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TW200919400A - Display device - Google Patents

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Publication number
TW200919400A
TW200919400A TW097130924A TW97130924A TW200919400A TW 200919400 A TW200919400 A TW 200919400A TW 097130924 A TW097130924 A TW 097130924A TW 97130924 A TW97130924 A TW 97130924A TW 200919400 A TW200919400 A TW 200919400A
Authority
TW
Taiwan
Prior art keywords
light
photo
display device
deterioration
circuit
Prior art date
Application number
TW097130924A
Other languages
Chinese (zh)
Other versions
TWI390479B (en
Inventor
Takashi Kunimori
Yasushi Yamazaki
Takashi Sato
Masanori Yasumori
Original Assignee
Epson Imaging Devices Corp
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Application filed by Epson Imaging Devices Corp filed Critical Epson Imaging Devices Corp
Publication of TW200919400A publication Critical patent/TW200919400A/en
Application granted granted Critical
Publication of TWI390479B publication Critical patent/TWI390479B/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/13306Circuit arrangements or driving methods for the control of single liquid crystal cells
    • G02F1/13318Circuits comprising a photodetector
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/3406Control of illumination source
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2320/00Control of display operating conditions
    • G09G2320/06Adjustment of display parameters
    • G09G2320/0626Adjustment of display parameters for control of overall brightness

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Liquid Crystal (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal Display Device Control (AREA)
  • Thin Film Transistor (AREA)

Abstract

An objective of the present invention is to provide a display device having a light intensity detecting device, which has a sensitivity compensating function and can be made by a simple process. The present invention provides a display device that has a display area and first and second photodetectors 10a and 10b on a substrate and outputs as a light intensity signal Sa light intensity detected by the first and second pohtodetectors 10a and 10b. The first photodetector 10a includes a first photodetection circuit LS1 outputting a first output signal Sa to a pohtosensor reader 20, while the second photodetector 10b includes a second pohtodetection circuit LS2 outputting a second output signal Sb to the pohtosensor reader 20 and a light-reducing means. The photosensor reader 20 includes a photodegradation factor calculator 21 calculating a photodegradation compensation factor K, a photodegradation rate calculator 22 deriving a photodegradation rate D based on the pohtodegradation compensation factor K, and a light signal outputting unit 24 outputting a light intensity signal S based on the pohtodegradation rate D.

