[go: up one dir, main page]

TW201404754A - Method for producing plate glass - Google Patents

Method for producing plate glass Download PDF

Info

Publication number
TW201404754A
TW201404754A TW102117436A TW102117436A TW201404754A TW 201404754 A TW201404754 A TW 201404754A TW 102117436 A TW102117436 A TW 102117436A TW 102117436 A TW102117436 A TW 102117436A TW 201404754 A TW201404754 A TW 201404754A
Authority
TW
Taiwan
Prior art keywords
glass
mgo
mol
cao
sro
Prior art date
Application number
TW102117436A
Other languages
Chinese (zh)
Inventor
Shiro Tanii
Hirofumi Tokunaga
Tomoyuki Tsujimura
Manabu Nishizawa
Akio Koike
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of TW201404754A publication Critical patent/TW201404754A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B25/00Annealing glass products
    • C03B25/04Annealing glass products in a continuous way
    • C03B25/06Annealing glass products in a continuous way with horizontal displacement of the glass products
    • C03B25/08Annealing glass products in a continuous way with horizontal displacement of the glass products of glass sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

The present invention relates to a method for producing plate glass by melting glass starting materials to form a molten glass, then molding the molten glass into plate-like glass ribbons using a molding device, and gradually cooling the glass ribbons with a gradual cooling device, wherein by means of the method for producing plate glass, the plate glass is formed from the following alkali-free glass and SO2 gas is fed such that when the strain point of the alkali-free glass is Tst ( C), the time when the ambient air concentration directly underneath the bottom surface of the glass ribbons becomes 500 to 20,000 ppm is 30 seconds or greater at a temperature within a range of Tst + 70 C to Tst - 50 C. By mol% in terms of oxide, the alkali-free glass comprises 66 to 70 of SiO2, 12 to 15 of Al2O3, 0 to 1.5 of B2O3, greater than 9.5 but no greater than 13 of MgO, 4 to 9 of CaO, 0.5 to 4.5 of SrO, 0 to 1 of BaO, and 0 to 2 of ZrO2 such that MgO + CaO + SrO + BaO is 17 to 21, MgO/(MgO + CaO + SrO + BaO) is 0.40 or greater, MgO/(MgO + CaO) is 0.40 or greater, and MgO/(MgO + SrO) is 0.60 or greater, and has a stress point of 710 to 750 C, an average thermal expansion coefficient at 50 to 300 C of 30 10-7 to 43 10-7/ C, a temperature T2 at which glass viscosity becomes 102dPas of 1,710 C, and a temperature T4 at which glass viscosity becomes 104dPas of 1,320 C.

Description

板玻璃之製造方法 Plate glass manufacturing method

本發明係關於一種作為各種顯示器用基板玻璃或光罩用基板玻璃較佳之包含無鹼玻璃之板玻璃的製造方法。 The present invention relates to a method for producing a sheet glass which is preferably an alkali-free glass as a substrate glass for various displays or a substrate glass for a photomask.

以下,於本說明書中,於稱作「無鹼」之情形時,意指鹼金屬氧化物(Li2O、Na2O、K2O)之含量為2000莫耳ppm以下。 Hereinafter, in this specification, when referred to the case of "alkali-free" it is meant an alkali metal oxides (Li 2 O, Na 2 O , K 2 O) content of 2000 ppm by mole.

先前,各種顯示器用基板玻璃、尤其是表面形成金屬或氧化物薄膜等者被要求有以下所示之特性。 Conventionally, various substrate glass for display, particularly a metal or oxide film formed on the surface, are required to have the following characteristics.

(1)若含有鹼金屬氧化物,則鹼金屬離子擴散至薄膜中而使膜特性劣化,故而要求鹼金屬氧化物之含量極低,具體而言,要求鹼金屬氧化物之含量為2000莫耳ppm以下。 (1) If an alkali metal oxide is contained, the alkali metal ion diffuses into the film to deteriorate the film properties, so that the content of the alkali metal oxide is required to be extremely low, specifically, the content of the alkali metal oxide is required to be 2000 moles. Below ppm.

(2)於薄膜形成步驟中暴露於高溫下時,為可將玻璃之變形及伴隨玻璃之結構穩定化之收縮(熱縮)抑制為最小限,要求應變點較高。 (2) When exposed to a high temperature in the film forming step, the shrinkage (heat shrinkage) which suppresses the deformation of the glass and the structure of the glass is suppressed to a minimum, and the strain point is required to be high.

(3)要求對半導體形成所使用之各種化學品具有充分之化學耐久性。尤其是對ITO(Indium Tin Oxides,氧化銦錫)之蝕刻所使用之含有鹽酸之化學藥品、金屬電極之蝕刻所使用之各種酸(硝酸、硫酸等)、光阻剝離液之鹼等具有耐久性。 (3) It is required to have sufficient chemical durability for various chemicals used in semiconductor formation. In particular, it is durable in various chemicals (nitric acid, sulfuric acid, etc.) used in the etching of ITO (Indium Tin Oxides), a chemical containing a hydrochloric acid, a metal electrode, and a base of a photoresist stripper. .

(4)要求內部及表面無缺陷(氣泡、條紋、內含物、坑、損傷等)。 (4) Requires internal and surface defects (bubbles, streaks, inclusions, pits, damage, etc.).

除上述要求以外,近年來處於如下所述之狀況。 In addition to the above requirements, in recent years, the situation is as follows.

(5)要求顯示器之輕量化,玻璃自身亦希望為密度較小之玻璃。 (5) The weight of the display is required, and the glass itself is also expected to be a glass having a lower density.

(6)要求顯示器之輕量化,希望基板玻璃之薄板化。 (6) It is required to reduce the weight of the display, and it is desirable to thin the substrate glass.

(7)除至今為止之非晶矽(a-Si)型液晶顯示器以外,開始製作若干熱處理溫度較高之多晶矽(p-Si)型液晶顯示器(a-Si:約350℃→p-Si:350~550℃)。 (7) In addition to the amorphous germanium (a-Si) type liquid crystal display up to now, a number of polycrystalline germanium (p-Si) type liquid crystal displays having a higher heat treatment temperature (a-Si: about 350 ° C → p-Si: 350~550°C).

(8)為加快液晶顯示器製作熱處理之升降溫速度而提高生產性或提高耐熱衝擊性,要求玻璃之平均熱膨脹係數較小之玻璃。 (8) In order to accelerate the temperature rise and fall of the heat treatment of the liquid crystal display to improve productivity or to improve thermal shock resistance, glass having a small average thermal expansion coefficient of glass is required.

另一方面,蝕刻之乾燥化發展,對耐BHF性之要求變弱(BHF:緩衝氫氟酸,氫氟酸與氟化銨之混合液)。至今為止之玻璃係為使耐BHF性變好,大多使用含有B2O3 6~10莫耳%之玻璃。但,B2O3有降低應變點之傾向。作為不含B2O3或含量較少之無鹼玻璃之例,有如下所述者。 On the other hand, the drying of etching progresses, and the requirement for BHF resistance is weakened (BHF: buffered hydrofluoric acid, a mixture of hydrofluoric acid and ammonium fluoride). Based glass so far as the BHF resistance becomes good is often used a glass containing B 2 O 3 6 ~ 10 mole% of the. However, B 2 O 3 has a tendency to lower the strain point. As an example of the alkali-free glass containing no B 2 O 3 or a small amount, there are the following.

專利文獻1中揭示有不含B2O3之SiO2-Al2O3-SrO玻璃,但熔解所需之溫度較高,於製造上產生困難。 Patent Document 1 discloses a SiO 2 -Al 2 O 3 -SrO glass containing no B 2 O 3 , but the temperature required for melting is high, which causes difficulty in production.

專利文獻2中揭示有不含B2O3之SiO2-Al2O3-SrO晶質玻璃,但熔解所需之溫度較高,於製造上產生困難。 Patent Document 2 discloses a SiO 2 -Al 2 O 3 -SrO crystal glass containing no B 2 O 3 , but the temperature required for melting is high, which causes difficulty in production.

專利文獻3中揭示有含有B2O3 0~3重量%之玻璃,但實施例之應變點為690℃以下。 Patent Document 3 discloses a glass containing B 2 O 3 0 to 3% by weight, but the strain point of the example is 690 ° C or lower.

專利文獻4中揭示有含有B2O3 0~5莫耳%之玻璃,但於50~300℃下之平均熱膨脹係數超過50×10-7/℃。 Patent Document 4 discloses a glass containing B 2 O 3 0 to 5 mol%, but the average thermal expansion coefficient at 50 to 300 ° C exceeds 50 × 10 -7 / ° C.

專利文獻5中揭示有含有B2O3 0~5莫耳%之玻璃,但熱膨脹較大,密度亦較大。 Patent Document 5 discloses a glass containing B 2 O 3 0 to 5 mol%, but has a large thermal expansion and a large density.

為解決專利文獻1~5中記載之玻璃之問題,提出專利文獻6中記載之無鹼玻璃。專利文獻6中記載之無鹼玻璃係製成應變點較高,可利用浮式法而成形,適合顯示器用基板、光罩用基板等用途。 In order to solve the problem of the glass described in Patent Documents 1 to 5, the alkali-free glass described in Patent Document 6 is proposed. The alkali-free glass described in Patent Document 6 has a high strain point and can be molded by a floating method, and is suitable for applications such as a substrate for a display and a substrate for a photomask.

然而,作為高品質之p-Si TFT(p-Si Thin Film Transistor,多晶矽薄膜電晶體)之製造方法,有固相結晶法,為實施此方法,要求進一步提高應變點。 However, as a method for producing a high-quality p-Si TFT (p-Si Thin Film Transistor), there is a solid phase crystallization method, and in order to carry out this method, it is required to further increase the strain point.

另一方面,就玻璃製造製程、尤其是熔解、成形之要求而言,要求降低玻璃之黏性,尤其是玻璃黏度成為104dPa.s之溫度T4On the other hand, in terms of the glass manufacturing process, especially the requirements of melting and forming, it is required to reduce the viscosity of the glass, especially the glass viscosity becomes 10 4 dPa. s temperature T 4 .

