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TW201351226A - Touch panel and display - Google Patents

Touch panel and display Download PDF

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Publication number
TW201351226A
TW201351226A TW101121022A TW101121022A TW201351226A TW 201351226 A TW201351226 A TW 201351226A TW 101121022 A TW101121022 A TW 101121022A TW 101121022 A TW101121022 A TW 101121022A TW 201351226 A TW201351226 A TW 201351226A
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Taiwan
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refractive index
substrate
index layer
transparent conductive
touch screen
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TW101121022A
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Chinese (zh)
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TWI545475B (en
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Ga-Lane Chen
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Hon Hai Prec Ind Co Ltd
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Priority to TW101121022A priority Critical patent/TWI545475B/en
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Publication of TWI545475B publication Critical patent/TWI545475B/en

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Abstract

The present disclosure relates to a touch panel. The touch panel includes a substrate and a transparent conductive layer formed on the substrate. The substrate is made of sapphire. The transparent conductive layer is an indium tin oxide (ITO) transparent conductive film. The present disclosure also provide a display having the touch panel.

Description

觸摸屏及顯示裝置Touch screen and display device

本發明涉及一種觸摸屏,特別涉及一種使用藍寶石的觸摸屏及具有該觸摸屏的顯示裝置。The present invention relates to a touch screen, and more particularly to a touch screen using sapphire and a display device having the same.

傳統的觸摸屏一般包括一玻璃片及一設置在玻璃片上用於偵測觸摸動作的透明導電層。為了提高該觸摸屏的硬度和屈服強度,需要對玻璃片進行物理或化學強化處理,過程複雜但效果並不明顯。A conventional touch screen generally includes a glass sheet and a transparent conductive layer disposed on the glass sheet for detecting a touch action. In order to improve the hardness and yield strength of the touch screen, it is necessary to physically or chemically strengthen the glass sheet, and the process is complicated but the effect is not obvious.

有鑒於此,有必要提供一種可提高硬度及屈服強度的觸摸屏及一種具有該觸摸屏的顯示裝置。In view of the above, it is necessary to provide a touch screen capable of improving hardness and yield strength and a display device having the same.

一種觸摸屏,其包括一基片及一形成在該基片上用於偵測觸摸動作的透明導電層。該基片採用藍寶石製成,該透明導電層採用氧化銦透明導電膜。A touch screen includes a substrate and a transparent conductive layer formed on the substrate for detecting a touch action. The substrate is made of sapphire, and the transparent conductive layer is made of an indium oxide transparent conductive film.

一種顯示裝置,其包括一顯示面板及一設置在該顯示面板上的觸摸屏。該觸摸屏包括一基片及一形成在該基片上、與該顯示面板相背且用於偵測觸摸動作的透明導電層。該基片採用藍寶石製成,該透明導電層採用氧化銦透明導電膜。A display device includes a display panel and a touch screen disposed on the display panel. The touch screen includes a substrate and a transparent conductive layer formed on the substrate opposite to the display panel for detecting a touch action. The substrate is made of sapphire, and the transparent conductive layer is made of an indium oxide transparent conductive film.

本發明提供的觸摸屏及顯示裝置通過採用藍寶石作為該基片,由於藍寶石具有較大的硬度和屈服強度,從而有效提高了該觸摸屏的硬度和屈服強度。The touch screen and the display device provided by the invention use sapphire as the substrate, and the sapphire has a large hardness and yield strength, thereby effectively improving the hardness and yield strength of the touch screen.

請參閱圖1,本發明較佳實施方式的顯示裝置100包括一顯示面板10及一設置在該顯示面板10上的觸摸屏20。該觸摸屏20包括一基片22及一形成在該基片22上、與該顯示面板10相背且用於偵測觸摸動作的透明導電層24。該基片22採用藍寶石製成,該透明導電層24採用氧化銦透明導電膜。Referring to FIG. 1 , a display device 100 according to a preferred embodiment of the present invention includes a display panel 10 and a touch screen 20 disposed on the display panel 10 . The touch screen 20 includes a substrate 22 and a transparent conductive layer 24 formed on the substrate 22 opposite the display panel 10 for detecting a touch action. The substrate 22 is made of sapphire, and the transparent conductive layer 24 is made of an indium oxide transparent conductive film.

