201006575 六、發明說明： 【發明所屬之技術領域】 本發明係有關微小氣泡生成裝置、微小氣泡生成方法及基板處理裝 置，如生成含微小氣泡的洗滌用液體的微小氣泡生成裝置及微小氣泡生成 方法、使用含微小氣泡的洗滌用液體來處理基板的基板處理裝置。 【先前技術】 作為-例，基板處理裝置在基板製造步驟中，對基板提供純水和藥液[Technical Field] The present invention relates to a microbubble generating device, a microbubble generating method, and a substrate processing device, such as a microbubble generating device for generating a washing liquid containing microbubbles, and a microbubble generating method. A substrate processing apparatus for processing a substrate using a washing liquid containing fine bubbles. [Prior Art] As an example, the substrate processing apparatus supplies pure water and liquid medicine to the substrate in the substrate manufacturing step.
等液體進魏理。這縣板處理裝需去基板上騎的微粒和液 體中浮游的微粒。 為了除去基㈣難，專利文獻1中提出了以下方案：將微小氣泡產 生部與基域理裝置連接，觀]、㈣產生部向_槽_絲提供含微 小氣泡的純水。 該微小氣泡纽部的結構如專敝獻丨_圖9所示，微小氣泡產生部 的結構是在箱巾形錢水管和環_送水管的魏路 部和真空泵連接，送氣路憎動的氮氣_力由真妓的工縣調整^ fe內Ασ速遞。 由此，使箱峨壓時，多餘的氣體過飽和，從送水管憎動的純水中 析出’其氣體通過中奸分離膜後流向送氣路。而使箱内加壓時，送氣路 中流動的氮氣通财奸分離驗，加麵解錢水料的純水中。 [專利文獻1]日本特開2006-179765號公報 ㈣但使文獻1所記載的微小氣泡產生部生成含微小氣泡的液 體時，微从泡產生部-般是使用金屬零件的結構。但使用金屬零件時， 對洗務半導體W有骑影_金屬離子會從金料件巾糾，包含在含 微小氣泡職翻。因此’對基板進魏祕理時 ^ ❹不合格，導繼谢叫解输m 【發明内容】 本發明是毅上制顯㈣，其目的姐提供能_ 去金屬離 201006575 子等異物賴小舰域妓、微錢齡成綠及絲處理裝置。 本發明的微小氣社絲置是，域含微錢泡的雜，其·在於， 包括：微小氣泡液生成部，其生成含上述微小氣泡的液體；以及異物除去 機構部，其從上述微小氣泡液生成部所提供的含上述微小氣泡的液體 去異物。 ~ 本發明的微小生成方法，㈣生成含微小氣泡的㈣的微小氣泡 ，生成部和從上賴械歧生成部峨供的含上述微小的液體中除 去異物的異物除去機構部，生成含上述微小氣泡騎體，其特徵在於，由 上述微小氣雜生成部生絲上賴小氣;魏由上述異物除去Wait for the liquid to enter Wei Li. This county plate handles the particles that need to be taken on the substrate and the particles that float in the liquid. In order to remove the base (4), Patent Document 1 proposes a method of connecting the microbubble generating portion to the base region device, and (4) generating the portion to supply the pure water containing the microbubbles to the trough. The structure of the microbubble button is as shown in Fig. 9. The structure of the microbubble generating portion is connected to the vacuum pump in the box-shaped money water pipe and the ring portion of the water pipe, and the nitrogen gas in the air supply path is turbulent. _ force is adjusted by the real industrial county ^ fe Α Α 速 express. As a result, when the tank is pressed, the excess gas is supersaturated, and the pure water is pulverized from the water supply pipe. The gas passes through the separation membrane and flows to the gas supply path. When the inside of the box is pressurized, the nitrogen flowing in the air supply path is separated from the treacherous property, and the pure water in the water is added. (4) When the microbubble generating unit described in Document 1 generates a liquid containing microbubbles, the microbubble generating unit is generally configured to use a metal part. However, when using metal parts, there is a shadow on the semiconductor W. The metal ions will be corrected from the gold material and contained in the micro-bubble. Therefore, when the substrate is in Wei's secret, it is unqualified, and the guide is called Xie. The invention is based on Yishang (4), and its purpose is to provide the ability to remove the metal from the 201006575. Domain 妓, micro money age into green and silk processing equipment. The micro gas distribution device of the present invention includes a microbubble-containing impurity, and includes: a microbubble liquid generating unit that generates a liquid containing the microbubbles; and a foreign matter removing mechanism unit that removes the microbubbles The liquid containing the microbubbles provided by the liquid generating unit removes foreign matter. In the micro-generation method of the present invention, (4) generating fine bubbles of (4) containing fine bubbles, and generating a portion and a foreign matter removing mechanism portion for removing foreign matter from the fine liquid supplied from the upper mechanical component generating unit a bubble riding body characterized in that the raw gas is generated by the small gas generating portion; the Wei is removed by the foreign matter
