TW201228995A - Ceramic member and method for producing same, device and method for producing molten glass, and device and method for producing glass article - Google Patents
Ceramic member and method for producing same, device and method for producing molten glass, and device and method for producing glass article Download PDFInfo
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- TW201228995A TW201228995A TW100143113A TW100143113A TW201228995A TW 201228995 A TW201228995 A TW 201228995A TW 100143113 A TW100143113 A TW 100143113A TW 100143113 A TW100143113 A TW 100143113A TW 201228995 A TW201228995 A TW 201228995A
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- glass
- metal
- molten glass
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- 239000000919 ceramic Substances 0.000 title claims abstract description 213
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 89
- 239000011521 glass Substances 0.000 title claims description 196
- 239000006060 molten glass Substances 0.000 title claims description 121
- 229910052751 metal Inorganic materials 0.000 claims abstract description 206
- 239000002184 metal Substances 0.000 claims abstract description 206
- 239000000758 substrate Substances 0.000 claims abstract description 119
- 239000011449 brick Substances 0.000 claims abstract description 50
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 18
- 239000000956 alloy Substances 0.000 claims abstract description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052845 zircon Inorganic materials 0.000 claims abstract description 11
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims abstract description 11
- -1 platinum group metals Chemical class 0.000 claims abstract description 9
- 239000007921 spray Substances 0.000 claims description 99
- 238000001816 cooling Methods 0.000 claims description 39
- 230000007246 mechanism Effects 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 21
- 238000000465 moulding Methods 0.000 claims description 10
- 238000005323 electroforming Methods 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 8
- 238000003723 Smelting Methods 0.000 claims description 7
- 238000007496 glass forming Methods 0.000 claims description 4
- 239000004575 stone Substances 0.000 claims description 4
- 229910052902 vermiculite Inorganic materials 0.000 claims description 2
- 239000010455 vermiculite Substances 0.000 claims description 2
- 235000019354 vermiculite Nutrition 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 abstract description 59
- 230000000694 effects Effects 0.000 abstract description 12
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 150
- 230000000052 comparative effect Effects 0.000 description 21
- 230000006837 decompression Effects 0.000 description 18
- 238000005507 spraying Methods 0.000 description 17
- 238000002844 melting Methods 0.000 description 16
- 230000008018 melting Effects 0.000 description 16
- 239000002994 raw material Substances 0.000 description 13
- 239000001257 hydrogen Substances 0.000 description 12
- 229910052739 hydrogen Inorganic materials 0.000 description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000002923 metal particle Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 5
- 101100165177 Caenorhabditis elegans bath-15 gene Proteins 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 210000003298 dental enamel Anatomy 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000007670 refining Methods 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 238000009849 vacuum degassing Methods 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229920006332 epoxy adhesive Polymers 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910000575 Ir alloy Inorganic materials 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000000881 depressing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000002305 electric material Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000011104 metalized film Substances 0.000 description 1
- 238000003032 molecular docking Methods 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910021647 smectite Inorganic materials 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
- C04B35/481—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing silicon, e.g. zircon
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/167—Means for preventing damage to equipment, e.g. by molten glass, hot gases, batches
- C03B5/1672—Use of materials therefor
- C03B5/1675—Platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
- C03B5/2252—Refining under reduced pressure, e.g. with vacuum refiners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/42—Details of construction of furnace walls, e.g. to prevent corrosion; Use of materials for furnace walls
- C03B5/43—Use of materials for furnace walls, e.g. fire-bricks
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/16—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay
- C04B35/18—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silicates other than clay rich in aluminium oxide
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
- C04B41/5122—Pd or Pt
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/88—Metals
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/04—Alloys based on a platinum group metal
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3201—Alkali metal oxides or oxide-forming salts thereof
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3217—Aluminum oxide or oxide forming salts thereof, e.g. bauxite, alpha-alumina
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3244—Zirconium oxides, zirconates, hafnium oxides, hafnates, or oxide-forming salts thereof
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/36—Glass starting materials for making ceramics, e.g. silica glass
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/80—Phases present in the sintered or melt-cast ceramic products other than the main phase
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/94—Products characterised by their shape
- C04B2235/945—Products containing grooves, cuts, recesses or protusions
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Composite Materials (AREA)
- Coating By Spraying Or Casting (AREA)
- Compositions Of Oxide Ceramics (AREA)
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Abstract
Description
201228995 六、發明說明: 【明戶斤屬之_$椅領^^】 發明領域 本發明係有關於陶瓷構件的製造方法、以該製造方法 製得之陶瓷構件、具備該陶瓷構件之熔融玻璃的製造裝 置、使用該製造裝置之炫融玻璃的製造方法、具備前述陶 瓷構件之玻璃物品的製造裝置、及使用該製造裝置之玻璃 物品的製造方法。201228995 VI. Description of the Invention: [The invention relates to a method for manufacturing a ceramic member, a ceramic member produced by the method, and a molten glass having the ceramic member. A manufacturing apparatus, a manufacturing method of the glazing glass using the manufacturing apparatus, a manufacturing apparatus of the glass article including the ceramic member, and a manufacturing method of the glass article using the manufacturing apparatus.
L· ittr U 發明背景 例如,玻璃板等玻璃產品係從玻璃原料製造熔融玻璃 後,以成形裝置成形該熔融玻璃而得。為了提升成形後之 玻璃產品之品質’有一種提議使用減壓消泡裝置之方法, 其目的在於:在以熔融槽來熔融玻璃原料之後且以成形裝 置成形之前’除去產生於熔融玻璃内之氣泡(例如專利文獻 1)。 該減壓消泡裝置具備有内部保持在預定減壓度之減壓 消泡槽,而其係藉由熔融玻璃通過該減壓消泡槽内時,使 含於熔融玻璃内之氣泡以較短的時間成長,並使大幅成長 後的氣泡It由其浮力浮上溶融玻璃之表面並破泡的方式, 從熔融玻璃除去氣泡。 自炼融槽流出之炫融玻璃一如納甸玻璃一之溫度係在 1200〜1600°C左右,為了有效進行減壓消泡,導入減壓消泡 裝置内之熔融玻璃的溫度在1〇〇〇〜15〇(Tc左右,而導入至減 & 3 201228995 壓消泡槽之熔融玻璃的溫度則在1 〇〇〇〜1400°c左右。 在減壓消泡裝置中,減壓消泡槽等與熔融玻螭接觸的 構件必須具有良好的耐熱性及對熔融玻璃的耐蝕性,故而 使用電鑄磚等陶瓷構件。 又’為了可進一步抑制因熔融玻璃所造成之侵餘,有 提議一種以金屬膜被覆電鑄磚之方法,此外,在下述專利 文獻2中有記載一種方法,其係於電鑄磚表面形成固定用凹 邛並以埋填邊凹部的方式來形成金屬喷覆膜,藉以提升電 鑄磚與金屬膜之密接強度,並抑制金屬膜之剝離。 先前技術文獻 專利文獻 專利文獻1 :國際公開第2009/125750號冊子 專利文獻2:日本特開2008-121073號公報 C發明内容】 發明概要 發明欲解決之課題 然而,在專利文獻2記載之方法中,電鑄磚與金屬膜之 密接強度並不夠充分。 依據本發明人等之見解,就凹部的固定效果而言,與 金屬膜之厚度方向之拉伸力相對的密接強度之提升效果太 /J\ 〇 本發明係有鑑於前述狀況而成者,其係一種製造具有 電鑄磚等陶瓷基材、及被覆其表面之金屬喷覆膜之陶瓷構 件之方法,且目的在於提供該陶瓷基材與金屬嘴覆膜之密 4 201228995 接強度之提升效果優異的陶瓷構件的製造方法。 又,本發明之目的在於提供一種以該製造方法而製得 之陶瓷構件、具備該陶瓷構件之熔融玻璃的製造裝置、使 用該製造裝置之熔融玻璃的製造方法、具備前述陶瓷構件 之玻璃物品的製造裝置、及使用該製造裝置之玻璃物品的 製造方法。 用以解決課題之手段 本發明人等經重複精闢研究的結果發現:於包含預定 量以上之玻璃相的陶瓷基材上形成金屬喷覆膜以後,再以 特定條件進行熱處理,便可大幅提升尤其與金屬喷覆膜之 厚度方向之拉伸力相對的陶瓷基材與金屬喷覆膜之密接強 度。又發現:只要進行該熱處理,陶瓷基材與金屬喷覆膜 之界面的微小空間會成為已充填玻璃相之狀態而完成本發 明。 即,本發明之陶瓷構件的製造方法係用以製造使用時 之溫度低於1500°C之陶瓷構件者,其特徵在於具有下述步 驟:在由含有3〜30質量%玻璃相且以電鑄磚或锆石為主成 分之燒結磚所構成的陶瓷基材上,形成金屬喷覆膜之後, 以1500°C以上之溫度進行熱處理之步驟,且前述金屬喷覆 膜係選自於由鉑族金屬及以1種以上鉑族金屬為主成分之 合金所構成之群組中之至少1種金屬的喷覆膜。本發明之陶 瓷構件的製造方法中,前述使用時之溫度宜在1400°C以下。 於前述陶瓷基材之表面形成有規則性之固定用凹部, 且於該固定用凹部上形成前述金屬噴覆膜為佳。 5 201228995 本發明之陶瓷構件係以前述之本發明之製造方法製得 者,其特徵在於.4述陶瓷基材與前述金屬噴覆膜之界面 空間中充填有玻璃相。 本發明之陶瓷構件係具有陶瓷基材及設於其表面上之 金屬噴覆膜,且使用時之溫度低M150(rc者,其特徵在於: 前述金屬係選自於由鉑族金屬及以丨種以上鉑族金屬為主 成分之合金所構成群組中之至少丨種金屬;前述陶瓷基材係 由含有3〜30質量❶/〇玻璃相且以電鑄磚或锆石為主成分之燒 結磚所構成;且前述陶聽材與前述金屬倾膜之界面空 間中充填有前述玻璃相之—部分。本發明之陶竞構件之前 述使用時之溫度宜在以下。 於刚述陶究基材之表面形成有規則性之S1定用凹部, 且刖述金屬喷覆膜細埋填腳定用凹部的方式來形成為 佳。 。本發明提供—種炫融玻璃的製造裝置,其與低於1500 eni玻璃接觸的構件係使用本發明之喊構件。本發 月中,與14〇〇 C以下之熔融玻璃接觸的構件係以使用本發 明之陶瓷構件為佳。 务月^供種炫融玻璃的製造裝置’其係使用含有 3 3hS%玻璃相且以電料或錯;5為主成分之燒結碑所 #成。之H基材’來構纽融玻璃之製造裝置中與低於 C之熔嘁玻螭相接部分之至少一部分,並在15〇〇。(:以 之'皿度下將别述炫融玻璃的製造裝置之至少前述陶竞基 才進行熱處理而成者’前述喊基材形成有金屬喷覆膜, 201228995 且前述金屬噴覆膜係選自於由翻族金屬及以1種以上鉑族 金屬為主成分之合金所構成群組中之至少1種金屬的噴覆 膜。 本發明提供一種熔融破璃的製造裝置,其係使用由含 有3〜30質量%玻璃相且以電鑄磚或锆石為主成分之燒結磚 所構成之陶瓷基材,來構成熔融玻璃之製造裝置中與低於 1500 C之炫融玻璃相接部分之至少一部分,並在該構成之 部分的陶瓷基材上形成金屬喷覆膜,接下來,在1500°C以 上之溫度下’使炼融玻璃的製造裝置中之至少形成有前述 金屬噴覆膜之陶瓷基材進行熱處理而成者,且前述金屬噴 覆膜係選自於由銘族金屬及以1種以上銘族金屬為主成分 之合金所構成之群組中之至少丨種金屬的喷覆膜。 本發明提供一種溶融玻璃的製造方法,其係使用本發 明之炫融玻璃的製造裝置來製造溶融玻璃。 本發明提供一種玻璃物品的製造裝置,其具有:用以 製造熔融玻璃之機構;使所得熔融玻璃成形之成形機構; 及,使成形後之玻璃徐冷之徐冷機構;且,其與低於1500 °c之炼融玻璃接觸的構件係使用本發明之陶瓷構件。本發 明係以具有:用以製造熔融玻璃之機構;使所得熔融玻璃 成形之成形機構;及’使成形後之玻璃徐冷之徐冷機構; 且,其與1400 C以下之炼融玻璃接觸的構件係使用本發明 之陶瓷構件為佳。 本發明提供一種玻璃物品的製造裝置,其具備:溶融 玻璃的製造裝置;使熔融玻璃成形之玻璃成形裝置;及, 201228995 使成形後之玻璃徐冷之徐冷裝置;前述熔融玻璃的製造裴 置係使用含有3〜30質量%玻璃相且以電鑄磚或锆石為彡成 刀之燒結磚所構成之陶瓷基材,來構成熔融玻璃之製造裝 置中與低於1500¾之熔融玻璃相接部分之至少一部分,並 在l5〇〇C以上之溫度下將前述熔融玻璃的製造裝置之至少 則述陶竟基材進行減理而成者,前述喊基材形成有 屬噴覆膜,城金屬喷覆膜係選自於由_金屬及以^, 上鉑族金屬為主成分之合金所構成之群組中之至少丨以 屬的喷覆膜。 金 尽卷月提供一種玻璃物品的製造裝置,其具有:搶 玻璃的製造n㈣融玻璃成形之玻璃成料置;及皱 使成形後之_徐冷之徐冷裝置;前述料玻璃的製後’ 置係使用含有3〜3〇質量%玻璃相且以電鑄磚或錯石為装 分之燒結磚所構叙陶£騎,來構成㈣㈣之製^ 置中與低於15GGt:之熔融玻璃相接部分之至少—部八 在該構成之部分之㈣基材上形成金屬嘴覆膜,接^教 在1500°C以上之溫度下,使㈣玻璃的製杜置中之至| 形成有前述金屬噴覆膜之喊基材進行熱處理而成者至少 前述金屬噴覆膜係選自於由㈣金屬及種以上麵^足 屬為主成分之合金所構成之群組中之至少请金屬的^金 膜。 、覆 永聲 本發明提供一種玻璃物品的製造方法,其係使用 明之玻璃物品的製造裝置來製造玻璃物品。 發明效果 201228995 依據本發明,可製得一 種於具有玻璃相之陶瓷基材及 下亦稱為金屬喷覆膜)之界 被復其表面之金屬的噴覆膜 面空間中充填有前述玻塢相之 „ + ^ 部分、且該陶瓷基材與金 屬賀覆膜之密接強度良好的陶瓷構件。 由於本發明之熔融坡璃 啤的氣造装置係以金屬喷覆膜被 復與溶融玻璃接觸的構件之矣 ,./5 β 衣面,因此對熔融玻璃之耐蝕 性優異,並且因該金屬噴覆 久性 ^ 、難以制離,故具有良好的耐 藉由使用本發明之熔融 溶融玻璃及玻璃物品。坡•製造裝置,可穩定製造 圖式簡單說明 實施形態之剖面 圖 第1圖係顯示本發明之陶究構件之一 第2圖係顯示固定用凹部 係(a)中沿著B-B線之剖面圖。—例者,(a)係俯視圖’(b) 第3圖係顯示本發明之炫 形態之縱剖面圖。 方塊圖 融坡壤的製造裝置之一實施 第4圖係顯示本發明之破續物 的製造方法之一例之 第5圖係說明密接強度之測定方法之圖。 第6圖係顯示密接強度之測定結果之圖表。 糊係在實施例i中所獲得的陶曼 , (a)係熱處理前且(b)係執卢 . 面圖 相者-、、处後,(a’)係顯示(勻中映射破璃 相者,且(b)係顯不叫中映射_相者。 9 201228995 第8圖係在實施例2中所獲得的陶瓷構件之剖面圖片, (a)係熱處理前且(b)係熱處理後;(b,)係擴大顯示(b)之主要 部位者。 第9圖係在比較例1中所獲得的陶瓷構件之剖面圖片, (a)係熱處理前且(b)係熱處理後;(b,)係擴大顯示(b)之主要 部位者。 第10圖係顯示在實施例3中,在由陶瓷構件所構成之容 器内,使玻璃原料熔融、固化時所用之熱歷程的圖表。 第11圖顯示實施例3之結果,(a)係在由陶瓷構件所構成 之容器内已固化之玻璃之剖面圖片,(b)係顯示冷-OH值之 測定結果之圖表。 第12圖顯示比較例2之結果,(a)係在由陶瓷構件所構成 之容器内已固化之玻璃之剖面圖片,(b)係顯示冷-OH值之 測定結果之圖表。 第13圖顯示比較例3之結果,(a)係在由陶瓷構件所構成 之容器内已固化之玻璃之剖面圖片,(b)係顯示冷-OH值之 測定結果之圖表。 第14圖係在參考例1中所製得在由陶瓷構件所構成之 容器内已固化之玻璃的剖面圖片。 第15圖係顯示參考例1之召-OH值之測定結果之圖表。 C實施方式3 用以實施發明之形態 <陶瓷構件> 第1圖係顯示本發明之陶瓷構件之一實施形態之剖面L·ittr U BACKGROUND OF THE INVENTION For example, a glass product such as a glass plate is obtained by molding a molten glass from a glass raw material and then molding the molten glass by a molding apparatus. In order to improve the quality of the formed glass product, there is a proposal to use a vacuum defoaming device for the purpose of removing the bubbles generated in the molten glass after melting the glass raw material by the melting tank and before forming the forming device. (for example, Patent Document 1). The vacuum defoaming device is provided with a decompression defoaming tank which is internally maintained at a predetermined degree of decompression, and when the molten glass passes through the decompression defoaming tank, the bubbles contained in the molten glass are made shorter. The time is grown, and the bubble A which is greatly grown is floated on the surface of the molten glass by buoyancy, and bubbles are removed from the molten glass. The temperature of the molten glass flowing out of the smelting tank is as high as 1200~1600 °C, and the temperature of the molten glass introduced into the vacuum defoaming device is 1 为了 in order to effectively decompress and defoam. 