Description

200919400 "九、發明說明: 【發明所屬之技術領域】 本發明係關於一種顯示裝置。 【先前技術】 用之光量檢測電路,為人所知者有—種技術,係禾 電流對嶋測用電容器進行4之」雷藉由該漏 該電容器的兩端間的電壓辑彳—^ j並監娜 「專利文獻υ 〈化,稭此_光量(例如參考 值對體的漏電流與受光量成比例’但漏電流 值對又先!之感度,會因光曝露而降低。因此,於上述專 利文獻1所記載之光量檢測電的氏 光量的檢測精準度降低。 曰口ά度的降低導致 乂為了防止此檢測精準度的降低,為人所知者有— 良溥膜電晶體的產生方法,並提升對劣化特性之光電 :兀件(例如參考專利文獻2)。 電軺換 [專利文獻1]日本特開2006_29832號公報 [專利文獻2]日本特開平_23262〇號公報 【發明内容】' (發明所欲解決之課題) 於上述專利文獻2所記載之光電轉換元件中,你 具備特殊的製造條件,因而導致製造成本上升之問。、^ 體而言’於使用薄膜電晶體之顯示裝置 製作二: 器,或於同-裝置中製造顯示裝置及光感測器:= 320535 200919400 =與:示裝置的驅動電晶體之製程達到共通化,因此必須 進仃衣紅的追加或製H置之㈣的條件設定。 (用以解決課題之手段) 处本發明係為了解決上述課題的至少一部分而研創者, 且旎夠以下列型態或適用例來實現。 [適用例η本相例之顯示裝置’係於基板上具有對 ::各像素而具備開關元件之顯示區域之顯示裝置, 【二:測部、具備第2光感測器之第2光檢測部、及光 二測^買取部,並輸出由前述第1光檢測部及前述第2光 檢測出之光量作為光量訊號;矣減光手段,以俯 測器的至少J疊;3弟::感測器或前述第2光感 ^ 域,並使人射於前述第1光感測 ;係^ .⑹感測器之光量成為不同;前述第1光檢測 之第5據入射於前述第1光感測器之入射光所得 之第1輸出訊5虎’輪屮5音τ、+* t 測雷路· a、+、— 出剛述先感測器讀取部之第1光檢 ★ ’ ^弟2光檢測部係具有:將根據人射於前述第 ^感測器之入射光所得之第2輸出訊號,輸出至前述^ 感測器讀取部之第2本仏.日丨命灿 別I尤 且備· Am… 前述光感測器讀取部係 盥一十…9二運异部’係運算出屬於前述第1輪出訊號 /、别述(2輪出訊號之間的比例之測定比例,並且運算出 正:數’此光劣化校正係數為前述測定比例:與 二測定出之初期狀態的前述測定比例之初期比例之 間的比例;光劣化率運算部,係根據前述光劣化校正係Γ: 320535 200919400 V導出前述第1或第2輪出訊號的 部,係根據前述光劣化率m化羊,及先訊说輸出 方计w姑 4 &態的光量訊號之 方式板正^第1或第2輸出職料以輸出。 例,Ϊ =巾可A第1及第2輸出訊號與預先準備的初期比 不對ί初期狀態的第1或第2輸出訊號,因此,可在 度校正功能之顯示裝置。進料更下,貫現具備感 ,驢叙ί外’可使第1及第2光感測器的製程與顯示裝置的 k、1及第2光感測器。所以可降低成本。 [適用例2]於上述顯示裳置中,具有:第丄之前述減光 」又係降低入射於前述第i光感測器之光量;及第2之 二述減光手段,係降低人射於前述第2光感測器之光量; 月^第2、減光手段所致之入射光的降低率,較理想係比前 述第1減光手段所致之人射光的降低率還大。 I —藉此’可降低人射於第1光感測器及第2光感測器之 光罝,因此可分別延緩各個光感測器的光劣化速度。所以, 至因各個光感測器之光劣化的進展而使第1輸出訊 #U與第2輪出訊號之間的比例不再改變所導致之無法充分 進仃扠正為止之時間。根據本構成,可提供一種能夠延長 校正壽命之顯示裝置。 、外[適用例3]於上述顯示裝置中,前述第i減光手段與前 述第2減光手段之相對分光穿透率較理想為相等。 错此,可抑制因入射光的差所導致之第1光感測器及 320535 7 200919400 第2光感測盗之光劣化量的波動。此係由於,光劣化量係 由將各個光感測器之人射光的分光特性與各個光感^的 分光感度相乘所得之值所決定,藉由使用相對分光穿透 相等之減光手段,可抑制因入射光的差所導致之光劣化量 的波動之故。因此可提供一種能夠進行穩定的校正之顯ς [適用例4]於上述顯示裝置中,前述減光手段較理想係 具有將入射於前述第!光感測器或前述第2光感測器之光 的一部分予以遮光之遮光構件。 藉此,可將入射於第1光感測器或第2光感測器之光 予以減光。因此,可從第1及第2輸出訊號與預先準備的 初期比例,來算出初期狀態的第1或第2輸出訊號,所以 可在不對第1及第2光❹彳㈣構造進行變更下,實現具 備感度校正功能並可延長校正壽命之顯示裝置。、’、 [適用例5]於上述顯示裝置中,前述減光手段較理想係 ς:入射於前述第1光感測器或前述第2光感測器之光 予以減光之減光構件以及前述遮光構件。 +、f此,可將入射於第1光感測器或第2光感測器之光 、、’、光目此彳攸第1及第2輸出訊號與預先準備的 ^比例丄來算出初期狀態的第1或第2輸出訊號,所以 供^對m第2光感測器的構造進㈣更下,實現具 備感度校it功能並可延長校正壽命之顯示裝置。 理相ϋ _6]於上相示裝置中’前述光劣化率運算部較 〜'係/、備使前述光劣化校正係數與前述光劣化率相對應 320535 8 200919400 、之查詢表(l00kuptable)。 士,::光劣化校正係數為變數之函數來表示光劣化率 二:二Ϊ為複雜的數學式,則電路規模會變得較大。 運算部係的增大以及消耗電力的增加。光劣化率 的電路因=:表=函數’由於不需要大規模 力之顯示裝置夠抑制製造成本並降低消耗電 者义[適用例7]於上述顯示裝置中,前述光劣化率運算部在 化校正係數未包含於前述查詢表時,較理想為 :由3两述查詢表上的前述光劣化校正係數之内插計 开,來導出前述光劣化率。 藉上可‘出對應於查詢表中所未包含之任意的光劣 化校正係數之衫㈣,因此可提供-種㈣縮小查詢表 並抑制資料量之顯示裝置。 [適用例8]於上述顯示裝置中,前述第1光感測器及前 述,2光感測器較理想為薄膜電晶體,並具有對施加於前 C薄厲電阳體的兩端之電慶進行充電之電容器。 、藉此,充電於電容器之電位會因入射於光感測器之入 射光及減光入射光的光量而產生變動,因此可提供一種將 %位作為弟1及弟2輪出訊號輸出至光感測器讀取之 顯示裝置。 , [適用例9]於上述顯示裝置中,前述第i及第2輪出訊 唬較理想係藉由光電流量或對前述電容器進行電荷的充放 電所致之電壓下降時間而求出。 320535 9 200919400 藉此,於光感測器讀取部中可谨〜山 及光劣化率,因此可提供—種能化校正係數 之顯示裝置。 翰出杈正後的光量訊號 [適用例ίο]於上述顯示裝置中, ; 較理想係對前述第!及第2輸谁…匕係數運算部 ψ ^., ^ °凡唬進行對數轉換來運算 出剛述先劣化校正係數;前述光劣 -, 为化辜運鼻部係參考使對 數的月Ο述光劣化校正係數與對數 1文丁 兮、+.左%* 的則迷光劣化率相對應之 刖述查淘表,從前述劣化係數運算 、、 =劣化校正係數,取得前述對數的光劣:率= ==在以前述對數的光劣化率對於對數的第;; 訊號進行校正後’將校正後之前述對數的第」或 第2輸出訊號轉換回實數並予以輪出。 藉此’可將光感測器讀取部的乖 加瞀;5、访瞀士时门 丨的乘异及除算電路取代為 加开及減异電路,因此可提供— 岳丨丨、*知㊉丄 _ 稷此夠鈿小電路規模並抑 制4耗電力之顯示裝置。此外, ρ m j镨此降低製造成本。 [適用例11]於上述顯示襞置中, 印一 區域中具備光電物質層。 w '、; H、不 旦,於光感測器中檢測出光電物質層的入射光 里’因此可提供一種於對庫你爾 扞旦…展境之適當的發光量下進 打像顯不之顯不裝置。 tfim12]於上迷顯不震置中,前述第1光㈣部及 緣並列配置於至少〗邊。相示區域的外周 藉此’可於僅可㈣近顯㈣之場所進行制並提高 320535 10 200919400 檢測精準度。此外,藉由並列配置第1光檢測部及第2光 、! I5可抑制第1光感測益及第2光感測器的特性波動, 而可更進一步提高檢測精準度。 则例U]於上述顯示裝置中,前述W光檢測部及 刚述弟2光檢測部較理想係分別沿著前述顯示區域 緣交互地配置於至少1邊。 错此,可抑制照射於第i光感測器及第 而降低第槪測器及第2光感測 =用例14]於上述顯示裝置中,前述第!光檢測部; 别述^ 2光檢測部較理想係配設於前述像素内的一部分 △藉此’可直接檢測出照射至顯示區域之光量。因此$ 能夠提高檢測精準度。 ) \ 大小ifi例^於^述顯示裝f中,前述第1光感測器戈 等。、,°十與剛述第2光感測器之大小的合計較理想為;^ 高4:準=個光感測器的受光面積相等,因㈣ 上述顯示裝置中,前述減光手段較理想 马濾色盗或偏光板或相位差板。 板或^ i由於可與般顯示裝置所具備之遽色器或偏光 ΓίΙΓ差板之製程達到共通化,因此可在簡便的步驟下 錢減光手段。所以可藉此降低製造成本。 [適用例17]於上4顯示裝置中,前述遮光構件較理想 320535 11 200919400 、 為黑色矩陣。 藉此’作為遮光構件之里 -π a卞<黑色矩陣的形成,可與一般顯 不裝置所具備之黑色矩陣之製程達到共通化,因此可^ 便的步驟下製造黑色矩陣。 在間 【實施方式】 ㈣可纽降低製造成本。 —以下係使用圖式’說明本發明之顯示裝置。此外,本 =施㈣為表示本發明的—態樣,並㈣以限制本發明 , M 〜旳乾圍内,可進行任意的變更。 4 此外,於以下圖式中,為Ύ宙〜H ^ 溆欠德& ,、、、了更谷易明瞭各構成,實際的構 以/、各構仏之縮小比例與數目等係有所不同。 [第1實施型態] θ _第1圖係顯示本發明的第1實施型態之半穿透型液日曰 痛示裝置(顯示裝置/電性井與驻 曰 ' 电庇尤予裝置)的陣列基板之示袁俯 視圖。第1圖為透視濾色器來I 、、、 。水衣不之圖式。第2圖#顯千 第1圖之陣列基板的1個像素份之偷鉬闰 ' '/ Ν ^ ττττττ , 傢f伤之俯視圖。第3圖係顯示 第2圖的ΙΠ-ΠΙ線之剖面圖。 置之陣列基板AR(參考第3圖)及濾色器基板啊 圖)’陣列基板AR係於由矩形狀的透明絕緣材料、例如玻 璃板所形成之透明基板1002上,形 拔φ成種種配線等而成;同 ^也,濾色器基板CF係於由矩形狀的透明絕緣材料所形 成之透明基板1010上,形成種種配線等而成。陣列基板 Μ係當_色器、基板CF對向配置時,以形成有預定空間 的突出部1002A之方式,使用該尺比濾色器基板cf還大 320535 12 200919400 '者。於這些陣列基板AR及濾色器基板〇ρ的外周圍,贴 附有密封材(圖式中省略),並於内部密封有液晶(電性光學 物質)1014(參考第3圖)及間隔件(圖式中省略)而構成。 陣列基板AR係具有分別相對向之短邊1〇〇2&、!㈧孔 及長邊1002c、l〇〇2d ’ 一方的短邊1002b係成為突出部 1002A,於此突出部丨002A裝載有源極驅動器及閘極驅動 器用的半導體晶片Dr’於另一方的短邊1〇〇2a,配設有第 1光檢測部10a及第2光檢測部10b。此外,於陣列基板 AR的背面設置有作為照光手段之背光(圖式中省略)。此背 光係根據第1光檢測部10a及第2光檢測部1〇b的輸出, 藉由外部控制電路(圖式中省略)所控制。 此陣列基板AR係於與濾色器基板CF對向之一面、 亦即與液晶接觸之-面,具有:往第!圖的横向(χ轴方向) 延伸且隔著預定間隔所排列配置之複數條閘極線gw;以 及與這些閘極線Gw絕緣,並往第】圖的縱向(Y軸方向) 延伸且隔著預定間隔所排列配置之複數條源極線。這 些源極線SW及閘極線GW係配線為矩陣狀,於以相互交 又之閘極線GW與源極線SW所包圍之各區域.,形成有= 由來自閘極線GW的掃描訊號而成為導通狀態.之作為開^ 元件的TFT(參考第2圖),以及經由開關元件供應有來自 源極線SW的影像訊號之像素電極1〇26(參考第3圖)。 這些以閘極線GW與源極線sw所包圍之各區域°,係 構成所謂的像素,具有複數個像素之區域係成為顯示區域 DA。此外,開關元件係使用例如薄膜電晶體(τρτ)。 320535 13 200919400 各閘極線GW及各源極線SW,係往顯示區域DA外、 亦即往框緣區域延伸出,而連接於由LSI等的半導體晶片 所構成之驅動器Dr。此外,陣列基板AR係於一方的長邊 1〇〇2d側’配置有從第卜第2光檢測部i〇a、i〇b的第j、 第2光檢測電路LS1、LS2所導出之拉出配線u至L4 , 並連接於屬於與外部控制電路5〇之間的接點之.端子丁丨至 T4。拉出配線L1構成第1源極線,拉出配線L2構成第2 源極線,拉出配線L3構成汲極線,拉出配線L4構成閘極 線。 . 外部控制電路50係具有光感測器讀取部2〇及電位控 制電路30 〇 工 光感測器讀取部20係與端子τπ、T2連接,電位控帝 電路30與端子T3、T4連接。電位控制f路%係將基季 電®及閘極電壓等供應至第」、第2光檢測部」〇a、、*, 並從第1、第2光檢測部1Ga、1Qb,將輪出訊號輪出至光 ,測器讀取部2G。之後藉由來自光感測器讀取部2〇之光 量訊號’來控制圖式中省略之背光。 透明基板1002上的驅動器Dr,可取代為具有驅動哭 仏、光感測器讀取部2G #之呵啊她d α咖 電路)晶片。 預 接下來主要參考第2圖及第3圖,說明各像素的且 構成°第2圖係顯示陣列基板的1個像素份之俯視圖,,、第 3圖係顯示第2圖的III_IΠ線之剖面圖。 於陣列基板AR之透明基板聰上的顯示區域μ, 320535 14 200919400 閘極線GW以等間隔且平行地形成,並且從該問極線⑽ 延伸設置有構成開關元件之TFT的閘極電極g。此外,於 相鄰的閘極、線GW之間的大致中央處,以平行於開極線GW 之方式形成有輔助電容線1G16,於此輔助電容線i㈣,形 成有寬度比辅助電容線1()16還寬之辅助電容電極1〇17。 此外’於透明基板1002的整面’以覆蓋閘極線GW、 輔助電容線祕、辅助電容電極1〇17及開極電極g之方 式’層積有由氮切或氧切等透明絕緣材料所形成之開 極絕緣旗1 〇 18。於間搞雷士 〆 以間極電極G上,係隔介閘極絕緣膜1018 形成有由非晶石夕等所形成之半導體層1〇19。此外,於間極 =緣膜1G18上、’複數條源極線請及閘極線GW係以互相 成^從該源極線SW’以接觸於半導體層 19之方式延伸設置TFT的源極電極s,此外,由盥源極 及源極電極3相同之材料所形成之沒極電極d,同 二二接觸於半導體層_之方式’設置於閘極絕緣膜 當於極線GW與源極線SW所包圍之區域乃相 ^層】mo、°並藉由閑極電極G、閉極絕緣膜1018、半 9、:原極電極S、 電形成於各像素。此時,係藉 =輔助電容電極1G17來形成各像素的辅助電容。 式,、^覆盖這些源極線sw、TFT、間極絕緣膜刪之方 二所板1⑻2的全面而層積有例如纟無機絕緣材 斤开/成之保護絕緣膜(亦稱為純化膜)1020,於此保護絕 320535 15 200919400 緣膜1020上,涵蓋整個透明基板1002而層積有例如由包 含負型受光材料之丙烯酸樹脂等所形成之層間膜(亦稱= 平坦化膜)1021。此層間膜1〇21的表面係於反射部1〇2=; 形成有細微的凹凸(圖式中省略),於穿透部1〇23中則形成 為平坦。 此外,於反射部1022之層間膜1〇21的表面,係藉由 濺鍍法形成有鋁或鋁合金製的反射板1〇24,於保護絕緣膜 1020、層間膜1021及反射板1〇24 ’於對應於TFT的汲極 電極D之位置上形成有接觸孔〗〇25。 再者,於各個像素中,於反射板1〇24的表面、接觸孔 1025内及穿透部1〇23之層間膜1〇21的表面,形成有例如 由 ITO(Indium Tin Oxide:氧化銦錫)或 IZ〇(Indium Zinc200919400 " Description of the Invention: [Technical Field to Which the Invention Is Ascribed] The present invention relates to a display device. [Prior Art] A light quantity detecting circuit is known as a technique in which a current is applied to a capacitor for detecting a voltage by a voltage between the two ends of the capacitor. And the "patent literature", the amount of light (for example, the reference value is proportional to the leakage current of the body and the amount of light received), but the sensitivity of the leakage current value is first! The sensitivity will decrease due to light exposure. Therefore, The accuracy of detecting the amount of light of the light amount detection electric power described in the above Patent Document 1 is lowered. The decrease in the degree of sputum sputum causes the 乂 to prevent the decrease in the accuracy of the detection, and it is known that the generation of the enamel film transistor In the method of the present invention, the present invention is disclosed in Japanese Laid-Open Patent Publication No. Hei. No. 2006-29832. In the photoelectric conversion element described in Patent Document 2, you have special manufacturing conditions, which leads to an increase in manufacturing cost. Display device fabrication 2: device, or manufacturing display device and photo sensor in the same device: = 320535 200919400 = with: the process of driving the transistor of the device is common, so it is necessary to add or make a clothing red H. (4) Condition setting. (Means for Solving the Problem) The present invention has been developed in order to solve at least a part of the above problems, and is realized by the following types or application examples. The display device of the example has a display device having a display area of a switching element for each pixel on the substrate, and [2: a measuring unit, a second light detecting unit including the second photo sensor, and a light detecting unit. The purchase unit outputs a light amount detected by the first light detecting unit and the second light as a light amount signal; a dimming means to at least a J stack of the tilt detector; 3: a sensor or the second a light-sensing field, and causing a person to strike the first light sensing; (6) the amount of light of the sensor is different; and the fifth light of the first light detecting is incident on the incident light of the first photo sensor The first output of the news is 5 tiger's rim 5 sound τ, +* t measuring the road · a +, - The first light detection of the first sensor reading section is just described. The ^2 light detecting unit has a second output signal obtained by incident light from a human sensor. Output to the second part of the above-mentioned ^ sensor reading section. 丨 丨 灿 灿 I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I I It belongs to the first round of the signal number, and the other is the measurement ratio of the ratio between the two rounds of the signal, and the positive: number is calculated. The light deterioration correction coefficient is the aforementioned measurement ratio: the foregoing initial state of the second measurement The ratio between the initial ratios of the measurement ratios; the photo-degradation rate calculation unit derives the first or second round-out signal based on the photo-degradation correction system: 320535 200919400 V, and converts the sheep according to the photo-deterioration rate. , and the first news that the output of the meter 4 & state of the light signal signal board is ^ first or second output material to output. For example, the Ϊ = towel can be the first and second output signals of the first and second output signals, and the first or second output signals of the initial state are not correct. Therefore, the display device of the degree correction function can be used. The feed is further reduced, and the k, 1 and second photosensors of the first and second photosensors and the display device can be made. So it can reduce costs. [Applicable Example 2] In the display skirt described above, the light reduction of the third light is to reduce the amount of light incident on the ith photosensor; and the second light reduction means is to reduce the human incidence. The amount of light of the second photosensor is higher than the rate of decrease of incident light due to the first dimming means. I - this can reduce the aperture of the first photo sensor and the second photo sensor, so that the photodegradation speed of each photosensor can be delayed. Therefore, the time until the ratio between the first output signal #U and the second round of the signal is no longer changed due to the progress of the light deterioration of the respective photosensors is not sufficient. According to this configuration, it is possible to provide a display device capable of extending the life of the correction. Further, in the above display device, the relative spectral transmittance of the ith dimming means and the second dimming means is preferably equal. In this case, it is possible to suppress the fluctuation of the amount of light deterioration of the first photosensor and the 320535 7 200919400 second photo-sensing stolen due to the difference in incident light. This is because the amount of photo-deterioration is determined by multiplying the spectral characteristics of the light emitted by the person of each photosensor by the spectral sensitivity of each photo-sensing, by using a dimming means that is equivalent to the split-light penetration. It is possible to suppress fluctuations in the amount of photo-deterioration caused by the difference in incident light. Therefore, it is possible to provide a display capable of performing stable correction. [Application 4] In the above display device, it is preferable that the dimming means is incident on the first! A light-shielding member that blocks a part of the light of the photo sensor or the second photo sensor. Thereby, the light incident on the first photosensor or the second photosensor can be dimmed. Therefore, since the first or second output signals in the initial state can be calculated from the first and second output signals and the initial ratio prepared in advance, the first and second optical (four) structures can be changed without changing the structure. A display device with sensitivity correction function and extended calibration life. [Application Example 5] In the above display device, the dimming means is preferably a dimming member that diffracts light incident on the first photosensor or the second photosensor, and The aforementioned light shielding member. +, f, the light incident on the first photo sensor or the second photo sensor, the ', the light source, the first and second output signals, and the ratio prepared in advance can be used to calculate the initial stage. In the state of the first or second output signal, the structure of the second photo sensor is further lowered, and a display device having a sensitivity calibration function and extending the correction life is realized. In the upper phase display device, the photo-degradation rate calculation unit is configured to compare the photo-degradation correction coefficient with the photo-degradation rate by 320535 8 200919400 and a look-up table (l00kuptable). , :: The photo-degradation correction coefficient is a function of the variable to indicate the photo-deterioration rate. Two: The second is a complex mathematical formula, and the circuit scale becomes larger. The increase in the calculation unit and the increase in power consumption. Circuit of photodegradation rate =: Table = function 'The display device which does not require a large-scale force is sufficient to suppress the manufacturing cost and to reduce the power consumption. [Applicable Example 7] In the display device described above, the photo-degradation rate calculation unit is When the correction coefficient is not included in the look-up table, it is preferable that the optical degradation rate is derived by interpolation of the photo-degradation correction coefficients on the two look-up tables. By borrowing a shirt (4) corresponding to any of the light-degrading correction coefficients not included in the lookup table, it is possible to provide a display device that reduces the look-up table and suppresses the amount of data. [Application Example 8] In the display device described above, the first photosensor and the second photosensor are preferably thin film transistors, and have electric power applied to both ends of the front C thin electric body. Celebrate the capacitor for charging. Therefore, the potential charged in the capacitor changes due to the amount of incident light incident on the photosensor and the amount of dimming incident light, so that a % bit can be provided as the output signal of the brother 1 and the brother 2 to the light. A display device that the sensor reads. [Application Example 9] In the above display device, the i-th and second-round output signals are preferably obtained by a photocurrent flow rate or a voltage fall time due to charge and discharge of electric charge to the capacitor. 320535 9 200919400 By this, it is possible to provide a display device capable of correcting the correction coefficient in the light sensor reading portion. The light signal after the exit of Han [Applicable ίο] in the above display device, ; And the second loser... 匕 coefficient calculation unit ψ ^., ^ ° 唬 唬 对 对 对 运算 运算 运算 运算 对 对 对 对 对 对 对 对 对 对 对 对 对 对 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; The photo-deterioration correction coefficient is compared with the logarithm of the logarithm of the singularity of the singularity of the singularity of the singularity of the singularity of the singularity of the singularity of the singularity of the singularity of the singularity === After the signal of the logarithm of the logarithm is corrected for the logarithm of the logarithm; the first or second output signal of the corrected logarithm is converted back to a real number and rotated. This can be used to increase the reading of the light sensor reading section; 5. The circuit of the visitor's threshold and the dividing circuit are replaced by the circuit of adding and subtracting, so it can be provided - Yuelu, * know Shiyan _ This is a display device that is small enough to reduce the size of the circuit and suppress 4 power consumption. In addition, ρ m j reduces the manufacturing cost. [Application 11] In the above display device, a photo-electric material layer is provided in the printing region. w ',; H, not, in the photodetector to detect the incident light of the photoelectric material layer 'thus, can provide a kind of appropriate illumination of the library, the display of the illuminating amount of the display No device. Tfim12] is placed in the upper part of the display, and the first light (four) part and the edge are arranged side by side at least. The outer periphery of the display area can be used in the place where only the (four) near display (4) can be performed and the detection accuracy of 320535 10 200919400 can be improved. Further, by arranging the first light detecting unit and the second light and the I5 in parallel, it is possible to suppress fluctuations in the characteristics of the first light sensing and the second photo sensor, and it is possible to further improve the detection accuracy. In the above display device, the W-light detecting unit and the just-described second light detecting unit are preferably arranged alternately on at least one side along the display region edge. In this case, it is possible to suppress the irradiation of the i-th photosensor and to reduce the second detector and the second photo-sensing = use case 14 in the above display device, the aforementioned! The light detecting unit is preferably disposed in a portion of the pixel Δ by the light detecting unit, whereby the amount of light irradiated to the display region can be directly detected. Therefore, $ can improve the accuracy of detection. \ \ Size ifi example ^ in the description of the installation f, the aforementioned first light sensor Ge and so on. The sum of the size of the tenth and the second photosensor is preferably: ^4: quasi=the light receiving area of the photosensor is equal, because (4) the above-mentioned display device, the aforementioned dimming means is ideal A color filter or a polarizer or a phase difference plate. Since the board or the board can be co-operated with the process of the color wheel or the polarizing plate of the conventional display device, the light reduction means can be performed in a simple step. Therefore, the manufacturing cost can be reduced. [Application 17] In the display device of the above 4, the light shielding member is preferably a black matrix, preferably 320535 11 200919400. Therefore, the formation of the black matrix as the light-shielding member can be made common to the process of the black matrix provided in the general display device, so that the black matrix can be manufactured in a convenient step. [Embodiment] (4) The company can reduce the manufacturing cost. - The following description of the display device of the present invention will be described using the drawings. In addition, this = (4) is an aspect which shows this invention, and (4) is restrict|limited by this invention, and can be arbitrarily changed in M. 4 In addition, in the following figures, the composition of the Ύ 〜 ~ H ^ 溆 德 && , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , different. [First Embodiment] θ _ Fig. 1 shows a semi-transmissive liquid corona pain device of the first embodiment of the present invention (display device/electric well and resident 电's electric esoteric device) The top view of the array substrate is shown. Figure 1 shows the perspective filter to I, ,, . The water jacket is not in the picture. Fig. 2 #显千 The first pixel of the array substrate of Figure 1 is a top view of the scratched molybdenum ' ' ' / Ν ^ ττττττ, home f injury. Fig. 3 is a cross-sectional view showing the ΙΠ-ΠΙ line of Fig. 2. The array substrate AR (refer to FIG. 3) and the color filter substrate (FIG.) 'the array substrate AR is attached to a transparent substrate 1002 formed of a rectangular transparent insulating material such as a glass plate, and the φ is formed into various wirings. In the same manner, the color filter substrate CF is formed on a transparent substrate 1010 formed of a rectangular transparent insulating material, and various wirings and the like are formed. In the case where the aligner and the substrate CF are opposed to each other, the ridges are larger than the color filter substrate cf by 320535 12 200919400 ', such that the protrusions 1002A having a predetermined space are formed. A sealing material (not shown in the drawings) is attached to the outer periphery of the array substrate AR and the color filter substrate 〇ρ, and a liquid crystal (electro-optical material) 1014 (refer to FIG. 3) and a spacer are sealed inside. (Omitted in the drawings). The array substrate AR has opposite short sides 1〇〇2&, ! (8) Holes and long sides 1002c, l〇〇2d' One short side 1002b is a protruding portion 1002A, and the protruding portion 丨002A is mounted with a semiconductor wafer Dr' for the source driver and the gate driver on the other short side 1〇〇2a, the first light detecting unit 10a and the second light detecting unit 10b are disposed. Further, a backlight (not shown in the drawings) as a light-guiding means is provided on the back surface of the array substrate AR. This backlight is controlled by an external control circuit (not shown in the drawings) based on the outputs of the first light detecting unit 10a and the second light detecting unit 1b. The array substrate AR is on the side opposite to the color filter substrate CF, that is, the surface in contact with the liquid crystal, and has the following: a plurality of gate lines gw extending in the lateral direction (the x-axis direction) and arranged at predetermined intervals; and insulated from the gate lines Gw and extending in the longitudinal direction (Y-axis direction) of the first drawing A plurality of source lines arranged in a predetermined interval. The source line SW and the gate line GW are wired in a matrix shape, and each of the regions surrounded by the gate line GW and the source line SW is formed with a scan signal from the gate line GW. The TFT which is an ON element (refer to FIG. 2) and the pixel electrode 1A26 which is supplied with an image signal from the source line SW via the switching element (refer to FIG. 3). These regions, which are surrounded by the gate line GW and the source line sw, constitute a so-called pixel, and a region having a plurality of pixels is a display region DA. Further, the switching element uses, for example, a thin film transistor (τρτ). 320535 13 200919400 Each gate line GW and each source line SW extend outside the display area DA, that is, to the frame edge area, and are connected to a driver Dr composed of a semiconductor wafer such as an LSI. Further, the array substrate AR is arranged on the long side 1〇〇2d side of one of the first and second photodetecting circuits LS1 and LS2 of the second optical detecting units i〇a and i〇b. The wirings u to L4 are connected to the terminals belonging to the contact with the external control circuit 5A. The pull-out wiring L1 constitutes a first source line, the pull-out wiring L2 constitutes a second source line, the pull-out wiring L3 constitutes a drain line, and the pull-out wiring L4 constitutes a gate line. The external control circuit 50 has a photo sensor reading unit 2 and a potential control circuit 30. The photo sensor reading unit 20 is connected to the terminals τπ and T2, and the potential control circuit 30 is connected to the terminals T3 and T4. . The potential control f-channel is supplied to the first and second photodetecting sections 〇a, and * by the quaternary electric current and the gate voltage, and is rotated from the first and second photodetecting sections 1Ga and 1Qb. The signal is rotated out to the light, and the detector reading unit 2G. Thereafter, the backlight omitted in the drawing is controlled by the light quantity signal ' from the photo sensor reading unit 2'. The driver Dr on the transparent substrate 1002 may be replaced by a chip having a driving cries, a photo sensor reading portion 2G#. Referring to FIG. 2 and FIG. 3, a plan view of one pixel portion of each of the pixels and showing the second image display array substrate will be described. FIG. 3 is a cross-sectional view showing the III_I line of FIG. Figure. A display area μ on the transparent substrate of the array substrate AR, 320535 14 200919400 The gate lines GW are formed at equal intervals and in parallel, and a gate electrode g of a TFT constituting the switching element is extended from the problem line (10). Further, at a substantially central portion between adjacent gates and lines GW, an auxiliary capacitance line 1G16 is formed in parallel with the open line GW, and the auxiliary capacitance line i (four) is formed with a width ratio auxiliary capacitance line 1 ( ) 16 is also wide auxiliary capacitor electrode 1〇17. Further, 'the entire surface of the transparent substrate 1002' is covered with a transparent insulating material such as nitrogen cut or oxygen cut to cover the gate line GW, the auxiliary capacitance line, the auxiliary capacitor electrode 1〇17, and the open electrode g. The opening insulation flag formed is 1 〇18. In the inter-electrode G, a semiconductor layer 1〇19 formed of amorphous austenite or the like is formed on the interlayer gate insulating film 1018. Further, on the interpole = edge film 1G18, 'the plurality of source lines and the gate line GW are mutually connected from the source line SW' to contact the semiconductor layer 19 so as to extend the source electrode of the TFT. s, in addition, the electrodeless electrode d formed by the same material of the source and the source electrode 3 is in contact with the semiconductor layer _ in the manner of being disposed on the gate insulating film as the polar line GW and the source line The area surrounded by the SW is a layer of mo and °, and is formed in each pixel by the idle electrode G, the closed-electrode insulating film 1018, the half 9, and the primary electrode S. At this time, the auxiliary capacitance of each pixel is formed by the auxiliary capacitor electrode 1G17. A protective insulating film (also referred to as a purification film) in which the source lines sw, the TFT, and the interpolar insulating film are cut out, and the board 1 (8) 2 is laminated, for example, with an inorganic insulating material. 1020. Here, the protective film 320535 15 200919400 is covered with the entire transparent substrate 1002, and an interlayer film (also referred to as a flattening film) 1021 formed of, for example, an acrylic resin containing a negative-type light-receiving material is laminated. The surface of the interlayer film 1〇21 is formed by the reflection portion 1〇2=; fine irregularities are formed (not shown in the drawings), and are formed flat in the penetration portion 1〇23. Further, on the surface of the interlayer film 1〇21 of the reflecting portion 1022, a reflecting plate 1〇24 made of aluminum or an aluminum alloy is formed by sputtering, and the protective insulating film 1020, the interlayer film 1021, and the reflecting plate 1〇24 are formed. A contact hole 〇 25 is formed at a position corresponding to the gate electrode D of the TFT. Further, in each of the pixels, on the surface of the reflecting plate 1B, the contact hole 1025, and the surface of the interlayer film 1〇21 of the penetrating portion 1〇23, for example, ITO (Indium Tin Oxide) is formed. ) or IZ〇 (Indium Zinc)

