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TW201402674A - Surface-modified metal oxide particle material, dispersion, polyoxyxylene resin composition, polyoxymethylene resin composite, optical semiconductor light-emitting device, illumination device, and liquid crystal image device - Google Patents

Surface-modified metal oxide particle material, dispersion, polyoxyxylene resin composition, polyoxymethylene resin composite, optical semiconductor light-emitting device, illumination device, and liquid crystal image device Download PDF

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TW201402674A
TW201402674A TW102117831A TW102117831A TW201402674A TW 201402674 A TW201402674 A TW 201402674A TW 102117831 A TW102117831 A TW 102117831A TW 102117831 A TW102117831 A TW 102117831A TW 201402674 A TW201402674 A TW 201402674A
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Yoichi Sato
Yasuyuki Kuriono
Takeshi Otsuka
Takeru Yamaguchi
Kenji Harada
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Sumitomo Osaka Cement Co Ltd
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Abstract

本發明提供一種藉由使用如下表面修飾金屬氧化物粒子材料而於用於光半導體發光裝置用之密封材料等中之情形時具有較高之耐熱性、進而可發揮較高之透明性及阻氣性的表面修飾金屬氧化物粒子材料、含有該表面修飾金屬氧化物粒子材料之分散液、聚矽氧樹脂組合物及聚矽氧樹脂複合體、以及使用該聚矽氧樹脂複合體之光半導體發光裝置、照明裝置及液晶圖像裝置,上述表面修飾金屬氧化物粒子材料係藉由至少具有苯基、及可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基的表面修飾材料對平均一次粒徑3nm以上且10nm以下之金屬氧化物粒子進行表面修飾而成。The present invention provides a high heat resistance and a high transparency and gas barrier when used in a sealing material for an optical semiconductor light-emitting device or the like by using a surface-modified metal oxide particle material as follows. Surface-modified metal oxide particle material, dispersion containing the surface-modified metal oxide particle material, polyoxyxene resin composition and polyoxyxene resin composite, and optical semiconductor light-emitting using the polyoxy-oxide resin composite In the device, the illuminating device, and the liquid crystal image device, the surface-modified metal oxide particle material is a surface-modifying material pair having at least a phenyl group and a group capable of crosslinking reaction with a functional group in a polyfluorene-oxygen resin-forming component. The metal oxide particles having an average primary particle diameter of 3 nm or more and 10 nm or less are surface-modified.

Description

表面修飾金屬氧化物粒子材料、分散液、聚矽氧樹脂組合物、聚矽氧樹脂複合體、光半導體發光裝置、照明裝置及液晶圖像裝置 Surface-modified metal oxide particle material, dispersion, polyoxyxylene resin composition, polyoxymethylene resin composite, optical semiconductor light-emitting device, illumination device, and liquid crystal image device

本發明係關於一種表面修飾金屬氧化物粒子材料、分散液、聚矽氧樹脂組合物、聚矽氧樹脂複合體、將其用作密封材料之光半導體發光裝置、具備該光半導體發光裝置之照明裝置及液晶圖像裝置。 The present invention relates to a surface-modified metal oxide particle material, a dispersion liquid, a polyoxyxylene resin composition, a polyoxymethylene resin composite, an optical semiconductor light-emitting device using the same as a sealing material, and an illumination provided with the same. Device and liquid crystal image device.

聚矽氧樹脂例如係如專利文獻1中所記載般,其透明性、耐熱性、耐光性等特性優異,又,硬度或橡膠彈性優異,因此可用於光半導體元件之密封材料或光波導材料等中。 For example, as described in Patent Document 1, the polysiloxane resin is excellent in properties such as transparency, heat resistance, and light resistance, and is excellent in hardness or rubber elasticity. Therefore, it can be used for a sealing material or an optical waveguide material of an optical semiconductor element. in.

尤其是作為光半導體發光元件之一種的發光二極體(LED,Light Emitting Diode)之密封材料,有例如專利文獻2中所記載般之有機改性聚矽氧樹脂、苯基(或甲基苯基)聚矽氧樹脂、或者例如專利文獻3中所記載般之二甲基聚矽氧樹脂等。 In particular, as a sealing material for a light-emitting diode (LED) of one of the optical semiconductor light-emitting elements, there are, for example, an organically modified polyoxyxylene resin as described in Patent Document 2, and a phenyl group (or methylbenzene). A polyoxyxylene resin or a dimethyl polyphthalide resin as described in Patent Document 3, for example.

另一方面,雖然聚矽氧樹脂之耐久性優異,但存在透氣性較大(阻氣性較低)之問題,對此,業界嘗試藉由含有金屬氧化物粒子來解決該問題。為了將聚矽氧樹脂與金屬氧化物粒子透明複合化,必需利用有機矽烷劑對粒子表面進行處理。例如係如專利文獻4、5中所記載般,藉由使用含環氧基之矽烷劑或含乙烯基之矽烷劑實施表面處理,可於樹脂之硬化時防止粒子之凝聚而製作透明複合體。 On the other hand, although the polyoxyxene resin is excellent in durability, it has a problem of high gas permeability (low gas barrier property), and the industry has attempted to solve this problem by containing metal oxide particles. In order to transparently combine the polyoxyxylene resin with the metal oxide particles, it is necessary to treat the surface of the particles with an organic decane agent. For example, as described in Patent Documents 4 and 5, by performing surface treatment using an epoxy group-containing decane agent or a vinyl group-containing decane agent, it is possible to prevent aggregation of particles during curing of the resin to produce a transparent composite.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利特開2009-076948號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2009-076948

專利文獻2:日本專利特開2007-270004號公報 Patent Document 2: Japanese Patent Laid-Open Publication No. 2007-270004

專利文獻3:日本專利特開2011-096793號公報 Patent Document 3: Japanese Patent Laid-Open No. 2011-096793

專利文獻4:日本專利特開2005-200657號公報 Patent Document 4: Japanese Patent Laid-Open Publication No. 2005-200657

專利文獻5:日本專利特開2006-70266號公報 Patent Document 5: Japanese Patent Laid-Open No. 2006-70266

然而,聚矽氧樹脂存在透氣性較大(阻氣性較低)之問題,雖藉由使金屬氧化物粒子分散於聚矽氧樹脂中並複合化而彌補該缺點並且謀求功能之提高,但尤其是亦存在因大氣中之含硫氣體會使LED封裝體之鍍銀反射板腐蝕(硫化而黑化)而使LED之亮度降低之問題。 However, the polyoxynene resin has a problem of high gas permeability (low gas barrier property), and the metal oxide particles are dispersed in the polyoxynoxy resin and composited to compensate for the disadvantage and improve the function. In particular, there is also a problem that the brightness of the LED is lowered due to corrosion (vulcanization and blackening) of the silver-plated reflector of the LED package due to the sulfur-containing gas in the atmosphere.

又,於聚矽氧樹脂中分散有無機粒子之情形時,若利用通常之表面處理劑則耐熱性較低,故而於高溫時產生粒子凝聚(粒子分散性降低)或產生表面處理劑本身之著色,藉此會使透過率降低,因此亦存在耐熱性產生問題之情況。 In the case where the inorganic particles are dispersed in the polyoxyxene resin, the heat resistance is low by the use of a usual surface treatment agent, so that particle aggregation occurs at a high temperature (particle dispersibility is lowered) or the surface treatment agent itself is colored. As a result, the transmittance is lowered, and thus there is a problem that heat resistance is caused.

進而,於利用自LED之光提取效率較低之二甲基聚矽氧樹脂進行密封之情形時,即便提高燈泡構造之密閉性或對LED封裝體之光反射板實施耐蝕性較高之鍍金等,亦存在亮度較低、成本較高之問題。 Further, in the case of sealing with a dimethylpolyphthalocene resin having a low light extraction efficiency from the LED, the sealing property of the bulb structure or the plating of the light-reflecting sheet of the LED package with high corrosion resistance is improved. There are also problems of lower brightness and higher cost.

另一方面,雖然苯基(或甲基苯基)聚矽氧樹脂與二甲基聚矽氧樹脂相比透氣性較小(阻氣性較高),但該等特性取決於可導入之苯基量,其導入量亦有限度。 On the other hand, although phenyl (or methylphenyl) polyfluorene oxide is less gas permeable (higher gas barrier property) than dimethyl polyoxyn resin, these properties depend on the benzene that can be introduced. The amount of the base is also limited.

又,若於表面處理劑中具有環氧基或於複合體中過量地殘留未反應之乙烯基,則存在對複合體施加熱負載時黃變之問題。又,於表面處理劑與聚矽氧樹脂之匹配性不充分之情形時,亦存在未實現阻氣性之提高、或於熱負載時產生粒子凝聚(粒子分散性降低)而使透過率 降低之問題。 Further, when the surface treatment agent has an epoxy group or an unreacted vinyl group remains excessively in the composite, there is a problem that yellowing occurs when a heat load is applied to the composite. Further, when the compatibility between the surface treatment agent and the polyoxyxylene resin is insufficient, the gas barrier properties are not improved, or the particles are aggregated during the heat load (the particle dispersibility is lowered) and the transmittance is increased. Reduce the problem.

本發明係為了解決上述問題而完成者,具體而言,其目的在於提供一種於用於光半導體發光裝置用之密封材料等之情形時具有較高之耐熱性(即,抑制由熱負載時之著色或熱負載時之粒子凝聚所致之透過率降低),進而可發揮較高之透明性及阻氣性的表面修飾金屬氧化物粒子材料、含有該表面修飾金屬氧化物粒子材料之分散液、聚矽氧樹脂組合物及聚矽氧樹脂複合體、以及將該聚矽氧樹脂複合體用於密封材料時可降低密封材料之透氣性而抑制由透過氣體引起之裝置之劣化的光半導體發光裝置、具備該光半導體發光裝置之照明裝置及液晶圖像裝置。 The present invention has been made in order to solve the above problems, and an object of the present invention is to provide a heat resistance which is high in heat resistance when used for a sealing material or the like for an optical semiconductor light-emitting device (that is, when it is suppressed by a heat load) a surface-modified metal oxide particle material having a high transparency and gas barrier properties, and a dispersion liquid containing the surface-modified metal oxide particle material, which has a low transmittance due to aggregation of particles during coloring or heat loading. The polyoxynoxy resin composition and the polyoxyxene resin composite, and the optical semiconductor light-emitting device capable of reducing the gas permeability of the sealing material and suppressing the deterioration of the device caused by the permeated gas when the polyoxynoxy resin composite is used as a sealing material An illumination device and a liquid crystal image device including the optical semiconductor light-emitting device.

本發明者等人為了解決上述課題而進行努力研究,結果發現,藉由使用如下表面修飾金屬氧化物粒子材料而可解決該課題,上述表面修飾金屬氧化物粒子材料係藉由利用至少具有苯基、及可與聚矽氧樹脂中之官能基進行交聯反應之基的表面修飾材料對平均一次粒徑在特定範圍內之金屬氧化物粒子進行表面修飾而獲得。具體而言,發現藉由將特定之聚矽氧樹脂中含有該表面修飾金屬氧化物粒子材料的聚矽氧樹脂複合體用於光半導體發光裝置中之發光元件之密封材料,而無損自發光元件之透光性,進而亦可降低密封層之透氣性,從而研究出本發明。 The present inventors have made an effort to solve the above problems, and as a result, have found that the surface-modified metal oxide particle material can be solved by using at least a phenyl group by using a surface-modified metal oxide particle material. And a surface modification material which can be subjected to a crosslinking reaction with a functional group in the polyoxyxene resin, which is obtained by surface-modifying metal oxide particles having an average primary particle diameter within a specific range. Specifically, it has been found that a polyoxyphthalocene resin composite containing the surface-modified metal oxide particle material in a specific polyoxyxene resin is used for a sealing material of a light-emitting element in an optical semiconductor light-emitting device, and the self-luminous element is not damaged. The light transmissive property can further reduce the gas permeability of the sealing layer, thereby studying the present invention.

即,本發明係如下所述。 That is, the present invention is as follows.

[1]一種表面修飾金屬氧化物粒子材料,其係藉由至少具有苯基、及可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基的表面修飾材料對平均一次粒徑為3nm以上且10nm以下之金屬氧化物粒子進行表面修飾而成。 [1] A surface-modified metal oxide particle material which has a mean primary particle diameter by a surface-modifying material having at least a phenyl group and a group capable of undergoing a crosslinking reaction with a functional group in a polyfluorene-oxygen resin-forming component. The metal oxide particles of 3 nm or more and 10 nm or less are surface-modified.

[2]如[1]記載之表面修飾金屬氧化物粒子材料,其中上述可與聚 矽氧樹脂形成成分中之官能基進行交聯反應之基為烯基。 [2] The surface-modified metal oxide particle material according to [1], wherein the above-mentioned poly-polymerizable The group in which the functional group in the epoxy resin forming component is subjected to a crosslinking reaction is an alkenyl group.

[3]如[1]記載之表面修飾金屬氧化物粒子材料,其中上述可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基為氫基。 [3] The surface-modified metal oxide particle material according to [1], wherein the group which can be cross-linked with the functional group in the polyfluorene oxide-forming component is a hydrogen group.

[4]如[1]記載之表面修飾金屬氧化物粒子材料,其中上述可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基為烯基及氫基。 [4] The surface-modified metal oxide particle material according to [1], wherein the group which can be cross-linked with the functional group in the polyfluorene oxide-forming component is an alkenyl group and a hydrogen group.

[5]一種分散液,其含有如[1]至[4]中任一項記載之表面修飾金屬氧化物粒子材料。 [5] A dispersion-containing metal oxide particle material according to any one of [1] to [4].

[6]一種聚矽氧樹脂組合物,其包含如[1]記載之表面修飾金屬氧化物粒子材料、及含有選自苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上之聚矽氧樹脂形成成分,且該聚矽氧樹脂形成成分具有可與上述表面修飾金屬氧化物粒子材料中使用之表面修飾材料所具有之基進行交聯反應之官能基。 [6] A polyoxyxylene resin composition comprising the surface-modified metal oxide particle material according to [1], and a component selected from the group consisting of a phenyl polyoxyl resin forming component and a methylphenyl polyoxyl resin forming component. One or more of the polyoxynene resin forming components, and the polyoxynoxy resin forming component has a functional group reactive with a group of the surface modifying material used in the surface-modified metal oxide particle material.

[7]一種聚矽氧樹脂組合物,其包含如[2]記載之表面修飾金屬氧化物粒子材料、及含有選自苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上之聚矽氧樹脂形成成分,且該聚矽氧樹脂形成成分具有氫基。 [7] A polyoxyxylene resin composition comprising the surface-modified metal oxide particle material according to [2], and a component selected from the group consisting of a phenyl polyoxymethylene resin forming component and a methylphenyl polyfluorene resin forming component. One or more of the polyoxyxylene resin forming components, and the polyoxyxylene resin forming component has a hydrogen group.

[8]一種聚矽氧樹脂組合物,其包含如[3]記載之表面修飾金屬氧化物粒子材料、及含有選自苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上之聚矽氧樹脂形成成分,且該聚矽氧樹脂形成成分具有選自烯基及炔基中之一種以上。 [8] A polyoxyxylene resin composition comprising the surface-modified metal oxide particle material according to [3], and a component selected from the group consisting of a phenyl polyoxyl resin forming component and a methylphenyl polyfluorene resin forming component. One or more of the polyoxynene resin forming components, and the polyoxyxylene resin forming component has one or more selected from the group consisting of alkenyl groups and alkynyl groups.

[9]一種聚矽氧樹脂組合物,其包含如[4]記載之表面修飾金屬氧化物粒子材料、及含有選自苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上之聚矽氧樹脂形成成分,且該聚矽氧樹脂形成成分具有選自烯基及炔基中之一種以上、以及氫基。 [9] A polyoxyxylene resin composition comprising the surface-modified metal oxide particle material according to [4], and a component selected from the group consisting of a phenyl polyoxyl resin forming component and a methylphenyl polyoxyl resin forming component. One or more of the polyoxo resin forming components, and the polyoxynoxy resin forming component has one or more selected from the group consisting of alkenyl groups and alkynyl groups, and a hydrogen group.

[10]如[6]至[9]中任一項記載之聚矽氧樹脂組合物,其係含有上述金屬氧化物粒子5質量%以上而成。 [10] The polyoxyxylene resin composition according to any one of [6] to [9], wherein the metal oxide particles are contained in an amount of 5 mass% or more.

[11]如[6]至[10]中任一項記載之聚矽氧樹脂組合物,其進而含有矽氫化觸媒。 [11] The polyoxyxylene resin composition according to any one of [6] to [10] further comprising a hydrazine hydrogenation catalyst.

[12]一種聚矽氧樹脂複合體,其係使如[6]至[11]中任一項記載之聚矽氧樹脂組合物硬化而成。 [12] A polyoxyxylene resin composite obtained by curing the polyoxyxylene resin composition according to any one of [6] to [11].

[13]一種光半導體發光裝置,其係藉由密封材料密封半導體發光元件而成者,並且上述密封材料包含如[12]記載之聚矽氧樹脂複合體,且包含該密封材料之密封層之厚度為50μm以上。 [13] An optical semiconductor light-emitting device which is obtained by sealing a semiconductor light-emitting element with a sealing material, wherein the sealing material comprises the polyoxymethylene resin composite according to [12], and comprises a sealing layer of the sealing material. The thickness is 50 μm or more.

[14]一種照明裝置,其係具備如[13]記載之光半導體發光裝置而成。 [14] An illumination device comprising the optical semiconductor light-emitting device according to [13].

[15]一種液晶圖像裝置,其係具備如[13]記載之光半導體發光裝置而成。 [15] A liquid crystal image device comprising the optical semiconductor light-emitting device according to [13].

根據本發明,可提供一種於用於光半導體發光裝置用之密封材料等之情形時具有較高之耐熱性(即,抑制由熱負載時之著色或熱負載時之粒子凝聚所致之透過率降低),進而可發揮較高之透明性及阻氣性的表面修飾金屬氧化物粒子材料、含有該表面修飾金屬氧化物粒子材料之分散液、聚矽氧樹脂組合物及聚矽氧樹脂複合體、以及於將該聚矽氧樹脂複合體用於密封材料時,可降低密封材料之透氣性而抑制由透過氣體所引起之裝置之劣化,並且透明性或耐熱性優異的光半導體發光裝置、具備該光半導體發光裝置之照明裝置及液晶圖像裝置。 According to the present invention, it is possible to provide a heat resistance which is high in heat resistance when used for a sealing material or the like for an optical semiconductor light-emitting device (that is, a transmittance which suppresses aggregation of particles by coloring or heat load at the time of heat load) a surface-modified metal oxide particle material which exhibits high transparency and gas barrier properties, a dispersion liquid containing the surface-modified metal oxide particle material, a polyoxyxylene resin composition, and a polyoxyxylene resin composite And when the polyoxyxene resin composite is used for a sealing material, the optical semiconductor light-emitting device having excellent transparency or heat resistance can be provided, which can reduce the gas permeability of the sealing material and suppress deterioration of the device caused by the permeating gas. An illumination device and a liquid crystal image device of the optical semiconductor light-emitting device.

10‧‧‧發光裝置 10‧‧‧Lighting device

12‧‧‧反射杯 12‧‧‧Reflection Cup

12A‧‧‧凹部 12A‧‧‧ recess

14‧‧‧發光元件 14‧‧‧Lighting elements

16‧‧‧第1密封層 16‧‧‧1st sealing layer

18‧‧‧第2密封層 18‧‧‧2nd sealing layer

20‧‧‧發光裝置 20‧‧‧Lighting device

圖1係示意性地表示本發明之光半導體發光裝置之一實施形態的剖面圖。 Fig. 1 is a cross-sectional view schematically showing an embodiment of an optical semiconductor light-emitting device of the present invention.

圖2係示意性地表示本發明之光半導體發光裝置之另一實施形態 的剖面圖。 2 is a view schematically showing another embodiment of the optical semiconductor light-emitting device of the present invention Sectional view.

以下,詳細說明本發明。 Hereinafter, the present invention will be described in detail.

[1.表面修飾金屬氧化物粒子材料] [1. Surface modified metal oxide particle material]

本發明中之表面修飾金屬氧化物粒子材料係藉由至少具有苯基、及可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基的表面修飾材料對特定粒徑之金屬氧化物粒子進行表面修飾而成。再者,後文中對「聚矽氧樹脂形成成分」進行說明。 The surface-modified metal oxide particle material in the present invention is a metal oxide having a specific particle diameter by a surface-modifying material having at least a phenyl group and a group capable of crosslinking with a functional group in a polyanthracene resin-forming component. The particles are surface modified. In addition, "polyoxy resin forming component" will be described later.

(金屬氧化物粒子) (metal oxide particles)

金屬氧化物粒子之種類並無特別限定,就保持密封材料等之透明性之觀點而言,較佳為可獲得奈米尺寸之粒徑之種類,可列舉:氧化鋅、氧化鋯、氧化鈦、二氧化矽(silica)、氧化鋁等。又,於考慮到藉由提高密封材料等之折射率,從而提高自使用該密封材料之光半導體發光裝置之光提取效率而高亮度化之情形時,金屬氧化物粒子之折射率較佳為1.5以上,更佳為1.7以上,進而較佳為1.9以上。作為此種金屬氧化物粒子,較佳為氧化鈦或氧化鋯(zirconia),尤佳為氧化鋯。 The type of the metal oxide particles is not particularly limited, and from the viewpoint of maintaining the transparency of the sealing material or the like, it is preferred to obtain a type of particle diameter of a nanometer size, and examples thereof include zinc oxide, zirconium oxide, and titanium oxide. Silica, alumina, and the like. Further, in consideration of the fact that the refractive index of the sealing material or the like is increased to increase the light extraction efficiency of the optical semiconductor light-emitting device using the sealing material, the refractive index of the metal oxide particles is preferably 1.5. The above is more preferably 1.7 or more, and still more preferably 1.9 or more. As such metal oxide particles, titanium oxide or zirconia is preferable, and zirconia is particularly preferable.

再者,於本說明書中,於表示為「X~Y」(X、Y為任意數字)之情形時,只要未特別說明,則意指「X以上且Y以下」。 In the present specification, when it is expressed as "X to Y" (X, Y is an arbitrary number), unless otherwise specified, it means "X or more and Y or less".

金屬氧化物粒子之平均一次粒徑為3~10nm。若平均一次粒徑未達3nm,則除結晶性變差以外,表面活性亦增強,產生粒子間相互作用而增大聚矽氧樹脂組合物之黏度。另一方面,若平均一次粒徑變得大於10nm,則金屬氧化物與含有表面修飾材料之聚矽氧樹脂之折射率差較大,故而由散射所致之透過率之降低變明顯。 The average primary particle diameter of the metal oxide particles is 3 to 10 nm. When the average primary particle diameter is less than 3 nm, the surface activity is enhanced in addition to the deterioration of crystallinity, and the interaction between the particles is generated to increase the viscosity of the polyoxyxene resin composition. On the other hand, when the average primary particle diameter becomes larger than 10 nm, the difference in refractive index between the metal oxide and the polyoxynoxy resin containing the surface modifying material is large, so that the decrease in transmittance due to scattering becomes remarkable.

平均一次粒徑較佳為4nm~8nm,更佳為4nm~6nm。 The average primary particle diameter is preferably 4 nm to 8 nm, more preferably 4 nm to 6 nm.

