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TW201339569A - Defect testing method - Google Patents

Defect testing method Download PDF

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Publication number
TW201339569A
TW201339569A TW102106538A TW102106538A TW201339569A TW 201339569 A TW201339569 A TW 201339569A TW 102106538 A TW102106538 A TW 102106538A TW 102106538 A TW102106538 A TW 102106538A TW 201339569 A TW201339569 A TW 201339569A
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Taiwan
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light
line sensor
subject
sensor camera
signal
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TW102106538A
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Chinese (zh)
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Ippei Takahashi
Akihiro Eguchi
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Fujifilm Corp
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Publication of TW201339569A publication Critical patent/TW201339569A/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/064Stray light conditioning
    • G01N2201/0642Light traps; baffles

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

A defect testing method is provided, which tests for the existence of defects in a tested sample by a defect testing device. The defect testing device includes an illuminating device, a line sensor camera and a plate-shaped light shielding component. A central area and an end area are disposed in the light shielding component. In a moving direction X of the tested sample, the central area has a straight line-shaped margin as an edge and covers a light-emitting surface partially, wherein the straight line-shaped margin intersects with a moving direction of the tested sample by a predetermined angle. In the end area, a hole of a predetermined pattern is formed at the light shielding area covering overall the end area of the light-emitting surface on the moving direction of the tested sample. The tested sample is evaluated for the existence of defects in the central area, and a relative position of the light shielding component relative to the line sensor camera is tested in the end area.

Description

缺陷檢查方法 Defect inspection method

本發明是有關於一種缺陷檢查方法。 The present invention relates to a defect inspection method.

針對在透明的網狀(web)或片(sheet)狀的被檢體是否存在缺陷,可以非接觸進行線上(online)檢查。線上檢查是藉由如下方式進行,即,使上述被檢體連續移動,在其寬度方向掃描(scan)光,或者照射橫穿寬度方向的線(line)狀的光,光電性地監視來自被檢體的透過光的位準(level)變動。對於成為檢查(check)對象的缺陷而言,根據製品的材質、品質等級、或其用途等,存在針孔(pin hole)、粒狀物的混入、刮痕、或光學應變等各種缺陷。 For the presence or absence of a defect in a transparent web or sheet-like object, an online inspection can be performed in a non-contact manner. The line inspection is performed by continuously moving the subject, scanning light in the width direction, or illuminating a line-like light that traverses the width direction, and photoelectrically monitoring the source. The level of transmitted light of the specimen changes. Regarding the defect to be inspected, there are various defects such as pin holes, granules, scratches, or optical strain depending on the material, quality grade, or use of the product.

已知的日本專利第4132046號公報中的檢查裝置,將移動的網狀的透明片材作為被檢體,在該透明片材的下表面側配置具有在寬度方向細長的發光面的照明裝置,且在上表面側配置線感測器相機(line sensor camera)。照明裝置具有遮光板(plate),以使該遮光板的邊緣(edge)與發光面的長度方向平行的方式在被檢體的移動方向上對發光面部分性地遮光。組入至線感測器相 機的線感測器(Line sensor)的像素的排列方向與遮光板的邊緣平行地對準。以與遮光板的邊緣一致的方式調整相機的光軸。又,使線感測器相機的焦點(focus)對準被檢體的表面附近。因此,在線感測器上,因遮光板的邊緣而引起的明暗的邊界變得模糊而不清晰,於被檢體為正常的透明體的情形時,因遮光板而引起的明部與暗部的中間的50%濃度的灰色光入射至線感測器。 In the inspection apparatus of the Japanese Patent No. 4,132,046, the moving transparent transparent sheet is used as the object, and an illumination device having a light-emitting surface elongated in the width direction is disposed on the lower surface side of the transparent sheet. And a line sensor camera is disposed on the upper surface side. The illuminating device has a light-shielding plate that partially shields the light-emitting surface from the light-emitting surface in such a manner that the edge of the light-shielding plate is parallel to the longitudinal direction of the light-emitting surface. Group into line sensor phase The arrangement direction of the pixels of the line sensor of the machine is aligned in parallel with the edge of the visor. Adjust the optical axis of the camera in a manner consistent with the edge of the visor. Also, the focus of the line sensor camera is aligned near the surface of the subject. Therefore, on the line sensor, the boundary between the light and the dark due to the edge of the visor becomes blurred and unclear, and when the subject is a normal transparent body, the bright and dark portions due to the visor The middle 50% concentration of gray light is incident on the line sensor.

根據併用有遮光板的上述檢查裝置,若於被檢體不存在任何缺陷,則遍及被檢體的全寬而可自線感測器獲得相當於50%濃度的灰色光的光電信號。與此相對,於在被檢體包含某些缺陷的情形時,因光吸收或光散射等而導致自線感測器獲得的光電信號發生變化。而且,於缺陷部通過遮光板的邊緣的過程中,在被檢體的移動方向及寬度方向上會出現對應於缺陷的種類的濃度圖案。根據該方法,於缺陷部通過的過程中所獲得的檢查光的變化是作為二維的圖案資訊而獲得,該檢查光的變化亦可用作判別缺陷的種類的資訊。而且,為了能夠高精度地獲得寬度方向上的檢查光的強度變化的圖案資訊,而需要提高線感測器每一像素的分辨力。 According to the above-described inspection apparatus using a visor, if there is no defect in the subject, a photoelectric signal corresponding to 50% of gray light can be obtained from the line sensor over the full width of the subject. On the other hand, when the subject contains certain defects, the photoelectric signal obtained from the line sensor changes due to light absorption or light scattering or the like. Further, in the process in which the defective portion passes through the edge of the light shielding plate, a density pattern corresponding to the type of the defect appears in the moving direction and the width direction of the subject. According to this method, the change of the inspection light obtained in the process of passing the defective portion is obtained as two-dimensional pattern information, and the change in the inspection light can also be used as information for discriminating the type of the defect. Moreover, in order to obtain pattern information of the intensity change of the inspection light in the width direction with high precision, it is necessary to increase the resolution of each pixel of the line sensor.

另一方面,於上述檢查裝置中,通常是以使線感測器相機的光軸與遮光板的邊緣一致的標準設定來使用。然而,即便最初為標準設定,但是於反覆使用的期間亦會有如下情況,即,檢查裝置的構成的一部分,例如支撐照明裝置或線感測器相機的框架(frame)或支架(bracket)類因周圍溫度的變化等而變形。 其結果,會有線感測器相機的光軸偏離遮光板的邊緣、或者線感測器的像素排列的方向與邊緣失去平行的情況。 On the other hand, in the above-described inspection apparatus, it is generally used in a standard setting in which the optical axis of the line sensor camera is aligned with the edge of the light shielding plate. However, even if it is initially set as a standard, during the period of repeated use, there may be a case where a part of the configuration of the inspection device, for example, a frame or a bracket supporting the illumination device or the line sensor camera. Deformed due to changes in ambient temperature, etc. As a result, the optical axis of the wired sensor camera may be deviated from the edge of the visor, or the direction in which the pixel of the line sensor is arranged may be lost in parallel with the edge.

如此,若因遮光板的邊緣而引起的明暗的邊界線相對於線感測器偏移,則結果是自線感測器獲得的光電輸出根據偏移的方向而發生增減。因此,有缺陷檢查的精度降低之虞。尤其是,若為提高線感測器的每一像素的分辨力而減小像素尺寸(size),則對應於此,相對於空間上的位置偏移的感度變得敏感,故而於標準設定下無法檢測出可於適當位準檢測出的光電信號,從而難以將檢查精度維持於穩定。再者,對於照明裝置本身的光量變動,能夠以普通的反饋(feedback)控制實現光量的穩定化。然而,對於伴隨上述相機的光軸與遮光板的邊緣的相對位置的變化的光量變動,無法以照明裝置的光量控制來應對。 Thus, if the boundary line of the light and dark due to the edge of the visor is offset with respect to the line sensor, the result is that the photoelectric output obtained from the line sensor increases or decreases according to the direction of the offset. Therefore, the accuracy of the defect inspection is reduced. In particular, if the pixel size is reduced in order to increase the resolution of each pixel of the line sensor, the sensitivity with respect to the spatial positional shift becomes sensitive, and thus the standard setting is made. It is impossible to detect the photoelectric signal that can be detected at an appropriate level, and it is difficult to maintain the inspection accuracy stable. Further, with respect to the variation in the amount of light of the illumination device itself, the stabilization of the amount of light can be achieved by ordinary feedback control. However, the variation in the amount of light accompanying the change in the relative position of the optical axis of the camera and the edge of the visor cannot be handled by the light amount control of the illumination device.

因此,本發明的目的在於提供一種缺陷檢查方法,於一面使透明的片材等的被檢體連續地移動,一面對其一面照射光,且以線感測器相機越過遮光板的邊緣而接收自另一面透過而來的檢查光來檢查有無缺陷時,防止遮光板的邊緣相對於線感測器相機的光軸而偏移、或者繞光軸傾斜,從而將檢查精度保持於穩定。 Therefore, an object of the present invention is to provide a defect inspection method in which a subject such as a transparent sheet is continuously moved while irradiating light to one side thereof, and the line sensor camera passes over the edge of the light shielding plate. When the inspection light transmitted from the other surface is received to check for the presence or absence of the defect, the edge of the visor is prevented from shifting with respect to the optical axis of the line sensor camera or tilted around the optical axis, thereby keeping the inspection accuracy stable.

