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TW200927358A - Pb-free solder alloy - Google Patents

Pb-free solder alloy Download PDF

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Publication number
TW200927358A
TW200927358A TW097123948A TW97123948A TW200927358A TW 200927358 A TW200927358 A TW 200927358A TW 097123948 A TW097123948 A TW 097123948A TW 97123948 A TW97123948 A TW 97123948A TW 200927358 A TW200927358 A TW 200927358A
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TW
Taiwan
Prior art keywords
component
sample
solder alloy
lead
free solder
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Application number
TW097123948A
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Chinese (zh)
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TWI366497B (en
Inventor
Dong-Nyung Lee
Sang-Beom Kim
Kyoo-Sik Kang
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Iljin Copper Foil Co Ltd
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Publication of TW200927358A publication Critical patent/TW200927358A/en
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Publication of TWI366497B publication Critical patent/TWI366497B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • B23K35/262Sn as the principal constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C30/00Alloys containing less than 50% by weight of each constituent
    • C22C30/04Alloys containing less than 50% by weight of each constituent containing tin or lead

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Manufacture Of Alloys Or Alloy Compounds (AREA)

Abstract

The present invention is provided to prevent the generation of whiskers via a lead (Pb)-free solder alloy. To achieve this objective, the present invention provides a Pb-free solder alloy including tin (Sn) as a first element and either boron (B) or beryllium (Be) as a second element.

Description

200927358 九、發明說明: 【發明所屬之技術領域】 本發明有關於不含鉛(此後,稱作無鉛焊錫合金)之焊 錫合金’尤其有關於透過包含皱(Be)或领(B)而不產生晶鬚 (whiskers)之無鉛焊錫合金。 【先前技術】 烊接是透過利用具熔點為45〇t或略小之焊錫而將兩 個或多個元件接合到一起之技術。於焊接中,僅焊錫熔化, 而基本材料(base material)未溶化。 於焊接中使用之傳統焊錫是鉛(Pb)和錫(Sn)之合金。這 些Pb-Sn焊錫大多數包括63%重量(63% by weight)之錫並 具錫和Pb之共晶成分及183°C之熔點,其不熱破壞電子部 分(electronic parts)。此外’ Pb-Sn焊錫具對於球形陣列(ball grid arrays ’ BGA)電極或印刷電路板(PCB)基板之優異可濕 性能(wetability),故減少焊接故障數量。 然而,已停用利用這些卩1)_311焊錫之電子儀器,於這 些焊錫中包括的Pb會污染環境。由於在孙的使用上加強 限制’所以越來越難使用Pb-Sn焊錫。 故’最近使用不含錯之無鉛焊錫。透過於Sn_Ag基材、 Sn-Cu基材、Sn-Bi基材、Sn-Zn基材或各上述材料之合金 中添加 Ag、Ox、Zn、In、Ni、Cr、Fe、c〇、Ge、p 或以 而獲得之化合物是無鉛焊錫合金之主要代表。 於無錯義巾’透過將Cu添加人Sn_Ag基材而獲得 之Sn-3Ag-0.5Cu化合物焊錫性較好、焊點強度較大、抗疲 5 200927358 勞性較高,故最近用於报多 rS:_3A㈣化合物也可作為用㈣成ΒΟΗ:塊 (bumps)和球(balls)之焊錫合金。 0塊 ^當長時間使用Sn_Ag_Cu基無錯合金 會傾向形成於烊锡之表面上。當焊錫與不同材料 且其成分相互擴鱗,晶肢純祕 長=200927358 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a solder alloy containing no lead (hereinafter, referred to as a lead-free solder alloy), which is particularly concerned with the transmission of inclusions (Be) or collar (B) without generation. Lead-free solder alloy for whiskers. [Prior Art] The splicing is a technique of joining two or more elements together by using a solder having a melting point of 45 〇t or less. In soldering, only the solder melts and the base material is not melted. The conventional solder used in soldering is an alloy of lead (Pb) and tin (Sn). Most of these Pb-Sn solders include 63% by weight of tin and have a eutectic composition of tin and Pb and a melting point of 183 ° C, which does not thermally destroy electronic parts. In addition, the Pb-Sn solder has excellent wettability for ball grid arrays (BGA) electrodes or printed circuit board (PCB) substrates, thus reducing the number of soldering failures. However, electronic devices using these 卩1)_311 solders have been deactivated, and the Pb included in these solders can pollute the environment. It is increasingly difficult to use Pb-Sn solder due to the increased restrictions on the use of Sun. Therefore, the use of lead-free solder without errors has recently been used. Adding Ag, Ox, Zn, In, Ni, Cr, Fe, c〇, Ge to an alloy of Sn_Ag substrate, Sn-Cu substrate, Sn-Bi substrate, Sn-Zn substrate or each of the above materials The compound obtained by p or by is the main representative of lead-free solder alloy. The Sn-3Ag-0.5Cu compound obtained by adding Cu to the Sn_Ag substrate is better in solderability, has stronger solder joint strength, and has higher fatigue resistance, so it has recently been used for reporting more. The rS:_3A (d) compound can also be used as a solder alloy for (four) entanglement: bumps and balls. 0 block ^ When using Sn_Ag_Cu based error-free alloy for a long time, it tends to form on the surface of bismuth tin. When the solder is different from the material and its components are scaled to each other, the crystal limb is pure and secret.

對熱和潮濕敏感。在這些晶鬚形成於3 表面上時’電路内會發生短路。因此,減小 封裝和flip-chip封裝之耐用性(du福ity)。 【發明内容】 C種不含錯㈣並能防止產生晶鬚之無 ,據本發明之-方面,提供—種無辦錫合金,其包 為成分之錫(Sn)及作為第二成分之卿)或皱_ T ^ 一者 〇 無鉛焊錫合金之第二成分是0.001%至〇4%重量之 …、氣焊錫合金之其餘成分包括所述第一成分及不可避 先之雜質(inevitable impurities) 〇 無金°焊錫合金之第二成分是0.003¾至0.5¾重量之 ’無錯嬋錫合金之其餘成分包括第—成分及不可避免之 雜質。 無錯焊錫合金更包括銅(Cu)作為第三成分。 第三成分佔0.1%至5.0%重量。 無鉛焊錫合金之第二成分是〇〇〇1%至〇4%重量之 6 200927358Sensitive to heat and humidity. When these whiskers are formed on the surface of 3, a short circuit occurs in the circuit. Therefore, the durability of the package and the flip-chip package is reduced. SUMMARY OF THE INVENTION C species does not contain errors (four) and can prevent the generation of whiskers. According to the aspect of the present invention, a tin-free alloy is provided, which is composed of tin (Sn) as a component and as a second component. Or wrinkle_T ^ One of the second components of the lead-free solder alloy is 0.001% to 〇4% by weight..., the remaining components of the gas solder alloy include the first component and inevitable impurities (inevitable impurities) The second component of the gold solder alloy is 0.0033⁄4 to 0.53⁄4 by weight. The remaining components of the 'error-free tin-tin alloy include the first component and the unavoidable impurities. The error-free solder alloy further includes copper (Cu) as the third component. The third component accounts for 0.1% to 5.0% by weight. The second component of the lead-free solder alloy is 〇〇〇1% to 〇4% by weight 6 200927358

