TW201100976A

TW201100976A - Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method

Info

Publication number: TW201100976A
Application number: TW099115378A
Authority: TW
Inventors: Yasuo Aoki
Original assignee: Nikon Corp
Priority date: 2009-05-15
Filing date: 2010-05-14
Publication date: 2011-01-01
Also published as: JP6579501B2; KR20180067737A; JP2018110271A; JP5929993B2; JP2016145996A; TW201621477A; TWI526787B; KR101693168B1; JPWO2010131485A1; KR102051842B1; JP6881530B2; JP5626206B2; KR20170005161A; JP2019211791A; JP6315294B2; KR20190135553A; TWI623819B; KR101869463B1; KR102211255B1; TW201827945A

Abstract

Sub-stages (50, 70) are disposed on the +Y and -Y sides of a main stage (40) that supports a mask (M). The sub-stages can move in long strokes in the X direction, which is the scan direction. Fine movements of the main stage (40) with respect to the sub-stages (50, 70) in the Y direction, which is the cross-scan direction, are made using a voice coil motor that comprises: a Y movable element (44) that includes a magnet unit provided on the main stage (40); and a Y stationary element (88) that includes a coil unit provided on a sub-stage (50). Also, lock apparatuses (100a-100d) are used to connect the main stage (40) to the sub-stages (50, 70), in contact (or not in contact) with each. The main stage (40) is moved in the X direction by just driving the sub-stages (50, 70).

Description

201100976 六、發明說明：【發明所屬之技術領域】本發明係關於移動體裝置、動力傳達裝置及曝光穿置、以及元件製造方法，詳言之，係關於具備沿既定二維平面移動之移動體之移動體裝置、用以在前述移動體與外部裝置之間進行動力傳達之動力傳達裝置及具備前述移動體之曝光裝置'以及使用該曝光裝置之元件製造方法。【先前技術】一直以來，於製造液晶顯*元件、半導體元件（積體電路等）等電子元件（微元件）之微影製程，係使用—邊使光罩或標線片(以下，統稱為「光罩」）、與玻璃板或晶圓等物體 (以下’統稱為「基板」）沿既定掃描方向同步移動、一邊將形成於光罩之圖案透過投影光學系轉印至基板上之步進掃描(_ & scan)方式之掃描型投影曝光裝置(所謂之掃描+ 進機（亦稱為掃描機））等。 v 此種掃描型曝光裝置，以具備保持光罩 =光罩載台裝置、及保持基板移動於掃描方向之= :裝置者較為人知（例如，參照專利文獻υ。此專含延設於掃描方向之固定子、1 载台裝置，藉由包之線性馬達，將光罩蓥Α 、疋於光罩載台之可動子運將先罩載台於掃描方向以 μ ’ 為了使其追隨基板載台’而在掃Ρ方=㈣。同時在水平面内與掃描方向正交 "向之外亦向）微驅動光罩載台。。(父叉（cross)掃描方 201100976 、然而，上述專利文獻1所記载之光罩載台裝置，當將光罩载台驅動於交叉掃描方向時，用以將光罩載台驅動於掃描方向之線性馬達之固定子與可動子於交又掃描方向之相對位置產生變化，而有可能降低往掃描方向之驅動力。因此，產生了進行使線性馬達之固定子大型化等之對策之需要。此外’上述專利文獻丨所記載之光罩載^置，光罩载台往交叉掃描方向之移動量受限於微少量。因此，亦 Ο Ο 希望犯以較大仃程將光罩載台驅動於交叉掃描載台裝置。尤罩又，上述專利文獻1所記载之光罩載台裂置，為防止二自外部之振動（diSturbanee)之傳達，採用了將光罩載台懸 Λ ^承於既疋導件上之構成。除此之外，上述線性馬達之固定子與可動子為非接觸狀態。因此，習知之光罩載么裝 =並不存在於㈣面㈣導光罩載台之導件，例如在:光 =置之褒置起動時等’欲將光罩载台引導至所欲位置是非 =難的。此外例如’在對線性馬達固定子之電力供應、心、争止時光罩載台因其慣性而無法急停止續移動之可能性高。持 A再者，上述專利文獻1所記載之曝光裝置，於光罩載裝置或基板載台裝置連接有用以供應來自外部之各種動力、例如供應電力等 4- ^ ^ ^ 板載台裝置之移動時！裝置或基承構件之滑動而產生塵埃、或振動之虞。千之支 [專利文獻1]曰本特開2004— Η915號公報 5 201100976 【發明内容】用以解決課題之手段本發明第1態樣之第1移動裝置，具備：第1移動體，可沿包含彼此正交之第1軸及第2軸之二維平面移動；第2 移動體，在與該第丨軸平行之方向配置在該第丨移動體之一側，至；此在與該第2軸平行之方向以既定行程移動；第3移動體，在與該第！抽平行之方向配置在該第^移動體之另側至少能在與該第2軸平行之方向以既定行程移動第1驅動系，將該第2及第3移動體一起驅動於與，亥第2轴平行之方向；以及狀態設^裝置，可在將該第丨 ~第3移動體一體驅動之第】狀態、與無法將該第卜第3 移動體-體驅動之第2狀態之間進行切換設定。根據此裝置，在以狀態設定裝置設定為第1狀態時， ‘ 及第3移動體—起被第1驅動系驅動於與第2抽平衧方向第1移動體即與第2及第3移動體—體移動於與2軸平行之方向。亦即，第1〜第3移動體係-體移動於與第2軸平行之方& 方向。因此，可使用帛1驅動系將第i 3移動體，驅動於與第2轴平行之方向。 :發明第2癌樣之第2移動體裝置，具備：第1移動，沿包含彼此正交之第丨及第2轴之二維平面移動動第2移動體，在盥今篦]缸亚乂滅夕^ '、°Λ第軸千行之方向配置在該第1移動艘之—側，至少能在與該第動勒.眾 '圾知、車平行之方向以既定行程移動，第3移動體，在與該帛銘動, 孕由十灯之方向配置在該第j 移體之另一側，至少能在與行程移動；第i驅動十灯之方向以既定第2及第3移動體一起驅動 201100976 於與該第2軸平行之方向；連結裝置，別以非接觸狀態連結於該第2及第3蒋二體分以及限制褒置，…… 移動體之連結襄置； w衣罝，具有可動構件，此移動體與該第2及第3移動體 =將該第1 定範圍之® 7 j相對移動範圍限制於既 ==、與容許該第1移動體與該第2及第3 移動體之超過該既定範圍之相對移根據此裝置，當第2及第3移動體—起;二 Ο Ο 驅動於與第2轴平行之方向時，以連結農置連结之第:系動體即與上述第2及第第1移第移動體—體移動於與第2軸平扞之^向。此時，當限制裝置之可動構件位置第！位置之产 :時，由於第1移動體與第2及第3移動體之可相對心於既定範圍，因此即使無法控制第！驅動: 第1移動體超過該可相對移動可能範圍而從第2 及第3移動體分離之情事。另-方面，當限制裝置之可動構件位於第2位置之情形時’可使第1移動體與第2及第3 移動體分離。本發月第3態樣之第i曝光裝置，係經由圖案以能量束使物體曝光，據以將該圖案轉印至該物體，其特徵在於，具備：具有該圖案之圖案保持體與該物體中之一方係保持在該第1移動體之本發明之第1、第2移動體裝置之任— 者；以及保持該圖案保持體與該物體中之另一方之保持置。、本發明第4態樣之第2曝光裝置，係經由圖案以能量束使物體曝光據以將該圖案轉印至該物體，其具備：主載台，保持具有該圖案之圖案保持體與該物體之一方，能沿 201100976 包含彼此正交之第1軸及第2軸之二維平面移動；一對副載台，係在與該第1軸平行之方向分別配置在該主載台之一側及另~側，至少能在與該第2軸平行之方向以既定行程移動；第1驅動系’將該一對副載台驅動於與該第2軸平行之方向；狀態設定裝置，可在將該主載台與該—對副載台一體驅動之第1狀態、與無法一體驅動之第2狀態之間進行切換設定；以及保持裝置’保持該圖案保持體與該物體之另一方。根據此裝置，在以狀態設定裝置設定於第丨狀態時，當一對副載台一起被第1驅動系驅動於與第2軸平行之方向時’主載台即與一對副載台一體移動於與第2軸平行之方向。亦即，主載台與一對副载台係一體的移動於與第2 軸平行之方向。因此，可使用第丨驅動系將主載台與一對副載台驅動於與第2軸平行之方向。本發明第5態樣之第3曝光裝置，係經由圖案以能量束使物體曝光以將該圖案轉印至該物體，其具備：主載台，保持具有該圖案之圖案保持體與該物體之—方，能沿包含彼此正交之第i軸及第2軸之二維平面移動；一對畐以△， ^與該第丨軸平行之方向分別配置在該主載台之—側及另 1至在與4第2軸平行之方向以既定行程移動； 1驅動系，將該一對副載台驅動於與該第2軸平行之方向:連結裝置，將該主載台以非接觸狀態分別連結於該一限刪，具有可動構件，此可動構件能在將與該一對副載台之相對移動可能範圍限制於既定之★ 1位置、與容許該主載台與該一對副載台超過該 201100976 對移動之第2位置之間移動;以及保持裝置， ’、、《X圖案保持體與該物體之另一方。根據此裝置，當一對副載台被第 • 軸平耔少士人士他勒系驅動於與第2 仃之方向時，以連結裝置連結之主载台即與一對 .〇一體的移動於與第2軸平行之方向。此之可#^此時，在限制裝置 =了動構件位於第1位置之情形時，由於主載台驅動…：定範圍，因此，即使第1 糸無法控制，亦能防止主載台〇而件一极〜x j相對移動範圍 * ·田1载台分離。另一方面，在限制裝置之可動位於第2位置之情形時， ^ ^ J便主戰σ與一對副載台分離。本發明第6態樣之第4嚴面之圖查Β… 之第4曝先裝置，係以對配置於第i . ......量束並經由具有放大倍率之投影光學系# 成之該圖幸之访+你仪心尤学糸形 •具備：主^ 使配置於第2面上之物體曝光，其 : 口’係保持形成有該圖案之光罩，能沿包含彼、之第1軸及第2軸之二維平面移動；在與該第1軸平仵夕士 a \ T J ^ ° 〇如q 仃之方向分別配置在該主載台之-側及另一側’能與該主載A—鞅软缸. 戰口體移動，以及投影光學系，在與該仃之方向該圖案像之投影區域以既定間隔排列、八有複數放大倍率之投影光學系。么根據此裝置，在與第1軸平行之方向分別配置在主載，：：一側及另—侧之-對副載台，可與主載台-體移動。 • 因此，可將主裁台與一對興對田彳載台一體的以既定行程適當的移動於與與第1軸早、 ^ 平仃之方向，並使用具有複數個放 “之投影光學系以掃描曝光方式形成主載台所保持之光；之圖案放大像以進杆物辦丁物體之曝光，而在沒有無需之重疊、， 9 201100976 及缺損之情形’將形成於光罩之圖案形成於物體上。本發明第7態樣之動力傳達裝置，係在包含彼此正六之* i及第2軸之二维平面内移動於輿該第1軸平又向之移動體、與外部裝置之間進行動力之傳達，立方長尺狀可撓性構件，—端連接於該移動體端連2 該外部裝置，以形成該動力之傳達路徑；帛4 = 2 該可挽性構件長邊方向之另—端侧之帛1 ㈣心此，能繞與該第2軸平行之第^線至少以㈣範圍旋動: 以及第2旋動構件，該可撓性構件長邊方向之—端側… "曰1部分固定此，被設置成能藉由與該移動體與該第1轴平行之方向而能對該第1旋動構件接近及分離，能繞與該第2轴平行之第2軸線至少以㈣範圍旋動。此處，所謂動力，係指用於移動體之任何能量、物體等(例如電力、電氣訊號、加藶氣體、真空吸引力、冷媒)，在移動體與外部裝置之間進行動力之傳達，則係指在移動體與外料置之間進行上述動力之收授（電力之供應、電氣 «之收發訊 '冷媒之供應及回收等）。本說明書中，係以上述意思使用動力之用語。根據此教置，當移動體移動於與第1軸平行之方向時，第2旋動構件即與移動體一起移動於與第"由平行之方 ^而接近或與第i旋動構件分離。又，分別將彼此不同之中間部分固定於第1旋動構件、第2旋動構件之可撓性構件’係對應第i及第2旋動構件之接近、分離動作而,彎曲或被拉伸於與第1軸平行之方向。此時，由於P及第2 疑動構件旋動’因此因此可撓性構件與第（及第2旋動構 201100976 件（或其他構件）之滑動而產生之發塵、或振動即受到抑制。卜由於$ 1、帛2旋動構件分別旋動，因此可防止對可撓性構件產生大的彎曲應力。本發明第8態樣之第5曝光裝置，係經由具有既定圖 '案之圖案保持體以能量束使物體曝光，以將該圖案轉印至該物體，其具備：該移動體係將該圖案保持體引導於與該第1軸平行之方向之本發明之動力傳達裝置；以及保持^ 物體、將該物體引導於與該第1軸平行之方向之物體保持〇裝置。本發明第9態樣之it件製造方法，其包含使用本發明之第1〜第5曝光裝置之任一者使物體曝光之動作；以及使曝光後之前述物體顯影之動作。 , 處係使用平板顯示器用之基板作為基板，以提供製造作為元件之平板顯示器之製造方法。平板顯示器用之基板除玻璃基板等外，亦包含薄膜（film)狀構件等。 ο 【實施方式】《第1實施形態》以下，根據圖I〜圖5(B)説明本發明之第i實施形態。圖1中顯示了第1實施形態之液晶曝光裝置1〇之概略構成。液晶曝光裝置10係步進掃描（step & 8叫方式之投影曝光裝置、所謂之掃描機。液B曰曝光裝置1 〇，如圖i所示，具備：照明系ι〇ρ、包含保持光罩Μ之主载台4G之光罩載台裝置順、投影光學系PL、搭載光罩載台裝置順及投影光學系凡等之 11 201100976 機體BD、包含料幼车 1 载台21 (將基板p保持成可沿χγ平面移動）之基板載台裝置广夏PST、以及此等之控制系等。以下，係以曝光時光罩M盘興基板P分別相對投影光學系PL之相對掃描之方向為X乾軸方向、在水平面（XY平面）内與此正交之方向為Y軸方向、彻Vi Π 與χ軸及γ軸方向正交之方向為ζ轴方向，並以繞X鮎、v l „ 轴及Ζ軸之旋轉（傾斜）方向分別為0 Θ y及0 ζ方向來進行説明。後述第2實施形態至第9 實施形態亦同。 '、、、明系ιορ係與例如美國專利第6,552,775號說明書等所揭露之照明系同樣構成。亦即，照明系ι〇ρ係將從未圖不之水銀燈射出之光，分別經由未圖示之反射鏡、分光鏡 (dichrcnc mirror)、光閘、波長選選擇濾波器、各種透鏡等，作為曝光用照明光（照明用光）IL照射於光罩M。照明用光 IL，例如係使用！線（波長365nm)、g線（波長436nm)、^線 (波長405nm)等光（或上述i線、g線、h線之合成光）。又，照明用光IL之波長可藉由波長選擇濾波器、根據所要求之解析度適當的加以切換。此外，光源不限於超高壓水銀燈，亦可使用例如準分子雷射等之脈衝雷射光源、或者固體雷射裝置等。光罩載台裝置MST，具有配置在後述機體bd之一部分之鏡筒平台31上方之主載台40、在主載台40之γ轴方向之一側Y側）及另一側（+ γ側）分別以和主載台4〇振動上分離之狀態（非接觸狀態、或者即使接觸振動亦不會傳達程度之接觸狀態）配置之副載台5 0、7 0、將副载台$ 〇、γ 〇支承於地面F之副載台導件37a、37b。主載台40被支承_ 12 201100976 對主載台導件3 ,τ 上’此一對主載台導件35伟由一辦在鏡筒平台31上面^ 牛35係由體固定構成。於主栽A 4〇轴方向為長邊方向之角柱狀構件戰< 〇 40，以例如真空面（圖1之下面）形#古t 、寸方式固定有於其圖案案)等之光單Μβ… 案(以下，亦適當的稱光罩圖 37b , 川用“刀別在副載台導件37a、 Ο ❹ 向)。主載“。，當副載台5。、7。：動==乂之方被此誘導而移動冑於X轴方向時，即 . 軸方向。主載台40、副載么50、7Λ 田|J載台導件37a、量系等弁置η 寺之具體構成’以及包含驅動系、測系專先軍载台裝置贿之詳情，留待後敘。才又影光學系PL，传在# |Α壯祖支承好… 裝置MST之圖1下方被支：於，平台31。本實施形態之投影光學系以具有盘例第6’552’775號說明書所揭露之投影光學系相同巴：=即，投影光學系PL包含光…圖案像之投影為多隸向以既^間隔排列之複數個投影光學系（亦稱 ”、、又影光學系），能與例如具有以Y軸方向為長邊方向之長方形單一像場之投影光學系發揮同等之功能。本實施形態甲，複數個投影光學系，係分別使用例如兩側遠心之放大系且形成正立正像者。以下，亦將沿γ轴方向排列之複數個投影區域統稱為曝光區域。因此，當以來自照明系Ι0Ρ之照明用光JL照明光罩Μ 上之照明區域時，即藉由通過投影光學系ρ£之第〗面（物體面）與圖案面大致一致配置之光罩Μ之照明用光江，經由投影光學系PL將該照明區域内之光罩M之電路圖案之投影像（部分正立像），形成於配置在投影光學系之第2面（像 13 201100976 面）側、表面塗有光阻（感應劑）之基板p上與照明區域κ共軛之照明用光IL之照射區域（曝光區域）。之下，藉由光罩載台裝置MST與基板載台裝置PST之同步驅動，使光罩μ 相對照明區域（照明用光IL)移動於掃描方向（χ軸方向卜並使基板Ρ相對曝光區域（照明用光IL)移動於掃描方向（X軸方向），據以進行基板P上之一個照射區域（區劃區域）之掃描曝光，將光罩Μ之圖案（光罩圖案）轉印至該照射區域。亦即，本實施形態，係藉由照明系Ι〇ρ及投影光學系於基板ρ上生成光罩Μ之圖案，藉由使用照明用光il使基板 P上之感應層(光阻層)曝光據以在基板？上形成該圖案。機體，係例如美國專利申請公開第2〇〇8/〇〇3〇7〇2 號說明書等所揭露，具有基板載台架台33、與透過基板載台架合33上固定之—對支承構件32被支承為水平之鏡筒平台3卜基板載台架台33被支承在設於地面f上之複數個防振裝置34，相對地面F在振動上分離。基板載台裝置PST，具備：固^在基板載台架台33上之平台12、X粗動載台23χ、搭載於又粗動載台上與 X粗動載台23Χ 一起構成ΧΥ:維載台裝置之Υ粗動載台爪'、配置在γ粗動载台讲之+ 2側（上方）之微動載台 21以及在平台12上支承微動載台η之自重之自重抵裝置26。手台〗2係例如以石好泌+ 材开ν成之俯視（從+ 2側看）呈矩形之板狀構件’其上面被加工為具有非常高的平括度。 ^動載台23Χ係由俯視矩形之板狀（或長方體狀）構件在其與ΧΥ平面平行之面之中央部形成有以Υ軸方 14 201100976 向為長邊方向、貫穿於一、ζ軸方向之長孔狀開口部（省略圖示）〇Χ粗動載台23乂#；^4^ 士人* . 係搭機於架設在平台12上方之未圖示之複數個X線性導侔错彳屯匕構件上，以例如包含線性馬達之χ粗動載台驅動系（省略圖+、略圖不）於上述複數個χ線性導件構件上驅動於X軸方向。 Ο Ο 粗動載σ 23Υ係由Υ軸方向尺寸較χ粗動載台加短之俯視矩形之板狀（或長方體狀）構件構成，在其與灯平 :-面之中央σ|5形成有貫穿於ζ抽方向之開卩部(省略圖示）。¥粗動载台23Υ搭機於固定在X粗動載台23Χ上面 t 之複數個丫線性導件構件上，以例如包含線性馬達之Y粗動載台驅動系（省略圖示）Η粗動載台瓜上驅動於Υ轴方向。又，蔣Υ 又將Χ粗動載台23Χ、γ粗動載台23γ 勿別驅動於χ I由方南、ν红+ 1 Y軸方向之驅動方式，可以是例如使用進給螺桿之驅動方式、或皮帶驅動方式。 :動載台21係、由俯視略正方形之板狀（或長方體狀）構拉呈p m面透過基板保持具叫保持基板ρ。基板保、二η具有例如未圖示之真空吸附裝置(或靜電吸附裝置）之V 一部分，於其上面吸附保持基板ρ。於微_台21之-丫側側面，隔著固定構件24Υ固定 γ側之面具有反射面之γ移動鏡(棒狀反射鏡)22Υ。二：：中雖省略圖示，但於微動載台21之_乂側側面亦 χγ疋承同樣之移動鏡（以下’稱Χ移動鏡）。微動載台21之別日之位置資訊’係對γ移動鏡22γ&χ移動鏡分以例如距光束’並以接收其反射光之雷射干涉儀系統28 5〜1咖程度之解析能力隨時加以檢測。又，實際 15 201100976 上，雷射干涉儀系統雖具有分別對應γ移動鏡22Y、x移動鏡之X雷射干涉儀、y雷射干涉儀，但在圖1中僅代表性的將Y f射干涉儀顯示為雷射干涉儀系統28。 7 載13 係在γ粗動載台上，被包含音圈馬達之微動載台驅動系微驅動於6自由度方向（X _、γ軸、ζ β X、/Q - y θ z之各方向）’該音圈馬達由例如固定於γ 粗動載σ 23γ之未圖示之固定子（例如線圈單元）、與固定於微動載〇 21之未圖示之可動子（例如磁石單元）構成。如此，基板載台裝置PST能將基板Ρ以長行程驅動（粗動）於轴方白且成微驅動（微動）於6自由度方向。 /自重抵消裝置26係在平台12上支承包含微動載台Η 之系統（具體而言，係由微動載台21、基板保持具PH及基板P等構成之系統)之重量、延設於z軸方向之柱狀構件，亦稱為心柱。自重抵消裝置26插入X粗動載台23X之開口部：及γ粗動載台23Y之開口部。自重抵消裝置26係以未BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mobile body device, a power transmission device, an exposure piercing, and a component manufacturing method, and more particularly to a moving body having a movement along a predetermined two-dimensional plane. A moving body device, a power transmitting device for transmitting power between the moving body and the external device, an exposure device including the moving body, and a component manufacturing method using the exposure device. [Prior Art] Conventionally, a lithography process for manufacturing electronic components (microcomponents) such as a liquid crystal display device, a semiconductor device (integrated circuit, etc.) is performed by using a photomask or a reticle (hereinafter, collectively referred to as "Photomask"), and a step such as a glass plate or a wafer (hereinafter referred to as "substrate") is moved in synchronization with a predetermined scanning direction, and the pattern formed on the photomask is transferred to the substrate through the projection optical system. Scanning (_ & scan) scanning type projection exposure device (so-called scanning + incoming (also called scanner)). v Such a scanning type exposure apparatus is known to have a holding mask = a mask stage apparatus and a holder substrate that moves in the scanning direction (for example, refer to the patent document. This exclusive extension is in the scanning direction) The fixed stator and the one-stage device, by means of the linear motor of the package, the movable cover of the mask 疋 and the reticle stage is transported by the hood in the scanning direction by μ ' in order to follow the substrate stage 'And on the broom side = (four). At the same time in the horizontal plane and the scan direction orthogonal " outwards also) micro-drive reticle stage. . (cross-scanning side 201100976) However, the mask stage apparatus described in the above-mentioned Patent Document 1 is used to drive the mask stage in the scanning direction when the mask stage is driven in the cross-scan direction. The position of the stator of the linear motor and the position of the movable member in the scanning direction and the scanning direction are changed, and the driving force in the scanning direction may be lowered. Therefore, there is a need for countermeasures for increasing the size of the stator of the linear motor. In addition, the photomask described in the above-mentioned patent document 载, the amount of movement of the reticle stage in the cross-scanning direction is limited to a small amount. Therefore, it is also desirable to drive the reticle stage with a larger process. In the cross-scanning stage device, the reticle stage described in the above Patent Document 1 is ruptured, and in order to prevent the transmission of the vibration from the outside (diSturbanee), the reticle stage is suspended. In addition, the linear motor's stator and the movable member are in a non-contact state. Therefore, the conventional photomask loading device does not exist in the (four) surface (four) light guide cover stage. Guide, for example In the light: when the device is set to start, etc., it is not difficult to guide the reticle stage to the desired position. In addition, for example, in the power supply, the heart, and the dispute of the linear motor stator, the reticle stage In addition, the exposure apparatus described in the above-mentioned Patent Document 1 is connected to the photomask carrier or the substrate stage device to supply various kinds of power from the outside, for example, supply. Electricity, etc. 4- ^ ^ ^ When moving the plate-mounted table device! The device or the base member slides to generate dust or vibration. Thousands Zhizhi [Patent Document 1] 曰本特开2004- Η915号 5 201100976 [Means for Solving the Problem] A first moving device according to a first aspect of the present invention includes: a first moving body that is movable along a two-dimensional plane including a first axis and a second axis that are orthogonal to each other; 2 the moving body is disposed on one side of the second moving body in a direction parallel to the second axis, and is moved in a direction parallel to the second axis by a predetermined stroke; the third moving body is ! Pumping the parallel direction is configured in the shift The other side of the body is movable at least in a direction parallel to the second axis by a predetermined length, and the second and third moving bodies are driven together in a direction parallel to the second axis; and the state is set. The device can be switched between the first state in which the third to third moving bodies are integrally driven and the second state in which the third moving body is not driven. According to the device, the device is in the state. When the setting device is set to the first state, the 'and the third moving body are driven by the first driving system and the second moving body and the second and third moving bodies are moved to and from the second pumping direction. The direction in which the axes are parallel, that is, the first to third moving system bodies move in the direction parallel to the second axis. Therefore, the ith 1 driving system can be used to drive the ith moving body to the second The direction in which the axes are parallel. The second mobile body device of the second cancer sample includes a first movement, and moves the second movable body along a two-dimensional plane including the second and second axes orthogonal to each other, and In the direction of the first moving ship, the direction of the first axis of the first moving ship is at least one side of the first moving ship, and the third moving is performed in a direction parallel to the direction of the first moving. The body, in the movement with the 帛, the pregnancy is placed in the direction of the ten lights on the other side of the j-th moving body, at least in the movement with the stroke; the i-th driving ten lamps in the direction of the predetermined second and third moving bodies The 201100976 is driven together in a direction parallel to the second axis; the connecting device is connected to the second and third body members and the restriction device in a non-contact state, ... the connecting device of the moving body; And a movable member, the moving body and the second and third moving bodies = limiting the relative movement range of the first range of the range 7 j to both ==, and allowing the first moving body and the second and third 3 The relative movement of the moving body beyond the predetermined range is based on the device, when the 2nd and 3rd moving bodies start; When a direction parallel to the second axis, the first link to the farmers opposed coupling: i.e. based movable body and the second shift of the first and second movable body - the body is moved to the second axis is parallel to defend the ^. At this time, when the movable member of the restriction device is positioned! When the position is produced: Since the first moving body and the second and third moving bodies can be opposed to each other within a predetermined range, even if the control cannot be performed! Drive: The first moving body is separated from the second and third moving bodies beyond the possible range of relative movement. On the other hand, when the movable member of the restriction device is located at the second position, the first movable body can be separated from the second and third movable bodies. The ith exposure apparatus of the third aspect of the present invention is an apparatus for exposing an object with an energy beam via a pattern, whereby the pattern is transferred to the object, characterized by comprising: a pattern holder having the pattern and the object One of the first and second moving body devices of the present invention is held by the first moving body; and the other of the pattern holding body and the object is held. According to a second aspect of the present invention, in the second exposure apparatus of the fourth aspect of the present invention, the object is transferred to the object by exposing the object with an energy beam, and the main stage is provided with the pattern holder having the pattern and the pattern. One of the objects can move along a two-dimensional plane including the first axis and the second axis orthogonal to each other along 201100976; a pair of sub-stages are respectively disposed in one of the main stages in a direction parallel to the first axis The side and the other side are movable at least in a direction parallel to the second axis; the first drive system 'drives the pair of sub-stages in a direction parallel to the second axis; and the state setting device can The main stage is switched between the first state in which the submount is driven integrally and the second state in which the submount is not driven, and the holding device 'holds the other of the pattern holder and the object. According to this device, when the state setting device is set to the second state, when the pair of sub-stages are driven by the first drive system in the direction parallel to the second axis, the main stage is integrated with the pair of sub-stages. Move in a direction parallel to the 2nd axis. That is, the main stage and the pair of sub-stages are integrally moved in a direction parallel to the second axis. Therefore, the first stage and the pair of sub-stages can be driven in the direction parallel to the second axis by using the second driving system. A third exposure apparatus according to a fifth aspect of the present invention is characterized in that the object is exposed to an object by an energy beam via a pattern to transfer the pattern to the object, and the main stage is provided with a pattern holder having the pattern and the object. a square, which is movable along a two-dimensional plane including the i-axis and the second axis orthogonal to each other; a pair of 畐, Δ, ^ are parallel to the second axis, respectively, disposed on the side of the main stage and 1 to a predetermined stroke in a direction parallel to the 4th axis; 1 drive system, driving the pair of sub-stages in a direction parallel to the second axis: a connecting device, the main stage is in a non-contact state Connected to the limit, respectively, having a movable member capable of restricting a range of relative movement with the pair of sub-stages to a predetermined position of 1 and allowing the main stage and the pair of sub-loads The table moves beyond the second position of the 201100976 movement; and the holding device, ',, the X pattern holder and the other side of the object. According to this device, when a pair of sub-stages are driven by the first-axis squatting person in the direction of the second cymbal, the main stage connected by the connecting means is moved integrally with the pair of cymbals. In the direction parallel to the second axis. In this case, when the restriction device = the moving member is located at the first position, since the main stage drives the range of ..., the main stage can be prevented even if the first stage cannot be controlled. One pole ~ xj relative movement range * · Tian 1 stage separation. On the other hand, when the movable device of the restriction device is located at the second position, ^^J is separated from the pair of sub-stages by the main battle σ. The fourth exposure device of the fourth aspect of the sixth aspect of the present invention is configured to be disposed on the i-th beam and is passed through a projection optical system having a magnification. The map is fortunate to visit + you are especially interested in the shape of the instrument. • With: The main body ^ exposes the object placed on the second surface, and its: the mouth is kept to form the mask with the pattern, which can be included The two-dimensional plane movement of the first axis and the second axis; in the direction of the first axis, a \ TJ ^ ° such as q 仃 is disposed on the side of the main stage and the other side The main load A-鞅 soft cylinder. The warhead movement, and the projection optical system, the projection optical system having a plurality of magnifications arranged at a predetermined interval in a projection area of the pattern image in the direction of the cymbal. According to this device, the pair of sub-stages disposed on the main carrier, the :: side and the other side in the direction parallel to the first axis can move with the main stage-body. • Therefore, it is possible to appropriately move the main cutting table and the pair of Xingtian shovel stages in a predetermined stroke, in the direction of the first axis, and in the direction of the flat axis, and to use a plurality of projection optical systems having a plurality of projections. The light held by the main stage is formed by scanning exposure; the pattern is enlarged to expose the object by the rod, and in the absence of unnecessary overlap, the pattern formed in the mask is formed in the case of 9 201100976 and the defect The power transmission device according to the seventh aspect of the present invention is configured to move between the first axis and the moving body and the external device in a two-dimensional plane including the *i and the second axis of each other. Conducting power transmission, a cubic long-length flexible member, the end is connected to the mobile body end 2 to the external device to form the power transmission path; 帛 4 = 2 the other side of the pullable member - 端 1 (4) of the end side, the second line parallel to the second axis can be rotated at least in the range of (4): and the second rotating member, the long side of the flexible member - the end side ... &quot ; 曰 1 part is fixed to this, is set to be able to move with The body is adjacent to and separated from the first rotating member, and is rotatable at least in a range of (four) about a second axis parallel to the second axis. Here, the term “power” means Any energy, object, etc. (such as electric power, electric signal, twisted gas, vacuum attraction, and refrigerant) in the moving body, and the transmission of power between the moving body and the external device means that the moving body and the external material are placed. The above-mentioned power supply (supply of electric power, transmission and reception of electric energy, supply and recovery of refrigerant, etc.). In this specification, the term "power" is used in the above sense. According to this teaching, when the mobile body moves When the direction is parallel to the first axis, the second rotating member moves together with the moving body to be close to or separated from the i-th rotating member. Further, the intermediate portions are different from each other. The flexible member ' fixed to the first rotating member and the second rotating member is bent or stretched in a direction parallel to the first axis in accordance with the approaching and separating operation of the i-th and second rotating members. At this time, due to P and the second suspect member Therefore, the dust generated or the vibration generated by the sliding of the flexible member and the second (and the second rotating structure 201100976 (or other members) is suppressed. Therefore, since the $1, 帛2 rotating members are respectively rotated Therefore, it is possible to prevent a large bending stress from being generated on the flexible member. The fifth exposure apparatus according to the eighth aspect of the present invention exposes an object with an energy beam via a pattern holder having a predetermined pattern to Transferring to the object, the moving system guiding the pattern holder to the power transmission device of the present invention in a direction parallel to the first axis; and holding the object and guiding the object to the first axis The object holding method of the ninth aspect of the present invention includes the operation of exposing an object using any one of the first to fifth exposure apparatuses of the present invention; and the aforementioned The action of developing the object. A substrate for a flat panel display is used as a substrate to provide a method of manufacturing a flat panel display as an element. The substrate for a flat panel display includes a film-like member or the like in addition to a glass substrate or the like. [Embodiment] <<First Embodiment>> Hereinafter, an i-th embodiment of the present invention will be described with reference to Figs. 1 to 5(B). Fig. 1 shows a schematic configuration of a liquid crystal exposure apparatus 1 according to the first embodiment. The liquid crystal exposure apparatus 10 is a step-and-scan (step & 8 projection type exposure apparatus, so-called scanner. The liquid B 曰 exposure apparatus 1 〇, as shown in Fig. i, includes: illumination system 、ρ, including holding light 11 00 光投影投影投影投影投影投影投影 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 2011 The substrate stage device, which is held in the χγ plane, is a PST, and the control system of the above, etc. Hereinafter, the direction of the relative scanning of the substrate P with respect to the projection optical system PL by the exposure mask M is The X-axis direction, the direction orthogonal to the horizontal plane in the horizontal plane (XY plane) is the Y-axis direction, and the direction orthogonal to Vi Π and the χ-axis and the γ-axis direction is the ζ-axis direction, and is around X鲇, vl „ The rotation (inclination) directions of the shaft and the yaw axis are respectively 0 Θ y and 0 ζ directions. The second embodiment to the ninth embodiment will be described later. ', , and the system ιορ are, for example, U.S. Patent No. 6,552,775. The lighting system disclosed in the specification and the like is also constructed. In other words, the illumination system ι 〇将将将将将将将将将将将将从未从未从未从未从未从未从未从未从未从未从未从未从未从未曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光曝光Illumination light (illumination light) IL is applied to the mask M. The illumination light IL is, for example, light such as a line (wavelength 365 nm), a g line (wavelength 436 nm), or a line (wavelength 405 nm) (or the above i line) And the combined light of the g-line and the h-line. Further, the wavelength of the illumination light IL can be switched by a wavelength selective filter according to the required resolution. Further, the light source is not limited to the ultra-high pressure mercury lamp, and can also be used. For example, a pulsed laser light source such as an excimer laser or a solid laser device, etc. The photomask stage device MST has a main stage 40 disposed above the barrel stage 31 of a portion of the body bd to be described later, and a main stage 40 (the γ-axis direction side Y side) and the other side (+ γ side) are separated from the main stage 4 〇 in vibration (non-contact state, or contact state even if contact vibration is not transmitted) ) the sub-stage 5 0, 70, The sub-stages 〇, γ 〇 are supported on the sub-stage guides 37a, 37b of the ground F. The main stage 40 is supported _ 12 201100976 on the main stage guide 3, τ on the pair of main stage guides 35 Wei is placed on the top of the lens barrel platform 31. The Niu 35 series is composed of body fixing. In the direction of the main A 4 axis, the columnar member in the direction of the long side is in the direction of 柱40, for example, a vacuum surface (Fig. 1 The following is a case of a light single Μβ... which is fixed in the shape of the pattern, etc. (hereinafter, it is also called a reticle map 37b as appropriate, and the knives are used in the sub-stage guides 37a, Ο ❹ to). The main load "., when the sub-stage 5, 7:: move == the side of the 被 is induced by this to move in the X-axis direction, that is, the direction of the axis. The main stage 40, the sub-load 50, 7 Λ |J The stage guides 37a, the quantity system, etc. The specific structure of the η temple and the details of the bribes including the drive system and the test system are reserved for later description. Α Α 支承支承支承装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置装置In other words, the projection optical system PL includes a plurality of projection optical systems (also referred to as "shadow optical systems" in which the projections of the image images are arranged in a plurality of directions, and can have, for example, a length in the Y-axis direction. The projection optical system of the rectangular single image field in the side direction performs the same function. In the present embodiment A, a plurality of projection optical systems are respectively formed by using, for example, a magnification of both sides of the telecentricity and forming an erect positive image. Hereinafter, a plurality of projection regions arranged in the γ-axis direction are also collectively referred to as an exposure region. Therefore, when the illumination region on the mask 照明 is illuminated by the illumination light JL from the illumination system, that is, the mask that is disposed substantially in line with the pattern surface by the first surface (object surface) of the projection optical system Μ In the illumination light system, the projection image (partial erect image) of the circuit pattern of the mask M in the illumination region is formed on the second surface (image 13 201100976 surface) of the projection optical system via the projection optical system PL. An irradiation region (exposure region) of the illumination light IL conjugated to the illumination region κ on the substrate p on which the photoresist (sensor) is applied. In the meantime, by the synchronous driving of the mask stage device MST and the substrate stage device PST, the mask μ relative to the illumination region (lighting IL) is moved in the scanning direction (the axis direction and the substrate is opposite to the exposure region). (illumination light IL) is moved in the scanning direction (X-axis direction), and scanning exposure of one irradiation region (zoning region) on the substrate P is performed, and the pattern of the mask (mask pattern) is transferred to the irradiation. In this embodiment, the illumination system Ι〇ρ and the projection optical system are used to generate a pattern of the mask 藉 on the substrate ρ, and the sensing layer on the substrate P is used by using the illumination light il (the photoresist layer). The exposure is based on the substrate. The body is disclosed in, for example, the specification of the U.S. Patent Application Publication No. 2/8/7/7, which has a substrate stage 33 and a transmissive substrate. The gantry assembly 33 is fixed to the support member 32 to be supported as a horizontal lens barrel platform 3. The substrate gantry table 33 is supported by a plurality of anti-vibration devices 34 disposed on the ground surface f, and is separated from the ground F by vibration. The substrate stage device PST has: solid ^ The platform 12 and the X coarse movement stage 23χ on the substrate stage stand 33 are mounted on the coarse movement stage and the X coarse movement stage 23Χ together to form the Υ: the coarse movement stage jaws of the dimension stage device, and the arrangement The micro-motion stage 21 on the + 2 side (upper side) of the γ coarse motion stage and the self-weighting device 26 supporting the self-weight of the fine movement stage η on the platform 12. The hand table 2 is, for example, made of stone good material + material The top view (viewed from the +2 side) is a rectangular plate-shaped member' which is machined to have a very high flatness. The movable stage 23 is formed by a rectangular plate-like (or rectangular parallelepiped) member in plan view. a central portion of the plane parallel to the plane of the ΧΥ plane is formed with a long hole-shaped opening (not shown) extending in the direction of the y-axis in the direction of the longitudinal direction of the Υ-axis 14 201100976, 〇Χ coarse movement stage 23乂#; ^4^士人*. The machine is mounted on a plurality of X linear guide blocks that are not shown in the figure above the platform 12, for example, a coarse motion stage drive system including a linear motor (omitted from the figure) +, the thumbnail does not) is driven in the X-axis direction on the above plurality of χ linear guide members. Ο 粗 coarse dynamic load σ 23Υ It is composed of a plate-like (or rectangular parallelepiped) member having a rectangular shape in the direction of the Υ-axis and a short rectangular frame. The σ|5 is formed in the center of the illuminating surface: a part (not shown). The coarse movement stage 23 is placed on a plurality of 丫 linear guide members fixed to the upper surface of the X coarse movement stage 23, for example, a Y coarse movement stage drive system including a linear motor ( Omitted from the illustration) Η The coarse-loaded mesa is driven in the direction of the Υ axis. In addition, Jiang Υ will drive the 载 coarse moving stage 23Χ, γ coarse moving stage 23γ not to drive χ I from Fangnan, ν红+ 1 The driving method in the Y-axis direction may be, for example, a driving method using a feed screw or a belt driving method. The movable stage 21 is formed by a plate-like (or rectangular parallelepiped shape) having a substantially square shape in plan view, and is passed through the substrate holder to hold the substrate ρ. The substrate protection layer η has a part of V of a vacuum adsorption device (or an electrostatic adsorption device) (not shown), and the substrate ρ is adsorbed and held thereon. On the side of the side of the micro-stage 21, a gamma moving mirror (rod mirror) 22 having a reflecting surface on the side of the γ side is fixed via a fixing member 24''. Although the illustration is omitted in the second::, on the side of the _ 乂 side of the fine movement stage 21, the same moving mirror (hereinafter referred to as the Χ moving mirror) is also used. The position information of the other stage of the micro-motion stage 21 is analyzed by the resolution ability of the gamma moving mirror 22 γ & moving mirror, for example, from the beam 'and the laser interferometer system receiving the reflected light 28 5 1 1 Detection. Moreover, in actual 15 201100976, the laser interferometer system has an X-ray interferometer and a y-laser interferometer corresponding to the γ-moving mirror 22Y and the x-moving mirror, respectively, but only the representative Y f is shot in FIG. The interferometer is shown as a laser interferometer system 28. 7 is carried on the γ coarse motion stage, and is driven by the micro-motion stage drive system including the voice coil motor in the direction of 6 degrees of freedom (X _, γ axis, ζ β X, /Q - y θ z) The voice coil motor is composed of, for example, a stator (not shown) fixed to the γ coarse dynamic load σ 23γ, and a movable member (for example, a magnet unit) fixed to the fine movement carrier 21 (not shown). Thus, the substrate stage device PST can drive the substrate Ρ with a long stroke (coarse motion) in the axial direction and micro-drive (micro-motion) in the 6-degree-of-freedom direction. The self-weight canceling device 26 supports the weight of the system including the fine movement stage 21 (specifically, the system consisting of the fine movement stage 21, the substrate holder PH, and the substrate P) on the stage 12, and is extended to the z-axis. The columnar member of the direction, also known as the stem. The self-weight canceling device 26 is inserted into the opening of the X coarse movement stage 23X and the opening of the γ coarse movement stage 23Y. Self-weight offset device 26 is not

