[go: up one dir, main page]

TW201403826A - 顯示器 - Google Patents

顯示器 Download PDF

Info

Publication number
TW201403826A
TW201403826A TW101125239A TW101125239A TW201403826A TW 201403826 A TW201403826 A TW 201403826A TW 101125239 A TW101125239 A TW 101125239A TW 101125239 A TW101125239 A TW 101125239A TW 201403826 A TW201403826 A TW 201403826A
Authority
TW
Taiwan
Prior art keywords
display
substrate
active layer
width
end portion
Prior art date
Application number
TW101125239A
Other languages
English (en)
Other versions
TWI495941B (zh
Inventor
Chia-Hao Tsai
Chih-Lung Lin
Original Assignee
Innocom Tech Shenzhen Co Ltd
Chimei Innolux Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Innocom Tech Shenzhen Co Ltd, Chimei Innolux Corp filed Critical Innocom Tech Shenzhen Co Ltd
Priority to TW101125239A priority Critical patent/TWI495941B/zh
Priority to US13/939,508 priority patent/US9423644B2/en
Publication of TW201403826A publication Critical patent/TW201403826A/zh
Application granted granted Critical
Publication of TWI495941B publication Critical patent/TWI495941B/zh
Priority to US15/219,855 priority patent/US9897845B2/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133345Insulating layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136209Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6704Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6723Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device having light shields
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/674Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6757Thin-film transistors [TFT] characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/421Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
    • H10D86/423Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441Interconnections, e.g. scanning lines
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • G02F2201/121Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode common or background
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • G02F2201/123Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode pixel
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/40Arrangements for improving the aperture ratio
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00Function characteristic
    • G02F2203/04Function characteristic wavelength independent

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geometry (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

本發明一實施例提供一種顯示器,包括:一第一基板;多條閘極線與多條資料線;多個電晶體分別位於畫素區中,各電晶體包括:一主動層,配置於第一基板上,其中主動層具有一第一端部、一第二端部、以及一連接於第一端部與第二端部之間的一頸縮部;一第二基板,配置於第一基板上;以及一顯示介質,配置於第一基板與第二基板之間。