Be ’無錯焊錫合金之其餘成分包括第一成分、第三成分以 及不可避免之雜質。 無鉛焊錫合金之第二成分是0.003%至0.5%重量之 - B ’鋒焊錫合金之其餘成分包括第-成分、第三成分及 . 不可避免之雜質。 無鉛焊錫合金更包括銀(Ag)作為第四成分。 無鉛焊錫合金之第二成分是〇〇〇1G/。至重量之 Be,無錯焊錫合金之其餘成分包括第… ❹ 魅之雜質的組和第-、第二、第三、丄=不: 免之雜質的組其中之一。 無鉛焊錫合金之第二成分是〇〇〇3%至〇5%重量之 B ’無鱗錫合金之其餘成分包括第-、第四成分及不可 避免之雜質的組和第-、第二、第三、第四成分及不可避 免之雜質的組其中之一者。 【實施方式】 如上所述’傳統Sn_Ag_Cu基無錯蟬锡之缺點是於其 © 表面上產生晶鬚。然而,產生晶鬚之原因還未清楚揭示。 本發明之發明人注意到,Pb-Sn焊錫、结合到Cu形成之 * 襯墊(_上時,於焊錫及Cu襯墊之間的結合表面(bonding * surface)上’ Cu比Sn更快擴散。 ,言之,由於在焊錫和Cu襯塾之間,銅(Cu)比錫(Sn) (其疋烊錫之主要成分)更快地擴散,於焊錫之晶界方 向上擴散。此後,於焊錫中形成了成分為Cu6Sn5之金屬 間化合物(intermetallie compound;)。 200927358 本發明之發明人認為,晶鬚可以去除由金屬間化合物 施加到谭錫之Sn的麼縮應力(compressive stress),這種晶鬚 是具鬚狀之單晶,並從Sn塗敷之焊錫表面生長。 故’本發明之發明人試圖透過插入金屬從而防止金屬 間之擴散,來減小於Sn中產生壓縮應力之數量,此金屬 原子夠小而能進入Sn晶體結構内之間隙位置 site),從而防止產生晶鬚。The remaining components of the Be's error-free solder alloy include the first component, the third component, and the unavoidable impurities. The second component of the lead-free solder alloy is 0.003% to 0.5% by weight - the remaining components of the B' front solder alloy include the first component, the third component, and the unavoidable impurities. The lead-free solder alloy further includes silver (Ag) as the fourth component. The second component of the lead-free solder alloy is 〇〇〇1G/. To the weight of Be, the remaining components of the error-free solder alloy include the first... 组 The group of impurities and the first, second, third, 丄 = not: one of the groups of impurities. The second component of the lead-free solder alloy is 3% to 5% by weight of the B'-free scale tin alloy, and the remaining components including the first, fourth, and unavoidable impurities and the first, second, and Third, one of the fourth component and the group of unavoidable impurities. [Embodiment] As described above, the conventional Sn_Ag_Cu-based error-free tin-tin is disadvantageous in that whiskers are generated on the surface thereof. However, the reason for the generation of whiskers has not been clearly revealed. The inventors of the present invention have noticed that Pb-Sn solder is bonded to the Cu-formed * liner (on the bonding surface * between the solder and the Cu liner - Cu diffuses faster than Sn) In other words, copper (Cu) diffuses faster than tin (Sn) (the main component of antimony tin) between the solder and the Cu lining, and diffuses in the grain boundary direction of the solder. An intermetallic compound having a composition of Cu6Sn5 is formed in the solder. 200927358 The inventors of the present invention believe that the whisker can remove the compressive stress applied to the Sn of Tanxi by the intermetallic compound, the whisker It is a single crystal having a whisker shape and is grown from the surface of the Sn-coated solder. Therefore, the inventors of the present invention attempted to reduce the amount of compressive stress generated in Sn by inserting metal to prevent diffusion between metals. The atoms are small enough to enter the gap site within the Sn crystal structure to prevent whiskers from forming.

鈹(Be)或硼(B)可用作具有小原子之金屬。 根據本發明之無鉛烊錫合金是包括Sn作為主要離子 之Sn基多元合金(mu出-element au〇y)。所以,根據本發明 之無鉛焊錫合金可包括至少8〇%重量之Sn。 如上所述,本發明之主要目的是防止於無鉛焊錫合金 内產生晶鬚。本發明之發明者尤其注意到# Sn基焊錫和 Οι概墊結合到Be或B能作為透猶止如及& 擴散而防止於Sn晶體内形成壓縮應力的材料。因而,根 據本發明之·烊錫合金包括作為第—成分之%及作為 第二成分之Be或B。故’根據本發明之無料錫合金中包 H量之Sn’_根據本發明之無料錫合金被 稱作Sn基合金。 根據本發明之無錯焊錫合金可包括〇 〇〇1%至〇料重 量之Be或0.003%至0.5%重量之b。 於這種情況下,與包括少於 〇則%重量b讀縣伽之無崎錫 f ς: 足量Be或Β(作為第二成分)插入到Sn(其是第相一二 200927358 中之間隙位置。因而,如上所述,防止於Sn及Cu之間生 長金屬間化合物之效果較佳,並如下所述’即使於苛刻條 件諸如熱衝擊測試、熱靜水測試等下也可不產生晶鬚。而 ' 且’根據本發明之無鉛焊錫合金包括多於0.4%重量之Be • 或多於0.5%重量之B時,插入到Sn之間隙位置中之Be 或B飽和,從而導致升高製備成本並降低經濟效率。 無錯焊錫合金可更包括Cu作為第三成分。這種情況 鲁下,可包括0.1%至5.0°/〇重量之Cu。因而,與Cu比例少 於0.1°/❶重量時比較,可增強無鉛焊錫合金之機械強度,與 Cu比例超過5.0%重量時比較可提高可濕性能。 無鉛焊錫合金更包括銀(Ag)作為第四成分。於此,可 包括1.0至3.0%重量之Ag。於這種情況下,與當Ag之比 例少於1.0%重量時比較,可顯著提高無鉛焊錫合金之熱衝 擊容限(thermal shock tolerance),與Ag之比例超過3.0%重 量時比較,可提尚跌落容限(drop tolerance)。 這種無鉛焊錫可製備成各種形式,諸如球、膏 © (cream)、條(bar)、導線等。 現將參考於其中顯示了本發明示範性實施例之附圖, 更深入地描述本發明。下述實驗不應認為限制了本發明, 而是透過描述提供對本發明之透徹理解。 (第一實施例) 根據第一實施例之無錯焊鎮合金是§n_Be-cu三重合 金。 於第一實施例中,首先製備Be-Cu合金,將Sn熔化 9 200927358 於熔爐中,並將Be-Cu合金熔化於熔爐中,從而生產溶化 物。於熔化物之溫度保持一段時期處於600°C和650t之間 後,融化物從熔爐流出並澆鑄進入條形(bar-shaped) Sn-Be-Cu焊锡合金樣品。 在抛光梳狀(comb shape)之JIS2型Cu基表面後,將 Tamura-Kaken公司之助焊劑EC-19S-8塗於Cu基拋光表面 上。此後’已準備之Sn-Be-Cu焊錫合金樣品以預定之量溶 於熔矽管(fUsed silica tube)中,Cu基蒸解(digest)進入合 成熔矽管3秒’以實現浸焊(dip soldering)。接下來,浸焊 之基板浸入乙酸乙酯,後經由超音波清洗去除助焊劑之殘 餘物’從而製備實驗樣品。 下表1顯示根據第一實施例製作之實驗樣品中Sn、 、Qi之比例。於表i中顯示之單位數量是%重量,數量 是插入融化物中之成分之比例。除於表丨中說明之成分 外’於溶化物中可更包括極少量之雜f,諸如 (Ni)、鈷(Co)。 ;錄 於表1中’“剛剛製備後”的那一行表示晶鬚是否於剛 剛製備後就產生於實驗樣品上,“熱衝擊”卿—行表示曰Be (Be) or boron (B) can be used as a metal having a small atom. The lead-free antimony-tin alloy according to the present invention is a Sn-based multi-element (mu-element au〇y) including Sn as a main ion. Therefore, the lead-free solder alloy according to the present invention may comprise at least 8% by weight of Sn. As described above, the main object of the present invention is to prevent the generation of whiskers in a lead-free solder alloy. The inventors of the present invention have particularly noticed that the combination of # Sn-based solder and Οι pads to Be or B can prevent the formation of compressive stress in the Sn crystal as a diffusion and diffusion. Therefore, the niobium-tin alloy according to the present invention includes % as the first component and Be or B as the second component. Therefore, the Sn-free alloy in the tin-free alloy according to the present invention is referred to as a Sn-based alloy. The error-free solder alloy according to the present invention may comprise from 1% to the weight of the feedstock or from 0.003% to 0.5% by weight of b. In this case, and including less than 〇%% b read the county gamma noisy tin f ς: a sufficient amount Be or Β (as a second component) inserted into Sn (which is the gap between the first phase and the second 200927358 Therefore, as described above, the effect of preventing the growth of the intermetallic compound between Sn and Cu is preferable, and as described below, "whiskers are not generated even under severe conditions such as thermal shock test, hot hydrostatic test, and the like. And 'and' the lead-free solder alloy according to the present invention includes more than 0.4% by weight of Be• or more than 0.5% by weight of B, and Be or B inserted into the gap position of Sn is saturated, resulting in an increase in production cost and Reduce economic efficiency. The error-free solder alloy may further include Cu as the third component. In this case, Cu may be included in a weight of 0.1% to 5.0°/〇. Therefore, when the ratio to Cu is less than 0.1°/❶, the weight is compared. The mechanical strength of the lead-free solder alloy can be enhanced, and the wettability can be improved compared with the case where the Cu ratio exceeds 5.0% by weight. The lead-free solder alloy further includes silver (Ag) as the fourth component. Here, it may include 1.0 to 3.0% by weight. Ag. In this case, the ratio to Ag Compared with 1.0% by weight, the thermal shock tolerance of the lead-free solder alloy can be significantly improved, and the drop tolerance can be improved compared with the case where the ratio of Ag exceeds 3.0% by weight. It can be prepared in various forms such as a ball, a cream, a bar, a wire, etc. The invention will now be described in more detail with reference to the accompanying drawings in which exemplary embodiments of the invention are illustrated. The invention is not to be considered as limiting, but rather to provide a thorough understanding of the invention. (First Embodiment) The error-free solder alloy according to the first embodiment is a §n_Be-cu triple alloy. In the first embodiment First, a Be-Cu alloy is prepared, Sn is melted in a furnace, and the Be-Cu alloy is melted in a furnace to produce a melt. The temperature of the melt is maintained at a temperature between 600 ° C and 650 t for a period of time. The melt flows out of the furnace and is cast into a strip-shaped Sn-Be-Cu solder alloy sample. After polishing the comb shape of the JIS2-type Cu-based surface, the Tamura-Kaken flux EC is used. -19S-8 is applied to C U-based polishing surface. Thereafter, the prepared Sn-Be-Cu solder alloy sample was dissolved in a fUsed silica tube in a predetermined amount, and the Cu-based digest was introduced into the synthetic melting tube for 3 seconds. Dip soldering was performed. Next, the dip soldered substrate was immersed in ethyl acetate, and then the flux residue was removed by ultrasonic cleaning to prepare an experimental sample. Table 1 below shows the ratio of Sn, and Qi in the experimental samples prepared according to the first embodiment. The unit number shown in Table i is % by weight, and the quantity is the ratio of the ingredients inserted into the melt. Except for the components described in the specification, the impurity may further include a very small amount of impurities f such as (Ni) or cobalt (Co). The line recorded in Table 1 "just after preparation" indicates whether the whiskers were produced on the experimental samples immediately after preparation, and the "thermal shock" - line indicates 曰

