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TW201334948A - Imprinting apparatus and imprinting method - Google Patents

Imprinting apparatus and imprinting method Download PDF

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Publication number
TW201334948A
TW201334948A TW101105645A TW101105645A TW201334948A TW 201334948 A TW201334948 A TW 201334948A TW 101105645 A TW101105645 A TW 101105645A TW 101105645 A TW101105645 A TW 101105645A TW 201334948 A TW201334948 A TW 201334948A
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Taiwan
Prior art keywords
roller
flexible
embossing
adhesive layer
embossed area
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TW101105645A
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Chinese (zh)
Inventor
Hung-Ta Chien
Fu-Chiang Hsu
Huan-Tsung Lin
Fang-Hsuan Su
Han-Jung Chen
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Coretronic Corp
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Priority to TW101105645A priority Critical patent/TW201334948A/en
Priority to CN201310012721XA priority patent/CN103257524A/en
Publication of TW201334948A publication Critical patent/TW201334948A/en

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Abstract

An imprinting apparatus includes a first roller, a second roller, a flexible imprinting mold, a conveyer, a first pressurizing device and a curing device. An imprinting region is formed between the first roller and the second roller. The flexible imprinting mold is rolled on the first roller and the second roller. The first roller and the second roller drive the flexible imprinting mold to move and pass through the imprinting region. The conveyer is disposed under the first roller and the second roller and conveys a plurality of substrates to pass through the imprinting region in sequence. Each substrate has a resin layer thereon. The first pressurizing device provides a first pressurizing air to the imprinting region. The flexible imprinting mold contact the substrates passing through the imprinting region by the pressing of the first pressurizing air. The curing device cures the resins. An imprinting method is also provided.

Description

壓印設備及壓印方法Imprinting equipment and imprinting method

本發明是有關於一種壓印設備及壓印方法,且特別是有關於一種使用可撓性壓印模的壓印設備及壓印方法。The present invention relates to an imprint apparatus and an imprint method, and more particularly to an imprint apparatus and an imprint method using a flexible stamp.

目前常見的微影(Lithography)技術包含電子束微影(Electronic Beam Lithography)技術、離子束微影(Ion Beam Lithography)技術、極紫外光微影(Extreme Ultraviolet Lithography)技術及奈米壓印微影(Nanoimprint Lithography)技術,其中奈米壓印微影因為不受光學繞射極限的限制,且具有解析度高、速度快及成本低廉的特色,因此其應用領域相當廣泛。The current common Lithography technology includes Electron Beam Lithography, Ion Beam Lithography, Extreme Ultraviolet Lithography, and Nanoimprint lithography. (Nanoimprint Lithography) technology, in which nanoimprint lithography is not limited by the optical diffraction limit, and has the characteristics of high resolution, high speed and low cost, so its application field is quite extensive.

詳細而言,習知的一種奈米壓印微影製程是將膠層置於基板上,並將具有壓印圖案的壓印模壓印至軟化的膠層,接著固化已被圖案化的膠層。而後,移開壓印模並進行蝕刻,以藉由膠層的遮罩在基板上蝕刻出奈米圖案。在上述製程中,基板表面的不平整往往會造成膠層壓印不均勻性或不完整。此外,藉由壓印模壓印膠層係為單片製程而非連續性壓印,需等待膠層固化後才能對另一基板上的膠層進行壓印,因此較為耗費時間。另外,為了避免壓印後的膠層內產生氣泡,需在真空環境中進行壓印,因而增加了製造成本與等待抽真空的時間。In detail, a conventional nanoimprint lithography process is to place a glue layer on a substrate, and imprint an embossing die having an embossed pattern onto the softened adhesive layer, followed by curing the patterned adhesive layer. . Thereafter, the stamp is removed and etched to etch the nano pattern on the substrate by the mask of the adhesive layer. In the above process, the unevenness of the surface of the substrate tends to cause unevenness or incompleteness of the glue laminate. In addition, since the imprinting squeegee layer is a single-piece process rather than a continuous embossing, it is time-consuming to wait for the adhesive layer to be cured before embossing the adhesive layer on the other substrate. In addition, in order to avoid the generation of bubbles in the adhesive layer after imprinting, it is necessary to perform imprinting in a vacuum environment, thereby increasing the manufacturing cost and waiting for vacuuming.

美國專利編號US20090046362揭露一種奈米壓印方法,藉由滾輪帶動卷織物將圖案壓印在基板的膠層上,並藉由紫外光固化膠層,其中基板使用傳送帶傳送。台灣專利公開號TW200638461揭露一種奈米壓印方法,利用輸送帶或滾輪傳送基板,並藉由均壓裝置使模具對基板進行壓印。台灣專利公開號TW201006659揭露一種奈米壓印方法,藉由壓縮空氣提供模具與工件適當壓力,以在工件上形成壓印圖案。U.S. Patent No. US20090046362 discloses a nanoimprinting method in which a roll fabric is used to emboss a pattern onto a glue layer of a substrate, and the glue layer is cured by ultraviolet light, wherein the substrate is conveyed using a conveyor belt. Taiwan Patent Publication No. TW200638461 discloses a nanoimprinting method in which a substrate is conveyed by a conveyor belt or a roller, and the mold is embossed to the substrate by a pressure equalizing device. Taiwan Patent Publication No. TW201006659 discloses a nanoimprinting method for providing an appropriate embossing pattern on a workpiece by compressing air to provide appropriate pressure of the mold and the workpiece.

本發明提出一種壓印設備及壓印方法,可提升壓印的均勻性與完整性,且可節省製程時間及成本。The invention provides an imprinting device and an imprinting method, which can improve the uniformity and integrity of imprinting, and can save process time and cost.

本發明的其他目的和優點可以從本發明所揭露的技術特徵中得到進一步的了解。Other objects and advantages of the present invention will become apparent from the technical features disclosed herein.

為達上述之一或部份或全部目的或是其他目的,本發明之一實施例提供一種壓印設備,包括第一滾輪、第二滾輪、可撓性壓印模、輸送帶、第一加壓裝置及固化裝置。第一滾輪與第二滾輪之間構成壓印區域。可撓性壓印模繞於第一滾輪及第二滾輪。第一滾輪及第二滾輪適於帶動可撓性壓印模移動並通過壓印區域。輸送帶配置於第一滾輪及第二滾輪下方且適於輸送多個基板依序通過壓印區域。各基板上具有一膠層。第一加壓裝置提供第一加壓氣流至壓印區域。可撓性壓印模藉由第一加壓氣流的加壓而使通過壓印區域的這些基板與可撓性壓印模保持接觸。固化裝置對位於壓印區域並固化被壓印的這些膠層。In order to achieve one or a part or all of the above or other purposes, an embodiment of the present invention provides an imprint apparatus including a first roller, a second roller, a flexible stamp, a conveyor belt, and a first addition. Pressure device and curing device. An embossed area is formed between the first roller and the second roller. The flexible stamp is wound around the first roller and the second roller. The first roller and the second roller are adapted to drive the flexible stamp to move and pass through the embossed area. The conveyor belt is disposed under the first roller and the second roller and is adapted to transport the plurality of substrates sequentially through the embossed area. Each substrate has a glue layer thereon. The first pressurizing device provides a first pressurized gas stream to the embossed area. The flexible embossing mold keeps the substrates passing through the embossed area in contact with the flexible embossing die by pressurization of the first pressurized gas stream. The curing device pair is located in the embossed area and cures the embossed layers of the glue.

