201002123 六、發明說明： 【發明所屬之技術領域】 本發明係關於有機電激發光顯示器（以下，亦稱作「 有機EL顯示器」）。更詳細係有關本發明之有機El顯 示器乃從有機EL元件部射出於外部的光則未經由視野角 而呈現不同的發色光之有機EL顯示器。本發明係關於如 此之有機EL顯示器之製造方法。 【先前技術】 目前，液晶顯示器及有機EL顯示器等之顯示裝置乃 作爲行動電話，個人電腦，數位影印機，及列印機等之電 子機器的顯示部而加以使用。 對於上述顯示裝置的發光形態，係有自發光型與非發 光型。自發光型係適用於電激發光元件（EL元件），場 發射顯示器（FED )，及陰極射線管（CRT )等。對此， 非發光型係使用於液晶顯示元件等。 另外’對於上述顯示裝置的彩色顯示方式，係有實現 紅、綠、藍之3原色發光的多彩方式或全彩方式。在此等 方式，多使用於發光元件的出光面與畫像面之間，使彩色 濾光片層介入存在的手段。如根據該手段，可選擇性地射 出來自發光元件的特定波長，使個3原色的發光之色純度 提昇，將畫像顯示作爲高品質。 在如上述之顯示裝置之中，特別是對於有機EL顯示 器，提案有以下的技術。 -5- 201002123 對於專利文獻1係揭示有具有有機EL材料 收在有機EL·材料部的發光，將可視光的螢光發 材料部之有機EL元件部。此元件係由具備於螢 含有螢光材料之色變換濾光片者，將在有機EL 發光’在螢光材料部吸收，將可視光域的螢光發 色變換方式者。 在專利文獻1所揭示之技術中，有機EL元 光色並不限於白色。因此，比較於以往，可將亮 機EL元件部適用於光源，例如，經由使用藍色 機EL元件部之色變換方式，可將藍色光波長變 光或紅色光者。 近年來，眾所注目如專利文獻1所揭示之有 螢光材料色素之螢光材料部高精細地作爲圖案化 用從發光體的近紫外線光可視光的波長範圍之弱 色變換方式全採顯示器。 使用於該色變換方式之色變換層（相當於螢 )係主要可根據經由光阻劑之濕處理，或經由蒸 處理加以形成。但，使用於色變換層之材料係從 低的情況，對於採用濕處理的情況，完全地使色 光阻劑乾燥者爲困難。因此，如根據濕處理，乾 的水份乃從色變換層移動於有機EL層，於有機 產生稱作暗色區域之非發光缺陷之虞。因此，積 並非由濕處理而是經由乾處理型成色變換層者， 案有以下的技術。 部，和吸 光之螢光 光材料部 材料部的 光，實現 件部的發 度高之有 發光之有 換成綠色 由將含有 情況，使 能量線之 光材料部 鍍法之乾 耐熱性爲 變換層與 燥後殘留 EL層有 極地進行 例如，提 -6 - 201002123 對於專利文獻2係揭示有於基板上，具有彩色濾光片 層，螢光變換層（相當於色變換層），阻障層’電洞植入 電極，電子植入電極，於電極間，具有有關發光機能之有 機層，彩色濾光片層乃經由蒸鍍法而加以形成之有機EL 顯示裝置。在專利文獻2中，不只是彩色濾光片層，色變 換層亦由蒸鍍法（乾處理）而形成。此係因色變換層乃對 於水份弱，並控制上述暗色區域的產生者爲佳。在此，色 變換層由乾處理形成時，對於將成爲色變換層之基底的彩 色濾光片層或平坦化層，經由濕處理形成之情況，以高溫 完全地使此等乾燥之後，形成色變換層者爲佳。 在經由如此之乾處理之色變換層的形成，係可將色變 換層，於平坦化層的上方，對應於紅、綠、及藍的各副畫 素而選擇性地加以形成。從平坦化層及玻璃基板的折射率 乃對於約1 . 5而言，色變換層的折射率乃約2之情況，形 成色變換層的副畫素係比較於未形成色變換層之副畫素， 光的指向性爲低。例如，對於只於紅色的副畫素形成色變 換層之情況，對於綠色的副畫素及藍色的副畫素而言，紅 色的副畫素係光的指向性變低。 另外，對於複數種類形成色變換層之情況，因在各色 的色變換層間之折射率不同之故，在形成色變換層之副畫 素之間，亦產生關於光的指向性之差異。例如，對於於紅 色的副畫素及綠色的副畫素形成色變換層之情況，對於此 等副畫素間，一產生關於光的指向性之差異。 經由此等理由，對於從顯示器所射出之紅，綠，藍各 201002123 光，有產生各不同之指向性的可能性，經由對於顯示器之 視野角，係有畫面的發光色產生不同之虞。 然而，對於使來自副畫素的光取出量增大，係減少平 坦化層及/或玻璃基板的折射率之情況則爲重要。但，對 於減少平坦化層之折射率之情況，平坦化層等與色變換層 之間的折射率的差則變大。因此，在形成色變換層的副畫 素與未形成色變換層的副畫素之間，光的指向性的差則變 得更大，而有經由視野角，畫面之發色光則更產生不同之 虞。 有鑑於如此情事，作爲防止經由對於顯示器之視野角 的畫面發光色之變化的手段，揭示有以下的技術。 對於專利文獻3係揭示有於基板上，具有挾持於第1 電極及第2電極的發光機能層之畫素，和複數之上述畫素 所成單位畫素群；對於上述單位畫素群中被選擇之畫素， 設置散亂上述發光機能層之發光光線的散亂部之有機電激 發光裝置。 在專利文獻3所揭示之技術中，作爲只於藍色副畫素 及綠色副畫素之副畫素，設置經由凹凸之光擴散面，可防 止經由視野角之發色光的變化者。 [專利文獻1]日本特開2003-152897號公報 [專利文獻2]日本特開2001-196175號公報 [專利文獻3]日本特開2007-73219號公報 【發明內容】 201002123 [發明欲解決之課題] 但，在專利文獻3之上述凹凸係在藍色副畫素及綠色 副畫素，於相同尺寸設計下所形成之故，微調整在產生不 同光之副畫素間之光的指向性的差，無法以高的位準防止 經由視野角之發光色的變化者。 因而，檢討有對於經由視野角之發光色的變化之對策 。例如’嘗試使用於紅’綠’及藍之各色變換層之材料的 變更。但，使用於色變換層的材料變更係對於從色變換層 所射出的光的色純度及/或亮度有帶來不良影響之虞之故 ，而無法容易地進行。 因此，未進行色變換層材料的變更，而解決經由視野 角的發光色之變化者爲佳。經由視野角的發光色之變化係 如上述，因對於經由色變換層所射出的紅，綠，及藍的光 產生個不同之指向性而引起。具體而言，紅的指向性爲小 的另一方面’綠及藍的指向性爲大者則爲原因。因而，在 紅’與綠及藍之間，如可降低光的指向性的差，可解決上 述問題。 隨之’本發明之目的係提供，對於從色變換層產生的 各色光，未對於其色純度及亮度等帶來不良影響，降低在 各色的副晝素之光的指向性的差，未經由視野角而呈現不 同的發光色之有機EL顯示器。本發明之目的係提供該有 機EL顯示器之製造方法。 [爲解決課題之手段] -9- 201002123 本發明係關於具備基板、和含有平坦化層及至少一種 之色變換層的色變換濾光片部、和具有複數之發光部之有 機電激發光元件部；經由前述複數之發光部，規定複數之 副畫素的有機電激發光顯示器；於前述基板與前述平坦化 層之間，具有擁有凹凸形狀之界面，前述凹凸形狀乃於每 一前述副畫素，具有不同凹凸密度者之有機電激發光顯示 器。本發明之有機電激發光顯示器係可作爲行動電話等之 電子機器的顯示部而使用。 另外，本發明係包含貼合具備基板、以及含有平坦化 層及至少一種之色變換層的色變換濾光片部之第1之層積 體，和具備基體、以及具有複數之發光部之有機電激發光 元件部之第2之層積體，經由前述複數之發光部，規定複 數之副畫素，於前述基板與前述平坦化層之間，具有擁有 凹凸形狀之界面，前述凹凸形狀乃於每一前述副畫素，具 有不同凹凸密度之有機電激發光顯示器。 在如此之有機電激發光顯示器，於前述基板與前述平 坦化層之間，可使至少一種之彩色濾光片層介入存在者。 對於此情況，前述基板與前述彩色濾光片層之介面乃具有 凹凸形狀，前述凹凸形狀乃於每一前述副畫素，具有不同 凹凸密度。 在此等有機電激發光顯示器，可將上述凹凸形狀，作 爲至少具有一個周期，較副畫素寬度爲小之複數的凹部及 凸部的配列形狀者。另外，可將前述凹凸形狀，作爲於每 一前述副畫素’具有不同周期的形狀者。 -10- 201002123 本發明係包含：在於基板上，形成含有平坦化 少一種之色變換層的色變換瀘光片部的工程、以及 色變換濾光片部上，形成具有複數之發光部之有機 光元件部的工程；經由前述複數之發光部，規定複 畫素的有機電激發光顯不器之製造方法，於與前述 接觸之基板面上，形成凹凸形狀，將前述凹凸形狀 一前述副畫素，調整成不同凹凸密度之有機電激發 器的製造方法。 另外’本發明係在於基板上，形成含有平坦化 少一種之色變換層的色變換濾光片部，得第1之層 工程、和於基體上，形成具有複數之發光部之有機 光元件部’得第2之層積體的工程、和貼合前述第 積體與前述第2之層積體的工程；經由前述複數之 ’規定複數之副畫素的有機電激發光顯示器之製造 於與前述平坦層接觸之基板面，形成凹凸形狀，將 凸形狀’於每一前述副畫素，調整成不同凹凸密度 電激發光顯示器之製造方法。 在如此之有機電激發光顯示器之製造方法，於 板與前述平坦化層之間，可將至少一種之彩色濾光 以形成者。對於此情況，於與前述彩色濾光片層接 板面’形成凹凸形狀，將前述凹凸形狀，於每一前 素，調整成不同凹凸密度。 在此等有機電激發光顯示器，可將上述凹凸形 爲調整成至少一個周期，較副畫素寬度爲小之複數 層及至 於上述 電激發 數之副 平坦層 ，於每 光顯示 層及至 積體的 電激發 1之層 發光部 方法， 前述凹 之有機 前述基 片層加 觸之基 述副畫 狀，作 的凹部 -11 - 201002123 及凸部的配列形狀者。另外，可將前述凹凸形狀，作爲於 每一前述副畫素，調整成不同周期者。 [發明之效果] 在本發明之有機電激發光顯示器係於每一經由有機電 激發光元件部之發光部所規定之副畫素，由將基板表面作 爲特定形狀者’可在不同色之副畫素間，將光的指向性進 行微調整，以高的位準防止經由視野角之發光色的變化者 【實施方式】 以下，對於本發明之原理，以及本發明之有機電激發 光顯示器及其製造方法加以說明。 <本發明之原理> 本發明者係經由目視有機電激發光顯示器的角度，對 於發光色產生變化的現象進行銳意檢討的結果，確定此現 象係因在不同色（R、G、B )之副畫素間，光的指向性不 同而引起者。因此，本發明者係完成由降低在此等副畫素 間之光的指向性的差者，可迴避如此現象的結論。 具體而言，在基板與彩色濾光片層或平坦化層之界面 部分之中，經由有機電激發光元件部的發光不所規定之副 畫素範圍，於各不同色之副畫素’形成不同密度之凹凸部 ’使從有機電激發光元件部所發光的R、G、B的光通過 -12- 201002123 於其凹凸部。由此，經由此，將在上述界面的 指向性，經由光的散亂原理，獨立地加以控制 色的光之指向性的差，可解決經由目視有機電 器的角度，發光色產生變化的問題。 然而’本發明者係對於經由該手法所做成 發光顯示器’將有機電激發光顯示器從正面或 察之同時，進行發光光譜的角度分布測定。其 成在各色的光之指向性的差之降低係在維持色 之有機電激發光元件部的性能同時可實現之結 <有機電激發光顯示器及其製造方法> [有機電激發光顯示器（形式1 )] 以下，將本發明之實施形態，依據圖1詳 。然而，以下所示的例係包含彩色濾光片層的 本發明之單一的例示，如爲該業者，可適宜做 即，對於未含有彩色濾光片層的例，可以與以 樣解釋。 (對於全體之構成） 本發明之有機電激發光顯示器（底發射型 所示，由透明基板1 00，層積於透明基板100 上之色變換濾光片部200,於色變換濾光片部 面，使出光面對峙之有機電激發光元件部300 換濾光片部200及有機電激發光元件部3 00’ 各色之光的 ，降低在各 激發光顯示 之有機電激 斜面方向觀 結果，亦完 度及亮度等 細進行說明 例，但僅爲 設計變更。 下說明做同 )係如圖1 之一方的面 200之入光 ，及將色變 與外氣遮斷 -13- 201002123 (未圖示）之密封材所構成。 透明基板100乃爲了支撐於其上方依序加以形成之有 機電激發光顯示器之各構成要素的層。透明基板100乃使 用可耐於使用於富光透過性，且彩色濾光片層210(R、G 、B )，遮光層220，及後述之紅色變換層240，以及有機 電激發光元件部3 00 (電極，有機發光層等）之形成的條 件（溶劑，溫度等）者。另外，透明基板1 〇 〇乃在後續之 各形成工程，爲了作爲反覆所成之各層的形成條件，對於 尺寸安定性優越者爲佳。更且，作爲透明基板100，使用 不會引起多色發光顯示器之發光性能下降的構成而爲重要 ，例如，可舉出玻璃，各種塑料，及各種薄膜等。 色變換濾光片部200係由於透明基板100之一方的面 上，形成爲條紋狀之紅色（R)、綠色（G)及藍色（B) 之各彩色濾光片層210R ' 210G、210B所成之彩色濾光片 層2 1 0，和埋入各彩色濾光片層間的間隙之遮光層220 ’ 和形成於彩色濾光片層210及遮光層220之上方的平坦化 層23 0，和形成於平坦化層23 0上，且形成於對應於紅色 (R)彩色濾光片層210R之位置的紅色變換層240，和呈 包入紅色變換層240地形成於平坦化層23 0上之氣體阻障 層2 5 0所構成。 有機電激發光元件部3 00係由形成於氣體阻障層250 上，形成於對應於彩色濾光片層2 1 0之位置之透明電極 310，和形成於氣體阻障層250上，且呈包入透明電極 3 1 0地加以形成之有機電激發光層320，和形成於有機電 -14- 201002123 激發光層320上之反射電極330所構成。 (關於凹凸形狀） 在圖1所示的例中，選自各色之彩色濾光片層21 0R 、210G、210B的至少一色之彩色濾光片層（在圖1所示 的例中，係綠色濾光板層21 0G及藍色濾光板層21 0B)與 接合於此等之透明基板1〇〇的界面乃具有凹凸形狀。 綠色濾光板層210G與透明基板100之界面（界面1 )之凹凸形狀，及藍色濾光板層21 0B與透明基板100之 界面（界面2 )之凹凸形狀係作爲控制在入射外光的界面 之反射，可增強對於經由折射之有機電激發光元件部3 00 的入射外光量之形狀。另外，該凹凸形狀係作爲將來自有 機電激發光元件部300的出射光，可充分地散亂於畫像面 而射出之形狀。 界面1，2的凹凸形狀係將凹陷的平均深度作爲0.4〜 0.625//m。在此，凹陷的平均深度係指：在圖1之各彩色 濾光片層210(G、B)與透明基板100之各界面形狀，將 某凸部的紙面垂直方向位置與鄰接之凹部的紙面垂直方向 位置的差，在各彩色濾光片層210(G、B)之紙面水平方 向的全範圍，代表性地進行1處測量之平均値。該深度乃 0.525 〜0.625# m 者爲佳。 另外，界面1，2的凹凸形狀係將凹陷密度作爲〇. 8 3 〜1.99個/// m2。在此，凹凸密度係指在同圖之綠色濾光 板層210G及藍色濾光板層210B與透明基板1〇〇之界面 -15- 201002123 形狀（圖1之紙面水平方向X紙面垂直方向）之每1 μ m2 之凸部的個數。該凹凸密度乃0.83〜1.18個/ /zm2者爲佳 〇 更且’界面1 ’ 2的凹凸形狀係具有如此之凹陷的平 均深度及凹凸密度’可作爲規則或不規則之形狀。經由不 過度地增加凹陷的平均深度及凹凸密度之時，可控制入射 外光的亂反射成爲過大，防止發光面的亮度損失。 如此之凹凸形狀係於每一副畫素（在圖1所示的例中 ’每綠色濾光板層210G及藍色濾光板層210B)，具有不 同之凹凸密度。此係由利用依據散亂的原理之光的指向性 者’可以高的位準而防止經由視野角的發光色之變化之故 。具體而言，以變化的光的波長之1 /2以上的周期，訂定 凹凸形狀，經由此而調整凹凸密度，使折射率，對於每一 副畫素作爲不同而調整從各副畫素射出的光的指向性。在 此，凹凸形狀的周期係指在圖1所示的例中，在各彩色濾 光片層2 1 0 ( G、B )之鄰接的凸部間之指面水平方向距離 。例如，對於將界面1的凹凸形狀之凹凸密度作爲0.8 3〜 0.91個m2之情況，將界面2的凹凸形狀之凹凸密度作 爲1.01〜1.18個/ "m2者爲佳。如此，由將凹凸密度，在 副畫素間進行微調整者，降低在副畫素間的光的指向性的 差’可充分地防止經由視野角而呈現不同之發光色之情況 〇 在此，副畫素係指在圖1所示情況中，在畫素（圖1 之全體）之中，對應於有機電激發光元件部之發光部的部 -16 - 201002123 份，即，擁有透明電極3 1 0之寬度的部份。然而，雖對於 圖1所示之紅色濾光片層21 OR與透明基板100之界面未 全附上凹凸，但在本發明中，說明在如此之界面的凹凸密 度係作爲〇，亦包含該界面，於每一副畫素具有不同之凹 凸密度之構成。 作爲如此之凹凸形狀的具體例，係可作爲至少具有一 個周期，較副畫素寬度爲小之複數的凹部及凸部的配列形 狀者。另外，作爲使界面1，2之凹凸形狀的凹凸密度作 爲不同之具體手段，可舉出於每一副畫素（各界面1，2 )，附上不同之周期的凹凸形狀之手段。 對於界面1，2之凹凸形狀的形成，首先，於對應於 彩色濾光片層210G，210B之圖案的透明基板1〇〇的面， 形成凹凸。接著，於該圖案上，層積所選擇之彩色濾光片 層 2 1 0G，2 1 0B。 作爲於透明基板1 〇 〇形成凹凸的方法，係可使用一般 使用表面的粗面化處理之方法，例如，將光阻劑圖案使用 餘光罩，經由化學藥劑，電漿等而進行蝕刻之方法。另外 ，亦可使用利用光罩與硏磨劑，削去表面，例如使用噴砂 法，櫛齒而刷除表面之機械性的方法等。 作爲透明基板1 00而使用玻璃基板的情況，經由噴砂 法，使用平均粒徑爲5" m的硏磨材，經由進行2〜8秒， 理想爲3~7·5秒處理之時，可將最佳的凹凸形成於玻璃基 板面。由不過度地加長處理時間，可控制凹凸形狀之凹凸 密度成爲過大，防止損及處理表面的亮度者。 -17- 201002123 然而，在圖1所示的例中，紅色濾光片層210R與透 明基板1〇〇之界面，係未附上凹凸形狀。對於紅色濾光片 層210R’係於透明基板1〇〇上，可經由公知的各種方法 而加以層積。例如，將公知的紅色濾光片材料，經由旋塗 法而進行塗布，可根據經由微光影法而進行圖案化之時而 加以形成。 (關於有機電激發光顯示器之構成要素） 以下，在圖1所示之有機電激發光顯示器之各構成要 素之中’對於上述之基板1 0 0以外的要素，詳細地加以說 明。 彩色濾光片層210 彩色濾光片層210係射入於該層之入射光之中，爲了 將成爲具有一定範圍之波長的光的色純度，經由特定波長 之遮斷而提昇的層。彩色濾光片層210(R、G、B)，係 於透明基板100上’可使用平板顯示器用之材料而加以形 成。彩色濾光片層210係可作爲配列透過400〜5 5 0nm的 波長之藍色濾光片層，透過500〜600 nm的波長之綠色濾 光片層，及透過600nm以上的波長之紅色濾光片層之構 造。 此等彩色濾光片層係由使染料或顏料，理想乃使顏料 分散之感光性樹脂層所成，作爲分散顏料，最佳使用偶氮 色料系、不溶性偶氣系、縮合偶氮系、駄花青系、喹[I丫酮 -18- 201002123 系、二噁嗪系、異吲哚滿酮系、蒽醌系、硫靛系，二萘崁 苯系’及此等混合系等。 彩色濾光片層210係具有反覆紅色（R)、綠色（G )及藍色（B )所成之條紋狀的圖案，各圖案乃60〜100 /zm之圖案寬度，以70〜90/zm的圖案間隔設置於透明 基板1〇〇之一方的面上。作爲彩色濾光片層210之形成方 法’可使用塗布法，特別是使用光處理者爲佳。 遮光層220 遮光層220係由未使可視區域透過於各彩色濾光片層 間者，將謀求對比之提昇作爲目的而形成。遮光層220係 係使用通常的平板顯示器用之材料而形成。作爲遮光層 220之形成方法，可使用塗布法，特別是使用光處理者爲 佳。 平坦化層2 3 0 平坦化層230係以保護彩色濾光片層210(R、G、B )之目的而加以形成。另外，平坦化層23 0係爲了作爲經 由彩色濾光片層210及遮光層220而產生的段差乃不會對 於較此等層210，220上方之各層尺寸精確度帶來不良影 響地所形成的層。因此’平坦化層2 3 0係有必要富有光透 過性，且選擇不會使彩色濾光片層210(R、G、B)劣化 之材料及處理而加以形成。 作爲可適用於平坦化層2 3 0之材料’係將光硬化性或 -19- 201002123 光熱倂用型硬化樹脂’進行光及/或熱處理，使原子團種 ’離子種產生而聚合或交聯’作爲不溶不融化之構成乃爲 一般。另外，光硬化性或光熱倂用型硬化樹脂係爲了進行 圖案化，在進行硬化前係對於有機溶劑或鹼性溶液爲可溶 性者爲佳。 具體而言’作爲光硬化性或光熱倂用型硬化樹脂，係 可舉出： (1)將具有複數丙烯醯基，異丁烯醯基之丙烯酸系 多官能單體或低聚物’和光或熱聚合開始劑所成之組成物 膜，進行光或熱處理，使光原子團或熱原子團產生而聚合 者， (2 )將聚乙烯桂皮酸酯與增感劑所成之組成物，經 由光或熱處理進行二聚作用而交聯者， (3 )將鏈狀或環狀烯烴與雙疊氮化物所成之組成物 膜，經由光或熱處理使氮烯產生，與烯烴交聯者，以及 (4)將具有環氧基之單體與光氧產生劑所成之組成 物膜，經由光或熱處理使氧（陽離子）產生而聚合者等。 特別是對於使用上述（1 )之光硬化性或光熱倂用型 硬化樹脂的情況，因光處理之故，可圖案化，在耐溶劑性 ，耐熱性等之信賴性的面亦佳。 作爲其他之光硬化性或光熱倂用型硬化樹脂，係可舉 出聚碳酸酯（PC)、聚乙烯對苯二甲酸酯（PET)、聚醚 砸、聚乙烯醇縮丁醛、聚苯乙醚、聚醯胺、聚醚亞胺、降 冰片烷系樹脂、異丁烯樹脂、異丁烯順酐共聚合樹脂、環 -20- 201002123 狀烯烴系等之熱可塑性樹脂、環氧樹脂、苯酚樹脂 酸乙酯樹脂、丙烯酸樹脂、乙嫌酯樹脂、亞胺系樹 甲酸乙酯系樹脂、尿素樹脂、三聚氰胺〔甲醛〕樹 熱硬化樹脂，或含有聚苯乙烯、聚丙烯、聚碳酸酯 官能性’或者4官能性之烷氧基矽烷之聚合物混合 作爲平坦化層230之形成方法，可使用塗布法 是使用光處理者爲佳。 然而，圖1係包含彩色濾光片層210的例，對 全含有彩色濾光片層210之情況，於透明基板1〇〇 化層2 3 0之界面形成凹凸形狀。對於此情況，亦可 布法，特別是使用光處理者爲佳。 紅色變換層240 色變換層係使波長在近紫外線範圍乃至可視範 射光，吸收於螢光色素，使具有將與入射光波長位 之可視範圍的螢光發光之機能的螢光色素分散之感 脂層所成。在圖1所示的例中，在紅色變換層、綠 層、及藍色變換層之中，只使用紅色變換層240。 作爲吸收有機電激發光元件部3 00所發光的藍 青綠色範圍的光，使用於使紅色範圍的螢光發光之 換層240之螢光色素，係例如可舉出若丹明B、 6G、若丹明3B、若丹明101、若丹明1 10、磺醯若 鹼性品紅1 1、鹼性紅2等之若丹明系色素，酞菁 、1-乙基-2-[4-(p-二甲基氨基苯基）-1，3-丁二烯 、胺甲 脂、胺 脂等之 等與3 等。 ，特別 於未完 與平坦 使用塗 圍的入 在不同 光性樹 色變換 色乃至 紅色變 若丹明 丹明、 系色素 ]-局氣 -21 - 201002123 酸啦陡（啦卩定1)等之啦陡系色素、及嚼嗪系色素。另外 ，如直接染料，酸性染料，鹼性染料，分散染料等之各種 染料亦顯示螢光性之構成而可使用。 雖在圖1所示的例未使用，但作爲吸收有機電激發光 元件部3 00所發光的藍色乃至青綠色範圍的光，使用於使 綠色範圍的螢光發光之綠色變換層之螢光色素，係例如可 舉出3-(2’-苯并噻唑）-7-二甲基氨基香豆素（香豆素6 )、3- ( 2’-苯并咪唑）-7-二甲基氨基香豆素（香豆素 7 )、3-(2’-N-苯并咪唑）-7-二甲基氨基香豆素（香豆素 30) 、2,3,5,6-111，411-四氫-8-三氟甲基喹嗪（9,93,1-811) 香豆素（香豆素153)等之香豆素系色素、鹼性黃51等 之香豆素系染料、溶劑黃11、溶劑黃116等之鄰苯二甲 醯亞胺系色素。另外，如直接染料，酸性染料，鹼性染料 ，分散染料等之各種染料亦顯示螢光性之構成而可使用。 藍色變換層係從具有與在藍色濾色片層210B選擇有 機電激發光元件部300發光的光之波長範圍略相同之波長 範圍情況，通常被省略，在圖1所示的例亦未使用。然而 ，取代省略藍色變換層，可將透明之感光性樹脂層作爲模 擬件而形成。 色變換層（在圖1所示的例中，紅色變換層240 )係 可經由各種乾處理而形成，而經由真空蒸鍍法形成之情況 乃可未分解有機材料而形成之故爲佳。作爲真空蒸鍍法的 加熱方式，亦可使用直接加熱法或間接加熱法之任一，具 體而言’係可使用電阻加熱，電子束加熱，或紅外線加熱 -22- 201002123 等。對於使用複數種之色變換色素而行成色變換層之情況 ’預先製做以特定比例混合複數種之色變換色素之預備混 合物，並可使用其預備混合物而進行共蒸鍍。另外，將複 數種之色變換色素配置於個別的加熱部位，並將各色變換 色素個別進行加熱而進行共蒸鍍亦可。特別是在複數種之 色變換色素，對於蒸鍍速度及/或蒸氣壓等之特性有大差 異之情況，使用後者的方法者爲有利。 色變換層（在圖1所示的例中，紅色變換層240 )的 膜厚係作爲l//m以下者乃在可使色變換層之機能發揮的 點上爲佳，而作爲200nm〜l;zm者乃在可有效地利用色變 換層的點上而更佳。 氣體阻障層250 氣體阻障層25 0乃爲了防止從外部對於色變換層（在 同圖所示之情況，紅色變換層2 4 0 )水份及/或氧侵入而 加以形成的層。此係因色變換色素乃有機物’對於水份’ 氧爲弱之故。 在此，氣體阻障層25 0的行程目的乃紅色變換層240 之保護，但在圖1所示的例中，不只是紅色變換層240, 而亦保護平坦化層230。然而’此構造係對於爲了不漏出 來自色變換濾光片部200的水份，亦爲必要之故，對於後 述之有機電激發光層320的保護亦爲有效。 作爲可適用於氣體阻障層250之材料’係可使用具有 電性絕緣性’且具有對於氣體及有機溶齊1之阻15章性’在可 -23- 201002123 視區域的透明性高之材料（在400〜7〇〇nm的範圍之透過 率乃50%以上）。另外’形成於氣體阻障層250上’可 耐後述之透明電極3 1 0等之形成的硬度，使用理想爲具有 2H以上之膜硬度（鉛筆硬度）的材料爲佳。然而，此膜 硬度（鉛筆硬度）係依據JIS K5600-5-4之標準。作爲具 體之氣體阻障層 250，係例如可使用 SiOx、SiNx、 SiNxOy、AlOx、TiOx、TaOx、ZnOx 等之無機氧化物、或 無機氮化物等。 作爲氣體阻障層2 5 0之形成方法，並無特別限制，可 使用濺鍍法、CVD法、或真空蒸鍍法等。另外，氣體阻 障層250係當然作爲單層，而亦可作爲由複數的層所成之 層積體。如以上所述’於透明基板1〇〇上，形成有色變換 濾光片部200。 