201146101 六、發明說明: 【發明所屬之技術領域】 本發明係關於在任一者具有彎曲部所被使用的可撓性 電路基板、及可撓性電路基板之彎曲部構造,更詳而言之 ,係關於對彎曲具備有耐久性,而且彎曲性佳的可撓性電 路基板、及可撓性電路基板之彎曲部構造。 【先前技術】 具有樹脂層及由金屬箔所構成的配線而成的可撓性電 路基板(可撓性印刷基板)係可折曲使用,因此以硬碟內 的可動部、行動電話的鉸鏈部或滑移滑動部、印表機的列 印頭部、光拾波器部、筆記型PC的可動部等爲首,在各種 電子電氣機器中被廣泛使用。而近來尤其伴隨著該等機器 的小型化、薄型化、高功能化等,圖求在有限空間將可撓 性電路基板折疊爲較小來作收納、或與電子機器等的各種 動作相對應的彎曲性。因此,爲了亦可與彎曲部中的曲率 半徑變得更小的折曲、或頻繁反覆折曲之類的動作相對應 ’必須提升可撓性電路基板的更進一步的強度等機械特性 〇 一般而言,與其說是樹脂層,反而是配線是因對於反 覆折曲或曲率半徑較小的彎曲,強度較差劣等而成爲不良 要因’若變得無法承受該等時,會在配線的一部分發生破 損或斷裂’而變得無法作爲電路基板加以利用。因此,例 如爲了減小對鉸鏈部中的配線的彎曲應力,形成以相對旋 -5- 201146101 動軸呈傾斜的方式所配線的可撓性電路基板(參照專利文 獻1)、或朝鉸鏈部的旋動方向螺旋1匝以上的螺旋部,藉 由加多該匝數而減小因開閉動作所造成的螺旋部的直徑的 變化而減少損傷的方法(參照專利文獻2 )等已被提出。 但是’在該等方法中’可撓性電路基板的設計均受到限制 〇 另一方面’以壓延銅箔的壓延面的X線繞射(銅箔的 厚度方向的X線繞射)所求出的(200 )面的強度(I ), 相對以微粉末銅的X線繞射所求出的( 200)面的強度(10 )爲1/1〇 > 20時’彎曲性佳已有報告被提出(參照專利文 獻3及4)。亦即’屬於銅的再結晶集合組織的立方體方位 愈爲發達,銅箔的彎曲性愈爲提升,因此以上述參數( Ι/Ιο )來規定立方體集合組織的發達度之適於作爲可撓性 電路基板的配線材料的銅箔已爲人所知。此外,以固溶於 銅的範圍的濃度含有Fe、Ni、A卜Ag等元素,以預定條件 進行燒鈍而再結晶化所得的壓延銅合金箔使得沿著滑移面 的剪斷變形較爲容易而彎曲性佳已有報告被提出(參照專 利文獻5 )。 此外,在被要求高彎曲特性的可撓性電路基板係有使 用含有氧或銀等不純物的銅箔的情形,若以純度而言,爲 99%〜99_9質量%左右的銅箔。在本發明中,只要沒有特別 要求,純度係以質量濃度來表記。此外,在試驗層次( level )中,係有使用廣泛作爲線材的導體所被使用的純度 9 9.5%左右的精銅或未含有氧化物的無氧銅之例(參照專 201146101 利文獻3 ' 4 )。精銅的不純物係含有數百ppm的 分作爲氧化銅而含有)、銀、鐵、硫磺、磷等。 常爲純度99.96〜99.995°/。左右的銅,大幅減氧至 下的銅。在上述專利文獻3、4中已報告出:以無 造出的銅箔的彎曲疲勞特性優於精銅箔,依存於 氧化銅。其中’若更加提高該等銅的純度時,必 、磷、硫磺等不純物。 〔先前技術文獻〕 〔專利文獻〕 〔專利文獻1〕日本特開2002-171033號公報 〔專利文獻2〕日本特開2002-300247號公報 〔專利文獻3〕日本特開2001-58203號公報 〔專利文獻4〕日本專利第3 0 0 9 3 8 3號公報 〔專利文獻5〕日本特開2007-107036號公報 【發明內容】 〔發明所欲解決之課題〕 根據如上所示之狀況,本發明人等爲了獲得 電路基板的設計方面不會產生制約且對反覆折曲 徑較小的彎曲亦具備有耐久性的可撓性電路基板 硏究的結果,發現藉由使用作高度配向、而且其 較大之具有面心立方晶格系的結晶構造的金屬箔 曲耐久性或彎曲性佳的可撓性電路基板,而完成: 因此,本發明之目的在提供一種耐久性佳的 氧(大部 無氧銅通 1 0 p p m 以 氧銅所製 有無含有 須去除銀 在可撓性 或曲率半 ’經精心 斷裂伸長 ,可得彎 长發明。 可撓性電 201146101 路基板,尤其在提供一種即使對如伴隨行動電話或小型電 子機器等的鉸鏈部或滑移滑動部等曲率半徑較小的反覆彎 曲之類的過於苛刻的使用條件,亦呈現耐久性,且彎曲性 佳的可撓性電路基板。 此外,本發明之其他目的在提供一種對於行動電話或 小型電子機器等的鉸鏈部或滑移滑動部等尤其曲率半徑較 小的反覆彎曲部中的過於苛刻的條件具備耐久性、且灣曲 性佳的可撓性電路基板之彎曲部構造。 〔用以解決課題之手段〕 本發明爲解決上述習知技術的問題而精心硏究的結果 ,將以下構成作爲要旨。 (1 )—種可撓性電路基板,係具備有樹脂層、及由 金屬箔所形成的配線,在配線的至少一個部位具有彎曲部 所使用的可撓性電路基板,其特徵爲: 金屬箔係由具有面心立方構造的金屬所構成,並且面 心立方構造的單位晶格的基本結晶軸< 1 00 >相對金屬箔 的厚度方向、及存在於箔面內的某一方向的2個正交軸, 分別方位差1 〇 °以內的優先配向領域以面積率計佔有5 0 % 以上,而且相對由彎曲部中的稜線朝金屬箔的厚度方向切 開的配線的剖面P的法線方向的金屬箔的斷裂伸長爲3 .5 % 以上、20%以下。 (2 )如(1 )項之可撓性電路基板,其中,金屬箔係 由純度99.999質量%以上的銅箔所構成。 201146101 (3 )如(1 )或(2 )項之可撓性電路基板,其中, 金屬箔爲銅箔,由箔面法線方向觀看時的結晶粒徑爲25 μπι 以上。 (4 )如(1 )至(3 )項中任一項之可撓性電路基板 ’其中,金屬箔的厚度爲5μιη以上、1 8μιη以下。 (5 )如(1 )至(4 )項中任一項之可撓性電路基板 ’其中,配線的剖面Ρ係在以〔001〕爲晶帶軸而從(100 )對(110)的旋轉方向中由(20 1 0)至(1 20 0)的範 圍所包含的任何面形成主方位。 (6 )如(5 )項之可撓性電路基板,其中,配線的剖 面Ρ係在(100)標準投影圖的立體三角形中,位於以表示 (20 1 0 )的點與表示(1 1 0 )的點所連結的線段上的任何 面。 (7)如(1)至(6)項中任一項之可撓性電路基板 ,其中,沿著相對彎曲部中的稜線呈正交的方向形成有配 線。 (8 )如(1 )至(7 )項中任一項之可撓性電路基板 ,其中,樹脂層由聚醯亞胺所構成。 (9 )如(1 )至(8 )項中任一項之可撓性電路基板 ,其中,以形成有伴隨選自由滑動彎曲、折曲彎曲、鉸鏈 彎曲及滑移彎曲所成群組的任何反覆動作的彎曲部的方式 予以使用。 (10) —種電子機器,其特徵爲:裝載有如上述(I )至(9 )項中任一項之可撓性電路基板。 -9 - 201146101 (11) 一種可撓性電路基板之彎曲部構造, 樹脂層、及由金屬箔所形成的配線,在配線的至 位具有翡曲部所使用的可撓性電路基板之彎曲部 特徵爲: 金屬箔係由具有面心立方構造的金屬所構成 心立方構造的單位晶格的基本結晶軸< 1 0 0 >相 的厚度方向、及存在於箔面內的某一方向的2個 分別方位差1 〇°以內的優先配向領域以面積率計 以上,而且相對由彎曲部中的稜線朝金屬箔的厚 開的配線的剖面P的法線方向的金屬箔的斷裂伸 以上、20%以下。 〔發明之效果〕 藉由本發明,在使可撓性電路基板彎曲時的 構成配線的金屬箔不易發生金屬疲勞,且對應力 有優異耐久性。因此,可提供在可撓性電路基板 面不會產生制約,具備有即使對反覆折曲或曲率 的彎曲亦可承受的強度,且彎曲性佳的可撓性電 且可實現以薄型行動電話、薄型顯示器、硬碟、 DVD裝置等爲首,耐久性高的電子機器。 【實施方式】 本發明之可撓性電路基板所具備的配線係藉 面心立方晶格系的結晶構造的金屬所構成的金屬 係具備有 少一個部 構造,其 ,並且面 對金屬箔 正交軸, 佔有5 0 % 度方向切 長爲3.5 % 彎曲部中 及變形具 的設計方 半徑較小 路基板, 印表機、 由由具有 箔所形成 -10- 201146101 。以具有面心立方晶格系的結晶構造的金屬而言,已知有 例如銅、鋁、鎳、銀、铑、鈀、鉑、金等,該等可爲任一 者,但是基於作爲金屬箔的利用性,以銅、鋁及鎳較爲適 合,其中亦以主要作爲可撓性電路基板的配線而被使用的 銅箔最爲一般。 本發明係提供彎曲耐久性或彎曲性佳的可撓性電路基 板,尤其係提供在曲率半徑爲2 mm以下之類的高變形領域 具有優異疲勞特性的可撓性電路基板。爲了達成該目的, 在本發明中,即使施行i )金屬箔作高度配向、及ii )在彎 曲部中,金屬箔的主應力方向的斷裂伸長較大之任一者, 亦未形成爲如本發明所示之高彎曲時耐疲勞破壞的可撓性 電路基板。亦即,藉由同時滿足i)與ii)之二者,可得高 彎曲時耐疲勞破壞的可撓性電路基板。具體而言,必須爲 '· i )面心立方構造的單位晶格的基本結晶軸< 1 〇 〇 >相對 金屬箔的厚度方向與存在於箔面內的某一方向的2個正交 軸’分別方位差1 0°以內的優先配向領域以面積率計佔有 5 〇 °/。以上’而且’ i i )相對由彎曲部中的稜線朝金屬箔的 厚度方向切開的配線的剖面P的法線方向的金屬箔的斷裂 伸長爲3 · 5 %以上、2 0 %以下。 若金屬箔爲以一般的電解箔或壓延箔所見到的多結晶 體時’可得高斷裂伸長,但是相對在本發明中所求出的高 變形疲勞’並不會成爲疲勞特性較高的可撓性電路基板。 另一方面’若即使集合組織發達、配向度變大,而斷裂伸 長較小時’同樣地並無法獲得具有本發明所求特性的可撓 -11 - 201146101 性電路基板。 本發明係首次瞭解以集合組織發達、配向度大 箔爲條件’尤其求取高彎曲特性的可撓性電路基板 屬箔的斷裂伸長爲重要因子者。 金屬箔可爲壓延箔或電解箔的任一者,惟在獲 向性方面’較佳爲壓延箔。若爲面心立方金屬,將 件與熱處理條件加以設計,藉此可製造出具有在壓 與箱面法線方向分別具有< 1〇〇>主方位的高度配 方體集合組織的金屬箔。 不限於可撓性電路基板的用途,具有強立方體 金屬箔的機械特性的特徵係在斷裂伸長具有異方性 伸長係在進行朝< 1 0 0 >方向的拉伸時,取非常小 一般而言,配向度愈增加,而且金屬箔的厚度愈小 < 1 〇 〇 >方向進行拉伸試驗時的斷裂伸長愈小。面 構造的單位晶格的基本結晶軸< 1 〇〇 >,相對金屬 度方向(箔面法線方向)與存在於箔面內的某一方 一爲壓延方向)的2個正交軸,各個方位差1〇°以 先配向領域以面積率計佔有95%以上,而且厚度爲 下的一般的壓延銅箔時(以下爲方便起見,將其稱 知壓延銅箔」),彎曲部中對主應力方向的斷裂伸 達到3.5 %。在此所稱的斷裂伸長係指使用將寬幅取 大於金屬箔的厚度,典型而言在寬幅5〜15mm的範 一寬幅的試驗片,至相對長度,以10%/min的變形 行拉伸試驗時的斷裂爲止的伸展。在本發明中,係 的金屬 內的金 得高配 壓延條 延方向 向的立 方位的 。斷裂 的値。 ,則朝 心立方 箔的厚 向(其 內的優 1 8 μιη 以 爲「習 長並未 得充分 圍內任 速度進 設爲指 -12- 201146101 藉由以下實施例所示之測定方法,求出金屬箔的斷裂伸長 ,與樹脂層相層積而獲得可撓性電路基板之後的値者。 若爲壓延銅箔,再結晶集合組織係壓延方向、亦即金 屬箔的長邊方向成爲<100>方位。在一般的可撓性電路 基板中’由在抽出基板時提高良率的方面來看,取電路的 長邊方向與銅箔的長邊方向爲相一致。因此,在將電路的 長邊方向折曲的一般的利用形態中,由於主應力方向與< 1〇〇>方向相一致,因此在習知壓延銅箔中,並未獲得對 反覆彎曲爲較高的疲勞特性。 以提升以如上所示之方位關係所利用的可撓性電路基 板的疲勞特性的方法而言,在本發明中,達成所使用的金 屬箔的高純度化。在至今爲人所知的高彎曲用途所使用的 可撓性電路基板中,係使用意圖性或不可避免的含有氧或 銀等不純物的銅箔。此係例如專利文獻5所示,有使沿著 滑移面的剪斷變形更爲容易、或抑制電阻增加的目的。但 是,該等不純物元素係使層積缺陷能量降低。本發明人等 即著重在該點。亦即,若層積缺陷能量降低,位錯容易擴 張,不易發生交叉滑移,尤其朝<100>方向拉伸時,不 易發生伸展。 因此,在本發明中,係使用顯示以下說明的預定的優 先配向性、並且較佳爲純度爲9 9.9 9 9 %以上的金屬箔(較 適爲銅箔),藉此可將<100>方向的斷裂伸長加大爲 3.5%以上,結果,提高在高變形領域中施加反覆變形時的 疲勞特性。以金屬箔的純度高者爲宜,惟若由製造成本方 -13- 201146101 面來看,以使用99.999%或99.9999%者最爲適合。此外, 即使爲純度低於99.999%的銅箔,亦在氧濃度較低的無氧 銅箔中,如下述實施例所示,雖爲狹小條件,但依壓延與 熱處理條件,面心立方構造的基本結晶軸< 1 00 >之一、 例如〔00 1〕軸爲相對金屬箔的厚度方向(箔面法線方向 )以方位差計在10°以內的領域爲98%以上、99.8%以下時 ,存在有斷裂伸長成爲3.5 %以上的領域,耐彎曲疲勞性變 得良好。關於該理由,在現時點雖不明確,惟在藉由熱處 理而獲得預定的集合組織的無氧銅箔中,係推測出因存在 適當的大小、對於相對以體積率計爲分散的壓延方向爲< 2 1 2 >方位的再結晶殘留組織,而加大< 1 〇〇 >方向的斷裂 伸長者。 在本發明之可撓性電路基板中,對構成其電路的金屬 箔的試料座標系,規定出金屬箔的三次元結晶方位,其集 合組織的集積度爲下列範圍。亦即,面心立方構造的基本 結晶軸< 1 〇〇 >之一、例如〔001〕軸係使用呈現相對金屬 箔的厚度方向(箔面法線方向)以方位差計在1 0°以內的 領域以面積比計佔有5 0 %以上、較佳爲7 5 %以上、更佳爲 9 8%以上的優先配向,而且在相對金屬箔的表面呈水平方 向的箔面內,由其他基本結晶軸、例如〔1 00〕軸以方位 差計爲1 〇°以內的領域以面積比計佔有50%以上、較佳爲 85%以上、更佳爲99%以上的優先配向者。在本發明中, 至少在彎曲部具有如上所述之集合組織的集積度即可,但 是若爲較適於被層積在樹脂層的金屬箔的全部具有如上所 -14- 201146101 述的集積度的所謂的類單晶的金屬箔,在配線設計中不會 受到制約’較爲理想。其中,由於將位於優先配向的中心 的結晶方位稱爲集合組織的主方位,因此在本發明中所使 用的金屬可稱爲係金屬箔的厚度方向具有< 1〇〇>的主方 位’並且金屬箔的箔面內具有<100>的主方位。 集合組織的優先配向的優先度、亦即表示配向度或集 積度的指標有幾個,可使用根據X線繞射強度、及使用以 電子線繞射所得之局部三次元方位資料的統計資料的客觀 資料的指標。 例如金屬箔爲銅箔時,由以X線繞射所求出之來自與 上述晶帶軸呈垂直的(002 )的強度(I )(在此,按照X 線繞射中的一般標記方法設爲(200 )面的強度),相對 以微粉末銅的X線繞射所求出的(200 )面的強度(IQ )爲 I/U225的銅箔,形成具有預定圖案的配線爲佳,較佳爲 I/U爲33〜150的範圍,更佳爲50〜150的範圍。在此,參 數I/Io係表示(1〇〇 )與(1 10 )的晶帶軸、亦即共通軸〔 001〕的配向度者,表示立方體集合組織之發達度的一客 觀指標。接著,若金屬箔爲壓延銅箔時,將其以一定以上 的壓延率進行強加工,之後,加熱而使其再結晶時,將壓 延箔面設爲(〇〇1)主方位、箔面內壓延方向設爲(100) 主方位的再結晶立方體方位即會發達。屬於銅的再結晶集 合組織的立方體方位愈爲發達,銅箔的彎曲疲勞壽命愈爲 提升。在本發明之可撓性電路基板中,若I/Iq小於25時, 配線的彎曲疲勞壽命的提升未充分符合期望,若I/U爲33 -15- 201146101 以上,彎曲疲勞壽命的提升會變得較爲明顯。其中,銅箔 的厚度方向的X線繞射係指確認銅箔的表面(若爲壓延銅 箔則爲壓延面)中的配向性者,(2 0 0 )面的強度(I )係 表示以X線繞射所求出的(200 )面的強度積分値。此外, 強度(1〇)係表示微粉末銅(關東化學公司製銅粉末試藥I 級、325mesh)的(200)面的強度積分値。 爲了將I/U設爲25以上,若獲得銅箔的再結晶集合組 織即可,關於該手段並未特別限制,但是按照以中間燒鈍 條件或冷間壓延加工率爲對象的金屬箔的種類或不純物濃 度作最適化,藉此可得結晶粒較大的集合組織而且 1/1〇 225的壓延銅箔。此外,亦可例如使樹脂層與壓延銅 箔相層積而得覆銅層積板後,在銅箔經過300〜360 °C的溫 度以積算時間計爲負荷5分以上的加熱條件,藉此獲得銅 箔的再結晶集合組織。 .此外’爲了以3次元的集積度來規定集合組織,亦可 使用相對集合組織的主方位在1 〇 °以內的優先配向領域的 面積率來加以特定。亦即,關於金屬箔的預定的面具有什 麼樣的結晶方位,例如可藉由EBSP( Electron Back Scattering Pattern )法、ECP ( Electron Channeling Pattern)法等電子線繞射法或Micro Laue法等X線繞射法 等來確認。其中,EBSP法係根據由當對作爲測定對象的試 料表面照射收斂電子束時所發生的各個結晶面所被繞射之 被稱爲擬菊池線的繞射像來解析結晶,根據方位資料與測 定點的位置資訊來將測定對象的結晶方位分布進行測定的 -16- 201146101 方法,相較於X線繞射法,可解析小(micro )領域的集合 組織的結晶方位。例如,可在各個微小領域特定其結晶方 位,將該等接在一起來進行映射,將各映射點間的面方位 的傾角(方位差)爲一定値以下者以同色塗佈區分,使具 有大致相同的面方位的領域(結晶粒)的分布顯露,藉此 可得方位映射像。此外,亦可包含相對特定的面方位具有 預定的角度以內的方位的方位面而規定爲其方位,將各面 方位的存在比例以面積率計加以抽出。在E B S P法中,爲了 由某特定方位來展示出位於特定的角度以內的領域的面積 率,必須至少在大於本發明之可撓性電路基板中的電路彎 曲領域的領域’爲了展示出面積率而以成爲充分點數的方 式詳細掃描電子線,而得其平均資訊,但是在本發明中作 爲對象的金屬箔中,係由作爲對象的電路的大小加以考量 ,在0.00 5 mm2以上的領域中,若爲了展示出平均的面積率 ,則測定1 000點以上即可。 但是’本發明與專利文獻3及4所記載之發明中在組織 上的不同之處在於,該等專利文獻之發明之方位規定係僅 有以X線所測定出的箱法線方向的規定,相對於此,本發 明係以3次元加以規定。爲了對彎曲獲得高疲勞特性,尤 其使其彎曲時的主變形、主應力方向、亦即箔面內的< 1 〇〇 >集積度極爲重要。此外,在本發明中,再結晶粒、 亦即具有立方體方位的結晶粒的大小係以平均値計爲2 5 μιη 以上爲宜。 此外’在本發明中’尤其要求高彎曲性時,形成可撓 -17- 201146101 性電路基板的金屬箔係使用厚度5〜18μηι的壓延銅箔即可 ,較佳爲使用厚度9〜12μηι的壓延銅箔。若壓延銅箔比 18μιη爲更厚時,則不易獲得在曲率半徑爲2mm以下之高變 形領域具有優異疲勞特性的可撓性電路基板。此外,若厚 度比5 μιη爲更薄時,使金屬箔與樹脂層相層積後的處理較 爲困難,而難以形成均質的可撓性電路基板。 有別於使以上所述之可撓性電路基板之疲勞特性提升 的第一方策,在本發明中,以用以提升接近於高度配向的 單結晶的面心立方金屬箔的斷裂伸長的第二方策而言,以 斷裂伸長較小的< 1〇〇>方向不會成爲主應力方向的方式 ,有將可撓性電路基板的配線構成加以設計的情形,具體 而言列舉下列方法。 如第一方策中所述,藉由設計壓延及再結晶條件,可 製造具有壓延方向與箔面法線方向均具有< 1〇〇>主方位 的高度配向的立方體集合組織的金屬箔。此外,以配線而 言,將電路切開的方向從壓延方向、亦即<1〇〇>方向以 預定角度偏移而斜向抽出電路,藉此可得使其彎曲時在主 應力方向,斷裂伸長較大的可撓性電路基板。藉由如上所 示之方法,爲了使相對由彎曲部中的稜線朝金屬箔的厚度 方向切開的配線的剖面Ρ的法線方向(彎曲部中的主應力 方向)的金屬箔的斷裂伸長成爲3. 5 %以上’必須使上述剖 面Ρ以〔001〕爲晶帶軸而在(20 1 0 )至(1 20 0 )的範 圍內所包含的任何面呈現主方位。在此’將晶帶軸與面方 位的關係顯示於第1圖。(20 1 〇 )與(1 20 0 )係處於將 -18- 201146101 〔00 1〕作爲共通軸、亦即晶帶軸的關係,位於以〔〇〇 1〕 爲軸之由(100)至(110)〔由(100)至(〇1〇)〕的旋 轉面內。亦即,若將其顯示於相對剖面p的法線方位的逆 極點圖上時’ (001) 、(20 10) 、 (110)的各面係如 第2圖所示。基於對稱性’在逆極點圖上,2〇 〇)係被 表示在與(20 1 0)相同的位置。本發明中的金屬箔的金 屬爲面心立方構造。其單位晶格的結晶軸爲〔1 〇 〇〕、〔 010〕 、〔 001〕’但在本發明中,若在金屬箔的厚度方向 (相對金屬箔表面呈垂直方向)具有<1〇0>優先方位時 ’將該軸標記爲〔0 0 1〕’亦即將箔面方位標記爲(〇 〇 i ) ’但是即使基於面心立方構造的對稱性而將該等軸作更換 亦爲等效,當然該等係被包含在本發明中。 接著’箔面內的主方位必須相對彎曲部的主變形方向 、亦即由彎曲部中的稜線朝厚度方向切開時的配線的剖面 法線方向(對於相對配線剖面P的垂線)具有2.9。〜 87.1° 〔(20 1 0)〜(1 20 0)〕的角度,較佳爲5.7。〜 84.3° 〔(10 1 0)〜(1 10 0)〕的角度,更佳爲爲11.4。〜 78.6° 〔(510)〜(150)〕的角度,另外更佳爲26.6°〜 63.4° 〔(210)〜(120)〕的角度,最爲適合係以30°或60° 〔(40 23 0)或(23 40 0)〕爲宜。在此,〔 〕內係表示與 各自的角度相對應的剖面P的面方位。其中,由結晶的對 稱性,亦可記述爲相對配線剖面P的法線具有與金屬箔面 內的基本結晶軸< 1〇〇 >呈2.9〜45°的角度。 在此,由彎曲部中的稜線朝厚度方向切開時的配線的 -19- 201146101[Technical Field] The present invention relates to a flexible circuit board having a bent portion and a bent portion structure of a flexible circuit board, and more particularly, A flexible circuit board having durability and flexibility, and a curved portion structure of the flexible circuit board. [Prior Art] A flexible circuit board (flexible printed circuit board) having a resin layer and a wiring made of a metal foil is bendable. Therefore, the movable portion in the hard disk and the hinge portion of the mobile phone are used. The slide sliding portion, the print head of the printer, the optical pickup unit, the movable portion of the notebook PC, and the like are widely used in various electronic and electrical equipment. In recent years, in particular, miniaturization, thinning, and high functionality of such devices have been made, and it has been proposed to fold the flexible circuit board into a small space for storage in a limited space, or to perform various operations such as an electronic device. Flexibility. Therefore, in order to correspond to an operation such as bending with a smaller radius of curvature in the curved portion or frequent repeated bending, it is necessary to improve mechanical properties such as further strength of the flexible circuit board. In other words, it is a resin layer, but the wiring is due to bending or bending with a small radius of curvature, and the strength is poor, which is a bad cause. If it becomes unbearable, it may be damaged in a part of the wiring. It is broken and cannot be utilized as a circuit board. Therefore, for example, in order to reduce the bending stress on the wiring in the hinge portion, a flexible circuit board that is wired so as to be inclined with respect to the rotation axis of the rotation -5 - 201146101 (see Patent Document 1) or toward the hinge portion is formed. A method of reducing the damage of the diameter of the spiral portion caused by the opening and closing operation by reducing the number of turns in the spiral portion having a spiral of one turn or more (see Patent Document 2) has been proposed. However, in these methods, the design of the flexible circuit board is limited. On the other hand, it is obtained by X-ray diffraction of the rolling surface of the rolled copper foil (X-ray diffraction in the thickness direction of the copper foil). The strength of the (200) plane (I), the intensity (10) of the (200) plane obtained by the X-ray diffraction of the fine powder copper is 1/1 〇> It is proposed (refer to Patent Documents 3 and 4). That is, the more the cube orientation of the recrystallized assembly belonging to copper is developed, the more the bendability of the copper foil is improved. Therefore, the above-mentioned parameters (Ι/Ιο) are used to define the degree of development of the cube assembly as flexibility. A copper foil of a wiring material of a circuit board is known. Further, the rolled copper alloy foil obtained by calcining and recrystallizing the element in a concentration in the range of solid solution in the range of copper, such as Fe, Ni, or Ag, under predetermined conditions, causes shear deformation along the slip surface. A report has been proposed which is easy and has good flexibility (refer to Patent Document 5). In addition, in the case of using a copper foil containing impurities such as oxygen or silver, the flexible circuit board which is required to have a high bending property is a copper foil having a purity of about 99% to 99_9% by mass. In the present invention, the purity is expressed by mass concentration unless otherwise specified. In addition, in the test level, there are examples of pure copper having a purity of about 9.5% or oxygen-free copper containing no oxide, which is used as a conductor for a wide range of wires (refer to 201146101, Document 3 '4). ). The impure substance of refined copper contains hundreds of ppm of impurities as copper oxide, silver, iron, sulfur, phosphorus, and the like. Often the purity is 99.96~99.995°/. The copper on the left and right, greatly reduces the oxygen to the next copper. It has been reported in the above-mentioned Patent Documents 3 and 4 that the bending fatigue property of the copper foil which is not produced is superior to that of the fine copper foil, and depends on the copper oxide. Among them, if the purity of the copper is further increased, impurities such as phosphorus and sulfur are required. [PRIOR ART DOCUMENT] [Patent Document 1] [Patent Document 1] JP-A-2002-171033 (Patent Document 2) Japanese Laid-Open Patent Publication No. 2002-300247 (Patent Document 3) [Patent 4] Japanese Patent Publication No. 2003-107036 (Patent Document 5) [Problem to be Solved by the Invention] According to the above situation, the inventor In order to obtain a circuit board design that does not cause any restriction on the design of the circuit board, and to provide a flexible circuit board with durability, it is found to be highly aligned and larger by use. The metal foil having a face-centered cubic lattice crystal structure has a flexible circuit substrate with excellent durability or flexibility. Therefore, the object of the present invention is to provide a highly durable oxygen (mostly anaerobic) Copper pass 1 0 ppm Made of oxy-copper with or without the need to remove silver in the flexibility or curvature of the semi-' carefully broken elongation, can be obtained by bending the invention. Flexible electric 201146101 road substrate, especially Provided that the durability is excellent and the flexibility is good even when the use condition such as the hinge portion or the sliding sliding portion of the mobile phone or the small electronic device is too severe, such as a repetitive curvature having a small radius of curvature. Further, another object of the present invention is to provide durability to an excessively severe condition in a reverse curved portion having a small curvature radius, such as a hinge portion or a sliding sliding portion of a mobile phone or a small electronic device. The curved portion structure of the flexible circuit board having a good curvature of the circumstance. [Means for Solving the Problems] The present invention has been made in order to solve the problems of the above-described conventional techniques, and the following configuration is essential. A flexible circuit board comprising a resin layer and a wiring formed of a metal foil, and a flexible circuit board having a bent portion at least one portion of the wiring, wherein the metal foil has The surface-cube structure of the metal, and the basic crystal axis of the unit cell of the face-centered cubic structure < 1 00 > relative to the thickness of the metal foil The direction and the two orthogonal axes existing in one direction in the foil surface, the priority alignment fields within 1 〇° of the azimuth difference occupy more than 50% of the area ratio, and the ridge line in the curved portion faces the metal The elongation at break of the metal foil in the normal direction of the cross section P of the wiring which is cut in the thickness direction of the foil is 3.5% or more and 20% or less. (2) The flexible circuit board of (1), wherein the metal foil The flexible circuit board of the item (1) or (2), wherein the metal foil is a copper foil and is