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TW201245345A - Coating composition for touch panels, coating film, and touch panel - Google Patents

Coating composition for touch panels, coating film, and touch panel Download PDF

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Publication number
TW201245345A
TW201245345A TW101102659A TW101102659A TW201245345A TW 201245345 A TW201245345 A TW 201245345A TW 101102659 A TW101102659 A TW 101102659A TW 101102659 A TW101102659 A TW 101102659A TW 201245345 A TW201245345 A TW 201245345A
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Prior art keywords
transparent electrode
film
touch panel
metal
coating
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TW101102659A
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Chinese (zh)
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TWI542648B (en
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Kazuki Eguchi
Keita Murakaji
Kenichi Motoyama
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Nissan Chemical Ind Ltd
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/58—Metal-containing linkages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Paints Or Removers (AREA)
  • Position Input By Displaying (AREA)
  • Laminated Bodies (AREA)

Abstract

Provided are: a coating composition which is capable of forming a coating film that has high reliability and controlled refractive index; a coating film which is formed from the composition; and a touch panel which has the coating film on an electrode. A coating composition for touch panels, which is characterized by containing: a first metal alkoxide that is represented by general formula (I); a second metal alkoxide that is represented by general formula (II); a metal salt that is represented by general formula (III); an organic solvent; water; and a precipitation inhibitor. M1(OR1)n (I) R2 lM2(OR3)m-l (II) M3(X)k (III)

Description

201245345 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種觸控面板用塗佈組成物、由該塗佈 組成物所形成之塗佈膜、及具有該塗佈膜觸控面板。 ‘ 【先前技術】 自以往，係於各種目的下於玻璃、陶瓷、金屬、塑膠 等之基材表面上進行無機被膜的形成。藉由於基材表面形 成無機被膜，可對基材賦予電氣特性、光學特性、化學特 性、機械特性等。因此，該等無機被膜，可實用化爲導電 膜、絕緣膜、選擇性透過或吸收光線之膜、抗鹼溶出膜、 耐藥品膜、硬塗膜等。 形成如此之無機被膜之方法，可舉例如 CVD ( Chemical Vapor Deposition，化學蒸氣沉積法）、PVD ( Physical Vapor Deposition，物理蒸氣沉積法）、濺鍍法 等氣相法、或使用烷氧化物等之液相法。 —般而言，氣相法需要如真空蒸鍍裝置之高價且大規 模之裝置。又’亦有可成膜之基材大小或形狀受到限制的 問題。另一方面’使用烷氧化物之液相法，已知有熔膠一 凝膠法。該方法，具有可因應大面積之塗佈、圖型化等之 優點。因此，以液相法所成之無機被膜，大量地做爲電子 元件中之塗佈膜使用（例如，參照專利文獻1 )。特別是 ’最近正探討著於觸控面板的使用》 近年來’智慧型行動電話普及的同時，行動電話之顯 -5- 201245345 示畫面亦大型化。因此，可利用顯示器的顯示進行輸入操 作之觸控面板的開發正蓬勃地進行著。藉由觸控面板’由 於不需要按壓式之鍵等輸入機構，故可謀求顯示畫面的大 型化。 觸控面板，係檢測手指或筆等所觸碰之操作區域的接 觸位置。利用該功能，觸控面板係作爲輸入裝置使用。接 觸位置之檢測方式，有電阻膜方式或靜電容量方式等。電 阻膜方式，係使用相對向之2片基板，相對於此，靜電容 量方式，所使用之基板可爲1片。因此，藉由靜電容量方 式，可構成薄型之觸控面板，可適於可攜式機器等，故近 年來持續進行開發。 於專利文獻2，揭示一種靜電容量方式之觸控面板。 於該觸控面板，於透明基板的一面，配置用以檢測X方向 之座標的第1透明電極、與用以檢測Y方向之座標的第2 透明電極，於各交叉部分存在有層間絕緣裝置以使其不導 通。 觸控面板，係組裝於液晶顯示裝置等之顯示裝置，作 爲付有能檢測觸控位置之觸控面板功能的顯示裝置使用。 由於觸控面板之操作者，係透過觸控面板以目視辨認顯示 裝置’故於透明電極係使用光之透過特性優異的構件。例 如，使用ITO( Indium Tin Oxide，銦錫氧化物）等無機 材料。又，層間絕緣膜，係使用可圖型化、絕緣性之丙烯 酸材料等。 專利文獻1 :日本特開第2 8 8 1 8 4 7號公報 201245345 專利文獻2 :日本特開20 1 0-2 8 1 1 5號公報 【發明內容】 〔發明欲解決之課題〕 如上述之觸控面板，於操作區域會有手指或筆實際地 接觸而按壓等，故需要強度與高可靠性。因此，探討著透 過層間絕緣膜重疊之第1及第2電極之上設置保護膜。 保護膜，係使用能圖型化之丙烯酸材料。然而，由於 丙烯酸材料爲有機材料，故作爲保護膜之硬度不足。又， 當於透明電極使用ITO時，對ITO之密合性弱，而成爲使 觸控面板之可靠性降低之原因之一。再者，丙烯酸材料， 難以利用膠版印刷等印刷技術形成膜。因此，於膜形成之 際，需要利用步驟複雜之光微影技術。 因此，作爲保護膜，探討著取代丙烯酸膜之以無機材 料爲成分之塗佈膜。當爲以無機材料爲成分之膜時，一般 係硬度高，作爲觸控面板之塗佈膜可期待高可靠性。因此 ，對於以無機材料爲成分之塗佈膜，要求能利用印刷技術 來形成膜，並與上述之丙烯酸材料等有機材料之層間絕緣 膜顯示高密合性。 又，於靜電容量方式之觸控面板，ITO等透明電極所 形成之區域、與未形成透明電極之區域，會產生反射率的 差異。因此，透明電極之圖案會有目視辨認性、顯示性降 低的問題。 如上述，以往之觸控面板，係使用丙烯酸膜作爲透明 -7- 201245345 電極上之保護膜材料。然而，於該情況下，並未考量丙嫌 酸膜之折射率特性。因此，於丙烯酸膜無法期待不使透明 電極圖型顯眼的效果。因此，當使用以無機材料爲成分之 塗佈膜取代丙烯酸膜時，該膜可使透明電極變得不顯眼， 故較佳。具體而言，較佳爲使用折射率經考量之塗佈膜。 本發明係有鑑於上述觀點而完成者。亦即，本發明之 目的在於提供一種適用於觸控面板、能實現高可靠性之折 射率經控制之塗佈膜、及可形成該塗佈膜之塗佈組成物。 又，本發明之另一目的在於於電極上具有折射率經控 制、可實現高可靠性之塗佈膜的觸控面板。 〔解決課題之手段〕 本發明係用以達成上述目的者，以下述爲要旨。 1. 一種觸控面板用塗佈組成物，其特徵係含有：下 述通式（I)所示之第1金屬烷氧化物、下述通式（π)所 示之第2金屬烷氧化物、下述通式（III)所示之金屬鹽、 有機溶劑、水、與抗析出劑。 M'(〇R')n (I) (式中，Μ1表示選自矽（Si)、鈦（Ti)、組（Ta) 、鉻（Zr)、硼（B)、鋁（A1)、鎂（Mg)及鋅（Zn) 所構成群中之至少1金屬，R1表示碳數1〜5之烷基，n 表示Μ1之價數2〜5。） R2iM2(〇R3)m., (II) (式中，Μ2表示選自矽（Si)、鈦（Ti)、鉬（Ta) 201245345 、鍺（Zr )、硼（B )、鋁（A1 )、鎂（Mg )及鋅（Zn ) 所構成群中之至少1金屬。R2表示氫原子或亦可以氟原子 取代、且亦可以鹵素原子、乙烯基、縮水甘油醚基、锍基 、甲基丙烯醯氧基、丙烯醯氧基、異氰酸酯基、胺基或醯 脲基取代、且亦可具有雜原子之碳數1〜20之烴基。R3表 示碳數1〜5之烷基。m表示M2之價數2〜5，1當m之價 數爲3時爲1或2，當m之價數爲4時爲1〜3，當mi 價數爲5時1〜4。） M3(X)k (III) (式中，Μ3表示由鋁（A1 )、銦（In )、鋅（Zn ) 、鍩（Zr)、鉍（Bi)、鑭（La)、鉅（Ta )、釔（Y) 及铈（Ce )所構成群中之至少1種金屬，X表示鹽酸、硝 酸、硫酸、乙酸、草酸、胺磺酸、磺酸、乙醯乙酸或乙醯 丙酮酸鹽之殘基、或該等之鹼式鹽，k表示M3之價數） 〇 2. 如上述1所記載之觸控面板用塗佈組成物，其第2 金屬烷氧化物之含量，相對於第1金屬烷氧化物與第2金 屬烷氧化物之合計總金屬烷氧化物，爲1 5莫耳％以上。 3. 如上述1或2所記載之觸控面板用塗佈組成物， 其中，該抗析出劑，係選自N-甲基一吡咯烷酮、乙二醇 、二甲基甲醯胺、二甲基乙醯胺、二乙二醇、丙二醇、己 二醇及該等之衍生物所構成群中之至少1種以上之物質。 4. 如上述1至3中任一項所記載之觸控面板用塗佈 組成物，其中，金屬鹽之金屬原子（M3)、與第1金屬烷 201245345 氧化物及第2金屬烷氧化物之金屬原子（Μ1及Μ2)之莫 耳比爲 0.01SM3/ (Mi+lV^+M3) $0.7» 5. 如上述1至4中任一項所記載之觸控面板用塗佈 組成物’其中，第1金屬烷氧化物，爲矽烷氧化物或其之 部分縮合物、與鈦烷氧化物之混合物》 6. 如上述1至5中任一項所記載之觸控面板用塗佈 組成物，其中，該金屬鹽，係金屬硝酸鹽、金屬硫酸鹽、 金屬乙酸鹽、金屬氯化物、金屬草酸鹽、金屬胺磺酸鹽、 金屬磺酸鹽、金屬乙醯乙酸鹽、金屬乙醯丙酮酸鹽或該等 之鹼式鹽。 7. 如上述1至6中任一項所記載之觸控面板用塗佈 組成物，其中，該第1金屬烷氧化物，爲矽烷氧化物或其 之部分縮合物、與鈦烷氧化物之混合物，該有機溶劑，係 含有伸烷二醇類或其之單醚衍生物。 8. —種塗佈膜，其係使用如上述1至7中任一項所 記載之觸控面板用塗佈組成物所成膜之塗佈膜。 9. 如上述8所記載之塗佈膜，其之折射率爲1.52〜 1.70，膜厚爲 40nm〜170nm。 10. —種觸控面板，其係於基板之操作範圍形成有透 明電極之圖型之觸控面板，其特徵係，將如上述8或9所 記載之塗佈膜配置於該透明電極之圖型之至少一部分上。 11. 如上述1〇所記載之觸控面板，其中，該透明電 極圖型，係具有用以檢測至少2個相異方向之位置的第1 透明電極圖型、與第2透明電極圖型而構成， -10- 201245345 該第1透明電極圖型與該第2透明電極圖型之至少一 部分，在該基板之操作範圍重疊，且該重®部分之該第1 透明電極圖型與該第2透明電極圖型之間，配置有由有機 材料所構成之膜， 該塗佈膜，係以被覆該第1透明電極圖型或該第2透 明電極圖型之至少一部分、及該由有機材料所構成之膜之 至少一部分的方式構成。 12·如上述11所記載之觸控面板，其中，該第1透 明電極圖型與該第2透明電極圖型之重疊部分，於該基板 之操作範圍有複數個，於該等複數之重疊部分，分別配置 有面積較該重疊部分之面積大之該由有機材料所構成之膜 〔發明的效果〕 藉由本發明，可提供一種能形成適用於觸控面板、可 實現高可靠性、折射率經控制之塗佈膜的觸控面板用塗佈 組成物。 又，藉由本發明，亦可提供折射率經控制、具有高強 度之適用爲觸控面板之塗佈膜的塗佈膜。 藉由本發明，亦可提供可不使電極之圖型顯眼、具有 高可靠性之觸控面板。 【實施方式】 &lt;塗佈組成物&gt; -11 - 201245345 本發明之塗佈組成物存 第1金屬烷氧化物、上述通 化物、上述通式（III)所示 抗析出劑》藉由將該塗佈組 塗佈膜。 由本發明之塗佈組成物 金屬氧化物爲主要成分者， 構成之塗佈膜相比，硬度高 爲觸控面板之電極用保護膜 電極被目視辨認之所謂「可 率控制爲最佳範圍。其之結 觸控面板之顯示裝置之顯示 本發明所得之塗佈膜， 之操作區域之透明電極圖型 向之位置之2種透明電極圖 種透明電極圖型電氣連接的 等有機材料所構成之層間絕 面板時，於層間絕緣膜上以 佈膜與層間絕緣膜之熱伸縮 痕，使觸控面板之可靠性降' 本發明之塗佈組成物， 生裂痕，較佳爲針對所含之 更詳而言之，本發明之塗佈 氧化物，可選擇於塗佈膜之: I含有：上述通式（I)所示之 式（Π)所示之第2金屬烷氧 之金屬鹽、有機溶劑、水、與 成物成膜可得適於觸控面板之 所得之塗佈膜，係以無機物之 與由丙烯酸材料等有機材料所 、具有高強度。因此，適於作 。又，可減低觸控面板中透明 見電極圖型」現象，而將折射 果，可防止使用用該塗佈膜之 性的降低。 例如，配置於觸控面板之基板 ，係具有用以檢測2個相異方 型的構成》此時，係以不使2 方式，於該等之間配置丙烯酸 緣膜。當爲如此之構成之觸控 形成有塗佈膜。因此，由於塗 性的差異，而於塗佈膜產生裂 低，是其問題。 爲了不使觸控面板之塗佈膜產 成分之構造與組成進行選擇》 組成物，對於主成分之金屬烷 形成之較佳之構造與組成。 -12- 201245345 本發明之塗佈組成物，含有：下述通式（I)所示 造之第1金屬烷氧化物、下述通式（II)所示構造之第 金屬烷氧化物。 m'cor1),, (I) 式（I)中，M1、R1、η係如上述所定義者。其中 Μ1較佳爲矽（Si)、鈦（Ti)、錐（Zr)、或鋁（Ai) 特佳爲矽（Si)、或鈦（Ti)。又，η較佳爲3或4。 R2,M2 ( OR3 ) m., ( II ) 式（II )中，Μ2、R2、R3、m係如上述所定義者》 中，Μ2較佳爲矽（Si)、鈦（Ti)、銷（Zr)、或鋁（ )，特佳爲矽（Si)、或鈦（Ti)。 式（I )所示之金屬烷氧化物，當使用矽烷氧化物 其之部分縮合物時，係使用通式（IV)所示之化合物之 種或2種以上之混合物或部分縮合物（較佳爲5聚物以 )°[Technical Field] The present invention relates to a coating composition for a touch panel, a coating film formed of the coating composition, and a touch panel having the coating film. ‘ 【Prior Art】 Conventionally, inorganic coatings have been formed on the surface of substrates such as glass, ceramics, metals, and plastics for various purposes. By forming an inorganic film on the surface of the substrate, electrical properties, optical properties, chemical properties, mechanical properties, and the like can be imparted to the substrate. Therefore, these inorganic coatings can be practically used as a conductive film, an insulating film, a film that selectively transmits or absorbs light, an alkali-resistant film, a chemical resistant film, a hard coat film, and the like. The method of forming such an inorganic film may, for example, be a vapor phase method such as CVD (Chemical Vapor Deposition), PVD (Physical Vapor Deposition), or a sputtering method, or use an alkoxide or the like. Liquid phase method. In general, gas phase processes require expensive and large scale devices such as vacuum evaporation devices. Also, there is a problem that the size or shape of the substrate which can be formed into a film is limited. On the other hand, a melt-gel method is known as a liquid phase method using an alkoxide. This method has the advantages of being able to cope with coating, patterning, and the like in a large area. Therefore, the inorganic film formed by the liquid phase method is used in a large amount as a coating film in an electronic component (for example, see Patent Document 1). In particular, 'the use of touch panels has been recently explored.' In recent years, the popularity of mobile phones has increased, and the number of mobile phones has increased. Therefore, the development of a touch panel that can perform an input operation using the display of the display is progressing vigorously. Since the touch panel </ RTI> does not require an input mechanism such as a push-type key, it is possible to enlarge the display screen. The touch panel detects the contact position of an operation area touched by a finger or a pen. With this function, the touch panel is used as an input device. The contact position detection method includes a resistive film method or an electrostatic capacity method. In the resist film method, two substrates are used in the opposite direction, and in the case of the static capacitance method, one substrate can be used. Therefore, a thin touch panel can be constructed by electrostatic capacitance, and it can be applied to a portable device or the like, and development has continued in recent years. Patent Document 2 discloses a touch panel of an electrostatic capacitance type. In the touch panel, a first transparent electrode for detecting a coordinate in the X direction and a second transparent electrode for detecting a coordinate in the Y direction are disposed on one surface of the transparent substrate, and an interlayer insulating device is present at each intersection portion. Make it non-conductive. The touch panel is incorporated in a display device such as a liquid crystal display device, and is used as a display device having a function of a touch panel capable of detecting a touch position. Since the operator of the touch panel visually recognizes the display device through the touch panel, the transparent electrode system uses a member having excellent light transmission characteristics. For example, an inorganic material such as ITO (Indium Tin Oxide) is used. Further, as the interlayer insulating film, a patternable, insulating acrylic material or the like is used. [Patent Document 1] Japanese Patent Laid-Open No. 2 8 8 1 8 4 7 201245345 Patent Document 2: Japanese Laid-Open Patent Publication No. 20 1 0-2 8 1 1 5 [Invention] [Problems to be Solved by the Invention] In the touch panel, there is a finger or a pen actually contacting and pressing in the operation area, so strength and high reliability are required. Therefore, it is considered that a protective film is provided on the first and second electrodes which are overlapped by the interlayer insulating film. The protective film is made of an acrylic material that can be patterned. However, since the acrylic material is an organic material, the hardness as a protective film is insufficient. Further, when ITO is used for the transparent electrode, the adhesion to ITO is weak, which is one of the causes for lowering the reliability of the touch panel. Further, in the acrylic material, it is difficult to form a film by a printing technique such as offset printing. Therefore, in the formation of a film, it is necessary to utilize a photolithography technique which is complicated in steps. Therefore, as a protective film, a coating film containing an inorganic material as a component in place of the acrylic film has been examined. When it is a film containing an inorganic material as a component, it is generally high in hardness, and high reliability can be expected as a coating film of a touch panel. Therefore, it is required that a coating film containing an inorganic material as a component can form a film by a printing technique, and exhibit high adhesion to an interlayer insulating film of an organic material such as the above-mentioned acrylic material. Further, in a capacitive touch panel, a region where a transparent electrode such as ITO is formed and a region where a transparent electrode is not formed have a difference in reflectance. Therefore, the pattern of the transparent electrode has a problem of visual recognition and display degradation. As described above, in the conventional touch panel, an acrylic film is used as a protective film material on the transparent -7-201245345 electrode. However, in this case, the refractive index characteristics of the acrylic acid film were not considered. Therefore, the effect of not making the transparent electrode pattern conspicuous in the acrylic film cannot be expected. Therefore, when an acrylic film is used in place of a coating film containing an inorganic material as a component, the film can make the transparent electrode inconspicuous, which is preferable. Specifically, it is preferred to use a coating film whose refractive index is considered. The present invention has been completed in view of the above points. That is, an object of the present invention is to provide a coating film which is suitable for a touch panel, has a high refractive index controlled by a coating film, and a coating composition which can form the coating film. Further, another object of the present invention is to provide a touch panel having a coating film whose refractive index is controlled and which can realize high reliability on an electrode. [Means for Solving the Problems] The present invention has been made to achieve the above object, and the following is the gist of the invention. A coating composition for a touch panel, comprising: a first metal alkoxide represented by the following formula (I) and a second metal alkoxide represented by the following formula (π) A metal salt represented by the following formula (III), an organic solvent, water, and an anti-precipitation agent. M'(〇R')n (I) (wherein Μ1 is selected from the group consisting of bismuth (Si), titanium (Ti), group (Ta), chromium (Zr), boron (B), aluminum (A1), magnesium (Mg) and at least one metal of the group consisting of zinc (Zn), R1 represents an alkyl group having 1 to 5 carbon atoms, and n represents a valence of 2 to 5 of Μ1.) R2iM2(〇R3)m., (II) (wherein Μ2 represents a composition selected from the group consisting of bismuth (Si), titanium (Ti), molybdenum (Ta) 201245345, lanthanum (Zr), boron (B), aluminum (A1), magnesium (Mg), and zinc (Zn). At least one metal in the group. R2 represents a hydrogen atom or may be substituted by a fluorine atom, and may also be a halogen atom, a vinyl group, a glycidyl ether group, a fluorenyl group, a methacryloxy group, an acryloxy group, an isocyanate group, An amine group or a ureido group substituted, and may also have a hydrocarbon group having a carbon number of 1 to 20 of a hetero atom. R3 represents an alkyl group having a carbon number of 1 to 5. m represents a valence of 2 to 5 of M2, and a valence of m It is 1 or 2 when it is 3, 1~3 when the price of m is 4, and 1~4 when the price of mi is 5.) M3(X)k (III) (wherein Μ3 is represented by aluminum ( At least one of a group consisting of A1), indium (In), zinc (Zn), yttrium (Zr), bismuth (Bi), lanthanum (La), giant (Ta), yttrium (Y), and cerium (Ce) a metal, X represents the residue of hydrochloric acid, nitric acid, sulfuric acid, acetic acid, oxalic acid, aminesulfonic acid, sulfonic acid, acetoacetic acid or acetylpyruvate, or the basic salt, k represents the valence of M3 The coating composition for a touch panel according to the above 1, wherein the content of the second metal alkoxide is a total metal alkoxide with respect to the total of the first metal alkoxide and the second metal alkoxide. The substance is more than 15% by mole. 3. The coating composition for a touch panel according to the above 1 or 2, wherein the anti-precipitation agent is selected from the group consisting of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, and dimethyl group. At least one or more of the group consisting of acetamide, diethylene glycol, propylene glycol, hexanediol, and the like. 4. The coating composition for a touch panel according to any one of the above 1 to 3, wherein the metal atom of the metal salt (M3), the first metal alkane 201245345 oxide, and the second metal alkoxide The molar ratio of the metal atom (Μ1 and Μ2) is 0.01SM3/(Mi+lV^+M3) $0.7» 5. The coating composition for a touch panel according to any one of the above 1 to 4, wherein A coating composition for a touch panel according to any one of the above 1 to 5, wherein the first metal alkoxide is a decane oxide or a partial condensate thereof, and a mixture of the titanium alkoxide. The metal salt is a metal nitrate, a metal sulfate, a metal acetate, a metal chloride, a metal oxalate, a metal amine sulfonate, a metal sulfonate, a metal acetoacetate, a metal acetonate pyruvate Or such basic salts. 7. The coating composition for a touch panel according to any one of the above 1 to 6, wherein the first metal alkoxide is a decane oxide or a partial condensate thereof, and a titanium alkoxide The mixture, the organic solvent, contains an alkylene glycol or a monoether derivative thereof. 8. A coating film which is formed by coating a coating composition for a touch panel according to any one of the above 1 to 7 above. 