201141950 六、發明說明: 【發明所屬之技術領域】 本發明關於一種液晶顯示元件的製造方法、聚合物組 成物以及液晶顯示元件。更詳細而言,本發明關於—種用 於製造視角寬、回應速度快的液晶顯示元件的新方法。 【先前技術】 在液晶顯示元件中’作爲垂直配向方式而公知的 M VA(多域垂直配向(Multi-domain Vertical Alignment))型 面板’在液晶面板中形成突起物’並由此限定液晶分子的 倒下方向’從而實現視野角的擴大。然而,根據該方式, 無法避免來自於突起物的透光率和對比度的不足,並且還 存在有液晶分子的回應速度慢這樣的問題。 近年來’爲了解決如上述MVA型面板的問題,而提出 了 P S A(聚合物穩定配向(p 01 ym er s u s t ai n ed A1 i gnmen t)) 模式。PSA模式是在由帶有圖案狀導電膜的基板和帶有無 圖案導電膜的基板所形成的一對基板的間隙中,或者由兩 片帶有圖案狀導電膜的基板所形成的一對基板的間隙中, 包夾具有聚合性化合物的液晶組成物·,並在導電膜間施加 電壓的狀態下照射紫外線,使聚合性化合物聚合,由此, 表現出預傾角特性,並控制液晶配向方向的技術。根據該 技術,藉由使導電膜形成特定結構,可以實現視野角的擴 大和液晶分子回應的高速化,從而解決了 MVA型面板中無 法避免的透光率和對比度不足的問題。然而,在PSA模式 201141950 中’爲了使該聚合性化合物聚合,必須照射例如 100,000J/m2這樣大量的紫外線,因此產生了液晶分子分解 的問題,此外’採用紫外線照射而並未聚合的未反應化合 物殘留在液晶層中’它們相作用產生顯示不勻,並且對電 壓保持特性產生不良影響,或者在面板的長期可靠性方面 產生問題,至今還無法實用。 對此’非專利文獻1提出了使用由含有反應性介晶的 聚醯亞胺系液晶配向劑所形成的液晶配向膜的方法。根據 非專利文獻1,具備藉由這種方法所形成的液晶配向膜的 液晶顯示元件的液晶分子的回應爲高速。然而,非專利文 獻1中完全沒有記載要以怎樣的量來使用怎樣的反應性介 晶的指示’並且所需的紫外線照射量依然較多,無法消除 顯示特性、特別是電壓保持特性有關的問題。 這一點,最近提出了使用更新的顯示方式代替上述 PSA模式的相關技術(專利文獻1)。該技術是對具有含有光 官能性的桂皮酸酯結構的聚醯亞胺薄膜照射無偏振的紫外 線’並利用因該桂皮酸酯結構的光異構化而產生的分子旋 轉’以實現賦予所希望的預傾角表現性。然而,爲了賦予 所希望的預傾角表現性’需要照射相當量的紫外線,並且 製造液晶顯不兀件時的作業時間變長,或者由於強烈的紫 外線而產生了形成的液晶配向膜的電特性,尤其是電壓保 持率受損的弊病。 [先行技術文獻] 201141950 [專利文獻] [專利文獻1]美國專利申請公開第2009/0325453號說明書 [專利文獻2]日本特開平5-107544號公報 [非專利文獻] [非專利文獻 Lee et. al. SID 09 DIGEST, p.666(2009) [非專利文獻 2]T. J. Scheffer et. al. J. Appl. Phys. vo. 19, p.2013(1980) 【發明內容】 本發明鑒於上述情況而進行,其目的在於提供一種視 角廣、液晶分子的回應速度快,並且顯示特性和長期可靠 性優異的液晶顯示元件的製造方法》 根據本發明’本發明的上述問題,由一種液晶顯示元 件的製造方法達成,其經過如下步驟:在具有導電膜的一 對基板的該導電膜上,分別塗布含有 (A) 聚合物及 (B) 有機溶劑 之聚合物組成物以形成塗膜; 並將形成該塗膜的一對基板隔著液晶分子層,對向配置, 使該塗膜相對,以形成液晶胞; 在具有該一對基板的導電膜間施加電壓的狀態下,對該液 晶胞進行光照射; 其特徵在於該(A)聚合物係包含: 201141950 (A1)聚合物,係具有下述結構與聚合性不飽和鍵這兩者, 該結構爲藉由光照射而產生自由基的結構和具有光敏化功 能的結構中的至少一種結構;或者, (A2-1)聚合物及(A2-2)具有聚合性不飽和鍵之聚合物,該 (A2-1)聚合物具有藉由光照射而產生自由基之結構及具有 光敏化功能之結構中的至少一種結構。 [發明效果] 根據本發明的方法製造的液晶顯示元件,其視角廣、 液晶分子的回應速度快、顯示出充分的透光率和對比度, 顯示特別優異,並且即使長時間連續驅動,也不會損害顯 示特性。 此外,根據本發明的方法,照射所需的光量少也沒關 係,因此液晶分子分解的問題不存在,並且還有助於降低 液晶顯示元件的製造成本。 因此,根據本發明的方法所製造的液晶顯示元件,在 性能和成本這兩方面都優於目前已知的液晶顯示元件,並 且可以適當地用於各種用途。 【實施方式】 <聚合物組成物> 本發明方法中所用的聚合物組成物,係具有(A)聚合物 及(B)有機溶劑,其中上述(A)聚合物,係包含(A1)聚合物, 該(A 1)聚合物具有下述結構和聚合性不飽和鍵這兩者(以 下’稱爲“聚合物(A 1 ) ”),該結構爲藉由光照射而產生自 201141950 由基的結構和具有光敏化功能的結構中的至少一種結構; 或者包含(A2-l)聚合物(以下,稱爲“聚合物(ΑΠ)” )及 (Α2-2)具有聚合性不飽和鍵的聚合物(以下,稱爲“聚合物 (Α2-2)” ),該(Α2-1)聚合物具有藉由光照射而產生自由基 的結構和具有光敏化功能的結構中的至少一種結構。 上述光敏化功能,是指在藉由光照射而形成單一激發 狀態後,迅速產生項間交叉,並轉變爲三重激發狀態的功 能。在該三重激發狀態中,如果與其他分子碰撞,則將對 方轉變爲激發狀態,而自身恢復至基態。該光敏化功能也 可以和藉由光照射而產生自由基的功能並存。 就藉由光照射而產生自由基的結構和具有光敏化功能 的結構中的至少一種結構而言,可以列舉例如二苯甲酮結 構、9,1 0 -二側氧二氫化蒽結構、〗,3 ·二硝基苯結構及1,4 · 二側氧環己-2,5-二烯結構,即下述式(1)〜(4) 201141950BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of producing a liquid crystal display element, a polymer composition, and a liquid crystal display element. More specifically, the present invention relates to a novel method for manufacturing a liquid crystal display element having a wide viewing angle and a fast response speed. [Prior Art] In a liquid crystal display device, a M VA (Multi-domain Vertical Alignment) type panel known as a vertical alignment method forms a protrusion in a liquid crystal panel and thereby defines liquid crystal molecules. Falling in the direction 'to achieve the expansion of the viewing angle. However, according to this aspect, the lack of light transmittance and contrast from the projections cannot be avoided, and there is also a problem that the response speed of the liquid crystal molecules is slow. In recent years, in order to solve the problem of the MVA type panel as described above, a P S A (polymeric stable alignment (p 01 ym er s u s t ai n ed A1 i gnmen t) mode has been proposed. The PSA mode is in a gap between a pair of substrates formed by a substrate having a patterned conductive film and a substrate having a patterned conductive film, or a pair of substrates formed by two substrates having a patterned conductive film. In the gap, a liquid crystal composition having a polymerizable compound is applied, and a polymer is irradiated with ultraviolet rays in a state where a voltage is applied between the conductive films to polymerize the polymerizable compound, thereby exhibiting a pretilt angle characteristic and controlling the alignment direction of the liquid crystal. . According to this technique, by forming the conductive film into a specific structure, the expansion of the viewing angle and the speed of response of the liquid crystal molecules can be realized, thereby solving the problem of insufficient transmittance and contrast in the MVA type panel. However, in the PSA mode 201141950, in order to polymerize the polymerizable compound, it is necessary to irradiate a large amount of ultraviolet rays such as 100,000 J/m 2 , thereby causing a problem of decomposition of liquid crystal molecules, and further, 'unreacted compounds which are not polymerized by ultraviolet irradiation. Residual in the liquid crystal layer 'these phases cause display unevenness, and have an adverse effect on the voltage holding characteristics, or cause problems in the long-term reliability of the panel, and have not been practical yet. The non-patent document 1 proposes a method of using a liquid crystal alignment film formed of a polyimine-based liquid crystal alignment agent containing a reactive mesogen. According to Non-Patent Document 1, the response of the liquid crystal molecules of the liquid crystal display element having the liquid crystal alignment film formed by such a method is high. However, in Non-Patent Document 1, there is no description as to what kind of reactive mesogens are used in what amount, and the amount of ultraviolet irradiation required is still large, and problems related to display characteristics, particularly voltage holding characteristics, cannot be eliminated. . In this regard, a related art using the updated display mode instead of the above PSA mode has recently been proposed (Patent Document 1). The technique is to irradiate a polyimide film having a photofunctional cinnamate structure with a non-polarized ultraviolet ray and to utilize a molecular rotation generated by photoisomerization of the cinnamate structure to achieve desired Pretilt performance. However, in order to impart a desired pretilt performance, it is necessary to irradiate a considerable amount of ultraviolet rays, and the working time when the liquid crystal display is manufactured becomes long, or the electrical characteristics of the formed liquid crystal alignment film are generated due to strong ultraviolet rays. In particular, the disadvantage of impaired voltage retention. [Provisional Technical Document] 201141950 [Patent Document 1] [Patent Document 1] US Patent Application Publication No. 2009/0325453 [Patent Document 2] Japanese Laid-Open Patent Publication No. Hei No. 5-105044 [Non-Patent Document] [Non-patent Document Lee et. Al. SID 09 DIGEST, p. 666 (2009) [Non-Patent Document 2] TJ Scheffer et. al. J. Appl. Phys. vo. 19, p. 2013 (1980) [Disclosure] The present invention has been made in view of the above circumstances. The object of the present invention is to provide a liquid crystal display element having a wide viewing angle, a fast response speed of liquid crystal molecules, and excellent display characteristics and long-term reliability. According to the present invention, the above problem of the present invention is produced by a liquid crystal display element. The method is achieved by: coating a polymer composition containing (A) a polymer and (B) an organic solvent on the conductive film of a pair of substrates having a conductive film to form a coating film; a pair of substrates of the coating film are disposed opposite to each other with a liquid crystal molecular layer interposed therebetween, and the coating film is opposed to each other to form a liquid crystal cell; and the liquid crystal cell is applied to a state in which a voltage is applied between the conductive films having the pair of substrates Row light irradiation; characterized in that the (A) polymer comprises: 201141950 (A1) a polymer having both a structure and a polymerizable unsaturated bond, which is a radical generated by light irradiation. At least one of a structure and a structure having a photosensitizing function; or, (A2-1) a polymer and (A2-2) a polymer having a polymerizable unsaturated bond, the (A2-1) polymer having At least one of a structure in which a light is generated by light irradiation and a structure having a photosensitizing function. [Effect of the Invention] The liquid crystal display element manufactured by the method of the present invention has a wide viewing angle, a fast response speed of liquid crystal molecules, exhibits sufficient light transmittance and contrast, and is particularly excellent in display, and does not drive even for a long time. Damage display characteristics. Further, according to the method of the present invention, the amount of light required for the irradiation is small, and thus the problem of decomposition of the liquid crystal molecules does not exist, and also contributes to lowering the manufacturing cost of the liquid crystal display element. Therefore, the liquid crystal display element manufactured by the method of the present invention is superior to the currently known liquid crystal display element in both performance and cost, and can be suitably used for various purposes. [Embodiment] <Polymer Composition> The polymer composition used in the method of the present invention has (A) a polymer and (B) an organic solvent, wherein the (A) polymer contains (A1) Polymer, the (A 1) polymer has both the following structure and a polymerizable unsaturated bond (hereinafter referred to as "polymer (A 1 )"), which is produced by light irradiation from 201141950 by At least one of a structure of a group and a structure having a photosensitizing function; or a polymer containing (A2-1) polymer (hereinafter, referred to as "polymer (ΑΠ)") and (Α2-2) having a polymerizable unsaturated bond Polymer (hereinafter, referred to as "polymer (Α2-2)"), the (Α2-1) polymer has at least one of a structure which generates a radical by light irradiation and a structure which has a photosensitizing function. . The above-mentioned photosensitizing function refers to a function of rapidly generating an inter-term intersection and transitioning to a triple-excited state after forming a single excitation state by light irradiation. In the triple-excited state, if it collides with other molecules, the opposite is converted into an excited state, and itself returns to the ground state. This photosensitizing function can also coexist with the function of generating radicals by light irradiation. As for at least one of a structure which generates a radical by light irradiation and a structure which has a photosensitizing function, for example, a benzophenone structure, a 9,10-dioxantho-indane structure, 3 · Dinitrobenzene structure and 1,4 · di-oxocyclohexane-2,5-diene structure, namely the following formula (1) ~ (4) 201141950
各自所所表示的結構’並且可以爲選自於其中的至少一種 結構。 選自於藉由光照射而產生自由基的結構、具有光敏化 功能的結構和聚合性不飽和鍵中的至少一種結構或不飽和 鍵,在本說明書的下文中’稱爲“特定結構”。 [聚合物(A)] 作爲本發明中的聚合物(A)的主骨架,可以列舉例如由 聚醯胺酸、聚醯亞胺、聚醯胺酸酯、聚酯、聚醯胺、聚有 機矽氧烷、纖維素衍生物、聚縮醛衍生物、聚苯乙烯衍生 物、聚(苯乙烯-苯基順丁烯二醯亞胺)衍生物、聚(甲基)丙 烯酸酯衍生物等所形成的骨架,並且可以適當選擇並使用 具有選自於其中骨架的聚合物的一種以上。 具有上述特定結構的聚醯胺酸,例如,可以藉由使四 201141950 殘酸二酐與包含具有特定結構及兩個胺基的化合物的二胺 反應而進行合成。此外,藉由使如此所得的聚醯胺酸脫水 閉環,可以得到具有特定結構的聚醯亞胺。 具有特定結構的聚醯胺酸酯,例如,可以藉由使四羧 酸二酐與二胺反應所得的聚醯胺酸與例如具有特定結構和 環氧基的化合物反應而進行合成。 具有特定結.構的聚有機矽氧烷,例如,可以藉由:使 包含具有特定結構及水解性基團的矽烷化合物的水解性矽 烷化合物或其混合物進行水解縮合的方法;或者,先合成 聚有機矽氧烷,係具有包含具有環氧基和水解性基團的矽 烷化合物之水解性矽烷化合物或將其混合物水解縮合所得 的環氧基;接著使該聚有機矽氧烷與具有特定結構和羧基 的化合物反應的方法;或者,組合這些方法而得到。 此外,具有特定結構的聚(甲基)丙烯酸酯衍生物,例 如,可以藉由先使包含具有環氧基的單體的單體原料進行 聚合,合成具有環氧基的聚(甲基)丙烯酸酯衍生物,接著 使該衍生物與具有特定結構和羧基的化合物反應而得到。 就本發明中所用的聚合物(A1)而言,較佳爲使用: 選自於具有藉由光照射而產生自由基的結構和具有光敏化 功能的結構中的至少一種的結構與聚合性不飽和鍵這兩者 之聚有機矽氧烷(以下,也稱爲“聚有機矽氧烷(A1)”); 具有藉由光照射而產生自由基的結構和具有光敏化功能的 結構中的至少一種結構與聚合性不飽和鍵這兩者之聚醯胺 -10- 201141950 酸(以下,也稱爲“聚醯胺酸(A 1)”);及 該聚醯胺酸脫水閉環所形成之聚醯亞胺(以下,也稱爲“聚 醯亞胺(A 1 ) ”)中的至少一種。 就本發明中所用的聚合物(A2-1)而言,較佳爲使用: 選自於由聚醯胺酸(以下,也稱爲“聚醯胺酸(A2-1)” )以及 該聚醯胺酸脫水閉環所形成的聚醯亞胺(以下,也稱爲“聚 醯亞胺(A2-1)”)所構成的群組中的至少一種;該聚醯胺酸 是具有藉由光照射而產生自由基的結構和具有光敏化功能 的結構中至少一種結構的聚醯胺酸。 作爲本發明中所用的聚合物(A2-2),較佳爲使用具有 聚合性不飽和鍵的聚有機矽氧烷(以下,也稱爲“聚有機矽 氧烷(A2-2)”)。 -聚有機矽氧烷(A1)- 作爲本發明中所用的聚合物(A1)的聚有機矽氧烷 (A1),係具有藉由光照射而產生自由基的結構及具有光敏 化功能的結構中的至少一種的結構與聚合性不飽和鍵這兩 者之聚有機矽氧烷。這種聚有機矽氧烷(A1),可以藉由任 意合成方法合成,例如,可以藉由先合成具有聚合性不飽 和鍵與環氧基之聚有機矽氧烷(以下,稱爲“聚有機矽氧烷 (A1)的前驅物”),然後使該聚有機矽氧烷與具有藉由光照 射而產生自由基的結構及具有光敏化功能的結構中的至少 一種結構及羧基之化合物反應而進行合成。上述聚有機矽 氧烷使下述矽烷化合物的混合物較佳爲在有機溶劑、水及 • 11 - 201141950 催化劑的存在下進行水解縮合,該矽烷化合物的混合物包 含:具有聚合性不飽和鍵和水解性基團的矽烷化合物(以 下,稱爲“矽烷化合物(1)”)以及具有環氧基和水解性基團 的矽烷化合物(以下’稱爲“矽烷化合物(2 ) ”)。 就上述矽烷化合物(1)而言,可以列舉例如3_(甲基)丙 烯醯氧基丙基三氯矽烷、3-(甲基)丙烯醯氧基丙基三甲氧基 矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、2_(甲基)丙 烯醯氧基乙基三氯矽烷、2-(甲基)丙烯醯氧基乙基三甲氧基 矽烷、2-(甲基)丙烯醯氧基乙基三乙氧基矽烷、4_(甲基)丙 烯醯氧基丁基三氯矽烷、4-(甲基)丙烯醯氧基丁基三甲氧基 矽烷、4-(甲基)丙烯醯氧基丁基三乙氧基矽烷、乙烯基三氯 矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、烯丙 基三氯矽烷、烯丙基三甲氧基矽烷、烯丙基三乙氧基矽烷 等,並且可以使用選自於其中的一種以上。 就上述矽烷化合物(2)而言,可以列舉例如3-縮水甘油 氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽 烷、3-縮水甘油氧基丙基甲基二甲氧基矽烷、3_縮水甘油 氧基丙基甲基二乙氧基矽烷、3 -縮水甘油氧基丙基二甲基 甲氧基矽烷、3 -縮水甘油氧基丙基二甲基乙氧基矽烷、2-縮水甘油氧基乙基三甲氧基矽烷、2-縮水甘油氧基乙基三 乙氧基矽烷、2 -縮水甘油氧基乙基甲基二甲氧基矽烷、2-縮水甘油氧基乙基甲基二乙氧基矽烷、2-縮水甘油氧基乙 基二甲基甲氧基矽烷、2 -縮水甘油氧基乙基二甲基乙氧基 -12- 201141950 矽烷、4-縮水甘油氧基丁基三甲氧基矽烷、4-縮水甘油氧 基丁基三乙氧基矽烷、4-縮水甘油氧基丁基甲基二甲氧基 矽烷、4-縮水甘油氧基丁基甲基二乙氧基矽烷、4-縮水甘 油氧基丁基二甲基甲氧基矽烷、4-縮水甘油氧基丁基二甲 基乙氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、 2-(3,4-環氧基環己基)乙基三乙氧基矽烷、3-(3,4-環氧基環 己基)丙基三甲氧基矽烷、3-(3,4-環氧基環己基)丙基三乙 氧基矽烷等,並且可以使用選自於其中的一種以上》 可以用於合成聚有機矽氧烷(A1)的前驅物的矽烷化合 物,可以僅由如上所述的矽烷化合物(1)和矽烷化合物(2) 構成,或.者可以除上述矽烷化合物(1)和矽烷化合物(2)之 外,還包含其他的矽烷化合物(以下,稱爲“矽烷化合物 (3)” )。 就此處可以使用的矽烷化合物(3)而言,可以列舉例如 甲基三氯矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、 苯基三氯矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、 甲基二氯矽烷、甲基二甲氧基矽烷、甲基二乙氧基矽烷、 二甲基二氯矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基 矽烷、二苯基二氯矽烷、二苯基二甲氧基矽烷、二苯基二 乙氧基矽烷、氯二甲基矽烷、甲氧基二甲基矽烷、乙氧基 二甲基矽烷、氯三甲基矽烷、溴三甲基矽烷、碘三甲基矽 烷、甲氧基三甲基矽烷、乙氧基三甲基矽烷、四甲氧基矽 烷、四乙氧基矽烷等,並且可以使用選自於其中的一種以 -13- 201141950 上。 用於合成聚有機矽氧烷(A1)的前驅物的矽院化, 相對於全部矽烷化合物,較佳爲具有20〜80莫耳%如上所 述的矽烷化合物(1),更佳爲具有30〜60莫耳% :並且,相 對於全部矽烷化合物,較佳爲具有20〜80莫耳%如上所述 的矽烷化合物(2),更佳爲具有30〜60莫耳%。