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TW201303347A - Method for manufacturing anti-reflection film, anti-reflection film, polarizing plate, and image display device - Google Patents

Method for manufacturing anti-reflection film, anti-reflection film, polarizing plate, and image display device Download PDF

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TW201303347A
TW201303347A TW101117511A TW101117511A TW201303347A TW 201303347 A TW201303347 A TW 201303347A TW 101117511 A TW101117511 A TW 101117511A TW 101117511 A TW101117511 A TW 101117511A TW 201303347 A TW201303347 A TW 201303347A
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refractive index
layer
low refractive
index layer
antireflection film
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TW101117511A
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Chinese (zh)
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TWI530707B (en
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Seiji Shinohara
Mariko Hayashi
Kentaro Akiyama
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Dainippon Printing Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Polarising Elements (AREA)

Abstract

The present invention provides a method for easily manufacturing an anti-reflection film, an anti-reflection film, a polarizing plate and an image display device obtained by using the film. The anti-reflection film has excellent anti-reflection property, excellent scratch resistance and stain resistance, and inhibits the occurrence of slight whitening which has not been answered until now. The method for manufacturing the anti-reflection film contains three steps in order. The step (1) is coating the component for forming a low-refraction layer on the transparent substrate and forming the coating film, wherein the component at least includes fluorine containing compounds, particles, and binder resin. The step (2) is phase-separating the coating film into a low-refraction phase and a stain-resistance phase. The step (3) is heating the low-refraction phase and the stain-resistance phase, or irradiating the low-refraction phase and the stain-resistance phase by the ionization radiation, and then forming the low-refraction layer and the stain-resistance layer covering the whole surface of the low-refraction layer. The anti-reflection film has at least the transparent substrate, the low-refraction layer and the stain-resistance layer in order. The ratio of fluorine atom and carbon atom measured by X-ray photoelectron spectrometry (XPS) from the side of the stain-resistance layer is 0.6 to 1.0, and the ratio of silicon atom and carbon atom is less than 0.25. The average surface roughness (Ra') of the stain-resistance layer is less than or equal to 10 nm.

Description

抗反射薄膜之製造方法、抗反射薄膜、偏光板及影像顯示裝置 Antireflection film manufacturing method, antireflection film, polarizing plate and image display device

本發明係關於抗反射薄膜之製造方法、抗反射薄膜、偏光板及影像顯示裝置。 The present invention relates to a method for producing an antireflection film, an antireflection film, a polarizing plate, and an image display device.

以往,在液晶顯示器(LCD)、電漿顯示器面板(PDP)、陰極管顯示裝置(CRT)等之顯示器的表面,為了賦予高表面硬度、或防止來自白熱燈、螢光燈等之外部光源照射的光線所致反射之抗反射特性,而設置抗反射薄膜。通常,抗反射薄膜係具有在透明基材上積層有硬塗層與低折射率層之構成者,該低折射率層為了有助於抗反射,較佳為更低折射率。此外,作為用以達成低反射率之方法,例如已知先在上述硬塗層之上將中折射率層、高折射率層等之折射率更高的層積層為薄膜,再形成上述低折射率層之方法。又例如專利文獻1中,揭示在折射率抑制層含有特定之微粒子的抗反射薄膜。 Conventionally, on the surface of displays such as liquid crystal displays (LCDs), plasma display panels (PDPs), and cathode tube display devices (CRTs), in order to impart high surface hardness or to prevent external light sources from incandescent lamps, fluorescent lamps, and the like. The anti-reflective property of the reflection caused by the light is set, and the anti-reflection film is provided. Generally, the antireflection film has a structure in which a hard coat layer and a low refractive index layer are laminated on a transparent substrate, and the low refractive index layer preferably has a lower refractive index in order to contribute to antireflection. Further, as a method for achieving a low reflectance, for example, it is known to form a laminated layer having a higher refractive index of a medium refractive index layer, a high refractive index layer or the like on the hard coat layer as a film, and to form the above low refractive index. The method of the rate layer. Further, for example, Patent Document 1 discloses an antireflection film containing specific fine particles in a refractive index suppression layer.

另一方面,作為抗反射薄膜所要求之性能,可列舉如上述之顯示器表面的耐摩擦性,或者不易因指紋或皮脂、麥克筆等而髒污,且即使附著此等之污垢亦容易擦拭,亦即防污性。作為賦予抗反射薄膜防污性之手法,有使用含氟防污劑等之防污劑的手法(例如專利文獻1)。然而,專利文獻1為了抑制起因於含防污劑組成物之白濁的性能下降等,而提升與該組成物中之各成分的互溶性,亦即必須使用重量平均分子量小於5000左右之低分子量的含氟防污劑,無法稱所得之防污性為充分。 On the other hand, the performance required for the antireflection film may be, for example, the above-mentioned abrasion resistance of the surface of the display, or it is not easily stained by fingerprints, sebum, a mic, etc., and it is easy to wipe even if such dirt is adhered. That is, antifouling. As a method of imparting antifouling properties to the antireflection film, there is a method of using an antifouling agent such as a fluorine-containing antifouling agent (for example, Patent Document 1). However, in order to suppress the deterioration of the performance due to the white turbidity of the antifouling agent-containing composition, the patent document 1 improves the mutual solubility with each component in the composition, that is, it is necessary to use a low molecular weight having a weight average molecular weight of less than 5,000. The fluorine-containing antifouling agent cannot be said to have sufficient antifouling properties.

作為賦予防污性之手法,亦有提案在設置於其表面之防污層中,藉由使用具有全氟烷基等之含氟化合物,使與矽元素、碳元素、及氟元素之關係中,存在特定量的氟原子之手法(例如專利文獻2)。已知如於專利文獻2所使用,具有全氟烷基等之含氟化合物,雖為防污性優異的材料,卻與形成防污層的其它材料,例如黏結劑樹脂的互溶性不佳,若欲塗布包含該含氟化合物之樹脂組成物以形成防污層,則有時難以形成安定的防污層,或者亦有發生白化問題之情形。 As a method of imparting antifouling property, it is also proposed to use a fluorine-containing compound having a perfluoroalkyl group in the antifouling layer provided on the surface thereof in the relationship with a lanthanum element, a carbon element, and a fluorine element. A method in which a specific amount of a fluorine atom is present (for example, Patent Document 2). It is known that, as used in Patent Document 2, a fluorine-containing compound having a perfluoroalkyl group or the like is excellent in antifouling property, but has poor miscibility with other materials forming an antifouling layer, such as a binder resin. If a resin composition containing the fluorine-containing compound is to be applied to form an antifouling layer, it may be difficult to form a stable antifouling layer or a whitening problem may occur.

從這一點,專利文獻2中由於與其它成分的互溶性明顯變差,為了不造成塗布面發生凹陷或不均、白化等不良影響,藉由在與矽元素、碳元素、及氟元素之關係中,使特定量的氟原子存在,而得到一定的互溶性以形成防污層,欲形成安定的防污層或抑制白化之發生(專利文獻2,段落[0039])。 From this point of view, in Patent Document 2, the mutual solubility with other components is remarkably deteriorated, and the relationship with the lanthanum element, the carbon element, and the fluorine element is not caused in order to cause adverse effects such as depression, unevenness, and whitening of the coated surface. In the case where a specific amount of fluorine atoms are present, a certain mutual solubility is obtained to form an antifouling layer, and it is desired to form a stable antifouling layer or to suppress whitening (Patent Document 2, paragraph [0039]).

近年來伴隨如上述之顯示器的高性能化,抗反射薄膜亦追求高性能化,尤其提升對白化之要求。在以往,若說白化就是如可一眼辨識,降低薄膜透明性之程度的白化,而所追求的就是減少這種白化。然而近年來,除了以往的白化,還要求抑制至今從未過問的輕微白化,該輕微白化係在乍看之下認為具有高透明性的薄膜中,所屬技術領域中具有通常知識者勉強才能目識的程度,藉由專利文獻2有塗膜面並非均勻一致而有些許翹曲之情形等有無法充分完全對應的情況。 In recent years, along with the high performance of the above-described display, the antireflection film has also been expected to have high performance, and in particular, to increase the requirements for whitening. In the past, if whitening is a whitening that can be recognized at a glance and reduces the transparency of the film, the pursuit is to reduce this whitening. However, in recent years, in addition to the previous whitening, it is also required to suppress the slight whitening which has never been asked until now. The slight whitening is considered to be a film having high transparency at first glance, and those having ordinary knowledge in the technical field can barely recognize it. In the case of Patent Document 2, the case where the coating film surface is not uniform and the warpage is somewhat warped may not be sufficiently fully matched.

此外,作為賦予薄膜防污性之手法,有提案在設置 抗反射層的透明薄膜基材上,蒸鍍含有全氟聚醚基的矽烷偶合劑以形成防污層之手法(例如專利文獻3)。此專利文獻3所記載之手法,係因為如上述之具有全氟烷基等的含氟化合物,與一般形成防污層的其它材料之互溶性差,難以塗布該包含含氟化合物之樹脂組成物以形成防污層,而嘗試採用不使用其它材料就能形成層的所謂蒸鍍之手法,欲將包含該含氟化合物之防污層製膜。然而,因為採用蒸鍍來形成層,而無法使用黏結劑樹脂等之其它材料,由於防污層之層強度或與透明薄膜基材之黏著性變差,因數次的擦拭而導致防污層自薄膜剝離而防污性明顯下降,又因為蒸鍍必須在數百度的高溫下進行,而有透明薄膜基材因加熱而收縮,或者在對於流通前之製品所進行的加速劣化試驗中,因高溫蒸鍍而受到熱損傷的基材本身分解等問題。 In addition, as a means of imparting antifouling properties to the film, there are proposals in the setting. On the transparent film substrate of the antireflection layer, a perfluoropolyether group-containing decane coupling agent is vapor-deposited to form an antifouling layer (for example, Patent Document 3). The method described in Patent Document 3 is because the fluorine-containing compound having a perfluoroalkyl group or the like as described above is inferior in compatibility with other materials which generally form an antifouling layer, and it is difficult to apply the resin composition containing the fluorine-containing compound. An antifouling layer is formed, and a so-called vapor deposition method in which a layer is formed without using other materials is attempted, and an antifouling layer containing the fluorine-containing compound is to be formed into a film. However, since the layer is formed by evaporation, and other materials such as a binder resin cannot be used, since the layer strength of the antifouling layer or the adhesion to the transparent film substrate is deteriorated, the factor is wiped to cause the antifouling layer to be self-contained. The film is peeled off and the antifouling property is remarkably lowered, and since the vapor deposition must be performed at a high temperature of several hundred degrees, the transparent film substrate shrinks due to heating, or in the accelerated deterioration test for the product before circulation, due to the high temperature Problems such as decomposition of the substrate which is subjected to thermal damage by vapor deposition.

防污層一般係使其厚度為nm等級程度之非常地薄,除了優異的防污性,還必須抑制輕微白化的發生,為了同時滿足這些條件,茲認為除了使用彼此具有互溶性者作為形成防污層之成分,還必須進一步研發才能達成。 The antifouling layer is generally made to have a thickness which is very thin in the order of nm. In addition to excellent antifouling properties, it is necessary to suppress the occurrence of slight whitening. In order to satisfy these conditions at the same time, it is considered that in addition to the mutual solubility of each other, formation prevention The composition of the stain must be further developed to achieve.

[專利文獻1]日本特開2010-152311號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-152311

[專利文獻2]國際公開第2008/38714號小冊子 [Patent Document 2] International Publication No. 2008/38714

[專利文獻3]日本特開2001-188102號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2001-188102

本發明之目的係在這種狀況下提供,可輕易製造具 有優異的抗反射特性、具有優異的耐摩擦性及防污性,且抑制至今從未過問之輕微白化之發生的抗反射薄膜之製造方法、抗反射薄膜、以及使用該薄膜之偏光板及影像顯示裝置。 The object of the present invention is provided under such circumstances, and the article can be easily manufactured. Method for producing antireflection film, excellent anti-reflection property, excellent abrasion resistance and antifouling property, and suppressing occurrence of slight whitening which has never been solved so far, antireflection film, and polarizing plate and image using the same Display device.

本發明者等為了達成上述目的而反覆地專心研究,結果發現依據專利文獻2之手法形成防污層時,在其表面,形成防污層之組成物的硬化物為不均勻分布,或者不均勻分布有圓形或橢圓形的洞,而能見到基材等之下層露出的海島結構之情形,該結構之生成阻礙安定的防污層之形成,更使至今從未過問之輕微白化出現。亦即,專利文獻2所揭示之手法,係藉由使特定量之氟原子存在,得到一定的互溶性,雖提升形成防污層之容易性,但在追求抗反射薄膜之更高性能化的狀況下,對於防污層是否均勻一致地形成,是否生成海島結構、發生輕微白化,則有進一步檢討的餘地。 In order to achieve the above object, the inventors of the present invention have repeatedly studied intensively, and as a result, found that when the antifouling layer is formed according to the method of Patent Document 2, the cured product of the composition forming the antifouling layer on the surface thereof is unevenly distributed or uneven. A circular or elliptical hole is distributed, and the island structure exposed under the substrate or the like can be seen. The formation of the structure hinders the formation of a stable antifouling layer, and the slight whitening has never been asked. That is, the technique disclosed in Patent Document 2 obtains a certain mutual solubility by presenting a specific amount of fluorine atoms, and improves the easiness of forming an antifouling layer, but pursues higher performance of the antireflection film. In the case where there is a uniform formation of the antifouling layer, whether or not the island structure is generated, and slight whitening occurs, there is room for further review.

因此,本發明者等並非如以往謀求提升互溶性,藉由特意使用含有包含許多互溶性差的氟原子之特定含氟化合物的低折射率層形成用組成物,並且採用塗布該組成物後予以相分離之手法,以該組成物覆蓋薄膜表面全體之方式形成層,而發現可得到抑制如上述之海島結構的生成、平均面粗糙度小、均勻一致的低折射率層,得以解決上述課題。 Therefore, the present inventors have not attempted to improve the mutual solubility as in the past, and a composition for forming a low refractive index layer containing a specific fluorine-containing compound containing a plurality of fluorine atoms having poor miscibility is intentionally used, and the composition is applied after coating the composition. In the separation method, a layer is formed so as to cover the entire surface of the film, and it has been found that the above problem can be solved by suppressing the formation of the sea-island structure as described above and the uniform low-refractive-index layer having a uniform average surface roughness.

此外,雖然氟原子含量多的含氟化合物防污性優異,但由於互溶性卻差,以往從未考慮含有於樹脂組成物 來使用,然而本案發明中可以使用該含氟化合物,並可得到極優異的防污性。本發明係基於這種見解而完成者。 Further, although the fluorine-containing compound having a large fluorine atom content is excellent in antifouling property, it is poorly miscible, and has never been considered to be contained in a resin composition. It is used, however, the fluorine-containing compound can be used in the invention of the present invention, and excellent antifouling properties can be obtained. The present invention has been completed based on this finding.

亦即,本發明係提供:[1]一種抗反射薄膜之製造方法,其依序包含以下之步驟(1)~(3),該抗反射薄膜至少依序具有透明基材、低折射率層、及防污層,自該防污層側藉由X射線光電子光譜法(XPS)測定之氟原子/碳原子比為0.6~1.0,且矽原子/碳原子比為小於0.25,該防污層之平均面粗糙度(Ra’)為10nm以下,步驟(1)在透明基材上塗布至少含有含氟化合物、微粒子及黏結劑樹脂之低折射率層形成用組成物,形成塗膜之步驟,步驟(2)使該塗膜相分離成低折射率相與防污相之步驟,步驟(3)加熱該低折射率相與該防污相,或對該低折射率相與該防污相照射游離輻射,形成低折射率層與覆蓋該低折射率層之全面的防污層之步驟;[2]一種抗反射薄膜,其係藉由上述[1]所記載的抗反射薄膜之製造方法所製造;[3]一種偏光板,其係在偏光膜之至少單面上具有抗反射薄膜,該抗反射薄膜為上述[2]所記載之抗反射薄膜;及[4]一種影像顯示裝置,其係在顯示器之最表面具有抗反射薄膜或偏光板,該偏光板係在偏光膜之至少單面 上具有抗反射薄膜者,該抗反射薄膜為上述[2]所記載之抗反射薄膜。 That is, the present invention provides: [1] A method for producing an antireflection film, which comprises the following steps (1) to (3) in sequence, the antireflection film having at least a transparent substrate and a low refractive index layer in sequence And an antifouling layer, the fluorine atom/carbon atom ratio measured by X-ray photoelectron spectroscopy (XPS) from the side of the antifouling layer is 0.6 to 1.0, and the germanium atom/carbon atom ratio is less than 0.25, the antifouling layer The step (1) is a step of forming a coating film by coating a composition for forming a low refractive index layer containing at least a fluorine-containing compound, fine particles, and a binder resin on a transparent substrate, wherein the average surface roughness (Ra') is 10 nm or less. Step (2) a step of separating the coating film into a low refractive index phase and an antifouling phase, and step (3) heating the low refractive index phase and the antifouling phase, or the low refractive index phase and the antifouling phase a step of irradiating free radiation to form a low-refractive-index layer and a comprehensive anti-staining layer covering the low-refractive-index layer; [2] an anti-reflection film which is produced by the anti-reflection film according to [1] above Manufactured; [3] a polarizing plate having an anti-reflection film on at least one side of the polarizing film, the anti-reflection film The film is the antireflection film described in the above [2]; and [4] an image display device having an antireflection film or a polarizing plate on the outermost surface of the display, the polarizing plate being at least one side of the polarizing film The antireflection film is the antireflection film described in the above [2].

依據本發明可以輕易地得到具有優異的抗反射特性、具有優異的耐摩擦性及防污性,且抑制至今從未過問之輕微白化之發生的抗反射薄膜,並且得到使用該抗反射薄膜之偏光板、以及影像顯示裝置。 According to the present invention, it is possible to easily obtain an antireflection film having excellent antireflection characteristics, excellent rub resistance and antifouling property, and suppressing the occurrence of slight whitening which has never been solved so far, and obtaining polarized light using the antireflection film. Board and image display device.

[實施發明之形態] [Formation of the Invention] [抗反射薄膜之製造方法] [Method of Manufacturing Antireflection Film]

本發明的抗反射薄膜之製造方法,係依序包含步驟(1)在透明基材上塗布至少含有含氟化合物、微粒子及黏結劑樹脂之低折射率層形成用組成物以形成塗膜之步驟,步驟(2)使該塗膜相分離成低折射率相與防污相之步驟,及步驟(3)加熱該低折射率相與該防污相,或對該低折射率相與該防污相照射游離輻射,形成低折射率層與覆蓋該低折射率層之全面的防污層之步驟,製造至少依序具有透明基材、低折射率層、及防污層,自該防污層側藉由X射線光電子光譜法(XPS)測定之氟原子/碳原子比為0.6~1.0,且矽原子/碳原子比為小於0.25,該防污層之平均面粗糙度(Ra’)為10nm以下之抗反射薄膜的方法。 The method for producing an antireflection film of the present invention comprises the steps of: step (1) applying a composition for forming a low refractive index layer containing at least a fluorine-containing compound, fine particles and a binder resin to a transparent substrate to form a coating film. And (2) the step of separating the coating film into a low refractive index phase and an antifouling phase, and the step (3) heating the low refractive index phase and the antifouling phase, or the low refractive index phase and the prevention The step of irradiating the free radiation to form a low refractive index layer and a comprehensive antifouling layer covering the low refractive index layer, and manufacturing at least a transparent substrate, a low refractive index layer, and an antifouling layer, from the antifouling The average side surface roughness (Ra') of the antifouling layer is determined by X-ray photoelectron spectroscopy (XPS) with a fluorine atom/carbon atom ratio of 0.6 to 1.0 and a germanium atom/carbon atom ratio of less than 0.25. A method of antireflection film of 10 nm or less.

於步驟(2)形成之低折射率相及防污相,係在塗布低折射率層形成用組成物之塗膜內形成的相,低折射率層形成用組成物中之黏結劑樹脂係未硬化之狀態,又,在該組成物中較佳包含之溶劑係於相分離大致完成時蒸發 之狀態。另一方面,此等的相藉由經過步驟(3),在該層中黏結劑樹脂成為硬化狀態、溶劑則蒸發而大半不存在,形成低折射率層及防污層。因此,本發明中將存在於塗膜中之狀態稱為低折射率相、防污相,以經過步驟(3)而分別稱為低折射率層、防污層。此外,本發明中,未硬化之狀態係指低折射率層形成用組成物具有物理的流動性之狀態,亦即可測定黏度之狀態,硬化狀態係指低折射率層形成用組成物不具有物理的流動性之狀態,亦即無法測定黏度之狀態。 The low refractive index phase and the antifouling phase formed in the step (2) are phases formed in a coating film on which the composition for forming a low refractive index layer is applied, and the binder resin in the composition for forming a low refractive index layer is not In the state of hardening, in addition, the solvent preferably contained in the composition is evaporated when the phase separation is substantially completed. State. On the other hand, these phases are formed by the step (3), in which the binder resin is in a hardened state, and the solvent is evaporated to be largely absent, thereby forming a low refractive index layer and an antifouling layer. Therefore, in the present invention, the state existing in the coating film is referred to as a low refractive index phase and an antifouling phase, and is referred to as a low refractive index layer and an antifouling layer, respectively, through the step (3). Further, in the present invention, the uncured state means a state in which the composition for forming a low refractive index layer has a physical fluidity, that is, a state in which the viscosity is measured, and the state in which the state of the hardened state means that the composition for forming a low refractive index layer does not have The state of physical fluidity, that is, the state of viscosity cannot be measured.

以下對於各步驟作說明。 The following describes each step.

(步驟(1)) (step 1))

步驟(1)係在透明基材上塗布至少含有含氟化合物、微粒子及黏結劑樹脂之低折射率層形成用組成物以形成塗膜之塗膜形成步驟。 The step (1) is a coating film forming step of forming a composition for forming a low refractive index layer containing at least a fluorine-containing compound, fine particles, and a binder resin on a transparent substrate to form a coating film.

本發明中,塗膜形成步驟係較佳藉由準備透明基材、另外製備低折射率層形成用組成物、在該透明基材上塗布該低折射率層形成用組成物來進行。 In the present invention, the coating film forming step is preferably carried out by preparing a transparent substrate, separately preparing a composition for forming a low refractive index layer, and applying the composition for forming a low refractive index layer on the transparent substrate.

(低折射率層形成用組成物之製備) (Preparation of a composition for forming a low refractive index layer)

低折射率層形成用組成物係將後述的含氟化合物、微粒子、黏結劑樹脂、及較佳使用的含氟聚合物或各種添加劑等均質混合,並因應需要而溶解於溶劑而製備。 The composition for forming a low refractive index layer is prepared by uniformly mixing a fluorine-containing compound, fine particles, a binder resin, a preferably used fluorine-containing polymer or various additives, which will be described later, and dissolving in a solvent as needed.

該低折射率形成用組成物,若考慮生產性則較佳為溶解於溶劑之液狀。液狀之低折射率層形成用組成物的黏度,係藉由後述的塗布方式,只要可於透明基材之表面形成塗膜之黏度即可,並無特別限制。 The composition for forming a low refractive index is preferably a liquid which is dissolved in a solvent in consideration of productivity. The viscosity of the composition for forming a liquid low refractive index layer is not particularly limited as long as the viscosity of the coating film can be formed on the surface of the transparent substrate by a coating method to be described later.

(塗膜之形成) (formation of coating film)

塗膜之形成係在透明基材的表面上,使硬化後之厚度成為後述所定之厚度的方式,將如上述而製備的低折射率層形成用組成物,藉由凹版塗布、棒塗布、輥塗布、反輥塗布、刮刀式塗布、壓鑄模塗布等之周知方式,較佳為凹版塗布、壓鑄模塗布而塗布進行。 The coating film is formed on the surface of the transparent substrate, and the thickness after hardening is set to a thickness as described later. The composition for forming a low refractive index layer prepared as described above is applied by gravure coating, bar coating, and roll. A known method such as coating, back roll coating, doctor blade coating, and die casting coating is preferably applied by gravure coating or die casting coating.

以下,對於形成透明基材及低折射率層形成用組成物之各成分進行說明。 Hereinafter, each component which forms a transparent base material and a composition for forming a low refractive index layer is demonstrated.

(透明基材) (transparent substrate)

本發明所使用的透明基材,只要係一般作為抗反射膜之基材所使用的透明物則無特別限定,然而較佳為可以因應用途,適宜選擇塑膠薄膜、塑膠薄片等。 The transparent substrate to be used in the present invention is not particularly limited as long as it is generally used as a substrate of the antireflection film. However, it is preferable to appropriately select a plastic film or a plastic sheet depending on the application.

