TW200931977A - Monitoring of coated substrate imaging - Google Patents
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- TW200931977A TW200931977A TW97143333A TW97143333A TW200931977A TW 200931977 A TW200931977 A TW 200931977A TW 97143333 A TW97143333 A TW 97143333A TW 97143333 A TW97143333 A TW 97143333A TW 200931977 A TW200931977 A TW 200931977A
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- 239000000758 substrate Substances 0.000 title claims abstract description 235
- 238000003384 imaging method Methods 0.000 title claims abstract description 44
- 238000012544 monitoring process Methods 0.000 title claims abstract description 28
- 238000000576 coating method Methods 0.000 claims abstract description 57
- 239000011248 coating agent Substances 0.000 claims abstract description 47
- 230000003287 optical effect Effects 0.000 claims abstract description 26
- 230000003595 spectral effect Effects 0.000 claims abstract description 15
- 239000010408 film Substances 0.000 claims description 205
- 239000012788 optical film Substances 0.000 claims description 44
- 238000002834 transmittance Methods 0.000 claims description 44
- 238000007747 plating Methods 0.000 claims description 39
- 238000013461 design Methods 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 34
- 239000002184 metal Substances 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 30
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 26
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 23
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 23
- 238000002360 preparation method Methods 0.000 claims description 10
- 230000009977 dual effect Effects 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 7
- 230000005540 biological transmission Effects 0.000 claims description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 4
- 238000005034 decoration Methods 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 30
- 230000035515 penetration Effects 0.000 abstract description 29
- 239000010410 layer Substances 0.000 description 155
- 238000001228 spectrum Methods 0.000 description 40
- 239000011521 glass Substances 0.000 description 31
- 239000011651 chromium Substances 0.000 description 29
- 229910052681 coesite Inorganic materials 0.000 description 26
- 229910052906 cristobalite Inorganic materials 0.000 description 26
- 229910052682 stishovite Inorganic materials 0.000 description 26
- 229910052905 tridymite Inorganic materials 0.000 description 26
- 239000011347 resin Substances 0.000 description 23
- 229920005989 resin Polymers 0.000 description 23
- 238000010521 absorption reaction Methods 0.000 description 22
- 239000000047 product Substances 0.000 description 16
- 238000012360 testing method Methods 0.000 description 15
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 14
- 239000011104 metalized film Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 12
- 238000002310 reflectometry Methods 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 230000004297 night vision Effects 0.000 description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 9
- 239000003086 colorant Substances 0.000 description 9
- 238000005286 illumination Methods 0.000 description 9
- 239000004417 polycarbonate Substances 0.000 description 9
- 229910052709 silver Inorganic materials 0.000 description 9
- 239000004332 silver Substances 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 230000005855 radiation Effects 0.000 description 8
- 238000012937 correction Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000012528 membrane Substances 0.000 description 7
- 230000002238 attenuated effect Effects 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 230000002829 reductive effect Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 239000002356 single layer Substances 0.000 description 5
- 208000004350 Strabismus Diseases 0.000 description 4
- 238000000149 argon plasma sintering Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229920001871 amorphous plastic Polymers 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 210000003298 dental enamel Anatomy 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 241000287107 Passer Species 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 241000593989 Scardinius erythrophthalmus Species 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000000071 blow moulding Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- CBGUOGMQLZIXBE-XGQKBEPLSA-N clobetasol propionate Chemical compound C1CC2=CC(=O)C=C[C@]2(C)[C@]2(F)[C@@H]1[C@@H]1C[C@H](C)[C@@](C(=O)CCl)(OC(=O)CC)[C@@]1(C)C[C@@H]2O CBGUOGMQLZIXBE-XGQKBEPLSA-N 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 210000003195 fascia Anatomy 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 210000000003 hoof Anatomy 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000003331 infrared imaging Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 229940112877 olux Drugs 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000006213 oxygenation reaction Methods 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000003856 thermoforming Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- -1 whitening Substances 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
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- Optical Filters (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
200931977 六、發明說明: 【發明所屬之技術領域】 本發明涉及一種鍍多層介電質膜基板,特別涉及一對可見 光呈現高反射低穿透與對紅外呈現高穿透低反射的成像裝置。 【先前技術】 近年來,全球各地治安敗壞、歐美地區的恐怖活動往往造 - 成政府投資在公共設施上,有必要安裝更多監視用的安全攝影 ❹ 機(Security Camera),用以對惡徒並進行適當的防患與嚇 阻。例如在社區、都會區街道、賣場與其他的公共場所等,遇 有竊盜、性侵或重大事件時,可藉由監視用安全攝影機所攝錄 的影像加以觀察追蹤與還原真相狀況。 但是,科技的進步連帶使得竊賊惡徒或恐怖份子們的惡行 知識與技巧也跟進有所進步,明顯的例子是偷竊破壞監視攝影 機或刻意迴避各處監視地點。 因此,防盜監視用的偽裝隱藏機型(Concealed Camera) 在歐美與全球其他國家地區已是迫切需求的安全裝置,尤其是 對於美國911恐怖事件後公共安全的防護領域,與美國國土安 ® 全部宣告的「公共安全重於個人隱私」更為明顯。 對於防盜防恐監視用的偽裝隱藏機型,主要是把監視用的 攝影機本體或其攝影鏡頭加以隱藏遮住,使監視用的攝影機不 易被發現而遭偷竊破壞,或被刻意迴避其監視的地點,近年來 代表性的有如針孔攝影機(Pin-hole Camera)。 有關先前1974年公開的第3,819,856號美國發明專利 「CAMERACAPULE」,如其摘要(ABSTRACT)之「The dome is coated on it's inside concave surface with a fine layer of chromium which renders the dome transparent from ifs relatively dark inside area and opaque or reflective from 3 200931977 the lighter area outside the housing」主要是說其攝影機 15 的透明球罩26内凹表面上,鍍有〇 (金屬鉻),使人眼從透 明球罩26外表面看透明球罩26内是呈現不透明的…等。 實際上,透明球罩26内凹表面上鍍有的〇層是呈現半 透明狀(如是不透明則可見光無法或不容易進入攝影機15成 像)’來做攝影機15的隱藏,觀察者近看容易看到球罩内 的攝影機15。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multi-layer dielectric film substrate, and more particularly to an imaging device in which a pair of visible light exhibits high reflection and low penetration and high penetration and low reflection for infrared. [Prior Art] In recent years, the security of the world has been corrupted, and terrorist activities in Europe and the United States have often resulted in government investment in public facilities. It is necessary to install more security cameras for surveillance. And carry out appropriate prevention and deterrence. For example, in communities, metropolitan streets, stores, and other public places, in the event of theft, sexual assault, or major events, it is possible to observe and track the truth by monitoring the images recorded with the security camera. However, advances in technology have led to improvements in the evil knowledge and skills of thieves or terrorists. The obvious examples are the theft of surveillance cameras or the deliberate avoidance of surveillance sites. Therefore, the Concealed Camera for anti-theft surveillance is an urgently needed safety device in Europe, America and other countries around the world, especially for the public safety protection field after the 9/11 terrorist attacks in the United States. "Public security is more important than personal privacy" is more obvious. The camouflage hidden model for anti-theft and anti-terrorism surveillance mainly hides the camera body for monitoring or its photographic lens, makes the camera for surveillance difficult to be discovered and is stolen, or is deliberately avoiding the location of its surveillance. In recent years, it has been representative of a pin-hole camera. "The dome is coated on it's inside concave surface with a fine layer of chromium which renders the dome transparent from ifs relatively dark inside area and," CAMERACAPULE, No. 3,819,856, which was previously published in 1974. Opaque or reflective from 3 200931977 the lighter area outside the housing" mainly means that the concave surface of the transparent ball cover 26 of the camera 15 is plated with bismuth (metal chrome), so that the human eye sees the transparent ball from the outer surface of the transparent ball cover 26. The inside of the cover 26 is opaque...etc. In fact, the enamel layer plated on the concave surface of the transparent globe 26 is semi-transparent (if opaque, the visible light cannot or cannot be easily imaged into the camera 15), the camera 15 is hidden, and the observer can easily see it. Camera 15 in the dome.
又,如1973年公開的第3, 739, 703號美國發明專利 r CONCEALMENT OF CAMERAS FOR OBSERVATIONAL PURPOSES」’如其專利資料圖二所示,是在透明球罩9内放 置一不透明遮罩10 (anopaquemask)用以遮著從透明球軍 9進入的入射光。該不透明遮罩10並無遮罩其攝影機鏡頭(否 則可見光無法或不容易進入其攝影機成像),因此觀察者近看 也容易看到透明球罩9内的攝影機鏡頭。 又’如1980年公開的第4,225,881號美國發明專利 r DISCRETE SURVEILANCE SYSTEM AND METHOD FOR MAKING ACOMPONENTTHEREOF」’該發明說明書 摘要指出:重要的S’有一具會掃猫轉動的攝雜安置在一 具有反射效果的球罩内,該球罩的内部鍍有數個重疊的塗 層。在球罩上鍍有一金屬銀層,與一保護層Si〇層。然後除 了保留攝影機的窗口以外再將崎全部塗黑。該攝影機的鏡 頭裝備有-劍料(該發明_f摘要第丨攔第63~第2 欄第2行)。 也就是說,球罩外的光僅能由攝影機的窗口進入,其餘 請參閱該發明囷8、與該發明說明書第7攔第29~38行: 該玻璃球罩220的内部鍵有數個重養的塗層:其中錄絡層2找 是用以增加鍍銀層224與玻璃球罩220之間的附著力。其中 4 200931977Further, as shown in FIG. 2 of the patent document No. 3, 739, 703, which is disclosed in 1973, an opaque mask 10 is placed in the transparent dome 9 (anopaquemask). It is used to cover the incident light entering from the transparent ball army 9. The opaque mask 10 does not cover its camera lens (otherwise, visible light cannot or does not easily enter its camera image), so that the viewer can easily see the camera lens in the transparent dome 9 in close proximity. In addition, 'the invention patent r DISCRETE SURVEILANCE SYSTEM AND METHOD FOR MAKING ACOMPONENTTHEREOF', as disclosed in 1980, the abstract of the invention indicates that the important S' has a reflection that sweeps the cat's rotation and is placed in a reflective effect. Inside the dome, the interior of the dome is plated with several overlapping coatings. The ball cover is plated with a metallic silver layer and a protective layer of Si. Then, except for the window that retains the camera, the black is completely blacked out. The camera's lens is equipped with a sword material (the invention _f summary 丨 第 第 63 to 2 column 2 line). That is to say, the light outside the dome can only be accessed by the window of the camera. For the rest, please refer to the invention 囷8, and the seventh block of the invention manual, lines 29-38: the internal keys of the glass dome 220 have several re-raised Coating: wherein the recording layer 2 is found to increase the adhesion between the silver plating layer 224 and the glass dome 220. Of which 4 200931977
SiO層226是用以保護鍍銀層224而且可控制球罩220上入射 光穿透的範圍(to control the transmission sensitivity range of the coated sphere 220)。至於如何控制?請參閱 該發明說明書第3攔第22〜30行記載: 鍍在鍍銀層上的SiO層數量,可決定玻璃球罩外部的顏 色與鍍膜玻璃球罩的光譜的感度。如何決定?請參閱該發明 說明書第8攔第12〜21行之記載:在SiO層未鍍在鍍銀層224 前,在光穿透玻璃球罩220時人眼看到呈現藍色。當Si〇層 數量增加時,其光譜在玻璃球罩220發生移動,人眼看到呈 現變成綠-黃-褐的顏色。這種光譜變化率取決於放置在鎢絲 ❹ 燈内SiO層的數量、真空室内的溫度、以及待鍍區域的大小 等因素。當蒸鍍的SiO在玻璃球罩呈現所期望的顏色時,就 停止蒸鍵。 因為SiO層在空氣中的折射率與SiO層在塗黑層的折射 率不相同,所以再批覆此透明塑膠層(該發明說明書第2攔 第3卜34行)。 如上揭露有關遮蔽攝影機的方法是屬鍍金屬薄膜或不透 明遮罩,像第3, 819, 856號是以鍍半透明度的金屬鉻Cr來做 攝影機15的隱藏。又,像第4, 225, 881號外罩(globe)是鍍 銀的高反射金屬。又再如第3, 739, 703號是在透明球罩9内放 置一不透明遮軍10 (an opaque mask)用以遮著從透明球罩9 進入的入射光。 鍍鉻Cr (Chromium)、鍍銀(Ag)等稱為鍍金屬薄膜 (Metallic coatings)。由於鍵鉻呈現淺茶色近看隱藏效果不 佳,而鍍銀又容易氧化變黑,因此大都淡出國際市場。目前, 實際應用上有人以金屬鋁(AI)取代。 例如,本人於2007年的新型專利證號M326646「鍍鋁 半球型罩攝影裝置」、與本人於2007年中國大陸公開的實用 新型專利200720154044.5「具減反射膜鍍鋁鏡面的攝影用半 5 200931977 球型遮罩」等,均是在一透明基板上鍍有高反射的金屬鋁薄膜 lib,藉正面入射光的反射用以遮住(隱藏)攝影機、與藉正 面入射光的透射可進入攝影機成像,以及在金屬鋁膜上面再链 具減反射作用的金屬鉻(Cr)膜,用以吸收與減少鍍膜遮罩内 的反光所造成的鬼影,以免影響成像品質。 鍍反射膜’主要是增加光學元件表面的反射率。一般可分 為兩大類,一類是金屬反射膜,一類是全介電質反射膜。此外, 還有把兩者結合起來的金屬介電質反射膜。 金屬反射膜的優點是製備工藝簡單,工作的波長範圍寬; 缺點是光能損耗大,入射金屬膜的光能除必須保留一設定的穿 ® 透率(讓部份入射光進入攝影機成像)外,剩餘的反射率不可 能很高。如不考慮穿透率,單獨的金屬銀Ag在可見光的反射 率可高達約98%。 金屬膜(Metallic coatings)反射帶比較寬,對入射光角 度相對不敏感。金屬膜對紅外有吸收帶,不利紅外夜視攝影。 多層介電質(dielectriccoatings)膜,在特定波長可以達 到很高的反射率,對入射光小角度不敏感,當大角度變化時(如 45度)’反射率將有變化。一般說來,多層介電膜比金屬膜反 射率高,牢固度好,抗損傷力強,在可見光與紅外大都是呈透 ❹ 明狀。 【發明内容】 本發明所要解決的問題有: 如先前技術提及:鍍金屬膜遮罩作為遮住(隱藏)攝影機 的缺點有二: 一是光能損耗大,光能入射到鍍金屬膜遮罩,除了必須保 留一定的穿透光能進入攝影機成像與金屬膜的吸收(損耗)以 外,還必須提高其剩餘的反射光能。其反射光能過低則形成鏡 面反射效果就差,反射效果差就不容易(或無法)對鍍金屬膜 6 200931977 遮罩背面所遮住(隱藏)之攝影機達到隱藏裝飾的目的。如果 刻意降低穿透光用以相對提高反射光,則可能因穿透光能不足 在進入攝影機後不易或無法成像,影響成像品質。 二是鍍金屬膜遮罩對紅外光範圍有吸收带,使穿透的紅外 光能衰減,在夜間或照度不足(例如在1〇Lux)環境與備有 紅外輔助光源下,對攝影機攝取紅外影像的有效距離也會產生 非常顯著的衰減,所以不適合夜視攝影。 本發明所採取的技術方案是: 以一種鍍(多層介電膜)膜基板取代先前技術的鍍金屬 ^ 膜遮罩。 取代後的優點有二: 一是無光能損耗,多層介電質膜「吸收」的光能損耗相 對金屬膜而言,幾乎近於零。 二是鍍多層介電質膜現在的技術對紅外的穿透率很容易 達到90%以上甚至於達到99%。 鍍膜基板為一透明基材(Substrate)上形成有一多層介 電質膜層(multi-layer dielectric coatings ),利用多層介電質 膜的光學干涉效應,使入射的可見光與紅外分別可以達成一預 定的分光比。例如,使入射的可見光入射到此鍍膜基板時可分 © 成兩路光:其中的一路光(例如約佔入射光的70%)在此鍍 膜基板上呈現高反射,用以隱藏鍍膜基板背後的監視攝影機; 另一路光(例如約佔入射光的30%)則穿透此鍍膜基板進入 監視攝影機成像(可見光影像)。以及;使入射的紅外入射到 此鍍膜基板時也可分成兩路光:其中的一路光(例如約佔入射 紅外的96%)呈現「極高」(相對於鍍金屬膜的反射率而言) 穿透率穿透進入監視攝影機成像(紅外影像)。 其中讓可見光呈現高反射的目的有二:一是使人眼目光 不能(或不容易)看穿此鍍膜基板,用以達到此鍵膜基板隱藏 裝飾監視攝影機的作用。二是人眼近距離可透過鏡面的反射增 7 200931977 加周圍的監控視野,例如像大賣場轉角處或停車場的廣角(有 曲面狀的鍍膜基板)反射鏡。 也就是說,此鍍膜基板成像裝置對可見光呈現的高反射 可達到近端與遠端監視的雙重用途。 讓可見光呈現低穿透的目的是:使搭配收納於鍵膜基板 背後的監視攝影機,在可成像的最低進光量條件下,儘量壓低 其穿透光以便提高其反射光的相對比例。也就是說,對於市售 的各類型攝影機(一般稱CCD)因品質等級不同,在同樣環 境照度下如果穿透光有20%〜50°/❶的進光量下可使攝影機成 像,那麼穿透光的最低進光量就控制在20%,不必控制在 ® 50%。這樣就可以提高其反射光的相對比例(因為在一定條件 下,穿透光與反射光成反比),目的是儘可能提高反射光。反 射光越大越像鏡子。 其中讓紅外(光)高穿透的目的是讓紅外的幅射量(不 論是紅外輔助光源或是存在於環境中的紅外幅射),進出於錄 膜基板後可讓監視攝影機攝達到最大的進光量,以利監視攝影 機攝取到尚品質的紅外影像。對一般攝影機的透明玻璃遮罩對 紅外的穿透約92% (並非1〇〇%>也就是說,鍍膜基板與一 般透明玻璃對紅外具有相同的穿透率,但前者更具有隱藏^。 ❹ 其中低反射最好是低到等於0%或趨近於0%。因為此紅 外的低反射對本發明成像的實施中並無其他功能,詳如圓四。 下面對本發明的透明基材、多層介電質膜層與監視攝影 機作以下名詞定義: (1)透明基材,透明基材大約可分為光學級的透明玻璃 與透明樹脂兩大類。透明基材首先必須有高透明度,必然表面 質量要求嚴格,盡量不要有任何斑紋、氣孔、泛白、霧筆、黑 點、變色、粗糙光澤不佳等缺陷。可見光與紅外在透明基材的 透明性,-般同樣受到「光」的反射、穿透、吸收、與散射 等因素影響。本實施例中,在光學級透明基材中其入射光的散 8 200931977 射與吸收現象相對金屬膜而言幾乎可忽略不計。 (IA) 透明玻璃’透明玻璃有青、白板玻璃與bk-7等。 (IB) 透明樹脂,透明樹脂是具光散射少的非結晶體。 一般透明高分子聚合物,其内部有微細界面,也會發生 光散射,其典型就是結晶結構。 例如,同樣是H2〇構成的水和冰。水是透明的,冰多半 不透明’這是因為冰是結晶體,會發生光散射使光透過減少。 水是非結晶體,發生光散射少,故呈現透明。The SiO layer 226 is for protecting the silver plating layer 224 and controlling the transmission sensitivity range of the coated sphere 220. As for how to control? Please refer to paragraph 3 to line 30 of the invention manual. The number of SiO layers plated on the silver plating layer determines the sensitivity of the color outside the glass dome and the spectrum of the coated glass dome. How to decide? Please refer to the description of the eighth column of the invention, No. 12 to 21: before the SiO layer is not plated on the silver plating layer 224, the human eye sees blue when the light penetrates the glass dome 220. As the number of Si 〇 layers increases, the spectrum shifts in the glass dome 220, and the human eye sees a green-yellow-brown color. This rate of spectral change depends on factors such as the amount of SiO layer placed in the tungsten filament lamp, the temperature in the vacuum chamber, and the size of the area to be plated. When the vaporized SiO exhibits a desired color in the glass dome, the steaming is stopped. Since the refractive index of the SiO layer in the air is different from the refractive index of the SiO layer in the black-coated layer, the transparent plastic layer is additionally applied (this invention is referred to as the second block, line 3, line 34). As disclosed above, the method of occluding the camera is a metallized film or an opaque mask, and the third, 819, and 856 are hidden by the translucent metal chrome Cr. Also, the globe 4, 225, 881 is a silver-plated highly reflective metal. Further, as in No. 3, 739, 703, an opaque mask 10 is placed in the transparent dome 9 to cover the incident light entering from the transparent dome 9. Chrome (Chromium), silver (Ag), etc. are called metallic coatings. Because the key chrome is light brown, the hidden effect is not good, and the silver plating is easy to oxidize and blacken, so it mostly fades out of the international market. At present, some people have replaced aluminum metal (AI) in practical applications. For example, in 2007, the new patent number M326646 "aluminum hemispherical cover photographic device", and my utility model patent published in mainland China in 2007200720154044.5 "aluminum with anti-reflective film aluminized mirror half 5 200931977 ball A type of mask, etc., is a highly reflective metal aluminum film lib plated on a transparent substrate. The reflection of the incident light from the front side is used to cover (hide) the camera, and the transmission of the incident light can enter the camera. And a metal chromium (Cr) film with anti-reflection