TW201413167A - Lighting apparatus - Google Patents
Lighting apparatus Download PDFInfo
- Publication number
- TW201413167A TW201413167A TW102128562A TW102128562A TW201413167A TW 201413167 A TW201413167 A TW 201413167A TW 102128562 A TW102128562 A TW 102128562A TW 102128562 A TW102128562 A TW 102128562A TW 201413167 A TW201413167 A TW 201413167A
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- air
- outer casing
- substrate
- layer
- Prior art date
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Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
- F21V29/50—Cooling arrangements
- F21V29/70—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
- F21V29/83—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks the elements having apertures, ducts or channels, e.g. heat radiation holes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V23/00—Arrangement of electric circuit elements in or on lighting devices
- F21V23/04—Arrangement of electric circuit elements in or on lighting devices the elements being switches
- F21V23/0442—Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors
- F21V23/0464—Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors the sensor sensing the level of ambient illumination, e.g. dawn or dusk sensors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V23/00—Arrangement of electric circuit elements in or on lighting devices
- F21V23/04—Arrangement of electric circuit elements in or on lighting devices the elements being switches
- F21V23/0442—Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors
- F21V23/0471—Arrangement of electric circuit elements in or on lighting devices the elements being switches activated by means of a sensor, e.g. motion or photodetectors the sensor detecting the proximity, the presence or the movement of an object or a person
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
- F21V29/50—Cooling arrangements
- F21V29/60—Cooling arrangements characterised by the use of a forced flow of gas, e.g. air
- F21V29/67—Cooling arrangements characterised by the use of a forced flow of gas, e.g. air characterised by the arrangement of fans
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V5/00—Refractors for light sources
- F21V5/04—Refractors for light sources of lens shape
- F21V5/043—Refractors for light sources of lens shape the lens having cylindrical faces, e.g. rod lenses, toric lenses
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V7/00—Reflectors for light sources
- F21V7/04—Optical design
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2115/00—Light-generating elements of semiconductor light sources
- F21Y2115/10—Light-emitting diodes [LED]
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Fastening Of Light Sources Or Lamp Holders (AREA)
Abstract
Description
本申請案主張2012年8月10日在韓國智慧財產局申請的韓國專利申請案第10-2012-0087933號以及2013年6月26日申請的韓國專利申請案第10-2013-0073701號的優先權及權益,所述專利申請案的全部揭露內容以引用的方式併入本文中。 Korean Patent Application No. 10-2012-0087933, filed on August 10, 2012 in the Korean Intellectual Property Office, and Korean Patent Application No. 10-2013-0073701, filed on June 26, 2013, is preferred. The entire disclosure of the patent application is hereby incorporated by reference.
根據例示性實施例的裝置及方法是關於發光裝置,且更特定言之,是關於包含基底、外殼、冷卻風扇以及光源的發光裝置。 The apparatus and method according to an exemplary embodiment relate to a light emitting device, and more particularly to a light emitting device including a substrate, a housing, a cooling fan, and a light source.
將發光二極體(light emitting diode,LED)用作光源的發光裝置可經由基板而將自光源產生的熱傳遞至散熱片,且將熱發散至周圍空氣中。經由自然對流而將熱傳遞至周圍空氣展現極低的效率,且因此,極大的散熱片安裝在光源上以冷卻光源。作為改良此限制的方法,已考慮各種方法,諸如,增加光源與基板之間的接觸以增強熱傳導的方法、用金屬材料形成基板以增強熱傳 導的方法及其類似者。 A light-emitting device using a light emitting diode (LED) as a light source can transfer heat generated from a light source to a heat sink via a substrate, and dissipate heat into the surrounding air. Transferring heat to ambient air via natural convection exhibits extremely low efficiency, and therefore, a very large heat sink is mounted on the light source to cool the light source. As a method of improving this limitation, various methods have been considered, such as a method of increasing contact between a light source and a substrate to enhance heat conduction, and forming a substrate with a metal material to enhance heat transfer. The method of introduction and the like.
例示性實施例的一態樣提供一種發光裝置,所述發光裝置可能夠藉由顯著提高熱輻射效率來克服根據自然對流的有限熱輻射效率而延長光源的使用壽命且改良光輸出。 One aspect of the illustrative embodiments provides a light emitting device that can overcome the limited heat radiation efficiency according to natural convection to extend the life of the light source and improve light output by significantly increasing heat radiation efficiency.
例示性實施例的另一態樣提供一種發光裝置,所述發光裝置具有落入美國國家標準學會(American National Standards Institute,ANSI)標準範圍內的尺寸且相對於高輸出而具有增強的熱輻射。 Another aspect of the illustrative embodiments provides a light emitting device having dimensions that fall within the limits of the American National Standards Institute (ANSI) standard and having enhanced heat radiation relative to high output.
例示性實施例的另一態樣提供一種發光裝置,所述發光裝置具有落入由美國國家標準學會(ANSI)設定的範圍內的尺寸且相對於其高輸出而具有增強的熱輻射。 Another aspect of the exemplary embodiment provides a light emitting device having a size that falls within a range set by the American National Standards Institute (ANSI) and has enhanced heat radiation relative to its high output.
根據例示性實施例的一態樣,提供一種發光裝置,包含:基底,包含耦接緣邊以及位於耦接緣邊的內側上的支撐板;外殼,經組態以耦接至耦接緣邊,以使得支撐板被覆蓋,外殼包括經組態以導引空氣的引入的通道部分以及經組態以將經由通道部分而導引的空氣引入至外殼的內部空間中的空氣引入孔;冷卻風扇,位於由外殼覆蓋的支撐板的上表面上,其中冷卻風扇經組態以將經由空氣引入孔而引入的空氣吸入至外殼的內部空間中,且經由基底中的空氣排放孔而排放所吸入的空氣;以及光源模組,安裝於支撐板的下表面上,其中通道部分沿著外殼的外表面提供以階 梯方式凹陷的區域。 In accordance with an aspect of the exemplary embodiments, a light emitting device is provided, comprising: a substrate including a coupling rim and a support plate on an inner side of the coupling rim; the housing configured to couple to the coupling rim So that the support plate is covered, the outer casing includes a channel portion configured to direct the introduction of air and an air introduction hole configured to introduce air guided through the channel portion into the inner space of the outer casing; the cooling fan Located on an upper surface of the support plate covered by the outer casing, wherein the cooling fan is configured to draw air introduced through the air introduction hole into the inner space of the outer casing, and discharge the inhaled air through the air discharge hole in the base Air; and a light source module mounted on a lower surface of the support plate, wherein the channel portion is provided along the outer surface of the outer casing The area where the ladder is recessed.
空氣引入孔可在通道部分內以階梯方式凹陷的區域內沿著外殼的圓周而具有環狀形狀,且其中通道部分可自外殼的下端沿著外殼的外側向上延伸,以與空氣引入孔連通。 The air introduction hole may have an annular shape along a circumference of the outer casing in a region recessed in a stepwise manner in the passage portion, and wherein the passage portion may extend upward from the lower end of the outer casing along the outer side of the outer casing to communicate with the air introduction hole.
空氣引入孔可沿著外殼的圓周而具有環狀形狀,且通道部分可包含:第一通道,在對應於空氣引入孔的位置中沿著外殼的圓周,以與空氣引入孔連通;以及第二通道,自第一通道延伸至外殼的下端以向外部暴露。 The air introduction hole may have an annular shape along a circumference of the outer casing, and the passage portion may include: a first passage along a circumference of the outer casing in a position corresponding to the air introduction hole to communicate with the air introduction hole; and a second The passage extends from the first passage to the lower end of the outer casing to be exposed to the outside.
通道部分可包含多個通道,且多個通道中的至少一者可在外殼的外表面中凹進以與空氣引入孔連通。 The channel portion can include a plurality of channels, and at least one of the plurality of channels can be recessed in the outer surface of the outer casing to communicate with the air introduction aperture.
耦接緣邊可包含具有對應於通道部分的形狀及位置的凹槽,以使得耦接緣邊可與外殼的通道部分連接。 The coupling rim may include a groove having a shape and a position corresponding to the channel portion such that the coupling rim may be coupled to the channel portion of the outer casing.
耦接緣邊可包含自其下端向外突起的凸緣部分,且凸緣部分可具有形成於耦接緣邊的圓周中的多個通氣孔。 The coupling rim may include a flange portion that projects outwardly from a lower end thereof, and the flange portion may have a plurality of vent holes formed in a circumference of the coupling rim.
基底可在支撐板的外圓周表面與耦接緣邊的內表面之間包含空氣排放孔以徑向排放經引入至外殼的內部空間中的空氣。 The substrate may include an air discharge hole between the outer circumferential surface of the support plate and the inner surface of the coupling rim to radially discharge air introduced into the inner space of the outer casing.
基底可在支撐板的中央部分中包含空氣排放孔以排放經引入至外殼的內部空間中的空氣。 The substrate may include an air discharge hole in a central portion of the support plate to discharge air introduced into an inner space of the outer casing.
基底可在面向冷卻風扇的支撐板的上表面上包含多個熱輻射鰭片。 The substrate may include a plurality of heat radiating fins on an upper surface of the support plate facing the cooling fan.
根據例示性實施例的另一態樣,提供一種光源模組,包含:基底,具有空氣排放孔;外殼,包含沿著外殼的外表面以階 梯方式由凹陷區域所提供的通道部分,及經組態以將經由通道部分而導引的空氣引入至外殼的內部空間中的空氣引入孔,其中外殼經組態以安置於基底的上側上;冷卻風扇,經組態以安置於外殼內,且經組態以將空氣吸入至外殼的內部空間中,且經由空氣排放孔而向外排放所吸入的空氣;以及光源模組,經組態以安置於基底的下側上,且包含至少一個發光元件及安置於發光元件上的至少一個透鏡。 According to another aspect of the exemplary embodiments, a light source module includes: a substrate having an air discharge hole; and an outer casing including a step along an outer surface of the outer casing a channel portion provided by the recessed region, and an air introduction aperture configured to introduce air guided through the channel portion into an interior space of the outer casing, wherein the outer casing is configured to be disposed on an upper side of the substrate; a cooling fan configured to be disposed within the outer casing and configured to draw air into the interior space of the outer casing and to discharge the inhaled air outward through the air venting aperture; and the light source module configured to It is disposed on a lower side of the substrate and includes at least one light emitting element and at least one lens disposed on the light emitting element.
至少一個透鏡可具有面向至少一個發光元件的第一表面及與第一表面相對的第二表面,至少一個透鏡可包含中央入射表面及反射部分,所述中央入射表面經組態以使得來自至少一個發光元件的光入射於中央入射表面上,所述反射部分經組態以沿著中央入射表面的圓周而朝向至少一個發光元件突起,其中反射部分基於中心光軸而對稱,其中中央入射表面及反射部分設置於第一表面中,且其中折射部分設置於第二表面中,且經組態以在與至少一個發光元件相反的方向上突起,且經組態以基於光軸而對稱。 The at least one lens may have a first surface facing the at least one light emitting element and a second surface opposite the first surface, the at least one lens may include a central incident surface and a reflective portion, the central incident surface configured to be derived from at least one Light of the illuminating element is incident on a central incident surface, the reflective portion being configured to protrude toward the at least one illuminating element along a circumference of the central incident surface, wherein the reflecting portion is symmetrical based on a central optical axis, wherein the central incident surface and the reflection A portion is disposed in the first surface, and wherein the refractive portion is disposed in the second surface and configured to protrude in a direction opposite the at least one light emitting element and configured to be symmetric based on the optical axis.
反射部分可包含第一反射部分及第二反射部分,第一反射部分及第二反射部分相對於光軸具有不同旋轉半徑且同心的,其中第一反射部分及第二反射部分可具有不同尺寸。 The reflective portion may include a first reflective portion and a second reflective portion, the first reflective portion and the second reflective portion having different radii of rotation and concentric with respect to the optical axis, wherein the first reflective portion and the second reflective portion may have different sizes.
第一反射部分及第二反射部分可各自具有:側入射表面,來自至少一個發光元件的光入射至側入射表面;以及反射表面,將入射光反射至第二表面。 The first reflective portion and the second reflective portion may each have a side incident surface, light from the at least one light emitting element is incident to the side incident surface, and a reflective surface that reflects the incident light to the second surface.
折射部分可經組態以安置為緊鄰至少一個發光元件之上,且所述折射部分可具有:第一折射部分,具有將光軸作為頂點的彎曲表面;以及第二折射部分,相對於光軸而形成多個同心圓,且具有沿著第一折射部分的圓周而形成的凸凹結構。 The refractive portion may be configured to be disposed in close proximity to the at least one light emitting element, and the refractive portion may have: a first refractive portion having a curved surface having an optical axis as a vertex; and a second refractive portion relative to the optical axis And a plurality of concentric circles are formed and have a convex-concave structure formed along the circumference of the first refractive portion.
反射部分可經組態以相對於光軸而安置於折射部分的外部,以使得反射部分圍繞折射部分。 The reflective portion may be configured to be disposed outside the refractive portion with respect to the optical axis such that the reflective portion surrounds the refractive portion.
1‧‧‧天花板 1‧‧‧ ceiling
2‧‧‧孔 2‧‧‧ holes
3‧‧‧固定單元 3‧‧‧Fixed unit
10‧‧‧發光裝置 10‧‧‧Lighting device
10'‧‧‧發光裝置 10'‧‧‧Lighting device
10"‧‧‧發光裝置 10"‧‧‧Lighting device
100‧‧‧基底 100‧‧‧Base
100'‧‧‧基底 100'‧‧‧Base
100"‧‧‧基底 100"‧‧‧ base
110‧‧‧耦接緣邊 110‧‧‧ coupling edge
110'‧‧‧耦接緣邊 110'‧‧‧ coupling edge
110"‧‧‧耦接緣邊 110"‧‧‧ coupling edge
111‧‧‧凸緣部分 111‧‧‧Flange section
111'‧‧‧凸緣部分 111'‧‧‧Flange section
112‧‧‧凹槽 112‧‧‧ Groove
112"‧‧‧凹槽 112"‧‧‧ Groove
113'‧‧‧通氣孔 113'‧‧‧ vents
120‧‧‧支撐板 120‧‧‧Support board
120'‧‧‧支撐板 120'‧‧‧Support board
120"‧‧‧支撐板 120"‧‧‧ support plate
120a‧‧‧表面 120a‧‧‧Surface
120a'‧‧‧表面 120a'‧‧‧ surface
120b‧‧‧另一表面 120b‧‧‧Other surface
120b'‧‧‧另一表面 120b'‧‧‧ another surface
121‧‧‧熱輻射鰭片 121‧‧‧Heat radiation fins
121'‧‧‧熱輻射鰭片 121'‧‧‧Heat radiation fins
121"‧‧‧熱輻射鰭片 121"‧‧‧ Heat radiation fins
122‧‧‧固定部分 122‧‧‧Fixed section
122'‧‧‧固定部分 122'‧‧‧Fixed part
123‧‧‧側壁 123‧‧‧ side wall
123'‧‧‧側壁 123'‧‧‧ side wall
130‧‧‧空氣排放孔 130‧‧‧Air discharge hole
130'‧‧‧空氣排放孔 130'‧‧‧Air vent
130"‧‧‧空氣排放孔 130"‧‧‧Air vents
200‧‧‧外殼 200‧‧‧ Shell
200'‧‧‧外殼 200'‧‧‧ Shell
200"‧‧‧外殼 200"‧‧‧ shell
210‧‧‧端子部分 210‧‧‧Terminal part
210'‧‧‧端子部分 210'‧‧‧Terminal part
210"‧‧‧端子部分 210"‧‧‧ terminal part
220‧‧‧通道部分 220‧‧‧Channel section
220'‧‧‧通道部分 220'‧‧‧Channel section
220"‧‧‧通道部分 220"‧‧‧ channel section
221‧‧‧第一通道a 221‧‧‧first channel a
222‧‧‧第二通道 222‧‧‧second channel
230‧‧‧空氣引入孔 230‧‧‧Air introduction hole
230'‧‧‧空氣引入孔 230'‧‧‧Air introduction hole
230"‧‧‧空氣引入孔 230"‧‧‧Air introduction hole
300‧‧‧冷卻風扇 300‧‧‧Cooling fan
300'‧‧‧冷卻風扇 300'‧‧‧ cooling fan
300"‧‧‧冷卻風扇 300"‧‧‧ cooling fan
400‧‧‧光源模組 400‧‧‧Light source module
400'‧‧‧光源模組 400'‧‧‧Light source module
400"‧‧‧光源模組 400"‧‧‧ light source module
410‧‧‧基板 410‧‧‧Substrate
410'‧‧‧基板 410'‧‧‧Substrate
410"‧‧‧基板 410"‧‧‧ substrate
420‧‧‧發光元件 420‧‧‧Lighting elements
420'‧‧‧發光元件 420'‧‧‧Lighting elements
420"‧‧‧發光元件 420"‧‧‧Lighting elements
430'‧‧‧通孔 430'‧‧‧through hole
440"‧‧‧透鏡單元 440"‧‧‧ lens unit
440"-1‧‧‧第一表面 440"-1‧‧‧ first surface
440"-2‧‧‧第二表面 440"-2‧‧‧ second surface
450"‧‧‧透鏡 450"‧‧‧ lens
451"‧‧‧中央入射表面 451"‧‧‧ central incident surface
452"‧‧‧反射部分 452"‧‧‧reflecting part
452a"‧‧‧第一反射部分 452a"‧‧‧First reflection part
452b"‧‧‧第二反射部分 452b"‧‧‧second reflection part
453"‧‧‧側入射表面 453"‧‧‧ side incident surface
454"‧‧‧反射表面 454"‧‧‧reflective surface
455"‧‧‧折射部分 455"‧‧‧Refracting part
455a"‧‧‧第一折射部分 455a"‧‧‧First Refraction Section
455b"‧‧‧第二折射部分 455b"‧‧‧second refraction part
456"‧‧‧凹陷部分 456"‧‧‧ recessed part
500‧‧‧回流防止部分 500‧‧‧Reflow prevention section
500'‧‧‧回流防止部分 500'‧‧‧Reflow prevention section
510‧‧‧環狀本體 510‧‧‧Circular body
511‧‧‧中央孔 511‧‧‧Central hole
520‧‧‧導銷 520‧‧ ‧ sales guide
600‧‧‧蓋子 600‧‧‧ cover
600'‧‧‧蓋子 600'‧‧‧ cover
610‧‧‧透鏡 610‧‧ lens
620'‧‧‧排放管道 620'‧‧‧Drainage pipe
700"‧‧‧間隔物 700"‧‧‧ spacers
710"‧‧‧中央孔 710"‧‧‧Central hole
800"‧‧‧電力供應單元 800"‧‧‧Power Supply Unit
810"‧‧‧驅動電路 810"‧‧‧ drive circuit
820"‧‧‧電極插腳 820"‧‧‧electrode pins
830"‧‧‧插腳固持器 830"‧‧‧ pin holder
1100‧‧‧板 1100‧‧‧ board
1110‧‧‧絕緣基板 1110‧‧‧Insert substrate
1111‧‧‧電路圖案 1111‧‧‧ circuit pattern
1112‧‧‧電路圖案 1112‧‧‧ circuit pattern
1130‧‧‧絕緣薄膜 1130‧‧‧Insulation film
1140‧‧‧上方熱擴散板 1140‧‧‧Upper heat diffusion plate
1150‧‧‧通孔 1150‧‧‧through hole
1160‧‧‧下方熱擴散板 1160‧‧‧lower heat diffusion plate
1200‧‧‧板 1200‧‧‧ board
1200'‧‧‧金屬板 1200'‧‧‧Metal sheet
1210‧‧‧第一金屬層 1210‧‧‧First metal layer
1210'‧‧‧第一金屬層 1210'‧‧‧First metal layer
1220‧‧‧絕緣層 1220‧‧‧Insulation
1220'‧‧‧絕緣層 1220'‧‧‧Insulation
1230‧‧‧第二金屬層 1230‧‧‧Second metal layer
1230'‧‧‧第二金屬層 1230'‧‧‧Second metal layer
1300‧‧‧板 1300‧‧‧ board
1310‧‧‧金屬支撐基板 1310‧‧‧Metal support substrate
1320‧‧‧RCC膜 1320‧‧‧RCC film
1321‧‧‧絕緣層 1321‧‧‧Insulation
1322‧‧‧銅箔片 1322‧‧‧Copper foil
1330‧‧‧保護層 1330‧‧‧Protective layer
1340‧‧‧焊料 1340‧‧‧ solder
1341‧‧‧焊料 1341‧‧‧ solder
1400‧‧‧陽極氧化金屬板 1400‧‧‧Anodized metal plate
1410‧‧‧金屬板 1410‧‧‧Metal plate
1420‧‧‧陽極氧化膜 1420‧‧‧Anodized film
1430‧‧‧金屬配線 1430‧‧‧Metal wiring
1500‧‧‧板 1500‧‧‧ board
1510‧‧‧金屬基板 1510‧‧‧Metal substrate
1520‧‧‧絕緣樹脂 1520‧‧‧Insulating resin
1530‧‧‧電路圖案 1530‧‧‧ circuit pattern
1600‧‧‧板 1600‧‧‧ board
1610‧‧‧FPCB 1610‧‧‧FPCB
1611‧‧‧通孔 1611‧‧‧through hole
1620‧‧‧支撐基板 1620‧‧‧Support substrate
1630‧‧‧金屬配線 1630‧‧‧Metal wiring
1640‧‧‧熱耗散黏著劑 1640‧‧‧Heat dissipative adhesive
2000‧‧‧發光元件 2000‧‧‧Lighting elements
2001‧‧‧基板 2001‧‧‧Substrate
2002‧‧‧緩衝層 2002‧‧‧buffer layer
2004‧‧‧第一導電類型半導體層 2004‧‧‧First Conductive Type Semiconductor Layer
2005‧‧‧主動層 2005‧‧‧Active layer
2006‧‧‧第二導電類型半導體層 2006‧‧‧Second conductive type semiconductor layer
2008‧‧‧歐姆接觸層 2008‧‧‧Ohm contact layer
2009a‧‧‧第一電極 2009a‧‧‧First electrode
2009b‧‧‧第二電極 2009b‧‧‧second electrode
2100‧‧‧LED晶片 2100‧‧‧LED chip
2101‧‧‧基板 2101‧‧‧Substrate
2102‧‧‧絕緣層 2102‧‧‧Insulation
2104‧‧‧第一導電類型半導體層 2104‧‧‧First Conductive Type Semiconductor Layer
2105‧‧‧主動層 2105‧‧‧Active layer
2106‧‧‧第二導電類型半導體層 2106‧‧‧Second conductive type semiconductor layer
2107‧‧‧第二電極層 2107‧‧‧Second electrode layer
2108‧‧‧第一電極層 2108‧‧‧First electrode layer
2109‧‧‧電極襯墊單元 2109‧‧‧Electrical pad unit
2200‧‧‧奈米LED晶片 2200‧‧‧ nano LED chip
2201‧‧‧基板 2201‧‧‧Substrate
2202‧‧‧基底層 2202‧‧‧ basal layer
2203‧‧‧光罩層 2203‧‧‧Photomask
2204‧‧‧第一導電類型奈米核心 2204‧‧‧First Conductive Type Nano Core
2205‧‧‧主動層 2205‧‧‧Active layer
2206‧‧‧第二導電類型半導體層 2206‧‧‧Second conductive type semiconductor layer
2207‧‧‧填料材料 2207‧‧‧Filling materials
2208‧‧‧歐姆接觸層 2208‧‧‧Ohm contact layer
2209a‧‧‧第一電極 2209a‧‧‧first electrode
2209b‧‧‧第二電極 2209b‧‧‧second electrode
2300‧‧‧半導體發光元件 2300‧‧‧Semiconductor light-emitting components
2301‧‧‧基板 2301‧‧‧Substrate
2303‧‧‧絕緣層 2303‧‧‧Insulation
2304‧‧‧第一導電類型半導體層 2304‧‧‧First Conductive Type Semiconductor Layer
2305‧‧‧主動層 2305‧‧‧Active layer
2306‧‧‧第二導電類型半導體層 2306‧‧‧Second conductive type semiconductor layer
2308a‧‧‧第一電極 2308a‧‧‧First electrode
2308b‧‧‧第二電極 2308b‧‧‧second electrode
2309a‧‧‧電連接單元 2309a‧‧‧Electrical connection unit
2309b‧‧‧電連接單元 2309b‧‧‧Electrical connection unit
2310‧‧‧LED晶片 2310‧‧‧LED chip
2311‧‧‧基板本體 2311‧‧‧Substrate body
2312a‧‧‧第一上方電極層 2312a‧‧‧First upper electrode layer
2312b‧‧‧第一下方電極層 2312b‧‧‧First lower electrode layer
2313‧‧‧穿孔 2313‧‧‧Perforation
2313a‧‧‧第二上方電極層 2313a‧‧‧Second upper electrode layer
2313b‧‧‧第二下方電極層 2313b‧‧‧Second lower electrode layer
2319a‧‧‧第一電極襯墊 2319a‧‧‧First electrode pad
2319b‧‧‧第二電極襯墊 2319b‧‧‧Second electrode pad
2320‧‧‧安裝基板 2320‧‧‧Installation substrate
10000‧‧‧發光系統 10000‧‧‧Lighting system
10000'‧‧‧發光系統 10000'‧‧‧Lighting system
10000"‧‧‧發光系統 10000"‧‧‧Lighting system
10010‧‧‧感測單元 10010‧‧‧Sensor unit
10011‧‧‧溫度感測器 10011‧‧‧temperature sensor
10012‧‧‧濕度感測器 10012‧‧‧Humidity Sensor
10020‧‧‧控制單元 10020‧‧‧Control unit
10030‧‧‧驅動單元 10030‧‧‧ drive unit
10040‧‧‧發光單元 10040‧‧‧Lighting unit
10041‧‧‧第一發光元件 10041‧‧‧First light-emitting element
10042‧‧‧第二發光元件 10042‧‧‧second light-emitting element
10100‧‧‧無線感測模組 10100‧‧‧Wireless Sensing Module
10110‧‧‧運動感測器 10110‧‧‧Sports sensor
10120‧‧‧發光強度感測器 10120‧‧‧Lighting intensity sensor
10130‧‧‧第一ZigBee通信單元 10130‧‧‧First ZigBee communication unit
10200‧‧‧無線發光控制裝置 10200‧‧‧Wireless lighting control device
10210‧‧‧第二ZigBee通信單元 10210‧‧‧Second ZigBee communication unit
10220‧‧‧感測信號分析單元 10220‧‧‧Sensor signal analysis unit
10230‧‧‧操作控制單元 10230‧‧‧Operation Control Unit
11000‧‧‧運動感測器單元 11000‧‧‧Sports sensor unit
12000‧‧‧發光強度感測器單元 12000‧‧‧Lighting intensity sensor unit
13000‧‧‧發光單元 13000‧‧‧Lighting unit
14000‧‧‧控制單元 14000‧‧‧Control unit
A‧‧‧空氣 A‧‧‧Air
A'‧‧‧空氣 A'‧‧‧Air
C‧‧‧不平整結構 C‧‧‧ uneven structure
E‧‧‧暴露區域 E‧‧‧Exposed areas
H‧‧‧接觸孔 H‧‧‧Contact hole
h‧‧‧深度 H‧‧‧depth
h1‧‧‧厚度 h 1 ‧‧‧thickness
h2‧‧‧厚度 h 2 ‧‧‧thickness
I‧‧‧絕緣距離 I‧‧‧Insulation distance
L‧‧‧發光層壓片 L‧‧‧Light laminate
M1‧‧‧模具 M1‧‧‧Mold
M2‧‧‧模具 M2‧‧‧Mold
N‧‧‧奈米發光結構 N‧‧N nm light structure
P‧‧‧頂出銷 P‧‧‧Top sales
O‧‧‧中心軸 O‧‧‧ center axis
R‧‧‧階梯部分 R‧‧‧ step part
s‧‧‧螺釘 S‧‧‧screw
S10~S60、S110~S130、S200~S240、S310~S350‧‧‧操作 S10~S60, S110~S130, S200~S240, S310~S350‧‧‧ operation
T1‧‧‧尺寸 T 1 ‧‧‧ size
T2‧‧‧尺寸 T 2 ‧‧‧ size
TL‧‧‧高度(或厚度) T L ‧‧‧height (or thickness)
TT‧‧‧尺寸 T T ‧‧‧ size
W1‧‧‧暴露寬度 W 1 ‧‧‧Exposure width
W2‧‧‧寬度 W 2 ‧‧‧Width
Z‧‧‧光軸 Z‧‧‧ optical axis
δ1‧‧‧斜角 δ 1 ‧‧‧ bevel
結合附圖,自以下詳細描述,將較清楚地理解上述及其他態樣、特徵以及其他優點。 The above and other aspects, features, and other advantages will be more clearly understood from the following detailed description.
圖1為示意性地說明根據一例示性實施例的發光裝置的分解透視圖。 FIG. 1 is an exploded perspective view schematically illustrating a light emitting device according to an exemplary embodiment.
圖2為示意性地說明根據一例示性實施例的發光裝置的橫截面圖。 FIG. 2 is a cross-sectional view schematically illustrating a light emitting device according to an exemplary embodiment.
圖3為示意性地說明圖1的發光裝置中的基底的透視圖。 FIG. 3 is a perspective view schematically illustrating a substrate in the light emitting device of FIG. 1. FIG.
圖4為示意性地說明冷卻風扇安置於圖3的基底上的狀態的透視圖。 4 is a perspective view schematically illustrating a state in which a cooling fan is disposed on the base of FIG. 3.
圖5為示意性地說明回流防止部分安置於圖4的冷卻風扇上的狀態的透視圖。 Fig. 5 is a perspective view schematically illustrating a state in which the backflow prevention portion is disposed on the cooling fan of Fig. 4.
圖6為示意性地說明根據一例示性實施例的發光裝置安裝於天花板上的狀態的橫截面圖。 FIG. 6 is a cross-sectional view schematically illustrating a state in which a light emitting device is mounted on a ceiling, according to an exemplary embodiment.
圖7為圖6的透視圖。 Figure 7 is a perspective view of Figure 6.
圖8為示意性地說明根據另一例示性實施例的發光裝置的分解透視圖。 FIG. 8 is an exploded perspective view schematically illustrating a light emitting device according to another exemplary embodiment.
圖9為示意性地說明根據另一例示性實施例的發光裝置的橫截面圖。 FIG. 9 is a cross-sectional view schematically illustrating a light emitting device according to another exemplary embodiment.
圖10為示意性地說明圖8的發光裝置中的基底的透視圖。 Figure 10 is a perspective view schematically illustrating a substrate in the light-emitting device of Figure 8.
圖11為示意性地說明冷卻風扇安置於圖10的基底上的狀態的透視圖。 Fig. 11 is a perspective view schematically illustrating a state in which a cooling fan is disposed on the base of Fig. 10.
圖12為示意性地說明回流防止部分安置於圖11的冷卻風扇上的狀態的透視圖。 Fig. 12 is a perspective view schematically illustrating a state in which the backflow prevention portion is disposed on the cooling fan of Fig. 11.
圖13為示意性地說明根據另一例示性實施例的發光裝置安裝於天花板上的狀態的橫截面圖。 FIG. 13 is a cross-sectional view schematically illustrating a state in which a light emitting device is mounted on a ceiling according to another exemplary embodiment.
圖14為圖13的透視圖。 Figure 14 is a perspective view of Figure 13.
圖15為示意性地說明根據另一例示性實施例的發光裝置的分解透視圖。 FIG. 15 is an exploded perspective view schematically illustrating a light emitting device according to another exemplary embodiment.
圖16為示意性地說明根據另一例示性實施例的發光裝置的橫截面圖。 FIG. 16 is a cross-sectional view schematically illustrating a light emitting device according to another exemplary embodiment.
圖17為示意性地說明根據另一例示性實施例的發光裝置安裝於天花板上的狀態的橫截面圖。 FIG. 17 is a cross-sectional view schematically illustrating a state in which a light emitting device is mounted on a ceiling according to another exemplary embodiment.
圖18為示意性地說明圖15的發光裝置的光源模組的透視圖。 Figure 18 is a perspective view schematically illustrating a light source module of the light-emitting device of Figure 15 .
圖19為示意性地說明圖18的光源模組的透鏡單元的透視圖。 19 is a perspective view schematically illustrating a lens unit of the light source module of FIG. 18.