又,為防止成形為板狀後之玻璃帶之劃傷,已知有如下方法:對成形後之玻璃帶於緩冷爐內吹送亞硫酸(SO2)氣體,於玻璃帶之下表面形成包含硫酸鹽之防損傷用保護層(參照專利文獻7)。 Further, in order to prevent scratching of the glass ribbon formed into a plate shape, a method is known in which a glass ribbon after molding is blown into a slow cooling furnace to emit sulfurous acid (SO 2 ) gas, and the glass ribbon is formed on the lower surface of the glass ribbon. A protective layer for sulfate damage prevention (see Patent Document 7).

然而,於無鹼玻璃之情形時,存在如下情況:難以效率良好地於玻璃帶上形成防損傷用保護層,雖然進行設備方面之研究,但存在設備構成上之制約等。 However, in the case of an alkali-free glass, it is difficult to form a protective layer for damage prevention on the glass ribbon efficiently, and although research on equipment is carried out, there are restrictions on the configuration of the apparatus.

先前技術文獻Prior technical literature 專利文獻Patent literature

專利文獻1:日本專利特開昭62-113735號公報 Patent Document 1: Japanese Patent Laid-Open No. 62-113735

專利文獻2:日本專利特開昭62-100450號公報 Patent Document 2: Japanese Patent Laid-Open No. 62-100450

專利文獻3:日本專利特開平4-325435號公報 Patent Document 3: Japanese Patent Laid-Open No. 4-325435

專利文獻4:日本專利特開平5-232458號公報 Patent Document 4: Japanese Patent Laid-Open No. Hei 5-232458

專利文獻5:美國專利第5326730號說明書 Patent Document 5: US Patent No. 5,326,730

專利文獻6:日本專利特開平10-45422號公報 Patent Document 6: Japanese Patent Laid-Open No. Hei 10-45422

專利文獻7:日本專利再公表2009-148141號公報 Patent Document 7: Japanese Patent Laid-Open Publication No. 2009-148141

本發明之目的在於解決上述缺陷,提供一種板玻璃之製造方法,該板玻璃應變點較高,且低黏性,尤其是玻璃黏度成為104dPa.s之溫度T4較低,進而,可效率良好地於成形為板狀後之玻璃帶上形成包含硫酸鹽之防損傷用保護層,並包含無鹼玻璃。 The object of the present invention is to solve the above drawbacks, and to provide a method for manufacturing a sheet glass, which has a high strain point and low viscosity, especially a glass viscosity of 10 4 dPa. The temperature T 4 of s is low, and further, the protective layer for preventing damage of sulfate is formed on the glass ribbon formed into a plate shape efficiently, and the alkali-free glass is contained.

本發明提供一種板玻璃製造方法,其係熔解玻璃原料並製成熔融玻璃,利用成形裝置使該熔融玻璃成形為板狀之玻璃帶之後,利用 緩冷裝置對該玻璃帶進行緩冷者,上述板玻璃包含下述無鹼玻璃,將上述無鹼玻璃之應變點設為Tst(℃)時,於Tst+70℃~Tst-50℃之溫度區域,以上述玻璃帶之下表面正下方之環境濃度成為500~20000ppm之時間為30秒以上之方式供給SO2氣體。 The present invention provides a method for producing a sheet glass, which comprises melting a glass raw material and forming a molten glass, and forming the molten glass into a sheet-shaped glass ribbon by a molding device, and then slowly cooling the glass ribbon by a slow cooling device, the plate The glass comprises the following alkali-free glass. When the strain point of the alkali-free glass is T st (° C.), the temperature is in the range of T st +70 ° C to T st -50 ° C, directly below the lower surface of the glass ribbon. The SO 2 gas is supplied so that the environmental concentration becomes 500 to 20,000 ppm for 30 seconds or longer.

上述無鹼玻璃應變點為710~750℃,於50~300℃下之平均熱膨脹係數為30×10-7~43×10-7/℃,玻璃黏度成為102dPa.s之溫度T2為1710℃以下,玻璃黏度成為104dPa.s之溫度T4為1320℃以下,以氧化物基準之莫耳%表示含有:SiO2 66~70莫耳%、Al2O3 12~15莫耳%、B2O3 0~1.5莫耳%、MgO 超過9.5莫耳%且為13莫耳%以下、CaO 4~9莫耳%、SrO 0.5~4.5莫耳%、BaO 0~1莫耳%、ZrO2 0~2莫耳%,且MgO+CaO+SrO+BaO為17~21莫耳%,MgO/(MgO+CaO+SrO+BaO)為0.40以上,MgO/(MgO+CaO)為0.40以上,MgO/(MgO+SrO)為0.60以上。 The alkali-free glass has a strain point of 710 to 750 ° C, an average thermal expansion coefficient of 30×10 -7 to 43×10 -7 /° C. at 50 to 300 ° C, and a glass viscosity of 10 2 dPa. The temperature T 2 of s is below 1710 ° C, and the glass viscosity is 10 4 dPa. The temperature T 4 of s is 1320 ° C or less, and the mole % based on the oxide is contained: SiO 2 66-70 mol%, Al 2 O 3 12-15 mol%, B 2 O 3 0-1.5 mol %, MgO more than 9.5 mole% and 13 mole% or less, CaO 4 ~ 9 mole%, SrO 0.5 ~ 4.5 mole%, BaO 0 ~ 1 mole%, ZrO 2 0 ~ 2 mole%, and MgO+CaO+SrO+BaO is 17-21 mol%, MgO/(MgO+CaO+SrO+BaO) is 0.40 or more, MgO/(MgO+CaO) is 0.40 or more, and MgO/(MgO+SrO) is 0.60. the above.

又,本發明提供一種板玻璃製造方法,其係熔解玻璃原料並製成熔融玻璃,利用成形裝置使該熔融玻璃成形為板狀之玻璃帶之後,利用緩冷裝置對該玻璃帶進行緩冷者,上述板玻璃包含下述無鹼玻璃,將上述無鹼玻璃之應變點設為Tst(℃)時,於Tst+70℃~Tst-50℃之溫度區域,以上述玻璃帶之下表面正下方之環境濃度成為500 ~20000ppm之時間為30秒以上之方式供給SO2氣體。 Moreover, the present invention provides a method for producing a sheet glass which is obtained by melting a glass raw material and forming a molten glass, and forming the molten glass into a plate-shaped glass ribbon by a molding device, and then slowly cooling the glass ribbon by a slow cooling device. The plate glass includes the following alkali-free glass. When the strain point of the alkali-free glass is T st (° C.), the surface of the glass ribbon is in a temperature range of T st +70 ° C to T st -50 ° C. The SO 2 gas is supplied so that the environmental concentration immediately below is 500 to 20000 ppm for 30 seconds or longer.

上述無鹼玻璃應變點為710~750℃,於50~300℃下之平均熱膨脹係數為30×10-7~43×10-7/℃,玻璃黏度成為102dPa.s之溫度T2為1710℃以下,玻璃黏度成為104dPa.s之溫度T4為1320℃以下,以氧化物基準之莫耳%表示含有:SiO2 66~70莫耳%、Al2O3 12~15莫耳%、B2O3 0~1.5莫耳%、MgO 5~9.5莫耳%、CaO 4~11莫耳%、SrO 0.5~4.5莫耳%、BaO 0~1莫耳%、ZrO2 0~2莫耳%,且MgO+CaO+SrO+BaO超過18.2莫耳%且為21莫耳%以下,MgO/(MgO+CaO+SrO+BaO)為0.25以上,MgO/(MgO+CaO)為0.3以上,MgO/(MgO+SrO)為0.60以上,Al2O3×(MgO/(MgO+CaO+SrO+BaO))為5.5以上。 The alkali-free glass has a strain point of 710 to 750 ° C, an average thermal expansion coefficient of 30×10 -7 to 43×10 -7 /° C. at 50 to 300 ° C, and a glass viscosity of 10 2 dPa. The temperature T 2 of s is below 1710 ° C, and the glass viscosity is 10 4 dPa. s the temperature T 4 at 1320 ℃, the mole% based on oxides represented containing: SiO 2 66 ~ 70 mole%, Al 2 O 3 12 ~ 15 mole%, B 2 O 3 0 ~ 1.5 mole %, MgO 5~9.5 mol%, CaO 4~11 mol%, SrO 0.5~4.5 mol%, BaO 0~1 mol%, ZrO 2 0~2 mol%, and MgO+CaO+SrO+ BaO is more than 18.2% by mole and is 21% by mole or less, MgO/(MgO+CaO+SrO+BaO) is 0.25 or more, MgO/(MgO+CaO) is 0.3 or more, and MgO/(MgO+SrO) is 0.60 or more. Al 2 O 3 × (MgO/(MgO+CaO+SrO+BaO)) is 5.5 or more.

又,本發明提供一種利用本發明之板玻璃製造方法製造而成之板玻璃。 Further, the present invention provides a sheet glass produced by the method for producing a sheet glass of the present invention.

本發明之板玻璃製造方法可效率良好且均勻地於玻璃帶上形成硫酸鹽之防損傷用保護層,並且亦可節約亞硫酸氣體之供給量。其結果為,可獲得損傷較少之高品質板玻璃。 The method for producing a sheet glass of the present invention can form a protective layer for sulfate damage prevention on a glass ribbon efficiently and uniformly, and can also save the supply amount of sulfurous acid gas. As a result, high quality sheet glass with less damage can be obtained.

本發明之板玻璃尤其適合高應變點用途之顯示器用基板、光罩用基板等。 The sheet glass of the present invention is particularly suitable for a substrate for a display for high strain point applications, a substrate for a photomask, and the like.

以下,說明本發明之板玻璃製造方法。 Hereinafter, a method for producing a sheet glass of the present invention will be described.

本發明之板玻璃之製造方法使用以成為下述玻璃組成1之方式調合而成之玻璃原料。 The method for producing the sheet glass of the present invention is a glass material obtained by blending the glass composition 1 described below.

