TW201137922A - Transmission electron microscope grid - Google Patents

Abstract

The present invention relates to a transmission electron microscope (TEM) grid. The TEM grid includes: a carrier having first through holes, a carbon nanotube supporter and a fixture having second through holes. The carbon nanotube supporter is disposed on a surface of the carrier and covers the first through holes. The carbon nanotube supporter is fixed between the carrier and the fixture. The TEM grid can eliminate an excursion phenomenon of the carbon nanotube structure during the use of the TEM grid, thereby it is conducive to improve the resolution and precision of the TEM.

Description

201137922 VI. Description of the Invention: [Technical Field] [0001] The present invention relates to a TEM micro-gate, and more particularly to a TEM micro-gate based on a carbon nanotube structure. [Prior Art] [0002] In a transmission electron microscope, a microgrid is an important tool for carrying a powder sample and performing high-resolution image observation (HRTEM) observation by transmission electron microscopy. In the prior art, the microgrid of the transmission electron microscope is usually formed by covering a metal mesh such as a copper mesh or a nickel mesh with a porous organic film and vapor-depositing an amorphous carbon film. However, in practical applications, when the above-mentioned micro-gate is used to analyze the composition of the TEM high-resolution image of the sample to be tested, especially in the observation of small-sized nanoparticles, such as particles of less than 5 nm, high resolution by transmission electron microscopy. The amorphous carbon film in the micro-gate is more likely to interfere with the high-resolution image of the TEM of the nanoparticle. [0003] Since the early 1990s, nanomaterials represented by carbon nanotubes (see Helical microtubules of graphitic carbon, Nature, Sum- 〇io vo1 354, P56 (1991)) have their unique structure and The nature has caused great concern. The application of nano carbon tubes to the fabrication of micro-gates is beneficial to reduce the interference of amorphous carbon films on the analysis of the components of the sample to be tested. However, due to the relatively light mass of the carbon nanotubes, drifting is likely to occur when applied to the microgrid, which affects the resolution of the TEM and the accuracy of the measurement. SUMMARY OF THE INVENTION _] (4) A 'provided - a kind of TEM micro-grid that can prevent the structure of the carbon nanotubes from drifting, with & 咼 TEM resolution and measured quasi-domain real 0992022306-0 099112612 Form No. A0101 Page 3 of 56 201137922 [0005] [0006] [0007] [0008] 099112612 is necessary. a TEM microgrid comprising: a carrier having a first through hole 'a carbon carbon bat support disposed on a surface of the carrier and covering the first via of the side carrier; and a fixed body The fixing body has a first through hole, and the nano tube is supported between the carrier and the fixed body. Compared with the prior art, the TEM microgrid provided by the present invention can prevent the use of the TEM micro-gate during the use of the TEM micro-gate by disposing the carbon nanotube structure between the carrier and the fixed body. The TEM microgrid device is in direct contact with the carbon nanotube structure, and the nanocarbon tube structure is drifted due to the light weight of the carbon nanotube structure to eliminate the micro-gate nano carbon during use. The phenomenon that the tube structure is easy to drift, thereby improving the resolution and accuracy of the transmission electron microscope. [Embodiment] Hereinafter, a TEM microgrid and a preparation method thereof according to the present invention will be further described in detail with reference to the accompanying drawings and specific embodiments. Referring to Figures 1 and 2, a first embodiment of the present invention provides a TEM micro-gate 10. The TEM microgrid 1 includes a carrier 11 〜, a nanotube support 120, and a fixed body 13 〇. The carbon nanotubes are disposed between the carrier 110 and the fixed body 13A. Preferably, the TEM micro-gate 10 has a disk-like structure having an outer diameter of 3 mm and a thickness of 3 μm to 2 μm. The carrier 110 includes at least one through-hole 116; the shape of the at least one through-hole 116 may be a circular shape, a quadrilateral hexagon, an eight-shaped hard form number A0101, page 4 / total 56 pages 〇992〇223 〇6.〇[0009] 201137922, oval, etc. Specifically, the carrier 110 is a disk-shaped porous structure, and the disk-shaped porous structure includes a first wafer-shaped body U1. The first wafer-shaped body 111 includes a first ring 112 and a first mesh. The first annular ring 具有 2 has a through hole 'the first mesh structure 114 is disposed at the through hole' and forms a plurality of first through holes 116. The first through hole 116 of the first mesh structure 114 is not limited in size and may be from 1 μm to 200 μm. Wherein, the "size" refers to the maximum width of the first through hole. It can be understood that the shape and arrangement of the plurality of first through holes 116 are not limited to be adjusted according to actual application requirements. The distance between the first through holes 11 6 may be equal or unequal. Preferably, the plurality of first through holes U6 are evenly distributed on the surface of the carrier 110, and the distance between adjacent first through holes 116 More than 1 micron. The material of the carrier 11 can be made of copper, nickel, molybdenum or ceramics, etc. The first network structure 11 of the carrier 11 can be formed by a method of surname. Two slits 118 are disposed on the ring 1^2, and the two slits 118 are symmetrically disposed to be fixed to the fixed body 130. [0010] In the present embodiment, the outer diameter of the carrier Π0 is 3 mm. The plurality of first through holes 116 are square in shape. The plurality of square first through holes u6 are evenly distributed on the surface of the carrier 110. The distance between adjacent square first through holes j 16 is equal. The size of the first through hole 116 is between 4 120 and 120 μm. The material of the carrier 110 is copper. [0011] The carbon nanotube support 120 is disposed on the surface of the carrier 110. The carbon nanotube support 120 covers at least a portion of the plurality of through holes 116. Preferably, the carbon nanotube support 12 is covered by 099112612 Form No. A0101 Page 5 / Total 56 Page 0992022306-0 201137922 a first through hole 116 of a mesh structure 114. The carbon nanotube support 120 has a one-piece structure, and preferably, the carbon nanotube support 120 has a disk shape and a diameter of 3 mm or less. Further preferably, the carbon nanotube support body 120 has a diameter of 2.8 mm or less. [0012] The carbon nanotube support body 120 includes at least one carbon nanotube film. a self-supporting structure composed of a plurality of carbon nanotubes, wherein the plurality of carbon nanotubes are arranged in a preferred orientation in the same direction. The preferred orientation refers to the overall extension direction of most of the carbon nanotubes in the carbon nanotube film. Basically in the same direction. Moreover, most of the nano The overall extension direction of the tube is substantially parallel to the surface of the carbon nanotube film. Further, most of the carbon nanotubes in the carbon nanotube film are connected end to end by van der Waals force. Specifically, the carbon nanotube Each of the carbon nanotubes in the majority of the carbon nanotubes extending substantially in the same direction in the film is connected end to end with a vanadium tube in the extending direction. Of course, the carbon nanotube film There are a small number of randomly arranged carbon nanotubes, which do not significantly affect the overall orientation of most of the carbon nanotubes in the carbon nanotube film. The self-supporting is not the carbon nanotube film. A large area of carrier support is required, and as long as the supporting force is provided on both sides, the whole film can be suspended and maintained in a self-membranous state, that is, the carbon nanotube film is placed (or fixed) on two supports at a certain distance. At this time, the carbon nanotube film located between the two supports can be suspended to maintain its own film state. The self-supporting is mainly achieved by the presence of continuous carbon nanotubes extending through the end-to-end extension of the van der Waals force in the carbon nanotube film. [0013] Specifically, most of the carbon nanotubes in the carbon nanotube film extending substantially in the same direction are not absolutely linear and can be appropriately bent; or 099112612 Form No. A0101 Page 6 / 56 pages 0992022306 -0 201137922 Ο Not exactly in the direction of extension, you can deviate from the direction of extension. Therefore, it is not possible to exclude partial contact between the carbon nanotubes juxtaposed in the majority of the carbon nanotubes extending substantially in the same direction. Specifically, each of the carbon nanotube membranes comprises a plurality of carbon nanotube fragments arranged in a continuous and preferential orientation. The plurality of carbon nanotube segments are connected end to end by Van der Valli. Each of the carbon nanotube segments includes a plurality of substantially parallel carbon nanotubes, and the plurality of substantially parallel carbon nanotubes are tightly coupled by van der Waals force. The carbon nanotube segments have any length, thickness, uniformity, and shape. The carbon nanotubes in the carbon nanotube film are arranged in a preferred orientation in the same direction. The carbon nanotube film is obtained by drawing from a carbon nanotube array. The thickness of the carbon nanotube film is from 0.5 nm to 100 μm, depending on the height and density of the carbon nanotubes in the carbon nanotube array. The width of the carbon nanotube film is related to the size of the carbon nanotube array in which the carbon nanotube film is drawn, and the length is not limited. [0014] The carbon nanotube structure may include a plurality of layers of carbon nanotube membranes stacked. When the carbon nanotube support 120 comprises two or more layers of carbon nanotube membranes stacked, the adjacent two layers of carbon nanotube membranes are tightly bonded by van der