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TW200927686A - Method for production of non-alkali glass - Google Patents

Method for production of non-alkali glass Download PDF

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Publication number
TW200927686A
TW200927686A TW097139757A TW97139757A TW200927686A TW 200927686 A TW200927686 A TW 200927686A TW 097139757 A TW097139757 A TW 097139757A TW 97139757 A TW97139757 A TW 97139757A TW 200927686 A TW200927686 A TW 200927686A
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Taiwan
Prior art keywords
glass
mass
alkali
raw material
base material
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TW097139757A
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Chinese (zh)
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TWI377181B (en
Inventor
Yuichi Kuroki
Mineko Yamamoto
Yasuo Hayashi
Hideki Kushitani
Syuji Matsumoto
Terutaka Maehara
Junichiro Kase
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Asahi Glass Co Ltd
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Publication of TW200927686A publication Critical patent/TW200927686A/en
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Publication of TWI377181B publication Critical patent/TWI377181B/zh

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/225Refining
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

Disclosed is a method for producing a highly uniform and highly flat non-alkali glass which has few bubbles formed therein. Specifically disclosed is a method for producing a non-alkali glass, which comprises melting a glass raw material comprising a glass base composition raw material containing a silica sand and a boron source and also comprising a clarifying agent and molding the molten material, wherein particles of the silica sand having a D50 value of 15 to 60 [mu]m and a particle diameter of 100 [mu]m or more make up 2.5 vol% or less of the total volume of the particles of the silica sand, the boron source contains anhydrous boric acid in an amount of 10 to 100 mass% relative to 100 mass% of the total amount of the boron source, SnO2 is used as the clarifying agent, and the melting of the glass raw material is carried out by the following steps (a) and (b): (a) heating the glass raw material at a temperature at which the viscosity of the molten glass becomes more than 102.4 dPas, thereby producing a molten glass; and (b) heating the molten glass at a temperature at which the viscosity of the molten glass becomes 102.4 dPas or less and which is higher by 30 DEG C or more than the temperature employed in the step (a), thereby removing air bubbles from the molten glass.

