TW201027094A - Array test apparatus and method of measuring position of point on substrate thereof - Google Patents
Array test apparatus and method of measuring position of point on substrate thereof Download PDFInfo
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
- G01R31/311—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
- G01R31/2879—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to electrical aspects, e.g. to voltage or current supply or stimuli or to electrical loads
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- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
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- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2825—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere in household appliances or professional audio/video equipment
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Abstract
Description
201027094 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種陣列檢測裝置,特別係關於一種陣 列檢測襄置’其能透過相機的使用以偵測形成於一基板上 之電極的電性缺陷。本發明亦關於陣列檢測裝置之基板的 一種定點位置測量方法。 ❹ 【先前技術】 光電裝置為一種藉由接收電能以發射光線之裝置,其 包括液晶顯示器(liquid crystal display,LCD )以及電漿顯 示器(plasma display panel,PDP )等。 此種光電裝置通常包含具有一電極之一基板。舉例而 & ’薄膜電晶體液晶顯示器(thin film transistor LCD, TFT-LCD)包含一薄膜液晶體基板、一彩色滤光基板、液 晶以及一背光單元。彩色濾光基板面對薄膜液晶體基板設 參 置,且包含一彩色濾光板以及一共用電極。液晶則設置於 薄膜液晶體基板以及彩色濾光基板之間。 藉由使用陣列檢測裝置可檢測出形成於基板上之電 極的缺陷。陣·列檢測裝置包含至少一調變單元。調變單元 至少可在一方向上移動,以偵測缺陷電極,且調變單元包 含一調變元件以及一相機。 調變元件包含一調變電極以及一材料性質可變部。調 變電極可相對於基板之電極形成一電場,而材料性質可變 部之材料性質會隨電場強度發生變化。調變元件先於基板 201027094 之一預設部位上實施陣列檢測,之後再移至次一檢測部仅 重複實施陣列檢測。 相機相對於基板設置,且調變元件設置於兩者之間, 俾使相機可對調變元件及基板進行拍攝。由於材料性質可 變部之材料性質會依據電場而變化,當一晝素中具有一缺 陷電極且為相機之一畫素拍攝到時,具有缺陷電極之晝素 會顯示出與相機之其他晝素的差異。因此,根據相機之晝 素座標可得知缺陷電極之所在位置。 然而,由於相機必須設置於各個調變單元上,因而限 制了相機之梘野大小》 特別在顯示裝置之尺寸逐漸增加的情況下,為了能快 速偵測顯示裝置之基板上的缺陷電極,如何使陣列檢測裝 置具有較大視野之相機已成為一項重要課題,但目前仍 未有配備此種相機之陣列檢測裝置。 此外,使用較大視野之相機亦會造成大量電力消粍, 增加陣列檢測裝置之製造成本。 【發明内容】 有鑑於上述課題,本發明之目的為提供一種陣列撿測 裝置:其包含一相機。陣列檢測裝置用以在每次操作時斜 =顯不裳置之—區域進行拍攝,且相機之視野可隨顯示裝 之尺寸調整’因而得以減少此陣列顯示裝置所需之 電力以及生產成本。 動 本發明另提供-種定,純㈣量方法,此定點位於陣 201027094 列7農置之基板上,並且在此陣列檢測裝 之缺陷電極的所在位置能精確且快速測得。土板 為達上述目的,依據本發 含-檢測部、一檢測模組以及―:;種陣:檢測裝置,包 基板^檢測模組設置於陣列檢測裝置上並至少 可水平移動,且檢測模組包含至少_調 置於檢測部上之基板之以偵•又 元之一傳送途徑並柏鄰於調變單元置^件對應於調變單 且包含一基準位置標記及至少部橫向延伸’ 包含-相機組件,其包含一置標記。調變單元 基準相機拍攝基準位评^且/至少—相鄰相機, 記。 置“且相鄰相機拍攝相鄰位置標 ^據本發明之—種基板之定點位置測量, 3 =構:陣列檢測裝置之相機組件而實施AS 位置測I方法之步驟包含根據基準相機之—基準 得相鄰相機之-晝素座標,且相鄭相機是在一第一轴向之 正方向上與基準相財__距離;根據基板之—預設基準 ;以及將"'晝素座標與根據預設基 目加’其中畫素座標是根據基準 旦素所取侍,且用以拍攝基板之一定點。 與習知技術相較,依據本發明之陣列檢測展置,由於 能同時使用複數相機拍攝基板影像’故可在每次操作中拍 攝基板之大面積區域’進而減少驅動整組相機組件所需之 驅動電壓以及相機組件之生產成本。 201027094 此外,依據本發明之定點位置測量方法,可根據基板 之一預設定點,而不需要於相鄰相機之一預設晝素上實施 缺陷檢測,因此,可減少因檢測所產生之誤差,且精確取 得相鄰相機之預設晝素位置。 以下將揭露本發明之較佳實施例並結合圖示,詳細說 明本發明之其他性質,俾使本技術領域中具通常知識者得 以清楚瞭解。 【實施方式】 @ 以下將參照相關圖式,說明依據本發明較佳實施例之 陣列檢測裝置及其基板之定點位置測量方法。 圖1為依據本發明較佳實施例之陣列檢測裝置的示意 圖。陣列檢測裳置ίο代表用以檢測一基板2上之電極之 電性缺陷的設備。基板2可為一面板,一般用於一平面顯 示器’例如薄膜電晶體液晶顯示器之薄膜液晶體面板。 陣列檢測裝置10包含一拾制掇如 檢測模組50、一檢測部30以 及一位置指示件200。陣列格、、目丨腚 ⑩ 干夕』檢測裝置1〇更包含一裝載部 20以及一卸載部40。 裝載部20包含至少二裝萤拓 展戰板22。裝載板22彼此平行 設置但保持一定間隔距離,!^ *拷· 以支撐待檢測之基板2。基板 2由一光學吸盤70向檢测部3〇之方向運送。 檢測部30設置於裝栽邱+ t t 戰邻20之—側。沿裝載板22運 送之基板2設置於檢測部3〇 r·,,、,& , a 1川上’以進行電性缺陷之檢測。 檢測部30包含一檢測平台^ ^ 32及一電壓應用部38。檢測平 8 201027094 台32可提供基板2設置於上 一電壓至基板2之電極。 而電麗應用部38用以提供 檢測模組50設置於檢測部30之上侧、下侧或 下侧,則貞測設置於檢測平台32上之基板2之缺陷電極。 檢測模組50包含至少一調變單元1〇〇。 調變單元⑽設置於檢測模組5〇上,使得調變單元 100可與至少一軸向平行移動,且調變單元1〇〇包含—固201027094 VI. Description of the Invention: [Technical Field] The present invention relates to an array detecting device, and more particularly to an array detecting device capable of detecting the electrical properties of an electrode formed on a substrate through use of a camera defect. The present invention also relates to a fixed point position measuring method for a substrate of an array detecting device. ❹ [Prior Art] A photovoltaic device is a device that emits light by receiving electric energy, and includes a liquid crystal display (LCD) and a plasma display panel (PDP). Such optoelectronic devices typically comprise a substrate having an electrode. For example, a thin film transistor (TFT-LCD) includes a thin film liquid crystal substrate, a color filter substrate, a liquid crystal, and a backlight unit. The color filter substrate is disposed facing the thin film liquid crystal substrate and includes a color filter and a common electrode. The liquid crystal is disposed between the thin film liquid crystal substrate and the color filter substrate. Defects of the electrodes formed on the substrate can be detected by using the array detecting device. The array column detection device includes at least one modulation unit. The modulation unit can move at least in one direction to detect the defective electrode, and the modulation unit includes a modulation component and a camera. The modulation element includes a modulation electrode and a material property variable portion. The modulating electrode can form an electric field with respect to the