TW200946254A - Cleaning method and cleaning system for electronic part - Google Patents

Abstract

Provided is a cleaning method for electronic part including a refining step for refining an unused fluorine-containing organic detergent composite solution by a refining apparatus, and a cleaning step for cleaning electronic parts using the refined detergent composite solution supplied to a cleaning apparatus from the refining apparatus, wherein at least a removal of organic contamination by a rectifying apparatus and a removal of solid contamination by a filter apparatus are performed in the refining step.

Description

200946254 VI. Description of the Invention: [Technical Field of the Invention] A method and a cleaning system for cleaning an electronic component using a fluorine-containing organic cleaning composition liquid. [Prior Art] J is a device that uses a fluorine-containing organic cleaning agent composition liquid (hereinafter also referred to as "fluorine-based cleaning liquid") to clean electronic components such as wafers, stone substrates, and printed boards. A vapor degreasing cleaning device is used (for example, Patent Document 1). In addition, 'there is a method that has been proposed for the cleaning of electronic components. First, the contaminated fluorine-based cleaning solution in the m-washing device is thrown into another regenerative device for regeneration." Cleaning of components (for example, Patent Document 2). [Patent Document 1] US Patent No. 388 1949 Patent Document 2: JP-A-2001-129302 ❿ SUMMARY OF THE INVENTION [Problems to be Solved by the Invention] In recent years, "high density" due to components and wiring in electronic components The residue generated by the formation of the pattern of the element and the wiring which is allowed by the residence is gradually unacceptable, and the interval between the element and the wiring is gradually reduced. Therefore, the purity of the fluorine-based cleaning liquid is required to be high. On the other hand, in the conventional steam degreasing and cleaning device, the dirt component = accumulated in the cleaning device, the cleaning ability of the fluorine-based/monthly washing liquid in the cleaning device is lowered as time passes, so it is necessary to frequently replace the Fluorine 3 321090 200946254 used is a cleaning solution or a regenerated I-based cleaning solution. However, since the unused fluorine-based cleaning liquid is usually stored in a container and transported to the use site by the manufacturer, a trace amount of the dirt component in the container is likely to be mixed into the fluorine-based cleaning liquid, and the container is opened to be opened. When the fluorine-based cleaning liquid is introduced into the cleaning device, the fluorine-based cleaning liquid is likely to be in contact with the external environment, and the dirt component in the external environment is likely to be mixed into the fluorine-based cleaning liquid. Therefore, even the unused fluorine-based cleaning liquid does not necessarily have to be fixed. It is used in the required high purity. In the case of the regenerated fluorine-based cleaning liquid, the fluorine-based cleaning liquid after the regeneration is stored in the container from the regeneration device and transported, and the container is opened and the fluorine-based cleaning liquid is introduced into the cleaning device. In the same period as described above, the fluorine-based cleaning liquid is contaminated, so that the regenerated fluorine-based cleaning liquid is not necessarily used in the required high purity. Therefore, in order to clean an electronic component which tends to be higher in density and miniaturization, it is desirable to use a fluorine-based cleaning liquid of higher purity. (Means for Solving the Problems) The present invention has been made in view of the above problems, and an object thereof is to provide a cleaning method for an electronic component capable of using a fluorine-based cleaning liquid with high purity and a cleaning system using the cleaning method. That is, the present invention provides a cleaning method comprising: a refining step of purifying an unused fluorine-containing organic detergent composition liquid by a refining device; and a washing step of supplying the cleaning device from the refining device to the cleaning device The purified cleaning agent composition liquid is used to clean the electronic component; in the above-mentioned refining step, at least the organic matter 321090 200946254 dye removal by the rectification device and the solid contamination by the filtering device are performed. The material is removed to purify the above-mentioned cleaning agent composition liquid, and the cleaning agent composition liquid refined as above is used to clean the electronic component. In addition, according to another aspect of the present invention, the present invention provides a cleaning system for an electronic component, which is characterized in that the cleaning system is provided with a refining device for removing unused fluorine-containing organic compounds. The cleaning agent is refined by the contaminants contained in the composition liquid; and the cleaning device cleans the electronic components by using the cleaning agent composition liquid purified by the refining device; the refining device is at least useful for removing organic matter The rectification device for contaminants and the filtration device for removing solid contaminants are configured to circulate and purify the cleaning agent composition liquid in the rectification device and the filtration device. (Effect of the Invention) According to the present invention, an unused fluorine-based cleaning liquid transported by a manufacturer of a fluorine-containing organic cleaning composition liquid (fluorine-based cleaning liquid) can be injected into the refining device from the container. The cleaning component is purified by removing the dirt component in the unused fluorine-based cleaning liquid by a refining device. Therefore, at the manufacturer's end, since the fluorine-based cleaning liquid is filled in the container to which a small amount of the dirt component is adhered, the dirt component in the fluorine-based cleaning liquid can be removed by the refining device even if the fluorine-based cleaning liquid is mixed with the dirt component. Further, since it is purified, it is possible to supply the purified high-purity fluorine-based cleaning liquid to the cleaning device without cleaning the external environment to clean the electronic component. In other words, according to the present invention, it is possible to prevent deterioration in quality of an electronic component caused by an unused fluorine-based cleaning liquid. 5 321090 200946254 Therefore, the present invention is capable of corresponding to a silicon wafer, a ceramic wafer, a tantalum wafer obtained by cutting the tantalum wafer, and a ceramic wafer, a glass substrate, a metal substrate, and a color filter obtained by cutting the ceramic wafer. The substrate, the printed circuit board, and electronic components using such electronic components are further increased in density and miniaturization. In addition, the electronic components can be cleaned constantly with a high-purity purified fluorine-based cleaning solution to ensure stable cleaning quality. [Embodiment] The method for cleaning an electronic component according to the present invention includes: a purification step of purifying an unused fluorine-containing organic detergent composition liquid by a refining device; and a washing step of supplying the cleaning from the refining device to the cleaning a purified cleaning agent composition liquid in the apparatus to clean the electronic component; in the refining step, at least the removal of the organic contaminant by the rectification apparatus and the solid contaminant by the filtering device Removal, and arbitrarily removing the water-soluble contaminants by the water cleaning device. In the above-mentioned refining step, the order of removing organic contaminants, water-soluble contaminants, and solid contaminants is arbitrary, but from the viewpoint of effectively removing various contaminants, it is preferable to use organic contaminants and water-soluble. The order of contaminants and solid contaminants is removed in the order of water-soluble contaminants, organic contaminants, and solid contaminants to refine the detergent composition liquid. Although the cleaning method does not limit the object to be cleaned, it can be applied to cleaning a wafer, a ceramic wafer, and a wafer obtained by cutting a high-purity fluorine-based cleaning liquid, and cutting the wafer. The ceramic wafer 6321090 200946254 is obtained. The obtained ceramic wafer, the glass substrate, the metal substrate, the color filter substrate, the printed substrate, and electronic components using the electronic components.