ίίίί生於ί受熱衝擊測試之製備實驗樣品之表面上M 樣勝抑和啊攝轉_次, 冑X祕糊試”指福肢以生於經受故 靜水測成之製備實驗樣品之表面上,於 又二 8叱之温度下維持‘時常, 下無干擾” __行表μ肢5產切妓&持 200927358 月之製備實驗樣品之表面上。如包含表丨之下表所示,“未 發現”指示無晶鬚產生於製備之實驗樣品中,“發現,,指示 晶鬚產生於製備之實驗樣品中。 、 [表1] 實驗 Sn Be Cu 剛剛製 備後 熱衝擊 熱靜水 測試 溫下無 JL4JL 第一實驗 99.9833 0.0005 0.0162 未發現 發現 發現 丁後 --—-- 路招 第二實驗 99.967 0.001 0.032 未發現 未發現 未發現 第三實驗 99.484 0.020 0.496 未發現 未發現 未發現 第四實驗 94.804 0.200 4.996 未發現 未發現 未發現 不贫現 去恭相 第五實驗 94.604 0.400 — 4.996 -----—_L 未發現 未發現1 未發現 不赞現 圖1A至圖1D分別是根據第一實驗剛剛製備之樣品表 面、經受熱衝擊測試之樣品表面、經受熱靜水測試之樣品 纟面及處於f溫下無干擾之樣品表面之掃描式電子顯 (SEM)圖片。 圖2A至圖2D分別是於與第一實驗條件相同之條件 ❹了’根據第二實驗_彳製備之樣品表面、經受熱衝擊測試 之樣品表面、經受熱靜水測試之樣品表面及處於常溫下無 干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖3A,圖3D分別是於與第一實驗條件相同之條件 下,根據第三實驗剛剛製備之樣品表面、經受熱衝擊測試 之樣品表:、經受熱靜水測試之樣品表面及處於常溫下無 干擾之樣品表面之掃插式電子顯微鏡(SEM)圖片。 圖4A至圖40分別是於與第一實驗條件相同之條件 下,根據第四實驗剛剛製備之樣品表面、經受熱衝擊測試 11 200927358 ίΠ::經受熱靜水測試之樣品表面及處於常溫下無 干擾之樣°°表面之娜式電子顯微鏡(SEM)圖片。 nr】二至圖5D分別是於與第一實驗條件相同之條件 样主五實驗剛剛製備之樣品表面、經受熱衝擊測試 2品ί面I經受熱靜柄m之樣品表面及處於常溫下無 干擾之樣品表面之掃描式電子顯微鏡(sem)圖片。 e 姻据表J及圖一^ 5D中所示,於根據第-實驗剛剛 製備之Sn-Be-Cu三重合金之表面上 鈹_之比例少於讓%重量 、而= :=:rre-cu三重合金之表面、經= 二μ — °金之表面、處於常溫無干擾之三重合金之表 面上。ί ί 生 受 受 受 受 受 受 受 受 受 受 受 受 受 受 受 受 受 受 受 受 受 受 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备 制备At the temperature of another 8 叱, it is maintained 'timely, no interference' below __ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ As indicated in the table below, "not found" indicates that no whiskers are produced in the prepared experimental sample, "found, indicating that whiskers are produced in the prepared experimental sample. [Table 1] Experimental Sn Be Cu Immediately after preparation, thermal shock hot hydrostatic test without JL4JL first experiment 99.9833 0.0005 0.0162 No discovery found after Ding----- Lu Zhao second experiment 99.967 0.001 0.032 No discovery found no third experiment 99.484 0.020 0.496 Nothing found and found no fourth experiment 94.804 0.200 4.996 No discovery No undiscovered No depletion is found. Congratulations to the fifth experiment 94.604 0.400 — 4.996 -----—_L Nothing found No found 1 Nothing is not found Figure 1A Figure 1D is a scanning electron SEM (SEM) of the surface of the sample prepared immediately after the first experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the surface of the sample without interference at f temperature. Fig. 2A to Fig. 2D are respectively subjected to the same conditions as the first experimental conditions, and the surface of the sample prepared according to the second experiment _彳 is subjected to a thermal shock test. Scanning electron microscope (SEM) images of the surface of the sample, the surface of the sample subjected to the hot hydrostatic test, and the surface of the sample without interference at normal temperature. Figures 3A and 3D are respectively under the same conditions as the first experimental conditions, according to the The surface of the sample just prepared, the sample table subjected to the thermal shock test: the surface of the sample subjected to the hot hydrostatic test and the scanning electron microscope (SEM) image of the surface of the sample which is not disturbed at normal temperature. Fig. 4A to Fig. 40 The surface of the sample just prepared according to the fourth experiment was subjected to thermal shock test under the same conditions as the first experimental conditions. 11 200927358 Π: The surface of the sample subjected to the hot hydrostatic test and the sample at normal temperature without interference. Surface electron microscope (SEM) image. nr] 2 to 5D are the same as the first experimental conditions, the sample surface just prepared by the main five experiments, subjected to thermal shock test 2 product 面 surface I is subjected to thermal static Scanning electron microscopy (Sem) image of the surface of the sample of the handle m and the surface of the sample without interference at room temperature. e The data sheet J and Figure 1 5D are shown in The ratio of 铍_ on the surface of the just-prepared Sn-Be-Cu triple alloy is less than that of the % by weight, and = :=:rre-cu triple alloy surface, the surface of = 2 μ ° ° gold, at room temperature without interference On the surface of the triple alloy.