作為這種塑膠薄膜或塑膠薄片,可列舉各種包含合成樹脂者。作為合成樹脂,可列舉聚乙烯樹脂、乙烯α烯烴共聚物、聚丙烯樹脂、聚甲基戊烯樹脂、聚丁烯樹脂、乙烯-丙烯共聚物、丙烯-丁烯共聚物、烯烴系熱塑性彈性體、或此等之混合物等之直鏈狀或環狀的聚烯烴樹脂;聚對苯二甲酸乙二酯樹脂(PET)、聚對苯二甲酸丁二酯樹脂、聚萘二甲酸乙二酯-間苯二甲酸共聚樹脂、聚酯系熱塑性彈性體等之聚酯樹脂;聚(甲基)丙烯酸甲酯樹脂、聚(甲基)丙烯酸乙酯樹脂、聚(甲基)丙烯酸丁酯樹脂等之丙烯酸樹脂;以耐綸6或耐綸66等為代表之聚醯胺樹脂;三乙醯基纖維素樹脂(TAC)、二乙醯基纖維素、乙酸丁酸酯纖維素、賽璐凡等之纖維素系樹脂;降莰烯、二環戊二烯、四環十二烯等之可自環烯烴得到的環聚烯 烴樹脂;聚苯乙烯樹脂;聚碳酸酯樹脂;聚芳香酯樹脂;或聚醯亞胺樹脂等。 As such a plastic film or a plastic sheet, various synthetic resins are mentioned. Examples of the synthetic resin include a polyethylene resin, an ethylene alpha olefin copolymer, a polypropylene resin, a polymethylpentene resin, a polybutene resin, an ethylene-propylene copolymer, a propylene-butene copolymer, and an olefin thermoplastic elastomer. a linear or cyclic polyolefin resin such as a mixture of such or the like; polyethylene terephthalate resin (PET), polybutylene terephthalate resin, polyethylene naphthalate- Polyester resin such as isophthalic acid copolymer resin or polyester thermoplastic elastomer; poly(methyl) methacrylate resin, poly(methyl) acrylate resin, poly(meth) butyl acrylate resin, etc. Acrylic resin; polyamide resin represented by nylon 6 or nylon 66; triethylenesulfonyl cellulose resin (TAC), diethyl cellulose, cellulose acetate butyrate, celluloid, etc. Cellulose resin; cyclic polyene obtained from a cyclic olefin such as decene, dicyclopentadiene or tetracyclododecene Hydrocarbon resin; polystyrene resin; polycarbonate resin; polyarylate resin; or polyimine resin.

作為透明基材,可由上述的塑膠薄膜、塑膠薄片之中,以單獨或選擇2種以上作為混合物使用,從機械性強度的觀點來看,較佳為聚對苯二甲酸乙二酯樹脂或丙烯酸樹脂,從光學各向異性的觀點來看,較佳為三乙醯基纖維素樹脂或環聚烯烴。 The transparent substrate may be used alone or in combination of two or more kinds of the above-mentioned plastic film or plastic sheet, and from the viewpoint of mechanical strength, polyethylene terephthalate resin or acrylic acid is preferred. The resin is preferably a triethylenesulfonyl cellulose resin or a cyclic polyolefin from the viewpoint of optical anisotropy.

對於透明基材之厚度,並無特別限制,通常為5~1000μm左右,若考慮耐久性或操作性等,較佳為15~80μm,更佳為20~60μm。 The thickness of the transparent substrate is not particularly limited, but is usually about 5 to 1000 μm, and is preferably from 15 to 80 μm, more preferably from 20 to 60 μm, in view of durability and workability.

(低折射率層形成用組成物) (Composition for forming a low refractive index layer)

本發明中所使用的低折射率層形成用組成物,係含有含氟化合物、微粒子及黏結劑樹脂之樹脂組成物。以下對於各成分作說明。 The composition for forming a low refractive index layer used in the present invention is a resin composition containing a fluorine-containing compound, fine particles, and a binder resin. The components are explained below.

(含氟化合物) (fluorine-containing compound)

低折射率層形成用組成物,係以在本發明的抗反射薄膜形成防污層為目的,而包含含氟化合物。作為本發明所使用的含氟化合物,較佳為具有反應性基及全氟聚醚基的化合物,其中尤其較佳可列舉含有具有反應性基的矽烷單元、及具有全氟聚醚基的矽烷單元之化合物。本發明中,由於含氟化合物藉由具有反應性基,變得可以輕易地與組成物中的其它成分結合,而能形成更堅固的層,以結果而言,可以得到既薄又耐摩擦性優異的層。此外,本發明中抗反射薄膜最表面之耐摩擦性優異,係指同時最表面之層與其下層之黏著性亦優異。亦即, 使低折射率層形成用組成物中的含氟化合物,在低折射率相及防污相中,在該防污相中以更多量的方式存在,在後述步驟(3)中硬化時,藉由包含於各相的該含氟化合物中之反應性基彼此反應,可以得到低折射率層與防污層之非常優異的黏著性。此外,藉由該含氟化合物的反應性基與黏結劑樹脂的反應性基之反應、或者黏結劑樹脂本身之硬化,而進一步提升防污層的黏著性,且硬度變高,成為綜合而言耐摩擦性非常優異的層。 The composition for forming a low refractive index layer contains a fluorine-containing compound for the purpose of forming an antifouling layer in the antireflection film of the present invention. The fluorine-containing compound used in the present invention is preferably a compound having a reactive group and a perfluoropolyether group, and particularly preferably a decane unit having a reactive group and a decane having a perfluoropolyether group. a compound of a unit. In the present invention, since the fluorine-containing compound can be easily combined with other components in the composition by having a reactive group, a stronger layer can be formed, and as a result, both thin and abrasion resistance can be obtained. Excellent layer. Further, in the present invention, the anti-reflective film is excellent in the abrasion resistance at the outermost surface, and is also excellent in the adhesion of the outermost layer to the lower layer. that is, The fluorine-containing compound in the composition for forming a low refractive index layer is present in a large amount in the anti-fouling phase in the low refractive index phase and the antifouling phase, and is hardened in the step (3) described later. By reacting the reactive groups in the fluorine-containing compound contained in each phase with each other, very excellent adhesion between the low refractive index layer and the antifouling layer can be obtained. Further, by the reaction of the reactive group of the fluorine-containing compound with the reactive group of the binder resin or the curing of the binder resin itself, the adhesion of the antifouling layer is further improved, and the hardness is increased, thereby becoming a comprehensive A layer that is very excellent in abrasion resistance.

又,如上述之包含矽烷單元的化合物,由於與包含於低折射率相的微粒子具有親和力,在低折射率相的表面形成防污相時,可賦予遍布該表面之全面的浸潤性,又因即使處於溶劑自相中幾乎蒸發的狀態,亦能保持浸潤性,而在該表面之全面得到均勻一致的防污層之觀點為重要。更者,由於這種化合物很柔軟,因提升了滑動性,而能得到耐摩擦性優異的層。而且,因為具有親和力而能持續安定地得到浸潤性,因此可以抑制溶劑蒸發時或是發生凹陷、或是生成海島結構、而起因於此等的輕微白化之發生。再者,藉由使用在同一分子內具有矽烷單元與全氟醚基的含氟化合物,可以抑制矽烷單元與全氟聚醚的相分離,而能更輕易地得到均勻一致的表面。在此,矽烷單元係以下一般式(1)所表示的單元。 Further, the compound containing a decane unit as described above has an affinity for microparticles contained in a low refractive index phase, and when an antifouling phase is formed on the surface of the low refractive index phase, comprehensive wettability throughout the surface can be imparted, and It is important to maintain the wettability even in a state where the solvent is almost evaporated from the phase, and it is important to obtain a uniform antifouling layer on the entire surface. Furthermore, since this compound is very soft, a layer excellent in abrasion resistance can be obtained by improving the slidability. Further, since the infiltibility can be stably obtained by the affinity, it is possible to suppress the occurrence of slight whitening due to the occurrence of depression or formation of a sea-island structure when the solvent evaporates. Further, by using a fluorine-containing compound having a decane unit and a perfluoroether group in the same molecule, phase separation of the decane unit and the perfluoropolyether can be suppressed, and a uniform surface can be more easily obtained. Here, the decane unit is a unit represented by the following general formula (1).

式(1)中,X表示單鍵或氧原子,R1及R2表示一價的有機基,且R1及R2的至少一者係包含反應性基或全氟聚醚基的一價有機基。本發明所使用的含氟化合物,例如可以係具有R1為包含反應性基的一價有機基之矽烷單元、與R1為包含全氟聚醚基的一價有機基之矽烷單元者,亦可以係具有R1為包含反應性基的一價有機基、且R2為包含全氟聚醚基的一價有機基之矽烷單元者。又,在複數的矽烷單元中,R1、R2及X係獨立的,亦即本發明的含氟化合物只要至少含有具有反應性基的矽烷單元、以及具有全氟聚醚基的矽烷單元,亦可為具有多種矽烷單元者。 In the formula (1), X represents a single bond or an oxygen atom, R 1 and R 2 represent a monovalent organic group, and at least one of R 1 and R 2 contains a monovalent group of a reactive group or a perfluoropolyether group. Organic base. Fluorine-containing compound used in the present invention, for example, system having R 1 is a silicon oxide units a monovalent organic group to include a reactive group, and R 1 is comprises silicon oxide units by a monovalent organic group of the perfluoropolyether group, also system may have a monovalent organic group comprising R 1 is a reactive group, and R 2 is alkoxy containing silicon by means a monovalent perfluoropolyether group of the organic group. Further, in the plural decane unit, R 1 , R 2 and X are independently, that is, the fluorine-containing compound of the present invention contains at least a decane unit having a reactive group and a decane unit having a perfluoropolyether group. It can also be a person having multiple decane units.

本發明中,此等的矽烷單元較佳為具有矽氧烷骨架之單元。亦即較佳為上述式(1)中X為氧原子。由於含氟化合物具有矽氧烷骨架,其與如上述之低折射率層所包含的微粒子之親和力變得良好,因而可以得到均勻一致且具有優異防污性的防污層,不易出現輕微白化。 In the present invention, these decane units are preferably units having a decane skeleton. That is, it is preferred that X in the above formula (1) is an oxygen atom. Since the fluorine-containing compound has a rhodium skeleton, the affinity with the fine particles contained in the low refractive index layer as described above becomes good, and thus an antifouling layer which is uniform and has excellent antifouling properties can be obtained, and slight whitening is less likely to occur.

含氟化合物的重量平均分子量(以GPC法測定之換算為聚乙烯的重量平均分子量)較佳為5,000以上,更佳為5,000~100,000,進一步更佳為5,000~50,000。含氟化合物的重量平均分子量只要在5,000以上就能得到優異的防污性,只要在100,000以下就能得到對有機溶劑的良好溶解性,而易於得到均勻一致的表面。 The weight average molecular weight of the fluorine-containing compound (the weight average molecular weight in terms of polyethylene measured by the GPC method) is preferably 5,000 or more, more preferably 5,000 to 100,000, still more preferably 5,000 to 50,000. When the weight average molecular weight of the fluorine-containing compound is 5,000 or more, excellent antifouling properties can be obtained, and if it is 100,000 or less, good solubility in an organic solvent can be obtained, and a uniform surface can be easily obtained.

作為反應性基,較佳可列舉具有(甲基)丙烯醯基、乙烯基等之乙烯性不飽和雙鍵基的反應性基、或環氧基、羧基、胺基、羥基等,此等之中又以具有(甲基)丙烯 醯基、乙烯基等之乙烯性不飽和雙鍵基的反應性基為較佳。若反應性基為上述之基,則能與低折射率層形成用組成物中的其它成分更輕易結合,因此可以形成如上述之低折射率層與防污層的黏著性更堅固之層,可以得到既薄又耐摩擦性優異的層而較佳。 The reactive group is preferably a reactive group having an ethylenically unsaturated double bond group such as a (meth)acryl fluorenyl group or a vinyl group, or an epoxy group, a carboxyl group, an amine group or a hydroxyl group. (meth) propylene A reactive group of an ethylenically unsaturated double bond group such as a mercapto group or a vinyl group is preferred. When the reactive group is the above-mentioned group, it can be more easily bonded to other components in the composition for forming a low refractive index layer, so that a layer having a stronger adhesion between the low refractive index layer and the antifouling layer as described above can be formed. A layer which is both thin and excellent in abrasion resistance can be obtained.

作為全氟聚醚基,例如較佳可列舉下述一般式(2)所表示者。 As the perfluoropolyether group, for example, those represented by the following general formula (2) are preferable.

式(2)中,a~e係0~50的整數,可相同亦可不同。a~d較佳為如使式(2)所表示的全氟聚醚基之重量平均分子量成為200~6000的範圍內之整數、e較佳為0~2。又,xa、xb、xc、及xd係1~4的整數,可相同亦可不同。xa、xb、xc、及xd為3及4時,-CxaF2xa、-CxbF2xb、-CxcF2xc、及-CxdF2xd可為直鏈狀亦可為分枝狀。 In the formula (2), a to e are integers of 0 to 50, which may be the same or different. a to d is preferably an integer in the range of the weight average molecular weight of the perfluoropolyether group represented by the formula (2) in the range of 200 to 6,000, and preferably e is 0 to 2. Further, xa, xb, xc, and xd are integers of 1 to 4, which may be the same or different. When xa, xb, xc, and xd are 3 and 4, -C xa F 2xa , -C xb F 2xb , -C xc F 2xc , and -C xd F 2xd may be linear or branched.

含氟化合物中之氟原子的含量較佳為5~80質量份,更佳為10~70質量份,進一步更佳為20~60質量份。若含氟化合物中之氟原子的含量為5質量份以上就能得到優異的防污性,若為80質量份以下就能得到對溶劑的良好溶解性,因此易於得到均勻一致的表面。 The content of the fluorine atom in the fluorine-containing compound is preferably from 5 to 80 parts by mass, more preferably from 10 to 70 parts by mass, still more preferably from 20 to 60 parts by mass. When the content of the fluorine atom in the fluorine-containing compound is 5 parts by mass or more, excellent antifouling properties can be obtained, and if it is 80 parts by mass or less, good solubility in a solvent can be obtained, and thus a uniform surface can be easily obtained.

含氟化合物的固體成分含量,係相對於低折射率層形成用組成物中之後述微粒子與黏結劑樹脂(使用含氟單體及含氟聚合物之情形則亦包含此等)的合計量(固體成分)100質量份,較佳為5~30質量份。此外,含氟化合物、微粒子、及黏結劑樹脂雖然能以市售品取得,然而 一般係以包含於溶劑中之形式販售。該情形的此等固體成分之量係由市售品的總量去除溶劑後之量。又例如光聚合起始劑雖為包含於組成物中的任意固體成分之一,計算含氟化合物之含量時並不計入。 The content of the solid content of the fluorine-containing compound is a total amount of the fine particles and the binder resin (including those in the case of using the fluorine-containing monomer and the fluorine-containing polymer) in the composition for forming the low-refractive-index layer. The solid content is 100 parts by mass, preferably 5 to 30 parts by mass. Further, although the fluorine-containing compound, the fine particles, and the binder resin can be obtained as a commercial product, It is generally sold in the form contained in a solvent. The amount of such solid components in this case is the amount after the solvent is removed from the total amount of the commercial product. Further, for example, the photopolymerization initiator is one of any solid components contained in the composition, and the content of the fluorine-containing compound is not counted.

若含氟化合物的含量為5質量份以上,則能以含氟化合物將表面全面以均勻一致的防污層覆蓋,不出現海島結構、亦不發生輕微白化。又,若為30質量份以下,則不會發生塗膜面不平坦、出現凹凸等之塗膜面的粗糙,可以得到均勻一致的防污層,還能不發生輕微白化、得到優異的耐摩擦性。亦即,藉由使含氟化合物的含量在上述之範圍內,可以得到平均面粗糙度(Ra’)為10nm以下之均勻一致、平滑的防污層。 When the content of the fluorine-containing compound is 5 parts by mass or more, the surface of the fluorine-containing compound can be uniformly covered with a uniform antifouling layer, and no island structure or slight whitening can occur. In addition, when the amount is 30 parts by mass or less, the coating film surface is not flat, and the surface of the coating film such as unevenness is not roughened, and a uniform antifouling layer can be obtained, and slight whitening can be prevented, and excellent rubbing resistance can be obtained. Sex. That is, by setting the content of the fluorine-containing compound within the above range, a uniform and smooth antifouling layer having an average surface roughness (Ra') of 10 nm or less can be obtained.

因與此相同理由,含氟化合物的含量更佳為5~20質量份、5~15質量份,作為最大含量10質量份係進一步更佳。藉由使最大含量為10質量份,可以進一步使後述的平均面粗糙度(Ra’)為5nm以下,而成為更平滑的表面且耐摩擦性亦良好。 For the same reason, the content of the fluorine-containing compound is more preferably 5 to 20 parts by mass and 5 to 15 parts by mass, and more preferably 10 parts by mass as the maximum content. By setting the maximum content to 10 parts by mass, the average surface roughness (Ra') to be described later can be further made 5 nm or less, and the surface becomes smoother and the abrasion resistance is also good.

(微粒子) (microparticles)

低折射率層形成用組成物含有微粒子。微粒子係為了降低層之折射率,亦即以提升抗反射特性之目的而使用者。 The composition for forming a low refractive index layer contains fine particles. The microparticles are intended to reduce the refractive index of the layer, that is, to enhance the antireflection properties.

作為微粒子,無論係無機系、有機系的任一者都可以無限制地使用,從更提升抗反射特性、並且確保良好的表面硬度之觀點來看,由材質的觀點而言較佳可列舉矽石微粒子、氟化鎂微粒子等,以形狀之觀點而言較佳 使用球狀、且其本身具有空隙的微粒子。又,在具有空隙之情形,亦可使用通常較黏結劑樹脂之硬化膜高折射率的氧化鋁微粒子。 As the fine particles, any of the inorganic or organic systems can be used without limitation, and from the viewpoint of improving the surface resistance and ensuring good surface hardness, it is preferable from the viewpoint of the material. Stone fine particles, magnesium fluoride fine particles, etc., preferably from the viewpoint of shape A microparticle having a spherical shape and having a void itself is used. Further, in the case of having a void, alumina fine particles having a high refractive index generally higher than that of the cured film of the binder resin may be used.

此等之中,由材質的觀點,若考慮對濕熱的耐久性等則矽石微粒子為較佳。本發明中,對形成如防污層被覆於低折射率層之全面而言,形成此等之層的材料之組合係為重要的條件之一。由於微粒子係在低折射率層的表面全面中以大致細密填充之狀態存在,該低折射率層之表面的性狀有受微粒子的影響之傾向。包含於低折射率層中之微粒子,與形成防污層之材料的親和力越高,防污層越能輕易地形成如覆蓋於該低折射率層之全面。這是因為,當防污相自低折射率相進行相分離時,該防污相係成為在低折射率相之表面全面具有浸潤性,且能保持浸潤性直到步驟(3)完成。從這種觀點來看,微粒子係將矽石作為材料的矽石微粒子,含氟化合物係矽烷單元,進一步為具有矽氧烷單元,亦即包含矽原子的含氟化合物之組合為特佳。 Among these, from the viewpoint of the material, it is preferable to consider the fine particles of the fine particles in consideration of durability against wet heat. In the present invention, the combination of the materials forming the layers such as the antifouling layer covering the low refractive index layer is one of the important conditions. Since the fine particles are present in a state of being substantially finely packed in the entire surface of the low refractive index layer, the properties of the surface of the low refractive index layer tend to be affected by the fine particles. The higher the affinity of the microparticles contained in the low refractive index layer with the material forming the antifouling layer, the easier the antifouling layer can be formed to cover the entire surface of the low refractive index layer. This is because when the antifouling phase is phase-separated from the low refractive index phase, the antifouling phase becomes fully wettable on the surface of the low refractive index phase, and the wettability can be maintained until the completion of the step (3). From this point of view, the fine particles are fine particles of vermiculite having a vermiculite as a material, a fluorine-containing compound-based decane unit, and further a combination of a fluorinated compound having a fluorinated atom unit, that is, a fluorinated compound containing a ruthenium atom.

其本身具有空隙的微粒子,由於在外部或內部具有微小的空隙,填充例如折射率1.0的空氣等之氣體,而具有其本身的折射率低之特徵。作為這種具有空隙的微粒子,可列舉無機系或有機系的多孔性微粒子、中空微粒子等,例如較佳可列舉多孔性矽石、中空矽石微粒子、或使用丙烯酸樹脂等之多孔性聚合物微粒子或中空聚合物微粒子。作為無機系的微粒子,可列舉採用日本特開2001-233611號公報所揭示之技術製備的具有空隙之矽 石微粒子作為較佳的例子;作為有機系的微粒子,可列舉採用日本特開2002-80503號公報所揭示之技術製備的中空聚合物微粒子等作為較佳的例子。 The fine particles having voids themselves have a small refractive index on the outside or inside, and are filled with a gas such as air having a refractive index of 1.0, and have a characteristic that their refractive index is low. Examples of such fine particles having voids include inorganic or organic porous fine particles and hollow fine particles. For example, porous vermiculite, hollow vermiculite fine particles, or porous polymer fine particles such as acrylic resin are preferably used. Or hollow polymer microparticles. Examples of the inorganic fine particles include voids prepared by the technique disclosed in JP-A-2001-233611. As a fine example of the fine particles of the organic type, hollow polymer fine particles prepared by the technique disclosed in Japanese Laid-Open Patent Publication No. 2002-80503, etc. are mentioned as a preferable example.

如上述之具有空隙的矽石、或者多孔性矽石,其折射率為1.20~1.44左右,從低折射率層之低折射率化的觀點來看,由於折射率低於折射率為1.45左右的一般矽石微粒子而較佳。 The vermiculite or porous vermiculite having a void as described above has a refractive index of about 1.20 to 1.44. From the viewpoint of the low refractive index of the low refractive index layer, the refractive index is lower than the refractive index of about 1.45. Generally, fine particles of vermiculite are preferred.

此外,作為微粒子,較佳亦可列舉藉由其形態、結構、凝聚狀態、於膜內部的分散狀態,而可在內部及/或表面的至少一部分形成奈米多孔性結構的微粒子。 Further, as the fine particles, fine particles having a nanoporous structure can be formed in at least a part of the inside and/or the surface by the form, structure, aggregation state, and dispersion state inside the film.

作為這種微粒子,可列舉上述的矽石微粒子,或者將提升比表面積作為目的而製造,在填充用管柱及表面的多孔性部分吸收各種化學物質的除放材料、使用於觸媒固定用的多孔性微粒子、或者是將用於隔熱材料或低介電材料作為目的之中空微粒子的分散體或凝聚體等。作為具體的例子,例如可列舉「NIPSIL(商品名)」、「NIPGEL(商品名)」:日本矽石工業股份有限公司製;或者「COLLOID SILICA UP系列(商品名)」:日產化學工業股份有限公司等。 Examples of such fine particles include the above-described vermiculite fine particles, or a purpose of producing a lifting specific surface area, and a material for absorbing various chemical substances in the porous portion of the filling column and the surface, and used for fixing the catalyst. The porous fine particles or a dispersion or agglomerate of hollow fine particles for the purpose of using a heat insulating material or a low dielectric material. Specific examples include "NIPSIL (product name)" and "NIPGEL (product name)": manufactured by Japan Shishi Industrial Co., Ltd.; or "COLLOID SILICA UP series (trade name)": Nissan Chemical Industry Co., Ltd. Company, etc.

微粒子的一次粒子之平均粒徑較佳為5~200nm,更佳為5~100nm,進一步更佳為10~80nm。若微粒子的平均粒徑為5nm以上,可以得到優異的折射率下降效果,若為200nm以下,則可以無損於低折射率層3的透明性,得到良好的微粒子之分散狀態。此外,本發明中只要平均粒徑在上述範圍內,微粒子相連形成鏈狀亦可。在此 ,微粒子的一次粒子之平均粒徑,係將抗反射薄膜剖面利用穿透式電子顯微鏡(TEM),進行任意三視野分之觀察,在照片上實際測量存在於該剖面的任意20個粒子(三視野分合計60個粒子)之直徑,作為平均粒徑。 The average particle diameter of the primary particles of the fine particles is preferably from 5 to 200 nm, more preferably from 5 to 100 nm, still more preferably from 10 to 80 nm. When the average particle diameter of the fine particles is 5 nm or more, an excellent refractive index lowering effect can be obtained, and if it is 200 nm or less, the transparency of the low refractive index layer 3 can be prevented, and a fine dispersion state of fine particles can be obtained. Further, in the present invention, as long as the average particle diameter is within the above range, the fine particles may be connected to form a chain. here The average particle size of the primary particles of the microparticles is obtained by observing any three fields of view by using a transmission electron microscope (TEM) on the cross section of the antireflection film, and actually measuring any 20 particles existing in the profile on the photograph (three The diameter of the field of view is 60 particles in total, as the average particle diameter.

