電壓非線性電阻元件的製法,包括:(a)於以氧化鋅為主成分且體積電阻率為小於1.0×10-2Ωcm的氧化鋅陶瓷層上,藉由濺鍍形成以稀土類金屬氧化物為 主成分的稀土類金屬氧化物層而得到接合體的步驟;(b)準備至少2個前述接合體,在一方的接合體的前述稀土類金屬氧化物層與另一方的接合體的前述氧化鋅陶瓷層之間挾持導體箔並疊合,或者是未挾持而直接疊合,於此狀態於惰性氣體環境中進行300~700℃的熱處理,藉此將前述接合體接合並積層以得到電壓非線性電阻體的步驟;以及(c)以導電通路橫穿前述氧化鋅陶瓷層與前述稀土類金屬氧化物層的接合面之方式,形成一對的電極的步驟。
- 一種電壓非線性電阻元件的製法,包括:(a)於以氧化鋅為主成分且體積電阻率為小於1.0×10-2Ωcm的氧化鋅陶瓷層上,藉由濺鍍形成以稀土類金屬氧化物為主成分的稀土類金屬氧化物層而得到接合體的步驟;(b)準備至少2個前述接合體,在一方的接合體的前述稀土類金屬氧化物層與另一方的接合體的前述稀土類金屬氧化物層之間挾持導體箔並疊合,或者是未挾持而直接疊合,於此狀態於惰性氣體環境中進行300~700℃的熱處理,藉此將前述接合體接合並積層以得到電壓非線性電阻體的步驟;以及(c)以導電通路橫穿前述氧化鋅陶瓷層與前述稀土類金屬氧化物層的接合面之方式,形成一對的電極的步驟。
- 如申請專利範圍第5或6項所記載的電壓非線性電阻元件的製法,其中步驟(b)的前述熱處理以300~500℃進行。
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| EP2942788B1 (en) * | 2014-03-19 | 2018-07-04 | NGK Insulators, Ltd. | Voltage nonlinear resistive element and method for manufacturing the same |
| KR20150109293A (ko) * | 2014-03-19 | 2015-10-01 | 엔지케이 인슐레이터 엘티디 | 전압 비선형 저항 소자 및 그 제조 방법 |
| CN104794173A (zh) * | 2015-04-01 | 2015-07-22 | 惠州Tcl移动通信有限公司 | 一种基于移动终端的拍照处理方法及系统 |
| JP6703428B2 (ja) * | 2016-03-28 | 2020-06-03 | 日本碍子株式会社 | 電圧非直線抵抗素子及びその製法 |
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| GB764693A (en) * | 1954-01-06 | 1957-01-02 | E M P Electric Ltd | Improvements in non-linear resistor elements for lightning arresters |
| JPS5524247B2 (zh) | 1973-10-19 | 1980-06-27 | ||
| JPS5912002B2 (ja) * | 1979-05-10 | 1984-03-19 | 松下電器産業株式会社 | 電圧非直線抵抗器とその製造方法 |
| US4296002A (en) | 1979-06-25 | 1981-10-20 | Mcgraw-Edison Company | Metal oxide varistor manufacture |
| US4272754A (en) * | 1979-12-17 | 1981-06-09 | General Electric Company | Thin film varistor |
| US4383237A (en) * | 1980-05-07 | 1983-05-10 | Matsushita Electric Industrial Co., Ltd. | Voltage-dependent resistor |
| US4400683A (en) | 1981-09-18 | 1983-08-23 | Matsushita Electric Industrial Co., Ltd. | Voltage-dependent resistor |
| JPS5886702A (ja) * | 1981-11-19 | 1983-05-24 | 松下電器産業株式会社 | バリスタの製造方法 |
| JPH02214101A (ja) * | 1989-02-14 | 1990-08-27 | Tdk Corp | 電圧非直線性抵抗素子 |
| JPH06204006A (ja) * | 1992-10-20 | 1994-07-22 | Matsushita Electric Ind Co Ltd | 酸化亜鉛バリスタの製造方法 |
| JP2985559B2 (ja) * | 1993-03-17 | 1999-12-06 | 松下電器産業株式会社 | バリスタ |
| JP3622774B2 (ja) * | 1994-04-18 | 2005-02-23 | 株式会社村田製作所 | 電圧非直線抵抗体の製造方法 |
| US5854586A (en) * | 1997-09-17 | 1998-12-29 | Lockheed Martin Energy Research Corporation | Rare earth doped zinc oxide varistors |
| JP2000228302A (ja) * | 1999-02-04 | 2000-08-15 | Atsushi Iga | 酸化亜鉛系磁器積層物とその製造方法および酸化亜鉛バリスタ |
| JP2000243608A (ja) * | 1999-02-18 | 2000-09-08 | Atsushi Iga | 酸化亜鉛バリスタとその製造方法 |
| US6279811B1 (en) | 2000-05-12 | 2001-08-28 | Mcgraw-Edison Company | Solder application technique |
| JP4123957B2 (ja) | 2003-02-10 | 2008-07-23 | 株式会社村田製作所 | 電圧依存性抵抗器 |
| US8117739B2 (en) * | 2004-01-23 | 2012-02-21 | Cooper Technologies Company | Manufacturing process for surge arrester module using pre-impregnated composite |
| JP5088029B2 (ja) * | 2007-07-19 | 2012-12-05 | Tdk株式会社 | バリスタ |
| DE102009023628A1 (de) * | 2009-05-27 | 2010-12-02 | Siemens Aktiengesellschaft | Verfahren zum Erzeugen einer Schicht mit Absorberpartikeln für eine Energiestrahlung |
| KR20150109293A (ko) * | 2014-03-19 | 2015-10-01 | 엔지케이 인슐레이터 엘티디 | 전압 비선형 저항 소자 및 그 제조 방법 |
| EP2942788B1 (en) * | 2014-03-19 | 2018-07-04 | NGK Insulators, Ltd. | Voltage nonlinear resistive element and method for manufacturing the same |
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| EP2942789A2 (en) | 2015-11-11 |
| US20150270037A1 (en) | 2015-09-24 |
| EP2942789A3 (en) | 2016-01-27 |
| JP2015195370A (ja) | 2015-11-05 |
| CN104934173A (zh) | 2015-09-23 |
| KR20150109293A (ko) | 2015-10-01 |
| EP2942789B1 (en) | 2018-07-04 |
| JP6496582B2 (ja) | 2019-04-03 |
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