為了達成上述目的,本發明的缺陷檢查方法包括連續移動步驟、照射步驟、設置步驟、受光步驟、以及評估步驟。連續移動步驟是使透明的網狀或片狀的被檢體連續移動。照射步驟是自具有矩形的發光面的照明裝置的發光面向連續移動中的被檢 體的一面照射光。發光面的長邊為超過被檢體的寬度的長度。照明裝置的發光面的長邊方向是以規定的角度配置於被檢體的移動方向。設置步驟是將遮光板於定位的狀態下設置於發光面與被檢體之間。遮光板包括中央區域(area)與端部區域。中央區域於被檢體的寬度方向整體性地覆蓋發光面,於被檢體的移動方向以與移動方向以規定的角度相交的直線狀的邊緣為邊界而部分性地覆蓋發光面。端部區域於在被檢體的移動方向整體地覆蓋發光面的端部的遮光區域形成有規定圖案(pattern)的通孔。遮光板是以使遮光板的邊緣與線感測器相機的光軸對準的方式定位。受光步驟是藉由線感測器相機的線感測器一併接收透過被檢體的檢查光及通過被檢體的寬度外的來自發光面端部的端部光。線感測器相機是以與被檢體的另一面對向,且使線感測器的像素的排列方向成為與發光面的長邊方向平行的方式配置。評估步驟是基於自線感測器相機所獲得的中央區域的光電信號評估被檢體有無缺陷,且基於端部區域的光電信號而評估遮光板相對於線感測器相機的相對位置。 In order to achieve the above object, the defect inspection method of the present invention includes a continuous moving step, an irradiation step, a setting step, a light receiving step, and an evaluation step. The continuous moving step is to continuously move the transparent mesh or sheet-like subject. The illuminating step is a test in which the illuminating device of the illuminating device having a rectangular illuminating surface is continuously moved. One side of the body illuminates the light. The long side of the light emitting surface is a length exceeding the width of the subject. The longitudinal direction of the light-emitting surface of the illumination device is arranged at a predetermined angle in the moving direction of the subject. The setting step is to arrange the light shielding plate between the light emitting surface and the object in a state of being positioned. The visor includes a central area and an end area. The central region integrally covers the light-emitting surface in the width direction of the subject, and partially covers the light-emitting surface at a boundary between the moving edge of the subject and the linear edge intersecting at a predetermined angle with the moving direction. The end region is formed with a through hole having a predetermined pattern in a light-shielding region in which the end portion of the light-emitting surface is entirely covered in the moving direction of the subject. The visor is positioned in such a way that the edge of the visor is aligned with the optical axis of the line sensor camera. The light receiving step is to receive the inspection light transmitted through the subject and the end light from the end of the light emitting surface outside the width of the subject by the line sensor of the line sensor camera. The line sensor camera is disposed so as to face the other side of the subject, and the arrangement direction of the pixels of the line sensor is made parallel to the longitudinal direction of the light emitting surface. The evaluation step is based on evaluating the presence or absence of defects of the subject based on the photoelectric signals of the central region obtained from the line sensor camera, and evaluating the relative position of the visor relative to the line sensor camera based on the photoelectric signals of the end regions.

較佳為參照中央區域的光電信號與端部區域的光電信號的兩者,以遮光板相對於線感測器相機的光軸是否自標準位置向被檢體的移動方向偏移來評估遮光板相對於線感測器相機的相對位置。 Preferably, referring to both the photoelectric signal of the central region and the photoelectric signal of the end region, the visor is evaluated by whether the optical axis of the visor relative to the optical axis of the line sensor camera is shifted from the standard position to the moving direction of the object. Relative position relative to the line sensor camera.

較佳為對照端部區域的各個光電信號,以線感測器相機的像素的排列方向與遮光板的邊緣的相對平行度來評估遮光板相對於線感測器相機的相對位置。 Preferably, the relative position of the visor relative to the line sensor camera is evaluated by comparing the relative parallelism of the arrangement direction of the pixels of the line sensor camera with the edge of the visor.

較佳為基於遮光板相對於線感測器相機的相對位置 的評估結果,當遮光板的邊緣不與線感測器相機的光軸對準時發出未對準的警告。 Preferably based on the relative position of the visor relative to the line sensor camera As a result of the evaluation, a misalignment warning is issued when the edge of the visor is not aligned with the optical axis of the line sensor camera.

較佳為基於遮光板相對於線感測器相機的相對位置的評估結果,使用調整單元使遮光板與光軸對準,該調整單元以使遮光板的邊緣與線感測器相機的光軸對準的方式機械性地或光學性地進行調整。 Preferably, based on the evaluation result of the relative position of the visor relative to the line sensor camera, the illuminating plate is aligned with the optical axis using an adjustment unit such that the edge of the visor and the optical axis of the line sensor camera The alignment is mechanically or optically adjusted.

光學性地調整的調整單元較佳為,使以於被檢體的寬度方向整體地覆蓋的方式設置的折射率及厚度均勻的透明構件旋轉。較佳為於被檢體與遮光板之間的端部光的光路上,分別設置有凹柱狀透鏡(cylindrical lens)。較佳為以使中央區域的光電信號強度成為大致固定的方式調整自照明裝置照射的光量。 Preferably, the optically adjusted adjustment unit rotates the transparent member having a uniform refractive index and a thickness which are provided so as to cover the entire width direction of the subject. Preferably, a concave cylindrical lens is provided on the optical path of the end light between the subject and the light shielding plate. It is preferable to adjust the amount of light irradiated from the illumination device such that the photoelectric signal intensity in the central region is substantially constant.

根據本發明,可基於自中央區域所獲得的光電信號來評估被檢體有無缺陷,且可基於自端部區域所獲得的光電信號來檢測遮光板相對於線感測器相機的相對位置。因此,可防止遮光板的邊緣相對於線感測器相機的光軸而偏移、或者繞光軸而傾斜,從而可將檢查精度保持於穩定。 According to the present invention, the presence or absence of a defect of the object can be evaluated based on the photoelectric signal obtained from the central region, and the relative position of the visor relative to the line sensor camera can be detected based on the photoelectric signal obtained from the end region. Therefore, it is possible to prevent the edge of the light shielding plate from being displaced with respect to the optical axis of the line sensor camera or tilting about the optical axis, so that the inspection accuracy can be kept stable.

2、60、70‧‧‧缺陷檢查裝置 2, 60, 70‧‧‧ defect inspection device

3‧‧‧被檢體 3‧‧‧The subject

3A、3D‧‧‧明缺陷 3A, 3D‧‧‧ Defects

3B、3C‧‧‧暗缺陷 3B, 3C‧‧‧Dark defects

4‧‧‧照明裝置 4‧‧‧Lighting device

4A‧‧‧發光面 4A‧‧‧Lighting surface

4B‧‧‧發光二極體 4B‧‧‧Lighting diode

4C‧‧‧擴散板 4C‧‧‧Diffuser

6‧‧‧線感測器相機 6‧‧‧ line sensor camera

6A‧‧‧透鏡 6A‧‧ lens

6B‧‧‧線感測器 6B‧‧‧ line sensor

8‧‧‧遮光構件 8‧‧‧ shading members

8A‧‧‧邊緣 8A‧‧‧ edge

10‧‧‧光軸 10‧‧‧ optical axis

11‧‧‧系統控制器 11‧‧‧System Controller

12‧‧‧光強度調整部 12‧‧‧Light intensity adjustment department

14‧‧‧相機動作部 14‧‧‧ Camera Action Department

16‧‧‧信號處理部 16‧‧‧Signal Processing Department

18‧‧‧缺陷判定部 18‧‧‧Defect Determination Department

19‧‧‧缺陷顯示部 19‧‧‧Defect Display Department

21‧‧‧遮光板位置檢測部 21‧‧ ‧ visor position detection department

22‧‧‧警報部 22‧‧‧Warning Department

23‧‧‧遮光板位置調整部 23‧‧ ‧ visor position adjustment department

25‧‧‧記錄部 25‧‧ Record Department

27A、27B、27C、27D‧‧‧測定線 27A, 27B, 27C, 27D‧‧‧ Determination line

30、40、50‧‧‧遮光板 30, 40, 50‧ ‧ visors

30A、50A‧‧‧邊緣 30A, 50A‧‧‧ edge

30B、50B‧‧‧中央區域 30B, 50B‧‧‧Central Area

30C、50C‧‧‧端部區域 30C, 50C‧‧‧ end area

30D、50D1、50D2、50D3、50D4‧‧‧狹縫 30D, 50D1, 50D2, 50D3, 50D4‧‧ slit

32A、32B、34A、34B、36A、36B、38A、38B、40A、40B、40C、40D、42A、42B、42C、42D、44A、44B、44C、44D、46A、46B、46C、46D、48A、48B、48C、48D、52A、52B、54A、54B、56A、56B、58A、58B‧‧‧信號強度 32A, 32B, 34A, 34B, 36A, 36B, 38A, 38B, 40A, 40B, 40C, 40D, 42A, 42B, 42C, 42D, 44A, 44B, 44C, 44D, 46A, 46B, 46C, 46D, 48A, 48B, 48C, 48D, 52A, 52B, 54A, 54B, 56A, 56B, 58A, 58B‧‧‧ Signal strength

62‧‧‧透明構件 62‧‧‧Transparent components

72‧‧‧凹柱狀透鏡 72‧‧‧ concave cylindrical lens

P‧‧‧正常信號 P‧‧‧Normal signal

Q‧‧‧缺陷信號 Q‧‧‧ Defect signal

X‧‧‧移動方向 X‧‧‧ moving direction

圖1是本發明的實施方式的缺陷檢查裝置的概略立體圖。 Fig. 1 is a schematic perspective view of a defect inspection device according to an embodiment of the present invention.

圖2是圖1的缺陷檢查裝置的剖面圖。 Figure 2 is a cross-sectional view of the defect inspection device of Figure 1.

圖3是本發明的實施方式的缺陷檢查裝置的缺陷檢查例的說明圖。 3 is an explanatory view of a defect inspection example of the defect inspection device according to the embodiment of the present invention.

圖4(A)、圖4(B)是說明用於本發明的實施方式的缺陷檢查裝置的遮光構件的第1實施方式的圖。 4(A) and 4(B) are views for explaining a first embodiment of a light shielding member used in the defect inspection device according to the embodiment of the present invention.

圖5是針對用於本發明的實施方式的缺陷檢查裝置的遮光構件的第1實施方式,說明相對於光軸面的變化的線感測器的信號的變化的圖。 FIG. 5 is a view for explaining a change in a signal of a line sensor with respect to a change in an optical axis surface in the first embodiment of the light shielding member used in the defect inspection device according to the embodiment of the present invention.

圖6(A)、圖6(B)是說明用於本發明的實施方式的缺陷檢查裝置的遮光構件的第2實施方式的圖。 6(A) and 6(B) are views for explaining a second embodiment of a light shielding member used in the defect inspection device according to the embodiment of the present invention.

圖7是針對用於本發明的實施方式的缺陷檢查裝置的遮光構件的第2實施方式,說明相對於光軸面的變化的線感測器的信號的變化的圖。 FIG. 7 is a view for explaining a change in a signal of a line sensor with respect to a change in an optical axis surface, in a second embodiment of a light shielding member used in the defect inspection device according to the embodiment of the present invention.

圖8(A)、圖8(B)是說明用於本發明的實施方式的缺陷檢查裝置的遮光構件的第3實施方式的圖。 8(A) and 8(B) are views for explaining a third embodiment of a light shielding member used in the defect inspection device according to the embodiment of the present invention.

圖9是針對用於本發明的實施方式的缺陷檢查裝置的遮光構件的第3實施方式,說明相對於光軸面的變化的線感測器的信號的變化的圖。 FIG. 9 is a view for explaining a change in a signal of a line sensor with respect to a change in an optical axis surface, in a third embodiment of a light shielding member used in the defect inspection device according to the embodiment of the present invention.

圖10是本發明的實施方式的另一缺陷檢查裝置的剖面圖。 Fig. 10 is a cross-sectional view showing another defect inspection device according to an embodiment of the present invention.

圖11是本發明的實施方式的另一缺陷檢查裝置的概略立體圖。 Fig. 11 is a schematic perspective view of another defect inspection device according to an embodiment of the present invention.

圖12是圖11的缺陷檢查裝置的剖面圖。 Figure 12 is a cross-sectional view of the defect inspection device of Figure 11 .