viewed from the normal direction of the foil surface. The crystal grain size is 25 μπι or more. (4) The flexible circuit board of any one of (1) to (3) wherein the thickness of the metal foil is 5 μm or more and 18 μm or less. (5) The flexible circuit board of any one of (1) to (4) wherein the cross-section of the wiring is rotated from (100) to (110) with [001] as a ribbon axis Any face included in the range from (20 1 0) to (1 20 0) in the direction forms the principal orientation. (6) The flexible circuit board of item (5), wherein the cross-section of the wiring is in a solid triangle of the (100) standard projection image, and is located at a point and representation (1 1 0) indicating (20 1 0 ) ) Any point on the line segment to which the point is connected. (7) The flexible circuit board according to any one of (1) to (6) wherein the wiring is formed in a direction orthogonal to a ridge line in the opposite curved portion. (8) The flexible circuit board according to any one of (1) to (7) wherein the resin layer is composed of polyimide. The flexible circuit substrate of any one of (1) to (8), wherein any one selected from the group consisting of sliding bending, bending bending, hinge bending, and slip bending is formed. The method of repeating the bending portion of the action is used. (10) An electronic device comprising: the flexible circuit board according to any one of the above (1) to (9). -9 - 201146101 (11) A bent portion structure of a flexible circuit board, a resin layer and a wiring formed of a metal foil, and a bent portion of the flexible circuit board used for the bent portion in the wiring The metal foil is a basic crystal axis of a unit cell of a heart-cubic structure composed of a metal having a face-centered cubic structure, a thickness direction of the phase, and a direction existing in the foil surface. The area of the preferential alignment in which the two orientations are within 1 〇° is more than the area ratio, and the elongation of the metal foil in the normal direction of the cross section P of the wiring which is thicker than the ridge line in the curved portion is larger than 20% or less. [Effect of the Invention] According to the present invention, the metal foil constituting the wiring when the flexible circuit board is bent is less likely to cause metal fatigue and has excellent durability against stress. Therefore, it is possible to provide a flexible electric circuit which is excellent in flexibility even if it does not have any restriction on the surface of the flexible circuit board, and which is capable of withstanding flexural bending or curvature, and can realize a thin mobile phone. An electronic device with high durability, such as a thin display, a hard disk, and a DVD device. [Embodiment] The wiring provided in the flexible circuit board of the present invention has a metal structure composed of a metal having a crystal structure of a face-centered cubic lattice system, and has a structure of a single portion, and is orthogonal to the metal foil. The shaft, which occupies 50% of the length of the section, has a length of 3.5%. The radius of the curved part and the design of the deformed tool are smaller than the road substrate, and the printer is formed by having a foil of -10- 201146101. For a metal having a crystal structure of a face-centered cubic lattice system, for example, copper, aluminum, nickel, silver, rhodium, palladium, platinum, gold, or the like is known, and these may be any, but based on the metal foil. Copper, aluminum, and nickel are suitable for use, and copper foil which is mainly used as a wiring of a flexible circuit board is most common. The present invention provides a flexible circuit board excellent in bending durability or flexibility, and in particular, a flexible circuit board having excellent fatigue characteristics in a high deformation range such as a curvature radius of 2 mm or less. In order to achieve the object, in the present invention, even if i) the metal foil is highly aligned, and ii) in the bent portion, the metal foil has a large elongation at break in the principal stress direction, and is not formed as in the present invention. A flexible circuit board which is resistant to fatigue damage at the time of high bending as shown in the invention. That is, by satisfying both of i) and ii) at the same time, it is possible to obtain a flexible circuit board which is resistant to fatigue damage at the time of bending. Specifically, it is necessary that the basic crystal axis of the unit cell of the '· i ) face-centered cubic structure < 1 〇〇> is orthogonal to the thickness direction of the metal foil and the two directions existing in the foil surface. The priority alignment field of the axis 'with a difference of 10° in the azimuth difference is 5 〇°/in area ratio. The above-mentioned 'and' i i ) is a fracture elongation of the metal foil in the normal direction of the cross section P of the wiring which is cut in the thickness direction of the metal foil by the ridge line in the curved portion of 3 · 5 % or more and 20 % or less. When the metal foil is a polycrystalline body as seen in a general electrolytic foil or a rolled foil, 'high elongation at break can be obtained, but the high deformation fatigue obtained in the present invention does not become a high fatigue property. Circuit board. On the other hand, if the aggregate structure is developed and the degree of alignment is large, and the elongation at break is small, the flexible -11 - 201146101 circuit board having the characteristics of the present invention cannot be obtained in the same manner. The present invention is for the first time to understand that the elongation at break of a flexible circuit substrate foil which is high in bending properties is considered to be an important factor in the case where the aggregate structure is developed and the alignment is large. The metal foil may be either a calendered foil or an electrolytic foil, but is preferably a rolled foil in terms of orientation. In the case of a face-centered cubic metal, the member and the heat treatment conditions are designed, whereby a metal foil having a height-group assembly structure having a <1〇〇> main orientation in the normal direction of the box surface can be produced. It is not limited to the use of the flexible circuit board, and the mechanical property of the strong cubic metal foil is characterized by an anisotropic elongation at break elongation, which is very small when stretching in the direction of <1 0 0 > In other words, the more the degree of alignment, and the smaller the thickness of the metal foil, the smaller the elongation at break when the tensile test is performed in the direction of 1 〇〇>. The basic crystal axis of the unit lattice of the surface structure <1 〇〇>, two orthogonal axes with respect to the metality direction (the normal direction of the foil surface) and one of the directions existing in the foil surface is a rolling direction) Each of the azimuth differences is 1〇°, and the area of the first alignment is 95% or more in area ratio, and when the thickness is the general rolled copper foil (hereinafter, for convenience, it is known as rolled copper foil), in the bent portion The elongation at break in the direction of the principal stress reaches 3.5%. The term "elongation at break" as used herein refers to the use of a test piece having a width greater than the thickness of the metal foil, typically a width of 5 to 15 mm, to a relative length of 10%/min. Stretching until breaking at the time of the tensile test. In the present invention, the gold in the metal of the system is highly oriented with the rolling direction extending in the direction of the orientation. Broken cockroaches. , the thickness direction of the cube-shaped foil (the excellent 18 μm in the inside is considered to be "the length of the length is not sufficient to enter the index -12-201146101" by the measurement method shown in the following examples. After the elongation and elongation of the metal foil are laminated with the resin layer to obtain a flexible circuit board, if the rolled copper foil is rolled, the direction of the recrystallization of the recrystallized structure, that is, the longitudinal direction of the metal foil becomes <100> In the general flexible circuit board, 'the long side direction of the circuit is the same as the long side direction of the copper foil in terms of improving the yield when the substrate is taken out. Therefore, the length of the circuit is long. In the general use form in which the side direction is bent, since the principal stress direction coincides with the <1〇〇> direction, the conventional rolled copper foil does not have high fatigue characteristics for the reverse bending. In the method of improving the fatigue characteristics of the flexible circuit board used in the orientation relationship as described above, in the present invention, the purity of the metal foil to be used is improved, and the high-bending use known to date is used. Used In the flexible circuit board, a copper foil containing an impurity such as oxygen or silver, which is intentionally or unavoidably used, is used, for example, as shown in Patent Document 5, it is easier to perform shear deformation along the slip surface, or The purpose of suppressing the increase in resistance is. However, these impurity elements reduce the energy of the laminated defect. The present inventors focused on this point, that is, if the energy of the laminated defect is lowered, the dislocation is easily expanded, and cross slip is less likely to occur. In particular, in the case of stretching in the <100> direction, stretching is less likely to occur. Therefore, in the present invention, a metal foil which exhibits a predetermined preferential alignment described below and preferably has a purity of 99.99% or more is used. (It is more suitable as a copper foil), whereby the elongation at break in the <100> direction can be increased to 3.5% or more, and as a result, the fatigue characteristics when the reverse deformation is applied in the high deformation field are improved. The purity of the metal foil is high. It is advisable, but it is most suitable for the use of 99.999% or 99.9999% from the point of view of manufacturing cost-13-201146101. In addition, even for copper foil with a purity lower than 99.999%, the oxygen concentration is lower. Oxygen copper In the following examples, although narrow, the one of the basic crystal axes <00> of the face-centered cubic structure, such as the [00 1] axis, is the thickness of the opposite metal foil, depending on the conditions of the rolling and the heat treatment. When the direction (the normal direction of the foil surface) is 98% or more and 99.8% or less in the range of 10° or less in the azimuth difference, there is a field in which the elongation at break is 3.5% or more, and the bending fatigue resistance is good. Although it is not clear at the present point, in the oxygen-free copper foil obtained by heat treatment to obtain a predetermined aggregate structure, it is presumed that there is an appropriate size, and the rolling direction which is dispersed relative to the volume ratio is < 2 1 2 > azimuth recrystallizes the residual structure, and increases the elongation at break in the < 1 〇〇> direction. In the flexible circuit board of the present invention, the three-dimensional crystal orientation of the metal foil is defined for the sample coordinate system of the metal foil constituting the circuit, and the aggregated degree of the aggregate structure is in the following range. That is, one of the basic crystal axes of the face-centered cubic structure <1 〇〇>, for example, the [001] axis, is used in the thickness direction of the opposite metal foil (the normal direction of the foil surface) at a distance of 10° in the azimuth difference. The area within the area is preferably 50% or more, preferably 75% or more, and more preferably 98% or more, and is in a horizontally oriented foil surface on the surface of the metal foil. The crystal axis, for example, the [00] axis is a preferred alignment of 50% or more, preferably 85% or more, and more preferably 99% or more in the area ratio of 1 〇°. In the present invention, the accumulation degree of the aggregate structure as described above may be at least in the curved portion, but if it is a metal foil which is more suitable for being laminated on the resin layer, the accumulation degree as described above in the above -14-201146101 The so-called single crystal-like metal foil is not restricted in wiring design. Here, since the crystal orientation of the center located in the preferential alignment is referred to as the main orientation of the aggregate structure, the metal used in the present invention may be referred to as the main orientation of the metal foil in the thickness direction of <1〇〇> Further, the foil surface of the metal foil has a main orientation of <100>. The priority of the preferential alignment of the collective organization, that is, the index indicating the degree of alignment or the degree of accumulation, may be based on the diffraction intensity of the X-ray and the statistical data of the local three-dimensional orientation data obtained by the diffraction of the electron beam. Indicators of objective data. For example, when the metal foil is a copper foil, the intensity (I) from (002) perpendicular to the axis of the crystal ribbon obtained by X-ray diffraction (here, according to the general marking method in the X-ray diffraction) The strength of the (200) plane is preferably a copper foil having a strength (IQ) of (200) plane obtained by X-ray diffraction of fine powder copper, and forming a wiring having a predetermined pattern. The preferred I/U range is 33 to 150, more preferably 50 to 150. Here, the parameter I/Io indicates an orientation degree of the crystal ribbon axis of (1〇〇) and (1 10), that is, the common axis [001], and represents an objective index of the degree of development of the cube assembly. Next, when the metal foil is a rolled copper foil, it is strongly processed at a rolling ratio of a certain value or more, and then heated to recrystallize, the rolled foil surface is set to (〇〇1) main orientation, and the foil surface is The orientation of the recrystallized cube with the rolling direction set to (100) main orientation is developed. The more the cube orientation of the recrystallized assembly belonging to copper is, the more the bending fatigue life of the copper foil is improved. In the flexible circuit board of the present invention, if the I/Iq is less than 25, the increase in the bending fatigue life of the wiring is not sufficiently satisfactory. If the I/U is 33 -15 to 201146101 or more, the increase in the bending fatigue life is changed. It is more obvious. Here, the X-ray diffraction in the thickness direction of the copper foil refers to the alignment in the surface of the copper foil (in the case of a rolled copper foil, the rolling surface), and the strength (I) of the (200) surface indicates The intensity integral ( of the (200) plane obtained by X-ray diffraction. In addition, the strength (1 〇) indicates the intensity integral 値 of the (200) plane of the fine powder copper (the copper powder test material of the Kanto Chemical Co., Ltd. grade I, 325 mesh). In order to obtain an I/U of 25 or more, it is only necessary to obtain a recrystallized structure of the copper foil, and the means is not particularly limited, but the type of the metal foil to be subjected to the intermediate burning condition or the cold rolling processing rate is used. Or the concentration of the impurity is optimized, whereby a rolled aggregate having a large crystal grain size and a rolled copper foil of 1/1 〇 225 can be obtained. Further, for example, after the copper layer is laminated on the resin layer and the rolled copper foil, the copper foil may be heated at a temperature of 300 to 360 ° C for a load of 5 minutes or more. A recrystallized assembly of copper foil was obtained. Further, in order to specify the collective organization in terms of the degree of integration of the three dimensions, it is also possible to specify the area ratio of the priority alignment field within 1 相对 ° with respect to the main orientation of the collective organization. In other words, the crystal surface of the predetermined surface of the metal foil may be, for example, an electron beam diffraction method such