2構部從上賴械舰域騎赌齡±賴錢_顏中除 物0 ㈣罢！基板處理裝置’具有生成含有微小氣泡驗_微小氣泡生 ffi 於，上賴小氣魅絲置包括：微小氣缝生成部， ^含上述微小氣賴賴；以及異物除去機構部，其從上述微小氣泡 液生成部所提供的含上述微小氣泡的液體中除去異物。 【實施方式】 下面參照附圖說明本發明的實施方式。 (第1實施方式） φ 圖1表示本發明的微小氣泡生成裝置的第！實施方弋。 2〇. 泡生成裝置1〇具有：水供‘1;氣體供給部 四，微小氣泡水生成部12 ;以及異物除去機構部3〇。 異物^機卿Μ包括金雜子除去過錄置…有機污染除 4、溶解氣體除去機構15和微粒除去部16中 ，_*/、 列順序沒有特別限定。 7 ’這些部件的排 圖i所示的水供給部U通過打開閥門11B，能夠向微小氣 ?提供液體，例如水。氣體供給部2〇通過打開閥門2〇 2 ‘ 水生成部12提供氣體，例滅氣。 補I向微小氣泡 圖丨所_微錢脉生鑛U是微怖驗域部 供給部20所提供的氮氣21通過如第！多孔質 J將孔體 只2Q/愿衮置，並且將水供給部 201006575 媒w'的水22通過如第2多孔質過濾裝置，由此水中生成並含有多個 、⑽、火v °由此、’微小氣泡水生成部12麟由氣體和水生成含多個微小氣 / 、 23。生成的含微小氣泡的液體23被提供給金屬離子除去過濾裝置 13 ° 圖1 ^不的異物除去機構部3〇的金屬離子除去過滤裝置13是用於除 含微小氣、柄水23巾的金屬不純物的過濾裝置，例如使用離子交換樹脂 开:成會較好。料⑽樹脂可錢驗料交鋪^旨或陽料交麵脂 的單床或兩者的混床等。 、異物除去機構部30的有機污染除去裝置14是除去有機類污染物的部 7?:例如用紫外線（UV)照射含有微小氣泡的水23。由此能夠除去含微 ® 小氣泡的水23中的有機污染物。有機物污染會影響到氧化膜的電性，所以 要除去。 通過控制紫外線波長或能量強度，能夠不壓壞微小氣泡地除去含微小 氣泡的液體中的有機物。並且，通過進行上述控制，能夠有效地從含微小 氣泡的液體中除去有機物。 異物除去機構部30的溶解氣體除去機構15是除去含微小氣泡的水23 中的溶解氣體、如氧氣和二氧化魏體等各齡職_膜。例如溶 解有氧氣時，會促進基板氧化，所以需要除去氧氣。 異物除去機構部30的微粒除去部16是除去含微小氣泡的水23中的微 粒等固體異物的過渡裝置。微粒枯附在基板上後，基板的配線會短路，對 半導體a又備的電性有影響’所以要除去含微小氣泡的水23中的微粒等固體 異物。通過微粒除去部16後的含微小氣泡的液體23被提供到洗滌裝置1〇〇 上。 並且，微小氣泡即使通過金屬離子除去過濾裝置13和微粒除去部16， 因微小氣泡是不定形的，所以不會破裂。以往，向洗滌裝置提供微小氣泡 時需要有多個過濾裝置等，但通過上述結構，可以設置丨個過濾裝置，能 夠簡化結構。 圖2表示圖1所示的微小氣泡生成裝置1〇和作為洗滌裝置1〇〇的一例 的基板處理裝置。 圖2所示的洗滌裝置100具有：基板保持部71 ;供給喷嘴75用的操作 201006575 部72 ;向下吹風用的帶過濾裝置的風扇73 ;杯74 ;供給噴嘴75 ;處理室 76 ° 基板保持部71具有圓板的基底部件77、轉動軸78和馬達79 ’基板w 可裝卸地固定在基底部件77上。處理室76内容納有杯74、供給噴嘴75、 基底部件77和轉動軸78。馬達79根據控制部80的指令來動作’基底部 件77能夠在R方向上速續轉動。閥門11B和閥門20B能夠根據控制部80 的指令來控制開關量。 圖2所示的供給喷嘴75設置在基板w上部’供給喷嘴75由操作部72 的動作’能夠向Z方向（上下方向）和X方向（基板的半徑方向）移動。 圖2所示的微小氣泡生成裝置10的微粒除去部16透過管81與供給喷 ® 嘴乃連接。因此，含微小氣泡的水23透過管81提供到供給喷嘴75，含 該微小氣泡的水23通過供給喷嘴75喷射到基板W表面。如此一來，將含 微小氣泡的水23喷射到基板W表面上，由微小氣泡所含的負電位包住帶 正電的微粒等污染物，因而能夠從基板W表面上將該污染物與微小氣泡一 起除去。 生成含微小氣泡的水23時，即使金屬離子和微粒等異物溶入水中，異 物除去機構部30也能夠確實地除去金屬離子和微粒等異物。因此，對基板 W進行洗滌處理時，不會產生對基板w有異物所導致的不良影響。 (第2實施方式） φ 圖3表示本發明的微小氣泡生成裝置的第2實施方式。 圖3所示第2實施方式的微小氣泡生成裝置ι〇Β與圖1及圖2所示第 1實施方式的微小氣泡生成裝置1〇的不同點在於，從微粒除去部16到微 小氟泡水生成部12設置有猶環用配管31。並且，循環用配管31中途連接 有圖2所示的各洗滌裝置1〇〇側的管81。這些洗滌裝置100與圖2所示的 洗滌裝置100相同。另外，微小氣泡水生成部12具有槽4〇，其作用為根 據需要排出一部分含有微小氣泡的水23。 圖3所示第2實施方式的微小氣泡生成裝置1〇B的其他結構要素與圖 1和圖2所示第丨實施方式的微小氣泡生成裝置1〇的對應結構要素相同， 所以第2實财式巾，稍第丨實施方式相_符賴記，省略其說明。 如圖3所示，從微粒除去部16到微小氣泡水生成部12設置有循環用 201006575 配s 31之故’所以能夠由i台微小氣泡生成裝置ι〇Β向多台洗務裝置⑽ 的基板提供不含異物（污染物）的含微小氣泡的水23。並且含微小氣泡 的水23的-部分或全部能夠重複再利用，所以能夠提高氣體和水的利用效 率。 ，而且，由微小氣泡生成裝们0B，在微小氣泡水生成部12 t生成新的 a微】氣細水23。並且’從微粒除去冑16娜後回到微小氣泡水生成 部12的含微小氣泡的水23的規定量排到槽4〇，向剩下的含微小氣泡的水 23添加新的含則、氣俩水23。因此，能馳制含微小氣⑽水中的 微小氣泡的量和含微小氣泡的水23的清潔度。 上述各本發明的實财式巾，異物除去機卿3()可以包含金屬不純物 ❹過餘置、錢污歸去裝置、滴氣齡去機構、微讎去部中的至少 -個。並且’異齡純構部3〇的铸件賴_序沒有制限定。 本發明的實施方式巾，液體可以不使用純水，使用通常的水即可。 本發_微小氣触絲置，域含微小統的紐，微小氣 $液生成部，其生成含微小氣泡驗體；以及異錄去機構部其從微小 氣泡液生成觸提供的含微小氣泡的㈣情去異物。由此，能夠從含微 小氣泡的液體中確實地除去金屬離子等異物。 異物除去機構部包括金屬不純物過濾裝置，其從含微小氣泡的液體中 除去金屬不純物。由此_從含微小氣泡的㈣t確實地除去金屬不純物。 ❹異絲錢構部包括有機污餘去裝置，其從含微小氣㈣液體令除 去有麵雜物。減錢從含微小氣觸㈣㈣實地除去有機類污染 物。 異物除去機構部包括溶解氣體除去機構，其從含微小氣泡的液體中除 去溶解氣體。由此能夠從含微小氣泡的液體中確實地除去溶解氣體。 異物除去機構部包括微粒除去部，其從含微小氣泡的液體中除去微 粒。由此能夠從含微小氣泡的液體中確實地除去微粒。 -異物除去機構部包含金屬不純物過濾裝置、有機污染除去裝置、溶解 氣體除去機構、微粒除去部中至少―個。由此，可以根據需要任意址合， 構成異物除去機構部。 微小氣泡液生成部和異物除去機構部由循環用配管連接，其作用是使 201006575 通過異物除去機構部後的含微小氣泡的液體回到微小氣泡液生成部。