此外,如上 所述的矽烷化合物(3)的使用比例,相對於全部砂院化_合 物,較佳爲3 0莫耳%以下,並更佳爲1 〇莫耳%以下。 作爲在合成聚有機矽氧烷(A1)的前驅物時可以使用的 有機溶劑,可以列舉例如烴、酮、酯、醚、醇等。 就上述烴而言,可以列舉例如甲苯、二甲苯等; 就上述嗣而言,可以列舉例如甲乙酮、甲基異丁酮、 甲基正戊酮、二乙酮、環己酮等; 就上述酯而言,可以列舉例如乙酸乙酯' 乙酸正丁酯、 乙酸異戊酯、丙二醇單甲醚乙酸酯、3-甲氧基丁基乙酸酯、 乳酸乙酯等; 就上述醚而言,可以列舉例如乙二醇二甲醚、乙二醇 二乙醚、四氫呋喃、二氧雜環己烷等; 就上述醇而言,可以列舉例如1 -己醇、4 -甲基-2 -戊醇、 乙二醇單甲醚、乙二醇單乙醚、乙二醇單正丙醚、乙二醇 單正丁醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單正丙 醚等,並且可以使用選自於其中的一種以上。其中,較佳 爲選擇使用非水溶性的物質。 -14- 201141950 有機溶劑的使用量’相對於100重量份全部矽烷化合 物,較佳爲10〜10,000重量份,並更佳爲50〜1,〇〇〇重量 份。 合成聚有機矽氧烷(A1)的前驅物時的水使用量,相對 於總計1莫耳的矽烷化合物,較佳爲0.5〜100莫耳,更佳 爲1〜30莫耳。 就上述催化劑而言,可以使用例如酸 '鹼金屬化合物、 有機鹼、鈦化合物、锆化合物等,其中,較佳爲使用鹼金 屬化合物或有機鹼。藉由使用鹼金屬化合物或有機鹼作爲 催化劑,可以促進三維結構的形成,並且可以得到矽烷醇 基的含有比例少的聚有機矽氧烷。因此,即使在與後述的 羧酸反應時以及形成含有該反應生成物的聚合物組成物 後,也可以抑制矽烷醇基相互之間的縮合反應,此外,在 聚合物組成物含有後述的其他聚合物時,也可以抑制矽烷 醇基與其他聚合物的縮合反應,因此在可以得到保存穩定 性優良的聚合物組成物這一點上是作爲較佳的。 就上述鹼金屬化合物而言,可以列舉例如氫氧化鈉、 氫氧化鉀、甲醇鈉、甲醇鉀、乙醇鈉、乙醇鉀等。 就上述有機鹼而言,可以列舉例如乙胺、二乙胺、哌 哄、哌啶、吡咯啶、吡咯這樣的有機一級胺或二級胺;三 乙胺、三正丙胺、三正丁胺、吡啶、4 -二甲基胺基吡啶、 二吖雙環十一烯這樣的三級有機胺;四甲基銨氫氧化物這 樣的四級有機銨等。這些有機鹼中,較佳爲三乙胺、三正 -15- 201141950 丙胺、三正丁胺、吡啶、4-二甲基胺基吡啶這樣的 機胺;氫氧化四甲基銨這樣的四級有機銨。 就催化劑而言,特佳爲有機鹼。有機鹼的使用 據有機鹼的種類、溫度等反應條件而不同,並且可 設定,例如,相對於總計1莫耳的矽烷化合物’較佳 〜3莫耳,並更佳爲0.05〜1莫耳。 合成聚有機矽氧烷(A1)的前驅物時的水解縮合 較佳爲藉由將矽烷化合物(1)和(2)以及根據需要的 合物(3)溶解於有機溶劑,將該溶液和有機鹸以及水 並使用例如油.浴等適當的加熱裝置進行加熱而實施 在水解縮合反應時,希望加熱溫度較佳爲1 3 0°C 更佳爲40〜100 °C,並且較佳爲加熱0.5〜12小時, 1〜8小時。加熱中,可以攪拌混合液,也可以不攪 液,或者還可以將混合液進行回流。 反應結束後,較佳爲用水洗滌從反應混合物中 的有機溶劑層。在進行該洗滌時,使用含有少量鹽 例如0.2重量%左右的硝酸銨水溶液等進行洗滌,在 作容易這一點上是較佳的。洗滌進行至洗滌後的水 性,然後根據需要使用無水硫酸鈣、分子篩等適當 劑進行乾燥,然後除去溶劑,由此可以得到目標聚 氧烷(A1)的前驅物。 接著,較佳爲在催化劑和有機溶劑的存在下, 所得的聚有機矽氧烷(A1)的前驅物,與具有藉由光 三級有 量,根 以適當 Μ 0.0 1 反應, 矽烷化 混合, 〇 以下, 更佳爲 拌混合 分離出 的水, 洗滌操 層呈中 的乾燥 有機矽 使如此 照射而 -16- 201141950 產生自由基的結構和具有光敏化功能的結構中的至少一種 結構和羧基的化合物(以下,稱爲"羧酸(1)”)反應,可以 得到聚有機矽氧烷(A1)。這時’也可以將羧酸(1)和選自於 具有使液晶分子取在功能的羧酸(以下,稱爲“羧酸(2)”) 以及其他羧酸所構成的群組中的一種以上並用。 就上述羧酸(1)而言,可以列舉例如3 -苯甲醯基苯甲 酸、4-苯甲醯基苯甲酸、3-(4-二乙基胺基-2-羥基苯甲醯基) 苯甲酸、4-(2-羥基苯甲醯基)苯甲酸、3-(2-羥基苯甲醯基) 苯甲酸、2-(2-羥基苯甲醯基)苯甲酸、4-(4-甲基苯甲醯基) 苯甲酸、4-(3,4-二甲基苯甲醯基)苯甲酸、3-(4-苯甲醯基-苯氧基)丙酸、9,10-二側氧二氫化蒽-2-羧酸(蒽醌-2-羧 酸)、3-(9,10-二側氧-9,10-二氫化蒽-2-基)丙酸、[3-(4,5-二甲氧基- 3,6 -二側氧環己-1,4 -二烯)丙氧基]乙酸、3,5 -二 硝基苯甲酸、4-甲基-3,5-二硝基苯甲酸、3-(3,5-二硝基苯 氧基)丙酸、2 -甲基-3, 5 -二硝基苯甲酸等。 上述羧酸(2)是具有例如碳原子數爲4〜20的烷基或烷 氧基或具有連接了兩個以上的6元環的結構的基團或具有 類固醇結構的基團,和羧基的化合物’作爲其具體例子, 可以列舉例如 4 -丁氧基苯甲酸、4 -戊氧基苯甲酸、4 -己氧 基苯甲酸、4-庚氧基苯甲酸、4·辛氧基苯甲酸' 4_壬氧基苯 甲酸、4 -癸氧基苯甲酸、4 -十一院氧基苯甲酸、4 -十一院氧 基苯甲酸、4-十三烷氧基苯甲酸、4-十四烷氧基苯甲酸、 4 -十五烷氧基苯甲酸、4_十六烷氧基苯甲酸、4_十七烷氧基 -17- 201141950 苯甲酸、ι十八烷氧基苯甲酸、4_十九烷氧基苯甲酸、4_ 二十烷氧基苯甲酸、4-(4-丙基環己基)苯甲酸、4-(4_ 丁基 環己基)苯甲酸、4-(4-戊基環己基)苯甲酸、4-(4-己基環己 基)苯甲酸、4-(4-庚基環己基)苯甲酸、4-(4-辛基環己基) 苯甲酸、4-(4’-丙基二環己基)苯甲酸、4-(4’-丁基二環 己-4-基)苯甲酸、4-(4’-戊基二環己-4-基)苯甲酸' 4-(4,-己基二環己-4-基)苯甲酸、4-(4’-庚基二環己-4-基)苯甲 酸、4-(4’-辛基二環己-4-基)苯甲酸、琥珀酸= 5f-膽甾院 -3-基等。 上述羧酸(3)是上述羧酸(1)和(2)以外的羧酸,作爲其 具體例子,可以列舉例如乙酸、丙酸等。 就羧酸(1)的使用比例而言,相對於聚有機矽氧院(A1) 的前驅物的1莫耳環氧基,較佳爲0.02〜0.2莫耳,並更佳 爲0.05〜0.15莫耳。 羧酸(2)的使用比例,相對於聚有機矽氧烷(A1)的前驅 物的1莫耳環氧基,較佳爲0.7莫耳以下,並更佳爲〇.2〜 0.6莫耳》 羧酸(3)的使用比例,相對於聚有機矽氧烷(A1)的前驅 物的1莫耳環氧基,較佳爲0.3莫耳以下,並更佳爲ο」 莫耳以下。 本發明中的聚有機矽氧烷(A1),其環氧當量較佳爲 5,000 g/莫耳以下,並更佳爲500〜3,000g/莫耳。因此,上 述竣酸(1)、(2)和(3)的總計使用比例,相對於聚有機矽氧 -18 - 201141950 烷(A 1)的前驅物的1莫耳環氧基,較佳爲〇·8莫耳以下。 就上述催化劑而言,可以使用有機鹼,或者作爲促進 環氧化合物和酸酐反應的所謂固化促進劑的公知化合物。 就上述有機鹼而言,可以列舉例如乙胺、二乙胺、哌 阱、哌啶、吡咯啶、吡咯這樣的有機一級胺或二級胺; 三乙胺、三正丙胺、三正丁胺、吡啶、4 -二甲基胺基吡啶、 二吖雙環十一烯這樣的三級有機胺;氫氧化四甲基銨這樣 的四級有機銨等。這些有機鹼中’較佳爲三乙胺、三正丙 胺、三正丁胺、吡啶、4 -二甲基胺基吡啶這樣的三級有機 胺;氫氧化四甲基銨這樣的四級有機銨。 就上述固化促進劑而言,可以列舉例如三級胺、咪唑 化合物、有機磷化合物、四級膦鹽、二吖雙環烯、有機金 屬化合物、四級銨鹽、硼化合物、金屬鹵化物等,除此之 外還可以使用作爲潛在性固化促進劑而公知的物質。 催化劑,係相對於1〇〇重量份聚有機矽氧烷(A1)的前. 驅物,較佳爲以1 〇 〇重量份以下的比例使用’更佳爲〇. 〇 1 〜100重量份,並進一步更佳爲ο.1〜20重量份的比例。 就上述有機溶劑而言,可以列舉例如释、醚、酯、酮、 醯胺、醇等。其中,從原料和生成物的溶解性以及生成物 容易精製的觀點考慮’較佳爲醚、酯或酮。溶劑以固體成 分濃度(反應溶液中溶劑以外的成分重量占溶液總重量的 比例)較佳爲〇. 1重量%以上’並更佳爲5〜5 0重量%的比例 使用。 -19- 201141950 反應溫度較佳爲〇〜200 °c ’並更佳爲50〜150 °c。反 應時間較佳爲〇 _ 1〜5 0小時,並更佳爲〇 . 5〜2 0小時。 如此可以得到含有聚有機矽氧烷(A1)的溶液。該溶液 可以直接供給聚合物組成物的調製’但較佳爲在從該溶液 中除去所使用的催化劑後,或者在分離聚有機矽氧烷(A 1) 後,供給聚合物組成物的調製。爲了從含有聚有機矽氧烷 (A 1 )的溶液中除去催化劑,可以採用例如使用水等洗滌該 溶液的方法。聚有機矽氧烷(A1)的分離,可以較佳爲藉由 從洗滌後的溶液中除去有機溶劑而進行。 -聚醯胺酸(A 1 )- 作爲本發明中所用的聚合物(A1)的聚醯胺酸(A1),是 具有藉由光照射而產生自由基的結構和具有光敏化功能的 結構中的至少一種結構與聚合性不飽和鍵這兩者之聚醯胺 酸。這種聚醯胺酸(A1)可以藉由任意合成方法合成,例如, 可以藉由使四羧酸二酐與二胺反應而進行合成,其中二胺 包含:具有藉由光照射而產生自由基的結構和及具有光敏 化功能的結構中的至少一種結構與兩個胺基之化合物(以 下’稱爲二胺(1)),以及具有聚合性不飽和鍵與兩個胺基之 化合物(以下,稱爲二胺(2 ))。 就上述四羧酸二酐而言,可以列舉例如脂肪族四羧酸 二酐、脂環式四羧酸二酐、芳香族四羧酸二酐等。就它們 的具體例而言··作爲脂肪族四羧酸二酐,係可以列舉例如 丁院四殘酸二酐等;作爲脂環式四羧酸二酐,係可以列舉 -20- 201141950 例如1,2,3,4-環丁烷四殘酸二酐、2,3,5-三羧基環戊基乙酸 二酐、l,3,3a,4,5,9b-六氫-5-(四氫-2,5-二側氧-3-呋喃基)-苯并[1,2_c]呋喃-l,3-二酮、l,3,3a,4,5,9b-六氫-8-甲基 -5-(四氫-2,5-二側氧-3-咲喃基)-苯并[l,2-c]呋喃-1,3·二 酮、3-氧雜雙環[3.2.1]辛·2,4-二酮-6-螺-3,-(四氫呋喃 -2,,5,-二酮)、5-(2,5-二側氧四氫-3-呋喃基)-3-甲基-3-環己 烯-1,2-二羧酸酐、3,5,6-三羧基_2·羧基甲基降莰烷 -2:3,5:6-二酐、2,4,6,8 -四殘基雙環[3.3.0]辛烷- 2:3,5:6 -二 酐、4,9-二氧雜三瓌[5.3.1.〇2’6]十—碳_3,5,8,10-四酮等; 作爲芳香族四羧酸二軒’係可以列舉例如苯均四酸二酐 等;除此之外’還可以使用日本特願20〇9-157556.中所記 載的四羧酸二酐。 就可以用於合成前述聚醯胺酸(A1)的四羧酸二酐而 言,其中,較隹爲包含脂環式四羧酸二酐,進一步較佳爲 包含選自於2,3,5-三羧基環戊基乙酸二酐和1,2,3,4-環丁烷 四羧酸二酐所構成的群組中的至少一種,並特佳爲包含 2,3,5-三羧基環戊基乙酸二酐。 就可以用於合成前述聚醯胺酸的四羧酸二酐而言,相 對於全部四羧酸二酐,較佳爲含有60莫耳%以上,更佳爲 含有80莫耳。/。以上的選自於2,3, 5_三羧基環戊基乙酸二酐 和1,2,3,4·環丁烷四羧酸二酐所構成的群組中的至少一 種’並且最較佳爲僅由選自於2,3,5_三羧基環戊基乙酸二 酐及1,2,3,4-環丁烷四羧酸二酐所構成的群組中的至少一 -21 - 201141950 種構成。 就上述二胺(1)而言,可以列舉例如{4-[2-(3,5-二胺基 苯氧基)-乙氧基]-苯基}-苯基-甲酮、{4-[2-(2,4-二胺基苯氧 基)-乙氧基]-苯基}-苯基-甲酮、{4-[2-(2,4-二胺基苯氧基)-乙氧基]-苯基卜對甲苯甲醯基-甲酮、{4-[2-(2,4-二胺基苯 氧基)-乙氧基]-苯基}-鄰甲苯甲醯基-甲酮等,並且可以使 用選自於其中的一種以上。 就上述二胺(2)而言,可以列舉例如3,5-二胺基(2’-(甲 基)丙烯醯氧基乙基)苯甲酸酯、3,5-二胺基(1’-(甲基)丙烯 醯氧基甲基)苯甲酸酯、3,5-二胺基(3’-(甲基)丙烯醯氧基丙 基)苯甲酸酯、3,5-二胺基(4’-(甲基)丙烯醯氧基丁基)苯甲 酸酯、3,5-二胺基(5’-(甲基)丙烯醯氧基戊基)苯甲酸酯、 3,5·二胺基(6’-(甲基)丙烯醯氧基己基)苯甲酸酯、N1,N1-二烯丙基-苯-1,2,4-三胺、N,N-二烯丙基苯-1,3,5-三胺、(甲 基)丙烯酸2-(2,4-二胺基苯氧基)乙酯等,並且可以使用選 自於其中的一種以上。 可以用於合成本發明的聚醯胺酸(A1)的二胺,可以僅 由如上所述的二胺(1)和二胺(2)構成,或者可以除上述二胺 (1 )和二胺(2 )之外,還包含其他的·二胺(以下,稱爲“二胺 (3)” )。 就此處可以使用的二胺(3 )而言,可以列舉例如脂肪族 二胺、脂環式二胺、芳香族二胺、二胺基有機矽氧烷等。 就它們的具體例而言:作爲脂肪族二胺,係可以列舉例如 -22- 201141950 間苯二甲胺、1,3 -丙二胺、四亞甲基二胺、五亞甲基一胺、 六亞甲基二胺等;作爲脂環式二胺,係可以列舉例如1,4_ 二胺基環己烷、4,4’-亞甲基雙(環己胺)、1,3-雙(胺基甲基) 環己烷等;作爲芳香族二胺,係可以列舉例如對苯二胺、 4,4’-二胺基二苯基甲烷、4,4,-二胺基二苯基硫醚、丨,5·二 胺基萘、2,2’-二甲基_4,4’-二胺基聯苯、4,4’-二胺基_2,2’-雙(三氟甲基)聯苯、2,7-二胺基莽、4,4’-二胺基二苯醚、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、9,9-雙(4-胺基苯基)兼、 2,2-雙[4-(4-胺基苯氧基)苯基]六氟丙烷、2,2-雙(4-胺基苯 基)六氟丙烷、4,4’-(對苯二亞異丙基)雙(苯胺)、4,4’·(間苯 二亞異丙基)雙(苯胺)、1,4-雙(4-胺基苯氧基)苯、4,4,-雙(4_ 胺基苯氧基)聯苯、2,6 -二胺基吡啶、3,4 -二胺基吡陡、2 4 _ 二胺基嘧啶、3,6·二胺基吖啶、3,6-二胺基咔唑、N-甲基-3 6 二胺基咔唑、N-乙基-3,6-二胺基咔唑' N-苯基-3,6_二广 女基 咔唑、N,N’-雙(4-胺基苯基)聯苯胺、N,N’-雙(叭胺基〜 基)-N,N’-二甲基聯苯胺、1,4-雙(4-胺基丙基)哌明:、 3,5、〜 胺基苯甲酸、十二烷氧基-2,4-二胺基苯、十四烷氣基2 二胺基苯、十五烷氧基·2,4-二胺基苯、十六烷氧基·2 〜 5 —. 胺基苯、十八烷氧基_2,4-二胺基苯、十二烷氧基 ,5-二胺 基苯、十四烷氧基-2,5-二胺基苯、十五烷氧基< '二胺基 苯、十六院氧基-2,5 -二胺基苯、十八院氧基_2 〜 胺基 苯、膽甾烷氧基-3,5-二胺基苯、膽甾烯氧基_3 _〜胺基 苯、膽甾烷氧基-2,4-二胺基苯、膽甾烯氧基_2 胺基 -23- 201141950 苯、3,5 -二胺基苯甲酸膽甾烷基酯、3,5-二胺基苯甲酸膽甾 烯基酯、3,5-二胺基苯甲酸羊毛甾烯基酯、3,6-雙(4-胺基 苯甲醯氧基)膽甾烷、3,6-雙(4-胺基苯氧基)膽甾烷、4-(4’-三氟甲氧基苯甲醯氧基)環己基-3,5-二胺基苯甲酸酯、 4-(4,-三氟甲基苯甲醯氧基)環己基-3,5_二胺基苯甲酸酯、 1,1_雙(4-((胺基苯基)甲基)苯基)-4-丁基環己烷、丨,1·雙 (4-((胺基苯基)甲基)苯基)-4-庚基環己烷、1,1-雙(4-((胺基 苯氧基)甲基)苯基)-4-庚基環己烷、1,1-雙(4-((胺基苯基) 甲基)苯基)-4-(4-庚基環己基)環己烷和下述式(D-1)所所表 示的化合物等Each of the structures represented by 'and may be at least one structure selected from them. A structure selected from a structure which generates a radical by light irradiation, a structure having a photosensitizing function, and at least one of a polymerizable unsaturated bond or an unsaturated bond are hereinafter referred to as "specific structures". [Polymer (A)] The main skeleton of the polymer (A) in the present invention may, for example, be polyamic acid, polyimine, polyphthalate, polyester, polyamine, polyorganic a siloxane, a cellulose derivative, a polyacetal derivative, a polystyrene derivative, a poly(styrene-phenylmethylene iodide) derivative, a poly(meth) acrylate derivative, etc. The skeleton formed, and one or more kinds of polymers having a skeleton selected from the skeleton may be appropriately selected and used. The polyamic acid having the above specific structure can be synthesized, for example, by reacting four 201141950 residual acid dianhydride with a diamine containing a compound having a specific structure and two amine groups. Further, by subjecting the thus obtained polylysine to dehydration and ring closure, a polyimine having a specific structure can be obtained. The polyperurethane having a specific structure can be synthesized, for example, by reacting a polyamic acid obtained by reacting a tetracarboxylic acid dianhydride with a diamine with, for example, a compound having a specific structure and an epoxy group. a polyorganosiloxane having a specific structure, for example, a method of hydrolytically condensing a hydrolyzable decane compound or a mixture thereof containing a decane compound having a specific structure and a hydrolyzable group; or, synthesizing a poly An organic oxane having a hydrolyzable decane compound containing a decane compound having an epoxy group and a hydrolyzable group or an epoxy group obtained by hydrolyzing and condensing the mixture; and then the polyorganosiloxane has a specific structure and A method of reacting a compound of a carboxyl group; or, by combining these methods. Further, a poly(meth) acrylate derivative having a specific structure, for example, a poly(meth)acrylic acid having an epoxy group can be synthesized by first polymerizing a monomer raw material containing a monomer having an epoxy group. An ester derivative is obtained by reacting the derivative with a compound having a specific structure and a carboxyl group. With respect to the polymer (A1) used in the present invention, it is preferred to use: a structure selected from at least one of a structure having a radical generated by light irradiation and a structure having a photosensitizing function, and a polymerizable property a polyorganosiloxane having a saturated bond (hereinafter, also referred to as "polyorganosiloxane (A1)"); having at least a structure which generates a radical by light irradiation and a structure having a photosensitizing function a polydecylamine having a structure and a polymerizable unsaturated bond-10-201141950 acid (hereinafter, also referred to as "polyglycine (A1)"); and a polycondensation of the polyglycine dehydration ring At least one of quinone imine (hereinafter also referred to as "polyimine (A 1 )"). For the polymer (A2-1) used in the present invention, it is preferred to use: selected from polyglycine (hereinafter, also referred to as "polyglycine (A2-1)") and the poly At least one of a group consisting of polyimine (hereinafter also referred to as "polyimine (A2-1)") formed by dehydration ring closure of valine; the polyamine has light by means of light A polylysine having at least one structure which is irradiated to generate a radical and a structure having a photosensitizing function. As the polymer (A2-2) used in the present invention, a polyorganosiloxane having a polymerizable unsaturated bond (hereinafter also referred to as "polyorganosiloxane (A2-2)") is preferably used. - Polyorganosiloxane (A1) - Polyorganosiloxane (A1) which is a polymer (A1) used in the present invention, has a structure which generates a radical by light irradiation, and a structure which has a photosensitization function a polyorganosiloxane having both a structure of at least one of them and a polymerizable unsaturated bond. The polyorganosiloxane (A1) can be synthesized by any synthesis method, for example, by synthesizing a polyorganosiloxane having a polymerizable unsaturated bond and an epoxy group (hereinafter, referred to as "polyorganic" a precursor of a siloxane (A1), and then reacting the polyorganosiloxane with a compound having at least one structure and a carboxyl group in a structure which generates a radical by light irradiation and a structure having a photosensitizing function Perform the synthesis. The polyorganosiloxane is preferably such that the mixture of the following decane compounds is hydrolyzed and condensed in the presence of an organic solvent, water, and a catalyst having a polymerizable unsaturated bond and hydrolyzability. A decane compound of a group (hereinafter referred to as "decane compound (1)") and a decane compound having an epoxy group and a hydrolyzable group (hereinafter referred to as "decane compound (2)"). Examples of the above decane compound (1) include 3-(meth)acryloxypropyltrichlorodecane, 3-(meth)acryloxypropyltrimethoxydecane, and 3-(methyl group). ) propylene methoxypropyl triethoxy decane, 2-(meth) propylene methoxyethyl trichloro decane, 2-(methyl) propylene methoxyethyl trimethoxy decane, 2- (methyl Propylene methoxyethyl triethoxy decane, 4-(meth) propylene decyloxy butyl trichloro decane, 4-(methyl) propylene methoxy butyl trimethoxy decane, 4- (methyl ) propylene methoxy butyl triethoxy decane, vinyl trichloro decane, vinyl trimethoxy decane, vinyl triethoxy decane, allyl trichloro decane, allyl trimethoxy decane, olefin Propyltriethoxydecane or the like, and one or more selected from the group consisting of may be used. The above decane compound (2) may, for example, be 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane or 3-glycidoxypropylmethyl. Dimethoxydecane, 3-glycidoxypropylmethyldiethoxydecane, 3-glycidoxypropyldimethylmethoxydecane, 3-glycidoxypropyldimethylethyl Oxydecane, 2-glycidoxyethyltrimethoxydecane, 2-glycidoxyethyltriethoxydecane, 2-glycidoxyethylmethyldimethoxydecane, 2-shrinkage Glyceryloxyethylmethyldiethoxydecane, 2-glycidoxyethyldimethylmethoxydecane, 2-glycidoxyethyldimethylethoxy-12- 201141950 decane, 4 - glycidoxybutyl trimethoxy decane, 4-glycidoxy butyl triethoxy decane, 4-glycidoxy butyl methyl dimethoxy decane, 4-glycidoxy butyl methyl di Oxydecane, 4-glycidoxybutyl dimethyl methoxy decane, 4-glycidoxy butyl dimethyl ethoxy hydrazine , 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltriethoxydecane, 3-(3,4-ring Oxycyclohexyl)propyltrimethoxydecane, 3-(3,4-epoxycyclohexyl)propyltriethoxydecane, etc., and one or more selected from the group can be used. The decane compound of the precursor of the organic siloxane (A1) may be composed only of the decane compound (1) and the decane compound (2) as described above, or may be substituted for the above decane compound (1) and a decane compound (2). In addition to other decane compounds (hereinafter referred to as "decane compound (3)"). The decane compound (3) which can be used herein may, for example, be methyltrichlorodecane, methyltrimethoxydecane, methyltriethoxydecane, phenyltrichlorodecane or phenyltrimethoxydecane. Phenyltriethoxydecane, methyldichlorodecane, methyldimethoxydecane, methyldiethoxydecane, dimethyldichlorodecane, dimethyldimethoxydecane, dimethyldiene Ethoxy decane, diphenyl dichlorodecane, diphenyl dimethoxy decane, diphenyl diethoxy decane, chlorodimethyl decane, methoxy dimethyl decane, ethoxy dimethyl Decane, chlorotrimethyl decane, bromotrimethyl decane, iodine trimethyl decane, methoxy trimethyl decane, ethoxy trimethyl decane, tetramethoxy decane, tetraethoxy decane, etc. One selected from the group may be used on -13 to 201141950. The brothelification of the precursor for the synthesis of the polyorganosiloxane (A1) is preferably 20 to 80 mol% of the decane compound (1) as described above, and more preferably 30%, based on the total decane compound. ~60 mol% : and, preferably, the decane compound (2) having 20 to 80 mol% as described above, and more preferably 30 to 60 mol%, based on the entire decane compound. Further, the use ratio of the decane compound (3) as described above is preferably 30% by mole or less, and more preferably 1% by mole or less, based on the total of the sand compound. The organic solvent which can be used in the synthesis of the precursor of the polyorganosiloxane (A1) may, for example, be a hydrocarbon, a ketone, an ester, an ether or an alcohol. Examples of the hydrocarbon include toluene, xylene, and the like; and examples of the above-mentioned hydrazine include methyl ethyl ketone, methyl isobutyl ketone, methyl n-pentanone, diethyl ketone, cyclohexanone, and the like; For example, ethyl acetate 'n-butyl acetate, isoamyl acetate, propylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, ethyl lactate, etc.; For example, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, tetrahydrofuran, dioxane, etc. may be mentioned, and examples of the above alcohol include 1-hexanol and 4-methyl-2-pentanol. Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, etc., and can be selected from More than one of them. Among them, it is preferred to use a substance which is not water-soluble. The use amount of the organic solvent is preferably from 10 to 10,000 parts by weight, and more preferably from 50 to 1, by weight based on 100 parts by weight of the total of the decane compound. The amount of water used in the synthesis of the precursor of the polyorganosiloxane (A1) is preferably from 0.5 to 100 moles, more preferably from 1 to 30 moles, per mole of the total of 1 mole of the decane compound. As the above catalyst, for example, an acid 'alkali metal compound, an organic base, a titanium compound, a zirconium compound or the like can be used. Among them, an alkali metal compound or an organic base is preferably used. By using an alkali metal compound or an organic base as a catalyst, the formation of a three-dimensional structure can be promoted, and a polyorganosiloxane having a small content of a stanol group can be obtained. Therefore, even when reacting with a carboxylic acid to be described later and forming a polymer composition containing the reaction product, the condensation reaction between the stanol groups can be suppressed, and the polymer composition contains other polymerization described later. In the case of the product, the condensation reaction between the stanol group and the other polymer can also be suppressed. Therefore, it is preferable that a polymer composition having excellent storage stability can be obtained. The alkali metal compound may, for example, be sodium hydroxide, potassium hydroxide, sodium methoxide, potassium methoxide, sodium ethoxide or potassium ethoxide. The organic base may, for example, be an organic primary or secondary amine such as ethylamine, diethylamine, piperidine, piperidine, pyrrolidine or pyrrole; triethylamine, tri-n-propylamine, tri-n-butylamine, a tertiary organic amine such as pyridine, 4-dimethylaminopyridine or dinonicycloundecene; a quaternary organic ammonium such as tetramethylammonium hydroxide. Among these organic bases, preferred are tertiary amines such as triethylamine, tri-n--15-201141950 propylamine, tri-n-butylamine, pyridine, 4-dimethylaminopyridine; Organic ammonium. In terms of the catalyst, it is particularly preferred to be an organic base. The use of the organic base varies depending on the reaction conditions such as the kind of the organic base and the temperature, and can be set, for example, preferably 〜3 mol, and more preferably 0.05 to 1 mol, based on the total of 1 mol of the decane compound. The hydrolysis condensation in the synthesis of the precursor of the polyorganosiloxane (A1) is preferably carried out by dissolving the decane compounds (1) and (2) and the desired compound (3) in an organic solvent, and the solution and the organic When the hydrazine and water are heated by a suitable heating means such as an oil bath or the like to carry out the hydrolysis condensation reaction, the heating temperature is preferably preferably 130 ° C, more preferably 40 to 100 ° C, and preferably 0.5. ~12 hours, 1~8 hours. While heating, the mixture may be stirred or may not be stirred, or the mixture may be refluxed. After the end of the reaction, it is preferred to wash the organic solvent layer from the reaction mixture with water. In the case of carrying out the washing, it is preferred to use a small amount of a salt such as an aqueous solution of ammonium nitrate of about 0.2% by weight or the like for washing. The washing is carried out to the water after washing, and then dried with an appropriate agent such as anhydrous calcium sulfate or molecular sieve as necessary, and then the solvent is removed, whereby a precursor of the target polyoxyalkylene (A1) can be obtained. Next, preferably, in the presence of a catalyst and an organic solvent, the precursor of the obtained polyorganooxane (A1) has a third-order amount by light, and the root is reacted with an appropriate Μ 0.0 1 to be decane-mixed. 〇 , , , 〇 , 〇 〇 〇 〇 〇 〇 〇 〇 〇 -16 -16 -16 -16 -16 -16 -16 -16 -16 -16 -16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 The compound (hereinafter referred to as "carboxylic acid (1)") can be reacted to obtain a polyorganosiloxane (A1). At this time, the carboxylic acid (1) can also be selected and selected to have a function of taking liquid crystal molecules. One or more of the group consisting of a carboxylic acid (hereinafter referred to as "carboxylic acid (2)") and another carboxylic acid may be used in combination. Examples of the above carboxylic acid (1) include 3-benzylidene benzene. Formic acid, 4-benzylidenebenzoic acid, 3-(4-diethylamino-2-hydroxybenzhydryl)benzoic acid, 4-(2-hydroxybenzhydryl)benzoic acid, 3-( 2-hydroxybenzimidyl)benzoic acid, 2-(2-hydroxybenzhydryl)benzoic acid, 4-(4-methylbenzyl Benzoic acid, 4-(3,4-dimethylbenzylidene)benzoic acid, 3-(4-benzylidene-phenoxy)propionic acid, 9,10-dihydroindrene 2-carboxylic acid (indole-2-carboxylic acid), 3-(9,10-di-oxo-oxo-9,10-indan-2-yl)propionic acid, [3-(4,5-di) Methoxy-3,6-dioxaxan-1,4-dienylpropoxy]acetic acid, 3,5-dinitrobenzoic acid, 4-methyl-3,5-dinitrobenzene Formic acid, 3-(3,5-dinitrophenoxy)propionic acid, 2-methyl-3,5-dinitrobenzoic acid, etc. The above carboxylic acid (2) has, for example, a carbon number of 4~ An alkyl group or an alkoxy group of 20 or a group having a structure in which two or more 6-membered rings are bonded or a group having a steroid structure, and a compound of a carboxyl group, as a specific example thereof, for example, a 4-butoxy group Benzoic acid, 4-pentyloxybenzoic acid, 4-hexyloxybenzoic acid, 4-heptyloxybenzoic acid, 4·octyloxybenzoic acid '4-methoxybenzoic acid, 4-methoxyoxybenzoic acid 4 - Eleven oxybenzoic acid, 4-Elecyloxybenzoic acid, 4-tridecyloxybenzoic acid, 4-tetradecyloxybenzoic acid, 4-pentadecyloxybenzoic acid 4_hexadecane Benzoic acid, 4-17 heptadecyloxy-17- 201141950 Benzoic acid, octadecanoyloxybenzoic acid, 4-19-alkoxybenzoic acid, 4-Eicosanoxybenzoic acid, 4-(4 -propylcyclohexyl)benzoic acid, 4-(4-butylcyclohexyl)benzoic acid, 4-(4-pentylcyclohexyl)benzoic acid, 4-(4-hexylcyclohexyl)benzoic acid, 4-(4 -heptylcyclohexyl)benzoic acid, 4-(4-octylcyclohexyl)benzoic acid, 4-(4'-propyldicyclohexyl)benzoic acid, 4-(4'-butyldicyclohexyl-4 -yl)benzoic acid, 4-(4'-pentyldicyclohexyl-4-yl)benzoic acid 4-(4,-hexylbicyclohexyl-4-yl)benzoic acid, 4-(4'-g Dicyclohexan-4-yl)benzoic acid, 4-(4'-octyldicyclohexan-4-yl)benzoic acid, succinic acid = 5f-cholestyl-3-yl and the like. The carboxylic acid (3) is a carboxylic acid other than the above carboxylic acids (1) and (2), and specific examples thereof include acetic acid and propionic acid. With respect to the use ratio of the carboxylic acid (1), it is preferably 0.02 to 0.2 mol, and more preferably 0.05 to 0.15 mol, relative to the 1 mol of the precursor of the polyorganosiloxane (A1) precursor. . The use ratio of the carboxylic acid (2) is preferably 0.7 mol or less, and more preferably 〇. 2 to 0.6 mol, relative to the 1 mol of the precursor of the polyorganosiloxane (A1). The use ratio of the acid (3) is preferably 0.3 mol or less, and more preferably ο" or less, relative to the 1 mol of the precursor of the polyorganosiloxane (A1). The polyorganosiloxane (A1) in the present invention preferably has an epoxy equivalent of 5,000 g/mole or less, and more preferably 500 to 3,000 g/mole. Therefore, the total use ratio of the above-mentioned citric acids (1), (2) and (3) is preferably 〇 耳环 耳环 相对 相对 相对 聚 聚 聚 聚 聚 聚 聚 聚 聚 2011 2011 2011 2011 2011 2011 2011 2011 2011 A 聚 聚 聚 聚 聚 聚· 8 moles or less. As the above catalyst, an organic base or a known compound which is a so-called curing accelerator which promotes the reaction of an epoxy compound and an acid anhydride can be used. The organic base may, for example, be an organic primary or secondary amine such as ethylamine, diethylamine, piperazine, piperidine, pyrrolidine or pyrrole; triethylamine, tri-n-propylamine, tri-n-butylamine, a tertiary organic amine such as pyridine, 4-dimethylaminopyridine or dinonicycloundecene; a quaternary organic ammonium such as tetramethylammonium hydroxide. Among these organic bases, a tertiary organic amine such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine or 4-dimethylaminopyridine is preferred; a fourth-order organic ammonium such as tetramethylammonium hydroxide is preferred. . Examples of the curing accelerator include a tertiary amine, an imidazole compound, an organic phosphorus compound, a quaternary phosphonium salt, a dioxodiene, an organometallic compound, a quaternary ammonium salt, a boron compound, a metal halide, and the like. In addition to this, a substance known as a latent curing accelerator can also be used. The catalyst is preferably used in a ratio of 1 part by weight or less to 1 part by weight of the polyorganosiloxane (A1), more preferably 〇1 to 100 parts by weight, And further preferably a ratio of ο. 1 to 20 parts by weight. Examples of the above organic solvent include a release, an ether, an ester, a ketone, a decylamine, an alcohol, and the like. Among them, an ether, an ester or a ketone is preferred from the viewpoints of the solubility of the raw material and the product and the ease of purification of the product. The solvent is preferably used in a ratio of the solid component concentration (the ratio of the component other than the solvent in the reaction solution to the total weight of the solution) to 1% by weight or more and more preferably 5 to 50% by weight. -19-201141950 The reaction temperature is preferably 〇~200 °c ' and more preferably 50 to 150 °c. The reaction time is preferably 〇 1 to 5 hours, and more preferably 〇 5 to 2 0 hours. Thus, a solution containing a polyorganosiloxane (A1) can be obtained. The solution may be supplied directly to the preparation of the polymer composition, but is preferably prepared after the catalyst used is removed from the solution or after the polyorganosiloxane (A1) is separated. In order to remove the catalyst from the solution containing the polyorganosiloxane (A 1 ), for example, a method of washing the solution using water or the like can be employed. The separation of the polyorganosiloxane (A1) can be preferably carried out by removing the organic solvent from the washed solution. - Polyproline (A 1 ) - Polyphthalic acid (A1) which is a polymer (A1) used in the present invention is a structure having a radical generated by light irradiation and a structure having a photosensitizing function A polylysine having at least one structure and a polymerizable unsaturated bond. The polyamic acid (A1) can be synthesized by any synthesis method, for example, by reacting a tetracarboxylic dianhydride with a diamine, wherein the diamine contains: having a radical generated by light irradiation And at least one of a structure having a photosensitizing function and a compound having two amine groups (hereinafter referred to as "diamine (1)), and a compound having a polymerizable unsaturated bond and two amine groups (hereinafter , called diamine (2)). The tetracarboxylic dianhydride may, for example, be an aliphatic tetracarboxylic dianhydride, an alicyclic tetracarboxylic dianhydride or an aromatic tetracarboxylic dianhydride. In the specific example, the aliphatic tetracarboxylic dianhydride may, for example, be a tetrakis acid dianhydride, and the alicyclic tetracarboxylic dianhydride may be exemplified by -20 to 201141950, for example. , 2,3,4-cyclobutane tetraresic acid dianhydride, 2,3,5-tricarboxycyclopentyl acetic acid dianhydride, 1,3,3a,4,5,9b-hexahydro-5-(four Hydrogen-2,5-dioxa-3-furyl)-benzo[1,2_c]furan-1,3-dione, 1,3,3a,4,5,9b-hexahydro-8- 5-(4-hydro-2,5-di-oxo-3-indolyl)-benzo[l,2-c]furan-1,3·dione, 3-oxabicyclo[3.2.1 ] 辛·2,4-dione-6-spiro-3,-(tetrahydrofuran-2,5,-dione), 5-(2,5-di-oxotetrahydro-3-furanyl)-3 -methyl-3-cyclohexene-1,2-dicarboxylic anhydride, 3,5,6-tricarboxy-2·carboxymethylnordecane-2:3,5:6-dianhydride, 2,4 , 6,8-tetra-residate bicyclo[3.3.0]octane-2:3,5:6-dianhydride, 4,9-dioxatriazine [5.3.1.