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TW201041975A - Resin composition for encapsulating optical semiconductor element - Google Patents

Resin composition for encapsulating optical semiconductor element Download PDF

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TW201041975A
TW201041975A TW099114133A TW99114133A TW201041975A TW 201041975 A TW201041975 A TW 201041975A TW 099114133 A TW099114133 A TW 099114133A TW 99114133 A TW99114133 A TW 99114133A TW 201041975 A TW201041975 A TW 201041975A
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group
composition
component
mass
epoxy
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TW099114133A
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TWI480338B (en
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Yoshihira Hamamoto
Tsutomu Kashiwagi
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Shinetsu Chemical Co
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/10Materials in mouldable or extrudable form for sealing or packing joints or covers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/48Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding
    • B29C65/4805Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding characterised by the type of adhesives
    • B29C65/483Reactive adhesives, e.g. chemically curing adhesives
    • H10W74/476

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Led Device Packages (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

A composition for encapsulating an optical semiconductor element is provided. It includes (A) a first silicone resin having a unit with an epoxy group-containing non-aromatic group and a unit formed of a linear diorganopolysiloxane segment, (B) a second silicone resin having a unit with an epoxy group-containing non-aromatic group and a unit with diorganosiloxy units, (C) a curing agent, and (D) a curing catalyst. The composition has a good curability and resistance to heat discoloration.

Description

201041975 六、發明說明·· 【發明所屬之技術領域】 本發明係關於-種用於膠囊封裝光學半導體元件之组 成物,且更特定言 係關於—種心膠囊封裝光學半導 體元件的組成物,其中基質樹脂會暂 只τ細,、質上由聚矽氧樹脂構成 且其展現優良的耐熱變色性及出眾的可固化性。 【先前技術】 環氧樹脂組成物習知已廣泛用於膠囊封裝光學半導體 元件。此等環氧樹脂組成物典型地包含充當基質樹脂之脂 環族環氧樹脂、固化劑及固化催化劑。典型地使用 轉注成形方法或其類似方法,藉由將 ^ 將樹月曰組成物傾倒於内 部已置放光學半導體元件之模具中,且接著使樹脂組成物 固化,來膠囊封裝光學半導體元件。然而,隨著咖之亮 度及功率輸出增加’已開始出現關於環氧樹脂之變色及‘ 解問題。特定言之’脂環族環氧樹脂在曝露於藍光或紫外 光後容易變黃,導致LED元件之壽命縮短。 片^此,目前開始使用展現優良耐熱性及耐光性之聚石夕 乳樹脂’不過固化樹脂之強度弱於環氧樹脂。& 了克服此 問題,已提出將高硬度橡膠狀聚石夕氧樹脂用於膠囊封裝應 I:::二見專利文獻υ。然而’此等高硬度聚石夕氧樹脂 :見弱黏者性,且在嵌入式發光半導體裝1 (亦 f是及/或塑膠外殼内部’且接著用聚彻脂填充 :外设之内部的裝置)中,於,。…抓下之熱衝擊測試 易於使聚石夕氧樹月旨貞外殼之陶二是或塑勝脫離。 201041975 為了良黏著性及耐熱衝擊性,已提出含有環氧基之 聚矽氧樹月:(參見專利文獻2)。然而,此等聚矽氧樹脂係 藉由使含核氧基之矽烷與矽烷醇縮合來合成,且此等聚矽 氧樹脂之固化產物易碎裂並具有低彈性模數。因此,用此 類型之樹脂膝囊封裝的LED胃於在溫度循環測試 (temperature cycle testing )期間在樹脂内出現裂紋。 用於解決此開裂問題之已知材料包括包含環氧樹脂及 含有至少兩個環氧基環之倍半氧矽烷的組成物(參見專利 文獻3 ),及包含環氧樹脂作為應力降低劑及含有異氰脲酸 衍生基團之聚矽氧樹脂的組成物(參見專利文獻4 )。然而, 即使是此兩種類型之組成物,仍在固化產物之溫度循環測 試期間觀察到開裂,且斷言兩種類型之組成物皆不能提供 完全令人滿意的耐熱衝擊性。 [先前技術文獻]201041975 VI. INSTRUCTION DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a composition for encapsulating an optical semiconductor element, and more particularly to a composition of a seed capsule-packaged optical semiconductor element, wherein The matrix resin is temporarily only τ fine, and is composed of a polyoxymethylene resin and exhibits excellent heat discoloration resistance and superior curability. [Prior Art] Epoxy resin compositions have been widely used for encapsulating optical semiconductor elements. These epoxy resin compositions typically comprise an alicyclic epoxy resin acting as a matrix resin, a curing agent and a curing catalyst. The optical semiconductor element is typically encapsulated by a transfer molding method or the like by using a caster composition to be poured into a mold in which an optical semiconductor element has been placed, and then curing the resin composition. However, as the brightness and power output of the coffee increase, 'discoloration of the epoxy resin and 'solution problems' have begun to appear. In particular, the alicyclic epoxy resin tends to yellow when exposed to blue light or ultraviolet light, resulting in a shortened life of the LED element. In this case, polysulfide resin which exhibits excellent heat resistance and light resistance is currently used. However, the strength of the cured resin is weaker than that of the epoxy resin. & To overcome this problem, it has been proposed to use a high-hardness rubber-like polysulfide resin for capsule encapsulation. I::: See the patent document υ. However, 'this high hardness poly-stone resin: see weak adhesion, and in the embedded light-emitting semiconductor package 1 (also f and / or inside the plastic casing ' and then filled with poly-gel: the inside of the peripheral In the device), in,. ...the thermal shock test that is caught. It is easy to make the Tao Shi Xi oxygen tree moon shell or the ceramic shell is the plastic win. 201041975 A polyoxynium tree containing an epoxy group has been proposed for good adhesion and thermal shock resistance (see Patent Document 2). However, these polyoxyxylene resins are synthesized by condensing a nucleus-containing decane with a decyl alcohol, and the cured products of these polyoxyxides are easily broken and have a low modulus of elasticity. Therefore, the LED stomach encapsulated with this type of resin knee capsule exhibits cracks in the resin during temperature cycle testing. Known materials for solving this cracking problem include a composition comprising an epoxy resin and sesquioxane containing at least two epoxy rings (see Patent Document 3), and an epoxy resin as a stress reducing agent and containing A composition of a polyanthracene resin of an isocyanuric acid-derived group (see Patent Document 4). However, even with these two types of compositions, cracking was observed during the temperature cycle test of the cured product, and it was asserted that neither of the two types of compositions could provide a completely satisfactory thermal shock resistance. [Previous Technical Literature]

[專利文獻 1] JP 2002-314143 A [專利文獻 2] JP 7-97433 A [專利文獻 3] JP 2005-263869 A[Patent Document 1] JP 2002-314143 A [Patent Document 2] JP 7-97433 A [Patent Document 3] JP 2005-263869 A

[專利文獻 4] JP 2004-99751 A 【發明内容】 本發明旨在解決之問題 本發明之一目的在於解決上文所概述之問題,且從而 提供一種用於膠囊封裝光學半導體元件之樹脂組成物,其 月b夠形成不僅具有咼硬度、優良财光性及優良耐熱衝擊 性’而且亦具有顯著改良之对熱變色性的膠囊封裳固化產 5 201041975 物,且具有良好的固化速率及其類似性質。 解決該等問題之方法 作為各種研究之結果,本發明之發明者發現,藉由使 ^上述具有特定線性聚矽氧烷結構之經環氧基改質^ 樹脂與藉由使兩種有機耗縮合而獲得且環氧基當 以上經環氧基改質聚石夕氧樹脂之第二經環氧基改 夕、 樹脂的組合,可達成上述㈣’且發明者 發明。 此幻心成本 換言之,本發明提供一種用於膠囊封裝光學半導體元 件之組成物,其包含下文所述之組分(a)、(b)、(c)^d = (A)第一聚矽氧樹脂,其具有含環氧基之非芳族美 由以下所示之平均組成式⑴表示,其量 量:至 9〇質量份, 買里伤至[Patent Document 4] JP 2004-99751 A SUMMARY OF THE INVENTION An object of the present invention is to solve the problems outlined above, and to provide a resin composition for encapsulating an optical semiconductor element. , the monthly b is enough to form not only the hardness of the crucible, the good earning property and the excellent thermal shock resistance' but also has a significantly improved thermochromic capsule seal curing product 201041975, and has a good curing rate and the like nature. Means for Solving the Problems As a result of various studies, the inventors of the present invention have found that by epoxidizing an epoxy group-modified resin having a specific linear polyoxyalkylene structure and by condensing two organic gases Further, the above-mentioned (4)' and the inventors' invention can be obtained by obtaining a combination of the epoxy group-modified epoxy group and the second epoxy group of the epoxy group. In other words, the present invention provides a composition for encapsulating an optical semiconductor element comprising the components (a), (b), (c)^d = (A) first polyfluorene described below. An oxy-resin having a non-aromatic beauty containing an epoxy group represented by the average composition formula (1) shown below, in an amount of up to 9 〇 parts by mass,