此外,於本發明所使用的微粒子,較佳為經表面處理者。作為表面處理,較佳可列舉使用矽烷偶合劑的表面處理,其中又以使用具有(甲基)丙烯醯基之矽烷偶合劑的表面處理為較佳。藉由對微粒子施行表面處理,提升與後述的黏結劑樹脂之親和力,微粒子之分散變得均勻,難以發生微粒子彼此之間的凝聚,因此可以抑制由於大粒子化的低折射率層之透明化下降,或低折射率層形成用組成物的塗布性、該組成物的塗膜強度之下降。此外,在矽烷偶合劑具有(甲基)丙烯醯基之情形,由於該矽烷偶合劑具有游離輻射硬化性,容易與後述的黏結劑樹脂反應,因此在低折射率層形成用組成物的塗膜中,微粒子被黏結劑樹脂固定。亦即,微粒子在黏結劑樹脂中成為具有作為交聯劑的功能。藉此,可以得到該塗膜全體的緊緻效果,黏結劑樹脂可保留原有的柔軟性,而對低折射率層賦予優異的表面硬度。因此,低折射率層藉由活用其本身的柔軟性來變形,而具有對外部衝擊的吸收力或復原力,因而可以抑制傷痕的發生,成為具有優異耐摩擦性之高表面硬度者。 Further, the fine particles used in the present invention are preferably surface treated. As the surface treatment, a surface treatment using a decane coupling agent is preferred, and a surface treatment using a decane coupling agent having a (meth) acrylonitrile group is preferred. By subjecting the fine particles to a surface treatment, the affinity with the binder resin to be described later is enhanced, the dispersion of the fine particles is uniform, and aggregation of the fine particles is less likely to occur, so that the transparency of the low refractive index layer due to the large particle size can be suppressed from being lowered. The coating property of the composition for forming a low refractive index layer or the decrease in the coating film strength of the composition. Further, in the case where the decane coupling agent has a (meth) acrylonitrile group, since the decane coupling agent has free radiation curability and is easily reacted with a binder resin to be described later, the coating film for the composition for forming a low refractive index layer The fine particles are fixed by the binder resin. That is, the fine particles have a function as a crosslinking agent in the binder resin. Thereby, the compact effect of the entire coating film can be obtained, and the adhesive resin can retain the original softness and impart excellent surface hardness to the low refractive index layer. Therefore, the low refractive index layer is deformed by utilizing its own flexibility, and has an absorption force or a restoring force against an external impact, thereby suppressing the occurrence of scratches and becoming a high surface hardness having excellent abrasion resistance.

作為本發明中較佳使用的矽烷偶合劑,可舉例3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二甲氧 基矽烷、3-(甲基)丙烯醯氧基丙基甲基二乙氧基矽烷、2-(甲基)丙烯醯氧基丙基三甲氧基矽烷、2-(甲基)丙烯醯氧基丙基三乙氧基矽烷等。 As the decane coupling agent preferably used in the present invention, 3-(meth)acryloxypropyltrimethoxydecane, 3-(meth)acryloxypropyltriethoxydecane, 3 -(methyl)acryloxypropylmethyldimethoxy Base decane, 3-(meth) propylene methoxy propyl methyl diethoxy decane, 2-(methyl) propylene methoxy propyl trimethoxy decane, 2-(methyl) propylene decyloxy Propyltriethoxydecane, and the like.

低折射率層中微粒子的含量,較佳為10~95質量%,更佳為20~90質量%,進一步更佳為30~90質量%。在此,低折射率層中微粒子的含量,係與低折射率層用組成物的總固體成分,亦即除了含氟化合物、微粒子、及黏結劑樹脂以外,再加上任意使用的含氟聚合物、含氟單體、或聚合起始劑等之添加劑的合計量(該組成物中所包含的溶劑以外之所有化合物的合計量)中之微粒子的含量為相同意義。若微粒子的含量為10質量%以上,可以充分得到使用上述微粒子之效果,若為95%以下,則可以降低防污層的平均面粗糙度(Ra’),還能夠以樹脂將微粒子彼此的縫隙間良好地填平,得到優異的表面硬度。 The content of the fine particles in the low refractive index layer is preferably from 10 to 95% by mass, more preferably from 20 to 90% by mass, still more preferably from 30 to 90% by mass. Here, the content of the fine particles in the low refractive index layer is the total solid content of the composition for the low refractive index layer, that is, in addition to the fluorine-containing compound, the fine particles, and the binder resin, and arbitrarily used fluorine-containing polymerization. The content of the fine particles in the total amount of the additives, the fluorine-containing monomer, or the polymerization initiator or the like (the total amount of all the compounds other than the solvent contained in the composition) is the same. When the content of the fine particles is 10% by mass or more, the effect of using the fine particles can be sufficiently obtained, and if it is 95% or less, the average surface roughness (Ra') of the antifouling layer can be lowered, and the gap between the fine particles can be made by the resin. Well filled well to obtain excellent surface hardness.

此外,本發明中以提升耐摩擦性為目的,同時可以使用不具有空隙的實心微粒子。該實心微粒子的一次粒子之平均粒徑較佳為1~200nm,更佳為1~100nm,進一步更佳為5~20nm。若為1nm以下則對提升表面硬度的貢獻小,若為200nm以上則損及低折射率層的透明性,難以得到良好的微粒子分散狀態。 Further, in the present invention, for the purpose of improving the rubbing resistance, solid fine particles having no voids can be used at the same time. The average particle diameter of the primary particles of the solid fine particles is preferably from 1 to 200 nm, more preferably from 1 to 100 nm, still more preferably from 5 to 20 nm. When it is 1 nm or less, the contribution to the surface hardness is small, and if it is 200 nm or more, the transparency of the low refractive index layer is impaired, and it is difficult to obtain a good dispersion state of fine particles.

實心粒子的含量只要因應低折射率層所要求的耐摩擦性、折射率等,適宜調節即可。例如相對於低折射率層用組成物的總固體成分之合計質量,較佳為1~30質量%,更佳為5~20質量%。 The content of the solid particles may be appropriately adjusted in accordance with the friction resistance, the refractive index, and the like required for the low refractive index layer. For example, the total mass of the total solid content of the composition for the low refractive index layer is preferably from 1 to 30% by mass, more preferably from 5 to 20% by mass.

從耐摩擦性‧透明性之觀點來看,理想為與上述具有空隙之微粒子同樣地進行表面處理。 From the viewpoint of abrasion resistance and transparency, it is preferred to carry out surface treatment in the same manner as the above-mentioned fine particles having voids.

作為實心粒子,可以使用以往周知使用於抗反射薄膜或硬塗薄膜等的實心粒子。作為市售品,例如較佳可列舉日產化學工業(股)製的商品名MIBK-ST(平均一次粒徑:12nm)及MIBK-ST-ZL(平均一次粒徑:88nm),或者日揮觸媒化成工業(股)製的商品名OSCAL系列(平均一次粒徑:7~100nm)等。 As the solid particles, solid particles conventionally known for use in an antireflection film or a hard coat film can be used. As a commercial item, for example, MIBK-ST (average primary particle diameter: 12 nm) and MIBK-ST-ZL (average primary particle diameter: 88 nm) manufactured by Nissan Chemical Industries Co., Ltd., or a daily catalyst are preferably used. The product name OSCAL series (average primary particle diameter: 7 to 100 nm) manufactured by Chemical Industries Co., Ltd.

(黏結劑樹脂) (adhesive resin)

從成膜性和膜強度等之觀點來看,低折射率層形成用組成物含有黏結劑樹脂。作為黏結劑樹脂,較佳可列舉可藉由使上述含氟化合物、微粒子為首,因應需要而添加的其它成分等在低折射率層的層中,以加熱或照射紫外線、電子束等之游離輻射而硬化,而固定化之樹脂。此外,本發明中,較佳為可使上述含氟化合物有效率地相分離,而得到完全覆蓋低折射率層之防污層,與該含氟化合物之互溶性低的樹脂。 The composition for forming a low refractive index layer contains a binder resin from the viewpoints of film formability, film strength, and the like. The binder resin is preferably one in which the fluorine-containing compound or the fine particles are used as the first component, and other components added as needed, in the layer of the low refractive index layer, to heat or irradiate the ultraviolet radiation, the electron beam, or the like. And hardened, and the resin is fixed. Further, in the present invention, it is preferred that the fluorine-containing compound be efficiently phase-separated to obtain an antifouling layer which completely covers the low refractive index layer, and a resin having low miscibility with the fluorine-containing compound.

更具體而言,作為黏結劑樹脂,例如較佳可列舉三聚氰胺系、尿素系、環氧系、酮系、酞酸二烯丙酯系、不飽和聚酯系、及酚系等之熱硬化性樹脂、或游離輻射硬化性樹脂。其中,又以游離輻射硬化性樹脂為較佳。 More specifically, examples of the binder resin include thermosetting properties such as melamine-based, urea-based, epoxy-based, ketone-based, diallyl phthalate-based, unsaturated polyester-based, and phenolic resins. Resin, or free radiation curable resin. Among them, a free radiation curable resin is preferred.

游離輻射硬化性樹脂係在電磁波或帶電粒子束中,具有可使分子聚合的能量量子者,亦即藉由照射紫外線或電子束等而硬化的樹脂。具體而言,可以自以往作為游離輻射硬化性之樹脂而慣用的聚合性單體及聚合性低 聚物(乃至於預聚物)之中適宜選擇而使用。 The epitaxial radiation-curable resin is an energy quantum which can polymerize a molecule in an electromagnetic wave or a charged particle beam, that is, a resin which is cured by irradiation of ultraviolet rays or electron beams. Specifically, it is a polymerizable monomer which is conventionally used as a free radiation curable resin and has low polymerizability. The polymer (or even the prepolymer) is suitably selected and used.

作為聚合性單體,適合為分子中具有自由基聚合性不飽和基的(甲基)丙烯酸酯單體,其中又以多官能性(甲基)丙烯酸酯單體為較佳。 The polymerizable monomer is preferably a (meth) acrylate monomer having a radical polymerizable unsaturated group in the molecule, and a polyfunctional (meth) acrylate monomer is preferable.

作為多官能性(甲基)丙烯酸酯單體,只要係分子內具有2個以上乙烯性不飽和鍵的(甲基)丙烯酸酯單體即可,並無特定限制。具體而言可較佳列舉乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、新戊四醇二(甲基)丙烯酸酯單硬脂酸酯、二環戊烯二(甲基)丙烯酸酯、異三聚氰酸酯二(甲基)丙烯酸酯等之2官能的(甲基)丙烯酸酯;三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、三聚異氰酸參(丙烯醯氧基乙基)酯等之3官能的(甲基)丙烯酸酯;新戊四醇四(甲基)丙烯酸酯、二新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯等之4官能以上的(甲基)丙烯酸酯;上述多官能性(甲基)丙烯酸酯單體的環氧乙烷變性品、己內酯變性品、丙酸變性品等。 The polyfunctional (meth) acrylate monomer is not particularly limited as long as it is a (meth) acrylate monomer having two or more ethylenically unsaturated bonds in the molecule. Specifically, ethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, pentaerythritol di(meth)acrylate monostearate, dicyclopentene di a bifunctional (meth) acrylate such as methyl acrylate or isomeric cyanurate di(meth) acrylate; trimethylolpropane tri (meth) acrylate or neopentyl alcohol III ( 3-functional (meth) acrylate such as methyl acrylate, trimeric isocyanate (propylene oxyethyl) ester; neopentyl alcohol tetra (meth) acrylate, dipentaerythritol a tetrafunctional or higher (meth) acrylate such as tetrakis(meth)acrylate, dipentaerythritol penta(meth)acrylate or dipentaerythritol hexa(meth)acrylate; the above polyfunctionality An ethylene oxide denatured product of a (meth) acrylate monomer, a caprolactone denatured product, a propionic acid denatured product, or the like.

此等之中,從可以得到優異耐摩擦性的觀點來看,又以3官能以上的(甲基)丙烯酸酯為較佳。此等的多官能性(甲基)丙烯酸酯單體可以單獨使用1種,亦可以組合2種以上使用。更具體而言,可以理想地得到本發明中防污性、耐摩擦性(黏著性)、防輕微白化性等目的之效果者,較佳為三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、三聚異氰酸參(丙烯醯氧基乙基)酯等之3官能的(甲基)丙烯酸酯;新戊四醇四(甲基)丙烯酸酯 、二新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯等之4官能以上的(甲基)丙烯酸酯,特佳為新戊四醇三(甲基)丙烯酸酯。 Among these, from the viewpoint of obtaining excellent rubbing resistance, a trifunctional or higher functional (meth) acrylate is preferable. These polyfunctional (meth) acrylate monomers may be used alone or in combination of two or more. More specifically, it is preferable to obtain the effects of the antifouling property, the rubbing resistance (adhesiveness), the slight whitening property, and the like in the present invention, and it is preferably trimethylolpropane tri(meth)acrylate. a trifunctional (meth) acrylate such as pentaerythritol tri(meth) acrylate or trimeric isocyanate (propylene oxyethyl) ester; pentaerythritol tetra (meth) acrylate a tetrafunctional or higher (meth)acrylic acid such as dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate or dipentaerythritol hexa(meth)acrylate The ester is particularly preferably pentaerythritol tri(meth)acrylate.

本發明中,在使用上述多官能性(甲基)丙烯酸酯單體的同時,以降低其黏度等為目的,可以在無損於本發明之目的之範圍,適宜併用單官能性(甲基)丙烯酸酯單體。此外,為了藉由增加黏度的適當調整塗布與為了防止由於硬化收縮的捲曲,可使用下述的聚合性低聚物或聚合物。 In the present invention, in order to reduce the viscosity thereof and the like while using the above-mentioned polyfunctional (meth) acrylate monomer, it is possible to suitably use a monofunctional (meth)acrylic acid in the range which does not impair the object of the present invention. Ester monomer. Further, in order to apply coating by appropriately adjusting the viscosity and to prevent curling due to hardening shrinkage, the following polymerizable oligomer or polymer can be used.

以下,作為聚合性低聚物,可列舉分子中具有自由基聚合性不飽和基的低聚物,例如環氧(甲基)丙烯酸酯系、胺基甲酸酯(甲基)丙烯酸酯系、聚酯(甲基)丙烯酸酯系、聚醚(甲基)丙烯酸酯系的低聚物等。 In the following, examples of the polymerizable oligomer include oligomers having a radical polymerizable unsaturated group in the molecule, and examples thereof include an epoxy (meth) acrylate type and a urethane (meth) acrylate type. A polyester (meth) acrylate type, a polyether (meth) acrylate type oligomer, or the like.

此外,本發明中亦可使用例如預先聚合甲基丙烯酸甲酯與甲基丙烯酸環氧丙酯得到共聚物,接著使該共聚物的環氧丙基與甲基丙烯酸或丙烯酸的羧基縮合而得到的反應性聚合物。這種反應性聚合物可以作為市售品取得,作為市售品例如可列舉「MACROMONOMER(商品名)」:東亞合成股份有限公司製等。 Further, in the present invention, for example, a copolymer obtained by previously polymerizing methyl methacrylate and glycidyl methacrylate to obtain a copolymer, followed by condensing a glycidyl group of the copolymer with a carboxyl group of methacrylic acid or acrylic acid may be used. Reactive polymer. Such a reactive polymer can be obtained as a commercial product, and examples of the commercially available product include "MACROMONOMER (trade name)": manufactured by Toagosei Co., Ltd., and the like.

本發明中,可較佳使用紫外線硬化性樹脂或電子束硬化性樹脂作為游離輻射硬化性樹脂。 In the present invention, an ultraviolet curable resin or an electron beam curable resin can be preferably used as the free radiation curable resin.

使用紫外線硬化性樹脂作為游離輻射硬化性樹脂之情形,相對於100質量份的該紫外線硬化性樹脂,較佳為添加0.5~10質量份左右的光聚合起始劑,更佳為添加1~5質量份。作為光聚合起始劑,可自以往慣用者中適宜 選擇,沒有特別限定,例如,相對於分子中具有自由基聚合性不飽和基的聚合性單體或聚合性低聚物,可列舉苯乙酮系、二苯基酮系、安息香系、縮酮系、蒽醌系、二硫化物系、噻噸酮系、硫蘭系(thiram)、氟胺系等之光聚合起始劑。此等可以任何一者單獨,或組合兩者而使用。此等的光聚合起始劑可以作為市售品取得,例如列舉「IRGACURE 184(商品名)」、「IRGACURE 907(商品名)」「IRGACURE 127(商品名)」(均為Ciba SpecialtyChemicals(股)製)等。 In the case of using an ultraviolet curable resin as the free radiation curable resin, it is preferred to add a photopolymerization initiator of about 0.5 to 10 parts by mass, more preferably 1 to 5, per 100 parts by mass of the ultraviolet curable resin. Parts by mass. As a photopolymerization initiator, it can be suitable from the past The polymerizable monomer or polymerizable oligomer having a radical polymerizable unsaturated group in the molecule is exemplified by an acetophenone type, a diphenyl ketone type, a benzoin system, and a ketal. Photopolymerization initiators such as lanthanum, lanthanide, disulfide, thioxanthone, thiram, and fluoroamine. These may be used alone or in combination. These photopolymerization initiators can be obtained as commercially available products, for example, "IRGACURE 184 (product name)", "IRGACURE 907 (product name)" and "IRGACURE 127 (product name)" (both Ciba Specialty Chemicals) System) and so on.

黏結劑樹脂的含量,相對於低折射率層形成用組成物中之總固體成分100質量份,較佳為0.5~20質量份,更佳為1~15質量份。若黏結劑樹脂的含量在上述範圍內,可以得到優異的耐摩擦性,使含氟化合物有效率地相分離。 The content of the binder resin is preferably 0.5 to 20 parts by mass, more preferably 1 to 15 parts by mass, per 100 parts by mass of the total solid content in the composition for forming a low refractive index layer. When the content of the binder resin is within the above range, excellent rubbing resistance can be obtained, and the fluorine-containing compound can be phase-separated efficiently.

(含氟聚合物) (fluoropolymer)

本發明所使用的低折射率層形成用組成物,從降低折射率的觀點來看,較佳為包含含氟聚合物。作為含氟聚合物,例如較佳可列舉(甲基)丙烯酸的部分及完全氟化烷基、烯基、芳香基酯類、完全或部分氟化乙烯醚類、完全或部分氟化乙烯酯類、完全或部分氟化乙烯酮類等。 The composition for forming a low refractive index layer used in the present invention preferably contains a fluorine-containing polymer from the viewpoint of lowering the refractive index. As the fluoropolymer, for example, a (meth)acrylic acid moiety and a fully fluorinated alkyl group, an alkenyl group, an aryl ester, a wholly or partially fluorinated vinyl ether, or a wholly or partially fluorinated vinyl ester may be mentioned. , wholly or partially fluorinated ketenes, etc.

此外,作為含氟聚合物,較佳為除了氟以外還包含矽者,例如較佳可列舉共聚物中含有聚矽氧成分的含有聚矽氧之偏二氟乙烯共聚物。作為此情形的聚矽氧成分,可列舉(聚)二甲基矽氧烷、(聚)二乙基矽氧烷、(聚)二 苯基矽氧烷、(聚)甲基苯基矽氧烷、烷基變性(聚)二甲基矽氧烷、含有偶氮基之(聚)二甲基矽氧烷、或二甲基聚矽氧、苯基甲基聚矽氧、烷基‧芳烷基變性聚矽氧、氟聚矽氧、聚醚變性聚矽氧、脂肪酸酯變性聚矽氧、甲基氫聚矽氧、含有矽烷醇基之聚矽氧、含有烷氧基之聚矽氧、含有酚基之聚矽氧、甲基丙烯醯基變性聚矽氧、丙烯醯基變性聚矽氧、胺基變性聚矽氧、羧酸變性聚矽氧、甲醇變性聚矽氧、環氧變性聚矽氧、巰基變性聚矽氧、氟變性聚矽氧、聚醚變性聚矽氧等。其中又以具有二甲基矽氧烷結構者為較佳。 Further, as the fluoropolymer, it is preferable to contain a fluorene-containing polymer, and for example, a polyfluorene-containing vinylidene fluoride copolymer containing a polyfluorene-containing component in the copolymer is preferable. Examples of the polyfluorene oxygen component in this case include (poly)dimethyloxane, (poly)diethyloxane, and (poly)di. Phenyl oxirane, (poly)methylphenyl decane, alkyl denatured (poly) dimethyl oxane, azo containing (poly) dimethyl oxane, or dimethyl poly Oxygen, phenylmethyl polyoxo, alkyl ‧ aralkyl denic polyoxyl, fluoropolyoxyl, polyether modified polyoxyl, fatty acid ester denatured polyoxyl, methyl hydrogen polyoxyl, containing a stanol-based polyoxygen, an alkoxy-containing polyoxygen, a phenol-based polyoxygen, a methacryl-based polyphosphoric acid, an acryl-based polyphosphoric acid, an amine-modified polyoxygen, Carboxylic acid-denatured polyoxo, methanol-denatured polyoxygen, epoxy-denatured polyoxygen, sulfhydryl-denatured polyoxygen, fluorine-denatured polyoxyl, polyether-denatured polyoxyl, and the like. Among them, those having a structure of dimethyloxane are preferred.

此外,除了上述以外,亦可使用分子中至少具有1個異氰酸基及氟的化合物,與分子中至少具有1個胺基、羥基、羧基等之與異氰酸基反應的官能基之化合物反應所得之化合物;含氟聚醚多元醇、含氟烷基多元醇、含氟聚酯多元醇、含氟ε-己內酯變性多元醇等之含氟多元醇,與具有異氰酸基的化合物反應所得之化合物等作為含氟聚合物。 Further, in addition to the above, a compound having at least one isocyanate group and fluorine in the molecule and a compound having at least one functional group reactive with an isocyanate group such as an amine group, a hydroxyl group or a carboxyl group in the molecule may be used. a compound obtained by the reaction; a fluorine-containing polyhydric alcohol, a fluorine-containing polyether polyol, a fluorine-containing polyester polyol, a fluorine-containing ε-caprolactone denatured polyol, or the like, and a fluorine-containing polyol having an isocyanate group; The compound obtained by the reaction of the compound or the like is used as a fluoropolymer.

含氟聚合物之折射率較佳為1.37~1.45。若該折射率為1.37以上,由於可得到對溶劑的良好溶解性,因此處理容易。又若為1.45以下,則可使形成的低折射率層之折射率減少至所期望的範圍。 The refractive index of the fluoropolymer is preferably from 1.37 to 1.45. When the refractive index is 1.37 or more, since the solvent is excellent in solubility, handling is easy. Further, if it is 1.45 or less, the refractive index of the formed low refractive index layer can be reduced to a desired range.

這種含氟聚合物可以作為市售品取得,例如較佳可列舉JSR公司製的OPSTAR TU2181-6、OPSTAR TU2181-7、OPSTAR TU2202、OPSTAR JN35、OPSTAR TU2224,DAIKIN工業公司製的OPTOOL AR110、OPTOOL AR100 等。 Such a fluoropolymer can be obtained as a commercial product. For example, OPSTAR TU2181-6, OPSTAR TU2181-7, OPSTAR TU2202, OPSTAR JN35, OPSTAR TU2224, manufactured by JSR Corporation, OPTOOL AR110, OPTOOL manufactured by DAIKIN Industries Co., Ltd. are preferable. AR100 Wait.

含氟聚合物的含量,相對於低折射率層形成用組成物中之總固體成分100質量份,較佳為1~30質量份,更佳為5~25質量份。若含氟聚合物的含量在上述範圍內,可以有效率地降低折射率。 The content of the fluoropolymer is preferably from 1 to 30 parts by mass, more preferably from 5 to 25 parts by mass, per 100 parts by mass of the total solid content in the composition for forming a low refractive index layer. If the content of the fluoropolymer is within the above range, the refractive index can be efficiently lowered.

(含氟單體) (fluorinated monomer)

本發明所使用的低折射率層形成用組成物,從降低折射率的觀點來看,較佳為包含含氟單體。含氟單體從有效率地硬化形成低折射率層、且可得到優異硬度的觀點來看,較佳為1分子中具有2個以上反應性官能基。作為這種含氟單體,較佳可列舉具有新戊四醇骨架的含氟單體、具有二新戊四醇骨架的含氟單體、具有三羥甲基丙烷骨架的含氟單體、具有環己基骨架的含氟單體、具有直鏈狀骨架的含氟單體等。此等之中,又以具有新戊四醇骨架的化合物為較佳。 The composition for forming a low refractive index layer used in the present invention preferably contains a fluorine-containing monomer from the viewpoint of lowering the refractive index. From the viewpoint of efficiently curing the low refractive index layer and obtaining excellent hardness, the fluorine-containing monomer preferably has two or more reactive functional groups in one molecule. Preferred examples of such a fluorine-containing monomer include a fluorine-containing monomer having a pentaerythritol skeleton, a fluorine-containing monomer having a dipentaerythritol skeleton, and a fluorine-containing monomer having a trimethylolpropane skeleton. A fluorine-containing monomer having a cyclohexyl skeleton, a fluorine-containing monomer having a linear skeleton, or the like. Among these, a compound having a neopentyl alcohol skeleton is preferred.