該觸摸屏20及該顯示裝置100通過採用藍寶石作為該基片22,由於藍寶石具有較大的硬度和屈服強度,從而有效提高了該觸摸屏20的硬度和屈服強度。具體的,該觸摸屏20的硬度達到1500-200Kg/mm2、屈服強度達到300-400MPa、抗壓強度達到2GPa、溫差範圍為-40-2000℃,並具有抗高電壓和抗高頻等性質。由於該觸摸屏20具有較高的硬度和強度,可有效保護該顯示面板10。另外,由於該觸摸屏20具有抗高電壓和抗高頻的性質,使得該顯示裝置100可用於工業環境中。The touch screen 20 and the display device 100 use sapphire as the substrate 22, and since the sapphire has a large hardness and yield strength, the hardness and yield strength of the touch screen 20 are effectively improved. Specifically, the touch screen 20 has a hardness of 1500-200 Kg/mm2, a yield strength of 300-400 MPa, a compressive strength of 2 GPa, a temperature difference ranging from -40 to 2000 ° C, and is resistant to high voltage and high frequency. Since the touch screen 20 has high hardness and strength, the display panel 10 can be effectively protected. In addition, since the touch screen 20 has high voltage resistance and high frequency resistance, the display device 100 can be used in an industrial environment.

藍寶石屬於剛玉族礦物,三方晶系,具有六方結構。該藍寶石的主要化學成分為三氧化二鋁(Al2O3),折射率在1.760-1.757的範圍內。Sapphire belongs to the corundum mineral, trigonal, with a hexagonal structure. The main chemical component of the sapphire is aluminum oxide (Al2O3), and the refractive index is in the range of 1.760-1.757.

本實施方式的藍寶石採用純淨的Al2O3模造成型(thin film molding, TFM),結晶方向為a軸(11 0),c軸(0001),m軸(10 0)。The sapphire of the present embodiment adopts a pure Al2O3 mode (thin film molding (TFM)), and the crystal direction is a-axis (11 0), c-axis (0001), and m-axis (10 0).

該基片22通過採用鐳射對該藍寶石切割而成。該基片22的尺寸大小根據觸摸屏20尺寸大小而定。具體的,該基片22的長度在1-60英寸的範圍內,寬度在0.5-60英寸的範圍內,而厚度在0.2-1毫米的範圍內。The substrate 22 is formed by cutting the sapphire by laser. The size of the substrate 22 depends on the size of the touch screen 20. Specifically, the substrate 22 has a length in the range of 1-60 inches, a width in the range of 0.5-60 inches, and a thickness in the range of 0.2-1 mm.

考慮到藍寶石對波長為420-700nm的可見光線的透射率較低(小於86%),因此,本實施方式的觸摸屏20還包括一形成於該基片22與該透明導電層24相背的抗反射膜(antireflection coating)26。Considering that the transmittance of sapphire to visible light having a wavelength of 420-700 nm is low (less than 86%), the touch screen 20 of the present embodiment further includes an anti-reflection formed on the substrate 22 opposite to the transparent conductive layer 24. Antireflection coating 26.

該抗反射膜26包括多個依次交替重複堆疊於該基片上高折射率層261及低折射率層262,該抗反射膜膜系結構為(xHyL)n,4≦n≦8,1<x<2,1<y<2,n為正整數,其中,xH表示該高折射率層261,其光學厚度為x/4倍中心波長,yL表示該低折射率層,其光學厚度為y/4倍中心波長,中心波長為工作波長的中間值,n為該高折射率層和該低折射率層重複堆疊的次數。The anti-reflection film 26 includes a plurality of high refractive index layers 261 and a low refractive index layer 262 which are sequentially stacked on the substrate in an alternating manner. The anti-reflection film structure is (xHyL) n , 4≦n≦8, 1<x. <2,1<y<2, n is a positive integer, wherein xH represents the high refractive index layer 261 having an optical thickness of x/4 times the central wavelength, and yL represents the low refractive index layer, and its optical thickness is y/ 4 times the center wavelength, the center wavelength is the intermediate value of the working wavelength, and n is the number of times the high refractive index layer and the low refractive index layer are repeatedly stacked.