圖不之氣體靜壓軸承、例如以空氣軸承懸浮支承於平台U 上。自重抵消裝置26經由未圖示之撓曲裝置連接於Υ粗動載台23Υ而與丫粗動載台23γ 一體的移動於乂轴方向及γ 轴方向。自重抵消裝置26與微動載台21之間配置有調平裝置27。微動載台21係透過調平裝置27相對自重抵消裝置26被支承為能於θχ方向及^方向傾斜自如（擺動自在）之狀態。包含上述自重抵消裝£ 26、調平裝置27及挽曲裝置等，基板載台裝置PST之詳細構成已揭露於例如國b 開第謂/ 129762號（對應美國專利申請公開帛2〇ι〇/ 001 8950號說明書）等。 16 201100976 此處，本實施形態之液晶曝光裝置1 〇由於係分別透過構成投影光學系PL之複數個放大投影光學系形成於基板ρ 上之複數個投影像之合成，於基板Ρ上生成一個圖案（圖案之一部分），因此光罩Μ之圖案面係在Υ轴方向分離既定間 • 隔之複數處同時被照明系ΙΟΡ照明。亦即，於光罩Μ上形成於Υ軸方向分離既定間隔之複數個照明區域。又，於光罩Μ之圖案面’於γ軸方向以既定間隔設有延設於掃描方向（X軸方向）之複數個帶狀（短片狀）區域。複數個帶狀區域 Ο 於Υ軸方向之間隔係設定為每隔一個被照明系Ι0ρ照明。於此等複數個帶狀區域，於γ軸方向交互的形成有為了在基板Ρ上形成特定圖案（以下，稱圖案Α)之光罩圖案之一部分、以及為了在基板上形成與上述圖案Α不同之另一圖案 (以下’稱圖案B)之光罩圖案之一部分（各光罩圖案之圖示 • 省略）。因此’本實施形態之液晶曝光裝置10，藉由在γ軸方 ^ 、將光罩Μ疋位之狀態下進行掃描曝光，據以使複數個帶狀區域（具有為了在基板Ρ上形成圖案Α之光罩圖案之至少一部分）被照明系I0P所照明，即能在基板p上形成圖案A，並藉由在Y車由方向將光罩M定位之狀態下進行掃描曝光，據以使複數個帶狀區域（具有為了在基板？上形成圖案6之 '光罩圖案之至少一部分）被照明系IOP所照明’即能在基板 p上形成圖案B。光罩M亦可以是僅具有不同圖案A、一方者。此外，本實施形態之光罩載台裝置MST，為了能進行於上述Y軸方向之光罩M之定位，可使保持光罩Μ之主: 17 201100976 台40於γ軸方向（交叉掃描方向）亦以既定行程移動。以，說明光罩載台裝置MST之構成。圖2係，The hydrostatic bearing of the figure is, for example, suspended on the platform U by means of an air bearing. The self-weight canceling device 26 is connected to the upset moving stage 23 via a bending device (not shown), and is moved integrally with the 丫 coarse moving stage 23 γ in the y-axis direction and the γ-axis direction. A leveling device 27 is disposed between the self-weight canceling device 26 and the fine movement stage 21. The fine movement stage 21 is supported by the leveling device 27 in a state in which the self-weight canceling device 26 is supported so as to be tiltable (swinging) in the θ χ direction and the θ direction. Including the above-described self-weight canceling device 26, the leveling device 27, the buckling device, and the like, the detailed configuration of the substrate stage device PST has been disclosed, for example, in the country b. No. 129762 (corresponding to U.S. Patent Application Publication No. 2〇ι〇/ 001 8950 manual) and so on. 16 201100976 Here, the liquid crystal exposure apparatus 1 of the present embodiment generates a pattern on the substrate by transmitting a plurality of projection images formed on the substrate ρ through a plurality of enlarged projection optical systems constituting the projection optical system PL. (One part of the pattern), so the pattern surface of the mask is separated in the direction of the x-axis. • The illumination is illuminated by the illumination system at the same time. That is, a plurality of illumination regions separated by a predetermined interval in the pupil axis direction are formed on the mask. Further, a plurality of strip-shaped (short-shaped) regions extending in the scanning direction (X-axis direction) are provided at predetermined intervals in the γ-axis direction on the pattern surface of the mask Μ. The interval between the plurality of strip regions Ο in the x-axis direction is set to be illuminated every other illumination system ρ0ρ. The plurality of strip-shaped regions are alternately formed in the γ-axis direction with a portion of the mask pattern for forming a specific pattern (hereinafter referred to as a pattern) on the substrate, and for forming a pattern different from the pattern on the substrate One of the mask patterns (hereinafter referred to as "pattern B") (the illustration of each mask pattern is omitted). Therefore, in the liquid crystal exposure apparatus 10 of the present embodiment, scanning exposure is performed in a state where the photomask is clamped on the γ-axis, so that a plurality of strip-shaped regions (having a pattern on the substrate Α) are formed. The at least one portion of the reticle pattern is illuminated by the illumination system IOP, that is, the pattern A can be formed on the substrate p, and scanning exposure is performed in a state where the reticle M is positioned in the direction of the Y vehicle, so as to make a plurality of The strip-shaped region (having at least a portion of the 'mask pattern for forming the pattern 6 on the substrate?) is illuminated by the illumination system IOP, that is, the pattern B can be formed on the substrate p. The mask M may also have only one pattern A and one. Further, in the mask stage apparatus MST of the present embodiment, in order to enable positioning of the mask M in the Y-axis direction, the main holder of the mask can be held: 17 201100976 40 in the γ-axis direction (cross-scanning direction) It also moves on the established itinerary. The configuration of the mask stage device MST will be described. Figure 2 is the system,

m 戰0 屣置]VfST 之俯視圖。又’圖3係從+ x側觀察光罩 M ie „ 且丨VLb Γ 之如圖2所示，主載台4〇具有與ΧΥ平面平行之板狀構件之本體部方向你卜古r丄π , 不體41具有將從上方(+Z側)所視長方形狀之板狀構件之+ 之端部（角部）、及+ Y側且—又侧之端部（角部），分別: 切除之外形形狀(六角形狀於本體部4ι之十央：貫通於Z軸方向之矩形開口部 ^ .g 丨a於該開口部4la内收客先罩Μ。本體部41具有包收谷 ,x ,ail „ v j u疋在形成開口部41a之 =及-X側壁面(内壁面)之複數個靜電失頭(或真空失頭或者機械夾頭）之夾頭單元42 一、罩M。又，亦可將開口部二二頭單元42保持光之具有段部之形狀，於該段本體部41係以〜= = ^裝夹頭單元❿ 口部仏靠-取部分（區:)載台/門件35從下方支承較開部分(區域)則被+ Y側之主：開口部41…γ側之一對主載台導件35係例如=7件35從下方加以支承。常高的平坦度。於本體部41之叾㈣成’其上面具有非 Υ側之主載台導件35上面_下面安裝有軸承面對向於一軸承43a、43b，以及站ι〜個靜壓氣體軸承、例如空氣上面之-個制氣體㈣^⑼+ ¥側之主載台導件35 仏、43b於X轴方向分離㈣如空氣軸* 43c。空氣軸承配置在非同一直線上之一老 ~~個空氣軸承4 3 a〜4 3 c貝ij 乳袖承43a、43b、43c分別 18 201100976 將從未圖示之素辨加士氣）對對向之主# α裝置供應之高1 (加壓）氣體（例如空懸浮在-對主载：導導:：之上面’出，據以使本體部41 於此，亦可例如又’空氣軸承之數量並不限 (例如各二個㈣H主㈣件35靖向配置複數個形：=::示？本體部41之+1上面中央部、十Y側之凹部41b，於ω卹41U ·>产* Ο Ο 定構件…固定有由在凹㈣b之底部經由固構成之γ可動；離配置之-對板狀構件傅取< Y可動子44。具有在彼此對向之―：:向面子44之-對板狀構件， - X °刀別包含複數個磁石之磁石早…略圖不）。又，於本即Y可動子44之τ 士、R 之+ Y側下面中央部（亦m battle 0 屣 set] top view of VfST. Further, Fig. 3 is a view of the reticle M ie „ from the + x side and 丨 VLb Γ as shown in Fig. 2, the main stage 4 〇 has a body portion parallel to the plane of the 方向 plane, and the direction of the body is 卜丄丄The body 41 has an end portion (corner portion) of the rectangular plate-like member viewed from the upper side (+Z side), and an end portion (corner portion) on the +Y side and the side side, respectively: The outer shape (the hexagonal shape is formed in the central portion of the main body portion 4: the rectangular opening portion penetrating the Z-axis direction is received in the opening portion 41a. The main body portion 41 has a pocket, x, Ail „ vju疋 is formed by a plurality of electrostatic heads (or vacuum heads or mechanical chucks) of the opening portion 41a and the -X side wall surface (inner wall surface), the cover unit 42, the cover M. The opening unit 22 unit 42 is kept in the shape of a segment of light, and the body portion 41 is replaced by a portion of the body portion 41 with the head portion 41. 35, the lower opening portion (region) is supported by the +Y side main: one of the opening portions 41...γ side is supported by the main stage guide 35, for example, 7 pieces 35 from below. The main body portion of the main body portion 41 is formed on the upper surface of the main stage guide 35 having the non-detent side thereof. The lower surface is mounted with the bearing facing a bearing 43a, 43b, and the station is a static pressure gas bearing such as air. Above - a system of gas (four) ^ (9) + ¥ side of the main stage guide 35 仏, 43b separated in the X-axis direction (four) such as air shaft * 43c. Air bearing is placed in a non-same line one of the old ~ ~ air bearing 4 3 a~4 3 c ij breast sleeves 43a, 43b, 43c respectively 18 201100976 will add morality from the unillustrated element) to the upper 1 (pressurized) gas supplied to the main #α device (for example) The air suspension is on the 'main carrier: the guide:: the upper one', so that the body portion 41 is here, and for example, the number of air bearings is not limited (for example, two (four) H main (four) pieces 35 Jing Xiang A plurality of shapes are arranged: =:: the central portion of the upper portion of the main body portion 41 and the concave portion 41b of the tenth Y side are fixed to the bottom of the concave (four) b by the o-shirt 41U ·> γ movable of the solid structure; away from the configuration - the slab-like member is taken < Y movable element 44. Having a ―:: facing surface 44-to-plate shape Member, -. X ° knife comprises respectively a plurality of magnets of the magnet is not early ... thumbnail) and, i.e. in the present sub-Shi Y movable τ 44, the + Y side of the central portion (also below R

字形之固定構株）一”則上面中央部，透過剖面L ;:5 構件一分別固定有剖面”形之X可動、“ X可動子45、46分別具有在彼此對向之一對對向面为別包含複數個磁石之磁石單元(省略圖示)。射面如02所示’於本料41之—X㈣丨面，以其反射面为別朝向大致垂直於x軸之方 (棒狀反射撃X。主載台…：方固二有：要h 釉万向（及e Z方向）之位 :::以對一對Χ移動鏡-分別照射與X轴平行之側距束Χ之一對Χ雷射干涉儀98χ，以例如0.5〜lnm程度之解析能力隨時加以測量。又私又，如圖3所示’於本體部41之—Y側側面，以立反射面朝向略垂直於Y轴之方向之方式固定有以x轴方：長邊方向之Y移動鏡（棒狀反射鏡）48y。此外，於鏡: 31固定有與上述—對x雷射干涉儀咖—起構成雷射^ 19 201100976 儀系統，對Y移動鏡48y照射與Y軸平行之側距光束Ly 之Y雷射干涉儀98y。主載台40於Y軸方向之位置資訊，藉由Y雷射干涉儀98Υ以例如〇·5〜1 nm程度之解析能力隨時加以測量。一對X移動鏡48x及Y移動鏡48y之反射面’ 分別配置在各自之Z軸方向中心與光罩Μ之下面（圖案面）大致同一之Χγ平面（以下，稱測量基準面）大致一致之高度。亦即，一對Χ雷射干涉儀98Χ及γ雷射干涉儀98y ’ 分別於上述測量基準面上對各移動鏡48a〜48c照射側距光束Lx' Ly’而將主載台4〇於χγ平面内之位置資訊於測量基準面上，在無阿貝誤差之情形下加以測量。副載台50、70,如® !所示，分別搭載於副載台導件 37a、3 7b上。副載台導件37a係在機體BD之—γ側、副载口導件37b則在機體BD之+ γ伽|，分別在與機體BD分離之狀態設置於地面F上。副載台導件37a，具有以χ轴方向為長邊方向之肖XY平面平行之板狀構件的導引部…(參照圖2)、與將導引部38a支承於地面F上之複數、例如4 支脚部3Μ圖1中，—X側之2支脚部州隱藏於圖面内The fixed structure of the glyph)) is in the upper central portion, through the section L;:5, the member is fixed with a cross section, and the X movable member 45, 46 has a pair of opposite faces facing each other. It is a magnet unit (not shown) that contains a plurality of magnets. The surface of the surface is shown as '02' in the X-(4) plane of the material 41, and the reflecting surface is oriented perpendicular to the x-axis (the rod-shaped inverse) Shooting X. Main stage...: square solid 2: To h glaze universal (and e Z direction) position::: with a pair of Χ moving mirrors - respectively, one of the side distances parallel to the X axis For the laser interferometer 98 χ, it can be measured at any time with an analytical power of, for example, 0.5 to 1 nm. Also, as shown in Fig. 3, on the side of the Y side of the main body portion 41, the direction of the vertical reflecting surface is slightly perpendicular to Y. The direction of the axis is fixed in the x-axis direction: the Y-moving mirror (rod mirror) 48y in the long-side direction. In addition, the mirror: 31 is fixed with the above-mentioned laser-based laser interferometer. ^ 19 201100976 The instrument system, the Y moving mirror 48y illuminates the Y laser interferometer 98y with the lateral distance beam Ly parallel to the Y axis. The main stage 40 is on the Y axis The position information is measured at any time by the Y-ray interferometer 98 Υ at a resolution of, for example, 〇·5 to 1 nm. The reflection surfaces of the pair of X moving mirrors 48x and Y moving mirrors 48y are respectively arranged in their respective Zs. The Χ γ plane (hereinafter referred to as the measurement reference plane) whose axial center is substantially the same as the lower surface (pattern surface) of the mask Μ is substantially the same height, that is, a pair of Χ laser interferometer 98 Χ and γ laser interferometer 98 y ' Each of the moving mirrors 48a to 48c is irradiated with a side beam Lx' Ly' on the measurement reference plane, and the position information of the main stage 4 in the χ γ plane is measured on the measurement reference plane, without Abbe error. The sub-stages 50 and 70 are mounted on the sub-stage guides 37a and 37b, respectively, as indicated by ®, and the sub-stage guides 37a are attached to the γ-side and sub-carrier guides of the body BD. 37b is added to the ground F in the state separated from the body BD by the + gamma gamma of the body BD. The sub-stage guide 37a has a plate-like member in which the XY plane is parallel in the longitudinal direction of the y-axis direction. The guide portion (see FIG. 2) and the plurality of guides 38a supported on the floor F, The four legs 3Μ FIG. 1, -X side of the two legs state hidden in the plane of the drawing

义構件36a、36b。繞 5〇(或經由副載台50 線鏈8 9 a具有用以將電力供應至副载A 20 201100976 :應至主栽台40)、纔線鏈89b具有用以將電力供應至副載副載台70供應至主載台4°)之I線、或用以供應動^列如真空吸引力、加壓氣體、冷却液等）之管線等。於導弓丨部38a之上面，如圖2所示性導件51。_對χ始降道杜”、有對X線 _ X線性導件51分別以X轴方向為長邊方向於γ軸方向以既定間隔配置。又，在 Λ 任導W部38a上面之一對X線性導件51之間，固定有包含沿複數個磁石之磁石显开q £ , Π钾幻之 ❹ ❹ 磁石早兀52。再者’於導引部38a之_Y側侧面固定有由以且、灰+ X軸方向為長邊方向、與χζ平面構件構成之X標尺53。於X 4曼尺q主 " 3表面形成有以X軸方向為週期方向之一維光柵。導引 ^ M 1 具有與導引部38a 冋樣之構成。亦即，於導引部基H讲a 守丨丨Mb上面固定有_對χ線性導件71與磁石單元72，於導引邱 X標尺73。導以地之-Y側侧面固定有副载台5〇，如圖3张+ a . μ，/、有能在副載台導件37a之導引部38a上移動於χ軸方门之X載台54、與搭載在χ載口 54上能於X载台54上 ”和仏γ釉方向之γ裁台 X載台54係由以χ軸方戰。平田々间马長邊方向之俯視板狀構件構成（參照圖2)，形 )、具下面之4隅部，固定有句含未圖示之滚動軸承（例如滾珠 ^ 哀往等）之剖面呈倒U字形之滑件56(圖3僅顯示+乂側 _ 子沁 ^ , v —個，—X側之二個則隱藏在圖面内侧）。+ Y側之-彻、，典从广/ j之—個滑件56以可滑動 Y側之X線性導件51，— Y 下口妝m I人於γ ,, 之—個滑件56則以可滑動之狀態卡合於—Υ側之Χ線性導件5!。於χ載台54下面之中央部，以對向於磁石單元狀癌固定有包含線圈之線 21 201100976 52 —起構成用以將X 於X軸方向之X線性之電流大小及方向以圈單元57。線圈單元57與磁石單元載台54於一對X線性導件51上驅動馬達。供應至構成線圈單元5 7之線圈未圖示之主控制裝置加以控制。且2及圖3所示’於x裁台54下面之—X側 =側，經由既定固定構件固定有與前述X標尺53 一起構成用以測量X載台54於X軸 ^ 釉方向之位置資訊之X線性、·扁碼Is糸統之X讀頭58βχ讀頭58 -..^ 之/則置値被供應至未圖 ’、之主控制裝置，主控制裝置 X -..,, 康X續頭58之測量値控制㈣馬達’據以控制X載台54於X轴方向之位置。於X載台54之上面中央，如圓1 直 ® SI Ji. - 、圖3所示，固定有包含線圈之線圈早兀60。供應至構成線小及方向，以未圖示之主…。之線圈之電流大合54上面之四個角部近旁、加以控制。又，於X載 (例如滾珠 '滾㈣二面呈= 示+X侧之二個，〜χ側…W牛61(圖3中僅顯 J之一個則隱藏於 Υ載台55係以俯視 _㈣側）狀構件構成(參照圖2) 二為長邊方向之矩形板 Υ轴方向之複數個磁石之磁其石=。’固定有，含排列於單元60 一起構成將¥載二磁石單几62與線圈達。又，Υ線性g、f 〇，動於Y軸方向之Y線性馬以是與上述場= 之線圈單元及磁石單元之配置關係亦可疋興上述％合（磁轉（m〇vi (moving c〇u)方式。 gnet)方式）相反之動圈於Y載台分別固定有以 55下面之磁石單元車由方向為長邊方向 62之+ x側、一X側之Y線性導件63(圖 22 201100976 中’ —X側之γ括件63分別以導件隱藏在圖面内側）。一對Y線性導之滑件61，在^滑動之狀態卡合於固定在Χ載台54上面 •直進移動之同丄導Υ載台55在Χ載台54上往方向之 •方向之移動。、、亦限制γ載台55在χ載台54上往X軸合相反。又’γ線性導件及滑件之配置關係可與上述場於Υ栽a γ軸方向為：、喜之+ x側側面，如圖2所示，固定有由以 Ο尺64。於、Λ ，YZ平面平行之板構件構成之Y標 m π尺64表面形成有以γ軸方向為週期方向之难九栅。盘V捵〜中央邻，r ^不尺64對向，於X載台54上面之+ X側 T央〇P經由既定固定槿株κι ^ 以測量Y載台55H 有與Y標尺64一起構成用、系统之γ β 5軸方向之位置資訊之γ線性編碼器 -=Γ Υ讀頭59之測量値被供應至未圖示之主夺工f j裝置，主控制梦署 H 裝置根據Y讀頭59之測量値控制Y線性 …、違，據以控制γ裁A 少V 土 ^^ 戰口55之γ軸方向位置。又，為避免圖 ^於錯綜複雜，圖1及圖3由，、 O .. ^ 及圖3中省略Y讀頭59及Y標尺之圖示。於Y載台55上面之+ γ相丨+ 回 < 十Y側中央部，經由剖面L字形之女裝構件65a(來昭圖+ i 士匕，、、、圖3)固疋有X固定子65。X固定子65 /、有包含複數個線圈之線圈深圏單凡（省略圖示），構成在副載台 ' 移動於X軸方向時蕪乃门矸鞛由與固定在主載台40之X可動子 _ 王Χ軸方向之驅動力（例如電磁力 (羅儉玆力）），將主載台4〇相、相對副載台5 0驅動於X軸方向以將主載台40誘導於X軸方平万向之X音圈馬達（以下’簡稱馬XVCM1、（參，昭圖3Ή。介ΒMeaning members 36a, 36b. 5 turns (or via the sub-stage 50 line chain 8 9 a to supply power to the sub-load A 20 201100976: to the main stage 40), the line chain 89b has to supply power to the sub-load The stage 70 is supplied to the I line of the main stage 4°) or the line for supplying a moving column such as a vacuum suction force, a pressurized gas, a coolant, or the like. Above the guide bow portion 38a, a sexual guide 51 is shown in Fig. 2. _ χ 降降 ” ” 、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、、 Between the X linear guides 51, a magnet containing a plurality of magnets is fixed to open q £ , and the Π 幻幻幻磁磁兀兀兀。。。。。。。。。。。。。于于于于于于于于于于于于于于于于于于于于于Further, the ash + X-axis direction is the long-side direction and the X-scale 53 composed of the χζ plane member. On the surface of the X 4 man-square q main " 3, a one-dimensional grating having a periodic direction in the X-axis direction is formed. M 1 has a configuration similar to that of the guiding portion 38a. That is, the _ pair of linear guides 71 and the magnet unit 72 are fixed on the guiding portion base H, a 丨丨丨丨 Mb, and the guiding Qi X scale 73 is guided. The sub-stage 5 y is fixed on the side of the Y-direction of the ground, as shown in Fig. 3 + a. μ, /, which can move on the guide portion 38a of the sub-stage guide 37a to the side of the y-axis. The X stage 54 and the gamma cutting table X stage 54 which is mounted on the X stage 54 and the 仏 gamma glaze direction on the load port 54 are driven by the yaw axis. In the plan view of the plate-like member in the direction of the long side of the flat field in the direction of the horse in the direction of the horse, (the figure), the lower part of the four-section, and the section of the rolling bearing (such as the ball) The inverted U-shaped slider 56 (Fig. 3 only shows + 乂 side _ sub 沁 ^, v - one, - the two sides of the X side are hidden inside the drawing). + Y side - Che,, Dian Guang / j - a slider 56 with a slidable Y side of the X linear guide 51, - Y lower mouth makeup m I person in γ, a slider 56 The slidable state is engaged with the Χ linear guide 5! In the central portion of the lower surface of the cymbal stage 54, a line 21 including a coil is fixed to the magnet unit cell carcinoma, and the current is used to align the X in the X-axis direction with the magnitude and direction of the current in the circle unit 57. . The coil unit 57 and the magnet unit stage 54 drive the motor on a pair of X linear guides 51. The coils supplied to the coil unit 57 are controlled by a main control unit (not shown). And 2 and the side of the X-side = under the x-cut table 54 are fixed with a predetermined fixing member, and are configured to measure the position of the X-stage 54 in the X-axis glaze direction together with the X-scale 53 described above. X linear, · flat code Is system X read head 58β read head 58 -.. ^ / then set to be supplied to the main control device, the main control device X -..,, Kang X The measurement of the continuation head 58 controls (4) the motor's position to control the position of the X stage 54 in the X-axis direction. In the center of the upper surface of the X stage 54, as shown in Fig. 3, as shown in Fig. 3, the coil containing the coil is fixed earlier than 60. Supply to the line and direction, to the main unillustrated.... The current of the coil is approximately close to the four corners of the upper portion of 54 and is controlled. Also, in the X-load (for example, the two sides of the ball 'roll (four) are shown as two on the +X side, and the other on the side of the +X side...W cow 61 (only one of the J shows in Fig. 3 is hidden in the Υ stage 55 to overlook _ (4) Side) The structure of the member (see Fig. 2) is the magnetic field of the plurality of magnets in the direction of the axis of the rectangular plate in the longitudinal direction. The fixed stone is arranged in the unit 60 and is composed of two magnets. 62 and the coil reaches. In addition, the Υ linear g, f 〇, the Y linear horse moving in the Y-axis direction and the arrangement relationship between the coil unit and the magnet unit of the above field = may also promote the above-mentioned % (magnetic rotation (m 〇vi (moving c〇u) mode. gnet) mode) The opposite dynamic coil is fixed on the Y stage with a magnet unit below 55. The direction is the + side of the long side direction 62, and the X side of the X side. The guide member 63 (Fig. 22, 201100976, the γ-member 63 of the X-side is hidden inside the drawing by the guide member). The pair of Y-linear guide sliders 61 are engaged and fixed in the state of sliding. The upper surface of the table 54 is moved in the direction of the direction of the loading platform 55 on the loading platform 54. Also, the gamma loading table 55 is restricted to the X on the loading platform 54. In contrast, the arrangement relationship of the 'γ linear guide and the slider can be the same as the above-mentioned field in the direction of the γ axis of the plant: the + side of the + side, as shown in Fig. 2, fixed by a ruler 64. , Λ , YZ plane parallel plate member formed by the Y mark m π rule 64 surface formed with the γ axis direction as the periodic direction of the difficult nine grid. Disk V捵 ~ center adjacent, r ^ not 64 orientation, on X The + X side T 〇 P on the top of the table 54 is measured by the predetermined fixed κ κ ι ^ ^ to measure the position of the Y stage 55H with the Y scale 64, the γ linear encoder of the γ β 5 axis direction of the system -=値 The measurement of the read head 59 is supplied to the main unloaded fj device (not shown), and the main control system H device controls the Y linearity according to the measurement of the Y read head 59, and violates, according to the control γ cut A less V The location of the γ-axis direction of the land ^^ is 55. In addition, in order to avoid the intricacies of the figure, FIG. 1 and FIG. 3 are omitted from the diagram of the Y-reader 59 and the Y-scale in FIG. + γ phase 丨 + back on the top of the Y stage 55. The center portion of the ten Y side, through the L-shaped female dress member 65a (to show + + i 士匕,,,, Fig. 3) 65 The X stator 65 / has a coil including a plurality of coils (not shown), and is configured to be fixed to the main stage 40 when the sub stage is moved in the X-axis direction. The driving force of the X mover _ the king's axis direction (for example, the electromagnetic force (Royz force)) drives the main stage 4 、 phase and the sub-stage 50 to the X-axis direction to induce the main stage 40 X-axis square-turn X-voice motor (hereinafter referred to as the horse XVCM1, (see, Zhaotu 3Ή. Introduction