含氟單體之折射率較佳為1.35~1.48,更佳為1.37~1.45。由於若含氟單體的折射率為1.35以上,則可以得到對溶劑的良好溶解性,而處理容易。又若為1.48以下,則可使形成的低折射率層之折射率減少至所期望的範圍。 The refractive index of the fluorine-containing monomer is preferably from 1.35 to 1.48, more preferably from 1.37 to 1.45. When the refractive index of the fluorine-containing monomer is 1.35 or more, good solubility in a solvent can be obtained, and handling is easy. Further, if it is 1.48 or less, the refractive index of the formed low refractive index layer can be reduced to a desired range.

這種含氟單體可以作為市售品取得,例如較佳可列舉共榮社化學股份有限公司製的具有新戊四醇骨架之LINC 3A、具有環己基骨架之LINC 102A等之LINC系列等。 Such a fluorine-containing monomer can be obtained as a commercial product, and examples thereof include LINC 3A having a pentaerythritol skeleton manufactured by Kyoei Chemical Co., Ltd., LINC 3A having a cyclohexyl skeleton, and the like.

含氟單體的含量,相對於低折射率層形成用組成物 中之總固體成分100質量份,較佳為1~30質量份,更佳為3~20質量份。若含氟單體的含量在上述範圍內,可以有效率地降低折射率。 The content of the fluorine-containing monomer relative to the composition for forming the low refractive index layer The total solid content is 100 parts by mass, preferably 1 to 30 parts by mass, more preferably 3 to 20 parts by mass. If the content of the fluorine-containing monomer is within the above range, the refractive index can be efficiently lowered.

(各種添加劑) (various additives)

本發明所使用的低折射率層形成用組成物,可因應所期望的物性,摻合各種添加劑。作為添加劑、例如較佳可列舉耐候性改良劑、耐摩耗性提升劑、聚合抑制劑、交聯劑、紅外線吸收劑、接著性提升劑、抗氧化劑、均平劑、搖變性賦予劑、偶合劑、塑化劑、除泡劑、填充劑、溶劑等。 The composition for forming a low refractive index layer used in the present invention can be blended with various additives in accordance with desired physical properties. Examples of the additive include a weather resistance improver, an abrasion resistance enhancer, a polymerization inhibitor, a crosslinking agent, an infrared absorber, an adhesion promoter, an antioxidant, a leveling agent, a shake imparting agent, and a coupling agent. , plasticizer, defoamer, filler, solvent, etc.

(溶劑) (solvent)

此外,作為在低折射率層形成用組成物中較佳使用的溶劑,沒有特別限定,惟例如較佳可列舉甲醇、乙醇、異丙醇(IPA)等之醇類;甲基乙基酮、甲基異丁基酮、環己酮等之酮類;酢酸乙酯、酢酸丁酯等之酯類;鹵化烴類;甲苯、二甲苯等之芳香族烴類;丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、二丙二醇單乙基醚等之二醇醚類,或者此等的混合物等。此等之中,又以與含氟化合物親和力高的酮類、二醇醚類為較佳,特別較佳的溶劑係甲基乙基酮、甲基異丁基酮、丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯。藉由單獨或混合使用此等,可以維持組成物中之各化合物的分散性,並且可以在相分離步驟(2)中理想地完成低折射率相與防污相的相分離。 Further, the solvent to be preferably used in the composition for forming a low refractive index layer is not particularly limited, and preferably, for example, an alcohol such as methanol, ethanol or isopropyl alcohol (IPA); methyl ethyl ketone; a ketone such as methyl isobutyl ketone or cyclohexanone; an ester of ethyl decanoate or butyl phthalate; a halogenated hydrocarbon; an aromatic hydrocarbon such as toluene or xylene; propylene glycol monomethyl ether and propylene glycol A glycol ether such as ethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate or dipropylene glycol monoethyl ether, or a mixture thereof. Among these, ketones and glycol ethers having high affinity with a fluorine-containing compound are preferred, and particularly preferred solvents are methyl ethyl ketone, methyl isobutyl ketone, and propylene glycol monomethyl ether. Propylene glycol monoethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate. The dispersibility of each compound in the composition can be maintained by using these or the like alone or in combination, and phase separation of the low refractive index phase from the antifouling phase can be desirably completed in the phase separation step (2).

此外,使用酮類或二醇醚類以外的溶劑之情形,較佳係含有酮類或二醇醚類為全溶劑量之至少50%以上、較佳為70%以上。尤其係使用酮類之情形,由於低折射率層形成用組成物的塗布性提升,且因該組成物之塗布後的溶劑蒸發速度為適度而不易發生乾燥不均,又可以伴隨溶劑的蒸發,有效率地相分離含氟化合物,而可以輕易地得到均勻一致的大面積塗膜(防污層)。 Further, in the case of using a solvent other than a ketone or a glycol ether, it is preferred to contain at least 50% or more, preferably 70% or more of the total amount of the ketone or the glycol ether. In particular, in the case of using a ketone, the coating property of the composition for forming a low refractive index layer is improved, and since the evaporation rate of the solvent after application of the composition is moderate, drying unevenness is unlikely to occur, and evaporation of the solvent may be accompanied. The fluorine-containing compound is efficiently phase-separated, and a uniform large-area coating film (antifouling layer) can be easily obtained.

溶劑的量係適宜調整為可以均勻溶解、分散各成分,在組成物製備後的保存時不凝聚,且塗布時不會過於稀薄的濃度。低折射率層形成用組成物中之溶劑的含量較佳為50~99.5質量%,較佳為定為70~98質量%。藉由定為這種含量,可以得到尤其是分散安定性優異,並且適合長期保存的組成物。此外,使用於低折射率層形成用組成物的溶劑,由於在塗布該組成物後藉由所進行的乾燥或硬化而蒸發,而幾乎不存在於低折射率層中。 The amount of the solvent is suitably adjusted so that the components can be uniformly dissolved and dispersed, and the concentration is not excessively concentrated at the time of storage after the preparation of the composition, and the coating is not too thin. The content of the solvent in the composition for forming a low refractive index layer is preferably from 50 to 99.5% by mass, and more preferably from 70 to 98% by mass. By setting it as such a content, it is possible to obtain a composition which is excellent in dispersion stability and is suitable for long-term storage. Further, the solvent used for the composition for forming a low refractive index layer is hardly evaporated by drying or hardening after the composition is applied, and is hardly present in the low refractive index layer.

(步驟(2)) (Step (2))

步驟(2)係使在上述步驟(1)形成的塗膜相分離成低折射率相與防污相之步驟。作為促進相分離的方法,例如較佳可列舉使塗膜在空氣中加熱的方法、保持在蒸氣中或高壓釜內等的方法等之加熱方法。此外,亦可不進行加熱等,單純放置直到相分離。 The step (2) is a step of separating the coating film formed in the above step (1) into a low refractive index phase and an antifouling phase. As a method of promoting phase separation, for example, a method of heating a coating film in air, a method of holding it in a vapor or an autoclave, or the like is preferably used. Further, it is also possible to simply place it until the phase is separated without heating or the like.

本發明中,在塗布低折射率層形成用組成物之後,且使該組成物中的黏結劑樹脂硬化之前,在此步驟藉由如上述的加熱、或者單純放置,該組成物中的含氟化合物會變得容易浮出於塗膜的最表面側(與透明基材為相 反側)。其結果係在低折射率層形成用組成物的塗膜中,相分離成含氟化合物的含量相對多而表現防污性之防污相,與含氟化合物的含量相對少而表現低折射率性之低折射率相,並且藉由加熱、或者照射游離輻射在最表面側形成的防污相,形成如覆蓋低折射率層之全面的防污層,而可以得到優異的防污性。亦即,本發明中若塗布低折射率層形成用組成物而形成塗膜,就在該塗膜內分離成兩個相,該塗膜具有低折射率相與防污相,藉由經過後述的步驟(3),兩相各自形成低折射率層與防污層,進一步換言之,亦可說是形成具有防污層的低折射率層。 In the present invention, after the composition for forming a low refractive index layer is applied, and before the binder resin in the composition is cured, the fluorine in the composition is heated in this step or simply placed in this step. The compound will easily float on the most surface side of the coating film (phase with the transparent substrate) Reverse side). As a result, in the coating film of the composition for forming a low refractive index layer, the antifouling phase which exhibits an antifouling property with a relatively large content of the fluorine-containing compound is phase-separated, and the content of the fluorine-containing compound is relatively small to exhibit a low refractive index. The low refractive index phase and the antifouling phase formed on the outermost surface side by heating or irradiating the free radiation form a comprehensive antifouling layer covering the low refractive index layer, and excellent antifouling property can be obtained. In other words, in the present invention, when a composition for forming a low refractive index layer is applied to form a coating film, two phases are separated in the coating film, and the coating film has a low refractive index phase and an antifouling phase, which will be described later. In the step (3), the two phases each form a low refractive index layer and an antifouling layer, and further, it can be said that a low refractive index layer having an antifouling layer is formed.

如上述之加熱、或者單純放置的時間,只要含氟化合物浮出於塗膜的最表面側之時間程度即可,通常為1~30秒左右。 The heating or the time of standing alone may be as long as the fluorine-containing compound floats on the outermost surface side of the coating film, and is usually about 1 to 30 seconds.

此外,藉由如上述之加熱、或者單純放置,亦可使低折射率層形成用組成物中較佳包含的溶劑蒸發,亦可以將蒸發該溶劑作為目的,積極地乾燥。此情形的乾燥之溫度條件較佳為20~120℃之範圍,更佳為40~100℃,乾燥時間較佳為10~180秒,更佳為15~90秒。乾燥溫度的上限溫度可依據使用的透明基材之材料而適宜選擇。另一方面,下限溫度的20℃係從使含氟化合物快速且確實地在最表面相分離,形成防污層的觀點來看,而較佳地選定。又從安定後相分離防污相、形成防污層的觀點來看,更佳地選定為40℃以上。 In addition, the solvent preferably contained in the composition for forming a low refractive index layer may be evaporated by heating or simply by the above, or may be actively dried by evaporating the solvent. The drying temperature condition in this case is preferably in the range of 20 to 120 ° C, more preferably 40 to 100 ° C, and the drying time is preferably 10 to 180 seconds, more preferably 15 to 90 seconds. The upper limit temperature of the drying temperature can be appropriately selected depending on the material of the transparent substrate to be used. On the other hand, the lower limit temperature of 20 ° C is preferably selected from the viewpoint of rapidly and surely separating the fluorine-containing compound on the outermost surface to form an antifouling layer. Further, from the viewpoint of phase separation of the antifouling phase after stabilization and formation of the antifouling layer, it is more preferably selected to be 40 ° C or higher.

(步驟(3)) (Step (3))

步驟(3)係加熱相分離後的塗膜,或對塗膜照射游離輻射,使該塗膜中的低折射率相與防污相各自成為低折射率層與防污層之步驟。在此,低折射率層係因為在該層中存在微粒子而具有抗反射特性的層,而防污層係因為在該層中存在含氟化合物而具有防污性的層。本說明書中,為了方便起見,相對而言包含較少含氟化合物的層,因為具有較優異的抗反射特性而稱為低折射率層(加熱或照射游離輻射之前為低折射率相),相對而言包含較多含氟化合物的層,因為具有較優異的防污性而稱為防污層(加熱或照射游離輻射之前為防污相)。 The step (3) is a step of heating the phase-separated coating film or irradiating the coating film with free radiation so that the low refractive index phase and the antifouling phase in the coating film each become a low refractive index layer and an antifouling layer. Here, the low refractive index layer is a layer having antireflection properties because of the presence of fine particles in the layer, and the antifouling layer is a layer having antifouling properties due to the presence of a fluorine-containing compound in the layer. In the present specification, for the sake of convenience, a layer containing a relatively small fluorine-containing compound is referred to as a low refractive index layer (a low refractive index phase before heating or irradiating free radiation) because of having excellent antireflection properties. A layer containing a relatively large amount of a fluorine-containing compound is called an antifouling layer (an antifouling phase before heating or irradiating free radiation) because it has superior antifouling properties.

是加熱塗膜、還是照射游離輻射,係依據低折射率層形成用組成物所包含的黏結劑樹脂來選擇。採用熱硬化性樹脂作為黏結劑樹脂之情形,係選擇加熱步驟。作為加熱條件,可以配合所使用的熱硬化性樹脂之硬化溫度作適宜設定,例如可定為60~100℃。 Whether the film is heated or irradiated with free radiation is selected depending on the binder resin contained in the composition for forming a low refractive index layer. In the case where a thermosetting resin is used as the binder resin, a heating step is selected. The heating conditions can be appropriately set in accordance with the curing temperature of the thermosetting resin to be used, and can be, for example, 60 to 100 °C.

又,採用游離輻射硬化性樹脂作為黏結劑樹脂之情形,只要對塗膜照射游離輻射即可。硬化上述塗膜時,使用電子束作為游離輻射之情形,就其加速電壓而言,可因應使用的樹脂或層之厚度而適宜選定,通常較佳為以加速電壓70~300kV左右硬化塗膜。 Further, in the case where the free radiation curable resin is used as the binder resin, it is sufficient that the coating film is irradiated with free radiation. When the coating film is cured, an electron beam is used as the free radiation, and the accelerating voltage can be appropriately selected depending on the thickness of the resin or layer to be used, and it is usually preferred to harden the coating film at an acceleration voltage of about 70 to 300 kV.

此外,電子束的照射中,由於加速電壓越高越能增加穿透能力,在使用會因電子束而劣化的基材作為基材之情形,藉由使電子束的穿透深度與塗膜的厚度為實質上相等之方式,選定加速電壓,可抑制電子束對基材的多餘照射,可以將過量電子束所致的基材劣化止於最低 限度。 In addition, in the irradiation of the electron beam, the penetration ability can be increased as the accelerating voltage is higher, and the penetration depth of the electron beam and the coating film can be made by using a substrate which is deteriorated by the electron beam as a substrate. The thickness is substantially equal, and the acceleration voltage is selected to suppress excessive irradiation of the electron beam on the substrate, and the deterioration of the substrate caused by the excess electron beam can be minimized. limit.

輻射劑量較佳為使低折射率層中的硬化性樹脂之交聯密度為飽和的量,通常為5~300kGy(0.5~30Mrad),更佳為在10~50kGy(1~5Mrad)之範圍選定。 The radiation dose is preferably such that the crosslinking density of the curable resin in the low refractive index layer is saturated, and is usually 5 to 300 kGy (0.5 to 30 Mrad), more preferably 10 to 50 kGy (1 to 5 Mrad). .

此外,作為電子束源,並無特別限制,例如可使用柯克勞夫-沃爾頓型、范德格拉夫型、調諧變壓器型、絕緣核變壓器型、或者直線型、地那米型、高頻率型等之各種電子束加速器。 Further, as the electron beam source, there is no particular limitation, and for example, a Kirklaw-Walton type, a Vandergrave type, a tuning transformer type, an insulating nuclear transformer type, or a linear type, a dinas type, or a high type can be used. Various electron beam accelerators such as frequency type.

使用紫外線作為游離輻射之情形,例如使用由超高壓水銀燈、高壓水銀燈、低壓水銀燈、碳弧燈、氙弧燈、金屬鹵素燈等所發出的紫外線等。能量線源的照射量,以在紫外線波長365nm之累積曝光量而言,較佳為50~500mJ/cm2左右。 When ultraviolet rays are used as the free radiation, for example, ultraviolet rays emitted from an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc lamp, a xenon arc lamp, a metal halide lamp or the like are used. The amount of irradiation of the energy ray source is preferably about 50 to 500 mJ/cm 2 in terms of the cumulative exposure amount at an ultraviolet wavelength of 365 nm.

紫外線的照射,從防止低折射率層用樹脂組成物的表面之氧氣阻礙的觀點來看,較佳為在氮氣環境下,例如氧氣濃度1000ppm以下的環境下進行。本發明中在相分離之後,以使低折射率相及防污相可以安定地快速硬化之觀點而言,最佳為紫外線照射。 The ultraviolet ray irradiation is preferably carried out in an atmosphere of a nitrogen atmosphere, for example, an oxygen concentration of 1000 ppm or less, from the viewpoint of preventing oxygen barrier on the surface of the resin composition for a low refractive index layer. In the present invention, after phase separation, ultraviolet light irradiation is preferred from the viewpoint of allowing the low refractive index phase and the antifouling phase to be rapidly and stably cooled.

此外,藉由步驟(3)之硬化,溶劑幾乎完全蒸發、乾燥,在層中幾乎不存在。溶劑在步驟(2)中已大致蒸發,而在步驟(2)完成時殘留在層中的溶劑,可認為是在步驟(3)中幾乎完全蒸發。 Further, by the hardening of the step (3), the solvent is almost completely evaporated and dried, and is hardly present in the layer. The solvent has substantially evaporated in the step (2), and the solvent remaining in the layer at the completion of the step (2) can be considered to be almost completely evaporated in the step (3).

[抗反射薄膜] [Anti-reflective film]

本發明的抗反射薄膜係依據上述本發明之製造方法所得,更具體而言,其特徵為至少依序具有透明基材、 低折射率層、及覆蓋該低折射率層之全面的防污層,該低折射率層與該防污層使用含有含氟化合物、微粒子及黏結劑樹脂的低折射率層形成用組成物,自該防污層側藉由X射線光電子光譜法(XPS)測定之氟原子/碳原子比為0.6~1.0,且矽原子/碳原子比為小於0.25,該防污層之平均面粗糙度(Ra’)為10nm以下。 The antireflection film of the present invention is obtained according to the above-described manufacturing method of the present invention, and more specifically, characterized in that it has at least a transparent substrate, a low refractive index layer and a comprehensive antifouling layer covering the low refractive index layer, wherein the low refractive index layer and the antifouling layer are formed of a composition for forming a low refractive index layer containing a fluorine-containing compound, fine particles, and a binder resin. The average surface roughness of the antifouling layer is determined by X-ray photoelectron spectroscopy (XPS) from the side of the antifouling layer to a fluorine atom/carbon atom ratio of 0.6 to 1.0 and a germanium atom/carbon atom ratio of less than 0.25. Ra') is 10 nm or less.

關於本發明的抗反射薄膜,使用第1~3圖說明。第1圖係表示本發明之抗反射薄膜的剖面之示意圖,第2及3圖係以本發明之抗反射薄膜的較佳層構成為例,表示其剖面之示意圖。第1圖所表示的抗反射薄膜1係在透明基材2上具有低折射率層3、及防污層8。第2圖所表示的抗反射薄膜1係在透明基材2上依序具有硬塗層4、中高折射率層7、及低折射率層3,而第3圖所表示的抗反射薄膜1係在透明基材2上依序具有硬塗層4、中折射率層5、高折射率層6、低折射率層3、及防污層8。本發明的抗反射薄膜1之層構成,只要在透明基材2上依序具有低折射率層3、及防污層8,則無特別限制,例如較佳可列舉透明基材/低折射率層/防污層、透明基材/硬塗層/低折射率層/防污層、透明基材/硬塗層/中折射率層/高折射率層/低折射率層/防污層、透明基材/硬塗層/高折射率層/中折射率層/低折射率層/防污層、透明基材/中高折射率層/低折射率層/防污層等之層構成。此外,雖然並未予以圖示,在比低折射率層更接近透明基材側,亦可進一步具有後述的抗靜電層等之功能層。 The antireflection film of the present invention will be described using the first to third embodiments. Fig. 1 is a schematic view showing a cross section of an antireflection film of the present invention, and Figs. 2 and 3 are views showing a cross section of a preferred layer structure of the antireflection film of the present invention. The antireflection film 1 shown in Fig. 1 has a low refractive index layer 3 and an antifouling layer 8 on a transparent substrate 2. The antireflection film 1 shown in Fig. 2 has a hard coat layer 4, a medium-high refractive index layer 7, and a low refractive index layer 3 in this order on the transparent substrate 2, and the antireflection film 1 shown in Fig. 3 is used. The hard substrate 4, the medium refractive index layer 5, the high refractive index layer 6, the low refractive index layer 3, and the antifouling layer 8 are sequentially provided on the transparent substrate 2. The layer structure of the antireflection film 1 of the present invention is not particularly limited as long as it has the low refractive index layer 3 and the antifouling layer 8 on the transparent substrate 2, and for example, a transparent substrate/low refractive index is preferable. Layer/antifouling layer, transparent substrate/hard coat layer/low refractive index layer/antifouling layer, transparent substrate/hard coat layer/medium index layer/high refractive index layer/low refractive index layer/antifouling layer, A layer structure of a transparent substrate/hard coat layer/high refractive index layer/medium refractive index layer/low refractive index layer/antifouling layer, transparent substrate/medium high refractive index layer/low refractive index layer/antifouling layer. Further, although not shown, it may be closer to the transparent substrate side than the low refractive index layer, and may further have a functional layer such as an antistatic layer to be described later.

(低折射率層3及防污層8) (low refractive index layer 3 and antifouling layer 8)

低折射率層3及防污層8係使用含有含氟化合物、微粒子及黏結劑樹脂的低折射率層形成用組成物而成之層。此等之層係依據上述本發明的抗反射薄膜之製造方法所形成的層,亦即藉由在透明基材上塗布該低折射率層形成用組成物、形成塗膜、使該塗膜相分離,而作為在該塗膜中兩個的相形成低折射率相與防污相,藉由將此等之塗膜加熱、或者照射游離輻射,各自形成作為低折射率層3與防污層8之層。而且,在該低折射率層3中所包含的含氟化合物之含量,相較於在該防污層8所包含的含氟化合物之含量為相對地少,又如上述,相反地含氟化合物之含量相對較多的防污層8係表現較強防污性之層。 The low refractive index layer 3 and the antifouling layer 8 are layers in which a composition for forming a low refractive index layer containing a fluorine-containing compound, fine particles, and a binder resin is used. These layers are layers formed by the above-described method for producing an antireflection film of the present invention, that is, by coating the composition for forming a low refractive index layer on a transparent substrate, forming a coating film, and forming the coating film. Separating, and forming a low refractive index phase and an antifouling phase as two phases in the coating film, respectively, by heating or irradiating the coating film, the low refractive index layer 3 and the antifouling layer are formed. 8 layers. Further, the content of the fluorine-containing compound contained in the low refractive index layer 3 is relatively small as compared with the content of the fluorine-containing compound contained in the antifouling layer 8, as described above, and conversely, the fluorine-containing compound The antifouling layer 8 having a relatively large content is a layer which exhibits strong antifouling properties.

(低折射率層3) (low refractive index layer 3)

低折射率層3較佳係使設置於正下方的層之折射率為N,空氣之折射率為1時,其折射率為N1/2之層,例如,該低折射率層3之正下方的層,係使用泛用的多官能(甲基)丙烯酸系之游離輻射硬化性樹脂所形成的硬塗層之情形,若考慮該硬塗層的N為1.49~1.53,則較佳為比N低0.01,折射率為1.48~1.52之層。此外,雖然折射率越低越理想,若考慮抗反射特性與表面硬度的平衡,則更佳為1.25~1.45,進一步更佳為1.25~1.35。該折射率可以藉由微粒子的種類、及其含量、或者含氟化合物的使用量等,而輕易地控制。 The low refractive index layer 3 is preferably such that the refractive index of the layer disposed directly below is N, and when the refractive index of air is 1, the refractive index is a layer of N 1/2 , for example, the positive refractive index layer 3 The lower layer is a hard coat layer formed by using a general-purpose polyfunctional (meth)acrylic free radiation curable resin. If the N of the hard coat layer is 1.49 to 1.53, it is preferably a ratio. The N is 0.01 lower and the refractive index is 1.48 to 1.52. Further, the lower the refractive index, the more preferable, and the balance between the antireflection property and the surface hardness is preferably 1.25 to 1.45, more preferably 1.25 to 1.35. The refractive index can be easily controlled by the kind of the fine particles, the content thereof, or the amount of the fluorine-containing compound used.

此外,為了得到最好的抗反射效果,低折射率層3的膜厚與折射率,較佳為滿足自以下算式(I)所計算出的關係。 Further, in order to obtain the best antireflection effect, the film thickness and refractive index of the low refractive index layer 3 preferably satisfy the relationship calculated from the following formula (I).

dA=mλ/(4nA) (I) d A =mλ/(4n A ) (I)

算式(I)中,nA表示低折射率層的折射率,m表示正奇數,較佳係表示為1(空氣),λ係波長,較佳為480~580nm的範圍之值。因此,本發明中,從謀求低折射率化的觀點來看,較佳為在上述算式(I)中使m=1,且使λ為人類感覺最耀眼的波長之480~580nm,自以下算式(II)所計算出的折射率及膜厚。 In the formula (I), n A represents the refractive index of the low refractive index layer, and m represents a positive odd number, and is preferably expressed as a value of 1 (air), λ-based wavelength, preferably 480 to 580 nm. Therefore, in the present invention, from the viewpoint of lowering the refractive index, it is preferable to make m=1 in the above formula (I) and to make λ the most dazzling wavelength of 480 to 580 nm, from the following formula. (II) Calculated refractive index and film thickness.

