TW201520511A - 3D measurement device, 3D measurement method, and manufacturing method of substrate - Google Patents
3D measurement device, 3D measurement method, and manufacturing method of substrate Download PDFInfo
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- 238000005259 measurement Methods 0.000 title claims abstract description 68
- 239000000758 substrate Substances 0.000 title claims description 58
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 238000000691 measurement method Methods 0.000 title claims description 5
- 238000003384 imaging method Methods 0.000 claims description 58
- 238000006073 displacement reaction Methods 0.000 claims description 51
- 238000012545 processing Methods 0.000 claims description 25
- 238000012937 correction Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 15
- 230000007246 mechanism Effects 0.000 claims description 8
- 229910000679 solder Inorganic materials 0.000 claims description 6
- 230000000295 complement effect Effects 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 abstract description 12
- 238000007689 inspection Methods 0.000 description 41
- 238000005286 illumination Methods 0.000 description 26
- 238000000034 method Methods 0.000 description 21
- 230000006870 function Effects 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
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- 230000008859 change Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
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- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
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- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2504—Calibration devices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/04—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/50—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images the image being built up from image elements distributed over a 3D volume, e.g. voxels
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Abstract
Description
本技術是關於測定測定對象物的三次元形狀的三次元測定裝置等技術。 This technique relates to a technique such as a three-dimensional measuring device that measures the three-dimensional shape of an object to be measured.
自以往以來,有一種使用光度立體攝影法(Photometric Stereo)的三次元形狀的測定方法。在光度立體攝影法中,首先,藉由光的照射方向不同的3個以上的照明,對測定對象物輪流照射光,在每次切換照明時,即藉由攝像部對測定對象物進行攝像。接著,根據藉由攝像部所得的3枚以上的圖像,取得測定對象物的表面的各點中的法線方向作為法線圖。 Since the past, there has been a method of measuring the three-dimensional shape using Photometric Stereo. In the photometric stereography method, first, three or more illuminations having different light irradiation directions are used to illuminate the measurement target in turn, and the imaging target is imaged by the imaging unit each time the illumination is switched. Then, based on three or more images obtained by the imaging unit, the normal direction in each point on the surface of the object to be measured is acquired as a normal map.
藉此,可三次元地測定測定對象物。其中,若存在照射方向不同的光被照射在測定對象物而被攝像到的3枚以上的圖像,即可使用光度立體攝影法來測定測定對象物的三次元形狀。 Thereby, the object to be measured can be measured in three dimensions. In the case where there are three or more images in which light having different irradiation directions is irradiated onto the object to be measured, the three-dimensional shape of the object to be measured can be measured by photometric stereography.
在專利文獻1中是揭示一種使用光度立體攝影法,來檢査被印刷焊材的基板、或裝載有電子零件的基板的外觀的外觀檢査裝置。 Patent Document 1 discloses an appearance inspection device that inspects the appearance of a substrate on which a solder material is printed or a substrate on which an electronic component is mounted, using a photometric stereography method.
【專利文獻1】日本特開2010-237034號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-237034
一般而言,適用光度立體攝影法時,以測定對象物的測定面進行擴散反射(朗伯反射(Lambertian reflectance))、及形狀變化呈線型作為條件。測定面的形態離該條件愈遠,藉由光度立體攝影法所致之測定資料的誤差愈大。 In general, when the photometric stereography method is applied, diffusion reflection (Lambertian reflectance) and shape change are linear in the measurement surface of the measurement object. The further the shape of the measurement surface is from the condition, the greater the error of the measurement data by the photometric stereography.
本技術之目的在提供一種可使採用光度立體攝影法的測定精度提升的三次元測定裝置等。 The object of the present technology is to provide a three-dimensional measuring device or the like which can improve the measurement accuracy by photometric stereography.
為達成上述目的,本技術之三次元測定裝置是具備有:高度測定部、三次元形狀測定部、及補正部。 In order to achieve the above object, the three-dimensional measuring device of the present invention includes a height measuring unit, a three-dimensional shape measuring unit, and a correcting unit.
前述高度測定部是構成為:測定測定對象物的預定位置的高度、或高度位移。 The height measuring unit is configured to measure a height or a height displacement of a predetermined position of the object to be measured.
前述三次元形狀測定部是構成為:藉由光度立體攝影法,來測定前述測定對象物的三次元形狀。 The ternary shape measuring unit is configured to measure the three-dimensional shape of the object to be measured by photometric stereography.
前述補正部是構成為:根據在前述高度測定部所得的資料,補正在前述三次元形狀測定部所得的資料。 The correction unit is configured to supplement the data obtained by the three-dimensional shape measuring unit based on the data obtained by the height measuring unit.
該三次元測定裝置是根據在前述高度測定部所得的高精度的資料,來補正在藉由光度立體攝影法所為之 測定所得的資料,因此可使採用光度立體攝影法的測定精度提升。 The three-dimensional measuring device is based on the high-precision data obtained by the height measuring unit, and is supplemented by photometric stereography. By measuring the obtained data, the measurement accuracy by the photometric stereography method can be improved.
前述三次元形狀測定部亦可包含光度立體攝影圖像取得部,該光度立體攝影圖像取得部是構成為:以攝像元件對包含藉由3個以上的光源而被分別個別地照射到光的測定對象物的區域進行攝影,藉此取得3個以上的圖像。藉此,可進行藉由光度立體攝影法所為之三次元形狀的測定。 The three-dimensional shape measuring unit may include a photometric stereoscopic image acquiring unit that is configured to individually illuminate the light by three or more light sources. The area of the object to be measured is photographed, thereby obtaining three or more images. Thereby, the measurement of the three-dimensional shape by the photometric stereography can be performed.
前述三次元測定裝置亦可更具備有圖像處理部。 The three-dimensional measuring device may further include an image processing unit.
前述圖像取得部亦可構成為:以前述攝像元件對包含藉由前述3個以上的光源進行之照射方向之光所照射到的前述測定對象物進行攝影,藉此取得包含前述測定對象物的圖像。 The image acquisition unit may be configured to image the measurement target object that is irradiated with the light in the irradiation direction by the three or more light sources, and acquire the measurement target object. image.
前述圖像處理部亦可構成為:擷取包含在前述圖像取得部所得之前述測定對象物的圖像內的複數個區域。圖像處理部是藉由將包含測定對象物的圖像區分為複數個區域,可進行根據該等區域之藉由高度測定部及/或三次元形狀測定部所為之測定,可提高測定精度。 The image processing unit may be configured to capture a plurality of regions included in an image of the measurement target obtained by the image acquisition unit. The image processing unit can measure the image including the object to be measured into a plurality of regions, and can measure the height of the region by the height measuring unit and/or the three-dimensional shape measuring unit, thereby improving the measurement accuracy.
前述高度測定部亦可沿著橫穿在前述圖像處理部所得的前述複數個區域的線,測定前述測定對象物的高度。其中,若有2點以上作為測定點,即可構成線段,若有3點以上作為測定點,則可構成面,因此可更加提高精度。 The height measuring unit may measure the height of the object to be measured along a line that traverses the plurality of regions obtained by the image processing unit. However, if there are two or more points as measurement points, a line segment can be formed, and if there are three or more points as measurement points, the surface can be formed, so that the accuracy can be further improved.
前述三次元形狀測定部亦可按每個藉由前述圖 像處理部所擷取的每個區域,測定前述三次元形狀。 The three-dimensional shape measuring unit may also be each of the above figures The three-dimensional shape is measured for each region captured by the processing unit.