如圖1所示,本發明的缺陷檢查裝置2是一面使透明的網狀或片狀的被檢體3連續移動,一面對被檢體3的一面照射光,並基於透過被檢體3的檢查光來檢查被檢體有無缺陷。作為 被檢體3,有例如薄膜(film)及玻璃(glass)等。缺陷檢查裝置2包括照明裝置4、線感測器相機6、及板狀的遮光構件8。照明裝置4設置於被檢體3的一側(圖的下側),使光照射至被檢體3。線感測器相機6相對於被檢體3而設置於照明裝置4之相反側(圖的上側),並接收檢查光。遮光構件8設置於被檢體3與照明裝置4之間,並部分性地遮蔽自照明裝置4照射的光。 As shown in Fig. 1, the defect inspection device 2 of the present invention continuously moves a transparent mesh or sheet-like subject 3, and irradiates light to one surface of the subject 3 based on the transmitted subject 3 Check the light to check the subject for defects. As The subject 3 includes, for example, a film, a glass, and the like. The defect inspection device 2 includes an illumination device 4, a line sensor camera 6, and a plate-shaped light shielding member 8. The illuminating device 4 is provided on one side (the lower side in the drawing) of the subject 3, and illuminates the subject 3 with light. The line sensor camera 6 is disposed on the opposite side (upper side of the drawing) of the illumination device 4 with respect to the subject 3, and receives inspection light. The light shielding member 8 is provided between the subject 3 and the illumination device 4, and partially shields the light irradiated from the illumination device 4.

照明裝置4具有超過被檢體3的寬度的長度的矩形狀的發光面4A,且以使發光面4A的長邊方向與被檢體3的移動方向X正交而配置。發光面4A與通過的被檢體3平行。所謂被檢體3的寬度,是指該被檢體3於與被檢體3的移動方向正交的方向的長度。又,如圖2所示,於照明裝置4,朝向發光面4A且沿發光面4A的長邊方向並排設置有多個發光二極體(light-emitting diode)4B,於發光面4A側設置有擴散板4C。因此,照明裝置4自發光面4A照射發光強度的座標相依性極少的光。再者,亦可使用其他發光元件代替發光二極體4B。 The illuminating device 4 has a rectangular light-emitting surface 4A that is longer than the width of the subject 3, and is disposed such that the longitudinal direction of the light-emitting surface 4A is orthogonal to the moving direction X of the subject 3. The light emitting surface 4A is parallel to the passed subject 3 . The width of the subject 3 refers to the length of the subject 3 in a direction orthogonal to the moving direction of the subject 3 . Further, as shown in FIG. 2, in the illumination device 4, a plurality of light-emitting diodes 4B are arranged side by side in the longitudinal direction of the light-emitting surface 4A toward the light-emitting surface 4A, and are provided on the light-emitting surface 4A side. Diffuser plate 4C. Therefore, the illumination device 4 irradiates light having a small coordinate dependency of the luminous intensity from the light-emitting surface 4A. Further, other light-emitting elements may be used instead of the light-emitting diodes 4B.

如圖2所示,線感測器相機6具有透鏡(lens)6A及線感測器6B。線感測器6B包含在被檢體3的寬度方向線狀地排列有多個的感測器(未圖示)等,且接收來自具有固定的寬度的線狀的檢查區域的光。線感測器相機6的透鏡6A與發光面4A對向而配置,透鏡6A的光軸及線感測器相機6的光軸10通過被檢體3的移動方向X上的發光面4A的大致中心。自照明裝置4照射至被檢體3的光透過被檢體3並經由透鏡6A而被線感測器6B的各個感測器接收,且被轉換為光電信號。又,線感測器相機6的焦點對準於被檢體3的表面。 As shown in FIG. 2, the line sensor camera 6 has a lens 6A and a line sensor 6B. The line sensor 6B includes a plurality of sensors (not shown) and the like arranged in a line in the width direction of the subject 3, and receives light from a linear inspection region having a fixed width. The lens 6A of the line sensor camera 6 is disposed to face the light-emitting surface 4A, and the optical axis of the lens 6A and the optical axis 10 of the line sensor camera 6 pass through the light-emitting surface 4A in the moving direction X of the subject 3 center. The light irradiated from the illumination device 4 to the subject 3 passes through the subject 3 and is received by the respective sensors of the line sensor 6B via the lens 6A, and is converted into an electro-optical signal. Further, the focus of the line sensor camera 6 is aligned with the surface of the subject 3.

又,遮光構件8於被檢體3的寬度方向上整體地覆蓋發光面4A。遮光構件8包括:中央區域,於被檢體3的移動方向X,以與該移動方向X正交的直線狀的邊緣8A為邊界而部分性地覆蓋發光面4A;及端部區域,於在被檢體的移動方向上整體地覆蓋發光面端部的遮光區域形成有規定圖案的通孔。關於中央區域與端部區域的詳細情況,下文使用其他圖式進行敍述。遮光構件8被定位於邊緣8A與線感測器相機6的光軸10對準的狀態。對遮光構件8使用例如作為第1實施方式的遮光板30(參照圖4(A)、圖4(B)、圖5)、作為第2實施方式的遮光板40(參照圖6(A)、圖6(B)、圖7)、或作為第3實施方式的遮光板50(參照圖8(A)、圖8(B)、圖9)。關於第1、第2、第3實施方式,下文分別進行具體敍述。 Moreover, the light shielding member 8 integrally covers the light emitting surface 4A in the width direction of the subject 3. The light shielding member 8 includes a central region that partially covers the light-emitting surface 4A with a linear edge 8A orthogonal to the movement direction X in the moving direction X of the subject 3, and an end region. A through hole in which a predetermined pattern is formed in a light-shielding region in which the end portion of the light-emitting surface is entirely covered in the moving direction of the subject. The details of the central area and the end area are described below using other drawings. The light shielding member 8 is positioned in a state where the edge 8A is aligned with the optical axis 10 of the line sensor camera 6. For the light-shielding member 8, for example, the light-shielding plate 30 (see FIGS. 4(A), 4(B), and 5) of the first embodiment, and the light-shielding plate 40 of the second embodiment are used (see FIG. 6(A), 6(B), 7) or the light shielding plate 50 of the third embodiment (see FIGS. 8(A), 8(B), and 9). The first, second, and third embodiments will be specifically described below.

此處,以將被檢體3設為網狀的透明薄膜的情況為例進行說明。然而,被檢體3亦可為非網狀的透明薄膜或透明的玻璃板等,只要滿足所需的條件,則亦可為其他物品。於被檢體3為網狀的透明薄膜的情形時,為了使被檢體3穩定地向一個方向移動,而設置有例如網狀的透明薄膜的供給滾輪(roller)、該透明薄膜的捲取滾輪及該透明薄膜的搬送滾輪等搬送系統。 Here, a case where the subject 3 is a mesh-shaped transparent film will be described as an example. However, the subject 3 may be a non-retic transparent film or a transparent glass plate or the like, and may be other articles as long as the required conditions are satisfied. In the case where the subject 3 is a mesh-shaped transparent film, a supply roller such as a mesh-shaped transparent film is provided, and a roll of the transparent film is provided in order to stably move the subject 3 in one direction. A conveying system such as a roller and a conveying roller of the transparent film.

此外,如圖1所示,本發明的缺陷檢查裝置2包括系統控制器(system controller)11、光強度調整部12、相機動作部14、信號處理部16、缺陷判定部18、及缺陷顯示部19。系統控制器11控制缺陷檢查裝置2的整體的系統。光強度調整部12調整自照明裝置4照射的光強度。相機動作部14使線感測器相機6動作。信號處理部16對由線感測器相機6的線感測器6B取得的光 電信號進行處理。缺陷判定部18根據中央區域的光電信號的處理結果來判定被檢體3的缺陷。缺陷顯示部19顯示藉由缺陷判定部18而判定的被檢體3的缺陷。又,如圖1所示,缺陷檢查裝置2包括遮光板位置檢測部21、警報部22、遮光板位置調整部23、及記錄部25。遮光板位置檢測部21根據端部區域中的光電信號的處理結果來檢測遮光構件8的位置。警報部22於遮光構件8的邊緣8A未與線感測器相機6的光軸10對準時發出表示未對準的警報。遮光板位置調整部23將遮光構件8及線感測器相機6機械性地或光學性地調整至使遮光構件8的邊緣8A與線感測器相機6的光軸10對準的狀態。於該調整中,遮光板位置調整部23將遮光構件8的姿勢與線感測器相機6的檢查區域中的至少任一者調整至使邊緣8A與線狀的檢查區域平行的狀態。所謂邊緣8A與檢查區域對準的狀態,是指自線感測器相機6觀察遮光構件8時,邊緣8A進入至檢查區域內的狀態。記錄部25記錄經信號處理的光電信號、照明裝置4的光強度資訊、及遮光構件8的位置資訊等。再者,警報部22發出的警報可為利用聲音的警報或利用光的警報等任何警報。 Further, as shown in FIG. 1, the defect inspection device 2 of the present invention includes a system controller 11, a light intensity adjustment unit 12, a camera operation unit 14, a signal processing unit 16, a defect determination unit 18, and a defect display unit. 19. The system controller 11 controls the overall system of the defect inspection device 2. The light intensity adjustment unit 12 adjusts the light intensity radiated from the illumination device 4. The camera action unit 14 operates the line sensor camera 6. The signal processing unit 16 pairs the light obtained by the line sensor 6B of the line sensor camera 6 The electrical signal is processed. The defect determination unit 18 determines the defect of the subject 3 based on the processing result of the photoelectric signal in the central region. The defect display unit 19 displays the defect of the subject 3 determined by the defect determination unit 18. Moreover, as shown in FIG. 1, the defect inspection apparatus 2 includes the visor position detecting unit 21, the alarm unit 22, the visor position adjusting unit 23, and the recording unit 25. The visor position detecting unit 21 detects the position of the light shielding member 8 based on the processing result of the photoelectric signal in the end portion. The alarm portion 22 issues an alarm indicating misalignment when the edge 8A of the light shielding member 8 is not aligned with the optical axis 10 of the line sensor camera 6. The visor position adjusting portion 23 mechanically or optically adjusts the light shielding member 8 and the line sensor camera 6 to a state in which the edge 8A of the light shielding member 8 is aligned with the optical axis 10 of the line sensor camera 6. In this adjustment, the light shielding plate position adjusting portion 23 adjusts at least one of the posture of the light shielding member 8 and the inspection region of the line sensor camera 6 to a state in which the edge 8A is parallel to the linear inspection region. The state in which the edge 8A is aligned with the inspection region refers to a state in which the edge 8A enters the inspection region when the light shielding member 8 is observed from the line sensor camera 6. The recording unit 25 records the signal-processed photoelectric signal, the light intensity information of the illumination device 4, the position information of the light-shielding member 8, and the like. Furthermore, the alarm issued by the alarm unit 22 may be any alarm such as an alarm using sound or an alarm using light.