本發明一實施例的壓印設備,更包括第一調整元件,第一滾輪與第一調整元件之間構成第一區段,其中可撓性壓印模繞於第一滾輪及第一調整元件,第一調整元件適於帶動第一區段以調整第一區段相對於基板的夾角。The embossing apparatus according to an embodiment of the present invention further includes a first adjusting component, and the first roller and the first adjusting component form a first segment, wherein the flexible embossing die surrounds the first roller and the first adjusting component The first adjustment element is adapted to drive the first section to adjust an angle of the first section relative to the substrate.

本發明一實施例的壓印設備,更包括第二調整元件,第二滾輪與第二調整元件之間構成第二區段,其中可撓性壓印模繞於第二滾輪及該第二調整元件,第二調整元件適於帶動第二區段以調整第二區段相對於基板的夾角。The embossing apparatus according to an embodiment of the present invention further includes a second adjusting component, and the second roller and the second adjusting component form a second section, wherein the flexible embossing mold surrounds the second roller and the second adjustment The second adjustment element is adapted to drive the second section to adjust an angle of the second section relative to the substrate.

本發明一實施例的壓印設備,更包括第二加壓裝置,其中輸送帶為可撓性輸送帶,第一加壓裝置與第二加壓裝置分別配置於可撓性壓印模的上方及輸送帶的下方,第二加壓裝置提供第二加壓氣流至壓印區域的可撓性輸送帶,可撓性壓印模與可撓性輸送帶藉由第一加壓氣流與第二加壓氣流的加壓而使通過壓印區域的些基板與可撓性壓印模保持接觸。The embossing apparatus according to an embodiment of the present invention further includes a second pressing device, wherein the conveying belt is a flexible conveying belt, and the first pressing device and the second pressing device are respectively disposed above the flexible embossing die And below the conveyor belt, the second pressing device provides a second pressurized air flow to the flexible conveyor belt of the embossed area, the flexible embossing die and the flexible conveyor belt by the first pressurized air flow and the second Pressurization of the pressurized gas stream keeps the substrates passing through the embossed area in contact with the flexible embossing die.

本發明一實施例的壓印設備,其中輸送帶為硬質輸送帶。An imprint apparatus according to an embodiment of the present invention, wherein the conveyor belt is a rigid conveyor belt.

本發明一實施例的壓印設備,其中膠層為光固化膠層,固化裝置包括發光裝置。An imprinting apparatus according to an embodiment of the present invention, wherein the adhesive layer is a photo-curable adhesive layer, and the curing device comprises a light-emitting device.

本發明一實施例的壓印設備,其中輸送帶及基板可透光,輸送帶位於固化裝置與可撓性壓印模之間。In an embossing apparatus according to an embodiment of the invention, the conveyor belt and the substrate are transparent, and the conveyor belt is located between the curing device and the flexible embossing die.

本發明一實施例的壓印設備,其中可撓性壓印模可透光且可撓性壓印模位於固化裝置與輸送帶之間。An imprint apparatus according to an embodiment of the present invention, wherein the flexible stamp is permeable to light and the flexible stamp is located between the curing device and the conveyor belt.

本發明一實施例的壓印設備,其中膠層為熱固化膠層,固化裝置包括加熱裝置。An imprinting apparatus according to an embodiment of the present invention, wherein the adhesive layer is a thermosetting adhesive layer, and the curing device comprises a heating device.

本發明一實施例的壓印設備,其中膠層為熱塑性膠層,固化裝置包括冷卻裝置。An imprint apparatus according to an embodiment of the present invention, wherein the adhesive layer is a thermoplastic adhesive layer, and the curing device includes a cooling device.

為達上述之一或部份或全部目的或是其他目的,本發明之一實施例提供一種壓印方法。藉由一第一滾輪及一第二滾輪帶動一可撓性壓印模移動並通過一壓印區域,其中可撓性壓印模繞於第一滾輪及該第二滾輪,壓印區域位於第一滾輪與第二滾輪之間。藉由一輸送帶依序輸送多個基板通過壓印區域,其中各基板上具有一膠層。藉由一第一加壓裝置提供一第一加壓氣流至壓印區域,以使可撓性壓印模藉由第一加壓氣流的加壓而使通過壓印區域的這些基板與可撓性壓印模保持接觸。藉由一固化裝置固化這些膠層。In order to achieve one or a portion or all of the above or other objects, an embodiment of the present invention provides an imprint method. A flexible stamper is moved by a first roller and a second roller and passes through an embossed area, wherein the flexible embossing mold is wound around the first roller and the second roller, and the embossed area is located at the A roller and a second roller. A plurality of substrates are sequentially conveyed by a conveyor belt through an embossed area, wherein each substrate has a glue layer thereon. Providing a first pressurized air flow to the embossed area by a first pressing device to cause the flexible embossing to make the substrates passing through the embossed area and flexible by pressurization of the first pressurized air flow The positive impression remains in contact. These glue layers are cured by a curing device.

本發明一實施例的壓印方法,其中帶動可撓性壓印模移動的步驟包括帶動可撓性壓印模從第一滾輪進入壓印區域並從第二滾輪離開壓印區域,壓印方法更包括藉由第一調整元件調整第一滾輪與第一調整元件之間構成的第一區段相對於基板的夾角。An imprinting method according to an embodiment of the present invention, wherein the step of moving the flexible stamper comprises driving the flexible stamper from the first roller into the embossed area and exiting the embossed area from the second roller, the embossing method The method further includes adjusting, by the first adjusting component, an angle between the first segment formed between the first roller and the first adjusting component relative to the substrate.

本發明一實施例的壓印方法,其中帶動可撓性壓印模移動的步驟包括帶動可撓性壓印模從第一滾輪進入壓印區域並從第二滾輪離開壓印區域,壓印方法更包括藉由第二調整元件調整第二滾輪與第二調整元件之間構成的第二區段相對於基板的夾角。An imprinting method according to an embodiment of the present invention, wherein the step of moving the flexible stamper comprises driving the flexible stamper from the first roller into the embossed area and exiting the embossed area from the second roller, the embossing method The method further includes adjusting, by the second adjusting component, an angle between the second segment formed between the second roller and the second adjusting component relative to the substrate.

本發明一實施例的壓印方法,更包括藉由第二加壓裝置提供第二加壓氣流至壓印區域,以使可撓性壓印模藉由第二加壓氣流的加壓而使通過壓印區域的些基板與可撓性壓印模保持接觸,其中第一加壓裝置與第二加壓裝置分別配置於可撓性壓印模的上方及輸送帶的下方。The embossing method according to an embodiment of the present invention further includes providing a second pressurized air flow to the embossed area by the second pressing means to cause the flexible embossing film to be pressurized by the second pressurized air flow. The substrates passing through the embossed area are in contact with the flexible embossing die, wherein the first pressing device and the second pressing device are respectively disposed above the flexible embossing die and below the conveyor belt.

本發明一實施例的壓印方法,其中膠層為光固化膠層,固化膠層的步驟包括藉由固化裝置發出光線照射膠層。In an imprinting method according to an embodiment of the invention, the adhesive layer is a photo-curable adhesive layer, and the step of curing the adhesive layer comprises irradiating the adhesive layer with light by a curing device.