一種無鹼玻璃,其以氧化物基準之莫耳%表示含有:SiO2 66~70莫耳%、Al2O3 12~15莫耳%、B2O3 0~1.5莫耳%、MgO 超過9.5莫耳%且為13莫耳%以下、CaO 4~9莫耳%、SrO 0.5~4.5莫耳%、BaO 0~1莫耳%、ZrO2 0~2莫耳%,且MgO+CaO+SrO+BaO為17~21莫耳%,MgO/(MgO+CaO+SrO+BaO)為0.40以上,MgO/(MgO+CaO)為0.40以上,MgO/(MgO+SrO)為0.60以上。 An alkali-free glass containing SiO 2 66-70 mol%, Al 2 O 3 12-15 mol%, B 2 O 3 0-1.5 mol%, and MgO exceeding 9.5 mol% and 13 mol% or less, CaO 4-9 mol%, SrO 0.5-4.5 mol%, BaO 0~1 mol%, ZrO 2 0-2 mol%, and MgO+CaO+ SrO+BaO is 17 to 21 mol%, MgO/(MgO+CaO+SrO+BaO) is 0.40 or more, MgO/(MgO+CaO) is 0.40 or more, and MgO/(MgO+SrO) is 0.60 or more.

又,本發明之板玻璃製造方法使用以成為下述玻璃組成2之方式調合而成之玻璃原料。 Moreover, the method for producing a sheet glass of the present invention uses a glass raw material obtained by blending the glass composition 2 described below.

一種無鹼玻璃,其以氧化物基準之莫耳%表示含有:SiO2 66~70莫耳%、Al2O3 12~15莫耳%、B2O3 0~1.5莫耳%、MgO 5~9.5莫耳%、CaO 4~11莫耳%、SrO 0.5~4.5莫耳%、 BaO 0~1莫耳%、ZrO2 0~2莫耳%,且MgO+CaO+SrO+BaO超過18.2莫耳%且為21莫耳%以下,MgO/(MgO+CaO+SrO+BaO)為0.25以上,MgO/(MgO+CaO)為0.3以上,MgO/(MgO+SrO)為0.60以上,Al2O3×(MgO/(MgO+CaO+SrO+BaO))為5.5以上。 An alkali-free glass containing SiO 2 66-70 mol%, Al 2 O 3 12-15 mol%, B 2 O 3 0-1.5 mol%, MgO 5 ~9.5 mol%, CaO 4~11 mol%, SrO 0.5~4.5 mol%, BaO 0~1 mol%, ZrO 2 0~2 mol%, and MgO+CaO+SrO+BaO exceeds 18.2 mo % of ear is 21 mol% or less, MgO/(MgO+CaO+SrO+BaO) is 0.25 or more, MgO/(MgO+CaO) is 0.3 or more, and MgO/(MgO+SrO) is 0.60 or more, and Al 2 O 3 × (MgO / (MgO + CaO + SrO + BaO)) is 5.5 or more.

其次,對各成分之組成範圍進行說明。於SiO2未達66%(莫耳%,以下只要無特別記載則相同)時,應變點未充分提高,且熱膨脹係數增大,密度上升。較佳為66.5%以上,更佳為67%以上。於超過70%時,熔解性降低,失透溫度上升。較佳為69%以下。 Next, the composition range of each component will be described. When SiO 2 is less than 66% (% by mole, unless otherwise specified, the strain point is not sufficiently increased, the coefficient of thermal expansion is increased, and the density is increased. It is preferably 66.5% or more, more preferably 67% or more. When it exceeds 70%, the meltability is lowered and the devitrification temperature is increased. It is preferably 69% or less.

Al2O3抑制玻璃之分相性,降低熱膨脹係數,提高應變點,但於未達12%時不顯示該效果,又,由於增加其他提高膨脹之成分,結果熱膨脹變大。較佳為12.2%以上。於超過15%時,有玻璃之熔解性變差、或使失透溫度上升之虞。較佳為14.5%以下,更佳為14%以下,進而較佳為13.8%以下。 Al 2 O 3 as glass suppress phase separation, lower coefficient of thermal expansion, increase the strain point, but less than 12% at the time does not show this effect, and, due to the increase of other ingredients to improve the expansion, the results of the thermal expansion becomes large. It is preferably 12.2% or more. When it exceeds 15%, there is a possibility that the melting property of the glass is deteriorated or the devitrification temperature is raised. It is preferably 14.5% or less, more preferably 14% or less, still more preferably 13.8% or less.

B2O3使玻璃之熔解反應性變好,又,使失透溫度降低,故而可添加至多1.5%。但,若過多則應變點變低。又,若B2O3過多,則於玻璃帶上形成硫酸鹽之防損傷用保護層時效率降低。 B 2 O 3 improves the melt reactivity of the glass and lowers the devitrification temperature, so that it can be added up to 1.5%. However, if it is too much, the strain point becomes low. Further, when the amount of B 2 O 3 is too large, the efficiency of the sulfate-preventing protective layer on the glass ribbon is lowered.

因此,較佳為1.3%以下,更佳為1%以下。又,若考慮環境負荷,則較佳為實質上不含。 Therefore, it is preferably 1.3% or less, more preferably 1% or less. Further, in consideration of the environmental load, it is preferably substantially absent.

MgO係於鹼土類中具有不增大膨脹、且不過度降低應變點之特徵,亦提高熔解性。 MgO has the characteristics of not increasing the expansion in the alkaline earth and not excessively reducing the strain point, and also improving the meltability.

此處,於玻璃組成1中,MgO含量超過9.5%且為13%以下。於9.5%以下時,上述之由添加MgO所得之效果未充分表現。但,若超過13%,則有失透溫度上升之虞。較佳為12.5%以下,更佳為12%以下,進而較佳為11.5%以下。 Here, in the glass composition 1, the MgO content is more than 9.5% and 13% or less. When it is 9.5% or less, the above effect by adding MgO is not sufficiently exhibited. However, if it exceeds 13%, the devitrification temperature rises. It is preferably 12.5% or less, more preferably 12% or less, still more preferably 11.5% or less.

另一方面,於玻璃組成2中,MgO含量為5~9.5%。於未達5%時,上述之由添加MgO所得之效果未充分表現。較佳為6%以上,更佳為7%以上。但,若超過9.5%,則有失透溫度上升之虞。較佳為9.3%以下,更佳為9%以下。 On the other hand, in the glass composition 2, the MgO content is 5 to 9.5%. When the amount is less than 5%, the above effect by adding MgO is not sufficiently exhibited. It is preferably 6% or more, more preferably 7% or more. However, if it exceeds 9.5%, there is a possibility that the devitrification temperature rises. It is preferably 9.3% or less, more preferably 9% or less.

CaO係繼MgO於鹼土類中具有不增大膨脹、且不過度降低應變點之特徵,亦提高熔解性。 The CaO system has the characteristics that the MgO does not increase the swelling in the alkaline earth and does not excessively reduce the strain point, and also improves the meltability.

此處,於玻璃組成1中,CaO含量為4~9%。於未達4%時,上述之由添加CaO所得之效果未充分表現。但,若超過9%,則有失透溫度上升或CaO原料即石灰石(CaCO3)中之雜質即磷大量混入之虞。較佳為7%以下,更佳為6%以下,進而較佳為5%以下。 Here, in the glass composition 1, the CaO content is 4 to 9%. When the amount is less than 4%, the above effect of adding CaO is not sufficiently exhibited. However, if it exceeds 9%, the devitrification temperature rises or a large amount of phosphorus, which is an impurity in limestone (CaCO 3 ), which is a CaO raw material, is mixed. It is preferably 7% or less, more preferably 6% or less, further preferably 5% or less.

另一方面,於玻璃組成2中,CaO含量為4~11%。於未達4%時,上述之由添加CaO所得之效果未充分表現。較佳為5%以上。但,若超過11%,則有失透溫度上升或CaO原料即石灰石(CaCO3)中之雜質即磷大量混入之虞。較佳為10%以下,更佳為9%以下,進而較佳為7%以下,特佳為6%以下。 On the other hand, in the glass composition 2, the CaO content is 4 to 11%. When the amount is less than 4%, the above effect of adding CaO is not sufficiently exhibited. It is preferably 5% or more. However, if it exceeds 11%, the devitrification temperature rises or a large amount of phosphorus, which is an impurity in limestone (CaCO 3 ), which is a CaO raw material, is mixed. It is preferably 10% or less, more preferably 9% or less, further preferably 7% or less, and particularly preferably 6% or less.

SrO不使玻璃之失透溫度上升而使熔解性提高,但於未達0.5%時該效果不充分表現。較佳為1.0%以上,進而較佳為2.0%以上。但,若超過4.5%,則有膨脹係數增大之虞。更佳為4.0%以下,進而較佳為3.5%以下。 SrO does not increase the devitrification temperature of the glass to improve the meltability, but the effect is not sufficiently exhibited when it is less than 0.5%. It is preferably 1.0% or more, and more preferably 2.0% or more. However, if it exceeds 4.5%, there is a tendency for the expansion coefficient to increase. It is more preferably 4.0% or less, further preferably 3.5% or less.

BaO並非必需,但為提高熔解性可含有。但,若過多則過度增加玻璃之膨脹與密度,故而設為1%以下。較佳為未達1%,更佳為0.5%以下,進而較佳為實質上不含。 BaO is not essential, but may be contained to improve meltability. However, if it is too large, the expansion and density of the glass are excessively increased, so that it is 1% or less. It is preferably less than 1%, more preferably 0.5% or less, and further preferably substantially not contained.

為使玻璃熔融溫度降低,或為促進煅燒時之結晶析出,ZrO2可含有至多2%。於超過2%時,玻璃變得不穩定,或玻璃之相對介電常數ε變大。較佳為1.5%以下,更佳為1.0%以下,進而較佳為0.5%以下,特佳為實質上不含。 ZrO 2 may contain up to 2% in order to lower the glass melting temperature or to promote crystallization during calcination. When it exceeds 2%, the glass becomes unstable, or the relative dielectric constant ε of the glass becomes large. It is preferably 1.5% or less, more preferably 1.0% or less, still more preferably 0.5% or less, and particularly preferably substantially not contained.

於玻璃組成1中,若MgO、CaO、SrO、BaO之合量少於17%,則熔解性不足,又,於玻璃帶上形成硫酸鹽之防損傷用保護層時效率降低。較佳為18%以上,進而較佳為18.5%以上。若多於21%,則有產生無法減小熱膨脹係數之難點之虞。較佳為20%以下。 In the glass composition 1, when the total amount of MgO, CaO, SrO, and BaO is less than 17%, the meltability is insufficient, and the efficiency of the sulfate-preventing protective layer on the glass ribbon is lowered. It is preferably 18% or more, and more preferably 18.5% or more. If it is more than 21%, there is a difficulty in that the coefficient of thermal expansion cannot be reduced. It is preferably 20% or less.