effect on the metal aluminum film to absorb and reduce the ghost caused by the reflection in the coating mask, so as not to affect the image quality. The plated reflective film 'is primarily to increase the reflectivity of the surface of the optical element. Generally, it can be divided into two categories, one is a metal reflective film, and the other is a full dielectric reflective film. In addition, there is a metal dielectric reflective film that combines the two. The metal reflective film has the advantages of simple preparation process and wide operating wavelength range; the disadvantage is that the optical energy loss is large, and the light energy of the incident metal film must be retained except for a set penetration rate (for part of the incident light to enter the camera). The remaining reflectivity cannot be very high. If the transmittance is not considered, the reflectance of the individual metallic silver Ag in visible light can be as high as about 98%. Metallic coatings have a wide reflection band and are relatively insensitive to incident light angles. The metal film has an absorption band for the infrared, which is disadvantageous for infrared night vision photography. Multi-layer dielectric coatings can achieve high reflectance at specific wavelengths and are insensitive to small angles of incident light. When large angles change (eg 45 degrees), the reflectivity will vary. In general, a multilayer dielectric film has a higher reflectance than a metal film, has a good firmness, and is highly resistant to damage, and is generally transparent in both visible light and infrared. SUMMARY OF THE INVENTION The problems to be solved by the present invention are as follows: As mentioned in the prior art, there are two disadvantages of a metallized film mask as a cover (hidden) camera: First, the light energy loss is large, and the light energy is incident on the metallized film. The hood, in addition to having to retain a certain amount of transmitted light into the camera imaging and absorption (loss) of the metal film, must also increase its residual reflected light energy. If the reflected light energy is too low, the specular reflection effect is poor, and the reflection effect is not easy (or impossible). The metallized film 6 200931977 The camera hidden (hidden) on the back of the mask achieves the purpose of hiding the decoration. If the penetrating light is deliberately reduced to relatively increase the reflected light, the penetrating light energy may be insufficient or impossible to image after entering the camera, which may affect the imaging quality. Second, the metallized film mask has an absorption band for the infrared light range, so that the transmitted infrared light can be attenuated, and the infrared image is taken by the camera at night or under illumination (for example, in a 1 lux) environment and with an infrared auxiliary light source. The effective distance also produces a very significant attenuation, so it is not suitable for night vision photography. The technical solution adopted by the present invention is: replacing the prior art metallized film mask with a plated (multilayer dielectric film) film substrate. There are two advantages after substitution: First, there is no optical energy loss, and the light energy loss of the "absorption" of the multilayer dielectric film is almost zero relative to the metal film. Second, the current technology of plating multi-layer dielectric film is easy to achieve infrared transmittance of more than 90% or even 99%. The coated substrate is formed on a transparent substrate (substrate) with a plurality of multi-layer dielectric coatings. The optical interference effect of the multilayer dielectric film enables the incident visible light and the infrared to reach a predetermined one. Split ratio. For example, when incident visible light is incident on the coated substrate, it can be divided into two paths: one of the light (for example, about 70% of the incident light) exhibits high reflection on the coated substrate to hide the back of the coated substrate. Monitor the camera; another light (for example, about 30% of the incident light) penetrates the coated substrate into the surveillance camera image (visible light image). And, when the incident infrared light is incident on the coated substrate, it can also be divided into two paths of light: one of the light (for example, about 96% of the incident infrared light) exhibits "very high" (relative to the reflectivity of the metallized film) The penetration rate penetrates into the surveillance camera imaging (infrared image). Among them, there are two purposes for allowing visible light to be highly reflective: one is to make the eye can not see (or not easily) see through the coated substrate to achieve the function of hiding the decorative camera of the key film substrate. Second, the human eye can increase the reflection through the mirror at a close distance. 7 200931977 Add the surrounding monitoring field, such as a wide-angle (with a curved coated substrate) mirror at the corner of the hypermarket or the parking lot. That is to say, the high reflection of visible light exhibited by the coated substrate imaging device can achieve dual use of near-end and far-end monitoring. The purpose of allowing visible light to be low-penetration is to make the surveillance camera that is placed behind the key film substrate lower the transmitted light as much as possible in order to increase the relative proportion of the reflected light. That is to say, for all kinds of commercially available cameras (generally called CCD), depending on the quality level, if the penetration of light reaches 20%~50°/❶ under the same ambient illumination, the camera can be imaged, then penetrate The minimum amount of light entering the light is controlled at 20% and does not have to be controlled at 50%. This increases the relative proportion of the reflected light (because under certain conditions, the transmitted light is inversely proportional to the reflected light) in order to increase the reflected light as much as possible. The larger the reflection, the more like a mirror. The purpose of making the infrared (light) high penetration is to let the infrared radiation amount (whether the infrared auxiliary light source or the infrared radiation existing in the environment) enter the film substrate to maximize the surveillance camera. The amount of light is introduced to monitor the camera's intake of infrared images of still quality. The transparency of the transparent glass cover of the general camera is about 92% (not 1%). That is to say, the coated substrate has the same transmittance to the infrared as the general transparent glass, but the former is more concealed. ❹ wherein the low reflection is preferably as low as or equal to 0% or close to 0%. Because the low reflection of the infrared has no other function in the implementation of the imaging of the present invention, such as the circle 4. The transparent substrate and the multilayer of the present invention are described below. The dielectric film layer and the surveillance camera are defined by the following terms: (1) Transparent substrate, transparent substrate can be divided into two categories: optical grade transparent glass and transparent resin. Transparent substrate must first have high transparency and inevitable surface quality. Strict requirements, try not to have any defects such as streaks, pores, whitening, fog pens, black spots, discoloration, poor luster, etc. The transparency of visible light and infrared in transparent substrates is also reflected by "light". Influenced by factors such as penetration, absorption, and scattering. In this embodiment, the scattered light of the incident light in the optical grade transparent substrate is almost negligible with respect to the metal film in 200931977. (IA) Transparent glass 'transparent glass is cyan, white glass and bk-7. (IB) Transparent resin, transparent resin is a non-crystalline body with less light scattering. Generally transparent polymer with a fine interface inside. Light scattering also occurs, which is typically a crystalline structure. For example, water and ice are also composed of H2 。. Water is transparent, and ice is mostly opaque. This is because ice is a crystal, and light scattering occurs to reduce light transmission. It is an amorphous body and exhibits less light scattering, so it is transparent.
在工業用塑料中透明性好的透明樹脂大約有:PMMA(透 明度約93%)、PC (透明度約88%)、PS (透明度約89%)、 CR-39 (透明度約90%)、SAN樹脂(透明度約90%)、MS 樹脂(透明度約90%)、聚-4曱基戊烯-(TPX)(透明度〉 90%)。另外’像聚甲烯酸甲酯、苯乙烯共聚物(MAS)、PET、 PP以及PVC等透明度均很好。 上述這些汎用透明樹脂中,其透光性不僅是包含可見光範 圍,實際上也涵蓋波長在的近紅外範圍,也就是包含波長在 400nm〜1000nm的範圍。 可見光與紅外在透明樹脂的透明性,一般同樣是受到「光」 的反射、穿透、吸收、與散射等因素影響。 G 當光進入透明樹脂時’一部份會在表面反射而損失。反射 的例子通常是以光的折射率nl (=1)由空氣垂直射入折射率 n2的聚合物時,所算出的表面反射率R%是以(n-丨)的平方 除以(n+1)的平方表示之。由廠商的資料顯示,透明壓克力 (有機玻璃)PMMA (Polymethylmethacrylate)的折射率是 1_49,算出表面反射率R%約為4%。 PMMA的全透光率約為93%,這種光的損失大部份是表 面來回二次反射造成的,而吸收和散射等内部的損失則非常 /J、〇 當光碰到透明樹脂分子後,分子將吸收其能量而發生旋轉 9 200931977 運動,引起光吸收於是降低透光性。在光吸收的同時發生的散 射也會就大大降低透光性。由於透明樹脂内部固有的散射係與 折射率8乘方成正比,與波長4乘方成反比,因此,折射率低 的材料散射損失少,在波長較長的可見光領域,散射的影響較 小。在波長更長的紅外領域,散射的影響幾乎小到等於零。 另外’透明樹脂或一透明高分子聚合物在製造過程產生 或是參入的一些異物,也會因為散射而降低透光性。由製造薇 商資料顯示,光學級的PMMA的異物僅有一般成型用PMMA 的十分之一,異物粒徑在0·5μιη~0.07μηη時,光學級PMMA '的異物量約為600~2000個/g,一般級PMMA的異物量約為 〇 4000〜20000個/g。在實際應用上,有時因為環境的溫度和溼 度的變動,也大大影響折射率般來說,透明樹脂的折射率 愈大,則反射率會大。透明樹脂的構造不均勻,光學上引起微 觀上折射率的不均而有散射的現象,光學級的折射率則比較均 勻。這也就是本實施例建議使用光學級PMMA的原因。 目前,壓克力PMMA (聚曱基丙烯酸甲酯)在塑料中透明 度首屈一指,在洗縳板的厚度為1〇〇mm時也可完全透視物 體。它表面光澤度很好、對人體無毒性。 曰本三菱Rayon製的PMMA其資料顯示的分光光線透過 〇 率在紫外線從250nm附近上升,在可見光領域完全不吸收。 PMMA是屬於一種非結晶性塑料(Amorph〇us),高分子 鍵凌亂排列糾墟,未形成井然有序的排列結構,在凝固過程中 ,沒有晶核及晶粒生長過程,僅是自由的高分子鏈被"凍結 "(frozen)的現象。所以多具高透明外觀。非結晶性塑料聚合 體皆有良好的光透性、其材質的密度性也較低;至於,結晶形 (Crystalline)聚合體由於球晶和不定形區域的折射率不同,其 材質密度較大,光雜較差不適合本實__成像使用。 PMMA麼克力板有良好的加工性能,既可採用熱成型(包 括模壓、吹塑和真空吸塑),也可用機械加卫方式鐵、車、切 200931977 ,等。用微電腦控制的機械切刮和雕刻不僅使加工精度大提 高,而且還可製作出用傳統方式無法完成的囷案和造型。另外 還可接著與鍍膜等,適合本發明實施例的使用。 比PMMA透明度稍差一點點(透光度約88%)的聚碳酸 樹脂PC (Polycarbonate),也是本實施例應用的另一個透明 樹脂。兩者比較不同點如下: PMMA缺點:吸水率高、耐熱性稍差、較不财衝擊、較 容易起燃。PC缺點:成形性差。 因為PC的黏度較高’成形溫度也高些。但不需要特別困 難的成形技術。 © 本實施例採用的鍍膜方式是在真空蒸鍍中,透明玻璃的 耐溫約300°C,PC的耐溫約13CTC與PMMA的耐溫約70。 C中’以PMMA的冷處理較具困難(溫度太高會變形,溫度 太低則膜層附著力不好),但這對目前國内有鍍膜經驗與較佳 設備的廠商而言並無技術上的困難。 (2)多層介電質膜,本實施例所採取的多層介電質膜膜 材(Material)例如 Ti〇2、Ti2〇5、Ti3〇5、Nb2〇5、Zr〇2、Si〇2 等氧化物膜,在可見光與紅外雙波域範圍都是透明的。而這透 明區主要決定於材料的價電子能階到導電子能階的能差ΔΕ ❹ 與晶格振盪能的吸收。ΔΕ決定了透明區的短波極限(xs),Transparent resins with good transparency in industrial plastics include: PMMA (transparency about 93%), PC (transparency about 88%), PS (transparency about 89%), CR-39 (transparency about 90%), SAN resin. (Transparency about 90%), MS resin (about 90% transparency), poly-4-decylpentene-(TPX) (transparency > 90%). In addition, transparency such as methyl methacrylate, styrene copolymer (MAS), PET, PP and PVC is very good. Among these general-purpose transparent resins, the light transmittance is not only in the range of visible light but actually covers the near-infrared range of the wavelength, that is, the wavelength in the range of 400 nm to 1000 nm. The transparency of visible light and infrared light in transparent resins is generally affected by factors such as reflection, penetration, absorption, and scattering of "light." G When light enters the transparent resin, part of it will be reflected on the surface and lost. The example of reflection is usually when the refractive index n1 (=1) of the light is perpendicularly incident on the polymer having the refractive index n2, and the calculated surface reflectance R% is divided by the square of (n-丨) by (n+ 1) is expressed in squares. According to the manufacturer's data, the refractive index of transparent acrylic (PMMA) PMMA (Polymethylmethacrylate) is 1_49, and the surface reflectance R% is calculated to be about 4%. The total light transmittance of PMMA is about 93%. The loss of this light is mostly caused by the secondary reflection of the surface, and the internal loss such as absorption and scattering is very high. J, when the light hits the transparent resin molecule, The molecule will absorb its energy and rotate. 9 200931977 Movement, causing light absorption to reduce light transmission. The scattering occurring at the same time as the light absorption also greatly reduces the light transmittance. Since the scattering coefficient inherent in the transparent resin is proportional to the refractive index of 8 squares and inversely proportional to the wavelength 4, the scattering loss of the material having a low refractive index is small, and the influence of scattering is small in the visible light region having a long wavelength. In the infrared field where the wavelength is longer, the effect of scattering is almost as small as zero. In addition, some foreign matter generated or incorporated by the transparent resin or a transparent polymer during the manufacturing process may also reduce light transmittance due to scattering. According to the manufacturer's data, the optical grade PMMA foreign matter is only one tenth of the general molding PMMA. When the foreign matter particle size is 0·5μιη~0.07μηη, the optical grade PMMA' foreign matter is about 600~2000. /g, the amount of foreign matter of the general-grade PMMA is about 〜4000 to 20,000/g. In practical applications, the refractive index of the transparent resin is large as the temperature and humidity of the environment change greatly, and the refractive index is large. The structure of the transparent resin is not uniform, optically causing unevenness in the refractive index on the microscopic surface, and the refractive index of the optical grade is relatively uniform. This is why the optical grade PMMA is recommended in this embodiment. At present, acrylic PMMA (polymethyl methacrylate) is second to none in plastics, and it can also fully see through the body when the thickness of the fascia is 1 〇〇mm. It has a good surface gloss and is non-toxic to the human body. The PMMA made by Mitsubishi Rayon's data shows that the spectral light transmission rate increases in the ultraviolet light from around 250 nm and does not absorb at all in the visible light field. PMMA belongs to a kind of amorphous plastic (Amorph〇us). The polymer bonds are arranged in disorder, and there is no well-organized arrangement structure. During the solidification process, there is no crystal nucleus and grain growth process, only free high. The molecular chain is "freeze" (frozen). Therefore, it has a high transparent appearance. The amorphous plastic polymer has good light transmittance and the density of the material is also low; as for the crystalline (Crystalline) polymer, the density of the material is large due to the difference in refractive index between the spherulites and the amorphous regions. Poor light is not suitable for this __ imaging use. PMMA's acrylic sheet has good processing properties, both thermoforming (including molding, blow molding and vacuum blistering), as well as mechanical reinforcement of iron, car, and cut 200931977, and so on. Micro-computer controlled mechanical cutting and engraving not only improves the machining accuracy, but also creates cases and shapes that cannot be completed in the traditional way. Further, it may be followed by coating, etc., which is suitable for use in the embodiment of the present invention. A polycarbonate resin PC (Polycarbonate) which is slightly less transparent than PMMA (having a light transmittance of about 88%) is another transparent resin to which this embodiment is applied. The differences between the two are as follows: PMMA disadvantages: high water absorption, poor heat resistance, less impact, and easier ignition. PC disadvantage: poor formability. Because the viscosity of the PC is higher, the forming temperature is also higher. However, no particularly difficult forming techniques are required. © The coating method used in this embodiment is that in vacuum evaporation, the heat resistance of the transparent glass is about 300 ° C, and the temperature resistance of the PC is about 70 CTC and the temperature resistance of the PMMA is about 70. In C, 'the cold treatment with PMMA is more difficult (the temperature is too high to deform, the temperature is too low, the adhesion of the film is not good), but this is not technically available to the manufacturers with coating experience and better equipment in China. Difficulties. (2) Multilayer dielectric film, the multilayer dielectric film film (Material) taken in this embodiment, for example, Ti〇2, Ti2〇5, Ti3〇5, Nb2〇5, Zr〇2, Si〇2, etc. The oxide film is transparent in both the visible and infrared dual wave domains. The transparent region is mainly determined by the energy difference ΔΕ ❹ of the material from the valence electron energy level to the conductivity level and the absorption of the lattice oscillation energy. ΔΕ determines the short-wavelength limit (xs) of the transparent region,
