201208980 六、發明說明： 【發明所屬之技術領威】 本發明係關於一種光學鍍膜材料之製備方法，特別係 關於一種以高溫對含有二氧化鈦(Ti〇2)、三蠆札 ’、 匕一鋼（La2〇3) 及鑭(La)之混合物進行處理’以製得光學鑛膜持料之方法 【先前技術】 光學鏟膜係指可以改變光學元件之光學性質之 其目的可以是抗反射、抗眩光、濾光...等箅，二，又、’ 寸而依照目的 之不同’光學元件製造商需選用不同的材料進行㉛膜、 舉例而言’我國專利公告第588113號描* 7又、 "揭路了一種蒸鍍 材料之製造方法’其<用於製備具有高折射與低吸收之光 學鍍膜。於該方法中’含有二氧化鈦、鈦釦-与，， 机和二氧化二鑭之 混合物乃以低壓條件進行燒結，進而得到前述之材料201208980 VI. Description of the Invention: [Technical Leading Technology of the Invention] The present invention relates to a method for preparing an optical coating material, and more particularly to a method for containing titanium oxide (Ti〇2), triterpene, and bismuth steel at high temperature. Method for treating optical film holding material by mixing a mixture of La2〇3) and lanthanum (La) [Prior Art] Optical shovel film means that the optical properties of the optical element can be changed for the purpose of anti-reflection and anti-glare , filter...etc. 二, 二,又,' inch and according to the purpose' optical component manufacturers need to use different materials for 31 film, for example, 'China Patent Announcement No. 588113* 7 and " A method for producing an evaporation material is disclosed, which is used to prepare an optical coating having high refraction and low absorption. In the method, a mixture containing titanium oxide, titanium buckle-, and an antimony-oxide is sintered under a low pressure condition to obtain the aforementioned material.
一般而言，在眾多種類的光學鍍膜材料中，X ' I屬氣化 之抗 物是常被使用的一種。舉例來說，鑭、鈦金屬之氧化物 特別是缺氧鈦酸鑭，便常用於相機鏡頭、投譽機^^頭 反射層的鍍膜製程。 不同於鈦酸鑭（LaTi〇3) ’缺氧鈦酸鑭係指化與 LaTiOx ( X小於3 )之化合物。由於其氧含量較鈦酸^ 呈現氧不飽和之狀態，故其製程也較鈦酸鑭更為困難_ ’ 目前已知的一種缺氧鈦酸鑭製備方法係直接將金 與金屬鑭一起進行大氣熔煉並氧化之，然此種作 屬欽 下缺點.一、成本昂貴一金屬欽與金屬爛之單價约相^ 、 201208980 故使用此法之原料成本昂貴；二、製程不易控制一由於金 屬鈦與金屬鑭的氧化活性差異甚大，在氧化過程中並不易 穩定控制其缺氧程度，以至於容易造成後續鍍膜製程中溢 氣量不穩定，而增加產品之不良率。 目前已知的另一種缺氧鈦酸鑭製備方法則是先以鑭、 鈦金屬之氧化物製得氧飽和之鈦酸鑭，之後再進行高溫真 空還原而得到缺氧鈦酸鑭。相較於前述氧化法，此種製程 雖然原料成本較低，但仍有製程耗能及產物缺氧程度低等 缺點。 【發明内容】 有感於習知技術之缺憾，發明人遂竭其心智悉心研 究，憑其從事該項產業多年所累積之經驗，進而研發出一 種新穎之光學鍍膜材料製備方法，其創新之處在於將特定 比例之二氧化鈦、三氧化二鑭以及鑭進行高溫處理，以獲 得可用於光學鍍膜製程之材料。相較於先前技術，本發明 之光學鍍膜材料製備方法至少具有原料成本低、製程相對 簡單、缺氧量穩定、密度高等優點。特別是，當本發明製 程所製得之光學鍍膜材料應用於鍍膜製程時，其具有相對 較低之溢氣量。 有鑑於此，本發明之目的之一，在於提供一種製備光 學鍍膜材料之方法，其步驟至少包括：提供一種至少包含 二氧化鈦及三氧化二鑭之混合物；以及將鑭添加至該混合 物中，並於真空下以約1500°C至約3000°C之溫度進行處 201208980 理，以製得光學鍍膜材料。 於前述之方法中，混合物所含之二氧化鈦與三氧化二 鋼係具有約1 . 1至約1 . 3之重量比例，且鑭對該混合物 之重量比例為約1 : 3至約1 : 7。此外，於前述之方法中， -—氧化欽粉末及二氧化一鋼粉末之重量比例較佳係為1 : 1 至1 : 2 ’而鑭及粉末混合物之重量比例較佳係為丨：4至i : 6 〇 於前述之方法中’較佳係進行以下步驟：在將鑭添加 至混合物之則’先將該混合物加麗成型，並置於低溫之儲 存容器内’例如溫度低於15°C之冰箱或冷凍槽，之後再將 混合物由該儲存容器中取出，並以12〇〇。(：以上之溫度進行 處理，如燒結。 本發明之再一目的，在於提供一種製備光學鍍膜材料 之方法，包括以下步驟.混合重量比例為約1 : 1至約1 : 3 之二氧化鈦粉末及三氧化二鑭粉末；將粉末混合物加壓成 # 型為尺寸介於約1至5毫米之粒狀或塊狀混合物；以約丨2〇〇 C至約1800 C之溫度燒結該粒狀或塊狀混合物；添加重量 約為該粒狀或塊狀混合物之1/7至1/3之鑭至該粒狀或塊狀 此口物中，並混合均勻，以及以約15〇〇°C至約3〇〇〇°C之溫 度溶煉含有鑭之該粒狀或塊狀混合物。 於别述之方法中，在加壓成型與燒結步驟之間，粒狀 或塊狀混合物較佳係於15°c以下之溫度保存；此外，二氧 化鈦粉末及三氧化二鑭粉末之重量比例較佳係為〗：丨至 1:2,而鑭及粉末混合物之重量比例較佳係為至1:6。 201208980 藉由前述方法’可製得含有缺氧鈦酸鑭LaTiOx之光學 鍵膜材料i其中χ於燒結後熔煉前較佳係介於約27至 約2.8，且X於熔煉後較佳係介於約1 $至約2刀。 、 本發月之又目的，在於提供一種藉由前述之各種方 法製備而得之光學鍍膜材料。 此外，本發明亦提供一種光學鍍膜材料，其包括經真 ^溶煉之混合物’且該混合物於真空炼煉前係包括1〇〇重 • 量份之二氧化鈦、1〇〇至3〇〇重量份之三氧化二鑭以及⑽ 至130重量份之鑭。 【實施方式】 屬枯明本發明之目的、特徵及功效，使本發明所 屬^^域中具有通t知識者能瞭解本發明之内容並可據 L施，茲藉由下述具體之實施例配合 發明做1細朗如後。 ㈣對本 -實第1目’其係本發明光學鍍膜材料製程之第 弁，牛程圖。