electrodes of the substrate, and the material properties of the variable portion of the material property vary with the electric field strength. The modulating component performs array detection on one of the preset portions of the substrate 201027094, and then moves to the next detecting portion to repeat the array detection only. The camera is disposed relative to the substrate, and the modulation component is disposed between the two, so that the camera can capture the modulation component and the substrate. Since the material properties of the variable portion of the material property vary depending on the electric field, when a pixel has a defective electrode and is photographed by one of the pixels of the camera, the pixel having the defective electrode will display other elements with the camera. The difference. Therefore, the position of the defective electrode can be known from the pixel coordinates of the camera. However, since the camera must be disposed on each of the modulation units, the size of the camera is limited. In particular, in the case where the size of the display device is gradually increased, in order to quickly detect the defective electrode on the substrate of the display device, how to make An array detection device having a large field of view has become an important subject, but there is still no array detection device equipped with such a camera. In addition, the use of a larger field of view camera also causes a large amount of power consumption, increasing the manufacturing cost of the array detection device. SUMMARY OF THE INVENTION In view of the above problems, it is an object of the present invention to provide an array detecting device that includes a camera. The array detecting device is used for photographing in an area where the operation is oblique, and the field of view of the camera can be adjusted with the size of the display device, thereby reducing the power and production cost required for the array display device. The present invention further provides a method of determining, pure (four) quantities, which are located on the substrate of the array of 201027094, and can accurately and quickly measure the position of the defective electrode in the array. The earth plate is used for the above purpose, according to the present invention, the detection unit, the detection module and the “: array; the detection device, the package substrate detection module is disposed on the array detection device and is at least horizontally movable, and the detection mode The group includes at least one of the substrates placed on the detecting portion to detect one of the transmission paths and the neighboring portion of the modulation unit corresponding to the modulation sheet and including a reference position mark and at least a lateral extension 'including - A camera assembly that contains a marker. Modulation unit The reference camera captures the reference position and/or at least—adjacent camera. "The adjacent camera captures the position of the adjacent position of the substrate of the present invention, and the step of performing the AS position measurement method of the camera assembly of the array detection device includes the reference based on the reference camera. The adjacent camera's - pixel coordinates, and the phase camera is in the positive direction of the first axis and the reference __ distance; according to the substrate - the default reference; and the "quote" Preset base plus 'where the pixel coordinates are taken according to the reference element and used to capture a certain point of the substrate. Compared with the prior art, the array detection display according to the present invention can simultaneously use a plurality of cameras The substrate image is captured 'so that a large area of the substrate can be taken in each operation' to reduce the driving voltage required to drive the entire camera assembly and the production cost of the camera assembly. 201027094 In addition, according to the fixed position measurement method of the present invention, According to one of the pre-set points of the substrate, it is not necessary to perform defect detection on one of the preset pixels of the adjacent camera, thereby reducing the error caused by the detection and being accurate The preferred embodiment of the present invention will be described in detail with reference to the preferred embodiments of the present invention. The following is a description of a method for measuring an array position of an array detecting device and a substrate thereof according to a preferred embodiment of the present invention with reference to the related drawings. Fig. 1 is a schematic diagram of an array detecting device according to a preferred embodiment of the present invention. The device ίο represents a device for detecting an electrical defect of an electrode on a substrate 2. The substrate 2 can be a panel, generally used for a flat panel display, such as a thin film liquid crystal panel of a thin film transistor liquid crystal display. Array detecting device 10 A detection module 50, a detecting portion 30, and a position indicating member 200 are included. The array, the head 10 detecting device 1 further includes a loading portion 20 and an unloading portion 40. The portion 20 includes at least two blasting expansion panels 22. The loading plates 22 are disposed in parallel with each other but at a certain distance, and are supported to support the base to be detected. 2. The substrate 2 is transported by an optical chuck 70 in the direction of the detecting portion 3. The detecting portion 30 is disposed on the side of the loading and unloading position 20. The substrate 2 carried along the loading plate 22 is disposed in the detecting portion 3 r·,,,&, a 1 川上' to detect electrical defects. The detecting unit 30 includes a detecting platform ^^32 and a voltage applying portion 38. The detecting flat 8 201027094 the table 32 can provide the substrate 2 to be provided The voltage is applied to the electrode of the substrate 2. The galvanic application portion 38 is configured to provide the detection module 50 on the upper side, the lower side or the lower side of the detecting portion 30, thereby detecting defects of the substrate 2 disposed on the detecting platform 32. The detection module 50 includes at least one modulation unit 1 . The modulation unit ( 10 ) is disposed on the detection module 5 , such that the modulation unit 100 can move parallel to at least one axial direction, and the modulation unit 1〇〇 Inclusion-solid
定元件110、一相機組件120以及一座標測量調變元侔 130。 Ψ 固定元件110與調變單元100連接,且可沿一支架的 水平移動,而支架60設置於橫跨檢測部3〇之一方向上。 相機組件120包含複數相機’而相機包含一基準相機 121以及至少一相鄰相機123。相機組件12〇之排列呈長 方形或正方形。在陣列檢測過程中,相機組件12〇之相機 可同時對基板2進行拍攝。由於每次拍攝之區域面積大小 會依相機組件120中相機數目之增加比例而放大,因此可 縮短檢測時間’故在本實施例中,不需要大尺寸的相機, 亦不需龐大的驅動電力。 調變元件130可拆卸地連接於固定元件no。調變元 件130包含一調變電極部以及一物理性質可變部(圖中未 示)。調變電極部相對於基板2之電極形成一電場。調變 電極部可由氧化銦錫(indium tin oxide,ΙΤΟ)或碳奈米管 (carbon nano tube,CNT)形成,且一般作為一共同電極。 物理性質可變部具有會隨電場而發生變化之光學性 201027094 質’而電場是產生於調變電極部及基板2之電極之間。物 理性質可變部可包含一高分子分散液晶(polymer dispersed liquid crystal)薄膜。高分子分散液晶薄膜設置 於調變電極部與以及基板2之電極之間,且可依據形成於 調變電極部及基板2之電極間之電場強度,產生極化作用 以改變通過本身之光的光量。 調變元件130可更包含一透光性基板。透光性基板是 由可透光之材料所形成,且具有一預設剛性。調變電極部 以及物理性質可變部可依序與透光性基板之上半部連接。 位置指示件200鄰設於調變單元100,並對應於調變 單元100之一傳送途徑自檢測部30橫向延伸,對應於基 準相機121之一基準位置標記221及對應於相鄰相機123 之至少一相鄰位置標記223形成於位置指示件200上。 在本實施例中,位置指示件200設置於檢測部30之 兩侧,使得鄰近位置指示件200之調變單元100在拍攝位 置指示件200時,同樣移至於檢測部30之兩侧。然而, 本發明並不限於此一實施例,在另一實施例中,位置指示 件200僅設置於檢測部30之一侧或設置於檢測部30之前 侧及後侧之至少其中之一。 雖然圖中未示,一背光單元設置於檢測部30之下。 背光單元發射光線照射檢測部30,且相對於調變元件130 之移動而移動。在本實施例中,位置指示件200可設置於 背光單元之一侧。在實施陣列檢測前,由於根據基準相機 121之基準晝素便可取得相鄰相機123之晝素座標,故可 201027094The component 110, a camera component 120, and a standard measurement modulation element 130 are provided. The fixing member 110 is coupled to the modulation unit 100 and movable horizontally along a holder, and the holder 60 is disposed in one of the directions across the detecting portion 3''. Camera assembly 120 includes a plurality of cameras' and the camera includes a reference camera 121 and at least one adjacent camera 123. The camera assembly 12 is arranged in a square or square shape. During the array detection process, the camera of the camera unit 12 can simultaneously photograph the substrate 2. Since the size of the area of each shot is enlarged in accordance with the increase in the number of cameras in the camera unit 120, the detection time can be shortened. Therefore, in the present embodiment, a large-sized camera is not required, and a large driving power is not required. The modulation element 130 is detachably coupled to the fixed element no. The modulation element 130 includes a modulation electrode portion and a physical property variable portion (not shown). The modulation electrode portion forms an electric field with respect to the electrode of the substrate 2. The modulating electrode portion may be formed of indium tin oxide or carbon nano tube (CNT) and is generally used as a common electrode. The physical property variable portion has an optical property that changes with an electric field. The electric field is generated between the modulation electrode portion and the electrode of the substrate 2. The physical property variable portion may comprise a polymer dispersed liquid crystal film. The polymer-dispersed liquid crystal film is disposed between the modulation electrode portion and the electrode of the substrate 2, and can generate polarization according to the electric field intensity formed between the modulation electrode portion and the electrode of the substrate 2 to change the light passing through itself. The amount