透明電極3 1 0 作爲可適用於透明電極之材料，係可使用ITO，氧化 錫，氧化銦，IZO，氧化鋅，鋅-鋁氧化物，鋅-鎵氧化物 ，或對於此等氧化物而言，添加F或Sb等之攙雜劑的導 電性透明金屬氧化物。另外，透明電極3 1 0係在使用蒸鍍 法，濺鍍法或化學氣相沈積法（CVD )而形成之後，可經 由使用光微影法等而作爲圖案化者而得到。在如此之形成 法之中，特別是使用濺鍍法爲佳。 透明電極3 1 0係亦可作爲陽極，陰極之任一者。對於 將透明電極3 1 0作爲陰極而使用之情況，係於透明電極 -24- 201002123 310與有機電激發光層320之間，形成未圖示之陰極緩衝 層，提昇對於有機電激發光層3 20之電子植入效率爲佳。 作爲可適用於陰極緩衝層之材料，係可使用Li、Na、K 或Cs等之鹼金屬，Ba或Sr等之鹼土類金屬，含有此等 金屬之合金，稀土金屬，或此等金屬之氟化物等者。陰極 緩衝層的膜厚，從確保透明性之觀點，做爲1 Onm以下者 爲佳。對此，對於將透明電極3 1 0作爲陽極而使用之情況 ，係於透明電極3 1 0與有機電激發光層320之間，設置導 電性透明金屬氧化物的層，提昇對於有機電激發光層320 之電洞植入效率爲佳。作爲導電性透明電極可適用之材料 ，係可使用ITO，氧化錫，氧化銦，IZO，氧化鋅，鋅-鋁 氧化物，鋅-鎵氧化物，或對於此等氧化物而言，添加F 或Sb等之攙雜劑的材料。 有機電激發光層320 ( 有機電激發光層3 20係至少含有有機發光層，因應必 要而具有使電洞植入層、電洞輸送層、電子輸送層及/或 電子植入層介入存在的構造。作爲具體之有機發光元件部 的層構造，可採用下述之構造。 (1) 陽極/有機發光層/陰極 (2) 陽極/電洞植入層/有機發光層/陰極 (3) 陽極/有機發光層/電子植入層/陰極 (4) 陽極/電洞植入層/有機發光層/電子植入層/陰極 (5) 陽極/電洞輸送層/有機發光層/電子植入層/陰極 -25- 201002123 (6) 陽極/電洞植入層/電洞輸送層/有機發光層/電子 植入層/陰極 (7) 陽極/電洞植入層/電洞輸送層/有機發光層/電子 輸送層/電子植入層/陰極 然而，在上述（1) ~(7)的層構造中，陽極及陰極乃 透明電極310及反射電極330之任一。 作爲構成有機電激發光層320之各層的材料，可使用 公知的構成者。另外，構成有機電激發光層320之各層， 係可使用在蒸鑛法等之該技術所知道之任意方法而形成者· 〇 對於使用如圖1所示之紅色變換層240的情況，有機 電激發光層3 20乃實現從藍色至藍綠色之發光者則爲重要 。作爲可適用於爲了得到從藍色至藍綠色之發光的有機發 光層之材料，例如使用苯并噻唑系、苯并咪唑系，或苯并 噁二唑系等之螢光增白劑，金屬螯合化氧正離子化合物， 苯乙烯基苯系化合物，或芳香族次甲基系化合物等。另外 ’在圖1所示的例’有機發光層的發光係因應必要，亦可 作爲白色光’但對於此情況，使用公知之紅色攙雜劑者則 爲重要。 對此’雖對於圖1未顯示，但對於作爲色變換層而使 用綠色變換層之情況’將有機發光層的發光作爲從藍色至 紅色的發光者則爲重要。 反射電極3 3 0 -26- 201002123 作爲可適用於反射電極330之材料，係使用高反射率 的金屬，高反射率之非晶形合金，或高反射率之微結晶性 合金者爲佳。作爲高反射率之金屬，係例如可舉出A1、 Ag、Mo、W、Ni、或Cr。作爲高反射率之非晶形合金， 係例如可舉出NiP、NiB、CrP或CrB。作爲高反射率之微 結晶性合金，係例如可舉出NiAl。 反射電極3 30係亦可作爲陽極，陰極之任一者。對於 將反射電極3 3 0作爲陰極而使用之情況，係於反射電極 3 3 0與有機電激發光層3 20之間，形成未圖示之陰極緩衝 層，提昇對於機電激發光層3 20之電子植入效率爲佳。或 者另外，對於具有上述的高反射率特性之金屬，非晶形合 金或微結晶性合金而言，添加供函數小之材料，即，鋰， 鈉或鉀等之鹼金屬，或者鈣，鎂或緦等之鹼土類金屬而合 金化，使電子植入效率提昇者爲佳。對此，對於將反射電 極3 30作爲陽極而使用之情況，係於反射電極3 30與有機 電激發光層320之間，設置導電性透明金屬氧化物的層， 提昇對於有機電激發光層320之電洞植入效率爲佳。作爲 導電性透明電極可適用之材料，係可使用ITO，氧化錫， 氧化銦，IZO，氧化鋅，鋅-鋁氧化物，鋅-鎵氧化物，或 對於此等氧化物而言，添加F或Sb等之攙雜劑的材料。 作爲反射電極330之形成方法，係依存於所使用的材 料，可使用在真空蒸鍍，濺鍍，離子電鍍，或雷射削剝等 該技術所知道之任意的手段者。然而，與圖1所示的例不 同’對於由複數的部分電極所成之反射電極3 3 0成爲必要 -27- 201002123 之情況，亦可使用賦予所期望的形狀之光罩，形成 的部分電極所成之反射電極330者。 在圖1所示的例中，反射電極330係具有與透 3 1 〇之圖案交叉之條紋狀的圖案，其交叉範圍乃形 副畫素。 然而，如以上作爲所得到之有機電激發光顯示 手套箱內之乾燥氮素環境（〇2濃度及H20濃度乃 lOppm以下的環境）下，使用未圖示之密封玻璃與 化黏著劑所成之黏著層而加以密封。 [有機電激發光顯示器（形式2)] 接著，令本發明之其他實施形態（形式2 )， 2加以說明。然而，在以下，只對於與全體構成， 之有機電激發光顯示器（形式1)的差異點加以詳ί (全體之構成） 本發明之有機電激發光顯示器（前發射型）係 所示，形成於基板1 00之色變換濾光片部200之第 體X，和形成有機電激發光元件部300於基體400 層積體Υ，在於色變換濾光片部200之入光面’使 激發光元件部3 0 0出光面對峙之狀態，經由熱硬化 著層500加以貼合之構造。另外，圖2所示之有機 光顯示器係含有將色變換濾光片部200及有機電激 件部3 00，與外氣遮斷（未圖示）之密封材。 由複數 明電極 成發光 器係在 同時爲 UV硬 根據圖 及上述 如圖 2 1層積 之第2 有機電 型之黏 電激發 發光元 -28- 201002123 透明基板100乃爲了支撐於其上方依序加以形成之色 變換瀘光片部200之各構成要素（彩色濾光片層210’遮 光層220，平坦化層230，紅色變換層240，及氣體阻障 層250)的層。透明基板1〇〇係使用可耐使用於此等構成 要素之形成的條件（溶劑，溫度等）者。對於透明基板 1 00之其他諸條件，係與圖1所示之透明基板1 00相同。 對於色變換濾光片部200，及有機電激發光元件部 3 00之其他諸條件，係與圖1所示之透明基板1 00相同。 基體400乃爲了支撐有機電激發光元件300之構成要 素。基體400係使用可耐使用於有機電激發光元件部300 之形成的條件（溶劑，溫度等）者。對於基體400之其他 諸條件，係與透明基板1 〇〇相同。 黏著層5 00係爲了貼合第1層積體X與第2層積體Y 所使用的構成要素。作爲黏著層500係如爲具有可視光透 過性，未對於紅色變換層240及有機電激發光層3 20帶來 損傷等之不良影響而可形成者，並無特別加以限定。例如 ，可使用一般的熱可塑性樹脂，經由常溫〜1 20 °C以下的 熱可硬化之熱硬化型樹脂，經由可視光，或光，熱並用而 可硬化之樹脂等。 [有機電激發光顯示器（形式2)之製造方法] 首先，與圖1所示之有機電激發光顯示器（形式1) 同樣地，於基板100上方依序加以形成彩色濾光片層210 ，遮光層220，平坦化層230，紅色變換層240，及氣體 -29- 201002123 阻障層2 5 0，得到第1層積體X。 接著，與第1層積體X個別地，於基體 以形成反射電極330，有機電激發光層320, 3 10，得到第2層積體Υ。對於基體400之β 等之形成型態，係依據在圖1所示之有機電禮 (形式1)之對應的構成要素之形成型態而進 更且，在於色變換濾光片部200之入光谊 激發光元件3 0 0的出光面對峙之狀態，將第 與第2層積體Υ，藉由熱硬化黏著層5 00加以 最後，將所得到之有機電激發光顯示器， 之乾燥氮素環境（〇2濃度及Η20濃度乃同時 下的環境）下，使用未圖示之UV硬化密封齊 層而加以密封色變換濾光片部200及有機罨 3 00。 [實施例] 以下，將經由實施例及比較例，證實本i 然而，以下之實施例及比較例，係關於全部 、B之各副畫素的畫素乃以間距〇.33mm，龙 160個，於橫方向形成120個之有機電激發光 <有機電激發光顯示器之製作> (實施例1 ) 實施例1之有機電激發光顯示器係作爲礓 4 〇 〇依序加 及透明電極 ί射電極3 3 0 (發光顯示器 行。 丨，使有機電 1層積體X 貼合。 在手套箱內 爲1 Oppm以 1所成之密封 激發光元件 I明之效果。 ，含有R、G t縱方向形成 顯示器。 1所示之形 -30- 201002123 式的顯示器。準備200mmx200mmx0.7mm之玻璃基板。首 先’以特定的間距，將圖案形成之Cr膜（膜厚100nm)作 爲光罩，使用乾蝕刻法（C4F8 : 16msccm、CH2F2 : 16Sccm、氣壓〇.8Pa、及功率2kW))，得到將基板的濾 色片層側的藍色副畫素區域，形成於深度0.6 v m，間距 O-2/zm的直圓錐狀之凸凹，接著，將綠色副畫素區域， 形成於深度〇.4/zm，間距0.3/zm的直圓錐狀之凸凹的基 板 100。 於基板100上，以旋塗法塗布遮光層用塗液（ CK840 0L富士軟片ARCH製）於全面，再以80°C加以加 熱乾燥。之後，使用光微影法，以3 3 0 // m間距，形成副 畫素尺寸（縱方向80//mx橫方向300"m、厚度方向1 // m )的圖案，於基板1 00上層積遮光層220。 對於藍色彩色濾光片21 0B的形成，於基板100上， 經由旋塗法塗布藍色彩色濾光片材料（富士軟片ARCH製 :彩色馬賽克CB-700 1 ) ’實施經由光微影法之圖案化。 具體而言，描繪在深度間距〇.2#m的直圓錐狀 之凸凹的基板1〇〇。由此，將藍色彩色濾光片210B的基 板側，得到形成於深度〇 · 6 /z m，間距〇. 2 # m，平均密度 0_88個/ //m2的直圓錐狀之凸凹的區域尺寸80/zmx300 # m、膜厚2 /z m的線圖案。 對於綠色彩色濾光片21 0G的形成，於基板100上， 經由旋塗法塗布綠色彩色濾光片材料（富士軟片ARCH製 :彩色馬賽克CG-700 1 ) ’實施經由光微影法之圖案化。 -31 - 201002123 具體而言’描繪在形成於深度〇.4"m’間距〇.3#m的直 圓錐狀之凸凹的基板100°由此’將綠色彩色濾光片 2 1 0 G的基板側’得到形成於深度0 · 4 μ m，間距〇 . 3 /z m， 平均密度1.99個/// m2的直圓錐狀之凸凹的區域尺寸80 //mx300/zm、膜厚2仁m的線圖案。 對於紅色彩色濾光片210R的形成，於基板1〇〇上， 經由旋塗法塗布紅色彩色濾光片材料（富士軟片ARCH製 :彩色馬賽克CR-7001 )，實施經由光微影法之圖案化。 具體而言，得到區域尺寸SO/zmxSOOMm、膜厚2//m之 線圖案。 接著’對於平坦化層23 0之形成，於彩色濾光片210 及遮光層220上，經由旋塗法塗布平坦化層材料（新曰鐵 化學製：V-259PA)而形成。在與遮光層220接觸的範圍 之平坦化層2 3 0的膜厚係作爲2.5 // m。順帶說明，另外 ’於玻璃基板上，以同條件形成平坦化膜，測定折射率時 ’本實施形態之平坦化層係了解到具有1 .5之折射率者。 將具有如以上作爲所得到之平坦化層2 3 0以下的層之 層積體’在乾燥氮素環境（水分濃度1 p p m以下），歷經 20分鐘加熱至200 °C ’除去有殘存可能之水份。 將此層積體裝置於真空蒸鍍裝置，以lxl(r4pa的壓 力下’由0.3A/S的蒸鍍速度蒸鍍DCM-R，形成膜厚 5 OOnm之紅色變換層240。順帶說明，另外，於玻璃基板 上’以同條件形成DC M-R膜，測定折射率時，本實施形 態之紅色變換層係了解到具有1 . 9之折射率者。 -32- 201002123 更且’使用電漿CVD法，層積膜厚300nm之SiNH 膜’得到氣體阻障層250。作爲原料氣體而使用100SCCM 之 SiH4、500SCCM 之 NH3、及 2000SCCM 之 N2，將氣壓 作爲80Pa。另外’作爲電漿產生用電力，將27MHz之RF 電力施加〇 · 5 k W。順帶說明，另外，於玻璃基板上，以同 條件形成SiNH膜，測定折射率時，本實施形態之平坦化 層係了解到具有1.95之折射率者。 於如上述作爲而依序形成之基板1〇〇及色變換濾光片 部200上’形成透明電極310/有機電激發光層320 (電洞 植入層/電洞輸送層/有機發光層/電子輸送層）/反射電極 330所成之有機電激發光元件300。 透明電極3 10係形成In-Zn氧化物圖案。經由DC濺 鍍法，在室溫，形成200nm In-Zn氧化物膜。對於濺鍍標 把，係使用In-Zn氧化物標把，作爲濺鏟氣體而使用Ar 及氧。經由光微影法而將光阻劑作爲圖案化之後，經由將 草酸作爲蝕刻液而使用作爲圖案化之時，形成配線寬度 100/zm之圖案。圖案化後，進行乾燥處理（150°C)及 UV處理（室溫及150°c )。 在UV處理後，將層積體裝置於電阻加熱蒸鍍裝置內 ，將電洞植入層、電洞輸送層、有機發光層、電子植入層 ，未破壞真空而依序成膜，形成有機電激發光層3 20。在 成膜時，將真空槽內壓，減壓至lxl〇_5Pa。電洞植入層係 層積100nm酞花青（CuPc)。電洞輸送層係層積20nm 4,4’-雙[N- ( 1-萘基）-N-苯胺]聯苯（α-NPD)。有機發 -33- 201002123 光層係層積30nm 4,4’-雙（2,2-聯苯乙烯）]聯苯（DPVBi )。電子植入層係層積20nm經基睦啉錦（Alq)。 接著，使用與透明電極 3 1 0的線垂直地得到寬度 0.30mm、空隙 0.3 0mm間隔之條紋圖案的光罩，將厚度 200nm之Mg/Ag(10: 1的重量比率）層所成之反射電極 3 3 0，未破壞真空而加以形成。將如此作爲所得到之層積 體，在手套箱內乾燥氮素環境下，使用分配器機械手臂， 使用塗布分散直徑6^rn之玻璃珠之UV硬化型黏著劑（ threebond公司製，商品名30Y-437 )於外周之密封玻璃 加以黏接，將1 〇〇mW/cm2之紫外線，歷經30秒而加以照 射，使外周密封層硬化而得到實施例1之有機電激發光顯 示器。 (實施例2) 實施例2之有機電激發光顯示器係作爲圖2所示之形 式的顯示器。對於基板100之形成，以及對於基板100上 方之遮光層220，彩色濾光片層210，平坦化層230，紅 色變換層240，及氣體阻障層25 0之依序形成，係與實施 例1同樣地進行，得到第1層積體X。 接著，個別準備作爲基體400之玻璃基板，使用濺鍍 法及光微影法，形成膜厚20〇nm之銦錫氧化物（ITO )所 成之反射電極3 3 0。反射電極3 3 0之形狀係作爲延伸於縱 方向之配線寬度1 0 0 // m的條紋圖案。 更且，將形成反射電極330於基體400之層基層，裝 -34 - 201002123 置於電阻加熱蒸鍍裝置內’將電子植入層、有機電激發光 層、電洞輸送層、及電洞植入層’將真空槽內壓力維持保 持爲lxlO_5Pa加以依序層積，形成有機電激發光層320。 接著，於有機電激發光層3 20上’使用得到垂直交叉於圖 案寬度0.30mm、圖案間距離〇.〇3mm之反射電極3 3 0之 條紋圖案的光罩，維持上述真空同時，將厚度200nrn之 Mg/Ag(重量比乃Mg:Ag=10:l)作爲透明電極310而 加以形成。 最後，呈被覆從基體400至透明電極310爲止之層積 體地，形成膜厚500nm之SiN所成之護層（未圖示）， 得到第2層積體Y。 將如此作爲所得到之第1層積體X與第2層積體Y， 運送至管理成水分濃度lppm、氧濃度lPPm之貼合裝置 內。使用分配器機械手臂，於第1層積體X，將分散直徑 6 /z m之玻璃珠之UV硬化型黏著劑（threebond公司製， 商品名30 Y-43 7 )作爲外周密封層而加以塗布，於其中心 滴下特定量熱硬化黏著劑，在貼合裝置中，由IPa的真空 而除去大氣。接著’使氣體阻障層250與（未圖示）護層 對峙’於護層之上面’放上層積體Y，加以壓著而貼合層 積體X ’ Y。外周密封部以外係由光罩保護後，歷經3 0秒 照射lOOmW/cm2之紫外線而使其硬化之後，實施100°c 1小時之加熱’進行外周密封部及熱硬化黏著劑之加熱硬 化’得到實施例2之有機電激發光顯示器。 -35- 201002123 (比較例1 ) 比較例1之有機電激發光顯示器係作爲圖3 式的顯示器。準備200mmx20〇mrnx〇.7mm之玻璃 先，於基板上，由旋塗法，全面地塗布遮光 (CK8 400L富士軟片ARCH製），以8〇。(：加以 ，之後，使用光微影法，以330//ηι間距，形成 寸（縱方向80ymx橫方向30〇em、厚度方向 圖案，於基板1〇〇上層積遮光層22 0。 對於藍色彩色濾光片210B的形成，於基板 經由旋塗法塗布藍色彩色爐光片材料（富士軟片 :彩色馬賽克CB-700 1 )，實施經由光微影法之 具體而言，得到區域尺寸80jumx300/zm、膜厚 線圖案。 對於綠色彩色濾光片210G的形成，於基板 經由旋塗法塗布綠色彩色濾光片材料（富士軟片 :彩色馬賽克CG-7001)，實施經由光微影法之 具體而言，得到區域尺寸80"mx300//m、膜厚 線圖案。 之後，對於紅色濾光片21 0R、平坦化層230 換層240，氣體阻障層250、透明電極310、有 光層320、及反射電極330之形成，以及密封處 與實施例同樣的手段，得到比較例1之有機電激 器。 所示之形 基板。最 層用塗液 加熱乾燥 副畫素尺 -m )的 100 上， ARCH 製 圖案化。 2 β m 之 100 上， ARCH 製 圖案化。 2 μ m 之 、紅色變 機電激發 理，採用 發光顯示 -36- 201002123 (比較例2) 比較例2之有機電激發光顯示器係作爲圖4所示之形 式的顯示器。準備200mm><200mmx0.7mm之玻璃基板。首 先，以特定的間距，將圖案形成之Cr膜（膜厚l〇〇nm) 作爲光罩，使用乾蝕刻法（C4F8 : 16msCCm、CH2F2 : 16sccm、氣壓0.8Pa、及功率2kW))，得到將基板的彩 色濾色片層側的藍色副畫素區域及綠色副畫素區域，形成 於深度0.6 " m，間距0.2 // m的直圓錐狀之凸凹的基板 100° 於基板1 〇〇上，以旋塗法塗布遮光層用塗液（ CK8400L富士軟片ARCH製）於全面，再以80°C加以加 熱乾燥。之後，使用光微影法，以3 3 Ο μ m間距，形成副 畫素尺寸（縱方向80/zmx橫方向300/zm、厚度方向1 ym)的圖案，於基板100上層積遮光層220。 對於藍色彩色濾光片210B的形成，於基板1〇〇上， 經由旋塗法塗布藍色彩色濾光片材料（富士軟片ARCH製 :彩色馬賽克CB-70 0 1 ) ’實施經由光微影法之圖案化。 具體而言，描繪在形成於深度0.6#m，間距0.2/zm的直 圓錐狀之凸凹的基板100。由此，將藍色彩色濾光片210B 的基板側，得到形成於深度0.6 v m，間距〇 . 2 // m，平均 密度0.88個/ "m2的直圓錐狀之凸凹的區域尺寸80 "m><300ym、膜厚2em的線圖案。 對於綠色彩色濾光片210G的形成，於基板1〇〇上， 經由旋塗法塗布綠色彩色濾光片材料（富士軟片ARCH製 -37- 201002123 :彩色馬賽克CG-7001)，實施經由光微影法之圖案化。 具體而言，描繪在形成於深度〇.6//ιη’間距0.2/im的直 圓錐狀之凸凹的基板100。由此，將綠色彩色濾光片 2 10G的基板側，得到形成於深度0.6 // m ’間距0·2 // m ’ 平均密度0.88個/ // m2的直圓錐狀之凸凹的區域尺寸80 //mx30〇Mm、膜厚2#m的線圖案。 之後，對於紅色濾光片210R、平坦化層23 0、紅色變 換層240，氣體阻障層2 5 0、透明電極310、有機電激發 光層320、及反射電極330之形成，以及密封處理’採用 與實施例同樣的手段，得到比較例2之有機電激發光顯示 器。 <評估項目> 關於實施例1，2及比較例1，2之有機電激發光顯示 器，在D65白色光點燈時，進行從正面及斜面觀察的發 光主觀評估。將其結果示於表1。然而’從斜面的觀察係 對於有機電激發光顯示器畫面的法線而言’從45度的位 置之觀察。 [表1] 主觀評價(正面） 主觀評價(左右斜面） 主觀評價(上下斜面） 實施例1 白 白 白 實施例2 白 白 白 (比較例1) 白 粉紅 粉紅 (比較例2) 白 茶綠色 茶綠色 -38- 201002123 從表1的結果，在將基板100與藍色及綠色濾光片 210B，210G之界面作爲不同之凹凸密度的實施例1，2中 ，在底放射型（實施例1 )及前放射型（實施例2 )之任 一，亦確定無經由觀察角度之畫面的發光色之變化。 對此，在未將基板1〇〇與藍色及綠色濾光片21 0B， 2 10G之界面作爲凹凸密度的比較例1中，確定經由觀察 角度之畫面的發光色之變化顯著。 另外，在將基板100與藍色及綠色濾光片 210B， 2 10G之界面作爲相同凹凸密度的比較例2中，確定有經 由觀察角度之畫面的發光色之變化。 順帶說明，對於在實施例1，2與比較例1，2之亮度 ，色度，未看到變化。 隨之，實施例1，2之有機電激發光顯示器係確定由 將基板與彩色濾光片的界面，具有對各R、G、B調整凹 凸密度的構造者，維持亮度，色度之同時，可減少R、G 、B間之光的指向性的差。 然而，以上的結果乃適宜調整基板與彩色濾光片之界 面的例，但對於未存在有彩色濾光片的情況，預想在適宜 調整基板與平坦化層之界面的例，亦可得到同等的結果。 [產業上之可利用性] 本發明係由將基板與彩色濾光片或平坦化層之界面作 爲特定形狀者，在異色的副畫素間，微調整光的指向性的 差，可以高的位準防止經由視野角之發光色的變化者。因 -39- 201002123 而’本發明係在可提供具有無關於經由視野角之發光色的 變化之顯示部之行動電話等之各種電子機器的點上，爲有 希望。 【圖式簡單說明】 [圖1]乃顯示本發明之有機電激發光顯示器之側方剖 面圖。 [圖2]乃顯示本發明之有機電激發光顯示器之側方剖 面圖。 [圖3 ]乃顯示比較例1之有機電激發光顯示器之側方 剖面圖。 [圖4]乃顯示比較例2之有機電激發光顯示器之側方 剖面圖。 