TW201124280A - Release film - Google Patents
Release film Download PDFInfo
- Publication number
- TW201124280A TW201124280A TW99135398A TW99135398A TW201124280A TW 201124280 A TW201124280 A TW 201124280A TW 99135398 A TW99135398 A TW 99135398A TW 99135398 A TW99135398 A TW 99135398A TW 201124280 A TW201124280 A TW 201124280A
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- polyester
- film
- heat
- release film
- Prior art date
Links
- 229920000728 polyester Polymers 0.000 claims abstract description 81
- 239000010410 layer Substances 0.000 claims abstract description 67
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- 230000008018 melting Effects 0.000 claims abstract description 36
- 239000002344 surface layer Substances 0.000 claims abstract description 8
- 238000002425 crystallisation Methods 0.000 claims description 45
- 230000008025 crystallization Effects 0.000 claims description 44
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- 239000000126 substance Substances 0.000 claims 3
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- 230000000052 comparative effect Effects 0.000 description 13
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
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- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
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- 238000012360 testing method Methods 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
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- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
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- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
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- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- NCQKSUNJAAZVJW-UKTHLTGXSA-N (2e)-2-(2-phenylethylhydrazinylidene)propanoic acid Chemical compound OC(=O)C(/C)=N/NCCC1=CC=CC=C1 NCQKSUNJAAZVJW-UKTHLTGXSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- JDOGLHRXPDOFJQ-UHFFFAOYSA-N 2-[4-[3-[4-(2-hydroxyethoxy)phenyl]cyclohexyl]phenoxy]ethanol Chemical compound C1=CC(OCCO)=CC=C1C1CC(C=2C=CC(OCCO)=CC=2)CCC1 JDOGLHRXPDOFJQ-UHFFFAOYSA-N 0.000 description 1
- 241000486679 Antitype Species 0.000 description 1
- UUAGPGQUHZVJBQ-UHFFFAOYSA-N Bisphenol A bis(2-hydroxyethyl)ether Chemical compound C=1C=C(OCCO)C=CC=1C(C)(C)C1=CC=C(OCCO)C=C1 UUAGPGQUHZVJBQ-UHFFFAOYSA-N 0.000 description 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XMUZQOKACOLCSS-UHFFFAOYSA-N [2-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=CC=C1CO XMUZQOKACOLCSS-UHFFFAOYSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical group C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 239000012787 coverlay film Substances 0.000 description 1
- 239000003484 crystal nucleating agent Substances 0.000 description 1
- INSRQEMEVAMETL-UHFFFAOYSA-N decane-1,1-diol Chemical compound CCCCCCCCCC(O)O INSRQEMEVAMETL-UHFFFAOYSA-N 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229960002380 dibutyl phthalate Drugs 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- UGDVGCADUVDYET-UHFFFAOYSA-N ethane-1,2-diamine;hexanedioic acid Chemical compound [NH3+]CC[NH3+].[O-]C(=O)CCCCC([O-])=O UGDVGCADUVDYET-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- WPUMVKJOWWJPRK-UHFFFAOYSA-N naphthalene-2,7-dicarboxylic acid Chemical compound C1=CC(C(O)=O)=CC2=CC(C(=O)O)=CC=C21 WPUMVKJOWWJPRK-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
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- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
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- 238000004321 preservation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- QVKOLZOAOSNSHQ-UHFFFAOYSA-N prop-1-ene;prop-2-enoic acid Chemical compound CC=C.OC(=O)C=C QVKOLZOAOSNSHQ-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
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- 239000011342 resin composition Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
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- 238000010408 sweeping Methods 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N tetrahydrofuran Substances C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000003017 thermal stabilizer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical group O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Abstract
Description
201124280 • 六、發明說明: 【發明所屬之技術領域】 本發明係關於-種離型膜’特別係、關於—種印刷基板 之製造時所使用之離型膜。尤其有關一種於具有精密的圖 案之印刷基板上使用熱硬化性接著劑而熱沖壓接著覆蓋膜 (coverlay film)時有用的離型膜。 【先前技術】 離型膜係工業上被廣泛使用。尤其,在印刷線路基 板、可撓性印刷線路基板、多層印刷線路板等之製造步驟 中’隔著預浸體或耐熱膜而熱沖壓覆銅層合板或銅箱時, 用於防止預浸體或耐熱膜與沖壓熱板接著。進一步\在可 撓性印刷基板的製造步驟中,於形成電子電路之可挽性印 刷基板本體使用熱硬化型接著劑而熱沖壓接著覆蓋膜時, 用於防止覆蓋膜與沖壓熱板接著。 於此等用途所使用之離型膜係可舉例如氟系薄膜、聚 矽氧塗佈聚對酞酸乙二酯薄膜、聚曱基戊烯薄膜、聚丙稀 薄膜等。 但’自以在可使用來作為離型膜之氟系薄膜係於耐熱 性、離型性、非污染性優異’但除昂貴外,在使用後之廢 棄焚化處理中很難燃燒’且產生有毒氣體之問題點仍存在。 又,聚矽氧塗佈聚對酞酸乙二酯薄膜、聚甲基戊稀薄膜係 於薄膜組成中含有聚矽氧或低分子量體,藉由此等之轉移, 污染印刷線路基板、尤其基板上之銅電路’恐損及品質。 又,聚丙烯薄膜係耐熱性差,離型性不充分。 322465 3 201124280 因此’就柔軟性、耐熱性、離型性、非污染性優異且 可廢棄焚化之離型獏,已揭示以聚對酞酸丁二酯、聚對酞 酸丙二酯、聚對酞酸丁二酯與聚醚之嵌般共聚物作為離型 層之薄膜(專利文獻1)、或以此等作為緩衝層之薄膜(專利 文獻2)。 但’在如此之技術中,離型性及耐熱性、與柔軟性之 併存尚未充分。亦即’重視離型性及耐熱性係犧牲柔軟性, 對於具有精密圖案之印刷基板的埋入性係差。另外,重視 柔軟性時’除產生離型性降低或薄膜表面的潤滑性惡化 外’亦因彈性率降低造成薄膜捲取或栽切時延#或有皺摺 等’綜合性之處理作業性差。 [專利文獻1]國際公開第〇5/〇〇285〇號手冊 [專利文獻2]日本國專利第4〇99355號公報 【發明内容】 [發明欲解決之課題] 本發明之目的在於提供一種柔軟性、離型性、耐熱性、 非污染性優異,尤其對於具有精密圖案之印刷基板的埋入 性為良好,且薄片之捲取或裁切時之處理作業性優異的離 型膜。 [解決課題之手段] 本發明人係為了解決上述課題經專心研究之結果,發 現藉由將具有特定之結晶性的第1聚酯、及經將實質上為 非晶性之聚酯與結晶性之聚酯混合而控制結晶性之第2聚 酯進行層合,形成特定之結晶狀態,俾可提供一種具有優 322465 4 201124280 * 異之離型性、耐熱性、埋入性同時處理作業性亦優異之薄 、 膜’終完成本發明。 亦即,本發明之要旨係如下。 (1) . 一種離型膜’其係以具有配置於表層之結晶性聚醋(A) 層、與聚酯(B)層之層合膜所構成’(A)層係結晶熔化熱為 35至50J/g、結晶化速度指標為未達5(TC,(B)層係結晶 熔化熱為20至40J/g、結晶化速度指標為未達60°C。 (2) .如(1)項之離型膜,其中(A)層係結晶熔化熱為38至 45J/g、結晶化速度指標為40至46°C,(B)層係結晶熔化 熱為21至36J/g、結晶化速度指標為47至57°c。 (3) .如(1)或(2)項之離型膜,其中聚醋層為含有實質上 為非晶性之聚酯(I) 20至50質量%,含有結晶性聚酯(II) 80至50質量%者。 (4) .如(3)項之離型膜,其中(B)層之非晶性聚酯(I)的玻璃 轉移溫度為30至120°C。 (5) .如(1)至(4)項中任一項之離型膜’其中結晶性聚酯(A) 為聚對醜酸丁二醋。 (6) .如(1)至(5)項中任一項之離型膜,其中(β)層之結晶性 聚酯(II)為聚對酞酸丁二酯與聚醚之嵌段共聚物。 【實施方式】 以下詳細說明本發明。 本發明之離变膜,係具有配置於表層之結晶性t §曰(八) 層、與特定之聚酯(B)層之層合膜。由聚酯樹脂所構成,故 無如使用各種烯煙系樹脂之薄膜的釋氣所造成的問通。 322465 5 201124280 〈聚S旨(A)層〉 聚酯(A)係配置於離型膜之表層而作為離型層功能。 聚酯(A)宜為結晶性芳香族聚醋,可例示聚對酞酸乙二酯 (PET)、聚對酞酸丁二醋(PBT)、聚對酞酸丙二酯。其 中,從耐熱性或高結晶性之觀點,尤宜為ΡΒΤ。 除上述PET、ΡΒΤ、ΡΤΤ之外’可使用由各種之芳香族 二羧酸成分與二醇成分所衍生之聚酯作為結晶性芳香族聚 酯。又,亦可為使如此之結晶性芳香族聚酯與PET、ΡΒΤ、 ΡΤΤ之任一者共聚合而成者。 芳香族二叛酸成分可舉例如間醜酸、醜酸、萘-2, 6-二羧酸、萘-2, 7-二羧酸、二苯基-4,4,_二羧酸、二苯氧 基乙燒二叛酸、5_續基間醜酸、或此等之酯形成性衍生物。 二醇成分宜為分子量300以下之二醇。可舉例如乙二 醇、丙二醇、戊二醇、己二醇、新戊二醇、癸二醇等之脂 肪族二醇;丨,4-環己烷二甲醇、三環癸烷二甲醇等之脂環 式二醇;苯二甲醇、雙(對羥基)聯苯、雙(對羥基苯基)丙 烷、2, 2-雙[4-(2-羥基乙氧基)苯基]丙烷、雙[4_(2_羥基) 苯基]碾、M—雙[4-(2-羥基乙氧基)苯基]環己烷、4,4,_ 一羥基-對聯三苯、4, 4’ -二羥基-對聯四苯等之芳香族二 醇等此等之一叛成分及一醇成分可併用2種以上。 又,亦可使3官能以上之多官能羧酸成分、多官能含 氧酸成分、多官能羥基成分等以5莫耳%以下之範圍進行共 聚合。 