The cleaning method can also be used as a cleaning method for other objects to be cleaned, for example, as a liquid crystal cell, a PDP (plasma display panel), a stamper, a mold, a magnetic head, a VCM (voice). -coil motor; voice coil motor), MS (Hea(i Stack)

Assembly; head stacking combination), and cleaning methods such as cassettes are used. In the present invention, as the fluorine-based cleaning liquid, a cleaning liquid suitable for cleaning of an electronic component can also be used. The fluorine-containing organic detergent composition liquid is exemplified by a fluorine compound having a molecular weight of less than 1,000 and having a carbon atom and a fluorine atom in the skeleton, and being liquid at room temperature and having a volatility. The fluorine compound is not particularly limited, but from the viewpoint of global warming, it is preferable to further contain a hydrogen atom in order to shorten the life in the atmosphere. Further, it may contain an oxygen atom, a sulfur atom, a nitrogen atom or the like. The carbon skeleton may be any of a linear shape, a branched chain shape, a ruthenium or a cyclic shape, and may have a double bond or a triple bond. The fluorine-based cleaning liquid having such characteristics can be exemplified by nonafluorobutyl decyl ether, 1,1,1,2, 2, 3, 4, 5, 5, 5-trifluoropropane, 1, 2, 2, 2-tetrafluoroethyl-2, 2, 2-trifluoromethyl ether, 1,1,1,3,3-pentafluorobutane, ll 2, 2, 3, 3, 4 - heptafluorocyclopentane, dichloropentafluoropropane, etc., among which 1,1,1' 2, 2, 3, 4, 5, 5, 5 h gas-propylene is preferred. Further, in the present invention, the fluorine-based cleaning liquid may be a mixture of one or more fluorine-based cleaning liquids. Further, it may be a mixture of a fluorine-based cleaning solution and another organic solvent, or a mixture of two or more 321090 7 200946254 or more. Examples of the organic solvent include, for example, 2-diethanol, ethanol, etc., _, _, etc., bis(tetra), etc., acetic acid, etc., acetic acid, vinegar, etc., Times. ★ a cheek, such as halogenated hydrocarbons such as ethylene and chloropentafluoropropane. 2. In some cases, a mixture of a gas-based cleaning solution and a water-soluble organic solvent (for example, an alcohol) ((4) mixture) may be used in response to the type of electronic components and dirt. In this case, the aforementioned refining step is difficult* to remove the contaminant. In addition, when the preparation liquid of the preparation I system is a mixture having an azeotropic composition, it is preferable to use a mixture ratio of azeotropic combination. ^ Receiver's said that the daily cleaning method cleans the electronic components of the present invention. The cleaning system is equipped with: fine hard-working, the county contains the dirt (4) contained in the composition of the mouse-free organic cleaning agent, and is refined; The "washing device" uses the aforementioned cleaning agent composition liquid purified by the refining device to clean the electronic component; the refining device is at least used for the purification of solid contaminants and for removing solid contaminants. a filtering device; and the above-mentioned (4) device is configured to circulate the cleaning agent tf and to refine the liquid; the water is provided to remove water-soluble contaminants; the monthly washing device and the moisture removing device for removing moisture. = In the refining device, the arrangement order of the fine (four), the water washing device, the moisture removal, and the shaft device is arbitrary. However, as described above, it is effective to treat the refining device. The order of the loading/month washing device, the 7jC removing device, and the passing device, 321090 8 200946254 or the flow of the cleaning agent composition in the order of the water washing device, the moisture removing device, the rectifying device, and the passing filter device The liquid is refined. (Description of the cleaning device) The cleaning device is not particularly limited as long as it is configured to house a fluorine-based cleaning liquid for removing dirt adhering to the electronic component and to clean the electronic component in the cleaning device. In the configuration of the cleaning device, for example, a washing tank is provided, and a fluorine-based cleaning liquid purified by a refining device is supplied, and a cleaning tank is provided to contain a fluorine-based cleaning liquid overflowing from the washing tank. The vapor retention portion is a vapor in which a fluorine-based cleaning liquid heated and vaporized in the cleaning tank is retained, and a vapor condensation portion that condenses and recirculates the vapor in the vapor retention portion to the washing tub; The module is immersed in the fluorine-based cleaning liquid in the cleaning tank, and the cleaned electronic component is immersed in the fluorine-based cleaning liquid in the washing tank to be washed, and then washed by the vapor in the vapor retention portion. The subsequent electronic components are steam cleaned. Specifically, a known multi-tank cleaning device described in, for example, Japanese Laid-Open Patent Publication No. Hei 8-243515 or Japanese Patent Application Laid-Open No. Hei No. 10-192797. Further, the cleaning device may be configured to include a shower nozzle, and a fluorine-based cleaning liquid purified by the refining device is ejected from the shower nozzle, and the electronic component after the steam cleaning is shower-cleaned. According to this configuration, the cleanliness of the electronic component of the cleaning system of the present invention can be further improved. (Description of the refining device) 321090 200946254 The refining device is a device that removes the dirt components mixed in the unused m washing solution according to the type of the dirt. Concentrate of contaminants = a device for the removal of solid contaminants, and may also have a water cleaning device for removing bathing contaminants, a moisture removal device for removing moisture from the heart, and a material contamination of the rotor contaminants during use. In the present invention, in terms of the kind of the contaminant, the foregoing can be exemplified by the 'stain', the water-soluble contaminant, the ionic contaminant, and the solid contaminant: in terms of various contaminants Specifically, the following may be mentioned. As the organic pollutant, an oil (e.g., (registered trademark)), a fluoropolymer, or the like can be exemplified. The water-soluble contaminant may, for example, be isopropyl alcohol (iSOPr〇Pyl alcohol), an alcohol such as ethanol, or a ketone such as acetone. The ionic contaminant may, for example, be a fluoride ion, a can acid ion, an argon carbonate ion, an ammonium ion or a sodium ion. In the case of the body contaminant, an organic or knife compound particle such as a plastic or an elastomer (metal particles, and dust) may be mentioned. ^ Hereinafter, the specific configuration of the refining device will be described. Further, the refining device may of course have means for removing contaminants of properties other than the foregoing. <Rectification device> It is a hot parent who can use the difference between the boiling point of the fluorine-based cleaning liquid and the boiling point of the organic pollutant (hereinafter referred to as "boiling point difference") Replacement 'Removal of organic (10) 200946254 contaminants contained in unused (four) cleaning wipes. For example, in the case where the difference in boiling point is small, the separation of the fluorine-based cleaning liquid and the contaminant requires a plurality of heat exchange effects, and a rectifying device having a reversible function of reversing is selected, and the boiling point difference is large. Situation ^ ^ Select the pavilion to set up the De Nong set or the heating device that will not make the fluorine-based cleaning solution Fo Teng's side into the force. © 如此 In this case, the rectification unit selects the optimum one based on the difference in boiling point between the fluorine-based cleaning solution and the organic contaminant or the required cleanness of the electronic component. Further, in the case where the rectification apparatus (e.g., distillation apparatus) and the cleaning apparatus are dimerized, the refining apparatus can omit the rectification apparatus. <Water cleaning device> Since the fluorine-based cleaning liquid is brought into contact with water and the water-soluble contaminant is dissolved in water, the water-soluble contaminant contained in the fluorine-based cleaning liquid can be effectively removed, so that the water contact device is suitable As a water cleaning device. Although the contact method is not particularly limited, in view of simplicity and operability, it is preferred that the flow contact method 0 and the water contact device have a cleaning liquid flow, for example, at the upstream end. Π and the water discharge port and the downstream end of the cylinder having the cleaning (4) ^ water flow inlet is provided with a plurality of partitions or filling the contact between the gas cleaning liquid and the water in the internal circulation path = contact device. Preferably, the water contact means of this configuration is placed in contact with the downstream end of the lower portion, and is disposed from the upper side toward the flow of water flowing upwardly from the upstream. The branch_cleaning liquid flows in from below, and the first liquid is brought into contact with water, whereby the trace amount is 321090 11 200946254 :== in the cleaning liquid, so it is recognized on the downstream side of the water contact device. The aforementioned moisture removing device for removing moisture in the fluorine money washing liquid. In the case where the mixture of the m (four) gas system is not the same as the above, the refining device omits the water clearing device and the moisture removing device. <Moisture Removal Device> The water removal device may be, for example, a container in which the upstream end is washed, and the inside of the cylinder having the cleaning liquid discharge port at the downstream end is filled with: ❹ a granular absorbent material. Moisture tti In the case where the water-soluble contaminant is also ionic, the removal of the water-soluble matter by the water contact device and the moisture removal device also removes the ionic contaminant. Wood = outer' Since the amount of moisture adsorbed by the moisture absorbing material is limited, the moisture β may also have a means for discharging moisture adsorbed to the outside of the moisture absorbing material. - The squeegee is discharged to the sputum, and the sputum is composed of, for example, an air flow person σ and an air discharge σ, which are formed at the upstream end and the downstream end of the moisture; the strip heater ( Bandhe gamma), used for winding: a hot air supply device that blows the person to the air stream population, or a blower and a cylinder for blowing the chamber/empty air into the air inlet, and adding It is preferable to arrange two or more moisture absorbing (four) dry = outer moisture removing means by circulating the heated air to the cylindrical body. In this way, when the moisture absorbing material of the water jet removing device is dried, the water in the fluorine-based cleaning liquid is removed by another 321090 12 200946254 moisture removing device, so that the fluorine-based cleaning liquid by the refining device can be improved. Clear purification efficiency. Further, a portion of the surrounding wall of the cylindrical body is formed by a transparent window, and a saturated indicating material typified by blue silicone is preliminarily mixed with the moisture absorbing material, whereby the moisture absorption of the moisture absorbing material can be visually observed by the color of the saturated indicating material. Degree (dryness). Alternatively, a moisture measuring device may be provided downstream of the moisture removing device, and the moisture measuring device may measure the moisture content in the air which is conducive to drying, thereby investigating the degree of drying of the moisture absorbing material. In addition, in order to improve the water removal efficiency by the moisture absorbing material, the water separator that separates the fluorine-based cleaning liquid from the water by the difference between the specific gravity of the fluorine-based cleaning liquid and the specific gravity of the water dissolved in the fluorine-based cleaning liquid is used. It can also be placed between the water contact device and the moisture removal device. <Ionic Contaminant Removal Device> The ionic contaminant removal device may, for example, be filled with a cleaning liquid inflow port at the upstream end and a cleaning liquid discharge port at the downstream end. An ionic contaminant removal device constructed of an alumina gel. <Filtering device> The filtering device for removing solid contaminants can be exemplified by a filtering device such as a microfiltration membrane or an ultrafiltration membrane for allowing a fluorine-based cleaning liquid to pass through. In this case, the solid contaminants removed by the filtering means are discharged from the cylinder to the outside by exchange of the filter core. Further, a plurality of the same filter membranes or different filter membranes may be combined for use. The refining device in the cleaning system 13 321090 200946254 is preferably from upstream to downstream, with a rectification device, a water cleaning device, a moisture removing device, and a filtering device, from the viewpoint of effectively removing the aforementioned various contaminants. The devices are continuously connected in a sequence or in the order of a water washing device, a water removing device, a rectifying device, and a filtering device. Further, in the case where the refining device has the ionic contaminant removing device, the setting position of the ionic contaminant removing device is not limited as long as it is between the water washing device and the moisture removing device. <Other Configurations> The cleaning system may be configured to regenerate a fluorine-based cleaning liquid for cleaning the electronic components in the cleaning device, and to regenerate the device. The circulation piping is connected to the cleaning device, and the used fluorine-based cleaning liquid is sent from the cleaning device to the regeneration device for regeneration, and the regenerated fluorine-based cleaning liquid is circulated and supplied from the regeneration device to the cleaning device. By integrating the regenerating device into the cleaning system as a whole, the used dirty fluorine-based cleaning liquid can be transferred from the cleaning device to the regenerating device through the circulation pipe, and the regenerated fluorine-based cleaning solution can be removed from the cleaning device. The regeneration device is transferred to the cleaning device through a circulation pipe. As a result, the fluorine-based cleaning liquid can be easily and quickly transferred, and the fluorine-based cleaning liquid subjected to the regeneration treatment can be transferred to the cleaning device without being in contact with the external environment, thereby preventing contamination from being mixed from the outside. To the cleaning solution. In the present invention, the regenerating apparatus is preferably a fluorine-based cleaning liquid having a purity as high as that before use, as long as it can remove various contaminants contained in the used fluorine-based cleaning liquid. 14 321090 200946254 For example, the use of organic gas cleaning fluid contains organic pollution