波長小於As的光波會激發電子跳遷而被吸收(Fundamental absorption);而晶格振盪能決定了透明區的長波極限(λι_), 波長長於λ l的光波會晶格振盪而被吸收(Latt丨ve vibration absorption)。對純正的材料而言,λε很大,As落在紫外光 區,所以在可見光與紅外雙波域範圍都是透明的。膜層中發生 吸收損耗的原因除價電子能階到導電子能階的能差ΛΕ與晶 格振盪能的吸收以外,還有像雜質的存在。但是,這些「吸收」 在膜層設計與下面的實施例中對成像影響不大可忽略不計。 若無離子源助鍍(IAD)透明基板適宜者加高溫到250°C 11 200931977 〜300°c,並在抽真空後加以約15mPa之氧氣下蒸鍍,可得到 堅固透明的氧化膜。但如透明基材為PC基板或PMMA基板, 如果要得到良好的膜質一般都補以離子源助鍍。 請參閱囷一為薄膜(鍵膜膜材)反射率與光學厚度的變 化關係圊。 由光學薄膜干涉現象可知,當光垂直入射單層膜時,且 光學厚度Nd(為薄膜折射率與薄膜厚度的乘積)為(2 λ 〇/2)、 λο、(3λο/2)…膜層對波長的反光強度不變;若光學厚度Nd 為(λο/4)、(3又〇/4)、(5又〇/4)···,反射率將為極大值或 • 極小值,且其值決定於膜的折射率η是大於還是小於基板的折 讎 射率nS。當η > nS時,反射率為極大值,在n < nS時, 反射率為極小值,如圖一所示。由圖一可見,一層光學厚度為 入射光波長四分之一奇數倍,讓反射波形成破壞性干涉,即可 得反射率為0之抗反射效果。但對其他波長的反射率並非為 0,因而為了在可見光範圍可得到寬廣的反射率通常都是多層 架構’適當選擇膜層的折射率與膜層設計就可得到適當的反射 率。,囷一可見,一層光學厚度為四分之一波長,且折射率夠 低的薄膜,可作為抗反射膜,使表面反射率降低,例如在玻璃 (BK7,η =1. 53)表面鍍上單層氟化鎂(MgF2,n = l 38), ❹ 即為一,簡單架構的抗反射膜。相對的,若在玻璃表面錄上一 層折射率足夠高的材料,它將大大增加玻璃表面的反射率,因 此這種薄膜可作為一種很好的分光鏡,單層的二氧化鈦 (Ti〇2,η = 2· 2)或硫化鋅(ZnS , η = 2· 35)薄膜常作為這種 用途’反射率約可達30%左右。 基本上單層膜的疊加就是多層膜。當使用多層薄膜時,可 f依照我們的需要,運用高低折射率薄膜堆疊,做各式各樣的 薄膜設計,以產生我們所要求的光學特性。常見的如減反射 鏡、高反射鏡、截止濾光鏡、帶通濾光鏡、帶止濾光鏡還有與 本實施相對應分光鏡效果等等。而電腦的出現,不但使光學薄 12 200931977 膜設計(電腦輔助軟體)更為方便,且光學薄膜的相關研究更 是一曰千裡。至今,光學薄膜製作的困難點已經很少出現在設 計上,只要特性要求合理例如本實施例的監視用途,總是能設 計出適用的多層臈架構。 關鍵的問題在於薄膜製鍍工藝的改進,如何精確地控制每 一層的厚度和折射率,以得到期望的光學性質和機械特性,甚 至考量製作的量產化及成本的降低。另外,如薄膜材料的開 發、先進鍵膜技術的開發與薄膜的量測等,但皆非為本實施例 的範圍,不宜詳述。 Φ 有關多層介電質膜,今日在薄膜光學上,我們初始很容 易由向量法或導納軌跡法在光學級透明基板上,鍍折射率高低 交互變化的多層四分之一波膜堆,可獲得預期的穿透率τ〇/〇。 而且理論上也同時可以證明用相同多膜層數,四分之一波膜堆 比非四分之一波膜堆所得到的反射率R%要高。而膜層數越多 則反射率也越大。也就是說,吾人很容易控制穿透與反射的分 光比例。 製鍍膜材關係著製链後的成果(例如圖九說明),雖然可 查核與陳列的材質相當多’但真正可用於光學薄膜需求的卻不 多’因此我們在不同的光譜區選用不同的材料。在目前現有可 © 用的鍍膜材料中,在可見光區高折射率小於等於2.4而低折射 率大於等於1.35,所以單一的四分之一波膜堆的高反射帶的 寬度是有限的。因此,要滿足本實施例在可見光區能夠像金屬 膜一樣有較寬的反射帶’有必要將介電質膜高反射帶拓寬。拓 寬的方法其中之一,是使膜系之每層厚度有規則的遞增(可依 等比級數或等差級數),如此可使很寬的區域内的任何波長都 有足狗多的膜層’其光學厚度也比較接近四分之一波。不過如 此作成之高反射區反射率會有許多下降的波紋,必須用優化法 (Simplex method)再行優化之。其他的方法還有將一個中 心波長猶短之四分之一波膜堆疊加在另一個四分之一波膜堆 13 200931977 上。有關鍍膜的設計基本上可從標準膜系開始著手,例如高反 射鏡不管波宽大小或單或雙波數,都一律先以四分之一波膜堆 基礎來設計。當初始設計無法滿足需求的光學成效時,就利用 目前商用設計的電腦軟髏來優化或修正後再合成(如後面實施 例)。 藉由多層介電質膜的鍍膜層數與其鍍膜厚度就可控制對 入射可見光的分光比’任意控制入射可見光有多少比例在膜層 面反射或多少比例穿透膜層面。同樣,也可以藉由多層介電質 膜的鍍膜層數與其鍍膜厚度就可控制提高對紅外的高穿透。 下面對可見光的控制反射與穿透而言,說明鍍多層介電 ❿ 質膜的確比鍍金屬膜為何更具彈性與實用。 假設入射光為L,其入射光L在基板上的反射率為R%、 入射光L在基板上的穿透率為τ%、入射光l在基板上的吸收 率為A%。以數學式表示如下: L=R%+T%+A% 假設對鍍金屬膜基板而言:L%=Ri%+Ti%+Ai% 假設對本鍍膜基板而言:L=R2%+T2% 若對同一攝影機有同樣的進光量,則^0/0=12% 所以,FV/c^FV/o+A·!%。 φ 因為A!%关〇顯然,r2%>r1〇/0 這表示’同一攝影機在同一照度環境下,鍍多層介電質 膜後的反射率R2%必然可以比鍍金屬膜後的反射率Rl%大。 也就是說’鍍多層介電質膜後呈現的反射比鍍金屬膜後更像一 亮麗的鏡面。 同理,若FV^Rj% 則 Τ2〇/〇> τ!% 這又表示,鍍多層介電質膜後的反射率R2〇/。與鍍金屬膜 後的反射率R!%若一樣大,呈現一樣鏡面的反射時。則同一 攝影機在同一照度環境下,鍍多層介電質膜後的攝影機,必然 14 200931977 可以比鍍金屬膜後的攝影機取得更多的進光量(成像品質相對 更好)。 由上可知,對可見光的控制反射與穿透而言,鍍多層介電 質膜的確比鍍金屬膜更具彈性與實用。 另外,鍍多層介電質膜的膜材對紅外呈現透明,因此對 紅外的吸收而言,鍍多層介電質膜比鍍金屬膜更適合紅外夜視 的條件。 (3)監視攝影機,本實施例所述監視攝影機之「監視」 主要是指防盜反恐等安全環境上的監視。而監視攝影機之「攝 影機」指一般對波長範圍在400nm~1,000nm的可見光與紅 外均可感應的可成像單元,包含可攝錄影機、一般常見的CCD (Charge-Coupled Device)與 CMOS (Complementary Metal Oxide Semiconductor)攝影機,其中以 CCD 攝影機 在防盜保全之業界採用居多。 【實施方式】 請參閱圖二為本實施例裝置應用示意圖一。 圖二中包含有一鍍膜基材1、一不透光的殼體2、一攝影 機3、一影像顯示器4。其中殼體2的一侧放置有一鍍膜基板 1與殼體2的内部容納有一攝影機3。入射光穿透鍍膜基材1 〇 後由監視攝影機3的鏡頭31進入成像。其成像經由監視攝影 機3的影像輸出(Video out)連接到影像顯示器(Video Monitor) 4上顯示出來。圖二中也包含有便利說明的代表性 的光線,例如 LI、Lla、Lib、與 L2、L2a、L2b、L2c。 入射光LI (100%)入射到鍵膜基材1正表面時,假如反 射光Lla佔60%與透射光Lib佔40%。 其中60%的反射光Lla在鍍膜基材1正表面呈現亮麗的 反射鏡面(乍看像一面鏡子)。 其中40%的透射光Lib進入攝影鏡頭31成像。 另一入射光L2 (100% )入射到鍍膜基材1正表面時,其 200931977 穿透鍍膜基材1的透射光L2a(透射光Lib相同)約佔40%。 但透射光L2a並無直接進入攝影鏡頭31成像而是在殼體2内 反射形成另一反射光L2b。 反射光L2b反射到鍍膜基材1背表面時會再產生再一的 反射光L2c (約佔L2b的60%) ’這反射光L2c有機會再度反 射進入攝影鏡頭31成像,反射光L2c與透射光Lib —起進入 攝影鏡頭31造成重疊的影像,俗稱鬼影而影響成像的品質。 反射光L2b反射到链膜基材1背表面時約有60%的反 射,則反射光L2c的光能約佔入射光L2的光能約24% (100%*40%*60% )。 若在照度約為200Lux的環境下,入射光L2約為 200Lux ’ 則透射光 L2a 約 80Lux (200Lux*40%) ’ 透射光 L2a 入射到殼體2的内表面’若暫時不計算般體2的内表面的光能 耗損(例如在殼體2内表面的吸收與散射)下,這時反射光 L2b則與透射光L2a同為80Lux。而反射光L2b在鍍膜基材1 背表面形成的反射光L2c約有48 Lux (80Lux*6O%)。 這個約有48 Lux的反射光L2c與約有80Lux的透射光 Lib兩者一起進入攝影鏡頭31後,在影像顯示器4上顯示出 混在一起造成的重疊影像。Light waves with a wavelength less than As will induce electron diffusion and absorb (Fundamental absorption); while lattice oscillation can determine the long-wavelength limit (λι_) of the transparent region, and light waves with a wavelength longer than λ l will be lattice-oscillated and absorbed (Latt丨Ve vibration absorption). For pure materials, λε is large, and As falls in the ultraviolet region, so it is transparent in both the visible and infrared dual-wave domains. The reason for the absorption loss in the film layer is the presence of impurities like the energy difference from the valence electron energy level to the conductivity level and the absorption of the crystal oscillation energy. However, these "absorption" effects on the imaging in the film design and in the following examples are not negligible. If the ion-free source-assisted (IAD) transparent substrate is suitable, the temperature is increased to 250 ° C 11 200931977 ~ 300 ° C, and after vacuuming, a vacuum of about 15 mPa is used to obtain a strong transparent oxide film. However, if the transparent substrate is a PC substrate or a PMMA substrate, ion source plating is generally applied if a good film quality is to be obtained. Please refer to the variation of the reflectance and optical thickness of the film (bond film). It can be seen from the optical film interference phenomenon that when the light is perpendicularly incident on the single layer film, and the optical thickness Nd (which is the product of the film refractive index and the film thickness) is (2 λ 〇/2), λο, (3λο/2)... The reflection intensity of the wavelength is constant; if the optical thickness Nd is (λο/4), (3 〇/4), (5 〇/4)···, the reflectance will be a maximum value or a minimum value, and The value depends on whether the refractive index η of the film is greater than or less than the refractive index nS of the substrate. When η > nS, the reflectance is a maximum value, and at n < nS, the reflectance is a minimum value, as shown in Fig. 1. As can be seen from Fig. 1, the optical thickness of one layer is an odd multiple of a quarter of the wavelength of the incident light, so that the reflected wave forms destructive interference, and the antireflection effect with a reflectance of 0 can be obtained. However, the reflectance for other wavelengths is not zero, so in order to obtain a wide reflectance in the visible light range, it is usually a multilayer structure. The refractive index of the film layer and the film layer design can be appropriately selected to obtain an appropriate reflectance. As can be seen, a film with a thickness of one quarter wavelength and a low refractive index can be used as an anti-reflection film to reduce the surface reflectance, for example, on the surface of glass (BK7, η = 1.53). A single layer of magnesium fluoride (MgF2, n = l 38), ❹ is a simple structure of anti-reflection film. In contrast, if a material with a sufficiently high refractive index is recorded on the surface of the glass, it will greatly increase the reflectivity of the glass surface, so the film can be used as a good beam splitter, a single layer of titanium dioxide (Ti〇2, η = 2· 2) or zinc sulfide (ZnS, η = 2·35) films are often used for this purpose 'reflectivity of about 30%. Substantially the superposition of a single layer of film is a multilayer film. When using multilayer films, we can use a combination of high and low refractive index films to create a wide range of film designs to produce the optical properties we require. Common such as anti-reflection mirrors, high-reflecting mirrors, cut-off filters, band-pass filters, band-stop filters, and spectroscopic effects corresponding to this embodiment. The emergence of the computer not only makes the optical film 12 200931977 film design (computer-aided software) more convenient, but also the related research of optical film is a thousand miles. To date, difficulties in the fabrication of optical films have seldom appeared in design, and as long as the characteristics are required to be reasonable, such as the monitoring use of the present embodiment, a suitable multilayer structure can always be designed. The key issue is the improvement in the thin film plating process, how to precisely control the thickness and refractive index of each layer to achieve the desired optical and mechanical properties, even the mass production and cost reduction of the fabrication. In addition, development of thin film materials, development of advanced key film technology, measurement of thin films, and the like are not intended to be in the scope of the present embodiment, and should not be described in detail. Φ With regard to multilayer dielectric film, today in film optics, we initially can easily plate multi-layer quarter-wave film stacks with high refractive index and cross-change on optical-grade transparent substrates by vector method or admittance trajectory method. The expected penetration rate τ〇/〇 is obtained. In theory, it is also proved that with the same multi-layer number, the quarter-wave film stack has a higher reflectance R% than the non-quarter-wave film stack. The more the number of layers, the greater the reflectivity. In other words, it is easy for us to control the split ratio of penetration and reflection. The coating material is related to the results of the chain (for example, as shown in Figure IX). Although there are quite a few materials that can be checked and displayed, 'there is not much demand for optical film.' So we use different materials in different spectral regions. . In the currently available coating materials, the high refractive index in the visible light region is 2.4 or less and the low refractive index is 1.35 or more, so the width of the high reflection band of the single quarter-wave film stack is limited. Therefore, in order to satisfy the present embodiment, it is possible to have a wide reflection band like a metal film in the visible light region. It is necessary to widen the high reflection band of the dielectric film. One of the methods of broadening is to increase the thickness of each layer of the film system regularly (depending on the number of steps or the number of steps), so that any wavelength in a wide area can have more than one dog. The film layer's optical thickness is also close to a quarter wave. However, the reflectivity of the highly reflective region thus produced has many reduced ripples which must be optimized by the Simplex method. Other methods include adding a quarter-wave film stack with a short center wavelength to another quarter-wave film stack 13 200931977. The design of the coating can basically be started from the standard film system. For example, the high-reflection mirror is designed with a quarter-wave film stack foundation regardless of the width or the single or double wave number. When the initial design fails to meet the optical performance of the demand, it is optimized or modified and then synthesized using the computer software designed for commercial use (as in the following examples). By controlling the number of coating layers of the multilayer dielectric film and the thickness of the coating film, it is possible to control the spectral ratio of incident visible light to arbitrarily control the ratio of incident visible light to the surface of the film or to the extent of the film. Similarly, it is also possible to control the high penetration into the infrared by the number of coating layers of the multilayer dielectric film and the thickness of the coating. In the following, the control reflection and penetration of visible light show that the multi-layer dielectric film is indeed more flexible and practical than the metallized film. Assuming that the incident light is L, the reflectance of the incident light L on the substrate is R%, the transmittance of the incident light L on the substrate is τ%, and the absorption of the incident light l on the substrate is A%. It is expressed as follows: L = R% + T% + A% Assume for the metallized film substrate: L% = Ri% + Ti% + Ai% Assume for the coated substrate: L = R2% + T2% If the same camera has the same amount of light, ^0/0=12%, so FV/c^FV/o+A·!%. φ Because A!% is obvious, r2%>r1〇/0 This means that the same camera can reflect the reflectivity R2% after plating a multilayer dielectric film in the same illuminance environment. Rl% is big. That is to say, the reflection after the plating of the multilayer dielectric film is more like a bright mirror after the metal plating film. Similarly, if FV^Rj% is Τ2〇/〇> τ!%, this means that the reflectivity after plating a multilayer dielectric film is R2〇/. When the reflectance R!% after plating with a metal film is as large as the mirror-like reflection. Then, in the same illuminance environment, the same camera is coated with a multi-layer dielectric film, and it is inevitable that 14 200931977 can obtain more light input than the metal-coated film camera (the image quality is relatively better). It can be seen from the above that in the control of reflection and penetration of visible light, the multi-layer dielectric film is indeed more flexible and practical than the metallized film. In addition, the film coated with the multilayer dielectric film is transparent to the infrared, so that for the absorption of infrared light, the plated dielectric film is more suitable for infrared night vision than the metal plated film. (3) Surveillance camera, the "monitoring" of the surveillance camera described in this embodiment mainly refers to monitoring in a security environment such as anti-theft and anti-terrorism. The "camera" of the surveillance camera refers to an imageable unit that can be sensed by visible light and infrared in the wavelength range of 400 nm to 1,000 nm, including a video recorder, a common CCD (Charge-Coupled Device) and a CMOS (Complementary). Metal Oxide Semiconductor), in which the CCD camera is used in the industry of anti-theft security. [Embodiment] Please refer to FIG. 2, which is a schematic diagram of the application of the device in this embodiment. Figure 2 includes a coated substrate 1, an opaque housing 2, a camera 3, and an image display 4. A coated substrate 1 is placed on one side of the casing 2, and a camera 3 is housed inside the casing 2. The incident light penetrates the coated substrate 1 and is then imaged by the lens 31 of the surveillance camera 3. The image is displayed by being connected to the video monitor 4 via the video out of the monitor camera 3. Also shown in Fig. 2 are representative light rays, such as LI, Lla, Lib, and L2, L2a, L2b, and L2c. When the incident light LI (100%) is incident on the front surface of the key film substrate 1, it is assumed that the reflected light Lla accounts for 60% and the transmitted light Lib accounts for 40%. Among them, 60% of the reflected light Lla presents a bright mirror surface on the front surface of the coated substrate 1 (see a mirror). Among them, 40% of the transmitted light Lib enters the photographic lens 31 for imaging. When another incident light L2 (100%) is incident on the front surface of the coated substrate 1, its transmitted light L2a (the same transmitted light Lib) penetrating through the coated substrate 1 in 200931977 accounts for about 40%. However, the transmitted light L2a does not directly enter the photographic lens 31 but is reflected in the casing 2 to form another reflected light L2b. When the reflected light L2b is reflected to the back surface of the coated substrate 1, another reflected light L2c (about 60% of L2b) is generated. 'This reflected light L2c has a chance to be reflected again into the photographic lens 31 for imaging, reflected light L2c and transmitted light. Lib, as it enters the photographic lens 31, causes overlapping images, commonly known as ghosts, which affect the quality of the image. When the reflected light L2b reflects about 60% of the reflection on the back surface of the chain substrate 1, the light energy of the reflected light L2c accounts for about 24% (100% * 40% * 60%) of the light energy of the incident light L2. If the incident light L2 is about 200 Lux' in an environment with an illuminance of about 200 Lux, the transmitted light L2a is about 80 Lux (200 Lux*40%) 'the transmitted light L2a is incident on the inner surface of the casing 2'. The light energy loss of the inner surface (for example, absorption and scattering on the inner surface of the casing 2), at this time, the reflected light L2b is 80 Lux as the transmitted light L2a. On the other hand, the reflected light L2b of the reflected light L2b formed on the back surface of the coated substrate 1 is about 48 Lux (80 Lux*6O%). When the reflected light L2c of about 48 Lux enters the photographic lens 31 together with the transmitted light Lib of about 80 Lux, the superimposed image caused by the mixing is displayed on the image display 4.