前述補正部亦可根據在前述高度測定部所得的資料、與在前述三次元形狀測定部所得的資料的差,對在前述三次元形狀測定部所得的資料進行補正。藉此,補正部是可求出在前述高度測定部所得的資料、與在前述三次元形狀測定部所得的資料的誤差,根據該誤差來進行補正。 The correction unit may correct the data obtained by the three-dimensional shape measuring unit based on the difference between the data obtained by the height measuring unit and the data obtained by the three-dimensional shape measuring unit. Thereby, the correction unit obtains an error between the data obtained in the height measuring unit and the data obtained in the three-dimensional shape measuring unit, and corrects the error based on the error.
前述補正部亦可由在前述三次元形狀測定部所得的資料,將前述差的部分去除。 The correction unit may also remove the difference portion from the data obtained in the third-dimensional shape measuring unit.
前述高度測定部亦可具有位移計。藉由使用位移計,藉由高度測定部所致之測定精度會提升。 The height measuring unit may have a displacement meter. By using a displacement meter, the measurement accuracy by the height measuring unit is improved.
本技術之其他形態之三次元測定裝置是具備有:3個以上的光源、攝像元件、高度測定部、三次元形狀測定部、及補正部。 The three-dimensional measuring apparatus according to another aspect of the present invention includes three or more light sources, an imaging element, a height measuring unit, a three-dimensional shape measuring unit, and a correction unit.
接著,前述攝像元件是可對測定對象物進行攝影。 Next, the imaging element can capture an object to be measured.
接著,前述高度測定部是構成為:用以測定前述測定對象物的預定位置的高度、或高度位移。 Next, the height measuring unit is configured to measure a height or a height displacement of a predetermined position of the object to be measured.
接著,前述三次元形狀測定部是構成為:使用前述3個以上的光源及前述攝像元件,藉由光度立體攝影法,測定前述測定對象物的三次元形狀。接著,前述補正部是構成為:根據在前述高度測定部所得的資料,將在前述三次元形狀測定部所得的資料進行補正。 Next, the ternary shape measuring unit is configured to measure the three-dimensional shape of the object to be measured by photometric stereography using the three or more light sources and the imaging element. Next, the correction unit is configured to correct the data obtained by the three-dimensional shape measuring unit based on the data obtained by the height measuring unit.
前述三次元測定裝置亦可更具備有:保持部,其是保持作為前述測定對象物的基板;支持部,其是被配置 在前述保持部上,且一體地支持前述攝像元件及前述3個以上的光源;及移動機構,其是使前述保持部及前述支持部作相對移動。 Further, the three-dimensional measuring device may further include: a holding portion that holds a substrate as the object to be measured; and a support portion that is configured The image pickup device and the three or more light sources are integrally supported by the holding portion, and a moving mechanism that relatively moves the holding portion and the support portion.
本技術之三次元測定方法是包含測定測定對象物的預定位置的高度、或高度位移。 The three-dimensional measurement method of the present technique includes measuring the height of the predetermined position of the object to be measured, or the height displacement.
接著,藉由光度立體攝影法,測定前述測定對象物的三次元形狀。 Next, the three-dimensional shape of the object to be measured is measured by photometric stereography.
接著,根據在前述高度或高度位移測定所得的資料,對在前述三次元形狀的測定所得的資料進行補正。 Next, the data obtained by the measurement of the above-described three-dimensional shape is corrected based on the data obtained by the height or height displacement measurement.
本技術之用以進行三次元測定的程式是使三次元測定裝置執行以下各步驟。該等步驟是測定測定對象物的預定位置的高度、或高度位移的步驟;藉由光度立體攝影法,測定前述測定對象物的三次元形狀的步驟;及根據在前述高度或高度位移測定所得的資料,對在前述三次元形狀的測定所得的資料進行補正的步驟。 The program for performing the three-dimensional measurement in the present technique is such that the three-dimensional measuring device performs the following steps. The steps of measuring the height or the height displacement of the predetermined position of the object to be measured, the step of measuring the three-dimensional shape of the object to be measured by photometric stereography, and the measurement based on the height or height displacement The data is a step of correcting the data obtained by measuring the aforementioned three-dimensional shape.
本技術之基板之製造方法是包含在基板上,安裝零件或形成焊材。 The manufacturing method of the substrate of the present technology is included on a substrate, mounting a part or forming a solder material.
測定前述基板上的前述零件或前述焊材的預定位置的高度、或高度位移。 The height or the height displacement of the predetermined position of the aforementioned part or the aforementioned welding material on the substrate is measured.
接著,藉由光度立體攝影法,測定前述零件或焊材的三次元形狀。 Next, the three-dimensional shape of the aforementioned part or the consumable is measured by photometric stereography.
接著,根據在前述高度或高度位移測定所得的資料,對在前述三次元形狀的測定所得的資料進行補正。 Next, the data obtained by the measurement of the above-described three-dimensional shape is corrected based on the data obtained by the height or height displacement measurement.
以上,藉由本技術,可使採用光度立體攝影法的測定精度提升。 As described above, with the present technology, the measurement accuracy by the photometric stereography method can be improved.
其中,在此記載的效果必非受到限定者,亦可為在本揭示中所記載之任何效果。 However, the effects described herein are not limited, and may be any effects described in the present disclosure.
1‧‧‧基板 1‧‧‧Substrate
3‧‧‧對準標記 3‧‧‧ alignment mark
10‧‧‧搬送部 10‧‧‧Transportation Department
11‧‧‧導件 11‧‧‧ Guides
12‧‧‧腳部 12‧‧‧ feet
13‧‧‧輸送帶 13‧‧‧Conveyor belt
15‧‧‧控制部 15‧‧‧Control Department
16‧‧‧圖像處理部 16‧‧‧Image Processing Department
17‧‧‧圖像記憶部 17‧‧‧Image Memory Department
20‧‧‧備用部 20‧‧‧ spare parts
21‧‧‧備用板 21‧‧‧ spare board
22‧‧‧支持銷 22‧‧‧Support pins
30‧‧‧攝像單元 30‧‧‧ camera unit
31‧‧‧攝像元件 31‧‧‧Photographic components
32‧‧‧照明部 32‧‧‧Lighting Department
32a‧‧‧圓頂構件 32a‧‧‧Dome components
32b‧‧‧照明 32b‧‧‧Lighting
33‧‧‧雷射位移計 33‧‧‧ Laser Displacement Meter
40‧‧‧移動機構 40‧‧‧Mobile agencies
100‧‧‧檢査裝置 100‧‧‧Inspection device
PA‧‧‧攝影區域 PA‧‧‧Photography area
P1‧‧‧安裝面 P1‧‧‧ mounting surface
P2‧‧‧電子零件 P2‧‧‧Electronic parts
圖1是顯示適用本技術之三次元測定裝置的檢査裝置的斜視圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing an inspection apparatus to which a three-dimensional measuring apparatus of the present technology is applied.
圖2是以安裝基板的搬送方向觀看圖1所示之檢査裝置的圖。 Fig. 2 is a view of the inspection apparatus shown in Fig. 1 as seen in the transport direction of the mounting substrate.
圖3是以Z方向觀看的攝像單元的概略圖。 Fig. 3 is a schematic view of an image pickup unit viewed in the Z direction.
圖4是以功能顯示檢査裝置的電性構成的區塊圖。 Fig. 4 is a block diagram showing the electrical configuration of the function display inspection device.
圖5是顯示藉由檢査裝置所為之動作的流程圖。 Fig. 5 is a flow chart showing the operation of the inspection device.
圖6是顯示藉由攝像元件所得之攝影區域之例。 Fig. 6 is a view showing an example of a photographing area obtained by an image pickup element.
圖7是用以說明藉由步驟106所被擷取的圖像內的區域的分類的圖。 FIG. 7 is a diagram for explaining classification of regions within an image captured by step 106.
圖8是顯示測定對象物的測定面與空間的座標系的關係。 Fig. 8 is a view showing the relationship between the measurement surface of the measurement target and the coordinate system of the space.
圖9是顯示利用藉由光度立體攝影法所被計算的梯度場的資料所得之曲線。 Fig. 9 is a graph showing data obtained by using the gradient field data calculated by photometric stereography.
圖10是顯示藉由補正後的梯度場的資料所得之曲線。 Fig. 10 is a graph showing data obtained by correcting the gradient field.
以下一邊參照圖示,一邊說明本技術之實施形態。 Hereinafter, embodiments of the present technology will be described with reference to the drawings.
1.適用三次元測定裝置的檢査裝置的構成 1. Composition of an inspection device suitable for a three-dimensional measuring device
1)檢査裝置的構成 1) Composition of the inspection device
圖1是顯示適用本技術之三次元測定裝置的檢査裝置的斜視圖。圖2是以安裝基板的搬送方向觀看圖1所示之檢査裝置100的圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing an inspection apparatus to which a three-dimensional measuring apparatus of the present technology is applied. 2 is a view of the inspection apparatus 100 shown in FIG. 1 in a conveyance direction of the mounting substrate.
該檢査裝置100是例如藉由安裝機而在安裝基板等基板安裝電子零件之後,檢查基板上的電子零件的安裝狀態的裝置。 The inspection apparatus 100 is a device that inspects the mounting state of electronic components on the substrate after mounting electronic components on a substrate such as a mounting substrate by a mounting machine.
檢査裝置100是具有沿著搬送方向(X方向)搬送基板1,使所被搬送的基板1停止在預定位置的搬送部10。檢査裝置100是具有由下方支持被停止在停止目標位置的基板1的備用部20。 The inspection apparatus 100 is a conveyance unit 10 that conveys the substrate 1 in the conveyance direction (X direction) and stops the conveyed substrate 1 at a predetermined position. The inspection device 100 is a spare portion 20 having a substrate 1 that is stopped at a stop target position by a lower support.
檢査裝置100是具有:攝像單元30、及使攝像單元30朝X及Y方向移動的移動機構40,該攝像單元30是具有:對被支持在備用部20的基板1照射光的照明部32、及對被照射到光的基板1進行攝影的攝像元件31。 The inspection apparatus 100 includes an imaging unit 30 and a movement mechanism 40 that moves the imaging unit 30 in the X and Y directions, and the imaging unit 30 has an illumination unit 32 that emits light to the substrate 1 supported by the spare unit 20, And an imaging element 31 that images the substrate 1 that is irradiated with light.
成為藉由檢査裝置100所得之檢査對象的基板1係具有例如在平面視下呈矩形的形狀。在基板1上是設有複數個對準標記3(參照圖1)。在圖1中是顯示對準標記3被設在基板1之對角線上的角部近傍之情形之一例。 The substrate 1 to be inspected by the inspection device 100 has a rectangular shape, for example, in plan view. A plurality of alignment marks 3 are provided on the substrate 1 (refer to FIG. 1). In Fig. 1, an example of a case where the alignment mark 3 is provided on the diagonal line on the diagonal line of the substrate 1 is shown.
搬送部10是具有:由兩側夾持基板1而將基板1沿著搬送方向進行導引的2個導件11。各導件11是具有朝基板1的搬送方向呈長形的形狀的板狀構件。在各導件11的下側是分別設有由下方支持導件11的複數個腳部12。各導件 11是透過該腳部12而被安裝在檢査裝置100的基台(未圖示)上。 The conveyance unit 10 has two guides 11 that sandwich the substrate 1 from both sides and guide the substrate 1 in the conveyance direction. Each of the guides 11 is a plate-like member having a shape elongated toward the conveying direction of the substrate 1. On the lower side of each of the guide members 11, a plurality of leg portions 12 each having a lower support guide 11 are provided. Guides 11 is attached to a base (not shown) of the inspection apparatus 100 through the leg portion 12.
備用部20是具有:構成為可升降的備用板21、及被立設在該備用板21上的複數個支持銷22。 The spare portion 20 has a spare plate 21 configured to be movable up and down, and a plurality of support pins 22 that are erected on the standby plate 21.
在各導件11的內側的側面是分別設有可正反旋轉的輸送帶13。搬送部10是可藉由該輸送帶13的驅動,將基板1搬送至進行檢査處理的預定位置(配置備用部20的位置),或搬出已結束檢査的基板1。 On the inner side of each of the guide members 11, a conveyor belt 13 that can be rotated forward and backward is provided. The conveyance unit 10 is configured to convey the substrate 1 to a predetermined position (a position at which the spare portion 20 is disposed) by which the inspection is performed by the conveyance of the conveyance belt 13, or to carry out the inspection of the substrate 1 that has finished the inspection.
各導件11是以上端部朝向內側被折曲的方式形成。導件11的上端部是當藉由備用部20,基板1被移動至上方時,將基板1抵接於上側,藉此可利用該上端部及備用部20來夾持基板1的兩側。藉此,基板1被保持,在被保持的狀態下,進行藉由攝像單元30所為之檢査處理。此時,搬送部10或備用部20是作為保持基板的「保持部」來發揮功能。 Each of the guides 11 is formed such that the upper end portion is bent toward the inner side. The upper end portion of the guide 11 is such that when the substrate 1 is moved upward by the spare portion 20, the substrate 1 is brought into contact with the upper side, whereby the upper end portion and the spare portion 20 can be used to sandwich both sides of the substrate 1. Thereby, the substrate 1 is held, and in the state of being held, the inspection process by the imaging unit 30 is performed. At this time, the transport unit 10 or the spare unit 20 functions as a “holding unit” that holds the substrate.
圖3是以Z方向觀看的攝像單元30的概略圖。攝像單元30的照明部32是具有:在其頂部形成有開口的圓頂形狀的圓頂構件32a、及被配置在圓頂構件32a的內側的3個以上的照明(光源)32b。1個照明32b是例如藉由1個或複數個LED(Light Emitting Diode,發光二極體)所構成。照明32b是設有例如8個,被配置在以攝像單元30的主光軸(Z方向)為中心的圓周上。該等照明32b是例如以等角度間隔設置。 FIG. 3 is a schematic view of the imaging unit 30 viewed in the Z direction. The illumination unit 32 of the imaging unit 30 has a dome-shaped dome member 32a having an opening formed at the top thereof, and three or more illuminations (light sources) 32b disposed inside the dome member 32a. The one illumination 32b is composed of, for example, one or a plurality of LEDs (Light Emitting Diodes). The illumination 32b is provided, for example, at eight, and is disposed on a circumference centering on the main optical axis (Z direction) of the imaging unit 30. The illuminations 32b are for example arranged at equal angular intervals.
圓頂構件32a是作為一體地支持攝像元件31及複數個照明32b的「支持部」來發揮功能。 The dome member 32a functions as a "support portion" that integrally supports the imaging element 31 and the plurality of illuminations 32b.
