TW200937671A - Semiconductor light-emitting device - Google Patents
Semiconductor light-emitting device Download PDFInfo
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- TW200937671A TW200937671A TW97106192A TW97106192A TW200937671A TW 200937671 A TW200937671 A TW 200937671A TW 97106192 A TW97106192 A TW 97106192A TW 97106192 A TW97106192 A TW 97106192A TW 200937671 A TW200937671 A TW 200937671A
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- layer
- light
- semiconductor material
- conductive
- emitting device
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 105
- 239000000463 material Substances 0.000 claims abstract description 82
- 239000000758 substrate Substances 0.000 claims abstract description 15
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 11
- 229910002601 GaN Inorganic materials 0.000 claims description 10
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 10
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 7
- 229910052733 gallium Inorganic materials 0.000 claims description 7
- -1 polymide Chemical compound 0.000 claims description 6
- 239000004020 conductor Substances 0.000 claims description 5
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052596 spinel Inorganic materials 0.000 claims description 2
- 239000011029 spinel Substances 0.000 claims description 2
- 239000011787 zinc oxide Substances 0.000 claims 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims 2
- 239000011810 insulating material Substances 0.000 claims 2
- 238000005121 nitriding Methods 0.000 claims 2
- 229910052707 ruthenium Inorganic materials 0.000 claims 2
- 239000004575 stone Substances 0.000 claims 2
- 229910005540 GaP Inorganic materials 0.000 claims 1
- 229910004541 SiN Inorganic materials 0.000 claims 1
- PTNUCGGNFGHPPW-UHFFFAOYSA-N bis(magnesiomagnesio)magnesium Chemical compound [Mg][Mg][Mg][Mg][Mg] PTNUCGGNFGHPPW-UHFFFAOYSA-N 0.000 claims 1
- 229910052797 bismuth Inorganic materials 0.000 claims 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims 1
- 238000003763 carbonization Methods 0.000 claims 1
- 238000005266 casting Methods 0.000 claims 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 claims 1
- 229910052741 iridium Inorganic materials 0.000 claims 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims 1
- 239000012280 lithium aluminium hydride Substances 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 238000000605 extraction Methods 0.000 description 7
- 229910052729 chemical element Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 241000283690 Bos taurus Species 0.000 description 1
- 241000255925 Diptera Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 241000282320 Panthera leo Species 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- GSWGDDYIUCWADU-UHFFFAOYSA-N aluminum magnesium oxygen(2-) Chemical compound [O--].[Mg++].[Al+3] GSWGDDYIUCWADU-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- YQNQTEBHHUSESQ-UHFFFAOYSA-N lithium aluminate Chemical compound [Li+].[O-][Al]=O YQNQTEBHHUSESQ-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229940028444 muse Drugs 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 210000004508 polar body Anatomy 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- GMVPRGQOIOIIMI-DWKJAMRDSA-N prostaglandin E1 Chemical class CCCCC[C@H](O)\C=C\[C@H]1[C@H](O)CC(=O)[C@@H]1CCCCCCC(O)=O GMVPRGQOIOIIMI-DWKJAMRDSA-N 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical group [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