與該基片22直接接觸的為該高折射率層261,因此,n=5, 7時,該高折射率層261置頂,而n=6, 8時,該低折射率層262置頂。The high refractive index layer 261 is in direct contact with the substrate 22. Therefore, when n = 5, 7, the high refractive index layer 261 is topped, and when n = 6, 8, the low refractive index layer 262 is topped.

該高折射率層261可以採用二氧化鈦(TiO2)(折射率為2.705),而該低折射率層262可以採用二氧化矽(SiO2)(折射率為1.499)。可以理解,該高折射率層261及該低折射率層262也可以採用其他折射率相當之材料。The high refractive index layer 261 may be made of titanium oxide (TiO2) (refractive index of 2.705), and the low refractive index layer 262 may be made of cerium oxide (SiO2) (refractive index of 1.499). It can be understood that the high refractive index layer 261 and the low refractive index layer 262 can also be made of other materials having the same refractive index.

採用該抗反射膜26後,該基片22的光透射率為90%-99.5%,從而提高了該顯示面板10的光透射率,提高該顯示裝置100的清晰度和解析度。When the anti-reflection film 26 is used, the light transmittance of the substrate 22 is 90% to 99.5%, thereby improving the light transmittance of the display panel 10 and improving the sharpness and resolution of the display device 100.

綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

100...顯示裝置100. . . Display device

10...顯示面板10. . . Display panel

20...觸摸屏20. . . touch screen

22...基片twenty two. . . Substrate

24...透明導電層twenty four. . . Transparent conductive layer

26...抗反射膜26. . . Anti-reflection film

261...高折射率層261. . . High refractive index layer

262...低折射率層262. . . Low refractive index layer

圖1是本發明較佳實施方式提供的顯示裝置的結構示意圖。1 is a schematic structural view of a display device according to a preferred embodiment of the present invention.

100...顯示裝置100. . . Display device

10...顯示面板10. . . Display panel

20...觸摸屏20. . . touch screen

22...基片twenty two. . . Substrate

24...透明導電層twenty four. . . Transparent conductive layer

26...抗反射膜26. . . Anti-reflection film

261...高折射率層261. . . High refractive index layer

262...低折射率層262. . . Low refractive index layer

Claims (10)