【主要元件符號說明】 100 :基板 200 :色變換濾光片部 21〇:彩色濾光片層 210R ：紅色濾光片層 210G:綠色濾光片層 210B:藍色濾光片層 220 :遮光層 2 3 0 :平坦化層 24〇:紅色變換層 -40- 201002123 2 50 :氣體阻障層 3〇〇 :有機電激發光元件部 3 1 0 :透明電極 320 :有機電激發光層 330 :反射電極 400 :基體 5〇〇 :黏著層 X :第1層積體 Y :第2層積體 -41 -201002123 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to an organic electroluminescence display (hereinafter also referred to as "organic EL display"). More specifically, the organic EL display of the present invention is an organic EL display which emits light from the organic EL element portion and which does not pass through the viewing angle to exhibit different color light. The present invention relates to a method of manufacturing an organic EL display as such. [Prior Art] Currently, display devices such as liquid crystal displays and organic EL displays are used as display units of electronic devices such as mobile phones, personal computers, digital photocopiers, and printers. The light-emitting form of the display device described above is a self-luminous type and a non-emitted type. The self-luminous type is suitable for an electroluminescence element (EL element), a field emission display (FED), and a cathode ray tube (CRT). In contrast, the non-light-emitting type is used for a liquid crystal display element or the like. Further, the color display method of the display device described above is a colorful mode or a full color mode in which three primary colors of red, green, and blue are illuminated. In these methods, a color filter layer is often used to intervene between the light-emitting surface of the light-emitting element and the image surface. According to this means, the specific wavelength from the light-emitting element can be selectively emitted, the color purity of the three primary colors can be increased, and the image can be displayed as high quality. Among the display devices as described above, in particular, for the organic EL display, the following techniques have been proposed. -5-201002123 Patent Document 1 discloses an organic EL element portion having a fluorescent material in a fluorescent material portion having visible light emitted from an organic EL material portion. This element is a color conversion filter provided with a fluorescent material, and absorbs the fluorescent light in the visible light field in the organic EL light-emitting portion. In the technique disclosed in Patent Document 1, the organic EL element light color is not limited to white. Therefore, in comparison with the related art, the bright EL element portion can be applied to a light source. For example, the color of the blue light can be changed to light or red by using a color conversion method using the blue EL element portion. In recent years, the fluorescent material portion having the fluorescent material dye disclosed in Patent Document 1 has been highly developed as a weak color conversion method for the wavelength range of the near-ultraviolet light visible light of the illuminating body. . The color conversion layer (corresponding to the fluorescene) used in the color conversion method can be mainly formed by wet treatment via a photoresist or by steam treatment. However, the material used for the color conversion layer is low, and in the case of wet treatment, it is difficult to completely dry the color photoresist. Therefore, as in the case of the wet treatment, the dry moisture moves from the color conversion layer to the organic EL layer, and organically produces a non-luminous defect called a dark region. Therefore, the product is not a wet process but a dry process type color conversion layer, and the following techniques are known. And the light of the material part of the light-emitting fluorescent material part is changed to have a high degree of light emission in the part, and the green heat is changed by the plating method to make the dry heat resistance of the light material part of the energy ray. The layer and the post-drying residual EL layer are extremely subjected to, for example, -6 - 201002123. Patent Document 2 discloses that a color filter layer, a fluorescent conversion layer (corresponding to a color conversion layer), and a barrier layer are provided on a substrate. A hole-embedded electrode, an electron-implanted electrode, an organic layer having an organic light-emitting function between the electrodes, and a color filter layer formed by an evaporation method. In Patent Document 2, not only the color filter layer but also the color conversion layer is formed by a vapor deposition method (dry process). It is preferable that the color conversion layer is weak for moisture and controls the generation of the above dark region. Here, when the color conversion layer is formed by dry processing, the color filter layer or the planarization layer which is the base of the color conversion layer is formed by a wet process, and after drying at a high temperature, the color is formed. It is better to change the layer. In the formation of the color conversion layer thus processed, the color conversion layer can be selectively formed above the planarization layer corresponding to each of the sub-pixels of red, green, and blue. The refractive index of the flattening layer and the glass substrate is about 1.5, and the refractive index of the color conversion layer is about 2, and the sub-picture forming the color conversion layer is compared with the sub-picture without the color conversion layer. The directivity of light is low. For example, in the case where the color conversion layer is formed only by the red sub-pixel, the directivity of the red sub-pixel element light is low for the green sub-pixel and the blue sub-pixel. Further, in the case where a plurality of types of color conversion layers are formed, since the refractive indices between the color conversion layers of the respective colors are different, a difference in directivity with respect to light occurs between the sub-pixels forming the color conversion layer. For example, in the case where the red sub-pixel and the green sub-pixel form a color conversion layer, a difference in directivity with respect to light is generated between the sub-pixels. For these reasons, the red, green, and blue 201002123 light emitted from the display may have different directivity, and the illuminating color of the screen may be different depending on the viewing angle of the display. However, it is important to increase the amount of light extracted from the sub-pixels to reduce the refractive index of the flattened layer and/or the glass substrate. However, in the case where the refractive index of the planarization layer is reduced, the difference in refractive index between the planarization layer and the like and the color conversion layer becomes large. Therefore, the difference in directivity of light between the sub-pixel forming the color conversion layer and the sub-pixel without the color conversion layer becomes larger, and the color of the light of the picture is different through the viewing angle. After that. In view of such circumstances, the following technique has been disclosed as means for preventing a change in the illuminating color of the screen through the viewing angle of the display. Patent Document 3 discloses a pixel having a light-emitting function layer held on a first electrode and a second electrode on a substrate, and a plurality of pixels of the pixel set in the above-mentioned unit pixel group; The selected pixel is provided with an organic electroluminescence device that disperses the scattered portion of the illuminating light of the illuminating functional layer. According to the technique disclosed in Patent Document 3, as a sub-pixel of only the blue sub-pixel and the green sub-pixel, a light diffusing surface passing through the unevenness is provided, and a change in the color light passing through the viewing angle can be prevented. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2001-196175 (Patent Document 3) Japanese Laid-Open Patent Publication No. JP-A No. Hei. No. 2007-73219. However, in the above-mentioned embossing of Patent Document 3, the blue sub-pixel and the green sub-pixel are formed under the same size design, and the directivity of the light between the sub-pixels of different light is finely adjusted. Poor, it is impossible to prevent a change in the illuminating color through the viewing angle at a high level. Therefore, there is a review for countermeasures against changes in the illuminating color through the viewing angle. For example, 'trying to change the materials used in the red 'green' and blue color conversion layers. However, the material change used in the color conversion layer has an adverse effect on the color purity and/or brightness of the light emitted from the color conversion layer, and cannot be easily performed. Therefore, it is preferable to change the color of the color conversion layer without changing the color of the color conversion layer. The change in the illuminating color via the viewing angle is caused by the fact that the red, green, and blue light emitted through the color conversion layer are different in directivity as described above. Specifically, the directivity of red is small. On the other hand, the directivity of green and blue is large. Therefore, the above problem can be solved between red' and green and blue, such as to reduce the difference in directivity of light. Accordingly, it is an object of the present invention to provide that each color light generated from a color conversion layer does not adversely affect its color purity, brightness, and the like, and the difference in directivity of light of each color is reduced. An organic EL display exhibiting different illuminating colors at a viewing angle. SUMMARY OF THE INVENTION An object of the present invention is to provide a method of manufacturing the organic EL display. [Means for Solving the Problem] -9-201002123 The present invention relates to a color conversion filter portion including a substrate, a flattening layer and at least one color conversion layer, and an organic electroluminescence element having a plurality of light-emitting portions And an organic electroluminescence display having a plurality of sub-pixels defined by the plurality of light-emitting portions; and an interface having a concavo-convex shape between the substrate and the planarization layer, wherein the concavo-convex shape is for each of the sub-pictures An organic electroluminescent display having a different density of irregularities. The organic electroluminescent display of the present invention can be used as a display unit of an electronic device such as a mobile phone. Further, the present invention includes a first laminate in which a color conversion filter portion including a substrate and a planarization layer and at least one color conversion layer are bonded, and a substrate having a plurality of light-emitting portions The second layered body of the electromechanical excitation device unit defines a plurality of sub-pixels through the plurality of light-emitting portions, and has an interface having a concavo-convex shape between the substrate and the planarization layer, and the concavo-convex shape is Each of the aforementioned sub-pixels has an organic electroluminescent display having different concave and convex densities. In such an organic electroluminescent display, at least one of the color filter layers can be interposed between the substrate and the planarization layer. In this case, the interface between the substrate and the color filter layer has a concavo-convex shape, and the concavo-convex shape has a different concavo-convex density for each of the sub-pixels. In the organic electroluminescence display, the uneven shape may be a shape in which a plurality of concave portions and convex portions having a smaller period than the sub-pixel width are provided. Further, the uneven shape may be a shape having a different cycle shape for each of the sub-pixels'. -10-201002123 The present invention includes an art for forming a color-converting calender sheet portion including a color conversion layer having a reduced planarization on a substrate, and an organic conversion filter portion for forming a plurality of organic light-emitting portions. The optical element unit is configured to form a method for producing an organic electroluminescence display device of a multi-pixel by the plurality of light-emitting portions, and to form an uneven shape on the surface of the substrate that is in contact with the substrate, and to form the uneven shape as the sub-picture A method of manufacturing an organic electric actuator that is adjusted to different uneven density. Further, the present invention relates to a color conversion filter portion including a color conversion layer having a reduced planarization on a substrate, and a first layer of the layer is formed, and an organic light element portion having a plurality of light-emitting portions is formed on the substrate. 