In the case of 9J, water-soluble contaminants, ionic contaminants, and solid contaminants, the regeneration device must completely remove various contaminants, and the regeneration described in, for example, JP-A-2001-129302 can be circulated. The device is connected to the cleaning device. Further, the cleaning system may include a buffer tank for temporarily storing the fluorine-based cleaning liquid between at least one of the refining device and the cleaning device, and between the cleaning device and the regenerating device. When the purification buffer tank is installed on the downstream side of the refining device, the purified fluorine system can be purified for the next batch cleaning process in parallel with the washing step performed by the cleaning device. The cleaning liquid is previously stored in the purification buffer tank. Therefore, when the used gas cleaning liquid that has been cleaned in the cleaning device is replaced with a new gas cleaning liquid, or the used fluorine-based cleaning liquid is regenerated by the regeneration device, the purification buffer tank can be used. The purified fluorine-based cleaning liquid in the inside is supplied to the subsequent batch cleaning treatment, and the cleaning treatment can be performed efficiently. In addition, when the regeneration buffer tank is installed on the upstream side of the regeneration apparatus, when the fluorine-based cleaning liquid that has been used in the cleaning apparatus is regenerated by the regeneration apparatus, the used fluorine can be used. The cleaning liquid is transferred to the regeneration buffer tank, and the purified fluorine-based cleaning liquid is supplied from the refining device to the cleaning device, and the used fluorine is used from the regeneration buffer tank during the cleaning step performed by the cleaning device. The cleaning liquid is supplied to the regeneration device for regeneration treatment. Further, when the second regeneration buffer tank is provided on the downstream side of the regeneration device, the regenerated fluorine-based cleaning liquid can be continuously fed to the second regeneration buffer tank and stored in advance for use. In the next batch cleaning. Further, when both the purification buffer tank and the regeneration buffer tank are provided, the above advantages of the respective buffer tanks can be obtained, and the double washing treatment can be performed more efficiently. The cleaning system of the present invention is connected by piping to continuously connect the refining device and the cleaning device of the respective contaminant removing devices, thereby continuously removing the unused fluorine-based cleaning liquid. _

The high-purity fluorine-based cleaning solution prepared by the product is directly supplied to the '10,000 dyes' and is in contact with the external environment. > In addition, in the present cleaning system, in order to prevent the heart of the fluorine-based cleaning liquid from stagnating, for example, a pump type or an air type transfer means can be provided in the middle of the pipe #, and the fluorine-based cleaning liquid can be transferred by gravity difference. . (Description of cleaning method) The cleaning system towel constructed as described above is used for cleaning the hair of the electronic component