又,於聚酯(A)層可使用後述之聚酯系彈性體。 322465BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a release film which is particularly useful in the production of a printed substrate. More particularly, it relates to a release film which is useful in the case of using a thermosetting adhesive on a printed substrate having a precise pattern and hot stamping a coverlay film. [Prior Art] Release film systems are widely used in the industry. In particular, in the manufacturing steps of a printed wiring board, a flexible printed wiring board, or a multilayer printed wiring board, when a copper clad laminate or a copper box is thermally pressed through a prepreg or a heat resistant film, it is used to prevent the prepreg. Or a heat resistant film followed by a stamped hot plate. Further, in the manufacturing step of the flexible printed circuit board, when the coverable printed circuit board body forming the electronic circuit is thermally punched and then covered with a film using a thermosetting adhesive, the cover film is prevented from coming over with the hot stamping plate. The release film used for such applications may, for example, be a fluorine-based film, a polyoxyethylene-coated polyethylene terephthalate film, a polydecylpentene film or a polypropylene film. However, 'the fluorine-based film which can be used as a release film is excellent in heat resistance, release property, and non-contamination property, but it is difficult to burn in waste incineration after use, and it is toxic. The problem of gas still exists. Further, the polyoxymethylene-coated polyethylene terephthalate film and the polymethylammonium film are contained in the film composition containing polyfluorene oxide or a low molecular weight body, thereby transferring the printed circuit substrate, particularly the substrate. The copper circuit on the 'terrorism and quality. Further, the polypropylene film is inferior in heat resistance and insufficient in release property. 322465 3 201124280 Therefore, it has been disclosed that polybutylene terephthalate, poly(p-propyl phthalate), and poly-pairs are disclosed in terms of softness, heat resistance, release property, non-contamination, and waste incineration. A film of a butyl phthalate and a polyether is used as a film of a release layer (Patent Document 1) or a film as a buffer layer (Patent Document 2). However, in such a technique, the coexistence of release property, heat resistance, and softness is not sufficient. That is, the importance of release property and heat resistance is sacrificial softness, and the embedding property of a printed circuit board having a fine pattern is poor. In addition, when the flexibility is emphasized, 'there is a decrease in the release property or a deterioration in the lubricity of the surface of the film, and the film is wound up, the cutting time is delayed, or wrinkles are caused by the decrease in the elastic modulus. [Patent Document 1] International Publication No. 5/〇〇285 手册 手册 [Patent Document 2] Japanese Patent No. 4,99355 (Draft of the Invention) [Problem to be Solved by the Invention] An object of the present invention is to provide a soft It is excellent in the properties, the release property, the heat resistance, and the non-contamination property, and is particularly excellent in the embedding property of a printed circuit board having a fine pattern, and is excellent in handling workability at the time of winding or cutting of a sheet. [Means for Solving the Problem] The inventors of the present invention have found that the first polyester having specific crystallinity and the substantially amorphous polyester and crystallinity are obtained as a result of intensive research to solve the above problems. The second polyester which is mixed with the polyester and controls the crystallinity is laminated to form a specific crystal state, and the crucible can provide a release property of excellent 322465 4 201124280 * heat resistance, embedding property, and workability at the same time. The superior thin, film 'finishes the present invention. That is, the gist of the present invention is as follows. (1) A release film formed by a laminated film having a crystalline polyester (A) layer disposed on a surface layer and a polyester (B) layer ((A) layer system crystal heat of fusion is 35 Up to 50 J/g, the crystallization rate index is less than 5 (TC, (B) layer crystal heat of fusion is 20 to 40 J/g, and the crystallization speed index is less than 60 ° C. (2) . (1) The release film of the item, wherein the (A) layer has a heat of fusion of 38 to 45 J/g, a crystallization rate of 40 to 46 ° C, and (B) a layer of crystal heat of fusion of 21 to 36 J/g, crystallization The speed index is 47 to 57 ° C. (3) The release film of (1) or (2), wherein the polyester layer is 20 to 50% by mass of the polyester (I) having substantially amorphous The crystalline polyester (II) is contained in an amount of 80 to 50% by mass. (4) The release film of (3), wherein the amorphous polyester (I) of the (B) layer has a glass transition temperature of 30 (5) The release film of any one of (1) to (4) wherein the crystalline polyester (A) is poly-p-acid bismuth vinegar. (6) . The release film of any one of (1), wherein the (β) layer of the crystalline polyester (II) is a polybutylene terephthalate and a polyether [Embodiment] The present invention will be described in detail below. The release film of the present invention has a layered film of a crystalline t 曰 (8) layer disposed on a surface layer and a specific polyester (B) layer. It is composed of a polyester resin, and therefore it is not as problematic as the outgassing of a film using various olefinic resins. 322465 5 201124280 <Polymer (A) layer> Polyester (A) is disposed on a release film The surface layer functions as a release layer. The polyester (A) is preferably a crystalline aromatic polyester, and examples thereof include polyethylene terephthalate (PET), polybutyl phthalate (PBT), and polypyrene. The propylene acrylate is particularly preferably hydrazine from the viewpoint of heat resistance or high crystallinity. In addition to the above-mentioned PET, hydrazine, hydrazine, it can be used from various aromatic dicarboxylic acid components and diol components. The polyester is a crystalline aromatic polyester, and may be a copolymer of such a crystalline aromatic polyester with any of PET, ruthenium and iridium. Ugly acid, ugly acid, naphthalene-2,6-dicarboxylic acid, naphthalene-2,7-dicarboxylic acid, diphenyl-4,4,dicarboxylic acid, two a phenoxyethyl acetonate, a ruthenium acid, or an ester-forming derivative thereof. The diol component is preferably a diol having a molecular weight of 300 or less, and examples thereof include ethylene glycol, propylene glycol, and pentane. An aliphatic diol such as an alcohol, hexanediol, neopentyl glycol or decanediol; an alicyclic diol such as hydrazine, 4-cyclohexanedimethanol or tricyclodecane dimethanol; benzenedimethanol; (p-hydroxy)biphenyl, bis(p-hydroxyphenyl)propane, 2,2-bis[4-(2-hydroxyethoxy)phenyl]propane, bis[4-(2-hydroxy)phenyl]propane, M-bis[4-(2-hydroxyethoxy)phenyl]cyclohexane, 4,4,_monohydroxy-p-terphenyl, 4,4'-dihydroxy-p-tetraphenyl, etc. One of these types of rebel components and monool components can be used in combination. Further, a trifunctional or higher polyfunctional carboxylic acid component, a polyfunctional oxyacid component, a polyfunctional hydroxy component or the like may be copolymerized in a range of 5 mol% or less. Further, a polyester elastomer described later can be used for the polyester (A) layer. 322465