(表面修飾材料) (surface modification material)

金屬氧化物粒子之表面修飾所使用之表面修飾材料至少含有苯 基、及可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基(以下,有時簡稱為「交聯反應基」)。此處,所謂「可與聚矽氧樹脂中之官能基進行交聯反應」,意指於形成聚矽氧樹脂之下述聚矽氧樹脂形成成分聚合硬化之過程中,與該聚矽氧樹脂形成成分中所含有之官能基進行反應而於硬化後實現表面修飾金屬氧化物粒子材料與聚矽氧樹脂之一體化。又,作為上述交聯反應,可列舉:矽氫化反應、縮合反應、羥基與環氧基或異氰酸酯基之反應等,作為供於該等交聯反應之交聯反應基,可列舉:氫基、烯基、炔基、羥基、環氧基、異氰酸酯基等。 The surface modification material used for surface modification of metal oxide particles contains at least benzene The base and the group which can be cross-linked with the functional group in the polyoxynene resin forming component (hereinafter, simply referred to as "crosslinking reaction group"). Here, the term "crosslinking reaction with a functional group in a polyoxyxylene resin" means a process of polymerizing and curing the following polyoxyxylene resin forming component of the polyoxyxene resin, and the polyoxyxylene resin. The functional group contained in the component is reacted to form a surface-modified metal oxide particle material and a polyoxyxene resin after curing. In addition, examples of the crosslinking reaction include a hydrogenation reaction, a condensation reaction, and a reaction of a hydroxyl group with an epoxy group or an isocyanate group. Examples of the crosslinking reaction group to be used in the crosslinking reaction include a hydrogen group. Alkenyl, alkynyl, hydroxy, epoxy, isocyanate, and the like.

作為上述交聯反應,矽氫化反應就不會產生水作為副產物及抑制由交聯反應基所致之著色之方面而言較佳。作為供於該羥基化反應之交聯反應基,可列舉:烯基、炔基、氫基,尤佳為烯基、氫基。 As the above crosslinking reaction, the hydrazine hydrogenation reaction is preferred in that water is not produced as a by-product and coloring by the crosslinking reaction group is suppressed. The crosslinking reaction group to be supplied to the hydroxylation reaction may, for example, be an alkenyl group, an alkynyl group or a hydrogen group, and more preferably an alkenyl group or a hydrogen group.

再者,所謂本發明中之「氫基」,意指有機矽化合物中之與矽原子直接鍵結之氫(Si-H鍵中之H)。 In addition, the "hydrogen group" in the present invention means hydrogen which is directly bonded to a ruthenium atom in an organic ruthenium compound (H in a Si-H bond).

首先,對表面修飾材料之交聯反應基為烯基之情形進行說明。 First, the case where the crosslinking reaction group of the surface modifying material is an alkenyl group will be described.

於該情形時,上述表面修飾材料可於一種材料中含有苯基與烯基兩者,亦可併用含有苯基之表面修飾材料與含有烯基之表面修飾材料兩者。 In this case, the surface modifying material may contain both a phenyl group and an alkenyl group in one material, and may also be used in combination with a surface modifying material containing a phenyl group and a surface modifying material containing an alkenyl group.

又,為了使表面修飾金屬氧化物粒子材料於聚矽氧樹脂複合體或組合物中均勻地分散穩定化,亦可併用具有其他結構之表面修飾材料。 Further, in order to uniformly disperse and stabilize the surface-modified metal oxide particle material in the polyoxymethylene resin composite or the composition, a surface-modifying material having another structure may be used in combination.

使表面修飾材料中含有苯基之原因在於:為了確保與成為基質之苯基聚矽氧樹脂及甲基苯基聚矽氧樹脂(以下,有時將該等統稱為「(甲基)苯基聚矽氧樹脂」)之界面親和性,及藉由表面修飾材料之苯基與(甲基)苯基聚矽氧樹脂之苯基之π-π堆疊而使表面修飾金屬氧化物粒子與(甲基)苯基聚矽氧樹脂靠近,藉此,可縮小聚矽氧樹脂複合體 中之間隙,可抑制透氣性。 The reason why the phenyl group is contained in the surface-modifying material is to ensure the phenyl polyoxyl resin and the methylphenyl polyoxyl resin which are the substrates (hereinafter, these are collectively referred to as "(meth)phenyl group). The interface affinity of the polyoxyl resin and the surface modification of the metal oxide particles by the π-π stacking of the phenyl group of the surface modifying material and the phenyl group of the (meth) phenyl polyoxyl resin The phenyl phthalocyanine resin is close to thereby reducing the polyoxymethylene resin composite The gap in the middle can suppress the gas permeability.

使表面修飾材料中含有烯基之原因在於:於聚矽氧樹脂組合物聚合硬化時,表面修飾材料中之烯基與成為基質之聚矽氧樹脂形成成分中之氫基(矽氧烷聚合物之與Si直接鍵結之H(氫))可藉由交聯反應(矽氫化反應)而鍵結,可防止聚合硬化過程中表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂相分離。又,藉由表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂進行交聯反應,可使表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂靠近而縮小聚矽氧樹脂複合體中之間隙,可抑制透氣性。 The reason why the surface-modifying material contains an alkenyl group is that the alkenyl group in the surface-modifying material and the hydrogen-based group in the polyoxo-oxygen resin forming component of the matrix are polymerized and hardened (the siloxane polymer) The H (hydrogen) which is directly bonded to Si can be bonded by a crosslinking reaction (hydrazine hydrogenation reaction) to prevent the surface-modified metal oxide particle material from being separated from the matrix polyoxyl resin during the polymerization hardening. Moreover, by crosslinking the surface-modified metal oxide particle material with the matrix polyoxy-oxygen resin, the surface-modified metal oxide particle material can be brought close to the matrix polyoxyl resin to reduce the gap in the polyoxy-resin composite. It can suppress the gas permeability.

進而,藉由使用耐熱性優異之表面修飾材料,可抑制由高溫時產生粒子凝聚(粒子分散性降低)或產生表面處理劑本身之著色所引起之透過率之降低,因此,可無損基質聚矽氧樹脂之耐熱性而抑制透氣性。再者,此處,所謂耐熱性優異,意指於熱負載試驗(150℃、1000小時)後表面修飾結構未變化(即,不存在樹脂組合物中之表面修飾金屬氧化物粒子材料由熱負載而引起凝聚,使分散性變化之情況,或者樹脂組合物或樹脂複合體中之表面修飾材料由熱負載而引起著色之情況),以下亦相同。 Further, by using a surface-modifying material having excellent heat resistance, it is possible to suppress a decrease in transmittance due to aggregation of particles at a high temperature (reduction in particle dispersibility) or coloration of the surface treatment agent itself, and thus, loss of matrix aggregation The heat resistance of the oxygen resin suppresses the gas permeability. Here, the term "heat resistance is excellent" means that the surface modification structure is not changed after the heat load test (150 ° C, 1000 hours) (that is, the surface-modified metal oxide particle material in the resin composition is not present by the heat load) In the case where aggregation occurs, the dispersibility changes, or the surface modification material in the resin composition or the resin composite is colored by heat load, the same applies hereinafter.

作為含有苯基之表面修飾材料,只要結構中含有苯基,則並無特別限定,可列舉下述式(1)、式(2)所表示之結構之材料或含有苯基與烷氧基之樹脂結構(三維網狀結構)之聚矽氧材料等。 The phenyl group-containing surface-modifying material is not particularly limited as long as it contains a phenyl group in the structure, and examples thereof include a material having a structure represented by the following formulas (1) and (2) or a phenyl group and an alkoxy group. A polyoxyn material such as a resin structure (three-dimensional network structure).

[化1]式(1)(C6H5)nSiX4-n Formula (1)(C 6 H 5 ) n SiX 4-n

(式(1)中,n為1~3之整數;X係選自甲氧基、乙氧基、羥基、鹵素原子、及羧基,於4-n為2以上之情形時,所有X可相同或亦可不 同) (In the formula (1), n is an integer of 1 to 3; X is selected from a methoxy group, an ethoxy group, a hydroxyl group, a halogen atom, and a carboxyl group, and when 4-n is 2 or more, all X's may be the same. Or not with)

(式(2)中,a為1~100之整數,b為0~100之整數,c為1~3之整數;A、B、C、D係選自苯基或碳數1~6之烷基中之1或兩種以上,且至少A、B中之任一者為苯基;A、B、C、D亦可全部為苯基;又,藉由Si、A、B、O所構成之部位與藉由Si、C、D、O所構成之部位之位置及排列為任意,為無規聚合物型;X係選自甲氧基、乙氧基、羥基、鹵素原子、及羧基,於c為2以上之情形時,全部X可相同或亦可不同) (In the formula (2), a is an integer from 1 to 100, b is an integer from 0 to 100, c is an integer from 1 to 3; and A, B, C, and D are selected from a phenyl group or a carbon number of 1 to 6. One or more of the alkyl groups, and at least one of A and B is a phenyl group; A, B, C, and D may all be a phenyl group; and, by Si, A, B, and O The position and arrangement of the constituent sites of Si, C, D, and O are arbitrary, and are a random polymer type; X is selected from a methoxy group, an ethoxy group, a hydroxyl group, a halogen atom, and a carboxyl group. , when c is 2 or more, all Xs may be the same or different)

具體而言可列舉:苯基三甲氧基矽烷、二苯基二甲氧基矽烷、單末端為烷氧基之苯基聚矽氧、單末端為烷氧基之甲基苯基聚矽氧、含烷氧基之苯基聚矽氧樹脂、含烷氧基之甲基苯基聚矽氧樹脂等,此外,作為含有苯基之表面修飾材料,可列舉:苯甲酸、苯甲酸甲酯、甲苯甲酸、鄰苯二甲酸等含苯基之有機酸化合物。 Specific examples thereof include phenyltrimethoxydecane, diphenyldimethoxydecane, phenyl polyfluorene having a single terminal alkoxy group, and methylphenyl polyoxyxoxide having a single terminal alkoxy group. The alkoxy group-containing phenyl polyoxyl resin, the alkoxy group-containing methylphenyl polyoxyl resin, and the like, and the phenyl group-containing surface modifying material may, for example, be benzoic acid, methyl benzoate or toluene. A phenyl-containing organic acid compound such as formic acid or phthalic acid.

該等中,就耐熱性亦優異之觀點而言,較佳為苯基三甲氧基矽烷、二苯基二甲氧基矽烷、單末端為烷氧基之苯基聚矽氧、單末端為烷氧基之甲基苯基聚矽氧、含烷氧基之苯基聚矽氧樹脂、含烷氧基之甲基苯基聚矽氧樹脂。 Among these, from the viewpoint of excellent heat resistance, phenyltrimethoxydecane, diphenyldimethoxydecane, phenylpolyoxyl which is alkoxy at one terminal, and alkane at the single terminal are preferred. Alkyl phenyl polyfluorene oxy, alkoxy-containing phenyl polyoxyl resin, alkoxy-containing methyl phenyl polyoxyl resin.

作為含有烯基之表面修飾材料,只要結構中含有烯基,則並無特別限定,可列舉下述式(3)、(4)所表示之結構之材料等。 The surface-modified material containing an alkenyl group is not particularly limited as long as it contains an alkenyl group in the structure, and examples thereof include materials represented by the following formulas (3) and (4).

[化3] 式(3)CH2=CH-CnH2n-SiXm(CH3)3-m Formula (3) CH 2 =CH-C n H 2n -SiX m (CH 3 ) 3-m

(式(3)中,n為0以上之整數,m為1~3之整數;X係選自甲氧基、乙氧基、羥基、鹵素原子、及羧基,於m為2以上之情形時,所有X可相同或亦可不同) (In the formula (3), n is an integer of 0 or more, m is an integer of 1 to 3; X is selected from a methoxy group, an ethoxy group, a hydroxyl group, a halogen atom, and a carboxyl group, and when m is 2 or more , all Xs may be the same or different)

(式(4)中,n為1~100之整數,m為1~3之整數;X係選自甲氧基、乙氧基、羥基、鹵素原子、及羧基,於m為2以上之情形時,所有X可相同或亦可不同) (In the formula (4), n is an integer of 1 to 100, m is an integer of 1 to 3; and X is selected from a methoxy group, an ethoxy group, a hydroxyl group, a halogen atom, and a carboxyl group, and when m is 2 or more All Xs may be the same or different)

具體而言可列舉:乙烯基三甲氧基矽烷、單末端為烷氧基單末端為乙烯基之二甲基聚矽氧。此外,作為含有烯基之表面修飾材料,可列舉:式(3)之烴鏈分支之結構或於分支之烴鏈上含有烯基之結構之材料、甲基丙烯醯氧基丙基三甲氧基矽烷、丙烯醯氧基丙基三甲氧基矽烷等丙烯酸系矽烷偶合劑或甲基丙烯酸等含碳-碳不飽和鍵之脂肪酸等。 Specific examples thereof include vinyl trimethoxy decane and a dimethyl phthalocyanine having a single terminal terminal and a single alkoxy group as a vinyl group. Further, examples of the surface-modifying material containing an alkenyl group include a structure of a hydrocarbon chain branch of the formula (3) or a structure containing an alkenyl group in a branched hydrocarbon chain, and methacryloxypropyltrimethoxy group. An acrylic decane coupling agent such as decane or acryloxypropyltrimethoxy decane or a fatty acid having a carbon-carbon unsaturated bond such as methacrylic acid.

該等中,就耐熱性亦優異之觀點而言,較佳為乙烯基三甲氧基矽烷、單末端為烷氧基單末端為乙烯基之二甲基聚矽氧、式(3)之烴鏈分支之結構或於分支之烴鏈上含有烯基之結構之材料。 Among these, from the viewpoint of excellent heat resistance, vinyl trimethoxy decane, a mono-terminal alkoxy group having a single terminal vinyl group, and a hydrocarbon chain of the formula (3) are preferred. The structure of the branch or the material containing the structure of the alkenyl group on the branched hydrocarbon chain.

作為含有苯基與烯基兩者之表面修飾材料,只要結構中含有苯基與烯基兩者,則並無特別限定,可列舉:苯乙烯基三甲氧基矽烷或 式(5)所表示之單末端為烷氧基單末端為乙烯基之苯基聚矽氧、單末端為烷氧基單末端為乙烯基之甲基苯基聚矽氧等。該等均亦於耐熱性之方面優異。 The surface modifying material containing both a phenyl group and an alkenyl group is not particularly limited as long as it contains both a phenyl group and an alkenyl group in the structure, and examples thereof include styryltrimethoxydecane or The single terminal represented by the formula (5) is a phenyl polyfluorene having a single alkoxy group as a vinyl group, and a methylphenylpolyoxy group having a single terminal terminal and a vinyl group having a single terminal terminal and a vinyl group. These are also excellent in heat resistance.

(式(5)中,a為1~100之整數,b為0~100之整數,c為1~3之整數;A、B、C、D係選自苯基或碳數1~6之烷基中之一種或兩種以上,且至少A、B中之任一者為苯基;A、B、C、D亦可全部為苯基;又,藉由Si、A、B、O所構成之部位與藉由Si、C、D、O所構成之部位之位置及排列為任意,為無規聚合物型;X係選自甲氧基、乙氧基、羥基、鹵素原子、及羧基,於c為2以上之情形時,所有X可相同或亦可不同) (In the formula (5), a is an integer from 1 to 100, b is an integer from 0 to 100, c is an integer from 1 to 3; and A, B, C, and D are selected from a phenyl group or a carbon number of 1 to 6. One or more of the alkyl groups, and at least one of A and B is a phenyl group; A, B, C, and D may all be a phenyl group; and, by Si, A, B, O The position and arrangement of the constituent sites of Si, C, D, and O are arbitrary, and are a random polymer type; X is selected from a methoxy group, an ethoxy group, a hydroxyl group, a halogen atom, and a carboxyl group. , when c is 2 or more, all Xs may be the same or different)

其次,對表面修飾材料之交聯反應基為氫基之情形進行說明。再者,所謂本發明中之「氫基」,意指有機矽化合物中之與矽原子直接鍵結之氫(Si-H鍵中之H)。又,有時將氫基記作「Si-H基」。 Next, the case where the crosslinking reaction group of the surface modifying material is a hydrogen group will be described. In addition, the "hydrogen group" in the present invention means hydrogen which is directly bonded to a ruthenium atom in an organic ruthenium compound (H in a Si-H bond). Further, the hydrogen group may be referred to as "Si-H group".

於該情形時,上述表面修飾材料可於一種材料中含有苯基與氫基兩者,亦可併用含有苯基之表面修飾材料與含有氫基之表面修飾材料兩者。 In this case, the surface modifying material may contain both a phenyl group and a hydrogen group in one material, and may also be used in combination with a surface modifying material containing a phenyl group and a surface modifying material containing a hydrogen group.

又,為了使表面修飾金屬氧化物粒子材料於聚矽氧樹脂複合體或組合物中均勻地分散穩定化,亦可併用具有其他結構之表面修飾材料。 Further, in order to uniformly disperse and stabilize the surface-modified metal oxide particle material in the polyoxymethylene resin composite or the composition, a surface-modifying material having another structure may be used in combination.

使表面修飾材料中含有苯基之原因如上所述。 The reason why the phenyl group is contained in the surface modifying material is as described above.

使表面修飾材料中含有氫基之原因在於:於聚矽氧樹脂組合物聚合硬化時,表面修飾材料之氫基與成為基質之聚矽氧樹脂形成成分中之烯基或炔基可藉由交聯反應(矽氫化反應)而鍵結,可防止聚合硬化過程中表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂相分離。又,藉由表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂進行交聯反應,可使表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂靠近而縮小聚矽氧樹脂複合體中之間隙,可抑制透氣性。再者,後文中對「樹脂形成成分」進行說明。 The reason why the surface-modifying material contains a hydrogen group is that when the polyoxyphthalocene resin composition is polymerized and hardened, the hydrogen group of the surface modifying material and the alkenyl group or alkynyl group in the polyoxon oxide forming component which becomes the matrix can be exchanged. The bonding reaction (hydrazine hydrogenation reaction) is bonded to prevent the surface-modified metal oxide particle material from being separated from the matrix polyoxymethylene resin during the polymerization hardening. Moreover, by crosslinking the surface-modified metal oxide particle material with the matrix polyoxy-oxygen resin, the surface-modified metal oxide particle material can be brought close to the matrix polyoxyl resin to reduce the gap in the polyoxy-resin composite. It can suppress the gas permeability. In addition, the "resin forming component" will be described later.

如此,藉由使表面修飾材料中含有苯基與氫基,而提高表面修飾材料與含有(甲基)苯基聚矽氧樹脂之基質聚矽氧樹脂之匹配性並一體化,藉此,可防止由熱負載時之粒子凝聚所致之透過率降低。又,由於無需存在環氧基或乙烯基,故而可消除熱負載時之著色原因本身。進而,苯基本身之耐熱性較高。如上所述,本發明中之表面處理材料其本身之耐熱性較高。 Thus, by making the surface modification material contain a phenyl group and a hydrogen group, the compatibility of the surface modification material with the matrix polyoxymethylene resin containing the (meth) phenyl polyoxyl resin is improved and integrated. It is prevented from lowering the transmittance due to aggregation of particles during heat load. Moreover, since it is not necessary to have an epoxy group or a vinyl group, the coloring cause itself at the time of a heat load can be eliminated. Further, the phenyl itself has high heat resistance. As described above, the surface treatment material of the present invention has high heat resistance itself.

並且,由於提高表面修飾材料與基質聚矽氧樹脂之匹配性並一體化,故而阻氣性亦較高。 Moreover, since the matching of the surface modifying material with the matrix polyoxyl resin is improved and integrated, the gas barrier property is also high.

如此,藉由使用耐熱性優異之表面修飾材料,可無損基質聚矽氧樹脂之耐熱性而抑制透氣性。 As described above, by using a surface modifying material excellent in heat resistance, the heat resistance of the matrix polyoxynoxy resin can be impaired to suppress the gas permeability.

關於含有苯基之表面修飾材料,如上所述。 The surface modification material containing a phenyl group is as described above.

作為含有氫基之表面修飾材料,只要結構中含有氫基(Si-H鍵)則並無特別限定,例如可列舉:三乙氧基矽烷、二甲基乙氧基矽烷、二乙氧基甲基矽烷、二甲基氯矽烷、乙基二氯矽烷等。 The surface-modifying material containing a hydrogen group is not particularly limited as long as it contains a hydrogen group (Si-H bond) in the structure, and examples thereof include triethoxydecane, dimethylethoxysilane, and diethoxymethyl. Base decane, dimethyl chlorodecane, ethyl dichlorodecane, and the like.

該等中,就耐熱性亦優異之觀點而言,較佳為三乙氧基矽烷、二甲基乙氧基矽烷、二乙氧基甲基矽烷。 Among these, from the viewpoint of excellent heat resistance, triethoxydecane, dimethylethoxydecane, and diethoxymethyldecane are preferred.

作為含有苯基與氫基兩者之表面修飾材料,只要結構中含有苯基與氫基(Si-H鍵)則並無特別限定,可列舉下述式(6)、式(7)所表示之 結構之材料、或含有苯基與烷氧基且進而含有與矽直接鍵結之氫之樹脂結構(三維網狀結構)之聚矽氧材料等。 The surface-modifying material containing both a phenyl group and a hydrogen group is not particularly limited as long as it contains a phenyl group and a hydrogen group (Si-H bond), and is represented by the following formulas (6) and (7). It A material of a structure or a polyoxyxylene material containing a phenyl group and an alkoxy group and further containing a resin structure (three-dimensional network structure) of hydrogen directly bonded to hydrazine.

[化6]式(6)(C6H5)nSiHmX4-n-m (6)(C 6 H 5 ) n SiH m X 4-nm

(式(6)中,n及m為1或2,且n與m之合計為3以下;X係選自甲氧基、乙氧基、羥基、鹵素原子、及羧基,於4-n-m為2之情形(n=m=1之情形)時,兩個X可相同或亦可不同) (In the formula (6), n and m are 1 or 2, and the total of n and m is 3 or less; and X is selected from a methoxy group, an ethoxy group, a hydroxyl group, a halogen atom, and a carboxyl group, and is a 4-nm group. In the case of 2 (in the case of n=m=1), the two Xs may be the same or different)

(式(7)中,a為1~100之整數,b為0~100之整數;A、B、C、D係選自苯基、碳數1~6之烷基或氫基中之一種或兩種以上,且至少A、B中之任一者為苯基;A、B、C、D亦可全部為苯基;又,藉由Si、A、B、O所構成之部位與藉由Si、C、D、O所構成之部位之位置及排列為任意,為無規聚合物型;X係選自甲氧基、乙氧基、羥基、鹵素原子、及羧基,於c為2以上之情形時,所有X可相同或亦可不同;於A、B、C、D中之至少一個為氫基之情形時,c為1~3之整數,d為0~2之整數,且c與d之合計為3以下,於A、B、C、D中均不含氫基之情形時,c及d為1或2,且c與d之合計為3以下) (In the formula (7), a is an integer from 1 to 100, and b is an integer from 0 to 100; and A, B, C, and D are one selected from the group consisting of a phenyl group, an alkyl group having 1 to 6 carbon atoms, or a hydrogen group. Or two or more, and at least one of A and B is a phenyl group; A, B, C, and D may all be a phenyl group; and, by virtue of Si, A, B, and O, The position and arrangement of the sites composed of Si, C, D, and O are arbitrary, and are a random polymer type; X is selected from a methoxy group, an ethoxy group, a hydroxyl group, a halogen atom, and a carboxyl group, and c is 2 In the above case, all X may be the same or different; when at least one of A, B, C, and D is a hydrogen group, c is an integer of 1 to 3, and d is an integer of 0 to 2, and When the total of c and d is 3 or less, and when A, B, C, and D do not contain a hydrogen group, c and d are 1 or 2, and the total of c and d is 3 or less)

具體而言可列舉:苯基二氯矽烷、二苯基氯矽烷、苯基氯矽烷、苯基二乙氧基矽烷等。 Specific examples thereof include phenyl dichlorodecane, diphenylchlorodecane, phenylchlorodecane, and phenyldiethoxydecane.