as an EBSP (Electrical Back Scattering Pattern) method or an ECP (Electron Channel Pattern Method) or an X-ray such as a Micro Laue method. Confirm by the diffraction method or the like. The EBSP method analyzes crystals based on a diffraction image called a pseudo-Kikuchi line, which is diffracted by each crystal plane generated when a convergent electron beam is irradiated onto the surface of the sample to be measured, and is determined based on the orientation data and the measurement. The position information of the point to measure the crystal orientation distribution of the measurement object is compared with the X-ray diffraction method, and the crystal orientation of the aggregate structure in the micro (micro) domain can be analyzed. For example, the crystal orientations can be specified in each of the microscopic fields, and the maps can be mapped together, and the inclination (azimuth difference) of the plane orientation between the map points is equal to or less than the same color. The distribution of the fields (crystal grains) of the same plane orientation is revealed, whereby the orientation map image can be obtained. Further, the orientation plane having an orientation within a predetermined angle with respect to a specific plane orientation may be included, and the orientation may be defined, and the ratio of the existence of each plane orientation may be extracted by the area ratio. In the EBSP method, in order to exhibit an area ratio of a region within a certain angle from a specific orientation, it is necessary to at least be larger than the field of circuit bending in the flexible circuit substrate of the present invention in order to exhibit an area ratio. The electronic wire is scanned in detail in a manner that is sufficient to obtain a sufficient number of points. However, in the metal foil to be used in the present invention, the size of the circuit to be used is considered, and in the field of 0.005 mm 2 or more, If the average area ratio is to be displayed, it is sufficient to measure 1 000 points or more. However, the present invention differs from the inventions described in Patent Documents 3 and 4 in that the orientation of the invention of the patent documents is defined only by the normal direction of the box measured by the X-ray. In contrast, the present invention is defined by a third dimension. In order to obtain high fatigue characteristics for bending, it is particularly important to make the main deformation, the principal stress direction, that is, the <1 〇〇 > accumulation degree in the foil surface when bending. Further, in the present invention, the size of the recrystallized grains, that is, the crystal grains having a cubic orientation is preferably 2 5 μm or more in terms of an average enthalpy. Further, in the case of the present invention, in particular, when high flexibility is required, the metal foil forming the flexible -17-201146101 circuit board may be a rolled copper foil having a thickness of 5 to 18 μm, preferably a calender having a thickness of 9 to 12 μm. Copper foil. When the rolled copper foil is thicker than 18 μm, it is difficult to obtain a flexible circuit board having excellent fatigue characteristics in a high-deformation field having a radius of curvature of 2 mm or less. Further, when the thickness is thinner than 5 μm, it is difficult to laminate the metal foil and the resin layer, and it is difficult to form a homogeneous flexible circuit board. Different from the first method for improving the fatigue characteristics of the flexible circuit substrate described above, in the present invention, the second elongation at break of the face-centered cubic metal foil for improving the single crystal close to the height alignment In the case of the method, the <1〇〇> direction in which the elongation at break is small does not become the principal stress direction, and the wiring structure of the flexible circuit board is designed. Specifically, the following method is exemplified. As described in the first aspect, by designing the rolling and recrystallization conditions, it is possible to produce a metal foil having a highly aligned cubic assembly structure having a rolling direction and a normal orientation of the foil surface in the normal direction of the foil surface. Further, in the wiring, the direction in which the circuit is cut is shifted from the rolling direction, that is, the <1〇〇> direction by a predetermined angle, and the circuit is obliquely drawn, whereby the main stress direction can be obtained when the bending is performed. A flexible circuit board having a large elongation at break. By the method as described above, the elongation at break of the metal foil in the normal direction (the principal stress direction in the curved portion) of the cross section of the wiring which is cut in the thickness direction of the metal foil by the ridge line in the curved portion is 3 5% or more 'must make the above-mentioned section Ρ with [001] as the ribbon axis and any principal surface contained in the range of (20 1 0 ) to (1 20 0 ). Here, the relationship between the ribbon axis and the plane orientation is shown in Fig. 1. (20 1 〇) and (1 20 0 ) are in the relationship of -18- 201146101 [00 1] as the common axis, that is, the ribbon axis, located on the axis of [〇〇1] (100) to ( 110) [in the plane of rotation from (100) to (〇1〇)]. That is, when it is displayed on the inverse pole map of the normal direction of the cross section p, the faces of '(001), (20 10), and (110) are as shown in Fig. 2. Based on the symmetry 'on the inverse pole map, 2〇 〇) is expressed at the same position as (20 1 0). The metal of the metal foil in the present invention has a face-centered cubic structure. The crystal axis of the unit cell is [1 〇〇], [010], [001]', but in the present invention, if it is in the thickness direction of the metal foil (vertical direction with respect to the surface of the metal foil), <1〇0> When the priority orientation is 'mark the axis as [0 0 1]', the foil surface orientation is marked as (〇〇i ) 'but even if the axis is replaced based on the symmetry of the face-centered cubic structure, it is equivalent. Of course, these are included in the present invention. Then, the main orientation in the foil surface must be 2.9 with respect to the main deformation direction of the curved portion, that is, the cross-sectional normal direction of the wiring (the perpendicular to the wiring cross section P) when the ridge line in the curved portion is cut in the thickness direction. The angle of ~ 87.1 ° [(20 1 0) ~ (1 20 0)] is preferably 5.7. The angle of ~ 84.3 ° [(10 1 0) ~ (1 10 0)] is more preferably 11.4. ~ 78.6 ° [(510) ~ (150)] angle, more preferably 26.6 ° ~ 63.4 ° [(210) ~ (120)] angle, most suitable for 30 ° or 60 ° [(40 23 0) or (23 40 0) is appropriate. Here, the inside of [ ] indicates the plane orientation of the section P corresponding to each angle. Here, the symmetry of the crystal may be described as having a normal line with respect to the wiring cross section P having an angle of 2.9 to 45 with respect to the basic crystal axis <1〇〇 > in the plane of the metal foil. Here, the wiring when the ridge line in the curved portion is cut in the thickness direction is -19-201146101
剖面P係指例如第3圖所示,若使可撓性電路基板彎曲成U 字狀時,在其外側形成有稜線L,由該稜線L朝可撓性電路 基板的厚度方向d切開時所得的剖面之中的配線部分者。 此外,稜線L係指在使可撓性電路基板彎曲的狀態下,將 沿著其折曲方向(第3圖中的粗黑箭號)觀看可撓性電路 基板的剖面時所形成的頂點相連結的線。其中,例如後述 的滑動彎曲等稜線L在可撓性電路基板移動般的情形亦包 含在內。此外,在第3圖中,係表示樹脂層1爲外側、配線 2朝內側彎曲的狀態(將具有曲率半徑的圓所內接之側設 爲內側),但是亦可爲配線2在外側的折曲方式自不待言 〇 在各種用途中,當受到某曲率的強制位移時,金屬箔 係主要受到拉伸、或壓縮的應力。在受到彎曲的可撓性電 路基板之中,哪一個部分會受到拉伸或壓縮雖亦依金屬箔 與樹脂的構成而異,但是比拉伸與壓縮的中立軸(或中立 面)更爲灣曲的外側的最遠部分會因金屬破壞而過於苛刻 乃爲一般所見,朝向由彎曲部中的稜線朝厚度方向切開時 的配線的剖面法線方向的拉伸應力會成爲主應力。亦即, 彎曲部中的配線的主應力方向係在第3圖中以箭號2 1所示 方向,典型而言,與相對由彎曲部的稜線朝向金屬箔的厚 度方向切開的配線剖面P的法線方向相等,與朝金屬箔的 厚度方向配向的〔〇〇1〕軸垂直相交的方向。 考慮到可撓性電路基板內的金屬箔的機械特性時,當 朝向第3圖中的箭號21所示主應力方向將金屬箔單純拉伸 -20- 201146101 系 使 度 部 > 向 所 » 是 爲 20 在 時 位 當 11 時的應力變形特性即成爲重要的特性。在此,如第4圖I )及(d )之例所示,假設以形成有相對具有面心立方 的結晶構造的金屬箔的〔1 0 0〕軸呈正交的稜線的方式 其彎曲時,由在彎曲部的稜線朝向可撓性電路基板的厚 方向切開的配線的剖面係成爲(1 00 )面,但是由彎曲 中的稜線朝厚度方向切開時的配線的剖面P如第1圖所示 以〔001〕爲晶帶軸而在由(100 )至(010 )的旋轉方 中的(20 1 0)至(1 200)的範圍(圖中的兩箭號) 包含的任何面呈現主方位,則可使斷裂伸長提升。其中 在第1圖中,係顯示(20 1 0)至(1 20 0)的範圍,但 存在有與在面心立方系的結晶構造中該範圍所包含的面 等效的面。因此,關於配線的剖面與(2 0 1 0 )至(1 〇)的範圍所包含的面爲符號不同的等效的面,係包含 本發明中。 在第二方策中,由彎曲部中的稜線朝厚度方向切開 的配線的剖面P在(20 1 〇 )至(1 20 0 )之間的特定方 具有主方位而作優先配向,由此斷裂伸長提升的理由係 對剖面P的法線方向、亦即主應力方向施加拉伸應力時 在具有面心立方構造的金屬中,在屬於滑移面的8個{ i }之中’亦由於施密德因子爲最大的主滑移面成爲4面 因此剪斷滑動變得良好,而不易發生局部加工硬化之故 在一般的壓延銅箔中,通常金屬箔的長邊方向相當於壓 方向,如第4圖(c)或(d)所示,沿著其主方位<1〇〇 形成電路。例如,專利文獻5的實施例係相當於第4圖< -21 - 201146101 )的形態。如上所示,若將由彎曲部中的 切開時的配線的剖面方位設爲(1 〇〇 )時 ,8個滑移面的施密德因子成爲等效而使8 作用,局部性容易蓄積位錯。依與如上所 差異,採用第二方策的可撓性電路基板的 電路的長邊方向折曲的一般利用形態相比: 關於可撓性電路基板中的剖面P,最 相對彎曲部的主變形方向、亦即由彎曲部 方向切開時的配線的剖面法線方向爲30° 係爲了使應力方向與拉伸的安定方位相一 到以上機構時,若至少由彎曲部中的稜線 時的配線的剖面P以〔〇〇 1〕爲晶帶軸,在 20 0 )之間的特定方位具有主方位而具有ί 亦即,本發明中的第二方策係金屬箔 造,金屬箔的厚度方向具有<1〇〇>的主 箔的箔面內具有<100 >的主方位,而且 中的稜線朝厚度方向切開時的配線的剖谊 (20 1 0)至(1 20 0 )之間的特定方位 優先配向之類的配線。此時,剖面Ρ的法 在(10 1 0 )至(1 10 0 )之間的特定方 作優先配向,更佳爲在(5 1 0 )至(1 1 〇 ) 具有主方位而作優先配向,更佳爲在(21 間的特定方位具有主方位而作優先配向, (40 2 3 0 )附近具有中心方位而作優先配 稜線朝厚度方向 ,在使其彎曲時 個滑移系統同時 示之習知技術的 耐彎曲特性與在 爲較爲優異。 爲理想的方位係 中的稜線朝厚度 或6 0° ,但是此 致之故。當考慮 朝厚度方向切開 (20 1 0 )至(1 g先配向即可。 具有面心立方構 方位,並且金屬 具備有由彎曲部 i p的法線方向在 具有主方位而作 線方向係較佳爲 位具有主方位而 之間的特定方位 〇)至(no)之 最爲適合的係在 向》若爲箔面以 -22- 201146101 (00 1 )爲主方位而作優先配向的金屬箔時,例如箔面內 的〔001〕與〔100〕爲等效,本發明中的可撓性電路基板 的由彎曲部中的稜線朝厚度方向切開時的配線的剖面p的 主方位亦可記述爲(1 2 0 0 )至(11 0 )之間的特定方位, 較佳爲在(120)至(110)之間的特定方位具有主方位而 作優先配向,最爲適合的是亦可記述爲在(23 40 0)附近 具有主方位而作優先配向。 此外,金屬箔的厚度方向具有<1〇〇>的主方位,並 且金屬箔的箔面內具有<1〇〇>的主方位,而且由彎曲部 中的稜線朝厚度方向切開時的配線的剖面P在(20 1 0)至 (1 20 0)之間的特定方位具有主方位,亦可謂爲在第2圖 所不之(100)標準投影圖的立體三角形(stereo triangle )上作逆極點表示時,由彎曲部中的稜線朝厚度方向切開 時的配線的剖面方位爲位於以表示(2 0 1 0 )的點與表示 (1 1 〇 )的點所連結的線段上的任何面。此外,第二方策 中的可撓性電路基板係由金屬箔的厚度方向爲〔〇 〇 1〕軸 之3 (2)軸配向的材料形成配線,亦可謂爲由彎曲部中的 稜線朝厚度方向切開時的配線的剖面法線在與箔面內的〔 1〇〇〕軸之間具有2.9°至8 7.Γ的範圍的角度者。 接著’藉由如上所示之第二方策,可得可將彎曲部中 的主應力方向的金屬箔的斷裂伸長形成爲3. 5 %以上,不易 發生曲率半徑爲2mm以下之類的反覆變形、或即使對應力 亦不易發生金屬疲勞’且彎曲性高的可撓性電路基板。此 外’在本發明中’藉由將上述第一方策與該第二方策加以 -23- 201146101 組合,可更爲確實獲得金屬疲勞特性及彎曲 電路基'板,主應力方向的金屬箔的斷裂伸長 以上、較佳爲4%以上、更佳爲9%以上。其 伸長的上限,以面心立方構造的單位晶格的 100>,相對金屬箔的厚度方向(箔面法線 於箔面內的某一方向(其一爲壓延方向)纪 分別方位差1 0°以內的優先配向領域以面積 而且厚度爲18μπι之在本發明之範圍內可取得 限而言,可規定爲20%以下,但是若採取銅 基本結晶軸< 1 00 >,相對銅箔的厚度方向 內的某一方向的2個正交軸,分別方位差1G 配向領域以面積率計佔有95%以上、而且厚 之更佳形態時,斷裂伸長的上限爲1 5%以下| 關於本發明中的可撓性電路基板的樹脂 層的樹脂種類並未特別限制,可列舉在一般 基板中加以使用者,可例示例如聚醯亞胺、 、液晶聚合物、聚苯硫醚、聚醚醚酮等。其 爲電路基板時呈現良好的可撓性,而且耐熱 以聚醯亞胺或液晶聚合物較爲適合。 樹脂層的厚度係可按照可撓性電路基板 等來適當設军,但是由可撓性的觀點來看, 範圍爲佳,以9〜50 μηι的範圍爲較佳,以10 爲最佳。若樹脂層的厚度未達5 μιη,有絕緣 虞,相反地,若超過75μηι,當裝載在小型機 性佳的可撓性 可形成爲3.5 % 中,關於斷裂 基本結晶軸< 方向)與存在 ]2個正交軸, :率計爲50%, 的壓延箔的上 的單位晶格的 與存在於箔面 1 °以內的優先 度爲12μηι以下 〇 層,形成樹脂 的可撓性電路 聚醯胺、聚酯 中由於亦在作 性亦佳,因此 的用途、形狀 以5〜75 μιη的 〜30μιη的範圍 可靠性降低之 器等時,會有 -24- 201146101 電路基板全體的厚度變得過厚之虞,亦會發生彎曲性降低 〇 此外’當將可撓性電路基板適用在行動電話的滑移滑 動部等時,係有在由金屬箔所形成的配線上貼合由覆蓋膜 (cover lay film )等所構成的覆蓋材來加以使用的情形, 惟在該情形下,考慮施加於配線的應力的平衡來設計覆蓋 材與樹脂層的構成爲佳。根據本發明人等的知見,列舉有 :將例如25°C下的拉伸彈性率爲4〜6GPa,並且厚度爲14 〜17μιη的範圍的聚醯亞胺作爲樹脂層,具有由厚度8〜 17μηι的熱硬化性樹脂所構成的接著層、與厚度7〜13μηι的 聚醯亞胺層等2層,而且將接著層與聚醯亞胺層全體的拉 伸彈性率爲2〜4GP a的覆蓋膜作爲覆蓋材的構成例、或者 將25°C下的拉伸彈性率爲6〜8GPa,並且厚度爲12〜15μιη 的範圍的聚醯亞胺作爲樹脂層,具有由厚度8〜17μηι的熱 硬化性樹脂所構成的接著層與厚度7〜13μιη的聚醯亞胺層 等2層’而且’以接著層與聚醯亞胺層全體的拉伸彈性率 爲2〜4GPa的覆蓋膜作爲覆蓋材的構成例等。 關於使樹脂層與金屬箱相層積的手段,若例如樹脂層 由聚醯亞胺所構成時,可在聚醯亞胺薄膜塗佈或介在熱塑 性的聚醯亞胺而將金屬箔作熱疊合(所謂疊合法)。以在 疊合法中所使用的聚醯亞胺薄膜而言,可例示例如 “Kapton”(東麗杜邦股份有限公司)、“Apical”(鐘淵化 學工業股份有限公司)、“Upi lex”(宇部興產股份有限公 司)等。當將聚醯亞胺薄膜與金屬箔進行加熱壓接時,使 -25- 201146101 示出熱塑性的熱塑性聚醯亞胺樹脂介在其中即可。此外, 由易於控制樹脂層的厚度或折曲特性等的觀點來看,亦可 在金屬箔塗佈聚醯亞胺前驅物溶液(亦稱爲聚醯胺酸溶液 )後,使其乾燥、硬化而得層積體(所謂鑄型法)。 樹脂層可使複數樹脂層積而形成,亦可使例如線膨脹 係數等不同的2種以上的聚醯亞胺相層積,但是此時由擔 保耐熱性或彎曲性的觀點來看,較佳爲無須使用環氧樹脂 等來作爲接著劑,樹脂層的全部實質上由聚醯亞胺所形成 爲宜。包括由單獨的聚醯亞胺所構成的情形及由複數聚醯 亞胺所構成的情形,樹脂層的拉伸彈性率係以成爲4〜 lOGPa爲佳,較佳爲成爲5〜8GPa。 在本發明之可撓性電路基板中,以樹脂層的線膨脹係 數爲10〜30ppm/°C的範圍爲佳。若樹脂層由複數樹脂所構 成時,若樹脂層全體的線膨脹係數在該範圍內即可。爲了 滿足如上所示之條件,係由例如線膨脹係數爲25ppmTC以 下、較佳爲5〜20ppm/°C的低線膨脹性聚醯亞胺層、及線 膨脹係數爲26ppm/°C以上、較佳爲30〜80ppm/°C的高線膨 脹性聚醯亞胺層所構成的樹脂層,藉由調整該等的厚度比 ,可形成爲10〜30ppm/°C者。較佳的低線膨脹性聚醯亞胺 層與高線膨脹性聚醯亞胺層的厚度的比係70 : 3 0〜95 : 5 的範圍。此外,低線膨脹性聚醯亞胺層係成爲樹脂層的主 要樹脂層,高線膨脹性聚醯亞胺層係以與金屬箔相接而設 爲佳。其中,線膨脹係數係將醯亞胺化反應已充分結束的 聚醯亞胺作爲試料,使用熱機械性分析儀(TMA)而升溫 -26- 201146101 至250 °C後,以10 °C/分鐘的速度冷卻,可由240〜100t的 範圍中的平均的線膨脹係數求出。 此外,本發明中的可撓性電路基板係具備有:樹脂層 、及由金屬箔所形成的配線,在任一者具有彎曲部來加以 使用者。亦即,以硬碟內的可動部、行動電話的鉸鏈部或 滑移滑動部、印表機的列印頭部、光拾波器部、筆記型P C 的可動部等爲首,在各種電子電氣機器等被廣泛使用,電 路基板本身被折曲、扭彎、或按照所裝載的機器的動作而 變形,在任意者形成有彎曲部者。尤其,本發明之可撓性 電路基板由於具有彎曲耐久性佳的彎曲部構造,因此適於 伴隨著滑動彎曲、折曲彎曲、鉸鏈彎曲、滑移彎曲等反覆 動作而頻繁折曲的情形、或爲了與所裝載的機器的小型化 相對應,曲率半徑以折曲舉動爲0.38〜2.0mm,以滑動彎 曲爲1 .25〜2_0mm,以鉸鏈彎曲爲3.0〜5.0mm,以滑移彎 曲爲0.3〜2.0mm之類的嚴謹使用條件的情形,在以0.3〜 1 mm的狹窄間隙,彎曲性能的要求嚴謹的滑移用途中尤其 發揮效果。 關於本發明中的可撓性電路基板之製造方法,以其一 而言,i )獲得呈現〔00 1〕軸最終朝箔面法線(相對金屬 箔表面的垂線)配向的立方體集合組織的壓延金屬箔與樹 脂層在金屬箔的箔面相貼合的複合體,以將設計上的彎曲 的主應力方向、亦即由彎曲部中的稜線朝厚度方向切開時 的配線的剖面法線方向,相對金屬箔面內的〔1 〇〇〕主方 位具有2.9°〜87. Γ的角度而形成有彎曲部的稜線的方式 -27- 201146101 進行配線、或ii)將構成配線的金屬箔形成爲純度99.999% 以上、或iii)同時採用該等i)與ii)的方法即可。 此時,金屬箔並不一定必須由開始即呈現立方體集合 組織,亦可藉由熱處理來形成立方體集合組織,例如在可 撓性電路基板的製造過程、具體而言爲在樹脂層的形成過 程中進行熱處理,而形成立方體集合組織。亦即,藉由進 行熱處理,以由< 1 〇〇〉軸在方位差1 0°以內的領域佔有 面積比5 0 %以上的方式,使單位晶格的基本結晶軸< 1 〇 〇 > 之其一朝金屬箔的厚度方向作優先配向,並且以由<100 >軸在方位差10°以內的領域佔有面積比50%以上的方式 ,使基本結晶軸< 1 〇〇 >的另外其一相對金屬箔的表面朝 水平方向作優先配向即可。壓延銅箔的再結晶集合組織係 —般壓延面方位爲{ 100},壓延方向爲<100〉。因此, 以壓延面方位而言,形成有(001 )主方位。此外,若使 用純度99.999%以上的金屬箔時,即使在任何方位形成電 路而作配線,斷裂伸長均可確保3 · 5 %以上,可形成設計上 的適用範圍較大的可撓性電路基板。 關於採用第二方策的情形,更詳而言之,如第3圖所 示,若使例如可撓性電路基板彎曲成U字狀時,在其外側 (形成有具有曲率半徑的內接圓的相反側)形成有稜線L ,但是該稜線L若由與形成配線的金屬箔的〔1 〇 〇〕軸呈正 交的狀態在α=2·9〜87.1(° )的範圍內具有傾斜即可。 將如上所示之狀態之例顯示於第4圖的(a )及(b )。順 帶一提,第4圖的(C)及(d)係相對〔100〕軸,稜線呈 -28- 201146101 正交的狀態(α = 0 )。在此,若α未達2 · 9 ° ,在彎曲性中 未確認明確的效果。若爲α = 1 1 . 4〜7 8.6 ( ° ),彎曲部構 造的彎曲耐久性更進一步提升。其中,在本發明中,若爲 上述α= 2.9°的情形,由稜線朝厚度d方向切開時的配線的 剖面P係相當於(20 1 0 )面,若爲α = 45的情形,剖面P相 當於(1 10 )面,若爲α = 87. 1的情形,剖面Ρ相當於(1 20 〇 )面。此外,在面心立方構造中,〔1 〇〇〕與〔0 1 0〕爲 等效,因此第4圖(a)及(b)所示之〔100〕的箔面內正 交軸與稜線所成角度α的角度範圍係與〔100〕與剖面P法 線所成角度範圍、及〔1 〇〇〕與稜線所成角度範圍相一致 〇 此外,關於配線的寬幅、形狀、圖案等並未特別限制 ,可按照可撓性電路基板的用途、所裝載的電子機器等來 適當設計即可,但是由於本發明之彎曲部構造的彎曲耐久 性佳,因此即使爲採用第二方策的情形下,亦不需要必須 爲了例如減小對配線之彎曲應力而相對鉸鏈部的旋動軸以 斜向進行配線,而可進行沿著相對彎曲部中的稜線呈正交 的方向的配線、亦即所需最小限度的最短距離下的配線。 第4圖(a )及(b )係顯示例如行動電話的鉸鏈部等所使 用的可撓性電路基板,具有樹脂層1、由金屬箔所形成的 配線2、及連接器的端子3之例。第4圖(a )及(b )的任 一者均在中央附近顯示彎曲部中的稜線L的位置,該稜線L 係具有相對形成配線2的金屬箔的〔100〕軸方向爲(90 + α) °的角度。在此,第4圖(a)係在兩端的連接器端子3 -29- 201146101 的途中、稜線L附近,以斜向形成有配線之例,但是亦可 如第4圖(b )所示將連接器端子3間以最短距離進行配線 。其中,如折疊式行動電話等般,除了彎曲部中的稜線L 的位置被固定的情形以外,亦可爲如滑移式行動電話等般 彎曲部中的稜線L進行移動般的滑移滑動彎曲(第4圖(b) 所記的粗線箭號方向)。其中,本發明中的可撓性電路基 板係在樹脂層的至少單面具備有由金屬箔所構成的配線, 但是亦可視需要在樹脂層的兩面具備金屬箔。 如以上說明所示,在使可撓性電路基板彎曲時的彎曲 部構成配線的金屬箔,即使在藉由構成作高度配向並且朝 主應力及主變形方向的斷裂伸長爲較大的金屬箔,來進行 彎曲半徑較小的高彎曲的反覆彎曲時,亦因不易發生因結 晶異方性而起的局部性應力集中,而且不易發生位錯集積 等2個效果,可提供不易發生金屬疲勞,具有對應力及變 形優異的耐久性,在可撓性電路基板的設計不會發生制約 ,且具備有即使對反覆折曲或曲率半徑較小的彎曲亦得以 承受的強度,且彎曲性佳的可撓性電路基板。 〔實施例〕 以下根據實施例及比較例,更加具體說明本發明。其 中,在實施例等中所使用的銅箔的種類、及聚醯胺酸溶液 的合成係如下所示》 〔銅箔A〕 -30- 201146101 市售壓延銅箔、純度99.9%、厚度9μιη。 〔銅箔Β〕 市售電解銅箔、純度99.9%、厚度9 μηι。 〔銅箔C〕 無氧銅箔、純度99.99%、厚度9μηι、製程條件Α。 不純物(mass ppm)氧:2、銀:18、磷:2.1、硫擴 :4、鐵:1 .5 〔銅箔D〕 精製銅箔、純度99.999%、厚度9μιη、製程條件A。 不純物(mass ppm)氧:2、銀:5、磷:〇.〇1、硫碌 :0.01 、鐵 0.002 〔銅箔E〕 精製銅箔、純度99.9999%、厚度9μιη、製程條件A。 不純物(mass ppm)氧:<1、銀:0.18、磷:<〇.〇〇5 、硫磺:<0.005、鐵:0.002 〔銅箔F〕 精製銅箔、純度99.9999 %、厚度9 μιη、製程條件β, 不純物(mass ppm)氧:<1、銀:0.18、磷:<〇.〇〇5 、硫磺:<0.005、鐵:0.002 -31 - 201146101 〔銅箔G〕 精製銅箔、純度99.9999%、厚度9μιΏ、製程條件C。 不純物(mass ppm)氧:<1、銀:0.18、磷:<0.005 、硫磺:<0.005、鐵:0.002 〔銅箔Η〕 市售壓延銅箔、純度99.9 %、厚度12 μιη。 〔銅箔的製造方法〕 銅箔Α與銅箔Η爲市售的腿延銅箔,銅箔Β係以硫酸銅 浴所製造出的市售的電解銅箔。該等均作爲高彎曲用途品 而被市售的銅箔,純度爲99.9%,以市售品而言爲較高者 。銅箔C〜銅箔G係由本發明人等所加工者,將預定純度的 銅素材在石墨鑄型內鑄造凝固,進行壓延加工而形成爲預 定厚度者。鑄錠的厚度爲10 mm,以冷間壓延降低至1mm之 後,針對銅箔C、銅箔D、及銅箔E,係在實施300 °C、30分 鐘的中間燒鈍之後,實施冷間壓延至9μπι爲止(製程條件 A )。此外,銅箔F係未進行中間燒鈍而至9μηι爲止實施冷 間壓延(’製程條件Β )者。此外,銅箔G係在8 0 0 °C下進行 中間燒鈍溫度’至9μπι爲止實施冷間壓延(製程條件C ) 〔聚醯胺酸溶液的合成〕 -32- 201146101 (合成例1 ) 在具備有熱電偶及攪拌機並且可導入氮的反應容器放 入N,N-二甲基乙醯胺。在該反應容器,一面將2,2-雙[4-(4-氨基苯氧基)苯基]丙烷(BAPP)在容器中攪拌一面使其溶 解。接著,添加苯均四酸二酐(PMDA )。以單體的投入 總量爲1 5 w t%的方式進行投入。之後,持續攪拌3小時而 得聚醯胺酸a的樹脂溶液。該聚醯胺酸a的樹脂溶液的溶液 黏度爲3,000cps。 (合成例2 ) 在具備有熱電偶及攪拌機並且可導入氮的反應容器放 入N,N-二甲基乙醯胺。在該反應容器投入2,2’-二甲基-4,4’-二胺基聯苯(m-TB)。接著添加3,3·,4,4·-聯苯四酸二酐 (BPDA)及苯均四酸二酐(PMDA)。以單體的投入總量 爲15wt%、各酸酐的莫耳比率(BPDA: PMDA)爲20: 80 的方式進行投入。之後,持續攪拌3小時而得聚醯胺酸b的 樹脂溶液。該聚醯胺酸b的樹脂溶液的溶液黏度爲 20,000cps 0 〔實施例1〕 在銅箔A至銅箔G之7種銅箔塗佈上述所備妥的聚醯胺 酸溶液a,使其乾燥(硬化後形成膜厚2μηι的熱塑性聚醯亞 胺),在其上塗佈聚醯胺酸b且使其乾燥(硬化後形成膜 厚9μιη的低熱熱膨脹性聚醯亞胺),另外在其上塗佈聚醯 -33- 201146101 胺酸a且使其乾燥(硬化後形成膜厚2μπι的熱塑性聚醯亞胺 ),經由300〜3 60 °C的溫度以積算時間計爲負荷5分以上 之類的加熱條件,而形成由3層構造所構成的聚醯亞胺層 。接著,沿著銅箔的壓延方向(MD方向)長度250mm, 以相對壓延方向呈正交的方向(TD方向)成爲寬幅1 50mm 之長方形尺寸的方式進行切出,如第5圖所示,取得具有 厚度13μΓη的聚醯亞胺層(樹脂層)1與厚度9μίη的銅箔2的 單面覆銅層積板4»此時的樹脂層全體的拉伸彈性率爲 7.5GPa。In the cross-section P, for example, when the flexible circuit board is bent into a U-shape, a ridge line L is formed on the outer side, and the ridge line L is cut toward the thickness direction d of the flexible circuit board. The part of the wiring in the section. In addition, the ridge line L is a vertex phase formed when the flexible circuit board is bent, and the cross section of the flexible circuit board is viewed along the bending direction (the thick black arrow in FIG. 3). Linked line. Here, for example, a case where the ridgeline L such as a sliding curve to be described later moves on the flexible circuit board is also included. In addition, in the third figure, the resin layer 1 is outside and the wiring 2 is bent inward (the side in which the circle having the radius of curvature is inscribed is inside), but the wiring 2 may be folded outward. The curved mode is self-evident in various applications. When subjected to a forced displacement of a certain curvature, the metal foil is mainly subjected to tensile or compressive stress. Which part of the flexible circuit board subjected to bending is subjected to stretching or compression depending on the composition of the metal foil and the resin, but is more than the neutral axis (or neutral surface) of stretching and compression. The farthest portion of the outer side of the bay ridge is too severe due to metal damage, and it is generally seen that the tensile stress in the normal direction of the cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction becomes the principal stress. That is, the principal stress direction of the wiring in the bent portion is in the direction indicated by the arrow 21 in Fig. 3, and typically, the wiring profile P which is cut toward the thickness direction of the metal foil with respect to the ridge line of the curved portion. The normal directions are equal, and intersect perpendicularly to the [〇〇1] axis that is aligned toward the thickness direction of the metal foil. Considering the mechanical properties of the metal foil in the flexible circuit board, the metal foil is simply stretched toward the direction of the principal stress shown by the arrow 21 in Fig. 3 - 201146101 It is an important characteristic that the stress-deformation characteristic is 20 when the time is 11 o'clock. Here, as shown in the examples of FIGS. 4I and (d), it is assumed that the [100] axis of the metal foil having the crystal structure having a face-centered cubic shape is curved so as to be orthogonal to each other. The cross section of the wiring which is cut in the thick direction of the flexible circuit board by the ridge line of the curved portion is a (100) plane, but the cross section P of the wiring when the ridge line in the curved line is cut in the thickness direction is as shown in FIG. It is shown that [001] is the ribbon axis and any surface included in the range of (20 1 0) to (1 200) (the two arrows in the figure) in the rotation of (100) to (010) is presented as the main Orientation, which can increase the elongation at break. In the first drawing, the range of (20 1 0) to (1 20 0) is shown, but there is a surface equivalent to the surface included in the range in the face-centered cubic crystal structure. Therefore, the equivalent faces of the cross section of the wiring and the range of (2 0 1 0 ) to (1 〇) are different from each other, and are included in the present invention. In the second method, the cross section P of the wiring cut by the ridge line in the curved portion in the thickness direction has a main orientation between the (20 1 〇) to (1 20 0 ) and is preferentially aligned, thereby breaking elongation The reason for the improvement is that in the metal having a face-centered cubic structure when the tensile stress is applied to the normal direction of the section P, that is, the principal stress direction, among the eight {i} belonging to the slip surface, The German factor has the largest main slip surface to be 4 faces, so the shearing and sliding becomes good, and local work hardening is not easy to occur. In general rolled copper foil, the long side direction of the metal foil is generally equivalent to the pressing direction, as in the first 4 (c) or (d), the circuit is formed along its main orientation <1〇〇. For example, the embodiment of Patent Document 5 corresponds to the form of Fig. 4 <-21 - 201146101). As described above, when the cross-sectional orientation of the wiring at the time of the cut in the curved portion is (1 〇〇), the Schmid factor of the eight slip surfaces becomes equivalent and the function is 8, and the dislocation is easily accumulated locally. . According to the above difference, the general use form of the circuit in which the flexible circuit board of the second method is bent in the longitudinal direction is compared with the main deformation direction of the most curved portion in the cross section P in the flexible circuit board. That is, the normal direction of the cross section of the wiring when the direction of the curved portion is cut is 30°. In order to make the stress direction and the tensile orientation of the tension equal to or higher than the mechanism, the cross section of the wiring at least when the ridge line in the curved portion is formed P has [?1] as a ribbon axis, and a specific orientation between 20 0) has a main orientation and has ί, that is, the second aspect of the present invention is made of a metal foil, and the thickness direction of the metal foil has < The main foil of the main foil of 1〇〇> has a main orientation of <100>, and the middle ridge line is cut between the cross-sections of the wiring (20 1 0) to (1 20 0 ) when the thickness is cut in the thickness direction. Wiring such as specific orientation priority alignment. At this time, the method of the profile Ρ preferentially aligns the specific direction between (10 1 0 ) and (1 10 0 ), and more preferably has the main orientation at (5 1 0 ) to (1 1 〇) for preferential alignment. More preferably, the priority orientation is given in the specific orientation of the 21 directions, and the central orientation is in the vicinity of (40 2 3 0), and the priority ridge line is oriented in the thickness direction, and the sliding system is simultaneously displayed when the bending is performed. The bending resistance characteristics of the prior art are superior. The ridge line in the ideal orientation system is facing thickness or 60°, but this is the reason. When considering the incision in the thickness direction (20 1 0 ) to (1 g first It can be aligned. It has a face-centered cubic orientation, and the metal has a specific orientation between the normal direction of the curved portion ip and the main orientation, and the linear orientation is preferably the position with the main orientation 〇) to (no The most suitable one is the metal foil which is preferentially aligned if the foil surface is -22-201146101 (00 1 ), for example, [001] and [100] in the foil surface are equivalent. In the flexible circuit board of the present invention, the ridge line in the curved portion faces the thickness The main orientation of the cross section p of the wiring at the time of cutting may also be described as a specific orientation between (1 2 0 0 ) and (11 0 ), and preferably has a main orientation in a specific orientation between (120) and (110). For the preferred alignment, it is most suitable to be described as having a main orientation in the vicinity of (23 40 0) for preferential alignment. Further, the thickness direction of the metal foil has a main orientation of <1〇〇>, and the metal The main surface of the foil has a main orientation of <1〇〇>, and the cross section P of the wiring when the ridge line in the curved portion is cut in the thickness direction is specific between (20 1 0) to (1 20 0). The orientation has a main orientation, and may be referred to as a cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction when the reverse triangle is indicated on the stereo triangle of the (100) standard projection map of FIG. The orientation is any plane on the line segment connecting the point indicating (2 0 1 0 ) and the point indicating (1 1 〇). In addition, the flexible circuit substrate in the second method is made of the thickness direction of the metal foil. Wiring is formed for the material of the (2) axis of the [〇〇1] axis. The normal line of the cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction has an angle of 2.9 to 8 7. 与 between the axis of the foil surface. The second method of the present invention is characterized in that the elongation at break of the metal foil in the direction of the principal stress in the curved portion is formed to be 3.5% or more, and the reverse deformation such as having a radius of curvature of 2 mm or less is less likely to occur, or even stress is not easily obtained. A flexible circuit board having high metal fatigue and high flexibility. Further, in the present invention, by combining the first method and the second method -23-201146101, it is possible to obtain metal fatigue characteristics more reliably. The bending circuit base plate has a fracture elongation of the metal foil in the direction of the principal stress, preferably 4% or more, more preferably 9% or more. The upper limit of the elongation is 100> of the unit cell of the face-centered cubic structure, and the thickness direction of the metal foil (the normal of the foil surface is in a certain direction in the foil surface (the one is the rolling direction). The priority alignment field within the range of 18 μm is within the range of the present invention, and may be specified as 20% or less, but if the basic crystal axis of copper is <1 00 > The two orthogonal axes in a certain direction in the thickness direction have an azimuth difference of 1G. The area of the alignment is 95% or more in area ratio, and in the case of a thicker shape, the upper limit of the elongation at break is 15% or less | The type of the resin of the resin layer of the flexible circuit board is not particularly limited, and may be exemplified by a user in a general substrate, and examples thereof include polyimine, liquid crystal polymer, polyphenylene sulfide, and polyether ether ketone. Etc., which exhibits good flexibility when it is a circuit board, and is suitable for heat-resistant polyimide or liquid crystal polymer. The thickness of the resin layer can be appropriately set according to a flexible circuit board or the like, but flexibility From the point of view, the range is better, preferably in the range of 9 to 50 μηι, and preferably in the range of 10. If the thickness of the resin layer is less than 5 μηη, there is an insulating crucible, and conversely, if it exceeds 75 μm, when loaded in a small size The flexibility of good mechanical properties can be formed in 3.5%, with respect to the fracture basic crystal axis < direction) and the presence of 2 orthogonal axes, the ratio is 50%, and the unit lattice of the calendered foil The flexible layer having a priority of 1 μm or less on the surface of the foil is 12 μm or less, and the flexible circuit forming the resin is also excellent in the properties of the polyimide and the polyester. Therefore, the use and shape are 5 to 75 μm. When the range of 30 μm η reliability is reduced, there is a case where the thickness of the entire circuit board of the -24-201146101 becomes too thick, and the bendability is also lowered. In addition, when the flexible circuit board is applied to a mobile phone, In the case of sliding a sliding portion or the like, a cover member made of a cover film or the like is bonded to a wiring formed of a metal foil, and in this case, it is considered to be applied to the wiring. Balance of stress to design The composition of the cover material and the resin layer is preferred. According to the knowledge of the inventors of the present invention, for example, a polyimine having a tensile modulus of 4 to 6 GPa at 25 ° C and a thickness of 14 to 17 μm as a resin layer having a thickness of 8 to 17 μm is exemplified. a cover film composed of a thermosetting resin and a polyimide film having a thickness of 7 to 13 μm, and a cover film having a tensile modulus of 2 to 4 GPa of the entire adhesive layer and the polyimide layer. As a structural example of the covering material, or a polyimide having a tensile modulus of 6 to 8 GPa at 25 ° C and a thickness of 12 to 15 μm as a resin layer, it has thermosetting property of 8 to 17 μm in thickness. Two layers of the adhesive layer composed of a resin and a polyimide layer having a thickness of 7 to 13 μm and a coating film having a tensile modulus of 2 to 4 GPa of the entire adhesive layer and the polyimide layer as a covering material. Examples. Regarding the means for laminating the resin layer and the metal case, for example, when the resin layer is composed of polyimide, the metal foil can be laminated on the polyimide film or the thermoplastic polyimide. Combination (so-called stacking). For the polyimide film to be used in the stacking method, for example, "Kapton" (Toray DuPont Co., Ltd.), "Apical" (Kaneka Chemical Industry Co., Ltd.), "Upi lex" (Ube) Xingye Co., Ltd.) and so on. When the polyimide film is heated and pressure-bonded to the metal foil, the thermoplastic thermoplastic polyimide resin is shown to be in the range of -25 to 201146101. Further, from the viewpoint of easy control of the thickness of the resin layer, the bending property, and the like, the polyimide film may be dried and hardened after the metal foil is coated with the polyimide precursor solution (also referred to as a polyamic acid solution). And the layered body (so-called casting method). The resin layer may be formed by laminating a plurality of resins, or may be formed by laminating two or more kinds of polyimine layers having different linear expansion coefficients, etc., but it is preferably from the viewpoint of ensuring heat resistance or flexibility at this time. In order to prevent the epoxy resin or the like from being used as an adhesive, it is preferable that all of the resin layers are substantially formed of polyimide. In the case of a case consisting of a single polyimine and a case of a plurality of polyimine, the tensile modulus of the resin layer is preferably 4 to 10 GPa, preferably 5 to 8 GPa. In the flexible circuit board of the present invention, the linear expansion coefficient of the resin layer is preferably in the range of 10 to 30 ppm/°C. When the resin layer is composed of a plurality of resins, the coefficient of linear expansion of the entire resin layer may be within this range. In order to satisfy the conditions as described above, for example, a low linear expansion polyimine layer having a linear expansion coefficient of 25 ppm TC or less, preferably 5 to 20 ppm/° C., and a coefficient of linear expansion of 26 ppm/° C. or more are used. The resin layer composed of a highly linear expandable polyimide layer of preferably 30 to 80 ppm/° C. can be formed to have a thickness ratio of 10 to 30 ppm/° C. by adjusting the thickness ratio. The ratio of the thickness of the preferred low-expansion polyimine layer to the high-expandable polyimine layer is 70: 30 to 95:5. Further, the low-line expandable polyimide layer is a main resin layer of the resin layer, and the high-expansion polyimine layer is preferably provided in contact with the metal foil. Among them, the coefficient of linear expansion is a sample obtained by using a polyamidimide in which the ruthenium imidization reaction is sufficiently completed, and is heated at a temperature of -26-201146101 to 250 ° C using a thermomechanical analyzer (TMA) at 10 ° C / min. The speed cooling can be obtained from the average linear expansion coefficient in the range of 240 to 100 t. Further, the flexible circuit board of the present invention includes a resin layer and a wiring formed of a metal foil, and has a bent portion for any user. That is, the movable part in the hard disk, the hinge part or the sliding sliding part of the mobile phone, the printing head of the printer, the optical pickup part, the movable part of the notebook type PC, etc. Electrical equipment and the like are widely used, and the circuit board itself is bent, twisted, or deformed in accordance with the operation of the loaded machine, and a bent portion is formed in any of them. In particular, since the flexible circuit board of the present invention has a curved portion structure excellent in bending durability, it is suitable for frequent bending with repeated operations such as sliding bending, bending bending, hinge bending, and slip bending, or Corresponding to the miniaturization of the loaded machine, the radius of curvature is 0.38 to 2.0 mm for the bending action, 1.25 to 2_0 mm for the sliding bending, 3.0 to 5.0 mm for the hinge bending, and 0.3 to 5.0 mm for the slip bending. In the case of strict use conditions such as 2.0 mm, it is particularly effective in the use of a narrow gap of 0.3 to 1 mm and a strict slippage requirement for bending performance. Regarding the manufacturing method of the flexible circuit board in the present invention, i) obtains a calendering of a cubic assembly structure which exhibits a normal alignment of the axis toward the foil surface (a perpendicular to the surface of the metal foil). The composite in which the metal foil and the resin layer are bonded to the foil surface of the metal foil is opposite to the normal direction of the cross section of the wiring when the design is bent in the direction of the principal stress, that is, the ridge line in the curved portion is cut in the thickness direction. The main orientation of the [1 〇〇] in the metal foil surface has a ridge angle of 2.9° to 87. The angle of the ridge is formed -27-201146101, or ii) the metal foil constituting the wiring is formed to have a purity of 99.999. % or more, or iii) may use the methods of i) and ii) at the same time. At this time, the metal foil does not necessarily have to present the cubic aggregate structure from the beginning, and the cubic aggregate structure can also be formed by heat treatment, for example, in the manufacturing process of the flexible circuit substrate, specifically, in the formation of the resin layer. Heat treatment is performed to form a cube assembly. That is, by performing the heat treatment, the basic crystal axis of the unit cell is <1 〇〇> in such a manner that the area occupied by the <1 〇〇> axis within 10° of the azimuth difference is more than 50%. The direction of the thickness of the metal foil is preferentially aligned, and the basic crystal axis is <1 〇〇> in such a manner that the area occupied by the <100 > axis within 10 degrees of the azimuth difference is 50% or more. The other surface of the metal foil may be preferentially aligned in the horizontal direction. The recrystallized aggregate structure of the rolled copper foil has a general calender plane orientation of {100} and a calendering direction of <100>. Therefore, the (001) main orientation is formed in terms of the rolling surface orientation. In addition, when a metal foil having a purity of 99.999% or more is used, even if a circuit is formed in any direction for wiring, the elongation at break can be ensured at 5.3 % or more, and a flexible circuit board having a large design range can be formed. In the case where the second method is used, more specifically, as shown in FIG. 3, when, for example, the flexible circuit board is bent into a U shape, the outer side thereof is formed (inscribed with an inscribed circle having a radius of curvature) On the opposite side, the ridge line L is formed, but the ridge line L has an inclination in a range of α=2·9 to 87.1 (°) in a state orthogonal to the [1 〇〇] axis of the metal foil forming the wiring. . An example of the state shown above is shown in (a) and (b) of Fig. 4. Incidentally, (C) and (d) of Fig. 4 are relative to the [100] axis, and the ridge line is in a state of orthogonality of -28-201146101 (α = 0). Here, if α is less than 2 · 9 °, no clear effect is confirmed in the bendability. If α = 1 1 . 4 to 7 8.6 ( ° ), the bending durability of the bent portion structure is further improved. In the present invention, in the case of the above α = 2.9°, the cross section P of the wiring when the ridge line is cut toward the thickness d direction corresponds to the (20 1 0 ) plane, and when α = 45, the profile P Corresponding to the (1 10 ) plane, if α = 87. 1, the profile Ρ is equivalent to (1 20 〇) plane. In addition, in the face-centered cubic structure, [1 〇〇] is equivalent to [0 1 0], so the orthogonal axes and ridges of the foil surface of [100] shown in Fig. 4 (a) and (b) are shown. The angle range of the angle α formed is in accordance with the angle range formed by [100] and the normal line of the section P, and the angle range formed by [1 〇〇] and the ridge line, and the width, shape, pattern, and the like of the wiring are Although it is not particularly limited, it may be appropriately designed according to the use of the flexible circuit board, the mounted electronic device, or the like. However, since the bending structure of the present invention has excellent bending durability, even in the case of adopting the second policy In addition, it is not necessary to perform wiring in a direction orthogonal to the ridge line in the opposite curved portion in order to reduce the bending stress on the wiring, for example, in a direction orthogonal to the slanting line of the hinge portion, that is, Wiring at a minimum minimum distance is required. Fig. 4 (a) and (b) show a flexible circuit board used for, for example, a hinge portion of a mobile phone, and a resin layer 1, a wiring 2 formed of a metal foil, and a terminal 3 of a connector. . In any of Figs. 4(a) and 4(b), the position of the ridge line L in the curved portion is displayed near the center, and the ridge line L has a [100] axis direction with respect to the metal foil forming the wiring 2 (90 + α) ° angle. Here, Fig. 4(a) shows an example in which wiring is formed obliquely in the middle of the connector terminals 3 -29 to 201146101 at both ends and in the vicinity of the ridge line L, but it may be as shown in Fig. 4(b). Wiring is performed between the connector terminals 3 at the shortest distance. In the case where the position of the ridge line L in the curved portion is fixed, the ridge line L in the curved portion such as a slide type mobile phone may be moved to slide and slide as in a folding mobile phone. (The thick arrow direction recorded in Figure 4(b)). In the flexible circuit board of the present invention, the wiring layer made of a metal foil is provided on at least one surface of the resin layer. However, it is also possible to provide a metal foil on both surfaces of the resin layer as needed. As described above, the metal foil which constitutes the wiring in the curved portion when the flexible circuit board is bent is a metal foil which is formed to have a high degree of alignment and is elongated in the principal stress and the main deformation direction. When a high-bending reverse bending having a small bending radius is performed, local stress concentration due to crystal anisotropy is less likely to occur, and two effects such as dislocation accumulation are less likely to occur, and metal fatigue is less likely to occur. Durability against stress and deformation is not restricted by the design of the flexible circuit board, and it has strength that can withstand bending even if it is repeatedly bent or has a small radius of curvature, and has excellent flexibility. Circuit board. [Examples] Hereinafter, the present invention will be more specifically described based on examples and comparative examples. The type of the copper foil used in the examples and the like and the synthesis of the polyaminic acid solution are as follows: [copper foil A] -30- 201146101 A commercially available rolled copper foil having a purity of 99.9% and a thickness of 9 μm. [Copper foil 市] Commercially available electrolytic copper foil, purity 99.9%, thickness 9 μηι. [Copper foil C] Oxygen-free copper foil, purity 99.99%, thickness 9μηι, process conditions Α. Mass ppm oxygen: 2, silver: 18, phosphorus: 2.1, sulfur expansion: 4, iron: 1.5 [copper foil D] refined copper foil, purity 99.999%, thickness 9 μιη, process condition A. Mass ppm oxygen: 2, silver: 5, phosphorus: 〇. 〇 1, sulphur: 0.01, iron 0.002 [copper foil E] refined copper foil, purity 99.9999%, thickness 9 μιη, process condition A. Mass ppm oxygen: <1, silver: 0.18, phosphorus: <〇.〇〇5, sulfur: <0.005, iron: 0.002 [copper foil F] refined copper foil, purity 99.9999%, thickness 9 μm , process conditions β, mass ppm oxygen: <1, silver: 0.18, phosphorus: <〇.〇〇5, sulfur: <0.005, iron: 0.002 -31 - 201146101 [copper foil G] refined copper Foil, purity 99.9999%, thickness 9μιΏ, process condition C. Mass ppm oxygen: <1, silver: 0.18, phosphorus: <0.005, sulfur: <0.005, iron: 0.002 [copper foil 市] Commercially available rolled copper foil, purity 99.9%, thickness 12 μιη. [Method for Producing Copper Foil] Copper foil crucible and copper foil crucible are commercially available leg-stretched copper foil, and copper foil crucible is a commercially available electrolytic copper foil produced by a copper sulfate bath. These copper foils, which are commercially available as high-bend products, have a purity of 99.9%, which is higher in the case of commercial products. The copper foil C to the copper foil G are processed by the inventors of the present invention, and the copper material of a predetermined purity is cast and solidified in a graphite mold, and is subjected to calendering to form a predetermined thickness. The thickness of the ingot is 10 mm, and after the cold rolling is reduced to 1 mm, the copper foil C, the copper foil D, and the copper foil E are subjected to cold pressing after being blunt at 300 ° C for 30 minutes. Extend to 9μπι (process condition A). Further, the copper foil F is subjected to cold rolling ('process condition Β) until the intermediate blunt is performed until 9 μm. Further, the copper foil G is subjected to cold rolling at a temperature of 80 ° C to 80 μm (process condition C) [synthesis of a polyaminic acid solution] -32-201146101 (Synthesis Example 1) A reaction vessel equipped with a thermocouple and a stirrer and capable of introducing nitrogen was placed in N,N-dimethylacetamide. In the reaction vessel, 2,2-bis[4-(4-aminophenoxy)phenyl]propane (BAPP) was stirred while being stirred in a vessel. Next, pyromellitic dianhydride (PMDA) was added. The input was carried out in such a manner that the total amount of monomer input was 1 5 w t%. Thereafter, stirring was continued for 3 hours to obtain a resin solution of polyamic acid a. The resin solution of the polyamic acid a had a solution viscosity of 3,000 cps. (Synthesis Example 2) N,N-dimethylacetamide was placed in a reaction vessel equipped with a thermocouple and a stirrer and capable of introducing nitrogen. 2,2'-Dimethyl-4,4'-diaminobiphenyl (m-TB) was introduced into the reaction vessel. Next, 3,3·,4,4·-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA) were added. The total amount of the monomer input was 15 wt%, and the molar ratio of each acid anhydride (BPDA: PMDA) was 20:80. Thereafter, stirring was continued for 3 hours to obtain a resin solution of poly-proline b. The solution viscosity of the resin solution of the polyaminic acid b was 20,000 cps 0 [Example 1] The above-mentioned prepared polyaminic acid solution a was applied to seven kinds of copper foils of copper foil A to copper foil G to make it Drying (forming a thermoplastic polyimide having a film thickness of 2 μm after hardening), coating the polyphthalic acid b thereon and drying it (curing to form a low thermal expansion polyimine having a film thickness of 9 μm), and additionally Coated with polyfluorene-33- 201146101 Amine acid a and dried (hardened to form a thermoplastic polyimide having a film thickness of 2 μm), and the load is 5 minutes or more based on the integrated time at a temperature of 300 to 3 60 °C. The heating conditions of the type form a polyimine layer composed of a three-layer structure. Next, the length of the copper foil in the rolling direction (MD direction) is 250 mm, and the direction in which the direction perpendicular to the rolling direction (the TD direction) is a rectangular shape having a width of 150 mm is cut out, as shown in FIG. The single-sided copper-clad laminate 4» having the polyimide layer (resin layer) 1 having a thickness of 13 μm and the copper foil 2 having a thickness of 9 μm was subjected to a tensile modulus of 7.5 GPa.
關於上述所得之單面覆銅層積板4,對銅箔A至銅箔G 之各個銅箔2的壓延面2a使用膠態矽石,在進行機械式、 化學式硏磨後,以EBSP裝置進行方位解析。所使用的裝置 爲日立製作所製的FE-SEM ( S-4100) 、TSL公司製的EBSP 裝置、及軟體(ΟIM A n a 1 y s i s 5 · 2 )。測定領域係約 800μιηχ 1 600μιη的領域,測定時加速電壓20kV、測定階段 間隔4 μιΤι。配向性的評估係以相對箔的厚度方向、及箔的 壓延方向爲< 1 00 >在1 〇°以內的測定點相對全體的測定 點的比例表示。測定數係針對各品種個體不同的5個試料 來實施,將百分率的小數點以下作四捨五入。此外,使用 所得資料,將相鄰結晶粒的方位差爲1 5 °以上者作爲結晶 粒界來進行結晶粒徑的評估,關於多結晶體係求出平均粒 徑。將結果顯示於表1。 -34- 201146101In the single-sided copper-clad laminate 4 obtained as described above, colloidal vermiculite is used for the rolling surface 2a of each of the copper foils A to the copper foils G, and after mechanical and chemical honing, the EBSP apparatus is used. Azimuth resolution. The apparatus used was FE-SEM (S-4100) manufactured by Hitachi, Ltd., EBSP apparatus manufactured by TSL Corporation, and software (ΟIM A n a 1 y s i s 5 · 2 ). The measurement field is in the field of about 800 μm η χ 1 600 μιη, and the acceleration voltage is 20 kV and the measurement interval is 4 μιηι. The evaluation of the orientation is expressed by the ratio of the thickness direction of the foil and the rolling direction of the foil to the measurement point of <1 00 > within 1 〇° with respect to the entire measurement point. The number of measurements was carried out for five different samples of each individual, and the percentage of the decimal point was rounded off. Further, using the obtained data, the crystal grain size was evaluated as a crystal grain boundary when the difference in orientation of adjacent crystal grains was 15 or more, and the average particle diameter was determined for the polycrystalline system. The results are shown in Table 1. -34- 201146101
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備註 比較例 比較例 比較例 實施例 實施例 實施例 比較例 壓延方向的 斷裂伸長 (%) ____ I csi CVJ r— CsJ CO in CO CO 00 CO CO in •ϋΜ 域酿g 圈!龜§ ο OJ o 寸 CSJ ΙΛ r~ r— CO r~ ιο r- r~ 00 r— r- o CsJ r- 彎曲試驗壽命, (次) ί I _I 1050 o o LD 1050 I 1500 1800 1400 1000 S Μ m§ >800 >800 I >800 >800 m CM 8 •m m mvt CD σ> (0 r- σ> CD O) (D 0) 〇 in in 寸 埘Λβ ft8M S V» 寸 0) 严 in 0) in O) l〇 O) CO in 00 寸 純度 (質量%) _ί σ> σ> σ> σ> σ> σ> 99.99 I 99.999 99.9999 99.9999 99.9999 品種 銅箔A 銅箔Β 銅箔c 銅箔D 銅ME 銅箔F 銅箔G -35- 201146101 可知除了銅箔B以外的壓延銅箔均形成有立方體集合 組織,銅箔面方位、壓延方向均具有{00 1} <100〉的主 方位。此係基於經壓延加工的銅箔因聚醯亞胺硬化時的熱 而再結晶,而形成有再結晶集合組織之故。但是,其程度 係依品種而異,相對銅箔A、C、D、及E的立方體方位的 配向性極高。立方體方位的配向度,若爲純度爲99.9%以 上的銅箔,並不依存於其純度,而對銅箔的加工方法的依 存性較大。該等銅箔係在800x1600 μιη的視野中,視野全體 以具有立方體方位之粒體所構成,形成爲在其內部,方位 不同的5μιη以下的結晶粒分散爲島狀的組織。島狀組織的 面積率較小,爲2%以下,因此具有立方體方位的再結晶粒 係具有相同方位而一體化,再結晶粒的大小係在厚度方向 與箔厚同爲9μηι,在箔面內爲800μιη以上。此外,具有銅 箔F、銅箔G的立方體方位的再結晶粒的面積率不高,因此 彼此獨立存在,箔面內的平均粒徑分別爲25μηι、20μιη。 另一方面,電解銅箔Β係平均粒徑1 μιη的多結晶體,幾乎 未發現配向性。 接著,將預定的遮罩被覆在上述所得之單面覆銅層積 板4的銅箔2側,使用氯化鐵/氯化銅系溶液進行蝕刻,如 第6圖所示(其中,配線方向Η與MD方向所成角度爲0° ) ,以線寬(1 )爲150μιη的直線狀配線2的配線方向Η ( Η方 向)與MD方向(<100>軸)呈平行的方式,而且以空間 寬幅(s )爲2 5 0 μηι的方式形成配線圖案。接著,以兼作後 述耐彎曲試驗用的取樣的方式,依據JIS 647 1,獲得沿著 -36- 201146101 電路基板的配線方向Η在長邊方向具有150 mm、在 方向Η呈正交的方向具有寬幅15mm的試驗用可撓性 板5。 使用上述所得之試驗用可撓性電路基板,ί C5016進行MIT彎曲試驗。將試驗的模式圖顯示於| 裝置係使用東洋精機製作所製(STROGRAPH-R1 ) 驗用可撓性電路基板5的長邊方向的一端固定在彎 裝置的夾持夾具,以重物將另一端固定,以夾持部 ,一面以振動速度150次/分鐘的條件左右交替 135±5度,一面以成爲曲率半徑0.8mm的方式使其彎 出電路基板5的配線2的導通被遮斷爲止的次數作爲 數。 在該試驗條件中,以形成在彎曲部的稜線相對 可撓性電路基板5的配線2的配線方向Η呈正交的方 彎曲,因此被施加至銅電路的主應力、主變形係成 延方向呈平行的拉伸應力、拉伸變形。若在彎曲試 由銅箔的厚度方向觀察電路時,確認出在彎曲部的 近,與壓延方向大致垂直發生裂痕而形成斷續線。 壽命的結果顯示於表1。表1的彎曲壽命係按每個銅 類分別準備5個的試驗用可撓性電路基板的結果的平 由表1所示結果可知,彎曲疲勞壽命係取決於 集合組織的集積度,以相同加工方法來製作,配向 致相等的銅箔C、銅箔D、銅箔Ε的彎曲疲勞壽命係 同。 與配線 電路基 S 據 JIS I 7圖。 ,將試 曲試驗 爲中心 旋轉各 曲,求 彎曲次 試驗用 式受到 爲與壓 驗後, 稜線附 將彎曲 箔的種 均。 立方體 度亦大 大不相 -37- 201146101 接著,爲了調查彎曲壽命的支配因子,與彎曲的主應 力、主變形方向、亦即壓延方向呈平行地進行拉伸試驗。 爲了調查銅箔單體的特性,由蝕刻前的單面覆銅層積板4 將樹脂層溶解,進行以銅箔單體的拉伸試驗。確認出在將 聚醯亞胺溶解的過程中,在銅箔的組織沒有改變。 拉伸試驗係使用朝銅箔的壓延方向(MD方向)切出 成長度1 50mm、在箔面內朝與該壓延方向呈正交的方向切 出成寬幅l〇mm的試料,朝長度方向以標點間距離l〇〇mm' 拉伸速度l〇mm/min.進行測定。測定時係按每種銅箔的種 類分別準備7個試料,將測定該等所求出的斷裂應力(斷 裂強度)、及斷裂伸長的平均値顯示於表1。 結果,在集合組織發達的銅箔中,可知並非爲斷裂強 度,而是斷裂伸長與彎曲疲勞壽命具有相關。此外,銅箔 B係強度、斷裂伸長均大,但是此係反映出爲結晶粒的微 細的多結晶體。但是,銅箔B由於集合組織不發達,因此 疲勞壽命較差劣的結果。此外,若將立方體集合組織的集 積度爲同等的純度99.99%的銅箔C與純度99.999%的銅箔D 相比較,對銅箔D的彎曲的疲勞特性較大,而成爲優異的 結果。該2個銅箔的氧濃度相同,內部的氧化銅的分散量 亦小,由於爲同等,並非爲因氧化銅所致之差,而是因純 度不同而造成斷裂伸長之差所致者。 以上,由實施例1所示結果可知,爲了獲得比一般的 高彎曲用銅箔更爲良好的特性,必須基本結晶軸< 1 〇〇 > 相對金屬箔的厚度方向、及存在於箔面內的某一方向的2 -38- 201146101 個正交軸,以各自方位差ιο°以內的優先配向領域以面積 率計佔有50%以上的方式具有主方位,而且,相對由彎曲 部中的稜線朝金屬箔的厚度方向切開的配線的剖面P的法 線方向的金屬箔的斷裂伸長爲3.5 %以上。此外,可知純度 極高爲99.9 99%以上,而且使立方體方位發達,而形成爲 斷裂伸長提升,對在其方向施加主應力、主變形的反覆彎 曲,疲勞壽命較長的可撓性電路基板。 〔實施例2〕 接著,關於使用以與實施例1相同的方法所製作的銅 箔A與銅箔E的單面覆銅層積板,如第6圖所示,線寬(1 ) 150μηι的直線狀的配線2的配線方向Η ( Η方向)相對MD方 向(〔1〇〇〕軸)具有30°及45°的角度,而且以空間寬幅 (〇 2 5 Ομηι形成配線圖案。接著,以兼作後述耐彎曲試驗 用的取樣的方式,依據JIS 6471,獲得沿著電路基板的配 線方向Η朝長邊方向具有150mm、朝與配線方向Η呈正交的 方向具有寬幅15 mm的試驗用可撓性電路基板5。第6圖係 以試驗用可撓性電路基板5的配線方向Η與MD方向所成角 度以4 5 °的角度切出時之例。 針對上述所得之試驗用可撓性電路基板5,以與實施 例1相同的條件實施反覆彎曲的疲勞試驗。此外,以試驗 用可撓性電路基板5的配線方向Η與MD方向所成角度成爲 相同的方式,由蝕刻前的單面覆銅層積板4將樹脂層溶解 ,使用以長邊方向相對壓延方向具有30°及45°的角度的 -39- 201146101 方式所切出的150mmxl0mm的試料 行拉伸試驗。