Description

200927686 九、發明說明 【發明所屬之技術領域】 本發明係關於無鹼玻璃之製造方法。 【先前技術】 於液晶顯示基板用玻璃中,由於被要求著實質上不含 有鹼金屬,則作爲該玻璃,無鹼玻璃被使用著。又,對於 0 液晶顯示基板用之無鹼玻璃,也被要求著高耐藥性、高耐 久性、玻璃中之泡爲少、高均質性、高平坦度。因此,爲 賦予無鹼玻璃耐藥品性、耐久性,使玻璃原料包含硼源, 及爲了減少無鹼玻璃中之泡,於製造無鹼玻璃時將包含於 熔融玻璃中之泡進行脫泡(以下,記爲澄清)。尙,作爲 硼源,使用便宜且容易取得之正硼酸。 作爲澄清方法,周知有使用作爲澄清劑之Sn02,藉 由熔融玻璃之昇溫造成之Sn的價數變化,使其產生澄清 Q 氣體之方法(專利文獻1)。 但,液晶顯示基板用之無鹼玻璃,與電漿顯示基板用 玻璃、建築用玻璃、汽車用玻璃等之含有鹼玻璃相比,其 熔融溫度高於100 °c以上,爲不易熔融之玻璃。因此,將 玻璃原料在高溫下使其熔融時,Sn〇2將會被消耗,有由於 溶融玻璃之昇溫而發生澄清氣體時,並無殘留足夠量之 Sn02之問題。 作爲使用Sn02的有效澄清方法,公知有將玻璃原料 在高溫下熔融後,在低溫下保持將Sn02重製,其後,使 -5- 200927686 其昇溫至比前述熔融溫度還高,而使澄清氣體產生之方法 (專利文獻2 )。 該方法之場合,雖可期待有效的澄清,但步驟複雜, 又因其能量損耗大,在低成本下難以安定製造少泡之無鹼 玻璃。另一方面,若打算在低溫下將玻璃原料熔融,因作 爲玻璃原料主成分之矽砂不易熔融,有在熔融玻璃內發生 未融二氧化矽之缺點,有時會無法取得均質之玻璃。 0 又,爲了使矽砂容易熔融,使用粒徑爲小之矽砂的場 合時,則矽砂容易聚集。若矽砂聚集產生,無鹼玻璃之均 質性、平坦度將會降低。 〔專利文獻1〕特開2004-075498號公報 〔專利文獻2〕國際公開第2007/018910號手冊 【發明內容】 〔發明所欲解決之課題〕 Q 本發明提供一種可取得玻璃中之泡爲少,且均質性、 平坦度爲高之無鹼玻璃之製造方法。 〔用以解決課題之手段〕 本發明之無鹼玻璃之製造方法,其係對含有矽砂及硼 源之玻璃母材組成原料中添加了澄清劑之玻璃原料進行熔 融而成型之無鹼玻璃之製造方法,其特徵爲,作爲上述矽 砂’使用中徑爲15〜60μηι且粒徑ΙΟΟμιη以上之粒子之比 例爲2.5體積%以下者,作爲上述硼源,相對於1 〇 〇質量% 200927686 (以B2〇3換算)之硼源,使用含有10〜100質量%之硼酸 酐(以B2〇3換算)者,作爲上述澄清劑,至少使用Sn02 ’至少以下述之2步驟進行上述玻璃原料之熔融: (a) 將上述玻璃原料以使熔融玻璃之黏度超過 l〇2 4dPa · s之溫度加熱,製成溶融玻璃之步驟; (b) 上述步驟(a)後,將上述熔融玻璃以使熔融玻 璃之黏度爲l〇2 4dPa · s以下且比上述步驟(a)中之溫度 0 高30°C以上之溫度加熱,使熔融玻璃中之泡脫泡之步驟。 本發明之無鹼玻璃之製造方法中,在前述玻璃母材組 成原料中,以含有鋁或鹼土類金屬之氫氧化物爲佳。 本發明之無鹼玻璃之製造方法中,以氧化物爲基準之 質量百分比之表示下,將玻璃母材組成原料調製成如下述 玻璃母材組成(1 )之無鹼玻璃,相對於該玻璃母材組成 材料添加錫以Sn02換算之0.0 1〜2質量%使成玻璃原料爲 佳。 〇 Si〇2: 50 〜66 質量 %、Al2〇3: 10.5 〜22 質量 %、B2〇3: 5〜12質量。/。、MgO : 0〜8質量%、CaO : 0〜14·5質量%、 SrO: 〇〜24 質量 %、BaO: 0〜13.5質量%、1^§0 + €&0 + 81*0 + BaO : 9〜29·5 質量 % · . · ( 1 )。 本發明之無鹼玻璃之製造方法中,以相對於上述玻璃 母材組成原料,更進一步,添加從以C1換算之3質量%以 下之氯化物,以S03換算之3質量%以下之硫酸鹽及以f 換算之3質量%以下之氟化物所構成之群中選出一種以上 之合計量爲〇.〇1~5質量%而作爲玻璃原料爲佳。 200927686 本發明之無鹼玻璃之製造方法中,以相對於上述玻璃 母材組成原料,更進一步,添加以N〇3換算之0.01〜10質 量%之硝酸鹽及無鹼玻璃所構成之玻璃屑15〜300質量%而 作爲玻璃原料爲佳。 〔發明之效果〕 依據本發明之無鹼玻璃之製造方法,可取得玻璃中之 0 泡爲少,均質性、平坦度爲高之無鹼玻璃。 【實施方式】 〔實施發明之最佳形態〕 <無鹼玻璃之製造方法> 無鹼玻璃的製造係藉由對含有矽砂及硼源之玻璃母材 組成原料中添加了澄清劑之玻璃原料進行熔融而成型。無 鹼玻璃係例如經由下述順序之步驟而製造。 0 ( i )將矽砂及硼源,或依據需要A1203、鹼土類金屬 氧化物(MgO、CaO、SrO、BaO )及/或鋁或鹼土類金屬 之氫氧化物以使成爲目標之無鹼玻璃之玻璃母材組成之比 例混合調製成玻璃母材組成原料,於該玻璃母材組成原料 中添加澄清劑等使成爲玻璃原料之步驟。 (Π)將該玻璃原料及依據需要之玻璃屑從熔融窯之 玻璃原料投入口連續投入熔融窯內,使其熔融而成爲熔融 玻璃之步驟。 (iii)將該熔融玻璃藉由浮式法等之公知的成型法使 -8- 200927686 其成爲指定厚度的玻璃帶之成型步驟。 (iv)使成型後之玻璃帶緩冷卻後、將其切斷爲指定 之尺寸,而得到板狀之無鹼玻璃的步驟。 本發明其特徵爲,作爲前述矽砂’使用中徑爲15〜 60μηι,且粒徑ΙΟΟμιη以上之粒子的比例爲2.5體積%以下 者,作爲前述硼源,使用硼源1〇〇質量% (以β2ο3換算) 之中,含有10〜1〇〇質量% (以Β203換算)之硼酸酐者, φ 作爲前述澄清劑,至少使用Sn02,將前述步驟(ii )分爲 至少下述2步驟進行。 (a) 將前述玻璃原料在熔融玻璃之黏度成爲超過 102 4dPa · s之溫度下加熱,使成爲熔融玻璃之步驟。 (b) 前述步驟(a)之後,將前述熔融玻璃,在熔融 玻璃之黏度成爲l〇2 4dPa · s以下之溫度下且比前述步驟 (a)中之溫度高30 °C以上之溫度下加熱,使熔融玻璃中 之泡進行脫泡之步驟。 ❿ 步驟(i): (矽砂) 矽砂之中徑,即粉體之粒度分佈,比某粒徑大之粒子 的體積頻度爲佔有全粉體之體積頻度的50%之粒子徑(以 下,記爲D5〇),爲15〜60μιη,以20〜50μιη爲佳,20〜 40μπι爲較佳、20〜3 0μιη爲更佳。矽砂之D5Q特別係以未 滿3 0μιη爲佳,更進一步以27μιη以下爲佳。藉由使矽砂 之D5Q爲15μιη以上,因矽砂之聚集可被抑制,可得到泡 -9 - 200927686 爲更少,且均質性、平坦度爲高之無_玻璃。 藉由使矽砂之〇5〇爲60μιη以下,因矽砂可容易均勻 地熔融’可得到泡爲少’且均質性、平坦度爲高之無鹼玻 璃。 砍砂之粒度分佈中粒徑1〇〇Μ·ηι以上之粒子之比例爲 2.5體積%以下’以0體積%爲更佳。藉由使粒徑1〇〇μιη以 上之粒子的比例在2.5體積%以下,因矽砂可容易均勻地 0 熔融’可得到泡爲少,且均質性、平坦度爲高之無鹼玻璃 〇 矽砂之粒度分佈可藉由雷射衍射.散射法測定。 (硼源) 作爲硼源之硼化合物,可舉出正硼酸(Η3Β〇3 )、偏 硼酸(ηβο2)、四硼酸(η2β4ο7)、硼酸酐(β203)等 。在通常之無鹼玻璃之製造中,以便宜且容易取得之觀點 Q ,使用著正硼酸。 但,使用含有正硼酸之玻璃原料之場合時,會有發生 以下等問題的情況。 (1) 於正硼酸的存在下中’粒徑爲小之矽砂容易聚 集,對投入溶融窯之玻璃原料的投入量則容易變爲不安定 。因此,熔融窯內之熔融玻璃的溫度會變爲不安定’又, 熔融玻璃的循環·滯留時間變爲不安定。其結果’玻璃原 料的熔融變的不均勻,又,熔融玻璃的組成變的不均句。 (2) 玻璃原料爲含有鹼土類金屬化合物之場合時’ -10- 200927686 在溶解窯的玻璃原料投入口所熔融之正硼酸,與鹼土類金 屬化合物聚集,而容易產生聚集物。因正硼酸及鹼土類金 屬化合物因也係爲促進矽砂之熔融之成分,若聚集物產生 時,熔融窯內中玻璃原料的熔融會變的不均勻,又,熔融 玻璃的組成也會變的不均勻。 若(η或(2)之問題發生時,因熔融玻璃的均質性 變差,則所成型之無鹼玻璃的均質性、平坦度降低。又, 0 因循環•滯留時間變的不安定,泡藉由澄清劑從熔融窯內 的熔融玻璃脫出前,熔融玻璃的一部份會從熔融窯流出。 又,因玻璃原料的熔融爲不均勻,相對於較慢熔融的矽砂 ,澄清劑的效果變的不足,泡無法充份地從熔融玻璃中脫 出。 有關於(1 )的問題,本發明者們發現,矽砂的聚集 係因爲玻璃原料中含有水分所引起,然後,爲抑制矽砂的 聚集,只要將玻璃原料所含的水分減少即可,亦即減少分 〇 子中含有多量水分子之正硼酸的量,增加硼酸酐之量即可 〇 又’關於(2)的問題,本發明者們發現,在玻璃原 料投入口被加熱後之正硼酸中失去一個水分子而成爲偏硼 酸’在150 °C以上被液化之偏硼酸則會與鹼土類金屬化合 物聚集’接著,爲抑制偏硼酸與鹼土類金屬化合物之聚集 ’使用含有身爲從偏硼酸中更失去水分子之狀態之硼酸酐 的硼源即可。 更進一步,藉由使用含有硼酸酐之硼源,也可期待有 -11 - 200927686 以下之效果。 (i) 由於玻璃原料中之水分量被抑制,將玻璃原料 熔融時之水的汽化熱則會減少。因此,在熔融窯中被消耗 之能量因汽化熱減少而減少了汽化熱的部份,而可謀求省 能源化,且提高生產性。 (ii) 因熔融玻璃中之水分(/3 -OH )減少,澄清劑 中含有C1之場合時,藉由下述反應成爲HC1,而可抑制 ❹ 揮發。因此,可減低澄清劑之量,更減少含有HC1之排氣 處理的負擔。 OH' + CT— HC1 t +〇2-。 (iii) 從正硼酸中失去一個水分子而生成之偏硼酸, 雖然容易揮發,因硼酸酐不容易揮發,可降低硼源之量, 更減少含有偏硼酸之排氣處理的負擔。 因此,於本發明中,作爲硼源,使用硼源1 〇〇質量% (以B2〇3換算)之中,含有10〜100質量% (以8203換 Q 算)之硼酸酐者。藉由控制硼酸酐在10質量%以上,可得 到抑制玻璃原料之聚集,減少泡的效果,均質性、平坦度 提高之效果。硼酸酐以20〜100質量%爲較佳,50〜100 質量%爲更佳,100質量%爲特佳。 作爲硼酸酐以外之硼化合物,從便宜及容易取得之觀 點看來,以正硼酸爲理想。 (其他原料) 作爲其他原料,可舉出ai2o3、鹼土類金屬氧化物( -12- 200927686200927686 IX. Description of the Invention Technical Field of the Invention The present invention relates to a method for producing an alkali-free glass. [Prior Art] In the glass for a liquid crystal display substrate, since it is required to substantially contain no alkali metal, an alkali-free glass is used as the glass. Further, the alkali-free glass for a liquid crystal display substrate is required to have high chemical resistance, high durability, low foam in the glass, high homogeneity, and high flatness. Therefore, in order to impart chemical resistance and durability to the alkali-free glass, the glass raw material contains a boron source, and in order to reduce bubbles in the alkali-free glass, the bubbles contained in the molten glass are defoamed in the production of the alkali-free glass (hereinafter, , remember as clarification). Helium, as a source of boron, uses ortho-boric acid which is inexpensive and easily available. As a clarification method, a method of using a Sn02 as a clarifying agent to change a valence of Sn due to a temperature rise of molten glass to produce a clarified Q gas is known (Patent Document 1). However, the alkali-free glass for a liquid crystal display substrate has a melting temperature higher than 100 ° C or higher than that of an alkali glass containing a glass for a plasma display substrate, a glass for construction, or an automobile glass, and is a glass which is hard to melt. Therefore, when the glass raw material is melted at a high temperature, Sn 2 is consumed, and when a clear gas is generated due to the temperature rise of the molten glass, there is no problem that a sufficient amount of SnO remains. As an effective clarification method using Sn02, it is known that after the glass raw material is melted at a high temperature, the Sn02 is kept at a low temperature, and thereafter, the temperature is raised to a temperature higher than the melting temperature, and the clarified gas is made. Method of production (Patent Document 2). In the case of this method, although effective clarification can be expected, the steps are complicated, and since the energy loss is large, it is difficult to stably produce an alkali-free glass which is less foamed at a low cost. On the other hand, if it is intended to melt the glass raw material at a low temperature, the cerium sand which is a main component of the glass raw material is not easily melted, and there is a disadvantage that unmelted cerium oxide is generated in the molten glass, and a homogeneous glass may not be obtained. 0 In addition, in order to make the cerium sand easy to melt and use a shale with a small particle size, the cerium is likely to aggregate. If the sand is aggregated, the homogeneity and flatness of the alkali-free glass will decrease. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2004-075498 (Patent Document 2) International Publication No. 2007/018910 (Draft of the Invention) [Problems to be Solved by the Invention] Q The present invention provides a bubble which can be obtained in a glass. And a method for producing an alkali-free glass having high homogeneity and flatness. [Means for Solving the Problem] The method for producing an alkali-free glass according to the present invention is an alkali-free glass obtained by melting a glass raw material to which a clarifying agent is added to a raw material of a glass base material containing cerium and a boron source. In the production method, the ratio of the particles having a median diameter of 15 to 60 μm and a particle diameter of ΙΟΟμηη or more is 2.5% by volume or less, and the boron source is used as the boron source with respect to 1% by mass of 200927686. In the boron source of B2〇3, the boronic acid anhydride (in terms of B2〇3) containing 10 to 100% by mass is used as the clarifying agent, and at least the following steps are used to melt the glass raw material using at least Sn02': (a) heating the glass raw material at a temperature at which the viscosity of the molten glass exceeds 1 〇 24 dPa · s to form a molten glass; (b) after the above step (a), the molten glass is used to make the molten glass The viscosity is a temperature of 10 Pa 2 4 dPa · s and is heated at a temperature higher than 30 ° C higher than the temperature 0 in the above step (a) to defoam the bubbles in the molten glass. In the method for producing an alkali-free glass of the present invention, it is preferred that the glass base material composition is a hydroxide containing aluminum or an alkaline earth metal. In the method for producing an alkali-free glass according to the present invention, the raw material of the glass base material is prepared into an alkali-free glass of the glass base material composition (1), as indicated by the mass percentage based on the oxide, with respect to the glass mother. It is preferable to add tin to the material composition material in an amount of 0.01 to 2% by mass in terms of Sn02. 