Oxide :氧化銦鋅)所形成之像素電極1〇26,於此像素電極 1026的上層,以覆蓋所有像素之方式層積有配向膜(圖式 中省略)。 此外,濾色器基板CF係於由玻璃基板等所形成之透 明基板1010的表面,以與陣列基板AR的閘極線Gw與源 極線SW對向之方式,形成有遮光層(圖式中省略),並對 應於由該遮光層所包圍之各個像素,設置例如由紅(R)、綠 (G)、藍(B)所形成之濾色器層1〇27。再者,於對應於反射 部1022的位置之濾色器層1〇27的表面,形成有頂塗層 1028,於此頂塗層1〇28的表面及對應於穿透部1〇23的位 置之濾色器層1027的表面,層積有共通電極1〇29及配向 膜(圖式中省略)。濾色器層丨〇27亦有適當地組合使用靛 320535 16 200919400 (C)、洋紅(Μ)、黃(Y)等濾色器層之情形,於單色顯示用時, 亦有未設置濾色器層之情形。 具備上述構成之陣列基板AR及慮色器基板CF ’係隔 介密封材(圖式中省略)而貼合,最後於以該兩基板及密封 材所包圍之區域中,將液晶1014予以密封,藉此可獲得半 穿透型液晶顯示裝置1〇〇〇。於透明基板1〇〇2的下方,係 配置有圖式中省略之一般所知之具有光源、導光板、擴散 薄片等的背光乃至侧光。 此時’若涵蓋像素電極1026的下部整體來設置反射板 1024 ’則可獲得反射型液晶顯示面板,若為使用此反射型 液晶顯示面板之反射型液晶顯示裝置時,則可使用前光來 取代背光或侧光。 第4圖係顯示由第1光檢測部10a及第2光檢測部1〇b 及光感測器讀取部2G所形成之光量檢測裝置1的構成之方 塊圖。 一第1光檢測部10a係具有第i光檢測電路LS1,第 ^檢測部1Gb具有第2紐測電路LS2。來自第i光檢須 二之第1輸出訊號、及來自第2光檢測電路LS 之第2輸出訊號Sb,係輸出至光感測器讀取部20。 化率取部20係具有劣化係數運算部2卜光劣 '、數運异部21係連接於第1夯 第2光檢測電路⑶另々陰:於昂1先^測電路LS1及 电路LS2及s己憶體電路The pixel electrode 1〇26 formed by Oxide: indium zinc oxide is disposed on the upper layer of the pixel electrode 1026 so as to cover all the pixels, and an alignment film is laminated (not shown in the drawings). Further, the color filter substrate CF is formed on a surface of the transparent substrate 1010 formed of a glass substrate or the like, and a light shielding layer is formed so as to face the gate line Gw of the array substrate AR and the source line SW (in the drawing) Occasionally, a color filter layer 1〇27 formed of, for example, red (R), green (G), and blue (B) is provided corresponding to each pixel surrounded by the light shielding layer. Further, a top coat layer 1028 is formed on the surface of the color filter layer 1〇27 corresponding to the position of the reflection portion 1022, and the surface of the top coat layer 1〇28 and the position corresponding to the penetration portion 1〇23 are formed. On the surface of the color filter layer 1027, a common electrode 1〇29 and an alignment film (not shown in the drawings) are laminated. The color filter layer 亦 27 is also suitably used in combination with a color filter layer such as 靛320535 16 200919400 (C), magenta (yellow), yellow (Y), etc., in the case of monochrome display, there is also no filter set. The case of the color layer. The array substrate AR and the color filter substrate CF' having the above-described configuration are bonded together (the drawings are omitted), and finally, the liquid crystal 1014 is sealed in a region surrounded by the two substrates and the sealing material. Thereby, a transflective liquid crystal display device 1 can be obtained. Below the transparent substrate 1A2, backlights or sidelights having a light source, a light guide plate, a diffusion sheet, and the like, which are generally omitted from the drawings, are disposed. At this time, if a reflective liquid crystal display panel is provided to cover the entire lower portion of the pixel electrode 1026, a reflective liquid crystal display panel can be used. Backlight or sidelight. Fig. 4 is a block diagram showing the configuration of the light amount detecting device 1 formed by the first light detecting unit 10a, the second light detecting unit 1b, and the photo sensor reading unit 2G. The first photodetecting unit 10a has an i-th photodetecting circuit LS1, and the second detecting unit 1Gb has a second new measuring circuit LS2. The first output signal from the i-th photodetection 2 and the second output signal Sb from the second photodetection circuit LS are output to the photosensor reading unit 20. The rate-of-recovery unit 20 has a deterioration coefficient calculation unit 2, and the number-transportation unit 21 is connected to the first-and second-second light-detecting circuit (3), and the other is: the ang1 first measurement circuit LS1 and the circuit LS2 and s memory circuit

Sa及第2輪出訊號处予以讀 =幻輪出訊號 而轉換為光感測器的漏電 320535 17 200919400 :泉:第1光電流量及第2光電流量。之後,運算出屬於第 先電流量及第2光電流量之間的比例之測定比例,缺後 運异出光劣化校正係數—K,此光劣化校正係數為盘屬 ^己憶於記憶體電路23之預先準備之初期狀態的測定比 列之初期比例之間的比例’之後,劣化係數運算部Μ係將 光劣化校正係數κ輸出至光劣化率運算部22(3此外,將第 2光電流量輪出至光訊號輸出部24。 , 光劣化率運算部22係連接於劣化係I運算部21及記 憶體電路23。並參考使屬於光劣化校正係數〖、盘第 =流量及初期狀態的第2光電流量之間的比例之光劣化率 =目制之查詢表(1〇Gk up table),而取得與從劣化係數運 =^所輸出之光劣化校正係數κ對應之光劣化率d。 :、、、後將取付的光劣化率D輪出至光訊號輸出部%。 光訊號輸出部24錢接於劣化係算 化率運算部22。之德 .1 1及光4 /丨22之後,從4化係數運算部所輸出之第2 光電流量以及光劣化率運I邱 '、m η、 P所輸出之光劣化率來 運异出初期狀態的第2光雷法| 收, 木 番、ώ旦从达4丄 尤電机1,將此初期狀態的第2光 電=作為相當於入射光量之光量訊號S並予以輪出。 第5圖係顯示第1、第2氺a 成圖。 昂2先檢測部1〇a、1〇b之電路構 第丄光檢測部l〇a的第 為第!光成測界之^弟17"檢測電路LS1,係具備餘-. 尤益之薄膜電晶體 「TFT100」)、電容哭11Λ L 乂卜略%為 σπ 、及開關元件120。TFT100在 與電容器Π0並聯連接。介ρ 1100 ^ 細連接亦即,TFT100的源極部101與電 320535 I? 200919400 容器11 0的電極! u電性 容器lio的電極112電 ,T100的沒極部102與電 接於輸出踹+ 連接。源極部丨〇1與電極ill連 茌不顆ϋ出為子14〇,並經介 ^ !30。輪出妒孚14〇, ^ 70件120連接於電源端子 上·^輸出蝠子14〇係經介第 ’丁 電性連接。 弟1圖的拉出配線L1與端子T1 此外,TFT100的汲極部π 係電性連接於汲極端子191 w的電極112 汲極端子191係經介第1圃 的拉出配線L3與端子以性連接。㈣端子阶為接: =第1光檢料⑽㈣地,歧时^T3而^^ 此外,tFT100的間極部1〇3係與閑極端子19〇電^也 為第弟部10b的第2光輪 為第2先感測器之薄膜電晶體2〇〇(以下 「™〇」)、電容器21〇、開關元件22〇、及作為減^ 段之滤色ϋ (減光構件)25〇。濾、色器25G係以俯視觀 成於與TFT200重#之區域,並降低入射至丁打·之 量。TFT200係與電容器210並聯連接。亦即,tft2^ ‘源極部201舆電容器210的電極211電性連接, 的汲極部202與電容器210的電極212電性連接。濾色器 250係配置於TFT200的先入射側,TFT2〇〇係檢測出經^ 色器250減光後之光。源極部201與電極211連接於輪= 端子240 ’並經介開關元件220連接於電源端子23〇<3輪出 端子240係經介第1圖的拉出配線L2與端子T2電性連接 於以下的5兒明中,係總括地將弟1光感測器及第2光 感測器兩者稱為「光感測器」。 320535 19 200919400 夕此外’ TFT200的汲極部202及電容器210的電極ii2 係電性連接於汲極端子191。汲極端子191為與㈧ 共通之端子,係經介第1圖的拉出配線L3與端子T3電性 連接。 此外’ TFT200的閘極部203係和與TFT100共通之閘 極端子190電性連接。 乂輸出端子240係經介第1圖的拉出配線L2與端子Τ2 =性連接。汲極端子19ι係經介第j圖的拉出配線L3與 端子T3電性連接。閘極端子19〇係經圖配 線L4與端子T4電性連接。 第6圖係顯不第1、第2光檢測部1 〇a、j 〇b之示意剖 面圖第6圖⑷係顯示第1光檢測電路LSI,第6圖(b) 係顯示第2光檢測電路LS2。 "首先說明第6圖⑷。.於透明基板1〇〇2上,形成有構 成第1光檢測電路LS1之玎丁100、電容器11〇、及開關元 件120。於透明基板1002上,形成有TFT100的閘極部103、 電容器no的電極112、及作為開關元件12〇之薄膜電晶 體的問極部123。並以覆蓋閘極部1〇3、電極H2、及閘極 部123之方式層積有閘極絕緣膜72。 於閘極絕㈣72上’於閘極部1〇3的上方形成有半導 體層HM,於閘極部123的上方形成有半導體層124。於閘 極絕緣膜72形成有:與半導體層1〇4的汲極部1〇2連接之 導電膜173、與源極部⑻及半導體層U4的⑽部122 連接之導電膜m、及與源極部121連接之導電膜175。導 320535 20 200919400 110的電極 電膜174係於電極112上的區域構成電容器 in。 σ 以覆蓋這些導電膜173、174、175之方式層積有保護 絕緣膜76。並以平面狀地覆蓋開關元件12〇的半導體層以 之方式,於保護絕緣膜76上形成黑色矩陣125。 θ 第1光檢測電路LS1係形成於與顯示區域DA為同一 基板上’所以可與陣列基板AR之製程的—部分達到共通 例如第1光檢測電路LS1的閘極絕緣膜72與陣列 基板AR的閘極絕緣膜刪,第i光檢測電路⑶的保護 %緣膜76與陣列基板AR的保護絕緣膜1〇2〇,第^光檢 測電路LSI的導電膜173、174、175與陣列基板ar的源 極電極S、汲極電極D,以及第丨光檢測電路lsi的半導 體層104、124與陣列基板AR的半導體層1〇19等。 接下來5兒明第6圖(b)。於透明基板1〇〇2上,形.成有 構成第2光檢測電路LS2之TFT2〇〇、電容器21〇、及開關 疋件210。於透明基板1〇〇2上,形成有TFT2〇〇的閘極部 203、電谷态210的電極222、及屬於薄膜電晶體之開關元 件220的閘極部223。並以覆蓋閘極部203及電極212及 閘極部223之方式層積有閘極絕緣膜72。 於閘極絕緣膜72上,於閘極部203的上方形成有半導 體層204,於閘極部223的上方形成有半導體層224。於閘 極緣膜72形成有:與半導體層2〇4的汲極部2〇2連接之 導電膜273 ;與源極部201及半導體層224的汲極部222 連接之導電膜274 ;及與源極部221連接之導電膜275。導 21 320535 200919400 210的電極 電膜274係於電極212上的區域構成電容器 211。 以覆蓋這些導電膜273、274、275之方式層積有 絕緣膜76。並以平面狀地覆蓋開關元件22〇的半導體層以 之方式,於保護絕緣膜76上形成黑色矩陣225。於^保護 絕緣膜76對向設置之濾色器基板CF,形成有與丁阳⑼ 對向之濾色器250。濾色器250係以俯視觀看時形成於與 TFT200重疊之區域。藉由濾色器25〇,使入設至第2光檢 測電路LS2之入射光相對於第j光檢測電路⑶減光為 l/n(n> 1) 〇 第2光檢測電路LS2係形成於與顯示區域DA為同一 基板上,所以可與陣列基板AR之製程的—部分達到共通 化。例如,第2光檢測電路LS2的閘極絕緣膜72與陣列 基板AR的閘極絕緣膜1018,第2光檢測電路Ls2的保護 絶緣膜76與陣列基板入11的保護絕緣膜1〇2〇,第2光檢 測電路LS2的導電膜273、274、275與陣列基板从的: 極電極S、;及極電極d,以及第2光檢測電路LS2的半導 體層204、224與陣列基板AR的半導體層1019等。 本實施型態之顯示裝置1〇〇〇的光量檢測裝置丨,係具 備對於因光劣化所降低之光感測器的感度進行校正之功 能。以下說明光感測器的感度校正原理.。 首先,係將光照射至已將電容器110、21〇充電至預定 電位為止之第1、第2光檢測部l〇a、l〇b。如此,於TFT100、 200產生漏電流,因而使電容器11〇、21〇的電位隨時間經 320535 22 200919400 匕而降低此時’係從第1光檢測部l〇a輸出電容器11〇Sa and the second round of the signal are read = the magic wheel is out and the light is converted into a light sensor. 320535 17 200919400 : Spring: the first photoelectric flow and the second photoelectric flow. Then, the measurement ratio belonging to the ratio between the first current amount and the second photoelectric flow rate is calculated, and the light deterioration correction coefficient _ is lost, and the light deterioration correction coefficient is the memory of the memory circuit 23 The deterioration coefficient calculation unit 输出 outputs the photo-degradation correction coefficient κ to the photo-degradation rate calculation unit 22 (3, in addition, the second photo-electricity flow is rotated out after the ratio of the ratio of the initial state to the initial ratio of the preparation) The photo-degradation rate calculation unit 22 is connected to the deterioration system I calculation unit 21 and the memory circuit 23. The second photo-electricity is included in the photo-degradation correction coefficient, the disk number = the flow rate, and the initial state. The photo-deterioration rate of the ratio between the flow rates = the target lookup table (1〇Gk up table), and the photo-degradation rate d corresponding to the photo-degradation correction coefficient κ outputted from the degradation coefficient is obtained. Then, the photo-degradation rate D to be taken out is output to the optical signal output unit %. The optical signal output unit 24 is connected to the degradation system calculation unit 22. After the .1 1 and the light 4 /丨22, from 4 The second photoelectric flow rate output by the coefficient calculation unit and The photo-deterioration rate of the photo-deterioration rate of the output of Iqiu, m η, and P is transmitted to the second light-ray method in the initial state. The second photoelectric form of the state is used as the light amount signal S corresponding to the amount of incident light and is rotated. Fig. 5 shows the first and second 氺a patterns. The circuit structure of the first detecting portion 1〇a, 1〇b The first light detection unit l〇a is the first; the optical measurement interface of the brother 17" detection circuit LS1, which has the remainder -. Youyi's thin film transistor "TFT100"), the capacitor is crying 11Λ L 乂 略 % It is σπ and the switching element 120. The TFT 100 is connected in parallel with the capacitor Π0. ρ ρ 1100 ^ Fine connection, that is, the source portion 101 of the TFT 100 and the electrode of the capacitor 320535 I? 200919400 container 11 0! The electrode 112 of the electrical container lio is electrically connected, and the pole portion 102 of the T100 is electrically connected to the output 踹+. The source part 丨〇1 is connected to the electrode ill. It is 14 〇, ^ 70 pieces of 120 connected to the power terminal. In addition, the pull-out wiring L1 and the terminal T1 of the TFT 1 are electrically connected to the electrode 112 of the 汲 terminal 191 w, and the terminal 191 is connected to the terminal through the first 圃 pull-out wiring L3 and the terminal. Sexual connection. (4) Terminals are connected: = 1st light inspection material (10) (4) Ground, when the time is ^T3 and ^^ In addition, the interpole part 1〇3 of the tFT100 and the idle terminal 19〇 are also the second part of the first part 10b The optical wheel is a thin film transistor 2 〇〇 (hereinafter referred to as "TM 〇") of the second presensor, a capacitor 21 〇, a switching element 22 〇, and a color filter (light reducing member) 25 作为 as a subtraction section. The filter and color filter 25G is formed in a region which is different from the TFT 200 in a plan view, and reduces the amount of incident to the Ding. The TFT 200 is connected in parallel with the capacitor 210. That is, the drain portion 202 of the capacitor 210 is electrically connected to the electrode portion 211 of the source portion 201 and the capacitor 211 of the capacitor 210. The color filter 250 is disposed on the first incident side of the TFT 200, and the TFT 2 detects the light dimmed by the color filter 250. The source portion 201 and the electrode 211 are connected to the wheel=terminal 240' and are connected to the power terminal 23 via the dielectric switching element 220. The third wheel terminal 240 is electrically connected to the terminal T2 via the pull-out wiring L2 of FIG. In the following five paragraphs, both the first light sensor and the second light sensor are collectively referred to as "photosensors". 320535 19 200919400 In addition, the drain portion 202 of the TFT 200 and the electrode ii2 of the capacitor 210 are electrically connected to the gate terminal 191. The 汲 terminal 191 is a terminal common to (8), and is electrically connected to the terminal T3 via the pull-out wiring L3 of Fig. 1 . Further, the gate portion 203 of the TFT 200 is electrically connected to the gate terminal 190 common to the TFT 100. The output terminal 240 is connected to the terminal Τ2 through the pull-out wiring L2 of FIG. 1 . The 汲 terminal 19m is electrically connected to the terminal T3 through the pull-out wiring L3 of the j-th diagram. The gate terminal 19 is electrically connected to the terminal T4 via the wiring line L4. Fig. 6 is a schematic cross-sectional view showing the first and second photodetecting sections 1a and jb, Fig. 6(4) showing the first photodetecting circuit LSI, and Fig. 6(b) showing the second photodetecting Circuit LS2. "First, explain Figure 6 (4). On the transparent substrate 1〇〇2, a solder 100, a capacitor 11A, and a switching element 120 which constitute the first photodetecting circuit LS1 are formed. On the transparent substrate 1002, a gate portion 103 of the TFT 100, an electrode 112 of the capacitor no, and a gate portion 123 as a thin film transistor of the switching element 12A are formed. The gate insulating film 72 is laminated so as to cover the gate portion 1〇3, the electrode H2, and the gate portion 123. A semiconductor layer HM is formed over the gate portion 1A3 at the gate electrode (four) 72', and a semiconductor layer 124 is formed above the gate portion 123. The gate insulating film 72 is formed with a conductive film 173 connected to the drain portion 1〇2 of the semiconductor layer 1〇4, a conductive film m connected to the source portion (8) and the (10) portion 122 of the semiconductor layer U4, and a source thereof. The conductive film 175 is connected to the pole portion 121. The region of the electrode film 174 that is electrically connected to the electrode 112 constitutes a capacitor in. σ A protective insulating film 76 is laminated so as to cover these conductive films 173, 174, and 175. The black matrix 125 is formed on the protective insulating film 76 in such a manner as to cover the semiconductor layer of the switching element 12A in a planar manner. θ The first photodetecting circuit LS1 is formed on the same substrate as the display region DA, so that the gate insulating film 72 and the array substrate AR of the first photodetecting circuit LS1 can be shared with the portion of the array substrate AR. The gate insulating film is deleted, the protective edge film 76 of the i-th photodetecting circuit (3) and the protective insulating film 1〇2 of the array substrate AR, the conductive films 173, 174, 175 of the photodetecting circuit LSI and the array substrate ar The source electrode S, the drain electrode D, and the semiconductor layers 104 and 124 of the second light detecting circuit 1si and the semiconductor layer 1〇19 of the array substrate AR and the like. The next five children are shown in Figure 6 (b). The TFT 2A, the capacitor 21A, and the switching element 210 constituting the second photodetecting circuit LS2 are formed on the transparent substrate 1'2. On the transparent substrate 1〇〇2, a gate portion 203 of the TFT 2 turns, an electrode 222 of the electric valley state 210, and a gate portion 223 belonging to the switching element 220 of the thin film transistor are formed. The gate insulating film 72 is laminated to cover the gate portion 203, the electrode 212, and the gate portion 223. On the gate insulating film 72, a semiconductor layer 204 is formed above the gate portion 203, and a semiconductor layer 224 is formed above the gate portion 223. The gate film 72 is formed with a conductive film 273 connected to the drain portion 2〇2 of the semiconductor layer 2〇4, and a conductive film 274 connected to the source portion 201 and the drain portion 222 of the semiconductor layer 224; The conductive film 275 is connected to the source portion 221 . The region of the electrode electrode 274 of the electrode 21 320535 200919400 210 that is attached to the electrode 212 constitutes a capacitor 211. An insulating film 76 is laminated to cover the conductive films 273, 274, and 275. The black matrix 225 is formed on the protective insulating film 76 in such a manner as to cover the semiconductor layer of the switching element 22A in a planar manner. A color filter 250 opposed to Ding Yang (9) is formed on the color filter substrate CF disposed opposite to the protective insulating film 76. The color filter 250 is formed in a region overlapping the TFT 200 in a plan view. The incident light incident on the second photodetecting circuit LS2 is dimmed by the color filter 25A to the first light detecting circuit (3) to be 1/n (n > 1). The second photodetecting circuit LS2 is formed in the second photodetecting circuit LS2. Since it is on the same substrate as the display area DA, it can be shared with the part of the process of the array substrate AR. For example, the gate insulating film 72 of the second photodetecting circuit LS2 and the gate insulating film 1018 of the array substrate AR, the protective insulating film 76 of the second photodetecting circuit Ls2, and the protective insulating film 1〇2 of the array substrate 11 are The conductive films 273, 274, and 275 of the second photodetecting circuit LS2 and the array electrode are: the electrode S, and the electrode d, and the semiconductor layers 204 and 224 of the second photodetecting circuit LS2 and the semiconductor layer of the array substrate AR 1019 and so on. The light amount detecting device 显示 of the display device 1 of the present embodiment has a function of correcting the sensitivity of the photosensor which is reduced by photodegradation. The principle of sensitivity correction of the photo sensor will be described below. First, light is applied to the first and second photodetecting sections 10a and 10b which have charged the capacitors 110 and 21 to a predetermined potential. As a result, leakage current is generated in the TFTs 100 and 200, so that the potentials of the capacitors 11A and 21〇 are lowered with time by 320535 22 200919400 此时, and the capacitor 11 is output from the first photodetecting unit 10a.