亦即,銅箔的疲勞試 方向係與拉伸試驗的拉伸方向相一 方體集合組織均高度發達’因此在 ,在相同的結晶方位受到主變形與 拉伸試驗的結果顯示於表2 ° 質施例1同樣地進 驗中的主應力、主變形 致,銅箔A與銅箔E的立 疲勞試驗與拉伸試驗中 主應力。將疲勞試驗、 -40- 201146101 【S】 帐遐繼毹#5?截眯煺盤緘112£^«筮||却绷咛招链||钜坡111^¾ 備註 實施例 實施例 實施例 實施例 斷裂伸長 (%) 〇 r— ο to r- (D CD 斷裂強度 (MPa) 00 r- r- 125 ! 115 118 彎曲試驗壽命 (次) 2200 2000 3800 3200 配線方向與壓延方向1 所成角度(° ) J Ο CO in 寸 ο CO ιο 寸 品種 銅箔A 銅箔A 銅箔Ε 銅范Ε ε: -41 - 201146101 由表2所示之試驗結果,藉由使主應力、主變形方向 錯開<100>方位,可得較高疲勞特性。在該等方位中, 斷裂伸長亦明顯大於< 1 〇 〇 >方位,尤其在3 0。的情形, 與斷裂伸長均會疲勞壽命變長。 由以上實施例2的結果可知,在相對高變形的反覆彎 曲的可撓性電路基板的疲勞壽命、與構成配線的銅箔的斷 裂伸長之間,若銅箔高度配向時,具有高相關。如在實施 例1中所見,在多結晶體中,可得更高的強度與延性,但 是在高彎曲用途中並非有效。因此,如上所示之疲勞壽命 、與具有高度集積的集合組織的條件下的斷裂伸長的關係 係由滑移系統擔任重要的角色,並非限於銅,即使爲具有 相同滑移系統的面心立方方位金屬亦成立者,若爲層積缺 陷能量不同的金屬,預估斷裂伸長亦取得更大,可期待疲 勞壽命亦變大。 〔K施例3〕 在純度99.9mass%、厚度12μιη的壓延銅箔Η塗佈以與 合成例1相同的方法所準備的聚醯胺酸溶液a而使其乾燥( 硬化後形成膜厚2μιη的熱塑性聚醯亞胺),且在其上塗佈 聚醯胺酸b而使其乾燥(硬化後形成膜厚8μηι的低熱熱膨脹 性聚醯亞胺),另外在其上塗佈聚醯胺酸a而使其乾燥( 硬化後形成膜厚2μίη的熱塑性聚醯亞胺),如下列條件a〜 d所示,經由最高溫度1 80〜24 0°C的溫度以積算時間計爲 負荷1 〇分的加熱條件而形成聚醯亞胺層(樹脂層)° -42- 201146101 接著,以成爲沿著銅箔的壓延方向(MD方向)長度 250mm、以相對壓延方向呈正交的方向(TD方向)爲寬幅 15 0mm的長方形尺寸的方式切出,而得具有厚度Ι2μιη之聚 醯亞胺層(樹脂層)1與厚度12μηι之銅箔2的實施例3之單 面覆銅層積板4。 在上述所得單面覆銅層積板4的銅箔側覆蓋預定的遮 罩,使用氯化鐵/氯化銅系溶液進行蝕刻,根據IPC規格, 形成線寬150μηι及空間寬幅2 5 0 μιη之具有直線狀配線的低 速IPC試驗用配線2。在該製造過程中,將聚醯亞胺層形成 時的加熱條件的最高溫度設爲180°C (條件a) 、20(TC (條 件b ) 、22 0°C (條件c )、及240°C (條件d )等4個水準, 此外,以具有直線狀的配線2的配線方向(Η方向)相對壓 延方向(MD 方向)呈 0。 、2。 、2.9。 、5.7。 '9.5。、 11.4° 、 14〇 、 18.40 、 25° 、 26.6〇 、 30° 、 40〇 、 450 、 55° > 60° ' 63.4° 、 78.6° 、 80° ' 82.9° 、 87.1° 、 88° 、及90°的22水準的角度的方式,分別形成配線圖案。 接著,如第8圖(b )所示,在各自的配線圖案側的面 ,使用環氧系接著劑,層積覆蓋材7 (有澤製作所製 CVK-0515KA :厚度12·5μιη )。由接著劑所構成的接著層6 的厚度係在沒有銅箔電路的部分爲15 μιη,在存在銅箔電路 的部分爲6μηι。接著,以沿著配線方向(Η方向)在長邊 方向成爲15cm、在與配線方向呈正交的方向成爲寬幅8mm 的方式作切出,而獲得用以形成爲IPC試驗取樣的試驗用 可撓性電路基板。 -43- 201146101 另一方面,爲了調查銅箔單體的特性,如以下所示進 行拉伸試驗。以上述試驗用可撓性電路基板5的配線方向Η 與MD方向所成角度的關係同爲22水準的方式,由蝕刻前 的單面覆銅層積板4將樹脂層溶解而形成爲銅箔單體,備 妥以長邊方向相對壓延方向具有上述22水準的角度的方式 所切出的長度150mmx寬幅10mm的矩形試料。此時,確認 出在將聚醯亞胺溶解的過程中,在銅箔的組織沒有改變。 拉伸試驗係朝長度方向以標點間距離1 〇〇mm、拉伸速度 1 0 m m / m i η.進行測定。 此外,以用以進行藉由EBSP所爲之組織解析的試料而 言,針對以條件a〜d的熱處理條件所製作的單面覆銅層積 板,製作出以相對壓延方向爲0° 、2.9° 、30° 、63.4° 、 及78.6°的5個角度所切出的沒有配線圖案的試料合計20枚 。爲了備齊IPC試驗取樣與熱履歷,以與電路形成蝕刻相 同的條件施加模擬的熱處理,另外以相同的條件層積覆蓋 材。但是,對銅箔組織的該等影響輕微,依聚醯亞胺形成 時的條件a〜d的熱處理條件來決定銅箔組織係在之後判明 〇 接著,將具有如上所述EBSP測定用所製作的4個水準 的熱處理條件、及5個水準的角度條件的20枚銅箔Η朝基板 厚度方向硏磨,具有與硏磨前的箔面呈水平的面,而使銅 箔Η的箔面露出。另外使用膠態矽石來進行最後硏磨,以 EBSP來評估銅箔Η的組織。測定領域爲〇.8mmx 1 .6mm,測 定間隔係設爲4μπι。亦即,1領域的測定點數爲80000點。 -44 - 201146101 結果,可知以條件a至條件d的熱處理條件進行熱處理後的 試料係均形成有立方體集合組織,朝銅箔面方位、壓延方 向具有{001} <1〇〇>的主方位。接著’根據所得的結果 ,相對銅箔的厚度方向與壓延方向’將單位晶格軸< 0 0 1 >成爲1 0。以內的點的數量進行計數’計算出對全體點數 的比例,求出平均値。將其結果顯示於表3 °相同加熱條 件中的試料間的不均爲1 %以下’以相同的熱處理條件’係 可謂爲遍及銅箔全面具有表3所示的集積度。可知最高熱 處理溫度愈高、熱履歷愈大’再結晶愈會進行’立方體再 結晶集合組織的集積度愈高。此外’進行箔面內的方位解 析的結果,以相對壓延方向爲V ' 2.9° 、30° 、63.4° 、 及7 8.6 °的5個角度所切出的試料的切出方向的主方位係具 有'〔100〕、〔20 10〕、〔40 23 0〕、〔120〕、〔150 〕,大致如預定所示。另一方面,使用所得的EBSP資料, 進行將相鄰結晶粒的方位差爲1 5 °以上者解析爲結晶粒界 之由箔面法線方向觀看時的結晶粒徑的評估,針對多結晶 體求出平均粒徑。將結果顯示於表3。 【表3】 銅箔的厚度方向與壓延方向的<001〉集積度、及結晶粒徑 加熱條件 箔的厚度方向 壓延方向 再結晶粒的粒徑 (Aim) 條件a 46% 49% 20 條件b 50% 50% 25 條件c 75% 85% 200 條件d 98% 99% >800 -45- 201146101 IPC試驗係在第8圖中如其模式圖所示,將屬於行動電 話等所使用之彎曲形態之一的滑移彎曲進行模擬後的試驗 。IPC試驗係如第8圖所示,以所決定的間隙長8設置彎曲 部,以固定部9固定單側,使相反側的滑移運轉部1 〇如圖 所示作反覆往返運動的試驗。因此,在按照作往返運動的 部分的行程量的領域中,基板係受到反覆的彎曲。在本實 施例中,將聚醯亞胺層(樹脂層)1設爲外側,將間隙長 設爲1mm、亦即彎曲半徑設爲0.5mm、行程設爲38mm而使 其作反覆滑移來進行試驗。在試驗中,進行試驗用可撓性 電路基板的電路的電阻的測定,以電阻的增加來監測銅箔 電路的疲勞裂痕的進展程度。在本實施例中,將電路的電 阻達至初期値的2倍的行程次數設爲電路斷裂壽命。 試驗係有關上述的條件a〜條件d的4個熱處理條件, 針對形成有具有22水準的角度的配線圖案的合計88水準來 進行。在各自的試驗水準中,係針對4個試驗片進行測定 ,求出電路斷裂後的行程次數的平均。針對電路斷裂壽命 後的銅箔,若以掃描型電子顯微鏡來觀察與滑移方向呈正 交而將銅箔朝厚度方向切開的剖面時,觀察到雖有程度上 的差異,但是在樹脂層側及覆蓋材側的各個的銅箔表面係 發生裂痕’尤其在相當於彎曲部的外側的樹脂層側的銅箔 表面被導入多數個裂痕。 將各水準的電路斷裂濞命的平均値、及拉伸試驗中的 斷裂伸長顯示於表4。在表4的角度欄位,關於電路的長度 -46- 201146101 方向(配線方向)、亦即由彎曲部中的稜線朝厚度方向切 開時的配線的剖面p,僅在成爲低指數方向的情形亦顯示 面指數。 【表4】 IPC試驗中的疲勞壽命與斷裂伸長 Η方向與MD方向 所成角度 (剖面Ρ的面指數) 條1 牛a 條件b 條 件C 條, 牛d 斷裂壽命 (次) 斷裂伸長 (%) 斷裂壽命 (次) 斷裂伸長 (%) 斷裂壽命 (次) 斷裂伸長 (%) 斷裂壽命 (次) 斷裂伸長 (%) 0° (100) 15200 3.5 16500 3.2 28600 2.9 32900 2.8 2〇 14900 4.8 16500 3.4 28500 3.3 34100 3.2 2.9° 〔20 10) 15100 4.9 20200 3.6 30500 3.6 48200 3.5 5.7。 (10 1 0) 14800 4.7 21000 3.9 33000 3.9 49100 4.0 9.5。 (610) 15000 4.6 22500 4.5 33500 4.5 49900 4.6 11.4。 (510) 14700 4.9 25800 4.8 38000 4.9 54200 5.0 14。 (410) 15600 4.7 25600 5.6 39000 7.2 58400 7.5 18.4。 (310) 14200 4.7 26200 5.7 38400 7.5 59800 8.2 25。 15200 4.6 27000 6.0 38900 7.6 58900 9.0 26.6° (210) 14100 4.8 27200 6.1 43000 7,8 62500 9.1 30。 14900 5.2 27500 6.2 45100 8.0 65900 11 40° 14000 4.5 27100 6.0 43100 7,9 63000 8.6 45。 (110) 13800 4.7 26900 5.8 42900 6.8 62600 7.1 55° 12800 4.8 27000 6.0 43500 7.0 62200 8.1 60。 13800 5.0 27200 6.3 44900 8.7 65000 11.1 63.4° (120) 13400 4.9 24900 6,0 42500 8.0 62000 9.0 78.6° (150) 12500 4.7 24800 5.8 39000 4.5 58200 4.8 80。 12800 4.6 20200 5.9 32500 4.2 48900 4.2 82.9。 (180) 12700 4.5 19900 4.6 32400 3.8 46800 3.7 87.1。 (1 20 0) 13000 4.5 18900 4.7 32200 3.8 45000 3.5 88° 13000 4.0 15800 3.4 28000 3.3 31000 3.0 90。 (010) 12900 3.0 15900 3.3 27900 2.7 30900 2.5 可知IPC試驗中的斷裂壽命(疲勞壽命)係大幅取決 於電路長度方向(H方向)與壓延方向(MD方向)所成角 -47- 201146101 度、亦即由彎曲部中的稜線朝厚度方向切開時的配線剖面 的法線方向與〔1 〇〇〕所成角度。該方位依存性係在條件b 、條件c、及條件d下顯現,立方體方位的集積度愈高,對 反覆彎曲的疲勞壽命愈大,此外,方位依存性愈大。關於 該方位依存性,確認出對金屬箔的厚度方向,以銅的〔 〇〇1〕在方位差10°以內的領域藉由EBSP法所爲之評估而 佔有面積比50%以上的方式,<001〉主方位朝金屬箔的厚 度方向作優先配向,並且以由銅的〔1〇〇〕軸在方位差 10°以內的領域以藉由EBSP法所爲之評估而佔有面積比 50 %以上的方式,〔100〕主方位在金屬箔面內作優先配向 時所顯現。尤其可知,在厚度方向及壓延方向分別表示面 積比75%以上、及85%以上而立方體方位的集積度較高的 條件c的情形下,疲勞壽命大,而且方位依存性的效果大 ,而在厚度方向及壓延方向分別表示面積比9 8%以上、及 99 %以上而立方體方位的集積度極高的條件d下,疲勞壽命 更大、方位依存性的效果更大。 若詳加檢討條件b、條件c、及條件d的結果時,由彎 曲部中的稜線朝厚度方向切開時的配線剖面P的法線方向 、亦即主應力方向由銅箔的<100>主方位偏移者,在相 對彎曲的電路的疲勞壽命較高。在本實施例之IPC試驗中 ,看到效果的是相對彎曲部的主變形方向,亦即相對由彎 曲部中的稜線朝厚度方向切開時的配線的剖面法線方向, 具有2.9°〜8 7.Γ的角度的情形時。若以面指數表示之, 由彎曲部中的稜線朝厚度方向切開時的配線的剖面P係以 -48- 20 201146101 向 的 若 時 ( 的 開 時 數 過 0 構 方 位 方 的 裂 的 優 斷 性 〔〇〇1〕爲晶帶軸’由(20 1 〇)通過(lio)而至(1 〇)的範圍。其中效果較大者係相對彎曲部的主變形方 ’亦即相對由彎曲部中的稜線朝厚度方向切開時的配線 剖面法線方向,具有1 i · 4。〜7 8.6。的角度的情形時。 以面指數來表示之,由彎曲部中的稜線朝厚度方向切開 的配線的剖面P係以〔〇 〇 1〕爲晶帶軸,由(5 i 〇 )通過 1 1 〇 )而至(1 5 0 )的範圍。彎曲特性係另外相對彎曲部 主變形方向’亦即相對由彎曲部中的稜線朝厚度方向切 時的配線的剖面法線方向,具有2 6.6。〜6 3 · 4。的角度 會變高’最爲優異的是30°與60。的情形時。若以面指 來表示之,剖面P係以〔0 0 1〕爲晶帶軸,由(2 1 0 )通 (11〇)而至(120)的範圍,最爲優異的是位於(40 23 )及(2 3 4 0 0 )附近時。 當將該等結果與斷裂伸長作比較時,可知面心立方 造的單位晶格的基本結晶軸< 1 〇〇 >相對金屬箔的厚度 向、及存在於箔面內的某一方向的2個正交軸,各自方 差10°以內的優先配向領域以面積率計佔有50%以上的 式,具有主方位時,若相對由彎曲部中的稜線朝金屬箔 厚度方向切開的配線的剖面P的法線方向的金屬箔的斷 伸長爲3.5%以上,相對在其方位使主應力、主變形發生 彎曲,具有良好的彎曲疲勞特性。另一方面,< 1 00 > 先配向領域的面積率爲49%以下時,即使顯示其方向的 裂伸長爲3 .5%以上的値,亦無法獲得良好的彎曲疲勞特 -49- 201146101 〔實施例4〕 在純度99.99%的銅箔C在Ar氣流中以180°C〜400°C之5 個水準的溫度施加30分鐘的熱處理(預備熱處理),以與 實施例1相同的方法塗佈聚醯胺酸溶液a,且使其乾燥(硬 化後形成膜厚2μιη的熱塑性聚醯亞胺),在其上塗佈聚醯 胺酸b,且使其乾燥(硬化後形成膜厚9μηι的低熱熱膨脹性 聚醯亞胺),另外在其上塗佈聚醯胺酸a,且使其乾燥( 硬化後形成膜厚2μηι的熱塑性聚醯亞胺),經由300〜 360°C的溫度以積算時間計爲負荷5分以上之類的加熱條件 而形成由3層構造所構成的聚醯亞胺層。接著,沿著銅箔 的壓延方向(MD方向)成爲長度250mm、朝相對壓延方 向呈正交的方向(TD方向)成爲寬幅〗50mm的長方形尺寸 的方式進行切出,如第5圖所示,獲得具有厚度13 μπι的聚 醯亞胺層(樹脂層)1與厚度9μϊη的銅箔2的單面覆銅層積 板4。此時的樹脂層全體的拉伸彈性率爲7.5 GPa。 關於上述所得之單面覆銅層積板4,對銅箔2的壓延面 2a使用膠態矽石,在進行機械式、化學式硏磨後,利用 EBSP裝置進行方位解析。所使用的裝置爲日立製作所製的 FE-SEM ( S-4 100) 、TSL公司製的EBSP裝置、及軟體( OIM Analysis 5.2)。測定領域爲約 8 0 0 μιη χ 1 6 0 0 μιη 的領域 ,測定時加速電壓20kV、測定階段間隔4μηι。配向性的評 估係相對箱的厚度方向、及箱的壓延方向,以<100>在 1 0°以內的測定點相對全體的測定點的比例來表示。測定 -50- 201146101 數係針對各品種個體不同的5個試料實施,將百分率的小 數點第2位以下作四捨五入。此外,使用所得的資料,將 相鄰結晶粒的方位爲爲1 5。以上者作爲結晶粒界來進行結 晶粒徑的評估’關於多結a妒步屮 尔口曰日體不出平均粒徑。將結果顯示 於表5。 -51 - 201146101 【s^】 備註 比較例 比較例 實施例 實施例 實施例 比較例 壓延方向的 斷裂伸長 (%) <N CO CVJ CO ιο CO CO CO ι- ΟΟ 壓延方向的 斷裂強度 (MPa) l〇 r- r~ l〇 v T— iO r~ t— 卜 r- τ— 10 r" τ— ιο ο ι— 彎曲試驗壽命 (次) o m o T- o o 产 t— o o 寸 Ο ο (0 τ— Ο ο 00 τ— ο ο τ— S m >800 >800 >800 >800 >800 >800 ρ,Μ •ES mvt, 0) (D 0) IT) 卜 σ> 00 σ) (Ν 0) σ> ω 0) σ> ο 6 ο 1^ 鹄 its S V 漶SS T- 10 0) σ) CO σ> ο 00 0) ο 0) σ> ιη σ> 0) 0) σ> σ> 預備熱處理 溫度 ro 摧 ο 00 ο 〇 04 2 5 0 ο ο C0 〇 〇 寸 -52- 201146101 可知銅箔C均形成有立方體集合組織,銅箔面方位、 壓延方向均具有{001} <1〇〇>的主方位。此係因爲經壓 延加工的銅箔藉由預備熱處理與聚醯亞胺硬化時的熱而再 結晶’而形成有再結晶集合組織之故。在此,預備熱處理 溫度愈局’ {001} <1〇〇>的配向度愈大。此外,<100 >方位以外的方位係與上述同樣地經EBSP裝置確認結果, 相對壓延方向具有<212〉的方位,相當圓的直徑爲5 μιη以 下的再結晶殘留方位分散成島狀。但是,在以4 0 0。(:進行 預備熱處理的銅箔中,幾乎沒有發現如上所示之島狀的組 織。其中,經確認的島狀組織的面積率較小,爲2%以下, 因此具有立方體方位的再結晶粒係具有相同的方位而—體 化。此外’再結晶粒的大小係在厚度方向與箔厚同爲9 μηι ,在箱面內爲800μπι以上。 接著’將預定的遮罩被覆在上述所得之單面覆銅層積 板4的銅箔2側,使用氯化鐵/氯化銅系溶液進行蝕刻,如 第6圖所示(但是配線方向Η與M D方向所成角度爲0 ° ), 以線寬(1 )爲150μηι的直線狀配線2的配線方向Η ( Η方向 )與MD方向(< 1〇〇>軸)呈平行的方式,而且以空間寬 幅(s )爲250μιη的方式形成配線圖案。接著,以兼作後述 耐彎曲試驗用的取樣所示,依據JIS 6471,得到沿著電路 基板的配線方向Η,朝長邊方向具有1 5 〇mm、與配線方向Η 呈正交的方向具有寬幅1 5mm的試驗用可撓性電路基板5。 使用上述所得之試驗用可撓性電路基板,依據jIS C501 6進行MIT彎曲試驗。將試驗的模式圖顯示於第7圖。 -53- 201146101 裝置係使用東洋精機製作所製(STROGRAPH-Rl ),將試 驗用可撓性電路基板5的長邊方向的一端固定在彎曲試驗 裝置的夾持夾具,將另一端以重物固定,以夾持部爲中心 ,一面以振動速度150次/分鐘的條件左右交替各旋轉 135±5度,一面以成爲曲率半徑0.8mm的方式使其彎曲,求 出電路基板5的配線2的導通被遮斷爲止的次數作爲彎曲次 數。 在該試驗條件中,以形成在彎曲部的稜線相對試驗用 可撓性電路基板5的配線2的配線方向Η呈正交的方式受到 彎曲,因此施加於銅電路的主應力、主變形係成爲與壓延 方向呈平行的拉伸應力、拉伸變形。在彎曲試驗後由銅箔 的厚度方向觀察電路時,確認出在彎曲部的稜線附近,以 與壓延方向大致垂直發生裂痕而發生斷續線。彎曲壽命的 結果顯示於表5。表5的彎曲壽命係按每個銅箔的預備熱處 理溫度分別準備5個的試驗用可撓性電路基板的結果的平 均。由表5所示結果可知,彎曲疲勞壽命係立方體集合組 織的集積度爲98.0%以上、99.8%時特別變大。 接著,爲了調查彎曲壽命的支配因子,與彎曲的主應 力、主變形方向、亦即壓延方向呈平行地進行拉伸試驗。 爲了調查藉由預備熱處理溫度所得之銅箔單體的特性’由 蝕刻前的單面覆銅層積板4將樹脂層溶解,進行以銅箔單 體的拉伸試驗。確認出在將聚醯亞胺溶解的過程中’在銅 箔的組織沒有產生變化。 拉伸試驗係使用朝銅箔的壓延方向(MD方向)切出 -54- 201146101 成長度1 50mm、朝箔面內垂直方向切出成寬幅10mm的試料 ’以標點間距離10 〇 m m、朝長度方向以拉伸速度 10mm/min.進行測定。在測定時係按每個銅箔的預備熱處 理溫度分別準備7個試料,將測定該等所求出的斷裂應力 (斷裂強度)、及斷裂伸長的平均値顯示於表5。 與至此爲止的結果相反地,斷裂伸長係在< 1 〇〇 >集 積度(% )爲9 8.0 %以上、9 9 · 8 %以下的領域中,每當集稹 度增加即會變大。另一方面,在島狀組織已消失的銅箔中 ’斷裂伸長變小。此係被推測爲滑移面所相關者。由以上 確認出斷裂伸長與彎曲疲勞壽命具有強相關。亦即,可知 < 1 0 0 >集積度(% )爲9 8.0 %以上9 9.8 %以下的集合組織 高度發達、而且斷裂伸長爲3.5 %以上,彎曲疲勞壽命會變 大。 另一方面,利用以相同條件含有氧0.03 5質量%、純度 99.9%的精銅以相同條件製作銅箔而以相同條件實施試驗 ’結果即使< 1 〇〇 >集積度(% )爲98.0%以上亦同樣地, 斷裂伸長係隨著集積度變大而減少,並未獲得3.5 %以上的 銅箔,且未獲得1 000次以上的疲勞壽命。 〔產業上可利用性〕 本發明之可撓性電路基板係可在各種電子電氣機器中 被廣泛使用,電路基板本身折曲、或扭彎、或按照所裝載 的機器的動作而變形,在任一者均適於具有彎曲部來加以 使用。尤其,本發明之可撓性電路基板係具有彎曲耐久性 -55- 201146101 佳的彎曲部構造,因此適於當伴隨著滑動彎 、鉸鏈彎曲、滑移彎曲等反覆動作而頻繁折 與所裝載的機器小型化相對應,而形成圖求 的彎曲部時。因此,以被要求耐久性的薄型 型顯示器、硬碟、印表機、DVD裝置爲首, 各種電子機器。 【圖式簡單說明】 第1圖係表示立方晶格系的結晶構造中 晶帶軸爲中心作旋轉所得的面的關係圖。 第2圖係(1 00 )標準投影圖的立體三角 第3圖係顯示使可撓性電路基板彎曲的 明圖。 第4圖係顯示可撓性電路基板中的配線 晶軸的關係的平面說明圖,(a )及(b )係 可撓性電路基板,(c )及(d )係顯示習知 電路基板。 第5圖係單面覆銅層積板的斜視說明圖。 第6圖係顯示在本發明之實施例中由單 獲得試驗用可撓性電路基板的態樣的平面說 第7圖係MIT彎曲試驗裝置的說明圖。 第8圖(a)係IPC彎曲試驗裝置的說明 )係使用在IPC彎曲試驗的試驗用可撓性電 剖面圖。 曲、折曲彎曲 曲時、或爲了 曲率半徑極小 行動電話、薄 可適於利用在 的晶帶軸及以 形。 狀態的剖面說 與金屬箔的結 顯示本發明之 技術之可撓性 面覆銅層積板 明圖。 圖’第8圖(b 路基板的X-X’ -56 - 201146101 【主要元件符號說明】 1 =樹脂層 2 :配線(金屬范) 2a :壓延面 2 b :側面 3 :連接器端子 4:單面覆銅層積板 5 :試驗用可撓性電路基板 6 :接著層 7 :覆蓋材 8 :間隙長 9 :固定部 1 0 :滑移運轉部 2 1 :剖面P的法線方向 L :稜線 P :從彎曲部中的稜線朝厚度方向切開時的配線的剖 面 -57-Remarks Comparative Example Comparative Example Comparative Example Example Example Comparative Example Elongation at break in the direction of rolling (%) ____ I csi CVJ r - CsJ CO in CO CO 00 CO CO in • ϋΜ Domain Brewing g circle! Tortoise § ο OJ o Inch CSJ ΙΛ r~ r— CO r~ ιο r- r~ 00 r— r- o CsJ r- bending test life, (times) ί I _I 1050 oo LD 1050 I 1500 1800 1400 1000 S Μ m§ >800 >800 I >800 >800 m CM 8 •mm mvt CD σ> (0 r- σ> CD O) (D 0) 〇in in inch 埘Λβ ft8M SV» inch 0) strict in 0) in O l〇O) CO in 00 purity (mass%) _ί σ>σ>σ>σ>σ>σ> 99.99 I 99.999 99.9999 99.9999 99.9999 Variety copper foil A copper foil 铜 copper foil c copper foil D copper ME copper foil F Copper foil G-35-201146101 It is understood that the rolled copper foil other than the copper foil B has a cubic aggregate structure, and the copper foil surface orientation and the rolling direction have a principal orientation of {00 1} < 100 >. This is based on the fact that the calendered copper foil is recrystallized by the heat of the polyimine hardening to form a recrystallized aggregate structure. However, the degree varies depending on the species, and the orientation of the cube orientation with respect to the copper foils A, C, D, and E is extremely high. The orientation of the cube orientation is such that the copper foil having a purity of 99.9% or more does not depend on the purity thereof, and has a large dependence on the processing method of the copper foil. These copper foils are formed in a field of view of 800 x 1600 μm, and the entire field of view is composed of granules having a cubic orientation, and is formed into a structure in which crystal grains of 5 μm or less having different orientations are dispersed in an island shape. The area ratio of the island-like structure is as small as 2% or less, so that the recrystallized grains having the cube orientation have the same orientation and are integrated, and the size of the recrystallized grains is 9 μm in the thickness direction and the foil thickness, in the foil surface. It is 800 μmη or more. Further, since the area ratio of the recrystallized grains having the cubic orientation of the copper foil F and the copper foil G is not high, they exist independently of each other, and the average particle diameter in the foil surface is 25 μm and 20 μm, respectively. On the other hand, the electrolytic copper foil was a polycrystalline body having an average particle diameter of 1 μηη, and almost no alignment property was observed. Next, a predetermined mask is coated on the copper foil 2 side of the single-sided copper-clad laminate 4 obtained above, and is etched using a ferric chloride/copper chloride-based solution, as shown in Fig. 6 (wherein the wiring direction) Η is at an angle of 0° with respect to the MD direction, and the wiring direction Η (Η direction) of the linear wiring 2 having a line width (1) of 150 μm is parallel to the MD direction (<100> axis), and A wiring pattern is formed in such a manner that the space width (s) is 205 μm. Then, the wiring direction along the -36-201146101 circuit board is obtained in accordance with JIS 647 1, and has a width of 150 mm in the longitudinal direction and a width in the direction orthogonal to the direction Η. A 15 mm test flexible plate 5 was used. The MIT bending test was performed using the test flexible circuit board obtained above, ί C5016. The mode diagram of the test is shown in the apparatus. The end of the long side of the flexible circuit board 5 manufactured by Toyo Seiki Co., Ltd. (STROGRAPH-R1) is fixed to the clamp of the bending device, and the other end is fixed by a heavy object. The number of times the conduction of the wiring 2 bent out of the circuit board 5 is blocked by the radish speed of 135 ± 5 degrees at a vibration speed of 150 times/min. As a number. In this test condition, the ridge line formed in the curved portion is curved orthogonally to the wiring direction Η of the wiring 2 of the flexible circuit board 5, so that the principal stress applied to the copper circuit and the main deformation are delayed. Parallel tensile stress and tensile deformation. When the circuit was observed in the thickness direction of the copper foil, it was confirmed that a crack was formed in the vicinity of the curved portion substantially perpendicularly to the rolling direction to form a broken line. The results of the lifespan are shown in Table 1. The bending life of Table 1 is the result of preparing the test flexible circuit board for each copper. The results of Table 1 show that the bending fatigue life depends on the accumulation degree of the aggregate structure, and the same processing. According to the method, the bending fatigue life of the copper foil C, the copper foil D, and the copper foil which are equal in orientation is the same. And wiring circuit base S according to JIS I 7 diagram. The test piece is rotated around the center of the test, and the bending test is applied. After the test is applied, the ridge line is attached to the curved foil. The degree of the cube is also large. -37- 201146101 Next, in order to investigate the dominant factor of the bending life, the tensile test is performed in parallel with the main stress of the bending, the main deformation direction, that is, the rolling direction. In order to investigate the characteristics of the copper foil monomer, the resin layer was dissolved by the single-sided copper-clad laminate 4 before etching, and a tensile test of the copper foil alone was carried out. It was confirmed that the structure of the copper foil did not change during the dissolution of the polyimide. The tensile test was cut into a length of 150 mm in the rolling direction (MD direction) of the copper foil, and cut into a width of 10 mm in the direction perpendicular to the rolling direction in the foil surface, in the longitudinal direction. The measurement was carried out at a distance between the punctuation points l〇〇mm' tensile speed l〇mm/min. In the measurement, seven samples were prepared for each type of copper foil, and the fracture stress (breaking strength) obtained by the measurement and the average enthalpy of the elongation at break were shown in Table 1. As a result, in the copper foil in which the aggregate structure was developed, it was found that the fracture strength was not related to the fracture strength, but the elongation at break was correlated with the bending fatigue life. Further, the copper foil B has a large strength and a large elongation at break, but this reflects a fine polycrystal which is a crystal grain. However, since the copper foil B is not developed due to the aggregate structure, the fatigue life is inferior. Further, when the copper foil C having an equal aggregate degree of 99.99% and the copper foil D having a purity of 99.999% is compared with the copper foil D having a purity of 99.999%, the bending fatigue property of the copper foil D is large, which is an excellent result. The two copper foils have the same oxygen concentration, and the amount of dispersion of copper oxide in the interior is also small. Since they are equivalent, they are not caused by the difference in copper oxide, but are caused by the difference in the elongation at break due to the difference in purity. As described above, as a result of the first embodiment, in order to obtain better characteristics than the general high-bending copper foil, it is necessary to have a basic crystal axis <1 〇〇> with respect to the thickness direction of the metal foil and the presence of the foil surface. 