Description

顯示器
本發明有關於顯示器,且特別是有關於具有黑色矩陣的顯示器。
液晶顯示裝置由於其輕薄及低耗電等優點,已成為當前主流顯示裝置。液晶顯示裝置包含一液晶顯示面板。液晶顯示面板包含一薄膜電晶體(Thin Film Transistor,TFT)基板、一彩色濾光(Color Filter,CF)基板以及一夾置於兩基板之間的液晶層。
彩色濾光基板具有一基板以及一形成於基板上的彩色濾光層,彩色濾光層係由多個紅色、綠色、藍色之彩色像素以及將其等隔開之黑矩陣所構成。黑矩陣具有防止光線照射到薄膜電晶體(當光線照射到薄膜電晶體會使其漏電而造成畫質變差)、防止相鄰的彩色像素混色、提昇對比度等功效。
隨著顯示器的製作技術提昇,逐漸縮小單位畫素的面積以期獲得更加細膩的畫質,然而,隨著單位畫素的面積逐漸縮小,黑矩陣佔據畫素的面積比例逐漸增加,以至於大幅壓縮畫素的開口率。
本發明一實施例提供一種顯示器,包括:一第一基板; 多條閘極線與多條資料線,配置於第一基板上且彼此交錯,以定義出多個畫素區;多個電晶體分別位於畫素區中,並分別與對應的閘極線與資料線電性連接,其中各電晶體包括:一主動層,配置於第一基板上,其中主動層具有一第一端部、一第二端部、以及一連接於第一端部與第二端部之間的一頸縮部(necked-down portion),其中頸縮部於一垂直於閘極線的軸向上的一第一寬度小於第一端部於軸向上的一第二寬度與第二端部於軸向上的一第三寬度;一第二基板,配置於第一基板上;以及一顯示介質,配置於第一基板與第二基板之間。
以下將詳細說明本發明實施例之製作與使用方式。然應注意的是,本發明提供許多可供應用的發明概念,其可以多種特定型式實施。文中所舉例討論之特定實施例僅為製造與使用本發明之特定方式,非用以限制本發明之範圍。此外,在不同實施例中可能使用重複的標號或標示。這些重複僅為了簡單清楚地敘述本發明,不代表所討論之不同實施例及/或結構之間具有任何關連性。再者,當述及一第一材料層位於一第二材料層上或之上時,包括第一材料層與第二材料層直接接觸或間隔有一或更多其他材料層之情形。在圖式中,實施例之形狀或是厚度可能擴大,以簡化或是突顯其特徵。再者,圖中未繪示或描述之元件,可為所屬技術領域中具有通常知識者所知的任意形式。
第1A圖繪示本發明一實施例之顯示器的上視圖。第1C圖繪示第1A圖中區域C的主動層的上視圖,並標示出蝕刻保護層的兩貫孔在主動層上的位置。第1D圖繪示沿第1A圖之A-A’線段的剖面圖。值得注意的是,為簡化起見,第1A圖省略繪示第一基板、第二基板、顯示介質與絕緣層。
請同時參照第1A圖與第1D圖,本實施例之顯示器100包括一第一基板110、多條閘極線120與多條資料線130、多個電晶體140、一第二基板150、以及一顯示介質160,其中第二基板150係配置於第一基板110上,且顯示介質160配置於第一基板110與第二基板150之間。
詳細而言,閘極線120與資料線130係配置於第一基板110上且彼此交錯,以定義出多個畫素區P。畫素區P可包括紅色畫素區、綠色畫素區、藍色畫素區。電晶體140分別位於畫素區P中,並分別與對應的閘極線120與資料線130電性連接。如第1D圖所示,各電晶體140包括一閘極142、一閘絕緣層144、一主動層146、一蝕刻保護層147、一汲極148、與一源極149。
具體而言,閘極142係配置於第一基板110上,閘絕緣層144覆蓋閘極142,其中閘極142係為閘極線120的一部分。主動層146配置於閘絕緣層144上並位於閘極142上方,主動層146的材質例如為銦鎵鋅氧化物(IGZO)、或是其他適合的半導體氧化物材料。
請參照第1C圖,主動層146具有一第一端部146a、一第二端部146b、以及一連接於第一端部146a與第二端 部146b之間的一頸縮部146c(necked-down portion),其中頸縮部146c於一垂直於閘極線120的軸向V(如第1A圖所示)上的一第一寬度W1小於第一端部146a於軸向V上的一第二寬度W2與第二端部146b於軸向V上的一第三寬度W3。
在一實施例中,第一寬度W1約為3微米至6微米,第二寬度W2與第三寬度W3各約為7微米至15微米。第二寬度W2相對於該第一寬度W1的差值約為1微米至12微米。應可了解的是,上述第一、第二及第三寬度W1、W2及W3與其差異可隨單位畫素面積縮小而改變,但第一寬度W1與第二寬度W2或第三寬度W3的比值可控制在例如約為0.2至0.86。頸縮部146c於閘極線120的延伸方向上的長度L1約為2微米至7微米。貫孔間距L2約為4微米至13微米。電晶體140的通道寬長比(亦即,第一寬度W1/貫孔間距L2)例如約為0.3至1。在一實施例中,電晶體140的主動層146於上視圖中大抵上呈U形。