The cleaning method may include a cleaning liquid regeneration step of regenerating the fluorine-based cleaning liquid discharged from the u device by the regeneration device, and circulating it to the cleaning device. Further, the washing liquid replenishing step may be further included, and the purified fluorine-based cleaning liquid is supplied from the refining device to the washing device. In addition, the cleaning step may be performed by immersing the electronic component in the fluorine-based π $ liquid in the cleaning tank, and immersing the cleaned electronic component in the washing tank 3if and cleaning the liquid towel. The electrons and the pieces after the washing were cleaned by the vapor retention portion, and the steam-cleaned electronic components were shower-washed by the purified 321090 16 200946254 gas-based cleaning liquid from the shower nozzle. e Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Further, the present invention is not limited to the embodiments exemplified below. (First Embodiment) Fig. 1 is a schematic configuration view showing a first embodiment of a cleaning system according to the present invention. The cleaning system of the first embodiment is composed of a cleaning device 10 and a refining device 20 connected to the cleaning device 10 by piping. The cleaning device 10 includes a main body 11 having an open top, a washing tank 12 disposed in the lower portion of the main body 11, a washing tub 13, and a vapor condensation portion 14 disposed along an upper opening edge of the main body 11 in the washing tank 12 A fluorine-based cleaning liquid C is accommodated in the inside of the washing tub 13. Further, in Fig. 1, the two-point chain line indicates the liquid level of the fluorine-based cleaning liquid C, and the amount of the fluorine-based cleaning liquid C is set such that the liquid level of the cleaning tank 12 is constantly lower than the liquid level of the washing tank 13. The cleaning tank 12 has a heater 12a on the inner bottom surface, and the fluorine-based cleaning liquid C in the cleaning tank 12 is heated by the heater 〇 12a. In addition, a part of the heated fluorine-based cleaning liquid C in the cleaning tank 12 is vaporized and rises, and a vapor layer S of the fluorine-based cleaning liquid C is formed above the cleaning tank 12 and the washing tank 13. Further, in Fig. 1, a broken line indicates the boundary between the vapor layer S and the atmosphere. The washing tub 13 has an ultrasonic generator 13a on the inner bottom surface, and ultrasonic waves are applied to the fluorine-based cleaning liquid C in the washing tub 13 by the ultrasonic generator 13a. The vapor condensation portion 14 is provided with a condensation tube 14a provided along the inner surface of the upper opening edge of the main body 11, and a cooling circulation portion (not shown) circulates 17321090 200946254 refrigerant in the condensation tube Haβ; The portion l4b is provided at a lower portion of the condensation; and the water separator 14c is connected to the drain groove portion 14b and the washing tub 13 via a pipe. The part of the vapor in the sacrificial layer S is combined with thermal energy, whereby it will liquefy and accumulate in the drain tank / 14 contact and lose. The cleaning liquid C contains F wide price 丨 14b. Since the liquefied fluorine-based cleaning liquid e is dehydrated from the water discharged from the water, the gas and water are separated, and the specific gravity is introduced into the water separation crucible 14c than the fluorine-based, main, and P 14b, and is discharged to the upper drainage π. The small water system of C is selected from the lower portion π of the water separator 14c through the piping = '(four)' cleaning liquid e, and is selected from the water separator 14c refining device 20 into the washing tank 13. In order to remove water-soluble dirt: the pipes are connected in series from the upstream side in series: the structure of the water wire device q 八 m wire I of the money contact tube 2 urethane ionic contaminant removal / away from $ 22 and the hygroscopic material tube a column 23, an ionic contaminant removal column 24 for removing organic pollutants, a turret 25, and a heater built-in type of distilled water contact column for removing the second rectification device Filter device 26 of the object. With the water discharge port, and at the lower part: the upstream end of the upper 卩 has a cleaning liquid flow inlet port. The downstream end of the cleaning liquid flow has a cleaning liquid discharge port and a water flow cleaning liquid C leading to the inside = connected by a pipe for The unused fluorine system is connected to a hopper 21a (not shown) by a pipe, and the water inlet is passed through the source of the device. Slot 13. (4) Washing of the pipe connection cleaning device 10 The main and a washing method of the cleaning system includes: a purification step, 321090 200946254. The unused fluorine-based cleaning liquid is supplied to the refining device 20 and refined; In the cleaning step, the electronic component is cleaned by the fluorine-based cleaning liquid C in the cleaning device 10, and the purified fluorine-based cleaning liquid C is supplied to the cleaning device 10 before the electronic component is cleaned in the cleaning device 10. <Regarding the Purification Step> In the water contact column 21, the fluorine-based cleaning liquid flows in from above, and the water system flows in from below. When the fluorine-based cleaning liquid contains a water-soluble contaminant, the water-soluble contaminant is removed while the fluorine-based cleaning liquid is lowered, and then transferred to the water separator 22. Further, water used for the treatment is discharged from the upper portion of the water contact column 21. Since the fluorine-based cleaning liquid transferred to the water separator 22 contains a trace amount of water, the fluorine-based cleaning liquid and the water are separated into a lower layer and an upper layer in the water separator 22, and the lower fluorine-based cleaning liquid is transferred to the moisture-absorbing material tube. Column 23. Further, the separated water is discharged from the upper portion of the water separator 22. Since the fluorine-based cleaning liquid transferred to the moisture absorbing material column 23 contains a trace amount of hydrazine moisture, the fluorine-based cleaning liquid is transferred to the ionic pollutant removal column 24 after the moisture is removed by the moisture absorbing material (e.g., zeolite). When the fluorinated cleaning solution transferred to the ionic contaminant removal column 24 contains ionic contaminants, the ionic contaminant removal column 24 is removed by ionic contaminants (eg, alumina gel). After removing the ionic contaminant, the fluorine-based cleaning liquid is transferred to the steaming tower 25 . In the case where the fluorine-based cleaning liquid transferred to the distillation column 25 contains an organic contaminant, the organic contaminant is removed by a distillation operation in the distillation column 25 using a difference in boiling point between the organic contaminant and the fluorine-based cleaning liquid. Thereafter, the fluorine system 19 321090 200946254 cleaning liquid is transferred to the filtration device 26. When the fluorine-based cleaning liquid transferred to the filtering device 26 contains solid contaminants, the solid contaminants are removed by the filtering device 26 having the fine filtration membrane and the ultrafiltration membrane. In addition, solid contaminants sometimes contain absorbent materials or ionic contaminant removal materials that flow from the upstream side. Thus, the fluorine-based cleaning liquid through the water contact column 21, the water separator 22, the moisture absorbing material column 23, the ionic contaminant removal column 24, the distillation column 25, and the filtration device 26 is not water-soluble, The fluorine-based cleaning liquid C purified by high purity of various ionic, organic, and solid contaminants is sent to the washing tub 13 of the washing apparatus 10. In other words, when the electronic component is cleaned using the latest fluorine-based cleaning liquid, the purified fluorine-based cleaning liquid C is supplied into the empty washing tank 13 of the cleaning device 10, and the fluorine-based cleaning overflowing from the washing tank 13 is performed. Liquid C is supplied to the washing tank 12. <Regarding the cleaning step> In the cleaning step, first, the electronic component is immersed in the heated fluorine-based cleaning liquid C in the cleaning tank 12 to remove the dirt (mainly organic contaminants) on the surface of the electronic component. . Next, the electronic component is immersed in the fluorine-based cleaning liquid C in the washing tub 13. Since the fluorine-based cleaning liquid C in the washing tank 13 is kept at a lower temperature than the fluorine-based cleaning liquid C in the cleaning tank 12, the electronic components are cooled in the washing tub 13. Further, since the fluorine-based cleaning liquid C is ultrasonically applied to the washing tank 13 by the ultrasonic generator 13a, the dirt remaining in the cleaning tank 12 and remaining on the surface of the electronic component is acted upon by ultrasonic waves. 20 321090, 200946254 Peel off from electronic components. Then, the electronic component is taken out from the washing tub 13 and introduced into the vapor layer S, and the final cleaning is performed by the fluorine-based cleaning liquid condensed and liquefied on the surface of the electronic component, and the electronic component is taken out from the opening above the cleaning device 10. In the washing step, the cleaned fluorine-based cleaning liquid which is condensed and liquefied in the condensing unit 14 is returned to the washing tank 13 after the water separation, and the contaminants brought into the sacrificial tank 13 by the electronic component from the washing tank 12 are used. The overflow flow returns to the cleaning tank 12. In the cleaning step, since the electronic component can be cleaned by using a fluorine-based cleaning liquid which further increases the purity of the unused fluorine-based cleaning liquid, the cleanliness of the electronic component can be further improved. In the cleaning system, when the internal fluorine-based cleaning liquid C is reduced by the cleaning process of the electronic component by the cleaning device 10, the cleaning can be performed during and/or after cleaning. The fluorine-based cleaning liquid is replenished to the washing tub 13. Φ In addition, in the cleaning system, after the predetermined number of electronic components are cleaned (one batch of cleaning process) by the cleaning device 10, it is necessary to replace the dirty fluorine-based cleaning liquid C in the cleaning device 10. At this time, the valve provided in the discharge port (not shown) at the bottom of the washing tank 12 and the washing tub 13 is opened, and the fluorine-based cleaning liquid that has been used internally is collected in the recovery container, and the fluorine purified by the refining device 20 is used as needed. The cleaning liquid C cleans the inside of the empty cleaning device 10, and after closing the discharge port, the fluorine-based cleaning liquid C purified by the refining device 20 is introduced into the washing tank 13 and the washing tank 12 as described above. 