TW201105699A - Epoxy resin composition, prepreg and cured products thereof - Google Patents
Epoxy resin composition, prepreg and cured products thereof Download PDFInfo
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- TW201105699A TW201105699A TW099118474A TW99118474A TW201105699A TW 201105699 A TW201105699 A TW 201105699A TW 099118474 A TW099118474 A TW 099118474A TW 99118474 A TW99118474 A TW 99118474A TW 201105699 A TW201105699 A TW 201105699A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/241—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
- C08J5/244—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/625—Hydroxyacids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/249—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/852—Encapsulations
- H10H20/854—Encapsulations characterised by their material, e.g. epoxy or silicone resins
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- H10W40/251—
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- H10W74/47—
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2363/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
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- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Epoxy Resins (AREA)
- Reinforced Plastic Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
201105699 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種新型環氧樹脂組成物、以及使用上 述環氧樹脂組成物所獲得之預浸體。另外,本發明係關於 一種使上述環氧樹脂組成物或預浸體硬化而成之硬化物。 【先前技術】 環氧樹脂組成物通常成為機械性質 '耐水性、耐化學 〖生、耐熱性、電氣性質等優異之硬化物,而利用於接著 劑、塗料、積層板、成形材料、注型材料等廣泛領域。近 年來,對於此等領域中所使用之環氧樹脂之硬化物,要求 以高純度化為代表之難燃性、耐熱性、耐錢、強勃性、 低線膨脹率、低介電常數特性等各特性之進—步提昇。 尤其是於作為;裒氧樹月旨組成物之代表'11用途之電氣、 電子產業領域中’卩多功能化、高性能化、小型化為目的 之半導體之高密度封裝或印刷電路板之高密度佈線化正不 斷發展Ctc间密度封農化或高密度佈線化使自半導體 :件或印刷電路板之内部所產生之熱增加,會成為引起機 j之誤動作的原因1此,就能量效率或機器^計方面 而°如何將所產生之熱高效率地釋放至外部亦成為重要 之課題。 作為針對此等由熱所引起之問題之對策,業界研究了 ,匕金屬芯基板、:者於設計之階段組裝易於散熱之構 導熱填料等各種方法Μ:是材脂)中細密地充填高 見狀係由於連接高導熱部位 2〇1105699 之作為黏合劑之高分子材料的導熱率較低,因此高分子材 料之導熱速度變成限速,而無法有效地散熱。 作為實現環氧樹脂之高導熱化之方法,於專利文獻ι 中,報告有將液晶原基導入至環氧樹脂結構中之方法◊於 “文獻中’作為具有液晶原基之環氧樹脂,記載有具有聯 ^骨架之環氧樹脂等。另外’作為除聯苯骨架以外之環氧 樹脂,記載有苯甲酸苯醋型環氧樹脂,但該環氧樹脂必須 利用由氧化所引起之環氧化反應來製造,因此安全性或成 本存在問題,而不能說其具有實用性。 另外’於專利文獻2〜4中,記載有使用具有聯苯骨架 :環氧樹脂之例,其中,於專利文獻3中記載有併用具有 向導熱率之無機填充材之方法。但是,藉由此等文獻中所 己載之方法所獲得之硬化物的導熱性並非為滿足市場需求 =水平,f界要纟―種使用能夠比較廉錢獲得之環氧樹 脂的提供具有更高導熱率之硬化物之環氧樹脂組成物。 另外,認為與環氧樹脂同樣,環氧樹脂組成物中所含 有之硬化劑亦為實現高導熱化之重要因素。先前,作為強 調其硬化物具·有高導熱率之環氧樹脂組成物中所含有的硬 化劑’於專利文獻丨中報告有使用4,4,_二胺基二苯甲酸苯 酉曰4’4 ·一胺基二苯甲烷等胺系硬化劑之例,於專利文獻2 及3中報告有使用丨,5_二胺基萘等胺系硬化劑之例。但是, 由於此等胺系硬化劑具有硬化促進作用,因此難以確保製 作硬化物時之使用期限,而不能說其較佳。另一方面於 專利文獻4中,係使用酚化合物作為硬化劑。於專利文獻4 201105699 中具體而5係使用鄰苯二盼盼酿清漆,但藉由該文獻中 所記載之方法所獲得之硬化物的導熱性亦非滿足市場需求 =平f界期望發-種提供具有更高導熱率之硬化物 的環氧樹脂組成物。 專利文獻1 :日本特開平1 1-323162號公報 專利文獻2 :日本特開2_·2573號公報 專利文獻3 :日本特開2〇〇6 633 15號公報 專利文獻4:日本特開2〇〇3_137971號公報 【發明内容】 本發明係為解決此種問題進行研究而結果所得者,提 供—種其硬化物具有高導熱性之環氧樹脂組成物。 本發明者等人為解決上述課題而努力研究,結果完成 本發明。 即’本發明係關於如下者: (1) 一種環氧樹脂組成物,係含有如下成分而成: 0')環氧樹脂, (b)作為硬化劑之藉由下述式(1)〜(5)所示之化合物之 種以上與經基苯甲酿類反應而得之盼化合物, 0201105699 VI. Description of the Invention: [Technical Field] The present invention relates to a novel epoxy resin composition and a prepreg obtained by using the above epoxy resin composition. Further, the present invention relates to a cured product obtained by hardening the above epoxy resin composition or prepreg. [Prior Art] The epoxy resin composition is generally used as a hardened material having excellent mechanical properties such as water resistance, chemical resistance, heat resistance, electrical properties, etc., and is used for an adhesive, a coating, a laminate, a molding material, and an injection molding material. And so on. In recent years, the hardened materials of epoxy resins used in these fields are required to be characterized by high purity, such as flame retardancy, heat resistance, money resistance, strong bouncing property, low linear expansion ratio, and low dielectric constant property. And so on, the advancement of each feature. In particular, the high-density packaging or printed circuit board of semiconductors for the purpose of multi-function, high-performance, and miniaturization in the field of electrical and electronic industries, which represent the '11 applications of the 裒 树 月 月 旨Density cabling is continually developing Ctc density ablation or high-density wiring, which increases the heat generated from the inside of a semiconductor: a printed circuit board, which may cause a malfunction of the machine j. It is also an important issue to how to efficiently release the generated heat to the outside. As a countermeasure against such problems caused by heat, the industry has studied various methods such as enamel metal core substrates, assembly of heat-conductive fillers that are easy to dissipate at the design stage, and the like. Since the thermal conductivity of the polymer material which is a binder which connects the high heat conductive portion 2〇1105699 is low, the heat transfer rate of the polymer material becomes a speed limit, and heat cannot be efficiently dissipated. As a method for realizing high thermal conductivity of an epoxy resin, a method for introducing a liquid crystal primordium into an epoxy resin structure is reported in the patent document yi, and is described in the literature as an epoxy resin having a liquid crystal primordium. There is an epoxy resin having a skeleton, etc. In addition, as an epoxy resin other than a biphenyl skeleton, a phenyl benzoate type epoxy resin is described, but the epoxy resin must utilize an epoxidation reaction caused by oxidation. In order to manufacture, there is a problem in terms of safety and cost, and it cannot be said that it has practicality. Further, in Patent Documents 2 to 4, an example in which a biphenyl skeleton: an epoxy resin is used is described, in Patent Document 3 A method of using an inorganic filler having a thermal conductivity in combination is described. However, the thermal conductivity of the cured product obtained by the method described in the literature is not to satisfy the market demand = level, and the f-boundary is used. An epoxy resin composition capable of providing a cured product having a higher thermal conductivity than an epoxy resin obtained by a low-cost one. Further, it is considered that the epoxy resin composition is the same as the epoxy resin. The hardener contained therein is also an important factor for achieving high thermal conductivity. Previously, as a hardener which emphasizes a cured product and an epoxy resin composition having high thermal conductivity, it is reported in the patent document 使用 4, Examples of amine-based curing agents such as 4,-diaminodibenzoate benzoquinone 4'4-monoaminodiphenylmethane, and patents 2 and 3 report the use of an amine such as hydrazine or 5-diaminonaphthalene. However, since these amine-based hardeners have a hardening-promoting action, it is difficult to ensure a service life in the case of producing a cured product, and it cannot be said that it is preferable. On the other hand, in Patent Document 4, phenol is used. The compound is used as a hardener. In Patent Document 4 201105699, the phthalic acid varnish is specifically used in the 5th embodiment, but the thermal conductivity of the cured product obtained by the method described in the literature does not satisfy the market demand. In the prior art, it is desired to provide an epoxy resin composition having a cured material having a higher thermal conductivity. Patent Document 1: Japanese Laid-Open Patent Publication No. Hei No. Hei. Japanese special opening 2〇〇6 633 15 SUMMARY OF THE INVENTION The present invention has been made to solve such a problem, and as a result, an epoxy resin composition having a high thermal conductivity of a cured product is provided. The present inventors have made an effort to solve the above problems, and have completed the present invention. The present invention relates to the following: (1) An epoxy resin composition comprising the following components: 0') epoxy resin, (b) a compound which is obtained by reacting a compound of the following formulas (1) to (5) as a curing agent with a base benzophenone, 0
6 201105699 (式(1)中,R丨分別獨立地存在,砉_ & 不風原子、破齡A 1 〜10之經取代或未經取代之烷基、碳 ^ _ 数為6〜10之經取代 或未經取代之芳基、經基、或者碳數发 双馬1〜10之經徒或 未經取代之烷氧基中的任一者。1表 〆 '、汉1之數目,且* 〇 〜4之整數), 且馬 (2) (式(2)中’ R2分別獨立地存在,表 π不虱原子、碳數為1 〜20之經取代或未經取代之烷基、破赵 尻數為6〜10之經取代 或未經取代之芳香基、碳數為1〜丨5 <經取代或未經取代 之烧基幾基、昧琳基幾基、碳數為2〜ιπ ·ν , 之經取代或未經 取代之烧基a旨基、碳數A 1〜ίο《經取代或未經取代之产 氧基、鄰苯二甲醯亞胺基、向日葵基或羥基中的任一者)^ Η II ΗWh (3) m m (式(3)中,R3分別獨立地存在,表示氫原子、碳數為〇 〜ίο之經取代或未經取代之烧基艘基、碳數為ι〜ι〇之經 取代或未經取代之烧基、碳數為6〜10之經取代或未經取 代之芳香基、碳數為2〜1〇之經取代或未經取代之烷基酯 7 201105699 代之燒氧基或者經基 1、2中之任_整數。 2之關係), 基、碳數為1〜10之經取代或未經取 中的任一者。η表示碳數,且表示〇、 m表示R3之數目,且滿足+ Η6 201105699 (In the formula (1), R丨 exists independently, 砉_ & a non-wind atom, a substituted or unsubstituted alkyl group of a broken age A 1 to 10, and a carbon number of 6 to 10 Any one of a substituted or unsubstituted aryl group, a thiol group, or a carbon number, a cyclist or an unsubstituted alkoxy group of 1 to 10; * 〇~4 integer), and horse (2) (in the formula (2), 'R2 exist independently, and the table π is not a halogen atom, and the substituted or unsubstituted alkyl group having a carbon number of 1 to 20 is broken. A substituted or unsubstituted aromatic group having a number of 6 to 10, a carbon number of 1 to 丨5 < a substituted or unsubstituted alkyl group, a fluorenyl group, and a carbon number of 2~ Ιπ ·ν , substituted or unsubstituted alkyl group, carbon number A 1~ίο "substituted or unsubstituted oxo, phthalimido, sunflower or hydroxyl Either ^ II ΗWh (3) mm (in the formula (3), R3 is independently present, and represents a hydrogen atom, a substituted or unsubstituted burnt base, carbon having a carbon number of 〇~ίο The number ι ~ι〇 is replaced or Substituted alkyl group, substituted or unsubstituted aryl group having 6 to 10 carbon atoms, substituted or unsubstituted alkyl ester having 2 to 1 carbon number, 7 201105699 Any one of the bases 1 and 2 is an integer of 2, and the base or carbon number is 1 to 10, either substituted or unsubstituted. η represents the carbon number, and represents 〇, m represents the number of R3, and satisfies + Η