Si二:電位作為第1輸出訊號仏,從第2光檢測部 Sb = 盗210之電極211的電位作為第2輸出訊號 部1〇 :先t測器讀取部2〇中,係從第卜第2光檢測 所輪出之電位的訊號,讀取相當於光電流之資 ▲ ’於進>iTk正處理後,作為光量訊號而輸出。 、因此’於以下的說明中,雖係說明依據光電流之運算 ,f d中所使用之光電流,可與光感測器讀取部20 的碩取值進行置換。 關於光感測器的感度校正,首先運算出光 數=,此光劣化校正係數κ係屬於經測定(劣化後)之/ 光檢測電路LS1的第!光電流及第2光檢測電路m的第 ^電流之間的比例之測定比例、與屬於初期狀態的測定 =之初期詞之間的比例。接著根祕由運算所算出之 出劣化後之第2光檢測電路ls2的 t 與初期狀態之第2光檢測電路⑽的第2光電 >巩之間的比例之光劣化率D。然後從光劣化率d,輸出初 期狀態之第2光檢測電路LS2的第2 #雷、* 光的光量訊號S。 第2先電流,以作為入射 在此說明光劣化校正係數κ的運算方法。第7圖 :光電流Γ相對於入射光量乙之函數之圖式。於第7圖中‘、、, 表不出第1光檢測電路⑶的第Ϊ光電流相料入射光量 = 3,)、及第2光檢測電路LS2的第2光電流相對 、 里L之函數Ib(L) ’從這些函數,可求取屬於劣 320535 23 200919400 化前(初期狀態)之第1光電流Ia(L)與第2光電流Ib(L)之 間的比例之初期比例。 光電流係與入射光量成比例而增加,若將第1光檢測 電路LS1的初期感度設為XaO,將第.2光檢測電路LS2的 初期感度設為XbO,則第1光檢測電路LS1的第1光電流 Ia(L)以及第2光檢測電路LS2的第2光電流Ib(L)係表示 如下。Si 2: the potential is the first output signal 仏, and the potential of the electrode 211 from the second light detecting unit Sb = thief 210 is used as the second output signal unit 1 : first t detector reading unit 2 , The signal of the potential that is rotated by the second light detection is read as the light amount signal ▲ 'Yujin> iTk is processed and output as a light amount signal. Therefore, in the following description, it is explained that the photocurrent used in f d can be replaced with the master value of the photosensor reading unit 20 in accordance with the calculation of the photocurrent. Regarding the sensitivity correction of the photosensor, first, the number of light==, and the photo-degradation correction coefficient κ belongs to the measured/degraded/photodetection circuit LS1! The ratio between the ratio of the ratio between the photocurrent and the second current of the second photodetecting circuit m and the initial word of the measurement = the initial state. Then, the photo-deterioration rate D of the ratio between the t of the second photodetecting circuit ls2 after the deterioration and the second photo-electricity of the second photodetecting circuit (10) in the initial state is calculated by the calculation. Then, from the photo-deterioration rate d, the second light-receiving signal S of the second #Ray, * light of the second photodetecting circuit LS2 in the initial state is output. The second pre-current is used as the calculation method for explaining the photo-degradation correction coefficient κ. Figure 7: A diagram of the photocurrent Γ as a function of the amount of incident light B. In Fig. 7, ',,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Ib(L) ' From these functions, the initial ratio of the ratio between the first photocurrent Ia(L) and the second photocurrent Ib(L) which are inferior to 320535 23 200919400 (initial state) can be obtained. The photocurrent system increases in proportion to the amount of incident light. When the initial sensitivity of the first photodetecting circuit LS1 is XaO and the initial sensitivity of the second photodetecting circuit LS2 is XbO, the first photodetecting circuit LS1 The photocurrent Ia (L) and the second photocurrent Ib (L) of the second photodetecting circuit LS2 are as follows.

Ia(L)=XaO . L Ib(L)=XbO · L 因此,當入射某光量L0作為入射光時,第2光檢測 電路LS2之減光入射光的光量成為LO/n,因此,光量L0 之第1光檢測電路LSI的第1光電流Ia(LO)以及第2光檢 測電路LS2的第2光電流Ib(L0/n)係表示如下。Ia(L)=XaO . L Ib(L)=XbO · L Therefore, when a certain amount of light L0 is incident as incident light, the amount of light of the dimming incident light of the second photodetecting circuit LS2 becomes LO/n, and therefore, the amount of light L0 The first photocurrent Ia (LO) of the first photodetecting circuit LSI and the second photocurrent Ib (L0/n) of the second photodetecting circuit LS2 are as follows.

Ia(LO)=XaO . L0 Ib(LO/n)=XbO · (LO/n) 藉此,初期比例係成為Ia(LO)/ Ib(L0/n)=n · (XaO/ Xb〇)。此初期比例不會受到入射光量L0的影響,而成為 初期感度XaO、XbO及η之函數,因此,可將任意的入射 光量L之測定比例設定為初期比例。 接下來運算劣化時的測定比例。第8圖係顯示劣化後 之光電流I相對於入射光量L之函數之圖式。於第8圖中, 表示初期狀態之第1光電流的函數Ia(L)、初期狀態之第2 光電流的函數Ib(L)、劣化後之第1光檢測電路LSI的第1 光電流的函數Iaa(L)、及劣化後之第2光檢測電路LS2的 24 320535 200919400 —光電机的函數ibb(L)。第8圖係用以求取劣化後之測 /θ '光感測器係由於光曝露導致劣化而使光感度降低,使 得光電f1層相對初期狀態逐漸降低。如此之光感度的降 低二可藉由屬於從初期狀態所照射之光量的累計值之累積 光里Ρ的函數R(p)(<1)來求取。若將經過某時間後之第工 光檢測電路LS1的累積光量設為P,則第2光檢測電路LS2 的累積光量為p/n。因此,若將受到累積光量p的光曝露 後之第1光檢測電路Ls丨的感度設為如,將受到累積光 置P/n的光曝露後之第2光檢測電4 LS2的感度設為 Xbl,則可表示如下。Ia(LO)=XaO . L0 Ib(LO/n)=XbO · (LO/n) Therefore, the initial ratio is Ia(LO)/ Ib(L0/n)=n · (XaO/Xb〇). Since the initial ratio is not affected by the incident light amount L0 and becomes a function of the initial sensitivity XaO, XbO, and η, the measurement ratio of the arbitrary incident light amount L can be set to the initial ratio. Next, the measurement ratio at the time of deterioration is calculated. Fig. 8 is a view showing a function of the photocurrent I after deterioration as a function of the amount L of incident light. In the eighth diagram, the function Ia (L) of the first photocurrent in the initial state, the function Ib (L) of the second photocurrent in the initial state, and the first photocurrent of the first photodetecting circuit LSI after the deterioration are shown. Function Iaa(L), and 24 320535 200919400 of the second light detecting circuit LS2 after deterioration - a function ibb(L) of the optical motor. Fig. 8 is a graph for determining the deterioration/photometry of the light sensor due to deterioration due to light exposure, so that the photovoltaic f1 layer gradually decreases relative to the initial state. Such a decrease in the light sensitivity can be obtained by a function R(p) (<1) which is a cumulative light 属于 which is an integrated value of the amount of light irradiated from the initial state. When the accumulated light amount of the work light detecting circuit LS1 after a certain period of time has been set to P, the cumulative light amount of the second light detecting circuit LS2 is p/n. Therefore, the sensitivity of the first photodetecting circuit Ls丨 after exposing the light having the accumulated light amount p is such that the sensitivity of the second photodetecting electric 4 LS2 after exposure of the light of the accumulated light P/n is set to Xbl can be expressed as follows.

Xal= R(p) . Xa〇 Xbl= R(p/n) · Xb〇 猎此,劣化後之第1光檢測電路LS1的第2光電流的 函數Iaa(L) ’及劣化後之第2光檢測電路ls2的第2光電 流的函數Ibb(L)係表示如下。Xal= R(p) . Xa〇Xbl= R(p/n) · Xb〇, the function Iaa(L)′ of the second photocurrent of the first photodetecting circuit LS1 after degradation and the second after the deterioration The function Ibb(L) of the second photocurrent of the photodetecting circuit ls2 is as follows.

Iaa(L)=Xal · L= R(p) . χα〇 . L Ibb(L)=Xbl · L= R(p/n) · Xb〇 . L 由於不具有it色器25〇等減光手段,因此第、光檢測 ,路LSI之累積光1係比第2光檢測電路LS2之累積光量 ,多。所卩’屬於第1光感測器之TFT1〇〇的劣化較快速, 第1光電流Iaa(L)的減少幅度較大。 因此,當入射某光量11作為入射光時,第2光檢測 電路LS2之減光人射光的光量成為u/n,因此,光量u 320535 25 200919400 之第1光檢測電路LSI的第1光電流Iaa(Ll)以及第2光檢 測電路LS2的第2光電流Ibb(Ll/n)係表示如下。 Iaa(Ll)=Xal · Ll= R(p) · XaO · LI Ibb(Ll/n)=Xbl · (Ll/n)= R(p/n) · XbO · (Ll/n) 藉此,測定比例係成為Iaa(Ll)/ Ibb(Ll/n)= n · (R(p)/ R(p/n)) . (XaO/ XbO)。此測定比例不會受到入射光量LI的 影響,不論以任意的入射光量L來求取,均可獲得同一測 定比例。 從如此求取之初期比例與劣化後之測定比例,導出光 劣化校正係數 K=(Iaa(Ll)/ Ibb(Ll/n))/(Ia(L0)/ Ib(L0/n))= R(p)/ R(p/n),作為累積光量p的函數。 藉由此光劣化校正係數K,可得知TFT100、200之劣 化的行進度。 接下來說明光劣化率D。光劣化率D係於入射某光量 Ll/n作為減光入射光時所測定之Ibb(Ll/n)、與初期狀態的 第2光電流Ib(Ll/n)之間的比例,表示為D= Ibb(Ll/n)/ Ib(Ll/n)=R(p/n)。此值不受到入射光量的影響,而是由劣 化狀態所決定之值。 此光劣化率D係與上述光劣化校正係數K相對應,藉 由預先求取該對應關係,可從光劣化校正係數K求取光劣 化率D。並且可從如此求取之光劣化率D與測定出之第2 光電流Ibb(Ll/n),以Ib(Ll/n)= Ibb(Ll/n)/D來算出初期狀 態的第2光電流Ib(Ll/n)。 藉由以上各步驟,可將劣化後之第2光電流Ibb(Ll/n) 26 320535 200919400 •校正為初期狀態的第2光電流ib(u/n)並予以輪出 接著說明於本發明之顯示裝置觸的光。 中進行此光電流的校正時之動作。 欢測4置 #且:9:係顯不光電流的校正之流程圖。於第9圖中, 劣化係數運算部21 t運算出敎比例之 ,心憶體電路23讀取初期比例 ^ :=期广間的比例之光劣化校正係; H 體電.路23’讀取對應於所求 數K之光劣化率D之步驟S3 ;從所讀取之光;=係 運笞出弁4;'仆丨 光劣化率D’ 運开出先名化别的光電流之步驟S4;及將經由運算所導出 之光電流作為入射光的光量訊號3並予以輸出之步 V /先’於步驟S1中,將電容器11〇、21〇充電至電位 P為將光量L1的入射光及光量u/n的減光入射光, 刀別入射於TTT100及TFT2〇〇,於TFT1〇〇及⑼中 產生光電流(漏電流h如此’導致電容器110、210的電位 ,低。第1、第2光“部1〇a、l〇b係分別輸出此時之電 容器110、210的電位,以作為第1輸出訊號Sa、第2輸 出訊號Sb 〇 於劣化係數運算部21中,係將從第丨、第2光檢測部 1〇&、1〇b所輪出之第1輸出訊號Sa、及第2輪出訊號Sb 的電位訊號予以讀取,並轉換為Tm⑼、細的光電流。 充電於電谷器、110、210之電位係與TFT100、200之源極 人^極之間的電位差相等。由於入射光的光量愈大光電流 愈夕,所以電容器110、21 〇的電位降低程度會變大。相對 27 320535 200919400 於此,由於入射光的光量愈小光電流愈少,所以電容器 no、21〇的電位降低程度會變小。因此,藉由取得從入射 光的照射開始經過特定期間後的電位訊號,可轉換為光電 流的訊號。亦即,屬於電位訊號之電容器110、210的電位 愈低,光電流愈大,容器110、210的電位愈高,則光電流 愈小。 巩 於劣化係數運异部21中,係使電位訊號與光電流相對Iaa(L)=Xal · L= R(p) . χα〇. L Ibb(L)=Xbl · L= R(p/n) · Xb〇. L Since there is no light-reducing means such as iterometer 25〇 Therefore, the cumulative light 1 of the first light detection and the path LSI is larger than the cumulative light amount of the second light detecting circuit LS2. The deterioration of the TFT1 属于 belonging to the first photo sensor is relatively fast, and the decrease in the first photocurrent Iaa (L) is large. Therefore, when a certain amount of light 11 is incident as incident light, the amount of light of the dimming person of the second photodetecting circuit LS2 is u/n, and therefore, the first photocurrent Iaa of the first photodetecting circuit LSI of the amount of light u 320535 25 200919400 (L1) and the second photocurrent Ibb (L1/n) of the second photodetecting circuit LS2 are as follows. Iaa(Ll)=Xal · Ll= R(p) · XaO · LI Ibb(Ll/n)=Xbl · (Ll/n)= R(p/n) · XbO · (Ll/n) The ratio is Iaa(Ll) / Ibb(Ll/n) = n · (R(p) / R(p/n)) . (XaO/ XbO). This measurement ratio is not affected by the incident light amount L1, and the same measurement ratio can be obtained regardless of the arbitrary incident light amount L. From the initial ratio thus obtained and the measured ratio after deterioration, the photo-degradation correction coefficient K=(Iaa(Ll)/ Ibb(Ll/n))/(Ia(L0)/ Ib(L0/n))=R is derived. (p) / R(p/n) as a function of the cumulative amount of light p. By this light deterioration correction coefficient K, the deterioration progress of the TFTs 100, 200 can be known. Next, the light deterioration rate D will be described. The photo-deterioration rate D is expressed as D between the Ibb (Ll/n) measured when the incident light is incident as the dimming incident light, and the second photocurrent Ib (Ll/n) in the initial state. = Ibb(Ll/n)/ Ib(Ll/n)=R(p/n). This value is not affected by the amount of incident light, but by the value determined by the deterioration state. The photo-degradation rate D corresponds to the photo-degradation correction coefficient K, and the light-degradation rate D can be obtained from the photo-degradation correction coefficient K by obtaining the correspondence relationship in advance. Further, from the photodegradation rate D thus obtained and the measured second photocurrent Ibb(Ll/n), the second light in the initial state can be calculated by Ib(Ll/n) = Ibb(Ll/n)/D. Current Ib (Ll/n). By the above steps, the second photocurrent Ibb(Ll/n) 26 320535 200919400 after deterioration can be corrected to the second photocurrent ib(u/n) in the initial state and rotated, and then described in the present invention. The light touched by the display device. The action when this photocurrent is corrected. Feel 4 sets #且:9: The flow chart of the correction of the visible current. In the ninth figure, the deterioration coefficient calculation unit 21 t calculates the 敎 ratio, and the memory system 23 reads the optical deterioration correction system of the ratio of the initial ratio ^ : = period; H body electric path 23' read Step S3 corresponding to the photo-deterioration rate D of the number K; from the read light; = system output 弁 4; 'servo photo-deterioration rate D', the step S4 of pre-named photocurrent is carried out And the photocurrent derived by the calculation is used as the light amount signal 3 of the incident light and is outputted as V/first. In step S1, the capacitors 11A and 21〇 are charged to the potential P to be the incident light of the light amount L1 and The dimming incident light of the amount of light u/n is incident on the TTT100 and the TFT2, and a photocurrent is generated in the TFTs 1 and (9) (the leakage current h is such that the potential of the capacitors 110 and 210 is low. The two light "portions 1"a and l〇b output the potentials of the capacitors 110 and 210 at this time, respectively, as the first output signal Sa and the second output signal Sb in the deterioration coefficient calculation unit 21. The potential signals of the first output signal Sa and the second round output signal Sb rotated by the second light detecting unit 1〇&, 1〇b are read, And converted to Tm (9), fine photocurrent. The potential difference between the potential system charged in the electric grid, 110, 210 and the source of the TFT 100, 200 is equal. Since the amount of incident light is larger, the photocurrent is more and more, Therefore, the potential reduction of the capacitors 110 and 21 会 becomes large. Relatively 27 320535 200919400, since the amount of incident light is smaller, the photocurrent is less, so that the potential reduction of the capacitors no and 21 会 becomes smaller. The potential signal after a certain period of time elapses from the irradiation of the incident light can be converted into a photocurrent signal. That is, the lower the potential of the capacitors 110 and 210 belonging to the potential signal, the larger the photocurrent, and the containers 110 and 210 The higher the potential, the smaller the photocurrent. In the deterioration coefficient of the difference portion 21, the potential signal is opposite to the photocurrent.