由 此，能夠由微小氣泡生成裝置向多個洗滌裝置的基板確實地提供不含異物 (污染物）的含微小氣泡的水。並且，含微小氣泡的水的一部分或全部可 以重複再利用，所以能夠提高氣體和水的利用效率。 圖4是表示微小氣泡生成裝置的運行時間與微小氣泡數的關係例的 圖。圖4中，縱軸為微小氣泡數，橫軸表示運行時間。圖4所示曲線中的 點P1表示圖1所示第1實施方式的微小氣泡生成裝置1〇中的微小氣泡數， 圖4所示曲線中的點P2、P 3、P4表示圖3所示第2實施方式的微小氣泡生 成裝置10B中的微小氣泡數。 從圖4所示例中可知，像圖3所示第2實施方式的微小氣泡生成裝置 ® 1〇Β這樣循環利用含微小氣泡的水23後，與圖1所示第丨實施方式的微小 氣泡生成裝置10相比’能夠在增加微小氣泡數的同時延長微小氣泡生成裝 置10B的運行時間’能夠提高含微小氣泡的水23的利用效率。並且，微小 氣/包生成裝置能夠連續運行之故，所以能夠消除微小氣泡生成裝置運行開 始、運行結束時的不穩定狀態，能夠向洗蘇裝置100侧穩定提供含微小氣 泡的水23。 本發明中，微小氣泡也叫做微米氣泡或微奈米氣泡，包含微米氣泡 (MB)、微奈米氣泡（MNB)、奈米氣泡（nb)。微米氣泡（MB)是 指發生時氣泡直徑在10μηι·數十μίη以下的微小氣泡，微奈米氣泡（MNB) φ 是指發生時氣泡直徑在數百nm-ΙΟμπι以下的微小氣泡。奈米氣泡（NB) 是指數百nm以下的微小氣泡。 氣體可以用臭氧氣體和空氣代替氮氣。液艘除了純水，還可以使用酸 性液體和驗性液鱧。 並且，可以組合本發明的實施方式所公開的多個結構要素來適當地構 成各種發明。例如也可以從本發明的實施方式所公開的全部結構要素中刪 除幾個結構要素。還可以適當組合不同實施方式中的結構要素。 以上說明了本發明的實施方式，只是例示了具體例，並沒有特別限定 本發明，各部分的具體結構等可以有適當改變。另外，實施方式所記載的 作用和效果只是列舉了本發明所產生的最合適的作用和效果，本發明的作 用和效果並不限定於本發明實施方式中所記載。本發明可以用於例如生成 8 201006575 含微小氣泡驗體（例如洗顧㈣）的微小氣泡生成裝置及微小氣泡生 成方法’以及使时微,!、氣麟紐（例如洗顧㈣）來處理基板的基 板處理裝置及基板處理方法等。 【圖式簡單說明】 圖1是表示本發明微小氣泡生成裝置的第j實施方式； 圖2是表示圖1所示的洗滌裝置的一例； 圖3是表示本發明微小氣泡生成裝置的第2實施方式；以及 圖4是表示本發明的微小氣泡生成裝置實施方式中微小氣泡生成裝置的運 行時間與微小氣泡數的關係例。 【主要元件符號說明】 10、 10B微小氣泡生成裝置 11 水供給部 11B 閥門 12 微小氣泡液生成部 13 金屬離子除去過濾裝置 14 有機污染除去裝置 15 溶解氣體除去機構 16 微粒除去部 20 氣體供給部 20B 閥門 21 氮氣 22 水供給部11所提供之水 23 含微小氣泡的液體/水 30 異物除去機構部 31 循環用配管 40 槽 71 基板保持部 72 操作部 201006575 73 風扇 74 杯 75 供給噴嘴 76 處理室 77 基底部件 78 轉動軸 79 馬達 80 控制部 81 管 100 洗滌裝置2The construction department rides the gambling age from the upper squadron field 赖 赖 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The substrate processing apparatus 'has a microbubble containing microbubbles, and the micro-bubble includes: a micro-air seam generating portion, and the foreign matter removing mechanism; and the foreign matter removing mechanism portion The foreign matter is removed from the liquid containing the fine bubbles provided by the liquid generating unit. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. (First Embodiment) φ Fig. 1 shows the first embodiment of the microbubble generating device of the present invention! Implementation of the party. 2. The bubble generation device 1A has a water supply "1; a gas supply unit 4, a fine bubble water generation unit 12, and a foreign matter removal mechanism unit 3". The foreign matter includes the gold miscellaneous material and the organic matter is removed. 4. In the dissolved gas removing mechanism 15 and the fine particle removing portion 16, the order of _*/ is not particularly limited. The water supply unit U shown in Fig. i of these components can supply a liquid such as water to the minute gas by opening the valve 11B. The gas supply unit 2〇 supplies gas by opening the valve 2〇 2 'the water generating unit 12, for example, extinguishing the gas. Supplementary I to microbubbles 丨 丨 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The porous J has the pores only 2Q/will be placed, and the water 22 of the water supply unit 201006575 is passed through the second porous filter device, thereby generating and containing a plurality of (10), fire v°. The 'microbubble water generating unit 12 is composed of a gas and water containing a plurality of fine gases/23. The generated microbubble-containing liquid 23 is supplied to the metal ion removal filter unit 13 °. Fig. 1 The metal ion removal filter unit 13 of the foreign matter removal mechanism unit 3 is used for removing metal containing minute gas and handle water. A filter device for impurities, for example, using an ion exchange resin, is preferred. The material (10) resin can be used for the inspection of a