of light. The modulation element 130 can further include a light transmissive substrate. The light transmissive substrate is formed of a light transmissive material and has a predetermined rigidity. The modulation electrode portion and the physical property variable portion may be sequentially connected to the upper half of the light-transmitting substrate. The position indicator 200 is disposed adjacent to the modulation unit 100 and extends laterally from the detecting portion 30 corresponding to one of the transmission units 100, corresponding to one of the reference position marks 221 of the reference camera 121 and at least corresponding to the adjacent camera 123. An adjacent position mark 223 is formed on the position indicating member 200. In the present embodiment, the position indicating members 200 are disposed on both sides of the detecting portion 30, so that the modulating unit 100 adjacent to the position indicating member 200 is also moved to both sides of the detecting portion 30 when the position indicating member 200 is photographed. However, the present invention is not limited to this embodiment. In another embodiment, the position indicator 200 is disposed only on one side of the detecting portion 30 or at least one of the front side and the rear side of the detecting portion 30. Although not shown in the drawing, a backlight unit is disposed under the detecting portion 30. The backlight unit emits the light irradiation detecting portion 30 and moves relative to the movement of the modulation element 130. In the present embodiment, the position indicating member 200 may be disposed on one side of the backlight unit. Before the array detection is performed, since the pixel coordinates of the adjacent camera 123 can be obtained according to the reference pixel of the reference camera 121, it can be 201027094
知相…*-,,. 一 -素, 右以基準相機m之基準座標處實施缺陷檢測,由於 基耗機121之基準座標是_絲2之鮮點所取得,、 因此,而後可根據基板2之基準點取得拍攝缺陷電極之金 素的座標。 | 圖2為圖1所示之相機組件之位置指示件_的放大 ❹W ”月參考圖2所不’拍攝於基準相機之視野内的基準位 置標記221是以-預設間距⑺間隔形成於位置指示件· 上’而拍攝於相鄰相機之視野内的相鄰位置標記223則是 以—預設間距G2間隔形成於位置指示件2〇〇上。、 此外,複數長度標記225形成於位置指示件2〇〇上, 且長度標記225與各基準位置標記221及相鄰位置標記 223間相距有一預設間距k。長度標記2乃可拍攝於:基 準相機及各相鄰相機之視野内。基準位置標記22ι、相二 位置標記223以及長度標記225之功能將於後詳述。 :菜時,位置 10之結構體 指示件200則向内折疊以縮小陣列檢測裝置 積0 位置指示件200之設置是使本身得以於一轉轴上旋 轉。在本實施例中,位置指示件2〇〇之設置可 測部30外側翻折,此,在拍攝過程中,位置指示件· 是處於相機之光線路徑上;而當未實施拍攝作業時,位 故待檢測之基板2 〇之外部運送。卸 卸載部設置於檢測部30之一側,由 在通過卸載部彳4’可於陣列檢測裝置10 11 201027094Knowing the phase...*-,,. 1-, the right side performs the defect detection at the reference coordinate of the reference camera m, since the reference coordinate of the base motor 121 is obtained by the fresh point of the wire 2, and thus, according to the substrate The reference point of 2 obtains the coordinates of the gold element of the defective electrode. 2 is a magnified view of the position indicator _ of the camera assembly shown in FIG. 1. The reference position mark 221 taken in the field of view of the reference camera is formed at a predetermined interval (7) at a position. The adjacent position marks 223 taken in the field of view of the adjacent cameras are formed on the position indicating member 2 at intervals of a predetermined interval G2. Further, the plurality of length marks 225 are formed at the position indication. The length mark 225 is spaced apart from the reference position mark 221 and the adjacent position mark 223 by a predetermined distance k. The length mark 2 can be taken in the field of view of the reference camera and each adjacent camera. The functions of the position mark 22i, the phase position mark 223, and the length mark 225 will be described in detail later. When the dish is used, the structure indicator 200 of the position 10 is folded inward to reduce the setting of the array detecting device 0 position indicator 200. In the present embodiment, the position indicator 2 is set to be folded outside, and during the shooting, the position indicator is in the optical line of the camera. On; and when the shooting operation is not implemented, so bit 2 of the substrate to be detected outside the conveying unloading unloading square portion provided at one side of the detecting section 30, the unloading section through the left foot 'of the array may be detecting means 41011201027094.