圖20A及圖20B為示意性地說明圖19的透鏡單元的透鏡的剖視透視圖。 20A and 20B are cross-sectional perspective views schematically illustrating a lens of the lens unit of Fig. 19.
圖21為示意性地說明圖18的光源模組的光學路徑的橫截面圖。 21 is a cross-sectional view schematically illustrating an optical path of the light source module of FIG. 18.
圖22為說明透鏡的光分佈曲線的曲線圖。 Fig. 22 is a graph illustrating a light distribution curve of a lens.
圖23A至圖23C為示意性地說明使用模具來製造具有透鏡的透鏡單元的程序的橫截面圖。 23A to 23C are cross-sectional views schematically illustrating a procedure of manufacturing a lens unit having a lens using a mold.
圖24A及圖24B為示意性地說明具有一般結構的聚光透鏡及根據一或多個例示性實施例的輕薄透鏡的橫截面圖。 24A and 24B are cross-sectional views schematically illustrating a collecting lens having a general structure and a thin lens according to one or more exemplary embodiments.
圖25為示意性地說明可用於發光元件中的基板的一例示性實施例的橫截面圖。 Figure 25 is a cross-sectional view schematically illustrating an exemplary embodiment of a substrate that can be used in a light-emitting element.
圖26為示意性地說明基板的另一實施例的橫截面圖。 Figure 26 is a cross-sectional view schematically illustrating another embodiment of a substrate.
圖27為示意性地說明根據圖26的修改的基板的橫截面圖。 FIG. 27 is a cross-sectional view schematically illustrating a substrate according to the modification of FIG.
圖28至圖31為示意性地說明基板的各種例示性實施例的橫截面圖。 28 through 31 are cross-sectional views schematically illustrating various exemplary embodiments of a substrate.
圖32為示意性地說明根據各種例示性實施例的可用於發光元件中的發光元件(LED晶片)的一實例的橫截面圖。 FIG. 32 is a cross-sectional view schematically illustrating an example of a light-emitting element (LED wafer) usable in a light-emitting element, according to various exemplary embodiments.
圖33為示意性地說明圖32的發光元件(LED晶片)的另一實例的橫截面圖。 Fig. 33 is a cross-sectional view schematically illustrating another example of the light-emitting element (LED wafer) of Fig. 32.
圖34為示意性地說明圖32的發光元件(LED晶片)的另一實例的橫截面圖。 Fig. 34 is a cross-sectional view schematically illustrating another example of the light-emitting element (LED wafer) of Fig. 32.
圖35為說明安裝於安裝基板上的LED晶片的一實例的橫截面圖,所述LED晶片是作為根據各種例示性實施例的可用於發光元件中的發光元件(LED晶片)。 35 is a cross-sectional view illustrating an example of an LED wafer mounted on a mounting substrate as a light-emitting element (LED wafer) usable in a light-emitting element according to various exemplary embodiments.
圖36為國際照明委員會(International Commission on Illumination,CIE)1931色度圖。 Figure 36 is a 1931 chromaticity diagram of the International Commission on Illumination (CIE).
圖37為示意性地說明根據一實例實施例的發光系統的方塊圖。 FIG. 37 is a block diagram schematically illustrating a lighting system in accordance with an example embodiment.
圖38為示意性地說明根據一例示性實施例的圖37所說明的發光系統的發光單元的詳細組態的方塊圖。 FIG. 38 is a block diagram schematically illustrating a detailed configuration of a light emitting unit of the light emitting system illustrated in FIG. 37, according to an exemplary embodiment.
圖39為說明根據一例示性實施例的用於控制圖37所說明的發光系統的方法的流程圖。 FIG. 39 is a flow chart illustrating a method for controlling the illumination system illustrated in FIG. 37, in accordance with an exemplary embodiment.
圖40為示意性地說明根據一例示性實施例的圖37所說明的發光系統的使用的視圖。 FIG. 40 is a view schematically illustrating the use of the illumination system illustrated in FIG. 37, according to an exemplary embodiment.
圖41為根據另一例示性實施例的發光系統的方塊圖。 FIG. 41 is a block diagram of a lighting system in accordance with another exemplary embodiment.
圖42為說明根據一例示性實施例的ZigBee信號的格式的視圖。 FIG. 42 is a view illustrating a format of a ZigBee signal, according to an exemplary embodiment.
圖43為說明根據一例示性實施例的感測信號分析單元及操作控制單元的視圖。 FIG. 43 is a view illustrating a sensing signal analysis unit and an operation control unit, according to an exemplary embodiment.
圖44為說明根據一例示性實施例的無線發光系統的操作的流程圖。 44 is a flow chart illustrating operation of a wireless lighting system, in accordance with an illustrative embodiment.
圖45為示意性地說明根據另一例示性實施例的發光系統的構成部件的方塊圖。 FIG. 45 is a block diagram schematically illustrating constituent components of a lighting system according to another exemplary embodiment.
圖46為說明根據一例示性實施例的用於控制發光系統的方法的流程圖。 FIG. 46 is a flowchart illustrating a method for controlling an illumination system, according to an exemplary embodiment.
圖47為說明根據另一例示性實施例的用於控制發光系統的 方法的流程圖。 FIG. 47 illustrates a method for controlling a lighting system according to another exemplary embodiment. Flow chart of the method.
圖48為說明根據另一例示性實施例的用於控制發光系統的方法的流程圖。 FIG. 48 is a flowchart illustrating a method for controlling an illumination system, according to another exemplary embodiment.
提供以下詳細描述以輔助研讀者獲得對本文所述的方法、裝置及/或系統的全面理解。因此,將向一般熟習此項技術者建議本文所述的方法、裝置及/或系統的各種改變、修改及等效物。所述的處理步驟及/或操作的進程為實例;然而,操作的序列不限於本文所闡述的序列,且可如此項技術中所知而改變,而不是步驟及/或操作必須以特定次序發生。此外,為了清楚及簡潔起見,可能省略了熟知功能以及構造的個別描述。 The detailed description is provided to assist the reader in a comprehensive understanding of the methods, devices and/or systems described herein. Accordingly, various modifications, adaptations and equivalents of the methods, devices and/or systems described herein are suggested to those skilled in the art. The process steps and/or the processes of the operations are examples; however, the sequence of operations is not limited to the sequences set forth herein, and may be changed as known in the art, rather than steps and/or operations having to occur in a particular order. . In addition, well-known functions and individual descriptions of the construction may be omitted for clarity and conciseness.
現將參看附圖來詳細描述例示性實施例。下文中,將參看附圖來詳細描述例示性實施例。然而,例示性實施例可按照許多不同形式來體現且不應解釋為限於本文所闡述的例示性實施例。實情為,提供此等例示性實施例,使得本揭露將為全面且完整的,且將向熟習此項技術者傳達範疇。在附圖中,為了清楚起見,可能誇示了部件的形狀及尺寸,且相同參考數字將在全文用於表示相同或類似部件。 The illustrative embodiments will now be described in detail with reference to the drawings. Hereinafter, the exemplary embodiments will be described in detail with reference to the accompanying drawings. However, the illustrative embodiments may be embodied in many different forms and should not be construed as being limited to the illustrative embodiments set forth herein. Rather, these illustrative embodiments are provided so that this disclosure will be thorough and complete and will convey the scope of the invention. The shapes and sizes of the components may be exaggerated for the sake of clarity, and the same reference numerals will be used throughout the drawings to refer to the same or similar components.
雖然本文所使用的術語為當前廣泛使用且考慮到其功能而選擇的通用術語,但所述術語的含義可根據一般熟習此項技術者的意圖、司法先例或新技術的出現而變化。此外,一些特定術 語可由本申請人隨意選擇,在此狀況下,所述術語的含義可具體定義於例示性實施例的描述中。因此,所述術語應並非由其簡單名稱來定義,而是基於其含義及例示性實施例的描述的上下文來定義。如本文所使用,諸如「......中的至少一者」的表達在部件的清單之前時修飾部件的整個清單,而不是修飾清單的個別部件。 Although the terms used herein are generic terms that are currently widely used and are considered in view of their function, the meaning of the terms may vary depending on the intention of the person skilled in the art, the judicial precedent, or the appearance of new technology. In addition, some specific techniques The language can be arbitrarily selected by the applicant, and in this case, the meaning of the terms may be specifically defined in the description of the exemplary embodiments. Therefore, the terms should not be defined by their simple names, but by the context of their meaning and the description of the illustrative embodiments. As used herein, an expression such as "at least one of" is used to modify the entire list of parts before the list of parts, rather than the individual parts of the list.
應理解,術語「包含」及/或「包括」在用於本說明書中時指定所敍述的部件及/或組件的存在,但不排除一或多個部件及/或組件的存在或添加。如本文所使用,術語「模組」指可執行至少一個功能或操作且可利用任何形式的硬體、軟體或其組合來實施的單元。 It is to be understood that the term "comprising" and / or "comprising", when used in the specification, is intended to mean the presence of the components and/or components described, but does not exclude the presence or addition of one or more components and/or components. As used herein, the term "module" refers to a unit that can perform at least one function or operation and that can be implemented using any form of hardware, software, or a combination thereof.
將參看圖1及圖2來描述根據一例示性實施例的發光裝置。 A light emitting device according to an exemplary embodiment will be described with reference to FIGS. 1 and 2.
圖1為示意性地說明根據一例示性實施例的發光裝置的分解透視圖,且圖2為示意性地說明根據一例示性實施例的發光裝置的橫截面圖。 1 is an exploded perspective view schematically illustrating a light emitting device according to an exemplary embodiment, and FIG. 2 is a cross-sectional view schematically illustrating a light emitting device according to an exemplary embodiment.
參看圖1及圖2,根據一例示性實施例的發光裝置10可包含基底100、外殼200、冷卻風扇300及光源模組400。 Referring to FIGS. 1 and 2 , a light emitting device 10 according to an exemplary embodiment may include a substrate 100 , a housing 200 , a cooling fan 300 , and a light source module 400 .
基底100、具有冷卻風扇300的框架構件及光源模組400(框架構件及光源模組400安裝於基底100上以固定至基底100)可由耦接緣邊110及設置於耦接緣邊100的內側上的支撐板120耦接。 The substrate 100, the frame member having the cooling fan 300, and the light source module 400 (the frame member and the light source module 400 are mounted on the substrate 100 for fixing to the substrate 100) may be coupled to the rim 110 and disposed on the inner side of the coupling rim 100. The upper support plate 120 is coupled.
耦接緣邊110具有垂直於中心軸(O)的環狀形狀,且可 包含自所述耦接緣邊的下端向外突起的凸緣部分111。如圖6及圖7所說明,當發光裝置10安裝於一結構(例如,天花板1)上時,凸緣部分111可插入至設置於天花板1中的孔2中,藉此用以將發光裝置10固定至天花板1。 The coupling rim 110 has an annular shape perpendicular to the central axis (O) and is A flange portion 111 that protrudes outward from a lower end of the coupling rim is included. As illustrated in FIGS. 6 and 7, when the light-emitting device 10 is mounted on a structure (for example, the ceiling 1), the flange portion 111 can be inserted into the hole 2 provided in the ceiling 1, thereby being used for the light-emitting device. 10 fixed to the ceiling 1.
耦接緣邊110可設有朝向其中央部分凹陷的凹槽112。凹槽112可具有下文將描述的對應於外殼200的通道部分220的形狀,且可安置於對應於外殼200的通道部分220的位置中。藉此,通道部分220可連接至凹槽112以經由耦接緣邊110的下方部分而向外部暴露。 The coupling rim 110 may be provided with a recess 112 that is recessed toward a central portion thereof. The groove 112 may have a shape corresponding to the channel portion 220 of the outer casing 200 to be described later, and may be disposed in a position corresponding to the channel portion 220 of the outer casing 200. Thereby, the channel portion 220 can be coupled to the groove 112 to be exposed to the outside via the lower portion of the coupling rim 110.
本說明書所使用的術語(諸如,「上方部分」、「下方部分」、「上表面」、「下表面」及其類似者)是基於附圖而提供,且實際上,所述術語可根據發光裝置的安置方向而變化。 The terms used in the specification (such as "upper portion", "lower portion", "upper surface", "lower surface" and the like) are provided based on the drawings, and in fact, the term may be based on illumination The orientation of the device changes.
可參看圖3來詳細描述本例示性實施例所使用的基底100。如圖3所示,支撐板120可在垂直於中心軸(O)方向的水平方向上設置於耦接緣邊110的內圓周表面上,且可部分連接至耦接緣邊110。支撐板120可具有彼此相對的一平坦表面(上表面)120a及另一表面(下表面)120b,且多個熱輻射鰭片121可設置於表面120a上。多個熱輻射鰭片121徑向配置於自支撐板120的中心朝向其邊緣的方向上。在此狀況下,多個熱輻射鰭片121分別具有彎曲表面且可整體以螺旋形狀配置。圖3的例示性實施例說明,具有彎曲表面的多個熱輻射鰭片121以螺旋形狀配置。然而,應理解,一或多個其他例示性實施例不限於此,且熱輻射鰭 片121可具有各種形狀,例如,線性形狀。 The substrate 100 used in the present exemplary embodiment can be described in detail with reference to FIG. As shown in FIG. 3, the support plate 120 may be disposed on the inner circumferential surface of the coupling rim 110 in a horizontal direction perpendicular to the central axis (O) direction, and may be partially connected to the coupling rim 110. The support plate 120 may have a flat surface (upper surface) 120a and another surface (lower surface) 120b opposed to each other, and a plurality of heat radiation fins 121 may be disposed on the surface 120a. The plurality of heat radiation fins 121 are radially disposed in a direction from the center of the support plate 120 toward the edges thereof. In this case, the plurality of heat radiation fins 121 each have a curved surface and may be integrally arranged in a spiral shape. The exemplary embodiment of FIG. 3 illustrates that a plurality of heat radiating fins 121 having curved surfaces are arranged in a spiral shape. However, it should be understood that one or more other exemplary embodiments are not limited thereto, and the heat radiating fins Sheet 121 can have a variety of shapes, such as a linear shape.
表面120a可具有自其突起預定高度的固定部分122。固定部分122可設有螺紋孔,以使得下文將描述的外殼200及冷卻風扇300可由諸如螺釘s之固定機構固定。 The surface 120a may have a fixed portion 122 from which a predetermined height is raised. The fixing portion 122 may be provided with a screw hole so that the outer casing 200 and the cooling fan 300 which will be described later may be fixed by a fixing mechanism such as a screw s.
下文將描述的光源模組400可安裝於支撐板120的另一表面120b上。另一表面120b可具有沿著其邊緣且向下突起預定深度的側壁123。具有預定尺寸的空間設置於側壁123的內側內以在其中容納光源模組400。 The light source module 400, which will be described later, can be mounted on the other surface 120b of the support plate 120. The other surface 120b can have a sidewall 123 that protrudes a predetermined depth along its edge and downward. A space having a predetermined size is disposed inside the side wall 123 to accommodate the light source module 400 therein.
基底100可包含空氣排放孔130,其在支撐板120的外圓周表面與耦接緣邊110的內表面之間具有狹縫形狀。空氣排放孔130可充當使空氣在自表面120a至另一表面120b的方向上穿過的通路,以使得空氣不在表面120a的一側停滯,且維持所述空氣的連續流動。 The substrate 100 may include an air discharge hole 130 having a slit shape between an outer circumferential surface of the support plate 120 and an inner surface of the coupling rim 110. The air discharge hole 130 may serve as a passage through which air passes in the direction from the surface 120a to the other surface 120b such that air does not stagnate on one side of the surface 120a and maintains continuous flow of the air.
基底100可為直接接觸作為熱源而設置的光源模組400的部分,且因此可包含具有優良熱導率以便執行與散熱片類似的熱輻射功能的材料。舉例而言,耦接緣邊110及支撐板120整體形成的基底100可藉由使用具有優良熱導率的金屬或樹脂或其類似者進行射出成型而形成。此外,耦接緣邊110及支撐板120可個別地製造為個別組件且接著組裝。在此狀況下,支撐板120可由具有優良熱導率的金屬或樹脂形成,而耦接緣邊110(即,在諸如發光裝置替換的工作操作期間由使用者直接握取的部分)可由具有相對低的熱導率以防止燒毀損壞的材料形成。 The substrate 100 may be a portion that directly contacts the light source module 400 disposed as a heat source, and thus may include a material having excellent thermal conductivity to perform a heat radiation function similar to that of the heat sink. For example, the substrate 100 integrally formed by the coupling rim 110 and the support plate 120 can be formed by injection molding using a metal or resin having excellent thermal conductivity or the like. Additionally, the coupling rim 110 and the support plate 120 can be individually fabricated as individual components and then assembled. In this case, the support plate 120 may be formed of metal or resin having excellent thermal conductivity, and the coupling rim 110 (ie, a portion directly grasped by a user during a working operation such as replacement of the illuminating device) may have a relative Low thermal conductivity to prevent the formation of burnt damaged materials.
如圖1及圖2所示,外殼200可耦接至基底100的一側,特定言之,耦接至耦接緣邊110以覆蓋支撐板120。外殼200具有向上凸起的抛物線形狀,且可包含:端子部分210,位於外殼200的上端上以便與外部電源(例如,插座)連接;以及開口,形成於外殼200的下端中,耦接至基底100。特定言之,外殼200包含:通道部分220,形成相對於外殼200的外表面以階梯方式凹陷的區域以便自外部導引空氣的引入;以及空氣引入孔230,將經由通道部分220而經導引的空氣引入至外殼200的內部空間中。 As shown in FIGS. 1 and 2 , the outer casing 200 can be coupled to one side of the substrate 100 , and in particular to the coupling rim 110 to cover the support plate 120 . The outer casing 200 has an upwardly convex parabolic shape and may include a terminal portion 210 on an upper end of the outer casing 200 for connection with an external power source (eg, a socket), and an opening formed in the lower end of the outer casing 200 coupled to the base 100. Specifically, the outer casing 200 includes a channel portion 220 that forms a region recessed in a stepwise manner with respect to an outer surface of the outer casing 200 to guide introduction of air from the outside, and an air introduction hole 230 to be guided via the channel portion 220. The air is introduced into the internal space of the outer casing 200.
空氣引入孔230可鄰近於外殼200的上端,且形成為沿著外殼200的圓周而具有環狀形狀。通道部分220可包含多個通道,且通道部分220可按一種方式設置,所述方式使得至少一個通道在外殼200的外表面中凹進,且自外殼200的下端沿著外殼200的外側向上延伸,以與空氣引入孔230連通。 The air introduction hole 230 may be adjacent to the upper end of the outer casing 200 and formed to have an annular shape along the circumference of the outer casing 200. The channel portion 220 can include a plurality of channels, and the channel portion 220 can be disposed in a manner such that at least one channel is recessed in the outer surface of the outer casing 200 and extends upwardly from the lower end of the outer casing 200 along the outer side of the outer casing 200. To communicate with the air introduction hole 230.
具體言之,通道部分220可包含:第一通道221,在對應於空氣引入孔230的位置沿著外殼200的圓周,以與空氣引入孔230連通;以及第二通道222,自第一通道221延伸至外殼200的下端以向外部暴露。第二通道222可連續連接至經耦接至外殼200的下端的耦接緣邊110的凹槽112,且可延伸至耦接緣邊110的下方部分以向外部暴露。因此,自外部引入的空氣可沿著外殼200的外表面的一部分(亦即,通道部分220)自耦接緣邊110的下方部分導引至耦接緣邊110的上方部分,且可接著經由空氣引入孔230而引入至外殼200的內部空間中。本例示性實施例說明,第二 通道222可成對設置,所述成對的通道222面向彼此。然而,應理解,一或多個其他例示性實施例不限於此,且第二通道222的數目及位置可按各種方式修改。 In particular, the channel portion 220 may include a first passage 221 that is continuous along the circumference of the outer casing 200 at a position corresponding to the air introduction hole 230 to communicate with the air introduction hole 230, and a second passage 222 from the first passage 221 It extends to the lower end of the outer casing 200 to be exposed to the outside. The second passage 222 may be continuously connected to the groove 112 coupled to the coupling rim 110 of the lower end of the outer casing 200, and may extend to a lower portion of the coupling rim 110 to be exposed to the outside. Thus, air introduced from the outside may be guided along a portion of the outer surface of the outer casing 200 (ie, the channel portion 220) from a lower portion of the coupling rim 110 to an upper portion of the coupling rim 110, and may then be via The air is introduced into the hole 230 to be introduced into the inner space of the outer casing 200. This exemplary embodiment illustrates that the second Channels 222 may be arranged in pairs, with pairs of channels 222 facing each other. However, it should be understood that one or more other exemplary embodiments are not limited thereto, and the number and location of the second channels 222 can be modified in various ways.
圖4示意性地說明基底100上的冷卻風扇300的安置狀態。如圖4所說明,冷卻風扇300可設置於外殼200中。冷卻風扇300可安置於支撐板120表面120a上,且可強制性地將空氣(自外部引入的空氣)吸入至外殼200的內部空間中,且經由空氣排放孔130而將所吸入的空氣排放至外部。經由此強制性空氣流動,自安裝於基底100上的光源模組400產生的熱可迅速發散至外部,從而降低發光裝置10的溫度。 FIG. 4 schematically illustrates the placement state of the cooling fan 300 on the substrate 100. As illustrated in FIG. 4, the cooling fan 300 may be disposed in the outer casing 200. The cooling fan 300 may be disposed on the surface 120a of the support plate 120, and may forcibly suck air (air introduced from the outside) into the inner space of the outer casing 200, and discharge the sucked air to the air through the air discharge hole 130 to external. By this forced air flow, heat generated from the light source module 400 mounted on the substrate 100 can be quickly dissipated to the outside, thereby lowering the temperature of the light-emitting device 10.
冷卻風扇300可安置於支撐板120的固定部分122上,以可支撐地固定至固定部分122。冷卻風扇300(具體言之,冷卻風扇300的上表面)可定位為與外殼200的空氣引入孔230共面,或可安置於低於空氣引入孔230的位置中。藉此,經由空氣引入孔230而吸入至外殼200的內部空間中的空氣可穿過冷卻風扇300,且移動至基底100以實現簡化的空氣移動路徑,進而空氣流動可平穩地進行以改良熱輻射效率。 The cooling fan 300 may be disposed on the fixed portion 122 of the support plate 120 to be supportably fixed to the fixed portion 122. The cooling fan 300 (specifically, the upper surface of the cooling fan 300) may be positioned to be coplanar with the air introduction hole 230 of the outer casing 200, or may be disposed in a position lower than the air introduction hole 230. Thereby, the air sucked into the inner space of the outer casing 200 via the air introduction hole 230 can pass through the cooling fan 300 and move to the substrate 100 to realize a simplified air moving path, and thus the air flow can be smoothly performed to improve the heat radiation. effectiveness.
圖5示意性地說明冷卻風扇300上的回流防止部分500的安置。如圖5所說明,回流防止部分500可安置於冷卻風扇300上且防止經由冷卻風扇300吸入至外殼200的內部空間中的空氣反向流動。回流防止部分500可包含環狀本體510,環狀本體510具有中央孔511及延伸至中央孔511的多個導銷520。本例示性實 施例說明,多個導銷520彎曲以具有彎曲表面且以螺旋形狀配置。然而,應理解一或多個其他例示性實施例不限於此。 FIG. 5 schematically illustrates the placement of the backflow prevention portion 500 on the cooling fan 300. As illustrated in FIG. 5, the backflow prevention portion 500 may be disposed on the cooling fan 300 and prevent reverse flow of air sucked into the inner space of the outer casing 200 via the cooling fan 300. The backflow prevention portion 500 may include an annular body 510 having a central hole 511 and a plurality of guide pins 520 extending to the central hole 511. This example The embodiment illustrates that the plurality of guide pins 520 are curved to have a curved surface and are arranged in a spiral shape. However, it should be understood that one or more other exemplary embodiments are not limited thereto.
環狀本體510可經設置以使得其外表面接觸外殼200的內表面,進而冷卻風扇300與外殼200之間的間隙可得以阻塞。中央孔511可具有對應於冷卻風扇300的形狀的形狀。環狀本體510可定位為與外殼200的空氣引入孔230至少共面,或可安置於低於空氣引入孔230的位置中。在此狀況下,冷卻風扇300可安置於低於回流防止部分500的位置中。因此,經由空氣引入孔230而吸入至外殼200的內部空間中的空氣可經由環狀本體510的中央孔511而流動至冷卻風扇300。 The annular body 510 can be disposed such that its outer surface contacts the inner surface of the outer casing 200, so that the gap between the cooling fan 300 and the outer casing 200 can be blocked. The central hole 511 may have a shape corresponding to the shape of the cooling fan 300. The annular body 510 can be positioned at least coplanar with the air introduction aperture 230 of the outer casing 200 or can be disposed in a position lower than the air introduction aperture 230. In this case, the cooling fan 300 may be disposed in a position lower than the backflow prevention portion 500. Therefore, the air sucked into the inner space of the outer casing 200 via the air introduction hole 230 can flow to the cooling fan 300 via the central hole 511 of the annular body 510.
同時,如圖1及圖2所示,光源模組400可安裝於經設置了多個熱輻射鰭片121的支撐板120的第一表面120a相對的另一表面120b上,且發出光。光源模組400可包含基板410及安裝於基板410上的至少一個發光元件420。 Meanwhile, as shown in FIGS. 1 and 2, the light source module 400 may be mounted on the other surface 120b opposite to the first surface 120a of the support plate 120 on which the plurality of heat radiation fins 121 are disposed, and emit light. The light source module 400 can include a substrate 410 and at least one light emitting element 420 mounted on the substrate 410.
基板410可為一般FR4型印刷電路板(PCB),且可包含含有環氧樹脂(epoxy)、三氮雜苯(triazine)、矽(silicon)、聚醯亞胺(polyimide)或其類似者的有機樹脂材料以及其他有機樹脂材料。或者,基板410可包含陶瓷材料(諸如,氮化鋁(AIN)、三氧化二鋁(Al2O3)或其類似者)或金屬及金屬化合物材料,且可為金屬核心印刷電路板(metal core printed circuit board,MCPCB)。 The substrate 410 may be a general FR4 type printed circuit board (PCB), and may include an epoxy resin, a triazine, a silicon, a polyimide, or the like. Organic resin materials and other organic resin materials. Alternatively, the substrate 410 may comprise a ceramic material such as aluminum nitride (AIN), aluminum oxide (Al 2 O 3 ) or the like or a metal and metal compound material, and may be a metal core printed circuit. Board,MCPCB).
發光元件420可安裝於基板410上且可電性連接至基板410。發光元件420(即,由於外部電力而產生預定波長的光的半 導體元件)可包含發光二極體(LED)。發光元件420可根據其中所含有的材料而發射藍光、綠光或紅光,且可發射白光。 The light emitting element 420 can be mounted on the substrate 410 and can be electrically connected to the substrate 410. Light-emitting element 420 (ie, half of light of a predetermined wavelength due to external power) The conductor element) may comprise a light emitting diode (LED). The light emitting element 420 can emit blue light, green light, or red light according to a material contained therein, and can emit white light.
發光元件420可按複數形式來設置,且多個發光元件420可配置於基板410上。在此狀況下,多個發光元件420可按各種方式組態,諸如,組態為產生相同波長的光的相同類型的元件或產生不同波長的光的不同類型的元件。發光元件420可為LED晶片,或可為其中包含LED晶片的單個封裝。 The light emitting elements 420 may be disposed in a plurality of forms, and the plurality of light emitting elements 420 may be disposed on the substrate 410. In this case, the plurality of light-emitting elements 420 can be configured in various ways, such as the same type of elements configured to produce light of the same wavelength or different types of elements that produce light of different wavelengths. Light emitting element 420 can be an LED wafer or can be a single package containing LED wafers therein.
同時,覆蓋基板410及發光元件420的蓋子600可安裝於基底100上。蓋子600可包含透明或半透明材料(例如,樹脂,諸如,矽、環氧樹脂或其類似者),以便向外發出自光源模組400產生的光,且亦可包含玻璃。 Meanwhile, the cover 600 covering the substrate 410 and the light emitting element 420 may be mounted on the substrate 100. The cover 600 may comprise a transparent or translucent material (eg, a resin such as tantalum, epoxy, or the like) to illuminate light generated from the light source module 400 and may also include glass.
蓋子600可包含透鏡610以對應於個別發光元件420。透鏡610可經安置以面向個別發光元件420,且控制自發光元件420產生的光的方向角(orientation angle)。本例示性實施例說明,蓋子600具有設置於其上的透鏡610以對應於個別發光元件420。然而,應理解,一或多個例示性實施例不限於此。蓋子600可按凸透鏡形狀突起,以使得蓋子600可自身充當透鏡。 Cover 600 can include lens 610 to correspond to individual light emitting elements 420. Lens 610 can be positioned to face individual light-emitting elements 420 and control the orientation angle of light generated from light-emitting elements 420. The present exemplary embodiment illustrates that the cover 600 has a lens 610 disposed thereon to correspond to the individual light-emitting elements 420. However, it should be understood that one or more exemplary embodiments are not limited thereto. The cover 600 may protrude in a convex lens shape such that the cover 600 may itself function as a lens.
蓋子600可含有光擴散劑。光擴散劑可具有奈米級粒子尺寸,且包含自SiO2、TiO2、Al2O3及其類似者選擇的至少一種材料。 The cover 600 may contain a light diffusing agent. The light diffusing agent may have a nano-sized particle size and comprise at least one material selected from the group consisting of SiO2, TiO2, Al2O3, and the like.
圖6及圖7示意性地說明根據本例示性實施例的發光裝置10安裝於天花板1上的方式。固定單元3可安裝於天花板1上, 且可將發光裝置10耦接並固定至天花板1。固定單元3可將電力供應至發光裝置10。發光裝置10可由固定單元3以密封狀態固定至天花板1的上方部分。 6 and 7 schematically illustrate a manner in which the light emitting device 10 is mounted on the ceiling 1 according to the present exemplary embodiment. The fixing unit 3 can be mounted on the ceiling 1 And the light emitting device 10 can be coupled and fixed to the ceiling 1. The fixing unit 3 can supply electric power to the light emitting device 10. The light emitting device 10 can be fixed to the upper portion of the ceiling 1 in a sealed state by the fixing unit 3.
如圖6及圖7所說明,發光裝置10可按一種方式耦接至天花板1,所述方式使得耦接緣邊110插入至天花板1的孔2中。天花板1的孔2可設置為對應於耦接緣邊110,且因此,除對應於耦接緣邊110的凹槽112的空間之外,間隙可未產生於耦接緣邊110與孔2之間。本例示性實施例說明,發光裝置10插入至天花板1的孔2中。然而,應理解,一或多個其他例示性實施例不限於此。亦即,固定單元3可插入且安裝於天花板1的孔2中,且發光裝置10可經由耦接緣邊110而插入且耦接至固定單元3。即使在此狀況下,除對應於耦接緣邊110的凹槽112的空間之外,間隙可未產生於耦接緣邊110與凹槽112之間。 As illustrated in Figures 6 and 7, the lighting device 10 can be coupled to the ceiling 1 in a manner such that the coupling rim 110 is inserted into the aperture 2 of the ceiling 1. The hole 2 of the ceiling 1 may be disposed to correspond to the coupling rim 110, and therefore, the gap may not be generated by the coupling rim 110 and the hole 2 except for the space corresponding to the groove 112 of the coupling rim 110. between. The present exemplary embodiment illustrates that the light emitting device 10 is inserted into the hole 2 of the ceiling 1. However, it should be understood that one or more other exemplary embodiments are not limited thereto. That is, the fixing unit 3 can be inserted and mounted in the hole 2 of the ceiling 1 , and the light emitting device 10 can be inserted and coupled to the fixed unit 3 via the coupling rim 110 . Even in this case, a gap may not be generated between the coupling rim 110 and the groove 112 except for the space corresponding to the groove 112 of the coupling rim 110.
當安置於外殼200中的冷卻風扇300經由供應至冷卻風扇300的電力而操作時,空氣A經由凹槽112(即,設置於耦接緣邊110與天花板1之間的空間)而自外部引入,且所引入的空氣A可在自外殼200的下端至其上端的方向上沿著外殼200的外表面中的通道部分220而導引。此外,空氣A可經由外殼200的空氣引入孔230而吸入至外殼200的內部空間中。吸入至外殼200的內部空間中的空氣A可經由冷卻風扇300而轉移至基底100的支撐板120,沿著設置於支撐板120上的熱輻射鰭片121而徑向分散至支撐板120的邊緣,且經由空氣排放孔130而排放至外部。 在此狀況下,支撐板120上的所加熱的空氣A'可被強制性地吸入至外殼200中,且與排放至外部的空氣A的流動一起排放至外部,進而支撐板120及安裝於支撐板120上的光源模組400可冷卻。此外,外殼200的內部可由於連續吸入至外殼200中且具有低溫的空氣A而冷卻。特定言之,根據本例示性實施例的發光裝置10可在外殼200的外表面中包含通道部分220以便實現空氣A的流動。因此,即使在發光裝置10安裝於覆蓋外殼200的密封固定單元3(例如,具有對應於外殼的形狀的形狀且緊密附著至外殼的外表面的插座結構)內的狀況下,自外部引入的空氣A可經由由於通道部分220而形成的空間吸入至外殼200中。如上所述,自外部引入且具有低溫的空氣A可被強制性地吸入以冷卻發光裝置10,進而熱輻射效率可顯著提高以改良發光效率且延長光源模組400的使用壽命。 When the cooling fan 300 disposed in the outer casing 200 is operated via electric power supplied to the cooling fan 300, the air A is introduced from the outside via the groove 112 (ie, a space provided between the coupling rim 110 and the ceiling 1) And the introduced air A can be guided along the channel portion 220 in the outer surface of the outer casing 200 in the direction from the lower end to the upper end of the outer casing 200. Further, the air A can be drawn into the inner space of the outer casing 200 through the air introduction hole 230 of the outer casing 200. The air A sucked into the inner space of the outer casing 200 may be transferred to the support plate 120 of the substrate 100 via the cooling fan 300, and radially dispersed to the edge of the support plate 120 along the heat radiation fins 121 provided on the support plate 120. And discharged to the outside via the air discharge hole 130. In this case, the heated air A' on the support plate 120 can be forcibly sucked into the outer casing 200 and discharged to the outside together with the flow of the air A discharged to the outside, thereby supporting the plate 120 and being mounted on the support The light source module 400 on the board 120 can be cooled. Further, the inside of the outer casing 200 may be cooled by continuous suction into the outer casing 200 and having low temperature air A. In particular, the light emitting device 10 according to the present exemplary embodiment may include the channel portion 220 in the outer surface of the outer casing 200 in order to achieve the flow of the air A. Therefore, even in the case where the light-emitting device 10 is mounted in the sealing fixing unit 3 covering the outer casing 200 (for example, a socket structure having a shape corresponding to the shape of the outer casing and closely attached to the outer surface of the outer casing), air introduced from the outside A may be drawn into the outer casing 200 via a space formed by the passage portion 220. As described above, the air A introduced from the outside and having a low temperature can be forcibly sucked in to cool the light-emitting device 10, whereby the heat radiation efficiency can be remarkably improved to improve the luminous efficiency and extend the life of the light source module 400.
參看圖8及圖9,將描述根據另一例示性實施例的發光裝置。 Referring to Figures 8 and 9, a light emitting device according to another exemplary embodiment will be described.
圖8為示意性地說明根據另一例示性實施例的發光裝置的分解透視圖,且圖9為示意性地說明根據另一例示性實施例的發光裝置的橫截面圖。 FIG. 8 is an exploded perspective view schematically illustrating a light emitting device according to another exemplary embodiment, and FIG. 9 is a cross-sectional view schematically illustrating a light emitting device according to another exemplary embodiment.
組態根據圖8及圖9所說明的另一例示性實施例的發光裝置的組件就其基本結構而言,實質上與圖1至圖7所說明的例示性實施例的發光裝置的組件相同或類似。然而,因為根據另一例示性實施例的基底及光源模組具有與根據圖1至圖7所說明的 例示性實施例的基底及光源模組不同的結構,所以將省略與前述例示性實施例的組件的描述重疊的組件的描述,且將主要描述基底及光源模組的組態。 The components of the light-emitting device configured in accordance with another exemplary embodiment illustrated in FIGS. 8 and 9 are substantially the same as the components of the light-emitting device of the exemplary embodiment illustrated in FIGS. 1 through 7 in terms of its basic structure Or similar. However, since the substrate and the light source module according to another exemplary embodiment have the same as explained with reference to FIGS. 1 to 7 The substrate and the light source module of the exemplary embodiment have different structures, so a description of components overlapping with the description of the components of the foregoing exemplary embodiments will be omitted, and the configuration of the substrate and the light source module will be mainly described.
參看圖8及圖9,根據另一例示性實施例的發光裝置10'可包含基底100'、外殼200'、冷卻風扇300'及光源模組400'。 Referring to FIGS. 8 and 9, a light emitting device 10' according to another exemplary embodiment may include a substrate 100', a housing 200', a cooling fan 300', and a light source module 400'.
基底100'可包含耦接緣邊110'及設置於耦接緣邊110'的內側上的支撐板120'。 The substrate 100' can include a coupling rim 110' and a support plate 120' disposed on the inner side of the coupling rim 110'.
耦接緣邊110'具有安置為平行於中心軸(O)的環狀形狀,且可包含自其下端向外突起的凸緣部分111'。如圖13及圖14所說明,當發光裝置10'安裝於一結構(例如,天花板1)上時,凸緣部分111'可插入至形成於天花板1中的孔2中,藉此用以將發光裝置10'固定至天花板1。 The coupling rim 110' has an annular shape disposed parallel to the central axis (O), and may include a flange portion 111' that protrudes outward from the lower end thereof. As illustrated in FIGS. 13 and 14, when the light-emitting device 10' is mounted on a structure (for example, the ceiling 1), the flange portion 111' can be inserted into the hole 2 formed in the ceiling 1, whereby The light emitting device 10' is fixed to the ceiling 1.
凸緣部分111'可具有位於耦接緣邊110'的圓周中的多個通氣孔113'。多個通氣孔113'可連接至外殼200'的通道部分220',以使得空氣A可穿過通氣孔113'且移動至通道部分220'。 The flange portion 111' can have a plurality of vents 113' located in the circumference of the coupling rim 110'. A plurality of vents 113' may be coupled to the channel portion 220' of the outer casing 200' such that air A may pass through the vent 113' and move to the channel portion 220'.
將在下文參看圖10來詳細描述本例示性實施例所使用的基底100'。如圖10所說明,支撐板120'可設置於耦接緣邊110'的內圓周表面上,以使得支撐板120'垂直於中心軸(O)且其外圓周表面整體可連接至耦接緣邊110'。 The substrate 100' used in the present exemplary embodiment will be described in detail below with reference to FIG. As illustrated in FIG. 10, the support plate 120' may be disposed on the inner circumferential surface of the coupling rim 110' such that the support plate 120' is perpendicular to the central axis (O) and its outer circumferential surface is integrally connectable to the coupling edge. Side 110'.
支撐板120'可具有彼此相對的一表面(上表面)120a'及另一表面(下表面)120b',且多個熱輻射鰭片121'可設置於第一表面120a'上。多個熱輻射鰭片121'徑向配置於自支撐板120'的中 心朝向其邊緣的方向上。在此狀況下,多個熱輻射鰭片121'分別具有彎曲表面且可整體以螺旋形狀配置。本例示性實施例說明,具有彎曲表面的多個熱輻射鰭片121'以螺旋形狀配置。然而,應理解,一或多個其他例示性實施例不限於此,且熱輻射鰭片121'可具有各種形狀,例如,線性形狀。 The support plate 120' may have one surface (upper surface) 120a' and another surface (lower surface) 120b' opposite to each other, and a plurality of heat radiation fins 121' may be disposed on the first surface 120a'. The plurality of heat radiation fins 121 ′ are radially disposed in the self-supporting plate 120 ′ The heart is facing the direction of its edge. In this case, the plurality of heat radiation fins 121' each have a curved surface and may be integrally arranged in a spiral shape. The present exemplary embodiment illustrates that a plurality of heat radiation fins 121' having curved surfaces are arranged in a spiral shape. However, it should be understood that one or more other exemplary embodiments are not limited thereto, and the heat radiation fins 121' may have various shapes, for example, a linear shape.
表面120a'可具有自其突起預定高度的固定部分122'。固定部分122'可設有螺紋孔,以使得外殼200'及冷卻風扇300'可由諸如,螺釘s之固定機構固定。 The surface 120a' may have a fixed portion 122' from which a predetermined height is raised. The fixed portion 122' may be provided with a threaded hole such that the outer casing 200' and the cooling fan 300' may be fixed by a fixing mechanism such as a screw s.
光源模組400'可安裝於支撐板120'的另一表面120b'上。另一表面120b'可設有沿著其邊緣且向下突起預定深度的側壁123'。具有預定尺寸的空間設置於側壁123'的內側內以在其中容納光源模組400'。 The light source module 400' can be mounted on the other surface 120b' of the support plate 120'. The other surface 120b' may be provided with side walls 123' along its edges and projecting downwardly to a predetermined depth. A space having a predetermined size is disposed inside the side wall 123' to accommodate the light source module 400' therein.
基底100'可在支撐板120'的中央部分中包含空氣排放孔130'。空氣排放孔130'可充當使空氣A'在自表面120a'至另一表面120b'的方向上穿過的通路,以使得空氣A未在表面120a'一側停滯,且維持空氣的連續流動。 The substrate 100' may include an air discharge hole 130' in a central portion of the support plate 120'. The air discharge hole 130' may serve as a passage through which the air A' passes in the direction from the surface 120a' to the other surface 120b' such that the air A does not stagnate on the side of the surface 120a' and maintains a continuous flow of air.
圖11示意性地說明冷卻風扇300'安置於基底100'上的狀態。如圖11所說明,冷卻風扇300'安置於支撐板120'的表面120a'上。冷卻風扇300'可固定至固定部分122'。 Fig. 11 schematically illustrates a state in which the cooling fan 300' is placed on the substrate 100'. As illustrated in Figure 11, the cooling fan 300' is disposed on the surface 120a' of the support plate 120'. The cooling fan 300' can be fixed to the fixed portion 122'.
如圖12所說明,回流防止部分500'可安置於冷卻風扇300'的上方部分中。 As illustrated in Fig. 12, the backflow prevention portion 500' may be disposed in an upper portion of the cooling fan 300'.
外殼200'可耦接至基底100'的耦接緣邊110'以覆蓋支撐 板120'。外殼200'具有向上凸起的抛物線形狀,且可包含:端子部分210',位於外殼200'的上端上以便與插座連接;以及開口,位於外殼200'的下端中,耦接至基底100'。外殼200'包含:通道部分220',形成相對於外殼200'的外表面以階梯方式凹陷的區域以便自外部導引空氣A的引入;以及空氣引入孔230',將經由通道部分220'而導引的空氣A引入至外殼200'的內部空間中。 The outer casing 200' can be coupled to the coupling rim 110' of the substrate 100' to cover the support Board 120'. The outer casing 200' has an upwardly convex parabolic shape and may include a terminal portion 210' on the upper end of the outer casing 200' for connection with the socket, and an opening, located in the lower end of the outer casing 200', coupled to the substrate 100'. The outer casing 200' includes: a channel portion 220' forming a region recessed in a stepwise manner with respect to an outer surface of the outer casing 200' to guide introduction of air A from the outside; and an air introduction hole 230' to be guided via the channel portion 220' The introduced air A is introduced into the inner space of the outer casing 200'.
空氣引入孔230'可鄰近於外殼200'的上端,且可沿著外殼200'的圓周而具有環狀形狀。通道部分220'可包含多個通道,且通道部分220'可按一種方式設置,所述方式使得至少一個通道在外殼200'的外表面中凹進以與空氣引入孔230'連通,且自外殼200'的下端沿著外殼200的外側向上延伸,以與空氣引入孔230'連通。 The air introduction hole 230' may be adjacent to the upper end of the outer casing 200' and may have an annular shape along the circumference of the outer casing 200'. The channel portion 220' can include a plurality of channels, and the channel portion 220' can be disposed in a manner such that at least one channel is recessed in the outer surface of the outer casing 200' to communicate with the air introduction hole 230', and from the outer casing The lower end of the 200' extends upward along the outer side of the outer casing 200 to communicate with the air introduction hole 230'.
通道部分220'可連續連接至經耦接至外殼200'的下端的耦接緣邊110'的通氣孔113',且可經由通氣孔113'而向外部暴露。因此,自外部引入的空氣A可沿著外殼200'的外表面的一部分(亦即,通道部分220')自耦接緣邊110'的下方部分穿過通氣孔113'而導引至耦接緣邊110'的上方部分,且可接著經由空氣引入孔230'而引入至外殼200'的內部空間中。圖8所說明的例示性實施例與圖1的例示性實施例的不同之處在於,圖8的通道部分220'可佔用外殼200'的表面積的較大部分。本例示性實施例說明,通道部分220'可包含面向彼此的多對通道,但通道部分220'的通道的數目及其形成位置可按各種方式修改。 The channel portion 220' may be continuously connected to the vent hole 113' coupled to the coupling rim 110' of the lower end of the outer casing 200' and may be exposed to the outside via the vent hole 113'. Therefore, the air A introduced from the outside can be guided to the coupling along a portion of the outer surface of the outer casing 200' (ie, the channel portion 220') from the lower portion of the coupling flange edge 110' through the vent hole 113'. The upper portion of the rim 110' can then be introduced into the interior space of the outer casing 200' via the air introduction aperture 230'. The exemplary embodiment illustrated in FIG. 8 differs from the exemplary embodiment of FIG. 1 in that the channel portion 220' of FIG. 8 can occupy a larger portion of the surface area of the outer casing 200'. This exemplary embodiment illustrates that the channel portion 220' can include multiple pairs of channels facing each other, but the number of channels of the channel portion 220' and their location of formation can be modified in a variety of ways.
光源模組400'可安裝於與設置了多個熱輻射鰭片121'的支撐板120'的表面120a'相對的另一表面120b'上,且發出光。光源模組400'可包含基板410'及安裝於基板410'上的至少一個發光元件420'。 The light source module 400' may be mounted on the other surface 120b' opposite to the surface 120a' of the support plate 120' on which the plurality of heat radiation fins 121' are disposed, and emits light. The light source module 400' can include a substrate 410' and at least one light emitting element 420' mounted on the substrate 410'.
基板410'可為一般FR4型印刷電路板(PCB),且可包含含有環氧樹脂、三氮雜苯、矽、聚醯亞胺或其類似者的有機樹脂材料以及其他有機樹脂材料。或者,基板410'可包含陶瓷材料(諸如,AIN、Al2O3或其類似者)或金屬及金屬化合物材料,且可為金屬核心印刷電路板(MCPCB)。 The substrate 410' may be a general FR4 type printed circuit board (PCB), and may include an organic resin material containing an epoxy resin, a triazine, an anthracene, a polyimine or the like, and other organic resin materials. Alternatively, the substrate 410' may comprise a ceramic material (such as AIN, Al2O3, or the like) or a metal and metal compound material, and may be a metal core printed circuit board (MCPCB).
基板410'可在其對應於支撐板120'的空氣排放孔130'的位置中包含通孔430'。發光元件420'可沿著通孔430'的圓周而配置。 The substrate 410' may include a through hole 430' in its position corresponding to the air discharge hole 130' of the support plate 120'. The light emitting element 420' may be disposed along the circumference of the through hole 430'.
發光元件420'可安裝於基板410'上。發光元件420'(即,由於施加至發光元件420'的外部電力而產生預定波長的光的半導體元件)可包含發光二極體(LED)。發光元件420'可根據其中所含有的材料而發射藍光、綠光或紅光,且可發射白光。 The light emitting element 420' can be mounted on the substrate 410'. The light emitting element 420' (ie, a semiconductor element that generates light of a predetermined wavelength due to external power applied to the light emitting element 420') may include a light emitting diode (LED). The light emitting element 420' may emit blue light, green light, or red light according to a material contained therein, and may emit white light.
發光元件420'可按複數形式來設置,且多個發光元件420'可配置於基板410'上。在此狀況下,多個發光元件420'可按各種方式組態,諸如,組態為產生相同波長的光的相同類型的元件或產生不同波長的光的不同類型的元件。發光元件420'可為LED晶片,或可為其中包含LED晶片的單個封裝。 The light emitting elements 420' may be disposed in a plurality of forms, and the plurality of light emitting elements 420' may be disposed on the substrate 410'. In this case, the plurality of light-emitting elements 420' can be configured in various ways, such as elements of the same type configured to produce light of the same wavelength or different types of elements that produce light of different wavelengths. Light-emitting element 420' can be an LED wafer or can be a single package containing LED wafers therein.
同時,覆蓋基板410'及發光元件420'的蓋子600'可安裝 於基底100'上。蓋子600'可包含透明或半透明材料(例如,樹脂,諸如,矽、環氧樹脂或其類似者),以便向外發出自光源模組400'產生的光,且亦可包含玻璃。 At the same time, the cover 600' covering the substrate 410' and the light-emitting element 420' can be mounted On the substrate 100'. The cover 600' may comprise a transparent or translucent material (eg, a resin such as tantalum, epoxy, or the like) to emit light from the light source module 400' and may also include glass.
蓋子600'可在其中央部分中包含排放管道620',排放管道620'連接至基板410'的通孔430'。因此,外殼200'內存在的空氣A'可穿過支撐板120'的空氣排放孔130'及基板410'的通孔430'以經由排放管道620'而排放至外部。 The cover 600' may include a discharge duct 620' in its central portion, and the discharge duct 620' is connected to the through hole 430' of the substrate 410'. Therefore, the air A' present in the outer casing 200' can pass through the air discharge hole 130' of the support plate 120' and the through hole 430' of the substrate 410' to be discharged to the outside via the discharge pipe 620'.
圖13及圖14示意性地說明根據本例示性實施例的發光裝置10'安裝於天花板1上的狀態。如圖所說明,發光裝置10'可按一種方式耦接至天花板1,所述方式使得耦接緣邊110'插入至天花板1的孔2中。天花板1的孔2可設置為對應於耦接緣邊110',且因此,間隙可未產生於耦接緣邊110'與孔2之間。 13 and 14 schematically illustrate a state in which the light-emitting device 10' is mounted on the ceiling 1 according to the present exemplary embodiment. As illustrated, the illumination device 10' can be coupled to the ceiling 1 in a manner such that the coupling rim 110' is inserted into the aperture 2 of the ceiling 1. The aperture 2 of the ceiling 1 may be arranged to correspond to the coupling rim 110' and, therefore, a gap may not be created between the coupling rim 110' and the aperture 2.
在安置於外殼200'中的冷卻風扇300'經由供應至冷卻風扇300'的電力而操作時,周圍空氣A經由設置於凸緣部分111'中的多個通氣孔113'而引入,且在自外殼200'的下端至其上端的方向上沿著外殼200'的外表面中的通道部分220'而導引。此外,空氣A可經由外殼200'的空氣引入孔230'而吸入至外殼200'的內部空間中。吸入至外殼200'的內部空間中的空氣A可經由冷卻風扇300'而轉移至基底100'的支撐板120',可穿過支撐板120'的氣體排放孔130'及基板410'的通孔430',且可經由排放管道620'而排放至外部。在此狀況下,支撐板120'上的所加熱的空氣A'可被強制性地吸入至外殼200'中,且與排放至外部的空氣的流動一起排放 至外部,藉此冷卻支撐板120'及安裝於支撐板120'上的光源模組400'。 When the cooling fan 300' disposed in the outer casing 200' is operated via electric power supplied to the cooling fan 300', the surrounding air A is introduced via a plurality of vent holes 113' provided in the flange portion 111', and is self-contained The lower end of the outer casing 200' is guided in the direction of its upper end along the channel portion 220' in the outer surface of the outer casing 200'. Further, the air A may be drawn into the inner space of the outer casing 200' via the air introduction hole 230' of the outer casing 200'. The air A sucked into the inner space of the outer casing 200' can be transferred to the support plate 120' of the base 100' via the cooling fan 300', and can pass through the gas discharge hole 130' of the support plate 120' and the through hole of the substrate 410'. 430', and can be discharged to the outside via the discharge duct 620'. In this case, the heated air A' on the support plate 120' can be forcibly sucked into the outer casing 200' and discharged together with the flow of air discharged to the outside. To the outside, the support plate 120' and the light source module 400' mounted on the support plate 120' are cooled.
雖然根據一例示性實施例的發光裝置10'插入且固定,以使得無間隙產生於天花板1的孔2與耦接緣邊110'之間,但周圍空氣A可經由設置於凸緣部分111'中的通氣孔113'而吸入,且即使在發光裝置10'緊固至類似於插座結構的氣密固定單元3時,周圍空氣A仍可經由設置於外殼200'的表面中的通道部分220'所形成的空間而被強制性地引入以冷卻發光裝置10'。 Although the light emitting device 10' according to an exemplary embodiment is inserted and fixed such that no gap is generated between the hole 2 of the ceiling 1 and the coupling rim 110', the ambient air A may be disposed via the flange portion 111' The vent hole 113' is sucked in, and even when the illuminating device 10' is fastened to the airtight fixing unit 3 similar to the socket structure, the surrounding air A can pass through the channel portion 220' provided in the surface of the outer casing 200'. The space formed is forcibly introduced to cool the light-emitting device 10'.
將參看圖15及圖21來描述根據另一例示性實施例的發光裝置。 A light emitting device according to another exemplary embodiment will be described with reference to FIGS. 15 and 21.
構成根據圖15至圖21所說明的例示性實施例的發光裝置的組件就其基本結構而言,實質上與圖1至圖7所說明的例示性實施例的發光裝置的組件相同或類似,不同之處在於光源的結構。因此,將省略與前述例示性實施例的組件相同的組件的描述,且將主要描述光源模組的組態。 The components constituting the light-emitting device according to the exemplary embodiment illustrated in FIGS. 15 to 21 are substantially the same as or similar to the components of the light-emitting device of the exemplary embodiment illustrated in FIGS. 1 to 7 with respect to the basic configuration thereof. The difference lies in the structure of the light source. Therefore, the description of the same components as those of the foregoing exemplary embodiment will be omitted, and the configuration of the light source module will be mainly described.
如圖15及圖16所說明,根據本例示性實施例的發光裝置10"可包含基底100"、外殼200"、冷卻風扇300"及光源模組400"。 As illustrated in FIGS. 15 and 16, the light emitting device 10" according to the present exemplary embodiment may include a substrate 100", a housing 200", a cooling fan 300", and a light source module 400".
基底100"可包含耦接緣邊110"及設置於耦接緣邊110"的內側中的支撐板120",且可更包含氣體排放孔130",氣體排放孔130"形成為支撐板120"的外圓周表面與耦接緣邊110"的內表面之間的狹縫。 The substrate 100" may include a coupling rim 110" and a support plate 120" disposed in an inner side of the coupling rim 110", and may further include a gas discharge hole 130", and the gas discharge hole 130" is formed as a support plate 120" A slit between the outer circumferential surface and the inner surface of the coupling rim 110".
外殼200"可安置於基底100"的一側上,且耦接至耦接緣 邊110"以覆蓋支撐板120"。外殼200"包含:通道部分200",形成相對於外殼200"的外表面以階梯方式凹陷的區域以便導引空氣的引入;以及空氣引入孔230",將經由通道部分220"而導引的空氣引入至外殼200"的內部空間。 The outer casing 200" can be disposed on one side of the substrate 100" and coupled to the coupling edge Side 110" to cover the support plate 120". The outer casing 200" includes: a channel portion 200" that forms a region recessed in a stepwise manner with respect to an outer surface of the outer casing 200" to guide introduction of air; and an air introduction hole 230" that guides air through the channel portion 220" Introduced to the interior of the outer casing 200".
設置於外殼200"內的冷卻風扇300"將空氣強制性地吸入至外殼200"的內部空間中,且經由設置於基底100"中的空氣排放孔130"而將所吸入的空氣排放至外部。 The cooling fan 300" provided in the outer casing 200" forcibly sucks air into the inner space of the outer casing 200", and discharges the sucked air to the outside via the air discharge hole 130" provided in the base 100".
基底100"、外殼200"及冷卻風扇300"與根據圖1的例示性實施例的發光裝置10的構成構件及結構相同,因此將省略其詳細描述。 The substrate 100", the outer casing 200", and the cooling fan 300" are the same as the constituent members and structures of the light-emitting device 10 according to the exemplary embodiment of FIG. 1, and thus detailed description thereof will be omitted.
同時,間隔物700"可設置於冷卻風扇300"上以便擋止冷卻風扇300"與外殼200"之間的間隙。間隔物700"可具有環狀形狀,其中形成了中央孔710",且間隔物700"的外圓周表面與外殼200"的內表面接觸。中央孔710"可具有對應於冷卻風扇300"的尺寸及形狀。因此,經由外殼200"的空氣引入孔230"吸入至內部中的空氣整體經由中央孔710"而流動至冷卻風扇300"。 At the same time, the spacer 700" may be disposed on the cooling fan 300" to block the gap between the cooling fan 300" and the outer casing 200". The spacer 700" may have an annular shape in which a central hole 710" is formed, and an outer circumferential surface of the spacer 700" is in contact with an inner surface of the outer casing 200". The central aperture 710" may have a size and shape corresponding to the cooling fan 300". Therefore, the air sucked into the interior via the air introduction hole 230" of the outer casing 200" flows to the cooling fan 300" via the central hole 710" as a whole.
如圖15及圖16所示,電力供應單元(power supply unit,PSU)800"可容納於外殼200"的端子部分210"中以將外部電力供應至光源模組400"。電力供應單元800"可包含:驅動電路810",包含電容器或其類似者;以及電極插腳820",連接至驅動電路810"且自端子部分210"向外突起。電極插腳820"可經由插腳固持器830"而固定。 As shown in FIGS. 15 and 16, a power supply unit (PSU) 800" may be housed in the terminal portion 210" of the outer casing 200" to supply external power to the light source module 400". The power supply unit 800" may include: a driving circuit 810" including a capacitor or the like; and an electrode pin 820" connected to the driving circuit 810" and protruding outward from the terminal portion 210". The electrode pin 820" may be held by the pin The device 830" is fixed.
電力供應單元800"可安置於高於外殼200"的空氣引入孔230"的位置中,且因此,經由空氣引入孔230"吸入至外殼200"的內部空間中的空氣立即經由冷卻風扇300"而流動至基底100"。在此狀況下,由電力供應單元800"產生的熱可由吸入空氣A向外輻射。 The power supply unit 800" may be disposed in a position higher than the air introduction hole 230" of the outer casing 200", and thus, the air sucked into the inner space of the outer casing 200" via the air introduction hole 230" is immediately passed through the cooling fan 300" Flow to the substrate 100". In this case, the heat generated by the power supply unit 800" can be radiated outward by the intake air A.
光源模組400"安裝於支撐板120"中,且經由電力而發光,所述電力是經由電力供應單元800"而施加。根據本例示性實施例的光源模組400"可包含:至少一個發光元件420";以及透鏡單元440",安置於發光元件420"上且具有透鏡450"。光源模組400"可更包含基板410",發光元件420"安裝於基板410"上。 The light source module 400" is mounted in the support plate 120" and emits light via electric power, which is applied via the power supply unit 800". The light source module 400" according to the present exemplary embodiment may include: at least one light emission The element 420"; and the lens unit 440" are disposed on the light emitting element 420" and have a lens 450". The light source module 400" may further include a substrate 410", and the light emitting element 420" is mounted on the substrate 410".
透鏡單元440"可安置於基底100"的另一側上以覆蓋基板410"及多個發光元件420"。透鏡單元440"可保護發光元件420"免受周圍環境的影響,或為了改良自發光元件420"向外發出的光的光提取效率(light extraction efficiency),透鏡單元440"可由透光材料製成。舉例而言,透光材料可包含聚碳酸酯(polycarbonate,PC)、聚甲基丙烯酸甲酯(polymethylmethacrylate,PMMA)、丙烯酸樹脂(acryl)及其類似者。同樣地,根據一或多個例示性實施例,透鏡單元440"可由玻璃材料製成。 The lens unit 440" may be disposed on the other side of the substrate 100" to cover the substrate 410" and the plurality of light emitting elements 420". The lens unit 440" can protect the light-emitting element 420 from the surrounding environment, or in order to improve the light extraction efficiency of the light emitted from the light-emitting element 420, the lens unit 440" can be made of a light-transmitting material. . For example, the light transmissive material may comprise polycarbonate (PC), polymethylmethacrylate (PMMA), acryl, and the like. As such, lens unit 440" may be made of a glass material in accordance with one or more exemplary embodiments.
圖18示意性地說明光源模組400",且圖19示意性地說明光源模組400"的透鏡單元440"。 FIG. 18 schematically illustrates a light source module 400", and FIG. 19 schematically illustrates a lens unit 440" of the light source module 400".
如圖18及圖19所說明,透鏡單元440"可具有:第一表面440"-1,面向發光元件420";以及第二表面440"-2,與第一表 面440"-1相對。透鏡單元440"可包含多個透鏡450",透鏡450"經安置以分別與發光元件420"相對。多個透鏡450"可分別安置於發光元件420"上,以調整由發光元件420"產生的光向外發出的區域。多個透鏡450"可整體連接以形成透鏡單元440"。 As illustrated in FIGS. 18 and 19, the lens unit 440" may have a first surface 440"-1 facing the light emitting element 420"; and a second surface 440"-2, and the first table The face 440"-1 is opposed. The lens unit 440" may include a plurality of lenses 450" that are disposed to oppose the light-emitting elements 420, respectively. A plurality of lenses 450" may be respectively disposed on the light-emitting elements 420" to adjust The area where the light generated by the light-emitting element 420" is emitted outward. The plurality of lenses 450" may be integrally connected to form a lens unit 440".
將參看圖20及圖21來更詳細描述本例示性實施例所使用的透鏡450"。如圖20及圖21所說明,透鏡450"可設置於第一表面440"-1上,且具有:中央入射表面451",來自發光元件420"的光入射至中央入射表面451";以及反射部分452",沿著中央入射表面451"的圓周朝向發光元件420"突起,且相對於中心光軸Z而對稱。透鏡450"可具有折射部分455",折射部分455"設置於第二表面440"-2上,且在發光元件420"的相反方向上突起,且相對於光軸Z而對稱。 The lens 450" used in the present exemplary embodiment will be described in more detail with reference to FIGS. 20 and 21. As illustrated in FIGS. 20 and 21, the lens 450" may be disposed on the first surface 440"-1 and has: The central incident surface 451", light from the light-emitting element 420" is incident to the central incident surface 451"; and the reflective portion 452", protruding toward the light-emitting element 420 along the circumference of the central incident surface 451", and with respect to the central optical axis Z Rather, the lens 450" may have a refractive portion 455" disposed on the second surface 440"-2 and projecting in the opposite direction of the light-emitting element 420" and symmetric with respect to the optical axis Z.
中央入射表面451"可安置為緊鄰發光元件420"之上,以使得其垂直於穿過中心的光軸Z,且可整體具有平坦平面形狀或緩和彎曲形狀。中央入射表面451"可具有凹陷部分456",凹陷部分456"具有階梯結構。凹陷部分456"可具有對應於如下所述的頂出銷的形狀,且與頂出銷接觸。 The central incident surface 451" may be disposed immediately above the light-emitting element 420" such that it is perpendicular to the optical axis Z passing through the center, and may have a flat planar shape or a moderately curved shape as a whole. The central incident surface 451" may have a recessed portion 456" having a stepped structure. The recessed portion 456" may have a shape corresponding to an ejector pin as described below and in contact with the ejector pin.
反射部分452"可沿著中央入射表面451"的邊緣的圓周具有環狀形狀,以使得其圍繞中央入射表面451",且可具有第一反射部分452a"及第二反射部分452b",第一反射部分452a"及第二反射部分452b"為同心的,且相對於光軸Z具有不同旋轉半徑。舉例而言,第一反射部分452a"是沿著中央入射表面451"的邊緣的圓 周而設置以覆蓋中央入射表面451",且第二反射部分452b"可沿著第一反射部分452a"的邊緣的圓周而設置以覆蓋第一反射部分452a"。第一反射部分452a"及第二反射部分452b"可具有相對於光軸Z具有不同直徑的環狀形狀。 The reflective portion 452" may have an annular shape along the circumference of the edge of the central incident surface 451" such that it surrounds the central incident surface 451" and may have a first reflective portion 452a" and a second reflective portion 452b", first The reflective portion 452a" and the second reflective portion 452b" are concentric and have different radii of rotation with respect to the optical axis Z. For example, the first reflective portion 452a" is a circle along the edge of the central incident surface 451" It is circumferentially disposed to cover the central incident surface 451", and the second reflective portion 452b" may be disposed along the circumference of the edge of the first reflective portion 452a" to cover the first reflective portion 452a". The first reflective portion 452a" and the second reflective portion 452b" may have an annular shape having different diameters with respect to the optical axis Z.