Waals force, and adjacent two The arrangement direction of the carbon nanotubes in the layer of carbon nanotube film may be the same or different. Specifically, the carbon nanotubes in the adjacent carbon nanotube film have an intersection angle α between the α and the α is greater than or equal to 0 degrees and less than or equal to 90 degrees. The structure of the carbon nanotube film and the preparation method thereof are described in the Taiwan Patent Application Publication No. 200 833862, which is published on Aug. 16, 2008. The two or more layers of the carbon nanotube film are preferably laminated and arranged in a cross. The cascading and cross setting means that the crossing angle α is not equal to 0 degrees. The intersection angle α is preferably 90 degrees 099112612 Form No. Α 0101 Page 7 / Total 56 Page 0992022306-0 201137922 [0015] Since the plurality of layers of carbon nanotube film are stacked and cross-shaped, the layers in the different layers of carbon nanotube film The carbon nanotubes are interwoven to form a network structure to enhance the mechanical properties of the carbon nanotube support 120, while the carbon nanotube support 120 has a plurality of uniform and regularly arranged micro The pores 122 have a pore diameter which is related to the number of layers of the carbon nanotube film. The more the number of layers, the smaller the pore diameter of the pores 122. The pores 122 may have a pore diameter of from 1 nm to 1 μm. Further, the thickness of the carbon nanotube support 120 is preferably less than 100 μm. [0016] The carbon nanotube support 120 may also be at least one carbon nanotube network composed of a nano carbon pipeline, and the carbon nanotube network is composed of at least one nanocarbon pipeline, and the The network structure composed of at least one nanocarbon line includes a plurality of micropores, and the pores may have a size of from 1 nm to 1 μm. The nanocarbon line is composed of a carbon nanotube, which may be a non-twisted nano carbon line or a twisted nano carbon line. [0017] The non-twisted nanocarbon pipeline includes a majority of carbon nanotubes aligned along the axial direction of the non-twisted nanocarbon pipeline. The non-twisted nanocarbon line can be obtained by treating the carbon nanotube membrane with an organic solvent. The carbon nanotube film comprises a plurality of carbon nanotube segments, the plurality of carbon nanotube segments are connected end to end by Van der Waals force, and each carbon nanotube segment comprises a plurality of parallel and through Van der Waals force Tightly bonded carbon nanotubes. The carbon nanotube segments have any length, thickness, uniformity and shape. 5纳米〜1毫米。 The non-twisted nano carbon line length is not limited, the diameter is 0. 5 nanometers ~ 1 mm. Specifically, the volatile organic solvent may be immersed in the entire surface of the carbon nanotube film, and the surface sheet generated when the volatile organic solvent is volatilized is 099112612. Form No. A0101 Page 8 / Total 56 Page 0992022306-0 201137922 The role of force Next, a plurality of carbon nanotubes parallel to each other in the carbon nanotube film are tightly bonded by van der Waals force, thereby shrinking the carbon nanotube film into a non-twisted nano carbon line. The volatile organic solvent is ethanol, decyl alcohol, acetone, dichloroethane or gas, and ethanol is used in this embodiment. The non-twisted nanocarbon line treated with a volatile organic solvent has a smaller specific surface area and a lower viscosity than a carbon nanotube film treated with a non-volatile organic solvent. [0018] The twisted nanocarbon line includes a majority of carbon nanotubes arranged axially helically about the twisted carbon nanotube line. The nanocarbon line can be obtained by mechanically twisting both ends of the carbon nanotube film in opposite directions. Further, the twisted carbon nanotube wire can be treated with a volatile organic solvent. Under the action of the surface tension generated by the volatilization of the volatile organic solvent, the adjacent carbon nanotubes in the treated twisted nanocarbon pipeline are tightly bonded by the van der Waals force, so that the specific surface area of the twisted nanocarbon pipeline Decrease, increase in density and strength. [0019] The nano carbon pipeline and the preparation method thereof are referred to the Taiwan patent filed by Fan Shoushan et al. on November 5, 2002, announced on November 21, 2008, and the publication number is I 303239; and in 2005 The Taiwan patent filed on December 16th, announced on July 21, 2009, with the announcement number 1312337. In the embodiment, the carbon nanotube support body 120 covers the carrier 110 in the TEM micro-gate 10 and completely covers the plurality of first through holes 116. 6毫米。 The diameter of the carbon nanotube support body is 2. 6 mm. The carbon nanotube support body 120 is a two-layer laminated carbon nanotube film, and the carbon nanotubes in the two-layer carbon nanotube film are vertically disposed. 099112612 Form No. A0101, page 9 / page 56 0992022306-0 201137922 [0021] The fixing body 130 is disposed on the surface of the carbon nanotube support 120 such that the carbon nanotube support 120 is fixed to the The fixing body 130 is interposed between the carrier 110. The fixing body 130 includes at least one second through hole 136, and the shape of the at least one second through hole 136 may be a circle, a quadrangle, a hexagon, an octagon, an ellipse or the like. Specifically, the fixed body 130 is a disk-shaped porous structure, and the disk-shaped porous structure includes a second disk-shaped body 131. The second disk-shaped body 131 includes a second ring 132 and a second a mesh structure 134, the second ring 132 has a through hole, the second mesh structure 134 is disposed at the through hole, and forms a plurality of second through holes 136; the plurality of second mesh structures 134 The size of the second through holes 136 is not limited and may be from 10 micrometers to 200 micrometers. It can be understood that the shape and arrangement of the plurality of second through holes 136 are not limited and can be adjusted according to actual application requirements. The distance between the plurality of second through holes 136 may be equal or unequal. Preferably, the plurality of second through holes 136 are evenly distributed on the surface of the fixed body 130, and the distance between the adjacent second through holes 136 is greater than 1 micrometer. The second mesh structure 134 of the fixed body 130 may be formed by etching. The material of the fixing body 130 may be a material such as copper, nickel, molybdenum or ceramic. The second ring 132 is provided with two buckles 138 which are matched with the slits 118. The carrier 110 and the fixing body 130 are fixed together by inserting the buckle 138 into the slit 118, so that the carbon nanotube support 120 is fixed to the carrier 110 and fixed. Between the bodies 130. [0022] In this embodiment, the structure and size of the fixing body 130 are the same as those of the carrier 110, that is, the outer diameter of the fixing body 130 is also 3 mm, and the size of the second through hole 136 is The size of the first through hole 116 is also 099112612. Form No. A0101, page 10 / page 56 0992022306-0 201137922, the second through hole 136 is also square in shape, and the second mesh structure 134 is The second rings 132 are located in the same plane. The plurality of first through holes 116 and the plurality of second through holes 136 are oppositely disposed opposite to each other to form a plurality of third through holes 150, and the third through holes 15 are the first through holes 116 and the first The portion of the plurality of second through holes 150 is smaller than the size of the first through hole 116 or the second through hole 136. The size of the third through hole 150 is between 20 micrometers and 60 micrometers. The third through hole 150 corresponds to an electron transmissive portion, and the nanotube support 12 is suspended at the second through hole 150. 〇 [0023]

It can be understood that the number of the slits 118 舆 the buckles 138 is not limited, for example, three may be provided as long as it can fix the carrier 11 , that is, the fixed body 13 . In addition, the manner in which the carrier 11〇 and the fixing body 13〇 can be fixed together is not limited to that described in the embodiment, and the two can be fixed together by other mechanical means; for example, the two are fixed by welding. together. [0024] Ο In this embodiment, the TEM microgrid 10 is applied, and the sample to be observed is placed on the surface of the carbon nanotubes H120. When the size of the sample is larger than the nano carbon tube branch The microholes 122 of the body 120 can support the sample of material. The sample can be observed through an electron-transmissive portion corresponding to the third through hole 15A. And when the size of the sample is smaller than the micropores 122, especially when the sample is a natrile having a particle diameter of less than 5 nm, the sample can pass through a carbon nanotube in a carbon nanotube (12) 12G. The adsorption is stably adsorbed on the surface of the carbon nanotube wall, and at this time, the sample can also be observed through the electron-transmissive portion corresponding to the third through hole 150. Thus, it is possible to observe a sample of nanoparticle having a particle diameter of less than 5 nm, and to improve transmission power. 099112612 Form No. A0101 Page 1 of 56 0992022306-0 201137922 The resolution and resolution of the resolution image. [0028] Since the carbon nanotube support 120 in the TEM microgrid 10 in the present embodiment is fixed by the carrier 110 and the fixed body 130, therefore, using iron or the like When the TEM microgrid is moved, the rafter directly holds the carrier 11 〇 and the fixed body 130 without directly contacting the carbon nanotube support 12〇; thus, the rafter and the carbon nanotube support can be avoided. 