200937671 九、發明說明: 【發明所屬之技術領域】 本發明係關於-種半導體發光元件㈣他⑺秦攸%ht_ 具有高度光取出效率之半導 【先前技術】 ❹ 今半^體發光70件(例如’發光二極體)的應用領域已 ί 統、手機螢幕背光模組、車輛照明系 被廣ίί“飾ΐ遙控領域等產品,皆見到半_發光元件 功:了讓半導體發光元件儘可能地確保較高的 比月i交f的能源消耗’因此對於半導體發光元件 efficiency)。身自0外#里子效率⑽temal qua_m 邻旦;體發光元件的外部量子效率與其本身的内 脂内部發出至周圍空氣或是封裝的環氧樹 時所發^的損耗。造決於當韓射離開元件内部 成元件之矣而思ΛΛ ί上述知耗的主要原因之一係導因於形 coefficient) ^導▲光在料具有高折射係數扣― 而無法發射表面產生全反射_她ction) 外部量子效率亦隨之&出效率提昇’則半導體發光元件的 所示請iS:體知的發光二極體1。如圖-發仏Η以及電極18。為了導通p々pe氮化^ 200937671 16及N-type氮化鎵12以使發光二極體i運作,其中一個命 極18係形成於P-type氮化鎵16上,另外一個電極18係形】 於N-type氮化鎵12上。於形成另外一個電極18之前,發 一極體1需透過蝕刻製程以部份蝕刻p_ty氮化錁 區Μ以及抑Pe氮化鎵12。之後,另二個電^係^ 於N-type亂化鎵12之曝露的部份上。然而,如圖_所示, 由於發光d Μ被部份侧,因此發光二極體丨不但出光 大幅減少,並且其發光效率亦降低許多。 、 雖朗目前為止已經有許多種不同結構的發光二極 Ϊ二 發光二極體之光取出效率及使得發 一本體有見廣及均勻的出光一直是不斷被研究的議 此本發明之主要範臂在於提供一種半導 解決上述之問題。 &兀研以 【發明内容】 本發明之一範疇在於提供一種半導體發光元件。 件具有高度絲姐率,並且錢發射蚊廣及均勻 ❾ 於根據本發明之一具體實施例中,半導體 基板(一)、第-傳導型態權材料層、 半導體材料層、發光層(light-emitting layer)、第— 二 电極以及複數個凸狀結構(bump structure)。 第一傳導型態半導體材料層係形成於基板 型態半導?材料層具有上表面,並且上表面=第f = 及不同於第-d域之第二輯。第—電極係形成於第二區 材料層係形成於發光層上。第二電極係形成於第二 7 200937671 半導體材料層上。进# / 導體材料A之^複數健狀結構係形成於第-傳導型態半 間。 面上並且介於第一區域以及第二區域之 侧壁1、或者至二個凹陷(recess)係形成於每一個凸狀結構的 大致上呈纟^ —具體實施财’每—個凸狀結構的側壁 入双上具有一弧形的輪廓。 附圖明^優點與精神可以藉由以下的發明詳述及所 附π式传·到進一步的瞭解。200937671 IX. Description of the invention: [Technical field of invention] The present invention relates to a semiconductor light-emitting element (4) He (7) Qin 攸 % ht_ semi-conducting with high light extraction efficiency [Prior Art] 今 Today half body light 70 pieces ( For example, the application field of 'light-emitting diodes' has been illuminated, mobile phone screen backlight modules, and vehicle lighting systems have been widely used in the field of remote control, and all of them have seen half-light-emitting components: let the semiconductor light-emitting components be as The ground ensures a higher energy consumption than the monthly energy f. Therefore, for the semiconductor light-emitting element efficiency. From 0 outside the neutron efficiency (10) temal qua_m neighboring denier; the external quantum efficiency of the bulk light-emitting element and its own internal grease is emitted to the surroundings The loss caused by the air or the encapsulated epoxy tree is determined by the fact that when the Korean shot leaves the component inside the component, one of the main reasons for the above-mentioned knowledge is due to the shape coefficient. Light in the material has a high refractive index buckle - and can not emit surface to produce total reflection _ her ction) External quantum efficiency is also followed by & efficiency improvement' then the semiconductor light-emitting element shown i S: a well-known light-emitting diode 1. As shown in the figure - the hairpin and the electrode 18. In order to turn on the p々pe nitride ^ 200937671 16 and the N-type gallium nitride 12 to operate the light-emitting diode i, one of them The life pole 18 is formed on the P-type gallium nitride 16 and the other electrode 18 is formed on the N-type gallium nitride 12. Before forming another electrode 18, the polar body 1 is required to pass through an etching process. Partially etching the p_ty tantalum nitride region and suppressing Pe gallium nitride 12. After that, the other two electrons are on the exposed portion of the gallium 12 by the N-type. However, as shown in FIG. The light-emitting diode is partially on the side, so that the light-emitting diode is not only greatly reduced in light output, but also has a much lower luminous efficiency. Although Lang has so far, there are many different structures of light-emitting diodes and two light-emitting diodes. The extraction efficiency and the wide and uniform