9. The coating film according to the above 8, which has a refractive index of from 1.52 to 1.70 and a film thickness of from 40 nm to 170 nm. A touch panel which is a touch panel in which a transparent electrode is formed in a range of operation of a substrate, wherein the coating film according to the above 8 or 9 is disposed on the transparent electrode. At least part of the type. 11. The touch panel according to the above aspect, wherein the transparent electrode pattern has a first transparent electrode pattern and a second transparent electrode pattern for detecting positions in at least two different directions. Configuration -10- 201245345 The first transparent electrode pattern and at least a portion of the second transparent electrode pattern overlap with the operating range of the substrate, and the first transparent electrode pattern of the heavy portion is the second Between the transparent electrode patterns, a film made of an organic material is disposed, and the coating film covers at least a portion of the first transparent electrode pattern or the second transparent electrode pattern, and the organic material It is configured to form at least a part of the film. The touch panel according to the above 11, wherein the overlapping portion of the first transparent electrode pattern and the second transparent electrode pattern has a plurality of operating ranges of the substrate, and the plurality of overlapping portions A film made of an organic material having a larger area than the overlapping portion is disposed, respectively. [Effect of the Invention] According to the present invention, it is possible to provide a touch panel, which can realize high reliability and refractive index. A coating composition for a touch panel of a coated coating film. Further, according to the present invention, it is also possible to provide a coating film which is applied to a coating film of a touch panel having a controlled refractive index and high strength. According to the present invention, it is also possible to provide a touch panel which does not make the pattern of the electrodes conspicuous and has high reliability. [Embodiment] &lt;Coating composition&gt; -11 - 201245345 The coating composition of the present invention contains the first metal alkoxide, the above-mentioned compound, and the anti-precipitation agent represented by the above formula (III) by This coating group coats the film. When the coating composition of the present invention contains a metal oxide as a main component, the hardness of the coating film is higher than that of the coating film of the touch panel, and the so-called "rate control" is optimal. The display device of the touch panel of the present invention displays the coating film obtained by the present invention, and the transparent electrode pattern of the operation region is in the position of the two transparent electrodes, and the transparent electrode pattern is electrically connected to the organic material. In the case of the panel, the thermal expansion and contraction of the film and the interlayer insulating film on the interlayer insulating film reduces the reliability of the touch panel. The coating composition of the present invention, the crack, preferably is more detailed for the inclusion. In addition, the coating oxide of the present invention may be selected from the coating film: I contains a metal salt of a second metal alkoxide represented by the formula (I) represented by the above formula (I), and an organic solvent. The film formed by water, and the film can be obtained by a coating film suitable for a touch panel, and is made of an inorganic material and an organic material such as an acrylic material, and has high strength. Therefore, it is suitable for use. See the transparency in the control panel The phenomenon of the electrode pattern is to be refracted, and the deterioration of the properties of the coating film can be prevented. For example, the substrate disposed on the touch panel has a configuration for detecting two different patterns. In this case, the acryl film is disposed between the two without being in a two-way manner. A coating film is formed for the touch thus constructed. Therefore, the cracking of the coating film due to the difference in the coating property is a problem. In order to prevent the structure and composition of the coating film of the touch panel from being selected, the composition and composition of the metal alkane of the main component are preferably formed. -12-201245345 The coating composition of the present invention contains a first metal alkoxide represented by the following formula (I) and a metal alkoxide having a structure represented by the following formula (II). M'cor1),, (I) In the formula (I), M1, R1, and η are as defined above. Among them, Μ1 is preferably bismuth (Si), titanium (Ti), cone (Zr), or aluminum (Ai), particularly preferably bismuth (Si) or titanium (Ti). Further, η is preferably 3 or 4. R2, M2 (OR3) m., (II) In the formula (II), Μ2, R2, R3, m are as defined above, Μ2 is preferably 矽(Si), titanium(Ti), pin ( Zr), or aluminum ( ), particularly preferably bismuth (Si), or titanium (Ti). The metal alkoxide represented by the formula (I), when a partial condensate of the decane oxide is used, a compound of the formula (IV) or a mixture of two or more kinds or a partial condensate is preferably used. 5 mer to)

Si(OR，）4 (IV) 式（IV)中，R’表示碳數1〜5、較佳爲1〜3之烷 、或乙醯氧基。 更具體而言，矽烷氧化物，例如可使用四甲氧矽院 四乙氧矽烷、四丙氧矽烷、四丁氧矽烷、四乙醯氧矽烷 四烷氧矽烷類等。 又，式（I )所示之金屬烷氧化物，當使用鈦烷氧 物或部分縮合物時，係使用通式（V)所示之化合物之 種或2種以上之混合物或部分縮合物（較佳爲5聚物以 構 2 其 A1 或 1 下 基 等 化 1 下 -13- 201245345Si(OR,)4 (IV) In the formula (IV), R' represents an alkane having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms, or an ethoxy group. More specifically, as the decane oxide, for example, tetramethoxine tetraethoxy decane, tetrapropoxy decane, tetrabutoxy oxane, tetraethoxy decane decane oxane or the like can be used. Further, in the metal alkoxide represented by the formula (I), when a titanium alkoxide or a partial condensate is used, a compound of the formula (V) or a mixture of two or more kinds or a partial condensate ( Preferably, the 5 polymer is in the form of 2, and its A1 or 1 lower group is equalized 1 to 13-201245345

Ti(〇R，，）4 (V) 式（IV )中，R”表示碳數1〜5 ；ί 式（I)所示之金屬烷氧化物， 物，可使用四乙氧化鈦、四丙氧化鈦 氧化鈦化合物或鈦四-正丁氧化四聚 式（I)所示之金屬烷氧化物之 乙氧化銷、四丙氧化锆、四丁氧化锆 ;三丁氧化鋁、三異丙氧化鋁、三乙 化合物；五丙氧化鉅、五丁氧化鉅等 〇 第1金屬烷氧化物之含量，相對 第1金屬烷氧化物與第2金屬烷氧化 20莫耳％〜85莫耳％、更佳爲30莫耳 上述式（Π)所示之第2金屬烷 1金屬烷氧化物一同使用於本發明之 成物，藉由含有第2金屬烷氧化物， 材料所構成之膜上形成塗佈膜時，可 之間之熱伸縮性的差異。其結果，即 佈膜，亦可防止於塗佈膜上產生裂痕 ，若於上述之層間絕緣膜等使用丙烯 膜，即使於其上形成塗佈膜，亦可防 塗佈膜產生裂痕。 L烷基。 具體而言，駄院氧化 、四丁氧化鈦等四烷 物等之部分縮合物等 其他例，可舉例如四 等四烷氧化锆化合物 氧化鋁等三烷氧化鋁 五烷氧化鉬化合物等 於塗佈組成物所含之 物之合計量，較佳爲 %〜7 0莫耳％ » 氧化物，係與上述第 塗佈組成物。塗佈組 當於丙烯酸材等有機 緩和塗佈膜與有機膜 使於有機膜上形成塗 。例如，於觸控面板 酸材料所構成之有機 止於層間絕緣膜上之 -14- 201245345 第2金屬烷氧化物之含量，相對於塗佈組成物所含之 第1金屬烷氧化物與第2金屬烷氧化物之合計量，較佳爲 80莫耳％〜15莫耳％、更佳爲70莫耳％〜30莫耳％。當 R2之碳數爲3以下時，以使式（II )所示之金屬烷氧化物 之含量爲30%以上，當R2之碳數爲4以上、或R2中含有 锍基時，以使第2金屬烷氧化物之含量爲1 5%以上爲佳， 又，75莫耳％以下爲更佳。 當第2金屬烷氧化物之含量未滿15莫耳％時，於上述 之有機膜上所得之塗佈膜塗佈膜會有產生裂痕的情形。又 ，當爲80莫耳％以上時，雖不產生裂痕，但會產生無法得 到均一塗佈膜的現象。藉由使其爲如此之含量，可抑制上 述之塗佈膜之裂痕的產生。 塗佈組成物所含之第1金屬烷氧化物與第2金屬烷氧 化物之合計含量，較佳爲0.5重量％〜20重量％、更佳爲！ 重量％〜1 5重量％。當該比率大時，塗佈組成物之貯藏安 定性會變差，使塗佈膜之膜厚控制變得困難。另一方面， 當小時，所得塗佈膜之厚度變薄，爲了得到既定之膜厚必 須多數次的塗佈。 式（11 )所示之較佳之金屬烷氧化物，例如，當Μ 2 爲矽時，可舉例如以下之化合物。 可舉例如甲基三甲氧矽烷、甲基三丙氧矽烷、甲基三 乙醯氧矽烷、甲基三丁氧矽烷、甲基三戊氧矽烷、甲基三 戊氧矽烷、甲基三苯氧矽烷、甲基三苄氧矽烷、甲基三苯 乙氧矽烷、縮水甘油醚基甲基三甲氧矽烷、縮水甘油醚基 -15- 201245345 甲基三乙氧矽烷、α-縮水甘油醚基乙基三甲氧矽烷、α -縮水甘油醚基乙基三乙氧矽烷、θ -縮水甘油醚基乙基 三甲氧矽烷、/3 -縮水甘油醚基乙基三乙氧矽烷、α -縮 水甘油醚基丙基三甲氧矽烷、α —縮水甘油醚基丙基三乙 氧矽烷、iS -縮水甘油醚基丙基三甲氧矽烷、iS —縮水甘 油醚基丙基三乙氧矽烷、r -縮水甘油醚基丙基三甲氧矽 烷、r 一縮水甘油醚基丙基三乙氧矽烷、τ -縮水甘油醚 基丙基三丙氧矽烷、r -縮水甘油醚基丙基三丁氧矽烷、 7 -縮水甘油醚基丙基三苯氧矽烷、α -縮水甘油醚基丁 基三甲氧矽烷、α -縮水甘油醚基丁基三乙氧矽烷、；s — 縮水甘油醚基丁基三乙氧矽烷、r 一縮水甘油醚基丁基三 甲氧矽烷、τ -縮水甘油醚基丁基三乙氧矽烷、5 —縮水 甘油醚基丁基三甲氧矽烷、5 -縮水甘油醚基丁基三乙氧 矽烷、（3,4一環氧基環己基）甲基三甲氧矽烷、（3,4 一 環氧基環己基）甲基三乙氧矽烷、沒- （3，4 一環氧基環 己基）乙基三甲氧矽烷、/3 — (3，4 一環氧基環己基）乙 基三乙氧矽烷、；S —（3，4 一環氧基環己基）乙基三丙氧 矽烷、/3 — (3，4一環氧基環己基）乙基三丁氧矽烷、召 一 （3,4一環氧基環己基）乙基三苯氧矽烷、(3,4一 環氧基環己基）丙基三甲氧矽烷、r -（3，4_環氧基環 己基）丙基三乙氧矽烷、5 -（3，4一環氧基環己基）丁 基三甲氧矽烷、（5 — （3,4_環氧基環己基）丁基三乙氧 矽烷、縮水甘油醚基甲基甲基二甲氧矽烷、縮水甘油醚基 甲基甲基二乙氧矽烷、α —縮水甘油醚基乙基甲基二甲氧 -16- 201245345 矽烷、α —縮水甘油醚基乙基甲基二乙氧矽烷、yS —縮水 甘油醚基乙基甲基二甲氧矽烷、Θ —縮水甘油醚基乙基乙 基二甲氧矽烷、α -縮水甘油醚基丙基甲基二甲氧矽烷、 α -縮水甘油醚基丙基甲基二乙氧矽烷、沒一縮水甘油醚 基丙基甲基二甲氧矽烷、yS —縮水甘油醚基丙基乙基二甲 氧矽烷、7 —縮水甘油醚基丙基甲基二甲氧矽烷、T -縮 水甘油醚基丙基甲基二乙氧矽烷、7 -縮水甘油醚基丙基 甲基二丙氧矽烷、r -縮水甘油醚基丙基甲基二丁氧矽烷 、r —縮水甘油醚基丙基甲基二苯氧矽烷、T 一縮水甘油 醚基丙基乙基二甲氧矽烷、r -縮水甘油醚基丙基乙基二 乙氧矽烷、r -縮水甘油醚基丙基乙烯基二甲氧矽烷、r -縮水甘油醚基丙基乙烯基二乙氧矽烷、乙基三甲氧矽烷 、乙基三乙氧矽烷、乙烯基三甲氧矽烷、乙烯基三乙氧矽 烷、乙烯基三乙醯氧矽烷、苯基三甲氧矽烷、苯基三乙氧 矽烷、苯基三乙醯氧矽烷、γ -氯丙基三甲氧矽烷、7 — 氯丙基三乙氧矽烷、γ —氯丙基三乙醯氧矽烷、3:3,3 —三 氟丙基三甲氧矽烷、r 一甲基丙烯氧基丙基三甲氧矽烷、 τ -毓基丙基三甲氧矽烷、锍基丙基三乙氧矽烷、冷 —氰基乙基三乙氧矽烷、氯甲基三甲氧矽烷、氯甲基三乙 氧矽烷、N— ( /3 —胺基乙基）r —胺基丙基三甲氧矽烷 、N—(点一胺基乙基）7 —胺基丙基甲基二甲氧矽烷、 r_胺基丙基甲基二甲氧矽烷、N— (0 —胺基乙基）7 一胺基丙基三乙氧矽烷、N- (0_胺基乙基）r —胺基 丙基甲基二乙氧矽烷、二甲基二甲氧矽烷、苯基甲基二甲 -17- 201245345 氧矽烷、二甲基二乙氧矽烷、苯基甲基二乙氧矽烷、r 一 氯丙基甲基二甲氧矽烷、r 一氯丙基甲基二乙氧矽烷、二 甲基二乙醯氧矽烷、r 一甲基丙烯氧基丙基甲基二甲氧矽 烷、r 一甲基丙烯氧基丙基甲基二乙氧矽烷、τ -锍基丙 基甲基二甲氧矽烷、r -毓基丙基甲基二乙氧矽烷、甲基 乙烯基二甲氧矽烷、甲基乙烯基二乙氧矽烷、r_醯脲基 丙基三乙氧矽烷、r -醯脲基丙基三甲氧矽烷、r -醯脲 基丙基三丙氧矽烷、（R)—n—i-苯基乙基—ν’一三乙 氧矽基丙基脲、（R) - Ν— 1 一苯基乙基— Ν’一三甲氧矽 基丙基脲、烯丙基三乙氧矽烷、3 -甲基丙烯氧基丙基三 甲氧矽烷' 3—甲基丙烯氧基丙基三乙氧矽烷、3 -丙烯氧 基丙基三甲氧矽烷、3 -丙烯氧基丙基三乙氧矽烷、3—異 氛酸酯丙基三乙氧矽烷、三氟丙基三甲氧矽烷、溴丙基三 乙氧矽烷、二乙基二乙氧矽烷、二乙基二甲氧矽烷、二苯 基二甲氧矽烷、二苯基二乙氧矽烷、三甲基乙氧矽烷、三 甲基甲氧矽烷、對苯乙烯基三甲氧矽烷、對苯乙烯基三乙 氧矽烷、對苯乙烯基三丙氧矽烷等。該等可單獨使用、或 組合2種以上使用。 本發明之塗佈組成物所含之金屬鹽，可以下述通式（ ΠΙ )所示。 M3(X)k (III) 式（III )中，Μ3、X、k係如上述所定義者*其中， M3較佳爲鋁（A1)、銦（In)、鈽（Ce)或锆（Zr)。又 ，X較佳爲鹽酸、硝酸、乙酸、草酸、磺酸、乙醯乙酸或 -18- 201245345 乙醯丙酮酸鹽之殘基、或該等之鹼式鹽。上述X中 之殘基，例如，硝酸亦稱爲硝酸根、硫酸亦稱爲硫 其之量，係以使與M3之價數等價的方式來含有。 謂鹼式鹽，係指於上述各酸之殘基中含有OH基之f 式（ΠΙ )所表示之金屬鹽之中，特別以硝酸鹽 物鹽、草酸鹽或其之鹼式鹽爲佳。其中，由取得之 、與塗佈組成物之貯藏安定性的觀點考量，更佳爲 、或铈之硝酸鹽。 於本發明之塗佈組成物，含有有機溶劑。該有 ，當由塗佈組成物形成該塗膜以得塗佈膜時，係用 塗佈組成物之黏度、以改善塗佈性者，故塗佈組成 有機溶劑的含量，相對於塗佈組成物所含之總金屬 物，較佳爲80重量％〜99.5重量％、更佳爲85重量 重量％。當有機溶劑之含量少時，所得之塗佈膜之 薄，爲了得既定之膜厚需要多數次的塗佈。另一方 爲多時，塗佈組成物之貯藏安定性變差，而難以控 膜之膜厚》 塗佈組成物所使用之有機溶劑，可舉例如甲醇 、1—丙醇、2 —丙醇、1 一 丁醇、2 — 丁醇、2-甲 丙醇、2-甲基-2 —丙醇等醇類；乙酸乙酯等酯類 醇等二醇類；或該等之酯衍生物；二乙醚等醚類； 甲乙酮、環己酮等酮類；苯、甲苯等芳香族烴類等 可單獨或組合使用。 於塗佈組成物中，當含有鈦烷氧化物成分時， 之各酸 酸根， 又，所 I形。 、氯化 容易性 鋁、銦 機溶劑 以調整 物中之 烷氧化 :% 〜9 9 厚度變 面，當 制塗佈 、乙醇 E — 1 — :乙二 丙酮、 。該等 有機溶 -19- 201245345 劑中所含之伸烷二醇類或其之單醚，可舉例如乙二醇、二 乙二醇、丙二醇、己二醇、或該等之單甲基、單乙基、單 丙基、單丁基或單苯基醚等。 塗佈組成物所使用之有機溶劑所使用之二醇類或其之 單醚，相對於鈦烷氧化物之莫耳比若未滿1，則對鈦烷氧 化物之安定性的效果少，塗佈用組成物之貯藏安定性變差 。另一方面，多量使用二醇類或其之單醚並無任何問題。 例如，塗佈組成物所使用之有機溶劑，可全部皆爲上述之 二醇類或其之單醚。然而，當塗佈用組成物未含有鈦烷氧 化物時，並不一定特別要含有上述之二醇類及/或其之單 醚。 塗佈組成物以含有抗析出劑爲佳。抗析出劑，係於由 塗佈組成物形成塗佈被膜之際，防止金屬鹽析出至塗膜中 。抗析出劑，可舉例如N -甲基-吡略烷酮、二甲基甲醯 胺、二甲基乙醯胺、乙二醇、二乙二醇、丙二醇或己二醇 、或該等之衍生物等。其中，以N_甲基-吡咯烷酮、乙 二醇、二乙二醇、丙二醇、丙二醇或己二醇或該等之衍生 物較佳。抗析出劑，可至少使用一種以上。 塗佈組成物中之抗析出劑之含量，較佳爲使用將上述 金屬鹽之金屬換算成金屬氧化物，而滿足下述之比率（重 量比）者。 (抗析出劑/金屬氧化物） 上述比率若未滿1，形成塗佈被膜時金屬鹽之抗析出 效果小。另一方面，若多量使用抗析出劑，雖不對塗佈組 -20- 201245345 成物造成任何影響，但以200以下爲佳。 於抗析出劑，可於金屬鹽之存在下進行水解、縮合反 應之際添加金屬烷氧化物、特別是矽烷氧化物、鈦烷氧化 物、或矽烷氧化物與鈦烷氧化物，亦可於水解、縮合反應 結束後添加》 另一方面，塗佈組成物所含之金屬鹽之含量，構成上 述第1及第2金屬烷氧化物之金屬原子（M1及M2)與上 述金屬鹽之金屬原子（M3)之合計的含有比率，以滿足下 述之比率（莫耳比）爲佳。 0.01^ M3/(M'+M2 + M3) ^ 0.7 該比率若小於〇.〇 1，則所得被膜之機械強度不充分故 不佳。另一方面，若超過0.7，則塗佈膜對於玻璃基板或 透明電極等基材之密合性低。再者，當以450°C以下之低 溫燒成時，所得之塗佈膜之耐藥品性亦有降低的傾向。其 中，該比率，以〇.〇1〜0.6爲更佳。 本發明之塗佈組成物中，只要不損及本發明之效果， 亦可含有上述成分以外之成分，例如無機微粒子、金屬氧 院（Metalloxane )寡聚物、金屬氧院聚合物、整平劑、界 面活性劑等成分。 無機微粒子，以氧化矽微粒子、氧化鋁微粒子、氧化 鈦微粒子' 氟化鎂微粒子等微粒子較佳，以該等無機微粒 子之膠體溶液爲特佳。該膠體溶液，可爲將無機微粒子分 散於分散介質者，亦可爲市售品之膠體溶液。 本發明中，藉由含有無機微粒子，可賦予所形成之硬 -21 - 201245345 化被膜之表面形狀或其他功能。無機微粒子，其之粒徑以 0.001〜0.2μιη爲佳，更佳爲0.001〜ο.ίμιη。當無機微粒 子之平均粒徑超過〇·2μιη時，使用所調製之塗佈液所形成 之硬化被膜的透明性有降低的情形。 無機微粒子之分散介質。可舉例如水及有機溶劑。膠 體溶液，由被膜形成用塗佈液的觀點考量，以將pH或ρΚ 調整爲1〜10爲佳、更佳爲2〜7。 膠體溶液之分散介質所使用之有機溶劑，可舉例如甲 醇、乙醇、丙醇、丁醇、乙二醇、丙二醇、丁二醇、2_ 甲基一 2，4 一戊二醇、二乙二醇、二丙二醇、乙二醇單丙 醚等醇類；甲乙酮、甲基異丁基酮等酮類；甲苯、二甲苯 等芳香族烴類；二甲基乙醯胺、Ν -甲基-耻咯烷酮等醯 胺類：乙酸乙酯、乙酸丁酯、r -丁內酯等酯類：四氫呋 喃、1，4一二噁烷等醚類。該等之中，以醇類及酮類較佳 。該等有機溶劑，可單獨或混合2種以上作爲分散介質使 用。 本發明之塗佈組成物中之固體成分濃度，當將上述之 金屬烷氧化物與金屬鹽換算爲金屬氧化物時，以0.5重量 %〜20重量％的範圍爲佳。固體成分若超過20重量％，則 塗佈組成物之貯藏安定性會變差，使塗佈膜之膜厚控制變 得困難。另一方面，當固體成分少於0.5重量％時，所得 塗佈膜之厚度變薄，爲了得到既定之膜厚必須多數次的塗 佈。其中，固體成分濃度，以1重量％〜1 5重量％爲更佳 -22- 201245345 於本發明之塗佈組成物，係將上述之第丨及第2金屬 烷氧化物於上述金屬鹽的存在下水解，爲了得到縮合物而 含有水。該水量’相對於上述第1及第2金屬烷氧化物之 總莫耳，以2〜24莫耳爲佳。當該（水量（莫耳金 屬烷氧化物之總莫耳數））之比率爲2以下時，金屬烷氧 化物之水解不充分’使成膜性降低、或使所得之塗佈膜之 強度降低’故不佳。又，上述比率若較24多時，由於聚 縮合會持續進行，而會使貯藏安定性降低故不佳。其中， 該莫耳比，以2〜20爲更佳。 又’當塗佈組成物所含之金屬鹽爲水合鹽時，由於其 所含之水分會與水解反應有關，故塗佈組成物所含之水量 ，必須考量該金屬鹽所含之水分。例如，當共存之金屬鹽 爲鋁鹽之水合鹽時，由於其所含之水分會與反應有關，故 必須考量相對於水解所使用之水量之鋁鹽所含之水分。 於本發明之塗佈組成物，可形成適於觸控面板之塗佈 膜。該塗佈膜，係以無機物之金屬氧化物爲主要成分之膜 ，具有較丙烯酸材料等有機材料之膜更高之強度。而於後 述之觸控面板中，適用爲電極之保護膜。塗佈膜，由於具 備適度之熱伸縮性，故即使形成於構成觸控面板之有機膜 上，亦可將裂痕的產生抑制爲最小限度。又，亦可將折射 率控制爲最佳之範圍，以減低透明電極圖型可目視辨認所 致之顯示裝置之顯示性的降低。 關於塗佈膜之折射率的控制，可藉由控制塗佈組成物 的組成來實現。亦即，本發明之塗佈膜，係將上述之塗佈 -23- 201245345 組成物所含有之金屬烷氧化物水解、縮合所製造者，藉由 選擇金屬烷氧化物之組成，可將所形成之塗佈膜之折射率 調整爲既定之範圍內。例如，當選擇矽烷氧化物與鈦烷氧 化物作爲金屬烷氧化物時，藉由調整其之混合比率，可將 所得之塗佈膜之折射率，調整爲後述之既定範圍內、具體 而言爲1.45〜2.1左右之範圍內》 亦即，將塗佈組成物塗佈而成膜、較佳爲乾燥後、燒 成後所形成之塗佈膜，當所要求之折射率已決定時，能以 實現該折射率的方式，決定金屬烷氧化物、例如矽烷氧化 物與鈦烷氧化物之組成莫耳比。例如，由僅藉矽烷氧化物 之水解所得之塗佈組成物所得之塗膜的折射率，爲1.45 左右之値。而由僅將鈦烷氧化物水解所得之塗佈組成物所 得之塗膜之折射率，爲2. 1左右之値。因此，當欲將塗佈 膜之折射率設定爲1.45〜2.1左右之間之特定之値時，能 以實現該折射率的方式，以既定比例使用矽烷氧化物與鈦 烷氧化物來製造塗佈組成物。 又，即使使用其之金屬烷氧化物，亦可調整所得之塗 佈膜之折射率。再者，關於本發明之塗佈膜之折射率，除 組成條件以外，亦可藉由選擇成膜條件來調整。藉由如此 ，可於實現塗佈膜之高硬度的同時，實現所欲之折射率値 〇 由本發明之塗佈組成物製得塗膜時，較佳爲如上述， 將塗佈組成物之塗膜乾燥、接著燒成。乾燥，以於室溫〜 15 0°C進行爲佳、更佳爲以40〜120°C進行。又，乾燥時間 -24- 201245345 以30秒〜l〇分鐘左右爲佳、更佳爲1〜8分鐘左右。乾燥 方法，以使用加熱板或熱風循環式烘箱等爲佳。 燒成，考量觸控面板之其他構成構件的耐熱性，較佳 爲以100°C〜3 00°C進行、更佳爲以150°C〜250°C進行》 又’燒成時間以5分鐘以上爲佳、更佳爲1 5分鐘以上。 燒成方法，以使用加熱板、熱循環式烘箱、紅外線烘箱等 爲佳。 於將塗佈組成物之塗膜燒成以製造塗佈膜時，視燒成 溫度所得之塗佈膜之折射率會改變。於該場合，若使燒成 溫度愈高 '愈可提高塗佈膜之折射率。因此，藉由選擇燒 成溫度爲適當之値，可調整所得之塗佈膜的折射率。 又’當由塗佈組成物製得塗佈膜時，若於燒成前對塗 膜照射紫外線（UV )，則所得之塗佈膜的折射率會改變 。具體而言，若紫外線照射量愈多，可愈提高塗佈膜的折 射率。因此，可選擇紫外線照射的有無以實現所欲之折射 率°特別是，當塗佈組成物所含之金屬烷氧化物，含有鈦 院氧化物、鉻烷氧化物或鉬烷氧化物時，藉由對燒成前之 塗膜照射紫外線（UV )，所得之塗佈膜之折射率會改變 ，紫外線照射量愈多，可愈提高塗佈膜的折射率。又，於 塗佈膜’當藉由選擇組成等條件可實現所欲之折射率時， 亦可不進行紫外線照射。 當進行紫外線照射時，藉由選擇其之照射量時，可調 整塗佈膜之折射率。於塗佈膜，當爲了所欲之折射率需要 照射紫外線時’例如，可使用高壓水銀燈。使用有高壓水 -25- 201245345 銀燈時，以3 65 nm換算，以全光照射1 000 mJ/cm2以上之 照射量爲佳' 更佳爲3000mJ/cm2〜10000mJ/cm2之照射量 。紫外線之光源，除高壓水銀燈之外，亦可使用低壓水銀 燈、金屬鹵素燈、氙氣燈、準分子燈等。當使用高壓水銀 燈以外之光源時，可照射與上述使用高壓水銀燈情形時同 量之積算光量。當進行紫外線照射時，亦可於於乾燥步驟 與燒成步驟之間進行紫外線照射步驟。 於塗佈組成物，特別是含有鈦烷氧化物成分時，具有 於室溫保持下黏度會緩緩上升的性質。因此，雖於實用上 不會有成爲大問題的懸念，但當於精密地控制塗佈膜的膜 厚時，以對溫度等進行慎重地管理爲佳。又，如此之黏度 的上升，隨塗佈組成物中之鈦烷氧化物之組成比率增多而 變得顯著。其可考量係因鈦烷氧化物對矽烷氧化物等之水 解速度大、縮合反應快之故。 塗佈組成物，當含有鈦烷氧化物成分時，爲了減少黏 度變化，較佳爲以下之製法（1)與製法（2)之2種。 (1) 於將鈦烷氧化物於金屬鹽的存在下進行水解之 際，事先將二醇類與鈦烷氧化物充分混合後，視需要，與 矽烷氧化物混合，於有機溶劑的存在下進行水解。藉由如 此，可得黏度變化小之塗佈組成物。該（1 )之製法之有 效原因，可推測爲由於將鈦烷氧化物與二醇類混合之際會 發熱，故於鈦烷氧化物之烷氧基、與二醇類之間產生酯交 換反應，因此對於水解、縮合反應爲安定化之故。 (2) 事先將矽烷氧化物於金屬鹽的存在下進行水解 -26- 201245345 反應後，混合至與二醇類混合之鈦烷氧化物溶液以進行縮 合反應，製得塗佈組成物。藉由如此，可得黏度變化小之 塗佈組成物。 該（2)之製法之有效原因，可推測爲以下之理由。 亦即，矽烷氧化物之水解反應係以較快之速度進行，而之 後之縮合反應與鈦烷氧化物相比較慢。因此，若水解反應 結束後，快速地加入鈦烷氧化物，則水解反應後之矽烷氧 化物之矽烷醇基、與鈦烷氧化物會均一地反應。藉此，鈦 烷氧化物的縮合反應性由水解反應後之矽烷氧化物安定化 之故。 事先將水解後之矽烷氧化物、與鈦烷氧化物混合之方 法，以往即嘗試過。然而，當反應所使用之有機溶劑不含 醇類時，無法得到貯藏安定性優異之塗佈組成物。又，2 )所示之方法，於由具有快速水解速度之其他金屬烷氧化 物與矽烷氧化物製得塗佈組成物時亦有用。 本發明之塗佈組成物，可使用一般所進行之塗佈法， 成膜爲塗膜，之後，成爲塗佈膜。塗佈法，例如，可使用 浸漬塗佈法、旋塗法、噴塗法、刷毛塗佈法、輥轉印法、 網版印刷法、噴墨法或膠版印刷法等。其中，以適於圖型 印刷之噴墨法與膠版印刷法爲特佳。 &lt;塗佈膜&gt; 本發明之塗佈膜，係使用上述本發明之塗佈組成物所 形成。而作成觸控面板之電極保護膜，適用於後述之本發 -27- 201245345 明之觸控面板》 本發明之塗佈膜，係含有無機物之金屬氧化物作爲成 分之塗佈膜，與由丙烯酸材料等有機材料所構成之塗佈膜 相比硬度高，具有高強度。亦即，機械強度優異，而能由 以手指等之多數次之按壓來保護透明電極。 當觸控面板係由使用有機材料所構成之膜來構成時， 例如，當配置於觸控面板之電極間之層間絕緣膜爲由丙烯 酸等有機材料構成時，本發明之塗佈膜特別有效。亦即， 即使於有機材料所構成之膜上形成本發明之塗佈膜，亦可 選擇成分組成來使其不會因與有機膜之熱伸縮性的差異而 產生裂痕。 又，本發明之塗佈膜，亦適於作爲後述之觸控面板之 電極的保護膜。亦即，藉由該塗佈膜，可抑制透明電極之 目視辨認現象（可見電極圖型現象）。因此，藉由使用該 塗佈膜所形成之觸控面板，可減低顯示裝置之顯示性的降 低。 於觸控面板之透明電極被目視辨認之原因，係因基板 之操作區域之透明電極圖型之折射率與基板之折射率不同 所致。觸控面板之透明電極圖型，通常係由無機之金屬氧 化物之ITO (銦錫氧化物，Indium Tin Oxide )所構成。 ITO之折射率，爲1.8〜2.1左右。另一方面，玻璃基板之 折射率爲1.4〜1.5前後，故與ITO之折射率有很大的不同 。該折射率的不同，於形成有透明電極圖型之區域、與未 形成之區域之間，會產生光反射特性的不同。亦即，由於 -28- 201245345 與干涉相關之界面反射特性，於形成有透明電極圖型之區 域、與未形成之區域爲不同，結果使畫面顯示中之電極圖 型顯眼。 此處，本發明人爲了不使電極圖型顯眼而努力探討的 結果發現，於基板上所配置之透明電極圖型上’設置將折 射率與膜厚控制爲所欲之範圍內之層爲有效。具體而言’ 藉由將透明電極圖型之保護層之折射率與膜厚控制爲最佳 範圍，可抑制觸控面板之不蓄意之透明電極圖型之目視辨 認。 本發明之塗佈膜，特別是爲了透明電極圖型之目視辨 認現象時，係將折射率控制爲1. 5 0〜1 · 70之範圍內、較佳 爲1 . 5 2〜1 . 7 0之範圍內。折射率之控制法，如上述，除控 制塗佈組成物之成分組成之外，藉由成膜方法之控制亦可 實現。 塗佈膜之形成方法，可舉例如下述方法：於本發明之 塗佈組成物，使用膠版印刷等一般所進行之塗佈法，塗膜 於觸控電極之電極上以成膜，之後，作成塗佈膜之方法》 &lt;觸控面板&gt; 接著，說明具有本發明之塗佈膜之觸控面板。 圖1及圖2,係說明本發明之觸控面板之構成之圖。 圖1，係模式顯示觸控面板之構造之俯視圖。圖2，係沿 圖1之A1-A1’之截面圖。 如圖1所示，觸控面板1，係使用透明之基板2所構 -29- 201245345 成，於基板2之操作區域形成有透明電極之圖型》具體而 言，於基板2之操作區域中，具有朝Y方向延伸之第1透 明電極3、朝X方向延伸之第2透明電極4。第1透明電 極3與第2透明電極4，係由設置於基板2之同一面之同 一層所構成。 基板2，係使用玻璃、丙烯酸樹脂、聚酯樹脂、聚對 酞酸乙二酯樹脂、聚碳酸酯樹脂、聚偏二氯乙烯樹脂、聚 甲基丙烯酸甲酯樹脂、聚萘二甲酸乙二酯樹脂、聚乙醯纖 維素樹脂等透明材料所構成》特別是，較佳爲選擇於塗佈 膜5之形成較佳之具備耐熱性與耐藥品性能的材料。基板 2之厚度，當使用玻璃時，例如爲0.1mm〜2mm左右，當 使用樹脂薄膜時，例如爲ΙΟμιη〜2000μιη左右。 圖1中，第1透明電極3與第2透明電極4,各別以 複數之墊片部21作爲構成要素。各墊片部21，係以使平 面上分別隔離、且各墊片部2 1間之間隙爲小的方式配置 。亦即’於X軸方向成列之墊片部21、與於Υ軸方向成 列之墊片部2 1 ’係以盡可能使該等相互交叉之區域縮小的 方式’配置於操作區域之整體。墊片部21，例如可爲菱形 、矩形及六角形等多角形等多角形形狀，該等可配置於互 相錯開或直列狀。又，分離（隔開）之電極之數目亦不限 於圖1之例’若操作區域大則視所要求之檢測位置之精度 來決定。 連接複數之墊片部21所構成之第1透明電極3與第2 透明電極4 ’係形成於相當於觸控面板1之操作區域的位 -30- 201245345 置。第1透明電極3，係分離設置於沿X方向之複數的區 域，以檢測X方向之座標。第2透明電極4，係分離設置 於沿Y方向之複數的區域，以檢測Y方向之座標。藉由 作成如此之構造，亦提高檢測觸控位置之精度。 於第1透明電極3與第2透明電極4，係使用至少對 可見光之透過率高、具有導電性之透明電極材料來形成。 如此具有導電性之透明電極材料，可舉例如ITO ( Indium Tin Oxide &gt; 銦錫氧化物）、IZO( Indium Zinc Oxide，銦 鋅氧化物）或ZnO (氧化鋅）等。當使用ITO時，爲了確 保充分之導電性，較佳爲使厚度爲l〇nm〜200nm。 第1透明電極3與第2透明電極4，例如可以如下方 式形成。 首先，考量底層之基板2的材質由選自濺鍍法、真空 蒸鍍法、離子鍍法、噴霧法、浸漬法或CVD法等之中之 方法成膜爲透明導電膜。接著，使用光微影技術將上述透 明導電膜圖型化。又，亦可使用將上述材料所構成之導電 性塡料等分散於有機溶劑之塗料，以印刷法形成既定之圖 型。 於透明電極之形成步驟中，以能精度佳地控制膜厚爲 佳β因此，於形成時，較佳爲選擇能實現所欲之膜厚、可 形成透明性優異之低電阻之膜的方法。 如圖1及圖2所示，第1透明電極3與第2透明電極 4’係形成於基板2之同一面上’成爲同一層。因此’第1 透明電極3與第2透明電極4’於複數之部位交叉而形成 -31 - 201245345 交叉部1 8。 於本發明，於交叉部18,係以使第1透明電極3與第 2透明電極4之一者與另一者不相接的方式分開。亦即， 如圖2所示，於複數之交叉部18之任一者中，雖與與第2 透明電極4相連，但第1透明電極3爲分開。而爲了連接 第1透明電極3之分開部位，設置交聯電極20。於交聯電 極20與第2透明電極4之間，設置有絕緣性物質所構成 之層間絕緣膜19。以下，參照圖1及圖2進一步詳述。 如圖2所示，於交叉部18中之第2透明電極4之上 ，形成有光透過性之層間絕緣膜1 9。層間絕緣膜1 9之形 成，係使用感光性丙烯酸樹脂等有機材料。當使用感光性 丙烯酸樹脂時，係利用光微影法，成爲僅於交叉部18中 之第2透明電極4之上形成丙烯酸膜之構造。又，亦可使 用Si02等無機材料。當使用Si02時，例如，可藉由使用 遮罩之濺鍍法，形成同樣的構造。當考慮圖型化性時，較 佳爲於層間絕緣膜19使用丙烯酸膜。 於層間絕緣膜1 9之上層，設置有交聯電極20。交聯 電極20，係將於交叉部18分開之第1透明電極3彼此電 氣連接者’較佳爲由光透過性之材料形成。藉由設置交聯 電極20，可將第1透明電極3於Y方向電氣連接。 如圖1所示，第1透明電極3與第2透明電極4，係 將菱形之墊片部21縱向或橫向排列複數個所成之形狀。 第2透明電極4中，位於交叉部18之連接部分，係呈寬 度較第2透明電極4之菱形之墊片部21更窄的形狀。又 -32- 201245345 ’交聯電極20，亦以寬度較菱形之墊片部2ι更窄的形狀 形成爲長方形。 如圖1及圖2所示’本發明之觸控面板1，於第1透 明電極3與第2透明電極4之上，作爲保護膜，形成有上 述本發明之塗佈膜5。而於相當於觸控面板1之操作區域 之部分’被覆有透明電極之形成區域與非形成區域。塗佈 膜5’係高硬度，與無機材料所構成之第1透明電極3及 第2透明電極4之密合性優異。 於本發明之塗佈膜5之形成，係使用上述本發明之塗 佈組成物。具體而言’係使用將上述式（I)與式（II )所 示之金屬烷氧化物於鋁鹽的存在下於有機溶劑中水解、縮 合，再添加抗析出劑所得之塗佈組成物。 於觸控面板1，能以不使第1透明電極3與第2透明 電極4之各透明電極圖型不顯眼的方式，選擇塗佈膜5之 折射率與膜厚。具體而言，塗佈膜5之折射率，以大於 1.50、1.70以下之範圍內爲佳，膜厚以40nm〜170nm之 範圍內爲佳。當塗佈膜5之折射率大於1.50小於1.60時 ，膜厚以60nm〜150nm之範圍內爲更佳。又，當塗佈膜5 之折射率大於1.60小於1.70時，膜厚以40nm〜1 70nm之 範圍內爲更佳。 於觸控面板1，例如，塗佈膜5，係由含有矽烷氧化 物與鈦烷氧化物之塗佈組成物所形成者，折射率爲1.52、 膜厚爲100nm。 如圖2所示，觸控面板1，係將形成有第1透明電極 -33- 201245345 3等之面，與顯示面板10之目視辨認側之最上層，透過使 用丙烯酸系光硬化性樹脂等之接著層9疊合，藉此可形成 1個顯示裝置。此處，接著層9,係設置於塗佈膜5上。 上述之顯示裝置，具有觸控面板1、與顯示面板1〇, 視需要亦可具有背光源。於圖2，雖省略詳細說明，但顯 示面板1 〇，可作成與周知之顯示裝置同樣的構成。例如， 當爲液晶顯示裝置時，顯示面板10，可作成於2片透明基 板之間夾持液晶層的構造。與各透明基板之液晶層相鄰側 的相反側，可分別設置偏光板。又，於各透明基板，爲了 控制液晶狀態可形成分段電極或共電極。而液晶層係以各 透明基板與密封材密封。 如圖1所示，觸控面板1中，於第1透明電極3及第 2透明電極4之端部，分別設置有端子（未圖示），由該 端子拉出複數條之拉出配線11。拉出配線11，可使用銀 、鋁、鉻、銅或鉬、或Mo - Nb (鉬一鈮）合金等之含有 該等金屬之合金等作成不透明之金屬配線。拉出配線11， 係連接於對第1透明電極3及第2透明電極4施加電壓、 或檢測觸控位置之控制電路（未圖示）。 於具有以上構成之觸控面板1，係依序於複數之第1 透明電極3及第2透明電極4施加電壓而賦與電荷。若導 電體之手指觸碰於操作區域之任一部位，則由於指尖、與 第1透明電極3及第2透明電極4之間之靜電容量結合而 形成電容器。因此，藉由捕捉指尖之接觸位置之電荷的變 化，而能檢測出手指觸碰於任一部位。 -34- 201245345 又，觸控面板1，亦可藉由控制電路（未圖示），選 擇性地於第1透明電極3及第2透明電極4之任一者施加 電壓。於該場合，於電壓所施加之透明電極上形成電場， 所於該狀態下手指觸碰，則接觸位置會透過人體之靜電容 量而接地。其之結果，於對象之第1透明電極3或第2透 明電極4之端子（未圖示）、與接觸位置之間，會產生電 阻値的變化。該電阻値，與接觸位置、與對象之第1透明 電極3或第2透明電極4之端子之距離成比例，故藉由以 控制電路檢測流通接觸位置、與對象之第1透明電極3或 第2透明電極4之端子之間之電流値，可求出接觸位置之 座標。 