TW201119697A - Plasma jet device. - Google Patents
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- TW201119697A TW201119697A TW098141349A TW98141349A TW201119697A TW 201119697 A TW201119697 A TW 201119697A TW 098141349 A TW098141349 A TW 098141349A TW 98141349 A TW98141349 A TW 98141349A TW 201119697 A TW201119697 A TW 201119697A
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- 238000010494 dissociation reaction Methods 0.000 claims abstract description 33
- 230000005593 dissociations Effects 0.000 claims abstract description 33
- 238000007750 plasma spraying Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 6
- 238000005253 cladding Methods 0.000 claims description 4
- 239000007769 metal material Substances 0.000 claims description 4
- 239000007921 spray Substances 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000004809 Teflon Substances 0.000 claims description 2
- 229920006362 Teflon® Polymers 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims description 2
- 229920006351 engineering plastic Polymers 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 230000004308 accommodation Effects 0.000 claims 3
- 206010033557 Palpitations Diseases 0.000 claims 1
- 229910052797 bismuth Inorganic materials 0.000 claims 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 14
- 230000001133 acceleration Effects 0.000 abstract description 6
- 239000007789 gas Substances 0.000 description 17
- 230000001954 sterilising effect Effects 0.000 description 14
- 238000004659 sterilization and disinfection Methods 0.000 description 13
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 2
- 241000588724 Escherichia coli Species 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 2
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- 239000011248 coating agent Substances 0.000 description 1
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- 239000003344 environmental pollutant Substances 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
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- 238000012545 processing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
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- 238000011160 research Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
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- 229920000785 ultra high molecular weight polyethylene Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Plasma Technology (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
Description
201119697 六、發明說明: 【發明所屬之技術領域】 本發明是有關於一種噴射裝置,特別是指一種電漿喷 射裝置。 【先前技術】201119697 VI. Description of the Invention: [Technical Field] The present invention relates to an injection device, and more particularly to a plasma injection device. [Prior Art]
近年來’利用電漿促使氣體之解離效應來應用於去除 氣態污染物的研究正陸續發展中,而以電漿進行殺菌消毒 的應用已拓展至冷氣機與空氣清淨機等產品上。而研究指 出,電漿對於格蘭式陰性(Gram-negative)的細菌,如大腸 桿菌,具有破壞其細胞外薄膜的效果,因為電漿中的帶電 粒子可以在此類細菌的粗糙表面,藉由其曲率的不同而產 生類似尖端放電的效應,使得電漿中的自由基(freeradieais) 與紫外線輻射容易透過,對細胞内部的組織造成損壞。 