使用圖3,針對被檢體3具有明缺陷3A、明缺陷3D與暗缺陷3B、暗缺陷3C的情形時的中央區域中的光電信號進行說明。明缺陷3A、明缺陷3D是可獲得較透過被檢體3的不具有缺陷的部分所獲得的光電信號的強度強的強度的部位。暗缺陷3B、暗缺陷3C是獲得較透過不具有缺陷的部分所獲得的光電信號的強度弱的強度的部位。橫穿缺陷的測定線(A)、測定線(B)、測定線(C)、測定線(D)、測定線(E)上的中央區域中的光電 信號,分別成為如圖3的(A)、(B)、(C)、(D)、(E)所示。不橫穿缺陷的測定線(F)上的中央區域中的光電信號如圖3的(F)所示,成為無峰值(peak)等的固定位準的直線。更具體而言,當將夾持遮光構件8的邊緣8A的明部設為濃度0%的白色,將暗部設為濃度100%的黑色時,於被檢體3為無缺陷的正常的被檢體3的情形時,遍及被檢體3的全寬而可獲得保持於正常信號位準的正常信號P。該正常信號位準相當於自線感測器6B所獲得的濃度50%的灰色的光電信號。另一方面,於在被檢體3有缺陷的情形時,如圖3的(A)~圖3的(E)所示,於該被檢體3的對應部位可獲得各個缺陷信號Q。於本發明的缺陷檢查裝置2中,該些光電信號經處理而作為具有濃度分佈的二維圖案或線掃描(line scan)圖像來表現,從而檢測出被檢體3中的明缺陷3A、明缺陷3D及暗缺陷3B、暗缺陷3C。再者,測定線是上述的檢查區域。 The photoelectric signal in the central region in the case where the subject 3 has the bright defect 3A, the bright defect 3D, the dark defect 3B, and the dark defect 3C will be described with reference to FIG. The bright defect 3A and the bright defect 3D are portions where the intensity of the photoelectric signal obtained by the portion of the subject 3 that does not have a defect is obtained. The dark defect 3B and the dark defect 3C are portions which obtain a weaker intensity than the photoelectric signal obtained by passing through the portion having no defect. Photoelectricity in the central region on the measurement line (A), the measurement line (B), the measurement line (C), the measurement line (D), and the measurement line (E) across the defect The signals are as shown in (A), (B), (C), (D), and (E) of Fig. 3, respectively. As shown in (F) of FIG. 3, the photoelectric signal in the central region on the measurement line (F) that does not cross the defect is a straight line having no fixed level such as a peak. More specifically, when the bright portion of the edge 8A of the light-shielding member 8 is set to a white color having a concentration of 0% and the dark portion is set to a black color having a density of 100%, the subject 3 is normally inspected without defects. In the case of the body 3, the normal signal P maintained at the normal signal level can be obtained throughout the full width of the subject 3. This normal signal level corresponds to a gray photoelectric signal of 50% concentration obtained from the line sensor 6B. On the other hand, when the subject 3 is defective, as shown in FIG. 3 (A) to FIG. 3 (E), each defect signal Q can be obtained at the corresponding portion of the subject 3. In the defect inspection device 2 of the present invention, the photoelectric signals are processed and expressed as a two-dimensional pattern or a line scan image having a density distribution, thereby detecting a bright defect 3A in the subject 3, Defect 3D and dark defect 3B, dark defect 3C. Furthermore, the measurement line is the above-described inspection area.

如圖4(A)所示,作為遮光構件8的第1實施方式的遮光板30包括:中央區域30B,具有邊緣30A;及端部區域30C,設置於遮光板30的寬度方向兩端。所謂遮光板30的寬度方向,是指與發光面4A的長邊方向一致的方向,至於下述的各遮光板40、遮光板50亦相同。端部區域30C分別包含:遮光區域;及狹縫(slit)30D,具有跨及邊緣30A的延長線的固定的長度,且為固定寬度。 As shown in FIG. 4(A), the light shielding plate 30 of the first embodiment as the light shielding member 8 includes a central portion 30B having an edge 30A and an end portion 30C provided at both ends in the width direction of the light shielding plate 30. The width direction of the light shielding plate 30 is a direction that coincides with the longitudinal direction of the light-emitting surface 4A, and is also the same for each of the light shielding plate 40 and the light shielding plate 50 described below. The end regions 30C each include a light-shielding region; and a slit 30D having a fixed length spanning the extension of the edge 30A and having a fixed width.

於遮光板30的寬度方向,在設置有邊緣30A的中央區域30B評估被檢體3有無缺陷,在端部區域30C評估遮光板30相對於線感測器相機6的相對位置。又,測定線27A是表示邊緣30A與被檢體3的移動方向X正交且與線感測器相機6的光軸10 對準時的測定線,亦即遮光板30在檢查時位於適當位置的情形時的測定線。 In the width direction of the light shielding plate 30, the subject 3 is evaluated for the presence or absence of defects in the central portion 30B provided with the edge 30A, and the relative position of the light shielding plate 30 with respect to the line sensor camera 6 is evaluated at the end portion region 30C. Further, the measurement line 27A indicates that the edge 30A is orthogonal to the moving direction X of the subject 3 and the optical axis 10 of the line sensor camera 6 The measurement line at the time of alignment, that is, the measurement line when the visor 30 is in an appropriate position at the time of inspection.

於第1實施方式中,當測定線為測定線27A時,線感測器相機6獲得如圖4(B)所示的光電信號。對於該光電信號,於中央區域30B中,在無缺陷的位置的信號強度為32A,在有明缺陷3A、明缺陷3D的位置可獲得較信號強度32A強的光電信號,在有暗缺陷3B、暗缺陷3C的位置可獲得較信號強度32A弱的光電信號。又,於端部區域30C中,在遮光區域無法獲得光電信號,在具有狹縫30D的區域可獲得遠強於信號強度32A的光電信號32B。 In the first embodiment, when the measurement line is the measurement line 27A, the line sensor camera 6 obtains the photoelectric signal as shown in FIG. 4(B). For the photoelectric signal, in the central region 30B, the signal intensity at the defect-free position is 32 A, and a photoelectric signal having a stronger signal intensity 32A can be obtained at a position where the defect 3A and the bright defect 3D are present, and there is a dark defect 3B, dark. The position of the defect 3C can obtain a photoelectric signal that is weaker than the signal intensity 32A. Further, in the end portion region 30C, the photoelectric signal is not obtained in the light-shielding region, and the photoelectric signal 32B far stronger than the signal intensity 32A can be obtained in the region having the slit 30D.

如圖6(A)所示,作為遮光構件8的第2實施方式的遮光板40包括:中央區域40B,具有邊緣40A;及端部區域40C,設置於遮光板40的寬度方向兩端。端部區域40C分別包含:遮光區域;及楔形狀的空隙40D,跨及邊緣40A的延長線且空隙寬度於被檢體3的移動方向X連續地變化。 As shown in FIG. 6(A), the light shielding plate 40 of the second embodiment as the light shielding member 8 includes a central portion 40B having an edge 40A and an end portion 40C provided at both ends in the width direction of the light shielding plate 40. Each of the end regions 40C includes a light-shielding region, and a wedge-shaped void 40D that extends across the extension line of the edge 40A and continuously changes in the moving direction X of the subject 3 .

於遮光板40的寬度方向,在設置有邊緣40A的中央區域40B評估被檢體3有無缺陷,在端部區域40C評估遮光板40相對於線感測器相機6的相對位置。又,與第1實施方式同樣地,測定線27A是表示邊緣40A與被檢體3的移動方向X正交且與線感測器相機6的光軸10對準時的測定線,亦即遮光板40在測定時位於適當位置的情形時的測定線。 In the width direction of the light shielding plate 40, the subject 3 is evaluated for the presence or absence of defects in the central portion 40B provided with the edge 40A, and the relative position of the light shielding plate 40 with respect to the line sensor camera 6 is evaluated at the end portion region 40C. In the same manner as in the first embodiment, the measurement line 27A is a measurement line indicating that the edge 40A is orthogonal to the movement direction X of the subject 3 and aligned with the optical axis 10 of the line sensor camera 6, that is, the visor 40 A measurement line when it is in the proper position at the time of measurement.

於第2實施方式中,當測定線為27A時,線感測器相機6獲得如圖6(B)所示的光電信號。對於該光電信號,於中央區域40B中,在無缺陷的位置的信號強度為42A,在有明缺陷3A、 明缺陷3D的位置可獲得較信號強度42A強的光電信號,在有暗缺陷3B、暗缺陷3C的位置可獲得較信號強度42A弱的光電信號。又,於端部區域40C中,在遮光區域無法獲得光電信號,在具有楔形狀的空隙40D的區域可獲得遠強於信號強度42A、且信號寬度為42C的信號強度42B。 In the second embodiment, when the measurement line is 27A, the line sensor camera 6 obtains the photoelectric signal as shown in Fig. 6(B). For the photoelectric signal, in the central region 40B, the signal intensity at the defect-free position is 42 A, and there is a clear defect 3A, The position of the bright defect 3D can obtain a photoelectric signal stronger than the signal intensity 42A, and a photoelectric signal weaker than the signal intensity 42A can be obtained at the position where the dark defect 3B and the dark defect 3C are present. Further, in the end portion region 40C, the photoelectric signal is not obtained in the light-shielding region, and the signal intensity 42B having a signal intensity of 42 A and a signal width of 42 C can be obtained in the region having the wedge-shaped void 40D.

如圖8(A)所示,作為遮光構件8的第3實施方式的遮光板50包括:中央區域50B,具有邊緣50A;及端部區域50C,設置於遮光板50的寬度方向兩端。於端部區域50C分別設置有:遮光區域;及狹縫50D1、狹縫50D2、狹縫50D3、狹縫50D4,在被檢體3的移動方向X上具有固定的長度,且為固定寬度。狹縫50D1、狹縫50D2、狹縫50D3、狹縫50D4是自中央區域50B側依照該順序而設置,且被檢體3的移動方向的長度依照該順序而變化。狹縫50D1、狹縫50D2設計為跨及邊緣50A的延長線的長度,狹縫50D3、狹縫50D4較短地設計為不跨及邊緣50A的延長線的程度。 As shown in FIG. 8(A), the light shielding plate 50 of the third embodiment as the light shielding member 8 includes a central portion 50B having an edge 50A and an end portion 50C provided at both ends in the width direction of the light shielding plate 50. The end region 50C is provided with a light-shielding region, and the slit 50D1, the slit 50D2, the slit 50D3, and the slit 50D4 have a fixed length in the moving direction X of the subject 3 and have a fixed width. The slit 50D1, the slit 50D2, the slit 50D3, and the slit 50D4 are provided in this order from the central portion 50B side, and the length of the moving direction of the subject 3 changes in accordance with the order. The slit 50D1 and the slit 50D2 are designed to extend across the length of the extension of the edge 50A, and the slit 50D3 and the slit 50D4 are designed to be shorter than the extension of the edge 50A.