應,而從電位訊號,取得第1光電流Iaa(Ll)及第2光電流 Ibb(Ll/n)之訊號。 L 從如此取得之第1光電流laa(Ll)及第2光電流 b(L1/n)運异出測定比例(Iaa(Ll)/ Ibb(Ll/n))。 之後進行步驟S2,將預先記憶於記憶體電路23之初 ,比例(Ia(L〇)/Ib(L〇/n))讀取至劣化係數運算部21,並運 开出光劣化校正係數 K(=(Iaa(L1)Mbb(L1 /The signal of the first photocurrent Iaa (L1) and the second photocurrent Ibb (Ll/n) is obtained from the potential signal. L The measurement ratio (Iaa(Ll) / Ibb(Ll/n)) is measured from the first photocurrent laa (L1) and the second photocurrent b (L1/n) thus obtained. Then, in step S2, the ratio (Ia(L〇)/Ib(L〇/n)) is read to the deterioration coefficient calculation unit 21 at the beginning of the memory circuit 23, and the light degradation correction coefficient K is transmitted. =(Iaa(L1)Mbb(L1 /

Ib(L〇/n)) °Ib(L〇/n)) °

At、此吟、於§己憶體電路23中,亦可預先記憶上述初期狀 二的第1光电流Ia(L0)及初期狀態的第2光電流ib(L0/n) 來取代初期比例,並於步驟S2中運算勒期比例。 之後進行步驟S3 ’於步驟S3中,於步驟S2中所運算 ,、 '劣校正係數K係輸出至光劣化率運算部22。於光 ”匕率運开邛22中,係參考記憶於記憶體電路23之查詢 表’而取得對應於從劣㈣數運算部21所輸㈣光劣純 正係數Κ之光劣化率D。 在此說明查詢表。第10圖係顯示關於本發明之顯示裝 320535 28 200919400 置1000的光量檢測裝置1之描繪出光劣化校正係數K與 光劣化率D之測定資料之圖式。於第圖中,横轴表^ 光劣化校正係數Κ,縱轴表示光劣化率d。若劣化持巧\' 行,則光劣化校正係數Κ與光劣化率D會降低。而且π光 劣化率D的降低幅度係隨著光劣化校正係數κ的降低而增 大0 然而,當光劣化校正係數Κ降低至大約0·6以下,則 光劣化率D顯現出一定之值。此係表示若劣化進行至某種 私度,則第2光電流ibb不再產生變化。 ' 、第10圖所示之函數曲線500係為以依據測定資料之光 劣化校正係數K為變數之光劣化率〇的函數。若可將實現 此函數之電路構成於光劣化率運算部22内,則可運算出對 應於某光劣化校正係數K之光劣化率D。然而,若以電 路構成來實現此不規則的函數,則此電路構成會變得複 因此’於本實_態中’係製作出使依據函數曲線500 ^先劣化校正係數尺與光劣化率D相對應之查詢表,並記 憶於記憶體電路23。 跋藉此不而具有光劣化率D的運算所需之複雜的電 路,因此可縮小電路規模。 當縮小記憶於記情轉费。。‘ ,隐體電路23之查詢表的資料量時,例 將光劣化校正係數Κ之值記憶於劃分為^度之 =句表^外,當光劣化校正係數κ的值不包含於查詢表 二::由:用相鄰的資料來進行内插計算,即使不包含 、-询表,亦可從光劣化校正係數κ導出光劣化率d。 320535 29 200919400 例如,可從第1〇圖的函數曲〇〇, ==r係數κ的值之2個光劣化校=== 音、’…i、線連結廷些點,藉此規定出對應於不包含於 —口 、之光劣化校正係數κ之光劣化 ^ 光劣化校正係赵π 體而5 ’當 正係數Κ為:2及。4值之為::時广由對應於光劣_ 劣化率D。·2及U之光劣化率D的平均值,來導出光 D,對…^ 劣化率運算部22所傳送來之光劣化率 管而^ 第二光電流⑽即⑻進行校正’並藉由運 疒二出初期狀態的第2光電轉1/n)。之 1量=:期狀態的第2光電流一 根據具有如此構成之光量檢測裝置〗之 獲得以下的效果。 τι 了 中,由於成為—種具有感度校正功能之光量檢測裝置,其 b碜度杈正功能係從光劣化校正係數κ及光劣化率乃 的第t的第2光電流脱⑹進行校正,以求取初期狀態 光電流Ib(L),因此,即使產生因光曝露所造成的劣 化,亦可輸出正確的光量訊號S。 此外於第1、第2光檢測部i〇a、10b,並未採用使 動二匕:陡提升之光電轉換元件,所以可與顯示裝置的驅 丄:曰《製程達到共通化。因此能夠以簡便的步驟 出光感測器,而降低成本。 320535 30 200919400 藉由將查詢表記憶於記憶體電路23,而不需具有用於 光劣化率D的運算之複雜的電路構成,因此可抑制消耗電 力並減少電路面積,並可抑制製造成本。 當運算出之光劣化校正係數κ不包含於查詢表時,可 利用對應於包夾此光劣化校正係數個光劣化校正係 數K之光劣化率D,來進行内插計算,藉此導出光劣化率 D。藉此可縮小查詢表並抑制資料量。 於本實施型態中,係經由運算來算出第2光檢測電路 ⑽:嫩態的第2光電流Ib(L)以作為光量訊號8,但 亦可鼻出弟1光檢測雷T Q -I ^ u …… 之初期狀態的第1光電流 略)來作為光量訊號s。此時,只要於記憶體電路μ中, 记憶使光劣化校正係數尺、與屬於第i光檢測電路⑶之 IT:第1光電流Μ)及初期狀態的第1光電卿 “、t例之光劣化率Da相對應之查詢表即可此, 杈正為初期狀態的第1光電流Ia。. 可型態的光量檢測裝置1之入射光量L的測定, 預定㈣連續地進行。於進行下―:欠 3 =二施加,_子19(),可使咖〇〇、2〇〇成 對電工11()'21()的€位進行放電。之後再 電位%的充電並進行敎。 測裝置1係連接於 量檢測裝置i所敎之外智略之並將光 光。於非古由., °卩衣3兄光的光量訊號輸出至背 、月’’、艮據來自光量檢測震置1的光量訊號來 320535 31 200919400 »周正發光里。具體而言,如白天的自然光般之環 明亮時’背光的發光量係設定為較大。另一方 ㈣ 使用般之較暗的環境下使用時,背光的發光量係雙定= =猎此’可在因應使㈣境之適#的發光量下進行影像乂 在此係說明液晶顯示裝置,但亦可將顯示區域適用於 下列顯不裝置,、亦即為有機電激發光(EL)顯示裝置、將於 = :塗佈有不同色彩之扭轉球作為電性光學物 =粉顯示器、將氨氣或氛氣等高壓氣 光吏 物質使用之電漿顯示器等顯示裝置。尤予 於光實t型態中,係說明將滤色器咖作為對入射 感測益之光進行減光的減光手段而設置在第2光檢測 部肌之構成的例子,但減光手段的構成並不限定於此。、. ::Γ光手段(第1減光手段、第2減光手段)的其 (減光手段的構成例1) 下係依循第11圖所示的電路構成圖,來說明減光手 又的構成例卜與前述第工實施型態為相同構成者,係附 加相同圖號並省略說明,並說明不同構成者。 TSW如第11圖所示,第1光檢測部他的第!光檢測電路 糸具備包含作為弟i光感測器之薄膜電晶體师乂下 間%為「TFT1〇〇」)之種種元件(省略說明)。 於™的入光侧,設置有作為第!減光手段之遽 320535 32 200919400 色器530。以俯視觀看時,濾色器53〇係形成於盥⑽ 重疊之區域。入射於遽色器530之光係藉由遽色器53〇所 使用之色材而減光。藉此,經由濾色器53〇進行減光後之 光係入射至TFT100。TFT100係檢測出該減光後的光。 第2光檢測部l〇b的第2光檢測電路乙幻係具備包含 作為第2光感測器之薄膜電晶體2〇〇(以下簡稱為「tft2〇〇」) =種種元件(劣略說明)。於TFT2〇〇的入光側,設置有作為 弟2減光手段之濾、色器55〇。以俯視觀看時,滤色器別 係开Γ成於與TFT200重疊之區域。入射於濾色器550之光 ,错由遽色器550所使用之色材而減光。藉此,經由遽色 益50進行減光後之光係入射至订丁2〇〇。丁打2〇〇係檢測出 該減光後的光。 。。此,色益550係以其入射光的降低率(減光率)比遽色 益530還大之方式形成。為了提高入射光的減光率,可藉 由將渡色器55G的厚度形成為比濾色H 53G的厚度還厚, 或是將濾、色器55〇所使用之色材的濃度形成為比遽色器 L所使用之色材的濃度還濃等而實現。如此,藉由使遽 色盗55G之入射光的減光率比滤色器別的減光率還高, 可適用前述第1實施型態中所說明之感度校正功能。 匕外關於濾、色益530及濾色器550,較理想係將所 用的色材設定為相同種類等,使相對分光穿透率成為相 寺〇 此藉由使作為2個減光手段之濾、色器530、550 、1刀光牙透率成為相等,藉此,可抑制因人射光的差 33 320535 200919400 所導致之TFTl 〇〇、200之Φ® 丄么 ⑽之光娑化量的波動。此係由於,光 劣化量係由將TFT1GG、之人射光的分光特性鱼 TFTHK)、,的分光感度相算所得之值而決定,藉由使用 相對分光穿透率為相等之減光手段,可抑制因人射光的差 所導致之光劣化量的波動之故。因此可提供—種能夠進行 穩定的校正之顯示裝置。 為了使相對分光穿透率成為相等,如後述之減光手段 的其他構成例,亦可使用遮光構件作為減光手段。 藉此,可減低入射至作為第!光感測器之tfti〇〇及 作為第2光感測器之TFT2〇〇的光量,因此,可分別延緩 各個則⑻、·的光劣化速度。所以可延長到因各個 TFTH20G之光劣化的進展面使第1輸出訊號與第# 出訊號之間的比例不再改變所導致之無法充分進行校正 止之時間。 、第12圖係顯不’於使經由兩者的光感測器予以減光後 之光入射之情況與僅使經由其中之一的光感測器予以減光 後之光入射之情況下,» 1輸出訊號與第2輸出訊號之間 的測定比例之變遷。如第12圖所示,於降低入射至TFT〗㈨ 及TFT200之光量時(虛線2),1〇xl〇6(Lx . h)之後的比例不 再改變。此外,於僅降低入射至其中的TFT2〇〇之光量時(虛 線1),2xl〇6(Lx. h)之後的比例不再改變。亦即,於降低 入射至TFTiOO及TFT200兩者之光量時,相較於僅降低入 =至其中的TFT200之光量時,係具有大致5倍之校正壽 命。因此,根據本構成,可提供一種能夠延長校正壽命之 320535 34 200919400 顯示裝置。 (減光手段的構成例2) 以下係依循第13圖所示的電路構成圖,來說明減光手 段的構成例2。與前述第1實施型態為相同構成者,係附 加相同符號並省略說明,並說明不同 l如且第13圖人所示,尸光檢測部光檢測電路 …糸』包3作為弟1光感測器之薄膜電晶體100(以下 間稱為「TFT100」)之種種元件(省略說明)。 於TFT100的入光侧並未設置減光手段,TFT〗⑽係檢 測出未經減光的光。 第2光檢測部勘的第:光檢測電路⑽係具備包含 作為第2光感測器之薄膜電晶體2〇〇(以下簡稱為「啊細」) 之種種元件(省略說明)。於TFT的人光側,設置有作為 遮光構件之黑色矩陣_。以俯視觀看時,此黑色矩陣660 係形成於與TFT200重疊之區域。於本構成例中,作為遮 ,構件之黑色矩陣660係構成減光手段。黑色矩陣66〇係 藉由與圖中未顯示的濾色器為同層之黑色樹脂等遮光構件 所形成。於此黑色矩陣660上,形成有開口部67〇。 朝向TFT200之光係藉由黑色矩陣66〇所遮光,並且 僅從開口部670通過。因此可使通過的光量減少。亦即, 具有開口部670之黑色矩陣660係作為減光手段而使用。 藉此,因通過黑色矩陣660而減光之光係入射至TFT2〇〇。 TFT200並檢測出該經減光後的光。 根據本構成例2,可將作為遮光構件之黑色矩陣 320535 35 200919400 的製程、與一般顯示裝置中所 共通化,因此可在簡便的步驟;陣之製程達到 果之外,更可降低製造成本。 有弟卜'實施型態的效 (減光手段的構成例3) 乂下係依循第14圖所示的電路構成圖,來說明減光 段的構成例3。與前述策1實施型態為相同構成者:係附 加相同符號並省略朗,並朗不同之構成。 二1所示,第1光檢測部心的第1光檢測電路 H ㈠作為第1光感測器之薄膜電晶體100(以下 間:…TFT1〇〇J )之種種元件(省略說明)。於TFT100的 作為第1減光手段之遽色器-。。以俯視 ^ Q色為730係形成於與TFT1〇〇重疊之區域。藉 在,經由遽色器730進行減光後之光係入 丁打⑽係檢測出該經減光後的光。 ,第2光檢測部1〇b的第2光檢測電路ls2係具備包含 二第光感測盗之薄膜電晶體200(以下簡稱為r TFT200」) 、之種種兀件(省略說明)。於TFT200的入光側,設置有作為 減光構件之濾色器750、及設置於濾色器750的光入射側 且作為遮光構件之黑色矩陣76〇,而作為第2減光手段。 、俯視觀看4,濾色器75〇及黑色矩陣760係形成於與 丁FT200 會晶r- >> 宜之區域。黑色矩陣660係藉由黑色樹脂等遮光 7成於;慮色态75〇的基板上。於此黑色矩陣760形成 有開口部770。 36 320535 200919400 • 朝向TFT200之光係因首先通過形成於黑色矩陣76〇 之開口部77G而暫時被減光’接著通過濾色器75q而再次 被減光。如此’ TFT2GG係檢測出經由重疊設置有遮光構件 及減光構件之第2減光手段而減光之光。 藉此,可減低入射至作為第丨光感測器之tfti㈧及 作為第2光感測器之TFT2〇〇的光量,因此,可 各個™〇、200的光劣化速度。所以可延長到因各個 TFT100、200之光劣化的進行而使第」輸出訊號與第2轸 出訊號之間的比例不再改變所導致之無法充分進行校正^ 止之時間。 ' 料,可將作為減光手段所使用之減光構件及遮光構 件的衣私、與-般顯示裝置之製程達到共通化,因此 簡便的步驟下製造出減光手段。+ 在 ::減光,段之減光構件及遮光構件的配置並不限定 ' 轭型滤或構成例,亦可為其他組合。 不二卜μ在此係說明使用遽色器以作為減光手段,,並 不限疋於此,亦可❹偏光板或相 : .減光構件,亦具有同等效果。板寺了進仃減先之 (變形例) 電^ = 中,係將屬於第1光檢測電路⑶之 電谷110的電極U1的電位 第2光檢測電路LS2之電容弟:出^虎〜、及屬於 2鈐屮却节u 電令™ 210的電極211的電位之第 輸出訊唬sb,於劣化係數運算部2 第 光電流。然而,於本每浐_ 从 靖取轉換為 本"知型態的變形例中,係將第】輪出 320535 37 200919400 訊號Sa.及第2輸出訊號Sb予以讀取轉換為電容器11〇的 電極hi的電位及電容器210的電極211的電位從。Vs降低 至預定電位Vc所需之時間,並對感度進行校正。 在此,說明本實施形態之變形例的補正方法。 第15圖係顯示當入射光量L1的入射光入射於第丨光 檢測電路LSI,入射光量L1/n的減光入射光入射於第:光 檢測電路LS2時,充電至電容器11〇、21〇之電位的時間 變化之圖式。於第15圖中,縱軸表示電容器的電位,橫抽 表示從測定開始之經過時間。於第i 5圖巾,函數曲線W 係表示初期狀態之第i光檢測電路⑶之電容器ιι〇的電 極111之電位的時間變化,函數曲線V係 狀 之第2光檢測電路LS2之電容器训的電極211之=二 時間變化,函數曲線Vaa⑴係表示於劣化後 ::的電極ln之電位的時間變化,函 :: =劣、後所測定之電容器210的電極…電: 2 k些曲線表示出電位隨著時間的經過 之情形是因為,若作f又降低 101盥、弟先感測器之TFT1〇〇的源極部 之二:二之間'電位差'以及作為第2先感測器 TFT200的源極部加與汲極部皿之間的電 則流通至TFT100、2〇〇之弁#差夂小, 費較多時間之故。 先電…小,使電位降低需花 檢測Ϊ:: Γ之電:容降二::1係表示_狀態之第1光 -τ間tbl係表不初期狀態之第 320535 38 200919400 2光才欢測電路L S 2之電交哭9 1 n aa 位%為止所需之時Η : 降低至預定電 播路、t所而之%間,電位降低時間taal係表示於劣化 止所110的電位Vaa降低至預定電位vc為 之電容哭2^位降低時間1 b b 1係表示於劣化後所測定 時^ °210的電位鳩降低至預定電位Vc為止所需之 ^光檢測電路LS1之人射光的光量係比具有減光手 又之第2光檢測電路LS2之減光入射光的光量還大,因 此’ Tm 00的漏電流係比TFT的漏電流還大。此外, ',月狀先'下的感度,係比因光曝露户、^ ^ 因此’初期狀態下的漏電流較大。因此,初期狀:匕 光k測電路LS1的電位降低時間為最短。 少此外,TFT100的累積光量係比TFT2〇〇之累積光量還 多’所以劣化速度較,决。因此,關於劣化後相對於初期狀 態之電位降低時間的變化幅度,f 1光檢測電路⑶為較 大。 长電容器的電位與電位降低時間之間的關係,係與光電 流與入射光量間的關係相同,因此可預先測定出對預定的 入射光量L0之初期狀態的電位降低時間ta〇、tb〇,並求取 初期比例taO/tbO。 之後從測定出之電位降低時間taal及電位降低時間 tbbl ’藉由運算來算出測定比例(Ual/tbbl)。 然後,作為測定比例(taal/tbbl)與初期比例(ta0/tb〇) 之間的比例之本實施型態的變形例之光劣化校正係數 320535 39 200919400In the case of the 己 体 体 电路 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , And the operation ratio is calculated in step S2. Thereafter, the step S3 is performed in step S3, and the error correction coefficient K is output to the photo-degradation rate calculation unit 22 in step S2. In the "light" operation port 22, the light deterioration rate D corresponding to the (four) light-inferior pure coefficient 输 is obtained by referring to the inquiry table stored in the memory circuit 23. Fig. 10 is a diagram showing the measurement data of the photo-degradation correction coefficient K and the photo-deterioration rate D of the light-quantity detecting device 1 of the display device 320535 28 200919400 of the present invention. The axis table ^ photo-degradation correction coefficient Κ, the vertical axis represents the photo-deterioration rate d. If the deterioration is good, the photo-degradation correction coefficient Κ and the photo-degradation rate D are lowered, and the π-light degradation rate D is decreased by The photo-degradation correction coefficient 显现 decreases to about 0.6 or less, and the photo-degradation rate D exhibits a certain value. This means that if the deterioration proceeds to a certain degree of privacy, The second photocurrent ibb is no longer changed. The function curve 500 shown in Fig. 10 is a function of the photo-deterioration rate 〇 based on the photo-deterioration correction coefficient K of the measurement data. The circuit of the function is constructed in the photo-deterioration rate operation In the portion 22, the photo-degradation rate D corresponding to a certain photo-degradation correction coefficient K can be calculated. However, if the irregular function is realized by the circuit configuration, the circuit configuration becomes complicated. In the state, a look-up table is provided which causes the correction coefficient ruler to correspond to the photo-deterioration rate D according to the function curve 500, and is stored in the memory circuit 23. Therefore, it is necessary to have the operation of the photo-deterioration rate D. The complicated circuit can reduce the circuit scale. When the memory is reduced in memory, the value of the photo-degradation correction coefficient 记忆 is stored in the figure. In addition to the sentence table ^, when the value of the photo-degradation correction coefficient κ is not included in the query table 2:: by: using the adjacent data for interpolation calculation, even if it does not contain, - the inquiry table, can also be corrected from photo-degradation The coefficient κ derives the photo-deterioration rate d. 320535 29 200919400 For example, the function of the first graph can be changed, the value of the ==r coefficient κ, the two light-degraded schools === sound, '...i, line-linking Some points, thereby specifying the corresponding light deterioration school that is not included in the mouth The light coefficient of κ is degraded by the positive coefficient κ. The photo-degradation correction system is π π body and 5 'when the positive coefficient Κ is: 2 and . 4 is:: the time is wide corresponding to the light _ degradation rate D. · 2 and U light The average value of the deterioration rate D is used to derive the light D, and the second photocurrent (10) is corrected by the photo-degradation rate tube transmitted by the deterioration rate calculation unit 22, and is corrected by the initial state. The second photo-electricity of the first photo-electricity is obtained by the light-quantity detecting device having the above-described configuration, and the following effects are obtained. In the light amount detecting device, the b-thoracic correction function is corrected from the photo-deterioration correction coefficient κ and the t-th photo-current-removal (6) of the photo-deterioration rate to obtain the initial-state photocurrent Ib(L). Even if the deterioration due to light exposure occurs, the correct light amount signal S can be output. Further, since the first and second photodetecting sections i〇a and 10b do not employ a photoelectric conversion element that performs a sharp rise, the display device can be used in conjunction with the display device. Therefore, the sensor can be emitted in a simple step, and the cost can be reduced. 320535 30 200919400 By storing the lookup table in the memory circuit 23, it is not necessary to have a complicated circuit configuration for the operation of the photo-deterioration rate D, so that power consumption can be suppressed and the circuit area can be reduced, and the manufacturing cost can be suppressed. When the calculated photo-degradation correction coefficient κ is not included in the look-up table, interpolation calculation can be performed using the photo-degradation rate D corresponding to the photo-degradation correction coefficient of the photo-degradation correction coefficient K, thereby deriving the photo-degradation Rate D. This narrows the lookup table and suppresses the amount of data. In the present embodiment, the second photodetecting circuit (10) is calculated by calculation: the second photocurrent Ib(L) in the tender state is used as the light amount signal 8, but it is also possible to detect the thunder TQ-I^ u ...... The first photocurrent in the initial state is omitted as the light amount signal s. In this case, as long as the memory circuit μ is stored, the photo-degradation correction coefficient scale, the IT: first photocurrent 属于 belonging to the ith photodetection circuit (3), and the first photo-clearing "in the initial state", t example The light-reduction rate Da corresponds to the look-up table, and the first photocurrent Ia in the initial state is determined. The measurement of the incident light amount L of the light-quantity detecting device 1 in the form is predetermined (four) continuously. ―: owe 3 = two application, _ child 19 (), can make the curry, 2 〇〇 pair electrician 11 () '21 () of the € position discharge. Then charge the potential % and carry out 测. The device 1 is connected to the outside of the quantity detecting device i, and the light is lighted. The light quantity signal of the non-ancient., °卩衣3 brother light is output to the back, the moon'', and the light is detected from the light amount. The light quantity signal of 1 comes to 320535 31 200919400 » The week is shining. Specifically, if the natural light of the day is bright, the amount of illumination of the backlight is set to be larger. The other side (4) is used in a dark environment. The amount of illuminance of the backlight is doubled == hunting this can be done in response to the illuminance of (4) The liquid crystal display device is described here, but the display area can also be applied to the following display devices, that is, an organic electroluminescence (EL) display device, which will be coated with a twisted ball of different colors. Electro-optical material=Powder display, display device such as plasma display using high-pressure gas-light substance such as ammonia gas or atmosphere. Especially in the t-state of light, it is explained that the color filter is used as the incident sensor. An example in which the light-reducing means of dimming light is provided in the second light detecting portion muscle, but the configuration of the dimming means is not limited to this. - :: Light-reducing means (first light-reducing means, The second light reduction means (the configuration example 1 of the light reduction means) follows the circuit configuration diagram shown in Fig. 11, and the configuration example of the light reduction hand is the same as the above-described first embodiment. The same reference numerals will be omitted, and the description will be omitted, and the different components will be described. As shown in Fig. 11, the first light detecting unit and the first light detecting circuit 糸 are provided with a thin film electric device including a light sensor. The components of the crystal master's underarm are "TFT1") Bright). On the light-in side of the TM, it is set as the first! After the dimming method 320535 32 200919400 Color 530. When viewed in a plan view, the color filter 53 is formed in a region where the 盥 (10) overlaps. The light incident on the color filter 530 is dimmed by the color material used by the color filter 53. Thereby, the light which is dimmed via the color filter 53 is incident on the TFT 100. The TFT 100 detects the dimmed light. The second photodetecting circuit of the second photodetecting unit 10b includes a thin film transistor 2 as a second photosensor (hereinafter referred to as "tft2〇〇") = various elements (defective description) ). On the light incident side of the TFT 2 ,, a filter 55 〇 which is a dimming means for the younger brother 2 is provided. When viewed in a plan view, the color filter is opened in an area overlapping the TFT 200. The light incident on the color filter 550 is dimmed by the color material used by the color picker 550. Thereby, the light that has been dimmed by the 遽 益 50 is incident on the order 2 。. The Ding 2 〇〇 system detects the light after the dimming. . . Therefore, the color benefit 550 is formed such that the rate of decrease (light reduction rate) of incident light is larger than that of the color yoke 530. In order to increase the dimming rate of the incident light, the thickness of the color filter 55G may be formed to be thicker than the thickness of the color filter H 53G, or the concentration of the color material used for the filter color filter 55 may be formed as a ratio. The concentration of the color material used in the color picker L is also concentrated. As described above, the sensitivity correction function described in the first embodiment can be applied by making the dimming rate of the incident light of the smear 55G higher than the dimming rate of the color filter. In addition to the filter, the color 530 and the color filter 550, it is preferable to set the color materials used to be the same type, etc., so that the relative spectral transmittance becomes the same as that of the two dimming means. The color opaques of the 530, 550, and 1 are equal, thereby suppressing fluctuations in the amount of l TFT 200 200 200 200 320 320 320 320 320 320 320 320 320 320 320 320 320 320 320 320 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 . In this case, the amount of photo-deterioration is determined by the value obtained by calculating the spectral sensitivity of the TFT1 GG and the spectroscopic characteristic fish TFTHK), and the dimming means having the same spectral transmittance is used. The fluctuation of the amount of photo-deterioration caused by the difference in human light is suppressed. Therefore, a display device capable of performing stable correction can be provided. In order to make the relative spectral transmittance equal, a light shielding member may be used as the light reducing means as another configuration example of the dimming means to be described later. By this, the incidence can be reduced to the first! Since the amount of light of the photosensor is tfti and the amount of light of the TFT2 of the second photosensor, the photodegradation speed of each of (8) and · can be delayed. Therefore, it is possible to extend the time until the ratio between the first output signal and the #th signal is no longer changed due to the progress of the light deterioration of each TFTH20G. In the case of Fig. 12, the case where the light which is dimmed by the photosensors of both is incident and the light which is dimmed only by the photosensor of one of them is incident, » The change in the ratio of the measurement between the 1 output signal and the 2nd output signal. As shown in Fig. 12, when the amount of light incident on the TFT (9) and the TFT 200 is reduced (broken line 2), the ratio after 1 〇 xl 〇 6 (Lx. h) is not changed. Further, when only the amount of light of the TFT 2 incident thereto is reduced (dashed line 1), the ratio after 2xl 〇 6 (Lx. h) is no longer changed. That is, when the amount of light incident on both of the TFTiOO and the TFT 200 is lowered, it is approximately five times the correction life as compared with the amount of light which is only lowered into the TFT 200. Therefore, according to this configuration, a 320535 34 200919400 display device capable of extending the life of correction can be provided. (Configuration example 2 of the dimming means) The following is a description of the configuration example 2 of the dimming means in accordance with the circuit configuration diagram shown in Fig. 13. The same components as those of the first embodiment are denoted by the same reference numerals, and the description thereof will be omitted. The difference between the first and third figures is shown in Fig. 13, and the light detecting circuit of the necropsy detecting unit is used as the light of the younger brother. Various elements of the thin film transistor 100 (hereinafter referred to as "TFT100") of the detector (the description is omitted). The dimming means is not provided on the light incident side of the TFT 100, and the TFT (10) detects the unreduced light. In the second light detecting unit, the photodetecting circuit (10) includes various elements (hereinafter abbreviated as "thin film") as a second photosensor (hereinafter abbreviated as "a thin"). On the human light side of the TFT, a black matrix _ as a light blocking member is provided. This black matrix 660 is formed in a region overlapping the TFT 200 when viewed in plan. In the present configuration example, the black matrix 660 as a mask member constitutes a dimming means. The black matrix 66 is formed of a light-shielding member such as a black resin in the same layer as a color filter not shown. An opening 67 is formed in the black matrix 660. The light toward the TFT 200 is shielded by the black matrix 66, and passes only through the opening 670. Therefore, the amount of light passing through can be reduced. That is, the black matrix 660 having the opening 670 is used as a light reduction means. Thereby, the light that is dimmed by the black matrix 660 is incident on the TFT 2 . The TFT 200 detects the dimmed light. According to the second configuration example, the manufacturing process of the black matrix 320535 35 200919400 as the light shielding member can be common to that of the general display device, so that the manufacturing cost can be reduced in addition to the simple steps and the process of the array. The effect of the implementation mode of the younger brother (Configuration Example 3 of the dimming means) The following is a description of the configuration example 3 of the dimming section in accordance with the circuit configuration diagram shown in Fig. 14. The same configuration as the above-described policy 1 is the same as that of the same embodiment, and the configuration is omitted. As shown in the second aspect, the first photodetecting circuit H (a) of the first photodetecting portion is used as a plurality of elements (hereinafter, not described) of the thin film transistor 100 (hereinafter: ... TFT1〇〇J) of the first photosensor. The color filter of the TFT 100 as the first dimming means. . The 730 system is formed in a region overlapping with the TFT 1 以 in a plan view. The light that has been dimmed by the color picker 730 is incorporated into the dozens of shots (10) to detect the dimmed light. The second photodetecting circuit ls2 of the second photodetecting unit 1b includes a thin film transistor 200 (hereinafter abbreviated as r TFT 200) including two photosensors (not described). On the light incident side of the TFT 200, a color filter 750 as a light-reducing member and a black matrix 76A as a light-shielding member provided on the light incident side of the color filter 750 are provided as the second light-reducing means. In a plan view 4, the color filter 75A and the black matrix 760 are formed in a region where the FT200 is crystallized r- >>. The black matrix 660 is shaded by a black resin or the like on a substrate having a color state of 75 Å. The black matrix 760 is formed with an opening 770. 36 320535 200919400 • The light system toward the TFT 200 is temporarily dimmed by first passing through the opening 77G formed in the black matrix 76A, and then is again dimmed by the color filter 75q. Thus, the TFT2GG detects light that is dimmed by the second dimming means in which the light blocking member and the light reducing member are overlapped. Thereby, the amount of light incident on the tfti (eight) as the second photosensor and the TFT 2 作为 as the second photosensor can be reduced, and therefore, the photodegradation speed of each TM 〇, 200 can be made. Therefore, it is possible to extend the time until the ratio between the output signal and the second output signal is no longer changed due to the deterioration of the light of each of the TFTs 100 and 200. The material can be used to make the light-reducing member and the light-shielding member used as the light-reducing means common to the process of the general display device, so that the light-reducing means can be manufactured in a simple procedure. + In the -dredition, the arrangement of the dimming member and the light-shielding member of the segment is not limited to the 'yoke type filter or configuration example, and other combinations are also possible. In this case, the use of a color filter as a means of dimming is described, and is not limited thereto, and a polarizing plate or a phase dimming member may have the same effect. The plate temple has been reduced to the first (deformation). The electric ^= is the potential of the electrode U1 of the electric valley 110 belonging to the first photodetection circuit (3). The second light detecting circuit LS2 is the capacitor brother: And the first output signal sb of the potential of the electrode 211 belonging to the 钤屮 u 电 电 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 210 However, in the variant of this _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The potential of the electrode hi and the potential of the electrode 211 of the capacitor 210 are derived. Vs is lowered to the time required for the predetermined potential Vc, and the sensitivity is corrected. Here, a correction method of a modification of the embodiment will be described. Fig. 15 shows that when the incident light of the incident light amount L1 is incident on the second light detecting circuit LSI, the dimming incident light of the incident light amount L1/n is incident on the photodetecting circuit LS2, and is charged to the capacitors 11A, 21A. A pattern of the time variation of the potential. In Fig. 15, the vertical axis represents the potential of the capacitor, and the horizontal drawing represents the elapsed time from the start of the measurement. In the i-th towel, the function curve W is a time change of the potential of the electrode 111 of the capacitor ιι 表示 of the i-th photodetecting circuit (3) in the initial state, and the capacitor of the second photodetecting circuit LS2 of the function curve V-system The electrode 211 = two time changes, the function curve Vaa (1) is expressed as the time change of the potential of the electrode ln after the deterioration:: = = inferior, the electrode of the capacitor 210 measured later... electricity: 2 k some curves indicate The situation of the potential over time is because if f is reduced by 101 盥, the source part of the TFT1 感 of the first sensor is two: the 'potential difference' between the two and the second pre-sensor TFT 200 The electricity between the source and the bungee is distributed to the TFT100, and the difference between the two is small. It takes a lot of time. First electric... small, so that the potential is lowered to detect Ϊ:: Γ 电: 容容二:: 1 indicates _ state of the first light - τ tbl is not the initial state of the 320535 38 200919400 2 light talent The time required for the electric circuit of the measuring circuit LS 2 to be cried 9 1 n aa % is reduced to between the predetermined broadcasting path and the % of t, and the potential lowering time taal is expressed by the potential Vaa of the deterioration stop 110 being lowered. To the predetermined potential vc, the capacitor is crying, and the lowering time is 1 bb 1 is a light quantity of the light emitted by the light detecting circuit LS1 required for the potential ^ 210 of the time period after the deterioration is lowered to the predetermined potential Vc. The amount of light of the dimming incident light of the second photodetecting circuit LS2 having the dimming hand is larger, and therefore the leakage current of Tm 00 is larger than the leakage current of the TFT. In addition, the sensitivity under the 'monthly first' is higher than the leakage current in the initial state due to exposure to light. Therefore, the initial state: the potential reduction time of the x-ray measuring circuit LS1 is the shortest. In addition, the accumulated light amount of the TFT 100 is more than the cumulative light amount of the TFT 2 ’, so the deterioration speed is relatively high. Therefore, the f 1 photodetecting circuit (3) is large with respect to the magnitude of change in the potential lowering time with respect to the initial state after the deterioration. Since the relationship between the potential of the long capacitor and the potential lowering time is the same as the relationship between the photocurrent and the incident light amount, the potential lowering time ta 〇, tb 对 of the initial state of the predetermined incident light amount L0 can be measured in advance, and Find the initial ratio taO/tbO. Then, the measured ratio (Ual/tbbl) is calculated by calculation from the measured potential decrease time taal and the potential decrease time tbbl '. Then, as a ratio of the ratio between the measured ratio (taal/tbbl) and the initial ratio (ta0/tb〇), the light deterioration correction coefficient of the modified example of the present embodiment is 320535 39 200919400