120<nAdA<145 (II) 120<n A d A <145 (II)

在折射率為如上述之較佳範圍1.25~1.45之情形,膜厚較佳為大約80nm~120nm。然而,為了使折射率比下層更低以得到抗反射效果,膜厚亦可為超出此範圍的120nm~1μm左右。在本發明,較佳為低折射率層及防污層的合計厚度在上述範圍。 In the case where the refractive index is in the preferred range of 1.25 to 1.45 as described above, the film thickness is preferably about 80 nm to 120 nm. However, in order to make the refractive index lower than that of the lower layer to obtain an antireflection effect, the film thickness may be about 120 nm to 1 μm which is outside the range. In the present invention, it is preferable that the total thickness of the low refractive index layer and the antifouling layer is in the above range.

(防污層8) (anti-fouling layer 8)

防污層8係平均面粗糙度(Ra’)為10nm以下,以均勻一致地覆蓋低折射率層3上之全面的方式存在,賦予本發明之抗反射薄膜防污性的層。 The antifouling layer 8 is a layer having an average surface roughness (Ra') of 10 nm or less and uniformly covering the entire surface of the low refractive index layer 3, and imparting antifouling properties to the antireflection film of the present invention.

該防污層8係平均面粗糙度(Ra’)為10nm以下之層,並且為均勻一致的層。此外,防污層8的平均面粗糙度(Ra’)較佳為0.1~10nm,更佳為0.1~7nm,進一步更佳為最能提升耐摩擦性的0.1~5nm。在此,平均面粗糙度(Ra’)係將以JISB0601所定義的中心線平均粗糙度(Ra),對測定面應用並進行三次元擴張者,表現「將自基準面至指定面之偏差的絕對值予以平均之值」,以下式給定之數值。例如,平均面粗糙度(Ra’)只要可藉由原子力顯 微鏡(AFM)觀察表面形狀,並利用附屬的解析用軟體(例如SPIwin等)將所得之影像進行影像解析而得到即可。 The antifouling layer 8 is a layer having an average surface roughness (Ra') of 10 nm or less, and is a uniform layer. Further, the average surface roughness (Ra') of the antifouling layer 8 is preferably 0.1 to 10 nm, more preferably 0.1 to 7 nm, and still more preferably 0.1 to 5 nm which is the most excellent in friction resistance. Here, the average surface roughness (Ra') is a three-dimensional expansion applied to the measurement surface by the center line average roughness (Ra) defined by JIS B0601, and "the deviation from the reference surface to the specified surface" is expressed. The absolute value is averaged," the value given in the following formula. For example, the average surface roughness (Ra') is as long as it can be represented by atomic force. The microscopic mirror (AFM) observes the surface shape and obtains the image obtained by image analysis using an attached analysis software (for example, SPIwin).

Ra’:平均面粗糙度(nm) Ra': average surface roughness (nm)

So假設測定面為理想的平 S o : Assume that the measurement surface is ideally flat

坦時之面積(| XR-XL | x | YT-TB|) The area of the time (| X R -X L | x | Y T -T B |)

F(X,Y):於測定點(X,Y)之高度 F(X, Y): at the height of the measuring point (X, Y)

X:X座標 X: X coordinate

Y:Y座標 Y: Y coordinate

XL~XR測定面之X座標的範圍 X L ~X R : the range of the X coordinate of the measurement surface

YB~YT測定面之Y座標的範圍 Y B ~Y T : the range of the Y coordinate of the measurement surface

Zo測定面內之平均高度 Z o : measure the average height in the plane

由於防污層8的平均面粗糙度係如上述非常的小且均勻一致,具有優異的耐摩擦性及防污性,更具有優異的抗反射特性,而較佳為設置於本發明之抗反射薄膜的最表面。 Since the average surface roughness of the antifouling layer 8 is extremely small and uniform as described above, it has excellent rubbing resistance and antifouling property, and has excellent antireflection properties, and is preferably provided in the antireflection of the present invention. The outermost surface of the film.

防污層8之均勻一致的狀態,不只藉由該平均面粗糙度(Ra’),還可藉由原子力顯微鏡(AFM)觀察而具體地確認。亦即,防污層8若以原子力顯微鏡(AFM)觀察,則其形狀圖及相位圖中,低折射率層形成用組成物的硬化物不會不均勻分布,或者在該硬化物所形成的防污層,不會不均勻分布圓形或橢圓形的洞,使低折射率層或透明基材等之下層露出,亦即不會呈現海島結構,而為遍布抗反射薄膜1之全面而形成之狀態。 The uniform state of the antifouling layer 8 is specifically confirmed not only by the average surface roughness (Ra') but also by atomic force microscopy (AFM). In other words, when the antifouling layer 8 is observed by an atomic force microscope (AFM), the cured product of the composition for forming a low refractive index layer is not unevenly distributed in the shape and phase diagram, or is formed in the cured product. The anti-fouling layer does not unevenly distribute the circular or elliptical holes, so that the lower layer of the low refractive index layer or the transparent substrate is exposed, that is, the island structure is not present, but is formed over the entire antireflection film 1 State.

自防污層側藉由X射線光電子光譜法(XPS)測定之氟原子/碳原子比必須為0.6~1.0,且矽原子/碳原子比必須為小於0.25。在此,氟原子/碳原子比、矽原子/碳原子比 係自抗反射薄膜的防污層側藉由X射線光電子光譜法(XPS)測定,依據氟原子、碳原子、及矽原子的組成比所計算出之值。 The fluorine atom/carbon atom ratio determined by X-ray photoelectron spectroscopy (XPS) from the side of the antifouling layer must be 0.6 to 1.0, and the germanium atom/carbon atom ratio must be less than 0.25. Here, fluorine atom/carbon atom ratio, germanium atom/carbon atom ratio The antifouling layer side of the antireflection film is measured by X-ray photoelectron spectroscopy (XPS), and is calculated based on the composition ratio of fluorine atoms, carbon atoms, and ruthenium atoms.

本發明係藉由防污層8中的氟原子存在一定量以上,且矽原子存在一定量以下,亦即藉由以固定量使用所定之含氟化合物,可以得到表現優異防污性、且無輕微白化的抗反射薄膜。此外,由於係遍布全面且均勻一致地形成防污層,藉由遍布全面地具有上述的原子比,可以得到更優異的防污性、減少輕微白化之發生。 In the present invention, the fluorine atom in the antifouling layer 8 is present in a certain amount or more, and the ruthenium atom is present in a certain amount or less, that is, by using a predetermined fluorine-containing compound in a fixed amount, excellent antifouling properties can be obtained without A slightly whitened anti-reflective film. Further, since the antifouling layer is formed over the entire surface and uniformly, the above-mentioned atomic ratio is comprehensively distributed, whereby more excellent antifouling properties can be obtained and the occurrence of slight whitening can be reduced.

從這種觀點來看,氟原子/碳原子比更佳為0.7~1.0,且矽原子/碳原子比更佳為0.01~0.2。若氟原子/碳原子比小於0.6,則防污性會不充分。另一方面,若大於1.0,則為了達成此數值而使用的試劑之處理,亦即含氟化合物之處理將明顯變得困難。此外,由於若矽原子/碳原子比為0.25以上,則防污性會不充分,而本發明中使該比率為小於0.25,但藉由在如此範圍,可以期待因滑動性提升之優異的耐摩擦性。 From this point of view, the fluorine atom/carbon atom ratio is more preferably 0.7 to 1.0, and the germanium atom/carbon atom ratio is more preferably 0.01 to 0.2. If the fluorine atom/carbon atom ratio is less than 0.6, the antifouling property may be insufficient. On the other hand, if it is more than 1.0, the treatment of the reagent used to achieve this value, that is, the treatment of the fluorine-containing compound, becomes significantly difficult. In addition, when the ruthenium atom/carbon atom ratio is 0.25 or more, the antifouling property is insufficient, and in the present invention, the ratio is made less than 0.25, but in such a range, excellent resistance due to slidability improvement can be expected. Frictional.

如藉由原子力顯微鏡(AFM)確認到海島結構之情形,或在其一部分觀察到凸部,平均面粗糙度在本發明所規定的範圍以外之係粗糙面的情形,自防污層側藉由X射線光電子光譜法(XPS)測定的原子比,不會在如上述的原子比之範圍內。亦即,在塗布低折射率層形成用組成物所得之塗膜中,相分離成低折射率相與防污相一事,更進一步防污層係在低折射率層上作為均勻一致的層而形成一事,可依據測定到本發明所規定的上述原子比來 確認;防污層為均勻一致的層一事,亦可依據藉由原子力顯微鏡(AFM)之測定來確認。因此,藉由防污層具有本發明所規定的平均面粗糙度與原子比,可說是除了優異的防污性以外,還可得到耐摩擦性,並且得到連輕微白化亦不表現的抗反射薄膜。本發明中,可以使用依據藉由上述原子力顯微鏡(AFM)的平均面粗糙度(Ra’)測定或形狀圖及相位圖觀察,及藉由X射線光電子光譜法(XPS)測定的原子比,作為判斷是否為依據本發明之製造方法所製造的抗反射薄膜、或者是否本發明的抗反射薄膜之評價方法。低折射率層上之防污層的存在,雖然也有可藉由TEM剖面觀察而觀察之情形,然而若考慮極薄的層,則以上述評價方法為有效。此外,藉由化學蒸鍍法(CVD)、物理蒸鍍法(PVD)等之蒸鍍法形成防污層之情形,與本發明之製造方法不同,由於防污層與低折射率層不按照各層的材料所具有的反應性基而反應,因黏著性弱而耐摩擦性變弱。也就是說,可以藉由耐摩擦性評價,確認製造方法的差異。在此,耐摩擦性評價係藉由對鋼絲絨(日本鋼絲絨股份有限公司製BONSTAR #0000)施加300g/cm2以上的負重,來回摩擦抗反射薄膜的表面10次,目視在該表面所造成的傷痕數者。 For example, when the sea-island structure is confirmed by atomic force microscopy (AFM), or a convex portion is observed in a part thereof, the average surface roughness is a rough surface outside the range specified by the present invention, from the side of the anti-fouling layer. The atomic ratio measured by X-ray photoelectron spectroscopy (XPS) is not in the range of the atomic ratio as described above. That is, in the coating film obtained by coating the composition for forming a low refractive index layer, phase separation into a low refractive index phase and an antifouling phase, and further, the antifouling layer is a uniform layer on the low refractive index layer. The formation can be confirmed by measuring the atomic ratio specified in the present invention; the antifouling layer is a uniform layer, and can also be confirmed by measurement by atomic force microscopy (AFM). Therefore, since the antifouling layer has the average surface roughness and the atomic ratio defined by the present invention, it can be said that in addition to the excellent antifouling property, the rubbing resistance can be obtained, and the antireflection which is not slightly whitened or expressed can be obtained. film. In the present invention, an atomic ratio measured by X-ray photoelectron spectroscopy (XPS) according to an average surface roughness (Ra') of the atomic force microscope (AFM) or a shape diagram and a phase diagram observation may be used. It is judged whether it is the antireflection film manufactured by the manufacturing method of this invention, or the evaluation method of the antireflection film of this invention. The presence of the antifouling layer on the low refractive index layer may be observed by TEM cross-section observation. However, considering the extremely thin layer, the above evaluation method is effective. Further, in the case where the antifouling layer is formed by a vapor deposition method such as chemical vapor deposition (CVD) or physical vapor deposition (PVD), unlike the manufacturing method of the present invention, since the antifouling layer and the low refractive index layer are not in accordance with The reactive groups of the materials of the respective layers react and weaken the friction resistance due to weak adhesion. That is to say, the difference in the manufacturing method can be confirmed by the evaluation of the abrasion resistance. Here, the abrasion resistance was evaluated by applying a load of 300 g/cm 2 or more to steel wool (BONSTAR #0000 manufactured by Nippon Steel Wool Co., Ltd.), rubbing the surface of the antireflection film back and forth 10 times, and visually causing the surface. The number of scars.

低折射率層及防污層中的矽原子,係以SiO2、或C-Si-O的形態存在,本發明中將來自SiO2的矽原子稱為無機矽原子,將來自C-Si-O的矽原子稱為有機矽原子。亦即本發明中,低折射率層及防污層中的矽原子係含有有機矽原子與無機矽原子。 The germanium atom in the low refractive index layer and the antifouling layer exists in the form of SiO 2 or C-Si-O. In the present invention, the germanium atom derived from SiO 2 is referred to as an inorganic germanium atom, and will be derived from C-Si- The germanium atom of O is called an organic germanium atom. That is, in the present invention, the ruthenium atom in the low refractive index layer and the antifouling layer contains an organic ruthenium atom and an inorganic ruthenium atom.

無機矽原子及有機矽原子,由於結合能不同,可以想見在Si2p光譜會分別出現。藉由波峰分離解析,將高鍵結能側的103~104eV附近之波峰定為無機矽原子,低鍵結能側的101~102eV附近之波峰定為有機矽原子。上述矽原子/碳原子比中的矽原子,係定為無機矽原子與有機矽原子之合計量者。 Inorganic germanium atoms and organic germanium atoms, due to different binding energies, are expected to appear separately in the Si2p spectrum. By peak separation analysis, the peak near 103~104eV on the high bond junction side is defined as an inorganic germanium atom, and the peak near 101~102eV on the low bond junction side is defined as an organic germanium atom. The ruthenium atom in the above ruthenium atom/carbon atom ratio is defined as the total amount of the inorganic ruthenium atom and the organic ruthenium atom.

本發明中,自防污層側藉由X射線光電子光譜法(XPS)測定的有機矽原子/碳原子比較佳為0.07以下,更佳為0.01~0.07,進一步更佳為0.02~0.06。此外,無機矽原子/碳原子比較佳為0.2以下,更佳為0.05~0.2,進一步更佳為0.08~0.18。若有機矽原子/碳原子比、無機矽原子/碳原子比於上述範圍內,可以得到表現優異的耐摩擦性與防污性,而且沒有輕微白化的抗反射薄膜。 In the present invention, the organic ruthenium atom/carbon atom measured by X-ray photoelectron spectroscopy (XPS) from the side of the antifouling layer is preferably 0.07 or less, more preferably 0.01 to 0.07, still more preferably 0.02 to 0.06. Further, the inorganic ruthenium atom/carbon atom is preferably 0.2 or less, more preferably 0.05 to 0.2, still more preferably 0.08 to 0.18. When the ratio of the organic ruthenium atom/carbon atom to the inorganic ruthenium atom/carbon atom is within the above range, an antireflection film which exhibits excellent abrasion resistance and antifouling property without slight whitening can be obtained.

本發明中藉由滿足上述原子比,不需如以往謀求提升含氟化合物之互溶性,藉由採用使用低折射率層形成用組成物使低折射率層之表面全體相分離的手法而如覆蓋般形成防污層,該防污層係成為抑制如上述的海島結構之發生,平均面粗糙度小且均勻一致的層。 In the present invention, by satisfying the above atomic ratio, it is not necessary to improve the mutual solubility of the fluorine-containing compound as in the prior art, and it is possible to cover the entire surface of the low refractive index layer by using a composition for forming a low refractive index layer. The antifouling layer is formed as a layer which suppresses the occurrence of the above-described sea-island structure and has a uniform average surface roughness and uniformity.

此外,藉由使用組合含氟化合物與微粒子及黏結劑樹脂的低折射率層形成用組成物,不僅可以得到均勻一致的防污層8,作為結果,還可以得到具有優異抗反射特性,具有優異耐摩擦性及防污性,且抑制輕微白化之發生的抗反射薄膜。 Further, by using a composition for forming a low refractive index layer in which a fluorine-containing compound and fine particles and a binder resin are combined, not only a uniform antifouling layer 8 can be obtained, but also excellent antireflection properties can be obtained as a result. Anti-reflective film that resists abrasion and stain resistance and suppresses the occurrence of slight whitening.

只要是平滑的面,理論上就不會發生如形成防污層的有機化合物導致十六烷的接觸角超過90°一事。因此, 接觸角及下落角可使用十六烷作為測定液體,藉由各種市售的接觸角量角計、下落角量角計作測定。 As long as it is a smooth surface, it is theoretically impossible for an organic compound such as an antifouling layer to cause a contact angle of hexadecane of more than 90°. therefore, The contact angle and the drop angle can be measured using hexadecane as a measurement liquid by various commercially available contact angle angle meters and drop angle angle meters.

本發明的抗反射薄膜1,將其最表面定為防污層8之情形,對於表面的十六烷之接觸角較佳為55~90°,更佳為60~90°,且對於表面的十六烷之下落角較佳為1~25°,更佳為1~20°,其最表面為均勻一致,亦即防污層8具有平滑的結構。藉由防污層8所包含的含氟化合物覆蓋於表面,使接觸角及下落角成為上述之範圍,另一方面,若形成海島結構而導致無法均勻一致地覆蓋表面,則接觸角及下落角將偏離上述之範圍。 In the anti-reflection film 1 of the present invention, when the outermost surface is defined as the anti-staining layer 8, the contact angle with respect to the surface of hexadecane is preferably 55 to 90, more preferably 60 to 90, and for the surface. The falling angle of hexadecane is preferably from 1 to 25°, more preferably from 1 to 20°, and the outermost surface thereof is uniform, that is, the antifouling layer 8 has a smooth structure. The fluorine-containing compound contained in the anti-fouling layer 8 covers the surface, and the contact angle and the falling angle are in the above range. On the other hand, if the sea-island structure is formed and the surface cannot be uniformly covered, the contact angle and the falling angle are obtained. Will deviate from the above range.

低折射率層3及防污層8的合計厚度,係按照所期望的折射率而異,然而從降低可見光領域中的反射率之觀點來看,較佳為如上述的80~120nm左右。又,更佳為100~120nm。 The total thickness of the low refractive index layer 3 and the antifouling layer 8 varies depending on the desired refractive index. However, from the viewpoint of reducing the reflectance in the visible light region, it is preferably about 80 to 120 nm as described above. Further, it is more preferably 100 to 120 nm.

只有防污層8之厚度,推測在1~3nm之範圍內。若考慮藉由上述X射線光電子光譜法(XPS)分析時,也能檢測出低折射率層中的微粒子所包含的原子,而以X射線光電子光譜法(XPS)所得之情報的深度為1~3nm,則推測在1~3nm之範圍內較為妥當。 Only the thickness of the antifouling layer 8 is presumed to be in the range of 1 to 3 nm. When the X-ray photoelectron spectroscopy (XPS) analysis is considered, the atoms contained in the fine particles in the low refractive index layer can also be detected, and the depth of the information obtained by X-ray photoelectron spectroscopy (XPS) is 1~. 3nm, it is presumed that it is more appropriate in the range of 1~3nm.

(硬塗層4) (hard coating 4)

本發明的抗反射薄膜1,以提升抗反射薄膜1的耐摩擦性等之表面硬度的性能之目的,可以具有硬塗層4。在此,硬塗係指在以JIS5600-5-4:1999所規定的鉛筆硬度試驗中顯示「H」以上之硬度的性能。 The antireflection film 1 of the present invention may have a hard coat layer 4 for the purpose of improving the surface hardness of the antireflection film 1 such as abrasion resistance. Here, the hard coating refers to a property of exhibiting a hardness of "H" or more in a pencil hardness test prescribed in JIS 5600-5-4:1999.

硬塗層較佳為交聯硬化游離輻射硬化性樹脂所得者 。形成硬塗層4的游離輻射硬化性樹脂,可自使用於上述低折射率層形成用組成物中之黏結劑樹脂的游離輻射硬化性樹脂之中適宜選擇使用。游離輻射硬化性樹脂為紫外線硬化性樹脂之情形時所使用的光聚合起始劑,也可自之前舉例說明者之中適宜選定使用。此外,亦同樣可以使用上述低折射率層形成用組成物所使用的各種添加劑。 The hard coat layer is preferably a cross-linked hardened free radiation curable resin. . The free radiation curable resin forming the hard coat layer 4 can be suitably selected from among the free radiation curable resins used for the binder resin in the composition for forming a low refractive index layer. The photopolymerization initiator used in the case where the free radiation curable resin is an ultraviolet curable resin may be appropriately selected from those exemplified above. Further, various additives used in the above composition for forming a low refractive index layer can also be used.

硬塗層4硬化後的膜厚較佳為在0.1~100μm之範圍,更佳為0.8~20μm之範圍,進一步更佳為1~8μm之範圍,特佳為1.5~4μm之範圍。只要膜厚在上述範圍內,就能得到充分的硬塗性能,對於來自外部的衝撃不易破裂。又,本發明中硬塗層4亦可係兼具如下述所說明的中折射率層5或高折射率層6之功能者,或兼具抗靜電層之功能者。 The film thickness after hardening of the hard coat layer 4 is preferably in the range of 0.1 to 100 μm, more preferably in the range of 0.8 to 20 μm, still more preferably in the range of 1 to 8 μm, and particularly preferably in the range of 1.5 to 4 μm. As long as the film thickness is within the above range, sufficient hard coat performance can be obtained, and the punch from the outside is not easily broken. Further, in the present invention, the hard coat layer 4 may have a function of a medium refractive index layer 5 or a high refractive index layer 6 as described below, or a function of an antistatic layer.

(中折射率層5及高折射率層6) (Medium refractive index layer 5 and high refractive index layer 6)

本發明的抗反射薄膜1,以提升抗反射性能之目的,可以較佳地具有中折射率層5及高折射率層6。在此,中折射率層5及高折射率層6係如上述作為抗反射薄膜1的形態,不需同時設置中折射率層5及高折射率層6,亦可例如第2圖所示般作為中高折射率層7以一層設置。 The antireflection film 1 of the present invention preferably has a medium refractive index layer 5 and a high refractive index layer 6 for the purpose of improving antireflection performance. Here, the medium refractive index layer 5 and the high refractive index layer 6 are in the form of the antireflection film 1 described above, and it is not necessary to provide the medium refractive index layer 5 and the high refractive index layer 6 at the same time, and may be, for example, as shown in FIG. The medium-high refractive index layer 7 is provided in one layer.

中折射率層5、高折射率層6或者中高折射率層7(以下亦稱為此等折射率層)的折射率,較佳可以在1.5~2.00之範圍內任意設定。亦即,中折射率層5係至少折射率比上述低折射率層3高,折射率比高折射率層6低者,且折射率之高低係相對的。中折射率層5及高折射率層6的折 射率係如上述之相對者,惟通常較佳為中折射率層5的折射率係1.5~1.8之範圍,高折射率層6的折射率係1.6~2.0之範圍。 The refractive index of the medium refractive index layer 5, the high refractive index layer 6, or the medium-high refractive index layer 7 (hereinafter also referred to as such a refractive index layer) is preferably set arbitrarily within the range of 1.5 to 2.00. That is, the medium refractive index layer 5 is at least higher in refractive index than the low refractive index layer 3, and has a lower refractive index than the high refractive index layer 6, and the refractive index is relatively high. Folding of the medium refractive index layer 5 and the high refractive index layer 6 The emissivity is as described above, but it is generally preferred that the refractive index of the medium refractive index layer 5 is in the range of 1.5 to 1.8, and the refractive index of the high refractive index layer 6 is in the range of 1.6 to 2.0.

此等折射率層例如可藉由黏結劑樹脂、與粒徑100nm以下並具有指定之折射率的微粒子所形成。作為這種具有指定之折射率的微粒子之具體例(括弧內表示折射率),可列舉ZnO(1.90)、TiO2(2.3~2.7)、CeO2(1.95)、氧化銦錫(簡稱ITO;1.95)、摻雜銻之氧化錫(簡稱ATO;1.80)、Y2O3(1.87)、ZrO2(2.0)。此外,作為黏結劑樹脂,可自上述黏結劑樹脂之中適宜選擇使用。 These refractive index layers can be formed, for example, by a binder resin and fine particles having a particle diameter of 100 nm or less and having a specified refractive index. Specific examples of such fine particles having a predetermined refractive index (refractive index in parentheses) include ZnO (1.90), TiO 2 (2.3 to 2.7), CeO 2 (1.95), and indium tin oxide (abbreviated as ITO; 1.95). ), doped tin oxide (abbreviated as ATO; 1.80), Y 2 O 3 (1.87), ZrO 2 (2.0). Further, as the binder resin, it can be suitably selected from the above-mentioned binder resins.