本發明之觸控面板1，藉由設置於第1及第2透明電 極3、4上之塗佈膜5的效果，可抑制操作區域ώ透明電 極圖型而亦能抑制操作區域中透明電極圖型的顯眼情形。 接著，說明本發明之觸控面板1之製造方法。 圖3 ( a)〜（d )，係顯示本發明之第1例之觸控面 板之製造方法之步驟截面圖。 首先，準備玻璃基板等之透明基板2。基板2，視需 要裁切成所欲之形狀，並洗淨。接著，於基板2之一面形 成透明導電膜。又，亦有於基板2與透明導電膜之間形成 SiOx、SiNx、SiON等中間層的情形。透明導電膜，例如 爲IT0,使用濺鍍法或真空蒸鍍法等以10〜200nm之厚度 成膜。接著’以於透明導電膜之上層側形成有感光性樹脂 等所構成之蝕刻遮罩的狀態，將透明導電膜蝕刻，以圖型 -35- 201245345 形成第1透明電極3及第2透明電極4。藉由除去蝕刻遮 罩，可得如圖3(a)所示之形成有透明電極圖型之透明導 電膜基板14。 此處，透明導電膜基板14之交叉部18中，第2透明 電極4係透過連接部分相連，但第1透明電極3係分開。 接著，於設置有第1透明電極3及第2透明電極4之 側，藉由塗佈感光性樹脂後之曝光現象，於第2透明電極 4之連接部分形成層間絕緣膜19(圖3(b))。用以形成 層間絕緣膜1 9之感光性樹脂，係使用具有透明性者。例 如，可使用丙烯酸樹脂等。又，當使用Si02形成層間絕 緣膜19時，可藉由使用遮罩之濺鍍法，作成同樣的構造 。然而，當考量圖型化性時，以使用丙烯酸樹脂爲佳。 接著，於層間絕緣膜1 9上形成透明導電膜後，以於 該透明導電膜之表面形成有感光性樹脂所構成之蝕刻遮罩 的狀態，將透明導電膜蝕刻。之後，除去蝕刻遮罩，以使 第1透明電極3之分開部分相連的方式，於層間絕緣膜19 之上層形成交聯電極20。藉此，可得圖3(c)所示之構 造。形成於層間絕緣膜1 9上之透明導電膜，可舉例如 ITO膜。於該場合，交聯電極20係由ITO所形成。 又，上述之拉出配線11，係於之後之步驟使用銀油墨 等來形成。然而，亦可於上述步驟將透明導電膜蝕刻之際 ，分別沿著第1透明電極3及第2透明電極4之外周緣殘 留透明導電膜，以形成拉出配線1 1。 接著，於第1透明電極3、第2透明電極4及交聯電 -36- 201245345 極20之上，以膠版印刷塗佈金屬氧化物層形成用之塗佈 組成物。此處，塗佈組成物，係將金屬烷氧化物於金屬鹽 (例如，鋁鹽）之存在下於有機溶劑中水解、縮合，再添 加抗析出劑所得者。接著，將形成有塗佈組成物之塗膜之 基板2，於40〜150°C (例如，60°C )之例如加熱板上乾 燥。之後，於1〇〇〜130°C (例如，25 0 °C )之例如烘箱內 加熱，而於第1透明電極3、第2透明電極4及交聯電極 20上形成金屬氧化物層5。藉此，可得圖3 ( d )所示之觸 控面板基板3 0。又，亦可將基板2上之塗膜，以例如加熱 板上乾燥後，對該塗膜照射紫外線之後，於烘箱內加熱。 如此所得之本發明之塗佈膜5，係以無機之金屬氧化 物爲主要成分而硬度高、具有高強度。此外，即使於有機 膜之層間絕緣膜1 9上，內部亦無產生裂痕》 接著，由第1透明電極3與第2透明電極4之端部之 端子（未圖示）以銀油墨等形成拉出配線11，作成觸控面 板1»觸控面板1，係透過拉出配線11，連接觸控面板之 控制電路（未圖示）。 所完成之觸控面板1，透過丙烯酸系透明接著劑等之 接著層9，係安裝於顯示面板1 0之頂面。此時，視需要於 基板2或顯示面板10之角設置調正標示以進行對位。 藉由於安裝於顯示面板1〇之觸控面板1，設置塗佈膜 5，可實現高可靠性。而第1透明電極3與第2透明電極4 之透明電極圖型，可抑制於觸控面板1之操作區域的顯眼 情形。 -37- 201245345 圖4，係顯示本發明之觸控面板之另一例之槪 之截面圖。如圖4所示，觸控面板101，具有透明 102。於基板102之操作區域形成有透明電極之圖 即，於基板1 02之上層設置有分別用以檢測2個相 之位置之第1透明電極103與第2透明電極104。 第1透明電極103與第2透明電極104，係使 對可見光之透過率高、具有導電性之透明電極材料 。如此具有導電性之透明電極材料，例如，可使用 ZnO等。當使用ITO時，爲了確保充分之導電性， 使厚度爲l〇nm〜200nme 第1透明電極103與第2透明電極104，可考 之透明基板102或後述之保護膜107，由選自濺鍍 空蒸鍍法、離子鍍法、噴霧法、·浸漬法或CVD法 選擇最佳之方法形成。 例如有下述方法：將形成爲面狀之透明電極， 微影技術以蝕刻法圖型化之方法；或者，使用於有 分散上述材料所構成之導電性塡料等之塗料，以印 接形成所欲之圖型之方法等。透明電極之形成步驟 爲能精度佳地控制膜厚。因此，形成時，較佳爲選 現所欲之膜厚、能形成透明性優異之低電阻之膜的: 如圖4所示，第1透明電極103係配置於基板 上。而於第1透明電極103之上，形成有本發明之 105。於塗佈膜105之形成，係使用上述之本發明 組成物。而該塗佈膜〗〇 5，係被覆於相當於觸控面 略構成 之基板 型。亦 異方向 用至少 所形成 ITO或 較佳爲 量底層 法、真 等之中 利用光 機溶劑 刷法直 ，較佳 擇可實 方法。 102之 塗佈膜 之塗佈 板101 -38- 201245345 之操作區域之部分之第1透明電極103之形成區域與非形 成之區域。 於該塗佈膜105之上，設置有保護膜層1〇7。保護膜 層107，係由透明性高之丙烯酸樹脂所形成之有機材料所 構成之膜。 如圖4所示，第2透明電極104係配置於保護膜層 107之上。於第2透明電極104之上形成有本發明之塗佈 膜106。於塗佈膜106之形成，係使用上述之本發明之塗 佈組成物。而塗佈膜106，係被覆於相當於觸控面板1〇1 之操作區域之部分之透明電極之形成區域與非形成之區域 。該塗佈膜105、106，係硬度高、而與第1透明電極103 及第2透明電極104之密合性優異。而本發明之塗佈膜 106，係以無機之金屬氧化物爲主要成分，但於保護膜層 107上並無裂痕的產生。亦即，塗佈膜106，即使與第2 透明電極104 —同以被覆有機材料所構成之膜之保護膜層 107的方式形成，於內部亦無產生裂痕。 觸控面板1 〇 1中，能以不使第1透明電極103及第2 透明電極104之各透明電極圖型不顯眼的方式，選擇塗佈 膜105、106之折射率與膜厚。具體而言，塗佈膜105、 106之折射率，以大於1.50、1.70以下之範圍內爲佳，膜 厚以40nm〜170nm之範圍內爲佳。而當塗佈膜105、106 之折射率大於1.50小於1.60時，膜厚以60nm〜150nm之 範圍內爲更佳。又，當塗佈膜105、106之折射率爲1.60 以上1.70以下之範圍內時，膜厚以40nm〜170nm之範圍 -39- 201245345 內爲更佳。 觸控面板101中，例如，第1透明電極103及第2透 明電極1 04，係分別以膜厚28nm之ITO所構成。於該場 合，塗佈膜1 05、1 06，係分別以含有矽烷氧化物與鈦烷氧 化物之本發明之塗佈組成物所形成者，折射率爲1 . 5 2、膜 厚爲1 OOnm。 如圖4所示，於塗佈膜106之上，設置有丙烯酸系之 透明接著劑所構成之接著層1〇8。觸控面板101，係透過 該接著層108安裝於顯示面板1 10。 具有以上構成之觸控面板101，若導電體之手指觸碰 於操作區域之任一部位，則由於指尖、與第1透明電極 103及第2透明電極104之間之靜電容量結合而形成電容 器。因此，藉由捕捉指尖之接觸位置之電荷的變化，而能 檢測出手指觸碰於任一部位。 於觸控面板101，藉由設置於第1透明電極103及第 2透明電極104上之塗佈膜105、106 ’可實現高可靠性。 而亦能抑制操作區域中透明電極圖型的顯眼情形。 圖5及圖6，係顯示本發明之觸控面板之另一例之構 造之圖。圖5，係模式顯示本發明之觸控面板之再另一例 之構造之俯視圖。圖6，係沿圖5之B1—B1’之截面圖。 如圖5所示，觸控面板201’係使用透明基板202所 構成，而於基板202之操作區域形成有透明電極圖型。亦 即，具有形成於基板202之一面之用以檢測X方向之座標 之第1透明電極203、與形成於基板202之另—面之用以 -40- 201245345 檢測Y方向之座標之第2透明電極204。又，於以下之說 明中’基板202之一面爲上方、基板202之另一面爲下方 。而於該場合，基板202之另一面係裝設於顯示面板210 側之面。 基板202爲介電體基板。基板202之材料，係使用玻 璃、丙烯酸樹脂、聚酯樹脂、聚對酞酸乙二酯樹脂、聚碳 酸酯樹脂、聚偏二氯乙烯樹脂、聚甲基丙烯酸甲酯樹脂、 聚萘二甲酸乙二酯樹脂、聚乙醯纖維素樹脂等透明材料。 特別是，較佳爲選擇於本發明之塗佈膜205、206之形成 較佳之具備耐熱性與耐藥品性能的材料。基板202之厚度 ’若爲玻璃，可爲0.1 mm〜2mm，若爲樹脂薄膜時，可爲 ΙΟμιη 〜2000μπι。 如圖5所示，第1透明電極203與第2透明電極204 ，分別係由細長之長方形所構成。第1透明電極2 〇 3係朝 Υ方向延伸、第2透明電極204係朝X方向延伸，分別以 —定間隔配設爲直線狀。又，第1透明電極203與第2透 明電極204，係配設成相互成正交，整體呈格子狀。 第1透明電極203與第2透明電極204，係使用至少 對可見光之透過率高、具有導電性之透明電極材料所形成 。如此具有導電性之透明電極材料，例如，可使用ΙΤΟ或 ΖηΟ等。當使用ΙΤΟ時，爲了確保充分之導電性，較佳爲 使厚度爲l〇nm〜200nm。 第1透明電極203與第2透明電極204，可考量底層 之透明基板2〇2’由選自濺鍍法、真空蒸鍍法、離子鍍法 -41 - 201245345 、噴霧法、浸漬法或CVD法等之中選擇最佳之方法形成 〇 例如有下述方法：將形成爲面狀之透明電極，利用光 微影技術以蝕刻法圖型化之方法；或者，使用於有機溶劑 分散上述材料所構成之導電性塡料等之塗料，以印刷法直 接形成所欲之圖型之方法等。透明電極之形成步驟，能精 度佳地控制膜厚爲重要。因此，形成時，較佳爲選擇可實 現所欲之膜厚、能形成透明性優異之低電阻之膜的方法。 如圖5及圖6所示，於第1透明電極203之上，形成 有塗佈膜205»塗佈膜205，係被覆於相當於觸控面板201 之操作區域之部分之透明電極之形成區域與非形成之區域 。又，如圖6所示，於第2透明電極204上（圖中爲下側 )亦形成有塗佈膜206。塗佈膜206，係被覆於相當於觸 控面板201之操作區域之部分之透明電極之形成區域與非 形成之區域。該塗佈膜205、206，係硬度高、且與第1透 明電極203與第2透明電極204之密合性優異。 塗佈膜205、206之形成，係使用將金屬烷氧化物於 鋁鹽的存在下於有機溶劑中水解、縮合，再添加抗析出劑 所得之上述本發明之塗佈組成物。 觸控面板201中，能以不使第1透明電極203及第2 透明電極2 04之各透明電極圖型不顯眼的方式，選擇塗佈 膜2 05、206之折射率與膜厚。具體而言，塗佈膜2 05、 2 06之折射率，以分別大於1.50、1.70以下之範圍內爲佳 ，膜厚以分別爲40nm〜17〇nm之範圍內爲佳。而當塗佈 -42- 201245345 膜205、206之折射率大於 1.50小於 1.60時，膜厚以 60nm〜150nm之範圍內爲更佳。又，當塗佈膜205、206 之折射率爲1.60以上1.70以下之範圍內時，膜厚以40nm 〜170nm之範圍內爲更佳。 觸控面板201中，例如，第1透明電極2 03及第2透 明電極204，係分別以膜厚28nm之ITO所構成。於該場 合，塗佈膜205、206，係分別爲使用矽烷氧化物與鈦烷氧 化物所調製之塗佈組成物所形成者，折射率爲1.52、膜厚 爲 1 00nm。 如圖6所示，於基板2 02之一面，設置有丙烯酸系之 透明接著劑所構成之接著層208。又，於接著層208上， 接著由透明樹脂所構成之保護膜207。又，於圖5係省略 保護膜207。 保護膜207，具有第1透明電極203及塗佈膜205之 保護膜的功能。又，亦可塗佈透明樹脂取代保護膜207。 於該場合，可不要接著層208。 於基板202之另一面，透過丙烯酸系之透明接著劑所 構成之接著層209，安裝有顯示面板110。 於圖6雖省略詳細，但顯示面板210，可作成與周知 之顯示裝置同樣的構成。例如，當爲液晶顯示裝置時，顯 示面板2 1 0，可作成於2片透明基板之間夾持液晶層的構 造。於與各透明基板之液晶層相鄰側的相反側，可分別設 置偏光板。又，於各透明基板，爲了控制液晶狀態可形成 分段電極或共電極。而液晶層係以各透明基板與密封材密 -43- 201245345 封。 觸控面板201中，於第1透明電極203 極2 04之端部，分別設置有端子（未圖示） 出複數條之拉出配線。拉出配線，可使用銀 或含有該等之合金等作成不透明之金屬配線 係連接於對第1透明電極203及第2透明電 壓、或檢測觸控位置之控制電路（未圖示） 具有以上構成之觸控面板201，若導電 於操作區域之任一部位，則由於指尖、與負 203及第2透明電極204之間之靜電容量結 器。因此，藉由捕捉指尖之接觸位置之電荷 檢測出手指觸碰於任一部位。 於觸控面板20 1，藉由於第1透明電極 明電極204上設置塗佈膜205、206的效果 區域中透明電極圖型的顯眼情形。 如以上，本實施形態之觸控面板之另一 上述不同，並非於層間絕緣膜或保護膜層等 脂等所構成之有機膜上設置本發明之塗佈膜 明之塗佈膜對於如此之觸控面板之例，亦具 度之電極之保護膜的功能。而防止透明電極 形。 以上，係說明本發明之觸控面板，但本 上述實施形態。對於使用ITO等之透明電極 觸控面板，作爲其透明電極上之保護膜，亦 及第2透明電 ，由該端子拉 、銘、鉻、銅 ◊拉出配線， 極2 04施加電 〇 體之手指觸碰 I 1透明電極 合而形成電容 的變化，而能 203及第2透 ，可抑制操作 其他例，係與 之丙烯酸系樹 的構造。本發 有有效之高強 圖型的顯眼情 發明並不限於 的多種型式之 可使用本發明 -44- 201245345 之塗佈膜。而實現高可靠性。並且，亦可抑制透明電極之 顯眼情形。此時，本發明之塗佈膜，即使形成於設置於觸 控面板內之各種有機膜上，於內部亦不會產生裂痕等》 實施例 以下，根據實施例以更詳細地說明本發明，但本發明 並不限於該等。 [實施例所使用之簡略記號] 於以下之實施例等所使用之簡略記號之意義，係如以 下。 TEOS :四乙氧矽烷 C18:十八基三乙氧矽烷 MPS: r —毓基丙基三甲氧矽烷 GPS: 縮水甘油醚基丙基三甲氧矽烷 UPS: γ -醯脲基丙基三乙氧矽烷 APS: r —胺基丙基三乙氧矽烷 acps ： r —丙烯醯氧基丙基三甲氧矽烷 MPMS: r —甲基丙烯醯氧基丙基三甲氧矽烷 MTES :甲基三乙氧矽烷 TIPT :四異丙氧基鈦 AN :硝酸鋁九水合物 EG :乙二醇 HG : 2 —甲基一 2,4 —戊二醇（別稱：己二醇） -45- 201245345 BCS : 2- 丁氧乙醇（別稱：丁基賽路蘇） IPA : 2 -丙院 &lt;合成例1 &gt; (塗佈組成物K1之合成） 於200mL燒瓶中加入AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.6g、HG 38.8g、BCS 36.8g、 TEOS 21.7g、GPS 10.6g，於室溫條件下攪拌30分鐘，得 A1液。 於300mL容量之燒瓶中，加入作爲鈦烷氧化物之 TIPT 4.7g，於其加入HG 58.2g，於室溫條件下攪拌30分 鐘，得A2液。 接著，混合上述之A1液與A2液，於室溫條件下攪 拌3 0分鐘。藉此，製得塗佈組成物K1。 &lt;合成例2 &gt; (塗佈組成物K2之合成） 於200mL燒瓶中加入 AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.7g、HG 39.2g、BCS 37.3g、 TEOS 21.7g、MPS 8.8g，於室溫條件下攪拌30分鐘，得 B1液。 於3 OOmL容量之燒瓶中，加入作爲鈦烷氧化物之 TIPT 4.7g，於其加入HG 58.9g，於室溫條件下攪拌30分 鐘，得B2液。 接著，混合上述之B 1液與B2液，於室溫條件下攪拌 30分鐘。藉此，製得塗佈組成物K2。 -46 - 201245345 &lt;合成例3 &gt; (塗佈組成物K3之合成） 於200mL燒瓶中加入AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.6g、HG 38.8g、BCS 36.9g、 TEOS 21.7g、ACPS 10.5g，於室溫條件下攪拌30分鐘， 得Cl液。 於3 OOmL容量之燒瓶中，加入作爲鈦烷氧化物之 TIPT 4.7g，於其加入HG 58.2g，於室溫條件下攪拌30分 鐘，得C2液》 接著，混合上述之C1液與C2液，於室溫條件下攪拌 3 〇分鐘。藉此，製得塗佈組成物K3。 &lt;合成例4 &gt; (塗佈組成物K4之合成） 於2 00mL燒瓶中加入AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.5g、HG 38.6g、BCS 36.7g、 TEOS 21.7g、MPMS ll.lg，於室溫條件下攪拌30分鐘， 得D1液。 於300mL容量之燒瓶中，加入作爲鈦烷氧化物之 TIPT 4.7g，於其加入HG 57.9g，於室溫條件下攪拌30分 鐘，得D2液。 接著，混合上述之D1液與D2液’於室溫條件下攪 拌30分鐘。藉此，製得塗佈組成物K4。 &lt;合成例5 &gt; (塗佈組成物K5之合成） -47- 201245345 於200mL燒瓶中加入AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.9g、HG 39.7g、BCS 37.7g、 TEOS 15_5g、MTES 13.3g，於室溫條件下攪拌30分鐘， 得E 1液。 於300mL容量之燒瓶中，加入TIPT 4.7g、HG 59.5g ，於室溫條件下攪拌30分鐘，得E2液。 接著，混合上述之E1液與E2液，於室溫條件下搅拌 3 〇分鐘。藉此，製得塗佈組成物K5。 &lt;合成例6 &gt; (塗佈組成物K6之合成） 於200mL燒瓶中加入 AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.4g、HG 38.3g、BCS 36.4g、 TEOS 21.7g、MPMS 9.3g、C18 3.1g，於室溫條件下攪拌 3 〇分鐘，得F1液。 於300mL容量之燒瓶中，加入TIPT 4.7g、HG 57.4g ，於室溫條件下攪拌30分鐘，得F2液。 接著，混合上述之F1液與F2液，於室溫條件下攪拌 3〇分鐘。藉此，製得塗佈組成物K6。 &lt;合成例7 &gt; (塗佈組成物K7之合成） 於200mL燒瓶中加入AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.5g、HG 38.6g、BCS 36.7g、 TEOS 15.5g、APS 1.7g、ACPS 6.7g、GPS 8.8g，於室溫條 件下攪拌30分鐘，得G1液。 -48- 201245345 於3 00mL容量之燒瓶中，加入TIPT 4.7g、HG 57.9g ，於室溫條件下攪拌30分鐘，得G2液。 接著，混合上述之G1液與G2液，於室溫條件下攪 拌3 0分鐘。藉此，製得塗佈組成物K7。 &lt;合成例8 &gt; (塗佈組成物K8之合成） 於200mL燒瓶中加入AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.5g、HG 38.5g、BCS 36.6g、 TEOS 15.5g、MPS 1 .5g、ACPS 10.5g、UPS 5.9g，於室溫 條件下攪拌3 0分鐘，得H1液》 於30 0mL容量之燒瓶中，加入TIPT 4.7g、HG 57.7g ，於室溫條件下攪拌30分鐘，得H2液。 接著，混合上述之Η1液與H2液，於室溫條件下攪 拌3 0分鐘。藉此，製得塗佈組成物Κ8。 &lt;合成例9 &gt; (塗佈組成物Κ9之合成） 於200mL燒瓶中加入AN 13.1g、水3.1g攬拌，使 AN 溶解。於其加入 EG 13.3g、HG 95.2g、BCS 36.2g、 TEOS 16.3g、MPMS 22.8g，於室溫條件下攪拌30分鐘。 藉此，製得塗佈組成物K9。 &lt;合成例1 〇 &gt;(塗佈組成物Κ 1 0之合成） 於200mL燒瓶中加入AN 12.1g、水2.8g攪拌，使 AN 溶解。於其加入 EG 13.5g、HG 56.7g、BCS 36.8g、 -49- 201245345 TEOS 13.7g、MPMS 10.9g，於室溫條件下攪拌30分鐘， 得U液。 於300mL容量之燒瓶中，加入TIPT 13.4g、HG 40.1g ，於室溫條件下攪拌30分鐘，得12液。 接著，混合上述之II液與12液，於室溫條件下搅拌 30分鐘。藉此，製得塗佈組成物K10。 &lt;合成例11&gt; (塗佈組成物K11之合成） 於200mL燒瓶中加入 AN 11.8g、水2.8g攪拌，使 AN 溶解。於其加入 EG 13.6g、HG 44.8g、BCS 36.8g、 TEOS 10.5g、MPMS 10.3g，於室溫條件下攪拌30分鐘， 得Π液。 於300mL容量之燒瓶中，加入TIPT 17.4g、HG 52.1g ，於室溫條件下攪拌3 0分鐘，得J2液。 接著’混合上述之J1液與J2液，於室溫條件下攪拌 3 〇分鐘。藉此，製得塗佈組成物K 1 1。 &lt;合成例12&gt; (塗佈組成物K12之合成） 於200mL燒瓶中加入AN 11.5g、水2.7g攪拌，使 AN 溶解。於其加入 EG 13.6g、HG 33.5g、BCS 36.9g、 TEOS 7_2g、MPMS 10.0g，於室溫條件下攪拌30分鐘，得 L1液。 於300mL容量之燒瓶中，加入TIPT 21.2g、HG 63.6g ，於室溫條件下攪拌30分鐘，得L2液。 -50- 201245345 接著，混合上述之L1液與L2液，於室溫條件下攪泮 30分鐘。藉此，製得塗佈組成物K12。 &lt;合成例1 3 &gt;(塗佈組成物K 1 3之合成） 於200mL燒瓶中加入 AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.7g、HG 39.1g' BCS 37.1g、 TEOS 31.lg，於室溫條件下攪拌30分鐘，得Ml液》 於3 00mL容量之燒瓶中，加入TIPT 4_7g、HG 58.6g ，於室溫條件下攪拌30分鐘，得M2液。 接著，混合上述之Μ 1液與M2液，於室溫條件下攪 拌3 0分鐘。藉此，製得塗佈組成物Κ1 3。於塗佈組成物 Κ13，未含有上述通式（II)所示構造之金屬烷氧化物·&gt; 〈合成例14&gt; (塗佈組成物Κ14之合成） 於200mL燒瓶中加入AN 12.7g、水3.0g攪拌，使 AN 溶解。於其加入 EG 13.7g、HG 39.2g、BCS 37.3g、 TEOS 2 8.0g、MTES 2.7g，於室溫條件下攪拌30分鐘，得 N1液。 於3 00mL容量之燒瓶中，加入TIPT 4.7g、HG 58.8g ，於室溫條件下攪拌30分鐘，得N2液。 接著，混合上述之N1液與N2液，於室溫條件下攪 拌3 0分鐘。藉此，製得塗佈組成物Κ 1 4。 於塗佈組成物Κ 1 3，與上述合成例1〜合成例1 2之塗 佈組成物K1〜K12相比，僅含有少量之上述通式（Π )所 -51 - 201245345 示構造之金屬烷氧化物》 &lt;合成例1 5 &gt;(塗佈組成物Κ 1 5之合成） 於200mL燒瓶中加入AN 12.7g、水3.0g攪 AN 溶解。於其加入 IPA 145.6g、TEOS 15.5g、 18.5g、TIPT 4.7g，於室溫條件下攪拌30分鐘。藉 得塗佈組成物Κ 1 5。 &lt;安定性之評價&gt; 對上述合成例所得之塗佈組成物，將塗佈組员 〜K12及K15，分別作爲實施例1〜實施例12及 1 5，進行安定性評價。 安定性之評價方法，係使用合成之塗佈組成物 K12、K15 )，以孔徑0.5微米之膜濾器加壓過濾後 溫條件下放置1星期。接著，以旋塗法於矽基板 成膜之後，於矽基板上之塗膜未觀察到異物者評價 觀察到異物者評價爲X。將上述之評價結果示於表1 拌，使 MPMS 此，製 匕物 K1 比較例 (K1〜 ，於室 (100 ) 爲〇， -52- 201245345 [表1]Ti(〇R,,)4 (V) In the formula (IV), R" represents a carbon number of 1 to 5; ί a metal alkoxide represented by the formula (I), and tetraethtanium oxide or tetrapropyl may be used. Titanium oxide titanium oxide compound or titanium tetra-n-butoxy oxidation tetramerization of metal alkoxide of formula (I), ethoxylated pin, tetrapropoxide zirconia, tetrabutyl zirconia; tributyl aluminate, triisopropyl alumina The content of the first metal alkoxide of the triethyl phosphide, the pentoxide oxidized giant, the pentoxide oxide, and the like, and the oxidation of the first metal alkoxide and the second metal alkane by 20 mol% to 85 mol%, more preferably The second metal alkane 1 metal alkoxide represented by the above formula (Π) is used in the composition of the present invention, and a coating film is formed on the film composed of the material containing the second metal alkoxide. When the film is filmed, it is possible to prevent cracks from occurring on the coating film. If an acryl film is used for the interlayer insulating film or the like, a coating film is formed thereon. It is also possible to prevent the coating film from being cracked. L-alkyl. Specifically, oxidant, quaternary titanium oxide, etc. Other examples of the condensate and the like include, for example, a tetradecane zirconia compound alumina such as a tetradecane pentoxide oxidized molybdenum compound equal to a total amount of the substances contained in the coating composition, preferably % to 7 0 Ear % » Oxide, and the above-mentioned first coating composition. The coating group is formed on an organic film by an organic mild coating film such as an acrylic material and an organic film. For example, it is composed of a touch panel acid material. The content of the second metal alkoxide of -14 to 201245345 which is organically terminated on the interlayer insulating film is preferably the total amount of the first metal alkoxide and the second metal alkoxide contained in the coating composition. 80% by mole to 15% by mole, more preferably 70% by mole to 30% by mole. When the carbon number of R2 is 3 or less, the content of the metal alkoxide represented by the formula (II) is 30. When the carbon number of R2 is 4 or more, or the sulfhydryl group is contained in R2, the content of the second metal alkoxide is preferably 15% or more, and more preferably 75 mol% or less. When the content of the second metal alkoxide is less than 15 mol%, the coating film obtained on the above organic film When the film is 80 mol% or more, cracks are not generated, but a uniform coating film cannot be obtained. By making it such a content, the above-mentioned content can be suppressed. The total content of the first metal alkoxide and the second metal alkoxide contained in the coating composition is preferably 0.5% by weight to 20% by weight, more preferably 3% by weight. When the ratio is large, the storage stability of the coating composition is deteriorated, and the film thickness control of the coating film becomes difficult. On the other hand, when it is small, the thickness of the obtained coating film becomes thin. In order to obtain a predetermined film thickness, it is necessary to apply a plurality of times. A preferred metal alkoxide represented by the formula (11), for example, when Μ 2 is ruthenium, for example, the following compounds may be mentioned. For example, methyltrimethoxysilane, methyltripropoxydecane, methyltriethoxyoxane, methyltributyloxane, methyltripentyloxydecane, methyltripentyloxynonane, methyltriphenyloxide Decane, methyltribenzyloxane, methyltriphenylethoxyxane, glycidyl ether methyltrimethoxydecane, glycidyl ether-15- 201245345 methyltriethoxyoxane, alpha-glycidyl ether ethyl Trimethoxy decane, α-glycidyl ether ethyl triethoxy decane, θ-glycidyl ether ethyl trimethoxy decane, /3 - glycidyl ether ethyl triethoxy decane, α-glycidyl ether Trimethoxy oxane, α-glycidyl ether propyl triethoxy decane, iS-glycidyl ether propyl trimethoxy decane, iS-glycidyl ether propyl triethoxy decane, r-glycidyl ether Trimethoxyoxane, r-glycidyl ether propyl triethoxy decane, τ-glycidyl ether propyl tripropoxy decane, r-glycidyl propyl tributyl decane, 7-glycidyl ether Propyltriphenyloxane, α-glycidyl ether butyl trimethoxy decane, α-shrinkage Glyceryl ether butyl triethoxy decane, s — glycidyl ether butyl triethoxy decane, r glycidyl ether butyl trimethoxy decane, τ-glycidyl ether butyl triethoxy decane, 5 - glycidyl ether butyl trimethoxy decane, 5-glycidyl ether butyl triethoxy decane, (3,4-epoxycyclohexyl)methyltrimethoxy decane, (3,4-epoxy ring) Hexyl)methyltriethoxy decane, bis-(3,4-epoxycyclohexyl)ethyltrimethoxy decane, /3 - (3,4-epoxycyclohexyl)ethyltriethoxy decane; S —(3,4-epoxycyclohexyl)ethyltripropoxydecane, /3—(3,4-epoxycyclohexyl)ethyltributyloxane, 一一(3,4-epoxy Cyclohexyl)ethyltriphenyloxane, (3,4-epoxycyclohexyl)propyltrimethoxyoxane, r-(3,4-epoxycyclohexyl)propyltriethoxyoxane, 5- (3,4-epoxycyclohexyl)butyltrimethoxydecane, (5-(3,4-epoxycyclohexyl)butyltriethoxydecane, glycidyl ether methylmethyldimethoxydecane Glycidyl ether Methylmethyldiethoxysilane, α-glycidyl ether ethylmethyldimethoxy-16- 201245345 decane, α-glycidyl ether ethylmethyldiethoxy decane, yS-glycidyl ether Methyl dimethoxy decane, hydrazine-glycidyl ether ethyl ethyl dimethoxy decane, α-glycidyl ether propyl methyl dimethoxy decane, α-glycidyl ether propyl methyl di Oxy decane, no glycidyl ether propyl methyl dimethoxy decane, yS - glycidyl ether propyl ethyl dimethoxy decane, 7 - glycidyl ether propyl methyl dimethoxy decane, T - Glycidyl ether propyl methyl diethoxy decane, 7 - glycidyl ether propyl methyl dipropoxy oxane, r - glycidyl ether propyl methyl dibutoxy oxane, r - glycidyl ether Methyldiphenoxynonane, T-glycidyl ether propyl ethyl dimethoxy decane, r-glycidyl ether propyl ethyl diethoxy decane, r-glycidyl ether propyl vinyl dimethyl Oxane, r-glycidyl ether propyl vinyl diethoxy decane, ethyl trimethoxy decane, ethyl triethoxy hydrazine , vinyl trimethoxy decane, vinyl triethoxy decane, vinyl triethoxy decane, phenyl trimethoxy decane, phenyl triethoxy decane, phenyl triethoxy decane, γ - chloropropyl trimethoxy Decane, 7-chloropropyltriethoxydecane, γ-chloropropyltriethoxyoxane, 3:3,3-trifluoropropyltrimethoxydecane, r-methacryloxypropyltrimethoxydecane, Τ-mercaptopropyltrimethoxydecane, mercaptopropyltriethoxyoxane, cold-cyanoethyltriethoxydecane, chloromethyltrimethoxydecane, chloromethyltriethoxydecane, N- (/3 -Aminoethyl)r-Aminopropyltrimethoxyoxane, N-(d-aminoethyl)7-aminopropylmethyldimethoxydecane, r-Aminopropylmethyldimethoxy矽, N-(0-aminoethyl)7-aminopropyltriethoxy decane, N-(0-aminoethyl)r-aminopropylmethyldiethoxy decane, dimethyldi Methoxy decane, phenylmethyl dimethyl-17- 201245345 oxoxane, dimethyldiethoxy decane, phenylmethyldiethoxy decane, r-chloropropylmethyldimethoxydecane, r-chloropropane Methyldiethyl Decane, dimethyldiethoxydecane, r-methacryloxypropylmethyldimethoxydecane, r-methacryloxypropylmethyldiethoxydecane, τ-mercaptopropylpropyl Dimethoxyoxane, r-mercaptopropylmethyldiethoxysilane, methylvinyldimethoxydecane, methylvinyldiethoxyoxane,r_ureidopropyltriethoxypropane,r - ureidopropyl trimethoxy decane, r - ureido propyl tripropoxy decane, (R)-n-i-phenylethyl-ν'-triethoxy propyl propyl urea, (R) - Ν - 1 monophenylethyl - Ν '-trimethoxy propyl propyl urea, allyl triethoxy decane, 3- methacryloxypropyl trimethoxy decane ' 3- methacryloxy Propyltriethoxy decane, 3-propenyloxypropyltrimethoxy decane, 3-propenyloxypropyltriethoxy decane, 3-isoacyl acrylate triethoxy decane, trifluoropropyltrimethoxy decane , bromopropyltriethoxysilane, diethyldiethoxydecane, diethyldimethoxydecane, diphenyldimethoxydecane, diphenyldiethoxydecane, trimethylethoxyoxane, trimethyl Methoxy oxane, p-benzene Vinyl trimethoxy decane, p-styryl triethoxy decane, p-styryl tripropoxy decane, and the like. These may be used singly or in combination of two or more. The metal salt contained in the coating composition of the present invention can be represented by the following formula (ΠΙ). M3(X)k (III) In the formula (III), Μ3, X, and k are as defined above. Among them, M3 is preferably aluminum (A1), indium (In), cerium (Ce) or zirconium (Zr). ). Further, X is preferably a residue of hydrochloric acid, nitric acid, acetic acid, oxalic acid, sulfonic acid, acetamidineacetic acid or -18-201245345 acetamidine pyruvate, or a basic salt thereof. The residue in the above X, for example, nitric acid, also referred to as nitrate or sulfuric acid, is also referred to as sulfur in an amount equivalent to the valence of M3. The term "basic salt" means a metal salt represented by the formula (ΠΙ) containing an OH group in the residue of each of the above acids, particularly preferably a nitrate salt, an oxalate salt or a basic salt thereof. . Among them, the nitrate which is obtained or the storage stability of the coating composition is more preferable. The coating composition of the present invention contains an organic solvent. When the coating film is formed from the coating composition to obtain a coating film, the viscosity of the coating composition is applied to improve the coating property, so that the content of the composition organic solvent is applied, relative to the coating composition. The total metal content contained in the substance is preferably 80% by weight to 99.5% by weight, more preferably 85% by weight. When the content of the organic solvent is small, the obtained coating film is thin, and a plurality of coatings are required in order to obtain a predetermined film thickness. When the other side is a long time, the storage stability of the coating composition is deteriorated, and it is difficult to control the film thickness of the film. The organic solvent used for coating the composition may, for example, be methanol, 1-propanol or 2-propanol. 