[go: up one dir, main page]

TW201432860A - Wafer type infrared emitter package - Google Patents

Wafer type infrared emitter package Download PDF

Info

Publication number
TW201432860A
TW201432860A TW102103998A TW102103998A TW201432860A TW 201432860 A TW201432860 A TW 201432860A TW 102103998 A TW102103998 A TW 102103998A TW 102103998 A TW102103998 A TW 102103998A TW 201432860 A TW201432860 A TW 201432860A
Authority
TW
Taiwan
Prior art keywords
sheet
wafer
emitter package
thin plate
central cavity
Prior art date
Application number
TW102103998A
Other languages
Chinese (zh)
Inventor
謝正雄
黃振堂
陳忠男
Original Assignee
眾智光電科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 眾智光電科技股份有限公司 filed Critical 眾智光電科技股份有限公司
Priority to TW102103998A priority Critical patent/TW201432860A/en
Priority to CN201310069392.2A priority patent/CN103972042B/en
Publication of TW201432860A publication Critical patent/TW201432860A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/146Mixed devices
    • H01L2924/1461MEMS

Landscapes

  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Resistance Heating (AREA)

Abstract

一種晶片型紅外線發射器封裝件,包含一發射器晶片及一殼體。該發射器晶片包括:一含有一矽基體的基座,具有一頂面及一延伸穿過該頂面的中央腔;一薄板,具有一周端,該周端與該中央腔的周緣是經由一環形間隙所分隔;一電阻器,形成在該薄板上,用於加熱該薄板以產生紅外線輻射;至少一細長形梁式支腳,自該薄板的周端並穿過該環形間隙延伸至該基座,以使該薄板懸浮於該中央腔之內,藉以對於自該薄板至該細長形梁式支腳的熱傳導形成一熱瓶頸;及一第一反射材料,覆蓋在該薄板的底面上。其中,該封閉的真空室具有的壓力低於0.01 torr。A wafer type infrared emitter package comprising an emitter wafer and a casing. The emitter wafer includes: a base having a base body having a top surface and a central cavity extending through the top surface; a thin plate having a one-end end, the peripheral end and the circumference of the central cavity being through a ring Separated by a gap; a resistor formed on the sheet for heating the sheet to generate infrared radiation; at least one elongated beam leg extending from the peripheral end of the sheet and through the annular gap to the base a seat for suspending the sheet within the central cavity to form a thermal bottleneck for heat transfer from the sheet to the elongated beam leg; and a first reflective material overlying the bottom surface of the sheet. Wherein the closed vacuum chamber has a pressure of less than 0.01 torr.

Description

晶片型紅外線發射器封裝件 Wafer type infrared emitter package

本發明是有關於一種晶片型紅外線發射器封裝件(chip-scale infrared emitter package),特別是指一種包含一藉由一細長形梁式支腳(slim supporting beam)懸浮於一基座(substrate)上的薄板(membrane)與一電阻器(electric resistor)之晶片型紅外線發射器封裝件。 The present invention relates to a chip-scale infrared emitter package, and more particularly to a method comprising: suspending a substrate by a slim supporting beam. A wafer type infrared emitter package with a membrane and an electric resistor.

在習知上,熾熱的發光源可用來產生紅外線輻射,並可用以進行非色散型紅外線(non-dispersive infrared,NDIR)的氣體偵測。傳統的熾熱發光源包含燈絲燈泡及晶片型紅外線發射源,其中燈絲燈泡具有較慢的熱應答速度及較高的功率消耗(約0.6 W)等缺點,因此不適用於電池供電的(battery-operated)NDIR氣體偵測。 Conventionally, a glowing source of illumination can be used to generate infrared radiation and can be used for non-dispersive infrared (NDIR) gas detection. Conventional luminescent sources include filament bulbs and wafer-type infrared emitters, which have disadvantages such as slower thermal response speed and higher power consumption (about 0.6 W), so they are not suitable for battery-operated (battery-operated) ) NDIR gas detection.

美國專利公告第7,989,821號揭示一種利用半導體製程技術製得的密封的紅外線發射源,該紅外線發射源包含一具有一中央腔(central cavity)的基座,一多晶矽(polysilicon)電導體製得的發射器薄板,及一封閉該基座及該發射器薄板的外罩(housing)。該發射器薄板具有一形成於該基座頂面的周端,藉以使該發射器薄板懸浮於該基座 上。該外罩定義一可填充惰性氣體或真空以避免氧化的封閉空間。 U.S. Patent No. 7,989,821 discloses a sealed infrared radiation source made using a semiconductor process technology, the infrared emission source comprising a pedestal having a central cavity, a polysilicon electrical conductor. a sheet, and a housing that encloses the base and the emitter sheet. The emitter sheet has a peripheral end formed on a top surface of the base, whereby the emitter sheet is suspended on the base on. The enclosure defines an enclosed space that can be filled with an inert gas or vacuum to avoid oxidation.