〇 Si〇2: 50 to 66% by mass, Al2〇3: 10.5 to 22% by mass, B2〇3: 5 to 12 by mass. /. MgO: 0 to 8 mass%, CaO: 0 to 14.5 mass%, SrO: 〇~24 mass%, BaO: 0 to 13.5 mass%, 1^§0 + €&0 + 81*0 + BaO : 9~29·5 mass% · . · (1). In the method for producing an alkali-free glass of the present invention, a sulphate of 3% by mass or less in terms of C1 and a sulphate of 3% by mass or less in terms of S03 are added to the raw material of the glass base material. The total amount of one or more selected from the group consisting of fluorides of 3% by mass or less in terms of f is preferably ~1 to 5% by mass, and is preferably a glass raw material. 200927686 In the method for producing an alkali-free glass according to the present invention, glass frit 15 composed of nitrate and alkali-free glass in an amount of 0.01 to 10% by mass in terms of N〇3 is further added to the raw material of the glass base material. It is preferably 300% by mass as a glass raw material. [Effects of the Invention] According to the method for producing an alkali-free glass of the present invention, an alkali-free glass having a small amount of zero bubbles in the glass and having high homogeneity and flatness can be obtained. [Embodiment] [Best Mode for Carrying Out the Invention] <Production Method of Alkali-Free Glass> The production of an alkali-free glass is a glass in which a clarifying agent is added to a raw material of a glass base material containing a cerium and a boron source. The raw material is melted and molded. The alkali-free glass is produced, for example, by the procedure of the following procedure. 0 ( i ) A sand source and a boron source, or a hydroxide of an alkaline earth metal oxide (MgO, CaO, SrO, BaO) and/or an aluminum or alkaline earth metal according to the need to make the target alkali-free glass The glass base material composition ratio is mixed and prepared into a glass base material constituent raw material, and a clarifying agent or the like is added to the glass base material constituent raw material to form a glass raw material. (Π) The glass raw material and the glass flakes as needed are continuously introduced into the melting kiln from the glass raw material inlet of the melting kiln to be melted to form a molten glass. (iii) The molten glass is subjected to a molding step of a glass ribbon of a predetermined thickness by a known molding method such as a float method. (iv) A step of obtaining a plate-shaped alkali-free glass by slowly cooling the formed glass ribbon and cutting it into a specified size. The present invention is characterized in that the ratio of the particles having a median diameter of 15 to 60 μm and the particle diameter of ΙΟΟμηη or more is 2.5% by volume or less, and the boron source is used as the boron source in an amount of 1% by mass. In the case of the boronic anhydride of 10 to 1% by mass (calculated as Β203), φ is used as the clarifying agent, and at least Sn02 is used, and the above step (ii) is divided into at least the following two steps. (a) The step of heating the glass raw material at a temperature at which the viscosity of the molten glass is more than 102 4 dPa · s to form molten glass. (b) after the step (a), the molten glass is heated at a temperature at which the viscosity of the molten glass becomes l〇24 dPa·s or less and is higher than the temperature in the step (a) by 30 ° C or higher. a step of defoaming the bubbles in the molten glass. ❿ Step (i): (矽砂) The diameter of the sand, that is, the particle size distribution of the powder, the volume of the particles larger than a certain particle size is the particle diameter of 50% of the volume of the whole powder (below, It is referred to as D5〇), preferably 15 to 60 μm, preferably 20 to 50 μm, and 20 to 40 μm is preferably 20 to 30 μm. The D5Q of the enamel sand is preferably less than 30 μm, and further preferably 27 μm or less. By setting the D5Q of the strontium sand to 15 μm or more, the aggregation of the strontium sand can be suppressed, and the -9-200927686 which is less, and has no homogeneity and high flatness can be obtained. By setting the 矽 5 〇 to 60 μm or less, the cerium can be easily melted uniformly, and the alkali-free glass having a high degree of uniformity and flatness can be easily melted. The ratio of the particles having a particle diameter of 1 〇〇Μ·ηι or more in the particle size distribution of the chopped sand is 2.5 vol% or less, and more preferably 0 vol%. When the ratio of the particles having a particle diameter of 1 μm or more is 2.5% by volume or less, the cerium can be easily and uniformly melted by 0, and the alkali-free glass crucible having a low degree of homogeneity and flatness can be obtained. The particle size distribution of the sand can be determined by laser diffraction and scattering. (Boron source) Examples of the boron compound as a boron source include orthoboric acid (Η3Β〇3), metaboric acid (ηβο2), tetraboric acid (η2β4ο7), and boric anhydride (β203). In the production of a normal alkali-free glass, n-boric acid is used from the viewpoint of being inexpensive and easy to obtain. However, when a glass material containing orthoboric acid is used, the following problems may occur. (1) In the presence of orthoboric acid, the eucalyptus sand having a small particle size is easily aggregated, and the amount of the glass raw material to be supplied to the melting kiln is likely to become unstable. Therefore, the temperature of the molten glass in the melting kiln becomes unstable. In addition, the cycle and residence time of the molten glass becomes unstable. As a result, the melting of the glass raw material is uneven, and the composition of the molten glass becomes uneven. (2) When the glass raw material is an alkaline earth metal compound, ~-10-200927686 The orthoboric acid melted in the glass raw material input port of the dissolution kiln aggregates with the alkaline earth metal compound, and aggregates are likely to occur. Since the orthoboric acid and the alkaline earth metal compound are also components which promote the melting of the cerium, when the aggregate is generated, the melting of the glass raw material in the melting kiln becomes uneven, and the composition of the molten glass also changes. Not uniform. When the problem of (n or (2) occurs, the homogeneity of the molten glass is deteriorated, and the homogeneity and flatness of the formed alkali-free glass are lowered. Further, 0 is unstable due to the cycle and residence time, and the bubble is unstable. Before the clarifying agent is removed from the molten glass in the melting kiln, a part of the molten glass flows out of the melting kiln. Moreover, since the melting of the glass raw material is uneven, the effect of the clarifying agent is relatively low relative to the slower molten cerium sand. Insufficient, the bubble cannot be sufficiently removed from the molten glass. Regarding the problem of (1), the inventors have found that the aggregation of the sand is caused by the moisture contained in the glass raw material, and then, to suppress the sand As long as the water contained in the glass raw material is reduced, that is, the amount of ortho-boric acid containing a large amount of water molecules in the hazelnut is reduced, and the amount of boric anhydride is increased, and the problem of (2) is The inventors have found that one water molecule is lost in orthoboric acid after the glass raw material input port is heated, and it becomes metaboric acid. The metaboric acid which is liquefied at 150 ° C or higher is aggregated with the alkaline earth metal compound. The aggregation of the boric acid and the alkaline earth metal compound can be carried out by using a boron source containing a boric anhydride which is in a state of losing water molecules from the metaboric acid. Further, it is also expected to use a boron source containing a boric anhydride. The effect of -11 - 200927686 is as follows: (i) Since the amount of water in the glass raw material is suppressed, the heat of vaporization of the water when the glass raw material is melted is reduced. Therefore, the energy consumed in the melting kiln is reduced by the heat of vaporization. By reducing the amount of heat of vaporization, it is possible to save energy and improve productivity. (ii) When the amount of water (/3 - OH ) in the molten glass is reduced and C1 is contained in the clarifying agent, The reaction becomes HC1, and the oxime volatilization can be suppressed. Therefore, the amount of the clarifying agent can be reduced, and the burden of the exhaust treatment containing HC1 can be further reduced. OH' + CT - HC1 t + 〇2-. (iii) From orthoboric acid The metaboric acid formed by the loss of one water molecule is easy to volatilize, since the boric anhydride is not easily volatilized, the amount of the boron source can be reduced, and the burden of the exhaust treatment containing the metaboric acid can be further reduced. Therefore, in the present invention, as the boron source ,use In the source 1 〇〇 mass % (calculated as B2 〇 3), the boronic anhydride is contained in an amount of 10 to 100% by mass (calculated as 8203 for Q). By controlling the boric anhydride at 10% by mass or more, the glass raw material can be suppressed. The aggregation is carried out to reduce the effect of the foam, and the effect of improving the homogeneity and the flatness. The boric anhydride is preferably 20 to 100% by mass, more preferably 50 to 100% by mass, and particularly preferably 100% by mass. Boron compounds are preferred from the viewpoint of being cheap and easy to obtain. (Other raw materials) Other materials include ai2o3 and alkaline earth metal oxides (-12-200927686)