S 6 201124280 聚酯(A)之結晶化速度指標係必須未達5〇〇C。若結晶 化速度指標為50 C以上,亦即,若溶融後之冷卻時的結晶 化速度遲於預定之速度,則很難對薄片賦予耐熱性。其結 果’以輥,之直接加熱進行結晶化處理時產生剝離不良,或 以熱風或紅外線等之間接性加熱進行時產生鬆弛。若結晶 化速度指標未達50°C ’則可於熔融擠壓後以冷卻報輪結晶 化,而且’可以冷卻輥輪之溫度或速度控制薄片之結晶狀 態。結晶化速度指標之下限值係因若結晶化速度太快’則 會於以溶融擠壓後之冷卻軺1輪密著之前即已進行結晶化而 薄片之平面性惡化,因此宜為2(TC。結晶化速度指標宜為 25至45°C,尤宜為25至40°C。 聚酯(A)之結晶熔化熱必須為35至50J/g,尤宜為40 至50J/g。若結晶熔化熱未達35J/g,有時耐熱性差,另外, 若超過50J/g,有時埋入性差。 聚酯(A)之融點宜為200°C以上,若融點低於200°C, 有時熱沖壓時之耐熱性差。 聚酯(A)可以公知之方法製造。可舉例如使二羧酸之 低級醇二酯、過剩量之低分子量二醇在融媒的存在下酯交 換反應,使所得到之反應生成物進行縮聚 (polycondensation)之方法。或,使二叛酸與過剩量之二 醇在觸媒的存在下酯化反應,使所得到之反應生成物進行 縮聚之方法。 〈聚酯(B)層〉 聚酯(B)層係有助於在具有精密的圖案的印刷基板上 7 322465 201124280 熱沖壓覆蓋膜時之埋入性。因此,聚醋(B)層係結晶’熔化熱 必須為20至40J/g、結晶化速度指標必須未達60°C。 若結晶熔化熱未達20J/g,有時耐熱性差,若超過 40J/g,有時埋入性差。若結晶化速度指標為C以上, 則很難對薄片賦予耐熱性。若結晶化速度指標未達60°c, 則可於熔融擠壓後以冷卻親輪結晶化’而且’可以冷卻輥 輪之溫度或速度控制薄片之結晶狀態。結晶化速度指標之 下限值係因若結晶化速度太快’則會於以熔融擠壓後之冷 卻輥輪進行密著之前即已結晶化而薄片之平面性惡化’因 此宜為20°C。結晶化速度指標宜為20至58°C ’尤宜為25 至 55〇C。 為使聚酯(B)之結晶熔化熱與結晶化速度指標控制於 上述之範圍,宜以實質上為非晶性的聚酯(I)與結晶性聚酯 (II)之混合物構成聚酯(B)層。繼而,更宜聚酯(I)/聚酯(II) 為20至50質量%/8〇至50質量%之比例。聚酯(I)之比例 未達20質量%時’埋入性改良效果小,若超過5〇質量%, 則混合物之結晶性有降低之傾向。其時,結晶化速度指標 或結晶熔化熱易降低,結果,薄片之耐熱性降低,嚴重時 係於熱沖壓時從薄片端面呈線狀產生樹脂之渗出。 此處,聚酯(I)為「實質上為非晶性」指使用示差掃 洛型熱篁at而使S式樣1 〇mg以速度l〇°C/分從炼融狀態降溫 至玻璃轉移溫度後,再度昇溫至熔融狀態時,未觀察到結 晶融解譜峰。 聚醋(I)之玻璃轉移溫度宜為3〇至120¾,尤宜為50 322465 8 201124280 、 至100°c。若玻璃轉移溫度未達3(TC,有時薄片之耐熱性 差,若超過120°C,則熱沖壓溫度比較低溫時,埋入性惡 化。 聚酯(II)係只要與聚酯(I)之混合物的結晶化特性滿 足上述範圍,則無特別限定。但,宜為結晶性,其融點宜 為200°c以上。若融點未達20(TC,則薄片之耐熱性差,又, 或熱沖壓時(B)層從薄片之端部滲出。 聚酯(11)可例示與聚酯(A)同樣的結晶性芳香族聚酯 或其共聚物,以及聚酯系彈性體等。其中,從耐熱性與埋 入性之均衡,尤宜為聚酯系彈性體。 聚酯系彈性體係含有高融點結晶性鏈段與低融點鏈 段之嵌段共聚物。高融點結晶性鏈段主要由結晶性芳香族 聚醋單元所構成,低融點鏈段係由脂肪族聚醚單元及/或脂 肪族聚酯單元所構成。聚酯系彈性體中之高融點結晶性鏈 段與低融點鏈段之共聚合比例係無特別限定’但適宜為於 聚醋系彈性體中低融點鏈段含有5至50質量%。 構成聚酯系彈性體中之高融點結晶性鏈段之結晶性 芳香族聚酯係可使用與可使用來作為前述聚酯(A)的成分 同樣者。 在聚酿系彈性體中,構成低融點鏈段之脂肪族聚醚可 舉例如聚(氧伸乙基)二醇、聚(氧伸丙基)二醇、聚(氧伸丁 基)二醇、聚(氧伸己基)二醇、環氧乙烷與環氧丙烷之共聚 物、聚(氧伸丙基)二醇的環氧乙烷加成聚合物、環氧乙烷 與四氫呋喃之共聚物等。 9 322465 201124280 構成低融點鏈段之脂肪族聚酯可舉例如聚(ε _己内 酯)、聚壬内酯、聚辛内酯、聚己二酸丁二酯、聚己二酸乙 二酯等。 此等之脂肪族聚醚及/或脂肪族聚酯之中,從所得到 之聚酯嵌段共聚物的彈性特性,宜為聚(氧伸丁基)二醇、 聚(氧伸丙基)一醇的環氧乙烧加成物、聚(ε __己内酯)、聚 己二酸丁二酯、聚己二酸乙二酯等,尤宜為聚(氧伸丁基) 二醇。又,此等之低融點鏈段的數目平均分子量在經共聚 合之狀態中宜為300至6〇〇〇左右。 上述具有結晶化特性之聚酯系彈性體較佳的構成,可 舉例如聚對酞酸丁二酯與聚醚之嵌段共聚物。在此共聚物 中,聚醚之共聚合量宜為10至40質量%,更宜為15至3〇 質量%。若聚醚之共聚合量少,則柔軟化效果易變小,另外, 若太多,則耐熱性或結晶性有太降低之傾向。若為如此之 範圍,則易調整聚酯系彈性體(Α)之融點、玻璃轉移溫度、 結晶化指標、結晶熔化熱等。 聚酯系彈性體可以公知之方法製造。例如,使二叛酸 之低級醇二酯、過剩量的低分子量二醇、及低融點鏈段成 分在觸媒的存在下酯交換反應,使所得到之反應生成物縮 聚之方法。或,使二羧酸與過剩量的二醇及低融點鏈段成 分在觸媒的存在下酯化反應’使所得到之反應生成物縮聚 之方法。又,可舉例如預先製作高融點結晶性鏈段,再添 加低融點鏈段成分而藉酯交換反應使之無規化的方法。又, 使高融點結晶性鏈段與低融點鏈段以鏈連結劑連結之方 10 322465 201124280 , 法。進一步’於低融點鏈段使用聚(ε -己内酯)時’使ε 一 己内酯單體與高融點結晶性鏈段加成反應的方法等。可為 任一者之方法。 聚酯(Α)層及聚酯(Β)層係在無損實用性的範圍’亦可 添加有機或無機之染料或顏料、消光劑、熱安定劑、難燃 劑、抗靜電劑、消泡劑、整色劑、抗氧化劑、紫外線吸收 劑、結晶造核劑、增白劑、潤滑劑、雜質的捕捉劑、增黏 劑、表面調整劑等。其中,宜含有熱安定劑或低分子量的 揮發性雜質之捕捉劑。熱安定劑宜為5價或/及3價之磷化 合物、或受阻紛系化合物等。低分子量的揮發性雜質之捕 捉劑,宜為聚醯胺或聚酯醯胺之聚合物或寡聚物、具有醯 胺基或胺基之低分子量化合物等。 本發明之離型膜係宜聚酯(Α)層的厚度為i至50以爪。 若聚酯(A)層之厚度未達l#m,有時很難製作成均勻的 膜,若超過50 ,有時埋入性差。聚酯(A)層之厚度更宜 為2至30/zm。此處所謂之(A)層的厚度係如2種3層構成 般含有(A)層2層以上時為其1層分之厚度。 本發明之離型膜宜全體之厚度為·U 5G()"。使 全體之厚度為3〇,以上,薄片之強度綱性高而容易處 理。另外’若超過_口’則導熱性增加,不適 細的圖案之印刷基板製造。全體之厚 八 ㈣,最宜為·。 為至彻 本發明之離型膜較佳的構成, 層與⑻層之(A)/⑻/(A)之2種3層“。I/== 322465 11 201124280 此,::(A)層配置於表層’則亦可進—步具有其他之异。 /、次,說明有關本發明之離型膜的製造方去 9 本發明之離型膜的製造方法,可舉 ^ 式共擠壓膨脹法、或以共擠壓τ模具法製膜的 =壓T模具法製膜的方法從各層之厚度控制 在t發明之離型膜的製造中,就對薄膜賦予預 特性’提㈣膜之耐祕、離型性、尺寸衫 ‘、、、 晶化步驟。結晶化方法可舉例如加熱結晶化:定 中必須為在高溫之尺核紐,故未途 舳处曰儿 不|貞上疋向,宜藉加 —“S化。加熱結晶化之方法可舉例如從T模具擠壓出後 冷卻並同時結晶化之方法,或擠壓出後固化—次其後, 再度以輥輪直接加熱ϋ熱風或紅外料間接地加執 之方法。藉再加熱進行結晶化之方法,有時不僅步驟變: 雜’而且產生在報輪處之剝離不良,或熱風加熱時或紅外 線加熱時薄膜’薄膜品質差。因此’宜為冷卻並同時 結晶化之方法。冷卻並同時結晶化時係必須考量結晶化速 度而設定冷卻輥輪之溫度。若為本發明讀賴成,則冷 卻輥輪之溫度宜為30至100¾,更宜為5〇至8(rc。 本發明之離型膜係宜層合有(A)層與(B)層之薄膜全 體的結晶熔化熱為25至40J/g,尤宜為3〇至4〇J/g。未達 25J/g時,有時耐熱性差,製膜作業性差。若超過45J/g, 則埋入性易降低。結晶熔化熱係例如在前述之結晶化步驟 322465S 6 201124280 The crystallization rate of polyester (A) must be less than 5 °C. When the crystallization rate index is 50 C or more, that is, if the crystallization rate at the time of cooling after melting is later than the predetermined speed, it is difficult to impart heat resistance to the sheet. As a result, peeling failure occurs when the crystallizing treatment is performed by direct heating by a roll, or slack occurs when heat is exchanged by hot air or infrared rays. If the crystallization rate index is less than 50 ° C ', it can be crystallized by cooling after the melt extrusion, and the crystal state of the sheet can be controlled by cooling the temperature or speed of the roller. The lower limit of the crystallization rate index is that if the crystallization rate is too fast, the crystallinity of the sheet is deteriorated immediately before the cooling 轺 is cooled by the melt squeezing, and therefore the planarity of the sheet is deteriorated, so it is preferably 2 ( TC. The crystallization rate index is preferably 25 to 45 ° C, particularly preferably 25 to 40 ° C. The heat of crystallization of the polyester (A) must be 35 to 50 J / g, particularly preferably 40 to 50 J / g. Although the heat of crystal fusion is less than 35 J/g, the heat resistance may be poor, and if it exceeds 50 J/g, the embedding property may be poor. The melting point of the polyester (A) is preferably 200 ° C or more, and if the melting point is lower than 200 ° C, the heat resistance is sometimes poor at the time of hot stamping. The polyester (A) can be produced by a known method, for example, transesterification of a lower alcohol diester of a dicarboxylic acid and an excess amount of a low molecular weight diol in the presence of a solvent a method of performing polycondensation of the obtained reaction product, or a method of esterifying a reaction product obtained by esterifying a diteric acid with an excess amount of a diol in the presence of a catalyst. <Polyester (B) layer> Polyester (B) layer helps on printed boards with precise patterns 7 322465 201 124280 The embedding property