美國專利公開第2012/0267532號揭示一種紅外線發射源,包含一具有一中央腔的基座,一懸浮於該基座上的薄板,及一電阻加熱器(resistive heater)。類似於前述美國公告專利,該薄板具有一形成於該基座頂面的周端。 U.S. Patent Publication No. 2012/0267532 discloses an infrared radiation source comprising a susceptor having a central cavity, a thin plate suspended on the susceptor, and a resistive heater. Similar to the aforementioned U.S. patent, the sheet has a peripheral end formed on the top surface of the base.

雖然前述美國公告專利及公開專利之紅外線發射源的尺寸可被微型化(miniaturized),然而該等專利並未教示一環形間隙(loop-shaped gap)形成於該薄板的周端與該矽基材之中央腔的周緣間,用以熱隔離該薄板及該矽基材以減少該薄板的熱損失。此外,該等專利並未教示該中央腔內的壓力對於紅外線輻射源的電-光轉換效率(electro-optical efficiency,代表將電力轉換為光能的效率)具有關鍵性的影響。 Although the dimensions of the aforementioned U.S. Published Patent and Published Patent Infrared Emitters can be miniaturized, the patents do not teach that a loop-shaped gap is formed at the peripheral end of the sheet and the crucible substrate. The periphery of the central cavity is used to thermally isolate the sheet and the substrate to reduce heat loss from the sheet. Moreover, these patents do not teach that the pressure within the central cavity has a critical impact on the electro-optical efficiency of the infrared radiation source, representing the efficiency of converting electricity to light energy.

因此,本發明之目的,即在提供一種晶片型紅外線發射器封裝件,可克服上述先前技術中的缺點。 Accordingly, it is an object of the present invention to provide a wafer type infrared emitter package that overcomes the above-discussed shortcomings of the prior art.

於是本發明晶片型紅外線發射器封裝件,包含一發射器晶片(emitter chip)及一殼體(enclosure)。該發射器晶片包括:一含有一矽基體(silicon base)的基座,具有一頂面、一底面(top and bottom surfaces)及一延伸穿過該頂面的中央腔(central cavity),該頂面與該底面是在一垂直方向上相反設置;一薄板,在該垂直方向上對準於該中央腔且具有一頂面、一底面及一周端(peripheral end),該周端與該中 央腔的周緣是經由一環形間隙(loop-shaped gap)所分隔;一電阻器,形成在該薄板的頂面上,用於加熱該薄板以產生紅外線輻射;至少一細長形梁式支腳,自該薄板的周端並穿過該環形間隙延伸至該基座,以使該薄板懸浮於該中央腔之內,藉以對於自該薄板至該細長形梁式支腳的熱傳導形成一熱瓶頸(thermal bottleneck);及一第一反射材料(first reflective material),覆蓋在該薄板的底面上。該殼體包括一外罩(can housing)及一透明窗板(window plate),該外罩定義一窗口(window opening),該透明窗板是密封地覆蓋於該窗口並與該外罩共同定義一封閉的真空室(enclosed vacuum chamber),該真空室是與該中央腔流體連通,該發射器晶片是裝設在該封閉的真空室中,用於穿過該窗板發射該紅外線射線。其中,該封閉的真空室具有的壓力低於0.01 torr。 Thus, the wafer type infrared emitter package of the present invention comprises an emitter chip and an enclosure. The emitter wafer includes: a susceptor having a silicon base having a top surface and a bottom surface and a central cavity extending through the top surface, the top The surface is opposite to the bottom surface in a vertical direction; a thin plate is aligned in the vertical direction in the central cavity and has a top surface, a bottom surface and a peripheral end, the peripheral end and the middle end The periphery of the central cavity is separated by a loop-shaped gap; a resistor is formed on the top surface of the thin plate for heating the thin plate to generate infrared radiation; at least one elongated beam-shaped leg, Extending from the circumferential end of the sheet and through the annular gap to the base such that the sheet is suspended within the central cavity, thereby creating a thermal bottleneck for heat transfer from the sheet to the elongated beam foot ( Thermal bottleneck; and a first reflective material covering the bottom surface of the sheet. The housing includes a can housing and a transparent window plate, the outer cover defining a window opening that sealingly covers the window and defines a closure together with the outer cover An enclosed vacuum chamber in fluid communication with the central chamber, the emitter wafer being mounted in the enclosed vacuum chamber for emitting the infrared radiation through the window panel. Wherein the closed vacuum chamber has a pressure of less than 0.01 torr.

本發明之功效在於:本發明晶片型紅外線發射器封裝件可顯著地減少該薄板的總熱損失,能有效率地提供均勻的紅外線輻射。 The effect of the present invention is that the wafer type infrared emitter package of the present invention can significantly reduce the total heat loss of the sheet and can efficiently provide uniform infrared radiation.