21 321090 200946254 In addition, the recovered fluorine-based cleaning liquid is disposed of by disposal or may be regenerated by a regeneration device, and the regenerated fluorine-based cleaning liquid may be directly introduced into the cleaning device 10 and reused. The purity is further increased by the refining device, and then introduced into the cleaning device 10 and reused. (Second embodiment) Fig. 2 is a schematic configuration diagram of a second embodiment of the cleaning system of the present invention. As in the first embodiment, the cleaning system of the second embodiment is constituted by the cleaning device 100 and the refining device 200 connected to the cleaning device 100 by piping. However, the configuration of the cleaning device 1 and the tanning device 200 and the embodiment are somewhat Minor. Hereinafter, differences between the second embodiment and the first embodiment will be mainly described. The cleaning device 100 includes a main body 11 that is open at the top, a cleaning tank 120 disposed in the lower portion of the main body 110, a washing tank 13A, and a vapor condensation unit 140 disposed along the upper opening edge of the main body 110, and The cleaning tank 120 is adjacent to the vapor generation tank 15A disposed and the distillation column 16〇 disposed above the vapor generation tank 150. In the same manner as in the first embodiment, the washing tank 120 has a heater i2〇a, the washing tank 130 has an ultrasonic generator 130a, and the vapor condensation unit 1 has a condensation tube 140a, a drain portion i4〇b, and a water separator 14. 〇c. Further, instead of heating the heater 12, the ultrasonic generator may be placed in the cleaning tank 120. The steam generating tank 150 is disposed outside the vapor condensing unit 14 ,, and has a heater 150a on the bottom surface of the unit. The main body 110 has a portion covering the upper portion of the vapor generation tank 150, and a distillation column 160 is mounted on the portion. Further, the distillation column 160 and the vapor generation groove 150 are in communication with each other by a communication hole formed in the main body 110. Further, a discharge port for discharging steam is formed at the upper end of the distillation column 160, and the discharge port passes through the vicinity of the condensation pipe 14〇a of the vapor condensation portion 14 via the pipe.清洗 The cleaning process of the electronic component by the cleaning device 100 is also the same as that of the first embodiment. First, the electronic component is immersed in the heated fluorine-based cleaning liquid C in the cleaning tank 120, and then washed. The fluorine-based cleaning liquid to which the ultrasonic wave is applied in the washing tank 13 is washed, and is taken out to the vapor layer S vaporized by the heated fluorine-based cleaning liquid c in the washing tank 120, and then steam-cleaned. , take it out to the outside. During this period, the fluorine-based cleaning liquid c overflowing into the cleaning tank 120 is introduced into the steam generation tank 150, and a part of the vapor of the fluorine cleaning liquid C heated and vaporized in the steam generation tank 150 is steamed. The crane tower 160 contacts the condensation tube 140a, thereby liquefying and collecting in the drainage groove portion_. That is, in the cleaning step, the fluorine-based cleaning liquid stream in the cleaning tank 120 is vapor-generated, and the fluorine-based cleaning liquid containing organic contaminants is vaporized, and the tank 160 is vaporized. The vapor of the organic pollutant is cooled, liquefied, and returned to the vapor generation tank 16 by the second distillation column 160, and only the vapor of the fluorine-based cleaning liquid having no organic pollutant passes through the distillation column (9), and is coagulated by helium gas. The part 140 is liquefied. At the same time, a part of the vapor of the vapor layer is also liquefied by the vapor condensation unit 聚集4 聚集 and is collected in the drain tank portion 321090 23 200946254 140b, and the clean fluorine-based cleaning liquid is returned from the drain tank portion 140b through the water separator 140c to Washing tank 130. The refining device 200 is configured to be continuously connected in series by a pipe: a water contact pipe 210 to which the feed hopper 210a is connected, a water separator 220, a moisture absorption pipe column 230, an ionic pollutant removal pipe column 240, and filtration The device 260 and the filter device 260 are connected to the washing tub 130 of the washing device 100 by piping. In other words, the refining device 200 is the same as the embodiment-described except that the distillation column 25 (see Fig. 1) in the finishing device 20 of the first embodiment is omitted. ❹ According to the cleaning system of the second embodiment, it is possible to remove water-soluble contaminants other than organic contaminants in the unused fluorine-based cleaning liquid by the refining device 200, and to remove ionic contaminants, and The fluorine-based cleaning liquid purified by the removal of the solid contaminant is introduced into the washing tank 130 of the washing apparatus 100, and the electronic component is cleaned by the washing apparatus 100, and the fluorine-based cleaning liquid containing the organic contaminant is purified by the distillation column 160. And returning it to the washing tank 130.实施 (Embodiment 3) Fig. 3 is a schematic configuration view showing a third embodiment of the cleaning system of the present invention. The cleaning system of the third embodiment includes the cleaning device 10 and the refining device 20 which are the same as those of the first embodiment described in Fig. 1, and further includes a regenerating device 30 for regenerating the used fluorine-based cleaning liquid. In Fig. 3, the same components as those in Fig. 1 are denoted by the same reference numerals. Hereinafter, the difference between the third embodiment and the first embodiment will be mainly described. 24 321090 200946254 The regenerative device 30 is connected to the washing tank 12 and the washing tub 13 of the washing device 10 by the circulation pipe 31, and the fluorine in the washing tank 12 is contaminated. The cleaning liquid is introduced into the regeneration device 30, and the I-based cleaning liquid that has been purified and purified is returned to the washing tub 13 and reused. For example, after the completion of one batch of the cleaning process, the dirty fluorine-based cleaning liquid is continuously transferred from the cleaning tank 12 to the regeneration device 30 for regeneration, and the regenerated detergent composition liquid is continuously supplied to the next step. The washing tank 13 before the start of the washing process of the batch. Further, in the cleaning system, when the cleaning process of the electronic component by the cleaning device 10 is repeated to reduce the internal fluorine-based cleaning liquid C, the purified fluorine system may be used during cleaning and/or after cleaning. The cleaning liquid is replenished to the washing tub 13. The regeneration device 30 preferably includes a plurality of contaminant removal devices for removing various contaminant components, for example, a dewatering cleaning device, a moisture removal device, an ionic contaminant removal device, and a rectification device, which are provided in the same manner as the refining device 20. As well as the filter device, a known regeneration device can also be used. According to the cleaning system, the used fluorine-based cleaning liquid can be transferred from the cleaning device 10 to the regeneration device 30 through the circulation pipe 31, and the fluorine-based cleaning liquid subjected to the regeneration treatment can be passed from the regeneration device 30 to the circulation pipe 31. Transfer to the cleaning device 10. As a result, the fluorine-based cleaning liquid can be easily transferred in a short time, and the fluorine-based cleaning liquid subjected to the regeneration treatment can be transferred to the cleaning device 10 without coming into contact with the external environment, thereby preventing contamination from being mixed from the outside. To the cleaning solution. 25 321090 200946254 (Fourth Embodiment) Fig. 4 is a view showing a schematic configuration of a fourth embodiment of the cleaning system of the present invention. The cleaning system of the fourth embodiment includes the cleaning device 100 and the refining device 200 which are the same as those of the second embodiment described in Fig. 2, and the same regenerative device 30 as that of the third embodiment is provided. In the fourth drawing, the same components as those in the second and third figures are denoted by the same reference numerals. In the cleaning system of the fourth embodiment, as in the third embodiment, the used dirty fluorine-based cleaning liquid can be easily and highly purified in the system. (Fifth Embodiment) Fig. 5 is a schematic block diagram showing a fifth embodiment of the cleaning system of the present invention. As shown in Fig. 5, the cleaning system of the fifth embodiment is provided between the refining device 20 and the cleaning device 10 in the cleaning system (see Fig. 3) of the third embodiment to temporarily store and purify the purified fluorine. A buffer tank 41 for purifying the cleaning liquid is provided, and a regeneration buffer tank 42 for temporarily storing the regenerated fluorine-based cleaning liquid between the downstream side of the regeneration device 30 and the cleaning device 10 is provided. According to the cleaning system of the fifth embodiment, the fluorine-based cleaning liquid C in the cleaning device 10 can be continuously transferred to the regeneration device 30 for regeneration processing, and the regenerated fluorine-based cleaning liquid can be continuously transferred to the regeneration buffer. In the tank 42, during this period, the purified fluorine-based cleaning liquid in the purification buffer tank 41 is continuously transferred to the cleaning device 10 to prepare for the next cleaning step. 26 321090 200946254 Further, the fluorine-based cleaning liquid C in the cleaning device 10 can be continuously transferred to the regeneration device 30 for regeneration treatment, and the recycled fluorine-based cleaning liquid in the regeneration buffer tank 42 can be continuously maintained. The ground is transferred to the cleaning device 10 for preparation for the next cleaning step. Therefore, the cleaning process of the batch unit can be performed efficiently. Further, a part of the purified or regenerated fluorine-based cleaning liquid stored in each of the buffer tanks 41, 42 may be replenished to the cleaning device 10 at any time. Further, the position of the buffer tank 41 for purification is not limited to the position shown in the drawing, and the position may be between the distillation column 25 and the filter 26, between the ionic contaminant removal column 24 and the distillation column 25, and suction. The wet material column 23 is separated from the ionic contaminant removal column 24 or before the water contacts the column 21. In this case, the gas cleaning liquid before purification or before purification is temporarily stored in the purification buffer tank. Further, the position of the regeneration buffer tank 42 may be between the upstream side of the regeneration device 30 and the cleaning device 10. In this case, the It-based cleaning liquid before regeneration is temporarily stored in the regeneration buffer tank 42. Further, in the fifth embodiment, the buffer tank may be used only for one of refining and regenerating. Further, the configuration including the purification buffer tank 41 and/or the regeneration buffer tank 42 can be applied to the cleaning systems of the first, second, and fourth embodiments in addition to the cleaning system of the third embodiment. (Embodiment 6) Fig. 6 is a view showing a schematic configuration of a sixth embodiment of the cleaning system of the present invention. 