of the hot stamping film. Therefore, the polycondensate (B) layer crystal must have a heat of fusion of 20 to 40 J/g, and the crystallization rate index must be less than 60 ° C. If the crystal melting heat is less than 20 J /g may be inferior in heat resistance, and if it exceeds 40 J/g, the embedding property may be inferior. When the crystallization rate index is C or more, it is difficult to impart heat resistance to the sheet. If the crystallization rate index is less than 60 ° C, After melt-squeezing, the crystallized state of the flakes can be controlled by cooling the crystallization of the parent wheel, and the temperature of the roll can be controlled. The lower limit of the crystallization rate index is because the crystallization rate is too fast. The cooling roller after melt extrusion is crystallized before the adhesion, and the flatness of the sheet deteriorates. Therefore, it is preferably 20 ° C. The crystallization speed index is preferably 20 to 58 ° C 'especially 25 to 55 ° C. In order to control the heat of fusion and the crystallization rate of the polyester (B) to be in the above range, it is preferred to form a polyester by a mixture of the substantially amorphous polyester (I) and the crystalline polyester (II). (B) layer. Further, the polyester (I) / polyester (II) is preferably 20 to 50% by mass / 8 to 50 When the ratio of the polyester (I) is less than 20% by mass, the effect of improving the embedding property is small, and if it exceeds 5% by mass, the crystallinity of the mixture tends to decrease. Or the heat of crystal melting is liable to lower, and as a result, the heat resistance of the sheet is lowered, and in severe cases, the resin is oozing out from the end surface of the sheet during hot stamping. Here, the polyester (I) is "substantially amorphous". "When the S-type 1 〇mg is cooled from the smelting state to the glass transition temperature at a speed of 10 °C/min using a differential sweeping type 篁at, the crystal melting peak is not observed when the temperature is raised again to the molten state. . The glass transition temperature of the polyester (I) is preferably from 3 to 1203⁄4, particularly preferably from 50 322465 8 201124280 to 100 °c. If the glass transition temperature is less than 3 (TC, the heat resistance of the sheet may be poor, and if it exceeds 120 ° C, the embedding property is deteriorated when the hot stamping temperature is relatively low. The polyester (II) is only required to be polyester (I). The crystallization property of the mixture is not particularly limited, but it is preferably crystallinity, and the melting point thereof is preferably 200° C. or more. If the melting point is less than 20 (TC, the heat resistance of the sheet is poor, or heat In the case of the press, the (B) layer is oozing from the end of the sheet. The polyester (11) is exemplified by the same crystalline aromatic polyester or copolymer thereof as the polyester (A), and a polyester elastomer. The balance between heat resistance and embedding property is particularly preferably a polyester elastomer. The polyester elastomer system contains a block copolymer of a high melting point crystalline segment and a low melting point segment. A high melting point crystalline segment It is mainly composed of a crystalline aromatic polyacetate unit, and the low melting point segment is composed of an aliphatic polyether unit and/or an aliphatic polyester unit. The high melting point crystalline segment in the polyester elastomer The copolymerization ratio of the low melting point segment is not particularly limited 'but is suitable for low in the polyester elastomer The melting point segment is contained in an amount of 5 to 50% by mass. The crystalline aromatic polyester constituting the high melting point crystalline segment in the polyester elastomer can be used in the same manner as the component which can be used as the polyester (A). Among the polystyrene elastomers, the aliphatic polyether constituting the low melting point segment may, for example, be a poly(oxyethylidene) diol, a poly(oxypropyl) diol, or a poly(oxybutylene butyl). a diol, a poly(oxyhexyl) diol, a copolymer of ethylene oxide and propylene oxide, an ethylene oxide addition polymer of poly(oxypropyl) diol, ethylene oxide and tetrahydrofuran Copolymers, etc. 9 322465 201124280 The aliphatic polyester constituting the low melting point segment may, for example, be poly(ε-caprolactone), polydecene lactone, polyoctanolactone, polybutylene adipate, poly Ethylenediamine adipate, etc. Among these aliphatic polyethers and/or aliphatic polyesters, the elastic properties of the obtained polyester block copolymer are preferably poly(oxybutylene) diols. , an epoxy ethylene oxide adduct of poly(oxypropyl)-alcohol, poly(ε__caprolactone), polybutylene adipate, polyethylene adipate, etc. More preferably, it is a poly(oxybutylene) diol. Further, the number average molecular weight of the low melting point segments is preferably about 300 to 6 Å in the state of copolymerization. A preferred structure of the polyester elastomer is, for example, a block copolymer of polybutylene terephthalate and a polyether. In the copolymer, the copolymerization amount of the polyether is preferably from 10 to 40% by mass, more preferably It is preferably 15 to 3 % by mass. When the amount of the polyether copolymerization is small, the softening effect tends to be small, and if too much, the heat resistance and crystallinity tend to be too low. It is easy to adjust the melting point of the polyester elastomer (glass), the glass transition temperature, the crystallization index, the heat of crystal fusion, etc. The polyester elastomer can be produced by a known method. For example, a lower alcohol diester of direxime A method in which an excess amount of a low molecular weight diol and a low melting point segment component are transesterified in the presence of a catalyst to polycondense the obtained reaction product. Alternatively, a method in which a dicarboxylic acid is esterified with an excess amount of a diol and a low melting point component in the presence of a catalyst to cause polycondensation of the obtained reaction product. Further, for example, a method of preparing a high melting point crystalline segment in advance, adding a low melting point segment component, and randomizing it by a transesterification reaction may be mentioned. Further, the high melting point crystalline segment and the low melting point segment are linked by a chain linking agent 10 322465 201124280, method. Further, a method of adding an ε-caprolactone monomer to a high-melting