單位蝴平嫩W 面積之晶鬚數量較少。故,根墟笛一音心^度’早位 三重合金與佩合金啸提供了難絲/ Me-01 =表1中,於Be之比例至少是〇 〇〇1%重量 =實驗中未發現晶鬚。因而,較佳是包含 量的Be之Sn_Be_Cu三重合金。 4〇〇1/。重 (第二實施例) 合金根據第二實_之絲焊錫合金是Sn_Be_Cu_Ag三重 12 200927358 於第二實施例中,首先製備Be-Cu人a 必 衣两uu合金,將Sn熔化 於熔爐中’並將Be-Cu合金及銀(Ag你化於轉中,從而 生產熔化物。於炼化物之溫度保持—段時期處於㈣。❻ 650°C之間後,融化物從熔爐流出並澆鑄進入條形 (bar-shaped ) Sn-Be-Cu-Ag 焊錫合金樣品。 、 如於第一實驗中那樣處理條形Sn_Be-Cu_Ag焊錫合金 樣品,以製備實驗樣品。 下表2顯示根據第一實施例製備之實驗樣品中sn、 Be、Cu、Ag之比例。於表2中顯示之單位數量是%重量, 數量是插入融化物中之成分之比例。除於表2中說明之成 分外,於熔化物中可更包括極少量之雜質,諸如p、Ni、 Co ° 表2也指示於表1中相同之條件下是否於剛剛製備 後、熱衝擊測試、熱靜水測試和處於常溫下無干擾之實驗 樣品之表面產生晶鬚。 [表2] 實驗 Sn Ag Cu Be 剛剛製備 後 熱衝擊 熱靜水 測試 4於常 溫下無 干擾 第六實驗 98.900 1.000 0.097 0.003 1 未發現 未發現 未發現 未發規, 第七實驗 98.300 1.000 0.679 0.021 未發現 未發現 未發現 未發現 第八實驗 96.900 3.000 0.097 0.003 未發現 未發現 未發現 未發現 第九實驗 94.00 3.00 2.88 0.12 未發現 未發現 未發現 未發現 圖6A至圖6D分別是於與第一實驗條件相同之條件 下’根據第六實驗剛剛製備之樣品表面、經受熱衝擊測試 13 200927358 j品t面、經受熱靜水測試之樣品表面及處於常溫下益 干擾之樣品表面之職式電子職鏡(sem)圖片。 1Γ !二至圖7D刀別疋於與第一實驗條件相同之條件 下接根據第七實驗_製傷之樣品表面、經受熱衝擊測試 之樣品表面、經錢靜水職之樣品表面及處於常溫下無 干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 ❹The number of whiskers in the flat area of the flat butterfly is small. Therefore, the root whistle flute a heart ^ degree 'early triple alloy and the alloy whistle provided a difficult wire / Me-01 = Table 1, the ratio of Be is at least % 1% weight = no crystal found in the experiment must. Therefore, it is preferred to contain a quantity of Be of Sn_Be_Cu triple alloy. 4〇〇1/. Heavy (second embodiment) alloy according to the second real wire solder alloy is Sn_Be_Cu_Ag triple 12 200927358 In the second embodiment, firstly, Be-Cu man a must be two uu alloy, Sn is melted in the furnace 'and The Be-Cu alloy and silver (Ag are turned into a turn to produce a melt. The temperature is maintained at the temperature of the refined product - the period is (4). After 650 650 ° C, the melt flows out of the furnace and is cast into the strip. (bar-shaped) Sn-Be-Cu-Ag solder alloy sample. The strip-shaped Sn_Be-Cu_Ag solder alloy sample was processed as in the first experiment to prepare an experimental sample. Table 2 below shows the preparation according to the first embodiment. The ratio of sn, Be, Cu, and Ag in the experimental sample. The unit number shown in Table 2 is % by weight, and the quantity is the ratio of the component inserted into the melt. In addition to the components described in Table 2, in the melt It may further include a very small amount of impurities such as p, Ni, Co ° Table 2 also indicates whether the test sample immediately after preparation, thermal shock test, hot hydrostatic test and non-interference at normal temperature under the same conditions in Table 1 The surface produces whiskers. [Table 2] After the preparation of Sn Ag Cu Be, the thermal shock hot hydrostatic test 4 was prepared without interference at room temperature. The sixth experiment 98.900 1.000 0.097 0.003 1 No undetected undiscovered, No. 7 experiment 98.300 1.000 0.679 0.021 No undiscovered It was found that the eighth experiment was not found. 96.900 3.000 0.097 0.003 No discovery was found. No ninth experiment was found. 94.00 3.00 2.88 0.12 No discovery was found. No discovery was found. Figures 6A to 6D are respectively under the same conditions as the first experimental conditions. 'According to the surface of the sample prepared just after the sixth experiment, subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the image of the sem of the sample on the surface of the sample at room temperature. 1Γ! 2 to 7D knife is attached to the surface of the sample according to the seventh experiment _ injury, the surface of the sample subjected to thermal shock test, the surface of the sample subjected to Qian Jingshui, and at room temperature under the same conditions as the first experimental conditions. Scanning electron microscope (SEM) image of the surface of the sample without interference.