不過,一般的熱電裝(thermal咖麵),由於系統溫度 動辄超過攝氏溫度—萬度以上,適合制於高溫領域,如 核電廠廢棄物處理,對於非耐熱性材㈣處理就有其困難 為解決上述問題,便有如圖1所示,中華民@公告$In recent years, research on the use of plasma to promote the dissociation effect of gases for the removal of gaseous pollutants is progressing, and the application of sterilization by plasma has been extended to products such as air conditioners and air cleaners. Studies have shown that plasma has the effect of destroying its extracellular membranes for Gram-negative bacteria, such as E. coli, because charged particles in the plasma can be found on the rough surface of such bacteria. The difference in curvature produces an effect similar to the tip discharge, which makes free radicals (plasma) and ultraviolet radiation in the plasma easily penetrate, causing damage to the tissue inside the cell. However, the general thermoelectric equipment (thermal coffee surface), because the system temperature is more than the Celsius temperature - more than 10,000 degrees, suitable for high temperature areas, such as nuclear power plant waste treatment, for non-heat resistant materials (four) treatment has its difficulties To solve the above problems, there will be as shown in Figure 1, Zhonghuamin@公告$
1262801號發明專利案所揭露的「熱風電漿殺菌裝置」,包 含一電漿產生單元丨丨,R 及一風扇12。其中,該電漿產生單 元11包括一變壓單亓M1 电水压王早 , 、一耦接於該變壓單元111的平 灯電極板112,及_你认斗 m ;該二電極板112之間的混合氣體 113,並於其中之—费 1U -V 板U2上塗佈高電阻材料而形成一 冋電阻層114 ’或者是吉 .ui _ 疋直接以一板狀高電阻層 201119697 中之一電極板112上。 藉由上述设s十,使得該二電極板112輕接於該變μ單元 ill而形成一電場,並利用該風扇12所產生的氣流來將該 電漿產生單元11所提供的電漿與熱量輸送至一特定位置, 而達到熱風電漿殺菌的效果。然而上述設計仍有以下缺點 (1) 該二平行電極板112在丨大氣壓下實際可點燃電漿間距 過小,滅菌範圍有限。 (2) 兩平行電極板U2為平行安置,因而使得流通其間的氣 流無加速效果’影響滅菌效率。 (3) 若高電阻層114以板狀形態貼合於電極板ιΐ2上,則無 法適用曲面電極;若高電阻層114與電極板ιΐ2以塗佈 方式結合,由於不同材質間受熱產生應變量不同,高電 阻層114易發生斷裂或變形。 (4) 以尚電阻層114產生足夠溫度效應殺菌,將造成耗能且 效益差現象或是處理材料發生因熱質變現象,無法對低 溫滅菌有所貢獻。 【發明内容】 本發明之目的,即在提供一種具有大範圍電漿 工作區且能提供低溫電漿的電漿噴射裝置。 於是,本發明電漿噴射裝置,包含: 一個殼體,圍繞界定出一個容置空間; 個乳體供應單元,與該容置空間相連通並提供氣體 進入該容置空間内; 201119697 多數個電極單几,並列地設置於該容置空間内,每一 個電極單元包括-個第—電極,及—個間隔於該第—電極 =第一電極’ #中,該第―、二電極的極性相反並共同界 定出-解離通道’該解離通道具有一入口端,及一出口端 ’而每-電極單元的[電極與相鄰電極單元的第二電極 同樣共同界定出該解離通道,其中,該第一、二電極的外The "hot air plasma sterilizing device" disclosed in the invention patent No. 1262801 comprises a plasma generating unit 丨丨, R and a fan 12. The plasma generating unit 11 includes a transformer unit M1, an electric water pressure king, a flat lamp electrode plate 112 coupled to the transformer unit 111, and a counter electrode m; the two electrode plates 112 The mixed gas 113 is mixed with a high-resistance material on the 1U-V plate U2 to form a resistive layer 114' or a y. y _ 疋 directly in a plate-like high-resistance layer 201119697 On an electrode plate 112. By the above arrangement, the two electrode plates 112 are lightly connected to the variable μ unit ill to form an electric field, and the airflow generated by the fan 12 is used to supply the plasma and heat provided by the plasma generating unit 11. Delivered to a specific location to achieve the effect of hot air plasma sterilization. However, the above design still has the following disadvantages: (1) The two parallel electrode plates 112 are actually too small to ignite the plasma at a helium atmosphere, and the sterilization range is limited. (2) The two parallel electrode plates U2 are arranged in parallel, so that the air flow between them has no acceleration effect, which affects the sterilization efficiency. (3) If the high-resistance layer 114 is bonded to the electrode plate ι 2 in a plate shape, the curved electrode cannot be applied; if the high-resistance layer 114 and the electrode plate ι 2 are combined by coating, the strain amount is different due to heat between different materials. The high resistance layer 114 is prone to