point crystalline segment when a poly(ε-caprolactone) is used in a low-melting point segment. Can be either method. Polyester (Α) layer and polyester (Β) layer can be added in the range of non-destructive practicality. Organic or inorganic dyes or pigments, matting agents, thermal stabilizers, flame retardants, antistatic agents, defoamers can also be added. , coloring agents, antioxidants, ultraviolet absorbers, crystal nucleating agents, brighteners, lubricants, trapping agents for impurities, tackifiers, surface conditioners, etc. Among them, it is preferred to contain a heat stabilizer or a low molecular weight volatile impurity trapping agent. The heat stabilizer is preferably a 5-valent or/and a trivalent phosphorus compound or a hindered compound. The trapping agent of low molecular weight volatile impurities is preferably a polymer or oligomer of polydecylamine or polyester decylamine, a low molecular weight compound having a guanamine or amine group, and the like. The release film of the present invention is preferably a polyester (ruthenium) layer having a thickness of from i to 50 in a paw. If the thickness of the polyester (A) layer is less than 1 #m, it may be difficult to form a uniform film. If it exceeds 50, the embedding property may be poor. The thickness of the polyester (A) layer is more preferably 2 to 30 / zm. Here, the thickness of the layer (A) is a thickness of one layer when the layer (A) is two or more layers as in the case of two types of three layers. The release film of the present invention should have a total thickness of U 5G () ". When the thickness of the whole is 3 Å or more, the strength of the sheet is high and it is easy to handle. Further, when it exceeds the _ port, the thermal conductivity is increased, and the printed circuit board having an unfavorable pattern is produced. The thickness of the whole eight (four), the most appropriate. For the preferred composition of the release film of the present invention, the layer and the (8) layer of the two types of (A) / (8) / (A) three layers ". I / = = 322465 11 201124280 This, :: (A) layer In the case of being disposed on the surface layer, there may be other differences. The second embodiment describes the method for producing the release film of the present invention. The method of forming a film by the method of co-extrusion τ mold method by pressure T-die method is controlled from the thickness of each layer in the manufacture of the release film of the invention, and imparts a pre-characteristic to the film. Release type, size shirt', and crystallization step. The crystallization method may, for example, heat crystallization: the center must be at a high temperature, and the nucleus is not in the middle of the road. Borrowing - "S. The method of heating and crystallization may be, for example, a method of cooling from a T-die and then simultaneously crystallization, or extruding and post-curing - and then indirectly heating the hot air or the infrared material by a roller directly. method. The method of crystallization by reheating may not only change the steps: but also cause poor peeling at the wheel, or when the hot air is heated or the infrared rays are heated, the film quality is poor. Therefore, it is desirable to cool and simultaneously crystallize. When cooling and simultaneously crystallization, the crystallization speed must be considered to set the temperature of the cooling roll. For the reading of the present invention, the temperature of the cooling roller is preferably from 30 to 1003⁄4, more preferably from 5 to 8 (rc. The release film of the present invention is preferably laminated with layers (A) and (B). The crystal heat of fusion of the entire film is 25 to 40 J/g, and particularly preferably 3 to 4 J/g. When the thickness is less than 25 J/g, the heat resistance may be poor, and the film forming workability may be poor. If it exceeds 45 J/g, The embedding property is easily reduced. The crystallization heat of fusion is, for example, in the aforementioned crystallization step 322465
S 12 201124280 中 ’藉由使冷卻輥輪溫度在前述範圍適當調敕 希望的值。 "可形成所 本發明之離型膜係宜在18〇°C之熱收縮率為⑽以 更宜為2%。藉由設成如此之熱收縮率,於沖壓時即、下 板接觸亦很難皺摺,製造印刷基板時之耐熱性良好使與熱 在本發明之離型膜中,聚酯(A)層的表面狀熊 途而設計。可為平滑,亦可為了作業性而賦予滑動彳^用 結塊性。又,以熱沖壓成形時之舍空氣為目的,亦。、抗 型膜之至少單面設有適度的壓紋花紋。如此之壓紋離 可藉冷卻輥輪之表面加工賦予。 、係 本發明之離型膜係柔軟性、耐熱性、離型性、、_ 性優異,可安全且容易地廢棄處理。因此,在印刷^巧杂 板、可撓性印刷線路基板、多層印刷線路板等 \路基 广 5¾ 中,隔著預浸體或耐熱薄膜,熱沖壓覆鋼層合板或鋼_ 可適宜作為防止沖壓熱板、與印刷線路基板、 自時, j視性印屁丨 線路基板、多層印刷線路板等之接著的離型膜。 撓性印刷基板之製造步驟中,藉熱沖壓成形以埶石,在可 著劑接著覆蓋膜時,亦可適宜使时作為以霜、硬化性接 沖壓板之接著或覆蓋膜間之接著的離_。蓋膜與熱 :形,皆可一配置於表層之聚; [實施例] 以下,依據實施例而說明本發明。 在下述之實施例及比較例中的薄膜之原料、 、’、及、特性 322465 13 201124280 值之測定法係如以下般。Tm意指融點,Tg意指玻璃轉移溫 度。 〈結晶性聚酯(A)及(11)>In S 12 201124280, the desired value is appropriately adjusted by setting the temperature of the cooling roller to the aforementioned range. " It is preferred that the release film of the present invention has a heat shrinkage ratio of (10) at 18 °C, more preferably 2%. By setting such a heat shrinkage ratio, it is difficult to wrinkle at the time of pressing, that is, the contact of the lower plate, and the heat resistance at the time of producing a printed substrate is good, and the heat is in the release film of the present invention, the polyester (A) layer. The surface is designed like a bear. It can be smooth, or it can be used for sliding properties for workability. Moreover, it is also intended to be used for air during hot stamping. At least one side of the anti-type film is provided with a moderate embossing pattern. Such embossing can be imparted by surface processing of the cooling roller. The release film of the present invention is excellent in flexibility, heat resistance, release property, and _ property, and can be disposed of safely and easily. Therefore, in a printed circuit board, a flexible printed circuit board, a multilayer printed wiring board, etc., a hot-stamped steel laminate or steel is interposed between a prepreg or a heat-resistant film. A release film attached to a hot plate, a printed circuit board, a self-timer, a line-up printed circuit board, or a multilayer printed wiring board. In the manufacturing process of the flexible printed circuit board, the vermiculite is formed by hot stamping, and when the coating agent is applied to the film, the time may be used as a frost, a hardened stamping plate, or a coating film. _. Both the cover film and the heat: shape may be disposed on the surface layer; [Examples] Hereinafter, the present invention will be described based on examples. The measurement methods of the raw materials of the film, the ', and the characteristics 322465 13 201124280 in the following examples and comparative examples are as follows. Tm means melting point and Tg means glass transition temperature. <Crystalline Polyester (A) and (11)>