本發明一實施例的壓印方法,其中膠層為熱固化膠層,固化膠層的步驟包括藉由固化裝置加熱膠層。In an imprinting method according to an embodiment of the invention, the adhesive layer is a thermosetting adhesive layer, and the step of curing the adhesive layer comprises heating the adhesive layer by a curing device.

本發明一實施例的壓印方法,其中膠層為熱塑性膠層,固化膠層的步驟包括藉由固化裝置冷卻膠層。In an imprinting method according to an embodiment of the invention, the adhesive layer is a thermoplastic adhesive layer, and the step of curing the adhesive layer comprises cooling the adhesive layer by a curing device.

本發明一實施例的壓印方法,其中依序輸送基板通過壓印區域的步驟包括使基板的至少其中之二同時位於壓印區域內。In an imprinting method according to an embodiment of the present invention, the step of sequentially transporting the substrate through the embossed area comprises causing at least two of the substrates to be simultaneously located in the embossed area.

本發明一實施例的壓印方法,其中帶動可撓性壓印模移動及輸送多個基板通過壓印區域的步驟包括使可撓性壓印模的移動速度與移動方向相同於基板的移動速度與移動方向。In an imprinting method according to an embodiment of the present invention, the step of moving the flexible stamping die and moving the plurality of substrates through the embossing area comprises moving the flexible stamping die at a speed equal to the moving speed of the substrate. With the direction of movement.

基於上述,在本發明的上述實施例中至少具有以下其中一個優點,第一滾輪及第二滾輪帶動可撓性壓印模通過壓印區域,且輸送帶輸送這些基板依序通過壓印區域,而使這些基板上的這些膠層連續性地受到可撓性壓印模的壓印及固化裝置的固化,以達到類似生產線的連續製造的效果,節省平均製程時間。此外,藉由可撓性壓印模的可撓特性及第一加壓裝置所提供之第一加壓氣流的施壓,可讓可撓性壓印模較為均勻地對膠層進行壓印,以提升壓印的均勻性及完整性。另外,在可撓性壓印模的移動及壓印的過程中,藉由滾輪的帶動及第一加壓氣流的施壓,可迫使形成於膠層內的氣泡被排出,故不必在真空環境中進行壓印就能夠減少膠層內產生氣泡,以節省製程成本與時間。Based on the above, at least one of the following advantages is obtained in the above embodiments of the present invention, the first roller and the second roller drive the flexible embossing die through the embossed area, and the conveyor belt transports the substrates sequentially through the embossed area, These adhesive layers on these substrates are continuously cured by the imprinting and curing apparatus of the flexible stamp to achieve a continuous manufacturing process similar to the production line, saving an average process time. In addition, the flexible stamp can more accurately imprint the adhesive layer by the flexible characteristics of the flexible stamp and the pressure of the first pressurized airflow provided by the first pressing device. To improve the uniformity and integrity of the imprint. In addition, during the movement and imprinting of the flexible stamping die, by the driving of the roller and the pressing of the first pressurized airflow, the bubbles formed in the glue layer can be forced to be discharged, so that it is not necessary to be in a vacuum environment. Embossing in the middle can reduce bubbles in the glue layer to save process cost and time.

為讓本發明之上述特徵和優點能更明顯易懂,下文特舉多個實施例,並配合所附圖式,作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.

有關本發明之前述及其他技術內容、特點與功效,在以下配合參考圖式之多個實施例的詳細說明中,將可清楚的呈現。以下實施例中所提到的方向用語,例如「上」、「下」、「前」、「後」、「左」、「右」等,僅是參考附加圖式的方向。因此,使用的方向用語是用來說明,而非用來限制本發明。The foregoing and other objects, features, and advantages of the invention will be apparent from the Detailed Description The directional terms mentioned in the following embodiments, such as "upper", "lower", "front", "back", "left", "right", etc., are only directions referring to the additional schema. Therefore, the directional terminology used is for the purpose of illustration and not limitation.

圖1為本發明一實施例之壓印設備的示意圖。請參考圖1,本實施例的壓印設備100包括一第一滾輪110、一第二滾輪120、一可撓性壓印模130、一輸送帶140、一第一加壓裝置150及一固化裝置160。第一滾輪110與第二滾輪120之間構成一壓印區域R,可撓性壓印模130繞於第一滾輪110及第二滾輪120,且第一滾輪110及第二滾輪120用以帶動可撓性壓印模130移動並通過壓印區域R。輸送帶140配置於第一滾輪110及第二滾輪120下方且用以輸送多個基板50依序通過壓印區域R,其中各基板50上具有一膠層52。第一加壓裝置150用以提供一第一加壓氣流F1至壓印區域R,且可撓性壓印模130藉由第一加壓氣流F1的加壓而使通過壓印區域R的這些基板50與可撓性壓印模130保持接觸。固化裝置160對位於壓印區域R並固化這些膠層52,其中因為膠層52的厚度關係,使得基板50與可撓性壓印模130可能為直接接觸或是間接接觸,本發明並不以此為限,圖1所示為間接接觸的實施例。1 is a schematic view of an imprint apparatus according to an embodiment of the present invention. Referring to FIG. 1 , the imprint apparatus 100 of the present embodiment includes a first roller 110 , a second roller 120 , a flexible stamp 130 , a conveyor belt 140 , a first pressing device 150 , and a curing device . Device 160. An embossed area R is formed between the first roller 110 and the second roller 120. The flexible embossing die 130 is wound around the first roller 110 and the second roller 120, and the first roller 110 and the second roller 120 are used to drive The flexible stamp 130 moves and passes through the embossed area R. The conveyor belt 140 is disposed under the first roller 110 and the second roller 120 and is configured to transport the plurality of substrates 50 through the embossed region R, wherein each of the substrates 50 has a glue layer 52 thereon. The first pressing device 150 is configured to provide a first pressurized airflow F1 to the embossed region R, and the flexible embossing die 130 passes the embossed regions R by the pressurization of the first pressurized airflow F1. The substrate 50 is in contact with the flexible stamp 130. The pair of curing devices 160 are located in the embossed area R and cure the glue layers 52. Because the thickness of the glue layer 52 makes the substrate 50 and the flexible embossing die 130 may be in direct contact or indirect contact, the present invention does not To this end, Figure 1 shows an embodiment of indirect contact.