〇~15〇 (about Tc, and introduced to minus & 3 201228995 The temperature of the molten glass of the defoaming tank is about 1 〇〇〇~1400 °c. In the vacuum defoaming device, the decompression defoaming tank The member that is in contact with the molten glass crucible must have good heat resistance and corrosion resistance to the molten glass, so ceramic members such as electroforming bricks are used. In order to further suppress the remnant caused by the molten glass, it is proposed to In the method of coating a cast iron with a metal film, in the following Patent Document 2, there is described a method in which a recess for fixing is formed on the surface of an electroformed brick and a metal sprayed film is formed by embedding a recessed portion. The adhesion strength between the electroforming brick and the metal film is increased, and the peeling of the metal film is suppressed. PRIOR ART DOCUMENT PATENT DOCUMENT Patent Document 1: International Publication No. 2009/125750 Patent Document 2: Japanese Patent Laid-Open Publication No. 2008-121073 SUMMARY OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION However, in the method described in Patent Document 2, the adhesion strength between the electroformed brick and the metal film is not sufficient. According to the findings of the present inventors, in terms of the fixing effect of the concave portion, The effect of improving the adhesion strength of the tensile force in the thickness direction of the metal film is too large. J. The present invention is based on the above-mentioned situation, and is a method of manufacturing a ceramic substrate such as an electrocast brick and covering the surface thereof. A method of manufacturing a ceramic member of a metal spray film, and an object of the invention is to provide a method for producing a ceramic member having excellent adhesion strength between the ceramic base material and the metal nozzle film. Further, it is an object of the present invention to provide a method for producing a ceramic member. Ceramic member produced by the production method, apparatus for producing molten glass including the ceramic member, method for producing molten glass using the same, apparatus for producing glass article including the ceramic member, and glass using the same Method for producing an article. Means for solving the problem The inventors of the present invention have repeatedly studied intensively and found that: After the metal sprayed film is formed on the ceramic substrate containing a predetermined amount or more of the glass phase, and then heat-treated under specific conditions, the ceramic substrate and the metal, which are particularly opposed to the tensile force in the thickness direction of the metal sprayed film, can be greatly improved. The adhesion strength of the sprayed film is also found: as long as the heat treatment is performed, the minute space at the interface between the ceramic substrate and the metal sprayed film becomes a state in which the glass phase is filled, and the present invention is completed. The method is used for manufacturing a ceramic component having a temperature lower than 1500 ° C in use, and is characterized in that it has the following steps: sintering from a glass phase containing 3 to 30% by mass and electroforming brick or zircon as a main component a step of heat-treating at a temperature of 1500 ° C or higher after forming a metal sprayed film on a ceramic substrate made of bricks, and the metal sprayed film is selected from a platinum group metal and one or more platinum group metals A spray film of at least one metal selected from the group consisting of alloys of the main component. In the method for producing a ceramic member of the present invention, the temperature at the time of use is preferably 1400 ° C or lower. A regular fixing recess is formed on the surface of the ceramic base material, and the metal spray film is preferably formed on the fixing recess. 5 201228995 The ceramic member of the present invention is obtained by the above-described production method of the present invention, characterized in that the interface space between the ceramic substrate and the metal spray film is filled with a glass phase. The ceramic member of the present invention has a ceramic base material and a metal sprayed film provided on the surface thereof, and has a low temperature M150 (rc) in use, wherein the metal is selected from the group consisting of platinum group metals and a metal of at least one of the group consisting of an alloy containing a platinum group metal as a main component; the ceramic substrate is sintered by a glass containing 3 to 30 mass ❶/〇 of a glass phase and containing electroforming brick or zircon as a main component The brick is formed; and the interface space between the ceramic material and the metal tilting film is filled with the glass phase. The temperature of the ceramic component of the present invention is preferably used in the following. It is preferable that the surface of the surface is formed with a regular S1 recessed portion, and the metal sprayed film is finely formed by the recessed portion. The present invention provides a device for manufacturing a glazed glass which is lower than The 1500 eni glass-contacting member uses the shouting member of the present invention. In the present month, the member that is in contact with the molten glass of 14 〇〇C or less is preferably a ceramic member using the present invention. Manufacturing device Using a sintered glass material containing 3 3hS% glass phase and containing electric material or wrong; 5 as the main component, the H substrate 'construction of the fused glass is connected with the melting glass below C. At least a part of the part is at 15 〇〇. (: The above-mentioned shouting substrate is formed with a metal spray film, in which at least the above-mentioned manufacturing equipment of the glazed glass is manufactured by heat treatment. 201228995 The metal spray coating film is selected from the group consisting of a sprayed film of at least one metal selected from the group consisting of a family of metals and an alloy containing one or more platinum group metals as a main component. The present invention provides a molten glass. a manufacturing apparatus using a ceramic substrate composed of a sintered brick containing 3 to 30% by mass of a glass phase and comprising electroforming brick or zircon as a main component to constitute a device for manufacturing molten glass and less than 1500 C. At least a part of the fused glass contact portion, and a metal spray film formed on the ceramic substrate of the structure, and then at least 1500 ° C or higher to make at least the smelting glass manufacturing device Ceramic substrate formed with the aforementioned metal spray film In the heat treatment, the metal sprayed film is selected from the group consisting of a sprayed film of at least one of the group consisting of a metal of the group and an alloy containing one or more of the metals of the group. The present invention provides a method for producing a molten glass which is produced by using the apparatus for producing a molten glass of the present invention. The present invention provides a manufacturing apparatus for a glass article, comprising: a mechanism for manufacturing molten glass; A forming mechanism for forming a glass; and a cold-cooling mechanism for cooling the formed glass; and a member for contacting the molten glass of less than 1500 °C uses the ceramic member of the present invention. The present invention has: a mechanism for manufacturing molten glass; a forming mechanism for forming the obtained molten glass; and a 'cold cooling mechanism for cooling the formed glass; and the member contacting the molten glass of 1400 C or less is used according to the present invention. Ceramic components are preferred. The present invention provides an apparatus for producing a glass article, comprising: a device for producing molten glass; a glass forming device for molding molten glass; and 201228995 a cold cooling device for forming a glass after cooling; and manufacturing of the molten glass A ceramic substrate composed of a sintered brick containing 3 to 30% by mass of a glass phase and an electroforming brick or zircon as a crucible is used to form a portion of the molten glass manufacturing apparatus that is in contact with the molten glass of less than 1503⁄4. At least a part of the molten glass manufacturing apparatus is at least a part of the above-mentioned molten glass manufacturing apparatus, and the shingling substrate is formed into a sprayed film, and the metal spray is formed. The coating film is selected from at least a bismuth spray film of a group consisting of a metal and an alloy containing a platinum group metal as a main component. Jinquanjuan provides a manufacturing device for glass articles, which comprises: manufacturing glass for n (four) glass forming of glass forming; and cooling device for forming cold after forming; The system uses a sintered brick containing 3 to 3 〇 mass% of the glass phase and is made of electroformed brick or smectite, and is constructed to produce (4) (4) and a molten glass phase of less than 15 GGt. At least a portion of the joint portion forms a metal nozzle film on the (four) substrate of the portion of the structure, and the contact is made at a temperature of 1500 ° C or higher to cause the formation of the (four) glass to be formed. At least the metal spray film is selected from the group consisting of (4) metals and alloys composed of the above-mentioned alloys, and at least the metal of the group. membrane. The present invention provides a method of producing a glass article, which is a glass article manufactured using the apparatus for manufacturing a glass article. According to the present invention, a spray film surface space in which a metal having a surface of a ceramic substrate having a glass phase and a metal spray film is reinforced by a surface thereof is filled with the aforementioned glass docking phase a ceramic member having a good adhesion strength between the ceramic substrate and the metal coating film. The gas-making device of the molten glaze beer of the present invention is a member in which the metal spray coating is contacted with the molten glass. Then, the ./5 β clothing is excellent in corrosion resistance to molten glass, and because of the long-lasting nature of the metal, it is difficult to separate, so it has good resistance to use by using the molten molten glass and glass articles of the present invention. Slope manufacturing apparatus, stable manufacturing drawings, sectional view for explaining the embodiment, Fig. 1 showing one of the ceramic members of the present invention, and Fig. 2 showing the section along the BB line in the fixing recess system (a) Fig. - (a) is a plan view '(b) Fig. 3 is a longitudinal sectional view showing the sleek form of the present invention. Fig. 4 is a view showing the manufacture of a device for sloping soil. Fig. 4 shows the break of the present invention. Manufacture of continuation Fig. 5 is a view showing a method of measuring the adhesion strength. Fig. 6 is a graph showing the measurement results of the adhesion strength. The paste is obtained in the example i, and (a) before the heat treatment and (b) The system is executed. The surface map is -, after, the (a') is displayed (the map is mapped in the uniform, and the (b) is not called the map_phase. 9 201228995 8 The figure is a cross-sectional view of the ceramic member obtained in Example 2, (a) before heat treatment and (b) after heat treatment; (b,) is enlarged to show the main part of (b). The cross-sectional picture of the ceramic member obtained in Comparative Example 1 is (a) before heat treatment and (b) after heat treatment; (b,) is enlarged to show the main portion of (b). Fig. 10 is shown in the examples. 3 is a graph showing the thermal history of melting and solidifying a glass raw material in a container made of a ceramic member. Fig. 11 shows the result of Example 3, and (a) is in a container composed of a ceramic member. A cross-sectional image of the cured glass, (b) is a graph showing the measurement results of the cold-OH value. Figure 12 shows Comparative Example 2 As a result, (a) is a cross-sectional image of the glass solidified in the container composed of the ceramic member, and (b) is a graph showing the measurement result of the cold-OH value. Fig. 13 shows the result of Comparative Example 3, (a A cross-sectional image of a glass solidified in a container composed of a ceramic member, and (b) a graph showing a measurement result of a cold-OH value. Fig. 14 is a ceramic member produced in Reference Example 1. Fig. 15 is a cross-sectional view showing the result of measurement of the call-OH value of Reference Example 1. C Embodiment 3 Form for carrying out the invention <Ceramic member> The figure shows a section of an embodiment of the ceramic component of the present invention.
S 10 201228995 圖。符號1係表相:総材、㈣2係表示金 號3係表示固定用凹部 、、 本發明之陶瓷構件具有陶瓷基材丨、及設於复 金屬噴覆膜2,錢喊紐1與金屬噴_2之^面上之 充填有從H基材所滲ifc之玻璃相(未ϋ示)。1二間中 <陶瓷基材> 瓦純Η糸使用含有3〜30質量%麵相的磚S 10 201228995 Illustration. The symbol 1 is the surface: coffin, (4) 2, the gold number 3 indicates the fixing recess, the ceramic member of the present invention has the ceramic substrate 丨, and the composite metal spray film 2, the money smash 1 and the metal spray The surface of _2 is filled with a glass phase (not shown) which is infiltrated from the H substrate. 1 2 middle <ceramic substrate> tile pure enamel uses bricks containing 3 to 30% by mass of the surface
付對炫融玻璃的耐敍性,以高敏密性之 ’、'、X T > ^T# m-T'+' - 為佳,在此觀點 下了使用下逃以氧化錯等為主體之電缚碑 主成分之燒結磚。 石為 右玻璃相之含量小於3質量%,在進行後述的熱處理 時,將難以產生玻璃相從喊基材丨渗出之現象。若超㈣ 質量%,則有玻璃相之渗出量變多而易於產生金屬喷覆膜 膨服的問題。 [電鑄磚] 電麵磚係以選自於由氧化錯、氧化銘、石夕酸紹、錄石_ 田紹、·柱;5 I化⑪及氧化鈦所構成群組巾之至少1種作為 構成成刀並以電爐將該等原料完全炫解鑄造之碑,實質上 由結曰日相與玻翻所構成。在本發明中,<從公知的電鱗 磚中選擇使用玻璃相之含量為3〜3〇質量%者。 本發明之陶兗基材中之玻璃相含量係依據剖面圖片來 求算相對於、、Ό BB相與玻璃相之面積合計的玻璃相之面積 率’並將此換算成質量率而求得之值m而言,係在離 被覆金屬喷覆膜之m材之緻密表面5()麵以内之表It is better to use the high-sensitivity ', ', XT >^T# m-T'+' - for the purpose of the smelting of the glass, and in this view, the use of the escaping is the main cause of the oxidization error. The electric brick is the main component of the sintered brick. When the content of the right glass phase is less than 3% by mass, it is difficult to cause the glass phase to ooze out from the squeezing substrate when the heat treatment described later is performed. If it exceeds (4)% by mass, there is a problem that the amount of exudation of the glass phase increases and the metal spray film is easily swollen. [Electro-casting brick] The electric-faced brick is selected from at least one group consisting of oxidized, oxidized, sulphuric acid, shoal _ Tian Shao, · column, 5 I 11 and titanium oxide. As a monument that constitutes a knife and completely smashes the raw materials in an electric furnace, it is essentially composed of a crucible day and a glass transition. In the present invention, <from the known electric scale bricks, the content of the glass phase is selected to be 3 to 3 % by mass. The glass phase content in the ceramic substrate of the present invention is obtained by calculating the area ratio of the glass phase of the total area of the BB phase and the glass phase based on the cross-sectional image and converting this into a mass ratio. For the value m, it is within the surface of the dense surface 5 () of the m-coated material of the coated metal spray film.