1 an alcohol such as monobutanol, 2-butanol, 2-methylpropanol or 2-methyl-2-propanol; a glycol such as an ester alcohol such as ethyl acetate; or an ester derivative thereof; Ethers such as diethyl ether; ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as benzene and toluene may be used singly or in combination. In the coating composition, when the titanium alkoxide component is contained, each of the acid groups has a shape of I. Chlorination Easiness Aluminium, indium machine solvent Alkoxide oxidation in the adjustment: % ~ 9 9 Thickness change surface, when coated, ethanol E-1 - : ethylenediacetone, . The alkylene glycol or a monoether thereof contained in the organic solvent -19-201245345 may, for example, be ethylene glycol, diethylene glycol, propylene glycol, hexanediol, or the like monomethyl group. Monoethyl, monopropyl, monobutyl or monophenyl ether. When the diol of the organic solvent used for coating the composition or the monoether thereof is less than 1 with respect to the molar ratio of the titanium alkoxide, the effect on the stability of the titanium alkoxide is small, and the coating is small. The storage stability of the composition for cloth deteriorates. On the other hand, there is no problem in using a large amount of a glycol or a monoether thereof. For example, the organic solvent used for coating the composition may be all of the above-mentioned glycols or their monoethers. However, when the coating composition does not contain a titanium alkoxide, it is not particularly necessary to contain the above-mentioned glycols and/or their monoethers. It is preferred that the coating composition contains an anti-precipitation agent. The anti-precipitation agent prevents precipitation of a metal salt into the coating film when the coating film is formed from the coating composition. The anti-precipitation agent may, for example, be N-methyl-pyrrolidone, dimethylformamide, dimethylacetamide, ethylene glycol, diethylene glycol, propylene glycol or hexanediol, or the like. Derivatives, etc. Among them, N-methyl-pyrrolidone, ethylene glycol, diethylene glycol, propylene glycol, propylene glycol or hexanediol or derivatives thereof are preferred. The anti-precipitation agent may be used in at least one type. The content of the anti-precipitation agent in the coating composition is preferably such that the metal of the above metal salt is converted into a metal oxide to satisfy the following ratio (weight ratio). (Anti-Cleavage Agent/Metal Oxide) If the above ratio is less than 1, the anti-precipitation effect of the metal salt is small when the coating film is formed. On the other hand, if a large amount of the anti-precipitation agent is used, it does not affect the coating group -20-201245345, but it is preferably 200 or less. In the anti-precipitation agent, a metal alkoxide, particularly a decane oxide, a titanium alkoxide, or a decane oxide and a titanium alkoxide may be added during the hydrolysis or condensation reaction in the presence of a metal salt, or may be hydrolyzed. And adding the content of the metal salt contained in the coating composition, and constituting the metal atoms (M1 and M2) of the first and second metal alkoxides and the metal atom of the metal salt ( The total content ratio of M3) is preferably such that the ratio (mol ratio) described below is satisfied. 0.01^ M3/(M'+M2 + M3) ^ 0.7 If the ratio is less than 〇.〇 1, the mechanical strength of the obtained film is insufficient, which is not preferable. On the other hand, when it exceeds 0.7, the coating film has low adhesion to a substrate such as a glass substrate or a transparent electrode. Further, when fired at a low temperature of 450 ° C or lower, the chemical resistance of the obtained coating film tends to decrease. Among them, the ratio is preferably 〇.〇1~0.6. The coating composition of the present invention may contain components other than the above components, such as inorganic microparticles, metalloxane oligomers, metal oxide polymers, and leveling agents, as long as the effects of the present invention are not impaired. , surfactants and other ingredients. The inorganic fine particles are preferably fine particles such as cerium oxide fine particles, alumina fine particles, or titanium oxide fine particles 'magnesium fluoride fine particles, and a colloidal solution of the inorganic fine particles is particularly preferable. The colloidal solution may be one in which inorganic fine particles are dispersed in a dispersion medium, or may be a colloidal solution of a commercially available product. In the present invention, by containing inorganic fine particles, the surface shape or other functions of the formed hard-21 - 201245345 film can be imparted. The inorganic fine particles preferably have a particle diameter of 0.001 to 0.2 μm, more preferably 0.001 to ο. ίμιη. When the average particle diameter of the inorganic fine particles exceeds 〇·2 μm, the transparency of the cured film formed using the prepared coating liquid may be lowered. A dispersion medium of inorganic fine particles. For example, water and an organic solvent are mentioned. The colloidal solution is preferably adjusted from the viewpoint of the coating liquid for film formation to adjust the pH or pH to 1 to 10, more preferably 2 to 7. The organic solvent used for the dispersion medium of the colloidal solution may, for example, be methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, butylene glycol, 2-methyl-2,4-pentanediol, diethylene glycol. Alcohols such as dipropylene glycol and ethylene glycol monopropyl ether; ketones such as methyl ethyl ketone and methyl isobutyl ketone; aromatic hydrocarbons such as toluene and xylene; dimethyl acetamide, hydrazine - methyl- ruthenium The amides such as alkyl ketones are esters such as ethyl acetate, butyl acetate and r-butyrolactone: ethers such as tetrahydrofuran and 1,4-dioxane. Among these, alcohols and ketones are preferred. These organic solvents may be used singly or in combination of two or more kinds as a dispersion medium. The solid content concentration in the coating composition of the present invention is preferably in the range of 0.5% by weight to 20% by weight based on the metal alkoxide and the metal salt. When the solid content exceeds 20% by weight, the storage stability of the coating composition is deteriorated, and the film thickness control of the coating film is difficult. On the other hand, when the solid content is less than 0.5% by weight, the thickness of the obtained coating film becomes thin, and it is necessary to apply a plurality of times in order to obtain a predetermined film thickness. Wherein, the solid content concentration is from 1% by weight to 15% by weight, more preferably from -22 to 201245345, in the coating composition of the present invention, wherein the above-mentioned third and second metal alkoxides are present in the above metal salt. The hydrolysis is carried out, and water is contained in order to obtain a condensate. The amount of water is preferably 2 to 24 moles based on the total moles of the first and second metal alkoxides. When the ratio of the amount of water (the total number of moles of the molybdenum alkoxide) is 2 or less, the hydrolysis of the metal alkoxide is insufficient, which results in a decrease in film formability or a decrease in the strength of the obtained coating film. 'It is not good. Further, when the ratio is more than 24, the polycondensation will continue, and the storage stability will be lowered, which is not preferable. Among them, the molar ratio is preferably 2 to 20. Further, when the metal salt contained in the coating composition is a hydrated salt, since the water contained therein is related to the hydrolysis reaction, the amount of water contained in the coating composition must be considered in the water contained in the metal salt. For example, when the coexisting metal salt is a hydrated salt of an aluminum salt, since the water contained therein is related to the reaction, it is necessary to consider the amount of water contained in the aluminum salt relative to the amount of water used for the hydrolysis. In the coating composition of the present invention, a coating film suitable for a touch panel can be formed. The coating film is a film mainly composed of a metal oxide of an inorganic material, and has a higher strength than a film of an organic material such as an acrylic material. In the touch panel described later, it is suitable as a protective film for an electrode. Since the coating film has a moderate thermal stretchability, even if it is formed on the organic film constituting the touch panel, the occurrence of cracks can be minimized. Further, the refractive index can be controlled to an optimum range to reduce the decrease in the display property of the display device which can be visually recognized by the transparent electrode pattern. The control of the refractive index of the coating film can be achieved by controlling the composition of the coating composition. That is, the coating film of the present invention can be formed by hydrolyzing and condensing the metal alkoxide contained in the composition of the above-mentioned coated -23-201245345, by selecting the composition of the metal alkoxide. The refractive index of the coating film is adjusted to within a predetermined range. For example, when a decane oxide and a titanium alkoxide are selected as the metal alkoxide, the refractive index of the obtained coating film can be adjusted to a predetermined range, specifically, a later-described range by adjusting the mixing ratio thereof. In the range of about 1.45 to 2.1, that is, the coating film formed by coating the coating composition, preferably after drying, and after firing, can be determined when the required refractive index is determined. The manner in which the refractive index is achieved determines the compositional molar ratio of the metal alkoxide, such as a decane oxide to a titanium alkoxide. For example, the refractive index of a coating film obtained by coating a composition obtained by hydrolysis only of a decane oxide is about 1.45. And the refractive index of the coating film obtained by the coating of the composition of the titanium alkoxide is about 2.1. Therefore, when the refractive index of the coating film is to be set to a specific value of about 1.45 to 2.1, the coating can be produced by using a decane oxide and a titanium alkoxide in a predetermined ratio so as to achieve the refractive index. Composition. Further, even if a metal alkoxide is used, the refractive index of the obtained coating film can be adjusted. Further, the refractive index of the coating film of the present invention can be adjusted by selecting film formation conditions in addition to the composition conditions. By doing so, it is possible to achieve a desired refractive index while achieving a high hardness of the coating film. When a coating film is produced from the coating composition of the present invention, it is preferred to apply the coating composition as described above. The film was dried and then fired. Drying is preferably carried out at room temperature to 150 ° C, more preferably at 40 to 120 ° C. Further, the drying time -24 - 201245345 is preferably about 30 seconds to about 1 minute, more preferably about 1 to 8 minutes. The drying method is preferably a hot plate or a hot air circulating oven. In the case of firing, it is preferable to carry out heat resistance at 100 ° C to 300 ° C, more preferably 150 ° C to 250 ° C for the other constituent members of the touch panel, and the firing time is 5 minutes. The above is better, and more preferably it is more than 15 minutes. The firing method is preferably a hot plate, a heat cycle oven, an infrared oven or the like. When the coating film of the coating composition is fired to produce a coating film, the refractive index of the coating film obtained depending on the firing temperature changes. In this case, if the firing temperature is made higher, the refractive index of the coating film can be increased. Therefore, the refractive index of the obtained coating film can be adjusted by selecting the firing temperature to be appropriate. Further, when a coating film is obtained from a coating composition, if the coating film is irradiated with ultraviolet rays (UV) before firing, the refractive index of the resulting coating film changes. Specifically, as the amount of ultraviolet irradiation is increased, the refractive index of the coating film can be increased. Therefore, the presence or absence of ultraviolet irradiation can be selected to achieve a desired refractive index. In particular, when the metal alkoxide contained in the coating composition contains a titanium oxide, a chromium alkoxide or a molybdenum alkoxide, When the coating film before firing is irradiated with ultraviolet rays (UV), the refractive index of the obtained coating film changes, and the more the ultraviolet irradiation amount, the more the refractive index of the coating film can be increased. Further, when the coating film 'is desired to have a desired refractive index by selecting a composition or the like, ultraviolet irradiation may not be performed. When ultraviolet irradiation is performed, the refractive index of the coating film can be adjusted by selecting the irradiation amount thereof. In the case of coating a film, when ultraviolet rays are required to be irradiated for a desired refractive index, for example, a high pressure mercury lamp can be used. When using a high-pressure water -25- 201245345 silver lamp, it is better to irradiate 1 000 mJ/cm2 or more with full light at 3 65 nm, more preferably 3000 mJ/cm2 to 10000 mJ/cm2. In addition to high-pressure mercury lamps, low-pressure mercury lamps, metal halide lamps, xenon lamps, and excimer lamps can be used as the light source for ultraviolet rays. When a light source other than a high-pressure mercury lamp is used, the same amount of light can be irradiated as in the case of using the high-pressure mercury lamp described above. When ultraviolet irradiation is performed, an ultraviolet irradiation step may be performed between the drying step and the firing step. When the coating composition contains a titanium alkoxide component in particular, it has a property that the viscosity gradually rises at room temperature. Therefore, there is no suspense that is a big problem in practical use. However, when the film thickness of the coating film is precisely controlled, it is preferable to carefully manage the temperature or the like. Further, such an increase in viscosity becomes remarkable as the composition ratio of the titanium alkoxide in the coating composition increases. It can be considered that the hydrolysis rate of the titanium alkoxide to the decane oxide is large, and the condensation reaction is fast. When the coating composition contains a titanium alkoxide component, in order to reduce the viscosity change, two of the following methods (1) and (2) are preferred. (1) When the titanium alkoxide is hydrolyzed in the presence of a metal salt, the diol and the titanium alkoxide are sufficiently mixed in advance, and if necessary, mixed with the decane oxide and then carried out in the presence of an organic solvent. hydrolysis. Thereby, a coating composition having a small change in viscosity can be obtained. The reason for the production method of the above (1) is presumed to be due to the fact that the titanium alkoxide and the diol are heated, so that a transesterification reaction occurs between the alkoxy group of the titanium alkoxide and the diol. Therefore, the hydrolysis and condensation reactions are stabilized. (2) The decane oxide is hydrolyzed in the presence of a metal salt in advance -26-201245345, and then mixed with a solution of a titanium alkoxide mixed with a diol to carry out a condensation reaction to obtain a coating composition. By doing so, a coating composition having a small change in viscosity can be obtained. The reason for the validity of the method of (2) can be presumed to be the following reasons. That is, the