MgO、CaO、SrO、BaO) 、A1(0H)3、鹼 土類金屬氫氧 化物(Mg(OH) 2、Ca(OH) 2、Ba(OH) 2、Sr(OH) 2 )° 本發明中,使玻璃母材組成原料中含有鋁或鹼土類金 屬的氫氧化物一事,在將玻璃原料熔融之步驟(步驟(a ))中促進初期熔融,可在更低溫下得到熔融玻璃之面爲 理想。又,於本發明中,亦可使玻璃母材組成原料中含有 0 鋁及鹼土類金屬所構成之氫氧化物。 又,如上述,爲了減少熔融玻璃中之水分量,若將玻 璃原料中之硼源的一部份或全部使用硼酸酐,熔融玻璃中 之水分量會過份降低,於減壓脫泡步驟中泡則會變小,泡 的浮出速度降低,無鹼玻璃的均質性及平坦度有惡化之可 能性。此種場合,爲補給熔融玻璃中之水分量,以添加鋁 或鹼土類金屬之氫氧化物爲佳。 作爲氫氧化物,以使用A1 ( OH ) 3 —事,在初期熔融 0 被促進之面爲理想。又,作爲鹼土類金屬之氫氧化物,以 使用Mg ( OH ) 2或Ca ( OH ) 2之至少一方爲佳、特別係 使用Mg ( OH) 2爲佳。 在玻璃母材組成原料中使其含有鹼土類金屬之氫氧化 物時之含有量,在鹼土類金屬源100莫耳% (以MO換算 ,唯Μ爲鹼土類金屬元素)之中,以15〜100莫耳%以( ΜΟ換算)之範圍爲佳。藉由氫氧化物之添加量爲15莫耳 %以上,於步驟(a)中,可減低矽砂中所含之Si02成分 的未熔解量。因此,於玻璃熔液中泡發生時,可防止未熔 -13- 200927686 解之Si〇2被此泡捲入而在玻璃熔液之表層附近聚集。然 後其結果,玻璃溶液之表層與表層以外的部份之間,Si02 的組成比產生差異,可防止玻璃的均質性及平坦性降低。 又,因隨著鹼土類金屬源中之氫氧化物的莫耳比增加 ,則玻璃原料熔解時之Si〇2成分的未熔解量降低,所以 氫氧化物的莫耳比越高越好。 又,與上述鹼土類金屬氫氧化物的場合時相同之理由 U ,使玻璃母材組成原料中含有Al(OH) 3時之含有量,鋁 源100莫耳% (以A1203換算)之中,以15〜100莫耳% (以Al2〇3換算)之範圍爲佳。 又,因隨著鋁源中之氫氧化物的莫耳比增加,則玻璃 原料熔解時之Si〇2成分的未融解量降低,所以氫氧化物 之莫耳比越高越好。 (玻璃母材組成原料) Q 玻璃母材組成原料係爲將前述各原料予以混合之粉末 狀的混合物。 玻璃母材組成原料爲調製成爲具有作爲目標之玻璃母 材組成之無鹼玻璃。 玻璃母材組成原料之組成,以成爲後述之玻璃母材組 成(1)之無鹼玻璃之組成爲佳,以成爲後述之玻璃母材 組成(2)或玻璃母材組成(3)之無鹼玻璃之組成爲特佳 -14- 200927686 (澄清劑) 澄清劑係爲改善澄清性之成分,添加於玻璃母材組成 原料中。 本發明中,作爲澄清劑,至少使用Sn02。MgO, CaO, SrO, BaO), A1(0H)3, alkaline earth metal hydroxide (Mg(OH) 2, Ca(OH) 2, Ba(OH) 2, Sr(OH) 2 )° In the present invention The glass base material is composed of a hydroxide containing aluminum or an alkaline earth metal in the raw material, and the initial melting is promoted in the step of melting the glass raw material (step (a)), and the surface of the molten glass can be obtained at a lower temperature. . Further, in the present invention, the glass base material may be composed of a hydroxide composed of 0 aluminum and an alkaline earth metal. Further, as described above, in order to reduce the amount of water in the molten glass, if a part or all of the boron source in the glass raw material is used with boric anhydride, the amount of water in the molten glass is excessively lowered, in the vacuum degassing step. The bubble becomes smaller, the floating speed of the bubble is lowered, and the homogeneity and flatness of the alkali-free glass are deteriorated. In this case, it is preferable to add a hydroxide of aluminum or an alkaline earth metal in order to replenish the amount of water in the molten glass. As the hydroxide, it is preferable to use A1(OH)3 to promote the initial melting of 0. Further, as the hydroxide of the alkaline earth metal, at least one of Mg(OH) 2 or Ca(OH) 2 is preferably used, and particularly Mg (OH) 2 is preferably used. When the content of the alkali metal-based metal hydroxide is contained in the raw material of the glass base material, 100 mol% of the alkaline earth metal source (in terms of MO, only the alkaline earth metal element), 15~ The range of 100% by mole is preferably (in terms of ΜΟ conversion). By adding the amount of the hydroxide to 15 mol% or more, in the step (a), the amount of the unmelted component of the SiO 2 component contained in the strontium sand can be reduced. Therefore, when the bubble occurs in the glass melt, it is possible to prevent the unmelted Si〇2 from being entangled by the bubble and accumulating in the vicinity of the surface layer of the glass melt. Then, as a result, the composition ratio of SiO 2 differs between the surface layer of the glass solution and the portion other than the surface layer, and the homogeneity and flatness of the glass can be prevented from being lowered. Further, as the molar ratio of the hydroxide in the alkaline earth metal source increases, the amount of the unmelted Si 2 component at the time of melting the glass raw material decreases, so that the higher the molar ratio of the hydroxide is, the better. In the case of the above-mentioned alkaline earth metal hydroxide, the reason U is such that the glass base material composition contains Al(OH) 3 in the raw material, and the aluminum source is 100% by mole (in terms of A1203). It is preferably in the range of 15 to 100 mol% (calculated as Al2〇3). Further, as the molar ratio of the hydroxide in the aluminum source increases, the amount of the unmelted Si 2 component at the time of melting the glass raw material decreases, so that the higher the molar ratio of the hydroxide is, the better. (Glass base material composition raw material) Q Glass base material constituent raw material is a powdery mixture in which the above respective raw materials are mixed. The raw material of the glass base material is prepared into an alkali-free glass having a composition as a target glass base material. The composition of the raw material of the glass base material is preferably a composition of the alkali-free glass which is a glass base material composition (1) to be described later, and is a non-alkali which is a glass base material composition (2) or a glass base material composition (3) which will be described later. The composition of the glass is Tejia-14-200927686 (clarifying agent) The clarifying agent is a component for improving the clarification property and is added to the raw material of the glass base material. In the present invention, at least Sn02 is used as the clarifying agent.