breakage or deformation. (4) Sufficient temperature effect sterilization by the resistive layer 114 will result in energy consumption and poor efficiency, or the processing material may be affected by the thermal mass change, which cannot contribute to low temperature sterilization. SUMMARY OF THE INVENTION It is an object of the present invention to provide a plasma jet apparatus having a wide range of plasma working zones and capable of providing low temperature plasma. Therefore, the plasma spraying device of the present invention comprises: a casing defining an accommodating space; a milk supply unit communicating with the accommodating space and supplying gas into the accommodating space; 201119697 a plurality of electrodes a plurality of electrodes are arranged side by side in the accommodating space, each of the electrode units includes a first electrode, and a space is spaced apart from the first electrode and the first electrode ′, wherein the first and second electrodes have opposite polarities And jointly defining a dissociation channel 'the dissociation channel has an inlet end, and an outlet end' and the [electrode of each electrode unit and the second electrode of the adjacent electrode unit together define the dissociation channel, wherein the dissociation channel One or two electrodes
:不同’使得每一解離通道沿著該入口端至該出口端會隨 著該第一、二電極的外形不同而改變其寬度;及 一個電壓源,提供電能至所述電極單元; 該氣體供應單元提供的氣體由所述解離通道的入口端 進入時會被解離成準中性氣團,並自該出口端向外喷出。 本發明之功效在於:藉由多數個電極單元排列於該容 置空間内,可以大幅提升電毁喷射的範目,且每一電極單 兀之外形不同的第一、二電極所界定出的解離通道,可以 提升電漿喷射的加速效果。 【實施方式】 有關本發明之前述及其他技術内容、特點與功效,在 以下配合參考圖式之三個較佳實施例的詳細說明中,將可 清楚的呈現。 在本發明被詳細描述之前,要注意的是,在以下的說 明内容中,類似的元件是以相同的編號來表示。 參閱圖2 ’為本發明電漿喷射裝置2的第一較佳實施例 ,包含一個殼體3、一個氣體供應單元4、多數個電極單元 5,及一個電壓源6。 201119697 _該殼體3圍繞界定出一個容置空間31 ;該氣體供應單 70 4是與該容置空間31相連通並提供氣體進人該容置空間 31内,所述電極單元5是以直線形式並列地設置於該容置 工間31内’而該電壓源6是用以提供電能至所述電極單元 5 〇 參閱圖3並回顧圖2,每一個電極單元5包括一個第一 電極51,及一個間隔於該第一電極51的第二電極52。其 中孩第、一電極51、52的極性相反並共同界定出一解 離通道5—3,該解離通道53具有一入口端531,及一出口端 而每電極單元5的第-電極51與相鄰電極單元$ 的第二電極52同樣共同界定出該解離通道53。 、於本實施例中,每—電極單元5之第—電極51的中心 二連線’與每—第二電極52的中心、點連線是重疊的,也就 ^所述第冑極51與第二電極52是同心設置的態樣 :、中,6玄第一、二電極S1、的外形不同,使得每一解 離通道53沿著該入明531至該出口# 532會隨著該第一 一電極51、52的外形不同而改變其寬度。 參閱圖3至圖9,於本實施例中,是如圖3所示,每一 第-電極51的截面形狀為空心圓形,而每一第二電極兄 的截面形狀為長方形’當然也可以採用截面形狀為長方形 的母-第二電極52,來搭配每一第一電極5i的截面形狀是 如圖4所不的實心圓形、圖5所示的空心楕圓形圖6所 丁的實、楕圓形、® 7所示的空心不對稱楕圓形,或圖8 所示的實心不對稱楕圓形中擇一使用。其中,圖7與圖8 201119697 中的不對稱楕圓开》所指的是所述第一電極51為概呈楕圓形 ,但以橫向通過所述第一電極51之中心點的軸線為基準, 其上下是呈上寬下窄的不對稱態樣。 另外,於圖3至圖8所示之第一、二電極51、52的態 樣中,每一第一電極51為金屬材質,而每一第二電極52 為金屬材質,且表面包覆有一層介電層54,以阻礙電子通 路避免流光產生’ f然該介電@ 54也可以是如目9所示包 覆於第電極51上,不以此為限。而所述介電層54是選 用電阻率是大於l〇E8 ohm_cm的材質,於本實施例中是選 用石英玻璃,當然也可以是由氧化鋁陶瓷、三氧化二鋁、 鐵氟龍、氟素樹脂,或工程塑膠(如:p〇M,pEEK,pBT, PPS,ABS,超高分子量聚乙稀)中擇一使用,不以此為限。 參閱圖10,每一第二電極52的截面形狀也可以是如圖 中所示為換形的態樣,並搭配如圖3至圖9中所提及之各 種形狀的第一電極51,同樣都能達成界定出一具有寬度變 化之解離通道53的效果。 參閱圖9及圖11,要特別說明的是,如圖9所示當 介電層54是包覆於圓形(或者前述榜圓形或不對稱惰圖形等 形狀)的第一電極51上時,介電層54是完全包覆於所述第 一電極51 ;而如圖u所示,當介電層54是包覆於長方形 的第二電極52上時,每一第二電極52具有—包覆區切, 及一預變形區522,而介電層54是包覆於該包覆區521上 ,以使該預變形區522是顯露於介電層54外。如此一來, 使得第二電極52與介電層54之間是以局部方式結合,而 201119697 該預變形區522是預留一個變形緩衝的區域,防止第二電 極52與介電層54因受熱膨脹的程度不同而變形破壞。 參閱圖11至圖16,於本實施例中,該預變形區522的 形態是如圖11所示的U型,當然可以是如圖12所示的v 型、圖13所示的矩型、圖丨4所示的單斜v型、圖15所示 的半圓型,或圖16所示的梯型中擇一使用,同樣都能達到 緩衝的作用。 復參閱圖2及3,該電漿喷射裝置2使用時,是將一待 處理物200置於鄰近所述解離通道53的出口端532處,並 使該電壓源6提供電能至所述電極單元5,而該氣體供應單 兀4提供的氣體會由所述解離通道53的入口端進入, 並被解離成準中性氣團(也就是電漿),並自該出口端532向 外喷出,而喷射於該待處理物2〇〇的表面。 