又,於下述聚矽氧樹脂組合物或聚矽氧樹脂複合體中,作為以使金屬氧化物粒子均勻地分散穩定化為目的而併用之其他結構之表面修飾材料,可列舉:單末端為烷氧基之二甲基聚矽氧、單末端為烷氧基單末端為乙烯基之二甲基聚矽氧、單末端環氧聚矽氧、烷基矽烷化合物、脂肪酸化合物等。 In addition, in the polyoxyxylene resin composition or the polyoxymethylene resin composite, the surface modification material which is another structure used for the purpose of uniformly dispersing and stabilizing the metal oxide particles is exemplified by a single terminal. The dimethyloxypolyoxy group of the alkoxy group and the dimethylpolyoxyl group having a single a terminal alkoxy group as a vinyl group, a single-end epoxy polyfluorene oxide, an alkyl decane compound, a fatty acid compound and the like.

其次,對表面修飾材料之交聯反應基為氫基及烯基之情形進行說明。 Next, the case where the crosslinking reaction group of the surface modifying material is a hydrogen group and an alkenyl group will be described.

於該情形時,上述表面修飾材料可於一種表面修飾材料中含有苯基、氫基及烯基三種基,可併用含有該三種中之兩種基者與含有其他一種基者,亦可併用分別含有三種基者。 In this case, the surface modifying material may contain three groups of a phenyl group, a hydrogen group and an alkenyl group in one surface modifying material, and may be used in combination with one of the three kinds of bases and another type of base. Contains three bases.

即,於本發明中,可於進行利用至少具有苯基與烯基之表面修飾材料之表面修飾後、或者亦可與該表面修飾同時,藉由具有氫基之表面修飾材料進行表面修飾。又,亦可於進行利用至少具有苯基與氫基之表面修飾材料之表面修飾後、或者與該表面修飾同時,藉由具有烯基(或炔基)之表面修飾材料進行表面修飾。藉此,可使氫基及烯基(或炔基)兩者修飾擔載於金屬氧化物粒子表面。 That is, in the present invention, the surface modification may be performed by a surface modification material having a hydrogen group, or may be subjected to surface modification using a surface modification material having at least a phenyl group and an alkenyl group. Further, surface modification may be carried out by surface modification with an alkenyl group (or alkynyl group) after surface modification using a surface modification material having at least a phenyl group and a hydrogen group or at the same time as the surface modification. Thereby, both a hydrogen group and an alkenyl group (or an alkynyl group) can be supported and supported on the surface of the metal oxide particle.

關於上述具有烯基之表面修飾材料、具有氫基之表面修飾材料,如上所述。 The above surface-modified material having an alkenyl group and a surface-modifying material having a hydrogen group are as described above.

又,為了使表面修飾金屬氧化物粒子材料於聚矽氧樹脂複合體或組合物中均勻地分散穩定化,亦可併用具有其他結構之表面修飾材料。 Further, in order to uniformly disperse and stabilize the surface-modified metal oxide particle material in the polyoxymethylene resin composite or the composition, a surface-modifying material having another structure may be used in combination.

如上所述,表面修飾材料中之烯基可於聚矽氧樹脂組合物聚合硬化時與基質聚矽氧樹脂形成成分中之氫基藉由交聯反應(矽氫化反應)鍵結而一體化。又,表面修飾材料中之氫基可於聚矽氧樹脂組合物聚合硬化時與基質聚矽氧樹脂形成成分中之烯基或炔基藉由交聯反應(矽氫化反應)鍵結而一體化。並且,藉由該鍵結作用,可防止聚合 硬化過程中之表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂之相分離,並且可使表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂靠近而縮小聚矽氧樹脂複合體中之間隙,抑制透氣性。 As described above, the alkenyl group in the surface modifying material can be integrated by the crosslinking reaction (hydrazine hydrogenation reaction) bonding with the hydrogen group in the matrix polyoxyn resin forming component when the polyoxyxene resin composition is polymerized and cured. Further, the hydrogen group in the surface modifying material may be integrated with the alkenyl group or the alkynyl group in the matrix polyoxyn resin forming component by the crosslinking reaction (hydrazine hydrogenation reaction) bonding when the polyoxyxylene resin composition is polymerized and hardened. . And, by the bonding action, aggregation can be prevented The surface-modified metal oxide particle material in the hardening process is separated from the matrix polyoxyxene resin, and the surface-modified metal oxide particle material is brought close to the matrix polyoxyl resin to reduce the gap in the polyoxy-resin composite. Inhibits breathability.

此處,基質聚矽氧樹脂形成成分之硬化如下所述,較佳為選擇加成硬化型。所謂該加成硬化,係指聚矽氧樹脂形成成分中之配置於矽氧烷聚合物中之氫基與同為矽氧烷聚合物中之烯基(或炔基)藉由利用鉑族金屬系觸媒之加成反應(矽氫化反應)而聚合,藉此硬化者。因此,基質聚矽氧樹脂形成成分至少包含含有氫基之聚矽氧樹脂形成成分與含有烯基(或炔基)之聚矽氧樹脂形成成分。 Here, the hardening of the matrix polyoxyl resin forming component is as follows, and it is preferred to select an addition hardening type. The addition hardening refers to a hydrogen group disposed in a siloxane polymer in a polyoxynene resin forming component and an alkenyl group (or alkynyl group) in the same siloxane polymer by using a platinum group metal. It is polymerized by an addition reaction (hydrogenation reaction) of a catalyst, whereby it is hardened. Therefore, the matrix polyoxyn resin forming component contains at least a hydrogen group-containing polyoxyn resin forming component and an alkenyl group containing a alkenyl group (or alkynyl group).

因此,藉由使烯基(或炔基)與氫基一併修飾擔載於金屬氧化物粒子表面,不僅可使金屬氧化物粒子表面之烯基與基質聚矽氧樹脂形成成分中之氫基進行交聯反應,而且亦可使金屬氧化物粒子表面之氫基與基質聚矽氧樹脂形成成分中之烯基(或炔基)進行交聯反應,因此,可進一步實現金屬氧化物粒子與基質聚矽氧樹脂之一體化。 Therefore, by supporting the alkenyl group (or alkynyl group) together with the hydrogen group on the surface of the metal oxide particle, not only the alkenyl group on the surface of the metal oxide particle but also the hydrogen group in the matrix polyoxo resin can be formed. The crosslinking reaction is carried out, and the hydrogen group on the surface of the metal oxide particles can be cross-linked with the alkenyl group (or alkynyl group) in the matrix polyoxo resin forming component, so that the metal oxide particles and the matrix can be further realized. Integration of polyoxyl resin.

再者,若於聚矽氧樹脂複合體中殘留過量之烯基或炔基,則有於熱負載時產生著色之虞。因此,較佳為聚矽氧樹脂組合物中所含有之烯基與炔基儘可能藉由與氫基之矽氫化反應等而被消耗。因此,聚矽氧樹脂組合物中所含有之氫基之總量較佳為可與烯基及炔基之總量進行矽氫化反應之量以上,若為其1.2倍以上(即氫基為過量之狀態)則更佳。再者,此處,所謂總量意指表面修飾材料中之量與基質聚矽氧樹脂形成成分中之量之合計量。 Further, when an excess of an alkenyl group or an alkynyl group remains in the polyoxyxene resin composite, there is a possibility of coloration upon heat load. Therefore, it is preferred that the alkenyl group and the alkynyl group contained in the polyoxyxylene resin composition are consumed as much as possible by hydrogenation reaction with a hydrogen group or the like. Therefore, the total amount of the hydrogen groups contained in the polyoxyxene resin composition is preferably an amount greater than the amount of the alkenyl group and the alkynyl group, and is 1.2 times or more (i.e., the hydrogen group is excessive). State) is better. Here, the total amount means a total amount of the amount in the surface modifying material and the amount in the matrix polyoxyl resin forming component.

作為利用表面修飾材料對金屬氧化物粒子之表面修飾方法,可列舉濕式法或乾式法等。濕式法可列舉向溶劑中投入金屬氧化物粒子、表面修飾材料、及視需要之用以使表面修飾材料水解之觸媒,施加加熱攪拌或珠粒介質等來自外部之能量而一面於溶劑中對金屬氧化物粒子進行表面修飾一面進行分散的方法。又,乾式法可列舉一面藉 由混練機等將金屬氧化物粒子與表面修飾材料進行混合一面獲得表面修飾金屬氧化物粒子等方法。 Examples of the surface modification method of the metal oxide particles by the surface modifying material include a wet method or a dry method. Examples of the wet method include the introduction of metal oxide particles, a surface modifying material, and, if necessary, a catalyst for hydrolyzing a surface modifying material into a solvent, and applying energy from the outside such as heating and stirring or a bead medium to the solvent. A method in which metal oxide particles are surface-modified while being dispersed. Also, the dry method can be cited as one side. A method of obtaining surface-modified metal oxide particles by mixing metal oxide particles and a surface modifying material by a kneading machine or the like.

上述表面修飾材料相對於金屬氧化物粒子之表面修飾量(表面修飾材料/金屬氧化物粒子)較佳為5~40質量%。只要表面修飾量在該範圍內,則可將下述聚矽氧樹脂中之表面修飾金屬氧化物粒子材料之分散性維持為較高,可抑制透明性之降低或透氣性。 The surface modification amount (surface modifying material/metal oxide particle) of the surface modifying material with respect to the metal oxide particles is preferably 5 to 40% by mass. When the amount of the surface modification is within this range, the dispersibility of the surface-modified metal oxide particle material in the following polyoxynoxy resin can be maintained high, and the decrease in transparency or the gas permeability can be suppressed.

上述表面修飾量更佳為10~30質量%。 The surface modification amount is more preferably from 10 to 30% by mass.

再者,上述表面修飾量係於750℃下對150℃乾燥後之表面修飾金屬氧化物粒子進行熱處理,算出熱處理後之質量減少量作為表面修飾材料之質量。 Further, the surface modification amount was obtained by heat-treating the surface-modified metal oxide particles dried at 150 ° C at 750 ° C, and calculating the mass reduction amount after the heat treatment as the mass of the surface-modifying material.

[2.分散液] [2. Dispersion]

本發明之分散液係使上述本發明之表面修飾金屬氧化物粒子材料分散於分散介質中而成者。根據本發明之分散液,由於係將本發明之表面修飾金屬氧化物粒子材料分散於分散介質中而成,故而於將其與基質聚矽氧樹脂形成成分組合時,可使表面修飾金屬氧化物粒子材料以均勻且良好之分散狀態分散於基質聚矽氧樹脂形成成分中,藉此可獲得成形性、加工性優異,又,透明性優異之聚矽氧樹脂組合物,進而可獲得使其硬化而成之聚矽氧樹脂複合體。 The dispersion liquid of the present invention is obtained by dispersing the surface-modified metal oxide particle material of the present invention in a dispersion medium. According to the dispersion of the present invention, since the surface-modified metal oxide particle material of the present invention is dispersed in a dispersion medium, the surface-modified metal oxide can be obtained by combining it with a matrix polyoxyl resin-forming component. The particulate material is dispersed in the matrix polyoxyn resin forming component in a uniform and good dispersion state, whereby a polyoxyxylene resin composition excellent in moldability and workability and excellent in transparency can be obtained, and further hardened. A polyoxymethylene resin composite.

本發明之分散液中之粒子材料之含有率較佳為設為5質量%以上且50質量%以下。藉由將粒子材料之含有率設為該範圍內,可使粒子材料獲得良好之分散狀態。粒子材料之含有率更佳為10質量%以上且30質量%。 The content of the particulate material in the dispersion liquid of the present invention is preferably 5% by mass or more and 50% by mass or less. By setting the content of the particulate material within this range, the particulate material can be obtained in a well dispersed state. The content of the particulate material is more preferably 10% by mass or more and 30% by mass.

作為分散介質,只要為可使粒子材料分散之溶劑即可,例如可較佳地使用:水;甲醇、乙醇、1-丙醇、2-丙醇、丁醇、辛醇等醇類;乙酸乙酯、乙酸丁酯、乳酸乙酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、γ-丁內酯等酯類;二乙醚、乙二醇單甲醚(甲基溶纖 劑)、乙二醇單乙醚(乙基溶纖劑)、乙二醇單丁醚(丁基溶纖劑)、二乙二醇單甲醚、二乙二醇單乙醚等醚類;丙酮、甲基乙基酮、甲基異丁基酮、乙醯丙酮、環己酮等酮類;苯、甲苯、二甲苯、乙基醯胺等芳香族烴;二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮等醯胺類,可使用該等溶劑中之一種或兩種以上。 The dispersion medium may be any solvent which can disperse the particulate material, and for example, water; methanol, ethanol, 1-propanol, 2-propanol, butanol, octanol or the like; Ester, butyl acetate, ethyl lactate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, γ-butyrolactone and other esters; diethyl ether, ethylene glycol monomethyl ether (methyl cellosolve Ethylene glycol monoethyl ether (ethyl cellosolve), ethylene glycol monobutyl ether (butyl cellosolve), diethylene glycol monomethyl ether, diethylene glycol monoethyl ether and other ethers; acetone, methyl Ketones such as ethyl ketone, methyl isobutyl ketone, acetamidine acetone, cyclohexanone; aromatic hydrocarbons such as benzene, toluene, xylene, and ethyl decylamine; dimethylformamide, N, N-di A guanamine such as methyl acetamide or N-methylpyrrolidone may be used alone or in combination of two or more.

又,為了粒子材料之分散性提高或分散液之穩定性,本發明之分散液亦可在無損其特性之範圍內含有分散劑、表面處理劑、水溶性黏合劑等(分散劑等)。 Further, in order to improve the dispersibility of the particulate material or the stability of the dispersion, the dispersion of the present invention may contain a dispersant, a surface treatment agent, a water-soluble binder, or the like (dispersant or the like) within a range that does not impair the properties thereof.

作為分散劑或表面處理劑,可較佳地使用:陽離子性界面活性劑、陰離子性界面活性劑、非離子性界面活性劑,有機烷氧基矽烷或有機氯矽烷等矽烷偶合劑,聚伸乙基亞胺系高分子分散劑、聚胺基甲酸酯系高分子分散劑、聚烯丙胺系高分子分散劑等高分子分散劑,該等分散劑或表面處理劑只要根據複合微粒子之粒徑或目標分散介質之種類而適宜選擇即可,亦可混合上述分散劑中之一種或兩種以上而使用。作為水溶性黏合劑,可使用聚乙烯醇(PVA,polyvinyl alcohol)、聚乙烯基吡咯啶酮(PVP,polyvinyl pyrrolidone)、羥基纖維素、聚丙烯酸等。 As the dispersing agent or surface treating agent, a cationic surfactant, an anionic surfactant, a nonionic surfactant, a decane coupling agent such as an organoalkoxysilane or an organochlorodecane, and a condensing agent B can be preferably used. A polymer dispersant such as a polyimide-based polymer dispersant, a polyurethane-based polymer dispersant, or a polyallylamine-based polymer dispersant, and the dispersant or surface treatment agent is only required to have a particle diameter according to the composite fine particles. The type of the target dispersion medium may be appropriately selected, and one or two or more kinds of the above-mentioned dispersing agents may be used in combination. As the water-soluble binder, polyvinyl alcohol (PVA, polyvinyl alcohol), polyvinyl pyrrolidone (PVP), hydroxy cellulose, polyacrylic acid or the like can be used.

作為分散液中之調配量,較佳為分散劑等(固形物成分量)之總量相對於粒子材料為1~15質量%之範圍內,更佳為2~10質量%之範圍內。 The amount of the dispersing agent or the like (the amount of the solid content component) is preferably in the range of 1 to 15% by mass, more preferably 2 to 10% by mass, based on the particle material.

作為用以實施分散處理之方法,可單獨使用或組合使用公知之分散裝置,例如可單獨使用或組合使用珠磨機、奈米級研磨機(Nanomizer)、噴射磨機、均質機、行星研磨機、超音波分散器等。其中,可較佳地使用藉由珠粒徑之選擇而易於控制分散粒徑之珠磨機。作為分散處理所需之時間,只要為對使粒子材料均勻地分散於分散介質中所充分之時間即可。 As a method for carrying out the dispersion treatment, a known dispersion device may be used singly or in combination, and for example, a bead mill, a nanomizer, a jet mill, a homogenizer, a planetary mill may be used alone or in combination. , ultrasonic disperser, etc. Among them, a bead mill which can easily control the dispersed particle diameter by the selection of the bead diameter can be preferably used. The time required for the dispersion treatment may be any time sufficient for uniformly dispersing the particulate material in the dispersion medium.

[3.聚矽氧樹脂組合物] [3. Polyoxyl resin composition]

本發明之聚矽氧樹脂組合物係至少包含上述本發明之表面修飾金屬氧化物粒子材料、及含有選自苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上之聚矽氧樹脂形成成分而成,且該聚矽氧樹脂形成成分係具有可與上述表面修飾金屬氧化物粒子材料中使用之表面修飾材料所具有之基進行交聯反應之官能基的組合物。 The polyoxyxylene resin composition of the present invention comprises at least the surface-modified metal oxide particle material of the present invention and a component selected from the group consisting of a phenyl polyoxyl resin-forming component and a methylphenyl-polyoxyl resin-forming component. The above polyoxyxylene resin is formed into a component, and the polyoxyxylene resin forming component has a combination of functional groups capable of crosslinking reaction with a group of a surface modifying material used in the surface-modified metal oxide particle material. Things.

再者,此處所謂「樹脂組合物」係因具有流動性而不具有特定之形狀而具有若一旦變形則無法恢復為原本形狀之不可逆之變形性者,且係成為下述透明樹脂複合體之原料者。作為該樹脂組合物之狀態,例如可例示於液狀或具有搖變性之凝膠狀之狀態者。又,所謂「樹脂形成成分」,係用以形成下述樹脂複合體中之樹脂成分之成分,通常為樹脂成分之單體、低聚物或預聚物,且包含液狀者。 In addition, the "resin composition" is a non-reversible deformability that cannot be restored to its original shape when it is deformed because it has fluidity, and is a transparent resin composite described below. Raw materials. The state of the resin composition can be, for example, a liquid state or a gel state having a shaken property. In addition, the "resin forming component" is a component for forming a resin component in the following resin composite, and is usually a monomer, oligomer or prepolymer of a resin component, and contains a liquid.

此處,作為本發明之聚矽氧樹脂組合物中所使用之聚矽氧樹脂形成成分,只要含有選自苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上,且具有可與上述表面修飾金屬氧化物粒子材料中使用之表面修飾材料所具有之基(交聯反應基)進行交聯反應之官能基,則並無特別限定。另一方面,如上所述,作為交聯反應,較佳為矽氫化反應,作為供於該矽氫化反應之交聯反應基,較佳為烯基、氫基。就該方面而言,作為表面修飾金屬氧化物粒子材料與聚矽氧樹脂形成成分之較佳之組合,可列舉下述者。 Here, the polyoxyphthalocene resin forming component used in the polyoxyxylene resin composition of the present invention contains one selected from the group consisting of a phenylpolyoxyl resin forming component and a methylphenylpolyoxyl resin forming component. The functional group which can be crosslinked with the group (crosslinking reactive group) of the surface modifying material used in the surface-modified metal oxide particle material is not particularly limited. On the other hand, as described above, as the crosslinking reaction, a hydrogenation reaction is preferred, and as the crosslinking reaction group to be supplied to the hydrogenation reaction, an alkenyl group or a hydrogen group is preferred. In this respect, as a preferable combination of the surface-modified metal oxide particle material and the polyoxynoxy resin-forming component, the following may be mentioned.

(1)於表面修飾金屬氧化物粒子材料中之交聯反應基為烯基之情形時:具有氫基之聚矽氧樹脂形成成分。 (1) When the crosslinking reaction group in the surface-modified metal oxide particle material is an alkenyl group: a polyfluorene-oxygen resin-forming component having a hydrogen group.

(2)於表面修飾金屬氧化物粒子材料中之交聯反應基為氫基之情形時:具有選自烯基及炔基中之一種以上之聚矽氧樹脂形成成分。 (2) When the crosslinking reaction group in the surface-modified metal oxide particle material is a hydrogen group: a polyfluorene oxide resin-forming component having one or more selected from the group consisting of an alkenyl group and an alkynyl group.

(3)於表面修飾金屬氧化物粒子材料中之交聯反應基為烯基及氫基之情形時:具有選自烯基及炔基中之一種以上以及氫基之聚矽氧樹 脂形成成分。 (3) When the crosslinking reaction group in the surface-modified metal oxide particle material is an alkenyl group and a hydrogen group: a polyoxygen tree having one or more selected from an alkenyl group and an alkynyl group and a hydrogen group Lipid forming ingredients.

聚矽氧樹脂組合物中之金屬氧化物粒子之含量相對於表面修飾金屬氧化物粒子及聚矽氧樹脂形成成分之合計量為5質量%以上。若含量未達5質量%,則使該樹脂組合物硬化而成之聚矽氧樹脂複合體之透氣性降低效果減少,故而變得無法獲得由含有金屬氧化物粒子而產生之實質性效果。該含量較佳為20~80質量%,更佳為30~70質量%。再者,此處,金屬氧化物粒子之含量不包含表面修飾材料。 The total amount of the metal oxide particles in the polyoxyxene resin composition is 5% by mass or more based on the total amount of the surface-modified metal oxide particles and the polyoxymethylene resin-forming component. When the content is less than 5% by mass, the effect of reducing the gas permeability of the polyoxymethylene resin composite obtained by curing the resin composition is reduced, so that a substantial effect due to the inclusion of the metal oxide particles cannot be obtained. The content is preferably from 20 to 80% by mass, more preferably from 30 to 70% by mass. Further, here, the content of the metal oxide particles does not include a surface modifying material.

(聚矽氧樹脂形成成分) (Polyoxygenated resin forming component)

聚矽氧樹脂形成成分含有選自苯基聚矽氧樹脂形成性成分及甲基苯基聚矽氧樹脂形成成分中之一種以上。 The polyoxyphthalocene resin-forming component contains at least one selected from the group consisting of a phenylpolyoxyl resin-forming component and a methylphenylpolyoxyl resin-forming component.

作為苯基聚矽氧樹脂形成成分,可列舉矽氧烷聚合物中配置有苯基者。作為甲基苯基聚矽氧樹脂形成成分,可列舉矽氧烷聚合物中配置有苯基與甲基(烷基)者。又,此外亦有將配置有苯基之矽氧烷結構與環氧基或其他之烴組合而成之改性聚矽氧樹脂。作為結構,除直鏈狀以外,有二維結構之鏈狀者或三維網狀結構之樹脂、籠型結構等。 Examples of the phenylpolyoxyl resin forming component include those in which a phenyl group is disposed in a siloxane polymer. Examples of the methylphenyl polyfluorene resin forming component include a phenyl group and a methyl group (alkyl group) in the siloxane polymer. Further, there is also a modified polyxanthoxy resin in which a phenyl alkoxy structure having a phenyl group is combined with an epoxy group or another hydrocarbon. As the structure, in addition to the linear shape, there are a chain of two-dimensional structures, a resin of a three-dimensional network structure, a cage structure, and the like.

苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分可單獨使用,亦可組合使用(以下,有時將苯基聚矽氧樹脂形成成分、甲基苯基聚矽氧樹脂形成成分及將兩種成分組合而成者一併稱為「(甲基)苯基聚矽氧樹脂形成成分」)。又,可將具有如上所述之各種結構者進行組合,亦可進而添加如上所述之改性聚矽氧樹脂。 The phenylpolyoxyl resin forming component and the methylphenyl polyoxynene resin forming component may be used singly or in combination (hereinafter, a phenylpolyoxyl resin is sometimes formed into a component, and a methylphenyl polyoxyl resin is sometimes used. The component and the combination of the two components are collectively referred to as "(meth)phenyl polyfluorene resin forming component"). Further, those having various structures as described above may be combined, and the modified polyxanthoxy resin as described above may be further added.

首先,上述具有氫基之聚矽氧樹脂形成成分係含有選自上述苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上,且進而具有氫基者。再者,所謂氫基,意指形成聚矽氧樹脂形成成分之矽氧烷聚合物之與Si直接鍵結之H(氫)、即Si-H鍵中之H(氫)。又,有時將氫基記作「Si-H基」。 First, the polyanthracene oxide-forming component having a hydrogen group contains one or more selected from the group consisting of the phenylpolyoxyl resin-forming component and the methylphenylpolysiloxane-forming component, and further has a hydrogen group. Further, the hydrogen group means H (hydrogen) which is directly bonded to Si, that is, H (hydrogen) in the Si-H bond, which forms a polyoxyalkylene resin forming component of a polyoxyxylene resin. Further, the hydrogen group may be referred to as "Si-H group".

此處,於上述聚矽氧樹脂形成成分中,亦可除(甲基)苯基聚矽氧樹脂形成成分以外含有其他聚矽氧樹脂形成成分。即,所謂本發明中之聚矽氧樹脂形成成分具有氫基,意指可於(甲基)苯基聚矽氧樹脂形成成分中含有氫基,可於其他聚矽氧樹脂形成成分中含有氫基(有時將該聚矽氧樹脂形成成分稱為「氫聚矽氧樹脂形成成分」),進而亦可於該兩者中含有氫基。 Here, in the polyfluorene resin forming component, other polyoxyphthalocene resin forming components may be contained in addition to the (meth) phenylpolyfluorene resin forming component. In other words, the polyanthracene resin forming component in the present invention has a hydrogen group, and means that a hydrogen group can be contained in the (meth)phenyl polyfluorene resin forming component, and hydrogen can be contained in other polyoxyn resin forming components. The base (may be referred to as a "hydrogen oxime resin forming component"), and further may contain a hydrogen group in both of them.

根據該聚矽氧樹脂組合物,藉由使聚矽氧樹脂形成成分中之氫基與表面修飾材料之烯基進行交聯反應而一體化,可防止聚合硬化過程中之表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂之相分離,進而使表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂靠近,藉此可縮小聚矽氧樹脂複合體中之間隙,抑制透氣性。 According to the polyoxyxylene resin composition, the surface-modified metal oxide particles in the polymerization hardening process can be prevented by integrating the hydrogen group in the polyoxonium resin forming component and the alkenyl group of the surface modifying material by crosslinking reaction. The phase separation of the material from the matrix polyoxyl resin further brings the surface-modified metal oxide particle material closer to the matrix polyoxyl resin, thereby reducing the gap in the polyoxymethylene resin composite and suppressing the gas permeability.

作為上述於(甲基)苯基聚矽氧樹脂形成成分中含有氫基者,例如可列舉於一個矽氧烷聚合物中至少配置有苯基與氫基者。並且,只要為滿足該條件者,則可為於一個矽氧烷聚合物中任意配置有苯基與氫基者。就聚合反應性之方面而言,較佳為於一個矽氧烷聚合物中配置兩個以上之氫基。 In the case where the hydrogen group is contained in the (meth) phenyl polyfluorene resin forming component, for example, at least a phenyl group and a hydrogen group are disposed in one siloxane polymer. Further, as long as the condition is satisfied, a phenyl group and a hydrogen group may be arbitrarily disposed in one of the siloxane polymers. In terms of polymerization reactivity, it is preferred to dispose two or more hydrogen groups in one siloxane polymer.

另一方面,作為上述氫聚矽氧樹脂形成成分,可列舉矽氧烷聚合物之與Si鍵結之基之一部分為氫(氫基:Si-H鍵)者。就聚合反應性之方面而言,較佳為於一個矽氧烷聚合物中配置兩個以上之氫基。再者,作為與Si鍵結之氫基以外之基,通常為甲基等烷基,但亦可為組合有環氧基或其他烴之改性聚矽氧,作為結構,除直鏈狀以外,亦可為二維結構之鏈狀者或三維網狀結構、籠型結構等。 On the other hand, examples of the hydrogen polyoxynene resin forming component include hydrogen (hydrogen group: Si-H bond) in which a part of the Si-bonded base of the siloxane polymer is hydrogen. In terms of polymerization reactivity, it is preferred to dispose two or more hydrogen groups in one siloxane polymer. Further, the group other than the hydrogen group bonded to Si is usually an alkyl group such as a methyl group, but may be a modified polyfluorene oxygen in which an epoxy group or another hydrocarbon is combined, and has a structure other than a linear chain. It can also be a chain of two-dimensional structures or a three-dimensional network structure, a cage structure, and the like.

其次,上述具有選自烯基及炔基中之一種以上之聚矽氧樹脂形成成分含有選自上述苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上,且進而具有選自烯基及炔基中之一種以上之基。 In the above, the polyanthracene resin forming component having one or more selected from the group consisting of an alkenyl group and an alkynyl group contains at least one selected from the group consisting of the phenylpolyoxyl resin forming component and the methylphenyl polyfluorene resin forming component. Further, it has one or more selected from the group consisting of an alkenyl group and an alkynyl group.

此處,於上述聚矽氧樹脂形成成分中,亦可除(甲基)苯基聚矽氧樹脂形成成分以外含有其他聚矽氧樹脂形成成分。即,所謂本發明中之聚矽氧樹脂形成成分具有選自烯基及炔基中之一種以上之基,意指可於(甲基)苯基聚矽氧樹脂形成成分中含有選自烯基及炔基中之一種以上之基,可於其他聚矽氧樹脂形成成分中含有選自烯基及炔基中之一種以上之基(有時將該聚矽氧樹脂形成成分稱為「含烯基/炔基之聚矽氧樹脂形成成分」),進而亦可於該兩者中含有選自烯基及炔基中之一種以上之基。 Here, in the polyfluorene resin forming component, other polyoxyphthalocene resin forming components may be contained in addition to the (meth) phenylpolyfluorene resin forming component. In other words, the polyoxyphthalocene resin-forming component in the present invention has one or more selected from the group consisting of an alkenyl group and an alkynyl group, and means that the (meth) phenyl polyfluorene resin-forming component contains an alkenyl group. And one or more of the alkynyl groups may contain one or more selected from the group consisting of an alkenyl group and an alkynyl group in the other polyoxo-oxygen resin-forming component (sometimes the polyoxy-oxyl resin-forming component is referred to as an "alkenyl group". The polyoxymethylene resin forming component of the acetylene group may further contain one or more selected from the group consisting of an alkenyl group and an alkynyl group.

根據該聚矽氧樹脂組合物,藉由使聚矽氧樹脂形成成分之烯基或炔基與表面修飾材料之氫基利用交聯反應(矽氫化反應)鍵結而一體化,可防止聚合硬化過程中之表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂之相分離,進而使表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂靠近,藉此可縮小聚矽氧樹脂複合體中之間隙,抑制透氣性。 According to the polyoxyxylene resin composition, the alkenyl group or the alkynyl group which forms a component of the polyoxyxylene resin and the hydrogen group of the surface modifying material are bonded by a crosslinking reaction (hydrazine hydrogenation reaction) to prevent polymerization hardening. The phase-modified metal oxide particle material in the process is separated from the matrix polyoxyxene resin, thereby bringing the surface-modified metal oxide particle material close to the matrix polyoxyl resin, thereby narrowing the gap in the polyoxymethylene resin composite. , inhibits breathability.

作為於上述(甲基)苯基聚矽氧樹脂形成成分中具有選自烯基及炔基中之一種以上之基者,例如可列舉:於一個矽氧烷聚合物中至少配置有苯基以及選自烯基及炔基中之一種以上之基者。並且,只要為滿足該條件者,則可為於一個矽氧烷聚合物中任意地配置有苯基以及選自烯基及炔基中之一種以上之基者。就聚合反應性之方面而言,較佳為於一個矽氧烷聚合物中配置有兩個以上之烯基或炔基。 In the above-mentioned (meth) phenyl polyfluorene resin forming component, one or more selected from the group consisting of an alkenyl group and an alkynyl group, for example, at least a phenyl group and at least one siloxane group are disposed. One or more bases selected from the group consisting of alkenyl groups and alkynyl groups. In addition, as long as the condition is satisfied, one of a phenyl group and one or more selected from the group consisting of an alkenyl group and an alkynyl group may be optionally disposed in one siloxane polymer. In terms of polymerization reactivity, it is preferred to dispose two or more alkenyl groups or alkynyl groups in one siloxane polymer.

作為該烯基,可列舉:乙烯基、烯丙基、丁烯基、戊烯基、己烯基,尤佳為乙烯基。又,作為炔基,可列舉:乙炔基、丙炔基(propynyl)。並且,該等烯基或炔基可任意地組合。例如,通常於一個矽氧烷聚合物中配置有苯基及乙烯基,但並不限定於此,亦可於一個矽氧烷聚合物中配置有苯基、乙烯基(烯基)及乙炔基(炔基)。又,亦可組合於一個矽氧烷聚合物中配置有苯基及乙烯基(烯基)、且於另一矽氧烷聚合物中配置有苯基及乙炔基(炔基)者而使用等。 The alkenyl group may, for example, be a vinyl group, an allyl group, a butenyl group, a pentenyl group or a hexenyl group, and more preferably a vinyl group. Further, examples of the alkynyl group include an ethynyl group and a propynyl group. Also, the alkenyl or alkynyl groups may be arbitrarily combined. For example, a phenyl group and a vinyl group are usually disposed in one siloxane polymer, but it is not limited thereto, and a phenyl group, a vinyl group (alkenyl group), and an ethynyl group may be disposed in one siloxane polymer. (alkynyl). Further, it may be used in combination with a phenyl group and a vinyl group (alkenyl group) in one oxoxane polymer and a phenyl group and an ethynyl group (alkynyl group) in another oxoxane polymer. .

又,作為上述含烯基/炔基之聚矽氧樹脂形成成分,可列舉於矽氧烷聚合物中配置有選自烯基及炔基中之一種以上之基者。矽氧烷聚合物中之烯基或炔基之位置並無特別限定,可配置於任意位置,進而,就聚合反應性之方面而言,較佳為於一個矽氧烷聚合物中配置有兩個以上之烯基或炔基。又,亦可為組合有環氧基或其他烴之改性聚矽氧。其分子結構可例示直鏈狀、一部分具有支鏈之直鏈狀、支鏈狀者、環狀者、樹脂狀者,尤佳為直鏈狀或一部分具有支鏈之直鏈狀者。 In addition, examples of the alkenyl group-containing alkynyl group-forming polyoxymethylene resin component include a base selected from the group consisting of an alkenyl group and an alkynyl group. The position of the alkenyl group or the alkynyl group in the siloxane polymer is not particularly limited, and may be disposed at any position. Further, in terms of polymerization reactivity, it is preferred to dispose two in one siloxane polymer. More than one alkenyl or alkynyl group. Further, it may be a modified polyoxane combined with an epoxy group or other hydrocarbons. The molecular structure may, for example, be a linear chain, a part of a linear chain having a branch, a branch, a ring, or a resin, and more preferably a linear or a part of a linear chain having a branch.

再者,烯基或炔基之組合係與上述(甲基)苯基聚矽氧樹脂形成成分中具有選自烯基及炔基中之一種以上之基者同樣為任意,並無特別限定。進而,例如亦可組合具有烯基之苯基聚矽氧樹脂形成成分與具有炔基之含烯基等之聚矽氧樹脂形成成分。 In addition, the combination of the alkenyl group or the alkynyl group is not particularly limited as long as it has one or more selected from the group consisting of an alkenyl group and an alkynyl group in the component (meth) phenyl polyfluorene resin. Further, for example, a polyphenylene oxide resin-forming component having an alkenyl group-containing phenylpolyfluorene resin-forming component and an alkynyl group-containing alkenyl group may be combined.

又,上述具有選自烯基及炔基中之一種以上以及氫基之聚矽氧樹脂形成成分係將上述具有氫基之聚矽氧樹脂形成成分、及上述具有選自烯基及炔基中之一種以上之聚矽氧樹脂形成成分組合而成者。本聚矽氧樹脂形成成分中之選自烯基及炔基中之一種以上與氫基之組合或配置為任意,例如可為於一個矽氧烷聚合物中具有選自烯基及炔基中之一種以上以及氫基者,亦可為混合有具有選自烯基及炔基中之一種以上之聚矽氧樹脂形成成分與具有氫基之聚矽氧樹脂形成成分者。 Further, the polyanthracene oxide-forming component having one or more selected from the group consisting of an alkenyl group and an alkynyl group and a hydrogen group is a component of the above-mentioned polyfluorene oxide-forming resin having a hydrogen group, and the above-mentioned one having an alkenyl group and an alkynyl group. One or more kinds of polyoxyxylene resin forming components are combined. The combination or arrangement of one or more selected from the group consisting of alkenyl groups and alkynyl groups in the polyoxynene resin forming component and the hydrogen group is arbitrary, and for example, it may be selected from an alkenyl group and an alkynyl group in one alkoxyalkylene polymer. One or more of them and a hydrogen group may be a mixture of a polyfluorene-oxygen resin-forming component having one or more selected from the group consisting of an alkenyl group and an alkynyl group, and a polyfluorene-oxygen resin having a hydrogen group.

本發明之聚矽氧樹脂組合物存在如下情形:作為樹脂成分,至少含有(甲基)苯基聚矽氧樹脂形成成分,且包含具有可與表面修飾金屬氧化物粒子材料中使用之表面修飾材料所具有之基進行交聯反應之官能基的聚矽氧樹脂形成成分,進而含有用以形成基質聚矽氧樹脂所需之聚矽氧樹脂形成成分。各成分之組合只要該各成分具有相溶性,則並無特別限定。 The polyoxyxylene resin composition of the present invention has a case where at least a (meth) phenylpolyfluorene resin forming component is contained as a resin component, and a surface modifying material having a surface-modified metal oxide particle material is used. The polyoxyxyl resin forming component having a functional group for performing a crosslinking reaction further contains a polyoxyxylene resin forming component required for forming a matrix polyoxyalkylene resin. The combination of each component is not particularly limited as long as the components are compatible.

未硬化之(甲基)苯基聚矽氧樹脂形成成分、或具有可進行交聯反 應之官能基之聚矽氧樹脂形成成分之折射率或黏度係根據矽氧烷聚合物之結構或鏈長、矽氧烷聚合物中之苯基或烷基之量或碳數等而變化,該等特性值亦反映於硬化後之聚矽氧樹脂。因此,藉由於未硬化之狀態下混合、調整複數種樹脂形成成分,而具有作為硬化後之基質聚矽氧樹脂所需之折射率,並且可獲得聚矽氧樹脂組合物之良好之成形性或作業性。進而,藉由除苯基聚矽氧樹脂形成成分與甲基苯基聚矽氧樹脂形成成分之組合、或與具有可進行交聯反應之官能基之聚矽氧樹脂形成成分之組合以外,亦調整添加之改性聚矽氧樹脂之種類或量等,可控制所獲得之聚矽氧樹脂複合體之硬度、觸黏性、與基材之密接性等特性。 Unhardened (methyl) phenyl polyfluorene resin forming component or having crosslinkable The refractive index or viscosity of the polyoxyxyl resin forming component of the functional group varies depending on the structure or chain length of the siloxane polymer, the amount of phenyl or alkyl group in the siloxane polymer, or the carbon number, etc. These characteristic values are also reflected in the hardened polyoxynoxy resin. Therefore, by mixing and adjusting a plurality of resin-forming components in an uncured state, it has a refractive index required as a matrix-polyoxyl resin after hardening, and good formability of the polyoxyxene resin composition can be obtained or Workability. Further, in addition to the combination of the phenyl polyoxyl resin forming component and the methylphenyl polyoxyl resin forming component or the polyoxyxyl resin forming component having a functional group capable of undergoing a crosslinking reaction, By adjusting the type or amount of the modified polyxanthene resin to be added, it is possible to control characteristics such as hardness, contact property, and adhesion to the substrate of the obtained polyoxymethylene resin composite.

再者,就成形性或作業性之方面等而言,於欲使聚矽氧樹脂組合物低黏度化之情形時,亦可添加與(甲基)苯基聚矽氧樹脂形成成分、或具有可進行交聯反應之官能基之聚矽氧樹脂形成成分具有相溶性,並且不阻礙表面修飾金屬氧化物粒子之分散性般的有機溶劑。作為此種有機溶劑,例如可列舉上述分散液中所使用之分散介質。 Further, in the case of the moldability or the workability, when the polyoxyxene resin composition is to have a low viscosity, it may be added with a (meth) phenyl polyfluorene resin or may have a component. The polyoxyxyl resin forming component of the functional group capable of crosslinking reaction has compatibility and does not inhibit the organic solvent of the surface-modified metal oxide particles. Examples of such an organic solvent include a dispersion medium used in the above dispersion liquid.

於硬化後之樹脂複合體中,作為形成基質聚矽氧樹脂之液狀(未硬化)之聚矽氧樹脂形成成分(基質聚矽氧樹脂形成成分),根據硬化之方法,可列舉加成硬化型聚矽氧組合物或縮合硬化型聚矽氧組合物。加成硬化型聚矽氧組合物係至少包含含有烯基及氫基之聚矽氧樹脂形成成分及鉑族金屬系觸媒而成之組合物,且上述烯基與氫基藉由加成反應(矽氫化反應)而鍵結,藉此聚矽氧樹脂形成成分彼此聚合而硬化。 In the resin composite after hardening, as a liquid (unhardened) polyoxyl resin forming component (matrix polyoxyl resin forming component) which forms a matrix polyoxyn resin, according to the hardening method, addition hardening is mentioned A polyoxygenated composition or a condensed hardening polydecaneoxy composition. The addition-hardening polyoxymethylene composition is a composition comprising at least an alkenyl group and a hydrogen group-containing polyanthracene resin-forming component and a platinum group-based catalyst, and the alkenyl group and the hydrogen group are reacted by addition reaction. (矽 hydrogenation reaction) and bonding, whereby the polyoxymethylene resin forming components are polymerized and hardened.

縮合硬化型聚矽氧組合物係至少包含分子鏈末端經羥基或水解性基封阻之聚矽氧樹脂形成成分、1分子中含有3個以上與矽原子鍵結之可水解之基之矽烷化合物、及含有胺氧基、胺基、酮肟基等之縮合觸媒而成的組合物,藉由上述羥基或水解性基與可水解之基產生脫水 等縮合反應而鍵結,從而使聚矽氧樹脂形成成分與矽烷化合物聚合而硬化。因此,作為聚矽氧樹脂形成成分,係至少包含分子鏈末端經羥基或水解性基封阻之聚矽氧樹脂形成成分、1分子中含有3個以上與矽原子鍵結之可水解之基之矽烷化合物、及含有胺氧基、胺基、酮肟基等之縮合觸媒而成的組合物。再者,如上所述,於該等聚矽氧樹脂形成成分中配置有苯基或甲基(烷基)。 The condensation-hardening polyoxosiloxane composition is a polydecane-oxygen resin-forming component having at least a terminal of a molecular chain blocked by a hydroxyl group or a hydrolyzable group, and a decane compound containing at least three hydrolyzable groups bonded to a ruthenium atom in one molecule. And a composition comprising a condensation catalyst of an aminooxy group, an amine group, a ketoximino group or the like, which is dehydrated by the above hydroxyl group or a hydrolyzable group and a hydrolyzable group The condensation reaction is carried out to bond, so that the polyoxyphthalocene resin forming component is polymerized with the decane compound to be hardened. Therefore, the polyoxon resin-forming component contains at least a polyfluorene-oxygen resin-forming component whose molecular chain terminal is blocked by a hydroxyl group or a hydrolyzable group, and one molecule containing three or more hydrolyzable groups bonded to a ruthenium atom. A composition of a decane compound and a condensation catalyst containing an amineoxy group, an amine group, a ketoximino group or the like. Further, as described above, a phenyl group or a methyl group (alkyl group) is disposed in the polyoxyphthalocene resin forming component.

作為本發明中之基質聚矽氧樹脂形成成分,可選擇加成硬化型與縮合硬化型中之任一者。 As the matrix polyoxymethylene resin forming component in the present invention, either of an addition hardening type and a condensation hardening type can be selected.

另一方面,於本發明中,使聚矽氧樹脂形成成分之可進行交聯反應之官能基與表面修飾材料之交聯反應基(烯基、炔基、氫基)藉由交聯反應而一體化,可防止表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂之相分離,使表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂靠近而抑制透氣性。此處,該交聯反應與上述加成硬化型之加成反應(矽氫化反應)可根據該反應基或反應狀態而理解,為相同之反應。因此,只要選擇加成硬化型者作為基質聚矽氧樹脂形成成分或反應觸媒,則可同時且利用單一之反應方法進行表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂之藉由交聯而進行之一體化、及基質聚矽氧樹脂本身之硬化,故而較佳。又,若為加成硬化型,則於聚合時不會產生水等副產物,故而無需去除由混合存在有副產物所產生之影響或副產物而亦較佳。 On the other hand, in the present invention, the crosslinkable reactive group (alkenyl group, alkynyl group, hydrogen group) of the functional group capable of undergoing the crosslinking reaction of the polyfluorene oxide forming component and the surface modifying material is subjected to a crosslinking reaction. The integration prevents the phase-modified metal oxide particle material from separating from the matrix polyoxyl resin, and the surface-modified metal oxide particle material is adjacent to the matrix polyoxyl resin to suppress gas permeability. Here, the addition reaction of the crosslinking reaction with the addition hardening type (hydrazine hydrogenation reaction) can be understood from the reaction group or the reaction state, and is the same reaction. Therefore, as long as the additive hardening type is selected as the matrix polyoxyl resin forming component or the reaction catalyst, the surface modified metal oxide particle material and the matrix polyoxyl resin can be crosslinked at the same time by a single reaction method. It is preferred to carry out the integration and hardening of the matrix polyoxyl resin itself. Further, in the case of the addition curing type, by-products such as water are not generated during the polymerization, and it is also preferable to remove the influence or by-products caused by the presence of by-products in the mixture.

進而,如上所述,若使用修飾擔載有烯基及氫基兩者之金屬氧化物粒子,則不僅可使金屬氧化物粒子表面之烯基與基質聚矽氧樹脂形成成分中之氫基進行交聯反應,而且金屬氧化物粒子表面之氫基與基質聚矽氧樹脂形成成分中之烯基(或炔基)亦可進行交聯反應,因此,可進一步實現金屬氧化物粒子與基質聚矽氧樹脂之一體化。 Further, as described above, when the metal oxide particles supporting both the alkenyl group and the hydrogen group are modified, not only the alkenyl group on the surface of the metal oxide particles but also the hydrogen group in the matrix polyoxo resin forming component can be used. The crosslinking reaction, and the hydrogen group on the surface of the metal oxide particles and the alkenyl group (or alkynyl group) in the matrix polyoxo resin forming component can also be cross-linked, thereby further realizing the metal oxide particles and the matrix. Integration of oxygen resin.