攝像元件31是在照明部32的圓頂構件32a的上側,被固定在被設在圓頂構件32a的開口的位置,以其主光軸相對於基板1的檢査面呈垂直的方式作配置。攝像元件31是具有:CCD感測器(CCD:Charge Coupled Device,電荷耦合元件)、或CMOS感測器(CMOS:Complementary Metal Oxide Semiconductor,互補金屬氧化半導體)等攝像元件、及成像透鏡等光學系。 The imaging element 31 is fixed to the opening of the dome member 32a at the upper side of the dome member 32a of the illumination unit 32, and is disposed such that its main optical axis is perpendicular to the inspection surface of the substrate 1. The imaging element 31 includes an imaging element such as a CCD sensor (Charge Coupled Device) or a CMOS sensor (CMOS: Complementary Metal Oxide Semiconductor), and an optical system such as an imaging lens. .
攝像元件31是按照後述控制部15的控制,對基板1上的對準標記3進行攝像,或對基板1的檢査面進行攝像。攝像元件31的攝影區域是被形成為例如35mm×35mm左右。當藉由攝像元件31對基板1的檢査面進行攝像時,攝像元件31是藉由移動機構40而朝X及Y軸方向移動,將必須進行檢査的基板1上的區域分為複數個次進行攝像。此外,攝像元件31是如後所述,被利用在後述測定對象物的三次元測定時。 The imaging element 31 captures the alignment mark 3 on the substrate 1 or captures the inspection surface of the substrate 1 under the control of the control unit 15 which will be described later. The imaging area of the imaging element 31 is formed to be, for example, about 35 mm × 35 mm. When the imaging surface of the substrate 1 is imaged by the imaging device 31, the imaging element 31 is moved in the X and Y-axis directions by the moving mechanism 40, and the area on the substrate 1 that must be inspected is divided into plural times. Camera. In addition, the imaging element 31 is used in the three-dimensional measurement of the object to be measured, which will be described later, as will be described later.
在圖示之例中是顯示攝像單元30的數量為1個的情形,惟攝像單元30的數量亦可為2以上。 In the illustrated example, the number of the imaging units 30 is one, but the number of the imaging units 30 may be two or more.
檢査裝置100是具備有以可與攝像單元30一體地移動的方式而設置的雷射位移計33。例如雷射位移計33是被安裝在攝像元件31的側部。雷射位移計33是對作為基板1上的測定對象物的電子零件的預定位置中的高度、或高度位移進行測定。 The inspection apparatus 100 is provided with a laser displacement meter 33 that is provided to be movable integrally with the imaging unit 30. For example, the laser displacement meter 33 is mounted on the side of the image pickup element 31. The laser displacement meter 33 measures the height or height displacement in a predetermined position of the electronic component as the measurement target on the substrate 1.
2)檢査裝置的電性構成 2) The electrical composition of the inspection device
圖4是以功能顯示檢査裝置100的電性構成的區塊圖。 FIG. 4 is a block diagram showing the electrical configuration of the function display inspection apparatus 100.
檢査裝置100是具備有:控制部15、圖像處理部16、圖像記憶部17。此外,檢査裝置100是具備有:上述移動機構40、雷射位移計33、攝像元件31、及照明部32。 The inspection apparatus 100 includes a control unit 15, an image processing unit 16, and an image storage unit 17. Further, the inspection apparatus 100 includes the above-described moving mechanism 40, a laser displacement gauge 33, an image sensor 31, and an illumination unit 32.
圖像處理部16是按照藉由控制部15所為之控制,對在攝像元件31所得之基板1上的圖像進行處理。圖像記憶部17是記憶藉由圖像處理部16所被處理的圖像資料。 The image processing unit 16 processes the image on the substrate 1 obtained by the image sensor 31 in accordance with the control of the control unit 15. The image storage unit 17 stores image data processed by the image processing unit 16.
控制部15是至少具備有:例如CPU(Central Processing Unit,中央處理單元)及RAM(Random Access Memory,隨機存取記憶體)、ROM(Read Only Memory,唯讀記憶體)等電腦所使用的硬體要素。控制部15亦可藉由FPGA(Field Programmable Gate Array,現場可程式化邏輯閘陣列)等PLD(Programmable Logic Device,可程式化邏輯元件)、其他ASIC(Application Specific Integrated Circuit,特定應用積體電路)等元件來實現。 The control unit 15 is provided with at least a hard computer such as a CPU (Central Processing Unit), a RAM (Random Access Memory), and a ROM (Read Only Memory). Body element. The control unit 15 may be a PLD (Programmable Logic Device) such as an FPGA (Field Programmable Gate Array) or another ASIC (Application Specific Integrated Circuit). And other components to achieve.
控制部15是可將複數個照明32b個別地進行ON及OFF。控制部15是可例如將至少1個照明32b進行亮燈,亦可將8個全部照明32b同時亮燈。 The control unit 15 can individually turn ON and OFF the plurality of illuminations 32b. The control unit 15 can, for example, illuminate at least one of the illuminations 32b, or can simultaneously illuminate all of the eight illuminations 32b.
2.檢査裝置的動作 2. Check the action of the device
圖5是顯示屬於基板之製造方法的一部分之藉由檢査裝置100所為之動作的流程圖。 FIG. 5 is a flow chart showing the operation of the inspection apparatus 100 as part of the manufacturing method of the substrate.
控制部15是使攝像單元30移動至藉由搬送部10所被搬入的基板1上,藉由攝像元件31,對基板1上的對準標記進行攝影。藉此,基板1及攝像單元30被相對進行定位(步驟101)。藉此,決定在檢査裝置100的系統內被統一的座 標系。 The control unit 15 moves the imaging unit 30 onto the substrate 1 carried by the transport unit 10, and images the alignment marks on the substrate 1 by the imaging element 31. Thereby, the substrate 1 and the imaging unit 30 are relatively positioned (step 101). Thereby, it is decided to be unified in the system of the inspection apparatus 100. Standard system.
控制部15是使照明32b1個1個地個別亮燈,使用位於一定位置的攝像元件31,在每次進行該亮燈的切換時,即對基板1上的預定區域進行攝影(步驟102)。 The control unit 15 individually lights the illuminations 32b one by one, and uses the imaging element 31 located at a predetermined position to photograph a predetermined area on the substrate 1 every time the lighting is switched (step 102).
預定區域(攝影區域PA)是如圖6所示,指被安裝在基板1的安裝面P1上之包含成為測定對象的例如1以上的電子零件P2的區域。 As shown in FIG. 6, the predetermined area (photographing area PA) is an area including, for example, one or more electronic parts P2 to be measured, which is mounted on the mounting surface P1 of the substrate 1.
若存在複數個成為測定對象的電子零件時,亦會有因應此而攝影區域PA成為複數個的情形。或者,攝像元件31是可將包含複數個電子零件P2的1個區域作為1個攝影區域PA進行攝影,亦可將基板1的全體作為1個攝影區域PA進行攝影。亦即,藉由成為測定對象的電子零件的數量、大小、配置、攝像元件31所具有的視角或解析度,可適當設定攝影區域PA。 When there are a plurality of electronic components to be measured, there are cases in which the imaging area PA is plural. Alternatively, the imaging element 31 may image one area including a plurality of electronic parts P2 as one imaging area PA, or may photograph the entire substrate 1 as one imaging area PA. In other words, the imaging area PA can be appropriately set by the number, size, arrangement of the electronic components to be measured, and the angle of view or resolution of the imaging element 31.