第一反射部分452a"及第二反射部分452b"可分別具有:側入射表面453",來自發光元件420"的光入射至側入射表面453";以及反射表面454",其將入射光反射至第二表面440"-2。 The first reflective portion 452a" and the second reflective portion 452b" may have a side incident surface 453", light from the light emitting element 420" is incident to the side incident surface 453", and a reflective surface 454" that reflects incident light to The second surface 440"-2.
側入射表面453"可接收在橫向方向上發出的光,所述光包含於來自發光元件420"的光中,且因此,側入射表面453"可自第一表面440"-1朝向發光元件420"突起,以沿著光軸Z延伸預定距離。 The side incident surface 453" can receive light emitted in a lateral direction, the light being included in light from the light emitting element 420", and thus, the side incident surface 453" can be from the first surface 440"-1 toward the light emitting element 420 "Protrusions to extend a predetermined distance along the optical axis Z.
反射表面454"朝向第二表面440"-2反射經由側入射表面453"而接收的光,且因此,反射表面454"可具有連接側入射表面453"的延伸端及第一表面440"-1的抛物面形狀。 The reflective surface 454" reflects light received via the side incident surface 453" toward the second surface 440"-2, and thus, the reflective surface 454" can have an extended end connecting the side incident surface 453" and the first surface 440"-1 Parabolic shape.
在本例示性實施例中,說明了反射表面454"具有抛物面形狀,但所有例示性實施例不限於此。舉例而言,反射表面454"可具有線性傾斜形狀,且可自由地修改成具有一種形狀,只要其可朝向第二表面440"-2反射經由側入射表面453"而接收的光。 In the present exemplary embodiment, the reflective surface 454" is illustrated as having a parabolic shape, but all exemplary embodiments are not limited thereto. For example, the reflective surface 454" may have a linearly inclined shape and may be freely modified to have a The shape is as long as it can reflect light received via the side incident surface 453" toward the second surface 440"-2.
同時,反射部分452"可具有一種結構,在所述結構中,其自第一表面440"-1突起的長度在遠離光軸Z的方向上增大。即,第二反射部分452b"朝向發光元件420"突起的量大於第一反射部分452a",且因此,第二反射部分452b"的尺寸可整體大於第一 反射部分452a"。 Meanwhile, the reflecting portion 452" may have a structure in which the length of the protrusion from the first surface 440"-1 increases in a direction away from the optical axis Z. That is, the amount by which the second reflective portion 452b" protrudes toward the light emitting element 420" is larger than the first reflective portion 452a", and therefore, the size of the second reflective portion 452b" may be larger than the first overall Reflecting portion 452a".
在本實施例中,反射部分452"具有包含第一反射部分452a"及第二反射部分452b"的雙環結構,但所有例示性實施例不限於此。舉例而言,反射部分452"可更包含第三反射部分(未圖示)而第三反射部分的尺寸及直徑大於第二反射部分452b",從而具有三環結構或三環以上的結構。 In the present embodiment, the reflective portion 452" has a double loop structure including the first reflective portion 452a" and the second reflective portion 452b", but all of the exemplary embodiments are not limited thereto. For example, the reflective portion 452" may further include The third reflecting portion (not shown) and the third reflecting portion have a larger size and diameter than the second reflecting portion 452b", thereby having a three-ring structure or a three-ring or more structure.
與第一表面440"-1相對的第二表面440"-2為光輸出表面,所述光輸出表面將入射至第一表面440"-1的光發射至外部。第二表面440"-2包含折射部分455",折射部分455"在與發光元件420"相反的方向上突起,且相對於光軸Z而對稱。 The second surface 440"-2 opposite the first surface 440"-1 is a light output surface that emits light incident to the first surface 440"-1 to the outside. The second surface 440"-2 The refractive portion 455" is included, and the refractive portion 455" protrudes in a direction opposite to the light-emitting element 420" and is symmetrical with respect to the optical axis Z.
折射部分455"可包含第一折射部分455a"及圍繞第一折射部分455a"的第二折射部分455b"。 The refractive portion 455" may include a first refractive portion 455a" and a second refractive portion 455b" surrounding the first refractive portion 455a".
第一折射部分455a"可安置為緊鄰發光元件420"之上,且可具有將光軸Z用作頂點的凸起彎曲表面。第二折射部分455b"相對於光軸Z形成多個同心圓,且可具有沿著第一折射部分455a"的圓周形成的凸凹結構。舉例而言,第二折射部分455b"的凸凹形式可包含菲涅耳(Fresnel)圖案。 The first refractive portion 455a" may be disposed immediately above the light emitting element 420" and may have a convex curved surface that uses the optical axis Z as an apex. The second refractive portion 455b" forms a plurality of concentric circles with respect to the optical axis Z, and may have a convex-concave structure formed along the circumference of the first refractive portion 455a". For example, the convex and concave form of the second refractive portion 455b" may comprise a Fresnel pattern.
折射部分455"可藉由對平坦第二表面440"-2執行凹版印刷製程(intaglio process)而形成。即,第一折射部分455a"的彎曲表面及第二折射部分455b"的凸凹形狀可與至少第二表面440"-2共面,或可低於第二表面440"-2。因此,折射部分455"可並不自第二表面440"-2突起,且透鏡450"的高度(或厚度)TL 可定義為自第一表面440"-1突起的反射部分452"的末端與第二表面440"-2之間的距離。 The refractive portion 455" can be formed by performing an intaglio process on the flat second surface 440"-2. That is, the curved surface of the first refractive portion 455a" and the convex-concave shape of the second refractive portion 455b" may be coplanar with at least the second surface 440"-2, or may be lower than the second surface 440"-2. Therefore, the refractive portion 455" may not protrude from the second surface 440"-2, and the height (or thickness) TL of the lens 450" It may be defined as the distance between the end of the reflective portion 452" protruding from the first surface 440"-1 and the second surface 440"-2.
在本例示性實施例中,說明了折射部分455"未自第二表面440"-2突起的狀況,但所有例示性實施例不限於此。舉例而言,折射部分455"可部分自第二表面440"-2向上突起。然而,折射部分455"突起的程度僅為相對於透鏡450"的總高度(或厚度)TL的一部分,因此,不會影響透鏡450"的高度TL。 In the present exemplary embodiment, the case where the refractive portion 455" is not protruded from the second surface 440"-2 is explained, but all the exemplary embodiments are not limited thereto. For example, the refractive portion 455" may partially protrude upward from the second surface 440"-2. However, the extent of the refracting portion 455" is only a portion of the total height (or thickness) TL relative to the lens 450" and, therefore, does not affect the height TL of the lens 450".
同時,透鏡450"可具有一種結構,在所述結構中,反射部分452"相對於光軸Z安置於折射部分455"的外部,以圍繞折射部分455"。詳言之,與形成於第二表面440"-2上的折射部分455"相對的中央入射表面451"形成為具有對應於折射部分455"的尺寸,且因此,反射部分452"可安置於折射部分455"的外部,以圍繞折射部分455"。 Meanwhile, the lens 450" may have a structure in which the reflective portion 452" is disposed outside the refractive portion 455" with respect to the optical axis Z to surround the refractive portion 455". In detail, the central incident surface 451" opposite to the refractive portion 455" formed on the second surface 440"-2 is formed to have a size corresponding to the refractive portion 455", and thus, the reflective portion 452" can be disposed in the refraction The outer portion of the portion 455" surrounds the refractive portion 455".
圖22為展示透鏡450"的光分佈曲線的曲線圖。如圖所說明,可見,集中的光的光束擴展角的範圍為約24°至25°。此意謂相比具有約24.4°的光束擴展角的先前技術的聚光透鏡,透鏡450"的集中能力不具有任何顯著差異。 Figure 22 is a graph showing the light distribution curve of the lens 450". As illustrated, it can be seen that the concentrated light has a beam spread angle ranging from about 24 to 25 degrees. This means that the beam has a beam size of about 24.4. The prior art concentrating lens of the extended angle, the concentrating ability of the lens 450" does not have any significant difference.
透鏡450"可藉由將流體溶劑注射至模具中並使其凝固而與透鏡單元440"整體形成。舉例而言,其可包含諸如射出成型、轉移成型、壓縮成型及其類似者的方案。 The lens 450" can be integrally formed with the lens unit 440" by injecting a fluid solvent into the mold and allowing it to solidify. For example, it may include solutions such as injection molding, transfer molding, compression molding, and the like.
圖23A至圖23C示意性地說明使用模具來製造具有透鏡的透鏡單元的程序。圖23A至圖23C為示意性地說明根據本例示 性實施例的製造透鏡單元的依序程序的橫截面圖。 23A to 23C schematically illustrate a procedure of manufacturing a lens unit having a lens using a mold. 23A to 23C are diagrams schematically illustrating according to the present example A cross-sectional view of a sequential procedure for fabricating a lens unit of an embodiment.
首先,如圖23A所說明,製備具有透鏡形狀的模具M1及M2,且將流體溶劑(例如,樹脂)注射至模具M1及M2中且使其固化以完成具有透鏡450"的透鏡單元440"。 First, as illustrated in FIG. 23A, molds M1 and M2 having a lens shape are prepared, and a fluid solvent (for example, a resin) is injected into the molds M1 and M2 and cured to complete the lens unit 440" having the lens 450".
接著,如圖23B所說明,分離模具M1及M2以使完成的透鏡單元440"與模具M1及M2部分分離。 Next, as illustrated in FIG. 23B, the molds M1 and M2 are separated to partially separate the completed lens unit 440" from the molds M1 and M2.
接著,如圖23C所說明,經由設置在模具M1及M2中的頂出銷P而使透鏡單元440"與模具M1及M2完全分離。可設置至少三個或三個以上頂出銷P,進而,可將分離透鏡單元440"的過程中的透鏡單元440"的變形減到最少。舉例而言,頂出銷P可經組態以與透鏡450"的邊緣區域及透鏡450"的中央區域兩者接觸,以使得施加至透鏡450"的力均勻地分佈。在此狀況下,經設置以與透鏡450"的中央區域接觸的頂出銷P可與形成於透鏡450"的中央入射表面451"中的凹陷部分456"接觸。 Next, as illustrated in FIG. 23C, the lens unit 440" is completely separated from the molds M1 and M2 via the ejector pins P provided in the molds M1 and M2. At least three or more ejector pins P may be provided, and further The deformation of the lens unit 440" during the process of separating the lens unit 440" can be minimized. For example, the ejector pin P can be configured to interact with the edge region of the lens 450" and the central region of the lens 450" The contacts are made such that the force applied to the lens 450" is evenly distributed. In this case, the ejector pin P disposed to be in contact with the central portion of the lens 450" may be in contact with the recessed portion 456 formed in the central incident surface 451" of the lens 450".
即,在先前技術的聚光透鏡的狀況下,因為透鏡具有某一程度的厚度(例如,約10毫米),所以頂出銷可在射出成型的情況下安置於透鏡的外部。然而,在透鏡450"如在本例示性實施例中具有小厚度(亦即,高度)的狀況下,透鏡450"可能變形。因此,頂出銷P甚至安置於中央部分中以使施加至透鏡450"的力均勻地分佈以防止透鏡單元440"的變形。 That is, in the case of the prior art concentrating lens, since the lens has a certain thickness (for example, about 10 mm), the ejector pin can be disposed outside the lens in the case of injection molding. However, in the case where the lens 450" has a small thickness (i.e., height) as in the present exemplary embodiment, the lens 450" may be deformed. Therefore, the ejector pin P is even disposed in the central portion to uniformly distribute the force applied to the lens 450" to prevent deformation of the lens unit 440".
因此製造的根據本例示性實施例的透鏡450"可具有範圍為約2毫米至4.5毫米的厚度(或高度),如圖20所說明。即,根 據本例示性實施例的透鏡450"可具有等於現有聚光透鏡(厚度等於約10毫米,請參見圖24A)的厚度的約一半的厚度,從而實施適用於緊湊性的小的尺寸,且當根據本例示性實施例的透鏡450"用於發光裝置中時,所述發光裝置可具有落入由美國國家標準學會(American National Standards Institute,ANSI)(ANSI C78.24-2001)設定的範圍內的尺寸。 The lens 450" according to the present exemplary embodiment thus manufactured may have a thickness (or height) ranging from about 2 mm to 4.5 mm, as illustrated in Fig. 20. That is, the root The lens 450" according to the present exemplary embodiment may have a thickness equal to about half of the thickness of the existing concentrating lens (thickness equal to about 10 mm, see FIG. 24A), thereby implementing a small size suitable for compactness, and when When the lens 450" according to the present exemplary embodiment is used in a light-emitting device, the light-emitting device may have a range falling within a range set by the American National Standards Institute (ANSI) (ANSI C78.24-2001). size of.
舉例而言,ANSI所規定的燈標準(ANSI C78.24-2001)要求具有圖16所說明的結構的燈遵循最大為尺寸T1:46毫米、尺寸T2:4.5毫米、尺寸TT:50.5毫米的標準。 For example, the lamp standard specified by ANSI (ANSI C78.24-2001) requires that the lamp having the structure illustrated in Figure 16 follow a standard of maximum dimension T1: 46 mm, dimension T2: 4.5 mm, dimension TT: 50.5 mm. .
在難以以自然熱輻射(或熱耗散)方案實施足夠冷卻的高輸出燈(諸如,當前50瓦特的MR 16產品)中,使用冷卻風扇是必須的。在此狀況下,由於冷卻風扇的安裝,產品的尺寸增大而超過ANSI標準。 In high output lamps that are difficult to implement adequate cooling with natural thermal radiation (or heat dissipation) schemes (such as the current 50 watt MR 16 product), the use of a cooling fan is necessary. In this case, due to the installation of the cooling fan, the size of the product is increased to exceed the ANSI standard.
在限於T1的尺寸的外殼的狀況下,所述外殼具有標準化結構以供緊固至插座及其類似者。因此,在本例示性實施例中,限於尺寸T2的透鏡的厚度減小以避免超過ANSI標準。圖24A及圖24B展示一般聚光透鏡與根據本例示性實施例的輕薄型透鏡之間的比較。如自所述圖式可見,可實施符合ANSI標準的燈,所述燈在維持相同光學特性的同時,高度(或厚度)減小約一半。 In the case of an outer casing of a size limited to T1, the outer casing has a standardized structure for fastening to a socket and the like. Thus, in the present exemplary embodiment, the thickness of the lens limited to size T2 is reduced to avoid exceeding the ANSI standard. 24A and 24B show a comparison between a general concentrating lens and a thin and light lens according to the present exemplary embodiment. As can be seen from the figures, lamps conforming to the ANSI standard can be implemented which reduce the height (or thickness) by about half while maintaining the same optical characteristics.
同時,基板410"對應於構成電路板(作為電子元件的發光元件420"將安裝於所述電路板上)的基底構件,且基板410"可為所謂的印刷電路板(PCB)。且,基板410"可為作為基底構件支 撐發光元件420"的封裝本體。 Meanwhile, the substrate 410" corresponds to a base member constituting a circuit board (on which the light-emitting element 420 as an electronic component is to be mounted), and the substrate 410" may be a so-called printed circuit board (PCB). 410" can be used as a base member The package body of the light-emitting element 420".
基板410"可由(例如)諸如FR-4、CEM-3或其類似者的材料製成,但所有例示性實施例不限於此。舉例而言,基板410"亦可由玻璃或環氧樹脂材料、陶瓷材料或其類似者製成。且,基板410"可由金屬或金屬化合物製成,或可包含金屬核心印刷電路板(MCPCB)、金屬覆銅層壓片(metal copper clad laminate,MCCL)或其類似者。 The substrate 410" may be made of, for example, a material such as FR-4, CEM-3, or the like, but all of the exemplary embodiments are not limited thereto. For example, the substrate 410" may also be made of a glass or epoxy material, Made of ceramic material or the like. Also, the substrate 410" may be made of a metal or a metal compound, or may include a metal core printed circuit board (MCPCB), a metal copper clad laminate (MCCL), or the like.
圖17示意性地說明根據本例示性實施例的發光元件10"安裝於天花板1上的狀態。固定單元3可安裝於天花板1上以緊固或固定發光裝置10",且電力可供應至發光裝置10"。發光裝置10"可由固定單元3以氣密狀態固定至天花板1的上方部分。 Fig. 17 schematically illustrates a state in which the light-emitting element 10" is mounted on the ceiling 1 according to the present exemplary embodiment. The fixing unit 3 may be mounted on the ceiling 1 to fasten or fix the light-emitting device 10", and power may be supplied to the light-emitting The device 10". The light-emitting device 10" can be fixed to the upper portion of the ceiling 1 in an airtight state by the fixing unit 3.
如圖所說明,發光裝置10"可緊固至天花板1,以使得耦接緣邊110"插入至天花板1的孔2中。天花板1的孔2可設置為對應於耦接緣邊110",且因此,除對應於耦接緣邊110"的凹槽112"的空間之外,間隙可未產生於耦接緣邊110"與孔2之間。 As illustrated, the lighting device 10" can be fastened to the ceiling 1 such that the coupling rim 110" is inserted into the aperture 2 of the ceiling 1. The hole 2 of the ceiling 1 may be disposed to correspond to the coupling rim 110", and thus, the gap may not be generated at the coupling rim 110 except for the space corresponding to the groove 112" of the coupling rim 110"" Between the hole 2.
當安置於外殼200"中的冷卻風扇300"經由供應至冷卻風扇300"的電力而操作時,空氣A經由凹槽112"(即,設置於耦接緣邊110"與天花板1之間的空間)而自外部引入,且所引入的空氣A可在自外殼200"的下端至其上端的方向上沿著外殼200"的外表面中的通道部分220"而導引。此外,空氣A可經由外殼200"的空氣引入孔230"而吸入至外殼200"的內部空間中。吸入至外殼200"的內部空間中的空氣A可經由間隔物700"及冷卻風扇300"而 流動至基底100"的支撐板120",沿著設置於支撐板120"上的熱輻射鰭片121"而徑向分散至支撐板120"的邊緣,且經由空氣排放孔130"而排放至外部。在此狀況下,支撐板120"上的所加熱的空氣A'可被強制性地吸入至外殼200"中,且與排放至外部的空氣A的流動一起排放至外部,進而支撐板120"及安裝於支撐板120"上的光源模組400"可冷卻。此外,外殼200"的內部可由於連續吸入至外殼20中且具有相對低的溫度的空氣A而冷卻。特定言之,根據本例示性實施例的發光裝置10"可在外殼200"的外表面中包含通道部分220"以便實現空氣A的流動。因此,即使在發光裝置10"安裝於覆蓋外殼200"的氣密固定單元3(例如,具有對應於外殼的形狀的形狀且緊密附著至外殼的外表面的插座結構)內的狀況下,自外部引入的空氣A可經由由於通道部分220"而形成的空間吸入至外殼200"中。如上所述,自外部引入且具有相對低的溫度的空氣A可被強制性地吸入以冷卻發光裝置10",從而將熱輻射效率最大化,且因此,可延長光源模組400"的使用壽命且可增強發光效率。 When the cooling fan 300" disposed in the outer casing 200" is operated via electric power supplied to the cooling fan 300", the air A passes through the groove 112" (ie, the space provided between the coupling rim 110" and the ceiling 1 And introduced from the outside, and the introduced air A can be guided along the channel portion 220" in the outer surface of the outer casing 200" in the direction from the lower end to the upper end of the outer casing 200". Further, the air A may be drawn into the inner space of the outer casing 200" via the air introduction hole 230" of the outer casing 200". The air A sucked into the inner space of the outer casing 200" may pass through the spacer 700" and the cooling fan 300" The support plate 120" flowing to the substrate 100" is radially dispersed to the edge of the support plate 120" along the heat radiation fins 121" provided on the support plate 120", and is discharged to the outside via the air discharge holes 130" . In this case, the heated air A' on the support plate 120" can be forcibly sucked into the outer casing 200" and discharged to the outside together with the flow of the air A discharged to the outside, thereby supporting the plate 120" and The light source module 400" mounted on the support plate 120" may be cooled. Further, the inside of the outer casing 200" may be cooled by air A continuously sucked into the outer casing 20 and having a relatively low temperature. In particular, the light-emitting device 10" according to the present exemplary embodiment may include the channel portion 220" in the outer surface of the outer casing 200" in order to achieve the flow of the air A. Therefore, even when the light-emitting device 10" is mounted on the cover housing 200" In the case of the airtight fixing unit 3 (for example, a socket structure having a shape corresponding to the shape of the outer casing and closely attached to the outer surface of the outer casing), the air A introduced from the outside may be formed via the passage portion 220" The space is drawn into the outer casing 200". As described above, air A introduced from the outside and having a relatively low temperature can be forcibly sucked in to cool the light-emitting device 10", thereby maximizing heat radiation efficiency, and thus, can be extended The light source module 400" has a long life and can enhance luminous efficiency.
下文中,將描述可用於根據如上所述的各種例示性實施例的光源模組中的各種基板結構。 Hereinafter, various substrate structures that can be used in a light source module according to various exemplary embodiments as described above will be described.
如圖25所說明,板1100可包含:絕緣基板1110,具有形成於其一表面上的預定電路圖案1111及1112;上方熱擴散板1140,形成於絕緣基板1110上,以使得上方熱擴散板1140與電路圖案1111及1112接觸,且耗散由發光元件420產生的熱;以及 下方熱擴散板1160,形成於絕緣基板1110的另一表面上,且向外擴散由上方熱擴散板1140傳遞的熱。上方熱擴散板1140及下方熱擴散板1160可由穿透絕緣基板1110且具有電鍍內壁的至少一個通孔1150連接。 As illustrated in FIG. 25, the board 1100 may include: an insulating substrate 1110 having predetermined circuit patterns 1111 and 1112 formed on one surface thereof; and an upper heat diffusion plate 1140 formed on the insulating substrate 1110 such that the upper heat diffusion plate 1140 Contacting the circuit patterns 1111 and 1112 and dissipating heat generated by the light emitting element 420; The lower heat diffusion plate 1160 is formed on the other surface of the insulating substrate 1110 and diffuses heat transferred from the upper heat diffusion plate 1140. The upper heat diffusion plate 1140 and the lower heat diffusion plate 1160 may be connected by at least one through hole 1150 penetrating the insulating substrate 1110 and having a plated inner wall.
絕緣基板1110的電路圖案1111及1112可藉由在陶瓷或環氧樹脂基FR4核心(epoxy resin-based FR4 core)上塗佈銅箔片且對所得結構執行蝕刻製程來形成。絕緣薄膜1130可塗佈於板1100的下表面上。 The circuit patterns 1111 and 1112 of the insulating substrate 1110 can be formed by coating a copper foil on a ceramic or epoxy resin-based FR4 core and performing an etching process on the resultant structure. The insulating film 1130 may be coated on the lower surface of the board 1100.
圖26說明板的另一實例。如圖26所說明,板1200可包含:絕緣層1220,形成於第一金屬層1210上;以及第二金屬層1230,形成於絕緣層1220上。基板1200可具有階梯部分「R」,階梯部分「R」形成於所述基板的至少一個末端部分中,且使絕緣層1220暴露。 Figure 26 illustrates another example of a board. As illustrated in FIG. 26, the board 1200 may include an insulating layer 1220 formed on the first metal layer 1210, and a second metal layer 1230 formed on the insulating layer 1220. The substrate 1200 may have a stepped portion "R" formed in at least one end portion of the substrate and exposing the insulating layer 1220.
第一金屬層1210可由具有優良放熱特性的材料製成。舉例而言,第一金屬層1210可由諸如鋁(Al)、鐵(Fe)或其類似者的金屬或合金製成,且可形成為單層或多層結構。絕緣層1220可由具有絕緣特性的材料製成,且可由無機或有機材料形成。舉例而言,絕緣層1220可由環氧樹脂基絕緣樹脂製成,且為了增強熱導率,絕緣層1220可包含諸如鋁(Al)粉末或其類似者的金屬粉末,以便加以使用。第二金屬層1230可大體上形成為銅(Cu)薄膜。 The first metal layer 1210 may be made of a material having excellent heat release characteristics. For example, the first metal layer 1210 may be made of a metal or alloy such as aluminum (Al), iron (Fe), or the like, and may be formed in a single layer or a multilayer structure. The insulating layer 1220 may be made of a material having insulating properties and may be formed of an inorganic or organic material. For example, the insulating layer 1220 may be made of an epoxy-based insulating resin, and in order to enhance thermal conductivity, the insulating layer 1220 may contain a metal powder such as aluminum (Al) powder or the like for use. The second metal layer 1230 may be formed substantially as a copper (Cu) film.
如圖26所說明,在金屬板中,絕緣層1220的一末端部 分的暴露區域的距離(亦即,絕緣距離)可大於絕緣層1220的厚度。在本揭露中,絕緣距離指第一金屬層1210與第二金屬層1230之間的絕緣層1220的暴露區域的距離。當俯視金屬板時,絕緣層1220的暴露區域的寬度稱為暴露寬度W1。圖26中的區域「R」為在製造金屬板的製程期間經由研磨製程或其類似者而移除的區域。金屬板的末端部分可具有對應於自第二金屬層1230的表面至絕緣層1220(其中,絕緣層1220暴露達暴露寬度W1)的距離的深度「h」,從而形成階梯結構。若未移除金屬板的末端部分,則絕緣距離對應於絕緣層1220的厚度(h1+h2),且藉由移除末端部分的一部分,可進一步確保大致上對應於距離W1的絕緣距離。因此,在對金屬板進行耐受電壓試驗的狀況下,可提供具有一種結構的金屬板,在所述結構中,其末端部分中的兩個金屬層1210與1230之間的接觸可能性減到最少。 As illustrated in FIG. 26, in the metal plate, a distal end portion of the insulating layer 1220 The distance of the exposed regions of the minute (i.e., the insulation distance) may be greater than the thickness of the insulating layer 1220. In the present disclosure, the insulating distance refers to the distance of the exposed region of the insulating layer 1220 between the first metal layer 1210 and the second metal layer 1230. When overlooking the metal plate, the width of the exposed region of the insulating layer 1220 is referred to as the exposed width W1. The area "R" in Fig. 26 is an area which is removed by a grinding process or the like during the process of manufacturing the metal plate. The end portion of the metal plate may have a depth "h" corresponding to a distance from the surface of the second metal layer 1230 to the insulating layer 1220 (wherein the insulating layer 1220 is exposed to the exposed width W1), thereby forming a stepped structure. If the end portion of the metal plate is not removed, the insulation distance corresponds to the thickness (h1 + h2) of the insulating layer 1220, and by removing a portion of the end portion, the insulation distance substantially corresponding to the distance W1 can be further ensured. Therefore, in the case where the metal plate is subjected to the withstand voltage test, a metal plate having a structure in which the possibility of contact between the two metal layers 1210 and 1230 in the end portion thereof is reduced to least.
圖27示意性地說明根據圖26的修改的金屬板的結構。參看圖27,金屬板1200'可包含:絕緣層1220',形成於第一金屬層1210'上;以及第二金屬層1230',形成於絕緣層1220'上。絕緣層1220'及第二金屬層1230'包含以預定斜角δ1移除的區域,且甚至第一金屬層1210'亦可包含以預定斜角δ1移除的區域。 Fig. 27 schematically illustrates the structure of a metal plate according to the modification of Fig. 26. Referring to FIG. 27, the metal plate 1200' may include an insulating layer 1220' formed on the first metal layer 1210', and a second metal layer 1230' formed on the insulating layer 1220'. The insulating layer 1220' and the second metal layer 1230' include regions that are removed at a predetermined oblique angle δ1, and even the first metal layer 1210' may also include regions that are removed at a predetermined oblique angle δ1.
此處,斜角δ1可為絕緣層1220'與第二金屬層1230'之間的界面與絕緣層1220'的末端部分之間的角度,且可經選擇以在考慮到絕緣層1220'的厚度的情況下確保絕緣距離I。斜角δ1可選擇為處於0<δ1<90(度)的範圍內。隨著斜角δ1增大,絕緣層1220' 的暴露區域的絕緣距離I及寬度W2增大。因此,為了確保較大的絕緣距離,斜角δ1可選擇為較小。舉例而言,斜角δ1可選擇為處於0<δ1<45(度)的範圍內。 Here, the oblique angle δ1 may be an angle between the interface between the insulating layer 1220' and the second metal layer 1230' and the end portion of the insulating layer 1220', and may be selected to take into consideration the thickness of the insulating layer 1220'. In the case of the insulation distance I is ensured. The bevel angle δ1 can be selected to be in the range of 0 < δ1 < 90 (degrees). As the angle of inclination δ1 increases, the insulating layer 1220' The insulation distance I and the width W2 of the exposed area increase. Therefore, in order to ensure a large insulation distance, the inclination angle δ1 can be selected to be small. For example, the bevel angle δ1 can be selected to be in the range of 0 < δ1 < 45 (degrees).
圖28示意性地說明板的另一實例。參看圖28,板1300是藉由在金屬支撐基板1310上層壓樹脂塗佈銅箔(resin coated copper,RCC)膜1320(其包含絕緣層1321及層壓於絕緣層1321上的銅箔片1322)而形成,且RCC膜1320的一部分可被移除以形成使發光元件420安裝於其中的至少一個凹處。在金屬板中,因為RCC膜1320自發光元件420的下方區域移除,所以發光元件420與金屬支撐板1310直接接觸,進而由發光元件420產生的熱直接傳遞至金屬支撐板1310,從而增強發光元件420的熱輻射(或熱耗散)效能。發光元件420可經由焊接(焊料1340及1341)而電性連接或固定。由液化PSR製成的保護層1330可形成於銅箔片1322上。 Figure 28 schematically illustrates another example of a board. Referring to FIG. 28, the board 1300 is formed by laminating a resin coated copper (RCC) film 1320 (which includes an insulating layer 1321 and a copper foil 1322 laminated on the insulating layer 1321) on the metal supporting substrate 1310. Formed, and a portion of the RCC film 1320 can be removed to form at least one recess in which the light emitting element 420 is mounted. In the metal plate, since the RCC film 1320 is removed from the lower region of the light-emitting element 420, the light-emitting element 420 is in direct contact with the metal support plate 1310, and heat generated by the light-emitting element 420 is directly transmitted to the metal support plate 1310, thereby enhancing light emission. Thermal radiation (or heat dissipation) performance of element 420. The light emitting element 420 can be electrically connected or fixed via soldering (solder 1340 and 1341). A protective layer 1330 made of a liquefied PSR may be formed on the copper foil piece 1322.
圖29示意性地說明板的另一實例。在此實施例中,板包含陽極氧化金屬板,其具有優良的熱耗散特性且導致低製造成本。參看圖29,陽極氧化金屬板1400可包含:金屬板1410;陽極氧化膜1420,形成於金屬板1410上;以及金屬配線1430,形成於陽極氧化膜1420上。 Figure 29 schematically illustrates another example of a board. In this embodiment, the plate contains an anodized metal plate which has excellent heat dissipation characteristics and results in low manufacturing cost. Referring to FIG. 29, the anodized metal plate 1400 may include: a metal plate 1410; an anodized film 1420 formed on the metal plate 1410; and a metal wiring 1430 formed on the anodized film 1420.
金屬板1410可由可容易在相對低的成本下獲得的鋁(Al)或鋁合金製成。此外,金屬板1410可由任何其他可陽極氧化的金屬(例如,鈦、鎂或其類似者)製成。 The metal plate 1410 can be made of aluminum (Al) or aluminum alloy which can be easily obtained at a relatively low cost. Further, the metal plate 1410 can be made of any other anodizable metal (eg, titanium, magnesium, or the like).
藉由對鋁進行陽極氧化而獲得的鋁陽極氧化膜(Al2O3)1420具有相對高的熱傳遞特性,範圍為約10至30瓦特/公尺克爾文(W/mK)。因此,陽極氧化金屬板相對於習知聚合物板的印刷電路板(PCB)、金屬核心印刷電路板(MCPCB)或其類似者具有優良的熱耗散特性。 The aluminum anodized film (Al2O3) 1420 obtained by anodizing aluminum has a relatively high heat transfer characteristic and ranges from about 10 to 30 watts/meter Kelvin (W/mK). Therefore, the anodized metal plate has excellent heat dissipation characteristics with respect to a printed circuit board (PCB), a metal core printed circuit board (MCPCB) or the like of a conventional polymer board.