〇2'6]dec-carbon _3,5,8,10-tetraketone or the like; examples of the aromatic tetracarboxylic acid bis-anthracene include, for example, pyromellitic dianhydride; in addition, 'Japanese may wish to use 20〇9-157556 The tetracarboxylic dianhydride described in the above. The tetracarboxylic dianhydride which can be used for the synthesis of the aforementioned polyaminic acid (A1), wherein it is more preferably an alicyclic tetracarboxylic dianhydride, and further preferably comprises a selected from 2, 3, 5 - at least one of the group consisting of tricarboxycyclopentyl acetic acid dianhydride and 1,2,3,4-cyclobutane tetracarboxylic dianhydride, and particularly preferably comprising a 2,3,5-tricarboxyl ring Amyl acetic anhydride dianhydride. The tetracarboxylic dianhydride which can be used for the synthesis of the above polyamic acid preferably contains 60 mol% or more, more preferably 80 mol, based on the entire tetracarboxylic dianhydride. /. The above is at least one selected from the group consisting of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride and 1,2,3,4·cyclobutane tetracarboxylic dianhydride, and is most preferably Is at least one of -21 - 201141950 consisting solely of a group consisting of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride and 1,2,3,4-cyclobutane tetracarboxylic dianhydride Composition. With respect to the above diamine (1), for example, {4-[2-(3,5-diaminophenoxy)-ethoxy]-phenyl}-phenyl-methanone, {4- [2-(2,4-Diaminophenoxy)-ethoxy]-phenyl}-phenyl-methanone, {4-[2-(2,4-diaminophenoxy)- Ethoxy]-phenyl-p-tolylmethyl-ketone, {4-[2-(2,4-diaminophenoxy)-ethoxy]-phenyl}-o-tolylmethyl A ketone or the like, and one or more selected from the group consisting of may be used. The above diamine (2) may, for example, be a 3,5-diamino (2'-(meth)acryloxyethyl) benzoate or a 3,5-diamino group (1'). -(Meth)acryloxymethyl)benzoate, 3,5-diamino (3'-(meth)acryloxypropyl)benzoate, 3,5-diamine (4'-(meth)acryloxybutyl)benzoate, 3,5-diamino (5'-(meth)propenyloxypentyl)benzoate, 3, 5. Diamino (6'-(meth) propylene methoxy hexyl) benzoate, N1, N1-diallyl-benzene-1,2,4-triamine, N,N-diene Propylbenzene-1,3,5-triamine, 2-(2,4-diaminophenoxy)ethyl (meth)acrylate, or the like, and one or more selected from the group consisting of. The diamine which can be used for the synthesis of the polyaminic acid (A1) of the present invention may be composed only of the diamine (1) and the diamine (2) as described above, or may be substituted for the above diamine (1) and diamine. In addition to (2), other diamines (hereinafter referred to as "diamine (3)") are also included. The diamine (3) which can be used herein may, for example, be an aliphatic diamine, an alicyclic diamine, an aromatic diamine or a diamine organic decane. Specific examples thereof include, as the aliphatic diamine, for example, -22-201141950 meta-xylylenediamine, 1,3-propylenediamine, tetramethylenediamine, pentamethylenemonoamine, Hexamethylenediamine or the like; as the alicyclic diamine, for example, 1,4-diaminocyclohexane, 4,4'-methylenebis(cyclohexylamine), 1,3-double (for example) Aminomethyl)cyclohexane or the like; as the aromatic diamine, for example, p-phenylenediamine, 4,4'-diaminodiphenylmethane, 4,4,-diaminodiphenylsulfide Ether, anthracene, 5·diaminonaphthalene, 2,2′-dimethyl-4,4′-diaminobiphenyl, 4,4′-diamino 2,2′-bis(trifluoromethyl) Biphenyl, 2,7-diaminoguanidine, 4,4'-diaminodiphenyl ether, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 9, 9-bis(4-aminophenyl)-, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 2,2-bis(4-aminophenyl) Hexafluoropropane, 4,4'-(p-phenylenediisopropyl)bis(aniline), 4,4'·(m-phenylenediisopropyl)bis(aniline), 1,4-bis(4- Aminophenoxy)benzene, 4,4,-bis(4-aminophenoxy) Benzene, 2,6-diaminopyridine, 3,4-diaminopyridyl, 2 4 -diaminopyrimidine, 3,6-diaminoacridine, 3,6-diaminocarbazole, N -Methyl-3 6-diaminocarbazole, N-ethyl-3,6-diaminocarbazole 'N-phenyl-3,6-dioxin-based carbazole, N,N'-double ( 4-aminophenyl)benzidine, N,N'-bis(n-amino-yl)-N,N'-dimethylbenzidine, 1,4-bis(4-aminopropyl)pemin :, 3,5,~ Aminobenzoic acid, dodecyloxy-2,4-diaminobenzene, tetradecane gas 2 diaminobenzene, pentadecyloxy 2,4-diamine Alkylbenzene, hexadecyloxy group 2~5 —. Aminobenzene, octadecyloxy-2,4-diaminobenzene, dodecyloxy, 5-diaminobenzene, tetradecyloxy Base-2,5-diaminobenzene, pentadecyloxy<'diaminobenzene, hexadecanthoxy-2,5-diaminobenzene, octadecyloxy-2~aminobenzene , cholestyloxy-3,5-diaminobenzene, cholestyloxy_3 _~aminobenzene, cholestyloxy-2,4-diaminobenzene, cholesteneoxy_ 2 Amino-23- 201141950 Benzene, cholesteryl 3,5-diaminobenzoic acid, cholesteryl 3,5-diaminobenzoic acid, 3 , ketoalkenyl 5-diaminobenzoate, 3,6-bis(4-aminobenzylideneoxy)cholesterane, 3,6-bis(4-aminophenoxy)cholesterol Alkane, 4-(4'-trifluoromethoxybenzylideneoxy)cyclohexyl-3,5-diaminobenzoate, 4-(4,-trifluoromethylbenzylideneoxy) Cyclohexyl-3,5-diaminobenzoate, 1,1-bis(4-((aminophenyl)methyl)phenyl)-4-butylcyclohexane, hydrazine, 1·double (4-((Aminophenyl)methyl)phenyl)-4-heptylcyclohexane, 1,1-bis(4-((aminophenoxy)methyl)phenyl)-4-) Heptylcyclohexane, 1,1-bis(4-((aminophenyl)methyl)phenyl)-4-(4-heptylcyclohexyl)cyclohexane and the following formula (D-1) Compounds, etc.
CjH2j+i (D-1) (式(D-1)中,X1是碳原子數爲1〜3的烷基、*-0-、 *-C〇0 -或*-〇CO-(其中,帶有的連接鍵與二胺基苯基鍵 結),h爲〇或1,i爲〇〜2的整數,j爲1〜20的整數); 作爲二胺基有機矽氧烷,可以列舉例如1,3-雙(3-胺基丙 基)-四甲基二環己烷等,除此之外,還可以使用日本特願 2009-157556中所記載的二胺,並且可以使用選自於其中的 一種以上。 上述式(D-1)中的XI較佳爲碳原子數爲1〜3的烷基、 *-0-或*-COO-(其中,帶有的連接鍵與二胺基苯基鍵 結)。作爲基團CjH2j + 1-的具體例,可以列舉例如甲基、乙 -24- 201141950 基、正丙基、正丁基、正戊基、正己基、正庚基、正辛基、 正壬.基、正癸基、正十二烷基、正十三烷基、正十四院基、 正十五院基、正十六院基、正十七院基、正十八院基 正 十九烷基、正二十烷基等。二胺基苯基中的兩個胺基’相 對於其他基團,較佳爲位於2,4-位或3,5-位。 就上述式(D-1)所所表示的化合物的具體例而言’可以 列舉例如下述式(D-1-1)〜(D-1-4)各自所所表示的化合物 等。CjH2j+i (D-1) (In the formula (D-1), X1 is an alkyl group having 1 to 3 carbon atoms, *-0-, *-C〇0- or *-〇CO- (where The bond having a bond to the diaminophenyl group), h is 〇 or 1, i is an integer of 〇 〜2, and j is an integer of 1 to 20); as the diaminoorganooxane, for example, In addition to the 1,3-bis(3-aminopropyl)-tetramethyldicyclohexane, etc., the diamine described in Japanese Patent Application No. 2009-157556 may be used, and may be selected from One or more of them. XI in the above formula (D-1) is preferably an alkyl group having 1 to 3 carbon atoms, *-0- or *-COO- (wherein a linkage bond is bonded to a diaminophenyl group) . Specific examples of the group CjH2j + 1- include methyl group, ethyl-24-201141950 group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, and anthracene. Base, n-decyl, n-dodecyl, n-tridecyl, n-fourth-female, syllabary, syllabary, syllabary, sect Alkyl, n-icosyl, and the like. The two amine groups in the diaminophenyl group are preferably located at the 2,4-position or the 3,5-position relative to the other groups. Specific examples of the compound represented by the above formula (D-1) include, for example, compounds represented by the following formulas (D-1-1) to (D-1-4).
在上述式(D_l)中,h和i較佳爲不同時爲0。 可以用於合成聚醯胺酸(A1)的二胺,相對於全部二 -25- 201141950 胺,較佳爲含有0.1〜10莫耳%、更佳爲含有0.5〜5莫耳% 如上所述的二胺(1);並且,相對於二胺,較佳爲含有10 〜60莫耳%、更佳爲含有 20〜50莫耳%如上所述的二胺 (2)。此外,如上所述的二胺(3)的使用比例,相對於全部二 胺,較佳爲8 9 · 9莫耳%以下,更佳爲3 0〜7 5莫耳%,並進 —步更佳爲30〜70莫耳%。 供給聚醯胺酸(A1)的合成反應的四羧酸二酐與二胺的 使用比例,較佳爲相對於二胺化合物中所含的1 '當量胺 基’四羧酸二酐的酸酐基爲0 · 2〜2當量的比例,並進一步 更佳爲0 · 3〜1 . 2當量的比例。 聚醯胺酸(A 1 )的合成反應,較佳爲在有機溶劑中,並 較佳爲在-20〜150°C,更佳爲在0〜100°C的溫度條件下, 以及較佳爲進行0.5〜24小時,更佳爲進行2〜10小時。 此處’就有機溶劑而言,只要可以溶解合成的聚醯胺酸 (A1),就沒有特別限制,其可以列舉例如N-甲基_2-吡咯啶 酮、Ν,Ν-二甲基乙醯胺、ν,Ν-二甲基甲醯胺、N,N-二甲基 咪唑啉酮、二甲基亞颯、γ -丁內酯、四甲基脲、六甲基磷 醯三胺等非質子性極性溶劑;間甲基酚、二甲苯酚、苯酚、 鹵化苯酚等酚類溶_劑等。有機溶劑的使用量(a),係使四羧 酸二酐和二胺的總量(b)相對於反應溶液的總量(a + b)較佳 爲0.1〜50重量%的量,更佳爲5〜30重量%的量。 如上所述,可以得到溶解聚醯胺酸(A 1)所形成的反應 溶液。該反應溶液,可以直接供給液晶配向劑的調製,也 -26- 201141950 可以將反應溶液中所含的聚醯胺酸(A 1 )分離出來後供給液 晶配向劑的調製,或者還可以將分離出的聚醯胺酸(A 1 )精 製後再供給液晶配向劑的調製。 在將聚醯胺酸(A1)脫水閉環形成聚醯亞胺(A1)時,可 以將上述反應溶液直接進行脫水閉環反應而提供,也可在 反應溶液中分離所具有的聚醯胺酸(A 1 )後,提供給脫水閉 環反應,還可以精製分離的聚醯胺酸(A1)後,提供給脫水 閉環反應。 聚醯胺酸(A1)的分離,可以藉由將上述反應溶液注入 到大量的不良溶劑中,得到析出物,並在減壓下乾燥該析 出物的方法,或者使用蒸發器減壓餾去反應溶液中的有機 溶劑的方法等而進行。此外,藉由將該聚醯胺酸(A1)再次 溶解在有機溶劑中,並接著用不良溶劑使其析出的方法, 或者將該聚醯胺酸(A1)再次溶解在有機溶劑中,將得到的 溶液洗淨後,進行一次或多次使用蒸發器減壓餾去該溶液 中的有機溶劑步驟的方法等,可以精製聚醯胺酸(A1)。 -聚醯亞胺(A 1 )- 作爲本發明中所用的聚合物(A1)的聚醯亞胺(A1),係 具有藉由光照射而產生自由基的結構和具有光敏化功能的 結構中的至少一種結構與聚合性不飽和鍵這兩者之聚醯亞 胺。這種聚醯亞胺(A1),可以藉由使上述聚醯胺酸(A1)所 具有的醯胺酸結構脫水閉環而合成。這時,可以是全部醯 胺酸結構脫水閉環而完全酿胺化,也可以是部分醯胺酸結 -27- 201141950 構脫水閉環而形成醯胺酸結構和醯亞胺結構並存的部分醯 亞胺化物。聚醯亞胺(A 1 )的醯亞胺化率,較佳爲4 0 %以上, 更佳爲5 0〜8 0 %。 聚醯胺酸(A1)的脫水閉環,可以藉由⑴加熱聚醯胺酸 (A1)的方法,或者(ii)將聚醯胺酸(A1)溶解在有機溶劑中, 並在該溶液中添加脫水劑和脫水閉環催化劑,以及根據需 要加熱的方法而進行。 上述⑴加熱聚醯胺酸(A1)的方法中的反應溫度,較佳 爲50〜200°C,並更佳爲60〜170°C。當反應溫度不到50 °C時,脫水閉環反應無法充分進行;而當反應溫度超過200 °C時,則有所得的聚醯亞胺(A 1 )的分子量下降的情況。加 熱聚醯胺酸(A1)的方法中的反應時間,較佳爲0.5〜48小 時,更佳爲2〜2 0小時。 另一方面,在上述(i.i)在聚醯胺酸(A1)的溶液中添加脫 水劑和脫水閉環催化劑的方法中,就脫水劑而言,可以使 用例如乙酸酐、丙酸酐、三氟乙酸酐等酸酐。脫水劑的使 用量,相對於1莫耳醯胺酸結構單元,較佳爲0.01〜20莫 耳。此外,就脫水閉環催化劑而言,可以使用例如吡啶、 三甲基吡啶、二甲基吡啶、三乙胺等三級胺。但是,並不 限定於此。脫水閉環催化劑的使用量,相對於1莫耳所使 用的脫水劑,較佳爲〇 · 〇 1〜1 〇莫耳。就脫水閉環反應中所 使用的有機溶劑而言,可以列舉作爲聚醯胺酸(A 1 )合成中 所用的溶劑而舉例的有機溶劑。脫水閉環反應的反應溫度 -28 - 201141950 較佳爲0〜18 0 °C ’更佳爲1 〇〜15 0 °c ;反應時間較佳爲0.5 〜2 0小時,更佳爲1〜8小時。 上述方法(i)中所得的聚醯亞胺(a 1)’可以直接供給液 晶配向劑的調製’也可以將所得的聚醯亞胺(A 1 )精製後再 供給液晶配向劑的調製。另一方面,在上述方法(i i)中,可 以得到含有聚醯亞胺(A 1 )的反應溶液。該反應溶液,可以 直接供給液晶配向劑的調製’也可以在從反應溶液中除去 脫水劑以及脫水閉環催化劑的基礎上供給液晶配向劑的調 製,也可以將聚醯亞胺(A 1 )分離出來後供給液晶配向劑的 調製,或者還可以將分離出的聚醯亞胺(A1)精製後再供給 液晶配向劑的調製。爲了從反應溶液中除去脫水劑和脫水 閉環催化劑,可以使用例如溶劑置換等方法。聚醯亞胺(A 1) 的分離、精製,係可藉由和上述作爲聚醯胺酸(A 1)的分離、 精製方法而記載的操作相同的操作進行。 -聚醯胺酸(A2-1)- 作爲本發明中所用的聚合物(A2-1)的聚醯胺酸 (A2-1),係具有藉由光照射而產生自由基的結構及具有光 敏化功能的結構中的至少一種結構之聚醯胺酸。 這種聚醯胺酸(A2_l)可以藉由任意合成方法合成,例 如’可以藉由使四羧酸二酐與包含二胺(1)的二胺反應而進 行合成。 用於合成聚醯胺酸(A2-1)的四羧酸二酐,可以和上文 作爲用於合成聚醯胺酸(A1)的四羧酸二酐而表述的物質相 -29- 201141950 同。較佳的四羧酸二酐及其較佳爲使用比例也相同。 用於合成聚醯胺酸(A2-1)的二胺,包含二胺(1),並且 可以僅由二胺(1 )構成,或者可以除二胺(1 )外還包含二胺 (3)。這些二胺(1)和(3)’可以和上文作爲用於合成聚醯胺 酸(A1)的二胺(1)和(3)而表述的物質相同。 用於合成聚醯胺酸(A2-1)的二胺,相對於全部二胺, 較佳爲含有0.1〜20莫耳%的二胺(1),更佳爲含有〇.5〜10 莫耳%。二胺(3)的使用比例,相對於全部二胺,較佳爲99 9 莫耳%以下,更佳爲8 5〜9 9.5莫耳%。 聚醯胺酸(A2-1)的合成、分離和精製,係可和作爲聚 醯胺酸(A 1)的合成、分離和精製方法而記載的方法同樣進 行。 -聚醯亞胺(A2-1)- 作爲本發明中所用的聚合物(A2-1)的聚醯亞胺 (A2-1) ’是具有藉由光照射而產生自由基的結構和具有光 敏化功能的結構中的至少一種結構的聚醯亞胺。這種聚醯 亞胺(A2-1),可以藉由使上述聚醯胺酸(A2-1)所具有的醯胺 酸結構脫水閉環而合成。聚醯亞胺(A 2 - 1 )的醯亞胺化率, 較佳爲4 0 %以上,並更佳爲5 0〜8 0 %。 聚醯胺酸(A2 -1)的脫水閉環反應以及所得的聚醯亞胺 (A2-1)的分離和精製,係可和作爲聚醯胺酸(A1)的脫水閉 環反應以及聚醯亞胺(A1)的分離和精製方法而記載的方法 同樣進行。 -30- 201141950 -聚有機矽氧烷(Α2·2)_ 作爲本發明中所用的聚合物(A2·1)的聚有機矽氧烷 (Α2-2),係具有聚合性不飽和鍵的聚有機矽氧烷。這種聚 有機矽氧烷(Α2-2),可以藉由任意合成方法合成’例如’ 可以藉由將包含矽烷化合物(1)的矽烷化合物的混合物,較 佳爲在有機溶劑、水和催化劑的存在下進行水解縮合而合 成。 可以用於合成聚有機矽氧烷(Α2-2)的矽烷化合物,可 以僅由如上所述的矽烷化合物(1)構成,或可以除上述矽烷 化合物(1)之外,還包含選自於矽烷化合物(2)和矽烷化合物 (3)所構成的群組中的至少一種。這些矽烷化合物(1)、(2) 和(3) ’分別和上述作爲可以用於合成聚有機矽氧烷(Α1)的 前驅物的矽烷化合物(1 )、(2)和(3 )而記載的物質相同。 可以用於合成聚有機矽氧烷(Α2-2)的矽烷化合物,相 對於全部矽烷化合物,較律爲含有〇·1莫耳%以上、更佳爲 含有0.1〜20莫耳%、進一步較佳爲含有01〜1〇莫耳%如 上所述的矽烷化合物(1)。如上所述的矽烷化合物(2)的含有 比例’相對於全部矽烷化合物,較佳爲70莫耳%以下,更 佳爲20〜60莫耳%。此外,如上所述的矽烷化合物(3)的使 用比例’相對於全部矽烷化合物,較佳爲7 〇莫耳%以下, 更佳爲50莫耳%以下。 由上述內容可知,也可以使用作爲聚有機矽氧烷(Α1) 的則驅物的聚有機矽氧烷作爲聚有機矽氧烷(Α2_2)。 201141950 聚有機矽氧烷(A2-2)的合成和分離,係可和作爲聚有 機矽氧烷(A1)的前驅物的合成和分離而記載的內容同樣進 行。 -其他聚合物- 本發明中的(A)聚合物’包含聚合物(A1),或者包含聚 合物(A2-1)及聚合物(A2-2)這兩者。 (A)聚合物,可以僅由聚合物(a 1)構成,或者可以僅由 聚合物(Α·2-1)和聚合物(A2-2)構成,並且還可以除這些聚合 物之外,還含有其他聚合物。 上述其他聚合物,係不具有如上所述的特定結構的聚 合物,可以列舉例如不具有特定結構的聚醯胺酸、聚醯亞 胺、聚醯胺酸酯、聚酯、聚醯胺、聚有機矽氧烷、纖維素 衍生物、聚縮醛衍生物、聚苯乙烯衍生物、聚(苯乙烯-苯 基順丁烯二醯亞胺)衍生物、聚(甲基)丙烯酸酯等,並且可 以適當選擇選自於其中的一種以上進行使用。 就本發明中的其他聚合物而言,較佳爲選自於聚醯胺 酸、聚醯亞胺和聚有機矽氧烷所構成的群組中的至少一種。 不具有特定結構的聚醯胺酸,可以藉由使四羧酸二酐 與上述二胺(3 )反應而得到。藉由使該聚醯胺酸脫水閉環, 可以得到不具有特定結構的聚醯亞胺。不具有特定結構的 聚有機矽氧烷,可以藉由使選自於矽烷化合物(2)和(3)所構 成的群組中的至少一種水解縮合而得到。它們的合成反應 以及分離和精製,參照具有特定結構的聚合物的例子進 -32- 201141950 行’對於熟悉該項技術者來說是顯而易見的。 (A)聚合物中的其他聚合物的使用比例,相對於聚合物 的總計,較佳爲80重量%以下,更佳爲70重量%以下。 本發明中的(A)聚合物,較佳爲以下任一方式。 (1) 僅由聚有機矽氧烷(A1)構成的方式; (2) 由聚有機矽氧烷(A1)與其他聚合物構成,該其他聚 合物係爲選自於不具有特定結構的聚醯胺酸和聚醯亞胺所 構成的群組中至少一種的方式; (3) 僅由選自於聚醯胺酸(A1)和聚醯亞胺(A1)所構成的 群組中至少一種構成的方式; (4) 由選自於聚醯胺酸(A1)和聚醯亞胺(A1)所構成的群 組中至少一種和其他聚合物構成,該其他聚合物係爲選自 於不具有特定結構的聚醯胺酸和聚醯亞胺所構成的群組中 至少一種的方式;以及 (5) 由選自於聚醯胺酸(A2-1)和聚醯亞胺(A2-1)所構成 的群組中至少一種與聚有機矽氧烷(A2-2)構成的方式。 上述方式(5)中的各聚合物的使用比例,係作爲聚有機 矽氧烷(A2-2)相對於選自於聚醯胺酸(A2-1)和聚醯亞胺 (A2-1)所構成的群組中至少一種和聚有機矽氧烷(A2-2)合 計的比例,較佳爲2〜3 0重量%,更佳爲5〜2 0重量%。該 方式(5)較佳爲不含有其他聚合物。 (A)聚合物,作爲其全體,較佳爲包含0.5〜5毫莫耳 /g、更佳爲包含1〜4毫莫耳/g之藉由光照射而產生自由基 -33- 201141950 的結構和具有光敏化功能的結構中的至少一種結構 且,較佳爲包含1〜15毫莫耳/g,更佳爲包含1〜ίο 耳/g之聚合性不飽和鍵。 [(B)有機溶劑] 作爲本發明中的(B)有機溶劑,可以列舉例如N-•2-吡咯啶酮、γ-丁內酯、γ-丁內醯胺、Ν,Ν-二甲基甲酿 Ν,Ν-二甲基乙醯胺、4-羥基-4-甲基-2-戊酮、乙二醇 醚、乳酸丁酯、乙酸丁酯、甲氧基丙酸甲酯、乙氧基 甲酯、乙二醇甲醚、乙二醇乙醚、乙二醇正丙醚、乙 異丙醚、乙二醇正丁醚(丁基賽路蘇)、乙二醇二甲醚 二醇乙醚乙酸酯、二乙二醇二甲醚、二乙二醇二乙醚 乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單甲醚乙酸 二乙二醇單乙醚乙酸酯、二異丁酮、丙酸異戊酯、異 異戊酯、二異戊醚等,並且可以使用選自於其中的一 上。 [聚合物組成物] 本發明中所用的聚合物組成物,較佳爲調製爲如 述的聚合物(Α)溶解於如上所述的(Β)有機溶劑的溶液 就(Β)有機溶劑的使用比例而言,較佳爲聚合物組 的固體成分濃度(聚合物組成物中的聚合物(Α)的重量 合物組成物總重量的比例)爲1〜1 5重量%的比例,更 1 . 5〜8重量%的比例。 <液晶顯示元件的製造方法> ;並 毫莫 甲基 胺、 單甲 丙酸 二醇 、乙 酯、 丁酸 種以 上所 〇 成物 占聚 佳爲 -34- 201141950 本發明的液晶顯示元件的製造方法,其特徵在於經過 了在具有導電膜的一對基板的該導電膜上,分別塗布如上 所述的聚合物組成物以形成塗膜;並隔著液晶分子層’將 形成了前述塗膜的一對基板對向配置,使前述塗膜彼此相 對,以形成液晶胞;在具有前述一對基板之導電膜間施加 電壓的狀態下,對前述液晶胞進行光照射的步驟》 此處,就基扳而言,可以使用例如由浮製玻璃、鈉鈣 玻璃等玻璃;聚對苯二甲酸乙二醇酯、聚對苯二甲酸丁二 醇酯、聚醚碾、聚碳酸酯等塑膠等所形成的透明基板等。 就上述導電膜而言,較佳爲使用透明導電膜,例如由 Sn〇2所形成的NESA(註冊商標)膜、由In2〇3-Sn02所形成 的ITO膜等。該導電膜較佳爲各自分割爲多個區域的圖案 狀導電膜。如果形成這種導電膜結構,則在導電膜間施加 電壓時(後述)’藉由對該各區域施加不同的電壓,可以改 變各區域中液晶分子的預傾角的方向,由此可以使視角特 性更加寬廣。 爲了在這種基板的該導電膜上塗布聚合物組成物,可 以採用例如輥塗法、旋塗法' 印刷法、噴墨法等適當的塗 布方法。塗布後’對該塗布面進行預加熱(預烘烤),接著 進行燒成(後烘烤)’從而形成塗膜。預烘烤的條件,例如 爲在4〇〜120°C下進行〇」〜5分鐘,後烘烤的條件,較佳 爲在I20〜300 I下,更佳爲在150〜25 0乞下;較佳爲進行 5 200分鐘,更佳爲進行10〜〗〇〇分鐘。後烘烤後的塗膜 -35- 201141950 膜厚,較佳爲0.001〜Ιμιη,更佳爲0.005〜0.5μηι。 如此所形成的塗膜,可以直接供給下一步驟的液晶胞 的製造,或者也可以在液晶胞的製造之前,根據需要對塗 膜面進行硏磨處理。該硏磨處理,可以藉由使用捲繞例如 尼龍、人造絲、棉花等纖維所形成的布的輥在—定方向上 對塗膜面進行摩擦而實施。此處,如專利文獻2 (日本特開 平5- 1 07544號公報)所述,一旦進行硏磨處理後,在塗膜 面的一部分上形成光阻膜,並進一步在與先前的硏磨處理 不同的方向上進行硏磨處理,然後進行除去光阻膜的處 理,在每個區域上形成不同的硏磨方向,從而能夠進一步 改善所得的液晶顯示元件的視野特性。 接著,隔著液晶分子層,將形成了前述塗膜的一對基 板對向配置,使前述塗膜彼此相對,以形成液晶胞。 就此處所使用的液晶分子而言,較佳爲具有負的介電 各向異性的向列型液晶,可以使用例如二氰基苯類液晶、 嗒畊類液晶、席夫鹼類液晶、氧化偶氮類液晶、聯苯類液 晶、苯基環己烷類液晶等。液晶分子層的厚度較佳爲1〜 5 μιη 〇 爲了使用這種液晶製造液晶胞,可以列舉例如以下兩 種方法。 就第一種方法而言,藉由將兩塊基板隔著間隙(胞間隙) 相對配置,使各自的液晶配向膜相對在,並使用密封劑將 兩塊基板的周邊部位貼合在一起,在由基板表面和密封劑 -36- 201141950 所劃分的胞間隙內注入塡充液晶後,封閉注入 以製造液晶胞。或者就第二種方法而言,在形 膜的兩塊基板中的一塊基板上的規定部位,塗 線固化性密封劑,再於液晶配向膜面上的規定 下液晶,然後貼合另一塊基板,使液晶配向膜 時將液晶在基板整面上散開,接著對基板整 線,使密封劑固化,由此可以製造液晶胞。 然後,在對前述一對基板所具有的導電膜 的狀態下,對前述液晶胞進行光照射。 此處所施加的電壓,可以爲例如5〜50V的 流電。 就照射的光而言,可以使用例如包含1 5 0〜 光之紫外線和可見光,較佳爲包含300〜400nm 外線。就照射光的光源而言,可以使用例如低 高壓水銀燈、氘燈、金屬鹵化物燈、氬氣共振 準分子雷射器等。前述較佳爲波長區域的紫外 由將前述光源與例如濾光片、繞射光柵等並用 得到。