light emission of the main body have been continuously studied. The main arm of the present invention is to provide a semi-conductor to solve the above problems. [Inventive] The present invention One category is to provide a semiconductor light-emitting element. And the money-emitting mosquito is broad and uniform. In one embodiment of the present invention, the semiconductor substrate (1), the first-conductivity type material layer, the semiconductor material layer, the light-emitting layer, the first- a second electrode and a plurality of bump structures. The first conductive type semiconductor material layer is formed on the substrate type semiconductor material layer having an upper surface, and the upper surface = the f = and different from the -d The second series of the first electrode is formed on the light-emitting layer in the second region, and the second electrode is formed on the second semiconductor layer of 200937671. Into the conductor material A, the complex structure is formed in the first-conducting type half. The surface and the first side and the second side of the second area, or two recesses, are formed in each of the convex structures substantially in the form of a concrete structure. The side wall has a curved profile on the double. BRIEF DESCRIPTION OF THE DRAWINGS Advantages and spirits will be further understood by the following detailed description of the invention and the appended claims.
【實施方式】 閱圖二A。圖二A係繪示根據本發明之一具體實施 例之半V體發光元件2之截面視圖。 、^圖二A所示,半導體發光元件2包含基板2〇、第一傳 導型悲半導體材料層22、發光層24、第二傳導型態半導體材 料層26、第一電極30、第二電極32以及複數個凸狀結構 28 ° 於實際應用中’基板20可以是玻璃(si〇2)、矽(Si)、鍺 (Ge)、氮化鎵(GaN)、砷化鎵(GaAs)、磷化鎵(GaP)、氮化鋁 (A1N)、藍寶石(sapphire)、尖晶石(spinel)、三氧化二鋁 (Al2〇3)、碳化矽(SiC)、氧化鋅(ZnO)、氧化鎂(MgO)、二氧化 鋰鋁(UAl〇2)、二氧化鋰鎵(UGa02)或四氧化鎂二鋁 (MgAl204),但不以此為限。 於一具體實施例中,第一傳導型態半導體材料層22及第 二傳導型態半導體材料層26可以由III-V族化合物半導體材 料所製成。 8 200937671 III-V族化合物半導體材料内之III族化學元素可以是銘 (A1)、鎵(Ga)或銦(In)等元素。III-V族化合物半導體材料内之 V族化學元素可以是氮(N)、磷(P)或砷(As)等元素。於此實施 例中’第一傳導型態半導體材料層22及第二傳導型態半導體 材料層26可以由氛化鎵製成。[Embodiment] FIG. 2A is read. Fig. 2A is a cross-sectional view showing a half V body light-emitting element 2 according to an embodiment of the present invention. As shown in FIG. 2A, the semiconductor light emitting device 2 includes a substrate 2, a first conductive type semiconductor material layer 22, a light emitting layer 24, a second conductive type semiconductor material layer 26, a first electrode 30, and a second electrode 32. And a plurality of convex structures 28 ° In practical applications, the substrate 20 may be glass (si〇2), germanium (Si), germanium (Ge), gallium nitride (GaN), gallium arsenide (GaAs), phosphating. Gallium (GaP), aluminum nitride (A1N), sapphire, spinel, aluminum oxide (Al2〇3), tantalum carbide (SiC), zinc oxide (ZnO), magnesium oxide (MgO) ), lithium aluminum oxide (UAl〇2), lithium gallium dioxide (UGa02) or magnesium aluminum oxide (MgAl204), but not limited thereto. In one embodiment, the first conductive type semiconductor material layer 22 and the second conductive type semiconductor material layer 26 may be made of a III-V compound semiconductor material. 8 200937671 Group III chemical elements in III-V compound semiconductor materials may be elements such as Ming (A1), gallium (Ga) or indium (In). The Group V chemical element in the III-V compound semiconductor material may be an element such as nitrogen (N), phosphorus (P) or arsenic (As). In this embodiment, the first conductive type semiconductor material layer 22 and the second conductive type semiconductor material layer 26 may be made of gallium arsenide.