其中R1表示含環氧基之非芳族基,各R2獨立地表示選 自由經基、CjC2G單價烴基及CjC6烧氧基組成之群的 成貝’各R3表示C丨至Cm單價烴基, x及y各獨立地表示〇、1或2之整數, a表示在0.25至0.75範圍内之數值, b表示在0.25至0.75範圍内之數值, c表示在0至0.3範圍内之數值,限制條件為a+b + c 201041975 且 η表示2至20之整數, (Β )第二聚矽氧樹脂,其具有含環氧基之非芳族基, 由以下所示之平均組成式(2)表示,其量為1〇質量份至 50質量份, R1·Wherein R1 represents a non-aromatic group containing an epoxy group, and each R2 independently represents a group selected from the group consisting of a mercapto group, a CjC2G monovalent hydrocarbon group, and a CjC6 alkoxy group, each R3 represents a C丨 to Cm monovalent hydrocarbon group, x and y each independently represents an integer of 〇, 1 or 2, a represents a value in the range of 0.25 to 0.75, b represents a value in the range of 0.25 to 0.75, and c represents a value in the range of 0 to 0.3, with a constraint of a +b + c 201041975 and η represents an integer of 2 to 20, (Β) a second polyfluorene oxide resin having an epoxy group-containing non-aromatic group represented by the average composition formula (2) shown below, The amount is from 1 part by mass to 50 parts by mass, R1·

fZ -SiC^jQfZ -SiC^jQ

(2) 其中R1、R2及R3如上文所定義, 各z獨立地表示〇、1或2之整數, d表不在0.5至0.8範圍内之數值,且 e表示在0.2至0.5範圍内之數值,限制條件為d+e = i, (C )固化劑,其具有可與環氧基反應之官能基,其量 為每1莫耳在組分及組分⑻中之所有環氧基提供 0.4莫耳至1.5莫耳可與環氧基反應之官能基,及 (D)固化催化劑,其量在每100質量份組分(A)與 組分(B)之組合0.01質量份至3質量份之範圍内。 本發明之效果 因為本發明之樹脂組成物包含上述第二聚石夕氧樹月t 所以可形成具有高硬度之固化產物。此外,田或哲 M馬第二聚石夕 氧樹脂展現高程度之反應性,所以可在相對短的時期内製 造具有優良耐熱變色性之光學半導體封裝。 ^ 【實施方式】 201041975 <組分(A ) > 在本發明之組成物中,具有含環氧基之非芳族基的第 -聚石夕氧樹脂(A)由以下所示之平均組成式⑴表示。(2) wherein R1, R2 and R3 are as defined above, each z independently represents an integer of 〇, 1 or 2, d represents a value not in the range of 0.5 to 0.8, and e represents a value in the range of 0.2 to 0.5, The limiting condition is d+e = i, (C) a curing agent having a functional group reactive with an epoxy group in an amount of 0.4 mole per 1 mole of all epoxy groups in the component and component (8) An ear to 1.5 mol of a functional group reactive with an epoxy group, and (D) a curing catalyst in an amount of 0.01 part by mass to 3 parts by mass per 100 parts by mass of the combination of the component (A) and the component (B) Within the scope. EFFECTS OF THE INVENTION The resin composition of the present invention contains the above-mentioned second polysulfide tree t to form a cured product having high hardness. In addition, the Tian or Zhe M horse second polyoxon resin exhibits a high degree of reactivity, so that an optical semiconductor package having excellent heat discoloration resistance can be produced in a relatively short period of time. [Embodiment] 201041975 <Component (A) > In the composition of the present invention, the first poly-stone resin (A) having an epoxy group-containing non-aromatic group is represented by the average shown below The composition formula (1) is represented.

在式(1)中,η表示2至2〇之整數,較佳為3至 之正數,且更佳為3至1〇之整數。又及丫各獨立地表示〇、 1或2之整數。作為第—聚梦氧樹脂中附有下標「a」之第In the formula (1), η represents an integer of 2 to 2 Å, preferably a positive number of 3 to 3, and more preferably an integer of 3 to 1 Å. And 丫 each independently represents an integer of 〇, 1 or 2. As the first part of the polyoxyl resin, the subscript "a" is attached.

-結構單元及附有下標%」之第三結構單元中的每一者,X 或y為:之矽氧烷單元(T單元)、x或y為1之矽氧烷單 兀(D早兀)及x*y為2之矽氧烷單元(M單元)通常 共存於樹脂分子中。各第—及第三結構單元中之此等石夕氧 烧早疋之比例視用於下文所述之製造方法的單體中r2之種 類及該等澤_ + u Λ 體之水解及縮合程度而定。τ單元:D單元:μ單 Κ莫耳比較佳在咖⑽1 98:1:1之 40:30:30 至⑽叫, 1 ^ 王%.1:1,且更佳為60:2〇:2〇至96:2:2,且更佳為 80:10:10 至 95:3:2 。 田例如η為3時,式(1 )中由(R32Si〇)n表示之單 有以下所示之結構。 、 201041975- each of the structural unit and the third structural unit to which the subscript %" is attached, X or y is: a methoxyalkane unit (T unit), x or y is 1 oxane monoterpene (D early兀) and a oxane unit (M unit) in which x*y is 2 usually coexist in a resin molecule. The ratio of such diarrhea to early enthalpy in each of the first and third structural units depends on the type of r2 in the monomer used in the manufacturing method described below and the degree of hydrolysis and condensation of the zeoliton And set. τ unit: D unit: μ single Κ Moer is better in coffee (10) 1 98: 1:1 40:30:30 to (10) called, 1 ^ king%.1:1, and more preferably 60:2 〇: 2 〇 to 96:2:2, and more preferably 80:10:10 to 95:3:2. For example, when η is 3, the formula (1) is represented by (R32Si〇)n and has the structure shown below. , 201041975

當聚矽氧樹脂具有線性結構時,此(R32Si〇)n單元可存 在於主鏈中,或當聚矽氧樹脂具有分支結構時,此(R32Si0)nWhen the polyoxyxene resin has a linear structure, the (R32Si〇)n unit may be present in the main chain, or when the polyoxyxene resin has a branched structure, this (R32Si0)n

單元可鍵結於分支鏈。包括此(κν〇)η單元使得能夠獲得具 有優良耐熱衝擊性之固化產物。 在式(1)中,R1表示含環氧基之非芳族基,其實例包 括含環氧基之直鏈或分支鏈脂族基,諸如縮水甘油氧基 烷基(例如γ-縮水甘油氧基乙基);含環氧基之脂環族基Τ 諸如卜(3,4_環氧基環己基)乙基;及含環氧基之雜環基,諸 如單縮水甘油基異氰脲基或:縮水甘油基異氰脲基。在此 等基團中,含環氧基之脂環族基為較佳,且心0,心環氧基 %己基)乙基尤其合乎需要。同時’假設亦使用含有氧雜環 丁烷基而非環氧基之非芳族基;然:而,就可固化性而言, 環氧基更丨良。此外,每個分子較佳存在至少一_ r1基。團, 且母個分子更佳存在2至!⑻個Rl。Rl基團較佳存在於分 子之:端。舉例而言’當分子具有線性結構時,較佳在分 子之母^末端存在'個Ri。 R2表示選自由經基、CJC20單價烴基及CjC6烧氧 基組成之群的成I單價煙基之實例包括烧基,諸如甲基、 乙基、丙基或丁基;環烷基’諸如環戊基或環己基;芳:, 諸如苯基;垸芳基,諸如甲苯基;及交聯環基,諸如降茨 9 201041975 焊基。Cl至C6烷氧基之實例包括甲氧基及乙氧基。R2較佳 為曱基或笨基。 各R3表示Cl至Cm單價烴基。特定實例包括與以上 R2描述中所列相同之基團。 a表示在〇·25至0.75範圍内之數值,且較佳為〇.4至 曰7之數值。若a之值小於此範圍之下限,則因為環氧基之 置較J而使組成物之固化速率趨向於降低。相反,若a 2超過以上範圍之上限,$因為環氧基之量極大,而使 至=之樹脂易於膠凝,此為不合需要的。b表示… 在内之數值’且較佳為〇3至〇6之數值。c表示 之.乾圍内之數值,且較佳為〇至0.2之數值。若c 值超過此範圍之上限, 差。彳r 1、& > 固化產物之耐光性趨向於變 八L i)為指示各結槿置_ 其中a+b+c=1。 70之平均存在比率的組成式, 縮合反應來獲得: 由以下所示之式(3 方法使以下物質經受水解及 的線性有機聚矽氧烷: R3I ~Si—〇- R3I *si—〇 R3I Si- (3) 子 (其中R3如 之可水解基團 上文所定義, '且坩為0至 x表示諸如烷氧基或ii素原 U之整數), 10 201041975 燒 由以τ所^式表示的含環氧基之石夕The unit can be keyed to the branch chain. The inclusion of this (κν〇)η unit makes it possible to obtain a cured product having excellent thermal shock resistance. In the formula (1), R1 represents a non-aromatic group containing an epoxy group, and examples thereof include a linear or branched aliphatic group containing an epoxy group such as a glycidoxyalkyl group (e.g., γ-glycidyloxy) Ethylethyl); an epoxy group-containing alicyclic group 诸如 such as a (3,4-epoxycyclohexyl)ethyl group; and an epoxy group-containing heterocyclic group such as a monoglycidyl isocyanurate group Or: glycidyl isocyanuramide. Among such groups, an epoxy group-containing alicyclic group is preferred, and a heart 0, an atrial epoxy group hexyl) ethyl group is particularly desirable. At the same time, it is assumed that a non-aromatic group containing an oxetane group instead of an epoxy group is also used; however, in terms of curability, the epoxy group is more excellent. Further, at least one _r1 group is preferably present per molecule. Group, and the mother molecule is better to exist 2 to! (8) Rl. The R1 group is preferably present at the end of the molecule. For example, when a molecule has a linear structure, it is preferred to have 'Ri' at the end of the parent of the molecule. R2 represents an example of a monovalent nicotinyl group selected from the group consisting of a mercapto group, a CJC20 monovalent hydrocarbon group, and a CjC6 alkoxy group, and includes a alkyl group such as a methyl group, an ethyl group, a propyl group or a butyl group; and a cycloalkyl group such as a cyclopentane group. Or a cyclohexyl group; an aryl group, such as a phenyl group; an anthracene group such as a tolyl group; and a crosslinked ring group such as a dec. 9 201041975. Examples of the Cl to C6 alkoxy group include a methoxy group and an ethoxy group. R2 is preferably a mercapto group or a stupid group. Each R3 represents a Cl to Cm monovalent hydrocarbon group. Specific examples include the same groups as listed in the above R2 description. a represents a value in the range of 〇·25 to 0.75, and preferably a value of 〇.4 to 曰7. If the value of a is less than the lower limit of the range, the curing rate of the composition tends to decrease because the epoxy group is compared with J. On the contrary, if a 2 exceeds the upper limit of the above range, it is undesirable because the amount of the epoxy group is extremely large, and the resin to = is easily gelled. b denotes the value in the ' and is preferably the value of 〇3 to 〇6. c represents the value in the dry circumference, and is preferably a value of 〇 to 0.2. If the value of c exceeds the upper limit of this range, it is poor.耐r 1, &> The light fastness of the cured product tends to change 八 L i) to indicate each knot _ where a+b+c=1. The composition of the average existence ratio of 70 is obtained by a condensation reaction: a linear organopolyoxane which is subjected to hydrolysis and hydrolysis by the following formula (3): R3I ~ Si - 〇 - R3I * si - 〇 R3I Si - (3) Sub (wherein R3 is as defined above for the hydrolyzable group, 'and 坩 is 0 to x represents an integer such as alkoxy or ii prime U), 10 201041975 is represented by τ Epoxy-containing stone