、））亦即，藉由在副載台50被前述X 23 201100976 線性馬達驅動於X軸方向時XVCM1產生驅動力以將主載台40與副載台50 —體驅動。主載台40與副載台50在χ軸及γ軸方向之相對位置資訊，如圖2所示，係以透過既定固定構件固定於副載台 50、例如包含渦電流方式（或者靜電容方式）之變位感測器等之間隙感測器（X軸方向測量用之間隙感測器66及γ軸方向測量用之間隙感測器67)，透過靶（χ軸方向測量用之靶4% $ Y軸方向測量用之49b)加以測量，此等乾係由透過既定固定構件固^於主载台4〇之金属板構成。亦即間隙感測器66、67分別測量與靶49a、4叽之間隙，據以測量主載台40與副載台50在χ軸及γ軸方向之相對位置資訊。副載台70’如圖3所示，除後述χ固定子85之位置不同、以及具有後述Υ固定子88外’包含驅動系 '測量系與副載台50同樣構成。亦g[3，副載台7〇具有χ載台Μ與Υ 載台75。X載台74經由固定在其下面之滑件％搭載^ χ '純導件71上，藉由固定在其下面之線圈單元77與磁石 ^ 72構成之χ線性馬逹，於χ線性導件71上被驅動於 =轴方向。又’ Υ載台75經由固定在其下…線性導件 Μ搭載於固定在X載台74上之滑件"上，藉由固定在且 =之磁？元82與固定在Χ載台74上面之線圈單元- 構成之Υ線性馬達，於χ都Α L、上 x載台74上被驅動於Y軸方向。 X載台74於X轴方向夕办里名 r 向之位置資訊，如圖2及圖3所示，係以經由既定固定構件固定於X載台…讀頭78、斑固定於導引部38b之X線性標尺73 ” M ,Η. Θ 傅風< χ線性編碼器系統加以測…，Υ载台7…轴方向之位置資訊，則 24 201100976 以經由既定固定構件固定於X載台74<γ讀頭79、與固定於Υ载台…線性標尺84所構成之¥線性編瑪器系統加以測量。如圖3所示’於Υ載台75上面，透過剖面L字形之固定構件85a固定有X固定子85βχ固定子85藉由與固定在主載台40之X可動子45間之電磁相互作用，構成產生將主載台40相對副載台70驅動於χ軸方向之驅動力之χ音 Ο 圈馬達（以下’簡稱為XVCM2)。未圖示之主控制裝置，^ 將副載台50、70使用一對又線性馬達（磁石單元兄、”及線圈單元57、77)同步驅動於χ軸方向時，一併使用 XVC]VH、XVCM2將主載台40相對副載台5〇、7〇與副載台 50、70驅動於同方向’據以使主載台4〇與副載纟％、％一體移動於χ軸方向。又，主控制裝置使χν_、xvcm2 產生之驅動力相異，據以適當的將主載台4〇微驅動於0 z 方向。 ◎ 又，於固定構件85a，在X固定子85上方固定有丫固定子88。Y固定子88具有包含複數個線圈之線圈單元（省略圖不）。Y固定子88 ’藉由與固定於主載台40之Y可動子44之電磁相互作用，構成將主載台40相對副載台70微驅動於Υ軸方向之Υ音圈馬達(以下，稱YVCM)。主載台40與副載台7〇之於χ軸方向之相對位置資訊，如如圖2所不’係以透過既定固定構件固定於X載台74之間隙感測器86，經由透過既定固定構件固定於主載台4〇之乾49C加以測量’主載台40與副載台70之於γ軸方向之相對位置:貝g凡’則以透過既定固定構件固定於Y載台之 25 201100976 間隙感測器靶49d加以 87 ’經由透過既定固定構件固定於主載台4〇測量。之此處 ’ y 戰〇 40例如以既定行程移動於+ γ方向時之動作（Υ步進動作），使用圖4(A)及圖4⑻加以説明。又，圖4(Α)及圖4(Β)中，省略了副載台導件37a、37b各自之脚部及機體之圖示。圖 4 ( Α ^ ψ J甲，主載台40係位於於γ軸方向可移動範圍之側端邛近旁。從圖4(A)所示狀態將主載台40驅動於+ 方向時未圖不之主控制裝置分別控制副載台5〇、7〇之 Y線性馬達，將v # △ 將Y載台55、75在X載台54、74上分別驅於+ γ方向（參照圖4(Β))。又，由於主載台4〇與副載台此70為非接觸狀態，因此與此並行的，主控制裝置根據月j述光干涉儀系統（Υ雷射干涉<義98y(參照圖3))之輸出控制YVCM將主載台4〇相對副載台7〇驅動於+ γ方向據以將主載台40誘導於Υ軸方向（透過YVCM將主載台40牵 ?丨至副載台70)。如此，主载台4〇與副載台5〇、7〇即一體移動於+ Y方向。主控制裝置在將主載台驅動於—Y方向時亦進行同樣的控制。此處，副載台5〇、7〇於γ軸方向 •^移動打程，係設定為對應前述光罩圖案像之複數個投影區域中相鄰二個投影區域在晶圓W上之γ軸方向間隔以上^ 之距離。又，如前所述，於光罩1^之圖案面，於γ軸方向以既定間隔設有延設於掃描方向（x軸方向）之複數個帶狀 (紐片狀）區域，於此等複數個帶狀區域，在基板ρ上於Υ 軸方向交互的形成有圖案Α之光罩圖案之一部分、及圖案Β 之光罩圖案之一部分之情形時，副載台5〇、7〇於γ軸方向 26 201100976 之移動行程則被設定為與複數個帶狀區域中相鄰帶狀區域之間隔同等以上。如此，光罩載台裝置MST即能進行於前述Y軸方向之光罩Μ之定位。又，主控制裝置在將主載台40驅動於χ軸方向時，係 -控制—對Χ線性馬達將副載台50、70之Χ載台54、74分別同步驅動於X軸方I主控制裝置，與此並行的，根據光干涉儀系統（一對X雷射干涉儀98χ(參照圖2))之輸出控制XVCM1、XVCM2，將主載台40分別相對副載台50、70 分別驅動於X軸方向，據以將主载台40誘導於χ軸方向。如此，主載台40與副載台50、70即一體移動於χ軸方向。又’例如在曝光時等使用副載台5〇、70將主載台4〇於X軸方向（掃描方向）以長行程加以驅動時，主控制裝置將 YVCM與XVCM1、XVCM2 一併加以適當控制，例如為了 ' 使其追隨以基板載台裝置pst(參照圖υ驅動之基板p(參照圖1)之動作，而將主載台40微驅動於γ軸方向（於掃描動作中微驅動於交又掃描方向）。接著，說明XVCM1、XVCM2及YVCM於Ζ軸方向之配置。如圖4(Β)所示，XVCM1及XVCM2分別配置在主載台40之上面侧、下面側’為彼此獨立的將χ軸方向之推力作用於主載台40，XVCM1及XVCM2將主載台40驅動於χ 軸方向時之推力，實質上分別為大致相同之力（力之大小與 , 方向），因此係在XVCM 1之推力發生位置與XVCM2之推力發生位置之中間點作用於主載台40。此外，XVCM1、XVCM2 係從包含主載台4〇之重心位置CG之χγ平面於ζ軸方向分別等距離配置。因此，XVCM1、XVCM2係在包含主載台 27 201100976 40之重心位置CG之χγThat is, the XVCM 1 generates a driving force to drive the main stage 40 and the sub-mount 50 in the body when the sub-stage 50 is driven by the X 23 201100976 linear motor in the X-axis direction. The relative position information of the main stage 40 and the sub-stage 50 in the x-axis and the γ-axis direction is fixed to the sub-mount 50 by a predetermined fixing member as shown in FIG. 2, for example, including an eddy current method (or a capacitive method). a gap sensor such as a displacement sensor (a gap sensor 66 for X-axis direction measurement and a gap sensor 67 for γ-axis direction measurement), and a target (a target for measuring the x-axis direction) The % $ Y-axis direction measurement is measured using 49b), which is made up of a metal plate that is fixed to the main stage 4 through a predetermined fixing member. That is, the gap sensors 66 and 67 measure the gaps with the targets 49a and 4, respectively, and measure the relative positional information of the main stage 40 and the sub-stage 50 in the x-axis and the γ-axis direction. As shown in Fig. 3, the submount 70' has the same configuration as that of the submount 50 except that the position of the crucible holder 85, which will be described later, is different from that of the crucible holder 88, which will be described later. Also g [3, the sub-stage 7 〇 has a load stage Υ and a 载 stage 75. The X stage 74 is mounted on the pure member 71 via the slider % fixed to the lower portion thereof, and the linear guide 71 is formed by the coil unit 77 and the magnet 72 fixed to the lower side of the slider 74. The upper is driven in the = axis direction. Further, the cymbal stage 75 is fixed to the lower portion of the slider 7 by the linear guide member , mounted on the slide member fixed on the X stage 74 by being fixed to the magnetic field. The unit 82 and the coil unit fixed to the upper surface of the cymbal stage 74 are configured to be driven in the Y-axis direction on the χ Α L and the upper x stage 74. The position information of the X stage 74 in the X-axis direction is shown in FIG. 2 and FIG. 3, and is fixed to the X stage via a predetermined fixing member. The reading head 78 and the spot are fixed to the guiding portion 38b. X linear scale 73 ” M , Η. 傅 Fu Feng < χ linear encoder system to measure ..., Υ stage 7 ... position information in the axial direction, then 24 201100976 to be fixed to the X stage 74 via a predetermined fixing member < The γ-reading head 79 is measured with a linear linear coder system fixed to the cymbal stage...the linear scale 84. As shown in Fig. 3, the upper surface of the cymbal stage 75 is fixed by a fixing member 85a having an L-shaped cross section. The X stator 85βχ stator 85 is configured to generate a driving force for driving the main stage 40 to the sub-stage 70 in the direction of the x-axis by electromagnetic interaction with the X movable member 45 fixed to the main stage 40. Ο Ring motor (hereinafter referred to as XVCM2). The main control unit (not shown), ^ The sub-stages 50, 70 are driven synchronously by a pair of linear motors (magnet unit, "and coil units 57, 77). In the axial direction, XVC]VH and XVCM2 are used together to connect the main stage 40 to the sub-stage 5〇, 7〇 and vice The stages 50, 70 are driven in the same direction" so that the main stage 4" and the sub-loads %, % are integrally moved in the x-axis direction. Further, the main control device differs in the driving force generated by χν_ and xvcm2, and the main stage 4 is appropriately driven in the 0 z direction. Further, a tamping stator 88 is fixed to the fixing member 85a above the X stator 85. The Y stator 88 has a coil unit including a plurality of coils (not shown). The Y stator 88' constitutes a voice coil motor that slightly drives the main stage 40 relative to the sub stage 70 in the x-axis direction by electromagnetic interaction with the Y movable member 44 fixed to the main stage 40 (hereinafter, YVCM). The relative position information of the main stage 40 and the sub-stage 7 in the x-axis direction is fixed to the gap sensor 86 of the X stage 74 through a predetermined fixing member as shown in FIG. 2, and is fixed by transmission. The member is fixed to the stem 49C of the main stage 4 to measure the relative position of the main stage 40 and the sub-stage 70 in the γ-axis direction: the shell is fixed to the Y stage by a predetermined fixing member. The gap sensor target 49d is 87' measured by being fixed to the main stage 4 through a predetermined fixing member. Here, the operation of the y y battle 40, for example, when the predetermined stroke is moved in the + γ direction (Υ stepping operation), will be described with reference to Figs. 4(A) and 4(8). Further, in Fig. 4 (Α) and Fig. 4 (Β), illustrations of the respective leg portions and the body of the sub-stage guides 37a and 37b are omitted. Fig. 4 ( Α ^ ψ J A, the main stage 40 is located near the side end of the movable range in the γ-axis direction. When the main stage 40 is driven in the + direction from the state shown in Fig. 4(A), the figure is not shown. The main control unit controls the Y linear motors of the sub-stages 5〇 and 7〇, respectively, and v # △ drives the Y stages 55 and 75 on the X stages 54 and 74 in the +γ direction (refer to Fig. 4 (Β In addition, since the main stage 4〇 and the sub-stage 70 are in a non-contact state, the main control unit is parallel to the optical interferometer system (Υ laser interference <yi 98y (refer to The output control YVCM of Fig. 3)) drives the main stage 4 〇 relative to the sub-stage 7 〇 in the + γ direction to induce the main stage 40 in the x-axis direction (the main stage 40 is pulled to the sub-transmission by YVCM) In this manner, the main stage 4〇 and the sub-stages 5〇, 7〇 are integrally moved in the +Y direction. The main control device performs the same control when the main stage is driven in the -Y direction. Wherein, the sub-stages 5〇, 7〇 are moved in the γ-axis direction, and are set to correspond to the γ-axis of the adjacent two projection areas on the wafer W in the plurality of projection areas corresponding to the mask pattern image. Further, as described above, in the pattern surface of the photomask 1^, a plurality of strips (sheets) extending in the scanning direction (x-axis direction) are provided at predetermined intervals in the γ-axis direction. The sub-mount 5 in the case where a plurality of strip-shaped regions are formed on the substrate ρ in a direction of the x-axis and a portion of the mask pattern in which the pattern is formed, and a portion of the mask pattern of the pattern Β The movement stroke of 〇, 7〇 in the γ-axis direction 26 201100976 is set to be equal to or greater than the interval between adjacent strip-shaped regions in the plurality of strip-shaped regions. Thus, the mask stage device MST can be performed in the aforementioned Y-axis direction. Further, when the main control unit drives the main stage 40 in the direction of the x-axis, the main control unit drives the main stage 40 to synchronously drive the sub-stages 54, 74 of the sub-stages 50 and 70, respectively. In parallel with the X-axis I main control device, XVCM1 and XVCM2 are controlled according to the output of the optical interferometer system (a pair of X-ray interferometers 98χ (refer to FIG. 2)), and the main stage 40 is respectively opposite to the sub-loader. The stages 50, 70 are respectively driven in the X-axis direction, whereby the main stage 40 is induced on the y-axis side. In this way, the main stage 40 and the sub-stages 50 and 70 move integrally in the x-axis direction. Further, for example, the sub-stages 5, 70 are used to expose the main stage 4 in the X-axis direction (scanning direction) during exposure or the like. When driving with a long stroke, the main control unit appropriately controls YVCM together with XVCM1 and XVCM2, for example, to "follow the substrate stage device pst (refer to the substrate p (Fig. 1)) The main stage 40 is micro-driven in the γ-axis direction (micro-driving in the scanning and scanning directions during the scanning operation). Next, the arrangement of the XVCM1, XVCM2, and YVCM in the x-axis direction will be described. As shown in FIG. 4(Β), the XVCM1 and the XVCM2 are respectively disposed on the upper side and the lower side of the main stage 40, and the thrust in the x-axis direction is applied to the main stage 40 independently of each other, and the XVCM1 and XVCM2 will be the main stage. The thrust of 40 when driving in the χ axis direction is substantially the same force (the magnitude and direction of the force), so it acts on the main stage at the midpoint between the thrust occurrence position of XVCM 1 and the thrust occurrence position of XVCM2. 40. Further, XVCM1 and XVCM2 are arranged equidistantly from the χ γ plane including the center of gravity CG of the main stage 4〇 in the x-axis direction. Therefore, XVCM1 and XVCM2 are included in the center of gravity CG of the main stage 27 201100976 40.

於主都’將X轴方向之推力作用於主載台40。又，YVCM 位mu 樣的，其於Z軸方向之配置位置係被δ又疋為在與包含主載執口 40之重心位置CG之Χγ 平面平仃之面内，將推力作用於 '主載台40。承上戶斤述，使用XVCM卜XVCM2及YVCM將主哉△ 使將主栽台40相對副載台50、 70驅動於X軸方向及/戋 > Α 次軸方向時，繞與該驅動方向正父之軸之力矩（俯仰力矩）合 ^ ώ , )不Β作用於主載台40，能以良好精度沿ΧΥ平面驅動主載台4〇。 ^此^外’光罩載台裝置_ ’如圖3所示，具有將主、口 40疋位力ΧΥ平面内特定位置之一對定位裝置％。一對定位裝置90,具有在^ 在載α 4〇之本體部4 1 + X側之側面於Υ軸方向分離固定之一對疋位構件91(參照圖2)、以及與上述一對定位構件9彳欢& π Ba 略相同間隔固定在鏡筒平台31上面之一對定位汽缸95。於―料位構件91下面，形成有開口於下方(-Z側)之圓錐狀凹部92。一對定位汽缸95,分別以包含延設於Z轴方向之A贸Λ ^ 乃门之/飞缸罩95a、與一端挿入汽缸罩 95a内之桿部95b之例如汽知μ 4^ 〇』戈/飞缸（或油壓缸、或電動之單軸驅動裝置）構成。於桿部95b *山—壯士上另一端安裝有球部96。對疋位八缸95 ’係在例如最初使用液晶曝光裝置⑺ 時、或液晶曝光裝置1G之維修保養後等，先以雷射干涉儀系統進行主裁台40 _$·々r ® -欠 ^ 戰U之位置貢訊測量之情形時、或再次開始 ^止之測1時等’將主載台4〇定位於雷射干涉儀系統之測量原點位置（以下，簡稱為測量原點位置）時使用。對疋位/飞缸95在主載台4〇之定位時以外（例如曝光時）係如圖5⑷所示，將桿部州收容在汽缸罩心内之狀 28 201100976 態（收容狀態）以避免球部96接觸主載台40。 Ο Ο 將主栽台40定位於測量原點位置時，首先，調整主載口 40之位置以使一對定位構件9 1及一對定位汽缸％各自之軸方向及Υ軸方向之位置大致一致。又，此調整可由液晶曝光震置10之作業員以手動進行，亦可控制成根據間隙感測器66、67、86、87(參照圖2)之輸出自動的進行定位調整接著，將空氣專供應至汽紅I心$，據以如圖$⑻ 所不使杯部9讣從汽缸罩95a突出而將球部％嵌合於凹郤92由於主載台40相對副載台5〇、7〇不被拘束於χ軸方向及Y軸方向、且被懸浮支承在—對主載台導件35上，因此球。"6嵌合於凹部92時，球部％之表面與形成定位構件91之凹口p 92之面（錐形面）滑動，將主載自4〇引導至汽缸95之甲心軸線與凹部92之中心軸線一致之位置。因此，能悝以高精度將主載台4〇定位於同一位置。又，在— 對球部96分別嵌合於—對凹部92之狀態下，球部％之外周面與形成凹部9 2之雜#二及, 义維形面係無間隙的接觸，因此在將主載台40定位之狀態下能防止其抖動。此外，如5(B)所示，在一對球部％分別嵌合於一對凹σΡ 92之狀態下’主載台40往X軸方向、Y軸方向及Θ z 方向之移動受到限制。—對移動鏡術及移㈣_(參照圖2)之各個對本體部41之安裝位置，係被調整為在以一對定位裝置90將主載a μ —, 戰〇 40疋位之狀態下，從對應之各雷射干涉儀98x、98y射出夕也| 士之側距光束Lx、Ly垂直射入其反射面。液晶曝光裝置10 ’使用上述-對定位裝置90將主載台 40定位於測量原點位筈，& / , 置於例如曝光時等，根據以該測量 29 201100976 原點位置為基準之雷站；& 4〇於涉儀系統之測量値，控制主載台一對定位裝置90將主^ 裝置1G，在使用、载α 4〇加以定位之狀態，藉由失_ 示之主控制裝置，椒姑‘ 精由未圖根據m述間隙感測器66、67 輸出，儲存主載台4〇血々 / % 87之此n 4 /、各副載台50、70之位置關係。如 1 在解除—對球部96與-對凹部92之卡被非接觸懸浮支承（亦即， σ 無拘束其在水平面内之位署夕嫌件)主載台40移動网之位置之構之害能。7 去進行使用雷射干涉儀系統之測量部）之Γ置關L上述—對定位|置’即使球部與定位構件（凹固定:主:(具有凹部之定位構❹^ 固疋於主載台；)亦可。八1 以上述方式構成之液示之主控制裝置之管理C裝置0(參照圖υ，在未圖 (loader)^ # ® 進仃使用未圖示之光罩裝載器 1了)二裝載至光罩載台裝置贿上、以及使用圖不之基板裝載器將基板Ρ 裝載至基板載台裝置PST <後’由主控制裝詈#爾土团-準測詈，m θ 使用未圖不之對準檢測系實施對、里對準測罝結束後進杆牛、仓技h 由於u丄法米傻進仃步進掃描方式之曝光動作。由於此曝光動作與習知步此省略其説明。㈣叫方式相同因如以上之説明，本實施形離夕、、# a B 之本罢〜、之液日日曝光裝置10所具有载口裝置MST，係藉由副栽么、 88與主载㈣所具有之γ可所具有之¥固定子載台40相針了動子44構成之YVCM’將主 . 相對錢台50、70(於副載台5 父又掃描方向（Y軸方6, 上）M ,¾動於 ^ X # ^ ^ ° 此即使將主載台40微驅動於乂又知描方向，構成用以將動於秋。50、70分別驅動於χ軸 30 201100976 方向之X線性馬達之磁石單元52與線圈單元57、以及磁石單元72與線圈單元77在交叉掃描方向之相對位置亦不會變化’因此能在不致使X線性馬達之固定子（磁石單元52、 72)大型化之情形下’恆以一定推力將主載台4〇驅動於掃描方向。The thrust of the X-axis direction is applied to the main stage 40 in the main body. Further, in the case where the YVCM is mu-like, the position in the Z-axis direction is δ and is in the plane of the Χ γ plane with the center of gravity CG of the main load 40, and the thrust is applied to the 'main load. Taiwan 40. According to the above description, the main 哉 △ is used to drive the main stage 40 relative to the sub-stages 50, 70 in the X-axis direction and/or Α sub-axis direction using the XVCM Bu XVCM2 and YVCM, and the driving direction is The moment of the positive parent's axis (pitching moment) is ^, ), which acts on the main stage 40, and can drive the main stage 4〇 along the pupil plane with good precision. As shown in Fig. 3, the reticle stage device _ ′ has a positioning device % of a specific position in the plane of the main and port 40 clamping force. The pair of positioning devices 90 have a pair of clamping members 91 (refer to FIG. 2) that are separated and fixed in the z-axis direction on the side of the main body portion 4 1 + X side of the carrier 4, and the pair of positioning members. 9 彳 && π Ba is fixed to one of the pair of positioning cylinders 95 on the lens stage platform 31 with the same interval. Below the level member 91, a conical recess 92 having an opening (-Z side) is formed. A pair of positioning cylinders 95 are respectively included in the A-portion/flying cylinder cover 95a extending in the Z-axis direction and the rod portion 95b inserted into the cylinder cover 95a at one end, for example, a steam-like μ 4^ 〇戈/ Flying cylinder (or hydraulic cylinder, or electric single-axis drive). A ball portion 96 is attached to the other end of the rod portion 95b * mountain - strong man. For the case of the eight-cylinder 95', for example, when the liquid crystal exposure device (7) is used initially, or after the maintenance of the liquid crystal exposure device 1G, the main cutting table is first performed with the laser interferometer system. _$·々r ® - Under ^ When the position of the U is measured by the tribute, or when the measurement is started again, etc., the main stage 4 is positioned at the measurement origin of the laser interferometer system (hereinafter, referred to as the measurement origin position). When used. When the clamp/flying cylinder 95 is positioned at the main stage 4 (for example, during exposure), as shown in Fig. 5 (4), the state of the stem is accommodated in the cylinder cover 28 201100976 (housing state) to avoid The ball portion 96 contacts the main stage 40. Ο 时 When positioning the main table 40 at the measurement origin position, first, adjust the position of the main carrier 40 so that the positions of the pair of positioning members 9 1 and the pair of positioning cylinders are substantially the same in the axial direction and the x-axis direction. . Moreover, the adjustment can be manually performed by an operator of the liquid crystal exposure sensor 10, or can be controlled to automatically perform positioning adjustment according to the outputs of the gap sensors 66, 67, 86, 87 (refer to FIG. 2). Supply to the steam red I core $, according to Fig. $(8), the cup portion 9讣 is not protruded from the cylinder cover 95a, and the ball portion % is fitted into the concave portion 92. Since the main stage 40 is opposite to the sub-mount 5, 7 The ball is not restrained in the x-axis direction and the Y-axis direction, and is suspended and supported on the main stage guide 35, so the ball. When the fitting portion 6 is fitted into the concave portion 92, the surface of the ball portion % slides with the surface (tapered surface) of the notch p 92 forming the positioning member 91, and the main load is guided from the 4〇 to the nail center axis and the concave portion of the cylinder 95. The position of the center axis of 92 is consistent. Therefore, the main stage 4〇 can be positioned at the same position with high precision. Further, in the state in which the ball portion 96 is fitted to the concave portion 92, the outer peripheral surface of the spherical portion % and the concave portion 9 2 are formed, and the Yiwei shaped surface is in contact with each other without gaps. The main stage 40 can be prevented from shaking when it is positioned. Further, as shown in Fig. 5(B), the movement of the main stage 40 in the X-axis direction, the Y-axis direction, and the Θ z direction is restricted in a state in which the pair of ball portions % are fitted to the pair of concave σ Ρ 92, respectively. - the mounting position of each of the pair of moving mirrors and the moving (4)_ (refer to FIG. 2) to the main body portion 41 is adjusted to be in a state in which the main carrier a μ —, the trench 40 is clamped by a pair of positioning devices 90. From the corresponding laser interferometers 98x, 98y, the side beams Xx and Ly are vertically incident on the reflecting surface. The liquid crystal exposure apparatus 10' uses the above-described pairing means 90 to position the main stage 40 at the measurement origin position, & /, for example, during exposure, etc., based on the mine station based on the measurement 29 201100976 origin position ; & 4 値値涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉涉The squid is output from the gap detectors 66 and 67, and the positional relationship between the main stage 4 〇 blood 々 / % 87 and the sub-stages 50, 70 is stored. For example, in the release, the card of the ball portion 96 and the pair of recesses 92 is supported by the non-contact suspension support (that is, the position of the mobile station of the main stage 40 is unsupported by the σ unconstrained position in the horizontal plane). Harm energy. 7 Go to the measurement unit using the laser interferometer system.) Set the above--for the positioning|set even if the ball and the positioning member (concave fixed: main: (the positioning structure with the concave part is fixed to the main load)台 ; ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) The second load to the reticle stage device bribes, and the substrate Ρ is loaded onto the substrate stage device PST <RTIgt; using the substrate loader shown in the figure; after the 'main control device 詈尔土 - - quasi-measurement, m θ Use the unaligned alignment detection system to implement the pairing and the alignment of the 罝罝后、仓仓仓仓由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于The explanation is omitted. (4) The method of calling is the same. As described above, the embodiment of the present invention is the same as that of the present invention. , 88 and the main carrier (4) have the γ can have the ¥ fixed sub-stage 40 with the needle 44 formed by the mover 44 The main unit is opposite to the money table 50, 70 (on the sub-stage 5, the parent scan direction (Y-axis side 6, upper) M, 3⁄4 moves to ^ X # ^ ^ °, even if the main stage 40 is micro-driven in the 乂The direction of the drawing is configured to be opposite to the cross-scanning direction of the magnet unit 52 and the coil unit 57 of the X linear motor that is driven by the autumn 50, 70, respectively, in the direction of the χ axis 30 201100976, and the magnet unit 72 and the coil unit 77. The position does not change either. Therefore, the main stage 4〇 can be driven in the scanning direction with a constant thrust without increasing the size of the X linear motor stator (the magnet units 52, 72).

D Ο 又，本實施形態之液晶曝光裝置1 〇，可將保持光罩M 之主載台40透過YVCM，以一對γ線性馬達（分別包含磁石單το 62與線圈單元6〇、及磁石單元82與線圈單元8〇) 於Y軸方向亦能以長行程加以驅動。因此，藉由適當位主載台40於γ軸方向之位置，即能在不更換光罩μ之情形下，選擇性的將圖案Α及圖案Β轉印至基板Ρ上。如此，即能在例如對基板ρ上之一個照射區域進行轉印圖案Α之曝光動作後’在不更換光罩之情形下連續進行於圖案A重疊轉印圖帛B之曝光動作。此外，在對複數片基板進行曝光時，在進行先將圖帛A轉印至既定片數之基板之曝光動作後，進行將g案B轉印至其餘基板之曝光動作之情形亦無須進行光罩之更拖。函本 u ，更換再者，在對一片基板進行曝光動 4時’在進行將圖f A轉印至複數個照射區域中之部八昭射區域之曝光動作、並二' -Ba ^ + 付丨王丹餘Μ射區域之曝先動作時，亦無須進行光罩之更換。又，由於主載台40與副載台50、7〇彼觸，因，钵Κ士 L + 〜4非接傳遞至主載^切t外部之振動（擾動）經由副載台I70 X軸方向、：二由於用以將主載台4°分別誘導向 . 軸方向之 XVCM1、XVCM2、YVCM 分轉式之音圈馬達，於* Μ為磁、載口 40只要設置包含磁石單元之γ 31 201100976 可動子44、及X可料45、46即可，因此無須於主載台 40連接用來進行電源供應之纜線等。是以能防止來自外部之振動（擾動）經由镜線等傳遞至主載台。又，亦不會發生因纜線張力而導致主載台之位置控制困難之情形。《第2實施形態》其次’說明第2實施形態之液晶曝光裝置。第2實施开> 態之液晶曝光裝置，除了在光罩載台裝置設有用以阻播照明光而遮蔽光罩之一部分之遮光葉片裝置（遮光系統）之外’與第1實施形態之液晶曝光裝置1 〇具有同樣之構成，因此’以下僅說明光罩載台裝置之構成。又，與上述第i 實施形態相同或同等之構成部分，係使用與第i實施形態相同之符號並省略其說明。圖6係第2實施形態之光罩載台裝置MSTa之俯視圖。圖7係圖6之A—A線剖面圖。圖6及圖7中，為避免圖面之錯綜複雜，而省略了設於副載台5〇、7〇之間隙感測器、以及設於主載台40之靶等之圖示，但其構成與第i實施形態相同。如圖6所示，遮光葉片裝置MB具備架設在副載台5〇、 70間之一對葉片本體110、與將—對葉片本體11〇分別驅動於X軸方向之一對葉片驅動裝置140。此處，一對葉片本體 no,除一方係配置在另一方之—X側外，其構成相同，因此，以下僅說明圖7所示之一方之葉片本體11()之構成。葉片本體110，如圖7所示，具有遮光部m、一對被驅動部112、以及將遮光部lu與一對被驅動部112加以分別連接之一對連接部113。遮光部U1係配置成與χγ平面 32 201100976 平行之以Α 向尺寸被設定為較光軍Γ向之矩形板狀構件，其長邊方俜收容在主之長邊方向尺寸長。遮光部"1 係收合在主载台40之載台本體41之開口部4 隔著既定間隙與光罩Μ之上面對向。、、下面鈾方」破驅動部112分別以和ΧΥ平面平行配置之以Υ 軸方向為長邊古A ^ u γ Ο Ο 係於Υ軸方向相距既/板狀構件構成。一對被驅動部112 …之被驅動:二^ …側端部上方。侧之端部則配置在遮光部⑴ :連接部113分別為延設於z軸方向之板狀構件。、接。P 113將遮光部i i i之_ γ側端部與驅動部Π2之+丫側端部加以連接，另一方之連接告= 則㈣光部U^ + Y側端部與+ γ側之被驅動部u2之— “端p加以連接。葉片本體i i 〇相對主載台4〇為非接觸。對葉片驅動裝置140係分別以χ軸方向為長邊方向之件’分別透過一對剖面L字形之固定構件⑷而—方搭載於田1J載台50、另一方搭載於副載台7〇。又，—對驅動裝置1 4 0夕错cUb η ' 、 HO之構成相同。又，一對葉片驅動裝置係以，、上面分別支承一對葉片本體丨1〇之+ Υ側、—Υ側之端部。葉片驅動裝置14G，例如具有包含複數個線圈之線圈單兀(痛略圖示)，藉由以該線圈單元、以及分別固定在一對葉片本體110之+ Y側、_ γ端部之磁石單元（省略圖示）所構Further, in the liquid crystal exposure apparatus 1 of the present embodiment, the main stage 40 holding the mask M can be transmitted through the YVCM, and a pair of γ linear motors (including the magnet single το 62 and the coil unit 6 〇, and the magnet unit, respectively) 82 and coil unit 8〇) can also be driven in a long stroke in the Y-axis direction. Therefore, by appropriately positioning the main stage 40 in the γ-axis direction, the pattern Β and the pattern 选择性 can be selectively transferred onto the substrate 不 without replacing the mask μ. Thus, for example, after the exposure operation of the transfer pattern 一个 is performed on one of the irradiation regions of the substrate ρ, the exposure operation of the pattern A overlap transfer pattern B is continuously performed without replacing the reticle. Further, when exposing a plurality of substrates, after performing an exposure operation of transferring the substrate A to a predetermined number of substrates, the exposure operation of transferring the film B to the remaining substrate is performed without performing light. The cover is even more dragged. Letter u, replacement, when performing exposure to one substrate 4, 'the exposure operation of transferring the image f A to the eight-infrared region of the plurality of irradiation regions, and two '-Ba ^ + There is no need to replace the mask when the exposure of the Wang Dandan shot area is first. Further, since the main stage 40 and the sub-stages 50 and 7 are in contact with each other, the gentleman L + 〜4 is not connected to the main load, and the vibration (disturbance) outside the main stage is through the sub-stage I70 in the X-axis direction. : 由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于由于The movable member 44 and the X can be used for the materials 45 and 46. Therefore, it is not necessary to connect the cable for the power supply to the main stage 40 or the like. This is to prevent vibration (disturbance) from the outside from being transmitted to the main stage via mirror lines or the like. Moreover, there is no possibility that the position control of the main stage is difficult due to the cable tension. <<Second Embodiment>> Next, a liquid crystal exposure apparatus according to a second embodiment will be described. In the liquid crystal exposure apparatus of the second embodiment, the liquid crystal exposure apparatus of the first embodiment is provided with a liquid crystal shutter device (light blocking system) for shielding one of the masks from the illumination of the mask stage device. Since the exposure apparatus 1 has the same configuration, only the configuration of the mask stage apparatus will be described below. It is to be noted that the same or equivalent components as those in the above-described first embodiment are denoted by the same reference numerals as in the i-th embodiment, and the description thereof will be omitted. Fig. 6 is a plan view showing a mask stage device MSTa of the second embodiment. Figure 7 is a cross-sectional view taken along line A-A of Figure 6. In FIGS. 6 and 7, in order to avoid the intricacies of the drawings, the illustrations of the gap sensors provided on the submounts 5 and 7 and the targets provided on the main stage 40 are omitted, but the configuration is omitted. The same as the i-th embodiment. As shown in Fig. 6, the light-shielding vane device MB includes one of the pair of stages 5, 70, 70, and 70, respectively, which is mounted on the pair of stages 5, 70, and the blade body 11 is driven in the X-axis direction. Here, the pair of blade main bodies no are arranged in the same manner as the other side of the X-side, and therefore, only the configuration of the blade main body 11 () shown in Fig. 7 will be described below. As shown in Fig. 7, the blade body 110 has a light shielding portion m, a pair of driven portions 112, and a pair of connection portions 113 that connect the light shielding portion lu and the pair of driven portions 112, respectively. The light-shielding portion U1 is disposed so as to be parallel to the χγ plane 32 201100976, and has a rectangular plate-like member whose size is set to be smaller than the light direction, and the long side of the light is accommodated in the longitudinal direction of the main length. The light-shielding portion 1 is folded over the opening portion 4 of the stage main body 41 of the main stage 40 so as to face the mask rim with a predetermined gap therebetween. The uranium side breaking drive unit 112 is disposed in parallel with the ΧΥ plane, and the Υ axis direction is a long side ancient A ^ u γ Ο Ο which is formed in the Υ axis direction and is formed by a plate member. A pair of driven portions 112 are driven: above the side ends. The end portion of the side is disposed in the light shielding portion (1): the connection portion 113 is a plate-shaped member extending in the z-axis direction. And pick up. P 113 connects the _ γ side end portion of the light shielding portion iii to the + 丫 side end portion of the driving portion Π 2, and the other connection = = (4) The optical portion U^ + Y side end portion and the + γ side driven portion U2 - "The end p is connected. The blade body ii 〇 is non-contact with respect to the main stage 4 。. The blade drive device 140 is respectively fixed by a pair of cross-sectional L-shaped members in the longitudinal direction of the y-axis direction. The member (4) is mounted on the field 1J stage 50 and the other side is mounted on the sub-stage 7〇. Further, the configuration of the drive unit 1400 is the same as the configuration of the UU η ' and HO. Further, the pair of blade drive devices The upper end portion of the pair of blade body 丨1〇 is supported on the Υ side and the Υ side, respectively. The blade driving device 14G has, for example, a coil unit including a plurality of coils (shown in pain). The coil unit and the magnet unit (not shown) fixed to the +Y side and the _ γ end of the pair of blade bodies 110, respectively