hydrolysis reaction of the decane oxide proceeds at a relatively fast rate, and thereafter the condensation reaction is slower than that of the titanium alkoxide. Therefore, when the titanium alkoxide is rapidly added after completion of the hydrolysis reaction, the stanol group of the decane oxide after the hydrolysis reaction is uniformly reacted with the titanium alkoxide. Thereby, the condensation reactivity of the titanium alkoxide is stabilized by the decane oxide after the hydrolysis reaction. A method of mixing a hydrolyzed decane oxide with a titanium alkoxide in advance has been tried in the past. However, when the organic solvent used for the reaction does not contain an alcohol, a coating composition excellent in storage stability cannot be obtained. Further, the method shown in 2) is also useful in the preparation of a coating composition from other metal alkoxides having a rapid hydrolysis rate and a decane oxide. The coating composition of the present invention can be formed into a coating film by a coating method which is generally carried out, and then becomes a coating film. For the coating method, for example, a dip coating method, a spin coating method, a spray coating method, a brush coating method, a roll transfer method, a screen printing method, an ink jet method, or an offset printing method can be used. Among them, an ink jet method and an offset printing method suitable for pattern printing are particularly preferable. &lt;Coating film&gt; The coating film of the present invention is formed by using the above-described coating composition of the present invention. The electrode protective film for the touch panel is applied to the touch panel of the present invention as described in the above-mentioned Japanese Patent Publication No. -27-201245345. The coating film of the present invention is a coating film containing a metal oxide of an inorganic substance as a component, and an acrylic material. The coating film composed of an organic material has high hardness and high strength. That is, the mechanical strength is excellent, and the transparent electrode can be protected by pressing with a finger or the like. When the touch panel is formed of a film made of an organic material, for example, when the interlayer insulating film disposed between the electrodes of the touch panel is made of an organic material such as acrylic acid, the coating film of the present invention is particularly effective. That is, even if the coating film of the present invention is formed on a film composed of an organic material, the composition of the component can be selected so as not to cause cracks due to the difference in thermal stretchability from the organic film. Further, the coating film of the present invention is also suitable as a protective film for an electrode of a touch panel to be described later. That is, with the coating film, the visual recognition phenomenon of the transparent electrode (visible electrode pattern phenomenon) can be suppressed. Therefore, by using the touch panel formed by the coating film, the display performance of the display device can be reduced. The reason why the transparent electrode of the touch panel is visually recognized is that the refractive index of the transparent electrode pattern in the operating region of the substrate is different from the refractive index of the substrate. The transparent electrode pattern of the touch panel is usually composed of inorganic metal oxide ITO (Indium Tin Oxide). The refractive index of ITO is about 1.8 to 2.1. On the other hand, since the refractive index of the glass substrate is about 1.4 to 1.5, it is greatly different from the refractive index of ITO. The difference in refractive index causes a difference in light reflection characteristics between a region in which a transparent electrode pattern is formed and a region in which it is not formed. That is, since the interface reflection characteristic associated with interference of -28-201245345 is different from the area where the transparent electrode pattern is formed and the unformed area, the electrode pattern in the screen display is conspicuous. Here, the inventors of the present invention have found that it is effective to control the refractive index and the film thickness to be within a desired range on the transparent electrode pattern disposed on the substrate as a result of an effort to make the electrode pattern conspicuous. . Specifically, by controlling the refractive index and film thickness of the protective layer of the transparent electrode pattern to an optimum range, visual recognition of the unintentional transparent electrode pattern of the touch panel can be suppressed. The coating film of the present invention, particularly for the visual recognition of the transparent electrode pattern, is controlled to have a refractive index of 1.50 to 1 · 70, preferably 1. 5 2 to 1. 7 0 Within the scope. The control method of the refractive index, as described above, can be achieved by controlling the film formation method in addition to controlling the composition of the coating composition. The method of forming the coating film may be, for example, a coating method of the present invention, which is applied to an electrode of a touch electrode by a coating method such as offset printing to form a film, and then formed. Method of coating film &lt;Touch Panel&gt; Next, a touch panel having the coating film of the present invention will be described. 1 and 2 are views showing the configuration of a touch panel of the present invention. FIG. 1 is a plan view showing a configuration of a touch panel. Figure 2 is a cross-sectional view taken along line A1-A1' of Figure 1. As shown in FIG. 1 , the touch panel 1 is formed by using a transparent substrate 2 -29-201245345, and a pattern of transparent electrodes is formed in an operation region of the substrate 2, specifically, in an operation region of the substrate 2. The first transparent electrode 3 extending in the Y direction and the second transparent electrode 4 extending in the X direction are provided. The first transparent electrode 3 and the second transparent electrode 4 are formed of the same layer provided on the same surface of the substrate 2. The substrate 2 is made of glass, acrylic resin, polyester resin, polyethylene terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, polymethyl methacrylate resin, polyethylene naphthalate. In particular, it is preferable to select a material which is preferably a heat-resistant and chemical-resistant material which is formed in the coating film 5 to be formed of a transparent material such as a resin or a polyethylene-cellulose resin. The thickness of the substrate 2 is, for example, about 0.1 mm to 2 mm when glass is used, and is, for example, about ιμηη to 2000μηη when a resin film is used. In Fig. 1, the first transparent electrode 3 and the second transparent electrode 4 each have a plurality of spacer portions 21 as constituent elements. Each of the shim portions 21 is disposed such that the flat surfaces are separated and the gap between the shim portions 21 is small. In other words, the spacer portion 21 which is arranged in the X-axis direction and the spacer portion 2 1 ' which is aligned in the x-axis direction are disposed in the entire operation region so as to reduce the areas where the mutually intersecting regions are as small as possible. . The spacer portion 21 may have a polygonal shape such as a polygonal shape such as a rhombus, a rectangle or a hexagon, and the like may be arranged in a mutually staggered or in-line shape. Further, the number of separated (separated) electrodes is not limited to the example of Fig. 1. If the operation area is large, it is determined depending on the accuracy of the required detection position. The first transparent electrode 3 and the second transparent electrode 4' formed by connecting the plurality of spacer portions 21 are formed in positions -30 - 201245345 corresponding to the operation region of the touch panel 1. The first transparent electrode 3 is separated and disposed in a plurality of regions along the X direction to detect coordinates in the X direction. The second transparent electrode 4 is separated from a plurality of regions in the Y direction to detect coordinates in the Y direction. By making such a configuration, the accuracy of detecting the touch position is also improved. The first transparent electrode 3 and the second transparent electrode 4 are formed using a transparent electrode material having a high transmittance of visible light and having conductivity. Examples of the conductive transparent electrode material include ITO (Indium Tin Oxide &gt; Indium Tin Oxide), IZO (Indium Zinc Oxide), and ZnO (Zinc Oxide). When ITO is used, in order to ensure sufficient conductivity, it is preferred to have a thickness of from 10 nm to 200 nm. The first transparent electrode 3 and the second transparent electrode 4 can be formed, for example, in the following manner. First, the material of the substrate 2 of the underlayer is formed into a transparent conductive film by a method selected from the group consisting of a sputtering method, a vacuum deposition method, an ion plating method, a spray method, a dipping method, and a CVD method. Next, the above transparent conductive film is patterned using photolithography. Further, a coating material obtained by dispersing a conductive material or the like composed of the above materials in an organic solvent may be used to form a predetermined pattern by a printing method. In the step of forming the transparent electrode, it is preferable to control the film thickness with high precision. Therefore, at the time of formation, it is preferred to select a film having a low film which can achieve a desired film thickness and which is excellent in transparency. As shown in Figs. 1 and 2, the first transparent electrode 3 and the second transparent electrode 4' are formed on the same surface of the substrate 2, and are formed in the same layer. Therefore, the first transparent electrode 3 and the second transparent electrode 4' intersect at a plurality of portions to form a -31 - 201245345 intersection portion 18. In the present invention, the intersection portion 18 is separated such that one of the first transparent electrode 3 and the second transparent electrode 4 does not contact the other. That is, as shown in FIG. 2, in any of the plurality of intersecting portions 18, the first transparent electrode 3 is separated from the second transparent electrode 4. In order to connect the separated portions of the first transparent electrode 3, the cross-linked electrode 20 is provided. An interlayer insulating film 19 made of an insulating material is provided between the crosslinked electrode 20 and the second transparent electrode 4. Hereinafter, it will be described in further detail with reference to FIGS. 1 and 2 . As shown in Fig. 2, a light-transmitting interlayer insulating film 19 is formed on the second transparent electrode 4 in the intersection portion 18. The interlayer insulating film 19 is formed by using an organic material such as a photosensitive acrylic resin. When a photosensitive acrylic resin is used, it is a structure in which an acrylic film is formed only on the second transparent electrode 4 in the intersection portion 18 by photolithography. Further, an inorganic material such as SiO 2 may also be used. When SiO 2 is used, for example, the same structure can be formed by sputtering using a mask. When the patterning property is considered, it is preferable to use an acrylic film for the interlayer insulating film 19. A layer of the interlayer insulating film 19 is provided with a cross-linking electrode 20. The cross-linked electrode 20 is preferably electrically connected to the first transparent electrode 3 which is separated from the intersection portion 18 by a light-transmitting material. By providing the cross-linking electrode 20, the first transparent electrode 3 can be electrically connected in the Y direction. As shown in Fig. 1, the first transparent electrode 3 and the second transparent electrode 4 are formed by arranging a plurality of diamond-shaped spacer portions 21 in a longitudinal direction or a lateral direction. In the second transparent electrode 4, the connecting portion located at the intersection portion 18 has a shape having a narrower width than the diamond-shaped spacer portion 21 of the second transparent electrode 4. Further, the -32-201245345' cross-linked electrode 20 is also formed in a rectangular shape in a narrower shape than the diamond-shaped spacer portion 2i. As shown in Fig. 1 and Fig. 2, the touch panel 1 of the present invention has the coating film 5 of the present invention described above as a protective film on the first transparent electrode 3 and the second transparent electrode 4. The portion corresponding to the operation region of the touch panel 1 is covered with a formation region and a non-formation region of the transparent electrode. The coating film 5' has a high hardness and is excellent in adhesion to the first transparent electrode 3 and the second transparent electrode 4 which are made of an inorganic material. In the formation of the coating film 5 of the present invention, the above-described coating composition of the present invention is used. Specifically, a coating composition obtained by hydrolyzing and condensing a metal alkoxide represented by the above formula (I) and formula (II) in an organic solvent in the presence of an aluminum salt, and further adding an anti-precipitation agent is used. In the touch panel 1, the refractive index and film thickness of the coating film 5 can be selected so that the respective transparent electrode patterns of the first transparent electrode 3 and the second transparent electrode 4 are not conspicuous. Specifically, the refractive index of the coating film 5 is preferably in the range of more than 1.50 and 1.70 or less, and the film thickness is preferably in the range of 40 nm to 170 nm. When the refractive index of the coating film 5 is more than 1.50 and less than 1.60, the film thickness is preferably in the range of 60 nm to 150 nm. Further, when the refractive index of the coating film 5 is more than 1.60 and less than 1.70, the film thickness is preferably in the range of 40 nm to 1 70 nm. In the touch panel 1, for example, the coating film 5 is formed of a coating composition containing a decane oxide and a titanium alkoxide, and has a refractive index of 1.52 and a film thickness of 100 nm. As shown in FIG. 2, the touch panel 1 is formed with a surface of the first transparent electrode -33-201245345 3 or the like, and the uppermost layer on the visual recognition side of the display panel 10 is made of an acrylic photocurable resin or the like. Layer 9 is then laminated, whereby one display device can be formed. Here, the subsequent layer 9 is provided on the coating film 5. The display device described above has a touch panel 1 and a display panel 1 〇, and may have a backlight as needed. Although the detailed description is omitted in Fig. 2, the display panel 1A can be configured in the same manner as the well-known display device. For example, in the case of a liquid crystal display device, the display panel 10 can be constructed to sandwich a liquid crystal layer between two transparent substrates. A polarizing plate may be separately provided on the side opposite to the side adjacent to the liquid crystal layer of each transparent substrate. Further, in each transparent substrate, a segment electrode or a common electrode can be formed in order to control the liquid crystal state. The liquid crystal layer is sealed with a sealing material by each transparent substrate. As shown in FIG. 1 , in the touch panel 1 , terminals (not shown) are provided at end portions of the first transparent electrode 3 and the second transparent electrode 4 , and a plurality of pull-out wirings 11 are pulled out from the terminals. . The wiring 11 can be pulled out, and an opaque metal wiring can be formed using an alloy containing the metal such as silver, aluminum, chromium, copper or molybdenum or a Mo-Nb alloy. The pull-out wiring 11 is connected to a control circuit (not shown) that applies a voltage to the first transparent electrode 3 and the second transparent electrode 4 or detects a touch position. In the touch panel 1 having the above configuration, a voltage is applied to the first transparent electrode 3 and the second transparent electrode 4 in a plurality of stages to apply electric charges. When the finger of the conductor touches any part of the operation area, the capacitor is formed by the combination of the fingertip and the electrostatic capacitance between the first transparent electrode 3 and the second transparent electrode 4. Therefore, by capturing the change in the charge at the contact position of the fingertip, it is possible to detect that the finger touches any part. Further, the touch panel 1 may be selectively applied with a voltage by any one of the first transparent electrode 3 and the second transparent electrode 4 by a control circuit (not shown). In this case, an electric field is formed on the transparent electrode applied by the voltage. When the finger touches in this state, the contact position is grounded through the electrostatic capacitance of the human body. As a result, a change in the resistance 値 occurs between the terminal (not shown) of the first transparent electrode 3 or the second transparent electrode 4 of the object and the contact position. The resistance 成 is proportional to the contact position and the distance between the first transparent electrode 3 of the object or the terminal of the second transparent electrode 4, so that the flow contact position is detected by the control circuit, and the first transparent electrode 3 or the object 2 The current 之间 between the terminals of the transparent electrode 4 can be used to find the coordinates of the contact position. In the touch panel 1 of the present invention, the effect of the coating film 5 provided on the first and second transparent electrodes 3 and 4 can suppress the operation region and the transparent electrode pattern, and can also suppress the transparent electrode pattern in the operation region. The conspicuous situation of the type. Next, a method of manufacturing the touch panel 1 of the present invention will be described. 