2 - 38 - 201146101 orthogonal axes in a certain direction within a certain direction, with a priority orientation field within ιο ° within each direction, occupying 50% or more in area ratio, and having a main orientation, and the ridge line in the curved portion The elongation at break of the metal foil in the normal direction of the cross section P of the wiring cut in the thickness direction of the metal foil is 3.5% or more. In addition, it is known that the purity is extremely high at 99.9 99% or more, and the orientation of the cube is developed to form a flexible circuit board in which the elongation at break is increased, and the principal stress and the main deformation are applied in the direction, and the fatigue life is long. [Example 2] Next, a single-sided copper-clad laminate using copper foil A and copper foil E produced in the same manner as in Example 1, as shown in Fig. 6, has a line width (1) of 150 μm. The wiring direction Η (Η direction) of the linear wiring 2 has an angle of 30° and 45° with respect to the MD direction ([1〇〇] axis), and a wiring pattern is formed in a space width (〇25 Ομηι). In the method of sampling for bending resistance test, which is described later, according to JIS 6471, it is possible to obtain a test having a width of 15 mm in the direction of the wiring direction of the circuit board, which is 150 mm in the longitudinal direction and perpendicular to the wiring direction Η. The flexible circuit board 5 is an example in which the angle between the wiring direction Η of the test flexible circuit board 5 and the MD direction is cut at an angle of 45°. The test flexibility obtained above is obtained. The circuit board 5 was subjected to the fatigue test of the reverse bending under the same conditions as in the first embodiment. The angle between the wiring direction Η of the test flexible circuit board 5 and the MD direction was the same, and the single sheet before the etching was used. Copper-clad laminate 4 dissolves the resin layer A tensile test of 150 mm x 10 mm sample cut by a method of -39-201146101 having an angle of 30° and 45° with respect to the direction of rolling in the longitudinal direction is used. That is, the fatigue test direction of the copper foil and the tensile test are performed. In the direction of stretching, the aggregate structure of one body is highly developed. Therefore, the main stress and the main deformation caused by the main deformation and tensile test in the same crystal orientation are shown in Table 2 °. , the main stress of the fatigue test and the tensile test of the copper foil A and the copper foil E. The fatigue test, -40- 201146101 [S] 遐 遐 毹 5 #5? 眯煺 眯煺 缄 £ 112£^«筮|| However, the stretch chain||钜坡111^3⁄4 Remarks Examples Embodiments Example Elongation at break (%) 〇r— ο to r- (D CD breaking strength (MPa) 00 r- r- 125 ! 115 118 Bending test life (times) 2200 2000 3800 3200 Wiring direction and rolling direction 1 angle (°) J Ο CO in inch ο CO ιο inch variety copper foil A copper foil A copper foil 铜 copper fan Ε ε: -41 - 201146101 From the test results shown in Table 2, by shifting the principal stress and the main deformation direction <100> In the orientation, the elongation at break is also significantly greater than the < 1 〇〇> orientation, especially in the case of 30. The fatigue life is longer with the elongation at break. As a result of Example 2, it is understood that there is a high correlation between the fatigue life of the relatively high-deformation curved circuit board which is repeatedly bent and the elongation at break of the copper foil constituting the wiring when the copper foil is highly aligned. As seen in Example 1, higher strength and ductility are obtained in the polycrystalline body, but it is not effective in high bending applications. Therefore, the relationship between the fatigue life as shown above and the elongation at break under conditions of a highly concentrated aggregate structure is an important role for the slip system, not limited to copper, even for the face centered cubic orientation with the same slip system. If the metal is also established, if the metal with different delamination energy is different, the estimated elongation at break is also larger, and the fatigue life can be expected to become larger. [K Example 3] A poly-proline solution a prepared by the same method as in Synthesis Example 1 was applied to a rolled copper foil having a purity of 99.9 mass% and a thickness of 12 μm, and dried (cured to a thickness of 2 μm). a thermoplastic polyimine), which is coated with polyamic acid b and dried (cured to form a low thermal expansion polyimine having a film thickness of 8 μm), and additionally coated with polyglycine a And drying (hardening to form a film thickness of 2 μίη of thermoplastic polyimide), as shown in the following conditions a to d, through the temperature of the highest temperature of 1 80~24 0 ° C in terms of integrated time as a load of 1 〇 Polyimine layer (resin layer) is formed under heating conditions. -42-201146101 Next, the length (TD direction) which is orthogonal to the rolling direction is 250 mm in the rolling direction (MD direction) along the copper foil. The single-sided copper-clad laminate 4 of Example 3 having a polyimine layer (resin layer) 1 having a thickness of μ2 μm and a copper foil 2 having a thickness of 12 μm was obtained by cutting out a rectangular shape having a width of 150 mm. The copper foil side of the single-sided copper-clad laminate 4 obtained above is covered with a predetermined mask, and is etched using a ferric chloride/copper chloride-based solution, and a line width of 150 μm and a space width of 2 5 0 μm are formed according to IPC specifications. The low-speed IPC test wiring 2 having linear wiring. In the manufacturing process, the maximum temperature of the heating condition at the time of forming the polyimide layer is 180 ° C (condition a), 20 (TC (condition b), 22 0 ° C (condition c), and 240 °) 4 levels such as C (condition d), and the wiring direction (Η direction) of the linear wiring 2 is 0 to 0, 2.9, 5.7, 9.5, 11.4 in the rolling direction (MD direction). °, 14〇, 18.40, 25°, 26.6〇, 30°, 40〇, 450, 55° > 60° ' 63.4° , 78.6° , 80° ' 82.9° , 87.1 ° , 88 ° , and 90 ° A wiring pattern is formed in a manner of an angle of 22. Next, as shown in Fig. 8(b), an epoxy-based adhesive is used on the surface on the side of each wiring pattern to laminate the cover material 7 (CVK manufactured by Ozawa Seisakusho Co., Ltd.) -0515KA: thickness 12·5μιη). The thickness of the adhesive layer 6 composed of the adhesive is 15 μm in the portion where the copper foil circuit is not present, and 6 μm in the portion where the copper foil circuit is present. Η direction) is 15 cm in the longitudinal direction and 8 mm wide in the direction orthogonal to the wiring direction The test was carried out to obtain a flexible circuit board for testing which was sampled for IPC test. -43- 201146101 On the other hand, in order to investigate the characteristics of the copper foil monomer, a tensile test was carried out as shown below. The angle between the wiring direction Η of the flexible circuit board 5 and the angle of the MD direction is the same as the level of 22, and the resin layer is dissolved by the single-sided copper-clad laminate 4 before etching to form a copper foil. A rectangular sample having a length of 150 mm x a width of 10 mm cut in a direction in which the longitudinal direction is at a 22-degree angle with respect to the rolling direction is prepared. In this case, it is confirmed that in the process of dissolving the polyimine, in the copper foil The tensile test was carried out in the longitudinal direction at a distance of 1 〇〇 mm between the punctuation marks and a tensile speed of 10 mm / mi η. Further, the sample was subjected to analysis by the EBSP. In the case of the single-sided copper-clad laminate produced by the heat treatment conditions of the conditions a to d, five angles of 0°, 2.9°, 30°, 63.4°, and 78.6° with respect to the rolling direction were produced. Samples without wiring patterns In order to prepare the IPC test sample and the heat history, the simulated heat treatment was applied under the same conditions as the circuit formation etching, and the cover material was laminated under the same conditions. However, the influence on the copper foil structure was slight. The heat treatment conditions of the conditions a to d at the time of formation of the polyimine are determined by the copper foil structure, and then the heat treatment conditions of the four levels prepared by the EBSP measurement described above and the angles of five levels are obtained. The 20 pieces of copper foil of the condition are honed in the thickness direction of the substrate, and have a surface horizontal to the surface of the foil before the honing, and the foil surface of the copper foil is exposed. In addition, colloidal vermiculite was used for final honing, and EBSP was used to evaluate the structure of the copper foil crucible. The measurement area was 〇.8 mm x 1.6 mm, and the measurement interval was set to 4 μm. That is, the number of measurement points in the 1 field is 80000 points. -44 - 201146101 As a result, it was found that the sample obtained by heat treatment under the heat treatment conditions of the condition a to the condition d was formed with a cubic aggregate structure, and the main surface of the copper foil having a surface orientation and a rolling direction of {001} <1〇〇> Orientation. Then, based on the obtained results, the unit lattice axis < 0 0 1 > becomes 1 0 with respect to the thickness direction and the rolling direction of the copper foil. The number of points is counted'. The ratio to the total number of points is calculated, and the average 値 is obtained. The results are shown in Table 3 under the same heating conditions. The ratios between the samples in the same heating conditions are not more than 1%. The same heat treatment conditions are used to provide the total degree of accumulation shown in Table 3 throughout the copper foil. It can be seen that the higher the maximum heat treatment temperature and the higher the heat history, the more the recrystallization proceeds. The higher the degree of accumulation of the cube recrystallized aggregate structure. In addition, as a result of the orientation analysis in the foil surface, the main orientation of the sample cut out at the five angles of V ' 2.9°, 30°, 63.4°, and 7 8.6 ° with respect to the rolling direction has '[100], [20 10], [40 23 0], [120], [150] are roughly as intended. On the other hand, using the obtained EBSP data, the evaluation of the crystal grain size when the orientation difference of the adjacent crystal grains is 15° or more is analyzed as the crystal grain boundary when viewed from the normal direction of the foil surface, and the polycrystalline body is evaluated. The average particle size is obtained. The results are shown in Table 3. [Table 3] The thickness of the copper foil and the [001] accumulation degree of the rolling direction, and the crystal grain size of the heating condition foil. The rolling direction of the recrystallized grain in the thickness direction (Aim) Condition a 46% 49% 20 Condition b 50% 50% 25 Condition c 75% 85% 200 Condition d 98% 99% >800 -45- 201146101 The IPC test system, as shown in the pattern diagram in Fig. 8, will be a curved form used in mobile phones and the like. A slip-bending test was performed after the simulation. In the IPC test system, as shown in Fig. 8, the bent portion was set at the determined gap length 8, and the one side was fixed by the fixing portion 9, and the sliding operation portion 1 on the opposite side was tested as a reciprocating motion as shown in the figure. Therefore, in the field of the stroke amount in the portion for the reciprocating motion, the substrate is subjected to repeated bending. In the present embodiment, the polyimine layer (resin layer) 1 is set to the outside, and the gap length is set to 1 mm, that is, the bending radius is set to 0.5 mm, and the stroke is set to 38 mm to perform the reverse slip. test. In the test, the resistance of the circuit of the flexible circuit board for the test was measured, and the degree of progress of the fatigue crack of the copper foil circuit was monitored by the increase in resistance. In the present embodiment, the number of strokes in which the resistance of the circuit reaches twice the initial enthalpy is taken as the circuit breaking life. In the test, the four heat treatment conditions of the above conditions a to d were carried out for a total of 88 levels of wiring patterns having an angle of 22 levels. In each of the test levels, four test pieces were measured, and the average number of strokes after the circuit was broken was obtained. When the copper foil after the rupture life of the circuit is observed by a scanning electron microscope and the copper foil is cut in the thickness direction perpendicular to the sliding direction, a difference in degree is observed, but on the resin layer side. The surface of the copper foil on the side of the cover material is cracked. In particular, a large number of cracks are introduced into the surface of the copper foil on the resin layer side corresponding to the outside of the curved portion. The average enthalpy of breaking the life of each level circuit and the elongation at break in the tensile test are shown in Table 4. In the angle field of Table 4, the length of the circuit -46 - 201146101 direction (wiring direction), that is, the cross section p of the wiring when the ridge line in the curved portion is cut in the thickness direction is only in the case of the low index direction. Display the face index. [Table 4] The fatigue life and the elongation at break in the IPC test are the angles formed by the MD direction (the surface index of the profile )). Bar 1 Cattle a Condition b Condition C, Cattle d Fracture life (times) Elongation at break (%) Fracture life (times) Elongation at break (%) Fracture life (times) Elongation at break (%) Fracture life (times) Elongation at break (%) 0° (100) 15200 3.5 16500 3.2 28600 2.9 32900 2.8 2〇14900 4.8 16500 3.4 28500 3.3 34100 3.2 2.9° [20 10) 15100 4.9 20200 3.6 30500 3.6 48200 3.5 5.7. (10 1 0) 14800 4.7 21000 3.9 33000 3.9 49100 4.0 9.5. (610) 15000 4.6 22500 4.5 33500 4.5 49900 4.6 11.4. (510) 14700 4.9 25800 4.8 38000 4.9 54200 5.0 14. (410) 15600 4.7 25600 5.6 39000 7.2 58400 7.5 18.4. (310) 14200 4.7 26200 5.7 38400 7.5 59800 8.2 25. 15200 4.6 27000 6.0 38900 7.6 58900 9.0 26.6° (210) 14100 4.8 27200 6.1 43000 7,8 62500 9.1 30. 14900 5.2 27500 6.2 45100 8.0 65900 11 40° 14000 4.5 27100 6.0 43100 7,9 63000 8.6 45. (110) 13800 4.7 26900 5.8 42900 6.8 62600 7.1 55° 12800 4.8 27000 6.0 43500 7.0 62200 8.1 60. 13800 5.0 27200 6.3 44900 8.7 65000 11.1 63.4° (120) 13400 4.9 24900 6,0 42500 8.0 62000 9.0 78.6° (150) 12500 4.7 24800 5.8 39000 4.5 58200 4.8 80. 