於遮光板50的寬度方向,在設置有邊緣50A的中央區域50B評估被檢體3有無缺陷,在端部區域50C評估遮光板50相對於線感測器相機6的相對位置。又,與第1及第2實施方式同樣地,測定線27A是表示邊緣50A與被檢體3的移動方向正交且與線感測器相機6的光軸10對準時的測定線,亦即遮光板50在測定時位於適當位置的情形時的測定線。 In the width direction of the visor 50, the subject 3 is evaluated for presence or absence of defects in the central portion 50B provided with the edge 50A, and the relative position of the visor 50 with respect to the line sensor camera 6 is evaluated at the end portion 50C. Further, similarly to the first and second embodiments, the measurement line 27A is a measurement line indicating that the edge 50A is orthogonal to the moving direction of the subject 3 and aligned with the optical axis 10 of the line sensor camera 6, that is, The measurement line when the visor 50 is in an appropriate position at the time of measurement.

於第3實施方式中,當測定線為27A時,線感測器相機6獲得如圖8(B)所示的光電信號。對於該光電信號,於中央區域50B中,在無缺陷的位置的信號強度為52A,在有明缺陷3A、 明缺陷3D的位置可獲得較信號強度52A強的光電信號,在有暗缺陷3B、暗缺陷3C的位置可獲得較信號強度52A弱的光電信號。又,於端部區域50C中,在遮光區域無法獲得光電信號,在具有狹縫50D1、狹縫50D2的區域可獲得遠強於信號強度52A的信號強度52B。另一方面,於具有狹縫50D3、狹縫50D4的區域與遮光區域同樣地無法獲得光電信號。 In the third embodiment, when the measurement line is 27A, the line sensor camera 6 obtains the photoelectric signal as shown in Fig. 8(B). For the photoelectric signal, in the central region 50B, the signal intensity at the defect-free position is 52 A, and there is a defect 3A, The position of the 3D of the defect is obtained as a photoelectric signal stronger than the signal intensity 52A, and a photoelectric signal having a weaker signal intensity 52A can be obtained at the position where the dark defect 3B and the dark defect 3C are present. Further, in the end portion region 50C, the photoelectric signal is not obtained in the light-shielding region, and the signal intensity 52B far stronger than the signal intensity 52A can be obtained in the region having the slit 50D1 and the slit 50D2. On the other hand, in the region having the slit 50D3 and the slit 50D4, the photoelectric signal cannot be obtained in the same manner as the light-shielding region.

以下,對本發明的作用進行說明。首先,作為被檢體3的網狀的透明薄膜藉由設置於本發明的缺陷檢查裝置2的搬送系統而穩定地沿長度方向移動。例如,作為被檢體3的網狀的透明薄膜以等速自圖1中的右下方向朝左上方向移動,且以等速通過缺陷檢查裝置2之間。 Hereinafter, the action of the present invention will be described. First, the mesh-shaped transparent film as the subject 3 is stably moved in the longitudinal direction by the transport system provided in the defect inspection device 2 of the present invention. For example, the mesh-shaped transparent film as the subject 3 moves at a constant speed from the lower right direction in FIG. 1 toward the upper left direction, and passes between the defect inspection devices 2 at a constant speed.

如圖1及圖2所示,於以邊緣8A與光軸10重合的方式使遮光構件8相對於線感測器相機6而在檢查時配置於相對適當的位置的情形時,自照明裝置4的發光面4A經由遮光構件8對被檢體3的一面照射光,透過被檢體3的檢查光經由配置於線感測器相機6內的透鏡6A被線感測器6B接收,並被轉換為光電信號而取得。再者,照明裝置4藉由由系統控制器11控制的光強度調整部12以使信號強度32A、信號強度42A、信號強度52A始終成為固定的方式控制照射強度。又,線感測器相機6藉由由系統控制器11控制的相機動作部14而進行受光、轉換、及取得。 As shown in FIG. 1 and FIG. 2, when the light shielding member 8 is disposed at a relatively appropriate position with respect to the line sensor camera 6 with respect to the line sensor camera 6 so that the edge 8A overlaps with the optical axis 10, the self-illuminating device 4 The light-emitting surface 4A irradiates light to one surface of the subject 3 via the light-shielding member 8, and the inspection light transmitted through the subject 3 is received by the line sensor 6B via the lens 6A disposed in the line sensor camera 6, and is converted. Obtained for photoelectric signals. Further, the illumination device 4 controls the illumination intensity such that the signal intensity 32A, the signal intensity 42A, and the signal intensity 52A are always fixed by the light intensity adjustment unit 12 controlled by the system controller 11. Further, the line sensor camera 6 receives, converts, and acquires the camera operation unit 14 controlled by the system controller 11.

藉由線感測器6B取得的光電信號於信號處理部16 以成為平面分佈的資料的方式進行處理,其處理結果記錄於記錄部25。又,根據中央區域30B、中央區域40B、中央區域50B的光電信號,檢測符合明缺陷(例如圖3中的符號3A、符號3D) 及暗缺陷(例如圖3中的符號3B、符號3C)的波形,並藉由缺陷判定部18判定是否為缺陷。繼而,於缺陷顯示部19,在顯示器(display)顯示判定為缺陷的部分及該缺陷的種類等。 The photoelectric signal obtained by the line sensor 6B is applied to the signal processing unit 16 The processing is performed in such a manner as to be distributed in the plane, and the processing result is recorded in the recording unit 25. Further, according to the photoelectric signals of the central region 30B, the central region 40B, and the central region 50B, the detection conforms to a clear defect (for example, symbol 3A and symbol 3D in FIG. 3). The waveform of the dark defect (for example, symbol 3B and symbol 3C in FIG. 3) is determined by the defect determining unit 18 as a defect. Then, on the defect display unit 19, the portion determined to be defective, the type of the defect, and the like are displayed on the display.

又,根據端部區域30C、端部區域40C、端部區域50C的光電信號,藉由遮光板位置檢測部21檢測遮光板30、遮光板40、遮光板50相對於線感測器相機6的光軸10的相對位置。若其相對位置不為適於檢查的位置,則藉由警報部22發出警報,並藉由遮光板位置調整部23機械性地或光學性地調整其相對位置。 作為位置調整的方法,存在例如使遮光板30、遮光板40、遮光板50移動至適於檢查的相對位置而位於適當的相對位置的機械上的方法、以及使用光學構件使光軸10移動至適於檢查的位置的光學上的方法等。以下,對各個遮光板30、遮光板40、遮光板50的位置的檢測方法進行說明。 Further, the light shielding plate position detecting unit 21 detects the light shielding plate 30, the light shielding plate 40, and the light shielding plate 50 with respect to the line sensor camera 6 based on the photoelectric signals of the end portion region 30C, the end portion region 40C, and the end portion region 50C. The relative position of the optical axis 10. If the relative position is not a position suitable for inspection, an alarm is issued by the alarm unit 22, and the relative position is mechanically or optically adjusted by the visor position adjusting unit 23. As a method of position adjustment, there is a method of moving the light shielding plate 30, the light shielding plate 40, and the light shielding plate 50 to a mechanical position at an appropriate relative position, which is suitable for inspection, and moving the optical axis 10 to the optical member 10 using the optical member. An optical method or the like suitable for the position to be inspected. Hereinafter, a method of detecting the position of each of the light shielding plate 30, the light shielding plate 40, and the light shielding plate 50 will be described.

此處,圖5、圖7、及圖9中所示的測定線27B是邊緣30A自測定線27A向遮光板30的某一側平行地偏移時的測定線,測定線27C是相對於測定線27A而向與測定線27B相反的側偏移時的測定線。又,測定線27D是相對於測定線27A而以邊緣30A的中點(圖式的橫向的中央)為中心向逆時針方向偏移時的測定線。測定線27B、測定線27C、測定線27D均為不與線感測器相機6的光軸10對準時的測定線。 Here, the measurement line 27B shown in FIG. 5, FIG. 7, and FIG. 9 is a measurement line when the edge 30A is shifted in parallel from the measurement line 27A to one side of the light shielding plate 30, and the measurement line 27C is relative to the measurement. The line 27A is a measurement line when it is shifted to the side opposite to the measurement line 27B. In addition, the measurement line 27D is a measurement line when the measurement line 27A is shifted counterclockwise around the midpoint of the edge 30A (the center in the lateral direction of the drawing). The measurement line 27B, the measurement line 27C, and the measurement line 27D are measurement lines that are not aligned with the optical axis 10 of the line sensor camera 6.

關於對遮光構件8使用作為第1實施方式的遮光板30的情況,使用圖5對伴隨測定線的變化而產生的光電信號的變化進行說明。測定線27A的情形時的光電信號如上所說明般成為如圖5的(A)所示。於測定線自27A向27B偏移的瞬間,中央 區域30B的信號強度34A與信號強度32A相比減少,端部區域30C的信號強度34B維持於信號強度32B並未發生變化。其後立即藉由光強度調整部12以使信號強度34A成為等於信號強度32A的方式,向變強的方向對照明裝置4的照明強度進行調整。對應於此,信號強度34B變得小於信號強度32。其結果,測定線27B的情形時的光電信號成為如圖5的(B)所示。 When the light shielding plate 30 of the first embodiment is used for the light shielding member 8, a change in the photoelectric signal caused by a change in the measurement line will be described with reference to FIG. 5 . The photoelectric signal in the case of the measurement line 27A is as shown in FIG. 5(A) as described above. At the moment when the measurement line is shifted from 27A to 27B, the center The signal strength 34A of the region 30B is reduced compared to the signal strength 32A, and the signal strength 34B of the end region 30C is maintained such that the signal strength 32B does not change. Immediately thereafter, the light intensity adjusting unit 12 adjusts the illumination intensity of the illumination device 4 in a direction in which the signal intensity 34A is equal to the signal intensity 32A. Corresponding to this, the signal strength 34B becomes smaller than the signal strength 32. As a result, the photoelectric signal in the case of the measurement line 27B is as shown in FIG. 5(B).

測定線27C的情形時的光電信號與測定線27B時完全相反地變化,以使中央區域30B的信號強度36A成為等於信號強度32A的方式,向變弱的方向對照明裝置4的照明強度進行調整。對應於此,端部區域30C的信號強度36B變得大於信號強度32。其結果,測定線27C的情形時的光電信號成為如圖5的(C)所示。 The photoelectric signal in the case of the measurement line 27C is changed completely opposite to the measurement line 27B, so that the signal intensity 36A of the central region 30B is equal to the signal intensity 32A, and the illumination intensity of the illumination device 4 is adjusted in the weakened direction. . Corresponding to this, the signal intensity 36B of the end region 30C becomes larger than the signal strength 32. As a result, the photoelectric signal in the case of the measurement line 27C is as shown in FIG. 5(C).