藉由步驟102,控制部15是取得藉由8個不同方向的光所致之測定對象物的8個攝影區域PA的圖像(步驟103)。為方便說明起見,以下是將該等複數個圖像設為「圖像A」。該等複數個(8個)圖像是被利用在供藉由光度立體攝影法所為之三次元形狀測定之用的計算。此時,控制部15是作為「光度立體攝影圖像取得部」來發揮功能。 In step 102, the control unit 15 acquires an image of eight imaging areas PA of the measurement target caused by light in eight different directions (step 103). For convenience of explanation, the following is to set the plurality of images as "image A". The plurality of (8) images are used for calculations for the three-dimensional shape measurement by photometric stereography. At this time, the control unit 15 functions as a "photometric stereoscopic image acquisition unit".
控制部15是將所攝影到的圖像A透過圖像處理部16而記憶在圖像記憶部17。圖像A可為彩色圖像,亦可為灰階圖像。 The control unit 15 transmits the captured image A to the image storage unit 16 through the image processing unit 16. Image A can be a color image or a grayscale image.
此外,控制部15是在使所有照明32b亮燈的狀態, 亦即將包含8個照明32b的照射方向的光照射在測定對象物的狀態下,使用攝像元件31,對測定對象物進行攝影(步驟104)。藉此,控制部15是取得包含測定對象物的攝影區域PA的1個圖像(步驟105)。此時,控制部15是作為「圖像取得部」來發揮功能。為方便說明起見,以下是將該1個圖像設為「圖像B」。 Further, the control unit 15 is in a state in which all the illuminations 32b are turned on. In the state in which the light in the irradiation direction of the eight illuminations 32b is irradiated onto the object to be measured, the imaging element 31 is used to image the object to be measured (step 104). Thereby, the control unit 15 acquires one image of the imaging area PA including the measurement target (step 105). At this time, the control unit 15 functions as an "image acquisition unit". For the sake of convenience of explanation, the following image is set to "image B".
圖像B並不一定為藉由8個所有照明32b的照射所得之圖像,亦可為在8個之中藉由例如位於以光軸為中心點的點對稱位置的預定數量的照明32b的照射所得之圖像。 The image B is not necessarily an image obtained by the illumination of the eight illuminations 32b, and may be a predetermined number of illuminations 32b among the eight by, for example, a point-symmetric position centered on the optical axis. The resulting image is illuminated.
控制部15是將所攝影到的圖像B,透過圖像處理部16而記憶在圖像記憶部17。圖像B可為彩色圖像,亦可為灰階圖像,以形成為與圖像A之該等的選擇為相同者為佳。 The control unit 15 stores the captured image B in the image storage unit 17 through the image processing unit 16. The image B may be a color image or a grayscale image, preferably formed to be the same as the selection of the image A.
控制部15是藉由圖像處理部16對圖像B進行解析。圖6是如上所述顯示預定區域PA的圖像(例如圖像B)之例。在該例中,電子零件P2是電阻等被動元件。圖像處理部16是藉由根據圖像B的像素值(亮度值)的邊緣處理等,由圖像B擷取複數個區域(步驟106)。該複數個區域是成為因位於攝影區域PA內的對象物的材質的不同而被區分的區域。亦即,因材質不同,照明光的反射率及反射方向等反射的形態會不同之故。 The control unit 15 analyzes the image B by the image processing unit 16. FIG. 6 is an example of displaying an image (for example, image B) of a predetermined area PA as described above. In this example, the electronic component P2 is a passive component such as a resistor. The image processing unit 16 extracts a plurality of regions from the image B by edge processing or the like based on the pixel values (luminance values) of the image B (step 106). The plurality of regions are regions that are distinguished by the material of the object located in the imaging region PA. That is, depending on the material, the form of reflection such as the reflectance of the illumination light and the direction of reflection may be different.
圖7是用以說明藉由步驟106所得之區域的分類的圖。區域(1)為基板1的表面(安裝面)P1、區域(2)及(4)為電子零件P2的電極部、區域(3)為電子零件P2的樹脂安裝體 部。 FIG. 7 is a diagram for explaining classification of a region obtained by step 106. The region (1) is the surface (mounting surface) P1 of the substrate 1, the regions (2) and (4) are the electrode portions of the electronic component P2, and the region (3) is the resin mounting body of the electronic component P2. unit.
接著,控制部15是藉由控制移動機構40的動作,以橫穿該等所被擷取的複數個區域(1)~(4)的方式,使被支持在攝像單元30的雷射位移計33移動。 Next, the control unit 15 controls the movement of the moving mechanism 40 to traverse the plurality of regions (1) to (4) that are captured, so that the laser displacement meter supported by the imaging unit 30 is supported. 33 moves.
控制部15是一邊將雷射位移計33如上所示進行掃描,一邊使用該雷射位移計33,測定電子零件P2離安裝面P1的高度(步驟107)。亦即,控制部15是測定該電子零件P2的高度(亦即高度位移)。此時,雷射位移計33及控制部15是作為「高度測定部」來發揮功能。 The control unit 15 measures the height of the electronic component P2 from the mounting surface P1 by using the laser displacement meter 33 while scanning the laser displacement meter 33 as described above (step 107). That is, the control unit 15 measures the height (i.e., height displacement) of the electronic component P2. At this time, the laser displacement meter 33 and the control unit 15 function as a "height measuring unit".
圖8是顯示測定對象物的測定面R與空間的座標系的關係。控制部15是按每個在步驟106中所擷取的區域,使用光度立體攝影法,生成每個該等區域的梯度場C(p,q)(步驟108)。p=δ z/δ x、q=δ z/δ y。此時,至少控制部15是作為「三次元形狀測定部」來發揮功能。 FIG. 8 is a view showing the relationship between the measurement surface R of the measurement target and the coordinate system of the space. The control unit 15 generates a gradient field C(p, q) for each of the regions using the photometric stereography for each region captured in step 106 (step 108). p = δ z / δ x, q = δ z / δ y. At this time, at least the control unit 15 functions as a "three-dimensional shape measuring unit".
具體而言,控制部15是使用已知的各照明32b的相對位置及藉由已知的各照明32b所得之照射方向,根據所被擷取的各區域(1)~(4)內的亮度值等,按每個該等區域,計算p=δ z/δ x、q=δ z/δ y。測定點是在例如圖7所示之線段上,按每個區域形成為至少1個點(像素)。 Specifically, the control unit 15 uses the known relative positions of the respective illuminations 32b and the illumination directions obtained by the known illuminations 32b, based on the brightness in each of the extracted regions (1) to (4). Values, etc., for each of these regions, calculate p = δ z / δ x, q = δ z / δ y. The measurement point is formed on at least one dot (pixel) for each region, for example, on the line segment shown in FIG.
在步驟108中所得之梯度場p、q的資料表示包含安裝面P1的電子零件P2的形狀。圖9是顯示根據該梯度場p、q的資料的曲線。該曲線形狀具有與各區域(1)~(4)相對應的形狀。 The data of the gradient fields p, q obtained in step 108 represents the shape of the electronic component P2 including the mounting surface P1. Fig. 9 is a graph showing data according to the gradient fields p, q. The curved shape has a shape corresponding to each of the regions (1) to (4).
接著,控制部15是根據以雷射位移計33所得的資 料,對梯度場p、q進行補正(步驟109)。此時,控制部15是作為「補正部」來發揮功能。將取得按每個區域所被分斷的圖7所示之線上之以雷射位移計33所得的測定資料(pm、qm)、與和該等相對應的梯度場(p、q)的差(誤差)者的集合,分別作為(ep、eq)(參照下式)。n為測定次數,亦即測定點的數量。 Next, the control unit 15 is based on the information obtained by the laser displacement meter 33. The gradient fields p and q are corrected (step 109). At this time, the control unit 15 functions as a "correction unit". The difference between the measurement data (pm, qm) obtained by the laser displacement meter 33 on the line shown in Fig. 7 which is divided for each region, and the gradient field (p, q) corresponding to the above will be obtained. The set of (error) is taken as (ep, eq) (see the following formula). n is the number of measurements, that is, the number of measurement points.