為了阻止反射光L2c進入攝影鏡頭31有四個方法: 第一,在攝影鏡頭31外圍套入一不透光的黑色軟套32, 把反射光L2c擋住不要進入攝影鏡頭31内。這黑色軟套昶必 須與鍍膜基材1背表面緊緊貼近不要有透光的間隙,非直接由 攝影鏡頭31前所進入的雜光,通通被黑色軟套32擋住。這黑 色軟套32最好用黑色或深色,如用白色則會造成白色的反射 光讓人眼從鍍膜基材1看到内部白色軟套的影像。 關=一個方法,若套用在目前市場流行的高速球攝影 ,(Highspeed Dome Camera),則有一定程度的困難。因 為’這類兩速球攝賴的鏡頭31 t要作高速度旋轉,其鏡頭 16 200931977 31上的黑色軟套32會被碰擊造成鍍膜基材1背表面而損壞。 因此,黑色軟套32僅適用於固定式的鏡頭31而不適用 於可自動旋轉式的鏡頭31。 第二,在殼體2的内部表面21形成有黑色或深色的粗糙 表面。目的是吸收與散射掉透射光L2a,使L2b光能大大受損 而不易形成。也就是說,間接使L2C不容易(或無法)形成, 這就沒有反射光L2c進入攝影鏡頭31内的問題發生》 關於第二個方法,若鍍膜基材1不是平板狀,而是像本 人的新型專利證號M326646「鍍鋁半球型罩攝影裝置」呈現 半球狀,則入射光L2透射到半球狀的鍍膜基材i内時,可能 又從鍍膜基材1的另一側再透射出去,入射光L2根本沒有透 射進入到殼體2的内部表面21。這時如果有人從L2入射方向 看去,就容易看到鍍膜基材1後的的攝影機3 了。 因此,僅在殼體2的内部表面21形成有黑色或深色的粗 糙表面用以吸收與散射掉L2a,適用於平板狀的鍍膜基材1而 不適用於曲率過大的鍍膜基材1。 第三’在銀膜基材1前加鍵上一約3nm厚的金屬Cr膜 層,用「吸收」方式來降低L2c的光能。 關於第三個方法,鍵上一金屬Cr膜層多少會在鍵膜基材 〇 1上吸收一些入射的光能,使入射可見光的反射率與穿透率均 受下降的影響。其影響嚴重者會如同鍍金屬膜一樣,應注意 Cr膜層的厚度控制。 第四’在鍵膜基材1前形成一像是抗眩AG(Anti-Glare) 膜層’把L2c的光能散射掉。使L2c的光能衰減到即使有進入 攝影鏡頭也無法成像。 關於第四個方法,為了避免AG膜層對透射光Lib的散 射而影響成像,有必要在AG膜層的一部份(例如AG膜層的 中央部份)挖一圓孔(配合圓形的攝影鏡頭31)形成一窗口, 讓透射光Lib可直接由此圓形窗口進入攝影鏡頭31成像。 17 200931977 由於各個使用環境與使用條件不同,必要時將四個方法 分別使用或交差合併使用,則可在應用上可發揮更不錯的效果。 請參閱圖三為本實施例裝置應用示意圖二。 圖三所示與圖二不同處在於;在圊三中移除了圖二的殻 體2 » 如圖三所示,入射光L2入射到鍍膜基材1後的透射光L2a 並無觸及任何物體(例如殼體2)時,L2a就繼續直線往前走 直到光能耗盡,因此就不會有產生像圖二中反射光L2b的問 題。 這時若人眼從L2的方向看鍍膜基材1,會發現鍍膜基材 β 1呈現透明狀態(其透明度如透射光Lib的40%),人眼容易 看到鍍膜基材1背後的物體,尤其是在鍍膜基材1背後的光照 度大於鍍膜基材1前面(與人眼同側)的光照度時,更是明顯。 當鍍膜基材1的背景環境是深色(例如深藍)或黑色時 (例如在殼體2内),在一般環境下(例如約200Lux的照度環 境)對人眼從鍍膜基材1的正面觀察,因為有60%的反射光所 以看起來像一面鏡面。而其中40%的透射光進入鍍膜基材1 後’被深色或黑色的背景所「吸收」與「散射」後的光能,所 剩無幾,加上被強勢的60%反射光所蓋過。人眼從鍍膜基材1 ❹ 的正面觀察’幾乎都是這60%的反射光所呈現的鏡面影像。 通常具有50%以上的反射光時就可顯示出鏡面反射的效 果。當然70%、或80%以上的反射光又更像一面鏡子。如果 鍍膜基材1沒有背景環境如圖三所示,链膜基材i的鏡面反射 則不明顯。人眼從鍵膜基材1的正面觀察,大部份會看到像 Lla鏡面反射的影像與透射光L2a所看到的影像等兩種影像的 重4影像。 實際上’圖三所示’僅是鍍膜基材1量產完成時的測試工 作之一。主要測試鍵膜基材1背表面的成像效果。這工作是將 攝影機3的鏡頭31對準鍍膜基材1背表面,再將影像顯示器 200931977 4連接起來,測試透射光L1b對攝影機3的成像效果。例如在 量產完成的鍍膜基材1上,抽檢是否有鍍膜基材1表面刮傷或 鍍膜層膜厚不均等造成的成像效果。 事實上’在影像顯示器4顯示的成像效果,如果在一定的 環境照度下,其成像效果主要取決於(一)透射光L1b的光 能大小、以及(二)攝影機3影像感測器(Image Sensor) 的品質。 對於(一)透射光L1b的光能比(佔入射光L1的百分比) 越大則在影像顯示器4顯示的成像效果越好。 但是’透射光L1b的光能比越大,相對的反射光Lla就越 ® 小。反射光Lla越小就越顯不出亮麗的反射鏡面,沒有了亮麗 的反射鏡面’就不容易隱藏裝飾鍍膜基材1背後的物體(例如 攝影機3),這也就失去本實施例要達成隱藏裝飾成像的目的。 由圖二實際應用上透射光L1 b的光能比在1 〇%〜45%是較適用 的選擇範圍。 至於(二)主要是指攝影機3的影像感測器的感應度品 質。國内外市場上常用的有許多種款式,包含有日本sony、 SharP與韓國三星等廠牌,都有生產不同高階(High end)、中 階(Mid-end)、低階(Lowend)的各型號產品。如圊三本實施 ❹ 例的攝影機3就測試了十餘型號的CCD與CMOS。在不同照 度環境也取得不同的成像效果。如果為了節省購買高階攝影機 的錢’取代購買低階的攝影機時,選擇鍍膜基材透射光Ub 的進光量大一點的,或者再適當的搭配輔助光源也是一個替代 採用高階攝影機的方案。 如圓三是鍍膜基材1完成時的測試工作,也就是說鍍膜 基材1量產時,可單獨出售測試OK的鍍膜基材1給攝影機廠 商’以便攝影機廠商將不同的攝影機3與不同形式的殼體2可 以組裝成可直接讓消費者應用的產品。 在囷三中,如果把鍍膜基材1披覆一不透光層,此披覆 19 200931977 的不透光層不包含攝影機3鏡頭31的窗口。也就是說,此披 覆的不透光層的區域中,有一部份不披覆。此不彼覆的區域就 作為攝影機3鏡頭31的窗口。 則入射光L1經由此不彼覆的區域(攝影機3鏡頭31的 窗口)進入攝影機3成像。而像入射光L2則不能穿透此披覆 的不透光區域。如此,則披覆有不透光層區域的鍍膜基材1, 也可與攝影機3組合成一個產品。 例如把此披覆有不透光層區域的鍍膜基材1,與攝影機3 組合成一個「隱藏式門口安全監視器」的一個產品應用。 此產品應用,是在一扇門上挖一空洞用以置入攝影機3, © 然後將此披覆有不透光層區域的鍍膜基材1的背部,黏貼在門 面上。並事先在未披覆有不透光層區域的鍍膜基材1上,黏貼 或喷塗彩色的數字圖案與姓名文字。注意此黏貼或喷塗的區域 不要擋住攝影機3鏡頭31的窗口,以免擋住進入攝影機3鏡 頭31的光。完成後僅在門面上看到一個裝飾的門牌(鍍膜基 材1)。當有訪客按鈴時,攝影機3鏡頭31可攝取訪客的影像 以供監視或錄影。 此產品應用中,上述的門面在黏貼有鍍膜基材1的範圍 内,若剛好是有不透光門面區域時,則錄膜基材1不一定要披 φ 覆有不透光層的區域。 以此類推,由圖二、囷三可知,將鍍膜基材丨與攝影機3 的組合確有許多應用空間。 請參閱圖四為本實施例裝置應用示意囷三。 如圖四所示是另一個應用裝置。圖四所示與圓二、圖三 主要不同處在於;在囷四中增加了 一輔助攝影機3的紅外光源 5,以及便利說明紅外光源5的L3、L3a、L3b與L3c。 事實上,囷四所示之與近年國際安全器材展上常出現有 日夜型的防盜監視攝影機(俗稱Day & Night CCD ),除了鍵 膜基材1取代了其透明玻璃以外,大致相同。此類型攝影機的 20 200931977 的設計大都以把夜視用的輔助紅外光源5與攝影機鏡頭31組 合在一起後,再置入同一鋁製的殼體2内,用以施工方便。白 天(環境光能充足)利用可見光攝影,夜間(環境光能不足) 利用輔助紅外光源攝影。 對於夜視輔助光源5,常用的有稱為IR-LED的紅外發光 二極體,是市場上最廉價與方便的夜視輔助光源。其中心波長 常用的是850nm,單顆功率約為l〇〇mW,產品製造廠商在曰 夜型防盜攝影機成品中,常以12、24、36顆甚至有一百多棵 的IR-LED圍繞在一電路板的四周,而電路板的中央留有一圓 形空洞是直接套在攝影機鏡頭31周圍上。如此,可保證紅外 Ο 幅射方向與攝影機鏡頭31攝取影像的方向是一致的。 本實施例在囷四中所增加的一紅外光源5,同目前市售的 小型的防盜監視的攝影裝置(台灣與中國大陸俗稱槍機)一 樣’也是將紅外光源5與攝影機鏡頭31組合在一起後,再置 入同一殼體2内。 近年來新出產的搶機’大都採用了單或雙層透明玻璃的防 護罩,圖四是以一片鍍膜基材1取代其單層式或雙層式的透明 玻璃。 IR_LED光源所幅射的光其中心波長為85〇nm的紅外範 圍,是人眼可辨識的範圍内’所以人眼常看到紅色光點(Red glow)業界稱為「紅爆」,是夜間暴露出搶機攝影位置的主要 原因。 如圖四所示,本實施例也改採用一中心波長為92〇nm 〜940nm的紅外光源5,它所幅射的光是以中心波長為92〇nm 或是940nm的紅外範圍,是人眼不可辨識的範圍内,所以人 眼看不到「紅爆」。 一般日夜型攝影機在紅外部份幾乎都是内置有以中心波 長為850nm可通過的濾光片,則以中心波長為92〇nm ~940nm的紅外光源5所幅射的紅外能量通過此遽光片時,將 21 200931977 衰減到約三分之一左右。本實施例對此衰減的紅外能量,採取 兩個彌補的方法:一是將以中心波長為850nm可通過的濾光 片改為以中心波長為920nm〜940nm可通過的濾光片。二是 增加IR-LED以中心波長為920nm〜940nm的相對數量,用 以增加紅外光源5所幅射的紅外能量。 如圏四所示,新增的紅外光源5在殼體2内所幅射的紅外 線為紅外L3 (其紅外幅射能量假設為100。/。),紅外L3入射到 鍍膜基材1時’如果紅外L3入射到链膜基材1的穿透率與可 見光L1 一樣僅約有40%。那麼,紅外透射光L3b所幅射的光 能僅剩四成》 备紅外透射光L3b穿透鍵膜基材1出去入射到物艘A,物 艘A吸收後再放射出去穿透鍍膜基材1後成為透射光L3c,再 進入攝影機鏡頭31成像(紅外影像)。這進入攝影機鏡頭31 的透射光L3c在來回進出鍍膜基材1後,紅外光源5在殼體2 内所幅射的紅外L3c僅剩不到兩成(40%*40%),在市場應用 上顯然不實用。 因此’本發明的實施例務必將紅外透射光L3b在鍍膜基材 1的穿透率提高到約有90%~96%,才容易被市場接受。這也 是本發明以鍍多層介電質膜取代鍍金屬膜的用意之一。 © 目前’市售日夜型防盜監視攝影機所内置的IR-LED,大 都是透過一層透明玻璃的保護罩幅射出去,與再穿透回來進入 攝影機鏡頭成像。透明玻璃的反射率4%,來回使IR-LED所幅 射的紅外光能損失了 8%。如鍍膜基材1的穿透率提高到96%, 對丨R-LED所幅射的紅外光能也是損失了 8%。如果鍍膜基材1 的穿透率為96%的話(詳見圖十二),至少,鍍膜基材1對 IR-LED所幅射的紅外光能損失不比透明玻璃對丨R-LED所幅 射的紅外光能損失多。在此情形下,鍍膜基材1相對於透明玻 璃不但無紅外光能的耗損,而且更具隱藏裝飾效果。 如囷四’紅外反射光L3a若沒有黑色軟套32的阻擋,則 22 200931977 可能會進入攝影機鏡頭31成像,在影像顯示器4上顯示出白 色曝光區塊的影像,這白色曝光區塊是紅外光源5輻射紅外的 區塊影像。例如若僅有一顆圓形狀10mm直徑寬的紅外發光 二極體(丨R-LED)時,這白色曝光區塊就是一圓形點狀的白 色曝光區塊。 若有一物艘A在鍵膜基材1前,在可見光L1的入射下, 其透射光Lib進入攝影機鏡頭31成像,最後在影像顯示器4 上顯示出物體A的可見光影像。若攝影機3為彩色攝影機時則 這可見光影像為彩色的影像。若攝影機3為黑白攝影機時則這 可見光影像為黑白的影像。 ® 若有一物體A在鍵膜基材1前,在紅外光源5發光時,其 穿透鍍膜基材1的透射紅外L3c進入攝影機鏡頭31成像,最 後在影像顯示器4上顯示出物體A的紅外影像。這紅外影像是 單色的影像’對人眼而言與黑白的影像很相似但不完全相同。 若有一物體A在鍍膜基材1前,當有可見光L1的入射與 紅外光源5啟動幅射時,則在影像顯示器4上顯示出物體A的 可見光影像與紅外影像的重疊影像。 這時若可見光影像大於紅外影像,則可見光影像「蓋過」 紅外影像,使影像顯示器4上顯示出物體A的可見光影像。 〇 這時若可見光影像小於紅外影像,則紅外影像「蓋過」可 見光影像’使影像顯示器4上顯示出物鱧A的紅外影像。 這時若可見光影像接近或等於紅外影像,則可見光影像以 及紅外影像兩者同時存在,使影像顯示器4上顯示出物體A的 可見光影像,但帶有類似過度曝光的區塊,這可見光影像以及 紅外影像兩者同時存的重疊,將造成觀察者所稱成像品質的 「不良」。 市售的日夜型攝影機,為了避免造成在影像顯示器4上顯 示出物體A的可見光中,帶有類似過度曝光的區塊的紅外影 像,通常都是以透明玻璃罩内的一光敏電阻(CDS)元件做為 23 200931977 摘測與控制。當環境照度不足(例如剩餘約lOLux)時,因 CDS元件啟動的控制電路,打開紅外光源5的電源而發出紅 外L3,這時應是紅外影像大於可見光影像,使影像顯示器4 上顯示出物體A的紅外影像。囷四省略CDS元件乃因CDS 是市售日夜型監視攝影機常用的習知元件,所以不在圖中繪 出,以免圖四的繪製複雜。唯一要注意的是;在圖四中CDS 元件接受入射可見光的方向,不要經過鍍膜基材丨(例如安置 在殼體2上的一處),因為鍍膜基材1對可見光的穿透率只有 40% (如果鍍膜基材1的穿透率為4〇%),與常用cDS元件 的安置於透明玻璃内(幾乎接受入射可見光的92〇/〇)不同。 ’如果一定要安置於經過鍍膜基材1的位置時,則必須調整CDS 元件的靈敏度。也就是說,若安置於透明玻璃内CDS元件調 整在10Lux時啟動’則安置於鍍膜基材1後的CDS元件調整 在20〜30Lux之間。 目前高階產品都在攝影機3的鏡頭31後面與影像感測器 前面’兩者之間的空間上加設有一自動雙濾光片切換裝置。 目前市場上的自動雙濾光片切換裝置,簡單說就是自動切 換紅外截止遽光片ICF (Infrared cut filtter)與普通透明玻璃 渡光片等兩個濾光片的裝置。紅外截止濾光片切入到影像感測 〇 器前時,阻擋了紅外的進入,其影像感測器僅感測到可見光, 在影像顯示器4上可着到不含紅外的真實色彩(True Color )。 紅外截止濾光片移除離開影像感測器前時,因其普通透明玻璃 遽光片所切入的關係,其影像感測器則可感測到可見光與紅外 兩者的入射光。因此,可攝取到可見光與紅外的影像,這時也 有機會造成可見光與紅外的重疊影像。 本實施例再依圖四所示的攝影機3,移除並置換為一具有 雙濾光片可切換的一種攝影機,並且把此雙濾光片中的普通透 明玻璃濾光片移除後,再置入一紅外通過濾光片。使得囷四所 示的攝影機3具有紅外截止濾光片ICF (Infrared Cut flitter) 24 200931977 與紅外通過濾光片丨PF (丨nfrared Pass flitter)等雙濾光片可 切換的一種攝影機3。 ^此一來’當切入紅外通過濾光片時’影像顯示器4上僅 會顯示紅外影像而看不到可見光與紅外的重疊影像。 對於圖四中,如果鍍膜基板1對可見光]^的穿透率平均 在40%時(如下面的囷五所示),則人眼面對鍍膜基板1傾斜 某一角度看鍍膜基板1,這時常會看到紅外光源5的丨r_led, 目前常用的IR_LED大部份是以透明樹脂封裝,在鍍膜基板工 透過的入射光中常會在透明樹脂上造成一部份反光,讓有心人 士在近端觀察時會看到紅外光源5的「存在」。 ® 請參閱囷四A為紅外黑色遮罩示意圖。 囷四A中增加了包含有一黑色遮罩片51,遮罩在|R_led 上、與一代表人眼目光的L4。 L4在鍍膜基板1表面產生的反射光L4a,讓人眼正面看 鍍膜基板1表面時,會看到人眼自己反射的影像。當人眼斜視 鍍膜^板1時,會因為有4〇〇/0透射光L4a而看到丨R-LED透 明樹脂封裝表φ上的反光,知道紅外絲5的存在。 為了避免人眼斜視鍍膜基板i時,看到|R_LED透明樹脂 封裝表面上的反光,因此在圖中增加了一片黑色遮軍片51覆 〇 蓋在丨R-LED透明樹脂封裝表面上方。 黑色遮罩片51是將藍色與紅色兩種透明色料混合後,再 與透明樹脂混合後射出成型的,黑色遮罩片51不可有粗糙的 ,面否則造成紅外光的散射。黑色遮罩片51可以截止可見 光、而且可讓紅外光源5幅射的紅外L3,可以穿透黑色遮軍 片51。此黑色遮罩片51中央留有一空心孔用以可套入攝影機 鏡頭幻’而空心孔的周圍則遮罩在紅外光源5上方。使人眼 入射光L4在鍍膜基板1表面產生的透射光L4b,被黑色遮罩 片51吸收而擋住。這樣人眼目光的L4就看不到紅外光源5上 的IR_LED與其反光。 25 200931977 有關黑色遮罩片51製造方法與應用,本人在世界知 權組織國際局按照專利合作條約PCT,所公開的國際公告 2008Α)06260Α1「一種可透紅外黑色塑料製品的製造方 已有揭露,現僅就部份有關内容簡單說明如圖四Β。」 請參閱圖四Β為三原色光與三色料關係示意圓。 圖四中,其中三個大圓圖分別為青色(c)Cyan、洋紅(μ) Magenta、與黃色(Y) YeiiQW。三個小橢圓形 (B)、紅 〇〇、與綠色(G)e 把青色(C)、洋紅(Μ)、與黃色(γ)等三原色依相同比 例成份混合可組成-黑色色體(如中央所示隨_。 ⑻、紅⑻、與綠色⑹等三原色依相同 份混合也可組成一黑色色體(如中央所示的Black)。 再如果把藍色(B)、紅(R)、與綠色(G)等= 相同比例成份混合也可組成一黑色色體。例如/將一/色 料巧色(B)料兩色料相混合也可以得到黑色(Mack),洋 紅色(M)料與綠色(g)料相混合也可以得到黑 青色(C)料與紅色(R)料相混合也可以得到黑^色(酊^^)。 度,=^K===Blaek)雖枝妓—樣的黑 在印刷工業上把青色(C)、洋紅(M)、與黃色 原色依相同比例成份混合可組成黑色,但這並非純正的黑色。 料。兩種或三種色料混合可得黑色或類似黑的色 (囷四B的Black)係吸收了三原色光所致。 舰片51之包含一種「透明」色料混合在「透明」 樹透明」的透明主要是要讓紅外可以通過。 目F砉51之可以截止可見光U的透射光L4b,讓人 f 到黑色遮軍片51後面的物鱧(例如IR.LED)。其可讓 並不通過’主要是因為上述的透明色料 、 、’卜光L3,若「透明」色料改用「不透明」色料, 26 200931977 則紅外光L3也無法通過。 如果鍍膜基板1對可見光L1的穿透率平均在2〇%時(如 圖十三所示的樣品C),則人眼面對鍍膜基板1時,不論正面 看或是斜視都不容易看穿鍍膜基板〖。或者將中心波長為 850nm的IR-LED (透明無色樹脂封裝)改為中心波長為 940nm的丨R-LED (深藍色樹脂封裝)的,這時可以就不需要 黑色遮罩片51 了。 對於上述實施例裝置的鍍膜基板t,其製備方法包含以下 步驟: (Ο在電腦上模擬設計; (b) 提供一清潔的透明基板與選用膜材; (c) 將(b)的透明基板與膜材置入鍍膜機鍍製; (d) 鍍製膜厚監控與修正; (e) 取出後以光譜儀測試並繪出樣品完成的光譜圖與原 先(a)在電腦上模擬設計的光譜圖比較。 步驟說明: U)在電腦上模擬設計: 首先,依據下列的兩個需求: (一) 在可見光(400nm〜700nm)部份的穿透率T%,平 均控制在40%。 (二) 在紅外(780nm〜1,000nm)部份的穿透率T%,平 均控制在90%以上。 在電腦上模擬設計並繪出設計的光譜囷。 請參閱囷五為樣品A的電腦上模擬設計光譜圖。 囷五中縱座標為穿透率百分比T% (Transmittance %)。 橫座標為光譜波長(單位nm)。其他參數為(1)白光環境、(2) 正面入射角(0度)、(3)參考波長為450nm。 (b)提供一清潔的透明基板與選用膜材··In order to prevent the reflected light L2c from entering the photographic lens 31, there are four methods: First, an opaque black soft cover 32 is placed around the photographic lens 31 to block the reflected light L2c from entering the photographic lens 31. The black soft quilt must be close to the back surface of the coated substrate 1 without a light-transmissive gap, and the stray light that is not directly entered by the photographic lens 31 is blocked by the black soft cover 32. The black soft cover 32 is preferably black or dark. If it is white, it will cause white reflections to make the image of the inner white soft cover visible from the coated substrate 1. Off = One method, if applied to the high speed dome camera currently in the market, (Highspeed Dome Camera), there is a certain degree of difficulty. Because the lens of the two-speed ball is rotated at a high speed, the black soft cover 32 on the lens 16 200931977 31 will be damaged by the impact on the back surface of the coated substrate 1. Therefore, the black soft cover 32 is only suitable for the fixed lens 31 and is not suitable for the auto-rotating lens 31. Second, a black or dark rough surface is formed on the inner surface 21 of the casing 2. The purpose is to absorb and scatter the transmitted light L2a, so that the L2b light energy is greatly damaged and is not easily formed. That is to say, indirectly, L2C is not easily formed (or cannot be formed), and there is no problem that the reflected light L2c enters the photographic lens 31. Regarding the second method, if the coated substrate 1 is not a flat plate, it is like my own The new patent number M326646 "aluminum-coated hemispherical cover photographic device" is hemispherical, and when the incident light L2 is transmitted into the hemispherical coated substrate i, it may be transmitted again from the other side of the coated substrate 1 and incident. The light L2 is not transmitted at all into the inner surface 21 of the casing 2. At this time, if someone looks at the incident direction of L2, it is easy to see the camera 3 behind the coated substrate 1. Therefore, only a black or dark rough surface is formed on the inner surface 21 of the casing 2 for absorbing and scattering L2a, which is suitable for the flat coated substrate 1 and is not suitable for the coated substrate 1 having an excessive curvature. Third, a metal Cr film layer of about 3 nm thick is applied to the silver film substrate 1 to reduce the light energy of L2c by "absorption". Regarding the third method, a metal Cr film layer on the bond absorbs some incident light energy on the key film substrate 〇 1, so that the reflectance and the transmittance of the incident visible light are both affected. Seriously affected, like the metallized film, attention should be paid to the thickness control of the Cr film. The fourth 'formation of an anti-glare AG (anti-Glare) film layer in front of the key film substrate 1 scatters the light energy of L2c. The light energy of L2c is attenuated so that it cannot be imaged even if it enters the photographic lens. Regarding the fourth method, in order to prevent the AG film from affecting the scattering of the transmitted light Lib, it is necessary to dig a circular hole in a part of the AG film layer (for example, the central portion of the AG film layer) (with a circular photography) The lens 31) forms a window for allowing the transmitted light Lib to be directly imaged into the photographic lens 31 by the circular window. 17 200931977 Due to the different usage environments and usage conditions, if the four methods are used separately or combined, if necessary, the application can exert better results. Please refer to FIG. 3 , which is a schematic diagram of the application of the device in this embodiment. The difference between FIG. 3 and FIG. 2 is that the housing 2 of FIG. 2 is removed in the third embodiment. As shown in FIG. 3, the transmitted light L2a incident on the coated substrate 1 does not touch any object. (e.g., housing 2), L2a continues straight ahead until the light energy is exhausted, so there is no problem with the reflected light L2b in Fig. 2. At this time, if the human eye sees the coated substrate 1 from the direction of L2, it will be found that the coated substrate β 1 is in a transparent state (the transparency is 40% of the transmitted light Lib), and the human eye can easily see the object behind the coated substrate 1, especially It is more obvious when the illuminance behind the coated substrate 1 is greater than the illuminance of the front side of the coated substrate 1 (on the same side as the human eye). When the background environment of the coated substrate 1 is dark (for example, dark blue) or black (for example, in the casing 2), the human eye is observed from the front side of the coated substrate 1 under a general environment (for example, an illumination environment of about 200 Lux). Because it has 60% of reflected light, it looks like a mirror. And 40% of the transmitted light enters the coated substrate 1 and is 'absorbed' and "scattered" by the dark or black background, leaving little energy, and is covered by a strong 60% reflected light. . The human eye is viewed from the front side of the coated substrate 1 ’, which is almost a mirror image of the 60% of the reflected light. The effect of specular reflection is usually exhibited when there is more than 50% of reflected light. Of course, 70% or more of the reflected light is more like a mirror. If the coated substrate 1 has no background environment as shown in Fig. 3, the specular reflection of the chain substrate i is not significant. When the human eye is viewed from the front side of the key film substrate 1, most of the images of the two images, such as the image reflected by the Lla specular image and the image seen by the transmitted light L2a, are observed. Actually, 'shown in Fig. 3' is only one of the test work at the completion of mass production of the coated substrate 1. The imaging effect of the back surface of the key film substrate 1 is mainly tested. This work is to align the lens 31 of the camera 3 with the back surface of the coated substrate 1, and then connect the image display 200931977 4 to test the imaging effect of the transmitted light L1b on the camera 3. For example, on the coated substrate 1 which has been mass-produced, it is checked whether or not the surface of the coated substrate 1 is scratched or the film thickness of the coating layer is uneven. In fact, the imaging effect displayed on the image display 4, if under certain ambient illumination, its imaging effect mainly depends on (1) the light energy of the transmitted light L1b, and (2) the camera 3 image sensor (Image Sensor ) the quality. The larger the light energy ratio (percentage of incident light L1) of (1) transmitted light L1b, the better the imaging effect displayed on the image display 4. However, the larger the light energy ratio of the transmitted light L1b, the smaller the relative reflected light L1a. The smaller the reflected light Lla, the less visible the mirror surface, and the brighter mirror surface 'is not easy to hide the object behind the decorative coating substrate 1 (such as the camera 3), which also loses the hiding of this embodiment. The purpose of decorative imaging. The light energy ratio of the transmitted light L1 b actually applied in Figure 2 is a suitable range of choice from 1 〇% to 45%. As for (2), it mainly refers to the sensitivity of the