測定線27D的情形時的光電信號,於中央區域30B的信號強度38A產生寬度方向座標相依性。又,對於信號強度38,若取寬度方向座標的平均值則成為等於信號強度38A,故而並未特別調整照明裝置4的照明強度。因此,端部區域30C的信號強度38B並未自信號強度32B變化。其結果,測定線27D的情形時的光電信號成為如圖5的(D)所示。 The photoelectric signal in the case of the measurement line 27D generates a width direction coordinate dependency in the signal intensity 38A of the central region 30B. Further, the signal intensity 38 is equal to the signal intensity 38A when the average value of the width direction coordinates is taken, so that the illumination intensity of the illumination device 4 is not particularly adjusted. Therefore, the signal strength 38B of the end region 30C does not change from the signal strength 32B. As a result, the photoelectric signal in the case of the measurement line 27D is as shown in (D) of FIG. 5 .

根據上述內容,對於測定線的相對於光軸10的因平行移動所引起的偏移,其方向及大小可根據端部區域30C的信號強度的相對於測定線位於27A時的信號強度32B的大小而讀取。當小於信號強度32B時,可讀取測定線向27B的方向偏移,當大於信號強度32B時,可讀取測定線向27C的方向偏移,並可根據與信號強度32B的強度差讀取偏移寬度。又,針對測定線相對於 光軸的因旋轉移動所引起的偏移,可根據中央區域30B中的信號強度的寬度方向座標相依性而讀取。如此,可根據光電信號讀取測定線相對於光軸的因平行移動及旋轉移動所引起的偏移。 According to the above, the direction and size of the deviation of the measurement line with respect to the optical axis 10 due to the parallel movement can be based on the signal intensity of the end portion 30C relative to the measurement line at the signal intensity 32B at 27A. And read. When it is less than the signal intensity 32B, the measurement line can be read in the direction of 27B. When it is greater than the signal intensity 32B, the measurement line can be read in the direction of 27C, and can be read according to the intensity difference from the signal strength 32B. Offset width. Also, for the measurement line relative to The offset caused by the rotational movement of the optical axis can be read according to the width direction coordinate dependence of the signal intensity in the central region 30B. In this way, the offset caused by the parallel movement and the rotational movement of the measurement line with respect to the optical axis can be read based on the photoelectric signal.

關於對遮光構件8使用作為第2實施方式的遮光板40的情況,使用圖7對伴隨測定線的變化而產生的光電信號的變化進行說明。測定線27A的情形時的光電信號,如上所說明般成為如圖7的(A)所示。於測定線自27A向27B偏移的瞬間,中央區域40B的信號強度44A與信號強度42A相比減少,端部區域40C的信號強度44B維持於信號強度42B並未發生變化。另一方面,端部區域的信號寬度44C、信號寬度44D分別與信號寬度42C、信號寬度42D相比變寬。其後立即藉由光強度調整部12以使信號強度44A成為等於信號強度42A的方式向變強的方向對照明裝置4的照明強度進行調整,對應於此,信號強度44B變得小於信號強度42B。其結果,測定線27B的情形時的光電信號成為如圖7的(B)所示。 When the light shielding plate 40 of the second embodiment is used for the light shielding member 8, a change in the photoelectric signal caused by a change in the measurement line will be described with reference to FIG. 7 . The photoelectric signal in the case of the measurement line 27A is as shown in FIG. 7(A) as described above. At the moment when the measurement line is shifted from 27A to 27B, the signal intensity 44A of the central region 40B is reduced compared to the signal intensity 42A, and the signal intensity 44B of the end region 40C is maintained at the signal intensity 42B. On the other hand, the signal width 44C and the signal width 44D of the end region are wider than the signal width 42C and the signal width 42D, respectively. Immediately thereafter, the light intensity adjusting unit 12 adjusts the illumination intensity of the illumination device 4 in a direction in which the signal intensity 44A becomes equal to the signal intensity 42A. Accordingly, the signal intensity 44B becomes smaller than the signal intensity 42B. . As a result, the photoelectric signal in the case of the measurement line 27B is as shown in FIG. 7(B).

測定線27C的情形時的光電信號與測定線27B時完全相反地變化,以使中央區域40B的信號強度46A變成等於信號強度42A的方式向變弱的方向對照明裝置4的照明強度進行調整,對應於此,端部區域40C的信號強度46B變得大於信號強度42B。另一方面,端部區域的信號寬度46C、信號寬度46D分別與信號寬度42C、信號寬度42D相比變窄。其結果,測定線27C的情形時的光電信號成為如圖7的(C)所示。 The photoelectric signal in the case of the measurement line 27C is changed completely opposite to the measurement line 27B, and the illumination intensity of the illumination device 4 is adjusted in a weakened direction so that the signal intensity 46A of the central region 40B becomes equal to the signal intensity 42A. Corresponding to this, the signal intensity 46B of the end region 40C becomes larger than the signal strength 42B. On the other hand, the signal width 46C and the signal width 46D of the end region are narrower than the signal width 42C and the signal width 42D, respectively. As a result, the photoelectric signal in the case of the measurement line 27C is as shown in FIG. 7(C).

測定線27D的情形時的光電信號於中央區域40B的信號強度48A產生寬度方向座標相依性。又,對於信號強度48A, 若取寬度方向座標的平均值則成為等於信號強度42A,故而並未特別調整照明裝置4的照明強度。因此,端部區域40C的信號強度48B並不自信號強度42B變化。另一方面,對於端部區域的信號寬度,一方面信號寬度48C與信號寬度42C相比變寬,另一方面信號寬度48D與信號寬度42D相比變窄。亦即,在測定線相對於光軸產生因旋轉移動所引起的偏移的情形時,於端部區域40C的各個信號寬度48C、48D產生差異。其結果,於測定線27D的情形時的光電信號成為如圖7的(D)所示。 The photoelectric signal at the time of the measurement line 27D generates a width direction coordinate dependency in the signal intensity 48A of the central region 40B. Also, for signal strength 48A, If the average value of the coordinates in the width direction is equal to the signal intensity 42A, the illumination intensity of the illumination device 4 is not particularly adjusted. Therefore, the signal strength 48B of the end region 40C does not change from the signal strength 42B. On the other hand, for the signal width of the end region, on the one hand, the signal width 48C is wider than the signal width 42C, and on the other hand, the signal width 48D is narrower than the signal width 42D. That is, when the measurement line is displaced with respect to the optical axis due to the rotational movement, a difference occurs in the respective signal widths 48C, 48D of the end portion region 40C. As a result, the photoelectric signal in the case of the measurement line 27D is as shown in (D) of FIG. 7 .

根據上述內容,對於測定線的相對於光軸10的因平行移動所引起的偏移,其方向及大小可根據以下兩個要素而讀取。其一要素是端部區域40C的信號強度的相對於測定線位於27A時的信號強度42B的大小,其二要素是端部區域40C的信號寬度的相對於測定線位於27A時的信號寬度42C、信號寬度42D的大小。當小於信號強度42B時,可讀取測定線向27B的方向偏移,當大於信號強度42B時,可讀取測定線向27C的方向偏移,並可根據與信號強度42B的強度差而讀取偏移寬度。又,當大於信號寬度42C、信號寬度42D時,可讀取測定線向27B的方向偏移,當小於信號寬度42C、信號寬度42D時,可讀取測定線向27C的方向偏移,並可根據與信號強度42B的強度差而讀取偏移寬度。又,對於測定線的相對於光軸10的因旋轉移動所引起的偏移,可根據中央區域40B中的信號強度的寬度方向座標相依性而讀取。此外,亦可根據端部區域40C的各個信號寬度的差而讀取。如此,可根據光電信號讀取測定線的相對於光軸10的因平行移動及旋轉移動所引起的偏移。再者,於第2實施方式中,由於讀取測定線 的相對於光軸10的偏移的資訊有兩種,故而能夠以高於第1實施方式的精度讀取偏移。 According to the above, the direction and size of the deviation of the measurement line due to the parallel movement with respect to the optical axis 10 can be read according to the following two elements. One of the elements is the signal intensity 42B when the signal intensity of the end region 40C is at 27A with respect to the measurement line, and the two elements are the signal width 42C when the signal width of the end region 40C is at 27A with respect to the measurement line. The size of the signal width 42D. When it is less than the signal intensity 42B, the measurement line can be read in the direction of 27B, and when it is greater than the signal intensity 42B, the measurement line can be read in the direction of 27C, and can be read according to the intensity difference from the signal intensity 42B. Take the offset width. Moreover, when it is larger than the signal width 42C and the signal width 42D, the measurement line can be read in the direction of 27B, and when it is smaller than the signal width 42C and the signal width 42D, the measurement line can be read in the direction of 27C, and The offset width is read based on the difference in intensity from the signal strength 42B. Further, the deviation of the measurement line with respect to the optical axis 10 due to the rotational movement can be read based on the width direction coordinate dependence of the signal intensity in the central region 40B. Further, it is also possible to read based on the difference in the respective signal widths of the end regions 40C. In this manner, the offset of the measurement line with respect to the optical axis 10 due to the parallel movement and the rotational movement can be read based on the photoelectric signal. Furthermore, in the second embodiment, since the measurement line is read There are two kinds of information on the offset with respect to the optical axis 10, so that the offset can be read with higher precision than the first embodiment.

關於對遮光構件8中使用作為第3實施方式的遮光板50的情況,使用圖9對伴隨測定線的變化而產生的光電信號的變化進行說明。測定線27A的情形時的光電信號如上所說明般成為如圖9的(A)所示。於測定線自27A向27B偏移的瞬間,中央區域50B的信號強度54A與信號強度52A相比減少,端部區域50C的信號強度54B維持於信號強度52B並未變化。另一方面,由於測定線27B除橫穿狹縫50D1、狹縫50D2以外亦橫穿狹縫50D3,故而端部區域的信號的條數自2條增加至3條。其後立即藉由光強度調整部12以使信號強度54A變成等於信號強度52A的方式向變強的方向對照明裝置4的照明強度進行調整,對應於此,信號強度54B變得小於信號強度52B。其結果,測定線27B的情形時的光電信號成為如圖9的(B)所示。 In the case where the light shielding plate 50 as the third embodiment is used for the light shielding member 8, a change in the photoelectric signal caused by a change in the measurement line will be described with reference to FIG. The photoelectric signal in the case of the measurement line 27A is as shown in FIG. 9(A) as described above. At the instant when the measurement line is shifted from 27A to 27B, the signal intensity 54A of the central region 50B is reduced compared to the signal strength 52A, and the signal strength 54B of the end region 50C is maintained at the signal strength 52B. On the other hand, since the measurement line 27B traverses the slit 50D3 in addition to the slit 50D1 and the slit 50D2, the number of signals of the end portion is increased from two to three. Immediately thereafter, the light intensity adjusting unit 12 adjusts the illumination intensity of the illumination device 4 in a direction in which the signal intensity 54A becomes equal to the signal intensity 52A, and accordingly, the signal intensity 54B becomes smaller than the signal intensity 52B. . As a result, the photoelectric signal in the case of the measurement line 27B is as shown in FIG. 9(B).