Ο 0 (4) Η (式(4)中,I分別獨立地存在,矣_ 不氣原子、硝齡主 〜20之經取代或未經取代之烷基' 馬 經取代或未經取代 歌為6〜10之經取_抑 或未經取代之芳香基、碳數為1〜丨〇之 、 ^ 之烧氧基或羥基中的任一者),Ο 0 (4) Η (In formula (4), I exist independently, 矣 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ 6 to 10, the unsubstituted or unsubstituted aromatic group, the carbon number of 1 to 、, ^ any of the alkoxy groups or the hydroxyl group),
(式(5)中’ Rs分別獨立地存在,表 衣不氫原子、碳數為 〜20之經取代或未經取代之烷基、碳數為6〜1〇之經取代 或未經取代之芳香基、碳數為〗〜〗〇之經取代或未經取代 之烷氧基或者羥基中的任一者。另外,11為之整數), 以及 (c)導熱率為20 W/m.K以上之無機填充材。 (2)—種環氧樹脂組成物,係含有如下成分而成: (a)使前項(1)之酚化合物進而與環氧鹵丙燒 8 201105699 (epihalohydrin)反應而得之環氧樹脂, (b')硬化劑,以及 ⑷導熱率為2〇 w/m.K以上之無機填充材。 (3) -種環氧樹脂組成物,係含有如下成分而成·· (a) 前項(2)之環氧樹脂, (b) 刖項(1)之盼化合物,以及 (c) 導熱率為20 w/m.K以上之無機填充材; (4) 如前項⑴至(3)中任—項之環氧樹脂組成物,其用於 半導體密封用途; ' ' (5) -種預浸體,係由前項⑴至(3)中任一項之環氧樹脂 組成物及片狀之纖維基材所構成。 曰 ⑹-種硬化物,係使前項⑴至⑷中任一項之環氧樹脂 組成物、或前項(5)之預浸體硬化而成。 本發明之環氧樹脂組成物由於其硬化物之導熱優異, 因此在用於以半導體密封材料、預浸體為代表之各種複合 材料、接著劑、塗料等之情況下有用。 【實施方式】 本發明之環氧樹脂組成物係含有環氧樹脂、硬化劑及 導熱率為20 W/m.K以上之無機填充材(以下記作「(〇成 刀」)而成之環氧樹脂組成物,其含有作為硬化劑之藉由下 述式(1)〜(5)所示之化合物中之一種以上與羥基苯甲醛類的 反應而獲得之酚化合物(以下稱為「(b)成分」)、及/或作為 環氧树脂之使該(b)成分進而與環氧齒丙烷反應而獲得之環 氧化合物(以下稱為「(a)成分」)。 201105699 首先’對本發明之環氧樹脂組成物所含有之作為硬化 劑的(b)成分進行說明。(b)成分係藉由下述式(1)〜(5)所示之 化合物之一種以上與羥基苯甲醛類的反應而獲得之酚化合 物0(In the formula (5), 'Rs are independently present, and the substituted non-hydrogen atom, the substituted or unsubstituted alkyl group having a carbon number of -20, and the substituted or unsubstituted carbon number of 6 to 1 are. Any one of an aromatic group and a carbon number of a substituted or unsubstituted alkoxy group or a hydroxyl group, wherein 11 is an integer), and (c) a thermal conductivity of 20 W/mK or more Inorganic filler. (2) An epoxy resin composition comprising the following components: (a) an epoxy resin obtained by reacting a phenol compound of the above item (1) with an epoxy fluoropropene 8 201105699 (epihalohydrin), b') hardener, and (4) inorganic filler having a thermal conductivity of 2 〇 w/mK or more. (3) An epoxy resin composition containing the following components: (a) the epoxy resin of the above item (2), (b) the expectation compound of the item (1), and (c) the thermal conductivity An inorganic filler material of 20 w/mK or more; (4) an epoxy resin composition according to any one of the items (1) to (3) above, which is used for semiconductor sealing purposes; ' ' (5) - a type of prepreg, The epoxy resin composition according to any one of the above items (1) to (3), and a sheet-like fibrous base material. (6) A hardened material obtained by curing the epoxy resin composition of any one of the above items (1) to (4) or the prepreg of the above item (5). Since the epoxy resin composition of the present invention is excellent in heat conductivity of the cured product, it is useful in the case of various composite materials, adhesives, paints and the like typified by semiconductor sealing materials and prepregs. [Embodiment] The epoxy resin composition of the present invention contains an epoxy resin, a curing agent, and an epoxy resin having a thermal conductivity of 20 W/mK or more (hereinafter referred to as "(〇刀)"). a phenol compound obtained by reacting one or more of the compounds represented by the following formulas (1) to (5) with a hydroxybenzaldehyde as a curing agent (hereinafter referred to as "(b) component) ") and/or an epoxy compound obtained by reacting the component (b) with epoxidized propane as an epoxy resin (hereinafter referred to as "(a) component"). 201105699 First, the epoxy of the present invention The component (b) which is a curing agent contained in the resin composition is described. The component (b) is obtained by reacting one or more compounds represented by the following formulas (1) to (5) with a hydroxybenzaldehyde. Phenol compound 0
(Ri)i (式(1)中,心分別獨立地存在’表示氫原子 '碳數為 〜10之經取代或未經取代之烷基、碳數為6〜1〇 或未經取代之芳香基、羥基、或者碳數為丨〜1〇 或未經取代之院氧基中的任一者。1表示之數 〜4之整數)。 之經取代 之經取代 且為0 (2) 士 (式(2)中,R2分別獨立地存在,矣-& 表不虱原子、碳數為i 〜20之經取代或未經取代之烷基、碳 喊数為6〜1 〇之經取代 或未經取代之芳香基、碳數為l〜ls 〇之經取代或未經取代 之烷基羰基、昧啉基羰基、碳數為2〜1Λ ^ 2丨〇之經取代或未經 取代之烧基醋基、繼1〜10之經取代或未經取代之烧 10 201105699 氧基、鄰本二甲酿亞胺基、向曰葵基或經基中的任一者)。 於式(2)中,上述取代基較佳為選自由羰基 '酯基、烯 基、苯基、烷氧基、醚基、鄰笨二甲醯亞胺基及向日葵基 所組成之群中之至少一種。(Ri)i (In the formula (1), the heart independently represents a substituted or unsubstituted alkyl group having a carbon number of ~10, a carbon number of 6 to 1 〇 or an unsubstituted aroma. The group, the hydroxyl group, or the carbon number is 丨~1〇 or any of the unsubstituted oxy groups. 1 represents the number of 1-4. Substituted substituted and 0 (2) ± (in the formula (2), R 2 is independently present, and 矣-& represents a substituted or unsubstituted alkane having a carbon number of i -20 a substituted or unsubstituted aromatic group having a carbon number of 6 to 1 Å, a substituted or unsubstituted alkylcarbonyl group, a porphyrinylcarbonyl group having a carbon number of 1 to ls, a carbon number of 2~ 1Λ ^ 2丨〇 substituted or unsubstituted alkyl ketone, followed by 1 to 10 substituted or unsubstituted burned 10 201105699 oxy, o-benzonitrile, geranyl or Any of the bases). In the formula (2), the above substituent is preferably selected from the group consisting of a carbonyl 'ester group, an alkenyl group, a phenyl group, an alkoxy group, an ether group, an o-benzidine group, and a sunflower group. At least one.
(3) (式(3)中,R3分別獨立地存在,表示氫原子、碳數為〇 〜10之經取代或未經取代之烷基幾基、碳數為丨〜1〇之經 取代或未經取代之烧基、碳數為6〜10之經取代或未經取 代之方香基、碳數A 2〜10之經取代或未經取代之烷基醋 基、碳數A WO之經取代或未經取代之燒氧基或經基中 的任一者。n表示碳數,且表示〇 、 2中之任一整數。m 表不R3之數,且滿足〇SmSn+2之關係)〇 _ R3“㈣R經取代或未經取代 之炫基錄的情況’係μ包含構成料通式 之環烷的碳原子而成之羰基結構’例如 1 等。 山卜^-玉衣戍一嗣 於式(3)中,上述取代基較佳為醚基。 201105699(3) (In the formula (3), R3 is independently present, and represents a hydrogen atom, a substituted or unsubstituted alkyl group having a carbon number of 〇10, a substituted carbon number of 丨~1〇 or An unsubstituted alkyl group, a substituted or unsubstituted aryl group having a carbon number of 6 to 10, a substituted or unsubstituted alkyl aryl group having a carbon number of 2 to 10, a substituted carbon number A WO or Unsubstituted alkoxy or any of the radicals. n represents a carbon number and represents any integer of 〇, 2. m represents the number of R3 and satisfies the relationship of 〇SmSn+2) 〇 _ R3 "(4) The case where the R is substituted or unsubstituted by the syllabic record" is a carbonyl structure in which a carbon atom constituting the cycloalkane of the general formula is formed, for example, 1 or the like. In the above (3), the above substituent is preferably an ether group.
'八双两 1 ’碳數為6〜10之經取代 1〇之經取代或未經取代 (式(4)中’ R4分別獨立地存在 〜20之經取代或未經取代之烷基 或未經取代之芳香基、碳數為1〜 之烧氧基或經基中的任一者)。'eight double two 1' carbon number 6 to 10 substituted 1 〇 substituted or unsubstituted (in the formula (4) 'R4 independently existed ~20 substituted or unsubstituted alkyl or not A substituted aromatic group having a carbon number of 1 to an alkoxy group or a trans group).
/y'卞、碳數為1 〜20之經取代或未經取代之烷基、碳數為6〜1〇之經取 或未經取代之芳香基、碳數&丨〜1()之經取代或未經取代 之烷氧基或羥基中的任-者。另外,η為1〜10之整數)。 為獲得⑻成分,作為與經基笨甲路類之反應中所使用 之式⑴所示之化合物的具體例,可舉出鄰經基笨乙_、間 經基苯乙酮及對經基笨乙_。此等之中,就環氧樹脂組成 物之硬化物表現出較高之導熱性而言,較佳為對經基苯乙 酮。 為獲知(b)成刀’作為與經基笨甲路類之反應中所使用 之式⑺所示之化合物的具體例,可舉出:丙酮、“3•二笨基 冬丙_、2_丁網、1笨基十3-丁二酮、2-戊酮、3-戊酮、4_ 12 201105699 甲基-2-戊酮、2_己酮、3_己酮、異戊基曱基酮、乙基異丁基 酮、4-甲基_2_己酮、二苯基d,6-己二_、2_庚酮、3_庚 酮、4-庚鲖、2_甲基_4_庚酮、5•曱基_3_庚_、6-甲基_2·庚 酮、2,6·二曱基-4-庚酮、2-辛酮、3-辛酮、4-辛酮.5-曱基 -2-辛酮、2-壬酮.、3-壬酮、4-壬酮、5-壬酮、2-癸酮、3_癸 酮、4-癸嗣、5·癸酮、2_十一酮、3·十一醐、4_十一酮、% 十一酮、6-十一酮、2-甲基_4_十一酮、2_十二酮、弘十二酮、 4-十一 _、5·十二酮、6十二酮、2_十四酮、%十四酮、8· 十五酮、1〇_十九酮、7_十三酮、2十五鲷、3十六酮、 十七酮、11·二十一酮、12_二十三酮、14•二十七酮、丨三 十一酮、18-三十五酮、4-乙氧基-2-丁酮、4_(4·甲氧基笨 基)-2·丁酮、4_甲氧基_4•甲基_2_戊酮、4_曱氧基苯基丙蜩、 甲氧基丙_、苯氧基丙酮、乙醯乙酸甲酯、乙醯乙酸乙酯、 乙醯乙酸丙酯、乙酿乙酸丁酯、乙醯乙酸異丁酯、乙醯乙 酸第二丁基酯、乙醯乙酸第三丁基酯、乙醯乙酸3_戊基酯、 乙醯乙酸戊酯、乙醯乙酸異戊酯、乙醯乙酸己酯' 乙醞乙 酸庚酯、乙醯乙酸正辛酯、乙醯乙酸苄酯、乙醯基丁二酸 二曱酯、丙酮基丙二酸二曱酯、丙酮基丙二酸二乙酯、 乙醯基-5-氧代己酸乙酯、乙醯乙酸_2•甲氧基乙酯、乙醯乙 酸烯丙酯、4-第二丁氧基_2· 丁酮、苄基丁基酮、雙去甲氧 基薑黃素、1,1-二甲氧基_3· 丁酮、丨,3_二乙醯氧基丙_、4_ 羥基苯基丙酮、4-(4•羥基苯基)_2·丁酮、異戊基甲基酮、 羥基-2-丁酮、5-己烯_2-酮、丙酮基丙酮、允4二曱氧基笨 基丙酮、向曰葵基甲基酮、向曰葵基丙酮、鄰笨二曱酿= 13 201105699 胺基丙酮、4 -異丙氧基-2-丁酮、4 -異丁氧基-2-丁酮、乙醢 氧基-2-丙鲷、N-乙醯乙醢基υ末咐、1-乙醯基-4·0底咬酮等。 為獲得(b)成分,作為與羥基苯甲醛類之反應中所使用 之式(3)所示的化合物之例,可舉出:環戊酮、3-苯基環戊 酮、1,3-環戊二酮、環己_、3-甲基環己酮、.4-甲基環己酮、 4_乙基環己酮、4-第三丁基環己酮、4-戊基環己酮、3-苯基 環己酮、4-苯基環己酮、3,3-二甲基環己酮、3,4-二曱基環 己綱、3,5-二甲基環己酮、4,4-二甲基環己酮、3,3,5-三甲基 環己酮、4-環己酮曱酸乙酯、1,4-環己二酮單乙烯縮酮、二 環己烷-4,4,-二酮單乙烯縮酮' 1,3-環己二酮、1,4-環己二 酮、達米酮、4,4,-二環己酮、環庚酮等。 為獲得(b)成分’作為與羥基苯甲醛類之反應中所使用 之式(4)所示的化合物之例,可舉出:2,3 -丁二酮、2,3 -戊二 酮、3,4-己二酮、5 -甲基-2,3 -己二酮、2,3_庚二酮等。 為獲得(b)成分’作為與羥基苯甲醛類之反應中所使用 之式(5)所示的化合物之具體例,可舉出:乙醯丙酮、二乙 醯乙酸乙酯、2,5-己二酮、3-甲基-2,4-戊二酮、3·乙基·2,心 戊一酮、3-丁基-2,4-戊二酮.3-苯基-2,4-戊二酮、3-丁基_2,4_ 戊二酮等。 示之化合物之一種 例如可舉出鄰羥基 等。此等既可僅使 ’就環氧樹脂組成 ,較佳為單獨使用 為獲得(b)成分,作為與式(1)〜(5)所 以上的反應中所使用之羥基苯甲醛類, 苯甲酸、間羥基苯甲醛及對羥基苯曱醛 用—種,亦可併用兩種以上。此等之中 物之硬化物表現出特別高之導熱性而言 201105699 對經基苯甲酿。 -(b)Tr係於酸性條件τ或驗性條件τ,藉由式⑴〜(5) 冑以上與羥基苯甲醛類的醛醇縮合反應 而獲得。 為倍匕苯甲駿類相對於式⑴所示之化合物1莫耳,較佳 馬使用1.0 ^ 1 〇 s甘τγ . ^ ^ 5莫耳,相對於式(2)〜式(5)所示之化合物j 莫耳,較佳為使用2.0〜3.15莫耳。 於酸性條件下進行酿醇縮合反應時,作為可使用之酸 ^媒’可舉出:鹽酸、硫酸、硝酸之類的無機酸’甲苯 卜-曱苯續酸、草酸等有機酸。此等既可單獨使用, 併用多種°酸性觸媒之使用量相對於歸苯甲路類1 莫耳為〇.01〜U莫耳,較佳為0.2〜0.5莫耳。 另一方面,於鹼性條件下進行醛醇縮合反應時作為 ^之驗|±觸媒’可舉出:氫氧化納及氫氧化鉀等金屬 :—化物’碳酸鉀及碳酸鈉等碳酸鹼金屬帛,二乙基胺、 、胺一丁基胺、二異丁基胺、吡啶及哌啶等胺衍生 彳及一甲基胺基乙醇及二乙基胺基乙醇等胺基醇衍生 ,。於鹼性條件之情況下,既可單獨使用上述所舉出之鹼 =觸媒’亦可併用多種。驗性觸媒之使用量相 甲輕類=耳為(Μ〜2·5莫耳,較佳為0.2〜20莫耳。本 可使用成^之反應中’視需要亦可使用溶劑。作為 性 /合劑,若為如酮類般具有與羥基苯甲醛類之反應 性者,則並無特別限制,但就易於使作為原料之羥基苯甲 醛類溶解之方面而言,較佳為使用醇類作為溶劑。 15 201105699 反應'凰度通常為10〜90°C ,較佳為35〜7(TC。反應時 間通常為05〜1Λ, * i ϋ小時,但根據原料化合物之種類會使反應 存在差異’因此並不限定於〇·5〜1 0小時。反應結束後, ;乍為樹&取出之情況下’對反應物進行水洗後或不進行 水洗加熱減壓下自反應液t杨未反應物或溶劑等。 ;乂、’》阳之形式取出之情況下,藉由將反應液滴加至大量 之水中而使結晶析出°於驗性條件下進行反應冑,所生成 之(b)成刀亦有可能溶入水中,因此添加鹽酸等而形成中性_ 酸性條件,使其作為結晶而析出。 、人對本發明之環氧樹脂組成物所含有之作為環氧 樹脂的(a)成分進行說明。 