藉由上述設計,本發明電漿喷射裝置2於實際使用時 具有以下的優點: (1)具大面積的電漿工作區: 时本發明是將多數個電極單元5並列,使該氣體供 應早% 4提供的氣體經由所述解離通道53後形成準中 ,氣團噴發’因此電漿是以大面積的形式喷發,而不 ^如習知技術中單點式或單線式的喷發,所以本發明 :、、速的處理大型待處理物·,同時也能依照該待 理物200的面積而調整電極單元5的數量。 ()解離通道53具有分段加速的作用: 由於所述第―、二電極51、52的外形不同,因此 201119697 由其共同界定的解離通道53會由入口端531至出口端 532形成寬度不同的形態,使得氣體在通過所述解離通 1L 53時月b產生文氏效應(venturi effect)而加速通過’而 且所述第一電極51是弧狀外形,因此氣體在通過所述 解離通道53時,其寬度是持續改變,而能有分段加速 的作用。 (3) 電漿噴射均勻: 透過所述電極單元5的排列設置,使得氣體是分 散通過所述解離通道53後形成激發態再喷發,而不是 如習知技術中單點式或單線式的喷發,因此可以大幅 提升電漿喷射的均勻度,而提升該電漿噴射裝置2的 性能。 (4) 電極單元5具緩衝區域: 所述電極單元5的第二電極52之預變形區522的 設計,可以防止第二電極52與介電層54因受熱膨脹 的程度不同而變形破壞,達到延長使用壽命的功效。 (5) 利用低溫紫外線進行殺菌: 由於本發明是將多數個電極單元5並列,各解離 .通道53所產生的電漿是具有低溫特性,並能釋出包含 紫外光在内,不同波長的各種光線,若將本發明應用 在消毒殺菌的技術領域,就可以利用多數道低溫紫外 線的電漿’來對該待處理物200進行大面積的殺菌作 業。 以大腸桿菌(Escherichia coli.ATCC 11775)為例,使 9: different' such that each dissociation channel varies its width along the inlet end to the outlet end as the shape of the first and second electrodes is different; and a voltage source supplies electrical energy to the electrode unit; the gas supply The gas supplied by the unit is dissociated into a quasi-neutral air mass when entering from the inlet end of the dissociation channel, and is ejected outward from the outlet end. The effect of the invention is that: by arranging a plurality of electrode units in the accommodating space, the scope of the electrosurgical injection can be greatly improved, and the dissociation defined by the first and second electrodes different in shape of each electrode The channel can enhance the acceleration of the plasma jet. The above and other technical contents, features and effects of the present invention will be apparent from the following detailed description of the preferred embodiments of the drawings. Before the present invention is described in detail, it is noted that in the following description, similar elements are denoted by the same reference numerals. Referring to Fig. 2', a first preferred embodiment of the plasma spraying device 2 of the present invention comprises a casing 3, a gas supply unit 4, a plurality of electrode units 5, and a voltage source 6. 201119697 _ The housing 3 defines an accommodating space 31. The gas supply unit 70 4 is in communication with the accommodating space 31 and supplies gas into the accommodating space 31. The electrode unit 5 is a straight line. The form is juxtaposed in the housing 31 and the voltage source 6 is used to supply electrical energy to the electrode unit. Referring to FIG. 3 and reviewing FIG. 2, each of the electrode units 5 includes a first electrode 51. And a second electrode 52 spaced apart from the first electrode 51. Wherein the children, the electrodes 51, 52 have opposite polarities and collectively define a dissociation channel 5.3 having an inlet end 531 and an outlet end and the first electrode 51 of each electrode unit 5 adjacent to each other The second electrode 52 of the electrode unit $ also collectively defines the dissociation channel 53. In this embodiment, the center line 2 of the first electrode 51 of each electrode unit 5 overlaps with the center line and the point line of each second electrode 52, that is, the first pole 51 and The second electrode 52 is concentrically arranged: in the middle, the first and second electrodes S1 are different in shape, such that each dissociation channel 53 along the enclosing 531 to the