在上述配置方式之下,這些基板50上的這些膠層52係連續性地受到可撓性壓印模130的壓印,固化裝置160連續性地固化這些膠層52,因此可以達到類似生產線的連續製造的效果以節省平均製程時間。此外,藉由可撓性壓印模130的可撓特性及第一加壓裝置150所提供之第一加壓氣流F1的施壓,可讓可撓性壓印模130較為均勻地對膠層52進行壓印,以提升壓印的均勻性及完整性。另外,在輸送帶140將基板50送入壓印區域R的過程中,藉由第一滾輪110及第二滾輪120以及輸送帶140的帶動使可撓性壓印模130逐步與膠層52壓合,且使基板50逐步進入壓印區域R而受到第一加壓氣流F1的施壓,可迫使形成於膠層52內的氣泡被排出,故可以不必在真空環境中進行壓印就能夠減少膠層52內產生氣泡,以節省製程成本與時間。Under the above configuration, the adhesive layers 52 on the substrates 50 are continuously embossed by the flexible stamping die 130, and the curing device 160 continuously cures the adhesive layers 52, thereby achieving a similar production line. The effect of continuous manufacturing to save on average process time. In addition, by the flexible characteristics of the flexible stamping die 130 and the pressing of the first pressurized airflow F1 provided by the first pressing device 150, the flexible stamping die 130 can be relatively uniformly applied to the adhesive layer. 52 is imprinted to improve the uniformity and integrity of the imprint. In addition, in the process of feeding the substrate 50 into the embossed area R by the conveyor belt 140, the flexible embossing die 130 is gradually pressed with the adhesive layer 52 by the driving of the first roller 110 and the second roller 120 and the conveying belt 140. And the substrate 50 is gradually introduced into the embossed area R and pressed by the first pressurized airflow F1, so that the bubbles formed in the adhesive layer 52 can be forced to be discharged, so that the embossing can be reduced without being embossed in a vacuum environment. Air bubbles are generated in the glue layer 52 to save process cost and time.

圖2A至圖2C為圖1之基板的後續製程流程圖。在本實施例中,可進一步對基板50進行微影製程以使其成為發光二極體(light emitting diode,LED)的基板。詳細而言,經過上述壓印設備100的壓印,可製作出如圖2A所示具有奈米壓印圖案膠層52的基板50。接著,如圖2B所示藉由膠層52的遮罩對基板50進行蝕刻。最後,移除膠層52而可得到如圖2C所示具有圖案化表面的基板50,具有圖案化表面的基板50可使後續發光二極體的磊晶步驟較為順利,減少磊晶的缺陷。發光二極體製程中的磊晶步驟為所屬領域的習知技術,於此不加以贅述。2A to 2C are flow charts of subsequent processes of the substrate of FIG. 1. In this embodiment, the substrate 50 can be further subjected to a lithography process to make it a substrate of a light emitting diode (LED). In detail, the substrate 50 having the nanoimprint pattern adhesive layer 52 as shown in FIG. 2A can be produced by the imprinting of the above-described imprint apparatus 100. Next, the substrate 50 is etched by the mask of the adhesive layer 52 as shown in FIG. 2B. Finally, the adhesive layer 52 is removed to obtain the substrate 50 having the patterned surface as shown in FIG. 2C. The substrate 50 having the patterned surface can smooth the epitaxial step of the subsequent light-emitting diode and reduce the defects of the epitaxial. The epitaxial step in the process of the light-emitting diode is a well-known technique in the art, and will not be described herein.

請參考圖1,在本實施例中,藉由第一滾輪110及第二滾輪120的帶動,可撓性壓印模130係從第一滾輪110進入壓印區域R並從第二滾輪120離開壓印區域R。壓印設備100更包括一第一調整元件170a及一第二調整元件170b,第一滾輪110及第一調整元件170a之間為第一區段130a,第二滾輪120及第二調整元件170b之間為第二區段130c,第一區段130a及第二區段130c位於壓印區域R外。第一調整元件170a能夠帶動第一區段130a以調整第一區段130a相對於基板50的夾角A1,且第二調整元件170b能夠帶動第二區段130c以調整第二區段130c相對於基板50的夾角A2。藉由第一調整元件170a的設置,可配合膠層52的材質、結構、基板50與膠層52的厚度等製程參數的不同來對夾角A1進行調整,使可撓性壓印模130與膠層52能夠以適當的角度相接觸而進入壓印區域R1,以降低膠層52內產生氣泡的機率。藉由第二調整元件170b的設置,可配合膠層52的材質、結構、基板50與膠層52的厚度等製程參數的不同來對夾角A2進行調整,使可撓性壓印模130與膠層52能夠以適當的角度離開而脫模,以降低脫模時造成膠層52損壞的機率。Referring to FIG. 1 , in the embodiment, the flexible stamping die 130 enters the embossed area R from the first roller 110 and exits from the second roller 120 by the driving of the first roller 110 and the second roller 120 . Imprint area R. The embossing device 100 further includes a first adjusting component 170a and a second adjusting component 170b. The first roller 110 and the first adjusting component 170a are between the first segment 130a, the second roller 120 and the second adjusting component 170b. The second section 130c is located between the first section 130a and the second section 130c outside the embossed area R. The first adjustment component 170a can drive the first segment 130a to adjust the angle A1 of the first segment 130a relative to the substrate 50, and the second adjustment component 170b can drive the second segment 130c to adjust the second segment 130c relative to the substrate The angle of 50 is A2. By the arrangement of the first adjusting component 170a, the angle A1 can be adjusted to match the material of the adhesive layer 52, the structure of the substrate 50, and the thickness of the adhesive layer 52, so that the flexible stamping die 130 and the adhesive can be adjusted. Layer 52 can be brought into contact with the embossed region R1 at an appropriate angle to reduce the chance of bubble generation within the glue layer 52. By the arrangement of the second adjusting component 170b, the angle A2 can be adjusted to match the material of the adhesive layer 52, the structure of the substrate 50, and the thickness of the adhesive layer 52, so that the flexible stamping die 130 and the adhesive can be adjusted. Layer 52 can be released at a suitable angle to demold to reduce the chance of damage to glue layer 52 during demolding.

本實施例的壓印設備100更包括一第二加壓裝置180,且輸送帶140為可撓性輸送帶。第一加壓裝置150與第二加壓裝置180分別配置於可撓性壓印模130的上方及輸送帶140的下方。第二加壓裝置180提供一第二加壓氣流F2至輸送帶140的,可撓性壓印模130藉由第一加壓裝置150所提供的第一加壓氣流F1及第二加壓裝置180所提供的第二加壓氣流F2的加壓而使通過壓印區域R的這些基板50與可撓性壓印模130保持接觸。在其它實施例中,輸送帶140可為硬質輸送帶而能夠提供這些基板50支撐力,在此情況下則不需配置如圖1所示的第二加壓裝置180。The imprint apparatus 100 of the present embodiment further includes a second pressurizing device 180, and the conveyor belt 140 is a flexible conveyor belt. The first pressurizing device 150 and the second pressurizing device 180 are disposed above the flexible stamping die 130 and below the conveyor belt 140, respectively. The second pressurizing device 180 provides a second pressurized airflow F2 to the conveyor belt 140. The first pressurizing airflow F1 and the second pressurizing device are provided by the first pressurizing device 150. The pressurization of the second pressurized gas stream F2 provided by 180 maintains the substrates 50 passing through the embossed region R in contact with the flexible stamping die 130. In other embodiments, the conveyor belt 140 can be a rigid conveyor belt capable of providing these substrate 50 support forces, in which case the second pressurizing device 180 as shown in FIG. 1 need not be configured.