本發明之環氧樹脂組成物所含有之0)成分係藉由使利 用上述方法所獲得之(b)成分與環氧齒丙烷反應,並進行環 氧化而獲得。再者’於環氧化時,既可僅使用一種⑻成分, 亦可併用兩種以上。另外,於(b)成分中亦可併用⑻成分以 外之酚化合物。 作為可併用之(b)成分以外之酚化合物,若為作為環氧 樹脂之原料而通常使用之酚化合物,則可無特別限制地使 用,但因有損及硬化物具有較高之導熱率這一本發明之效 果之虞,故較佳為可併用之酚化合物之使用量極少,特佳 為僅使用(b)成分。 作為(a)成分’就可獲得具有特別高之導熱率之硬化物 而言,較佳為使用藉由羥基苯曱醛類與式(3)所示之化合物 之反應所獲得的(b)成分而獲得之環氧化物。 16 201105699 於獲得⑷成分之反應中,作為環氧函丙院,可使用. 表氣醇、"基表氣醇1·甲基表氣醇、表演醇等,較佳 為工業上容易獲得之矣翕 衰氧鹵丙院之使用量相對 成分之録1莫耳通常為2〜莫耳,較佳為4〜15莫耳。 作為可用於環氧化反應之驗金屬氫氧化物,可舉出. 氫氧化鈉、氫氧化钟等’此等可直接使用固形物,或者亦 可使用此等之水溶液。於使用水溶液之情況下’亦可為如 下方法:將該鹼金屬氫氧化物之水溶液連續地添加至反應 系統内,並且藉由分液而自於減壓下或常壓下連續地餾出^ 之水與環氧函丙烧之混合液中去除水’而僅使環氧齒丙烷 連續地返回至反應系統内。驗金屬氫氧化物之使用量相對 於W成分之絲i莫耳通常為〇〜3Q莫耳,較佳為 〜2·5莫耳,更佳為丨丨〜厶^)莫耳。 為促進環氧化反應,較佳為添加四甲基氣化敍、四甲 基溴化銨、三曱基苄基氣化銨等四級銨鹽作為觸媒。作為 四級銨鹽之使用量,相對於(b)成分之羥基丨莫耳通常為〇1 〜15 g ’較佳為〇.2〜1〇 g。 另外,於環氧化時,就反應進行方面而言,較佳為添 加曱醇、乙醇、異丙醇等醇類,二曱基砜、二曱基亞砜、 四氮呋喃、二0号烷等非質子性極性溶劑等來進行反應。 於使用上述醇類之情況下,其使用量相對於環氧_丙 院之使用量通常為2〜50質量%,較佳為4〜20質量0/c^另 外,於使用非質子性極性溶劑之情況下,相對於環氧鹵丙 烷之使前量通常為5〜100質量%,較佳為1〇〜8〇質量0/。。 17 201105699 反應溫度通常為30〜90°C ’較佳為35〜8(TC。反應時 間通常為0.5〜10小時,較佳為1〜8小時。 反應結束後’對反應物進行水洗後或不進行水洗,於 加熱減壓下自反應液中去除環氧南丙烷或溶劑等。另外, 為進一步減少(a)成分中所含有之水解性_素之量,亦可將 所回收之(a)成分溶解於甲苯、甲基異丁基酮等溶劑中,添 加虱氧化納、氫氧化鉀專驗金屬氫氧化物之水溶液而進行 反應。藉由進行上述操作,可確實地進行開環。於此情況 下’鹼金屬氫氧化物之使用量相對於(b)成分之羥基丨莫 耳,通常為0.01〜0.3莫耳,較佳為0.05〜〇2莫耳。反應 /皿度通常為50〜120C,反應時間通常為ο」〜2小時。 反應結束後,藉由過濾、水洗等去除所生成之鹽,進 而於加熱減壓下餾去溶劑,藉此獲得(a)成分。另外,於(a) 成分作為結晶析出之情況下,亦可於將所生成之鹽溶解於 大量之水中後’濾取(a)成分之結晶。 以下對本發明之環氧樹脂組成物加以記載。 本發明之環氧樹脂組成物包含環氧樹脂、硬化劑 '以 ,導熱率為2G 之無機填充材,且含有作為環 氧樹脂之(a)成分及作為硬化劑之(b)成分中之至少任一者作 為必需成分。 於本發明之環氧樹脂組成物中,作為環氧樹脂之⑷成 分可單獨使用,或者可與其他環氧樹脂(以下稱為»成分」) 併用。 作為(a,)成分之具體例,可舉出:雙酚類(雙酚a、雙酚 18 201105699 F、雙酚S、聯苯酚、雙酚ad及雙酚i等)或酚類(苯酚、經 烧基取代之苯紛、經芳香族取代之苯盼、萘酚、經院基取 代之萘齡、二羥基苯、經烷基取代之二羥基苯及二羥基萘 等)與各種酸(曱路、乙醛、烷基醛、苯甲醛、經烷基取代之 本曱酿、經基本甲酸·、萘曱酸、戊二路、苯二甲搭、巴豆 醛及桂皮醛等)之縮聚物、二甲苯等芳香族化合物與甲醛之 縮聚物與齡類之縮聚物、齡類與各種二稀化合物(二環戊二 烯、萜烯類、乙烯基環己烯、降義二烯、乙烯基降_烯、 四氫茚、二乙烯基苯、二乙烯基聯苯、二異丙烯基聯苯、 丁一烯及異戊二烯等)之縮聚物、酚類與酮類(丙酮、甲基乙 基酮、曱基異丁基酮、笨乙酮及二苯曱酮等)之縮聚物、酚 類與芳香族二曱醇類(苯二甲醇及聯苯二曱醇等)之縮聚 物、酚類與芳香族二氣甲基類U,a,·二氣二甲苯及二氣曱 基聯苯等)之縮聚物、酚類與芳香族雙烷氧基甲基類(雙甲氧 基曱基苯雙曱氧基曱基聯苯及雙苯氧基甲基聯苯等)之縮 聚物、雙酚類與各種醛之縮聚物、以及將醇類等縮水甘油 化而成之縮水甘油㈣、環氧樹脂、脂環式環氧樹脂、縮水 甘油胺系%氧樹脂、縮水甘油g旨系環氧樹脂等,只要為通 常所使用之環氧樹脂,則並不限定於此等。此等既可僅使 用一種,亦可併用兩種以上。 $於併用U’)成分之情況下,⑷成分於本發明之環氧樹脂 ^且成物中之所有J衮氧樹脂成#中所佔的比例較佳$ 3〇質量 %以上’更佳為4〇質量%以上進而更佳為質量。,。以上, 特佳為100質量%(不併用(a,)成分之情況)。其中於使用⑷ 19 201105699 下,以於所有環 成刀作為環氧樹脂組成物之改質劑之情況 氧樹脂中達到1〜3〇質量%之比例添加。 於本發明之環氧樹脂組成物中 可簞作為硬化劑之(b)成分 单蜀使用,或者可與其他硬化劑併用。 ,作為本發明之環氧樹脂組成物所含有之其他硬化劑(以 下稱為「(b’)成分)’例如可舉出:胺系化合物、酸酐系化合 物、酿胺系化合物及㈣化合物[將此等⑽成分之具體 例示於下述(a)〜。 (a)胺系化合物. 〇二胺基二苯基甲烷、二乙三胺、三乙四胺、二胺基二 苯基砜、異佛酮二胺及萘二胺等 (b)酸酐系化合物 鄰苯二曱酸酐、偏苯三甲酸酐、均笨四曱酸二酐、順 丁烯二酸酐、四氫鄰苯二甲酸酐、甲基四氫鄰苯二曱酸酐、 曱基耐地酸酐、六氫鄰苯二甲酸酐及甲基六氫鄰笨二曱酸 酐等 (c) 醯胺系化合物 由二氰基二醯胺或次亞麻油酸之二聚物與乙二胺所合 成之聚醯胺樹脂等 (d) 酚系化合物 多酚類(雙酚A、雙酚F、雙酚S、第雙酚、萜二齡、4,4,-二羥基聯苯、2,2’-二羥基聯笨、3,3’,5,5·-四甲基-(ij,-聯笨 基)·4·4'·二醇、對苯二酚、間苯二酚、萘二醇、三•經基 苯基)曱烷及1,1,2,2-四(4-羥基笨基)乙烷等);藉由酚類(例 20 201105699 如苯酚、經烷基取之苯酚、萘酚、經烷基取代之萘酚、二 羥基苯及二羥基萘等)與醛類(曱醛、乙醛、苯甲醛、對羥基 笨曱醛、鄰羥基苯甲醛及糠醛等)、酮類(對羥基苯乙酮及鄰 羥基苯乙酮等)或二烯類(二環戊二烯及三環戊二烯等)之縮 合所獲得之酚樹脂;藉由上述酚類與經取代之聯苯類(4,4,-雙(氣甲基)-1,1,-聯苯及4,4,-雙(甲氧基甲基)-1,1,·聯苯等)或 經取代之苯基類(1,4-雙(氣甲基)苯、i,4-雙(甲氧基甲基)苯 及1,4-雙(經基曱基)苯等)等之縮聚所獲得之酚樹脂;上述 紛類及/或上述酴樹脂之改質物;四溴雙朌A及溴化齡樹 脂等函化紛類 (e)其他咪唑類、BF:j-胺錯合物、胍衍生物 於此等(b,)成分之中,較佳為二胺基二苯基甲烷,二胺 基二苯基砜及萘二胺等胺系化合物,以及鄰苯二酚與醛 類、酮類、二烯類、經取代之聯苯類或經取代之苯基類之 縮合物等。此等成分具有活性氫基彼此鄰接之結構,藉此 環氧樹脂良好地排列。例如’於與鄰笨二酚之縮合物之情 況下,藉由熱硬化而反應之羥基彼此位於鄰位上,因此: 並列地排列之方式聚合。另—方面,若㈣硬化 時反應之氫基經由氮原子而並列地排列,Q此於此情況下 亦以並列地排列之方式聚合。 (b')成分既可單獨使用,亦可併用多種。 於併用(b,)成分之情況下,⑻成分於本發 組成物中之所有硬化劑成分中 氧樹月曰 削珉刀中所佔的比例較佳 以上,更佳為30質量%以上 巧20質量/〇 上進而更佳為7〇 f 4 21 201105699 特佳為100質量%(不併用(b,)成分之情況)。 於本發明之環氧樹脂組成物中,包含(b)成分之所有硬 化劑之使用量相對於所有環氧樹脂之環氧纟1當量較佳為 0.5〜2.0當量,特佳為〇6〜15當量。 作為本發明之環氧樹脂組成物,最佳為使用1 00質量% 之作為環氧樹脂之⑷成分,並使㈣〇質量%之料硬化劑 之(b)成分的情況。 本發明之環氧樹脂組成物所含有之無機填充材係以對 環氧樹脂組成物的硬化物賦予更高之導熱率為目的而添加 者,當無機填充材本身之導熱率過低時,有藉由環氧樹脂 與硬化劑之組合所獲得之高導熱率受損之虞。因此,作為 =發明之環氧樹脂組成物所含有之無機填充材,導熱率越 同者越佳〃要係具有通常為2〇 爪κ以上較佳為川 w/m.K以上、更佳為5〇 w/m κ以上之導熱率者則並 無任何限制。再者’此處所述之導熱率係指以根據ASTM E153G之方法所測定之值。作為具有此種特性之無機填充 材之具體例,可舉出:氮化硼、氮化鋁、氮化矽、碳化矽、 氧化辞、碳化鎢、氧化鋁、氧化鎂等無機粉末填 充材’合成纖維、陶瓷纖維等纖維質填充材,I色劑等: 此等無填充材之形狀可為粉末(塊狀、球狀)、單絲、長絲等 中之任-纟,尤其是若為平板狀者,則藉由無機填充材本 身之積層效果而使得硬化物之導熱性變得更高且硬化物 之散熱性進一步提昇,故較佳。 本發明之環氧樹脂組成物中之無機填充材的使用量相 22 201105699 對於環氧樹脂組成物中之樹脂成分1〇〇質量份通常為2〜 \000質量份,較佳為4〇〇〜1〇〇〇質量份,但為了儘可能地 提高導熱率,較佳為於不對本發明之環氧樹脂組成物在具 體用途中之使用等造成障礙的範圍内,儘可能地增加無機 填充材之使用量。此等無機填充材既可僅使用一種,亦可 併用兩種以上。 另外,若為可將作為填充材整體之導熱率維持於20 W /m.K以上之範圍,則亦可於導熱率為2〇 κ以上之 無機填充材中併用導熱率為2〇 W// m. κ以下之填充材,但 就儘可能獲得導熱率較高之硬化物的本發明之目的而言, 導熱率為20 W/m.K α下之填充材之使用應限於最小限 度。可併用之填充材之種類或形狀並無特別限制。 於將本發明之環氧樹脂組成物用於半導體密封用途以 及預浸體用途之情況下,就硬化物之耐熱性、耐濕性、力 學性質等方面而言,較佳為以於環氧樹脂組成物中佔6〇〜 93質量%之比例使用導熱率為2〇 w/m.K以上之無機填充 材。於此情況下,殘部為環氧樹脂成分、硬化劑成分及其 他視需要而添加之添加劑,作為添加劑,係可併用之其他 無機填充材或後述之硬化促進劑等。 、 本發明之環氧樹脂組成物只要含有作為環氧樹脂之⑷ 成分及作為硬化劑之⑻成分中的至少任—者作為必需成分 即可’除上料㈣之態樣料,即便以切氧樹脂(並 無特別限定,但較佳為例如上述⑻成分)與⑻成分及(C)成 分之組成物、或者包含⑷成分與硬化劑(並無特别限定,但 23 201105699 較佳為例如上述(b,)成分)及(c)成分之組成物,與包含(3)成 分與(b)成分及(c)成分之組成物同樣,其硬化物亦具有優異 之導熱性。 於本發明之環氧樹脂組成物中亦可含有硬化促進劑。 作為可使用之硬化促進劑’例如可舉出:2_曱基味。坐、2-乙基咪唑、2-苯基咪唑及2-乙基-4-甲基咪唑等咪唑類,2-(二 曱基胺基曱基)苯酚、三乙二胺、三乙醇胺及丨,8•二氮雜雙 環(5,4,〇)十一烯_7等三級胺類,三苯基膦 '二苯基膦及三丁 基膦等有機膦類’辛酸錫等金屬化合物,四苯基鱗·四苯基 硼I鹽及四苯基鱗·乙基三苯基删酸鹽等四取代鱗-四取代 硼酸鹽,2-乙基-4-曱基咪唑-四苯基硼酸鹽及N_曱基昧啉· 四笨基硼酸鹽等四苯基硼鹽等。硬化促進劑相對於環氧樹 脂100質量份,視需要使用0.01〜15質量份。 於本發明之環氧樹脂組成物中,視需要可添加矽烷偶 合劑、脫模劑及顏料等各種調配劑,各種熱硬化性樹脂以 及各種熱塑性樹脂等◎作為熱硬化性樹脂及熱塑性樹脂之 具體例,可舉出:乙烯酯樹脂、不飽和聚酯樹脂、馬來醯 亞胺樹脂、氰酸酯樹脂、異氰酸酯化合物、苯并垮D井化合 物、乙烯基苄基醚化合物、聚丁二烯及其改質物、丙烯腈 共聚物之改質物、茚樹脂、氟樹脂、矽樹脂、聚醚醯亞胺、 聚醚颯、聚笨醚、聚縮醛、聚苯乙烯、聚乙烯、二環戊二 稀樹脂等。熱硬化性樹脂或熱塑性樹脂係以於本發明之環 氧樹脂組成物中佔60質量%以下之量使用。 本發明之環氧樹脂組成物可藉由將上述各成分均勻地 24 201105699 可舉出半導體密封材料或 混合而稽復 α # ’作為其較佳用途 印刷電路板等。 ^發9月之環氧樹脂組成物可藉由與先前眾所周知之方 法相同之方法而容易地製成其硬化物。本發明之硬化物之 形成例如可藉由如下方式來進行:使用擠出機、捏合機或 輥等將環氧樹脂、硬化劑及導熱率為20 W/m.K以上之無 機填,材 '以及視需要之硬化促進劑、調配劑、各種熱硬 化性树爿曰或各種熱塑性樹脂等充分地混合直至達到均勻為 止而獲侍環氧樹脂組成物,然後藉由熔融澆鑄法、轉注 成型法、射出成型法或壓縮成型法等使該環氧樹脂組成物 成型,繼而於其熔點以上加& 2〜1〇 +時。於將本發明之 環氧樹脂組成物用於半導體密封用途之情況下,只要利用 上述方法將搭載於導線架等上之半導體元件密封即可。 另外,本發明之環氧樹脂組成物亦可形成為包含溶劑 之清漆。該清漆例如可藉由將包含環氧樹脂、硬化劑及導 熱率為20W/m.1C以上之無機填充材、以及視需要之其他 成分的混合物與曱苯,二甲苯,丙酮,曱基乙基酮,曱基 異丁基酮,%己酮,環戊酮,N,N,_二曱基曱醯胺,N,N,-二 曱基乙醢胺,一甲基亞*風,N-曱基。比0各啶酮,乙二醇二曱 醚、乙二醇二乙醚、二丙二醇二曱醚、二丙二醇二乙醚、 二乙一醇一曱醚、二乙二醇二乙醚等醇醚類,乙酸乙酯、 乙酸丁酯、曱基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、丁基 溶纖劑乙酸酯、卡必醇乙酸酯、丙二醇單曱醚乙酸酯、戊 一酸二烷基酯、丁二酸二烷基酯、己二酸二烷基酯等酯類, 25 201105699 r -丁内酯等環狀酯類,石油醚、石油腦、氫化石油腦及石 月b溶劑油等石油系溶劑等有機溶劑混合而獲得。炫劑之量 相對於清漆整體通常為10〜95質量%,較佳為15〜85質量 % 〇 使如上所述而獲得之清漆含浸於玻璃纖維、碳纖維、 聚酿纖維、聚醯胺纖維、氧化鋁纖維及紙等片狀纖維基材 後’藉由加熱去除溶劑,並且使該清漆為半硬化狀態,藉 此可獲得本發明之預浸體。再者,此處所謂之「半硬化狀 態」係指作為反應性官能基之環氧基的一部分未反應而殘 留之狀態。可將該預浸體熱壓成型而獲得硬化物。 實施例 以下’藉由實施例更詳細地說明本發明,但本發明並 不限定於此等實施例。於合成例、實施例、比較例中,份 表示質量份。再者’環氧當量、熔點、導熱率係藉由以下 之條件進行測定。 •環氧當量 利用JIS K-7236中所記載之方法進行測定,單位為g /eq· 〇 •熔點/y'卞, substituted or unsubstituted alkyl group having a carbon number of 1 to 20, taken or unsubstituted aryl group having a carbon number of 6 to 1 Å, carbon number & 丨~1() Any one of a substituted or unsubstituted alkoxy group or a hydroxyl group. Further, η is an integer of 1 to 10). In order to obtain the component (8), specific examples of the compound represented by the formula (1) used in the reaction with the group of the group of the formula (B) include an o-based group, a m-phenyl- acetophenone, and a ruthenium group. B_. Among these, in the case where the cured product of the epoxy resin composition exhibits high thermal conductivity, p-phenylacetophenone is preferred. For the specific example of the compound represented by the formula (7) used in the reaction with the sulfonyl group, it is known that: acetone, "3•二笨基基丙_, 2_ Ding net, 1 stupid 10-butanedione, 2-pentanone, 3-pentanone, 4_ 12 201105699 methyl-2-pentanone, 2-hexanone, 3-hexanone, isoamyl decyl ketone , ethyl isobutyl ketone, 4-methyl-2-hexanone, diphenyl d, 6-hexane di-, 2-heptanone, 3-heptanone, 4-heptanthene, 2-methyl_4 _heptanone, 5•mercapto_3_heptan_, 6-methyl-2·heptanone, 2,6·didecyl-4-heptanone, 2-octanone, 3-octanone, 4-octyl Keto. 5-mercapto-2-octanone, 2-nonanone, 3-fluorenone, 4-fluorenone, 5-fluorenone, 2-fluorenone, 3-ketone, 4-oxime, 5· Anthrone, 2_undecone, 3·11醐, 4_undecone, % undecane, 6-undecone, 2-methyl-4-indolone, 2_dodecanone, Hong Dodecanone, 4-unde-, 5-dodecanone, 6-dodecanoate, 2-tetradecanone, % tetradecanone, 8·pentadecanone, 1〇_nonadecanone, 7-tridecanone , 25 鲷, 36 ketone, heptadectone, 11 · 21 ketone, 12 - docosatrione, 14 • hexadecanone, oxime ketone, 18-35 , 4-ethoxy-2-butanone, 4-(4-methoxyphenyl)-2·butanone, 4-methoxy-4-4-2-pentanone, 4-methoxybenzene Propionate, methoxypropene, phenoxyacetone, methyl acetate, ethyl acetate, acetoacetate, butyl acetate, isobutyl acetate, acetonitrile Dibutyl ester, butyl phthalate, butyl acetate, amyl acetate, amyl acetate, amyl acetate, isoamyl acetate, hexyl acetate, heptyl acetate N-octyl acetate, benzyl acetate, dinonyl acetyl succinate, diacetone acetonate, diethyl acetonate, diethyl acetoxy-5-oxohexanoate Ester, acetamidineacetic acid _2 methoxyethyl ester, allyl acetate acetate, 4-second butoxy-2-butanone, benzyl butyl ketone, bis-demethoxycurcumin, 1, 1-Dimethoxy-3-butanone, anthracene, 3-diethoxypropoxy-, 4-hydroxyphenylacetone, 4-(4-hydroxyphenyl)_2-butanone, isoamylmethyl ketone , hydroxy-2-butanone, 5-hexene-2-one, acetonylacetone, sulfonate, ketone methyl ketone , 曰 基 基 丙酮, 邻 曱 = = 13 201105699 Aminoacetone, 4-isopropoxy-2-butanone, 4-isobutoxy-2-butanone, ethoxylated -2- Propylene, N-acetonitrile, hydrazine, 1-ethyl fluorenyl-4,0 ketone, etc. In order to obtain the component (b), the formula used in the reaction with hydroxybenzaldehyde (3) Examples of the compound shown are: cyclopentanone, 3-phenylcyclopentanone, 1,3-cyclopentadione, cyclohexyl, 3-methylcyclohexanone, .4-methyl Cyclohexanone, 4-ethylcyclohexanone, 4-tert-butylcyclohexanone, 4-pentylcyclohexanone, 3-phenylcyclohexanone, 4-phenylcyclohexanone, 3,3- Dimethylcyclohexanone, 3,4-didecylcyclohexyl, 3,5-dimethylcyclohexanone, 4,4-dimethylcyclohexanone, 3,3,5-trimethylcyclo Hexanone, ethyl 4-cyclohexanone decanoate, 1,4-cyclohexanedione monoethylene ketal, dicyclohexane-4,4,-dione monoethylene ketal '1,3-cyclohexane Ketone, 1,4-cyclohexanedione, hametiketone, 4,4,-dicyclohexanone, cycloheptanone, and the like. In order to obtain the compound represented by the formula (4) used for the reaction with the hydroxybenzaldehyde, the component (b) is exemplified by 2,3-butanedione and 2,3-pentanedione. 