12〇 direct contact 'avoids the drift of the nano carbon support body 120 due to the light weight of the carbon nanotube support body 120, and also eliminates the contamination of the carbon nanotube support body 120 by the recorder. Therefore, it is advantageous to improve the accuracy and resolution of the composition analysis of the sample by the transmission electron microscope. In addition, since the carbon nanotube support 120 is composed of a plurality of carbon nanotube bundles having a head-to-tail phase velocity, and the carbon nanotube is axially conductive and radially insulated, the carbon nanotube support 120 is The conductivity is good, and the electrons accumulated on the surface of the carbon nanotube support body 120 can be immediately guided away, which is favorable for observation of the sample. : ··· |:.. In addition, because the carbon nanotube support is composed of a plurality of end-to-end carbon nanotube bundles, that is, the interaction between the nanotubes in the carbon nanotube membrane is fixed together, so The carbon nanotube film has good stability, and the carbon nanotubes in the carbon nanotube film do not shake when the sample is observed, so that the image formed by the observed sample is clearer. Further, since the carbon nanotube support 12 is composed of a plurality of end-to-end carbon nanotube bundles and the nanotubes in the carbon nanotube support 120 are regularly arranged, it is convenient when the sample is observed. Position to find samples. Referring to FIG. 3 and FIG. 4, a second embodiment of the present invention provides a transmission electron microscope. 099112612 Form No. A0101 Page 12 of 56 0992022306-0 201137922 ❹ Microgrid 20. The TEM microgrid 20 has an outer diameter of 3 mm and a disk-like structure having a thickness of 3 to 20 μm. The TEM microgrid 20 includes a carrier 210, a carbon nanotube support 220, and a fixed body 230. The carrier 210 is a disk-shaped porous structure, and includes a first wafer-shaped body 211. The first wafer-shaped body 211 includes a first ring 212 and a plurality of first strips 214. The ring 212 has a through hole, and the plurality of first strip structures 214 are disposed at the through holes of the first ring 212 and are spaced apart from each other to form a plurality of first through holes 216; the first ring 212 Two slits 218 are provided on the upper side. The fixing body 230 is a disk-shaped porous structure, and includes a second wafer-shaped body 231, the second wafer, the shape of the body 231 includes a a second ring 232 and a plurality of second strip structures 234, the second ring 232 has a through hole, the plurality of second strip structures 234 are disposed at the through holes, and are spaced apart to form a plurality of second The through hole 236; two buckles 238 are disposed on the second ring 232. The carbon nanotube support 220 is disposed between the carrier 210 and the fixed body 230. The carrier 210 and the fixed body 230 are fixed together by the engagement of the buckle 238 and the slit 218. Therefore, the carbon nanotube support 220 is fixed between the carrier 21 and the fixed body 230. [0029] The carbon nanotube support 220 and the first embodiment TEM microgrid The carbon nanotube support 120 of 10 is the same, and the structures of the first ring 212 and the second ring 232 are the same as those of the first ring 112 and the second ring 132 in the first embodiment, respectively. The TEM micro-gate 20 is different from the TEM micro-gate 10 in that the plurality of first strip-like structures 214 are parallel to each other and equally spaced to form a plurality of first through-holes 216 that are parallel to each other. The spacing between adjacent first strips 214 is between 30 microns and 099112612, form number Α0101, page 13 of 56 pages 0992022306-0, 201137922, 150 microns, and the diameter of the first strip structure 214 is greater than 1 micron. . The plurality of second strip structures 234 are parallel to each other and equally spaced to form a plurality of second through holes 236 that are parallel to each other, and the adjacent second strip structures 234 are spaced apart by 30 micrometers to 150 micrometers. The plurality of first strip structures 214 are disposed opposite to the plurality of second strip structures 234 by the carbon nanotube support body and the first strip structure 214 and the second strip structure 234 The angle between the plurality of first through holes 236 and the plurality of second through holes 236 is opposite to each other, thereby forming a plurality of third through holes 250, and the size of the plurality of third through holes 250 is Between 30 microns and 150 microns, the distance between the third vias 250 of the citrus is greater than 1 micron. The carbon nanotube support 220 is suspended at each of the third through holes 250 and corresponds to one electron transmission portion. The electron transmissive portion is for carrying a sample to be tested. [0030] It can be understood that the angle formed between the first strip structure 214 and the second strip structure 234 can also be greater than or equal to a twist of less than 90 degrees. The arrangement of the plurality of first strip structures 214 and the second strip structures 234 is not limited to the embodiment. For example, the distance between the first strip structures 214 may be different, and the first strip structures 214 may be arranged and arranged; the distance between adjacent first strip structures 214 may also be micron. 〜2〇〇 microns, the width of the first strip structure 214 may be greater than 1 micron. The distance between the second strip structures 234 may be unequal, and the second strip structures 234 may be arranged and arranged; the distance between adjacent second strip structures 234 may also be 10 micrometers~ 200 microns, the second strip structure 234 may have a width greater than 1 micron. The arrangement of the second strip structures 234 may also be different from the arrangement of the first strip structures 214. 099112612

Form nickname A010I Page 14/56 page 0992022306-0 201137922 [0031] β, understand that the first strip structure of the carrier 2ΐ〇 and the second strip structure 234 of the fixed body 23〇 can be etched form. The first strip structure 214 and the second strip structure 243 may also be a filamentary structure formed by a wire drawing method. 003 Referring to FIG. 5 and FIG. 6, a third embodiment of the present invention provides a TEM micro-gate 30. The TEM micro-gate 30 has an outer diameter of 3 mm and a disk-like structure having a thickness of 3 to 20 μm. The TEM micro-gate 3A includes a carrier 310, a nano tube shunt body 320, and a fixed body 330. The carrier 310 is a disk-shaped porous structure, and includes a first wafer-shaped body 311. The first circle. The sheet-shaped body 311 includes a first ring 31 2 and a first mesh structure. 314, the first ring 312 has a through hole, the first mesh structure 314 is disposed at the through hole, and a plurality of first through holes 316 are formed; two slits are disposed on the first ring 312 318. The fixing body 330 is a second ring 332, and the fixing body 330 includes only one second through hole 336; the second ring 332 is provided with two buckles 338. The carbon nanotube support 320 is disposed between the carrier 310 and the fixed body 330. The carrier clock 310 and the fixing body 330 are fixedly coupled to the slit 318 by the buckle 338. Therefore, the nano carbon g support 32 is fixed between the carrier 310 and the fixed body 330. . The structure of the TEM micro-gate 30 is similar to that of the TEM micro-gate 10 of the first embodiment. Specifically, the material and structure of the carrier 310 and the carbon nanotube support 320 are respectively compared with the transmission electron micro-grid 1 . The material and structure of the crucible carrier 110 and the carbon nanotube support 120 are the same. The difference is that the fixing body 330 is a second ring 332, and the fixing body 330 includes a second through hole 336. The diameter of the fixing body 330 is the same as the straight 099112612 of the carrier 310, Form No. A0101, page 15 / 56 pages 0992022306-0 201137922 t. Preferably, the inner diameter of the second ring 332 is the same as the inner diameter of the first ring 312. . The carbon nanotube support 32 is fixed between the first ring 312 and the second ring 332 and the diameter of the carbon nanotube support 32 is slightly larger than the inner diameter of the second ring 332. The first through hole 316 corresponds to one electron transmitting portion. The carbon nanotube support 32 is suspended at the first through hole 316. [0036] Referring to FIG. 7 and FIG. 8, a fourth embodiment of the present invention provides a TEM micro-gate 40. The TEM micro-gate 40 includes a carrier 410, a carbon nanotube support 420, and a fixed body 43A. Preferably, the TEM micropowder 40 has an outer diameter of 3 mm and a disk-like structure having a thickness of 3 μm to 2 μm. The carrier 410 is a first ring 412, and the carrier 41 includes a first through hole 416. Two slits 418 are disposed on the first ring 412. The fixing body 430 is a second ring 432, and the fixing body 430 includes a second through hole 436. The second ring 432 is provided with two buckles 438. The carrier 41 is fixed to the fixed body 43 by the buckle 438 and the slit 418. The carbon nanotube support body 42 is disposed between the carrier 410 and the fixed body 430 and is suspended at the first through hole 416 and the second through hole 436. The diameter of the carbon nanotube support 42A is slightly larger than the inner diameters of the first circular ring 412 and the second circular ring 432. The structure of the carbon nanotube support 420 is similar to that of the SEM micro-gate 1 〇 provided by the first embodiment. Preferably, the carbon nanotube support 420 is plural. A carbon nanotube film laminated and disposed. In this embodiment, the nano carbon camp support body 420 is a four-layer stacked and cross-set nano 099112612 form. No. A0101 Page 16 / 56 pages 0992022306-0 201137922 Carbon film 'and adjacent Nana 5微米。 The carbon nanotubes in the carbon nanotubes are arranged in a vertical direction; the 5th Heiner tube support 420 has a plurality of uniform and regularly arranged micropores. [0037] Referring to FIG. 9 and the circle 1 ′′, a fifth embodiment of the present invention provides a transmission electron microscope micro-bend 50. The TEM micro-gate 5 〇 includes a carrier 51〇, a carbon nanotube support body 520, and a fixed body 53〇. The carbon nanotube support 520 is disposed between the carrier 510 and the fixed body 530. Preferably, the TEM micro-gate 5 has an outer diameter of 3 mm and a sheet-like structure having a thickness of 3 μm to 2 μm. . . . ......;.