single bed or a mixed bed of the same or a mixture of the two. The organic contamination removing device 14 of the foreign matter removing mechanism unit 30 is a portion 7 for removing organic contaminants: for example, water 23 containing fine bubbles is irradiated with ultraviolet rays (UV). This makes it possible to remove organic contaminants in the water 23 containing micro-bubbles. Organic contamination can affect the electrical properties of the oxide film, so remove it. By controlling the ultraviolet wavelength or the energy intensity, the organic matter in the liquid containing the fine bubbles can be removed without crushing the fine bubbles. Further, by performing the above control, it is possible to effectively remove the organic matter from the liquid containing fine bubbles. The dissolved gas removing means 15 of the foreign matter removing mechanism portion 30 is a film for removing aged gases such as oxygen and dioxins, which are dissolved in the water 23 containing fine bubbles. For example, when oxygen is dissolved, the substrate is promoted to be oxidized, so it is necessary to remove oxygen. The fine particle removing unit 16 of the foreign matter removing mechanism unit 30 is a transition device for removing solid foreign matter such as fine particles in the water 23 containing fine bubbles. When the fine particles are adhered to the substrate, the wiring of the substrate is short-circuited, which affects the electrical properties of the semiconductor a. Therefore, solid foreign matter such as fine particles in the water 23 containing fine bubbles is removed. The microbubble-containing liquid 23 that has passed through the particle removing portion 16 is supplied to the washing apparatus 1A. Further, even if the fine bubbles pass through the metal ion removing filter device 13 and the fine particle removing portion 16, the fine bubbles are indefinite and do not break. Conventionally, a plurality of filter devices and the like are required to supply fine bubbles to the washing device. However, with the above configuration, one filter device can be provided, and the structure can be simplified. Fig. 2 shows a microbubble generating device 1A shown in Fig. 1 and a substrate processing device as an example of the washing device 1A. The washing apparatus 100 shown in Fig. 2 has a substrate holding portion 71; an operation 201006575 portion 72 for supplying the nozzle 75; a fan 73 with a filtering device for blowing downward; a cup 74; a supply nozzle 75; a processing chamber 76° substrate holding The base portion 71 having a circular plate, a rotating shaft 78, and a motor 79' are detachably fixed to the base member 77. The processing chamber 76 houses a cup 74, a supply nozzle 75, a base member 77, and a rotating shaft 78. The motor 79 operates in response to an instruction from the control unit 80. The base member 77 is capable of rapid rotation in the R direction. The valve 11B and the valve 20B are capable of controlling the amount of switching in accordance with an instruction of the control unit 80. The supply nozzle 75 shown in Fig. 2 is provided on the upper portion of the substrate w. The supply nozzle 75 is movable in the Z direction (up and down direction) and the X direction (radial direction of the substrate) by the operation of the operation unit 72. The fine particle removing unit 16 of the fine bubble generating device 10 shown in Fig. 2 is connected to the supply nozzle through the tube 81. Therefore, the water 23 containing fine bubbles