100‧‧‧晶片型紅外線發射器封裝件 100‧‧‧ wafer type infrared emitter package

1‧‧‧發射器晶片 1‧‧‧transmitter chip

11‧‧‧基座 11‧‧‧Base

111‧‧‧頂面 111‧‧‧ top surface

112‧‧‧底面 112‧‧‧ bottom

113‧‧‧中央腔 113‧‧‧Central cavity

114‧‧‧周緣 114‧‧‧Weekly

115‧‧‧環形間隙 115‧‧‧ annular gap

116‧‧‧腔體定義壁 116‧‧‧ cavity definition wall

12‧‧‧導電接墊 12‧‧‧Electrical pads

13‧‧‧薄板 13‧‧‧Sheet

131‧‧‧頂面 131‧‧‧ top surface

132‧‧‧底面 132‧‧‧ bottom

133‧‧‧周端 133‧‧‧Wei Duan

14‧‧‧電阻器 14‧‧‧Resistors

141‧‧‧端部 141‧‧‧End

15‧‧‧細長形梁式支腳 15‧‧‧Slim beam feet

16‧‧‧第一反射材料 16‧‧‧First reflective material

17‧‧‧第二反射材料 17‧‧‧Second reflective material

18‧‧‧矽基體 18‧‧‧矽 base

19‧‧‧間隔層 19‧‧‧ spacer

2‧‧‧導電引腳 2‧‧‧Electrical pins

3‧‧‧殼體 3‧‧‧Shell

31‧‧‧外罩 31‧‧‧ Cover

32‧‧‧透明窗板 32‧‧‧Transparent window panels

33‧‧‧窗口 33‧‧‧ window

4‧‧‧真空室 4‧‧‧vacuum room

5‧‧‧接合導線 5‧‧‧Connected wire

6‧‧‧紅外線濾光器 6‧‧‧Infrared filter

本發明之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中:圖1是一本發明晶片型紅外線發射器封裝件之第一較佳實施例的剖面圖;圖2是一該第一較佳實施例的俯視圖;圖3是一熱損失圖,說明該第一較佳實施例中,一薄 板的各種熱損失及總熱損失對於一外罩中的真空室中壓力的變化;圖4是一電-光轉換效率圖,說明該第一較佳實施例(曲線a)與二比較例(曲線b及曲線c)的比較;圖5是一本發明晶片型紅外線發射器封裝件之第二較佳實施例的剖面圖;圖6是一該第二較佳實施例的俯視圖;圖7是一本發明晶片型紅外線發射器封裝件之第三較佳實施例的剖面圖;及圖8是一本發明晶片型紅外線發射器封裝件之第四較佳實施例的剖面圖。 Other features and advantages of the present invention will be apparent from the following description of the drawings, wherein: Figure 1 is a cross-sectional view of a first preferred embodiment of a wafer-type infrared emitter package of the present invention; Is a top view of the first preferred embodiment; FIG. 3 is a heat loss diagram illustrating a thin portion of the first preferred embodiment Various heat loss and total heat loss of the plate for the change of pressure in the vacuum chamber in a housing; FIG. 4 is an electro-optical conversion efficiency diagram illustrating the first preferred embodiment (curve a) and two comparative examples (curve Figure 5 is a cross-sectional view showing a second preferred embodiment of the wafer type infrared emitter package of the present invention; Figure 6 is a plan view of the second preferred embodiment; A cross-sectional view of a third preferred embodiment of the wafer type infrared emitter package of the present invention; and Fig. 8 is a cross-sectional view showing a fourth preferred embodiment of the wafer type infrared emitter package of the present invention.

在本發明被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。 Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same reference numerals.

圖1與圖2說明本發明晶片型紅外線發射器封裝件100之第一較佳實施例。 1 and 2 illustrate a first preferred embodiment of a wafer-type infrared emitter package 100 of the present invention.