3,4-hexanedione, 5-methyl-2,3-hexanedione, 2,3-heptanedione, and the like. Specific examples of the compound represented by the formula (5) used for the reaction of the component (b) with the hydroxybenzaldehyde include acetamidineacetone, ethyl acetate, and 2,5- Adipone, 3-methyl-2,4-pentanedione, 3·ethyl·2, heart pentosone, 3-butyl-2,4-pentanedione. 3-phenyl-2,4 - Pentanedione, 3-butyl-2, 4-pentanedione, and the like. One of the compounds shown is, for example, an ortho-hydroxy group. These may be made only of the epoxy resin composition, preferably used alone to obtain the component (b), as the hydroxybenzaldehyde used in the reaction with the formulae (1) to (5), benzoic acid. And m-hydroxybenzaldehyde and p-hydroxybenzoquinone may be used in combination of two or more kinds. The hardened materials of these materials exhibit a particularly high thermal conductivity. 201105699 For the base benzophenone. - (b) Tr is obtained by an aldol reaction of the formula (1) to (5) oxime with a hydroxybenzaldehyde, under acidic conditions τ or an experimental condition τ. For the compound 1 of the formula (1), it is preferred that the horse is 1.0 ^ 1 〇s gan γ γ. ^ ^ 5 mol, as shown in the formula (2) to the formula (5) The compound j is preferably used in an amount of 2.0 to 3.15 moles. When the alcohol condensation reaction is carried out under acidic conditions, examples of the acid medium which can be used include organic acids such as hydrochloric acid, sulfuric acid, and nitric acid, such as toluene-nonylbenzene acid and oxalic acid. These can be used alone or in combination with a plurality of ° acidic catalysts in an amount of from 0.1 to U moles, preferably from 0.2 to 0.5 moles, relative to the benzene. On the other hand, when the aldol reaction is carried out under alkaline conditions, the test|±catalyst' is a metal such as sodium hydroxide or potassium hydroxide: an alkali metal such as potassium carbonate or sodium carbonate. An amine-derived hydrazine such as diethylamine, amine-butylamine, diisobutylamine, pyridine or piperidine, and an amino alcohol such as monomethylaminoethanol and diethylaminoethanol. In the case of an alkaline condition, the above-mentioned bases = catalysts may be used alone or in combination. The amount of the test catalyst used is a lighter class = ear is (Μ~2·5 mole, preferably 0.2~20 moles. This can be used in the reaction of ^, if necessary, a solvent can also be used. The mixture is not particularly limited as long as it has reactivity with a hydroxybenzaldehyde such as a ketone, but it is preferred to use an alcohol as a raw material for dissolving the hydroxybenzaldehyde as a raw material. Solvent. 15 201105699 The reaction 'nucleus is usually 10 to 90 ° C, preferably 35 to 7 (TC. The reaction time is usually 05 to 1 Λ, * i ϋ hours, but the reaction varies depending on the type of the raw material compound' Therefore, it is not limited to 〇·5~10 hours. After the reaction is completed, 乍 is a tree & when it is taken out, 'the reaction product is washed with water or not washed with water, heated under reduced pressure, and the reaction solution is unreacted from the reaction liquid. Or a solvent or the like. When the form of the yang is removed, the reaction is carried out by adding the reaction liquid droplets to a large amount of water to carry out the reaction under the conditions of the test, and the resulting (b) is formed into a knife. It is also possible to dissolve in water, so hydrochloric acid or the like is added to form a neutral _ acidic condition. It is precipitated as a crystal. The component (a) which is an epoxy resin contained in the epoxy resin composition of the present invention will be described. The component 0) contained in the epoxy resin composition of the present invention is utilized. The component (b) obtained by the above method is reacted with epoxidized propane and epoxidized, and in the case of epoxidation, only one (8) component may be used, or two or more kinds may be used in combination. In the b) component, a phenol compound other than the component (8) may be used in combination. The phenol compound other than the component (b) which can be used in combination may be used without particular limitation as long as it is a phenol compound which is usually used as a raw material of the epoxy resin. However, since the effect of the present invention in which the cured product has a high thermal conductivity is impaired, it is preferred that the amount of the phenol compound which can be used in combination is extremely small, and it is particularly preferable to use only the component (b). In the case of obtaining a cured product having a particularly high thermal conductivity, it is preferred to use a ring obtained by reacting the component (b) obtained by the reaction of a hydroxybenzaldehyde with a compound represented by the formula (3). Oxide. 16 2 01105699 In the reaction of obtaining the component (4), it can be used as the epoxy acrylonitrile. The gas, the alcohol, the methyl alcohol, the alcohol, etc., are preferably industrially easy to obtain.相对 翕 氧 卤 院 之 之 1 1 1 1 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫 莫Sodium oxide, hydrazine hydroxide, etc. 'These solids can be used directly, or an aqueous solution can be used. In the case of using an aqueous solution, 'the method can also be as follows: the aqueous solution of the alkali metal hydroxide is continuously added Into the reaction system, and by continuously separating the water from the mixture of water and epoxy propylene by distilling under reduced pressure or under normal pressure, and only returning the epoxide propane continuously Into the reaction system. The amount of metal hydroxide used is generally 〇~3Q mol, preferably 〜2·5 mol, more preferably 丨丨~厶^) Mo. In order to promote the epoxidation reaction, a tetra-ammonium salt such as tetramethyl gasification, tetramethylammonium bromide or trimethylbenzylammonium vaporate is preferably added as a catalyst. The amount of the quaternary ammonium salt used is usually 〇1 to 15 g' with respect to the hydroxy oxime of the component (b), preferably 〇.2 to 1 〇 g. Further, in the case of epoxidation, in terms of reaction progress, it is preferred to add an alcohol such as decyl alcohol, ethanol or isopropanol, dimercaptosulfone, dimercaptosulfoxide, tetranitrofuran, dioxane, etc. The reaction is carried out by an aprotic polar solvent or the like. In the case of using the above alcohols, the amount thereof is usually from 2 to 50% by mass, preferably from 4 to 20% by mass, based on the amount of the epoxy group, and is also used in the use of an aprotic polar solvent. In the case of the epihalohydrin, the amount is usually from 5 to 100% by mass, preferably from 1 to 8 Å by mass. . 17 201105699 The reaction temperature is usually 30 to 90 ° C. Preferably, it is 35 to 8 (TC. The reaction time is usually 0.5 to 10 hours, preferably 1 to 8 hours. After the reaction is finished, the reaction is washed or not. The water is washed, and the epoxy propylene oxide, the solvent, and the like are removed from the reaction liquid under heating and reduced pressure. Further, in order to further reduce the amount of the hydrolyzable γ element contained in the component (a), the recovered (a) may be used. The component is dissolved in a solvent such as toluene or methyl isobutyl ketone, and an aqueous solution of sodium hydroxide or potassium hydroxide is added to the metal hydroxide to carry out the reaction. By performing the above operation, the ring opening can be surely performed. In the case where the amount of the alkali metal hydroxide is usually 0.01 to 0.3 mol, preferably 0.05 to 2 mol, relative to the hydroxy oxime of the component (b). The reaction/dish degree is usually 50 to 120 C. The reaction time is usually ο" to 2 hours. After the completion of the reaction, the salt formed is removed by filtration, washing with water, etc., and the solvent is distilled off under reduced pressure under heating to obtain the component (a). When the component is precipitated as crystal, it may be The salt formed is dissolved in a large amount of water, and the crystal of the component (a) is filtered. The epoxy resin composition of the present invention is described below. The epoxy resin composition of the present invention contains an epoxy resin and a hardener. An inorganic filler having a rate of 2 G and containing at least one of the component (a) as the epoxy resin and the component (b) as the curing agent as an essential component. In the epoxy resin composition of the present invention, The (4) component of the epoxy resin may be used singly or in combination with other epoxy resins (hereinafter referred to as "components"). Specific examples of the (a,) component include bisphenols (bisphenol a, double) Phenol 18 201105699 F, bisphenol S, biphenol, bisphenol ad and bisphenol i, etc.) or phenols (phenol, substituted benzene, aromatic substituted phenyl, naphthol, trans-substituted Naphthalene, dihydroxybenzene, alkyl-substituted dihydroxybenzene, and dihydroxynaphthalene, etc.) and various acids (ruthenium, acetaldehyde, alkyl aldehyde, benzaldehyde, alkyl-substituted, basal formic acid) ·Naphthoic acid, pentane, benzophenone, crotonaldehyde a polycondensate of cinnamaldehyde or the like, an aromatic compound such as xylene, a polycondensate of formaldehyde and a polycondensate of an age, an age class, and various dilute compounds (dicyclopentadiene, decene, vinylcyclohexene, Polycondensates, phenols and the like of butadiene, vinyl-ene, tetrahydroanthracene, divinylbenzene, divinylbiphenyl, diisopropenylbiphenyl, butadiene