請參照第1A圖、第1C圖與第1D圖,蝕刻保護層147覆蓋主動層146,並具有二貫孔T1、T2分別暴露出主動層146的第一端部146a與第二端部146b。蝕刻保護層147的材質可為氧化物(例如氧化矽)或是其他適合的絕緣材料。請參照第1A圖與第1D圖,汲極148與源極149配置於蝕刻停止層147上且分別經由二貫孔T1、T2而電性連接至主動層146,源極149係連接資料線130。汲極148與源極149係分別遮蔽第一端部146a與第二端部146b,且皆未遮蔽頸縮部146c。
此外,顯示器100還可選擇性地包括一彩色濾光陣列170。彩色濾光陣列170係配置於第一基板110與第二基板150之間,且彩色濾光陣列170包括分別對應多個畫素區P的多個彩色濾光膜172、以及一對應閘極線120與資料線130的黑色矩陣174,其中黑色矩陣174係遮蔽各電晶體140的頸縮部146c。彩色濾光膜172可包括紅色濾光膜、綠色濾光膜、與藍色濾光膜。
如第1B圖所示,本實施例之黑色矩陣174之遮蔽電晶體140的遮蔽部分174a大體上是以盡可能完全遮蔽頸縮部146c為原則進行設計,因此,黑色矩陣174會位於頸縮部146c上方並沿著軸向V向遠離頸縮部146c的相對兩側邊S1、S2的方向分別延伸一外延遮光距離以預防外界光線照射到頸縮部146c。基於前述設計原則,本實施例係藉由縮小頸縮部146c的寬度(相對於第一、第二端部146a、146b的寬度)使黑色矩陣174的寬度隨之縮小。
詳細而言,黑色矩陣174具有多個遮蔽電晶體140的遮蔽部分174a,且遮蔽部分174a具有相對兩側邊S3、S4,其分別對應於頸縮部146c的相對兩側邊S1、S2。在一實施例中,側邊S3相對於側邊S1的間距D1大抵相同於側邊S2相對於側邊S4的間距D2,換言之,黑色矩陣174對頸縮部146c的相對兩側邊S1、S2的外延遮光距離(亦即,間距D1、D2)相等。在一實施例中,間距D1、D2例如約為1微米~15微米。黑色矩陣174之遮蔽電晶體140的遮蔽部分174a於軸向V上的一第四寬度W4約為5微米至36微米,較佳約為4微米至20微米。
值得注意的是,由於本實施例將主動層146之易受到外界光線照射的部份(亦即,未被汲極148與源極149所遮蔽的頸縮部146c)的寬度縮小,因此,用以遮蔽主動層146的黑色矩陣174的寬度亦可隨之縮小(縮小值等於W1與W2及/或W3的差值),進而有效提昇畫素的開口率。
在一實施例中,當畫素解析度為264ppi(pixels per inch)時,本實施例之(頸縮部146c的)第一寬度W1相較於(第一、第二端部146a、146b的)第二寬度W2及第三寬度W3縮小5微米,此時,相較於習知未局部縮小主動層的顯示器,本實施例之顯示器的開口率可增加4%。
另外,顯示器100還可選擇性地包括多個畫素電極180、多個共用電極190、一第一絕緣層R1、一第二第二絕緣層R2。詳細而言,如第1A圖所示,這些畫素電極180係分別配置於前述多個畫素區P中,並與對應的電晶體140電性連接,而這些共用電極190分別位於對應的畫素電極180下方。
具體而言,如第1D圖所示,可於蝕刻保護層147上形成第一絕緣層R1,第一絕緣層R1可覆蓋汲極148與源極149,然後,於第一絕緣層R1上形成共用電極190。之後,於第一絕緣層R1上形成覆蓋共用電極190的第二絕緣層R2。然後,形成貫穿第一、第二絕緣層R1、R2的接觸窗E,並於第二絕緣層R2上形成畫素電極180,畫素電極180可經由接觸窗E電性連接汲極148。
在一實施例中,顯示介質160可為一液晶層,且顯示器100可為一液晶顯示器。在另一實施例中,顯示介質160 可為一有機發光層,且顯示器100可為一有機發光二極體顯示器。
第2A圖繪示本發明另一實施例之顯示器的上視圖。第2B圖繪示第2A圖中區域C的主動層的上視圖,並標示出蝕刻保護層的兩貫孔在主動層上的位置。值得注意的是,為簡化起見,第2A圖省略繪示第一基板、第二基板、顯示介質與絕緣層。請同時參照第2A圖與第2B圖,本實施例之顯示器200係相似於第1A圖的顯示器100,兩者的差異之處在於本實施例之電晶體140的主動層146於上視圖中大抵上呈H形。
第3A圖繪示本發明又一實施例之顯示器的上視圖。第3B圖繪示第3A圖中區域C的主動層的上視圖,並標示出蝕刻保護層的兩貫孔在主動層上的位置。第3C圖繪示沿第3A圖之A-A’線段的剖面圖。值得注意的是,為簡化起見,第3A圖省略繪示第一基板、第二基板、顯示介質與絕緣層。