再者,若選擇縮合硬化型作為基質聚矽氧樹脂形成成分,則有 可分別控制表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂之鍵結、及基質聚矽氧樹脂之硬化之優勢。但是,於該情形時,必需首先利用交聯反應(與加成硬化型之情形相同)使表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂鍵結,在此基礎上使基質聚矽氧樹脂縮合硬化。其原因在於:於表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂未鍵結之狀態下使基質聚矽氧樹脂硬化之情形時,有產生表面修飾金屬氧化物粒子材料之凝聚或相分離而無法獲得良好之聚矽氧樹脂複合體之虞。 Furthermore, if a condensation hardening type is selected as the matrix polyoxyl resin forming component, there is The advantages of the bonding of the surface-modified metal oxide particle material to the matrix polyoxyl resin and the hardening of the matrix polyoxyl resin can be separately controlled. However, in this case, it is necessary to first bond the surface-modified metal oxide particle material to the matrix polyoxyl resin by using a crosslinking reaction (the same as in the case of the addition curing type), on the basis of which the matrix polyoxyl resin is used. Condensation hardening. The reason for this is that when the surface-modified metal oxide particle material and the matrix polyoxyl resin are not bonded, the matrix polyoxyl resin is hardened, and the surface-modified metal oxide particle material is agglomerated or phase-separated. There is no way to obtain a good polyoxymethylene resin composite.

(矽氫化觸媒) (矽hydrogenation catalyst)

於本發明中,使聚矽氧樹脂形成成分之可進行交聯反應之官能基與表面修飾材料之交聯反應基藉由交聯反應(矽氫化反應)而一體化。因此,本發明之聚矽氧樹脂組合物較佳為含有矽氫化觸媒。 In the present invention, the crosslinking reaction group of the functional group capable of undergoing the crosslinking reaction of the polyfluorene resin forming component and the surface modifying material is integrated by a crosslinking reaction (hydrazine hydrogenation reaction). Therefore, the polyoxyxylene resin composition of the present invention preferably contains a rhodium hydrogenation catalyst.

作為本發明中之矽氫化反應用觸媒,可例示鉑系觸媒、銠系觸媒、鈀系觸媒,尤其是就順利地進行矽氫化反應之方面而言,較佳為鉑系觸媒。作為該鉑系觸媒,可例示:氯鉑酸、氯鉑酸之醇溶液、鉑之烯烴錯合物、鉑之烯基矽氧烷錯合物。 The catalyst for the hydrogenation reaction in the present invention may, for example, be a platinum-based catalyst, a ruthenium-based catalyst or a palladium-based catalyst. In particular, in terms of a smooth hydrogenation reaction, a platinum-based catalyst is preferred. . Examples of the platinum-based catalyst include chloroplatinic acid, an alcohol solution of chloroplatinic acid, an olefin complex of platinum, and an alkenyl alkoxylate complex of platinum.

該矽氫化反應用觸媒之調配量只要為對使上述聚矽氧樹脂形成成分與含交聯反應基之表面修飾材料進行交聯反應所充分之量即可。具體而言,於使用鉑系觸媒作為該矽氫化反應用觸媒之情形時,較佳為鉑金屬之質量相對於上述含有烯基或炔基之聚矽氧樹脂形成成分與含有氫基之表面修飾材料之合計量成為0.1~100ppm般之量,尤其是就順利地進行矽氫化反應,並且不易於藉由反應所獲得之聚矽氧樹脂複合體中產生著色之方面而言,更佳為1~50ppm之範圍內之量。 The amount of the catalyst for the hydrogenation reaction may be an amount sufficient for crosslinking the surface-modified material of the polyfluorene resin-forming component and the surface-containing modifying material containing the crosslinking reaction group. Specifically, when a platinum-based catalyst is used as the catalyst for the hydrogenation reaction, it is preferred that the platinum metal has a mass relative to the above-mentioned alkenyl or alkynyl group-containing polyoxyl resin-forming component and hydrogen-containing group. The total amount of the surface-modifying materials is 0.1 to 100 ppm, particularly in terms of smooth hydrogenation reaction, and it is not easy to produce coloration in the polyoxymethylene resin composite obtained by the reaction, and more preferably Amount within the range of 1 to 50 ppm.

又,於選擇加成硬化型作為基質聚矽氧樹脂形成成分之情形時,由於基質聚矽氧樹脂之硬化亦取決於矽氫化反應,故而較佳為以符合上述條件之方式增加觸媒量。即鉑金屬之質量相對於含有烯基或 炔基之聚矽氧樹脂形成成分、含有氫基之聚矽氧樹脂形成成分、及含有氫基之表面修飾材料之合計量較佳為0.1~100ppm,若為1~50ppm則更佳。 Further, in the case where the addition curing type is selected as the matrix polyoxyl resin forming component, since the hardening of the matrix polyoxyl resin is also dependent on the hydrogenation reaction, it is preferred to increase the amount of the catalyst in such a manner as to satisfy the above conditions. That is, the quality of the platinum metal relative to the alkenyl group or The total amount of the alkynyl group-containing polyoxo resin forming component, the hydrogen group-containing polyoxynoxy resin forming component, and the hydrogen group-containing surface modifying material is preferably 0.1 to 100 ppm, more preferably 1 to 50 ppm.

進而,如上所述,於使用修飾擔載有氫基與烯基或炔基兩者之金屬氧化物粒子之情形時,由於金屬氧化物粒子表面之烯基或炔基與基質聚矽氧樹脂形成成分中之氫基亦進行交聯反應,故而較佳為同樣地增加觸媒量。即,鉑金屬之質量相對於含有烯基或炔基之聚矽氧樹脂形成成分、含有氫基之聚矽氧樹脂形成成分、含有氫基之表面修飾材料、及含有烯基或炔基之表面修飾材料之合計量較佳為0.1~100ppm,若為1~50ppm則更佳。 Further, as described above, when a metal oxide particle carrying a hydrogen group and an alkenyl group or an alkynyl group is modified, a base or alkynyl group on the surface of the metal oxide particle is formed with a matrix polyoxyl resin. Since the hydrogen group in the component also undergoes a crosslinking reaction, it is preferred to increase the amount of the catalyst in the same manner. That is, the mass of the platinum metal is relative to the polyoxyxylene resin-forming component containing an alkenyl group or an alkynyl group, the polyoxyxylene resin-forming component containing a hydrogen group, the surface-modifying material containing a hydrogen group, and the surface containing an alkenyl group or an alkyne group. The total amount of the modifying materials is preferably from 0.1 to 100 ppm, more preferably from 1 to 50 ppm.

於混合表面修飾金屬氧化物粒子材料與基質聚矽氧樹脂形成成分時,可列舉如下方法:將表面修飾金屬氧化物粒子材料直接導入至基質聚矽氧樹脂形成成分中,並利用混練機等機械地混合之方法;或如上述分散液之情形般,使表面修飾金屬氧化物粒子材料分散於有機溶劑等分散介質中而製成表面修飾金屬氧化物粒子材料分散液,將該分散液與基質聚矽氧樹脂形成成分利用攪拌機等進行混合,繼而去除有機溶劑等方法。 When the mixed surface-modified metal oxide particle material and the matrix polyoxyl resin are used as a component, a method of directly introducing the surface-modified metal oxide particle material into the matrix polyoxyl resin-forming component and using a machine such as a kneading machine is exemplified. a method of mixing the ground; or dispersing the surface-modified metal oxide particle material in a dispersion medium such as an organic solvent to form a surface-modified metal oxide particle material dispersion, and polymerizing the dispersion with the substrate The method of mixing the epoxy resin-forming component with a stirrer or the like, followed by removal of an organic solvent.

藉由利用上述任一方法將兩者混合,可獲得本發明之聚矽氧樹脂組合物。再者,本發明之聚矽氧樹脂組合物亦可為含有上述混合過程中所使用之有機溶劑等者。 The polydecane resin composition of the present invention can be obtained by mixing the two by any of the above methods. Further, the polyoxyxylene resin composition of the present invention may be one which contains an organic solvent or the like used in the above mixing process.

[4.聚矽氧樹脂複合體] [4. Polyoxyl resin composite]

本發明之聚矽氧樹脂複合體可藉由如下方式獲得:使上述本發明之聚矽氧樹脂組合物中之基質聚矽氧樹脂形成成分藉由加成反應或縮合反應等而聚合硬化,並且使金屬氧化物粒子之表面修飾材料與基質聚矽氧樹脂形成成分藉由交聯反應而鍵結,從而使表面修飾金屬氧化物粒子與基質聚矽氧樹脂一體化。 The polyoxyxylene resin composite of the present invention can be obtained by subjecting the matrix polyoxyl resin forming component in the above polyoxyxylene resin composition of the present invention to polymerization hardening by an addition reaction or a condensation reaction or the like, and The surface-modifying material of the metal oxide particles and the matrix polyoxyl resin-forming component are bonded by a crosslinking reaction to integrate the surface-modified metal oxide particles with the matrix polyoxy-resin.

此處,「樹脂複合體」雖具有特定之形狀,但該「具有特定之形狀」係指樹脂複合體不具有液狀、凝膠狀等之不可逆之變形性而顯示出可維持根據使用目的或方法之固定形狀。即,除通常之幾乎不會變形之固體狀以外,亦包括橡膠狀等具有彈性變形性(形狀復原性)者,並非形狀本身顯示出特定之形狀者。 Here, the "resin composite" has a specific shape, but the "specific shape" means that the resin composite does not have irreversible deformability such as liquid or gel, and can be maintained depending on the purpose of use or The fixed shape of the method. In other words, in addition to the solid shape which is hardly deformed in general, the elastic deformability (shape recovery property) such as rubber is also included, and the shape itself does not show a specific shape.

該聚矽氧樹脂複合體之形狀並無特別限定,其形狀只要根據用途進行選擇即可。此處,本發明中所使用之聚矽氧樹脂於藉由加成反應或聚合反應而硬化後,未顯示出如通常之樹脂所顯示之熱塑性或溶劑溶解性。因此,聚矽氧樹脂複合體之成形較佳為於使上述聚矽氧樹脂組合物硬化而製成聚矽氧樹脂複合體時進行,或藉由切削等機械加工對硬化後之聚矽氧樹脂複合體而進行。此處,對使聚矽氧樹脂組合物硬化而製成聚矽氧樹脂複合體時進行成形之情形進行說明。 The shape of the polyoxymethylene resin composite is not particularly limited, and the shape thereof may be selected according to the use. Here, the polyoxyxylene resin used in the present invention is hardened by an addition reaction or a polymerization reaction, and does not exhibit thermoplasticity or solvent solubility as indicated by a usual resin. Therefore, the formation of the polyoxyxene resin composite is preferably carried out when the polyfluorene oxide resin composition is cured to form a polyoxyxene resin composite, or the hardened polyoxyxene resin is processed by cutting or the like. The complex is carried out. Here, a case where the polyoxyxene resin composition is cured to form a polyoxyxene resin composite will be described.

首先,使用模具或模框使本發明之聚矽氧樹脂組合物成形,或者填充於模具或模框狀之容器中,藉此獲得成形為目標形狀之成形體或填充物。於該時間點,成形體或填充物為具有流動性之狀態。 First, the polyoxyxylene resin composition of the present invention is molded using a mold or a mold, or filled in a mold or a frame-shaped container, whereby a molded body or a filler formed into a target shape is obtained. At this point in time, the formed body or the filler is in a fluid state.

此時,於所使用之聚矽氧樹脂組合物之黏度較高而成形性較差之情形時,可預先添加有機溶劑等並進行攪拌、混合而使黏度降低,調整為適合於成形或填充之黏度。 In this case, when the viscosity of the polyoxyxene resin composition to be used is high and the formability is poor, an organic solvent or the like may be added in advance, and the mixture may be stirred and mixed to lower the viscosity, and adjusted to a viscosity suitable for molding or filling. .

另一方面,於所使用之聚矽氧樹脂組合物之黏度較低情形時,可藉由預先使基質聚矽氧樹脂形成成分之一部分或基質聚矽氧樹脂形成成分與表面修飾材料之一部分進行聚合或交聯而提高黏度,調整為適合於成形或填充之黏度。又,於聚矽氧樹脂組合物含有有機溶劑之情形時,亦可藉由使該有機溶劑之一部分或全部揮發等而去除,藉此提高黏度。進而,亦可將上述聚矽氧樹脂組合物作為母料混合於其他樹脂中使用。 On the other hand, in the case where the viscosity of the polyoxyxene resin composition to be used is low, it may be carried out by previously making a part of the matrix polyoxyl resin forming component or a part of the matrix polyoxyl resin forming component and the surface modifying material. Polymerization or cross-linking to increase the viscosity and adjust to a viscosity suitable for forming or filling. Further, when the polyoxyxene resin composition contains an organic solvent, it may be removed by partially or completely volatilizing one or more of the organic solvent, thereby increasing the viscosity. Further, the polyfluorene oxide resin composition may be used as a master batch in other resins.

繼而,藉由將該成形體或填充物直接於室溫(25℃左右)下或加溫 至特定之溫度(室溫~150℃、較佳為80℃~150℃)下靜置特定時間,或者對該成形體或填充物照射電子束或具有自紫外線區域至紅外線區域之任意波長之光線(活性能量線),而使該聚矽氧樹脂組合物中之基質聚矽氧樹脂形成成分藉由加成反應或聚合反應等而硬化,並且使金屬氧化物粒子之表面修飾材料與基質聚矽氧樹脂形成成分藉由交聯反應而鍵結,使表面修飾金屬氧化物粒子與基質聚矽氧樹脂一體化。 Then, by directly or heating the shaped body or filler at room temperature (about 25 ° C) Allowing to a specific temperature (room temperature ~ 150 ° C, preferably 80 ° C ~ 150 ° C) for a specific time, or irradiating the shaped body or filler with an electron beam or light having any wavelength from the ultraviolet region to the infrared region (active energy ray), wherein the matrix polyoxyl resin forming component in the polyoxyxene resin composition is hardened by an addition reaction or a polymerization reaction or the like, and the surface modification material of the metal oxide particles is condensed with the matrix. The oxygen resin forming component is bonded by a crosslinking reaction to integrate the surface-modified metal oxide particles with the matrix polyoxyalkylene resin.

再者,於該成形體或填充物中殘留有機溶劑之情形時,較佳為預先揮發去除該有機溶劑。 Further, in the case where an organic solvent remains in the molded body or the filler, it is preferred to volatilize the organic solvent in advance.

藉此,可獲得即便於將該成形體或填充物自模具或容器取出後施加外力亦可維持固定形狀之狀態的聚矽氧樹脂複合體。 Thereby, a polyoxymethylene resin composite in a state in which the molded body or the filler can be maintained in a fixed shape by applying an external force after being taken out from the mold or the container can be obtained.

再者,只要用途上無問題,則未必需要將聚矽氧樹脂複合體自模具或容器取出。例如,於下述光半導體發光裝置中,裝置本身係形成容器之形狀。 Furthermore, as long as there is no problem in use, it is not necessary to take out the polyoxymethylene resin composite from the mold or the container. For example, in the optical semiconductor light-emitting device described below, the device itself forms a shape of a container.

於將本發明之聚矽氧樹脂複合體用於光半導體發光裝置等之密封材料之情形時,其折射率較佳為高於1.54,更佳為1.56以上,若為1.58以上則進而較佳,若為1.6以上則最佳。藉由提高密封材料之折射率,可提高自光半導體發光裝置之光提取效率而高亮度化。 When the polyoxyxylene resin composite of the present invention is used for a sealing material of an optical semiconductor light-emitting device or the like, the refractive index thereof is preferably higher than 1.54, more preferably 1.56 or more, and further preferably 1.58 or more. If it is 1.6 or more, it is the best. By increasing the refractive index of the sealing material, the light extraction efficiency of the light-emitting semiconductor light-emitting device can be increased and the luminance can be increased.

又,將光程長度設為0.5mm之情形時之波長450nm下之透過率較佳為40%以上,更佳為60%以上,進而較佳為70%以上。若透過率在該範圍內,則例如於將聚矽氧樹脂複合體用作光學零件之情形時,可作為構成構件抑制透光損耗之降低。 Further, when the optical path length is 0.5 mm, the transmittance at a wavelength of 450 nm is preferably 40% or more, more preferably 60% or more, and still more preferably 70% or more. When the transmittance is within this range, for example, when a polyoxyxylene resin composite is used as an optical component, it is possible to suppress a decrease in light transmission loss as a constituent member.

聚矽氧樹脂複合體之折射率或透過率可藉由適當調整金屬氧化物粒子之種類或粒徑、基質聚矽氧樹脂之組成、聚矽氧樹脂複合體中之金屬氧化物粒子之量等而設為所需之範圍內。於本發明之聚矽氧樹脂複合體中,由於金屬氧化物粒子之表面修飾材料具有苯基,故而其本身高折射率化,從而表面修飾材料不會成為聚矽氧樹脂複合體之高 折射率化之阻礙。 The refractive index or transmittance of the polyoxyxene resin composite can be adjusted by appropriately adjusting the kind or particle diameter of the metal oxide particles, the composition of the matrix polyoxyl resin, the amount of the metal oxide particles in the polyoxyxene resin composite, and the like. Set to the desired range. In the polyoxyxene resin composite of the present invention, since the surface modification material of the metal oxide particles has a phenyl group, the refractive index itself is high, so that the surface modification material does not become a high polyoxymethylene resin composite. The inhibition of refractive index.

再者,上述聚矽氧樹脂複合體之折射率只要使用公知之方法進行測定即可,例如可藉由使用形成於鋁基板上之複合體(1mm厚),利用稜鏡耦合器於室溫下測定波長594nm之值而求出。後文中對透過率之測定方法進行說明。 Further, the refractive index of the polyoxyxene resin composite may be measured by a known method, and for example, by using a composite (1 mm thick) formed on an aluminum substrate, a tantalum coupler can be used at room temperature. The value of the wavelength of 594 nm was measured and found. The method of measuring the transmittance will be described later.

本發明之聚矽氧樹脂複合體之用途並無特別限制。尤其是可較佳地用作利用該聚矽氧樹脂複合體之上述優異特性之光學零件等。作為具備該光學零件之光學功能裝置,例如可例示各種顯示裝置(液晶顯示器或電漿顯示器等)、各種投影裝置(OHP(Over head Projector,投射燈單元)、液晶投影機等)、光纖通信裝置(光波導、光放大器等)、相機或攝像機等攝影裝置等、LED照明裝置等照明裝置等。 The use of the polyoxyxylene resin composite of the present invention is not particularly limited. In particular, it can be preferably used as an optical component or the like which utilizes the above-described excellent characteristics of the polyoxymethylene resin composite. Examples of the optical function device including the optical component include various display devices (such as a liquid crystal display or a plasma display), various projection devices (such as an OHP (Over Head Projector), a liquid crystal projector, and the like), and an optical fiber communication device. (optical waveguide, optical amplifier, etc.), an imaging device such as a camera or a video camera, an illumination device such as an LED illumination device, or the like.

[5.光半導體發光裝置] [5. Optical semiconductor light-emitting device]

本發明之光半導體發光裝置係藉由密封材料密封半導體發光元件而成,並且該密封材料包含本發明之聚矽氧樹脂複合體,且包含該密封材料之密封層之厚度成為50μm以上。若密封層之厚度未達50μm,則無法將透氣性抑制得充分低。密封層之厚度較佳為100μm以上,更佳為200μm以上。 The optical semiconductor light-emitting device of the present invention is obtained by sealing a semiconductor light-emitting device with a sealing material, and the sealing material comprises the polyoxymethylene resin composite of the present invention, and the thickness of the sealing layer containing the sealing material is 50 μm or more. If the thickness of the sealing layer is less than 50 μm, the gas permeability cannot be sufficiently suppressed. The thickness of the sealing layer is preferably 100 μm or more, and more preferably 200 μm or more.

關於本發明之密封層之構成,光半導體發光裝置之整個密封層可為本發明之聚矽氧樹脂複合體之層(第1態樣)、亦可光半導體發光裝置之密封層之一部分為本發明之聚矽氧樹脂複合體之層且積層有其他密封層(第2態樣)。又,該等密封層中亦可含有螢光體。 In the constitution of the sealing layer of the present invention, the entire sealing layer of the optical semiconductor light-emitting device may be a layer of the polyoxy-oxygen resin composite of the present invention (the first aspect), or may be a part of the sealing layer of the optical semiconductor light-emitting device. The layer of the polyoxymethylene resin composite of the invention is laminated with another sealing layer (second aspect). Further, the sealing layer may contain a phosphor.

由於本發明之光半導體發光裝置如上所述,密封層之阻氣性優異,故而可抑制例如設置於發光二極體(LED)封裝體內之鍍銀反射板之劣化,可將來自發光二極體封裝體之放射光之亮度保持為較高並減少其降低,因此可有效地用作具備其之照明裝置或液晶圖像裝置。 Since the optical semiconductor light-emitting device of the present invention has excellent gas barrier properties as described above, deterioration of, for example, a silver-plated reflector provided in a light-emitting diode (LED) package can be suppressed, and the light-emitting diode can be removed. The brightness of the emitted light of the package is kept high and the decrease thereof is reduced, so that it can be effectively used as an illumination device or a liquid crystal image device having the same.

對該光半導體發光裝置具體進行說明。再者,本發明並未特別 限定於下述例。 The optical semiconductor light-emitting device will be specifically described. Furthermore, the invention is not particularly Limited to the following examples.

本發明之第1態樣(發光裝置10)如圖1所示,於反射杯12之凹部12A配置發光元件14,以與發光元件14接觸並埋入凹部之方式形成藉由包含本發明之聚矽氧樹脂複合體之密封材料所構成之第1密封層16。 As shown in FIG. 1, the first aspect (light-emitting device 10) of the present invention is such that the light-emitting element 14 is disposed in the concave portion 12A of the reflector cup 12, and is formed in contact with the light-emitting element 14 and buried in the concave portion. The first sealing layer 16 composed of a sealing material of the epoxy resin composite.

藉由該裝置,自發光元件14所射出之光通過其與密封材料之邊界面後,通過密封材料內部,直接或由反射杯12之壁面反射而被提取至外部。 With this device, the light emitted from the light-emitting element 14 passes through the boundary surface with the sealing material, passes through the inside of the sealing material, and is directly or reflected by the wall surface of the reflecting cup 12 and is extracted to the outside.

作為構成發光裝置之發光元件,例如可列舉發光二極體(LED)及半導體雷射。此處,作為發光二極體,可例示:發出紅色光(例如波長640nm之光)之紅色發光二極體、發出綠色光(例如波長530nm之光)之綠色發光二極體、發出藍色光(例如波長450nm之光)之藍色發光二極體。發光二極體可具有所謂面朝上(Face-up)構造,亦可具有覆晶構造。即,發光二極體係包含基板、及形成於基板上之發光層,可設為使光自發光層向外部射出之構造,亦可設為來自發光層之光通過基板向外部射出之構造。 Examples of the light-emitting element constituting the light-emitting device include a light-emitting diode (LED) and a semiconductor laser. Here, as the light-emitting diode, a red light-emitting diode that emits red light (for example, light having a wavelength of 640 nm), a green light-emitting diode that emits green light (for example, light having a wavelength of 530 nm), and blue light can be exemplified ( For example, a blue light-emitting diode of light having a wavelength of 450 nm. The light-emitting diode may have a so-called face-up configuration or a flip-chip structure. In other words, the light-emitting diode system includes a substrate and a light-emitting layer formed on the substrate, and may have a structure in which light is emitted from the light-emitting layer to the outside, and a structure in which light from the light-emitting layer is emitted to the outside through the substrate.