and isoprene Polycondensates of ketones (acetone, methyl ethyl ketone, decyl isobutyl ketone, acetophenone and dibenzophenone), phenols and aromatic sterols (benzene dimethanol and biphenyl dioxime) Polycondensates of alcohols, etc., polycondensates of phenols and aromatic di-gas methyls U, a, di-dioxene and di-n-decylbiphenyl, phenols and aromatic bis-alkoxymethyl a polycondensate of a class of (dimethoxymercaptobenzoic acid fluorenylbiphenyl and bisphenoxymethylbiphenyl), a polycondensate of a bisphenol and various aldehydes, and a glycidation of an alcohol or the like Glycidol (4), epoxy resin, alicyclic epoxy resin, glycidylamine-based oxy-oxygen resin, glycidol-based epoxy resin, etc. Often the epoxy resin used is not limited thereto and the like. These may be used alone or in combination of two or more. In the case where the component (U) is used in combination, the proportion of the component (4) in the epoxy resin of the present invention is preferably more than 3% by mass or more. 4% by mass or more and more preferably quality. ,. The above is particularly preferably 100% by mass (when the (a,) component is not used in combination). In the case of using (4) 19 201105699, all of the ring-shaped knives are added as a modifier of the epoxy resin composition in an amount of 1 to 3 % by mass in the oxygen resin. The epoxy resin composition of the present invention may be used as a component of the hardener (b), or may be used in combination with other hardeners. Examples of other curing agents (hereinafter referred to as "(b') component)" contained in the epoxy resin composition of the present invention include an amine compound, an acid anhydride compound, a brewing amine compound, and (4) a compound [will Specific examples of the components (10) are shown in the following (a) to (a) amine compounds. 〇diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, and (b) an acid anhydride compound, phthalic anhydride, trimellitic anhydride, tetrasuccinic dianhydride, maleic anhydride, tetrahydrophthalic anhydride, methyl Tetrahydrophthalic anhydride, mercaptoic acid anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic acid anhydride, etc. (c) guanamine compound from dicyanodiamine or linolenic oil Polyamide resin synthesized by acid dimer and ethylenediamine (d) phenolic compound polyphenols (bisphenol A, bisphenol F, bisphenol S, bisphenol, bismuth, 4, 4 ,-dihydroxybiphenyl, 2,2'-dihydroxyl stupid, 3,3',5,5·-tetramethyl-(ij,-biphenyl)·4·4′·diol, p-benzene Diphenol, resorcinol, naphthalenediol, Tris-Phenylphenyl)decane and 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane; by phenols (Example 20 201105699 such as phenol, alkyl phenol, naphthalene) Phenols, alkyl-substituted naphthols, dihydroxybenzenes, and dihydroxynaphthalenes, etc.) with aldehydes (furfural, acetaldehyde, benzaldehyde, p-hydroxybenzaldehyde, o-hydroxybenzaldehyde, furfural, etc.), ketones ( a phenol resin obtained by condensation of p-hydroxyacetophenone and o-hydroxyacetophenone or the like (dicyclopentadiene, tricyclopentadiene, etc.); by using the above phenols and substituted biphenyls Classes (4,4,-bis(gasmethyl)-1,1,-biphenyl and 4,4,-bis(methoxymethyl)-1,1,·biphenyl, etc.) or substituted benzene Phenol obtained by polycondensation of a base such as 1,4-bis(methylmethyl)benzene, i,4-bis(methoxymethyl)benzene, and 1,4-bis(fluorenyl)benzene Resin; the above-mentioned genus and/or the above-mentioned oxime resin modification; tetrabromobiguanide A and brominated age resin and other functionalizations (e) other imidazoles, BF:j-amine complexes, anthracene derivatives Among these (b,) components, preferred is diaminodiphenylmethane, two An amine compound such as a diphenyl sulfone or a naphthalene diamine, and a condensate of catechol with an aldehyde, a ketone, a diene, a substituted biphenyl or a substituted phenyl group, etc. The component has a structure in which the active hydrogen groups are adjacent to each other, whereby the epoxy resin is well aligned. For example, in the case of a condensate with o-diphenol, the hydroxyl groups reacted by thermal hardening are in the ortho position to each other, thus: In another aspect, if (4) the hydrogen groups of the reaction are hardened by nitrogen atoms, the Q groups are also polymerized in parallel in this case. The (b') component can be used alone. In the case of using the (b,) component in combination, the proportion of the component (8) in the hardener component of the present hair composition is preferably more than or equal to, and more preferably, more preferably. It is 30 mass% or more, 20 mass / 〇, and more preferably 7 〇f 4 21 201105699 is preferably 100% by mass (when the component (b,) is not used together). In the epoxy resin composition of the present invention, the amount of all the hardeners comprising the component (b) is preferably from 0.5 to 2.0 equivalents, more preferably from 6 to 15 equivalents per equivalent of the epoxy resin of the epoxy resin. equivalent. The epoxy resin composition of the present invention is preferably a component of the component (b) which is used as the (4) component of the epoxy resin and (4) by mass% of the material hardener. The inorganic filler contained in the epoxy resin composition of the present invention is added for the purpose of imparting a higher thermal conductivity to the cured product of the epoxy resin composition. When the thermal conductivity of the inorganic filler itself is too low, The high thermal conductivity obtained by the combination of epoxy resin and hardener is impaired. Therefore, as the inorganic filler contained in the epoxy resin composition of the invention, the higher the thermal conductivity, the more preferable, and it is usually 2 〇 κ or more, preferably more than 250 w/mK, more preferably 5 〇. There is no limit to the thermal conductivity above w/m κ. Further, the thermal conductivity referred to herein means a value measured by the method according to ASTM E153G. Specific examples of the inorganic filler having such characteristics include inorganic boron fillers such as boron nitride, aluminum nitride, tantalum nitride, tantalum carbide, oxidized words, tungsten carbide, aluminum oxide, and magnesium oxide. Fiber fillers such as fibers and ceramic fibers, I-color agents, etc.: The shape of these non-filled materials may be any of powder (block, spherical), monofilament, filament, etc., especially if it is a flat plate. In the case of the inorganic filler, the thermal conductivity of the cured product is higher and the heat dissipation property of the cured product is further improved by the lamination effect of the inorganic filler itself. The amount of the inorganic filler used in the epoxy resin composition of the present invention is 22 201105699. The resin component in the epoxy resin composition is usually 2 to \000 parts by mass, preferably 4 Å. 1 part by mass, but in order to increase the thermal conductivity as much as possible, it is preferred to increase the inorganic filler as much as possible within a range that does not cause an obstacle to the use of the epoxy resin composition of the present invention in a specific use. Usage amount. These inorganic fillers may be used alone or in combination of two or more. In addition, if the thermal conductivity of the entire filler material can be maintained in the range of 20 W /mK or more, the thermal conductivity of the inorganic filler having a thermal conductivity of 2 Å or more can be used in combination with a thermal conductivity of 2 〇 W / / m. A filler of κ or less, but for the purpose of the present invention in which a cured product having a high thermal conductivity is obtained as much as possible, the use of a filler having a thermal conductivity of 20 W/mK α should be limited to a minimum. The kind or shape of the filler which can be used in combination is not particularly limited. When the epoxy resin composition of the present invention is used for semiconductor sealing applications and prepreg applications, it is preferably an epoxy resin in terms of heat resistance, moisture resistance, mechanical properties and the like of the cured product. An inorganic filler having a thermal conductivity of 2 〇 w/mK or more is used in the composition in an amount of from 6 〇 to 93% by mass. In this case, the residue is an epoxy resin component, a hardener component, and other additives added as needed, and as an additive, another inorganic filler which can be used in combination, or a hardening accelerator which will be described later. In the epoxy resin composition of the present invention, as long as it contains at least one of the component (4) as the epoxy resin and the component (8) as the curing agent, it is possible to remove the material (4), even if the oxygen is cut. The resin (not particularly limited, but preferably, for example, the component (8)), the component of the component (8) and the component (C), or the component (4) and the curing agent are not particularly limited, but 23 201105699 is preferably, for example, the above ( b, the components of the components (c) and (c) are similar to the components comprising the components (3) and (b) and (c), and the cured product also has excellent thermal conductivity. A hardening accelerator may also be contained in the epoxy resin composition of the present invention. As a hardening accelerator which can be used, for example, a 2-based base taste can be mentioned. Imidazoles such as 2-ethylimidazole, 2-phenylimidazole and 2-ethyl-4-methylimidazole, 2-(didecylaminodecyl)phenol, triethylenediamine, triethanolamine and hydrazine , a metal compound such as a tribasic amine such as benzodiazepine (5,4,fluorenyl)undecene-7, an