201224592 六、發明說明： C 明戶斤屬 貝^^ 技術領域 本發明係有關液晶投影器用液晶面板及液晶投影器。 C ^sl 身标 3 背景技術 習知係使用液晶投影器來將影像資訊投影至螢幕等的 被投影物。液晶投影器係具有作為空間調整元件之液晶面 板，來自光源的光照射至此液晶面板而進行調整，並經由 投影透鏡投影至外部的被投影物。 液晶面板’舉例而言，係配置有與薄膜電晶體基板相 對向且隔著微小間隔之相對向基板，且在其等之間配置有 液晶部者。在賴電㈣基板巾，係形成有在各像素部藉 由施加電壓而使液晶配向之顯示電極，而在相對向基板， 係全面地職有共通電極M目對向基板，舉例㈣，係在 玻璃基板等之基板本體场成有所謂黑色基質的遮光性構 件’且進-步以覆蓋遮紐構件的方式而略全面地形成有 IT〇(Indium Tin 0xide)膜作為共通電極(例如，參照專利文 獻1) 〇 關於如此的液晶面板，為了使液晶投影器的亮度提升 且使其性能優異，㈣為了減少電力㈣耗且考量環境’ 而要求提升紐率。又，僅針對肢波㈣光穿透率優異 不適於作驗晶《彡！，因而有靠(紅）、〇(綠）' B(藍)之各色波長的料透铸異的需求。而且，即使對各 201224592 色波長的光穿透率優異，在其等之穿透率具有大差異的情 況下，仍不適於作為液晶投影器的使用來看，亦要求減少 穿透率的變動。再者，以量産性的觀點來看，亦要求減少 製造步驟的增加。 作為解決如此課題者，已知有例如在液晶面板的對相 向基板上設置層積膜。層積膜係自相對向基板之基板本體 側交互地層積有高折射率膜與低折射率膜6層，且各折射率 膜的膜厚為特定的膜厚。（例如，參照專利文獻2。） 【先前技術文獻】 【專利文獻】 【專利文獻1】：曰本特開平8 —338991號公報 【專利文獻2】：日本特許第4499180號公報 L發明内容3 發明概要 發明欲解決的問題 然而，關於液晶投影器，係有更進一步使其亮度提升， 而使其性能優異，同時減少電力消耗以考量環境的需求。 如上所述，關於相對向之基板，雖藉由設定特定的層積膜 以提高穿透率等係為已知，但作為液晶面板時的穿透率等 則未必明確，再者，不僅在相對向基板側，在薄膜電晶體 基板側亦設置積層膜時的效果，或有關此時之折射率膜的 層數或膜厚的影響等，亦未明確。 本發明係用以解決上述課題而成者，目的在於提供一 種液晶投影器用液晶面板，其具有優異的R、G、B各色波 201224592 長的光穿透率’且抑制其變動的同時，生產性能亦良好。 再者’本發日狀目的亦在於提供一種使用此般液晶投影器 用液晶面板的具有高性能之液晶投影器。 用以解決課題之手段 本發明之液ΒΒ ί又影器用液晶面板的特徵在於具有第1 基板部、配置成與此第1基板部相對向之第2基板部，及配 置於此等第1基板部與第2基板部之間的液晶部，且波長為 450nm、550nm及650nm之光的穿透率為87%以上。 第1基板部，其至少於第1基板本體各像素部之會成為 顯示部之部分，依序層積有第丨層積膜、第丨透明電極及第ι 配向膜。第2基板部在第2基板本體上依序層積有第2層積 膜、第2透明電極及第2配向膜。第丨層積膜係自帛丨基板本 體側交互層積折射率為丨.9〜2.5之高折射率膜與折射率為 1.2〜1.5之低折射率膜合計6層而形成者，且各折射率膜之膜 厚如下.第1層為1〜26nm，第2層為1〜l〇〇〇nm，第3層為 1〜30nm ’第4層為i〜1〇〇〇nm，第5層為2〜41nm，第6層為 1〜95nm。另，此第6層宜為6〜95nm。 第2層積膜係自第2基板本體側交互層積折射率為 1.9〜2.5之南折射率膜與折射率為12〜15之低折射率膜合計 6層而形成者，且各折射率膜之膜厚如下：第1層為 1〜26nm ’第2層為1〜Onm，第3層為1〜30nm，第4層為 1〜lOOQnm’第5層目為2〜41nm，第6層為6〜95nm。 本發明之液晶投影器係具有形成 用以投影至被投影物 之影像貢訊的液晶面板者，其特徵在於此液晶面板為上述 201224592 本發明之液晶投影Is用液晶面板。 發明效果 根據本發明之液晶投影用液晶面板' 错由在相對向 之1對基板部兩者上設置特定的層積膜，除了能維持良好的 生産性能，提高R、G、B之各色波長的光穿透率，且亦能 抑制其變動。藉此，能適用於液晶投影器。 根據本發明之液晶投影器，藉由使用上述本發明之液 晶投影器用液晶面板，能使其亮度提高且性能提升的同 時，亦能減少電力的消耗而考量環境。 圖式簡單說明 第1圖是表示本發明液晶面板之一例的部分擴大截面 圖。 第2圖是表示第1圖中液晶面板之第1基板部的截面 圖。 第3圖是表示第1圖中液晶面板之第2基板部的截面 圖。 第4圖是表示實施例1〜3及比較例卜2之液晶面板的 穿透率圖。 第5圖是表示折射率膜(實施例3、第2層積膜之第2 層）的膜厚與穿透率的關係圖。 I：實施方式3 用以實施發明之形態 以下參照圖式說明有關本發明之實施形態。 第1圖係表示實施形態之液晶投影器用液晶面板（以 201224592 第1圖中，大 第1基板部2、 ’及配置在此 下，簡稱為液晶面板）之一例的截面圖。另， 略地放大表示1像素部分。液晶面板i具有： 配置成與此第1基板部2相對向之第2基板部3 等第1基板部2與第2基板部3之間的液晶部4。 基板部2具有第i基板本體2卜且其内側（即在與第 2基板部3相對向之主面側）具有像素部。在各像素部中外 置有薄膜電晶體(Thin Film Transistor : ΤΓτλ- al U疋件等之驅動 元件22的同時，且至少於成為顯示部之部分依序層積有 第1層積膜23、成為顯示電極之第1透明電極24，及第1配向 膜25。通常，作為第丨基板部2，較佳使用薄膜電晶體基板。 另外，雖圖中未表示，在得到充足穿透率的情況下， 可在第1基板本體21與第1層積膜23之間設置基底犋等，或 在第1層積膜23上設置保護膜等。再者，雖圖中未表示，在 到充足穿透率的情況下，亦可在第1基板本體21之外側設 置防塵玻璃，其用以保護液晶面板1來自於空氣中的粉塵 等。 第2基板部3具有第2基板本體31，且其内側（即，在與 第1基板部2相對向之主面側），依序層積有第2層積膜32、 成為共通電極之第2透明電極33及第2配向膜34。另，雖圖 中未表示’在得到充足穿透率的情況下，可在第2基板本體 31與第2層積膜32之間設置基底膜等，或在第2層積膜32上 設置保護膜等。再者，雖圖中未表示，在得到充足穿透率 的情況下’亦可在第2基板本體31之外側設置防塵玻璃，其 用以保§蒦液晶面板1來自於空氣中的粉塵等。 201224592 在第2基板本體31之内側，亦可設置例如稱之為黑色基 質之遮光性構件35。例如第1圖所示，遮光性構件35係與第 2層積膜32同為平面狀，而能層積在此第2層積膜32上。另， 雖圖中未表示，例如可將遮光性構件35直接層積在第2基板 本體31上’亦可以環繞此周圍的方式設置第2層積膜32。 如第2圖所示，第1層積膜23係自第1基板本體21側交互 層積有折射率為1.9〜2.5(以波長為589nm之折射率，以下相 同）之高折射率膜（折射率膜231、233、235)與折射率為 1.2〜1.5之低折射率膜（折射率膜232、234、236)合計6層。 各折射率膜之膜厚如下：第1層之折射率膜231為1〜26nm， 更佳為2〜15nm，第2層之折射率膜232為1〜l〇〇〇nm，更佳為 60〜75nm，第3層之折射率膜233為1〜3〇nm，更佳為 5〜20nm，第4層之折射率膜234為丨〜⑺⑻⑽，更佳為 55〜70nm，第5層之折射率臈235為2〜41nm，更佳為 10~25nm，第6層之折射率臈236為，更佳為 6〜95nm ’特佳為25〜55nm。再者，通常以生産性能等的觀 點來看在第1層積膜23甲之第2層的折射率膜232及第4層 之折射率助4的轉，宜分料綱_下，更佳W 以下。 第2層積膜32亦如第3圖所示，係自第2基板本體31側 互層積折射率為^] 5之高折射率膜(折射率膜m 325) 與折射率為h2〜15之低折射率膜(折射率膜322、324 326) 合計6層。各折射率膜之勝厚如下：&層之折射率 321為1〜I’更佳為2〜〜，第2層之折射率膜322 8 201224592 1〜lOOOnm，更佳為60〜75nm，第3層之折射率膜323為 1〜3〇nm，更佳為5〜2〇nrn，第4層之折射率膜324為 1〜lOOOnm ’更佳為60〜7〇nm，第5層之折射率膜325為 2〜41nm ’更佳為1〇〜25nm，第6層之折射率膜326為 6〜95nm、更佳為25〜55nm。 另，即使在上述構成之中，第1透明電極24之膜厚為 120〜165nm的情況下’特別是在〜155nm的情況下，宜為 以下厚度之構成。第1層積膜23之第1層之折射率臈231為 3〜15nm ’第2層之折射率膜232為45〜90nm，更佳為 60〜75nm，第3層之折射率膜233為2〜16nm，更佳為 5〜16nm，第4層之折射率膜234為1〜llOnm ,更佳為 55〜70mn，第5層之折射率膜235為12〜28nm，更佳為 12〜25nm，第6層之折射率膜236為19〜52細、更佳為 25〜35nm。第2層積膜32之第1層之折射率膜^丨為丨〜丨如⑺， 更佳為2〜1511〇1、第2層之折射率膜322為26〜1〇〇11111，更佳為 60〜75nm，第3層之折射率膜323為，更佳為 5〜20細’第4層之折射率膜324為2〇〜1〇5腕，更佳為 60〜70mn ’第5層之折射率膜奶為叫^，更佳為 11〜1細，第6層之折射率獏326為25〜70nm，更佳為 25〜55nm 。 第1透月電極24的膜厚為6〇〜咖刪^但除了⑽⑽之外） 的情況下’特別是9〇〜削⑽時，宜為以下厚度之構成。第！ 層積膜23之第}層的折射率膜231為，更佳為 1 〜12nm，第1層之折射率膜232為23〜110nm，更佳為 201224592 60〜70nm，第3層之折射率膜233為7〜24nm，更佳為 7〜20nm，第4層之折射率膜234為35〜103nm，更佳為 55〜70nm，第5層之折射率膜235為8〜23nm，更佳為 10~23nm，第6層之折射率膜236為1〜55nm，更佳為 25〜40nm。第2層積膜32之第1層之折射率膜321為1〜20nm， 更佳為2〜15nm，第2層之折射率膜322為20〜106nm，更佳為 60〜75nm，第3層之折射率膜323為1〜24nm，更佳為 10〜20nm，第4層之折射率膜324為1〜120nm，更佳為 60〜70nm，第5層之折射率膜325為8〜33nm，更佳為 10〜25nm，第6層之折射率膜326為20〜74nm，更佳為 30〜55nm。 第1透明電極24之膜厚為10〜60nm(但除了 60nm之外) 的情況下，特別是在10〜30nm的情況下，宜為以下厚度之 構成。第1層積膜23之第1層之折射率膜231為1〜26nm， 更佳為2〜15nm，第2層之折射率膜232為1〜lOOOnm，更 佳為60〜75nm，第3層之折射率膜233為1〜30nm，更佳為 5〜20nm，第4層之折射率膜234為1〜lOOOnm，更佳為 60〜70nm，第5層之折射率膜235為2〜41nm，更佳為 10〜25nm，第6層之折射率膜236為6〜95nm，更佳為 40〜55nm。第2層積膜32之第1層之折射率膜321為 1〜26nm，更佳為2〜15nm，第2層之折射率膜322為 1〜lOOOnm，更佳為60〜75nm，第3層之折射率膜323為 1〜30nm，更佳為5〜20nm，第4層之折射率膜324為 1〜lOOOnm，更佳為60〜70nm，第5層之折射率膜325為 10 201224592 2〜41nm’更佳為ι〇〜25nm，第6層之折射率膜326為 6〜95nm，更佳為4〇〜55nm。通常以生産性能等的觀點來看， 在第1層積膜23中之第2層折射率膜232及第4層折射率 膜234 ’在第2層積膜32中之第2層折射率膜322及第4 層折射率膜324的膜厚，宜分別為200nm以下，更佳為 150nm以下。 第2透明電極33之膜厚宜為1〇〜30nm，更佳為 15〜25nm，特佳為18〜22nm。 根據如此液晶面板1，因為在第丨基板部2具有特定構成 的第1層積膜23，同時在第2基板部3具有特定構成的第2層 積膜32，因此，相較於習知僅在一者之基板部上具有層積 臈者，能使各色之光的穿透率提高，且亦能抑制各色之穿 透率的變動。 具體s之’可使波長為450nm、550nm及650nm之光的 穿透率為87%以上。再者，可使以波長在4〇〇〜7〇〇nm範圍内 之光穿透率之最大值與最小值的差所表示變動值在1〇%以 下’較佳在5%以下。另，例如以波長為4〇〇〜7〇〇nm範圍的 光穿透率之最大值為90%、最小值為86°/。的情況下，變動值 能求出其值為90%-86%=4%。 例如，在如習知般於作為基板本體的石英基板，直接 層積作為透明電極之IT〇(lndium Tin Oxide)膜的情況下，因 為石英基板的折射率約為1.46，且ΐτο膜的折射率為2左 右，所以因其等折射率的不同，未必能得到充足的穿透率。 再者，雖然僅在構成液晶面板之一對石英基板的一者上設 201224592 置用以提1¾穿透率的層積膜係為已知，然而，有關在~對 石英基板的兩者上設置層積膜時的效果，或是在各層積膜 中之各個折射率膜的最適膜厚等，則未必明確。 根據上述液晶面板1，在第1基板部2設置第1層積膜 23，同時在第2基板部3設置第2層積膜32，藉由將第1層積 膜23、第2層積膜32之各別的層數及各折射率膜的膜厚予以 特定，係有效地緩和第1基板本體21與第1透明電極24之折 射率差’以及第2基板本體31與第2透明電極33之折射率 差，而能使液晶面板1整體的穿透率提高的同時，亦能抑制 穿透率的變動。再者，因為相較於習知之液晶面板未必增 加大的製造步驟，因而能確保生産性能。 在第1層積膜23或第2層積膜32中之折射率膜的層數為 不足6層的情況下，恐有r、g、B各色波長的光穿透率不會 充分地提高，且其變動亦無法充分地抑制之虞。倘若第！層 積膜23、第2層積膜32中之折射率膜的層數為6層，即可充 分地提高R、G、B各色波長的光穿透率，且亦能充分地抑 制其變動。本發明中’只要達到上述之層數，亦可具有其 以上之層數’但是’在層數過多的情況下，恐有增加製造 步驟，而降低生産性能之虞。 再者，在第1層積膜23或第2層積膜32中之第1至6層之 任一層的折射率膜的膜厚落在上述範圍外的情況下，即使 折射率膜的層數為6層，也未必可充分地提高尺、G、B之各 色波長的光穿透率，也無法充分地抑制其變動。另，在折 射率膜的膜厚超過上述範圍的情況下，恐有無法充分地提 12 201224592 间R、g、b之各色波長的光穿透率也無法充分地抑制其 ’ S J·隨著成膜時間的増加，恐有降低生産性 之虞。 第1基板本體21、+ 弟2基板本體31，只要由透光性材料 ^ P可未必文到限制，例如雖能使用結晶化玻璃， 门穿透率及低熱膨脹的理由最適於使用石英基板。 再者’有關其等之厚声， / 又雖未必受到限制，一般宜為 25_°另’第1基板本體21與第2基板本體31可為互異 的材料、厚度。 、 第1層積膜23之高折射率膜(折射率膜231 、233、235)、 2層積骐32之高折射率膜(折射率膜32卜323、325)係折射 二為9 2.5者。對於作為此種物質而言，可列舉有自例如 ^匕组(折射率：2.〇〜2.2)、氧化鈦(折射率：2.2〜2_5)、氧化 射率.L9 2,〇)及氧化給(折射率：1.95〜2.15)等之高折 ㈣材料中選出之至少1種所構成者。在其等之中，第说 :電極24、第2透明電極33，特別是以抑制因為形成ιτ〇膜 此之熱處理而造成劣化的觀絲看，宜為賴性優異的氧 另。计6層之南折射率膜，可由相互相同之高折射率 亦^所構成者亦可’或是由相異的高折射率材料所構成者 膜° '再者，合计6層之高折射率膜的各層係可分別為單層 么亦可為多層膜。在多層膜的情況下，構成此多層膜的 3可由上述南折射率材料所構成。 第1層積膜23之低折射率膜(折射率膜232、234、236)、 13 201224592 ' 324、326)係折射 ，可列舉有自氧化 1.35〜1.41)等之低 第2層積膜32之低折射率膜(折射率膜322 率為1.2〜1.5者。對於作為此種物質而言 石夕(折射率：MM·48)及敗化鎖(折料： 折射率材料中選出之至少1種所構成者。 叮立 …⑽之低折射率膜亦與高折射率膜相同， 可為由相互㈣之賴射率㈣所構成 異的低折射率材料所構成者亦可 ^由相 再者，合汁6層之低折射 》別為單制，亦可為多層膜。在多層膜的情況 :，構成此多層狀各層可由上述之低折射特料所構成 者。 第1層積膜23的合計臈厚，即自第丨層折射率膜⑶至第 6層折射率膜236的合計膜厚宜為⑼〜祝⑽。再者，第：層 積膜32的合計财，即自_折射柳2㈣6層折射^ 膜326的合計膜厚宜為⑼〜25G⑽。只要分別的合計膜厚為 150nm以上，即錢R、G、B各色波長的光穿透率有效地提 高，且亦能有效地抑制其變動。又，只要分別的合計膜厚 為250細，即能充分地提高穿透率等、然，_旦超過此值， 反而會有增加錢時間，降低生產性能之虞。第i層積膜23 的5计膜厚，更佳為18〇〜23〇nm、進一步更佳為 190 220nm第2層積膜32的合計膜厚，更佳為2〇〇〜23〇nm， 進一步更佳為210〜220nm。 第1層積膜23中的第2層折射率膜232與第5層折射率膜 235的合計膜厚宜為55〜則nm。又，第2層積膜％中的第2 層折射率膜322與第5層折射率膜奶的合計膜厚宜為 201224592 。高折射率膜與低折射 計6層的情況下，第 、乂互地刀別層積3層合 群有大的區別由將^射率膜群與第4至6層折射率膜 的笛？'將在第1至3層折射率膜群中之中門屏 的第2層折射率膜與第4至 中間層 層折射率膜的合計膜厚設定在上述^圍群内中之中間層的第5 時間增加所造成生產性能的降低，==二抑制因成膜 長的光穿透率有效地 、、B各色波 声籍兀T有效地抑制其變動。第i 的第2層折射率膜232與第5層折射_二 第2層積膜Ur，。1，進一步更佳為75〜。再者， 之合:二中的第2層折射率膜322與第5層折射率膜325 厚，㈣1層積膜23的奇數層之高折射率膜的合計膜 率膜235^1 折射率膜231、第3層折射率膜233及第5層折射 的奇^的合計膜厚宜為㈣nm。又，成為第2層積膜η 321°、/之两折射率膜的合計膜厚，即第1層折射率膜 、3層折射率膜323及第5層折射率膜325的合計膜厚宜 :1 〇〜6 5 nm。藉由如此設定’可抑制因成膜時間的增加所 =成生產性能的降低，且可使尺…』各色波長的光穿透 率有效地提高，並亦可有效地抑制其變動。第】層積膜23、 層積膜32 +之高折射率膜的合相厚，分別更佳為 20〜55nm，進一步更佳為30〜45nm。 八▲另-方面’成為第1層積膜23的偶數層之低折射率膜 ’口。十膜厚’ gp第2層折射率膜232、第4層折射率膜 第6層折射率膜236的合計膜厚宜為13〇〜2〇5nm。又， 15 201224592 成為第2層積膜32之偶數層之低折射率膜的合計膜厚，即 第2層折射率膜322、第4層折射率膜324及第6層折射率 膜326的合計膜厚宜為150〜205nm。藉由如此設定，可抑 制由於成膜時間的增加所造成生産性能的降低，且可使 R、G、B各色波長的光穿透率有效地提高，並亦可有效地 抑制其變動。第1層積膜23之低折射率膜的合計膜厚，更 佳為140〜195nm，進一步更佳為150〜185nm。又，第2層 積膜32之低折射率膜的合計膜厚，更佳為160〜195nm，進 一步更佳為170〜185nm。 成為第1層積膜23之第6層的折射率膜236之成為第 2基板部3側之表面的表面粗度宜為0.5nm以下。同樣地， 成為第2層積膜32之第6層的折射率膜326，其成為第1 基板部2側之表面的表面粗度宜為0.5nm以下。藉由將上 述表面的表面粗度設定為0.5nm以下，在層積有ITO膜之 情況下，能有效地抑制其等界面中之穿透率的降低。又， 表面粗度是依據JIS B0601為準而測定者。 第1透明電極24、第2透明電極33宜分別為ITO膜。 第1透明電極24、第2透明電極33之膜厚雖未必受到限 制，然，第1透明電極24的膜厚宜為10〜165nm，第2透 明電極33的膜厚宜為10〜30nm。第1透明電極24、第2 透明電極33之膜厚在此範圍内的情況下，藉由設置第1層 積膜23、第2層積膜32，能使R、G、B各色波長的光穿 透率有效地提高，亦能有效地抑制其變動。 第1配向膜25、第2配向膜34，可為例如經摩擦（配 16 201224592 向）處理之聚亞醯胺系之有機化合物犋，或經斜方蒸鍍氧化 矽等之無機材料的蒸鍵膜等。第1配向膜25、第2配向膜 34的膜厚雖未必受到限制’第1配向膜25的膜厚宜為 40~80nm’更佳為50〜70nm，第2配向膜34的膜厚宜為 15〜55nm，更佳為25〜45nm。第1配向膜25、第2配向膜 34的膜厚為在此範圍内的情況下，藉由設置第1層積膜 23、第2層積膜32,能使R、G、B各色波長的光穿透率有 效地提高，亦能有效地抑制其變動。 液晶部4可由混合一種或數種之向列型液晶的液晶分 子所構成者，且被封入在第1基板部2與第2基板部3之 間，並藉由第1配向膜25、第2配向膜34而配向。 如此之液晶面板1’除了在第1基板部2設置第1層積 膜23,同時在第2基板部3設置第2層積膜32之外，可與 習知的液晶面板同樣地製造。第1層積膜23可以公知的濺 鍍法而在第1基板本體21上藉由交互地層積高折射率膜 (折射率膜231、233 ' 235)與低折射率膜(折射率膜232、 234、236)各3層合計6層而製得。同樣地，第2層積膜32 可以公知的濺鍍法而在第2基板本體31上藉由交互地層積 高折射率膜(折射率膜321、323、325)與低折射率膜(折射 率膜322、324、326)各3層合計6層而製得。 濺鍍法方面’可舉例為例如DC(直流)濺鍍法、AC(交 流)濺鍍法、高周波濺鍍法、磁控濺鍍法。又，除濺鍍法以 外’亦可使用真空蒸鍍法，作為真空蒸鍍法，有離子鍍敷 法、離子輔助法等。一般而言，由製程安定對大面積的成 17 201224592 膜較容易及膜厚控制精確度的安定性來看，宜為DC磁控 濺鍍法、AC磁控濺鍍法、離子鍍敷法、離子輔助法。 就有關作為高折射率膜之氧化鈕、氧化鈦、氧化銼、 氧化給而言’舉例而言，可使用構成此等金屬氧化物之金 屬元素所構成者作為靶材，並使用含有氧之氣體作為濺鍍 氣體’而藉由反應性濺鍍法而容易形成。再者，就有關作 為低折射率膜之氧化石夕層而言，舉例而言，可使用氮化矽 作為乾材’並使用含有氧之氣體作為濺鍍氣體，而藉由反 應性濺鐘法容易形成。又，於輕材中，可在不違反本發明 之主旨下，摻雜Al、Si、Zn等公知的摻雜劑。 有關在第1基板本體21上形成第1層積膜23,可進一 步在第1層積膜23上以公知的方法依序層積第1透明電極 24、第1配向膜25，而成為第1基板部2。另一方面，有 關在第2基板本體31上形成第2層積膜32,可進一步在第 2層積膜32上以公知的方法依序層積第2透明電極33、第 2配向膜34，而成為第2基板部3。其後，例如在第1基板 部2與第2基板部3配置成相對向後，藉由在其等之間封 入液晶以形成液晶部4，而成為液晶面板1。 如此之液晶面板1係配置在液晶投影器的内部而使用。 在液晶面板1中，如第1圖所示，來自光源的光入射至第1基 板部2側，此入射光是藉由液晶面板1調整而自第2基板部3 側射出，最後藉由投影透鏡而投影至配置在外部的被投影 物。有關具有如此液晶面板1的液晶投影器，液晶面板1具 有優異的R、G、B各色波長的光穿透率，由於其變動亦遭 18 201224592 受抑制，故可提高亮度作為投影器之優異性能，同時也能 減少電力的耗損，而考量環境。 實施例 以下，參照實施例具體說明本發明。 根據經由計算求出第1層積膜23及第2層積膜32之最 適膜構成，如以下所示製造實施例1至3之液晶面板1。又， 用以比較，製造未具有第1層積膜23及第2層積膜32之 液晶面板1(比較例1)、僅具有第2層積膜32之液晶面板 1(比較例2)。 在此，實施例1至3的液晶面板1係具有第1透明電極 24之厚度分別為145nm、100nm、20nm時之最適膜構成者。 所謂最適膜構成，即是在液晶面板1中之波長為450nm、 55Onm及65Onm之光穿透率為87%以上者，又，最適膜構 成由以下條件求得。 第1基板本體21為石英基板(厚度1.2mm，折射率 1·47)、第1透明電極24為ITO膜(折射率1.88)、第1配向 膜25為聚醯亞胺膜(厚度60nm，折射率1.56)、第2基板本 體31為石英基板(厚度1.2mm，折射率1.47)、第2透明電 極33為ITO膜(厚度20nm，折射率1.88)、第2配向膜34 為聚亞醯胺膜(厚度36nm，折射率1.56)、液晶部4為向列 型液晶(厚度2·5μηι，折射率1.57)。又，第1層積膜23、 第2層積膜32分別為6層的構造，高折射率膜為氧化钽(折 射率2.14)、低折射率膜為氧化矽(折射率1.46)。 (實施例1) 19 201224592 根據第1透明電極24之厚度為i45nm時的最適膜構 成（參照表1，第1層積膜、第2層積膜）來製作液晶面板卜 即’在作為第1基板本體21之石英基板上，藉由以下方法， 父互地層積特定膜厚之作為高折射率膜之氧化钽膜與作為 低折射率膜之氧化矽膜各3層合計6層，而形成第丨層積 膜。且，在第1層積膜23上，藉由濺鍍法形成IT〇膜作為 第1透明電極24的同時，形成第1配向膜25而成為第i 基板部2。 又，在作為第2基板本體3丨之石英基板上，藉由以下 方法，交互地層積特定膜厚之作為高折射率膜之氧化钽膜 與作為低折射率膜之氧化矽膜各3層合計6層，而形成第2 層積膜32。且，在第2層積膜32上，藉由濺鍍法形成no 膜作為第2透明電極33的同時，形成第2配向膜34而成 為第2基板部3。 其後’在第1基板部2與第2基板部3之間，封入液 明以形成液晶部4 ’製作液晶面板卜另，各部的厚度係與 上述條件相同。 [氧化钽膜的形成] 在真空槽内，將作為賤錢乾之Ta把材設置在陰極上， 將真空槽排氣至成為2GxlQ.3pa以下後，導人氧氣氣體 6〇SCCm與氬氣氣體14Gseem作為賴氣體 。此時的壓力為 3.〇xl〇 】Pa〇為从jj上热 此狀態下，藉由使用DC脈衝電源來進行反 應&濺It ’在真空槽内作為所設置之被處理體之石英基板 或依序形成有折射率膜者上，形成氧化组膜。另 ’氧化鈕 20 201224592 膜的膜厚，主要是依濺㈣間的調整來進行控制。 [氧化矽膜的形成] ’工槽内’將作為崎t之Si 材設置在陰極上， 將真工槽排乱至成為2Gxl().3pa以下後，導人氬氣氣體 21〇Sccm與氧氣氣體削财爪作為滅鍍氣體。此時的壓力 成為3.4x10 pa。在此狀態下藉由使用電源進行反 應!·生滅鑛，在真空槽内作為所設置之被處理體之石英基板 或依序形成有折射率膜者上，形成氧化賴。$，氧化石夕 膜的膜厚，主要是依濺鍍時間的調整來進行控制。 (實施例2) 根據第1透明電極24的厚度為ι〇〇ηΐΏ時的最適膜構成 (參照表1，第1層積膜、第2層積膜）來製作液晶面板1。 另’除上述膜構成以外’與實施例1同樣地製作液晶面板p (實施例3) 根據第1透明電極24的厚度為20nm時的最適膜構成 (參照表1，第1層積膜、第2層積膜）來製作液晶面板1。 另，除上述膜構成以外，與實施例1同樣地製作液晶面板1。 (比較例1) 製作未設置第1層積膜23及第2層積膜32之液晶面板1。 即，在第1基板本體21上，直接層積第1透明電極24及第1配 向膜25而作為第1基板部2，且在第2基板本體31上’直接層 積第2透明電極33及第2配向膜34而作為第2基板部3 ’其 後，與實施例1同樣地製作液晶面板1。另，第2透明電極33 之膜厚為145nm。 21 201224592 (比較例2) 未設置第1層積膜23，而僅設置第2層積膜32來製作液 晶面板1。即，在第1基板本體21上，直接層積第1透明電極 24及第1配向膜25而作為第1基板部2，且在第2基板本體31 上，透過第2層積膜32而層積第2透明電極33及第2配向膜34 而作為第2基板部3，其後，與實施例1同樣地製作液晶面板 1。另，第2層積膜32之構成係於日本特許第4499180號公報 之實施例1中所記載者。 【表1】 液晶面板的構成 實施例1 實施例2 實施例3 比較例1 比較例2 第2基板本體(S英基板） __________ 第 2 第1層 Ta2C^(nm) 6 6 6 — 10 第 第2層 Si〇2(nm) 67 67 67 — 56 2 屑 第3層 Ta2Cfe(nm) 14 14 14 — 40 基 板 積 第4層 Si〇2(nm) 65 65 65 — 17 部 膜 第5層 Ta2C%(nm) 18 18 18 — 64 第6層 Si〇2(nm) 46 46 46 — 48 ITO 膜(nm) 20 20 20 145 20 配向膜(nm) 36 36 36 36 36 液晶 ——-— 配向膜(nm) 60 60 60 60 60 ITO 膜(rim) 145 100 20 145 145 第 第6層 Si〇2(nm) 30 32 46 — — 2 1 第5層 Ta2C%(nm) 18 17 18 — — | 層 第4層 Si〇2(nm) 62 61 65 — — 夜 部 m 膜 第3層 Ta2C^(nm) 12 13 14 — — 第2層 Si〇2(nm) 68 65 67 — — 第1層 Ta2C^(nm) 7 7 6 — — 第1基板本體ffi英基板） ---- 其次，進行有關實施例及比較例的液晶面板1之穿透率 的評價。另，穿透率的評價係以例如藉由日立U4000型之自 動記錄分光光度計來進行。其結果以第4圖表示。 有關未設置第1層積膜23及第2層積膜32兩者之比較例 1的液晶面板1，瞭解到低波長區域及高波長區域的穿透率 為不足87%，且中波長區域及其他區域之穿透率的變動也 22 201224592 變大。再者，有關僅設置第2層積膜32之比較例2的液晶面 板1，瞭解到相較於比較例1之液晶面板1 ’雖整體而言穿透 率提高，然而低波長區域及高波長區域的穿透率仍然不足 87°/。，且中波長區域及其他區域之穿透率的變動也變大。 相對於此，有關設置第1層積膜23及第2層積膜32兩者 之實施例1至3的液晶面板1，瞭解到波長為450nm、550nm 及650nm之各點中，可獲得87%以上的穿透率。又，有關實 施例1至3的液晶面板1 ’瞭解到波長為400~75Onm的範圍内 之穿透率的變動值皆在4%以下。 其次，以實施例1的液晶面板1 (第1透明電極24之厚度 為145nm的情況）、實施例2的液晶面板1(第1透明電極24之 厚度為lOOnm的情況）、實施例3的液晶面板丨（第1透明電極 24之厚度為20nm的情況)之各膜構成作為基本，經由計算而 求得第1層積膜23及第2層積膜32之各折射率膜之膜厚的容 許範圍（最小值、最大值）。 另’容許範圍係波長為450nm、550nm及650nm之光的 穿透率成為87%以上，且波長在4〇〇〜75〇11111的範圍内之光的 穿透率之最大值與最小值的差所表示的變動值在1 〇%以下 的範圍。又，容許範圍係自基本構成(基本膜厚）變更僅1層 折射率膜的膜厚，且以其他全部折射率膜的膜厚作為基本 構成(基本膜厚）時滿足上述條件的範圍。 表2表不有關實施例丨的液晶面板丨中，各折射率膜之膜 厚的容許_ (最小值、最錄），其最小值及最^之穿透 率（450nm、550nm、650nm)、變動值。同樣地，表3、4表 23 201224592 示實施例2之液晶面板〗、實施例3之液晶面板1的結果。又， 第5圖表不實施例3之液晶面板！中，第2層積膜％之第2層折 射率膜322的膜厚（第5圖中，以2L表示）在卜麵腿之 内變更時的結果。 【表2】 表 第2層積膜 第1層積膜201224592 VI. Description of the Invention: C. The present invention relates to a liquid crystal panel for a liquid crystal projector and a liquid crystal projector. C ^sl body 3 BACKGROUND ART A liquid crystal projector is used to project image information onto a projection such as a screen. The liquid crystal projector has a liquid crystal panel as a spatial adjustment element, and light from a light source is irradiated onto the liquid crystal panel to be adjusted, and projected onto an external projection object via a projection lens. For example, the liquid crystal panel is disposed so as to face the opposite side of the thin film transistor substrate with a small gap therebetween, and a liquid crystal portion is disposed between the liquid crystal panels. In the substrate (4), a display electrode in which a liquid crystal is aligned by applying a voltage to each pixel portion is formed, and a common electrode M-substrate is integrally used in the opposite substrate. For example, (4) A substrate body such as a glass substrate is formed into a light-shielding member of a so-called black matrix, and an IT (Indium Tin 0xide) film is formed as a common electrode in a manner of covering the mask member in a comprehensive manner (for example, refer to the patent) Reference 1) Regarding such a liquid crystal panel, in order to improve the brightness of the liquid crystal projector and to make it excellent in performance, (4) in order to reduce power (four) consumption and consider the environment', it is required to increase the rate. Also, only for limb waves (four) excellent light transmittance is not suitable for the inspection of crystal "彡! Therefore, there is a demand for the penetration of various wavelengths of (red), enamel (green) 'B (blue). Further, even if the light transmittance of each of the 201224592 color wavelengths is excellent, and the transmittance thereof is largely different, it is not suitable for use as a liquid crystal projector, and it is also required to reduce the variation of the transmittance. Furthermore, from the point of view of mass production, it is also required to reduce the increase in manufacturing steps. As a solution to such a problem, for example, a laminated film is provided on a counter substrate of a liquid crystal panel. In the laminated film, six layers of a high refractive index film and a low refractive index film are laminated alternately from the substrate main body side of the substrate, and the film thickness of each refractive index film is a specific film thickness. (Patent Document 2) [Patent Document 1] [Patent Document 1] Japanese Patent Laid-Open No. Hei. No. 4,398,991 SUMMARY OF THE INVENTION Problems to be Solved by the Invention However, regarding the liquid crystal projector, there is a further improvement in brightness, which is excellent in performance while reducing power consumption to take into consideration the environment. As described above, the relative substrate is known by setting a specific laminated film to improve the transmittance, etc., but the transmittance and the like when used as a liquid crystal panel are not necessarily clear, and further, not only in relative The effect of providing a laminated film on the side of the thin film transistor substrate on the substrate side, or the influence of the number of layers of the refractive index film or the film thickness at this time, is also unclear. The present invention has been made to solve the above problems, and an object of the present invention is to provide a liquid crystal panel for a liquid crystal projector which has excellent light transmittance of the R, G, and B color waves of 201224592 and suppresses variations thereof while producing performance. Also good. Further, the purpose of the present invention is to provide a liquid crystal projector having high performance using a liquid crystal panel for a liquid crystal projector. Means for Solving the Problem A liquid crystal panel for a liquid crystal device of the present invention includes a first substrate portion, a second substrate portion disposed to face the first substrate portion, and a first substrate disposed thereon. The transmittance of light having a wavelength of 450 nm, 550 nm, and 650 nm in the liquid crystal portion between the portion and the second substrate portion is 87% or more. The first substrate portion is a portion of each of the pixel portions of the first substrate main body that is a display portion, and a second laminated film, a second transparent electrode, and a first aligning film are sequentially laminated. In the second substrate portion, a second laminate film, a second transparent electrode, and a second alignment film are sequentially laminated on the second substrate body. The second layer of laminated film is self-aligned with a refractive index of 丨. 9~2. 5 high refractive index film and refractive index is 1. 2~1. The low refractive index film of 5 is formed by a total of 6 layers, and the film thickness of each refractive index film is as follows. The first layer is 1 to 26 nm, the second layer is 1 to 10 nm, and the third layer is 1 to 30 nm. The fourth layer is i to 1 〇〇〇 nm, and the fifth layer is 2 to 41 nm. The layer is 1 to 95 nm. In addition, the sixth layer is preferably 6 to 95 nm. The second laminated film is formed by alternating the laminated refractive index from the second substrate body side. 9~2. 5 south of the refractive index film and a low refractive index film having a refractive index of 12 to 15 are formed in a total of 6 layers, and the film thickness of each refractive index film is as follows: the first layer is 1 to 26 nm 'the second layer is 1 to Onm The third layer is 1 to 30 nm, the fourth layer is 1 to 100 nm, and the fifth layer is 2 to 41 nm, and the sixth layer is 6 to 95 nm. The liquid crystal projector of the present invention has a liquid crystal panel formed to project image information to be projected, and the liquid crystal panel is the above-mentioned 201224592 liquid crystal panel for liquid crystal projection Is according to the present invention. Advantageous Effects of Invention According to the liquid crystal panel for liquid crystal projection of the present invention, a specific laminated film is provided on both of the pair of substrate portions, and in addition to maintaining good productivity, the wavelengths of the respective colors of R, G, and B are increased. Light transmittance, and can also inhibit its variation. Thereby, it can be applied to a liquid crystal projector. According to the liquid crystal projector of the present invention, by using the liquid crystal panel for a liquid crystal projector of the present invention described above, the brightness can be improved and the performance can be improved, and the power consumption can be reduced to take the environment into consideration. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partially enlarged cross-sectional view showing an example of a liquid crystal panel of the present invention. Fig. 2 is a cross-sectional view showing a first substrate portion of the liquid crystal panel in Fig. 1. Fig. 3 is a cross-sectional view showing a second substrate portion of the liquid crystal panel in Fig. 1. Fig. 4 is a graph showing the transmittance of the liquid crystal panels of Examples 1 to 3 and Comparative Example 2. Fig. 5 is a graph showing the relationship between the film thickness and the transmittance of the refractive index film (the third layer of the third embodiment and the second laminated film). I: Embodiment 3 Mode for Carrying Out the Invention Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 1 is a cross-sectional view showing an example of a liquid crystal panel for a liquid crystal projector according to an embodiment (in the first drawing of 201224592, a first large substrate portion 2, and a liquid crystal panel, hereinafter referred to as a liquid crystal panel). In addition, the one-pixel portion is slightly enlarged. The liquid crystal panel i has the liquid crystal portion 4 disposed between the first substrate portion 2 and the second substrate portion 3 such as the second substrate portion 3 that faces the first substrate portion 2. The substrate portion 2 has the i-th substrate body 2 and has a pixel portion inside (i.e., on the main surface side facing the second substrate portion 3). In addition to the driving element 22 such as a thin film transistor (Thin Film ist - 疋 疋 疋 外 等 等 等 各 各 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第The first transparent electrode 24 of the display electrode and the first alignment film 25. In general, a thin film transistor substrate is preferably used as the second substrate portion 2. Further, although not shown, in the case where sufficient transmittance is obtained A substrate crucible or the like may be provided between the first substrate main body 21 and the first laminated film 23, or a protective film or the like may be provided on the first laminated film 23. Further, although not shown, sufficient penetration is provided. In the case of the first substrate body 21, the dustproof glass may be provided on the outer side of the first substrate body 21 to protect the liquid crystal panel 1 from dust or the like in the air. The second substrate portion 3 has the second substrate body 31 and is inside ( In other words, the second laminated film 32, the second transparent electrode 33 serving as the common electrode, and the second alignment film 34 are sequentially laminated on the main surface side facing the first substrate portion 2. It is not indicated that, in the case where sufficient transmittance is obtained, the second substrate body 31 and the A base film or the like is provided between the two laminated films 32, or a protective film or the like is provided on the second laminated film 32. Further, although not shown in the drawing, in the case where sufficient transmittance is obtained, it may be in the second A dust-proof glass is provided on the outer side of the substrate body 31 for protecting the liquid crystal panel 1 from dust or the like in the air. 201224592 On the inner side of the second substrate body 31, a light-shielding member 35 called a black matrix may be provided. For example, as shown in Fig. 1, the light-blocking member 35 is formed in a planar shape together with the second laminated film 32, and can be laminated on the second laminated film 32. Further, although not shown, for example, The light-blocking member 35 is directly laminated on the second substrate body 31. The second laminated film 32 may be provided so as to surround the periphery. As shown in Fig. 2, the first laminated film 23 is formed from the first substrate body 21. The side interaction layer has a refractive index of 1. 9~2. 5 (high refractive index film (refractive-index film 231, 233, 235) having a refractive index of 589 nm, the same as the following) and a refractive index of 1. 2~1. The five low refractive index films (refractive index films 232, 234, and 236) have a total of six layers. The film thickness of each of the refractive index films is as follows: the refractive index film 231 of the first layer is 1 to 26 nm, more preferably 2 to 15 nm, and the refractive index film 232 of the second layer is 1 to 10 nm, more preferably 60. 〜75 nm, the third layer of the refractive index film 233 is 1 to 3 〇 nm, more preferably 5 to 20 nm, and the fourth layer of the refractive index film 234 is 丨~(7)(8)(10), more preferably 55 to 70 nm, and the fifth layer is refracted. The ratio 臈235 is 2 to 41 nm, more preferably 10 to 25 nm, and the refractive index of the sixth layer is 236, more preferably 6 to 95 nm, and particularly preferably 25 to 55 nm. Further, in general, in the viewpoint of production performance and the like, the refractive index film 232 of the second layer of the first laminated film 23 and the refractive index of the fourth layer are preferably transferred. W below. As shown in FIG. 3, the second laminated film 32 is formed by laminating a high refractive index film (refractive index film m 325) having a refractive index of ? 5 and a refractive index of h2 to 15 from the side of the second substrate main body 31. The low refractive index film (refractive index films 322, 324 326) has a total of six layers. The refractive index of each refractive index film is as follows: the refractive index 321 of the layer is 1 to I' is more preferably 2 to ~, and the refractive index film of the second layer is 322 8 201224592 1 to 100 nm, more preferably 60 to 75 nm, The three-layer refractive index film 323 is 1 to 3 〇 nm, more preferably 5 to 2 〇 nrn, and the fourth layer of the refractive index film 324 is 1 to 100 nm. More preferably 60 to 7 〇 nm, and the fifth layer is refracted. The rate film 325 is 2 to 41 nm', more preferably 1 to 25 nm, and the sixth layer of the refractive index film 326 is 6 to 95 nm, more preferably 25 to 55 nm. Further, in the above configuration, when the thickness of the first transparent electrode 24 is 120 to 165 nm, particularly in the case of ~155 nm, the thickness is preferably as follows. The refractive index 臈231 of the first layer of the first laminated film 23 is 3 to 15 nm. The refractive index film 232 of the second layer is 45 to 90 nm, more preferably 60 to 75 nm, and the refractive index film 233 of the third layer is 2 〜16 nm, more preferably 5 to 16 nm, the fourth layer of the refractive index film 234 is 1 to ll Onm, more preferably 55 to 70 mn, and the fifth layer of the refractive index film 235 is 12 to 28 nm, more preferably 12 to 25 nm. The refractive index film 236 of the sixth layer is 19 to 52 fine, more preferably 25 to 35 nm. The refractive index film of the first layer of the second laminated film 32 is 丨~丨, for example, (7), more preferably 2 to 1511 〇1, and the second layer of the refractive index film 322 is 26 to 1〇〇11111, more preferably For the 60 to 75 nm, the third layer of the refractive index film 323 is more preferably 5 to 20 fine 'the fourth layer of the refractive index film 324 is 2 〇 1 to 1 〇 5 wrists, more preferably 60 to 70 mn '5th layer The refractive index film milk is called ^, more preferably 11 to 1 fine, and the sixth layer has a refractive index 貘 326 of 25 to 70 nm, more preferably 25 to 55 nm. When the film thickness of the first moon-transparent electrode 24 is 6 〇 咖 咖 咖 但 但 ’ ’ ’ ’ ’ ’ ’ ’ ’ ’ 。 。 。 10 10 10 10 10 10 10 。 10 。 。 。 。 。 。 。 。 。 。 。 The first! The refractive index film 231 of the first layer of the laminated film 23 is preferably 1 to 12 nm, and the refractive index film 232 of the first layer is 23 to 110 nm, more preferably 201224592 60 to 70 nm, and the third layer of the refractive index film 233 is 7 to 24 nm, more preferably 7 to 20 nm, the fourth layer of the refractive index film 234 is 35 to 103 nm, more preferably 55 to 70 nm, and the fifth layer of the refractive index film 235 is 8 to 23 nm, more preferably 10 The refractive index film 236 of the sixth layer of ~23 nm is 1 to 55 nm, more preferably 25 to 40 nm. The refractive index film 321 of the first layer of the second laminated film 32 is 1 to 20 nm, more preferably 2 to 15 nm, and the refractive index film 322 of the second layer is 20 to 106 nm, more preferably 60 to 75 nm, and the third layer. The refractive index film 323 is 1 to 24 nm, more preferably 10 to 20 nm, the fourth layer of the refractive index film 324 is 1 to 120 nm, more preferably 60 to 70 nm, and the fifth layer of the refractive index film 325 is 8 to 33 nm. More preferably, it is 10 to 25 nm, and the refractive index film 326 of the sixth layer is 20 to 74 nm, more preferably 30 to 55 nm. When the thickness of the first transparent electrode 24 is 10 to 60 nm (except for 60 nm), particularly in the case of 10 to 30 nm, the thickness is preferably as follows. The refractive index film 231 of the first layer of the first laminated film 23 is 1 to 26 nm, more preferably 2 to 15 nm, and the refractive index film 232 of the second layer is 1 to 100 nm, more preferably 60 to 75 nm, and the third layer. The refractive index film 233 is 1 to 30 nm, more preferably 5 to 20 nm, the refractive index film 234 of the fourth layer is 1 to 100 nm, more preferably 60 to 70 nm, and the refractive index film 235 of the fifth layer is 2 to 41 nm. More preferably, it is 10 to 25 nm, and the refractive index film 236 of the sixth layer is 6 to 95 nm, more preferably 40 to 55 nm. The refractive index film 321 of the first layer of the second laminated film 32 is 1 to 26 nm, more preferably 2 to 15 nm, and the refractive index film 322 of the second layer is 1 to 100 nm, more preferably 60 to 75 nm, and the third layer. The refractive index film 323 is 1 to 30 nm, more preferably 5 to 20 nm, the fourth layer of the refractive index film 324 is 1 to 100 nm, more preferably 60 to 70 nm, and the fifth layer of the refractive index film 325 is 10 201224592 2~ 41 nm' is more preferably ι 〇 25 nm, and the refractive index film 326 of the sixth layer is 6 to 95 nm, more preferably 4 Å to 55 nm. The second-layer refractive index film 232 in the first laminated film 23 and the second-layer refractive index film in the second laminated film 32 in the first laminated film 23 are usually viewed from the viewpoint of production performance and the like. The film thickness of the 322 and the fourth-layer refractive index film 324 is preferably 200 nm or less, and more preferably 150 nm or less. The film thickness of the second transparent electrode 33 is preferably from 1 to 30 nm, more preferably from 15 to 25 nm, particularly preferably from 18 to 22 nm. According to the liquid crystal panel 1, the first laminated film 23 having a specific configuration is provided in the second substrate portion 2, and the second laminated film 32 having a specific configuration is provided in the second substrate portion 3, so that only the conventional laminated film 32 is used. If one of the substrate portions has a laminate, the transmittance of light of each color can be improved, and the variation in the transmittance of each color can be suppressed. Specifically, the transmittance of light having wavelengths of 450 nm, 550 nm, and 650 nm can be 87% or more. Further, the variation value of the difference between the maximum value and the minimum value of the light transmittance in the range of 4 〇〇 to 7 〇〇 nm in wavelength can be expressed by less than 1% by weight, preferably 5% or less. Further, for example, the maximum value of the light transmittance in the range of 4 〇〇 to 7 〇〇 nm is 90%, and the minimum value is 86 °/. In the case of a variable value, the value can be found to be 90%-86%=4%. For example, in the case of an IT substrate (lndium Tin Oxide) film which is a transparent electrode as a quartz substrate as a substrate body as in the prior art, the refractive index of the quartz substrate is about 1. 46, and the refractive index of the ΐτ film is about 2, so it is not always possible to obtain sufficient transmittance due to the difference in the equal refractive index. Furthermore, although it is known to provide a laminated film for the transmittance of 201224592 which is one of the liquid crystal panels and one of the quartz substrates, it is known to be disposed on both of the quartz substrates. The effect at the time of laminating the film or the optimum film thickness of each of the refractive index films in each laminated film is not necessarily clear. According to the liquid crystal panel 1, the first laminated film 23 is provided in the first substrate portion 2, and the second laminated film 32 is provided in the second substrate portion 3, and the first laminated film 23 and the second laminated film are formed. The respective number of layers of 32 and the film thickness of each of the refractive index films are specified to effectively alleviate the difference in refractive index between the first substrate body 21 and the first transparent electrode 24, and the second substrate body 31 and the second transparent electrode 33. The difference in refractive index makes it possible to improve the transmittance of the liquid crystal panel 1 as a whole, and also to suppress variations in the transmittance. Further, since the manufacturing process is not necessarily increased as compared with the conventional liquid crystal panel, the production performance can be ensured. When the number of layers of the refractive index film in the first laminated film 23 or the second laminated film 32 is less than six, the light transmittance of the respective color wavelengths of r, g, and B may not be sufficiently improved. And its changes can not be fully suppressed. If the first! When the number of layers of the refractive index film in the laminated film 23 and the second laminated film 32 is six, the light transmittance of each of the R, G, and B wavelengths can be sufficiently increased, and the fluctuation can be sufficiently suppressed. In the present invention, the number of layers may be equal to or greater than the number of layers described above. However, when the number of layers is too large, the number of layers may be increased, and the production process may be increased to lower the production performance. In the case where the film thickness of the refractive index film of any of the first to sixth layers of the first laminate film 23 or the second laminate film 32 falls outside the above range, even if the number of layers of the refractive index film is In the case of six layers, it is not always possible to sufficiently increase the light transmittance of the respective color wavelengths of the ruler, G, and B, and it is not possible to sufficiently suppress the variation. When the film thickness of the refractive index film exceeds the above range, there is a fear that the light transmittance of the wavelengths of R, g, and b between 201224592 cannot be sufficiently raised, and the 'SJ· is not sufficiently suppressed. The increase in membrane time may lead to a reduction in productivity. The first substrate body 21 and the second substrate body 31 may not be limited by the light transmissive material. For example, crystallized glass can be used, and the reason for the gate transmittance and the low thermal expansion is most suitable for using a quartz substrate. Further, the thicker sound and/or the like are not necessarily limited, and it is generally preferable that the first substrate body 21 and the second substrate body 31 have mutually different materials and thicknesses. The high refractive index film (refractive index film 231, 233, 235) of the first laminated film 23 and the high refractive index film (refractive index film 32, 323, 325) of the two laminated yoke 32 are refracted by two. 5 people. As such a substance, there may be mentioned, for example, a group of 匕 (refractive index: 2. 