image sensor of the camera 3. There are many kinds of styles commonly used in the domestic and foreign markets, including Japanese sony, SharP and South Korea's Samsung, which have different models of high end, Mid-end and Lowend. product. For example, the camera 3 of the three examples was tested with more than ten models of CCD and CMOS. Different imaging effects are also achieved in different illumination environments. If the cost of purchasing a high-end camera is replaced by the purchase of a low-end camera, it is also an alternative to a high-order camera to select a larger amount of light transmitted by the coated substrate Ub, or to appropriately match the auxiliary light source. For example, the round three is the test work when the coated substrate 1 is completed, that is to say, when the coated substrate 1 is mass-produced, the coated substrate 1 of the test OK can be sold separately to the camera manufacturer' so that the camera manufacturer can have different cameras 3 and different forms. The housing 2 can be assembled into a product that can be directly applied to consumers. In the third, if the coated substrate 1 is coated with an opaque layer, the opaque layer of the covering 19 200931977 does not include the window of the lens 3 of the camera 3. That is to say, part of the area of the opaque layer that is covered does not cover. This non-overlapping area serves as a window for the camera 3 lens 31. Then, the incident light L1 enters the camera 3 via the non-overlying area (the window of the lens 3 of the camera 3). Like the incident light L2, it cannot penetrate the opaque area of the coating. Thus, the coated substrate 1 coated with the opaque layer region can be combined with the camera 3 to form a single product. For example, the coated substrate 1 coated with the opaque layer region is combined with the camera 3 to form a "hidden doorway security monitor" product application. The application of this product is to dig a hole in a door for placement in the camera 3, and then adhere the back of the coated substrate 1 covered with the opaque layer to the door. The colored digital pattern and the name text are pasted or sprayed on the coated substrate 1 which is not covered with the opaque layer. Note that this pasted or painted area does not block the window of the lens 3 of the camera 3 so as not to block the light entering the lens 31 of the camera 3. Upon completion, only a decorative house number (coated substrate 1) is seen on the facade. When a visitor rings the bell, the camera 3 lens 31 can take a video of the visitor for monitoring or video recording. In the application of the product, the above-mentioned facade is in the range in which the coated substrate 1 is adhered, and if it is just the opaque facade region, the film substrate 1 does not have to be covered with the opaque layer. By analogy, as shown in Fig. 2 and Fig. 3, the combination of the coated substrate 丨 and the camera 3 does have a lot of application space. Please refer to FIG. 4 for a schematic diagram of the application of the device in this embodiment. Another application device is shown in Figure 4. The main difference between Figure 4 and Circle 2 and Figure 3 is that an infrared light source 5 of the auxiliary camera 3 is added to the fourth, and L3, L3a, L3b and L3c of the infrared light source 5 are conveniently explained. In fact, there are often day and night anti-theft surveillance cameras (commonly known as Day & Night CCD), which are shown in the fourth and recent international safety equipment exhibitions, except that the key film substrate 1 replaces the transparent glass. The design of this type of camera 20 200931977 is mostly composed of an auxiliary infrared light source 5 for night vision and a camera lens 31, and then placed in the same aluminum casing 2 for convenient construction. White days (enough ambient light energy) use visible light photography, nighttime (insufficient ambient light energy) using auxiliary infrared light source photography. For the night vision auxiliary light source 5, an infrared light emitting diode called IR-LED is commonly used, which is the cheapest and convenient night vision auxiliary light source on the market. The center wavelength is usually 850nm, and the single power is about l〇〇mW. In the finished products of day and night anti-theft cameras, product manufacturers often surround 12, 24, 36 or even more than one hundred IR-LEDs. A circuit board is surrounded by a circular cavity in the center of the board that is placed directly around the camera lens 31. Thus, the infrared ray radiation direction is ensured to be the same as the direction in which the camera lens 31 picks up the image. An infrared light source 5 added in the fourth embodiment of the present embodiment is the same as the small-scale anti-theft monitoring photographic apparatus currently sold in the market (Taiwan and the Chinese mainland commonly known as a gun machine). The infrared light source 5 and the camera lens 31 are also combined. After that, it is placed in the same casing 2. In recent years, the newly-produced rushing machines have mostly used single or double-layer transparent glass hoods. Figure 4 replaces the single-layer or double-layer transparent glass with a coated substrate 1. The IR-LED source emits light in the infrared range with a center wavelength of 85〇nm, which is within the range recognizable by the human eye. So the red eye is often seen in the industry as the “red burst”. It is nighttime. The main reason for exposing the location of the camera. As shown in FIG. 4, this embodiment also uses an infrared light source 5 having a center wavelength of 92 〇 nm to 940 nm, and the light emitted by the infrared light source having a center wavelength of 92 〇 nm or 940 nm is a human eye. In the unrecognizable range, the human eye cannot see the "red burst". In general, the day and night type camera has a built-in filter with a center wavelength of 850 nm in the infrared portion, and the infrared energy radiated by the infrared light source 5 having a center wavelength of 92 〇 nm to 940 nm passes through the slab. At the time, 21 200931977 was attenuated to about one-third. In this embodiment, two methods for compensating for the attenuated infrared energy are adopted. One is to change a filter that can pass through a center wavelength of 850 nm to a filter that can pass through a center wavelength of 920 nm to 940 nm. The second is to increase the relative amount of the IR-LED at a center wavelength of 920 nm to 940 nm to increase the infrared energy radiated by the infrared light source 5. As shown in Fig. 4, the infrared rays radiated by the newly added infrared light source 5 in the casing 2 are infrared L3 (the infrared radiation energy is assumed to be 100%), and the infrared L3 is incident on the coated substrate 1 'if The transmittance of the infrared L3 incident on the chain film substrate 1 is only about 40% as the visible light L1. Then, the infrared light transmitted by the infrared transmitted light L3b is only 40%. The infrared transmitted light L3b penetrates the key film substrate 1 and is incident on the object A, and the object A absorbs and then radiates out through the coated substrate 1 After that, it becomes the transmitted light L3c, and then enters the camera lens 31 for imaging (infrared image). When the transmitted light L3c entering the camera lens 31 enters and exits the coated substrate 1 back and forth, the infrared light source 5 radiates less than 20% (40%*40%) of the infrared L3c in the casing 2, which is used in the market. Obviously not practical. Therefore, the embodiment of the present invention must increase the transmittance of the infrared transmitted light L3b on the coated substrate 1 to about 90% to 96%, which is easily accepted by the market. This is also one of the intentions of the present invention to replace the metallized film with a multi-layer dielectric film. © The current IR-LEDs built into the commercially available day and night anti-theft surveillance cameras are mostly radiated through a protective cover of transparent glass and then penetrated back into the camera lens for imaging. The reflectivity of the transparent glass is 4%, and the infrared light energy radiated by the IR-LED is lost by 8%. If the transmittance of the coated substrate 1 is increased to 96%, the infrared light energy radiated by the R-LED is also lost by 8%. If the transmittance of the coated substrate 1 is 96% (see Figure 12 for details), at least, the infrared light energy loss radiated by the coated substrate 1 to the IR-LED is no more than that radiated by the transparent glass to the R-LED. The infrared light energy loss is much. In this case, the coated substrate 1 is not only depleted of infrared light energy with respect to the transparent glass, but also has a hidden decorative effect. If the four-infrared reflected light L3a is not blocked by the black soft cover 32, 22 200931977 may enter the camera lens 31 to image, and the image display 4 displays an image of the white exposed block, which is an infrared light source. 5 Radiation infrared block image. For example, if there is only one circular-shaped 10 mm wide infrared light-emitting diode (丨R-LED), the white exposed block is a circular dot-shaped white exposed block. If an object A is in front of the key film substrate 1, at the incident of the visible light L1, the transmitted light Lib enters the camera lens 31 for imaging, and finally the visible light image of the object A is displayed on the image display 4. If the camera 3 is a color camera, the visible light image is a color image. If the camera 3 is a monochrome camera, the visible light image is a black and white image. ® If an object A is in front of the key film substrate 1, when the infrared light source 5 emits light, the transmitted infrared L3c penetrating the coated substrate 1 enters the camera lens 31 for imaging, and finally an infrared image of the object A is displayed on the image display 4. . This infrared image is a monochrome image. The human eye is similar but not identical to the black and white image. If an object A is in front of the coated substrate 1, when the incident of the visible light L1 and the infrared light source 5 initiate the radiation, an overlapping image of the visible light image and the infrared image of the object A is displayed on the image display 4. At this time, if the visible light image is larger than the infrared image, the visible light image "over" the infrared image, so that the visible light image of the object A is displayed on the image display 4. 〇 If the visible light image is smaller than the infrared image at this time, the infrared image “covers over the visible light image” so that the infrared image of the object A is displayed on the image display 4. At this time, if the visible light image is close to or equal to the infrared image, both the visible light image and the infrared image exist simultaneously, so that the visible light image of the object A is displayed on the image display 4, but with a block similar to overexposure, the visible light image and the infrared image The overlap of the two at the same time will cause the viewer to call the "bad" image quality. In order to avoid causing the visible light of the object A to be displayed on the image display 4, a commercially available day and night type camera is usually a photosensitive resistor (CDS) in a transparent glass cover. The component is used as 23 200931977 to measure and control. When the ambient illuminance is insufficient (for example, about 1 OLux remaining), the control circuit activated by the CDS element turns on the power of the infrared light source 5 to emit infrared L3, and the infrared image is larger than the visible light image, so that the object A is displayed on the image display 4. Infrared image. The fourth is to omit the CDS component. Since the CDS is a conventional component commonly used in commercially available day and night surveillance cameras, it is not drawn in the figure to avoid the complicated drawing of Figure 4. The only thing to note is that in Figure 4, the CDS component accepts the direction of incident visible light, and does not pass through the coated substrate (for example, placed in a part of the housing 2) because the coated substrate 1 has a visible light transmittance of only 40. % (if the transmittance of the coated substrate 1 is 4%), which is different from that of a conventional cDS element disposed in a transparent glass (nearly receiving 92 〇/〇 of incident visible light). 'If it must be placed in the position of the coated substrate 1, the sensitivity of the CDS element must be adjusted. That is to say, if the CDS element is placed in the transparent glass to be activated at 10 Lux, the CDS element placed after the coated substrate 1 is adjusted between 20 and 30 Lux. At present, high-end products are provided with an automatic dual filter switching device in the space between the lens 31 of the camera 3 and the front side of the image sensor. The automatic dual filter switching device currently on the market is simply a device that automatically switches two filters such as an infrared cut filtter and an ordinary transparent glass passer. When the infrared cut filter is cut into the image sensing device, the infrared light is blocked, the image sensor only senses the visible light, and the infrared color is not visible on the image display 4 (True Color) . When the infrared cut filter is removed from the image sensor, the image sensor senses the incident light of both visible light and infrared due to the cut-in relationship of the ordinary transparent glass light-emitting sheet. Therefore, it is possible to capture images of visible light and infrared light, and there is also an organic image that causes overlapping images of visible light and infrared light. In this embodiment, the camera 3 shown in FIG. 4 is removed and replaced with a camera having a dual filter switchable, and the ordinary transparent glass filter in the dual filter is removed, and then Place an infrared pass filter. The camera 3 shown in the fourth embodiment has a camera 3 which is switchable by a double filter such as an infrared cut filter ICF (Infrared Cut flitter) 24 200931977 and an infrared pass filter 丨PF (丨nfrared Pass flitter). ^This time, when cutting into the infrared pass filter, only the infrared image is displayed on the image display 4, and the superimposed image of visible light and infrared is not seen. In FIG. 4, if the transmittance of the coated substrate 1 to visible light is 40% on average (as shown in FIG. 5 below), the human eye faces the coated substrate 1 at an angle to see the coated substrate 1. I often see the 丨r_led of the infrared light source 5. At present, most of the commonly used IR_LEDs are encapsulated in transparent resin, and the incident light transmitted by the coated substrate often causes a part of the reflection on the transparent resin, so that the interested person can observe at the proximal end. The "existence" of the infrared light source 5 is seen. ® See Figure 4A for an infrared black mask. A black mask 51 is included in the fourth A, and the mask is on the |R_led and an L4 representing the eyes of the human eye. The reflected light L4a generated on the surface of the coated substrate 1 by L4 allows the human eye to reflect the image reflected by the human eye when the surface of the coated substrate 1 is viewed from the front. When the human eye squints the coating plate 1, the reflection on the 丨R-LED transparent resin package table φ is seen because of the 4 〇〇/0 transmitted light L4a, and the presence of the infrared ray 5 is known. In order to prevent the human eye from squinting the coated substrate i, the reflection on the surface of the |R_LED transparent resin package is seen, so that a black mask 51 is placed over the surface of the 丨R-LED transparent resin package. The black mask sheet 51 is obtained by mixing blue and red transparent color materials, and then mixing and molding with a transparent resin, and the black mask sheet 51 is not rough, and the surface may cause scattering of infrared light. The black mask sheet 51 can cut off the visible light and allows the infrared light source 5 to radiate the infrared light L3, which can penetrate the black cover sheet 51. The black mask 51 has a hollow hole in the center for inserting into the lens of the camera lens and a hollow hole around the hollow light source 5. The transmitted light L4b generated by the human eye incident light L4 on the surface of the coated substrate 1 is absorbed by the black mask 51 and blocked. Such an eye-catching L4 does not see the IR_LED on the infrared source 5 and its reflection. 