較佳為微粒子之折射率比黏結劑樹脂單體的硬化膜之折射率高者。由於此等折射率層之折射率一般係由微粒子之含有率決定,微粒子之添加量越多,折射率層之折射率越高。因此,藉由調整黏結劑樹脂與微粒子之添加比率,可以形成具有指定之折射率的折射率層。只要微粒子係具有導電性者,使用這種微粒子形成的折射率層即成為兼具抗靜電性者。此等折射率層可係如藉由化學蒸鍍法(CVD)、物理蒸鍍法(PVD)等之蒸鍍法形成的二氧化鈦或氧化鋯之折射率高的無機氧化物之蒸鍍膜,或者係使用將如二氧化鈦之折射率高的無機氧化物微粒子分散於適宜黏結劑樹脂的樹脂組成物之樹脂的硬化膜。 It is preferred that the refractive index of the fine particles is higher than the refractive index of the cured film of the binder resin monomer. Since the refractive index of these refractive index layers is generally determined by the content ratio of the fine particles, the larger the amount of the fine particles added, the higher the refractive index of the refractive index layer. Therefore, by adjusting the addition ratio of the binder resin to the fine particles, a refractive index layer having a specified refractive index can be formed. As long as the fine particles are electrically conductive, the refractive index layer formed using such fine particles has both antistatic properties. The refractive index layer may be a vapor deposited film of an inorganic oxide having a high refractive index of titanium dioxide or zirconium oxide formed by a vapor deposition method such as chemical vapor deposition (CVD) or physical vapor deposition (PVD), or A cured film of a resin which is a resin composition of a suitable binder resin, such as inorganic oxide fine particles having a high refractive index of titanium dioxide, is used.

此等折射率層的膜厚較佳為10~300nm之範圍,更佳為30~200nm之範圍。上述折射率層(中折射率層、高折射率層)可直接設置於透明基材2,然而較佳為設置硬塗層4於透明基材2,在硬塗層4與低折射率層3之間設置。 The film thickness of the refractive index layers is preferably in the range of 10 to 300 nm, more preferably in the range of 30 to 200 nm. The above refractive index layer (medium refractive index layer, high refractive index layer) may be directly disposed on the transparent substrate 2, however, it is preferable to provide the hard coat layer 4 on the transparent substrate 2, in the hard coat layer 4 and the low refractive index layer 3. Set between.

(抗靜電層) (antistatic layer)

本發明之抗反射薄膜1,從藉由抗靜電效果,得到防止塵埃附著、或者將本發明之抗反射薄膜使用於影像顯示裝置的情形之導電性或電磁波屏蔽效果的觀點來看,可以較佳地具有抗靜電層。抗靜電層較佳為設置於透明基材2與低折射率層3之間,設置有上述硬塗層4、中折射率層5、或者高折射率層6之情形,較佳為將低折射率層3設置於最表面,並且以鄰接該低折射率層3之方式設置。 The antireflection film 1 of the present invention can be preferably obtained from the viewpoint of preventing the adhesion of dust by the antistatic effect or the conductivity or electromagnetic wave shielding effect in the case where the antireflection film of the present invention is used in an image display device. The ground has an antistatic layer. Preferably, the antistatic layer is disposed between the transparent substrate 2 and the low refractive index layer 3, and is provided with the hard coat layer 4, the medium refractive index layer 5, or the high refractive index layer 6, preferably low refractive index The rate layer 3 is disposed on the outermost surface and is disposed adjacent to the low refractive index layer 3.

作為抗靜電層並無特別限定,例如較佳可列舉藉由含有樹脂與抗靜電劑之抗靜電層用組成物所形成者。 The antistatic layer is not particularly limited, and for example, it is preferably formed of a composition for an antistatic layer containing a resin and an antistatic agent.

作為抗靜電劑並無特別限定,例如較佳可列舉四級銨鹽、吡啶鹽、一~三級胺基等之陽離子性化合物;磺酸鹼、硫酸酯鹼、磷酸酯鹼、膦酸鹼等之陰離子性化合物;胺基酸系、胺基硫酸酯系等之兩性化合物;胺基醇系、丙三醇系、聚乙二醇系等之非離子性化合物;如錫及鈦之烷氧化物的有機金屬化合物;如該有機金屬化合物之乙醯丙酮鹽之金屬螯合化合物等。亦可使用將上述所列之化合物高分子量化的化合物。 The antistatic agent is not particularly limited, and examples thereof include a cationic compound such as a quaternary ammonium salt, a pyridinium salt, or a mono- to tertiary amino group; a sulfonic acid base, a sulfate base, a phosphate base, a phosphonic acid base, and the like. Anionic compound; amphoteric compound such as amino acid or amine sulfate; nonionic compound such as amino alcohol, glycerol or polyethylene glycol; alkoxide such as tin and titanium An organometallic compound; a metal chelate compound such as an ethyl acetonide salt of the organometallic compound. Compounds which polymerize the above-listed compounds can also be used.

作為抗靜電劑,亦可較佳列舉如具有三級胺基、四級銨基或金屬螯合部,且可藉由游離輻射聚合的單體或低聚物或具有官能基之偶合劑的有機金屬化合物等之聚合性化合物。此等之抗靜電劑只要係離子性液體即可。 As the antistatic agent, an organic substance such as a monomer or oligomer having a tertiary amino group, a quaternary ammonium group or a metal chelate portion and polymerizable by free radiation or a coupling agent having a functional group may also be preferably exemplified. A polymerizable compound such as a metal compound. These antistatic agents are only required to be ionic liquids.

作為抗靜電劑,亦可較佳列舉導電性聚合物。作為導電性聚合物並無特別限定,例如可列舉芳香族共軛系之聚(對伸苯)、雜環共軛系之聚吡咯、聚噻吩、脂肪族 共軛系之聚乙炔、含雜原子共軛系之聚苯胺、混合型共軛系之聚對苯撐乙烯、分子中具有複數個共軛鏈的共軛系之多鏈型共軛系、使前述共軛高分子鏈與飽和高分子接枝或嵌段共聚的高分子之導電性複合體等。 As the antistatic agent, a conductive polymer is also preferably exemplified. The conductive polymer is not particularly limited, and examples thereof include an aromatic conjugated poly(p-phenylene), a heterocyclic conjugated polypyrrole, a polythiophene, and an aliphatic group. a conjugated polyacetylene, a polyaniline containing a hetero atom conjugated system, a poly-p-phenylene ethylene having a mixed conjugated system, a conjugated system having a plurality of conjugated chains in a molecule, and a conjugated system A conductive composite of a polymer in which the conjugated polymer chain is grafted or block copolymerized with a saturated polymer.

作為抗靜電劑,亦可較佳列舉導電性金屬氧化物微粒子。作為導電性金屬氧化物微粒子並無特別限定,例如可列舉ZnO(折射率1.90,以下括弧內之值全係表示折射率者)、Sb2O2(1.71)、SnO2(1.997)、CeO2(1.95)、氧化銦錫(簡稱ITO;1.95)、In2O3(2.00)、Al2O3(1.63)、摻雜銻之氧化錫(簡稱ATO;2.0)、摻雜鋁之氧化鋅(簡稱AZO;2.0)等。 As the antistatic agent, conductive metal oxide fine particles are also preferably used. The conductive metal oxide fine particles are not particularly limited, and examples thereof include ZnO (refractive index 1.90, the values in the parentheses below all indicate the refractive index), Sb 2 O 2 (1.71), SnO 2 (1.997), and CeO 2 . (1.95), indium tin oxide (abbreviated as ITO; 1.95), In 2 O 3 (2.00), Al 2 O 3 (1.63), tin oxide doped with antimony (abbreviated as ATO; 2.0), zinc oxide doped with aluminum ( Referred to as AZO; 2.0) and so on.

作為抗靜電層用組成物中之抗靜電劑的含量,較佳為可以充分享有含有上述抗靜電劑之效果的同時,在不阻礙上述依據本發明所製造的光學積層體所得之效果的範圍適宜摻合。 The content of the antistatic agent in the composition for an antistatic layer is preferably such that the effect of containing the antistatic agent can be sufficiently enjoyed, and the effect obtained by the optical layered body produced according to the present invention is not inhibited. Blending.

抗靜電層中的樹脂,亦即作為使用於抗靜電層用組成物之樹脂,並無特別限定,例如可列舉與在上述硬塗層中已說明之樹脂相同,藉由紫外線或電子束硬化的樹脂之游離輻射硬化型樹脂、游離輻射硬化型樹脂與溶劑乾燥型樹脂之混合物、或者熱硬化型樹脂等。 The resin in the antistatic layer, that is, the resin used as the composition for the antistatic layer, is not particularly limited, and examples thereof include the same as those described above for the hard coat layer, and are cured by ultraviolet rays or electron beams. A mixture of a free radiation curable resin of a resin, a free radiation curable resin and a solvent drying resin, or a thermosetting resin.

抗靜電層係可將在上述光穿透性基材等之上,塗布上述使用各材料製備而成的抗靜電層用組成物所形成的塗膜,因應需要而乾燥,藉由游離輻射照射或加熱等硬化而形成。 The antistatic layer may be coated on the above-mentioned light-transmitting substrate or the like by applying the above-mentioned antistatic layer composition prepared using each material, and dried as needed, by irradiation with free radiation or It is formed by hardening such as heating.

[偏光板] [Polarizer]

本發明之偏光板係在偏光膜的至少單面具有抗反射薄膜,該抗反射薄膜為依據上述本發明之製造方法所得者,亦即,其特徵為至少依序具有透明基材、低折射率層、及覆蓋該低折射率層之全面的防污層,該低折射率層與該防污層係使用含有含氟化合物、微粒子及黏結劑樹脂之低折射率層形成用組成物而成,自該防污層側藉由X射線光電子光譜法(XPS)測定之氟原子/碳原子比為0.6~1.0,且矽原子/碳原子比為小於0.25,該防污層之平均面粗糙度(Ra’)為10nm以下者。藉由定為如此般構成,本發明之偏光板係物理強度、耐光性優異的具有抗反射功能者,又可大幅削減成本,使顯示裝置輕薄化。 The polarizing plate of the present invention has an antireflection film on at least one side of the polarizing film, and the antireflection film is obtained according to the manufacturing method of the present invention described above, that is, characterized in that it has at least a transparent substrate and a low refractive index. a layer and a comprehensive antifouling layer covering the low refractive index layer, wherein the low refractive index layer and the antifouling layer are formed using a composition for forming a low refractive index layer containing a fluorine-containing compound, fine particles, and a binder resin. The average surface roughness of the antifouling layer is determined by X-ray photoelectron spectroscopy (XPS) from the side of the antifouling layer to a fluorine atom/carbon atom ratio of 0.6 to 1.0 and a germanium atom/carbon atom ratio of less than 0.25. Ra') is 10 nm or less. With such a configuration, the polarizing plate of the present invention has an anti-reflection function excellent in physical strength and light resistance, and can significantly reduce the cost and make the display device lighter and thinner.

通常偏光板會在偏光膜的兩面設置保護薄膜,然而本發明之偏光板係在其至少單面設置本發明之抗反射薄膜者。本發明中,可以在偏光膜的單面、或兩面設置本發明之抗反射薄膜。設置於單面之情形,從改良液晶顯示畫面之能見角特性的觀點來看,較佳為另一面係具有包含光學各向異性層之光學補償層的光學補償薄膜(相位差薄膜)。 Usually, the polarizing plate is provided with a protective film on both sides of the polarizing film. However, the polarizing plate of the present invention is provided with the antireflection film of the present invention on at least one side thereof. In the present invention, the antireflection film of the present invention may be provided on one side or both sides of the polarizing film. In the case of being provided on one side, from the viewpoint of improving the visibility angle characteristics of the liquid crystal display screen, it is preferable that the other surface has an optical compensation film (phase difference film) including an optical compensation layer of an optically anisotropic layer.

將本發明之抗反射薄膜作為保護薄膜使用之情形,作為透明支撐體,特佳為使用三乙醯基纖維素薄膜。此情形中,使用抗反射薄膜之保護薄膜的透明支撐體,較佳為因應需要透過包含聚乙烯醇之接著劑層等接著於偏光膜。此外,如上所述較佳為該偏光膜之另一側亦具有保護薄膜、較佳為上述之光學補償薄膜(相位差薄膜)的構成。與另一個保護薄膜之偏光膜相反側之面亦可具有 黏著劑層。藉由定為如此般構成,本發明之偏光板可以改善液晶顯示裝置在明室的對比、上下左右之能見角。 When the antireflection film of the present invention is used as a protective film, it is particularly preferable to use a triethylenesulfonated cellulose film as a transparent support. In this case, the transparent support using the protective film of the antireflection film is preferably passed through a polarizing film through an adhesive layer containing polyvinyl alcohol or the like as needed. Further, as described above, it is preferable that the other side of the polarizing film has a protective film, preferably the optical compensation film (phase difference film) described above. The side opposite to the polarizing film of the other protective film may also have Adhesive layer. By setting it as such, the polarizing plate of the present invention can improve the contrast of the liquid crystal display device in the bright room, and the viewing angles of the upper, lower, left and right sides.

[影像顯示裝置] [Image display device]

本發明之影像顯示裝置,係在顯示器之最表面具有抗反射薄膜或偏光板,該偏光板係在偏光膜之至少單面具有抗反射薄膜者,該抗反射薄膜為依據上述的本發明之製造方法所得者,亦即特徵為至少依序具有透明基材、低折射率層、及覆蓋該低折射率層之全面的防污層,該低折射率層與該防污層使用含有含氟化合物、微粒子及黏結劑樹脂之低折射率層形成用組成物,自該防污層側藉由X射線光電子光譜法(XPS)測定之氟原子/碳原子比為0.6~1.0,且矽原子/碳原子比為小於0.25,該防污層之平均面粗糙度(Ra’)為10nm以下者。 The image display device of the present invention has an antireflection film or a polarizing plate on the outermost surface of the display, and the polarizing plate has an antireflection film on at least one side of the polarizing film, and the antireflection film is manufactured according to the present invention described above. The method obtained, that is, characterized by having at least a transparent substrate, a low refractive index layer, and a comprehensive antifouling layer covering the low refractive index layer, the low refractive index layer and the antifouling layer containing a fluorine-containing compound a composition for forming a low refractive index layer of fine particles and a binder resin, and a fluorine atom/carbon atom ratio of 0.6 to 1.0 as measured by X-ray photoelectron spectroscopy (XPS) from the side of the antifouling layer, and a germanium atom/carbon The atomic ratio is less than 0.25, and the average surface roughness (Ra') of the antifouling layer is 10 nm or less.

作為顯示器,例如較佳可列舉液晶顯示器(LCD)、電漿顯示器面板(PDP)、陰極管顯示裝置(CRT)、無機及有機電致發光顯示器、背投型顯示器、螢光顯示管(VFD)、觸控面板、行動電腦、電子紙等之顯示器等。此外,作為影像顯示裝置,較佳可列舉具備此等之顯示器的裝置,例如個人電腦、個人數位助理(PDA)、遊戲機、數位相機、數位攝影機等。 As the display, for example, a liquid crystal display (LCD), a plasma display panel (PDP), a cathode tube display device (CRT), an inorganic and organic electroluminescence display, a rear projection type display, and a fluorescent display tube (VFD) are preferable. , touch panels, mobile computers, electronic paper and other displays. Further, as the video display device, a device including such a display, such as a personal computer, a personal digital assistant (PDA), a game machine, a digital camera, a digital camera, or the like, is preferable.

[實施例] [Examples]

以下,依據實施例進一步詳細說明本發明,惟本發明並非受此例任何限定者。 Hereinafter, the present invention will be described in further detail based on the examples, but the present invention is not limited by the examples.

(評價方法) (evaluation method) 1.最低反射率(抗反射特性之評價) 1. Minimum reflectance (evaluation of anti-reflection characteristics)

對於在各實施例及比較例所得之抗反射薄膜,在透明基材未設置低折射率層之側貼上用以防止該薄膜之背面反射的黑色膠帶,自低折射率層之面,使用具備5度之正反射測定裝置的光譜儀(「UV-2550(型號)」:島津製作所(股)製)測定反射率,將波長區域380~780nm中的最小值作為最低反射率。最低反射率越小,表示抗反射薄膜具有越優異的抗反射特性。 For the antireflection film obtained in each of the examples and the comparative examples, a black tape for preventing back reflection of the film was attached to the side of the transparent substrate where the low refractive index layer was not provided, and the surface of the low refractive index layer was used. A spectrometer ("UV-2550 (model)": manufactured by Shimadzu Corporation) manufactured by a 5 degree specular reflection measuring device measures the reflectance, and the minimum value among the wavelength regions of 380 to 780 nm is the lowest reflectance. The smaller the minimum reflectance, the more excellent the antireflection property of the antireflection film.

2.塗布面之評價 2. Evaluation of coated surface

在未形成低折射率層之側的薄膜表面貼上黑色膠帶,自形成低折射率層之面,以三波長燈目視觀察,依據下述之基準評價結果。 A black tape was attached to the surface of the film on the side where the low refractive index layer was not formed, and the surface of the low refractive index layer was formed, and visually observed with a three-wavelength lamp, and the results were evaluated based on the following criteria.

○:低折射率層之面為均勻一致。 ○: The faces of the low refractive index layer were uniform.

△:低折射率層之面與上述○之評價比較,觀察到輕微翹曲。 △: The surface of the low refractive index layer was slightly warped as compared with the evaluation of the above ○.

×:低折射率層之面呈現輕微白色。 ×: The surface of the low refractive index layer was slightly white.

3.表面的耐摩擦性及黏著性之評價 3. Evaluation of surface abrasion resistance and adhesion

對於在各實施例及比較例所得之抗反射薄膜,對鋼絲絨(日本鋼絲絨股份有限公司製BONSTAR #0000)施加300g/cm2的負重來回摩擦10次,依據下述之基準評價目視的結果。傷痕越少,表示耐摩擦性及低折射率層與防污層之黏著性越優異。 For the antireflection film obtained in each of the examples and the comparative examples, steel wool (BONSTAR #0000 manufactured by Nippon Steel Wool Co., Ltd.) was rubbed back and forth 10 times with a load of 300 g/cm 2 , and the visual results were evaluated based on the following criteria. . The less the number of scratches, the more excellent the abrasion resistance and the adhesion of the low refractive index layer to the antifouling layer.

○:完全未造成傷痕。 ○: No damage was caused at all.

△:傷痕數為1~5條。 △: The number of scars is 1 to 5.

×:傷痕數為6條以上。 ×: The number of scars is six or more.

4.防污性之評價 4. Evaluation of antifouling (1)對於指紋之防污性 (1) Antifouling properties for fingerprints

在各實施例及比較例所得之抗反射薄膜的表面附著指紋後,以BEMCOT M-3(旭化成股份有限公司製)擦拭,以目視確認擦拭的難易度,依據下述之基準評價。 After the fingerprint was attached to the surface of the antireflection film obtained in each of the examples and the comparative examples, the film was wiped with BEMCOT M-3 (manufactured by Asahi Kasei Co., Ltd.), and the ease of wiping was visually confirmed, and evaluated according to the following criteria.

○:可輕易地擦拭指紋。 ○: The fingerprint can be easily wiped.

△:可擦拭指紋。 △: The fingerprint can be wiped.

×:無法擦拭指紋。 ×: The fingerprint cannot be wiped.

(2)以目視確認在各實施例及比較例所得之抗反射薄膜的表面,以油性麥克筆描繪時之狀態、與以布擦拭後之狀態,依據下述之基準評價。 (2) The surface of the antireflection film obtained in each of the examples and the comparative examples was visually confirmed, and the state in which it was drawn with an oil-based stylus pen and the state after wiping with a cloth were evaluated based on the following criteria.

◎:墨水聚成球狀,擦拭容易。 ◎: The ink is gathered into a spherical shape and wiped easily.

○:墨水不沾於表面,線條變細,擦拭容易。 ○: The ink does not stick to the surface, the lines become thinner, and the wiping is easy.

×:在擦拭後殘留墨水的痕跡。 ×: A trace of ink remains after wiping.

5.低折射率層之藉由X射線光電子光譜的原子比之測定 5. Determination of the atomic ratio of the low refractive index layer by X-ray photoelectron spectroscopy

藉由X射線光電子光譜(XPS),分析各實施例及比較例所得之抗反射薄膜的表面(防污層),依據以下方法得到原子比,該原子比係含氟化合物相分離至何種程度並形成防污層之指標。 The surface of the antireflection film (antifouling layer) obtained in each of the examples and the comparative examples was analyzed by X-ray photoelectron spectroscopy (XPS), and the atomic ratio was obtained according to the following method, and the atomic ratio of the fluorine-containing compound phase was separated. And form an indicator of the antifouling layer.

使用裝置係XPS裝置(「ESCALAB 220i-XL(型號)」,THERMOFISHER SCIENTIFIC公司製),使用X射線輸出功率:10kV‧16mA(160W)、透鏡:Large Area XL(磁場透鏡)、孔徑開度:F.O.V.=open,A.A.=open、測定區域:700μm 、光電子接收角:90度(在樣品法線上配置輸入透鏡)、中和帶電:電子中和槍+4(V)‧0.08(mA)、在中和輔助用金屬遮罩的使用下進行分析。利用藉由此測 定所得之抗反射薄膜表面的碳原子、氮原子、氧原子、氟原子、及矽原子之原子組成,計算出氟原子/碳原子比、及矽原子/碳原子比。再者,對於矽原子,藉由Si2p光譜之波峰分離解析,區分在103~104eV附近檢測出波峰的無機矽成分(SiO2)、與在101~102eV附近檢測出波峰的有機矽成分(C-Si-O),測定原子組成,計算出無機矽原子/碳原子比、及有機矽原子/碳原子比。 The device is an XPS device ("ESCALAB 220i-XL (model)", manufactured by THERMOFISHER SCIENTIFIC), using X-ray output power: 10kV‧16mA (160W), lens: Large Area XL (magnetic field lens), aperture opening: FOV =open, AA=open, measurement area: 700μm Photoelectron receiving angle: 90 degrees (input lens is placed on the sample normal line), neutralization and charging: electron neutralization gun +4 (V) ‧0.08 (mA), and analysis under the use of neutral and auxiliary metal mask. The atomic ratio of a carbon atom, a nitrogen atom, an oxygen atom, a fluorine atom, and a ruthenium atom on the surface of the antireflection film obtained by the measurement was used to calculate a fluorine atom/carbon atom ratio and a ruthenium atom/carbon atom ratio. Further, for the germanium atom, the peak composition of the Si2p spectrum is separated and analyzed, and the inorganic germanium component (SiO 2 ) which detects the peak near 103 to 104 eV and the organic germanium component which detects the peak near 101 to 102 eV (C- Si-O), the atomic composition was measured, and an inorganic germanium atom/carbon atom ratio and an organic germanium atom/carbon atom ratio were calculated.

6.表面狀態之評價(接觸角及下落角之測定) 6. Evaluation of surface state (measurement of contact angle and drop angle)

對於各實施例及比較例所得之抗反射薄膜,使用十六烷作為測定液體,利用量角器(「DM-500(型號)」,協和界面科學股份有限公司製)分別測定接觸角及下落角。液滴量定為2μl。 For the antireflection film obtained in each of the examples and the comparative examples, hexadecane was used as the measurement liquid, and the contact angle and the drop angle were measured by a protractor ("DM-500 (model)", manufactured by Kyowa Interface Science Co., Ltd.). The amount of droplets was set to 2 μl.

7.表面狀態之評價(藉由原子力顯微鏡的表面觀察之評價) 7. Evaluation of surface state (evaluation by surface observation by atomic force microscopy)

利用原子力顯微鏡(AFM)(「L-trace(型號)」,SII NANOTECHNOLOGY股份有限公司製),以動力模式(Dynamic Force Mode)掃描振動數:0.4~1.0Hz、掃描範圍:3μm,觀察各實施例及比較例所得之抗反射薄膜的表面之形狀圖及相位圖。懸臂係使用「OMCL-AC160TS-C2(型號)」(KS OLYMPUS股份有限公司製,彈性常數:42N/m)。在此,為了使用於觀察的懸臂不因探針污染而降低解析度,總是使用全新品。又為了防止在觀察時的磨損劣化,而在不犧牲解析度之範圍且盡可能減少對探針之負荷的條件下進行,進行在解析度512像素×256像素之觀察。觀察後利用附屬的軟體修正資料的傾斜。 Atomic force microscope (AFM) ("L-trace (model)", manufactured by SII NANOTECHNOLOGY Co., Ltd.), the number of vibrations in the dynamic mode (Dynamic Force Mode): 0.4 to 1.0 Hz, scanning range: 3 μm, and various examples were observed. And the shape and phase diagram of the surface of the antireflection film obtained in the comparative example. For the cantilever system, "OMCL-AC160TS-C2 (model)" (manufactured by KS OLYMPUS Co., Ltd., elastic constant: 42 N/m) was used. Here, in order to reduce the resolution due to contamination of the probe by the cantilever used for observation, a brand new product is always used. Further, in order to prevent deterioration of wear during observation, the observation was performed at a resolution of 512 pixels × 256 pixels without sacrificing the range of the resolution and reducing the load on the probe as much as possible. Observe the tilt of the data using the attached software after observation.