〇~2. 2), titanium oxide (refractive index: 2. 2~2_5), oxidation rate. L9 2, 〇) and oxidation (refractive index: 1. 95~2. 15) High-definition (4) At least one of the materials selected. In the meantime, it is preferable that the electrode 24 and the second transparent electrode 33 are in view of the observation of the deterioration of the heat treatment due to the formation of the ITO film, and it is preferable that the electrode is excellent in oxygen. The 6-layer south refractive index film can be composed of the same high refractive index, or can be composed of a different high refractive index material. Again, a total of 6 layers of high refractive index Each layer of the film may be a single layer or a multilayer film. In the case of a multilayer film, 3 constituting the multilayer film may be composed of the above-mentioned south refractive index material. The low refractive index film (refractive index films 232, 234, 236) of the first laminate film 23, 13 201224592 '324, 326) are refracted, and self-oxidation is exemplified. 35~1. 41) and the like, the low refractive index film of the second laminate film 32 (the refractive index film 322 rate is 1. 2~1. 5 people. For such a substance, Shi Xi (refractive index: MM·48) and smashing lock (folding material: at least one selected from the refractive index materials). The low refractive index film of 叮立...(10) is also high. The refractive index film is the same, and may be composed of a low refractive index material which is different from each other (4). The low refractive index of the 6 layers of the combined juice may be a single system or may be In the case of a multilayer film, the layers constituting the multilayer layer may be composed of the above-mentioned low refractive specific materials. The total thickness of the first laminated film 23 is thick, that is, from the second layer refractive index film (3) to the sixth layer. The total film thickness of the layer-index film 236 is preferably (9) to (10). Further, the total thickness of the first layered film 32, that is, the total film thickness of the self-refractive Liu 2 (four) 6-layer refractive film 326 is preferably (9) to 25G (10). When the total film thickness is 150 nm or more, the light transmittances of the respective colors of the colors R, G, and B are effectively increased, and the fluctuation can be effectively suppressed. Further, as long as the total film thickness is 250, that is, Can fully improve the penetration rate, etc., but if it exceeds this value, it will increase the money time and reduce the production performance. The film thickness of the i-th laminated film 23 is preferably from 18 〇 to 23 〇 nm, more preferably 190 220 nm, and the total thickness of the second layer film 32 is more preferably 2 〇〇 23 23 nm. Further, it is more preferably 210 to 220 nm. The total film thickness of the second layer refractive index film 232 and the fifth layer refractive index film 235 in the first laminated film 23 is preferably 55 to nm. Further, the second laminated film The total film thickness of the second-layer refractive index film 322 and the fifth-layer refractive index film milk in % is preferably 201224592. In the case of a high-refractive-index film and a low-refractometer 6-layer, the first and second layers are laminated. The lamella group has a large difference between the film layer of the film and the 4th to 6th layer of the refractive index film, which will be in the first to third layer of the refractive index film group, the second layer of the refractive index film and The total film thickness of the fourth to intermediate layer refractive index film is set to be lower in the fifth time of the intermediate layer in the above-mentioned group, and the production performance is lowered, and the == two suppression is effective due to the film penetration rate. The ground wave and the B color wave sound 兀T effectively suppress the fluctuation. The i-th second-layer refractive index film 232 and the fifth-layer refractive _ two second laminated film Ur, 1, further preferably 75 〜. Furthermore, the combination: The second-layer refractive index film 322 is thicker than the fifth-layer refractive index film 325, and the total film rate of the odd-numbered high-refractive-index film of the odd-numbered layer of the laminated film 23 is 235^1, the refractive index film 231, and the third-layer refractive index. The film thickness of the film 233 and the fifth layer is preferably (4) nm, and the total film thickness of the second layer film η 321° and/or the two refractive index films, that is, the first layer of the refractive index film, The total film thickness of the layer-refractive-index film 323 and the fifth-layer refractive index film 325 is preferably 1 〇 to 6 5 nm. By setting in this way, it is possible to suppress a decrease in production performance due to an increase in film formation time, and it is possible to The light transmittance of each color wavelength is effectively increased, and the variation thereof can be effectively suppressed. The combined thickness of the first laminated film 23 and the high refractive index film of the laminated film 32 + is more preferably 20 to 55 nm, still more preferably 30 to 45 nm. Eight ▲ another - aspect ' becomes the low refractive index film of the even layer of the first laminate film 23'. The total film thickness of the ten film thickness ' gp second layer refractive index film 232 and the fourth layer refractive index film the sixth layer refractive index film 236 is preferably 13 Å to 2 〇 5 nm. Further, 15 201224592 is the total film thickness of the low refractive index film which is the even layer of the second laminate film 32, that is, the total of the second layer refractive index film 322, the fourth layer refractive index film 324, and the sixth layer refractive index film 326. The film thickness is preferably 150 to 205 nm. By setting in this way, it is possible to suppress a decrease in the production performance due to an increase in the film formation time, and it is possible to effectively increase the light transmittance of the respective color wavelengths of R, G, and B, and to effectively suppress the variation thereof. The total film thickness of the low refractive index film of the first laminate film 23 is more preferably from 140 to 195 nm, still more preferably from 150 to 185 nm. Further, the total film thickness of the low refractive index film of the second laminate film 32 is more preferably 160 to 195 nm, still more preferably 170 to 185 nm. The surface roughness of the surface of the refractive index film 236 which is the sixth layer of the first laminate film 23 on the side of the second substrate portion 3 is preferably 0. Below 5nm. Similarly, the refractive index film 326 which is the sixth layer of the second laminate film 32 has a surface roughness of 0. Below 5nm. By setting the surface roughness of the above surface to 0. When the ITO film is laminated at 5 nm or less, the decrease in the transmittance in the interface such as the above can be effectively suppressed. Further, the surface roughness is measured in accordance with JIS B0601. The first transparent electrode 24 and the second transparent electrode 33 are each preferably an ITO film. Although the film thickness of the first transparent electrode 24 and the second transparent electrode 33 is not necessarily limited, the film thickness of the first