圖8A至圖8D別是於與第一實驗條件相同之條件下, 根據第八實驗晒製備之樣品表面、經受熱衝擊測試之樣 口α表面、、較熱靜水測試之樣品表面及處於常溫下無干擾 之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖9A至圖9D分別是於與第一實驗條件相同之條件 下,根據第九實驗酬製備之樣品表面、㈣熱衝擊測試 之樣品表面、經受熱靜水測試之樣品表面及處於常溫下無 干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 如於表2及圖6A至9D中所見’無晶鬚產生於根據第 二實施例剛剛製備之Sn-Be-Cu三重合金之表面、經受熱衝 擊測試之此三重合金之表面、經受熱靜水測試之三重合金 之表面及處於常溫無干擾之三重合金之表面上。 (第三實施例) 根據第三實施例之無鉛焊錫合金是Sn-B-Cu三重合 金。 於第二實施例中,將Sn溶化於熔爐中,並將硼(b)和 銅(Cu)熔化於合成熔爐中,從而生產熔化物。於熔化物之 溫度保持一段時期處於600。(:和650°C之間後,融化物從熔 200927358 爐流出並洗鑄進入條形Sn_B_Cu 。 切樣處理條^n_B= 品’以製備實驗樣品。 忏踢。金樣 下,3顯示根據第三實施例製備之實驗樣 B、Cu之比例。於表3中顯示之甲:η、 ^插入融化物中之成分之比例。除於表3中說明之^ 外^化物中可更包括極少量之雜質,諸如ρ、奶之^ 後2整上不t表1中相同之條件下是否於剛剛製備 樣品之表面產生晶鬚。 肢m干擾之實驗 實驗 Sn B Cu 第十實驗 99.989 o.ool 0.010 第十一實驗 99.987 0.003 0.010 第十二實驗 98.5 0.5 1.0 剛剛製備 後 未發現 未發^ 未發現 熱衝擊 發現 未發現 熱靜水 測試 發現 未發現 發現 未發現8A to 8D are the same as the first experimental conditions, the surface of the sample prepared according to the eighth experiment, the surface of the sample α subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the room temperature Scanning electron microscope (SEM) image of the surface of the sample without interference. 9A to 9D are respectively the sample surface prepared according to the ninth experiment under the conditions of the first experimental condition, (4) the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the interference at room temperature. Scanning electron microscope (SEM) image of the sample surface. As seen in Table 2 and FIGS. 6A to 9D, 'the whisker is generated from the surface of the Sn-Be-Cu triple alloy which has just been prepared according to the second embodiment, the surface of the triple alloy subjected to the thermal shock test, and subjected to hot still water. The surface of the triple alloy tested and the surface of the triple alloy at room temperature without interference. (Third Embodiment) The lead-free solder alloy according to the third embodiment is a Sn-B-Cu triple alloy. In the second embodiment, Sn is melted in a furnace, and boron (b) and copper (Cu) are melted in a synthesis furnace to produce a melt. The temperature of the melt is maintained at 600 for a period of time. After (: and 650 ° C, the melt flows out from the melting furnace 200927358 and is cast into the strip shape Sn_B_Cu. The sample processing strip ^n_B = product 'to prepare the experimental sample. 忏 kick. Under the gold sample, 3 shows according to the The ratio of the sample B and Cu prepared in the three examples is shown in Table 3. The ratio of the components of the nail: η, ^ inserted into the melt is shown in Table 3. In addition to the amount of the compound described in Table 3, a minimum amount may be included. Impurities, such as ρ, milk, 2, and 2, whether or not whiskers are produced on the surface of the sample just prepared under the same conditions as in Table 1. Experimental experiment of limb m interference Sn B Cu Tenth experiment 99.989 o.ool 0.010 Eleventh experiment 99.987 0.003 0.010 Twelfth experiment 98.5 0.5 1.0 Nothing found after preparation immediately No thermal shock was found. No hot hydrostatic test was found. No findings were found.

❹ 圖10A至圖10D分別是於與第 干援之樣品表面之職電爾i(SEn於常溫下無 圖1 1A至圖11D分別是於盘笛一 Jga. . 下,根據第十一實驗剛剛製備;條件相同之條件 試之樣品表面、經受熱衝擊測 無干擾之樣品表面之掃蝴子顯微鏡牌於常溫下 圖12A至圖12D分別是於與第一實驗條件相同之條件 15 200927358 下,根據第十二實驗剛剛製備之樣品表面、經受熱衝擊測 試之樣品表面、經受熱靜水測試之樣品表面及處於常溫下 無干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 一如於表3及圖10A至i2D中所見,無晶鬚產生於根據 第二實施例剛剛製備之Sn-B-Cu三重合金之表面上。然, 於B之比例少於0.003%重量之第十實驗中,晶鬚產生於經 受熱衝擊測試之Sn-B-Cu三重合金之表面、經受熱靜水測❹ Figure 10A to Figure 10D are respectively on the surface of the sample with the aid of the first aid. (SEn at normal temperature is not shown in Figure 1 1A to Figure 11D, respectively, in the dish flute a Jga.., according to the eleventh experiment Preparation; conditions of the same condition test sample surface, the surface of the sample subjected to thermal shock measurement without interference, under the condition of normal temperature, FIG. 12A to FIG. 12D are respectively under the same condition as the first experimental condition 15 200927358, according to Scanning electron microscopy (SEM) images of the surface of the sample just prepared in the twelfth experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the surface of the sample without interference at normal temperature. And as seen in Figs. 10A to i2D, the whiskers are generated on the surface of the Sn-B-Cu triple alloy which has just been prepared according to the second embodiment. However, in the tenth experiment in which the ratio of B is less than 0.003% by weight, the crystal Must be produced on the surface of a Sn-B-Cu triple alloy subjected to thermal shock testing, subjected to hot static water measurement

試之三重合金之表面、處於常溫下無干擾之三重合金之表 面上。 於第十實驗中發現,·晶鬚平均長度為3.0μιη,單位面 積(mm2)之晶鬚之數量是5。 ^儘管於第十實驗中,在苛刻條件後產生晶鬚,但是晶 鬚之長度顯著低於下述比較實驗中晶鬚之長度,單位面積 晶鬚之數量較少。故,根據第三實施例之Sn_Be_Cu三重合 金與傳統合金比較了提供較佳效果。 口 於表3中,於Β之比例至少是0.003%重量之第十一、 十二實驗中未發現晶鬚。因而’較佳是包、含至少〇⑽3%重 量之Β的Sn~Be-Cu二重合金。 (比較實驗) 根據比較實驗之無鉛焊錫合金是Sn-Cu二重合金及 Sn-Ag-Cu三重合金。於比較實驗中使用 N〇n-ferrous Metal Ind Co.,Ltd 之 Sn-Cu 晶棒(ing〇t)及 Sn-Ag-Cu晶棒。根據如於第一實施例中相同之方法,使用 Sn-Cu晶棒及Sn-Ag-Cu晶棒製備實驗樣品。於表4中顯 16 200927358 示之比例單位是%重量。 表4也指示於如表i至表3相同之條件下是否於剛剛 製備後、熱衝擊測試後、絲水概後和處於常溫下無干 擾後之實驗樣品之表面產生晶鬚。Test the surface of the triple alloy, on the surface of the triple alloy without interference at room temperature. It was found in the tenth experiment that the average length of whiskers was 3.0 μm, and the number of whiskers per unit area (mm 2 ) was 5. ^ Although in the tenth experiment, whiskers were generated after severe conditions, the length of the whiskers was significantly lower than the length of the whiskers in the comparative experiment described below, and the number of whiskers per unit area was small. Therefore, the Sn_Be_Cu triple alloy according to the third embodiment provides a better effect than the conventional alloy. In Table 3, no whiskers were found in the eleventh and twelfth experiments in which the ratio of yttrium was at least 0.003% by weight. Thus, it is preferred to include a Sn~Be-Cu double alloy containing at least 〇 (10) by weight of ruthenium. (Comparative Experiment) The lead-free solder alloy according to the comparative experiment was a Sn-Cu double alloy and a Sn-Ag-Cu triple alloy. Sn-Cu ingots and Sn-Ag-Cu ingots of N〇n-ferrous Metal Ind Co., Ltd. were used in the comparative experiments. Experimental samples were prepared using the Sn-Cu ingot and the Sn-Ag-Cu ingot according to the same method as in the first embodiment. The proportional units shown in Table 4, 200927358, are % by weight. Table 4 also indicates whether whiskers were generated on the surface of the test sample immediately after preparation, after the thermal shock test, after the hot water test, and after the interference at normal temperature under the same conditions as in Tables i to 3.