第—實施例之製程主要包括兩步驟，首 三12乃先提供—種混合物，其包含二氧化鈦粉末及 r: i至^粉末，且其巾三氧化鈦與三氧化二_具有約 舟膝 之重量比例，較佳係1 : 1至1 : 2。其次， 鑭對鑭添加至該混合物中，並進行高溫處理；其中， *至厂&物之重量比例為約1:3至約1:7，較佳係為^ 之…:且向溫步驟係於真空下以約150叱至約300(TC 〜tr處理。一般而言’高溫步驟可於真空輯爐中 S] 6 201208980 進行，且爐中之壓力約為1〇_3毫巴，然不以此為限。 請再參見第2圖，其係本發明光學鍍膜材料製程之第 二實施例流程圖。相較於第一實施例，第二實施例於提供 二氧化鈦及三氧化二鑭之混合物後以及添加鑭進行高溫處 理之前，更包括進行步驟14，即對混合物進行加壓成型， 使其由粉末成型為如圓餅或圓柱等粒狀或塊狀，進而提高 密度，以利其後續應用於鍍膜時可增加鍍膜厚度之均一性 而提高光學元件之良率。此外，由於加壓成型後之圓餅或 圓柱等在大氣下易受到水氣之影響而水解成粉末，步驟14 更包括將加壓成型後之圓餅或圓柱置於一低溫之儲存容 器。舉例來說，可將加壓成型後之圓餅或圓柱先以15°C以 下之溫度進行保存，如置於5°C以下之之冰箱或冷凍槽等容 器，以避免水解情形之發生。 請再參見第3圖，其係本發明光學鍍膜材料製程之第 三實施例流程圖。相較於第一實施例，第三實施例於提供 二氧化鈦及三氧化二鑭之混合物後以及添加鑭進行高溫處 理之前，更包括進行步驟16，即對混合物預先進行高溫處 理。於本實施例中，步驟16之高溫處理係於1200°C以上之 溫度下進行，且較佳係於約1200°C至約1800°C之溫度下進 行，時間可為1至5小時，視所處理的混合物量而定。舉 例來說，步驟16可以是對二氧化鈦及三氧化二鑭之混合物 進行燒結處理，如真空燒結或大氣燒結，且其較佳係於一 真空燒結爐内進行。於步驟16後，可將混合物擊碎成顆粒 狀，此時顆粒狀之混合物已不易被大氣中的水氣水解，並 201208980 可接著於步驟18中再添加鑭並均勻混合後再進行高溫處 理。 相較於步驟18之高溫處理，步驟16之高溫處理步驟 可以視為是第-階段的除氧步驟，且經由步驟16之高溫處 理後’混合物内較佳係含有LaTiQx，且X係介於約2 7至 約 2.8。 此外’進行步驟16還可提供以下不可預期之優點。首 先’藉由步驟16的進行，將可縮短後續步驟u的處理時 間，且於某些情況下，甚至可將步驟18的處理時間縮短至 1/5。此外’於進行步驟16 &，粉末間可彼此結合，故於 後續光學_時較不會產生_或比例不均等問題。In general, among a wide variety of optical coating materials, X'I is a type of gasification agent which is often used. For example, bismuth, titanium oxides, especially anaerobic barium titanate, are often used in the coating process of camera lenses and reflective surfaces. Unlike barium titanate (LaTi〇3)' anoxic barium titanate is a compound with LaTiOx (X less than 3). Because the oxygen content is more oxygen-saturated than that of titanic acid, the process is more difficult than barium titanate. _ 'The currently known method for preparing anaerobic barium titanate is to directly carry gold and metal lanthanum together. Smelting and oxidizing, but this is a shortcoming of Qin. First, the cost is high. The unit price of metal and metal is about ^, 201208980. Therefore, the raw materials used in this method are expensive; second, the process is difficult to control because of titanium metal and The oxidation activity of metal ruthenium is very different, and it is not easy to stably control the degree of oxygen deficiency in the oxidation process, so that it is easy to cause unstable gas flow in the subsequent coating process and increase the defect rate of the product. Another currently known method for preparing anaerobic barium titanate is to first obtain an oxygen-saturated barium titanate from an oxide of cerium or titanium metal, followed by high-temperature vacuum reduction to obtain an anoxic barium titanate. Compared with the aforementioned oxidation method, although the process cost is low, there are still disadvantages such as process energy consumption and low product oxygen deficiency. SUMMARY OF THE INVENTION In view of the shortcomings of the prior art, the inventor exhausted his mind and researched it, and based on his years of experience in the industry, he developed a novel optical coating material preparation method, and its innovation. It is to treat a specific proportion of titanium dioxide, antimony trioxide and antimony at a high temperature to obtain a material