一種觸摸屏,其包括一基片及一形成在該基片上用於偵測觸摸動作的透明導電層;該基片採用藍寶石製成,該透明導電層採用氧化銦透明導電膜。A touch screen includes a substrate and a transparent conductive layer formed on the substrate for detecting a touch action; the substrate is made of sapphire, and the transparent conductive layer is made of an indium oxide transparent conductive film. 如申請專利範圍第1項所述的觸摸屏,其特徵在於,該基片的長度在1-60英寸的範圍內,寬度在0.5-60英寸的範圍內,而厚度在0.2-1毫米的範圍內。The touch panel of claim 1, wherein the substrate has a length in the range of 1-60 inches, a width in the range of 0.5-60 inches, and a thickness in the range of 0.2-1 mm. . 如申請專利範圍第1項所述的觸摸屏,其特徵在於,該觸摸屏還包括一形成於該基片與該透明導電膜相背的抗反射膜。The touch panel of claim 1, wherein the touch screen further comprises an anti-reflection film formed on the substrate opposite to the transparent conductive film. 如申請專利範圍第3項所述的觸摸屏,其特徵在於,該抗反射膜包括多個依次交替重複堆疊於該基片上高折射率層及低折射率層,該抗反射膜膜系結構為(xHyL)n,4≦n≦8,1<x<2,1<y<2,n為正整數,其中,xH表示該高折射率層,其光學厚度為x/4倍中心波長,yL表示該低折射率層,其光學厚度為y/4倍中心波長,中心波長為工作波長的中間值,n為該高折射率層和該低折射率層重複堆疊的次數。The touch screen of claim 3, wherein the anti-reflective film comprises a plurality of high refractive index layers and a low refractive index layer repeatedly stacked on the substrate in sequence, the anti-reflective film structure is ( xHyL) n , 4 ≦ n ≦ 8, 1 < x < 2, 1 < y < 2, n is a positive integer, wherein xH represents the high refractive index layer, the optical thickness is x / 4 times the central wavelength, yL represents The low refractive index layer has an optical thickness of y/4 times the central wavelength, the center wavelength is an intermediate value of the operating wavelength, and n is the number of times the high refractive index layer and the low refractive index layer are repeatedly stacked. 如申請專利範圍第4項所述的觸摸屏,其特徵在於,與該基片直接接觸的為該高折射率層,n=5, 7時,該高折射率層置頂,而n=6, 8時,該低折射率層置頂。The touch screen of claim 4, wherein the high refractive index layer is in direct contact with the substrate, and when n=5, 7, the high refractive index layer is topped, and n=6, 8 The low refractive index layer is topped. 如申請專利範圍第4項所述的觸摸屏,其特徵在於,該高折射率層採用二氧化鈦,而該低折射率層採用二氧化矽。The touch panel of claim 4, wherein the high refractive index layer is titanium dioxide and the low refractive index layer is hafnium oxide. 一種顯示裝置,其包括一顯示面板及一設置在該顯示面板上的觸摸屏;該觸摸屏包括一基片及一形成在該基片上、與該顯示面板相背且用於偵測觸摸動作的透明導電層;該基片採用藍寶石製成,該透明導電層採用氧化銦透明導電膜。A display device includes a display panel and a touch screen disposed on the display panel; the touch screen includes a substrate and a transparent conductive layer formed on the substrate opposite to the display panel for detecting a touch action The substrate is made of sapphire, and the transparent conductive layer is made of an indium oxide transparent conductive film. 如申請專利範圍第7項所述的顯示裝置,其特徵在於,該基片的長度在1-60英寸的範圍內,寬度在0.5-60英寸的範圍內,而厚度在0.2-1毫米的範圍內。The display device of claim 7, wherein the substrate has a length in the range of 1-60 inches, a width in the range of 0.5-60 inches, and a thickness in the range of 0.2-1 mm. Inside. 如申請專利範圍第7項所述的顯示裝置,其特徵在於,該觸摸屏還包括一形成於該基片與該透明導電膜相背的抗反射膜。The display device of claim 7, wherein the touch panel further comprises an anti-reflection film formed on the substrate opposite to the transparent conductive film. 如申請專利範圍第9項所述的顯示裝置,其特徵在於,該抗反射膜包括多個依次交替重複堆疊於該基片上高折射率層及低折射率層,該抗反射膜膜系結構為(xHyL)n,4≦n≦8,1<x<2,1<y<2,n為正整數,其中,xH表示該高折射率層,其光學厚度為x/4倍中心波長,yL表示該低折射率層,其光學厚度為y/4倍中心波長,中心波長為工作波長的中間值,n為該高折射率層和該低折射率層重複堆疊的次數。The display device of claim 9, wherein the anti-reflection film comprises a plurality of high refractive index layers and a low refractive index layer stacked on the substrate in an alternating manner, the anti-reflection film structure is (xHyL) n , 4≦n≦8, 1<x<2, 1<y<2, n is a positive integer, where xH represents the high refractive index layer, and its optical thickness is x/4 times the central wavelength, yL The low refractive index layer is represented by an optical thickness of y/4 times the center wavelength, the center wavelength is an intermediate value of the operating wavelength, and n is the number of times the high refractive index layer and the low refractive index layer are repeatedly stacked.
TW101121022A 2012-06-13 2012-06-13 Touch panel and display TWI545475B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103698824A (en) * 2013-12-27 2014-04-02 贵州蓝科睿思技术研发中心 Coated sapphire cover plate and processing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103698824A (en) * 2013-12-27 2014-04-02 贵州蓝科睿思技术研发中心 Coated sapphire cover plate and processing method thereof
CN103698824B (en) * 2013-12-27 2015-11-18 贵州蓝科睿思技术研发中心 A kind of sapphire coated cover-plate and job operation thereof

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