S 11 201228995 層,使用藉由電子顯微鏡以5〇~l〇〇倍拍攝的反射電子像(組 成像)將玻璃相與結晶相予以二元化而求算。 就本發明中使用之電鑄磚之具體例而言’例如有: AZS(Al2〇3-Si〇2-Zr〇2)磚、已提高氧化鍅含量之高氣化結質 磚等。該等中,因AZS磚難以生成於加熱或熱波動時會產 生的裂痕,故以AZS磚為理想。 AZS磚之玻璃相含量以10〜25質量%為佳,15〜2〇質量0/ 較佳。AZS碑之玻璃相含量可藉由原料之摻混比進行調整。 AZS磚之組成以40-55質量%之Al2〇3 ' 1〇〜15質量0/〇之 Si〇2、30〜45質量0/〇之Zr02、且0.5〜2.5質量%之Na2〇為佳。 其他成分一如構成玻璃相之各種金屬氧化物及無法避免之 雜質等一在2%以下為佳,1%以下較佳。 高氧化鍅質磚之玻璃相含量在2〜20質量%為佳,4〜15 質量%較佳。高氧化錯質磚之玻璃相含量可藉由調合而 整。 ° 高氧化鍅質磚之組成以0.5〜20質量%之八丨2〇3、2〜1〇質 量%之8丨〇2、且8〇〜96質量%之乙1*〇2為佳。其他成分〜如構 成破璃相之各種金屬氧化物及無法避免之雜質等〜包八 Na2〇 ’理想在3%以下,且以2%以下較佳。 [以锆石為主成分之燒結磚] 以錯石為主成分之燒結磚係含有锆石〜%質量。/〇之 燒結磚,實質上由結晶相與玻璃相構成。本發明 T 勺從 以公知之鍅石為主成分的燒結磚中選擇使用破璃相 3〜30質量%者。 12 201228995 以錐石為主成分之燒結磚中的玻璃相含量以3〜1〇質量 /〇為么,4〜10質量%較佳。以锆石為主成分之燒結碑的玻璃 相含量可藉由原料粉末之摻混比而調整。 以锆石為主成分之燒結磚的組成以Si〇2為3〇〜β質量 %、Zr〇2為50〜70質量%、且其他金屬氧化物為5質量%以下 為佳。 [固定用凹部] 於陶瓷基材1之表面宜形成有規則性之固定用凹部3。 藉由設置固定用凹部3,較可提升陶瓷基材丨與金屬喷覆膜2 之密接強度。尤其可提升與陶瓷基材1之表面呈平行方向之 拉伸應力相對的密接強度。 第2圖係顯示固定用凹部3之形狀之—例者,(a)係俯視 圖、且(b)係(a)中沿著b-B線之剖面圖。 本例之固定用凹部3係設置有呈格子狀之剖面形狀為 長方形的多數直線溝g。各溝g之側面相對於陶瓷基材丨之表 面為垂直’且溝寬W恒定。 為了有效獲得固定效果,構成固定用凹部3之溝^必須 具有某程度的深度,但若深度過深,會使陶瓷基材丨之表層 部分的強度降低而難以進行加工。例如,溝g之深度€1在 50〜350#m左右為佳,較理想在15〇〜25〇//m左右。 在金屬噴覆膜2與陶瓷基材1之間產生的應力之分散度 會依溝間距(溝間間隔,指鄰接之溝之各溝的中央線間之距 離)p而改變,為了分散應力且縮小加諸於一處的應力,則 宜縮小溝間距p。若考慮到金屬喷覆膜2之應力耐久性及陶 $ 13 201228995 瓷基材1之強度,溝間距口在2 5111111左右以下為佳較理想 在1.5mm左右以下。同理,溝寬…亦以狹窄者為佳,又,在 保持陶兗基材1之表層部分之強度的觀點上,亦以溝寬评狹 乍者為佳。惟,若溝寬w小於所喷覆之金屬粒子的粒徑,則 將無法以噴覆粒子將溝予以充填,所以,溝寬w需設在喷覆 粒子之粒徑以上。例如,溝寬…在丨⑻以爪以上為佳,i5〇# m左右以上較佳。 為了使相鄰之溝g之間的凸部保有可對抗應力而不斷 裂的強度’必須確保依應力的凸部寬χ(=溝間間隔—即溝間 距Ρ—與溝寬w之差)。形成於陶瓷基材丨上之金屬喷覆膜2 的厚度m愈厚,從金屬噴覆膜2施加與陶瓷基材丨之表面呈平 行方向的拉伸應力會變得愈大。就該點而言,凸部寬χ宜在 金屬喷覆膜2之厚度〇1的4倍左右以上。此外,若考慮到縮小 溝間距P之觀點,理想的凸部寬X在膜之厚度m的2.5〜5倍左 右。 加諸於溝g之側面的應力在溝之深度愈深(即,側面愈 大)時,應力愈可能分散至侧面整體而使凸部難以斷裂。所 以,溝間距p比溝之深度d的比例(p/d)愈小,應力的分散性 就愈高’且愈容易抑制金屬噴覆膜2之剝離。若基於前述的 適當溝間距p及溝之深度d來求算使應力適當分散的p/d 值,理想在3〜8左右。 而,固定用凹部不限於第2圖中顯示之形狀者。例士 亦可有規則地形成略呈圓柱狀之孔。 當形成斷斷續續之孔來作為如第2圖中顯示之溝3之替The layer of S 11 201228995 was obtained by binarizing the glass phase and the crystal phase using a reflection electron image (group imaging) taken at 5 〇 to 1 〇〇 times by an electron microscope. For the specific example of the electroformed brick used in the present invention, for example, there are: AZS (Al2〇3-Si〇2-Zr〇2) brick, high gasified knot brick having improved cerium oxide content, and the like. In these cases, it is difficult to form AZS bricks because of the difficulty in generating cracks caused by heating or thermal fluctuations. The glass phase content of the AZS brick is preferably 10 to 25% by mass, and 15 to 2% by mass is preferably 0. The glass phase content of the AZS monument can be adjusted by the blending ratio of the raw materials. The composition of the AZS brick is preferably 40-55 mass% of Al2〇3'1〇~15 mass0/〇 of Si〇2, 30~45 mass0/〇 of Zr02, and 0.5 to 2.5% by mass of Na2〇. The other components are preferably 2% or less, more preferably 1% or less, such as various metal oxides constituting the glass phase and unavoidable impurities. The glass phase content of the high oxidized enamel brick is preferably 2 to 20% by mass, preferably 4 to 15% by mass. The glass phase content of the highly oxidized malform brick can be adjusted by blending. ° The composition of the high oxidized enamel brick is preferably 0.5 to 20% by mass of 丨2〇3, 2 to 1 〇% by mass of 丨〇2, and 8 〇 to 96% by mass of B 1*〇2. Other components - such as various metal oxides and unavoidable impurities constituting the glass phase, are preferably 3% or less, and preferably 2% or less. [Sintered brick with zircon as the main component] The sintered brick with the main component of the wrong stone contains zircon ~% by mass. / 〇 The sintered brick consists essentially of a crystalline phase and a glass phase. In the present invention, the spoon T is selected from the group consisting of the known sapphire as the main component, and the glazed phase is used in an amount of 3 to 30% by mass. 12 201228995 The glass phase content of the sintered brick mainly composed of conical stone is preferably 3 to 1 〇 mass / 〇, and 4 to 10% by mass. The glass phase content of the sintered monument having zircon as a main component can be adjusted by the blending ratio of the raw material powder. The composition of the sintered brick containing zircon as a main component is preferably 3 〇 to β mass%, Zr 〇 2 is 50 to 70% by mass, and the other metal oxide is 5% by mass or less. [Fixed recess] A regular fixing recess 3 is preferably formed on the surface of the ceramic base material 1. By providing the fixing recess 3, the adhesion strength between the ceramic substrate 丨 and the metal spray film 2 can be improved. In particular, the adhesion strength with respect to the tensile stress in the direction parallel to the surface of the ceramic substrate 1 can be improved. Fig. 2 is a cross-sectional view taken along line b-B in (a) a plan view and (b) a line (a) in a plan view showing the shape of the fixing recess 3. In the fixing recessed portion 3 of this example, a plurality of straight grooves g having a rectangular cross-sectional shape in a lattice shape are provided. The side surface of each groove g is perpendicular to the surface of the ceramic substrate 且 and the groove width W is constant. In order to obtain a fixing effect effectively, the groove constituting the fixing recess 3 must have a certain depth. However, if the depth is too deep, the strength of the surface portion of the ceramic base material is lowered to make processing difficult. For example, the depth of the groove g is preferably about 50 to 350 #m, preferably about 15 〇 25 〇 / / m. The degree of dispersion of the stress generated between the metal sprayed film 2 and the ceramic substrate 1 varies depending on the groove pitch (the distance between the grooves, the distance between the center lines of the grooves of the adjacent grooves) p, in order to disperse the stress and To reduce the stress applied to one place, it is preferable to reduce the groove pitch p. Considering the stress durability of the metal spray film 2 and the strength of the porcelain substrate 1 , the groove pitch is preferably about 2,5,111,111 or less, preferably about 1.5 mm or less. In the same way, the groove width is also preferably narrower, and in terms of maintaining the strength of the surface portion of the ceramic substrate 1, it is also preferable to narrow the width of the substrate. However, if the groove width w is smaller than the particle diameter of the metal particles to be sprayed, the groove cannot be filled with the sprayed particles. Therefore, the groove width w needs to be set to be larger than the particle diameter of the sprayed particles. For example, the groove width is preferably 丨(8) above the claw, and preferably about i5 〇#m or more. In order to maintain the strength of the convex portion between the adjacent grooves g to be resistant to stress, it is necessary to ensure the width of the convex portion according to the stress (= the interval between the grooves - that is, the difference between the groove width - the groove width w). The thicker the thickness m of the metal sprayed film 2 formed on the ceramic substrate, the greater the tensile stress applied from the metal sprayed film 2 in the direction parallel to the surface of the ceramic substrate. In this regard, the width of the convex portion is preferably about 4 times or more the thickness 〇1 of the metal sprayed film 2. Further, in consideration of the narrowing of the groove pitch P, the ideal convex portion width X is about 2.5 to 5 times the thickness m of the film. The deeper the stress applied to the side of the groove g is, the deeper the depth of the groove (i.e., the larger the side surface), the more the stress may be dispersed to the entire side surface and the convex portion is hard to be broken. Therefore, the smaller the ratio (p/d) of the groove pitch p to the depth d of the groove, the higher the dispersibility of the stress, and the more easily the peeling of the metal spray film 2 is suppressed. It is preferable to calculate the p/d value for appropriately distributing the stress based on the above-described appropriate groove pitch p and the depth d of the groove, and it is preferably about 3 to 8. Further, the fixing recess is not limited to the shape shown in FIG. Regularly, a slightly cylindrical hole can also be formed regularly. When the intermittent hole is formed as the groove 3 as shown in Fig. 2
S 14 201228995 代品時,宜在正交格子(棋盤網目)的交叉位置形成孔。或赏 配置在呈千鳥狀(交錯狀:Staggered Layout)的位置上,使 孔間距距離均勻化。例如,孔間距距離以0.7〜2.5mm左右為 佳,1.0〜1.6mm左右較佳。孔直徑以2〇〇〜500# m左右為值’ 300〜400 //m較佳。孔之深度以2〇〇〜600 /zm左右為值, 300~500/zm左右較佳。 有關固定用凹部3之形成,當固定用凹部3為溝狀時, 可使用有安裝例如以磨石或鑽石刀片等構成之研削刀的斫 削機,以機械化的方式進行。或可使用雷射等高能量束戒 高壓水流進行。當固定用凹部3為孔狀時,可使用針# (pin-drill)等形態的研磨具、或雷射等高能量束或高壓水流 來進行。形成固定用凹部3之前,若預先藉由研磨機的切割 等使陶瓷基材1之表面整備呈高精度的平面,可避免預期以 外的凹凸使金屬噴覆膜2剝離之情況,故為理想。 在本發明中,固定用凹部3可任擇為溝狀或為孔狀,佴 由於孔狀可相對上地縮小以金屬喷覆膜所封閉的密閉空問 (孔内側之空間),並以—個一個孔來構成密閉空間,所以, 在因陶£基材1與金屬嘴覆膜2之界面中充填玻璃相所造成 與金屬喷覆膜2之厚度方向之拉伸力相對的密接強度之提 升效果較大之點上,謂為理想。另—方面,由於溝狀會相 對上地加大以金屬噴覆臈所封閉的密閉空間(溝内側之空In the case of the S 14 201228995 substitute, it is preferable to form a hole at the intersection of the orthogonal lattice (checker mesh). Or arranging in a position of a thousand birds (Staggered Layout) to make the hole spacing distance uniform. For example, the hole pitch distance is preferably about 0.7 to 2.5 mm, preferably about 1.0 to 1.6 mm. The diameter of the hole is preferably from about 2 〇〇 to 500 Å, and the value is from 300 to 400 //m. The depth of the hole is about 2 to 600 / zm, preferably about 300 to 500 / zm. In the formation of the fixing recess 3, when the fixing recess 3 is formed in a groove shape, it can be mechanized by using a boring machine that mounts a grinding knives such as a grindstone or a diamond blade. Or it can be carried out using a high energy beam such as a laser or a high pressure water stream. When the fixing recess 3 has a hole shape, it can be carried out using a polishing tool such as a pin-drill or a high-energy beam or a high-pressure water stream such as a laser. Before the fixing recessed portion 3 is formed, the surface of the ceramic base material 1 is prepared to have a high-precision plane by cutting by a grinder or the like, and it is preferable to prevent the metal sprayed film 2 from being peeled off by the unevenness of the outer surface. In the present invention, the fixing recess 3 may optionally be a groove shape or a hole shape, and the hole may be relatively narrowed by a hole shape to close the space enclosed by the metal spray film (the space inside the hole), and One hole is formed to form a closed space, so that the adhesion strength due to the tensile force in the thickness direction of the metal spray film 2 is increased by filling the glass phase at the interface between the base material 1 and the metal nozzle film 2 At the point where the effect is greater, it is ideal. On the other hand, because the groove shape will increase the closed space enclosed by the metal spray sputum (the inner side of the ditch)