成之線性馬達，將一對葉片本體11〇分別獨立的驅動於Xa linear motor that drives a pair of blade bodies 11〇 independently of X

軸方向。當然，亦可設置將一對葉片本體u〇直進引導於X 33 201100976 軸方向之導件。此外’只要能在-對副載台50、70上驅動一對葉片本體U0的話，其驅動方式並不限於此，例如亦使用進給螺桿等。遮光葉片裝置MB，在將光罩熥裝載於主載台4〇時、以及將光罩Μ從主載台40卸載時，一對葉片本體ιι〇分別被-對葉片驅動裝4 140驅動於彼此分離之方向，據以從裝載時、卸載時之光罩厘之移動路徑退避。又，於曝光時， -對葉片本體"0分別被一對葉片驅動裝置14〇驅動於彼此接近之方向而適當的定位於光之任意位4，據以在 X軸方向阻擋（遮蔽）照明光照射於光罩M上之任意位置。如此，照明光所照明之光罩M上之照明區域即受到限制。又，亦可在例如光罩載台裝置MSTa與照明系、(參昭圖0之間或投影光學系PL之下方’配置具有—對可相對光罩_ :轴方向之遮光構件、於γ軸方向阻播（遮蔽）照明光照射於光罩Μ上任意位置之遮光葉片裝置(省略圖示）。以上5兑明之第2實施形態之液晶曝光裝置，除第丨實施形態之液晶曝光裝置10所具有之效果外，由於能使用遮 &葉片裝置MB遮蔽光罩Μ之任意位置以避免照明光之照射’因此’可僅將光罩Μ上任意位置之圖案確實的轉印系基板Ρ。由於係將遮光葉片裝置ΜΒ跨於副載台50、70配置而與主載台40為非接觸，因此遮光葉片裝置之重量不會作用於主載台40。如此，即能防止主載台4〇及主載台所保持之光罩Μ之變形。又’由於遮光葉片裝置廳與主載台40在振動上分離，因此能防止在該等之間產生共振 34 201100976 現象，而能以高精度進行主載台4〇之位置控制。又，與將和遮光葉片裝置MB具有同樣功能之遮光葉片裝置（省略圖不）搭載於例如主載台之情形相較，主載台不會變重，因此月匕以較小之推力驅動主載台。是否以可謀求驅動主载台之致動器（上述實施形態中為音圈馬達）之小型化。又，上述第1及第2實施形態之液晶曝光裝置所具備之光罩載台裝置之構成僅為一例。以下，說明上述實施形態之液晶曝光裝置所具備之光罩載台裝置之變形例。又， Ο 以下之變形例，為求説明之簡化及圖示之方便，與上述第2 實施形態相同或同等之構成部分，係使用與第1實施形態相同或類似之符號，並省略其說明。《第1變形例》圖8係第1變形例之液晶曝光裝置1〇a之部分省略、之 • 部分剖面圖。液晶曝光裝置10a，於設置在地面（參照圖υ 上之機箱200内收容了光罩載台裝置MSTb、機體BDa、未圖示之基板載台裝置（參照圖1)等。第1變形例之光罩載台裝置MSTb，在分別支承副載台5〇、7〇之導引部38a、38b 係分別透過懸吊構件23 9a、23 9b以懸吊狀態固定於機箱2〇〇頂板之點，不同於上述第丨及第2實施形態。又，導引部 38b係收收容在形成於鏡筒平台3U上面、開口於上方（+z 方向）之凹部231内。又，圖8中雖省略了圖示，但懸吊構件239a、239b分別在x軸方向分離設有一對，從頂板懸吊支承導引部38a、38b之X軸方向兩端部。此第1變形例之光罩載台裝置MSTb與上述各實施形態相較，由於機體BDa兩側未設置副載台導件，因此可使機 35 201100976 體BDa(及未圖示之基板載台裝置）大型化。又，亦可於圖8 所示之第1變形例之光罩載台裝置MSTb，搭载如搭載於第 2實施形態之光罩載台裝置之遮光葉片裝置。《第2變形例》其次，說明上述第1 '第2實施形態之第2變形例。圖 9係第2變形例之光罩载台裝置MSTc之部分省略之立體圖。圖9所示之光罩載台裝置MSTc，其固定於主載台3仂之一對X移動鏡48x之位置與上述第i、第2實施形態不同。於主載台3 40之本體部341下面，於γ軸方向分離形成有開口於一 X側之一對凹部347。一對χ移動鏡48χ分別被收容在一對凹部347内而固定於本體部34 1。此第2變形例之光罩載台裝置MSTc ’由於一對X移動鏡48χ係配置在本體部3 41之内部側，即使例如本體部3 4丨擺動於g 丫方向亦能抑制反射面之角度變化，因此能以高精度進行主載台 340之位置控制。此外，與上述第丨、第2實施形態之X移動鏡安裝位置相較，可提高安裝位置之剛性，因此可提升X 移動鏡部之固有振動數，提高控制性能。《第3實施形態》其次，根據圖10〜圖13，説明第3實施形態之液晶曝光裝置。此處，與前述第丨實施形態相同或同等之構成部分，係使用相同或類似符號並簡化或省略其説明。圖1 〇係第3實施形態之液晶曝光裝置丨〇〇〇所具有之光罩載台裝置MSTd之俯視圖，圖u係從+ χ方向觀察光罩載台裝置MSTd之側視圖。本第3實施形態之液晶曝光裝置1000，取代光罩載台裝置MST而具有光罩載台裝置 36 201100976 MSTd，除此點外’具有與前述第1實施形態之液晶曝光裝置10相同之。以下’僅說明光罩載台裝置MSTd之構成。Axis direction. Of course, it is also possible to provide a guide for directing a pair of blade bodies into the axis direction of X 33 201100976. Further, as long as the pair of blade bodies U0 can be driven on the sub-stages 50, 70, the driving method is not limited thereto, and for example, a feed screw or the like is also used. The light-shielding vane device MB, when the photomask is mounted on the main stage 4, and when the photomask is unloaded from the main stage 40, the pair of vane bodies are respectively driven by the pair of vane driving units 4 140 The direction of separation is based on the movement path of the reticle from the time of loading and unloading. Further, at the time of exposure, the blade body "0 is respectively driven by a pair of blade driving devices 14 于 in a direction close to each other and appropriately positioned at any position 4 of the light, thereby blocking (shading) the illumination in the X-axis direction. Light is irradiated to any position on the mask M. Thus, the illumination area on the reticle M illuminated by the illumination light is limited. Further, for example, a light-shielding member having a pair of opposite photomasks _: an axial direction, and a γ-axis may be disposed, for example, between the mask stage device MSTa and the illumination system, (between or between the projection optical systems PL) The light-shielding vane device (not shown) that illuminates the illumination light at any position on the mask. The liquid crystal exposure device according to the second embodiment of the present invention is the liquid crystal exposure device according to the third embodiment. In addition to the effect, since the masking device MB can be used to shield the arbitrary position of the mask 以避免 to avoid the illumination of the illumination light, it is possible to slap the mask only at any position of the pattern of the positive transfer substrate Ρ. Since the shading blade device is disposed across the sub-stages 50, 70 and is not in contact with the main stage 40, the weight of the shading device does not act on the main stage 40. Thus, the main stage 4 can be prevented. And the deformation of the mask 保持 which is held by the main stage. In addition, since the light-shielding blade device hall and the main stage 40 are separated by vibration, it is possible to prevent resonance 34 201100976 between the two, and the main function can be performed with high precision. Stage 4〇 In addition, the main stage does not become heavy, and the sunroof is smaller than the case where the shading blade device (not shown) having the same function as the shading blade device MB is mounted on, for example, the main stage. The thrust driving the main stage, and whether or not the actuator for driving the main stage (the voice coil motor in the above embodiment) is reduced in size. Further, the light of the liquid crystal exposure apparatus according to the first and second embodiments is provided. The configuration of the cover stage device is merely an example. Hereinafter, a modification of the mask stage device included in the liquid crystal exposure device of the above-described embodiment will be described. Further, the following modifications are intended to simplify the description and facilitate the illustration. The same or equivalent components as those of the above-described second embodiment are denoted by the same or similar reference numerals as those of the first embodiment, and the description thereof will be omitted. Fig. 8 is a liquid crystal exposure apparatus 1 according to a first modification. The liquid crystal exposure apparatus 10a is disposed on the ground (the mask stage device MSTb, the body BDa, and the base not shown) are housed in the chassis 200 (see FIG. The stage device (see Fig. 1) or the like. The mask stage device MSTb of the first modification transmits the suspension members 23 9 and 23 through the guide portions 38a and 38b that respectively support the sub-stages 5 and 7 9b is fixed to the top of the chassis 2 in a suspended state, and is different from the above-described second and second embodiments. Further, the guiding portion 38b is received and received on the lens barrel platform 3U and opened above (+z) In the recess 231 of the direction), although not shown in Fig. 8, the suspension members 239a and 239b are respectively provided in a pair in the x-axis direction, and the X-axis direction of the guide portions 38a and 38b is suspended from the top plate. In the photomask stage device MSTb according to the first modification, since the sub-mount guides are not provided on both sides of the body BDa, the machine 35 201100976 body BDa (and not shown) The substrate stage device is increased in size. Further, the light-shielding blade device mounted on the mask stage device of the second embodiment can be mounted on the mask stage device MSTb of the first modification shown in Fig. 8 . <<Second Modification>> Next, a second modification of the first 'second embodiment' will be described. Fig. 9 is a partially omitted perspective view of the mask stage device MSTc of the second modification. The mask stage device MSTc shown in Fig. 9 is fixed to the position of one of the main stage 3's to the X moving mirror 48x, which is different from the above-described i-th and second embodiments. Below the main body portion 341 of the main stage 340, a pair of concave portions 347 having openings on one X side are formed in the γ-axis direction. The pair of cymbal moving mirrors 48A are housed in the pair of concave portions 347 and fixed to the main body portion 34 1 . The mask stage device MSTc' of the second modification is disposed on the inner side of the main body portion 341 by the pair of X moving mirrors 48, and the angle of the reflecting surface can be suppressed even if the main body portion 34 is swung in the g 丫 direction, for example. Since the change is made, the position control of the main stage 340 can be performed with high precision. Further, compared with the X-ray mirror mounting positions of the above-described second and second embodiments, the rigidity of the mounting position can be improved, so that the number of natural vibrations of the X moving mirror portion can be improved, and the control performance can be improved. <<Third Embodiment>> Next, a liquid crystal exposure apparatus according to a third embodiment will be described with reference to Figs. 10 to 13 . Here, the same or equivalent components as those of the above-described embodiment are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted. Fig. 1 is a plan view of a mask stage device MSTd included in a liquid crystal exposure apparatus of a third embodiment, and Fig. 5 is a side view of the mask stage device MSTd as seen from the + χ direction. The liquid crystal exposure apparatus 1000 of the third embodiment is the same as the liquid crystal exposure apparatus 10 of the first embodiment except that the mask stage apparatus 36 201100976 MSTd is provided instead of the mask stage apparatus MST. Hereinafter, only the configuration of the mask stage device MSTd will be described.

第3實施形態之光罩載台裝置MSTd，例如經比較圖10 與圖2可知，雖然整體與第1實施形態之光罩載台裝置MST 具有同樣構成，但部分構成不同。以下，以該等差異點為中心說明第3實施形態。光罩載台裝置MSTd ’取代前述一對定位裝置9〇而具有將圖1 0所示之主載台4 0與副載台5 〇加以連接之鎖止裝〇置WOa、l〇〇b，以及將主載台4〇與副載台7〇加以連接之鎖止裝置l〇〇c、l〇〇d。此處，鎖止裝置丨❹⑽與鎖止裝置1〇仙實質上具有相同構成。又，鎖止裝置1〇〇c與鎖止裝置實質上具有相同構成。圖12(A)中，代表鎖止裝置1〇〇a、1〇〇b，概略顯示了主載台40之一γ側且+ X侧之鎖止裝置1〇〇&之構成。 ❹ 如圖12(A)所示，鎖止裝置1〇〇a具有透過剖面l字形之固定構件H)2固定於Y載台55上面之+ γ側端部之鎖止部101。本實施形態中’前述γ軸方向測量用之間隙感測器 67係透過剖面乙字形之安裝構件—固定於固定構件⑽。鎖止部HH具有延設於z轴方向、且能移動於z轴方 ^軸1G3。將軸1G3驅動於z軸方向之式並無特別例如可以汽紅裝置、或者電磁線圈等加以驅 :端固定有球部另-方面，於主載台4。之本二上面-Y側端部，固定有平心“ + 不體。P 41 測器67測量間隙 1承構件1〇5。以間隙感 1〇5上面。’隙之對象之-述乾_，係固定在支承構件 37 201100976 又吊攝件因疋有剖面L字形之板狀構件之支承構件丨另一端卜γ側端）上面，固定有軸=於支承構件106之 .^ , 疋有軸103下方（與球部104斟向之位置)以圓板狀(低高 4對，於卡合構件1〇7上面形成有構件構成之卡合構件錐狀凹部l〇7a。汗口於上方(+Z側)之圓如圖12(A)所示’在軸⑻被配置在其往Z轴方向可動範圍之+ 2：側端部而使球部1〇4 離下，主# a ^ '、卞。構件107為分離之狀〜、下主載.40不會受到副載台％如圖叩)所示，當轴1Qn 合於凹部—，主載“。與副二向平面内之相對移動受到限制。又，鎖：：、、於χγ 置100b)係使球部1〇4 展置l〇〇a(及鎖止裝甘欠&於圓錐狀凹部丨〇7 盖此在圖所示之主载台4〇㈣之構成，因科〇 4υ爻田丨j载台50拘戾之壯能主載台輸i載台50之相對位置關係恆:同束。…下，另方之鎖止裝置1〇〇1)側，如圖量用之間隙咸測^八神万句測系α測器66透過既定固定構件固間隙感測器66之間隙、>f Θ 疋、X载σ 54，於主載“之支象之前述乾叫被固定在固定以朝向間隙測量方向為乂二隙感測器66絲㈣別構件、支承構件。 #方向之方向的方式固定於固定之側3Λχ代表鎖止裝置驗、iGGd’顯示了主載台4° <十Y側且+ X相丨丨示，鎖止襄置100c且有將裝圖置偷之概略構成。如圖13所下類倒之構造。亦即鎖止^ (A)所不之鎖止裝置购上貞止波置100c具有透過固定構件1〇2 38 201100976 固定於Υ栽台75之鎖且上端固定有球部 °卩01 ’鎖止部101具有能上下動 ❹ Ο 隙感測II 87祐面104之轴1〇3。前述Υ軸方向測量用之間 -透過支承構件it固定構件1〇2。另一方面，於主載台件107具有開口於106固疋有卡合構件107 ’此卡合構之間隙測量對象j Α方之圓錐狀凹部1G7a。間隙感測器87 裝置跡與鎖止被固定於支承構件106。鎖止凹部107a，將a同樣的’藉由使球部104後合於平面内之相對^ _ 7〇加以連接以限制在灯回到圖10,於另— 量用之間隙感測5| 86被、1〇〇d側’ Χ軸方向測 …咖量對象==固定構件一象之刖述靶49c被固定於支承構件1〇5之上面’但各間隙感測器86絲俠分別以朝向間隙測量方向為X軸方向之方向固定於固定構件1〇2、支承構件1〇5。如圖1〇所示，在使用鎖止裝置l〇〇a〜1_將主載台 40分別連接於1彳載台5G、7G之狀態下，以X線性馬達將°χ 載台54、74分別驅動於又軸方向時，能在不使用xvcm卜 XVCM2(參照圖⑴之情形下將主載台4()驅動於χ轴方向以使其加速至曝光時之目標速度之動作、或使主載台4〇減速之動作。因此，作為XVCM1、XVCM2不需要使用可產生大推力者’可使XVCM1、XVCM2小型化。同樣的，在使用Y線性馬達將Y載台55、75驅動於γ軸方向時，可在不使用YVCM(參照圖11)之情形下將主載台4〇驅動於丫軸方向。此外’本第3實施形態之液晶曝光裝置1〇〇〇，在例如 39 201100976 裝置之啟動時，由於無法進 ,^ Λ 丁便用雷射干涉儀系統之主載台40之絶對位置測量，載盾赴办罢卜,、 G ^貝使主載台40位於既定測量原點位置（售略圖示）。此時， 4M ^ W '、之主控制裝置使用上述鎖止裝置100a〜l〇〇d將副載A 5〇、办·^ ^ 50、70與主載台40加以連接，使用副载台50、70將主載台4〇牵引至上位置。接著，主控制裝置在使主 "里原點你番4紐^ 使主載口 40位於上述測量原點位置後，解除以鎖止裝置1〇〇a〜1〇〇d進行之連接，一邊根據前述各間隙感測^^^⑺參照圖⑼之輪出監測位置編移、—邊進行干涉儀系統之預置（preset)。又，各鎖止裳置100a〜100d，係將各卡合構件ι〇7之位置設定為各球部1〇4之外周面與形成各凹部ι〇7&之錐形面之接觸面’如圖12(B)中代表性所示，配置在包含主載台 40之重心位置CG之與χγ平面平行之平面上。因此，在: 副載台50、70與主載台4〇使用鎖止裝置woMood加以連接之狀態下，將副載台5G、7G 一起驅動於χ軸方向及/ 或Y軸方向之情形時，副載台5〇、7〇按壓主載台仂之按壓力即在包含主載台40之重心位置CG之與χγ平面平行之平面内作用。因此，在將主載台4〇驅動於X軸方向及/ 或Y軸方向時，繞與驅動方向正交之軸之力矩（俯仰力矩）不會作用於主載台4〇，而能安定的沿χγ平面引導主載台 40。此外，於鎖止裝置1〇〇a〜1〇〇d，球部1〇4之外周面與幵y成凹4 1 0 7 a之錐形面係無間隙的接觸，因此在將主載台 40分別按壓於副載台5〇、7〇時，可作用大的按壓力。再者，如圖1〇所示，本第3實施形態之光罩載台裝置 MSTd ’具有限制主載台4〇與副載台5〇之相對移動範圍之 40 201100976 :動器（stopper)裝置120a、12〇b、及限制主載台4〇與副載口之相對移動範圍之制動器裝置12〇c、i2〇d。此處，制動器裝置120a與制動器裝置麗實質上具有相同構成。又，制動器裝置120C與制動器裝置12〇d實質上具有相同構成。圖12(A)中，代表四個制動器裝置，顯了主載台4〇之 —Y側且+ X側之制動器裝置12〇a之構成。如圖12(A)所示，於前述固定構件1〇2下端安裝有制動 121。制動構件121形成為俯視呈矩形框狀（具有矩〇 :形形狀，且中央部具有矩形開口部(貫通孔)之形狀卜此*外，於制動構件]2丨> Art, 開口内收容有前述支承構件 =;、於—支承構件1〇6,在與制動構件121之對向面(亦即：橡料封：側、+ Υ側、—¥側之四個側面)固定有以例如 =㈣形成之緩衝墊123(—χ側之緩衝㈣二=定於支承構件1〇k + x側、_χ側、十^、二 :緩衝塾123與制動構件121之間形成有既定間隙。 x、〜χ、+γ、-γ各方向(亦C ::平=台^ 量(相對可能範圍)’係對應制動構件12 移動衝塾123)之間所形成間隙之寬度加以限制。又：106(緩 •不了制動器裝置i2〇c之概略構成。制動器裝置、圖13顯制動器裝置⑽同樣的，形成置如亦係與形框狀，具有於其開口部内 102之矩 ⑵，將主載台4〇與副載台70之_t106之制動構件動構件121與支承構件106(緩衝塾：施範圍，以制 123)之間之間隙寬度加 41 201100976 以限制。如此’在鎖止裝置100a〜100d未將主載台4〇分別與副載/^加以連接之狀時照圖叫仙’使用副載台 5〇、70將主載台4〇以既定行軸方向及/或γ 軸：向％’例如假設副載台50、70緊急停止而主載台40 以其慣性而移動於X軸方向及/或丫軸方向，亦能藉由四個制動構#⑵分別抵接於對應之支承構件〗06之周圍四面之緩衝塾！23,防止主載台4〇脫離副載台5〇、7()而移動。 ,液晶曝光裝置刪之其他部分之構成與前述第【實施形態之液晶曝光裝置10相同’進行同樣的曝光動作。如以上之説明，本第3實施形態之液晶曝光裝置1〇〇〇, ，光罩載台裝i MSTd之部分構成外，由於係與前述第丄貫施形態之液晶曝光裝置1G同樣的構成，因此能獲得同等效果。除此之外’本第3實施形態之液晶曝光裝置刪(所具備之光罩載台裝4 MSTd)’由於能使用鎖止裝置驗〜 l〇〇d在包含主載台40之重心位置CG之平面内將主載台 4〇與副載台50、70分別加以連接，因此能在不使用 XVCM!、XVCM2及YVCM之情形下，將載台4〇適當的驅動於X軸方向及/或Y軸方向。是以作為xvcmi、 XVCM2、YVCM可使用推力較小之小型者而能抑制電力消耗，因此能謀求成本之降低。又，由於鎖止裝置l〇〇a〜i〇〇d 之構造簡單’因此故障少且動作敏捷，因此能降低成本、且維修保養性亦優。又，本第3實施形態之光罩載台裝置MSTd，係將主載台40與副載台50使用鎖止裝置1〇〇a、1〇补在二處 '將主 42 201100976 載台40與副栽台70使用鎖止裝置100C、1〇(Μ在-處（入+ 四處）加以分則$址你〜處（合計 u L 別連接，因此主载台40不會旋轉於θζ 此外，由於鎖止梦w 方向。向，因此能迅速轴1〇3係移動^轴方連接，且X二與副載台5〇、70分別加以情形相= γ軸方向之剛性高…亦可與上述 #鎖止裝置之可動式軸設於主载台、將固定 :轴之球部所嵌合之卡合構件設於副載台侧 = Ο 〇化，因此較佳。 1载。之方式’可使主栽台輕量再者，由於光罩載台裝置咖具有限制主載台40分與副載台5。、70之相對移動可能範圍之制動器褒置咖’因此’即使在例如副载台50、70緊急停止之情形等時’亦能防止主載台40依其慣性從副載台5 又：由於在主載…副載台5〇、7〇之接觸面分=置了緩衝墊123，因此可緩和在揸擊時之衝擊。上述第3 f施形態之液晶曝光裝置所具備之光罩載台裂置之構成僅為一例。以下’説明上述第3實施形態之：晶曝光裝置所具備之光罩載台裝置之變形例。&，於以下之變形例中’ $簡化說明及便於圖示，相同或同等之構成部分係使用同一符號並省略其說明。於圖14中顯示了變形例之光罩載台裝置題6之鎖止裝置200a及制動器裝置22〇a之概略構成。又，與上述實施形態同樣的，鎖止裝置及制動器裝置係分別於主載台4〇之 —γ側及+ γ側各設置二個、合計設有四個，圖14中代表性的顯示其t之-個（主载台4G之—γ側且+ X側之鎖止裝 43 201100976 置200a及制動器裝置22〇a)。反形例之光罩載台裝置MSTe之制動器裝置22〇a，且制動構件121與支承構件1〇6(緩衝塾12取接在包含主載台4〇之重心位置-之平面上。因此，= 件叫緩衝墊123)與制動構件122彼此抵接而限制主載台 40分別與副載台50、7〇之相對移動時，制動構件⑵ 承構件106係在包含主# Α & ”又牡私各主載台40之重心位置CG之平面内抵接（碰撞），因此繞與其移動方向正交之Μ力矩⑽仰力㈣不會作用於主載台40。因此，即使制動構件121血支承構件1〇6碰撞，亦能防止主載台4G之姿勢大幅變亂。、此外，本變形例之光罩載台裝置MSTe，以鎖止裝置聽進行之主載台40分別與副載台5〇、7〇之連接位置雖較包含主載口 40之重心位置CG之平面更+ z側，但由於與包含主載口 40之重心位置CG之平面之距離微小、以及在χγ平面内之:處將主載台4〇與副載台5〇、7〇分別加以連接，因此實質上與上述實施形態同樣的，能沿χγ平面以良好精度驅動主載台40。當然，並不限於此，例如亦可將使用鎖止裝置之主载台分別與一對副載台之連接位置、及制動器裝置所設定之主載台分別與一對副載台之抵接位置，分別設定在包含主載台之重心位置CG之二維平面上。又，鎖止裝置雖係主載台兩側各設於二處之合計四處，但不限於此’只要不在同一直線上則三處亦可。此外，球部與抵接之構件其#分亦可以不是圓錐，而係延設於單軸方向(例如X軸方向、或γ軸方向）之溝形狀。又上述第3實施形態中，一對副載台亦可以是僅能 44 201100976 f動:掃描方向。此外’上述第1至第3實施形態，雖係針對可以YVcM及一對XVCM1、XVCM2中之至少一方、及/或鎖止裝置100a〜10〇d將主載台與一對副載台一體驅動之第1狀態、以及無法一體驅動主載台與一對副載台之 . 第2狀態之間進行切換設定之情形作了説明，但用以切換 °又定可一體驅動主載台與一對副載台之第1狀態、與不可一體驅動主栽台與一對副載台之第2狀態之狀態設定裝置之構成’並不限於此。〇《第4實施形態》其次’根據圖15〜圖19説明第4實施形態之曝光裝置。此處，與前述第1、第3實施形態相同或同等之構成部分，係使用相同或類似符號並簡化或省略其説明。圖15係第4實施形態之液晶曝光裝置2〇〇〇所具有之光罩載台裝置之俯視圖。本第3實施形態之液晶曝光裝置 2000,除取代光罩載台裝置MST而具有光罩載台裝置MSTf 之點外，具有與前述第1實施形態之液晶曝光裝置1〇相同〇之構成。以下，僅說明光罩載台裝置MSTf之構成。第4實施形態之光罩載台裝置MSTf，由例如圖1 5與圖2之比較可知，全體而言雖具有與第丨實施形態之光罩載台裝置M S T相同之構成’但部分構成相異。以下，以該差異點為中心說明第4實施形態。光罩載台裝置MSTf ’如圖15所示，具有將主載台4〇與副載台50加以連接之鎖止裝置丨〇〇a、1 〇〇b及將主載台 40與副載台7〇加以連接之鎖止裝置100c、1〇〇d，以及—對定位裝置90。又，鎖止裝置i〇0a與鎖止裝置i〇〇b實質上 45 201100976 具有相同構成。此外，鎖止裝置100c與鎖止裝置1〇〇d實質上具有相同構成。圖16(A)中’代表鎖止裝置1〇〇a、1〇〇卜概略顯不了主載台4〇之—γ側且+ χ側之鎖止裝”，之構成。由圖16(Α)與圖12(Α)之比較可知，鎖止裝置i〇〇a、 10〇b與前述第3實施形態之鎖止裝置lGQa、iGQb同樣的構因此，如圖17(A)所示，在軸1〇3被配置於往z軸方向 4可動範圍之+ Z側、球部！〇4與卡合構件i 〇7為分離之狀態:’主載台40不受副載台5〇拘束。另一方面，如圖i7(B) ^不’當軸103往一Z方向移動使球部1〇4嵌合於凹部1〇7& 時，主載台40與副載台5〇即連接而使其在χγ平面内之相對移動受到限制。又，由於I置⑽a(及鎖止裝置⑽b)係使球部104丧合於圓錐狀凹部1〇7a之構成，因此，在圖i7(B) ^不^主載台40受副載台5〇拘束之狀態下，主載台40與 :!載。50之相對位置關係，與上述定位裝置％同樣的恆之+圖18中，代表鎖止裝置100c、l〇〇d，顯示了主載台40 側且+ x側之鎖止裝置1 0〇C之概略構成。由圖丨8盥圖13之t卜柄Χ 么 σ，鎖止裝置100c、100d具有與前述第3 與：1::鎖止裝置100c、100d相同之構成。鎖止褒置1〇〇C "1〇〇a同樣的，藉由使球部104嵌合於凹部107a 夕栽D 40與副載台70加以連接，據以限制在XY平面内之相對移動。卞曲闪The reticle stage device MSTd of the third embodiment has the same configuration as that of the reticle stage device MST of the first embodiment as described above with reference to FIG. 10 and FIG. 2, but the configuration is partially different. Hereinafter, the third embodiment will be described focusing on these differences. The mask stage device MSTd' has a locking device WOa, lb for connecting the main stage 40 and the sub-mount 5 shown in FIG. 10 in place of the pair of positioning devices 9'. And locking devices l〇〇c, l〇〇d that connect the main stage 4〇 and the sub stage 7〇. Here, the locking device (10) and the locking device 1 substantially have the same configuration. Further, the lock device 1〇〇c has substantially the same configuration as the lock device. In Fig. 12(A), the lock devices 1A and 1B are schematically shown, and the configuration of the lock device 1A&1 on the γ side and the +X side of the main stage 40 is schematically shown. As shown in Fig. 12(A), the lock device 1A has a lock member 101 which is fixed to the + γ side end portion of the upper surface of the Y stage 55 by a fixing member H) 2 having a translinear shape of a cross section. In the present embodiment, the gap sensor 67 for measuring the γ-axis direction is transmitted through a mounting member having a cross-sectional B-shape to be fixed to the fixing member (10). The lock portion HH has a width extending in the z-axis direction and is movable to the z-axis axis 1G3. The type in which the shaft 1G3 is driven in the z-axis direction is not particularly limited, for example, by a steam red device or an electromagnetic coil, and the ball is fixed at the end, and the main stage 4 is attached. The second side of the upper-Y side is fixed with a flat center "+ not body. P 41 measuring device 67 measures the gap 1 bearing member 1〇5. The gap feels 1〇5 above. 'The object of the gap- 述干_ , is fixed to the support member 37 201100976 and the hoisting member is fixed on the upper side of the support member 丨 γ side end of the plate-shaped member having the L-shaped cross section, and the shaft is fixed to the support member 106. The lower portion of the 103 (the position facing the ball portion 104) is in the shape of a disk (four pairs of low and high, and the engaging member tapered concave portion 10a is formed on the upper surface of the engaging member 1A7. The sweat is on the upper side ( The circle of +Z side) is as shown in Fig. 12(A) 'The axis (8) is placed at the + 2: side end of the movable range in the Z-axis direction, and the ball portion 1〇4 is separated, the main # a ^ '卞. The member 107 is in the form of separation ~, the lower main load. 40 is not subject to the sub-stage as shown in Figure ,), when the shaft 1Qn is combined with the recess - the main load ". The relative movement within the secondary dichroic plane is limited. Also, the lock::,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The structure of the 4th (4th) of the Taiwanese, the relative positional relationship between the main station and the i-stage 50 is fixed by the Kezheng 4 υ爻田丨j stage 50 50. The same positional relationship is the same: the same, the other locking device 1 〇〇1) side, as shown in the figure, the gap is measured. ^The sacred system is measured by the gap between the fixed component and the gap ≥ f X X The above-mentioned dry call carrying the "support" is fixed in the direction of the gap measurement to the second gap sensor 66 wire (four) other members, support members. The direction of the direction is fixed to the fixed side 3 Λχ represents the locking device The test, iGGd' shows the main stage 4° < ten Y side and + X phase indication, the locking device 100c and the schematic structure of the installation of the figure. As shown in Figure 13 below. That is, the locking device (A) does not have a lock device. The stop wave device 100c has a lock that is fixed to the rafter 75 through the fixing member 1 〇 2 38 201100976 and the ball is fixed at the upper end. The portion 101 has a shaft 1〇3 capable of moving up and down the gap sensing II 87. The aforementioned direction for measuring the x-axis direction transmits the member 1〇2 through the support member it. On the other hand, the main stage member 107 has a conical recessed portion 1G7a having an opening to which the engaging member 107' is engaged with the gap measuring object j. The gap sensor 87 is attached to the support member 106. The locking recess is fixed to the support member 106. 107a, the same 'a' is connected by the relative ^ _ 7 使 in the plane of the ball 104 to limit the light back to FIG. 10, and the gap is sensed by another gap 5 | 86 quilt, 1 〇〇d side ' Χ axis direction measurement ... coffee object == fixed member image of the target 49c is fixed on the support member 1 〇 5 'but the gap sensor 86 is divided into the direction of the gap measurement The direction of the X-axis direction is fixed to the fixing member 1〇2 and the supporting member 1〇5. As shown in FIG. 1A, the main stage 40 is connected to the 1st load using the locking device 10a~1_. In the state of 5G and 7G, when the X χ carriers 54 and 74 are respectively driven in the direction of the axis by the X linear motor, the xvcmb XVCM2 can be used. (Refer to the case of Fig. (1), the operation of driving the main stage 4 () in the direction of the x-axis to accelerate the target speed at the time of exposure, or the operation of decelerating the main stage 4〇. Therefore, as XVCM1 and XVCM2, If it is necessary to use a large thrust, the XVCM1 and XVCM2 can be miniaturized. Similarly, when the Y stage 55, 75 is driven in the γ-axis direction by the Y linear motor, the YVCM (see Fig. 11) can be used. The main stage 4〇 is driven in the direction of the x-axis. Further, in the liquid crystal exposure apparatus 1 of the third embodiment, when the device is activated, for example, at the time of the operation of 39 201100976, the absolute position measurement of the main stage 40 of the laser interferometer system is performed because it cannot be entered. The shield went to the office, and G ^ Bei made the main stage 40 at the established measurement origin (sales icon). At this time, the main control device of 4M ^ W ' is connected to the main stage 40 by the above-described lock devices 100a to 100d, and the sub-stage 50 is used. 70 drives the main stage 4 to the upper position. Then, the main control device releases the connection by the lock device 1〇〇a~1〇〇d after the main load port 40 is placed at the measurement origin position. According to the foregoing gap sensing ^^^(7), referring to the wheel-out monitoring position of the figure (9), the preset of the interferometer system is performed. Further, each of the locking skirts 100a to 100d sets the position of each of the engaging members ι 7 to the contact surface of the outer peripheral surface of each of the spherical portions 1〇4 and the tapered surface of each of the concave portions ι7& As shown in Fig. 12(B), it is disposed on a plane parallel to the χγ plane including the center of gravity CG of the main stage 40. Therefore, when the sub-stages 50, 70 and the main stage 4 are connected by the lock device woMood, when the sub-stages 5G and 7G are driven together in the x-axis direction and/or the Y-axis direction, The pressing force of the sub-stage 5〇, 7〇 pressing the main stage 作用 acts in a plane parallel to the χγ plane including the center of gravity CG of the main stage 40. Therefore, when the main stage 4〇 is driven in the X-axis direction and/or the Y-axis direction, the moment (pitching moment) about the axis orthogonal to the driving direction does not act on the main stage 4〇, but can be stabilized. The main stage 40 is guided along the χγ plane. In addition, in the locking device 1〇〇a~1〇〇d, the outer peripheral surface of the ball portion 1〇4 is in contact with the tapered surface of the 幵y concave 4 1 0 7 a, so that the main stage is When 40 is pressed against the sub-stage 5 〇 and 7 分别, a large pressing force can be applied. Further, as shown in FIG. 1A, the mask stage device MSTd' of the third embodiment has a 40 201100976 stopper device for restricting the relative movement range of the main stage 4〇 and the sub stage 5〇. 120a, 12〇b, and brake devices 12〇c, i2〇d that limit the relative movement range of the main stage 4〇 and the sub-carrier port. Here, the brake device 120a and the brake device 135 have substantially the same configuration. Further, the brake device 120C and the brake device 12〇d have substantially the same configuration. In Fig. 12(A), four brake devices are shown, and the configuration of the brake device 12A on the Y side and the +X side of the main stage 4A is shown. As shown in Fig. 12(A), a brake 121 is attached to the lower end of the fixing member 1A2. The brake member 121 is formed in a rectangular frame shape in a plan view (having a rectangular shape: a shape having a rectangular opening portion (through hole) in the center portion), and is housed in the opening in the brake member 2 丨 > Art The support member=;, the support member 1〇6 is fixed to the opposite surface of the brake member 121 (ie, the rubber seal: side, the + Υ side, and the *** side), for example, (4) The cushion pad 123 is formed (the buffer on the side of the cymbal side (4). 2 = is defined on the support member 1 〇 k + x side, _ χ side, ten ^, two: a predetermined gap is formed between the buffer 塾 123 and the brake member 121. The widths of the gaps formed between the directions of ~χ, +γ, and -γ (also C: 平 =台^(relative range)' corresponds to the braking member 12 moving the punch 123) are limited. The brake device and the brake device (10) are similarly formed in the same manner as the frame brake device (10), and have a rectangular shape (2) in the opening portion 102, and the main stage 4〇 Between the brake member moving member 121 of the sub-stage 70 and the support member 106 (buffering range: 123) The gap width is increased by 41 201100976. In this way, when the locking devices 100a to 100d are not connected to the sub-carriers/^, respectively, the picture is called "Shen" using the sub-stages 5, 70. The stage 4 〇 is in the predetermined row axis direction and/or γ axis: to %', for example, it is assumed that the sub-stages 50, 70 are urgently stopped, and the main stage 40 is moved in the X-axis direction and/or the x-axis direction by its inertia. The four brake structures #(2) can respectively abut against the buffer 塾! 23 on the four sides of the corresponding support member -06, and prevent the main stage 4 from moving away from the sub-stages 5, 7 (). The configuration of the other parts of the apparatus is the same as that of the liquid crystal exposure apparatus 10 of the first embodiment. The liquid crystal exposure apparatus of the third embodiment is exemplified as described above. In addition to the configuration of the liquid crystal exposure apparatus 1G of the above-described first embodiment, the same effect can be obtained, and the liquid crystal exposure apparatus of the third embodiment is provided. Photomask loading table 4 MSTd) 'Because lock can be used The test 1 l〇〇d connects the main stage 4〇 and the sub stage 50, 70 in the plane including the center of gravity CG of the main stage 40, so that the XVCM!, XVCM2, and YVCM can be used. In the X-axis direction and/or the Y-axis direction, the stage 4 is appropriately driven in the X-axis direction and/or the Y-axis direction. The power consumption can be suppressed by using a small-sized thruster as xvcmi, XVCM2, and YVCM. Therefore, cost reduction can be achieved. Further, since the structure of the lock devices 10a to i〇〇d is simple, the number of failures is small and the movement is quick, so that the cost can be reduced and the maintenance performance is excellent. Further, in the mask stage device MSTd of the third embodiment, the main stage 40 and the sub stage 50 are filled in two places by using the lock devices 1a and 1', and the main 42 201100976 stage 40 is The sub-stage 70 uses the locking device 100C, 1 〇 (Μ at - at (in + four places) to divide the position of the address you are at the place (the total u L is connected, so the main stage 40 does not rotate at θ ζ Locking the direction of the dream w. Therefore, the axis 1〇3 system can be moved quickly and the axis is connected, and the X 2 and the sub-stages 5〇 and 70 respectively are combined with the case where the rigidity is high in the γ-axis direction... The movable shaft of the lock device is provided on the main stage, and the engaging member to which the ball portion of the shaft is fixed is provided on the sub-stage side = Ο ,, which is preferable. The main stage is lighter, because the reticle stage device has a brake that limits the relative movement range of the main stage 40 and the sub-stage 5, 70, so that even in the sub-stage 50, for example. , 70 emergency stop situation, etc. 'can also prevent the main stage 40 from the sub-mount 5 according to its inertia: due to the contact of the main load ... sub-stage 5 〇, 7 〇 In the case of the cushion pad 123, the shock at the time of the slamming is relieved. The configuration of the reticle stage rupturing provided in the liquid crystal exposure apparatus of the third aspect is only an example. Modifications of the reticle stage apparatus provided in the crystal exposure apparatus. In the following modifications, the descriptions of the same or equivalent components are denoted by the same reference numerals, and the description thereof will be omitted. A schematic configuration of the lock device 200a and the brake device 22A of the mask stage device of the modification of the modification example is shown in Fig. 14. Similarly, in the same manner as the above embodiment, the lock device and the brake device are respectively The main stage 4 is provided with two γ sides and a + γ side, and four are provided in total, and a representative one of them is shown in FIG. 14 (the γ side of the main stage 4G and the + X side) Locking device 43 201100976 Set 200a and brake device 22〇a). The brake device 22A of the mask cover device MSTe of the reverse example, and the brake member 121 and the support member 1〇6 (the buffer member 12 is taken in and included) The position of the center of gravity of the main stage 4〇 is on the plane. Therefore, = When the cushion pad 123) and the brake member 122 abut each other to restrict the relative movement of the main stage 40 and the sub-stages 50, 7, respectively, the brake member (2) bearing member 106 is included in the main # Α & The center of gravity CG of each of the main stages 40 abuts (collision) in the plane, so that the yaw moment (10) of the yaw moment (4) orthogonal to the moving direction thereof does not act on the main stage 40. Therefore, even the brake member 121 blood supporting member In the collision of 1〇6, it is possible to prevent the posture of the main stage 4G from being greatly disturbed. Further, in the mask stage device MSTe of the present modification, the main stage 40 and the sub stage 5 are respectively listened to by the locking device. The connection position of 7〇 is more than the z-side of the plane including the center of gravity CG of the main carrier 40, but is slightly smaller than the plane including the center of gravity CG of the main carrier 40, and is in the χγ plane: Since the main stage 4A and the sub-stages 5A and 7B are connected to each other, the main stage 40 can be driven with good precision along the χγ plane in substantially the same manner as in the above embodiment. Needless to say, the present invention is not limited thereto. For example, the connection position between the main stage using the lock device and the pair of sub-stages, and the contact position of the main stage set by the brake device and the pair of sub-stages, respectively. , respectively, are set on a two-dimensional plane including the center of gravity CG of the main stage. Further, although the lock device is provided in a total of four places on both sides of the main stage, the present invention is not limited to this, and three places may be used as long as they are not on the same straight line. Further, the ball portion and the abutting member may be not grooved, but may be formed in a groove shape in a uniaxial direction (e.g., an X-axis direction or a γ-axis direction). Further, in the third embodiment, the pair of sub-stages may be only movable. Further, in the first to third embodiments described above, the main stage and the pair of sub-stages are integrally driven with respect to at least one of the YVcM and the pair of XVCM1 and XVCM2, and/or the locking devices 100a to 10〇d. The first state and the case where the main stage and the pair of sub-stages cannot be integrally driven are described. The case where the second state is switched and set is described, but the main stage and the pair can be integrally driven by switching The configuration of the first state of the submount and the state setting means for the second state in which the main stage and the pair of submounts are not integrally driven are not limited thereto.第 <<Fourth Embodiment>> Next, an exposure apparatus according to a fourth embodiment will be described with reference to Figs. 15 to 19 . Here, the same or equivalent components as those of the above-described first and third embodiments are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted. Fig. 15 is a plan view showing a mask stage device included in the liquid crystal exposure apparatus 2 of the fourth embodiment. The liquid crystal exposure apparatus 2000 of the third embodiment has the same configuration as that of the liquid crystal exposure apparatus 1 of the first embodiment except that the mask stage apparatus MSTf is provided instead of the mask stage apparatus MST. Hereinafter, only the configuration of the mask stage device MSTf will be described. The reticle stage device MSTf of the fourth embodiment has a configuration similar to that of the reticle stage device MST of the second embodiment, as shown in, for example, a comparison between FIG. 15 and FIG. 2, but the partial configuration is different. . Hereinafter, the fourth embodiment will be described focusing on the difference. As shown in FIG. 15, the mask stage device MSTf' has locking devices 丨〇〇a, 1bb for connecting the main stage 4〇 and the sub-mount 50, and the main stage 40 and the sub-stage 7〇 the locking devices 100c, 1〇〇d, and the pairing device 90 are connected. Further, the lock device i〇0a has the same configuration as the lock device i〇〇b substantially 45 201100976. Further, the lock device 100c and the lock device 1〇〇d have substantially the same configuration. In Fig. 16(A), 'representing the locking device 1〇〇a, 1 概略概略概略概略概略概略概略概略概略概略 γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ As can be seen from comparison with Fig. 12 (Α), the lock devices i〇〇a and 10〇b have the same configuration as the lock devices 1GQa and iGQb of the third embodiment, as shown in Fig. 17(A). The shaft 1〇3 is disposed on the +Z side of the movable range in the z-axis direction 4, and the ball portion 〇4 is separated from the engaging member i 〇7: the main stage 40 is not restrained by the sub-stage 5〇. On the other hand, as shown in Fig. i7(B), when the shaft 103 is moved in the Z direction so that the ball portion 1〇4 is fitted to the recessed portion 1〇7&, the main stage 40 and the sub-mount 5 are connected. The relative movement in the χγ plane is limited. Further, since the I-set (10)a (and the locking device (10)b) causes the ball portion 104 to succumb to the conical recess 1〇7a, therefore, in Figure i7(B) ^ In the state where the main stage 40 is restrained by the sub-stage 5, the relative positional relationship between the main stage 40 and the :: load 50 is the same as that of the above-mentioned positioning device % + in Fig. 18, the lock is represented. Devices 100c, l〇〇d, showing the main stage 40 side and + x The locking device 100 〇 C has a schematic configuration. The locking devices 100c and 100d have the same functions as the third and 1:: locking devices 100c and 100d described above. In the same manner, the lock mechanism 1 is similar to C "1〇〇a, and the ball portion 104 is fitted into the concave portion 107a, and the sub-plant D 40 is connected to the sub-stage 70, thereby being restricted in the XY plane. Relative movement.