12800 4.6 20200 5.9 32500 4.2 48900 4.2 82.9. (180) 12700 4.5 19900 4.6 32400 3.8 46800 3.7 87.1. (1 20 0) 13000 4.5 18900 4.7 32200 3.8 45000 3.5 88° 13000 4.0 15800 3.4 28000 3.3 31000 3.0 90. (010) 12900 3.0 15900 3.3 27900 2.7 30900 2.5 It is known that the fracture life (fatigue life) in the IPC test is greatly dependent on the angle between the length direction of the circuit (H direction) and the direction of the rolling direction (MD direction) -47-201146101 degrees, also That is, the normal direction of the wiring cross section when the ridge line in the curved portion is cut in the thickness direction is at an angle to [1 〇〇]. This orientation dependence appears under the condition b, the condition c, and the condition d. The higher the cumulative degree of the cube orientation, the greater the fatigue life for the repeated bending, and the greater the orientation dependence. Regarding the orientation dependence, it was confirmed that the thickness direction of the metal foil was such that the area of the copper [ 〇〇 1 ] within 10° of the azimuth difference was occupied by the EBSP method and the area ratio was 50% or more. ;001>The main orientation is preferentially aligned toward the thickness direction of the metal foil, and the area ratio is more than 50% by the EBSP method in the field of the [1〇〇] axis of copper within 10° of the azimuth difference. The way, [100] the main orientation appears in the metal foil surface as a priority alignment. In particular, when the thickness direction and the rolling direction indicate the condition c having an area ratio of 75% or more and 85% or more and a cube orientation is high, the fatigue life is large and the effect of the orientation dependency is large. When the thickness direction and the rolling direction indicate an area ratio of 9 8% or more and 99% or more, and the cube azimuth is extremely high, the fatigue life is larger and the orientation dependence effect is greater. When the results of the condition b, the condition c, and the condition d are reviewed in detail, the normal direction of the wiring cross section P when the ridge line in the curved portion is cut in the thickness direction, that is, the principal stress direction is from the copper foil <100> The main azimuth shifter has a higher fatigue life in a relatively curved circuit. In the IPC test of the present embodiment, it is seen that the main deformation direction of the opposite bending portion, that is, the normal direction of the cross section of the wiring when the ridge line in the curved portion is cut toward the thickness direction, has 2.9° to 8 7 . When the angle of the situation is. When the ridge line in the curved portion is cut in the thickness direction by the surface index, the cross section P of the wiring when the thickness is -48-20 201146101 (the opening time of the opening is 0). [〇〇1] is the range in which the ribbon axis '(20 1 〇) passes (lio) to (1 〇). The larger the effect is the main deformation side of the opposite bending portion, that is, the relative bending portion When the ridge line is cut in the thickness direction, the normal direction of the wiring section has an angle of 1 i · 4 to 7 8.6. The surface is indexed by the ridge line in the curved portion and cut in the thickness direction. The cross section P is such that [〇〇1] is a crystal ribbon axis, and (5 i 〇) passes through 1 1 〇) to (1 50). The bending property is also 2 6.6 in the normal direction of the main bending direction of the curved portion, i.e., the normal direction of the cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction. ~6 3 · 4. The angle will become higher. The most excellent are 30° and 60. When the situation. If it is represented by a face finger, the profile P is [0 0 1] as the band axis, and the range from (2 1 0 ) to (11〇) to (120) is the most excellent (40 23). ) and when (2 3 4 0 0 ) is nearby. When these results are compared with the elongation at break, it is understood that the basic crystal axis of the unit cell made by face center cube <1 〇〇> is relative to the thickness of the metal foil and in a certain direction existing in the foil surface. In the two orthogonal axes, the priority alignment field within 10° of each other has an area ratio of 50% or more. When the main orientation is present, the cross section of the wiring which is cut toward the thickness direction of the metal foil with respect to the ridge line in the curved portion The metal foil in the normal direction has an elongation at break of 3.5% or more, and the main stress and the main deformation are bent in relation to the orientation thereof, and have good bending fatigue characteristics. On the other hand, when the area ratio of the first alignment field is 49% or less, even if the crack elongation of the direction is 3.5% or more, good bending fatigue cannot be obtained. -49-201146101 [Example 4] A copper foil C having a purity of 99.99% was applied by heat treatment (preheat treatment) at a temperature of 5 °C to 400 °C for 30 minutes in an Ar gas flow, and was applied in the same manner as in Example 1. The proline solution a is coated and dried (hardened to form a thermoplastic polyimide having a film thickness of 2 μm), and the polyamid acid b is coated thereon and dried (cured to form a film thickness of 9 μm). a low-heat-expandable polyimine), which is additionally coated with poly-proline acid a, and dried (hardened to form a thermoplastic polyimide having a film thickness of 2 μm), and is integrated at a temperature of 300 to 360 ° C. The time is calculated as a heating condition of 5 minutes or more, and a polyimine layer composed of a three-layer structure is formed. Then, the rolling direction (MD direction) of the copper foil is cut to a length of 250 mm, and the direction orthogonal to the rolling direction (TD direction) is a rectangular shape having a width of 50 mm, as shown in FIG. A single-sided copper-clad laminate 4 having a polyimide layer (resin layer) 1 having a thickness of 13 μm and a copper foil 2 having a thickness of 9 μm was obtained. The tensile modulus of the entire resin layer at this time was 7.5 GPa. In the single-sided copper-clad laminate 4 obtained as described above, colloidal vermiculite was used for the rolling surface 2a of the copper foil 2, and after mechanical and chemical honing, the orientation was analyzed by an EBSP apparatus. The apparatus used was an FE-SEM (S-4 100) manufactured by Hitachi, Ltd., an EBSP device manufactured by TSL Corporation, and a software (OIM Analysis 5.2). The measurement field is a field of about 800 μm χ 1 6 0 0 μιη, and the acceleration voltage is 20 kV and the measurement phase interval is 4 μm. The evaluation of the orientation is expressed in the thickness direction of the tank and the rolling direction of the tank, and the ratio of the measurement point within <100> within 10° to the entire measurement point. Measurement -50- 201146101 The number system is implemented for five samples of different varieties, and the decimal point of the percentage is rounded off to the second place. Further, using the obtained data, the orientation of the adjacent crystal grains was 15 . The above is used as the crystal grain boundary to evaluate the crystal grain size. With regard to the multi-junction, the average particle size is not found in the body. The results are shown in Table 5. -51 - 201146101 [s^] Remarks Comparative Example Comparative Example Example Example Comparative Example Elongation at break in the rolling direction (%) <N CO CVJ CO ιο CO CO CO ι- 断裂 Fracture strength in the rolling direction (MPa) L〇r- r~ l〇v T— iO r~ t— 卜r- τ— 10 r" τ— ιο ο ι— bending test life (times) omo T- oo production t— oo inch ο ο (0 τ — Ο ο 00 τ— ο ο τ — S m >800 >800 >800 >800 >800 >800 ρ,Μ •ES mvt, 0) (D 0) IT) 卜σ> 00 σ (Ν 0) σ> ω 0) σ> ο 6 ο 1^ 鹄its SV 漶SS T- 10 0) σ) CO σ> ο 00 0) ο 0) σ> ιη σ> 0) 0) σ>σ> Pre-heat treatment temperature ro ο 00 ο 〇 04 2 5 0 ο ο C0 〇〇-52- 201146101 It can be seen that the copper foil C is formed with a cube assembly structure, and the copper foil surface orientation and rolling direction have {001} <1〇〇>The main orientation. This is because the copper foil which has been subjected to the calendering process is recrystallized by the heat of the preliminary heat treatment and the hardening of the polyimide, and the recrystallized aggregate structure is formed. Here, the greater the degree of alignment of the preliminary heat treatment temperature '{001} <1〇〇>. Further, the orientation other than the orientation of <100 > is confirmed by the EBSP apparatus as described above, and has an orientation of <212> with respect to the rolling direction, and the recrystallized residual orientation of the circle having a diameter of 5 μm or less is dispersed into an island shape. However, at 4 0 0. (In the case of the copper foil subjected to the preliminary heat treatment, the island-like structure as described above is hardly found. Among them, the area ratio of the confirmed island-like structure is small and is 2% or less, so that the crystal grain having a cubic orientation is recrystallized. The size of the recrystallized grains is 9 μηι in the thickness direction and 800 μπι in the thickness of the box. Then, the predetermined mask is covered on the single side obtained above. The copper foil 2 side of the copper clad laminate 4 is etched using a ferric chloride/copper chloride-based solution, as shown in Fig. 6 (but the wiring direction Η is at an angle of 0 ° with the MD direction), and the line width is (1) The wiring direction Η (Η direction) of the linear wiring 2 of 150 μm is parallel to the MD direction (<1〇〇> axis), and wiring is formed so that the space width (s) is 250 μm. Then, as shown in the sampling for the bending resistance test which will be described later, the wiring direction Η along the circuit board is obtained in accordance with JIS 6471, and has a length of 15 mm in the longitudinal direction and a direction orthogonal to the wiring direction Η. Flexible test with a width of 1 5mm Circuit board 5. Using the test flexible circuit board obtained above, the MIT bending test was performed in accordance with JIS C501 6. The pattern of the test is shown in Fig. 7. -53- 201146101 The apparatus was manufactured by Toyo Seiki Co., Ltd. (STROGRAPH- Rl), one end in the longitudinal direction of the test flexible circuit board 5 was fixed to the holding jig of the bending test apparatus, and the other end was fixed by a weight, and the vibration speed was 150 times at the center of the nip portion. The condition of the minute is alternately rotated by 135±5 degrees, and the radius of curvature is 0.8 mm, and the number of times until the conduction of the wiring 2 of the circuit board 5 is blocked is obtained as the number of bending times. The ridge line formed in the curved portion is curved so as to be orthogonal to the wiring direction 配线 of the wiring 2 of the test flexible circuit board 5, so that the principal stress and the main deformation applied to the copper circuit are parallel to the rolling direction. Tensile stress and tensile deformation. When the circuit was observed from the thickness direction of the copper foil after the bending test, it was confirmed that the vicinity of the ridge line of the curved portion was approximately the same as the rolling direction. A crack occurred in a vertical direction and a broken line occurred. The results of the bending life are shown in Table 5. The bending life of Table 5 is an average of the results of preparing five test flexible circuit boards for each copper foil preliminary heat treatment temperature. As can be seen from the results shown in Table 5, the bending fatigue life is particularly large when the cumulative degree of the cubic aggregate structure is 98.0% or more and 99.8%. Next, in order to investigate the dominant factor of the bending life, the principal stress of the bending, the main deformation direction, In other words, the tensile test is performed in parallel in the rolling direction. In order to investigate the characteristics of the copper foil monomer obtained by the preliminary heat treatment temperature, the resin layer is dissolved by the single-sided copper-clad laminate 4 before etching, and the copper foil is used. Body tensile test. It was confirmed that there was no change in the structure of the copper foil during the dissolution of the polyimide. The tensile test was performed by cutting the copper foil toward the rolling direction (MD direction) -54-201146101 into a length of 50 mm, and cutting into a sample having a width of 10 mm in the vertical direction of the foil surface, with a distance between the punctuation points of 10 mm, toward The measurement was carried out in the longitudinal direction at a tensile speed of 10 mm/min. In the measurement, seven samples were prepared for each of the preliminary heat treatment temperatures of each of the copper foils, and the fracture stress (breaking strength) obtained by the measurement and the average enthalpy of the elongation at break were shown in Table 5. Contrary to the results so far, the elongation at break is larger in the field where the degree of accumulation (%) is 9 8.0 % or more and 9 9 · 8 % or less in the range of the rupture elongation. . On the other hand, in the copper foil in which the island-like structure has disappeared, the elongation at break becomes small. This system is presumed to be related to the slip surface. It has been confirmed from the above that the elongation at break is strongly correlated with the bending fatigue life. In other words, it is understood that the aggregated degree (%) of 9 8.0% or more and 9.9.8% or less is highly developed, and the elongation at break is 3.5% or more, and the bending fatigue life is increased. On the other hand, a copper foil was produced under the same conditions using a fine copper containing 0.03 mass% of oxygen and a purity of 99.9% under the same conditions, and the test was carried out under the same conditions. The result was that even if the <1 〇〇> accumulation degree (%) was 98.0 Similarly, in the same manner, the elongation at break decreases as the degree of accumulation increases, and 3.5% or more of the copper foil is not obtained, and the fatigue life of 1,000 or more times is not obtained. [Industrial Applicability] The flexible circuit board of the present invention can be widely used in various electronic and electrical equipment, and the circuit board itself is bent, twisted, or deformed according to the operation of the loaded machine, either Both are adapted to have a curved portion for use. In particular, the flexible circuit board of the present invention has a curved portion structure with a bending durability of -55 to 201146101, and is therefore suitable for being frequently folded and loaded with repeated operations such as sliding bending, hinge bending, and sliding bending. When the machine is miniaturized, it is formed when the curved portion is formed. Therefore, various types of electronic equipment, such as thin-type displays, hard disks, printers, and DVD devices, which are required to be durable, are used. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a relationship between a plane obtained by rotating a crystal ribbon axis in a crystal structure of a cubic lattice system. Fig. 2 is a perspective view of a (3 00) standard projection view. Fig. 3 is a perspective view showing bending of a flexible circuit board. Fig. 4 is a plan explanatory view showing the relationship between the wiring crystal axes in the flexible circuit board, (a) and (b) are flexible circuit boards, and (c) and (d) are conventional circuit boards. Fig. 5 is a squint explanatory view of a single-sided copper clad laminate. Fig. 6 is a plan view showing a state in which a flexible circuit board for a test is obtained by a single embodiment in the embodiment of the present invention. Fig. 7 is an explanatory view of the MIT bending test apparatus. Fig. 8 (a) is an illustration of a flexible electrical cross-section of the test used in the IPC bending test. The curved or curved curved or curved radius is extremely small. The mobile phone and thin can be used for the ribbon shaft and the shape. The section of the state is said to be a junction with a metal foil. The flexible copper-clad laminate of the technique of the present invention is shown. Fig. 8 (X-X'-56 - 201146101 of the b-channel substrate [Explanation of main component symbols] 1 = Resin layer 2: Wiring (metal) 2a: Rolling surface 2 b: Side 3: Connector terminal 4: Single-sided copper clad laminate 5: Test flexible circuit board 6: Adhesive layer 7: Cover material 8: Gap length 9: Fixing portion 10: Slip operation portion 2 1 : Normal direction L of cross section P: Ridge line P: section of the wiring when cut from the ridge line in the curved portion toward the thickness direction - 57-