(4) I再中R1及 R2為經基或CJ c6烧氧基),疋限制條件為至少-個(4) I further wherein R1 and R2 are a radical or a CJ c6 alkoxy group, and the 疋 restriction condition is at least one

及視情況選用之由式 表示的>5夕燒:And according to the situation, the expression of >5:

(5) (其中m R3如上文所定義,限制條件為至少一個 R2為羥基或c!至c6烷氧基)。 組分(A)之聚苯乙稀當量平均分子量典型地在3,刚 至10,000之範圍内,且較佳為3,〇〇〇至6,〇〇〇。此外,广^ ◎基當量典型地在2GG g/mol至謂g/m()1之範圍内且:氧 為 300 g/mol 至 600 g/m〇l。 乂佳 <組分(B ) > 具有含環氧基之非芳族基的第二聚矽氧樹脂 下所示之平均組成式(2)表示。 由从 (Rl-“_)d'“。)e (2) 11 201041975 在式(2)尹,、尺2及r3如上 地表示0、】或2之敕鉍。士 疋義。各Z獨立 下標「d」之第—心…”、' 構成第二聚矽氡樹脂的附有 …之”淀單二二’之發㈣單元(τ單元)、 … 早疋⑺早几)及X為2之矽 早疋)通常共存於其分子中。此等石夕氧烷單"早7°(Μ 於下文所述之製造方法中的之比例視用 解及縮合程度而定丁一n #類及該早體之水 程度而疋。T早疋:D單元:熥單 10:30:60至98.1.1夕e η & 旲斗比較佳在 98.1.1之範圍内,更佳為40:3〇:30至98.η 更佳為 60:20:20 至 96·2·2, s 审社— -1·1 範圍内。 6·2·2且更佳在80:10:10至95:3:2之 d表:在〇_5 i 〇.8範圍内之數值,且較佳為0·5至〇.7 ,值。:d之值小於此範圍之下限,則組成物變得難以 口化而右d之值超過上限,則樹脂變得難以合成且組成 物易於膠凝。e表示在Q 2jl Q 5範圍内之 〇m5之數值,限制條件為d+e=1。 製造組分(B)之方法與製造組分(A)之方法的不同 之處在於’在製備樹脂期間,使用由R、X2Si表示之有機石夕 備組分(A)中以上具有通式(3)之線性有機聚 石夕在縮合反應中,使有機找以及由通式(4)表示 之3 %氧基之碎燒經受水解及縮合反應來製造組分(B )之 第—聚#氧樹脂。因此’組分(B )基本上不含組分(A ) 中所s之(R山。、單元,且認為組分(B )具有與固化產物 中之又聯點類似的功能,從而增加固化產物之強度。因此, 本發明t組成物能夠形《具有*良硬度及而寸熱衝擊性及其 12 201041975 類似性質之固化產物,即使其不使用環氧 脂之組合,且特定言之,不使用廣泛用於膠囊 導體讀之脂環族環氧樹脂。因為固化產物不含該 月日,所以其亦不會經歷受熱變色。 氧柄' 組分(B)之聚苯乙稀當量平均分子量典型地在3, 至1〇,000之範圍内,且較佳為3,000至7,0〇〇。組分(B) 之環氧基當量典型地在1〇〇 §/111〇1至6〇〇 g/m〇1之範圍内, 〇且較佳為250 g/m〇i至4〇〇 g/m〇1。尤其合乎需要的是組分 (B )之裱氧基當量為約3〇 g/m〇1至3〇〇 g/m〇i並小於組分 (A )之環氧基當量。 、、刀 組分(B)之摻合量典型地在每1〇〇質量份組分(八) 與組分(B)之組合10質量份至5〇質量份、較佳1〇質量 伤至30質量份之範圍内。若組分(b )之量超過此範圍之 上限,則在發光元件發射紫外光之情況下,樹脂組成物之 固化產物易於由紫外光引起降解。此外,當經受長時間加 Q熱時’固化產物亦傾向於開裂。 <組分(C) > 固化劑(C)之實例包括基於胺之固化劑、基於齡之固 化劑及基於酸酐之固化劑,且在此等固化劑中,基於酸酐 之固化劑為較佳。 基於酸酐之固化劑的實例包括鄰苯二甲酸酐、順丁烯 〜酸酐、偏苯三酸酐、均苯四酸酐、六氫鄰苯二甲酸酐、 3 一甲基-六氫鄰苯二甲酸酐、4-甲基-六氫鄰苯二甲酸酐、3_ 甲基-六氫鄰笨二甲酸酐與4-甲基·六氫鄰苯二甲酸酐之混 13 201041975 合物、四氫鄰苯二甲酸酐、耐地酸酐(nadic anhydride)' 甲基耐地酸酐、降莰烷_2,3_二甲酸酐及甲基降莰烷_2,3_二 甲酸酐。固化劑(C)之摻合量為每丨莫耳在組分(A)與 鈕分(B)之組合中的全部環氧基提供〇4莫耳至丨5莫耳 且較佳0.5莫耳至1.2莫耳展現與環氧基之反應性的官能基 (在酸酐固化劑之情況下,為具有_c〇_〇_c〇_之酸氫化物基 團)。 <組分(D ) > 固化催化劑(D )之實例包括基於四級鎸鹽之固化催化 劑,諸如0,0·二乙基二硫代碟酸四丁基鱗及四苯基硼酸四 笨基鱗’基於有機膦之固化催化劑,諸如三苯基膦及二苯 基膦’基於二級胺之固化催化劑’諸如1,8_二氮雜雙環(5,4,〇) 十一碳-7-烯、三乙醇胺及苯曱基二甲胺;基於四級銨鹽之 固化催化劑,諸如1,8-二氮雜雙環(5,4,〇)十一碳_7_烯酚鹽、 工”-二氮雜雙環^〆…)·] 碳稀辛酸鹽及1,8-二氮雜雙 環(5,4,0)Ί 碳-7-烯甲苯磺酸鹽;及基於咪唑之固化催化 劑’遠如2-甲基哺β坐及2-本基-4-甲基ρ米嗤。在此等固化催 化劑中,四級鱗鹽及四級銨鹽為較佳。 固化催化劑(D )之摻合量典型地在每1 〇〇質量份組分 (Α)與組分(Β)之組合〇.〇1質量份至3質量份且較佳〇 〇5 質量份至0.5質量份之範圍内。若固化催化劑之摻合量小於 此範圍之下限’則催化劑可能不會提供環氧樹脂與固化劑 之間反應的足夠加速。相反’若固化催化劑之摻合量超過 以上範圍之上限,則固化催化劑可能會在固化期間或在回 14 201041975 流測試期間引起變色。 除上述組分外,諸如抗氧化 化劑、用於改變浊具夕衅, 啡仉老 矽或氧化絲拉、 、無機填充劑(諸如二氧化 I 、細粉末)、矽烷偶合劑、熱塑劑及稀釋劑之添 加劑亦可根攄雹14 + w〈艰 要^括在本發明之組成物中,限制條件為 具不4貝害本發明之曰 目的。基於受阻酚之抗氧化劑及基於磷 化劑較佳作為抗氧化劑。基於受阻胺之紫外線吸收 Ο Ο 1較佳作為i外線吸收劑。基於疏基之破烧偶合劑較佳作 為碎燒偶合劑。 一本發明之組成物可相對容易地藉由將組分(A)至(D) 一。或夕種必需之視情況選用之添加劑組合,且接著於約 ,C之/皿度(其足夠低以阻止固化進行)下執行熔融混合來 製造。'熔融混合可使用習知方法進行。舉例而言,可在反 應器中組合以上组公,甘士 — 、 ’、中接者以分批法執行熔融混合, 或可將各以上組分供應至諸如捏合機或三輥研磨機之混合 裝置中’其中以連續方式進行熔融混合。 由此獲传之用於膠囊封裝光學半導體元件的樹脂組成 物可藉由將由以上方法獲得之呈熔融混合物形式的樹脂組 成物注入内部已安裝發力元件之模具或外殼中,隨後於預 定溫度下對樹脂組成物進行Β階段處王里(B_staging),且接 著使組成物凝固來使用。 此外,樹脂組成物亦可用於保護安裝於基板上之lED, 此係藉由使用灌注方法、印刷方法、轉注成形方法、射出 成形方法或壓縮模製方法將該組成物施加於LEEM在藉由 15 201041975 灌注或射出成形來塗佈及保護諸如LED之發光半導體裝置 的情況下,本發明之组成物較佳呈液體形式。換言之,樹 月曰組成物之黏度(報導為於2 5 °C下使用旋轉黏度計量測之 值)較佳在 10 mPa.s 至 1,000,000 mPa.s 且更佳 1〇〇 mPa,s 至1,000,000 mPa*s之範圍内。另一方面,在發光半導體裝 置藉由轉注成形或其類似方法來製造之情況下’可使用上 述類型之液體樹脂,或者該製造可藉由增加黏度使液體樹 脂凝固(B-階段處理)且接著使固體粒化並隨後進行模製 來進行。 實施例 下文基於一系列實施例及比較實施例來更詳細地描述 本發明,但本發明決不受以下呈現之實施例限制。 [合成組分(A )] 在合成實施例中,產物夕巫上、丄 座初之十均組成式中n之平均值係 由將各 Γ1 與表示 Jfe rt-. T) , . β 衣不猎由Gpc所量測之分子量分佈的圖中關 於彼η之峰面積的乘籍+ 積(亦即乘法乘積)總和除以所有峰 之總面積來計算。舉例而士 而5在產物中η之範圍為2至20 的情況下,η之平均值由如箄 卜寺式η昇.[2χ (η為2之峰面 積)+ 3χ(η為3之峰面積^ 檟)··· + 2〇χ(η為20之峰面積)]/ [(η為2之峰面積)+ (η Τ由檟)+ .·. + (η為20之峰 面積)]。 <合成實施例1> g ( 5.966 莫耳) 其中in各為0至8之 向反應燒瓶中裝入1,695.6(5) (wherein m R3 is as defined above, the restriction is that at least one R2 is a hydroxyl group or c! to a c6 alkoxy group). The polystyrene equivalent average molecular weight of component (A) is typically in the range of 3, just up to 10,000, and preferably 3, 〇〇〇 to 6, 〇〇〇. Further, the base equivalent is typically in the range of 2 GG g/mol to g/m () 1 and oxygen: 300 g/mol to 600 g/m 〇l. &佳 <Component (B) > Second polyfluorene oxide resin having an epoxy group-containing non-aromatic group The average composition formula (2) shown below is represented. From (Rl-"_)d'". )e (2) 11 201041975 In the formula (2) Yin, the ruler 2 and the r3 represent 0, 】 or 2 as above.士疋义. Each of the Z's subscripts "d" is the first - heart...", and the "fourth" unit (the τ unit) of the second layer of the second bismuth resin is attached to the ... And X is 2 (as early as possible) and usually coexists in its molecule. These oxalates are “as early as 7° (the ratio in the manufacturing method described below) depends on the degree of solution and the degree of condensation, and the degree of water in the body of the body is 疋.疋: D unit: 熥10:30:60 to 98.1.1 夕e η & 旲 比较 better in the range of 98.1.1, more preferably 40:3 〇: 30 to 98. η better 60 :20:20 to 96·2·2, s Review - -1·1 range. 6·2·2 and better at 80:10:10 to 95:3:2 d: in 〇_5 a value in the range of i 〇.8, and preferably from 0·5 to 〇.7, value: the value of d is less than the lower limit of the range, the composition becomes difficult to be singulated and the value of the right d exceeds the upper limit, then The resin becomes difficult to synthesize and the composition is easily gelled. e represents the value of 〇m5 in the range of Q 2jl Q 5 with the constraint d + e = 1. Method of manufacturing component (B) and manufacturing component (A The method differs in that during the preparation of the resin, the linear organopolycarbon having the above formula (3) in the organolithic component (A) represented by R, X2Si is used in the condensation reaction. The organically-derived and calcined 3% oxy group represented by the general formula (4) is subjected to hydrolysis and condensation. To produce the first-polyoxyl resin of component (B). Therefore, component (B) is substantially free of component (A) (R), and component (B) is considered to have A function similar to that in the cured product, thereby increasing the strength of the cured product. Therefore, the t composition of the present invention is capable of forming a cured product having a good hardness and a thermal shock resistance and a similar property of 12 201041975, even if it is not A combination of epoxy resins is used, and in particular, an alicyclic epoxy resin widely used for capsule conductor reading is not used. Since the cured product does not contain the day of the month, it does not undergo thermal discoloration. The polystyrene equivalent average molecular weight of the fraction (B) is typically in the range of from 3 to 1,000,000, and preferably from 3,000 to 7,000. The epoxy equivalent of the component (B) is typically In the range of 1 〇〇/111〇1 to 6〇〇g/m〇1, and preferably 250 g/m〇i to 4〇〇g/m〇1. Particularly desirable are components. The epoxy equivalent of (B) is from about 3 〇g/m 〇1 to 3 〇〇g/m〇i and is less than the epoxy equivalent of the component (A). The blending of the knive component (B) Typically, it is in the range of 10 parts by mass to 5 parts by mass, preferably 1 part by mass to 30 parts by mass, per part by mass of the component (8) and the component (B). If the component (b) If the amount exceeds the upper limit of the range, the cured product of the resin composition is liable to be degraded by ultraviolet light in the case where the light-emitting element emits ultraviolet light. In addition, the cured product tends to crack when subjected to a long-time addition of Q heat. <Component (C) > Examples of the curing agent (C) include an amine-based curing agent, an age-based curing agent, and an acid anhydride-based curing agent, and among these curing agents, the acid anhydride-based curing agent is Preferably. Examples of the acid anhydride-based curing agent include phthalic anhydride, maleic anhydride, trimellitic anhydride, pyromellitic anhydride, hexahydrophthalic anhydride, 3-methyl-hexahydrophthalic anhydride, 4- Mixture of methyl-hexahydrophthalic anhydride, 3-methyl-hexahydrophthalic anhydride and 4-methylhexahydrophthalic anhydride 13 201041975, tetrahydrophthalic anhydride, Nadic anhydride' methyl-resistance, norbornane-2,3-dicarboxylic anhydride and methylnorbornane-2,3-dicarboxylic anhydride. The amount of the curing agent (C) blended is from 〇4 mol to 丨5 mol and preferably 0.5 mol per mol of the epoxy group in the combination of the component (A) and the button (B). A functional group exhibiting reactivity with an epoxy group to 1.2 moles (in the case of an acid anhydride curing agent, an acid hydride group having _c〇_〇_c〇_). <Component (D) > Examples of the curing catalyst (D) include a curing catalyst based on a quaternary phosphonium salt, such as tetrabutyl sulphate of tetramethyldithiosilicate and tetraphenylboronic acid Base scale 'based on organophosphine-based curing catalysts, such as triphenylphosphine and diphenylphosphine' based on a secondary amine-cure catalyst such as 1,8-diazabicyclo (5,4, fluorene) eleven carbon-7 - alkene, triethanolamine and benzoguanidine dimethylamine; a curing catalyst based on a quaternary ammonium salt, such as 1,8-diazabicyclo(5,4,yttrium)undecyl-7-enphenolate, -diazabicyclo^〆...)·] carbonic acid salt and 1,8-diazabicyclo(5,4,0)Ί carbon-7-ene tosylate; and imidazole-based curing catalyst For example, 2-methyl-n-β and 2-propenyl-4-methyl-p-methane. Among these curing catalysts, a quaternary phosphonium salt and a quaternary ammonium salt are preferred. The curing catalyst (D) is blended. The amount is typically in the range of from 1 part by mass to 3 parts by mass and preferably from 5 parts by mass to 0.5 parts by mass per 1 part by mass of the component (Α) and the component (Β). The amount of curing catalyst is less than this range 'The catalyst may not provide sufficient acceleration of the reaction between the epoxy resin and the curing agent. Conversely 'if the amount of curing catalyst exceeds the upper limit of the above range, the curing catalyst may be tested during curing or during the flow test at 14 201041975 Causes discoloration during the period. In addition to the above components, such as antioxidants, used to change the turbidity, sputum, oxidized silk, inorganic fillers (such as dioxide I, fine powder), decane coupling agent The additives of the thermoplastic agent and the diluent may also be included in the composition of the present invention, and the restriction condition is that the present invention is not harmful. The antioxidant based on the hindered phenol And the phosphating agent is preferably used as an antioxidant. The ultraviolet absorbing 基于 基于 1 based on the hindered amine is preferably used as the i-line absorber. The sulphur-based coupling agent based on the sulfhydryl group is preferably used as a breaker coupling agent. It may be relatively easy to combine the components (A) to (D), or the additives selected as appropriate, and then at about C, which is low enough to prevent curing. Melt mixing is carried out to make. 'Melting mixing can be carried out using a conventional method. For example, the above group can be combined in a reactor, and the glyco-, ', and the intermediate can perform melt mixing in a batch process, or can be Each of the above components is supplied to a mixing device such as a kneader or a three-roll mill, in which melt mixing is performed in a continuous manner. The resin composition thus obtained for encapsulating an optical semiconductor element can be obtained by the above method The resin composition in the form of a molten mixture is injected into a mold or an outer casing in which the force generating member is mounted, and then the resin composition is subjected to a B_staging at a predetermined temperature, and then the composition is solidified for use. In addition, the resin composition can also be used to protect the lED mounted on the substrate by applying the composition to the LEEM by using a perfusion method, a printing method, a transfer molding method, an injection molding method, or a compression molding method. 201041975 In the case of infusion or injection molding to coat and protect a light-emitting semiconductor device such as an LED, the composition of the present invention is preferably in a liquid form. In other words, the viscosity of the composition of the tree sorghum (reported as measured using rotational viscosity at 25 ° C) is preferably from 10 mPa.s to 1,000,000 mPa.s and more preferably 1 〇〇 mPa, s Up to 1,000,000 mPa*s. On the other hand, in the case where the light-emitting semiconductor device is manufactured by transfer molding or the like, 'a liquid resin of the above type can be used, or the production can be solidified by increasing the viscosity (B-stage treatment) and then The solid is granulated and subsequently molded. EXAMPLES The present invention is described in more detail below based on a series of examples and comparative examples, but the present invention is by no means limited by the examples presented below. [Synthetic component (A)] In the synthesis example, the average value of n in the composition of the product 夕 上, 丄 初 初 由 由 由 系 系 系 平均值 平均值 平均值 平均值 平均值 平均值 平均值 平均值 平均值 平均值 平均值 平均值 平均值 平均值 平均值The plot of the molecular weight distribution measured by Gpc is calculated by dividing the sum of the multiplication + product (ie, the multiplicative product) of the peak area of the η by the total area of all the peaks. For example, in the case where the range of η in the product is 2 to 20, the average value of η is η 升 箄 [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ Area ^ 槚)··· + 2〇χ (η is the peak area of 20)] / [(η is the peak area of 2) + (η Τ by 槚) + .·. + (η is the peak area of 20) ]. <Synthesis Example 1> g (5.996 mol) wherein in each of 0 to 8 was charged to the reaction flask, 1,695.6