本發明不對膠層52的材質種類加以限制。舉例來說,各膠層52可為光固化膠層,且固化裝置160為發光裝置,用以發出紫外光L1來對膠層52進行固化。如圖1所示,本實施例的輸送帶140位於固化裝置160與可撓性壓印模130之間,因此在膠層52為光固化膠層且固化裝置160為發光裝置的情況下,輸送帶140及基板50可透光,以使紫外光L1可照射到膠層52。此外,位於固化裝置160與輸送帶140之間的第二加壓裝置180可藉由錯位、開孔或其它適當方式來使紫外光L1照射到膠層52。The present invention does not limit the type of material of the adhesive layer 52. For example, each adhesive layer 52 can be a photo-curable adhesive layer, and the curing device 160 is a light-emitting device for emitting ultraviolet light L1 to cure the adhesive layer 52. As shown in FIG. 1, the conveyor belt 140 of the present embodiment is located between the curing device 160 and the flexible stamping die 130. Therefore, in the case where the adhesive layer 52 is a light-curing adhesive layer and the curing device 160 is a light-emitting device, the conveying is performed. The strip 140 and the substrate 50 are transparent to allow the ultraviolet light L1 to be irradiated to the adhesive layer 52. In addition, the second pressing device 180 between the curing device 160 and the conveyor belt 140 can illuminate the glue layer 52 by means of misalignment, opening or other suitable means.

圖3為本發明另一實施例之壓印設備的示意圖。請參考圖3,在本實施例的壓印設備200中,第一滾輪210、第二滾輪220、可撓性壓印模230、輸送帶240、第一加壓裝置250、固化裝置260、第一調整元件270a、第二調整元件270b及第二加壓裝置280的配置方式與圖1所示的配置方式相同,於此不加以贅述。圖3之壓印設備200與圖1之壓印設備100的不同處在於,壓印設備200更包括固化裝置290,用以發出紫外光L2來對膠層52進行固化。本實施例的可撓性壓印模230位於固化裝置290與輸送帶240之間,因此在膠層52為光固化膠層且固化裝置290為發光裝置的情況下,可撓性壓印模230可透光,以使紫外光L2可照射到膠層52。此外,位於固化裝置290與可撓性壓印模230之間的第一加壓裝置250可藉由錯位、開孔或其它適當方式來使紫外光L2照射到膠層52。3 is a schematic view of an imprint apparatus according to another embodiment of the present invention. Referring to FIG. 3, in the imprint apparatus 200 of the embodiment, the first roller 210, the second roller 220, the flexible stamp 230, the conveyor belt 240, the first pressing device 250, the curing device 260, and the The arrangement of the adjustment element 270a, the second adjustment element 270b, and the second pressurizing device 280 is the same as that of the arrangement shown in FIG. 1, and will not be described herein. The imprint apparatus 200 of FIG. 3 differs from the imprint apparatus 100 of FIG. 1 in that the imprint apparatus 200 further includes a curing unit 290 for emitting ultraviolet light L2 to cure the adhesive layer 52. The flexible stamping die 230 of the present embodiment is located between the curing device 290 and the conveyor belt 240. Therefore, in the case where the glue layer 52 is a light-curing adhesive layer and the curing device 290 is a light-emitting device, the flexible stamping die 230 It is permeable to light so that the ultraviolet light L2 can be irradiated to the adhesive layer 52. In addition, the first pressurizing device 250 between the curing device 290 and the flexible stamp 230 can illuminate the glue layer 52 by ultraviolet light L2 by misalignment, opening or other suitable means.

圖4為本發明另一實施例之壓印設備的示意圖。請參考圖4,在本實施例的壓印設備300中,第一滾輪310、第二滾輪320、可撓性壓印模330、輸送帶340、第一加壓裝置350、第一調整元件370a、第二調整元件370b及第二加壓裝置380的配置方式與圖1所示的的配置方式相同,於此不加以贅述。圖4之壓印設備300與圖1之壓印設備100的不同處在於,壓印設備300的固化裝置360為加熱裝置。在膠層52為熱固化膠層的情況下,固化裝置360用以加熱膠層52以使膠層52固化。固化裝置360例如是藉由烘烤、電熱、熱風或其它適當方式加熱膠層52,本發明不對此加以限制。4 is a schematic view of an imprint apparatus according to another embodiment of the present invention. Referring to FIG. 4, in the imprint apparatus 300 of the embodiment, the first roller 310, the second roller 320, the flexible stamp 330, the conveyor belt 340, the first pressing device 350, and the first adjusting component 370a The arrangement of the second adjusting element 370b and the second pressurizing device 380 is the same as that of the arrangement shown in FIG. 1 and will not be described herein. The imprint apparatus 300 of FIG. 4 differs from the imprint apparatus 100 of FIG. 1 in that the curing apparatus 360 of the imprint apparatus 300 is a heating apparatus. In the case where the adhesive layer 52 is a thermosetting adhesive layer, the curing device 360 is used to heat the adhesive layer 52 to cure the adhesive layer 52. The curing device 360 heats the adhesive layer 52, for example, by baking, electric heating, hot air or other suitable means, which is not limited by the present invention.

圖5為本發明另一實施例之壓印設備的示意圖。請參考圖5,在本實施例的壓印設備400中,第一滾輪410、第二滾輪420、可撓性壓印模430、輸送帶440、第一加壓裝置450、第一調整元件470a、第二調整元件470b及第二加壓裝置480的配置方式與圖1所示的配置方式相同,於此不加以贅述。圖5之壓印設備400與圖1之壓印設備100的不同處在於,壓印設備400的固化裝置460為冷卻裝置。在膠層52為熱塑性膠層的情況下,固化裝置460用以冷卻膠層52以使膠層52固化。固化裝置360例如是藉由提供冷卻氣流或其它適當方式冷卻膠層52,本發明不對此加以限制。在其它實施例中,亦可不配置冷卻裝置而使膠層52自然冷卻。此外,在本實施例中,例如是藉由置於第一滾輪410之前的加熱裝置490加熱膠層52而使膠層52軟化,以順利地進行壓印。FIG. 5 is a schematic diagram of an imprint apparatus according to another embodiment of the present invention. Referring to FIG. 5, in the imprint apparatus 400 of the present embodiment, the first roller 410, the second roller 420, the flexible stamp 430, the conveyor belt 440, the first pressing device 450, and the first adjusting component 470a The arrangement of the second adjusting element 470b and the second pressurizing device 480 is the same as that of the arrangement shown in FIG. 1 and will not be described herein. The imprint apparatus 400 of FIG. 5 differs from the imprint apparatus 100 of FIG. 1 in that the curing apparatus 460 of the imprint apparatus 400 is a cooling apparatus. In the case where the adhesive layer 52 is a thermoplastic adhesive layer, the curing device 460 is used to cool the adhesive layer 52 to cure the adhesive layer 52. The curing device 360 is, for example, cooled by providing a cooling gas stream or other suitable means, which is not limited by the invention. In other embodiments, the glue layer 52 may be naturally cooled without a cooling device. Further, in the present embodiment, for example, the adhesive layer 52 is softened by heating the heating layer 490 placed before the first roller 410 to smoothly perform the imprinting.