which can be used in an optical coating process. Compared with the prior art, the optical coating material preparation method of the present invention has at least the advantages of low raw material cost, relatively simple process, stable oxygen deficiency, and high density. In particular, when the optical coating material produced by the process of the present invention is applied to a coating process, it has a relatively low amount of gas. In view of the above, an object of the present invention is to provide a method for preparing an optical coating material, the method comprising the steps of: providing a mixture comprising at least titanium dioxide and antimony trioxide; and adding cerium to the mixture, and The process was carried out under vacuum at a temperature of about 1500 ° C to about 3000 ° C to obtain an optical coating material. In the above method, the titanium oxide and the second steel oxide contained in the mixture have a weight ratio of from about 1.1 to about 1.3, and the weight ratio of rhodium to the mixture is from about 1:3 to about 1:7. Further, in the above method, the weight ratio of the oxidized powder and the oxidized steel powder is preferably 1:1 to 1:2', and the weight ratio of the mash and the powder mixture is preferably 丨: 4 to i : 6 〇 In the above method, 'the preferred step is to add the hydrazine to the mixture, then the mixture is first molded and placed in a low temperature storage container, for example, the temperature is lower than 15 ° C. The refrigerator or the freezing tank is then taken out of the storage container and taken at 12 Torr. (The above temperature is treated, such as sintering. A further object of the present invention is to provide a method for preparing an optical coating material comprising the following steps: mixing a titanium oxide powder having a weight ratio of about 1:1 to about 1:3 and three a cerium oxide powder; pressurizing the powder mixture into a granule or a mixture of granules having a size of about 1 to 5 mm; sintering the granules or lumps at a temperature of from about 2 〇〇C to about 1800 cc. a mixture; adding from about 1/7 to 1/3 of the granule or lumpy mixture to the granule or lumps, and mixing uniformly, and from about 15 ° C to about 3 The granule or block mixture containing cerium is melted at a temperature of 〇〇〇 ° C. In the method described elsewhere, the granular or lumpy mixture is preferably at 15 ° C between the press forming and sintering steps. The weight ratio of the titanium dioxide powder and the antimony trioxide powder is preferably: 丨 to 1:2, and the weight ratio of the mash and the powder mixture is preferably 1:6. The above method 'can produce an optical bond film material containing lanthanum oxyhydroxide titanate LaTiOx i, wherein the smelting is preferably from about 27 to about 2.8 before smelting, and X is preferably from about 1 $ to about 2 knives after smelting. The purpose of this month is to provide a The optical coating material prepared by the various methods described above. Further, the present invention also provides an optical coating material