3(a) to 3(d) are cross-sectional views showing the steps of a method of manufacturing the touch panel of the first example of the present invention. First, a transparent substrate 2 such as a glass substrate is prepared. The substrate 2 is cut into a desired shape as needed and washed. Next, a transparent conductive film is formed on one surface of the substrate 2. Further, an intermediate layer such as SiOx, SiNx or SiON may be formed between the substrate 2 and the transparent conductive film. The transparent conductive film, for example, IT0, is formed into a film having a thickness of 10 to 200 nm by a sputtering method or a vacuum evaporation method. Then, the transparent conductive film is etched in a state in which an etching mask made of a photosensitive resin or the like is formed on the upper layer side of the transparent conductive film, and the first transparent electrode 3 and the second transparent electrode 4 are formed in a pattern of -35 to 201245345. . By removing the etching mask, the transparent conductive film substrate 14 on which the transparent electrode pattern is formed as shown in Fig. 3 (a) can be obtained. Here, in the intersection portion 18 of the transparent conductive film substrate 14, the second transparent electrode 4 is connected through the connection portion, but the first transparent electrode 3 is separated. Next, on the side where the first transparent electrode 3 and the second transparent electrode 4 are provided, an interlayer insulating film 19 is formed on the connection portion of the second transparent electrode 4 by the exposure phenomenon after applying the photosensitive resin (FIG. 3(b) )). The photosensitive resin for forming the interlayer insulating film 19 is used for transparency. For example, an acrylic resin or the like can be used. Further, when the interlayer insulating film 19 is formed using SiO 2 , the same structure can be obtained by sputtering using a mask. However, when considering the patterning property, it is preferred to use an acrylic resin. Then, after a transparent conductive film is formed on the interlayer insulating film 19, the transparent conductive film is etched in a state in which an etching mask made of a photosensitive resin is formed on the surface of the transparent conductive film. Thereafter, the etching mask is removed, and the cross-linked electrode 20 is formed on the layer above the interlayer insulating film 19 in such a manner that the separated portions of the first transparent electrode 3 are connected. Thereby, the configuration shown in Fig. 3(c) can be obtained. The transparent conductive film formed on the interlayer insulating film 19 may, for example, be an ITO film. In this case, the crosslinked electrode 20 is formed of ITO. Further, the above-described pull-out wiring 11 is formed by using silver ink or the like in the subsequent step. However, when the transparent conductive film is etched in the above step, the transparent conductive film may remain along the outer periphery of the first transparent electrode 3 and the second transparent electrode 4 to form the drawn wiring 1 1 . Next, on the first transparent electrode 3, the second transparent electrode 4, and the crosslinked electric -36 - 201245345 electrode 20, a coating composition for forming a metal oxide layer is applied by offset printing. Here, the coating composition is obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt), and further adding an anti-precipitation agent. Next, the substrate 2 on which the coating film of the coating composition is formed is dried on, for example, a hot plate at 40 to 150 ° C (e.g., 60 ° C). Thereafter, the metal oxide layer 5 is formed on the first transparent electrode 3, the second transparent electrode 4, and the crosslinked electrode 20 by heating in, for example, an oven at 1 to 130 ° C (for example, 25 ° C). Thereby, the touch panel substrate 30 shown in Fig. 3 (d) can be obtained. Further, the coating film on the substrate 2 may be dried, for example, on a heating plate, and then the coating film may be irradiated with ultraviolet rays and then heated in an oven. The coating film 5 of the present invention thus obtained has a high hardness and high strength by using an inorganic metal oxide as a main component. Further, even if the interlayer insulating film 19 of the organic film is not cracked inside, the terminal (not shown) of the end portions of the first transparent electrode 3 and the second transparent electrode 4 is formed of silver ink or the like. The wiring 11 is formed to form the touch panel 1»the touch panel 1, and the control circuit (not shown) of the touch panel is connected through the pull-out wiring 11. The completed touch panel 1 is attached to the top surface of the display panel 10 via a subsequent layer 9 of an acrylic transparent adhesive or the like. At this time, a correction mark is set at the corner of the substrate 2 or the display panel 10 as needed to perform alignment. By providing the coating film 5 by the touch panel 1 mounted on the display panel 1, high reliability can be achieved. The transparent electrode pattern of the first transparent electrode 3 and the second transparent electrode 4 can be suppressed from being conspicuous in the operation area of the touch panel 1. -37- 201245345 Fig. 4 is a cross-sectional view showing another example of the touch panel of the present invention. As shown in FIG. 4, the touch panel 101 has a transparent 102. A transparent electrode is formed on the operation region of the substrate 102. That is, the first transparent electrode 103 and the second transparent electrode 104 for detecting the positions of the two phases are provided on the upper surface of the substrate 102. The first transparent electrode 103 and the second transparent electrode 104 are transparent electrode materials having high transmittance to visible light and having conductivity. As the transparent electrode material having such conductivity, for example, ZnO or the like can be used. When ITO is used, in order to ensure sufficient conductivity, the thickness of the first transparent electrode 103 and the second transparent electrode 104 may be as large as possible, and the transparent substrate 102 or the protective film 107 to be described later may be selected from sputtering. An air vapor deposition method, an ion plating method, a spray method, a dipping method, or a CVD method is preferably selected. For example, there is a method in which a transparent electrode formed into a planar shape is formed, and a lithography technique is patterned by an etching method; or a coating material having a conductive material composed of the above-mentioned material is dispersed to form a printed image. The method of the desired pattern, etc. The step of forming the transparent electrode is such that the film thickness can be controlled with high precision. Therefore, at the time of formation, it is preferable to select a film having a desired thickness and to form a low-resistance film having excellent transparency: As shown in Fig. 4, the first transparent electrode 103 is disposed on the substrate. On the first transparent electrode 103, 105 of the present invention is formed. In the formation of the coating film 105, the above-described composition of the present invention is used. The coating film 〇 5 is coated on a substrate type corresponding to a touch surface. In the opposite direction, at least the formed ITO or the preferred amount of the underlayer method, the true method, etc., can be directly brushed by a solvent, preferably a practical method. A portion of the first transparent electrode 103 formed in a portion of the operation region of the coating film of the coating film 101 - 38 - 201245345 of 102 is formed and a non-formed region. On the coating film 105, a protective film layer 1〇7 is provided. The protective film layer 107 is a film composed of an organic material formed of an acrylic resin having high transparency. As shown in Fig. 4, the second transparent electrode 104 is disposed on the protective film layer 107. The coating film 106 of the present invention is formed on the second transparent electrode 104. In the formation of the coating film 106, the above-described coating composition of the present invention is used. The coating film 106 is coated on a region where the transparent electrode is formed in a portion corresponding to the operation region of the touch panel 110 and a region where the film is not formed. The coating films 105 and 106 have high hardness and are excellent in adhesion to the first transparent electrode 103 and the second transparent electrode 104. On the other hand, the coating film 106 of the present invention contains an inorganic metal oxide as a main component, but no crack is generated on the protective film layer 107. In other words, even when the coating film 106 is formed to cover the protective film layer 107 of the film made of an organic material, the coating film 106 is not cracked inside. In the touch panel 1 〇 1, the refractive indices and film thicknesses of the coating films 105 and 106 can be selected so that the respective transparent electrode patterns of the first transparent electrode 103 and the second transparent electrode 104 are not conspicuous. Specifically, the refractive indices of the coating films 105 and 106 are preferably in the range of more than 1.50 and 1.70 or less, and the film thickness is preferably in the range of 40 nm to 170 nm. When the refractive index of the coating films 105, 106 is more than 1.50 and less than 1.60, the film thickness is preferably in the range of 60 nm to 150 nm. Further, when the refractive indices of the coating films 105 and 106 are in the range of 1.60 or more and 1.70 or less, the film thickness is preferably in the range of from 40 nm to 170 nm in the range of -39 to 201245345. In the touch panel 101, for example, the first transparent electrode 103 and the second transparent electrode 104 are each made of ITO having a film thickness of 28 nm. In this case, the coating films 205 and 106 are each formed by the coating composition of the present invention containing a decane oxide and a titanium alkoxide, and have a refractive index of 1.5. 2. The film thickness is 100 nm. . As shown in Fig. 4, on the coating film 106, an adhesive layer 1〇8 composed of an acrylic transparent adhesive is provided. The touch panel 101 is attached to the display panel 110 through the adhesive layer 108. In the touch panel 101 having the above configuration, when the finger of the conductor touches any part of the operation region, the capacitor is formed by the fingertip and the electrostatic capacitance between the first transparent electrode 103 and the second transparent electrode 104. . Therefore, by capturing the change in the charge at the contact position of the fingertip, it is possible to detect that the finger touches any part. The touch panel 101 can achieve high reliability by the coating films 105 and 106' provided on the first transparent electrode 103 and the second transparent electrode 104. It also suppresses the conspicuous situation of the transparent electrode pattern in the operation area. Fig. 5 and Fig. 6 are views showing the construction of another example of the touch panel of the present invention. Fig. 5 is a plan view showing a configuration of still another example of the touch panel of the present invention. Figure 6 is a cross-sectional view taken along line B1 - B1' of Figure 5. As shown in FIG. 5, the touch panel 201' is formed using a transparent substrate 202, and a transparent electrode pattern is formed in an operation region of the substrate 202. That is, the first transparent electrode 203 having a coordinate formed on one surface of the substrate 202 for detecting the X direction and the second transparent surface 203 formed on the other surface of the substrate 202 for detecting the Y direction of the -40-201245345 Electrode 204. Further, in the following description, the one surface of the substrate 202 is above and the other surface of the substrate 202 is below. In this case, the other surface of the substrate 202 is mounted on the side of the display panel 210 side. The substrate 202 is a dielectric substrate. The material of the substrate 202 is glass, acrylic resin, polyester resin, polyethylene terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, polymethyl methacrylate resin, polyethylene naphthalate A transparent material such as a diester resin or a polyethylene glycol resin. In particular, it is preferred to select the coating film 205, 206 of the present invention to form a material having heat resistance and chemical resistance. The thickness ” of the substrate 202 may be 0.1 mm to 2 mm for the glass and ΙΟμιη to 2000 μπι for the resin film. As shown in FIG. 5, each of the first transparent electrode 203 and the second transparent electrode 204 is formed of an elongated rectangular shape. The first transparent electrode 2 〇 3 extends in the Υ direction, and the second transparent electrode 204 extends in the X direction, and is linearly arranged at regular intervals. Further, the first transparent electrode 203 and the second transparent electrode 204 are arranged to be orthogonal to each other and have a lattice shape as a whole. The first transparent electrode 203 and the second transparent electrode 204 are formed of a transparent electrode material having a high transmittance to visible light and having conductivity. As the transparent electrode material having such conductivity, for example, ruthenium or ruthenium or the like can be used. When ruthenium is used, in order to secure sufficient conductivity, the thickness is preferably from 10 nm to 200 nm. The first transparent electrode 203 and the second transparent electrode 204 can be considered as a transparent substrate 2 〇 2 ′ from the sputtering method, vacuum evaporation method, ion plating method -41 - 201245345, spray method, dipping method or CVD method. The method of selecting the best method, for example, is a method in which a transparent electrode formed into a planar shape is patterned by etching using a photolithography technique, or a method of dispersing the above material in an organic solvent. A coating material such as a conductive material, a method of directly forming a desired pattern by a printing method, or the like. The step of forming the transparent electrode is important to accurately control the film thickness. Therefore, at the time of formation, it is preferred to select a film which can achieve a desired film thickness and which can form a film having low resistance and excellent in transparency. As shown in FIG. 5 and FIG. 6, a coating film 205»coated film 205 is formed on the first transparent electrode 203, and is coated on a portion of the transparent electrode corresponding to the operation region of the touch panel 201. And non-formed areas. Further, as shown in FIG. 6, a coating film 206 is also formed on the second transparent electrode 204 (the lower side in the drawing). The coating film 206 is coated with a region where the transparent electrode is formed and a region where it is not formed, which is a portion corresponding to the operation region of the touch panel 201. The coating films 205 and 206 have high hardness and are excellent in adhesion to the first transparent electrode 203 and the second transparent electrode 204. The coating films 205 and 206 are formed by using the above-described coating composition of the present invention obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of an aluminum salt, and further adding an anti-precipitation agent. In the touch panel 201, the refractive index and film thickness of the coating films 205 and 206 can be selected so that the respective transparent electrode patterns of the first transparent electrode 203 and the second transparent electrode 1024 are not conspicuous. Specifically, the refractive indices of the coating films 205 and 260 are preferably in the range of more than 1.50 and 1.70, respectively, and the film thickness is preferably in the range of 40 nm to 17 Å. When the refractive index of the films 205 and 206 coated with -42 to 201245345 is more than 1.50 and less than 1.60, the film thickness is preferably in the range of 60 nm to 150 nm. Further, when the refractive indices of the coating films 205 and 206 are in the range of 1.60 or more and 1.70 or less, the film thickness is preferably in the range of 40 nm to 170 nm. In the touch panel 201, for example, the first transparent electrode 203 and the second transparent electrode 204 are each made of ITO having a film thickness of 28 nm. In this case, the coating films 205 and 206 were each formed by using a coating composition prepared by using a decane oxide and a titanium alkoxide, and had a refractive index of 1.52 and a film thickness of 100 nm. As shown in Fig. 6, an adhesive layer 208 made of an acrylic transparent adhesive is provided on one surface of the substrate 02. Further, on the adhesive layer 208, a protective film 207 made of a transparent resin is next used. Further, in Fig. 5, the protective film 207 is omitted. The protective film 207 has a function as a protective film of the first transparent electrode 203 and the coating film 205. Further, a transparent resin may be applied instead of the protective film 207. In this case, the layer 208 may not be attached. On the other surface of the substrate 202, a display panel 110 is mounted on the adhesive layer 209 formed of an acrylic transparent adhesive. Although the details are omitted in Fig. 6, the display panel 210 can be constructed in the same manner as the known display device. For example, in the case of a liquid crystal display device, the display panel 210 can be constructed to sandwich a liquid crystal layer between two transparent substrates. A polarizing plate may be separately provided on the side opposite to the side adjacent to the liquid crystal layer of each transparent substrate. Further, in each transparent substrate, a segment electrode or a common electrode can be formed in order to control the liquid crystal state. The liquid crystal layer is sealed with each transparent substrate and sealing material -43- 201245345. In the touch panel 201, a plurality of terminals (not shown) are provided at the end portions of the first transparent electrode 203 poles 208, and a plurality of pull-out wirings are provided. The wiring is pulled out, and the opaque metal wiring system using silver or the like is connected to the control circuit (not shown) for detecting the first transparent electrode 203 and the second transparent voltage or detecting the touch position. When the touch panel 201 is electrically conductive to any part of the operation area, the touch panel 201 has an electrostatic capacitance between the fingertip and the negative 203 and the second transparent electrode 204. Therefore, it is detected that the finger touches any part by capturing the electric charge of the contact position of the fingertip. In the touch panel 20 1, the transparent electrode pattern in the effect region of the coating film 205, 206 is provided on the first transparent electrode. As described above, in another aspect of the touch panel of the present embodiment, the coating film of the coating film of the present invention is not provided on the organic film composed of the interlayer insulating film or the protective film layer or the like. The example of the panel also has the function of the protective film of the electrode. And prevent the shape of the transparent electrode. The touch panel of the present invention has been described above, but the above embodiment. For a transparent electrode touch panel using ITO or the like, as a protective film on the transparent electrode, and a second transparent electric power, the wiring is pulled by the terminal, the chrome, the copper cymbal, and the electric pole is applied to the pole 2 04. When the finger touches the I 1 transparent electrode to form a change in capacitance, the 203 and the second pass can suppress the operation of other examples, and the structure of the acrylic tree. The present invention has an effective high-strength pattern. The invention is not limited to a plurality of types. The coating film of the present invention -44-201245345 can be used. And achieve high reliability. Further, it is also possible to suppress the conspicuous condition of the transparent electrode. In this case, even if the coating film of the present invention is formed on various organic films provided in the touch panel, cracks or the like are not generated inside. EXAMPLES Hereinafter, the present invention will be described in more detail based on examples, but The invention is not limited to the ones. [Simplified Symbols Used in the Embodiments] The meanings of the abbreviations used in the following examples and the like are as follows. TEOS: Tetraethoxy decane C18: octadecyl triethoxy decane MPS: r - mercaptopropyl trimethoxy decane GPS: glycidyl ether propyl trimethoxy decane UPS: gamma - ureido propyl triethoxy decane APS: r - Aminopropyltriethoxy decane acps: r - Acryloxypropyltrimethoxy decane MPMS: r - methacryloxypropyltrimethoxy decane MTES: methyltriethoxy decane TIPT: Titanium tetraisopropoxide AN: Aluminum nitrate nonahydrate EG: ethylene glycol HG : 2-methyl-2,4-pentanediol (other name: hexanediol) -45- 201245345 BCS : 2-butoxyethanol (Other name: butyl races) IPA: 2 - propyl &lt;Synthesis Example 1 &gt; (Synthesis of Coating Composition K1) To a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.6 g, HG 38.8 g, BCS 36.8 g, TEOS 21.7 g, and GPS 10.6 g were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain an A1 solution. To a 300 mL-capacity flask, 4.7 g of TIPT as a titanium alkoxide was added, and 58.2 g of HG was added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain an A2 solution. Next, the above A1 liquid and A2 liquid were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating composition K1 was obtained. &lt;Synthesis Example 2 &gt; (Synthesis of Coating Composition K2) To a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.7 g, HG 39.2 g, BCS 37.3 g, TEOS 21.7 g, and MPS 8.8 g were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain a B1 solution. To a flask of 3,000 mL capacity, 4.7 g of TIPT as a titanium alkoxide was added, and 58.9 g of HG was added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain a B2 solution. Next, the above B 1 liquid and B 2 liquid were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating composition K2 was obtained. -46 - 201245345 &lt;Synthesis Example 3 &gt; (Synthesis of Coating Composition K3) To a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.6 g, HG 38.8 g, BCS 36.9 g, TEOS 21.7 g, and ACPS 10.5 g were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain a Cl solution. In a flask of 3,000 mL capacity, 4.7 g of TIPT as a titanium alkoxide was added, and 58.2 g of HG was added thereto, and stirred at room temperature for 30 minutes to obtain a C2 solution. Next, the above C1 liquid and C2 liquid were mixed. Stir at room temperature for 3 〇 minutes. Thereby, the coating composition K3 was obtained. &lt;Synthesis Example 4 &gt; (Synthesis of Coating Composition K4) To a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.5g, HG 38.6g, BCS 36.7g, TEOS 21.7g, MPMS ll.lg were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain a D1 solution. To a flask of 300 mL capacity, 4.7 g of TIPT as a titanium alkoxide was added, and 57.9 g of HG was added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain a D2 solution. Next, the above D1 liquid and D2 liquid were mixed and stirred at room temperature for 30 minutes. Thereby, the coating composition K4 was obtained. &lt;Synthesis Example 5 &gt; (Synthesis of Coating Composition K5) -47- 201245345 To a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.9 g, HG 39.7 g, BCS 37.7 g, TEOS 15_5 g, and MTES 13.3 g were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain an E 1 solution. In a 300 mL flask, TIPT 4.7 g and HG 59.5 g were added, and the mixture was stirred at room temperature for 30 minutes to obtain an E2 solution. Next, the above E1 liquid and E2 liquid were mixed, and stirred at room temperature for 3 minutes. Thereby, the coating composition K5 was obtained. &lt;Synthesis Example 6 &gt; (Synthesis of Coating Composition K6) To a 200 mL flask, 12.7 g of AN and 3.0 g of water were added to stir, and AN was dissolved. EG 13.4g, HG 38.3g, BCS 36.4g, TEOS 21.7g, MPMS 9.3g, C18 3.1g were added thereto, and stirred at room temperature for 3 minutes to obtain an F1 solution. To a flask of 300 mL capacity, 4.7 g of TIPT and 57.4 g of HG were added, and the mixture was stirred at room temperature for 30 minutes to obtain an F2 solution. Next, the above F1 liquid and F2 liquid were mixed, and stirred at room temperature for 3 minutes. Thereby, the coating composition K6 was obtained. &lt;Synthesis Example 7 &gt; (Synthesis of Coating Composition K7) To a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.5 g, HG 38.6 g, BCS 36.7 g, TEOS 15.5 g, APS 1.7 g, ACPS 6.7 g, GPS 8.8 g were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain a G1 solution. -48- 201245345 TIPT 4.7g and HG 57.9g were added to a 3000 mL flask, and stirred at room temperature for 30 minutes to obtain a G2 solution. Next, the above G1 liquid and G2 liquid were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating composition K7 was obtained. &lt;Synthesis Example 8 &gt; (Synthesis of Coating Composition K8) To a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. Add EG 13.5g, HG 38.5g, BCS 36.6g, TEOS 15.5g, MPS 1.5g, ACPS 10.5g, UPS 5.9g, and stir at room temperature for 30 minutes to obtain H1 liquid in 30 0mL capacity. TIPT 4.7g and HG 57.7g were added to the flask, and the mixture was stirred at room temperature for 30 minutes to obtain an H2 solution. Next, the above-mentioned hydrazine 1 and H 2 liquid were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating composition Κ8 was obtained. &lt;Synthesis Example 9 &gt; (Synthesis of Coating Composition Κ9) In a 200 mL flask, 13.1 g of AN and 3.1 g of water were added and the AN was dissolved. EG 13.3 g, HG 95.2 g, BCS 36.2 g, TEOS 16.3 g, and MPMS 22.8 g were added thereto, and the mixture was stirred at room temperature for 30 minutes. Thereby, the coating composition K9 was obtained. &lt;Synthesis Example 1 〇 &gt; (Synthesis of Coating Composition Κ 10) In a 200 mL flask, AN 12.1 g and 2.8 g of water were added and stirred to dissolve AN. EG 13.5 g, HG 56.7 g, BCS 36.8 g, -49-201245345 TEOS 13.7 g, and MPMS 10.9 g were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain a U solution. TIPT 13.4g and HG 40.1g were added to a 300 mL capacity flask, and the mixture was stirred at room temperature for 30 minutes to obtain 12 liquids. Next, the above liquid II and 12 liquid were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating composition K10 was obtained. &lt;Synthesis Example 11&gt; (Synthesis of Coating Composition K11) To a 200 mL flask, 11.8 g of AN and 2.8 g of water were added to stir, and AN was dissolved. EG 13.6 g, HG 44.8 g, BCS 36.8 g, TEOS 10.5 g, and MPMS 10.3 g were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain a mash. In a 300 mL flask, TIPT 17.4 g and HG 52.1 g were added, and the mixture was stirred at room temperature for 30 minutes to obtain a J2 solution. Then, the above J1 liquid and J2 liquid were mixed and stirred at room temperature for 3 minutes. Thereby, the coating composition K 1 1 was obtained. &lt;Synthesis Example 12&gt; (Synthesis of Coating Composition K12) To a 200 mL flask, 11.5 g of AN and 2.7 g of water were added to stir, and AN was dissolved. EG 13.6 g, HG 33.5 g, BCS 36.9 g, TEOS 7_2 g, and MPMS 10.0 g were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain an L1 solution. TIPT 21.2g and HG 63.6g were added to a 300 mL capacity flask, and it stirred for 30 minutes at room temperature, and L2 liquid was obtained. -50- 201245345 Next, the above L1 liquid and L2 liquid were mixed and stirred at room temperature for 30 minutes. Thereby, the coating composition K12 was obtained. &lt;Synthesis Example 1 3 &gt; (Synthesis of Coating Composition K 1 3) To a 200 mL flask, 12.7 g of AN and 3.0 g of water were added and stirred to dissolve AN. EG 13.7g, HG 39.1g' BCS 37.1g, TEOS 31.lg were added thereto, and stirred at room temperature for 30 minutes to obtain a Ml solution in a 300 mL volume flask, and TIPT 4-7 g and HG 58.6 g were added. Stir at room temperature for 30 minutes to obtain M2 solution. Next, the above hydrazine 1 and M2 liquid were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating composition Κ13 was obtained. In the coating composition Κ13, a metal alkoxide having no structure represented by the above formula (II) was added. <Synthesis Example 14> (Synthesis of coating composition Κ14) AN 12.7 g and water were placed in a 200 mL flask. Stir at 3.0 g to dissolve the AN. EG 13.7 g, HG 39.2 g, BCS 37.3 g, TEOS 2 8.0 g, and MTES 2.7 g were added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain an N1 solution. TIPT 4.7g and HG 58.8g were added to a 3000 mL-volume flask, and it stirred at room temperature for 30 minutes, and the N2 liquid was obtained. Next, the above N1 liquid and N2 liquid were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating composition Κ 14 was obtained. The coating composition Κ 1 3 contains only a small amount of the metal alkane of the above formula (Π )-51 - 201245345 as compared with the coating compositions K1 to K12 of the above Synthesis Examples 1 to 12. Oxide &lt;Synthesis Example 1 5 &gt; (Synthesis of Coating Composition Κ 15) 12.7 g of AN and 3.0 g of water were added to a 200 mL flask to dissolve AN. IPA 145.6 g, TEOS 15.5 g, 18.5 g, TIPT 4.7 g were added thereto, and the mixture was stirred at room temperature for 30 minutes. By coating the composition Κ 15 . &lt;Evaluation of Stability&gt; The coating compositions obtained in the above synthesis examples were evaluated for stability by using the coating members ～K12 and K15 as Examples 1 to 12 and 15 respectively. The evaluation method of the stability was carried out by using a synthetic coating composition K12, K15), and subjecting it to a filter having a pore size of 0.5 μm under pressure and filtration for 1 week. Next, after the film formation by the spin coating method on the tantalum substrate, no foreign matter was observed on the coating film on the tantalum substrate. The foreign matter was evaluated as X. The above evaluation results are shown in Table 1. Mix, make MPMS, and make the K1 comparative example (K1~, in room (100) is 〇, -52- 201245345 [Table 1]

實施例 塗佈組成物 安定性評價 實施例1 Κ1 〇 實施例2 Κ2 〇 實施例3 Κ3 〇 實施例4 Κ4 〇 實施例5 Κ5 〇 實施例6 Κ6 〇 實施例7 Κ7 〇 實施例8 Κ8 〇 實施例9 Κ9 〇 實施例10 Κ1 0 〇 實施例11 Κ1 1 〇 實施例12 Κ 1 2 〇 比較例1 Κ1 5 X &lt;塗佈膜之成膜方法I&gt; 使用上述合成例所得之塗佈組成物，以孔徑0.5 μ m之 膜濾器加壓過濾，以旋塗法於基板上形成塗膜。將該基板 以設定爲60 °C之加熱板上加熱3分鐘使其乾燥。接著，使 用紫外線照射裝置（Eye Graphics公司製 UB 011-3A型 )’使用局壓水銀燈（輸入電源1000W)以50mW/cm2 (波長3 6 5 nm )之光強度照射紫外線2分鐘。紫外線照射 量爲6 0 0 0 m J / c m2。紫外線照射後，移至設定爲2 5 0 °C之 熱風循環式烘箱內，進行燒成30分鐘。如此，於基板上 成膜爲塗佈膜。 &lt;塗佈膜之成膜方法II &gt; 使用上述合成例所得之塗佈組成物，以孔徑0.5 μηι之 -53- 201245345 膜濾器加壓過濾，以旋塗法於基板上形成塗膜。將 以設定爲60 °C之加熱板上加熱3分鐘使其乾燥。接 至設定爲250 °C之熱風循環式烘箱內，進行燒成30 如此，於基板上成膜爲塗佈膜。 以上，係說明使用本實施例之塗佈組成物成膜 例之塗佈膜的方法。接著，說明本發明之塗佈膜之 此時，將使用上述合成例所得之塗佈組成物K1〜 適當之基板上，以上述成膜方法I所成膜之塗佈醇 〜KL8)作爲本發明之塗佈膜之實施例13〜實施例 將使用上述合成例所得之塗佈組成物K9〜K12，於 基板上，以上述成膜方法II所成膜之塗佈膜（KL9 )作爲本發明之塗佈膜之實施例21〜實施例24» 使用上述合成例所得之塗佈組成物K13，於適當之 ，以上述成膜方法II所成膜之塗佈膜（KM2 )作爲 之比較例2。 &lt;折射率之評價&gt; 基板係使用矽基板（100)。如上述，於矽基 形成以成膜方法I所成膜之實施例13〜實施例20 膜、以成膜方法Π所成膜之實施例21〜24之塗佈 成膜方法所成膜之比較例2及比較例3之塗佈膜， 射率之評價。評價方法，係藉由下述方式進行：使 偏光計（ellipsometer )(溝尻光學工業所製， FLVW )，測定波長633nm下之折射率。 該基板 著，移 分鐘。 本實施 評價。 K8，於 I ( KL1 20。而 適當之 〜KL12 又，將 基板上 塗佈膜 板上， 之塗佈 膜、以 進行折 用橢圓 DVA - -54- 201245345 將各塗佈膜之評價結果、與於各塗佈膜所使用之塗佈 組成物，一同示於下記之表2。 &lt;裂痕評價&gt; 於玻璃基板上，形成膜厚2 μχη之丙烯酸膜。丙烯酸膜 之形成，係以如下方式進行。首先，將丙烯酸材料組成物 ，以孔徑〇·5 μιη之膜濾器加壓過濾，以旋塗法於玻璃基板 整面上形成塗膜。接著，將該基板於加熱板上加熱乾燥2 分鐘後，移至熱風循環式烘箱內，進行燒成30分鐘。藉 此，於玻璃基板上形成丙烯酸膜。 於上述之丙烯酸膜上，以成膜方法I或成膜方法II， 以膜厚10〇nm之厚度形成塗佈膜。 接著，於形成有丙烯酸膜之玻璃基板上，形成以成膜 方法I所成膜之實施例13〜實施例20之塗佈膜、以成膜 方法Π所成膜之實施例21〜24之塗佈膜、以成膜方法II 所成膜之比較例2之塗佈膜，進行塗佈膜之裂痕評價。 關於裂痕評價之評價基準，於基板上之塗佈膜中，將 未產生裂痕者評價爲◎、於面內未產生僅於邊緣產生裂痕 者評價爲〇、於整面產生裂痕者評價爲X。 評價之結果，與比較例2之塗佈膜相比，可知實施例 13〜實施例24之塗佈膜，可見裂痕之產生的改善。 -55- 201245345 [表2]EXAMPLES Coating Composition Stability Evaluation Example 1 Κ1 〇Example 2 Κ2 〇Example 3 Κ3 〇Example 4 Κ4 〇Example 5 Κ5 〇Example 6 Κ6 〇Example 7 Κ7 〇Example 8 Κ8 〇Implementation Example 9 Κ9 〇 Example 10 Κ1 0 〇 Example 11 Κ1 1 〇 Example 12 Κ 1 2 〇 Comparative Example 1 Κ1 5 X &lt; Film formation method of coating film I&gt; Coating composition obtained by the above synthesis example The film was filtered under pressure with a membrane filter having a pore size of 0.5 μm to form a coating film on the substrate by spin coating. The substrate was dried by heating on a hot plate set at 60 ° C for 3 minutes. Subsequently, ultraviolet rays were irradiated for 2 minutes at a light intensity of 50 mW/cm2 (wavelength of 365 nm) using a ultraviolet irradiation apparatus (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) using a local pressure mercury lamp (input power supply 1000 W). The amount of ultraviolet radiation is 6,000 m J / c m2. After the ultraviolet irradiation, the mixture was transferred to a hot air circulating oven set at 250 ° C and baked for 30 minutes. Thus, a film is formed on the substrate as a coating film. &lt;Method of Film Formation of Coating Film II&gt; Using the coating composition obtained in the above Synthesis Example, the film was filtered under pressure with a membrane filter having a pore diameter of 0.5 μηι -53 - 201245345 to form a coating film on the substrate by spin coating. It was dried by heating on a hot plate set at 60 °C for 3 minutes. The firing was carried out in a hot air circulating oven set at 250 ° C, and a film was formed on the substrate as a coating film. The method of using the coating film of the coating composition of the present embodiment is described above. Next, the coating film of the present invention will be described as the present invention by using the coating composition K1 to the appropriate substrate obtained in the above Synthesis Example, and the coating alcohol to KL8 formed by the film formation method I described above. Example 13 to Example of Coating Film Using the coating compositions K9 to K12 obtained in the above Synthesis Example, the coating film (KL9) formed by the film formation method II described above was used as the present invention. Example 21 to Example 24 of the coating film The coating composition K13 obtained by the above-mentioned synthesis example was used, and the coating film (KM2) formed by the above-mentioned film formation method II was used as Comparative Example 2 as appropriate. &lt;Evaluation of Refractive Index&gt; A substrate (100) was used as the substrate. As described above, a film formation method of the film formation methods of Examples 13 to 24 formed by the film formation method I and the film formation methods of the film formation method of the film formation method 21 to 24 were formed as described above. The coating films of Example 2 and Comparative Example 3 were evaluated for the incident rate. The evaluation method was carried out by measuring the refractive index at a wavelength of 633 nm by using an ellipsometer (FLVW manufactured by Gully Optical Industries Co., Ltd.). The substrate is moved and moved in minutes. This evaluation was carried out. K8, in I (KL1 20), and appropriate KL12, the coating film on the substrate is coated on the substrate, and the evaluation results of each coating film are obtained by folding the elliptical DVA--54-201245345. The coating composition used for each coating film is shown together in Table 2 below. <Rift Evaluation> An acrylic film having a thickness of 2 μχ was formed on a glass substrate. The acrylic film was formed as follows. First, the acrylic material composition was filtered under pressure with a membrane filter having a pore size of 5 μm, and a coating film was formed on the entire surface of the glass substrate by spin coating. Then, the substrate was dried by heating on a hot plate for 2 minutes. Thereafter, the mixture was transferred to a hot air circulation type oven and baked for 30 minutes. Thereby, an acrylic film was formed on the glass substrate. On the above acrylic film, film formation method I or film formation method II was used, and the film thickness was 10 〇. A coating film is formed to have a thickness of nm. Next, on the glass substrate on which the acrylic film is formed, the coating films of Examples 13 to 20 formed by the film formation method I are formed, and the film is formed by a film formation method. Coating films of Examples 21 to 24, In the coating film of Comparative Example 2 formed by the film formation method II, the crack of the coating film was evaluated. Regarding the evaluation criteria of the crack evaluation, in the coating film on the substrate, the crack was not evaluated as ◎, In the case where no crack occurred in the surface, the crack was evaluated as 〇, and the crack occurred on the entire surface, and it was evaluated as X. As a result of the evaluation, it was found that the coating of Examples 13 to 24 was compared with the coating film of Comparative Example 2. Membrane, visible improvement in cracks. -55- 201245345 [Table 2]