以下以圖1的壓印設備100為例,說明本發明之壓印方法。圖6為本發明一實施例之壓印方法的流程圖。請參考圖1及圖6,藉由第一滾輪110及第二滾輪120帶動可撓性壓印模130移動並通過壓印區域R,其中可撓性壓印模130繞於第一滾輪110及第二滾輪120,壓印區域R位於第一滾輪110與第二滾輪120之間(步驟S602)。藉由輸送帶140依序輸送多個基板50通過壓印區域R,其中各基板50上具有膠層52(步驟S604)。藉由第一加壓裝置150提供第一加壓氣流F1至壓印區域,以使可撓性壓印模130藉由第一加壓氣流F1的加壓而使通過壓印區域R的這些基板50與可撓性壓印模130保持接觸(步驟S606)。藉由固化裝置160固化這些膠層52(步驟S608)。The imprint method of the present invention will be described below by taking the imprint apparatus 100 of Fig. 1 as an example. FIG. 6 is a flow chart of an imprint method according to an embodiment of the present invention. Referring to FIG. 1 and FIG. 6 , the first roller 110 and the second roller 120 drive the flexible stamping die 130 to move through the embossed region R, wherein the flexible stamping die 130 is wound around the first roller 110 and The second roller 120 has an embossed area R between the first roller 110 and the second roller 120 (step S602). The plurality of substrates 50 are sequentially conveyed by the conveyor belt 140 through the embossed regions R, wherein each of the substrates 50 has a glue layer 52 (step S604). The first pressurized air flow F1 is supplied to the embossed area by the first pressing device 150 to cause the flexible embossing die 130 to pass the substrates passing through the embossed area R by the pressurization of the first pressurized air flow F1. The 50 is kept in contact with the flexible stamper 130 (step S606). These glue layers 52 are cured by the curing device 160 (step S608).

上述步驟S602與步驟S604係同步地進行,且例如是將可撓性壓印模130的移動速度與移動方向控制為相同於這些基板50的移動速度與移動方向,以使可撓性壓印模130對各膠層52進行壓印時,不致與基板50有錯動而破壞壓印圖案。此外,例如是使這些基板50的至少其中之二(繪示為三個)同時位於壓印區域R內,以同時對多個基板50上的膠層52進行壓印及固化,而可達到類似生產線的連續製造的效果以節省平均製程時間。The above step S602 is performed in synchronization with step S604, and for example, the moving speed and the moving direction of the flexible stamping die 130 are controlled to be the same as the moving speed and moving direction of the substrates 50, so that the flexible stamping die is performed. When the respective adhesive layers 52 are imprinted 130, the embossed pattern is not broken by the substrate 50. In addition, for example, at least two of the substrates 50 (shown as three) are simultaneously located in the embossed area R to simultaneously emboss and cure the adhesive layer 52 on the plurality of substrates 50. The continuous manufacturing effect of the production line saves average process time.

本實施例的壓印方法更包括藉由第一調整元件170a調整第一區段130a相對於基板50的夾角A1,使可撓性壓印模130與膠層52能夠以適當的角度相接觸而進入壓印區域R,以降低膠層52內產生氣泡的機率。此外,本實施例的壓印方法更包括藉由第二調整元件170b調整第二區段130c相對於基板50的夾角A2,使可撓性壓印模130與膠層52能夠以適當的角度離開而脫模,以降低脫模時造成膠層52損壞的機率。另外,本實施例的壓印方法更包括藉由第二加壓裝置180提供第二加壓氣流F2至壓印區域R,以使可撓性壓印模130藉由第一加壓裝置150所提供的第一加壓氣流F1及第二加壓裝置180所提供的第二加壓氣流F2的加壓而使通過壓印區域R的這些基板50與可撓性壓印模130保持接觸。在固化裝置160固化這些膠層52時,藉由第一加壓裝置150及第二加壓裝置180的加壓而使這些基板50與可撓性壓印模130保持接觸,以提高奈米壓印圖案的轉寫率,避免在膠層52完全固化之前,基板50與可撓性壓印模130產生分離或錯動而破壞壓印圖案The imprinting method of the embodiment further includes adjusting the angle A1 of the first segment 130a relative to the substrate 50 by the first adjusting component 170a, so that the flexible stamping die 130 and the adhesive layer 52 can be in contact at an appropriate angle. The embossed area R is introduced to reduce the probability of bubble generation in the glue layer 52. In addition, the imprinting method of the embodiment further includes adjusting the angle A2 of the second segment 130c relative to the substrate 50 by the second adjusting member 170b, so that the flexible stamping die 130 and the adhesive layer 52 can be separated at an appropriate angle. The mold is demolded to reduce the chance of damage to the rubber layer 52 during demolding. In addition, the embossing method of the embodiment further includes providing the second pressurized airflow F2 to the embossed region R by the second pressing device 180, so that the flexible embossing die 130 is used by the first pressing device 150. The supply of the first pressurized gas stream F1 and the second pressurized gas stream F2 provided by the second pressurizing device 180 maintains the substrates 50 passing through the embossed region R in contact with the flexible stamping die 130. When the curing device 160 cures the adhesive layer 52, the substrates 50 are kept in contact with the flexible stamping die 130 by the pressurization of the first pressing device 150 and the second pressing device 180 to increase the nano pressure. The transfer rate of the printed pattern prevents the substrate 50 from being separated or displaced from the flexible stamp 130 before the adhesive layer 52 is completely cured to break the embossed pattern.

在本實施例中,各膠層52為光固化膠層,在上述步驟S608中的固化裝置160係發出光線照射被壓印的這些膠層52,以使膠層52固化。在另一實施例中,若各膠層52為熱固化膠層,則利用如圖4所示的固化裝置360對膠層52進行加熱以固化膠層52。在另一實施例中,若各膠層52為熱塑性膠層,則利用如圖5所示的固化裝置460對膠層52進行冷卻以固化膠層52,或讓各膠層52自然冷卻而固化。In this embodiment, each adhesive layer 52 is a photo-curable adhesive layer, and the curing device 160 in the above step S608 emits light to illuminate the embossed adhesive layers 52 to cure the adhesive layer 52. In another embodiment, if each of the adhesive layers 52 is a thermosetting adhesive layer, the adhesive layer 52 is heated by the curing device 360 as shown in FIG. 4 to cure the adhesive layer 52. In another embodiment, if each adhesive layer 52 is a thermoplastic adhesive layer, the adhesive layer 52 is cooled by a curing device 460 as shown in FIG. 5 to cure the adhesive layer 52, or the adhesive layer 52 is naturally cooled and solidified. .