Sn氧化物,在1400°C以上之高溫下價數從 Sn02 ( Sn4+)變化爲SnO(Sn2+)。伴隨著該價數的變化,釋放 出澄清氣體(氧氣)。接著一定比例以上之Sn02價數變 0 化爲SnO,因充份的澄清氣體被放出,有效果的澄清則成 爲可能。 錫的添加量,相對於玻璃母材組成原料在Sn02換算 下以0.01〜2質量%爲佳,以0.1〜0.7質量%爲更佳。藉 由使錫的添加量在〇.〇1質量%以上,可充份地進行澄清。 藉由使錫的添加量在2質量%以下,可抑制未熔錫等缺點 產生。 作爲其他澄清劑,相對於玻璃母材組成原料,更進一 Q 步,亦可添加選自由在C1換算下3質量%以下之氯化物、 以S 03換算下3質量%以下之硫酸鹽及以F換算下3質量 %以下之氟化物所成群之1種以上,合計量爲0.01〜5質 量%。尙,因玻璃屑之處理需要多數的人力,除了不可避 免的混入物外以不含有PbO、As203、Sb203等之雜質爲佳 (玻璃屑) 玻璃屑係爲,於無鹼玻璃之製造過程中所排出之玻璃 -15- 200927686 碎屑。 作爲玻璃屑,以含有與作爲目標之無鹼玻璃的玻璃母 材組成相同之組成者爲佳。 玻璃屑之添加量,相對於玻璃母材組成原料’以15〜 300質量%爲佳。藉由使玻璃屑之添加量爲15質量%以上 ,可確保初期熔融性。藉由使玻璃屑之添加量爲300質量 %以下,可發揮Sn02所產生之澄清效果。 ❹ (其他添加劑) 使用玻璃屑之場合時,以同時加入硝酸鹽爲佳。 於玻璃屑中,作爲澄清劑所用之Sn氧化物係以SnO (Sn2+ )之狀態下所存在之比例爲多’產生澄清氣體之能 力降低。因此,於玻璃屑的再熔融時藉由添加硝酸鹽,因 藉由硝酸鹽使SnO ( Sn2+ )氧化爲Sn02 ( Sn4+ ) ’可不用 再度添加Sn02於玻璃屑中,而進行有效的澄清。 Q 硝酸鹽之添加量,相對於玻璃母材組成原料’ N〇3換 算下以0.01〜10質量%爲佳。藉由使硝酸鹽之添加量爲 0.01質量%以上,可有效率地使玻璃屑中之SnO氧化成爲 Sn02。就算使硝酸鹽之添加量爲超過1〇質量% ’對Sn02 之氧化已爲飽和’效果爲小。 步驟(Π): (步驟(a)) 步驟(a )係初期熔融步驟’係爲將玻璃原料熔融使 -16- 200927686 其均勻地玻璃化之步驟。 步驟(a)中之溫度係爲使熔融玻璃之黏度爲超過 1 02 4dPa· s之溫度,以熔融玻璃之黏度成爲1025dpa· s 以上之溫度爲佳,熔融玻璃之黏度爲1〇2.6〜1 02 9dPa· s 之溫度爲更佳。若使熔融玻璃之黏度超過1029dPa · s,初 期熔融會變成難以均質。因此,以成爲1029dPa . s以下 之溫度爲佳。又,步驟(a)中溫度係以1400°C以上爲佳 〇 藉由使步驟(a)中溫度成爲使熔融玻璃之黏度超過 1 02 4dPa . s之溫度,可一邊抑制Sn02的消耗,一邊進行 玻璃化。因此,後段之步驟(b )中可有效地進行澄清, 可減少玻璃中之泡。 如此一般本發明中,因作爲澄清劑至少使用 Sn02, 有將玻璃原料在比較的低溫下,即使溶融玻璃之黏度爲超 過1024dPa · s之溫度下加熱使成爲熔融玻璃之必要。 © 但,作爲硼源若僅使用正硼酸,該溫度下因矽砂容易 聚集,則熔融玻璃內容易產生未熔之二氧化矽。 另一方面,於本發明中,玻璃母材組成原料因含有硼 酸酐作爲硼源,就算在該溫度下玻璃原料可均勻熔融,未 融二氧化矽之產生也被抑制。 步驟(a)之時間以1〇〇〜900分爲佳,以150〜500 分爲更佳。 (步驟(b)) -17- 200927686 步驟(b )係澄清步驟’將熔融玻璃在比較高的溫度 ,即使熔融玻璃之黏度爲1〇2_4dPa · s以下之溫度下’且 比前述步驟(a)中溫度高30 °C以上之溫度下加熱’藉由 Sn之價數變化使澄清氣體產生’將熔融玻璃中之泡進行 脫泡之步驟。 步驟(b)中之溫度,係爲使熔融玻璃之黏度爲 l〇24dPa · s以下之溫度,以使熔融玻璃之黏度爲1〇2 3dPa • s以下之溫度爲佳,以使熔融玻璃之黏度爲1〇18〜 l〇22dPa· s之溫度爲更佳。若使熔融玻璃之黏度爲未滿 iO^dPa · s,則爐材變的容易受到侵蝕,變的容易產生缺 障。因此,以l〇18dPa · s以上之溫度爲佳。 又,步驟(b)中之溫度,係爲比前述步驟(a)中溫 度高3 0 °C以上之溫度,以比前述步驟(a )中之溫度高5 0 。(:以上之溫度爲佳,以比前述步驟(a )中溫度高70°C以 上之溫度爲更佳。又,步驟(b )中溫度以1 700 °C以下爲 隹。 藉由將步驟(b)中之溫度成爲使熔融玻璃之黏度爲 1〇2 4dPa · s以下之溫度,且比前述步驟(a)中之溫度高 3 0 °C以上之溫度’則澄清氣體可效率地產生,可有效率地 進行澄清,可減少玻璃中之泡。 步驟(b)之時間,以60〜800分爲佳,120〜300分 爲更佳。 熔融玻璃之黏度係使用高溫回轉黏度計進行測定。 -18- 200927686 步驟(iii)、步驟(iv): 步驟(iii)及步驟(iv)中、與公知之無鹼玻璃之製 造方法同樣地進行成形、緩冷卻及切斷。 <無鹼玻璃> 使用本發明之製造方法所得之無鹼玻璃’其玻璃母材 組成中含有源自矽砂之Si02、及源自硼源之B2〇3。無鹼 0 玻璃係爲,實質上不含有Na20、K20等之鹼金屬氧化物 者。在此,實質上不含有鹼金屬氧化物係指、除了從原料 等混入不可避免之雜質外,不含有鹼金屬氧化物。即’意 指不蓄意使其含有鹼金屬氧化物者。 以下,進行說明關於無鹼玻璃之理想的玻璃母材組成 〇 玻璃母材組成(1 ): Q 無鹼玻璃,具有作爲液晶顯示基板用玻璃之特性(熱 膨脹係數25χ10_7〜60x10_7/°C)、耐藥品性、耐久性等 )、從適合成型爲板玻璃之觀點來看,以氧化物爲基準之 質量百分比表示下,以下述玻璃母材組成(1)之無鹼玻 璃爲佳。 81〇2:50~66質量%、入12〇3:10.5〜22質量%、82〇3 :5〜12質量%、MgO: 0〜8質量%、CaO: 〇〜14.5質量 %、SrO: 〇 〜24 質量%、BaO: 0 〜13.5 質量 %、MgO + CaO + SrO + BaO: 9 〜29.5 質量 〇/〇 -19- 200927686 玻璃母材組成(2 ): 無鹼玻璃’其應變點爲640 °C以上,熱膨脹係數、密 度爲小,可抑制蝕刻所使用之緩衝級氫氟酸(BHF )所造 成之白濁’對鹽酸等之藥品之耐久性也爲優良,熔融·成 型爲容易,從適合浮式法成型之觀點來看,以氧化物爲基 準之質量百分比表示下、以下述玻璃母材組成(2)之無 q 鹼玻璃爲更佳。The Sn oxide changes from Sn02 (Sn4+) to SnO(Sn2+) at a high temperature of 1400 °C or higher. A clarified gas (oxygen) is released along with the change in the valence. Then, a certain percentage or more of the Sn02 valence is changed to SnO, and since sufficient clarified gas is released, effective clarification becomes possible. The amount of tin added is preferably 0.01 to 2% by mass, more preferably 0.1 to 0.7% by mass, based on the weight of the glass base material. The clarification can be sufficiently carried out by adding the amount of tin to 〇.〇1% by mass or more. When the amount of tin added is 2% by mass or less, defects such as unmelted tin can be suppressed. As a further clarifying agent, it is possible to further add a sulphate selected from a chlorinated product of 3 mass% or less in terms of C1, a sulphate of 3 mass% or less in terms of S03, and a F to the glass base material. One or more types of fluorides in an amount of 3% by mass or less are converted into a total amount of 0.01 to 5% by mass.尙, because the processing of glass swarf requires a lot of manpower, in addition to the inevitable mixture, it is better to contain impurities such as PbO, As203, Sb203, etc. (glass swarf) Discharged glass -15- 200927686 Debris. As the glass cullet, it is preferred to contain the same composition as the glass base material of the target alkali-free glass. The amount of the glass swarf added is preferably 15 to 300% by mass based on the glass base material composition. When the amount of the glass cullet added is 15% by mass or more, the initial meltability can be ensured. By adding the amount of the glass swarf to 300% by mass or less, the clarifying effect by Sn02 can be exhibited. ❹ (Other additives) When using glass swarf, it is preferable to add nitrate at the same time. In the glass cullet, the Sn oxide used as the clarifying agent has a ratio of a large amount of SnO (Sn2+) in which the ability to generate a clarified gas is lowered. Therefore, by adding nitrate to the re-melting of the glass cullet, the SnO (Sn2+) can be oxidized to Sn02 (Sn4+) by the nitrate to effectively clarify without adding Sn02 to the glass cullet. The amount of the nitrate added is preferably 0.01 to 10% by mass based on the glass base material constituent raw material 'N〇3. When the amount of the nitrate added is 0.01% by mass or more, SnO in the glass cullet can be efficiently oxidized to Sn02. Even if the amount of the nitrate added is more than 1% by mass, the effect of the oxidation of Sn02 is saturated is small. Step (Π): (Step (a)) The step (a) is an initial melting step of the step of melting the glass raw material to uniformly vitrify it from -16 to 200927686. The temperature in the step (a) is such that the viscosity of the molten glass is more than 1 02 4 dPa·s, and the viscosity of the molten glass is preferably 1025 dPa·s or more, and the viscosity of the molten glass is 1 〇 2.6 to 1 02. The temperature of 9dPa·s is better. If the viscosity of the molten glass exceeds 1029 dPa · s, the initial melting becomes difficult to homogenize. Therefore, it is preferable to have a temperature of 1029 dPa·s or less. Further, in the step (a), the temperature is preferably 1400 ° C or higher, and the temperature in the step (a) is such that the viscosity of the molten glass exceeds the temperature of 1200 dPas. Vitrification. Therefore, the clarification can be effectively carried out in the step (b) of the latter stage, and the bubbles in the glass can be reduced. As described above, in the present invention, at least Sn02 is used as the clarifying agent, and it is necessary to heat the glass raw material at a relatively low temperature even if the viscosity of the molten glass is higher than 1024 dPa·s to obtain molten glass. © However, if only boronic acid is used as the boron source, unmelted cerium oxide is likely to be generated in the molten glass because the cerium is easily aggregated at this temperature. On the other hand, in the present invention, the raw material of the glass base material contains boronic anhydride as a boron source, and even at this temperature, the glass raw material can be uniformly melted, and the generation of unmelted cerium oxide is also suppressed. The time of step (a) is preferably divided into 1 to 900, and more preferably 150 to 500. (Step (b)) -17- 200927686 Step (b) is a clarification step of 'molding the molten glass at a relatively high temperature even if the viscosity of the molten glass is below 1 〇 2_4 dPa · s' and is more than the aforementioned step (a) Heating at a temperature higher than 30 ° C at a temperature higher than 'the valence of Sn causes the clarified gas to produce a step of defoaming the bubbles in the molten glass. The temperature in the step (b) is such that the viscosity of the molten glass is not more than 24 dPa · s, so that the viscosity of the molten glass is preferably 1 〇 2 3 dPa s or less, so that the viscosity of the molten glass is good. The temperature is preferably 1〇18~l〇22dPa·s. When the viscosity of the molten glass is less than iO^dPa · s, the furnace material is liable to be corroded and becomes liable to be defective. Therefore, it is preferable to use a temperature of 10 〇 18 dPa · s or more. Further, the temperature in the step (b) is a temperature higher than the temperature in the above step (a) by more than 30 °C, and is higher than the temperature in the above step (a) by 50. (The above temperature is preferably a temperature higher than the temperature in the above step (a) by 70 ° C or higher. Further, the temperature in the step (b) is 1 700 ° C or less. The temperature in b) is such that the viscosity of the molten glass is 1 〇 2 4 dPa · s or less, and the temperature is higher than the temperature in the above step (a) by more than 30 ° C, the clarified gas can be efficiently generated. Efficient clarification can reduce the bubbles in the glass. The time of step (b) is better divided into 60~800, and the ratio of 120~300 is better. The viscosity of molten glass is measured by high temperature rotary viscometer. 18- 200927686 Step (iii), Step (iv): In the steps (iii) and (iv), molding, slow cooling, and cutting are carried out in the same manner as in the known method for producing alkali-free glass. <Alkaloid-free glass> The alkali-free glass obtained by the production method of the present invention has a glass base material composition containing SiO2 derived from cerium and B2〇3 derived from a boron source. The alkali-free glass is substantially free of Na20. An alkali metal oxide such as K20. Here, substantially no alkali metal oxide is contained. It means that the alkali metal oxide is not contained in addition to the unavoidable impurities from the raw materials, etc., that is, 'meaning that the alkali metal oxide is not intentionally contained. Hereinafter, the ideal glass base material composition for the alkali-free glass will be described. 〇Glass base material composition (1): Q Alkali-free glass, which has characteristics (thermal expansion coefficient: 25χ10_7 to 60x10_7/°C), chemical resistance, durability, etc., as a glass for liquid crystal display substrates, and is suitable for molding into sheet glass. From the viewpoint of the mass percentage based on the oxide, the alkali-free glass of the following glass base material composition (1) is preferred. 81〇2: 50 to 66% by mass, 12〇3:10.5 to 22% by mass, 82〇3: 5 to 12% by mass, MgO: 0 to 8% by mass, CaO: 〇~14.5% by mass, SrO: 〇 ~24% by mass, BaO: 0 to 13.5% by mass, MgO + CaO + SrO + BaO: 9 to 29.5 Mass 〇/〇-19- 200927686 Glass base material composition (2): Alkali-free glass' strain point is 640 ° C or more, the coefficient of thermal expansion and density are small, and it is possible to suppress the white turbidity caused by the buffer-grade hydrofluoric acid (BHF) used for etching. It is also excellent in durability against chemicals such as hydrochloric acid, and it is easy to melt and form. From the viewpoint of the molding of the formula, it is more preferable that the alkali-free glass based on the oxide base is represented by the following glass base material (2).