organic phosphine such as triphenylphosphine, diphenylphosphine or tributylphosphine, and a compound such as tin octylate. Tetrasubstituted squamous-tetrasubstituted borate such as tetraphenyl sulphate tetraphenyl boron I salt and tetraphenyl sulphate ethyl triphenyl sulphate, 2-ethyl-4-mercaptoimidazole-tetraphenylboronic acid a tetraphenylboron salt such as a salt or a N-mercaptoporphyrin tetrasyl borate. The hardening accelerator is used in an amount of 0.01 to 15 parts by mass, based on 100 parts by mass of the epoxy resin. In the epoxy resin composition of the present invention, various compounding agents such as a decane coupling agent, a releasing agent, and a pigment, and various thermosetting resins and various thermoplastic resins may be added as the thermosetting resin and the thermoplastic resin. Examples thereof include a vinyl ester resin, an unsaturated polyester resin, a maleimide resin, a cyanate resin, an isocyanate compound, a benzofluorene D compound, a vinyl benzyl ether compound, a polybutadiene, and The modified substance, the modified product of acrylonitrile copolymer, oxime resin, fluororesin, oxime resin, polyether oximine, polyether oxime, polyether ether, polyacetal, polystyrene, polyethylene, dicyclopentane Dilute resin, etc. The thermosetting resin or the thermoplastic resin is used in an amount of 60% by mass or less based on the epoxy resin composition of the present invention. The epoxy resin composition of the present invention can be used as a preferred printed circuit board or the like by arranging the semiconductor sealing material or mixing them uniformly by using the above-mentioned respective components 24 201105699. The epoxy resin composition of September can be easily made into a cured product by the same method as the previously known method. The formation of the cured product of the present invention can be carried out, for example, by using an extruder, a kneader or a roll, etc., an epoxy resin, a hardener, and an inorganic filler having a thermal conductivity of 20 W/mK or more. The required hardening accelerator, compounding agent, various thermosetting tree stalks or various thermoplastic resins are sufficiently mixed until uniformity is obtained to obtain an epoxy resin composition, which is then subjected to melt casting, transfer molding, and injection molding. The epoxy resin composition is formed by a method such as compression molding or the like, and then added to < 2 to 1 〇+ above the melting point thereof. When the epoxy resin composition of the present invention is used for semiconductor sealing applications, the semiconductor element mounted on a lead frame or the like may be sealed by the above method. Further, the epoxy resin composition of the present invention may be formed into a varnish containing a solvent. The varnish may be, for example, a mixture of an epoxy resin, a hardener, an inorganic filler having a thermal conductivity of 20 W/m.1 C or more, and other components as needed, and anthracene, xylene, acetone, mercaptoethyl. Ketone, mercaptoisobutyl ketone, % hexanone, cyclopentanone, N, N, dimethyl decyl decylamine, N, N,-dimercaptoacetamide, monomethyl argon, N-曱基. An alcohol ether such as ethylene ketone, ethylene glycol dioxime ether, ethylene glycol diethyl ether, dipropylene glycol dioxime ether, dipropylene glycol diethyl ether, diethyl ether monoterpene ether, diethylene glycol diethyl ether, etc. Ester, butyl acetate, thiol cellosolve acetate, ethyl cellosolve acetate, butyl cellosolve acetate, carbitol acetate, propylene glycol monoterpene ether acetate, pentanoic acid Esters such as alkyl esters, dialkyl succinates, dialkyl adipates, 25 201105699 cyclic esters such as r-butyrolactone, petroleum ether, petroleum brain, hydrogenated petroleum brain and Shiyue b solvent It is obtained by mixing an organic solvent such as a petroleum solvent such as oil. The amount of the emulsifier is usually 10 to 95% by mass, preferably 15 to 85% by mass based on the total varnish. 〇 The varnish obtained as described above is impregnated with glass fiber, carbon fiber, poly ray fiber, polyamide fiber, and oxidized. The prepreg of the present invention can be obtained by removing the solvent by heating and removing the varnish into a semi-hardened state after the sheet-like fibrous base material such as aluminum fiber or paper. In addition, the term "semi-hardened state" as used herein means a state in which a part of the epoxy group which is a reactive functional group remains unreacted. The prepreg can be hot pressed to obtain a cured product. EXAMPLES Hereinafter, the present invention will be described in more detail by way of examples, but the invention is not limited thereto. In the synthesis examples, examples, and comparative examples, parts represent parts by mass. Further, the epoxy equivalent, the melting point and the thermal conductivity were measured under the following conditions. • Epoxy equivalents were measured by the method described in JIS K-7236, in units of g / eq · 〇 • Melting point
Seiko Instruments Inc.製造之 EXSTAR6000 測定試樣 2 mg〜5 mg 升溫速度ι 〇。〇 / min •導熱率 利用根據ASTM E1530之方法進行測定 •羥基當量 26 201105699 以根據JIS Κ·0070中所記載之方法進行測定,單位為 / eq· 〇 合成例1 於具備攪拌機、回流冷卻管、攪拌裝置之燒瓶中裝入 136份對羥基笨乙酮、124份對羥基苯曱醛及3〇〇份乙醇’ 並加以溶解。向其中添加51.0份97%硫酸後升温至6〇<t為 止,於此溫度下反應8小時後,將反應液注入至丨2〇〇份水 中使其結晶。過濾結晶後,利用6〇〇份水進行2次水洗, 其後進行真空乾燥,從而獲得2 2 0份紅褐色結晶之酴化合 物1。所獲得之結晶之熔點藉由DSC測定為203。(:。 合成例2 於具備攪拌機、回流冷卻管、攪拌裝置之燒瓶中裝入 29份丙酮、124 g對羥基苯甲醛及3〇〇份乙醇,並加以溶解。 向其中添加80份50%氫氧化鈉水溶液後升溫至45。(:為止, 於此溫度下反應1 20小時反應後,將反應液注入至8〇〇 mL 之1 · 5 N鹽酸中使其結晶。過濾結晶後,利用6 〇 〇份水進行 2次水洗’其後進行真空乾燥,從而獲得210份黃色結晶之 紛化合物2。所獲得之結晶之熔點藉由DSC測定為1 〇 1 。 合成例3 於具備攪拌機、回流冷卻管、攪拌裝置之燒瓶中裝入 49份環己酮、124份對羥基苯甲醛及250份乙醇,並加以 溶解。向其中添加25份37%鹽酸後升溫至60°C為止,於此 溫度下反應10小時後,將反應液注入至1 〇〇〇份水中使其 結晶。過濾結晶後,利用800份水進行2次水洗,其後進 27 201105699 $真空乾燥,從而獲得21〇份黃色結晶之酚化合物3。所獲 得之結晶之熔點藉由DSC測定為289。(:。 合成例4 於具備攪拌機、回流冷卻管、攪拌裝置之燒瓶中一面 實施氮氣沖洗’一面添力σ 12〇份合成例i中所獲得之酚化 合物卜925⑪表氣醇、139份二曱基亞颯(DMs〇),於搜摔 ^升溫至45°C為止並進行溶解,歷時9G分鐘分步添加4〇 份片狀之氫氧化鈉後,維持45t進行15小時反應,其後 升溫至70°C進行3〇分鐘反應。反應結束後,使用旋轉蒸發 器於7(TC且減壓下館去咖份過剩之表氣醇等溶劑。將殘 留物注入至1500份水中而使結晶析出。過濾結晶後,利用 _曰份甲醇進行清洗,其較7代下進行真空乾燥,藉此 獲传166份環氧樹月旨!。所獲得之環氧樹脂之環氧當量為 2〇〇 g/eq‘ ’熔點藉由DSC測定為1〇8〇c。 合成例5 於具備檀拌機、回流冷卻管、授拌裝置之燒瓶中一面 實施氮氣沖洗…面添力σ 133份合成例2中所獲得之酴化 合物2、925份表氣醇、139份DMS〇,於授拌下升溫至Μ f為止並進行溶解,歷時9G分鐘分步添加4G份片狀之氫 氧化納後’維持价進行h5小時反應,其㈣溫至贼 進行30分鐘反應。反應結束後,使用旋轉蒸發器於航且 減麼下射800份過剩之表氣醇等溶劑。將殘留物注入至 崎水中而使結晶析出。過滤結晶後,利用_份甲醇 進行清洗’其後於7〇t下進行真空乾燥,藉此獲得刚份 28 201105699 環氧樹脂2。所獲得之環急接^ β γ 哀氧樹知之環氧當量為220 g/eq., 溶點藉由D S C測定為1 1 7 °c。 合成例6 於具備搜袢機、回流冷卻管、授摔裝置之燒瓶中一面 實施氮氣沖洗,一面添力σ 153份合成例3中所獲得之酚化 。物3、925份表氯醇、139份Dms〇,於授拌下升溫至45 c為止並進行溶解,歷時90分鐘分步添加4〇份片狀之氫 氧化納後’維持45°C進行1.5小時反應,其後升溫至70。(: 進仃30分鐘反應。反應結束後,使用旋轉蒸發器於7〇t>c且 減壓下餾去800份過剩之表氣醇等溶劑。將殘留物注入至 1500份水中而使結晶析出。過濾結晶後,利用6〇〇份甲醇 進行清洗,其後於70eC下進行真空乾燥,藉此獲得丨99份 環氧樹脂3。所獲得之環氧樹脂之環氧當量為219 g/eq., 熔點藉由DSC測定為145°C。 實施例1〜3及比較例1〜3 以表1之比例(份)調配各種成分,於利用混合輥之混練 與緊接其後之錠劑化後,藉由轉注成形來製備樹脂成型 體。繼而’將該樹脂成型體於16 0 °C下加熱2小時,進而於 180°C下加熱8小時,藉此獲得本發明之環氧樹脂組成物及 比較用樹脂組成物之硬化物。將測定此等硬化物之導熱率 所得之結果示於表1。 29 201105699 [表i] 實施例1 實施例2 實施例3 比較例1 比較例2 比較例3 調配物之組成 n,· 環氧樹脂1 100 環氧樹脂2 100 環氧樹脂3 100 100 環氧樹脂4 100 100 硬化劑 20 18 18 23 18 23 無機填充材1 274 270 270 281 無機填充材2 157 154 154 161 無機填充材3 298 311 硬化物之物性 導熱率(W/m-K) 3.9 3.9 4.0 3.5 0.68 0.62 環氧樹脂4:等莫耳地含有下述式(6)及(7)所示之環氧 樹脂之聯苯型環氧樹脂(商品名:YL-6 12 1H Japan Epoxy Resins製造環氧當量為175 g/eq.)EXSTAR6000 test sample manufactured by Seiko Instruments Inc. 2 mg~5 mg Heating rate ι 〇. 〇/min • The thermal conductivity is measured by the method according to ASTM E1530. • The hydroxyl equivalent of 26 201105699 is measured according to the method described in JIS 00·0070, and the unit is / eq· 〇 Synthesis Example 1 is equipped with a stirrer, a reflux cooling tube, The flask of the stirring apparatus was charged with 136 parts of p-hydroxyacetone, 124 parts of p-hydroxybenzaldehyde and 3 parts of ethanol' and dissolved. After 51.0 parts of 97% sulfuric acid was added thereto and the temperature was raised to 6 Torr <t, and the reaction was carried out at this temperature for 8 hours, the reaction liquid was poured into 2 parts of water to be crystallized. After filtration and crystallization, water washing was carried out twice with 6 parts of water, followed by vacuum drying to obtain 2200 parts of a reddish brown crystalline ruthenium compound 1. The melting point of the obtained crystal was 203 as determined by DSC. (Comparative Example 2) A flask equipped with a stirrer, a reflux cooling tube, and a stirring device was charged with 29 parts of acetone, 124 g of p-hydroxybenzaldehyde, and 3 parts of ethanol, and dissolved therein. 80 parts of 50% hydrogen was added thereto. After the sodium oxide aqueous solution was heated, the temperature was raised to 45. (The reaction was carried out at this temperature for 1 to 20 hours, and then the reaction solution was poured into 8 mL of 1 N 5 hydrochloric acid to be crystallized. After filtration and crystallization, 6 〇 was used. The water was washed twice with water, and then vacuum dried to obtain 210 parts of the yellow crystal compound 2. The melting point of the obtained crystal was determined by DSC to be 1 〇 1. Synthesis Example 3 was equipped with a stirrer and a reflux cooling tube. The flask of the stirring device was charged with 49 parts of cyclohexanone, 124 parts of p-hydroxybenzaldehyde and 250 parts of ethanol, and dissolved. 25 parts of 37% hydrochloric acid was added thereto, and the temperature was raised to 60 ° C, and the reaction was carried out at this temperature. After 10 hours, the reaction solution was poured into 1 part of water to be crystallized. After filtration and crystallization, it was washed twice with 800 parts of water, and then dried in a vacuum of 27 201105699 to obtain 21 parts of a yellow crystalline phenol compound. 