'The construction of the second layered body and the process of bonding the above-mentioned first integrated body and the second laminated body; and the manufacture of the organic electroluminescent display through the plural 'predetermined plural sub-pixels' The substrate surface in contact with the flat layer is formed into a concavo-convex shape, and the convex shape is adjusted to each of the sub-pixels to a method of manufacturing a different uneven density electroluminescent display. In such a method of fabricating an organic electroluminescent display, at least one of the color filters may be formed between the board and the planarization layer. In this case, a concave-convex shape is formed on the surface of the color filter layer contact plate, and the uneven shape is adjusted to a different unevenness density for each of the precursors. In the organic electroluminescent display, the concavo-convex shape can be adjusted to at least one period, a plurality of layers having a smaller sub-pixel width, and a sub-flat layer having the electric excitation number, and each of the light-display layers and the integrated body. The method of electrically exciting one layer of the light-emitting portion, wherein the concave organic substrate layer is in contact with the base pattern, and the concave portion -11 - 201002123 and the convex portion are arranged in a shape. Further, the uneven shape may be adjusted to be different for each of the sub-pixels. [Effect of the Invention] The organic electroluminescence display of the present invention is a sub-pixel specified by the light-emitting portion of the organic electroluminescence element unit, and the substrate surface is made of a specific shape. Between the pixels, the directivity of the light is finely adjusted, and the change of the illuminating color through the viewing angle is prevented at a high level. [Embodiment] Hereinafter, the principle of the present invention and the organic electroluminescent display of the present invention and The manufacturing method will be described. <Principle of the Invention> The present inventors determined the phenomenon of the change in the luminescent color by visually observing the angle of the organic electroluminescent display, and determined that the phenomenon is due to different colors (R, G, B). Among the sub-pictures, the directivity of light is different. Therefore, the inventors have concluded that the difference in the directivity of the light between the sub-pixels can be avoided. Specifically, in the interface portion between the substrate and the color filter layer or the planarization layer, the sub-pixel range defined by the light emission of the organic electroluminescence element portion is not formed by the sub-pixels of the different colors. The uneven portions of different densities pass the light of R, G, and B emitted from the organic electroluminescence element portion to the uneven portion of -12-201002123. As a result, the directivity of the interface is independently controlled by the directivity principle of the light, and the difference in the directivity of the light is controlled, and the problem that the luminescent color changes due to the angle of the visual organic device can be solved. However, the inventors of the present invention measured the angular distribution of the luminescence spectrum while the organic electroluminescence display was viewed from the front or the side of the illuminating display made by the method. The difference in the directivity difference between the lights of the respective colors is at the same time as the performance of the organic electroluminescent device portion of the color is maintained. <Organic electroluminescent display and method of manufacturing the same> [Organic electroluminescent display (Form 1)] Hereinafter, an embodiment of the present invention will be described in detail with reference to Fig. 1 . However, the following examples are illustrative of a single embodiment of the invention comprising a color filter layer, as may be suitable for the industry, i.e., for examples that do not contain a color filter layer, as explained. (Configuration of the whole) The organic electroluminescence display of the present invention (the color conversion filter unit 200 which is laminated on the transparent substrate 100 by the transparent substrate 100 as shown in the bottom emission type, and the color conversion filter unit) In the surface, the organic electroluminescence element unit 300 is changed to the light of the color filter unit 200 and the organic electroluminescence element unit 3 00', and the result of the organic electro-slanting surface of each excitation light is lowered. The details of the degree of completion and brightness are also described in detail, but only for design changes. The following description is based on the light entering the surface of one of the faces of Figure 1, and the color change and the external air are interrupted-13-201002123 (not The seal material shown in the figure). The transparent substrate 100 is a layer having respective constituent elements of the electromechanical excitation light display formed in order to support them. The transparent substrate 100 is made of a color filter layer 210 (R, G, B), a light shielding layer 220, and a red conversion layer 240 to be described later, and an organic electroluminescence element portion 3, which are resistant to light transmittance. 00 (electrode, organic light-emitting layer, etc.) conditions (solvent, temperature, etc.). Further, the transparent substrate 1 is formed in the subsequent processes, and it is preferable that the dimensional stability is superior in order to form the respective layers formed as the reverse. Further, as the transparent substrate 100, it is important to use a configuration that does not cause a decrease in the light-emitting performance of the multi-color light-emitting display, and examples thereof include glass, various plastics, and various films. The color conversion filter unit 200 is formed of stripe-shaped red (R), green (G), and blue (B) color filter layers 210R' 210G, 210B on one surface of the transparent substrate 100. The formed color filter layer 210, and the light shielding layer 220' embedded in the gap between the color filter layers, and the planarization layer 230 formed above the color filter layer 210 and the light shielding layer 220, And a red conversion layer 240 formed on the planarization layer 230 and formed at a position corresponding to the red (R) color filter layer 210R, and formed on the planarization layer 230 by encapsulating the red conversion layer 240 The gas barrier layer is composed of 250. The organic electroluminescent device unit 300 is formed on the gas barrier layer 250, formed on the transparent electrode 310 corresponding to the position of the color filter layer 210, and formed on the gas barrier layer 250. The organic electroluminescence layer 320 formed by encapsulating the transparent electrode 310 and the reflective electrode 330 formed on the organic light-14-201002123 excitation layer 320 are formed. (About the uneven shape) In the example shown in FIG. 1, a color filter layer of at least one color selected from the color filter layers 21 0R , 210G , and 210B of the respective colors (in the example shown in FIG. 1 , is green) The interface between the filter layer 21 0G and the blue filter layer 21 0B) and the transparent substrate 1 接合 bonded thereto has an uneven shape. The uneven shape of the interface (interface 1) between the green filter layer 210G and the transparent substrate 100, and the uneven shape of the interface (interface 2) between the blue filter layer 210B and the transparent substrate 100 are controlled as an interface at the incident external light. The reflection enhances the shape of the incident external light amount to the organic electroluminescence element portion 300 passing through the refraction. In addition, the uneven shape is a shape in which the emitted light from the electro-optic excitation light element unit 300 can be sufficiently scattered on the image surface. The uneven shape of the interfaces 1, 2 is such that the average depth of the depressions is 0.4 to 0.625 / / m. Here, the average depth of the depressions refers to the interface shape of each of the color filter layers 210 (G, B) and the transparent substrate 100 of FIG. 1, and the vertical direction of the paper surface of a certain convex portion and the paper surface of the adjacent concave portion. The difference in the position in the vertical direction is representatively measured as the average value of one measurement in the entire range of the horizontal direction of the paper surface of each of the color filter layers 210 (G, B). The depth is preferably 0.525 to 0.625# m. Further, the uneven shape of the interfaces 1, 2 is such that the density of the depressions is 〇 8 3 to 1.99 / / / m 2 . Here, the uneven density refers to the shape of the interface -15-201002123 between the green filter layer 210G and the blue filter layer 210B of the same figure and the transparent substrate 1 (the horizontal direction of the paper in the horizontal direction of the paper X in FIG. 1). The number of protrusions of 1 μ m2. The uneven density is preferably 0.83 to 1.18 / /zm 2 and the unevenness of the interface 1 ' 2 has an uneven depth and a concave-convex density as such a regular or irregular shape. By not excessively increasing the average depth of the recesses and the unevenness density, it is possible to control the disordered reflection of the incident external light to be excessively large, and to prevent the luminance loss of the light-emitting surface. Such a concavo-convex shape is attached to each of the sub-pixels (in the example shown in Fig. 1 'each of the green filter layer 210G and the blue filter layer 210B), and has a different uneven density. This is because the directionality of the light using the principle of the scattering can be made high to prevent the change of the illuminating color through the viewing angle. Specifically, the uneven shape is defined by a period of 1⁄2 or more of the wavelength of the changed light, whereby the unevenness density is adjusted, and the refractive index is adjusted to be emitted from each of the sub-pixels for each sub-pixel. The directivity of the light. Here, the period of the uneven shape refers to the horizontal distance of the finger surface between the adjacent convex portions of the respective color filter layers 2 1 0 (G, B) in the example shown in Fig. 1 . For example, in the case where the uneven density of the uneven shape of the interface 1 is 0.83 to 0.91 m2, it is preferable that