transparent electrode 24 is preferably 10 to 165 nm, and the film thickness of the second transparent electrode 33 is preferably 10 to 30 nm. When the film thickness of the first transparent electrode 24 and the second transparent electrode 33 is within this range, by providing the first laminated film 23 and the second laminated film 32, light of respective wavelengths of R, G, and B can be obtained. The penetration rate is effectively increased, and the variation can be effectively suppressed. The first alignment film 25 and the second alignment film 34 may be, for example, a polyamidoquinone-based organic compound lanthanum treated by rubbing (for 16201224592) or a vapor-bonded inorganic material such as iridium oxide by oblique vapor deposition. Membrane and the like. The film thickness of the first alignment film 25 and the second alignment film 34 is not necessarily limited. The film thickness of the first alignment film 25 is preferably 40 to 80 nm, more preferably 50 to 70 nm, and the film thickness of the second alignment film 34 is preferably 15 to 55 nm, more preferably 25 to 45 nm. When the film thickness of the first alignment film 25 and the second alignment film 34 is within this range, by providing the first laminated film 23 and the second laminated film 32, wavelengths of respective colors of R, G, and B can be obtained. The light transmittance is effectively increased, and the variation can be effectively suppressed. The liquid crystal unit 4 may be composed of liquid crystal molecules in which one or several types of nematic liquid crystals are mixed, and is enclosed between the first substrate portion 2 and the second substrate portion 3, and is provided by the first alignment film 25 and the second layer. The alignment film 34 is aligned. The liquid crystal panel 1' can be manufactured in the same manner as the conventional liquid crystal panel except that the first laminate film 23 is provided on the first substrate portion 2 and the second laminate film 32 is provided on the second substrate portion 3. The first laminate film 23 is formed by alternately laminating a high refractive index film (refractive index films 231, 233 ' 235) and a low refractive index film (refractive index film 232, on the first substrate body 21 by a known sputtering method. 234, 236) Each of the three layers is a total of six layers. Similarly, the second laminate film 32 can be alternately laminated on the second substrate body 31 by a known sputtering method with a high refractive index film (refractive index films 321, 323, 325) and a low refractive index film (refractive index). The membranes 322, 324, and 326) were each obtained by combining three layers of three layers. The sputtering method can be exemplified by, for example, a DC (direct current) sputtering method, an AC (AC) sputtering method, a high-frequency sputtering method, and a magnetron sputtering method. Further, a vacuum deposition method may be used except for the sputtering method, and as the vacuum deposition method, there may be an ion plating method or an ion assist method. In general, from the stability of the process to the large area of the 17 201224592 film is easier and the stability of the film thickness control stability, it should be DC magnetron sputtering, AC magnetron sputtering, ion plating, Ion assisted method. As for the oxidation button, the titanium oxide, the cerium oxide, and the oxidation of the high refractive index film, for example, a metal element constituting the metal oxide may be used as a target, and a gas containing oxygen may be used. It is easily formed by a reactive sputtering method as a sputtering gas. Further, as for the oxidized layer as the low refractive index film, for example, tantalum nitride can be used as the dry material 'and a gas containing oxygen is used as the sputtering gas, and the reactive sputtering method is used. Easy to form. Further, in the light material, a known dopant such as Al, Si or Zn can be doped without deviating from the gist of the present invention. When the first laminated film 23 is formed on the first substrate main body 21, the first transparent electrode 24 and the first alignment film 25 are sequentially laminated on the first laminated film 23 by a known method, and the first laminated film 23 is formed. Substrate portion 2. On the other hand, the second laminated film 32 is formed on the second substrate body 31, and the second transparent electrode 33 and the second alignment film 34 can be sequentially laminated on the second laminated film 32 by a known method. The second substrate portion 3 is formed. After that, the first substrate portion 2 and the second substrate portion 3 are disposed to face each other, and the liquid crystal portion 4 is formed by enclosing liquid crystal between them, thereby forming the liquid crystal panel 1. Such a liquid crystal panel 1 is used by being disposed inside a liquid crystal projector. In the liquid crystal panel 1, as shown in Fig. 1, light from a light source is incident on the side of the first substrate portion 2, and the incident light is emitted from the side of the second substrate portion 3 by adjustment of the liquid crystal panel 1, and finally by projection The lens is projected onto the object to be placed outside. With respect to the liquid crystal projector having such a liquid crystal panel 1, the liquid crystal panel 1 has excellent light transmittances of wavelengths of R, G, and B colors, and since the variation is also suppressed by 18 201224592, brightness can be improved as a projector excellent performance. At the same time, it can also reduce the power consumption, and consider the environment. EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples. The liquid crystal panel 1 of Examples 1 to 3 was produced as follows, based on the optimum film configuration for obtaining the first laminated film 23 and the second laminated film 32 by calculation. Further, for comparison, a liquid crystal panel 1 (Comparative Example 1) having no first laminate film 23 and second laminate film 32 and a liquid crystal panel 1 having only second laminate film 32 (Comparative Example 2) were produced. Here, the liquid crystal panel 1 of the first to third embodiments has an optimum film structure in which the thickness of the first transparent electrode 24 is 145 nm, 100 nm, and 20 nm, respectively. In the liquid crystal panel 1, the light transmittance of the wavelength of 450 nm, 55 Onm, and 65 Onm in the liquid crystal panel 1 is 87% or more, and the optimum film constitution is determined by the following conditions. The first substrate body 21 is a quartz substrate (thickness 1. 2 mm, refractive index 1·47), and the first transparent electrode 24 is an ITO film (refractive index of 1. 88), the first alignment film 25 is a polyimide film (thickness 60 nm, refractive index 1. 56) The second substrate body 31 is a quartz substrate (thickness 1. 2mm, refractive index 1. 47) The second transparent electrode 33 is an ITO film (thickness: 20 nm, refractive index: 1. 88) The second alignment film 34 is a polyimide film (thickness: 36 nm, refractive index: 1. 56) The liquid crystal portion 4 is a nematic liquid crystal (thickness: 2·5 μηι, refractive index 1. 57). Further, the first laminated film 23 and the second laminated film 32 have a structure of six layers, respectively, and the high refractive index film is yttrium oxide (refractive index of 2. 14), the low refractive index film is yttrium oxide (refractive index 1. 46). (Example 1) 19 201224592 The liquid crystal panel is produced as the first film according to the optimum film configuration when the thickness of the first transparent electrode 24 is i45 nm (see Table 1, the first laminated film and the second laminated film). On the quartz substrate of the substrate body 21, a total of six layers of a ruthenium oxide film as a high refractive index film and a three-layer ruthenium oxide film as a low refractive index film are laminated in a common film thickness by the following method.丨 laminated film. In the first laminate film 23, the IT film is formed as the first transparent electrode 24 by sputtering, and the first alignment film 25 is formed to become the i-th substrate portion 2. Further, on the quartz substrate as the second substrate body 3, a total of three layers of a ruthenium oxide film as a high refractive index film and a ruthenium oxide film as a low refractive index film are laminated in a specific film thickness by the following method. Six layers are formed to form the second laminated film 32. On the second laminate film 32, a no-film is formed as a second transparent electrode 33 by sputtering, and a second alignment film 34 is formed as the second substrate portion 3. Thereafter, a liquid crystal panel is formed by enclosing a liquid crystal portion 4' between the first substrate portion 2 and the second substrate portion 3, and the thickness of each portion is the same as the above-described condition. [Formation of yttrium oxide film] In the vacuum chamber, a Ta material as a dry money is placed on the cathode, and the vacuum chamber is exhausted to become 2GxlQ. After 3pa or less, the oxygen gas 6〇SCCm and the argon gas 14Gseem are introduced as the gas. The pressure at this time is 3. 