.PBT (聚對酜酸丁二酯):三菱 Engineering-Plastics 公司製「Novaduran 5010CS」、Tm 223°C、Tg 34°C.PBT (polybutylene terephthalate): "Novaduran 5010CS" manufactured by Mitsubishi Engineering-Plastics, Tm 223 ° C, Tg 34 ° C
• HTR7277C聚酯系彈性體):DU P0NT-T0RAY 公司製「Hytrel 7277」、Tin 221〇C、Tg 12°C• HTR7277C polyester elastomer): DU P0NT-T0RAY "Hytrel 7277", Tin 221〇C, Tg 12°C
• HTR6377C聚酯系彈性體):DU P0NT-T0RAY 公司製「Hytrel 6377」、Tm 221°C、Tg 3°C• HTR6377C polyester elastomer): “Hytrel 6377”, manufactured by DU P0NT-T0RAY, Tm 221°C, Tg 3°C
• HTR4777C 聚酯系彈性體):DU P0NT-T0RAY 公司製「Hy tre 1 4777」、Tm 20(TC、Tg -35〇C 上述2種之聚酯系彈性體係任一者均為聚對酜酸丁二 酯與聚醚之嵌段共聚物。 〈非晶性聚酯(I) > •PETG (1,4-環己烷二曱醇共聚合聚酯);Eastman Chemical 公司製「PETG 6763」、Tg 80。匚 • IP-22(間欧酸 22mol 共聚合 PET ); IV 〇. 65dl/g、Tg 65 。(:、含有 Sb 觸媒 lOOppm、Tg 70°C。 〈其他〉 • TPX(聚曱基戊烯):三井化學公司製「DX845」、Tm 233 〇C、Tg 20°C。 將各種特性之測定方法及所測定之特性的評估表示 於以下。 (A)結晶化特性 322465 14 201124280 ' 使用示差掃描型熱量計(Perkin Elmer公司製Pyrisl • DSC),使試樣10mg以速度20°C/分昇溫至260°C,測定融 點(Tm)、結晶熔化熱(△Hm)。進一步,以260°C維持3分 鐘後,以速度20°C/分冷卻,測定結晶化譜峰溫度(Tc)。 以融點與降溫時結晶化譜峰溫度之差為結晶化速度指標。 各層單獨之特性係使用薄膜試樣而測定。薄膜試樣係 以各層的樹脂厚度、擠壓速度、冷卻輥輪溫度成為同條件 之方式製造。• HTR4777C polyester elastomer): "Hy tre 1 4777" and Tm 20 (TC, Tg -35〇C) manufactured by DU P0NT-T0RAY Co., Ltd. Any of the above two types of polyester elastic systems are polyparaic acid. Block copolymer of butadiene ester and polyether. <Amorphous polyester (I) > • PETG (1,4-cyclohexanedonol copolymerized polyester); "PETG 6763" manufactured by Eastman Chemical Co., Ltd. , Tg 80. 匚 • IP-22 (intermediate acid 22mol copolymerized PET); IV 〇. 65dl / g, Tg 65. (:, containing Sb catalyst lOOppm, Tg 70 ° C. <Others> • TPX (poly "decylpentene": "DX845" manufactured by Mitsui Chemicals Co., Ltd., Tm 233 〇C, Tg 20 ° C. The measurement methods of various characteristics and the evaluation of the measured properties are shown below. (A) Crystallization characteristics 322465 14 201124280 Using a differential scanning calorimeter (Pyrisl • DSC manufactured by Perkin Elmer Co., Ltd.), 10 mg of the sample was heated to 260 ° C at a rate of 20 ° C / min, and the melting point (Tm) and the heat of crystal fusion (ΔHm) were measured. After maintaining at 260 ° C for 3 minutes, the temperature was measured at a rate of 20 ° C / min, and the crystallization peak temperature (Tc) was measured. The peak temperature of the crystallization peak at the melting point and the temperature drop Index difference of the crystallization rate. The properties of the individual layers were measured using a thin film-based sample. Sample-based resin film thicknesses of the layers, extrusion speed, cooling roller temperature becomes the same manner as the manufacturing conditions.
又’在以下之實施例、比較例所使用的試樣中,DSC '則定之昇溫時未觀察到發熱譜峰。亦即,此時之結晶化係 未觀察到。 (B) 製膜作業性 依據以下之基準而評估切割所得到之薄膜端部後之 輪捲取性、與以40°C保存經捲取的輥輪1日後之狀態。 〇·於親輪捲取性無問題,保存後亦未觀察到狀態變 彳匕。 此作1在觀輪捲取時很難無皺摺地進行捲取,於保存後之 狀L係未觀察到變化。 (C) 熱收縮性 寬邊叫下之順序測定所得到之薄膜的長邊方向(MD)及 的熱收縮率。將試樣薄膜切割成1〇ΙΜΧ 兮认 以成為間隔10〇mm之方式製作已標示2條標線的 5气驗)4 q /it 中 ^所得到之試驗片在無載重下於180°C的烘箱 r熟處理Η八# 77里後’取出試驗片並返回室溫而測定標線間 15 322465 201124280 距離。依下式求出熱收縮率,以5條之平均值作為各試樣 薄膜的熱收縮率。Further, in the samples used in the following examples and comparative examples, DSC' was determined to have no heat generation peak when the temperature was raised. That is, the crystallization was not observed at this time. (B) Film-forming workability The coil windability after the end of the film obtained by the cutting was evaluated based on the following criteria, and the state after the wound roller was stored at 40 ° C for 1 day. 〇·There was no problem with the reeling of the parental wheel, and no state change was observed after the preservation. This work 1 was difficult to wind up without wrinkles during the winding of the wheel, and no change was observed in the form of L after storage. (C) Heat shrinkability The longitudinal direction (MD) and the heat shrinkage ratio of the obtained film were measured in the order of the broad side. The test film obtained by cutting the sample film into 1 〇ΙΜΧ 兮 成为 制作 制作 制作 制作 制作 制作 已 已 已 已 已 已 已 已 已 已 已 已 已 已 180 180 180 180 180 180 180 180 180 180 180 180 180 180 180 180 180 180 180 180 After the oven is cooked, Η八# 77, then take out the test piece and return to room temperature to determine the distance between the marking line 15 322465 201124280. The heat shrinkage ratio was determined according to the following formula, and the average of the five bars was used as the heat shrinkage ratio of each sample film.
熱收縮率(%ML-L’ VAxlOO L:熱處理前之標線間距離(mm)、L’ :熱處理後之標線間距 離(mm)。 (D)性能評估 於雙面塗佈有20ym之環氧系接著劑(東亞合成公司 製「AS-60」)之厚25vm聚醯亞胺薄膜(Du Pont公司製 「Kapton 100V」)的兩面側,層合厚35 μ m的銅箔,製作 3層型的覆銅層合板。於其單面載置塗佈有厚20# m之環 氧系接著劑(東亞合成公司製「AS-60」)之厚25#m聚醯亞 胺薄膜(Du Pont公司製「Kapton 100V」)作為覆蓋膜, 進一步,以供試離型膜挾住兩侧。此時,以離型膜之澆鑄 面成為内側之方式配置。其後,以溫度140°C及180°C、壓 力3MPa熱沖壓5分鐘。沖壓後,從熱沖壓裝置迅速地取出 並放冷後,剝離離型膜,依據以下之基準,進行耐熱性、 埋入性、離型性之評估。其時,在覆蓋膜開啟直徑5mm之 真圓狀的孔,使用於接著劑之滲出的評估。 (D-1)耐熱性 〇:於沖壓後之薄膜未觀察到皺摺。 △:於沖壓後之薄膜可觀察到皺摺。 (D-2)埋入性 以顯微鏡觀察覆蓋膜孔部之接著劑的滲出長度,依據 以下之基準而評估。Heat shrinkage rate (%ML-L' VAxlOO L: distance between the lines before heat treatment (mm), L': distance between the lines after heat treatment (mm). (D) Performance evaluation of 20ym on double-sided coating A copper foil having a thickness of 25 μm was laminated on both sides of a 25 μm thick polyimide film ("Kapton 100V" manufactured by Du Pont Co., Ltd.) made of an epoxy-based adhesive ("AS-60" manufactured by Toagos Corporation). A copper-clad laminate with a thickness of 25#m polyimide film coated with a 20# m epoxy-based adhesive ("AS-60" manufactured by Toagosei Co., Ltd.) "Kapton 100V" manufactured by Pont Co., Ltd.) is used as a cover film, and further, the test release film is placed on both sides. At this time, the casting surface of the release film is placed inside. Thereafter, the temperature is 140 ° C and After hot pressing at 180 ° C and a pressure of 3 MPa for 5 minutes, after the press was quickly taken out from the hot stamping apparatus and allowed to cool, the release film was peeled off, and heat resistance, embedding property, and release property were evaluated based on the following criteria. At this time, a true round hole having a diameter of 5 mm was opened in the cover film, and the evaluation of the bleeding of the adhesive was used. (D-1) Heat resistance 〇: No wrinkles were observed in the film after the stamping. Δ: Wrinkles were observed in the film after the stamping. (D-2) Buriedness The length of the bleeding of the adhesive covering the pores of the film was observed under a microscope, according to the following criteria. Evaluation.