請同時參照第3A圖與第3C圖,本實施例之顯示器300係相似於第1A圖的顯示器100,兩者的差異之處在於本實施例之顯示器300的電晶體140a係為一頂閘極電晶體(顯示器100的電晶體140係為一底閘極電晶體)。
詳細而言,本實施例之顯示器300的閘絕緣層144係位於蝕刻保護層147上且覆蓋汲極148與源極149,且閘極142係配置於閘絕緣層144上且位於主動層146上方。本實施例之接觸窗E係貫穿第一、第二絕緣層R1、R2、以及閘絕緣層144,以使畫素電極180可經由接觸窗E而電 性連接至汲極148。本實施例之顯示器300還可包括一緩衝層R3形成在基板110上,且主動層146係形成於緩衝層R3上。請參照第3B圖,在一實施例中,電晶體140a的主動層146於上視圖中大抵上呈U形。
第4A圖繪示本發明再一實施例之顯示器的上視圖。第4B圖繪示第4A圖中區域C的主動層的上視圖,並標示出蝕刻保護層的兩貫孔在主動層上的位置。值得注意的是,為簡化起見,第4A圖省略繪示第一基板、第二基板、顯示介質與絕緣層。請同時參照第4A圖與第4B圖,本實施例之顯示器400係相似於第3A圖的顯示器300,兩者的差異之處在於本實施例之電晶體140a的主動層146於上視圖中大抵上呈H形。
值得注意的是,本實施例是以橫向電場驅動型(IPS,In-Plane Switching)的液晶顯示器為例,但不限於此,本發明可應用於各種顯示器中,例如扭曲向列型(TN,Twisted Nematic)的液晶顯示器、或是垂直配向型(VA,Vertical Alignment)的液晶顯示器。
綜上所述,本發明係將主動層之易受到外界光線照射的部份的寬度縮小,以縮小用以遮蔽主動層的黑色矩陣的寬度,進而有效提昇畫素的開口率。
本發明雖以較佳實施例揭露如上,然其並非用以限定本發明的範圍,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可做些許的更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。
100、200、300、400‧‧‧顯示器
110‧‧‧第一基板
120‧‧‧閘極線
130‧‧‧資料線
140、140a‧‧‧電晶體
142‧‧‧閘極
144‧‧‧閘絕緣層
146‧‧‧主動層
146a‧‧‧第一端部
146b‧‧‧第二端部
146c‧‧‧頸縮部
147‧‧‧蝕刻保護層
148‧‧‧汲極
149‧‧‧源極
150‧‧‧第二基板
160‧‧‧顯示介質
170‧‧‧彩色濾光陣列
172‧‧‧彩色濾光膜
174‧‧‧黑色矩陣
174a‧‧‧遮蔽部分
180‧‧‧畫素電極
190‧‧‧共用電極
B、C‧‧‧區域
E‧‧‧接觸窗
D1、D2‧‧‧間距
P‧‧‧畫素區
R1‧‧‧第一絕緣層
R2‧‧‧第二絕緣層
R3‧‧‧緩衝層
L1‧‧‧長度
L2‧‧‧貫孔間距
S1、S2、S3、S4‧‧‧側邊
T1、T2‧‧‧貫孔
V‧‧‧軸向
W1‧‧‧第一寬度
W2‧‧‧第二寬度
W3‧‧‧第三寬度
W4‧‧‧第四寬度
第1A圖繪示本發明一實施例之顯示器的上視圖。
第1B圖繪示第1A圖中區域B的主動層的上視圖,並標示出蝕刻保護層的兩貫孔在主動層上的位置。
第1C圖繪示第1A圖中區域C的主動層的上視圖,並標示出蝕刻保護層的兩貫孔在主動層上的位置。
第1D圖繪示沿第1A圖之A-A’線段的剖面圖。
第2A圖繪示本發明另一實施例之顯示器的上視圖。
第2B圖繪示第2A圖中區域C的主動層的上視圖,並標示出蝕刻保護層的兩貫孔在主動層上的位置。
第3A圖繪示本發明又一實施例之顯示器的上視圖。
第3B圖繪示第3A圖中區域C的主動層的上視圖,並標示出蝕刻保護層的兩貫孔在主動層上的位置。
第3C圖繪示沿第3A圖之A-A’線段的剖面圖。
第4A圖繪示本發明再一實施例之顯示器的上視圖。
第4B圖繪示第4A圖中區域C的主動層的上視圖,並標示出蝕刻保護層的兩貫孔在主動層上的位置。
100‧‧‧顯示器
120‧‧‧閘極線
130‧‧‧資料線
140‧‧‧電晶體
146c‧‧‧頸縮部
148‧‧‧汲極
149‧‧‧源極
170‧‧‧彩色濾光陣列
172‧‧‧彩色濾光膜
174‧‧‧黑色矩陣
174a‧‧‧遮蔽部分
180‧‧‧畫素電極
190‧‧‧共用電極
B、C‧‧‧區域
P‧‧‧畫素區
T1、T2‧‧‧貫孔
V‧‧‧軸向
W4‧‧‧第四寬度