3. Obtained The melting point of the obtained crystal was determined by DSC to be 289. (: Synthesis Example 4: Nitrogen flushing was carried out in a flask equipped with a stirrer, a reflux cooling tube, and a stirring device, and the force obtained by the synthesis example i was obtained. Phenol compound 92511 epoch alcohol, 139 parts of dimercapto ytterbium (DMs 〇), after the temperature drop to 45 ° C and dissolved, after 7G minutes, add 4 〇 tablets of sodium hydroxide The reaction was carried out for 15 hours at 45 t, and then the temperature was raised to 70 ° C for 3 〇 minutes. After the completion of the reaction, a solvent such as a surface alcohol was left at 7 (TC) under reduced pressure. The solution was poured into 1500 parts of water to precipitate crystals. After filtration and crystallization, it was washed with 曰 甲醇 methanol, and vacuum-dried 7 times, thereby obtaining 166 parts of epoxy resin! The epoxy equivalent of the resin was 2 〇〇g/eq' 'melting point was determined by DSC to be 1〇8〇c. Synthesis Example 5 Nitrogen flushing was performed on one side of a flask equipped with a sandpaper mixer, a reflux cooling tube, and a mixing device... Surface addition force σ 133 parts of the oxime compound obtained in Synthesis Example 2 2, 925 parts of surface gas alcohol, 139 parts of DMS hydrazine, heated to Μ f under the mixing and dissolution, after 7G minutes of stepwise addition of 4G tablets of sodium hydroxide, 'maintaining price for h5 hours reaction, its (4) After the reaction is completed, the thief is allowed to react for 30 minutes. After the reaction is completed, 800 parts of excess solvent such as surface gas alcohol is sprayed off using a rotary evaporator, and the residue is poured into the water to precipitate crystals. The mixture was washed with _ methanol, and then vacuum dried at 7 〇t, thereby obtaining the epoxy resin 2 of 201105699. The obtained ring entangled β γ γ oxy oxy oxy oxychloride was 220 g / Eq., the melting point was determined to be 1 1 7 °c by DSC. Synthesis Example 6 Nitrogen rinsing was carried out in a flask equipped with a search machine, a reflux cooling tube, and a dropping device, and the phenolation obtained in Synthesis Example 3 was added by σ 153. 3, 925 parts of epichlorohydrin, 139 parts of Dms 〇, heated to 45 c under stirring, and dissolved, after adding 4 ounces of sodium hydroxide in steps of 90 minutes, 'maintain 45 ° C for 1.5 The reaction was carried out for an hour and then the temperature was raised to 70. (: The reaction was carried out for 30 minutes. After the completion of the reaction, 800 parts of excess solvent such as surface gas alcohol was distilled off under reduced pressure using a rotary evaporator at 7 Torr. The residue was poured into 1500 parts of water to precipitate crystals. After filtration and crystallization, it was washed with 6 parts of methanol, and then vacuum dried at 70 ° C, thereby obtaining 99 parts of epoxy resin 3. The epoxy equivalent of the obtained epoxy resin was 219 g/eq. The melting point was determined by DSC to be 145 ° C. Examples 1 to 3 and Comparative Examples 1 to 3 Various components were blended in the proportions (parts) of Table 1, after kneading by a mixing roll and subsequent tableting A resin molded body is prepared by transfer molding. Then, the resin molded body is heated at 160 ° C for 2 hours and further heated at 180 ° C for 8 hours, thereby obtaining the epoxy resin composition of the present invention and The cured product of the resin composition was compared. The results obtained by measuring the thermal conductivity of the cured product are shown in Table 1. 29 201105699 [Table i] Example 1 Example 2 Example 3 Comparative Example 1 Comparative Example 2 Comparative Example 3 Composition of the formulation n, · Epoxy resin 1 100 Epoxy resin 2 100 Epoxy Resin 3 100 100 Epoxy Resin 4 100 100 Hardener 20 18 18 23 18 23 Inorganic Filler 1 274 270 270 281 Inorganic Filler 2 157 154 154 161 Inorganic Filler 3 298 311 Physical Thermal Conductivity of Hardened ( W/mK) 3.9 3.9 4.0 3.5 0.68 0.62 Epoxy Resin 4: A biphenyl type epoxy resin containing an epoxy resin represented by the following formulas (6) and (7), etc. (trade name: YL-6) 12 1H Japan Epoxy Resins manufactures an epoxy equivalent of 175 g/eq.)
硬化劑1:1,5-萘二胺(東京化成工業製造,胺當量為 40 g/eq.) 無機填充材1 :球狀氧化鋁(商品名:DAW-100電氣化 學工業製造,導熱率為38 W/m_K) 無機填充材2 :氮化硼(商品名:SGP電氣化學工業製 造,導熱率為60 W/m’K) 無機填充材3 :熔融二氧化矽(商品名:MSR2212龍森 30 201105699 製造’導熱率為1.38 W/m.K) 實施例4 於1000份二曱基甲醯胺中添加100份合成例6中所獲 得之環氧樹脂3,進而使其於7〇〇c下溶解後,恢復至室溫。Hardener 1:1, 5-naphthalenediamine (manufactured by Tokyo Chemical Industry Co., Ltd., amine equivalent weight 40 g/eq.) Inorganic filler 1: spherical alumina (trade name: DAW-100, electrical and chemical industry, thermal conductivity) 38 W/m_K) Inorganic filler 2: Boron nitride (trade name: SGP Electrochemical Industry, thermal conductivity 60 W/m'K) Inorganic filler 3: Fused cerium oxide (trade name: MSR2212 Longsen 30 201105699 Manufacturing 'thermal conductivity 1.38 W/mK> Example 4 100 parts of the epoxy resin 3 obtained in Synthesis Example 6 was added to 1000 parts of dimethylformamide, and further dissolved at 7 〇〇c. , return to room temperature.
於7〇°C下使18份作為硬化劑之1,5-萘二胺(東京化成 製造’胺當量為4〇 g/eq )溶解於48份二甲基曱醯胺中後, 恢復至室溫。利用攪拌翼型之均質攪拌機混合、攪拌上述 環氧樹脂溶液與硬化劑溶液而製成均勻之清漆,進而添加 224份(相對於樹脂固體成分100體積份為50體積份)無機 填充材(商品名:SGP電氣化學工業製造,導熱率為60 W / m ’ K)、及100份二甲基甲醢胺進行混合、攪拌,從而製 備本發明之環氧樹脂組成物。 使4環氧樹脂組成物之清漆含浸於厚度為〇 .2 mm之玻 璃纖維織布(商品名:7628/ AS890AW Asahi-Schwebel製造) 中進行加熱乾燥而獲得預浸體。將4片上述預浸體與配 置於其兩側之銅箔重疊後,於溫度為、壓力為4 MPa 之條件下加熱加壓成型9〇分鐘而一體化,從而獲得厚度為 〇.8峨之積層板。測定該積層板之導熱率結果為“ w /ιη·Κ:。 比較例4 將實施例4中之環氧樹脂3變更為1〇〇份環氧樹脂 材之量二Τ將1,5-萘二胺之量變更為23份,將無機填充 t更為234份,除此以外,藉由與實施例*相同之 操作順序而獲得積層板。測定 而疋该積層板之導熱率,結果為 31 201105699 3.6 W/ m . K。 實施例5 以表2之比例(份)調配各種成分,充分地混合後直接裝 入模具中,於175°C下加壓成型’藉此製備樹脂成型體。繼 而,將該樹脂成型體於160°C下加熱2小時,進而於18〇。匚 下加熱8小時,藉此獲得本發明之環氧樹脂組成物之硬化 物。將測定該硬化物之導熱率之結果示於表2。 實施例6〜8及比較例5〜7 以表2之比例(份)調配各種成分,於利用混合輥之混練 與緊接其後之錠劑化後,藉由轉注成形來製備樹脂成型 體。繼而,將該樹脂成型體於160°C下加熱2小時,進而於 180°C下加熱8小時’藉此獲得本發明之環氧樹脂組成物及 比較用樹脂組成物之硬化物。將測定此等硬化物之導熱率 之結果示於表2。再者,表2中之環氧樹脂3、硬化劑1、 無機填充材1及2與實施例1〜3中所使用者相同。 [表2] 實施例5 實施例6 實施例7 實施例8 比較例5 比較例7 調配物之組成 — - 100 環氣榭腊3 100 100 環氡榭脂5 100 100 100 100 硬化劊1 15 硬化劊2 69 56 硬化劊3 47 38 硬化#1 4 「26 21 無機填充材1 387 357 336 288 316 277 263 無機埴免材2 220 203 191 164 180 158 150 硬化促进劊 1 1 1 1 1 1 硬化物之物性 導熱率iW/nrK) 4.2 ΊΤ 3.7 3.7 3.3 3.4 Ί7 32 201105699 環氧樹脂5 :下述式(8)所示之環氧樹脂(商品名 NC-3000日本化藥製造環氧當量為276 g/叫)18 parts of 1,5-naphthalenediamine (manufactured by Tokyo Chemical Industry Co., Ltd., having an amine equivalent of 4 〇g/eq) dissolved in 48 parts of dimethyl decylamine at 7 ° C, and returned to the chamber. temperature. The above epoxy resin solution and the hardener solution are mixed and stirred by a homomixer of a stirring airfoil to form a uniform varnish, and further 224 parts (50 parts by volume relative to 100 parts by volume of the resin solid component) are added to the inorganic filler (trade name) The epoxy resin composition of the present invention is prepared by mixing and stirring 100 g of a thermal conductivity of 60 W / m 'K) and 100 parts of dimethylformamide. The varnish of the epoxy resin composition was impregnated with a glass fiber woven fabric (trade name: 7628/AS890AW manufactured by Asahi-Schwebel) having a thickness of 22 mm, and dried to obtain a prepreg. Four sheets of the above prepreg were superposed on the copper foil disposed on both sides thereof, and then heated and pressed at a temperature of 4 MPa for 9 minutes to be integrated, thereby obtaining a thickness of 〇.8峨. Laminated board. The thermal conductivity of the laminated board was measured and found to be "w / ιη · Κ:. Comparative Example 4 The epoxy resin 3 in Example 4 was changed to the amount of the epoxy resin material, and the 1,5-naphthalene was used. A laminate was obtained by the same operation procedure as in Example * except that the amount of the diamine was changed to 23 parts, and the inorganic filler t was changed to 234 parts. The thermal conductivity of the laminate was measured and found to be 31. 201105699 3.6 W/m. K. Example 5 Various components were prepared in the proportions (parts) of Table 2, thoroughly mixed, directly loaded into a mold, and pressure-molded at 175 ° C to thereby prepare a resin molded body. The resin molded body was heated at 160 ° C for 2 hours, and further heated at 18 ° C for 8 hours to obtain a cured product of the epoxy resin composition of the present invention. The thermal conductivity of the cured product was measured. The results are shown in Table 2. Examples 6 to 8 and Comparative Examples 5 to 7 Various components were blended in the proportions (parts) of Table 2, and were formed by transfer molding after kneading by a mixing roll and subsequent tableting. To prepare a resin molded body. Then, the resin molded body was heated at 160 ° C for 2 hours, and further The epoxy resin composition of the present invention and the cured resin composition of the present invention were obtained by heating at 180 ° C for 8 hours. The results of measuring the thermal conductivity of these cured materials are shown in Table 2. Furthermore, Table 2 Epoxy Resin 3, Hardener 1, and Inorganic Fillers 1 and 2 are the same as those in Examples 1 to 3. [Table 2] Example 5 Example 6 Example 7 Example 8 Comparative Example 5 Comparative Example 7 Composition of the formulation - - 100 ring gas wax 3 100 100 ring resin 5 100 100 100 100 Hardening layer 1 15 Hardening layer 2 69 56 Hardening layer 3 47 38 Hardening #1 4 "26 21 Inorganic filler 1 387 357 336 288 316 277 263 Inorganic bismuth material 2 220 203 191 164 180 158 150 Hardening promotion 刽 1 1 1 1 1 1 Physical thermal conductivity of hardened material iW/nrK) 4.2 ΊΤ 3.7 3.7 3.3 3.4 Ί7 32 201105699 Epoxy 5 : Epoxy resin represented by the following formula (8) (trade name NC-3000 Nippon Chemical Co., Ltd. has an epoxy equivalent of 276 g/call)