16 322465 S 201124280 ◎:接著劑之滲出長度為50;tzm以下 〇:接著劑之滲出長度為超過50/^ni、70;am以下 △:接著劑之滲出長度為超過70、100" m以下 X:接著劑之滲出長度為超過1〇〇 (D-3)離型性 ◎:無阻抗地剝離 〇:略有阻抗’但可不對層合板造成影響地剝離 △:有阻抗,但可不使層合板變形地制離 X:阻抗強,剝離時伴隨層合板之變形 (D-4)耐污染性 使用熱脫附GC-MS,使用無極性毛細管柱使因180°C、 10分鐘之加熱而從薄膜產生的氣體分離,使所檢測出之譜 峰總面積的己烷換算量以薄膜重量標準化,以此作為釋氣 產生量。釋氣產生量越少越佳,200ppm以下判斷為良好。 [實施例1] 於2台獨立之擠壓機中,供給PE:T(Novaduran 5010CS) (A層)、與以75/25(質量化)之比例乾混合Hytrel 6377/PETG者(B)層,分別以260°C熔融。使各別之熔融體 在到達T模具的出口前會合層合成A/B/A之3層狀後,從 T模具出口擠壓出。繼而,使PBT(Novaduran5010CS)(A) 層側密著於已調整至60°C之冷卻輥輪而冷卻,得到如表1 所示般層厚度為A/B/A=20/60/20(/zm)之層合薄膜。於冷 卻輥輪的密著時間為6秒。 [實施例2至6、比較例1至5 ] 17 322465 201124280 相較於實施例1,使(A)層之樹脂、層厚構成、冷卻輥 輪溫度變更成如表1記載般。其餘係與實施例1同樣做法 而得到具有A/B/A之構成的2種3層之層合薄膜。 [比較例6 ] 對擠壓機供給表1所示之樹脂(TPX),以280°C熔融而 從T模具出口擠壓出,密著於如表1所示般已調整至50°C 之冷卻輥輪而冷卻,得到如表1所示般具有50# m厚之單 層薄膜。於冷卻親輪的密著時間為6秒。 [比較例7 ] 將已調配成PBT/IP-22=50/50(質量比)之樹脂供給至 擠壓機,以250°C熔融而從T模具出口擠壓出,密著於已 調整至60°C之冷卻輥輪6秒。但,薄膜未結晶化,而且從 冷卻輥輪之剝離性差。因此,從冷卻輥輪卸下薄膜,使冷 卻輥輪之溫度上昇至80°C後,再度使薄膜密著。但,薄膜 係略結晶化,但從冷卻輥輪的剝離狀況明顯惡化。因此, 進一步使冷卻輥輪之溫度上昇至100°C。於此已調整至100 °(:之冷卻輥輪再度使薄膜密著後,結晶化會進行,剝離狀 況亦變良好,但不完全。進一步,使密著時間增加至30 秒,但剝離狀況完全未變良好,而所得到之薄膜係平面性 差。 18 322465 201124280.. [表 1 ] a < § 产 PBT/IP-22 =50/50(+) 1 1 ο 7 s Γ5 CM N S CM in S I 1 1 1 神1 « (D ϋ < S K 1 » s CO CO CM s ro esi S i in «〇 〇 CSJ 〇 eo 〇 ο ◎ ο 寸 u> a < m S CO 〇 CM 甶 CL P 〇 5 ti s o U3 s CO CM CM s 〇 in β> CO in (D s 〇 eo Ο 卜 <1 \ < ◎ ◎ 、 ◎ ο S 寸 * < m S CO CM a P 〇 S us p- s W «V» CM s 〇 〇 ΙΟ s X ο ζ ir> < < ◎ @ < < S CO * < m to Ο CM 会 m a. ^ C3 s t i ^ s o 兮 s CO Ol CM s 〇 g CM CM f〇 Csl CM CO 〇 in % c4 < < ◎ © ◎ 、 @ S eg < QQ a δ in u5 Csl CO H m a 1 o Γ- n S eo CM CM o 3 3 〇 CSI 〇> ο 、 ο ο \ <1 ο 、 〇 ο τ- «< < m s (O CM 白 0. s 1 s CO CM Csl o 〇 〇 CM ra ο CM § 〇 、 ο <1 < ◎ S (0 < CQ s 1 s H m P ϋ s 、 s s CO CM ot s o r- s 〇 o ο ό -◎ @ ◎ ο U) < m o CQ 〇 l·— ffl P CD to t 1 ^ o s o CO C>4 CM 5 o 5 C*3 CO m a s 〇 CSi 1 ο 、 〇 ◎ 、 ◎ ◎ @ S 寸 < m 〇 to r- 5 H Csl U IA in s <M C4 CO CO CO CM CM CJ « s 5 〇 Csl 〇 W ο δ 〇 、 〇 〇 © S CO C0 s <〇 δ Csl 白 a 04 a & s 、 s s CO 04 CM s o C*> csJ eg CM IA s 00 CO 0 i r-_ 〇 ό ◎ 、 〇 ◎ ® ο ¥ CQ o σ 00 o 白 a ^ ϋ a. a. s s s n CM ex s o in ol 5 s s Ο o LO ο δ ◎ 、 〇 ◎ © S r* 養 s <〇 s Q. P 〇 M a r- § M es CM s o IO s 3 0 o p 〇 、 0 ◎ 、 @ ◎ ® S « ΪΙ 趙 ® M NW* 函 IS 9 PI « /«•n P E »- g to 3 难 5 〇& P E H P 雔 DS 3 搖 〇S 3 δ og 雄 ti m 茑 斜 o Q 2 货 难 1 § ί I Ρ ο r«· < » ΐ5 § ί5 ο /"Ν 邑 α 喊 ft i\C ite QQ fiQ Μ niw扭:* 19 322465 201124280 從表1所示之實施例1至6的結果明顯可知,在依本 發明之特定的範圍之薄片,係全部滿足作為離型薄膜之要 求性能。尤其,埋入性優異,故亦可對應於具有精密的圖 案之印刷基板,且,釋氣亦少,耐污染性亦優異者。 比較例1係於(B)層不含有非晶性聚酯,因此,結晶 熔化熱太高,故埋入性差。 比較例2係於(B)層不含有非晶性聚酯,因此,結晶 熔化熱太高,故埋入性差。與比較例1比較,於表層配置 聚酯系彈性體(HRT6377),180°C沖壓時之埋入性係變良 好,但另一方面,離型性略差·。 比較例3係(B)層之非晶性聚酯含量太多,結果(B)層 之結晶性明顯降低而結晶化速度指標太高,因此結晶熔化 熱太低,故埋入性良好,但耐熱性差。 比較例4係(A)層之結晶熔化熱太低,故製膜作業性 差,耐熱性、離型性亦差。 比較例5係(B)層之結晶熔化熱太低,故耐熱性差。 進一步,亦有時(B)層之融點低,於180°C沖壓時從薄片端 面可觀察到樹脂呈線狀之滲出。 比較例6係由廣泛使用來作為離型膜的聚甲基戊稀 (TPX)所構成之薄膜,但釋氣產生量明顯多達實施例之薄膜 的約10倍,為对污染性差者。 比較例7係欲嘗試使結晶化速度指標超過50°c之樹脂 组成物以單層薄膜化,但製膜性差,無法進行性能評估。 因此,放棄複層化。 20 322465 201124280 【圖式簡單說明】 無 【主要元件符號說明】16 322465 S 201124280 ◎: The exudation length of the adhesive is 50; tzm or less 〇: the exudation length of the adhesive is more than 50/^ni, 70; am or less △: the exudation length of the adhesive is more than 70, 100 " m or less X : The exudation length of the adhesive is more than 1 〇〇 (D-3) Release property ◎: Peeling without resistance 〇: Slightly resistive 'but peeling without affecting the laminate △: Impedance, but without laminate Deformation from X: Strong impedance, deformation with laminate (D-4) at the time of peeling. Use thermal desorption GC-MS, use a non-polar capillary column to heat the film at 180 ° C for 10 minutes. The generated gas was separated, and the amount of hexane in terms of the total area of the detected peak was normalized by the weight of the film, and this was used as the amount of outgas generation. The smaller the outgas production amount, the better, and the 200 ppm or less is judged to be good. [Example 1] A mixture of PE:T (Novaduran 5010CS) (layer A) and dry blend of Hytrel 6377/PETG (B) layer in a ratio of 75/25 (mass) in two separate extruders , melting at 260 ° C, respectively. The respective melts were combined to form a layer of A/B/A before reaching the exit of the T-die, and then extruded from the T-die outlet. Then, the side of the PBT (Novaduran 5010CS) (A) layer was cooled with a cooling roll adjusted to 60 ° C to obtain a layer thickness of A/B/A = 20/60/20 as shown in Table 1. /zm) laminated film. The adhesion time of the cooling roller is 6 seconds. [Examples 2 to 6 and Comparative Examples 1 to 5] 17 322465 201124280 The resin of the layer (A), the layer thickness configuration, and the cooling roll temperature were changed as described in Table 1, as compared with Example 1. In the same manner as in Example 1, two types of three-layered laminated films having a structure of A/B/A were obtained. [Comparative Example 6] The resin (TPX) shown in Table 1 was supplied to an extruder, melted at 280 ° C, and extruded from the T die outlet, and adhered to a temperature of 50 ° C as shown in Table 1. The rolls were cooled and cooled to obtain a single layer film having a thickness of 50 # m as shown in Table 1. The adhesion time for cooling the parent wheel is 6 seconds. [Comparative Example 7] A resin which had been formulated into PBT/IP-22 = 50/50 (mass ratio) was supplied to an extruder, melted at 250 ° C, and extruded from the T die outlet, and the adhesion was adjusted to Cooling roller at 60 ° C for 6 seconds. However, the film was not crystallized, and the peeling property from the cooling roll was poor. Therefore, the film was removed from the cooling roller, and the temperature of the cooling roller was raised to 80 ° C, and the film was again adhered. However, the film was slightly crystallized, but the peeling condition from the cooling roll was remarkably deteriorated. Therefore, the temperature of the cooling roller was further raised to 100 °C. Here, the temperature has been adjusted to 100 ° (the cooling roller is again allowed to adhere to the film, the crystallization proceeds, and the peeling condition is also good, but not complete. Further, the adhesion time is increased to 30 seconds, but the peeling condition is completely Not good, and the resulting film is poor in planarity. 