the uneven density of the uneven shape of the interface 2 is 1.01 to 1.18 / " m2. In this way, when the unevenness density is finely adjusted between the sub-pixels, the difference in the directivity of the light between the sub-pixels can be reduced, and the difference in the luminescent color via the viewing angle can be sufficiently prevented. In the case shown in FIG. 1, in the pixel (the whole of FIG. 1), the portion corresponding to the light-emitting portion of the organic electroluminescence element portion - 16102102123, that is, the transparent electrode 3 is provided. The width of the 1 0 part. However, although the interface between the red color filter layer 21 OR and the transparent substrate 100 shown in FIG. 1 is not completely covered with irregularities, in the present invention, the unevenness density at the interface is described as the flaw, and the interface is also included. Each sub-pixel has a different density of concave and convex. As a specific example of such a concavo-convex shape, it is possible to have a configuration of a concave portion and a convex portion having at least one cycle and a smaller sub-pixel width. Further, as a specific means for making the unevenness density of the unevenness of the interfaces 1, 2 different, it is possible to attach a concave-convex shape of a different period to each sub-pixel (each interface 1, 2). For the formation of the uneven shape of the interfaces 1, 2, first, irregularities are formed on the surface of the transparent substrate 1A corresponding to the pattern of the color filter layers 210G, 210B. Next, on the pattern, the selected color filter layers 2 1 0G, 2 1 0B are stacked. As a method of forming the unevenness on the transparent substrate 1 , a method of roughening the surface of a general surface can be used, for example, a method of etching a photoresist pattern using a mask, via a chemical, a plasma, or the like. . Further, it is also possible to use a mask and a honing agent to remove the surface, for example, a sandblasting method, a method of rubbing the teeth, and a mechanical method of removing the surface. When a glass substrate is used as the transparent substrate 100, a honing material having an average particle diameter of 5 " m is used by a sand blasting method, and when it is treated for 2 to 8 seconds, preferably 3 to 7·5 seconds, The optimum concavities and convexities are formed on the surface of the glass substrate. By not excessively lengthening the processing time, it is possible to control the unevenness of the unevenness of the uneven shape to prevent the brightness of the treated surface from being damaged. -17- 201002123 However, in the example shown in Fig. 1, the interface between the red color filter layer 210R and the transparent substrate 1 is not attached with a concavo-convex shape. The red color filter layer 210R' is attached to the transparent substrate 1A, and can be laminated by various known methods. For example, a known red filter material is applied by a spin coating method, and can be formed by patterning by a micro-gloss method. (Components of the organic electroluminescence display) Hereinafter, among the constituent elements of the organic electroluminescence display shown in Fig. 1, elements other than the above-described substrate 100 will be described in detail. Color filter layer 210 The color filter layer 210 is a layer that is incident on the incident light of the layer and is lifted by a specific wavelength in order to obtain the color purity of light having a certain range of wavelengths. The color filter layer 210 (R, G, B) on the transparent substrate 100 can be formed using a material for a flat panel display. The color filter layer 210 can be used as a blue filter layer that transmits a wavelength of 400 to 550 nm, a green filter layer that transmits a wavelength of 500 to 600 nm, and a red filter that transmits a wavelength of 600 nm or more. The structure of the slice. These color filter layers are formed of a photosensitive resin layer which is preferably a dye or a pigment, which is preferably a pigment dispersed. As a dispersion pigment, an azo color system, an insoluble gas system, a condensed azo system, and the like are preferably used. Indigo cyanine, quinolin [I fluorenone-18-201002123, dioxazine, isoindolinone, anthraquinone, thioindole, dinaphthene benzene] and these mixed systems. The color filter layer 210 has a stripe pattern formed by repeating red (R), green (G), and blue (B), and each pattern has a pattern width of 60 to 100 /zm, and is 70 to 90/zm. The pattern is spaced apart on one of the faces of the transparent substrate 1〇〇. As the method of forming the color filter layer 210, a coating method can be used, and it is particularly preferable to use a light treatment. The light-shielding layer 220 is formed by the purpose of improving the contrast by not transmitting the visible region to each of the color filter layers. The light shielding layer 220 is formed using a material for a general flat panel display. As a method of forming the light shielding layer 220, a coating method can be used, and in particular, a light treatment is preferred. The planarization layer 203 is formed by the purpose of protecting the color filter layer 210 (R, G, B). In addition, the flattening layer 230 is formed so as not to affect the dimensional accuracy of each layer above the layers 210 and 220 in order to be a step generated by the color filter layer 210 and the light shielding layer 220. Floor. Therefore, the flattening layer 203 is required to be rich in light transmittance, and is formed by selecting a material and a process which do not deteriorate the color filter layer 210 (R, G, B). As a material which can be applied to the planarization layer 203, light-hardening or -19-201002123 photothermal curing resin is light- and/or heat-treated, and the atomic species 'ion species are generated to be polymerized or cross-linked'. The composition as insoluble and non-melting is general. Further, in order to perform patterning, the photocurable or photothermal curing resin is preferably one which is soluble in an organic solvent or an alkaline solution before curing. Specifically, 'as a photocurable or photothermal curing resin, (1) an acrylic polyfunctional monomer or oligomer having a plurality of acrylonitrile groups, isobutylene groups, and light or thermal polymerization a film formed of a starting agent, which is subjected to light or heat treatment to cause photopolymerization or thermal radical generation to be polymerized, and (2) a composition of polyethylene cinnamic acid ester and a sensitizer, which is subjected to light or heat treatment. (3) a film of a composition of a chain or a cyclic olefin and a bisazide, which is produced by light or heat treatment, and a olefin is crosslinked, and (4) will have A film of a composition of a monomer of an epoxy group and a photooxygen generator is produced by light or heat treatment to generate oxygen (cation). In particular, in the case of using the photocurable or photothermal curing resin of the above (1), it can be patterned by light treatment, and is excellent in reliability in terms of solvent resistance and heat resistance. Examples of other photocurable or photothermal curing resins include polycarbonate (PC), polyethylene terephthalate (PET), polyether oxime, polyvinyl butyral, and polyphenylene. Ether, polyamine, polyetherimide, norbornane resin, isobutylene resin, isobutylene maleic anhydride copolymer resin, thermoplastic resin such as ring-20-201002123 olefin, epoxy resin, ethyl phenol resin Resin, acrylic resin, ethyl acrylate resin, imine ethyl formate resin, urea resin, melamine [formaldehyde] tree thermosetting resin, or contain polystyrene, polypropylene, polycarbonate functional 'or 4-functional The polymer of the alkoxy decane is mixed as the method of forming the planarization layer 230, and it is preferable to use a coating method using a light treatment. However, Fig. 1 is an example in which the color filter layer 210 is included, and in the case where the color filter layer 210 is entirely contained, an uneven shape is formed at the interface of the transparent substrate 1 2 layer 203. In this case, it is also possible to use a cloth method, especially a light processor. Red conversion layer 240 The color conversion layer is a sensory pigment that disperses the fluorescent pigment in a near-ultraviolet range or a visible range, absorbs the fluorescent pigment, and has a fluorescent light-emitting function that reflects the visible range of the wavelength of the incident light. Made of layers. In the example shown in Fig. 1, only the red conversion layer 240 is used among the red conversion layer, the green layer, and the blue conversion layer. The fluorescent pigment in the blue-green-green range that absorbs the light emitted by the organic electroluminescence device unit 300 is used as a fluorescent pigment for the layer 240 of the fluorescent light in the red range, and examples thereof include Rhodamine B and 6G. Rhodamine 3B, Rhodamine 101, Rhodamine 10, Sulfhydrazine, Basic Rhodopsin 1 1 , Basic Red 2, etc. Rhodamine pigment, Phthalocyanine, 1-ethyl-2-[4 -(p-dimethylaminophenyl)-1,3-butadiene, amine methyl ester, amine lipid, etc., and the like. Especially in the case of unfinished and flat use, the color of the tree is changed, and even the color of red is changed to danming, the color of the pigment, the color of the pigment, the stagnation of the stagnation, the stagnation of the sputum, the sputum Steep pigments and chewable pigments. Further, various dyes such as direct dyes, acid dyes, basic dyes, disperse dyes and the like can also be used in the form of fluorescence. Although it is not used in the example shown in FIG. 1, it is used for absorbing the blue or even cyan-range light emitted by the organic electroluminescence device unit 300, and is used for fluorescing the green-converted layer of the fluorescent light in the green range. Examples of the coloring matter include 3-(2'-benzothiazole)-7-dimethylaminocoumarin (coumarin 6) and 3-(2'-benzimidazole)-7-dimethyl group. Aminocoumarin (coumarin 7 ), 3-(2'-N-benzimidazole)-7-dimethylaminocoumarin (coumarin 30), 2,3,5,6-111, 411-tetrahydro-8-trifluoromethylquinazine (9,93,1-811) Coumarin dyes such as coumarin (coumarin 153) and coumarin dyes such as basic yellow 51 , ophthalmide pigments such as Solvent Yellow 11, Solvent Yellow 116, and the like. Further, various dyes such as direct dyes, acid dyes, basic dyes, and disperse dyes can also be used in the form of fluorescence. The blue conversion layer is generally abbreviated to have a wavelength range which is slightly the same as the wavelength range of the light which is selected to be emitted by the organic electroluminescence element unit 300 in the blue color filter layer 210B, and is not normally omitted in the example shown in FIG. use. However, instead of omitting the blue conversion layer, a transparent photosensitive resin layer can be formed as a mold. The color conversion layer (in the example shown in Fig. 1 , the red conversion layer 240) can be formed by various dry processes, and it is preferable to form it by a vacuum vapor deposition method without forming an organic material. As the heating method of the vacuum evaporation method, either a direct heating method or an indirect heating method may be used, and in particular, resistance heating, electron beam heating, or infrared heating may be used -22-201002123. In the case where a plurality of color conversion dyes are used to form a color conversion layer, a preliminary mixture of a plurality of color conversion dyes is mixed in a predetermined ratio, and a preliminary mixture can be used for co-evaporation. Further, a plurality of color conversion dyes may be disposed in individual heating portions, and the respective color conversion pigments may be individually heated to perform co-evaporation. In particular, in the case where a plurality of kinds of color conversion dyes have large differences in characteristics such as vapor deposition rate and/or vapor pressure, it is advantageous to use the latter method. The thickness of the color conversion layer (in the example shown in FIG. 1 , the red conversion layer 240 ) is preferably 1/m or less, and is preferably at a point where the function of the color conversion layer can be exhibited, and 200 nm to 1 nm. The zm is better at the point where the color conversion layer can be effectively utilized. Gas barrier layer 250 The gas barrier layer 25 is a layer formed to prevent intrusion of moisture and/or oxygen from the outside to the color conversion layer (in the case of the same figure, the red conversion layer 240). This color change pigment is an organic matter 'weakness to moisture'. Here, the purpose of the stroke of the gas barrier layer 25 is the protection of the red conversion layer 240. However, in the example shown in FIG. 1, not only the red conversion layer 240 but also the planarization layer 230 is protected. However, this configuration is also effective for protecting the organic electroluminescent layer 320 to be described later in order to prevent leakage of moisture from the color conversion filter unit 200. As a material which can be applied to the gas barrier layer 250, it is possible to use a material having electrical insultability and having a high transparency for the gas and the organic solvent 1 and having a high transparency in the visible region of the -23-201002123 (The transmittance in the range of 400 to 7 〇〇 nm is 50% or more). Further, the hardness formed on the gas barrier layer 250 to withstand the formation of the transparent electrode 310 or the like described later is preferably a material having a film hardness (pencil hardness) of 2H or more. However, this film hardness (pencil hardness) is based on the standard of JIS K5600-5-4. As the specific gas barrier layer 250, for example, an inorganic oxide such as SiOx, SiNx, SiNxOy, AlOx, TiOx, TaOx or ZnOx, or an inorganic nitride or the like can be used. The method for forming the gas barrier layer 250 is not particularly limited, and a sputtering method, a CVD method, a vacuum deposition method, or the like can be used. Further, the gas barrier layer 250 is of course a single layer, and may be a laminate of a plurality of layers. The color conversion filter portion 200 is formed on the transparent substrate 1A as described above. Transparent Electrode 3 1 0 As a material applicable to a transparent electrode, ITO, tin oxide, indium oxide, IZO, zinc oxide, zinc-aluminum oxide, zinc-gallium oxide, or for such oxides can be used. A conductive transparent metal oxide of a dopant such as F or Sb is added. Further, the transparent electrode 310 is formed by a vapor deposition method, a sputtering method or a chemical vapor deposition method (CVD), and can be obtained by patterning using a photolithography method or the like. Among such formations, in particular, sputtering is preferred. The transparent electrode 3 1 0 can also be used as either an anode or a cathode. For the case where the transparent electrode 310 is used as a cathode, a cathode buffer layer (not shown) is formed between the transparent electrode-24-201002123 310 and the organic electroluminescent layer 320, and the organic electroluminescent layer 3 is lifted. The electronic implantation efficiency of 20 is better. As a material applicable to the cathode buffer layer, an alkali metal such as Li, Na, K or Cs, an alkaline earth metal such as Ba or Sr, an alloy containing such a metal, a rare earth metal, or a fluorine of such a metal can be used. Compounds and the like. The film thickness of the cathode buffer layer is preferably 1 Onm or less from the viewpoint of ensuring transparency. On the other hand, in the case where the transparent electrode 3 10 is used as an anode, a layer of a conductive transparent metal oxide is provided between the transparent electrode 310 and the organic electroluminescent layer 320 to enhance the organic electroluminescence. The hole implantation efficiency of layer 320 is good. As a material suitable for the conductive transparent electrode, ITO, tin oxide, indium oxide, IZO, zinc oxide, zinc-aluminum oxide, zinc-gallium oxide may be used, or for these oxides, F or The material of the dopant such as Sb. The organic electroluminescent layer 320 (the organic electroluminescent layer 32 includes at least an organic luminescent layer, and if necessary, has a hole implant layer, a hole transport layer, an electron transport layer, and/or an electron implant layer intervening. As the layer structure of the specific organic light-emitting element portion, the following structure can be employed. (1) Anode/organic light-emitting layer/cathode (2) Anode/hole implant layer/organic light-emitting layer/cathode (3) Anode /organic light-emitting layer /electron implant layer /cathode (4) anode / hole implant layer / organic light-emitting layer / electron-implant layer / cathode (5) anode / hole transport layer / organic light-emitting layer / electron-implant layer /Cathode-25- 201002123 (6) Anode/hole implant layer/hole transport layer/organic light-emitting layer/electron implant layer/cathode (7) anode/hole implant layer/hole transport layer/organic light Layer/electron transport layer/electron implant layer/cathode However, in the layer structure of the above (1) to (7), the anode and the cathode are any one of the transparent electrode 310 and the reflective electrode 330. A material of each layer of 320 may be a known constituent. Further, each layer constituting the organic electroluminescent layer 320 is formed. It can be formed by any method known in the art of steaming or the like. For the case where the red conversion layer 240 shown in Fig. 1 is used, the organic electroluminescence layer 30 is realized from blue to blue. A green illuminator is important. As a material which can be applied to an organic light-emitting layer which emits light from blue to cyan, for example, a benzothiazole-based, benzimidazole-based or benzoxazole-based system can be used. Fluorescent whitening agent, metal chelated oxynium cation compound, styryl benzene compound, or aromatic methine compound, etc. Further, in the example shown in Fig. 1, the luminescence of the organic light-emitting layer is necessary It can also be used as white light. However, it is important to use a well-known red dopant in this case. This is not shown in Fig. 1, but the case of using a green conversion layer as a color conversion layer The luminescence of the layer is important as a luminescence from blue to red. The reflective electrode 3 3 0 -26- 201002123 As a material applicable to the reflective electrode 330, a high reflectivity metal is used, and a high reflectance is not used. A shape alloy, or a highly crystalline microcrystalline alloy is preferable. Examples of the metal having high reflectance include A1, Ag, Mo, W, Ni, or Cr. As an amorphous alloy having high reflectance, For example, NiP, NiB, CrP, or CrB may be mentioned. Examples of the high-reflectivity microcrystalline alloy include NiAl. The reflective electrode 3 30 may be used as either an anode or a cathode. When the cathode is used as a cathode, a cathode buffer layer (not shown) is formed between the reflective electrode 310 and the organic electroluminescent layer 2020 to enhance the electron implantation efficiency for the electromechanical excitation layer 3 20 . It is better. Alternatively, for a metal having a high reflectance characteristic as described above, an amorphous alloy or a microcrystalline alloy, a material having a small function, that is, an alkali metal such as lithium, sodium or potassium, or calcium, magnesium or strontium is added. It is alloyed with an alkaline earth metal to improve the efficiency of electron implantation. On the other hand, in the case where the reflective electrode 303 is used as an anode, a layer of a conductive transparent metal oxide is provided between the reflective electrode 303 and the organic electroluminescent layer 320, and the organic electroluminescent layer 320 is lifted. The hole implantation efficiency is good. As a material suitable for the conductive transparent electrode, ITO, tin oxide, indium oxide, IZO, zinc oxide, zinc-aluminum oxide, zinc-gallium oxide may be used, or for these oxides, F or The material of the dopant such as Sb. As a method of forming the reflective electrode 330, depending on the material to be used, any means known as vacuum vapor deposition, sputtering, ion plating, or laser stripping can be used. However, unlike the example shown in FIG. 1, 'the case where the reflective electrode 3 3 0 formed by the plurality of partial electrodes becomes necessary -27-201002123, a partial mask formed by imparting a desired shape to the photomask may be used. The resulting reflective electrode 330. In the example shown in Fig. 1, the reflective electrode 330 has a stripe pattern intersecting the pattern of the transparent film, and the intersecting range is a sub-pixel. However, as described above, the obtained organic electroluminescence light shows a dry nitrogen environment (the environment in which the concentration of 〇2 and the concentration of H20 is 10 ppm or less) in the glove box, and is formed by using a sealing glass and a chemical adhesive (not shown). Sealed and sealed. [Organic Electroluminescence Display (Form 2)] Next, other embodiments (Form 2) and 2 of the present invention will be described. However, in the following, only the difference between the organic electroluminescent display (form 1) and the overall configuration is shown in detail (the entire configuration) of the organic electroluminescent display (front emission type) of the present invention. The first body X of the color conversion filter unit 200 of the substrate 100 and the organic electroluminescent device unit 300 are formed on the substrate 400, and the light incident surface of the color conversion filter unit 200 is made to emit light. The element portion 300 is configured to be bonded to the state of the