17 200927358 圖16Α至圖16D分別是於與第一實驗條件相同之條件 下根據第四比較實驗剛剛製備之樣品表面、經受熱衝擊 之樣品表面、經受熱靜水測試之樣品表面及處於常溫 ’、、干後之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖17A至圖17D分別是於與第一實驗條件相同之條件 測丄根據第五比較實驗剛剛製備之樣品表面、經受熱衝擊 蠹 Ο 下^之樣品表面、經受熱靜水測試之樣品表面及處於常溫 *、、、干擾:之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖18A至圖18D分別是於與第一實驗條件相同之條件 漁卜、根據第六比較實驗剛剛製備之樣品表面、經受熱衝擊 之樣品表面、經受熱靜水測試之樣品表面及處於常溫 、、、干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 如於表4及圖13A至18D中所示,於不包含Be或]5 基焊錫合金之所有表面上有晶鬚產生。 於第-、第十實驗及第一至第六比較實驗中,晶鬚產 熱衝擊測試之製備之樣品表面、經受熱靜水測試 備之樣品表面、處於常溫無干擾之製備之樣品表面 表5齡了產生之晶鬚之平均長度及單位面積之晶鬚 〈數量。 驗17 200927358 FIG. 16A to FIG. 16D are respectively the surface of the sample prepared according to the fourth comparative experiment, the surface of the sample subjected to thermal shock, the surface of the sample subjected to the hot hydrostatic test, and the room temperature at the same conditions as the first experimental conditions, Scanning electron microscope (SEM) image of the dried sample surface. 17A to 17D are respectively measured on the surface of the sample prepared according to the fifth comparative experiment, the surface of the sample subjected to thermal shock, the surface of the sample subjected to the hot hydrostatic test, and the conditions under the same conditions as the first experimental conditions. Scanning electron microscope (SEM) image of the surface of the sample at room temperature*, ,, and interference. 18A to 18D are the same conditions as the first experimental conditions, the surface of the sample just prepared according to the sixth comparative experiment, the surface of the sample subjected to thermal shock, the surface of the sample subjected to the hot hydrostatic test, and the temperature at room temperature, Scanning electron microscope (SEM) images of the surface of the interfering sample. As shown in Table 4 and Figures 13A to 18D, whiskers were generated on all surfaces not containing Be or 5 based solder alloy. In the first, tenth and first to sixth comparative experiments, the surface of the sample prepared by the whisker heat shock test, the surface of the sample subjected to the hot hydrostatic test, and the surface of the sample prepared at room temperature without interference are shown in Table 5 The average length of the whiskers produced by the age and the whiskers per unit area. Test

第六比較實驗 18 至第三比較實驗之Sn-Cu焊錫 < Sn_Ag-Cu焊錫合金比較, 具顯著較短且其數量顯著較少 囚此The sixth comparative experiment 18 to the third comparative experiment of Sn-Cu solder &Sn; Sn_Ag-Cu solder alloy compared to the significantly shorter and significantly less number of prisoners