該晶片型紅外線發射器封裝件100包含一發射器晶片1、一對導電引腳(conductive leads)2及一殼體3。該發射器晶片1包括:一基座11,該基座11具有一頂面111、一底面112及一延伸穿過該頂面111的中央腔113,該頂面111與該底面112是在一垂直方向上相反設置;一對形成在該基座11之頂面111上的導電接墊(conductive pads)12;一薄板13,在該垂直方向上對準於該中央腔113且具有一頂面131、一底面132及一周端133,該周端133 與該中央腔113的周緣114是經由一環形間隙115所分隔;一電阻器14,形成在該薄板13的頂面131上,用於加熱該薄板13以產生紅外線輻射;四細長形梁式支腳15,分別設置在該薄板13的四個角落,並自該薄板13的周端133穿過該環形間隙115延伸至該基座11,以使該薄板13懸浮於該中央腔113之內,藉以對於自該薄板13至該細長形梁式支腳15的熱傳導形成一熱瓶頸,進而減少該薄板13的熱量損失並使該薄板13達到均勻的溫度分布;及一第一反射材料16,覆蓋在該薄板13的底面132上。該基座11是一由矽晶片(silicon wafer)製成的矽基體。該殼體3包括一外罩31及一透明窗板32。該外罩31定義一窗口33,該透明窗板32是密封地覆蓋於該窗口33並與該外罩31共同定義一封閉的真空室4,該真空室4是與該中央腔113流體連通,該發射器晶片1是裝設在該封閉的真空室4中,用於穿過該透明窗板32發射該紅外線射線。該等導電引腳2是密封地延伸穿過該外罩31的底壁且穿入該真空室4,以經由一對接合導線(bonding wire)5分別與該等導電接墊12電連接。該電阻器14是形成一曲折的線形線路(meandering wire-shaped trace),且具有二相反端部(end sections)141,該線形線路的二端部141是設置並延伸於該細長形梁式支腳15的表面上。 The wafer type infrared emitter package 100 includes an emitter wafer 1, a pair of conductive leads 2, and a casing 3. The transmitter chip 1 includes a pedestal 11 having a top surface 111, a bottom surface 112, and a central cavity 113 extending through the top surface 111. The top surface 111 and the bottom surface 112 are in a a pair of oppositely disposed in a vertical direction; a pair of conductive pads 12 formed on the top surface 111 of the susceptor 11; a thin plate 13 aligned in the vertical direction with the central cavity 113 and having a top surface 131, a bottom surface 132 and a peripheral end 133, the peripheral end 133 The peripheral edge 114 of the central cavity 113 is separated by an annular gap 115; a resistor 14 is formed on the top surface 131 of the thin plate 13 for heating the thin plate 13 to generate infrared radiation; four elongated beam-shaped branches The feet 15 are respectively disposed at four corners of the thin plate 13 and extend from the circumferential end 133 of the thin plate 13 through the annular gap 115 to the base 11 to suspend the thin plate 13 within the central cavity 113. Thereby forming a thermal bottleneck for heat conduction from the thin plate 13 to the elongated beam-shaped leg 15, thereby reducing the heat loss of the thin plate 13 and achieving a uniform temperature distribution of the thin plate 13; and a first reflective material 16 covering On the bottom surface 132 of the thin plate 13. The susceptor 11 is a ruthenium substrate made of a silicon wafer. The housing 3 includes a cover 31 and a transparent window 32. The outer cover 31 defines a window 33 that sealingly covers the window 33 and defines a closed vacuum chamber 4 in conjunction with the outer cover 31. The vacuum chamber 4 is in fluid communication with the central cavity 113. The wafer 1 is mounted in the closed vacuum chamber 4 for emitting the infrared rays through the transparent window 32. The conductive pins 2 are sealingly extended through the bottom wall of the outer cover 31 and penetrate the vacuum chamber 4 to be electrically connected to the conductive pads 12 via a pair of bonding wires 5, respectively. The resistor 14 is formed into a meandering wire-shaped trace and has two end sections 141, the two ends 141 of which are disposed and extend to the elongated beam branch. On the surface of the foot 15.

在本實施例中,該薄板13及該細長形梁式支腳15是由一矽晶片透過微機電(micro-electro-mechanical,MEMS)技術而製得。 In the present embodiment, the thin plate 13 and the elongated beam-type leg 15 are made by a micro-electro-mechanical (MEMS) technology.

該第一反射材料16是以一具有高反射率及低放射率的金屬材料製得,較佳是選自於銀、金、鋁或鉑。在本實施例中,該第一反射材料16是以金製得。 The first reflective material 16 is made of a metal material having high reflectivity and low emissivity, and is preferably selected from silver, gold, aluminum or platinum. In the present embodiment, the first reflective material 16 is made of gold.

本實施例的晶片型紅外線發射器封裝件100還包含一裝設在該透明窗板32上的紅外線濾光器(optical filter)6,可讓預定波長的紅外線輻射穿透,且不可讓大部分該預定波長以外的紅外線輻射穿透。 The wafer type infrared emitter package 100 of the embodiment further includes an infrared filter 6 mounted on the transparent window 32 to allow infrared radiation of a predetermined wavelength to penetrate, and not to allow most of the Infrared radiation outside the predetermined wavelength penetrates.

圖3顯示該第一較佳實施例中,該薄板13的各種熱損失及總熱損失對於真空室中壓力的變化。該薄板13的尺寸為1 mm×1 mm且是在750℃下進行操作,每一細長形梁式支腳15的長度為0.2 mm,其截面積為0.02 mm×0.02 mm。 Figure 3 shows the various heat losses and total heat loss of the sheet 13 in the first preferred embodiment for changes in pressure in the vacuum chamber. The sheet 13 has a size of 1 mm x 1 mm and is operated at 750 ° C. Each of the elongated beam legs 15 has a length of 0.2 mm and a cross-sectional area of 0.02 mm × 0.02 mm.

