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TW201403223A - 分散組成物、以及使用其的聚合性組成物、遮光性彩色濾光片、固體攝影元件、液晶顯示裝置、晶圓級透鏡及攝影單元 - Google Patents

分散組成物、以及使用其的聚合性組成物、遮光性彩色濾光片、固體攝影元件、液晶顯示裝置、晶圓級透鏡及攝影單元 Download PDF

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Publication number
TW201403223A
TW201403223A TW102119250A TW102119250A TW201403223A TW 201403223 A TW201403223 A TW 201403223A TW 102119250 A TW102119250 A TW 102119250A TW 102119250 A TW102119250 A TW 102119250A TW 201403223 A TW201403223 A TW 201403223A
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TW
Taiwan
Prior art keywords
group
structural unit
polymer compound
light
dispersion
Prior art date
Application number
TW102119250A
Other languages
English (en)
Chinese (zh)
Inventor
Wataru Kikuchi
Yoshinori Tamada
Naotsugu Muro
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW201403223A publication Critical patent/TW201403223A/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW102119250A 2012-06-01 2013-05-31 分散組成物、以及使用其的聚合性組成物、遮光性彩色濾光片、固體攝影元件、液晶顯示裝置、晶圓級透鏡及攝影單元 TW201403223A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012126471A JP2013249417A (ja) 2012-06-01 2012-06-01 分散組成物、並びに、これを用いた、重合性組成物、遮光性カラーフィルタ、固体撮像素子、液晶表示装置、ウエハレベルレンズ、及び、撮像ユニット

Publications (1)

Publication Number Publication Date
TW201403223A true TW201403223A (zh) 2014-01-16

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TW102119250A TW201403223A (zh) 2012-06-01 2013-05-31 分散組成物、以及使用其的聚合性組成物、遮光性彩色濾光片、固體攝影元件、液晶顯示裝置、晶圓級透鏡及攝影單元

Country Status (3)

Country Link
JP (1) JP2013249417A (ja)
TW (1) TW201403223A (ja)
WO (1) WO2013180035A1 (ja)

Cited By (3)

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TWI686669B (zh) * 2014-03-31 2020-03-01 日商日鐵化學材料股份有限公司 遮光膜用感光性樹脂組成物、使其硬化而成的遮光膜及彩色濾光片
TWI697697B (zh) * 2016-02-29 2020-07-01 日商富士軟片股份有限公司 分散組成物、硬化性組成物、遮光膜、彩色濾光片、固體攝像裝置、圖像顯示裝置、樹脂及硬化膜的製造方法
CN113272335A (zh) * 2019-02-01 2021-08-17 富士胶片株式会社 固化性组合物、膜、结构体、滤色器、固体摄像元件及图像显示装置

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JP6476211B2 (ja) * 2015-02-09 2019-02-27 富士フイルム株式会社 遮光膜、遮光膜付き赤外光カットフィルタ、及び、固体撮像装置
JP6529419B2 (ja) * 2015-10-19 2019-06-12 富士フイルム株式会社 硬化性組成物、硬化膜の製造方法、カラーフィルタ、遮光膜、固体撮像素子及び画像表示装置
JP6745869B2 (ja) * 2016-02-29 2020-08-26 富士フイルム株式会社 組成物、組成物の製造方法、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置
JP6764479B2 (ja) * 2016-07-29 2020-09-30 富士フイルム株式会社 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置
KR102322396B1 (ko) * 2016-08-25 2021-11-08 후지필름 가부시키가이샤 경화성 조성물 및 그 제조 방법, 경화막 및 그 제조 방법, 컬러 필터, 고체 촬상 소자, 고체 촬상 장치와, 적외선 센서
EP3767393A4 (en) 2018-03-13 2021-05-05 FUJIFILM Corporation Method for manufacturing cured film, and method for manufacturing solid-state imaging element
CN112601912A (zh) 2018-09-07 2021-04-02 富士胶片株式会社 车辆用前照灯单元、前照灯用遮光膜、前照灯用遮光膜的制造方法
JP7201461B2 (ja) * 2019-01-30 2023-01-10 デクセリアルズ株式会社 微小粒子配列用マスク
WO2020203277A1 (ja) 2019-03-29 2020-10-08 富士フイルム株式会社 感光性樹脂組成物、硬化膜、インダクタ、アンテナ
CN113993922B (zh) * 2019-07-22 2024-11-19 三菱化学株式会社 感光性着色树脂组合物、固化物、间隔壁及图像显示装置
WO2021199748A1 (ja) 2020-03-30 2021-10-07 富士フイルム株式会社 組成物、膜及び光センサ
EP4216242A4 (en) 2020-09-18 2024-05-22 FUJIFILM Corporation COMPOSITION, FILM CONTAINING MAGNETIC PARTICLES AND ELECTRONIC COMPONENT
EP4220669A4 (en) 2020-09-24 2024-03-20 FUJIFILM Corporation COMPOSITION, CURED PRODUCT CONTAINING MAGNETIC PARTICLES, SUBSTRATE INTRODUCED BY MAGNETIC PARTICLES AND ELECTRONIC MATERIAL
JPWO2022202394A1 (ja) 2021-03-22 2022-09-29
WO2023054565A1 (ja) 2021-09-30 2023-04-06 富士フイルム株式会社 磁性粒子含有組成物の製造方法、磁性粒子含有組成物、磁性粒子含有硬化物、磁性粒子導入基板、電子材料
JP2023125704A (ja) * 2022-02-28 2023-09-07 東京応化工業株式会社 光学素子の製造方法、光学素子及び感光性組成物