就光的照射量而言,較佳爲1,0 0 0 J / m2 1 00,000J/m2,更佳爲 1,〇〇〇 〜50,000J/m2。在 PSA模式的液晶顯示元件的製造中,需要照射 左右的光,然而在本發明的方法中,即使: 5 0,000J/m2 以下,進一步爲 i〇,〇〇〇j/m2 以下, 所希望的液晶顯示元件,並且除了有助於降低 孔,由此可 成液晶配向 布例如紫外 幾個位置滴 相對在,同 面照射紫外 間施加電壓 直流電或交 8 0 0 nm波長 波長光之紫 壓水銀燈、 燈、氙燈、 線,可以藉 的方法等而 以上且小於 目前已知的 1 00,000J/m2 光照射量爲 也可以得到 液晶顯示元 -37- 201141950 件的製造成本外,還可以避免因強光照射而引起的電特性 下降和長期可靠性的下降。 然後’藉由在實施了上述處理後的液晶胞的外側表面 上貼合偏光板,可以得到液晶顯示元件。就此處所使用的 偏光板而言,可以列舉用乙酸纖維素保護膜夾住稱作爲“H 膜”的偏光膜而形成的偏光板或者Η膜自身所形成的偏光 板等,該Η膜使聚乙烯醇拉伸取在的同時吸收碘而得到。 [實施例] 合成例Pl<聚合物(Α1)的合成> 將作爲四羧酸二酐的112g(0.50莫耳)2,3,5 -三羧基環 戊基乙酸二酐’以及作爲二胺的llg( 0.10莫耳)對苯二胺、 17g(0.05莫耳){4-[2-(2,4-二胺基苯氧基)-乙氧基]-苯基}-苯基-甲酮、79g(0.30莫耳)3,5-二胺基(2’-甲基丙烯醯氧基 乙基)苯甲酸酯及26g(0.05莫耳)3(3,5-二胺基苯醯氧基)膽 甾烷,溶解在750g的N-甲基_2_吡咯啶酮(NMP)中,在60 °C下進行6小時反應,得到含有聚醯胺酸的溶液。取少量 所得的聚醯胺酸溶液,加入NMP,形成聚醯胺酸濃度爲1 〇 重量%的溶液,其測定的溶液黏度爲58 mPai。 接著,在所得的聚醯胺酸溶液中追加l,800g的NMP, 並添加40g吡啶和5 1 g乙酸酐,在1 1 〇°C下進行4小時脫 水閉環。脫水閉環反應後,用新的NMP對體系內的溶劑進 行溶劑置換(藉由該操作’將脫水閉環反應中所使用的吡啶 和乙酸酐排出至體系外。以下相同。),得到含有約1 5重 -38- 201141950 量%作爲聚合物(A 1)的醯亞胺化率約爲5 0 %的聚醯亞胺 (Ρ - 1 )的溶液。取少量所得的聚醯亞胺溶液,加入Ν Μ Ρ,形 成聚醯亞胺濃度爲1 0重量%的溶液,其測定的溶液黏度爲 6 3 m P a . s 〇 合成例P2<聚合物(A2-1)的合成> 將作爲四羧酸二酐的112 g( 0.50莫耳)2,3, 5-三羧基環 戊基乙酸二酐,以及作爲二胺的27g(0.25莫耳)對苯二胺、 70g(0.20莫耳){4-[2-(2,4-二胺基苯氧基)-乙氧基]-苯基}-苯基-甲酮和26g (0.05莫耳)3(3,5 -二胺基苯醯氧基)膽甾 烷,溶解在750g的NMP中,在60°C下進行6小時反應, 得到含有聚醯胺酸的溶液。取少量所得的聚醯胺酸溶液, 加入NMP,形成聚醯胺酸濃度爲1 〇重量%的溶液,其測定 的溶液黏度爲61 mPa.s。 接著,在所得的聚醯胺酸溶液中追加l,800g的NMP, 並添加4 0 g吡啶和5 1 g乙酸酐,在1 1 0 °C下進行4小時脫 水閉環。脫水閉環反應後,用新的NMP對體系內的溶劑進 行溶劑置換,得到含有約15重量%作爲聚合物(A2-1)的醯 亞胺化率約爲5 0 %的聚醯亞胺(P - 2)的溶液。取少量所得的 聚醯亞胺溶液,加入NMP,形成聚醯亞胺濃度爲1 〇重量% 的溶液,其測定的溶液黏度爲68 mP a· s。 合成例P3<其他聚合物的合成> 將作爲四羧酸二酐的110g(0.50莫耳)2,3,5-三羧基環 戊基乙酸二酐,以及作爲二胺的49 g(〇. 20莫耳)對苯二胺、 -39- 201141950 38g(0.25莫耳)3,5-二胺基苯甲酸和25g(0.05莫耳)5F膽 甾烷-3-基-2,4-二胺基苯基醚,溶解在75(^的\]^?中,在 6〇°C下進行6小時反應,得到含有聚醯胺酸的溶液。取少 量所得的聚醯胺酸溶液,加入NMP,形成聚醯胺酸濃度爲 10重量%的溶液,其測定的溶液黏度爲56 mP a .s。 接著,在所得的聚醯胺酸溶液中追加1,8 00g的NMP, 並添加40g吡啶和51g乙酸酐,在110°C下進行4小時脫 水閉環。脫水閉環反應後,用新的NMP對體系內的溶劑進 行溶劑置換,得到含有約1 5重量%作爲其他聚合物的醯亞 胺化率約爲5 0 %的聚醯亞胺(P - 3 )的溶液。取少量所得的聚 醯亞胺溶液,加入NMP,形成聚醯亞胺濃度爲1 〇重量%的 溶液,其測定的溶液黏度爲69 mPa_s。 合成例P4<其他聚合物的合成> 將作爲四羧酸二酐的200g(1.0莫耳)1,2,3,4-環丁烷四 羧酸二酐,以及作爲二胺的210g(1.0莫耳)2,2’-二甲基 -4,4’-二胺基聯苯,溶解在370g的NMP和3,300g的γ-丁 內酯所形成的混合溶劑中,在4〇°C下進行3小時反應,得 到含有1 〇重量%作爲其他聚合物的聚醯胺酸(P - 4)的溶液。 該聚醯胺酸溶液的溶液黏度爲160 mPai。 合成例Sl<聚合物(A2-2)的合成> [水解縮合反應] 在具有攪拌器、溫度計、滴液漏斗和回流冷凝管的反 應容器中,加入作爲水解性矽烷化合物的123 g的2-(3,4- -40- 201141950 環氧基環己基)乙基三甲氧基矽烷(ECETS)和124g的3-甲 基丙 烯醯氧 基丙基 三甲氧 基矽烷 (GMPTS)(ECETS:GMPTS = 50:50(莫耳比)),以及作爲溶劑的 5 0 0g甲基異丁酮以及作爲催化劑的10.0g三乙胺,並在室 溫下混合。接著,由滴液漏斗經30分鐘滴入100g去離子 水後,一邊攪拌,一邊在回流下,在8 0 °C下反應6小時。 反應結束後,取出有機層,用0.2重量%硝酸銨水溶液進行 洗滌,直至洗滌後的水呈中性,然後在減壓下餾去溶劑和 水,由此得到作爲黏稠透明液體的具有環氧基的水解縮合 物。 對於該水解縮合物,進行'H-NMR分析,結果在化學 位移(δ) = 3.2ppm附近可以得到和理論強度同樣的歸屬於環 氧基的峰値,並且確認了在反應中未產生環氧基的副反應。 [具有環氧基的水解縮合物與羧酸的反應] 在200mL的三口燒瓶中,在上述所得的具有環氧基的 水解縮合物中加入作爲溶劑的30.0g甲基異丁酮,作爲羧 酸的75 · 1 g(相對於用作原料的水解性矽烷化合物的合計相 當於30莫耳%,相對於上述水解縮合物所具有的環氧基相 當於60莫耳%)4-辛氧基苯甲酸(OCTBA)以及作爲催化劑的 0.10g的UCAT 18X(商品名’ San-apro(股)製。瓖氧化合物 的固化促進劑)’並在1 〇 〇 °C下攪拌4 8小時進行反應。反應 結束後,在反應混合物中加入乙酸乙酯,對所得的有機層 水洗3次,使用硫酸鎂乾燥,然後餾去溶劑,得到251.2g -41 - 201141950 作爲聚合物(A2-2)的聚有機矽氧烷(S-1)。對於該聚有機矽 氧烷(S-1),藉由凝膠滲透層析儀(GPC)所測定的聚苯乙烯 換算的重量平均分子量Mw爲7,200。 合成例S2〜S7<聚合物(A1)及其他聚合物的合成> 除了在上述合成例S 1中,分別使用表1所述的種類和 量的水解性矽烷化合物及羧酸外,與合成例S 1同樣地進行 水解縮合反應以及水解縮合物與羧酸的反應,由此分別得 到作爲聚合物(A1)的聚有機矽氧烷(S-2)〜(S-6)以及作爲 其他聚合物的聚有機矽氧烷(S-7)。這些聚有機矽氧烷的回 收量和Mw —起顯示於表1。 水解性矽烷化合物 羧酸 聚有機矽氧烷 合成例 種類 量 種類 量 回收量 (g) (莫耳比) (g) (莫耳比) 名稱 聚合物類別 (g) Mw S1 ECETS 123 0.5 OCTBA GMPTS 124 0.5 75 0.3 S-1 A2-2 251.2 7,200 S2 ECETS 148 0.6 OCTBA 75 0.3 GMPTS 99 0.4 DAHBBA 16 0.05 S-2 A1 270.1 7,300 S3 ECETS 123 0.5 OCTBA 75 0.3 GMPTS 124 0.5 DNBA 21 0.1 S-3 A1 275.2 7,000 S4 ECETS 148 0.6 PCHBA 41 0.15 GAPTS 93 0.4 DNBA 21 0.1 S-4 A1 235.5 6,900 ECETS 123 0.5 SACY 49 0.1 S5 GMPTS 124 0.5 DNBA 21 0.1 S-5 A1 220.4 7,100 ECETS 123 0.5 SACY 49 0.1 S6 GAPTS 117 0.5 AQCA 38 0.15 S-6 A1 231.7 7,200 S7 ECETS 246 1.0 OCTBA 125 0.5 S-7 其他聚合物 304.2 7,200 -42- 201141950 表1中的各化合物的簡稱,分別爲以下含義。 {水解性矽烷化合物} ECETS: 2-(3,4-環氧基環己基)乙基三甲氧基砂院 GMPTS: 3-甲基丙烯醯氧基丙基三甲氧基矽烷 GAPTS: 3-丙烯醯氧基丙基三甲氧基砂院 {羧酸} OCTB A : 4-辛氧基苯甲酸 PCHBA: 4-(4-戊基環己基)苯甲酸 DAHBBA: 2-(4-二乙基胺基-2-羥基苯甲醯基)苯甲酸 DNBA : 3,5-二硝基苯甲酸 SACY :琥珀酸=5 f -膽甾烷-3-基 AQC A :蒽醌-2-竣酸 表1中的羧酸使用量,是相對於水解性矽烷化合物合 計的莫耳比。在合成例S2〜S6中,分別使用兩種羧酸。 實施例1 在本實施例中,作爲(A)聚合物,係使用作爲聚合物(A1) 的聚醯亞胺。 <聚合物組成物的調製> 在作爲(A)聚合物的上述合成例P1中所得的含有聚酿 亞胺(P-1)的溶液中,加入作爲有機溶劑的N-甲基-2-吡略 啶酮(NMP)和丁基賽路蘇(BC),形成溶劑組成爲 NMP:BC = 5〇:50(重量比)、固體成分濃度爲6.0重量%的溶 液。使用孔徑爲1 μηι的過濾器過濾該溶液,調製聚合物組 -43 - 201141950 成物。 <液晶胞的製造> 使用上述所調製的聚合物組成物,並改變透明電極的 圖案(兩種)和紫外線照射量(3種水準),製造共計6個液晶 顯示元件,並如下進行評價。 [具有無圖案透明電極的液晶胞的製造] 使用液晶配向膜印刷機(日本寫真印刷(股)製),將上述 調製的聚合物組成物塗布在具有由ITO膜所形成的透明電 極的玻璃基板的透明電極面上,並在80 °C的熱板上加熱1 分鐘(預烘烤)除去溶劑,然後在150°C的熱板上加熱10分 鐘(後烘烤),形成平均膜厚爲600A的塗膜。 使用具有捲繞了人造絲布的輥的硏磨機,以輥旋轉數 爲400rpm,平臺移動速度爲3cm/秒,絨毛壓入長度爲0.1mm 的條件,對該塗膜進行硏磨處理。然後,在超純水中進行 1分鐘超音波洗滌,接著在100 °C潔淨烘箱中乾燥1〇分鐘, 得到具有液晶配向膜的基板。重複這些操作,得到一對(兩 片)具有液晶配向膜的基板。 另外,上述硏磨處理是爲了控制液晶倒塌,並以簡單 的方法進行配向分割而進行的弱硏磨處理。 接著,在上述一對基板中之1片的具有液晶配向膜的 面的外緣上,塗布加入了直徑爲5.5μιη的氧化鋁球的環氧 樹脂接著劑後,使液晶配向膜面相對,將一對基板進行重 疊壓合,並使接著劑固化。接著,由液晶注入口在一對基 -44- 201141950 板間塡充向列型液晶(Merck公司,MLC-6608)後,用丙嫌 酸系光固化接著劑密封液晶注入口,由此製造液晶胞。 重複進行上述操作,製造3個具有無圖案透明電極的 液晶胞。將其中的一個直接提供於後述的預傾角的評價。 對於剩下的兩個液晶胞,分別提供於藉由下述方法在導電 膜間施加電壓的狀態下進行光照射後的預傾角和電壓保持 率的評價。 對於上述所得的液晶胞中的2個,分別在電極間施加 頻率爲60Hz的10V交流電’在驅動液晶的狀態下,使用 以金屬鹵化物燈作爲光源的紫外線照射裝置,以 10,OOOJ/m2或1 00,000J/m2的照射量照射紫外線。另外,該 照射量是使用以3 6 5 nm波長作爲基準的曝光計進行測定的 値。 [預傾角的評價] 對上述製造的各液晶胞,分別按照非專利文獻2 ( T. J . Scheffer et.al. J. Appl. Phys· νο· 19,ρ·2013(1980))中記載 的方法,藉由使用He-Ne雷射的結晶旋轉法測定液晶分子 距離基板面的傾斜角,並將該値作爲預傾角。 光未照射的液晶胞、照射量爲1 0,000J/m2的液晶胞以 及照射量爲100,〇〇〇J/m2的液晶胞之各自的預傾角顯示於 表2。 [電壓保持率的評價] 對上述製造的各液晶胞,在23 °C下以60微秒的施加 -45- 201141950 時間、1 6 7毫秒的間隔施加5 V的電壓後,測定從施加解除 到1 6 7毫秒後的電壓保持率。作爲測定裝置,使用τ 〇 Y 〇 Technica(股)製造的 VHR-1。 照射量爲 l〇,〇〇〇J/m2的液晶胞和照射量爲 100,000J/m2的液晶胞的各自之預·傾角顯示於表2。 [具有形成圖案的透明電極的液晶胞的製造] 使用液晶配向膜印刷機(日本寫真印刷(股)製),將上述 調製的聚合物組成物塗布在2片分別具有形成第1圖所示 的狹縫狀圖案,並分割爲多個區域的I TO電極的玻璃基板 的各電極面上,並在8 0°C的熱板上加熱1分鐘(預烘烤)除 去溶劑,然後在150°C的熱板上加熱10分鐘(後烘烤),形 成平均膜厚爲600A的塗膜。對於該塗膜,在超純水中進行 1分鐘超音波洗滌,然後在l〇〇°C潔淨烘箱中乾燥10分鐘, 得到具有液晶配向膜的基板。重複這些操作,得到一對(2 片)具有液晶配向膜的基板。 接著,在上述一對基板中之1片的具有液晶配向膜的 面的外緣上,塗布加入了直徑爲5.5μιη的氧化鋁球的環氧 樹脂接著劑後,使液晶配向膜面相對,將一對基板進行重 疊壓合,並使接著劑固化。接著,由液晶注入口在一對基 板間塡充向列型液晶(M e r c k公司,M L C - 6 6 0 8 )後,用丙烯 酸系光固化接著劑密封液晶注入口,由此製造液晶胞。 重複進行上述操作,製造3個具有形成有圖案的透明 電極的液晶胞。將其中的一個直接提供於後述的預傾角的 -46 - 201141950 評價。對於剩下的兩個液晶胞,藉由和上述具有無圖案透 明電極的液晶胞的製造中相同的方法,在導電膜間施加電 壓的狀態下以l〇,〇〇〇J/m2或1 00,000J/m2的照射量進行光 照射後,進行回應速度的評價。 另外,此處所用的電極的圖案,是和PSA模式中的電 極圖案相同的圖案。 [回應速度的評價] 使用以正交偏光狀態配置的2片偏光板,包夾上述所 製造的各液晶胞後,首先在未施加電壓的狀態下照射可見 光,用光電萬用表測定透過液晶胞的光輝度,並以該値作 爲相對透光率0 %。接著,和上述同樣測定在液晶胞的電極 間施加5秒鐘6 0V交流電時的透光率,並以該値作爲相對 透光率1 0 0 %。 這時,在對各液晶胞施加6 0V交流電時,測定相對透 光率從1 0%變化至90%所需的時間,將該時間定義爲回應 速度,並進行評價。 光未照射的液晶胞、照射量爲10,000J/m2的液晶胞以 及照射量爲1 00,000 J/m2的液晶胞的各自的回應速度顯示 於表2。 實施例2 在本實施例中,作爲(A)聚合物,使用作爲聚合物(A2-1) 的聚醯亞胺(P-2)和作爲聚合物(A2-2)的聚有機矽氧烷(S-1) 的混合物。 -47- 201141950 在上述合成例P2中所得的含有聚醯亞胺(P-2)的溶液 (換算爲聚醯亞胺(P-2) ’相當於80重量份的量)中,加入作 爲有機溶劑的 N-甲基-2-吡咯啶酮(NMP)和丁基賽路蘇 (BC),並進一步加入20重量份上述合成例S1中所得的聚 有機矽氧烷(S-1),形成溶劑組成爲NMP: BC = 50:50(重量 比)、固體成分濃度爲6 · 0重量%的溶液。使用孔徑爲1 μηι 的過濾器過濾該溶液,調製聚合物組成物,使用該聚合物 組成物製造各種液晶胞,並進行評價。 評價結果示於表2。 實施例3〜8 在本實施例中,作爲(Α)聚合物,使用作爲聚合物(Α1) 的聚有機矽氧烷和作爲其他聚合物的聚醯亞胺或聚醯胺酸 的混合物。 除了在上述實施例2中,使用含有表2所述的聚合物 (聚醯亞胺或聚醯胺酸)的溶液代替含有聚醯亞胺(Ρ-2)的溶 液,並使其中所含的聚合物爲表2所述的量,以及進一步 使用表2所述的種類和量的聚有機矽氧烷代替聚有機矽氧 烷(S-1)外,和實施例2同樣地調製聚合物組成物,使用該 聚合物組成物製造各種液晶胞,並進行評價。 評價結果示於表2。 比較例1 在本比較例中,作爲聚合物,僅使用了係爲其他聚合 物的聚醯亞胺。 -48 - 201141950 在上述實施例1中,除了使用藉E 的含有聚醯亞胺(P-3)的溶液代替含] 液’和實施例1同樣地調製聚合物組 組成物製造各種液晶胞,並進行評價 目平價結果不於表2。 比較例2 在本比較例中,作爲聚合物,同 物的聚醯亞胺和聚有機矽氧烷的混合 在上述實施例2中,除了使用含 液代替含有聚醯亞胺(P-2)的溶液,並 胺爲7〇重量份,以及進一步使用3 0 (S-7)代替聚有機矽氧烷(S-1)外’和實 合物組成物,使用該聚合物組成物製 行評價。 評價結果示於表2。 3上述合成例P 3得到 ί聚醯亞胺(P-1)的溶 成物,使用該聚合物 時使用作爲其他聚合 物。 有聚醯亞胺(Ρ-3)的溶 使其中所含的聚醯亞 重量份聚有機矽氧烷 施例2同樣地調製聚 造各種液晶胞,並進 -49 - 201141950 評價結果 具有形成圖案的電極的液晶胞 回應速度(msec) Μ 陛 態 m 〇 〇 o' Ό\ 00 <N o OO ΓΠ ο 〇Λ α; jo ο <r\ ?: r〇 具有無圖案電極的液晶胞 電壓保持率(%) ίβ 陧 m 踩 100,000 96.6 99.0 98.7 97.3 98.9 J 98.9 98.9 96.2 96.5 ο θ' 99.2 1 __1 99.4 99.4 99.0 99.4 99.0 | 99.5 99.6 99.0 99.0 預傾角(。) Μ 陛 耱 踩 100,000 88.1 86.6 87.2 80.4 85.3 80.7 87.2 85.7 89.5 10,000 88.9 i 88.1 1 88.0 86.2 88.7 86.4 1 88.8 — 88.7 89.6 89.5 ο 896 89.6 89.9 89.6 89.8 1 89.6 1 89.6 89.7 89.6 89.5 聚合物組成物 聚有機矽氧烷 1 量 (重量份) ο R o o 種類 1 i-H xri (N 可 t/3 r〇 cA οό in 0¾ v〇 A 1 rp xh 聚醯亞胺或聚醯胺酸 量 (重量份) Ο ••Η s g o o o o 〇 ο 種類 «•Η ρ!η CN pl. CL, P-4 m cu 1 P-4 ΓΟ cL ΓΛ ΓΟ p!h cL 實施例1 實施例2 實施例3 實施例4 實施例5 實施例6 實施例7 實施例8 比較例1 比較例2 201141950 由表2結果可知,在本 射量爲 100,000J/m2(在 PSA 所得的預傾角的程度過剩, 量情況下,得到適當的預傾 情況下,也可以得到足夠快 也優良。 因此,根據本發明的方 現P S A模式的優點,因此可 產生顯示不与、電壓保持率 陷,並且視角寬、液晶分子 及對比度高的液晶顯示元件 進一步,除了使用在上I 合物組成物,並改變玻璃基 和實施例1同樣地製造各種 任一種聚合物組成物時,在 所示的圖案這兩種情況下, 同樣的效果。 【圖式簡單說明】 第1圖是表示實施例和 圖案的透明導電膜的液晶 圖。 第2圖是表示實施例中 明導電膜的液晶胞中的透明 發明的方法中,如果紫外線照 模式中,以往所採用的値)’則 而在10,000〗/m2或以下的照射 角。此外,即使在照射量少的 的回應速度,並且電壓保持率 法,能夠以較少的光照射量實 以製造不具有因高光照射量而 下降以及長期可靠性不足的缺 的回應速度快、透光率高,以 〇 ®實施例1〜8中所使用的各聚 板所具有的ITO電極圖案外, 液晶胞,並進行評價。在使用 第2圖所示的圖案以及第3圖 都可以分別得到和實施例1〜8 比較例中所製造的,具有形成 S中的透明導電膜圖案的說明 所製造的,具有形成圖案的透 導電膜圖案的說明圖。 -51- 201141950 第3圖是表示實施例中所製造的,具有形成圖案的透 明導電膜的液晶胞中的透明導電膜圖案的說明圖。 【主要元件符號說明】 1 ITO電極 2 狹縫部分 3 遮光膜 -52-In the above formula (D-1), h and i are preferably not 0 at the same time. The diamine which can be used for the synthesis of polyamic acid (A1) is preferably contained in an amount of 0.1 to 10 mol%, more preferably 0.5 to 5 mol%, based on the total of the 2-25 to 201141950 amine. The diamine (1); and, preferably, it contains 10 to 60 mol%, more preferably 20 to 50 mol% of the diamine (2) as described above with respect to the diamine. Further, the use ratio of the diamine (3) as described above is preferably 8.99% by mole or less, more preferably 30% to 7.5 % by mole based on the entire diamine, and further preferably further. It is 30~70% by mole. The ratio of use of the tetracarboxylic dianhydride to the diamine for the synthesis reaction of the polyamic acid (A1) is preferably an acid anhydride group of 1 'equivalent amine' tetracarboxylic dianhydride contained in the diamine compound. The ratio is 0. 2 to 2 equivalents, and further preferably 0. 3 to 1.2 equivalents. The synthesis reaction of polyamic acid (A 1 ) is preferably carried out in an organic solvent, preferably at -20 to 150 ° C, more preferably at a temperature of 0 to 100 ° C, and preferably It is carried out for 0.5 to 24 hours, more preferably for 2 to 10 hours. Here, as far as the organic solvent is concerned, there is no particular limitation as long as the synthetic polyaminic acid (A1) can be dissolved, and for example, N-methyl-2-pyrrolidone, hydrazine, hydrazine-dimethyl diol can be cited. Indoleamine, ν, Ν-dimethylformamide, N,N-dimethylimidazolidinone, dimethyl hydrazine, γ-butyrolactone, tetramethylurea, hexamethylphosphonium triamine, etc. An aprotic polar solvent; a phenolic solvent such as m-methylphenol, xylenol, phenol or halogenated phenol. The amount (a) of the organic solvent used is preferably such that the total amount (b) of the tetracarboxylic dianhydride and the diamine relative to the total amount (a + b) of the reaction solution is 0.1 to 50% by weight, more preferably It is an amount of 5 to 30% by weight. As described above, a reaction solution formed by dissolving polyamic acid (A 1 ) can be obtained. The reaction solution can be directly supplied to the preparation of the liquid crystal alignment agent, and -26-201141950 can separate the polyphthalic acid (A 1 ) contained in the reaction solution and supply it to the liquid crystal alignment agent, or can be separated. The polyamic acid (A 1 ) is refined and then supplied to a liquid crystal alignment agent for preparation. When poly (protonic acid) (A1) is dehydrated and closed to form polyimine (A1), the above reaction solution may be directly subjected to a dehydration ring-closure reaction, or the polylysine (A) may be separated in the reaction solution. After 1), it is supplied to the dehydration ring closure reaction, and the separated polyamic acid (A1) can also be purified and supplied to the dehydration ring closure reaction. The separation of the polyamic acid (A1) can be carried out by injecting the above reaction solution into a large amount of a poor solvent to obtain a precipitate, and drying the precipitate under reduced pressure, or distilling off the reaction under reduced pressure using an evaporator. The method of the organic solvent in the solution or the like is carried out. Further, by dissolving the polyamic acid (A1) in an organic solvent and then precipitating it with a poor solvent, or dissolving the polyamic acid (A1) in an organic solvent, it is obtained. After the solution is washed, the polyacetin (A1) can be purified by performing one or more steps of distilling off the organic solvent in the solution using an evaporator under reduced pressure. - Polyimine (A 1 ) - Polyimine (A1) which is a polymer (A1) used in the present invention, which has a structure which generates a radical by light irradiation and a structure having a photosensitizing function A polyimine of at least one structure and a polymerizable unsaturated bond. This polyimine (A1) can be synthesized by dehydrating and ring-closing the structure of the proline which the polyamic acid (A1) has. At this time, it may be a complete dehydration ring closure of the entire lysine structure, or a partial amidation of the proline structure -27-201141950 to form a guanidinium structure and a quinone imine structure. . The ruthenium imidization ratio of the polyimine (A 1 ) is preferably 40% or more, more preferably 50 to 80%. The dehydration ring closure of polyamic acid (A1) can be carried out by (1) heating poly-proline (A1) or (ii) dissolving poly-proline (A1) in an organic solvent and adding in the solution. The dehydrating agent and the dehydration ring-closing catalyst are subjected to a method of heating as needed. The reaction temperature in the above method (1) for heating the polyamic acid (A1) is preferably 50 to 200 ° C, and more preferably 60 to 170 ° C. When the reaction temperature is less than 50 °C, the dehydration ring-closure reaction does not proceed sufficiently; and when the reaction temperature exceeds 200 °C, the molecular weight of the obtained polyimine (A1) decreases. The reaction time in the method of heating the polyamic acid (A1) is preferably from 0.5 to 48 hours, more preferably from 2 to 20 hours. On the other hand, in the above method (ii) in which a