測定線27C的情形時的光電信號與測定線27B時完全相反地變化,以使中央區域50B的信號強度56A變成等於信號強度52A的方式向變弱的方向對照明裝置4的照明強度進行調整,對應於此,端部區域50C的信號強度56B變得大於信號強度52B。另一方面,由於測定線27C僅橫穿狹縫50D1而不橫穿50D2,故而端部區域的信號的條數自2條減少至1條。其結果,測定線27C的情形時的光電信號成為如圖9的(C)所示。 The photoelectric signal in the case of the measurement line 27C is changed completely opposite to the measurement line 27B, and the illumination intensity of the illumination device 4 is adjusted in a weakened direction so that the signal intensity 56A of the central region 50B becomes equal to the signal intensity 52A. Corresponding to this, the signal intensity 56B of the end region 50C becomes larger than the signal strength 52B. On the other hand, since the measurement line 27C traverses only the slit 50D1 and does not traverse 50D2, the number of signals of the end portion is reduced from two to one. As a result, the photoelectric signal in the case of the measurement line 27C is as shown in FIG. 9(C).

測定線27D的情形時的光電信號於中央區域50B的信號強度58A產生寬度方向座標相依性。又,對於信號強度58A,若取寬度方向座標的平均值則可變成等於信號強度52A,故而並 未特別調整照明裝置4的照明強度。因此,端部區域50C的信號強度58B並不自信號強度52B變化。另一方面,由於測定線27D在端部區域50C的一側僅橫穿狹縫50D1而不橫穿50D2,故而端部區域的信號的條數自2條減少至1條。由於測定線27D在端部區域50C的另一側除橫穿狹縫50D1、狹縫50D2以外亦橫穿50D3,故而端部區域的信號的條數自2條增加至3條。亦即,在測定線相對於光軸產生因旋轉移動所引起的偏移的情形時,於端部區域50C的各個信號的條數會產生差異。其結果,測定線27D的情形時的光電信號成為如圖9的(D)所示。 The photoelectric signal at the time of the measurement line 27D generates a width direction coordinate dependency in the signal intensity 58A of the central region 50B. Moreover, for the signal strength 58A, if the average value of the width direction coordinates is taken, it becomes equal to the signal strength 52A, and thus The illumination intensity of the illumination device 4 is not particularly adjusted. Therefore, the signal strength 58B of the end region 50C does not change from the signal strength 52B. On the other hand, since the measurement line 27D traverses the slit 50D1 only on one side of the end portion 50C and does not traverse 50D2, the number of signals of the end portion is reduced from two to one. Since the measurement line 27D traverses 50D3 in addition to the slit 50D1 and the slit 50D2 on the other side of the end portion 50C, the number of signals of the end portion is increased from 2 to 3. That is, when the measurement line is shifted with respect to the optical axis due to the rotational movement, the number of the respective signals in the end portion 50C is different. As a result, the photoelectric signal in the case of the measurement line 27D is as shown in (D) of FIG.

根據上述內容,對於測定線的相對於光軸的因平行移動所引起的偏移,其方向及大小可根據以下兩要素而讀取。其一要素是端部區域50C的信號強度的相對於測定線位於27A時的信號強度52B的大小,其二要素是端部區域50C的信號的條數相對於測定線位於27A時的信號的條數的增減。當小於信號強度52B時,可讀取測定線向27B的方向偏移,當大於信號強度52B時,可讀取測定線向27C的方向偏移,並可根據與信號強度52B的強度差讀取偏移寬度。又,當信號的條數增加時,可讀取測定線向27B的方向偏移,當信號的條數減少時,可讀取測定線向27C的方向偏移,並可根據信號的條數的差讀取偏移寬度。又,對於測定線的相對於光軸10的因旋轉移動所引起的偏移,可根據中央區域50B中的信號強度的寬度方向座標相依性而讀取。此外,亦可根據端部區域50C的各個信號的條數的差而讀取。如此,可根據光電信號讀取測定線的相對於光軸10的因平行移動及旋轉移動所引起的偏移。再者,於第3實施方式中,與第2實施方式同樣地, 由於可讀取測定線相對於光軸的偏移的資訊有兩種,故而能夠以高於第1實施方式的精度讀取偏移。 According to the above, the direction and size of the deviation of the measurement line due to the parallel movement with respect to the optical axis can be read according to the following two elements. One of the elements is the magnitude of the signal intensity 52B when the signal intensity of the end region 50C is at 27A with respect to the measurement line, and the two elements are the number of signals at the end region 50C relative to the measurement line at 27A. The increase or decrease of the number. When it is less than the signal intensity 52B, the measurement line can be read in the direction of 27B, and when it is greater than the signal intensity 52B, the measurement line can be read in the direction of 27C, and can be read according to the intensity difference from the signal strength 52B. Offset width. Moreover, when the number of signals increases, the measurement line can be read in the direction of 27B, and when the number of signals decreases, the direction of the measurement line can be read in the direction of 27C, and the number of signals can be read according to the number of signals. The difference reads the offset width. Further, the deviation of the measurement line with respect to the optical axis 10 due to the rotational movement can be read based on the width direction coordinate dependence of the signal intensity in the central region 50B. Further, it is also possible to read based on the difference in the number of signals of the end regions 50C. In this manner, the offset of the measurement line with respect to the optical axis 10 due to the parallel movement and the rotational movement can be read based on the photoelectric signal. In the third embodiment, as in the second embodiment, Since there are two kinds of information that can read the deviation of the measurement line from the optical axis, the offset can be read with higher accuracy than the first embodiment.

使用圖10對本發明的實施方式的缺陷檢查裝置60進行說明。缺陷檢查裝置60是缺陷檢查裝置2的第1變形例。缺陷檢查裝置60除具有缺陷檢查裝置2的構成以外,還於被檢體3與線感測器相機6之間,以於被檢體3的寬度方向整體地覆蓋的方式設置有折射率及厚度均勻的透明構件62。透明構件62設置為旋轉自如,如圖10所示,該透明構件62作為藉由控制其旋轉角度而使光軸10折射的光軸折射機構發揮作用。再者,於圖10中對表現與缺陷檢查裝置2相同的功能的構件,標註與圖1相同的符號,並省略說明。 A defect inspection device 60 according to an embodiment of the present invention will be described with reference to Fig. 10 . The defect inspection device 60 is a first modification of the defect inspection device 2. In addition to the configuration of the defect inspection device 2, the defect inspection device 60 is provided with a refractive index and a thickness between the subject 3 and the line sensor camera 6 so as to cover the entire width direction of the subject 3. A uniform transparent member 62. The transparent member 62 is rotatably provided, and as shown in FIG. 10, the transparent member 62 functions as an optical axis refraction mechanism that refracts the optical axis 10 by controlling the rotation angle thereof. In FIG. 10, members having the same functions as those of the defect inspection device 2 are denoted by the same reference numerals as those in FIG. 1, and description thereof will be omitted.

圖10所示的例子是如下例,即對於光軸面的因平行移動所引起的偏移,無需如缺陷檢查裝置2中所說明般使遮光構件8及遮光板30、遮光板40、遮光板50相對於光軸面而平行移動,而藉由透明構件62的旋轉使光軸10平行移動來進行調整。於此情形時,遮光構件8及遮光板30、遮光板40、遮光板50的位置調整是僅進行與因旋轉移動所引起的偏移對應的移動。 The example shown in FIG. 10 is an example in which it is not necessary to make the light shielding member 8 and the light shielding plate 30, the light shielding plate 40, and the light shielding plate as described in the defect inspection device 2 with respect to the displacement caused by the parallel movement of the optical axis surface. The 50 moves in parallel with respect to the optical axis plane, and the optical axis 10 is moved in parallel by the rotation of the transparent member 62 to perform adjustment. In this case, the position adjustment of the light shielding member 8 and the light shielding plate 30, the light shielding plate 40, and the light shielding plate 50 is only the movement corresponding to the offset by the rotational movement.

使用圖11及圖12,對本發明的實施方式的缺陷檢查裝置70進行說明。缺陷檢查裝置70是缺陷檢查裝置2的第2變形例。如圖11所示,缺陷檢查裝置70除具有缺陷檢查裝置2的構成以外,還設置有凹柱狀透鏡72。凹柱狀透鏡72分別設置於被檢體3與遮光構件8之間的照射至遮光構件8的端部區域並被檢測出的端部光的光路上。再者,於圖11及圖12中對表現與缺陷檢查裝置2相同的功能的構件標註與圖1相同的符號,並省略說 明。 A defect inspection device 70 according to an embodiment of the present invention will be described with reference to Figs. 11 and 12 . The defect inspection device 70 is a second modification of the defect inspection device 2. As shown in FIG. 11, the defect inspection device 70 is provided with a concave cylindrical lens 72 in addition to the configuration of the defect inspection device 2. The concave lenticular lenses 72 are respectively provided on the optical path between the subject 3 and the light shielding member 8 that is irradiated to the end portion region of the light shielding member 8 and detected as the end light. In FIG. 11 and FIG. 12, members having the same functions as those of the defect inspection device 2 are denoted by the same reference numerals as those in FIG. Bright.

如圖12所示,凹柱狀透鏡72具有於產生光軸偏移的情形時將此光軸偏移在空間上放大的功能。藉此,可更高精度地偵測光軸偏移量,從而對微細的缺陷保持高感度。又,亦可將第1變形例與第2變形例組合使用。 As shown in FIG. 12, the concave cylindrical lens 72 has a function of shifting the optical axis to spatially magnify when an optical axis shift occurs. Thereby, the optical axis shift amount can be detected with higher precision, thereby maintaining high sensitivity to fine defects. Further, the first modification and the second modification may be used in combination.

再者,作為本發明的實施方式,於上述實施方式中,對將被檢體3作為網狀的透明薄膜,且一面使該薄膜移動,一面檢查其表面等的缺陷的方法及其裝置進行了說明。然而,本發明並不限於此。例如,一面使透明的玻璃板移動一面檢查其表面等的缺陷的方法及其裝置亦為本發明的範圍內。又,於檢查用於水族館的水槽或潛水艇等的非常厚且透明的玻璃磚(glass block)的情形時,考慮到其質量大而將缺陷檢查裝置設計為可移動,使缺陷檢查裝置一面移動一面檢查缺陷的方法亦為本發明的範圍內。 Further, in the embodiment of the present invention, in the above-described embodiment, a method and an apparatus for inspecting a defect such as a surface thereof while moving the film as a transparent film having a mesh shape are performed. Description. However, the invention is not limited thereto. For example, a method of detecting defects such as a surface thereof while moving a transparent glass plate and an apparatus thereof are also within the scope of the invention. Moreover, in the case of inspecting a very thick and transparent glass block for a sink or a submarine of an aquarium, the defect inspection device is designed to be movable in consideration of its large mass, and the defect inspection device is moved while moving. Methods of inspecting defects are also within the scope of the invention.