2 :由合成例3所獲得之酚化合物3(羥基當量為 153 %/eq.) 名:Η·1,明和化成製造羥基當量為l〇5g/eq) 硬化劑3 : 了述式(9)所示之苯酚酚醛清漆樹脂(商品2: phenol compound 3 obtained by Synthesis Example 3 (hydroxyl equivalent: 153%/eq.) Name: Η·1, Minghe Chemical Co., Ltd. Manufactured having a hydroxyl equivalent of 10 〇5 g/eq) Hardener 3: Formula (9) Phenolic novolac resin shown (commodity
硬化劑4:下述式(1〇)所示之鄰苯二酚酚醛清漆樹脂(羥 基當量為59 g/eq.,軟化點為i〇4〇c )Hardener 4: a catechol novolac resin represented by the following formula (1〇) (hydroxyl equivalent weight: 59 g/eq., softening point i〇4〇c)
硬化促進劑:三苯基膦(北興化學工業製造) 實施例9 於70C下使100份環氧樹脂5(NC_3〇〇〇)、56份合成例 3中所獲得之酚化合物3溶解於1 〇〇〇份二甲基甲醯胺中 後,恢復至室溫。 33 201105699 於7〇°C下使1份作為硬化促進劑 —...——枣丞膦(北興化學 工業製造)溶解於48份二甲基甲醯胺中後,恢復至室溫。利 用攪拌翼型之均質搜拌機現合、搜拌上述環氧樹脂溶液與 硬化促進劑溶液而製成均勻之清漆,進而添加296份(相對 於樹脂固體成分HM)體積份為5〇體積份)之無機填充材(商 品名:SGP電氣化學工業製造,導熱率為6〇 w、K)、 及100份二曱基曱酿胺進行混合、授摔,從而製備本發明 之環氧樹脂組成物。 使該環氧樹脂組成物之清漆含浸於厚度為〇 2 mm之玻 璃纖維織布(商品名:7628/ AS89()AW Asahi_Schwebei製造) 中,進行加熱乾燥而獲得預浸體。將4片上述預浸體與配 置於其兩側之銅荡重疊後,於溫度為175t '壓力為4Mpa 之條件下加熱加壓成型90分鐘而—體化,從而獲得厚度為 〇·8 mm之積層板。測定該積層板之導熱率,結果為4 $ w / m. κ。 比較例8 將實施例9中之56份酚化合物3變更為29份式(9)所 示之笨紛紛路清漆樹脂,將無機填充材之量變更為245份, 除此以外,藉由與實施例9相同之操作順序而獲得積層板。 測定該積層板之導熱率,結果為3 9 w/ m . 比較例9 將實施例9中之56份酚化合物3變更為38份式(1〇) 所示之鄰苯二紛酚醛清漆樹脂,將無機填充材之量變更為 262份’除此以外’藉由與實施例9相同之操作順序而獲得 34 201105699 積層板。測定該積層板之導熱率,結果為4丨w/m K。 比較例1 〇 於就下使_份環氧樹月旨5(NC_3000)溶解於1〇〇〇 份二甲基甲醯胺中後’恢復至室溫。 於70°C下使15份作為硬化劑之M蔡二胺溶解於48 份二甲基甲醢胺中後,恢復至室溫,搜拌翼型之均質 攪拌機混合、攪拌上述環氧樹脂溶液與硬化劑溶液而製成 均句之清漆,進而添加224份(相對於樹脂固體成分ι〇〇體 積份為50體積份)之無機填充材(商品名:SGp電氣化學工 業製造,導熱率為60W/m.K)、及1〇〇份二甲基甲酿^ 行混合、搜拌,從而製備比較例之環氧樹脂組成物。 藉由與實施例9相同之操作順序進行其後之步驟而獲 付積層板。測定該積層板之導熱率,結果為4 4 爪.κ。 由以上結果可確認,本發明之環氧樹脂組成物之硬化 物具有優異之導熱性。因此,本發明之環氧樹脂組成物之 硬化物在用於電氣、電子零件用絕緣材料及積層板(印刷電 路板等)等之情況下極其有用。 參照特定之態樣詳細地說明了本發明,但對於本領域 技術人員而言,明確可在不脫離本發明之精神與範圍的情 況下而進行各種變更及修改。 再者’本申請案係基於2〇〇9年12月21曰所申請之曰 本專利出願(日本專利特願2〇〇9 2887〇6)及2〇〇9年6月5 曰所申清之日本專利出願(日本專利特願2009-136455),並 藉由W用而援引其全部内容。另外’此處所引用之所有參 35 201105699 照係作為整體而編入。 r趙等而於電氣、電子•成::料作::封材料 中極其有用。 “劑、光學材料等廣範之心 【圖式簡單說明】 無 【主要元件符號說明】 無 36Hardening accelerator: Triphenylphosphine (manufactured by Behind Chemical Industry Co., Ltd.) Example 9 100 parts of epoxy resin 5 (NC_3〇〇〇) and 56 parts of the phenol compound 3 obtained in Synthesis Example 3 were dissolved in 1 70 at 70 ° C. After mashing in dimethylformamide, it was returned to room temperature. 33 201105699 One part was dissolved in 48 parts of dimethylformamide at 7 °C and dissolved in 48 parts of dimethylformamide at room temperature. The homogenizer of the stirring airfoil is used to mix and mix the above epoxy resin solution and the hardening accelerator solution to form a uniform varnish, and further 296 parts (relative to the solid content of the resin HM) are added in a volume of 5 parts by volume. An inorganic filler (trade name: manufactured by SGP Electrochemical Industry, thermal conductivity: 6〇w, K), and 100 parts of dimercaptoamine amine are mixed and dropped to prepare the epoxy resin composition of the present invention. . The varnish of the epoxy resin composition was impregnated into a glass fiber woven fabric (trade name: 7628/AS89() AW Asahi_Schwebei) having a thickness of 〇 2 mm, and dried by heating to obtain a prepreg. Four sheets of the above prepreg were overlapped with the copper disposed on both sides thereof, and then subjected to heat and pressure molding at a temperature of 175 t '4 Mpa for 90 minutes to obtain a thickness of 〇·8 mm. Laminated board. The thermal conductivity of the laminate was measured and found to be 4 $ w / m. κ. Comparative Example 8 The 56 parts of the phenol compound 3 in Example 9 was changed to 29 parts of the singular varnish resin represented by the formula (9), and the amount of the inorganic filler was changed to 245 parts, and other examples were carried out. The laminated sheet was obtained in the same operation sequence as in Example 9. The thermal conductivity of the laminate was measured and found to be 3 9 w/m. Comparative Example 9 The 56 parts of the phenol compound 3 in Example 9 was changed to 38 parts of the phthalic phenol varnish resin represented by the formula (1). The amount of the inorganic filler was changed to 262 parts 'other than' to obtain 34 201105699 laminate by the same operation sequence as in Example 9. The thermal conductivity of the laminate was measured and found to be 4 丨 w/m K . Comparative Example 1 _ Resolved to room temperature after dissolving _ part of Epoxy Resin 5 (NC_3000) in 1 part of dimethylformamide. After dissolving 15 parts of M-clayed diamine as a hardener in 48 parts of dimethylformamide at 70 ° C, the mixture was returned to room temperature, and the homogenous mixer of the airfoil was mixed and stirred to dissolve the above epoxy resin solution. The sizing agent is prepared into a uniform varnish, and further 224 parts (50 parts by volume relative to the solid content of the resin) is added to the inorganic filler (trade name: SGp Electric Chemical Industry, thermal conductivity: 60 W/ mK), and 1 part of dimethyl ketone were mixed and mixed to prepare an epoxy resin composition of a comparative example. The laminate was obtained by carrying out the subsequent steps in the same operation sequence as in the embodiment 9. The thermal conductivity of the laminate was measured and found to be 4 4 claws. From the above results, it was confirmed that the cured product of the epoxy resin composition of the present invention has excellent thermal conductivity. Therefore, the cured product of the epoxy resin composition of the present invention is extremely useful when used for insulating materials for electric and electronic parts, laminates (printed circuit boards, etc.), and the like. The present invention has been described in detail with reference to the specific embodiments thereof, and various modifications and changes can be made by those skilled in the art without departing from the spirit and scope of the invention. Furthermore, 'this application is based on the patent application of the patent application dated December 21, 2009 (Japanese Patent Special Purpose 2〇〇9 2887〇6) and the 2nd June 9th Japanese patents (Japanese Patent Application No. 2009-136455), and the entire contents of which are incorporated by reference. In addition, all references cited herein are incorporated herein by reference. r Zhao and so on in electrical, electronic • Cheng:: material:: sealing materials are extremely useful. "A wide range of agents, optical materials, etc. [Simple description of the diagram] None [Main component symbol description] None 36
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| TWI558762B (en) * | 2011-07-27 | 2016-11-21 | 日本化藥股份有限公司 | An epoxy resin mixture, an epoxy resin composition, a prepreg and the hardened product |
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| JP5885330B2 (en) * | 2011-07-26 | 2016-03-15 | 日本化薬株式会社 | Epoxy resin, epoxy resin composition, prepreg and cured products thereof |
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| JP7749957B2 (en) * | 2020-07-10 | 2025-10-07 | 住友ベークライト株式会社 | Phenoxy resin, thermosetting resin composition, resin sheet, resin substrate, circuit board, and electronic device |
| MX2023005652A (en) * | 2020-11-16 | 2023-07-18 | Swimc Llc | Aromatic diol compounds, diepoxide compounds, polymers prepared from such compounds, and methods for making the same. |
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|---|---|---|---|---|
| JPH09100339A (en) * | 1994-09-08 | 1997-04-15 | Sumitomo Chem Co Ltd | Epoxy resin composition and resin-encapsulated semiconductor device |
| JP3708423B2 (en) * | 2000-10-20 | 2005-10-19 | 株式会社日鉱マテリアルズ | Phenolic curing agent for epoxy resin and epoxy resin composition using the same |
| JP4955856B2 (en) * | 2001-01-26 | 2012-06-20 | パナソニック株式会社 | Phosphorus-containing epoxy resin composition, prepreg, resin-coated metal foil, adhesive sheet, laminate, multilayer board, phosphorus-containing epoxy resin varnish for coating, phosphorus-containing epoxy resin sealing material, phosphorus-containing epoxy resin casting material, phosphorus for impregnation Containing epoxy resin varnish |
| JP2003055434A (en) * | 2001-08-15 | 2003-02-26 | Toto Kasei Co Ltd | Flame retardant for synthetic resin, and flame- retardant resin composition containing the flame retardant |
| JP4224765B2 (en) * | 2002-10-21 | 2009-02-18 | Dic株式会社 | Epoxy resin composition and molded cured product thereof |
-
2010
- 2010-06-04 KR KR1020117027323A patent/KR20120030049A/en not_active Ceased
- 2010-06-04 JP JP2011518505A patent/JP5502080B2/en active Active
- 2010-06-04 WO PCT/JP2010/059498 patent/WO2010140674A1/en not_active Ceased
- 2010-06-04 TW TW099118474A patent/TWI496806B/en active
- 2010-06-04 CN CN201080024750.2A patent/CN102803333B/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI490268B (en) * | 2011-03-28 | 2015-07-01 | 日立化成股份有限公司 | Resin composition, resin sheet, resin sheet cured product, resin sheet laminate, resin sheet laminate cured product, method for producing the same, semiconductor device, and LED device |
| US9349931B2 (en) | 2011-03-28 | 2016-05-24 | Hitachi Chemical Company, Ltd. | Resin composition, resin sheet, cured resin sheet, resin sheet laminate, cured resin sheet laminate and method for producing same, semiconductor device and LED device |
| TWI558762B (en) * | 2011-07-27 | 2016-11-21 | 日本化藥股份有限公司 | An epoxy resin mixture, an epoxy resin composition, a prepreg and the hardened product |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010140674A1 (en) | 2010-12-09 |
| CN102803333B (en) | 2015-04-29 |
| TWI496806B (en) | 2015-08-21 |
| JP5502080B2 (en) | 2014-05-28 |
| JPWO2010140674A1 (en) | 2012-11-22 |
| CN102803333A (en) | 2012-11-28 |
| KR20120030049A (en) | 2012-03-27 |
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