於玻璃組成2中,若MgO、CaO、SrO、BaO之合量為18.2%以下,則熔解性不足,又,於玻璃帶上形成硫酸鹽之防損傷用保護層時效率降低。若多於21%,則有產生無法減小熱膨脹係數之難點之虞。較佳為20%以下。 In the glass composition 2, when the combined amount of MgO, CaO, SrO, and BaO is 18.2% or less, the meltability is insufficient, and the efficiency of the sulfate-preventing protective layer on the glass ribbon is lowered. If it is more than 21%, there is a difficulty in that the coefficient of thermal expansion cannot be reduced. It is preferably 20% or less.

於玻璃組成1中,藉由使MgO、CaO、SrO及BaO之合量滿足上述,且滿足下述3條件,可不使失透溫度上升而使應變點上升,進而降低玻璃之黏性,尤其是降低玻璃黏度成為104dPa.s之溫度T4In the glass composition 1, when the combined amount of MgO, CaO, SrO, and BaO is satisfied, and the following three conditions are satisfied, the strain point can be increased without increasing the devitrification temperature, and the viscosity of the glass can be lowered, especially lowering the glass viscosity becomes 10 4 dPa. s temperature T 4 .

MgO/(MgO+CaO+SrO+BaO)為0.4以上,較佳為0.45以上。 MgO/(MgO+CaO+SrO+BaO) is 0.4 or more, preferably 0.45 or more.

MgO/(MgO+CaO)為0.4以上,較佳為0.52以上,進而較佳為0.55以上。 MgO/(MgO+CaO) is 0.4 or more, preferably 0.52 or more, and further preferably 0.55 or more.

MgO/(MgO+SrO)為0.6以上,較佳為0.7以上。 MgO/(MgO+SrO) is 0.6 or more, preferably 0.7 or more.

於玻璃組成2中,藉由使MgO、CaO、SrO及BaO之合量滿足上述,且滿足下述3條件,可不使失透溫度上升而使應變點上升,進而降低玻璃之黏性,尤其是玻璃黏度成為104dPa.s之溫度T4In the glass composition 2, when the total amount of MgO, CaO, SrO, and BaO is satisfied, and the following three conditions are satisfied, the strain point can be increased without increasing the devitrification temperature, and the viscosity of the glass can be lowered, especially The glass viscosity becomes 10 4 dPa. s temperature T 4 .

MgO/(MgO+CaO+SrO+BaO)為0.25以上,較佳為0.3以上,更佳為0.4以上,進而較佳為0.45以上。 MgO/(MgO+CaO+SrO+BaO) is 0.25 or more, preferably 0.3 or more, more preferably 0.4 or more, still more preferably 0.45 or more.

MgO/(MgO+CaO)為0.3以上,較佳為0.4以上,更佳為0.52以上,進而較佳為0.55以上。 MgO/(MgO+CaO) is 0.3 or more, preferably 0.4 or more, more preferably 0.52 or more, still more preferably 0.55 or more.

MgO/(MgO+SrO)為0.6以上,較佳為0.7以上。 MgO/(MgO+SrO) is 0.6 or more, preferably 0.7 or more.

於玻璃組成2中,Al2O3×(MgO/(MgO+CaO+SrO+BaO))為5.5以上時可提高楊氏模數,故而較佳。較佳為5.75以上,更佳為6.0以上,進而較佳為6.25以上,特佳為6.5以上。 In the glass composition 2, when Al 2 O 3 × (MgO / (MgO + CaO + SrO + BaO)) is 5.5 or more, the Young's modulus can be increased, which is preferable. It is preferably 5.75 or more, more preferably 6.0 or more, further preferably 6.25 or more, and particularly preferably 6.5 or more.

本發明之板玻璃製造方法中,為提高於玻璃帶上形成硫酸鹽之防損傷用保護層時之效率,較佳為使玻璃原料中含有鹼金屬氧化物600~2000莫耳ppm。 In the method for producing a sheet glass of the present invention, in order to improve the efficiency of forming a protective layer for preventing damage of sulfate on the glass ribbon, it is preferred that the glass raw material contains 600 to 2000 mols of alkali metal oxide.

本發明中,藉由使玻璃原料中含有鹼金屬氧化物600莫耳ppm以上,而提高於玻璃帶上形成防損傷用保護層時之效率。其理由如下所述。 In the present invention, by including the alkali metal oxide in an amount of 600 ppm or more in the glass raw material, the efficiency in forming the protective layer for damage prevention on the glass ribbon is improved. The reason is as follows.

無鹼玻璃不含鹼金屬氧化物,故而即便將高溫之玻璃帶暴露於SO2氣體環境中,亦無法形成由鹼金屬硫酸鹽之析出所得之防損傷用保護層。大量含有鹼土金屬氧化物之組成之無鹼玻璃於在高溫下暴露於SO2氣體環境中之情形時,鹼土金屬之硫酸鹽而非鹼金屬硫酸鹽析出,但其析出量較少,形成防損傷用保護層必需更高溫、或者更長時間、或者暴露於更高濃度之SO2氣體中。然而,本發明者等人發現,藉由於玻璃原料中微量添加鹼金屬氧化物,鹼土金屬硫酸鹽之析出效果增加,於玻璃帶上形成防損傷用保護層時效率提高。 Since the alkali-free glass does not contain an alkali metal oxide, even if a high-temperature glass ribbon is exposed to an SO 2 gas atmosphere, a protective layer for damage prevention obtained by precipitation of an alkali metal sulfate cannot be formed. When a large amount of alkali-free glass containing a composition of an alkaline earth metal oxide is exposed to a SO 2 gas atmosphere at a high temperature, an alkali earth metal sulfate is precipitated instead of an alkali metal sulfate, but the amount of precipitation is small, and the damage prevention is formed. The protective layer must be at a higher temperature, or longer, or exposed to a higher concentration of SO 2 gas. However, the inventors of the present invention have found that the precipitation effect of the alkaline earth metal sulfate is increased by the addition of an alkali metal oxide in a small amount to the glass raw material, and the efficiency is improved when the protective layer for damage prevention is formed on the glass ribbon.

此處,若鹼金屬氧化物之含量變高,則鹼金屬離子擴散至薄膜中而使膜特性劣化,因此於用作各種顯示器用基板玻璃時成為問題,但只要玻璃組成中之鹼金屬氧化物之含量為2000莫耳ppm以下,則不產生此種問題。更佳為1500莫耳ppm以下,進而較佳為1300莫耳ppm以下,特佳為1000莫耳ppm以下。 When the content of the alkali metal oxide is increased, the alkali metal ions diffuse into the film to deteriorate the film properties. Therefore, when used as a substrate glass for various displays, it is a problem as long as the alkali metal oxide in the glass composition is used. When the content is 2000 mol% or less, such a problem does not occur. More preferably, it is 1500 mol ppm or less, further preferably 1300 mol ppm or less, and particularly preferably 1000 mol ppm or less.

本發明所使用之玻璃原料含有鹼金屬氧化物較佳為1500莫耳ppm以下,更佳為1300莫耳ppm以下,進而較佳為1000莫耳ppm以下,進而較佳為700~900莫耳ppm,更佳為700~800莫耳ppm。 The glass raw material used in the present invention preferably contains an alkali metal oxide of 1,500 mol ppm or less, more preferably 1300 mol ppm or less, further preferably 1,000 mol ppm or less, and further preferably 700 to 900 mol ppm. More preferably, it is 700 to 800 moles ppm.

又,作為鹼金屬氧化物,就提高於玻璃帶上形成防損傷用保護層時之效率之效果、與原料成本之平衡的觀點而言,較佳為Na2O、K2O,更佳為Na2O。 In addition, alkali metal oxides, the glass ribbon is formed to increase in the effect of preventing damage by the time efficiency of the protective layer, and the viewpoint of the balance of the cost of raw materials, it is preferably Na 2 O, K 2 O, more preferably Na 2 O.

再者,為使製造面板時不發生設置於玻璃表面之金屬或氧化物 薄膜之特性劣化,玻璃原料較佳為實質上不含P2O5。進而,為容易進行玻璃之再利用,玻璃原料較佳為實質上不含PbO、As2O3、Sb2O3Further, in order to prevent the deterioration of the characteristics of the metal or the oxide film provided on the glass surface during the production of the panel, the glass raw material preferably contains substantially no P 2 O 5 . Further, in order to facilitate the reuse of the glass, the glass raw material preferably contains substantially no PbO, As 2 O 3 or Sb 2 O 3 .

為改善玻璃之熔解性、澄清性、成形性,可於玻璃原料中添加按總量計為5%以下之ZnO、Fe2O3、SO3、F、Cl、SnO2In order to improve the meltability, clarity, and formability of the glass, ZnO, Fe 2 O 3 , SO 3 , F, Cl, and SnO 2 may be added to the glass raw material in an amount of 5% or less.

上述玻璃組成1、2熔解性相對較低,故而較佳為使用下述物質作為各成分之原料。 Since the glass compositions 1 and 2 have relatively low meltability, it is preferred to use the following materials as raw materials for the respective components.

(矽源) (Source)

作為SiO2之矽源,可使用矽砂,使用中值粒徑D50為20μm~27μm、粒徑2μm以下之粒子之比率為0.3體積%以下、且粒徑100μm以上之粒子之比率為2.5體積%以下的矽砂時,可抑制矽砂之凝聚而使其熔解,故而矽砂之熔解變得容易,獲得氣泡較少、均質性、平坦度較高之板玻璃,因此較佳。 As the cerium source of SiO 2 , cerium is used, and the median diameter D 50 is 20 μm to 27 μm, the ratio of particles having a particle diameter of 2 μm or less is 0.3% by volume or less, and the ratio of particles having a particle diameter of 100 μm or more is 2.5 vol. When the sand is less than %, it is possible to suppress the aggregation of the sand and melt it, so that the melting of the sand is easy, and a plate glass having less bubbles, homogeneity, and flatness is obtained, which is preferable.