25 200931977 Regarding the manufacturing method and application of the black mask sheet 51, I have disclosed in the International Bureau of the World Intellectual Property Organization in accordance with the Patent Cooperation Treaty PCT, the published international bulletin 2008Α) 06260Α1, a manufacturer of infrared transparent black plastic products has been disclosed. A brief description of some of the relevant contents is shown in Figure 4." Please refer to Figure 4 for the relationship between the three primary colors and the three colors. In Figure 4, three large circles are cyan (c) Cyan, magenta (μ) Magenta, and yellow (Y) YeiiQW. Three small ovals (B), red enamel, and green (G)e can be composed of three primary colors such as cyan (C), magenta (yellow), and yellow (y) in the same proportions - black color (such as The center shown with _. (8), red (8), and green (6) and other three primary colors can also be combined to form a black color body (such as Black shown in the center). If blue (B), red (R), It can also be combined with green (G), etc. = the same proportion of components can also form a black color. For example, / one / color material (B) material can also be mixed to obtain black (Mack), magenta (M) The material can be mixed with the green (g) material to obtain the black cyan (C) material and the red (R) material, and the black color (酊^^) can be obtained. Degree, =^K===Blaek)妓-like black in the printing industry, the cyan (C), magenta (M), and yellow primary colors are mixed in the same proportion to form black, but this is not pure black. material. The mixing of two or three colorants can give a black or black-like color (Black of 囷B) due to absorption of the three primary colors. The slab 51 contains a "transparent" color mixture that is transparent in the "transparent" tree. The transparency is mainly to allow the infrared to pass. The object F 砉 51 can cut off the transmitted light L4b of the visible light U, and let people f to the object behind the black occlusion film 51 (for example, IR. LED). It can not pass 'mainly because of the above-mentioned transparent color material, 'Buguang L3'. If the "transparent" color material is changed to "opaque" color material, 26 200931977, the infrared light L3 cannot pass. If the transmittance of the coated substrate 1 to the visible light L1 is on average 2%% (sample C shown in FIG. 13), when the human eye faces the coated substrate 1, it is not easy to see through the coating regardless of front view or squint. Substrate 〖. Alternatively, an IR-LED (transparent colorless resin package) having a center wavelength of 850 nm can be changed to a 丨R-LED (dark blue resin package) having a center wavelength of 940 nm, and the black mask 51 can be omitted. For the coated substrate t of the apparatus of the above embodiment, the preparation method comprises the following steps: (Ο simulating the design on the computer; (b) providing a clean transparent substrate and the selected film; (c) the transparent substrate of (b) The film is placed in the coating machine; (d) the film thickness is monitored and corrected; (e) the spectrometer is taken out and the sample is completed and the spectrum is compared with the original (a) the simulated design on the computer. Step Description: U) Simulate the design on the computer: First, according to the following two requirements: (1) The transmittance T% in the visible light (400nm~700nm) part, the average control is 40%. (2) The transmittance T% in the infrared (780 nm to 1,000 nm) portion is controlled to be more than 90%. Simulate the design on the computer and plot the spectrum of the design. Please refer to the simulation design spectrum on the computer of sample A for sample A. The ordinate of the fifth is the penetration percentage T% (Transmittance %). The abscissa is the spectral wavelength (in nm). Other parameters are (1) white light environment, (2) frontal incident angle (0 degrees), and (3) reference wavelength of 450 nm. (b) Provide a clean transparent substrate and optional membranes··
準備一厚度為3mm長為100mm寬為100mm的透明PC 27 200931977 ί it ΐί,尚低不同的蹄中,有常用的氧化物膜,例 有间折射率的TiG2與低折射率的Si〇2。由於TiG2容 ❹Prepare a transparent PC with a thickness of 3 mm and a width of 100 mm and a width of 100 mm. In the lower hoofs, there are commonly used oxide films, such as TiG2 with a refractive index and Si〇2 with a low refractive index. Due to TiG2 capacity
^ ’且會有不_結構(因氧化不完全> 因此為了得到完好 的Τι〇2 ’起始材料以Ti3〇5為最常用。鍍膜方式以電子搶蒸鍍 加離子助鍵(IAD)’將高折射率的Ti3〇5與低折射率的&〇2 兩種膜材交替蒸錄了 18層《鍍膜機内放有二個以上的坩銷分 別裝有Τι3〇5、與Si〇2等膜材。此兩種膜材加熱後變成蒸汽分 別附著於透明PC板上》 事實上,若去檢測預熔良好的Ti〇2,可發現坩鍋上的膜料 含有大量的Ti2〇5與Ti3〇5。所以,在後面實施例如囷十二是 以Ti〇2與Si〇2搭配的。 (c)將(b)的透明基板與膜材置入鍵膜機鍍製: 置入台灣製鍍膜機編號為LP1300進行鍍膜。 第一層:鍍Ti3〇5。光學膜厚=〇. 5075 第二層:鍍Si〇2。光學膜厚=0.4615 第三層:鍍Ti3〇5。光學膜厚=2.0697 第四層:鍍Si〇2。光學膜厚=〇. 3996 第五層:鍍Ti3〇5。光學膜厚=1 2309 第六層··鍍Si〇2。光學膜厚:=0.9521 第七層:鍍Ti3〇5。光學膜厚=:〇. 6556 第八層:鍍Si〇2。光學膜厚=1. 2178 第九層:鍍Ti3〇5。光學膜厚=1.4742 第十層:鍍Si〇2。光學膜厚=:〇. 3776 第十一層:鍍Ti3〇5。光學膜厚=4.1621 28 200931977 第十二層:鍵Si〇2。光學膜厚=〇. 8iQ〇 第十三層:鍍Ti3〇5。光學膜厚=1. 7303 第十四層:鍍Si〇2。光學膜厚=1.5163 第十五層:鍍Ti3〇5。光學膜厚=1.12〇9 第十六層:鍍Si〇2。光學膜厚=1. 7299 第十七層··鍍Ti3〇5。光學膜厚=1.4229 第十八層:鍍Si〇2。光學膜厚=2. 8657 (d) 膜厚監控與修正: 每個臈層厚度的控制在±1%,離子源的工作氣體適 β 在蒸發源附近也需充入適量氧氣。本實施例樣品A使 髎用的鍍膜機若無具備自動控制的電腦計算, (或是穿透率)到何數值該停,若帶有光譜_ 統則可隨時比較,比較鍍製膜層之光學成效是否與理論值相符 〇。若不符合,則要快速計算下一層甚至以後其他層要如何修 ^ (例如製備樣品C)。樣品A採用的鍍膜機若無電腦自動計 算,則需事先計算鍍每一層後的反射率(或是穿透率),用以 確定停鍍點。 ,本實施例如圖四的透明基板為平面型,但若為一曲率較大 /的半球型,為了使整個球罩内部膜厚均勻,其支撐架的設計必 〇 須同時具有公轉與自轉的功能,使球罩内部的膜厚儘量可保持 均勻。 本實施例的透明基板是屬鍍多層薄膜,故以光學監控其膜 厚’通常膜厚增加時其反射率和穿透率會起變化。當反射率和 穿透率走到極值點時,可知所鍍膜之光學厚度nd為監控波長 λ〇的四分之一的整數倍(如囷一薄膜反射率與光學厚度的變 化關係囷)’這種方法雖有容許的誤差但很簡單容易辨識。 (e) 取出後以光譜儀測試並繪出樣品完成的光譜圖: 因為採用離子助鍍為低溫(室溫)冷鍍,鍍好後約十分 鐘可取出。然後以日本Hitachi製的U-4100光譜儀繪出的光 29 200931977 譜圖如囷六。 圖六為設計樣品Α第一次鍵後的實際光譜圖。 將圖五原先設計的光譜圖與囷六第一次鍍後的實際光譜 囷作比較。 如囷六,發現有三點不符合理想:(1)是在4〇〇nm處有 出現一異常。(2)是在550nm處有一高凸點〇(3)是在紅外 波域850nm處穿透率約在70%。 Ο^ 'And there will be no structure (due to incomplete oxidation), so in order to get the perfect Τι〇2 'starting material, Ti3〇5 is the most commonly used. The coating method is electronically etched and ion-assisted (IAD)' The high-refractive-index Ti3〇5 and the low-refractive-index &〇2 membranes are alternately steamed with 18 layers. “There are more than two pins in the coating machine, Τι3〇5, and Si〇2, etc. Membrane material. These two membranes are heated and then vaporized and attached to a transparent PC board. In fact, if the pre-melted Ti〇2 is detected, it can be found that the film material on the crucible contains a large amount of Ti2〇5 and Ti3. 〇 5. Therefore, in the following, for example, 囷12 is a combination of Ti〇2 and Si〇2. (c) The transparent substrate of (b) and the film are placed in a bonding machine to be plated: The machine number is coated with LP1300. The first layer: Ti3〇5. Optical film thickness = 〇. 5075 Second layer: Si镀2. Optical film thickness = 0.4615 Third layer: Ti3〇5. Optical film thickness = 2.0697 Fourth layer: Si〇2 plating. Optical film thickness = 〇. 3996 Fifth layer: Ti3〇5. Optical film thickness=1 2309 Sixth layer··Si plating 2. Optical film thickness:=0.9 521 seventh layer: Ti3〇5. Optical film thickness =: 〇. 6556 Eighth layer: Si〇2. Optical film thickness = 1. 2178 Ninth layer: Ti3〇5. Optical film thickness = 1.4742 Tenth Layer: Si镀2 plating. Optical film thickness =: 〇. 3776 11th layer: Ti3〇5. Optical film thickness = 4.1621 28 200931977 Twelfth layer: Bond Si〇2. Optical film thickness = 〇. 8iQ〇 Thirteenth layer: Ti3〇5. Optical film thickness=1. 7303 Fourteenth layer: Si〇2 plating. Optical film thickness=1.5163 Fifth layer: Ti3〇5. Optical film thickness=1.12〇9 Sixteen layers: Si〇2. Optical film thickness=1. 7299 Seventeenth layer··Ti3〇5. Optical film thickness=1.4229 Eighteenth layer: Si镀2 plating. Optical film thickness=2. 8657 ( d) Film thickness monitoring and correction: The thickness of each layer is controlled at ±1%, and the working gas of the ion source is also required to be filled with oxygen in the vicinity of the evaporation source. In this example, sample A is used for the coating machine. If there is no computer with automatic control, (or the penetration rate) to what value, if there is a spectrum _ system, it can be compared at any time to compare whether the optical effect of the coated film is in accordance with the theoretical value. , you need to quickly count Calculate the next layer or even how to repair other layers later (for example, sample C). If the coating machine used in sample A is not automatically calculated by the computer, the reflectance (or penetration rate) after plating each layer must be calculated in advance. To determine the stop plating point, the transparent substrate of the present embodiment, for example, is a flat type, but if it is a hemispherical type with a large curvature, in order to make the inner film thickness of the entire dome uniform, the design of the support frame must be simultaneously It has the functions of revolution and rotation, so that the film thickness inside the dome can be kept as uniform as possible. The transparent substrate of this embodiment is a multi-layered film, so that its film thickness is optically monitored. When the film thickness is increased, the reflectance and transmittance thereof change. When the reflectance and the transmittance go to the extreme point, it can be seen that the optical thickness nd of the coated film is an integral multiple of a quarter of the monitoring wavelength λ〇 (for example, the relationship between the reflectance of the film and the optical thickness 囷) This method has an allowable error but is simple and easy to identify. (e) After taking out, the spectrometer is used to test and plot the completed spectrum of the sample: because ion plating is used for cold (room temperature) cold plating, it can be taken out after about ten minutes. Then, the light drawn by the U-4100 spectrometer manufactured by Hitachi, Japan is 29 200931977. Figure 6 shows the actual spectrum after designing the sample for the first time. Compare the spectrum originally designed in Figure 5 with the actual spectrum after the first plating of the six. For example, there are three points that do not meet the ideal: (1) there is an abnormality at 4〇〇nm. (2) is a high bump at 550 nm (3) is about 70% at 850 nm in the infrared region. Ο
其中(1)與(2)使得樣品a膜面略呈現偏黃紫色。 其中(3)在波長850nm處的穿透率僅約在70%,這使 得市場上絕大多數的日夜型攝影機中,所採用850nm的LED 光源,就衰減了約25%的紅外能量。 由上述三缺點,有必要再加以修正。 原先的膜層與膜厚設計不變,調整一下真空壓再嘗試: 例如,固定通氧的真空度調在1.8*10-4t〇rr,保持室溫冷 鍍,起鍍真空度調在2*1(T5t〇rr以下。初步修正後再鍍一次二 結果第二次鍵完後再經U_41〇〇光譜儀緣出的光譜 七。 圖七為設計樣品A第二次鍵後的實際光譜圖。 如囷七,發現(1)在400nm處出現的異常不見了 是在550nm處的高凸點位移到了 52〇nm處,而且 由45%上升60%到使得樣品膜面呈現偏黃色。。年 外波域780nm〜1,〇〇〇nm呈現約95%的高; 850nm的衰減。 ^汉吾了 上述的圖六與圖七在樣品A表面帶有— 可以應用?是否對樣品A後面的監視攝職 g 造成色偏的不良品f ? (f)成像測試: 將f六與圓七中表面帶有—點顏色的樣品 如圖四中所示鍍膜基材丨的位置,進行測試。才和再置入 200931977 若如囷四所在的環境照度在2〇〇Lux,以普遍的影 器4觀看所顯示樣品A的影像,看不出有色偏現象' 、 若如圖四所在的環境照度改變在4〇〇LUx,以專業 条 像顯示器4觀看,所顯示樣品a的影像,就略可看出^色偏^ 象。 業界包工程的系統廠商,對於樣品A在應用市場上產生 的色偏有不同看法。以金融銀行體系的客戶而言,他們不接受 有色偏現象的監視攝影產品。但以商店賣場等的客戶,只要^ 格相對低廉,還是可接受有色偏現象的監視攝影產品,^為他 們僅要監視是否有竊盜的行動。 ❹ 如上述製備步驟再製備一樣品Β。 樣品Β是在鍍膜基材1上,加鍍有一層金屬鉻Cr作減反 射層。如前述說明,因為金屬鉻Cr對光能的吸收而造成光的 損耗。所以,可見光與紅外的平均穿透率會下降。 請參閱圖八為本實施例樣品B的設計光譜圖。 如圖八所示’本實施例樣品B設計的兩個需求是: (一) 在可見光(400nm〜700nm)部份的穿透率τ% ,平 均控制在18%» (二) 在紅外(780nm〜1,000nm)部份的穿透率τ%,平 均控制在70%以上。 (a)在電腦上模擬設計: 圖八中縱座標為穿透率百分比T% (Transmittance %)。 橫座標為光譜波長(單位nm)。其他參數為(1)白光環境、(2) 正面入射角(〇度)、(3)參考波長為420nm。 0>)提供一清潔的透明基板與選用膜材: 準備一厚度為3匪的透明青板玻璃數片,選用的膜材也 是 Ti3〇5、與 Si〇2。 (Ο將(b)的透明基板與膜材置入艘膜機鍍製: 將透明基板放入台灣製的鍍膜機(LP-1300)進行鍍膜。 31 200931977 内放有三個以上的稿分別裝有Ti3()5、與咖、與Cr 寻膜材。 製備樣品B與樣品A的鍍膜機若不是在同一台製鍵,其 2不ί相f。在鍍膜機内任何的一些改變,例如加熱溫度的 为佈、透明基板雜與大小、充氧量料都會料鍍每 的產品,___—機台以保證Among them, (1) and (2) make the film surface of sample a slightly yellowish purple. Among them, (3) the transmittance at a wavelength of 850 nm is only about 70%, which makes the 850 nm LED light source attenuate about 25% of the infrared energy in most of the day and night cameras on the market. From the above three shortcomings, it is necessary to correct them. The original film layer and film thickness design are unchanged, adjust the vacuum pressure and try again: For example, the vacuum degree of fixed oxygen is adjusted at 1.8*10-4t〇rr, and the room temperature is cold-plated, and the vacuum degree is adjusted to 2*. 1 (T5t〇rr or less. After the initial correction, the plating is performed once again. After the second key is completed, the spectrum of the U_41〇〇 spectrometer is taken out. Figure 7 is the actual spectrum after designing the second key of sample A.囷7, it was found that (1) the anomaly at 400 nm disappeared at a high bump at 550 nm to 52 〇nm, and increased by 45% from 45% to make the film surface appear yellowish. The domain is 780 nm~1, 〇〇〇nm exhibits a height of about 95%; the attenuation of 850 nm. ^Hawu has the above-mentioned Figure 6 and Figure 7 on the surface of sample A - can be applied? Whether to monitor the post behind sample A g Defective product causing color shift f ? (f) Imaging test: The sample with the color of the point on the surface of f6 and round seven is tested as shown in Figure 4. The position of the coated substrate is tested. Into 200931977, if the ambient illumination of the fourth floor is 2〇〇 Lux, watch the sample A displayed by the universal camera 4. For example, if there is no color deviation phenomenon, if the ambient illumination in Figure 4 changes to 4〇〇LUx, and the professional image display 4 is displayed, the image of the sample a is displayed, and the color deviation is slightly seen. The system vendors of the industry package engineering have different views on the color shift produced by the sample A in the application market. For the customers of the financial banking system, they do not accept the surveillance photography products with color-shifting phenomenon. However, customers such as store stores As long as the grid is relatively low, it is still acceptable to monitor the photographic products with color cast phenomenon, ^ for them only to monitor whether there is burglary action. ❹ Prepare a sample Β according to the above preparation steps. Sample Β is on the coated substrate 1 On the top, a layer of metallic chromium Cr is added as an anti-reflection layer. As explained above, the absorption of light by the metal chromium Cr causes light loss. Therefore, the average transmittance of visible light and infrared light will decrease. For the design spectrum of the sample B of this example, as shown in Fig. 8, the two requirements of the sample B design of this embodiment are: (1) The transmittance τ% in the visible light (400 nm to 700 nm) portion, the average control In 18%» (b) the penetration rate τ% in the infrared (780nm~1,000nm) part, the average control is above 70%. (a) Simulation design on the computer: The ordinate in Figure 8 is the percentage of penetration T% (Transmittance %) The abscissa is the spectral wavelength (in nm). Other parameters are (1) white light environment, (2) front incident angle (twist), and (3) reference wavelength is 420 nm. 0>) provides one Clean transparent substrate and optional film: Prepare a number of transparent green plate glass with a thickness of 3 inches. The selected film is also Ti3〇5 and Si〇2. (Ο The transparent substrate and the film of (b) are placed in a film machine for plating: The transparent substrate is placed in a coating machine (LP-1300) made in Taiwan for coating. 31 200931977 Three or more drafts are placed separately. Ti3 () 5, with coffee, and Cr film. The coating machine for preparing sample B and sample A, if not in the same key, the 2 is not f. Any changes in the coating machine, such as heating temperature For cloth, transparent substrate miscellaneous and size, oxygenation materials will be coated with each product, ___-machine to ensure