27 321090 200946254 The cleaning system according to the sixth embodiment is configured to include the cleaning device 10 and the refining device 20 which are the same as the third embodiment described in the third drawing, and the cleaning device 10 is provided with a shower nozzle 17 from the shower nozzle. The fluorine-based cleaning liquid purified by the refining device 20 is ejected, and the electronic components after the steam cleaning are shower-washed. In Fig. 6, the same constituent elements as those in Fig. 3 are denoted by the same reference numerals. Hereinafter, differences between the sixth embodiment and the third embodiment will be mainly described. In the sixth embodiment, for example, the shower nozzle 17 is disposed above the vapor storage portion S in the cleaning device 10, and is adjacent to the upper edge of the main body 11 of the cleaning tank 12, and the branch pipe 28 is provided and the branch pipe 28 is connected. In the shower nozzle 17, the branch pipe 28 is branched from the middle of the pipe 26 connecting the refining device 20 and the pipe 27 of the washing device 10. Further, the opening and closing valve 28a is provided in the middle of the branch pipe 28, and the opening and closing valve 27a is provided on the downstream side of the branch pipe 28 of the pipe 27. According to this configuration, in the cleaning step, the opening and closing valve 27a can be closed, the opening and closing valve 28a can be opened, and the fluorine-based cleaning liquid purified by the refining device 20 can be ejected from the shower nozzle 17 to carry out the vapor S in the vapor retention portion. The electronic components after the steam cleaning are shower cleaned. Further, the ruined cleaning liquid which has been used for shower cleaning can be discharged into the cleaning tank 12 and reused in the cleaning tank 12. Therefore, even if the vapor S contains the vapor of the organic contaminant and the organic contaminant remains on the surface of the electronic component after the vapor cleaning, the surface of the electronic component is washed by the purified shower-like depleted cleaning liquid. 28 321090 200946254 Machine-based contaminants, thus further improving the cleanliness of electronic components. Further, the shower cleaning can be carried out in addition to the cleaning system of the third embodiment, and can be applied to the cleaning systems of the first, second, fourth, and fifth embodiments. In particular, it is preferable that the purified fluorine-based cleaning liquid is supplied to the shower nozzle 17 at any time from the purification buffer tank 41 (see FIG. 5). (Embodiment 7) Fig. 7 is a view showing a schematic configuration of a seventh embodiment of the cleaning system of the present invention. The cleaning system according to the seventh embodiment is the same as the first embodiment except that it is different from the cleaning device 10 in the cleaning system of the first embodiment described in Fig. 1. In Fig. 7, the same components as those in Fig. 1 are attached with the same symbols. Hereinafter, differences between the seventh embodiment and the first embodiment will be mainly described. The cleaning device 10A according to the seventh embodiment includes a main body 11 having an upper opening, a lid 11a that opens and closes the upper opening of the main body 11, and a washing tank 12 and a washing tub 13 in a hierarchical manner. It is disposed in the lower portion of the main body 11 and contains a fluorine-based cleaning liquid C in the inside of the washing tank 12 and the washing tub 13 . The amount of the fluorine-based cleaning liquid C is such that the liquid level of the cleaning tank 12 is constantly lower than the liquid level of the washing tank 13. Further, an ultrasonic generator 13a is provided on each of the cleaning tank 12 and the inner bottom surface of the washing tub 13, and ultrasonic waves are applied to the cleaning tank 12 and the fluorine-based cleaning liquid C in the washing tank 13 by the ultrasonic generators 13a. 29 321090 200946254 When the electronic component is cleaned by the cleaning device 10A, the lid 11a is opened, and first, the electronic component is immersed in the fluorine-based cleaning liquid C in the cleaning tank 12 at room temperature, by the action of ultrasonic waves. Peel off the surface of the electronic components. Then, the electronic component is immersed in the fluorine-based cleaning liquid C in the washing tank 13 at room temperature, and the dirt remaining on the surface of the electronic component is peeled off by the action of ultrasonic waves, and the electrons are taken out from the upper opening of the cleaning device 10A. Component. As described above, in the seventh embodiment, the steam cleaning performed in the first embodiment is omitted. Further, in addition to the cleaning step of the electronic component, basically, the lid body 11a is closed, and dust, dust, dirt, and the like are sealed in the cleaning device 10A so as not to enter the washing tank 12 and the washing tub 13. (Embodiment 8) Fig. 8 is a view showing a schematic configuration of an eighth embodiment of the cleaning system of the present invention. The cleaning system of the eighth embodiment is the same as the embodiment 7 except that it is different from the cleaning device 10A in the cleaning system of the seventh embodiment described in Fig. 7. In Fig. 8, the same components as those in Fig. 7 are denoted by the same reference numerals. Hereinafter, differences between the eighth embodiment and the seventh embodiment will be mainly described. In the cleaning device 10B of the eighth embodiment, the shower nozzle 17 (see Fig. 6) is provided in the cleaning device 10A of the seventh embodiment. The shower nozzle 17 is connected to the refining device 20 in the same manner as in the sixth embodiment. When the electronic component is cleaned by the cleaning device 10B, in the same manner as in the seventh embodiment, the electronic component is cleaned by the shower nozzle 17 after the cleaning tank 12 and the washing tub 13 are cleaned, 30 321090 200946254 Liquid C is shower cleaned. Alternatively, one or both of the washing performed in the washing tank 12 and the washing order in the washing tub 13 may be omitted, and the shower washing may be directly performed. In addition, shower cleaning can also be used for high pressure shower cleaning. (Embodiment 9) FIG. 9 is a schematic configuration view showing a ninth embodiment of the cleaning system of the present invention. The cleaning system according to the ninth embodiment is the same as the first embodiment except that it is different from the cleaning device 10 in the cleaning system of the first embodiment described in Fig. 1. In Fig. 9, the same components as those in Fig. 1 are attached with the same symbols. Hereinafter, differences between the ninth embodiment and the first embodiment will be mainly described. In the cleaning device i〇c according to the ninth embodiment, the sacrificial tank 13 of the cleaning device 10 in the first embodiment is omitted. When the electronic device is cleaned by the cleaning device 10C, the electronic component is not immersed in the heated fluorine-based cleaning liquid c in the cleaning tank 12, and is cleaned in the vapor layer S. At this time, when the electronic component is placed in the vapor layer S in a state where the electronic component is cooled, the vapor of the cleaning liquid on the surface of the component condenses and liquefies, and the surface of the rinsing component is smeared. After that, it is temporarily placed, and since the temperature of the electronic component gradually rises to the boiling point of the cleaning liquid, the cleaning liquid on the surface of the module is vaporized, and the electronic components are dried. Alternatively, the electronic component may be taken out from the vapor layer s before the electronic component is dried, so that the electronic component is naturally dried or dried by an external drying device. 321090 200946254 (Other Embodiments) (1) In each of the above embodiments, a circulation path for a fluorine-based cleaning liquid in a washing tank for circulating a cleaning device may be provided, and a filter may be provided in the circulation path. The fluorine-based cleaning liquid in the washing tank is cleaned by a filter. According to this configuration, even when the solid contaminant adhering to the electronic component before the cleaning is peeled off in the washing tank and mixed in the fluorine-based cleaning liquid, the solid contaminant can be removed from the fluorine-based cleaning liquid in the washing tank, and Can further improve the cleanliness of electronic components. (2) The cleaning system according to the second embodiment (see Fig. 2) and the fourth embodiment (see Fig. 4) is provided in the cleaning apparatus 100, and is provided with a distillation tower for removing organic pollutants from the used fluorine-based cleaning liquid. Since the distillation column is omitted from the refining device 200, the refining device 200 may be provided with a distillation column in the same manner as in the first embodiment (see the first drawing) and the third embodiment (see the third drawing). By providing the distillation column in the refining device 200, the unused fluorine-based cleaning liquid having a higher purity from which organic pollutants have been removed can be supplied to the cleaning device 100. (3) The cleaning system of Embodiments 7 to 9 (Figs. 7 to 9) may be the same as Embodiments 3 to 6 (Figs. 3 to 6), and includes the regeneration device 30 and the buffer tanks 41, 42. . (Examples) Hereinafter, the present invention will be described in further detail by way of examples, but the present invention is not limited to these examples. (Embodiment 1)