❹ 200927358 如於表5所見,與第一 合金及第四至第六比較實驗 第一、第十實驗之焊錫合金 之晶鬚。 興+添加Be咬b夕 其少量之Be (即少於_1%^較實驗比較,即使當極 即使極其少量之B (即少於重之Be)添加入Sn時或 時’也能有防止晶鬚產生之顯著〇^/〇重量之B)、添加入Sn 如上所述,根據本發明 時亦可防止晶鬚。 誶錫合金,即使於條件較差 但本If生實施例具體顯示和說明了本發明, 之情況下,可對本發明:形= 和範圍 焊錫=本發明之焊錫合金可用於各種機器及電子儀器之 根據上述本發明,可提供能夠防止產生晶鬚之無鉛焊 錫合金。 雖然參考其示範性實施例具體顯示和說明了本發明, 但本領域技術人員應理解,於不脫離下附申請專利範圍所 定義之本發明之精神和範圍之情況下,可對本發明之形式 及細節進行各種修改。 $ 【圖式簡單說明】 圖1A至圖1D分別是根據第一實驗剛剛製僙之樣品表 面、經受熱衝擊測試之樣品表面、經受熱靜水測試之 19 200927358 表面及處於常溫下無干擾之樣品表面之掃描式電子顯微鏡 (SEM)圖片。 圖2Α至圖2D分別是於與第一實驗條件相同之條件 下,根據第二實驗剛剛製備之樣品表面、經受熱衝擊測試 之樣品表面、經受熱靜水測試之樣品表面及處於常溫下無 干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 ❹ Φ 圖3A至圖3D分別是於與第一實驗條件相同之條件 下,根據第二實驗剛剛製備之樣品表面、經受熱衝擊測試 之樣品表面、經受熱靜水測試之樣品表面及處於常溫下無 干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖4A至圖4D分別是於與第一實驗條件相同之條件 下,根據第四實驗剛剛製備之樣品表面、經受熱衝擊測試 之樣品表面、經受熱靜水測試之樣品表面及處於常溫下無 干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖5A至圖5D分別是於與第一實驗條件相同之條件 下’根據第五實驗酬製備之樣品表面、經受熱衝擊 之樣品表面、較祕水測試之樣品表面及處於常温下無 干擾之樣品表面之掃描A電子顯微鏡(SEM)s片。’、、 圖6A至圖6D分別是於與第一實驗條件相同之條 下^根^第六實驗酬製備之樣品表面、經受熱衝擊測 矣經受熱靜水測試之樣品表面及處於常溫下盈 干擾之樣表面之掃描式電子顯微鏡(SEM)圖片。…、 τ ^至圖7D分別是於與第一實驗條件相同之條件 下’根據第七實驗酬製備之樣品表面、經受熱衝擊2 200927358 之樣品表面、經受熱靜水測試之樣品表面及處於常溫下無 干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。概…、 圖8A至圖8D分別是於與第一實驗條件相同之條件 下接根,第人實驗_製備之樣品表面、較熱衝擊測試 之樣品表面、較祕侧試讀品表面及纽常溫下無 干擾之樣品表φ之掃描式電子酿鏡(_則。… 圖=至圖9D分別是於與第一實驗 下,根據第九實驗剛剛製備之樣品表面、經受二= 之樣品表,、經受熱靜水測試之樣品表面及處二 干擾之樣印表面之掃描式電子顯微鏡(sem)圖片、。·、、 下,=2Γ分別是於與第一實驗條件相同之條件 表取之樣品表面及處 干擾面之掃描式電子顯微鏡 …、 下:ίΓ=別是於與第一實驗條件相同之條件 ❹ :=?矣經受熱靜水測試之樣品表面及處;= 面讀料電子顯微鏡烛μ)ι 下,根墟第+圖rD分別是於與第—實驗條件相同之條件 下根據第十二實驗剛剛製干相Π之條件 試之樣品表面、經受熱靜水測試、經受熱衝擊測 圖-至_===)圖片。 下’根據第-比較實驗剛剛製備條件相同之條件 樣⑽表面、經受熱衝擊 200927358 測試之樣品表面、經受熱靜相彳試之樣品表面及處於常溫 下無干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖14A至圖14D分別是於與第一實驗條件相同之條件 下>,根據第二比較實驗剛剛製備之樣品表面、經受熱衝擊 測試之樣品表面、經受熱靜水測試之樣品表面及處於常溫 下無干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖15A至圖15D分別是於與第一實驗條件相同之條件 下」根據第三比較實驗剛剛製備之樣品表面、經受熱衝擊 測試之樣品表面、經受熱靜水測試之樣品表面及處於常溫 下無干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。. 圖16A至圖16D分別是於與第一實驗條件相同之條件 下,根據第四比較實驗剛剛製備之樣品表面、經受熱衝擊 測試之樣品表面、經受熱靜水測試之樣品表面及處於常溫 下無干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖17A至圖17D分別是於與第一實驗條件相同之條件 下,根據第五比較實驗剛剛製備之樣品表面、經受熱衝擊 測試之樣品表面、經受熱靜水測試之樣品表面及處於常溫 下無干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 圖18A至圖18D分別是於與第一實驗條件相同之條件 下,根據第六比較實驗剛剛製備之樣品表面、經受熱衝擊 測試之樣品表面、經受熱靜水測試之樣品表面及處於常溫 下無干擾之樣品表面之掃描式電子顯微鏡(SEM)圖片。 【主要元件符號說明】 無。 22❹ 200927358 As seen in Table 5, the whiskers of the solder alloys of the first and tenth experiments were compared with the first alloy and the fourth to sixth experiments. Xing + Add Be bite b a small amount of Be (ie less than _1% ^ compared with the experiment, even when even a very small amount of B (ie less than the heavy Be) added to Sn or when 'can prevent Significant 〇^/〇 weight B) generated by whiskers, added to Sn As described above, whiskers can also be prevented according to the present invention.谇tin alloy, even if the conditions are poor, but the present invention specifically shows and describes the invention, in the case of the invention: shape = and range solder = the solder alloy of the invention can be used in various machines and electronic instruments The above invention provides a lead-free solder alloy capable of preventing the generation of whiskers. While the invention has been particularly shown and described with reference to the exemplary embodiments of the embodiments of the invention Various modifications were made to the details. $ [Simple Description of the Drawings] Figures 1A to 1D are the surface of the sample which has been prepared according to the first experiment, the surface of the sample subjected to the thermal shock test, the surface subjected to the hot hydrostatic test, and the sample without interference at room temperature. Scanning electron microscope (SEM) image of the surface. 2Α to 2D are respectively the surface of the sample prepared according to the second experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the interference at room temperature under the same conditions as the first experimental conditions, respectively. Scanning electron microscope (SEM) image of the sample surface. Φ Φ Figure 3A to Figure 3D are the surface of the sample prepared immediately after the second experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the room temperature under the same conditions as the first experimental conditions, respectively. Scanning electron microscope (SEM) image of the surface of the sample without interference. 4A to 4D are respectively the surface of the sample prepared according to the fourth experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the interference at room temperature under the same conditions as the first experimental conditions, respectively. Scanning electron microscope (SEM) image of the sample surface. 5A to 5D are respectively the sample surface prepared according to the fifth experiment, the surface of the sample subjected to thermal shock, the surface of the sample subjected to the secret water test, and the sample without interference at normal temperature under the same conditions as the first experimental conditions. Scanning electron microscopy (SEM) s of the surface. ',, Fig. 6A to Fig. 6D are respectively the surface of the sample prepared by the sixth experiment under the same conditions as the first experimental condition, the surface of the sample subjected to the thermal shock test subjected to the thermal shock test, and the room temperature under normal temperature. A scanning electron microscope (SEM) image of the surface of the interference. ..., τ ^ to Figure 7D are respectively the sample surface prepared according to the seventh experiment, the surface of the sample subjected to thermal shock 2 200927358, the surface of the sample subjected to the hot hydrostatic test, and the room temperature under the same conditions as the first experimental conditions. Scanning electron microscope (SEM) image of the surface of the sample without interference. Fig. 8A to Fig. 8D are respectively rooted under the same conditions as the first experimental conditions, the surface of the sample prepared by the first experiment, the surface of the sample subjected to the thermal shock test, the surface of the test piece of the secret side, and the temperature of the neonate The scanning electron beam mirror of the sample table φ without interference ( _ then.... Fig. = to Fig. 9D are respectively the sample surface prepared according to the ninth experiment and the sample table subjected to the second = under the first experiment, Scanning electron microscopy (Sem) images of the surface of the sample subjected to the hot hydrostatic test and the surface of the interfering sample, and .2, respectively, = 2 Γ are the surface of the sample taken under the same condition as the first experimental condition. Scanning electron microscope with interference surface..., bottom: Γ Γ = other conditions that are the same as the first experimental conditions ❹ :=?矣The surface and location of the sample subjected to hot hydrostatic testing; = surface reading electron microscope candle μ ) ι , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , - To _===) picture. [Scanning electron microscopy of the surface of the sample (10), the surface of the sample subjected to thermal shock 200927358, the surface of the sample subjected to the thermostatic phase test, and the surface of the sample without interference at normal temperature according to the conditions of the first comparative test (10). SEM) picture. 14A to 14D are respectively under the same conditions as the first experimental conditions, the surface of the sample just prepared according to the second comparative experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the room temperature. Scanning electron microscope (SEM) image of the surface of the sample without interference. 15A to 15D are respectively the surface of the sample prepared according to the third comparative experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the absence of the normal temperature under the same conditions as the first experimental conditions. A scanning electron microscope (SEM) image of the surface of the interfering sample. 16A to 16D are the surface of the sample just prepared according to the fourth comparative experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the room temperature under the same conditions as the first experimental conditions, respectively. Scanning electron microscope (SEM) image of the surface of the sample without interference. 17A to 17D are the surface of the sample which has just been prepared according to the fifth comparative experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the absence of the normal temperature under the same conditions as the first experimental conditions, respectively. A scanning electron microscope (SEM) image of the surface of the interfering sample. 18A to 18D are the surface of the sample which has just been prepared according to the sixth comparative experiment, the surface of the sample subjected to the thermal shock test, the surface of the sample subjected to the hot hydrostatic test, and the absence of the normal temperature under the same conditions as the first experimental conditions, respectively. A scanning electron microscope (SEM) image of the surface of the interfering sample. [Main component symbol description] None. twenty two

Claims (1)