MeO(Me)2Si〇(Me2Si〇)mSi(Me)2〇Me( 16 201041975 整數,且m之平均值為1.5)、3,〇〇〇 ml異丙醇及1,470 g (5·966莫耳)3-(3,4-環氧基環己基)乙基三甲氧基矽燒 (KBM303,由Shin-Etsu Chemical有限公司製造),接著添 加72 g 25%氫氧化四曱基銨水溶液及648 g水,且於室溫下 攪拌所得混合物3小時。反應完成後,將3,〇〇〇 ml甲苯添 加至反應系統中。接著用磷酸二氫鈉水溶液中和反應混合 物且使用分液漏斗用熱水洗滌分離之有機層。接著於減 Ο Ο 麗下移除曱苯’產生具有由以下平均組成式表示之結構的 目標樹脂(「樹脂1」)。 -藉由一 GPC所量測之聚苯乙烯當量平均分子量為 ,。環氧基當量為403 g/mo卜 1中=使用MSi_NMR進行量測所獲得之結果展示於圖 且在約π啊周圍出現之緣反映形成T單元之石夕原子, ’’·、 PPm至約-58 ppm處出現之蜂 ― "元之組合的”、子。因此,顯示==成…與 第一結構單元(士' 下平均組成式中之 莫耳%D單元與Μ單元之組合。、耳。丁早-及約10MeO(Me)2Si〇(Me2Si〇)mSi(Me)2〇Me (16 201041975 integer, and the average value of m is 1.5), 3, 〇〇〇ml isopropanol and 1,470 g (5·966 mol) 3-(3,4-Epoxycyclohexyl)ethyltrimethoxysulfonate (KBM303, manufactured by Shin-Etsu Chemical Co., Ltd.), followed by addition of 72 g of 25% aqueous solution of tetradecylammonium hydroxide and 648 g of water The resulting mixture was stirred at room temperature for 3 hours. After the reaction was completed, 3, 〇〇〇 ml of toluene was added to the reaction system. The reaction mixture was then neutralized with an aqueous solution of sodium dihydrogen phosphate and the separated organic layer was washed with hot water using a separating funnel. Then, the benzene was removed under reduced ’ ’ to produce a target resin ("resin 1") having a structure represented by the following average composition formula. - The polystyrene equivalent average molecular weight measured by a GPC is . The epoxy equivalent is 403 g/mo, 1 = the result obtained by measurement using MSi_NMR is shown in the figure and the edge appearing around π ah reflects the formation of the T unit of the stone atom, ''·, PPm to about -58 ppm appears at the end of the bee- " combination of the elements. Therefore, the display == into... and the first structural unit (the combination of the Mo's %D unit and the unit in the average composition of the 's'. Ears, Ding Zao - and about 10