dehydrating agent and a dehydration ring-closing catalyst are added to a solution of polyamic acid (A1), as the dehydrating agent, for example, acetic anhydride, propionic anhydride, trifluoroacetic anhydride can be used. Anhydride. The amount of the dehydrating agent to be used is preferably 0.01 to 20 moles per 1 mole of the amic acid structural unit. Further, as the dehydration ring-closure catalyst, a tertiary amine such as pyridine, trimethylpyridine, lutidine or triethylamine can be used. However, it is not limited to this. The amount of the dehydration ring-closing catalyst to be used is preferably 〇 · 〇 1 to 1 〇 mol with respect to the dehydrating agent used for 1 mol. The organic solvent used in the dehydration ring-closure reaction may, for example, be an organic solvent exemplified as a solvent used in the synthesis of polyglycine (A 1 ). The reaction temperature of the dehydration ring-closure reaction is preferably from 0 to 18 ° C. More preferably from 1 to 15 ° C. The reaction time is preferably from 0.5 to 2 0 hours, more preferably from 1 to 8 hours. The polyimine (a 1 '' obtained in the above method (i) can be directly supplied to the preparation of the liquid crystal alignment agent. The obtained polyimine (A 1 ) can be purified and then supplied to the liquid crystal alignment agent. On the other hand, in the above method (i i), a reaction solution containing polyimine (A 1 ) can be obtained. The reaction solution can be directly supplied to the preparation of the liquid crystal alignment agent. The preparation of the liquid crystal alignment agent can also be carried out by removing the dehydrating agent and the dehydration ring-closing catalyst from the reaction solution, or the polyimine (A 1 ) can be separated. Thereafter, the preparation of the liquid crystal alignment agent may be supplied, or the separated polyimine (A1) may be purified and then supplied to the liquid crystal alignment agent. In order to remove the dehydrating agent and the dehydration ring-closing catalyst from the reaction solution, a method such as solvent replacement can be used. The separation and purification of the polyimine (A 1 ) can be carried out by the same operation as described above for the separation and purification method of the polyamic acid (A 1 ). - Polyproline (A2-1) - Polyphthalic acid (A2-1) which is a polymer (A2-1) used in the present invention has a structure which generates a radical by light irradiation and has a light-sensitive structure At least one structure of polyfunctional acid in the structure of the functional structure. Such polyamic acid (A2_1) can be synthesized by any synthesis method, for example, by reacting a tetracarboxylic dianhydride with a diamine containing a diamine (1). The tetracarboxylic dianhydride used for the synthesis of polyamic acid (A2-1) can be the same as the above-mentioned substance -29-201141950 as a tetracarboxylic dianhydride for synthesizing polyamic acid (A1). . Preferred tetracarboxylic dianhydrides and their preferred use ratios are also the same. A diamine for synthesizing polyamic acid (A2-1), comprising a diamine (1), and may be composed only of the diamine (1), or may contain a diamine in addition to the diamine (1) (3) . These diamines (1) and (3)' may be the same as those described above as the diamines (1) and (3) for synthesizing polyamic acid (A1). The diamine for synthesizing the polyamic acid (A2-1) preferably contains 0.1 to 20 mol% of the diamine (1), more preferably 〇.5 to 10 mol, based on the entire diamine. %. The proportion of the diamine (3) to be used is preferably 99 9 mol% or less, more preferably 8 5 to 9 9.5 mol%, based on the entire diamine. The synthesis, separation and purification of poly-proline (A2-1) can be carried out in the same manner as the method described for the synthesis, separation and purification of poly-proline (A1). - Polyimine (A2-1) - Polyimine (A2-1) which is a polymer (A2-1) used in the present invention is a structure having a radical generated by light irradiation and having light sensitivity A polyimine of at least one structure of a functional structure. Such a polyimine (A2-1) can be synthesized by dehydrating and ring-closing a guanidine structure of the polyamic acid (A2-1). The ruthenium imidization ratio of the polyimine (A 2 - 1 ) is preferably 40% or more, and more preferably 50 to 80%. The dehydration ring-closure reaction of poly-proline (A2 -1) and the separation and purification of the obtained poly-imine (A2-1) are combined with dehydration ring closure reaction of poly-proline (A1) and poly-imine The method described in the separation and purification method of (A1) is carried out in the same manner. -30- 201141950 - Polyorganooxynonane (Α2·2)_ Polyorganosiloxane (Α2-2) which is a polymer (A2·1) used in the present invention, is a polymer having a polymerizable unsaturated bond Organic oxirane. Such a polyorganosiloxane (Α2-2) can be synthesized by any synthesis method, for example, by a mixture of a decane compound containing a decane compound (1), preferably in an organic solvent, water and a catalyst. It is synthesized by carrying out hydrolysis condensation in the presence. A decane compound which can be used for the synthesis of a polyorganosiloxane (Α2-2), may be composed only of the decane compound (1) as described above, or may contain, in addition to the above decane compound (1), a decane selected from decane. At least one of the group consisting of the compound (2) and the decane compound (3). These decane compounds (1), (2), and (3)' are described above as the decane compounds (1), (2), and (3) which can be used as precursors for the synthesis of polyorganosiloxanes (Α1), respectively. The same substance. The decane compound which can be used for the synthesis of the polyorganooxy oxane (Α2-2) is more preferably contained in an amount of more than 0.1% by mole, more preferably 0.1% to 20% by mole, more preferably all of the decane compound. It is a decane compound (1) as described above containing 01 to 1 mol%. The content ratio of the decane compound (2) as described above is preferably 70 mol% or less, more preferably 20 to 60 mol%, based on the total decane compound. Further, the ratio of the use of the decane compound (3) as described above is preferably 7 〇 mol% or less, more preferably 50 mol% or less, based on the total decane compound. From the above, it is understood that a polyorganosiloxane which is a precursor of polyorganosiloxane (Α1) can also be used as the polyorganosiloxane (Α2_2). 201141950 The synthesis and separation of polyorganosiloxane (A2-2) can be carried out in the same manner as described for the synthesis and separation of precursors of polyorganosiloxane (A1). - Other polymer - The (A) polymer ' in the present invention contains the polymer (A1) or both the polymer (A2-1) and the polymer (A2-2). (A) a polymer which may be composed only of the polymer (a 1), or may be composed only of a polymer (Α·2-1) and a polymer (A2-2), and may further contain, in addition to these polymers, It also contains other polymers. The above other polymer is a polymer which does not have the specific structure as described above, and examples thereof include polylysine, polyimine, polyphthalate, polyester, polyamine, poly, which have no specific structure. An organic siloxane, a cellulose derivative, a polyacetal derivative, a polystyrene derivative, a poly(styrene-phenylmethylene iodide) derivative, a poly(meth) acrylate, or the like, and One or more selected from the group can be appropriately selected and used. The other polymer in the present invention is preferably at least one selected from the group consisting of polyglycolic acid, polyimine, and polyorganosiloxane. Polylysine having no specific structure can be obtained by reacting a tetracarboxylic dianhydride with the above diamine (3). By dehydrating the polyamic acid ring, a polyimine having no specific structure can be obtained. The polyorganosiloxane having no specific structure can be obtained by subjecting at least one selected from the group consisting of the decane compounds (2) and (3) to hydrolysis condensation. Their synthesis reactions, as well as separation and refining, are described with reference to examples of polymers having a specific structure in the '32-201141950' section, which will be apparent to those skilled in the art. The use ratio of the other polymer in the polymer (A) is preferably 80% by weight or less, and more preferably 70% by weight or less based on the total of the polymer. The (A) polymer in the present invention is preferably any one of the following. (1) A method consisting only of a polyorganosiloxane (A1); (2) A polyorganosiloxane (A1) composed of another polymer selected from a polymer having no specific structure a manner of at least one of the group consisting of proline and polyimine; (3) at least one selected from the group consisting of polyamic acid (A1) and polyimine (A1) (4) consisting of at least one selected from the group consisting of polyamic acid (A1) and polyimine (A1) and other polymers selected from the group consisting of a manner of at least one of the group consisting of polyamic acid and polyimine with a specific structure; and (5) selected from polyamine (A2-1) and polyimine (A2-1) And at least one of the group consisting of a polyorganosiloxane (A2-2). The ratio of use of each polymer in the above mode (5) is as a polyorganosiloxane (A2-2) relative to a polyphosphonium (A2-1) and a polyimine (A2-1). The ratio of at least one of the groups formed by the polyorganosiloxane (A2-2) is preferably from 2 to 30% by weight, more preferably from 5 to 20% by weight. This mode (5) preferably does not contain other polymers. (A) the polymer, as a whole thereof, preferably contains 0.5 to 5 mmol/g, more preferably 1 to 4 mmol/g of a structure which generates radicals by light irradiation -33-201141950 And at least one of the structures having a photosensitizing function, and preferably comprising 1 to 15 mmol/g, more preferably 1 to ίο/g of a polymerizable unsaturated bond. [(B) Organic solvent] The (B) organic solvent in the present invention may, for example, be N-•2-pyrrolidone, γ-butyrolactone, γ-butyrolactam, hydrazine, hydrazine-dimethyl Ν,Ν-dimethylacetamide, 4-hydroxy-4-methyl-2-pentanone, glycol ether, butyl lactate, butyl acetate, methyl methoxypropionate, ethoxy Methyl ester, ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol n-propyl ether, ethyl isopropyl ether, ethylene glycol n-butyl ether (butyl race), ethylene glycol dimethyl ether glycol ether acetic acid Ester, diethylene glycol dimethyl ether, diethylene glycol diethyl ether glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monomethyl ether acetate diethylene glycol monoethyl ether acetate, diiso Butanone, isoamyl propionate, isoisoamyl ester, diisoamyl ether, and the like, and one selected from the group consisting of may be used. [Polymer Composition] The polymer composition used in the present invention is preferably prepared by dissolving a polymer (Α) as described above in a solution of (Β) an organic solvent as described above. In terms of ratio, the solid content concentration of the polymer group (the ratio of the total weight of the polymer (Α) of the polymer composition in the polymer composition) is preferably from 1 to 15% by weight, more preferably 1 . 5 to 8 wt% ratio. <Manufacturing method of liquid crystal display element>; and liquid crystal display element of the present invention, which is composed of millimethylamine, monopropionic acid glycol, ethyl ester, or butyric acid or the like. a manufacturing method characterized in that a polymer composition as described above is applied to the conductive film of a pair of substrates having a conductive film to form a coating film; and the coating layer is formed by a liquid crystal molecular layer a pair of substrates of the film are disposed to face each other such that the coating films face each other to form a liquid crystal cell; and a step of applying light to the liquid crystal cell in a state where a voltage is applied between the conductive films of the pair of substrates, As the base plate, for example, glass such as float glass or soda lime glass; polyethylene terephthalate, polybutylene terephthalate, polyether mill, polycarbonate, etc., etc. can be used. The formed transparent substrate or the like. As the conductive film, a transparent conductive film such as a NESA (registered trademark) film formed of Sn 2 or an ITO film formed of In 2 〇 3 - Sn02 is preferably used. The conductive film is preferably a patterned conductive film which is divided into a plurality of regions. When such a conductive film structure is formed, when a voltage is applied between the conductive films (described later), by applying different voltages to the respective regions, the direction of the pretilt angle of the liquid crystal molecules in each region can be changed, whereby the viewing angle characteristics can be made. More broad. In order to apply a polymer composition to the conductive film of such a substrate, an appropriate coating method such as a roll coating method, a spin coating method, a printing method, or an inkjet method can be employed. After the application, the coated surface was preheated (prebaked), followed by firing (post-baking) to form a coating film. The pre-baking conditions are, for example, 〇~5 minutes at 4 Torr to 120 ° C, and post-baking conditions, preferably at I20 to 300 I, more preferably at 150 to 25 Torr; It is preferably carried out for 5 to 200 minutes, more preferably for 10 to 〇〇 minutes. Film after post-baking -35- 201141950 The film thickness is preferably 0.001 to Ιμηη, more preferably 0.005 to 0.5 μm. The coating film thus formed may be directly supplied to the production of the liquid crystal cell in the next step, or the coating film may be subjected to honing treatment as needed before the production of the liquid crystal cell. This honing treatment can be carried out by rubbing