comprising a mixture which is smelted and which comprises 1 〇〇 weight and parts before vacuum refining. Titanium dioxide, 1 to 3 parts by weight of antimony trioxide, and (10) to 130 parts by weight of ruthenium. [Embodiment] The object, the features and the effects of the present invention are the subject of the present invention. Those who have knowledge of the present invention can understand the contents of the present invention and can apply the invention according to the following specific examples. The fourth embodiment of the present invention is the optical coating material of the present invention. The third step of the process, the cow process map. The process of the first embodiment mainly comprises two steps, the first three 12 first provide a mixture comprising titanium dioxide powder and r: i to ^ powder, and its towel titanium dioxide and three Oxidized two_ has a weight ratio of about a knee, compared to 1 : 1 to 1: 2. Secondly, hydrazine is added to the mixture and subjected to high temperature treatment; wherein, * to the factory & matter weight ratio is about 1:3 to about 1:7, preferably For the ...: and the temperature step is under vacuum to about 150 叱 to about 300 (TC ~ tr treatment. In general, the 'high temperature step can be carried out in the vacuum furnace S] 6 201208980, and the pressure in the furnace is about It is 1〇_3 mbar, but not limited thereto. Please refer to FIG. 2 again, which is a flow chart of the second embodiment of the optical coating material manufacturing process of the present invention. Compared with the first embodiment, the second embodiment After the mixture of titanium dioxide and antimony trioxide is provided and before the high temperature treatment is added, the step 14 is further carried out, that is, the mixture is subjected to pressure molding to form a powder into a granular or block shape such as a round cake or a cylinder. In turn, the density is increased, so that the subsequent application to the coating can increase the uniformity of the coating thickness and improve the yield of the optical component. Further, since the press-formed wafer or the cylinder is easily hydrolyzed into a powder under the influence of moisture, the step 14 further includes placing the press-formed wafer or cylinder in a low-temperature storage container. For example, the press-formed wafer or cylinder can be stored at a temperature below 15 °C, such as a refrigerator or a freezer at a temperature below 5 °C to avoid hydrolysis. Referring again to Fig. 3, there is shown a flow chart of a third embodiment of the process for fabricating an optical coating material of the present invention. In contrast to the first embodiment, the third embodiment further comprises performing step 16 after providing a mixture of titanium dioxide and antimony trioxide and adding hydrazine for high temperature treatment, i.e., preheating the mixture at a high temperature. In this embodiment, the high temperature treatment of step 16 is performed at a temperature of 1200 ° C or higher, and preferably at a temperature of about 1200 ° C to about 1800 ° C, and the time may be 1 to 5 hours, depending on Depending on the amount of mixture treated. For example, step 16 may be a sintering treatment of a mixture of titanium dioxide and antimony trioxide, such as vacuum sintering or atmospheric sintering, and it is preferably carried out in a vacuum sintering furnace. After step 16, the mixture can be broken into granules, in which case the granulated mixture is not readily hydrolyzed by the moisture in the atmosphere, and 201208980 can be further added in step 18 and uniformly mixed before high temperature treatment. Compared with the high temperature treatment of step 18, the high temperature treatment step of step 16 can be regarded as the first stage oxygen removal step, and after the high temperature treatment of step 16, the mixture preferably contains LaTiQx, and the X system is between about 2 7 to about 2.8. Further, performing step 16 may also provide the following unpredictable advantages. First, by the progress of step 16, the processing time of the subsequent step u can be shortened, and in some cases, the processing time of step 18 can be shortened to 1/5. Further, in the step 16 & the powders can be combined with each other, so that problems such as _ or uneven ratio are less likely to occur in the subsequent optical _.
最後，請參見第4圖，其係本發明光學鍍膜材料製程 之第四實施例流程圖。如圖所示，本實施例之製程主要共 包括四個步驟。首先’步驟12提供包含二氧化鈦粉末及三 氧化二鑭粉末之混合物’其中二氧化鈦與三氧化二鑭係之 重量比例乃如前所述。其次，如同第二實施例之作法，步 驟14對混合物進行㈣成型以提升其密度，並將加壓成型 後之圓餅或圓柱置於-低溫儲存容器中以避免水解 則如同第三實_之作法’透過步驟16對混合物預先進行 同溫處理以除去部分的氣，並使粉末間彼此結合。最後， 步驟18則以前述之比例力π人鑭，並進行另—次的高溫處理。 於本實施例中，前述製程較佳可產生含有u 品，其於肉眼觀察下呈銀黑色，且χ係介於㈣至約= 適於用作光學賴之材料，可用以製造減鏡頭、投影機 201208980 鏡頭等或各類鏡片、棱鏡、分光鏡、冷 然並不以此為限。 $之抗反射層， 此外’本發明所製得之光學鍍 行鑛膜。首先，將材料導入蒸链單元^可以下述方式進 鍍單元的電子束紐n巾。欲軸 、^巾並插入洛 签付，如直徑25毫米、 厚1毫米的石英-玻璃盤’乃於潔淨、势 ’、 内的基材支架上。由於蒸鍍單 己屬=置於蒸鑛單元 ❿ 術，故此處不再贅述。 架構屬本領域之公知技 接著，抽真空至1〇·5毫巴，將 氧氣經由控制閥進人蒸鍍單元直到;^熱至f 使 巴。將鍍膜材料於電子束蒗路 達10至2x10毫 溫度22。。。。。於到達此蒸發‘度:障:熔解並加熱至蒸發 覆特定厚度的光學層。於二二:，4啟屏障’基材被鐘 覆的基材，並以光譜計測定u ’自蒸鍍單元取出經鍍 奈米波長的折射指數為2.2〇穿==穿透曲線可知於彻 此外，為進一步說明本干之厚度為267奈米。 現有技術之差異，以下 ^之W與光學鍍膜材料和 如第5圖所示，其朗強度測試之結果說明之。 其甲第5A_為鑛有^為塑膠鏡片進行鍍膜後之照片， 本一）之照發明光學鍍膜材料之塑膠鏡片（樣 化欽、鈦和三氧化-趨5C圖所示者則為鐘有至少含二氧 (樣本二1本三;結光學賴材料之塑膠鏡片 進行測試前均略呈綠色圖中可以觀察到塑膠鏡片於鍍膜後 …色’且均無明顯脫落現象。 <後’依照以下程序進行測試：⑴將_克水與100 201208980 克鹽加入到加熱槽内，並以1000瓦之電熱棒進行加熱，直 到水沸騰；（2)於水沸騰後，將樣本一、二、三投入到沸騰 的鹽水中，同時繼續加熱，於3分鐘後將樣本取出；（3)取 出樣本放置乾燥後，用顯微鏡觀察膜層附著情況，觀察膜 層是否脫落和鏡片顏色變化；（4)重覆前述步驟（1)-(3)兩 次’之後用清水將樣本洗淨並於烘烤後量測光譜。Finally, please refer to Fig. 4, which is a flow chart of a fourth embodiment of the process for fabricating an optical coating material of the present invention. As shown in the figure, the process of this embodiment mainly comprises four steps. First, 'Step 12 provides a mixture comprising titanium dioxide powder and antimony trioxide powder' wherein the weight ratio of titanium dioxide to antimony trioxide is as previously described. Next, as in the second embodiment, step 14 is (4) shaped to increase the density thereof, and the press-formed wafer or cylinder is placed in a low temperature storage container to avoid hydrolysis as the third real_ The process 'pre-temperature treatment of the mixture through step 16 to remove part of