❹ 苐一傳導型版半導體材料層22係形成於基板20上,並 且弟一傳導型態可以是N型態。換言之,第一傳導型態半導 體材料層22為N型態氮化鎵接觸層。第一傳導型態半導體 材料層22具有上表面220,並且上表面220包含第一區域 2200以及不同於第一區域2200之第二區域2202。第一電極 30係形成於第一區域2200上’並且發光層24係形成於第二 區域2202上。第一電極30即為N型態電極。 第二傳導型態半導體材料層26係形成於發光層%上。 對應於第一傳導型態半導體材料層22,第二傳導型態半導體 材料層26係P型態,亦即p型態氮化鎵接觸層。g二電極 32可以形成於第二傳導型態半導體材料層%上,並且 電極32即為P型態電極。 #一 如圖二A所示,複數個凸狀結構28係形成於第一 型態半導體材料層22之上表面22〇上並且介於第 2200—以及第二區域2搬之間。於實際應用中,從頂^ ^ ’母一個凸狀結構28可以呈現圓柱狀、橢圓狀及多邊^ 寻0 特別地,至少 —丨uu阽πυϋ係形成於每一個凸狀姓 28的侧壁。於此實施例中’每—個凸狀結構28 === 鑛齒形’因此其侧壁形成複數個凹陷2_ ^ m_〇1〇gy)。赫閱圖二Β。圖二Β係繪示根據本發日心 9 200937671 一具體實施例之半導體發光元件2之截面視圖。於另一具體 實施例中,每一個凸狀結構28的側壁大致上可以具有弧形的 輪廓。 假設每了個凸狀結構28的側壁具有筆直的輪廓,並且側 壁與第一傳導型態半導體材料層22之上表面220之夾角等於 90度’則由發光層24所發出的光線將被侷限在凸狀結構% 與半導體發光元件2之主體間來回反射。然而,如圖二a及 圖二B所示,由於本發明中之每一個凸狀結構28的側壁具 ❹A conductive semiconductor material layer 22 is formed on the substrate 20, and the conduction type may be an N-type. In other words, the first conductive type semiconductor material layer 22 is an N-type gallium nitride contact layer. The first conductive type semiconductor material layer 22 has an upper surface 220, and the upper surface 220 includes a first region 2200 and a second region 2202 different from the first region 2200. The first electrode 30 is formed on the first region 2200' and the light-emitting layer 24 is formed on the second region 2202. The first electrode 30 is an N-type electrode. The second conductive type semiconductor material layer 26 is formed on the light-emitting layer %. Corresponding to the first conductive type semiconductor material layer 22, the second conductive type semiconductor material layer 26 is a P-type, that is, a p-type gallium nitride contact layer. The g-electrode 32 may be formed on the second conductive type semiconductor material layer %, and the electrode 32 is a P-type electrode. #一 As shown in Fig. 2A, a plurality of convex structures 28 are formed on the upper surface 22 of the first type semiconductor material layer 22 and between the second and second regions. In practical applications, a convex structure 28 from the top ^ ^ ' may be cylindrical, elliptical, and polygonal. In particular, at least - 丨uu 阽 υϋ is formed on the side wall of each convex name 28 . In this embodiment, 'every convex structure 28 === mineral tooth shape' thus forms a plurality of depressions 2_^m_〇1〇gy) on the side walls thereof. He read the picture two. Fig. 2 is a cross-sectional view showing a semiconductor light emitting element 2 according to a specific embodiment of the present invention. In another embodiment, the side walls of each of the convex structures 28 may have a generally arcuate profile. Assuming that the sidewall of each convex structure 28 has a straight contour and the angle between the sidewall and the upper surface 220 of the first conductive type semiconductor material layer 22 is equal to 90 degrees, the light emitted by the light-emitting layer 24 will be limited to The convex structure % is reflected back and forth between the main body of the semiconductor light emitting element 2. However, as shown in Figs. 2a and 2B, since the side wall of each of the convex structures 28 in the present invention has