圖30示意性地說明板的另一實例。如圖30所說明,板1500可包含:絕緣樹脂1520,塗佈於金屬基板1510上;以及電路圖案1530,形成於絕緣樹脂1520上。此處,絕緣樹脂1520可具有等於或小於200微米的厚度。絕緣樹脂1520可作為固體膜而層壓於金屬基板1510上或可根據使用旋塗或刮刀的澆鑄方法而作為液體來塗佈。同樣地,電路圖案1530可藉由以金屬(諸如,銅(Cu)或其類似者)填充在絕緣樹脂1520上凹版印刷的電路圖案的設計來形成。發光元件420可經安裝以連接至電路圖案1530。 Figure 30 schematically illustrates another example of a board. As illustrated in FIG. 30, the board 1500 may include an insulating resin 1520 coated on the metal substrate 1510, and a circuit pattern 1530 formed on the insulating resin 1520. Here, the insulating resin 1520 may have a thickness equal to or smaller than 200 μm. The insulating resin 1520 may be laminated as a solid film on the metal substrate 1510 or may be applied as a liquid according to a casting method using spin coating or a doctor blade. Likewise, the circuit pattern 1530 can be formed by filling a design of a circuit pattern of intaglio printing on the insulating resin 1520 with a metal such as copper (Cu) or the like. Light emitting element 420 can be mounted to connect to circuit pattern 1530.
同時,板可包含可自由變形的可撓性印刷電路板(flexible printed circuit board,FPCB)。如圖31所說明,板1600可包含:FPCB 1610,具有一或多個通孔1611;以及支撐基板1620,FPCB 1610安裝於支撐基板1620上。耦接發光元件420的下表面及支撐基板1620的上表面的熱耗散黏著劑1640可設置於通孔1611中。此處,發光元件420的下表面可為晶片封裝的下表面、安裝有晶片的引線框架的下表面或金屬區塊。FPCB 1610包含金屬配線1630,因此FPCB 1610可藉此電性連接至發光元件420。 At the same time, the board may comprise a freely deformable flexible printed circuit board (FPCB). As illustrated in FIG. 31, the board 1600 can include: an FPCB 1610 having one or more vias 1611; and a support substrate 1620 mounted on the support substrate 1620. The heat dissipating adhesive 1640 coupled to the lower surface of the light emitting element 420 and the upper surface of the support substrate 1620 may be disposed in the through hole 1611. Here, the lower surface of the light emitting element 420 may be a lower surface of the wafer package, a lower surface of the lead frame on which the wafer is mounted, or a metal block. The FPCB 1610 includes metal wiring 1630, and thus the FPCB 1610 can be electrically connected to the light emitting element 420.
以此方式,藉由使用FPCB 1610,厚度及重量可減小, 且製造成本可降低。同樣地,因為發光元件420藉由熱耗散黏著劑1640而直接結合至支撐基板1620,從而增強熱耗散效率,所以由發光元件420產生的熱可容易輻射。 In this way, by using the FPCB 1610, the thickness and weight can be reduced, And the manufacturing cost can be reduced. Likewise, since the light-emitting element 420 is directly bonded to the support substrate 1620 by the heat dissipating adhesive 1640, thereby enhancing heat dissipation efficiency, heat generated by the light-emitting element 420 can be easily radiated.
前述板可形成為具有平板形狀。然而,板的尺寸及結構可根據將使用根據本例示性實施例的光源模組的裝置(例如,發光裝置)的結構而按各種方式修改。 The aforementioned plate may be formed to have a flat plate shape. However, the size and structure of the board may be modified in various ways according to the structure of a device (for example, a light-emitting device) that will use the light source module according to the present exemplary embodiment.
發光元件可安裝於板上且電性連接至板。任何光電元件可用作發光元件420,只要所述光電元件可藉由自外部施加至所述光電元件的電力而產生預定波長的光,且通常,發光元件420可包含半導體層磊晶生長於生長基板上的半導體發光二極體(LED)。發光元件420可根據其中所含有的材料而發射藍光、綠光或紅光,且亦可發射白光。 The light emitting element can be mounted on the board and electrically connected to the board. Any of the photovoltaic elements can be used as the light-emitting element 420 as long as the light-emitting element can generate light of a predetermined wavelength by electric power applied from the outside to the photovoltaic element, and generally, the light-emitting element 420 can include a semiconductor layer epitaxial growth growth A semiconductor light emitting diode (LED) on a substrate. The light-emitting element 420 can emit blue light, green light, or red light according to the material contained therein, and can also emit white light.
舉例而言,發光元件420可具有層壓結構,包含n型半導體層及p型半導體層以及安置於n型半導體層與p型半導體層之間的主動層。同樣地,此處,主動層可由具有單量子井或多量子井結構的包含InxAlyGa1-x-yN(0x1,0y1,0x+y1)的氮化物半導體形成。 For example, the light emitting element 420 may have a laminated structure including an n-type semiconductor layer and a p-type semiconductor layer and an active layer disposed between the n-type semiconductor layer and the p-type semiconductor layer. Similarly, here, the active layer may consist of a single quantum well or a multiple quantum well structure containing InxAlyGa1-x-yN (0 x 1,0 y 1,0 x+y 1) A nitride semiconductor is formed.
同時,可用於根據前述實施例的發光裝置中的發光元件可使用具有各種結構的LED晶片或包含此等LED晶片的各種類型的LED封裝。下文中,將描述可用於根據前述實施例的發光裝置中的各種LED晶片及LED封裝。 Meanwhile, the light-emitting elements usable in the light-emitting device according to the foregoing embodiments may use LED chips having various structures or various types of LED packages including such LED chips. Hereinafter, various LED chips and LED packages that can be used in the light emitting device according to the foregoing embodiments will be described.
<發光元件一第一實例> <Lighting element - first example>
圖32為示意性地說明作為發光二極體(LED)晶片的發光元件的一實例的側視截面圖。 32 is a side cross-sectional view schematically illustrating an example of a light-emitting element as a light-emitting diode (LED) wafer.
如圖32所說明,發光元件2000可包含形成於基板2001上的發光層壓片L。發光層壓片L可包含第一導電類型半導體層2004、主動層2005及第二導電類型半導體層2006。 As illustrated in FIG. 32, the light emitting element 2000 may include a light emitting laminate L formed on the substrate 2001. The light emitting laminate L may include a first conductive type semiconductor layer 2004, an active layer 2005, and a second conductive type semiconductor layer 2006.
同樣地,歐姆接觸層2008可形成於第二導電類型半導體層2006上,且第一電極2009a及第二電極2009b可分別形成於第一導電類型半導體層2004及歐姆接觸層2008的上表面上。 Likewise, the ohmic contact layer 2008 may be formed on the second conductive type semiconductor layer 2006, and the first electrode 2009a and the second electrode 2009b may be formed on the upper surfaces of the first conductive type semiconductor layer 2004 and the ohmic contact layer 2008, respectively.
在本揭露中,諸如「上方部分」、「上表面」、「下方部分」、「下表面」、「側表面」及其類似者的術語是基於附圖而判定,且實務上,所述術語可根據安置發光元件的方向而改變。 In the present disclosure, terms such as "upper portion", "upper surface", "lower portion", "lower surface", "side surface" and the like are determined based on the drawings, and in practice, the terms are used. It can be changed depending on the direction in which the light-emitting elements are placed.
下文中,將詳細描述發光元件的主要組件。 Hereinafter, the main components of the light-emitting element will be described in detail.
【基板】 [substrate]
構成發光元件的基板為用於磊晶生長的生長基板。作為基板2001,可使用絕緣基板、導電基板或半導體基板。舉例而言,基板2001可由藍寶石、SiC、Si、MgAl2O4、MgO、LiAlO2、LiGaO2、GaN或其類似者製成。為了磊晶地生長GaN材料,可使用作為同質基板的GaN基板,但GaN基板可由於難以製造而導致較高製造成本。 The substrate constituting the light-emitting element is a growth substrate for epitaxial growth. As the substrate 2001, an insulating substrate, a conductive substrate, or a semiconductor substrate can be used. For example, the substrate 2001 may be made of sapphire, SiC, Si, MgAl 2 O 4 , MgO, LiAlO 2 , Li Ga O 2 , GaN, or the like. In order to epitaxially grow a GaN material, a GaN substrate as a homogenous substrate can be used, but a GaN substrate can cause high manufacturing cost due to difficulty in manufacturing.
作為異質基板,通常使用藍寶石基板、碳化矽基板或其類似者,且在此狀況下,相對於相對昂貴的碳化矽基板,較頻繁利用藍寶石基板。在使用異質基板的狀況下,由於基板材料與薄 膜材料之間的晶格常數之間的差異,缺陷(諸如,錯位或其類似者)可能增加。同樣地,由於基板材料與薄膜材料之間的熱膨脹係數之間的差異,可能在溫度改變的狀況下發生翹曲,從而導致薄膜出現裂紋。此可藉由使用在基板2001與基於GaN的發光層壓片L之間形成的緩衝層2002來減少。 As the heterogeneous substrate, a sapphire substrate, a tantalum carbide substrate or the like is generally used, and in this case, the sapphire substrate is used more frequently than the relatively expensive tantalum carbide substrate. In the case of using a heterogeneous substrate, due to the substrate material and thin Differences in lattice constants between film materials, defects such as misalignment or the like may increase. Also, due to the difference between the coefficients of thermal expansion between the substrate material and the film material, warping may occur under conditions of temperature change, resulting in cracking of the film. This can be reduced by using the buffer layer 2002 formed between the substrate 2001 and the GaN-based light-emitting laminate L.
為了在LED結構的生長之前或之後增強LED晶片的光或電特性,可在晶片製造製程期間完全或部分移除或圖案化基板2001。 To enhance the optical or electrical properties of the LED wafer before or after the growth of the LED structure, the substrate 2001 can be completely or partially removed or patterned during the wafer fabrication process.
舉例而言,在藍寶石基板的狀況下,可藉由經由基板將雷射照射至藍寶石基板與半導體層之間的界面上來分離基板,且在矽基板或碳化矽基板的狀況下,可根據諸如拋光/蝕刻或其類似者的方法來移除基板。 For example, in the case of a sapphire substrate, the substrate can be separated by irradiating a laser to the interface between the sapphire substrate and the semiconductor layer via the substrate, and in the case of a germanium substrate or a tantalum carbide substrate, according to, for example, polishing / Etching or the like to remove the substrate.
同樣地,在移除基板的過程中,可使用不同支撐基板,且在此狀況下,支撐基板可藉由使用折射金屬而附著至原始生長基板的相對側,或折射結構可插入至結合層的中間部分中以增強LED晶片的光效率。 Similarly, different support substrates may be used in the process of removing the substrate, and in this case, the support substrate may be attached to the opposite side of the original growth substrate by using a refractive metal, or the refractive structure may be inserted into the bonding layer. The middle portion is used to enhance the light efficiency of the LED wafer.
在基板圖案化的狀況下,在LED結構的生長之前或之後,凹陷部及突起部(或不平整部分)或傾斜部分形成於基板的主表面(一個表面或兩個表面)上或側表面上,因此增強光提取效率。 In the case of substrate patterning, the recess and the protrusion (or uneven portion) or the inclined portion are formed on or on the main surface (one surface or both surfaces) of the substrate before or after the growth of the LED structure. Therefore, the light extraction efficiency is enhanced.
參考基板圖案化,不平整表面或傾斜表面可形成於基板的主表面(一個表面或兩個表面)上或側表面上,以增強光提取 效率。圖案的尺寸可選自5奈米至500微米的範圍,且任何圖案可得以使用,只要所述圖案可作為規則圖案或不規則圖案增強光提取效率。圖案可具有各種形狀,諸如,柱狀形狀、尖峰形狀、半球狀形狀、多邊形形狀及其類似者。 The reference substrate is patterned, and an uneven surface or an inclined surface may be formed on the main surface (one surface or both surfaces) of the substrate or on the side surface to enhance light extraction effectiveness. The size of the pattern may be selected from the range of 5 nm to 500 μm, and any pattern may be used as long as the pattern can enhance light extraction efficiency as a regular pattern or an irregular pattern. The pattern may have various shapes such as a columnar shape, a peak shape, a hemispherical shape, a polygonal shape, and the like.
在藍寶石基板的狀況下,藍寶石為具有六角菱形(Hexa-Rhombo)R3c對稱的晶體,其在c軸方向及a軸方向上的晶格常數分別為約13.001埃及4.758埃,且具有C平面(0001)、A平面(1120)及R平面(1102)及其類似者。在此狀況下,氮化物薄膜可相對容易生長在藍寶石晶體的C平面上,且因為藍寶石晶體在高溫下穩定,所以藍寶石基板通常用作氮化物生長基板。 In the case of a sapphire substrate, the sapphire is a Hexa-Rhombo R3c symmetrical crystal whose lattice constants in the c-axis direction and the a-axis direction are about 13.001 Egypt, 4.758 angstroms, respectively, and have a C-plane (0001). ), A plane (1120) and R plane (1102) and the like. In this case, the nitride film can be relatively easily grown on the C-plane of the sapphire crystal, and since the sapphire crystal is stable at a high temperature, the sapphire substrate is generally used as a nitride growth substrate.
亦可使用矽(Si)基板。因為矽(Si)基板較適用於增大直徑且價格相對低,所以矽(Si)基板可用於促進大量生產。具有(111)平面作為基板平面的Si基板相對於GaN的晶格常數相差17%。因此,需要用於抑制因晶格常數之間的差異而產生晶體缺陷的技術。同樣地,矽與GaN的熱膨脹係數之間的差異為約56%,因此,需要用於抑制因熱膨脹常數之間的差異而造成晶圓的翹曲的技術。翹曲的晶圓可能在GaN薄膜中導致裂紋且使得難以控制製程,從而導致同一晶圓或其類似者中的發光波長的分佈的增大。 A bismuth (Si) substrate can also be used. Since the bismuth (Si) substrate is more suitable for increasing the diameter and the price is relatively low, the bismuth (Si) substrate can be used to promote mass production. The Si substrate having the (111) plane as the substrate plane differs by 17% from the lattice constant of GaN. Therefore, a technique for suppressing generation of crystal defects due to a difference between lattice constants is required. Similarly, the difference between the thermal expansion coefficients of germanium and GaN is about 56%, and therefore, a technique for suppressing warpage of the wafer due to the difference between the thermal expansion constants is required. Warped wafers may cause cracks in the GaN film and make it difficult to control the process, resulting in an increase in the distribution of light emission wavelengths in the same wafer or the like.
矽(Si)基板吸收在基於GaN的半導體中產生的光,以降低發光元件的外部量子效率。因此,可移除基板,且可額外形成包含折射層的支撐基板(Si、Ge、SiAl、陶瓷或金屬基板或其 類似者)以加以使用。 The bismuth (Si) substrate absorbs light generated in the GaN-based semiconductor to reduce the external quantum efficiency of the light-emitting element. Therefore, the substrate can be removed, and a support substrate (Si, Ge, SiAl, ceramic, or metal substrate including the refractive layer or its Similar to) to use.
【緩衝層】 【The buffer layer】
在GaN薄膜生長於類似於Si基板的異質基板上時,錯位密度可能因基板材料與薄膜材料之間的晶格常數失配而增大,且裂紋及翹曲可能因為熱膨脹係數之間的差異而產生。 When a GaN thin film is grown on a hetero-substrate similar to a Si substrate, the dislocation density may increase due to a lattice constant mismatch between the substrate material and the thin film material, and cracks and warpage may be due to a difference between thermal expansion coefficients. produce.
在此狀況下,為了防止發光層壓片L的錯位及裂紋,緩衝層2002可安置於基板2001與發光層壓片L之間。緩衝層2002可用以在主動層生長時調整基板的翹曲的程度,以減小晶圓的波長分佈。 In this case, in order to prevent misalignment and cracking of the light-emitting laminate L, the buffer layer 2002 may be disposed between the substrate 2001 and the light-emitting laminate L. The buffer layer 2002 can be used to adjust the degree of warpage of the substrate during growth of the active layer to reduce the wavelength distribution of the wafer.
緩衝層可由AlxInyGa1-x-yN(0x1,0y1,0x+y1)製成,特定言之,由GaN、AlN、AlGaN、InGaN或InGaNAlN製成,且亦可使用諸如ZrB2、HfB2、ZrN、HfN、TiN或其類似者的材料。同樣地,可藉由組合多個層或藉由逐漸改變組成來形成緩衝層。 The buffer layer can be made of AlxInyGa1-x-yN (0 x 1,0 y 1,0 x+y 1) Made, in particular, made of GaN, AlN, AlGaN, InGaN or InGaN AlN, and materials such as ZrB2, HfB2, ZrN, HfN, TiN or the like can also be used. Likewise, the buffer layer can be formed by combining a plurality of layers or by gradually changing the composition.
矽基板相對於GaN具有顯著的熱膨脹係數差異。因此,為了在矽基板上生長基於GaN的薄膜,當在高溫下生長GaN薄膜且在室溫下冷卻時,由於基板與薄膜的熱膨脹係數之間的差異,拉伸應力施加至GaN薄膜,從而產生裂紋。為了防止裂紋的產生,藉由使用生長薄膜以使得壓縮應力施加至正生長的薄膜的方法來補償拉伸應力。 The tantalum substrate has a significant difference in thermal expansion coefficient with respect to GaN. Therefore, in order to grow a GaN-based thin film on a germanium substrate, when a GaN thin film is grown at a high temperature and cooled at room temperature, tensile stress is applied to the GaN thin film due to a difference between thermal expansion coefficients of the substrate and the thin film, thereby generating crack. In order to prevent the generation of cracks, the tensile stress is compensated by using a method of growing a film to apply a compressive stress to the film being grown.
矽(Si)與GaN的晶格常數之間的差異增大了在矽基板中產生缺陷的可能性。因此,在使用矽基板的狀況下,可使用具 有複合結構的緩衝層以便控制用於約束翹曲且控制缺陷的應力。 The difference between the lattice constants of germanium (Si) and GaN increases the likelihood of defects occurring in the germanium substrate. Therefore, in the case of using a crucible substrate, the appliance can be made A buffer layer having a composite structure is used to control stress for restraining warpage and controlling defects.
舉例而言,首先,在基板2001上形成AlN層。在此狀況下,可使用不包含鎵(Ga)的材料以便防止矽(Si)與鎵(Ga)之間的反應。除AlN之外,亦可使用諸如SiC或其類似者的材料。藉由使用鋁(Al)源及氮(N)源而在範圍為400℃至1,300℃的溫度下生長AlN層。可將AlGaN中間層插入至多個AlN層之間的GaN的中間以控制應力。 For example, first, an AlN layer is formed on the substrate 2001. In this case, a material not containing gallium (Ga) may be used in order to prevent a reaction between germanium (Si) and gallium (Ga). In addition to AlN, materials such as SiC or the like can also be used. The AlN layer is grown at a temperature ranging from 400 ° C to 1,300 ° C by using an aluminum (Al) source and a nitrogen (N) source. An AlGaN intermediate layer may be inserted in the middle of GaN between the plurality of AlN layers to control stress.
【發光層壓片】 [Light Emitting Laminate]
將詳細描述具有III族氮化物半導體的多層結構的發光層壓片L。第一導電類型半導體層2004及第二導電類型半導體層2006可分別由n型及p型雜質摻雜的半導體形成。 The light-emitting laminate L having a multilayer structure of a group III nitride semiconductor will be described in detail. The first conductive type semiconductor layer 2004 and the second conductive type semiconductor layer 2006 may be formed of a semiconductor doped with n-type and p-type impurities, respectively.
然而,所有例示性實施例不限於此,且相反,第一導電類型半導體層2004及第二導電類型半導體層2006可由p型及n型雜質摻雜的半導體形成。舉例而言,第一導電類型半導體層2004及第二導電類型半導體層2006可由III族氮化物半導體(例如,組成為AlxInyGa1-x-yN(0x1,0y1,0x+y1)的材料)製成。當然,例示性實施例不限於此,且第一導電類型半導體層2004及第二導電類型半導體層2006亦可由諸如AlGaInP基半導體或AlGaAs基半導體的材料製成。 However, all of the exemplary embodiments are not limited thereto, and conversely, the first conductive type semiconductor layer 2004 and the second conductive type semiconductor layer 2006 may be formed of a p-type and n-type impurity doped semiconductor. For example, the first conductive type semiconductor layer 2004 and the second conductive type semiconductor layer 2006 may be a group III nitride semiconductor (for example, composed of AlxInyGa1-x-yN (0) x 1,0 y 1,0 x+y 1) The material) is made. Of course, the exemplary embodiment is not limited thereto, and the first conductive type semiconductor layer 2004 and the second conductive type semiconductor layer 2006 may also be made of a material such as an AlGaInP-based semiconductor or an AlGaAs-based semiconductor.
同時,第一導電類型半導體層2004及第二導電類型半導體層2006可具有單層結構,或者,第一導電類型半導體層2004及第二導電類型半導體層2006可具有多層結構,所述多層結構包 含具有不同組成、厚度及其類似者的層。舉例而言,第一導電類型半導體層2004及第二導電類型半導體層2006可具有用於改良電子及電洞注入效率的載流子注入層,或可分別具有各種類型的超晶格結構。 Meanwhile, the first conductive type semiconductor layer 2004 and the second conductive type semiconductor layer 2006 may have a single layer structure, or the first conductive type semiconductor layer 2004 and the second conductive type semiconductor layer 2006 may have a multilayer structure, and the multilayer structure package Contains layers having different compositions, thicknesses, and the like. For example, the first conductive type semiconductor layer 2004 and the second conductive type semiconductor layer 2006 may have a carrier injection layer for improving electron and hole injection efficiency, or may have various types of superlattice structures, respectively.
第一導電類型半導體層2004可在鄰近於主動層2005的區域中更包含電流擴散層。電流擴散層可具有不同組成或不同雜質濃度的多個InxAlyGa(1-x-y)N層相繼層壓的結構或可具有部分形成於其中的絕緣材料層。 The first conductive type semiconductor layer 2004 may further include a current diffusion layer in a region adjacent to the active layer 2005. The current diffusion layer may have a structure in which a plurality of InxAlyGa(1-x-y)N layers of different compositions or different impurity concentrations are successively laminated or may have a layer of insulating material partially formed therein.
第二導電類型半導體層2006可在鄰近於主動層2005的區域中更包含電子阻擋層。電子阻擋層可具有不同組成的多個InxAlyGa(1-x-y)N層層壓的結構或可具有包含AlyGa(1-y)N的一或多個層。電子阻擋層具有比主動層2005的帶隙寬的帶隙,因此防止電子在第二導電類型(p型)半導體層上轉移。 The second conductive type semiconductor layer 2006 may further include an electron blocking layer in a region adjacent to the active layer 2005. The electron blocking layer may have a plurality of InxAlyGa(1-x-y)N layer laminated structures of different compositions or may have one or more layers comprising AlyGa(1-y)N. The electron blocking layer has a band gap wider than that of the active layer 2005, thus preventing electrons from being transferred on the second conductivity type (p type) semiconductor layer.
可藉由使用金屬有機化學氣相沈積(metal-organic chemical vapor deposition,MOCVD)來形成發光層壓片L。為了製造發光層壓片L,將有機金屬化合物氣體(例如,三甲基鎵(trimethyl gallium,TMG)、三甲基鋁(trimethyl aluminum,TMA))及含氮氣體(氨氣(ammonic,NH3)或其類似者)作為反應氣體供應至安裝了基板2001的反應容器,將基板維持於範圍為900℃至1,100℃的高溫下,且在生長氮化鎵基化合物半導體的同時,供應雜質氣體以層壓作為未摻雜n型或p型半導體的基於氮化鎵的化合物半導體。矽(Si)為熟知的n型雜質,且p型雜質包含鋅 (Zn)、鎘(Cd)、鈹(Be)、鎂(Mg)、鈣(Ca)、鋇(Ba)及其類似者。其中,可主要使用鎂(Mg)及鋅(Zn)。 The light-emitting laminate L can be formed by using metal-organic chemical vapor deposition (MOCVD). In order to manufacture the light-emitting laminate L, an organometallic compound gas (for example, trimethyl gallium (TMG), trimethyl aluminum (TMA)) and a nitrogen-containing gas (ammonic (NH3)) are used. Or a reaction gas is supplied as a reaction gas to a reaction vessel in which the substrate 2001 is mounted, the substrate is maintained at a high temperature ranging from 900 ° C to 1,100 ° C, and an impurity gas is supplied as a layer while growing the gallium nitride-based compound semiconductor A gallium nitride-based compound semiconductor which is an undoped n-type or p-type semiconductor is pressed.矽 (Si) is a well-known n-type impurity, and the p-type impurity contains zinc (Zn), cadmium (Cd), bismuth (Be), magnesium (Mg), calcium (Ca), barium (Ba) and the like. Among them, magnesium (Mg) and zinc (Zn) can be mainly used.
同樣地,安置於第一導電類型半導體層2004與第二導電類型半導體層2006之間的主動層2005可具有多量子井(multi-quantum,MQW)結構,其中量子井層及量子阻障層交替層壓。舉例而言,在氮化物半導體的狀況下,可使用GaN/InGaN結構,或亦可使用單量子井(single quantum well,SQW)結構。 Similarly, the active layer 2005 disposed between the first conductive type semiconductor layer 2004 and the second conductive type semiconductor layer 2006 may have a multi-quantum (MQW) structure in which a quantum well layer and a quantum barrier layer are alternated. laminated. For example, in the case of a nitride semiconductor, a GaN/InGaN structure may be used, or a single quantum well (SQW) structure may also be used.
【歐姆接觸層及第一電極與第二電極】 [Ohm contact layer and first electrode and second electrode]
歐姆接觸層2008可具有相對高的雜質濃度以具有低歐姆接觸電阻,從而降低部件的操作電壓且增強部件特性。歐姆接觸層2008可由GaN層、InGaN層、ZnO層或石墨烯層形成。 The ohmic contact layer 2008 may have a relatively high impurity concentration to have a low ohmic contact resistance, thereby reducing the operating voltage of the component and enhancing component characteristics. The ohmic contact layer 2008 may be formed of a GaN layer, an InGaN layer, a ZnO layer, or a graphene layer.
第一電極2009a或第二電極2009b可由諸如銀(Ag)、鎳(Ni)、鋁(Al)、銠(Rh)、鈀(Pd)、銥(Ir)、釕(Ru)、鎂(Mg)、鋅(Zn)、鉑(Pt)、金(Au)或其類似者的材料製成,且可具有包含諸如Ni/Ag、Zn/Ag、Ni/Al、Zn/Al、Pd/Ag、Pd/Al、Ir/Ag、Ir/Au、Pt/Ag、Pt/Al、Ni/Ag/Pt或其類似者的兩層或兩層以上的結構。 The first electrode 2009a or the second electrode 2009b may be made of, for example, silver (Ag), nickel (Ni), aluminum (Al), rhodium (Rh), palladium (Pd), iridium (Ir), ruthenium (Ru), magnesium (Mg). Made of zinc (Zn), platinum (Pt), gold (Au) or the like, and may have materials such as Ni/Ag, Zn/Ag, Ni/Al, Zn/Al, Pd/Ag, Pd Two or more layers of structures of /Al, Ir/Ag, Ir/Au, Pt/Ag, Pt/Al, Ni/Ag/Pt or the like.
圖32所說明的LED晶片具有第一電極2009a及第二電極2009b面向作為光提取表面的同一表面的結構,但LED晶片亦可實施為具有各種其他結構,諸如,第一電極及第二電極面向與光提取表面相對的表面的覆晶結構、第一電極及第二電極形成於相互相對的表面上的垂直結構、藉由在晶片中形成若干穿孔作為用 於增強電流散佈效率及熱耗散效率的結構而使用電極結構的垂直且水平的結構及其類似者。 The LED chip illustrated in FIG. 32 has a structure in which the first electrode 2009a and the second electrode 2009b face the same surface as the light extraction surface, but the LED wafer can also be implemented to have various other structures such as the first electrode and the second electrode surface. a flip-chip structure of a surface opposite to the light extraction surface, a vertical structure in which the first electrode and the second electrode are formed on mutually opposing surfaces, by forming a plurality of perforations in the wafer The vertical and horizontal structure of the electrode structure and the like are used for the structure which enhances the current spreading efficiency and the heat dissipation efficiency.
<發光元件一第二實例> <Second example of light-emitting element>
在製造高輸出的大型發光元件的狀況下,可提供促進電流散佈效率及熱耗散效率的圖33所說明的LED晶片。 In the case of manufacturing a large-sized light-emitting element having a high output, the LED wafer described in FIG. 33 which promotes current spreading efficiency and heat dissipation efficiency can be provided.
如圖33所說明,LED晶片2100可包含依序層壓的第一導電類型半導體層2104、主動層2105、第二導電類型半導體層2106、第二電極層2107、絕緣層2102、第一電極層2108及基板2101。此處,為了電性連接至第一導電類型半導體層2104,第一電極層2108包含一或多個接觸孔H,接觸孔H自第一電極層2108的一個表面延伸至第一導電類型半導體層2104的至少部分區域,且與第二導電類型半導體層2106及主動層2105電性絕緣。然而,第一電極層2108並非本實施例中的基本部件。 As illustrated in FIG. 33, the LED wafer 2100 may include a first conductive type semiconductor layer 2104, an active layer 2105, a second conductive type semiconductor layer 2106, a second electrode layer 2107, an insulating layer 2102, and a first electrode layer which are sequentially laminated. 2108 and substrate 2101. Here, in order to be electrically connected to the first conductive type semiconductor layer 2104, the first electrode layer 2108 includes one or more contact holes H extending from one surface of the first electrode layer 2108 to the first conductive type semiconductor layer At least a portion of the region 2104 is electrically insulated from the second conductive type semiconductor layer 2106 and the active layer 2105. However, the first electrode layer 2108 is not an essential component in the present embodiment.
接觸孔H自第一電極層2108的界面延伸,穿過第二電極層2107、第二導電類型半導體層2106及主動層2105,直至第一導電類型半導體層2104的內部。接觸孔H延伸至至少主動層2105與第一導電類型半導體層2104之間的界面,且可延伸至第一導電類型半導體層2104的一部分。然而,接觸孔H是為了電連接性及電流散佈而形成,因此在接觸孔H與第一導電類型半導體層2104接觸時,可達成接觸孔H的存在的目的。因此,不需要接觸孔H延伸至第一導電類型半導體層2104的外表面。 The contact hole H extends from the interface of the first electrode layer 2108, passes through the second electrode layer 2107, the second conductive type semiconductor layer 2106, and the active layer 2105, up to the inside of the first conductive type semiconductor layer 2104. The contact hole H extends to at least an interface between the active layer 2105 and the first conductive type semiconductor layer 2104, and may extend to a portion of the first conductive type semiconductor layer 2104. However, the contact hole H is formed for electrical connectivity and current spreading, and therefore, when the contact hole H is in contact with the first conductive type semiconductor layer 2104, the purpose of the contact hole H can be achieved. Therefore, it is not necessary for the contact hole H to extend to the outer surface of the first conductive type semiconductor layer 2104.
考慮到光反射功能及歐姆接觸功能與第二導電類型半導 體層2106,形成於第二導電類型半導體層2106上的第二電極層2107可由選自銀(Ag)、鎳(Ni)、鋁(Al)、銠(Rh)、鈀(Pd)、銥(Ir)、釕(Ru)、鎂(Mg)、鋅(Zn)、鉑(Pt)、金(Au)及其類似者的材料製成且可藉由使用諸如濺鍍、沉積或其類似者的製程形成。 Considering the light reflection function and the ohmic contact function and the second conductivity type semi-conductive The bulk layer 2106, the second electrode layer 2107 formed on the second conductive type semiconductor layer 2106 may be selected from the group consisting of silver (Ag), nickel (Ni), aluminum (Al), rhodium (Rh), palladium (Pd), and iridium (Ir). Made of ruthenium (Ru), magnesium (Mg), zinc (Zn), platinum (Pt), gold (Au) and the like and can be processed by using processes such as sputtering, deposition or the like form.