間)’而以較大型的溝來構成密閉空間,所以,上述效果會 相對減低。 S <金屬噴覆膜> 15 201228995 金屬喷覆膜2係藉由噴覆法所形成之金屬膜。噴覆法係 將已高溫加熱之金屬教子射出至基材上,且藉由該金屬粒 子之堆積絲成被膜之n所以,金屬噴覆膜不同於藉 由炼融金屬之塗佈等的固化膜等,在别面可相粒狀堆積 結構。 ' 金屬可使用選自於由銘族金屬及以1種以上翻族金屬 為主成分之合金所構成之群組中之至少丨種金屬。 鉑族金屬例如有··鉑(Pt)、銥(Ir)、釕(Ru)、及鍺(Rh)。 以銘族金屬為主成分之合金諸如有:Pt_5%Au合金、 Pt-l〇%Ir合金、及Pt-10°/〇Rh合金等鉑合金。 <陶瓷構件的製造方法> 首先,於陶瓷基材1上形成金屬噴覆膜2。當陶瓷基材i 之表面设有固疋用凹部3時,以覆蓋該固定用凹部3的方式 形成金屬喷覆膜2。喷覆方法可適當使用雷射喷覆法、線框 嘴覆法、電聚嘴覆法、電弧噴覆法、或氫氧焰噴覆法等公 知的喷覆方法。 在喷覆法中射出的金屬粒子之粒子徑(飛行噴覆粒子 徑)以短徑者為佳,依噴覆方法之種類可減少到4〇//〇1左 右,大概在50〜150//m左右。 藉由喷覆法所射出的金屬粒子會堆積在陶瓷基材1表 面上而形成金屬喷覆膜2。當陶瓷基材丨表面有形成固定用 凹部3時,藉由喷覆法所射出的金屬粒子會充填該凹部3並 堆積於表面上而形成金屬噴覆膜2。 金屬喷覆膜2之厚度m可依噴覆量適當調整。愈厚,則The space is formed by a larger groove, so that the above effect is relatively reduced. S <Metal Spray Film> 15 201228995 The metal spray film 2 is a metal film formed by a spray coating method. In the spraying method, the metal teaching piece heated at a high temperature is emitted onto the substrate, and the deposited film of the metal particles is formed into a film n, so that the metal film is different from the cured film by coating of a molten metal or the like. Etc., on the other side, the structure can be stacked in a granular shape. The metal may be at least one selected from the group consisting of a group metal and an alloy containing one or more kinds of metal compounds as a main component. The platinum group metal is, for example, platinum (Pt), iridium (Ir), ruthenium (Ru), and rhodium (Rh). Alloys based on the alloy of the Ming family include Pt_5%Au alloy, Pt-l〇%Ir alloy, and platinum alloy such as Pt-10°/〇Rh alloy. <Manufacturing Method of Ceramic Member> First, the metal spray film 2 is formed on the ceramic base material 1. When the fixing recess 3 is provided on the surface of the ceramic substrate i, the metal spray film 2 is formed so as to cover the fixing recess 3. As the spraying method, a known spraying method such as a laser spraying method, a wire frame nozzle coating method, an electric nozzle coating method, an arc spraying method, or an oxyhydrogen flame spraying method can be suitably used. The particle diameter (flying spray particle diameter) of the metal particles emitted by the spray coating method is preferably a short diameter, and the type of the spray method can be reduced to about 4 〇//〇1 or about 50 to 150//. m or so. The metal particles emitted by the spray coating are deposited on the surface of the ceramic substrate 1 to form the metal spray film 2. When the fixing recess 3 is formed on the surface of the ceramic substrate, the metal particles emitted by the spraying method fill the recess 3 and deposit on the surface to form the metal spray film 2. The thickness m of the metal spray film 2 can be appropriately adjusted depending on the amount of spray. The thicker, then
S 16 201228995 與陶瓷基材1之表面呈平行方向的拉伸應力之應變會增 大,因此,噴覆膜2之厚度m(有凹部時,表示在沒有凹部之 部位的厚度)以丨00〜400 y m左右為佳,較理想範圍為 200〜35〇α m。 射出的金屬粒子之溫度大概在7〇〇〜i5〇〇°c左右,若預 先進行加熱(即預熱)等使施行噴覆時之陶瓷基材溫度上昇 以減少金屬粒子與陶瓷基材之溫度差,可提升金屬喷覆膜2 與陶瓷基材1之密接性,故為理想。此時,宜在已加熱(預 熱)陶曼基材1之狀態下進行喷覆後將之徐冷至常溫。 喷覆時之陶瓷基材1之溫度(預熱溫度)宜在所射出的金 屬粒子之凝固溫度以下,具體而言在200〜500°C左右,較理 想在300〜40(TC。徐冷時之降溫速度愈緩慢愈好,理想在1〇 °C/分程度以下。 接下來’在陶瓷基材1上已形成金屬喷覆膜2的狀態 下,以1500。(:以上之溫度進行熱處理。 藉由進行該熱處理,可使玻璃相從陶瓷基材丨滲出至陶 究基材1與金屬嘴覆膜2之界面之微小的空間内,而獲得該 空間中充填有玻璃相之狀態。此乃因為,一旦加熱到1500 C以上之高溫’可使陶瓷基材中之玻璃相變得易於流動, 並藉由玻璃相與陶瓷相之熱膨脹差,將該玻璃相擠壓到微 小的空間内而於該空間内濕滑擴展。 在本發明中’陶瓷基材1與金屬喷覆膜2之界面空間中 充填有玻璃相之狀態表示:在陶瓷基材1與金屬噴覆膜2之 間存有玻璃相’且該玻璃相之至少一部分與陶瓷基材丨及金 £ 17 201228995 屬噴覆臈2雙方相接之狀態。在陶瓷基材丨與金屬喷覆膜2之 界面中可殘留一些空間,但為了獲得陶瓷基材i與金屬喷覆 膜2之良好的密接強度,盡量沒有殘留該空間為佳。例如, 在熱處理後之剖面圖片中,相對於存於陶瓷基材1與金屬喷 覆膜2之界面中之空間之全面積,不存有玻璃相而殘留的空 間在20面積%以下為佳,10面積°/◦以下較佳,0面積%最佳。 —旦熱處理溫度低於1500。(:,即難以獲得以玻璃相填 滿陶究基材1與金屬喷覆膜2之界面空間的狀態。此乃是因 為玻璃相之流動狀態不足,無法在短時間内於該空間内濕 滑擴展,且因為隨時間經過陶瓷相與玻璃相會進行反應, 所以’即便增長加熱時間亦無法獲得以玻璃相填滿該空間 之狀態。 另一方面,熱處理溫度之上限必須低於構成噴覆膜2之 金屬熔點。 所以,熱處理溫度係低於喷覆膜2之熔點,宜設定為可 在後述之適當的熱處理時間内,以玻璃相填滿陶瓷基材1與 金屬喷覆膜2之界面空間。適當的熱處理溫度雖依陶瓷基材 1之成分組成等而有所不同,但以例如1500〜170(TC左右為 佳,1500〜1600°C左右較佳。只要熱處理溫度在該等範圍 内’玻璃相之流動性即南,故而陶莞相與玻璃相之反應對 以玻璃相填滿陶瓷基材1與金屬喷覆膜2之界面空間的效果 影響很低。 一旦熱處理時間過短’會在陶瓷基材1與金屬噴覆膜2 之界面内殘留諸多空間。另一方面,一旦熱處理時間增長,S 16 201228995 The strain of the tensile stress in the direction parallel to the surface of the ceramic substrate 1 is increased. Therefore, the thickness m of the sprayed film 2 (the thickness of the portion having no concave portion when there is a concave portion) is 丨00~ It is preferably about 400 ym, and the ideal range is 200 to 35 〇α m. The temperature of the emitted metal particles is about 7〇〇~i5〇〇°c. If the heating (ie, preheating) is performed in advance, the temperature of the ceramic substrate during the spraying is increased to reduce the temperature of the metal particles and the ceramic substrate. It is preferable that the adhesion between the metal spray film 2 and the ceramic substrate 1 can be improved. At this time, it is preferable to carry out the spraying under the condition of heating (preheating) the Tauman substrate 1 and then cooling it to normal temperature. The temperature (preheating temperature) of the ceramic substrate 1 at the time of spraying is preferably below the solidification temperature of the emitted metal particles, specifically, about 200 to 500 ° C, preferably 300 to 40 (TC. The cooling rate is as slow as possible, and is preferably 1 〇 ° C / min or less. Next, in a state where the metal spray film 2 has been formed on the ceramic base material 1, the heat treatment is performed at a temperature of 1500. By performing the heat treatment, the glass phase can be ooze out from the ceramic substrate to a small space in the interface between the ceramic substrate 1 and the metal nozzle film 2, and the state in which the glass phase is filled in the space can be obtained. Because, once heated to a high temperature of 1500 C or higher, the glass phase in the ceramic substrate can be easily flowed, and the glass phase is squeezed into a small space by the difference in thermal expansion between the glass phase and the ceramic phase. In the present invention, the state in which the interface space between the ceramic substrate 1 and the metal spray film 2 is filled with a glass phase means that glass is present between the ceramic substrate 1 and the metal spray film 2 Phase 'and at least a portion of the glass phase and the ceramic base Material 丨 and gold £ 17 201228995 It is a state in which both sides of the spray 臈 2 are connected. Some space may remain in the interface between the ceramic substrate 金属 and the metal spray film 2, but in order to obtain the ceramic substrate i and the metal spray film 2 The good adhesion strength is preferably not left as much as possible. For example, in the cross-sectional picture after the heat treatment, there is no relative area of the space in the interface between the ceramic substrate 1 and the metal spray film 2 The space remaining in the glass phase is preferably 20 area% or less, preferably 10 area ° / ◦ or less, and 0 area % is optimal. - The heat treatment temperature is lower than 1500. (:, it is difficult to obtain a glass phase filled with ceramics The state of the interface space between the substrate 1 and the metal spray film 2. This is because the flow state of the glass phase is insufficient, and it cannot be wet-slip in the space in a short time, and since the ceramic phase and the glass phase pass over time The reaction is carried out, so that the state in which the space is filled with the glass phase cannot be obtained even if the heating time is increased. On the other hand, the upper limit of the heat treatment temperature must be lower than the melting point of the metal constituting the spray film 2. Therefore, the heat treatment temperature is The melting point of the sprayed film 2 is preferably set so that the interface space between the ceramic substrate 1 and the metal sprayed film 2 can be filled with a glass phase in an appropriate heat treatment time to be described later. The appropriate heat treatment temperature depends on the ceramic substrate 1 The composition of the components varies, for example, but it is preferably, for example, 1500 to 170 (about TC, preferably about 1500 to 1600 ° C. As long as the heat treatment temperature is within the ranges, the flowability of the glass phase is south, and thus the The reaction of the glass phase has a low effect on the effect of filling the interface space between the ceramic substrate 1 and the metal spray film 2 with the glass phase. Once the heat treatment time is too short, it will be in the interface between the ceramic substrate 1 and the metal spray film 2. There is a lot of space left. On the other hand, once the heat treatment time increases,
S 18 201228995 边著時間經過,陶免相會與玻璃相進行反應而難以使玻璃 相擠壓到陶竟基材1與金屬嘴覆膜2之界面空間内之現象有 所進展。 ^所以’以不會產生該等問題的方式來設定熱處理時間 為宜。例如,以1〜100小時左右為佳,10〜50小時較佳。 ^依據本發明之製造方法,可製得陶瓷基材1與金屬喷覆 膜2之界面空間中充填有源自於陶瓷基材之玻璃相的本發 明之陶瓷構件。 <陶瓷構件之用途> 本I明之陶瓷構件係使用時之溫度低於1500。(:之構 17其係用於使用時之溫度預計不在1500。(:以上之部 ^因為,使用溫度在15〇(rc以上之構件中,即便未在使 石月』進仃15〇〇c以上之熱處理,結果上仍可獲得與本發明 同樣的效果’故而在該構件剌本發明之需求很低。 從上述理由’本發明之陶瓷構件以使用時之溫度在 〇c以下之構件為佳,14〇〇(5c以下之構件較佳。 由於本發明之陶瓷構件於陶瓷基材1上設有金屬喷覆 膜1 ’故而對炼融玻璃之耐蝕性優異。所以,在用於製造熔 融坡璃之裝置中’本發明之陶瓷構件可適當使用為與低於 1500C之熔融玻璃接觸的構件。又,在用於製造炫融玻璃 之裝置中’本發明之陶瓷構件較適當使用為與1450。0以下 之炫融玻璃接觸的構件,且更適當使用為與1400充以下之 炫融玻璃接觸的構件。 19 201228995 具體而言,從熔融槽流出之熔融玻璃理想係作為通過 減壓消泡裝置且在送達成形裝_置前之流路中與低於1 $〇〇。〇 之炫融玻璃接觸的構件來適當使用。又,從溶融槽流出之 熔融玻璃較理想係作為經過減壓消泡裴置且在送達成形裝 置前之流路中與1450°C以下之熔融玻璃接觸的構件來適當 使用’更理想係作為與1400°C以下之熔融玻璃接觸的構件 來適當使用。諸如:構成減壓消泡槽内壁之構件、構成設 置在減壓消泡槽上游之熔融上昇管内壁之構件、或構成設 置在減壓消泡槽下游之下降管内壁之構件。 由於本發明之陶瓷構件於陶瓷基材丨之表面上設有金 屬喷覆膜2,所以,即便與熔融玻璃接觸,仍可抑制陶竟基 材1之侵蝕。又,如後述之實施例顯示,由於陶究基材1與 金屬喷覆膜2之欲接強度優異’因此該金屬喷覆膜2難以剝 離且有良好的耐久性。 又’將本發明之陶瓷構件使用為與熔融玻璃接觸的構 件時’在陶瓷基材與金屬喷覆膜之界面空間中充填有玻璃 相的狀態下’可獲得抑制熔融玻璃中之氣泡產生的效果。 即,一旦存於熔融玻璃中之水分藉由鉑族金屬之觸媒 作用在金屬喷覆膜表面分解成氧與氫,其中氫會穿透金屬 喷覆膜但氧不會穿透金屬喷覆膜而殘留於其表面。此時, 只要氫留在金屬喷覆膜’便會與金屬喷覆膜表面之氧再度 結合而生成水,因此,氧不會變成氣泡。 然而’在習知之陶究構件中,金屬嗔覆膜與其下層之 陶曼基材之界面中存有微小的空間’所以,穿透金屬喷覆S 18 201228995 After the passage of time, the reaction of the ceramic phase with the glass phase makes it difficult to squeeze the glass phase into the interface space between the ceramic substrate 1 and the metal nozzle film 2. ^ So it is advisable to set the heat treatment time in such a way that it does not cause such problems. For example, it is preferably about 1 to 100 hours, and preferably 10 to 50 hours. According to the manufacturing method of the present invention, the ceramic member of the present invention in which the interface space between the ceramic substrate 1 and the metal sprayed film 2 is filled with the glass phase derived from the ceramic substrate can be obtained. <Use of Ceramic Member> The ceramic member of the present invention has a temperature of less than 1,500 when used. (The structure of 17 is used for the temperature when it is used. It is not expected to be 1500. (: The above part is because the use temperature is 15〇 (in the component above rc, even if it is not in the stone month) 15仃c As a result of the above heat treatment, the same effect as the present invention can be obtained. Therefore, the demand of the present invention is low in the member. From the above reasons, the ceramic member of the present invention preferably has a temperature below 〇c in use. 14〇〇 (a member having a thickness of 5 c or less is preferable. Since the ceramic member of the present invention is provided with a metal spray film 1 on the ceramic substrate 1), it is excellent in corrosion resistance to the molten glass. Therefore, it is used for manufacturing a molten slope. In the glass device, the ceramic member of the present invention can be suitably used as a member that comes into contact with molten glass of less than 1500 C. Further, in the device for producing a glazed glass, the ceramic member of the present invention is suitably used as the 1450. A member that is in contact with the glazed glass below 0, and is more suitably used as a member that is in contact with the glazed glass below 1400. 19 201228995 Specifically, the molten glass flowing out of the melting tank is desirably used as a defoaming device by decompression And in the flow path before the delivery of the forming device, the member that is in contact with the glazed glass of less than 1 〇〇 适当 is suitably used. Further, the molten glass flowing out from the melting tank is preferably used as a defoaming under reduced pressure. A member that is in contact with the molten glass of 1450 ° C or lower in the flow path before the delivery of the molding apparatus is suitably used as a member that is in contact with the molten glass of 1400 ° C or less. a member for depressing the inner wall of the bubble tank, a member constituting the inner wall of the molten riser pipe provided upstream of the decompression defoaming tank, or a member constituting the inner wall of the downcomer provided downstream of the decompression defoaming tank. The ceramic member of the present invention is ceramic Since the metal spray film 2 is provided on the surface of the substrate crucible, even if it is in contact with the molten glass, the erosion of the ceramic substrate 1 can be suppressed. Further, as will be described later, the substrate 1 and the metal are ceramics. The spray film 2 has excellent joint strength. Therefore, the metal spray film 2 is difficult to peel off and has good durability. Further, when the ceramic member of the present invention is used as a member in contact with the molten glass, the ceramic substrate is used. In the state in which the interface space of the metal spray film is filled with the glass phase, the effect of suppressing the generation of bubbles in the molten glass can be obtained. That is, once the water present in the molten glass acts on the metal spray by the catalyst of the platinum group metal The surface of the film is decomposed into oxygen and hydrogen, in which hydrogen penetrates the metal spray film but oxygen does not penetrate the metal spray film and remains on the surface. At this time, as long as hydrogen remains in the metal spray film, it will be combined with metal. The oxygen on the surface of the spray film is combined again to form water, so that oxygen does not become bubbles. However, in the conventional ceramic member, there is a small space in the interface between the metal tantalum coating and the underlying Tauman substrate. Penetrating metal spray