再者,本說明書中之所謂「粒徑」,係指矽砂之近似球之直徑(於本發明中為一次粒徑之含義),具體而言係指利用雷射繞射/散射法測量之粉體之粒度分佈中之粒徑。 In addition, the term "particle diameter" in the present specification means the diameter of the approximate sphere of the cerium sand (in the present invention, the meaning of the primary particle diameter), specifically, the measurement by the laser diffraction/scattering method. The particle size in the particle size distribution of the powder.

又,本說明書中之所謂「中值粒徑D50」,係指於利用雷射繞射法測量之粉體之粒度分佈中,大於某粒徑之粒子之體積頻度占全部粉體之體積頻度之50%時的粒徑。換言之,係指於利用雷射繞射法測量之粉體之粒度分佈中,累積頻度為50%時之粒徑。 In addition, the "median diameter D 50 " in the present specification means that the volume frequency of particles larger than a certain particle diameter accounts for the volume frequency of all the powders in the particle size distribution of the powder measured by the laser diffraction method. Particle size at 50%. In other words, it means the particle size at a cumulative frequency of 50% in the particle size distribution of the powder measured by the laser diffraction method.

又,本說明書中之「粒徑2μm以下之粒子之比率」及「粒徑100μm以上之粒子之比率」例如藉由利用雷射繞射/散射法測量粒度分佈而進行測定。 In the present specification, the "ratio of particles having a particle diameter of 2 μm or less" and the "ratio of particles having a particle diameter of 100 μm or more" are measured by, for example, measuring a particle size distribution by a laser diffraction/scattering method.

若矽砂之中值粒徑D50為25μm以下,則矽砂之熔解變得更容易,因此更佳。 When the median diameter D 50 of the cerium is 25 μm or less, the melting of the cerium is easier, and therefore it is more preferable.

又,矽砂中粒徑100μm以上之粒子之比率為0%時矽砂之熔解變得更容易,因此特佳。 Further, when the ratio of the particles having a particle diameter of 100 μm or more in the cerium sand is 0%, the melting of the cerium is easier, and therefore it is particularly preferable.

(鹼土金屬源) (alkaline earth metal source)

作為鹼土金屬源,可使用鹼土金屬化合物。此處,作為鹼土金屬化合物之具體例,可例示:MgCO3、CaCO3、BaCO3、SrCO3、(Mg,Ca)CO3(白雲石)等碳酸鹽;MgO、CaO、BaO、SrO等氧化物;或Mg(OH)2、Ca(OH)2、Ba(OH)2、Sr(OH)2等氫氧化物,但使鹼土金屬源之一部分或全部含有鹼土金屬之氫氧化物時,玻璃原料熔解時之SiO2成分之未熔解量降低,因此較佳。若矽砂中所包含之SiO2成分之未熔解量增大,則該未熔解之SiO2於熔融玻璃中產生氣泡時進入至該氣泡中而聚集於熔融玻璃之表層附近。藉此,於熔融玻璃之表層與表層以外之部分之間SiO2之組成比產生差異,玻璃之均質性降低並且平坦性亦降低。 As the alkaline earth metal source, an alkaline earth metal compound can be used. Here, specific examples of the alkaline earth metal compound include carbonic acid salts such as MgCO 3 , CaCO 3 , BaCO 3 , SrCO 3 , (Mg, Ca)CO 3 (dolomite), and oxidation of MgO, CaO, BaO, and SrO. a hydroxide such as Mg(OH) 2 , Ca(OH) 2 , Ba(OH) 2 or Sr(OH) 2 , but when a part or all of the alkaline earth metal source contains a hydroxide of an alkaline earth metal, the glass The amount of unmelted SiO 2 component at the time of melting of the raw material is lowered, which is preferable. When the unmelted amount of the SiO 2 component contained in the strontium sand is increased, the unmelted SiO 2 enters the bubble and bubbles in the vicinity of the surface layer of the molten glass when bubbles are generated in the molten glass. Thereby, the composition ratio of SiO 2 differs between the surface layer of the molten glass and the portion other than the surface layer, the homogeneity of the glass is lowered and the flatness is also lowered.

鹼土金屬之氫氧化物之含量係於鹼土金屬源100質量莫耳%(MO換算,其中M為鹼土金屬元素)中,較佳為15~100莫耳%(MO換算),更佳為30~100莫耳%(MO換算),進而較佳為60~100莫耳%(MO換算),此時玻璃原料熔解時之SiO2成分之未熔解量降低,因此更佳。 The content of the hydroxide of the alkaline earth metal is 100% by mass of the alkaline earth metal source (in terms of MO, wherein M is an alkaline earth metal element), preferably 15 to 100 mol% (in terms of MO), more preferably 30~ 100 mol% (in terms of MO), and further preferably 60 to 100 mol% (in terms of MO), at this time, the amount of unmelted SiO 2 component at the time of melting the glass raw material is lowered, which is more preferable.

伴隨鹼土金屬源中之氫氧化物之莫耳比增加,玻璃原料熔解時之SiO2成分之未熔解量降低,故而上述氫氧化物之莫耳比越高越好。 As the molar ratio of the hydroxide in the alkaline earth metal source increases, the amount of unmelted SiO 2 component at the time of melting of the glass raw material decreases, so that the higher the molar ratio of the above hydroxide is, the better.

作為鹼土金屬源,具體而言,可使用鹼土金屬之氫氧化物與碳酸鹽之混合物、單獨鹼土金屬之氫氧化物等。作為碳酸鹽,較佳為使用MgCO3、CaCO3及(Mg,Ca)(CO3)2(白雲石)中之任1種以上。又,作為鹼土金屬之氫氧化物,較佳為使用Mg(OH)2或Ca(OH)2中之至少一者,尤佳為使用Mg(OH)2As the alkaline earth metal source, specifically, a mixture of an alkali earth metal hydroxide and a carbonate, a hydroxide of an alkaline earth metal alone, or the like can be used. As the carbonate, it is preferred to use one or more of MgCO 3 , CaCO 3 and (Mg, Ca)(CO 3 ) 2 (dolomite). And, as the alkaline earth metal hydroxide, is preferably used Mg (OH) 2 or in the Ca 2 (OH) at least one, and particularly preferably used Mg (OH) 2.

(硼源) (boron source)

於上述玻璃組成1、2含有B2O3之情形時,作為B2O3之硼源,可使用硼化合物。此處,作為硼化合物之具體例,可列舉:原硼酸(H3BO3)、偏硼酸(HBO2)、四硼酸(H2B4O7)、硼酸酐(B2O3)等。於通常 之無鹼玻璃之製造中,就廉價且容易獲得方面而言,使用原硼酸。 In the case where the glass compositions 1 and 2 contain B 2 O 3 , a boron compound can be used as the boron source of B 2 O 3 . Here, specific examples of the boron compound include: orthoboric acid (H 3 BO 3), metaboric acid (HBO 2), tetraboric acid (H 2 B 4 O 7) , boric anhydride (B 2 O 3) and the like. In the production of a usual alkali-free glass, orthoboric acid is used in terms of being inexpensive and easily available.

於本發明中,作為硼源,較佳為使用硼源100質量%(B2O3換算)中含有硼酸酐10~100質量%(B2O3換算)者。藉由將硼酸酐設為10質量%以上,抑制玻璃原料之凝聚,獲得減少氣泡之效果及提高均質性、平坦度之效果。硼酸酐更佳為20~100質量%,進而較佳為40~100質量%。 In the present invention, as the boron source, it is preferable to use a boron source in an amount of 10 to 100% by mass (in terms of B 2 O 3 ) in terms of 100% by mass of boron source (in terms of B 2 O 3 ). When the amount of the boric anhydride is 10% by mass or more, aggregation of the glass raw material is suppressed, and the effect of reducing bubbles and improving the homogeneity and flatness are obtained. The boric anhydride is more preferably 20 to 100% by mass, still more preferably 40 to 100% by mass.

作為硼酸酐以外之硼化合物,就廉價且容易獲得方面而言,較佳為原硼酸。 As a boron compound other than boric anhydride, orthoboric acid is preferable in terms of being inexpensive and easily available.

板玻璃之製造係例如按以下程序實施。 The manufacture of the sheet glass is carried out, for example, according to the following procedure.

將各成分之原料以變為目標成分之方式進行調合,並將其連續地投入至熔解爐中,加熱至1500~1800℃進行熔融。利用成形裝置使該熔融玻璃成形為特定板厚之板狀玻璃帶,並對該玻璃帶於緩冷後進行切割,藉此可獲得板玻璃。 The raw materials of the respective components are blended so as to become the target components, and they are continuously introduced into a melting furnace, and heated to 1500 to 1800 ° C for melting. The molten glass is formed into a plate-shaped glass ribbon having a specific thickness by a molding device, and the glass ribbon is slowly cooled and then cut, whereby a plate glass can be obtained.

本發明中,較佳為利用浮式法成形為板狀之玻璃帶。 In the present invention, a glass ribbon formed into a plate shape by a float method is preferred.

本發明中,於緩冷爐內,以滿足以下所示之條件之方式對玻璃帶供給亞硫酸(SO2)氣體。 In the present invention, sulfurous acid (SO 2 ) gas is supplied to the glass ribbon in a slow cooling furnace so as to satisfy the conditions shown below.

將無鹼玻璃之應變點設為Tst(℃)時,於Tst+70℃~Tst-50℃之溫度區域,以玻璃帶之下表面正下方之環境濃度成為500~20000ppm之時間為30秒以上之方式供給SO2氣體。若環境濃度未達500ppm,則有鹼土金屬之硫酸鹽之析出量變少之虞。更佳為1000ppm以上。若環境濃度超過20000ppm,則有設備之腐蝕成為問題之虞。更佳為10000ppm以下,進而較佳為5000ppm以下。又,若未達30秒,則有鹼土金屬之硫酸鹽之析出量變少之虞。更佳為1分鐘以上。 When the strain point of the alkali-free glass is T st (°C), the temperature in the temperature range from T st +70 ° C to T st -50 ° C is 500 to 20000 ppm below the surface under the glass ribbon. The SO 2 gas is supplied in a manner of 30 seconds or more. If the environmental concentration is less than 500 ppm, the amount of precipitation of the alkaline earth metal sulfate becomes small. More preferably, it is 1000 ppm or more. If the environmental concentration exceeds 20,000 ppm, corrosion of the equipment becomes a problem. More preferably, it is 10000 ppm or less, More preferably, it is 5000 ppm or less. Further, if it is less than 30 seconds, the amount of precipitation of the alkaline earth metal sulfate is small. More preferably more than 1 minute.