In the case of the fluorine-based cleaning liquid, it is a water-soluble dyed substance produced by Vertrel (registered trademark) XF (DU 32 321090 200946254 PONT-MITSUI FLUORO CHEMICALS C0MPANY, LTD., manufactured by Kun + 2-propanol (hereinafter referred to as IPA) at 200 ppm by weight. 'And Krutox (registered trademark) 143AC (manufactured by DuPont, Inc.) 5 was used to reset ppm as an organic contaminant to prepare a fluoranthene/month wash with simulated digestion. In the refining device 20 in the figure, the fluorine-based cleaning liquid having the simulated contamination is purified, and the fluorine-based cleaning liquid after the purification is removed by a moisture meter (manufactured by Mitsubishi Chemical Corporation, CA-06 type). The measurement results are shown in Table 1. For the ionic contaminant removal device 24, a molecular sieve 3A (manufactured by UNION SHOWA K.) was used, and a distillation tower was used in the rectification device 25 ( Oldershaw type, 40). Table 1 Fluoride-based cleaning solution before purification, fluorine-based cleaning solution, water-soluble contaminant (IPA) 166ppm Detection limit below organic pollutants (Krutox 143AC) 5ppm inspection The water content of the water is 224 ppm and 36 ppm. The result of the first embodiment is that the fluorine-based cleaning liquid having the simulated soil is purified by the refining device of the present invention, and a high-purity fluorine-based cleaning liquid can be obtained. (Example 2) First, investigation was conducted. In the cleaning system of the present invention, the fluorine-containing 33321090 200946254 is used in the cleaning liquid, and the unused fluorine-based cleaning liquid is purified in the same manner as in the first embodiment, and is measured in the same manner as in the first embodiment. The amount of various contaminants removed from the purified fluorine-based cleaning solution is shown in Table 2. The unused fluorine-based cleaning solution is the above-mentioned Vertrel XF (registered trademark) using an 18-liter steel cylinder.糸 前 检测 检测 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 03 r ion 0. 03ppb detection limit below leg + ion 0. 08ppb 0. 02ppb confirmed from the results of the second example to the unused fluorine-based cleaning solution A fluorine-based cleaning liquid having a higher purity can be obtained by purifying the fluorine-based cleaning liquid by a refining device. (Industrial Applicability) The cleaning method and the cleaning system of the electronic component of the present invention are not The electronic component is limited, but it is particularly suitable for cleaning the silicon wafer, the ceramic wafer, the silicon wafer obtained by cutting the high-purity fluorine-based cleaning solution, cutting the silicon wafer, and cutting the ceramic. A ceramic wafer, a glass substrate, a metal substrate, a color filter substrate, a printed circuit board, and an electronic component such as an electronic component such as the 34321090 200946254, and a gas-based cleaning liquid obtained by the wafer. Further, it is possible to use a high-purity purification for a long period of time. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing a schematic configuration of a cleaning state 1 of the present invention. Fig. 2 is a schematic block diagram showing a second embodiment of the cleaning system of the present invention. Fig. 3 is a schematic block diagram showing a third embodiment of the cleaning system of the present invention. Fig. 4 is a view showing the outline of a fourth embodiment of the cleaning system of the present invention. Fig. 5 is a view showing the outline of a fifth embodiment of the cleaning system of the present invention. Fig. 6 is a view showing the configuration of a sixth embodiment of the cleaning system of the present invention. 6 #7 1系 The schematic configuration diagram of the seventh embodiment of the cleaning secret of the present invention.