。卸载板 而基板2設置於卸載板之上 並於基板2呈懸浮狀態下運送 可分別形成於裝载部之裝 ,以藉由提供基板2氣壓 同樣請參考圖1所示,一 一抽吸板 70可形成於裝载部及卸載部上。 然而,陣列檢挪裝置之構型並不限於圖1所示之實施 例。依據本發明之另一實施例,基板可固定於一固定支撐 元件上,且檢測模組沿X軸及Y軸方向移動以檢測基板上 是否存在有缺陷電極。依據本發明之又一實施例,檢測模 組可在X軸方向上進行有限的移動,而基板則可在χ軸及 Y轴方向上移動。 以下將說明依據本發明之一種基板之定點位置測量 方法。定點位置檢測方法包含根據基準相機之基準晝素取 得相鄰相機之晝素座標;將根據基板之一預設基準點所取 得之一基準晝素座標與一畫素座標相加’其中,晝素座標 是根據基準晝素P1以取得,且用以拍攝基板上之一定點, 故根據基板2之基準點可取得定點座標。 在本實施例中,根據基準相機之基準晝素P1便可取 得相機組件内所有相機之晝素座標。另外’由於相機組件 内之相機皆僅具有單一視野,故相機組件可視為一單一相 機’而其所具有之視野大小相當於相機組件内所有相機之 視野的總和。 201027094 在本實施例中,若能獲得相對於基板2之基準點的美 準畫素Η座標,便可根據基板之基準點取得相機組件二 之所有相機的晝素位置。據此,本實施例可免除必須逐一 考慮各相機之位置與基板之基準點間之相對關係的問題。 圖3至圖8為陣列檢測裝置中之基板之一預設定點座 標測量方法的概念圖。為能清楚說明,本實施例是以在相 同於X軸向之第一軸向上與基準相機有一間隔之一相鄰相 ❹機進行制,然而需注意的是,以下敘述村應用於沿在 第一軸向及/或第二軸向上與基準相機相間隔之複數相鄰 相機。 請參考圖3所示,基準位置標記221是由具有視野 F121之基準相機121進行拍攝(如圖i所示),而相鄰位 置標記223是由具有視野F123之相鄰相機123進行拍攝 (如圖1所示)。因此,基準位置標記221是由基準相機 121之一基準位置標記之拍攝晝素P121進行拍攝,而相鄰 ❹位置標記223是由基準相機121之一相鄰位置標記之拍攝 晝素P123進行拍攝。在本實施例中,基準位置標記221 及相鄰位置標記223間之間距可為一預設間距。 以下請參考圖4至圖6所示,以說明根據基準相機之 基準晝素取得相鄰相機123之畫素座標之步驟。 請參考圖4所示,當相機之視野彼此相鄰且無間隔或 無重疊時,取得一基準間距L,其為基準位置標記之拍攝 晝素P121及相鄰準位置標記之拍攝晝素pi23間在第一轴 向上之距離。請再參考圖5所示,其為取得基準間距乙及 13 201027094 實際間距G1間之一差值之步驟。 詳細而言’請參考圖4所示,在取得基準間距L之步 驟中可更包含取得基準位置標記之拍攝晝素P121及一第 一末端晝素Prl間之一第一距離L1 ;取得相鄰位置標記之 拍攝晝素P123與一第二末端畫素pr2間之一第二距離 L2 ;以及將第一距離L1與第二距離L2相加,便可得到基 準間距L °其中’第一末端晝素Prl是選自於基準相機視 野F121中’位於第一轴向之正方向上的最末端晝素,而 第二末端晝素pr2是選自於相鄰相機視野F123中,位於第 一轴向之一負方向上的最末端晝素,且負方向是相對於正 方向。 請參考圖5所示’取得基準間距l及實際間距G1間 之差值,其為第一軸向上之第一偏差值Osl。因此,可判 斷基準相機之視野F121與相鄰相機之視野F123是否彼此 重疊’亦可判斷基準相機之視野F121與相鄰相機之視野 F123間彼此重疊或間隔的程度。 然而’相鄰相機亦可能在第二軸向(如圖示中所示之 Y軸向)上與基準相機121產生偏差。請參考圖6所示, 其為取得第二偏差值〇s2之步驟。第二偏差值〇s2是對應 於相鄰相機在第二軸向上與基準相機的偏差程度。 在本實施例中,在取得第二偏差值〇s2之步驟中更包 含取得相鄰位置標記之拍攝晝素P123與—第三末端晝素 Pr3間之-第三距離L3 ;取得基準位置標記之拍攝晝素 P124與一第四末端晝素pr4間之一距離以為一第四距離 201027094 及取得第三距離1^3與第四距離Μ間之差值以為第 -偏差值Os2。其中,第二末端畫素Pr3是選自於 機視野助中,赌第二轴向之正方向上之最末端晝素, 而第四末端晝素m是選自於相鄰相機視野中,位於 該第二軸向之正方向上之最末端晝素。第三距離L3與第 四距離L4間之差值是為第二偏差值〇s2。. The substrate is unloaded and the substrate 2 is disposed on the unloading plate and transported in the suspended state of the substrate 2 to be respectively formed on the loading portion, so as to provide the pressure of the substrate 2, please refer to FIG. 70 can be formed on the loading portion and the unloading portion. However, the configuration of the array detecting device is not limited to the embodiment shown in Fig. 1. According to another embodiment of the present invention, the substrate can be fixed to a fixed supporting member, and the detecting module moves in the X-axis and Y-axis directions to detect the presence or absence of a defective electrode on the substrate. According to still another embodiment of the present invention, the detecting module can perform limited movement in the X-axis direction, and the substrate can be moved in the x-axis and Y-axis directions. A method of measuring the position of a substrate according to the present invention will be described below. The fixed-point position detection method comprises: obtaining a pixel coordinate of an adjacent camera according to a reference element of the reference camera; adding a reference pixel coordinate obtained by one of the reference points of the substrate to a pixel coordinate, wherein the pixel is The coordinates are obtained based on the reference pixel P1 and are used to capture a certain point on the substrate. Therefore, the fixed point coordinates can be obtained from the reference point of the substrate 2. In this embodiment, the pixel coordinates of all the cameras in the camera assembly can be obtained based on the reference pixel P1 of the reference camera. In addition, since the cameras in the camera assembly have only a single field of view, the camera assembly can be viewed as a single camera' having a field of view equivalent to the sum of the fields of view of all cameras within the camera assembly. 201027094 In the present embodiment, if the bead pixel coordinates of the reference point with respect to the substrate 2 can be obtained, the pixel positions of all the cameras of the camera unit 2 can be obtained from the reference points of the substrate. Accordingly, the present embodiment eliminates the problem of having to consider the relative relationship between the position of each camera and the reference point of the substrate one by one. 3 to 8 are conceptual views of a method of measuring a preset point coordinate of a substrate in the array detecting device. For the sake of clarity, the present embodiment is implemented by one of the adjacent phases of the first camera in the same axial direction as the X-axis, but it should be noted that the following description applies to the village. A plurality of adjacent cameras spaced apart from the reference camera in an axial direction and/or a second axial direction. Referring to FIG. 3, the reference position mark 221 is taken by the reference camera 121 having the field of view F121 (as shown in FIG. 1), and the adjacent position mark 223 is taken by the adjacent camera 123 having the field of view F123 (eg, Figure 1). Therefore, the reference position mark 221 is taken by the photographing element P121 of one of the reference position marks of the reference camera 121, and the adjacent ❹ position mark 223 is taken by the photographing element P123 of the adjacent position mark of one of the reference cameras 121. In this embodiment, the distance between the reference position mark 221 and the adjacent position