Kt ’ 係表示為 Kt=(taal/tbbl)/(taO/tbO)。 接著說明本實施型態的變形例之光劣化率Dt。光+ 率Dt係以初期狀態之第2光檢測電路LS2的電位1 ^ 間tbl與劣化後之第2光檢測電路⑽的電位降低時j、 編之間的比例所規定,其係表示為D㈣bl/tbl。… 於本實施型態中,係能夠以使光劣化校正係數K與朵 劣化率D相對應之方式,使光劣化校正係數^與光^ 率以相對應。只需將查詢表變更為使光劣化校正係數Kt 與光劣化率Dt相對應之查詢表即可。 、 ,藉此,可從光劣化校正絲Kt取得光劣化率以 异出初期狀態之電容器21〇的電位降低時 電位降低時_作為一 接著說明本實施型態的變形例之光量檢測裝置】的 乍。本實嶋的變形例之動作的流程圖係與心Kt' is expressed as Kt = (taal / tbbl) / (taO / tbO). Next, the photo-degradation rate Dt of the modification of this embodiment will be described. The light + rate Dt is defined by the ratio between the potential t1 between the potential of the second photodetecting circuit LS2 in the initial state and the potential of the second photodetecting circuit (10) after degradation, and is expressed as D(four)bl. /tbl. In the present embodiment, the photo-degradation correction coefficient can be made to correspond to the photo-definition in such a manner that the photo-degradation correction coefficient K corresponds to the degradation rate D. It is only necessary to change the lookup table to a lookup table that corresponds the photo-degradation correction coefficient Kt to the photo-degradation rate Dt. Then, when the photo-deterioration rate is obtained from the photo-degradation correction wire Kt, the potential of the capacitor 21A in the initial state of the dislocation is lowered, and the potential is lowered as a light-quantity detecting device according to a modification of the present embodiment. first. The flow chart of the action of the modified example of the present embodiment is

Vs為止蔣於,S1中,將電容器110、210充電至電位 為。將入射光量L1的入射光照射於Tm 光置咖的減光人射⑽射於tft2Q(),生電射 ::,二r之電極ιη的電位作為第 並輪入=匕传SA2 1 1 _ W 2輸S b, 並予以读跑絲她法心 輸出Λ唬Sb的電位訊號, H轉料電錢魅Ve為止所f之 低 如此’可取得於劣化後所料之第1光檢測電路LS1 320535 40 200919400 的電位降低時間taal、及第2光檢測電路LS2的電位降低 時間tbbl,並從這些電位降低時間運算出測定比例 (taal/tbbl)。 士此外,係將劣化後之第2光檢測電路LS2的電位降低 時間tbbl輸出至光訊號輸出部24。 之後進行步驟S2,將初期比例(ta〇/tb〇)從記憶體電路 二3 ^取至 <化係數運算部21,並運算出光劣化校正係數 KK=_/tbbl)/⑽/tb0))。之後將此光劣化校正係數以 輸出至光訊號輸出部24。 此初期比例係於初期狀態中,為當入射光量l〇的入 光::射於第i光檢測電路LS1,且入射光量L〇/n的入射 射於弟2光檢測電路LS2時之電位降低時間,第!光 铋測電路LSI的電位降低時間為〇 的電位降低時間為_。. 第2^測電路LS2 22中。於步驟S3卜於光劣化率運算部 與體電路23之使光劣化校正係㈣ 運算部21;所=目^應之查錢,而取得對應於從劣化係數 21所輸出的光劣化 後,將所取得之光劣化^糸數Kt之光劣化率以。然 , 率以輸出至.光訊號輸出部24。 化率運算部22所傳送===中’係根據從光劣 算部u所輪出之電位降低匕率二以,從劣化係數運 電位降低時間tbl(=tbbl/D 、,,運异出初期狀態的 _進行校正。之後於步驟e亚對劣化後的電位降低時間 ',"5中’輸出初期狀態的電位 320535 41 200919400 降低時間tb 1以作為入射光的光量訊號$ 如以上所說明,亦可藉由將來自货 曰弟1、第2光檢測部 10a、10b之輸出訊號Sa、Sb讀取輟说 、為電容器11〇、21〇 的電位降低時間,來進行光劣化時之残戶_正 [第2實施型態] & X ° 接下來說明第2實施型態。第2眘# 貫知型態係將從第b 第2光檢測部H)a、議輸出至光感測器讀取部2()之電位 訊號’讀取轉換為光電流’並對此光電流進行對數轉換後 再進行運算。 首先說明依據對數轉換之運算方法。若對第i實施型 態之光劣化校正係數K進行對數轉換,則成為Log2K=As in Vs, in the case of S1, the capacitors 110 and 210 are charged to the potential of . The incident light of the incident light amount L1 is irradiated to the light-reducing person of the Tm light-emitting device (10), and the potential of the electrode ιη of the second r is taken as the first round-in = 匕 SA SA2 1 1 _ W 2 loses S b, and reads the running signal of her heart output Λ唬Sb potential signal, H transfer material money charm Ve so low f such 'can be obtained after deterioration of the first light detection circuit LS1 The potential decrease time taal of 320535 40 200919400 and the potential decrease time tbbl of the second photodetection circuit LS2 are calculated from these potential decrease times (taal/tbbl). Further, the potential lowering time tbbl of the second photodetecting circuit LS2 after the deterioration is output to the optical signal output unit 24. Then, in step S2, the initial ratio (ta〇/tb〇) is taken from the memory circuit 2 to the <the coefficient calculation unit 21, and the photo-degradation correction coefficient KK=_/tbbl)/(10)/tb0) is calculated. . This light deterioration correction coefficient is then output to the optical signal output portion 24. This initial ratio is in the initial state, and is the incident light when the incident light amount l〇 is incident on the i-th photodetecting circuit LS1, and the incident light amount L〇/n is incident on the second light detecting circuit LS2. Time, first! The potential reduction time of the optical detection circuit LSI is 电位, and the potential reduction time is _. The second test circuit LS2 22. In the step S3, the photo-degradation rate calculation unit and the body-lighting unit 23 perform the photo-degradation correction system (4), and the calculation unit 21 obtains the money, and obtains the light degradation corresponding to the output from the deterioration coefficient 21, and then The photodegradation rate of the photodegradation Kt obtained is determined. However, the rate is output to the optical signal output unit 24. The transmission rate calculation unit 22 transmits a ===zhong' based on the potential deviated from the potential of the optical inferior calculation unit u, and decreases the time tbl from the deterioration coefficient (tbbl/D, In the initial state, _ is corrected. Then, in step e, the potential after the degradation is decreased, and the potential of the initial state of the output is 320535 41 200919400, and the time tb 1 is decreased as the amount of light of the incident light. In addition, the output signals Sa and Sb from the goods 1 and 2nd light detecting units 10a and 10b can be read and the potentials of the capacitors 11A and 21〇 can be reduced, thereby performing the photodegradation. _正正 [Second embodiment] & X ° Next, the second embodiment will be described. The second caution mode is output from the bth second light detecting unit H)a to the light sensation. The potential signal 'read and convert to photocurrent' of the detector reading unit 2 () is subjected to logarithmic conversion of the photocurrent and then calculated. First, the calculation method based on logarithmic conversion will be described. If logarithmic conversion is performed on the photo-degradation correction coefficient K of the i-th embodiment, it becomes Log2K=