Claims (16)

  1. 一種顯示器,包括:一第一基板;多條閘極線與多條資料線,配置於該第一基板上且彼此交錯,以定義出多個畫素區;多個電晶體分別位於該些畫素區中,並分別與對應的該些閘極線與該些資料線電性連接,其中各該電晶體包括:一主動層,配置於該第一基板上,其中該主動層具有一第一端部、一第二端部、以及一連接於該第一端部與該第二端部之間的一頸縮部,其中該頸縮部於一垂直於該些閘極線的軸向上的一第一寬度小於該第一端部於該軸向上的一第二寬度與該第二端部於該軸向上的一第三寬度;一第二基板,配置於該第一基板上;以及一顯示介質,配置於該第一基板與該第二基板之間。
  2. 如申請專利範圍第1項所述之顯示器,更包括:一閘極,配置於該第一基板上並位於該主動層下方;以及一閘絕緣層,覆蓋該閘極。
  3. 如申請專利範圍第1項所述之顯示器,更包括:一蝕刻保護層,覆蓋該主動層,並具有二貫孔分別暴露出該主動層的該第一端部與該第二端部。
  4. 如申請專利範圍第3項所述之顯示器,更包括:一源極與一汲極,配置於該蝕刻保護層上且分別經由該二貫孔而電性連接至該主動層,該源極與該汲極係分別 遮蔽該第一端部與該第二端部,且皆未遮蔽該頸縮部。
  5. 如申請專利範圍第4項所述之顯示器,更包括:一閘絕緣層,覆蓋該源極與該汲極且位於該蝕刻保護層上;以及一閘極,配置於該閘絕緣層上,且位於該主動層上方。
  6. 如申請專利範圍第1項所述之顯示器,更包括:一黑色矩陣,配置於該第一基板與該第二基板之間並對應該些閘極線與該些資料線,其中該黑色矩陣具有一遮蔽部分係遮蔽各該電晶體的該頸縮部。
  7. 如申請專利範圍第6項所述之顯示器,其中該遮蔽部分於該軸向上的一第四寬度約為3微米至36微米。
  8. 如申請專利範圍第7項所述之顯示器,其中該遮蔽部分於該軸向上的該第四寬度約為4微米至20微米。
  9. 如申請專利範圍第1項所述之顯示器,更包括:一彩色濾光陣列,配置於該第一基板與該第二基板之間,該彩色濾光陣列包括分別對應該些畫素區的多個彩色濾光膜。
  10. 如申請專利範圍第1項所述之顯示器,其中該主動層的材質係為半導體氧化物。
  11. 如申請專利範圍第10項所述之顯示器,其中該主動層的材質係為銦鎵鋅氧化物。
  12. 如申請專利範圍第1項所述之顯示器,其中該主動層於上視圖中大抵上呈U形。
  13. 如申請專利範圍第1項所述之顯示器,其中該主動層於上視圖中呈H形。
  14. 如申請專利範圍第1項所述之顯示器,其中該第一寬度與該第二寬度的比值約為0.2至0.86。
  15. 如申請專利範圍第1項所述之顯示器,其中該電晶體的通道寬長比約為0.3至1。
  16. 如申請專利範圍第1項所述之顯示器,其中該顯示介質係為液晶層或有機發光層。
TW101125239A 2012-07-13 2012-07-13 顯示器 TWI495941B (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW101125239A TWI495941B (zh) 2012-07-13 2012-07-13 顯示器
US13/939,508 US9423644B2 (en) 2012-07-13 2013-07-11 Display
US15/219,855 US9897845B2 (en) 2012-07-13 2016-07-26 Display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW101125239A TWI495941B (zh) 2012-07-13 2012-07-13 顯示器

Publications (2)

Publication Number Publication Date
TW201403826A true TW201403826A (zh) 2014-01-16
TWI495941B TWI495941B (zh) 2015-08-11

Family

ID=49913722

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101125239A TWI495941B (zh) 2012-07-13 2012-07-13 顯示器

Country Status (2)

Country Link
US (2) US9423644B2 (zh)
TW (1) TWI495941B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10126602B2 (en) * 2014-03-20 2018-11-13 Samsung Display Co., Ltd. Curved display device and fabricating method thereof
KR102155051B1 (ko) * 2014-04-29 2020-09-11 엘지디스플레이 주식회사 액정 디스플레이 장치와 이의 제조 방법
JP2016157073A (ja) * 2015-02-26 2016-09-01 株式会社ジャパンディスプレイ 表示装置
US11869898B2 (en) * 2020-04-01 2024-01-09 Beijing Boe Display Technology Co., Ltd. Array substrate and display device