S 20 201228995 膜之氫會透過該空間進行移動而使氫無法留在金屬喷覆 膜因此,金屬喷覆膜表面之氧無法再度與氫結合而變成 氣泡。 由於本發明之陶究構件在該金屬喷覆膜與陶究基材之 界面空間t充填有麵相,因此氫可留在金屬喷覆膜與氧 再度結合而生成水。_,可防止氧變錢泡。、 <熔融玻璃的製造裝置> 本發明之炼融玻璃之製造裝置係在與低於boot之炼 融玻璃接觸的構件㈣本發明之喊構件者。X,本發明 之熔融玻璃的製造裝置宜在與14贼以下找融玻璃接觸 的構件使用本發明之喊構件,且更宜在與i彻。C以下之 熔融玻璃接觸的構件使用本發明之陶瓷構件。 又,本發明之熔融玻璃的製造裝置係使用由含有3〜30 質量%玻璃相且以電鑄碑或錯石為主成分之燒結碑所構成 之陶瓷基材,來構成與熔融玻璃之製造裝置中低於1500π 相接部分之至少-部分,並在测t以上之溫度下將前述 熔融玻璃的製造裝置之至少前述陶瓷基材進行熱處理而 成,則述陶瓷基材形成金屬噴覆膜,且該金屬噴覆膜係選 自於由鉑族金屬及以i種以上鉑族金屬為主成分之合金所 構成之群組中之至少1種金屬的喷覆膜。 此外,本發明之熔融玻璃的製造裝置係使用含有3〜30 質量。/。玻璃相且以電鑄磚或鍅石為主成分之燒結磚所構成 之陶曼基材’來構成溶融玻璃之製造裝置中與低於15〇〇°c 21 201228995 一理想在1450°C以下且較理想在1400t以下—的熔融玻璃 相接部分之至少一部分,並於該構成之部分之陶瓷基材上 形成金屬喷覆膜,接下來,在1500。(:以上之溫度下,使熔 融玻璃的製造裝置中之至少形成有前述金屬喷覆膜之陶瓷 基材進行熱處理而成;前述金屬噴覆膜係選自於由鉑族金 屬及以1種以上鉑族金屬為主成分之合金所構成之群組中 之至少1種金屬的喷覆膜。 第3圖係顯示本發明之熔融玻璃的製造裝置之一實施 形態之縱剖面圖。本實施形態之裝置係由下列元件而概略 構成’即:熔融槽U,進行玻璃原料熔解以及熔融玻璃之 均質化及澄清;減壓消泡裝置12,將内部氣壓設為低於大 氣壓並使從炼融槽11所供給的溶融玻璃中之泡洙浮上及破 泡;第1導管13,連接熔融槽11與減壓消泡裝置12 ;及第2 導管14,用以使從減壓消泡裝置12流出的熔融玻璃,透過 冷卻槽15送至下-步驟的成形機構。圖中符號G表示溶融玻 璃。 於第1導管U設有冷卻機構na及授拌機構nb,從熔融 槽11流出的熔融玻璃在第i導管13冷卻到1〇〇〇。匸以上且低 於l5〇〇C之後,係導入至減壓消泡裝置12。 減壓/肖/包裝置12具備有減壓消泡槽12a,減壓消泡槽 12a之上游側係透過上昇管12b與第〖導管13連通,減壓消泡 槽12a之下游側係透過下降管…與第2導管M連通。減壓消 泡槽12a、上昇管12b'與下降管12e之内部係維持在減壓環 境,乃藉由虹吸效應透過上昇管12b將第丨導管13内之熔融S 20 201228995 The hydrogen in the membrane moves through this space, so that hydrogen cannot remain in the metal spray film. Therefore, the oxygen on the surface of the metal spray film cannot be combined with hydrogen to become bubbles. Since the ceramic member of the present invention is filled with a surface phase in the interface space t between the metal spray film and the ceramic substrate, hydrogen can remain in the metal spray film and recombine with oxygen to form water. _, can prevent oxygen from changing. <Manufacturing Apparatus of Molten Glass> The apparatus for producing a smelting glass of the present invention is a member (four) in contact with a refining glass lower than the boot. X. The apparatus for producing molten glass of the present invention is preferably used in a member which is in contact with a molten glass under 14 thieves, and is more preferably used. The member in contact with the molten glass below C uses the ceramic member of the present invention. Further, the apparatus for producing molten glass of the present invention comprises a ceramic base material comprising a sintered monument having a glass phase of 3 to 30% by mass and electroforming a monument or a streak as a main component, and is configured to manufacture a molten glass. At least a portion of the 1500 π junction portion, and at least the ceramic substrate of the apparatus for manufacturing the molten glass is heat-treated at a temperature of t or higher, wherein the ceramic substrate forms a metal spray film, and The metal spray film is selected from the group consisting of a spray film of at least one metal selected from the group consisting of a platinum group metal and an alloy containing one or more platinum group metals. Further, the apparatus for producing molten glass of the present invention contains 3 to 30 masses. /. The glass-phase and the Tauman substrate composed of the electro-cast brick or vermiculite-based sintered bricks constitute a device for melting glass and is preferably less than 15 °C 21 201228995, preferably below 1450 ° C. At least a part of the molten glass contact portion of 1400 t or less, and a metal spray film is formed on the ceramic substrate of the structure, and then at 1500. (The above-mentioned metal sprayed film is selected from the group consisting of a platinum group metal and one or more kinds of the ceramic base material in which the molten metal is produced in the apparatus for producing molten glass; A sprayed film of at least one metal selected from the group consisting of alloys containing a platinum group metal as a main component. Fig. 3 is a longitudinal cross-sectional view showing an embodiment of a device for producing molten glass of the present invention. The apparatus is roughly configured by the following elements: that is, the melting tank U, the glass raw material is melted, and the molten glass is homogenized and clarified; and the vacuum defoaming device 12 sets the internal air pressure to be lower than atmospheric pressure and from the refining tank 11 The bubble in the supplied molten glass floats and breaks; the first conduit 13 connects the melting tank 11 and the vacuum defoaming device 12; and the second conduit 14 serves to melt the molten material from the vacuum defoaming device 12. The glass is sent to the forming mechanism of the lower step through the cooling bath 15. The symbol G in the figure indicates the molten glass. The first duct U is provided with the cooling mechanism na and the feeding mechanism nb, and the molten glass flowing out of the melting tank 11 is at the i-th. Conduit 13 cooling 1〇〇〇. 匸 above and below l5〇〇C, it is introduced into the vacuum defoaming device 12. The decompression/shaw/package device 12 is provided with a decompression defoaming tank 12a, and a decompression defoaming tank 12a. The upstream side communicates with the conduit 13 through the riser 12b, and the downstream side of the depressurization defoaming tank 12a passes through the downcomer to communicate with the second conduit M. The decompression defoaming tank 12a, the riser 12b' and the downcomer 12e The internal system is maintained in a reduced pressure environment, and the inside of the second conduit 13 is melted through the riser 12b by the siphon effect.
S 22 201228995 玻肖及往減壓消泡槽12a内所構成。又’導管14以後的部分 係透過冷· 15而連接至成形機構。 在本實施形態之裝置中,構成減壓消泡裝置12之減壓 消泡槽12a、上昇管12b、下降管12c、及冷卻槽15之内壁的 構件,係由將本發明之陶瓷構件或形成有金屬喷覆膜之陶 瓷基材進行熱處理而成者所構成。即,減壓消泡槽12a、上 昇管12b、下降管12c、及冷卻槽15之内壁係由内面已以金 屬喷覆膜被覆之陶瓷基材所構成,且於陶瓷基材與金屬噴 覆膜之界面之微小空間中充填有玻璃相。 該減壓消泡裝置12及冷卻槽15係以下列方法製造, 即:首先,以預先已以金屬噴覆膜被覆之陶瓷基材形成減 壓消泡槽12a、上昇管12b、下降管12c、及冷卻槽15之内壁, 並組裝成從減壓消泡裝置12到冷卻槽15的一連串形狀後, 以1500 C以上之預定溫度對包含減壓消泡裝置12及冷卻槽 15之一連串構造物的内部施行熱處理後,冷卻到使用溫度 以下。又,亦可藉由本發明之陶瓷構件來形成減壓消泡槽 12a、上昇管12b、下降管12c、及冷卻槽15之内壁,再組裝 成從減壓消泡裝置12到冷卻槽15的一連串形狀。又,亦可 以陶瓷基材來形成減壓消泡槽12a、上昇管12b、下降管 12c、及冷卻槽15之内壁後,於與該等基材之熔融玻璃相接 側之表面形成金屬喷覆膜’然後以1500。(:以上之溫度將形 成有前述金屬噴覆膜之陶瓷基材進行熱處理。 如上述方法製造裝置後,以低於1500°C之使用溫度使 用。又,以如上述方法來製造裝置後,宜以1450。(:以下的 23 201228995 使用溫度進行使用,更宜以14〇〇°C以下的使用溫度進行使 用0 而,各部之組裝順序或使用本發明之陶瓷構件之部位 並不受限於上述例。例如,由於冷卻槽15中之溶融玻璃溫 度低於其上游部,所以,亦可為僅將使用本發明之陶竞構 件之部位設為減壓消泡裝置12而不使用冷卻槽15之構成。 或,亦可為將減壓消泡裝置12中使用本發明之陶免構件的 部位設為僅減壓消泡槽12a、或僅上昇管12b與下降管12c、 或僅下降管12c。又,亦可在第1導管13與第2導管14之内壁 使用本發明之陶瓷構件。 <熔融玻璃的製造方法> 本發明之熔融玻璃的製造方法係在與低於15〇〇。(:之熔 融玻璃接觸的構件’使用採用本發明之陶瓷構件的製造裝 置來製造熔融玻璃之方法。又’本發明之溶融玻璃的製造 方法係宜在與1450°C以下之熔融玻璃接觸的構件使用採用 本發明之陶瓷構件的製造裝置來製造熔融玻璃之方法。此 外’本發明之熔融玻璃的製造方法係較宜在與14〇〇〇c以下 之炫融玻璃接觸的構件使用採用本發明之陶瓷構件的製造 裝置來製造溶融玻璃之方法。 例如’在使用第3圖中顯示之熔融玻璃的製造裝置來製 造熔融玻璃之方法中,從熔融槽u流出的熔融玻璃係在第1 導官13中冷卻至1〇〇〇 C以上且低於15〇〇〇c之後 ,再導入減 壓/肖泡裝置12中。又’從炫融槽㈣出的㈣玻璃宜在第i 導官13中冷卻至1GGG°C以上且145(Γ(:α下之後,再導入減S 22 201228995 Boseshaw and the inside of the decompression defoaming tank 12a. Further, the portion after the conduit 14 is connected to the forming mechanism through the cold 15 . In the apparatus of the present embodiment, the members of the vacuum degassing tank 12a, the riser 12b, the downcomer 12c, and the inner wall of the cooling tank 15 constituting the vacuum defoaming device 12 are formed of the ceramic member of the present invention. A ceramic substrate having a metal spray film is formed by heat treatment. That is, the inner walls of the depressurization defoaming tank 12a, the riser 12b, the downcomer 12c, and the cooling tank 15 are composed of a ceramic base material whose inner surface has been coated with a metal spray coating, and are used for the ceramic base material and the metal sprayed film. The tiny space of the interface is filled with a glass phase. The vacuum defoaming device 12 and the cooling bath 15 are manufactured by first forming a vacuum degassing tank 12a, a riser 12b, a downcomer 12c, and a ceramic base material coated with a metal spray coating in advance. And the inner wall of the cooling tank 15 is assembled into a series of shapes from the decompression defoaming device 12 to the cooling tank 15, and then a series of structures including the decompression defoaming device 12 and the cooling tank 15 are connected at a predetermined temperature of 1500 C or higher. After the internal heat treatment, it is cooled to below the use temperature. Further, the decompression defoaming tank 12a, the riser 12b, the downcomer 12c, and the inner wall of the cooling tank 15 can be formed by the ceramic member of the present invention, and can be assembled into a series from the decompression defoaming device 12 to the cooling tank 15. shape. Further, after the vacuum degassing tank 12a, the riser 12b, the downcomer 12c, and the inner wall of the cooling bath 15 are formed by the ceramic base material, a metal spray may be formed on the surface on the side in contact with the molten glass of the base material. The membrane ' then takes 1500. (The above temperature is to heat-treat the ceramic substrate on which the metal sprayed film is formed. After the apparatus is manufactured by the above method, it is used at a use temperature lower than 1500 ° C. Further, after the apparatus is manufactured as described above, It is used at a temperature of 1450. (the following 23 201228995 is used, and it is more preferable to use 0 at a use temperature of 14 ° C or less, and the assembly order of each part or the part using the ceramic member of the present invention is not limited to the above. For example, since the temperature of the molten glass in the cooling bath 15 is lower than the upstream portion, it is also possible to use only the portion using the ceramic component of the present invention as the vacuum defoaming device 12 without using the cooling tank 15 Alternatively, the portion of the vacuum defoaming device 12 to which the ceramic member of the present invention is used may be a reduced pressure defoaming tank 12a, or only the riser 12b and the downcomer 12c, or only the downcomer 12c. Further, the ceramic member of the present invention may be used for the inner walls of the first duct 13 and the second duct 14. <Method for Producing Molten Glass> The method for producing the molten glass of the present invention is less than 15 〇〇. : molten glass The member to be contacted 'is a method of manufacturing a molten glass using the manufacturing apparatus of the ceramic member of the present invention. Further, the method for producing the molten glass of the present invention is preferably a member that is in contact with molten glass of 1450 ° C or less. A method of manufacturing a molten glass by a manufacturing apparatus of a ceramic member. Further, the method for producing a molten glass of the present invention is preferably a manufacturing apparatus using the ceramic member of the present invention for a member that is in contact with a glazing glass of 14 〇〇〇c or less. For example, in the method of producing molten glass using the apparatus for producing molten glass shown in Fig. 3, the molten glass flowing out of the melting tank u is cooled to 1 in the first guide 13 After 〇〇C or more and less than 15〇〇〇c, it is introduced into the decompression/short bubble device 12. Further, the (four) glass from the smelting tank (4) should be cooled to 1GGG °C or higher in the i-th guide 13 And 145 (Γ (: after α, then import and subtract