❹ 對於製備樣品B試鍍錢,將製備樣品A的 Ti3〇5的每一層光學膜厚,以及將鍍Si〇2的每一 對應的修正。參考波長改為420nm,如下: 甲联厚作 第一層:艘Ti3〇5。光學膜厚=〇. 5728 第二層:鍍Si〇2。光學膜厚=〇. 6〇37 第三層:鍍Ti3〇5。光學膜厚=2.3加1 第四層:鍍Si〇2。光學膜厚=〇· 5228 第五層:鍍Ti3〇5。光學膜厚=1.3893 第六層··鍍Si〇2。光學膜厚=1. 2455 第七層:鍍Ti3〇5。光學膜厚=〇. 74〇〇 第八層:鍍Si〇2。光學膜厚=1.5931 第九層:鍍Ti3〇5。光學膜厚=1.郎的 第十層:鍍Si〇2。光學膜厚=0.4940 第十一層:鍵Ti3〇5。光學膜厚=4. 6978 第十二層:锻Si〇2。光學膜厚=1. 第十三層:鍍Ti3〇5。光學膜厚=1.953() 第十四層:鍍Si〇2。光學膜厚=1. 9肋6 第十五層:鍍Ti3〇5。光學膜厚=1.2652 第十六層:鍍Si〇2。光學膜厚=2. 2631 第十七層:鍍Ti3〇5。光學膜厚=1.6〇6() 第十八層··鍍Si〇2。光學膜厚=3. 7489 (d)膜厚監控與修正。 32 200931977 膜厚監控如樣品A,最後再鍵上厚度3nm (Physical thickness)的一金屬 Cr層。 樣,B製備了兩個樣品,分別為樣品B1與樣品B2。 樣品B1的Cr層是在鍍介電質膜面的同一面上加鍍疊上 去’也就是說Cr層與介電質膜層是鍍在透明基板的同一面, 可稱為單面鍵膜。而樣品B2的Ci•層是在鍍介電質膜面的另一 面上,也就是說Cr層與介電質膜層是鍍在透明基板的不同 面,可稱為雙面鍍膜。 (e)取出後以光譜儀測試並繪出樣品B完成的光譜囷: 請參閱圖九為樣品B完成的光譜圖。 .圖九中顯示兩條曲線:樣品酊的光譜曲線Bla與樣品拟 的,譜曲線B2a。曲線Bla看到(1)在570nm處有一高峰點, 使得樣品B外表面略呈黃色。(2)可見光穿透率上升到平均約 27°/。。(3)紅外穿透率約75%。 曲線B2a看到(1)在570nm處的一高峰點不見了,使 得樣品B外表面看不出略呈黃色。(2)可見光穿透率上升到平 均約23%。( 3 )紅外穿透率降低到約.7〇〇/0。 從圖九樣品B完成的光譜圖與圖八本實施例樣品b的設 計光譜圖,看到兩圖的光譜曲線有落差;圖八在可見光 〇 400nm~700nm部份的穿透率T%平均為18%,但圖九在可見 光400nm〜700nm部份確上升到約27%。而圖八在紅外 780nm〜1,000nm部份的穿透率τ%由在75〇/0降至70% ,此 部份變動範圍相對不大。 其中’就在可見光400nm〜700nm部份的穿透率T%會 上升’這個現象有可能是鍍Cr膜層對鍍介電質膜層的干涉出 了問題。 但就曲線Bla與曲線B2a看來,鍍單面膜與鍍雙面膜的 差異,均對如囷四的影響成像效果不是很大。僅是鍍雙面膜所 花的工時相對多(本實施例鍍雙面時鍍完一面後要再翻轉再鍍 33 200931977 另一面)、成本也相對比較高。而且,鍍雙面在基板外表面的 膜面容易沾污與到傷常需另加保護膜。又,錄單面媒時如圖九 所示,在可見光部份會有些明顯凸出的曲線(如在570nrT1 處)’這是鍍多層介電質與鍵金屬Cr膜的過於接近疊起,影響 到多層介電質膜的干涉。而鍍雙面膜的多層介電質膜與金屬❹ For the preparation of sample B, the optical film thickness of each layer of Ti3〇5 of sample A is prepared, and each corresponding correction of the plated Si〇2 is prepared. The reference wavelength is changed to 420nm, as follows: A joint thick for the first layer: Ti3〇5. Optical film thickness = 〇. 5728 Second layer: Si〇2. Optical film thickness = 〇. 6〇37 Third layer: Ti3〇5. Optical film thickness = 2.3 plus 1 Fourth layer: Si镀2 plating. Optical film thickness = 〇 · 5228 Fifth layer: Ti3 〇 5 plating. Optical film thickness = 1.3893 Sixth layer · · Si〇2. Optical film thickness = 1. 2455 Seventh layer: Ti3〇5. Optical film thickness = 〇. 74 〇〇 Eighth layer: Si〇2. Optical film thickness = 1.5931 Ninth layer: Ti3〇5. Optical film thickness = 1. Lang The tenth layer: Si〇2. Optical film thickness = 0.4940 The eleventh layer: the key Ti3 〇 5. Optical film thickness = 4. 6978 Twelfth layer: Forged Si〇2. Optical film thickness = 1. Thirteenth layer: Ti3〇5. Optical film thickness = 1.953 () Fourteenth layer: Si镀2 plating. Optical film thickness = 1. 9 ribs 6 Fifteenth layer: Ti3〇5. Optical film thickness = 1.2652 Sixteenth layer: Si〇2. Optical film thickness = 2. 2631 Seventeenth layer: Ti3〇5. Optical film thickness = 1.6 〇 6 () Eighteenth layer · · Si 〇 2 plating. Optical film thickness = 3. 7489 (d) Film thickness monitoring and correction. 32 200931977 The film thickness is monitored as sample A, and finally a metal Cr layer with a thickness of 3 nm (Physical thickness) is bonded. Thus, B prepared two samples, sample B1 and sample B2, respectively. The Cr layer of the sample B1 is plated on the same side of the plated dielectric film surface. That is, the Cr layer and the dielectric film layer are plated on the same side of the transparent substrate, and may be referred to as a single-sided bond film. The Ci• layer of sample B2 is on the other side of the plated dielectric film surface, that is, the Cr layer and the dielectric film layer are plated on different sides of the transparent substrate, which may be referred to as double-sided coating. (e) After taking out, the spectrometer is used to test and plot the spectrum completed by sample B: See Figure 9 for the spectrum of sample B. Two curves are shown in Figure 9: the spectral curve Bla of the sample 与 and the sample curve, B2a. The curve Bla shows (1) that there is a peak at 570 nm, so that the outer surface of the sample B is slightly yellow. (2) The visible light transmittance rises to an average of about 27°/. . (3) The infrared transmittance is about 75%. Curve B2a sees that (1) a peak at 570 nm is missing, so that the outer surface of sample B is not slightly yellow. (2) The visible light transmittance increased to an average of about 23%. (3) The infrared transmittance is reduced to about .7 〇〇/0. From the spectrum diagram completed in sample B of Fig. 9 and the design spectrum diagram of sample b in the eighth embodiment, it is seen that the spectral curves of the two graphs have a drop; the penetration rate T% of the visible light 〇 400 nm to 700 nm is 18%, but Figure 9 did rise to about 27% in the visible light range of 400nm to 700nm. On the other hand, the penetration rate τ% of the infrared 780 nm to 1,000 nm portion is reduced from 75 〇/0 to 70%, and the variation range is relatively small. Among them, the phenomenon that the transmittance T% of the visible light in the range of 400 nm to 700 nm rises may be caused by the interference of the Cr plating layer on the plated dielectric film layer. However, as far as the curve Bla and the curve B2a are concerned, the difference between the plated single-sided film and the plated double-sided film is not very large for the effect of the image. Only the double-sided film is used for a relatively large number of man-hours (the other side of the plate is double-plated and then re-plated and then plated on the other side of the 200931977), and the cost is relatively high. Moreover, the film surface on the outer surface of the substrate which is plated on both sides is easily stained and an additional protective film is required. In addition, when recording a single-sided medium, as shown in Figure 9, there will be some obvious convex curves in the visible light (such as at 570nrT1). This is too close to the plating of the multi-layer dielectric and the key metal Cr film. Interference into the multilayer dielectric film. Multi-layer dielectric film and metal coated with double-sided film
Cr膜間隔了一透明基板,影響到多層介電質膜干涉的程度相 對較不大。 樣品B1在外表上以人眼靠近仔細看,相對於樣品B2顯 然也些帶黃綠色色彩。但是,將樣品βΐ依囷四測試可知,在 一般監視器4(非專業高解析度型)上,對攝影機3成像影響不 醫 大(看不出在570nm處有色偏現象)。 如果圖九的曲線Bla在可見光部份曲線高凸點與曲線低 凹點之間的差距太大的話,則有可能在差距間對應的波長產生 此波長對應的「色」偏。簡單說,如果這些差距間對應的波長 大部份落在長波的黃光範圍,則攝影機所攝取的可見光影像會 產生帶有偏「黃」的色彩。 ’ 如有明顯產生色偏時,可以增加膜層數的設計,將囷九 在可見光部份彎彎曲曲的曲線(Ripple)做上下的「拉」平, 減夕其间凸點與低凹點之間.的差距。在本實施中,若透明基板 Ο 採以PIVnv|A時會因為增加膜層數(例如增加到28層),將導 致其產生高溫而會使ΡΜΜΑ變形,初步解決的方式是,再鍍 下一層時的時間間隔稍拉長一點,使有足夠時間降溫。但是, 這解決的方式不是很好(增加鍍膜過程的時間),較好的方弋 ,是重新設計,將膜層數儘量降到最低,如後面所製備的樣^ C 〇 事實上,對於像囷八的设§十,由於不同的链媒機也會有 不同的結果,如前述方法可以電腦再修正或再多作一兩次鍍 實作測試修正。修正後在鍍膜機電腦内存檔,並在往後量 時,儘量以專用的一台鍍膜機生產可取得穩定的產品。 34 200931977 另外,在圖八中鍍Cr層的3nm厚度依最後光譜儀測試, 如測試(如圖四所示Lib)後的穿透率不符理想,則再將鍵 Cr層的厚度減低再鍍一次’直到Lib的穿透率接近於理想值。 接下來看看鍍完金屬Cr膜後有何效果? 請參閱圖十為樣品B1的反射光譜圖。 如圖十的反射光譜圖是以U4100測試繪圖,縱座標為反 射率百分比R%。橫座標為光譜波長(單位nm)。 樣品B1的反射光譜圖中’曲線B10為樣品的正面(無 鍵膜面)反射光譜曲線。曲線B11為樣品B1的背面(锻膜面) 反射光譜曲線。 ❹The Cr film is separated by a transparent substrate, and the degree of interference affecting the multilayer dielectric film is relatively small. Sample B1 was carefully viewed from the human eye on the outside, and was significantly yellowish-green in color relative to sample B2. However, it can be seen from the test of the sample βΐ4 that on the general monitor 4 (non-professional high-resolution type), the imaging effect on the camera 3 is not medically large (the color shift phenomenon at 570 nm is not observed). If the curve Bla of Fig. 9 has a large difference between the high convex point of the visible light portion curve and the low concave point of the curved line, it is possible that the wavelength corresponding to the wavelength produces a "color" deviation corresponding to the wavelength. Simply put, if the wavelengths corresponding to these gaps fall mostly in the yellow light range of the long wave, the visible light image captured by the camera will produce a color with a bias of "yellow". ' If there is a significant color shift, the design of the number of layers can be increased, and the curve of the bend in the visible light portion (Ripple) can be "pull up" up and down, and the bumps and low pits can be reduced. The gap between the two. In this embodiment, if the transparent substrate is PIVnv|A, the number of layers will be increased (for example, increased to 28 layers), which will cause high temperature to cause deformation of the crucible. The initial solution is to plate another layer. The time interval is slightly longer, so that there is enough time to cool down. However, the solution is not very good (increasing the time of the coating process). The better method is to redesign and minimize the number of layers, as is the case prepared later. C In fact, for the image囷 的 § § 10, because different chain media will have different results, such as the above method can be corrected by computer or one more or two plating test correction. After the correction, it will be archived in the coating machine computer, and when it is used later, try to produce a stable product with a dedicated coating machine. 34 200931977 In addition, the thickness of the 3 nm layer of the Cr layer in Figure 8 is tested by the final spectrometer. If the penetration rate after the test (Lib shown in Figure 4) is not satisfactory, then the thickness of the Cr layer is reduced and then plated again. Until the penetration of Lib is close to the ideal value. Next, what effect does it have after plating the metal Cr film? Please refer to Figure 10 for the reflection spectrum of sample B1. The reflection spectrum of Figure 10 is plotted with the U4100 test, and the ordinate is the percentage of reflectance R%. The abscissa is the spectral wavelength (in nm). In the reflection spectrum of sample B1, 'curve B10 is the front side (no bond surface) reflection spectrum curve of the sample. Curve B11 is the back spectrum (forged film surface) of the sample B1. ❹
由曲線B10與曲線B11雙曲線囷中,在可見光部份較低 反射的曲線B11可知,的確可看到鍵金屬cr膜後對可見光部 份具有減反射效果,否則兩曲線應幾乎接近。在紅外光部份反 射曲線也降到約在20%附近。就是說,鍍〇層達到一定程度 對光的「吸收」效果。 請參閱圖Η * —為樣品Β2的反射光譜圖。 如囷十一的反射光譜囷是以U-4100測試繪圖,縱座標為 反射率百分比R%。橫座標為光譜波長(單位nm)。 樣品B2的反射光譜圖中,曲線B2〇為樣品B2的正面(錄 介電質膜面)反射光譜曲線。曲線B21為樣品B2的背面(鍍 金屬Cr膜面)反射光譜曲線。 由曲線B20與曲線B21雙曲線圖很明顯可知,較低反射 的^線B21 ’的確鍍金屬Cr層後具有減反射效果。在紅外光 部份反射曲線也降到約在5%附近。也就是鍍Cr層達到一定 程度「吸收」的效果。 m 與® + _中’圖十對紅外的反射率比較高,這是 多層介電質與錢金屬Cr膜的過於接近4起,影響到多 層介電質膜的干涉。 #樣品B1 _品B2 ’分別置人圖二中鍍膜基材1的位 35 200931977 置,經測試在照度約150Lux環境下,若把黑色軟套32移除 後在影像顯示器4上也看不到鬼影。也就是說,樣品B1與樣 品B2的鍍Cr層吸收了部份的L2b,使在鍍Cr層上的反射光 L2c衰減,衰減到極小,到即使進入攝影鏡頭31也無法再成 經測試在照度約250Lux環境下,若把黑色軟套32移除 後在影像顯示器4上仔細近看還是看不到有明顯的鬼影。 再經測試在照度約500Lux環境下,若把黑色軟套32移 除後,在影像顯示器4上可看到一點不很明顯的鬼影。也就是 說,鍍以層「吸收」的L2c「光能」不夠多。如增加〇層厚 ® 度,雖然可吸收更多的L2c光能,但也會降低反射光Lia與透 射光Lib的比例(如圖八所示)。這時就要再輔以黑色軟套32 的套入攝影機鏡頭31週圍,用以阻止反射光L2C的進入攝影 機鏡頭31。 請再參閱圖九,為了將可見光部份彆弩曲曲的曲線 (Ripple)拉平。事實上,要把在可見光部份曲線高凸點與曲 線低凹點之間的差距拉平,若對同一台鍍膜機的機台,再搭配 更高等級的離子搶與對於鍍膜設計較有設計經驗者,重新設計 製#更少層的膜層也不無可能,現將膜層18層降低到膜層12 Q 層的進階設計: 進階設計之的兩個需求是: (一) 在可見光(4〇〇nm〜7〇〇nm)部份的穿透率τ%,半 均控制在20%。 (二) 在紅外(780nm〜1,〇〇〇nm)部份的穿透率丁〇/〇,平 均控制在95%以上。 請參閱囷十二為樣品C之設計光譜圖。 。/、^十一中縱座標為穿透率百分比了% (Transmittance J °,座〒光譜波長(單位nm)。其他參數為⑴白光環 境、(2)入射角(〇度參考波長為 550nm。 36 200931977 製備樣品C的方法步驟同樣品A、樣品B —樣,為方便 簡化僅就不同的膜材、膜層數與膜厚作敘述:選用的膜材為 Ti〇2、與Si〇2,膜層數12層,光學厚度Nd (為鍍膜膜材折射 率與鍍膜厚度的乘積)部份直接改以鍍膜厚度(Physical thickness)表示0From the curve B10 of the curve B10 and the curve B11, the curve B11 which is reflected lower in the visible light portion can be seen that the key metal cr film can be seen to have an anti-reflection effect on the visible light portion, otherwise the two curves should be close to each other. The reflection curve in the infrared light also drops to around 20%. That is to say, the rhodium-plated layer achieves a certain degree of "absorption" effect on light. See Figure Η * — for the reflection spectrum of sample Β2. The reflection spectrum of 囷11 is plotted on the U-4100 test, and the ordinate is the reflectance percentage R%. The abscissa is the spectral wavelength (in nm). In the reflection spectrum of the sample B2, the curve B2 is the reflection spectrum of the front side (recording dielectric film surface) of the sample B2. Curve B21 is a reflection spectrum curve of the back surface (metal plated Cr film surface) of the sample B2. It is apparent from the hyperbola of curve B20 and curve B21 that the lower reflection line B21' does have an anti-reflection effect after the metal Cr layer is plated. The partial reflection curve in the infrared light also drops to around 5%. That is, the Cr plating layer achieves a certain degree of "absorption" effect. The reflection ratios of m and ® + _ in the figure are relatively high. This is because the multilayer dielectric is too close to the carbon metal Cr film, which affects the interference of the multi-layer dielectric film. #sample B1 _品B2 'Set the position of the coated substrate 1 in Figure 2 respectively. 200931977. After testing, the illuminance is about 150Lux. If the black soft cover 32 is removed, it will not be visible on the image display 4. Ghost. That is to say, the Cr plating layer of the sample B1 and the sample B2 absorbs part of the L2b, so that the reflected light L2c on the Cr-plated layer is attenuated and attenuated to a minimum, so that even if it enters the photographic lens 31, it can no longer be tested in illuminance. Under the environment of about 250Lux, if the black soft cover 32 is removed, the image display 4 can be seen closely and there is no obvious ghost. After the test, in the environment of about 500 Lux, if the black soft cover 32 is removed, a ghost image which is not obvious can be seen on the image display 4. That is to say, L2c "light energy" plated with layers "absorbed" is not enough. If you increase the thickness of the layer, you can absorb more L2c light energy, but it will also reduce the ratio of the reflected light Lia to the transmitted light Lib (as shown in Figure 8). At this time, the black soft cover 32 is inserted around the camera lens 31 to prevent the reflected light L2C from entering the camera lens 31. Please refer to Figure IX again, in order to flatten the curve of the visible light (Ripple). In fact, the gap between the high-bump point of the visible light curve and the low-pitched point of the curve should be flattened. If the machine of the same coating machine is matched with a higher level of ion grab and more design experience for the coating design. It is not impossible to redesign the film layer of less layers. Now reduce the layer of film 18 to the advanced design of layer 12 Q layer: The two requirements of advanced design are: (1) in visible light (4〇〇nm~7〇〇nm) part of the penetration rate τ%, half average is controlled at 20%. (b) The penetration rate in the infrared (780 nm~1, 〇〇〇nm) portion is 〇/〇, and the average is controlled at 95% or more. Please refer to 囷12 for sample C design spectrum. . The vertical coordinate of /, ^11 is the percentage of transmittance (Transmittance J °, the spectral wavelength of the coordinates (in nm). Other parameters are (1) white light environment, (2) incident angle (the reference wavelength of the temperature is 550 nm. 36 200931977 The method steps for preparing sample C are the same as those for sample A and sample B. For the sake of simplicity, only the different membranes, the number of layers and the film thickness are described: the selected membranes are Ti〇2 and Si〇2, and the membrane is selected. The number of layers is 12, and the optical thickness Nd (which is the product of the refractive index of the coated film and the thickness of the coating) is directly changed to the thickness of the coating (Physical thickness).