18 322465 201124280.. [Table 1] a < § PBT/IP-22 = 50/50(+) 1 1 ο 7 s Γ5 CM NS CM in SI 1 1 1 神1 « (D ϋ < SK 1 » s CO CO CM s ro esi S i in «〇〇CSJ 〇eo 〇ο ◎ ο 寸 u> a < m S CO 〇CM 甶CL P 〇5 So U 3 & & & & & «V» CM s 〇〇ΙΟ s X ο ζ ir><< ◎ @ << S CO * < m to Ο CM will m a. ^ C3 sti ^ so 兮s CO Ol CM s 〇g CM CM f〇Csl CM CO 〇in % c4 < ◎ © ◎ , @ S eg < QQ a δ in u5 Csl CO H ma 1 o Γ- n S eo CM CM o 3 3 〇CSI 〇> ο , ο ο \ <1 ο , 〇ο τ- «<< ms (O CM white 0. s 1 s CO CM Csl o 〇〇CM ra ο CM § 〇, ο <1 < ◎ S (0 < CQ s 1 s H m P ϋ s , ss CO CM ot so r- s 〇o ο ό -◎ @ ◎ ο U) < mo CQ 〇l·—ffl P CD to t 1 ^ oso CO C>4 CM 5 o 5 C*3 CO mas 〇CSi 1 ο , 〇 ◎ , ◎ ◎ @ S inch < m 〇to R- 5 H Csl U IA in s <M C4 CO CO CO CM CM CJ « s 5 〇Csl 〇W ο δ 〇, 〇〇© S CO C0 s <〇δ Csl White a 04 a & s , Ss CO 04 CM so C*> csJ eg CM IA s 00 CO 0 i r-_ 〇ό ◎ , 〇 ◎ ® ο ¥ CQ o σ 00 o White a ^ ϋ aa sssn CM ex so in ol 5 ss Ο o LO ο δ ◎ , 〇 ◎ © S r* 养 s < 〇 s Q. P 〇M a r- § M es CM so IO s 3 0 op 〇, 0 ◎ , @ ◎ ® S « ΪΙ Zhao® M NW * Letter IS 9 PI « /«•n PE »- g to 3 Difficult 5 〇& PEHP 雔DS 3 Shake S 3 δ og 雄 ti m o oblique o Q 2 cargo difficulty 1 § ί I Ρ ο r«· < » ΐ5 § ί5 ο /"Ν 邑α shout ft i\C ite QQ fiQ Μ niw twist: * 19 322465 201124280 From example 1 shown in Table 1 6 results apparent, in particular sheet under this scope of the invention, the system as a release film satisfying all of the performance requirements. In particular, since it is excellent in embedding property, it can also correspond to a printed circuit board having a precise pattern, and has a small amount of outgassing and excellent stain resistance. In Comparative Example 1, since the layer (B) did not contain the amorphous polyester, the heat of fusion of the crystal was too high, so that the embedding property was poor. In Comparative Example 2, since the layer (B) did not contain the amorphous polyester, the heat of fusion of the crystal was too high, so that the embedding property was poor. In comparison with Comparative Example 1, the polyester elastomer (HRT6377) was placed on the surface layer, and the embedding property at 180 °C was improved, but on the other hand, the release property was slightly inferior. In Comparative Example 3, the content of the amorphous polyester in the layer (B) was too large, and as a result, the crystallinity of the layer (B) was remarkably lowered and the crystallization rate index was too high, so that the heat of fusion of the crystal was too low, so the embedding property was good, but Poor heat resistance. In Comparative Example 4, the heat of crystal melting of the layer (A) was too low, so that the film forming workability was poor, and heat resistance and mold release property were also inferior. In Comparative Example 5, the heat of crystal melting of the layer (B) was too low, so that heat resistance was poor. Further, in some cases, the melting point of the layer (B) is low, and the resin is observed to be linearly oozing from the end surface of the sheet at 180 °C. Comparative Example 6 is a film composed of polymethylpentene (TPX) which is widely used as a release film, but the outgas generation amount is remarkably as large as about 10 times that of the film of the examples, which is poor in contamination. In Comparative Example 7, it was attempted to thin the resin composition having a crystallization rate index of more than 50 °C in a single layer, but the film forming property was poor, and performance evaluation could not be performed. Therefore, the stratification is abandoned. 20 322465 201124280 [Simple description of the diagram] None [Key component symbol description]
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| JP2009243492A JP2011088352A (en) | 2009-10-22 | 2009-10-22 | Release film |
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| TW201124280A true TW201124280A (en) | 2011-07-16 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI602862B (en) * | 2012-10-19 | 2017-10-21 | Mitsui Chemicals Tohcello Inc | Release film |
| TWI723093B (en) * | 2015-12-03 | 2021-04-01 | 日商三井化學東賽璐股份有限公司 | Mold release film for manufacturing process, applications thereof and method of manufacturing resin-sealed semiconductor using the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103987779B (en) | 2011-12-27 | 2016-04-06 | 三井化学株式会社 | 4-methyl-1-pentene (being total to) polymer composition, the film comprising said composition and hollow molded body |
| JP6181354B2 (en) * | 2012-05-30 | 2017-08-16 | ユニチカ株式会社 | Release film |
| JP6014680B2 (en) * | 2012-11-19 | 2016-10-25 | タツタ電線株式会社 | Laminated film and shield printed wiring board |
| JP5992091B2 (en) * | 2013-03-14 | 2016-09-14 | 三井化学東セロ株式会社 | Release film |
| CN105008126A (en) * | 2013-04-24 | 2015-10-28 | 尤尼吉可株式会社 | Release film for LED manufacturing |
| JP2015202662A (en) * | 2014-04-16 | 2015-11-16 | 住友ベークライト株式会社 | Release film production method |
| JP6352034B2 (en) * | 2014-04-21 | 2018-07-04 | 三井化学東セロ株式会社 | Multi-layer release film |
| JP6500418B2 (en) * | 2014-12-12 | 2019-04-17 | 住友ベークライト株式会社 | Release film |
| JP6391554B2 (en) * | 2015-12-14 | 2018-09-19 | 住友ベークライト株式会社 | Release film |
| JP7699420B2 (en) * | 2018-03-30 | 2025-06-27 | 東洋紡株式会社 | Packaging and packaging containers |
| JP7335132B2 (en) * | 2019-10-31 | 2023-08-29 | フジコピアン株式会社 | Transfer sheet for mark formation |
| JP7335133B2 (en) * | 2019-10-31 | 2023-08-29 | フジコピアン株式会社 | Transfer sheet for mark formation |
| CN116323419A (en) * | 2020-10-07 | 2023-06-23 | 株式会社钟化 | Multilayer films and packaging materials |
| CN114633534A (en) * | 2022-04-12 | 2022-06-17 | 广东鸿翔瑞材料科技有限公司 | High-temperature-resistant release film and preparation method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI602862B (en) * | 2012-10-19 | 2017-10-21 | Mitsui Chemicals Tohcello Inc | Release film |
| TWI723093B (en) * | 2015-12-03 | 2021-04-01 | 日商三井化學東賽璐股份有限公司 | Mold release film for manufacturing process, applications thereof and method of manufacturing resin-sealed semiconductor using the same |
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| CN102120376A (en) | 2011-07-13 |
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