There is a joint between the carrier 510 and the fixing body 53〇, and a folded portion 550 is formed at the joint, and the carrier 51.0 and the fixing body 530 are movably connected through the folding portion 550, so that the carrier 510 can be made. The fixed body 530 is in an open state or a closed state. The folded portion 550 may be formed by integrally forming the carrier 510 with the fixed body 530; or may be a pivot. The carrier 510 is a one-piece porous structure, and includes a first wafer-shaped body 511. The first wafer-shaped body 511 includes a first ring 512 and a first mesh structure 514. The first circle The ring 512 has a through hole 'and the first mesh structure 514 is disposed at the through hole, and a plurality of first through holes 516 are formed; and a slit 518 is disposed on the first ring 512. The fixing body 530 is a one-piece porous structure, and includes a second disk-shaped body 531. The second disk-shaped body 531 includes a second ring 532 and a second mesh structure 534. The ring 532 has a through hole, and the second mesh structure 534 is disposed at the through hole, and forms a plurality of second through holes 536; the second ring 532 is provided with a buckle 538, the buckle 538 is matched to the slit 518. 099112612 Form number Α0101 Page 17 of 56 0992022306-0 201137922 The first ring 512 and the

[0039] Specifically, the folded portion 550 is formed at the intersection of the body 511 and the first wafer-shaped body 531 as the folded portion 550. After the carrier 510 and the fixing body 53 are folded by the folding portion 55, the inner edge of the first ring 512 and the inner edge of the second ring 532 may be disposed opposite to each other. Preferably, the carrier 51 is completely coincident with the fixed body 530 after folding. The slit 518 and the buckle 538 are respectively disposed at positions opposite to the folding portion 550. After the carrier 51〇 and the fixing body 530 are folded by the folding portion 550, the buckle 538 passes through the slit. 518 is stuck on the first ring 512, so that the carrier 510 and the fixing body 530 are fixed together, so that the carbon nanotube support 520 is fixed to the carrier 510 and the fixed body 530. between. [0040] In this embodiment, the carrier 510 supports the fixed body 530 in an integrally formed structure. The carrier 510 and the fixed body 530 are symmetrically disposed with respect to the folded portion 550, that is, the specific structure of the carrier 510 is the same as the specific structure of the fixed body 530. The first through hole 516 and the second through hole 536 are the same as the first through hole 116 and the second through hole 136 in the TEM microgrid 10 provided in the first embodiment. The first through hole 516 is the first through hole 516. The shape and size are the same as the shape and size of the second through hole 536. After the carrier 510 and the fixing body 530 are folded, the first through hole 516 and the second through hole 536 are correspondingly and coincident, and correspond to one. Electron transmission section. The carbon nanotube support body 520 is suspended at the second through hole 536 and the first through hole 516. 099112612 Form No. 1010101 18th Buy/Tog 56 Page 0992022306-0 201137922 [0041] The carbon nanotube support 520 is the same as the carbon nanotube support 120 of the first embodiment, and includes at least one carbon nanotube Membrane, or a network of carbon nanotubes composed of at least one nanocarbon line. Specifically, in the embodiment, the carbon nanotube support body 520 includes two layers of carbon nanotube films stacked and disposed, and the carbon nanotubes in the two layers of carbon nanotube film are vertically disposed. A plurality of uniform and regularly arranged micropores are formed, the micropores having a pore size of from 1 nm to 1 μm. [0042] It is to be understood that the number and specific structure of the slit 518 and the buckle 538 are not limited as long as the fixed carrier 510 and the fixed body 530 can be realized. The slit 518 and the buckle 538 may not be disposed on the carrier 510 and the fixing body 531 as long as the carrier 510 and the fixing body 530 are folded and folded along the folding portion 550. When the TEM micro-gate 50 is used, the carrier 510 and the fixed body 530 are held by the holding material, so that the carbon nanotube structure 522 is prevented from being directly contacted by the holding material with the carbon nanotube supporting body 520. The large drift and contamination of the carbon nanotube support 520 are beneficial to improve the resolution and the continuation of the TEM microgrid 50. Of course, when the carrier 510 and the fixing body 530 are mechanically connected and fixed by being provided by snapping or welding, the carbon nanotube support body 520 can be further fixed, thereby further preventing the carbon nanotube support. The body 52 is floated while using the TEM microgrid 50. [0043] It can be understood that the carrier and the fixed body in the first embodiment, the second embodiment, the third embodiment, and the fourth embodiment of the present invention may also be an integrated structure. [0044] The present invention also provides a method for preparing a transmission electron microscope. Method of Gates' The method comprises the steps of: providing a carrier having a first through hole; providing 099112612 Form No. A0101 Page 19 / Total 56. Page 0992022306-0 201137922 One carbon nanotube structure, the nanometer a carbon tube structure covering the first through hole of the carrier; and providing a fixing body having a second through hole, and the fixing body and the carrier are stacked to fix the carbon nanotube structure to Between the carrier and the immobilizer. [0045] wherein the carrier and the fixing body may be two independent structures, or may be a unitary structure. It can be understood that when the carrier is integrally formed with the fixing system, the carbon nanotube structure can simultaneously cover the first through hole of the carrier and the second through hole of the fixing body. [0046] The carbon nanotube structure is at least one carbon nanotube membrane, at least one nanocarbon pipeline, or at least one carbon nanotube network. The at least one carbon nanotube membrane or at least one nanocarbon pipeline is directly extracted from an array of carbon nanotubes. The carbon nanotube network structure is composed of the at least one nanocarbon line woven in a certain order or a combination of cross arrangements. [0047] the step of covering the first via hole of the carrier with the carbon nanotube structure further includes the step of treating the carbon nanotube structure covering the first via of the carrier with an organic solvent. [0048] The step of laminating the carrier and the fixing body may be: mechanically laminating the carrier and the fixing body such that the second through hole of the fixing body and the first through hole of the carrier are at least Partial overlap. Specifically, the fixing body and the carrier may be laminated by welding or snapping so that the carbon nanotube support is held between the carrier and the fixing body. [0049] It can be understood that, in the above method for preparing a TEM micro-gate, the 099312612 form number A0101 is 20th/56 pages 0992022306-0 201137922 [0051] Ο [0052] 099112612 carrier, fixed body And the order of the carbon nanotube structure can be determined according to the actual situation. For example, the carrier and the fixing body may be provided at the same time; the carrier, the fixing body and the carbon nanotube structure may be simultaneously provided; and the carrier and the carbon nanotube structure may be simultaneously provided. Referring to Figures 9 through 11, the present embodiment specifically provides a method of preparing the above-described TEM micro-gate 50. The preparation method comprises the steps of: (sl〇) providing the carrier 510 and the fixing body 53〇, the carrier 51〇 having a plurality of first through holes 516, the fixing body 530 having a plurality of second through holes (S20) providing a carbon nanotube structure 522, the carbon nanotube structure 522 covering the first through hole 516 of the carrier 510; (S30) laminating the fixed body 530 and the carrier 510 The carbon nanotube structure 522 is fixed between the carrier 510 and the fixed body 530. In the step (S10), the carrier 510 and the fixing body 53Q are integrally formed, and the connection between the carrier 510 and the fixing body 530 has a folded portion 550, and the carrier 510 and the fixing body 530 can be completely closed by the folding portion 550. Or open any angle. In this embodiment, the carrier 510 and the fixing body 530 are symmetrically disposed at the folded portion 550. The carrier 510 and the fixing body 530 are opened such that the angle between the carrier 510 and the fixing body 530 through the folded portion 550 is 90 degrees. The step (S20) specifically includes the following steps: (S21) providing a carbon nanotube structure 522, and covering the first carbon structure 514 of the carrier 51〇; (S22) using organic The solvent treats the carbon nanotube structure 522 covering the first via 516 of the carrier 510; and (s23) removes the excess carbon nanotube structure 522 to form the carbon