回到圖1 5，在#用久蚀l W 在使用各鎖止裝i 100a〜100d將主載台4〇於副栽台50、70之狀態下，以χ線性馬達將χ載 46 201100976 台二、74分別驅動於Χ軸方向時，能在不使用ΜΜΐ、 2之情形下達成將主載台4〇驅動於χ轴方向以使其 1 Γ光時之目標速度之動作、或使主載台4〇減速之動 *此，作為XVCM1、XVCM2不需要使 ::二使XV—⑽小型化。同樣的，在… 線十馬達將Y載台55、75驅動於丫軸方向時，可在不使用 YVCM之情形下將主載台4〇驅動於γ轴方向。此外， Ο ❹ 泣於鎖止裝置1〇〇a〜100d，球部1〇4之外周面與形成凹 4 〇7a之錐形面係無間隙的接觸，因此在將主載台4 按壓於副載台5G、7G時，可作用大的按壓力。又，各鎖止裝置10Ga〜1()()d，在使用前述―對定位裝置％使主載台扣位於測量原點位置近旁(球部96與凹部92對應之位置(例如參照圖16(A)))時亦被使用。再者’如圖15所示’本第4實施形態之光罩載台裝置 MSTf具有限制主載台4G與副載台5()之相對移動範圍之制動器裝4 12〇a，、12〇b，以及限制主载台40與副載台7〇之相對移動範圍之制動器裝4 12〇c，、12〇d，…制動器裝置 UOa’與制動器裝置12〇b，實質上具有相同構成。此外，制動器裝置與制動器裝置譲’實質上具有相同構成。圖 17(A)中，代表四個制動器裝置，顯示了主載台仂之—丫側且+ X側之制動器裝置120a，之構成。如圖17(A)所示，於前述固定構件1〇2下端設有以X軸方向為軸方向之旋轉軸122。於固定構件1〇2下端將構件 124安裝成能以旋轉軸122為中心旋動（來回旋轉），於該構件124之一端一體固定有前述俯視矩形框狀之制動構件 47 201100976 121。此場合，構件124與制動構件i2i具有從+ χ側觀看時呈L字形之形狀。制動構件121藉由未圖示之致動器以旋轉軸122為令心旋動。如® i 7(A)所示，於制動構件12 i之開口部内收 :::支承構件1〇6。於支承構件1〇6，在與制動構件ΐ2ι =面(： + X側、_X側' +γ側、—γ側之四個側面）固疋有例如以橡膠系材料形成之緩衝墊123(—χReturning to Fig. 15, the use of the eclipse l W in the state of using the locks i 100a to 100d to smash the main stage 4 to the sub-stages 50, 70, and the χ linear motor will be carried out 46 201100976 2. When the 74 is driven in the direction of the x-axis, the action of the target speed when the main stage 4 is driven in the direction of the x-axis to make it 1 light can be achieved without using ΜΜΐ or 2, or the main load can be made. The movement of the 4 〇 deceleration * This, as XVCM1, XVCM2 does not need to make: 2 to make XV - (10) miniaturized. Similarly, when the line ten motor drives the Y stages 55 and 75 in the x-axis direction, the main stage 4〇 can be driven in the γ-axis direction without using the YVCM. Further, Ο ❹ 于于锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁锁When the stage 5G, 7G is used, a large pressing force can be applied. Further, each of the lock devices 10Ga to 1()() d causes the main stage to be positioned near the measurement origin position (the ball portion 96 corresponds to the concave portion 92) by using the above-described "positioning device" (for example, see FIG. 16 (see, for example, FIG. 16). A))) is also used. Further, as shown in Fig. 15, the photomask stage device MSTf of the fourth embodiment has a brake device 412〇a, 12〇b that restricts the relative movement range of the main stage 4G and the sub stage 5(). The brake device 4 12〇c, 12〇d, ..., the brake device UOa' and the brake device 12〇b, which restrict the relative movement range of the main stage 40 and the sub-stage 7〇, have substantially the same configuration. Further, the brake device and the brake device 譲' have substantially the same configuration. In Fig. 17(A), four brake devices are shown, and the brake device 120a on the x-side and the +X side of the main stage is shown. As shown in Fig. 17(A), a rotating shaft 122 whose axial direction is the X-axis direction is provided at the lower end of the fixing member 1A. The member 124 is attached to the lower end of the fixing member 1〇2 so as to be rotatable about the rotating shaft 122 (rotating back and forth), and the above-mentioned rectangular frame-shaped braking member 47 201100976 121 is integrally fixed to one end of the member 124. In this case, the member 124 and the brake member i2i have an L-shape when viewed from the + χ side. The brake member 121 is rotated by a rotation shaft 122 by an actuator (not shown). As shown in ® i 7 (A), ::: support member 1 〇 6 is received in the opening of the brake member 12 i. In the support member 1〇6, a cushion pad 123 formed of, for example, a rubber-based material is fixed to the brake member ΐ2ι=face (: + X side, _X side '+ γ side, and - γ side) (( χ

衝墊省略圖示）。分別岐在支承構# iG6之+ 乂侧、—X L+Y側、—Y側之各緩衝墊123與制動構件121之間形成有既定間隙。 7 於X::所示之狀態下’主載台40相對副載台5。移動往：轴方向及/或γ軸方向時之主載台4〇與副載台5〇之移動曰^Χ、+Υ、—Υ各方向（亦即，在水平面内）之相對叫之間形成之間隙寬度受到限制。此外，圖中顯示了制動器裝置12〇c, ，’亦與制動器裝置12〇a，同樣的具略有^ 繞旋轉軸122旋轉之安护於、有此-、構件124 —體以制動禮广定構件1〇2之制動構件⑵，乂制動構件m與支承構件106(緩度’限制主載台40與副載台7〇之相…)之間之間隙寬之相對移動可能範圍。 D上所述，在鎖止裝置1〇〇a〜載台5〇、70加以分別連接之狀離r未將主載台4〇與副載台5〇、70將主載台40、Γ參照圖17(A))下，副使用或Y輪方6 # 以既疋仃程驅動於X軸方向及/ 方向時，即使例如副載台50 4。依其慣性移動於X轴方向及/ :广止而主載台及Y軸方向，亦能藉由四 48 201100976 個 /動構件】2〗分別抵接於對應 4〇脫_载#5() ^支承構件1〇6,防止主載執〇 50 70 而移動（overrun)。又，於各制動器裝置12〇a，〜 ^ ^ ^ 及各支承構件1〇6之位置係讯定…’各制動構件121 承系叹疋為各制動構件121與各支承構件1 06之抵接面，例如所一、木例如圖17⑷及圖18(A)中代表性的 Ο ::，被配置在與包含主载台4〇之重心位置⑶…平千订之平面上。因此，使用各制動器裝置12如，〜_，、亦p使各制動構件121與各支承構件ι〇6抵接以使主載台 4〇之移動停止時’繞與其移動方向正交之軸之力矩（俯仰力矩）不會作用於主載台戰口 4〇,此防止主載台4〇之姿勢大幅度變亂。圖19中，顯示了制動構件121藉由未圖示之致動器繞旋轉軸122旋轉而從支承構件1〇6分離之狀態。圖η所示之狀態T ’副載自50、70可脫離主載台4〇 *在副載台導件37a、37b上分別移動於χ軸方向。此時，最好是使=前述一對定位裝置90(參照圖16(Α)、圖16(Β))使主载台帥靜〇止在一對主載台導件35上。又，本第4實施形態之場合，如圖15所示，由於間隙感測器66、86係分別相對對應之靶49a、49c配置在一X侧，副載台5〇、7〇可相對主载么 40僅於一X方向脫離主載台4〇移動。使副載台5〇、7〇脫 - 離主載台40之情形’例如有進行副載台50、70之維修保養之情形等。液晶曝光裝置2000之其他部分之構成，與前述第1實施形態之液晶曝光裝置10相同，並進行同樣的曝光動作如以上之説明，本第4實施形態之液晶曝光裝置2〇〇〇 49 201100976 除了光罩載台裝置MSTf之部分構成外，與前述第工實施形態之液晶曝光裝置10同樣的構成，因此能獲得同等之效果。除此之外，本第4實施形態之液晶曝光裝置2〇〇〇,由於具備與别述第3實施形態之液晶曝光裝置i 〇〇〇同樣構成之鎖止裝置100a〜100d，因此亦能與液晶曝光裝置1〇〇〇同樣的在不使用XVCM1、XVCM2及YVCM之情形下，將主載台40適當的驅動於X軸方向及/或γ軸方向。因此，作為XVCM1、XVCM2、YVCM可使用推力較小之小型者，如此，即能抑制電力消費、降低成本，又’本第4實施形態之液晶曝光裝置2000,由於係使用鎖止裝置1〇〇a、1〇〇b將主載台40與副載台50在二處、使用鎖止裴置i〇〇c、i〇〇d 將主載台40與副載台70在二處（合計四處）加以分別連接，因此，主載台40不會往02方向旋轉。又，由於鎖止裝置 l〇〇a〜100d之軸103移動於z軸方向，因此能迅速將主載台40與副載台5〇、7〇分別加以連接。又，本第4實施形態之光罩載台裝置MSTf，由於具有阳制主載。40分別與副载自5〇、7〇之相對移動可能範圍之制動器裝置因此能與前述第3實施形態之液晶曝光裝置1000同樣的，即使在例如副载台5〇、7〇緊急停止之情形等’亦能防止主載台4〇因其慣性而從副載台 50、70脫離。此外，在主載台4〇分別與副載台5〇、之接觸面設有緩衝墊123，因此能緩和碰撞時之衝擊。再者各制動器裝置120a，〜120d’與前述制動器裝置〜i2〇d不同的’其制動構件i2i並非固定，而能在限载α 40刀別與副載台5〇、7〇之相對移動之位置（限制 50 201100976 位置）#不限制該相對移動之位置（解除位置）之間移動。二藉由將制動構件】21配置在上述解除位置，亦能使主載口 4〇與副载台5〇、7〇分離。又，制動器裝置隱，〜 =〇d亦可上述情形相反的，將可動式制動構件設於主載、口將抵接於制動構件之構件設在副載台側。不過，採上述，可動構件之制動構件設於副載台之方式，可使主載台輕罝化’因此較佳。《第5實施形態》，广、說明第5實施形態之液晶曝光裝置。第5實施 < “之液曰曰曝光裝置，除了在與主載台之間進行光罩轉接之光罩裝载裝置設於光罩載台裝置之點、以及分別支承一對=載台之—對引導部較第4實施形態（及第i至第3實施形態)在X軸方向較長之點外，與第4實施形態之液晶曝光裝置2000具有同樣之構成。以下，僅說明光罩裝載裝置之構成又，為簡化說明及便於圖示，與上述第1、第4實施形態相同或同等之構成部分係使用同一符號並省略其說圖20係第5實施形態之光罩载台裝置MSTg之俯視圖。又’從避免圖面錯綜複雜之觀點，鎖止裝置1〇〇a〜 io〇d、制動器裝置120a’〜120d，、間隙感測器66、67、86、 87、無49a〜49d(分別參照圖15)等皆省略圖示。光罩裝载裝置ML具備一對光罩保持裝置13〇。一對光罩保持裝置130之一方搭載於副載台5〇之γ載台55上面、另方則搭載於副載台70之Y載台75上面。一對光罩保持裝置1 30，除了相對X轴成對稱（左右對稱）之點外，其構 51 201100976 以下’說明搭載於副載台斗，之光罩保圖係圖20之B_B線剖面圖。光罩保持裝置⑽， ;1:不’具有可動構件131及支承構件135。可動構二係以* ^平面平行之矩形板狀構件構成(參照圖盖可動構件131下端固定有於χ軸方向分離配置之一 =件132。光罩裝載裝置ML ’由—γ側之光單保持裝 =以一對爪構件132從下方支承光罩Μ(或者未圖示之罩保持具)之—γ側，+γ側之光罩保持裝置⑽以一對 2構件⑴從下方支承光罩μ之+ γ側。可動構件131，女γ側之面，在於χ軸方向分離之狀態（參照圖叫固定有延設於ζ軸方向之一對ζ線性導件133。如圖2〇所示，支承構件135係由與可動構件131之— 對向、與灯平面平行之矩形板狀構件構成。於支 # 5之+γ側之面之四個角，分別固定有剖面U字形之滑件136(參照圖21)β四個滑件136 一側之ζ線性導件133，—χ側之二個二個側之2線性導件133。此外，於可動構件131與支承構件 ⑴之間設有例如包含進給螺桿裝置之驅㈣置⑴。可動 :件m透過驅動裝置134對支承構件135進行上下動(驅於+ Z方向或—Z方向）。支承構件135透過剖面L字形 =對固定構件137及與χγ平面平行之—對連接構件138 ^在Υ載台55上一對連接構件138係被以^方向為 —邊方向之矩形板狀之補強構件139加以連接。又，由於副載台7"交副載台50位於—2側，因此—γ側之固定構件 52 201100976 137較+ Y側之固定構件137在z軸方向之尺寸長（為方便起見’使用了相同符號）。此處，如圖22所示，第5實施形態之光罩載台跋置 MSTg，各引導部33 8a、33 8b之X軸方向長度被設定為較第4實施形態長’副載台5〇、7〇可分別將透過光罩装載事置ML保持之光罩μ搬送至既定光罩更換位置。本第5實施形態中’光罩更換位置係較例如掃描曝光時主載台移動之區域更靠一X側。此外，使用副載台5〇、7〇將光罩Μ C)搬送至光罩更換位置時，如圖19所示，係制動器裝置12〇a，〜12〇d’（參照圖15)之各制動構件121從支承構件1〇6分離、且鎖止裝置l〇〇a〜 100d(參照圖15及部刚從各卡合構件m分離之狀態。又，使定位裝置9〇(參照圖16(八）及圖16(B))使主載台40靜止在一對主載台導件35上。 /、次’說明在光罩裝载裝置ML與主載台4〇之間進行之光罩Μ之轉接動作。以下續日月十止s μ 〇 , m ^ 下珑月之先罩％之轉接動作係在都“… 衮置之“里下進仃。主控制裝置藉由將副The pad is omitted from the illustration). A predetermined gap is formed between each of the cushion pads 123 on the + 乂 side, the -X L+Y side, and the -Y side of the support structure #iG6 and the brake member 121, respectively. 7 In the state shown by X::, the main stage 40 is opposed to the sub stage 5. When moving to the axis direction and/or the γ-axis direction, the movement between the main stage 4〇 and the sub-stage 5〇 (曰, Υ, Υ Υ) (ie, in the horizontal plane) The gap width formed is limited. In addition, the figure shows the brake device 12〇c, 'also with the brake device 12〇a, the same with a slight rotation around the rotating shaft 122, with this, the member 124 body to brake the ceremony The relative movement range of the gap width between the brake member (2) of the member 1〇2, the brake member m and the support member 106 (the retardation 'limits the phase between the main stage 40 and the sub-stage 7〇). As described above, in the case where the lock devices 1A1 to 5, 70 are connected to each other, the main stage 4 and the sub-stages 5, 70 are not used, and the main stage 40 and Γ are referred to. In Fig. 17(A)), when the sub-use or the Y-wheel 6# is driven in the X-axis direction and/or the direction, for example, the sub-mount 50 4 is used. According to its inertia, it moves in the X-axis direction and/or: the main stage and the Y-axis direction can also be abutted by the corresponding 4 〇 _ _ #5() by four 48 201100976 / moving parts] 2 ^ Support member 1〇6, preventing the main load from being forced to 50 70 and overrun. Further, the position of each of the brake devices 12A, φ^^ and each of the support members 〇6 is determined... 'The brake members 121 are sighed to abut each of the brake members 121 and the support members 106. The surface, for example, the wood, for example, the representative Ο :: in Fig. 17 (4) and Fig. 18 (A), is disposed on a plane that is at the center of gravity (3) of the main stage 4 . Therefore, each of the brake devices 12, such as _, y, p, abuts each of the brake members 121 and the respective support members ι 6 so as to stop the movement of the main stage 4 ' about the axis orthogonal to the direction of movement. The moment (pitching moment) does not act on the main carrier's armpit 4〇, which prevents the posture of the main stage 4〇 from being greatly disordered. Fig. 19 shows a state in which the brake member 121 is separated from the support member 1A by the rotation of the rotary shaft 122 by an actuator (not shown). The state T' shown in Fig. n is carried from 50, 70, and can be separated from the main stage 4*. The sub-stage guides 37a, 37b are respectively moved in the x-axis direction. At this time, it is preferable that the pair of positioning devices 90 (see Figs. 16 (Α) and Fig. 16 (Β)) are placed so that the main stage is stationary on the pair of main stage guides 35. Further, in the case of the fourth embodiment, as shown in Fig. 15, the gap sensors 66 and 86 are disposed on the X side with respect to the corresponding targets 49a and 49c, respectively, and the sub-stages 5, 7 are opposite to each other. The load 40 is moved away from the main stage 4 in only one X direction. In the case where the sub-stages 5, 7 are removed from the main stage 40, for example, the maintenance of the sub-stages 50, 70 is performed. The configuration of the other portions of the liquid crystal exposure apparatus 2000 is the same as that of the liquid crystal exposure apparatus 10 of the first embodiment, and the same exposure operation is performed as described above. The liquid crystal exposure apparatus of the fourth embodiment is not limited to 201100976. The configuration of the mask stage device MSTf is the same as that of the liquid crystal exposure device 10 of the above-described embodiment, and the same effect can be obtained. In addition, the liquid crystal exposure apparatus 2 of the fourth embodiment of the present invention can also be provided with the locking devices 100a to 100d having the same configuration as the liquid crystal exposure device i of the third embodiment. Similarly, in the case of not using XVCM1, XVCM2, and YVCM, the liquid crystal exposure apparatus 1 appropriately drives the main stage 40 in the X-axis direction and/or the γ-axis direction. Therefore, as the XVCM1, XVCM2, and YVCM, it is possible to use a small-sized person with a small thrust, and thus it is possible to suppress the power consumption and reduce the cost. In the liquid crystal exposure apparatus 2000 of the fourth embodiment, the locking device 1 is used. a, 1〇〇b, the main stage 40 and the sub-stage 50 are in two places, and the main stage 40 and the sub-stage 70 are placed in two places using the lock sets i〇〇c, i〇〇d (total of four places) ) are connected separately, so the main stage 40 does not rotate in the 02 direction. Further, since the shaft 103 of the lock devices l〇〇a to 100d moves in the z-axis direction, the main stage 40 and the sub-stages 5A and 7B can be quickly connected. Further, the mask stage device MSTf of the fourth embodiment has a male master load. In the same manner as the liquid crystal exposure device 1000 of the third embodiment, the brake device can be used in the same manner as the liquid crystal exposure device 1000 of the third embodiment, for example, even in the case where the sub-stages 5, 7 are urgently stopped. It is also possible to prevent the main stage 4 from being detached from the sub-stages 50, 70 due to its inertia. Further, since the cushion pad 123 is provided on the contact surface between the main stage 4 and the sub-mount 5, respectively, the impact at the time of collision can be alleviated. Further, the brake devices 120a, 120d' are different from the above-described brake devices ii2〇d, and the brake member i2i is not fixed, but can be moved relative to the sub-carriers 5, 7 Position (limit 50 201100976 position) #Do not limit the movement between the relative movement position (release position). By disposing the brake member 21 at the above-mentioned release position, the main carrier port 4〇 can be separated from the sub-stages 5A and 7〇. Further, the brake device is hidden, and ==〇d may be reversed in the above case, and the movable brake member may be provided on the sub-stage side with the main load and the member that abuts against the brake member. However, as described above, the brake member of the movable member is provided on the sub-stage so that the main stage can be lightened, which is preferable. <<Fifth Embodiment>> A liquid crystal exposure apparatus according to a fifth embodiment will be described. In the fifth embodiment, the liquid-liquid exposure apparatus includes a photomask loading device that performs mask switching between the main stage and the photomask loading device, and a pair of support stations. The guide portion has the same configuration as the liquid crystal exposure device 2000 of the fourth embodiment except that the fourth embodiment (and the i-th to the third embodiment) are longer in the X-axis direction. Hereinafter, only the light will be described. In addition, for the sake of simplification of description and convenience of illustration, the same or equivalent components as those of the above-described first and fourth embodiments are denoted by the same reference numerals, and the reticle stage of the fifth embodiment is omitted. The top view of the device MSTg. In addition, from the point of view of avoiding the intricacy of the drawing, the locking devices 1A to io〇d, the brake devices 120a' to 120d, the gap sensors 66, 67, 86, 87, and 49a are not included. 49d (refer to FIG. 15 respectively) and the like are omitted. The mask loading device ML includes a pair of mask holding devices 13A. One of the pair of mask holding devices 130 is mounted on the y-stage 55 of the sub-mount 5〇. The upper side and the other side are mounted on the Y stage 75 of the sub-stage 70. A pair of masks In addition to the point that the holding device 1 30 is symmetrical (left-right symmetrical) with respect to the X-axis, the structure of the holding device 51 201100976 is described below as a cross-sectional view taken along the line B_B of Fig. 20, which is mounted on the sub-stage hopper. The device (10), 1:1 does not have the movable member 131 and the support member 135. The movable second structure is constituted by a rectangular plate-shaped member having a plane parallel to each other (refer to the lower end of the movable member 131 of the figure cover, which is fixed in the side of the y-axis direction) = member 132. The mask loading device ML' is held by the optical sheet holder on the - γ side = the γ side, the + γ side of the mask Μ (or the hood holder not shown) is supported by the pair of claw members 132 from below. The mask holding device (10) supports the + γ side of the mask μ from below by a pair of two members (1). The movable member 131 and the female γ side face are separated in the z-axis direction (refer to the figure and fixed to the ζ) One of the axial directions faces the linear guide 133. As shown in Fig. 2A, the support member 135 is composed of a rectangular plate-like member that opposes the movable member 131 and is parallel to the lamp plane. The four corners of the side surface are respectively fixed with a U-shaped slider 136 (refer to FIG. 21) β four The linear guide 133 on one side of the slider 136, and the two linear guides 133 on the two sides of the side of the slider 136. Further, between the movable member 131 and the support member (1), for example, a drive including a feed screw device is provided. (4) Set (1). Movable: The member m is moved up and down (driving in the +Z direction or the -Z direction) through the driving device 134. The supporting member 135 is transmitted through the cross-sectional L-shape = parallel to the fixing member 137 and the χ γ plane - The connecting member 138 is connected to the pair of connecting members 138 on the crucible table 55 by a rectangular plate-shaped reinforcing member 139 whose direction is the side direction. Further, since the sub-stage 7" the sub-stage 50 is located on the -2 side, the fixing member 52 201100976 137 on the -γ side is longer in the z-axis direction than the fixing member 137 on the + Y side (for convenience) The same symbol). Here, as shown in Fig. 22, the mask stage of the fifth embodiment is placed in the MSTg, and the lengths of the respective guide portions 338a and 338b are set to be longer than the fourth embodiment. The photomask μ held by the mask loading device ML can be transported to a predetermined mask replacement position, respectively. In the fifth embodiment, the mask replacement position is closer to the X side than, for example, the region where the main stage is moved during scanning exposure. Further, when the mask Μ C) is transported to the reticle replacement position by the sub-mounts 5 〇 and 7 ,, as shown in Fig. 19, each of the brake devices 12 〇 a, 〜 12 〇 d' (see Fig. 15) is attached. The brake member 121 is separated from the support member 1A, and the lock devices 10a to 100d (see FIG. 15 and the state immediately separated from each of the engagement members m. Further, the positioning device 9 is turned (refer to FIG. 16 (refer to FIG. 8) and FIG. 16(B)), the main stage 40 is stationary on the pair of main stage guides 35. /, 'description' shows the mask between the mask loading device ML and the main stage 4〇. The transfer action of Μ 以下以下以下以下以下以下以下以下以下以下以下以下以下 m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m m