該薄板13的總熱損失(曲線T)為輻射熱損失(曲線A,在該薄板13的底面132上覆蓋有第一反射材料16)、傳導熱損失(曲線B,在該薄板13與該等細長形梁式支腳15間形成有熱瓶頸)及對流熱損失(曲線C,真空室4內的空氣造成的熱損失)的總合。此外,圖3中的曲線D及曲線E分別代表一薄板13的周端133與一中央腔113的周緣114完整連接(意即無熱瓶頸)的傳導熱損失及一在底面132上缺乏第一反射材料16覆蓋之薄板13的輻射熱損失。 The total heat loss (curve T) of the thin plate 13 is radiant heat loss (curve A, covered with a first reflective material 16 on the bottom surface 132 of the thin plate 13), conduction heat loss (curve B, at the thin plate 13 and the elongate The combination of the hot neck of the beam-type legs 15 and the convective heat loss (curve C, heat loss due to the air in the vacuum chamber 4). In addition, the curve D and the curve E in FIG. 3 respectively represent the conduction heat loss of the peripheral end 133 of a thin plate 13 and the peripheral edge 114 of a central cavity 113 (ie, no thermal bottleneck) and a lack of the first surface on the bottom surface 132. The radiant heat loss of the thin plate 13 covered by the reflective material 16.

申請人發現:當真空室4中壓力高於0.5 torr時,對流熱損失(曲線C)是大於曲線A與曲線E的輻射熱損失(此時對流熱損失為總熱損失的主要影響因素),因此在該薄板13的底面132上覆蓋第一反射材料16(意即將缺乏 第一反射材料16覆蓋的薄板13改變為底面132上覆蓋有第一反射材料16的薄板13)對於總熱損失的減少是微不足道的。 Applicant found that when the pressure in the vacuum chamber 4 is higher than 0.5 torr, the convective heat loss (curve C) is greater than the radiant heat loss of curve A and curve E (the convective heat loss is the main influencing factor of the total heat loss), therefore Covering the bottom surface 132 of the thin plate 13 with the first reflective material 16 The thin plate 13 covered by the first reflective material 16 is changed to the thin plate 13 covered with the first reflective material 16 on the bottom surface 132). The reduction in total heat loss is negligible.

相類似地,當真空室4中壓力高於0.5 torr時,對流熱損失(曲線C)是大於曲線B與曲線D的傳導熱損失(此時對流熱損失為總熱損失的主要影響因素),因此經由細長形梁式支腳15所帶來的熱瓶頸(意即將底面132上覆蓋有第一反射材料16但不具有熱瓶頸的薄板13改變為底面132上覆蓋有第一反射材料16且具有熱瓶頸的薄板13)對於總熱損失的減少仍是微不足道的。 Similarly, when the pressure in the vacuum chamber 4 is higher than 0.5 torr, the convective heat loss (curve C) is greater than the conduction heat loss of curve B and curve D (the convective heat loss is the main influencing factor of the total heat loss), Therefore, the thermal bottleneck brought by the elongated beam-shaped legs 15 means that the thin plate 13 covered on the bottom surface 132 with the first reflective material 16 but without the thermal bottleneck is changed to the bottom surface 132 covered with the first reflective material 16 and having The thin plate 13) of the thermal bottleneck is still negligible for the reduction of total heat loss.

此外,由於曲線E(無第一反射材料覆蓋)的輻射熱損失遠大於曲線B的傳導熱損失,因此經由細長形梁式支腳15所帶來的熱瓶頸對於無第一反射材料16覆蓋之薄板13的總熱損失的減少是微不足道的。 In addition, since the radiant heat loss of the curve E (without the first reflective material cover) is much greater than the conduction heat loss of the curve B, the thermal bottleneck caused by the elongated beam-type leg 15 is for the thin plate not covered by the first reflective material 16. The reduction in total heat loss of 13 is negligible.

因此,申請人發現需要將真空室4內的壓力降低至低於0.03 torr,且需在該薄板13的底面132上形成第一反射材料16,使得薄板13的對流熱損失(曲線C)與輻射熱損失(曲線A)的大小約略相同,以顯著影響經由細長形梁式支腳15所帶來的熱瓶頸對於薄板13的總熱損失的減少(意即從曲線D降至曲線B)。 Accordingly, Applicants have found that it is desirable to reduce the pressure within the vacuum chamber 4 to less than 0.03 torr and to form a first reflective material 16 on the bottom surface 132 of the sheet 13 such that the convective heat loss (curve C) and radiant heat of the sheet 13 The magnitude of the loss (curve A) is approximately the same to significantly affect the reduction in the total heat loss of the thin plate 13 by the thermal necking caused by the elongated beam legs 15 (ie, from curve D to curve B).

較佳地,該封閉的真空室4具有的壓力高於0.001 torr。 Preferably, the enclosed vacuum chamber 4 has a pressure greater than 0.001 torr.

圖4顯示該第一較佳實施例(曲線a)與二比較例(曲線b及曲線c)在電-光轉換效率上的比較。曲線b所代表 的比較例與該第一較佳實施例不同之處在於缺乏該第一反射材料16。曲線c所代表的比較例與該第一較佳實施例不同之處在於缺乏該第一反射材料16且不具有該熱瓶頸(意即該薄板13的周端133與該中央腔113的周緣114完整接觸)。 Figure 4 shows a comparison of the electro-optical conversion efficiency of the first preferred embodiment (curve a) and two comparative examples (curve b and curve c). Curve b represents The comparative example differs from the first preferred embodiment in that the first reflective material 16 is lacking. The comparative example represented by the curve c differs from the first preferred embodiment in that the first reflective material 16 is lacking and does not have the thermal neck (ie, the peripheral end 133 of the thin plate 13 and the peripheral edge 114 of the central cavity 113). Complete contact).