nanotube support 520. Form No. A0101 Page 21 / Total 56 Page 0992022306-0 201137922 [0053] In this embodiment, the carbon nanotube structure 522 is two stacked and disposed carbon nanotube membranes, and the two nanotubes The carbon nanotubes in the carbon nanotube film are vertically disposed and cover the first network 514 of the carrier 510. Wherein, the preparation method of each carbon nanotube film comprises the following steps: First, an array of carbon nanotubes is provided, preferably, the array is a super-sequential carbon nanotube array. [0055] In this embodiment, the method for preparing the super-sequential carbon nanotube array adopts a chemical vapor deposition method, and the specific steps thereof include: (a) providing a flat substrate, and the substrate may be a P-type or N-type germanium substrate. Or, using a germanium substrate formed with an oxide layer, in this embodiment, a 4-inch germanium substrate is preferably used; (b) a catalyst layer is uniformly formed on the surface of the substrate, and the catalyst layer material may be iron (Fe) or cobalt (Co). One of the alloys of nickel (Ni) or any combination thereof; (c) annealing the substrate on which the catalyst layer is formed in air at 700 to 900 ° C for about 30 minutes to 90 minutes; (d) treating the substrate It is placed in a reaction furnace, heated to 500-740 ° C under a protective gas atmosphere, and then reacted with a carbon source gas for about 5 to 30 minutes to grow to obtain a super-aligned carbon nanotube array having a height of 200 to 400 μm. . The super-sequential carbon nanotube array is a plurality of pure carbon nanotube arrays formed of carbon nanotubes that are parallel to each other and perpendicular to the substrate. The super-aligned carbon nanotube array contains substantially no impurities such as amorphous carbon or residual catalyst metal particles, etc., by controlling the growth conditions described above. The carbon nanotubes in the array of carbon nanotubes are in close contact with each other to form an array by van der Waals force. [0056] In the embodiment, the carbon source gas may be a chemically active hydrocarbon such as acetylene, and the protective gas may be nitrogen, ammonia or an inert gas. 099112612 Form No. A0101 Page 22 / Total 56 Page 0992022306-0 201137922 [0058] [0059] [0062] [0062] [Under, using - stretching tool from the above carbon nanotube array A carbon nanotube film having a certain width and length is extracted. Specifically, the method comprises the following steps: (a) a plurality of nano carbons selected in the above-mentioned carbon nanotube array-fixed width: a fragment 'This embodiment (4) is an array of knee-contacted nano-tubes having a constant width to receive a plurality of carbon nanotube segments of width; (b) stretching the plurality of carbon nanotube segments at a constant velocity along a growth direction substantially perpendicular to the carbon nanotube array growth to form a carbon nanotube film. During the above stretching process, the plurality of tube segments are gradually separated from the substrate in the extending direction by the pulling force, and the selected plurality of carbon nanotube segments are respectively combined with other nanocarbons due to the van der Waals force. The tube segments are continuously pulled out end to end to form a carbon nanotube membrane. The nanometer carbon nanotube membrane is a carbon nanotube membrane having a certain width formed by a plurality of aligned carbon nanotube bundles connected end to end. The arrangement direction of the carbon nanotubes in the carbon nanotube film is substantially parallel to the stretching direction of the carbon nanotube film. In the present embodiment, the width of the nanotube film and the growth of the carbon nanotube array are The size of the substrate is related to 'the nano carbon The length of the crucible is not limited and can be obtained according to actual needs. In this embodiment, a 4-inch substrate growth super-sequential carbon nanotube array is used. The width of the carbon nanotube film can be from 1 cm to 1 cm. The preparation method of the carbon carbon structure 522 specifically includes the following steps: First, a substrate is provided. The substrate has a flat surface, and the material thereof is not limited. In this embodiment, the substrate may be a ceramic tile. The above two carbon nanotube films are sequentially laminated and laid on the surface of the substrate at 099112612 Form No. A0101, page 23/56 pages 0992022306-0 201137922. [0063] Since the carbon nanotubes are relatively pure and have a large The specific surface area, so the carbon nanotube film obtained by directly pulling from the carbon nanotube array has good viscosity. The carbon nanotube film can be directly laid on the surface of the substrate or another carbon nanotube film. The two layers of carbon nanotube film are tightly bonded by van der Waals force. [0064] It can be understood that the carbon nanotube structure 522 can also be a layer of the carbon nanotube film, and Two or more layers of the carbon nanotubes The carbon nanotube structure 522 can also be at least one nano carbon line or at least one carbon nanotube network structure. [0065] Step (S22) is specifically: through the container 560 drops the organic solvent 562 onto the surface of the carbon nanotube structure 522 to infiltrate the entire carbon nanotube structure 522. The organic solvent 562 is a volatile organic solvent such as ethanol, methanol, acetone, di-ethane or chloroform. In this embodiment, ethanol is used. After the carbon nanotube structure 522 is infiltrated by the organic solvent 562, the parallel nanocarbon in each carbon nanotube film is under the surface tension of the volatile organic solvent 562. The tube fragments are partially aggregated into the carbon nanotube bundle. In addition, the carbon nanotubes in the carbon nanotube film are aggregated into bundles, so that the parallel carbon nanotube bundles in the carbon nanotube membrane are substantially spaced apart from each other, and the nai The carbon nanotube bundles in the two carbon nanotube membranes in the carbon nanotube structure 522 are cross-aligned to form a microporous structure. These micropores are composed of carbon nanotubes arranged in series and overlapping each other, and a bundle of carbon nanotubes. [0066] The step (S23) is: after the organic solvent is volatilized, along the carrier 510 099112612 Form No. A0101 Page 24 / Total 56 Page 0992022306-0 201137922 Ο [0067] Q [0068] The first ring 512 The inner ring removes excess carbon nanotube structure 522 such that the diameter of the carbon nanotube structure 522 is less than the outer diameter of the first ring 512 to form the nanocarbon support support 52A. Among them, the carbon nanotube support 520 can be formed by removing the excess carbon nanotube structure 522 by a laser cutting method. In this embodiment, a conventional argon ion laser or carbon dioxide laser can be used to remove the excess carbon nanotube structure 522, and its power is 5 to 30 watts (W), preferably 18 watts. The diameter of the carbon nanotube support body 52 is 2.6 mm, which is equal to the inner diameter of the first ring 512. It can be understood that when the diameter of the carbon nanotube structure 522 in the step (S20) is smaller than the outer diameter of the first ring 512, which is less than or equal to the inner diameter of the first ring 5, 2 The step (S23). It can be understood that the order of the steps (S21)' (S22) and (S23) can be determined as needed. For example, the step (S2i) can be interchanged with the sequence of the step (S22), that is, the carbon nanotube structure 522 can be treated first with an organic solvent, and then the carbon nanotube structure 522 can be processed. It is disposed on the surface of the carrier 510. Step (S30) laminating the fixing body 530 and the carrier 51〇 such that the first through hole 516 and the second through hole 536 at least partially overlap, and the surface of the $ m carbon tube supporting body 520 is fixed to The carrier 5i is interposed between the carrier 530 and the fixed body 530. Specifically, the fixing body 530 and the carrier 510 are stacked by the folding portion 550 such that the carbon nanotube structure 522 is fixed between the carrier 510 and the fixing body 530. More specifically, the fixing body 530 and the carrier 510 ′ are closed such that the angle between the carrier 510 and the fixing body 53 at the folded portion 505 is gradually reduced to 0 degrees; at this time, the carrier 510 and the fixed body 530 Aligned with the first through hole 099112612 of the carrier 51〇, the form number A0101, the 25th page, and the 56th page of the second through hole (four) of the fixed body 530 are arranged one by one, and The carbon nanotube support 52 is suspended at the first through hole 516 and the second through hole 536. In this step, the carrier 510 and the fixed body 53〇 are folded by the folding portion 550, and the carrier 510 and the fixed body 530 can be relatively easily realized, and the system is relatively easy to implement. The precise alignment of the first through hole 516 with the first through hole 536. [0070] 099112612 In addition, the step (S30) further includes mechanically fixing the carrier 51 and the fixed body coffee, so that the carbon nanotube support 520 is held by the carrier 510 and fixed. Between 53 〇. In this embodiment, the step (S30) 'locks the buckle 538 of the second ring 532 and the slit 518 of the first ring 512 during the process of closing the implant body and the fixed body. 