mark 223 may be a preset interval. Referring to Fig. 4 through Fig. 6, the steps of obtaining the pixel coordinates of the adjacent cameras 123 based on the reference pixels of the reference camera will be described. Referring to FIG. 4, when the fields of view of the camera are adjacent to each other with no or no overlap, a reference pitch L is obtained, which is between the photographing element P121 of the reference position mark and the photographing element pi23 of the adjacent quasi-position mark. The distance in the first axial direction. Please refer to FIG. 5 again, which is a step of obtaining a difference between the reference interval B and the actual distance G1 of 13 201027094. In detail, please refer to FIG. 4, in the step of obtaining the reference pitch L, the first distance L1 between the photographing element P121 and the first end element Prl which obtain the reference position mark may be further included; a second distance L2 between the photographing element P123 and a second end pixel pr2; and adding the first distance L1 and the second distance L2 to obtain a reference pitch L ° where the 'first end 昼The prime Prl is selected from the endmost field halogen in the positive direction of the first axial direction in the reference camera field F121, and the second terminal halogen pr2 is selected from the adjacent camera field F123 and located in the first axial direction. The most terminal element in the negative direction, and the negative direction is relative to the positive direction. Referring to Fig. 5, the difference between the reference pitch 1 and the actual pitch G1 is obtained, which is the first deviation value Os1 in the first axial direction. Therefore, it can be judged whether or not the field of view F121 of the reference camera and the field of view F123 of the adjacent camera overlap each other. It is also possible to determine the extent to which the field of view F121 of the reference camera and the field of view F123 of the adjacent camera overlap or are spaced apart from each other. However, the adjacent camera may also deviate from the reference camera 121 in the second axial direction (the Y-axis as shown in the drawing). Please refer to FIG. 6, which is the step of obtaining the second deviation value 〇s2. The second deviation value 〇 s2 corresponds to the degree of deviation of the adjacent camera from the reference camera in the second axial direction. In the embodiment, the step of obtaining the second deviation value 〇s2 further includes: obtaining a third distance L3 between the photographing element P123 and the third end element Pr3 of the adjacent position mark; and obtaining the reference position mark A distance between the pixel P124 and a fourth terminal element pr4 is taken as a fourth distance 201027094 and a difference between the third distance 1^3 and the fourth distance is obtained as the first deviation value Os2. Wherein, the second end pixel Pr3 is selected from the machine vision aid, and the last terminal element in the positive direction of the second axis is gambling, and the fourth end elemental m is selected from the field of view of the adjacent camera. The most terminal element in the positive direction of the second axis. The difference between the third distance L3 and the fourth distance L4 is the second deviation value 〇 s2.
基於上述結果,即可根據基準相機之 得相鄰相機之畫素座標。 早一素P1取 請參考圖7所示,第五末端晝素Pr5是選自於基準相 機視野F121中,位於第一軸向之正方向上之最末端畫素。 若基準晝素P1及第五末端晝素pr5間之距離為第五距離 L5,且相鄰相機之預設晝素座標為al及Μ,則根據基準 相機之基準晝素所取得之相鄰相機之預設晝素座標便會 與L5 + al - Osl以及bl - 〇s2之座標值相對應。 舉例而言’假設基準相機之視野F121與相鄰相機之 視野F123部分重疊,因两產生數值為1〇的第一偏差值以 及數值為·2的第二偏差值’而基準晝素P1與第五末端晝 素Pr5間之距離則為200。 在本實施例中,相鄰相機之預設畫素座標為50及50, 且根據基準畫素P1取得之相鄰相機123之預設畫素座標 應與200 + 50 - 10以及50 + 2之數值相對應,座標值為 240以及52。 預設畫素座標可轉換為起始自基準畫素之一實際距 離。詳細而言,將各預設晝素座標之數值乘以各晝素之單 15 201027094 位長度、,便可取得預設晝素之實際長度。 由各晝素長度以及相鄰相機之畫素長度可藉 舉例而言’若相機在-單位時間内以一 t纽移動並_—標記,便可取得相機之-位移量 Φ :他不同於上述計算的方式亦可用於取得晝素長 :相二參:圖2所示,長度標記225分別對應基準相機以 ΐ:=而形成於位置指示件之區域上,且與各基準位 施^ 及各相鄰位置標記223間有所區隔。在本實 若將對應於基準相機且介於基準位置標記221與 之—距離,除_應於基準_且介於基 之金辛 之拍攝晝素與長度標記225之拍攝晝素間 ι素數目’便可得到基準相機之實際晝素長度。 ❹ 此相晝素長度’ 標記ΘΒ 相鄰相機之基準位置標記223與長度 標記5間之距離,除以對應於相同相鄰相機之相鄰位置 數目。3之拍攝晝素與長度標記225之拍攝晝素間之畫素 所取=參考® 8 _,其騎根據基板之賊基準點P〇 之座^基準相機之基準晝素P1座標(a,b)與晝素Ρχ 所取:’ d)相加之步驟’晝素Ρχ是根據基準晝素Pi 準確地攝基板上之一定點。最後得以利用簡易且 h里出基板上之缺陷晝素的所在位置。 16 201027094 由於相鄰相機之晝素座標是根據基準畫素ρι而毁 疋因此調變疋件僅需要在相對於基準晝素之座標(a b)處實施缺陷檢測即可,至於基準晝㈣之座標 是依據基板2之基準點p〇所取得。 依據本發明之陣列檢測襄置,即使内設有大量之相鄰 相機’部僅需要在基準相機之基準晝素位置上實施缺陷檢 測,便可以取得相鄰相機之所有畫素位置,因而不必在各 相鄰=機上單獨實施缺陷檢測作業,可減少因檢測所產生 之誤差,並縮短陣列檢測所耗費的時間。 =卜,上述方法同樣可運用至一第二相 其基準相機相鄰,而是與第-相鄰相機相鄰。 ^考圖^ 斤示,其為取得形成於第一相鄰相機之視 I 記办之拍攝畫㈣23 a之座標的 步驟’以及根據基準相機之基 〜之厘^ 相鄰相機之_ F123 b 取㈣成於第二 ⑽之座標的步驟:之位置標記伽之拍攝畫素 其後,相對於第-相鄰相機之第— 取得第二相鄰相機之相鄰 置標4 223a 及以4。μ哲-旧置^己223b之偏差值Os3以 取得第一軸向上之偏差值以 一 偏差值Os4之方式可與取得 一軸向上之 式相π奧忡上迷偏差值〇sl以及Os2之方 二间。舉例而言,實際間距G 2與 差值即對應於偏差值〇s 咖7間之 機之相鄰位置標記心之拍實際^距G2代表第一相鄰相 機之相鄰位置標記223b之拍;幸-:與第二相鄰相 •a素P123__b間之距離。 