is supplied to the supply nozzle 75 through the tube 81, and the water 23 containing the fine bubbles is ejected to the surface of the substrate W through the supply nozzle 75. In this way, the water 23 containing the microbubbles is sprayed onto the surface of the substrate W, and the negative potential contained in the microbubbles encloses the contaminants such as positively charged particles, thereby enabling the contaminant and the microparticles to be removed from the surface of the substrate W. The bubbles are removed together. When the water 23 containing the fine bubbles is formed, even if foreign matter such as metal ions and fine particles are dissolved in the water, the foreign matter removing mechanism unit 30 can surely remove foreign matter such as metal ions and fine particles. Therefore, when the substrate W is subjected to the washing treatment, there is no adverse effect caused by foreign matter on the substrate w. (Second Embodiment) φ Fig. 3 shows a second embodiment of the microbubble generating device of the present invention. The microbubble generating device ι of the second embodiment shown in FIG. 3 is different from the microbubble generating device 1 of the first embodiment shown in FIG. 1 and FIG. 2 in that the microparticle removing portion 16 reaches the fine fluorine bubble water. The generating portion 12 is provided with a helium ring pipe 31. Further, a pipe 81 on the side of each washing apparatus 1 shown in Fig. 2 is connected in the middle of the circulation pipe 31. These washing apparatuses 100 are the same as the washing apparatus 100 shown in Fig. 2 . Further, the fine bubble water generating portion 12 has a groove 4 which functions to discharge a part of the water 23 containing fine bubbles as needed. The other components of the microbubble generating device 1A according to the second embodiment shown in Fig. 3 are the same as the corresponding components of the microbubble generating device 1A of the second embodiment shown in Fig. 1 and Fig. 2, so the second real money is The towel is slightly different from the embodiment, and the description thereof is omitted. As shown in FIG. 3, the microparticle removing unit 16 and the microbubble water generating unit 12 are provided with a circulation of 201006575 and s31, so that the microbubble generating device can be used for the substrate of the plurality of cleaning devices (10). A microbubble-containing water 23 containing no foreign matter (contaminants) is provided. Further, part or all of the water 23 containing fine bubbles can be reused repeatedly, so that the gas and water utilization efficiency can be improved. Further, from the microbubble generating unit 0B, a new a micro gas mist 23 is generated in the fine bubble water generating unit 12 t. Further, 'the predetermined amount of the microbubble-containing water 23 returned to the fine bubble water generating unit 12 after being removed from the fine particles is discharged to the tank 4, and a new content and gas are added to the remaining microbubble-containing water 23. Two waters 23. Therefore, the amount of the fine bubbles containing the fine gas (10) and the cleanliness of the water 23 containing the fine bubbles can be relaxed. In the above-described solid food type towel of the present invention, the foreign matter removing machine 3 () may include at least one of a metal impurity, a waste disposal device, a drip age removing mechanism, and a micro-defecting portion. Moreover, the castings of the three-year-old