更具體而言,發光二極體例如具有積層有形成於基板上之包含具有第1導電型(例如n型)之化合物半導體層之第1包覆層、形成於第1包覆層上之活性層、及形成於活性層上之包含具有第2導電型(例如p型)之化合物半導體層之第2包覆層的構造,且包含與第1包覆層電性連接之第1電極、及與第2包覆層電性連接之第2電極。構成發光二極體之層只要根據發光波長,由眾所周知之化合物半導體材料構成即可。 More specifically, the light-emitting diode has, for example, a first cladding layer including a compound semiconductor layer having a first conductivity type (for example, n-type) formed on a substrate, and an active layer formed on the first cladding layer. a layer and a second cladding layer including a compound semiconductor layer having a second conductivity type (for example, p-type) formed on the active layer, and including a first electrode electrically connected to the first cladding layer, and a second electrode electrically connected to the second cladding layer. The layer constituting the light-emitting diode may be composed of a well-known compound semiconductor material depending on the light-emitting wavelength.

此處,發光二極體之發光層之折射率例如於GaAs系中為3.5左右,於GaP系中為3.2左右,於GaN系中為2.5左右,又,通常所使用之藍寶石基板之折射率為1.75左右,於任一情形時均相當高。然而,先 前所一直使用之聚矽氧樹脂系或環氧樹脂系等之密封材料之折射率至多不過1.4~1.5左右,發光層與密封材料間、或藍寶石基板與密封材料間之折射率差較大,故而來自發光層之光之大部分會於該等之界面全反射而被封閉於發光層內或藍寶石基板內,無法提高光之提取效率。 Here, the refractive index of the light-emitting layer of the light-emitting diode is, for example, about 3.5 in the GaAs system, about 3.2 in the GaP system, and about 2.5 in the GaN system, and the refractive index of the commonly used sapphire substrate is Around 1.75, it is quite high in either case. However, first The refractive index of the sealing material such as polyoxynoxy resin or epoxy resin which has been used before is at most about 1.4 to 1.5, and the refractive index difference between the luminescent layer and the sealing material or between the sapphire substrate and the sealing material is large. Therefore, most of the light from the light-emitting layer is totally reflected at the interfaces and enclosed in the light-emitting layer or the sapphire substrate, and the light extraction efficiency cannot be improved.

於本發明之光半導體發光裝置中,藉由提高密封材料之折射率,可減少發光層與密封材料間、或藍寶石基板與密封材料間全反射之發光光量,提高光之提取效率。就該方面而言,密封材料之折射率較佳為高於1.54,更佳為1.56以上,若為1.58以上則進而較佳,若為1.6以上則最佳。又,於將光程長度設為0.5mm之情形時之波長450nm下之透過率較佳為40%以上,更佳為60%以上,進而較佳為70%以上。 In the optical semiconductor light-emitting device of the present invention, by increasing the refractive index of the sealing material, the amount of light that is totally reflected between the light-emitting layer and the sealing material or between the sapphire substrate and the sealing material can be reduced, and the light extraction efficiency can be improved. In this respect, the refractive index of the sealing material is preferably higher than 1.54, more preferably 1.56 or more, more preferably 1.58 or more, and most preferably 1.6 or more. Further, the transmittance at a wavelength of 450 nm when the optical path length is 0.5 mm is preferably 40% or more, more preferably 60% or more, still more preferably 70% or more.

本發明之第2態樣(發光裝置20)如圖2所示,第1密封層16係以覆蓋發光元件14之表面之方式形成,於其外側形成有與本發明之光半導體元件密封組合物之組成不同之第2密封層18,除此以外與第1態樣相同。 In the second aspect (light-emitting device 20) of the present invention, as shown in FIG. 2, the first sealing layer 16 is formed to cover the surface of the light-emitting element 14, and the optical semiconductor element sealing composition of the present invention is formed on the outer side thereof. The second sealing layer 18 having a different composition is the same as the first aspect.

作為組成不同之第2密封層18之材料,可列舉:甲基聚矽氧、改性聚矽氧、丙烯酸系樹脂、環氧樹脂、聚醯亞胺樹脂等樹脂或樹脂複合體。為了進一步減少第1密封層16與第2密封層18之界面反射,並且亦進一步減少第2密封層18與外部之界面反射,第2密封層18之折射率較佳為第1密封層16之折射率以下且1(大氣之折射率)以上。又,為了調整第2密封層18之折射率,亦可於第2密封層中含有本發明之表面修飾金屬氧化物粒子。 Examples of the material of the second sealing layer 18 having different compositions include a resin such as methyl polyfluorene oxide, modified polyfluorene oxide, acrylic resin, epoxy resin, and polyimide resin, or a resin composite. In order to further reduce the interface reflection between the first sealing layer 16 and the second sealing layer 18 and further reduce the interface reflection between the second sealing layer 18 and the outside, the refractive index of the second sealing layer 18 is preferably the first sealing layer 16 The refractive index is equal to or lower than 1 (the refractive index of the atmosphere) or more. Further, in order to adjust the refractive index of the second sealing layer 18, the surface-modified metal oxide particles of the present invention may be contained in the second sealing layer.

又,亦可將本發明之光半導體發光裝置設為組合有發光元件與螢光體之光半導體發光裝置。根據本發明之光半導體發光裝置,與光半導體元件接觸之第1密封層為上述本發明之聚矽氧樹脂複合體,但 只要該第1密封層中含有例如藍色InGaN用之YAG(Yttrium Aluminum Garnet,釔鋁石榴石)螢光體或紫外線光用之RGB(Red Green Blue,紅綠藍)螢光體等螢光體即可。該螢光體只要預先含有於用以形成作為本發明之密封材料的聚矽氧樹脂複合體之聚矽氧樹脂組合物中即可,作為其方法,可列舉:將螢光體直接混合於聚矽氧樹脂組合物中之方法、將螢光體混合於苯基聚矽氧樹脂形成成分或甲基苯基聚矽氧樹脂形成成分中之方法、將有機溶劑等中分散有螢光體之分散液混合於聚矽氧樹脂組合物中後去除有機溶劑等之方法等。 Moreover, the optical semiconductor light-emitting device of the present invention may be an optical semiconductor light-emitting device in which a light-emitting element and a phosphor are combined. According to the optical semiconductor light-emitting device of the present invention, the first sealing layer that is in contact with the optical semiconductor element is the above-described polyoxyxene resin composite of the present invention, but The first sealing layer contains, for example, a YAG (Yttrium Aluminum Garnet) phosphor for blue InGaN or a RGB (Red Green Blue) phosphor for ultraviolet light. Just fine. The phosphor may be contained in a polyoxyxylene resin composition for forming a polyoxymethylene resin composite as a sealing material of the present invention, and a method of directly mixing the phosphor with the phosphor may be mentioned. a method in a silicone resin composition, a method of mixing a phosphor in a phenylpolyoxyl resin forming component or a methylphenylpolyoxyl resin forming component, and dispersing a phosphor in an organic solvent or the like. A method in which a liquid is mixed in a polyoxyxylene resin composition, an organic solvent or the like is removed, and the like.

尤其是若考慮到於成本方面上削減螢光體之使用量之情形或於發光元件附近集中地配置螢光體而提高光轉換效率之情形,則較佳為使第2態樣中之第1密封層中含有螢光體。螢光體較佳為相對於第1密封層之質量為5~80質量%,更佳為20~70質量%。再者,可於第2密封層中亦含有螢光體。 In particular, in consideration of the case where the amount of use of the phosphor is reduced in terms of cost, or when the phosphor is concentrated in the vicinity of the light-emitting element to improve the light conversion efficiency, it is preferable to make the first of the second aspect. The sealing layer contains a phosphor. The phosphor is preferably 5 to 80% by mass, more preferably 20 to 70% by mass, based on the mass of the first sealing layer. Further, a phosphor may be contained in the second sealing layer.

作為此種組合有發光元件與螢光體之光半導體發光裝置,可例示白色發光二極體(例如將紫外線或藍色發光二極體與螢光體粒子加以組合而射出白色光之發光二極體)。 As such an optical semiconductor light-emitting device in which a light-emitting element and a phosphor are combined, a white light-emitting diode (for example, a light-emitting diode in which ultraviolet light or a blue light-emitting diode and a phosphor particle are combined to emit white light) can be exemplified. body).

[實施例] [Examples]

以下,藉由實施例及比較例具體說明本發明,但本發明並不限定於該等實施例。 Hereinafter, the present invention will be specifically described by way of Examples and Comparative Examples, but the present invention is not limited to the Examples.

對本實施例以下述方式進行各種測定及評價。 Various measurements and evaluations were carried out in the following manner in the following examples.

(金屬氧化物粒子之平均一次粒徑) (average primary particle size of metal oxide particles)

金屬氧化物粒子之平均一次粒徑係設為由X射線繞射峰之半值寬藉由計算而獲得之謝樂(Scherrer)粒徑。其原因在於:若一次粒徑為奈米尺寸,則一個粒子由複數個微晶構成之可能性降低,由此平均一次粒徑與謝樂粒徑實質上相同。 The average primary particle diameter of the metal oxide particles is set to a Scherrer particle diameter obtained by calculation from a half-value width of the X-ray diffraction peak. The reason for this is that if the primary particle diameter is a nanometer size, the possibility that one particle is composed of a plurality of crystallites is lowered, whereby the average primary particle diameter is substantially the same as the Xerox particle diameter.

(聚矽氧樹脂複合體之透過率) (Transmission rate of polyoxyl resin composite)

聚矽氧樹脂複合體之透過率係使用形成於玻璃基材上之實施例之複合體(0.5mm厚),並使用分光光度計(積分球)進行測定。並且,於實施例A1~A5、比較例A1~A4中,將相對於聚矽氧樹脂單體(比較例1)之波長450nm下之透過率降低量未達10%設為「A」,將10%以上設為「B」。又,於實施例B1~B5、比較例B1~B6中,求出波長450nm下之透過率。 The transmittance of the polyoxymethylene resin composite was measured using a composite (0.5 mm thick) of an example formed on a glass substrate and using a spectrophotometer (integral sphere). Further, in Examples A1 to A5 and Comparative Examples A1 to A4, the amount of decrease in transmittance at a wavelength of 450 nm with respect to the polyoxyxylene resin monomer (Comparative Example 1) was less than 10%, and it was set to "A". 10% or more is set to "B". Further, in Examples B1 to B5 and Comparative Examples B1 to B6, the transmittance at a wavelength of 450 nm was determined.

(聚矽氧樹脂複合體之耐熱性) (heat resistance of polyoxymethylene resin composite)

於實施例A1~A5、比較例A1~A4中,聚矽氧樹脂複合體之耐熱性係藉由對上述0.5mm厚之複合體(硬化體)利用電爐於150℃下實施500小時負載後,使用分光光度計(積分球)測定透過率而進行評價。將熱負載後之於波長450nm下之透過率與初始值(熱負載前)相比降低30%以上者設為「B」,若降低量未達30%,則設為「A」。 In Examples A1 to A5 and Comparative Examples A1 to A4, the heat resistance of the polyoxyxene resin composite was carried out by applying the above-mentioned 0.5 mm thick composite (hardened body) to an electric furnace at 150 ° C for 500 hours. The transmittance was measured using a spectrophotometer (integral sphere) and evaluated. When the transmittance at a wavelength of 450 nm after the heat load is reduced by 30% or more compared with the initial value (before the heat load), it is set to "B", and when the amount of decrease is less than 30%, it is set to "A".

另一方面,於實施例B1~B5、比較例B1~B6中,藉由使用形成於玻璃基材上之實施例之複合體(0.5mm厚),並使用分光光度計(積分球)測定透過率而進行評價。具體而言,將聚矽氧樹脂複合體投入至120℃之乾燥器中,比較1000小時後之於450nm下之透過率與初始之透過率,將相對於初始之透過率之降低率未達5%設為「A」,將5%以上且未達25%設為「B」,將25%以上設為「C」。 On the other hand, in Examples B1 to B5 and Comparative Examples B1 to B6, the composite (0.5 mm thick) of the example formed on the glass substrate was used, and the transmission was measured using a spectrophotometer (integral sphere). Rate and evaluate. Specifically, the polyoxyxylene resin composite is put into a dryer at 120 ° C, and the transmittance and the initial transmittance at 450 nm after 1000 hours are compared, and the reduction rate with respect to the initial transmittance is less than 5 % is set to "A", 5% or more and less than 25% are set to "B", and 25% or more is set to "C".

(聚矽氧樹脂複合體之透氣性(阻氣性)) (The gas permeability (gas barrier property) of the polyoxymethylene resin composite)

聚矽氧樹脂複合體之透氣性(阻氣性)係以下述方式進行評價。 The gas permeability (gas barrier property) of the polyoxymethylene resin composite was evaluated in the following manner.

首先,於具有鍍銀反射板之LED封裝體中密封聚矽氧樹脂組合物,於150℃下對聚矽氧樹脂組合物進行3小時加熱處理而使其硬化,獲得實施例之複合體。將該封裝體與0.3g之硫粉末一併密封於500ml之耐壓玻璃容器中,並保持為80℃。利用目視觀察鍍銀反射板之經時外觀變化(由含硫氣體所致之鍍銀之腐蝕(黑化變色)),於實施例A1~A5、比較例A1~A4中,將與不含金屬氧化物粒子之聚矽氧樹脂(比較 例A1)相比變色慢且呈現出同等之黑化所需之時間為1.5倍以上者設為透氣性較低並設為「A」,將與聚矽氧樹脂相比變色慢但呈現出同等之黑化之時間未達1.5倍者設為「B」,將與聚矽氧樹脂同等地變色者或更快地變色者設為「C」。 First, the polyoxyxene resin composition was sealed in an LED package having a silver-plated reflector, and the polyoxyxene resin composition was heat-treated at 150 ° C for 3 hours to be hardened to obtain a composite of the examples. The package was sealed with 0.3 g of sulfur powder in a 500 ml pressure-resistant glass container and kept at 80 °C. Visually observing the change in the appearance of the silver-plated reflector over time (corrosion of silver plating due to sulfur-containing gas (blackening discoloration)), in Examples A1 to A5, Comparative Examples A1 to A4, and without metal Oxide particles of oxide particles (comparison In the case of the example A1), the time required for the discoloration to be slower and the equivalent blackening is 1.5 times or more is set to be "A", and the discoloration is slower than that of the polyoxyxylene resin. It is set to "B" when the blackening time is less than 1.5 times, and it is set to "C" when it is discolored similarly to polyoxyl resin.

另一方面,於實施例B1~B5、比較例B1~B6中,目視觀察上述鍍銀反射板之外觀之黑化(由含硫氣體所致之鍍銀之腐蝕(黑化變色)),以直至與另外製作之基準板(直接利用含硫氣體使鍍銀反射板黑化者)成為相同程度之時間進行評價。再者,阻氣性越低之複合體,直至黑化之時間越短。 On the other hand, in Examples B1 to B5 and Comparative Examples B1 to B6, the blackening of the appearance of the silver-plated reflector (corrosion of silver plating by black-containing gas (blackening discoloration)) was visually observed to The evaluation was carried out until the same time as the other prepared reference plate (the black-plated reflector was directly blackened by the sulfur-containing gas). Furthermore, the lower the gas barrier property, the shorter the time until blackening.

(聚矽氧樹脂複合體之硬度評價) (Evaluation of hardness of polyoxyl resin composite)

聚矽氧樹脂複合體之硬度評價係將製作聚矽氧樹脂複合體時無龜裂之情形設為「A」,將產生龜裂之情形設為「B」(實施例B1~B5、比較例B1~B6)。 The hardness evaluation of the polyoxymethylene resin composite was "A" in the case where no polysulfide resin composite was produced, and "B" in the case where cracks occurred (Examples B1 to B5, Comparative Examples) B1~B6).

(包含聚矽氧樹脂複合體之密封層之厚度) (including the thickness of the sealing layer of the polyoxymethylene resin composite)

包含聚矽氧樹脂複合體之密封層之厚度係利用SEM(Scanning Electron Microscope,掃描式電子顯微鏡)觀察上述封裝體之剖面而進行測定。 The thickness of the sealing layer containing the polyoxymethylene resin composite was measured by observing the cross section of the package by SEM (Scanning Electron Microscope).

[實施例A1] [Example A1] (氧化鋯粒子之製作) (Production of zirconia particles)

於使氧氯化鋯八水合物2615g溶解於純水40L(升)中而成之鋯鹽溶液中,一面攪拌一面添加於純水20L中溶解有28%氨水344g而成之稀氨水,製備氧化鋯前驅物漿料。 In the zirconium salt solution obtained by dissolving 2615 g of zirconium oxychloride octahydrate in 40 L (liter) of pure water, the diluted ammonia water obtained by dissolving 344 g of 28% aqueous ammonia in 20 L of pure water was stirred to prepare oxidation. Zirconium precursor slurry.

繼而,於該漿料中一面攪拌一面添加使硫酸鈉300g溶解於5L純水中而成之硫酸鈉水溶液。此時之硫酸鈉之添加量相對於鋯鹽溶液中之鋯離子之氧化鋯換算值為30質量%。 Then, a sodium sulfate aqueous solution obtained by dissolving 300 g of sodium sulfate in 5 L of pure water was added to the slurry while stirring. The amount of sodium sulfate added at this time was 30% by mass in terms of zirconium oxide equivalent value of zirconium ions in the zirconium salt solution.

繼而,使用乾燥器,於大氣中、130℃下將該混合物乾燥24小 時,獲得固形物。 Then, using a drier, the mixture is dried in the atmosphere at 130 ° C for 24 hours. When it is obtained, solid matter is obtained.

繼而,利用自動乳缽粉碎該固形物後,使用電爐於大氣中、500℃下焙燒1小時。 Then, the solid matter was pulverized by an automatic mortar, and then fired in the air at 500 ° C for 1 hour in an electric furnace.

繼而,將該焙燒物投入至純水中,進行攪拌而製成漿料狀後,使用離心分離器進行清洗,充分地去除所添加之硫酸鈉,其後,利用乾燥器進行乾燥,獲得平均一次粒徑4nm之氧化鋯粒子。 Then, the calcined product is poured into pure water, stirred to obtain a slurry, and then washed with a centrifugal separator to sufficiently remove the added sodium sulfate, and then dried by a dryer to obtain an average primary particle diameter. 4 nm zirconia particles.

(對氧化鋯粒子之表面修飾:表面修飾氧化鋯粒子之製作) (Surface modification of zirconia particles: production of surface-modified zirconia particles)

繼而,於氧化鋯粒子10g中添加甲苯82g、含甲氧基之苯基聚矽氧樹脂(信越化學工業公司製造,KR217)5g並進行混合,利用珠磨機進行6小時表面修飾處理後去除珠粒。繼而,添加乙烯基三甲氧基矽烷(信越化學工業公司製造,KBM1003)3g,於130℃下、6小時環流下進行表面修飾及分散處理,藉此,製備藉由具有苯基之表面修飾材料及具有作為烯基之乙烯基之表面修飾材料而經表面修飾之氧化鋯粒子之透明分散液。 Then, 8 g of toluene and 5 g of a methoxy group-containing phenyl polyfluorene resin (manufactured by Shin-Etsu Chemical Co., Ltd., KR217) were added to 10 g of zirconia particles and mixed, and the beads were removed by a bead mill for 6 hours to remove the beads. grain. Then, 3 g of vinyltrimethoxydecane (KBM1003, manufactured by Shin-Etsu Chemical Co., Ltd.) was added, and surface modification and dispersion treatment were carried out at 130 ° C for 6 hours under circulation, thereby preparing a surface-modifying material having a phenyl group and A transparent dispersion of surface-modified zirconia particles having a surface modification material of a vinyl group as an alkenyl group.

(聚矽氧樹脂組合物之製作) (Production of polyoxyl resin composition)

於上述氧化鋯粒子之透明分散液50g中添加作為苯基聚矽氧樹脂之商品名:OE-6520(Dow Corning Toray公司製造,折射率1.54,A液/B液調配比=1/1)7.6g(A液3.8g,B液3.8g)並進行攪拌後,藉由減壓乾燥而去除甲苯,獲得含有表面修飾氧化鋯粒子、苯基聚矽氧樹脂、及反應觸媒之聚矽氧樹脂組合物(氧化鋯粒子含量:30質量%)。 Mn-6520 (manufactured by Dow Corning Toray Co., Ltd., refractive index 1.54, A liquid/B liquid ratio = 1/1) was added to 50 g of the transparent dispersion of the zirconia particles. g (3.8 g of liquid A, 3.8 g of liquid B) and stirred, and then toluene was removed by drying under reduced pressure to obtain a polyoxyxylene resin containing surface-modified zirconia particles, phenyl polyoxyl resin, and reaction catalyst. Composition (zirconia particle content: 30% by mass).

再者,關於OE-6520,藉由NMR(Nuclear Magnetic Resonance,核磁共振)分析確認出Si-H鍵之存在,可知於聚矽氧樹脂形成成分中含有氫基。因此,OE-6520可藉由與對氧化鋯粒子進行表面修飾之乙烯基三甲氧基矽烷之乙烯基(烯基)進行交聯反應而一體化。 Further, regarding OE-6520, the presence of a Si-H bond was confirmed by NMR (Nuclear Magnetic Resonance) analysis, and it was found that a hydrogen group was contained in the polyoxyxyl resin forming component. Therefore, OE-6520 can be integrated by crosslinking reaction with a vinyl (alkenyl group) of vinyl trimethoxynonane which is surface-modified with zirconia particles.

又,關於OE-6520,藉由NMR分析確認出存在烯基即C=C雙鍵(乙烯基),又,藉由發光分析確認出存在鉑。即,OE-6520係藉由加 成反應(矽氫化反應)而聚合硬化之加成硬化型之聚矽氧樹脂。因此,可判斷出OE-6520係以鉑作為觸媒,使氧化鋯粒子表面修飾材料中之乙烯基與OE-6520中之氫基藉由交聯反應而鍵結,並且使OE-6520中之乙烯基與氫基進行加成反應,藉此,於維持氧化鋯粒子之分散狀態之狀態下使聚矽氧樹脂形成成分聚合硬化。 Further, regarding OE-6520, it was confirmed by NMR analysis that an alkenyl group, that is, a C=C double bond (vinyl group), and platinum was confirmed by luminescence analysis. That is, OE-6520 is by adding An addition-hardening polyoxyxylene resin which is formed into a reaction (hydrazine hydrogenation reaction) and polymerized and hardened. Therefore, it can be judged that OE-6520 uses platinum as a catalyst, and the vinyl group in the surface modification material of the zirconia particle is bonded to the hydrogen group in OE-6520 by a crosslinking reaction, and is made in OE-6520. The vinyl group is subjected to an addition reaction with a hydrogen group, whereby the polyfluorene oxide resin component is polymer-cured while maintaining the dispersed state of the zirconia particles.

(聚矽氧樹脂複合體之製作) (Production of polyoxyl resin composite)

於150℃下對上述聚矽氧樹脂組合物進行加熱處理3小時而硬化,藉此獲得聚矽氧樹脂複合體。 The polyoxyphthalocene resin composition was heat-treated at 150 ° C for 3 hours to be hardened, whereby a polyoxymethylene resin composite was obtained.

使用該聚矽氧樹脂複合體進行上述之各種評價。再者,透氣性之評價中,將密封層之厚度設為500μm。 The above various evaluations were carried out using the polyoxymethylene resin composite. Further, in the evaluation of the gas permeability, the thickness of the sealing layer was set to 500 μm.