201027094 其後,將相對於第一相鄰相機之第二相鄰相機之偏差 值Os3以及〇S4與相對於基準相機之第一相鄰相機之偏差 值相加,便可取得第二相鄰相機相對於基準相機之偏差值 的總和。 以上所述僅為舉例性,而非為限制性者。任何未脫離 本發明之精神與範曹,而朝 、辄可而對其進仃之等效修改或變更,均 應包含於後附之申請專利範圍中。 【圖式簡單說明】 圖;圖1為依據本發明較佳實施例之陣列檢測裝置的示意 ==所示之相機組件之位置指示件的放大圖. 方法機組件拍攝之預設定點座標:量 攝基之步驟,圖,實際間距為拍 之相鄰相機的畫二相離機的畫素與拍攝相鄰位置標記 準位I,為取侍基準間矩之步驟的示意圖,基準門距 準位置標記之拍攝全 口丞平間距為基 間之距離, J"素與拍攝相鄰位置標記之拍攝晝素 第一偏差2 = 間距與實際間距間之差值以取得 、 布意圖’ 驟的示I:取得基準相機與相鄰相機間之第二偏差值之步 18 201027094 圖7為根據基準相機之基準晝素取得相鄰相機之預設 畫素座標之步驟的示意圖, 圖8為根據基板上之基準點取得相鄰相機之預設晝素 座標之步驟的示意圖;以及 圖9為於使用複數相鄰相機時取得偏差值之步驟的示 意圖。Based on the above results, the pixel coordinates of adjacent cameras can be obtained from the reference camera. Referring to Fig. 7, the fifth terminal halogen Pr5 is the endmost pixel selected from the reference camera field F121 and located in the positive direction of the first axial direction. If the distance between the reference pixel P1 and the fifth terminal pixel pr5 is the fifth distance L5, and the preset pixel coordinates of the adjacent cameras are al and Μ, the adjacent camera obtained according to the reference camera reference element The default pixel coordinates will correspond to the coordinate values of L5 + al - Osl and bl - 〇s2. For example, it is assumed that the field of view F121 of the reference camera partially overlaps the field of view F123 of the adjacent camera, because the two first value of the value of 1 产生 and the second value of the value of '2 are used, and the reference element P1 and the The distance between the five terminal alizarins Pr5 is 200. In this embodiment, the preset pixel coordinates of adjacent cameras are 50 and 50, and the preset pixel coordinates of the adjacent camera 123 obtained according to the reference pixel P1 should be 200 + 50 - 10 and 50 + 2 The values correspond to coordinates of 240 and 52. The preset pixel coordinates can be converted to an actual distance from the start of the reference pixel. In detail, the actual length of the preset element can be obtained by multiplying the value of each preset element coordinate by the length of each element 15 201027094 bit. By the length of each element and the pixel length of the adjacent camera, for example, if the camera moves in a unit of time and moves with a t-key, the camera-displacement amount Φ can be obtained: The calculation method can also be used to obtain the length of the element: phase two parameters: as shown in Fig. 2, the length marks 225 are respectively formed on the area of the position indicator corresponding to the reference camera by ΐ:=, and are applied to each reference position. The adjacent position marks 223 are separated. In this case, if it corresponds to the reference camera and is at a distance from the reference position mark 221, the number of pixels between the photographing element and the length mark 225 of the base of the Jinxin 'You can get the actual pixel length of the reference camera. ❹ This phase length 'mark' is the distance between the reference position mark 223 and the length mark 5 of the adjacent camera, divided by the number of adjacent positions corresponding to the same adjacent camera. The photograph of the photographing element between the photographing element and the length mark 225 is taken as follows: Reference® 8 _, which rides the base of the thief based on the base plate P〇 coordinates of the base camera of the reference camera (a, b) ) and 昼素Ρχ Take: 'd) Add the step '昼素Ρχ is to accurately take a certain point on the substrate according to the reference element Pi. Finally, it is possible to take advantage of the location of the defective element on the substrate. 16 201027094 Since the pixel coordinates of adjacent cameras are smashed according to the reference pixels, the modulation component only needs to perform defect detection at coordinates (ab) relative to the reference element. As for the coordinates of the reference 四(4) It is obtained based on the reference point p of the substrate 2. According to the array detecting device of the present invention, even if a large number of adjacent cameras are provided, only the defect detection needs to be performed on the reference pixel position of the reference camera, all the pixel positions of the adjacent cameras can be obtained, and thus it is not necessary to The defect detection operation is performed separately on each adjacent machine, which can reduce the error caused by the detection and shorten the time taken for the array detection. = Bu, the above method can also be applied to a second phase whose reference camera is adjacent, but adjacent to the first adjacent camera. ^考图^ 斤示, which is the step of obtaining the coordinates of the 23a frame of the picture (4) formed by the first adjacent camera, and the basis of the reference camera ~ 123 _ F123 b (d) The step of forming the