接觸孔H可具有穿透第二電極層2107、第二導電類型半導體層2106及主動層2105的形式以便連接至第一導電類型半導體層2104。接觸孔H可經由蝕刻製程(例如,感應耦合電漿-反應性離子蝕刻(inductively coupled plasma-reactive ion etching,ICP-RIE))或其類似者而形成。 The contact hole H may have a form penetrating the second electrode layer 2107, the second conductive type semiconductor layer 2106, and the active layer 2105 so as to be connected to the first conductive type semiconductor layer 2104. The contact hole H can be formed through an etching process (for example, inductively coupled plasma-reactive ion etching (ICP-RIE)) or the like.
絕緣層2102形成為覆蓋接觸孔H的側壁及第二導電類型半導體層2106的表面。在此狀況下,可暴露對應於接觸孔H的底部的第一導電類型半導體層2104的至少一部分。絕緣層2102可藉由沉積諸如SiO2、SiOxNy或SixNy的絕緣材料而形成。絕緣層2102可經由化學氣相沈積(chemical vapor deposition,CVD)製程在等於或低於500℃的溫度下沉積為具有範圍為約0.01微米至3微米的厚度。 The insulating layer 2102 is formed to cover the sidewall of the contact hole H and the surface of the second conductive type semiconductor layer 2106. In this case, at least a portion of the first conductive type semiconductor layer 2104 corresponding to the bottom of the contact hole H may be exposed. The insulating layer 2102 can be formed by depositing an insulating material such as SiO2, SiOxNy, or SixNy. The insulating layer 2102 may be deposited to have a thickness ranging from about 0.01 micrometers to 3 micrometers at a temperature equal to or lower than 500 ° C via a chemical vapor deposition (CVD) process.
包含藉由填充導電材料而形成的導電穿孔的第一電極層2108形成於接觸孔H中。多個導電穿孔可形成於單個發光元件區域中。穿孔的量及其接觸面積可經調整以使得多個穿孔在其與第二導電類型半導體層2104接觸的區域的平面上佔據的面積的範圍為發光元件區域的面積的1%至5%。穿孔與第一導電類型半導體 層2104接觸的區域的平面上的穿孔的半徑的範圍可為(例如)5微米至50微米,且穿孔的數目根據發光區域的寬度可為每一發光元件區域1至50個。雖然根據發光元件區域的寬度而不同,但可設置三個或三個以上穿孔。穿孔之間的距離的範圍可為100微米至500微米,且穿孔可具有包含列及行的矩陣結構。此外,穿孔之間的距離的範圍可為150微米至450微米。若穿孔之間的距離小於100微米,則穿孔的量可相對增加而減小發光面積,而降低發光效率,且若穿孔之間的距離大於500微米,則可能難以散佈電流而使發光效率降級。接觸孔H的深度的範圍可為0.5微米至5.0微米,但接觸孔H的深度可根據第二導電類型半導體層及主動層的厚度而不同。 A first electrode layer 2108 including conductive vias formed by filling a conductive material is formed in the contact hole H. A plurality of conductive vias may be formed in a single light emitting element region. The amount of perforations and their contact areas may be adjusted such that the area occupied by the plurality of perforations in the plane of the region in contact with the second conductive type semiconductor layer 2104 ranges from 1% to 5% of the area of the light emitting element region. Perforated and first conductivity type semiconductor The radius of the perforations in the plane of the region in contact with the layer 2104 may range, for example, from 5 micrometers to 50 micrometers, and the number of perforations may be from 1 to 50 per light-emitting element region depending on the width of the light-emitting region. Although different depending on the width of the light-emitting element region, three or more perforations may be provided. The distance between the perforations can range from 100 microns to 500 microns, and the perforations can have a matrix structure comprising columns and rows. Further, the distance between the perforations may range from 150 microns to 450 microns. If the distance between the perforations is less than 100 micrometers, the amount of perforations can be relatively increased to reduce the luminous area, and the luminous efficiency is lowered, and if the distance between the perforations is greater than 500 micrometers, it may be difficult to disperse current and degrade the luminous efficiency. The depth of the contact hole H may range from 0.5 μm to 5.0 μm, but the depth of the contact hole H may vary depending on the thickness of the second conductive type semiconductor layer and the active layer.
隨後,在第一電極層2108之下形成基板2101。在此結構中,基板2101可藉由導電穿孔而電連接至第一導電類型半導體層2104。 Subsequently, a substrate 2101 is formed under the first electrode layer 2108. In this configuration, the substrate 2101 can be electrically connected to the first conductive type semiconductor layer 2104 by conductive vias.
基板2101可由包含Au、Ni、Al、Cu、W、Si、Se、GaAs、SiAl、Ge、SiC、AlN、Al2O3、GaN及AlGaN中的任一者的材料製成,且可經由諸如電鍍、濺鍍、沉積、結合或其類似者的製程而形成。但所有實施例不限於此。 The substrate 2101 may be made of a material including any of Au, Ni, Al, Cu, W, Si, Se, GaAs, SiAl, Ge, SiC, AlN, Al 2 O 3 , GaN, and AlGaN, and may be, for example, plated or splashed. Formed by plating, deposition, bonding, or the like. However, all embodiments are not limited thereto.
為了減小接觸電阻,可適當地調節接觸孔H的量、形狀、間距、與第一導電類型半導體層2104及第二導電類型半導體層2106的接觸面積,及其類似者。接觸孔H可按照列及行配置為具有各種形狀以改良電流流動。此處,第二電極層2107可在第二電 極層2017與第二導電類型半導體層2106之間的界面中具有一或多個暴露區域(亦即,暴露區域E)。將外部電源連接至第二電極層2107的電極襯墊單元2109可設置於暴露區域E上。 In order to reduce the contact resistance, the amount, shape, pitch, contact area with the first conductive type semiconductor layer 2104 and the second conductive type semiconductor layer 2106, and the like can be appropriately adjusted. The contact holes H may be arranged in columns and rows to have various shapes to improve current flow. Here, the second electrode layer 2107 can be in the second electricity One or more exposed regions (ie, exposed regions E) are present in the interface between the pole layer 2017 and the second conductive type semiconductor layer 2106. An electrode pad unit 2109 that connects an external power source to the second electrode layer 2107 may be disposed on the exposed region E.
以此方式,圖33所說明的LED晶片2100可包含發光結構,所述發光結構具有彼此相對的第一主表面及第二主表面且具有分別提供第一主表面及第二主表面的第一導電類型半導體層2104及第二導電類型半導體層2106,以及第一導電類型半導體層2104與第二導電類型半導體層2106之間的主動層2105,接觸孔H自第二主表面經由主動層2105連接至第一導電類型半導體層2104的區域,第一電極層2108形成於發光結構的第二主表面上且經由接觸孔H而連接至第一導電類型半導體層2104的區域,且第二電極層2107形成於發光結構的第二主表面上且連接至第二導電類型半導體層2106。此處,第一電極2108及第二電極2107中的任一者可在發光結構的橫向方向上引出。 In this manner, the LED wafer 2100 illustrated in FIG. 33 may include a light emitting structure having first and second major surfaces opposite to each other and having a first surface providing a first major surface and a second major surface, respectively. Conductive type semiconductor layer 2104 and second conductive type semiconductor layer 2106, and active layer 2105 between first conductive type semiconductor layer 2104 and second conductive type semiconductor layer 2106, contact hole H is connected from second main surface via active layer 2105 To a region of the first conductive type semiconductor layer 2104, the first electrode layer 2108 is formed on the second main surface of the light emitting structure and connected to the region of the first conductive type semiconductor layer 2104 via the contact hole H, and the second electrode layer 2107 It is formed on the second main surface of the light emitting structure and is connected to the second conductive type semiconductor layer 2106. Here, any of the first electrode 2108 and the second electrode 2107 may be drawn in the lateral direction of the light emitting structure.
<發光元件一第三實例> <Light-emitting element - third example>
LED發光元件提供改良的熱耗散特性,且就總熱耗散效能而言,具有低熱值的LED晶片較佳用於發光元件。作為滿足此等要求的LED晶片,可使用其中包含奈米結構的LED晶片(下文中,稱為「奈米LED晶片」)。 The LED light-emitting element provides improved heat dissipation characteristics, and an LED chip having a low heat value is preferably used for the light-emitting element in terms of total heat dissipation efficiency. As the LED wafer that satisfies such requirements, an LED chip (hereinafter, referred to as "nano LED wafer") containing a nanostructure therein can be used.
此種奈米LED晶片包含最近開發的核心/外殼型奈米LED晶片(core/shell type nano-LED chip),其具有低黏合密度以產生相對低的熱度,且藉由利用奈米結構來增大發光面積而具有提 高的發光效率,藉由獲得非極化主動層而防止因極化而引起的效率的降級,因此改良下降特性,以使得發光效率隨著所注入的電流的量增加而降低。 Such a nano LED chip comprises a recently developed core/shell type nano-LED chip having a low adhesion density to generate a relatively low heat and increased by utilizing a nanostructure. Large illuminating area The high luminous efficiency prevents degradation of efficiency due to polarization by obtaining a non-polarized active layer, thus improving the falling characteristic such that the luminous efficiency decreases as the amount of injected current increases.
圖34說明作為可用於前述發光元件中的LED晶片的另一實例的奈米LED晶片。 Figure 34 illustrates a nano LED wafer as another example of an LED wafer that can be used in the foregoing light-emitting element.
如圖34所說明,奈米LED晶片2200包含形成於基板2201上的多個奈米發光結構N。在此實例中,說明奈米發光結構N具有作為杆狀結構的核心-外殼結構,但例示性實施例不限於此,且奈米發光結構N可具有諸如稜錐結構(pyramid structure)的不同結構。 As illustrated in FIG. 34, the nano LED wafer 2200 includes a plurality of nano-light emitting structures N formed on the substrate 2201. In this example, it is explained that the nano-light-emitting structure N has a core-shell structure as a rod-like structure, but the exemplary embodiment is not limited thereto, and the nano-light-emitting structure N may have a different structure such as a pyramid structure. .
奈米LED晶片2200包含形成於基板2201上的基底層2202。基底層2202為提供奈米發光結構N的生長表面的層,其可為第一導電類型半導體。具有用於奈米發光結構N(特定言之,核心)的生長的開放區域的光罩層2203可形成於基底層2202上。光罩層2203可由諸如SiO2或SiNx的介電材料製成。 The nano LED wafer 2200 includes a base layer 2202 formed on the substrate 2201. The base layer 2202 is a layer that provides a growth surface of the nano-light-emitting structure N, which may be a first conductivity type semiconductor. A photomask layer 2203 having an open region for growth of the nanoluminescent structure N (specifically, the core) may be formed on the base layer 2202. The mask layer 2203 may be made of a dielectric material such as SiO2 or SiNx.
在奈米發光結構N中,第一導電類型奈米核心2204是藉由使用具有開放區域的光罩層2203來選擇性地生長第一導電類型半導體而形成,且主動層2205及第二導電類型半導體層2206作為外殼層而形成於奈米核心2204的表面上。因此,奈米發光結構N可具有核心-外殼結構,其中第一導電類型半導體為奈米核心,且圍繞奈米核心的主動層2205及第二導電類型半導體層2206為外殼層。 In the nano-light emitting structure N, the first conductive type nano core 2204 is formed by selectively growing the first conductive type semiconductor using the photomask layer 2203 having an open region, and the active layer 2205 and the second conductive type The semiconductor layer 2206 is formed as a cap layer on the surface of the nano core 2204. Therefore, the nano-light emitting structure N may have a core-shell structure in which the first conductive type semiconductor is a nano core, and the active layer 2205 and the second conductive type semiconductor layer 2206 surrounding the nano core are outer shell layers.
奈米LED晶片2200包含填充奈米發光結構N之間的空間的填料材料2207。填料材料2207可得以使用以便在結構上使奈米發光結構N穩定且在光學上改良奈米發光結構N。填料材料2207可由諸如SiO2的透明材料製成,但所有例示性實施例不限於此。歐姆接觸層2208可形成於奈米發光結構N上,且連接至第二導電類型半導體層2206。奈米LED晶片2200包含:基底層2202,由第一導電類型的半導體形成;以及第一電極2209a及第二電極2209b,分別連接至基底層2202及歐姆接觸層1608。 The nano LED wafer 2200 includes a filler material 2207 that fills a space between the nano-light emitting structures N. A filler material 2207 can be used to structurally stabilize the nanoluminescent structure N and optically modify the nanoluminescent structure N. The filler material 2207 may be made of a transparent material such as SiO2, but all exemplary embodiments are not limited thereto. The ohmic contact layer 2208 may be formed on the nano-light emitting structure N and connected to the second conductive type semiconductor layer 2206. The nano LED wafer 2200 includes a base layer 2202 formed of a semiconductor of a first conductivity type, and a first electrode 2209a and a second electrode 2209b connected to the base layer 2202 and the ohmic contact layer 1608, respectively.
藉由形成奈米發光結構N以使得其具有不同直徑、組件及摻雜密度,兩種或兩種以上不同波長的光可自單個部件發射。藉由適當地調整具有不同波長的光,可在單個部件中在不使用磷光體的情況下實施白光,且可藉由將不同LED晶片組合至前述部件或組合諸如磷光體的波長轉換材料來實施具有各種顏色的光或具有不同色溫的白光。 By forming the nanoluminescent structure N such that it has different diameters, components, and doping densities, two or more different wavelengths of light can be emitted from a single component. By appropriately adjusting light having different wavelengths, white light can be implemented in a single component without using a phosphor, and can be implemented by combining different LED wafers to the aforementioned components or a combination of wavelength converting materials such as phosphors. Light with various colors or white light with different color temperatures.
<發光元件一第四實例> <Lighting element-fourth example>
圖35說明具有安裝於安裝基板2320上的LED晶片2310的半導體發光元件2300,所述半導體發光元件2300是作為可用於前述發光元件中的光源。 FIG. 35 illustrates a semiconductor light emitting element 2300 having an LED wafer 2310 mounted on a mounting substrate 2320 as a light source usable in the above-described light emitting element.
圖35所說明的半導體發光元件2300包含LED晶片2310。LED晶片2310呈現為形式與上述實例不同的LED晶片。 The semiconductor light emitting element 2300 illustrated in FIG. 35 includes an LED wafer 2310. The LED wafer 2310 is presented as an LED wafer of a different form than the above examples.
LED晶片2310包含:發光層壓片L,安置於基板2301的一個表面上;以及第一電極2308a及第二電極2308b,基於發光 層壓片L而安置於基板2301的相對側上。且,LED晶片2310包含覆蓋第一電極2308a及第二電極2308b的絕緣層2303。 The LED chip 2310 includes: a light emitting laminate L disposed on one surface of the substrate 2301; and a first electrode 2308a and a second electrode 2308b based on light emission The laminate L is placed on the opposite side of the substrate 2301. Moreover, the LED chip 2310 includes an insulating layer 2303 covering the first electrode 2308a and the second electrode 2308b.
第一電極2308a及第二電極2308b可包含第一電極襯墊2319a及第二電極襯墊2319b,第一電極襯墊2319a及第二電極襯墊2319b藉由電連接單元2309a及2309b而電性連接至第一電極2308a及第二電極2308b。 The first electrode 2308a and the second electrode 2308b may include a first electrode pad 2319a and a second electrode pad 2319b. The first electrode pad 2319a and the second electrode pad 2319b are electrically connected by the electrical connection units 2309a and 2309b. To the first electrode 2308a and the second electrode 2308b.
發光層壓片L可包含依序安置於基板2301上的第一導電類型半導體層2304、主動層2305及第二導電類型半導體層2306。第一電極2308a可設置為經由第二導電類型半導體層2306及主動層2305而連接至第一導電類型半導體層2304的導電穿孔。第二電極2308b可連接至第二導電類型半導體層2306。 The light emitting laminate L may include a first conductive type semiconductor layer 2304, an active layer 2305, and a second conductive type semiconductor layer 2306 which are sequentially disposed on the substrate 2301. The first electrode 2308a may be disposed to be connected to the conductive via of the first conductive type semiconductor layer 2304 via the second conductive type semiconductor layer 2306 and the active layer 2305. The second electrode 2308b may be connected to the second conductive type semiconductor layer 2306.
多個導電穿孔可形成於單個發光元件區域中。穿孔的量及其接觸面積可經調整以使得多個穿孔在其與第二導電類型半導體層2304接觸的區域的平面上佔據的面積的範圍為發光元件區域的面積的1%至5%。穿孔與第一導電類型半導體層2304接觸的區域的平面上的穿孔的半徑的範圍可為(例如)5微米至50微米,且穿孔的數目根據發光區域的寬度可為每一發光元件區域1至50個。雖然根據發光元件區域的寬度而不同,但可設置三個或三個以上穿孔。穿孔之間的距離的範圍可為100微米至500微米,且穿孔可具有包含列及行的矩陣結構。此外,穿孔之間的距離的範圍可為150微米至450微米。若穿孔之間的距離小於100微米,則穿孔的量增加而相對減小發光面積,而降低發光效率,且若穿 孔之間的距離大於500微米,則可能難以散佈電流而使發光效率降級。穿孔的深度的範圍可為0.5微米至5.0微米,但穿孔的深度可根據第二導電類型半導體層2306及主動層2305的厚度而不同。 A plurality of conductive vias may be formed in a single light emitting element region. The amount of perforations and their contact areas may be adjusted such that the area occupied by the plurality of perforations in the plane of the region where they contact the second conductive type semiconductor layer 2304 ranges from 1% to 5% of the area of the light emitting element region. The radius of the perforation in the plane of the region of the perforated region in contact with the first conductive type semiconductor layer 2304 may be, for example, 5 micrometers to 50 micrometers, and the number of the perforations may be each light-emitting element region 1 according to the width of the light-emitting region 50. Although different depending on the width of the light-emitting element region, three or more perforations may be provided. The distance between the perforations can range from 100 microns to 500 microns, and the perforations can have a matrix structure comprising columns and rows. Further, the distance between the perforations may range from 150 microns to 450 microns. If the distance between the perforations is less than 100 micrometers, the amount of perforations is increased to relatively reduce the luminous area, and the luminous efficiency is lowered, and if If the distance between the holes is greater than 500 microns, it may be difficult to spread the current to degrade the luminous efficiency. The depth of the perforations may range from 0.5 microns to 5.0 microns, although the depth of the perforations may vary depending on the thickness of the second conductive type semiconductor layer 2306 and the active layer 2305.
第一電極2308a及第二電極2308b是藉由在發光層壓片L上沈積導電歐姆材料而形成。第一電極2308a及第二電極2308b可包含Ag、Al、Ni、Cr、Cu、Au、Pd、Pt、Sn、Ti、W、Rh、Ir、Ru、Mg、Zn及其合金中的至少一者。舉例而言,第二電極2308b可形成為相對於第二導電類型半導體層2306層壓的銀(Ag)歐姆電極層。銀(Ag)歐姆電極層亦可充當光反射層。由鎳(NI)、鈦(Ti)、鉑(Pt)、鎢(W)製成的單層或其合金的層可交替選擇性地層壓於銀(Ag)層上。詳言之,Ni/Ti層、TiW/Pt層或Ti/W層可層壓於銀(Ag)層上,或此等層可交替層壓於銀(Ag)層上。 The first electrode 2308a and the second electrode 2308b are formed by depositing a conductive ohmic material on the light-emitting laminate L. The first electrode 2308a and the second electrode 2308b may include at least one of Ag, Al, Ni, Cr, Cu, Au, Pd, Pt, Sn, Ti, W, Rh, Ir, Ru, Mg, Zn, and alloys thereof . For example, the second electrode 2308b may be formed as a silver (Ag) ohmic electrode layer laminated with respect to the second conductive type semiconductor layer 2306. The silver (Ag) ohmic electrode layer may also function as a light reflecting layer. A layer of a single layer or an alloy thereof made of nickel (NI), titanium (Ti), platinum (Pt), tungsten (W) may be alternately and selectively laminated on a silver (Ag) layer. In detail, the Ni/Ti layer, the TiW/Pt layer or the Ti/W layer may be laminated on the silver (Ag) layer, or the layers may be alternately laminated on the silver (Ag) layer.
第一電極2308a可藉由層壓鉻(Cr)層及相對於第一導電類型半導體層2304在鉻(Cr)層上依序層壓Au/Pt/Ti層而形成,或可藉由層壓Al層及相對於第二導電類型半導體層2306在Al層依序層壓Ti/Ni/Au層而形成。除前述實施例之外,第一電極2308a及第二電極2308b可使用各種材料或層壓結構以便增強歐姆特性或反射特性。 The first electrode 2308a may be formed by laminating a chromium (Cr) layer and sequentially laminating an Au/Pt/Ti layer on the chromium (Cr) layer with respect to the first conductive type semiconductor layer 2304, or may be laminated The Al layer and the second conductive type semiconductor layer 2306 are formed by sequentially laminating a Ti/Ni/Au layer in the Al layer. In addition to the foregoing embodiments, the first electrode 2308a and the second electrode 2308b may use various materials or laminated structures in order to enhance ohmic characteristics or reflective characteristics.
絕緣層2303可具有暴露第一電極2308a及第二電極2308b的至少部分的開放區域,且第一電極襯墊2319a及第二電極襯墊2319b可連接至第一電極2308a及第二電極2308b。絕緣層2303可經由CVD製程在等於或低於500℃的溫度下沈積為具有範 圍為0.01微米至3微米的厚度。 The insulating layer 2303 may have an open area exposing at least a portion of the first electrode 2308a and the second electrode 2308b, and the first electrode pad 2319a and the second electrode pad 2319b may be connected to the first electrode 2308a and the second electrode 2308b. The insulating layer 2303 can be deposited as a vane at a temperature equal to or lower than 500 ° C via a CVD process. The thickness is from 0.01 micron to 3 microns.
第一電極2308a及第二電極2308b可安置於相同方向上,且可如下所述按照所謂的覆晶安裝於引線框架上。 The first electrode 2308a and the second electrode 2308b may be disposed in the same direction and may be mounted on the lead frame in a so-called flip chip as described below.
特定言之,第一電極2308a可藉由導電穿孔而連接至第一電連接單元2309a,所述導電穿孔在發光層壓片L內經由第二導電類型半導體層2306及主動層2305而連接至第一導電類型半導體層2304。 In particular, the first electrode 2308a can be connected to the first electrical connection unit 2309a by a conductive via, which is connected in the light-emitting laminate L via the second conductive type semiconductor layer 2306 and the active layer 2305. A conductive type semiconductor layer 2304.
可適當地調節導電穿孔的量、形狀、間距、與第一導電類型半導體層2304的接觸面積及其類似者以及第一電連接單元2309a以便降低接觸電阻,且導電穿孔及第一電連接單元2309a可配置成列及行以改良電流流動。 The amount, shape, pitch, contact area with the first conductive type semiconductor layer 2304, and the like, and the first electrical connection unit 2309a may be appropriately adjusted to reduce the contact resistance, and the conductive via and the first electrical connection unit 2309a may be appropriately adjusted. Can be configured in columns and rows to improve current flow.
另一電極結構可包含:第二電極2308b,直接形成於第二導電類型半導體層2306上;以及第二電連接單元2309b,形成於第二電極2308b上。除了具有形成與第二導電類型半導體層2306的電歐姆連接的功能之外,第二電極2308b可由反光材料製成,進而,如圖35所說明,在LED晶片2310安裝為所謂的覆晶結構的狀態下,自主動層2305發射的光可在基板2301的方向上有效地發射。當然,第二電極2308b可根據主發光方向而由透光導電材料(諸如,透明導電氧化物)製成。 The other electrode structure may include: a second electrode 2308b formed directly on the second conductive type semiconductor layer 2306; and a second electrical connection unit 2309b formed on the second electrode 2308b. In addition to having a function of forming an electrical ohmic connection with the second conductive type semiconductor layer 2306, the second electrode 2308b may be made of a reflective material, and further, as illustrated in FIG. 35, the LED chip 2310 is mounted as a so-called flip chip structure. In the state, light emitted from the active layer 2305 can be efficiently emitted in the direction of the substrate 2301. Of course, the second electrode 2308b may be made of a light-transmitting conductive material such as a transparent conductive oxide according to the main light-emitting direction.
如上所述的雙電極結構可由絕緣層2303電性分離。絕緣層2303可由任何材料製成,只要所述材料具有電性絕緣性質。即,絕緣層2303可由具有電絕緣性質的任何材料製成,且此處,使用 具有低光吸收度的材料。舉例而言,可使用氧化矽或氮化矽,諸如,SiO2、SiOxNy、SixNy或其類似者。反光填料可分散於透光材料中以形成反光結構。 The two-electrode structure as described above can be electrically separated by the insulating layer 2303. The insulating layer 2303 may be made of any material as long as the material has electrical insulating properties. That is, the insulating layer 2303 can be made of any material having electrical insulating properties, and here, used A material with low light absorption. For example, yttrium oxide or tantalum nitride such as SiO2, SiOxNy, SixNy or the like can be used. The reflective filler can be dispersed in the light transmissive material to form a reflective structure.
第一電極襯墊2319a及第二電極襯墊2319b可連接至第一電連接單元2309a及第二電連接單元2309b以分別充當LED晶片2310的外部端子。舉例而言,第一電極襯墊2319a及第二電極襯墊2319b可由金(Au)、銀(Ag)、鋁(Al)、鈦(Ti)、鎢(W)、銅(Cu)、錫(Sn)、鎳(Ni)、鉑(Pt)、鉻(Cr)、NiSn、TiW、AuSn或其共熔金屬製成。在此狀況下,當LED晶片2310安裝於安裝基板2320上時,第一電極襯墊2319a及第二電極襯墊2319b可藉由使用共熔金屬而結合,以使得可不使用覆晶結合一般所需的焊料凸塊。與使用焊料凸塊的狀況相比,使用共熔金屬在安裝方法中有利地獲得優良熱耗散效果。在此狀況下,為了獲得優良熱耗散效果,第一電極襯墊2319a及第二電極襯墊2319b可形成為佔用相對大的面積。 The first electrode pad 2319a and the second electrode pad 2319b may be connected to the first and second electrical connection units 2309a and 2309b to serve as external terminals of the LED chip 2310, respectively. For example, the first electrode pad 2319a and the second electrode pad 2319b may be made of gold (Au), silver (Ag), aluminum (Al), titanium (Ti), tungsten (W), copper (Cu), tin ( Sn), nickel (Ni), platinum (Pt), chromium (Cr), NiSn, TiW, AuSn or a eutectic metal thereof. In this case, when the LED chip 2310 is mounted on the mounting substrate 2320, the first electrode pad 2319a and the second electrode pad 2319b can be bonded by using a eutectic metal so that the flip chip bonding is not required. Solder bumps. The use of a eutectic metal advantageously achieves an excellent heat dissipation effect in the mounting method as compared to the case of using solder bumps. In this case, in order to obtain an excellent heat dissipation effect, the first electrode pad 2319a and the second electrode pad 2319b may be formed to occupy a relatively large area.
除非另有描述,否則可參考上文參看圖32所述的內容來理解基板2301及發光層壓片L。同樣地,雖然未展示,但緩衝層可形成於發光層壓片L與基板2301之間。緩衝層可用作由氮化物或其類似者製成的未摻雜的半導體層,以減輕在緩衝層上生長的發光層壓片L的晶格缺陷。 Unless otherwise described, the substrate 2301 and the light-emitting laminate L can be understood with reference to what has been described above with reference to FIG. Likewise, although not shown, a buffer layer may be formed between the light-emitting laminate L and the substrate 2301. The buffer layer can be used as an undoped semiconductor layer made of a nitride or the like to alleviate lattice defects of the light-emitting laminate L grown on the buffer layer.
基板2301可具有彼此相對的第一主表面及第二主表面,且不平整結構C(亦即,凹陷部及突起部)可形成於第一主表面 及第二主表面中的至少一者上。形成於基板2301的一表面上的不平整結構C可藉由蝕刻基板2301的一部分而形成以便由與基板的材料相同的材料製成。或者,不平整結構C可由與基板2301的材料不同的異質材料製成。 The substrate 2301 may have a first main surface and a second main surface opposite to each other, and the uneven structure C (ie, the depressed portion and the protruding portion) may be formed on the first main surface And at least one of the second major surfaces. The uneven structure C formed on one surface of the substrate 2301 can be formed by etching a portion of the substrate 2301 so as to be made of the same material as that of the substrate. Alternatively, the uneven structure C may be made of a different material than the material of the substrate 2301.
在例示性實施例中,因為不平整結構C形成於基板2301與第一導電類型半導體層2304之間的界面上,自主動層2305發射的光的路徑可廣泛變化,且因此,半導體層內吸收的光的光吸收比可減小,且光散射比可增大,從而提高光提取效率。 In the exemplary embodiment, since the uneven structure C is formed on the interface between the substrate 2301 and the first conductive type semiconductor layer 2304, the path of light emitted from the active layer 2305 may vary widely, and thus, absorption in the semiconductor layer The light absorption ratio of the light can be reduced, and the light scattering ratio can be increased, thereby improving the light extraction efficiency.
詳言之,不平整結構C可形成為具有規則或不規則形狀。用於形成不平整結構C的異質材料可為透明導體、透明絕緣體或具有優良反射率的材料。此處,作為透明絕緣體,可使用諸如SiO2、SiNx、Al2O3、HfO、TiO2或ZrO的材料。作為透明導體,可使用諸如ZnO的透明導電氧化物(TCO)、含有添加劑(例如,Mg、Ag、Zn、Sc、Hf、Zr、Te、Se、Ta、W、Nb、Cu、Si、Ni、Co、Mo、Cr、Sn)的氧化銦或其類似者。作為反射材料,可使用銀(Ag)、鋁(Al)或包含具有不同折射率的多層的分散式布拉格反射器(distributed Bragg reflector,DBR)。然而,例示性實施例不限於此。 In detail, the uneven structure C may be formed to have a regular or irregular shape. The heterogeneous material used to form the uneven structure C may be a transparent conductor, a transparent insulator, or a material having excellent reflectivity. Here, as the transparent insulator, a material such as SiO2, SiNx, Al2O3, HfO, TiO2 or ZrO can be used. As the transparent conductor, a transparent conductive oxide (TCO) such as ZnO, containing an additive (for example, Mg, Ag, Zn, Sc, Hf, Zr, Te, Se, Ta, W, Nb, Cu, Si, Ni, Indium oxide of Co, Mo, Cr, Sn) or the like. As the reflective material, silver (Ag), aluminum (Al), or a distributed Bragg reflector (DBR) containing a plurality of layers having different refractive indices may be used. However, the illustrative embodiments are not limited thereto.
可自第一導電類型半導體層2304移除基板2301。為了移除基板2301,可使用以雷射進行的雷射剝離(laser lift-off,LLO)製程、蝕刻或拋光製程。同樣地,在移除基板2301之後,可在第一導電類型半導體層2304的表面上形成凹陷部及突起部。 The substrate 2301 can be removed from the first conductive type semiconductor layer 2304. In order to remove the substrate 2301, a laser lift-off (LLO) process, etching or polishing process using laser can be used. Likewise, after the substrate 2301 is removed, recesses and protrusions may be formed on the surface of the first conductive type semiconductor layer 2304.
如圖35所說明,LED晶片2310安裝於安裝基板2320上。安裝基板2320包含形成於基板本體2311的上表面及下表面上的第一上方電極層2312a、第一下方電極層2312b、第二上方電極層2313a及第二下方電極層2313b,以及穿透基板本體2311以連接所述上方電極層及所述下方電極層的穿孔2313。基板本體2311可由樹脂、陶瓷或金屬製成,且所述上方電極層2312a、2313a及所述下方電極層2312b、2313b可為由金(Au)、銅(Cu)、銀(Ag)或鋁(Al)製成的金屬層。 As illustrated in FIG. 35, the LED chip 2310 is mounted on the mounting substrate 2320. The mounting substrate 2320 includes a first upper electrode layer 2312a, a first lower electrode layer 2312b, a second upper electrode layer 2313a, and a second lower electrode layer 2313b formed on the upper surface and the lower surface of the substrate body 2311, and the through substrate. The body 2311 is connected to the through holes 2313 of the upper electrode layer and the lower electrode layer. The substrate body 2311 may be made of resin, ceramic or metal, and the upper electrode layers 2312a, 2313a and the lower electrode layers 2312b, 2313b may be made of gold (Au), copper (Cu), silver (Ag) or aluminum ( Al) A metal layer made.