[實施例A2] [Example A2] (氧化鋯粒子之製作) (Production of zirconia particles)

利用與實施例A1相同之方式製作氧化鋯粒子。 Zirconium oxide particles were produced in the same manner as in Example A1.

(含有苯基與烯基兩者之表面修飾材料之製作) (Production of surface modification materials containing both phenyl and alkenyl groups)

表面修飾材料A:(CH2=CH)(CH3)2SiO(SiO(C6H5)2)45Si(OC2H5)3之製備 Preparation of surface modification material A: (CH 2 =CH)(CH 3 ) 2 SiO(SiO(C 6 H 5 ) 2 ) 45 Si(OC 2 H 5 ) 3

於氮氣環境下,於60ml之四氫呋喃(THF,tetrahydrofuran)溶劑中溶解二甲基乙烯基矽烷醇1.8g,一面攪拌一面於溫度0℃下滴加溶解於正己烷中之正丁基鋰1.2g並反應3小時,獲得二甲基乙烯基矽烷醇鋰(參照式(A))。 1.8 g of dimethylvinylstanol was dissolved in 60 ml of tetrahydrofuran (THF, tetrahydrofuran) solvent under a nitrogen atmosphere, and 1.2 g of n-butyllithium dissolved in n-hexane was added dropwise thereto at a temperature of 0 ° C while stirring. After reacting for 3 hours, lithium dimethylvinyl stanol was obtained (refer to the formula (A)).

繼而,滴加使六苯基環三矽氧烷160.5g溶解於THF溶劑中而成之溶液,並於溫度0℃下反應12小時,獲得苯基乙烯基有機矽烷醇鋰(參照式(B))。 Then, a solution obtained by dissolving 160.5 g of hexaphenylcyclotrioxane in a solvent of THF was added dropwise, and reacted at a temperature of 0 ° C for 12 hours to obtain lithium phenylvinylorganoalkanol (see Formula (B)). ).

繼而,添加氯化三乙氧基矽烷3.6g,於溫度0℃下反應12小時(參照式(C))。 Then, 3.6 g of triethoxymethane chloride was added, and the mixture was reacted at a temperature of 0 ° C for 12 hours (refer to the formula (C)).

繼而,混合正己烷而生成氯化鋰之沈澱後,過濾去除氯化鋰, 獲得含有苯基與烯基兩者之表面修飾材料A。 Then, after mixing n-hexane to form a precipitate of lithium chloride, the lithium chloride is removed by filtration. A surface modification material A containing both a phenyl group and an alkenyl group was obtained.

所獲得之表面修飾材料係藉由1H-NMR確認出結構。 The surface modification material obtained was confirmed by 1 H-NMR.

此處,將含有苯基與烯基兩者之表面修飾材料之合成流程之概要示於以下。 Here, the outline of the synthesis scheme of the surface modification material containing both a phenyl group and an alkenyl group is shown below.

[化10] [化10]

(對氧化鋯粒子之表面修飾:表面修飾氧化鋯粒子之製作) (Surface modification of zirconia particles: production of surface-modified zirconia particles)

繼而,於氧化鋯粒子10g中添加甲苯80g、含甲氧基之苯基聚矽氧樹脂(信越工業化學公司製造,KR217)5g並進行混合,利用珠磨機進行6小時表面修飾處理後去除珠粒。繼而,添加3g之上述表面修飾材料A,於130℃下、6小時環流下進行表面修飾及分散處理,藉此,製備藉由具有苯基之表面修飾材料及一併具有苯基與烯基(乙烯基)之表面修飾材料而經表面修飾之氧化鋯粒子之透明分散液。 Then, 80 g of toluene and 5 g of methoxypolyphenyl phthalocyanine resin (manufactured by Shin-Etsu Chemical Co., Ltd., KR217) were added to 10 g of zirconia particles and mixed, and the beads were removed by a bead mill for 6 hours. grain. Then, 3 g of the above surface modifying material A was added, and surface modification and dispersion treatment were carried out at 130 ° C under a 6-hour circulation, whereby a surface-modifying material having a phenyl group and a phenyl group and an alkenyl group were prepared together. A transparent dispersion of surface-modified zirconia particles of a surface modification material of vinyl).

(聚矽氧樹脂組合物、聚矽氧樹脂複合體之製作) (Production of polyoxyxylene resin composition and polyoxymethylene resin composite)

使用上述含甲氧基之苯基聚矽氧樹脂、及藉由表面修飾材料A而經表面修飾之氧化鋯粒子之透明分散液,除此以外,利用與實施例A1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 Polyfluorene was produced in the same manner as in Example A1 except that the above-mentioned methoxy-containing phenylpolyoxyl resin and the transparent dispersion of the surface-modified zirconia particles by the surface-modifying material A were used. The resin composition was further prepared into a polyoxymethylene resin composite, and various evaluations were carried out.

[實施例A3] [Example A3]

將密封層之厚度設為30μm,除此以外,利用與實施例A1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 A polyoxyphthalocene resin composition was produced in the same manner as in Example A1 except that the thickness of the sealing layer was changed to 30 μm, and a polyfluorene oxide resin composite was produced, and various evaluations were carried out.

[實施例A4] [Example A4] (二氧化鈦粒子之製作) (Production of titanium dioxide particles)

將四氯化鈦242.1g與氯化錫(IV)五水合物111.9g投入至5℃之純水1.5L(升)中並進行攪拌,製作混合溶液。 242.1 g of titanium tetrachloride and 111.9 g of tin(IV) chloride pentahydrate were placed in 1.5 L (liter) of pure water at 5 ° C and stirred to prepare a mixed solution.

繼而,對該混合溶液進行加溫而將溫度調整為25℃,於該混合溶液中添加濃度為10質量%之碳酸銨水溶液而將pH值調整為1.5,其後,於25℃下熟化24小時後,利用超濾法去除過量之氯化物離子。 Then, the mixed solution was heated to adjust the temperature to 25 ° C, and an aqueous solution of ammonium carbonate having a concentration of 10% by mass was added to the mixed solution to adjust the pH to 1.5, followed by aging at 25 ° C for 24 hours. Thereafter, excess chloride ions are removed by ultrafiltration.

繼而,使用蒸發器自去除氯化物離子後之混合溶液中去除水分,其後進行乾燥,製作氧化鈦粒子。所獲得之氧化鈦粒子之平均一次粒徑為4nm。 Then, the water was removed from the mixed solution obtained by removing the chloride ions using an evaporator, and then dried to prepare titanium oxide particles. The average primary particle diameter of the obtained titanium oxide particles was 4 nm.

使用該二氧化鈦粒子,除此以外,利用與實施例A1相同之方式進行表面修飾,製作二氧化鈦透明分散液,繼而,製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 The surface modification was carried out in the same manner as in Example A1 except that the titanium oxide particles were used, and a transparent dispersion of titanium dioxide was produced, and then a polyoxyxylene resin composition was produced, and a polyoxyxylene resin composite was produced, and various evaluations were carried out. .

[實施例A5] [Example A5] (二氧化矽粒子之製作) (Production of cerium oxide particles)

於甲醇80g中混合濃度24%之氨水20g、10N之NaOH0.8g、作為界面活性劑之聚氧乙烯烷基醚(商品名:Emulgen 707,花王公司製造)4g。於其中滴加利用甲醇稀釋之矽酸四乙酯(商品名:Ethyl Silicate 28,Colcoat公司製造)4g。將該混合液於20℃下攪拌1小時。攪拌結束後,藉由傾析而分離出沈澱物,反覆進行再分散於甲醇中並進行傾析之操作,去除殘留離子。 20 g of ammonia water having a concentration of 24%, 0.8 g of 10 N NaOH, and 4 g of a polyoxyethylene alkyl ether (trade name: Emulgen 707, manufactured by Kao Corporation) as a surfactant were mixed in 80 g of methanol. 4 g of tetraethyl phthalate (trade name: Ethyl Silicate 28, manufactured by Colcoat Co., Ltd.) diluted with methanol was added dropwise thereto. The mixture was stirred at 20 ° C for 1 hour. After completion of the stirring, the precipitate was separated by decantation, and the operation was repeated by redispersing in methanol and decanting to remove residual ions.

對所獲得之濕狀之二氧化矽粒子利用減壓乾燥而使甲醇乾燥,獲得生成之二氧化矽粒子。所獲得之二氧化矽粒子之平均一次粒徑為4nm。 The obtained wet cerium oxide particles were dried under reduced pressure to dry methanol, and the produced cerium oxide particles were obtained. The average primary particle diameter of the obtained cerium oxide particles was 4 nm.

使用該二氧化矽粒子,除此以外,利用與實施例A1相同之方式進行表面修飾,製作二氧化矽透明分散液,繼而,製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 A cerium oxide transparent dispersion was prepared by the same method as in Example A1 except that the cerium oxide particles were used, and then a polyfluorene oxide resin composition was produced, and a polyoxyxylene resin composite was produced. And carry out various evaluations.

[比較例A1] [Comparative Example A1]

對實施例A1中所使用之聚矽氧樹脂(但未添加金屬氧化物粒子)進行與實施例1相同之各種評價。再者,關於聚矽氧樹脂複合體之透過率、聚矽氧樹脂複合體之耐熱性、聚矽氧樹脂複合體之透氣性之3個方面,以不含金屬氧化物粒子之本比較例A1之值為基準值。 Various evaluations similar to those in Example 1 were carried out on the polyoxyxylene resin used in Example A1 (but no metal oxide particles were added). Further, in the three aspects of the transmittance of the polyoxyxene resin composite, the heat resistance of the polyoxyxene resin composite, and the gas permeability of the polyoxyxene resin composite, the comparative example A1 containing no metal oxide particles is used. The value is the reference value.

[比較例A2] [Comparative Example A2]

將氧化鋯粒子之製作中之電爐焙燒溫度自500℃設為450℃,除此以外,利用與實施例A1相同之方式製作平均一次粒徑為2nm之氧化鋯粒子。使用該氧化鋯粒子,除此以外,利用與實施例A1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 A zirconia particle having an average primary particle diameter of 2 nm was produced in the same manner as in Example A1 except that the baking temperature of the electric furnace in the production of the zirconia particles was changed to 500 ° C from 500 ° C. A polyfluorene oxide resin composition was produced in the same manner as in Example A1 except that the zirconia particles were used, and a polyfluorene oxide resin composite was produced, and various evaluations were carried out.

[比較例A3] [Comparative Example A3]

將氧化鋯粒子之製作中之電爐焙燒溫度自500℃設為600℃,除此以外,利用與實施例A1相同之方式製作一次粒徑為15nm之氧化鋯粒子。使用該氧化鋯粒子,除此以外,利用與實施例A1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 A zirconia particle having a primary particle diameter of 15 nm was produced in the same manner as in Example A1 except that the baking temperature of the electric furnace in the production of the zirconia particles was changed to 500 ° C from 500 ° C. A polyfluorene oxide resin composition was produced in the same manner as in Example A1 except that the zirconia particles were used, and a polyfluorene oxide resin composite was produced, and various evaluations were carried out.

[比較例A4] [Comparative Example A4]

將實施例A1中所使用之表面修飾材料變更為甲基丙烯醯氧基丙基三甲氧基矽烷6g及異丙基三甲氧基矽烷2g,除此以外,利用與實施例A1相同之方式製作表面修飾氧化鋯粒子,利用與實施例A1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 A surface was produced in the same manner as in Example A1 except that the surface modification material used in Example A1 was changed to 6 g of methacryloxypropyltrimethoxydecane and 2 g of isopropyltrimethoxydecane. The zirconia particles were modified, and a polyoxyxylene resin composition was produced in the same manner as in Example A1, and a polyoxyxylene resin composite was produced, and various evaluations were carried out.

將上述各實施例、比較例中之聚矽氧樹脂複合體之詳細內容及評價結果匯總示於第1表、第2表。 The details and evaluation results of the polyoxyxene resin composites in the above respective Examples and Comparative Examples are collectively shown in Tables 1 and 2.

實施例A1~A5中之聚矽氧樹脂複合體之透過率與成為基準之聚矽氧樹脂單體(比較例A1)之值同等,未見大幅度之降低。又,關於聚矽氧樹脂複合體之耐熱性,熱負載後之透過率與初始值相比亦未見30%以上之降低而並無問題。 The transmittance of the polyoxymethylene resin composites in Examples A1 to A5 was the same as the value of the reference polyoxyxylene resin monomer (Comparative Example A1), and no significant decrease was observed. Further, regarding the heat resistance of the polyoxymethylene resin composite, the transmittance after the heat load was not reduced by 30% or more as compared with the initial value, and there was no problem.

關於實施例A1、A2、A4、A5之聚矽氧樹脂複合體之透氣性,與成為基準之聚矽氧樹脂單體(比較例A1)相比呈現出同等之黑化所需之時間為1.5倍以上,確認出透氣性之降低、即阻氣性之明確之提高。又,於實施例A3中亦確認出透氣性之降低,其程度低於其他實施例。認為其原因在於密封層厚度薄於30μm。 The gas permeability of the polyoxyxene resin composites of Examples A1, A2, A4, and A5 was 1.5 in comparison with the standard polyoxyxylene resin monomer (Comparative Example A1). When the ratio is more than the above, it is confirmed that the gas permeability is lowered, that is, the gas barrier property is clearly improved. Further, in Example A3, the decrease in gas permeability was also confirmed, which was lower than that of the other examples. The reason is considered to be that the thickness of the sealing layer is thinner than 30 μm.

另一方面,關於比較例A2,透氣性較高而無法獲得充分之阻氣性。認為其原因在於:由於金屬氧化物之粒徑較小,聚矽氧樹脂組合物之黏度較高,故而作業性較差,密封本身無法充分地進行。 On the other hand, regarding Comparative Example A2, the gas permeability was high and sufficient gas barrier properties could not be obtained. The reason for this is considered to be that since the particle diameter of the metal oxide is small, the viscosity of the polyoxymethylene resin composition is high, so workability is poor, and the seal itself cannot be sufficiently performed.

又,關於比較例A3,光之透過率降低。認為其原因在於:由於金屬氧化物之粒徑較大,故而產生光之散射。 Further, regarding Comparative Example A3, the light transmittance was lowered. The reason is considered to be that scattering of light occurs due to the large particle size of the metal oxide.

又,關於比較例A4,光之透過率、耐熱性均降低。認為其係起因於表面修飾材料。即,認為光之透過率降低之原因在於:由於本例之表面修飾材料不含烯基,故而不具有與基質聚矽氧樹脂形成成分之 鍵結性,進而由於不含苯基,故而與基質聚矽氧樹脂形成成分之親和性較低,因此,於聚矽氧樹脂複合體形成時(聚矽氧樹脂組合物之硬化時)金屬氧化物粒子產生凝聚,又,認為耐熱性之降低之原因在於:本例之表面修飾材料不具有苯基等而耐熱性較低。 Further, in Comparative Example A4, both the light transmittance and the heat resistance were lowered. It is believed to be caused by a surface modifying material. That is, the reason why the transmittance of light is lowered is that since the surface modification material of this example does not contain an alkenyl group, it does not have a component with a matrix polyoxyl resin. Bonding property, and further, since the phenyl group is not contained, the affinity with the matrix polyoxyl resin forming component is low, and therefore, when the polyoxyxylene resin composite is formed (when the polyoxyxene resin composition is hardened), the metal is oxidized. The reason why the particles of the particles are agglomerated and the heat resistance is lowered is that the surface modifying material of this example does not have a phenyl group or the like and has low heat resistance.

[實施例B1] [Example B1] (氧化鋯粒子之製作) (Production of zirconia particles)

於使氧氯化鋯八水合物2615g溶解於純水40L(升)中而成之鋯鹽溶液中,一面攪拌一面添加於純水20L中溶解有28%氨水344g而成之稀氨水,製備氧化鋯前驅物漿料。 In the zirconium salt solution obtained by dissolving 2615 g of zirconium oxychloride octahydrate in 40 L (liter) of pure water, the diluted ammonia water obtained by dissolving 344 g of 28% aqueous ammonia in 20 L of pure water was stirred to prepare oxidation. Zirconium precursor slurry.

繼而,於該漿料中一面攪拌一面添加使硫酸鈉300g溶解於5L之純水中而成之硫酸鈉水溶液。此時之硫酸鈉之添加量相對於鋯鹽溶液中之鋯離子之氧化鋯換算值為30質量%。 Then, a sodium sulfate aqueous solution obtained by dissolving 300 g of sodium sulfate in 5 L of pure water was added to the slurry while stirring. The amount of sodium sulfate added at this time was 30% by mass in terms of zirconium oxide equivalent value of zirconium ions in the zirconium salt solution.

繼而,使用乾燥器,於大氣中、130℃下將該混合物乾燥24小時,獲得固形物。 Then, the mixture was dried in the air at 130 ° C for 24 hours using a drier to obtain a solid matter.

繼而,利用自動乳缽粉碎該固形物後,使用電爐於大氣中、500℃下焙燒1小時。 Then, the solid matter was pulverized by an automatic mortar, and then fired in the air at 500 ° C for 1 hour in an electric furnace.

繼而,將該焙燒物投入至純水中,進行攪拌而製成漿料狀後,使用離心分離器進行清洗,充分地去除所添加之硫酸鈉,其後,利用乾燥器進行乾燥,獲得平均一次粒徑4nm之氧化鋯粒子。 Then, the calcined product is poured into pure water, stirred to obtain a slurry, and then washed with a centrifugal separator to sufficiently remove the added sodium sulfate, and then dried by a dryer to obtain an average primary particle diameter. 4 nm zirconia particles.

(對氧化鋯粒子之表面修飾:表面修飾氧化鋯粒子之製作) (Surface modification of zirconia particles: production of surface-modified zirconia particles)

繼而,於氧化鋯粒子10g中添加甲苯82g、含甲氧基之苯基聚矽氧樹脂(信越化學工業公司製造,KR217)5g並進行混合,利用珠磨機進行6小時表面修飾處理後去除珠粒。繼而,添加二甲基乙氧基矽烷(信越化學工業公司製造,LS490)3g,於130℃下、6小時環流下進行表面修飾及分散處理,製作藉由具有苯基之表面修飾材料及具有氫基之表面修飾材料而經表面處理之氧化鋯粒子透明分散液。 Then, 8 g of toluene and 5 g of a methoxy group-containing phenyl polyfluorene resin (manufactured by Shin-Etsu Chemical Co., Ltd., KR217) were added to 10 g of zirconia particles and mixed, and the beads were removed by a bead mill for 6 hours to remove the beads. grain. Then, 3 g of dimethyl ethoxy decane (manufactured by Shin-Etsu Chemical Co., Ltd., LS490) was added, and surface modification and dispersion treatment were carried out at 130 ° C for 6 hours under a circulation to prepare a surface-modifying material having a phenyl group and having hydrogen. A surface-treated zirconia particle transparent dispersion of a surface-modified material.

(聚矽氧樹脂組合物之製作) (Production of polyoxyl resin composition)

於上述氧化鋯粒子透明分散液50g中添加作為苯基聚矽氧樹脂之商品名:OE-6520(Dow Corning Toray公司製造,折射率1.54,A液/B液調配比=1/1)7.6g(A液3.8g,B液3.8g)並進行攪拌後,藉由減壓乾燥而去除甲苯,獲得含有表面修飾氧化鋯粒子、苯基聚矽氧樹脂、及反應觸媒之聚矽氧樹脂組合物(氧化鋯粒子含量:30質量%)。 Mn-6520 (manufactured by Dow Corning Toray Co., Ltd., refractive index 1.54, A liquid/B liquid ratio = 1/1) 7.6 g was added to 50 g of the zirconia particle transparent dispersion. (3.8 g of liquid A, 3.8 g of liquid B) and stirred, and then toluene was removed by drying under reduced pressure to obtain a polyoxyxylene resin combination containing surface-modified zirconia particles, phenyl polyoxyl resin, and reaction catalyst. (zirconia particle content: 30% by mass).

再者,關於OE-6520,藉由NMR分析確認出烯基即C=C雙鍵(乙烯基)與Si-H鍵(氫基)之存在,又,藉由發光分析確認出鉑之存在。即OE-6520係藉由矽氫化反應而聚合硬化之加成硬化型之聚矽氧樹脂。因此,可判斷出氧化鋯粒子表面修飾材料中之氫基與OE-6520中之乙烯基可藉由矽氫化反應而鍵結,又,由於OE-6520中所含有之作為矽氫化觸媒之鉑觸媒係添加對使該OE-6520中之聚矽氧樹脂形成成分進行矽氫化聚合硬化所充分之量,故而即便於其中增加(相對於聚矽氧樹脂為少量之)表面修飾材料,亦充分具有作為觸媒之量或效果。 Further, regarding OE-6520, the presence of an alkenyl group, that is, a C=C double bond (vinyl group) and a Si-H bond (hydrogen group) was confirmed by NMR analysis, and the presence of platinum was confirmed by luminescence analysis. That is, OE-6520 is an addition hardening type polyoxymethylene resin which is polymerized and hardened by a hydrogenation reaction. Therefore, it can be judged that the hydrogen group in the surface modification material of the zirconia particles and the vinyl group in the OE-6520 can be bonded by hydrogenation reaction of the ruthenium, and, in addition, the platinum as the ruthenium hydrogenation catalyst contained in the OE-6520 The catalyst is added in an amount sufficient for the polyanthracene resin forming component in the OE-6520 to be subjected to hydrogenation polymerization curing, so that even if a surface-modifying material is added (a small amount relative to the polyoxy-oxygen resin), it is sufficient. Has the amount or effect as a catalyst.

(聚矽氧樹脂複合體之製作) (Production of polyoxyl resin composite)

於150℃下對上述聚矽氧樹脂組合物進行加熱處理3小時而硬化,藉此獲得聚矽氧樹脂複合體。 The polyoxyphthalocene resin composition was heat-treated at 150 ° C for 3 hours to be hardened, whereby a polyoxymethylene resin composite was obtained.

使用該聚矽氧樹脂複合體進行上述之各種評價。再者,阻氣性之評價中,將密封層之厚度設為500μm。 The above various evaluations were carried out using the polyoxymethylene resin composite. Further, in the evaluation of gas barrier properties, the thickness of the sealing layer was set to 500 μm.

[實施例B2] [Example B2] (二氧化鈦粒子之製作) (Production of titanium dioxide particles)

於5℃之純水1.5L(升)中投入四氯化鈦242.1g與氯化錫(IV)五水合物111.9g並進行攪拌,製作混合溶液。 Into 1.5 L (liter) of pure water at 5 ° C, 242.1 g of titanium tetrachloride and 111.9 g of tin (IV) chloride pentahydrate were charged and stirred to prepare a mixed solution.

繼而,加溫該混合溶液而將溫度調整為25℃,於該混合溶液中添加濃度為10質量%之碳酸銨水溶液而將pH值調整為1.5,其後,於25℃下熟化24小時後,利用超濾法去除過量之氯化物離子。 Then, the mixed solution was heated to adjust the temperature to 25 ° C, and an aqueous solution of ammonium carbonate having a concentration of 10% by mass was added to the mixed solution to adjust the pH to 1.5, and thereafter, after aging at 25 ° C for 24 hours, Excess chloride ions are removed by ultrafiltration.

繼而,使用蒸發器自該混合溶液中去除水分,其後進行乾燥, 製作氧化鈦粒子。所獲得之氧化鈦(二氧化鈦)粒子之平均一次粒徑為4nm。 Then, the evaporator is used to remove moisture from the mixed solution, and then dried. A titanium oxide particle was produced. The obtained titanium oxide (titanium dioxide) particles had an average primary particle diameter of 4 nm.