200927358 十、申請專利範圍: 1. 一種無錯焊踢合金,包括: 錫(Sn),作為第一成分;以及 硼(B)或鈹(Be)中之一者,作為第二成分。 2. 如申請專利範圍第i項所述之無鉛焊錫合金,其中 所述無鉛焊錫合金之所述第二成分是〇〇〇1%至〇4%重量 之Be’所述無鉛焊錫合金之所述其餘成分包括所述第一 分及不可避免之雜質。 © 3·如申請專利範圍第丨項所述之無鉛焊錫合金其中 所述無鉛焊錫合金之所述第二成分是〇〇〇3%至〇5%重量 之B,所述無鉛焊錫合金之所述其餘成分包括所述第一 分及不可避免之雜質。 4·如申請專利範圍第1項所述之無鉛焊錫合金更包 括銅(Cu)作為第二成分。 5·如申請專利範圍第4項所述之無鉛焊錫合金,其中 所述第三成分佔0.1%至5.0%重量。 八 ❹ 6.如申請專利範圍第4項或第5項所述之無金L媒媒人 金,其中所述無鉛焊錫合金之所述第二成分是0.001%^ 0.4%重量之Be,所述無鉛焊錫合金之所述其餘成分包括所 述第一成分、所述第三成分及不可避免之雜質。 7.如申請專利範圍第4項或第5項所述之無金L焊错人 金,其中所述無鉛焊錫合金之所述第二成分是0°003 ^ 0.5。/。重量之B,所述無鉛焊錫合金之所述其餘成分包括所 述第一成分、所述第三成分及不可避免之雜質。 23 200927358 8. 如申請專利範圍第1項或第4項所述之無料锡人 金,更包括銀(Ag)作為第四成分。 9. 如申請專利範圍第8項所述之無鉛焊錫合金,其中 所述無鉛焊錫合金之所述第二成分是〇 〇〇1至〇 4%重量之 Be ’所述無鉛烊錫合金之所述其餘成分包括所述第一成 分、所述第四成分及不可避免之雜質的組和所述第一成 分、所述第二成分、所述第三成分、所述第四成分及不可 避免之雜質的組其中之一。 10. 如申請專利範圍第8項所述之無鉛焊錫合金,其中 所述無錯焊錫合金之所述第二成分是0.003%至0.5%重量 之B ’所述無鉛焊錫合金之所述其餘成分包括所述第一成 分、所述第四成分及不玎避免之雜質的組和所述第一成 分、所述第二成分、所述第三成分、所述第四成分及不可 避免之雜質的組其中之一。 24 200927358 七、 指定代表圖: (一) 本案指定代表圖為:圖1 (二) 本代表圖之元件符號簡單說明: 無。 八、 本案若有化學式時,請揭示最能顯示發明特徵的化 學式: 無。200927358 X. Patent application scope: 1. A non-error welding alloy, comprising: tin (Sn) as the first component; and boron (B) or beryllium (Be) as the second component. 2. The lead-free solder alloy of claim i, wherein the second component of the lead-free solder alloy is 〇〇〇1% to 〇4% by weight of the lead-free solder alloy of Be' The remaining ingredients include the first component and the unavoidable impurities. 3. The lead-free solder alloy of claim 3, wherein the second component of the lead-free solder alloy is 〇〇〇3% to 5% by weight of B, the said lead-free solder alloy The remaining ingredients include the first component and the unavoidable impurities. 4. The lead-free solder alloy described in claim 1 further comprises copper (Cu) as the second component. 5. The lead-free solder alloy of claim 4, wherein the third component comprises from 0.1% to 5.0% by weight. 8. The gold-free L-media gold as described in claim 4 or 5, wherein the second component of the lead-free solder alloy is 0.001%^0.4% by weight of Be, the lead-free The remaining components of the solder alloy include the first component, the third component, and unavoidable impurities. 7. The gold-free L-welding gold as described in claim 4 or 5, wherein the second component of the lead-free solder alloy is 0° 003 ^ 0.5. /. At a weight B, the remaining components of the lead-free solder alloy include the first component, the third component, and unavoidable impurities. 23 200927358 8. The uncoated tin gold as described in item 1 or 4 of the patent application, including silver (Ag) as the fourth component. 9. The lead-free solder alloy of claim 8, wherein the second component of the lead-free solder alloy is 〇〇〇1 to 〇4% by weight of the above-mentioned lead-free bismuth tin alloy The remaining components include the first component, the fourth component, and a group of unavoidable impurities and the first component, the second component, the third component, the fourth component, and unavoidable impurities One of the groups. 10. The lead-free solder alloy of claim 8, wherein the second component of the error-free solder alloy is 0.003% to 0.5% by weight of B', and the remaining components of the lead-free solder alloy include a group of the first component, the fourth component, and an unavoidable impurity, and a group of the first component, the second component, the third component, the fourth component, and an unavoidable impurity one of them. 24 200927358 VII. Designated representative map: (1) The representative representative of the case is as follows: Figure 1 (2) The symbol of the symbol of the representative figure is simple: None. 8. If there is a chemical formula in this case, please reveal the chemical formula that best shows the characteristics of the invention: None.
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Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5210323B2 (en) 2006-12-29 2013-06-12 イルジン カッパー ホイル カンパニー リミテッド Lead-free solder alloy
JP5245568B2 (en) * 2008-06-23 2013-07-24 新日鉄住金マテリアルズ株式会社 Electronic member having lead-free solder alloy, solder ball and solder bump
CN103056543B (en) * 2013-01-18 2015-03-25 江苏师范大学 Lead-free nanometer solder containing Yb, A1 and B
CN105149809B (en) * 2015-10-10 2017-09-26 南京青锐风新材料科技有限公司 It is a kind of suitable for antioxidant of SnAgCu or SnCu solders and preparation method thereof
CN105834611B (en) * 2016-05-04 2018-02-13 中南大学 A kind of high conductance high reliability Ce Sn Ag Cu solders suitable for Electronic Packaging
CN105834612B (en) * 2016-05-04 2018-02-23 中南大学 A kind of high-dimensional stability Sn Ag Cu solders suitable for Electronic Packaging
CN107877031A (en) * 2017-11-27 2018-04-06 东莞市千岛金属锡品有限公司 A kind of lead-free low-temperature solder and preparation method thereof
KR102913710B1 (en) 2022-10-28 2026-01-15 (주)에버텍엔터프라이즈 Silver paste composition for sinter joining
KR20240146476A (en) 2023-03-29 2024-10-08 (주)에버텍엔터프라이즈 Sintering paste composition for drying shrinkage control

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2024545A (en) * 1933-10-04 1935-12-17 L D Caulk Company Dental alloy
US3827884A (en) * 1970-07-15 1974-08-06 Daido Metal Co Tin based white metal bearing alloys producing good bond with backing material
GB2201545B (en) * 1987-01-30 1991-09-11 Tanaka Electronics Ind Method for connecting semiconductor material
JP2778171B2 (en) * 1990-01-10 1998-07-23 三菱マテリアル株式会社 Pb alloy solder for semiconductor device assembly
JP3226213B2 (en) * 1996-10-17 2001-11-05 松下電器産業株式会社 Solder material and electronic component using the same
US5837191A (en) * 1996-10-22 1998-11-17 Johnson Manufacturing Company Lead-free solder
JP3306007B2 (en) * 1998-06-30 2002-07-24 株式会社東芝 Solder material
JP3833829B2 (en) * 1998-07-07 2006-10-18 内橋エステック株式会社 Solder alloy and electronic component mounting method
JP2002248596A (en) * 2001-02-27 2002-09-03 Toshiba Tungaloy Co Ltd Lead-free solder balls with excellent oxidation resistance
KR100698662B1 (en) * 2003-12-02 2007-03-23 에프씨엠 가부시끼가이샤 Terminals forming surfaces consisting of tin-silver-copper ternary alloys, parts and articles
JP2005288544A (en) * 2004-03-09 2005-10-20 Toshiba Corp Lead-free solder, soldering method and electronic component
JP2005288478A (en) * 2004-03-31 2005-10-20 Toshiba Corp Lead-free solder joint
JP2005319470A (en) * 2004-05-06 2005-11-17 Katsuaki Suganuma Lead-free solder material, electronic circuit board, and manufacturing method thereof
JP4471825B2 (en) * 2004-12-09 2010-06-02 日本電波工業株式会社 Electronic component and method for manufacturing electronic component
JP4471824B2 (en) * 2004-12-09 2010-06-02 日本電波工業株式会社 High temperature solder and cream solder
JP4617485B2 (en) * 2004-12-13 2011-01-26 ナノジョイン株式会社 Solder alloy, metalized film capacitor end face electrode material, metalized film capacitor
JP2008030047A (en) * 2006-07-26 2008-02-14 Eishin Kogyo Kk Unleaded solder
JP5210323B2 (en) 2006-12-29 2013-06-12 イルジン カッパー ホイル カンパニー リミテッド Lead-free solder alloy

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