【數1】ep 1..n=p(x 1..n,y 1..n)-pm(x 1..n,y 1..n) eq 1..n=q(x 1..n,y 1..n)-qm(x 1..n,y 1..n) [ Equation 1] ep 1..n = p ( x 1..n , y 1..n )- pm ( x 1..n , y 1..n ) eq 1..n = q ( x 1. .n , y 1..n )- qm ( x 1..n , y 1..n )
將根據點列ep1..n、eq1..n所算出的近似式分別設為e(x)、e(y),控制部15是使用下式,來對梯度場C(p,q)進行補正。將所被補正的梯度場設為pf、qf。亦即,所被補正的梯度場pf、qf是表示由藉由光度立體攝影法所得之三次元形狀的測定的資料,去除上述誤差的部分的值。 The approximate expressions calculated from the point sequences ep1..n and eq1..n are e(x) and e(y), respectively, and the control unit 15 performs the gradient field C(p, q) using the following equation. Correction. The gradient fields to be corrected are set to pf and qf. In other words, the corrected gradient fields pf and qf are values indicating the portion of the error obtained by the measurement of the three-dimensional shape obtained by the photometric stereography.
【數2】p f (x,y)=p(x,y)-e(x) q f (x,y)=q(x,y)-e(y) [number 2] p f ( x , y ) = p ( x , y ) - e ( x ) q f ( x , y ) = q ( x , y ) - e ( y )
用以求出上述近似式e(x)、e(y)的近似方法並未特別限定,但是可適用例如平均法、雙線性法、或n次近似(例如2次近似)等。 The approximation method for obtaining the approximate expressions e(x) and e(y) is not particularly limited, but for example, an averaging method, a bilinear method, or an n-time approximation (for example, a second approximation) can be applied.
所被補正的梯度場pf、qf是例如圖10所示,與圖9所示者相比,顯示其高度資訊被補正的曲線。 The corrected gradient fields pf and qf are, for example, as shown in FIG. 10, and a curve whose height information is corrected is displayed as compared with the case shown in FIG.
3.結論 3. Conclusion
本實施形態之檢査裝置100是根據以雷射位移計33所得的高精度資料,對在藉由光度立體攝影法所為之測定所得的資料進行補正,因此可使採用光度立體攝影法的測定精度提升。 The inspection apparatus 100 according to the present embodiment corrects the data obtained by the photometric stereography based on the high-precision data obtained by the laser displacement meter 33, thereby improving the measurement accuracy by the photometric stereography. .
尤其,包含不同的複數種材質的區域是分別具有不同的反射率,因此若適用光度立體攝影法,並無法取得高精度的三次元形狀的資料。但是,藉由使用以雷射位移計33所得的高精度資料,即使測定對象物具有不同的複數種材質,亦可提高藉由光度立體攝影法所得之測定資料的精度。 In particular, regions including a plurality of different materials have different reflectances. Therefore, if a photometric stereography method is applied, a highly accurate three-dimensional shape data cannot be obtained. However, by using the high-precision data obtained by the laser displacement meter 33, the accuracy of the measurement data obtained by the photometric stereography method can be improved even if the measurement object has a different plurality of materials.
例如,與使用1次元雷射位移計,在2次元區域全體內對其進行掃描,藉此測定三次元形狀的方法相比,藉由本實施形態之三次元測定,可高速測定三次元形狀。此外,由於亦不需要使用2次元雷射位移計等昂貴的測定器,因此可廉價地進行三次元形狀的測定。 For example, the three-dimensional shape can be measured at a high speed by the three-dimensional measurement of the present embodiment, compared with the method of measuring the three-dimensional shape by scanning the entire three-dimensional region using a one-dimensional laser displacement meter. Further, since it is not necessary to use an expensive measuring device such as a two-dimensional laser displacement meter, the measurement of the three-dimensional shape can be performed at low cost.
藉由將本技術的三次元測定的方法適用在檢査裝置100,除了藉由習知之檢査裝置100所得之檢査項目以外,亦可進行藉由該三次元形狀的測定所為之檢査。因此,可以1台檢査裝置100實現多樣的檢査處理,可提高製品的可靠性。 By applying the method of the three-dimensional measurement of the present technique to the inspection apparatus 100, in addition to the inspection items obtained by the conventional inspection apparatus 100, the inspection by the measurement of the three-dimensional shape can also be performed. Therefore, it is possible to realize various inspection processes by one inspection apparatus 100, and it is possible to improve the reliability of the product.
4.其他實施形態 4. Other embodiments
本技術並非限定於以上說明的實施形態,可實現其他各種實施形態。 The present technology is not limited to the embodiments described above, and various other embodiments can be realized.
上述實施形態之檢査裝置100尤其是檢查被安裝在基板1上的電子零件的狀態者,但是亦可為例如檢査被形成在基板1上的焊材狀態者。此時,檢査焊材狀態的檢査裝置亦可使用其三次元形狀的測定的資料,來算出焊材的體積。 In particular, the inspection apparatus 100 of the above-described embodiment checks the state of the electronic component mounted on the substrate 1, but may, for example, inspect the state of the welding material formed on the substrate 1. At this time, the inspection apparatus for inspecting the state of the welding material can also calculate the volume of the welding material by using the data of the measurement of the three-dimensional shape.
以測定對象物而言,亦可非為如上所述為被動元件,可將本技術適用在亦包含主動元件的各種者。 The object to be measured may not be a passive element as described above, and the present technology can be applied to various types including the active element.
或者,三次元測定裝置亦可為具有三次元測定的單獨功能的裝置,而非為三次元測定裝置被適用在檢査裝置100。例如本技術亦可適用在醫療領域或其他產業領域中被利用的三次元測定裝置。 Alternatively, the three-dimensional measuring device may be a device having a separate function of a three-dimensional measurement, and not a three-dimensional measuring device being applied to the inspection device 100. For example, the present technology can also be applied to a three-dimensional measuring device that is utilized in the medical field or other industrial fields.
如圖7所示,掃描雷射位移計33的方向為X方向,但是亦可為包含X及Y之二方向的成分的掃描方向。藉此,可增多測定點的數量,且可提高計算的正確性。或者,亦可在1個測定對象物內,沿著複數個方向的線進行掃描。 As shown in FIG. 7, the direction in which the laser displacement gauge 33 is scanned is the X direction, but may be the scanning direction of the component including the two directions of X and Y. Thereby, the number of measurement points can be increased, and the accuracy of the calculation can be improved. Alternatively, scanning may be performed along a line in a plurality of directions in one object to be measured.
在圖6所示之例中,藉由攝像元件31所得之攝影區域PA為包含1個電子零件P2的圖像的區域。但是,例如若該攝影區域包含複數個電子零件的圖像時,控制部15亦可具有對應該複數個電子零件的相對配置、姿勢、方向等的位移計的掃描處理的演算法。藉此,可提高檢査的時間效率。 In the example shown in FIG. 6, the imaging area PA obtained by the imaging element 31 is an area including an image of one electronic component P2. However, for example, when the image capturing area includes an image of a plurality of electronic components, the control unit 15 may have a algorithm for scanning processing of a displacement meter corresponding to the relative arrangement, posture, direction, and the like of the plurality of electronic components. Thereby, the time efficiency of the inspection can be improved.