其中η各為2至10之整數,且 為0、1或2之單之千均值為3.5,且 皁70共存於第一單元中。 17Wherein each of η is an integer of 2 to 10, and the thousandth mean of 0, 1 or 2 is 3.5, and the soap 70 coexists in the first unit. 17

X 201041975 <合成實施例2> 向反應燒瓶中裝入1,500 g ( ι·975莫耳) H〇(Me)2Si〇(Me2SiO)mSi(Me)2〇H(其中 m 各為 3至 18 之整 數,且m之平均值為8)、973.2 g ( 3.950莫耳)3_(3,4環 氧基環己基)乙基三甲氧基矽烷(KBM303,由Shin_Etsu Chemical有限公司製造)及2,3〇〇 ml異丙醇,接著添加49 g 25%氫氧化四曱基銨水溶液及449 1〇 g水,且於室溫下搜 拌所得混合物3小時。反應完成後,將2,3〇〇 m丨甲苯添加 至反應系統中,且用磷酸二氫鈉水溶液中和反應混合物。 接著使用分液漏斗用熱水洗滌分離之有機層。於減壓下移 除曱苯,產生具有由以下平均組成式表示之結構的目標樹 脂(「樹脂2」)。藉由GPC所量測之聚苯乙烯當量平均分子 量為5,600。環氧基當量為57〇 g/mM。X 201041975 <Synthesis Example 2> The reaction flask was charged with 1,500 g (ι·975 mol) of H〇(Me)2Si〇(Me2SiO)mSi(Me)2〇H (where m each was 3 to An integer of 18, and the average value of m is 8), 973.2 g (3,950 m) of 3_(3,4 epoxycyclohexyl)ethyltrimethoxydecane (KBM303, manufactured by Shin_Etsu Chemical Co., Ltd.) and 2, 3 〇〇 ml of isopropanol, followed by addition of 49 g of a 25% aqueous solution of tetradecylammonium hydroxide and 449 1 g of water, and the resulting mixture was incubated at room temperature for 3 hours. After the completion of the reaction, 2,3 〇〇 m of toluene was added to the reaction system, and the reaction mixture was neutralized with an aqueous solution of sodium dihydrogen phosphate. The separated organic layer was then washed with hot water using a separatory funnel. The benzene was removed under reduced pressure to give a target resin ("resin 2") having a structure represented by the following average composition formula. The average molecular weight of the polystyrene equivalent measured by GPC was 5,600. The epoxy equivalent weight was 57 〇 g/mM.

,、中η各為5至20之整數,且η之平均值為1〇,且χ 為〇、1或2之單元共存於第一單元中。 <合成實施例3 > "向反應燒瓶中裝入933.30 g ( 3.950莫耳)3_縮水甘油 氧基丙基三甲氧基矽烷(KBM4〇3,由Shin_Etsu chemicai 有限公司製造)、L500 g ( 1 975莫耳 18 201041975 HO(Me)2SiO[(Me)2SiO]mSi(Me)2OH(其中 m 各為 3 至以之 整數’且m之平均值為8)及2,3〇〇 ml異丙醇,接著添加 92-15 g 25%氫氧化四曱基銨水溶液及444 96 g水, 溫下攪拌所得混合物3小時。反應完成後,將2,3〇〇 甲 苯添加至反應系統中,且用磷酸二氫鈉水溶液中和反應混 合物。接著使用分液漏斗用熱水洗滌分離之有機層。於減 壓下移除甲苯,產生具有由以下平均組成式表示之結構的 目標樹脂(「樹脂3」)。藉由GPC所量測之聚笨乙烯當量平 均分子量為4,300。環氧基當量為570 g/m〇1。And η are each an integer of 5 to 20, and the average value of η is 1 〇, and the unit of χ 〇, 1 or 2 coexists in the first unit. <Synthesis Example 3 >" To the reaction flask, 933.30 g (3.95 mol) of 3_glycidoxypropyltrimethoxydecane (KBM4〇3, manufactured by Shin_Etsu Chemicai Co., Ltd.), L500 g was charged. (1 975 Moer 18 201041975 HO(Me)2SiO[(Me)2SiO]mSi(Me)2OH (where m is 3 to an integer ' and the average value of m is 8) and 2,3〇〇ml Propyl alcohol, followed by addition of 92-15 g of a 25% aqueous solution of tetradecylammonium hydroxide and 444 96 g of water, and the resulting mixture was stirred at a temperature for 3 hours. After the completion of the reaction, 2,3 Torr of toluene was added to the reaction system, and The reaction mixture was neutralized with an aqueous solution of sodium dihydrogen phosphate, and the separated organic layer was washed with hot water using a separating funnel, and toluene was removed under reduced pressure to give a target resin having a structure represented by the following average composition formula ("resin 3 The polystyrene equivalent average molecular weight measured by GPC was 4,300. The epoxy equivalent was 570 g/m〇1.

0,50,5

0.5 其中η各為5至20之整數’且n之平均值為1〇,且χ 為0、1或2之單元共存於第一單元中。 [合成組分(Β)] <合成實施例4> 向反應燒瓶中裝入187.00 g ( 1 566莫耳)二甲基二甲 氧基矽烷(KBM-22,由Shin-Etsu Chemical有限公司製造)、 766.67 g (3.111莫耳)3_(3,4_環氧基環己基)乙基三甲氧基 石夕烧(KBM303由Shin-Etsu Chemical有限公司製造)及 90〇!!11異丙醇,接著添加2169§25%氫氧化四甲基銨水溶 液及195.21 g水,且於室溫下攪拌所得混合物3小時。反 2010419750.5 wherein n is an integer of 5 to 20' and the average value of n is 1 〇, and a unit in which χ is 0, 1 or 2 coexists in the first unit. [Synthetic component (Β)] <Synthesis Example 4> The reaction flask was charged with 187.00 g (1 566 mol) of dimethyldimethoxydecane (KBM-22, manufactured by Shin-Etsu Chemical Co., Ltd.). ), 766.67 g (3.111 mol) 3_(3,4_epoxycyclohexyl)ethyltrimethoxy zebra (KBM303 manufactured by Shin-Etsu Chemical Co., Ltd.) and 90 〇!! 11 isopropyl alcohol, followed by 2169 § 25% aqueous solution of tetramethylammonium hydroxide and 195.11 g of water were added, and the resulting mixture was stirred at room temperature for 3 hours. Anti 201041975

應完成後,將1,〇〇〇 ml曱苯添加至反應系統中,且用璘酸 二氫鈉水溶液中和反應混合物。接著使用分液漏斗用熱水 洗滌分離之有機層。於減壓下移除甲苯,產生具有由以下 平均組成式表示之結構的目標樹脂(「樹脂4」)。藉由GPC 所量測之聚苯乙烯當量平均分子量為4,200。環氧基當量為 267 g/mol 〇After completion, 1, 〇〇〇ml of hydrazine was added to the reaction system, and the reaction mixture was neutralized with an aqueous solution of sodium hydrogen hydride. The separated organic layer was then washed with hot water using a separatory funnel. Toluene was removed under reduced pressure to give a target resin ("resin 4") having a structure represented by the following average composition formula. The polystyrene equivalent average molecular weight measured by GPC was 4,200. The epoxy equivalent is 267 g/mol 〇

其中X為0、1或2之單元共存於第一單元中。 <合成實施例5> 向反應燒瓶中裝入187.00 g ( 1 566莫耳)二甲基二甲 氧基矽烷(KBM-22,由Shin-Etsu Chemical有限公司製造Units in which X is 0, 1, or 2 coexist in the first unit. <Synthesis Example 5> A reaction flask was charged with 187.00 g (1 566 mol) of dimethyldimethoxydecane (KBM-22, manufactured by Shin-Etsu Chemical Co., Ltd.).

應完成後,將 1,000 ml曱苯添加至反應系After completion, add 1,000 ml of hydrazine to the reaction system.

-耳u於颯壓下移除曱苯, 平均組成式表示之結構的目標樹脂(「樹脂 w於减壓下移除曱苯, 加至反應系統中,且用磷酸 分液漏斗用熱水 F 多除曱苯’產生具有由以下 IT添加12.97 g 25%氫氧化四甲基敍水溶 且於室溫下攪拌所得混合物3小時。反 > ml曱苯添加至反應系統中,且- The ear resin is removed under pressure, and the target resin of the structure is represented by the average composition formula ("Resin w is removed under reduced pressure, added to the reaction system, and the phosphate separatory funnel is used with hot water F More than hydrazine-produced with the following IT addition 12.97 g of 25% tetramethylammonium hydroxide water-soluble and the mixture was stirred at room temperature for 3 hours. Anti->ml benzene was added to the reaction system, and

所量測之聚苯乙烯當量平均分子#為3,10C 脂(「樹脂5」)。藉由GpC 量為3,100。環氧基當量為 20 201041975The measured polystyrene equivalent average molecule # is 3,10 C fat ("resin 5"). The amount of GpC is 3,100. Epoxy equivalent weight is 20 201041975

其中x為0、1或2之單元共存於第一單元中。 <合成實施例6> 〇 向反應燒瓶中裝入187.00g(l.566莫耳)二甲基二甲. 氧基石夕烧(KBM-22,由Shin-Etsu Chemical有限公司製造)、 735.24 g (3.111莫耳)3-縮水甘油氧基丙基三曱氧基碎烧 (KBM403’ 由 Shin-Etsu Chemical 有限公司製造)及 900 ml 異丙醇,接著添加20.98 g 25%氫氧化四甲基銨水溶液及 188_82 g水,且於室溫下攪拌所得混合物3小時。反應完成 後’將1,000 ml甲苯添加至反應系統中,且用罐酸二氳納 水溶液中和反應混合物。接著使用分液漏斗用熱水洗滌分 ◎離之有機層。於減壓下移除曱苯,產生具有由以下平均組 成式表示之結構的目標樹脂(「樹脂6」)^藉由GPC所量測 之聚苯乙烯當量平均分子量為3,5〇〇。環氡基當量為295 g/mol。Units in which x is 0, 1, or 2 coexist in the first unit. <Synthesis Example 6> 187 The reaction flask was charged with 187.00 g (l.566 mol) of dimethyl dimethyl ketone oxide (KBM-22, manufactured by Shin-Etsu Chemical Co., Ltd.), 735.24 g (3.111 mol) 3-glycidoxypropyltrimethoxy smash (KBM403' manufactured by Shin-Etsu Chemical Co., Ltd.) and 900 ml of isopropanol, followed by addition of 20.98 g of 25% tetramethylammonium hydroxide Aqueous solution and 188-82 g of water were added, and the resulting mixture was stirred at room temperature for 3 hours. After the reaction was completed, 1,000 ml of toluene was added to the reaction system, and the reaction mixture was neutralized with a pot of dioxon aqueous solution. The organic layer was then washed with hot water using a separatory funnel. The terpene was removed under reduced pressure to give a target resin ("resin 6") having a structure represented by the following average composition, and the polystyrene equivalent average molecular weight measured by GPC was 3,5 Å. The cyclic thiol equivalent is 295 g/mol.

21 201041975 其中x為〇、1或2之單元共存於第一單元中。 &lt;實施例1至6、比較實施例1、參考實施例丨及2&gt; 使用以上所獲得之樹脂,用表丨中所示之配方製備組 成物。在表1中,關於各組分(除固化劑外)所列之數值 表示「質量份」。組成物中所用之其他組分列於下文。 (C )固化劑:4-甲基六氫鄰苯二甲酸肝(rIKAciD ΜΗ,由New Japan Chemical有限公司製造) (D )固化催化劑··四級鎸鹽(uCAT5003 ,由San-Apro 有限公司製造) 石夕院偶合劑:3-酼基丙基甲基二甲氧基矽烷 (KBM-802 ’ 由 Shin-Etsu Chemical 有限公司製造) 環氧樹脂·· 3’,4’-環氧基環己烷甲酸3,4_環氧基環己基 甲酿(CELL〇XIDE 2021P,由 Daicel Chemical ⑽她⑹ 有限公司製造) &lt;實施例1 &gt; 對80質量份樹脂1、20質量份樹脂4、相對於每i莫 耳樹脂1及4中之全部環氧基提供i莫耳酸酐基團之量的|| 固化劑及每100質量份樹脂i及4與固化劑之混合物〇 39 質量份固化催化劑及0.25質量份矽烷偶合劑進行熔融混合 以獲得組成物。熔融混合藉由首先在6〇。〇烘箱中熔融固化 劑及固化催化劑,隨後使用混合器(產品名稱:Thinky混 合器,由Thmky公司製造)於2,〇〇〇啊下與其他組分混 合1分鐘,且接著於2,20〇rpm下執行消泡i分鐘來執行。 &lt;實施例2&gt; 22 201041975 對80質量份樹脂i、2〇質量份樹脂5、相對於每^莫 耳樹脂1及5中之全部環氧基提供丨莫耳酸酐基團之量的 固化劑及每100質量份樹脂i及5與固化劑之混合物〇 39 質量份固化催化劑及〇.25質量份矽烷偶合劑以與實施例1 相同之方式進行熔融混合以獲得組成物。 〈實施例3&gt; 對80質量份樹脂2、2〇質量份樹脂4、相對於每】莫 耳樹脂2 &amp; 4中之全部環氧基提供1莫耳酸酐基團之量的 固化劑及4 100質量份樹脂2及4與固化劑之混合物〇 Μ 質ΐ份E1化催化劑及〇·25 f量份石夕炫偶合劑以與實施例^ 相同之方式進行熔融混合以獲得組成物。 &lt;實施例4&gt; 對80質量份樹脂2、2〇質量份樹脂5、相對於每丄莫 耳樹脂2丨5中之全部環氧基提供1莫耳酸酐基團之量的 口化劑及母1GG貝量份樹月旨2及5與固化劑之混合物〇 3 9 質量份固化催化劑及〇.25質量份石夕烧偶合劑以與實施例ι 相同之方式進行炫融混合以獲得組成物。 〈實施例5 &gt; 士對80質量伤樹脂3、2〇質量份樹脂6、相對於每1莫 耳樹脂…中之全部環氧基提供i莫耳酸酐基團之量的 口化齊I及4 1GG g m份樹脂3及6與固化劑之混合物〇 ^ f m &amp; 1Mb催化劑及〇&gt;25質量份石夕烧偶合劑以與實施例丄 相同之方式進行熔融混合以獲得組成物。 &lt;實施例6&gt; 23 201041975 對80質量份樹脂1、2〇皙々、 別質罝份樹脂4、相對於每j莫 耳樹脂1及4中之全部環氧美裎徂 、 展巩基k供1莫耳酸酐基團之 固化劑及#議質量份樹脂1及4與固化劑之混合物〇 39 f量㈣⑽化劑以與實施Μ 1相同之方式進行溶融混合 以獲得組成物。 &lt;比較實施例1 &gt; 對100質量份樹脂b相對於^ 1莫耳樹脂i中之環氧 基提供1莫耳酸酐基團之蚩的 义 ;里的固化劑及每100質量份樹脂i 與固化劑之混合物〇‘39質量份固化催化劑及0.25質量份石夕 烧偶合劑以與實施例1相同 门之方式進行熔融混合以獲得組 成物。 &lt;參考實施例1&gt; 對78質直份樹脂i、22質量份環氧樹脂、相對於每1 :耳?脂1及環氧樹脂中之全部環氧基提…莫耳酸肝基 =的固化劑及每_質量份樹脂卜環氧樹赌及固化劑 之此合物0.39質量份固化催化劊 以盥眘地η 催化劑及G.25質量”烧偶合劑 ”實施例i相同之方式進㈣融混合以獲得組成物。 &lt;參考實施例2&gt; :90質量份樹脂2、1G f量份環氧樹脂1對於每丄 24 201041975 [表1]21 201041975 A unit in which x is 〇, 1 or 2 coexists in the first unit. &lt;Examples 1 to 6, Comparative Example 1, Reference Example 丨 and 2&gt; Using the resin obtained above, a composition was prepared using the formulation shown in Table 。. In Table 1, the values listed for each component (except the curing agent) indicate "parts by mass". The other components used in the composition are listed below. (C) Curing agent: 4-methylhexahydrophthalic acid liver (rIKAciD®, manufactured by New Japan Chemical Co., Ltd.) (D) Curing catalyst··Quaternary phosphonium salt (uCAT5003, manufactured by San-Apro Co., Ltd.) Shi Xiyuan coupling agent: 3-mercaptopropylmethyldimethoxydecane (KBM-802 'made by Shin-Etsu Chemical Co., Ltd.) Epoxy resin · · 3', 4'-epoxy ring 3,4_epoxycyclohexyl alkanoic acid (CELL® XIDE 2021P, manufactured by Daicel Chemical (10) Her (6) Co., Ltd.) &lt;Example 1 &gt; For 80 parts by mass of resin 1, 20 parts by mass of resin 4, relative Each of the epoxy groups in each of the mole resins 1 and 4 provides an amount of i mole anhydride groups || a curing agent and a mixture of 100 parts by mass of the resin i and 4 and a curing agent, 39 parts by mass of a curing catalyst and 0.25 parts by mass of a decane coupling agent was melt-mixed to obtain a composition. Melt mixing is first done at 6 Torr. The molten solidifying agent and the curing catalyst in the oven were then mixed with other components for 2 minutes using a mixer (product name: Thinky Mixer, manufactured by Thmky Co., Ltd.), and then at 2, 20 Torr. Perform defoaming for 1 minute at rpm to execute. &lt;Example 2&gt; 22 201041975 For 80 parts by mass of the resin i, 2 parts by mass of the resin 5, and a curing agent in an amount of the oxime anhydride group relative to all the epoxy groups in each of the mole resins 1 and 5. And a mixture of the resin i and 5 and the curing agent per 100 parts by mass, 39 parts by mass of the curing catalyst, and 25 parts by mass of the decane coupling agent were melt-mixed in the same manner as in Example 1 to obtain a composition. <Example 3> A curing agent in an amount of 1 part by mass of the resin 2, 2 parts by mass of the resin 4, and 1 part of the epoxy group per mole of the epoxy group 2 & A mixture of 100 parts by mass of the resins 2 and 4 and a curing agent, an oxime portion E1 catalyst, and a ruthenium 25 f portion of Shi Xixuan coupling agent were melt-mixed in the same manner as in Example to obtain a composition. &lt;Example 4&gt; 80 parts by mass of the resin 2, 2 parts by mass of the resin 5, and a lipizing agent in an amount of 1 mole of the anhydride group per mole of the epoxy group in each of the 2 to 5 molar resins The mixture of the mother 1GG and the amount of the curing agent 〇3 9 parts by mass of the curing catalyst and the 25 parts by mass of the sulphur coupling agent were mixed by the same manner as in the example ι to obtain a composition. . <Example 5&gt; The amount of the i-molar acid group which provides the amount of the i-mole anhydride group with respect to the 80 mass-residual resin 3, 2 parts by mass of the resin 6, and the total epoxy group per 1 mol of the resin. 4 1 GG gm parts of a mixture of resins 3 and 6 and a curing agent 〇 ^ fm & 1 Mb of a catalyst and hydrazine &gt; 25 parts by mass of a sulphur coupling agent were melt-mixed in the same manner as in Example 以获得 to obtain a composition. &lt;Example 6&gt; 23 201041975 For 80 parts by mass of the resin 1, 2 〇皙々, the aliquot of the resin 4, with respect to all of the epoxy oxime and the scaffolding k in each of the j-mol resin 1 and A curing agent for 1 mole of anhydride group and a mixture of #1 parts by mass of resin 1 and 4 and a curing agent 〇 39 f amount (4) (10) The agent was melt-mixed in the same manner as in the practice of Μ 1 to obtain a composition. &lt;Comparative Example 1 &gt; The meaning of 100 parts by mass of the resin b relative to the epoxy group in the molar resin i to provide a 1 molar solvent group; the curing agent and 100 parts by mass of the resin i The mixture with the curing agent 〇 '39 parts by mass of the curing catalyst and 0.25 parts by mass of the sulphur coupling agent were melt-mixed in the same manner as in Example 1 to obtain a composition. &lt;Reference Example 1&gt; For 78-volume resin i, 22 parts by mass of epoxy resin, per 1 : ear? All of the epoxy groups in the fat 1 and the epoxy resin are used as a curing agent for the molybdenum acid group and 0.39 parts by mass of the compound per gram by mass of the epoxy resin and the curing agent. The ground η catalyst and the G.25 mass "burning coupler" were mixed and mixed in the same manner as in Example i to obtain a composition. &lt;Reference Example 2&gt;: 90 parts by mass of resin 2, 1 G f parts of epoxy resin 1 for each 丄 24 201041975 [Table 1]

表1之註釋:除(cT~i化劑以外分的單位言 質量份 Ο &lt;評估測試1&gt; 對各組成物進行以下測試,且結果展示於表2中。 (1)物理性質.藉由於i 00〇c下加熱2小時使組成物 固化,且接著藉由於150t下加熱4小時來進行後固化,由 此形成尽度為5 mm之桿狀固化產物。量測此桿狀固化產物 之外觀、硬度(肖氏D ( Shore D ))、撓曲彈性模數及撓曲 強度(JIS K-6911)。 (2 )耐熱變色性:使以與以上(1 )中相同之方式製 備的桿狀固化產物經受高溫老化(於l5〇t:T ^000小時), 且接著亦量測外觀。 (3 ) UV抗性:於1 〇〇°c下將組成物壓力模製30分鐘 以產生量測為6 cmx6 cmx2 mm (厚度)之固化產物,且隨 後於150°C下使固化產物後固化4小時以製備試樣。在UV 照射(使用高壓汞燈:30 mW/cm2,365 nm) 12小時後量 25 201041975 測透光度。藉由在800 nm至300 nm下掃描來量测透光度, 其中400 nm下之初始透光度視為100%。 (4)對於各組成物,藉由將聚四氟乙烯帶(厚度:180 /im)黏在載玻片之外周邊來製備載玻片,且接著將組成物 傾倒於所得凹形凹槽中,隨後藉由於100°C下加熱2小時來 固化,且接著於15〇。(:下進行後固化4小時,由此形成薄膜 固化產物。使用超顯微硬度計(DUH-W201S ’由Shimadzu 公司製造)量測此薄膜固化產物之顯微硬度。 [表2] 固化後(外觀) 硬度(肖氏D) 撓曲彈性模數 (N/mm2) 實施例 1 實施例 2 實施例 3 實施例 4 無色、 透明 無色、 透明 無色、 透明 無色、 透明 實施例J__ 無色、 透明 實施例 無色、 透明 75 1200 72 800 58 580 56 1250 41 77 比較實 施例1 無色、 透明 參考實 施例 無色、 透明 參考實 施例2 無色、 透明 690 1180 78 76 45 680 510 無法量 測*2 撓曲強度(N/mm UV抗性(%) 耐熱變色性 (150°C,1000 小時) 表面顯微硬度 (MPa) 35 97 無色、 透明 27 98 無色 透明 28 99 無色 透明 43 26 98 33 97 無色 透明 無法量 測*1 無法量 測*2 93 95 93 無色 透明 無色 透明 裂紋、 變黃 變黃 變黃Note to Table 1: Unit mass parts excluding (cT~i agent) &lt;Evaluation Test 1&gt; The following tests were performed on each composition, and the results are shown in Table 2. (1) Physical properties. The composition was cured by heating at i 00 〇 c for 2 hours, and then post-cured by heating at 150 t for 4 hours, thereby forming a rod-shaped cured product having a finality of 5 mm. Measuring the appearance of the rod-shaped cured product , hardness (Shore D ( Shore D )), flexural modulus of elasticity, and flexural strength (JIS K-6911). (2) Heat discoloration resistance: a rod shape prepared in the same manner as in the above (1) The cured product was subjected to high temperature aging (at 15 Torr: T ^ 000 hours), and then the appearance was also measured. (3) UV resistance: The composition was pressure molded at 1 ° C for 30 minutes to produce a measurement. A cured product of 6 cm x 6 cm x 2 mm (thickness), and then the cured product was post-cured at 150 ° C for 4 hours to prepare a sample. Under UV irradiation (using a high pressure mercury lamp: 30 mW/cm 2 , 365 nm) for 12 hours After the amount of 25 201041975 measured transmittance. Transmittance is measured by scanning at 800 nm to 300 nm, at the beginning of 400 nm The initial transmittance was regarded as 100%. (4) For each composition, a slide was prepared by adhering a polytetrafluoroethylene tape (thickness: 180 / im) to the periphery of the slide, and then the composition was The object was poured into the obtained concave groove, followed by curing by heating at 100 ° C for 2 hours, and then at 15 Torr. (: post-curing for 4 hours, thereby forming a film-cured product. Using ultra-microhardness The microhardness of the cured product of the film was measured by DUH-W201S 'manufactured by Shimadzu Co., Ltd. [Table 2] After curing (appearance) Hardness (Shore D) Flexural modulus (N/mm 2 ) Example 1 Example 2 Example 3 Example 4 Colorless, transparent, colorless, transparent, colorless, transparent, colorless, transparent Example J__ colorless, transparent embodiment colorless, transparent 75 1200 72 800 58 580 56 1250 41 77 Comparative Example 1 Colorless, transparent reference EXAMPLES Colorless, transparent Reference Example 2 Colorless, transparent 690 1180 78 76 45 680 510 Unmeasured *2 Flexural strength (N/mm UV resistance (%) Thermal discoloration (150 ° C, 1000 hours) Surface display Microhardness (MPa) 35 97 Colorless, transparent 2798 28 99 Colorless transparent Colorless transparent 4326983397 colorless and transparent not measured not measured * 1 * 2939593 colorless transparent colorless transparent cracks, yellowing yellowing yellowing

*1 : ^化產物今芩爷,而無法量測撓曲強度。 *2 :固化產物為橡膠狀的 而無法量測撓曲強度 &lt;評估測試2&gt; -LED裝置之製造及評估 使用來自實施例1及3〜&amp; 次3以及比較實施例1之組成物中 的每一者,使用下文所述之方制 丨I之万去製備具有各組成物之三種 26 201041975 LED裝置。使用厚度為i mm、沿一側長度為3麵且且有 2.6 mm直徑之開口(該開口之底部已電鍵銀)的預模製㈣ 封裝’使用銀漿料將基於InGaN之藍光發射元件固定於該 y H使用金線將外部電極連接至該發光元件。接 著將以上組成物之-注入封裝開口中。藉由於戰下加熱 1小時且接著於150。(:下再加熱2小時使組成物固化,由此 完成led裝置之製備。使所製備之LED裝置在以下所列之 條件下進行溫度循環測試,且在65。〇及95% RH之條件下 進行50G小時LED發光測試(LED波長:45〇nm),並接著 目測評估封裝界面處之黏著失效、裂紋之存在及變色之存 在。結果展示於表3中。 --溫度循環測試條件__ 一個猶環:於-40°C下20分鐘且接著於^彡艽下2〇分鐘 重複循環數:1,000 -黏著強度- 使用來自實施例1及3以及比較實施例【之組成物中 的每一者,使用以下方法製備黏著測試件。亦即,將組成 物薄塗層塗覆於鍍銀銅薄片上,將2mm見方之矽晶片置於 組成物上,且藉由於100下加熱1小時且接著於i 5〇。〇下 再加熱2小時使組成物固化,由此完成黏著測試件之製備。 使用晶粒黏結強度測試器(設備名稱:Dage系列4〇〇〇黏結 強度測試器’測試速度:200 Mm/s,測試高度:10.0从瓜, «測溫度:25。(:)量測所製備之黏著測試件的破裂處之黏著 強度。 27 201041975 [表3] ^溫高濕度發試(缺 _黏著強度(kg/mm 樹脂組成物 ^^循環測試(缺陷政万丁 實施例1 實施例3 比較實施例1 -- --------- 0/3 0/3 3/3 (出現開裂) ------- 0/3 0/3 3/3 (出現變色) ——~__ 1.7 2.8 1.1 自表2及3中之結果顯而易見,由缺乏組分(B )之比 較實施例1的組成物獲得之固化產物展現較差撓曲強度及 耐熱變色性,其中組成物在來自LEd之光下變色。此外, 由含有環氧樹脂而非組分(B)之參考實施例的組成物獲得 之固化產物在加熱後經歷變黃。相比之下,由本發明之實 施例的組成物獲得之固化產物展現高硬度且實質上不變 色。此外,自表2中所列之顯微硬度值顯而易見,實施例 之組成物產生硬度高於藉由在相同條件下使比較實施例及 參考實施例之組成物固化所獲得之固化產物的硬度之固化 產物’且亦展現較快固化速率。 工業適用性 本發明之組成物固化快,且產生展現優良耐熱變色性 及優良UV抗性之固化產物,且因此非常適用作用於膠囊封 裝光學元件之樹脂。 【圖式簡單說明】 圖1展示合成實施例 29Si-NMR 圖。 中所獲得之聚矽氧樹脂的 【主要元件符號說明】 Μ …、 28*1 : ^The product is now grandfather, and the flexural strength cannot be measured. *2: The cured product was rubbery and the flexural strength could not be measured&lt;Evaluation Test 2&gt; - The manufacture and evaluation of the LED device were carried out using the compositions from Examples 1 and 3 to &amp; 3 and Comparative Example 1. Each of them, using the square system described below, was used to prepare three 26 201041975 LED devices having compositions. Use a pre-molded (4) package with a thickness of i mm, a length of 3 sides and a 2.6 mm diameter opening (the bottom of the opening is keyed with silver). Use a silver paste to fix the InGaN-based blue-emitting element to The y H connects the external electrode to the light emitting element using a gold wire. The above composition is then injected into the package opening. By heating for 1 hour under the war and then at 150. (: heating was further carried out for 2 hours to cure the composition, thereby completing the preparation of the LED device. The prepared LED device was subjected to a temperature cycle test under the conditions listed below, and under conditions of 65 ° and 95% RH. A 50G hour LED luminescence test (LED wavelength: 45 〇 nm) was carried out, and then the adhesion failure at the package interface, the presence of cracks and the presence of discoloration were visually evaluated. The results are shown in Table 3. - Temperature cycle test conditions __ Jubilee ring: 20 minutes at -40 ° C and then 2 重复 2 cycles repeated cycles: 1,000 - Adhesive strength - using each of the compositions from Examples 1 and 3 and Comparative Examples In one case, an adhesive test piece was prepared by the following method, that is, a thin coating of the composition was applied onto a silver-plated copper foil, a 2 mm square wafer was placed on the composition, and heated by 100 hours for 1 hour. Then, the composition was cured by heating under heating for 2 hours, thereby completing the preparation of the adhesive test piece. Using the die bond strength tester (device name: Dage series 4〇〇〇 bond strength tester) test speed : 200 Mm/s, test Degree: 10.0 From melon, «Measurement temperature: 25. (:) Measure the adhesion strength of the cracked test piece prepared by the test. 27 201041975 [Table 3] ^Warm and high humidity test (lack of adhesion strength (kg/ Mm resin composition ^^ cycle test (defective political Wanding Example 1 Example 3 Comparative Example 1 -- --------- 0/3 0/3 3/3 (cracking) --- ---- 0/3 0/3 3/3 (discoloration occurs) -~__ 1.7 2.8 1.1 The results from Tables 2 and 3 are apparent, obtained from the composition of Comparative Example 1 lacking component (B) The cured product exhibited poor flexural strength and heat discoloration in which the composition was discolored under light from LEd. Further, the cured product obtained from the composition of the reference example containing the epoxy resin instead of the component (B) was After heating, it undergoes yellowing. In contrast, the cured product obtained from the composition of the examples of the present invention exhibits high hardness and does not substantially change color. Further, the microhardness values listed in Table 2 are apparent, and the examples are The composition produced hardness higher than that of the composition of the comparative example and the reference example under the same conditions. The cured product of the hardness of the cured product is 'and also exhibits a faster curing rate. Industrial Applicability The composition of the present invention cures quickly and produces a cured product exhibiting excellent heat discoloration resistance and excellent UV resistance, and thus is very suitable for use. Resin for encapsulating an optical element in a capsule. [Schematic description of the drawing] Fig. 1 shows a Si-NMR chart of Synthesis Example 29. [Key element symbol description] of the polyoxyl resin obtained in the Μ ..., 28

Claims (1)

201041975 七、申請專利範圍:ι·一種用於膝囊封裝光學车道胁__从七4 4、此 衣尤予牛導體兀件之組成物,該組成 物包含以下所述之組分(A)、(B)、(c)及(d): (A)第-聚矽氧樹脂,其具有含環氧基之非芳族 基,由以下所示之平的知士、 、 _、卞Q組成式(1 )表不,其量為5〇 質量份至90質量份, R —SiO(3.^Q a R3 I SiO Ο Ο b f R3—SiO(3.y)/2 (1) _其中Rl表示含環氧基之非芳族基,各R2獨立地表 不選自由&amp;基、(:!至c2G單價烴基及^至氧基組 成之群的成員,各R3表示Ci至C2❹單價烴基, X及y各獨立地表示〇、1或2之整數, a表示在〇·25至0.75範圍内之數值, b表不在〇·25至0.75範圍内之數值, c表示在0至0.3範圍内之數值 a+b+cd ’ 且 η表示2至20之整數, (Β )第二聚矽氧樹脂,其具有含環氧基之非芳 基,由以下所示之平均組成式(2)表示,其量為 質量份至50質量份, ~ R —SiO(3.z)/2 J ^ 限制條件 Ra Γ/e (2) 其中R1、R2及R3如上文所定義, 各z獨立地表示0、1或2之整數, 29 201041975 d表示在0.5至0.8範圍内之數值,且 e表示在0·2至0,5範圍内之數值,限制條件為 d+e=l , (C)固化劑,其具有可與環氧基反應之官能基, 其量為每1莫耳在組分(A)及組分(B)中之所有環 氧基提供0.4莫耳至1.5莫耳該可與環氧基反應之官能 基,及 (D )固化催化劑’其量在每1 〇〇質量份組分(A ) 與組分(B )之組合0.01質量份至3質量份之範圍内。 2 ·如申請專利範圍第1項之組成物,其中該平均組成式 (1)中之η為3至20之整數。 3. 如申請專利範圍第1項之組成物,其中組分(Α )之 聚苯乙烯當量平均分子量在3,000至1〇,〇〇〇之範圍内。 4. 如申請專利範圍第1項之組成物,其中組分(Α )之 環氧基當量在200 g/mol至800 g/mol之範圍内,且組分(B ) 之環氧基當量為至少30 g/mol並小於組分(A )之該環氧基 當量。 5. 如申請專利範圍第1項之組成物,其中R1表示&amp;(3心 環氧基環己基)乙基或γ-縮水甘油氧基烧基。 6. 如申請專利範圍第1項之組成物,其中R3為甲基。 7_如申請專利範圍第1項之組成物,其中組分(a )之 環氧基當量在300 g/mol至600 g/mol之範圍内,且組分(B ) 之環氧基當量在250 g/mol至400 g/mol之範圍内。 8.如申請專利範圍第1項之組成物,其中組分(c )為 201041975 酸酐。 9. 如申請專利範圍第1項之組成物’其進一步包含基於 疏基之石夕烧偶合劑。 10. —種半導體裝置,其包含光學半導體元件及藉由使 如申請專利範圍第1項至第9項中任一項之組成物固化所 獲得之固化產物,且該固化產物膠囊封裝該光學半導體元 件0 Ο 八、圖式: (如次頁)201041975 VII. Patent application scope: ι·A composition for the knee-bag encapsulation optical lane threat __ From 7.4, this garment is especially a composition of a bovine conductor, which composition contains the following components (A) (B), (c), and (d): (A) a poly-non-oxygen resin having a non-aromatic group containing an epoxy group, which is shown by the following, a squirrel, _, 卞Q The composition formula (1) indicates that the amount is from 5 〇 parts by mass to 90 parts by mass, and R—SiO(3.^Q a R3 I SiO Ο Ο bf R3—SiO(3.y)/2 (1) _ R1 represents a non-aromatic group containing an epoxy group, and each R2 is independently selected from members of a group consisting of a &amp; base, a (:! to c2G monovalent hydrocarbon group, and a oxy group, and each R3 represents a Ci to C2 fluorene monovalent hydrocarbon group, X and y each independently represent an integer of 〇, 1 or 2, a represents a value in the range of 〇·25 to 0.75, b represents a value in the range of 〇·25 to 0.75, and c represents a value in the range of 0 to 0.3. The value a+b+cd ' and η represents an integer of 2 to 20, (Β) a second polyfluorene oxide resin having an epoxy group-containing non-aryl group, represented by the average composition formula (2) shown below, The amount is from 50 parts by mass to 50 parts by mass ~ R —SiO(3.z)/2 J ^ Restriction Ra Γ/e (2) where R1, R2 and R3 are as defined above, each z independently represents an integer of 0, 1 or 2, 29 201041975 d denotes a value in the range of 0.5 to 0.8, and e represents a value in the range of 0·2 to 0,5, and the constraint is d+e=l, (C) a curing agent having a function reactive with an epoxy group a group having an amount of from 0.4 moles to 1.5 moles of the functional group reactive with the epoxy group per mole of all epoxy groups in the component (A) and the component (B), and (D) The amount of the curing catalyst is in the range of 0.01 parts by mass to 3 parts by mass per 1 part by mass of the combination of the component (A) and the component (B). 2 The composition of the first aspect of the patent application, wherein The η in the average composition formula (1) is an integer of 3 to 20. 3. The composition of the first aspect of the patent application, wherein the polystyrene equivalent average molecular weight of the component (Α) is 3,000 to 1 Torr, 〇 Within the scope of 〇〇 4. As in the composition of claim 1, the epoxy equivalent of the component (Α) is in the range of 200 g/mol to 800 g/mol, and the component (B) Epoxy The amount is at least 30 g/mol and less than the epoxy equivalent of the component (A). 5. The composition of claim 1, wherein R1 represents &amp; (3-epoxycyclohexyl)ethyl Or a γ-glycidoxyalkyl group. 6. The composition of claim 1, wherein R3 is a methyl group. 7_ The composition of claim 1, wherein the epoxy equivalent of the component (a) is in the range of 300 g/mol to 600 g/mol, and the epoxy equivalent of the component (B) is In the range of 250 g/mol to 400 g/mol. 8. The composition of claim 1, wherein component (c) is 201041975 anhydride. 9. The composition of claim 1 of the patent scope' further comprising a base-based coupling agent based on a base. 10. A semiconductor device comprising an optical semiconductor element and a cured product obtained by curing a composition according to any one of claims 1 to 9 and encapsulating the optical semiconductor Component 0 Ο Eight, schema: (such as the next page) 3131
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JP2008202036A (en) * 2007-01-22 2008-09-04 Sekisui Chem Co Ltd Thermosetting composition for optical semiconductor, encapsulant for optical semiconductor element, die bond material for optical semiconductor element, underfill material for optical semiconductor element, and optical semiconductor element
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