the gas and to bond the powders to each other. Finally, in step 18, the force of the above-mentioned ratio is π, and another high temperature treatment is performed. In the present embodiment, the foregoing process preferably produces a product containing u, which is silver black under visual observation, and has a lanthanide between (4) and about = suitable for use as an optical ray material, and can be used to manufacture a reduction lens and a projection. Machine 201208980 Lens, etc. or various types of lenses, prisms, beamsplitters, and cold are not limited to this. An antireflection layer of $, and an optically plated ore film produced by the present invention. First, the material is introduced into the evaporation chain unit. The electron beam of the unit can be introduced in the following manner. For the shaft, the towel and the insert, such as a quartz-glass plate with a diameter of 25 mm and a thickness of 1 mm, is placed on the substrate holder in a clean, potential. Since the evaporation of the genus = is placed in the smelting unit, it will not be described here. The architecture is well known in the art. Next, evacuate to 1 〇·5 mbar, and oxygen is introduced into the vapor deposition unit via the control valve until it is heated to f. The coating material is applied to the electron beam at a temperature of 10 to 2 x 10 millimeters. . . . . Upon reaching this evaporation ‘degree: barrier: melt and heat to evaporate a specific thickness of the optical layer. On the second two:, 4 open barrier 'substrate with a clock-covered substrate, and measured by spectrometer u 'from the evaporation unit, the refractive index of the plated nanometer wavelength is 2.2〇 wear == penetration curve can be known In addition, to further illustrate the thickness of the stem is 267 nm. The difference in the prior art, the following and the optical coating material and as shown in Fig. 5, the results of the Lang strength test are explained. Its 5A_ is a photograph of the metal lens after the coating of the plastic lens. The plastic lens of the invention of the optical coating material according to the present invention (the sample of the plastic, titanium and trioxide-to- 5C figure is the clock At least dioxane (sample two 1 three; the plastic lens of the optical optical material is slightly green before the test can be observed in the plastic lens after the coating ... color 'and no obvious shedding phenomenon. The following procedures were tested: (1) Add _ gram of water and 100 201208980 grams of salt to the heating tank and heat it with a 1000 watt electric heating rod until the water boils; (2) After the water boils, sample one, two, three Put into boiling brine while continuing to heat, take out the sample after 3 minutes; (3) take out the sample and place it dry, observe the adhesion of the film layer with a microscope, observe whether the film layer falls off and the color change of the lens; (4) After the above steps (1) - (3) were repeated twice, the sample was washed with clean water and the spectrum was measured after baking.