outlet # 532 will follow the first The shape of one of the electrodes 51, 52 is varied to change its width. Referring to FIG. 3 to FIG. 9, in the embodiment, as shown in FIG. 3, the cross-sectional shape of each of the first electrodes 51 is a hollow circle, and the cross-sectional shape of each second electrode brother is a rectangle. The female-second electrode 52 having a rectangular cross-sectional shape is used, and the cross-sectional shape of each of the first electrodes 5i is a solid circular shape as shown in FIG. 4, and the hollow circular shape shown in FIG. , 楕 round, hollow asymmetrical circular circle as shown in ® 7, or a solid asymmetric circular shape as shown in Figure 8. Here, the asymmetric circular opening in FIG. 7 and FIG. 8 201119697 means that the first electrode 51 is substantially circular, but is based on the axis passing through the center point of the first electrode 51 in the lateral direction. The upper and lower sides are asymmetrical patterns with a width and a width. In addition, in the first and second electrodes 51 and 52 shown in FIG. 3 to FIG. 8 , each of the first electrodes 51 is made of a metal material, and each of the second electrodes 52 is made of a metal material and the surface is covered with a surface. A dielectric layer 54 is formed to block the electron path from the flow of light. The dielectric layer 54 may be coated on the first electrode 51 as shown in FIG. 9 , and is not limited thereto. The dielectric layer 54 is made of a material having a resistivity greater than l〇E8 ohm_cm. In this embodiment, quartz glass is used, and of course, alumina ceramics, aluminum oxide, Teflon, and fluorin may be used. Resin, or engineering plastics (such as: p〇M, pEEK, pBT, PPS, ABS, ultra-high molecular weight polyethylene) should be used instead of this. Referring to FIG. 10, the cross-sectional shape of each of the second electrodes 52 may also be a modified shape as shown in the figure, and matched with the first electrodes 51 of various shapes as mentioned in FIGS. 3 to 9, the same An effect of defining a dissociation channel 53 having a width variation can be achieved. Referring to FIG. 9 and FIG. 11, it is to be particularly noted that when the dielectric layer 54 is coated on the first electrode 51 of a circular shape (or a shape of the aforementioned circular or asymmetrical idle pattern, etc.) as shown in FIG. The dielectric layer 54 is completely covered on the first electrode 51; and as shown in FIG. u, when the dielectric layer 54 is coated on the rectangular second electrode 52, each of the second electrodes 52 has - The cladding region is cut and a pre-deformed region 522 is coated, and the dielectric layer 54 is coated on the cladding region 521 such that the pre-deformation region 522 is exposed outside the dielectric layer 54. In this way, the second electrode 52 and the dielectric layer 54 are combined in a local manner, and the pre-deformed region 522 is a region where a deformation buffer is reserved to prevent the second electrode 52 and the dielectric layer 54 from being affected. The degree of thermal expansion is different and the deformation is destroyed. Referring to FIG. 11 to FIG. 16 , in the embodiment, the pre-deformed region 522 has a U-shape as shown in FIG. 11 , and may of course be a v-shape as shown in FIG. 12 and a rectangular shape as shown in FIG. 13 . The single-slope v-shape shown in Fig. 4, the semi-circular shape shown in Fig. 15, or the ladder type shown in Fig. 16 can also be used for buffering. 