〇xl〇】Pa〇 is a thermal reaction from jj, by using a DC pulse power supply to carry out the reaction & splashing it in the vacuum chamber as a set of processed object of the quartz substrate or sequentially formed with a refractive index On the film, an oxidized film is formed. Another 'oxidation button 20 201224592 The film thickness of the film is mainly controlled by the adjustment between the splashes (four). [Formation of yttrium oxide film] The 'in the groove' is placed on the cathode as a Si material, and the real tank is evacuated to 2Gxl(). After 3pa or less, the argon gas 21〇Sccm and the oxygen gas are used as the de-plating gas. The pressure at this time becomes 3. 4x10 pa. In this state, the reaction is carried out by using a power source. In the vacuum chamber, a quartz substrate as a target object to be processed or a refractive index film is formed in this order to form an oxide layer. $, the film thickness of the oxidized stone film is mainly controlled by the adjustment of the sputtering time. (Example 2) The liquid crystal panel 1 was produced by the optimum film configuration (see Table 1, first laminated film, and second laminated film) when the thickness of the first transparent electrode 24 was 〇〇ηη. In the same manner as in the first embodiment, the liquid crystal panel p was produced in the same manner as in the first embodiment. (Example 3) The optimum film structure when the thickness of the first transparent electrode 24 was 20 nm (see Table 1, the first laminate film, the first layer) Two layers of film) were used to fabricate the liquid crystal panel 1. Further, a liquid crystal panel 1 was produced in the same manner as in Example 1 except for the above film configuration. (Comparative Example 1) A liquid crystal panel 1 in which the first laminated film 23 and the second laminated film 32 were not provided was produced. In other words, the first transparent electrode 24 and the first alignment film 25 are directly laminated on the first substrate body 21 as the first substrate portion 2, and the second transparent electrode 33 is directly laminated on the second substrate body 31. The second alignment film 34 is used as the second substrate portion 3'. Thereafter, the liquid crystal panel 1 is produced in the same manner as in the first embodiment. Further, the film thickness of the second transparent electrode 33 was 145 nm. 21 201224592 (Comparative Example 2) The first laminate film 23 is not provided, and only the second laminate film 32 is provided to produce the liquid crystal panel 1. In other words, the first transparent electrode 24 and the first alignment film 25 are directly laminated on the first substrate main body 21 as the first substrate portion 2, and the second laminated film 32 is passed through the second laminated film 32. The second transparent electrode 33 and the second alignment film 34 are formed as the second substrate portion 3, and thereafter, the liquid crystal panel 1 is produced in the same manner as in the first embodiment. The configuration of the second laminate film 32 is as described in the first embodiment of Japanese Patent No. 4499180. [Table 1] Configuration of Liquid Crystal Panel Example 1 Example 2 Example 3 Comparative Example 1 Comparative Example 2 Second substrate body (S-British substrate) __________ 2nd layer 1 Ta2C^(nm) 6 6 6 - 10 2 layers Si〇2(nm) 67 67 67 — 56 2 Chips 3rd layer Ta2Cfe(nm) 14 14 14 — 40 Substrate 4th layer Si〇2(nm) 65 65 65 — 17 Part 5 of the film Ta2C% (nm) 18 18 18 — 64 6th layer Si〇2(nm) 46 46 46 — 48 ITO film (nm) 20 20 20 145 20 Alignment film (nm) 36 36 36 36 36 Liquid crystal --- — alignment film ( Nm) 60 60 60 60 60 ITO film (rim) 145 100 20 145 145 6th layer Si〇2(nm) 30 32 46 — — 2 1 Layer 5 Ta2C% (nm) 18 17 18 — — | Layer 4 layers of Si〇2(nm) 62 61 65 — — night m film layer 3 Ta2C^(nm) 12 13 14 — — 2nd layer Si〇2(nm) 68 65 67 — — 1st layer Ta2C^( Nm) 7 7 6 — — 1st substrate body ffi English substrate— Next, evaluation of the transmittance of the liquid crystal panel 1 of the examples and the comparative examples was carried out. Further, the evaluation of the transmittance is carried out, for example, by an automatic recording spectrophotometer of the Hitachi U4000 type. The result is shown in Fig. 4. In the liquid crystal panel 1 of Comparative Example 1 in which both the first laminate film 23 and the second laminate film 32 are not provided, it is understood that the transmittance in the low wavelength region and the high wavelength region is less than 87%, and the medium wavelength region and The change in penetration rate in other regions also increased from 201224592. Further, in the liquid crystal panel 1 of Comparative Example 2 in which only the second laminate film 32 is provided, it is understood that the transmittance of the liquid crystal panel 1' of Comparative Example 1 is improved as a whole, but the low wavelength region and the high wavelength are obtained. The penetration rate of the area is still less than 87°/. And the variation in the transmittance of the medium wavelength region and other regions also becomes large. On the other hand, in the liquid crystal panel 1 of Examples 1 to 3 in which both the first laminated film 23 and the second laminated film 32 are provided, it is understood that 87% of the wavelengths of 450 nm, 550 nm, and 650 nm are obtained. The above penetration rate. Further, in the liquid crystal panel 1' of the first to third embodiments, the variation of the transmittance in the range of 400 to 75 nm is found to be 4% or less. Next, the liquid crystal panel 1 of the first embodiment (when the thickness of the first transparent electrode 24 is 145 nm), the liquid crystal panel 1 of the second embodiment (when the thickness of the first transparent electrode 24 is 100 nm), and the liquid crystal of the third embodiment In the film configuration of the panel 丨 (when the thickness of the first transparent electrode 24 is 20 nm), the film thickness of each of the refractive index films of the first laminated film 23 and the second laminated film 32 is determined by calculation. Range (minimum, maximum). In addition, the allowable range is the difference between the maximum and minimum values of the transmittance of light having a wavelength of 450 nm, 550 nm, and 650 nm of 87% or more and a wavelength of 4 〇〇 to 75 〇 11111. The variation value indicated is in the range of 1% or less. In addition, the allowable range is a range in which the film thickness of only one layer of the refractive index film is changed from the basic structure (base film thickness), and the film thickness of all the other refractive index films is used as a basic structure (basic film thickness). Table 2 shows the allowable _ (minimum value, most recorded) of the film thickness of each refractive index film in the liquid crystal panel of Example ,, the minimum value and the best transmittance (450 nm, 550 nm, 650 nm), Change value. Similarly, Tables 3 and 4, Table 23, 201224592, show the results of the liquid crystal panel of Example 2 and the liquid crystal panel 1 of Example 3. Moreover, the fifth chart is not the liquid crystal panel of the third embodiment! In the middle layer, the film thickness of the second layer refractive index film 322 of the second laminate film (indicated by 2L in Fig. 5) is changed in the inside of the face. [Table 2] Table 2nd laminated film 1st laminated film