藉由此表面觀察,在低折射率層之表面全面相分離並形成防污層之情形,可以確認均勻一致的狀態,另一方面,未在表面全面相分離形成防污層之情形,可以確認作為海島花紋之表面係相分離之部分與未相分離之部分的不均勻花紋。在此,只要是均勻一致的狀態,即可稱為即使目視亦無輕微白化或塗布面之粗糙、良好地形成低折射率層及防污層。 By the surface observation, in the case where the surface of the low refractive index layer is completely phase-separated and an antifouling layer is formed, a uniform state can be confirmed, and on the other hand, the antifouling layer is not completely separated on the surface, and it can be confirmed. The surface of the island pattern is an uneven pattern of a portion separated from the phase and an unseparated portion. Here, as long as it is in a uniform state, it can be said that even if it is visually observed, it is not slightly whitened or the coated surface is rough, and the low refractive index layer and the antifouling layer are favorably formed.

○:防污層係均勻一致。 ○: The antifouling layer is uniform.

△:雖然在防污層沒有海島結構,與上述○之評價比較,觀察到輕微變形。 △: Although there was no island structure in the antifouling layer, slight deformation was observed as compared with the evaluation of ○ above.

×:防污層呈現海島結構,可以目視觀察到輕微白化或塗布面之粗糙。 ×: The antifouling layer exhibited an island structure, and slight whitening or roughening of the coated surface was visually observed.

8.平均面粗糙度(Ra’)之測定 8. Determination of average surface roughness (Ra')

藉由上述之原子力顯微鏡(AFM)觀察表面形狀,利用解析用軟體(SPIwin)進行影像解析,得到平均面粗糙度(Ra’)。 The surface shape was observed by the above-mentioned atomic force microscope (AFM), and image analysis was performed by the analysis software (SPIwin) to obtain an average surface roughness (Ra').

製備例1:低折射率層形成用組成物1之製備 Preparation Example 1: Preparation of Composition 1 for Forming Low Refractive Index Layer

以下述質量比混合下述組成之成分,製備低折射率層形成用組成物1。 The component of the following composition was mixed at the following mass ratio to prepare a composition 1 for forming a low refractive index layer.

低折射率層形成用組成物1 Low refractive index layer forming composition 1

新戊四醇三丙烯酸酯(PETA):0.10質量份 Neopentyl alcohol triacrylate (PETA): 0.10 parts by mass

含氟化合物*1:1.23質量份 Fluorine-containing compound *1 : 1.23 parts by mass

中空矽石粒子分散液*2:6.69質量份 Hollow vermiculite particle dispersion *2 : 6.69 parts by mass

實心矽石粒子分散液*3:0.74質量份 Solid vermiculite particle dispersion *3 : 0.74 parts by mass

含氟聚合物*4:2.79質量份 Fluoropolymer *4 : 2.79 parts by mass

含氟單體*5:2.23質量份 Fluorinated monomer *5 : 2.23 parts by mass

光聚合起始劑*6:0.08質量份 Photopolymerization initiator *6 : 0.08 parts by mass

甲基異丁基酮:57.03質量份 Methyl isobutyl ketone: 57.03 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

*1,「X-71-1203M(商品名)」:信越化學股份有限公司製,20質量%溶液(溶劑:甲基異丁基酮,光硬化性反應基:(甲基)丙烯醯基,含有具有反應性的矽烷單元、及具有全氟聚醚基的矽烷單元之含氟化合物)。 *1, "X-71-1203M (trade name)": 20% by mass solution manufactured by Shin-Etsu Chemical Co., Ltd. (solvent: methyl isobutyl ketone, photocurable reactive group: (methyl) acrylonitrile group, A fluorine-containing compound containing a reactive decane unit and a decane unit having a perfluoropolyether group.

*2,分散液中之中空矽石粒子含量係20質量%,溶劑(甲基異丁基酮)含量係80質量%。此外,中空矽石粒子之平均粒徑係60nm,並具有藉由表面處理之光硬化性反應基。 *2, the hollow vermiculite particle content in the dispersion was 20% by mass, and the solvent (methyl isobutyl ketone) content was 80% by mass. Further, the hollow vermiculite particles have an average particle diameter of 60 nm and have a photocurable reactive group by surface treatment.

*3,「MIBK-SD(商品名)」,平均一次粒徑:12nm,固體成分:30質量%,溶劑:甲基異丁基酮,實心矽石粒子係具有藉由表面處理之光硬化性反應基的甲基丙烯醯基。 *3, "MIBK-SD (trade name)", average primary particle diameter: 12 nm, solid content: 30% by mass, solvent: methyl isobutyl ketone, solid vermiculite particles having photohardenability by surface treatment The methacryl oxime group of the reactive group.

*4,「OPSTAR JN35(商品名)」,JSR公司製,20質量%溶液(溶劑:甲基異丁基酮)。 *4, "OPSTAR JN35 (trade name)", a 20% by mass solution (solvent: methyl isobutyl ketone) manufactured by JSR Corporation.

*5,「LINC 3A(商品名)」:共榮社化學股份有限公司製,具有新戊四醇骨架之含氟單體,20質量%溶液(溶劑:甲基異丁基酮)。 *5, "LINC 3A (trade name)": a fluorine-containing monomer having a neopentyl alcohol skeleton and a 20% by mass solution (solvent: methyl isobutyl ketone), manufactured by Kyoeisha Chemical Co., Ltd.

*6,「IRGACURE 127(商品名)」:Ciba Specialty Chemicals(股)製。 *6, "IRGACURE 127 (trade name)": manufactured by Ciba Specialty Chemicals Co., Ltd.

製備例2:硬塗層形成用組成物1之製備 Preparation Example 2: Preparation of Composition 1 for Hard Coating Formation

以下述質量比混合下述組成之成分,製備硬塗層形 成用組成物1。 A hard coat layer was prepared by mixing the components of the following composition in the following mass ratio Composition 1 was used.

硬塗層形成用組成物1 Hard coating forming composition 1

胺基甲酸酯丙烯酸酯*7:15質量份 Urethane acrylate *7 : 15 parts by mass

異三聚氰酸EO變性三丙烯酸酯*8:15質量份 Isocyanuric acid EO modified triacrylate *8 : 15 parts by mass

聚合起始劑*9:2質量份 Polymerization initiator *9 : 2 parts by mass

甲基乙基酮:70質量份 Methyl ethyl ketone: 70 parts by mass

*7,「UV1700B(商品名)」,日本合成化學股份有限公司製。 *7, "UV1700B (trade name)", manufactured by Nippon Synthetic Chemical Co., Ltd.

*8,「M315(商品名)」,東亞合成股份有限公司製。 *8, "M315 (trade name)", manufactured by East Asia Synthetic Co., Ltd.

*9,「IRGACURE 184(商品名)」:Ciba Specialty Chemicals(股)製。 *9, "IRGACURE 184 (trade name)": manufactured by Ciba Specialty Chemicals.

實施例1 Example 1

在厚度80μm之三乙醯基纖維素(TAC)樹脂薄膜上,棒塗布硬塗層形成用組成物1,進行50℃、1分鐘之乾燥,除去溶劑後,利用紫外線照射裝置(FUSION UV SYSTEMS JAPAN股份有限公司製光源H-BULB),以輻射劑量30mJ/cm2進行紫外線照射使其硬化,得到厚度約10μm之硬塗層。 On a triacetonitrile-based cellulose (TAC) resin film having a thickness of 80 μm, the bar was coated with the composition 1 for forming a hard coat layer, dried at 50 ° C for 1 minute, and after removing the solvent, a UV irradiation device (FUSION UV SYSTEMS JAPAN) was used. The light source H-BULB manufactured by the company was hardened by ultraviolet irradiation at a radiation dose of 30 mJ/cm 2 to obtain a hard coat layer having a thickness of about 10 μm.

接著,在所得之硬塗層上,棒塗布在製備例1所製備之低折射率層形成用組成物1,形成塗膜(步驟(1));施行50℃、1分鐘之加熱處理,使塗膜相分離成低折射率相與防污相,並且除去溶劑後(步驟(2));以輻射劑量200mJ/cm2進行紫外線照射使其硬化,形成低折射率層與防污層(步驟(3)),得到具有透明基材、硬塗層、低折射率層、及防污層之抗反射薄膜。在硬化時溶劑幾乎完全 蒸發,而且低折射率層與防污層的厚度之合計係約100nm。此外,藉由X射線光電子光譜法(XPS)測定原子比時,亦檢測出包含於低折射率層中之微粒子的原子。若考慮X射線光電子光譜法(XPS)防污層之厚度係1~3nm,推測所得之防污層的厚度係在1~3nm之範圍內。 Next, the obtained low-refractive-index layer-forming composition 1 prepared in Preparation Example 1 was applied onto the obtained hard coat layer to form a coating film (step (1)); heat treatment was performed at 50 ° C for 1 minute to make The coating film phase is separated into a low refractive index phase and an antifouling phase, and after removing the solvent (step (2)); ultraviolet irradiation is performed at a radiation dose of 200 mJ/cm 2 to harden it to form a low refractive index layer and an antifouling layer (step (3)) An antireflection film having a transparent substrate, a hard coat layer, a low refractive index layer, and an antifouling layer is obtained. The solvent evaporated almost completely at the time of hardening, and the total thickness of the low refractive index layer and the antifouling layer was about 100 nm. Further, when the atomic ratio is measured by X-ray photoelectron spectroscopy (XPS), atoms of the fine particles contained in the low refractive index layer are also detected. Considering that the thickness of the X-ray photoelectron spectroscopy (XPS) antifouling layer is 1 to 3 nm, the thickness of the obtained antifouling layer is estimated to be in the range of 1 to 3 nm.

將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第1表。此外,將原子力顯微鏡(形狀圖及相位圖)表示於第4圖。 The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in Table 1. In addition, an atomic force microscope (shape drawing and phase diagram) is shown in Fig. 4.

實施例2 Example 2

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物2以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第1表。此外,將原子力顯微鏡圖(形狀圖及相位圖)表示於第5圖。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in Example 1 was replaced by the composition 2 for forming a low refractive index layer described below. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in Table 1. Further, an atomic force microscope diagram (shape diagram and phase diagram) is shown in Fig. 5.

低折射率層形成用組成物2 Low refractive index layer forming composition 2

新戊四醇三丙烯酸酯(PETA):1.32質量份 Neopentyl alcohol triacrylate (PETA): 1.32 parts by mass

含氟化合物*1:1.32質量份 Fluorine-containing compound *1 : 1.32 parts by mass

中空矽石粒子分散液*2:6.61質量份 Hollow vermiculite particle dispersion *2 : 6.61 parts by mass

光聚合起始劑*6:0.07質量份 Photopolymerization initiator *6 : 0.07 parts by mass

甲基異丁基酮:61.03質量份 Methyl isobutyl ketone: 61.03 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

實施例3 Example 3

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物3以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據 上述評價方法所評價之結果表示於第1表。此外,將原子力顯微鏡圖(形狀圖及相位圖)表示於第6圖。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in Example 1 was replaced by the composition 3 for forming a low refractive index layer described below. For the resulting antireflective film, The results of the evaluation by the above evaluation methods are shown in the first table. Further, an atomic force microscope diagram (shape diagram and phase diagram) is shown in Fig. 6.

低折射率層形成用組成物3 Low refractive index layer forming composition 3

新戊四醇三丙烯酸酯(PETA):0.12質量份 Neopentyl alcohol triacrylate (PETA): 0.12 parts by mass

含氟化合物*1:2.07質量份 Fluorine-containing compound *1 : 2.07 parts by mass

中空矽石粒子分散液*2:6.28質量份 Hollow vermiculite particle dispersion *2 : 6.28 parts by mass

實心矽石粒子分散液*3:0.7質量份 Solid vermiculite particle dispersion *3 : 0.7 parts by mass

含氟聚合物*4:2.62質量份 Fluoropolymer *4 : 2.62 parts by mass

含氟單體*5:2.09質量份 Fluorine monomer *5 : 2.09 parts by mass

光聚合起始劑*6:0.07質量份 Photopolymerization initiator *6 : 0.07 parts by mass

甲基異丁基酮:56.96質量份 Methyl isobutyl ketone: 56.96 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

製備例3:高折射率層形成用組成物之製備例 Preparation Example 3: Preparation Example of Composition for Forming High Refractive Index Layer

在美乃滋瓶投入並混合金紅石型氧化鈦(「TTO51(C)(商品名)」,石原產業股份有限公司製,一次粒徑:0.01~0.03μm):10質量份、含有陰離子性基之分散劑(「DISPERBYK-163(商品名)」,BYK CHEMIE JAPAN公司製):2質量份、及甲基異丁基酮:48質量份,製作混合物。相對於所得之混合物,使用約其4倍量的氧化鋯珠( 0.3mm)以塗料振盪機進行10小時的攪拌,製備高折射率層形成用組成物。 Injected and mixed rutile-type titanium oxide in a cannabis bottle ("TTO51(C) (trade name)", manufactured by Ishihara Sangyo Co., Ltd., primary particle size: 0.01 to 0.03 μm): 10 parts by mass, containing anionic group Dispersing agent ("DISPERBYK-163 (trade name)", manufactured by BYK CHEMIE JAPAN Co., Ltd.): 2 parts by mass and methyl isobutyl ketone: 48 parts by mass to prepare a mixture. About 4 times the amount of zirconia beads are used relative to the resulting mixture ( 0.3 mm) A composition for forming a high refractive index layer was prepared by stirring for 10 hours with a paint shaker.

製備例4:中折射率層形成用組成物之製備例 Preparation Example 4: Preparation Example of Medium Refractive Index Layer Forming Composition

除了在上述高折射率層形成用組成物之製備例中,將金紅石型氧化鈦取代為摻雜銻之氧化錫(「SN-100P(商品名)」,石原產業股份有限公司製)、使含有陰離子 性基之分散劑為「DISPERBYK-111(商品名)」(BYK CHEMIE JAPAN公司製)以外,與高折射率層形成用組成物之製備例同樣地製備中折射率層形成用組成物。 In addition to the preparation example of the composition for forming a high refractive index layer, the rutile-type titanium oxide is replaced by tin oxide doped with antimony ("SN-100P (trade name)", manufactured by Ishihara Sangyo Co., Ltd.), Containing anions The medium-refractive-index layer-forming composition was prepared in the same manner as in the preparation example of the composition for forming a high refractive index layer, except that the dispersing agent was a "DISPERBYK-111 (trade name)" (manufactured by BYK CHEMIE JAPAN Co., Ltd.).

實施例4 Example 4

在厚度80μm之三乙醯基纖維素(TAC)樹脂薄膜上,棒塗布上述硬塗層形成用組成物1,進行50℃、1分鐘之乾燥,除去溶劑後,利用紫外線照射裝置(FUSION UV SYSTEMS JAPAN股份有限公司製光源H-BULB),以輻射劑量30mJ/cm2進行紫外線照射使其硬化,得到厚度約10μm之硬塗層。 The above-mentioned hard-coat layer-forming composition 1 was applied to a triacetonitrile-based cellulose (TAC) resin film having a thickness of 80 μm, dried at 50 ° C for 1 minute, and after removing the solvent, a UV irradiation device (FUSION UV SYSTEMS) was used. A light source H-BULB manufactured by JAPAN Co., Ltd. was irradiated with ultraviolet rays at a radiation dose of 30 mJ/cm 2 to obtain a hard coat layer having a thickness of about 10 μm.

在所得之硬塗層上,棒塗布在製備例4所得之中折射率層形成用組成物,以輻射劑量200mJ/cm2進行紫外線照射使其硬化,形成厚度約120nm之高折射率層,棒塗布在製備例3所得之高折射率層形成用組成物,以輻射劑量200mJ/cm2進行紫外線照射使其硬化,形成厚度約60nm之高折射率層。接著,棒塗布下述低折射率層形成用組成物4,形成塗膜(步驟(1));施行50℃、1分鐘之加熱處理,使塗膜相分離成低折射率相與防污相,並且除去溶劑後(步驟(2));以輻射劑量200mJ/cm2進行紫外線照射使其硬化,形成低折射率層與防污層(步驟(3)),得到具有透明基材、硬塗層、中折射率層、高折射率層、低折射率層、及防污層之抗反射薄膜。在硬化時溶劑幾乎完全蒸發,而且低折射率層與防污層的厚度之合計係約100nm。此外,藉由X射線光電子光譜法(XPS)測定原子比時,亦檢測出包含於低折射率層中之微粒子的原子。 若考慮X射線光電子光譜法(XPS)防污層之厚度係1~3nm,推測所得之防污層的厚度係在1~3nm之範圍內。 On the obtained hard coat layer, the rod was coated with the composition for forming a refractive index layer obtained in Preparation Example 4, and irradiated with ultraviolet rays at a radiation dose of 200 mJ/cm 2 to form a high refractive index layer having a thickness of about 120 nm. The composition for forming a high refractive index layer obtained in Preparation Example 3 was applied and cured by ultraviolet irradiation at a radiation dose of 200 mJ/cm 2 to form a high refractive index layer having a thickness of about 60 nm. Next, the following composition for forming the low refractive index layer is applied to the rod to form a coating film (step (1)); heat treatment is performed at 50 ° C for 1 minute to phase separate the coating film into a low refractive index phase and an antifouling phase. And removing the solvent (step (2)); curing with ultraviolet radiation at a radiation dose of 200 mJ/cm 2 to form a low refractive index layer and an antifouling layer (step (3)), thereby obtaining a transparent substrate, hard coating An antireflection film of a layer, a medium refractive index layer, a high refractive index layer, a low refractive index layer, and an antifouling layer. The solvent evaporated almost completely at the time of hardening, and the total thickness of the low refractive index layer and the antifouling layer was about 100 nm. Further, when the atomic ratio is measured by X-ray photoelectron spectroscopy (XPS), atoms of the fine particles contained in the low refractive index layer are also detected. Considering that the thickness of the X-ray photoelectron spectroscopy (XPS) antifouling layer is 1 to 3 nm, the thickness of the obtained antifouling layer is estimated to be in the range of 1 to 3 nm.

將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第1表。此外,將原子力顯微鏡圖(形狀圖及相位圖)表示於第7圖。 The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in Table 1. Further, an atomic force microscope diagram (shape diagram and phase diagram) is shown in Fig. 7.

低折射率層形成用組成物4 Low refractive index layer forming composition 4

新戊四醇三丙烯酸酯(PETA):0.32質量份 Neopentyl alcohol triacrylate (PETA): 0.32 parts by mass

含氟化合物*1:0.71質量份 Fluorine-containing compound *1 : 0.71 parts by mass

中空矽石粒子分散液*2:6.42質量份 Hollow vermiculite particle dispersion *2 : 6.42 parts by mass

實心矽石粒子分散液*3:1.43質量份 Solid vermiculite particle dispersion *3 : 1.43 parts by mass

含氟聚合物*4:3.21質量份 Fluoropolymer *4 : 3.21 parts by mass

含氟單體*5:0.54質量份 Fluorine monomer *5 : 0.54 parts by mass

光聚合起始劑*6:0.07質量份 Photopolymerization initiator *6 : 0.07 parts by mass

甲基異丁基酮:58.2質量份 Methyl isobutyl ketone: 58.2 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

實施例5 Example 5

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物5以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第1表。此外,將原子力顯微鏡圖(形狀圖及相位圖)表示於第8圖。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in Example 1 was replaced with the composition 5 for forming a low refractive index layer described below. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in Table 1. Further, an atomic force microscope diagram (shape diagram and phase diagram) is shown in Fig. 8.

低折射率層形成用組成物5 Low refractive index layer forming composition 5

新戊四醇三丙烯酸酯(PETA):0.10質量份 Neopentyl alcohol triacrylate (PETA): 0.10 parts by mass

含氟化合物*10:1.23質量份 Fluorine-containing compound *10 : 1.23 parts by mass

中空矽石粒子分散液*2:6.69質量份 Hollow vermiculite particle dispersion *2 : 6.69 parts by mass

實心矽石粒子分散液*3:0.74質量份 Solid vermiculite particle dispersion *3 : 0.74 parts by mass

含氟聚合物*4:2.79質量份 Fluoropolymer *4 : 2.79 parts by mass

含氟單體*5:2.23質量份 Fluorinated monomer *5 : 2.23 parts by mass

光聚合起始劑*6:0.08質量份 Photopolymerization initiator *6 : 0.08 parts by mass

甲基異丁基酮:57.04質量份 Methyl isobutyl ketone: 57.04 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

*10,「X-71-1205(商品名)」:信越化學股份有限公司製,20質量%溶液(溶劑:甲基異丁基酮及甲基乙基酮之混合物,光硬化性反應基:(甲基)丙烯醯基,含有具有反應性的矽烷單元、及具有全氟聚醚基的矽烷單元之含氟化合物)。 *10, "X-71-1205 (trade name)": 20% by mass solution manufactured by Shin-Etsu Chemical Co., Ltd. (solvent: a mixture of methyl isobutyl ketone and methyl ethyl ketone, photocurable reactive group: A (meth) acrylonitrile group containing a fluorinated compound having a reactive decane unit and a decane unit having a perfluoropolyether group.

實施例6 Example 6

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物6以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第1表。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in Example 1 was replaced by the composition 6 for forming a low refractive index layer described below. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in Table 1.

低折射率層形成用組成物6 Low refractive index layer forming composition 6

二新戊四醇六丙烯酸酯(DPHA):1.32質量份 Dipentaerythritol hexaacrylate (DPHA): 1.32 parts by mass

含氟化合物*1:1.32質量份 Fluorine-containing compound *1 : 1.32 parts by mass

中空矽石粒子分散液*2:6.61質量份 Hollow vermiculite particle dispersion *2 : 6.61 parts by mass

光聚合起始劑*6:0.07質量份 Photopolymerization initiator *6 : 0.07 parts by mass

甲基異丁基酮:61.03質量份 Methyl isobutyl ketone: 61.03 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

實施例7 Example 7

除了將實施例1中之低折射率層形成用組成物1取代 為下述之低折射率層形成用組成物7以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第1表。 Substituting the low refractive index layer forming composition 1 in Example 1 An antireflection film was obtained in the same manner as in Example 1 except for the composition 7 for forming a low refractive index layer described below. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in Table 1.

低折射率層形成用組成物7 Low refractive index layer forming composition 7

新戊四醇三丙烯酸酯(PETA):0.10質量份 Neopentyl alcohol triacrylate (PETA): 0.10 parts by mass

含氟化合物*1:2.93質量份 Fluorine-containing compound *1 : 2.93 parts by mass

中空矽石粒子分散液*2:5.86質量份 Hollow vermiculite particle dispersion *2 : 5.86 parts by mass

實心矽石粒子分散液*3:0.65質量份 Solid vermiculite particle dispersion *3 : 0.65 parts by mass

含氟聚合物*4:2.44質量份 Fluoropolymer *4 : 2.44 parts by mass

含氟單體*5:1.95質量份 Fluorine monomer *5 : 1.95 parts by mass

光聚合起始劑*6:0.07質量份 Photopolymerization initiator *6 : 0.07 parts by mass

甲基異丁基酮:56.89質量份 Methyl isobutyl ketone: 56.89 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

實施例8 Example 8

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物8以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第1表。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in Example 1 was replaced by the composition 8 for forming a low refractive index layer described below. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in Table 1.

低折射率層形成用組成物8 Low refractive index layer forming composition 8

新戊四醇三丙烯酸酯(PETA):1.32質量份 Neopentyl alcohol triacrylate (PETA): 1.32 parts by mass

含氟化合物*1:1.32質量份 Fluorine-containing compound *1 : 1.32 parts by mass

中空矽石粒子分散液*2:6.61質量份 Hollow vermiculite particle dispersion *2 : 6.61 parts by mass

光聚合起始劑*6:0.07質量份 Photopolymerization initiator *6 : 0.07 parts by mass

甲基異丁基酮:61.03質量份 Methyl isobutyl ketone: 61.03 parts by mass

甲苯:29.1質量份 Toluene: 29.1 parts by mass

實施例9 Example 9

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物9以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第1表。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in Example 1 was replaced by the composition 9 for forming a low refractive index layer described below. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in Table 1.

低折射率層形成用組成物9 Low refractive index layer forming composition 9

新戊四醇三丙烯酸酯(PETA):0.11質量份 Neopentyl alcohol triacrylate (PETA): 0.11 parts by mass

含氟化合物*11:0.25質量份 Fluorine-containing compound *11 : 0.25 parts by mass

中空矽石粒子分散液*2:6.69質量份 Hollow vermiculite particle dispersion *2 : 6.69 parts by mass

實心矽石粒子分散液*3:0.74質量份 Solid vermiculite particle dispersion *3 : 0.74 parts by mass

含氟聚合物*12:2.79質量份 Fluoropolymer *12 : 2.79 parts by mass

含氟單體*5:2.23質量份 Fluorinated monomer *5 : 2.23 parts by mass

光聚合起始劑*6:0.08質量份 Photopolymerization initiator *6 : 0.08 parts by mass

甲基異丁基酮:58.01質量份 Methyl isobutyl ketone: 58.01 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

*11,「5101X(商品名)」:SOLVAY SPECIALTY POLYMERS JAPAN股份有限公司製,兩末端4官能甲基丙烯酸酯變性全氟聚醚化合物,不具有矽烷單元之含氟化合物)。 *11, "5101X (trade name)": SOLVAY SPECIALTY POLYMERS JAPAN Co., Ltd., a two-terminal tetrafunctional methacrylate modified perfluoropolyether compound, and a fluorine-containing compound having no decane unit).