當然,安裝了前述LED晶片2310的基板不限於圖35所說明的安裝基板2320的組態,且可使用具有用於驅動LED晶片2310的配線結構的任何基板。舉例而言,基板可為圖25至圖31的基板中的任一者,且可設置為LED晶片安裝於具有一對引線框架的封裝本體上的封裝結構。 Of course, the substrate on which the aforementioned LED wafer 2310 is mounted is not limited to the configuration of the mounting substrate 2320 illustrated in FIG. 35, and any substrate having a wiring structure for driving the LED wafer 2310 can be used. For example, the substrate can be any of the substrates of FIGS. 25-31, and can be configured as a package structure in which the LED wafer is mounted on a package body having a pair of lead frames.
<發光元件的其他實例> <Other examples of light-emitting elements>
亦可使用具有除上文所述的前述LED晶片的結構的各種結構的LED晶片。舉例而言,亦可有利地使用一種LED晶片,其中表面電漿極化子(surface-plasmon polaritons,SPP)形成於LED晶片的金屬-介電質邊界中以與量子阱激子交互作用,因此獲得顯著改良的光提取效率。 LED wafers of various structures having the structure of the aforementioned LED wafer described above can also be used. For example, it is also advantageous to use an LED wafer in which surface-plasmon polaritons (SPP) are formed in the metal-dielectric boundary of the LED wafer to interact with the quantum well excitons, thus Significantly improved light extraction efficiency is obtained.
同時,發光元件420可經組態以包含藉由組合綠色、紅色及橙色磷光體與藍色LED晶片而發射白光的發光元件與紫光、藍光、綠光、紅光及紅外光發光元件中的至少一者。在此狀況下, 發光元件420可具有調整為範圍為鈉汽燈(演色指數:40)至太陽光等級(演色指數:100)或其類似者的演色指數(color rendering index,CRI),且具有範圍為2000克爾文至20000克爾文等級的色溫以產生各種類型的白光。發光元件420可產生具有紫色、藍色、綠色、紅色、橙色的可見光或紅外光以根據周圍氛圍或情境而調整照明色。同樣地,光源裝置可產生具有刺激植物生長的特殊波長的光。 Meanwhile, the light-emitting element 420 can be configured to include at least one of a violet, blue, green, red, and infrared light-emitting element that emits white light by combining green, red, and orange phosphors with a blue LED wafer. One. In this situation, The light-emitting element 420 may have a color rendering index (CRI) adjusted to range from a sodium vapor lamp (color rendering index: 40) to a sunlight level (color rendering index: 100) or the like, and has a range of 2000 kelvin to A color temperature of 20000 Kelvin grade to produce various types of white light. The light-emitting element 420 can generate visible or infrared light having a purple, blue, green, red, or orange color to adjust the illumination color according to the surrounding atmosphere or context. Likewise, the light source device can produce light having a particular wavelength that stimulates plant growth.
藉由將黃色、綠色、紅色磷光體塗覆至藍光LED晶片且將綠光LED及紅光LED中的至少一者組合至此而產生的白光具有兩個或兩個以上峰值波長,且可定位於連接圖36所說明的CIE1931色度圖的(x,y)坐標(0.4476,0.4074)、(0.3484,0.3516)、(0.3101,0.3162)、(0.3128,0.3292)、(0.3333,0.3333)的區段中。或者,白光可定位於由黑體輻射的光譜及所述區段圍繞的區域中。白光的色溫對應於2000克爾文至20000克爾文的範圍。 White light produced by applying a yellow, green, red phosphor to a blue LED wafer and combining at least one of a green LED and a red LED thereto has two or more peak wavelengths and is positionable Connected to the (x,y) coordinates (0.4476, 0.4074), (0.3484, 0.3516), (0.3101, 0.3162), (0.3128, 0.3292), (0.3333, 0.3333) of the CIE1931 chromaticity diagram illustrated in FIG. . Alternatively, white light can be localized in the spectrum radiated by the black body and in the area surrounded by the segments. The color temperature of white light corresponds to the range from 2000 Kelvin to 20,000 Kelvin.
磷光體可具有以下實驗式及顏色。 The phosphor can have the following experimental formula and color.
氧化物系統:黃色及綠色Y3Al5O12:Ce、Tb3Al5O12:Ce、Lu3Al5O12:Ce Oxide system: yellow and green Y3Al5O12: Ce, Tb3Al5O12: Ce, Lu3Al5O12: Ce
矽化物系統:黃色及綠色(Ba,Sr)2SiO4:Eu、黃色及橙色(Ba,Sr)3SiO5:Ce Telluride system: yellow and green (Ba, Sr) 2 SiO 4 : Eu, yellow and orange (Ba, Sr) 3 SiO 5 : Ce
氮化物系統:綠色β-SiAlON:Eu、黃色L3Si6O11:Ce、橙色α-SiAlON:Eu、紅色CaAlSiN3:Eu、Sr2Si5N8:Eu、SrSiAl4N7:Eu Nitride system: green β-SiAlON: Eu, yellow L3Si6O11: Ce, orange α-SiAlON: Eu, red CaAlSiN3: Eu, Sr2Si5N8: Eu, SrSiAl4N7: Eu
氟化物系統:KSF系統紅色K2SiF6:Mn4+ Fluoride system: KSF system red K2SiF6: Mn4+
磷光體組成應基本上符合化學計量(Stoichiometry),且各別元素可取代為元素周期表的各別族的不同元素。舉例而言,鍶(Sr)可取代為鹼土金屬中的鋇(Ba)、鈣(Ca)、鎂(Mg)或其類似者,且釔(Y)可取代為鋱(Tb)、鑥(Lu)、鈧(Sc)、釓(Gd)或其類似者。且,銪(EU)(即,活化劑)可根據能階而取代為鈰(Ce)、鋱(Tb)、鐠(Pr)、鉺(Er)、鐿(Yb)或其類似者,且活化劑可獨立應用,或共活化劑或其類似者可另外應用以改變特性。 The composition of the phosphor should be substantially consistent with stoichiometry, and the individual elements can be replaced by different elements of the individual families of the periodic table. For example, strontium (Sr) may be substituted with barium (Ba), calcium (Ca), magnesium (Mg) or the like in an alkaline earth metal, and yttrium (Y) may be substituted with lanthanum (Tb), lanthanum (Lu). ), 钪 (Sc), 釓 (Gd) or the like. Further, cerium (EU) (ie, an activator) may be substituted with cerium (Ce), cerium (Tb), praseodymium (Er), ytterbium (Yb) or the like according to energy levels, and activated. The agent may be applied independently, or a co-activator or the like may be additionally applied to change the characteristics.
同樣地,諸如量子點或其類似者的材料可作為替換磷光體的材料來應用,且磷光體及量子點可組合地或獨立地用於LED中。 Likewise, materials such as quantum dots or the like can be used as a material to replace the phosphor, and the phosphor and quantum dots can be used in combination or independently in the LED.
量子點可具有包含諸如CdSe、InP或其類似者的核心(3至10奈米)、諸如ZnS、ZnSe或其類似者的外殼(0.5至2奈米)及使核心與外殼穩定的配位子(ligand)的結構,且可根據尺寸來實施各種顏色。 The quantum dot may have a core (3 to 10 nm) including a core such as CdSe, InP or the like, a shell (0.5 to 2 nm) such as ZnS, ZnSe or the like and a ligand which stabilizes the core and the shell. The structure of (ligand), and various colors can be implemented according to the size.
下文表1展示使用藍光LED(440奈米至460奈米)的白光發光元件的應用領域中的磷光體的類型。 Table 1 below shows the type of phosphor in the field of application of white light emitting elements using blue LEDs (440 nm to 460 nm).
磷光體或量子阱可藉由使用以下方法中的至少一者來塗 覆:將其噴射於發光元件上的方法、作為膜來覆蓋的方法及作為陶瓷磷光體薄片來附著的方法,或其類似者。 The phosphor or quantum well can be coated by using at least one of the following methods Overlay: a method of ejecting it onto a light-emitting element, a method of covering as a film, and a method of attaching as a ceramic phosphor sheet, or the like.
作為噴射方法,通常使用噴灑、噴塗或其類似者,且噴灑包含氣動方法及機械方法,諸如,螺釘緊固方案、線性類型緊固方案或其類似者。經由噴射方法,可經由極少量的排放來控制點(dotting)的量,且可藉此控制色坐標(或色度)。在晶圓級或在安裝了LED的安裝板上集體地塗覆磷光體的方法的狀況下,可提高生產率且可容易控制厚度。 As the spraying method, spraying, spraying, or the like is generally used, and the spraying includes a pneumatic method and a mechanical method such as a screw fastening scheme, a linear type fastening scheme, or the like. Through the injection method, the amount of dotting can be controlled via a very small amount of emissions, and the color coordinates (or chromaticity) can be controlled thereby. In the case of a method of collectively coating a phosphor at a wafer level or on a mounting board on which an LED is mounted, productivity can be improved and thickness can be easily controlled.
直接將磷光體或量子點作為膜來覆蓋發光元件的方法可包含電泳、網版印刷(screen printing)或磷光體成型方法,但此等方法可根據是否需要塗佈晶片的側表面而具有差異。 The method of directly covering a light-emitting element with a phosphor or a quantum dot as a film may include electrophoresis, screen printing, or phosphor molding methods, but such methods may differ depending on whether or not a side surface of the wafer needs to be coated.
同時,為了在具有不同發光波長的兩種類型的磷光體中控制長波長發光磷光體再吸收以短波長發射的光的效率,可設置具有不同發光波長的兩種類型的磷光體層,且為了將晶片及兩種或兩種以上波長的再吸收及干擾減到最少,可在各別層之間包含DBR(ODR)層。為了形成均勻塗佈的膜,將磷光體製造為膜或陶瓷形式,且附著至晶片或發光元件。 Meanwhile, in order to control the efficiency of long-wavelength light-emitting phosphors to reabsorb light emitted at short wavelengths in two types of phosphors having different light-emitting wavelengths, two types of phosphor layers having different light-emitting wavelengths may be provided, and The wafer and two or more wavelengths of re-absorption and interference are minimized, and a DBR (ODR) layer can be included between the individual layers. In order to form a uniformly coated film, the phosphor is produced in the form of a film or ceramic and attached to a wafer or a light-emitting element.
為了區別光效率及光分佈特性,光轉換材料可按遠端形式來定位,且在此狀況下,光轉換材料可根據耐久性及耐熱性而與諸如光透射聚合物、玻璃或其類似者的材料一起定位。 In order to distinguish light efficiency and light distribution characteristics, the light conversion material may be positioned in a distal end form, and in this case, the light conversion material may be compatible with, for example, a light transmitting polymer, glass, or the like according to durability and heat resistance. The materials are positioned together.
磷光體塗覆技術對判定LED元件的光特性起最重要的作用,因此已按各種方式研究控制磷光體塗覆層的厚度、均勻磷光 體分佈及其類似者的技術。 Phosphor coating technology plays the most important role in determining the light characteristics of LED elements. Therefore, it has been studied in various ways to control the thickness of the phosphor coating layer and uniform phosphorescence. The technique of body distribution and its similarity.
量子點(quantum dot,QD)亦可按照與磷光體相同的方式而定位於發光元件中,且可定位於玻璃或透光聚合物材料中以執行光學轉換。 A quantum dot (QD) can also be positioned in the illuminating element in the same manner as the phosphor and can be positioned in a glass or light transmissive polymer material to perform optical conversion.
在本例示性實施例中,將發光元件說明為其中包含LED晶片的單個封裝單元,但所有例示性實施例不限於此。舉例而言,發光元件120可為LED晶片自身。在此狀況下,LED晶片可為COB型晶片,且可安裝於板上,且經由覆晶結合方法或線結合方法而直接電連接至板。 In the present exemplary embodiment, the light emitting element is illustrated as a single package unit in which the LED wafer is included, but all illustrative embodiments are not limited thereto. For example, the light emitting element 120 can be the LED wafer itself. In this case, the LED wafer may be a COB type wafer, and may be mounted on a board and directly electrically connected to the board via a flip chip bonding method or a wire bonding method.
同樣地,多個發光元件可配置於板上。在此狀況下,發光元件可為產生具有相同波長的光的相同類型的發光元件或可為產生不同波長的光的各種類型的發光元件。在本例示性實施例中,說明配置了多個發光元件,但所有例示性實施例不限於此,且可設置單個發光元件。 Likewise, a plurality of light emitting elements can be disposed on the board. In this case, the light-emitting elements may be the same type of light-emitting elements that generate light having the same wavelength or may be various types of light-emitting elements that generate light of different wavelengths. In the present exemplary embodiment, a plurality of light emitting elements are illustrated, but all of the exemplary embodiments are not limited thereto, and a single light emitting element may be provided.
使用如上所述的LED的發光裝置可根據其用途而分類為室內發光裝置及室外發光裝置。室內LED發光裝置可包含燈、螢光燈(LED燈管)、替換現有發光燈具的平板型發光裝置(改裝),且室外LED發光裝置可包含路燈、安全燈、泛光燈、景觀燈、交通燈及其類似者。 A light-emitting device using the LED as described above can be classified into an indoor light-emitting device and an outdoor light-emitting device according to the use thereof. The indoor LED lighting device may comprise a lamp, a fluorescent lamp (LED tube), a flat type lighting device (retrofit) replacing the existing lighting fixture, and the outdoor LED lighting device may include a street lamp, a safety lamp, a floodlight, a landscape lamp, and a traffic Lights and the like.
同樣地,使用LED的發光裝置可用作車輛的內部或外部光源。作為內部光源時,使用LED的發光裝置可用作車輛的車內燈、閱讀燈或作為各種儀錶板光源。作為外部光源時,使用LED 的發光裝置可用作諸如頭燈、刹車燈、轉向燈、霧燈、行駛燈及其類似者的車輛發光燈具的光源。 Likewise, a lighting device using an LED can be used as an internal or external light source of the vehicle. As an internal light source, an illuminating device using an LED can be used as an interior lamp, a reading lamp or as a various instrument panel light source of a vehicle. When using an external light source, use LED The illuminating device can be used as a light source for a vehicle illuminating luminaire such as a headlight, a brake light, a turn signal, a fog light, a running light, and the like.
此外,LED發光裝置亦可適用作用於機器人或各種機械設施中的光源。特定言之,使用特定波長帶的LED發光可加速植物生長,且使使用者的情緒穩定或使用敏感度(或情緒化)發光(illumination或lighting)來治療疾病。 In addition, the LED lighting device can also be applied to a light source that acts on a robot or various mechanical devices. In particular, LED illumination using a particular wavelength band can accelerate plant growth and stabilize the user's mood or use sensitivity (or emotional) illumination or lighting to treat the disease.
將參看圖37至圖40來描述使用如上所述的發光元件的發光系統。根據本例示性實施例的發光系統可能夠提供具有敏感度(或情緒化)發光的發光元件,而不是充當簡單的發光元件,具有敏感度(或情緒化)發光的發光元件能夠根據周圍環境(例如,溫度及濕度條件)來自動地調整色溫且滿足人類需要。 A light-emitting system using the light-emitting element as described above will be described with reference to FIGS. 37 to 40. The light emitting system according to the present exemplary embodiment may be capable of providing a light-emitting element having sensitivity (or emotional) light emission instead of acting as a simple light-emitting element, and the light-emitting element having sensitivity (or emotional) light emission can be according to the surrounding environment ( For example, temperature and humidity conditions) to automatically adjust the color temperature and meet human needs.
圖37為示意性地說明根據本揭露的一實施例的發光系統的方塊圖。 FIG. 37 is a block diagram schematically illustrating an illumination system in accordance with an embodiment of the present disclosure.
參看圖37,根據本揭露的一實施例的發光系統10000可包含感測單元10010、控制單元10020、驅動單元10030及發光單元10040。 Referring to FIG. 37, an illumination system 10000 according to an embodiment of the present disclosure may include a sensing unit 10010, a control unit 10020, a driving unit 10030, and a lighting unit 10040.
感測單元10010可安裝於室內或室外區域中,且可具有溫度感測器10011及濕度感測器10012以量測周圍溫度及濕度中的至少一個空氣條件。感測單元10010將所量測的至少一個空氣條件(亦即,溫度及濕度中的至少一者)傳輸至電性連接至感測單元10010的控制單元10020。 The sensing unit 10010 can be installed in an indoor or outdoor area, and can have a temperature sensor 10011 and a humidity sensor 10012 to measure at least one of ambient temperature and humidity. The sensing unit 10010 transmits the measured at least one air condition (ie, at least one of temperature and humidity) to the control unit 10020 that is electrically connected to the sensing unit 10010.
控制單元10020可比較所量測的空氣的溫度及濕度與使 用者預先設定的空氣條件設定(溫度及濕度範圍),且根據比較結果而判定對應於所述空氣條件的發光單元10040的色溫。控制單元10020電性連接至驅動單元10030,且控制驅動單元10030以驅動發光單元10040。 The control unit 10020 can compare the measured temperature and humidity of the air with The user sets the air condition (temperature and humidity range) set in advance, and determines the color temperature of the light-emitting unit 10040 corresponding to the air condition based on the comparison result. The control unit 10020 is electrically connected to the driving unit 10030, and controls the driving unit 10030 to drive the lighting unit 10040.
發光單元10040根據由驅動單元1003供應的電力來操作。發光單元10040可包含圖1、圖8及圖15所說明的至少一個發光元件。舉例而言,如圖38所說明,發光單元10040可包含具有不同色溫的第一發光元件10041及第二發光元件10042,且發光元件10041及10042中的每一者可包含發射相同白光的多個發光元件。 The light emitting unit 10040 operates in accordance with power supplied from the driving unit 1003. The light emitting unit 10040 can include at least one light emitting element illustrated in FIGS. 1, 8, and 15. For example, as illustrated in FIG. 38, the light emitting unit 10040 can include a first light emitting element 10041 and a second light emitting element 10042 having different color temperatures, and each of the light emitting elements 10041 and 10042 can include multiple emitting the same white light. Light-emitting element.
第一發光元件10041可發射具有第一色溫的白光,且第二發光元件10042可發射具有第二色溫的白光。在此狀況下,第一色溫可低於第二色溫。相反,第一色溫可高於第二色溫。此處,具有相對低的色溫的白光對應於暖白光,且具有相對高的色溫的白光對應於冷白光。當電力供應至第一發光元件10041及第二發光元件10042時,第一發光元件10041及第二發光元件10042分別發射具有第一色溫及第二色溫的白光,且各別白光光束經混合以實施具有由控制單元10020判定的色溫的白光。 The first light emitting element 10041 can emit white light having a first color temperature, and the second light emitting element 10042 can emit white light having a second color temperature. In this case, the first color temperature may be lower than the second color temperature. Instead, the first color temperature can be higher than the second color temperature. Here, white light having a relatively low color temperature corresponds to warm white light, and white light having a relatively high color temperature corresponds to cool white light. When power is supplied to the first light emitting element 10041 and the second light emitting element 10042, the first light emitting element 10041 and the second light emitting element 10042 respectively emit white light having a first color temperature and a second color temperature, and the respective white light beams are mixed to implement White light having a color temperature determined by the control unit 10020.
詳言之,在第一色溫低於第二色溫的狀況下,若由控制單元10020判定的色溫相對高,則第一發光元件10041的光的量可減少且第二發光元件10042的光的量可增加以實施具有預定色溫的混合白光。相反,當預定色溫相對低時,第一發光元件10041 的量可增加且第二發光元件10042的量可減少以實施具有預定色溫的混合白光。此處,各別發光元件10041及10042的光的量可藉由調節電力而調整全部發光元件的光的量來實施,或可藉由調整所驅動的發光元件的量而實施。 In detail, in a state where the first color temperature is lower than the second color temperature, if the color temperature determined by the control unit 10020 is relatively high, the amount of light of the first light emitting element 10041 can be reduced and the amount of light of the second light emitting element 10042 It may be added to implement mixed white light having a predetermined color temperature. In contrast, when the predetermined color temperature is relatively low, the first light emitting element 10041 The amount can be increased and the amount of second light emitting element 10042 can be reduced to implement mixed white light having a predetermined color temperature. Here, the amount of light of each of the respective light-emitting elements 10041 and 10042 can be implemented by adjusting the amount of light of all the light-emitting elements by adjusting the electric power, or can be implemented by adjusting the amount of the light-emitting elements to be driven.
圖39為說明用於控制圖37所說明的發光系統的方法的流程圖。參看圖39,首先,使用者經由控制單元10020根據溫度及濕度範圍而設定色溫(S10)。所設定的溫度及濕度資料儲存於控制單元10020中。 Figure 39 is a flow chart illustrating a method for controlling the illumination system illustrated in Figure 37. Referring to Fig. 39, first, the user sets the color temperature based on the temperature and humidity range via the control unit 10020 (S10). The set temperature and humidity data is stored in the control unit 10020.
一般而言,當色溫等於或大於6000克爾文時,可產生提供冷感覺的顏色(諸如,藍色),且當色溫小於4000克爾文時,可產生提供暖感覺的顏色(諸如,紅色)。因此,在本實施例中,當溫度及濕度分別超過20℃及60%時,使用者可經由控制單元10020將發光單元10040設定為接通的以具有高於6000克爾文的色溫,當溫度及濕度的範圍分別為10℃至20℃及40%至60%時,使用者可經由控制單元10020將發光單元10040設定為接通的以具有範圍為4000克爾文至6000克爾文的色溫,且當溫度及濕度分別低於10℃及40%時,使用者可經由控制單元10020將發光單元10040設定為接通的以具有低於4000克爾文的色溫。 In general, when the color temperature is equal to or greater than 6000 gram, a color (such as blue) that provides a cold sensation can be produced, and when the color temperature is less than 4000 gram, a color (such as red) that provides a warm sensation can be produced. Therefore, in this embodiment, when the temperature and the humidity exceed 20 ° C and 60%, respectively, the user can set the light emitting unit 10040 to be turned on via the control unit 10020 to have a color temperature higher than 6000 gram, when the temperature and When the humidity ranges from 10 ° C to 20 ° C and 40% to 60%, respectively, the user can set the light emitting unit 10040 to be turned on via the control unit 10020 to have a color temperature ranging from 4000 Kelvin to 6000 Kelvin, and when When the temperature and humidity are lower than 10 ° C and 40%, respectively, the user can set the light emitting unit 10040 to be turned on via the control unit 10020 to have a color temperature of less than 4000 Kelvin.
接著,感測單元10010量測周圍溫度及濕度中的至少一個條件(S20)。由感測單元10010量測的溫度及濕度被傳輸至控制單元10020。 Next, the sensing unit 10010 measures at least one of the ambient temperature and the humidity (S20). The temperature and humidity measured by the sensing unit 10010 are transmitted to the control unit 10020.
隨後,控制單元10020比較自感測單元10010傳輸的量 測值與預先設定值(S30)。此處,量測值為由感測單元10010量測的溫度及濕度資料,且預先設定值為由使用者預先設定且儲存於控制單元10020中的溫度及濕度值。即,控制單元10020比較所量測的溫度及濕度等級與預先設定的溫度及濕度等級。 Subsequently, the control unit 10020 compares the amount transmitted from the sensing unit 10010. The measured value is a preset value (S30). Here, the measured value is the temperature and humidity data measured by the sensing unit 10010, and the preset value is a temperature and humidity value preset by the user and stored in the control unit 10020. That is, the control unit 10020 compares the measured temperature and humidity levels with preset temperature and humidity levels.
控制單元10020判定量測值是否滿足預先設定值範圍(S40)。當量測值滿足預先設定值範圍時,控制單元10020維持當前色溫,且繼續量測溫度及濕度(S20)。同時,當量測值不滿足預先設定值範圍時,控制單元10020偵測對應於量測值的預先設定值且判定對應的色溫(S50)。此後,控制單元10020控制驅動單元10030以驅動發光單元10040來具有預定色溫。 The control unit 10020 determines whether the measured value satisfies a preset value range (S40). When the equivalent measured value satisfies the preset value range, the control unit 10020 maintains the current color temperature and continues to measure the temperature and humidity (S20). Meanwhile, when the equivalent measured value does not satisfy the preset value range, the control unit 10020 detects a preset value corresponding to the measured value and determines a corresponding color temperature (S50). Thereafter, the control unit 10020 controls the driving unit 10030 to drive the light emitting unit 10040 to have a predetermined color temperature.
接著,驅動單元10030驅動發光單元10040以具有預定色溫(S60)。即,驅動單元10030供應所需電力以驅動發光單元10040來實施預定色溫。因此,發光單元10040可經調整以具有對應於由使用者根據周圍溫度及濕度預先設定的溫度及濕度的色溫。 Next, the driving unit 10030 drives the light emitting unit 10040 to have a predetermined color temperature (S60). That is, the driving unit 10030 supplies the required power to drive the light emitting unit 10040 to implement a predetermined color temperature. Therefore, the light emitting unit 10040 can be adjusted to have a color temperature corresponding to the temperature and humidity preset by the user according to the ambient temperature and humidity.
以此方式,發光系統能夠根據周圍溫度及濕度的改變而自動地調節室內發光單元的色溫,藉此滿足根據周圍自然環境的改變而變化的人類情緒且提供心理穩定性。 In this way, the illumination system is capable of automatically adjusting the color temperature of the indoor lighting unit in accordance with changes in ambient temperature and humidity, thereby satisfying human emotions that vary according to changes in the surrounding natural environment and providing psychological stability.
圖40為示意性地說明圖37所說明的發光系統的使用的視圖。如圖40所說明,發光單元10040可安裝於天花板上作為室內燈。此處,感測單元10010可實施為獨立元件且安裝於外牆上,以便量測室外溫度及濕度。控制單元10020可安裝於室內區域中, 以允許使用者容易地執行設定及確定操作。然而,根據例示性實施例的發光系統不限於此,且可安裝於位於內部發光元件的位置中的牆壁上或可適用於可在室內及室外區域中使用的燈,諸如,檯燈或其類似者。 Figure 40 is a view schematically illustrating the use of the illumination system illustrated in Figure 37. As illustrated in FIG. 40, the light emitting unit 10040 can be mounted on a ceiling as an indoor light. Here, the sensing unit 10010 can be implemented as a separate component and mounted on an exterior wall to measure outdoor temperature and humidity. The control unit 10020 can be installed in an indoor area. To allow the user to easily perform settings and determine operations. However, the light emitting system according to the exemplary embodiment is not limited thereto, and may be mounted on a wall located in a position of the internal light emitting element or may be applicable to a lamp that can be used in indoor and outdoor areas, such as a desk lamp or the like. .
將參看圖41至圖44來描述使用前述發光元件的發光系統的另一實例。根據本實施例的發光系統可藉由偵測所監視的目標的運動及在所監視的目標的位置處的發光強度而自動地執行預定控制,且自動地執行預定控制。 Another example of the illumination system using the foregoing light-emitting elements will be described with reference to FIGS. 41 to 44. The illumination system according to the present embodiment can automatically perform predetermined control by detecting the motion of the monitored target and the illumination intensity at the position of the monitored target, and automatically performs predetermined control.
圖41為根據另一例示性實施例的發光系統的方塊圖。 FIG. 41 is a block diagram of a lighting system in accordance with another exemplary embodiment.
參看圖41,根據本實施例的發光系統10000'包含無線感測模組10100及無線發光控制裝置10200。 Referring to FIG. 41, the illumination system 10000' according to the present embodiment includes a wireless sensing module 10100 and a wireless illumination control device 10200.
無線感測模組10100可包含運動感測器10100、感測照明強度的照明強度感測器10120及產生無線信號且傳輸所述無線信號的第一無線通信單元,所述無線信號包含來自運動感測器10110的運動感測信號及來自照明強度感測器10120的照明強度感測信號且符合預定通信協定。第一無線通信單元可組態為產生符合預先設定的通信協定的ZigBee信號且傳輸所述ZigBee信號的第一ZigBee通信單元10130。 The wireless sensing module 10100 can include a motion sensor 10100, an illumination intensity sensor 10120 that senses illumination intensity, and a first wireless communication unit that generates a wireless signal that includes the sense of motion. The motion sensing signal of the detector 10110 and the illumination intensity sensing signal from the illumination intensity sensor 10120 and conform to a predetermined communication protocol. The first wireless communication unit is configurable to generate a first ZigBee communication unit 10130 that conforms to a ZigBee signal of a predetermined communication protocol and transmits the ZigBee signal.
無線發光控制裝置10200可包含自第一無線通信單元接收無線信號且復原感測信號的第二無線通信單元、分析來自第二無線通信單元的感測信號的感測信號分析單元10220及基於來自感測信號分析單元10220的分析結果而執行預定控制的操作控制 單元10230。第二無線通信單元可組態為自第一ZigBee通信單元接收ZigBee信號且復原感測信號的第二ZigBee通信單元10210。 The wireless illumination control device 10200 may include a second wireless communication unit that receives a wireless signal from the first wireless communication unit and restores the sensing signal, a sensing signal analysis unit 10220 that analyzes the sensing signal from the second wireless communication unit, and a sense based on The operation control of the predetermined control is performed by the analysis result of the signal analysis unit 10220 Unit 10230. The second wireless communication unit can be configured as a second ZigBee communication unit 10210 that receives the ZigBee signal from the first ZigBee communication unit and restores the sensed signal.
圖42為說明根據一例示性實施例的ZigBee信號的格式的視圖。 FIG. 42 is a view illustrating a format of a ZigBee signal, according to an exemplary embodiment.
參看圖33,來自第一ZigBee通信單元10130的ZigBee信號可包含定義通信頻道的頻道資訊(CH)、定義無線網路的無線網路識別(ID)資訊(PAN_ID)、表示目標元件的元件位址(Ded_Add)及包含運動及照明強度信號的感測資料。 Referring to FIG. 33, the ZigBee signal from the first ZigBee communication unit 10130 may include channel information (CH) defining a communication channel, wireless network identification (ID) information (PAN_ID) defining a wireless network, and a component address indicating a target component. (Ded_Add) and sensing data containing motion and illumination intensity signals.
同樣地,來自第二ZigBee通信單元10210的ZigBee信號可包含定義通信頻道的頻道資訊(CH)、定義無線網路的無線網路識別(ID)資訊(PAN_ID)、表示目標元件的元件位址(Ded_Add)及包含運動及照明強度信號的感測資料。 Similarly, the ZigBee signal from the second ZigBee communication unit 10210 may include channel information (CH) defining a communication channel, wireless network identification (ID) information (PAN_ID) defining a wireless network, and a component address indicating a target component ( Ded_Add) and sensing data containing motion and illumination intensity signals.
基於所感測的運動及所感測的照明強度,感測信號分析單元10220可分析來自第二ZigBee通信單元10210的感測信號以偵測多個條件中的已滿足條件。 Based on the sensed motion and the sensed illumination intensity, the sensed signal analysis unit 10220 can analyze the sensed signal from the second ZigBee communication unit 10210 to detect a satisfied condition among the plurality of conditions.
此處,操作控制單元10230可基於由感測信號分析單元10220預先設定的多個條件而設定多個控制,且執行對應於由感測信號分析單元10220偵測的條件的控制。 Here, the operation control unit 10230 may set a plurality of controls based on a plurality of conditions set in advance by the sensing signal analysis unit 10220, and perform control corresponding to the condition detected by the sensing signal analysis unit 10220.
圖43為說明根據一例示性實施例的感測信號分析單元及操作控制單元的視圖。參看圖43,舉例而言,基於所感測的運動及所感測的發光強度,感測信號分析單元10220可分析來自第二ZigBee通信單元10210的感測信號且偵測第一、第二及第三條件 (條件1、條件2及條件3)中的已滿足條件。 FIG. 43 is a view illustrating a sensing signal analysis unit and an operation control unit, according to an exemplary embodiment. Referring to FIG. 43, for example, based on the sensed motion and the sensed illumination intensity, the sensing signal analysis unit 10220 can analyze the sensing signal from the second ZigBee communication unit 10210 and detect the first, second, and third. condition The conditions have been met in (Condition 1, Condition 2, and Condition 3).
在此狀況下,操作控制單元10230可設定對應於由感測信號分析單元10220預先設定的第一、第二及第三條件(條件1、條件2及條件3)的第一、第二及第三控制(控制1、控制2及控制3),且執行對應於由感測信號分析單元10220偵測的條件的控制。 In this case, the operation control unit 10230 can set the first, second, and third corresponding to the first, second, and third conditions (condition 1, condition 2, and condition 3) preset by the sensing signal analysis unit 10220. Three controls (Control 1, Control 2, and Control 3), and control corresponding to the conditions detected by the sensing signal analysis unit 10220 are performed.
圖44為說明根據一例示性實施例的無線發光系統的操作的流程圖。 44 is a flow chart illustrating operation of a wireless lighting system, in accordance with an illustrative embodiment.