綜上所述,在本發明的上述實施例中至少具有以下其中一個優點,第一滾輪及第二滾輪帶動可撓性壓印模通過壓印區域,且輸送帶輸送這些基板依序通過壓印區域,而使這些基板上的這些膠層連續性地受到可撓性壓印模的壓印及固化裝置的固化,以達到類似生產線的連續製造的效果,節省平均製程時間。此外,藉由可撓性壓印模的可撓特性及第一加壓裝置所提供之第一加壓氣流的施壓,可讓可撓性壓印模較為均勻地對膠層進行壓印,以提升壓印的均勻性及完整性。另外,在可撓性壓印模的移動及壓印的過程中,藉由滾輪的帶動及第一加壓氣流的施壓,可迫使形成於膠層內的氣泡被排出,故不必在真空環境中進行壓印就能夠減少膠層內產生氣泡,以節省製程成本與時間。再者,可利用第一調整元件來調整可撓性壓印模與膠層相接觸的角度,以降低膠層內產生氣泡的機率,且可利用第二調整元件來調整可撓性壓印模與膠層的脫模角度,以降低脫模時造成膠層損壞的機率。In summary, in the above embodiments of the present invention, at least one of the following advantages is obtained. The first roller and the second roller drive the flexible embossing die through the embossed area, and the conveyor belt transports the substrates sequentially through the embossing. The regions are such that the adhesive layers on the substrates are continuously cured by the imprinting and curing apparatus of the flexible stamp to achieve a continuous manufacturing process similar to the production line, saving an average process time. In addition, the flexible stamp can more accurately imprint the adhesive layer by the flexible characteristics of the flexible stamp and the pressure of the first pressurized airflow provided by the first pressing device. To improve the uniformity and integrity of the imprint. In addition, during the movement and imprinting of the flexible stamping die, by the driving of the roller and the pressing of the first pressurized airflow, the bubbles formed in the glue layer can be forced to be discharged, so that it is not necessary to be in a vacuum environment. Embossing in the middle can reduce bubbles in the glue layer to save process cost and time. Furthermore, the first adjustment element can be used to adjust the angle at which the flexible stamp is in contact with the glue layer to reduce the probability of bubble generation in the glue layer, and the second adjustment element can be used to adjust the flexible impression die. The angle of release from the adhesive layer to reduce the chance of damage to the adhesive layer during demolding.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。另外,本發明的任一實施例或申請專利範圍不須達成本發明所揭露之全部目的或優點或特點。此外,摘要部分和標題僅是用來輔助專利文件搜尋之用,並非用來限制本發明之權利範圍。The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent. In addition, any of the objects or advantages or features of the present invention are not required to be achieved by any embodiment or application of the invention. In addition, the abstract sections and headings are only used to assist in the search of patent documents and are not intended to limit the scope of the invention.

50...基板50. . . Substrate

52...膠層52. . . Glue layer

100、200、300、400...壓印設備100, 200, 300, 400. . . Imprinting equipment

110、210、310、410...第一滾輪110, 210, 310, 410. . . First wheel

120、220、320、420...第二滾輪120, 220, 320, 420. . . Second wheel

130、230、330、430...可撓性壓印模130, 230, 330, 430. . . Flexible stamp

130a...第一區段130a. . . First section

130c...第二區段130c. . . Second section

140、240、340、440...輸送帶140, 240, 340, 440. . . conveyor

150、250、350、450...第一加壓裝置150, 250, 350, 450. . . First pressing device

160、260、360、460...固化裝置160, 260, 360, 460. . . Curing device

170a、270a、370a、470a...第一調整元件170a, 270a, 370a, 470a. . . First adjustment component

170b、270b、370b、470b...第二調整元件170b, 270b, 370b, 470b. . . Second adjustment component

180、280、380、480...第二加壓裝置180, 280, 380, 480. . . Second pressurizing device

290...固化裝置290. . . Curing device

390...加熱裝置390. . . heating equipment

A1、A2...夾角A1, A2. . . Angle

L1、L2...紫外光L1, L2. . . Ultraviolet light

R...壓印區域R. . . Embossed area

圖1為本發明一實施例之壓印設備的示意圖。1 is a schematic view of an imprint apparatus according to an embodiment of the present invention.

圖2A至圖2C為圖1之基板的後續製程示意圖。2A to 2C are schematic views of subsequent processes of the substrate of FIG. 1.

圖3為本發明另一實施例之壓印設備的示意圖。3 is a schematic view of an imprint apparatus according to another embodiment of the present invention.

圖4為本發明另一實施例之壓印設備的示意圖。4 is a schematic view of an imprint apparatus according to another embodiment of the present invention.

圖5為本發明另一實施例之壓印設備的示意圖。FIG. 5 is a schematic diagram of an imprint apparatus according to another embodiment of the present invention.

圖6為本發明一實施例之壓印方法的流程圖。FIG. 6 is a flow chart of an imprint method according to an embodiment of the present invention.

50...基板50. . . Substrate

52...膠層52. . . Glue layer

100...壓印設備100. . . Imprinting equipment

110...第一滾輪110. . . First wheel

120...第二滾輪120. . . Second wheel

130...可撓性壓印模130. . . Flexible stamp

130a...第一區段130a. . . First section

130c...第二區段130c. . . Second section

140...輸送帶140. . . conveyor

150...第一加壓裝置150. . . First pressing device

160...固化裝置160. . . Curing device

170a...第一調整元件170a. . . First adjustment component

170b...第二調整元件170b. . . Second adjustment component

180...第二加壓裝置180. . . Second pressurizing device

A1、A2...夾角A1, A2. . . Angle

L1...紫外光L1. . . Ultraviolet light

R...壓印區域R. . . Embossed area

Claims (19)