'The carrier 51 〇 and the fixed body 53G ′ are fixed to each other such that the carbon nanotube branch body (10) is fixed between the carrier 510 and the fixed body 53 。. In addition, the manufacturing method of the TEM micro-gate 5G is not limited to the above step 'where 'the step CS30 can be placed between the step (S21) and the step (S22); at this time, the thin nano tube The structure 522 is disposed between the carrier 510 and the fixed body 530. Therefore, the step (S22) may infiltrate the carbon nanotube structure 522 'the carrier 510 and the fixed body 530 into a container containing an organic solvent. For organic solvent treatment. Step (S23) cutting the excess carbon nanotube structure 522 along the outer edge of the first ring 512 or the second ring 532 to obtain the carbon nanotube support 520' and the carbon nanotube support 52 is disposed between the carrier 510 and the fixed body 530. In addition, when the carbon nanotube structure 522 provided in the step (S20) includes the form number A0101, page 26/56 pages 0992022306-0 [0071] 201137922, a plurality of carbon nanotube films or a plurality of nano carbon pipelines, The TEM micro-gate 5〇 may be prepared by disposing a part of the carbon nanotube structure in the carbon nanotube structure 522 on the carrier 510. On the first through hole 516, another part of the carbon nanotube structure in the carbon nanotube structure 522 is disposed on the second through hole 536 of the fixed body 530; and then stacked with a carbon nanotube a fixed body 530 and a carrier 51 having a carbon nanotube structure to form the carbon nanotube support 520 ' and such that the carbon nanotube support 52 is disposed with the first through hole 516 and Between the two through holes 536. [0072] The present invention further provides a method for preparing a plurality of TEM micro-gates, the method comprising the steps of: (Sii) providing a plurality of carriers 51, the plurality of carriers 510 being spaced apart from a substrate surface, Each carrier 51A has a first through hole 516; (S120) provides a carbon nanotube structure 522, and the carbon nanotube structure 522 covers the first through hole 516 of the plurality of cleavage bodies 51; S130) providing a plurality of fixing bodies 53〇, each fixing body 530 has a second through hole 536, and the pair of fixing bodies 53〇 and the carrier 510 are set to: The carbon nanotube structure 522 is fixed between the plurality of carriers 510 and the plurality of fixed bodies ο, and (S140) disconnects the carbon nanotube structure between the plurality of carriers 51 〇 522, thereby forming a plurality of TEM micro-gates 5. [0073] wherein the surface of the substrate in the step (S110) is a plane 'the material is not limited, and may be ceramic, glass, etc. adjacent The distance between the two carriers 510 should not be too large or too small, and too large is not conducive to improving transmission power. The production efficiency of the micro-gate 50 is too small to increase the difficulty in processing the carbon nanotube structure 522 in the subsequent steps, which is disadvantageous for reducing the production cost. When in the 099112612 form nickname A0101 page 27 / 56 pages 0992022306-0 201137922 follow-up When the carbon nanotube structure 522 is processed by the laser beam irradiation method in the step, the distance between the adjacent two carriers 510 should be larger than the diameter of the spot formed by the laser beam irradiated on the surface of the carbon nanotube structure 522. The distance between the adjacent two carriers 510 is preferably 50 to 200 micrometers. Further, in order to improve the utilization of the carbon nanotube structure 522 and facilitate cutting, the plurality of carriers 510 may be closely and regularly arranged in the The structure of the carrier 510 and the fixing body 530 may be the structure of the carrier and the fixing body in the first to fourth embodiments. [0074] wherein the step (S120) and the The embodiment of the step (S20) is the same. The step (S130) is the same as the embodiment of the step (S30), wherein the number of the fixed bodies 530 is the same as the number of the carriers 510, Each of the carriers 510 has a fixing body 530 coupled thereto. [0075] The step (S140) may irradiate the carbon nanotube structure 522 between the adjacent carriers 510 by a laser beam. Specifically, the following three methods may be employed. [0076] Method 1: irradiating the carbon nanotube structure 522-circumferential along the outer edge region of each carrier 510 with a laser beam, such that the diameter of the carbon nanotube structure 522 overlying the carrier 510 is smaller than Equal to the outer diameter of the carrier 510, forming a separate region surrounding the carrier 510 along the outer edge of the carrier 510, such that the carbon nanotube structure 522 overlying the plurality of carriers 510 and the plurality of carriers are overlaid The carbon nanotube structure 522 other than 510 is separated. [0077] Method 2: Moving the laser beam, illuminating the carbon nanotube structure 522 between all the carriers 510, thereby removing the carbon nanotube structure between all the carriers 510. 099112612 Form No. A0101 Page 28/56 of 0992022306 -0 522.201137922 [0078] [0082] Method 3: When the plurality of carriers 51 are arranged in an array on the surface of the substrate, the laser beam is moved along The carbon nanotube structure 522 covering the inter-row and inter-column spaces of the plurality of carriers 510 is linearly illuminated to break the carbon nanotube structure 522 between the plurality of carriers 510. In the step of disconnecting the carbon nanotube structure 522 between the plurality of carriers 510, the line of the laser beam moving and illuminating can be understood by computer program control, and the steps (S130) and (S140) are implemented. The order system: . . . . . can be in no particular order, you can choose the actual situation. Referring to Figures 12 and 13, a sixth embodiment of the present invention provides a transmission micromirror 60. The TEM micro-gate 60 includes a section 610, a carbon nanotube support 620, and a fixed body 630. The carbon nanotube support 620 is disposed between the carrier 610 and the fixed body 630. Preferably, the TEM micro-gate 60 has an outer diameter of 3 mm and a disk-like structure having a thickness of 3 μm to 20 μm. The carrier 610 is a disk-shaped porous structure, and includes a first wafer-shaped body 611 ′. The first wafer-shaped body 611 includes a first ring 612 and a first mesh structure 614. The first circle The ring 612 has a through hole, and the first mesh structure 614 is disposed at the through hole, and a plurality of first through holes 616 are formed. The fixed body 630 is a disk-shaped porous structure, and includes a second disk-shaped body 631. The second disk-shaped body 631 includes a second ring 632 and a second mesh structure 634. The ring 632 has a through hole 'and the second mesh structure 634 is disposed at the through hole, 099112612 form number Α0101 page 29/56 page 0992022306-0 201137922 and forms a plurality of second through holes 636. An edge of the carrier 610 and an edge of the fixing body 630 are disposed in contact with each other, and a soldering element 640 is disposed at the contact portion. [0083] The structure of the carrier 610 and the fixing body 630 is the same as that of the TEM microgrid 10 of the first embodiment. The structure of the carrier 610 and the fixing body 630 are similar, except that the edge of the first wafer-shaped body 611 and the edge of the second wafer-shaped body 631 form a surface-to-line contact. Specifically, the first ring 612 has a first surface 618, that is, the first surface 618 of the first ring 612 is a planar structure. The cross section of the first ring 612 has a shape of a rectangular shape, a semicircular shape, a triangular shape, or a trapezoidal shape. The second ring 632 has a second surface 638. The shape of the second surface 638 of the second ring 632 may be a curved surface or a ridge line. Therefore, when the edge of the first ring 612 is in contact with the edge of the second ring 632, it is a face-to-line contact. The specific structure of the carrier 610 and the fixing body 630 are not limited as long as the edge of the fixing body 630 and the edge of the carrier 610 can achieve line-to-plane contact to form a line contact, for example, when When the surface of the carrier 610 in contact with the carbon nanotube support 620 is a flat surface, the fixed body 630 may also be composed of a second ring 632 or a second ring 632 and a plurality of strips. The surface of the second ring 632 contacting the carbon nanotube support 620 is a curved surface or a ridge line. The first ring 612 in this embodiment has a rectangular cross section, and the second ring 632 has a circular cross section; therefore, the first surface 618 of the first ring 612 and the second circle The second surface 638 of the ring 632 can achieve line contact. [0084] The carbon nanotube support