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JP5306681B2 (ja) * 2007-03-30 2013-10-02 富士フイルム株式会社 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法
JP5340102B2 (ja) * 2008-10-03 2013-11-13 富士フイルム株式会社 分散組成物、重合性組成物、遮光性カラーフィルタ、固体撮像素子、液晶表示装置、ウェハレベルレンズ、及び撮像ユニット
JP5894728B2 (ja) * 2009-09-09 2016-03-30 富士フイルム株式会社 ウェハレベルレンズ、レンズモジュール及び撮像ユニット、並びにウェハレベルレンズの製造方法、レンズモジュールの製造方法、及び撮像ユニットの製造方法
JP2011089015A (ja) * 2009-10-22 2011-05-06 Fujifilm Corp 分散組成物、感光性樹脂組成物、遮光性カラーフィルタ、液晶表示装置、および固体撮像素子
JP5680320B2 (ja) * 2010-03-25 2015-03-04 富士フイルム株式会社 ウエハレベルレンズ用黒色硬化性組成物、ウエハレベルレンズ、およびカメラモジュール
JP5701742B2 (ja) * 2010-12-28 2015-04-15 富士フイルム株式会社 遮光膜形成用チタンブラック分散組成物、それを含有する感放射線性組成物、遮光膜の製造方法、及び固体撮像素子
EP2472330B1 (en) * 2010-12-28 2017-01-25 Fujifilm Corporation Black radiation-sensitive composition, black cured film, solid-state imaging element, and method of producing black cured film
KR101867851B1 (ko) * 2010-12-28 2018-06-15 후지필름 가부시키가이샤 티타늄블랙 분산 조성물, 그것을 함유하는 흑색 감방사선성 조성물, 흑색 경화막, 고체 촬상 소자, 및 흑색 경화막의 제조 방법

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TWI686669B (zh) * 2014-03-31 2020-03-01 日商日鐵化學材料股份有限公司 遮光膜用感光性樹脂組成物、使其硬化而成的遮光膜及彩色濾光片
TWI697697B (zh) * 2016-02-29 2020-07-01 日商富士軟片股份有限公司 分散組成物、硬化性組成物、遮光膜、彩色濾光片、固體攝像裝置、圖像顯示裝置、樹脂及硬化膜的製造方法
US11326009B2 (en) 2016-02-29 2022-05-10 FUJIIFILM Corporation Dispersion composition, curable composition, light-shielding film, color filter, solid-state imaging device, image display device, resin, and method for manufacturing cured film
CN113272335A (zh) * 2019-02-01 2021-08-17 富士胶片株式会社 固化性组合物、膜、结构体、滤色器、固体摄像元件及图像显示装置
CN113272335B (zh) * 2019-02-01 2023-12-12 富士胶片株式会社 固化性组合物、膜、结构体、滤色器、固体摄像元件及图像显示装置
US11965047B2 (en) 2019-02-01 2024-04-23 Fujifilm Corporation Curable composition, film, structural body, color filter, solid-state imaging element, and image display device

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JP2013249417A (ja) 2013-12-12

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