the coating film surface in a predetermined direction by using a roll of a cloth formed of a fiber such as nylon, rayon or cotton. Here, as described in the patent document 2 (Japanese Laid-Open Patent Publication No. Hei No. Hei No. Hei. The honing treatment is performed in the direction, and then the treatment for removing the photoresist film is performed, and different honing directions are formed in each region, whereby the field-of-view characteristics of the obtained liquid crystal display element can be further improved. Next, a pair of substrates on which the coating film is formed are disposed to face each other with the liquid crystal molecule layer interposed therebetween, and the coating films are opposed to each other to form a liquid crystal cell. The liquid crystal molecule used herein is preferably a nematic liquid crystal having a negative dielectric anisotropy, and for example, a dicyanobenzene liquid crystal, a tanning liquid crystal, a Schiff base liquid crystal, an oxidized azo can be used. Liquid crystals, biphenyl liquid crystals, phenylcyclohexane liquid crystals, and the like. The thickness of the liquid crystal molecule layer is preferably from 1 to 5 μm. In order to produce a liquid crystal cell using such a liquid crystal, for example, the following two methods are exemplified. In the first method, by arranging the two substrates in a gap (cell gap), the respective liquid crystal alignment films are opposed to each other, and the peripheral portions of the two substrates are bonded together using a sealant. After the liquid crystal is injected into the interstitial space defined by the surface of the substrate and the sealant-36-201141950, the injection is closed to manufacture a liquid crystal cell. Or, in the second method, a predetermined portion on one of the two substrates of the film is coated with a curable sealant, and then liquid crystal is prescribed on the liquid crystal alignment film surface, and then bonded to another substrate. When the liquid crystal alignment film is used, the liquid crystal is dispersed on the entire surface of the substrate, and then the substrate is aligned to cure the sealing agent, whereby the liquid crystal cell can be manufactured. Then, the liquid crystal cell is irradiated with light in a state in which the conductive film of the pair of substrates is provided. The voltage applied here may be, for example, a current of 5 to 50 volts. As the light to be irradiated, for example, ultraviolet rays and visible light containing 150 to 10,000 Å, and preferably 300 to 400 nm outer wires can be used. As the light source for illuminating light, for example, a low pressure mercury lamp, a xenon lamp, a metal halide lamp, an argon resonance excimer laser or the like can be used. Preferably, the ultraviolet light in the wavelength region is obtained by using the light source in combination with, for example, a filter, a diffraction grating or the like. In terms of the amount of light irradiation, it is preferably 1,0 0 0 J / m 2 1 00,000 J/m 2 , more preferably 1, 〇〇〇 to 50,000 J/m 2 . In the production of a liquid crystal display element of the PSA mode, it is necessary to illuminate the right and left light. However, in the method of the present invention, even if it is 5,000 J/m 2 or less, further i 〇, 〇〇〇 j / m 2 or less is desirable. a liquid crystal display element, and in addition to helping to reduce the hole, thereby forming a liquid crystal alignment cloth, for example, a plurality of ultraviolet light drops at opposite positions, and a violet-pressure mercury lamp that applies a direct current voltage to the ultraviolet light or a wavelength of 80 nm wavelength light, Lamps, xenon lamps, wires, methods that can be borrowed, etc., and less than the currently known light dose of 100,000 J/m2, can also obtain the manufacturing cost of the liquid crystal display element -37-201141950 pieces, and can also avoid glare The decrease in electrical characteristics and the decrease in long-term reliability caused by irradiation. Then, a liquid crystal display element can be obtained by bonding a polarizing plate to the outer surface of the liquid crystal cell after the above-described treatment. The polarizing plate used herein may be a polarizing plate formed by sandwiching a polarizing film called an "H film" with a cellulose acetate protective film, or a polarizing plate formed by the ruthenium film itself. The alcohol is taken up while absorbing iodine. [Examples] Synthesis Example Pl <Synthesis of polymer (Α1)> 112 g (0.50 mol) of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride as tetracarboxylic dianhydride and llg (0.10 mol) as diamine P-phenylenediamine, 17 g (0.05 mol) {4-[2-(2,4-diaminophenoxy)-ethoxy]-phenyl}-phenyl-methanone, 79 g (0.30 Mo Ear) 3,5-diamino (2'-methacryloxyethyl) benzoate and 26 g (0.05 mol) of 3(3,5-diaminophenoxy)cholesterane The solution was dissolved in 750 g of N-methyl-2-pyrrolidinone (NMP), and reacted at 60 ° C for 6 hours to obtain a solution containing polylysine. A small amount of the obtained polyaminic acid solution was added, and NMP was added to form a solution having a polyglycine concentration of 1% by weight, and the measured solution viscosity was 58 mPai. Next, 1,800 g of NMP was added to the obtained polyamic acid solution, and 40 g of pyridine and 51 g of acetic anhydride were added, and dehydration ring closure was carried out for 4 hours at 1 1 °C. After the dehydration ring-closure reaction, the solvent in the system is subjected to solvent replacement with a new NMP (by the operation, the pyridine and acetic anhydride used in the dehydration ring-closure reaction are discharged to the outside of the system. The same applies hereinafter), and the obtained product contains about 15 Weight -38 - 201141950 Amount of the polymer as a solution of the polymer (A 1 ) having a ruthenium iodide ratio of about 50% of polyimine (Ρ - 1 ). A small amount of the obtained polyimine solution was added, and Ν Μ Ν was added to form a solution having a polyimine concentration of 10% by weight, and the measured solution viscosity was 6 3 m P a . s 〇 Synthesis Example P2 <Synthesis of Polymer (A2-1)> 112 g (0.50 mol) of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride as a tetracarboxylic dianhydride, and 27 g (as a diamine) 0.25 mol) p-phenylenediamine, 70 g (0.20 mol) {4-[2-(2,4-diaminophenoxy)-ethoxy]-phenyl}-phenyl-methanone and 26 g (0.05 mol) 3 (3,5-diaminophenoxy)cholesterane, dissolved in 750 g of NMP, and reacted at 60 ° C for 6 hours to obtain a solution containing polylysine. A small amount of the obtained polyaminic acid solution was taken, and NMP was added to form a solution having a polyglycine concentration of 1% by weight, and the measured solution viscosity was 61 mPa·s. Next, 1,800 g of NMP was added to the obtained polyamic acid solution, and 40 g of pyridine and 51 g of acetic anhydride were added, and dehydration ring closure was carried out at 110 ° C for 4 hours. After the dehydration ring closure reaction, the solvent in the system was subjected to solvent replacement with a new NMP to obtain a polyimine (P) containing about 15% by weight of the polymer (A2-1) having a ruthenium iodide ratio of about 50%. - 2) solution. A small amount of the obtained polyimine solution was added, and NMP was added to form a solution having a polyamidene concentration of 1% by weight, and the measured solution viscosity was 68 mP a·s. Synthesis Example P3 <Synthesis of Other Polymers> 110 g (0.50 mol) of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride as a tetracarboxylic dianhydride, and 49 g (〇. 20 mo as a diamine) Ear) p-phenylenediamine, -39- 201141950 38g (0.25 mol) 3,5-diaminobenzoic acid and 25 g (0.05 mol) 5F cholestan-3-yl-2,4-diaminobenzene The ether is dissolved in 75 (^), and reacted at 6 ° C for 6 hours to obtain a solution containing polylysine. A small amount of the obtained polyaminic acid solution is added, and NMP is added to form a poly A solution having a lysine concentration of 10% by weight, the measured solution viscosity was 56 mP a.s. Next, 1,800 g of NMP was added to the obtained polyaminic acid solution, and 40 g of pyridine and 51 g of acetic anhydride were added. The dehydration ring closure was carried out at 110 ° C for 4 hours. After the dehydration ring closure reaction, the solvent in the system was replaced with a new NMP solvent to obtain a ruthenium iodide ratio of about 5 wt% as another polymer. 0% solution of polyimine (P - 3 ). Take a small amount of the obtained polyimine solution and add NMP to form a solution with a concentration of 1 〇 by weight of polyimine. The solution is determined. Degree 69 mPa_s. Synthesis Example P4 <Synthesis of Other Polymers> 200 g (1.0 mol) of 1,2,3,4-cyclobutanetetracarboxylic dianhydride as a tetracarboxylic dianhydride, and 210 g (1.0 mol) as a diamine 2,2'-Dimethyl-4,4'-diaminobiphenyl, dissolved in a mixed solvent of 370 g of NMP and 3,300 g of γ-butyrolactone, carried out at 4 ° C The reaction was carried out in an hour to obtain a solution of polyphthalic acid (P-4) containing 1% by weight as another polymer. The polyglutamic acid solution has a solution viscosity of 160 mPai. Synthesis Example Sl <Synthesis of Polymer (A2-2)> [Hydrolysis Condensation Reaction] In a reaction vessel having a stirrer, a thermometer, a dropping funnel, and a reflux condenser, 123 g of 2-(hydrogenated decane compound) was added. 3,4- -40- 201141950 Epoxycyclohexyl)ethyltrimethoxydecane (ECETS) and 124 g of 3-methylpropenyloxypropyltrimethoxydecane (GMPTS) (ECETS: GMPTS = 50: 50 (mole ratio)), and 500 g of methyl isobutyl ketone as a solvent and 10.0 g of triethylamine as a catalyst, and mixed at room temperature. Then, 100 g of deionized water was added dropwise from the dropping funnel over 30 minutes, and the mixture was reacted at 80 ° C for 6 hours while stirring under reflux. After completion of the reaction, the organic layer was taken out and washed with a 0.2% by weight aqueous solution of ammonium nitrate until the water after washing was neutral, and then the solvent and water were distilled off under reduced pressure to give an epoxy group as a viscous transparent liquid. Hydrolyzed condensate. With respect to the hydrolysis condensate, 'H-NMR analysis was carried out, and as a result, a peak of the epoxy group was obtained in the vicinity of the chemical shift (δ) = 3.2 ppm, and it was confirmed that no epoxy was generated in the reaction. The side reaction of the base. [Reaction of a Hydrolyzed Condensate Containing an Epoxy Group with a Carboxylic Acid] In a 200 mL three-necked flask, 30.0 g of methyl isobutyl ketone as a solvent was added as a carboxylic acid in the hydrolysis-condensation condensate having an epoxy group obtained above. 75 g of 1 g (corresponding to 30 mol% based on the total amount of the hydrolyzable decane compound used as a raw material, and 60 mol% equivalent to the above-mentioned hydrolyzed condensate) 4-octyloxybenzene Formic acid (OCTBA) and 0.10 g of UCAT 18X (trade name 'San-apro (manufactured by San-apro Co., Ltd., a curing accelerator for an oxygen compound)) as a catalyst were stirred at 1 ° C for 48 hours to carry out a reaction. After completion of the reaction, ethyl acetate was added to the reaction mixture, and the obtained organic layer was washed with water three times, dried over magnesium sulfate, and then evaporated to give 251.2 g - 41 - 201141950 as a polyorganic polymer (A2-2). Oxane (S-1). With respect to the polyorganosiloxane (S-1), the polystyrene-equivalent weight average molecular weight Mw measured by a gel permeation chromatography (GPC) was 7,200. Synthesis example S2~S7 <Synthesis of Polymer (A1) and Other Polymers> In the same manner as in Synthesis Example S1 except that the hydrolyzable decane compound and the carboxylic acid of the type and amount described in Table 1 were used in the above Synthesis Example S1. The hydrolysis condensation reaction and the reaction of the hydrolysis condensate with the carboxylic acid are carried out, thereby obtaining polyorganosiloxane (S-2) to (S-6) as the polymer (A1) and polyorganism as another polymer. Oxane (S-7). The recovery amount of these polyorganosiloxanes and Mw are shown in Table 1. Hydrolyzable decane compound Carboxylic acid polyorganooxane Synthesis Example Species Quantity Recycling amount (g) (Mohr ratio) (g) (Mo Erbi) Name polymer class (g) Mw S1 ECETS 123 0.5 OCTBA GMPTS 124 0.5 75 0.3 S-1 A2-2 251.2 7,200 S2 ECETS 148 0.6 OCTBA 75 0.3 GMPTS 99 0.4 DAHBBA 16 0.05 S-2 A1 270.1 7,300 S3 ECETS 123 0.5 OCTBA 75 0.3 GMPTS 124 0.5 DNBA 21 0.1 S-3 A1 275.2 7,000 S4 ECETS 148 0.6 PCHBA 41 0.15 GAPTS 93 0.4 DNBA 21 0.1 S-4 A1 235.5 6,900 ECETS 123 0.5 SACY 49 0.1 S5 GMPTS 124 0.5 DNBA 21 0.1 S-5 A1 220.4 7,100 ECETS 123 0.5 SACY 49 0.1 S6 GAPTS 117 0.5 AQCA 38 0.15 S-6 A1 231.7 7,200 S7 ECETS 246 1.0 OCTBA 125 0.5 S-7 Other polymers 304.2 7,200 -42- 201141950 The abbreviations of the respective compounds in Table 1 have the following meanings. {Hydrolyzed decane compound} ECETS: 2-(3,4-epoxycyclohexyl)ethyltrimethoxy sand GMPTS: 3-methylpropenyloxypropyltrimethoxydecane GAPTS: 3-propene oxime Oxypropyltrimethoxy sands {carboxylic acid} OCTB A : 4-octyloxybenzoic acid PCHBA: 4-(4-pentylcyclohexyl)benzoic acid DAHBBA: 2-(4-diethylamino group- 2-hydroxybenzhydryl)benzoic acid DNBA: 3,5-dinitrobenzoic acid SACY: succinic acid = 5 f -cholest-3-yl AQC A : 蒽醌-2-decanoic acid The amount of the carboxylic acid used is a molar ratio with respect to the total of the hydrolyzable decane compound. In Synthesis Examples S2 to S6, two carboxylic acids were used, respectively. Example 1 In the present example, as the (A) polymer, a polyimine as the polymer (A1) was used. <Preparation of Polymer Composition> N-methyl-2 as an organic solvent was added to the solution containing the polyiamine (P-1) obtained in the above Synthesis Example P1 of the (A) polymer. - Pyrrolidone (NMP) and butyl sirolimus (BC), forming a solution having