樣本於步驟（1)-(3)處理後之結果係如第6圖所示，其中 第6A、6B、6C圖分別為樣本一、二、三之照片。由第6A 圖中可觀察到樣本一之鏡片於處理後仍呈現綠色，且膜層 無脫落。相較之下，如第6B圖所示，樣本二之膜層雖仍為 綠色，但已出現膜層整片脫落的情形。此外，樣本三則如 第6C圖所示，雖由顯微鏡並無觀察出明顯的脫落現象，但 膜層已由綠色變為紫紅色。 據此，可知在步驟處理後，鍍有本發明光學鍍膜 材料之樣本不論麵膜強度上或光學穩定性上均優於 樣本二及樣本三。此外，於步驟(4)後所量測得之光譜（圖 未丁）可發現’樣本二及樣本三之光譜相較於處理前均有 變〖而樣本—之光譜則無顯著的偏移，在在顯示 出本發明光學鍵膜材料之穩定性。 通常佳實施例揭露’然本領域具有 不應解讀為限用而㈣述本發明’而 程所使用之材料主要舉例而：，雖然本發明製 在不過度料先學鍵^㈣下，亦可添加其==，但 貝0从 201208980 外，應注意的是，舉凡與該實施例等效之變化與置換，均 應視為涵蓋於本發明之範疇内。因此，本發明之保護範圍 當以下文之申請專利範圍所界定者為準。 【圖式簡單說明】 第1圖為本發明光學鍍膜材料製程之第一實施例流程 圖； 第2圖為本發明光學鍍膜材料製程之第二實施例流程 •圖； 第3圖為本發明光學鍍膜材料製程之第三實施例流程 圖； 第4圖為本發明光學鍍膜材料製程之第四實施例流程 圖； 第5A-5C圖分別為樣本一、二、三之塑膠鏡片進行鍍 膜後之照片； φ 第6A-6C圖分別為樣本一、二、三之塑膠鏡片於鍍膜 強度測試處理後之照片。 【主要元件符號說明】 12、14、16、18 流程圖之步驟 i S1 11The results of the samples after the steps (1)-(3) are as shown in Fig. 6, wherein the pictures of Figs. 6A, 6B, and 6C are photographs of samples 1, 2, and 3, respectively. It can be observed from Fig. 6A that the lens of sample one is still green after the treatment, and the film layer does not fall off. In contrast, as shown in Fig. 6B, although the film layer of the sample 2 is still green, the film peeling off has occurred. In addition, the sample 3 is shown in Fig. 6C. Although no obvious shedding phenomenon was observed by the microscope, the film layer changed from green to purple. Accordingly, it is understood that the sample coated with the optical coating material of the present invention is superior to the sample 2 and the sample 3 regardless of the film strength or optical stability after the step treatment. In addition, the spectrum measured after the step (4) can be found that the spectra of the sample 2 and the sample 3 are different from those before the treatment, and the spectrum of the sample has no significant deviation. The stability of the optical bond film material of the present invention is shown. In general, the preferred embodiment discloses that the material used in the process of the present invention is not limited to the limitation, and the material used in the process is mainly exemplified: although the system of the present invention is not excessively prior to learning the key ^ (4), It is to be noted that, except for the fact that it is equivalent to variations and substitutions equivalent to the embodiment, it should be considered that it is within the scope of the present invention. Therefore, the scope of the invention is defined by the scope of the following claims. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a flow chart of a first embodiment of an optical coating material process of the present invention; FIG. 2 is a flow chart of a second embodiment of the optical coating material process of the present invention; A flow chart of a third embodiment of a coating material process; FIG. 4 is a flow chart of a fourth embodiment of the optical coating material process of the present invention; and FIGS. 5A-5C are photographs of a sample of the first, second and third plastic lenses respectively. φ Figures 6A-6C are photographs of the plastic lenses of samples 1, 2, and 3 after the coating strength test. [Main component symbol description] 12, 14, 16, 18 Flow chart steps i S1 11