在上述實施形態中,是使用雷射位移計,但是亦可為利用光干擾的位移計、或利用超音波的位移計、接觸式位移計等。並非侷限於位移計,若有例如光切法等例如 可將至少一次元狀的光照射在測定對象物而檢測該光的反射狀態的感測器,亦可為任何機器。 In the above embodiment, a laser displacement meter is used, but a displacement meter using optical interference, a displacement meter using ultrasonic waves, a contact type displacement meter, or the like may be used. It is not limited to a displacement meter, for example, such as light cutting, etc. A sensor that can illuminate at least one element of light on the object to be measured and detect the reflected state of the light, and may be any machine.
圖5所示之步驟102(及103)、及步驟104(及105)的順序亦可為相反。 The order of steps 102 (and 103) and steps 104 (and 105) shown in FIG. 5 may also be reversed.
或者,該等步驟102及104亦可分別改變照明光的波長而同時進行。此時,例如用以取得圖像A的攝影是使用可見光,用以取得圖像B的攝影是使用紅外線,藉此可對該等同時進行攝影。此時,攝像元件是必須具備可分別檢測該等不同波長的光的影像感測器。 Alternatively, the steps 102 and 104 can also be performed simultaneously by changing the wavelength of the illumination light. At this time, for example, the image for acquiring the image A is visible light, and the image for obtaining the image B is infrared light, whereby the images can be simultaneously photographed. In this case, the image sensor must have an image sensor that can detect the light of the different wavelengths.
或者,圖像處理部16亦可藉由對在步驟102(及103)中所得的圖像A進行處理,來生成圖像B。此時,並不需要步驟104及105。 Alternatively, the image processing unit 16 may generate the image B by processing the image A obtained in the step 102 (and 103). At this time, steps 104 and 105 are not required.
上述實施形態是攝像單元為相對於被保持在搬送部10的基板進行移動的構成,但是亦可為攝像單元為固定,而保持基板的保持部為相對於攝像單元進行移動的構成。 In the above embodiment, the imaging unit is configured to move with respect to the substrate held by the transport unit 10. However, the imaging unit may be fixed, and the holding unit holding the substrate may be moved relative to the imaging unit.
在上述實施形態中,成為光源的照明32b的數量為8個,可為至少3個,亦可為9個以上。 In the above embodiment, the number of the illuminations 32b serving as the light source is eight, and may be at least three or nine or more.
在上述實施形態中,雷射位移計33被一體地支持在攝像單元30,但是亦可由檢査裝置配備使該等個別移動的機構。 In the above embodiment, the laser displacement meter 33 is integrally supported by the imaging unit 30, but the inspection device may be equipped with a mechanism for moving the individual.
在上述實施形態中,作為雷射位移計33的高度測定部是橫穿電子零件的複數個區域(1)~(4),來測定高度位移。高度測定部亦可例如按每個該等區域,以至少1點1點 的測定點來測定高度,而非侷限於如上所示之測定方法。 In the above embodiment, the height measuring unit as the laser displacement meter 33 measures the height displacement across a plurality of regions (1) to (4) of the electronic component. The height measuring unit may also have at least 1 point, for example, for each of the areas. The measurement point is used to determine the height, and is not limited to the measurement method as shown above.
在以上說明之各形態的特徵部分之中,亦可至少組合2個特徵部分。 Among the characteristic portions of the respective aspects described above, at least two feature portions may be combined.
本技術亦可採取以下所示之構成。 The present technology can also adopt the configuration shown below.
(1)一種三次元測定裝置,其是具備:高度測定部,其是構成為:測定測定對象物的預定位置的高度、或高度位移;三次元形狀測定部,其是構成為:藉由光度立體攝影法,來測定前述測定對象物的三次元形狀;及補正部,其是構成為:根據在前述高度測定部所得的資料,補正在前述三次元形狀測定部所得的資料。 (1) A three-dimensional measuring device comprising: a height measuring unit configured to measure a height or a height displacement of a predetermined position of the object to be measured; and a three-dimensional shape measuring unit configured to: by photometry The three-dimensional shape is used to measure the three-dimensional shape of the object to be measured, and the correction unit is configured to complement the data obtained by the three-dimensional shape measuring unit based on the data obtained by the height measuring unit.
(2)如(1)所記載之三次元測定裝置,其中,前述三次元形狀測定部是包含光度立體攝影圖像取得部,其是構成為:以攝像元件對包含藉由3個以上的光源而被分別個別地照射到光的測定對象物的區域進行攝影,藉此取得3個以上的圖像。 (2) The three-dimensional shape measuring unit according to the above aspect, wherein the three-dimensional shape measuring unit includes a photometric stereoscopic image acquiring unit configured to include three or more light sources by the imaging element pair. On the other hand, three or more images are acquired by photographing the regions of the measurement target that are individually irradiated with light.
(3)如(2)所記載之三次元測定裝置,其中,另外具備有:圖像取得部,其是構成為:以前述攝像元件對被照射到包含藉由前述3個以上的光源所致之照射方向的光的前述測定對象物進行攝影,藉此取得包含前述測定對象物的圖像;及圖像處理部,其是構成為:擷取包含在前述圖像取得部所得之前述測定對象物的圖像內的複數個區域。 (3) The three-dimensional measuring device according to (2), further comprising: an image acquiring unit configured to cause the pair of imaging elements to be irradiated to include three or more light sources The image to be measured of the light in the irradiation direction is imaged to obtain an image including the object to be measured, and the image processing unit is configured to: acquire the measurement target included in the image acquisition unit a plurality of regions within the image of the object.
(4)如(3)所記載之三次元測定裝置,其中,前述高度測定部是沿著橫穿在前述圖像處理部所得的前述複數個區域的線,測定前述測定對象物的高度。 (4) The three-dimensional measuring device according to the above aspect, wherein the height measuring unit measures the height of the object to be measured along a line that traverses the plurality of regions obtained by the image processing unit.
(5)如(3)或(4)所記載之三次元測定裝置,其中,前述三次元形狀測定部是按每個藉由前述圖像處理部所被擷取的每個區域,測定前述三次元形狀。 (5) The three-dimensional measuring device according to (3) or (4), wherein the three-dimensional shape measuring unit measures the third time for each of the regions captured by the image processing unit. Meta shape.
(6)如(1)至(5)中任一者所記載之三次元測定裝置,其中,前述補正部是根據在前述高度測定部所得的資料、與在前述三次元形狀測定部所得的資料的差,對在前述三次元形狀測定部所得的資料進行補正。 (3) The three-dimensional measuring device according to any one of the above-mentioned, wherein the correction unit is based on data obtained in the height measuring unit and data obtained in the third-dimensional shape measuring unit. The difference is the correction of the data obtained in the third-dimensional shape measuring unit.
(7)如(6)所記載之三次元測定裝置,其中,前述補正部是由在前述三次元形狀測定部所得的資料,將前述差的部分去除。 (7) The three-dimensional measuring apparatus according to (6), wherein the correction unit removes the difference from the data obtained by the three-dimensional shape measuring unit.
(8)如(1)至(7)中任一者所記載之三次元測定裝置,其中,前述高度測定部是具有位移計。 The three-dimensional measuring device according to any one of (1) to (7), wherein the height measuring unit has a displacement meter.