Log2{(Iaa(Ll)/Ibb(Ll/n))/(Ia(L0)/Ib(L0/n))}=(Log2(Iaa(Ll ))-Log2(Ibb(Ll/n))HLog2(Ia(L0))-Log2(Ib(L0/n)))。 若對光劣化率D進行對數轉換,則成為Log2D=Log2 (Ibb(Ll/n)/Ib(Ll/n))=Log2(Ibb(Ll/n))-Log2(Ib(Ll/n))。 因此,藉由對數轉換,可將乘算及除算取代為加算及 、b· /ξίΐ 減异。 藉此,可從經對數轉換後的光劣化校正係數Log2K及 經對數轉換後的光劣化率Log2D,藉由Log2(Ib(Ll/n))= Log2(Ibb(Ll/n))- Log2D,來運算出初期狀態之經對數轉換 後的光電流Log2(Ib(Ll/r〇)。 之後,將經對數轉換後的光電流Log2(Ib)轉換為實 數,並運算出初期狀態的第2光電流Ib(Ll/n)(= Ibb(Ll/n)/D)。將如此獲得之初期狀態的第2光電流lb作 42 320535 200919400 為入射光的光量訊號s並予以輸出。 置=:明第2實施型態之顯示裝置_的光量檢測裳 圖。:::示第2實施型態之光電流的校正之流程Log2{(Iaa(Ll)/Ibb(Ll/n))/(Ia(L0)/Ib(L0/n))}=(Log2(Iaa(Ll))-Log2(Ibb(Ll/n))HLog2 (Ia(L0))-Log2(Ib(L0/n))). When logarithmic conversion is performed on the photo-degradation rate D, Log2D=Log2 (Ibb(Ll/n)/Ib(Ll/n))=Log2(Ibb(Ll/n))-Log2(Ib(Ll/n)) . Therefore, by logarithmic conversion, multiplication and division can be replaced by addition and b· /ξίΐ reduction. Thereby, the logarithmically converted photodegradation correction coefficient Log2K and the logarithmically converted photodegradation rate Log2D can be obtained by Log2(Ib(Ll/n))=Log2(Ibb(Ll/n))-Log2D, The logarithmicly converted photocurrent Log2 (Ib(Ll/r〇) is calculated in the initial state. Then, the logarithmically converted photocurrent Log2(Ib) is converted into a real number, and the second light in the initial state is calculated. Current Ib(Ll/n) (= Ibb(Ll/n)/D). The second photocurrent lb in the initial state thus obtained is 42 320535 200919400 as the light quantity signal s of the incident light and is output. Light quantity detection of the display device of the second embodiment_::: Flow of correction of the photocurrent of the second embodiment

⑽所^之第^具有將從第卜第2光檢測部咖、 厅翰出之第1輸出訊號Sa及第2輸出訊號 取轉換為第1 #雷、、ώ 故、 "R 換之牛驟以! .、t⑽第光電流Ibb,並進行對數轉 r ' ,運算出經對數轉換後的測定比例之步驟 記憶體電路23,讀取經對數轉換後的初期比例, ^運异出_數轉換後的光劣化校正係數一汉之步驟 犯’魏憶體電路23,取得對餘藉由運算所求取之經 ^轉換後的光劣化校正係數[。讲之經對數轉換後的 二另化率Log2D之步驟S14 ;從記憶體電路幻所取得之 :對數轉換後的光劣化率LGg2D,運算出經對數轉換後的 光電流L0g2(Ib)之㈣S15 ;將經對數轉換後的光電流 (L〇g2(Ib)轉換為實數之㈣㈣:及將經實數轉換後的第2 光電流ib作為光量訊號s並予以輸出之步騾幻7。 於第2實施型態之記憶體電路23中,係記憶經對數轉 換後的初期比例LOg2(Ia(L0))_L〇g2(Ib(L0/n))。並且記憶有 使經對數轉換後的光劣化校正係數L〇g2K及經對數轉換 後的光劣化率Log2D相對應之查詢表。 首先,於步驟sii中,於劣化係數運算部21中,從 第J、第2光檢測部10a、⑽所輸出之第!輪出訊號以 及第2輸出訊號Sb,取得某入射光量L1之劣化後的第i 320535 43 200919400 光電流Iaa(Ll)及第2光電流Ibb(Ll/n),對這些第i光電 k Iaa(Ll)及弟2光電流ibb(Ll/n)進行對數轉換而運算出 Log2(Iaa(Ll))及 Log2(Ibb(Ll/n))。 此外’將經對數轉換後的第2光電流Log2〇[bb(u/n)) 輸出至光訊號輸出部24。 接著進行步驟S12,於劣化係數運算部21中,運算出 經對數轉換後的測定比例L〇g2(Iaa(Ll))-L〇g2(Ibb(Ll/n))。 之後進行步驟S13,於劣化係數運算部21中,從記憶 體電路23讀取經對數轉換後的初期比例L〇g2(Ia(L〇))_(10) The ^^ has the first output signal Sa and the second output signal from the second optical detecting unit, the café, and the second output signal are converted into the first #雷, ώ故, "R for the cow Come! , t(10) photocurrent Ibb, and logarithmically rotated r ', the logarithmically converted measurement ratio is performed in the memory circuit 23, and the initial ratio after the logarithmic transformation is read. The photo-degradation correction coefficient is one step of the 'Wei Yi body circuit 23, and the photo-degradation correction coefficient obtained by the operation is obtained. The step S14 after the logarithmic conversion of the second doubled rate Log2D is obtained from the memory circuit magic: the logarithmically converted photo-degradation rate LGg2D, and the logarithmically converted photocurrent L0g2(Ib) is calculated as (4) S15; The logarithmically converted photocurrent (L〇g2(Ib) is converted into a real number (4) (4): and the second photocurrent ib after the real number conversion is used as the light amount signal s and is outputted. Step 2: In the second implementation In the memory circuit 23 of the type, the logarithmically converted initial ratio LOg2(Ia(L0))_L〇g2(Ib(L0/n)) is memorized, and the logarithmically converted photo-degradation correction coefficient is stored. L 〇 2 2 及 及 及 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 The round-out signal and the second output signal Sb obtain the i-th 320535 43 200919400 photocurrent Iaa (L1) and the second photo-current Ibb (Ll/n) after the deterioration of the incident light amount L1, for these ith photoelectric k Iaa (Ll) and brother 2 photocurrent ibb (Ll / n) logarithmically converted to calculate Log2 (Iaa (Ll)) and Log2 (Ibb (Ll / n)). The current through the second optical Log2〇 log-transformed [bb (u / n)) to the output optical signal output section 24. Next, in step S12, the deterioration coefficient calculation unit 21 calculates the logarithmically converted measurement ratio L〇g2 (Iaa(L1))-L〇g2(Ibb(Ll/n)). Thereafter, in step S13, the deterioration coefficient calculation unit 21 reads the logarithmically converted initial ratio L〇g2 (Ia(L〇)) from the memory circuit 23.

Log2(Ib(L0/n)),並運算出經對數轉換後的光劣化校正係數Log2(Ib(L0/n)), and calculate the logarithmic converted photo-degradation correction coefficient

Log2K=(Log2(Iaa(Ll))-Log2(Ibb(Ll/n))HL〇g2(Ia(L0))-Lo g2(Ib(L0/n)))。 然後進行步驟S14 ,將於步驟S13中所運算出之經對 數轉換後的光劣化校正係數L〇g2K,從劣化係數運算部21 輸出至光劣化率運算部22。於光劣化率運算部^中,將 從劣化係數運算部21所輸出之經對數轉換後的光劣化校 正係數Log2K ’輸出至記憶體電路23。於記憶體電路B 中’從查詢表卿對應於從光劣化率運算部22所輸出之經 對數轉換後的光劣化校正係數LGg2K之經對數轉換後的 光劣化率Log2D,並將其輸出至光劣化率運算部22。之 後’光劣化率運算部22係、將從記憶體電路23所輸出之經 對數轉換後的光劣化率Log2D,輸出至光訊號輸出部Μ。 然後進行步驟S15,.於光訊號輪出部24中,根據從記 憶,電路23戶斤輸出之經對數轉換後的光劣化率⑽瓜及 320535 44 200919400 從劣化係數運算部21所輸出之對數的第2光電流 Log2(Ibb(Ll/n)) ’運异出初期狀態之對數的光電流Log2K=(Log2(Iaa(Ll))-Log2(Ibb(Ll/n))HL〇g2(Ia(L0))-Lo g2(Ib(L0/n))). Then, in step S14, the logarithmically converted photo-degradation correction coefficient L〇g2K calculated in step S13 is output from the deterioration coefficient calculation unit 21 to the photo-degradation rate calculation unit 22. In the photo-degradation rate calculation unit, the logarithmically converted photo-degradation correction coefficient Log2K' output from the deterioration coefficient calculation unit 21 is output to the memory circuit 23. In the memory circuit B, 'the logarithmically converted photo-degradation rate Log2D corresponding to the log-transformed photo-degradation correction coefficient LGg2K output from the photo-degradation rate calculation unit 22 is outputted from the look-up table B, and output to the light. Deterioration rate calculation unit 22. Thereafter, the photo-degradation rate calculation unit 22 outputs the logarithmically converted photo-degradation rate Log2D output from the memory circuit 23 to the optical signal output unit Μ. Then, in step S15, in the optical signal wheeling portion 24, the logarithm of the logarithmically converted light degradation rate (10) and the 320535 44 200919400 output from the deterioration coefficient calculation unit 21 is outputted from the memory 23 circuit. The second photocurrent Log2(Ibb(Ll/n))' is the logarithmic photocurrent of the initial state

Log2(Ib(Ll/n))(= Log2(Ibb(Ll/n))-L〇g2D)。 μ之後進行步㈣6,於光訊號輸出部24巾,將初期狀 悲之經對數轉換後的光電& L〇g2Ib轉換為實數,並運 初期狀態的第2光電流Ib(L1/n)(= Ibb(u/n)/D)。# 第步驟S16中所運算出之初期狀態的 弟2先U作為人射光量L的光量訊號s並予以輸出。 根據第2實施型態,可獲得以下的效果。 藉由進行依據對數轉換之運算,可將乘算及除算取代 為加异及減算,所以可縮小電路構成。藉此可減小電路面 積並降低製造成本。此外,可抑制消耗電力。 料,M U施型態所說明,將輸人至光感測器讀 0之第1輪出訊5虎Sa及第2輸出訊號Sb予以讀取 轉換為電容器m、21〇的電位從Vs降低至%為止所需 =時間,並進行對數轉換而加以運算,藉此可算出光量訊 號s並予以輪出。 此外,'於本貫施型態中,光量檢測裝置工之入射光量 ^的測定雜錯就額連續地崎。於進行下一次測 定時,藉由將電位Vg施加於閑極端子19〇,可使τρτι〇〇、 ⑼成為導通狀態並對電容器11G、21G的電位進行放電。 之後再對電谷s 11G、21G進行電位Vs的充電並進行測定。 在此I胃於第1光檢測部及第2光檢測部的配置,以 下係使用第圖至第19圖來說明光檢測部的配置例工乃 320535 45 200919400 至光檢測料配践3。於與實施型態等所說明之構成相 同者,係附加相同符號並省略該說明。 (光檢測部的配置例1) 以下依據第η圖來說明第!光檢測部及第2光檢測部 的配置例lQ第17圖係顯示第1光檢測部及第2光檢測部 的配置例1之概略俯視圖。如第17圖所示,於陣列基板 AR中,具有外周緣DA⑷、DA(b)、DA(c)、da⑷,並設 置配設有複數個像素400之顯示區域DA。於顯示區域d°a 的外周緣DA⑷、DA(b)、DA⑷,係分別沿著外周緣da⑷、 DA(b)、DA(c)配設有第2光檢測部1〇b。於第2光檢測部 l〇b的外侧(與顯示區域DA為相反侧),沿著第2光檢測部 l〇b且大致並列之方式配設有第j光檢測部1〇&。第^光檢 測部l〇a及第2光檢測部10b並不限於上述沿著外周= DA⑷、DA(b)、DA(C)而設置之配置,亦可沿著外周緣 DA(a)、DA(b)、DA(c)中至少1個外周緣而設置。 根據本配置例1的構成,可於接近顯示區域DA之位 置進行光檢測,因此可提高檢測精準度。此外,藉由並列 配置第1光檢測部10a及第2光檢測部l〇b,可抑制第1 光感測器(圖中未顯示)及第2光感測器(圖中未顯示)的特 性波動’而可更為提高檢測精準度。 關於第1光檢測部l〇a及第2光檢測部1〇b,亦可> 著外周緣DA(a)、DA(b)、DA(c)配設第1光檢測部1〇a, 並沿著配設第1光檢測部1〇a的外側配設第2光檢測部 l〇b,如此亦具有同樣之效果。 320535 46 200919400 (光檢測部的配置例2) 以下依據第1 8圖來說明第1光檢測部及第2光檢測部 的配置例2。第18圖係顯示第1光檢測部及第2光檢測部 的配置例2之概略俯視圖。如第丨8圖所示,於陣列基板 AR中’具有外周緣DA⑷、DA(b)、DA⑷、DA(d),並設Log2(Ib(Ll/n))(= Log2(Ibb(Ll/n))-L〇g2D). After μ, step (4) 6 is performed on the optical signal output unit 24, and the photoelectrically converted & L〇g2Ib after the initial logarithm conversion is converted into a real number, and the second photocurrent Ib (L1/n) in the initial state is transmitted ( = Ibb(u/n)/D). # The first step U in the initial state calculated in the step S16 is U as the light amount signal s of the human light amount L and is output. According to the second embodiment, the following effects can be obtained. By performing the logarithmic conversion calculation, the multiplication and division can be replaced by addition and subtraction, so that the circuit configuration can be reduced. Thereby, the circuit area can be reduced and the manufacturing cost can be reduced. In addition, power consumption can be suppressed. According to the material, the MU mode indicates that the first round of the input to the photosensor is 0. The 5 Sa and the second output signal Sb are read and converted into the capacitors m and 21, and the potential is lowered from Vs to % is required = time, and is converted by logarithmic conversion, whereby the light amount signal s can be calculated and rotated. In addition, in the present embodiment, the amount of incident light amount of the light amount detecting device is continuously measured. At the next measurement, by applying the potential Vg to the idle terminal 19, τρτι〇〇 and (9) can be turned on and the potentials of the capacitors 11G and 21G can be discharged. Thereafter, the potential Vs is charged to the electric valleys s 11G and 21G and measured. In the arrangement of the first light detecting unit and the second light detecting unit, the arrangement of the light detecting unit will be described below using the drawings from Fig. 19 to Fig. 19 to 3205.1 45 200919400 to the photodetecting material. The same components as those described in the embodiment and the like are denoted by the same reference numerals, and the description is omitted. (Arrangement Example 1 of Light Detection Unit) Hereinafter, the description will be made based on the η diagram! The arrangement example 1Q of the light detecting unit and the second light detecting unit is a schematic plan view showing the arrangement example 1 of the first light detecting unit and the second light detecting unit. As shown in Fig. 17, the array substrate AR has outer peripheral edges DA (4), DA (b), DA (c), and da (4), and is provided with a display area DA in which a plurality of pixels 400 are disposed. The outer peripheral edges DA(4), DA(b), and DA(4) of the display region d°a are disposed with the second photodetecting portions 1〇b along the outer peripheral edges da(4), DA(b), and DA(c), respectively. On the outer side of the second light detecting unit 10b (opposite to the display area DA), the jth light detecting unit 1〇& is disposed along the second light detecting unit 10b and substantially juxtaposed. The first light detecting unit 10a and the second light detecting unit 10b are not limited to the above arrangement along the outer circumference = DA (4), DA (b), and DA (C), and may be along the outer circumference DA (a). At least one outer circumference of DA(b) and DA(c) is provided. According to the configuration of the first configuration example, the light detection can be performed at a position close to the display area DA, so that the detection accuracy can be improved. Further, by arranging the first light detecting unit 10a and the second light detecting unit 10b in parallel, it is possible to suppress the first photo sensor (not shown) and the second photo sensor (not shown). The characteristic fluctuations' can improve the detection accuracy. Regarding the first light detecting unit 10a and the second light detecting unit 1b, the first light detecting unit 1a may be disposed on the outer peripheral edges DA(a), DA(b), and DA(c). The second photodetecting unit 10b is disposed along the outer side of the first photodetecting unit 1A, and the same effect is obtained. 320535 46 200919400 (Arrangement Example 2 of Light Detection Unit) Hereinafter, an arrangement example 2 of the first light detection unit and the second light detection unit will be described based on Fig. 18 . Fig. 18 is a schematic plan view showing an arrangement example 2 of the first light detecting unit and the second light detecting unit. As shown in Fig. 8, in the array substrate AR, there are outer peripheral edges DA(4), DA(b), DA(4), and DA(d).