coordinates of the second (10): the position marker gamma is captured, and then the first adjacent camera is positioned 4 223a and 4 with respect to the first adjacent camera. The deviation value Os3 of μzhe-old set 223b is obtained by taking the deviation value of the first axial direction by a deviation value Os4, and the deviation value 〇sl and Os2 of the π 忡 忡 取得 取得 以及 以及between. For example, the actual spacing G 2 and the difference, that is, the position of the adjacent position mark of the machine corresponding to the deviation value 〇 咖 咖 实际 实际 实际 实际 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表 代表Fortunately -: the distance from the second adjacent phase • a prime P123__b. 201027094 Thereafter, the second adjacent camera can be obtained by adding the deviation values Os3 and 〇S4 of the second adjacent camera of the first adjacent camera to the deviation value of the first adjacent camera relative to the reference camera. The sum of the deviation values from the reference camera. The above is intended to be illustrative only and not limiting. Any equivalent modifications or alterations to the invention may be included in the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an enlarged view of a position indicator of a camera assembly shown in the schematic == of the array detecting device according to a preferred embodiment of the present invention. The steps of the camera, the actual spacing is the picture of the adjacent camera of the adjacent camera and the position of the adjacent position mark I, which is a schematic diagram of the step of taking the reference moment, the reference position of the reference door Marking the full-mouth flat spacing is the distance between the bases, J" prime and shooting the adjacent position marker shooting the first deviation of the pixel 2 = the difference between the spacing and the actual spacing to obtain, the cloth intent' : obtaining the second deviation value between the reference camera and the adjacent camera. 18 201027094 FIG. 7 is a schematic diagram of the steps of obtaining the preset pixel coordinates of the adjacent camera according to the reference camera reference standard, and FIG. 8 is based on the substrate. A schematic diagram of the steps of obtaining a preset pixel coordinate of an adjacent camera by a reference point; and FIG. 9 is a schematic diagram of a step of obtaining a deviation value when using a plurality of adjacent cameras.
【主要元件符號說明】[Main component symbol description]
10 : 陣列檢測裝置 100 :調變單元 110 :固定元件 120 :相機組件 121 :基準相機 123 :相鄰相機 130 :調變元件 2 : 基板 20 : 裝載部 200 :位置指示件 22 : 裝載板 221 :基準位置標記 223 :相鄰位置標記 225 *長度標&己 24 :氣孔 30 :檢測部 19 201027094 32 :檢測平台 38 :電壓應用部 40 :卸載部 50 :檢測模組 60 :支架 70 :光學吸盤 a、b、al、bl、c、d:座標 F121、F123、F123—a、F123_b :視野10 : Array detecting device 100 : Modulation unit 110 : Fixing element 120 : Camera unit 121 : Reference camera 123 : Adjacent camera 130 : Modulating element 2 : Substrate 20 : Loading unit 200 : Position indicating member 22 : Loading plate 221 : Reference position mark 223: adjacent position mark 225 * length mark & 24: air hole 30: detecting portion 19 201027094 32 : detecting platform 38 : voltage applying portion 40 : unloading portion 50 : detecting module 60 : bracket 70 : optical chuck a, b, al, bl, c, d: coordinates F121, F123, F123-a, F123_b: field of view
Gl、G2 :實際間距 k:預設間距 L、L6、L7 :基準間距 L1 :第一距離 L2 :第二距離 L3 :第三距離 L4 :第四距離Gl, G2: actual spacing k: preset spacing L, L6, L7: reference spacing L1: first distance L2: second distance L3: third distance L4: fourth distance
Osl :第一偏差值 0s2 :第二偏差值 0s3、Os4 :偏差值Osl: first deviation value 0s2: second deviation value 0s3, Os4: deviation value
Po :基準點 P1 :基準晝素 P121 :基準位置標記之拍攝晝素 P123 :相鄰準位置標記之拍攝晝素 P123_a、P123_b :拍攝晝素 Prl :第一末端晝素 201027094Po : Reference point P1 : Reference element P121 : Recording element of the reference position mark P123 : Shooting element of the adjacent position mark P123_a, P123_b : Filming element Prl : First end element 201027094
Pr2 :第二末端晝素 Pr3 :第三末端晝素 Pr4 :第四末端晝素 Pr5 :第五末端晝素 Px :晝素 X、Y :方向 21Pr2: second terminal halogen Pr3: third terminal halogen Pr4: fourth terminal halogen Pr5: fifth terminal halogen Px: halogen X, Y: direction 21
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| KR (1) | KR100911331B1 (en) |
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| CN103217816B (en) * | 2013-04-01 | 2016-01-20 | 深圳市华星光电技术有限公司 | The detection method of array base palte, monitor station and checkout equipment |
| CN104894510B (en) * | 2015-05-25 | 2017-06-16 | 京东方科技集团股份有限公司 | Alignment method and system for making mask integrated framework |
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| JP4884828B2 (en) * | 2006-05-01 | 2012-02-29 | 株式会社日本マイクロニクス | Processing device for display panel |
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