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08330595A (ja) 1995-05-31 1996-12-13 A G Technol Kk 薄膜トランジスタ及びその製造方法
JP3425851B2 (ja) * 1997-06-30 2003-07-14 日本電気株式会社 液晶表示装置用薄膜トランジスタ
JP4130490B2 (ja) * 1997-10-16 2008-08-06 三菱電機株式会社 液晶表示装置
KR100778838B1 (ko) * 2000-12-30 2007-11-22 엘지.필립스 엘시디 주식회사 액정표시장치 및 그 제조방법
TW580732B (en) 2002-05-23 2004-03-21 Taiwan Semiconductor Mfg FET having necking channel and method for making the same
KR100653264B1 (ko) 2002-10-16 2006-12-01 엘지.필립스 엘시디 주식회사 다결정 실리콘 박막트랜지스터를 포함하는 액정표시장치용어레이기판과 그 제조방법
US7123314B2 (en) * 2003-07-11 2006-10-17 Nec Corporation Thin-film transistor with set trap level densities, and method of manufactures
KR100585410B1 (ko) * 2003-11-11 2006-06-07 엘지.필립스 엘시디 주식회사 구동회로 일체형 액정표시장치의 스위칭 소자 및 구동소자및 그 제조방법
JP4952425B2 (ja) * 2006-08-21 2012-06-13 ソニー株式会社 液晶装置および電子機器
KR101412761B1 (ko) * 2008-01-18 2014-07-02 삼성디스플레이 주식회사 박막 트랜지스터 기판 및 이의 제조 방법
US8441012B2 (en) 2009-08-20 2013-05-14 Sharp Kabushiki Kaisha Array substrate, method for manufacturing array substrate, and display device
CN102253544A (zh) 2011-07-29 2011-11-23 南京中电熊猫液晶显示科技有限公司 液晶显示装置
CN102437194A (zh) 2011-11-22 2012-05-02 上海中科高等研究院 金属氧化物薄膜晶体管及其制备方法

Also Published As

Publication number Publication date
TWI495941B (zh) 2015-08-11
US9423644B2 (en) 2016-08-23
US20140016057A1 (en) 2014-01-16
US9897845B2 (en) 2018-02-20
US20160334667A1 (en) 2016-11-17

Similar Documents

Publication Publication Date Title
US8908116B2 (en) Liquid crystal display device
KR101480235B1 (ko) 액정 표시 장치
JP5490314B2 (ja) 薄膜トランジスタ、表示パネル及び薄膜トランジスタの製造方法
US8928044B2 (en) Display device, switching circuit and field effect transistor
TWI471949B (zh) 薄膜電晶體基板與顯示器
CN103513478B (zh) 显示器
US9030619B2 (en) Semiconductor device, method for manufacturing semiconductor device, and liquid crystal display device
CN108807549A (zh) 薄膜晶体管及其制造方法、阵列基板及其制造方法
CN106876386A (zh) 薄膜晶体管及其制备方法、阵列基板、显示面板
TWI479232B (zh) 顯示器
US20170139297A1 (en) Display Substrate and Method for Fabricating the Same, Display Panel and Display Device
CN112666761A (zh) 显示装置
US20110299017A1 (en) Liquid crystal display manufacturing method, liquid crystal display, and electronic apparatus
CN112305819B (zh) 液晶显示装置
TWI495941B (zh) 顯示器
KR20160012082A (ko) 표시 장치
WO2012086595A1 (ja) 半導体装置、カラーフィルタ基板、カラーフィルタ基板を備える表示装置、および半導体装置の製造方法
WO2016161700A1 (zh) 一种薄膜晶体管阵列基板及其制造方法
JP6584157B2 (ja) 薄膜トランジスタ、薄膜トランジスタ基板、液晶表示装置及び薄膜トランジスタの製造方法
JP6138501B2 (ja) 液晶表示装置の製造方法および液晶表示装置
JP6482256B2 (ja) 薄膜トランジスタ基板および液晶表示装置
CN107807482A (zh) 像素结构以及包含此像素结构的显示面板
US10670906B2 (en) Display panel having first, second, and third electrodes
KR20210142028A (ko) 표시 장치 및 이의 제조 방법
US8664703B2 (en) Display device having a shield