本發明中,較佳為自玻璃帶之下表面供給SO2氣體。藉由自下表面供給SO2氣體,比重較重之SO2氣體可僅於下表面使鹼土金屬之硫酸鹽析出,防止氣體之擴散,提高鹼土金屬之硫酸鹽之析出效果。 In the present invention, it is preferably supplied to the surface of the SO 2 gas from beneath the glass band. SO 2 gas supplied to the surface by the self, the proportion of the heavier gas may be SO 2 only the lower surface of the precipitated alkaline earth metal sulfates, to prevent the diffusion of the gas, the effect of improving the precipitation of alkaline earth metal sulfates.

本發明中,較佳為於水蒸汽露點為30℃以上之環境中使玻璃帶與SO2氣體接觸。若水蒸汽露點較低,則有不提高鹼土金屬之硫酸鹽之析出效果之虞。更佳為40℃以上,進而較佳為50℃以上。 In the present invention, it is preferred to bring the glass ribbon into contact with the SO 2 gas in an environment where the water vapor dew point is 30 ° C or higher. If the water vapor dew point is low, there is no increase in the precipitation effect of the alkaline earth metal sulfate. More preferably, it is 40 ° C or more, and further preferably 50 ° C or more.

本發明之玻璃應變點為710℃以上,可抑制製造面板時之熱縮。又,作為p-Si TFT之製造方法,可使用固相結晶法。又,本發明之製造方法中,可於更高之溫度下供給SO2氣體,故而包含鹼土金屬之硫酸鹽之防損傷用保護層之形成效率較佳。應變點更佳為715℃以上,進而較佳為720℃以上。特佳為735℃以上。若應變點為735℃以上,則適合高應變點用途(例如,有機EL(Electro-Luminescence,電致發光)用之顯示器用基板或照明用基板,或者板厚100μm以下之薄板之顯示器用基板或照明用基板)。 The glass strain point of the present invention is 710 ° C or higher, which can suppress heat shrinkage when manufacturing a panel. Further, as a method of producing the p-Si TFT, a solid phase crystallization method can be used. Further, in the production method of the present invention, since the SO 2 gas can be supplied at a higher temperature, the formation efficiency of the protective layer for damage prevention of the sulfate containing the alkaline earth metal is preferable. The strain point is more preferably 715 ° C or higher, and further preferably 720 ° C or higher. Particularly good is 735 ° C or more. When the strain point is 735 ° C or higher, it is suitable for high strain point applications (for example, a display substrate for an organic EL (Electro-Luminescence) or a substrate for illumination, or a substrate for a display having a thickness of 100 μm or less or Lighting substrate).

於板厚100μm以下之板玻璃之成形中,有成形時之拉出速度變快之傾向,故而玻璃之假想溫度上升,玻璃之緊密度容易增大。於該情形時,若為高應變點玻璃,則可抑制緊密度。 In the molding of the plate glass having a thickness of 100 μm or less, the drawing speed at the time of molding tends to increase, so that the pseudo temperature of the glass rises and the tightness of the glass tends to increase. In this case, if it is a high strain point glass, the tightness can be suppressed.

但,若玻璃之應變點過高,則據此必需提高成形裝置之溫度,成形裝置之壽命降低。因此,本發明之板玻璃之應變點為750℃以下。 However, if the strain point of the glass is too high, it is necessary to increase the temperature of the forming apparatus, and the life of the forming apparatus is lowered. Therefore, the strain point of the sheet glass of the present invention is 750 ° C or lower.

又,本發明之玻璃出於與應變點相同之理由,玻璃轉移點較佳為760℃以上,更佳為770℃以上,進而較佳為780℃以上。 Further, the glass of the present invention preferably has a glass transition point of 760 ° C or higher, more preferably 770 ° C or higher, and still more preferably 780 ° C or higher for the same reason as the strain point.

又,本發明之玻璃於50~300℃下之平均熱膨脹係數為30×10-7~43×10-7/℃,耐熱衝擊性較大,可提高製造面板時之生產性。本發明之玻璃較佳為於50~300℃下之平均熱膨脹係數為35×10-7~40×10-7/℃。 Further, the glass of the present invention has an average thermal expansion coefficient of 30 × 10 -7 to 43 × 10 -7 / ° C at 50 to 300 ° C, and has high thermal shock resistance, which can improve productivity in manufacturing a panel. The glass of the present invention preferably has an average coefficient of thermal expansion of from 50 to 300 ° C of from 35 × 10 -7 to 40 × 10 -7 / ° C.

進而,本發明之玻璃比重較佳為2.65以下,更佳為2.64以下,進而較佳為2.62以下。 Further, the specific gravity of the glass of the present invention is preferably 2.65 or less, more preferably 2.64 or less, still more preferably 2.62 or less.

又,本發明之玻璃黏度η成為102泊(dPa.s)之溫度T2為1710℃以 下,較佳為未達1710℃,更佳為1700℃以下,進而較佳為1690℃以下,因此熔解相對容易。 Further, the glass viscosity η of the present invention has a temperature T 2 of 10 2 poise (dPa.s) of 1710 ° C or less, preferably less than 1710 ° C, more preferably 1700 ° C or less, still more preferably 1690 ° C or less. Melting is relatively easy.

進而,本發明之玻璃黏度η成為104泊之溫度T4為1320℃以下,較佳為1315℃以下,更佳為1310℃以下,進而較佳為1305℃以下,適合浮式法成形。 Further, the glass of the present invention the viscosity η becomes 104 poise temperature of T 4 at 1320 ℃, preferably higher than 1315 deg.] C, more preferably higher than 1310 deg.] C, and further preferably higher than 1305 deg.] C, float method suitable for molding.

又,就利用浮式法之成形變得容易而言,本發明之玻璃失透溫度較佳為1350℃以下。較佳為1340℃以下,更佳為1330℃以下。 Further, in the case where the molding by the floating method is easy, the glass devitrification temperature of the present invention is preferably 1,350 ° C or lower. It is preferably 1340 ° C or lower, more preferably 1330 ° C or lower.

本說明書中之失透溫度係於鉑製之碟內裝入經粉碎之玻璃粒子,於控制為一定溫度之電爐中進行17小時熱處理,根據熱處理後之光學顯微鏡觀察而獲得於玻璃之表面及內部析出結晶之最高溫度與結晶不析出之最低溫度的平均值。 The devitrification temperature in the present specification is charged into a plate made of platinum, and the pulverized glass particles are placed in an electric furnace controlled to a certain temperature for 17 hours, and obtained on the surface and inside of the glass by optical microscopy after heat treatment. The average value of the highest temperature at which crystals are precipitated and the lowest temperature at which crystals are not precipitated.

又,本發明之玻璃較佳為楊氏模數為84GPa以上,進而較佳為86GPa以上,進而較佳為88GPa以上,進而較佳為90GPa以上。 Further, the glass of the present invention preferably has a Young's modulus of 84 GPa or more, more preferably 86 GPa or more, further preferably 88 GPa or more, and still more preferably 90 GPa or more.

又,本發明之玻璃較佳為光彈性常數為31nm/MPa/cm以下。 Further, the glass of the present invention preferably has a photoelastic constant of 31 nm/MPa/cm or less.

由於液晶顯示面板製造步驟或液晶顯示裝置使用時產生之應力而玻璃基板具有雙折射性,因此有可見黑顯示變灰而液晶顯示器之對比度降低之現象的情況。藉由將光彈性常數設為31nm/MPa/cm以下,可將該現象抑制得較小。較佳為30nm/MPa/cm以下,更佳為29nm/MPa/cm以下,進而較佳為28.5nm/MPa/cm以下,特佳為28nm/MPa/cm以下。 The glass substrate has birefringence due to the manufacturing process of the liquid crystal display panel or the stress generated when the liquid crystal display device is used. Therefore, there is a case where the visible black display is grayed out and the contrast of the liquid crystal display is lowered. This phenomenon can be suppressed to be small by setting the photoelastic constant to 31 nm/MPa/cm or less. It is preferably 30 nm/MPa/cm or less, more preferably 29 nm/MPa/cm or less, further preferably 28.5 nm/MPa/cm or less, and particularly preferably 28 nm/MPa/cm or less.

又,若考慮確保其他物性之容易性,則本發明之玻璃較佳為光彈性常數為25nm/MPa/cm以下。 Moreover, in consideration of the easiness of securing other physical properties, the glass of the present invention preferably has a photoelastic constant of 25 nm/MPa/cm or less.

再者,光彈性常數可藉由圓盤壓縮法進行測定。 Further, the photoelastic constant can be measured by a disk compression method.

又,本發明之玻璃較佳為相對介電常數為5.6以上。 Further, the glass of the present invention preferably has a relative dielectric constant of 5.6 or more.

於如日本專利特開2011-70092號公報中所記載之內置型觸控面板(於液晶顯示面板內內置有觸控感測器者)之情形時,就提高觸控感測 器之感測敏度、降低驅動電壓、省電化之觀點而言,玻璃基板之相對介電常數較佳為較高。藉由將相對介電常數設為5.6以上,觸控感測器之感測敏度提高。較佳為5.8以上,更佳為6.0以上,進而較佳為6.2以上,特佳為6.4以上。 The touch sensing is improved when the built-in type touch panel (the built-in touch sensor is incorporated in the liquid crystal display panel) as described in Japanese Laid-Open Patent Publication No. 2011-70092 The relative dielectric constant of the glass substrate is preferably higher from the viewpoints of sensing sensitivity, lowering driving voltage, and power saving. By setting the relative dielectric constant to 5.6 or more, the sensitivity of the touch sensor is improved. It is preferably 5.8 or more, more preferably 6.0 or more, still more preferably 6.2 or more, and particularly preferably 6.4 or more.

再者,相對介電常數可利用JIS C-2141中記載之方法進行測定。 Further, the relative dielectric constant can be measured by the method described in JIS C-2141.