載σ 50、70分別驅動於—X 圖22所- a/· 、使光罩裝载裝置]ViL如圖22所不的位於光罩更更換位置，以例如- 裝置紙在光罩罩(省略圖亍）㈣光罩搬送裝置更換所保持之光保持有新的光罩乂之来置世讲#教戰於爪構件132上。 Χ| 、裝置紅，由於副載台5〇、請。此時::件位於主载台4〇之上方(參照位於往z轴方向可動_之+2(免#與主載台40接觸，係十乙側（參照圖21)。 53 201100976 接者’如圖2Va、私- 保持光罩Μ之-討if動裝置Μ參照圖2〇)將 131下降。春昭牛131驅動於一Z方向（可動構件參“，'圖23(A)之箭頭如此，光罩M 於夾頭單元42 j： . 丨饭衮戰上。此時，可動構件13 1、Z線性導件133 等構成光罩裝裁梦番Α/ΓΤ办术I导仵133 、各構件，皆與主载台40為非接一时_控制裝置，如圖23(B)所示，在將光罩M裝載於爽頭早①42上後，亦將可動構件131驅動於—Z方向以使與光罩M分離。此狀態下，由於可動構件131 _ 興先罩“並未接觸，因此能防止來自外部之振動、i由田Ij載台50、70、光罩裝載裝置紅等傳遞至光罩 M。主控制袭置，在圖23⑻所示狀態、亦即在光罩裝載裝置-皆未與光罩μ主載台4〇接觸之狀態下，進行曝光處理動作。又，將主載台4G所保持之光罩Μ轉交至光罩裝載裝置ML時’係進行與上述情形相反之動作。The load σ 50, 70 is respectively driven by -X Fig. 22 - a / ·, so that the reticle loading device] ViL is located at the reticle replacement position as shown in Fig. 22, for example - the device paper is in the hood (omitted Fig.) (4) The light held by the replacement of the mask transport device is kept with a new mask, and the game is taught on the claw member 132. Χ|, device red, because the sub-stage 5 〇, please. At this time: the piece is located above the main stage 4〇 (refer to the +2 in the direction of the z-axis (the # is not in contact with the main stage 40, and is the side of the tenth side (refer to Figure 21). 53 201100976 Receiver' As shown in Fig. 2Va, the private-holding mask, the device is lowered, and the 131 is lowered. The spring Zhaoniu 131 is driven in a Z direction (movable member reference ", the arrow of Fig. 23(A) The mask M is on the chuck unit 42 j: . The rice cooker is on the battle. At this time, the movable member 13 1 , the Z linear guide 133 , and the like constitute a reticle-mounted dream Α Α Α Α 仵仵仵仵 133 When the components are not connected to the main stage 40, the control device, as shown in Fig. 23(B), drives the movable member 131 in the -Z direction after the photomask M is loaded on the cool head 142. Separating from the mask M. In this state, since the movable member 131 _ the front cover "is not in contact, it is possible to prevent vibration from the outside, i can be transmitted to the light by the Ij stage 50, 70, the mask loading device red, or the like. The cover M is subjected to an exposure control operation in a state shown in Fig. 23 (8), that is, in a state where the mask loading device is not in contact with the mask μ main stage 4A. When held, the main reticle stage 4G Μ transmitted to the reticle loading apparatus ML 'line to the contrary action of the above case.

根據第5實施形態之光罩載台裝置MSTg，由於可使搭載光罩裝載裝iML之副載台5〇、7()與主心4Q 動至光罩更換位置’與例如主載台4G本身移動至光罩更換位置之情形相較，可縮短引導主載台40之移動之主载台導件35之X軸方向長度（尺寸）。《第6實施形態》接著，說明第6實施形態之液晶曝光裝置。第6實施形態之液晶曝光裝置’除光罩载台裝置所具備之光罩二裝置之構成不會同、以及支承一對副載台之引導部與第$ 實施形態相較在X軸方向較長之外，與第5實施形態之液晶曝光裝置具有同樣之構成。以下，⑨明光罩裝載裝置之 54 201100976 之部八針對與上述第4及第5實施形態具有同樣構成省略:說日賦予與上述第4及第5實施形態相同之符號，圖 2 4孫结，& 圖。光罩農栽形=罩載台裝"STh之俯視邱心, MLb’具備與副載台5G—祕載在引導〇 a之搬送用載台250、與副載台70 一起搭载在引部:上之搬送用載台27〇、以及一對光罩保持裝置⑽。 Ο ❹ ^ 250 栽〇 250配置在副載台5〇之~ X側。搬送用載口㈣，除Μ方向之尺寸被設定為略短、以及沒有又固 == 承感測器66、67(分別參照圖15)外，包含其驅 ” ” 1、，與副載台50同樣構成。亦即，搬送㈣，具有在引導部伽上移祕Χ軸方向U载台以及在X載台254上移動於Y軸方向之γ載台255。台254於X轴方命夕/According to the mask stage device MSTg of the fifth embodiment, the submounts 5, 7 () and the center 4Q of the mask mounting apparatus iML can be moved to the mask replacement position ', for example, the main stage 4G itself. In the case of moving to the mask replacement position, the length (size) in the X-axis direction of the main stage guide 35 that guides the movement of the main stage 40 can be shortened. <<Sixth Embodiment>> Next, a liquid crystal exposure apparatus according to a sixth embodiment will be described. In the liquid crystal exposure apparatus of the sixth embodiment, the configuration of the mask 2 device included in the mask holder device is different, and the guide portions for supporting the pair of sub-stages are longer in the X-axis direction than in the first embodiment. The liquid crystal exposure apparatus of the fifth embodiment has the same configuration. In the following, the fourth embodiment of the present invention is the same as the above-described fourth and fifth embodiments, and the same reference numerals are given to the fourth and fifth embodiments, and FIG. & figure. Photoreceptor planting type = hood loading table mounting "STh overlooking Qiu Xin, MLb' is equipped with the sub-stage 5G - the carrier is carried on the transfer table 250 and the sub-stage 70 is mounted on the lead-in stage : The upper transfer stage 27〇 and a pair of mask holding devices (10). Ο ❹ ^ 250 Planting 250 is placed on the side of the sub-stage 5〇~X. The transport port (4) is set to be slightly shorter in the direction of the squatting direction, and the squeezing device 66, 67 (refer to FIG. 15 respectively) includes the drive "", and the sub-stage 50 is also composed. That is, the transport (4) has a y-stage 255 that moves in the guide axis direction U stage and a shift on the X stage 254 in the Y-axis direction. Table 254 on the X-axis side of the sun /

線性…：與χ標尺53 一起構成X 碼15之Χ讀頭258加以測量，Υ載台255於丫軸方向之位置資訊則由與γ標尺264 一起構成Υ線性編瑪器之 Υ讀頭259加以測量。搬送用載台25〇係以未圖示之裝置’與副载台50分開獨立的於引導部仙上控制盆位工搬送用载台270配置在副载台7〇之-X側。搬送用載。270⑸X轴方向之尺寸被設定為略短、以及沒有X固定子85、Y固定子88、間隙感測器％、87(分別參照圖外:包含其驅動系、測量系，與副載台70同樣構成。亦搬送用載台270，具有在引導部侧上移動於X軸方 X載台274、與在X載台274上移動於γ軸方向之… 載台274於X轴方向之位置資訊係由與χ標尺戟二 55 201100976 於成X線性編碼器之X讀頭278加以測量，γ載台275 =方向之位置資訊則由與υ標尺起構成X線性碼器之Υ讀頭279加以測量。搬送用载台270係以未圖不之主控制裝置，與副載台7〇分開獨立的在引導部侧上控制其位置。 -對光罩保持裝置⑼，其卜方固定在Υ載台⑸ =二方則固定在Υ載台275上面。又，-對光罩保持裝置130之構成由於^ ' …、上述第5實施形態實質相同，因此：：其軏明。此外’如圖24所示，於光罩載台裝置MSTh， L * 4如、4鳩係分別形成為較上述第5實施形態之弓ί 導部在+Χ、一X方向更長。接著，說明於本第6實施形態之光罩載台裝置⑽几，在主載台40與光罩|載裝置㈣之間進行之光罩μ =:光罩Μ之轉接動作係在未圖示之主控制裝置之管理下進行。 θ 在將先罩Μ轉交至主載台4〇時，主控制裝Linear...: The head 258, which constitutes the X code 15 together with the χ scale 53, is measured, and the position information of the 255 in the yaw axis direction is composed of the readable head 259 which constitutes the 编 linear coder with the γ scale 264. measuring. The transporting stage 25 is disposed on the -X side of the sub-stage 7A by a device (not shown) that is separate from the sub-stage 50 and is independent of the guide unit. Transfer the load. 270 (5) The dimension in the X-axis direction is set to be slightly shorter, and there is no X stator 85, Y stator 88, and gap sensors %, 87 (refer to the outside of the figure: including the drive system and the measurement system, and the same as the sub-stage 70) The transport stage 270 has a position information system that moves on the X-axis X stage 274 on the guide portion side and moves in the γ-axis direction on the X stage 274 in the X-axis direction. It is measured by the X read head 278 of the Yucheng X linear encoder with the χ 戟 55 25 55 201100976, and the position information of the γ stage 275 = direction is measured by the read head 279 which constitutes the X linear coder from the υ scale. The transfer stage 270 is controlled by a main control device (not shown), and is controlled independently of the sub-mount 7 在 on the guide unit side. - The mask holder (9) is fixed to the cymbal stage (5) = The two sides are fixed on the top of the stacking table 275. Further, the configuration of the mask holding device 130 is substantially the same as that of the fifth embodiment described above, and therefore: The mask holder stage devices MSTh, L*4, and 4鸠 are respectively formed as compared with the fifth embodiment. The guide portion of the bow is longer in the +Χ and X directions. Next, the light of the mask stage device (10) of the sixth embodiment between the main stage 40 and the mask/carrier (4) will be described. Cover μ =: The transfer operation of the mask is performed under the management of a main control unit (not shown). θ When the hood is transferred to the main stage 4 ,, the main control unit

24所示之保持有光罩Μ之光罩裝載裝置似位於光罩J 位置。先罩裝載裝置㈣在光罩更換位置’以例如未圖示之光罩搬送裝置進行所保持之光 · 置使副載台5〇、7〇盘主載么40八離更換。又’主控制裂 η 使其較主載台4〇更位於+Χ側。本第6實施形態中，用以測：與副載台5°、7°在χ轴及γ轴方向之間隔所使用之測盗及乾（分別名略圖示）之配置，與上述第4實施形態（參照圖15)相反的’各間隙感測器係配置在對應之靶之: (省略圖示）°如此’副載台5〇、7〇即能離開主載台40而^ 56 201100976 + χ方向移動。接著如圖25所不，主控制裝置控制X線性馬達將保持有光罩Μ之光罩裝载震置MLb驅動於+ χ方向，使、位於主載台40之上方。之後’與上述第5實施形態同樣的，如圖23⑷及圖23⑻所示，光罩裝載裝置腸之可動構件⑴往下方移動，光罩Μ被交至夾頭單元42。之後’如圖26(A)所示，主控制裝置控㈣γ線性馬達將 Υ载台2 5 5驅動於—V * X , I狀Y方向、將Y載台275驅動於+ Y方向，，可動構件131(爪構件132)從光罩Μ分離（參照圖26(Α)之箭頭）。接著，主控制裝置控制驅動裝i 134(參照圖Μ)，如圖26(B)所7^，將一對可動構件131分別驅動於上方（+z 方向）直到爪構件132之下面到達較主載台40上面更上方之位置（參照圖26(B)之箭頭）。接著’如圖27所示，主控制裝置控制χ線性馬達將光罩裝載裝置MLb驅動於-X方向使其位於光罩更換位置，並將Μ載台50、70分別驅動於—χ方向，以和光罩裝載裝置MLb互換之方式，使其位於主載台4〇之_ γ側、側。之後，將主載台40分別與副載台5〇、7〇以非接觸狀態（電磁方式）、或接觸狀態（機械方式）加以連結，使用副载台、 7〇將主載台40驅動於X軸方向，據以進行掃描曝光動作。又引導部438a、438b之長度係被設定為於掃描曝光中，在主載台40於其移動範圍内移動時，副載台5〇、7〇不會與光罩裝载裝置MLb之各搬送用載台25〇、27〇接觸。根據以上説明之第6實施形態之光罩載台裝置MSTh，除上述第5實施形態之光罩載台裝置MSTg可獲得之效果 57 201100976 外，由於光罩裝載裝置MLb之— 和副載台50、7〇不同之另,先罩保持裝置13〇係以分別驅動於X軸方向，因此之搬送用載台250、270 乃a si此此將副栽台5〇、7〇量化’減輕用以驅動副載台5〇、7〇之 “】予以輕本第ό實施形態之光罩載A ^ ，'、之負載。又，艽卓載口裝置MSTh中， MLb之一對光罩保持裝置先罩裝載裴置丹裝置130,如圖26(a) 副載台50、70同樣構成之搬送用載台雖係以和於Y軸方向，但不限於此，# 〇分別驅動於此例如作為僅使搬送用載台移動於X軸方向之構成，可將光罩將九罩保持裝置130之連接構件叫參照圖24)構成為能於Μ方向㈣，或者於該X軸方向移動之載台上’將光罩保持裝置13G驅動於γ 軸方向。《第7實施形態》其次，根據圖28〜圖31説明第7實施形態。此處，與前述第1實施形態相同或同等之構成部分，係使用與第! 實施形態相同或類似符號，並並簡化或省略其說明。圖28中概略的顯示了第7實施形態之液晶曝光裝置 3〇〇〇之構成。液晶曝光裝置3〇〇〇係步進掃描方式之投影曝光裝置、所謂之掃描機。本帛7實施形態之液晶曝光裝置 3 000，除了在光罩載台裝置MSTi設有用以對一對副載台供應動力等所使用之後述纜線單元等，與前述第丨實施形態之液晶曝光裝置10有所差異，其他部分之構成則與液晶曝光裝置1 0相同。因此，以下係以差異點為中心進行説明。本第7實施形態之液晶曝光裝置3〇〇〇，如圖28所示，於光罩載台裝置]VlSTi所具備之各副載台導件37a、37b設 58 201100976 有用以對副载台50、70供應動力、例如電力、高壓氣體（例如壓縮空氣）等之纜線、管線等（以下，總稱為纜線類99)，或包含用以在副載台50、70與未圖示之主控制裝置之間進行電氣訊號之收發訊之纜線類之同樣構成之纜線單元3〇〇。圖29係纜線單元之侧視圖、圖3〇係圖29之c 一 C線剖面圖。如圖30所示，纜線單元3〇〇具有由固定於副載台 50之X載台54之剖面^字形之板狀構件構成之支承部 201。於支承部201下面，固定有於γ軸方向分離之一對板狀構件構成之軸承部202 ’於軸承部202，如圖29所示，透過分別以Y軸方向為軸方向之一對旋轉軸2〇4，將在X 軸方向分離之一對滾輪203支承為可旋轉。又，纜線單元 300具有滾輪206，此滾輪206被軸支在橫跨於+ χ側及— X側之一對脚部39a(+Y側之各脚部隱藏在圖面内側）間固定之軸205而能旋轉。線束99a、99b之複數個纜線類 99 ’如圖30所示，係於γThe reticle loading device shown in Fig. 24 holding the reticle is located at the reticle J position. The hood loading device (4) performs the holding of the light at the reticle replacement position by, for example, a reticle transfer device (not shown), so that the sub-mount 5 〇, 7 〇 main load 40 is replaced. Further, the main control split η is placed on the +Χ side more than the main stage 4〇. In the sixth embodiment, the measurement and the use of the thief and the dry (as shown in the figure) for the distance between the sub-stage 5° and the 7° in the x-axis and the γ-axis direction are measured, and the fourth In the embodiment (see Fig. 15), the respective gap sensors are arranged in the corresponding targets: (not shown). Thus, the sub-stages 5〇 and 7〇 can be separated from the main stage 40. ^ 56 201100976 + χ Move in the direction. Next, as shown in Fig. 25, the main control unit controls the X linear motor to drive the reticle loading MLb holding the reticle to the + χ direction so as to be located above the main stage 40. Then, similarly to the fifth embodiment, as shown in Figs. 23 (4) and 23 (8), the movable member (1) of the intestine of the mask loading device moves downward, and the mask is transferred to the chuck unit 42. Then, as shown in Fig. 26(A), the main control unit controls the (four) γ linear motor to drive the Υ stage 255 to -V * X , the I-shaped Y direction, and the Y stage 275 in the +Y direction, which is movable. The member 131 (the claw member 132) is separated from the mask ( (refer to the arrow of Fig. 26 (Α)). Next, the main control device controls the drive unit 134 (see FIG. 26), and as shown in FIG. 26(B), the pair of movable members 131 are respectively driven upward (+z direction) until the lower side of the claw member 132 reaches the main controller. The position above the upper surface of the stage 40 (refer to the arrow of Fig. 26 (B)). Then, as shown in FIG. 27, the main control device controls the linear motor to drive the mask loading device MLb in the -X direction to be in the mask replacement position, and drives the cassettes 50, 70 respectively in the -χ direction to It is interchanged with the reticle loading device MLb so as to be located on the side of the main stage 4 γ γ side. Thereafter, the main stage 40 is connected to the sub-stages 5〇 and 7〇 in a non-contact state (electromagnetic mode) or a contact state (mechanical mode), and the main stage 40 is driven by the sub-stages and 7〇. The X-axis direction is used to perform a scanning exposure operation. Further, the lengths of the guiding portions 438a and 438b are set to be in the scanning exposure, and when the main stage 40 moves within the moving range, the sub-mounts 5, 7 are not transported to the mask loading device MLb. Contact with 25 〇, 27 载 on the stage. According to the mask stage device MSTh of the sixth embodiment described above, in addition to the effect 57 201100976 available in the mask stage device MSTg of the fifth embodiment, the mask loading device MLb and the sub-mount 50 In addition, the first cover holding device 13 is driven to drive in the X-axis direction, so that the transfer stages 250, 270 are used to quantify the sub-plants 5, 7 The drive sub-stage 5〇, 7〇"] is used to light the load of the photomask carrying A ^ , ', and the load of the 艽b, the MLb is the first to the reticle holding device. As shown in Fig. 26 (a), the transfer carrier is configured in the same manner as the sub-stages 50 and 70. The transfer stage is not limited to this, and ## is driven here, for example, as The configuration in which the transfer stage is moved in the X-axis direction can be configured such that the connection member of the hood holding device 130 is referred to as FIG. 24) in the Μ direction (four) or on the stage that moves in the X-axis direction. 'The mask holding device 13G is driven in the γ-axis direction. <<Seventh embodiment>> Next, according to Fig. 2 8 to 31. The seventh embodiment is the same as or equivalent to the first embodiment, and the same or similar reference numerals are used, and the description thereof will be simplified or omitted. The liquid crystal exposure apparatus 3 of the seventh embodiment is shown. The liquid crystal exposure apparatus 3 is a step-and-scan type projection exposure apparatus, and a so-called scanner. The liquid crystal exposure apparatus 3 of the embodiment 7 In addition to the use of the cable unit or the like which is used to supply power to a pair of sub-stages, the reticle stage device MSTi is different from the liquid crystal exposure device 10 of the first embodiment, and the other parts are configured. The liquid crystal exposure apparatus 10 is the same as the liquid crystal exposure apparatus 10. The liquid crystal exposure apparatus 3 of the seventh embodiment is shown in Fig. 28, and is used in the mask stage apparatus VlSTi. The sub-stage guides 37a and 37b are provided. 58 201100976 There are cables, pipelines, etc. for supplying power to the sub-stages 50 and 70, such as electric power, high-pressure gas (for example, compressed air), etc. (hereinafter, total It is a cable type 99) or a cable unit 3 which is similarly constructed to include a cable for transmitting and receiving electrical signals between the sub-stages 50 and 70 and a main control unit (not shown). A side view of the 29-series cable unit, and Fig. 3 is a cross-sectional view taken along line c-C of Fig. 29. As shown in Fig. 30, the cable unit 3A has a profile of the X stage 54 fixed to the submount 50. a support portion 201 formed of a plate-shaped member of a shape of a shape. On the lower surface of the support portion 201, a bearing portion 202' which is formed by separating one of the pair of plate-like members in the γ-axis direction is fixed to the bearing portion 202, as shown in Fig. 29, The pair of rollers 203 are rotatably supported by the pair of rotating shafts 2〇4 in the Y-axis direction as one of the axial directions. Further, the cable unit 300 has a roller 206 which is axially supported between a pair of leg portions 39a (the sides of the +Y side are hidden inside the drawing surface) across the + χ side and the -X side. The shaft 205 is rotatable. A plurality of cable types 99' of the wire harnesses 99a, 99b are shown in Fig. 30 and are tied to γ.