crucible by thermal curing of the layer 500. Further, the organic light display shown in Fig. 2 includes a sealing material for blocking the color conversion filter unit 200 and the organic electromagnet element portion 300 from the outside air (not shown). The transparent substrate 100 is made of a plurality of bright electrodes and is an illuminator at the same time as a UV hard according to the figure and the second organic type of the above-mentioned layer 2 is laminated. A layer of each of the constituent elements (the color filter layer 210' light-shielding layer 220, the planarization layer 230, the red conversion layer 240, and the gas barrier layer 250) of the color conversion sheet portion 200 to be formed is formed. The transparent substrate 1 is a member (solvent, temperature, etc.) that can withstand the formation of such constituent elements. The other conditions for the transparent substrate 100 are the same as those of the transparent substrate 100 shown in FIG. The other conditions of the color conversion filter unit 200 and the organic electroluminescence element unit 300 are the same as those of the transparent substrate 100 shown in Fig. 1 . The base 400 is for supporting the constituent elements of the organic electroluminescent device 300. The base 400 is a member (solvent, temperature, etc.) which is resistant to the formation of the organic electroluminescent device unit 300. The other conditions for the substrate 400 are the same as those of the transparent substrate 1. The adhesive layer 500 is a component used for bonding the first laminate X and the second laminate Y. The adhesive layer 500 is not particularly limited as long as it has visible light transmittance and is not damaged by the red conversion layer 240 and the organic electroluminescence layer 32. For example, a general thermoplastic resin can be used, and a heat-curable thermosetting resin having a temperature of from room temperature to 1 20 ° C or less can be cured by visible light or light and heat. [Manufacturing Method of Organic Electroluminescence Display (Form 2)] First, similarly to the organic electroluminescent display (Form 1) shown in FIG. 1, a color filter layer 210 is sequentially formed over the substrate 100 to shield light. The layer 220, the planarization layer 230, the red conversion layer 240, and the gas -29-201002123 barrier layer 2 50, obtain the first layered body X. Next, the first layered body X is individually formed on the substrate to form the reflective electrode 330, and the organic electroluminescent layer 320, 3 10 is obtained to obtain the second layered body Υ. The formation pattern of β or the like of the base 400 is further changed depending on the formation type of the corresponding constituent elements of the organic electric gift (form 1) shown in Fig. 1 and is in the color conversion filter unit 200. The light-emitting element of the light-emitting element of the light-emitting element is in the state of the enamel, and the second layer is formed by the heat-hardening of the adhesive layer 500, and the obtained organic electroluminescent display is dried. In the environment (the environment in which the 〇2 concentration and the Η20 concentration are simultaneously), the color conversion filter unit 200 and the organic 罨300 are sealed by using a UV-hardenable sealing layer (not shown). [Embodiment] Hereinafter, the present embodiment and the comparative example will be confirmed. However, in the following examples and comparative examples, the pixels of the respective sub-pixels of B and B are at a pitch of 3333 mm and a dragon of 160 , 120 organic electroluminescence light is formed in the lateral direction <Production of Organic Electroluminescence Display> (Embodiment 1) The organic electroluminescence display of Example 1 was sequentially applied as a 礓4 透明 with a transparent electrode ί electrode 3 3 0 (light-emitting display line. The organic electric one-layered body X is bonded to each other. In the glove box, the effect of the excitation light element I is sealed by 1 Oppm. The display includes R and G t in the longitudinal direction to form a display. 201002123 type display. Prepare a glass substrate of 200mm x 200mm x 0.7mm. First, use a pattern of a Cr film (film thickness: 100 nm) as a mask at a specific pitch, using dry etching (C4F8: 16msccm, CH2F2: 16Sccm, barium pressure) .8Pa and power 2kW)), the blue sub-pixel region on the color filter layer side of the substrate is formed in a straight conical shape with a depth of 0.6 vm and a pitch of O-2/zm, and then the green sub-pixel The pixel region is formed on a substrate 100 having a straight conical shape with a depth of 〇4/zm and a pitch of 0.3/zm. On the substrate 100, a coating liquid for a light-shielding layer (manufactured by CK840 0L Fuji Film ARCH) was applied by spin coating, and then dried at 80 °C. Then, using the photolithography method, a pattern of sub-pixel size (longitudinal direction 80//mx horizontal direction 300 " m, thickness direction 1 // m) is formed at a pitch of 3 3 0 // m, and is superposed on the substrate 100. The light shielding layer 220 is accumulated. For the formation of the blue color filter 21 0B, a blue color filter material (Fuji film ARCH system: color mosaic CB-700 1 ) is applied to the substrate 100 by spin coating method. Patterned. Specifically, a substrate 1〇〇 of a straight conical shape with a depth pitch of 2.2#m is drawn. Thereby, the area of the substrate of the blue color filter 210B is obtained in a depth of 〇·6 /zm, a pitch of 〇. 2 # m, an average density of 0_88 / / m2, a straight conical convex and concave area size 80 /zmx300 # m, line thickness 2 / zm line pattern. For the formation of the green color filter 21 0G, a green color filter material (Fuji film ARCH system: color mosaic CG-700 1 ) was applied to the substrate 100 by spin coating method [patterning by photolithography] . -31 - 201002123 Specifically, 'depicted in a substrate having a straight conical shape and convexity formed at a depth of 4.4"m' pitch 〇.3#m 100° thus a green color filter 2 1 0 G substrate The side 'is obtained in a depth of 0 · 4 μ m, a pitch of 〇. 3 /zm, an average density of 1.99 / / / m2 of straight conical convex and concave area size 80 / / mx300 / zm, film thickness 2 min m line pattern. For the formation of the red color filter 210R, a red color filter material (Fuji Film ARCH: Color Mosaic CR-7001) is applied onto the substrate 1 by spin coating, and patterning by photolithography is performed. . Specifically, a line pattern of a region size SO/zmxSOOMm and a film thickness of 2//m was obtained. Then, the formation of the planarization layer 203 is performed by applying a planarization layer material (manufactured by Nippon Steel Chemical Co., Ltd.: V-259PA) to the color filter 210 and the light shielding layer 220 via a spin coating method. The film thickness of the planarization layer 203 in the range in contact with the light shielding layer 220 is 2.5 // m. Incidentally, the flattening film was formed under the same conditions on the glass substrate, and the refractive index was measured. The flattening layer of the present embodiment was found to have a refractive index of 1.5. The layered body having the layer of the obtained planarization layer 203 or less as described above is heated to 200 ° C in a dry nitrogen atmosphere (water concentration of 1 ppm or less) to remove residual water. Share. The laminate was placed in a vacuum evaporation apparatus, and DCM-R was vapor-deposited at a vapor deposition rate of 0.3 A/s under a pressure of r4 Pa to form a red conversion layer 240 having a film thickness of 00 nm. Incidentally, another When a DC MR film is formed on the glass substrate under the same conditions, and the refractive index is measured, the red-transformed layer of the present embodiment is known to have a refractive index of 1.9. -32- 201002123 and more than using the plasma CVD method A gas barrier layer 250 is obtained by laminating a SiNH film having a thickness of 300 nm. As the source gas, 100 SCCM of SiH4, 500 SCCM of NH3, and 2000 SCCM of N2 are used, and the gas pressure is 80 Pa. In the RF power of 27 MHz, 〇·5 k W is applied. Incidentally, when a SiNH film is formed under the same conditions on a glass substrate, and the refractive index is measured, the planarization layer of the present embodiment has a refractive index of 1.95. The transparent electrode 310/organic electroluminescent layer 320 is formed on the substrate 1A and the color conversion filter portion 200 which are sequentially formed as described above (hole implant layer/hole transport layer/organic light-emitting layer/ Electron transport layer) / reflective electrode 330 The organic electroluminescent device 300 is formed. The transparent electrode 3 10 forms an In-Zn oxide pattern. A 200 nm In-Zn oxide film is formed at room temperature by DC sputtering. For the sputtering target, it is used. In the In-Zn oxide target, Ar and oxygen are used as the shovel gas. After the photoresist is patterned by the photolithography method, the wiring width is formed by using oxalic acid as an etching liquid as a patterning. 100/zm pattern. After patterning, dry treatment (150 ° C) and UV treatment (room temperature and 150 ° C). After UV treatment, the laminate is placed in a resistance heating vapor deposition device, and electricity is applied. The hole implant layer, the hole transport layer, the organic light-emitting layer, and the electron-implanted layer are sequentially formed into a film without breaking the vacuum to form an organic electro-optic light layer 32. When the film is formed, the vacuum chamber is pressed and decompressed. To lxl〇_5Pa. The hole implant layer is layered with 100nm phthalocyanine (CuPc). The hole transport layer is layered with 20nm 4,4'-bis[N-(1-naphthyl)-N-aniline] Biphenyl (α-NPD). Organic hair -33- 201002123 Layer of light layer 30nm 4,4'-bis(2,2-biphenylene)]biphenyl (DPVBi). Electron implantation A layer of 20 nm of ruthenium porphyrin (Alq) was laminated. Next, a mask having a stripe pattern having a width of 0.30 mm and a gap of 0.30 mm was obtained perpendicularly to the line of the transparent electrode 310, and Mg/Ag having a thickness of 200 nm was used. A 10:1 weight ratio) of the reflective electrode 3 3 0 formed by the layer was formed without breaking the vacuum. As the obtained laminate, a UV-curable adhesive (available from Threebond Co., Ltd., trade name 30Y) coated with glass beads having a dispersion diameter of 6 μrn was used in a nitrogen atmosphere in a glove box using a dispenser robot arm. -437) The outer peripheral sealing glass was bonded, and ultraviolet rays of 1 〇〇mW/cm2 were irradiated for 30 seconds to harden the outer peripheral sealing layer to obtain an organic electroluminescent display of Example 1. (Embodiment 2) The organic electroluminescent display of Embodiment 2 is a display of the form shown in Fig. 2. For the formation of the substrate 100, and for the light shielding layer 220 above the substrate 100, the color filter layer 210, the planarization layer 230, the red conversion layer 240, and the gas barrier layer 25 are sequentially formed, and the embodiment 1 is In the same manner, the first layered body X is obtained. Next, a glass substrate as the substrate 400 was separately prepared, and a reflective electrode 3 30 made of indium tin oxide (ITO) having a film thickness of 20 Å was formed by a sputtering method and a photolithography method. The shape of the reflective electrode 3 30 is a stripe pattern extending in the longitudinal direction of the wiring width of 1 0 0 // m. Furthermore, the reflective electrode 330 is formed on the base layer of the substrate 400, and the -34 - 201002123 is placed in the resistance heating evaporation device. The electron implantation layer, the organic electroluminescence layer, the hole transport layer, and the hole implant are formed. The in-layer layer "layers the pressure in the vacuum chamber while maintaining the pressure in the vacuum chamber at lxlO_5Pa to form an organic electroluminescent layer 320. Next, on the organic electroluminescence layer 2020, a reticle that obtains a stripe pattern perpendicularly intersecting the reflective electrode 3 3 0 having a pattern width of 0.30 mm and a pattern distance of 〇.