body 62 0 and the carbon nanotube support in the first embodiment 099112612 Form No. A0101 Page 30 / Total 56 Page 0992022306-0 201137922 [0085] Ο [0086] 〇 [0087] ] 099112612 Body 120 is identical 'comprising at least one carbon nanotube film, or a carbon nanotube network composed of at least one nano carbon line. In this embodiment, the carbon nanotube support 620 comprises two layers The carbon nanotube film is stacked, and the carbon nanotubes in the two layers of carbon nanotube film are vertically disposed to form a plurality of uniform and regularly arranged micropores. The pore diameter of the micropores may be 1 nm~ 1 micron of the welding element 640 is formed by welding the carrier 610 and the fixing body 630 and is located at the contact of the first ring 612 and the second ring 632, specifically, the welding element 640 is disposed at The first surface 618 of the first ring 612 is in line contact with the upper surface 638 of the second ring 632; the first ring 612 and the second ring 632 are spot welded at the line contact Welding, welding, etc., to fix the carrier 61〇 and the fixed body 630; The carbon nanotube support 62 is fixed between the carrier 610 and the fixed body 630. In this embodiment, the welding element 640 is a plurality of spot welding points. The invention also provides a method for preparing a transmission electron microscope micro-shank by means of welding, the method comprising the following steps: providing -~ Gongyi nanometer; 6 carbon tube a structure, and a fixed body, wherein 'the carrier has a first, the fixed body has a second through hole; the fixed Zhao and the holes are stacked, and the carbon nanotube structure is disposed on Between the fixed body and the fixed body; and the carrier and the fixed welding body and the carrier have a first ring 'the first ring has _, and another through hole, the at least one first The through hole is disposed at the through hole of the first ring, the foot body has a second ring, the second ring has a through hole, and the second through hole is disposed on the second ring. Through hole. And read to form number Α0101, page 31/56 pages λ ^ Μ $ 〇"2 kiss 30s, n 201137922 The first ring has a first surface, and the second ring has a second surface, The second surface is disposed opposite the first surface. [0088] The carbon nanotube structure is at least one carbon nanotube membrane, at least one nanocarbon pipeline, or at least one nanocarbon tubular network. The at least one carbon nanotube membrane or at least one nanocarbon pipeline is directly extracted from an array of carbon nanotubes. The carbon nanotube network structure is woven or combined in a certain order by the at least one nano carbon line.

V composed of. [0089] The step of laminating the fixed body and the carrier further comprises treating the carbon nanotube structure with an organic solvent. [0090] When the fixing body is stacked with the carrier, the edge of the fixing body forms a line-to-face contact with the edge of the carrier, which is advantageous for achieving alignment between the fixing body and the carrier, especially Actually, the first through hole and the second through hole are aligned one by one. Referring to FIG. 14, the embodiment specifically provides a method of preparing the above-described TEM micro-gate 60. The preparation method comprises the steps of: (W10) providing the carrier 610, a carbon nanotube structure 622, and the fixing body 630; (W20) laminating the fixing body 630 and the carrier 610, and arranging the nai a carbon nanotube structure 622 is disposed between the carrier 610 and the fixed body 630; and (W30) soldering the carrier 610 and the fixing body 630 to the carbon nanotube structure 622 in the step (W10) The preparation method is the same as the carbon nanotube structure 522 and the preparation method thereof in the preparation method of the TEM micro-gate 50 provided by the fifth embodiment. Wherein, the first ring 612 has a 099112612 form number A0101 page 32 / a total of 56 pages 0992022306-0 201137922 [0093] [0094] Ο

There is a first surface 618, the first surface 618 is a plane; the second ring 632 has a second surface 638, and the second surface 638 is in the shape of a curved surface or a ridge line, and the first circle The first surface 618 of the ring 612 forms a line-to-face contact. It will be appreciated that the carbon nanotube structure 622 can also be at least one carbon nanotube network or at least one nanocarbon line. The step (W20) comprises the steps of: (W21) disposing the carbon nanotube structure 6 22 on the first surface 618 of the first ring 612 of the carrier 610; (W22) being placed in a container 660 The organic solvent 662 processes the carbon nanotube structure 622 covering the first through hole 616 of the carrier 610; (W23) removing the excess carbon nanotube structure 622 to form the carbon nanotube support 620; And (W24) disposing the fixing body 630 on the carbon nanotube support body 620 such that the second through hole 636 and the first through hole 616 are at least partially overlapped. Specifically, the step (W24) causes the second surface 638 of the second ring 632 to face the first surface 618 of the first ring 612, and the second through hole 636 and the first A through hole 616 - a corresponding overlapping arrangement. Among them, the methods specifically employed in the steps (W21) to (W23) are the same as those specifically employed in the steps (S21) to (S23). The order of the steps (W21), (W22), and (W23) can be determined as needed. For example, the steps of the step (W21) and the step (W22) may be interchanged, that is, the carbon nanotube structure 622 may be first treated with an organic solvent, and then the carbon nanotube structure 62 2 may be disposed on The surface of the carrier 610. The step (W30) specifically includes the following steps: First, a pressure is applied to the first ring 612 and the second ring 632 by a welding system so that the 099112612 form number Α0101 page 33/56 page 0992022306-0 [ 0109522 The first surface 618 of the first ring 612 is in line contact with the second surface 638 of the second ring 632; then, at the first surface of the first ring 612 and the second second ring 632 The line contact of the surface 638 is welded. During the welding process, a large amount of heat is generated at the line contact, and the materials of the first ring 612 and the second ring 632 in the hottest region of the center are quickly heated to a stun state, and the pressure is continued to be applied. After the ring 612 and the second ring 632 are cooled, the first ring 612 and the second ring 632 are welded together to form the welding element 640 at the weld. Therefore, the material of the welding element 640 is the same as that of the first ring 612 and the second ring 632. In this embodiment, the welding system is a spot welder, and the welding element 640 is a solder joint. In this step (W30), the carrier 610 and the fixing body 630 are welded together by wire-to-plane contact, and the alignment of the carrier 610 and the fixing body 630 can be relatively easily realized. [0096] Further, when the carbon nanotube structure 622 provided by the step (wio) comprises a plurality of carbon nanotube membranes or a plurality of nanocarbon pipelines, or a plurality of carbon nanotube networks, The TEM may be prepared by: the step (wio) remaining unchanged, and the step (w2〇) may be performed by setting a part of the carbon nanotube structure in the nano-tube structure 622 to On the first through hole 616 of the carrier 610, another part of the carbon nanotube structure in the carbon nanotube structure 622 is disposed on the second through hole 636 of the fixing body 63〇. Then there will be The carbon nanotube structure fixed body 630 is disposed opposite to the carrier 610 having a carbon nanotube structure, and forms the carbon nanotube support body 620 such that the carbon nanotube support body 62 is fixed to the The carrier 610 is disposed between the carrier 610 and the fixed body 630. [0097] The present invention also provides a method for preparing a plurality of TEM micro-gates 6 126 991 991 991 991 991 099112612 Form No. A0101 Page 34 / Total 56 Page 0992022306-0 201137922 Ο [0098] [ 0099] Ο [0100] [0101] The method comprises the following steps: (πιο.) providing a plurality of spaced-apart carriers 610 each having a first through hole 616; (W120) providing a carbon nanotube structure 622' and covering the plurality of carriers 610 with the carbon nanotube structure 622 a first through hole 616; (W130) providing a plurality of fixing bodies 630' such that each of the fixing bodies 630 and the carrier 610 are disposed in a stacking manner such that the carbon nanotube structure 622 is disposed on the plurality of carriers 61 Between the plurality of fixed bodies 630; (W140) soldering each of the fixed bodies 630 to the carrier 610; and (W150) breaking the carbon nanotube structure between the plurality of carriers 61 622, thereby forming a number of TEM micro-gates 6 。. The steps (10), (W120) and (50) are sequentially performed with the steps (sii), and (sl4) The carrier 610 and the fixing body 630 may be independent and separated structures; the 邡 以 is a unitary structure. The implementation of the step (W13) is substantially the same as the step of the step (W24). Wherein the number of the fixed bodies 630 is the same as the number of the carriers 610, Each of the carriers 610 is disposed in a stacked manner with a fixed body 630. The embodiment of the step (W14) is substantially the same as the embodiment of the step (W30). Each of the carriers 610 is welded to a fixed body 630. It is understood that The second embodiment, the third embodiment, the fourth embodiment, and the fifth embodiment also fabricate a TEM microgrid by welding the carrier and the fixing body together by the above method. It will be understood that the carrier in the embodiment of the invention may be interchanged with the structure of the ligand. 