纜線類9 9在副載台5 0上分岐，其_ 又，纜線單元300具有由配置在副載台5〇之+ 乂側之複數個纜線類99構成之纜線束99a、與由配置在副載台5〇之—X側之複數個纜線類99構成之纜線束99b。構成各纜 .於Y載台55之複數個部分連接於X載台54、 59 201100976 或主載台40(參照圖28)。 + X側之纜線束99a，如圖29 裝置側）之申間部分以固定構件22 、端側（外部 39a。又，纜線束99a之較固定於疋於+ X側之脚部之中間部分則以固定構件22〇固a: 3^之部分靠-端側 U固疋於滾輪206之外用品進一步的，緵線束99a之較固定於上述滚輪鳩之部端側之中間部分，以複數個固定構件22〇固定於―：： 203中之+ x側滾輪203之外周面。I線束99a之固= 輪寫之部分與固定於滾輪203之間之區域，在 = 二=台5。位於X轴方向之移動範圍中央向下方彎曲（因重力而垂下）。一卜係又，繞線束⑽之較固定於滾輪2〇3之部分靠—端側之二:’如/ Μ所示’ f曲成U字形且通過形成在支承部201 開口 4 20U之内部空間，其端部（一端）連接於 ^如圖30所示，缓線束99a之較固定於滾輪2〇3 : 罪-端側之區域’以固定構件22〇固定於支承部2〇1。又，各固定構件220，如圖30中代表性的邮_ 绫“。 '表^生的所不’係對應構成纜 ▲束99a之複數個i線類99,由複數個構件構成。— 之纜線束99b亦同樣的，其長邊方向固定於滾輪2。3、2。6。白之-處中間部分分別其:欠，針對副載台50從圖29所示位置（中央位置）往+ 側移動之情形，說明鏡線單元300之—動作例。如圖Η 所不，當副載台50往+ X方向移動時，固定於1載台Μ 之支承部2〇1及軸承部202 一體的往+ 乂方向移動，對口庫於此，其中間部分固定於-X側滾輪203之纔線束_即被拉 60 201100976 向+ X側。另一方面，+ X側之纜線束99a則因+ χ側滾輪 203與+ X側滾輪206彼此接近而更向下方彎曲（因重力而垂下）。此時，一對滾輪203、一對滾輪206分別擺動（往0 y方向旋轉既定量），據以防止大的彎曲應力作用於構成纜線束99a、99b之各纜線類99。又，當副載台5〇往—χ方向移動時，與圖31所示情形相反的，纜線束99b往下方彎曲、纜線束99a則被拉向一 X方向。〇 ❹ 液晶曝光裝置3000之其他部分之構成與前述第形態之液晶曝光裝置1 〇相同，並進行同樣的曝光動作如以上之説明，本第7實施形態之液晶曝光裝置3〇〇〇，除了於光罩載台裝置MSTi設有纜線單元3〇〇外，與前述第 1實施形態之液晶曝光裝置1〇具有同樣構成，因此能獲得同等效果。除此之外，本第7實施形態之液晶曝光裝置3〇〇〇所具備之光罩載台裝置MSTi，自於包含在副載自5〇、與外部裝置之間進行動力傳達之纜線類99之各纜線束 99a、99b’其固定於滚輪203、206之間之區域隨副載台5〇、之移動而因重力作用向下方彎曲、或被拉向水平方向，因此能防止纜線類99與其他構件間之滑動而產生塵塵、或產生振動。承上所述’本第7實施形態之蜆線單元则特別適合如液晶曝光裝置3000(參照圖28)等，在無塵室内使用之裝置、或須以高精度進行移動體之位置控制之裝置。此外，由於在I線束99a、99b往下方彎曲、或被拉向水平方向時，滾輪203、2〇6分別旋轉而抑制了大㈣曲應力作用於構成規線束99a、99b之鐵線類99,因此能避免例如管料折而造成管路閉塞等之故障。再者，本第7實施形離 61 201100976 之纜線單元300不具有支承纜線類99之中間部分之構件因此較輕、且纜線類99之更換作業等維修保養較容易。《第8實施形態》接著，說明第8實施形態之液晶曝光裝置所具有之光罩載台裝置。本第8實施形態之液晶曝光裝置與上述第7 實施形態相較，僅光罩載台裝置之構成不同，因此，以下僅說明光罩載台裝置之構成。圖32係從—γ側觀察第8實施形態之光罩載台裝置M S Tj之側視圖。第8實施形態之光罩載台裝置MSTj與上述第7實施形態之光罩載=裝置 MSTi相較，纜線單元之構成不同。又，為簡化說明及便於圖不’與前述帛7實施形態相同或同等之構成部分，係使用與第1實施形態相同之符號並省略其說明。第8實施形態之纜線單元3〇〇a中，以方向、於Y轴方向分離之一對又線性導件構件二= 引部38a之下面（+Y側之x線性導件構件隱藏在圖面内側)。又’於導引部38a下方卜Z側)配置有由以χ軸方向為長邊方向、與ΧΥ平面平杆夕4 α 萌十仃之板狀構件構成之可動邻 210。於可動部21〇上面之四個月固疋有剖面U字形之湣件2 1 1 ( + Υ側之二個滑件隱兹—㈤月件隱滅在圖面内側）。-Y側之二個滑件211卡合於一Y側之χ線性一個 f导件構件93而能滑動， Y側之二個滑件2 11卡合於+ v化十 + Υ側之Χ線性導件構件93而能滑動。 11 听部下面固定有由在γ 分離之-對板狀構件構成之轴承部2ΐ2(+γ側之隱藏在圖面内側），於該軸承邻冓㈠212透過以Υ軸方向為輛 62 201100976 向之旋轉軸214將滚輪213 之ίϋ 又承為可旋轉。而纜線束99a 之固疋於滾輪2〇3之部分、盥 ya 〇口疋於滾輪206之部分之間之區戈的略中央部，透過固定攝件220固定於滚輪213。此卜’於可動部2 1 〇之—X側端呼τ二士 212，下面亦同樣的固定有軸承部 212於該軸承部212透過旋轉鈾〇1/)必施魏“ 213 紅轉》纜線束99b之固定於滾輪认哀輪203之部分、與固定於滾輪206之部分之間之區域 m ^ Λ 肀央部，透過固定構件220 口疋於滾輪213。因此，一對滾於2 Q 向。了哀輪213係一體移動於X軸方 ”二於一對軸承部212’分別透過以”方向為轴方向疋轉軸215將滑輪（pulley)2l6轴支成可旋轉。於—χ側 •之滑輪216捲掛有繩217。繩⑴之—端㈣於+ Χ側之脚部州、另-端則固定於軸承部2〇2之—χ側端部。又，圖 32中為避免圖面錯综複雜而省略了一部分，但於+ χ側之滑輪216亦同樣的捲掛有繩218、繩218之—端固定於1 ❹側之脚部:9:、另一端則固定於軸承部2〇2之+ χ側端部。纜線單7G 300a ’如圖33所示，當副載台5〇往+ X方向移動時’用以支承捲掛有繩217之—乂側滑輪216之轴承部叫即被該繩217牵引而往+ χ方向移動。此時，滑輪 2 16發揮動滑輪之功能，軸承部212以副載台π —半之速度追隨副載台50。此外，隨此，+ χ側軸承部212亦以副載台50 —半之速度往+χ側移動。本第8實施形態之纜線早元30〇a亦與第7實施形態之纜線單元3〇〇同樣的，隨副裁台50之移動而纜線束99a、9外之中間部分彎向下方（垂下）、或被拉向水平方向，因此與第7實施形態之纜線單元 63 201100976 同樣，能獲得防止產生塵肩及振動之效果。此處，於緵線單元300a，纜線束99a、99b成為中間部分垂下之狀態’因此於構成纜線束99a、99b之各鐵線類％會因其自重而產生張力。而作用於纜線類99之張力之水平成分將使副載台50往X軸方向移動，因此副載台5〇於χ 轴方向之位置控制有可能會變得困冑。具體的舉一例而言’如圖33所示，在副載台5〇位於導引部…上之+又側情形時，作用於+ X側纜線束99a之張力大致係作用於z 軸方向’因此其水平成分、亦即欲使副載台5〇往+ χ方向移動之力較小。另-方面，—乂側之規線束_係與X軸大致平行’因此因其自重而產生之張力之水平成分，大於作用於纜線束99a之張力之水平成分。由於此張力之水平分，差’於副載台50會產生使其往—χ方向移動之力。作本h實施形態之I線單元3GGa’係於三處（滚輪2〇3、2〇6、叫分別支承i線束993、携，滾輪2〇3與滚輪213之間之纖線束99a、99b之長度、以及滾輪213與滾輪鳩之間，纜線束99a、99b之長度分別較短，其自重較小、張力之水平成分亦較小。因此，能減輕對副載台5()之^方向位置控制造成之影響。又，由於係使將一對滾輪213分別支承為可旋轉之轴 =212以副載台50一半之速度追隨副载台5〇,因此能恆吏滾輪213位於滾輪203與滚輪2〇6之中間。此外，由於 ^使用滑輪216及繩217、218來使軸承部212追隨副載台，因此構造簡單。再者，由於與述第 ^ /實施形態相較線束往下方之彎曲量(因重力而垂下之量)較小，因此 64 201100976 縮小z軸方向之空間而節省裝置之空間（即使脚部短亦可）。《第9實施形態》接著，說明第9實施形態之光罩載台裝置MSTk。圖34 係從一Y側觀察第9實施形態之光罩載台裝置MSTk之侧視 ' 圖。第9實施形態之光罩載台裝置MSTk與上述第8實施形態之光罩載台裝置MSTj相較，一對滚輪2丨3之支承構造不同。又，為簡化說明及便於圖示，與前述第7、第8實施形態相同或同等之構成部分，係使用與第7、第8實施形態相〇同之符號並省略其說明。第9實施形態之光罩載台裝置MSTk所具有之镜線單元 3〇〇b中’-對滾輪213分別透過旋轉轴214被支承於由在 Y軸方向分離之一對板狀構件構成之軸承部2i2b(+Y側之板狀構件隱藏在圖面内側)而能旋轉。一對軸承部212b分別連接於配置在導” 38a上方之—對可動構件221。一對可件221分別設在副載台50…側、-X側。於一對〇刀乃川疋有以此滑動之狀態卡合於 ^ 口…之™對X線性導件構件51之剖面倒以形之-對滑件222(+γ側之^線性導略其圖示）。一對轴承部鳩係以連接構件如:/省於X軸方向-體移動。接構件223加以連接，又，於一對軸承部212b，與上透過旋轉—別安襄有滑輪216。於實:、:：同樣的，捲掛有繩2241織224，其各自之if分別之下面中央邻、里碼Q疋於導引部38a 、1 乃—端則固定於支承部2〇1。如圖35所示’第9實施形態之纜線翠元3_亦與上 65 201100976 述第8實施形態同樣的，當副載台50被驅動於X軸方向時，，對軸承部212b即分別被繩224牵引而以副载台5〇之一半之移動速度，追隨該副載# 50#動。本第9實施形態之纜線單tl 300b，由於係使用將副載台5〇之χ载台54引導於X軸方向之X線性導件構件51來將一對軸承部引導於X軸方向，因此與上述第8實施形態之纜線單元3〇〇a 相軚，構件較少（惟副载台5〇往χ方向之可移動量受限）。又，上述第7〜第9各實施形態之纜線單元之構成僅為例。例如，上述第7〜第9實施形態之各纜線單元，其纜線類之中間部分雖係固定於以圓筒狀構件構成之滾輪外周面，但固定纜線類之各構件只要能繞旋轉軸以既定角度、旋轉（擺動）於Θ y方向即可，因此亦可以不是圓筒狀之構件。圖36中顯示了上述第7實施形態之纜線單元之—變形例。如圖36所示，纜線束99b亦可以是將其中間部分透過固定構件220 ®定於支承構件23〇’此支承構件23〇包含被軸支成能繞旋轉軸205旋轉之剖面圓弧狀之板狀構件（圖％中，省略了 ~ Y側脚部39a、及構成軸承部2〇2之一對板狀構件中之一Y側板狀構件之圖示）。又，亦可取代第8、第9 實施形態之滾輪213(分別參照圖32、圖34)而使用圖^所示之支承構件230。此外，上述第8及第9實施形態中，軸承部2i2、2i2b(分別參照圖32、圖34)雖係透過繩被支承部2〇1(亦即副载: 牽引而以副載台50 —半之速度移動於χ軸方向:作= 軸承部2i2、212b移動於X轴方向之方式不限於此，例如可藉由進給螺桿驅動、線性馬達驅動、皮帶驅動等之驅動 66 201100976 方式’與副載台分開獨立的加以驅動。又，上述第8及第9實施形態中，軸承部2丨2、2丨2b(分別參照圖32、圖34)雖係於副載台之+ χ側及—χ側分別設置一個，但軸承部之數不限於此，可視χ導件之長度（亦即副載台之移動行程）於副載台之+ Χ側、—χ側分別設置例如二個以上。又，上述第1〜第9實施形態，除了性質上其組合不合 Ο ϋ 理之情形外，可適當的加以組合。例如，上述第4〜第9實施形態可與前述第2實施形態組合。亦即，上述第4〜第$ 實施形態中可設置遮光葉片裝置（遮光系統）。又，上述第1〜第9實施形態之各個（以下，記載為各實施形態）中，雖然一對^(^及YVCM係磁轉型，但不限於此’亦可以是動圈型。此外，上述各實施形態之曝光裝置所具備之各線性馬達，可以是磁轉型及動圈型之任一種，其驅動方式亦不限於羅倫玆力驅動方式，可以是可變磁阻驅動方式等其他方式。再者，上述各實施形態中，一對副載台雖係、以線性馬達加以驅動，但驅動—對副載台之方式（致動器）不限於此’亦可以是例如進給螺桿驅動、或皮帶驅動等。The cable type 9 9 is branched on the sub-mount 50, and the cable unit 300 has a cable bundle 99a composed of a plurality of cables 99 disposed on the + side of the sub-mount 5〇, and A cable bundle 99b composed of a plurality of cable types 99 disposed on the X side of the submount 5'. Each of the cables is formed. The plurality of portions of the Y stage 55 are connected to the X stage 54, 59 201100976 or the main stage 40 (see Fig. 28). + the X-side cable bundle 99a, as shown in the device side of FIG. 29, has a fixing member 22 and an end side (the outer portion 39a. Further, the cable bundle 99a is fixed to the middle portion of the leg portion on the +X side. The fixing member 22 is used to fix a part of the a: 3^ to the end of the roller 206. Further, the wire harness 99a is fixed to the middle portion of the end side of the roller cymbal, and is fixed in plural. The member 22 is fixed to the outer circumferential surface of the +x side roller 203 in the ":: 203. The solidification of the I wire harness 99a = the portion written by the wheel and the region fixed between the roller 203, at = two = station 5. on the X axis The center of the moving range of the direction is bent downward (downward due to gravity). In addition, the winding harness (10) is fixed to the part of the roller 2〇3 on the end side of the second side: ' as / Μ' U-shaped and formed in the inner space of the opening 4 20U of the support portion 201, the end portion (one end) is connected to the same as shown in Fig. 30, and the slow wire harness 99a is fixed to the roller 2〇3: the sin-end side region' The fixing member 22 is fixed to the support portion 2〇1. Further, each of the fixing members 220, as shown in FIG. The 'not the table is the same as the plurality of i-line types 99 constituting the cable bundle 99a, and is composed of a plurality of members. The same is true for the cable bundle 99b, and the longitudinal direction thereof is fixed to the roller 2. 3. 2. In the middle part of the white - the middle part: owing, the case where the sub-stage 50 moves from the position (central position) to the + side shown in FIG. 29, the operation example of the mirror unit 300 is illustrated. When the sub-stage 50 is moved in the +X direction, the support portion 2〇1 and the bearing portion 202 fixed to the one stage are integrally moved in the + 乂 direction, and the counterpart is stored therein, and the intermediate portion is fixed at - The wire harness _ of the X-side roller 203 is pulled 60 201100976 toward the + X side. On the other hand, the cable bundle 99a on the + X side is bent downward by the + χ side roller 203 and the + X side roller 206 approaching each other ( At this time, the pair of rollers 203 and the pair of rollers 206 are respectively swung (rotated in the 0 y direction) to prevent large bending stress from acting on the cables constituting the cable bundles 99a and 99b. 99. Also, when the sub-stage 5 is moved in the direction of -χ, contrary to the situation shown in Fig. 31, the cable bundle 99b is turned down. The bending and cable bundle 99a are pulled in an X direction. 构成 The other portions of the liquid crystal exposure device 3000 are configured in the same manner as the liquid crystal exposure device 1 of the first embodiment described above, and the same exposure operation is performed as described above. The liquid crystal exposure apparatus 3 of the embodiment has the same configuration as the liquid crystal exposure apparatus 1 of the first embodiment except that the cable unit 3 is provided in the mask stage device MSTi, so that the same effect can be obtained. In addition, the mask stage device MSTi included in the liquid crystal exposure apparatus 3 of the seventh embodiment is included in the cable for power transmission between the sub unit and the external unit. Each of the cable bundles 99a, 99b' of the class 99 is fixed to the area between the rollers 203, 206 by the movement of the sub-mount 5, and is bent downward by gravity or pulled horizontally, thereby preventing the cable from being pulled. The sliding between the class 99 and other members generates dust or vibration. The twisting unit of the seventh embodiment is particularly suitable for a device that is used in a clean room, such as a liquid crystal exposure device 3000 (see FIG. 28), or a device that requires high-precision position control of a moving body. . Further, when the I-beams 99a, 99b are bent downward or pulled in the horizontal direction, the rollers 203, 2, 6 are respectively rotated to suppress the large (four) bending stress from acting on the wire 99 constituting the ruled bundles 99a, 99b. Therefore, it is possible to avoid, for example, a failure in the pipe clogging due to the collapse of the pipe material. Further, the cable unit 300 of the seventh embodiment of the present invention is not easily provided with a member for supporting the intermediate portion of the cable type 99, and the maintenance of the cable type 99 is easy. [Eighth Embodiment] Next, a mask stage device included in the liquid crystal exposure apparatus of the eighth embodiment will be described. The liquid crystal exposure apparatus according to the eighth embodiment differs from the seventh embodiment in that only the configuration of the mask stage apparatus is different. Therefore, only the configuration of the mask stage apparatus will be described below. Fig. 32 is a side view of the mask stage device M S Tj of the eighth embodiment as seen from the -γ side. The mask stage device MSTj of the eighth embodiment differs from the photomask carrier=device MSTi of the seventh embodiment in the configuration of the cable unit. It is to be noted that the same or equivalent components as in the above-described embodiment 7 are denoted by the same reference numerals as in the first embodiment, and the description thereof will be omitted. In the cable unit 3〇〇a of the eighth embodiment, one pair of the linear guide members and the lower portion of the lead portion 38a are separated in the direction of the Y-axis direction (the x-axis guide member of the +Y side is hidden in the figure) Inside the face). Further, a movable neighbor 210 composed of a plate-like member having a longitudinal direction in the x-axis direction and a flat plane of the ΧΥ plane is disposed on the side of the guide portion 38a. The four months of the upper portion of the movable portion 21 are solidified with a U-shaped cross section 2 1 1 (the two sliding members on the side of the side are hidden - (5) the moon is hidden inside the drawing). The two sliders 211 on the Y side are engaged with a linear one f guide member 93 on the Y side to be slidable, and the two sliders 2 11 on the Y side are engaged in the linearity of the + v to ten + Υ side. The guide member 93 is slidable. 11 The bearing portion 2ΐ2 (the +γ side is hidden inside the drawing surface) composed of the plate-shaped member separated by γ is fixed under the hearing portion, and the bearing adjacent to the bearing (1) 212 is transmitted in the direction of the x-axis to the vehicle 62 201100976 The rotating shaft 214 carries the roller 213 in a rotatable manner. On the other hand, the cable bundle 99a is fixed to the roller 213 through the fixed camera 220, which is fixed to the portion of the roller 2〇3, and the yaya port is located at a slight center portion between the portions of the roller 206. This is the same as the movable portion 2 1 - the X side end of the τ 2 士 212, the same fixed bearing portion 212 in the bearing portion 212 through the rotating uranium 〇 1)) must Shi Wei "213 red turn" cable The portion of the wire harness 99b fixed to the portion of the roller bearing wheel 203 and the portion fixed to the roller 206 is at the center of the wire m ^ 肀, and is passed through the fixing member 220 to the roller 213. Therefore, the pair is rolled in the 2 Q direction. The wheel 213 is integrally moved on the X-axis side, and the two bearing portions 212' are respectively rotatably rotatably 215 in the direction of the axis, and the pulley 2l6 is rotatably supported. The pulley 216 is wound with a rope 217. The end of the rope (1) is at the foot of the + Χ side, and the other end is fixed to the χ-side end of the bearing portion 2 〇 2. Further, in Fig. 32, the drawing is avoided. It is intricate and a part is omitted, but the pulley 216 on the + χ side is similarly wound with the rope 218, the end of the rope 218 is fixed to the leg portion of the 1 ❹ side: 9: the other end is fixed to the bearing portion 2 〇2+ χ-side end. Cable single 7G 300a 'As shown in Figure 33, when the sub-mount 5 移动 moves in the +X direction, 'to support the winding 217 The bearing portion of the side pulley 216 is pulled by the rope 217 and moved in the + χ direction. At this time, the pulley 2 16 functions as a moving pulley, and the bearing portion 212 follows the sub-stage 50 at a speed of π-half of the sub-stage. Further, the +-side bearing portion 212 is also moved to the +χ side at a half speed of the sub-stage 50. The cable 30 of the eighth embodiment is also the cable unit of the seventh embodiment. Similarly, the intermediate portion of the cable bundles 99a and 9 is bent downward (downward) or pulled in the horizontal direction as the auxiliary cutting table 50 moves, so that it is the same as the cable unit 63 201100976 of the seventh embodiment. In this case, in the twisting unit 300a, the cable bundles 99a and 99b are in a state in which the intermediate portion is suspended. Therefore, the respective iron wires constituting the cable bundles 99a and 99b may be The tension is generated by the weight, and the horizontal component acting on the tension of the cable 99 moves the sub-mount 50 in the X-axis direction, so that the position control of the sub-mount 5 in the paraxial direction may become troublesome. Specifically, as an example, as shown in FIG. 33, the sub-stage 5 is placed. In the case of the + side on the guide portion, the tension acting on the +X side cable bundle 99a acts approximately in the z-axis direction. Therefore, the horizontal component thereof, that is, the sub-mount 5 is moved in the + χ direction. The force is small. On the other hand, the harness on the side of the _ is substantially parallel to the X axis. Therefore, the horizontal component of the tension due to its own weight is greater than the horizontal component of the tension acting on the cable bundle 99a. The horizontal division and the difference 'the sub-stage 50 will generate a force for moving in the direction of the χ. The I-line unit 3GGa' of the embodiment of the present embodiment is in three places (the rollers 2〇3, 2〇6, respectively The length of the fiber bundles 99a, 99b between the support i-beam 993, the carrying roller, the roller 2〇3 and the roller 213, and the length of the cable bundles 99a and 99b are respectively short, and the self-weight is small. The horizontal composition of the tension is also small. Therefore, the influence on the positional control of the sub-stage 5() can be alleviated. Further, since the pair of rollers 213 are respectively supported so that the rotatable shaft = 212 follows the sub-mount 5 at half the speed of the sub-mount 50, the constant roller 213 can be positioned between the roller 203 and the roller 2? . Further, since the pulley portion 216 and the strings 217 and 218 are used to make the bearing portion 212 follow the sub-mount, the structure is simple. Furthermore, since the amount of bending downward (the amount of dangling due to gravity) is smaller than that of the above-described embodiment, the 64 201100976 reduces the space in the z-axis direction and saves space for the device (even if the foot is short). can). Ninth Embodiment Next, a mask stage device MSTk according to a ninth embodiment will be described. Fig. 34 is a side view of the photomask stage device MSTk of the ninth embodiment as seen from the Y side. The mask stage device MSTk of the ninth embodiment is different from the mask holder stage device MSTj of the eighth embodiment in that the support structure of the pair of rollers 2丨3 is different. Incidentally, the same or equivalent components as those of the seventh and eighth embodiments are denoted by the same reference numerals as in the seventh and eighth embodiments, and the description thereof will be omitted. In the mirror unit 3〇〇b of the mask stage apparatus MSTk of the ninth embodiment, the pair of rollers 213 are respectively supported by the rotating shaft 214 and are supported by a pair of plate-shaped members separated in the Y-axis direction. The portion 2i2b (the plate member on the +Y side is hidden inside the drawing) is rotatable. The pair of bearing portions 212b are respectively connected to the movable member 221 disposed above the guide 38a. The pair of the movable members 221 are provided on the sub-stage 50 side and the -X side, respectively. The state of the sliding state is engaged with the TM of the X-shaped guide member 51, and the cross-section of the X-shaped linear guide member 51 is reversed to the slider 222 (the linear directional guide of the + γ side is shown). The connecting member is: / is moved in the X-axis direction - the body is moved. The connecting member 223 is connected, and the pair of bearing portions 212b are rotatably connected to the upper portion of the bearing portion 212b. In the same way, the following: The rope 2241 woven 224 is wound, and the lower center of each of the respective if, the inner code Q疋 is fixed to the support portion 2〇1 at the guide portion 38a, 1 or the end. As shown in Fig. 35, the ninth implementation In the same manner as in the eighth embodiment of the above-described embodiment, when the sub-stage 50 is driven in the X-axis direction, the bearing portion 212b is pulled by the rope 224 to the sub-stage. The movement speed of one-and-a-half of the 〇5 follows the sub-load #50#. The cable single t1300b of the ninth embodiment is used as the sub-stage 5 Since the stage 54 guides the X linear guide member 51 in the X-axis direction to guide the pair of bearing portions in the X-axis direction, the number of members is less than that of the cable unit 3A of the eighth embodiment. The configuration of the cable unit of the seventh to ninth embodiments is merely an example. For example, each of the cables of the seventh to ninth embodiments In the unit, the intermediate portion of the cable is fixed to the outer peripheral surface of the roller formed of a cylindrical member, but each member of the fixed cable can be rotated (swinged) in the Θ y direction at a predetermined angle around the rotation axis. However, it is not necessary to have a cylindrical member. Fig. 36 shows a modification of the cable unit of the seventh embodiment. As shown in Fig. 36, the cable bundle 99b may also have a middle portion thereof through the fixing member. The 220® is set to the support member 23''. The support member 23'b includes a plate-like member that is axially supported to be rotatable about the rotation axis 205. In the figure, the Y-side leg portion 39a is omitted. One of the bearing portions 2〇2 is a pair of Y-side plate-like members of the plate-like member Further, in place of the roller 213 of the eighth and ninth embodiments (see Figs. 32 and 34, respectively), the support member 230 shown in Fig. 2 may be used. Further, in the eighth and ninth embodiments. The bearing portions 2i2 and 2i2b (see Figs. 32 and 34, respectively) are the transmission line supported by the support portion 2〇1 (i.e., the sub-load: the traction is moved at the half speed of the sub-stage 50 in the x-axis direction: The manner in which the bearing portions 2i2, 212b are moved in the X-axis direction is not limited thereto, and can be driven separately from the sub-stage by the drive of the feed screw drive, the linear motor drive, the belt drive, or the like, for example, 66 201100976. Further, in the eighth and ninth embodiments, the bearing portions 2丨2 and 2丨2b (see Figs. 32 and 34, respectively) are provided on the + χ side and the χ side of the sub-mount, respectively. The number of the portions is not limited thereto, and the length of the guide member (that is, the movement stroke of the sub-stage) may be set to, for example, two or more on the + Χ side and the χ side of the sub-stage. Further, the first to ninth embodiments described above can be combined as appropriate in addition to the case where the combination is not in the nature. For example, the fourth to ninth embodiments described above can be combined with the second embodiment. That is, in the above-described fourth to tenth embodiments, a light shielding blade device (light shielding system) can be provided. Further, in each of the first to ninth embodiments (hereinafter referred to as "the respective embodiments"), although a pair of ^(^ and YVCM are magnetically transformed, the present invention is not limited thereto) and may be a moving coil type. Each of the linear motors included in the exposure apparatus according to each embodiment may be of a magnetic transformation type or a moving coil type, and the driving method is not limited to the Lorentz force driving method, and may be other methods such as a variable reluctance driving method. Further, in the above embodiments, the pair of sub-stages are driven by a linear motor, but the method of driving the sub-stage (actuator) is not limited thereto, and may be, for example, a feed screw drive. Or belt drive, etc.

又，上述各實施形態中，-對副载台雖係分別具備χ 載台、與x載台上所搭載之γ載台所構成二個載台之XY 二維載台裝置’但不限於此，-對副载台可分別是例如以平面馬達等驅動於ΧΥ二維方向之單—載台。又，上述各實施形態中，雖係針對保持光透射型光罩之光罩載台裝置為移動體裝置之情形做了説明，但不限於 67 201100976 此，亦可以是例如將曝光裝置曝光對象之基板（或晶圓）沿 XY平面弓丨導之載台裝置為移動體裝置。又，上述各實施形態中，照明光可以是ArF準分子雷射光（波長193nm)、KrF準分子雷射光（波長248nm)等之紫外光 '或者F2雷射光（波長157nm)等之真空紫外光。又，作為照明光，可使用例如將從DFB半導體雷射或光纖雷射振盪出之紅外線帶、或可見光帶之單—波長雷射光，以例如摻雜有辑（或銅1及镱兩者）之光纖放大器加以放大作為真空紫外光，並以非線性光學結晶將其轉換波長成紫外光之諧波。此外，亦可使用固體雷射（波長：355nm、266nm)等。又，上述實施形態，雖係針對投影光學系pL係具備複數隻光學系之多透鏡方式之投影光學系之情形做了説明，但投影光學系之隻數不限於此，只要有一隻以上即可。此外，不限於多透鏡方式之投影光學系，亦可以是例如使用 offner型大型反射鏡之投影光學系等。又，上述實施形態中之投影光學系PL，雖係針對使用投影倍率為放大系之場合做了説明，但不限於此，投影光學系亦可以是等倍系及縮小系之任一種。又，上述各實施形態之曝光裝置，特別是對使尺寸（包含外徑、對角線、一邊之至少一個）為5〇〇mm以上之基板、例如液晶顯示元件等平板顯示器（FPD)用大型基板曝光之曝光裝置由來尤其有效。此係因上述各實施形態之曝光裝置係對應基板大型化而構成之故。又，上述各實施形態，雖係針對適用於伴隨板片之步進掃描動作進行掃描型曝光之投影曝光裝置之情形做了說 68 201100976 明，但不限於此，上述各實施形態之曝光裝置之曝光裝置可以是不使用投影光學系之近接方式之曝光裝置。此外，上述各實施形態之曝光裝置亦可以是步進重複（step & . rePeat)方式之曝光裝置（所謂之步進機）或步進接合（step & - stitch)方式之曝光裝置等。又，上述各實施形態中，雖係使用於光透射性之光罩基板上形成有既定遮光圖案（或相位圖案、減光圖案）之光透射型光罩，但亦可取代此光罩而使用例如美國專利第〇 6,778,257號說明書所揭露之根據待曝光圖案之電子資料形成透射圖案、反射圖案或發光圖案之電子光罩（可變成形光罩）、例如使用非發光型影像顯示元件（亦稱為空間光變調器）之一種之 DMD(Digital Micro-mirror Device)可變成形光罩。又，曝光裝置之用途並不限於將液晶顯示元件圖案轉印至方型玻璃板之液晶用曝光裝置，亦可廣泛適用於例如半導體製造用之曝光裝置、用以製造薄臈磁頭、微機器及 DNA晶片等之曝光裝置。此外，不僅是是半導體元件素子〇等之微元件’亦能適用於為製造用於光曝光裝置、EUV曝光裝置、X線曝光裝置及電子線曝光裝置等之光罩或標線片’而將電路圖案轉印至玻基板或矽晶圓等之曝光裝置。再者’曝光對象之物體不限於玻璃板，亦可以是例如晶圓、 • 陶究基板、薄膜構件或光罩基板（mask blank)等其他物體。又’作為將電路圖案轉印至矽晶圓等之曝光裝置，亦可適用於例如美國專利申請公開第2〇〇5/〇259234號說明書等所揭露之在投影光學系與晶圓之間充滿液體之液浸型曝光裝置等。 69 201100976 又’亦可適用於例如國際公開第200 1 / 03 5 1 68號所揭路之It由在晶圓上形成干涉條紋，以在晶圓上形成線與空間（line & space)圖案之曝光裝置（微影系統）。又’上述各實施形態之移動體裝置不限於曝光裝置，亦能適用於例如具備喷墨（ink jet)式之機能性液體賦予裝置之元件製造裝置。此外，援用上述說明所引用之關於曝光裝置之所有公報、國際公開公報、美國專利及美國專利申請公開說明書之揭示作為本說明書記載之一部分。《元件製造方法》接著’說明於微影製程中使用上述各實施形態之曝光裝置之微元件製造方法》上述各實施形態之曝光裝置，亦可藉由在平板（玻璃基板）上形成既定圖案（電路圖案、電極圖案等），獲得作為微元件之液晶顯示元件。〈圖案形成步驟〉首先’使用上述各實施形態之曝光裝置，實施將圖案像升y成於感光性基板（塗有光阻之玻璃基板等）、所謂之微影氣私。藉由此微影製程’於感光性基板上形成包含多數電極等之既疋圖案。之後，經曝光之基板經由顯影步驟、蚀刻步驟、光阻剝步驟等各步驟，於基板上形成既定圖案。〈彩色濾光片形成步驟〉其次，形成對應R(Red)、G(Green)、B(Blue)之三個點之、且夕數排列成矩陣狀之彩色渡光片，或形成r、G、B三條線之濾光器之組複數排列於水平掃描線方向之彩色濾光片。 70 201100976 〈單元組裝步驟〉接著，使用以圖案形成步驟所得之具有既定圖案之基板、以及於彩色濾光片形成步驟所得之彩色濾光片等組裝液晶面板（液晶單元）。例如，在圖案形成步驟所得之具有既定圖案之基板與彩色濾光片形成步驟所得之彩色濾光片之間注入液晶，以製造液晶面板（液晶單元）。〈模組組裝步驟〉之後，安裝用以進行所組裝之液晶面板（液晶單元）之顯 ° 示動作之電路、背光單元等各零件而完成液晶顯示元件此場合’於圖案形成步驟中，由於能使用上述各實施形態之曝光裝置以高生產率且高精度進行板片之曝光，其結果能提升液晶顯示元件之生産性。 * 產業上之可利用性如以上之説明，本發明之移動體裝置適用沿既定二維平面使移動體移動。又，本發明之動力傳達裝置非常適合在沿既定二維平面移動之移動體與外部裝置之間進行動力〇之傳達。此外，本發明之曝光裝置適合藉由曝光將圖案形成於物體上。又，本發明之元件製造方法非常適合微元件之生産。【圖式簡單說明】圖1係顯示第1實施形態之液晶曝光裝置之概略構成之圖。圖2係圖1之液晶曝光裝置所具有之光罩載台裝置之俯視圖。 71 201100976 圖3係從+ X方向觀察光罩載台裝置之側視圖。圖4(A)及圖4(B)係分別顯示光罩載台裝置之主載台移動於交叉掃描方向時之移動前、移動後狀態之圖。圖5(A)及圖5(B)係分別顯示以一對定位裝置定位主載台之前後狀態之圖。圖6係第2實施形態之光罩載台裝置之俯視圖。圖7係圖6之光罩載台裝置之A—a線剖面圖。圖8係係將第1變形例之液晶曝光裝置之概略構成予以省略一部分之圖。圖9係第2變形例之光罩載台裝置之部分省略之立體圖。圖10係帛3實施形態之液晶曝光裝置所具有之光罩載台裝置之俯視圖。圖11係從+ X方向觀察圖1G之光罩載台裝置之側視圖。圖12(A)及圖12(B)係顯示鎖止裝置及制動器裝置之概略構成之圖，圖12(A)顯示以鎖止裝置將主載台與副載台加以連接之狀態、圖12(B)則顯示解除該連接之狀態。〇圖13係顯示與圖i2(A)及圖12(B)所示鎖止裝置及制動器裝置設置在不同位置之鎖止裝置及制動器裝置之概略構成之圖。圖14係顯示變形例之鎖止裝置及制動器裝置之概略構成之圖。圖15係第4實施形態之液晶曝光裝置所具有之光罩台裝置之俯視圖。 72 201100976 圖16(A)及圖16(Β)係分別斟金仏奸载台之前後狀態之圖。】顯不1對疋位裝置定位主圖17(A)及圖17(B)係顯示鎖止裝置及制動器裝置之概略構成之圖，圖17(A)顯示未以鎖止裝置進行連接之狀能、圖叩）則顯示以鎖止裝置將主载台與副載台加ς 狀態。年伐又圖18係顯示與圖17(Α)及圖17⑻所示鎖止裝置及制動 ΟFurther, in each of the above-described embodiments, the XY two-dimensional stage device including the two stages of the y-stage and the y-stage mounted on the x stage is provided for the sub-stage, but is not limited thereto. The pair of sub-stages can be, for example, a single-stage driven in a two-dimensional direction by a planar motor or the like. Further, in the above-described embodiments, the case where the mask stage device holding the light-transmitting type mask is a moving body device has been described. However, the present invention is not limited to 67 201100976, and may be, for example, an exposure apparatus. The stage device in which the substrate (or wafer) is guided along the XY plane is a mobile device. Further, in each of the above embodiments, the illumination light may be vacuum ultraviolet light such as ArF excimer laser light (wavelength: 193 nm), KrF excimer laser light (wavelength: 248 nm), or F2 laser light (wavelength: 157 nm). Further, as the illumination light, for example, an infrared ray that oscillates from a DFB semiconductor laser or a fiber laser or a single-wavelength laser light of a visible light band can be used, for example, doped with a series (or both copper 1 and bismuth). The fiber amplifier is amplified as vacuum ultraviolet light and converted to a harmonic of ultraviolet light by nonlinear optical crystallization. Further, a solid laser (wavelength: 355 nm, 266 nm) or the like can also be used. Further, in the above-described embodiment, the case where the projection optical system pL system has a multi-lens projection optical system of a plurality of optical systems has been described. However, the number of projection optical systems is not limited thereto, and only one or more may be used. . Further, the projection optical system of the multi-lens type is not limited, and for example, a projection optical system using an off-type large-sized mirror may be used. Further, although the projection optical system PL in the above-described embodiment has been described with respect to the case where the projection magnification is used, the projection optical system may be any one of the equal magnification system and the reduction system. Further, in the exposure apparatus according to each of the above embodiments, a substrate having a size (including at least one of an outer diameter, a diagonal, and one side) of 5 mm or more, for example, a large-sized flat panel display (FPD) such as a liquid crystal display element is used. The exposure apparatus for substrate exposure is particularly effective. This is because the exposure apparatus of each of the above embodiments is configured to increase the size of the substrate. Further, in each of the above-described embodiments, the case is applied to a projection exposure apparatus that performs scanning exposure with a step-and-scan operation of a sheet, but it is not limited thereto, and the exposure apparatus of each of the above embodiments is The exposure device may be an exposure device that does not use a proximity mode of the projection optical system. Further, the exposure apparatus according to each of the above embodiments may be an exposure apparatus (so-called stepper) or a step-and-stitch-type exposure apparatus of a step & rePeat type. Further, in each of the above-described embodiments, a light-transmitting type mask in which a predetermined light-shielding pattern (or a phase pattern or a light-reducing pattern) is formed on a light-transmitting mask substrate is used, but it may be used instead of the mask. An electronic reticle (variable shaped reticle) for forming a transmissive pattern, a reflective pattern or an illuminating pattern according to an electronic material of a pattern to be exposed, for example, using a non-illuminating type image display element (also referred to as a non-illuminating type image display element), as disclosed in the specification of US Pat. No. 6,778,257 A DMD (Digital Micro-mirror Device) variable shaping mask which is a type of spatial light modulator. Further, the use of the exposure apparatus is not limited to a liquid crystal exposure apparatus for transferring a liquid crystal display element pattern to a square glass plate, and can be widely applied to, for example, an exposure apparatus for semiconductor manufacturing, a thin magnetic head, a micromachine, and An exposure device such as a DNA wafer. In addition, not only the micro-components such as semiconductor elements, but also the reticle or reticle for manufacturing photo-exposure devices, EUV exposure devices, X-ray exposure devices, and electron beam exposure devices. The circuit pattern is transferred to an exposure device such as a glass substrate or a germanium wafer. Further, the object to be exposed is not limited to a glass plate, and may be, for example, a wafer, a ceramic substrate, a film member, or a mask blank. Further, as an exposure apparatus for transferring a circuit pattern to a ruthenium wafer or the like, it is also applicable to a method of filling a projection optical system and a wafer, as disclosed in, for example, the specification of the U.S. Patent Application Publication No. 2/5,259,234. Liquid immersion exposure apparatus, etc. 69 201100976 'Also applicable to, for example, International Publication No. 200 1 / 03 5 1 68. It is formed by forming interference fringes on the wafer to form a line & space pattern on the wafer. Exposure device (lithography system). Further, the mobile device of the above-described embodiments is not limited to the exposure device, and can be applied to, for example, a component manufacturing device including an ink jet type functional liquid supply device. In addition, the disclosures of all the publications, the International Publications, the U.S. Patent, and the U.S. Patent Application Serial No., which are incorporated herein by reference, are incorporated by reference. <<Method for Manufacturing Element>> Next, the method for manufacturing a micro device using the exposure apparatus according to each of the above embodiments in the lithography process will be described. The exposure apparatus of each of the above embodiments may be formed on a flat plate (glass substrate) by a predetermined pattern ( A circuit pattern, an electrode pattern, or the like) is obtained as a liquid crystal display element as a micro element. <Pattern forming step> First, using the exposure apparatus of each of the above embodiments, the pattern image is raised to a photosensitive substrate (a glass substrate coated with a photoresist, etc.), so-called lithography. By this lithography process, a ruthenium pattern including a plurality of electrodes or the like is formed on the photosensitive substrate. Thereafter, the exposed substrate is formed into a predetermined pattern on the substrate through steps of a developing step, an etching step, and a photoresist stripping step. <Color Filter Forming Step> Next, a color light-emitting sheet corresponding to three points of R (Red), G (Green), and B (Blue) and arranged in a matrix is formed, or r, G are formed. The filter of the three lines of B and the plurality of filters are arranged in a color filter in the direction of the horizontal scanning line. 70 201100976 <Unit assembly step> Next, a liquid crystal panel (liquid crystal cell) is assembled using a substrate having a predetermined pattern obtained by the pattern forming step, a color filter obtained by the color filter forming step, and the like. For example, a liquid crystal is injected between a substrate having a predetermined pattern obtained by the pattern forming step and a color filter obtained by the color filter forming step to fabricate a liquid crystal panel (liquid crystal cell). After the module assembly step, a liquid crystal display element is completed by mounting various components such as a circuit for performing display operation of the assembled liquid crystal panel (liquid crystal cell), and a backlight unit. The exposure of the sheet is performed with high productivity and high precision using the exposure apparatus of each of the above embodiments, and as a result, the productivity of the liquid crystal display element can be improved. * Industrial Applicability As described above, the mobile body device of the present invention is adapted to move a moving body along a predetermined two-dimensional plane. Further, the power transmission device of the present invention is very suitable for transmitting power between a moving body and an external device that move along a predetermined two-dimensional plane. Further, the exposure apparatus of the present invention is suitable for forming a pattern on an object by exposure. Further, the component manufacturing method of the present invention is very suitable for the production of microcomponents. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a schematic configuration of a liquid crystal exposure apparatus according to a first embodiment. Fig. 2 is a plan view showing a reticle stage device of the liquid crystal exposure apparatus of Fig. 1. 71 201100976 Figure 3 is a side view of the reticle stage device viewed from the +X direction. 4(A) and 4(B) are views showing the state before and after the movement of the main stage of the mask stage apparatus in the cross-scanning direction, respectively. Fig. 5 (A) and Fig. 5 (B) are diagrams showing the state before and after positioning of the main stage by a pair of positioning means, respectively. Fig. 6 is a plan view showing a mask stage device of a second embodiment. Figure 7 is a cross-sectional view taken along line A-a of the reticle stage device of Figure 6. Fig. 8 is a schematic view showing a schematic configuration of a liquid crystal exposure apparatus according to a first modification. Fig. 9 is a partially omitted perspective view of the photomask stage device of the second modification. Fig. 10 is a plan view showing a reticle stage device included in the liquid crystal exposure apparatus of the embodiment of Fig. 3. Figure 11 is a side elevational view of the reticle stage assembly of Figure 1G as seen from the +X direction. 12(A) and 12(B) are views showing a schematic configuration of a lock device and a brake device, and FIG. 12(A) shows a state in which the main stage and the sub-stage are connected by a lock device, and FIG. (B) shows the status of releasing the connection. Fig. 13 is a view showing a schematic configuration of a lock device and a brake device which are provided at different positions from the lock device and the brake device shown in Figs. 2(A) and 12(B). Fig. 14 is a view showing a schematic configuration of a lock device and a brake device according to a modification. Fig. 15 is a plan view showing a mask unit of the liquid crystal exposure apparatus of the fourth embodiment. 72 201100976 Figure 16 (A) and Figure 16 (Β) are diagrams of the state before and after the stage. 】Immediate positioning of the clamp device Main diagrams 17(A) and 17(B) show the schematic configuration of the lock device and the brake device, and Fig. 17(A) shows the connection without the lock device. The energy, diagram 叩) shows that the main stage and the sub-stage are twisted by the locking device. Fig. 18 shows the locking device and brake 所示 shown in Fig. 17 (Α) and Fig. 17 (8).