pure structural part are not limited. In the towel of the embodiment of the present invention, the liquid may be used without using pure water. The hair _ tiny gas touch wire set, the field contains the micro-system, the tiny gas liquid generation part, which generates the micro-bubble test body; and the micro-bubble-containing mechanism (4) Love to get foreign things. Thereby, foreign matter such as metal ions can be surely removed from the liquid containing fine bubbles. The foreign matter removing mechanism portion includes a metal impurity filtering device that removes metal impurities from the liquid containing fine bubbles. Thus, the metal impurities are reliably removed from the (four) t containing fine bubbles. The singular silk structure consists of an organic waste removal device that removes noodles from the micro-gas (four) liquid. Reduce the amount of organic pollutants from the field with tiny gas touches (4) and (4). The foreign matter removing mechanism portion includes a dissolved gas removing mechanism that removes the dissolved gas from the liquid containing fine bubbles. Thereby, the dissolved gas can be surely removed from the liquid containing fine bubbles. The foreign matter removing mechanism portion includes a particle removing portion that removes fine particles from the liquid containing fine bubbles. Thereby, the particles can be surely removed from the liquid containing fine bubbles. The foreign matter removing mechanism unit includes at least one of a metal impurity filtering device, an organic contamination removing device, a dissolved gas removing mechanism, and a fine particle removing unit. Thereby, the foreign matter removing mechanism unit can be configured by arbitrarily joining as needed. The microbubble liquid generating unit and the foreign matter removing mechanism unit are connected by a circulation pipe, and the function of returning the microbubble-containing liquid after the foreign matter removing mechanism unit to the 201006575 is returned to the microbubble liquid generating unit. Thereby, the microbubble-containing water containing no foreign matter (contaminant) can be surely supplied to the substrates of the plurality of washing apparatuses by the microbubble generating device. Further, some or all of the water containing fine bubbles can be reused repeatedly, so that the utilization efficiency of gas and water can be improved. Fig. 4 is a view showing an example of the relationship between the operation time of the microbubble generating device and the number of minute bubbles. In Fig. 4, the vertical axis represents the number of minute bubbles, and the horizontal axis represents the running time. Point P1 in the graph shown in Fig. 4 indicates the number of minute bubbles in the microbubble generating device 1 of the first embodiment shown in Fig. 1, and points P2, P3, and P4 in the graph shown in Fig. 4 indicate those shown in Fig. 3. The number of minute bubbles in the microbubble generating device 10B of the second embodiment. As is apparent from the example shown in Fig. 4, the microbubble generating device 1 of the second embodiment shown in Fig. 3 circulates the water 23 containing the microbubbles in this manner, and the microbubble generation of the third embodiment shown in Fig. 1 is obtained. The device 10 can increase the utilization efficiency of the water 23 containing microbubbles as compared with the fact that the operation time of the microbubble generating device 10B can be increased while increasing the number of microbubbles. Further, since the micro gas/package generating device can be continuously operated, it is possible to eliminate the unstable state at the start of the operation of the microbubble generating device and the end of the operation, and to stably supply the water 23 containing the microbubbles to the sacrificial device 100 side. In the present invention, the microbubbles are also called microbubbles or micro-nano bubbles, and include microbubbles (MB), micro-nano bubbles (MNB), and nanobubbles (nb). The microbubbles (MB) are microbubbles in which the diameter of the bubbles is 10 μηι·s tens μίη or less, and the micronano bubbles (MNB) φ are microbubbles in which the diameter of the bubbles is several hundred nm-ΙΟμπι or less. The nanobubble (NB) is a microbubble with an index of less than 100 nm. The gas can be replaced by ozone gas and air. In addition to pure water, liquid tanks can also be used with acid liquids and laboratory liquids. Further, various inventions can be appropriately constructed by combining a plurality of constituent elements disclosed in the embodiments of the present invention. For example, several structural elements may be deleted from all the structural elements disclosed in the embodiments of the present invention. It is also possible to appropriately combine structural elements in different embodiments. The embodiment of the present invention has been described above, and specific examples are exemplified, and the present invention is not particularly limited, and the specific structure and the like of each part may be appropriately changed. Further, the actions and effects described in the embodiments are merely illustrative of the most suitable actions and effects produced by the present invention, and the effects and effects of the present invention are not limited to those described in the embodiments of the present invention. The present invention can be applied to, for example, the generation of 8 201006575 microbubble containing microbubble (for example, washing (4)) microbubble generating device and microbubble generating method 'and the time micro, !, qilin (for example, washing (4)) to process the substrate Substrate processing apparatus, substrate processing method, and the like. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a jth embodiment of a microbubble generating device of the present invention; Fig. 2 is a view showing an example of the washing device shown in Fig. 1; and Fig. 3 is a view showing a second embodiment of the microbubble generating device of the present invention. And FIG. 4 is a view showing an example of the relationship between the operation time of the microbubble generating device and the number of microbubbles in the embodiment of the microbubble generating device of the present invention. [Description of main component symbols] 10, 10B microbubble generating device 11 Water supply portion 11B Valve 12 Microbubble liquid generating portion 13 Metal ion removing filter device 14 Organic contamination removing device 15 Dissolved gas removing mechanism 16 Fine particle removing portion 20 Gas supply portion 20B Valve 21 Nitrogen 22 Water supplied from water supply unit 11 Liquid/water containing microbubbles 30 Foreign material removal mechanism unit 31 Recycling pipe 40 Slot 71 Substrate holding unit 72 Operation unit 201006575 73 Fan 74 Cup 75 Supply nozzle 76 Processing chamber 77 Base member 78 rotating shaft 79 motor 80 control portion 81 tube 100 washing device