Si02: 58 〜66 質量 %、a1203: 15 〜22 質量 %、B2〇3 :5〜12質量%、MgO: 〇〜8質量%、CaO: 0〜9質量%、 SrO : 3 〜12.5 質量。/。、BaO : 0 〜2 質量 %、MgO + CaO + SrO + BaO:9〜18 質量 % . . · (2)。 說明關於本組成系之各組成。 藉由使Si02爲58質量%以上,無鹼玻璃的應變點上 升,耐藥品性變的良好,熱膨脹係數降低。藉由使Si02 Q 爲66質量%以下,玻璃之熔融性變的良好,失透特性變的 良好。Si02: 58 to 66% by mass, a1203: 15 to 22% by mass, B2〇3: 5 to 12% by mass, MgO: 〇~8 mass%, CaO: 0 to 9 mass%, and SrO: 3 to 12.5 mass. /. , BaO : 0 〜 2 mass %, MgO + CaO + SrO + BaO: 9~18 mass % . . · (2). Explain the composition of the composition. When the SiO 2 is 58% by mass or more, the strain point of the alkali-free glass rises, the chemical resistance is improved, and the thermal expansion coefficient is lowered. When the SiO 2 Q is 66% by mass or less, the meltability of the glass is improved, and the devitrification property is improved.

Al2〇3爲抑制無鹼玻璃之分相,降地熱膨脹係數,提 高應變點。 藉由使Al2〇3爲15質量%以上,可以發現上述效果。 藉由使Al2〇3爲22質量%以下,玻璃之熔融性則變的良好 〇 B2〇3爲抑制由BHF造成之無鹼玻璃之白濁,並不提 升高溫下之黏性,降低無鹼玻璃之熱膨脹係數及密度。 -20- 200927686 藉由使B2〇3爲5質量%以上,無鹼玻璃之耐BHF性 變的良好。藉由使B2〇3爲12質量%以下,無鹼玻璃之耐 酸性變的良好,應變點也同時上升。Al2〇3 is used to suppress the phase separation of the alkali-free glass, lower the coefficient of thermal expansion, and increase the strain point. The above effect can be found by making Al2〇3 15% by mass or more. When Al2〇3 is 22% by mass or less, the meltability of the glass is improved. B2〇3 suppresses the white turbidity of the alkali-free glass caused by BHF, does not increase the viscosity at high temperatures, and lowers the alkali-free glass. Thermal expansion coefficient and density. -20- 200927686 When B2〇3 is 5% by mass or more, the BHF resistance of the alkali-free glass is good. When B2〇3 is 12% by mass or less, the acid resistance of the alkali-free glass is improved, and the strain point is also increased.

MgO爲抑制無鹼玻璃之熱膨脹係數、密度之上昇’使 玻璃原料之熔融性提升。 藉由使MgO爲8質量%以下,可抑制由BHF造成爲 之白濁,抑制無鹼玻璃之分相。 0 CaO爲提升玻璃原料之熔融性。 藉由使CaO爲9質量%以下,無鹼玻璃之熱膨脹係數 降低,失透特性變的良好。MgO improves the meltability of the glass raw material by suppressing the increase in the thermal expansion coefficient and the density of the alkali-free glass. When MgO is 8% by mass or less, white turbidity caused by BHF can be suppressed, and phase separation of the alkali-free glass can be suppressed. 0 CaO is the melting property of the glass raw material. When CaO is 9% by mass or less, the thermal expansion coefficient of the alkali-free glass is lowered, and the devitrification property is improved.

SrO爲抑制無鹼玻璃之分相,抑制由BHF造成之無鹼 玻璃之白濁。 藉由使SrO爲3質量%以上’可發現上述效果。藉由 使SrO爲12.5質量%以下,無鹼玻璃之熱膨脹係數降低。 BaO爲抑制無鹼玻璃之分相,提升熔融性’且提升失 Q 透特性。 藉由使BaO爲2質量%以下,降低無鹼玻璃之密度’ 降低熱膨脹係數。但’若考慮對環境的負擔’以實質上不 含有爲佳。 藉由使MgO + CaO + SrO + BaO爲9質量%以上,玻璃之 溶融性變的良好。藉由使Mg〇 + Ca0 + Sr0 + Ba0爲18質量 %以下,則無鹼玻璃之密度降低。 玻璃母材組成(3 ): -21 - 200927686 無鹼玻璃,從作爲液晶顯示基板用玻璃其之特性優良 ,耐還原性、均質性、抑制泡爲優、適合經浮式法所成型 之觀點來看,以氧化物基準之質量百分比表示下,以下述 玻璃母材組成(3 )之無鹼玻璃爲特佳。SrO suppresses the phase separation of the alkali-free glass and suppresses the white turbidity of the alkali-free glass caused by BHF. The above effects can be found by making SrO 3 mass% or more. When the SrO is 12.5% by mass or less, the coefficient of thermal expansion of the alkali-free glass is lowered. BaO suppresses the phase separation of the alkali-free glass, improves the meltability, and improves the Q-transfer characteristics. By making BaO 2% by mass or less, the density of the alkali-free glass is lowered, and the coefficient of thermal expansion is lowered. However, it is preferable to consider that the burden on the environment is not substantially contained. When the MgO + CaO + SrO + BaO is 9% by mass or more, the solubility of the glass becomes good. When Mg 〇 + Ca0 + Sr0 + Ba0 is 18% by mass or less, the density of the alkali-free glass is lowered. Glass base material composition (3): -21 - 200927686 Alkali-free glass, which is excellent in properties as a glass for liquid crystal display substrates, and is resistant to reduction, homogeneity, suppression of bubbles, and suitable for molding by floating method. It is preferable that the alkali-free glass of the following glass base material composition (3) is represented by the mass percentage of the oxide base.

Si02 : 50 〜61.5 質量 %、Al2〇3 : 10.5 〜18 質量 %、 3203:7〜10質量%、]^^0:2〜5質量%、€&0:0〜14.5 質量 %、SrO : 0 〜24 質量 %、BaO : 0 〜1 3.5 質量 %、MgO + CaO + SrO + BaO : 1 6 〜2 9 · 5 質量 % · . . ( 3 )。 說明關於本組成系之各組成。 藉由使Si〇2爲50質量%以上,則無鹼玻璃之耐酸性 變的良好、密度下降、應變點上升、熱膨脹係數下降、楊 氏模數上升。藉由使Si02爲61.5質量%以下’則無鹼玻 璃之失透特性變的良好。 M2〇3爲抑制無鹼玻璃之分相,提升應變點,提升楊 氏模數。 藉由使Al2〇3爲10.5質量%以上,則可發現上述效果 。藉由使Al2〇3爲18質量%以下’無鹼玻璃之失透特性、 耐酸性及耐BHF性變的良好。 B2〇3爲降低無鹼玻璃之密度,提升耐BHF性’提升 熔融性,失透特性變的良好’使熱膨脹係數下降。 藉由使B2〇3爲7質量%以上,可發現上述效果。藉由 使B2〇3爲1〇質量%以下,無鹼玻璃之應變點上升’楊氏 模數上升,耐酸性變的良好。Si02: 50 to 61.5% by mass, Al2〇3: 10.5 to 18% by mass, 3203: 7 to 10% by mass, ]^^0: 2 to 5% by mass, €&0: 0 to 14.5% by mass, SrO: 0 to 24% by mass, BaO: 0 to 1 3.5% by mass, MgO + CaO + SrO + BaO : 1 6 to 2 9 · 5 % by mass · ( ). Explain the composition of the composition. When Si〇2 is 50% by mass or more, the acid resistance of the alkali-free glass is improved, the density is lowered, the strain point is increased, the coefficient of thermal expansion is lowered, and the Young's modulus is increased. When the SiO 2 is 61.5 mass% or less, the devitrification property of the alkali-free glass becomes good. M2〇3 is to suppress the phase separation of the alkali-free glass, increase the strain point, and increase the Young's modulus. The above effect can be found by setting Al2〇3 to 10.5% by mass or more. When Al2〇3 is 18% by mass or less, the devitrification resistance of the alkali-free glass, the acid resistance, and the BHF resistance are improved. B2〇3 reduces the density of the alkali-free glass, improves the BHF resistance, improves the meltability, and deteriorates the devitrification property, which lowers the coefficient of thermal expansion. The above effect can be found by making B2〇3 7 mass% or more. When B2〇3 is 1% by mass or less, the strain point of the alkali-free glass rises, and the Young's modulus increases, and the acid resistance becomes good.

MgO爲使無鹼玻璃之密度降低’且不提高熱膨脹係數 -22- 200927686 ,使應變點不過大地降低’且使熔融性提升。 藉由使MgO爲2質量%以上,可發現上述效果°藉由 使M g Ο爲5質量%以下,則無鹼玻璃之分相被抑制’失透 特性、耐酸性及耐BHF性變的良好。MgO is such that the density of the alkali-free glass is lowered 'and the coefficient of thermal expansion is not increased -22-200927686, so that the strain point is not greatly lowered' and the meltability is improved. When the MgO is 2% by mass or more, the effect of the above-mentioned effect is obtained. When the Mg Ο is 5% by mass or less, the phase separation of the alkali-free glass is suppressed, and the devitrification property, the acid resistance, and the BHF resistance are improved. .