置配設有複數個像素4〇〇之顯示區域DA。於顯示區域DA 的外周緣DA(a)、DA(b)、DA(c),係分別沿著外周緣DA(a)、 DA(b)、DA(c) ’交互配設有第1光檢測部1 〇a及第2光檢 測邛1 Ob。第1 8圖中所示之第1光檢測部} 〇a及第2光檢 測部10b的數目僅為一例,各個的數目並無限制。 根據本配置例2的構成,可於接近顯示區域da之位 置進行光檢測,因此可提高檢測精準度。此外,藉由交互 地配置第1光檢測部10a及第2光檢測部1〇b,可抑制照 射於第1光感測器(圖中未顯示)及第2光感測器(圖中未顯 示)之光量的波動,而降低第!光感測器及第2光感測器的 劣化波動。 (光檢測部的配置例3) 以下依據第19圖來說明第丨光檢測部及第2光檢測部 的配置例3。第19圖係顯示第!光檢測部及第2光檢測部 的配置例3之概略俯視圖。如# 19圖戶斤示,於陣列基板 AR中,係設置配設有複數個像素4〇〇之顯示區域da。於 各個像素400的-部分(於本例中為中央的端部),配設有 第1光檢測部H)a或第2光檢測部1〇b。較理想為於像素 4〇〇的行或列上,於每個像素4〇〇中交互地配置第i光檢 320535 47 200919400 測部10a及第2光檢測部i〇b。此 u ^ ί ^ ^ 'β\ λ 卜弟1光檢測部l〇a 及弟2先秧測邛101)亦可於每個像素 根據本配置例3的構成,由於第^中各自設置1個。 取由於第1光檢測部l〇a及第2氺 檢測部】Ob係配設於像素400 ό 及弟2先 器(圖中未顯示)及苐2 = 量。因此,除了前述配置例」、2 的效果之外,更能夠提高檢測精準度。 【圖式簡單說明】 ^ 第1圖係顯示丰穿读哥】、% a 第2…t 顯示裝置1〇00之俯視圖。 ί圖係顯示陣列基板的1個像素份之俯視圖。 ,j 3圖係顯示第2圖的m_m、線之剖面圖。 f 4圖係顯示光量檢測裝置1的構成之方塊圖。 弟5圖係顯示第】光檢測電路⑶ ' LS2之電路構_。. 尤私列電路 第6圖係顯示第1、第2 雷路1^1 弟先私測部,⑷為第1光檢測 ()為第2光檢測電路[Μ之示意剖面圖。 式。圖係顯示光電流1相對於入射光量L之函數之圖 式。第8圖係顯示光電流1相對於入射光量L之函數之圖 第9圖係顯示光電流的校正之流程圖。A display area DA having a plurality of pixels 4 is disposed. The outer peripheral edges DA(a), DA(b), and DA(c) of the display area DA are alternately disposed with the first light along the outer peripheral edges DA(a), DA(b), and DA(c)', respectively. The detecting unit 1 〇a and the second light detecting unit 1 Ob. The number of the first light detecting unit 〇a and the second light detecting unit 10b shown in Fig. 18 is only an example, and the number of each is not limited. According to the configuration of the second configuration example, the light detection can be performed at a position close to the display area da, so that the detection accuracy can be improved. Further, by arranging the first light detecting unit 10a and the second light detecting unit 1b alternately, it is possible to suppress the irradiation of the first photo sensor (not shown) and the second photo sensor (not shown) Show) the fluctuation of the amount of light, and lower the number! The deterioration of the photo sensor and the second photo sensor is fluctuating. (Arrangement Example 3 of Light Detection Unit) Hereinafter, an arrangement example 3 of the second light detection unit and the second light detection unit will be described based on Fig. 19 . Figure 19 shows the first! A schematic plan view of the arrangement example 3 of the light detecting unit and the second light detecting unit. As shown in Fig. 19, in the array substrate AR, a display area da provided with a plurality of pixels 4 is provided. The first photodetecting portion H)a or the second photodetecting portion 1b is disposed in a portion (in the present embodiment, a central end portion) of each pixel 400. Preferably, the i-th photodetection 320535 47 200919400 detecting unit 10a and the second photo detecting unit i〇b are alternately arranged in each of the pixels 4〇〇 on the row or column of the pixel 4〇〇. This u ^ ί ^ ^ 'β\ λ Budi 1 light detecting unit l〇a and brother 2 first detecting 101) may also be configured for each pixel according to the configuration example 3, since each of the first . The first light detecting unit 10a and the second detecting unit are disposed in the pixels 400 ό and 2 (not shown) and 苐 2 = amount. Therefore, in addition to the effects of the foregoing configuration examples, 2, the detection accuracy can be improved. [Simple description of the figure] ^ The first picture shows the top view of the display device 1〇00. The figure shows a top view of one pixel of the array substrate. The j 3 diagram shows the m_m and line profiles in Fig. 2. The f 4 diagram shows a block diagram of the configuration of the light amount detecting device 1. The brother 5 shows the circuit configuration of the first light detection circuit (3) 'LS2. Fig. 6 shows the first and second mines 1^1 first private measurement unit, and (4) the first light detection () is a schematic diagram of the second light detection circuit [Μ. formula. The graph shows a plot of photocurrent 1 as a function of incident light amount L. Fig. 8 is a graph showing the relationship between the photocurrent 1 and the incident light amount L. Fig. 9 is a flow chart showing the correction of the photocurrent.

與光劣化率D 第10圖係顯示關於光劣化校正係數K 之測定資料之圖式。 第11圖係_示減光手段的構成例丨之電路構成圖 320535 48 200919400 第12圖係顯示帛1輸出訊號與帛2輸出訊號之間的測 定比例之曲線圖。 第13圖係顯示減光手段的構成例2之電路構成圖。 第14圖係顯示減光手段的構成例3之電路構成圖。 第15圖係顯示電容器之電位的時間變化之圖式。 第16圖係顯示光電流的校正之流程圖。 第17圖係顯示第1光檢測部及第2光檢測部的配置例 1之概略俯視圖。 第18圖係顯示第丨光檢測部及第2光檢測部的配置例 2之概略俯視圖。 第19圖係顯示第丨光檢測部及第2光檢測部的配置例 3之概略俯視圖。 【主要元件符號說明】 1 光量檢測裝置 10a 第1光檢測部 10b 弟2光檢測部 20 光感測器讀取部 21 劣化係數運算部 22 光劣化率運算部 23 記憶體電路 24 光訊虎輸出部 30 電位控制電路 50 外部控制電路 72 、 1018 閘極絕緣膜 100 薄膜電晶體(TFT) 102 汲極部 103 、 123 、203、2.23閘極部 110 、 210 電容器 111 、 212 電極' 120 > 220 開關元件 124、204 ' 224、1019半導體層 125 、 660 、760黑色矩陣 320535 49 200919400 130 電源端子 140 ' 240輸出端子 173、 174 、 175 、 273 、 274、275 導電膜 190 閘_極端子 191 汲極端子 200 薄膜電晶體(TFT) 201 源極部 250、: 530、550、730、 750、CF 濾色器 400 像素 670 ^ 770開口部 1000 液晶顯示裝置 1002 ' '1010 透明基板 1002A 突出部 1002a 、1002b 短邊 1002c 、1002d 長邊 1014 液晶 1016 輔助電容線 1017 輔助電容電極 1020 保護絕緣膜 1021 層間膜 1022 反射部 1023 穿透部 1024 反射板 1025 接觸孔 1026 像素電極 1027 濾色器層 ’ 1028 頂塗層 D 光劣化率 DA 顯不區域 Dr 驅動器 GW 閘極線 Ia(L)、 Iaa(L)、Ib(L·)、 Ibb(L) 光電流 K 光劣化校正係數 L 入射光量 L1至 L4 拉出配線 LSI 第1光檢測電路 LS2 第2光檢測電路 S 光量訊號 Sa 第1輸出訊號 50 320535 200919400 源極線The light deterioration rate D Fig. 10 shows a pattern of measurement data regarding the light deterioration correction coefficient K. Fig. 11 is a circuit diagram showing a configuration example of the dimming means. 320535 48 200919400 Fig. 12 is a graph showing the measurement ratio between the output signal of the 帛1 and the output signal of the 帛2. Fig. 13 is a circuit diagram showing a configuration example 2 of the dimming means. Fig. 14 is a circuit diagram showing a configuration example 3 of the dimming means. Fig. 15 is a diagram showing the temporal change of the potential of the capacitor. Figure 16 is a flow chart showing the correction of photocurrent. Fig. 17 is a schematic plan view showing an arrangement example 1 of the first light detecting unit and the second light detecting unit. Fig. 18 is a schematic plan view showing an arrangement example 2 of the second light detecting unit and the second light detecting unit. Fig. 19 is a schematic plan view showing an arrangement example 3 of the second light detecting unit and the second light detecting unit. [Description of main component symbols] 1 Light amount detecting device 10a First light detecting unit 10b Second light detecting unit 20 Photo sensor reading unit 21 Deterioration coefficient calculating unit 22 Light degradation rate calculating unit 23 Memory circuit 24 Optical tiger output Portion 30 Potential Control Circuit 50 External Control Circuit 72, 1018 Gate Insulation Film 100 Thin Film Transistor (TFT) 102 Dipole Portion 103, 123, 203, 2.23 Gate Portion 110, 210 Capacitor 111, 212 Electrode '120 > 220 Switching element 124, 204' 224, 1019 semiconductor layer 125, 660, 760 black matrix 320535 49 200919400 130 power terminal 140 '240 output terminal 173, 174, 175, 273, 274, 275 conductive film 190 gate _ terminal 191 汲 extreme Sub-200 thin film transistor (TFT) 201 source portion 250, 530, 550, 730, 750, CF color filter 400 pixel 670 ^ 770 opening portion 1000 liquid crystal display device 1002 ' '1010 transparent substrate 1002A protruding portion 1002a, 1002b Short side 1002c, 1002d long side 1014 liquid crystal 1016 auxiliary capacitor line 1017 auxiliary capacitor electrode 1020 protective insulating film 1021 interlayer film 1022 reflection portion 1023 Penetration 1024 Reflector 1025 Contact hole 1026 Pixel electrode 1027 Color filter layer '1028 Top coat D Light degradation rate DA Display area Dr Driver GW Gate line Ia(L), Iaa(L), Ib(L ·), Ibb(L) Photocurrent K Light deterioration correction coefficient L Incident light amount L1 to L4 Pull out the wiring LSI First light detecting circuit LS2 Second light detecting circuit S Light amount signal Sa First output signal 50 320535 200919400 Source line

• Sb 第2輸出訊號 SW T1至T4 端子 51 320535• Sb 2nd output signal SW T1 to T4 terminal 51 320535

Claims (1)

200919400 •十、申請專利範圍: 1 · 一種顯示裝置,係於1 M - Γ- '反上具有對應於各像素而具備開 關兀::顯不區域之顯示裝置,其特徵為,具備: 光上Γ測裝置,係具有:具備第1光感測器之第i 、則二::邱具備第2光感測器之第2光檢測部、及域 =取部’並輪出由前述第,光檢測部: 檢測:所檢測出之光量作為光量訊號;及先 f ’以俯視觀看日寺,係形成於與前述第1光 感測益或前述第2光咸 矛尤 使入射於前述第i光咸^至少1者重疊之區域,並 成為不同;先感測器或前述第2光感測器之光量 光感測器:入= 有:將根據入射於前述第1 .感測,出訊號,輸出至前述光 光感測= = = 根據入射於前述第2 感測器讀取部之第2光檢測電輸出至前述光 前述光感測器讀取部係具僙·· 劣化係數運算部,係.運嘗山愿 , 與前述第2輪出訊號之間的:例之:=1輸出訊號 Φ止少τ ^ Uil疋比例,並且運算 出先U以絲,此光m “ 例、與屬於預先測定出夕、# u系數係為别述測定比 期比例之間的比例;初』狀想的前述測定比例之初 光劣化率運算部’係根據前述先劣化校正係數,導 320535 52 200919400 出前述第1或第2輸出訊號的光劣化率;及 光訊號輸出部,係根據前述光劣化率,以成為初期 狀㈣光量訊號之方式,校正前述第丨或第2輸出訊麥 並予以輸出。 … 2.如申請專利範圍第丨項之顯示裝置,其中具有: 第1之前述減光手段’係降低入射於前述 測器之光量;及 %A 『测器前述減光手段,係降低入射於前述第2光感 、十〜=第2減光手段所致之人射先的降低率,係比前 处弟1減光手段所致之人射光的降低率還大。 圍第2項之顯示裝置,其中,前述第1減 4. 如二專光手段之相對分光穿透率為相等。 段係具有將入射於前述第,光摊;:、手 器之光的-部分予以遮光之遮::;或“第2光感測 5. 如申请專利範圍第4項之顯示 段係具有將入射於前述第/光^哭别述減光手 “申請專利範圍第m及::先構件。 中,前述光劣化率運算料I 項之顯不裝置,其 與前述光劣化率相對應::詢,述光劣化校正係數 7.=申請專利範圍第6項所記载 光劣化率運管邱力义卞上L 、下衣置,其令,刖述 。在則处先劣化校正係數未包含於前 320535 53 200919400 查詢表時,係藉由使用前述查詢表上劣 .係數之内插計算,來導出前述光劣化率“化^ 8.如申請專利範圍第1至7 中,前述第1光感測器及前述第:之顯不裝置’其 辨^ a j 4第2先感測器為薄膜雷曰 體’並具有對施加料㈣膜 、U 充電之電容器。 “曰體的兩端之電壓進行 9. 如申請專利範圍第δ項之顯示裝置,其 第2輸出訊號係藉由光電 ; ,,^ ^ ^ 4對則述電容器進行雷葙 的充放電所致之電壓下降時間而求出。 10. 如申請專利範圍第」至馆+ &、、 任項之顯示裝置,1中, 刖述劣化係數運算部係對前述 )八 進行對數轉換來運算出前述光劣化校正出訊號 校正===參考使對數的前述光劣化 U數的則述光劣化率相對應之 . 表,從别述劣化係數運算部所輪 犯 —°旬 坏W出之月(j述對數的光劣化 杈正係數,取得前述對數的光劣化率; 前述光訊號輸出部係在以前述化 於對數的前述第1或第尤另化羊對 ^ _ 飞弟輸出矾唬進行校正後,將校正 後之刖述對數的第1或第2輪 輸出。 乂弟2輸出訊唬轉換回實數並予以 申:專利祀圍第1至1〇項中任一項之顯示裝置,i 中’係於前述顯示區域中具備光電物質層。 、 12.^申^專利範圍第1至5項中任一項之顯示裝置,其 月迭第1光檢測部及前述第2光檢測部係分別沿著 320535 54 200919400 前述顯示區域的外周緣並列配置於至少丨邊 13.如申^專利範圍第1至5項t任一項之顯示裝置,其 中幻述第1光;^測部及則述苐2光檢測部係分別沿著 前述顯示區域的外周緣交互地配置於至少〗邊。 14·如申請專利範圍第!至5項中任一項之顯示裝置,其 中,前述第1光檢測部及前述第2光檢測部係配設於前 述像素内的一部分。 如申明專利範圍第12至14項中任一項之顯示裝置,其 :4述第1光感測器之大小的合計與前述第2光感測 為之大小的合計為相等。 如申明專利範圍第1至15項中任一項之顯示裝置,其 中刖述減光手段為濾色器或偏光板或相位差板。 7·如申凊專利範圍第4至15項中任一項之顯示裝置,其 中’前述遮光構件為黑色矩陣。200919400 •10, the scope of application for patents: 1 · A display device, which has a display device corresponding to each pixel and having a switch 兀:: display area, which is characterized by: The detection device includes: a second photodetecting unit including a second photosensor, and a second light detecting unit including a second photosensor; and a domain=taking unit' a light detecting unit: detecting: the detected amount of light as a light amount signal; and first f′ viewing the Japanese temple in a plan view, and forming the first light sense or the second light salted spear, which is incident on the first i Light salt ^ at least one overlapping area and become different; first sensor or the aforementioned second light sensor light quantity light sensor: In = Yes: will be based on the first sensing. Output to the above-described light-light sensing == = According to the second light-detecting electric light incident on the second sensor reading portion, the light is outputted to the light, the light sensor reading unit, and the deterioration coefficient calculating unit , Department. The experience between the two, and the second round of the signal: Example: =1 output signal Φ The ratio of τ ^ Uil 少 is less, and the U is first calculated by the wire, and the light m is used as the ratio between the ratio of the pre-measurement and the #u coefficient to the ratio of the measured period. The ratio of the first photo-degradation rate calculation unit is based on the first deterioration correction coefficient, and the photo-degradation rate of the first or second output signal is obtained by the LED535535 52 200919400; and the optical signal output unit is based on the photo-degradation rate. In the form of an initial (four) light quantity signal, the foregoing second or second output signal is corrected and outputted. 2. The display device of the invention of claim 2, wherein: the first light reduction means of the first is to reduce incidence The amount of light in the detector; and %A "the light reduction means of the detector reduces the rate of decrease in the incidence of the person caused by the second light perception and the tenth to the second light reduction means. The reduction rate of the human light caused by the dimming method is also large. The display device of the second item, wherein the first subtraction is 4. The relative spectroscopic transmittance of the two spectroscopic means is equal. Incident on the aforementioned, Spreading:: Part of the light of the hand is shaded::; or "2nd light sensing 5. As shown in paragraph 4 of the scope of the patent application, there is a display segment that will be incident on the aforementioned The dimming hand "application patent range m and:: first member. In the above, the photo-deterioration rate calculation material I of the display device, which corresponds to the aforementioned photo-degradation rate:: query, the photo-degradation correction coefficient 7.= The photo-deterioration rate described in item 6 of the scope of application for patents is on the lower and lower garments of Qiu Liyi, and the order is repeated. The first deterioration correction coefficient is not included in the previous 320535 53 200919400 lookup table. Using the interpolation calculation of the inferior coefficient of the above-mentioned lookup table, the above-described photo-deterioration rate is derived, and the first photosensor and the aforementioned display device are as described in the first to seventh claims. The second sensing sensor is a thin film lightning body and has a capacitor for applying a material (four) film and U charging. "The voltage at both ends of the body is carried out. 9. For the display device of the δth item of the patent application, the second output signal is caused by the charge and discharge of the capacitor by means of photoelectricity; , ^ ^ ^ 4 10. The voltage drop time is obtained. 10. In the case of the display device of the "Patent No." to the Hall + &, and the item, the deterioration coefficient calculation unit performs logarithmic conversion on the above-mentioned eight) to calculate the foregoing. The photo-degradation correction signal correction=== refers to the photo-deterioration rate of the logarithm of the photo-degraded U-number. The table is a round-off of the deterioration coefficient calculation unit. Deriving the logarithmic photo-deterioration coefficient to obtain the photo-deterioration rate of the logarithm; and the photo-signal output unit corrects the first or the second of the logarithm of the logarithm The first or second round of the logarithm of the corrected logarithm is output. The output of the second output is converted back to the real number and applied: the display device of any of the patent items 1 to 1 , i ' A photo-electric material layer is provided in the display region. The display device according to any one of the items 1 to 5, wherein the first light detecting unit and the second light detecting unit are juxtaposed along the outer periphery of the display area of 320535 54 200919400, respectively. The display device of any one of the first to fifth aspects of the invention, wherein the first light is detected, and the light detecting portion is respectively along the display area. The display device according to any one of the above-mentioned items, wherein the first light detecting unit and the second light detecting unit are disposed in the foregoing A display device according to any one of claims 12 to 14, wherein the sum of the sizes of the first photosensors and the sum of the sizes of the second photosensors are equal. The display device according to any one of claims 1 to 15, wherein the dimming means is a color filter or a polarizing plate or a phase difference plate. 7· A display device, wherein 'the aforementioned light blocking member is a black matrix. 320535 55320535 55
TW097130924A 2007-09-28 2008-08-14 Display device TWI390479B (en)

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