a solvent composition of NMP: BC = 5 〇: 50 (weight ratio) and a solid concentration of 6.0% by weight. The solution was filtered using a filter having a pore size of 1 μηι to prepare a polymer group -43 - 201141950. <Production of Liquid Crystal Cell> Using the polymer composition prepared as described above, and changing the pattern (two types) of the transparent electrode and the ultraviolet irradiation amount (three kinds of levels), a total of six liquid crystal display elements were produced and evaluated as follows. . [Production of Liquid Crystal Cell Having a Patternless Transparent Electrode] The above-prepared polymer composition was applied to a glass substrate having a transparent electrode formed of an ITO film using a liquid crystal alignment film printer (manufactured by Nippon Photographic Co., Ltd.). On the transparent electrode surface, and heated on a hot plate at 80 °C for 1 minute (prebaking) to remove the solvent, and then heated on a hot plate at 150 ° C for 10 minutes (post-baking) to form an average film thickness of 600A. Coating film. The coating film was subjected to honing treatment using a honing machine having a roller wound with rayon cloth at a roller rotation number of 400 rpm, a table moving speed of 3 cm/sec, and a pile pressing length of 0.1 mm. Then, ultrasonic cleaning was performed for 1 minute in ultrapure water, followed by drying in a 100 ° C clean oven for 1 minute to obtain a substrate having a liquid crystal alignment film. These operations were repeated to obtain a pair (two sheets) of substrates having a liquid crystal alignment film. Further, the above honing treatment is a weak honing treatment for controlling the collapse of the liquid crystal and performing the alignment division in a simple manner. Next, an epoxy resin adhesive to which an alumina ball having a diameter of 5.5 μm is applied is applied to the outer edge of one of the pair of substrates having the liquid crystal alignment film, and then the liquid crystal alignment film faces are opposed to each other. A pair of substrates are laminated and laminated, and the adhesive is cured. Next, the liquid crystal injection port is filled with a nematic liquid crystal (Merck, MLC-6608) between a pair of base-44-201141950 plates, and then the liquid crystal injection port is sealed with a acrylic acid-based photocurable adhesive to produce a liquid crystal. Cell. The above operation was repeated to fabricate three liquid crystal cells having a pattern-free transparent electrode. One of them is directly provided for the evaluation of the pretilt angle to be described later. The remaining two liquid crystal cells were respectively provided for evaluation of the pretilt angle and the voltage holding ratio after light irradiation in a state where a voltage was applied between the conductive films by the following method. For two of the liquid crystal cells obtained above, a 10 V alternating current having a frequency of 60 Hz was applied between the electrodes. In the state in which the liquid crystal was driven, an ultraviolet irradiation device using a metal halide lamp as a light source was used at 10,000 J/m 2 or The irradiation dose of 1 00,000 J/m2 was irradiated with ultraviolet rays. Further, the amount of irradiation was measured using an exposure meter having a wavelength of 365 nm as a reference. [Evaluation of Pretilt Angle] Each of the liquid crystal cells produced as described above is described in Non-Patent Document 2 (T. J. Scheffer et. al. J. Appl. Phys. νο. 19, ρ. 2013 (1980)). In the method, the tilt angle of the liquid crystal molecules from the substrate surface is measured by a crystal rotation method using a He-Ne laser, and the enthalpy is used as a pretilt angle. The liquid crystal cell which was not irradiated with light, the liquid crystal cell having an irradiation amount of 10,000 J/m2, and the irradiation amount of 100, and the respective pretilt angles of the liquid crystal cells of 〇〇〇J/m2 are shown in Table 2. [Evaluation of Voltage Retention Rate] The respective liquid crystal cells produced above were applied with a voltage of 5 V at 23 ° C for 60 μsec application -45 - 201141950 time and 167 ms intervals, and then the measurement was released from application to The voltage holding ratio after 1 6 7 ms. As the measuring device, VHR-1 manufactured by τ 〇 Y 〇 Technica Co., Ltd. was used. The respective pretilt angles of the liquid crystal cells of 〇〇〇J/m2 and the liquid crystal cells having an irradiation amount of 100,000 J/m2 are shown in Table 2. [Production of Liquid Crystal Cell Having Patterned Transparent Electrode] The liquid crystal alignment film printer (manufactured by Nippon Photo Printing Co., Ltd.) was used to apply the polymer composition prepared as described above to the two sheets, respectively. a slit pattern, and divided into electrode faces of the glass substrate of the I TO electrode of a plurality of regions, and heated on a hot plate at 80 ° C for 1 minute (prebaking) to remove the solvent, and then at 150 ° C The hot plate was heated for 10 minutes (post-baking) to form a coating film having an average film thickness of 600 Å. The coating film was subjected to ultrasonic cleaning in ultrapure water for 1 minute, and then dried in a clean oven at 10 ° C for 10 minutes to obtain a substrate having a liquid crystal alignment film. These operations were repeated to obtain a pair (2 pieces) of a substrate having a liquid crystal alignment film. Next, an epoxy resin adhesive to which an alumina ball having a diameter of 5.5 μm is applied is applied to the outer edge of one of the pair of substrates having the liquid crystal alignment film, and then the liquid crystal alignment film faces are opposed to each other. A pair of substrates are laminated and laminated, and the adhesive is cured. Next, a nematic liquid crystal (M L C - 6 6 0 8 ) was filled between a pair of substrates by a liquid crystal injection port, and then the liquid crystal injection port was sealed with an acrylic photocurable adhesive to produce a liquid crystal cell. The above operation was repeated to fabricate three liquid crystal cells having a patterned transparent electrode. One of them is directly provided for the evaluation of the pretilt angle -46 - 201141950 described later. With respect to the remaining two liquid crystal cells, by applying a voltage between the conductive films in the same manner as in the above-described production of the liquid crystal cell having the patternless transparent electrode, 〇J/m2 or 1 00,000 is applied. After the irradiation amount of J/m2 was irradiated with light, the response speed was evaluated. Further, the pattern of the electrode used here is the same pattern as the electrode pattern in the PSA mode. [Evaluation of Response Speed] After using the two polarizing plates arranged in the orthogonal polarization state and sandwiching each of the liquid crystal cells manufactured as described above, first, the visible light is irradiated without applying a voltage, and the light transmitted through the liquid crystal cell is measured by a photoelectric multimeter. Brightness, and the enthalpy is used as the relative light transmittance of 0%. Next, the light transmittance at the time of applying 60 rpm of alternating current between the electrodes of the liquid crystal cells was measured in the same manner as above, and the enthalpy was used as the relative light transmittance of 100%. At this time, when 60 V alternating current was applied to each liquid crystal cell, the time required for the relative light transmittance to change from 10% to 90% was measured, and this time was defined as the response speed and evaluated. The respective response speeds of the liquid crystal cells which were not irradiated with light, the liquid crystal cells having an irradiation amount of 10,000 J/m 2 , and the liquid crystal cells having an irradiation amount of 100,000 J/m 2 are shown in Table 2. Example 2 In the present example, as the (A) polymer, polyimine (P-2) as a polymer (A2-1) and polyorganosiloxane as a polymer (A2-2) were used. a mixture of (S-1). -47-201141950 The polyimine (P-2)-containing solution obtained in the above Synthesis Example P2 (in terms of the amount of polyethylenimine (P-2)' equivalent to 80 parts by weight) is added as an organic a solvent of N-methyl-2-pyrrolidone (NMP) and butyl sarbuta (BC), and further adding 20 parts by weight of the polyorganosiloxane (S-1) obtained in the above Synthesis Example S1 to form The solvent composition was a solution of NMP: BC = 50:50 (weight ratio) and a solid concentration of 0.001% by weight. This solution was filtered using a filter having a pore size of 1 μηι to prepare a polymer composition, and various liquid crystal cells were produced using the polymer composition and evaluated. The evaluation results are shown in Table 2. Examples 3 to 8 In this example, as the (ruthenium) polymer, a mixture of a polyorganosiloxane as a polymer (Α1) and a polyimide or polyamine as another polymer was used. In addition to the above Example 2, a solution containing the polymer (polyimine or polylysine) described in Table 2 was used instead of the solution containing polyimine (Ρ-2) and contained therein. The polymer composition was adjusted in the same manner as in Example 2 except that the polymer was an amount described in Table 2, and the polyorganosiloxane was further used in place of the polyorganosiloxane (S-1) using the kind and amount described in Table 2. Various liquid crystal cells were produced using the polymer composition and evaluated. The evaluation results are shown in Table 2. Comparative Example 1 In this comparative example, only polyimide which is another polymer was used as the polymer. -48 - 201141950 In the above-mentioned Example 1, a liquid crystal cell was produced by preparing a polymer group composition in the same manner as in Example 1 except that a solution containing polyimine (P-3) by E was used instead of the liquid containing solution. And the results of the evaluation of the objective parity are not shown in Table 2. Comparative Example 2 In this comparative example, as a polymer, the mixture of the same polyimine and polyorganosiloxane was used in the above Example 2 except that the liquid was used instead of the polyimine (P-2). The solution, and the amine is 7 parts by weight, and further 30 (S-7) is used instead of the polyorganosiloxane (S-1) outer' and the composition of the composition, and the polymer composition is evaluated. . The evaluation results are shown in Table 2. 3 The above Synthesis Example P 3 gave a lysine of the poly(impurine) (I), and when the polymer was used, it was used as another polymer. The polyimine (Ρ-3) is dissolved in a polyfluorene-containing polyorganosiloxane in which the polyorganosiloxane is applied in the same manner to prepare various liquid crystal cells, and the evaluation result has a pattern. Liquid crystal cell response speed of the electrode (msec) 陛 m state m 〇〇o' Ό\ 00 <N o OO ΓΠ ο 〇Λ α; jo ο <r\ ?: r〇 liquid crystal cell voltage retention ratio with no pattern electrode (%) ίβ 陧m stepping on 100,000 96.6 99.0 98.7 97.3 98.9 J 98.9 98.9 96.2 96.5 ο θ' 99.2 1 __1 99.4 99.4 99.0 99.4 99.0 | 99.5 99.6 99.0 99.0 Pretilt angle (.) Μ 陛耱 100 100,000 88.1 86.6 87.2 80.4 85.3 80.7 87.2 85.7 89.5 10000 88.9 i 88.1 1 88.0 86.2 88.7 86.4 1 88.8 — 88.7 89.6 89.5 ο 896 89.6 89.9 89.6 89.8 1 89.6 1 89.6 89.7 89.6 89.5 Aggregation Composition Polyorganooxane 1 Amount (parts by weight) ο R oo Species 1 iH xri (N can t/3 r〇cA οό in 03⁄4 v〇A 1 rp xh Amount of polyimine or polyaminic acid ( Parts by weight Ο••Η sgoooo 〇ο Type «•Η ρ!η CN pl. CL, P-4 m cu 1 P-4 ΓΟ cL ΓΛ ΓΟ p!h cL Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Comparative Example 1 Comparative Example 2 201141950 It can be seen from the results of Table 2 that the amount of the first shot is 100,000 J/m 2 (in the case where the degree of pretilt angle obtained by PSA is excessive, the amount is It can also be obtained with proper pretilt It is fast enough and also excellent. Therefore, according to the advantages of the present PSA mode of the present invention, it is possible to produce a liquid crystal display element having a display disparity, a voltage holding ratio, and a wide viewing angle, liquid crystal molecules and high contrast, in addition to being used in the above I. When the composition of the composition is changed and the glass base is changed in the same manner as in the first embodiment, the same effect can be obtained in the case of the pattern shown. [Simplified description of the drawing] Fig. 1 is A liquid crystal diagram showing a transparent conductive film of an embodiment and a pattern. Fig. 2 is a view showing a method of transparent invention in a liquid crystal cell of a conductive film in the embodiment, in the ultraviolet irradiation mode, conventionally used In addition, even in the case of a response speed of a small amount of irradiation, and a voltage holding ratio method, it is possible to manufacture with a small amount of light irradiation without causing a decrease in the amount of high-light irradiation and a long period of time. The reliability is insufficient, the response speed is fast, and the light transmittance is high. In addition, the ITO electrode patterns of the respective polyplates used in the examples 1 to 8 are liquid. Cells, and evaluated. Both the pattern shown in FIG. 2 and the third drawing can be respectively obtained by the description of the transparent conductive film pattern formed in S, which is produced in the comparative examples of Examples 1 to 8, and has a pattern forming. An explanatory diagram of a conductive film pattern. -51-201141950 Fig. 3 is an explanatory view showing a transparent conductive film pattern in a liquid crystal cell having a patterned transparent conductive film produced in the examples. [Main component symbol description] 1 ITO electrode 2 slit portion 3 light shielding film -52-