使用上述二氧化鈦粒子,將金屬氧化物粒子含量設為20質量%,除此以外,利用與實施例B1相同之方式進行表面修飾,製作藉由具有苯基之表面修飾材料及具有氫基之表面修飾材料而經表面處理之二氧化鈦粒子透明分散液,繼而,利用與實施例B1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 A surface modification by a surface modification material having a phenyl group and a surface having a hydrogen group was carried out in the same manner as in Example B1 except that the content of the metal oxide particles was 20% by mass. A transparent dispersion of titanium dioxide particles having a surface treated with a material was prepared, and then a polyoxyxylene resin composition was produced in the same manner as in Example B1, and a polyoxyxylene resin composite was produced, and various evaluations were carried out.

[實施例B3] [Example B3]

將氧化鋯粒子之平均一次粒逕自4nm變更為5nm,作為表面修飾材料,係自二甲基乙氧基矽烷變更為二乙氧基甲基矽烷(信越化學工業公司製造,LS880),進而以莫耳比計成為氫基/乙烯基=4之方式添加乙烯基三甲氧基矽烷(信越化學工業公司製造,KBM-1003),進行表面修飾及分散處理,除此以外,利用與實施例B1相同之方式製作藉由具有苯基之表面修飾材料、具有氫基之表面修飾材料及具有乙烯基之表面修飾材料而經表面處理之氧化鋯粒子透明分散液,繼而,利用與實施例B1相同之方式製作聚矽氧樹脂組合物及聚矽氧樹脂複合體,並進行各種評價。 The average primary particle diameter of the zirconia particles was changed from 4 nm to 5 nm, and the surface modification material was changed from dimethyl ethoxy decane to diethoxymethyl decane (manufactured by Shin-Etsu Chemical Co., Ltd., LS880), and further In the same manner as in Example B1, except that the vinyl group was added to the hydrogen group/vinyl group, the vinyl trimethoxy decane (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-1003) was subjected to surface modification and dispersion treatment. A transparent dispersion of zirconia particles surface-treated with a surface modification material having a phenyl group, a surface modification material having a hydrogen group, and a surface modification material having a vinyl group was produced in the same manner as in Example B1. The polyoxyxene resin composition and the polyoxymethylene resin composite were subjected to various evaluations.

[實施例B4] [Example B4]

於作為表面修飾材料之二甲基乙氧基矽烷中進而以莫耳比計成為氫基/乙烯基=6之方式添加乙烯基三甲氧基矽烷,進行表面修飾及分散處理,除此以外,利用與實施例B1相同之方式製作藉由具有苯基之表面修飾材料、具有氫基之表面修飾材料及具有乙烯基之表面修飾材料而經表面處理之氧化鋯粒子透明分散液,繼而,利用與實施例B1相同之方式製作聚矽氧樹脂組合物及聚矽氧樹脂複合體,並進行各種評價。 In the dimethyl ethoxy decane which is a surface modification material, vinyl trimethoxy decane is added in such a manner that the hydrogen group/vinyl group is 6 in terms of a molar ratio, and surface modification and dispersion treatment are carried out, and other methods are used. A transparent dispersion of zirconia particles surface-treated with a surface modification material having a phenyl group, a surface modification material having a hydrogen group, and a surface modification material having a vinyl group was produced in the same manner as in Example B1, and then used and implemented. In the same manner as in Example B1, a polyoxyxylene resin composition and a polyoxyxylene resin composite were produced, and various evaluations were carried out.

[實施例B5] [Example B5]

使用平均一次粒徑6nm之二氧化矽粒子(Snowtex XS,日產化學 工業公司製造)作為金屬氧化物粒子。 Using an average primary particle size of 6 nm of cerium oxide particles (Snowtex XS, Nissan Chemical Manufactured by an industrial company as a metal oxide particle.

於該二氧化矽粒子10g中添加甲苯82g、含甲氧基之苯基聚矽氧樹脂5g並進行混合,利用珠磨機進行6小時表面修飾處理後去除珠粒。繼而,添加乙基二氯矽烷(信越化學工業公司製造,LS140)3g,於130℃下、6小時環流下進行表面修飾及分散處理。藉由使所獲得之分散液通過填充有氧化鋁凝膠之管柱,而將氯化物離子去除至成為1質量ppm以下。再者,氯量係由氯離子計測定而得。其後,再次使表面修飾二氧化矽粒子分散於甲苯中,藉此製作藉由具有苯基之表面修飾材料及具有氫基之表面修飾材料而經表面處理之二氧化矽粒子之透明分散液。 To 10 g of the cerium oxide particles, 5 g of toluene and 5 g of a methoxypolyoxyl resin containing methoxy groups were added and mixed, and the surface modification treatment was performed for 6 hours in a bead mill to remove the beads. Then, 3 g of ethyl dichloromethane (manufactured by Shin-Etsu Chemical Co., Ltd., LS140) was added, and surface modification and dispersion treatment were carried out at 130 ° C under a 6-hour circulation. The chloride ion is removed to 1 mass ppm or less by passing the obtained dispersion liquid through a column filled with an alumina gel. Further, the amount of chlorine is determined by a chlorine ion meter. Thereafter, the surface-modified cerium oxide particles were again dispersed in toluene to prepare a transparent dispersion of cerium oxide particles surface-treated with a surface-modifying material having a phenyl group and a surface-modifying material having a hydrogen group.

繼而,利用與實施例B1相同之方式製作聚矽氧樹脂組合物及聚矽氧樹脂複合體,並進行各種評價。 Then, a polyfluorene oxide resin composition and a polyoxymethylene resin composite were produced in the same manner as in Example B1, and various evaluations were carried out.

[比較例B1] [Comparative Example B1]

於150℃下對於實施例B1中所使用之聚矽氧樹脂(但不添加金屬氧化物粒子)進行加熱處理3小時而硬化,對該硬化體進行與實施例B1相同之各種評價。 The polyoxyxylene resin used in Example B1 (but without the addition of metal oxide particles) was heat-treated at 150 ° C for 3 hours to be hardened, and the hardened body was subjected to various evaluations similar to those in Example B1.

[比較例B2] [Comparative Example B2]

於實施例B1之金屬氧化物粒子之表面修飾中,將二甲基乙氧基矽烷設為乙烯基三甲氧基矽烷,除此以外,利用與實施例B1相同之方式製作藉由具有苯基之表面修飾材料及具有乙烯基之表面修飾材料而經表面處理之氧化鋯粒子分散液,繼而,利用與實施例B1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 In the same manner as in Example B1, the surface modification of the metal oxide particles of Example B1 was carried out in the same manner as in Example B1 except that dimethyl ethoxy decane was used as the vinyl methoxy decane. a surface-modified material and a surface-treated zirconium oxide particle dispersion having a surface modification material of a vinyl group, and then a polyxanthoxy resin composition was produced in the same manner as in Example B1, thereby producing a polyoxymethylene resin composite, and Conduct various evaluations.

[比較例B3] [Comparative Example B3]

將實施例B1中之氧化鋯粒子之平均一次粒逕自4nm變更為20nm,除此以外,利用與實施例B1相同之方式製作藉由具有苯基之表 面修飾材料及具有氫基之表面修飾材料而經表面處理之氧化鋯粒子分散液,繼而,利用與實施例B1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 A table having a phenyl group was produced in the same manner as in Example B1 except that the average primary particle diameter of the zirconia particles in Example B1 was changed from 4 nm to 20 nm. a surface-treated zirconium oxide particle dispersion having a surface-modified material and a surface-modified material having a hydrogen-based surface, and then a polyfluorene oxide resin composition was produced in the same manner as in Example B1, thereby producing a polyoxymethylene resin composite, and Conduct various evaluations.

[比較例B4] [Comparative Example B4]

於實施例B3之金屬氧化物粒子之表面修飾中,將二乙氧基甲基矽烷及乙烯基三甲氧基矽烷之調配比設為以莫耳比計氫基/乙烯基=0.1,除此以外,利用與實施例B3相同之方式製作藉由具有苯基之表面修飾材料、具有氫基之表面修飾材料及具有乙烯基之表面修飾材料而經表面處理之氧化鋯粒子分散液,繼而,利用與實施例B1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 In the surface modification of the metal oxide particles of Example B3, the mixing ratio of diethoxymethyl decane and vinyl trimethoxy decane is set to be hydrogen ratio/vinyl group = 0.1 in terms of molar ratio, and A surface-treated zirconia particle dispersion having a surface modification material having a phenyl group, a surface modification material having a hydrogen group, and a surface modification material having a vinyl group was produced in the same manner as in Example B3, and then A polyoxyphthalocene resin composition was produced in the same manner as in Example B1, and a polyoxyxylene resin composite was produced, and various evaluations were carried out.

[比較例B5] [Comparative Example B5]

於實施例B1之金屬氧化物粒子之表面修飾中,將二甲基乙氧基矽烷設為十二烷基三甲氧基矽烷,除此以外,利用與實施例B1相同之方式製作藉由具有苯基之表面修飾材料及具有碳鏈之表面修飾材料而經表面處理之氧化鋯粒子分散液,繼而,利用與實施例B1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 In the same manner as in Example B1, the surface modification of the metal oxide particles of Example B1 was carried out in the same manner as in Example B1 except that dimethylethoxy decane was used as the dodecyltrimethoxydecane. A surface-modified zirconia particle dispersion having a surface-modified material and a surface modification material having a carbon chain, and then a polyfluorene oxide resin composition was produced in the same manner as in Example B1, thereby producing a polyoxyxylene resin composite. And conduct various evaluations.

[比較例B6] [Comparative Example B6]

將實施例B1中之氧化鋯粒子之平均一次粒逕自4nm設為2nm,除此以外,利用與實施例B1相同之方式製作藉由具有苯基之表面修飾材料及具有氫基之表面修飾材料而經表面處理之氧化鋯粒子分散液,繼而,利用與實施例B1相同之方式製作聚矽氧樹脂組合物,進而製作聚矽氧樹脂複合體,並進行各種評價。 A surface-modifying material having a phenyl group and a surface-modifying material having a hydrogen group were produced in the same manner as in Example B1 except that the average primary particle diameter of the zirconia particles in the example B1 was changed to 2 nm from 4 nm. The surface-treated zirconium oxide particle dispersion was prepared in the same manner as in Example B1, and a polyfluorene oxide resin composite was produced, and various evaluations were carried out.

將上述各實施例、比較例中之聚矽氧樹脂複合體之詳細內容及評價結果匯總示於第3表、第4表。 The details and evaluation results of the polyoxyxene resin composites in the above respective Examples and Comparative Examples are collectively shown in Tables 3 and 4.

於實施例B1~B5中,由於使用平均一次粒徑為3nm以上且10nm以下之金屬氧化物粒子,並藉由具有苯基及氫基之表面修飾材料對該粒子進行表面修飾,故而可以良好之狀態維持使用該表面修飾金屬氧化物粒子材料而製作之聚矽氧樹脂複合體之透光率、耐熱性、阻氣性。 In the examples B1 to B5, since the metal oxide particles having an average primary particle diameter of 3 nm or more and 10 nm or less are used, and the particles are surface-modified by a surface-modifying material having a phenyl group and a hydrogen group, it is good. The state maintains the light transmittance, heat resistance, and gas barrier properties of the polyoxymethylene resin composite produced by using the surface-modified metal oxide particle material.

尤其是關於阻氣性,對於作為基準之聚矽氧樹脂單體即比較例B1顯示出明確地提高,認為其係基於用作表面修飾材料之二甲基乙氧基矽烷、二乙氧基甲基矽烷及乙基二氯矽烷的表面修飾材料中之氫基與作為基質聚矽氧樹脂原料之OE-6520中之乙烯基於樹脂組合物之硬化時藉由矽氫化反應進行交聯反應而鍵結,使金屬氧化物粒子與基質聚矽氧樹脂一體化的效果。 In particular, regarding gas barrier properties, Comparative Example B1, which is a polyoxyxylene resin monomer as a reference, has been shown to be clearly improved, and is considered to be based on dimethyl ethoxy decane or diethoxymethyl used as a surface modifying material. The hydrogen group in the surface modifying material of the decane and ethyl dichlorodecane is bonded to the vinyl group in the OE-6520 as a raw material of the matrix polyoxyl resin by crosslinking reaction by hydrogenation reaction of hydrazine. The effect of integrating metal oxide particles with a matrix polyoxyl resin.

又,於該等實施例中,尤其是實施例B3、B4之阻氣性較高。認為其係不僅藉由表面修飾材料中之氫基與作為基質聚矽氧樹脂原料之OE-6520中之乙烯基之矽氫化反應所產生之交聯反應所形成之鍵結,而且亦藉由基於用作表面修飾材料之乙烯基三甲氧基矽烷的表面修飾材料中之乙烯基與作為基質聚矽氧樹脂原料之OE-6520中之氫基進行 交聯反應而鍵結,從而使金屬氧化物粒子與基質聚矽氧樹脂更牢固地一體化的效果。 Moreover, in these examples, in particular, Examples B3 and B4 have a high gas barrier property. It is believed that it is based not only on the bond formed by the hydrogenation reaction of the hydrogen group in the surface modification material with the hydrogenation reaction of the vinyl group in the OE-6520 which is the raw material of the matrix polyoxyl resin, but also based on The vinyl group in the surface modification material of the vinyl trimethoxy decane used as the surface modification material and the hydrogen group in the OE-6520 as the base material of the matrix polyoxyl resin The effect of bonding the metal oxide particles and the matrix polyoxyl resin more firmly by the crosslinking reaction and bonding.

另一方面,關於比較例B2,於耐熱性評價試驗後黃變。認為其原因在於:使用乙烯基三甲氧基矽烷而非二甲基乙氧基矽烷作為表面修飾材料,故而於聚矽氧樹脂複合體中過量地殘留有未反應之乙烯基。再者,雖然阻氣性與聚矽氧樹脂單體相比有所提高,但認為其係表面修飾材料中之乙烯基與作為基質聚矽氧樹脂原料之OE-6520中之氫基於樹脂組合物之硬化時藉由矽氫化反應而進行交聯反應的效果。 On the other hand, in Comparative Example B2, yellowing was observed after the heat resistance evaluation test. The reason for this is considered to be that vinyl trimethoxy decane is used instead of dimethyl ethoxy decane as a surface modifying material, so that unreacted vinyl groups remain excessively in the polyoxymethylene resin composite. Further, although the gas barrier property is improved as compared with the polyoxynoxy resin monomer, it is considered that the vinyl group in the surface modification material and the hydrogen in the OE-6520 which is the raw material of the matrix polyoxymethylene resin are based on the resin composition. The effect of the crosslinking reaction is carried out by a hydrogenation reaction during hardening.

又,關於比較例B3,光之透過率降低。認為其原因在於:由於金屬氧化物之粒徑較大,故而產生光之散射。 Further, regarding Comparative Example B3, the light transmittance was lowered. The reason is considered to be that scattering of light occurs due to the large particle size of the metal oxide.

又,關於比較例B4,於耐熱性評價試驗後黃變。認為其原因在於:使用二乙氧基甲基矽烷並且使用大量之乙烯基三甲氧基矽烷作為表面修飾材料,故而於聚矽氧樹脂複合體中過量地殘留有未反應之乙烯基。再者,雖然阻氣性與聚矽氧樹脂單體相比有所提高,但認為其係如下效果之併用:基於二乙氧基甲基矽烷之表面修飾材料中之氫基與作為基質聚矽氧樹脂原料之OE-6520中之乙烯基於樹脂組合物之硬化時藉由矽氫化反應而進行交聯聚合之效果、及表面修飾材料中之乙烯基與作為基質聚矽氧樹脂原料之OE-6520中之氫基於樹脂組合物之硬化時藉由矽氫化反應而進行交聯反應之效果。 Further, in Comparative Example B4, yellowing was observed after the heat resistance evaluation test. The reason is considered to be that diethoxymethyl decane is used and a large amount of vinyl trimethoxy decane is used as the surface modification material, so that unreacted vinyl groups remain excessively in the polyoxymethylene resin composite. Further, although the gas barrier property is improved as compared with the polyoxynoxy resin monomer, it is considered to be used in combination with the following effects: a hydrogen group in a surface modifying material based on diethoxymethyldecane and a polycondensation as a matrix The effect of crosslinking polymerization by the hydrogenation reaction of the vinyl group in the OE-6520 of the oxygen resin raw material during the curing of the resin composition, and the vinyl group in the surface modification material and the OE-6520 as the raw material of the matrix polyoxyl resin The hydrogen in the middle is subjected to a crosslinking reaction by a hydrogenation reaction upon hardening of the resin composition.

又,關於比較例B5,於耐熱性評價試驗後黃變。認為其原因在於:由於使用十二烷基三甲氧基矽烷而非二甲基乙氧基矽烷作為表面修飾材料,故而十二烷基三甲氧基矽烷之碳鏈部分熱變質。 Further, in Comparative Example B5, yellowing was observed after the heat resistance evaluation test. The reason is considered to be that since the dodecyltrimethoxydecane is used instead of dimethylethoxydecane as the surface modifying material, the carbon chain portion of dodecyltrimethoxydecane is thermally deteriorated.

又,關於比較例B6,透氣性較高而無法獲得充分之阻氣性。認為其原因在於:由於金屬氧化物之粒徑較小,聚矽氧樹脂組合物之黏度較高,故而作業性較差,密封本身無法充分地進行。 Further, in Comparative Example B6, the gas permeability was high and sufficient gas barrier properties could not be obtained. The reason for this is considered to be that since the particle diameter of the metal oxide is small, the viscosity of the polyoxymethylene resin composition is high, so workability is poor, and the seal itself cannot be sufficiently performed.

[產業上之可利用性] [Industrial availability]

本發明當然可用作半導體發光元件(LED等)之密封材料,且可於此外之各種工業領域中用作材料或構件等。 The present invention can of course be used as a sealing material for a semiconductor light-emitting element (LED or the like), and can be used as a material or a member or the like in various other industrial fields.

Claims (15)

一種表面修飾金屬氧化物粒子材料,其係藉由至少具有苯基、及可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基的表面修飾材料對平均一次粒徑為3nm以上且10nm以下之金屬氧化物粒子進行表面修飾而成。 A surface-modified metal oxide particle material having a mean primary particle diameter of 3 nm or more by a surface-modifying material having at least a phenyl group and a group capable of crosslinking reaction with a functional group in a polyfluorene-oxygen resin-forming component The metal oxide particles of 10 nm or less are surface-modified. 如請求項1之表面修飾金屬氧化物粒子材料,其中上述可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基為烯基。 The surface-modified metal oxide particle material according to claim 1, wherein the group which can be cross-linked with the functional group in the polyfluorene oxide-forming component is an alkenyl group. 如請求項1之表面修飾金屬氧化物粒子材料,其中上述可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基為氫基。 The surface-modified metal oxide particle material according to claim 1, wherein the group which can be cross-linked with the functional group in the polyanthracene resin-forming component is a hydrogen group. 如請求項1之表面修飾金屬氧化物粒子材料,其中上述可與聚矽氧樹脂形成成分中之官能基進行交聯反應之基為烯基及氫基。 The surface-modified metal oxide particle material according to claim 1, wherein the group which can be cross-linked with the functional group in the polyfluorene oxide-forming component is an alkenyl group and a hydrogen group. 一種分散液,其含有如請求項1至4中任一項之表面修飾金屬氧化物粒子材料。 A dispersion containing the surface-modified metal oxide particle material according to any one of claims 1 to 4. 一種聚矽氧樹脂組合物,其包含如請求項1之表面修飾金屬氧化物粒子材料、及含有選自苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上之聚矽氧樹脂形成成分,且該聚矽氧樹脂形成成分具有可與上述表面修飾金屬氧化物粒子材料中使用之表面修飾材料所具有之基進行交聯反應之官能基。 A polyoxyxylene resin composition comprising the surface-modified metal oxide particle material of claim 1 and one or more selected from the group consisting of a phenyl polyoxyl resin forming component and a methylphenyl polyoxyl resin forming component. The polyoxynene resin forming component has a functional group capable of crosslinking reaction with a group of the surface modifying material used in the surface-modified metal oxide particle material. 一種聚矽氧樹脂組合物,其包含如請求項2之表面修飾金屬氧化物粒子材料、及含有選自苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上之聚矽氧樹脂形成成分,且該聚矽氧樹脂形成成分具有氫基。 A polyoxyxylene resin composition comprising the surface-modified metal oxide particle material of claim 2, and one or more selected from the group consisting of a phenyl polyoxyl resin forming component and a methylphenyl polyoxyl resin forming component. The polyoxyxene resin forms a component, and the polyoxymethylene resin forming component has a hydrogen group. 一種聚矽氧樹脂組合物,其包含如請求項3之表面修飾金屬氧化物粒子材料、及含有選自苯基聚矽氧樹脂形成成分及甲基苯基 聚矽氧樹脂形成成分中之一種以上之聚矽氧樹脂形成成分,且該聚矽氧樹脂形成成分具有選自烯基及炔基中之一種以上。 A polyoxyxylene resin composition comprising the surface-modified metal oxide particle material of claim 3, and a component selected from the group consisting of phenyl polyoxyl resin and methylphenyl One or more polyoxyphthalocene resin forming components of the polyoxyphthalocene resin forming component, and the polyoxyxylene resin forming component has one or more selected from the group consisting of an alkenyl group and an alkynyl group. 一種聚矽氧樹脂組合物,其包含如請求項4之表面修飾金屬氧化物粒子材料、及含有選自苯基聚矽氧樹脂形成成分及甲基苯基聚矽氧樹脂形成成分中之一種以上之聚矽氧樹脂形成成分,且該聚矽氧樹脂形成成分具有選自烯基及炔基中之一種以上、以及氫基。 A polyoxyxylene resin composition comprising the surface-modified metal oxide particle material of claim 4, and one or more selected from the group consisting of a phenyl polyoxyl resin forming component and a methylphenyl polyoxyl resin forming component. The polyoxyphthalocene resin forming component has one or more selected from the group consisting of an alkenyl group and an alkynyl group, and a hydrogen group. 如請求項6至9中任一項之聚矽氧樹脂組合物,其係含有上述金屬氧化物粒子5質量%以上而成。 The polyoxyxylene resin composition according to any one of claims 6 to 9, which comprises the above metal oxide particles in an amount of 5 mass% or more. 如請求項6至10中任一項之聚矽氧樹脂組合物,其進而含有矽氫化觸媒。 The polyoxyxylene resin composition according to any one of claims 6 to 10, which further contains a rhodium hydrogenation catalyst. 一種聚矽氧樹脂複合體,其係使如請求項6至11中任一項之聚矽氧樹脂組合物硬化而成。 A polyoxyxylene resin composite obtained by hardening the polyoxyxylene resin composition according to any one of claims 6 to 11. 一種光半導體發光裝置,其係藉由密封材料密封半導體發光元件而成者,並且上述密封材料包含如請求項12之聚矽氧樹脂複合體,且包含該密封材料之密封層之厚度為50μm以上。 An optical semiconductor light-emitting device which is obtained by sealing a semiconductor light-emitting element with a sealing material, wherein the sealing material comprises the polyoxymethylene resin composite according to claim 12, and a sealing layer containing the sealing material has a thickness of 50 μm or more . 一種照明裝置,其係具備如請求項13之光半導體發光裝置而成。 An illumination device comprising the optical semiconductor light-emitting device of claim 13. 一種液晶圖像裝置,其係具備如請求項13之光半導體發光裝置而成。 A liquid crystal image device comprising the optical semiconductor light-emitting device of claim 13.
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