在圖44中,在操作S110中,運動感測器10110偵測運動。在操作S120中,照明強度感測器10120偵測照明強度。操作S200為傳輸及接收ZigBee信號的處理程序。操作S200可包含藉由第一ZigBee通信單元10130傳輸ZigBee信號的操作S130,及藉由第二ZigBee通信單元10210接收ZigBee信號的操作S210。在操作S220中,感測信號分析單元10220分析感測信號。在操作S230中,操作控制單元10230執行預定控制。在操作S240中,判定是否終止發光系統。 In FIG. 44, the motion sensor 10110 detects motion in operation S110. In operation S120, the illumination intensity sensor 10120 detects the illumination intensity. Operation S200 is a processing program for transmitting and receiving ZigBee signals. Operation S200 may include an operation S130 of transmitting a ZigBee signal by the first ZigBee communication unit 10130, and an operation S210 of receiving a ZigBee signal by the second ZigBee communication unit 10210. In operation S220, the sensing signal analysis unit 10220 analyzes the sensing signal. In operation S230, the operation control unit 10230 performs predetermined control. In operation S240, it is determined whether to terminate the lighting system.
將參看圖41至圖44來描述根據一例示性實施例的無線感測模組及無線發光控制裝置的操作。 The operation of the wireless sensing module and the wireless lighting control device according to an exemplary embodiment will be described with reference to FIGS. 41 through 44.
首先,將參看圖41、圖42及圖44來描述根據例示性實施例的無線發光系統的無線感測模組10100。根據例示性實施例的無線發光系統10100安裝於安裝發光元件的位置,以偵測發光元件的電流的當前照明強度且偵測發光元件附近的人類運動。 First, a wireless sensing module 10100 of a wireless lighting system according to an exemplary embodiment will be described with reference to FIGS. 41, 42, and 44. The wireless lighting system 10100 according to the exemplary embodiment is mounted at a position where the light emitting element is mounted to detect the current illumination intensity of the current of the light emitting element and detect human motion in the vicinity of the light emitting element.
即,無線感測模組10100的運動感測器10110組態為能夠感測人類的紅外線感測器或其類似者。運動感測器10100感測運動且將其提供至第一ZigBee通信單元10130(圖44中的S110)。無線感測模組10100的照明強度感測器10120感測照明強度且將其提供至第一ZigBee通信單元10130(S120)。 That is, the motion sensor 10110 of the wireless sensing module 10100 is configured to be capable of sensing a human infrared sensor or the like. The motion sensor 10100 senses motion and supplies it to the first ZigBee communication unit 10130 (S110 in Fig. 44). The illumination intensity sensor 10120 of the wireless sensing module 10100 senses the illumination intensity and provides it to the first ZigBee communication unit 10130 (S120).
因此,第一ZigBee通信單元10130產生ZigBee信號且無線地傳輸所產生的ZigBee信號,所述ZigBee信號包含來自運動感測器10100的運動感測信號及來自照明強度感測器10120的照明強度感測信號且符合預先設定的通信協定(S130)。 Accordingly, the first ZigBee communication unit 10130 generates a ZigBee signal and wirelessly transmits the generated ZigBee signal, the ZigBee signal including the motion sensing signal from the motion sensor 10100 and the illumination intensity sensing from the illumination intensity sensor 10120. The signal conforms to a predetermined communication protocol (S130).
參看圖42,來自第一ZigBee通信單元10130的ZigBee信號可包含定義通信頻道的頻道資訊(CH)、定義無線網路的無線網路識別(ID)資訊(PAN_ID)、表示目標元件的元件位址(Ded_Add)及感測資料,且此處,感測資料包含運動值及照明強度值。 Referring to FIG. 42, the ZigBee signal from the first ZigBee communication unit 10130 may include channel information (CH) defining a communication channel, wireless network identification (ID) information (PAN_ID) defining a wireless network, and a component address indicating a target component. (Ded_Add) and sensing data, and here, the sensing data includes motion values and illumination intensity values.
接著,將參看圖41至圖44來描述根據一例示性實施例的無線發光系統的無線發光控制裝置10200。根據一例示性實施例的無線發光系統的無線發光控制裝置10200可根據包含於來自無線感測模組10100的ZigBee信號中的照明強度值及運動值而控制預定操作。 Next, a wireless lighting control apparatus 10200 of a wireless lighting system according to an exemplary embodiment will be described with reference to FIGS. 41 to 44. The wireless lighting control device 10200 of the wireless lighting system according to an exemplary embodiment may control a predetermined operation according to illumination intensity values and motion values included in a ZigBee signal from the wireless sensing module 10100.
即,根據例示性實施例的無線發光控制裝置10200的第二ZigBee通信單元10210自第一ZigBee通信單元10130接收ZigBee信號,自所述ZigBee信號復原感測信號,且將所復原的感 測信號提供至感測信號分析單元10200(圖44中的S210)。 That is, the second ZigBee communication unit 10210 of the wireless light emission control device 10200 according to the exemplary embodiment receives the ZigBee signal from the first ZigBee communication unit 10130, restores the sensing signal from the ZigBee signal, and restores the sensedness. The measurement signal is supplied to the sensing signal analysis unit 10200 (S210 in Fig. 44).
參看圖42,來自第二ZigBee通信單元10210的ZigBee信號可包含定義通信頻道的頻道資訊(CH)、定義無線網路的無線網路識別(ID)資訊(PAN_ID)、表示目標元件的元件位址(Ded_Add)及感測資料。無線網路可基於頻道資訊(CH)及無線網路ID資訊(PAN_ID)而識別,且所感測的元件可基於元件位址而辨識。感測信號包含運動值及照明強度值。 Referring to FIG. 42, the ZigBee signal from the second ZigBee communication unit 10210 may include channel information (CH) defining a communication channel, wireless network identification (ID) information (PAN_ID) defining a wireless network, and a component address indicating a target component. (Ded_Add) and sensing data. The wireless network can be identified based on channel information (CH) and wireless network ID information (PAN_ID), and the sensed components can be identified based on the component address. The sensing signal includes a motion value and an illumination intensity value.
且,參看圖41,感測信號分析單元10220分析包含於來自第二ZigBee通信單元10210的感測信號中的照明強度值及運動值,且將分析結果提供至操作控制單元10230(圖44中的S220)。 Referring to FIG. 41, the sensing signal analysis unit 10220 analyzes the illumination intensity value and the motion value included in the sensing signal from the second ZigBee communication unit 10210, and supplies the analysis result to the operation control unit 10230 (in FIG. 44 S220).
因此,操作控制單元10230可根據來自感測信號分析單元10220的分析結果而執行預定控制(S230)。 Therefore, the operation control unit 10230 can perform predetermined control in accordance with the analysis result from the sensing signal analysis unit 10220 (S230).
基於所感測的運動及所感測的照明強度,感測信號分析單元10220可分析來自第二ZigBee通信單元10210的感測信號且偵測多個條件中的已滿足條件。此處,操作控制單元10230可設定對應於由感測信號分析單元10220預先設定的多個條件的多個控制,且執行對應於由感測信號分析單元10220偵測的條件的控制。 Based on the sensed motion and the sensed illumination intensity, the sensed signal analysis unit 10220 can analyze the sensed signal from the second ZigBee communication unit 10210 and detect a satisfied condition among the plurality of conditions. Here, the operation control unit 10230 may set a plurality of controls corresponding to a plurality of conditions set in advance by the sensing signal analysis unit 10220, and perform control corresponding to the conditions detected by the sensing signal analysis unit 10220.
舉例而言,參看圖43,感測信號分析單元10220可藉由分析來自第二ZigBee通信單元10210的感測信號基於所感測的人類運動及所感測的照明強度而偵測第一、第二及第三條件(條件1、條件2及條件3)中的已滿足條件。 For example, referring to FIG. 43, the sensing signal analyzing unit 10220 can detect the first and second sums based on the sensed human motion and the sensed illumination intensity by analyzing the sensing signal from the second ZigBee communication unit 10210. The conditions in the third condition (Condition 1, Condition 2, and Condition 3) have been met.
在此狀況下,操作控制單元10230可設定對應於由感測信號分析單元10220預先設定的第一、第二及第三條件(條件1、條件2及條件3)的第一、第二及第三控制(控制1、控制2及控制3),且執行對應於由感測信號分析單元10220偵測的條件的控制。 In this case, the operation control unit 10230 can set the first, second, and third corresponding to the first, second, and third conditions (condition 1, condition 2, and condition 3) preset by the sensing signal analysis unit 10220. Three controls (Control 1, Control 2, and Control 3), and control corresponding to the conditions detected by the sensing signal analysis unit 10220 are performed.
舉例而言,當第一條件(條件1)對應於在前門處感測到人類運動且前門處的照明強度不低(不暗)的狀況時,第一控制可切斷所有預定燈。當第二條件(條件2)對應於在前門處感測到人類運動且前門處的照明強度低(昏暗)的狀況時,第二控制可接通一些預先設定的燈(亦即,前門處的一些燈及起居室中的一些燈)。當第三條件(條件3)對應於在門擋處感測到人類運動且前門處的照明強度極低(極暗)的狀況時,第三控制可接通所有的預先設定的燈。 For example, when the first condition (Condition 1) corresponds to a condition in which human motion is sensed at the front door and the illumination intensity at the front door is not low (not dark), the first control may cut off all of the predetermined lamps. When the second condition (Condition 2) corresponds to a condition in which human motion is sensed at the front door and the illumination intensity at the front door is low (dim), the second control may turn on some preset lights (ie, at the front door) Some lights and some lights in the living room). The third control may turn on all of the preset lights when the third condition (Condition 3) corresponds to a condition in which human motion is sensed at the door stop and the illumination intensity at the front door is extremely low (very dark).
不同於前述狀況,除接通或切斷燈的操作以外,第一、第二及第三控制可根據預先設定的操作按各種方式應用。舉例而言,第一、第二及第三控制可在夏天與燈及空調的操作相關聯,或可在冬天與燈及暖氣的操作相關聯。 Unlike the foregoing, in addition to the operation of turning the lamp on or off, the first, second, and third controls may be applied in various manners according to a preset operation. For example, the first, second, and third controls may be associated with operation of the lights and air conditioners during the summer or may be associated with operation of the lights and heaters during the winter.
將參看圖45至圖48來描述使用前述發光元件的發光系統的另一實例。 Another example of a lighting system using the foregoing lighting element will be described with reference to FIGS. 45 to 48.
圖45為示意性地說明根據另一例示性實施例的發光系統的構成部件的方塊圖。根據本實施例的發光系統10000"可包含運動感測器單元11000、照明強度感測器單元12000、發光單元13000 及控制單元14000。 FIG. 45 is a block diagram schematically illustrating constituent components of a lighting system according to another exemplary embodiment. The illumination system 10000" according to the present embodiment may include a motion sensor unit 11000, an illumination intensity sensor unit 12000, and a light unit 13000. And control unit 14000.
運動感測器單元11000感測物件的運動。舉例而言,發光系統可附接至可移動物件(諸如,集裝箱(container)或車輛),且運動感測器單元11000感測移動的物件的運動。當感測到被附接發光系統的物件的運動時,運動感測器單元11000將信號輸出至控制單元14000且發光系統啟動。運動感測器單元11000可包含加速度計、地磁感測器,或其類似者。 The motion sensor unit 11000 senses the motion of the object. For example, the lighting system can be attached to a movable item such as a container or a vehicle, and the motion sensor unit 11000 senses the motion of the moving item. When the motion of the object to which the illumination system is attached is sensed, the motion sensor unit 11000 outputs a signal to the control unit 14000 and the illumination system is activated. The motion sensor unit 11000 can include an accelerometer, a geomagnetic sensor, or the like.
照明強度感測器單元12000(一種類型的光學感測器)量測周圍環境的照明強度。當運動感測器單元11000感測到被附接照明發光系統的物件的運動時,照明強度感測器單元12000根據由控制單元14000輸出的信號而啟動。發光系統在夜間工作期間或在黑暗環境中發光以使工人或操作者注意其周圍環境,且使司機在夜間確保可見度。因此,甚至當感測到被附接發光系統的物件的運動時,若高於預定等級的照明強度得以確保(在白天期間),則發光系統不需要發光。且,甚至在白天,若下雨,則照明強度可能相當低,因此需要向工人或操作者告知集裝箱的移動,且因此,發光單元需要發射光。因此,是否接通發光單元13000是根據由照明強度感測器單元12000量測的照明強度值而判定。 An illumination intensity sensor unit 12000, one type of optical sensor, measures the illumination intensity of the surrounding environment. When the motion sensor unit 11000 senses the motion of the object to which the illumination illumination system is attached, the illumination intensity sensor unit 12000 is activated according to the signal output by the control unit 14000. The lighting system illuminates during nighttime work or in a dark environment to alert workers or operators to their surroundings and to enable drivers to ensure visibility at night. Therefore, even when the motion of the object to which the illumination system is attached is sensed, if the illumination intensity higher than the predetermined level is ensured (during the daytime), the illumination system does not need to emit light. Moreover, even during the daytime, if it rains, the illumination intensity may be quite low, so it is necessary to inform the worker or the operator of the movement of the container, and therefore, the illumination unit needs to emit light. Therefore, whether or not the light-emitting unit 13000 is turned on is determined based on the illumination intensity value measured by the illumination intensity sensor unit 12000.
照明強度感測器單元12000量測周圍環境的照明強度,且將量測值輸出至如下所述的控制單元14000。同時,當照明強度值等於或高於預先設定值時,發光單元13000不需要發射光,因此整個系統終止。 The illumination intensity sensor unit 12000 measures the illumination intensity of the surrounding environment and outputs the measurement value to the control unit 14000 as described below. Meanwhile, when the illumination intensity value is equal to or higher than a preset value, the light-emitting unit 13000 does not need to emit light, and thus the entire system is terminated.
當由照明強度感測器單元12000量測的照明強度值低於預先設定值時,發光單元13000發射光。工人或操作者可辨識來自發光單元1300的光發射,以辨識集裝箱或其類似者的移動。作為發光單元13000,可使用前述發光元件。 When the illumination intensity value measured by the illumination intensity sensor unit 12000 is lower than a preset value, the light emitting unit 13000 emits light. A worker or operator can recognize the light emission from the lighting unit 1300 to identify the movement of the container or the like. As the light emitting unit 13000, the aforementioned light emitting element can be used.
且,發光單元13000可根據周圍環境的照明強度值而調整其光發射的強度。當周圍環境的照明強度值低時,發光單元13000可提高其光發射的強度,且當周圍環境的照明強度值相對高時,發光單元13000可降低其光發射的強度,因此防止電力浪費。 Moreover, the light emitting unit 13000 can adjust the intensity of its light emission according to the illumination intensity value of the surrounding environment. When the illumination intensity value of the surrounding environment is low, the light emitting unit 13000 can increase the intensity of its light emission, and when the illumination intensity value of the surrounding environment is relatively high, the light emitting unit 13000 can reduce the intensity of its light emission, thus preventing power waste.
控制單元14000總體控制運動感測器單元1100、照明強度感測器單元12000及發光單元13000。當運動感測器單元11000感測到被附接發光系統的物件的運動且將信號輸出至控制單元14000時,控制單元14000將操作信號輸出至照明強度感測器單元12000。控制單元14000接收由照明強度感測器單元12000量測的照明強度值,且判定是否接通(操作)發光單元13000。 The control unit 14000 generally controls the motion sensor unit 1100, the illumination intensity sensor unit 12000, and the illumination unit 13000. When the motion sensor unit 11000 senses the motion of the object to which the illumination system is attached and outputs a signal to the control unit 14000, the control unit 14000 outputs an operation signal to the illumination intensity sensor unit 12000. The control unit 14000 receives the illumination intensity value measured by the illumination intensity sensor unit 12000, and determines whether the illumination unit 13000 is turned on (operated).
圖46為說明用於控制發光系統的方法的流程圖。下文中,將參看圖46來描述用於控制發光系統的方法。 Figure 46 is a flow chart illustrating a method for controlling an illumination system. Hereinafter, a method for controlling an illumination system will be described with reference to FIG.
首先,感測被附接發光系統的物件的運動且輸出操作信號(S310)。舉例而言,運動感測器單元11000可感測安裝有發光系統的集裝箱或車輛的運動,且當感測到集裝箱或車輛的運動時,運動感測器單元11000輸出操作信號。操作信號可為用於啟動總電力的信號。即,當感測到集裝箱或車輛的運動時,運動感測器單元11000將操作信號輸出至控制單元14000。 First, the motion of the object to which the illumination system is attached is sensed and an operation signal is output (S310). For example, the motion sensor unit 11000 can sense the motion of a container or vehicle on which the lighting system is installed, and when sensing the motion of the container or the vehicle, the motion sensor unit 11000 outputs an operation signal. The operational signal can be a signal used to initiate the total power. That is, when the motion of the container or the vehicle is sensed, the motion sensor unit 11000 outputs an operation signal to the control unit 14000.
接著,基於操作信號,量測周圍環境的照明強度且輸出照明強度值(S320)。當操作信號施加至控制單元14000時,控制單元14000將信號輸出至照明強度感測器單元12000,且照明強度感測器單元12000接著量測周圍環境的照明強度。照明強度感測器單元12000將周圍環境的所量測的照明強度值輸出至控制單元14000。此後,是否接通發光單元是根據照明強度值而判定,且發光單元根據所述判定而發射光。 Next, based on the operation signal, the illumination intensity of the surrounding environment is measured and the illumination intensity value is output (S320). When an operation signal is applied to the control unit 14000, the control unit 14000 outputs a signal to the illumination intensity sensor unit 12000, and the illumination intensity sensor unit 12000 then measures the illumination intensity of the surrounding environment. The illumination intensity sensor unit 12000 outputs the measured illumination intensity values of the surrounding environment to the control unit 14000. Thereafter, whether or not the light-emitting unit is turned on is determined based on the illumination intensity value, and the light-emitting unit emits light according to the determination.
首先,照明強度值與預先設定值比較以用於判定。當照明強度值輸入至控制單元14000時,控制單元14000比較所接收的照明強度值與所儲存的預先設定值且判定所接收的照明強度值是否低於所儲存的預先設定值。此處,預先設定值為用於判定是否接通照明元件的值。舉例而言,預先設定值可為工人或司機可能難以用裸眼辨識物件或可能在一情形(例如,開始日落的情形)下犯錯誤時的照明強度值。 First, the illumination intensity value is compared to a predetermined value for use in the determination. When the illumination intensity value is input to the control unit 14000, the control unit 14000 compares the received illumination intensity value with the stored preset value and determines whether the received illumination intensity value is lower than the stored preset value. Here, the preset value is a value for determining whether or not the lighting element is turned on. For example, the pre-set value may be an illumination intensity value that may be difficult for a worker or driver to identify an object with the naked eye or may make a mistake in a situation (eg, when the sunset begins).
當由照明強度感測器單元12000量測的照明強度值高於預先設定值時,發光單元的發光為不需要的,因此控制單元14000使整個系統停機。 When the illumination intensity value measured by the illumination intensity sensor unit 12000 is higher than a preset value, the illumination of the illumination unit is not required, so the control unit 14000 shuts down the entire system.
同時,當由照明強度感測器單元12000量測的照明強度值高於預先設定值時,發光單元的發光為需要的,因此控制單元14000將信號輸出至發光單元13000且發光單元13000發射光(S340)。 Meanwhile, when the illumination intensity value measured by the illumination intensity sensor unit 12000 is higher than a preset value, illumination of the illumination unit is required, and thus the control unit 14000 outputs a signal to the illumination unit 13000 and the illumination unit 13000 emits light ( S340).
圖47為說明根據另一例示性實施例的用於控制發光系統 的方法的流程圖。下文中,將描述根據另一例示性實施例的用於控制發光系統的方法。然而,將省略與如上文參看圖46所述的用於控制發光系統的方法的程序相同的程序。 FIG. 47 is a diagram for explaining an illumination system according to another exemplary embodiment. Flow chart of the method. Hereinafter, a method for controlling a lighting system according to another exemplary embodiment will be described. However, the same procedure as the procedure for controlling the illumination system as described above with reference to FIG. 46 will be omitted.
如圖47所說明,在根據本實施例的用於控制發光系統的方法的狀況下,發光單元的光發射的強度可根據周圍環境的照明強度值而調節。 As illustrated in FIG. 47, in the case of the method for controlling the light-emitting system according to the present embodiment, the intensity of light emission of the light-emitting unit can be adjusted according to the illumination intensity value of the surrounding environment.
如上所述,照明強度感測器單元12000將照明強度值輸出至控制單元14000(S320)。當照明強度值低於預先設定值(S330)時,控制單元14000判定照明強度值的範圍(S340-1)。控制單元14000具有細分的照明強度值的範圍,基於此,控制單元14000判定所量測的照明強度值的範圍。 As described above, the illumination intensity sensor unit 12000 outputs the illumination intensity value to the control unit 14000 (S320). When the illumination intensity value is lower than the preset value (S330), the control unit 14000 determines the range of the illumination intensity value (S340-1). The control unit 14000 has a range of subdivided illumination intensity values, based on which the control unit 14000 determines the range of measured illumination intensity values.
接著,當照明強度值的範圍得以判定時,控制單元14000判定照明單元的光發射的強度(S340-2),且因此,發光單元13000發射光(S340-3)。發光單元的光發射的強度可根據照明強度值而劃分,且此處,照明強度值根據天氣、時間及周圍環境而變化,因此發光單元的光發射的強度亦可被調節。藉由根據照明強度值的範圍而調節光發射的強度,可防止電力浪費且可將工人或操作者的注意力吸引至其周圍環境。 Next, when the range of the illumination intensity value is determined, the control unit 14000 determines the intensity of the light emission of the illumination unit (S340-2), and thus, the illumination unit 13000 emits light (S340-3). The intensity of the light emission of the light-emitting unit can be divided according to the illumination intensity value, and here, the illumination intensity value varies depending on the weather, time, and surrounding environment, and thus the intensity of the light emission of the light-emitting unit can also be adjusted. By adjusting the intensity of the light emission according to the range of the illumination intensity values, power waste can be prevented and the attention of the worker or the operator can be attracted to the surrounding environment.
圖48為說明根據另一例示性實施例的用於控制發光系統的方法的流程圖。下文中,將描述根據另一例示性實施例的用於控制發光系統的方法。然而,將省略與如上文參看圖46及圖47所述的用於控制發光系統的方法的程序相同的程序。 FIG. 48 is a flowchart illustrating a method for controlling an illumination system, according to another exemplary embodiment. Hereinafter, a method for controlling a lighting system according to another exemplary embodiment will be described. However, the same procedure as the procedure for controlling the illumination system as described above with reference to FIGS. 46 and 47 will be omitted.
根據本實施例的用於控制發光系統的方法更包含判定被附接發光系統的物件的運動是否維持於發光單元13000發射光的狀態的操作S350,及判定是否維持光發射。 The method for controlling the light-emitting system according to the present embodiment further includes an operation S350 of determining whether the motion of the object to which the light-emitting system is attached is maintained in a state in which the light-emitting unit 13000 emits light, and determining whether to maintain light emission.
首先,當發光單元13000開始發射光時,可基於被安裝發光系統的集裝箱或車輛是否移動而判定光發射的終止。此處,當集裝箱的運動停止時,可判定其操作已終止。另外,當車輛在行人穿越道處暫時停止時,發光單元的光發射可停止以防止干擾迎面而來的司機的視野。 First, when the light emitting unit 13000 starts emitting light, the termination of light emission can be determined based on whether the container or the vehicle on which the light emitting system is mounted moves. Here, when the movement of the container is stopped, it can be determined that its operation has been terminated. In addition, when the vehicle is temporarily stopped at the pedestrian crossing, the light emission of the lighting unit can be stopped to prevent interference with the oncoming driver's field of view.
當集裝箱或車輛再次移動時,運動感測器單元11000操作且發光單元14000可開始發射光。 When the container or vehicle moves again, the motion sensor unit 11000 operates and the lighting unit 14000 can begin to emit light.
是否維持光發射可基於被附接發光系統的物件的運動是否由運動感測器單元11000感測到而判定。當物件的運動由運動感測器單元11000連續地感測到時,再次量測照明強度且判定是否維持光發射。同時,當未感測到物件的運動時,系統終止。 Whether or not the light emission is maintained may be determined based on whether the motion of the object to which the illumination system is attached is sensed by the motion sensor unit 11000. When the motion of the object is continuously sensed by the motion sensor unit 11000, the illumination intensity is measured again and it is determined whether the light emission is maintained. At the same time, the system terminates when the motion of the object is not sensed.
使用如上文所述的LED的發光裝置可根據產品類型、位置及用途在其光學設計方面被更改。舉例而言,關於前述敏感度照明,除控制發光的顏色、溫度、亮度及色調的技術之外,亦可提供用於藉由使用利用諸如智慧電話的攜帶型元件的無線(遠端)控制技術來控制發光的技術。 Light-emitting devices using LEDs as described above can be modified in their optical design depending on the type, location and use of the product. For example, regarding the aforementioned sensitivity illumination, in addition to the technique of controlling the color, temperature, brightness, and hue of the illumination, wireless (remote) control technology for using a portable component such as a smart phone can be provided. To control the technology of illuminating.
同樣地,另外,旨在達成LED光源的獨特目的及藉由將通信功能添加至LED發光裝置及顯示元件而作為通信單元的目的的可見光無線通信技術可為可用的。此是因為,與現有光源相比, LED光源有利地具有較長的壽命及優良的電力效率,實施各種顏色,支援用於數位通信的高切換速率,且可用於數位控制。 Also, in addition, a visible light wireless communication technology that is intended to achieve the unique purpose of the LED light source and to serve as a communication unit by adding a communication function to the LED lighting device and the display element may be available. This is because, compared to existing light sources, The LED light source advantageously has a long life and excellent power efficiency, implements various colors, supports a high switching rate for digital communication, and can be used for digital control.
可見光無線通信技術為藉由使用具有可由人眼辨識的可見光波長帶的光而無線地傳送資訊的無線通信技術。可見光無線通信技術與有線光學通信技術的不同之處在於其使用具有可見光波長帶的光,且與有線光學通信技術的不同之處在於通信環境是基於無線方案。 The visible light wireless communication technology is a wireless communication technology that wirelessly transmits information by using light having a visible light wavelength band recognizable by the human eye. The visible light wireless communication technology differs from the wired optical communication technology in that it uses light having a visible light wavelength band and is different from wired optical communication technology in that the communication environment is based on a wireless scheme.
同樣地,不同於RF無線通信,可見光無線通信技術具有優良的便利性及實體安全性質在於:其可自由地得以使用而無需在頻率使用方面進行調節或准許;不同之處在於:使用者可用其眼睛檢查通信鏈路,且綜上所述,可見光無線通信技術的特徵在於獲得作為光源的獨特自的及通信功能的融合技術(或會聚技術)。 Similarly, unlike RF wireless communication, visible light wireless communication technology has excellent convenience and physical security properties in that it can be used freely without adjustment or permission in terms of frequency usage; the difference is that the user can use it. The eye checks the communication link, and in summary, the visible light wireless communication technology is characterized by obtaining a unique self-communication and communication function fusion technique (or convergence technique) as a light source.
如上文所闡述,根據例示性實施例,可提供發光裝置,所述發光裝置能夠藉由克服根據自然對流的有限的熱輻射效率以顯著地提高熱輻射效率而延長光源的使用壽命且改良光輸出。 As set forth above, according to an exemplary embodiment, a light emitting device capable of extending the life of a light source and improving light output by overcoming limited heat radiation efficiency according to natural convection to significantly improve heat radiation efficiency can be provided. .
另外,可提供發光裝置,所述發光裝置具有落入ANSI標準內的尺寸,同時具有增強的熱耗散效率。 Additionally, illumination devices can be provided that have dimensions that fall within the ANSI standard while having enhanced heat dissipation efficiency.
例示性實施例的各種優點及效應不限於以上描述,且將經由特定例示性實施例的解釋而更容易理解。 The various advantages and effects of the illustrative embodiments are not limited to the above description, and will be more readily understood by the explanation of the specific exemplary embodiments.
儘管已結合實施例展示且描述了本發明,但熟習此項技術者將顯而易見的是,在不脫離如由隨附申請專利範圍界定的本 發明的精神及範疇的情況下,可進行修改及變化。 Although the present invention has been shown and described in connection with the embodiments, it will be apparent to those skilled in the art Modifications and variations are possible in the spirit and scope of the invention.
10‧‧‧發光裝置 10‧‧‧Lighting device
100‧‧‧基底 100‧‧‧Base
110‧‧‧耦接緣邊 110‧‧‧ coupling edge
111‧‧‧凸緣部分 111‧‧‧Flange section
112‧‧‧凹槽 112‧‧‧ Groove
120‧‧‧支撐板 120‧‧‧Support board
120a‧‧‧表面 120a‧‧‧Surface
121‧‧‧熱輻射鰭片 121‧‧‧Heat radiation fins
122‧‧‧固定部分 122‧‧‧Fixed section
123‧‧‧側壁 123‧‧‧ side wall
130‧‧‧空氣排放孔 130‧‧‧Air discharge hole
200‧‧‧外殼 200‧‧‧ Shell
210‧‧‧端子部分 210‧‧‧Terminal part
220‧‧‧通道部分 220‧‧‧Channel section
221‧‧‧第一通道 221‧‧‧ first channel
222‧‧‧第二通道 222‧‧‧second channel
230‧‧‧空氣引入孔 230‧‧‧Air introduction hole
300‧‧‧冷卻風扇 300‧‧‧Cooling fan
400‧‧‧光源模組 400‧‧‧Light source module
410‧‧‧基板 410‧‧‧Substrate
420‧‧‧發光元件 420‧‧‧Lighting elements
500‧‧‧回流防止部分 500‧‧‧Reflow prevention section
510‧‧‧環狀本體 510‧‧‧Circular body
511‧‧‧中央孔 511‧‧‧Central hole
520‧‧‧導銷 520‧‧ ‧ sales guide
600‧‧‧蓋子 600‧‧‧ cover
610‧‧‧透鏡 610‧‧ lens
O‧‧‧中心軸 O‧‧‧ center axis
s‧‧‧螺釘 S‧‧‧screw
Claims (10)
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| KR20120087933 | 2012-08-10 | ||
| KR1020130073701A KR101455083B1 (en) | 2012-08-10 | 2013-06-26 | Lighting device |
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| Publication Number | Publication Date |
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| TW201413167A true TW201413167A (en) | 2014-04-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW102128562A TW201413167A (en) | 2012-08-10 | 2013-08-09 | Lighting apparatus |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR101455083B1 (en) |
| TW (1) | TW201413167A (en) |
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| TWI696260B (en) * | 2015-02-18 | 2020-06-11 | 荷蘭商露明控股公司 | Device with multiple, stacked light emitting devices |
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| TWI741100B (en) * | 2016-12-13 | 2021-10-01 | 美商亮銳公司 | Led-based light fixture |
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| TWI408311B (en) | 2010-05-25 | 2013-09-11 | Sunonwealth Electr Mach Ind Co | Lamp and heat sink thereof |
| JPWO2011162048A1 (en) | 2010-06-23 | 2013-08-19 | シーシーエス株式会社 | LED light source device |
| KR101248731B1 (en) * | 2010-08-06 | 2013-04-03 | 주식회사 포스코아이씨티 | Lighting apparatus having optic-semiconductor |
| JP5097254B2 (en) | 2010-09-29 | 2012-12-12 | 建準電機工業股▲分▼有限公司 | Lamp |
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2013
- 2013-06-26 KR KR1020130073701A patent/KR101455083B1/en active Active
- 2013-08-09 TW TW102128562A patent/TW201413167A/en unknown
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI697543B (en) * | 2013-09-09 | 2020-07-01 | 美商消費者照明美國公司 | Enhanced color-preference led light sources using lag, nitride, and pfs phosphors |
| TWI696260B (en) * | 2015-02-18 | 2020-06-11 | 荷蘭商露明控股公司 | Device with multiple, stacked light emitting devices |
| TWI553261B (en) * | 2015-05-08 | 2016-10-11 | chen-wei Xu | The cooling structure of the lamp |
| TWI741100B (en) * | 2016-12-13 | 2021-10-01 | 美商亮銳公司 | Led-based light fixture |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101455083B1 (en) | 2014-10-28 |
| KR20140021477A (en) | 2014-02-20 |
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