又,於本發明的實施方式中,配合欲感度更佳地檢查何種類型(type)的缺陷等的使用者的需要,以使遮光板及光軸移動而變更自照明裝置發出的光的通過比率的方式適當進行設計變更的情況亦為本發明的範圍內。又,於本發明的實施方式中,使線感測器相機6的焦點與被檢體3的表面對準,但並不限於此。例如,即便使焦點與遮光構件8的邊緣8A對準,亦可進行同等的檢查。進而,焦點的對準位置只要為被檢體3的表面及邊緣8A的附近即可,於實際使用中,即便對準於被檢體3與邊緣8A之間,亦可進行同等的檢查。 Further, in the embodiment of the present invention, it is possible to change the passage of light emitted from the illumination device by moving the light shielding plate and the optical axis in accordance with the needs of the user who is more likely to check the type of defect or the like. It is also within the scope of the invention to appropriately design changes in the manner of the ratio. Further, in the embodiment of the present invention, the focus of the line sensor camera 6 is aligned with the surface of the subject 3, but it is not limited thereto. For example, even if the focus is aligned with the edge 8A of the light shielding member 8, an equivalent inspection can be performed. Further, the alignment position of the focus may be the vicinity of the surface of the subject 3 and the edge 8A, and in actual use, even if it is aligned between the subject 3 and the edge 8A, the same inspection can be performed.

又,於本發明的實施方式中,自照明裝置4經由遮光構件8而對被檢體3照射光,並藉由線感測器相機6接收透過被 檢體3的檢查光及通過被檢體3的寬度外的端部光。然而,以如下方式變更設計來實施者亦為本發明的範圍內,即,於被檢體3具有強反射性的情形時,將反射光代替透過光來作為檢查光,在被檢體的寬度外放置全反射鏡(mirror),將來自該全反射鏡的反射光作為端部光並藉由線感測器相機6接收。 Further, in the embodiment of the present invention, the subject 3 is irradiated with light from the illumination device 4 via the light shielding member 8, and is received by the line sensor camera 6 The inspection light of the sample 3 and the end light passing through the width of the subject 3 are light. However, it is also within the scope of the present invention to change the design in such a manner that when the subject 3 has strong reflectivity, the reflected light is used as the inspection light instead of the transmitted light, in the width of the subject. A mirror is placed outside, and the reflected light from the total reflection mirror is taken as end light and received by the line sensor camera 6.

又,於上述實施方式中,被檢體3的移動方向與照明裝置4的發光面4A的長邊方向的角度、及被檢體3的移動方向與遮光構件8的邊緣8A的角度為垂直的情況,但並不限於此。例如,該些角度為60度或45度等90度以外的規定角度的情況亦為本發明的範圍內。 Further, in the above-described embodiment, the moving direction of the subject 3 is perpendicular to the longitudinal direction of the light-emitting surface 4A of the illumination device 4, and the moving direction of the subject 3 is perpendicular to the angle of the edge 8A of the light-shielding member 8. Situation, but not limited to this. For example, the case where the angles are predetermined angles other than 90 degrees such as 60 degrees or 45 degrees is also within the scope of the invention.

又,於本發明的實施方式中,對僅設置有一台線感測器相機6的情況進行了說明,但並不限於此,沿測定寬度方向排列多台相機的情況亦為本發明的範圍內。亦即,當理解為本申請的說明書及本申請的申請專利範圍中的線感測器相機包含沿測定寬度方向排列多台相機的情況。 Further, in the embodiment of the present invention, the case where only one line sensor camera 6 is provided has been described. However, the present invention is not limited thereto, and the case where a plurality of cameras are arranged in the measurement width direction is also within the scope of the present invention. . That is, the line sensor camera in the specification of the present application and the patent application of the present application includes a case where a plurality of cameras are arranged in the measurement width direction.

2‧‧‧缺陷檢查裝置 2‧‧‧ Defect inspection device

3‧‧‧被檢體 3‧‧‧The subject

4‧‧‧照明裝置 4‧‧‧Lighting device

4A‧‧‧發光面 4A‧‧‧Lighting surface

6‧‧‧線感測器相機 6‧‧‧ line sensor camera

8‧‧‧遮光構件 8‧‧‧ shading members

8A‧‧‧邊緣 8A‧‧‧ edge

11‧‧‧系統控制器 11‧‧‧System Controller

12‧‧‧光強度調整部 12‧‧‧Light intensity adjustment department

14‧‧‧相機動作部 14‧‧‧ Camera Action Department

16‧‧‧信號處理部 16‧‧‧Signal Processing Department

18‧‧‧缺陷判定部 18‧‧‧Defect Determination Department

19‧‧‧缺陷顯示部 19‧‧‧Defect Display Department

21‧‧‧遮光板位置檢測部 21‧‧ ‧ visor position detection department

22‧‧‧警報部 22‧‧‧Warning Department

23‧‧‧遮光板位置調整部 23‧‧ ‧ visor position adjustment department

25‧‧‧記錄部 25‧‧ Record Department

X‧‧‧移動方向 X‧‧‧ moving direction

Claims (8)

一種缺陷檢查方法,其特徵在於包括如下步驟:使透明的網狀或片狀的被檢體連續移動;自照明裝置的發光面向連續移動中的上述被檢體的一面照射光,其中上述照明裝置的上述發光面是長邊為超過上述被檢體寬度的長度之矩形狀,且上述發光面的長邊方向以規定的角度配置於上述被檢體的移動方向;將遮光板於以上述遮光板的邊緣與線感測器相機的光軸對準的方式定位的狀態下,設置於上述發光面與上述被檢體之間,且上述遮光板包括中央區域及端部區域,上述中央區域於上述被檢體的寬度方向整體地覆蓋上述發光面,並於上述被檢體的上述移動方向,將與上述移動方向以規定角度相交的直線狀的上述遮光板的上述邊緣作為邊界,而部分地覆蓋上述發光面,上述端部區域則於在上述被檢體的上述移動方向整體地覆蓋上述發光面端部的遮光區域形成有規定圖案的通孔;藉由上述線感測器相機的上述線感測器,一併接收透過上述被檢體而來的檢查光及通過上述被檢體的寬度外的來自上述發光面端部的端部光,上述線感測器相機以與上述被檢體的另一面對向,且使上述線感測器的像素的排列方向成為與上述發光面的長邊方向平行的方式配置;以及基於自上述線感測器相機所獲得的上述中央區域的光電信號來評估上述被檢體有無缺陷,且基於上述端部區域的光電信號來評估上述遮光板相對於上述線感測器相機的相對位置。 A defect inspection method comprising the steps of: continuously moving a transparent mesh or sheet-like object; and irradiating light from a side of the subject in continuous movement from a light-emitting surface of the illumination device, wherein the illumination device The light-emitting surface has a rectangular shape in which the long side is longer than the width of the subject, and the longitudinal direction of the light-emitting surface is disposed at a predetermined angle in a moving direction of the subject; and the light-shielding plate is formed on the light-shielding plate a state in which the edge is positioned in alignment with the optical axis of the line sensor camera, and is disposed between the light emitting surface and the object, and the light shielding plate includes a central region and an end region, wherein the central region is The light-emitting surface is entirely covered in the width direction of the subject, and is partially covered by the edge of the linear light-shielding plate that intersects the moving direction at a predetermined angle in the moving direction of the subject. In the light-emitting surface, the end portion region is formed in a light-shielding region shape that entirely covers the end portion of the light-emitting surface in the moving direction of the subject a through hole having a predetermined pattern; the line sensor of the line sensor camera receives the inspection light transmitted through the object and the light emitting surface end from the width of the object The end light of the portion, the line sensor camera is disposed to face the other side of the subject, and the arrangement direction of the pixels of the line sensor is arranged to be parallel to the longitudinal direction of the light emitting surface And evaluating the presence or absence of the defect based on the photoelectric signal of the central region obtained from the line sensor camera, and evaluating the visor relative to the line sensor camera based on the photoelectric signal of the end region Relative position. 如申請專利範圍第1項所述的缺陷檢查方法,其中參照上 述中央區域的上述光電信號與上述端部區域的上述光電信號的兩者,以上述遮光板相對於上述線感測器相機的上述光軸是否自標準位置向上述被檢體的上述移動方向偏移來評估上述相對位置。 The defect inspection method described in claim 1 of the patent application, wherein Whether the photoelectric signal of the central region and the photoelectric signal of the end region are opposite to the moving direction of the object from a standard position with respect to the optical axis of the line sensor camera Move to evaluate the relative position above. 如申請專利範圍第1項或第2項所述的缺陷檢查方法,其中對照上述端部區域的各個上述光電信號,以上述線感測器相機的上述像素的上述排列方向與上述遮光板的上述邊緣的相對平行度來評估上述相對位置。 The defect inspection method according to claim 1 or 2, wherein the alignment direction of the pixels of the line sensor camera and the above-mentioned light shielding plate are compared with each of the photoelectric signals of the end region The relative parallelism of the edges is used to evaluate the relative position described above. 如申請專利範圍第1項或第2項所述的缺陷檢查方法,其中基於上述相對位置的評估結果,於上述遮光板的上述邊緣未與上述線感測器相機的上述光軸對準時發出未對準的警告。 The defect inspection method according to claim 1 or 2, wherein the edge of the visor is not aligned with the optical axis of the line sensor camera based on the evaluation result of the relative position Alignment warning. 如申請專利範圍第1項或第2項所述的缺陷檢查方法,其中基於上述相對位置的評估結果,使用調整單元使上述遮光板與上述光軸對準,上述調整單元以使上述遮光板的上述邊緣與上述線感測器相機的上述光軸對準的方式機械性地或光學性地進行調整。 The defect inspection method according to claim 1 or 2, wherein the adjustment unit is used to align the light shielding plate with the optical axis based on an evaluation result of the relative position, and the adjustment unit is configured to make the light shielding plate The edge is mechanically or optically adjusted in a manner that is aligned with the optical axis of the line sensor camera. 如申請專利範圍第5項所述的缺陷檢查方法,其中光學性地調整的上述調整單元,使以於上述被檢體的上述寬度方向整體地覆蓋的方式設置的折射率及厚度均勻的透明構件旋轉。 The defect inspection method according to claim 5, wherein the adjustment unit that is optically adjusted has a refractive index and a uniform thickness transparent member that are provided so as to cover the entire width direction of the subject. Rotate. 如申請專利範圍第1項或第2項所述的缺陷檢查方法,其中於上述被檢體與上述遮光板之間的上述端部光的光路上分別設置有凹柱狀透鏡。 The defect inspection method according to the first or second aspect of the invention, wherein a concave cylindrical lens is provided on an optical path of the end light between the subject and the light shielding plate. 如申請專利範圍第1項或第2項所述的缺陷檢查方法,其中以使上述中央區域的上述光電信號強度成為大致固定的方式,調整自上述照明裝置照射的光量。 The defect inspection method according to the first or second aspect of the invention, wherein the amount of light irradiated from the illumination device is adjusted such that the photoelectric signal intensity in the central region is substantially constant.
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