第一層:鍍Ti〇2。鍍膜厚度=31. 04nm 第二層:鍍Si〇2。鍍膜厚度=68. 82nm 第三層:鍍Ti〇2。鍍膜厚度=48. 84 nm 第四層:鍍Si〇2。鍍膜厚度=48. 79 nm 第五層:鍍Ti〇2。鍍膜厚度=49. 86 nm 第六層:鍍Si〇2。鍍膜厚度=96. 54 nm 第七層:鍍Ti〇2。鍍膜厚度=59. 74 nm 第八層:鍍Si〇2。鍍膜厚度=100. 55 nm 第九層:鐘Ti〇2。鍍膜厚度=58. 06 nm 第十層:鍍Si〇2。鍍膜厚度=141. 89 nm 第十一層:鍍Ti〇2。鍍膜厚度=37.43 nm 第十二層:鍍Si〇2。鍍膜厚度=236. 03 nm 其中Ti〇2 : 在波長400 nm時的折射率為2. 53。 在波長450 nm時的折射率為2. 449。 在波長500 nm時的折射率為2. 397。 在波長550 nm時的折射率為2. 362。 在波長600 nm時的折射率為2. 336。 在波長650 nm時的折射率為2. 318。 在波長700 nm時的折射率為2. 304。 在波長750 nm時的折射率為2. 293。 在波長800 nm時的折射率為2. 284。 在波長850 nm時的折射率為2. 277。 其中Si〇2 : 37 200931977 在波長422 nm時的折射率為1.49。 在波長471. 5 nm時的折射率為1. 48。 在波長540. 5 nm時的折射率為1. 48。 在波長550 nm時的折射率為1. 48。 在波長624. 5 nm時的折射率為1. 47。 在波長753. 5 nm時的折射率為1. 47。 圓十二中有三條曲線’分別為曲線C0為正面〇度入射 角、曲線C30為30度入射角、曲線C45為45度入射角。可看 出當入射角增大時’曲線往短波方向位移。吾人對著正面樣品 C表面看與對著30度斜視樣品C表面看,會看到不同顏色的 表面’在對著45度斜視樣品C表面又看到另一不同的顏色。 請參閱囷十三為樣品C製備後之實際光譜圖。 囷十三中可清楚看到: (一) 在可見光(400nm〜700nm)部份的穿透率το/〇, 平均約在20%。 (二) 在紅外(780nm~1,000nm)部份的穿透率τ%,平 均在95%〜96%之間。 在囷十三的樣品C實際光譜圖與圖十二原始設計光譜圖 的確是很相近。 Φ 對於樣品A、樣品B與樣品C的製備,因為是為了本實施 例的測試’所以對於鍍膜基板1的製備方法包含(a)至(e) 的步驟。 但是’對於以後的量產,例如現階段要量產像樣品C的 錄膜基板1時,是將其膜層(例如12層)的設計資料輸入鍵 膜機的電腦’其他鍍膜過程包含膜厚的監控追縱與修正都是自 動化。吾人選擇了配備齊全的鍍膜機以外,僅要執行步驟(b) 中’選擇適當的透明基板與膜材即可。 請參聞圖十四為鍍膜基板1製備的流程圖。 囷十四包含有: 38 200931977 (a) 輸入製程資料; 將膜層與膜厚設計資料輸入鍍膜機的控制電腦。如圖十 二所示之包含鍍膜基板1的膜層數與各膜層膜厚設計的資料。 (b) 置入待鐘透明基板與膜材; 將一厚度為3腿的透明青板玻璃數片置入夾治具,選用 膜材是Ti〇2與Si〇2置入鍍膜機内的蒸發源(例如坩堝)。 (c) 製程條件設定; 可鍍,之條件的設定包含真空壓力與溫度。例如真空度 需達2x10 torr,因為其透明基板為玻璃所以將溫度調到3〇〇 ,若是採用透明PMMA基板則溫度調設於室溫即可 〇 鍵)。 (d) 監控膜厚與膜層; 以石英膜厚計或是光學膜膜計,測定所鍍的薄膜厚度是 否達到所設計的厚度。以及,膜層是否為到了最後一層(例如 圖十二之說明’其膜層數是否已經到了第12膜層)。3mm的透 明青板玻璃取出前,如溫度調降到約2〇(Tc時開始洩氣(打 入空氣到真空室),靜待冷卻到約50~6(rc時開門取出鍍膜基 板1。若是採以透明PMMA基板的冷鍍處理,則靜待約十幾 分鐘即可取出鍍膜基板1。 φ 綜上敘述,揭露下列: (1)本發明為一種鍍膜基板成像的監視用途,適用於安 全監視攝影’如圖二至少包含有一鍍膜基板1與一監視攝影機 3° + (2)鍍膜基板1為一透明基板的上方鍍有一多層介電質 薄膜。例如樣品A、B、與C。而且可容易控制對入射光的反射 率、透射率(如樣品A、B、與C)與吸收率(如樣品B)。 (3)利用鍍膜基板1的光學干涉,對入射到鍍膜基板1 的可見光L1與紅外光L3分別形成一設定的分光比。 例如可見光L1形成反射光Lla、透射光Lib與紅外光L3 39 200931977 形成反射光L3a、透射光L3b、透射光L3c。如圖四所示。 其中,僅就鍍膜基板1對本實施例的應用而言,較重要 的是對入射可見光L1的反射光Lla,與對入射紅外光L3的透 射光L3c。因為,反射光Lla關係到鍍膜基板1的鏡面反射效 果。而透射光L3c關係到鍍膜基板1的紅外成像品質。 (4) 為了阻止反射光L2c與透射光Lib —起進入攝影鏡 頭31,造成重疊的影像。該鍍膜基板上更包含一鍍金屬Cr層 或鍵抗眩AG層、一黑色軟套32與一雙濾光片切換裝置。其中 雙濾光片係為一紅外通過渡光片與一紅外截止遽光片。 (5) —種監視用途的鍍膜基板成像,在實際的應用上更 〇 包含有一不透光的殼體2,如圖四。 (6) 鍍膜基材1的背部可披覆一不透光層,此披覆的不 透光層保留有一缺口,此缺口作為攝影機3鏡頭31的窗口。 使在應用上可取代上述(5)的不透光的殼髏2。 (7 )當紅外光的穿透率都在95%以上(例如95%〜99% ) 時,稱為極高透射率。此「極」字乃是相對於鍵金屬膜的低透 ^率而加重強調之詞。此之所以加重強調是以其「紅外光的極 面穿透率是本發明的技術特徵」之一。 如果鍍膜基板1與鍍金屬膜基板對入射光的穿透率一樣 © 均約為20%的狀況下,則鍍金屬基板對紅外的穿透率也相差 不多約僅20%。就以同一紅外光源5來測試,如圖四所示, 紅外光源5幅射的紅外L3,碰到物體A再反射再次穿透鍍膜 基板1 ’其最後進入攝影機鏡頭31成像的透射光L3c,剩下約 (0· 96*0. 96=0. 92)九成光能。反觀,鍍金屬基板確僅剩下約 (〇· 2*0. 2=0. 04 )不到〇· 5成光能。也就是說,如囷四對鍍膜 基板1與鍍金屬基板兩者的紅外夜視距離,兩者幾乎相差二 二倍(0.92/0.04=23)之多。 若如圖四中把紅外光源5置放於殼體2外部,則對艘膜 基板1與鍍金屬基板兩者的紅外夜視距離,兩者幾乎僅相差約 200931977 五倍(0.96/0· 20=4. 8)。 如果把夜視用的輔助紅外光源與攝影機鏡頭組合在一起 後,再置入同一鋁製的殼體内的日夜型的防盜監視攝影機,顯 然,不適合把鍍金屬基板當作隱藏裝飾的遮罩。如果為了達到 隱藏裝飾的目的硬是要裝置鍍金屬基板,例如先前的專利證號 M326646所製成的鍵鋁基板,則僅能在日間(或環境照度充 足的地方)使用,夜間(或環境照度不充足的地方)就難發揮 其夜視攝影的功效。 總體說來,包含本實施例製備的鍍膜基板1與本實施例 所述監視攝影機3組合的裝置,如上面所述,鍍膜基板1的反 © 射光Lla呈現高反射鏡面使監視攝影機3達到偽裝隱藏的效 果,因此具有「不易被偷竊破壞或被刻意迴避其監視地點」的 功能以外;同時,兼顧有鍍膜基板1對紅外呈現極高的穿透率 (約96%) ’使之可以達到「夜間可攝取高品質紅外影像 果。 也就是說,本發明對於日夜型的防盜監視攝影機,在監 控用途上,已經達到了「可隱藏裝飾的日夜型成像與可攝取 品質紅外影像」之不可預期的效果。 41 200931977 【圖式簡單說明】 圊一為薄膜(鍍膜膜材)反射率與光學厚度的變化關係 圖。 圖二為本實施例裝置應用示意圖一。 圖三為本實施例裝置應用示意圖二。 圖四為本實施例裝置應用示意圖三。 圖四A為紅外黑色遮罩示意圖。 圖四B為三原色光與三色料關係示意圖。 圖五為樣品A的電腦上模擬設計光譜圖。 圖六為設計樣品A第一次鍍後的實際光譜圖。 〇 圖七為設計樣品A第二次鍍後的實際光譜圖。 圖八為本實施例樣品B的設計光譜圖。 圖九為樣品B完成的光譜圖。 圖十為樣品B1的反射光譜圊。 圖十一為樣品B2的反射光譜圖。 圖十二為樣品C之設計光譜圖。 圖十三為樣品C製備後之實際光譜圖。 圖十四為鍍膜基板1製備的流程圖。 ❹ 42 200931977 【主要元件符號說明】 λο波長 L1入射光 Lla反射光 Lib透射光 L2入射光 L2a透射光 L2b反射光 L2c反射光 L3紅外幅射 L3a紅外反射光 L3b紅外反射光 L3c紅外透射光 L4入射光 L4a反射光 L4b透射光 1鍍膜基材 2不透光的殼體 ❹ 21殼體2的内部表面 3攝影機 31鏡頭 32黑色軟套 4影像顯示器 5紅外光源 51黑色遮罩片 〇 43The first layer: Ti〇2. Coating thickness = 31. 04 nm Second layer: Si〇2 plating. Coating thickness = 68. 82 nm The third layer: Ti〇2. Coating thickness = 48. 84 nm Fourth layer: Si〇2. Coating thickness = 48. 79 nm Fifth layer: Ti〇2. Coating thickness = 49. 86 nm Sixth layer: Si〇2. Coating thickness = 96. 54 nm The seventh layer: Ti〇2. Coating thickness = 59. 74 nm The eighth layer: Si〇2. Coating thickness = 100. 55 nm The ninth layer: clock Ti〇2. Coating thickness = 58. 06 nm Tenth layer: Si〇2. Coating thickness = 141. 89 nm The eleventh layer: Ti〇2. Coating thickness = 37.43 nm Twelfth layer: Si〇2 plating. The coating has a refractive index of 2.53 at a wavelength of 400 nm. The refractive index at a wavelength of 450 nm is 2.449. The refractive index at a wavelength of 500 nm is 2.397. The refractive index at a wavelength of 550 nm is 2.362. The refractive index at a wavelength of 600 nm is 2.336. The refractive index at a wavelength of 650 nm is 2.318. The refractive index at a wavelength of 700 nm is 2.304. The refractive index at a wavelength of 750 nm is 2.293. The refractive index at a wavelength of 800 nm is 2.284. The refractive index at a wavelength of 850 nm is 2.277. Among them, Si〇2: 37 200931977 has a refractive index of 1.49 at a wavelength of 422 nm. The refractive index at a wavelength of 471.5 nm is 1.48. The refractive index at a wavelength of 540.5 nm is 1.48. The refractive index at a wavelength of 550 nm is 1.48. The refractive index at a wavelength of 624.5 nm is 1.47. The refractive index at the wavelength of 753.5 nm is 1.47. There are three curves in the circle twelve, respectively, the curve C0 is the front angle incident angle, the curve C30 is the 30 degree incident angle, and the curve C45 is the 45 degree incident angle. It can be seen that when the incident angle increases, the curve shifts in the short-wave direction. When we look at the surface of the positive sample C and look at the surface of the sample C facing the 30-degree squint, we will see a different color of the surface. Another different color is seen on the surface of the sample C opposite to the 45-degree squint. Please refer to 囷13 for the actual spectrum after preparation of sample C. It can be clearly seen in 囷13: (1) The transmittance το/〇 in the visible light (400nm~700nm) part is about 20% on average. (2) The transmittance τ% in the infrared (780 nm to 1,000 nm) portion is between 95% and 96%. The actual spectrum of sample C in 囷13 is indeed very similar to the original design spectrum of Fig. 12. Φ For the preparation of the sample A, the sample B, and the sample C, the test for the coated substrate 1 includes the steps (a) to (e). However, for the subsequent mass production, for example, when the film recording substrate 1 like the sample C is mass-produced at this stage, the design data of the film layer (for example, 12 layers) is input into the computer of the bonding machine. The other coating process includes the film thickness. The monitoring and correction of the monitoring is automated. In addition to the fully equipped coater, we only need to perform the step (b) to select the appropriate transparent substrate and film. Please refer to FIG. 14 for a flow chart of the preparation of the coated substrate 1.囷14 contains: 38 200931977 (a) Input process data; input the film and film thickness design data into the control computer of the coater. The material including the number of layers of the coated substrate 1 and the film thickness of each film layer as shown in Fig. 12 is shown. (b) Inserting the transparent substrate and the film to be placed in the bell; placing a number of transparent green plate glass with a thickness of 3 legs into the fixture, and selecting the evaporation material of the film Ti〇2 and Si〇2 into the coating machine (eg 坩埚). (c) Process condition setting; can be plated, the conditions are set to include vacuum pressure and temperature. For example, the degree of vacuum needs to be 2x10 torr, because the transparent substrate is made of glass, so the temperature is adjusted to 3 〇〇. If the transparent PMMA substrate is used, the temperature can be adjusted to room temperature. (d) Monitor film thickness and film layer; determine whether the thickness of the plated film reaches the designed thickness by quartz film thickness gauge or optical film meter. And, whether the film layer is at the last layer (for example, the description of Fig. 12), whether the number of film layers has reached the 12th film layer. Before the 3mm transparent blue plate glass is taken out, if the temperature is lowered to about 2 〇 (Tc starts to deflate (inject air into the vacuum chamber), and wait for cooling to about 50~6 (when opening the door, remove the coated substrate 1. If it is After the cold-plating treatment of the transparent PMMA substrate, the coated substrate 1 can be taken out for about ten minutes. φ In summary, the following are disclosed: (1) The present invention is a monitoring application for imaging a coated substrate, and is suitable for security surveillance photography. Figure 2 includes at least one coated substrate 1 and a surveillance camera 3° + (2) The coated substrate 1 is a transparent substrate coated with a multilayer dielectric film, such as samples A, B, and C. Reflectance, transmittance (such as samples A, B, and C) and absorption rate (such as sample B) of incident light. (3) Visible light L1 and infrared incident on the coated substrate 1 by optical interference of the coated substrate 1. The light L3 respectively forms a set split ratio. For example, the visible light L1 forms the reflected light L1a, the transmitted light Lib, and the infrared light L3 39 200931977 forms the reflected light L3a, the transmitted light L3b, and the transmitted light L3c, as shown in Fig. 4. Coating substrate 1 for this embodiment For the application, it is more important that the reflected light Lla of the incident visible light L1 and the transmitted light L3c of the incident infrared light L3 are because the reflected light Lla is related to the specular reflection effect of the coated substrate 1. The transmitted light L3c is related to Infrared imaging quality of the coated substrate 1. (4) In order to prevent the reflected light L2c from entering the photographic lens 31 together with the transmitted light Lib, the overlapping image is formed. The coated substrate further includes a metal-plated Cr layer or a key anti-glare AG layer. A black soft cover 32 and a pair of filter switching devices, wherein the dual filter is an infrared passering plate and an infrared cut-off film. (5) Imaging of the coated substrate for monitoring purposes, in actual The application further comprises an opaque casing 2, as shown in Fig. 4. (6) The back of the coated substrate 1 may be covered with an opaque layer, and the opaque layer of the coating retains a notch, the gap As the window of the lens 3 of the camera 3, it can replace the opaque shell 2 of the above (5) in application. (7) When the transmittance of infrared light is above 95% (for example, 95% to 99%) When it is called extremely high transmittance, this "pole" is relative to the key metal. The low transmittance rate emphasizes the emphasis. This is emphasized by the fact that "the polar surface transmittance of infrared light is one of the technical features of the present invention". If the coated substrate 1 and the metallized film substrate are incident on the light The same penetration rate is about 20%, the penetration rate of the metal-plated substrate to the infrared is also about 20%. It is tested with the same infrared source 5, as shown in Figure 4, the infrared source The infrared L3 of 5 radiation hits the object A and then re-reflects through the coated substrate 1 '. Finally, it enters the transmitted light L3c imaged by the camera lens 31, leaving about (0·96*0. 96=0. 92) 90% Light energy. On the other hand, the metal-plated substrate does only have about (〇·2*0. 2=0. 04) less than 〇·5 into the light energy. That is to say, if the infrared night vision distance between the coated substrate 1 and the metallized substrate is almost the same, the difference between the two is almost twice (0.92/0.04 = 23). If the infrared light source 5 is placed outside the casing 2 as shown in FIG. 4, the infrared night vision distance between the film substrate 1 and the metal plated substrate is almost only five times different from that of 200931977 (0.96/0·20). =4. 8). If the auxiliary infrared light source for night vision is combined with the camera lens and then placed in the same aluminum housing, the day and night type anti-theft surveillance camera is obviously not suitable for the metal-plated substrate as a hidden decorative mask. If the purpose of hiding the decoration is to install a metallized substrate, such as the key aluminum substrate made by the previous patent number M326646, it can only be used during the day (or where the ambient illumination is sufficient), at night (or the ambient illumination is not It is difficult to play the role of night vision photography in ample places. In general, the apparatus including the coated substrate 1 prepared in the present embodiment and the monitoring camera 3 of the present embodiment is combined as described above, and the anti-light Lla of the coated substrate 1 exhibits a highly reflective mirror surface to cause the surveillance camera 3 to be camouflaged and hidden. The effect is that it has the function of "not easily stolen by theft or deliberately evading its monitoring location"; at the same time, the coated substrate 1 has a very high transmittance (about 96%) for the infrared light, so that it can reach "nighttime" The high-quality infrared image can be ingested. That is to say, the present invention has achieved the unpredictable effect of the "day and night imaging and the ingestible quality infrared image of the concealable decoration" for the day and night type anti-theft surveillance camera. . 41 200931977 [Simple description of the diagram] The first one is the relationship between the reflectivity of the film (coated film) and the optical thickness. FIG. 2 is a schematic diagram 1 of the device application of the embodiment. FIG. 3 is a schematic diagram 2 of the application of the device in this embodiment. FIG. 4 is a schematic diagram 3 of the apparatus application of the embodiment. Figure 4A is a schematic diagram of an infrared black mask. Figure 4B is a schematic diagram showing the relationship between the three primary colors and the three colors. Figure 5 is a simulated design spectrum of the sample A on a computer. Figure 6 is the actual spectrum of the design sample A after the first plating. 〇 Figure 7 shows the actual spectrum of the second sample after design sample A. Figure 8 is a design spectrum diagram of Sample B of the present example. Figure 9 is a spectrum of the completion of Sample B. Figure 10 is the reflection spectrum 样品 of sample B1. Figure 11 is a reflection spectrum of sample B2. Figure 12 is a design spectrum of sample C. Figure 13 is the actual spectrum after preparation of Sample C. Figure 14 is a flow chart showing the preparation of the coated substrate 1. ❹ 42 200931977 [Description of main component symbols] λο wavelength L1 incident light Lla reflected light Lib transmitted light L2 incident light L2a transmitted light L2b reflected light L2c reflected light L3 infrared radiation L3a infrared reflected light L3b infrared reflected light L3c infrared transmitted light L4 incident Light L4a reflected light L4b transmitted light 1 coated substrate 2 opaque housing ❹ 21 inner surface of housing 2 camera 31 lens 32 black soft sleeve 4 image display 5 infrared light source 51 black mask sheet 〇 43
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TW (1) | TWI423676B (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103487838A (en) * | 2012-06-11 | 2014-01-01 | 原相科技股份有限公司 | Packaging structure of optical device |
TWI467777B (en) * | 2012-06-06 | 2015-01-01 | Pixart Imaging Inc | Optical device package structure |
CN107222691A (en) * | 2017-07-14 | 2017-09-29 | 漳州市东方智能仪表有限公司 | Portable chassis security monitoring mirror detector |
CN110361909A (en) * | 2019-08-19 | 2019-10-22 | 深圳海森堡科技有限公司 | Integrated eyeglass and manufacturing method |
TWI691742B (en) * | 2019-02-01 | 2020-04-21 | 光芒光學股份有限公司 | Lens |
Families Citing this family (1)
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TWI666935B (en) * | 2017-07-12 | 2019-07-21 | 謝基生 | A mini thermography for enhance nir captures images |
Family Cites Families (4)
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US5089700A (en) * | 1990-01-30 | 1992-02-18 | Amdata, Inc. | Apparatus for infrared imaging inspections |
US5352329A (en) * | 1993-12-09 | 1994-10-04 | Xerox Corporation | Removing portions of imaging member layers from a substrate |
FR2867273B1 (en) * | 2004-03-04 | 2006-09-08 | Commissariat Energie Atomique | METHOD FOR PRODUCING A DEVICE FOR THE THERMAL DETECTION OF A RADIATION COMPRISING AN ACTIVE MICROBOLOMETER AND A PASSIVE MICROBOLOMETER |
FR2885690B1 (en) * | 2005-05-12 | 2007-06-15 | Commissariat Energie Atomique | THERMAL DETECTOR FOR ELECTROMAGNETIC RADIATION AND INFRARED DETECTION DEVICE COMPRISING SUCH DETECTORS |
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI467777B (en) * | 2012-06-06 | 2015-01-01 | Pixart Imaging Inc | Optical device package structure |
US9599745B2 (en) | 2012-06-06 | 2017-03-21 | Pixart Imaging Incorporation | Package structure of optical apparatus |
CN103487838A (en) * | 2012-06-11 | 2014-01-01 | 原相科技股份有限公司 | Packaging structure of optical device |
CN103487838B (en) * | 2012-06-11 | 2016-11-02 | 原相科技股份有限公司 | Packaging Structure of Optical Devices |
CN107222691A (en) * | 2017-07-14 | 2017-09-29 | 漳州市东方智能仪表有限公司 | Portable chassis security monitoring mirror detector |
TWI691742B (en) * | 2019-02-01 | 2020-04-21 | 光芒光學股份有限公司 | Lens |
CN111522186A (en) * | 2019-02-01 | 2020-08-11 | 光芒光学股份有限公司 | lens |
US11237309B2 (en) | 2019-02-01 | 2022-02-01 | Rays Optics Inc. | Lens |
CN111522186B (en) * | 2019-02-01 | 2023-11-03 | 光芒光学股份有限公司 | lens |
CN110361909A (en) * | 2019-08-19 | 2019-10-22 | 深圳海森堡科技有限公司 | Integrated eyeglass and manufacturing method |
Also Published As
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