有粗板的表面形恶或孤形的輪廓,因此部份側壁與第一傳導 型態半^體材料層22之上表面22〇之夾角0可以大於或小於 90度。藉此,由發光層24所發出的光線,尤其是侧光,在 射向凸狀結構28後可以被凸狀結構28的側壁反射並改變其 行進方向’以增加光線由半導體發光元件2之出光^ (observation side)射出之機率。 ,除了側光取出率提高之外,假設半導體發光元件2之出 光面朝上,則由發光層所射出朝向半導體發光元件2内 部之光線在反射後並射向複數個凸狀結構28時,光線以 被凸狀結構28導向絲面射出。除此之外,若複數個凸狀结 構28均勻地分佈於第-傳導鶴半導體材料層22之上表 220上,半導體發光元件2將可以產生較寬廣且均勾 光0 為了避免由發光層24所發出的光線被第一電極 Ϊ π每二固ΓΪί 28的高度可以大致上等於或高於第-ΐ 料芦表,糾第—料·半導體材 二之上表面22G為參考面,第—電極3()之縣面 ;有f D1 ’每-個凸狀結構28之頂表面28()具有高度 ,、且D2大致上可以等於以或大於以雜擒光線射$ 10 200937671 第一電極30。 々凊參閱圖三。圖三係繪示於一具體實施例中根據本發明 f母二個凸狀結構28的組成之示意圖。圖三係繪示一範例以 =不個凸狀結構28可以由第一傳導型態半導體材料層 去第二傳導型態半導體材料層26以及發光層24所組成。 ii,每—個凸狀結構28可以完全由第一傳導型態半導體材 二所組成。需注意的是,為了避免由半導體發光元件2 ❹ ❹ 體所發射的光線被吸收,圖三中每一個凸狀結構%的發 光層24進一步可以被移除。 ㈣具體實施例中,如圖四A所示,為了將光線更有 每―個凸狀結構28可以由折射率大於1之特定 材枓所衣成。迫種材料可以是IT〇、si〇2、SiN、Zn〇、 ==ide ; BCB、SQG、Ιη〇、Sn〇、财族化合物半導體 族化合物半導體材料,但不以此為限。m-v族 =,轉體材料内之m族化學元素及ν族轉 述。㈣族化合物巾之11族化學元素可以是鈹There is a rough surface or a solitary contour, so that the angle between the side wall and the upper surface 22 of the first conductive type layer 22 may be greater than or less than 90 degrees. Thereby, the light emitted by the light-emitting layer 24, especially the side light, can be reflected by the sidewall of the convex structure 28 and change its traveling direction after being incident on the convex structure 28 to increase the light output from the semiconductor light-emitting element 2. ^ (observation side) The probability of shooting. In addition to the improvement of the side light extraction rate, assuming that the light-emitting surface of the semiconductor light-emitting element 2 faces upward, the light emitted from the light-emitting layer toward the inside of the semiconductor light-emitting element 2 is reflected and is incident on the plurality of convex structures 28, and the light is emitted. The wire surface is guided by the convex structure 28. In addition, if a plurality of convex structures 28 are evenly distributed on the upper surface 220 of the first conductive semiconductor material layer 22, the semiconductor light emitting element 2 can produce a wider and uniform light-emitting layer 0 in order to avoid the light-emitting layer 24 The emitted light is substantially equal to or higher than the height of the first electrode Ϊ π π π ί 28, and the surface 22G of the semiconductor material 2 is the reference surface, the first electrode 3() of the county face; having f D1 'the top surface 28 () of each of the convex structures 28 has a height, and D2 may be substantially equal to or greater than the first electrode 30 with a dose of $10 200937671. 々凊 See Figure 3. Figure 3 is a schematic illustration of the composition of two convex structures 28 of a f-female according to the present invention in a specific embodiment. FIG. 3 illustrates an example in which a non-convex structure 28 can be composed of a first conductive type semiconductor material layer, a second conductive type semiconductor material layer 26, and a light-emitting layer 24. Ii, each of the convex structures 28 may be entirely composed of the first conductive type semiconductor material. It is to be noted that, in order to prevent the light emitted by the semiconductor light-emitting