實施例Example (實施例1、比較例1、2) (Example 1, Comparative Examples 1, 2)

將各成分之原料以成為表1所示之目標組成之方式進行調合,利用連續熔融窯進行熔解,並利用浮式法進行板成形。將作為此時使用之原料中之鹼金屬氧化物之含量的Na2O之含量、作為使用之原料中之矽砂之粒度的中值粒徑D50、粒徑2μm以下之粒子之比率、及粒徑100μm以上之粒子之比率一併示於表1。又,將鹼土金屬之氫氧化物原料之莫耳比率(MO換算)亦一併示於表1。 The raw materials of the respective components were blended so as to have the target compositions shown in Table 1, and were melted by a continuous melting furnace, and subjected to sheet forming by a floating method. The content of Na 2 O as the content of the alkali metal oxide in the raw material used at this time, the median diameter D 50 of the particle size of the cerium used in the raw material used, the ratio of the particles having a particle diameter of 2 μm or less, and The ratio of the particles having a particle diameter of 100 μm or more is shown in Table 1. Further, the molar ratio (in terms of MO) of the hydroxide material of the alkaline earth metal is also shown in Table 1.

對所獲得之玻璃進行鏡面研磨後,按表2所示之熱處理溫度、熱處理時間、SO2氣體濃度、水蒸汽露點於SO2氣體環境中進行熱處理。所獲得之玻璃之表面之硫酸鹽析出狀況係以利用螢光X射線所得之表面S濃度(質量%)之形式進行測定。將玻璃之應變點、表面S濃度(質量%)亦一併示於表2。 After the obtained glass was mirror-polished, heat treatment was carried out in accordance with the heat treatment temperature, the heat treatment time, the SO 2 gas concentration, and the water vapor dew point shown in Table 2 in an SO 2 gas atmosphere. The sulfate precipitation state of the surface of the obtained glass was measured in the form of the surface S concentration (% by mass) obtained by the fluorescent X-ray. The strain point of the glass and the surface S concentration (% by mass) are also shown in Table 2.

[利用螢光X射線之表面S濃度之測定方法] [Method for Measuring Surface S Concentration Using Fluorescent X-rays]

對析出硫酸鹽之玻璃試樣,於表3所示之條件下利用10mm之光罩測定S-kα射線之計數數。S濃度係對既知之玻璃進行鏡面研磨之後,於表3所示之條件下利用10mm之光罩測定S-kα射線之計數數,獲得S-kα射線之計數數與S濃度(質量%)之相關關係。藉由使用所獲得之相關關係,將析出硫酸鹽之玻璃試樣之S-kα射線計數數換算為S濃度(質量%)。表面S濃度較佳為0.15質量%以上,更佳為0.2質量%以上。 The glass sample for the precipitation of sulfate is utilized under the conditions shown in Table 3. A 10 mm reticle measures the number of counts of S-kα rays. The S concentration is used after mirror polishing of the known glass, and is used under the conditions shown in Table 3. The number of S-kα rays was measured by a 10 mm photomask, and the correlation between the number of counts of S-kα rays and the S concentration (% by mass) was obtained. The S-kα ray count number of the sulfated glass sample was converted into the S concentration (% by mass) by using the obtained correlation. The surface S concentration is preferably 0.15% by mass or more, and more preferably 0.2% by mass or more.

(實施例2~4) (Examples 2 to 4)

將各成分之原料以成為表4所示之目標組成之方式進行調合,使用鉑坩堝於1550℃之溫度下進行1小時熔解。熔解後,流出為碳板狀,於玻璃轉移點+30℃下保持1小時後,以1℃/分鐘進行冷卻而進行緩冷。將作為此時使用之原料中之鹼金屬氧化物之含量的Na2O之含量、作為使用之原料中之矽砂之粒度的中值粒徑D50、粒徑2μm以下之粒子之比率、及粒徑100μm以上之粒子之比率一併示於表4。又,將鹼土金屬之氫氧化物原料之莫耳比率(MO換算)亦一併示於表4。 The raw materials of the respective components were blended so as to have the target compositions shown in Table 4, and the platinum crucible was melted at a temperature of 1,550 ° C for 1 hour. After the melting, the mixture was discharged into a carbon plate shape, and held at a glass transition point of +30 ° C for 1 hour, and then cooled at 1 ° C / minute to carry out slow cooling. The content of Na 2 O as the content of the alkali metal oxide in the raw material used at this time, the median diameter D 50 of the particle size of the cerium used in the raw material used, the ratio of the particles having a particle diameter of 2 μm or less, and The ratio of the particles having a particle diameter of 100 μm or more is shown in Table 4 together. Further, the molar ratio (in terms of MO) of the hydroxide material of the alkaline earth metal is also shown in Table 4.

對所獲得之玻璃進行切割,並進行鏡面研磨,此後按表5所示之熱處理溫度、熱處理時間、SO2氣體濃度、水蒸汽露點於SO2氣體環境中進行熱處理。所獲得之玻璃之表面之硫酸鹽析出狀況係以利用螢光X射線所得之表面S濃度(質量%)之形式進行測定。將玻璃之應變點、表面S濃度(質量%)亦一併示於表5。 The obtained glass was cut and mirror-polished, and thereafter heat-treated in accordance with the heat treatment temperature, the heat treatment time, the SO 2 gas concentration, and the water vapor dew point shown in Table 5 in an SO 2 gas atmosphere. The sulfate precipitation state of the surface of the obtained glass was measured in the form of the surface S concentration (% by mass) obtained by the fluorescent X-ray. The strain point of the glass and the surface S concentration (% by mass) are also shown in Table 5.

已詳細地且參照特定之實施態樣說明本發明,但對從業者而言很明顯,可不脫離本發明之精神與範圍而施加各種修正或變更。 The present invention has been described in detail with reference to the particular embodiments of the invention.

本申請案係基於2012年5月16日提出申請之日本專利申請2012-112226者,且將其內容作為參照而併入本文。 The present application is based on Japanese Patent Application No. 2012-112226, filed on Jan.

產業上之可利用性Industrial availability

藉由本發明而獲得之板玻璃應變點較高,適合顯示器用基板、光罩用基板等用途。又,亦適合太陽電池用基板等用途。 The plate glass obtained by the present invention has a high strain point and is suitable for applications such as a substrate for a display and a substrate for a photomask. Moreover, it is also suitable for applications such as substrates for solar cells.

Claims (7)