099112612 Form No. 101 0101 Page 35 / Total 56 Page 0992022306-0 201137922 [0102] The TEM micro-gate provided by the embodiment of the present invention and the preparation method thereof have the following advantages: the first 'the carbon nanotube structure is disposed in the Between the carrier and the fixed body, when the TEM microgrid is used, the device holding the TEM microgrid can be prevented from directly contacting the carbon nanotube structure, and the quality of the carbon nanotube structure is light. The drift of the carbon nanotube structure also reduces the contamination of the carbon nanotube structure by the holding device, thereby facilitating the accuracy and resolution of the composition analysis using the transmission electron microscopy of the TEM. Secondly, the carrier and the fixing body are fixed by means of snapping and welding, so that the carbon nanotube structure is fixed between the carrier and the fixed body, and the carbon nanotube structure is not drifted. Therefore, it is more advantageous to improve the accuracy and resolution of the component analysis of the TEM using the TEM micro-gate. Third, the preparation method of the TEM micro-gate provided by the embodiment of the present invention is simple, quick, and relatively easy. The carbon nanotube structure is fixed in the TEM micro-gate, and it is relatively easy to achieve alignment between the carrier and the fixed body, and in particular, it is relatively easy to achieve precise alignment of the first through hole and the second through hole. [0103] :* ..*; In summary, the present invention has indeed met the requirements of the invention patent, and the patent application is filed according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by those skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an exploded perspective view showing a TEM micro-gate according to a first embodiment of the present invention. [0105] FIG. 2 is a perspective view showing a micro-frequency of a transmission electron microscope according to a first embodiment of the present invention. 099112612 Form number face 1 ^ 36 56 H 0992022306-0 201137922 [0106] FIG. 3 is a perspective exploded view of a TEM microgrid according to a second embodiment of the present invention. [0107] FIG. 4 is a TEM according to a second embodiment of the present invention. A perspective view of the microgrid. 5 is an exploded perspective view showing a TEM micro-gate according to a third embodiment of the present invention. [0109] FIG. 6 is a perspective view showing a TEM micro-gate according to a third embodiment of the present invention. 7 is an exploded perspective view showing a TEM micro-gate according to a fourth embodiment of the present invention. [0111] FIG. 8 is a perspective view showing a TEM micro-gate according to a fourth embodiment of the present invention. . : ;.':.

9 is a perspective exploded view of a TEM microgrid according to a fifth embodiment of the present invention.

10 is a perspective view showing a TEM microgrid according to a fifth embodiment of the present invention. 11 is a flow chart for preparing a TEM micro-gate according to a fifth embodiment of the present invention. 〇 [0115] FIG. 1 is a TEM of a sixth embodiment of the present invention. A perspective view of the carrier and the fixed body. 13 is a cross-sectional view showing a TEM microgrid of a sixth embodiment of the present invention. [01] FIG. 14 is a flow chart for preparing a TEM microgrid according to a sixth embodiment of the present invention. [Main component symbol description] [0118] Transmission electron microstrip: 10; 20; 30; 40; 50; 60 [0119] Carrier: 110; 210; 310; 410; 510; 610 0992022306-0 Form No. A0101 099112612 Page 37 of 56 201137922 [0120] First wafer-shaped body: 111; 211; 311; 511; 611 [0121] First ring: 112; 212; 312; 412; 512; 612 [0122] first mesh structure: 114; 314; 514; 614 [0123] first through hole: 116; 216; 316; 416; 516; 616 [0124] Slit: 118; 218; 318; 418; 518 [0125] carbon nanotube support: 120; 220; 320; 420; 520; 620 [0126] fixed body: 130; 230; 330; 430 530; 630 [0127] Second wafer-like body: 131; 231; 431; 531; 631 [0128] Second ring: 132; 232; 332; 432; 532; :..: .632 [0129] Second mesh structure: 134; 534; 634 [0130] second through hole: 136; 236; 336; 436; 536; 636 [0131] snap: 138; 238; 338; 438; 38 [0132] Third via: 150 f ": [0133] First strip structure: 214 [0134] Second strip structure: 234 [0135] Third via: 250 [0136] Fold: 550 [0137] First surface: 618 [0138] Carbon nanotube structure: 522; 622 Form No. A0101 Page 38 / Total 56 Page 099112612 0992022306-0 201137922 [0139] Second surface: 638 [0140] Welding element: 640 Container: 560; 660 [0142] Organic Solvent: 562; 662 〇〇099112612 Form No. A0101 Page 39/56 Page 0992022306-0

Claims (1)

201137922 VII. Patent application scope: 1. A TEM micro-grid, the improvement comprising: a carrier having a first through hole; a carbon nanotube support body disposed on a surface of the carrier and covering the a first through hole of the carrier; and a fixing body having a second through hole, the carbon nanotube support being disposed between the carrier and the fixed body. The TEM micro-gate according to claim 1, wherein the second through hole of the fixing body is disposed opposite to the first through hole of the carrier, and the carbon nanotube support is disposed in a relative setting Between the second through hole and the first through hole. 3. The TEM micro-gate according to claim 2, wherein the carbon nanotube support is a self-supporting unitary structure, and the oppositely disposed first through holes are matched with the second through holes. At least one third through hole is formed, and the carbon nanotube support is suspended at the third through hole. 4. The TEM micro-gate according to claim 1, wherein the carrier is a ring structure, and the fixed body is a ring structure. 5. The TEM microgrid according to claim 1, wherein the fixed body is a disk-shaped porous structure, and the disk-shaped porous structure comprises a disk-shaped body having a plurality of disk-shaped bodies Through hole. 6. The TEM micro-gate according to claim 1, wherein the carrier is a disk-shaped porous structure and has a plurality of first through holes; the fixed body is a disk-shaped porous structure, and There are a plurality of second through holes, and the plurality of second through holes are correspondingly arranged with the plurality of first through holes. The TEM micro-gate according to claim 1, wherein the first through hole and the second through hole have a circular shape, a quadrangular shape, a hexagonal shape, an octagonal shape or an elliptical shape. The TEM micro-gate according to claim 1, wherein the carrier and the fixed body are mechanically fixed and will be fixed by the method of the present invention. The carbon nanotube support is held between the carrier and the fixed body. 9. The TEM micro-gate according to claim 8, wherein the carrier and the fixed body have a joint at which a fold is formed, and the carrier and the fixed body pass through the folded portion. Active connection. The TEM micro-gate according to claim 9, wherein the edge of the carrier is welded to the edge of the fixed body. The TEM micro-gate according to claim 10, wherein the The edge of the carrier forms a line-to-face contact with the edge of the fixture. The TEM micro-gate according to claim 8, wherein the carrier is provided with a slit, and the fixing body is provided with a buckle, and the buckle is matched with the slit for fixing The carrier and the immobilizer. 13. The TEM microgrid of claim 1, wherein the carbon nanotube support comprises at least one layer of carbon nanotube film. 14. The TEM micro pepper according to claim 13, wherein the carbon nanotube film is composed of a plurality of carbon nanotubes, and the plurality of carbon nanotubes are arranged in a preferred orientation in the same direction. Most of the carbon nanotubes in the carbon nanotube membrane are connected end to end by Van der Waals force. The TEM microgrid according to claim 14, wherein the carbon nanotube support comprises a plurality of layers of carbon nanotube film. The TEM microgrid according to claim 1, wherein the carbon nanotube support is a carbon nanotube network structure, and the carbon nanotube network structure is composed of at least one nanometer. Carbon line composition. 17. The TEM microgrid according to claim 1, wherein the carbon nanotube support has a plurality of micropores, and the pore size of the micropores is 1 micron. 099112612 Form No. A0101 Page 41 of 56 Page 0992022306-0 201137922 ~ 200 microns. 099112612 Form No. A0101 Page 42 of 56 0992022306-0