*12,「OPSTAR TU2224(商品名)」,JSR公司製,20質量%溶液(溶劑:甲基異丁基酮)。 *12, "OPSTAR TU2224 (trade name)", a 20% by mass solution (solvent: methyl isobutyl ketone) manufactured by JSR Corporation.

比較例1 Comparative example 1

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物10以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依 據上述評價方法所評價之結果表示於第2表。此外,將原子力顯微鏡圖(形狀圖及相位圖)表示於第9圖。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in Example 1 was replaced by the composition 10 for forming a low refractive index layer described below. For the resulting anti-reflective film, The results evaluated by the above evaluation methods are shown in the second table. Further, an atomic force microscope diagram (shape diagram and phase diagram) is shown in Fig. 9.

低折射率層形成用組成物10 Low refractive index layer forming composition 10

新戊四醇三丙烯酸酯(PETA):0.12質量份 Neopentyl alcohol triacrylate (PETA): 0.12 parts by mass

含氟化合物*1:0.52質量份 Fluorine-containing compound *1 : 0.52 parts by mass

中空矽石粒子分散液*2:7.04質量份 Hollow vermiculite particle dispersion *2 : 7.04 parts by mass

實心矽石粒子分散液*3:0.78質量份 Solid vermiculite particle dispersion *3 : 0.78 parts by mass

含氟聚合物*4:2.93質量份 Fluoropolymer *4 : 2.93 parts by mass

含氟單體*5:2.35質量份 Fluorine monomer *5 : 2.35 parts by mass

光聚合起始劑*6:0.08質量份 Photopolymerization initiator *6 : 0.08 parts by mass

甲基異丁基酮:57.09質量份 Methyl isobutyl ketone: 57.09 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

比較例2 Comparative example 2

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物11以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第2表。此外,將原子力顯微鏡圖(形狀圖及相位圖)表示於第10圖。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in Example 1 was replaced by the composition 11 for forming a low refractive index layer described below. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in the second table. Further, an atomic force microscope diagram (shape diagram and phase diagram) is shown in Fig. 10.

低折射率層形成用組成物11 Low refractive index layer forming composition 11

新戊四醇三丙烯酸酯(PETA):0.09質量份 Neopentyl alcohol triacrylate (PETA): 0.09 parts by mass

含氟化合物*1:3.79質量份 Fluorine-containing compound *1 : 3.79 parts by mass

中空矽石粒子分散液*2:5.44質量份 Hollow vermiculite particle dispersion *2 : 5.44 parts by mass

實心矽石粒子分散液*3:0.6質量份 Solid vermiculite particle dispersion *3 : 0.6 parts by mass

含氟聚合物*4:2.27質量份 Fluoropolymer *4 : 2.27 parts by mass

含氟單體*5:1.81質量份 Fluorine monomer *5 : 1.81 parts by mass

光聚合起始劑*6:0.06質量份 Photopolymerization initiator *6 : 0.06 parts by mass

甲基異丁基酮:56.82質量份 Methyl isobutyl ketone: 56.82 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

比較例3 Comparative example 3

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物12以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第2表。此外,將原子力顯微鏡圖(形狀圖及相位圖)表示於第11圖。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in the first embodiment was replaced with the composition 12 for forming the low refractive index layer described below. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in the second table. Further, an atomic force microscope diagram (shape diagram and phase diagram) is shown in Fig. 11.

低折射率層形成用組成物12 Low refractive index layer forming composition 12

新戊四醇三丙烯酸酯(PETA):0.32質量份 Neopentyl alcohol triacrylate (PETA): 0.32 parts by mass

中空矽石粒子分散液*2:6.42質量份 Hollow vermiculite particle dispersion *2 : 6.42 parts by mass

實心矽石粒子分散液*3:1.43質量份 Solid vermiculite particle dispersion *3 : 1.43 parts by mass

含氟聚合物*4:3.21質量份 Fluoropolymer *4 : 3.21 parts by mass

含氟單體*5:0.54質量份 Fluorine monomer *5 : 0.54 parts by mass

光聚合起始劑*6:0.07質量份 Photopolymerization initiator *6 : 0.07 parts by mass

甲基異丁基酮:58.2質量份 Methyl isobutyl ketone: 58.2 parts by mass

丙二醇單甲基醚乙酸酯:29.1質量份 Propylene glycol monomethyl ether acetate: 29.1 parts by mass

比較例4 Comparative example 4

除了將實施例1中之低折射率層形成用組成物1取代為下述之低折射率層形成用組成物13以外,與實施例1同樣地得到抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第2表。 An antireflection film was obtained in the same manner as in Example 1 except that the composition 1 for forming a low refractive index layer in Example 1 was replaced by the composition 13 for forming a low refractive index layer described below. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in the second table.

低折射率層形成用組成物13 Low refractive index layer forming composition 13

新戊四醇三丙烯酸酯(PETA):2.64質量份 Neopentyl alcohol triacrylate (PETA): 2.64 parts by mass

含氟化合物*1:1.32質量份 Fluorine-containing compound *1 : 1.32 parts by mass

光聚合起始劑*6:0.07質量份 Photopolymerization initiator *6 : 0.07 parts by mass

甲基異丁基酮:95.42質量份 Methyl isobutyl ketone: 95.42 parts by mass

比較例5 Comparative Example 5

將在實施例1所使用之含氟化合物以間二三氟甲苯稀釋為固體成分濃度3質量%之溶液,準備作為防污膜蒸鍍源。 The fluorine-containing compound used in Example 1 was diluted with m-difluorotoluene to a solution having a solid concentration of 3 mass%, and was prepared as an antifouling film deposition source.

在寬度:500mm、厚度:80μm、長度:500m之三乙醯基纖維素(TAC)樹脂薄膜上,凹版塗布硬塗層形成用組成物1,凹版塗布下述之低折射率層形成用組成物13,進行70℃、1分鐘之乾燥,除去溶劑後,以輻射劑量200mJ/cm2進行紫外線照射使其硬化,形成厚度約10μm之硬塗層與厚度約100nm之低折射率層,得到具有透明基材/硬塗層/低折射率層之積層體。 On the triacetyl cellulose (TAC) resin film having a width of 500 mm, a thickness of 80 μm, and a length of 500 m, the composition for forming a hard coat layer was gravure-coated, and the composition for forming a low refractive index layer described below was gravure-coated. 13. Drying at 70 ° C for 1 minute, removing the solvent, and curing by ultraviolet irradiation at a radiation dose of 200 mJ/cm 2 to form a hard coat layer having a thickness of about 10 μm and a low refractive index layer having a thickness of about 100 nm, thereby obtaining transparency. A laminate of a substrate/hard coat layer/low refractive index layer.

接著,在捲取式蒸鍍裝置設置上述防污膜蒸鍍源與積層體,真空排氣至1e-4Torr以下後,開始以5m/分鐘之運轉速度捲取該積層體,以非接觸加熱式之加熱燈管蒸發該防污膜蒸鍍源,得到在該積層體的低折射率層側形成防污膜之抗反射薄膜。將對於所得之抗反射薄膜,依據上述評價方法所評價之結果表示於第2表。 Next, the anti-fouling film vapor deposition source and the laminate are provided in a coil-type vapor deposition apparatus, and after vacuum evacuation to 1 e -4 Torr or less, the layered body is wound up at an operation speed of 5 m/min to be non-contact heating. The anti-fouling film evaporation source is evaporated by the heating lamp tube to obtain an anti-reflection film in which an anti-fouling film is formed on the low-refractive-index layer side of the laminate. The results of evaluation of the obtained antireflection film according to the above evaluation method are shown in the second table.

*1,相對於100質量份(固體成分)的黏結劑樹脂(使用含氟單體、及含氟聚合物的情形為亦包含此等)及微粒子之合計量,含氟化合物之量(質量份)。在此,固體成分不包含聚合起始劑。 *1, the amount of the fluorine-containing compound (parts by mass) with respect to 100 parts by mass (solid content) of the binder resin (including the case where the fluorine-containing monomer and the fluorine-containing polymer are used) and the total amount of the fine particles ). Here, the solid component does not contain a polymerization initiator.

實施例1~5所得之抗反射薄膜,係在全部的評價均優異,具有優異的抗反射特性、具有優異的耐摩擦性及防污性、且無白化、從接觸角及下落角之結果為具有均勻一致的表面者。此外,就實施例1~5而言,從平均面粗糙度、或者原子力顯微鏡之觀察結果,亦為具有均勻一致之表面者,可確認防污層為以覆蓋低折射率層之上之全面的方式,均勻一致地形成。 The antireflection films obtained in Examples 1 to 5 were excellent in all evaluations, and had excellent antireflection properties, excellent rubbing resistance and antifouling properties, and no whitening, as a result of contact angle and drop angle. A person with a uniform surface. Further, in the examples 1 to 5, from the observation of the average surface roughness or the observation by the atomic force microscope, which is also a uniform surface, it is confirmed that the antifouling layer is a comprehensive covering on the low refractive index layer. The way is formed uniformly.

將黏結劑樹脂從PETA取代為DPHA之實施例6,得到大致良好的物性,然而雖為塗布面大致均勻一致,卻有些許粗糙,而且耐摩擦性有些許下降。此外,將DPHA取代為三羥甲基丙烷三丙烯酸酯(TMPTA)、以及新戊四醇四丙烯酸酯(PETTA),製作抗反射薄膜時,確認可得到與實施例6幾乎同等的結果。含氟化合物之含量多的實施例7,得到大致良好的物性,然而雖為表面狀態大致均勻一致,卻有些許粗糙,而且耐摩擦性有些許下降。將作為溶劑之二醇醚類取代為甲苯的實施例8,推測對微粒子之分散性有些許影響,雖然耐摩擦性有些許下降,但得到大致良好的結果。由此結果,確認將酮類、二醇醚類作為溶劑使用為良好。此外,將專利文獻2所使用的材料作為含氟化合物使用之實施例9,雖然得到在防污層無海島結構、無輕微白化之良好者,然而塗膜面之平滑性 為些許低劣且確認到輕微變形。由此確認含氟化合物較佳為具有矽烷單元。 In Example 6 in which the binder resin was replaced by PETA to DPHA, substantially good physical properties were obtained. However, although the coated surface was substantially uniform, it was somewhat rough and the abrasion resistance was somewhat lowered. Further, when DPHA was replaced by trimethylolpropane triacrylate (TMPTA) and pentaerythritol tetraacrylate (PETTA) to prepare an antireflection film, it was confirmed that almost the same results as in Example 6 were obtained. In Example 7, in which the content of the fluorine-containing compound was large, substantially good physical properties were obtained. However, although the surface state was substantially uniform, it was somewhat rough, and the abrasion resistance was somewhat lowered. Example 8 in which a glycol ether as a solvent was substituted with toluene was presumed to have a slight influence on the dispersibility of fine particles, and although the abrasion resistance was somewhat lowered, a substantially good result was obtained. From this result, it was confirmed that it is good to use a ketone or a glycol ether as a solvent. Further, in Example 9 in which the material used in Patent Document 2 is used as a fluorine-containing compound, although the antifouling layer has no island structure and is not slightly whitened, the smoothness of the coating film surface is obtained. It was a little inferior and confirmed to be slightly deformed. From this, it was confirmed that the fluorine-containing compound preferably has a decane unit.

此外,推測實施例所得之抗反射薄膜中,低折射率層與防污層之厚度的合計係約100nm,且防污層之厚度係在1~3nm之範圍內。 Further, in the antireflection film obtained in the examples, the total thickness of the low refractive index layer and the antifouling layer was about 100 nm, and the thickness of the antifouling layer was in the range of 1 to 3 nm.

另一方面,含氟化合物之含量少的比較例1,雖然抗反射特性係與實施例同等,但由於矽成分多,在防污性並不充分,亦確認到白化。此外,下落角為33°並不能稱為具有均勻一致的表面,從藉由原子力顯微鏡之觀察結果確認到海島結構。茲認為此海島結構是由於含氟矽烷化合物少,無法完全覆蓋低折射率層之最表面、無法形成均勻一致的防污層,而發生者,並認為此係成為輕微白化之主要原因。過量地包含含氟化合物之比較例2,在低折射率層全體發生過剩的相分離,低折射率層之表面全體明顯粗糙,沒有形成均勻一致的防污層。茲認為此粗糙係過剩的含氟化合物將低折射率層中之微粒子的突出部作為導火線而產生凹凸,結果在層之表面全體發生者。而且,由於平均面粗糙度大、包含於防污層之含氟化合物的量多,而該防污層變得柔軟,一旦在評價防污性時作擦拭,就會造成傷痕。此外,不包含含氟化合物,氟原子/碳原子比小於0.6之比較例3,雖然得到均勻一致的表面,由於氟之量少,防污性並不充分。比較例4係未使用微粒子之例子,由於黏結劑樹脂與含氟化合物之互溶性差,造成塗膜全體在塗膜乾燥時變白,無法進行評價。由此結果,可知為了保持黏結劑樹脂與互溶性 差的含氟化合物之平衡、達到最終目的之構成,微粒子之作用係必要的。此外,藉由蒸鍍形成防污層之比較例5,防污性和表面狀態大致良好,但由於沒有如本發明的防污相中之反應性官能基與低折射率相中之某些反應性官能基反應硬化,硬化後的防污層與低折射率層之黏著性弱,耐摩擦性變差。 On the other hand, in Comparative Example 1 in which the content of the fluorine-containing compound was small, the antireflection properties were the same as those in the examples. However, since the antimony component was large, the antifouling property was not sufficient, and whitening was also confirmed. Further, the drop angle of 33° is not called a uniform surface, and the sea-island structure is confirmed from the observation by atomic force microscopy. It is considered that this sea-island structure is considered to be a major cause of slight whitening due to the fact that the fluorine-containing decane compound is small and cannot completely cover the outermost surface of the low-refractive-index layer, and a uniform anti-fouling layer cannot be formed. In Comparative Example 2 in which the fluorine-containing compound was excessively contained, excessive phase separation occurred in the entire low refractive index layer, and the entire surface of the low refractive index layer was rough and the uniform antifouling layer was not formed. It is considered that the coarse fluorine-containing compound causes the projections of the fine particles in the low refractive index layer to have irregularities as a fuse, and as a result, the entire surface of the layer is generated. Further, since the average surface roughness is large and the amount of the fluorine-containing compound contained in the antifouling layer is large, the antifouling layer becomes soft, and when it is wiped when the antifouling property is evaluated, scratches are caused. Further, in Comparative Example 3 which does not contain a fluorine-containing compound and has a fluorine atom/carbon atom ratio of less than 0.6, although a uniform surface is obtained, since the amount of fluorine is small, the antifouling property is not sufficient. In Comparative Example 4, in the case where no fine particles were used, the mutual solubility of the binder resin and the fluorine-containing compound was poor, and the entire coating film became white when the coating film was dried, and the evaluation could not be performed. From this result, it is known that in order to maintain the binder resin and mutual solubility The balance of the poor fluorine-containing compound and the composition of the final purpose are necessary for the action of the fine particles. Further, in Comparative Example 5 in which the antifouling layer was formed by vapor deposition, the antifouling property and the surface state were substantially good, but there was no reaction between the reactive functional group and the low refractive index phase in the antifouling phase of the present invention. The functional group reaction hardens, and the adhesion between the antifouling layer after hardening and the low refractive index layer is weak, and the abrasion resistance is deteriorated.

[產業上之可利用性] [Industrial availability]

依據本發明,可以輕易地製造具有優異的抗反射特性、具有優異的耐摩擦性及防污性,並且抑制至今從未過問的輕微白化之發生的抗反射薄膜。所得之抗反射薄膜適合設置於偏光板、影像顯示裝置。 According to the present invention, it is possible to easily produce an antireflection film which has excellent antireflection characteristics, has excellent rubbing resistance and antifouling property, and suppresses the occurrence of slight whitening which has never been solved so far. The obtained antireflection film is suitably provided on a polarizing plate or an image display device.

1‧‧‧抗反射薄膜 1‧‧‧Anti-reflective film

2‧‧‧透明基材 2‧‧‧Transparent substrate

3‧‧‧低折射率層 3‧‧‧Low refractive index layer

4‧‧‧硬塗層 4‧‧‧hard coating

5‧‧‧中折射率層 5‧‧‧Medium refractive index layer

6‧‧‧高折射率層 6‧‧‧High refractive index layer

7‧‧‧中高折射率層 7‧‧‧Medium and high refractive index layer

8‧‧‧防污層 8‧‧‧Antifouling layer

第1圖係表示本發明之抗反射薄膜的剖面之示意圖。 Fig. 1 is a schematic view showing a cross section of an antireflection film of the present invention.

第2圖係表示本發明之抗反射薄膜的剖面之示意圖。 Fig. 2 is a schematic view showing a cross section of the antireflection film of the present invention.

第3圖係表示本發明之抗反射薄膜的剖面之示意圖。 Fig. 3 is a schematic view showing a cross section of the antireflection film of the present invention.

第4圖係實施例1所得之抗反射薄膜之表面藉由原子力顯微鏡所得之形狀圖及相位圖。 Fig. 4 is a view showing a shape and a phase diagram of the surface of the antireflection film obtained in Example 1 by atomic force microscopy.

第5圖係實施例2所得之抗反射薄膜之表面藉由原子力顯微鏡所得之形狀圖及相位圖。 Fig. 5 is a view showing a shape and a phase diagram of the surface of the antireflection film obtained in Example 2 by atomic force microscopy.

第6圖係實施例3所得之抗反射薄膜之表面藉由原子力顯微鏡所得之形狀圖及相位圖。 Fig. 6 is a view showing a shape and a phase diagram of the surface of the antireflection film obtained in Example 3 by atomic force microscopy.

第7圖係實施例4所得之抗反射薄膜之表面藉由原子力顯微鏡所得之形狀圖及相位圖。 Fig. 7 is a view showing a shape and a phase diagram of the surface of the antireflection film obtained in Example 4 by atomic force microscopy.

第8圖係實施例5所得之抗反射薄膜之表面藉由原子力顯微鏡所得之形狀圖及相位圖。 Fig. 8 is a view showing a shape and a phase diagram of the surface of the antireflection film obtained in Example 5 by atomic force microscopy.

第9圖係比較例1所得之抗反射薄膜之表面藉由原子力顯微鏡所得之形狀圖及相位圖。 Fig. 9 is a view showing a shape and a phase diagram of the surface of the antireflection film obtained in Comparative Example 1 by atomic force microscopy.

第10圖係比較例2所得之抗反射薄膜之表面藉由原子力顯微鏡所得之形狀圖及相位圖。 Fig. 10 is a view showing a shape and a phase diagram of the surface of the antireflection film obtained in Comparative Example 2 by atomic force microscopy.

第11圖係比較例3所得之抗反射薄膜之表面藉由原子力顯微鏡所得之形狀圖及相位圖。 Fig. 11 is a view showing a shape and a phase diagram of the surface of the antireflection film obtained in Comparative Example 3 by atomic force microscopy.

Claims (13)

一種抗反射薄膜之製造方法,其依序包含以下之步驟(1)~(3),該抗反射薄膜至少依序具有透明基材、低折射率層、及防污層,自該防污層側藉由X射線光電子光譜法(XPS)測定之氟原子/碳原子比為0.6~1.0,且矽原子/碳原子比為小於0.25,該防污層之平均面粗糙度(Ra’)為10nm以下;步驟(1)在透明基材上塗布至少含有含氟化合物、微粒子及黏結劑樹脂之低折射率層形成用組成物,形成塗膜之步驟;步驟(2)使該塗膜相分離成低折射率相與防污相之步驟;步驟(3)加熱該低折射率相與該防污相,或對該低折射率相與該防污相照射游離輻射,形成低折射率層與覆蓋該低折射率層之全面的防污層之步驟。 A method for producing an antireflection film, comprising the following steps (1) to (3), wherein the antireflection film has a transparent substrate, a low refractive index layer, and an antifouling layer at least sequentially, from the antifouling layer The fluorine atom/carbon atom ratio measured by X-ray photoelectron spectroscopy (XPS) is 0.6 to 1.0, and the germanium atom/carbon atom ratio is less than 0.25, and the average surface roughness (Ra') of the antifouling layer is 10 nm. Hereinafter, the step (1) is a step of coating a transparent substrate with a composition for forming a low refractive index layer containing at least a fluorine-containing compound, fine particles and a binder resin to form a coating film; and (2) separating the coating film into phases. a step of low refractive index phase and antifouling phase; step (3) heating the low refractive index phase and the antifouling phase, or irradiating the low refractive index phase and the antifouling phase with free radiation to form a low refractive index layer and covering The step of a comprehensive antifouling layer of the low refractive index layer. 如申請專利範圍第1項之抗反射薄膜之製造方法,其中含氟化合物係具有具反應性之矽烷單元及具全氟聚醚基之矽烷單元者。 The method for producing an antireflection film according to claim 1, wherein the fluorine-containing compound has a reactive decane unit and a perfluoropolyether-based decane unit. 如申請專利範圍第2項之抗反射薄膜之製造方法,其中具反應性之矽烷單元及具全氟聚醚基之矽烷單元,分別具有矽氧烷骨架。 The method for producing an antireflection film according to claim 2, wherein the reactive decane unit and the perfluoropolyether group-containing decane unit each have a decane skeleton. 如申請專利範圍第2或3項之抗反射薄膜之製造方法,其中反應性基係選自(甲基)丙烯醯基及乙烯基之至少一種。 The method for producing an antireflection film according to the second or third aspect of the invention, wherein the reactive group is at least one selected from the group consisting of a (meth) acrylonitrile group and a vinyl group. 如申請專利範圍第1至4項中任一項之抗反射薄膜之製 造方法,其中含氟化合物之重量平均分子量為5,000以上。 The manufacture of an antireflection film according to any one of claims 1 to 4 The method wherein the fluorine-containing compound has a weight average molecular weight of 5,000 or more. 如申請專利範圍第1至5項中任一項之抗反射薄膜之製造方法,其中微粒子係矽石微粒子。 The method for producing an antireflection film according to any one of claims 1 to 5, wherein the fine particles are fine particles of vermiculite. 如申請專利範圍第1至6項中任一項之抗反射薄膜之製造方法,其中微粒子包含具有空隙之微粒子。 The method of producing an antireflection film according to any one of claims 1 to 6, wherein the microparticles comprise microparticles having voids. 如申請專利範圍第1至7項中任一項之抗反射薄膜之製造方法,其中微粒子係經表面處理者。 The method for producing an antireflection film according to any one of claims 1 to 7, wherein the fine particles are surface treated. 如申請專利範圍第1至8項中任一項之抗反射薄膜之製造方法,其中黏結劑樹脂係游離輻射硬化性樹脂。 The method for producing an antireflection film according to any one of claims 1 to 8, wherein the binder resin is a free radiation curable resin. 如申請專利範圍第9項之抗反射薄膜之製造方法,其中游離輻射硬化性樹脂包含3官能以上之(甲基)丙烯酸酯。 The method for producing an antireflection film according to claim 9, wherein the free radiation curable resin contains a trifunctional or higher (meth) acrylate. 一種抗反射薄膜,其係藉由如申請專利範圍第1至10項中任一項之抗反射薄膜之製造方法所製造。 An antireflection film produced by the method for producing an antireflection film according to any one of claims 1 to 10. 一種偏光板,其係在偏光膜之至少單面上具有抗反射薄膜,該抗反射薄膜為如申請專利範圍第11項之抗反射薄膜。 A polarizing plate having an antireflection film on at least one side of a polarizing film, the antireflection film being an antireflection film according to claim 11 of the patent application. 一種影像顯示裝置,其係在顯示器之最表面具有抗反射薄膜或偏光板;該偏光板係在偏光膜之至少單面上具有抗反射薄膜者,該抗反射薄膜為如申請專利範圍第11項之抗反射薄膜。 An image display device having an anti-reflection film or a polarizing plate on the outermost surface of the display; the polarizing plate having an anti-reflection film on at least one side of the polarizing film, the anti-reflection film being the eleventh item of the patent application scope Anti-reflective film.
TW101117511A 2011-05-16 2012-05-16 Method for manufacturing anti-reflection film, anti-reflection film, polarizing plate, and image display device TWI530707B (en)

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CN103765249B (en) 2015-11-25
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CN103765249A (en) 2014-04-30
KR101725585B1 (en) 2017-04-10
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WO2012157682A1 (en) 2012-11-22
TWI530707B (en) 2016-04-21

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