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TW201129635A - Composition for organic semiconductor alignment, organic semiconductor aligning film, organic semiconductor element and method for manufacturing the same - Google Patents

Composition for organic semiconductor alignment, organic semiconductor aligning film, organic semiconductor element and method for manufacturing the same

Info

Publication number
TW201129635A
TW201129635A TW099140696A TW99140696A TW201129635A TW 201129635 A TW201129635 A TW 201129635A TW 099140696 A TW099140696 A TW 099140696A TW 99140696 A TW99140696 A TW 99140696A TW 201129635 A TW201129635 A TW 201129635A
Authority
TW
Taiwan
Prior art keywords
organic semiconductor
alignment
group
composition
manufacturing
Prior art date
Application number
TW099140696A
Other languages
Chinese (zh)
Other versions
TWI475075B (en
Inventor
Masayuki Kimura
Hiroyuki Yasuda
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2010000831A external-priority patent/JP5564951B2/en
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW201129635A publication Critical patent/TW201129635A/en
Application granted granted Critical
Publication of TWI475075B publication Critical patent/TWI475075B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thin Film Transistor (AREA)
  • Liquid Crystal (AREA)

Abstract

An object of the present invention is to provide a composition for organic semiconductor alignment capable of forming an organic semiconductor film which has good sensitivity of photo-alignment, and it is capable of realizing stability of carrier mobility by high thermal-resistance while displaying excellent carrier mobility by high level of isotropic alignment of organic semiconductor molecules. The present invention provides a composition for organic semiconductor alignment comprising [A] a polyorganosilxane compound having photo aligning group. The photo aligning group is preferable a group having cinnamic acid structure. The group having cinnamic acid structure is preferable at least one selected from the group consisted of a group derived from a compound represented by following formula (1) and a group derived from a compound represented by following formula (2).
TW099140696A 2009-11-26 2010-11-25 Organic semiconductor alignment composition, organic semiconductor alignment film, organic semiconductor element, and method of manufacturing the same TWI475075B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009269353 2009-11-26
JP2010000831A JP5564951B2 (en) 2010-01-05 2010-01-05 Composition for aligning organic semiconductor, organic semiconductor alignment film, organic semiconductor element and manufacturing method thereof

Publications (2)

Publication Number Publication Date
TW201129635A true TW201129635A (en) 2011-09-01
TWI475075B TWI475075B (en) 2015-03-01

Family

ID=44086083

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099140696A TWI475075B (en) 2009-11-26 2010-11-25 Organic semiconductor alignment composition, organic semiconductor alignment film, organic semiconductor element, and method of manufacturing the same

Country Status (3)

Country Link
KR (1) KR101642786B1 (en)
CN (1) CN102079876B (en)
TW (1) TWI475075B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI671926B (en) * 2014-09-29 2019-09-11 日商富士軟片股份有限公司 Method for producing organic semiconductor layer and organic transistor
US11098161B2 (en) 2016-10-04 2021-08-24 Nissan Chemical Corporation Polymer composition

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5747515B2 (en) * 2010-03-01 2015-07-15 Jsr株式会社 Composition for controlling alignment of organic EL illuminant, organic EL illuminant alignment control film, organic EL element and method for producing the same
CN102347448B (en) * 2011-06-28 2013-08-14 苏州大学 Application of high-fullerene liquid crystal molecule as heterojunction solar battery receptor material
WO2013187275A1 (en) * 2012-06-12 2013-12-19 株式会社ダイセル Solvent or solvent composition for organic transistor production
CN103264566B (en) * 2013-05-09 2015-08-19 无锡市中星工业胶带有限公司 A kind of heat resistant fire-proof plate BOPET diaphragm
JP6518184B2 (en) * 2015-12-01 2019-05-22 富士フイルム株式会社 Liquid crystal display device and method of manufacturing liquid crystal display device
JP7039166B2 (en) * 2016-09-30 2022-03-22 東京応化工業株式会社 Resin composition, method for producing cured product, and cured product
KR20190067847A (en) * 2016-10-11 2019-06-17 롤릭 테크놀로지스 아게 Photo-oriented copolymer material
CN111640874B (en) * 2020-05-07 2021-11-19 山东大学 Method for repairing surface step defect based on n-type organic semiconductor crystal and application
US11631818B2 (en) * 2020-08-06 2023-04-18 Meta Platforms Technologies, Llc OFETs having multilayer organic semiconductor with high on/off ratio

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004335932A (en) * 2003-05-12 2004-11-25 Konica Minolta Holdings Inc Organic thin film transistor and method of manufacturing the same
JP2007126647A (en) * 2005-10-07 2007-05-24 Jsr Corp Curable resin composition, method for forming protective film, and protective film
EP1818354B1 (en) * 2006-01-30 2010-10-20 JSR Corporation Liquid crystal aligning agent, alignment film and liquid crystal display device
JP5083540B2 (en) * 2007-03-20 2012-11-28 Ｊｓｒ株式会社 Radiation-sensitive protective film forming resin composition, method for forming protective film from the composition, liquid crystal display element, and solid-state imaging element
KR100964434B1 (en) * 2007-08-21 2010-06-16 제이에스알 가부시끼가이샤 Liquid crystal aligning agent, formation method of liquid crystal aligning film, and liquid crystal display element
JP2009289783A (en) 2008-05-27 2009-12-10 Toray Ind Inc Organic semiconductor multilayer film and organic field effect transistor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI671926B (en) * 2014-09-29 2019-09-11 日商富士軟片股份有限公司 Method for producing organic semiconductor layer and organic transistor
US11098161B2 (en) 2016-10-04 2021-08-24 Nissan Chemical Corporation Polymer composition
TWI744389B (en) * 2016-10-04 2021-11-01 日商日產化學工業股份有限公司 Polymer composition

Also Published As

Publication number Publication date
KR101642786B1 (en) 2016-07-26
TWI475075B (en) 2015-03-01
CN102079876B (en) 2014-10-15
CN102079876A (en) 2011-06-01
KR20110058648A (en) 2011-06-01

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees