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TW201022711A - Moire strip inhibiting film, prism sheet with moire strip inhibiting function, backlight unit and liquid crystal display device using the same - Google Patents

Moire strip inhibiting film, prism sheet with moire strip inhibiting function, backlight unit and liquid crystal display device using the same Download PDF

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Publication number
TW201022711A
TW201022711A TW098130199A TW98130199A TW201022711A TW 201022711 A TW201022711 A TW 201022711A TW 098130199 A TW098130199 A TW 098130199A TW 98130199 A TW98130199 A TW 98130199A TW 201022711 A TW201022711 A TW 201022711A
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TW
Taiwan
Prior art keywords
light
film
porous
stripe
mass
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TW098130199A
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Chinese (zh)
Inventor
Masashi Miyamoto
Masanao Takashima
Ryuichi Saga
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Dainippon Ink & Chemicals
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Publication of TW201022711A publication Critical patent/TW201022711A/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0273Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278Diffusing elements; Afocal elements characterized by the use used in transmission
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G02B5/0231Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having microprismatic or micropyramidal shape
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0242Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0247Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of voids or pores
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/04Prisms
    • G02B5/045Prism arrays
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0033Means for improving the coupling-out of light from the light guide
    • G02B6/005Means for improving the coupling-out of light from the light guide provided by one optical element, or plurality thereof, placed on the light output side of the light guide
    • G02B6/0051Diffusing sheet or layer
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336Illuminating devices
    • G02F1/133602Direct backlight
    • G02F1/133606Direct backlight including a specially adapted diffusing, scattering or light controlling members
    • G02F1/133607Direct backlight including a specially adapted diffusing, scattering or light controlling members the light controlling member including light directing or refracting elements, e.g. prisms or lenses

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Planar Illumination Modules (AREA)
  • Liquid Crystal (AREA)

Abstract

The present invention provides a moire strip inhibiting film capable of film-thinned backlight units or liquid display devices in the prior art, and performs high front luminance and effectively inhibits the moire strip at the same time. The moire strip inhibiting film comprises photodiffusion layers having resin adhesives and porous particles on the surface of one side of transparency substrate, and pore volume of the porous particle is 1.00 to 2.00 ml/g, and contents of the porous particle is less than 30 parts by mass based on 100 parts by mass based of solid components of resin adhesives. In disposing prisms on structural backlight units of emerging surface side of the light guide plate toward the surface of prisms aspect; therefore, the prisms disposing on the surface side shows the excellent features. Besides, forming prisms on the opposite side by sandwiching the transparency substrate of photodiffusion layers is capable of producing prisms column with moire strip inhibiting functions.

Description

201022711 六、發明說明: 【發明所靥之技術領域】 本發明係關於一種作爲液晶顯示裝置(LCD)等之背光單 元的構成零件所使用之波形條紋抑制薄膜。 【先前技術】 在安裝於電腦、行動電話、數位相機等上的液晶顯示裝 置方面,作爲用於自背面側照亮其液晶顯示面的裝置,裝 有背光單元。第1圖顯示液晶顯示裝置之一般結構的一 e 例。在先前之背光單元2方面,係使自冷陰極管(CCFL)、 發光二極體(LED)等的光源3發出的光一面以反射片6等反 射,一面射入至導光板5,使自該導光板5上面射出的光 通過光擴散薄膜(下擴散薄膜)7而聚光於正面方向。來自光 擴散薄膜(下擴散薄膜)7的出射光係使其自形成有稜鏡列 的稜鏡片8的未形成棱鏡列之面(非稜鏡面)射入,並使其 自形成有稜鏡列之面(稜鏡面)射出,藉此再強烈聚光於正 面方向。如此一來,自稜鏡面射出的光由具有液晶顯示面 ® 的液晶模組1的下面射入,被利用作爲來自背面側的照 明。有時會在稜鏡片8與液晶單元1之間配置光擴散薄膜 (上擴散薄膜)9。 如此,在稜鏡片8有以下作用:使來自光擴散薄膜(下擴 散薄膜)的出射光以形成於透明基體面上的稜鏡斜面折 射,使其更偏向於正面方向,藉此提髙液晶顯示器之自觀 察者看的正面方向的亮度。此時,作爲將稜鏡片8配置於 光路上的方向,可朝向導光板的出射面而配置非稜鏡面, 201022711 亦可相反地朝向導光板的出射面而配置稜鏡的稜角,但在 先前之背光單元方面,因不要對稜鏡片的入射角的調整’ 故大多朝向導光板的出射面而配置非稜鏡面。 稜鏡片一般是連續的稜鏡列互相等間隔且平行地維持其 稜角而形成,各個稜鏡單位通常剖面爲等腰三角形。因此’ 若與等間隔排列的液晶單元之區劃重叠,就會形成稱爲波 形條紋的可見圖案,觀察圖像時,有時會觀察到濃淡花紋。 波形條紋是在稜鏡列的間距與液晶面板之像素的間距之 ® 間產生的比各間距間隔更粗的紋路》 若產生如此之波形條紋,就會在液晶顯示面的背景產生 濃淡的紋路,而成爲顯示圖像畫質降低的原因。特別是在 需要高清晰度顯示的液晶顯示裝置方面,波形條紋的抑制 成爲重要。 作爲難以產生波形條紋的手段,進行有在稜鏡片的出射 側插入光擴散薄膜(上擴散薄膜)。插入上擴散薄膜,減低 波形條紋的效果未必足夠,且成爲使液晶顯示面的亮度降 ❿ 低的原因,但作爲減低波形條紋的有效對策,以往一直被 採用。爲了藉由進行良好的光擴散,波形條紋亦解除,以 往波形條紋的抑制是作爲光擴散薄膜的次要效果而被考 量,幾乎沒有被獨立設計。此外,爲了有利光擴散,膜厚 比較厚的較多。 然而,最近液晶顯示裝置的更加薄型化的要求強烈,對 於背光單元,亦一面維持與以往同等的性能,一面硏討其 構成要素的削減、構成要素及全體結構的薄型化。例如, 201022711 在朝向導光板的出射面而配置有稜鏡片的稜鏡之稜角的背 光單元方面,即使不在導光板的出射面與稜鏡片之間配置 光擴散薄膜,亦可藉由導光板的設計與稜鏡片的設計之組 合而獲得充分的聚光效果。 以下說明將一面有稜鏡列的稜鏡片插入光路之際,取決 於朝向導光板的出射面而配置非稜鏡面、或朝向導光板的 出射面而配置稜鏡的稜角之聚光效果的不同。 第2圖及第3圖顯示朝向導光板的出射面而配置有稜鏡 ^ 片的非稜鏡面之一般背光單元的各光學元件之配置。第2 圖係顯示一般背光單元的稜鏡片配置之立體圖,第3圖係 顯示一般背光單元的光路之一例。自導光板15上面射出的 光藉由光擴散薄膜(下擴散薄膜)17的擴散效果,而更朝正 面方向聚光,成爲於出射角分布具有擴散的出射光後,自 稜鏡片1 8的非稜鏡面射入。然後,經過稜鏡片基體在到從 稜鏡列射出之間,利用構成稜鏡單位的材料與空氣之間的 ^ 折射率差而折射,使出射角分布的擴散光再偏向於正面方 ❹ 向而射出。假設無光擴散薄膜(下擴散薄膜)17,只是棱鏡 出射面的折射,則未必可將自導光板射出的光如第3圖所 示,朝正面方向充分彎曲完,大多接近光源側的亮度不被 充分提髙,因此要使背光正面方向的亮度分布提高且均 勻’需要暫且擴大角度分布,並使偏向於正面方向的光射 入稜鏡片,必需光擴散薄膜(下擴散薄膜)17。另一方面, 對於以光擴散薄膜17擴散爲正面方向寬廣的角度的光,要 使稜鏡片18的聚光作用充分發揮,並使來自導光板的出射 201022711 光朝背光正面方向有效聚光,需要使稜鏡片18以2片重 疊,且稜鏡列大致正交之方式配置,需要光擴散薄膜(下擴 散薄膜)1片與稜鏡片2片,合計至少3片的光學片。 另一方面,第4圖顯示朝向導光板的出射面而配置有稜 鏡片的稜鏡面之背光單元的各光學元件之配置。自導光板 25上面射出的光經過空氣層而進入稜鏡列,從稜鏡列32 中的稜鏡單位的一方斜面射入稜角內部後,以大於臨界角 的入射角射入另一方斜面的光利用此斜面受到全反射,大 ® 幅改變方向而朝背光正面方向聚光射出。因此,藉由進行 配合導光板的出射光方向等的特性的稜鏡列的設計,不用 光擴散薄膜(下擴散薄膜),而且只用1片稜鏡片,即可實 現朝背光正面方向的高且均勻的亮度分布。 如此,藉由採取如上述的稜鏡片配置,具有可減少零件 件數,背光單元的薄型化可能,並且生產性提高的優點。 然而,反面,與使用下擴散薄膜的先前背光單元的情況比 較,有更容易強烈觀察到波形條紋,並使液晶顯示裝置的 〇 w 顯示面的畫質降低產生的傾向。以往爲了抑制波形條紋’ 進行有在稜鏡片的稜鏡面的出射側,使用再一片擴散薄膜 的上擴散薄膜的波形條紋防止方法(例如參閱專利文獻1、 或專利文獻2)。然而,將如此之上擴散薄膜應用於配置稜 鏡片的稜鏡面於導光板的出射側之背光單元時’即使提高 擴散薄膜的混濁而大幅犧牲液晶顯示面的正面亮度’亦有 不能將波形條紋減低到可實際使用的水準的可能性。 若是在稜鏡片與液晶模組之間配置具有經由壓紋加工的 201022711 粗面之第二擴散板的專利文獻1的方法,則在配置稜鏡面 於導光板的出射側之背光單元方面,不能充分抑制波形條 紋,並且擴散板的厚度本身也未被薄膜化,背光單元全體 的厚度會因擴散板的插入而大幅增加,故不符合最近對薄 型化的要求。此外,若是在稜鏡片與液晶模組之間配置含 有樹脂粒子等作爲擴散材料的較低混濁的擴散薄膜的專利 文獻2的方法,則照樣使用市售的擴散薄膜,要抑制波形 條紋不足,想要獲得充分的擴散效果,必須使用膜厚較厚 的擴散薄膜,液晶顯示裝置的正面亮度容易降低,因此難 說適合使用最近的薄膜型液晶顯示裝置的高清晰度顯示。 以往硏討了各種使用有使具有減少零件件數的優點的稜 鏡片的稜鏡面朝向導光板的出射面之結構的背光單元,但 抑制波形條紋的對策不足,全都有應解決的課題。例如以 下結構的背光單元,對抑制波形條紋全都可能有若干的效 果,但仍然不足。例如作爲用於獲得背光亮度均勻性的手 段,硏討了以稜鏡片的非稜鏡面爲粗面者(例如參閱專利文 獻3)。此外,硏討了使來自導光板的出射光射入稜鏡片的 稜鏡面,在出射側的非稜鏡面配置凹凸加工表面、或使其 含有擴散粒子的擴散板(例如參閱專利文獻4)。此外,硏討 了具備有使入射面形成稜鏡狀透鏡,在出射面含有光擴散 材料的光擴散層者(例如專利文獻5)。 然而,在只是在非稜鏡面施行有先前之粗面化加工的專 利文獻3的稜鏡片方面,雖然使零件件數減少,但對抑制 波形條紋不足。此外,在將擴散板插入爲稜鏡片的非稜鏡 201022711 面的出射面側的專利文獻4的結構方面,對去除形成在導 光板用的反射板上的光點像有效,但對於去除波形條紋則 未硏討。假設考慮以該擴散板去除,則擴散板的厚度變厚, 所以容易引起液晶顯示面的亮度降低,並且有成爲液晶顯 示裝置全體薄型化的妨礙的可能性。再者,在非稜鏡面施 加有先前之光擴散層的專利文獻5的稜鏡片方面,雖然可 獲得擴大視野角的效果,並與專利文獻1的稜鏡片同樣, 使零件件數減少,但抑制波形條紋的效果有限,即使能夠 ® 抑制,亦有引起液晶顯示面的亮度降低的可能性。 如此,在專利文獻3〜專利文獻5所記載之稜鏡片方面, 在此等稜鏡片之出射面側形成有各種光擴散層。然而,此 等光擴散層的結構與使表面粗面化、或使先前所使用的光 擴散材料含有的用於獲得先前之均勻光擴散的結構沒有改 變,儘管使用有使棱鏡面朝向導光板的出射面之更容易產 生波形條紋的結構,但並未特別對於減低波形條紋進行新 的硏討。即,在專利文獻3〜專利文獻5的文獻所記載之 稜鏡片方面,雖然使來自稜鏡片出射面的聚集之光再射入 光擴散層,液晶顯示面的亮度因此而減低,但另一方面’ 對於減低波形條紋,不一定能獲得較大的效果。而且,對 於要更使液晶顯示裝置全體薄膜化的最近技術的潮流’也 未進行符合此的薄膜化硏討。總之,此等稜鏡片的光擴散 層並未將防止波形條紋的產生作爲本來的目的,其效果亦 有限。 另一方面,硏討了具有含有多孔質粒子作爲擴散效率較 201022711 高的擴散粒子的光擴散層的光擴散薄膜(參閱專利文獻6或 專利文獻7)。專利文獻6中記載有具有由平均一次粒子直 徑爲2.5μχη以上、ΙΟμπι以下的球狀多孔質二氧化矽與樹脂 黏合劑形成的光擴散層的光擴散薄膜。專利文獻7中記載 有多孔質的透明微粒子分散於透明基材層中的光擴散片。 然而,此等光擴散薄膜或光擴散片,雖然以使用多孔質粒 子來提高光擴散功能爲目的,但基本的功能或使用形態並 不是與先前的光擴散薄膜或片在性質上不同。不是進行有 ^ 使具有多孔質粒子的光擴散層發揮固有且先前沒有的明顯 的波形條紋抑制功能的使用方法,並且不是爲了抑制波形 條紋而硏討其結構,使其最佳化。與其他專利文獻同樣, 此等光擴散薄膜或光擴散片也是以均勻的光擴散爲第一目 的,防止波形條紋產生的效果爲次要,其效果的大小亦有 限。 波形條紋係隨著光學材料而在受到周期性強度變化的光 之間產生。因此,一般可利用使周期性強度變化消失之類 的強烈光擴散作用抑制。從而,藉由使光擴散層中的擴散 粒子濃度增加,或將使光擴散層的膜厚充分變厚的光擴散 薄膜插入光路內,可抑制其產生。然而,使用只依據此種 先前光擴散功能提高的方法,以稜鏡片朝正面方向偏向的 光線會再被偏向而朝周邊部去,所以朝正面方向的光量不 足,容易引起背光單元或液晶顯示裝置的正面亮度的降 低。再者,有使光擴散薄膜本身厚膜化的傾向,也不能符 合使背光單元或液晶顯示裝置薄膜化的最近對薄型化的要 -10- 201022711 求。 爲進行光擴散而可使用的方法中有各種方法,_直在研: 討對於各個光擴散所需要的局面最適合的方法而使用。然 而,至今並未施行將焦點集中到波形條紋上,從 觀點進行此等方法的硏討,而要求可更有效地將對正面亮 度降低的不良影響限制在最低限度的波形條紋的抑制方 法。 [專利文獻1]特開平6 — 034972號公報 ® [專利文獻2]特開平6-102506號公報 [專利文獻3]特開平5 — 34 1 1 3 2號公報 [專利文獻4]特開平9 - 2 1 1230號公報 [專利文獻5]特開平10 - 160914號公報 [專利文獻6]特開2004 — 06 1 598號公報 [專利文獻7]特開2004 - 348000號公報 [發明欲解決之課題] 本發明之目的在於提供一種波形條紋抑制薄膜,其係在 〇 使用作爲液晶顯示裝置所使用之背光單元用的波形條紋抑 制薄膜時,以較薄的膜厚抑制波形條紋的效果高,並可維 持背光單元或液晶顯示面較高的正面亮度,故有助於先前 的背光單元或液晶顯示元件的薄膜化,並可同時實現較高 的正面亮度與有效的波形條紋的抑制。特別是在於提供一 種波形條紋抑制薄膜,其係在配置稜鏡片之稜鏡面於導光 板的出射面側之結構的背光單元方面,應用於稜鏡片的出 射側時,可更有效地進行背光單元全體的薄膜化與波形條 -11- .201022711 紋抑制的兩方。 【發明內容】 [解決課題之手段] 本發明者等發現,在具有使用特定的多孔質粒子,含有 此多孔質粒子作爲擴散粒子之光擴散層的波形條紋抑制薄 膜方面,以多孔質粒子的細孔容積爲一定的範圍,將多孔 質粒子的體積平均粒徑與光擴散層的膜厚之間的關係、光 擴散層中的多孔質粒子的含有量等設定在特定範圍,藉此 ® 可製作即使光擴散層的膜厚較薄,也不會大幅降低正面亮 度,並可有效地防止波形條紋的波形條紋抑制薄膜,終至 完成本發明。 即,本發明提供一種波形條紋抑制薄膜,其特徵在於: 其係配置於朝向稜鏡面而配置於背光單元的導光板之出射 面的稜鏡片之出射面側的波形條紋抑制薄膜,並且於透光 性基體一方之面上具有含有樹脂黏合劑與多孔質粒子的光 擴散層,前述多孔質粒子的細孔容積爲1.00〜2.00ml/ g, ❹ 多孔質粒子的含有量相對於樹脂黏合劑的固體成分100質 量份爲3 0質量份以下。 再者,本發明提供一種附有波形條紋抑制功能之棱鏡 片,其特徵在於:其係形成有夾著前述光擴散層之前述透 光性基體,而在相反側具有互相平行之稜角的棱鏡形狀。 再者,本發明提供一種背光單元,其特徵在於:其係具 有前述波形條紋抑制薄膜或附有波形條紋抑制功能之稜鏡 片。 -12- 201022711 再者,本發明提供一種背光單元,其係具有配置 板與導光板之至少一側端面側的光源,及在前述導 出射面側具有配置稜鏡面於該出射面側的稜鏡片, 棱鏡片之出射面側具有前述波形條紋抑制薄膜。 再者,本發明提供一種背光單元,其係具有配置 板與導光板之至少一側端面側的光源,及在該導光 射面側具有配置稜鏡面於該導光板之出射面側的前 波形條紋抑制功能之稜鏡片。 再者,本發明提供一種液晶顯示裝置,其係具有 述波形條紋抑制薄膜或前述附有波形條紋抑制功能 片的背光單元。 本發明之波形條紋抑制薄膜的光擴散層中所含有 質粒子含有許多細孔,且該細孔含有黏合劑樹脂及 故射入光擴散層的光在通過此等細孔與保持此等細 合劑、及細孔內的黏合劑樹脂及空氣之間極多數次 反射、折射。結果,與通常的樹脂粒子比較,藉由 含有量的多孔質粒子、膜厚比較薄的光擴散層,亦 地擴散。因此,可使朝波形條紋抑制薄膜的入射光 散射而抑制波形條紋的產生,並可減低稜鏡片透過 損失,可將全光線透過率維持在較高的値,故可高 液晶顯示面的正面亮度,並且抑制波形條紋的產生 明具有的上述效果的理由未必明確,但基本上此等 粒子在多孔質粒子表面具有比粒子直徑等級更細數 凸,此等通常比稜鏡的稜線間距或液晶元件的像素 於導光 光板之 且在該 於導光 板之出 述附有 具備前 之稜鏡 的多孔 空氣, 孔的黏 地重複 比較少 可良好 良好地 時的光 度保持 。本發 多孔質 級的凹 間距更 -13- 201022711 細小。因此,被認爲經由如此之多孔質粒子表面的細微構 造的反射或折射,可更有效地攪亂通過稜鏡或液晶像素等 的規則性構造之光線的光路,即使是較少的多孔質粒子的 添加量,與在表面不具有如此細小的凹凸的光擴散粒子相 比,亦可以非常少的添加量有效地抑制波形條紋的產生。 在使用於通常之光擴散層之樹脂粒子方面,因樹脂粒子 與黏合劑樹脂之間的折射率差較小,故伴隨入射光大幅偏 向的光擴散係在主要以樹脂粒子形成的光擴散層表面的凹 ® 凸進行。然而,使用多孔質粒子作爲擴散粒子的情況,如 上所述,在含有黏合劑與空氣的多孔質粒子的界面、或含 有空氣的多孔質粒子內的光擴散有助於波形條紋的抑制。 再者,本發明之波形條紋抑制薄膜係在透光性基體一方 之面上具有含有樹脂黏合劑與多孔質粒子的光擴散層的波 形條紋抑制薄膜,並且多孔質粒子的細孔容積爲1.00〜 2.0 0 m 1 / g 〇 申請人發現,藉由使用多孔質粒子作爲光擴散層中的擴 散粒子,可有效地進行波形條紋的抑制,但發現再藉由以 使用的多孔質粒子的細孔容積爲特定的範圍,可不使正面 亮度降低,而以光擴散層較薄的膜厚更有效地進行波形條 紋的抑制。 即,本發明之光擴散層之多孔質粒子的細孔容積爲1.00 〜2.00ml/ g。藉由以本發明之波形條紋抑制薄膜的細孔容 積爲1.00ml/g以上,入射光不僅在擴散粒子的表面,而 且在與粒子內的細孔之界面被不規則擴散的機率變得極 -14- 201022711 高。因此,即使將使將光擴散層中的多孔質粒子的含有量 抑制得較低,亦可獲得同等的波形條紋抑制效果。 如此,藉由設定細孔容積,可將多孔質粒子的含有量抑 制得較低,故可防止因調配較多多孔質粒子的塗料而產生 的適用期(pot life)降低、或因以如此之塗料所形成的塗膜 的樹脂成分相對地減少而與基體的接合力降低》 另一方面,多孔質粒子的細孔容積越超過2越變大,則 正面亮度容易降低。此被認爲是因爲若細孔容積變大,則 v 會在粒子中形成極複雜交錯的許多空孔,所以將此作爲擴 散粒子而添加到光擴散層中時,會形成不能塡充黏合劑樹 脂的許多空孔,在空孔界面的折射角變大,朝向正面方向 的光線會相對地減少。基於同樣的理由,故細孔容積爲1.8 以下較佳,爲1.6以下更佳。 再者,雖然未必明確,但也被認爲因爲在未以黏合劑樹 脂塡充的細孔的界面容易產生全反射,所以難以射出入射 光。 〇 再者,若細孔容積增加,則塡充細孔容積的黏合劑樹脂 的量也增加,所以多孔質粒子中的黏合劑樹脂的總量也增 加。因此,多孔質粒子會更具有類似黏合劑樹脂的特性, 被認爲容易產生多孔質粒子彼此的凝聚。因此,光擴散層 形成用的塗料增黏,有容易膠化的傾向。由以上的理由, 若使用含有具有上述範圍的細孔容積的多孔質粒子的光擴 散層用塗料而形成光擴散層,則不會使正面亮度大幅降 低,而可利用較薄的光擴散層有效地抑制波形條紋。再者, -15- 201022711 也不會產生塗料本身的增黏或膠化。 再者,本發明之波形條紋抑制薄膜係多孔質粒子的 量相對於樹脂黏合劑的固體成分100質量份在於30質 以下的範圍。 在本發明中發現,藉由以光擴散層中的多孔質粒子 有量爲多孔質粒子的含有量相對於樹脂黏合劑的固體 100質量份爲30質量份以下,不會在光擴散層的表面 較大的凹凸,且出射光的光路不會大幅離開正面方向 ® 者,光擴散層中的黏合劑成分比率不會降低,所以接 度不會降低。 即,本發明之波形條紋抑制薄膜具有含有多孔質粒 光擴散層,故光擴散效率較高。因此,即使是較薄的 且較少的添加量,也使入射光有效地散射,對波形條 抑制發揮較高的功能。此外,多孔質粒子的細孔容積爲 〜2.0 0ml/ g。因此,即使將光擴散層中的多孔質粒子 有量抑制得較低,也可獲得同等的波形條紋抑制效果 〇 此外,進一步光擴散層中的多孔質粒子的含有量相 樹脂黏合劑的固體成分100質量份爲30質量份以下, 不在光擴散層表面形成較大的凹凸,而使不規則反射 低更加確實》接合強度也不會使其降低。 [發明之效果] 本發明之波形條紋抑制薄膜在透光性基體一方之面 有含有多孔質粒子的光擴散層,該多孔質粒子的細孔 在於1.00〜2.00ml/g的範圍,故可以較少的含有量 含有 量份 的含 成分 產生 。再 合強 子的 膜厚 紋的 1.00 的含 〇 對於 所以 的降 上具 容積 進行 -16- 201022711 有效的光擴散,並可確保朝正面方向射出的光量,不使正 面亮度大幅降低,而可有效地進行波形條紋的抑制。再者, 多孔質粒子的含有量相對於樹脂黏合劑的固體成分100質 量份爲30質量份以下,故不會在光擴散層的表面產生較大 的凹凸,出射光的光路不會大幅離開正面方向,所以可不 使正面亮度降低,而以光擴散層較薄的膜厚更有效地進行 波形條紋的抑制。 本發明之波形條紋抑制薄膜,在具有配置於導光板與導 〇 光板之至少一側端面側的光源、及朝向導光板的出射側而 配置稜鏡的稜角於前述導光板的一側出射面側的稜鏡片之 波形條紋極易產生的背光單元之結構方面,如第5圖所 示,配置於前述稜鏡片的出射面側時,不使背光單元的正 面亮度大幅降低,而極有效地抑制波形條紋。再者,由於 薄膜本身的膜厚較薄,所以對於爲上述背光單元結構特點 的背光單元全體的薄膜化,不成爲妨礙。 本發明之附有光擴散功能之稜鏡片形成有夾著透光性基 ^ 體而具有平行之稜角的稜鏡形狀,故藉由使稜鏡面朝向導 光板的出射側而配置該稜鏡片,使自稜鏡面射入的光線以 相反側的光擴散層有效地散射,且不使朝向正面方向的光 量大幅降低,可有效地防止在稜鏡面與液晶單元之間產生 的波形條紋。再者,不僅實現使稜鏡片與波形條紋抑制薄 膜一體化的功能,而且也有減低背光單元全體的零件件數 的效果。 再者,使用此等波形條紋抑制薄膜或附有波形條紋抑制 -17- .201022711 功能之稜鏡片的背光單元可提供保持較高的正面亮度’可 抑制其降低,並可有效抑制波形條紋的光源’同時藉由使 用此等,可將單元全體的膜厚抑制得較薄。 再者,於液晶顯示面之背面具有此等背光單元的液晶顯 示裝置,可提供保持顯示面較高的正面亮度’並且防止朝 顯示面產生波形條紋的液晶顯示裝置。 此外,如上所述,由於可將背光單元全體的厚度抑制得 較薄,所以亦可有助於液晶顯示裝置本身的薄型化。 ® 【實施方式】 [實施發明之最佳形態] 以下,就用於實施本發明的包含最佳形態的各種波形條 紋抑制薄膜及附有波形條紋抑制功能之稜鏡片、背光單元 及液晶顯示裝置的各部分進行說明。 首先,本發明之波形條紋抑制薄膜的光擴散層含有多孔 質粒子作爲光擴散材料,並以該多孔質粒子的細孔容積爲 1.00〜2.00ml/g的範圍,藉此光擴散層的膜厚即使較薄, 〇 也不使正面亮度大幅降低,而可有效地抑制波形條紋。若 是多孔質粒子的細孔容積小於l.ooml/ g,則爲了有效地抑 制波形條紋,必須使光擴散層中的擴散粒子濃度增加,該 情況,有擴散層與基體的接合力降低、或塗料的適用期(pot life)降低的問題。另一方面,若多孔質粒子的細孔容積大 於2.00ml/ g,則塗料中的多孔質粒子的細孔中的黏合劑樹 脂總量變多,容易產生多孔質粒子間的凝聚,結果有塗料 適用期(pot life)降低的問題。再者,該多孔質粒子的細孔 -18- 201022711 容積變大,多孔質粒子中的更多細孔部分不被黏合劑樹脂 塡充,而作爲空孔殘留。因此,入射光在細孔壁與折射率 差較大的空孔之間,受到折射角較大的折射,更容易朝離 開正面的方向射出,故正面亮度可能降低。再者,射入未 以黏合劑樹脂塡充的空孔部分的光容易爲空孔壁全反射, 故出射光容易減少也可能是原因之一。 如此,細孔容積較大的波形條紋抑制薄膜的光擴散能力 較高,故正面亮度容易因各種原因而降低,但入射光的散 ® 射角度有擴大的傾向,故也有可有效抑制視野角較大的方 向的波形條紋的優點。因此,使用作爲通常的光擴散薄膜 時,使用多孔質粒子的含有量更少、光擴散層的膜厚更薄 的光擴散薄膜,可獲得同等的光擴散效果。 再者,多孔質粒子的細孔容積可利用水銀壓入法(孔率計 法)測量,可於利用水銀孔率計(例如島津製作所的自動孔 隙IV95系列)測量細孔分布時獲得。 使用於本發明之波形條紋抑制薄膜的光擴散層的多孔質 V 粒子,最佳是具有全體具有不規則的角度與邊長的多角形 形狀的不定形的多孔質粒子,以便更有效地攪亂通過稜鏡 列或液晶像素排列的光線的光路。球狀者相較於不定形 者,光擴散功能較低,故爲了良好地抑制波形條紋,可使 其含有更多的粒子,有正面亮度容易降低的傾向。 此外,球形多孔質粒子容易在光擴散層的表面形成半球 狀的凹凸,此等凹凸容易使朝正面方向偏向的光線朝周邊 方向散射。在配置光擴散薄膜於導光板的出射面,自稜鏡 -19- 201022711 片的非稜鏡面側使光線射入的第2圖、第3圖的配置方面, 利用光擴散薄膜與稜鏡片使入射角較大的光線朝正面方向 偏向,所以利用光擴散薄膜的光線較大的偏向會使正面亮 度提高。然而,在使稜鏡片的稜鏡面與導光板的出射面對 向的第4圖、第5圖的配置方面,來自導光板的出射光已 爲稜鏡片所較大地朝正面方向偏向,所以稜鏡片的出射 後,若具有較強的偏向效果的光學元件存在,則會使光線 朝周邊方向偏向,正面亮度容易降低。 作爲多孔質粒子的構造,一次粒子凝聚而形成體積平均 粒徑1〜ΙΟμιη的不定形的凝聚粒子較佳。體積平均粒徑2 〜8 μ m更佳,2.5〜6 μ m最佳。特別是若小於3 · 5 μ m,則體 積平均粒徑較小,難以形成多孔質粒子所造成的光擴散層 表面的凹凸爲較佳。關於正面亮度的降低,進一步若體積 平均粒徑爲2〜3 . 1 μηι的範圍,則可抑制得最小。再者,作 爲一次粒子,粒徑10〜l〇〇nm者較佳。若是具有本發明中 規定的細孔容積的範圍者,則即使是球狀的多孔質粒子也 可使用,球狀者相較於不定.形者,光擴散功能較低,故爲 了良好地抑制波形條紋,可使其含有更多的粒子,正面亮 度容易降低。此外,爲了更有效地產生不規則的反射、折 射,粒度分布幅度較大者佳。有機微粒子、無機微粒子均 可使用,其中尤以多孔質二氧化矽、多孔質氧化鋁、多孔 質氧化鈦、多孔質玻璃等無機材料容易大幅取得與黏合劑 樹脂的折射率差、容易提高粒子表面的反射率,所以在可 有效地獲得擴散反射光之點上較佳。再者,在容易使光擴 -20- 201022711 散層的表面硬度提髙之點上也較佳。其中尤以多孔質二氧 化矽的粒子更佳。 再者,要測量多孔質粒子的粒徑,可使用雷射繞射式的 粒度分布測量裝置,例如雷射繞射式粒度分布測量裝置 SALD_ 2200(島津製作所股份有限公司製)。 本發明之波形條紋抑制薄膜的光擴散層,因多孔質粒子 的擴散效率良好,故可比先前使膜厚變薄,波形條紋抑制 薄膜可薄膜化。要抑制波形條紋與確保較高的正面亮度, ® 並且謀求光擴散層的薄膜化,可以光擴散層厚爲8μηι以 下,可實現比先前極薄的膜厚的光擴散層,波形條紋抑制 薄膜可大幅薄膜化。若爲6 μιη以下的膜厚,則在薄膜化之 點上更佳。然而,若爲小於2μιη的膜厚,則即使調整擴散 粒子的粒徑或含有量,光擴散的效率也容易降低,因此考 慮薄膜化的情況,2〜6μιη的範圍的膜厚也較佳。 在前述擴散層厚非常薄的區域,多孔質粒子會從前述光 擴散層的樹脂黏合劑表面突出,擴散光容易朝正面方向大 φ 幅受到偏向。因此,要一面更有效地抑制波形條紋,一面 高度保持正面亮度,並且抑制波形條紋抑制薄膜全體的膜 厚,將擴散層厚抑制在多孔質粒子的體積平均粒徑的1.3 〜2.1倍的範圍較佳。t/d小於1.3時,多孔質粒子容易從 光擴散層的樹脂黏合劑表面突出。因此,在光擴散層的表 面形成極粗的凹凸,來自光擴散層的出射光容易從正面方 向朝具有較大角度的方向大幅受到偏向。此外,富於多孔 質粒子的細小凹凸的表面出現於最外層上,故出射時的不 -21- 201022711 規則反射亦變得顯著,出現正面亮度降低的傾向。 是多孔質粒子的體積平均粒徑愈大愈顯著,體積平 小於3.5μιη時,形成於光擴散層表面的凹凸變得相 但超過6μιη時,則成爲相當顯著。因此,要更有效 波形條紋,並且高度保持正面亮度,最佳各個多孔 埋沒於光擴散層的黏合劑樹脂中。t/d大於1.3時 光擴散粒子充分埋設於黏合劑樹脂中。若有使多孔 埋沒的足夠厚度的樹脂層,則多孔質粒子從光擴散 ® 較少。富於多孔質粒子的凹凸的表面直接暴露於空 少,許多多孔質粒子的表面與黏合劑樹脂接觸,沉 脂層的表面以下。因此,來自光擴散層的出射光不 面進行極大的不規則反射,正面亮度降低較少。 此外,若t/d超過2.1,光擴散層的膜厚過厚, 符合謀求波形條紋抑制薄膜的薄膜化之本案發明的 並且複數粒子直徑不同的擴散粒子容易互相重叠於 向,在光擴散層表面容易再度產生凹凸。若光擴散 〇 厚更厚,則會在黏合劑樹脂中充分埋設多孔質粒子 面亮度有恢復的傾向,但光擴散層的膜厚變厚,更 達成使波形條紋抑制薄膜的膜厚變薄的本案發明的 此傾向也是多孔質粒子的體積平均粒徑愈大愈顯 此,體積平均粒徑小於3.5μιη時,更佳是2〜3.1μιη 形成的凹凸所造成的正面亮度的降低較小,不成爲 題,但超過3.5μιη時,t/d爲2.1以下較佳。特別 平均粒徑超過6μιη時,所形成的凹凸更顯著,故以 此傾向 均粒徑 當小, 地抑制 質粒子 ,可將 質粒子 層突出 氣中較 沒在樹 會在表 則難以 曰 , 膜厚方 層的膜 ,故正 加不能 目的。 著。因 時,所 大的問 是體積 t/ d爲 -22- 201022711 2 · 1以下更佳。 藉由以多孔質粒子的體積平均粒徑(d)與光擴散層的膜 厚(t)之比率t/d爲1.3〜2.1的範圍,有使多孔質粒子埋沒 的足夠厚度的樹脂層,故多孔質粒子從光擴散層突出較 少’並且也沒有僅複數粒子在光擴散層中互相重疊的厚 度,其機率也較少,所以富於多孔質粒子的凹凸的表面直 接暴露於空氣中較少,許多多孔質粒子的表面埋設於黏合 劑樹脂中,光擴散層的表面也更平滑。因此,來自光擴散 ® 層的出射光不會在表面進行極大的不規則反射,正面亮度 降低較少。 此處,光擴散層的厚度是測量離保持光擴散材料的樹脂 黏合劑表面的片狀基體的高度,而不是測量離突出的光擴 散材料頂點的高度。多孔質粒子突出時,多孔質粒子頂點 的高度偏差極大,不一定表示光擴散層膜厚的實際狀態, 相對於此,黏合劑樹脂層的厚度因光擴散層用的塗料塗布 時的均化(level ling)而成爲一定。此厚度的測量使用點接觸 式的膜厚計測量時,係由進行最低1 0點以上的測量,從最 低者取3點的平均値而求出。或者拍攝光擴散層剖面的 SEM相片,測量3點的膜厚,取其平均値,藉此也可求出》 如以上,特別是波形條紋抑制效果的大小與正面亮度的 高度,係在於提高一方則另一方降低的選擇其一(trade — 〇ff)關係。波形條紋抑制效果的大小與光擴散效果的大小, 即混濁(haze)値相關,但通常在經由光擴散薄膜而使非稜鏡 面與導光板的出射面對向的先前結構之背光單元的配置方 -23- 201022711 面,混濁値高的光擴散薄膜起使來自導光板的出射光朝正 面方向偏向的作用,所以例如光擴散薄膜的混濁値與正面 亮度特別是不在於選擇其一的關係,反而在於相關關係。 相對於此,正面亮度與混濁値在於選擇其一的關係在配置 於朝向稜鏡面而配置於導光板之出射面的棱鏡片之出射面 側的本發明之波形條紋抑制薄膜方面是特徵。因此,進行 各種調整而充分抑制波形條紋,並且盡量不使正面亮度降 低,實用上很重要。用於調整此等的參數之中,如上所述, ® 有多孔質粒子的含有量、多孔質粒子的體積平均粒徑(d)與 光擴散層的膜厚(t)之比率(t/ d)等,關於多孔質粒子本身 的選定,選擇空孔容積成爲規定於本發明之範圍內者而使 用很重要。選定多孔質粒子後,在本發明中規定之範圍內 調整此等,而使良好的波形條紋抑制效果與較高的正面亮 度並存是很重要的。 前述光擴散層一面使入射光盡量多的部分有效地擴散, 一面使其朝與入射方向相反側透過很重要。因此,本發明 之光擴散層的部分的混濁値,雖亦取決於應達成的波形條 紋抑制效果、正面亮度,但5 0 %以上較佳,5 5 %以上更佳, 60%以上最佳。再者,全光線透過率85%以上較佳,90% 以上更佳。在本發明方面,光擴散層中的多孔質粒子有效 地使入射光散射,故爲極低損失,可將入射光轉換爲朝與 入射光相反方向的擴散透過光,並可有效地抑制波形條紋 的產生。本發明之波形條紋抑制薄膜含有多孔質粒子,所 以相較於與朝向稜鏡之稜角而配置於導光板之出射面側的 -24- 201022711 稜鏡片成組使用的先前不使用多孔質粒子的光擴散薄膜, 以比所含有更少量的光擴散粒子實現與先前同等以上的波 形條紋抑制效果。因此,若以所達成的同等波形條紋抑制 效果進行比較,則比經常使用先前的光擴散薄膜的情況, 所含有的光擴散粒子量較少,其結果,以產生於光擴散層 表面的凹凸使出射光朝周邊方向偏向較少,可實現較高的 正面亮度。要使用本波形條紋抑制薄膜,一面維持液晶顯 示面的亮度,一面有效地進行波形條紋的抑制,光擴散層 ® 中的多孔質粒子的含有量相對於樹脂黏合劑的固體成分 100質量%,2〜60質量%較佳,5〜40質量%更佳,而8 〜30質量%最佳。若多孔質粒子的含有量爲2質量%以 上,則可有效地利用其優良的光擴散效果。含有量爲60質 量%以下時,因光擴散層中充分含有樹脂黏合劑,故可形 成對透光性基體上具有良好接合性的光擴散層》再者,許 多多孔質粒子存在的結果,光擴散層表面的凹凸變得顯 著,使出射光大幅偏向的機率變高,正面亮度也不會降低。 〇 w 該光擴散層除了前述多孔質粒子之外,按照需要,亦可 含有無機粒子、有機粒子或無機_有機混合材料粒子。例 如可在不阻礙光擴散層各種特性的範圍內使其含有氧化 鈦、氧化鋅等的白色顔料、碳酸鈣、滑石等的塡充物。亦 可使其含有丙烯酸粒子、丙烯酸聚胺基甲酸酯粒子等的有 機粒子。此外,亦可使含有前述粒子之層層積於其他光擴 散層。 該光擴散層中’按照需要,亦可使其含有硬化劑、硬化 -25- 201022711 催化劑、分散劑、增塑劑、帶電防止劑、紫外線吸收劑、 劣化防止劑等,此等於形成光擴散層的塗料製作時調配。 然而,最佳透過光不因可見光區域中有吸收的物質存在而 衰減,最佳前述光擴散層中不含有可見光區域中有吸收的 物質。 形成光擴散層,可藉由使含有上述多孔質粒子等與黏合 劑樹脂、及溶劑的光擴散層用塗料塗布於基體上後乾燥而 進行,但亦可使基體與光擴散層一體化。例如,使用多孔 ® 質粒子分散的黏合劑樹脂,藉由擠出法等通常的片製造方 法,製作基體片且全體成爲光擴散層者,可使波形條紋抑 制薄膜全體的膜厚變薄。然而,多孔質粒子的含有量較多 時,有片本身的力學特性變成脆弱的可能性,要確保強度, 最佳分離波形條紋抑制薄膜的波形條紋抑制功能與支持體 功能,並使用透明基體、透明薄膜作爲光擴散層的支持體。 作爲前述黏合劑樹脂,若爲可將前述多孔質粒子均勻分 散於樹脂中並可成型爲片狀者,或者再添加溶劑而製作塗 料,塗布於透光性基體上,可層積塗膜者,則不特別限定, 可使用一般的成型用樹脂、塗料用樹脂等。例如,可列舉 丙烯酸系樹脂、氯乙烯系樹脂、聚酯系樹脂、聚胺基甲酸 酯系樹脂、苯乙烯系樹脂、聚碳酸酯系樹脂、環烯系樹脂 等。 作爲用於利用塗布而形成光擴散層時的光擴散層用塗料 的溶劑,可考慮黏合劑樹脂的溶解性、多孔質粒子等的分 散性、形成的擴散層的膜厚及塗膜乾燥性等,通常由使用 -26-[Technical Field] The present invention relates to a wavy stripe suppressing film used as a constituent member of a backlight unit such as a liquid crystal display device (LCD). [Prior Art] A liquid crystal display device mounted on a computer, a mobile phone, a digital camera or the like is provided with a backlight unit as a means for illuminating the liquid crystal display surface from the back side. Fig. 1 shows an example of the general structure of a liquid crystal display device. In the case of the backlight unit 2, the light emitted from the light source 3 such as a cold cathode tube (CCFL) or a light-emitting diode (LED) is reflected by the reflection sheet 6 or the like, and is incident on the light guide plate 5 to be self-contained. The light emitted from the upper surface of the light guide plate 5 is condensed in the front direction by the light diffusion film (lower diffusion film) 7. The light emitted from the light-diffusing film (lower-diffusion film) 7 is incident on the surface (not the surface) of the cymbal 8 in which the array of the cymbal 8 is formed, and the self-formed yoke is formed. The surface (the surface of the surface) is ejected, and the light is concentrated in the front direction. As a result, the light emitted from the surface is incident on the lower surface of the liquid crystal module 1 having the liquid crystal display surface ® and is used as illumination from the back side. A light diffusing film (upper diffusing film) 9 is sometimes disposed between the cymbal 8 and the liquid crystal cell 1. Thus, the cymbal sheet 8 has the following effects: the emitted light from the light diffusing film (lower diffusing film) is refracted by the skewed surface formed on the transparent substrate surface to be more biased toward the front direction, thereby improving the liquid crystal display The brightness of the front direction as seen by the observer. At this time, as the direction in which the cymbal sheet 8 is disposed on the optical path, the non-tanning surface may be disposed toward the light-emitting surface of the light guide plate, and the corners of the enamel may be arranged in the opposite direction to the light-emitting surface of the light guide plate. In the case of the backlight unit, since the adjustment of the incident angle of the cymbal is not required, the non-faced surface is often disposed toward the exit surface of the light guide plate. The cymbal is generally formed by successive rows of lines that are equally spaced and parallel to maintain their angularity, and each 稜鏡 unit is generally an isosceles triangle. Therefore, if the division of the liquid crystal cells arranged at equal intervals overlaps, a visible pattern called a corrugated stripe is formed, and when the image is observed, a dark pattern is sometimes observed. The wavy stripe is a pattern that is thicker than the spacing between the pitches of the columns and the pixels of the liquid crystal panel. If such a wavy stripe is generated, a dark line is formed on the background of the liquid crystal display surface. It is the reason for the deterioration of the image quality of the display image. In particular, in the case of a liquid crystal display device requiring high definition display, suppression of wavy stripes is important. As means for making it difficult to generate wavy stripes, a light diffusion film (upper diffusion film) is inserted on the exit side of the cymbal sheet. Insertion of the upper diffusion film and the effect of reducing the wave streaks are not necessarily sufficient, and the brightness of the liquid crystal display surface is lowered. However, it has been conventionally used as an effective measure for reducing the waveform streaks. In order to achieve good light diffusion, the wavy stripes are also removed, and the suppression of the wavy stripes is considered as a secondary effect of the light-diffusing film, and is hardly designed independently. Further, in order to facilitate light diffusion, the film thickness is relatively thick. However, the liquid crystal display device has been intensively required to be thinner, and the backlight unit has been reduced in performance, and the components are reduced, the components, and the overall structure are reduced in thickness. For example, 201022711, in the case of a backlight unit in which an edge of a cymbal is disposed on the exit surface of the light guide plate, the light diffusing film can be disposed between the exit surface of the light guide plate and the cymbal sheet, and the light guide plate can be designed. A combination of the design of the cymbal and a sufficient concentrating effect. In the following description, when a cymbal having a cymbal array is inserted into the optical path, depending on the exit surface of the light guide plate, a difference in the condensing effect of arranging the ridges disposed on the exit surface of the light guide plate or toward the exit surface of the light guide plate. Fig. 2 and Fig. 3 show the arrangement of the respective optical elements of the general backlight unit of the non-faced surface in which the sheet is disposed toward the exit surface of the light guide plate. Fig. 2 is a perspective view showing a cymbal configuration of a general backlight unit, and Fig. 3 is an example of an optical path of a general backlight unit. The light emitted from the upper surface of the light guide plate 15 is concentrated in the front direction by the diffusion effect of the light diffusion film (lower diffusion film) 17, and becomes a non-derivative light after the output angle distribution has diffused light.稜鏡面入入. Then, the ruthenium substrate is refracted by the refractive index difference between the material constituting the 稜鏡 unit and the air through the ruthenium substrate, so that the diffused light of the exit angle distribution is biased toward the front side. Shoot out. It is assumed that the light-free diffusion film (lower diffusion film) 17 is only the refraction of the prism exit surface, and the light emitted from the light guide plate may not be sufficiently bent as shown in FIG. 3 toward the front direction, and the brightness near the light source side is not large. Since the brightness distribution in the front direction of the backlight is sufficiently increased and uniform, it is necessary to temporarily enlarge the angular distribution and to cause the light deflected in the front direction to enter the cymbal sheet, and the light diffusion film (lower diffusion film) 17 is necessary. On the other hand, in the case where the light diffusing film 17 is diffused into a wide angle at the front direction, the light collecting action of the cymbal sheet 18 is sufficiently exerted, and the 201022711 light emitted from the light guide plate is efficiently concentrated toward the front surface of the backlight. The cymbal sheet 18 is arranged such that two lamellae 18 are overlapped and the ruthenium array is substantially orthogonal. Two sheets of a light-diffusing film (lower diffusion film) and two enamel sheets are required, and at least three optical sheets are required. On the other hand, Fig. 4 shows the arrangement of the optical elements of the backlight unit in which the face of the prism is disposed toward the exit surface of the light guide plate. The light emitted from the upper surface of the light guide plate 25 enters the array through the air layer, and enters the inside of the corner from the inclined surface of the unit of the unit in the array 32, and then enters the light of the other slope at an incident angle larger than the critical angle. With this bevel, it is totally reflected, and the large square changes direction and concentrates toward the front of the backlight. Therefore, by designing the alignment of the characteristics of the direction of the light emitted from the light guide plate, the light diffusion film (lower diffusion film) can be used, and only one piece of the film can be used to achieve a high direction toward the front of the backlight. Uniform brightness distribution. Thus, by adopting the cymbal configuration as described above, there is an advantage that the number of parts can be reduced, the thickness of the backlight unit can be reduced, and the productivity can be improved. On the other hand, on the other hand, compared with the case of the conventional backlight unit using the lower diffusion film, it is easier to strongly observe the wavy stripes and to lower the image quality of the 显示 w display surface of the liquid crystal display device. In the past, in order to suppress the wavy stripe, a method of preventing streaks of an upper diffusing film using a further diffusion film on the exit side of the ruthenium of the cymbal is performed (see, for example, Patent Document 1 or Patent Document 2). However, when the above-mentioned diffusion film is applied to the backlight unit on the exit side of the light guide plate on the exit side of the light guide plate, even if the turbidity of the diffusion film is increased, the front surface brightness of the liquid crystal display surface is greatly sacrificed, the waveform stripe cannot be reduced. The possibility of reaching the level of practical use. In the method of Patent Document 1 in which the second diffusion plate having the embossed 201022711 rough surface is disposed between the cymbal sheet and the liquid crystal module, the backlight unit disposed on the exit side of the light guide plate is insufficient. The wave streaks are suppressed, and the thickness of the diffusing plate itself is not thinned, and the thickness of the entire backlight unit is greatly increased by the insertion of the diffusing plate, so that it does not meet the recent demand for thinning. In addition, in the method of Patent Document 2 in which a relatively turbid diffusion film containing a resin particle or the like as a diffusion material is disposed between the ruthenium sheet and the liquid crystal module, a commercially available diffusion film is used as it is, and it is necessary to suppress insufficient waveform streaks. In order to obtain a sufficient diffusion effect, it is necessary to use a diffusion film having a thick film thickness, and the front surface brightness of the liquid crystal display device is easily lowered, so that it is difficult to say that it is suitable for use in a high definition display of the recent film type liquid crystal display device. In the past, various types of backlight units having a configuration in which the ridge surface of the prism lens having the advantage of reducing the number of parts is used toward the exit surface of the light guide plate have been used. However, there is a problem in that the countermeasure against wave streaks is insufficient. For example, the backlight unit of the following structure may have several effects on suppressing the waveform stripe, but it is still insufficient. For example, as a means for obtaining brightness uniformity of the backlight, it is forbidden to use a non-faceted surface of the cymbal as a rough surface (for example, refer to Patent Document 3). In addition, a diffusing surface in which the light emitted from the light guide plate is incident on the surface of the cymbal sheet, and the uneven surface is disposed on the non-tank surface on the exit side or the diffusing particles are contained (see, for example, Patent Document 4). In addition, a light diffusion layer including a light-diffusing material on the exit surface and a light-diffusing layer on the light-emitting surface is provided (for example, Patent Document 5). However, in the case of the cymbal of the patent document 3 which has been subjected to the previous roughening processing only in the non-faceted manner, although the number of parts is reduced, the suppression of the waveform streaks is insufficient. Further, in the structure of Patent Document 4 in which the diffusion plate is inserted as the exit surface side of the non-稜鏡201022711 surface of the cymbal sheet, it is effective to remove the spot image formed on the reflector for the light guide plate, but for removing the wavy stripes Then did not beg. In consideration of the fact that the thickness of the diffusing plate is increased by the removal of the diffusing plate, the brightness of the liquid crystal display surface is likely to be lowered, which may hinder the overall thickness reduction of the liquid crystal display device. In addition, in the case of the cymbal of Patent Document 5 in which the previous light-diffusing layer is applied, the effect of enlarging the viewing angle is obtained, and the number of parts is reduced as in the case of the cymbal of Patent Document 1, but the number of parts is reduced. The effect of the wavy stripes is limited, and even if it can be suppressed, there is a possibility that the brightness of the liquid crystal display surface is lowered. As described above, in the enamel sheets described in Patent Document 3 to Patent Document 5, various light diffusion layers are formed on the exit surface side of the enamel sheets. However, the structure of such light-diffusing layers does not change the structure for roughening the surface, or the previously used light-diffusing material for obtaining the uniform uniform light diffusion, although the prism faces are used toward the light guide plate. The exit surface is more likely to produce a structure of wavy stripes, but it does not specifically invite new beeps to reduce the wavy stripes. In other words, in the enamel film described in the documents of Patent Document 3 to Patent Document 5, although the light collected from the exit surface of the cymbal sheet is again incident on the light diffusion layer, the brightness of the liquid crystal display surface is reduced, but on the other hand, ' It is not always possible to achieve a larger effect for reducing the waveform streaks. Further, the trend of the recent technology for further thinning the entire liquid crystal display device has not been carried out in accordance with the thin film. In short, the light-diffusing layers of such ruthenium sheets do not prevent the generation of wavy stripes as an original purpose, and their effects are limited. On the other hand, a light-diffusing film having a light-diffusing layer containing porous particles as diffusion particles having a higher diffusion efficiency than 201022711 is known (see Patent Document 6 or Patent Document 7). Patent Document 6 describes that the average primary particle diameter is 2. A light-diffusing film of a light-diffusing layer formed of spherical porous cerium oxide of 5 μχη or more and ΙΟμπι or less and a resin binder. Patent Document 7 describes a light-diffusing sheet in which porous transparent fine particles are dispersed in a transparent base material layer. However, these light-diffusing films or light-diffusing sheets have the purpose of improving the light-diffusing function by using porous particles, but the basic functions or forms of use are not different from those of the prior light-diffusing films or sheets. It is not a method of using a light stray stripe suppressing function which is inherent in the light-diffusing layer having a porous particle and which has not been previously obtained, and is not optimized for the purpose of suppressing the waveform fringe. Like other patent documents, these light-diffusing films or light-diffusing sheets have the same purpose of uniform light diffusion, and the effect of preventing the occurrence of wavy stripes is secondary, and the effect is also limited. The wavy stripes are produced between the light that undergoes periodic intensity changes with the optical material. Therefore, it is generally possible to suppress the strong light diffusion effect such that the periodic intensity change disappears. Therefore, by increasing the concentration of the diffusion particles in the light diffusion layer or by inserting the light diffusion film having a sufficiently thick film thickness of the light diffusion layer into the optical path, generation thereof can be suppressed. However, according to the method of improving only the previous light diffusion function, the light deflected toward the front direction by the cymbal sheet is deflected toward the peripheral portion, so that the amount of light in the front direction is insufficient, which easily causes the backlight unit or the liquid crystal display device. The reduction in frontal brightness. Further, there is a tendency that the light-diffusing film itself is thickened, and it is not possible to comply with the recent thinning of the backlight unit or the liquid crystal display device. There are various methods available for the method of performing light diffusion, and it is used in the most suitable method for the situation required for each light diffusion. However, the focus has not been focused on the waveform stripe, and the method has been discussed from the viewpoint of the method, and it is required to more effectively limit the adverse effect of reducing the front luminance to the minimum suppression method of the waveform stripe. [Patent Document 1] JP-A-6-102506 (Patent Document 3) Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. [Patent Document 5] Japanese Laid-Open Patent Publication No. JP-A No. 2004-348000 [Patent Document 7] JP-A-2004-348000 (Problem to be solved by the Invention) An object of the present invention is to provide a wavy stripe suppressing film which has a high effect of suppressing wavy stripes with a thin film thickness and can be maintained when a wavy stripe suppressing film for a backlight unit used in a liquid crystal display device is used. The high brightness of the backlight unit or the liquid crystal display surface contributes to the thinning of the previous backlight unit or the liquid crystal display element, and at the same time achieves high front luminance and effective suppression of waveform streaks. In particular, it is to provide a wavy stripe suppressing film which is applied to a backlight unit having a structure in which a ruthenium surface is disposed on an exit surface side of the light guide plate, and is applied to the exit side of the cymbal sheet to more effectively perform the backlight unit. Thin film and corrugated strips-11-. 201022711 Two sides of the pattern suppression. [Means for Solving the Problem] The inventors of the present invention have found that the porous particle is fine in the case of a wavy stripe suppressing film having a specific porous particle and a light-diffusing layer containing the porous particle as a diffusion particle. The pore volume is in a certain range, and the relationship between the volume average particle diameter of the porous particles and the film thickness of the light diffusion layer, and the content of the porous particles in the light diffusion layer are set to a specific range. Even if the film thickness of the light-diffusing layer is thin, the front side luminance is not greatly reduced, and the wavy stripe suppressing film of the wavy stripe can be effectively prevented, and the present invention is completed. In other words, the present invention provides a wavy stripe suppressing film which is disposed on the exit surface side of the ruthenium which is disposed on the exit surface of the light guide plate of the backlight unit toward the ruthenium surface, and is permeable to light. The surface of one side of the substrate has a light diffusion layer containing a resin binder and a porous particle, and the pore volume of the porous particle is 1. 00~2. 00 ml/g, ❹ The content of the porous particles is 30 parts by mass or less based on 100 parts by mass of the solid content of the resin binder. Furthermore, the present invention provides a prism sheet having a wave stripe suppressing function, which is characterized in that a light-transmitting substrate sandwiching the light-diffusing layer is formed, and prism shapes having mutually parallel edges on opposite sides are formed. . Furthermore, the present invention provides a backlight unit characterized by comprising the aforementioned wavy stripe suppressing film or a ruthenium sheet having a wavy stripe suppressing function. -12-201022711 Further, the present invention provides a backlight unit having a light source having at least one end surface side of a arranging plate and a light guide plate, and a cymbal having a side surface disposed on the side of the outgoing surface on the side of the outgoing surface The exit surface side of the prism sheet has the aforementioned wave stripe suppression film. Furthermore, the present invention provides a backlight unit having a light source having at least one end surface side of a layout plate and a light guide plate, and a front waveform having a side surface disposed on an exit surface side of the light guide plate on the light guide surface side. Bracts of the stripe suppression function. Furthermore, the present invention provides a liquid crystal display device comprising the wavy stripe suppressing film or the backlight unit with the wavy stripe suppressing function sheet. The light-diffusion layer of the wavy stripe suppressing film of the present invention contains a plurality of fine pores in the light-diffusing layer, and the pores contain a binder resin and light that enters the light-diffusing layer passes through the pores and holds the fine particles. And the most common reflection and refraction between the adhesive resin and the air in the pores. As a result, compared with the usual resin particles, the porous diffusion particles and the light diffusion layer having a relatively small film thickness are also diffused. Therefore, the incident light of the wavy stripe suppression film can be scattered to suppress the generation of the wavy stripes, and the transmission loss of the cymbal can be reduced, and the total light transmittance can be maintained at a high 値, so that the front luminance of the liquid crystal display surface can be high. The reason for suppressing the occurrence of the above-described effects of the waveform streaks is not necessarily clear, but basically these particles have a finer number of protrusions on the surface of the porous particles than the particle diameter, and these are generally ridge line pitches or liquid crystal elements. The pixel is attached to the light guide plate, and the porous air having the front side is attached to the light guide plate, and the adhesion of the hole is relatively small, and the illuminance is maintained in a good condition. The concave spacing of the porous grade is more small -13- 201022711. Therefore, it is considered that the reflection or refraction of the fine structure through the surface of such a porous particle can more effectively disturb the light path of the light passing through the regular structure of the crucible or the liquid crystal pixel or the like, even if it is a small porous particle. The amount of addition is such that the amount of addition of the wave streaks can be effectively suppressed with a very small addition amount as compared with the light-diffusing particles which do not have such fine unevenness on the surface. In the case of the resin particles used in the usual light-diffusing layer, since the difference in refractive index between the resin particles and the binder resin is small, the light diffusion which is largely deflected by the incident light is applied to the surface of the light-diffusing layer mainly composed of resin particles. The concave ® convex is carried out. However, in the case where porous particles are used as the diffusion particles, as described above, light diffusion in the interface of the porous particles containing the binder and air or in the porous particles containing air contributes to the suppression of the wavy stripes. Further, the wavy stripe suppressing film of the present invention has a streak suppressing film containing a light-diffusing layer of a resin binder and porous particles on one side of the light-transmitting substrate, and the pore volume of the porous particles is 1. 00~ 2. 0 0 m 1 / g 〇 Applicants have found that by using porous particles as diffusion particles in the light diffusion layer, the suppression of the waveform fringes can be effectively performed, but it is found that the pore volume of the porous particles used is further For a specific range, it is possible to suppress the waveform fringes more effectively with a thin film thickness of the light diffusion layer without lowering the front luminance. That is, the pore volume of the porous particles of the light-diffusing layer of the present invention is 1. 00 ~ 2. 00ml / g. The pore volume of the film is suppressed by the wavy stripe of the present invention to be 1. Above 00 ml/g, the incident light is not only on the surface of the diffusion particle, but also has a high probability of being irregularly diffused at the interface with the pores in the particle to be extremely high -14 - 201022711. Therefore, even if the content of the porous particles in the light diffusion layer is kept low, an equivalent wave streak suppressing effect can be obtained. By setting the pore volume as described above, the content of the porous particles can be kept low, so that the pot life due to the coating of the porous particles is prevented from being lowered, or because of such The resin component of the coating film formed by the coating material is relatively reduced, and the bonding strength to the substrate is lowered. On the other hand, as the pore volume of the porous particles becomes larger than 2, the front surface brightness is liable to lower. This is considered to be because if the pore volume becomes large, v forms a large number of pores which are extremely complicated and staggered in the particles. Therefore, when this is added as a diffusion particle to the light diffusion layer, a binder cannot be formed. Many of the pores of the resin have a large angle of refraction at the interface of the pores, and the amount of light toward the front direction is relatively reduced. For the same reason, the pore volume is 1. 8 is preferably as follows. 6 or less is better. Further, although it is not necessarily clear, it is considered that total reflection is likely to occur at the interface of the pores which are not filled with the binder resin, so that it is difficult to emit incident light. Further, when the pore volume is increased, the amount of the binder resin for filling the pore volume is also increased, so that the total amount of the binder resin in the porous particles is also increased. Therefore, the porous particles will have a property similar to that of the binder resin, and it is considered that the agglomeration of the porous particles with each other is easily caused. Therefore, the coating for forming a light-diffusing layer tends to be sticky, and tends to be easily gelatinized. For the above reasons, when a light-diffusing layer is formed using a coating material for a light-diffusing layer containing a porous particle having a pore volume in the above range, the front luminance is not greatly lowered, and a thin light diffusion layer can be effectively used. Suppresses waveform streaks. Furthermore, -15-201022711 will not produce tack or gelation of the coating itself. In addition, the amount of the wavy stripe-reducing film-based porous particles of the present invention is in the range of 30 or less based on 100 parts by mass of the solid content of the resin binder. In the present invention, it is found that the amount of the porous particles in the light-diffusing layer is 30 parts by mass or less based on 100 parts by mass of the solid of the resin binder, and is not on the surface of the light-diffusing layer. If the optical path of the emitted light does not greatly deviate from the front direction, the ratio of the adhesive component in the light diffusion layer does not decrease, so the contact does not decrease. That is, the wavy stripe suppressing film of the present invention has a porous plasmid light-diffusing layer, so that light diffusion efficiency is high. Therefore, even if it is a thinner and less added amount, the incident light is effectively scattered, and the suppression of the waveform strip exhibits a high function. Further, the pore volume of the porous particles is 〜2. 0 0ml / g. Therefore, even if the amount of the porous particles in the light-diffusing layer is suppressed to be low, an equivalent wave streak suppressing effect can be obtained. Further, the content of the porous particles in the light-diffusing layer is a solid content of the resin binder. When 100 parts by mass or less is 30 parts by mass or less, a large unevenness is not formed on the surface of the light-diffusing layer, and the irregular reflection is made lower, and the joint strength is not lowered. [Effects of the Invention] The wavy stripe suppressing film of the present invention has a light-diffusing layer containing porous particles on one side of the light-transmitting substrate, and the pores of the porous particles are 1. 00~2. In the range of 00 ml/g, it can be produced in a small amount of content containing components. Reinforce the film thickness of the hadron 1. 含 含 〇 所以 所以 - - - -16 - 201022711 Effective light diffusion, and the amount of light emitted in the front direction can be ensured, and the front side brightness can be greatly reduced, and the waveform stripe can be effectively suppressed. In addition, the content of the porous particles is 30 parts by mass or less based on 100 parts by mass of the solid content of the resin binder, so that large unevenness does not occur on the surface of the light diffusion layer, and the light path of the emitted light does not largely leave the front surface. Since the direction is lowered, the front side luminance can be reduced, and the waveform fringes can be more effectively suppressed by the thin film thickness of the light diffusion layer. The wavy stripe suppressing film of the present invention has a light source disposed on at least one end surface side of the light guide plate and the light guide plate, and an edge disposed on the exit side of the light guide plate at an exit surface side of the light guide plate In the structure of the backlight unit which is easily generated by the wavy stripe of the cymbal, as shown in FIG. 5, when disposed on the exit surface side of the cymbal, the front surface luminance of the backlight unit is not greatly reduced, and the waveform is extremely effectively suppressed. stripe. Further, since the thickness of the film itself is thin, it does not hinder the thinning of the entire backlight unit which is a feature of the backlight unit. The bismuth sheet having the light diffusing function of the present invention has a 稜鏡 shape having parallel ribs interposed therebetween, so that the enamel surface is disposed toward the exit side of the light guide plate. The light incident from the pupil surface is effectively scattered by the light diffusion layer on the opposite side, and the amount of light toward the front direction is not greatly reduced, and the waveform fringes generated between the pupil surface and the liquid crystal cell can be effectively prevented. Further, not only the function of integrating the ruthenium sheet and the wavy stripe suppressing film but also the effect of reducing the number of parts of the entire backlight unit is achieved. Furthermore, the use of these wavy stripe suppression films or with wavy stripe suppression -17- . The backlight unit of the function of the 201022711 can provide a light source that maintains a high front luminance, which can suppress the reduction and can effectively suppress the waveform stripe. At the same time, by using these, the film thickness of the entire unit can be suppressed to be thin. Further, a liquid crystal display device having such a backlight unit on the back surface of the liquid crystal display surface can provide a liquid crystal display device which maintains a front luminance of the display surface and prevents wavy stripes from being formed on the display surface. Further, as described above, since the thickness of the entire backlight unit can be suppressed to be small, it is also possible to contribute to the reduction in thickness of the liquid crystal display device itself. [Embodiment] [Best Mode for Carrying Out the Invention] Hereinafter, various wavy stripe suppressing films including the best mode and a ruthenium sheet with a wavy stripe suppressing function, a backlight unit, and a liquid crystal display device for carrying out the present invention are used. Each part is explained. First, the light diffusion layer of the wavy stripe suppressing film of the present invention contains porous particles as a light diffusing material, and the pore volume of the porous particles is 1. 00~2. In the range of 00 ml/g, even if the film thickness of the light-diffusing layer is thin, 〇 does not greatly reduce the front luminance, and the wavy streaks can be effectively suppressed. If the pore volume of the porous particles is less than l. In order to effectively suppress the waveform streaks, ooml/g must increase the concentration of the diffusion particles in the light diffusion layer. In this case, there is a problem that the bonding strength between the diffusion layer and the substrate is lowered, or the pot life of the coating is lowered. On the other hand, if the pore volume of the porous particles is larger than 2. At 00 ml/g, the total amount of the binder resin in the pores of the porous particles in the coating material increases, and aggregation between the porous particles tends to occur, resulting in a problem that the pot life is lowered. Further, the pores of the porous particles -18-201022711 have a large volume, and more pore portions in the porous particles are not filled by the binder resin, and remain as pores. Therefore, the incident light is refracted between the pore walls and the pores having a large difference in refractive index, and is more likely to be emitted away from the front surface, so that the front luminance may be lowered. Further, the light which is incident on the hole portion which is not filled with the binder resin is easily totally reflected by the hole wall, so that it is easy to reduce the emitted light, which may be one of the causes. As described above, the wavy stripe having a large pore volume suppresses the light diffusing ability of the film to be high, so that the front luminance is liable to be lowered for various reasons, but the scattered light of the incident light tends to increase, so that the viewing angle can be effectively suppressed. The advantages of wavy stripes in large directions. Therefore, when a light diffusing film is used as a general light diffusing film, a light diffusing film having a smaller content of porous particles and a thinner film thickness of the light diffusing layer can be used to obtain an equivalent light diffusing effect. Further, the pore volume of the porous particles can be measured by a mercury intrusion method (porosity method), and can be obtained by measuring a pore distribution by a mercury porosimeter (for example, the automatic pore size IV95 series of Shimadzu Corporation). The porous V particles used in the light-diffusing layer of the wavy stripe suppressing film of the present invention are preferably amorphous porous particles having a polygonal shape having irregular angles and side lengths in order to more effectively disturb the passage. The optical path of the light arranged in the array or liquid crystal pixels. Since the spherical shape has a lower light diffusing function than the amorphous one, it is preferable to suppress the wavy streaks so as to contain more particles, and the front luminance tends to be lowered. Further, the spherical porous particles tend to form hemispherical irregularities on the surface of the light-diffusing layer, and these irregularities tend to scatter light rays which are deflected in the front direction toward the peripheral direction. In the arrangement of the second and third figures in which the light diffusing film is disposed on the exit surface of the light guide plate from the non-faced side of the 稜鏡-19-201022711, the light diffusing film and the cymbal are used for incidence. Since the light having a large angle is deflected toward the front direction, the large deflection of the light using the light-diffusing film increases the front luminance. However, in the arrangement of the fourth and fifth figures in which the pupil surface of the cymbal sheet faces the exit of the light guide plate, the light emitted from the light guide plate is deflected toward the front direction by the cymbal sheet, so that the cymbal sheet is deflected. After the exit, if an optical element having a strong deflecting effect exists, the light is deflected toward the peripheral direction, and the front luminance is easily lowered. As the structure of the porous particles, it is preferred that the primary particles agglomerate to form amorphous aggregated particles having a volume average particle diameter of 1 to ΙΟμηη. Volume average particle size 2 ~ 8 μ m is better, 2. 5 to 6 μ m is optimal. In particular, when the thickness is less than 3 · 5 μ m, the volume average particle diameter is small, and it is difficult to form irregularities on the surface of the light diffusion layer due to the porous particles. Regarding the reduction in frontal brightness, further, if the volume average particle diameter is 2 to 3.  The range of 1 μηι can be suppressed to a minimum. Further, as the primary particles, a particle diameter of 10 to l 〇〇 nm is preferred. If it has the range of the pore volume specified in the present invention, even a spherical porous particle can be used, and the spherical one is indefinite. In the shape, the light diffusion function is low, so that the wave streaks are well suppressed, so that it can contain more particles, and the front brightness is easily lowered. In addition, in order to more effectively generate irregular reflection and refraction, the particle size distribution is larger. Organic fine particles and inorganic fine particles can be used. Among them, inorganic materials such as porous ceria, porous alumina, porous titanium oxide, and porous glass can easily obtain a refractive index difference from the binder resin and easily increase the particle surface. The reflectance is preferred so that it is effective to obtain diffusely reflected light. Further, it is also preferable in that it is easy to increase the surface hardness of the light diffusion -20-201022711. Among them, particles of porous cerium oxide are particularly preferred. Further, in order to measure the particle diameter of the porous particles, a laser diffraction type particle size distribution measuring device such as a laser diffraction type particle size distribution measuring device SALD_200 (manufactured by Shimadzu Corporation) can be used. In the light-diffusing layer of the wavy stripe suppressing film of the present invention, since the diffusion efficiency of the porous particles is good, the film thickness can be made thinner than before, and the wavy stripe suppressing film can be made thin. To suppress the wave streaks and ensure a high front brightness, and to achieve thinning of the light diffusion layer, the light diffusion layer thickness can be 8 μm or less, and a light diffusion layer having a film thickness thinner than the previous one can be realized, and the wave stripe suppression film can be used. Greatly thinned. When the film thickness is 6 μm or less, it is more preferable at the point of film formation. However, when the film thickness is less than 2 μm, the efficiency of light diffusion is likely to be lowered even if the particle diameter or the content of the diffusion particles is adjusted. Therefore, in consideration of the film formation, the film thickness in the range of 2 to 6 μm is also preferable. In the region where the thickness of the diffusion layer is extremely thin, the porous particles protrude from the surface of the resin binder of the light-diffusing layer, and the diffused light is easily deflected by a large φ in the front direction. Therefore, it is necessary to suppress the waveform streaks more effectively, while maintaining the front luminance at a high level, and suppressing the film thickness of the entire stripe suppression film, and suppressing the diffusion layer thickness to the volume average particle diameter of the porous particles. 3 ~ 2. A 1x range is preferred. t/d is less than 1. At 3 o'clock, the porous particles easily protrude from the surface of the resin binder of the light-diffusing layer. Therefore, extremely thick irregularities are formed on the surface of the light-diffusing layer, and the light emitted from the light-diffusing layer is easily deflected from the front direction toward a direction having a large angle. Further, the surface of the fine concavities and convexities rich in the porous particles appears on the outermost layer, so that the regular reflection at the time of emission is not significant, and the tendency of the front luminance is lowered. The larger the volume average particle size of the porous particles, the more significant the volume is less than 3. In the case of 5 μm, the unevenness formed on the surface of the light-diffusing layer becomes relatively remarkable when it exceeds 6 μm. Therefore, in order to more effectively form streaks and maintain a high degree of frontal brightness, it is preferable that each of the porous layers is buried in the binder resin of the light diffusion layer. t/d is greater than 1. At 3 o'clock, the light-diffusing particles are sufficiently embedded in the binder resin. If there is a resin layer of sufficient thickness to bury the porous, the porous particles are less diffused from the light. The surface of the concavities and convexities rich in porous particles is directly exposed to the space, and the surface of many porous particles is in contact with the binder resin below the surface of the lipid layer. Therefore, the emitted light from the light-diffusing layer is subjected to extremely large irregular reflection, and the front luminance is less reduced. In addition, if t/d exceeds 2. 1. The film thickness of the light-diffusing layer is too thick, and the present invention conforms to the invention of the present invention. The diffusing particles having different particle diameters are likely to overlap each other, and the unevenness is likely to occur again on the surface of the light-diffusing layer. When the light diffusion thickness is thicker, the brightness of the porous particle surface is sufficiently buried in the binder resin, but the film thickness of the light diffusion layer is increased, and the film thickness of the wave stripe suppression film is further reduced. The tendency of the invention of the present invention is also that the larger the volume average particle diameter of the porous particles, the more the volume average particle diameter is less than 3. 5μιη, more preferably 2~3. The reduction in frontal brightness caused by the unevenness formed by 1μιη is small, and is not a problem, but exceeds 3. When 5μιη, t/d is 2. 1 is preferred below. When the specific average particle diameter exceeds 6 μm, the unevenness formed is more remarkable. Therefore, when the average particle diameter is small, the particles are suppressed, and the particles of the plasmid can be protruded from the gas, and the particles are less likely to be in the surface. The film of the thick layer is not added. With. For the time being, the big question is that the volume t/d is -22-201022711 2 · 1 or less. The ratio t/d of the volume average particle diameter (d) of the porous particles to the film thickness (t) of the light diffusion layer is 1. 3~2. In the range of 1, there is a resin layer of sufficient thickness to bury the porous particles, so that the porous particles protrude less from the light-diffusing layer and there is no thickness in which only a plurality of particles overlap each other in the light-diffusing layer, and the probability is small. Therefore, the surface of the uneven surface rich in the porous particles is directly exposed to the air, and the surface of many porous particles is buried in the binder resin, and the surface of the light diffusion layer is also smoother. Therefore, the emitted light from the light diffusing layer does not undergo extremely irregular reflection on the surface, and the front luminance is less reduced. Here, the thickness of the light-diffusing layer is measured by the height of the sheet-like substrate from the surface of the resin binder holding the light-diffusing material, instead of measuring the height from the apex of the protruding light-diffusing material. When the porous particles are protruded, the height deviation of the apex of the porous particles is extremely large, and does not necessarily indicate the actual state of the film thickness of the light-diffusing layer. On the other hand, the thickness of the adhesive resin layer is uniformized by the coating of the light-diffusing layer. Level ling) becomes certain. When the thickness is measured by a point contact type film thickness meter, the measurement is performed at a minimum of 10 points or more, and the average value of 3 points is obtained from the lowest one. Or, taking a SEM photograph of a cross section of the light-diffusing layer, measuring the film thickness at three points, and taking the average 値, it is also possible to obtain the above, and in particular, the height of the streak-reducing effect and the height of the front-side luminance are increased. Then the other party reduces the choice of one (trade - 〇 ff) relationship. The size of the wave streak suppressing effect is related to the magnitude of the light diffusing effect, that is, haze ,, but generally, the arrangement of the backlight unit of the prior structure in which the non-faceted surface and the light guide plate are exposed through the light diffusing film -23- 201022711 The surface of the light diffusing film with high turbidity acts to deflect the outgoing light from the light guide plate toward the front direction. Therefore, for example, the turbidity and front brightness of the light diffusing film are not particularly related to the selection of one, but instead It lies in the relationship. On the other hand, the front luminance and the turbidity are characterized in that the relationship between the front luminance and the turbidity is selected in the wavy strip suppressing film of the present invention disposed on the exit surface side of the prism sheet disposed on the exit surface of the light guide plate toward the pupil surface. Therefore, various adjustments are made to sufficiently suppress the waveform streaks, and it is practically important not to reduce the front luminance as much as possible. Among the parameters for adjusting these, as described above, ® has a ratio of the content of the porous particles, the volume average particle diameter (d) of the porous particles, and the film thickness (t) of the light diffusion layer (t/d) In the selection of the porous particles themselves, it is important to select a pore volume to be used within the scope of the present invention. After the selection of the porous particles, it is important to adjust them within the range specified in the present invention, so that a good streak suppressing effect coexists with a high frontal brightness. It is important that the light-diffusing layer diffuses the portion of the incident light as much as possible while transmitting it toward the side opposite to the incident direction. Therefore, the turbidity of the portion of the light-diffusing layer of the present invention depends on the waveform stabilizing effect and the front luminance to be achieved, but 50% or more is preferable, more than 55% or more, and more preferably 60% or more. Further, the total light transmittance is preferably 85% or more, more preferably 90% or more. In the aspect of the invention, the porous particles in the light-diffusing layer effectively scatter the incident light, so that the incident light is converted into diffused transmitted light in the opposite direction to the incident light, and the waveform fringe can be effectively suppressed. The production. Since the wavy stripe suppressing film of the present invention contains porous particles, the light which has not been used for the porous particles is used in groups compared to the -24-201022711 ruthenium which is disposed on the exit surface side of the light guide plate toward the edge of the ruthenium. The diffusing film achieves a wave streak suppressing effect equal to or higher than that of the prior art by a smaller amount of light diffusing particles. Therefore, when the comparison is made with the equivalent wave streak suppressing effect achieved, the amount of the light-diffusing particles contained in the case where the conventional light-diffusing film is often used is small, and as a result, the unevenness generated on the surface of the light-diffusing layer is caused. The emitted light is less biased toward the peripheral direction, and a higher front luminance can be achieved. When the wavy stripe suppression film is used, the wavy stripes are effectively suppressed while maintaining the brightness of the liquid crystal display surface, and the content of the porous particles in the light diffusion layer® is 100% by mass relative to the solid content of the resin binder. It is preferably 60% by mass, more preferably 5 to 40% by mass, and most preferably 8 to 30% by mass. When the content of the porous particles is 2% by mass or more, the excellent light diffusing effect can be effectively utilized. When the content is 60% by mass or less, since the resin binder is sufficiently contained in the light-diffusing layer, a light-diffusing layer having good adhesion to the light-transmitting substrate can be formed. Further, many porous particles are present as a result of light. The unevenness on the surface of the diffusion layer is remarkable, the probability that the emitted light is largely deflected is increased, and the front luminance is not lowered. In addition to the porous particles described above, the light-diffusing layer may contain inorganic particles, organic particles or inorganic-organic mixed material particles as needed. For example, a white pigment such as titanium oxide or zinc oxide, or a filler such as calcium carbonate or talc may be contained in a range that does not inhibit various characteristics of the light-diffusing layer. It may also contain organic particles such as acrylic particles or acrylic urethane particles. Further, a layer containing the particles may be laminated on the other light-diffusing layer. In the light diffusion layer, if necessary, it may contain a hardener, a hardening agent, a dispersant, a plasticizer, a charge inhibitor, an ultraviolet absorber, a deterioration preventive agent, etc., which is equivalent to forming a light diffusion layer. The paint is prepared during the production. However, the optimum transmitted light is not attenuated by the presence of an absorbed substance in the visible light region, and it is preferable that the light diffusing layer does not contain an absorbed substance in the visible light region. The light-diffusing layer can be formed by applying a coating material for a light-diffusing layer containing the porous resin or the like to a binder resin and a solvent onto a substrate, followed by drying, but the substrate and the light-diffusing layer can be integrated. For example, by using a porous resin-dispersed binder resin, a base sheet can be produced by a usual sheet production method such as an extrusion method, and the entire film can be made into a light-diffusion layer, and the thickness of the entire wavy stripe film can be reduced. However, when the content of the porous particles is large, the mechanical properties of the sheet itself become fragile. To ensure the strength, the waveform stripe suppression function and the support function of the stripe suppression film are optimally separated, and a transparent substrate is used. The transparent film serves as a support for the light diffusion layer. The binder resin may be obtained by uniformly dispersing the porous particles in a resin and forming the sheet, or adding a solvent to prepare a coating material, and applying the coating to a light-transmitting substrate to laminate the coating film. It is not particularly limited, and a general molding resin, a coating resin, or the like can be used. For example, an acrylic resin, a vinyl chloride resin, a polyester resin, a polyurethane resin, a styrene resin, a polycarbonate resin, a cycloolefin resin, or the like can be given. The solvent of the coating material for a light-diffusion layer when the light-diffusion layer is formed by coating can be considered in terms of solubility of a binder resin, dispersibility of porous particles, and the like, thickness of a diffusion layer formed, drying property of a coating film, etc. , usually by using -26-

201022711 於塗料的眾所周知的溶劑中適當選擇而使用。 作爲用作本發明之波形條紋抑制薄膜的支持 基體,若爲作爲支持體而具有充分的物理強 者,則不特別限定,但爲透明性基體較佳。由 或機械強度來說,可選自聚對苯二甲酸乙二! 膜、聚萘二甲酸乙二醇酯(PEN)薄膜、丙烯酸薄 薄膜、聚碳酸酯、環烯、丙烯酸等透明或半透 薄膜。其中尤以PET薄膜或PEN薄膜,由其機 說特別佳。基體的厚度爲5〜250μιη較佳,10〜 圍更佳。比5μιη更薄時,不僅處理困難,而且 於熱收縮的捲曲,使作業性顯著降低等,有降 傾向。比250μιη更厚時,波形條紋抑制薄膜的 不能使用於薄型的電子裝置等,並且基體本身 過率容易降低,背光單元的正面亮度有降低的 是使波形條紋抑制薄膜的全厚變薄而以背光 化,特別是以行動電話用的液晶顯示裝置的薄 時,設爲7〜50μιη較佳。 在基體表面中至少一方之面上,爲了使與为 合性提高,最隹塗布有易接合處理層,或 (corona)處理等進行易接合處理。 作爲製造本發明之波形條紋抑制薄膜的方沒 明片狀基材一方之面上塗布光擴散層用塗料, 光擴散層。光擴散層用塗料係藉由混合多孔f 黏合劑、溶劑、帶電防止劑、其他按照需要ϊϊϊ 體的透光性 度與透光性 表面平滑性 淳酯(PET)薄 〖膜、聚丙烯 明樹脂片或 械強度面來 1 0 0 μηι的範 會產生起因 低加工性的 i全厚變厚而 的可見光透 傾向。特別 單元的薄型 :型化爲目的 :擴散層的密 者施有電暈 丨,例如在透 而使其形成 [粒子、樹脂 ί調配的添加 -27- 201022711 劑進行調製。 塗布的方法,可利用一般的塗布方式。例如,可利用刀 片、刮刀、流延、浸漬、滲透機、絲網、自旋、逆輥、噴 氣、凹輥、噴霧、簾流、擠出、噴泉、輥舐、懸桿、壓擠、 正滾筒、輥刮塗布等各種塗布方式。 塗膜的乾燥,可利用一般的乾燥方式,例如可利用熱風' 紅外線、微波、電感應加熱、紫外線硬化、電子輻射硬化 等乾燥方式。乾燥後,按照需要,以預定的溫度及時間進 ®行熱硬化》 如此所製造的波形條紋抑制薄膜全厚爲20〜3 00 μιη,但 爲20〜ΙΟΟμηι在可使背光單元薄型化之點上較佳。特別是 用於薄型化要求強烈的行動電話用的液晶顯示裝置的背光 單元時’可以全厚爲小於1 ΟΟμιη,更佳爲20〜70μιη,故可 對顯示部進而行動電話的薄型化大幅作出貢獻爲較佳。 如以上製作的波形條紋抑制薄膜,除了配置於朝向稜鏡 面而配置於導光板之出射面的稜鏡片之出射面側之外,可 作爲使用有稜鏡片的背光單元之波形條紋抑制薄膜,配合 各背光單元的結構,插入從導光板之出射面到液晶顯示面 之入射面的任意的效果最提高的位置而使用,結構零件的 件數較少,可使背光單元全體的厚度變薄,並且用於容易 產生波形條紋的以下結構的背光單元,可最有效地發揮其 性能爲較佳。 即,以將本發明之波形條紋抑制薄膜配置、固定於具有 配置於導光板與導光板之至少一側端面側的光源、及朝向 -28- 201022711 導光板之出射側而配置稜鏡之稜角於導光板之一側出射面 側的稜鏡片之背光單元的稜鏡片之出射面側的方式使用較 佳。 再者,藉由將如此製作的背光單元之出射面以習知的方 法配置、固定於液晶顯示面的背面側,可製作本案發明的 液晶顯示裝置。 關於插入波形條紋抑制薄膜的方向,特別是哪一側都沒 有問題,但以透光性基體爲入射側,以光擴散層爲出射側 〇 者,有將各種功能給與入射側之面的可能性爲較佳。 在與夾著透光性基體的光擴散層相反之面,按照配置波 形條紋抑制薄膜的背光單元中的位置,設置用於實現黏附 (sticking)防止功能、帶電防止功能、受傷防止功能等必要 的各種功能的各種功能層亦可。此外,亦可用於進一步形 成具有光擴散功能的另外之層,再增強光擴散效果,增加 全體的混濁値。例如,在與導光板之出射側相反側之面, 通常形成用於將光封閉在導光板中的反射層,以來自導光 w 板的出射光朝向遠離光源的方向成爲一樣的方式,形成朝 向遠離光源的方向使反射率全體增加之類的連續或非連續 的反射圖案,但此種圖案爲了不給與背光單元的亮度非連 續性,而產生再使混濁値增加的必要時,可以此部分的光 擴散層進行調整,以代替使用新的光擴散薄膜。 夾著光擴散層的透光性基體,在相反側亦可形成稜鏡列 而作爲附有波形條紋抑制功能之稜鏡片。 本發明之附有波形條紋抑制功能之稜鏡片,係形成夾著 -29- 201022711 本發明之波形條紋抑制薄膜的前述光擴散層的該透光性基 體,而在相反側具有互相平行之稜角的稜鏡形狀。 作爲附有波形條紋抑制功能之稜鏡片的結構,可以是以 透明基板或透明薄膜爲基體,而在其兩面個別形成稜鏡列 與光擴散層的3層結構者,也可以是具有使具有稜鏡列之 層或光擴散層的任一層與透光性基體一體化的結構者。 即,也可以是具有稜鏡列之層或光擴散層本身擔負爲支持 體的透光性基體的角色,在其上面層積形成另一方之層的 ^ 2層結構者。或者也可以是直接層疊具有稜鏡列之層與光 擴散層者。然而,使用獨立的透明基板或透明薄膜等透光 性基體者可通過塗布步驟而形成稜鏡列及光擴散層,並且 各層的組成、形狀等也容易獨立控制所以較佳。 即,作爲本發明之附有波形條紋抑制功能之棱鏡片更佳 的形態,包含具有透光性基體、形成於透光性基體上一方 之面的光擴散層、及夾著前述光擴散層的該透光性基體而 形成於相反側的稜鏡層之結構。 胃 具有本發明之附有波形條紋抑制功能之稜鏡片的稜鏡列 之層,最佳具有排列有具有頂角的剖面形狀爲三角形的稜 鏡,並具有平行且等間隔形成之稜角的稜鏡列。稜鏡列的 表面,最佳爲剖面同形的等腰三角形的直線狀的單位稜鏡 平行無間隙地排列的形狀,稜鏡列的剖面等腰三角形的頂 角爲50°〜80°較佳,爲60°〜70°更佳。藉由以剖面爲同形 的等腰三角形,稜鏡列的製造容易,並可使稜鏡片變薄, 且使稜鏡功能確實發揮。藉由以稜鏡的頂角爲5 0°以上、80° -30- 201022711 以下的範圍,朝向導光板之出射面側配置有本發明之稜鏡 片的稜鏡列之稜角時,利用稜鏡列斜面的全反射現象,可 獲得朝LCD正面方向的較高的聚光性。此外,鄰接的稜鏡 列的間隔,可考慮稜鏡列部分的厚度的薄膜化程度、稜鏡 列的製造容易度、波形條紋的容易產生度等而適當決定, 爲5〜ΙΟΟμιη較佳,10〜50μιη更佳。棱鏡列的高度也會影 響到棱鏡列的間隔,但使稜鏡片的全厚變薄而以背光單元 的薄型化,特別是行動電話用的液晶顯示裝置的薄型化爲 目的時,設爲7〜50μιη較佳。 本發明之附有波形條紋抑制功能之稜鏡片的稜鏡列之形 成,可與支持體一體化而形成,亦可另外層積於支持體上 而形成。關於此等,可使用眾所周知的形成方法。茲就此 等稜鏡片的製造方法之一例,說明於下。 例如,如特開平11-17 1941號公報中所揭示,可用將連 續基體以擠壓輥推壓到模輥上,對所推壓的基體與模輥的 接觸開始部分供給液狀的紫外線硬化型樹脂,照射紫外線 而固定形狀,從模輥上剝離的方法。 或者,如特開2002-258410號公報中所揭示,可用使液 狀的紫外線硬化樹脂附著於模輥上,其後使其與連續基體 接觸’照射紫外線而固定形狀,從模輥上剝離的方法。 或者’可用在透明基體上利用眾所周知的塗布方式,塗 布紫外線硬化樹脂,使紫外線硬化樹脂面在未硬化狀態下 接觸於模輥後推壓,照射紫外線而固定形狀,從模輥上剝 離的方法。 -31- 201022711 例如’按照上述形成方法,作爲用於本發明之附有波形 條紋抑制功能之稜鏡片的稜鏡列之材料,若爲透明,具有 初期流動性,利用紫外線等的光硬化而固體化的材料,或 者以加熱軟化而成爲流動性,以冷卻再固體化的材料,則 可不特別限制地使用。例如,可使用紫外線硬化性樹脂組 成物、熱塑性樹脂等。 作爲紫外線硬化性樹脂組成物,可使用以不飽和聚酯 系、丙烯酸系、乙烯基醚系、馬來醯亞胺系、環氧樹脂系 等各種紫外線硬化型低聚物單體爲主要成分,按照需要, 調配反應性稀釋劑、聚合引發劑、聚合促進劑、有機溶劑 等混合而成者。 作爲熱塑性樹脂,可使用聚乙烯、聚丙烯、聚苯乙烯、 丙烯酸、聚酯、聚碳酸酯等,利用加熱而成爲流動性的通 用熱塑性樹脂。 其中尤以使用紫外線硬化性樹脂組成物較佳。其理由是 將熱塑性樹脂加熱到比基體的玻璃化轉變溫度更高溫時, 會引起熱所造成的基體變形,有產生缺陷的可能性,並且 使用紫外線硬化性樹脂組成物,相較於使用熱塑性樹脂的 情況,在各段可縮短加熱、冷卻時間,故生產效率上有利。 作爲製造本發明之棱鏡片的方法,例如可在透光性基體 一方之面上形成具有波形條紋抑制功能的光擴散層後,在 另一方之面上形成上述稜鏡面。此外,例如可以上述方法 形成一方之面上有上述稜鏡列的片後,在與該片之稜鏡面 相反側形成光擴散層而進行。具有稜鏡列的片可以是形成 •32- 201022711 於基體上者,也可以是與基體一體化而形成者’例如具有 基體的片的情況,係在與形成基體上的稜鏡列之面不同之 面上,以已敘述的塗布方法、已敘述的乾燥方法塗布光擴 散層用塗料後使其乾燥’使光擴散層形成。 如此所製造的附有波形條紋抑制功能之稜鏡片的全厚爲 20〜300μιη,但爲20〜ΙΟΟμηι在可使背光單元薄型化之點 上較佳。特別是用於薄型化要求強烈的行動電話用的液晶 顯示裝置的背光單元的情況,可以全厚爲小於iOOl·1111’更 Ο 佳爲20〜70 μιη,故可對顯示部’進而行動電話的薄型化大 幅作出貢獻。 要使用如以上製作的附有波形條紋抑制功能之稜鏡片製 作液晶顯示裝置用背光單元,鄰接於具有光源的導光板之 出射面而使稜鏡面朝向導光板之出射面側,以習知的方法 配置、固定本發明之附有波形條紋抑制功能之稜鏡片即 可。此情況,與使用下擴散薄膜、上擴散薄膜、2片稜鏡 片的先前4片結構比較,可進行背光單元全厚的大幅減低。 ® 再者,藉由形成於液晶顯示面的背面側,以習知的方法 配置、固定如此製作的背光單元之出射面之結構的液晶顯 示裝置,可製作本案發明的液晶顯示裝置。 [實施例] 以下,使用實施例說明本發明 《擴散層用塗料(a)的調製步驟》 2 7 0質量份 74質量份 甲苯 環己酮 -33- 201022711 不定形狀多孔質二氧化矽「塞立西亞(Sylysia)420」 3 5質量份 〔平均細孔直徑:17nm、細孔容積:1.25ml/g、體積平均粒 徑(依據雷射法):3.1μιη,富士西立西亞(Silisia)化學公司製〕 丙烯酸樹脂溶液「阿克里狄克(ACRYDIC)WDU- 938」 2 9 0質量份 〔固體成分50%、固體成分的羥基値50,大日本油墨化學 工業公司製〕 帶電防止劑「諾普科斯塔脫SNA—2」 2質量份 〔咪唑啉型陽離子性帶電防止劑,桑諾普科公司(Sunopuco)製〕 © 聚異氟酸酯溶液「科羅內特(CORONATE) HL」 40質量份 〔固體成分75%、HDI系、固體成分中的有效NCO含量 17%,日本聚胺基甲酸酯工業公司製〕 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(a) °此 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 體成分爲20% (質量比)。 《擴散層用塗料(b)的調製步驟》 甲苯 270質量份 ® 環己酮 74質量份 不定形狀多孔質二氧化矽「塞立西亞430」 35質量份 〔平均細孔直徑:17nm、細孔容積:1.25ml/g、 體積平均粒徑(依據雷射法):4.1 μηι,富士西立西亞化學公.司製〕 丙烯酸樹脂溶液「阿克里狄克WDU-938」 290質量份 帶電防止劑「諾普科斯塔脫SNA—2」 2質量份 聚異氰酸酯溶液「科羅內特HL」 40質量份 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(b)° !«: -34- 201022711 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 體成分爲20% (質量比)。 《擴散層用塗料(c)的調製步驟》 甲苯 270質量份 環己酮 74質量份 不定形狀多孔質二氧化矽「塞立西亞440」 35質量份 〔平均細孔直徑:17nm、細孔容積:1.25ml/g、201022711 is suitably selected and used in the well-known solvent of the coating. The support base used as the wavy stripe-suppressing film of the present invention is not particularly limited as long as it has sufficient physical strength as a support, but is preferably a transparent substrate. In terms of or mechanical strength, it can be selected from polyethylene terephthalate! Film, polyethylene naphthalate (PEN) film, acrylic film, polycarbonate, cycloolefin, acrylic or other transparent or semi-transparent film. Among them, PET film or PEN film is particularly preferred. The thickness of the substrate is preferably from 5 to 250 μm, and more preferably from 10 to 2. When it is thinner than 5 μm, it is not only difficult to handle, but also curls due to heat shrinkage, and workability is remarkably lowered, which tends to decrease. When the thickness is thicker than 250 μm, the wavy stripe suppressing film cannot be used for a thin electronic device or the like, and the overshoot of the substrate itself is liable to be lowered, and the front luminance of the backlight unit is lowered to make the full thickness of the wavy stripe film thin and backlit. In particular, when the thickness of the liquid crystal display device for mobile phones is thin, it is preferably 7 to 50 μm. In order to improve the compatibility, at least one of the surfaces of the substrate surface is coated with an easy-bonding treatment layer, or a corona treatment or the like. As a wavy stripe-preventing film of the present invention, a coating material for a light-diffusing layer and a light-diffusing layer were applied to one side of the sheet-like substrate. The coating material for a light-diffusion layer is a film of a porous porous f-bond, a solvent, a charge-preventing agent, and other translucent properties as required, and a light-transparent surface smoothing ester (PET) thin film, polypropylene resin A film or a mechanical strength surface of the range of 100 μm will cause a tendency to transmit visible light due to the low thickness of i which is low in workability. The thin part of the special unit: for the purpose of modeling: the dense layer of the diffuser is provided with corona 丨, for example, it is formed by the addition of particles _ - 201022711. The coating method can be carried out by a general coating method. For example, blade, scraper, casting, impregnation, permeator, wire mesh, spin, reverse roll, jet, concave roll, spray, curtain flow, extrusion, fountain, roller, suspension, squeeze, positive Various coating methods such as roller and roll coating. The drying of the coating film can be carried out by a general drying method, for example, a hot air such as infrared rays, microwaves, electric induction heating, ultraviolet curing, or electron radiation curing. After drying, if necessary, heat-hardening at a predetermined temperature and time. The thickness of the wavy stripe suppressing film thus produced is 20 to 300 μm, but 20 to ΙΟΟμηι is at a point where the backlight unit can be made thinner. Preferably. In particular, when the backlight unit of a liquid crystal display device for mobile phones, which is required to be thinner, is required to have a full thickness of less than 1 ΟΟμιη, more preferably 20 to 70 μm, the display unit and the mobile phone can be made thinner. It is better. The wavy stripe suppressing film produced as described above can be used as a wavy strip suppressing film of a backlight unit using a cymbal sheet, in addition to being disposed on the exit surface side of the ruthenium sheet disposed on the exit surface of the light guide plate toward the ruthenium surface. The structure of the backlight unit is used by inserting the position from the exit surface of the light guide plate to the incident surface of the liquid crystal display surface at the most effective position, and the number of structural parts is small, so that the thickness of the entire backlight unit can be reduced. It is preferable that the backlight unit of the following structure, which is easy to generate wavy stripes, can exhibit its performance most effectively. In other words, the wavy stripe suppressing film of the present invention is disposed and fixed to a light source having at least one end surface side disposed on the light guide plate and the light guide plate, and an edge of the light guide plate disposed on the light guide plate of -28-201022711. It is preferable to use a side of the exit surface side of the cymbal of the backlight unit of the cymbal on the side of the exit surface side of the light guide plate. Further, the liquid crystal display device of the present invention can be produced by arranging and fixing the exit surface of the backlight unit thus produced in a conventional manner on the back surface side of the liquid crystal display surface. Regarding the direction in which the wavy stripe suppressing film is inserted, there is no problem in particular, but the light-transmitting substrate is the incident side, and the light-diffusing layer is the exit side, and there is a possibility that various functions are given to the incident side. Sex is better. On the surface opposite to the light-diffusing layer sandwiching the light-transmitting substrate, the position of the backlight unit of the film is suppressed in accordance with the arrangement of the streaks, and the sticking prevention function, the charging prevention function, the injury prevention function, and the like are provided. Various functional layers of various functions are also available. In addition, it can be used to further form another layer having a light diffusing function, thereby enhancing the light diffusion effect and increasing the overall turbidity. For example, on the side opposite to the exit side of the light guide plate, a reflective layer for enclosing light in the light guide plate is generally formed, and the outgoing light from the light guide w-plate is oriented in the same direction away from the light source to form an orientation. A continuous or discontinuous reflection pattern such as a direction in which the light source is increased in a direction away from the light source, but such a pattern may be used to increase the turbidity of the backlight unit in order to prevent the luminance discontinuity of the backlight unit from being increased. The light diffusing layer is adjusted to replace the use of a new light diffusing film. The light-transmitting substrate sandwiching the light-diffusing layer may be formed on the opposite side as a ruthenium sheet having a function of suppressing the wavy stripes. The ruthenium sheet with the wavy stripe suppressing function of the present invention forms the light-transmitting substrate of the light-diffusing layer sandwiching the wavy stripe suppressing film of the present invention of -29-201022711, and has mutually parallel edges on opposite sides.稜鏡 shape. The structure of the slab having the wavy stripe suppression function may be a transparent substrate or a transparent film, and a three-layer structure in which a matrix and a light diffusion layer are separately formed on both sides thereof may have a rib. Any of the layers of the mirror array or the light diffusing layer is integrated with the light transmissive substrate. In other words, the layer having the matrix or the light-diffusing layer itself may be a light-transmitting substrate of the support, and a layer of the other layer may be laminated on the other surface. Alternatively, it may be a layer in which a layer having a matrix and a light diffusion layer are directly laminated. However, it is preferable to use a light-transmissive substrate such as a separate transparent substrate or a transparent film to form a matrix and a light-diffusing layer by a coating step, and the composition, shape, and the like of each layer are also easily controlled independently. In other words, the prism sheet having the wavy stripe suppressing function of the present invention preferably includes a light-transmitting substrate, a light-diffusing layer formed on one surface of the light-transmitting substrate, and a light-diffusion layer interposed therebetween. The light-transmitting substrate is formed on the opposite side of the ruthenium layer. The stomach has a layer of the enamel of the enamel having the wavy stripe suppressing function of the present invention, and preferably has 稜鏡 arranged with a apex angle and a triangular shape in cross section, and has ridges formed in parallel and equally spaced edges. Column. Preferably, the surface of the array is a linear unit of the isosceles triangle of the same profile, and is arranged in parallel without gaps. The apex angle of the isosceles triangle of the profile is preferably 50° to 80°. More preferably 60°~70°. By forming an isosceles triangle having the same shape as the cross section, the manufacture of the raft is easy, and the enamel sheet can be made thinner, and the 稜鏡 function can be surely exerted. When the apex angle of 稜鏡 is 50° or more and 80° -30-201022711 or less, the edge of the ridge of the cymbal of the present invention is disposed toward the exit surface side of the light guide plate, and the ridge array is used. The total reflection of the bevel allows for a higher concentration of light toward the front of the LCD. In addition, the interval between adjacent rows and columns may be appropriately determined in consideration of the degree of film formation of the thickness of the matrix portion, the ease of manufacture of the matrix, the ease of generation of the wave stripes, and the like, and is preferably 5 to ΙΟΟμηη, 10 ~50μιη is better. The height of the prism array also affects the interval between the prism rows. However, when the thickness of the wafer is reduced, the thickness of the backlight unit is reduced, and in particular, the thickness of the liquid crystal display device for a mobile phone is reduced. 50 μm is preferred. The formation of the ruthenium with the wavy stripe suppression function of the present invention can be formed integrally with the support, or can be formed by laminating on the support. Regarding these, a well-known formation method can be used. An example of the manufacturing method of such a cymbal will be described below. For example, as disclosed in Japanese Laid-Open Patent Publication No. Hei 11-17 1941, it is possible to apply a continuous substrate to a die roll by a pressing roll, and supply a liquid ultraviolet curing type to a contact portion between the pressed substrate and the die roll. A method in which a resin is fixed in a shape by irradiation with ultraviolet rays and peeled off from a mold roll. Alternatively, as disclosed in Japanese Laid-Open Patent Publication No. 2002-258410, a liquid ultraviolet curable resin may be adhered to a mold roll, and then contacted with a continuous substrate to irradiate ultraviolet rays to fix a shape and peel off from the mold roll. . Alternatively, a method in which the ultraviolet curable resin is applied to a transparent substrate by a known coating method, and the ultraviolet curable resin surface is pressed against the die roll in an uncured state, and then irradiated with ultraviolet rays to fix the shape and peeled off from the die roll. -31-201022711 For example, according to the above-described formation method, as a material for the tantalum sheet of the present invention having a wavy stripe suppressing function, it is transparent, has initial fluidity, and is cured by light curing such as ultraviolet rays. The material to be used, which is softened by heating to become fluid, and which is cooled and re-solidified, can be used without particular limitation. For example, an ultraviolet curable resin composition, a thermoplastic resin or the like can be used. As the ultraviolet curable resin composition, various ultraviolet curable oligomer monomers such as an unsaturated polyester type, an acrylic type, a vinyl ether type, a maleimide type, and an epoxy resin type can be used as a main component. A reactive diluent, a polymerization initiator, a polymerization accelerator, an organic solvent, or the like is mixed as needed. As the thermoplastic resin, a general-purpose thermoplastic resin which is fluidized by heating, such as polyethylene, polypropylene, polystyrene, acrylic, polyester, or polycarbonate, can be used. Among them, a UV curable resin composition is particularly preferred. The reason is that when the thermoplastic resin is heated to a temperature higher than the glass transition temperature of the substrate, the substrate is deformed by heat, there is a possibility of occurrence of defects, and the ultraviolet curable resin composition is used as compared with the use of the thermoplastic resin. In the case of the heating and cooling time in each section, the production efficiency is advantageous. As a method of producing the prism sheet of the present invention, for example, a light diffusion layer having a wave stripe suppressing function can be formed on one surface of a light-transmitting substrate, and the above-mentioned surface can be formed on the other surface. Further, for example, the sheet having the above-described array on one surface may be formed by the above method, and then a light diffusion layer may be formed on the side opposite to the surface of the sheet. The sheet having the array may be formed on the substrate from 32 to 201022711, or may be formed by integrating with the substrate, for example, a sheet having a substrate, which is different from the surface of the matrix formed on the substrate. On the surface, the coating material for a light diffusion layer is applied by the coating method described above and the drying method described, and then dried to form a light diffusion layer. The full thickness of the ruthenium sheet having the wavy stripe suppressing function thus produced is 20 to 300 μm, but 20 to ΙΟΟμηι is preferable in that the backlight unit can be made thinner. In particular, in the case of a backlight unit for a liquid crystal display device for a mobile phone which is required to be thin, it is possible to have a full thickness of less than iOOl·1111', preferably 20 to 70 μm, so that it can be used for the display unit' Thinning has contributed significantly. The backlight unit for a liquid crystal display device is produced using the slab having the wavy stripe suppression function as described above, and the ruthenium surface is adjacent to the exit surface of the light guide plate having the light source, and the ruthenium surface faces the exit surface side of the light guide plate by a known method. The slab with the waveform stripe suppression function of the present invention can be configured and fixed. In this case, the total thickness of the backlight unit can be greatly reduced as compared with the previous four structures using the lower diffusion film, the upper diffusion film, and the two sheets. Further, a liquid crystal display device of the present invention can be produced by a liquid crystal display device which is formed on the back side of the liquid crystal display surface and has a structure in which the exit surface of the backlight unit thus produced is disposed and fixed by a conventional method. [Examples] Hereinafter, the preparation procedure of the coating material for a diffusion layer (a) of the present invention will be described with reference to the examples. 270 parts by mass of 74 parts by mass of toluene cyclohexanone-33-201022711 Unshaped porous cerium oxide Sylysia 420" 35 parts by mass [average pore diameter: 17 nm, pore volume: 1.25 ml/g, volume average particle diameter (according to laser method): 3.1 μιη, Fuji Silisia Chemical Co., Ltd. Acrylic resin solution "ACRYDIC WDU-938" 290 parts by mass (solid content 50%, hydroxy hydrazine 50 of solid content, manufactured by Dainippon Ink and Chemicals Co., Ltd.) Charge inhibitor "Knop Costa de SNA-2" 2 parts by mass [Imidazoline type cationic antistatic agent, manufactured by Sunopuco] © Polyisofluoric acid ester solution "CORONATE HL" 40 parts by mass [solid content: 75%, HDI, and an effective NCO content of 17% in a solid component, manufactured by Japan Polyurethane Industry Co., Ltd.) The mixture was stirred and mixed with a dispersing mixer to obtain a coating material for a diffusion layer (a). Addition of porous cerium oxide particles With respect to the amount of the binder resin solid content is 20% (mass ratio). <<Preparation step of coating for diffusion layer (b)>> Toluene 270 parts by mass ® cyclohexanone 74 parts by mass Shaped porous ceria "Serexia 430" 35 parts by mass [average pore diameter: 17 nm, pore volume : 1.25 ml / g, volume average particle diameter (according to the laser method): 4.1 μηι, Fuji Silesia Chemical Co., Ltd.] Acrylic resin solution "Akly Dick WDU-938" 290 parts by mass of antistatic agent " Nop Costa de SNA-2" 2 parts by mass of polyisocyanate solution "Cronette HL" 40 parts by mass The above mixture is stirred and mixed with a dispersing mixer to obtain a coating for a diffusion layer (b) ° !«: -34- 201022711 The amount of the porous cerium oxide particles added was 20% by mass based on the solid content of the resin binder. <<Preparation step of coating material for diffusion layer (c)>> Toluene 270 parts by mass of cyclohexanone 74 parts by mass of porous erbium dioxide "Serexia 440" 35 parts by mass [average pore diameter: 17 nm, pore volume: 1.25ml/g,

體積平均粒徑(依據雷射法):6.2 μιη,富士西立西亞化學公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU— 938」 290質量份 帶電防止劑「諾普科斯塔脫SN Α - 2」 2質量份 聚異氰酸酯溶液「科羅內特HL」 40質量份 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(c)。此 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 體成分爲20% (質量比)。 《擴散層用塗料(d)的調製步驟》 250質量份 72質量份 甲苯 環己酮 不定形狀多孔質二氧化矽「塞立西亞3 5 0」 27質量份 〔平均細孔直徑:21nm、細孔容積:1.60ml/g、 體積平均粒徑(依據雷射法):3.9 0111,富士西立西亞(8111以&amp;) 化學公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU-938」 300質量份 帶電防止劑「諾普科斯塔脫SNA— 2」 2質量份 聚異氰酸酯溶液「科羅內特HL」 40質量份 -35- 201022711 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(d)。此 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 體成分爲15% (質量比)。 《擴散層用塗料(e)的調製步驟》 甲苯 25 0質量份 環己酮 72質量份 不定形狀多孔質二氧化矽「塞立西亞25 0N」 27質量份 〔平均細孔直徑:24nm、細孔容積:1.80ml/ g、 ® 體積平均粒徑(依據雷射法):5.7μπι,富士西立西亞化學公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU - 93 8」 3 00質量份 帶電防止劑「諾普科斯塔脫SNA— 2」 2質量份 聚異氰酸酯溶液「科羅內特HL」 40質量份 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(e)。此 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 體成分爲15% (質量比)。 《擴散層用塗料(f)的調製步驟》 〇 甲苯 286質量份 環己酮 76質量份 不定形狀多孔質二氧化矽「塞立西亞5 50」 50質量份 〔平均細孔直徑:7.0nm、細孔容積:0.80ml/g、 體積平均粒徑(依據雷射法):3.9 μ m,富士西立西亞化學公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU-938」 274質量份 帶電防止劑「諾普科斯塔脫SN A - 2」 2質量份 聚異氰酸酯溶液「科羅內特HL」 3 7質量份 -36- 201022711 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(f)»此 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 體成分爲30% (質量比)。 《擴散層用塗料(g)的調製步驟》 甲苯 3 1 0質量份 環己酮 70質量份 標準球狀丙烯酸聚胺基甲酸酯樹脂粒子「BC-79」100質量份 〔體積平均粒子直徑約6μιη,岐阜蟲膠製造所公司製〕 Ο 丙烯酸樹脂溶液「阿克里狄克WDU— 93 8」 160質量份 帶電防止劑「諾普科斯塔脫SN Α— 2」 5質量份 聚異氰酸酯溶液「科羅內特HL」 22質量份 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(g)。此 時,樹脂粒子的添加量相對於樹脂黏合劑的固體成分爲100 % (質量比)。 《擴散層用塗料(h)的調製步驟》 甲苯 環己酮 3 1 〇質量份 7 0質量份 非標準球狀丙烯酸微粒子「特克聚合物L - XX-24BF」 1〇〇質量份 〔平均粒子直徑3〜12μιη(球換算直徑),積水化成品工業公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU— 938」 160質量份 帶電防止劑「諾普科斯塔脫SNA— 2」 5質量份 聚異氰酸酯溶液「科羅內特HL」 22質量份 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(h)。此 -37- 201022711 時,樹脂粒子的添加量相對於樹脂黏合劑的固體成分爲100 % (質量比)。 《擴散層用塗料(i)的調製步驟》 甲苯 3 1 0質量份 環己酮 7 0質量份 非標準球狀丙烯酸微粒子「HK- 1 030」 1 0 0質量份 〔體積平均粒子直徑3.Ομιη,綜硏化學公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU — 93 8」 160質量份 ® 帶電防止劑「諾普科斯塔脫SN A— 2」 5質量份 聚異氰酸酯溶液「科羅內特HL」 22質量份 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(i)。此 時,樹脂粒子的添加量相對於樹脂黏合劑的固體成分爲100 % (質量比)。 &lt;擴散層用塗料(j)的調製步驟》 甲苯 310質量份 環己酮 70質量份 〇 標準球狀丙烯酸微粒子「MX— 500」 1 〇〇質量份 〔體積平均粒子直徑5.0 μπι,綜硏化學公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU — 93 8」 160質量份 帶電防止劑「諾普科斯塔脫SN A— 2」 5質量份 聚異氰酸酯溶液「科羅內特HL」 22質量份 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(j)。此 時,樹脂粒子的添加量相對於樹脂黏合劑的固體成分爲1〇〇 % (質量比)。 -38- 201022711 《擴散層用塗料(k)的調製步驟》 甲苯 270質量份 環己酮 74質量份 球狀多孔質二氧化矽「塞洛斯菲亞C— 1 504」35質量份 〔細孔容積:1.5 ml/g、體積平均粒徑(依據雷射法): 4.5μπι,富士西立西亞化學公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU — 93 8」 2 90質量份 帶電防止劑「諾普科斯塔脫SN Α— 2」 2質量份 ΟVolume average particle size (according to the laser method): 6.2 μηη, manufactured by Fuji Silesia Chemical Co., Ltd. Acrylic resin solution "Arkidike WDU-938" 290 parts by mass of antistatic agent "Nopkosta de SN Α - 2" 2 parts by mass of the polyisocyanate solution "Colenet HL" 40 parts by mass The above mixture was stirred and mixed with a dispersing mixer to obtain a coating material (c) for a diffusion layer. In this case, the amount of the porous cerium oxide particles added is 20% by mass based on the solid content of the resin binder. <<Preparation step of coating material for diffusion layer (d) 250 parts by mass of 72 parts by mass of toluene cyclohexanone indefinite shape porous cerium oxide "Serexia 3 5 0" 27 parts by mass [average pore diameter: 21 nm, pores Volume: 1.60 ml/g, volume average particle diameter (according to the laser method): 3.9 0111, Fuji Silesia (8111 &amp; Chemical Co., Ltd.) Acrylic resin solution "Akudick WDU-938" 300 mass Part of the anti-static agent "Nop Costa De SNA-2" 2 parts by mass of polyisocyanate solution "Cronette HL" 40 parts by mass -35 - 201022711 The above dispersion mixture is stirred and mixed to obtain a coating for a diffusion layer (d) . In this case, the amount of the porous cerium oxide particles added is 15% by mass based on the solid content of the resin binder. <<Preparation step of coating material for diffusion layer (e)) Toluene 25 parts by mass of cyclohexanone 72 parts by mass of amorphous ceria "Selicia 25 0N" 27 parts by mass [average pore diameter: 24 nm, fine pores Volume: 1.80 ml / g, ® volume average particle diameter (according to the laser method): 5.7 μm, manufactured by Fuji Silesia Chemical Co., Ltd. Acrylic resin solution "Akudick WDU - 93 8" 3 00 parts by mass to prevent electricity "Noposta SNA-2" 2 parts by mass of a polyisocyanate solution "Cronette HL" 40 parts by mass The mixture was stirred and mixed with a dispersing mixer to obtain a coating material (e) for a diffusion layer. In this case, the amount of the porous cerium oxide particles added is 15% by mass based on the solid content of the resin binder. <<Preparation step of coating material for diffusing layer (f) 〇 Toluene 286 parts by mass of cyclohexanone 76 parts by mass of porous cerium oxide "Selicia 5 50" 50 parts by mass [average pore diameter: 7.0 nm, fine Pore volume: 0.80 ml/g, volume average particle diameter (according to the laser method): 3.9 μm, manufactured by Fuji Seli Chemical Co., Ltd. Acrylic resin solution "Akudick WDU-938" 274 parts by mass of antistatic agent "Nop Costa DeSN A - 2" 2 parts by mass of polyisocyanate solution "Cronette HL" 3 7 parts by mass - 36 - 201022711 The above mixture is stirred and mixed with a dispersing mixer to obtain a coating for the diffusion layer (f)» In the case, the amount of the porous ceria particles added is 30% by mass based on the solid content of the resin binder. <<Preparation step of coating material (g) for diffusion layer> Toluene 3 10 parts by mass of cyclohexanone 70 parts by mass of standard spherical acrylic urethane resin particles "BC-79" 100 parts by mass [volume average particle diameter about 6μιη, manufactured by 岐阜 胶 制造 〕 〕 丙烯酸 Acrylic resin solution "Ark Dick WDU - 93 8" 160 parts by mass antistatic agent "Noposta SN Α - 2" 5 parts by mass of polyisocyanate solution " 22 parts by mass of Ronet HL" The above mixture was stirred and mixed with a dispersing mixer to obtain a coating (g) for a diffusion layer. In this case, the amount of the resin particles added is 100% by mass based on the solid content of the resin binder. <<Preparation Step of Coating for Diffusion Layer (h)>> Toluene cyclohexanone 3 1 〇 parts by mass 70 parts by mass of non-standard spherical acrylic fine particles "Tek polymer L - XX-24BF" 1 part by mass [average particle Diameter 3~12μιη (ball-converted diameter), Sekisui Chemicals Co., Ltd.] Acrylic resin solution "Arkidike WDU-938" 160 parts by mass antistatic agent "Nuopu Costa De SNA-2" 5 mass parts 22 parts by mass of the isocyanate solution "Colenet HL" The mixture was stirred and mixed with a dispersing mixer to obtain a coating material (h) for a diffusion layer. In the case of -37-201022711, the amount of the resin particles added is 100% by mass based on the solid content of the resin binder. <<Preparation Step of Coating for Diffusion Layer (i)>> Toluene 3 10 parts by mass of cyclohexanone 70 parts by mass of non-standard spherical acrylic fine particles "HK-1 030" 100 parts by mass [volume average particle diameter 3. Ομιη , manufactured by Kyoritsu Chemical Co., Ltd.] Acrylic resin solution "Arkidike WDU - 93 8" 160 parts by mass ® Anti-static agent "Noposta SN A-2" 5 parts by mass of polyisocyanate solution "Cronette" 22 parts by mass of HL" The above mixture was stirred and mixed with a dispersing mixer to obtain a coating material (i) for a diffusion layer. In this case, the amount of the resin particles added is 100% by mass based on the solid content of the resin binder. &lt;Preparation step of coating material for diffusion layer (j)" Toluene 310 parts by mass of cyclohexanone 70 parts by mass of standard spherical acrylic fine particles "MX-500" 1 〇〇 by mass [volume average particle diameter 5.0 μπι, comprehensive chemical Company system] Acrylic resin solution "Arkidike WDU - 93 8" 160 parts by mass of anti-static agent "Nop Costa de SN A-2" 5 parts by mass of polyisocyanate solution "Cronette HL" 22 parts by mass The above mixture was stirred and mixed with a dispersing mixer to obtain a coating (j) for a diffusion layer. In this case, the amount of the resin particles added is 1% by mass (mass ratio) with respect to the solid content of the resin binder. -38- 201022711 "Preparation step of coating material for diffusion layer (k)" Toluene 270 parts by mass of cyclohexanone 74 parts by mass of spherical porous cerium oxide "Cylos Fiera C-1 504" 35 parts by mass [fine pore volume : 1.5 ml/g, volume average particle diameter (according to the laser method): 4.5 μπι, manufactured by Fuji Siricia Chemical Co., Ltd. Acrylic resin solution "Aku Dick WDU — 93 8" 2 90 parts by mass of antistatic agent " Knop Costa SN Α - 2" 2 parts by weight

聚異氰酸酯溶液「科羅內特HL」 40質量份 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(k)。此 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 體成分爲20% (質量比)。 《擴散層用塗料⑴的調製步驟》 甲苯 250質量份 環己酮 72質量份 不定形狀多孔質二氧化矽「塞立西亞420」 27質量份 〔平均細孔直徑:17nm、細孔容積:1.25ml / g、 體積平均粒徑(依據雷射法):3.1 μιη,富士西立西亞化學工 業公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU-938」 300質量份 〔固體成分50%、固體成分的羥基値50,DIC公司製〕 帶電防止劑「諾普科斯塔脫SNA— 2」 2質量份 〔咪唑啉型陽離子性帶電防止劑,桑諾普科公司製〕 聚異氰酸酯溶液「科羅內特HL」 40質量份 -39- 201022711 〔固體成分75%、HDI系、固體成分中的有效NCO含量 17%,日本聚胺基甲酸酯工業公司製〕 將以上用分散攪拌機攪拌混合’獲得擴散層用塗料(1)°此 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 體成分爲15% (質量比)。 《擴散層用塗料(m)的調製步驟》 甲苯 286質量份 環己酮 76質量份 〇 不定形狀多 孔質二氧化矽「塞立西亞420」 50質量份 〔平均細孔直徑:17nm、細孔容積:1.25ml/g、 體積平均粒徑(依據雷射法):3.1 μιη,富士西立西亞化學工 業公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU- 93 8」 2 74質量份 〔固體成分50%、固體成分的羥基値50,DIC公司製〕 帶電防止劑「諾普科斯塔脫SN Α— 2」 2質量份Polyisocyanate solution "Colenet HL" 40 parts by mass The above mixture was stirred and mixed with a dispersing mixer to obtain a coating material (k) for a diffusion layer. In this case, the amount of the porous cerium oxide particles added is 20% by mass based on the solid content of the resin binder. <<Preparation step of coating material for diffusion layer (1) Toluene 250 parts by mass of cyclohexanone 72 parts by mass of amorphous ceria "Selicia 420" 27 parts by mass [average pore diameter: 17 nm, pore volume: 1.25 ml / g, volume average particle diameter (according to the laser method): 3.1 μιη, manufactured by Fuji Silesia Chemical Industry Co., Ltd. Acrylic resin solution "Aku Dick WDU-938" 300 parts by mass [solid content 50%, solid content Hydroxyl hydrazine 50, manufactured by DIC Corporation] Charge inhibitor "Nop Costa De SNA-2" 2 parts by mass [Imidazoline type cationic charge inhibitor, manufactured by Sanno Pico Corporation) Polyisocyanate solution "Colenet" HL" 40 parts by mass - 39 - 201022711 [75% solid content, HDI system, 17% effective NCO content in solid content, manufactured by Japan Polyurethane Industry Co., Ltd.) The mixture was stirred and mixed with a dispersing mixer to obtain a diffusion layer. In the case of the coating material (1), the amount of the porous cerium oxide particles added was 15% by mass based on the solid content of the resin binder. <<Preparation step of coating material (m) for diffusion layer> Toluene 286 parts by mass of cyclohexanone 76 parts by mass 〇Indefinite shape porous cerium oxide "Serici 420" 50 parts by mass [average pore diameter: 17 nm, pore volume : 1.25 ml/g, volume average particle diameter (according to the laser method): 3.1 μιη, manufactured by Fuji Siricia Chemical Industry Co., Ltd. Acrylic resin solution "Aku Dick WDU-93 8" 2 74 parts by mass [solid content 50%, hydroxy hydrazine 50 of solid content, manufactured by DIC Corporation] Charge inhibitor "Nop Costa SN Α 2" 2 parts by mass

〔咪唑啉型陽離子性帶電防止劑,桑諾普科(Sunopuco)公司製〕 A V 聚異氰酸酯溶液「科羅內特HL」 37質量份 〔固體成分75%、HDI系、固體成分中的有效NCO含量 17%,日本聚胺基甲酸酯工業公司製〕 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(m)。此 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 體成分爲30% (質量比)。 (實施例1〜7、比較例1〜6) 《對基體的塗布、乾燥、硬化步驟》 -40- 201022711 作爲基體,使用厚度38μιη的聚對苯二甲酸乙二醇酯(pet) 薄膜。以將上述擴散層用塗料(a)以成爲乾燥膜厚4.1 μιη的 方式塗布於基體一方之面上,使其熱風乾燥而獲得擴散層 的乾燥塗膜者爲實施例1。同樣地,以將上述擴散層用塗 料(b)、(c)、(d)、(e)、(k)以分別成爲乾燥膜厚 7·1μιη、8.8μιη、 7.6 μιη、7.5 μιη、6.2 μιη的方式塗布,使其乾燥者爲實施例2 〜6。再者,以將上述擴散層用塗料(1)、(m)以分別成爲乾 燥膜厚4·0 μιη、4.6 μιη的方式塗布,使其乾燥者分別爲實施 例7、比較例2。此外,同樣地,以將上述擴散層用塗料(f) 以成爲乾燥膜厚6·6μιη的方式塗布,使其乾燥者爲比較例 1,以將上述擴散層用塗料(g)〜(j)的任一者以成爲乾燥膜 厚3.0〜10.Ομιη的方式塗布,使其乾燥者分別爲比較例3 〜6(關於擴散層用塗料與塗布膜厚的對應,參閱表1)。上 述塗布步驟結束後,爲促進硬化反應而在40°C恆溫室中保 管4 8小時。 此等實施例、比較例,如後所述,係使用含有各種擴散 粒子的光擴散層而製作的各波形條紋抑制薄膜以具有一定 以上的波形條紋抑制效果,且盡量不使正面亮度降低的方 式,調整其擴散粒子的含有量、及光擴散層的膜厚(t)與擴 散粒子的體積平均粒徑(d)之比率(t/ d)而製作者。 《稜鏡片的製作步驟》 作爲基體,使用厚度38或25 μπι的PET薄膜。在基體一 方之面上,將紫外線硬化性樹脂組成物加熱到約80°C,降 低黏度,利用模塗(die coat)法塗布成厚度30μιη。紫外線硬 -41- 201022711 化性樹脂組成物中使用有尤尼狄克RC27 - 960(不飽和聚 酯、丙烯酸酯單體、光引發劑等混合物,DIC公司製)。其 次,將形成有棱鏡間距:12.4μπι、稜鏡高度:ΙΟμιη、頂角 64度的稜鏡列之版的平板狀模具與形成有上述未硬化樹脂 層的基體共同以11 〇°C加熱2分鐘。其後,將基體上的未 硬化樹脂層面叠在模具面上,從基體背面以滾筒輕推壓 後,從基體背面側照射紫外線,使未硬化樹脂硬化、固定。 紫外線燈使用高壓水銀燈,照射能量以累計値計爲 6 0 0mJ。將模具、樹脂、基體的層積物冷卻到室溫附近,使 基體自模具上剝離的結果,可獲得預定的稜鏡形成於基體 表面者。 · 《光學特性的評估》 分解市售行動電話的背光單元,除去所裝入的4片薄膜 (下用光擴散薄膜、稜鏡片2片、上用光擴散薄膜),將於 上述製作的稜鏡片以稜鏡面成爲導光板出射面側的方式配 置,在其出射面側層積本發明之波形條紋抑制薄膜後裝入 背光單元中,測量背光單元的正面亮度。測量裝置使用多 點亮度計EyeWin3 90c(視系統公司製)。測量區域爲在背光 單元發光面,從各背光單元發光面的左右端除了全横幅15 %的寬度以外,且從各背光單元發光面的上下端除了全縱 幅15%的寬度以外的中心部分的矩形區域。以3x3將此測 量區域9分割,測量各區域的亮度後,將此等平均作爲正 面亮度之値。 (參考例1) -42- 201022711 使用市售行動電話的背光單元,照樣使用爲其標準結構 的4片光學片(下光擴散薄膜、稜鏡片2片、上光擴散薄 膜),進行上述光學特性的評估。 (參考例2) 只將於上述製作的稜鏡片以棱鏡面成爲導光板出射面側 的方式配置,進行上述光學特性的評估。以未插入波形條 紋抑制薄膜的此參考例2的正面亮度爲評估插入有波形條 紋抑制薄膜時的正面亮度的基準。 《亮度降低率》 使用於各實施例、比較例製作的波形條紋抑制薄膜所得 到的正面亮度値與參考例2的正面亮度値的差除以參考例 2的正面亮度値,如下式算出亮度降低率。 ((參考例2的正面亮度値)一(各正面亮度値))xi〇〇/(參 考例2的正面亮度値) 關於波形條紋的評估,係將行動電話的液晶單元蓋在測 量上述亮度的背光單元上,以目視確認,按照以下5等級 的評估基準進行評估。 《波形條紋評估値》 評 估 値 1 可 明 確 地 確認波形條紋的產生,亮度均 勻 性 也 較 低。 評 估 値 2 亮 度 均 勻 性提高,但可明確地確認波形 條 紋 的 產 生。 評 估 値 3 模 ψΐ-Π 糊 ,但可容易地確認波形條紋的存在。 評 估 値 4 由 注 視 可 確認波形條紋。 -43- 201022711 評估値4.5 由注視可確認模糊的波形條紋。 評估値5 完全不能確認波形條紋。 《光擴散層的膜厚測量方法》 光擴散層的膜厚係以電子測微計K402B(安立股份有限 公司製)測量10點,從値較小者中取3點求出平均値。 在本發明之波形條紋抑制薄膜方面,可充分達成薄膜的 薄度,同時不使背光單元或液晶顯示裝置顯示面的正面亮 度降低,而可防止波形條紋的產生,但正面亮度的提高與 © 背光單元或液晶顯示裝置的波形條紋減低在於選擇其一 (trade - off)的關係沒有改變。波形條紋幾乎不產生的狀態 的波形條紋評估値爲4以上,所以將實用上沒有問題的水 準定爲4以上。關於以實現被認爲大致上完全進行波形條 紋抑制的波形條紋評估値4.5之方式所製作的實施例、比 較例的各波形條紋抑制薄膜,波形條紋評估値以外的以正 面亮度爲首的各種特性如何,表1中顯示其評估結果。 表1的亮度降低率表示相對於參考例2的結構的正面亮 ¥ 度値,使用各波形條紋抑制薄膜時的亮度降低率。 《塗膜密合性的評估》 將尼其邦公司製赛璐玢膠帶(註冊商標)(寬度15mm)貼在 光擴散層上,以負荷5kg的包膠滾筒一往復推壓後,剝離 膠帶。如下判定剝離後的擴散層的剝離情況。表1中顯示 評估結果》 〇…完全沒有膜的剝離 △…膜剝離的面積小於膠帶貼上面積的30% -44- 201022711 χ…膜剝離的面積大於膠帶貼上面積的30% 《塗料適用期的評估〉 藉由塗料狀態的目視觀察,進行塗料適用期(到塗料膠化 而不能使用的時間)的比較。適用期的評估,係以具有實用 上沒有問題的適用期的實施例1的塗料爲基準而使用以下 的基準。表1中顯示評估結果。 〇...具有在23°c室內靜置24小時以上、在40°C恆溫槽內 靜置1 2小時以上的適用期。 Ο △…具有在23 °C室內靜置12小時以上24小時以下、在 40°C恆溫槽內靜置6小時以上12小時以下的適用期。 X ...具有在23°C室內靜置12小時以下、在40°C恆溫槽內 靜置6小時以下的適用期。[Imidazoline type cationic charge inhibitor, manufactured by Sunopuco Co., Ltd.] AV polyisocyanate solution "Colenet HL" 37 parts by mass [solid content 75%, HDI system, effective NCO content in solid content 17%, manufactured by Japan Polyurethane Industry Co., Ltd. The above dispersion and mixing machine were mixed with a dispersing mixer to obtain a coating material (m) for a diffusion layer. In this case, the amount of the porous cerium oxide particles added is 30% by mass based on the solid content of the resin binder. (Examples 1 to 7 and Comparative Examples 1 to 6) "Step of Coating, Drying, and Hardening of Substrate" - 40 - 201022711 As a substrate, a polyethylene terephthalate (PET) film having a thickness of 38 μm was used. In the first embodiment, the coating material for a diffusion layer (a) was applied to one surface of a substrate so as to have a dry film thickness of 4.1 μm, and dried by hot air to obtain a dried coating film of a diffusion layer. Similarly, the coating materials for the diffusion layers (b), (c), (d), (e), and (k) are respectively dried to have a thickness of 7·1 μm, 8.8 μm, 7.6 μm, 7.5 μm, and 6.2 μm. The coating was applied to make it dry for Examples 2 to 6. In addition, the coating materials (1) and (m) for the diffusion layer were applied so as to have a dry film thickness of 4·0 μm and 4.6 μm, respectively, and dried in Examples 7 and 2, respectively. In the same manner, the coating material for the diffusion layer (f) was applied so as to have a dry film thickness of 6·6 μm, and dried to be Comparative Example 1, and the coating material for the diffusion layer (g) to (j) was used. Any of them was applied so as to have a dry film thickness of 3.0 to 10. Ομηη, and the dried ones were Comparative Examples 3 to 6 (see Table 1 for the correspondence between the coating material for the diffusion layer and the thickness of the coating film). After the end of the coating step, it was kept in a constant temperature room at 40 ° C for 48 hours in order to promote the hardening reaction. In the above-described examples and comparative examples, as described later, each of the corrugated stripe-preventing films produced by using the light-diffusing layer containing various diffusing particles has a wave streak suppressing effect of a certain level or more and does not reduce the front luminance as much as possible. The ratio of the content of the diffusion particles and the ratio (t/d) of the film thickness (t) of the light diffusion layer to the volume average particle diameter (d) of the diffusion particles was adjusted. "Step of Making Bracts" As a substrate, a PET film having a thickness of 38 or 25 μm is used. On the surface of the substrate, the ultraviolet curable resin composition was heated to about 80 ° C to lower the viscosity, and coated to a thickness of 30 μm by a die coating method. Ultraviolet hard -41- 201022711 A chemical resin composition is used in the composition of UD27-960 (a mixture of an unsaturated polyester, an acrylate monomer, and a photoinitiator, manufactured by DIC Corporation). Next, a flat mold having a prism pitch of 12.4 μm, a height of ΙΟμηη, and an apex angle of 64 degrees was formed by heating together with the substrate on which the uncured resin layer was formed at 11 ° C for 2 minutes. . Thereafter, the uncured resin layer on the substrate is laminated on the surface of the mold, and the substrate is lightly pressed from the back surface of the substrate, and then ultraviolet rays are irradiated from the back side of the substrate to cure and fix the uncured resin. The ultraviolet lamp uses a high-pressure mercury lamp, and the irradiation energy is 6,000 mJ in total. When the laminate of the mold, the resin, and the substrate is cooled to near room temperature, and the substrate is peeled off from the mold, a predetermined flaw is formed on the surface of the substrate. · "Evaluation of Optical Characteristics" Decomposes the backlight unit of a commercially available mobile phone, and removes the four films (the light diffusing film, the two pieces of the film, and the light diffusing film for the upper side) which are to be mounted, and the film which will be produced as described above. The kneading surface was placed on the light-emitting surface side of the light guide plate, and the wavy stripe suppressing film of the present invention was laminated on the exit surface side, and then incorporated into the backlight unit, and the front surface luminance of the backlight unit was measured. The measuring device used a multi-point luminance meter EyeWin3 90c (manufactured by Vision Systems). The measurement area is a light-emitting surface of the backlight unit, and the left and right ends of the light-emitting surfaces of the backlight units are not limited by a width of 15% of the full banner, and the center portions of the light-emitting surfaces of the backlight units are not limited by a width of 15% of the full vertical width. Rectangular area. This measurement area is divided by 3 at 3x3, and the brightness of each area is measured, and these averages are taken as the front side luminance. (Reference Example 1) -42- 201022711 Using the backlight unit of a commercially available mobile phone, four optical sheets (lower light-diffusing film, two pieces of enamel, and light-diffusing film) of the standard structure are used as they are. evaluation of. (Reference Example 2) The above-described cymbal sheet was placed so that the prism surface became the light-emitting surface of the light guide plate, and the optical characteristics were evaluated. The front luminance of this Reference Example 2 in which the corrugation suppression film was not inserted was used as a reference for evaluating the front luminance when the corrugation suppression film was inserted. <<Brightness Reduction Rate>> The difference between the front luminance 値 obtained by the wavy stripe suppression film produced in each of the examples and the comparative example and the front luminance 値 of Reference Example 2 was divided by the front luminance 参考 of Reference Example 2, and the luminance reduction was calculated by the following equation. rate. ((Front brightness 値 of Reference Example 2) 1 (each front brightness 値)) xi 〇〇 / (Front brightness 値 of Reference Example 2) Regarding the evaluation of the waveform stripe, the liquid crystal cell of the mobile phone is placed on the measurement of the above brightness. The backlight unit was visually confirmed and evaluated according to the following five levels of evaluation criteria. The “Wavelet Streak Evaluation” evaluation 値 1 clearly confirms the generation of the waveform fringes and the brightness uniformity is also low. Evaluation 値 2 Brightness uniformity is improved, but the generation of waveform streaks can be clearly confirmed. Evaluate 値 3 ψΐ Π - 糊 paste, but the presence of wavy stripes can be easily confirmed. Evaluation 値 4 The waveform streak can be confirmed by the annotation. -43- 201022711 Evaluation 値 4.5 The wavy stripes can be confirmed by gaze. Evaluation 値5 Wave streaks cannot be confirmed at all. <<Measurement Method of Film Thickness of Light-Diffusion Layer>> The film thickness of the light-diffusing layer was measured by an electronic micrometer K402B (manufactured by Anritsu Co., Ltd.) at 10 points, and an average of 値 was obtained from three points of the smaller one. In the wavy stripe suppressing film of the present invention, the thinness of the film can be sufficiently achieved without lowering the front luminance of the display unit of the backlight unit or the liquid crystal display device, and the generation of wavy stripes can be prevented, but the front luminance is improved and © backlight The reduction in the waveform fringe of the unit or the liquid crystal display device is that the trade-off relationship does not change. In the state where the waveform fringes hardly occur, the waveform fringe evaluation 値 is 4 or more, so the level which is practically no problem is set to 4 or more. Regarding each of the waveform stripe suppression films of the examples and the comparative examples produced by the method of realizing the waveform fringe evaluation 値 4.5 which is considered to be substantially completely suppressed by the waveform stripe, various characteristics including the front luminance are evaluated other than the waveform fringe evaluation 値How, the evaluation results are shown in Table 1. The luminance reduction rate in Table 1 indicates the luminance reduction rate at the time of suppressing the film by using each of the waveform stripe with respect to the front surface of the structure of Reference Example 2. "Evaluation of Coating Adhesiveness" A cellophane tape (registered trademark) (width: 15 mm) made by Nikko Co., Ltd. was attached to a light-diffusing layer, and the tape was peeled back by a 5 kg-loaded rubberized roller, and the tape was peeled off. The peeling of the diffusion layer after peeling was determined as follows. The evaluation results are shown in Table 1. 〇...There is no peeling of the film at all △...The area of film peeling is less than 30% of the area of the tape. -44- 201022711 χ...The area of film peeling is more than 30% of the area of the tape. Evaluation> By visual observation of the state of the paint, a comparison is made between the pot life of the paint (the time when the paint is gelled and cannot be used). The evaluation of the pot life was based on the coating of Example 1 having a practical period in which there was no practical problem, and the following criteria were used. The evaluation results are shown in Table 1. 〇... has a pot life of standing in a room at 23 ° C for 24 hours or more and standing in a 40 ° C thermostatic chamber for 12 hours or more. Ο △... has a pot life of standing in a room at 23 ° C for 12 hours or more and 24 hours or less, and standing in a 40 ° C thermostatic chamber for 6 hours or more and 12 hours or less. X ... has a pot life of standing at 23 ° C for 12 hours or less and standing in a 40 ° C thermostatic chamber for 6 hours or less.

-45- 201022711 表1 搪散餍的籣阳《成 擴散餍 厚度 (/am) mmm /2?均粒 子ME mmm 潍 塗料 mm 期 tmm 用塗料 名 製品名 翻 rntem (Aim) 細孔 额 (m/ε) mam 分 ft%) 挪條. iEmm fcd/n?) mm 鮮 (·/.) 實賴 1 a *W· 多孔質 二氣化较. 3.1 US 不娜 20 4.1 1.3 4.5 2009 15.9 0 0 2 b 4.1 1.25 不娜 20 ΊΑ 1.7 4.5 2036 14.8 o ο 3 c 6.2 1.25 不定形 20 Μ 1.4 4.5 2017 15.6 o 0 4 d 气贾亞 3*9 1.6 不娜 15 U 1.9 4.5 1940 18.8 o 0 5 e 5.7 1.8 不跡 15 1Λ 1.3 4·5 1949 18.5 o ο 6 k m 4.5 1.5 m 20 1.6 1961 17.9 o ο 7 1 气亮亞: 3.1 1.25 不挪 15 Μ 1J 4 2355 1.5 o ο 比糊 1 r S5®55 多孔質 —氧化较 3.9 0.8 不跡 30 1.1 4.5 2039 14.7 厶 Δ 2 m 3.1 1.25 不娜 30 Μ 1.5 5 1951 1&amp;4 Δ Δ 3 g BC-79 丙烯g胺 關if 6 - mm- too 1〇 - 4.5 1859 22.2 Δ Δ 4 h 繼· nmm 脂粒子 3-12 -; tmmm 100 i 1.3 4.5 1901 20.5 Δ Δ 5 i HK-1030 3 - mmm. 100 1 0.6 4.5 1752 26.7 Δ Δ 6 j MX-SOO 5 - mm» 100 5 1.1 4.5 1789 25^1 Δ Δ 參考例 1 - - - - - -. • _ 5 2215 7.3 - 2 - - - - - -, _ = - ΐ 2390 0 - --45- 201022711 Table 1 籣 《 《 《 《 成 成 成 成 成 成 成 成 成 成 / / / / / / rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn rn ε) mam ft%) No. iEmm fcd/n?) mm Fresh (·/.) Really depends on 1 a *W· Porous two gasification. 3.1 US not 204.1 1.3 4.5 2009 15.9 0 0 2 b 4.1 1.25 娜娜20 ΊΑ 1.7 4.5 2036 14.8 o ο 3 c 6.2 1.25 Amorphous 20 Μ 1.4 4.5 2017 15.6 o 0 4 d Gas Jaya 3*9 1.6 Buna 15 U 1.9 4.5 1940 18.8 o 0 5 e 5.7 1.8 No trace 15 1Λ 1.3 4·5 1949 18.5 o ο 6 km 4.5 1.5 m 20 1.6 1961 17.9 o ο 7 1 Air bright sub: 3.1 1.25 No shift 15 Μ 1J 4 2355 1.5 o ο than paste 1 r S5®55 porous - Oxidation is 3.9 0.8 No trace 30 1.1 4.5 2039 14.7 厶Δ 2 m 3.1 1.25 不娜30 Μ 1.5 5 1951 1&amp;4 Δ Δ 3 g BC-79 Propylene Gamine off if 6 - mm- too 1〇- 4.5 1859 22.2 Δ Δ 4 h followed by · nmm lipid particles 3-12 -; tmmm 100 i 1.3 4.5 1901 20.5 Δ Δ 5 i HK-1030 3 - mmm. 100 1 0.6 4.5 1752 26.7 Δ Δ 6 j MX-SOO 5 - mm» 100 5 1.1 4.5 1789 25^1 Δ Δ Reference example 1 - - - - - -. • _ 5 2215 7.3 - 2 - - - - - -, _ = - ΐ 2390 0 - -

參考例1 :使用爲背光單元標準結構的4片光學片(下雖薄膜、讎片2片、上擴散薄膨而測置正面亮度 參考例2 :只將稜鏡片以稜鏡面成爲導光板出射面側的方式配置,測量正面亮度 亮度降低率:相對於參考例3的正面亮度値的亮度降低率 如從表1得知,多?L質粒子的細孔容積爲1.25 ml/ g的 實施例1〜3可抑制波形條紋與確保較高的正面亮度,並可 達成光擴散層的薄膜化。相對於此,使多孔質粒子的含有 量減少的實施例7的情況,波形條紋評估値少許降低,但 ❹ 正面亮度大幅提高。相反地,使多孔質粒子的含有量增加, 則如比較例2所示,波形條紋評估値提高,但正面亮度降 低,樹脂黏合劑的相對量減少,故擴散層與基體的接合力 降低,塗料的適用期也變短。在使多孔質粒子的細孔容積 較大的實施例4、5方面,正面亮度有少許降低的傾向,但 在於實用水準。另一方面,在使多孔質粒子的細孔容積縮 小到0.80ml/ g的比較例1方面,爲了抑制波形條紋,必 須使樹脂黏合劑中的擴散材料質量增加到30%,其結果, 樹脂黏合劑的相對量減少,故擴散層與基體的接合力降 -46 - 201022711 低,塗料的適用期也變短。如比較例3〜6Reference Example 1: Four optical sheets which are standard structures of the backlight unit are used (the film is thinned, the two sheets are thinned, and the front side is thinned and the front side brightness is measured.) Reference Example 2: Only the enamel sheet is used as the light guide sheet exit surface. In the side mode configuration, the front luminance luminance reduction rate was measured: the luminance reduction rate with respect to the front luminance 値 of Reference Example 3 is as shown in Table 1, and the pore volume of the multi-L particle was 1.25 ml/g. ~3 suppresses the wave streaks and ensures high front luminance, and can achieve thinning of the light diffusion layer. On the other hand, in the case of Example 7 in which the content of the porous particles is reduced, the evaluation of the waveform fringe is slightly lowered. However, the front side brightness is greatly increased. Conversely, when the content of the porous particles is increased, as shown in Comparative Example 2, the evaluation of the wavy streaks is improved, but the front side brightness is lowered, and the relative amount of the resin binder is decreased, so the diffusion layer and the diffusion layer are The bonding strength of the substrate is lowered, and the pot life of the coating material is also shortened. In the fourth and fifth embodiments in which the pore volume of the porous particles is large, the front luminance tends to be slightly lowered, but the practical level is On the other hand, in Comparative Example 1 in which the pore volume of the porous particles was reduced to 0.80 ml/g, in order to suppress the wavy streaks, it was necessary to increase the mass of the diffusion material in the resin binder to 30%, and as a result, the resin was bonded. The relative amount of the agent is reduced, so the bonding force of the diffusion layer and the substrate is lowered to -46 - 201022711, and the pot life of the coating is also shortened. For example, Comparative Examples 3 to 6

擴散材料 中使用樹脂粒子的情況,爲了抑制波形條紋,必須再添加 大量的擴散劑,正面亮度會大幅降低,且擴散層與基體的 接合力、塗料的適用期也降低。再者,如實施例6,使用 球狀的多孔質二氧化矽作爲擴散材料的情況,同樣地與含 有20質量%多孔質粒子作爲固體成分中的擴散材料,並使 用有不定形的多孔質二氧化矽的實施例1〜3的情況比 較,正面亮度有降低的傾向。When resin particles are used in the diffusion material, in order to suppress the wavy streaks, a large amount of a diffusing agent must be added, and the front luminance is greatly lowered, and the bonding strength between the diffusion layer and the substrate and the pot life of the coating are also lowered. In the case of using the spherical porous ceria as the diffusion material, as in the case of the sixth embodiment, the porous material containing 20% by mass of the porous particles is used as the diffusion material in the solid component, and the porous material having the amorphous shape is used. In the case of Examples 1 to 3 of cerium oxide, the front luminance tends to be lowered.

再者,在細孔容積之點上,在考慮塗膜密合性或塗料適 用期的特性不會降低,並且亮度降低率也良好的區域方 面,進一步爲了抑制波形條紋,並且獲得良好的正面亮度 而進行了硏討。再者,在試料的製作方面,考慮若波形條 紋評估値爲4以上則實用上沒有問題,硏討了波形條紋評 估値達成4且可實現盡量較高的正面亮度的條件。 《擴散層用塗料(P)的調製步驟》 甲苯 2 5 0質量份Furthermore, in terms of the area of the pore volume, in view of the area where the coating film adhesion or the coating pot life is not lowered, and the brightness reduction rate is also good, the wave streaks are further suppressed, and good front brightness is obtained. And begging. Further, in the production of the sample, it is considered that there is no problem in practical use if the waveform evaluation 値 is 4 or more, and the condition that the waveform fringe evaluation is reached 4 and the front luminance is as high as possible can be achieved. <<Preparation step of coating material for diffusion layer (P)>> Toluene 250 parts by mass

環己酮 72質量份 不定形狀多孔質二氧化矽「塞立西亞420」 27質量份 〔平均細孔直徑:17nm、細孔容積:1.25ml/g、 體積平均粒徑(依據雷射法):3.1 Pm,富士西立西亞化學公司製〕 丙烯酸樹脂溶液「阿克里狄克WDU — 93 8」 3 00質量份 〔固體成分50%、固體成分的羥基値50,大日本油墨化學 工業公司製〕 帶電防止劑「諾普科斯塔脫SNA—2」 2質量份 -47- 201022711 〔咪唑啉型陽離子性帶電防止劑,桑諾普科公 聚異氰酸酯溶液「科羅內特HL」 〔固體成分75%、HDI系、固體成分中的有交 17%,日本聚胺基甲酸酯工業公司製〕 將以上用分散攪拌機攪拌混合,獲得擴散層用 時,多孔質二氧化矽粒子的添加量相對於樹脂 體成分爲15% (質量比)。 《擴散層用塗料(q)的調製步驟》 ®甲苯 環己酮 不定形狀多孔質二氧化矽「塞立西亞430」 〔平均細孔直徑:17nm、細孔容積:1.25ml/ 體積平均粒徑(依據雷射法):4·1 μιη,富士西立 司製〕 丙烯酸樹脂溶液「阿克里狄克WDU-938」 帶電防止劑「諾普科斯塔脫SNA— 2」 聚異氰酸酯溶液「科羅內特HLj 將以上用分散攪拌機攪拌混合,獲得擴散層用 時,多孔質二氧化矽粒子的添加量相對於樹脂 體成分爲15% (質量比)。 《擴散層用塗料(r)的調製步驟》 甲苯 環己酮 不定形狀多孔質二氧化矽「塞立西亞440」 司製〕 4 0質量份 NCO含量 塗料(P)。此 黏合劑的固 250質量份 72質量份 27質量份 g、 西亞化學公 3 0 0質量份 2質量份 40質量份 塗料(q) β此 黏合劑的固 250質量份 72質量份 27質量份 -48 - 201022711 〔平均細孔直徑:17nm、細孔容積:1.25ml/g、 體積平均粒徑(依據雷射法):6·2μπι,富士西立西亞化學公 司製〕 丙烯酸樹脂溶液「阿克里狄克WDU— 938」 300質量份 帶電防止劑「諾普科斯塔脫SNA— 2」 2質量份 聚異氰酸酯溶液「科羅內特HL」 40質量份 將以上用分散攪拌機攪拌混合,獲得擴散層用塗料(〇。此 時,多孔質二氧化矽粒子的添加量相對於樹脂黏合劑的固 ® 體成分爲15% (質量比)。 (實施例7〜16) 《對基體的塗布、乾燥、硬化步驟》 作爲基體,使用厚度38 μπι的聚對苯二甲酸乙二醇酯(PET) 薄膜。以將上述擴散層用塗料(P)以成爲乾燥膜厚5.8 μιη、 9.8 μιη的方式塗布於基體一方之面上,使其熱風乾燥而獲 得擴散層的乾燥塗膜者分別爲實施例7、8。同樣地,以將 上述擴散層用塗料(q)以成爲乾燥膜厚6.0μιη、8.2μιη的方 〇 式塗布,使其熱風乾燥而獲得擴散層的乾燥塗膜者分別爲 實施例9、10。同樣地,以將上述擴散層用塗料(q)〜(Γ)的 任一者以成爲乾燥膜厚4.0〜10.3 μιη的方式塗布,使其熱 風乾燥而獲得擴散層的乾燥塗膜者分別爲實施例11〜 16(關於擴散層用塗料與塗布膜厚的對應,參閱表2)。上述 塗布步驟結束後,爲促進硬化反應而在40。C恆溫室中保管 4 8小時。 此等實施例、比較例,如後所述,係使用含有各種擴散 -49- 201022711 粒子的光擴散層而製作的各波形條紋抑制薄膜以具有成M 波形條紋評估値4的一定以上的波形條紋抑制效果,且盡 量不使正面亮度降低的方式,調整其擴散粒子的含有量 後’調整光擴散層的膜厚(t)與擴散粒子的體積平均粒徑(d) 之比率(t/ d)而製作者。 《稜鏡片的製作步驟》 使用厚度38或25 μπι的PET薄膜。在基體一方之面上, 將紫外線硬化性樹脂組成物加熱到約80°C,降低黏度,利 用模塗(die coat)法塗布成厚度30 μιη。紫外線硬化性樹脂組 成物中使用有尤尼狄克RC27-9 60(不飽和聚酯、丙烯酸酯 單體、光引發劑等混合物,DIC公司製)。其次,將形成有 稜鏡間距:12.4μιη、稜鏡高度:ΙΟμιη、頂角64度的稜鏡 列之版的平板狀模具與形成有上述未硬化樹脂層的基體共 同以110°C加熱2分鐘。其後,將基體上的未硬化樹脂層 面疊在模具面上,從基體背面以滾筒輕推壓後,從基體背 面側照射紫外線,使未硬化樹脂硬化、固定。紫外線燈使 用高壓水銀燈,照射能量以累計値計爲600mJ。將模具、 樹脂、基體的層積物冷卻到室溫附近,使基體自模具上剝 離,結果可獲得預定的稜鏡形成於基體表面者。以如此所 製作的稜鏡片爲基體,在與其稜鏡面相反側,將上述擴散 用塗料以成爲預定膜厚的方式塗布、乾燥,藉此可製作與 實施例7〜16對應的附有波形條紋抑制功能之稜鏡片。 使用如此製作的波形條紋抑制薄膜與稜鏡片,和實施例 1〜7、比較例1〜6同樣,進行了各種光學特性的評估。 -50- 201022711 在本發明之波形條紋抑制薄膜方面,可充分達成薄膜的 薄度,同時不使背光單元或液晶顯示裝置顯示面的正面亮 度降低,而可防止波形條紋的產生,但正面亮度的提高與 背光單元或液晶顯示裝置的波形條紋減低在於選擇其一 (trade - off)的關係沒有改變。在以下的實施例方面,波形 條紋幾乎不產生的狀態的波形條紋評估値爲4以上,所以 將實用上沒有問題的水準定爲4以上,硏討波形條紋評估 値爲4時,達成較高的正面亮度,表2中顯示其評估結果 ❹ (表2) 壇ffr謄的鼸C鋇瑜 擴散屠 厚度 mMm 光雜性 mm 用塗料 名 擴散材料 促膽i四冲 的擴散材料 RK%) 製品名 _ mpm (jt/m) 細孔 (ml/g) 形狀 平均拉子丨 直徑 波形mt 獅値 正面 (cd/m2) 亮度降 m (·/.) 實施例 7 P 塞立西亞 420 多孔質 二氧化砂 a 1 1. 25 不定形 15 5. 8 1.9 4 2183 8.7 宜旃例 8 P 塞立西亞 420 多孔質 二氣化砍 3. 1 1. 25 不定形 15 9.8 3.2 4 2170 9.2 獅例 9 q 塞立酿 430 多孔質 二氧化较 4. 1 1, 25 不定形 15 6. Ο 1.5 4 2176 9.0 10 P 430 多孔質 二氧化砂: 4, 1 1. 25 不定形 15 8. 2 2.0 4 2164 9.4 .飾例. 11 P 塞立酿 420 多孔質 二氧舰 a 1 1. 25 不定形 15 4. 0 1.3 4 2151 10.0 寅彘例 12 q 塞立酿 430 多孔* 二氧化较 4,1 1. 25 不定形 15 9. 7 2.4 4 2138 10.5 寅旃例 13 r ,亞 純質 二氣化砂, 6. Ξ 1. 25 不定形 15 10, 3 1.7 4 2131 10.8 實施例 14 r 豐化V e. s 1. 25 不定鉍 15 9. 2 1.5 4 2130 10.9 棚例 15 q 塞鎌亞 多孔質 二氣化砍. 4. 1 1. 25 不定形 15 4_ 3 1.0 4 2118 11.4 實施例 16 r 塞賴亞 多孔質 二氧化砂 6. 2 1, 25 不定形 15 6.6 1.1 4 2103 12.0 (t/ d比與正面亮度的關係) 由將「塞立西亞42 0」使用於多孔質二氧化矽時(擴散層 用塗料(P))的表2所示的結果,將膜厚/平均粒徑(t/d)與 正面亮度的關係顯示於第6圖。如由圖可明白,得知在t/ d爲1.3〜2.1的範圍,可維持較高的正面亮度。另一方面, t/ d爲1.3以下、及2.1以上,則正面亮度有降低的傾向。 得知特別是t/ d爲1 .3以下時,正面亮度的降低較大。再 -51- 201022711 者,超過上述範圍時的正面亮度降低’係使用的多孔質粒 子的體積平均粒徑越大則越大。另一方面,體積平均粒徑 爲3.Ιμιη以下時,形成於光擴散層表面的凹凸較小,正面 亮度提高,並且t/d超過上述範圍時的降低幅度也較小。 如由表2得知,實施例7、8、9、10雖然顯示較高的正 面亮度,但特別是在實施例7和9達成光擴散層的薄膜化 之點上更佳。要使波形條紋抑制薄膜的光擴散層厚充分變 薄,並且同時實現較高的正面亮度與波形條紋的抑制,光 Ο 擴散層的膜厚(υμιη與前述多孔質粒子的體積平均粒徑 (&lt;1)μιη之比率t/ d爲1.3以上較佳。在實施例15、實施例 16方面,雖然擴散層的薄膜化與波形條紋的抑制可充分達 成,但對於多孔質粒子的體積平均粒徑,不能充分取得光 擴散層的膜厚,在較高的正面亮度之點上,未必就足夠。 再者,藉由實施例13、14與其他實施例之比較得知,多 孔質粒子的體積平均粒徑爲2〜6μπι,則難以在光擴散層表 面產生添加多孔質粒子的凹凸,並且難以產生大幅離開正 ¥ 面方向的散射,故可獲得更高的正面亮度。由實施例7、8 得知,在高度保持正面亮度之點上,體積平均粒徑爲2.0 〜3.1 μπι,則更佳。使用體積平均粒子直徑較大的多孔質粒 子作爲擴散材料時,若要使光擴散層薄膜化,則對於多孔 質粒子的體積平均粒徑,不能充分取得光擴散層的膜厚, 故不能獲得較高的正面亮度,而即使t/d在於1.3〜2.1的 範圍’光擴散層厚也會變厚,正面亮度也有降低的傾向。 此外’若光擴散層的膜厚(ί)μιη與前述多孔質粒子的體積平 -52- 201022711 均粒徑(ά)μιη之比率t/ d超過2.1,則正面亮度顯示降低的 傾向由第6圖亦可明白,特別是在體積平均粒徑超過3.5μιη 的多孔質粒子方面,光擴散層膜厚本身也會變厚,所以波 形條紋抑制薄膜的膜厚增加,有助於背光單元全體的薄型 化容易成爲困難。在實施例12方面,相較於多孔質粒子的 體積平均粒徑(d),光擴散層的膜厚⑴變厚,t/d超過2.1, 所以正面亮度開始變低。另一方面,在實施例11方面,t / d較低,爲1 .3,所以正面亮度開始降低。 【圖式簡單說明】 第1圖係顯示液晶顯示裝置的一般結構之一例的分解圖。 第2圖係顯示配置稜鏡片之非稜鏡面於導光板之出射面 側的背光單元之結構的立體圖。 第3圖係顯示來自第2圖所示之背光單元的光源之光路 —部分的槪念圖。 第4圖係顯示配置稜鏡片之稜鏡面於導光板之出射面側 的背光單元之結構與來自光源之光路一部分的槪念圖。 第5圖係顯示具有本發明之波形條紋抑制薄膜的背光單 元之結構的立體圖。 第6圖係在具有使用本發明之波形條紋抑制薄膜的背光 單元之液晶顯示裝置方面,使波形條紋抑制薄膜的光擴散 層之膜厚(Ομιη與多孔質粒子的體積平均粒徑(ίΐ)μιη之比率 t/d變化時的正面亮度變化的狀況之圖。 【主要元件符號說明】 1 液晶模組 -53- 201022711 Ο ❹ 2 背光單元 3 光源 4 反射薄膜 5 導光板 6 反射片 7 光擴散薄膜(下擴散薄膜) 8 稜鏡片 9 光擴散薄膜(上擴散薄膜) 12 先前一般的背光單元 1 3、23 光源 1 5、25 導光板 17 光擴散薄膜(下擴散薄膜) 18 先前一般的稜鏡片 19 基體 20 稜鏡列 22 具有朝向導光板之出射面 3 0 3 1 32 33 34 35 36 的稜鏡片之背光單元 朝向導光板之出射面側而配置有稜鏡列的稜鏡片 基材 稜鏡列 稜鏡片的光擴散層 透光性基體 光擴散層 本發明之波形條紋抑制薄膜 •54-Cyclohexanone 72 parts by mass of porous cerium oxide "Selicia 420" 27 parts by mass [average pore diameter: 17 nm, pore volume: 1.25 ml/g, volume average particle diameter (according to laser method): 3.1 Pm, manufactured by Fuji Silesia Chemical Co., Ltd.] Acrylic resin solution "Arkidike WDU - 93 8" 300 parts by mass [50% solid content, hydroxyhydrazine 50 of solid content, manufactured by Dainippon Ink Chemical Industry Co., Ltd.) Antistatic agent "Noposta SNA-2" 2 parts by mass -47- 201022711 [Imidazoline type cationic antistatic agent, Sanoppoco public polyisocyanate solution "Cronette HL" [solid content 75% In the HDI system, the solid content is 17%, and it is made by Japan Polyurethane Co., Ltd.. When the above is stirred and mixed with a dispersing mixer to obtain a diffusion layer, the amount of porous ceria particles added is relative to the resin. The body composition is 15% (mass ratio). <<Preparation Step of Coating for Diffusion Layer (q)>> Toluene Cyclohexanone Indefinite Shape Porous Ceria "Sessia 430" [Average pore diameter: 17 nm, pore volume: 1.25 ml / volume average particle diameter ( According to the laser method): 4·1 μιη, made by Fuji Xi Lisi] Acrylic resin solution "Arkidike WDU-938" Charge inhibitor "Nop Costa De SNA-2" Polyisocyanate solution "Crone In the case of obtaining a diffusion layer, the amount of the porous cerium oxide particles added is 15% by mass based on the resin component. The preparation step of the coating material for the diffusion layer (r) Toluene cyclohexanone indefinite shape porous ceria "Selicia 440" system] 40 parts by mass of NCO content coating (P). 250 parts by mass of the binder, 72 parts by mass, 27 parts by mass, g, 30 parts by mass, 2 parts by mass, 40 parts by mass of the coating material (q) β, 250 parts by mass of the binder, 72 parts by mass, 27 parts by mass - 48 - 201022711 [Average pore diameter: 17 nm, pore volume: 1.25 ml/g, volume average particle diameter (according to laser method): 6·2 μm, manufactured by Fuji Siricia Chemical Co., Ltd.) Acrylic resin solution "Acre Dick WDU- 938" 300 parts by mass of antistatic agent "Noposta SNA-2" 2 parts by mass of polyisocyanate solution "Cronette HL" 40 parts by mass. The above is stirred and mixed with a dispersing mixer to obtain a diffusion layer. Coating (〇. In this case, the amount of the porous cerium oxide particles added is 15% by mass relative to the solid content of the resin binder. (Examples 7 to 16) "Coating, drying, and hardening of the substrate" Step: As a substrate, a polyethylene terephthalate (PET) film having a thickness of 38 μm was used, and the coating material for diffusion layer (P) was applied to the substrate at a dry film thickness of 5.8 μm and 9.8 μm. On the surface, The dried coating film obtained by the hot air drying to obtain the diffusion layer was the same as Examples 7 and 8. Similarly, the coating material for the diffusion layer (q) was applied in a square shape of a dry film thickness of 6.0 μm and 8.2 μm. The dry coating film obtained by the hot air drying to obtain the diffusion layer is the same as Examples 9 and 10. In the same manner, any of the coating materials for the diffusion layer (q) to (Γ) has a dry film thickness of 4.0 to 10.3 μm. The coating method was applied to a dry coating film which was dried by hot air to obtain a diffusion layer, and Examples 11 to 16 (see Table 2 for the correspondence between the coating material for the diffusion layer and the coating film thickness) were used. The curing reaction was carried out for 48 hours in a 40 ° C constant temperature chamber. In the examples and comparative examples, each of the wavy stripe-preventing films prepared by using a light-diffusion layer containing various diffusion-49-201022711 particles was used as described later. Adjusting the film thickness (t) and diffusion of the light diffusion layer by adjusting the content of the diffusion particles by evaluating the wave stripe suppression effect of 値4 with M waveform streaks and adjusting the front surface brightness as much as possible. The ratio of the volume average particle diameter (d) of the sub-particles (t/d) is produced by the manufacturer. "Production step of the ruthenium sheet" A PET film having a thickness of 38 or 25 μm is used, and the ultraviolet curable resin is composed on one side of the substrate. The material is heated to about 80 ° C to lower the viscosity, and is applied by a die coating method to a thickness of 30 μm. The ultraviolet curable resin composition is used with the United States RC27-9 60 (unsaturated polyester, acrylate). a mixture of a monomer and a photoinitiator, manufactured by DIC Corporation.) Next, a flat mold having a ruthenium pitch of 12.4 μm, a 稜鏡 height: ΙΟμηη, and a vertex angle of 64 degrees is formed and formed The substrates of the uncured resin layer were collectively heated at 110 ° C for 2 minutes. Thereafter, the uncured resin layer on the substrate is laminated on the surface of the mold, and the substrate is lightly pressed from the back surface of the substrate, and then ultraviolet rays are irradiated from the back side of the substrate to cure and fix the uncured resin. The ultraviolet lamp uses a high-pressure mercury lamp, and the irradiation energy is 600 mJ in total. The laminate of the mold, the resin, and the substrate is cooled to near room temperature, and the substrate is peeled off from the mold, and as a result, a predetermined crucible is formed on the surface of the substrate. The ruthenium sheet thus produced is used as a substrate, and the diffusion coating material is applied and dried so as to have a predetermined film thickness on the side opposite to the ruthenium surface, whereby wavy stripe suppression corresponding to Examples 7 to 16 can be produced. The picture of the function. The optical stripe suppression film and the ruthenium sheet thus produced were evaluated in the same manner as in Examples 1 to 7 and Comparative Examples 1 to 6, and various optical characteristics were evaluated. -50-201022711 In the wavy stripe suppressing film of the present invention, the thinness of the film can be sufficiently achieved without lowering the front luminance of the display unit of the backlight unit or the liquid crystal display device, thereby preventing the generation of wavy stripes, but the front luminance Increasing the waveform fringe reduction with the backlight unit or the liquid crystal display device is that the trade-off relationship does not change. In the following embodiments, the waveform fringe evaluation 状态 of the state in which the waveform stripe hardly occurs is 4 or more, so the level which is practically no problem is set to 4 or more, and when the evaluation of the waveform fringe is 4, a higher level is achieved. Frontal brightness, the evaluation results are shown in Table 2 (Table 2) 坛 ff ff ff 钡 钡 扩散 扩散 扩散 扩散 mM mM mM mM mM mM mM mM 用 用 用 用 用 用 用 RK RK RK RK RK RK RK RK RK RK RK RK RK RK RK RK RK RK RK RK RK RK Mpm (jt/m) pores (ml/g) shape average puller diameter waveform mt gryphon front (cd/m2) brightness drop m (·/.) Example 7 P Celesia 420 porous silica sand a 1 1. 25 Amorphous 15 5. 8 1.9 4 2183 8.7 Suitable for example 8 P Selicia 420 Porous gasification chopping 3. 1 1. 25 Amorphous 15 9.8 3.2 4 2170 9.2 Lion case 9 q Stuffed 430 Porous Dioxide More than 4. 1 1, 25 Unshaped 15 6. Ο 1.5 4 2176 9.0 10 P 430 Porous Silica: 4, 1 1. 25 Unshaped 15 8. 2 2.0 4 2164 9.4 . Example 11 Peri 420 porous dioxane a 1 1. 25 amorphous 15 4. 0 1.3 4 2151 10.0 1212 q 塞立酿430 Hole * Dioxide is more than 4,1 1. 25 Unshaped 15 9. 7 2.4 4 2138 10.5 Example 13 r , Meromorphic gasified sand, 6. Ξ 1. 25 Unshaped 15 10, 3 1.7 4 2131 10.8 Example 14 r abundance V e. s 1. 25 indefinite 铋 15 9. 2 1.5 4 2130 10.9 shed example 15 q 镰 镰 多孔 porous two gasification chopping. 4. 1 1. 25 amorphous 15 4_ 3 1.0 4 2118 11.4 Example 16 r Seleia porous silica sand 6. 2 1, 25 Amorphous 15 6.6 1.1 4 2103 12.0 (t/d ratio to frontal brightness) Used by "Serexia 42 0" The relationship between the film thickness/average particle diameter (t/d) and the front luminance is shown in Fig. 6 as a result of the porous cerium oxide (diffusion layer coating material (P)). As can be understood from the figure, it is found that a high front luminance can be maintained in the range of t/d of 1.3 to 2.1. On the other hand, when t/d is 1.3 or less and 2.1 or more, the front luminance tends to be lowered. It was found that especially when t/d was 1.3 or less, the decrease in front luminance was large. Further, in the case of -51 to 201022711, the decrease in the front luminance when the above range is exceeded is larger as the volume average particle diameter of the porous particles used is larger. On the other hand, when the volume average particle diameter is 3. Ιμηη or less, the unevenness formed on the surface of the light-diffusing layer is small, the front luminance is improved, and the reduction width when t/d exceeds the above range is also small. As is apparent from Table 2, Examples 7, 8, 9, and 10 showed higher positive brightness, but were particularly preferable in the case where the thinning of the light diffusion layer was achieved in Examples 7 and 9. The film thickness of the pupil diffusion layer (υμιη and the volume average particle diameter of the foregoing porous particles (&lt;&lt;&gt;&gt;&lt;&gt;&gt; 1) The ratio t/d of μιη is preferably 1.3 or more. In the case of Example 15 and Example 16, although the thinning of the diffusion layer and the suppression of the wavy stripes are sufficiently achieved, the volume average particle diameter of the porous particles is sufficient. The film thickness of the light diffusion layer cannot be sufficiently obtained, and it is not necessarily sufficient at a point of high front luminance. Further, by comparison of Examples 13 and 14 with other examples, the volume average of the porous particles is obtained. When the particle diameter is 2 to 6 μm, it is difficult to produce irregularities in which porous particles are added to the surface of the light-diffusing layer, and it is difficult to cause scattering with a large distance from the surface of the positive surface, so that higher front luminance can be obtained. Examples 7 and 8 are obtained. It is understood that the volume average particle diameter is 2.0 to 3.1 μπι at a point where the front brightness is maintained at a high height. When a porous particle having a large volume average particle diameter is used as a diffusion material, When the light-diffusing layer is formed into a thin film, the film thickness of the light-diffusing layer cannot be sufficiently obtained for the volume average particle diameter of the porous particles, so that a high front luminance cannot be obtained, and even if t/d is in the range of 1.3 to 2.1 The thickness of the diffusion layer also becomes thicker, and the front luminance tends to decrease. Further, 'if the film thickness of the light diffusion layer (μ) μη is equal to the volume of the porous particles described above - 52 - 201022711, the ratio of the average particle diameter (ά) μιη When /d exceeds 2.1, the tendency of the front luminance to decrease is also understood from Fig. 6. Especially in the case of porous particles having a volume average particle diameter of more than 3.5 μm, the film thickness of the light diffusion layer itself becomes thick, so the wavy stripes It is difficult to reduce the thickness of the entire backlight unit, and it is difficult to reduce the thickness of the entire backlight unit. In the case of Example 12, the film thickness (1) of the light diffusion layer becomes thicker than the volume average particle diameter (d) of the porous particles. When t/d exceeds 2.1, the front luminance starts to become low. On the other hand, in the case of the eleventh embodiment, t / d is low and is 1.3, so the front luminance starts to decrease. [Simple description of the drawing] Fig. 1 Display liquid crystal display An exploded view of an example of a general configuration of the device. Fig. 2 is a perspective view showing a configuration of a backlight unit on the side of the exit surface of the light guide plate on which the cymbal is disposed. Fig. 3 is a view showing the backlight from Fig. 2 The light path of the light source of the unit - a part of the memory diagram. Fig. 4 is a view showing the structure of the backlight unit on the exit surface side of the light guide plate and the part of the light path from the light source. A perspective view showing a structure of a backlight unit having a wavy stripe suppressing film of the present invention. Fig. 6 is a view showing a light diffusing layer of a wavy stripe suppressing film in a liquid crystal display device having a backlight unit using the wavy stripe suppressing film of the present invention. A graph showing the change in the front side luminance when the ratio t/d of the film thickness (the volume average particle diameter (μΐ) μιη of the porous particles is changed. [Main component symbol description] 1 LCD module-53- 201022711 Ο ❹ 2 Backlight unit 3 Light source 4 Reflective film 5 Light guide plate 6 Reflecting sheet 7 Light diffusing film (lower diffusing film) 8 Septum 9 Light diffusing film (upper diffusing film) 12 Previously general backlight unit 1 3, 23 Light source 1 5, 25 Light guide plate 17 Light diffusing film (lower diffusing film) 18 Previously conventional cymbal 19 Base 20 Array 22 has an exit surface 3 0 3 toward the light guide plate 1 32 33 34 35 36 The backlight unit of the cymbal of the cymbal is disposed toward the exit surface side of the light guide plate, and the ruthenium substrate of the cymbal array is arranged. The light diffusion layer of the ruthenium substrate is transparent. The light diffusion layer of the present invention is a waveform of the present invention. Stripe suppression film • 54-

Claims (1)

201022711 七、申請專利範圍: 1· 一種波形條紋抑制薄膜,其特徵在於:其係配置於朝向 稜鏡面而配置於背光單元的導光板之出射面的稜鏡片 之出射面側的波形條紋抑制薄膜,並且於透光性基體一 方之面上具有含有樹脂黏合劑與多孔質粒子的光擴散 層,前述多孔質粒子的細孔容積爲1.00〜2.00ml/ g, 多孔質粒子的含有量相對於樹脂黏合劑的固體成分100 質量份爲30質量份以下。 © 2.如申請專利範圍第1項之波形條.紋抑制薄膜,其中該多 孔質粒子爲不定形。 3. 如申請專利範圍第1或2項之波形條紋抑制薄膜,其中 該多孔質粒子爲多孔質二氧化矽。 4. 如申請專利範圍第1或2項之波形條紋抑制薄膜,其中 該多孔質粒子的細孔容積爲1.8ml/ g以下。 5 .如申請專利範圍第1或2項之波形條紋抑制薄膜,其中 該光擴散層之膜厚(ί)μιη與該多孔質粒子之體積平均粒 ❹ 徑(&lt;1)μιη的比率t/ d爲1.3以上。 6.如申請專利範圍第1或2項之波形條紋抑制薄膜,其中 該多孔質粒子之體積平均粒徑爲2μιη〜6μιη。 7 .如申請專利範圍第1或2項之波形條紋抑制薄膜,其中 該光擴散層之膜厚(ί)μπι與該多孔質粒子之體積平均粒 徑(&lt;1)μηι的比率t/ d爲2.1以下。 8.如申請專利範圍第1或2項之波形條紋抑制薄膜,其中 該多孔質粒子之體積平均粒徑爲2〜3.1 μηι。 -55- 201022711 9.如申請專利範圍第1或2項之波形條紋抑制薄膜,其中 該光擴散層之膜厚爲8 μιη以下。 1 0.如申請專利範圍第1或2項之波形條紋抑制薄膜,其中 該波形條紋抑制薄膜之全厚爲20μιη〜3 00μιη。 11·—種附有波形條紋抑制功能之稜鏡片,其特徵在於:其 係形成有夾著如申請專利範圍第1或2項之波形條紋抑 制薄膜之透光性基體,而在相反側具有互相平行之稜角 的稜鏡形狀。 ® 12.—種背光單元,其特徵在於:其係具有如申請專利範圍 第1或2項之波形條紋抑制薄膜。 13. —種背光單元,其特徵在於:其係具有配置於導光板與 導光板之至少一側端面側的光源、及在該導光板之一側 出射面具有如申請專利範圍第11項之附有波形條紋抑 制功能之稜鏡片。 14. 一種液晶顯示裝置,其特徵在於:其係具有如申請專利 範圍第13項之背光單元。 ❹ -56-201022711 VII. Patent application scope: 1. A wavy stripe suppressing film which is disposed on a side of an exit surface of a ruthenium which is disposed on an exit surface of a light guide plate of a backlight unit toward a ruthenium surface, Further, the surface of the light-transmitting substrate has a light-diffusing layer containing a resin binder and a porous particle, and the pore volume of the porous particle is 1.00 to 2.00 ml/g, and the content of the porous particle is bonded to the resin. The solid content of the agent is 100 parts by mass or less. © 2. The corrugated stripe pattern of claim 1, wherein the porous plasmid is amorphous. 3. The wavy stripe suppressing film according to claim 1 or 2, wherein the porous particle is porous ceria. 4. The wavy stripe suppressing film according to claim 1 or 2, wherein the porous particle has a pore volume of 1.8 ml/g or less. 5. The wavy stripe suppressing film according to claim 1 or 2, wherein a ratio of a film thickness of the light diffusing layer to a volume average particle diameter (&lt;1) μιη of the porous particle t/ d is 1.3 or more. 6. The wavy stripe-suppressing film according to claim 1 or 2, wherein the porous particles have a volume average particle diameter of from 2 μm to 6 μm. 7. The wavy stripe suppressing film according to claim 1 or 2, wherein a ratio of a film thickness of the light diffusing layer to a volume average particle diameter (&lt;1) μηι of the porous particle t/d It is 2.1 or less. 8. The wavy stripe suppressing film according to claim 1 or 2, wherein the porous particles have a volume average particle diameter of 2 to 3.1 μη. The wave stripe suppression film according to claim 1 or 2, wherein the light diffusion layer has a film thickness of 8 μm or less. A corrugated stripe suppressing film according to claim 1 or 2, wherein the full thickness of the stripe suppressing film is 20 μm to 300 μm. 11. A ruthenium sheet having a wavy stripe suppressing function, characterized in that it is formed with a light-transmitting substrate sandwiching a wavy stripe suppressing film according to claim 1 or 2, and having mutually opposite sides on the opposite side. The shape of the parallel corners. ® 12. A backlight unit characterized by having a wavy stripe suppressing film as claimed in claim 1 or 2. 13. A backlight unit characterized in that it has a light source disposed on at least one end surface side of the light guide plate and the light guide plate, and an exit surface on one side of the light guide plate has an attachment as in claim 11 A chip with a waveform stripe suppression function. A liquid crystal display device characterized by having a backlight unit as in claim 13 of the patent application. ❹ -56-
TW098130199A 2008-09-09 2009-09-08 Moire strip inhibiting film, prism sheet with moire strip inhibiting function, backlight unit and liquid crystal display device using the same TW201022711A (en)

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