S 24 201228995 壓消泡裝置12中。此外,從炫融槽11流出的炫融玻璃較宜 在第1導管13中冷卻至l〇〇0°C以上且1400°C以下之後,再導 入減壓消泡裝置12中。 由於減壓消泡裝置12之減壓消泡槽12a、上昇管12b、 下降管12c、及冷卻槽15之内壁與i〇〇〇〇c以上且低於15〇〇°c 之溶融玻璃接觸,且構成該内壁之陶瓷基材的表面(即内面) 係以金屬喷覆膜所被覆,因此對炫融玻璃之耐触性優異。 又’由於陶瓷基材與金屬喷覆膜之密接強度優異,因此該 喷覆膜難以剝離且具有良好的耐久性。 此外,由於金屬喷覆膜與其下層之陶瓷基材之界面中 充填有玻璃相,因此即便玻璃中之水分在金屬喷覆膜表面 分解成氧與氫,亦可使該氫留在金屬喷覆膜。所以,如上 述,該氫可與在水分分解中所生成之氧再度結合而生成 水’進而可抑制起因於該氧在熔融玻璃中產生氣泡的現象。 <玻璃物品的製造裝置及製造方法> 本發明之玻璃物品的製造裝置係具有:用以製造熔融 玻璃之機構;使所得熔融玻璃成形之成形機構;及,使成 形後之玻璃徐冷之徐冷機構;且在與低於1500°C2熔融玻 璃接觸的構件使用本發明之陶瓷構件者。又,本發明之玻 璃物品的製造裝置具有:用以製造熔融玻璃之機構;使所 得熔融玻璃成形之成形機構;及,使成形後之玻璃徐冷之 徐冷機構;且宜在與1450°C以下之溶融玻璃接觸的構件使 用本發明之陶瓷構件。此外,本發明之玻璃物品的製造裝 置具有:用以製造熔融玻璃之機構;使所得熔融玻璃成形S 24 201228995 Pressure defoaming device 12. Further, it is preferable that the glazed glass that has flowed out of the smelting tank 11 is cooled to 10 ° C or more and 1400 ° C or less in the first duct 13 and then introduced into the vacuum defoaming device 12 . Since the decompression defoaming tank 12a, the riser 12b, the downcomer 12c, and the inner wall of the cooling tank 15 of the vacuum defoaming device 12 are in contact with the molten glass of i〇〇〇〇c or more and less than 15〇〇°c, Further, since the surface (i.e., the inner surface) of the ceramic base material constituting the inner wall is covered with the metal spray film, it is excellent in the contact resistance to the glazed glass. Further, since the ceramic substrate and the metal spray film have excellent adhesion strength, the spray film is difficult to peel off and has excellent durability. In addition, since the interface between the metal spray film and the underlying ceramic substrate is filled with a glass phase, even if the moisture in the glass is decomposed into oxygen and hydrogen on the surface of the metal spray film, the hydrogen can be left on the metal spray film. . Therefore, as described above, the hydrogen can be recombined with the oxygen generated in the decomposition of water to form water, and the phenomenon in which bubbles are generated in the molten glass due to the oxygen can be suppressed. <Production Apparatus and Manufacturing Method of Glass Article> The apparatus for producing a glass article of the present invention includes: a mechanism for producing molten glass; a molding mechanism for molding the obtained molten glass; and cooling the formed glass The refrigerant element of the present invention is used in a member that is in contact with the molten glass below 1500 ° C. Further, the apparatus for producing a glass article of the present invention comprises: a mechanism for producing molten glass; a forming mechanism for forming the obtained molten glass; and a cold-cooling mechanism for cooling the formed glass; and preferably at 1450 ° C The following members in contact with the molten glass use the ceramic member of the present invention. Further, the manufacturing apparatus of the glass article of the present invention has: a mechanism for manufacturing molten glass; forming the obtained molten glass
S 25 201228995 之成形機構;及,使成形後之玻璃徐冷之徐冷機構;且較 宜在與1400。〇以下之熔融玻璃接觸的構件使用本發明之陶 曼構件。 用以製造熔融玻璃之機構宜為本發明之熔融玻璃的製 造裝置。例如,可如第3圖顯示之構成,即:於熔融玻璃的 製造裝置之溶融玻璃的流動方向之下游具有成形熔融玻璃 的成形機構,並在其下游具有使成形後之玻璃徐冷的徐冷 機構。於徐冷機構之下游還可設置進行切斷或研磨的加工 機構。雖無圖示成形機構,但可利用公知之浮製玻板法' 溢流向下抽出法、及熔融法等各種機構。徐冷機構及加工 機構亦可利用公知技術。 第4圖係顯示使用本發明之玻璃物品的製造裝置的玻 璃物品的製造方法之一例之流程圖。 依照第4圖顯示之方法,玻璃物品之製造理想係藉由第 3圖之使用熔融玻璃製造裝置之玻璃熔融步驟si來獲得熔 融玻璃G,然後經過將熔融玻璃G送往成形機構並成形為目 的之形狀的成形步驟S2後’以徐冷步驟S3進行徐冷。之後, 可視需求在後加工步驟%中’以切斷或研磨等後加工來製 得玻璃物品G5 ° 實施例 以下使用實施例來進一步詳細說明本發明,惟,本發 明非受限於該等實施例者。 [實施例1] 本例中’係使用AZS(Al2〇3_Si〇2-Zr〇2)碑作為陶瓷基 26 201228995 材,並如下述將該磚之表面施行具有規則性之配置的孔力 工後,進行金屬喷覆而製得附金屬膜之基材,再於該附金 屬膜之基材施加熱處理來製造陶瓷構件。以下,於該陶t 基材之表面形成有金屬噴覆膜之基材亦稱為附金屬膜之茂 材。 於表1中顯示以X射線螢光分析法測定所使用之陶竟烏 材之成分組成的結果。又,將基於熱處理前之附金屬膜之 基材之剖面圖片所求算的玻璃相之含量,合併顯示於表1中 (以下’在實施例2及比較例1中亦同)。玻璃相含量之算出係 以下述方法進行。使用電子顯微鏡在熱處理前之附金屬膜 之基材剖面,從基材表面起朝基材内部20mm之位置為止之 間,拍攝50倍的電子顯微鏡之反射電子像(組成像)。就所得 之圖像求算結晶相與玻璃相之面積合計,再求算出相對於 其之玻璃相之面積率’並將把該面積率換算成質量率而得 之值作為玻璃相之含量(單位:質量%)。 首先’將AZS碑切成長50mmx寬50mmx高10mm之碑 片’再使用光纖雷射於該碑片之50mmx50mm之一面形成固 定用凹部。固定用凹部係略呈圓柱狀之孔,孔直徑為300//m, 孔之深度為400 // m,且孔間距之距離為1 mm。 接下來,在大氣環境中將磚片加熱至300°C,並使用線 框噴覆法於形成有孔之面上開始鉑之喷覆(飛行喷覆粒子 把:100/zm左右,且溫度約1〇〇°〇。持續喷覆直到鉑被膜. 之膜厚成為300;czm之後,再將磚片徐冷至常溫,以製得附 金屬膜之基材。 27 201228995 以同樣的條件製作2片附金屬膜之基材,並在大氣下藉 由電爐對其中一方之附金屬膜之基材以1500°C施加1〇〇小 時的熱處理,以製得陶瓷構件。 又,作為對照,則未對另一方之附金屬膜之基材施加 熱處理而直接作為未處理試樣。 [實施例2] 除了將實施例1中陶瓷基材變更為高氧化锆質磚以 外,以同樣的方式製得附金屬膜之基材,並對該附金屬膜 之基材施行與實施例1同樣的熱處理以製造陶瓷構件。又, 作為對照,與實施例1同樣地製作未施加熱處理之未處理試 樣。 [比較例1] 除了將實施例1中陶瓷基材變更為α /3氧化鋁質磚以 外,以同樣的方式製得附金屬膜之基材,並對該附金屬膜 之基材施行與實施例1同樣的熱處理以製造陶瓷構件。又, 作為對照,與實施例1同樣地製作未施加熱處理之未處理試 樣0 表1 陶瓷基材 成分組成(質量%) 玻璃相之含量 (質量%) Si02 Zr02 Al2〇3 Na20 實施例1 AZS磚 12.0 41.0 45.8 0.4 17 實施例2 高氧化锆質磚 4.0 94.5 0.8 1.0 6 比較例1 a泠氧化鋁質磚 0.8 0.0 95.0 3.5 1 [評估方法] (密接強度)The forming mechanism of S 25 201228995; and the cold-cooling mechanism for cooling the formed glass; and preferably at 1400. The member in contact with the molten glass below uses the ceramic member of the present invention. The mechanism for producing molten glass is preferably the manufacturing apparatus of the molten glass of the present invention. For example, it can be configured as shown in Fig. 3, that is, a molding mechanism for forming molten glass downstream of the flow direction of the molten glass of the apparatus for manufacturing molten glass, and having a cooling mechanism for cooling the formed glass downstream thereof. mechanism. A processing mechanism for cutting or grinding may be provided downstream of the Xu cold mechanism. Although there is no such formation mechanism, various mechanisms such as a known floating glass method, an overflow down extraction method, and a melting method can be used. Xu Leng institutions and processing organizations can also use well-known technologies. Fig. 4 is a flow chart showing an example of a method for producing a glass article using the apparatus for producing a glass article of the present invention. According to the method shown in Fig. 4, the glass article is preferably produced by obtaining the molten glass G by the glass melting step si of the molten glass manufacturing apparatus of Fig. 3, and then passing the molten glass G to the forming mechanism and forming it. After the forming step S2 of the shape, the cooling is performed by the cold cooling step S3. Thereafter, the glass article G5 is obtained by post-processing such as cutting or grinding in the post-processing step % as an embodiment. The present invention will be further described in detail below using examples, but the invention is not limited by the implementation. For example. [Example 1] In this example, the AZS (Al2〇3_Si〇2-Zr〇2) monument was used as the ceramic base 26 201228995, and the surface of the brick was subjected to a regular configuration as follows. A metal film is sprayed to obtain a substrate with a metal film, and a heat treatment is applied to the substrate of the metal film to produce a ceramic member. Hereinafter, a substrate on which a metal sprayed film is formed on the surface of the ceramic substrate is also referred to as a metal film-attached material. Table 1 shows the results of measuring the composition of the ceramics used in the ceramics by X-ray fluorescence analysis. Further, the content of the glass phase calculated based on the cross-sectional image of the base material to which the metal film was attached before the heat treatment was collectively shown in Table 1 (hereinafter, the same applies to Example 2 and Comparative Example 1). The calculation of the glass phase content was carried out in the following manner. The electron beam microscope was used to take a 50-fold reflection electron image (composition image) of an electron microscope from the surface of the substrate to a position of 20 mm from the surface of the substrate before the heat treatment. Calculate the total area of the crystal phase and the glass phase in the obtained image, calculate the area ratio of the glass phase relative to the image, and convert the area ratio into a mass ratio to obtain the content of the glass phase (unit). :quality%). First, the AZS monument was cut into a 50 mm x 50 mm x 10 mm high monument. Then, a fiber laser was used to form a fixing recess on one of the 50 mm x 50 mm faces of the tablet. The fixing recess is a slightly cylindrical hole having a hole diameter of 300 / / m, a hole depth of 400 / m, and a hole pitch of 1 mm. Next, the tile is heated to 300 ° C in an atmospheric environment, and the spray of platinum is started on the surface on which the hole is formed by the wire frame spraying method (the flying sprayed particle is about 100/zm, and the temperature is about 1〇〇°〇. Continue to spray until the platinum film. The film thickness becomes 300; after czm, the tile is cooled to room temperature to obtain a substrate with a metal film. 27 201228995 Two pieces are produced under the same conditions. The base material of the metal film was attached, and the base material of the metal film attached to one of the substrates was heat-treated at 1500 ° C for 1 hour in an electric furnace to obtain a ceramic member. The base material of the other metal film was directly subjected to heat treatment as an untreated sample. [Example 2] A metal was obtained in the same manner except that the ceramic substrate of Example 1 was changed to a high zirconia brick. The substrate of the film was subjected to the same heat treatment as in Example 1 to produce a ceramic member. Further, as a control, an untreated sample to which no heat treatment was applied was produced in the same manner as in Example 1. Example 1] In addition to the ceramic substrate of Example 1. A substrate with a metal film was prepared in the same manner except for the α/3 alumina brick, and the substrate of the metal film was subjected to the same heat treatment as in Example 1 to produce a ceramic member. An untreated sample 0 to which no heat treatment was applied was produced in the same manner as in Example 1. Table 1 Composition of ceramic substrate (% by mass) Content of glass phase (% by mass) Si02 Zr02 Al2〇3 Na20 Example 1 AZS brick 12.0 41.0 45.8 0.4 17 Example 2 High zirconia brick 4.0 94.5 0.8 1.0 6 Comparative example 1 a 泠 alumina brick 0.8 0.0 95.0 3.5 1 [Evaluation method] (bonding strength)