如圖4所示,在真空室4的壓力約為0.1 torr時,該第一較佳實施例相較曲線c所代表的比較例,其電-光轉換效率可從約12%提升至約80%;相較曲線b所代表的比較例,其電-光轉換效率可從約45%提升至約80%。在真空室的壓力約為0.01 torr時,該第一較佳實施例相較曲線c所代表的比較例,其電-光轉換效率可從約15%提升至約92%;相較曲線b所代表的比較例,其電-光轉換效率可從約48%提升至約92%。 As shown in FIG. 4, when the pressure of the vacuum chamber 4 is about 0.1 torr, the electro-optical conversion efficiency of the first preferred embodiment can be increased from about 12% to about 80 as compared with the comparative example represented by the curve c. %; Compared with the comparative example represented by the curve b, the electro-optic conversion efficiency can be increased from about 45% to about 80%. When the pressure in the vacuum chamber is about 0.01 torr, the first preferred embodiment can increase the electro-optic conversion efficiency from about 15% to about 92% compared to the comparative example represented by the curve c; In a representative example, the electro-optic conversion efficiency can be increased from about 48% to about 92%.

此外,該第一較佳實施例的功率消耗(power consumption)僅約為0.15 W。 Moreover, the power consumption of the first preferred embodiment is only about 0.15 W.

圖5與圖6說明本發明晶片型紅外線發射器封裝件100之第二較佳實施例。 5 and 6 illustrate a second preferred embodiment of the wafer type infrared emitter package 100 of the present invention.

該第二較佳實施例與該第一較佳實施例不同之處在於該第二較佳實施例包括一細長形梁式支腳15,相互連接該薄板13的周端133及該中央腔113的周緣114,且該線形線路的二端部141是設置並延伸於該細長形梁式支腳15的表面上。 The second preferred embodiment is different from the first preferred embodiment in that the second preferred embodiment includes an elongated beam-shaped leg 15 that interconnects the peripheral end 133 of the thin plate 13 and the central cavity 113. The peripheral edge 114 and the two end portions 141 of the linear line are disposed and extend on the surface of the elongated beam leg 15.

圖7說明本發明晶片型紅外線發射器封裝件100之第三較佳實施例。 Figure 7 illustrates a third preferred embodiment of the wafer type infrared emitter package 100 of the present invention.

該第三較佳實施例與該第一較佳實施例不同之處在於該第三較佳實施例還包括一第二反射材料17,形成並覆蓋在該中央腔113的腔體定義壁116上及該基座11之外周緣的表面上。該第二反射材料17是以一具有高反射率及低放射率的金屬材料製得,較佳是選自於銀、金、鋁或鉑。在本實施例中,該第二反射材料17是以金製得。 The third preferred embodiment differs from the first preferred embodiment in that the third preferred embodiment further includes a second reflective material 17 formed and overlying the cavity defining wall 116 of the central cavity 113. And on the surface of the outer periphery of the susceptor 11. The second reflective material 17 is made of a metal material having high reflectivity and low emissivity, and is preferably selected from silver, gold, aluminum or platinum. In the present embodiment, the second reflective material 17 is made of gold.

圖8說明本發明晶片型紅外線發射器封裝件100之第四較佳實施例。 Figure 8 illustrates a fourth preferred embodiment of the wafer type infrared emitter package 100 of the present invention.

該第四較佳實施例與該第一較佳實施例不同之處在於該第四較佳實施例包括一基座11,該基座11含有一矽基體18及一形成在該矽基體18頂面上的間隔層19。該薄板13、該等細長形梁式支腳15及該間隔層19是由二氧化矽材料所形成。該等導電接墊12是形成在該間隔層19上。該等細長形梁式支腳15是自該薄板13的周端133並穿過該環形間隙115延伸至該間隔層19。該矽基體18是由矽晶片所製成。 The fourth preferred embodiment is different from the first preferred embodiment in that the fourth preferred embodiment includes a base 11 including a base 18 and a top formed on the base 18 The spacer layer 19 on the surface. The thin plate 13, the elongate beam legs 15 and the spacer layer 19 are formed of a ceria material. The conductive pads 12 are formed on the spacer layer 19. The elongate beam legs 15 extend from the peripheral end 133 of the sheet 13 and through the annular gap 115 to the spacer layer 19. The ruthenium substrate 18 is made of a tantalum wafer.

在本實施例中,該薄板13及該細長形梁式支腳15是由在該矽基體18上形成一二氧化矽層後再透過半導體製程技術而製得。 In the present embodiment, the thin plate 13 and the elongated beam leg 15 are formed by forming a ceria layer on the crucible base 18 and then passing through a semiconductor process technology.

