TW201129866A - Actinic-radiation curable composition - Google Patents
Actinic-radiation curable compositionInfo
- Publication number
- TW201129866A TW201129866A TW099134190A TW99134190A TW201129866A TW 201129866 A TW201129866 A TW 201129866A TW 099134190 A TW099134190 A TW 099134190A TW 99134190 A TW99134190 A TW 99134190A TW 201129866 A TW201129866 A TW 201129866A
- Authority
- TW
- Taiwan
- Prior art keywords
- actinic
- parts
- radiation
- curable composition
- radiation curable
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- KLDXJTOLSGUMSJ-JGWLITMVSA-N Isosorbide Chemical compound O[C@@H]1CO[C@@H]2[C@@H](O)CO[C@@H]21 KLDXJTOLSGUMSJ-JGWLITMVSA-N 0.000 abstract 1
- 239000012298 atmosphere Substances 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 229960002479 isosorbide Drugs 0.000 abstract 1
- 239000012299 nitrogen atmosphere Substances 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Provided is an actinic-radiation curable composition which has excellent actinic-radiation sensitivity and which, even when irradiated with actinic radiation in an oxygen-containing atmosphere, can provide a cured coating film having hardness equivalent to that attained when irradiated therewith in a nitrogen atmosphere. Further, the actinic-radiation curable composition can provide a cured coating film which has excellent hardness, moisture resistance, heat resistance, and chemical resistance. A composition which comprises (a) isosorbide di(meth)acrylate, (b) a polymerizable unsaturated compound other than the component (a), and (c) an initiator for actinic-radiation polymerization and in which the contents of the components (a) and (b) are each 5 to 95 parts by mass per 100 parts by mass of the sum total of the components (a) and (b), and the content of the component (c) is 0.1 to 20 parts by mass per 100 parts by mass of the sum total of the components (a) and (b).
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009240375 | 2009-10-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201129866A true TW201129866A (en) | 2011-09-01 |
| TWI490643B TWI490643B (en) | 2015-07-01 |
Family
ID=43899995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099134190A TWI490643B (en) | 2009-10-19 | 2010-10-07 | Active energy line hardening composition |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5623419B2 (en) |
| KR (1) | KR101549294B1 (en) |
| CN (1) | CN102686620B (en) |
| TW (1) | TWI490643B (en) |
| WO (1) | WO2011048750A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140364530A1 (en) * | 2012-03-30 | 2014-12-11 | Allnex Belgium S.A. | Radiation curable (meth)acrylated compounds |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014518560A (en) | 2011-04-05 | 2014-07-31 | オルネクス ベルギウム ソシエテ アノニム | Radiation curable composition |
| JP5748209B2 (en) * | 2011-05-25 | 2015-07-15 | 関西ペイント株式会社 | Coating composition and coated article |
| JP2013018848A (en) * | 2011-07-09 | 2013-01-31 | Kansai Paint Co Ltd | Active energy ray-curable composition and coated article |
| US9932438B2 (en) | 2011-12-16 | 2018-04-03 | 3M Innovative Properties Company | Oxirane-containing bisanhydrohexitol derivatives and uses thereof |
| EP2644589A1 (en) | 2012-03-30 | 2013-10-02 | Cytec Surface Specialties, S.A. | Radiation Curable (Meth)acrylated Compounds |
| FR3003574B1 (en) * | 2013-03-19 | 2016-01-08 | Roquette Freres | CROSSLINKABLE COMPOSITIONS BASED ON COMPOUNDS OF DIANHYDROHEXITOL (METH) ACRYLATED DERIVATIVES |
| CA2981703C (en) * | 2015-04-03 | 2023-08-22 | Henkel IP & Holding GmbH | Anaerobic curable compositions |
| JP6279800B1 (en) * | 2017-08-30 | 2018-02-14 | 日本ペイント・オートモーティブコーティングス株式会社 | Active energy ray-curable coating composition |