一種壓印設備,包括:一第一滾輪及一第二滾輪,該第一滾輪與該第二滾輪之間構成一壓印區域;一可撓性壓印模,繞於該第一滾輪及該第二滾輪,其中該第一滾輪及該第二滾輪適於帶動該可撓性壓印模移動並通過該壓印區域;一輸送帶,配置於該第一滾輪及該第二滾輪下方且適於輸送多個基板依序通過該壓印區域,其中各該基板上具有一膠層;一第一加壓裝置,提供一第一加壓氣流至該壓印區域,其中該可撓性壓印模藉由該第一加壓氣流的加壓而使通過該壓印區域的該些基板與該可撓性壓印模保持接觸;以及一固化裝置,對位於該壓印區域並固化該些膠層。An embossing device includes: a first roller and a second roller, wherein the first roller and the second roller form an embossed area; a flexible embossing die, around the first roller and the a second roller, wherein the first roller and the second roller are adapted to drive the flexible stamp to move through the embossed area; a conveyor belt disposed under the first roller and the second roller The plurality of substrates are sequentially conveyed through the embossed area, wherein each of the substrates has a glue layer; a first pressing device provides a first pressurized air flow to the embossed area, wherein the flexible embossing The mold maintains contact between the substrates passing through the embossed area and the flexible embossing die by pressurization of the first pressurized air flow; and a curing device that is located in the embossed area and cures the glue Floor. 如申請專利範圍第1項所述之壓印設備,更包括一第一調整元件,該第一滾輪與該第一調整元件之間構成一第一區段,其中該可撓性壓印模繞於該第一滾輪及該第一調整元件,該第一調整元件適於帶動該第一區段以調整該第一區段相對於該基板的夾角。The embossing device of claim 1, further comprising a first adjusting component, the first roller and the first adjusting component forming a first segment, wherein the flexible embossing die winding The first adjusting element is adapted to drive the first section to adjust an angle of the first section relative to the substrate. 如申請專利範圍第1項所述之壓印設備,更包括一第二調整元件,該第二滾輪與該第二調整元件之間構成一第二區段,其中該可撓性壓印模繞於該第二滾輪及該第二調整元件,該第二調整元件適於帶動該第二區段以調整該第二區段相對於該基板的夾角。The embossing device of claim 1, further comprising a second adjusting component, wherein the second roller and the second adjusting component form a second segment, wherein the flexible embossing die winding In the second roller and the second adjusting component, the second adjusting component is adapted to drive the second section to adjust an angle of the second section relative to the substrate. 如申請專利範圍第1項所述之壓印設備,更包括一第二加壓裝置,其中該輸送帶為可撓性輸送帶,該第一加壓裝置與該第二加壓裝置分別配置於該可撓性壓印模的上方及輸送帶的下方,該第二加壓裝置提供一第二加壓氣流至該壓印區域的該可撓性輸送帶,該可撓性壓印模與該可撓性輸送帶藉由該第一加壓氣流與該第二加壓氣流的加壓而使通過該壓印區域的該些基板與該可撓性壓印模保持接觸。The imprinting apparatus according to claim 1, further comprising a second pressing device, wherein the conveying belt is a flexible conveying belt, and the first pressing device and the second pressing device are respectively disposed on Above the flexible stamping die and below the conveyor belt, the second pressing device provides a second pressurized airflow to the flexible conveyor belt of the embossing area, the flexible stamping die and the The flexible conveyor belt maintains contact between the substrates passing through the embossed area and the flexible embossing die by pressurization of the first pressurized gas stream and the second pressurized gas stream. 如申請專利範圍第1項所述之壓印設備,其中該輸送帶為硬質輸送帶。The imprint apparatus of claim 1, wherein the conveyor belt is a rigid conveyor belt. 如申請專利範圍第1項所述之壓印設備,其中該膠層為光固化膠層,該固化裝置包括一發光裝置。The imprinting apparatus of claim 1, wherein the adhesive layer is a photocurable adhesive layer, and the curing device comprises a light emitting device. 如申請專利範圍第6項所述之壓印設備,其中該輸送帶及該基板可透光,該輸送帶位於該固化裝置與該可撓性壓印模之間。The imprinting apparatus of claim 6, wherein the conveyor belt and the substrate are transparent, and the conveyor belt is located between the curing device and the flexible stamp. 如申請專利範圍第6項所述之壓印設備,其中該可撓性壓印模可透光且該可撓性壓印模位於該固化裝置與該輸送帶之間。The embossing apparatus of claim 6, wherein the flexible embossing die is permeable to light and the flexible embossing die is located between the curing device and the conveyor belt. 如申請專利範圍第1項所述之壓印設備,其中該膠層為熱固化膠層,該固化裝置包括一加熱裝置。The imprinting apparatus of claim 1, wherein the adhesive layer is a thermosetting adhesive layer, and the curing device comprises a heating device. 如申請專利範圍第1項所述之壓印設備,其中該膠層為熱塑性膠層,該固化裝置包括一冷卻裝置。The imprinting apparatus of claim 1, wherein the adhesive layer is a thermoplastic adhesive layer, and the curing device comprises a cooling device. 一種壓印方法,包括:藉由一第一滾輪及一第二滾輪帶動一可撓性壓印模移動並通過一壓印區域,其中該可撓性壓印模繞於該第一滾輪及該第二滾輪,該壓印區域位於該第一滾輪與該第二滾輪之間;藉由一輸送帶依序輸送多個基板通過該壓印區域,其中各該基板上具有一膠層;藉由一第一加壓裝置提供一第一加壓氣流至該壓印區域,以使該可撓性壓印模藉由該第一加壓氣流的加壓而使通過該壓印區域的該些基板與該可撓性壓印模保持接觸;以及藉由一固化裝置固化該些膠層。An embossing method comprising: driving a flexible embossing die and passing an embossed area by a first roller and a second roller, wherein the flexible embossing die surrounds the first roller and the a second roller, the embossed area is located between the first roller and the second roller; a plurality of substrates are sequentially transported through the embossed area by a conveyor belt, wherein each of the substrates has a glue layer; a first pressurizing device provides a first pressurized air flow to the embossed area to cause the flexible embossing to pass the substrates passing through the embossed area by pressurization of the first pressurized air flow Maintaining contact with the flexible stamp; and curing the layers by a curing device. 如申請專利範圍第11項所述之壓印方法,其中帶動該可撓性壓印模移動的步驟包括帶動該可撓性壓印模從該第一滾輪進入該壓印區域並從該第二滾輪離開該壓印區域,該壓印方法更包括藉由一第一調整元件調整該第一滾輪與該第一調整元件之間構成的一第一區段相對於該基板的夾角。The embossing method of claim 11, wherein the step of driving the flexible embossing comprises driving the flexible embossing die from the first roller into the embossed area and from the second The embossing method further comprises adjusting, by a first adjusting component, an angle of a first section formed between the first roller and the first adjusting component with respect to the substrate. 如申請專利範圍第11項所述之壓印方法,其中帶動該可撓性壓印模移動的步驟包括帶動該可撓性壓印模從該第一滾輪進入該壓印區域並從該第二滾輪離開該壓印區域,該壓印方法更包括藉由一第二調整元件調整該第二滾輪與該第二調整元件之間構成的一第二區段相對於該基板的夾角。The embossing method of claim 11, wherein the step of driving the flexible embossing comprises driving the flexible embossing die from the first roller into the embossed area and from the second The embossing method further includes adjusting, by a second adjusting component, an angle of a second section formed between the second roller and the second adjusting component with respect to the substrate. 如申請專利範圍第11項所述之壓印方法,更包括藉由一第二加壓裝置提供一第二加壓氣流至該壓印區域,以使該可撓性壓印模藉由該第二加壓氣流的加壓而使通過該壓印區域的該些基板與該可撓性壓印模保持接觸,其中該第一加壓裝置與該第二加壓裝置分別配置於該可撓性壓印模的上方及該輸送帶的下方。The embossing method of claim 11, further comprising providing a second pressurized air flow to the embossed area by a second pressing device, so that the flexible embossing die is Pressurizing the pressurized gas stream to keep the substrates passing through the embossed area in contact with the flexible embossing die, wherein the first pressing device and the second pressing device are respectively disposed at the flexible Above the stamp and below the belt. 如申請專利範圍第11項所述之壓印方法,其中該膠層為光固化膠層,固化該些膠層的步驟包括藉由該固化裝置發出光線照射被壓印的該些膠層。The embossing method of claim 11, wherein the adhesive layer is a photocurable adhesive layer, and the step of curing the adhesive layer comprises irradiating the embossed adhesive layers with light from the curing device. 如申請專利範圍第11項所述之壓印方法,其中該膠層為熱固化膠層,固化該些膠層的步驟包括藉由該固化裝置加熱該些膠層。The imprint method of claim 11, wherein the adhesive layer is a thermosetting adhesive layer, and the step of curing the adhesive layer comprises heating the adhesive layers by the curing device. 如申請專利範圍第11項所述之壓印方法,其中該膠層為熱塑性膠層,固化該些膠層的步驟包括藉由該固化裝置冷卻該些膠層。The embossing method of claim 11, wherein the adhesive layer is a thermoplastic adhesive layer, and the step of curing the adhesive layer comprises cooling the adhesive layer by the curing device. 如申請專利範圍第11項所述之壓印方法,其中依序輸送該些基板通過該壓印區域的步驟包括使該些基板的至少其中之二同時位於該壓印區域內。The embossing method of claim 11, wherein the step of sequentially transporting the substrates through the embossed area comprises causing at least two of the substrates to be simultaneously located within the embossed area. 如申請專利範圍第11項所述之壓印方法,其中帶動該可撓性壓印模移動及輸送該些基板通過該壓印區域的步驟包括使該可撓性壓印模的移動速度與移動方向相同於該些基板的移動速度與移動方向。The embossing method of claim 11, wherein the step of moving the flexible embossing die and transporting the substrates through the embossed area comprises moving and moving the flexible embossing die The direction is the same as the moving speed and moving direction of the substrates.
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