element 2 from being absorbed, the light-emitting layer 24 of each of the convex structures in Fig. 3 can be further removed. (4) In the specific embodiment, as shown in Fig. 4A, in order to make the light more per convex structure 28, it can be made of a specific material having a refractive index of more than 1. The seeding material may be IT〇, si〇2, SiN, Zn〇, ==ide; BCB, SQG, Ιη〇, Sn〇, and a compound semiconductor semiconductor material, but not limited thereto. M-v family =, group m chemical elements and ν family in the rotating material. (4) The 11th chemical element of the compound compound towel may be 铍
Hi i、柳贼離)#元素,n_VI魏合物中之 私化予兀素可以是氧⑼、硫⑻喝(Se)_(Te)等元素。 藉由空氣與特定材料之折射率的差異 2之光取出效率能夠更有效地提昇。由 $射率大於環境之折射率(例如空氣之折=本= 方,避免被第一電極30吸收,以增加半導㈣° 2下 之光輪出效率。 牛導體發先το件2本身 於另一具體實施例中,每一個凸狀妗播 巧料所製成。或者’如圖四B所示,於另—呈體;緣 母一個凸狀結構28可以包含第一結構層282 ς及m 200937671 28^。如同圖三中凸狀結構28之組成,第一結構層282可以 由第一傳導型態半導體材料層22、第二傳導型態半導體材料 層26以及發光層24所組成。或者,第一結構層282可以完 全由第一傳導型態半導體材料層22所組成。第二結構層284 形成於第一結構層282上並且由折射率大於丨之特定材料所 製成,材料的選擇則如同先前所述。 ❹Hi i, Liu thief away) #元素, n_VI wei compound In the private 兀 兀 can be oxygen (9), sulfur (8) drink (Se) _ (Te) and other elements. The light extraction efficiency by the difference in refractive index between air and a specific material can be more effectively improved. From the refractive index greater than the ambient refractive index (such as air folding = this = square, to avoid absorption by the first electrode 30, in order to increase the light output efficiency of the semi-conducting (four) ° 2. The cattle conductor first το 2 itself in another In a specific embodiment, each of the convex splicing materials is made. Or 'as shown in FIG. 4B, the other body is formed; the ribs a convex structure 28 may include the first structural layer 282 ς and m 200937671 28. As with the composition of the convex structure 28 in FIG. 3, the first structural layer 282 may be composed of the first conductive type semiconductor material layer 22, the second conductive type semiconductor material layer 26, and the light emitting layer 24. Alternatively, The first structural layer 282 may be entirely composed of the first conductive type semiconductor material layer 22. The second structural layer 284 is formed on the first structural layer 282 and is made of a specific material having a refractive index greater than that of germanium, and the material is selected. As mentioned earlier. ❹
為了提高光取出效率,於一較佳具體實施例中,若以第 一傳導型態半導體材料層22之上表面22〇為參考面,第一電 極30之項表面300具有高度〇1,每一個凸狀結構28之頂 面28〇具有高度D2 ’並且m大致上可以等於m或大於m :避24所發出的光線被第一電極30所吸收。另 ϋ Γ、Γ構層282之頂表面獅具有高度阴,並且第一 傳導型齡導㈣料層26之絲面具有高度以。 致上可以等於D3或大於D3。 大 f參關五。圖五騎示根據本發日狀铸體發 2之頂視圖。於實際應用中,複數個凸狀結構28 層24(未顯示於圖五中)以將由發光層24射^ = 向半導體發光元件2之出光面。於—較佳且體=線* =所複數個凸气結構28可以排列成内外“二 »>,並且内外兩層環狀圈彼此錯開以轉 拔 叫盡可能將層24射= 之出光面。甚者,複數個凸狀結構28亦可 件2 ^半導體材料層22之上表面22〇以保 以型 光取出效率能夠被提昇。 守騷枭先凡件2之 請參閱圖六A及圖六B。圖六八係緣示圖 j 28之頂表面280進一步形成至少一個 ^^狀 視圖。圖六B係緣示圖二B中之凸狀結構28\:2本之截面 表面280 200937671 侧壁之外&^^=8陷/8(^之截面視圖。也就是說,除了 表面形懇。或者^狀=面280亦可以同時具有粗糙的 的輪廓。不論凸狀t之縣面亦可以具有弧形 或弧形的輪廓链的表面形態 半崎示根據本發明之—具體實施例之 糊34之截面視圖。 ❹ 26、發光ΐ表24面=〇、=且包覆第二傳導型態半導體材料層 透明導電^ 34开^ f凸狀結構28。於此實施例中,於 層34上:於實Hi後中弟;^極32可以形成於透明導電 層、網狀導雷i f 1Ϊ,透明導電層34可以由薄型金屬 但不轉__)魏麟_)所製成, 由複月之半導體發光元件可以藉 屮* Γ ϋ構將轉體發光元件内部所射出之光線導向 均勻:出5提體發光元件之光取出效率及產生寬廣且 體發二她之半導 巧來對本發明之範.