實施例 塗佈膜 塗佈組成物 成膜法 折射率評價 裂痕評價 實施例13 KL 1 K 1 1 1.5 1 〇 實施例14 KL 2 K2 1 1.5 1 ◎ 實施例15 KL 3 K3 I 1.5 2 ◎ 實施例16 KL4 K4 I 1.5 2 ◎ 實施例17 KL 5 K5 I 1.48 〇 實施例18 KL6 K6 I 1.5 2 ◎ 實施例19 KL 7 K7 I 1.5 2 ◎ 實施例20 KL8 K8 I 1.5 2 ◎ 實施例21 KL 9 K9 II 1.4 9 ◎ 實施例22 KL 1 0 K1 0 II 1.5 5 〇 實施例23 KL 1 1 K1 1 II 1.6 0 〇 苡施例24 KL 1 2 K 1 2 II 1.6 5 〇 比較例2 KM2 K1 3 II 1.50 X &lt;透明導電膜基板&gt; 準備於基板上成膜有圖型化之透明導電膜的透明導電 膜基板。基板係使用玻璃基板，透明導電膜係使用ITO。 該透明導電膜基板，可使用於上述本發明之觸控面板1所 使用之透明導電膜基板14。此處，ITO之膜厚爲2 8nm。 &lt;觸控面板之製作&gt; 製作於ITO膜厚爲28nm之上述之透明導電膜基板上 ，以ΙΟΟηπι之膜厚將實施例20之塗佈膜KL8成膜之基板 。於該基板上塗佈光學接著劑，將〇.7mm之空白玻璃（ blank glass )貼合。接著，使用紫外線照射裝置（Eye Graphics公司製 UB 01 1-3A型），使用高壓水銀燈（輸 入電源1 000W )，以50mW/cm2 (換算波長3 65nm )之光 -56- 201245345 強度照射紫外線80秒鐘。藉此，使光學接著劑硬化， 作成作爲特性評價用之觸控面板之實施例25之觸控面 〇 接著，使用實施例22之塗佈膜KL10取代實施例 之塗佈膜KL8作爲塗佈膜，除此之外，藉由與上述同樣 製作方法，製作實施例26之觸控面板。又，使用實施 23之塗佈膜KL11取代實施例20之塗佈膜KL8作爲塗 膜’除此之外，藉由與上述同樣之製作方法，製作實施 27之觸控面板。又，使用實施例24之塗佈膜KL12取 實施例20之塗佈膜KL8作爲塗佈膜，除此之外，藉由 上述同樣之製作方法，製作實施例28之觸控面板。 再者，於上述透明導電膜基板上，使用塗佈組成 K12，以上述成膜方法I將塗佈膜成膜，除此之外，與 述實施例2 5之情形同樣地，製作實施例2 9之觸控面板 又，對於使用塗佈組成物K 1 2以成膜方法I所成膜之塗 膜，以與上述同樣之評價方法所測定之折射率，爲1 .7 0 而於比較評價用，使用比較例2之塗佈膜KM2取 實施例20之塗佈膜KL8作爲塗佈膜，除此之外，藉由 上述同樣之製作方法，製作比較例3之觸控面板。又， 用上述之透明導電膜基板，未成膜爲塗佈膜，除此之外 藉由與上述同樣之製作方法，製作比較例4之觸控面板 因此，比較例4之評價用之觸控面板，於透明電極上未 成塗佈膜。 製 板 20 之 例 佈 例 代 與 物 上 〇 佈 0 代 與 使 0 形 -57- 201245345 &lt;可見電極圖型之評價&gt; 使用實施例25〜實施例29及比較例3、4之評價用之 觸控面板，評價ITO之電極圖型是否顯眼，進行可見電極 圖型之評價。 評價方法，係將各觸控面板放置於黑布上，以由上部 照亮的狀態，以目視進行觀察。而於確認比較例4之觸控 面板中，可見透明電極圖型之下，觀察其他觸控面板。該 等觀察的結果，將未見透明電極圖型者評價爲◎。而雖可 見透明電極圖型，但其程度與不具塗佈膜之比較例4之觸 控面板相比係經改善者評價爲〇、與比較例4之觸控面板 相比未經改善者評價爲X。 對於實施例25〜實施例29及比較例3、4之評價用之 觸控面板，可見整理電極圖型之評價結果示於表3。 [表3] 被膜 折射率 可見電極圖型 實施例25 KL8 1.5 2 〇 實施例26 KL 1 0 1. 5 5 ◎ 實施例27 KL 1 1 1. 6 0 ◎ 實施例28 KL 1 2 1. 6 5 ◎ 實施例29 KL 1 3 1. 70 〇 比較例3 KM2 1. 50 X 比較例4 ，一 一 — 由以上之評價結果、表1可知，藉由使塗佈組成物含 有金屬硝酸鹽及抗析出劑，可提升安定性。 由表2可知，藉由適當地控制塗佈組成物所含之金屬 -58- 201245345 烷氧化物之構造與組成，由其所形成之塗佈膜，即使於丙 烯酸樹脂等所構成之有機薄膜上，亦能形成不會產生裂痕 、安定之膜。 由表3可知，藉由於電極上形成折射率經適當控制之 塗佈膜，可抑制於觸控面板之可見電極圖型。 本實施例之塗佈膜，皆顯示5 Η以上之硬度，其與一 般之有機材料之未滿3Η相比，爲顯著高之硬度。 本發明之塗佈組成物，可提供折射率經控制之高強度 之塗佈膜，使用該塗佈膜之觸控面板，電極之圖型不會顯 眼。因此，有用於要求優異外觀與高可靠性之顯示元件用 之觸控面板。 又，於此引用2011年1月20日所申請之日本專利申 請20 1 1 -0 1 0 1 64號之說明書、專利申請範圍、圖示、及發 明摘要的全部內容，納入作爲本發明之說明書之揭示。 【圖式簡單說明】 圖1，係模式顯示本發明之觸控面板之構造之俯視圖 〇 圖2，係沿圖1之Al— Α1’之截面圖。 圖3(a)〜（d)，係顯示本發明之觸控面板之製造 方法之步驟截面圖。 圖4,係顯示本發明之觸控面板之另一例之槪略構成 之俯視圖。 圖5,係模式顯示本發明之觸控面板之再另一例之構 -59- 201245345 造之俯視圖。 圖6，係沿圖5之B1—B1’之截面圖。 【主要元件符號說明】 1、101、201:觸控面板 2 、 102、 202 ：基板 3、 103、203:第1透明電極 4、 104、204:第2透明電極 5、 6、 105' 106、 205、 206 ：塗佈膜 9、 108、208、209 ：接著層 10、 110、210:顯示面板 1 1 :拉出配線 1 4 :透明導電膜基板 1 8 :交叉部 1 9 :層間絕緣膜 2 0 :交聯電極 21 :墊片部 107 :保護膜層 207 :保護膜 -60-EXAMPLES Coating film coating composition film formation method refractive index evaluation crack evaluation Example 13 KL 1 K 1 1 1.5 1 〇 Example 14 KL 2 K2 1 1.5 1 ◎ Example 15 KL 3 K3 I 1.5 2 ◎ Example 16 KL4 K4 I 1.5 2 ◎ Example 17 KL 5 K5 I 1.48 〇 Example 18 KL6 K6 I 1.5 2 ◎ Example 19 KL 7 K7 I 1.5 2 ◎ Example 20 KL8 K8 I 1.5 2 ◎ Example 21 KL 9 K9 II 1.4 9 ◎ Example 22 KL 1 0 K1 0 II 1.5 5 〇 Example 23 KL 1 1 K1 1 II 1.6 0 〇苡 Example 24 KL 1 2 K 1 2 II 1.6 5 〇 Comparative Example 2 KM2 K1 3 II 1.50 X &lt;Transparent Conductive Film Substrate&gt; A transparent conductive film substrate on which a patterned transparent conductive film is formed on a substrate. A glass substrate is used for the substrate, and ITO is used for the transparent conductive film. The transparent conductive film substrate can be used for the transparent conductive film substrate 14 used in the touch panel 1 of the present invention described above. Here, the film thickness of ITO was 28 nm. &lt;Production of Touch Panel&gt; A substrate on which a coating film KL8 of Example 20 was formed on a transparent conductive film substrate having an ITO film thickness of 28 nm was formed on a film thickness of ITO. An optical adhesive was applied to the substrate, and a blank glass of 7.7 mm was bonded. Next, using an ultraviolet irradiation device (UB 01 1-3A type manufactured by Eye Graphics Co., Ltd.), a high-pressure mercury lamp (input power supply of 1 000 W) was used, and ultraviolet rays were irradiated for 80 seconds at a light intensity of 50 mW/cm 2 (converted wavelength of 3 65 nm) -56-201245345. bell. Thereby, the optical adhesive was cured to form a touch surface of Example 25 as a touch panel for evaluation of characteristics. Next, the coating film KL10 of Example 22 was used instead of the coating film KL8 of the example as a coating film. Except for this, the touch panel of Example 26 was produced by the same manufacturing method as described above. Further, a touch panel of the embodiment 27 was produced by the same production method as described above except that the coating film KL11 of the embodiment 23 was used instead of the coating film KL8 of the example 20 as the coating film. Further, the touch panel of Example 28 was produced by the same production method as described above except that the coating film KL12 of Example 24 was used as the coating film. Further, in the same manner as in the case of the above-described Example 25, the coating Example 2 was produced by using the coating composition K12 on the transparent conductive film substrate and forming the coating film by the film forming method I. Further, in the touch panel of 9, the coating film formed by the film forming method I using the coating composition K 1 2 has a refractive index measured by the same evaluation method as described above, and is comparatively evaluated. The touch panel of Comparative Example 3 was produced by the same production method as described above except that the coating film KL8 of Example 20 was used as the coating film by the coating film KM2 of Comparative Example 2. Further, the above-mentioned transparent conductive film substrate was used as the coating film, and the touch panel of Comparative Example 4 was produced by the same manufacturing method as described above. Therefore, the touch panel for evaluation of Comparative Example 4 was used. No coating film was formed on the transparent electrode. Example of the board 20 and the upper layer of the fabric and the 0-57-201245345 &lt;Evaluation of the visible electrode pattern&gt; The evaluations of the examples 25 to 29 and the comparative examples 3 and 4 were used. The touch panel is used to evaluate whether the electrode pattern of the ITO is conspicuous or not, and the evaluation of the visible electrode pattern is performed. In the evaluation method, each of the touch panels was placed on a black cloth, and visually observed from the state illuminated by the upper portion. In the touch panel of Comparative Example 4, under the transparent electrode pattern, other touch panels were observed. As a result of these observations, those who did not see the transparent electrode pattern were evaluated as ◎. Although the transparent electrode pattern was visible, the degree was evaluated as 〇 compared with the touch panel of Comparative Example 4 having no coating film, and was evaluated as compared with the touch panel of Comparative Example 4 as X. For the touch panels for evaluation of Examples 25 to 29 and Comparative Examples 3 and 4, the evaluation results of the finishing electrode patterns are shown in Table 3. [Table 3] Film refractive index visible electrode pattern Example 25 KL8 1.5 2 〇 Example 26 KL 1 0 1. 5 5 ◎ Example 27 KL 1 1 1. 6 0 ◎ Example 28 KL 1 2 1. 6 5 ◎ Example 29 KL 1 3 1. 70 〇 Comparative Example 3 KM2 1. 50 X Comparative Example 4, one by one - From the above evaluation results and Table 1, it is understood that the coating composition contains metal nitrate and is resistant to precipitation. It can improve stability. As is apparent from Table 2, the coating film formed by the metal-58-201245345 alkoxide contained in the coating composition is appropriately controlled, even on an organic film composed of an acrylic resin or the like. It can also form a film that does not cause cracks and stability. As is apparent from Table 3, the visible electrode pattern of the touch panel can be suppressed by forming a coating film having an appropriately controlled refractive index on the electrode. The coating films of this example all exhibit a hardness of 5 Å or more, which is a significantly higher hardness than a general organic material of less than 3 Å. The coating composition of the present invention can provide a coating film having a high refractive index controlled by the use of the touch panel of the coating film, and the pattern of the electrode is not conspicuous. Therefore, there are touch panels for display elements requiring excellent appearance and high reliability. In addition, the entire contents of the specification, the patent application scope, the drawings, and the abstract of the Japanese Patent Application No. 20 1 1 - 0 1 0 1 64, filed on January 20, 2011, the entire contents of Revealing. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a configuration of a touch panel of the present invention. Fig. 2 is a cross-sectional view taken along line A-1 of Fig. 1. 3(a) to 3(d) are cross-sectional views showing the steps of a method of manufacturing a touch panel of the present invention. Fig. 4 is a plan view showing a schematic configuration of another example of the touch panel of the present invention. Fig. 5 is a plan view showing another embodiment of the touch panel of the present invention, -59-201245345. Figure 6 is a cross-sectional view taken along line B1 - B1' of Figure 5. [Description of main component symbols] 1, 101, 201: touch panel 2, 102, 202: substrate 3, 103, 203: first transparent electrode 4, 104, 204: second transparent electrode 5, 6, 105' 106, 205, 206: coating film 9, 108, 208, 209: adhesive layer 10, 110, 210: display panel 1 1 : pull-out wiring 1 4 : transparent conductive film substrate 1 8 : intersection portion 1 9 : interlayer insulating film 2 0: cross-linking electrode 21: pad portion 107: protective film layer 207: protective film - 60-

Claims (1)

201245345 七、申請專利範圍： 1· 一種觸控面板用塗佈組成物，其特徵係含有 通式（I)所示之第1金屬烷氧化物、下述通式（I】 之第2金屬烷氧化物、下述通式（ΙΠ)所示之金屬 機溶劑、水、與抗析出劑； ^'(OR1),, (I) (式中，Μ1表示選自矽（Si)、鈦（Ti) '鉬 、锆（Zr)、硼（B)、鋁（A1)、鎂（Mg)及鋅 所構成群中之至少1金屬，R1表示碳數1〜5之失 表示IV^之價數2〜5 ); R2iM2(OR3)m., (II) (式中，Μ2表示選自矽（Si)、鈦（Ti)、鉬 、鉻（Zr )、硼（B )、鋁（A1 )、鎂（Mg )及鋅 所構成群中之至少1金屬；R2表示氫原子或亦可以 取代 '且亦可以鹵素原子、乙烯基、縮水甘油醚蕋 '甲基丙烯醯氧基、丙烯醯氧基、異氰酸酯基、胺 脲基取代、且亦可具有雜原子之碳數1〜2 〇之烴基 示碳數1〜5之烷基；m表示M2之價數2〜5，1當 數爲3時爲1或2，當m之價數爲4時爲1〜3，： 價數爲5時1〜4 ); M3(X)k (III) (式中，Μ3表示選自鋁（A1)、銦（In)、 )、鉻（Zr)、鉍（Bi)、鑭（La)、鉅（Ta )-)及铈（Ce )所構成群中之至少1種金屬，X表示 :下述 [)所示 鹽、有 (Ta) (Zn ) 宗某* η (Ta) (Zn ) 氟原子 、巯基 基或醯 :R3表 m之價 _ m之 鋅（Zn 釔（Y 鹽酸、 -61 - 201245345 硝酸、硫酸、乙酸、草酸、胺磺酸、磺酸、乙醯乙酸或乙 醯丙酮酸鹽之殘基、或該等之驗式鹽，k表示M3之價數 )° 2.如申請專利範圍第1項之觸控面板用塗佈組成物， 其第2金屬烷氧化物之含量，相對於第1金屬烷氧化物與 第2金屬烷氧化物之合計總金屬烷氧化物，爲15莫耳％以 上。 3 ·如申請專利範圍第1或2項之觸控面板用塗佈組成 物，其中，該抗析出劑，係選自N—甲基一吡咯烷酮、乙 二醇、二甲基甲醯胺、二甲基乙醯胺、二乙二醇、丙二醇 、己二醇及該等之衍生物所構成群中之至少1種以上。 4. 如申請專利範圍第1至3項中任一項之觸控面板用 塗佈組成物，其中，金屬鹽之金屬原子（M3)、與第1金 屬烷氧化物及第2金屬烷氧化物之金屬原子（M1及M2) 之莫耳比爲 〇.〇 1 S M3/ ( M1 + M2 + M3 ) $ 0.7。 5. 如申請專利範圔第1至4項中任一項之觸控面板用 塗佈組成物，其中，第1金屬烷氧化物，爲矽烷氧化物或 其之部分縮合物、與鈦烷氧化物之混合物。 6. 如申請專利範圍第1至5項中任一項之觸控面板用 塗佈組成物，其中，該金屬鹽，係金屬硝酸鹽、金屬硫酸 鹽、金屬乙酸鹽、金屬氯化物、金屬草酸鹽、金屬胺磺酸 鹽、金屬磺酸鹽、金屬乙醯乙酸鹽、金屬乙醯丙酮酸鹽或 該等之鹼式鹽。 7. 如申請專利範圍第1至6項中任一項之觸控面板用 -62- 201245345 塗佈組成物’其中’該有機溶劑，係含有伸烷二醇類或其 之單醚衍生物。 8. —種塗佈膜，其係使用如申請專利範圍第1至7項 中任一項之觸控面板用塗佈組成物所成膜之塗佈膜。 9. 如申請專利範圍第8項之塗佈膜，其之折射率爲 1.52 〜1.70，膜厚爲 40nm 〜170nm。 10. —種觸控面板，其係於基板之操作範圍形成有透 明電極之圖型之觸控面板，其特徵係，將如申請專利範圍 第8或9項之塗佈膜配置於該透明電極之圖型之至少一部 分上。 11. 如申請專利範圍第10項之觸控面板，其中，該透 明電極圖型，係具有用以檢測至少2個相異方向之位置的 第1透明電極圖型、與第2透明電極圖型而構成， 該第1透明電極圖型與該第2透明電極圖型之至少一 部分，在該基板之操作範圍重疊，且該重疊部分之該第1 透明電極圖型與該第2透明電極圖型之間，配置有由有機 材料所構成之膜， 該塗佈膜，係以被覆該第1透明電極圖型或該第2透 明電極圖型之至少一部分、及該由有機材料所構成之膜之 至少一部分的方式構成。 1 2 ·如申請專利範圍第1 1項之觸控面板，其中，該第 1透明電極圖型與該第2透明電極圖型之重疊部分，於該 基板之操作範圍有複數個，於該等複數之重疊部分，分別 配置有面積較該重疊部分之面積大之該由有機材料所構成 -63- 201245345 之膜。 -64201245345 VII. Patent application scope: 1. A coating composition for a touch panel, which comprises a first metal alkoxide represented by the formula (I) and a second metal alkane of the following formula (I) An oxide, a metallocene solvent represented by the following formula (ΙΠ), water, and an anti-precipitation agent; ^'(OR1), (I) (wherein Μ1 represents a selected from the group consisting of bismuth (Si), titanium (Ti) ) 'At least 1 metal in the group consisting of molybdenum, zirconium (Zr), boron (B), aluminum (A1), magnesium (Mg), and zinc, and R1 represents a carbon number of 1 to 5, indicating that the price of IV is 2 〜5 ); R2iM2(OR3)m., (II) (wherein Μ2 is selected from the group consisting of bismuth (Si), titanium (Ti), molybdenum, chromium (Zr), boron (B), aluminum (A1), magnesium (Mg) and at least one metal in the group consisting of zinc; R2 represents a hydrogen atom or may be substituted 'and may also be a halogen atom, a vinyl group, a glycidyl ether group, a methacryloxy group, an acryloxy group, an isocyanate a hydrocarbon group having a carbon atom number of 1 to 2 杂, which may have a hetero atom, and an alkyl group having 1 to 2 carbon atoms; m represents a valence of 2 to 5, and 1 is 1 when the number is 3. Or 2, when the price of m is 4, it is 1~3,: the price is 5:1 4); M3(X)k (III) (wherein Μ3 means selected from aluminum (A1), indium (In), ), chromium (Zr), bismuth (Bi), lanthanum (La), giant (Ta) At least one metal in the group consisting of -) and cerium (Ce), X represents: a salt represented by the following [), a (Ta) (Zn) samarium * η (Ta) (Zn) fluorine atom, a fluorenyl group Or 醯: R3 table m price _ m zinc (Zn 钇 (Y hydrochloric acid, -61 - 201245345 nitric acid, sulfuric acid, acetic acid, oxalic acid, amine sulfonic acid, sulfonic acid, acetamidine acetic acid or acetamidine pyruvate residues) Or the test salt of the above, k represents the valence of M3) ° 2. The coating composition for a touch panel according to claim 1 of the patent application, the content of the second metal alkoxide is relative to the first The total metal alkoxide of the metal alkoxide and the second metal alkoxide is 15 mol% or more. The coating composition for a touch panel according to claim 1 or 2, wherein The anti-precipitation agent is selected from the group consisting of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexanediol and the like At least one or more of the group. 4. The coating composition for a touch panel according to any one of claims 1 to 3, wherein the metal atom of the metal salt (M3), the first metal alkoxide, and the second metal alkoxide The molar ratio of the metal atoms (M1 and M2) is 〇.〇1 S M3/ ( M1 + M2 + M3 ) $ 0.7. 5. The touch panel of any one of claims 1 to 4 A coating composition, wherein the first metal alkoxide is a mixture of a decane oxide or a partial condensate thereof and a titanium alkoxide. 6. The coating composition for a touch panel according to any one of claims 1 to 5, wherein the metal salt is a metal nitrate, a metal sulfate, a metal acetate, a metal chloride, or a metal grass. An acid salt, a metal amine sulfonate, a metal sulfonate, a metal acetoacetate, a metal acetoacetate or such a basic salt. 7. The touch panel for use in a touch panel according to any one of claims 1 to 6, wherein the organic solvent contains an alkylene glycol or a monoether derivative thereof. A coating film which is formed by coating a coating composition for a touch panel according to any one of claims 1 to 7 of the invention. 9. The coating film of claim 8 which has a refractive index of 1.52 to 1.70 and a film thickness of 40 nm to 170 nm. 10. A touch panel, wherein the touch panel is formed with a transparent electrode in a range of operation of the substrate, and the coating film according to claim 8 or 9 is disposed on the transparent electrode. At least part of the pattern. 11. The touch panel of claim 10, wherein the transparent electrode pattern has a first transparent electrode pattern and a second transparent electrode pattern for detecting positions in at least two different directions. Further, at least a part of the first transparent electrode pattern and the second transparent electrode pattern overlap in an operation range of the substrate, and the first transparent electrode pattern and the second transparent electrode pattern of the overlapping portion A film made of an organic material is disposed between the first transparent electrode pattern or at least a portion of the second transparent electrode pattern and the film made of the organic material. At least part of the way. The touch panel of claim 11, wherein the overlapping portion of the first transparent electrode pattern and the second transparent electrode pattern has a plurality of operating ranges of the substrate, and The overlapping portions of the plurality are respectively disposed with a film having an area larger than that of the overlapping portion, which is composed of an organic material, -63-201245345. -64
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