(9)一種三次元測定裝置,其是具備:3個以上的光源;攝像元件,其是可對測定對象物進行攝影;高度測定部,其是構成為:測定前述測定對象物的預定位置的高度、或高度位移;三次元形狀測定部,其是構成為:使用前述3個以上的光源及前述攝像元件,藉由光度立體攝影法,測定前述測定對象物的三次元形狀;及補正部,其是構成為:根據在前述高度測定部所得的 資料,將在前述三次元形狀測定部所得的資料進行補正。 (9) A three-dimensional measuring apparatus comprising: three or more light sources; an imaging element that can image an object to be measured; and a height measuring unit that measures a predetermined position of the object to be measured a three-dimensional shape measuring unit configured to measure a three-dimensional shape of the object to be measured by photometric stereography using the three or more light sources and the imaging element; and a correction unit, It is configured to be obtained from the height measuring unit. The data is corrected in the data obtained by the aforementioned three-dimensional shape measuring unit.
(10)如(9)所記載之三次元測定裝置,其中,另外具備有:保持部,其是保持作為前述測定對象物的基板;支持部,其是被配置在前述保持部上,且一體地支持前述攝像元件及前述3個以上的光源;及移動機構,其是使前述保持部及前述支持部作相對移動。 (10) The three-dimensional measuring device according to (9), further comprising: a holding portion that holds the substrate as the measurement target; and a support portion that is disposed on the holding portion and integrated The image sensor and the three or more light sources are supported, and the moving mechanism is configured to relatively move the holding portion and the support portion.
(11)一種三次元測定方法,其是測定測定對象物的預定位置的高度、或高度位移,藉由光度立體攝影法,測定前述測定對象物的三次元形狀,根據在前述高度或高度位移測定所得的資料,對在前述三次元形狀的測定所得的資料進行補正。 (11) A three-dimensional measurement method for measuring a height or a height displacement of a predetermined position of an object to be measured, and measuring a three-dimensional shape of the object to be measured by photometric stereography, and measuring the height or height displacement according to the height or height The obtained data is corrected for the data obtained by the measurement of the aforementioned three-dimensional shape.
(12)一種基板之製造方法,其是在基板上,安裝零件或形成焊材,測定前述基板上的前述零件或前述焊材的預定位置的高度、或高度位移,藉由光度立體攝影法,測定前述零件或焊材的三次元形狀,根據在前述高度或高度位移測定所得的資料,對在前述三次元形狀的測定所得的資料進行補正。 (12) A method of manufacturing a substrate by mounting a component or forming a solder material on a substrate, and measuring a height or a height displacement of a predetermined position of the component or the solder material on the substrate, by photometric stereography. The three-dimensional shape of the above-mentioned part or the consumable is measured, and the data obtained by the measurement of the above-described three-dimensional shape is corrected based on the data obtained by the height or height displacement measurement.
15‧‧‧控制部 15‧‧‧Control Department
16‧‧‧圖像處理部 16‧‧‧Image Processing Department
17‧‧‧圖像記憶部 17‧‧‧Image Memory Department
31‧‧‧攝像元件 31‧‧‧Photographic components
32‧‧‧照明部 32‧‧‧Lighting Department
33‧‧‧雷射位移計 33‧‧‧ Laser Displacement Meter
40‧‧‧移動機構 40‧‧‧Mobile agencies
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP6682809B2 (en) * | 2015-11-09 | 2020-04-15 | 大日本印刷株式会社 | Inspection system and inspection method |
| JP6831478B2 (en) * | 2017-12-07 | 2021-02-24 | ヤマハ発動機株式会社 | Work device to be mounted |
| JP7118776B2 (en) * | 2018-06-29 | 2022-08-16 | キヤノン株式会社 | IMAGING DEVICE, IMAGE PROCESSING METHOD, IMAGE PROCESSING PROGRAM AND RECORDING MEDIUM |
| JP7246943B2 (en) * | 2019-01-24 | 2023-03-28 | キヤノン株式会社 | Image processing method, image processing device, image processing system, imaging device, program, and storage medium |
| WO2022113934A1 (en) * | 2020-11-26 | 2022-06-02 | 株式会社堀場製作所 | Surface roughness measuring device, and surface roughness measuring method |
| JP7642414B2 (en) * | 2021-03-19 | 2025-03-10 | Juki株式会社 | Surface inspection device and surface inspection method |
| WO2022244367A1 (en) * | 2021-05-21 | 2022-11-24 | 株式会社 レイマック | Non-contact blood vessel analyzing method |
| WO2023033627A1 (en) | 2021-09-06 | 2023-03-09 | 삼성전자 주식회사 | Optical system including dome light and coaxial light and method for designing optical system |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10267628A (en) * | 1997-01-23 | 1998-10-09 | Hitachi Ltd | Three-dimensional shape detection method and apparatus, and substrate manufacturing method |
| US7019826B2 (en) * | 2003-03-20 | 2006-03-28 | Agilent Technologies, Inc. | Optical inspection system, apparatus and method for reconstructing three-dimensional images for printed circuit board and electronics manufacturing inspection |
| WO2006100077A1 (en) * | 2005-03-24 | 2006-09-28 | OBE OHNMACHT & BAUMGäRTNER GMBH & CO. KG | Device for optically measuring shapes of objects and surfaces |
| US8233041B2 (en) * | 2005-06-17 | 2012-07-31 | Omron Corporation | Image processing device and image processing method for performing three dimensional measurements |
| JP2007114071A (en) * | 2005-10-20 | 2007-05-10 | Omron Corp | Three-dimensional shape measuring apparatus, program, computer-readable recording medium, and three-dimensional shape measuring method |
| JP5159594B2 (en) * | 2008-12-24 | 2013-03-06 | キヤノン株式会社 | Image forming apparatus |
| JP4744610B2 (en) * | 2009-01-20 | 2011-08-10 | シーケーディ株式会社 | 3D measuring device |
| JP5251678B2 (en) * | 2009-03-31 | 2013-07-31 | ソニー株式会社 | Illumination device for visual inspection and visual inspection device |
| JP5170154B2 (en) * | 2010-04-26 | 2013-03-27 | オムロン株式会社 | Shape measuring apparatus and calibration method |
| JP5482411B2 (en) * | 2010-04-30 | 2014-05-07 | ソニー株式会社 | Three-dimensional shape measuring device, inspection device, and three-dimensional shape measuring adjustment method |
| JP5721072B2 (en) * | 2011-03-31 | 2015-05-20 | Jukiオートメーションシステムズ株式会社 | Component mounting apparatus, information processing apparatus, position detection method, and board manufacturing method |
| JP2013186100A (en) * | 2012-03-12 | 2013-09-19 | Hitachi Ltd | Shape inspection method and device |
| JP6124237B2 (en) * | 2012-01-31 | 2017-05-10 | Jukiオートメーションシステムズ株式会社 | Inspection apparatus, inspection method, and substrate manufacturing method |
| JP5955574B2 (en) * | 2012-02-03 | 2016-07-20 | 株式会社東光高岳 | 3D shape measuring device |
| JP5984284B2 (en) * | 2012-02-28 | 2016-09-06 | Jukiオートメーションシステムズ株式会社 | Component mounting apparatus and board manufacturing method |
-
2013
- 2013-09-30 JP JP2013205182A patent/JP6198312B2/en active Active
-
2014
- 2014-09-19 KR KR1020140124912A patent/KR102224699B1/en active Active
- 2014-09-22 TW TW103132648A patent/TWI661176B/en active
- 2014-09-30 CN CN201410520476.8A patent/CN104515477B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN104515477B (en) | 2019-03-08 |
| KR20150037545A (en) | 2015-04-08 |
| JP6198312B2 (en) | 2017-09-20 |
| CN104515477A (en) | 2015-04-15 |
| KR102224699B1 (en) | 2021-03-05 |
| JP2015068779A (en) | 2015-04-13 |
| TWI661176B (en) | 2019-06-01 |
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