加以限制。相反地===實 圍=變==安=本發明所欲申請之專心 康上这的補作束寬廣的解釋,以致使其涵蓋所有可能的改 13 200937671 變以及具相等性的安排。In order to improve the light extraction efficiency, in a preferred embodiment, if the upper surface 22 of the first conductive type semiconductor material layer 22 is used as a reference surface, the surface 300 of the first electrode 30 has a height 〇1, each of which The top surface 28 of the convex structure 28 has a height D2' and m can be substantially equal to m or greater than m: the light emitted by the avoidance 24 is absorbed by the first electrode 30. In addition, the top surface lion of the ϋ, Γ layer 282 has a high degree of yin, and the surface of the first conductive type guide (four) layer 26 has a height. The above can be equal to D3 or greater than D3. Big f participation in five. Figure 5 shows the top view of the hair cast according to the hair of the hair. In practical applications, a plurality of convex structures 28 layers 24 (not shown in FIG. 5) are used to emit light from the light-emitting layer 24 to the light-emitting surface of the semiconductor light-emitting element 2. Preferably - body = line * = the plurality of convex gas structures 28 can be arranged as inner and outer "two»>, and the inner and outer two layers of annular rings are staggered from each other to be dialed as far as possible to layer 24 In addition, a plurality of convex structures 28 may also be used to form a surface 22 of the semiconductor material layer 22 to ensure that the light extraction efficiency can be improved. See Figure 6A and Figure 2 Figure 6. The top surface 280 of the figure VIII is further formed into at least one view. Figure 6B shows the convex structure of Figure 2B. The surface of the cross section 280 200937671 side Outside the wall & ^^=8 trap / 8 (^ section view. That is to say, in addition to the surface shape 或者. Or ^ shape = surface 280 can also have a rough outline at the same time. The surface morphology of the contour chain which may have an arc or an arc is a half-section of the paste 34 according to the embodiment of the present invention. ❹ 26, the surface of the light-emitting surface 24 = 〇, = and coated with the second conductivity type The semiconductor material layer is transparent and electrically conductive. In this embodiment, on the layer 34: after the real Hi, the middle brother; The transparent conductive layer 34 can be formed of a transparent conductive layer, a mesh conductive guide layer, and the transparent conductive layer 34 can be made of a thin metal, but does not turn __) Wei Lin _), and the semiconductor light-emitting element of the moon can be borrowed from the 屮 * Γ structure Directly guiding the light emitted from the inside of the rotating light-emitting element: the light extraction efficiency of the 5-lifting light-emitting element and the generation of a broad and semi-inductive guide to limit the invention. Conversely, ===围=变==安= The invention is intended to apply to the broad interpretation of this supplement, so that it covers all possible modifications and equivalence arrangements.