2 and 3, the plasma spraying device 2 is used to place a workpiece 200 adjacent to the outlet end 532 of the dissociation channel 53, and to provide the voltage source 6 with electrical energy to the electrode unit. 5, and the gas supplied from the gas supply unit 4 enters from the inlet end of the dissociation passage 53 and is dissociated into a quasi-neutral air mass (that is, plasma), and is ejected outward from the outlet end 532. And sprayed onto the surface of the object to be treated 2〇〇. With the above design, the plasma spraying device 2 of the present invention has the following advantages in practical use: (1) A plasma working area having a large area: The present invention is a method in which a plurality of electrode units 5 are juxtaposed to supply the gas early. The gas supplied by %4 forms a quasi-centralized passage through the dissociation passage 53, and the air mass erupts 'so that the plasma is ejected in a large area, unlike the single-point or single-line eruption in the prior art, so According to the present invention, the large-sized object to be processed can be processed at a high speed, and the number of the electrode units 5 can be adjusted in accordance with the area of the material to be treated 200. () Dissociation channel 53 has the effect of segmentation acceleration: Since the first and second electrodes 51, 52 have different shapes, the dissociation channel 53 defined by 201119697 from the inlet end 531 to the outlet end 532 may have different widths. Forming such that the gas generates a venturi effect while passing through the dissociation 1L 53 to accelerate through ' and the first electrode 51 is in an arc shape, so that when the gas passes through the dissociation channel 53, Its width is continuously changed, and it can have the effect of segmentation acceleration. (3) Plasma jet uniformity: through the arrangement of the electrode units 5, the gas is dispersed through the dissociation channel 53 to form an excited state and then erupted, instead of being single-point or single-line as in the prior art. The eruption can greatly improve the uniformity of the plasma spray and improve the performance of the plasma spray device 2. (4) The electrode unit 5 has a buffer region: the pre-deformation region 522 of the second electrode 52 of the electrode unit 5 is designed to prevent deformation and damage of the second electrode 52 and the dielectric layer 54 due to the degree of thermal expansion. The effect of extending the service life. (5) Sterilization by low-temperature ultraviolet light: Since the present invention is a plurality of electrode units 5 juxtaposed, each dissociation. The plasma generated by the channel 53 has a low-temperature characteristic and can release various wavelengths including ultraviolet light. Light, if the invention is applied to the technical field of sterilization, a large-area sterilization operation of the object to be treated 200 can be performed by using a plasma of a plurality of low-temperature ultraviolet rays. Take Escherichia coli. ATCC 11775 as an example to make 9