〇3 mm is used to maintain the vacuum while the thickness is 200 nm. Mg/Ag (weight ratio is Mg:Ag=10:1) is formed as the transparent electrode 310. Finally, a layer covering SiN from a substrate 400 to a transparent electrode 310 was formed to form a protective layer (not shown) made of SiN having a thickness of 500 nm to obtain a second layered body Y. The first layered body X and the second layered body Y thus obtained were transported to a bonding apparatus managed to have a water concentration of 1 ppm and an oxygen concentration of 1 ppm. Using a dispenser robot arm, a UV-curable adhesive (manufactured by Threebond Co., Ltd., trade name: 30 Y-43 7 ) of a glass bead having a diameter of 6 /zm was applied as a peripheral sealing layer in the first layered body X. A specific amount of the heat-curing adhesive was dropped at the center thereof, and the atmosphere was removed by a vacuum of IPa in the bonding apparatus. Next, the gas barrier layer 250 and the (not shown) sheath layer are placed on the upper surface of the sheath layer, and the layered body Y is placed thereon, and pressed to adhere the layered body X'Y. After the outer peripheral sealing portion is protected by a photomask, it is cured by irradiating ultraviolet rays of 100 mW/cm 2 for 30 seconds, and then heating at 100 ° C for 1 hour to perform heat curing of the outer peripheral sealing portion and the heat-curing adhesive. The organic electroluminescent display of Example 2. -35-201002123 (Comparative Example 1) The organic electroluminescent display of Comparative Example 1 is a display of the formula of Fig. 3. Preparation of 200mmx20〇mrnx〇.7mm glass First, on the substrate, the shading method (CK8 400L Fujifilm ARCH system) is applied by spin coating to 8〇. (: After that, the light lithography method was used to form an inch (80 ymm in the longitudinal direction, 30 〇em in the longitudinal direction, and a thickness direction pattern), and a light shielding layer 22 0 was laminated on the substrate 1 使用. The formation of the color filter 210B is performed by applying a blue color furnace sheet material (Fuji film: color mosaic CB-700 1 ) to the substrate via a spin coating method, and specifically, by the photolithography method, a region size of 80 jum x 300 / Zm, film thickness line pattern. For the formation of the green color filter 210G, the green color filter material (Fuji film: color mosaic CG-7001) is applied to the substrate by spin coating, and the photolithography method is used. In other words, a region size of 80"mx300//m, a film thickness line pattern is obtained. Thereafter, for the red color filter 21 0R, the planarization layer 230, the layer 240, the gas barrier layer 250, the transparent electrode 310, the light layer 320, The formation of the reflective electrode 330 and the sealing means were carried out in the same manner as in the example to obtain the organic electro-exciter of Comparative Example 1. The substrate shown was formed. The top layer was coated with a coating liquid to dry the sub-grain ruler - m ) on 100 , ARCH patterning 2 m 图案 图案 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 Display in the form of. Prepare 200mm><200 mm x 0.7 mm glass substrate. First, a Cr film (film thickness l 〇〇 nm) formed by patterning is used as a mask at a specific pitch, and a dry etching method (C4F8: 16 ms CCm, CH 2 F 2 : 16 sccm, pressure 0.8 Pa, and power 2 kW) is used. The blue sub-pixel region and the green sub-pixel region on the color filter layer side of the substrate are formed at a depth of 0.6 " m, and a straight conical concave and convex substrate having a pitch of 0.2 // m is 100° on the substrate 1 On the other hand, the coating liquid for a light-shielding layer (CK8400L Fujifilm ARCH) was applied by spin coating, and dried at 80 ° C. Thereafter, a pattern of a sub-pixel size (300/zm in the longitudinal direction of 300/zm in the lateral direction and 1 μm in the thickness direction) was formed by a photolithography method at a pitch of 3 3 Ο μm, and the light-shielding layer 220 was laminated on the substrate 100. For the formation of the blue color filter 210B, a blue color filter material (Fuji soft film ARCH system: color mosaic CB-70 0 1 ) is applied to the substrate 1 by spin coating [implementation via photolithography] The pattern of the law. Specifically, a substrate 100 formed in a straight conical shape having a depth of 0.6 #m and a pitch of 0.2/zm is drawn. Thus, the substrate side of the blue color filter 210B is obtained in a region having a depth of 0.6 vm, a pitch of 〇. 2 // m, an average density of 0.88 / " m2, and a concave and concave area size 80 "m><300 ym, a line pattern having a film thickness of 2 em. For the formation of the green color filter 210G, a green color filter material (Fuji Film ARCH-37-201002123: Color Mosaic CG-7001) is applied onto the substrate 1 by spin coating, and light lithography is performed. The pattern of the law. Specifically, a substrate 100 formed in a straight conical shape and which is formed at a depth of 〇.6//ιη' of 0.2/im is drawn. Thus, on the substrate side of the green color filter 2 10G, a region size 80 of a straight conical shape formed at a depth of 0.6 // m 'spacing 0·2 // m 'average density of 0.88 / / m 2 is obtained. //mx30〇Mm, line pattern of film thickness 2#m. Thereafter, for the red color filter 210R, the planarization layer 230, the red conversion layer 240, the formation of the gas barrier layer 250, the transparent electrode 310, the organic electroluminescent layer 320, and the reflective electrode 330, and the sealing process' The organic electroluminescent display of Comparative Example 2 was obtained in the same manner as in the examples. <Evaluation item> With respect to the organic electroluminescence display devices of Examples 1, 2 and Comparative Examples 1 and 2, subjective evaluation of the luminescence viewed from the front side and the inclined surface was performed at the time of D65 white light lighting. The results are shown in Table 1. However, the observation from the bevel is observed from the position of 45 degrees for the normal of the organic electroluminescent display. [Table 1] Subjective evaluation (front) Subjective evaluation (left and right slope) Subjective evaluation (upper and lower slope) Example 1 White and white Example 2 White and white (Comparative Example 1) White pink pink (Comparative Example 2) White tea Green tea green-38 - 201002123 From the results of Table 1, in the first and second embodiments in which the interface between the substrate 100 and the blue and green filters 210B and 210G is different in the uneven density, the bottom emission type (Example 1) and the front emission Any of the types (Example 2) also determines the change in the luminescent color of the screen without the viewing angle. On the other hand, in Comparative Example 1 in which the interface between the substrate 1 and the blue and green filters 21 0B and 2 10G was not used as the uneven density, it was confirmed that the change in the luminescent color of the screen via the observation angle was remarkable. Further, in Comparative Example 2 in which the interface between the substrate 100 and the blue and green filters 210B, 2 10G was the same unevenness density, the change in the luminescent color of the screen through the observation angle was determined. Incidentally, no change was observed for the luminance and chromaticity of Examples 1, 2 and Comparative Examples 1, 2. Accordingly, in the organic electroluminescence display of the first and second embodiments, it is determined that the interface between the substrate and the color filter has a structure for adjusting the unevenness density of each of R, G, and B, while maintaining brightness and chromaticity. The difference in directivity of light between R, G, and B can be reduced. However, the above results are suitable for adjusting the interface between the substrate and the color filter. However, in the case where the color filter is not present, it is expected that an example in which the interface between the substrate and the planarization layer is appropriately adjusted can be obtained. result. [Industrial Applicability] In the present invention, the interface between the substrate and the color filter or the planarization layer is a specific shape, and the difference in directivity of the light is finely adjusted between the sub-pixels of the different colors, which can be high. The level prevents the change of the illuminating color through the viewing angle. The present invention is promising in that it is possible to provide various electronic devices such as a mobile phone having a display unit that does not have a change in the illuminating color of the viewing angle, as in the case of -39-201002123. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] is a side cross-sectional view showing an organic electroluminescent display of the present invention. Fig. 2 is a side cross-sectional view showing the organic electroluminescent display of the present invention. Fig. 3 is a side cross-sectional view showing the organic electroluminescent display of Comparative Example 1. Fig. 4 is a side cross-sectional view showing the organic electroluminescent display of Comparative Example 2. [Description of Main Component Symbols] 100: Substrate 200: Color Conversion Filter Portion 21: Color Filter Layer 210R: Red Filter Layer 210G: Green Filter Layer 210B: Blue Filter Layer 220: Shading Layer 2 3 0 : planarization layer 24 〇: red conversion layer - 40 - 201002123 2 50 : gas barrier layer 3 〇〇: organic electroluminescence element portion 3 1 0 : transparent electrode 320 : organic electroluminescence layer 330 : Reflecting electrode 400: substrate 5: adhesive layer X: first layered body Y: second layered body - 41 -