G 器裝置設置在不同位置之鎖止裝置及制動器裝置之概略構成之圖。圖19係顯示制動器裝置解除之狀態之圖。圖20係第5實施形態之光罩載台裝置之俯視圖。圖21係圖20之光罩載台裝置之Β— Β線剖面圖。圖22係用以說明第5實施形態之光罩載台裝置所具有之光罩裝載裝置之動作之圖（其丨）。圖23(A)及圖23(B)係用以說明第5實施形態之光罩載台裝置所具有之光罩裝载裝置之動作之圖（其2及其3)。圖24係第6實施形態之光罩載台裝置之俯視圖。圖25係用以說明第6實施形態之光罩載台裝置所具有之光罩裝载裝置之動作之圖（其丨）。圖26(A)及圖26(B)係用以說明第6實施形態之光罩裝載裝置之動作之圖（其2及其3)。圖27係用以說明第6實施形態之光罩裝載裝置之動作之圖（其4)。圖2 8係顯示第7實施形態之液晶曝光裝置之概略構成之圖。 73 201100976 圖29係光罩載台裝置所具有之纜線單元之側視圖。圖30係圖29之C — C線剖面圖。圖3 1係用以說明纜線單元之動作之圖。圖32係第8實施形態之纜線單元之側視圖。圖33係用以說明第8實施形態之纜線單元之動作之圖。圖34係第9實施形態之纜線單元之側視圖。圖35係用以說明第9實施形態之纜線單元之動作部圖36係顯示第7實施形態之變形例之纜線單元之分之圖。【主要元件代表符號】 10 ' 10a 液晶曝光裝置 1000 > 2000 ' 3000 液晶曝光裝置 12 平台 21 微動載台 22Y γ移動鏡 23X X粗動載台 23Y γ粗動載台 24Y 固定構件 26 自重抵消裝置 27 調平裝置 28 雷射干涉儀系統 31 、 31a 鏡筒平台 74 201100976The G device is a diagram showing the schematic configuration of the locking device and the brake device at different positions. Fig. 19 is a view showing a state in which the brake device is released. Fig. 20 is a plan view showing a mask stage device of a fifth embodiment. Figure 21 is a cross-sectional view of the 光-Β line of the reticle stage device of Figure 20. Fig. 22 is a view for explaining the operation of the mask loading device included in the mask stage device of the fifth embodiment. Figs. 23(A) and 23(B) are views for explaining the operation of the photomask loading device of the photomask stage device of the fifth embodiment (2 and 3). Fig. 24 is a plan view showing a mask stage device of a sixth embodiment; Fig. 25 is a view for explaining the operation of the mask loading device included in the mask stage device of the sixth embodiment. Figs. 26(A) and 26(B) are views for explaining the operation of the mask loading device of the sixth embodiment (2 and 3). Fig. 27 is a view (4) for explaining the operation of the mask loading device of the sixth embodiment. Fig. 2 is a view showing a schematic configuration of a liquid crystal exposure apparatus of a seventh embodiment. 73 201100976 Figure 29 is a side view of the cable unit of the reticle stage device. Figure 30 is a cross-sectional view taken along line C - C of Figure 29; Figure 3 is a diagram for explaining the action of the cable unit. Figure 32 is a side view of the cable unit of the eighth embodiment. Fig. 33 is a view for explaining the operation of the cable unit of the eighth embodiment. Figure 34 is a side view of the cable unit of the ninth embodiment. Fig. 35 is a view showing the operation of the cable unit of the ninth embodiment. Fig. 36 is a view showing the outline of the cable unit according to the modification of the seventh embodiment. [Main component representative symbol] 10 ' 10a Liquid crystal exposure device 1000 > 2000 '3000 Liquid crystal exposure device 12 Platform 21 Micro motion stage 22Y γ moving mirror 23X X Thick motion stage 23Y γ coarse movement stage 24Y Fixing member 26 Self-weight canceling device 27 Leveling device 28 Laser interferometer system 31, 31a Tube platform 74 201100976

33 34 35 36a' 36b 37a、37b 38a、38b 39a、39b 40 ' 340 41 、 341 41a 41b 42 43a〜43c 44 44a 45 ' 46 45a、46a、85a 48x 48y 49a〜49d 50 ' 70 51、71 52 ' 62 ' 72 53 54 、 74 、 254 、 274 基板載台架台防振裝置主載台導件支承構件副載台導件引導部腳部主載台主載台之本體部開口部凹部夾頭單元空氣軸承 Y可動子固定構件 X可動子固定構件 X移動鏡 Y移動鏡靶副載台 X線性導件磁石單元 X標尺 X載台 75 201100976 55、 56、 57、 58 ' 59、 63、 64、 65、 65a 66 ' 73 84 88 89a 90 91 92 95 95a 95b 96 98x 98y 99 75 ' 255 、 275 61 、 76 、 81 60 ' 77 、 80 78 、 258 、 278 79 ' 259 ' 279 83 264 ' 284 85 67 、 86 ' 87 、89b 99a 、 99b γ載台滑件線圈單元 X讀頭 Y讀頭 Y線性導件 Y標尺 X固定子安裝構件間隙感測器 X線性標尺 Y線性標尺 Y固定子纜線鏈定位裝置定位構件凹部桿部汽缸罩桿球部 X雷射干涉儀 Y雷射干涉儀纜線類纜線束 7633 34 35 36a' 36b 37a, 37b 38a, 38b 39a, 39b 40 ' 340 41 , 341 41a 41b 42 43a to 43c 44 44a 45 ' 46 45a , 46a , 85a 48x 48y 49a to 49d 50 ' 70 51 , 71 52 ' 62 ' 72 53 54 , 74 , 254 , 274 Substrate gantry table anti-vibration device main stage guide support member sub-stage guide guide part foot main stage main stage main part opening part recess part collet unit air Bearing Y movable member fixing member X movable member fixing member X moving mirror Y moving mirror target sub-stage X linear guide magnet unit X scale X stage 75 201100976 55, 56, 57, 58 '59, 63, 64, 65, 65a 66 ' 73 84 88 89a 90 91 92 95 95a 95b 96 98x 98y 99 75 ' 255 , 275 61 , 76 , 81 60 ' 77 , 80 78 , 258 , 278 79 ' 259 ' 279 83 264 ' 284 85 67 , 86 ' 87 , 89b 99a , 99b γ stage slider coil unit X read head Y read head Y linear guide Y scale X fixed bracket mounting member gap sensor X linear scale Y linear scale Y fixed cable chain positioning device positioning Member recessed rod cylinder head rod ball X laser interferometer Y laser interferometer cable Cable bundles 76

201100976 100a〜100d 101 102 103 104 105 、 106 107 107a 110 111 112 113 120a〜102d 、 120a’〜102d， 121 123 130 131 132 133 135 136 137 138 139 鎖止裝置鎖止部固定構件輛球部支承構件卡合構件凹部葉片本體遮光部被驅動部連接部制動器裝置制動構件緩衝墊光罩保持裝置可動構件爪構件 Z線性導件支承構件滑件一 Y側固定構件連接構件補強構件葉片驅動裝置 77 140 201100976 200 200a 201 202 203 ' 206 ' 213 204 205 212 、 212b 214 216 217 、 218 220 221 220a 239a 、 239b 250 > 270 300、300a、300b 338a、338b、438a、438b 347 BD、BDa201100976 100a~100d 101 102 103 104 105, 106 107 107a 110 111 112 113 120a~102d, 120a'~102d, 121 123 130 131 132 133 135 136 137 138 139 Locking device locking part fixing member ball supporting member Engagement member recessed blade body light-shielding portion driven portion connection portion brake device brake member cushioning pad mask holding device movable member claw member Z linear guide member support member slider-Y-side fixing member connecting member reinforcing member blade driving device 77 140 201100976 200 200a 201 202 203 ' 206 ' 213 204 205 212 , 212b 214 216 217 , 218 220 221 220a 239a , 239b 250 > 270 300, 300a, 300b 338a, 338b, 438a, 438b 347 BD, BDa

CGCG

FF

ILIL

IOPIOP

Lx ' Ly 機箱鎖止裝置支承部軸承部滾輪旋轉轴軸軸承部旋轉軸輥繩固定構件可動構件制動器裝置懸吊構件搬送用載台繞線單元引導部本體部341下面之凹部機體主載台之重心位置地面照明用光照明系測距光束 78 201100976 Μ 光罩 ML、MLb 光罩裝載裝置 MST、MSTa〜MSTk 光罩載台裝置 P 基板 PH 基板保持具 PL 投影光學系統 PST 基板載台裝置 XVCM1、XVCM2 X音圈馬達 YVCM Y音圈馬達 79Lx ' Ly Chassis Locking Device Support Bearings Roller Shaft Shaft Bearings Rotary Shaft Roller Rope Fixing Member Movable Member Brake Device Suspension Member Transporting Table Winding Unit Guide Unit Body Section 341 Concave Body Main Stage Below Center of gravity position, ground illumination, illumination, distance measuring beam 78 201100976 Μ Mask ML, MLb Mask loading device MST, MSTa~MSTk Mask stage device P Substrate PH Substrate holder PL Projection optical system PST Substrate stage device XVCM1 XVCM2 X voice coil motor YVCM Y voice coil motor 79

Claims

201100976 VII. Patent application scope: 1 · A mobile body device having: a first moving body movable along a two-dimensional plane containing each other; a second moving body of one axis and the second axis, parallel to the axis of the 帛1 The side of the moving body can be moved at least in the direction parallel to the second axis, and the third moving body in the direction parallel to the movable body, and the other side of the moving body moves; The one-axis parallel can be arranged in parallel with the direction axis of the crucible 2 in the first direction, and is driven by the predetermined moving body together with the first driving system, and the second and second axes are parallel; and the state The setting device 'when the first to the first makeup can be packaged, the state in which the mobile body is integrally driven can be switched, and the third to the second state cannot be switched. The second body of the body-body drive is as in the case of the mobile body of the patent claim 1, wherein the device further includes the first moving body being divided into two pieces and connected in a non-contact state. The connection device of the second and third moving bodies in §Hai. 3. The mobile device according to claim 2, further comprising: driving the "Hai first moving body to the second and third moving bodies in a non-contact state in a direction parallel to the first axis; Contact drive system. The mobile device according to claim 3, wherein the non-contact drive system induces the first movable body in the same direction as the second and third movable bodies. 5. If the mobile device is in the scope of claim 4, it further has 80 201100976 to prepare the second drive system of the second and third Minglin. Driven together in parallel with the first vehicle 6 as set forth in the claims 帛 3 to 5, wherein 'the non-contact drive system has the first} electric actuator included in the second mobile body The stator and the movable member provided in the movable body drive the first moving body by the electromagnetic force generating driving force. D Ο G 7 is the mobile body device of the sixth paragraph of the patent scope, the W sub-electrode of the electromagnetic actuator has a coil; the sub-small has a magnet unit containing a magnet. The mobile body device of claim 6 or claim 7, wherein the two electromagnetic actuators are in a plane including the first moving center-of-gravity position: parallel to the narrow two-dimensional plane, A driving force acts on the second moving body. Setting 1: The mobile device of any one of the claims of the scope of the invention is in the middle of the invention, and the connecting device includes a fixed body respectively provided in the second and the body, and is provided in the first "multiple body The actuator of the mover generates a driving force in a direction parallel to the second axis by an electromagnetic force to induce the first movable body in a direction parallel to the second axis. The mobile device of claim 9, wherein the stator of the second electromagnetic actuator has a coil unit including a coil, and the movable member has a magnet unit including a magnet. 1A. The mobile body device of claim 9 or 10, wherein the second electromagnetic actuator is driven in a plane parallel to the two-dimensional plane of the disk containing the i-th moving center-of-gravity position The force acts on the first moving body. 12. The mobile body device of claim 2, wherein the 81 201100976 second and third moving bodies are in a fixed stroke; or in the direction parallel to the first axis, the second and third shifts - Moved to the second drive system. In the mobile body device of claim 12, the medium-connecting device includes a lightning magnetic station, a '/', the second and the second electromagnetic actuator, which are respectively disposed on the fixed body of the D moving body, and The movable member ' of the i-th moving body generates a driving force in a direction in which the _i and the second axis are parallel by the electromagnetic force to induce the first moving body in a direction parallel to the 帛1 and the second axis. The mobile body device of claim 13, wherein the stator of the electromagnetic actuator has a coil unit & a coil comprising a magnet, the movable body having a magnet unit including a magnet. The mobile body device of claim 13 or 14, wherein the electromagnetic actuator is in a two-dimensional plane with a position of a center of gravity including a direction orthogonal to the two-dimensional plane of the second movable body In the parallel plane, a driving force is applied to the first moving body. The mobile body device according to any one of claims 13 to 15, further comprising a driving force in a direction parallel to the first axis generated by the electromagnetic actuator, in a non-contact state τ The second moving body is driven to the non-contact driving system in a direction parallel to the first axis with respect to the second and third moving bodies. The mobile device according to claim 1, wherein the state setting device includes a connection device having a first position capable of connecting the first to third moving bodies, and the first to The third moving body 82 201100976 This is a movable member that moves between the second positions in the non-contact state. The mobile device according to claim 17, wherein the state setting device further has a right side to connect the first moving body to the second and third movements in a non-contact state. Body connection device. The mobile device according to claim 18, wherein the connecting device electromagnetic actuator includes a stator provided to each of the second and third moving bodies, and is provided The movable member of the first moving body generates a driving force in a direction parallel to the second axis by an electromagnetic force to induce the first moving body in a direction parallel to the second axis. [20] The mobile body device of claim 19, wherein the electromagnetic actuator is configured to apply a driving force to the first movement in a plane containing the (four) 1 moving center-of-gravity position and the two-surface millimeter body. The apparatus, wherein the moving body of any one of items 17 to 2 of the Shenliwei, and the connecting device are in a plane parallel to the 包含 including the position of the first moving center of gravity, the first to third moving bodies The centering device, the moving body 2 of any one of items 17 to 21, is placed at t, and the movable member is moved to a side orthogonal to the two-dimensional plane. 23, as in the patent application 帛17 to the device, wherein a moving body of the item 兮, Τ ^, wherein the connecting device has a recessed portion of the concave portion of the spherical member surface, the 丄丄丄具有具有 3 has a tapered shape, and the spherical member is adjacent to the movable member through the movable member to enable the The spherical member is fitted to the engaging member to be separated: in a state of being made. Making the first to third moving bodies relatively movable 83 201100976 24 · As in the scope of claims 7 to 23 of the patent application - the device 'where' the connection is such that the first body is connected at a plurality, so that Dijon mobile body] -« ^ . ,, 移动的移动体

The moving body is connected at a complex number. The mobile device according to any one of claims 7 to 24, wherein the movable member is provided in the second and third < 26. The mobile device according to any one of claims η to 25, further comprising: driving the second and third moving bodies - to drive the second drive in a direction parallel to the first axis system. The mobile device according to any one of claims 17 to 26, further comprising: driving the second moving body to the second and third moving bodies in a non-contact state A non-contact drive system in which the x-axis is parallel. The mobile device according to any one of the items of the present invention, wherein the first moving body is in contact with the second and third moving bodies respectively to limit the first 1 means for restricting the movable range of the moving body relative to the second and third moving bodies. The mobile device according to claim 28, wherein the restriction device is configured to abut the first movable body in a plane parallel to the two-dimensional plane including a position of a center of gravity of the first movable body The second and third moving bodies. The mobile device according to claim 28, wherein the 'distance limiting device has a cushioning member on a contact surface between the first movable body and the second and third movable bodies. 31. A moving body device comprising: 84 201100976 a first moving body movable along a plane including orthogonal planes; and a second moving body of the second axis, moving in parallel with the first axis - The side is movable at least in the first axis; the direction is moved in the direction of the predetermined movement of the third moving body moving body; the first driving system is in the first The axis may be parallel to at least a direction parallel to the first tenth axis of the second axis, and the second and third moving second axes may be parallel to each other; the body is driven together with the connecting device The i-moving body is a connecting device for the second and third moving bodies, and is connected to the restricting device by a contact cancer, and has a movable member, and the movable body and the second and third movable bodies are opposite to each other. The first position of the first predetermined range w. The movement fe is limited to the second movement of the movable body and the relative movement of the second movable body and the second and third moving bodies beyond the weight range. The moving restriction device between the moving devices of the range 31 is included in the mobile body Heart :: home plate wherein, in a plane parallel to the plane of the ^ (iv): The position of the movable body and the two-dimensional level. a moving body device in which the moving body respectively abuts the second and third restrictions 3, 3, and 3, wherein the connecting surface has a cushioning member and the second and third moving body resisting means 3, (4) The moving body '" moving members of any of the items 31 to 33 of the application range are respectively provided in the second and third moving bodies. 85. The mobile device of any one of claims 31 to 34, wherein the '5' connection device has an electromagnetic actuator, and the electromagnetic actuator includes the second and third movements respectively And a driving force that generates a driving force in a direction parallel to the second axis by an electromagnetic force to induce the 泫i-th moving body to be parallel to the 帛2 axis; and the movable member provided in the ith moving body direction. The mobile device of claim 35, wherein the electromagnetic actuator applies a driving force to the first one in a ten-curve parallel to the two-dimensional plane including a position of a center of gravity of the first moving body Moving body. The mobile device according to any one of claims 31 to 36, further comprising: driving the first moving body in a non-contact state with the driving system; the moving body is opposite to the second and third shifting The non-contact 38 in the direction in which the first axis is parallel; the movable body device of the second driving system in the one direction of the second and third moving bodies is further driven by the first The non-contact drive system in which the axis is parallel, the mobile body is driven by the first and the second and third devices, and the third device is further provided with the first device. When the 4/2 drive system is not aligned, the first moving body is in the same direction. 2 and the moving body 3 moving body connected to any one of the 3rd moving body to 38 is connected. () - If the application is in the first to third embodiments, the ith sensing 1 moving body and the second U and the information for measuring the interval of the moving body of any one of the items are further provided. To measure the interval between the moving body and the third moving body on the 86th 201100976 The second sensor of the information; the first movement system controls the position of the §Hai 2 and the third moving body based on the measurement 値 of the i-th and the second sensors. a moving body ' 4 ' of any of the items i to 40, wherein 'the second and third moving systems respectively control the position in the two-dimensional plane according to the measurement 第 of the measuring device, the third measuring I-packager The heads 7 which are parallel to the first and second axes are the heads of the periodic direction and the heads for measuring the position information of the second and third moving bodies in the two-dimensional plane 使用 using the scale. The mobile device according to claim 41, wherein the first measuring device is an encoder system, and the encoder system is disposed outside the second and third moving bodies and the second and third moving bodies, respectively The one of the scales and the other of the second and third moving bodies and the other of the second and third moving bodies are respectively arranged. 43 · Moving as in claim 42 a body device, wherein the scales are respectively disposed on the second and third moving bodies, the read head The mobile device of any one of the first to fourth aspects of the present invention, wherein the first mobile system is supported in a non-contact manner with The moving body device of any one of the first to fourth aspects of the present invention is further provided with a reflecting surface provided on the first moving body. a second measuring device that measures the position information of the first moving body in the two-dimensional plane separately from the second and third moving bodies according to the reflected light of the side beam; 87 201100976 It is on the inner side of the outer surface of the first movable body. 40. The mobile device of claim 45, wherein the second measuring device comprises a laser interferometer system. The mobile body device of claim 46, wherein the first moving body has an opening that is open to the outer side surface; the reflecting surface is provided at the opening of the first moving body; the side light beam The reflecting surface is irradiated through the opening. 48. The mobile device of claim 46 or 47, further comprising positioning means for positioning the first moving body at a position of a measuring origin of the laser interferometer system. 49. The mobile body device of claim 48, wherein the positioning device has: a clamping member '&; a recess having a tapered surface provided in one of the (four)1 moving body and the predetermined fixing member; a spherical portion disposed on the other of the second moving body and the fixing member, configured to be movable in a direction approaching and away from the positioning member, by sliding the taper when approaching the 疋疋 member The surface is accordingly guided to the predetermined position. 50. The mobile device positioning device according to claim 49 of the patent scope is provided with at least two kinds of exposure devices, wherein the image is transferred to the object by an energy beam through a pattern, and is characterized in that: -Have. The pattern retaining body of the Hai pattern and the one of the objects hold the request item of the first moving body and the moving body device of any one of the items of the item 5 201100976 » Keep the pattern holder and the other of the objects The holding device. The exposure apparatus of claim 51, wherein the pattern holder is held by the first moving body; the object is held by the holding means. The exposure apparatus of claim 52, further comprising a light shielding member that is disposed between the second and third moving bodies to shield a portion of the energy beam that is irradiated to the pattern holder Therefore, the irradiation range of the energy beam on the pattern surface of the pattern holder is limited. The exposure apparatus of claim 53, wherein the light shielding member is movable in a direction parallel to the second axis on the second and third moving bodies. The exposure apparatus according to claim 53 or claim 54, wherein the 忒 light shielding member is provided in plural in a direction parallel to the second axis. The exposure apparatus according to any one of claims 52 to 55, wherein the second and third moving systems are respectively moved on a pair of supporting members separated from the structural member supporting the holding means. The exposure apparatus of claim 56, wherein the pair of support members are suspended and fixed to the member disposed above the structural member. 58. The exposure apparatus of claim 52, further comprising at least one of the second and third movable bodies, and transferring the pattern holders to and from the second movable body Adapter. 59. The exposure apparatus of claim 58, wherein the switching device includes a second side mounted on the second moving body to maintain a direction parallel to the first axis of the pattern holder The holding device, and the lap 89 201100976 are placed on the three moving bodies, and the second holding means for locating the other side of the pattern holding body in the direction in which the ith axis is flat. '笛 = Shen # Patent Section 58 or 59 exposure device, wherein, (4) 2 and the third mobile system by the 〖drive system and the first! The moving body is driven by the second axis, and the first moving body is fortunately placed in the replacement position of the pattern holding body for holding it.圃 61· If the scope of the patent application is set to 58th, the transfer is installed in the non-contact state of the mobile device. 62. If the patent application form is applied, the item is firstly disposed, and further includes a first guiding member that moves in a direction parallel to the axis; and the second moving body moves to the second and second guiding members. (4) the third moving body is moved to the second fourth moving body, and the second moving body is disposed parallel to the second axis. The second axis is parallel to the side, and the first moving body is guided by the first moving body, and the third moving body is moved to the second axis with respect to the second guiding member disposed on the second axis. To the side, the second guiding structure movable body can be driven independently of the second precision by the 苐1 driving system in parallel with the fourth and second vehicles, and the third moving body And the adapter device includes a fourth moving body that is adjacent to the first axis; and a fourth moving body that holds the circular body, and holds the circular moving body, and holds the first moving device and the first holding device that holds the image The case holder is parallel to the eleven axis. The second side of the other side of the direction of 201100976 is followed by the pattern holder L: The first moving body is driven by a first driving unit, wherein the third unit is in the state of the second position, and the third moving body is driven. The first moving body is positioned on the other side with respect to the second axis: °, and the fourth and fifth moving bodies are driven to the other side of the second brother; Positioning on the transfer position of the pattern holder with the first moving body D. 64. - An exposure device that exposes an object by an energy beam via a pattern to transfer the pattern to the object The main stage includes: a main stage holding the pattern holder having the pattern and a one-dimensional plane of the object including two-dimensional planes of the first axis and the second axis orthogonal to each other; : the pair of sub-stages are attached thereto The first axis parallel direction is disposed on one side and the other side of the main carrier port, and is movable at least in a direction parallel to the 帛2 axis; the first drive system drives the pair of sub-stages In a direction parallel to the second axis; the state setting device can drive the main stage and the pair of sub-stages to drive the first Switching between the state and the second state that cannot be driven by the body; and the holding device 'holds the pattern holder and the other of the object. 65. The exposure device of claim 64, wherein the pattern The holding system is held in the main stage, and the object system is held in the holding device. 66. The exposure apparatus of claim 65, wherein the state setting device comprises connecting the main stage to the non-contact state in a non-contact state The apparatus of claim 66, wherein the exposure apparatus of the sixth aspect of the invention further comprises: driving the 3 hai main stage relative to the pair of sub-stages in a non-contact state with the first A non-contact drive system in which the axes are parallel. 68. The exposure apparatus of claim 65, wherein the state setting device comprises a connection device having a movable member, the connection device being connectable to a position of the main stage and the pair of sub-stages, and The main stage and the pair of sub-stages are moved between the second positions in a non-contact state. 69. The exposure apparatus of claim 68, wherein the state setting device further comprises a coupling device that connects the main stage to the pair of sub-stages in a non-contact state. The exposure apparatus according to any one of claims 64 to 69, wherein the improvement comprises a light shielding member that is mounted between the pair of submounts to illuminate the pattern holder by shielding One portion of the energy beam is used to limit the range of illumination of the energy beam at the pattern face of the pattern holder. The exposure apparatus according to any one of claims 64 to 7, further comprising at least one of the pair of sub-stages, wherein the pattern holders are placed between the main stage and the main stage Transfer adapter. 72. An exposure apparatus for exposing an object with an energy beam via a pattern to transfer the pattern to the object, comprising: a main stage holding a pattern holder having the pattern and one of the objects; Two-dimensional planes of the second axis and the second axis that are orthogonal to each other; a pair of sub-stages are disposed on one side and the other side of the main stage in a direction parallel to the second axis, at least The direction parallel to the second axis 92 201100976 moves in a predetermined stroke; the first drive system, Jiang 4 . The pair of sub-stages are driven in a direction parallel to the second axis, and the device is connected to the main main stage Each of the pair of sub-stages is coupled to the pair of sub-stages in a non-contact state, and the restriction device has a movable member that can move the pair of the main stage and the pair of sub-stages The range is limited to a first position within a predetermined range, and is movable between a second position m that allows the 载通 main pedestal and the pair of sub pedestals to move relative to the predetermined range; and the holding device 'keep the Pattern holder and the The body of the other. 73. The exposure apparatus of claim 72, wherein the pattern retention system is maintained at the main stage and the item system is held by the holder. For example, in the exposure apparatus of claim 72 or 73, the improvement device, the light-shielding member is disposed between the pair of sub-stages, by shielding the energy beam irradiated to the pattern holder Part of it is to limit the illumination range of the energy beam in the plane of the holder of the figure (4). The exposure apparatus according to any one of claims 72 to 74, further comprising at least one of the pair of sub-stages, wherein the pattern holders are rotated between the main stage and the main stage Connect the adapter. 76. An exposure apparatus for exposing an object disposed on a second surface by irradiating an energy beam with a pattern disposed on an i-th surface and passing through an enlarged image of the pattern formed by a projection optical system having a magnification The main stage 'maintains a mask formed with the pattern, and is movable along a two-dimensional plane including the first axis and the second axis orthogonal to each other; a pair of sub-stages in a direction parallel to the second axis Arranged on one side and the other side of the 93 201100976 main stage, respectively, and movable integrally with the main stage; and the projection optical system 'arranged in a direction parallel to the first axis, the projection area of the pattern image is arranged at an interval A projection optical system having a complex magnification. 77. The exposure apparatus of claim 76, wherein the pair of sub-stages are integrally moved with the main stage in a direction parallel to the first axis, and adjacent to the plurality of projection areas on the corresponding object The distance between the two projection areas is greater than the distance. The exposure apparatus of claim 76, wherein the pattern surface of the reticle is formed at a predetermined interval in a direction parallel to the first axis and extends in a direction parallel to the second axis a plurality of strip regions, in the plurality of strip regions, forming a portion of the reticle pattern for forming a first pattern on the object in a direction parallel to the second axis, and for Forming a portion of the reticle pattern of the second pattern different from the second pattern on the object; the pair of sub-stages moving in the direction parallel to the second axis and the plurality of strip-shaped regions The interval between adjacent 'zones is the same or above. The exposure apparatus according to any one of claims 76 to 78, further comprising a light shielding member that is disposed between the pair of submounts to shield the energy that is irradiated to the mask One portion of the bundle limits the range of illumination of the energy beam on the patterned side of the reticle. The exposure apparatus according to any one of claims 76 to 79, further comprising at least one of the pair of sub-stages, and transferring the masks to and from the main stage Adapter. 81. The power transmission device is configured to transmit power between the first axis and the second device in a two-dimensional plane including the second axis and the second axis of the plane 2011 94976, and the power transmission device is provided. · moving and & the retractable member '-end is connected to the moving body and is connected to the external device to form the transmission path of the power; ^ connecting the i-H rotating member, the flexible member The other end of the long-side direction is fixed to the wide-knife, and can be rotated around the second axis parallel to the second axis to a predetermined range; and, Ο Ο the second rotating member The second fixing of the one end side of the longitudinal direction of the flexible member is configured such that the ith rotating member can be approached and separated by moving in a direction parallel to the sleeve with the moving body. The second axis parallel to the second axis is rotated at least in a predetermined range. 82. The power transmission device of claim 81, wherein the third suspect member is provided in a follow-up moving body that can follow the movement of the moving body in a direction in which the first axis is parallel. The third intermediate portion between the first intermediate portion and the second intermediate portion is defined as being "rotatable" at least at least about the third axis parallel to the second axis. 83. The power transmitting device of claim 82, wherein the following moving system follows the movement 胄-half< movement speed. 84. The power transmission device of claim 83, wherein the money moving system is connected to the moving body through the long side direction < the end end is connected to the moving body and the other end is solidified by $' and the middle of the long side direction A portion of the traction member that is hooked to the following moving body and is flexible is pulled by the moving body. 85. If the application is in the range of 帛82 to 84帛, the power transmission 95 201100976 reaches the device, wherein the moving body and the following moving system are extended on the same guide in a direction parallel to the second axis, Guided in a direction parallel to the axis of the second axis. a is not transmitted by the power of the earth. The middle portion of the flexible member is intermediate with the third portion. The distance between the files and the distance between the second intermediate portion and the third intermediate portion are the same. 87. The power transmission device of any one of claims 82 to 86, wherein the flexible member comprises a pair of sides extending to the first axis and the other side with respect to the moving body One side of each side is connected to the side flexible member and the other side of the movable member; the first to third rotating members correspond to one side of the flexible member and the other side The flexible member 'is respectively disposed on one side and the other side of the moving body. The party of the financial party. The power of the 81st item of the patent of the month I. The flexible member includes Μ^ 对8 The movable bodies are respectively disposed on one side of the direction parallel to the first axis and the other side of the other side, and one end thereof is respectively connected to the side flexible member and the other side flexible member of the moving body; The moving body/the second and second rotating members are corresponding to the other side flexible member, and the octagonal member and the square h η are disposed on one side of the moving body in a direction parallel to the 帛1 axis. And the other side. Shen Shiyan 89, as claimed in the scope of patents No. 61 to 8, up to the power of any of Yin, ★ The electrically connected fiber component includes a fluid for communicating the mobile body and the external device for any of the wires between the mobile body and the external device. 96 201100976 · The device is configured to expose an object with an energy beam via a pattern holder having a predetermined pattern to transfer the pattern to the object, and the method includes: - the moving system guides the pattern holder to be parallel to the first axis A power transmission device according to any one of claims 81 to 89; and an object holding device that holds the object and guides the object in a direction parallel to the second axis. Ο 〇 91 · as claimed An exposure apparatus according to any one of items 48 to 68, wherein the size of the object system is T von 50 〇 mm or more. 92. The method for manufacturing a component, comprising: The action of exposing the object by the exposure device of any of the inventions in the range of 51 to 8 〇, the soil δυ, 90, 91; and the action of developing the object after the exposure. A method for manufacturing a display, comprising: using an exposure device to expose a substrate for a flat panel display to an operation of the substrate; and U 30 for developing the substrate after exposure; Long eight, schema: (such as the next page) 97