[S 201119697 用氬氣電漿’匹配射頻(13 56]^1^)電源供應器滅菌時 間约1分鐘可達固態滅菌確效,約3分鐘可達液態滅 菌確效,電漿溫度約53。(:。 參閲圖17,為本發明電漿噴射裝置2的第二較佳實施 例’大致類似前述該第一較佳實施例,不同之處在於:每 一電極單7L 5之第一電極51的中心點連線,與每一電極單 兀5之第二電極52的申心點連線是存在有一間距21〇,也 就是說’所述第-電極51與第二電極52是偏心設置的離 樣。 "[S 201119697 Using argon plasma to match the radio frequency (13 56]^1^) The power supply sterilization time is about 1 minute to achieve solid sterilization, and the liquid sterilization is effective in about 3 minutes, and the plasma temperature is about 53. (: Referring to Figure 17, a second preferred embodiment of the plasma ejection device 2 of the present invention is substantially similar to the first preferred embodiment described above, except that the first electrode of each electrode is 7L 5 The center point of 51 is connected, and the line connecting the center point of the second electrode 52 of each electrode unit 5 is such that there is a gap 21〇, that is, the first electrode 51 and the second electrode 52 are eccentrically disposed. Inseparable. "
透過上述偏心設置的態樣,除了可以達到前述該第一 較佳實施例的功效之外,更可以加快氣體通過所述解離通 道53的速度’使得準中性氣團以^夠大的喷流速度向外嗔 流出,而更能提升該電漿喷射裳置2的效能。 閱圖is及19,為本發明電聚喷射装置2的第三較 實施例’大致類似前述該第—較佳實施例不同之處在 :所述電極單元5除了以㈣—較佳實施例之直線排列Through the above-mentioned eccentrically disposed aspect, in addition to the efficiency of the foregoing first preferred embodiment, the speed of the gas passing through the dissociation passage 53 can be accelerated to make the quasi-neutral air mass have a sufficiently large jet velocity. The outward sputum flows out, and the performance of the plasma jet skirt 2 can be improved. 1 and 19, a third comparative embodiment of the electrospray jetting apparatus 2 of the present invention is substantially similar to the foregoing preferred embodiment in that the electrode unit 5 is other than (4) - the preferred embodiment Straight line
W方式之外’减依照該待處理物·的外形而以如 18所示的環狀曲線形式,戋 式排列,㈣也可丄5圖19所示的自由曲線: 以此為限厂述形式的複合排列形式,: , 〜利1刈形式的改變,降了处上 大電漿工作區之外,還能針對 ” 了忐加 掛 對該待處理物200的形妝而歧 之變化’來提升該電㈣射裝置2的適用性。 而、 综上所述,本發明電㈣射裝置2,藉由多個電極單元 10 201119697 5的排列變化,能因應不同形狀的待處理物2〇〇,進行電漿 ㈣或表面改質的作業;而每_電極單元5形狀不同之第 、-電極51、52的設計’可以使該電漿噴射裝置2具有 大面積的電毁工作區、解離通道53具有分段加速的作用、 電浆喷射均句等效果,且所述電極單A 5還具有緩衝作用 ’提升使用壽命,故確實能達成本發明之目的。In addition to the W mode, the circular curve shown in Fig. 18 is arranged in accordance with the shape of the object to be processed, and the free curve is shown in Fig. 19 as follows: The composite arrangement form, : , the change of the form of the 1 利 1 ,, which falls outside the large plasma working area, can also be related to the change of the shape of the object to be treated 200 The applicability of the electric (four) projecting device 2 is improved. In summary, the electric (four) projecting device 2 of the present invention can respond to different shapes of the object to be processed by the arrangement of the plurality of electrode units 10 201119697 5 . The operation of the plasma (four) or the surface modification; and the design of the -electrode 51, 52 having different shapes per electrode unit 5 can make the plasma injection device 2 have a large area of the electric destruction working area and the dissociation channel. The utility model has the effects of segmentation acceleration, plasma jet uniformity, and the like, and the electrode unit A 5 also has a buffering function to increase the service life, so that the object of the invention can be achieved.