S 28 201228995 從在各例中所得之陶瓷構件及未處理試樣之各個試樣 分別切出各3個長I4mmx寬14mmx高l〇mm之板狀片,並如 第5圖顯示,於14mmxl4mm之兩面分別使用熱硬化型環氧 黏著劑23黏著拉伸夾具24、25來製作試驗片。圖中符號21 表示陶瓷基材,22表示金屬喷覆膜。 使用拉伸強度測定器(TSE杜製、產品名: AUTOCOM/AC · 50KN-C),在〇·5_/分之速度條件下將拉 伸夹具24、25朝彼此遠離之方向拉伸,以測定陶瓷基材 與金屬噴覆膜22剝離時之荷重。從剝離時之荷重值(ρ)與板 狀片(陶瓷構件)之面積(S)求算密接強度(P/s,單位為 MPa)。其結果顯示於第6圖中。 如第6圖之結果顯示,在比較例丨中,未處理試樣與陶 曼構件之岔接強度大致相同。相對地,實施例1、2中之陶 曼構件之密接強度係在未處理試樣之密接強度的3倍以 上,由此可確認:藉由實施熱處理,有大幅提升密接強度。 (剖面組織) 在各例中分別拍攝在製造陶瓷構件時進行熱處理之前 之附金屬膜之基材、及將其進行熱處理後之陶瓷構件之剖 面圖片。第7圖係在實施例1所得之圖片,第8圖係在實施例 2所得之圖片’第9圖係在比較例1所得之圖片。符號21表示 陶瓷基材,22表示金屬喷覆膜。 在第7圖中’(a)為熱處理前之剖面圖片,(15)為熱處理 後之剖面圖片,(a’)係在(a)之圖片中將破璃相予以映射顯示 者’(b )係在(b)之圖片中將玻璃相予以映射顯示者。 I·* 29 201228995 在第8圖與第9圖中,(a)係熱處理前夂刮面圖片,, 熱處理後之剖面圖片,(b,)係擴大顯示(b)之歸口 ’、 片之 Φ Ml ϋβ J^r (圖中以符號B表示)者。 ° 之附金屬膜之 面存有微小的 如第7圖〜第9圖之(a)中顯示,在熱處硬前 基材中,於陶瓷基材21與金屬喷覆膜22之界 間隙(空間)。另一方面’如第7圖與第8圖之(b)中顯示在 實施例1 ' 2之減理後之㈣構件巾,於H基材21與金 屬喷覆膜22之界面沒有間隙’又,如第7圖與第8圖之化,) 中顯示’沿著該界面中存有玻璃相。 相對地,如第9圖之(b)中顯示,在比較例丨之熱處理後 之陶瓷構件中’於陶瓷基材21與金屬噴覆骐22之界面存有 間隙,又,如第9圖之(b’)中顯示,未發現破璃相往該界面 之滲出。 [實施例3] 本例中,以下述的方式製作由陶瓷構件所構成之玻璃 炼融用的容器來作為熔融玻璃的製造裝置,並在該容器内 以1400°C的溫度使玻璃原料熔融後加以冷卻。然後,藉由 後述之評估方法,調查在容器内壁附近的玻璃中之水分含 量與氣泡之有無。 首先’使用由與實施例2中所用者相同材質的高氧化锆 質碑所構成、且與實施例1同樣於其中一面設有固定用凹部 之陶竞基材,來製作外徑75mm、外壁高度55mm、内徑 50mm、且内壁深度40mm的有底圓筒狀容器。將設有固定 用凹部之面作為内面。S 28 201228995 Each of the ceramic members obtained in each of the examples and the untreated samples were each cut into three plate-shaped pieces each having a length of I4 mm x a width of 14 mm x a height of 10 mm, and as shown in Fig. 5, at 14 mm x 14 mm A test piece was produced by adhering the stretching jigs 24 and 25 to the both surfaces with a thermosetting epoxy adhesive 23, respectively. In the figure, reference numeral 21 denotes a ceramic substrate, and 22 denotes a metal spray film. Using a tensile strength tester (TSE DuPont, product name: AUTOCOM/AC · 50KN-C), the stretching jigs 24, 25 are stretched away from each other at a speed of _·5 _ / min to determine The load when the ceramic substrate and the metal spray film 22 are peeled off. The adhesion strength (P/s, in MPa) was calculated from the load value (ρ) at the time of peeling and the area (S) of the plate piece (ceramic member). The result is shown in Fig. 6. As shown in the results of Fig. 6, in the comparative example, the splicing strength of the untreated sample and the Tauman member was substantially the same. On the other hand, the adhesion strength of the Tauman members in Examples 1 and 2 was three times or more the adhesion strength of the untreated sample, and it was confirmed that the adhesion strength was greatly improved by the heat treatment. (Sectional Structure) In each of the examples, a base material of a metal film to be attached before the heat treatment at the time of manufacturing the ceramic member, and a cross-sectional view of the ceramic member after heat treatment were taken. Fig. 7 is a picture obtained in the first embodiment, and Fig. 8 is a picture obtained in the second embodiment. Fig. 9 is a picture obtained in Comparative Example 1. Reference numeral 21 denotes a ceramic substrate, and 22 denotes a metal spray film. In Fig. 7, '(a) is a cross-sectional picture before heat treatment, (15) is a cross-sectional picture after heat treatment, and (a') is a map showing the broken glass in the picture of (a)' (b) The glass phase is mapped to the display in the picture of (b). I·* 29 201228995 In Fig. 8 and Fig. 9, (a) is a picture of the scraped surface before heat treatment, and a picture of the cross section after heat treatment, (b,) is an enlarged display of (b) Ml ϋβ J^r (indicated by symbol B in the figure). The surface of the attached metal film is minute. As shown in (a) of Fig. 7 to Fig. 9, in the hard front substrate, the boundary between the ceramic substrate 21 and the metal spray film 22 is space). On the other hand, as shown in Fig. 7 and Fig. 8(b), the (4) member towel after the reduction of the embodiment 1 '2 has no gap at the interface between the H substrate 21 and the metal spray film 22. As shown in Figures 7 and 8, it shows that there is a glass phase along the interface. In contrast, as shown in FIG. 9(b), in the ceramic member after the heat treatment of the comparative example, there is a gap between the ceramic substrate 21 and the metal sprayed crucible 22, and as shown in FIG. It is shown in (b') that no bleeding of the broken glass phase to the interface was observed. [Example 3] In this example, a container for glass refining composed of a ceramic member was produced as a device for producing molten glass, and the glass raw material was melted at a temperature of 1400 ° C in the container. Cool it down. Then, the amount of moisture in the glass near the inner wall of the container and the presence or absence of bubbles were investigated by the evaluation method described later. First, 'the outer diameter of 75 mm and the outer wall height of 55 mm were produced by using a high-zirconia tablet of the same material as that used in Example 2 and having a fixing recess on one side as in the first embodiment. A bottomed cylindrical container having an inner diameter of 50 mm and an inner wall depth of 40 mm. The surface provided with the fixing recess is used as the inner surface.
S 30 201228995 接下來,在大氣環去兄中將s亥容器加熱至3〇〇°c,並以與 實施例1同樣的方式於内面上形成膜厚為300// 111之金屬喷 覆膜,以製得由附金屬膜之基材所構成之容器。 再來,在大氣下將遠谷器放入電爐内並以16〇〇。〇施行5 小時的熱處理,以製得由陶瓷構件所構成之容器。 在上述實施例3之實施中,將所製得之容器放入加熱爐 内,並在常壓下施加第1〇圖令顯示之熱歷程。第1〇圖之縱 軸表示加熱爐内之環境溫度。首先,以4小時4〇分鐘的時間 從常溫歼溫至1400 C ’並在達到14〇〇它之時間點將硼石夕酸 玻璃之玻璃原料投入容器内,然後以l40(rc加熱丨小時使玻 璃原料溶融。之後急速冷卻至72(TC並以72〇χ:保持1小時 後,以2小時的時間降溫至60(TC,然後再以3小時的時間徐 冷至常溫而在容益内製得已固化之破璃。 [比較例2] 除了未對實施例3中由附金屬膜之基材所構成之容器 施行熱處理以外,以與實施例3同樣的方式在容器㈣得^ 固化之玻璃。 f L比較例3] 除了將實施例3中陶竟基材之材質從高氧化錯 更為與比較例丨中所用者㈣之α錢化㈣如外父 實施例3同樣的方式製得由附金屬膜之基材所’ Μ 器’並對該容器施行與實施例3同樣的熱處理 之容 構件所構成之容器。 乍由陶瓷 使用該容器’以與實施例3同樣的方式在容器S 30 201228995 Next, the sHai container was heated to 3 ° C in an atmosphere ring, and a metal spray film having a film thickness of 300 / / 111 was formed on the inner surface in the same manner as in the first embodiment. A container composed of a substrate with a metal film is prepared. Then, put the far-field device into the electric furnace under the atmosphere and take 16 〇〇. The heat treatment was carried out for 5 hours to obtain a container composed of a ceramic member. In the practice of the above-mentioned Embodiment 3, the obtained container was placed in a heating furnace, and the heat history shown by the first command was applied under normal pressure. The vertical axis of Fig. 1 indicates the ambient temperature in the furnace. First, put the glass material of borax acid glass into the container at a temperature of 4 hours and 4 minutes from normal temperature to 1400 C ', and then at 14:00, and then heat the glass with l40 (rc heating for hrs). The raw material was melted. After that, it was rapidly cooled to 72 (TC and 72 〇χ: after 1 hour, it was cooled to 60 (TC in 2 hours), then cooled to room temperature for 3 hours and then made in the volume. [Comparative Example 2] A glass which was cured in a container (4) was obtained in the same manner as in Example 3 except that the container composed of the substrate with the metal film in Example 3 was not subjected to heat treatment. f L Comparative Example 3] except that the material of the ceramic substrate in Example 3 was made from the high oxidation error and the use of the compound (4) in the comparative example (4) in the same manner as in the external father example 3 A container composed of a container of a metal film and a container having the same heat treatment as in Example 3 was applied to the container. The container was used in the same manner as in Example 3 in the container.
3131
S 201228995 固化之玻璃。 [評估方法] (水分含量及氣泡之有無) 測定玻璃之卢-OH值作為玻璃中之水分含量之指標。玻 璃之召-OH值(單位:mm-i)可就玻璃試料來測定對於波長 2·75〜2.95/zm之光之吸光度,並將其最大值召除以該玻 璃試料之厚度(mm)而求得。 在沿著尚度方向的切斷面,連同容器切斷在上述各例 中所製得之在容器内已固化之玻璃,並切割出厚度lmm之 縱剖面試樣。在所取得之縱剖面試樣之容器之高度方向的 中央部一即容器内壁與已固化之玻璃之界面附近的區域— 以上述方法測定召_OH值。並拍攝該區域之圖片。 將實施例3之結果顯示於第丨丨圖,將比較例2之結果顯 不於第12圖,並將比較例3之結果顯示於第13圖。各圖之(a) 為剖面圖片,且以箭頭顯示界面之基準位置。圖中符號 表示陶瓷基材,22表示金屬喷覆膜,3〇表示玻螭。各圖 (b)係顯示点-OH值之測定結果之圖表,橫軸表示(a)之剖之 圖片之寬度方向的距離(單位:#m),縱軸表示々七 位:mm·1)。以箭頭顯示與界面之基準位置對應的位置。早 [參考例1] 由上述之實施例3、比較例2與3之各例之附金屬獏之其 材所構成的容器,其金屬噴覆膜之下層係由陶究基材戶: 成,但在本例中,則是如下述測定金屬噴覆膜之下層由 璃所構成之情況下的水分含量。 曰 32 201228995 即’在實施例3中將由陶究構件所構成之容器放入加熱 爐内之後,於達到14〇〇。(:之時間點將硼矽酸玻璃之破璃原 料投入容器内之際,將應投入的玻璃原料的一部分直接投 入由該陶究構件所構成之容器中,並將該玻璃原料的剩餘 部分放人另行準備之後,再將觸禍放入 該容器内。除此以外,以與實施例3同樣的方式在容器内製 知已固化之玻璃。第14圖係顯示其縱剖面之圖片。在本例 中’可獲知在由陶究構件所構成之容器31内,於已固化之 玻璃30中埋填有坩堝32且坩堝32之内面與外面雙方皆與已 固化之玻璃相接的狀態。 在沿著高度方向之切斷面,連同容器及坩堝切斷在本 例中所製得之在容器内已固化之玻璃,並切出厚度1mm之 縱剖面試樣。就所取得之縱剖面試樣之掛渦的深度方向之 中央°卩即坩堝之内面及外面與玻璃界面附近的區域(第 14圖中以符號33表示)-以上述方法來測定/3-OH值。 、’·。果顯示於第15圖。橫軸表示第14圖之剖面圖片之寬 方向的距離’縱轴表示点-OH值。在第15圖中,以箭賴示 相當於掛堝側壁之位置。 而,在用於召_0H值測定之縱剖面試樣中,並未發現玻 璃中有氣泡產生。 如第12圖(b)與第13圖(b)之結果顯示,在比較例2、3 中玻璃中之水分含量(冷_〇H值)在鄰接於金屬喷覆膜之區 域有所降低。又,如第12圖⑷與第13圖⑷中顯示,在鄰接 於金屬噴覆膜之區域,在玻璃中有發現氣泡產生 。由此可 33 201228995 知,存於熔融玻璃中之水分在金屬噴覆膜表面經由分解所 生成之氧,並未再度生成水,反而成為氣泡。 又,比較例2雖使用含有玻璃相6質量%之高氧化錯質 磚作為陶瓷基材,但因使用前未進行15〇(rc之熱處理,所 以,使用時即便以140(TC加熱丨小時,在剖面圖片中,於金 屬喷覆膜與陶瓷基材之界面仍有觀察到微小的間隙。 比較例3因陶瓷基材僅含有玻璃相〇 8質量%,因此即便 在使用前有進行ISOOt:的熱處理,在剖面圖片中’於金屬 喷覆膜與陶瓷基材之界面仍有觀察到微小的間隙。 由該等可知,在比較例2、3中,存於熔融玻璃中之水 分在金屬噴覆膜表面經由分解所生成之氫會穿透金屬噴覆 膜,並透過金屬噴覆膜與陶瓷基材之界面空間進行移動而 未留在金屬噴覆膜。 另一方面,如第15圖之結果顯示,在參考例丨中,在鄰 接於金屬喷覆膜之區域中,玻璃中之水分含量(冷_〇H值) 並未降低,又如第11圖之結果顯示,在實施例3中水分含量 (/3-OH值)亦幾乎沒有降低。又,在參考例丨及實施例3中, 亦未發現玻璃中有氣泡產生。由此可知,存於熔融玻璃中 之水分在金屬噴覆膜表面經由分解所生成之氧,會再度與 氫結合生成水’因而沒有產生氣泡。 又,在貫施例3之剖面圖片中,於金屬喷覆膜與陶瓷基 材之界面中存有玻璃相且未觀察到間隙。如上述,由在實 施例3中可獲得與參考例丨相同的氣泡抑制之效果可知,金 屬喷覆膜與陶瓷基材之界面之玻璃相對於熔融玻璃中之氣S 201228995 Cured glass. [Evaluation method] (Presence of moisture content and air bubbles) The OH value of the glass was measured as an index of the moisture content in the glass. The glass--OH value (unit: mm-i) can measure the absorbance of light for a wavelength of 2.75 to 2.95/zm for a glass sample, and recall the maximum value by the thickness (mm) of the glass sample. Seek. The glass which had been solidified in the container prepared in the above examples was cut along with the container along the cut surface in the direction of the scent, and a longitudinal section sample having a thickness of 1 mm was cut. In the central portion in the height direction of the container of the longitudinal section sample obtained, i.e., the region near the interface between the inner wall of the container and the solidified glass, the _OH value was measured by the above method. And take a picture of the area. The results of Example 3 are shown in the figure, the results of Comparative Example 2 are shown in Fig. 12, and the results of Comparative Example 3 are shown in Fig. 13. (a) of each figure is a cross-sectional picture, and the reference position of the interface is indicated by an arrow. In the figure, the symbol indicates a ceramic substrate, 22 indicates a metal spray film, and 3 indicates a glass crucible. Each figure (b) is a graph showing the measurement result of the point-OH value, and the horizontal axis represents the distance in the width direction of the image of the section (a) (unit: #m), and the vertical axis represents the seven digits: mm·1) . The position corresponding to the reference position of the interface is indicated by an arrow. [Reference Example 1] The container composed of the metal bismuth of each of the above-mentioned Example 3 and Comparative Examples 2 and 3 has a metal spray film under the layer of a ceramic substrate: However, in this example, the moisture content in the case where the lower layer of the metal spray film is composed of glass is measured as follows.