24 201224592 折射率膜 基本膜厚 [nm] 膜厚容許範圍 [nm] 穿透率[%] 變動値 [%] 450nm 550nm 650nm 第 2 層 積 膜 第1層 6 最小値 1 88.3 89.0 88.8 1.4 最大値 20 87.0 87.7 87.3 3.2 第2層 67 最小値 20 87.0 88.0 88.6 1.8 最大値 106 87.0 89.2 88.6 2.4 第3層 14 最小値 1 87.6 87,7 87.9 2.6 最大値 24 87.1 88.4 88.6 1.7 第4層 65 最小値 1 78.2 88.3 87.6 4.8 最大値 120 87.5 87.3 87.1 3.0 第5層 18 最小値 8 87.2 88.5 88.5 3.1 最大値 33 87.2 87.9 87.8 2.8 第6層 46 最小値 20 87.0 87.8 88.4 2.6 最大値 74 87.1 89.2 88.8 3.2 第 1 層 積 膜 第1層 7 最小値 1 90.2 87.5 88.7 2.7 最大値 12 87.3 89.9 88.8 2.6 第2層 65 最小値 23 90.0 87.2 87.3 4.0 最大値 110 89.4 86.9 89.8 4.1 第3層 13 最小値 7 87.1 89.9 89.2 3.0 最大値 24 90.4 87.1 87.1 3.8 第4層 61 最小値 35 87.0 88.3 89.3 2.7 最大値 103 87.1 90.4 88.7 4.2 第5層 17 最小値 δ 89.6 87.0 87.1 3.6 最大値 23 87.2 89.5 89.6 2.5 第6層 32 最小値 1 90.3 88.7 88.3 2.3 最大値 55 87.0 87.3 88.2 3.2 【表4】 25 201224592 折射率膜 基本膜厚 [nm] 膜厚容許範圍 [nm] 穿透率[%] 變動値 [%] 450nm 550nm 650nm 第 2 m 積 膜 第1層 6 最小値 1 97.8 98.5 99.0 1.1 最大値 26 87.7 88.9 89.0 6.4 第2層 67 最小値 1 88.8 90.5 91.7 3.0 最大値 _ — — — — 第3層 14 最小値 1 90.6 90.3 91.0 2.9 最大値 30 87.1 89.5 91.2 4.9 第4層 65 最小値 1 89.8 90.6 90.4 5.2 最大値 — — — — —— 第5層 18 最小値 2 87.1 90.0 91.2 8.2 最大値 41 87.0 89.2 90.0 9.4 第6層 46 最小値 6 87.0 89.6 91.2 7.5 最大値 95 87.1 90.8 91,6 8.9 第 1 層 積 膜 第1層 6 最小値 1 97.8 98.5 99.0 1.1 最大値 26 87.7 88.9 89.0 6.4 第2層 67 最小値 1 88.8 90.5 91.7 3.0 最大値 — — — — — 第3層 14 最小値 1 90.6 90.3 91.0 2.9 最大値 30 87.1 89.5 91.2 4.9 第4層 65 最小値 1 89.8 90.6 90.4 5.2 最大値 — —— — — — 第5層 18 最小値 2 87.1 90.0 91.2 8.2 最大値 41 87.0 89.2 90.0 9.4 第6層 46 最小値 6 87.0 89.6 91.2 7.5 最大値 95 87.1 90.8 91.6 8.9 由實施例1至3的結果可以明確瞭解到，不論第1透明電 極24的厚度為何，就有關具有同一層編號之折射率膜，係 成為大約類似的最適膜厚（基本膜厚）。又，由表2〜4中可以 明確瞭解到，即使就有關自最適膜厚（基本膜厚）的容許範 圍，亦在有關具有同一層編號之折射率膜，基本上落入一 定程度的範圍内。因此，可瞭解到作為與第1透明電極24的 厚度無關之各折射率膜的容許範圍，係採用表2〜4中所示之 各折射率膜的最小值與最大值而成為以下者。 第1層積膜23中之各折射率膜的膜厚如下：第1層之折 射率膜231為1〜26nm，第2層之折射率膜232為1〜lOOOnm， 第3層之折射率膜233為1〜30nm，第4層之折射率膜234為 1〜lOOOnm，第5層之折射率膜235為2〜41nm，第6層之折射 26 201224592 率膜236為1〜95nm。第2層積膜32中之各折射率膜的膜厚如 下.第1層之折射率膜321為1〜26nm，第2層之折射率膜322 為1〜lOOOnm，第3層之折射率膜323為，第4層之折 射率膜324為1〜l〇00nm，第5層之折射率膜325為2〜4inm， 第6層之折射率膜326為6〜95nm。 更佳為以下表示者。第丨層積膜23中之各折射率膜的膜 厚如下：第1層之折射率膜231為2〜1511〇1，第2層之折射率 膜232為60〜75nm，第3層之折射率膜233為5〜2〇nm，第4層 之折射率膜234為55〜70nm，第5層之折射率膜235為 10〜25nm，第6層之折射率膜236為25〜55nm。第2層積膜32 中之各折射率膜的膜厚如下：第丨層之折射率膜321為 2〜15nm，第2層之折射率膜322為6〇〜75nm，帛3層之折射率 膜323為5~20nm，第4層之折射率膜324為6〇〜7〇nm，第5層 之折射率膜325為10〜25mn，第6層之折射率膜似為 25〜55nm 〇 另，在此引用已於2〇10年12月2日提申之日本特許出願 2010-269502號的說明書、申請專利範圍、圖式及摘要的全 部内容，並作為本發明說明書之揭示内容予以納入。 【圖式簡單說*明】 第1圖是表示本發明液晶面板之一例的部分擴大截面 圖。 第2圖是表示第i圖中液晶面板之第i基板部的戴面 圖。 第3圖是表示第i圖中液晶面板之第2基板部的截面 27 201224592 圖。 第4圖是表示實施例1〜3及比較例卜2之液晶面板的 穿透率圖。 第5圖是表示折射率膜（實施例3、第2層積膜之第2層） 的膜厚與穿透率的關係圖。 【主要元件符號說明】 1...液晶面板 231...第1層折射率膜 2...第1基板部 232…第2層折射率膜 3...第2基板部 233...第3層折射率膜 4...液晶部 234…第4層折射率膜 21...第1基板本體 235…第5層折射率膜 22...驅動元件 236…第6層折射率膜 23…第1層積膜 321…第1層折射率膜 24...第1透明電極 322...第2層折射率膜 25...第1配向膜 323...第3層折射率膜 31...第2基板本體 324…第4層折射率膜 32...第2層積膜 325...第5層折射率膜 33...第2透明電極 326…第6層折射率膜 34...第2配向膜 35...遮光性構件 2824 201224592 Refractive index film base film thickness [nm] Film thickness allowable range [nm] Transmittance [%] Variation 値 [%] 450nm 550nm 650nm 2nd laminate film 1st layer 6 Minimum 値 1 88.3 89.0 88.8 1.4 Maximum 値20 87.0 87.7 87.3 3.2 Layer 2 67 Minimum 値 20 87.0 88.0 88.6 1.8 Maximum 値 106 87.0 89.2 88.6 2.4 Level 3 14 Minimum 値 1 87.6 87, 7 87.9 2.6 Maximum 値 24 87.1 88.4 88.6 1.7 Level 4 65 Minimum 値 1 78.2 88.3 87.6 4.8 Maximum 値 120 87.5 87.3 87.1 3.0 5th layer 18 Minimum 値 8 87.2 88.5 88.5 3.1 Maximum 値 33 87.2 87.9 87.8 2.8 6th layer 46 Minimum 値 20 87.0 87.8 88.4 2.6 Maximum 値 74 87.1 89.2 88.8 3.2 Level 1 Film 1st layer 7 Minimum 値1 90.2 87.5 88.7 2.7 Maximum 値12 87.3 89.9 88.8 2.6 2nd layer 65 Minimum 値23 90.0 87.2 87.3 4.0 Maximum 値110 89.4 86.9 89.8 4.1 3rd layer 13 Minimum 値7 87.1 89.9 89.2 3.0 Maximum値24 90.4 87.1 87.1 3.8 4th layer 61 Minimum 値35 87.0 88.3 89.3 2.7 Maximum 値103 87.1 90.4 88.7 4.2 Layer 5 17 Minimum 値δ 89.6 87.0 87.1 3.6 Maximum 値23 87.2 89.5 89.6 2.5 6 32 Minimum 値1 90.3 88.7 88.3 2.3 Maximum 値55 87.0 87.3 88.2 3.2 [Table 4] 25 201224592 Refractive index film base film thickness [nm] Film thickness allowable range [nm] Transmittance [%] Variation 値 [%] 450nm 550nm 650nm 2m film first layer 6 minimum 値1 97.8 98.5 99.0 1.1 maximum 値26 87.7 88.9 89.0 6.4 second layer 67 minimum 値1 88.8 90.5 91.7 3.0 max 値_ — — — — 3rd layer 14 min 値 1 90.6 90.3 91.0 2.9 Maximum 値 30 87.1 89.5 91.2 4.9 Level 4 65 Minimum 値 1 89.8 90.6 90.4 5.2 Maximum 値 — — — — — Layer 5 18 Minimum 値 2 87.1 90.0 91.2 8.2 Maximum 値 41 87.0 89.2 90.0 9.4 Level 6 46 Minimum 値6 87.0 89.6 91.2 7.5 Maximum 値95 87.1 90.8 91,6 8.9 1st laminated film 1st layer 6 Minimum 値1 97.8 98.5 99.0 1.1 Maximum 値26 87.7 88.9 89.0 6.4 2nd layer 67 Minimum 値1 88.8 90.5 91.7 3.0 Maximum 値 — — — — 3rd layer 14 Minimum 値 1 90.6 90.3 91.0 2.9 Maximum 値 30 87.1 89.5 91.2 4.9 Level 4 65 Minimum 値 1 89.8 90.6 90.4 5.2 Maximum 値 — —— — — — Layer 5 18 Minimum値 2 87.1 90.0 91.2 8.2 Maximum 値 41 87.0 89.2 90.0 9.4 6th layer 46 Minimum 値 6 87.0 89.6 91.2 7.5 Maximum 値 95 87.1 90.8 91.6 8.9 It can be clearly understood from the results of Examples 1 to 3 that the first transparent electrode 24 The thickness of the film with the same layer number is about the optimum film thickness (base film thickness). Further, it can be clearly understood from Tables 2 to 4 that even in the allowable range from the optimum film thickness (base film thickness), the refractive index film having the same layer number is substantially within a certain range. . Therefore, it is understood that the allowable range of each refractive index film irrespective of the thickness of the first transparent electrode 24 is as follows using the minimum value and the maximum value of the respective refractive index films shown in Tables 2 to 4. The film thickness of each of the refractive index films in the first laminate film 23 is as follows: the refractive index film 231 of the first layer is 1 to 26 nm, and the refractive index film 232 of the second layer is 1 to 100 nm, and the refractive index film of the third layer 233 is 1 to 30 nm, the refractive index film 234 of the fourth layer is 1 to 100 nm, the refractive index film 235 of the 5th layer is 2 to 41 nm, and the refractive index of the sixth layer is 26 201224592. The film 236 is 1 to 95 nm. The film thickness of each of the refractive index films in the second laminate film 32 is as follows: the refractive index film 321 of the first layer is 1 to 26 nm, and the refractive index film 322 of the second layer is 1 to 100 nm, and the refractive index film of the third layer is 323 is that the refractive index film 324 of the fourth layer is 1 to 100 nm, the refractive index film 325 of the fifth layer is 2 to 4 inm, and the refractive index film 326 of the sixth layer is 6 to 95 nm. More preferably, the following is indicated. The film thickness of each of the refractive index films in the second layer laminated film 23 is as follows: the refractive index film 231 of the first layer is 2 to 1511 〇 1, and the refractive index film 232 of the second layer is 60 to 75 nm, and the refractive layer of the third layer The rate film 233 is 5 to 2 〇 nm, the fourth layer of the refractive index film 234 is 55 to 70 nm, the fifth layer of the refractive index film 235 is 10 to 25 nm, and the sixth layer of the refractive index film 236 is 25 to 55 nm. The film thickness of each of the refractive index films in the second laminated film 32 is as follows: the refractive index film 321 of the second layer is 2 to 15 nm, and the refractive index film 322 of the second layer is 6 〇 to 75 nm, and the refractive index of the 帛 3 layer The film 323 is 5 to 20 nm, the fourth layer of the refractive index film 324 is 6 〇 to 7 〇 nm, the fifth layer of the refractive index film 325 is 10 to 25 mn, and the sixth layer of the refractive index film is 25 to 55 nm. The entire contents of the specification, the scope of the application, the drawings and the abstract of the Japanese Patent Application No. 2010-269502, filed on Dec. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partially enlarged cross-sectional view showing an example of a liquid crystal panel of the present invention. Fig. 2 is a perspective view showing the i-th board portion of the liquid crystal panel in Fig. i. Fig. 3 is a cross-sectional view showing the second substrate portion of the liquid crystal panel in Fig. 19, 201224592. Fig. 4 is a graph showing the transmittance of the liquid crystal panels of Examples 1 to 3 and Comparative Example 2. Fig. 5 is a graph showing the relationship between the film thickness and the transmittance of the refractive index film (the third layer of the third embodiment and the second laminated film). [Description of main component symbols] 1: liquid crystal panel 231... first layer refractive index film 2... first substrate portion 232... second layer refractive index film 3... second substrate portion 233... Third layer refractive index film 4: liquid crystal portion 234... fourth layer refractive index film 21: first substrate body 235... fifth layer refractive index film 22: driving element 236... sixth layer refractive index film 23...first laminate film 321...first layer refractive index film 24...first transparent electrode 322...second layer refractive index film 25...first alignment film 323...third layer refractive index Film 31...second substrate body 324...fourth layer refractive index film 32...second laminated film 325...5th layer refractive index film 33...second transparent electrode 326...6th layer refraction Rate film 34...second alignment film 35...shading member 28