CaO爲並不使無鹼玻璃之密度提高,不使熱膨脹係數 提高,不使應變點過大地降低’提升熔融性。 藉由使CaO爲14.5質量%以下,無鹼玻璃之失透特性 0 變的良好,熱膨脹係數降低’密度降低’耐酸性及耐鹼性 變的良好。CaO does not increase the density of the alkali-free glass, does not increase the coefficient of thermal expansion, and does not reduce the strain point excessively to increase the meltability. When CaO is 14.5% by mass or less, the devitrification property of the alkali-free glass becomes good, and the coefficient of thermal expansion is lowered, and the density is lowered, and the acid resistance and alkali resistance are improved.

SrO爲不使無鹼玻璃之密度提高’不使熱膨脹係數提 高,不使應變點過大地降低,提升熔融性。 藉由使SrO爲24質量%以下,無鹼玻璃之失透特性 變的良好,熱膨脹係數降低,密度降低’耐酸性及耐鹼性 變的良好。 B aO爲抑制無鹼玻璃之分相,使失透特性提升,使耐 Q 藥品性提升。 藉由使BaO爲13.5質量%以下’無鹼玻璃之密度降低 ,熱膨脹係數降低,楊氏模數提升’熔融性變的良好,耐 BHF性變的良好。 但,若考慮對環境的負擔,以實質上不含有爲佳。 藉由使MgO + CaO + SrO + BaO爲16質量%以上,玻璃 之熔融性變的良好。藉由使MgO + CaO + SrO + BaO爲29.5 質量%以下,無鹼玻璃之密度、熱膨脹係數下降。 藉由以上所說明之本發明之無鹼玻璃之製造方法,作 -23- 200927686 爲前述矽砂,D5〇爲15〜60 l·1111’且使用粒徑100 以上 之粒子的比例爲2.5體積%以下者,作爲硼源,使用硼源 1〇〇質量% (以b2〇3換算)之中,含有硼酸酐1〇〜1〇〇質 量% (以B2〇3換算)者’作爲澄清劑’至少使用Sn〇2 ’ 因玻璃原料之熔融係以至少上述之步驟(a)、步驟(b) 之2步驟進行,可得到玻璃中之泡爲少’均質性、平坦度 爲高之無鹼玻璃。 ❹ 〔實施例〕 以下舉出實施例來具體說明本發明,但當然地本發明 並不應受此些實施例所限定而被解釋。 例1、2爲表示低溫熔融性之實驗例、例3〜5、7、8 爲實施例、例6爲比較例。 〔例1〕 Q 以氧化物基準之質量百分比表示下,使成爲具有si〇2 :6 0 質量 %、a 12 0 3 : 1 7 質量 %、B 2 0 3 : 8 質量 %、M g 0 : 3質量%、CaO : 4質量%、SrO : 8質量%之玻璃母材組成 之無鹼玻璃,矽砂^050:27411^粒徑ΙΟΟμιη以上之粒 子之比例:〇體積%、〇99 (粒度分佈中之體積頻度佔有 99%之粒子徑)·· 69μιη。),作爲硼源以硼酸酐(1〇〇質 量%) ’作爲鋁源以αι2ο3,及調製其他之原料使成玻璃 母材組成原料,更進一步作爲澄清劑,相對於該玻璃母材 組成原料’添加0.5質量%之Sn02、0.5質量%之SrCl4及 -24- 200927686 0.3質量%之CaS04 · 2H20,使成爲玻璃原料。 將玻璃化後之質量爲成爲250g之量之玻璃原料放入 高90mm、外徑70mm之有底圓筒形之鉑铑製坩鍋。將該 坩鍋放入加熱爐,一邊從加熱爐的側面吹入露點爲60°C之 空氣,在1 525 °C (熔融玻璃之黏度成爲102 6dPa· s之溫 度)下加熱30分後,藉由攪拌器強制的在坩鍋內攪拌30 分鐘,使玻璃原料熔融後。其後,停止攪拌,靜置60分 0 鐘,坩鍋內之熔融玻璃流出至碳板上,在緩冷卻爐中冷卻 。冷卻後,將樣品從緩冷卻爐中取出,從樣品的邊緣一邊 以光照射,藉由實體顯微鏡,一邊計數未熔二氧化矽之數 目。結果如表1所示。 又,使玻璃原料之熔融溫度成爲1 5 5 0 °C (熔融玻璃之 黏度成爲l〇25dPa · s之溫度)實施了相同之評價。結果 如表1所示。 © 〔例 2〕 除了將矽砂1取代爲使用矽砂2 ( D5G : 39μιη、粒徑 ΙΟΟμιη以上之粒子之比例:4.2體積%、D99 :丨53^1111 )、 作爲硼源使用了正硼酸(1 00質量% )以外,與例1進行 了相同的評價。結果如表1所示。 -25- 200927686 〔表1〕 熔融溫度 rc) 熔融玻璃 之黏度 (dPa . s) 未融二氧化砂量(個/kg) 例1 例2 矽砂1+硼酸酐 矽砂2+正硼酸 1525 1025 757 1230 1550 ίο2·5 1 188 1021 將本發明之構成(D5o: 15〜60μπι、粒徑ΙΟΟμηι以上 之粒子之比例:2.5體積%以下)之矽砂1與硼酸酐之組 〇 合,與本發明之構成相異之矽砂2與正硼酸之組合相比較 後,得知未融二氧化矽之量爲少’且在更低溫下可進行初 期溶解。又,由於未融二氧化矽之量爲少’均質性爲高之 玻璃。又,可得到將板玻璃成型時其平坦度爲高之玻璃。 〔例3〕 與例1相同之玻璃母材組成原料,更進一步作爲澄清 劑,相對於該玻璃母材組成原料,添加〇·5質量%的Sn〇2 ,使成玻璃原料。 步驟(a): 將該玻璃原料之半量(以玻璃換算相當於125g)放入 300cc之鉑坩鍋,在1500 1 (熔融玻璃之黏度成爲 1 02 7dPa . s之溫度)之電爐中靜置30分鐘。暫且從電爐 中取出鉑坩鍋,追加剩下的另一半量(以玻璃換算相當於 125g),再次靜置於1500 T:(熔融玻璃之黏度成爲 1027dPa. s之溫度)之電爐中30分鐘使玻璃原料熔融。 -26- 200927686 步驟(b ) ·· 其後,迅速轉移至1 590 °C(熔融玻璃之黏度成爲 1 02 3dPa · s之溫度)之電爐,靜置30分鐘。其後,轉移 至730°C之電爐,花費2小時使玻璃緩冷卻至610°C,更 進一步,約花費1 〇小時使玻璃緩冷卻至室溫。然後,將 坩鍋之上方中央的玻璃以取心鑽貫穿直徑38mm、高35mm 0 之圓柱狀玻璃,如圖1所示,將包含該圓柱狀玻璃10之 中心軸12厚爲2〜5mm之玻璃板14切出。將切出面之兩 面予以光學硏磨加工(鏡面硏磨表面處理),製作出評價 用樣品。對關於相當於由坩鍋之玻璃上面1〜1 0mm之間 之部位,將光學硏磨加工面以實體顯微鏡觀察,計測玻璃 板中之直徑5 Ομιη以上之泡數,將其値除以玻璃板之體積 ,作爲殘留泡數。結果如表2所示。 除了將步驟(a)之溫度變更爲1550 1:(熔融玻璃之 黏度成爲102 5dPa ♦ s溫度)以外,與例3進行了相同的 評價。結果如表2所示。 〔例5〕 以氧化物基準之質量百分比表示下,使成爲具有Si 02 :60 質量 %、a12〇3 : 17 質量。/。、B2〇3 : 8 質量 %、MgO : 5質量%、Ca〇 : 6質量%、SrO : 4質量%之玻璃母材組成 -27- 200927686 之無鹼玻璃,矽砂1,作爲硼源以硼酸酐(1 〇 〇質量% ), 作爲鋁源以Α1203、及調製其他之原料成爲玻璃母材組成 原料,更進一步,作爲澄清劑,相對於該玻璃母材組成原 料,添加0.5質量%之Sn〇2,使成玻璃原料。 步驟(〇 : 將該玻璃原料之半量(以玻璃換算相當於125g)放入 0 300CC之鈾坩鍋,在 1500 °C (熔融玻璃之黏度成爲 1025dPa· s之溫度)之電爐中靜置30分鐘。暫且從電爐 中取出鉑坩鍋,追加剩下的另一半量(以玻璃換算相當於 125g),再次靜置於ISOOt:(熔融玻璃之黏度成爲 102 5dPa · s之溫度)之電爐中30分鐘使玻璃原料熔融。 步驟(b): 其後’迅速轉移至1590 °C (熔融玻璃之黏度成爲 ❹1〇21心 • s之溫度)之電爐,靜置30分鐘。其後,轉移 至730 °C之電爐,花費2小時使玻璃緩冷卻至610 °C,更 進一步約花費10小時使玻璃緩冷卻至室溫。然後,與例3 同樣地進行製作了評價用樣品,求得殘留泡數。結果如表 2所示。 〔例6〕 準備了與例2相同的玻璃原料。 -28- 200927686 步驟(a ): 將該玻璃原料之半量(以玻璃換算相當於125g)放入 300cc之鈾坩鍋、在1590 °c (熔融玻璃之黏度成爲 1 02 3dPa· s之溫度)之電爐中靜置30分鐘。暫且從電爐 將鉑坩鍋取出,追加剩下的另一半量(以玻璃換算相當於 125g),再次靜置於1590 °C (熔融玻璃之黏度成爲 1023dPa· s之溫度)之電爐中30分鐘後溶解。 © 步驟(b ): 其後,迅速轉移至1590 °C (熔融玻璃之黏度成爲 102 3dPa· s之溫度)之電爐,靜置3〇分鐘。其後,轉移 至73 0°C之電爐,花費2小時使玻璃緩冷卻至610°C、更 進一步約花費1 〇小時使玻璃緩冷卻至室溫。然後’與例3 同樣地進行製作了評價用樣品,求得殘留泡數。結果如袠 2所示。SrO does not increase the density of the alkali-free glass. 'The thermal expansion coefficient is not increased, and the strain point is not excessively lowered to improve the meltability. When SrO is 24% by mass or less, the devitrification property of the alkali-free glass is improved, the coefficient of thermal expansion is lowered, and the density is lowered, and the acid resistance and alkali resistance are improved. B aO suppresses the phase separation of the alkali-free glass, improves the devitrification property, and improves the Q-resistant drug property. When BaO is 13.5% by mass or less, the density of the alkali-free glass is lowered, the coefficient of thermal expansion is lowered, and the Young's modulus is improved, and the meltability is improved, and the BHF resistance is improved. However, if you consider the burden on the environment, it is better not to contain it. When the MgO + CaO + SrO + BaO is 16% by mass or more, the meltability of the glass is improved. When the MgO + CaO + SrO + BaO is 29.5% by mass or less, the density and thermal expansion coefficient of the alkali-free glass are lowered. According to the method for producing an alkali-free glass of the present invention as described above, -23-200927686 is the above-mentioned ceramsite, D5〇 is 15 to 60 l·1111', and the ratio of particles having a particle diameter of 100 or more is 2.5% by volume. In the following, as a boron source, a boron source is used in an amount of 1% by mass (calculated as b2〇3), and 1 to 1% by mass of boric anhydride (in terms of B2〇3) is used as a clarifying agent. Use of Sn 〇 2 ' Since the melting of the glass raw material is carried out in at least the above steps (a) and (b), the alkali-free glass having a low degree of homogeneity and high flatness in the glass can be obtained. [Embodiment] The present invention will be specifically described by the following examples, but it should be understood that the invention should not be construed as limited. Examples 1 and 2 are experimental examples showing low-temperature meltability, Examples 3 to 5, 7 and 8 are Examples, and Example 6 is a comparative example. [Example 1] Q is represented by the mass percentage of the oxide, and has Si 〇 2 : 60 mass %, a 12 0 3 : 17 mass%, B 2 0 3 : 8 mass%, and M g 0 : 3% by mass, CaO: 4% by mass, SrO: 8% by mass of an alkali-free glass composed of a glass base material, 矽砂^050:27411^Particle ratio of particles larger than ιμηη: 〇% by volume, 〇99 (Particle size distribution) The volumetric frequency in the medium accounts for 99% of the particle diameter)··················· As a boron source, boric anhydride (1% by mass) is used as the aluminum source to form a raw material of the glass base material, and other raw materials are used to form a raw material for the glass base material, and further as a clarifying agent, a raw material is formed with respect to the glass base material. 0.5% by mass of Sn02, 0.5% by mass of SrCl4, and -24 to 200927686 0.3% by mass of CaS04 · 2H20 were added to make a glass raw material. The vitrified glass material having a mass of 250 g was placed in a bottomed cylindrical platinum crucible having a height of 90 mm and an outer diameter of 70 mm. The crucible was placed in a heating furnace, and air having a dew point of 60 ° C was blown from the side of the heating furnace, and heated at 30 ° C at 1 525 ° C (the viscosity of the molten glass was 102 6 dPa·s). The glass material was melted by stirring in a crucible for 30 minutes by a stirrer. Thereafter, the stirring was stopped, and the mixture was allowed to stand for 60 minutes, and the molten glass in the crucible was discharged to the carbon plate and cooled in a slow cooling furnace. After cooling, the sample was taken out from the slow cooling furnace, irradiated with light from the edge of the sample, and the number of unmelted cerium oxide was counted by a solid microscope. The results are shown in Table 1. Further, the same evaluation was carried out by setting the melting temperature of the glass raw material to 1550 ° C (the viscosity of the molten glass was 10 d 25 dPa · s). The results are shown in Table 1. © [Example 2] In addition to the use of strontium sand 1 (D5G: 39μιη, the ratio of particles larger than ΙΟΟμηη: 4.2% by volume, D99: 丨53^1111), orthoboric acid was used as the boron source ( The same evaluation as in Example 1 was carried out except that 100% by mass. The results are shown in Table 1. -25- 200927686 [Table 1] Melting temperature rc) Viscosity of molten glass (dPa. s) Amount of unmelted sand dioxide (pcs/kg) Example 1 Example 2 Silicate sand 1 + boric anhydride strontium sand 2+ orthoboric acid 1525 1025 757 1230 1550 ίο2·5 1 188 1021 The composition of the present invention (D5o: a ratio of particles of 15 to 60 μm, a particle size of ΙΟΟμηι or more: 2.5% by volume or less) is combined with a group of boric anhydride, and the present invention When the composition of the samarium 2 and the orthoboric acid are different, the amount of the unmelted cerium oxide is found to be small, and the initial dissolution can be performed at a lower temperature. Further, since the amount of unmelted cerium oxide is small, the glass having high homogeneity is high. Further, it is possible to obtain a glass having a high flatness when the sheet glass is molded. [Example 3] The glass base material composition raw material similar to that of Example 1 was further used as a clarifying agent, and 〇·5 mass% of Sn〇2 was added to the glass base material constituent raw material to form a glass raw material. Step (a): A half amount of the glass raw material (corresponding to 125 g in terms of glass) is placed in a 300 cc platinum crucible, and allowed to stand in an electric furnace of 1500 1 (the viscosity of the molten glass is 1 02 7 dPa·s). minute. Temporarily take out the platinum crucible from the electric furnace, and add the remaining half (125 g equivalent in terms of glass), and again set it in an electric furnace at 1500 T: (the viscosity of the molten glass is 1027 dPa·s) for 30 minutes. The glass raw material is melted. -26- 200927686 Step (b) ·· Then, quickly transfer to an electric furnace at 1 590 °C (the viscosity of the molten glass becomes 1 02 3dPa · s) and let stand for 30 minutes. Thereafter, the furnace was transferred to an electric furnace at 730 ° C, and it took 2 hours to slowly cool the glass to 610 ° C. Further, it took about 1 hour to cool the glass to room temperature. Then, the glass in the center of the upper portion of the crucible is drilled through a cylindrical glass having a diameter of 38 mm and a height of 35 mm 0. As shown in FIG. 1, the glass containing the central axis 12 of the cylindrical glass 10 is 2 to 5 mm thick. The board 14 is cut out. The two sides of the cut surface were subjected to optical honing processing (mirror honing surface treatment) to prepare a sample for evaluation. For the portion corresponding to the area between 1 and 10 mm from the top of the glass of the crucible, the optically honed surface was observed with a stereoscopic microscope, and the number of bubbles of 5 Ομηη or more in the glass plate was measured, and the glass plate was removed. The volume is the number of residual bubbles. The results are shown in Table 2. The same evaluation as in Example 3 was carried out, except that the temperature in the step (a) was changed to 1550 1: (the viscosity of the molten glass was 102 5 dPa ♦ s). The results are shown in Table 2. [Example 5] The mass ratio of Si 02 : 60% by mass and a12 〇 3 : 17 mass were expressed as a percentage by mass based on the oxide. /. , B2〇3: 8 mass%, MgO: 5 mass%, Ca〇: 6 mass%, SrO: 4 mass% of glass base material composition -27-200927686 alkali-free glass, strontium sand 1, boric acid as boron source An anhydride (1% by mass), an aluminum source of Α1203, and other raw materials to be used as a raw material for the glass base material, and further, as a clarifying agent, 0.5% by mass of Sn 添加 is added to the raw material of the glass base material. 2, made into glass raw materials. Step (〇: The half of the glass raw material (125 g equivalent in terms of glass) was placed in a 0 300 cc uranium crucible, and allowed to stand in an electric furnace at 1500 ° C (the viscosity of the molten glass was 1025 dPa·s) for 30 minutes. Temporarily take out the platinum crucible from the electric furnace, add the remaining half amount (125 g in terms of glass), and place it again in an electric furnace of ISOOt: (the viscosity of the molten glass becomes 102 5 dPa · s) for 30 minutes. The glass raw material is melted. Step (b): Thereafter, the furnace is rapidly transferred to an electric furnace at 1590 ° C (the viscosity of the molten glass is ❹ 1 〇 21 hearts • s), and allowed to stand for 30 minutes. Thereafter, it is transferred to 730 ° C. In the electric furnace, the glass was slowly cooled to 610 ° C for 2 hours, and the glass was gradually cooled to room temperature for about 10 hours. Then, a sample for evaluation was prepared in the same manner as in Example 3, and the number of residual bubbles was determined. As shown in Table 2. [Example 6] The same glass raw material as in Example 2 was prepared. -28- 200927686 Step (a): A half amount of the glass raw material (125 g equivalent in terms of glass) was placed in a 300 cc uranium crucible At 1590 °c (viscosity of molten glass) The electric furnace was allowed to stand for 30 minutes in an electric furnace of 1 02 3 dPa·s. The platinum crucible was taken out from the electric furnace, and the remaining half amount (125 g in terms of glass) was added, and the temperature was again set at 1590 ° C ( After 30 minutes in an electric furnace in which the viscosity of the molten glass is 1023 dPa·s, it is dissolved. © Step (b): Thereafter, the furnace is rapidly transferred to 1590 ° C (the viscosity of the molten glass is 102 3 dPa·s). After standing for 3 minutes, it was transferred to an electric furnace at 73 ° C. It took 2 hours to slowly cool the glass to 610 ° C, and further took about 1 hour to cool the glass to room temperature. Then, with Example 3 In the same manner, a sample for evaluation was prepared, and the number of residual bubbles was determined. The results are shown in 袠2.