綜上所述,本發明晶片型紅外線發射器封裝件100包含藉由至少一細長形梁式支腳15懸浮於一基座11上的薄板13,能有效地減少該薄板的總熱損失,故確實能達成本發明之目的。 In summary, the wafer type infrared emitter package 100 of the present invention comprises a thin plate 13 suspended on a base 11 by at least one elongated beam-shaped leg 15, which can effectively reduce the total heat loss of the thin plate. It is indeed possible to achieve the object of the invention.

惟以上所述者,僅為本發明之較佳實施例而已 ,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。 However, the above is only the preferred embodiment of the present invention. The scope of the present invention is not limited thereto, that is, the simple equivalent changes and modifications made by the present invention in the scope of the invention and the scope of the patent specification are still within the scope of the invention.

100‧‧‧晶片型紅外線發射器封裝件 100‧‧‧ wafer type infrared emitter package

1‧‧‧發射器晶片 1‧‧‧transmitter chip

11‧‧‧基座 11‧‧‧Base

111‧‧‧頂面 111‧‧‧ top surface

112‧‧‧底面 112‧‧‧ bottom

113‧‧‧中央腔 113‧‧‧Central cavity

114‧‧‧周緣 114‧‧‧Weekly

12‧‧‧導電接墊 12‧‧‧Electrical pads

13‧‧‧薄板 13‧‧‧Sheet

131‧‧‧頂面 131‧‧‧ top surface

132‧‧‧底面 132‧‧‧ bottom

133‧‧‧周端 133‧‧‧Wei Duan

14‧‧‧電阻器 14‧‧‧Resistors

141‧‧‧端部 141‧‧‧End

15‧‧‧細長形梁式支腳 15‧‧‧Slim beam feet

16‧‧‧第一反射材料 16‧‧‧First reflective material

2‧‧‧導電引腳 2‧‧‧Electrical pins

3‧‧‧殼體 3‧‧‧Shell

31‧‧‧外罩 31‧‧‧ Cover

32‧‧‧透明窗板 32‧‧‧Transparent window panels

33‧‧‧窗口 33‧‧‧ window

4‧‧‧真空室 4‧‧‧vacuum room

5‧‧‧接合導線 5‧‧‧Connected wire

6‧‧‧紅外線濾光器 6‧‧‧Infrared filter

Claims (7)

一種晶片型紅外線發射器封裝件,包含:一發射器晶片,包括:一含有一矽基體的基座,該基座具有一頂面、一底面及一延伸穿過該頂面的中央腔,該頂面與該底面是在一垂直方向上相反設置,一薄板,在該垂直方向上對準於該中央腔且具有一頂面、一底面及一周端,該周端與該中央腔的周緣是經由一環形間隙所分隔,一電阻器,形成在該薄板的頂面上,用於加熱該薄板以產生紅外線輻射,至少一細長形梁式支腳,自該薄板的周端並穿過該環形間隙延伸至該基座,以使該薄板懸浮於該中央腔之內,藉以對於自該薄板至該細長形梁式支腳的熱傳導形成一熱瓶頸,及一第一反射材料,覆蓋在該薄板的底面上;及一殼體,包括一外罩及一透明窗板,該外罩定義一窗口,該透明窗板是密封地覆蓋於該窗口並與該外罩共同定義一封閉的真空室,該真空室是與該中央腔流體連通,該發射器晶片是裝設在該封閉的真空室中,用於穿過該窗板發射該紅外線射線;其中,該封閉的真空室具有的壓力低於0.01 torr。 A wafer type infrared emitter package comprises: an emitter wafer, comprising: a base having a base, the base having a top surface, a bottom surface and a central cavity extending through the top surface, The top surface and the bottom surface are oppositely disposed in a vertical direction, and a thin plate is aligned in the vertical direction in the central cavity and has a top surface, a bottom surface and a peripheral end, the peripheral end and the periphery of the central cavity being Separated by an annular gap, a resistor is formed on the top surface of the sheet for heating the sheet to generate infrared radiation, at least one elongated beam leg, from the peripheral end of the sheet and through the ring a gap extending to the base to suspend the thin plate within the central cavity, thereby forming a thermal bottleneck for heat conduction from the thin plate to the elongated beam leg, and a first reflective material covering the thin plate And a housing comprising a cover and a transparent window panel, the cover defining a window, the transparent window panel sealingly covering the window and defining a closed vacuum chamber together with the outer cover, the vacuum chamber With Central lumen in fluid communication with the transmitter chip is mounted in the closed vacuum chamber for emission through the window of the infrared radiation plate; wherein the enclosed vacuum chamber having a pressure less than 0.01 torr. 如請求項1所述的晶片型紅外線發射器封裝件,其中,該封閉的真空室具有的壓力高於0.001 torr。 The wafer type infrared emitter package of claim 1, wherein the enclosed vacuum chamber has a pressure greater than 0.001 torr. 如請求項1所述的晶片型紅外線發射器封裝件,其中,該中央腔是經由一腔體定義壁所定義,該腔體定義壁具有一底部,且設置在該基座的底面上方。 The wafer-type infrared emitter package of claim 1, wherein the central cavity is defined by a cavity defining wall having a bottom and disposed above a bottom surface of the base. 如請求項3所述的晶片型紅外線發射器封裝件,還包含一第二反射材料,覆蓋在該腔體定義壁上。 The wafer type infrared emitter package of claim 3, further comprising a second reflective material overlying the defined wall of the cavity. 如請求項1所述的晶片型紅外線發射器封裝件,其中,該電阻器是形成一曲折的線形線路,具有二相反端部,該線形線路的二端部是設置並延伸於該細長形梁式支腳的表面上。 The wafer-type infrared emitter package of claim 1, wherein the resistor is a meandering linear line having opposite ends, the two ends of the linear line being disposed and extending to the elongated beam On the surface of the foot. 如請求項1所述的晶片型紅外線發射器封裝件,還包含一裝設在該窗板上的紅外線濾光器,該紅外線濾光器是可讓預定波長的紅外線輻射穿透,且不可讓大部分該預定波長以外的紅外線輻射穿透。 The wafer type infrared emitter package of claim 1, further comprising an infrared filter mounted on the window panel, the infrared filter is capable of penetrating infrared radiation of a predetermined wavelength, and is not allowed Most of the infrared radiation outside the predetermined wavelength penetrates. 如請求項1所述的晶片型紅外線發射器封裝件,其中,該第一反射材料是以一金屬材料製得,該金屬材料是選自於銀、金、鋁或鉑。 The wafer type infrared emitter package of claim 1, wherein the first reflective material is made of a metal material selected from the group consisting of silver, gold, aluminum or platinum.
TW102103998A 2013-02-01 2013-02-01 Wafer type infrared emitter package TW201432860A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW102103998A TW201432860A (en) 2013-02-01 2013-02-01 Wafer type infrared emitter package
CN201310069392.2A CN103972042B (en) 2013-02-01 2013-03-05 Chip Type Infrared Emitter Package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW102103998A TW201432860A (en) 2013-02-01 2013-02-01 Wafer type infrared emitter package