曰 32 201228995 That is, in the third embodiment, after the container composed of the ceramic member was placed in a heating furnace, it reached 14 〇〇. (: At the time point, when the glass raw material of the borosilicate glass is put into the container, a part of the glass raw material to be input is directly put into the container composed of the ceramic material, and the remaining part of the glass raw material is released. After the preparation was separately made, the object was placed in the container. In the same manner as in Example 3, the solidified glass was produced in the container. Fig. 14 is a view showing a longitudinal section thereof. It is known that in the container 31 composed of the ceramic member, the crucible 32 is filled in the solidified glass 30, and both the inner surface and the outer surface of the crucible 32 are in contact with the solidified glass. The cut surface of the direction, together with the container and the crucible, cut the glass which has been solidified in the container prepared in this example, and cut a longitudinal section sample having a thickness of 1 mm. The center of the depth direction, that is, the inner surface of the crucible and the area outside the glass interface (indicated by symbol 33 in Fig. 14) - the /3-OH value is measured by the above method. Figure. The horizontal axis represents the 14th figure The distance in the width direction of the face image indicates that the vertical axis represents the point-OH value. In Fig. 15, the position corresponding to the side wall of the hanging frame is indicated by the arrow. However, in the longitudinal profile sample used for the determination of the value of the _0H value. No bubbles were found in the glass. As shown in Fig. 12(b) and Fig. 13(b), the moisture content (cold_〇H value) in the glass in Comparative Examples 2 and 3 was adjacent to The area of the metallized film is reduced. Further, as shown in Fig. 12 (4) and Fig. 13 (4), bubbles are found in the glass in the region adjacent to the metal spray film. Thus, it is known from 201228995, The moisture generated in the molten glass by the decomposition of the surface of the metal sprayed film did not regenerate water, but instead became bubbles. In Comparative Example 2, a high oxidized brick containing 6% by mass of the glass phase was used. Ceramic substrate, but it has not been subjected to 15 〇 (heat treatment of rc before use). Therefore, even if it is heated at 140 °C during use, it is still observed at the interface between the metal spray film and the ceramic substrate in the cross-sectional picture. Tiny gap. Comparative Example 3 contains only glass phase due to the ceramic substrate. Since it is 8 mass%, even if it is subjected to the heat treatment of ISOOt: before use, a small gap is observed in the cross-sectional picture at the interface between the metal spray film and the ceramic substrate. From the above, in Comparative Example 2, In the third embodiment, the hydrogen generated in the molten glass through the decomposition of the metal on the surface of the metal sprayed film penetrates the metal sprayed film and moves through the interface space between the metal sprayed film and the ceramic substrate without leaving the metal. On the other hand, as shown in Fig. 15, in the reference example, in the region adjacent to the metal spray film, the moisture content (cold_〇H value) in the glass is not lowered, and As a result of Fig. 11, the moisture content (/3-OH value) was hardly lowered in Example 3. Further, in Reference Example 3 and Example 3, no bubble generation in the glass was observed. From this, it is understood that the moisture generated in the molten glass through the decomposition of the oxygen generated on the surface of the metal sprayed film is again combined with hydrogen to form water, and thus no bubbles are generated. Further, in the cross-sectional view of Example 3, a glass phase was present at the interface between the metal spray film and the ceramic substrate, and no gap was observed. As described above, the effect of the same bubble suppression as that of the reference example can be obtained in the third embodiment, and it is understood that the glass at the interface between the metal sprayed film and the ceramic substrate is opposed to the gas in the molten glass.
S 34 201228995 泡抑制係有所貢獻。 產業上之可利用性 依據本發明’可製得陶瓷基材與金屬喷覆膜之密接強 度優異的陶瓷構件,且該陶瓷構件對熔融玻璃之耐蝕性 佳,作為溶融玻璃的製造裝置用之陶竟構件係相當有用。 而’於此係引用於2010年η月25日所申請之日本專利 申請案2010-262591號之說明書、專利申請範圍、圖式及摘 要之全部内容’並納入作為本發明之揭示者。 【圖式簡單說明】 第1圖係顯示本發明之陶瓷構件之一實施形態之剖面 圖。 第2圖係顯示固定用凹部之一例者,(a)係俯視圖,(b) 係(a)中沿著B-B線之刮面圖。 第3圖係顯示本發明之炫融玻璃的製造裝置之一實施 形態之縱刮面圖。 第4圖係顯示本發明之玻璃物品的製造方法之一例之 方塊圖。 第5圖係說明密接強度之測定方法之圖。 第6圖係顯示密接強度之測定結果之圖表。 第7圖係在實施例丨中所獲得的陶瓷構件之剖面圖片, (a)係熱處理前且(b)係熱處理後;(a,)係顯示(a)中映射玻璃 相者,且(b’)係顯示(b)中映射玻螭相者。 第8圖係在實施例2中所獲得的陶瓷構件之剖面圖片, 0)係熱處理前且(b)係熱處理後;(b,)係擴大顯示之主要 35 201228995 部位者。 第9圖係在比較例1中所獲得的陶瓷構件之剖面圖片, (a)係熱處理前且(b)係熱處理後;(b’)係擴大顯示(b)之主要 部位者。 第10圖係顯示在實施例3中,在由陶瓷構件所構成之容 器内,使玻璃原料熔融固化時所用之熱歷程的圖表。 第11圖顯示實施例3之結果,(a)係在由陶瓷構件所構成 之容器内已固化之玻璃之剖面圖片,(b)係顯示冷-OH值之 測定結果之圖表。 第12圖顯示比較例2之結果,(a)係在由陶蜜^構件所構成 之容器内已固化之玻璃之剖面圖片,(b)係顯示/5-OH值之 測定結果之圖表。 第13圖顯示比較例3之結果,(a)係在由陶瓷構件所構成 之容器内已固化之玻璃之剖面圖片,(b)係顯示;5-OH值之 測定結果之圖表。 第14圖係在參考例1中所製得在由陶瓷構件所構成之 容器内已固化之玻璃的剖面圖片。 第15圖係顯示參考例1之冷-0H值之測定結果之圖表 【主要元件符號說明 1、 21…陶瓷基材 2、 22…金屬噴覆膜 3…固定用凹部 11…熔融槽 12…減壓消泡裝置 12a···減壓消泡槽 12b·.·上昇管 12c···下降管 13…第1導管 13a···冷卻機構S 34 201228995 The bubble suppression system contributes. INDUSTRIAL APPLICABILITY According to the present invention, a ceramic member having excellent adhesion strength between a ceramic base material and a metal sprayed film can be obtained, and the ceramic member is excellent in corrosion resistance to molten glass, and is used as a manufacturing device for molten glass. The component system is quite useful. And the entire contents of the specification, the patent application, the drawings and the abstract of the Japanese Patent Application No. 2010-262591, the entire disclosure of which is hereby incorporated by reference. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing an embodiment of a ceramic member of the present invention. Fig. 2 is a view showing an example of a fixing recess, (a) is a plan view, and (b) is a plan view along line B-B in (a). Fig. 3 is a longitudinal plan view showing an embodiment of a manufacturing apparatus for a glazed glass of the present invention. Fig. 4 is a block diagram showing an example of a method of producing a glass article of the present invention. Fig. 5 is a view showing a method of measuring the adhesion strength. Fig. 6 is a graph showing the measurement results of the adhesion strength. Figure 7 is a cross-sectional view of the ceramic member obtained in Example ,, (a) before heat treatment and (b) after heat treatment; (a,) shows that the glass phase is mapped in (a), and (b) ') shows the mapping of the glassy phase in (b). Fig. 8 is a cross-sectional view of the ceramic member obtained in Example 2, 0) before the heat treatment and (b) after the heat treatment; (b,) is the main part of the enlarged display of 201228995. Fig. 9 is a cross-sectional view of the ceramic member obtained in Comparative Example 1, (a) before heat treatment and (b) after heat treatment; and (b') is enlarged to show the main portion of (b). Fig. 10 is a graph showing the heat history used in the case where the glass raw material is melt-solidified in the container composed of the ceramic member in the third embodiment. Fig. 11 is a view showing the results of Example 3, wherein (a) is a sectional view of a glass which has been solidified in a container made of a ceramic member, and (b) is a graph showing a result of measurement of a cold-OH value. Fig. 12 is a view showing the results of Comparative Example 2, wherein (a) is a sectional view of a glass which has been solidified in a container composed of a ceramic component, and (b) is a graph showing a measurement result of a/5-OH value. Fig. 13 is a view showing the results of Comparative Example 3, wherein (a) is a sectional view of a glass which has been solidified in a container made of a ceramic member, and (b) is a graph showing a result of measurement of a 5-OH value. Fig. 14 is a cross-sectional view of a glass which has been solidified in a container composed of a ceramic member, which was obtained in Reference Example 1. Fig. 15 is a graph showing the results of measurement of the cold--0H value of Reference Example 1 [Main element symbol description 1, 21... Ceramic base material 2, 22... Metal spray film 3... Fixing recess 11... Melting groove 12... Pressure defoaming device 12a···pressure defoaming tank 12b·.·rise pipe 12c···down pipe 13...first pipe 13a···cooling mechanism
S 36 201228995 13b…攪拌機構 14···第2導管 15…冷卻槽 23…熱硬化型環氧黏著劑 24、25···拉伸夾具 30…玻璃 31···容器 32···坩鍋 33…坩堝的深度方向之中央部 (坩堝之内面及外面與玻 璃界面附近的區域) d…深度 g…溝 G…熔融玻璃 m…厚度 p…溝間距 w…溝寬 X…凸部寬 £ 37S 36 201228995 13b...Stirring mechanism 14···Second conduit 15...Cooling tank 23...Thermosetting epoxy adhesive 24,25···Stretching jig 30...Glass 31···Container 32···Shabu-shabu 33...the center of the depth direction of the crucible (the inner surface of the crucible and the outer surface and the area near the glass interface) d...depth g...groove G...molten glass m...thickness p...groove spacing w...groove width X...convex width £37
Claims (1)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010262591 | 2010-11-25 |
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| Publication Number | Publication Date |
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| TW201228995A true TW201228995A (en) | 2012-07-16 |
| TWI547465B TWI547465B (en) | 2016-09-01 |
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| TW100143113A TWI547465B (en) | 2010-11-25 | 2011-11-24 | Ceramic member and manufacturing method thereof, manufacturing apparatus and manufacturing method of molten glass, manufacturing apparatus for glass article, and method for manufacturing glass article |
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| Country | Link |
|---|---|
| JP (1) | JP5928340B2 (en) |
| KR (1) | KR101768262B1 (en) |
| CN (1) | CN103221570B (en) |
| TW (1) | TWI547465B (en) |
| WO (1) | WO2012070508A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112019004865T8 (en) * | 2018-09-28 | 2021-08-05 | Shinwa Industrial Co., Ltd. | Processing methods for ceramics and ceramic components |
| JP7309544B2 (en) * | 2019-09-13 | 2023-07-18 | 株式会社東芝 | Coating method and coating structure |
| WO2022209393A1 (en) * | 2021-03-31 | 2022-10-06 | Agc株式会社 | Member applied to part in contact with molten glass and manufacturing method of member |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3598635A (en) * | 1969-02-24 | 1971-08-10 | Corning Glass Works | Plasma spraying protective coating on refractory |
| JPH11240725A (en) * | 1998-02-26 | 1999-09-07 | Asahi Glass Co Ltd | Vacuum degassing equipment for molten glass |
| CN1184153C (en) * | 1998-02-26 | 2005-01-12 | 旭硝子株式会社 | Vacuum degassing apparatus for molten glass |
| JP2000203972A (en) * | 1999-01-18 | 2000-07-25 | Tanaka Kikinzoku Kogyo Kk | Surface treatment method for platinum-coated refractory products |
| DE10040591C1 (en) * | 2000-08-15 | 2001-11-08 | Heraeus Gmbh W C | Production of a coating on a refractory component used in glass industry comprises using a precious metal alloy having a specified melting temperature and formed from platinum, iridium, rhodium, rhenium and/or gold |
| US7071135B2 (en) * | 2004-09-29 | 2006-07-04 | Corning Incorporated | Ceramic body based on aluminum titanate and including a glass phase |
| CN2793069Y (en) * | 2005-06-10 | 2006-07-05 | 中国中轻国际工程有限公司 | Glass liquid bubbling tube |
| JP4983213B2 (en) * | 2006-11-13 | 2012-07-25 | 旭硝子株式会社 | Electroformed brick with metal coating and method for producing the same |
| BRPI0911236A2 (en) * | 2008-04-07 | 2016-07-12 | Asahi Glass Co Ltd | device for producing molten glass and method of producing molten glass employing the device |
-
2011
- 2011-11-18 WO PCT/JP2011/076730 patent/WO2012070508A1/en not_active Ceased
- 2011-11-18 JP JP2012545730A patent/JP5928340B2/en active Active
- 2011-11-18 CN CN201180055948.1A patent/CN103221570B/en active Active
- 2011-11-18 KR KR1020137011162A patent/KR101768262B1/en active Active
- 2011-11-24 TW TW100143113A patent/TWI547465B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2012070508A1 (en) | 2014-05-19 |
| TWI547465B (en) | 2016-09-01 |
| JP5928340B2 (en) | 2016-06-01 |
| KR101768262B1 (en) | 2017-08-14 |
| CN103221570A (en) | 2013-07-24 |
| WO2012070508A1 (en) | 2012-05-31 |
| KR20130140700A (en) | 2013-12-24 |
| CN103221570B (en) | 2015-05-20 |
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