〔表2〕 步驟⑻ 步驟(b) 酿差 殘留 溫度 黏度 獲 黏度 時間 (b)-(a) (個/cm3) (°C) (dPa · s) CC) (dPa · s) (分) (°C) 例3 1500 ίο2·7 1590 1〇2.3 30 90 '〜 60 例4 1550 1025 1590 1023 30 40 215 例5 1500 1〇2.5 1590 1021 15 90 160 例6 1590 1〇2.3 1590 1023 30 0 1235[Table 2] Step (8) Step (b) Brewing residual temperature viscosity Viscosity time (b)-(a) (pieces/cm3) (°C) (dPa · s) CC) (dPa · s) (minutes) ( °C) Example 3 1500 ίο2·7 1590 1〇2.3 30 90 '~ 60 Example 4 1550 1025 1590 1023 30 40 215 Example 5 1500 1〇2.5 1590 1021 15 90 160 Example 6 1590 1〇2.3 1590 1023 30 0 1235

-29- 200927686 除了作爲銘源使用了 Al(OH) 3以外,與例1同樣地 進丫了 ’使成玻璃母材組成原料’更進一步作爲澄清劑,相 對於該玻璃母材組成原料,添加0.5質量%之Sn〇2、〇 5 質量%之SrCl4、.0.3質量%之CaS〇4· 2H20及0.1質量% 之CaF2,作爲玻璃原料。 除了使用了以上述所得之玻璃原料以外,與例3同樣 地進行,作成評價用樣品,求得殘留泡數。結果如表3所 〔例8〕 除了將步驟(a)之溫度變更爲1450。〇 (熔融玻璃之 黏度成爲102 + 8dPa.s之溫度)以外,與例7進行了相同 之評價。結果如表3所示。 〔表3〕 步驟⑻ 步驟(b) 溫度差 殘留泡數 酿 黏度 溫度 黏度 時間 (b)-(a) (個/cm3) CC) (dPa · s) CC) (dPa · s) (分) (°C) 例7 1500 1〇2·7 1590 1023 30 90 50 例8 1475 1〇2.8 1590 1023 30 115 45 將於步驟(a)中將玻璃原料在熔融玻璃之黏度成爲 超過1 02 4dPa . s之溫度下加熱,於步驟(b)中將熔融玻 璃在熔融玻璃之黏度成爲102 4dPa . s以下之溫度下,且 比前述步驟(a)中溫度高30 °C以上之溫度下加熱過後之 例3〜5,與於步驟(a)中也將玻璃原料在熔融玻璃之黏 -30- 200927686 度成爲l〇2 4dPa · s以下之溫度下加熱,步驟(a)與步驟 (b )之熔融玻璃的黏度無差別之例6相比較,得知殘留 泡數爲少,澄清效果爲大一事。 更進一步,玻璃母材組成原料中含有A1 ( OH ) 3之例 7及8中得知,特別係例8,步驟(a)中將玻璃原料在低 溫下溶解,就算熔融玻璃之黏度變高,也可得到良好之熔 融特性,例7、8中殘留泡數爲少,且澄清效果爲大一事 〇 〔產業上之可利用性〕 藉由本發明之製造方法所得到之無鹼玻璃,其玻璃中 之泡爲少,均質性、平坦度爲高。又,因含有B2〇3其耐 藥品性及耐久性也極優。該無鹼玻璃,作爲液晶顯示基板 用玻璃等極爲有用。 尙,本說明書之全內容,係引用自於2007年10月25 Q 日申請專利之日本專利申請2007-277802號的說明書、專 利申請範圍、圖式及摘要之全內容,以作爲本發明的說明 書揭示,本發明說明書係爲引用其者。 【圖式簡單說明】 〔圖1〕爲表示從圓柱狀玻璃中切出樣品用之玻璃板 部份之圖。 【主要元件符號說明】 -31 - 200927686 1 0 :玻璃 1 2 :中心軸 1 4 :玻璃板-29- 200927686 In addition to the use of Al(OH) 3 as a source of the same, in the same manner as in the case of the example 1, the raw material of the glass base material was further used as a clarifying agent, and the raw material of the glass base material was added. 0.5% by mass of Sn〇2, 〇5 mass% of SrCl4, 0.3% by mass of CaS〇4·2H20, and 0.1% by mass of CaF2 are used as glass raw materials. In the same manner as in Example 3 except that the glass raw material obtained above was used, a sample for evaluation was prepared, and the number of residual bubbles was determined. The results are shown in Table 3 [Example 8] except that the temperature of the step (a) was changed to 1450. The same evaluation as in Example 7 was carried out except that 黏 (the viscosity of the molten glass was changed to a temperature of 102 + 8 dPa·s). The results are shown in Table 3. [Table 3] Step (8) Step (b) Temperature difference Residual bubble number Brewing viscosity Temperature viscosity time (b)-(a) (pieces/cm3) CC) (dPa · s) CC) (dPa · s) (minutes) °C) Example 7 1500 1〇2·7 1590 1023 30 90 50 Example 8 1475 1〇2.8 1590 1023 30 115 45 The viscosity of the glass raw material in the molten glass will be more than 1 02 4dPa in the step (a). Heating at a temperature, in the step (b), the molten glass is heated at a temperature of 102 4 dPa·s or less, and heated at a temperature higher than the temperature in the step (a) by 30 ° C or higher. 〜5, and in step (a), the glass raw material is also heated at a temperature of -30-200927686 degrees of molten glass to a temperature below l〇2 4dPa·s, and the molten glass of step (a) and step (b) In comparison with Example 6 in which the viscosity is not different, it is found that the number of residual bubbles is small, and the clarification effect is a big one. Further, in Examples 7 and 8 in which the glass base material composition contains A1(OH)3, it is known that, in particular, in Example 8, the glass raw material is dissolved at a low temperature in the step (a), even if the viscosity of the molten glass becomes high, Good melting characteristics are also obtained, and the number of residual bubbles in Examples 7 and 8 is small, and the clarifying effect is a big one. [Industrial Applicability] The alkali-free glass obtained by the production method of the present invention is in the glass. The bubbles are small, and the homogeneity and flatness are high. In addition, it contains B2〇3, which is excellent in chemical resistance and durability. This alkali-free glass is extremely useful as a glass for a liquid crystal display substrate. The entire contents of the specification are the entire contents of the specification, the patent application, the drawings and the abstract of the Japanese Patent Application No. 2007-277802, filed on Jan. It is disclosed that the description of the present invention is incorporated by reference. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] is a view showing a portion of a glass plate for cutting a sample from a cylindrical glass. [Description of main component symbols] -31 - 200927686 1 0 : Glass 1 2 : Center axis 1 4 : Glass plate

-32-32

Claims (1)

200927686 十、申請專利範圍 !· 一種無鹼玻璃之製造方法,其係對含有矽砂及硼 源之玻璃母材組成原料中添加了澄清劑之玻璃原料進行熔 融而成形之無鹼玻璃之製造方法,其特徵爲, 作爲上述矽砂,使用中徑爲15~60μιη且粒徑1〇〇μιη 以上之粒子之比例爲2.5體積%以下之矽砂, 作爲上述硼源,相對於100質量% (以β2ο3換算)之 0 硼源,使用含有10~100質量%之硼酸酐(以Β203換算) 者, 作爲上述澄清劑,至少使用Sn02, 至少以下述之2步驟進行上述玻璃原料之溶融: (a) 將上述玻璃原料以使溶融玻璃之黏度超過 1 02 4dPa · s之溫度加熱,製成熔融玻璃之步驟; (b) 上述步驟(a)後,將上述熔融玻璃以使熔融玻 璃之黏度爲l〇2 4dPa · s以下且比上述步驟(a)中之溫度 0 高30°C以上之溫度加熱,使熔融玻璃中之泡脫泡之步驟。 2-如申請專利範圍第1項記載之無鹼玻璃之製造方 法,其中上述玻璃母材組成原料中,含有鋁或鹼土類金類 之氫氧化物。 3.如申請專利範圍第1或2項中任一項記載之無鹼 玻璃之製造方法,其中以氧化物爲基準之質量百分比之表 示下,將玻璃母材組成原料調製成如下述玻璃母材組成( 1 )之無鹼玻璃,相對於該玻璃母材組成材料添加錫以 Sn02換算〇.〇1〜2質量%使成玻璃原料, -33- 200927686 81〇2:50〜66質量%、八12〇3:10.5〜22質量%、82〇3: 5~ 12 質量 %、MgO : 0~8 質量 %、CaO : 0〜1 4.5 質量 %、 SrO: 0 〜24 質量 %、BaO: 0〜13.5質量%、1^〇 + 〇3〇 + 31'〇 + BaO : 9~29·5 質量 % · · · ( 1 )。 4. 如申請專利範圍第1~3項中任一項記載之無鹼玻 璃之製造方法,其中以氧化物爲基準之質量百分比之表示 下’將玻璃母材組成原料調製成如下述玻璃母材組成(2 0 )之無鹼玻璃,相對於該玻璃母材組成材料添加錫以 Sn02換算0.01~2質量%使成玻璃原料, Si〇2 : 5 8~66 質量 %、AI2〇3 : 1 5〜22 質量 %、B2〇3 : 5~12質量%、MgO: 0〜8 質量 °/。、CaO: 〇~9 質量 %、SrO: 3~12·5 質量。/。、BaO : 0〜2 質量。/。、MgO + CaO + SrO + BaO : 9 ~ 18 質量 % · · . ( 2 )。 5. 如申請專利範圍第1〜4項中任一項記載之無鹼玻 璃之製ia方法’其中以氧化物爲基準之質量百分比之表示 Q 下,將玻璃母材組成原料調製成如下述玻璃母材組成(3 )之無鹼玻璃’相對於該玻璃母材組成材料添加錫以 Sn〇2換算0.01〜2質量%使成玻璃原料, 81〇2:5〇〜61.5質量%、八12〇3:1〇5〜18質量%、32〇3 :7〜10 質量%、MgO : 2~5 質量%、Ca〇 : 〇〜14 5 質量%、 SrO: 0 〜24 質量 %、BaO: 0〜13.5 質量%、MgO + CaO + SrO + BaO : 16〜29.5 質量 % · · . ( 3 )。 6. 如申請專利範圍第1〜5項中任一項記載之無鹼玻 璃之製造方法,其中相對於上述玻璃母材組成原料,更進 -34- 200927686 一步,添加從以ci換算之3質量%以下之氯化物,以S〇3 換算之3質量%以下之硫酸鹽及以F換算之3質量%以下 之氟化物所構成之群中選出—種以上之合計量爲〇.01〜5 質量%而作爲玻璃原料。 7.如申請專利範圍第1〜6項中任一項記載之無鹼玻 璃之製造方法,相對於上述玻璃母材組成原料’更進—步 ,添加15~3 00%質量%之以N〇3換算之〇.〇1〜1〇質量%之 Q 硝酸鹽及無鹼玻璃所構成之玻璃屑而作爲玻璃原料。200927686 X. Patent application scope: · A method for producing an alkali-free glass, which is a method for producing an alkali-free glass obtained by melting a glass raw material containing a clarifying agent in a raw material of a glass base material containing cerium and a boron source It is characterized in that, as the ceramsite, a cerium having a median diameter of 15 to 60 μm and a particle diameter of 1 〇〇μηη or more is 2.5% by volume or less, and the boron source is 100% by mass or less. 0 in the β2ο3 conversion, the boron source is used in an amount of 10 to 100% by mass of boric anhydride (in terms of Β203). As the clarifying agent, at least Sn02 is used, and the glass raw material is melted at least in the following two steps: (a) The glass raw material is heated at a temperature at which the viscosity of the molten glass exceeds 12 4 dPa · s to form a molten glass; (b) after the above step (a), the molten glass is made so that the viscosity of the molten glass is l〇 2 4dPa · s or less and heated at a temperature 30 ° C or higher higher than the temperature 0 in the above step (a) to defoam the bubbles in the molten glass. The method for producing an alkali-free glass according to the first aspect of the invention, wherein the glass base material constituent material contains a hydroxide of aluminum or an alkaline earth metal. 3. The method for producing an alkali-free glass according to any one of claims 1 to 2, wherein the raw material of the glass base material is prepared into a glass base material as described below by mass percentage based on the oxide. The alkali-free glass of the composition (1) is added to the glass base material composition material in an amount of S.〇1 to 2% by mass in terms of Sn02 to form a glass raw material, -33-200927686 81〇2:50~66% by mass, eight 12〇3:10.5~22% by mass, 82〇3: 5~12% by mass, MgO: 0~8% by mass, CaO: 0~1 4.5% by mass, SrO: 0 to 24% by mass, BaO: 0~13.5 Mass%, 1^〇+ 〇3〇+ 31'〇+ BaO: 9~29·5 mass% · · · (1). 4. The method for producing an alkali-free glass according to any one of claims 1 to 3, wherein, in the mass percentage based on the oxide, the raw material of the glass base material is prepared into a glass base material as described below. The alkali-free glass of the composition (20) is added to the glass base material composition material in an amount of 0.01 to 2 mass% in terms of Sn02 to form a glass raw material, Si〇2: 5 8 to 66 mass%, AI2〇3: 1 5 ~22% by mass, B2〇3: 5 to 12% by mass, MgO: 0 to 8% by mass. , CaO: 〇~9 mass %, SrO: 3~12·5 mass. /. , BaO: 0~2 quality. /. , MgO + CaO + SrO + BaO : 9 ~ 18 mass % · · ( 2 ). 5. In the ia method of the alkali-free glass described in any one of claims 1 to 4, wherein the glass base material is represented by a mass percentage based on the oxide Q, the glass base material is prepared into a glass as described below. The alkali-free glass of the base material composition (3) is added to the glass base material composition material in an amount of 0.01 to 2 mass% in terms of Sn 〇 2 to form a glass raw material, 81 〇 2: 5 〇 to 61.5 mass%, eight 12 〇. 3:1〇5 to 18% by mass, 32〇3: 7 to 10% by mass, MgO: 2 to 5 mass%, Ca〇: 〇~14 5 mass%, SrO: 0 to 24% by mass, BaO: 0~ 13.5 mass%, MgO + CaO + SrO + BaO : 16 to 29.5 mass % · · (3). 6. The method for producing an alkali-free glass according to any one of the first to fifth aspects of the present invention, wherein the raw material of the glass base material is further added to the step of -34 to 200927686, and the mass is converted from 3 in terms of ci. The total amount of the above-mentioned chlorides, which are selected from the group consisting of sulphuric acid salts of 3% by mass or less and fluorarated materials of 3% by mass or less in terms of F, are selected as 〇.01 to 5 masses. % as a glass raw material. 7. The method for producing an alkali-free glass according to any one of claims 1 to 6, wherein the raw material of the glass base material is further advanced, and 15 to 300% by mass of N is added. (3) 换算1~1〇% by mass of the glass slag composed of nitrate and alkali-free glass as a glass material. -35--35-
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