Publications (1)

Publication Number Publication Date
TW201432860A true TW201432860A (en) 2014-08-16

Family

ID=51241411

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102103998A TW201432860A (en) 2013-02-01 2013-02-01 Wafer type infrared emitter package

Country Status (2)

Country Link
CN (1) CN103972042B (en)
TW (1) TW201432860A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI638435B (en) * 2016-10-24 2018-10-11 Mitsubishi Electric Corporation Semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113955710A (en) * 2021-09-29 2022-01-21 厦门三优光电股份有限公司 Infrared laser chip suspension type packaging structure

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI112005B (en) * 1995-11-24 2003-10-15 Valtion Teknillinen Electrically adjustable thermal radiation source
NO321281B1 (en) * 2004-09-15 2006-04-18 Sintef Infrared source
CN201167087Y (en) * 2008-03-07 2008-12-17 河南汉威电子股份有限公司 Infrared light source
US8859303B2 (en) * 2010-01-21 2014-10-14 Cambridge Cmos Sensors Ltd. IR emitter and NDIR sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI638435B (en) * 2016-10-24 2018-10-11 Mitsubishi Electric Corporation Semiconductor device

Also Published As

Publication number Publication date
CN103972042B (en) 2016-03-30
CN103972042A (en) 2014-08-06

Similar Documents

Publication Publication Date Title
US8575578B1 (en) Chip-scale infrared emitter package
CN107167511B (en) Gas sensor
KR101516358B1 (en) Light Emitting Device
JP7394060B2 (en) infrared device
US20220186887A1 (en) Lighting apparatus
JP6543674B2 (en) Infrared emitter having layered structure
CN104701438B (en) Deep ultraviolet light source and its method for packing
JP2018523305A5 (en)
CN103904197A (en) LED lamp filament piece, manufacturing method of LED lamp filament piece and LED lamp filament piece bulb
JP2010507082A5 (en)
TW201831041A (en) Infrared heater
CN104291263A (en) Micro infrared light source chip of diamond bridge film structure and manufacturing method
TW201432860A (en) Wafer type infrared emitter package
CN103148947A (en) Wafer-level packaging structure for improving response rate of thermopile infrared detector
WO2017181751A1 (en) Uv filament lamp
CN203871360U (en) COB packaging structure of polishing aluminum substrate
CN103388764B (en) LED lights
TWI582417B (en) Gas sensor
CN203617337U (en) Led packaging structure
CN112005616A (en) Infrared ray radiation device
CN204067353U (en) The integrated COB light source encapsulating structure of a kind of great power LED
JP6762533B2 (en) Thermal radiation light source and light source device
CN209282232U (en) A kind of UV-LED light-source structure
CN208014736U (en) A kind of ultraviolet LED packaging
JP2022051217A5 (en) light receiving and emitting device