一種板玻璃製造方法,其係熔解玻璃原料並製成熔融玻璃,利用成形裝置使該熔融玻璃成形為板狀之玻璃帶之後,利用緩冷裝置對該玻璃帶進行緩冷者,上述板玻璃包含下述無鹼玻璃,將上述無鹼玻璃之應變點設為Tst(℃)時,於Tst+70℃~Tst-50℃之溫度區域,以上述玻璃帶之下表面正下方之環境濃度成為500~20000ppm之時間為30秒以上之方式供給SO2氣體;上述無鹼玻璃應變點為710~750℃,於50~300℃下之平均熱膨脹係數為30×10-7~43×10-7/℃,玻璃黏度成為102dPa.s之溫度T2為1710℃以下,玻璃黏度成為104dPa.s之溫度T4為1320℃以下,以氧化物基準之莫耳%表示含有:SiO2 66~70莫耳%、Al2O3 12~15莫耳%、B2O3 0~1.5莫耳%、MgO 超過9.5莫耳%且為13莫耳%以下、CaO 4~9莫耳%、SrO 0.5~4.5莫耳%、BaO 0~1莫耳%、ZrO2 0~2莫耳%,且MgO+CaO+SrO+BaO為17~21莫耳%,MgO/(MgO+CaO+SrO+BaO)為0.40以上,MgO/(MgO+CaO)為0.40以上,MgO/(MgO+SrO)為0.60以上。 A method for producing a sheet glass, which comprises melting a glass raw material and forming a molten glass, and forming the molten glass into a plate-shaped glass ribbon by a molding device, and then slowly cooling the glass ribbon by a slow cooling device, wherein the plate glass comprises In the alkali-free glass, when the strain point of the alkali-free glass is T st (°C), the temperature is in the temperature range from T st +70 ° C to T st -50 ° C, and the environmental concentration directly below the lower surface of the glass ribbon. The SO 2 gas is supplied in a manner of being 500 to 20000 ppm for 30 seconds or more; the alkali-free glass has a strain point of 710 to 750 ° C, and an average thermal expansion coefficient at 50 to 300 ° C is 30 × 10 -7 to 43 × 10 - 7 / ° C, the glass viscosity becomes 10 2 dPa. The temperature T 2 of s is below 1710 ° C, and the glass viscosity is 10 4 dPa. The temperature T 4 of s is 1320 ° C or less, and the mole % based on the oxide is contained: SiO 2 66-70 mol%, Al 2 O 3 12-15 mol%, B 2 O 3 0-1.5 mol %, MgO exceeds 9.5 mol% and is 13 mol% or less, CaO 4-9 mol%, SrO 0.5-4.5 mol%, BaO 0~1 mol%, ZrO 2 0-2 mol%, and MgO+CaO+SrO+BaO is 17-21 mol%, MgO/(MgO+CaO+SrO+BaO) is 0.40 or more, MgO/(MgO+CaO) is 0.40 or more, and MgO/(MgO+SrO) is 0.60. the above. 一種板玻璃製造方法,其係熔解玻璃原料並製成熔融玻璃,利 用成形裝置使該熔融玻璃成形為板狀之玻璃帶之後,利用緩冷裝置對該玻璃帶進行緩冷者,上述板玻璃包含下述無鹼玻璃,將上述無鹼玻璃之應變點設為Tst(℃)時,於Tst+70℃~Tst-50℃之溫度區域,以上述玻璃帶之下表面正下方之環境濃度成為500~20000ppm之時間為30秒以上之方式供給SO2氣體;上述無鹼玻璃應變點為710~750℃,於50~300℃下之平均熱膨脹係數為30×10-7~43×10-7/℃,玻璃黏度成為102dPa.s之溫度T2為1710℃以下,玻璃黏度成為104dPa.s之溫度T4為1320℃以下,以氧化物基準之莫耳%表示含有:SiO2 66~70莫耳%、Al2O3 12~15莫耳%、B2O3 0~1.5莫耳%、MgO 5~9.5莫耳%、CaO 4~11莫耳%、SrO 0.5~4.5莫耳%、BaO 0~1莫耳%、ZrO2 0~2莫耳%,且MgO+CaO+SrO+BaO超過18.2莫耳%且為21莫耳%以下,MgO/(MgO+CaO+SrO+BaO)為0.25以上,MgO/(MgO+CaO)為0.3以上,MgO/(MgO+SrO)為0.60以上,Al2O3×(MgO/(MgO+CaO+SrO+BaO))為5.5以上。 A method for producing a sheet glass, which comprises melting a glass raw material and forming a molten glass, and forming the molten glass into a plate-shaped glass ribbon by a molding device, and then slowly cooling the glass ribbon by a slow cooling device, wherein the plate glass comprises In the alkali-free glass, when the strain point of the alkali-free glass is T st (°C), the temperature is in the temperature range from T st +70 ° C to T st -50 ° C, and the environmental concentration directly below the lower surface of the glass ribbon. The SO 2 gas is supplied in a manner of being 500 to 20000 ppm for 30 seconds or more; the alkali-free glass has a strain point of 710 to 750 ° C, and an average thermal expansion coefficient at 50 to 300 ° C is 30 × 10 -7 to 43 × 10 - 7 / ° C, the glass viscosity becomes 10 2 dPa. The temperature T 2 of s is below 1710 ° C, and the glass viscosity is 10 4 dPa. The temperature T 4 of s is 1320 ° C or less, and the mole % based on the oxide is contained: SiO 2 66-70 mol%, Al 2 O 3 12-15 mol%, B 2 O 3 0-1.5 mol %, MgO 5~9.5 mol%, CaO 4~11 mol%, SrO 0.5~4.5 mol%, BaO 0~1 mol%, ZrO 2 0~2 mol%, and MgO+CaO+SrO+ BaO is more than 18.2% by mole and is 21% by mole or less, MgO/(MgO+CaO+SrO+BaO) is 0.25 or more, MgO/(MgO+CaO) is 0.3 or more, and MgO/(MgO+SrO) is 0.60 or more. Al 2 O 3 × (MgO/(MgO+CaO+SrO+BaO)) is 5.5 or more. 如請求項1或2之板玻璃製造方法,其中上述無鹼玻璃含有鹼金屬氧化物600~2000莫耳ppm。 The method for producing a sheet glass according to claim 1 or 2, wherein the alkali-free glass contains an alkali metal oxide in an amount of 600 to 2000 mol ppm. 如請求項1至3中任一項之板玻璃製造方法,其中上述成形裝置 為浮式法成形裝置。 The method for manufacturing a sheet glass according to any one of claims 1 to 3, wherein the forming device is It is a floating method forming device. 如請求項1至4中任一項之板玻璃製造方法,其中作為SiO2原料之矽源,使用中值粒徑D50為20μm~27μm、粒徑2μm以下之粒子之比率為0.3體積%以下、且粒徑100μm以上之粒子之比率為2.5體積%以下的矽砂。 The method for producing a sheet glass according to any one of claims 1 to 4, wherein a ratio of particles having a median diameter D 50 of 20 μm to 27 μm and a particle diameter of 2 μm or less is 0.3% by volume or less as a source of SiO 2 raw material. The ratio of the particles having a particle diameter of 100 μm or more is 2.5% by volume or less. 如請求項1至4中任一項之板玻璃製造方法,其中作為MgO、CaO、SrO及BaO之鹼土金屬源,使用鹼土金屬源100莫耳%(MO換算,其中M為鹼土金屬元素,以下相同)中含有鹼土金屬之氫氧化物15~100莫耳%(MO換算)者。 The method for producing a sheet glass according to any one of claims 1 to 4, wherein, as an alkaline earth metal source of MgO, CaO, SrO and BaO, an alkaline earth metal source of 100 mol% is used (in terms of MO, wherein M is an alkaline earth metal element, the following In the same), the hydroxide of the alkaline earth metal is contained in an amount of 15 to 100 mol% (in terms of MO). 如請求項1至4中任一項之板玻璃製造方法,其中作為SiO2原料之矽源,使用中值粒徑D50為20μm~27μm、粒徑2μm以下之粒子之比率為0.3體積%以下、且粒徑100μm以上之粒子之比率為2.5體積%以下的矽砂,且作為MgO、CaO、SrO及BaO之鹼土金屬源,使用鹼土金屬源100莫耳%(MO換算,其中M為鹼土金屬元素,以下相同)中含有鹼土金屬之氫氧化物15~100莫耳%(MO換算)者。 The method for producing a sheet glass according to any one of claims 1 to 4, wherein a ratio of particles having a median diameter D 50 of 20 μm to 27 μm and a particle diameter of 2 μm or less is 0.3% by volume or less as a source of SiO 2 raw material. And the ratio of particles having a particle diameter of 100 μm or more is 2.5% by volume or less, and as an alkaline earth metal source of MgO, CaO, SrO, and BaO, an alkaline earth metal source of 100 mol% is used (in terms of MO, where M is an alkaline earth metal) The element (the same applies hereinafter) contains an alkali earth metal hydroxide of 15 to 100 mol% (in terms of MO).
TW102117436A 2012-05-16 2013-05-16 Method for producing plate glass TW201404754A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012112226 2012-05-16

Publications (1)

Publication Number Publication Date
TW201404754A true TW201404754A (en) 2014-02-01

Family

ID=49583712

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102117436A TW201404754A (en) 2012-05-16 2013-05-16 Method for producing plate glass

Country Status (5)

Country Link
JP (1) JPWO2013172307A1 (en)
KR (1) KR101974681B1 (en)
CN (1) CN104302590B (en)
TW (1) TW201404754A (en)
WO (1) WO2013172307A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI785219B (en) * 2018-03-29 2022-12-01 日商日本電氣硝子股份有限公司 Manufacturing method of plate glass

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013161902A1 (en) * 2012-04-27 2013-10-31 旭硝子株式会社 Non-alkali glass and method for producing same
JP2017007870A (en) * 2013-11-13 2017-01-12 旭硝子株式会社 Sheet glass manufacturing method
JP6578774B2 (en) * 2014-07-18 2019-09-25 Agc株式会社 Alkali-free glass
CN107074622A (en) * 2014-10-23 2017-08-18 旭硝子株式会社 alkali-free glass
JP6943252B2 (en) * 2016-08-23 2021-09-29 Agc株式会社 Alkaline-free glass
EP3636605A4 (en) * 2017-06-05 2021-03-10 AGC Inc. HARDENED GLASS
JP6953944B2 (en) * 2017-09-21 2021-10-27 Agc株式会社 Borosilicate glass and its manufacturing method
CN107793019B (en) * 2017-11-27 2020-03-20 先进数字显示(深圳)有限公司 Process method for microstructure hot pressing of flat glass substrate for high-precision display
KR102682708B1 (en) * 2018-03-14 2024-07-12 에이지씨 가부시키가이샤 glass
TW202500523A (en) 2019-02-07 2025-01-01 日商Agc股份有限公司 Alkali-free glass
CN113412242A (en) * 2019-02-07 2021-09-17 Agc株式会社 E-glass
TW202543946A (en) 2019-02-07 2025-11-16 日商Agc股份有限公司 Alkali-free glass
KR102141856B1 (en) 2019-03-19 2020-08-07 에이지씨 가부시키가이샤 Alkali-free glass substrate
EP4317097A4 (en) * 2022-05-31 2025-01-15 Nippon Sheet Glass Company, Limited GLASS FIBER AND COMPOSITION FOR GLASS FIBER

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61236631A (en) * 1985-04-10 1986-10-21 Ohara Inc Refractory and heat resistant glass
US4634684A (en) 1985-10-23 1987-01-06 Corning Glass Works Strontium aluminosilicate glass substrates for flat panel display devices
US4634683A (en) 1985-10-23 1987-01-06 Corning Glass Works Barium and/or strontium aluminosilicate crystal-containing glasses for flat panel display devices
JPH0678181B2 (en) * 1988-10-27 1994-10-05 セントラル硝子株式会社 Glass surface treatment method
JP3083586B2 (en) 1991-04-26 2000-09-04 旭硝子株式会社 Alkali-free glass
US5116789A (en) 1991-08-12 1992-05-26 Corning Incorporated Strontium aluminosilicate glasses for flat panel displays
US5326730A (en) 1993-01-22 1994-07-05 Corning Incorporated Barium aluminosilicate glasses
JP3804112B2 (en) * 1996-07-29 2006-08-02 旭硝子株式会社 Alkali-free glass, alkali-free glass manufacturing method and flat display panel
JP2001064028A (en) * 1999-06-22 2001-03-13 Asahi Glass Co Ltd Tempered glass substrate for flat panel display
WO2002051767A1 (en) * 2000-12-26 2002-07-04 Nippon Sheet Glass Co.,Ltd. Plate glass with protective film and method of manufacturing the plate glass
JP2002308643A (en) * 2001-02-01 2002-10-23 Nippon Electric Glass Co Ltd Alkali-free glass and glass substrate for display
CN101489945B (en) 2006-07-07 2012-02-01 旭硝子株式会社 Manufacturing method of glass substrate for flat glass
JP5246676B2 (en) * 2006-12-27 2013-07-24 本田技研工業株式会社 Shift map switching control device
JP2009148141A (en) 2007-12-18 2009-07-02 Sumitomo Electric Ind Ltd Magnetic parts
CN102046542B (en) 2008-06-06 2013-07-24 旭硝子株式会社 Device for manufacturing flat glass and method for manufacturing flat glass

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI785219B (en) * 2018-03-29 2022-12-01 日商日本電氣硝子股份有限公司 Manufacturing method of plate glass

Also Published As

Publication number Publication date
KR101974681B1 (en) 2019-05-02
CN104302590A (en) 2015-01-21
WO2013172307A1 (en) 2013-11-21
KR20150013116A (en) 2015-02-04
CN104302590B (en) 2016-08-31
JPWO2013172307A1 (en) 2016-01-12

Similar Documents

Publication Publication Date Title
TW201404754A (en) Method for producing plate glass
CN103261109B (en) Alkali-free glass and the manufacture method of alkali-free glass
CN102471134B (en) Alkali-free glass and method for producing same
TWI613173B (en) Alkali-free glass and method of producing the same
US9382152B2 (en) Non-alkali glass and method for producing same
KR101751569B1 (en) Non-alkali glass, and process for production of non-alkali glass
CN105722800B (en) The manufacturing method of plate glass
CN103282319B (en) Alkali-free glass and the manufacture method of alkali-free glass