▲准以上所述者,僅為本發明之較佳實施例而已,當不 能以此限定本發明實施之範圍’即大凡依本發明中請專利 範圍及發明說明内容所作之簡單的等效變化與修飾,皆仍 屬本發明專利涵蓋之範圍内。 【圖式簡單說明】 圖1是一示意圖,說明中華民國公告第126細號發明 專利案所揭露的「熱風電漿殺菌裝置」; 圖2疋一不意圖,為本發明電漿喷射裝置之第一較佳 實施例,說明該電漿喷射裝置的整體結構; ⑽圖3至1〇皆為側視圖,說明該第一較佳實施例中,電 極單元中,第一、二電極的各種不同形態; 圖11疋側視圖,說明該第一較佳實施例中,第二電 極具有一緩衝區; 々圖12 i 16是皆為側視圖’說明該第一較佳實施例中 ,第一電極之緩衝區的各種不同形態; 圖17疋一側視圖,為本發明電漿喷射裝置之第二較佳 實施例,所述第一、二電極為偏心設置; 圖18疋一側視圖,為本發明電漿喷射裝置之第三較佳The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent change of the patent scope and the description of the invention in the present invention is Modifications are still within the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view showing a "hot air plasma sterilization device" disclosed in the Patent No. 126 of the Republic of China Announcement; FIG. 2 is a schematic view of the plasma ejection device of the present invention. A preferred embodiment illustrates the overall structure of the plasma spraying device. (10) FIGS. 3 to 1B are side views showing various different forms of the first and second electrodes in the electrode unit in the first preferred embodiment. Figure 11 is a side view showing the second electrode having a buffer in the first preferred embodiment; Figure 12 i 16 is a side view of the first preferred embodiment, the first electrode FIG. 17 is a side view showing a second preferred embodiment of the plasma spraying device of the present invention, wherein the first and second electrodes are eccentrically disposed; FIG. 18 is a side view showing the present invention. The third preferred plasma spraying device
11 201119697 實施例,所述電極單元的一種排列態樣;及 圖19是一側視圖,為該第三較佳實施例中,所述電極 單元的另一種排列態樣。11 201119697 Embodiment, an arrangement of the electrode unit; and Fig. 19 is a side view showing another arrangement of the electrode unit in the third preferred embodiment.
12 201119697 【主要元件符號說明】 2 喷射裝置 52 第二電極 200 待處理物 521 包覆區 210 間距 522 預變形區 3 殼體 53 解離通道 31 容置空間 531 入口端 4 氣體供應單元 532 出口端 5 電極單元 54 介電層 51 第一電極 6 電壓源12 201119697 [Description of main component symbols] 2 Spraying device 52 Second electrode 200 Object to be treated 521 Covering area 210 Spacing 522 Pre-deformation zone 3 Housing 53 Dissociation channel 31 accommodating space 531 Inlet end 4 Gas supply unit 532 Outlet end 5 Electrode unit 54 dielectric layer 51 first electrode 6 voltage source
[si 13[si 13
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW098141349A TW201119697A (en) | 2009-12-03 | 2009-12-03 | Plasma jet device. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW098141349A TW201119697A (en) | 2009-12-03 | 2009-12-03 | Plasma jet device. |
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| Publication Number | Publication Date |
|---|---|
| TW201119697A true TW201119697A (en) | 2011-06-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098141349A TW201119697A (en) | 2009-12-03 | 2009-12-03 | Plasma jet device. |
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| TW (1) | TW201119697A (en) |
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2009
- 2009-12-03 TW TW098141349A patent/TW201119697A/en unknown
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