14 200937671 【圖式簡單說明】 圖一係繪示習知的發光二極體。 圖一 A係繪示根據本發明— 元件之截面視圖。 具體實施例之半導體發光 圖二B係繪示根據本發明 光元件之截面視圖。 力—具體實施例之半導體發14 200937671 [Simple description of the diagram] Figure 1 shows a conventional light-emitting diode. Figure 1A is a cross-sectional view of an element in accordance with the present invention. Semiconductor Light Emitting of a Specific Embodiment Figure 2B is a cross-sectional view showing an optical element in accordance with the present invention. Force - the semiconductor of a specific embodiment
圖三、圖四A及圖四B係绔 結構的組成之示意圖。 g>、x據本發明之每一個凸狀 圖 圖五係綠報據本發明之轉體發光元件之頂視 圖’、A係I會不圖二a中之&此么士 S W、 Λη Τ ^凸狀結構之頂表面進一步形忐 至少-個哪之截面細。 $ r域 一步形成 至少之凸狀結構之頂表面進 圖七係繪示根據本發明之一具體實施例 件進-步包含_導電層之截硫圖。·^體U凡 【主要元件符號說明】 1:發光二極體 ίο :基板 12 ·· N-type氮化鎵 14 :發光區 16 ·‘ P-type氮化鎵 18 :電極 2 :半導體發光元件 20 :基板 15 200937671 22 :第一傳導型態半導體材料層 24 :發光層 26 :第二傳導型態半導體材料層 28 :凸狀結構 30 :第一電極 32 :第二電極 34 :透明導電層 220 :上表面 282 :第一結構層 284 :第二結構層Figure 3, Figure 4A and Figure 4B are schematic diagrams showing the composition of the structure. g>, x according to each of the convex diagrams of the present invention, the top view of the swivel light-emitting element according to the present invention, and the A-line I will not be in FIG. 2a & this muse SW, Λη Τ ^ The top surface of the convex structure is further shaped by at least one of which is thin. The $r domain is formed in one step at least in the top surface of the convex structure. Fig. 7 is a diagram showing the sulfur cut-off of the conductive layer in accordance with an embodiment of the present invention. · ^体U凡 [Main component symbol description] 1: Light-emitting diode ίο : Substrate 12 ·· N-type gallium nitride 14 : Light-emitting region 16 · ' P-type gallium nitride 18 : Electrode 2 : Semiconductor light-emitting device 20: substrate 15 200937671 22 : first conductive type semiconductor material layer 24 : light emitting layer 26 : second conductive type semiconductor material layer 28 : convex structure 30 : first electrode 32 : second electrode 34 : transparent conductive layer 220 Upper surface 282: first structural layer 284: second structural layer
260、280、300、320、2820 :頂表面 2200 :第一區域 2202 :第二區域 2800、2802 :凹陷260, 280, 300, 320, 2820: top surface 2200: first area 2202: second area 2800, 2802: depression
Dl、D2、D3、D4 :高度 Θ :夾角 ❿ 16Dl, D2, D3, D4: Height Θ : Angle ❿ 16
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| TW97106192A TWI362768B (en) | 2008-02-22 | 2008-02-22 | Semiconductor light-emitting device |
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|---|---|---|---|
| TW97106192A TWI362768B (en) | 2008-02-22 | 2008-02-22 | Semiconductor light-emitting device |
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| Publication Number | Publication Date |
|---|---|
| TW200937671A true TW200937671A (en) | 2009-09-01 |
| TWI362768B TWI362768B (en) | 2012-04-21 |
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| TW97106192A TWI362768B (en) | 2008-02-22 | 2008-02-22 | Semiconductor light-emitting device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116093228A (en) * | 2022-12-28 | 2023-05-09 | 厦门三安光电有限公司 | Light emitting diode and preparation method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116093228A (en) * | 2022-12-28 | 2023-05-09 | 厦门三安光电有限公司 | Light emitting diode and preparation method thereof |
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| Publication number | Publication date |
|---|---|
| TWI362768B (en) | 2012-04-21 |
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