The outline of the embodiment of the cleaning system of the present invention is shown in Fig. 9. Fig. 9 is a view showing the configuration of the cleaning system of the present invention.

10, 10A, 10B 11, 110 main body, 10A, 10B, 1〇c, 100, 100A, 100B, 100C cleaning device 11a cover 321〇9〇 35 200946254

12a, 150a 13a, 130a 14a '140a 12, 120 cleaning tank 13, 130 washing tank 14, 140a vapor condensation portion 14b, 140b drainage groove portion 14c, 22, 140c, 220 water separator 17 shower nozzle 20, 200 21, 210 Flowing water contact column 21a, 210a 23, 230 moisture absorbing material column 24, 240 ionic contaminant removal column 25, 160 distillation column 26, 260 28 branching pipe 27a, 28a heater ultrasonic generator condensing pipe Refining device feed hopper transition open/close valve

30 Regeneration device 31 Recirculation piping 41 Refining buffer tank 42 Regeneration buffer tank 120a Heater or ultrasonic generator 150 Vapor generation tank

C Fluorine-containing organic cleaning agent composition liquid (fluorine-based cleaning solution) S vapor layer 36 321090

Claims (1)

200946254 VII. Patent application scope: ▼ 1. A cleaning method for electronic components, comprising: a refining step of refining an unused fluorine-containing organic cleaning agent composition liquid by a refining device; and a cleaning step using the foregoing The refining device supplies the purified cleaning agent composition liquid in the cleaning device to the cleaning electronic component; in the refining step, at least the removal of the organic contaminant by the rectifying device and the filtering device are performed. Removal of solids from the body. 2. The method of cleaning an electronic component according to claim 1, wherein the refining step comprises removing water-soluble contaminants by a water cleaning device; removing organic pollutants, water-soluble contaminants The removal, the order of removal of the solid contaminants, or the removal of the water-soluble contaminants, the removal of the organic contaminants, and the removal of the solid contaminants are carried out in advance to refine the cleaning composition liquid. 3. The method for cleaning an electronic component according to claim 1, wherein the electronic component is a stone wafer, a ceramic wafer, a dream wafer obtained by cutting the stone wafer, and cutting the ceramic tile. A wafer obtained from a wafer, a glass substrate, a metal substrate, a color filter substrate, a printed substrate, and an electronic component using the same. 4. The method of cleaning an electronic component according to the first aspect of the invention, further comprising a regeneration step of regenerating the detergent composition liquid discharged from the cleaning device by the regeneration device and circulating it to the cleaning device. 37 321090 200946254 5. The method of cleaning an electronic component according to claim 1, wherein the replenishing step comprises replenishing the purified cleaning agent composition liquid from the refining device to the cleaning device. 6. The cleaning method of the electronic component according to the first aspect of the invention, wherein the cleaning device comprises: a washing tank supplied with a cleaning agent composition liquid purified by the refining device; and a washing tank for accommodating And heating the cleaning agent composition liquid overflowing from the washing tank; the vapor retention portion is a vapor in which the cleaning agent composition liquid heated and vaporized in the cleaning tank is retained; and the vapor condensation portion causes the vapor to remain The steam is condensed and returned to the washing tank; and the shower nozzle is sprayed with the cleaning agent composition liquid refined by the refining device; the cleaning step is: immersing the electronic component in the cleaning tank The cleaning agent composition liquid is washed, and the cleaned electronic component is immersed in the cleaning agent composition liquid in the washing tank to be washed, and the washed electronic component is steam-cleaned by the vapor in the vapor retention portion. The steam-cleaned electronic component is shower-washed by the cleaning agent composition liquid from the shower nozzle. 7. A cleaning system for electronic components for cleaning electronic components by the cleaning method of the first application of the patent scope, the cleaning system is provided with: 38 3?1090 200946254 refining device, which removes unused components The fluoroorganic cleaning agent is refined by the contaminants contained in the composition liquid; and the cleaning device cleans the electronic components by using the cleaning agent composition liquid purified by the refining device; the refining device is at least useful to remove organic The rectifying device for the contaminant and the filtering device for removing the solid contaminant, the cleaning agent composition liquid is circulated in the above-mentioned sophisticated device and the filtering device, and purified. 8. The cleaning system for an electronic component according to claim 7, wherein the refining device is provided with a water cleaning device for removing water-soluble contaminants, and a moisture removing device for removing moisture, and is configured as described above. The order of the rectification apparatus, the water cleaning apparatus, the moisture removal apparatus, and the filtration apparatus, or the order of the water cleaning apparatus, the moisture removal apparatus, the rectification apparatus, and the filtration apparatus, flows the cleaning agent composition liquid and supplies it refined. 9. The cleaning system for an electronic component according to claim 7, wherein the refining device is provided with an ionic contaminant removing device useful for removing ionic contaminants. 10. The cleaning system for an electronic component according to claim 7, wherein the regenerating device is regenerated, and the cleaning agent composition liquid used in the cleaning device is regenerated and circulated to the cleaning device. 11. The cleaning system for an electronic component according to claim 7, wherein the cleaning device is provided with: a washing tank supplied with a cleaning liquid composition of 39 321 090 V 200946254 purified by the refining device; a tank for accommodating and heating a cleaning agent composition liquid overflowing from the washing tank; and a vapor retention portion for retaining a vapor of a cleaning agent composition liquid heated and vaporized in the cleaning tank; and a vapor condensation portion; The vapor in the vapor retention portion is condensed and returned to the washing tank; and the electronic component is immersed in the cleaning agent composition liquid in the cleaning tank to be cleaned, and the cleaned electronic component is cleaned Washing is performed by immersing in the cleaning agent composition liquid in the before-described washing tank, and the washed electronic component is steam-washed by the vapor in the vapor retention portion; the regeneration device is configured to be discharged from the cleaning tank The detergent composition liquid is regenerated and circulated to the aforementioned washing tank. 12. The cleaning system for an electronic component according to claim 7, wherein at least one of the refining device and the cleaning device and between the cleaning device and the regenerating device is further provided to temporarily temporarily A buffer tank for storing the cleaning agent composition liquid. 13. The cleaning system for an electronic component according to claim 11, wherein the cleaning device is provided with a shower nozzle, and the cleaning agent composition liquid purified by the refining device is sprayed from the shower nozzle, and the steam cleaning is performed. The rear electronic components are shower cleaned. 40 321090