| KR102233510B1 (en) | 2020-07-09 | 2021-03-29 | 주식회사 디아이티이엔지 | A support pillar for a CCTV camera |
| JP7547618B2 (en) * | 2021-03-29 | 2024-09-09 | 三井化学株式会社 | Curable polyurethane resin composition, cured product and laminate |
| CN114395075B (en) * | 2022-01-20 | 2023-02-28 | 上海交通大学医学院附属第九人民医院 | Dental zero-filler permeable resin and preparation method thereof |
| WO2025216511A1 (en) * | 2024-04-08 | 2025-10-16 | 삼양이노켐 주식회사 | Diacrylate composition, preparation method therefor, and curable composition comprising diacrylate composition |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB586141A (en) * | 1944-05-30 | 1947-03-07 | Walter Norman Haworth | Preparation of acrylic and methacrylic resinoid derivatives |
| JP3960417B2 (en) * | 2001-11-06 | 2007-08-15 | アイカ工業株式会社 | TRANSFER SHEET USING ACTIVE ENERGY RAY-CURABLE RESIN COMPOSITION, PROCESS FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING DECORATIVE BOARD USING THE TRANSFER SHEET |
| DE10204235A1 (en) * | 2002-02-02 | 2003-08-14 | Wella Ag | Aqueous polymer latex based on poly-unsaturated carbohydrate monomers, useful e.g. for the production of pharmaceutical or cosmetic carrier materials, fibre composite materials, coating materials and adhesives |
| JP2003306491A (en) | 2002-04-18 | 2003-10-28 | Fuji Photo Film Co Ltd | Optically active isosorbide derivative and production method thereof, photoreactive chiral agent, liquid crystal composition, liquid crystal color filter, optical film and recording medium, method for changing liquid crystal helical structure, method for fixing liquid crystal helical structure |
| JP4216520B2 (en) | 2002-04-18 | 2009-01-28 | 富士フイルム株式会社 | Optically active isosorbide derivative and production method thereof, photoreactive chiral agent, liquid crystal composition, liquid crystal color filter, optical film and recording medium, method for changing liquid crystal helical structure, method for fixing liquid crystal helical structure |
| JP4234943B2 (en) * | 2002-04-22 | 2009-03-04 | 富士フイルム株式会社 | Optically active isomannide derivative and production method thereof, photoreactive chiral agent, liquid crystal composition, liquid crystal color filter, optical film and recording medium, method for changing liquid crystal helical structure, method for fixing liquid crystal helical structure |
| US20090018300A1 (en) * | 2007-07-11 | 2009-01-15 | Archer-Daniels-Midland Company | Monomers and polymers from bioderived carbon |
-
2010
- 2010-09-21 JP JP2011537112A patent/JP5623419B2/en not_active Expired - Fee Related
- 2010-09-21 WO PCT/JP2010/005720 patent/WO2011048750A1/en not_active Ceased
- 2010-09-21 CN CN201080045570.2A patent/CN102686620B/en not_active Expired - Fee Related
- 2010-09-21 KR KR1020127007444A patent/KR101549294B1/en not_active Expired - Fee Related
- 2010-10-07 TW TW099134190A patent/TWI490643B/en not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140364530A1 (en) * | 2012-03-30 | 2014-12-11 | Allnex Belgium S.A. | Radiation curable (meth)acrylated compounds |
| TWI561552B (en) * | 2012-03-30 | 2016-12-11 | ALLNEX Belgium SA | Radiation curable (meth) acrylated compounds |
| US9540310B2 (en) * | 2012-03-30 | 2017-01-10 | Allnex Belgium S.A. | Radiation curable (meth)acrylated compounds |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2011048750A1 (en) | 2013-03-07 |
| CN102686620B (en) | 2014-11-05 |
| KR101549294B1 (en) | 2015-09-01 |
| KR20120083353A (en) | 2012-07-25 |
| WO2011048750A1 (en) | 2011-04-28 |
| TWI490643B (en) | 2015-07-01 |
| JP5623419B2 (en) | 2014-11-12 |
| CN102686620A (en) | 2012-09-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |