200917358 九、發明說明： 【發明所屬之技術領域】 本發明係有關於—藉簪楹τ & r w於種又杈式工作之電漿反應器裝 置，尤指運用—腔體内之一特定氣體放電產生不同放 電模式的電聚做清潔物件表面之用，其操作簡單且可 連續以電漿清潔物件者。 【先前技術】 傳統物件之清潔方式須托費大量化學清潔溶劑， 二：，使用大量清水沖洗及烘乾，此清潔程序不 i曰生择發性有氧體造成空污問題，且浪費水資 源及耗時。以台灣而言，環保署最近擬修改法規，開 徵voc空污費，對此將在國内造成清潔製程更新之壓 力。另國際趨勢亦朝綠色製程之綠色產品方向前進， 相關法規亦在擬定或實施中。 大氣電漿清潔處理技術乃是利用氣體高壓放電方 生’、有円動能的自由電子’經由此類電子與其他 氣：：子二原子碰撞轉移能量而形成自由活化基與激 t心：子寺，再與物件表面之有機污染物發生反應如 :化將這些有機污染物轉變成無害或低污染物 貝H潔物件表面之目的。因為在此放電過程中’ 士二:界犯里均施加在電子上，原、氣體分子能量並無 :文動，即平均電子溫度遠大於氣體溫度，故稱為 賴焚。-技術具”議,…優點，= 200917358 幅減少化學品使用量。 s —般高壓放電電漿反應器的結構設計與其應用之 ，‘的物有密切關聯。目前應用於清潔物件表面上之電 水反應杰的主要有採RF放電及介電質屏壁放電二 種"彳木RF放電主要以一金屬振盪腔體放電為主，因 中起始放電不易，常須以它法輔助，另須有調諧 二人.負載匹配減少反射，其系統較複雜及成本較 2 ?，電質屏壁放電起源自1 857年德國…職製造 且延用至今並無巨大變化，此法之反應器則有 個介ff絕緣材質於放電金屬電極間作隔離， 丑路’另此法使用一般交流高電源即可，故可 降低電源設置成本，因而應用層面較廣且普及。 ” ΓΓ華Λ國專利公報公告第541614號之「電聚 ，月▲裝置」，此專利内容係為—種電漿 支樓架内配合溝槽供放置數條平板待、清物= 體内，配合電源供應器及電極外.寺=於腔 :;r待清潔物提供-種電漿之清 ^木内故設有一傳動桿可與腔體的動力 使之在支撐架内可以上下作動同時將至少： 推出支樓架;藉此成為-種不會受I 探木影響且使清潔效果更為灼4 又义 旯馮均勻的電黎清潔裝置者。 雖然上述習用之電浆清潔μ 構禕雜，一-欠穸狀罟妨伽# Α /月办基板，但架 …f數俩基拓，電黎物問亦輕長， 200917358 每次清潔之基板數量有限， 清潔裝置於更換過程中 、土亦耗時，而電漿 ^ ^ 右不關閉電源即抨+ k 關閉又要浪費再次開啟之护 k成耗電，若 1夺合使用者於實際使用時:^需故—般習用者係無法 【發明内容】 本，明之主要目的係在於，提供 松式工作之電聚反應器裝置，只 2間早之雙 置於電漿喷射處，依不π,、，饫π崃之物件放 率，即可達到清潔之功效，除主擇不同知加功 達到省電及降低成本之功效連、·心潔物件外，亦 為達上述之目的，本發明係— 裝反應器裂置，其包含—呈兩個Ρ又极式工作之電 n ^ ** ^ 或夕個氣體輸入埠之 „腔、一設置於該氣體竣流空腔内之第—電 摩之第1於該氣體漩流空腔内並與該第-電極相對 二電極、一設於該第-電極與該第二電極間之 系巴緣間隔層、一設於兮步：、、* + “ 。又於以體灰流空腔外之氣體輸入緩 -工腔及—設於該第一電極外側之磁場產生裝置，另 有一與該第一電極及該第二電極電性耦接之高壓電源 裝置，用以提供氣體放電產生非熱電漿所需之高壓電 2，而本發明所產生之非熱電漿係由該第二電極之中 空圓柱通道噴射而出，且所欲清潔之物件只須放置於 電t噴射出口處，即可以用電漿清潔。 200917358 【實施方式】 請參閱『第1及第2圖』所示’係分別為本發明 使用狀態之側視剖面示意圖及本發明使用狀態之俯視 剖面示意圖。如圖所示：本發明之雙模式工作之電漿 反應益裝置1係包含一氣體璇流空腔1 1、一第一電 極1 2、一第二電極1 3、一絕緣間隔層2 4、一磁 場產生裝置1 5及一氣體輸入緩衝空腔1 6，另有一 高壓電源裝置！ 2 2與該第一電極工2及該第二電極 軸接，用以提供氣體放電產生非熱 之咼壓電源。 μ -電極1 2係設於該氣體旋流空腔丄 端，該第—丄 ^ -2之中心係設有一中空圓柱氣200917358 IX. INSTRUCTIONS: [Technical field to which the invention pertains] The present invention relates to a plasma reactor device that operates by 簪楹τ & rw, in particular, a specific gas in a cavity Discharge produces electro-convergence of different discharge modes for cleaning the surface of the article, which is simple to operate and can be continuously cleaned by plasma. [Prior Art] The cleaning method of traditional objects requires a large amount of chemical cleaning solvent. Second, use a large amount of water to rinse and dry. This cleaning procedure does not cause the problem of air pollution caused by selective aerobics, and wastes water resources. And time consuming. In the case of Taiwan, the EPA recently proposed to amend the regulations and levy vocal pollution charges, which will put pressure on the cleaning process in the country. In addition, international trends are also moving towards the green products of green processes, and relevant regulations are being drafted or implemented. Atmospheric plasma cleaning treatment technology is to use the high-pressure discharge of gas to generate 'free electrons with kinetic energy'. Through such electrons and other gases: sub-atomic collision energy transfer to form a free activation base and radical t-heart: Zisi And then react with the organic pollutants on the surface of the object, such as: the purpose of converting these organic pollutants into the surface of harmless or low-contaminant shells. Because in this discharge process, the two people are all applied to the electrons, the energy of the original and the gas molecules is not: the movement, that is, the average electron temperature is much larger than the gas temperature, so it is called the blasphemy. -Technical tools, ... advantages, = 200917358 to reduce the amount of chemicals used. s - The structure design of the general high-pressure discharge plasma reactor is closely related to its application, and it is currently used to clean the surface of objects. There are two kinds of water-reactions: the RF discharge and the dielectric screen discharge. The RF discharge of the elm is mainly based on the discharge of a metal oscillating cavity. Because the initial discharge is not easy, it is often assisted by the method. There must be two people to tune. The load matching reduces the reflection. The system is more complicated and the cost is more than 2? The electric screen wall discharge originated from the German manufacturing in 1857 and there is no significant change in the application. The reactor of this method is There is a ff insulation material for isolation between the discharge metal electrodes, and the ugly road's other method can use the general AC high power supply, so the power supply installation cost can be reduced, so the application level is wider and more popular." ΓΓ华Λ国专利公告Announcement No. 541614, "Electrical Polymer, Moon ▲ Device", this patent is for a kind of plasma support frame with grooves for placing several flat plates, cleaning materials = body, with power supply and electrodes Temple = Cavity:; r to be cleaned - a kind of plasma is provided in the wood, so there is a transmission rod and the power of the cavity can be moved up and down in the support frame and at the same time: at least: the support frame; It will not be affected by I and will make the cleaning effect even more flaming. Although the above-mentioned conventional plasma cleaning μ structure is noisy, one-ower-like 罟 伽 伽 Α 月 月 月 月 月 月 月 月 月 月 月 月 月 月 月 月 月 月 月 f f f f f f f f f f f f f f f f f f f f f The number is limited, the cleaning device is in the process of replacement, the soil is also time consuming, and the plasma ^ ^ right does not turn off the power, ie 抨 + k is turned off and wastes the power to be turned on again to become power consumption, if the user wins the actual use Time: ^ need to be - the general use of the system can not [invented content] This, the main purpose of the Ming is to provide a loose working electro-polymer reactor device, only two early double placed in the plasma spray, not π ,,, 饫π崃 of the object release rate, can achieve the effect of cleaning, in addition to the main choice of different knowledge to achieve power saving and cost reduction effects Department - a reactor split, which contains - two Ρ and a pole working electric n ^ ** ^ or a gas input 埠 cavity, a first set in the gas turbulent cavity The first part of the gas is in the gas swirling cavity and is opposite to the first electrode and the second electrode, and is disposed in the first Department bar electrode and edges of the second spacer layer between the electrodes, a step is provided Xi: ,, * +. " And a gas input device disposed outside the body of the body ash flow chamber and a magnetic field generating device disposed outside the first electrode, and a high voltage power supply device electrically coupled to the first electrode and the second electrode The high-voltage electricity 2 required for generating a non-thermal plasma by gas discharge, and the non-thermal plasma generated by the present invention is ejected from the hollow cylindrical passage of the second electrode, and the object to be cleaned only needs to be placed. At the outlet of the electric t-jet, it can be cleaned with plasma. [Embodiment] Please refer to the "1st and 2nd drawings" for a side view showing a state of use of the present invention and a schematic cross-sectional view showing the state of use of the present invention. As shown in the figure, the plasma reaction device 1 of the dual mode operation of the present invention comprises a gas turbulent cavity 1 1 , a first electrode 1 2 , a second electrode 13 , an insulating spacer layer 24 , A magnetic field generating device 15 and a gas input buffer cavity 66, and a high voltage power supply device! 2 2 is coupled to the first electrode 2 and the second electrode for providing a non-thermal squeezing power source for gas discharge. The μ-electrode 1 2 is disposed at the end of the gas swirling cavity, and the center of the first 丄 ^ -2 is provided with a hollow cylindrical gas
/；IL 4，苦τ 〇 丁' ό又负一 τ空圓柱t 、、3 1其形狀為單端開口一 3係與該第—雷^ …亥第一電極工 腔11内之另^ 對應，設置於該氣體璇流空 第-電極12之内側係覆蓋有又口之帽形。而該 其該第—電極之冰有一第—絕緣層12丄， 5，且兮第側係設有—磁場產生裝置] /弟—電極12係連接該高堡電源裝置122。 該第二電極i 3之中心係 3 1，該中空通道丄3 +工困柱通遏1 電極1 3之同心氣产補、苦 心丄Z與第二 -電極12之-側:覆;有該第 17玄弟—長極1 3係接地電極。 且 200917358 第電才亟1 2與第二電極1 3間係、設有該絕緣 間隔層14並與絕緣間隔層121及絕緣間隔層132 構成氣體旋流空間1卜該絕緣間隔層14係設置有兩 個或多個圓形對稱之細小氣體輸人埠1 i ]_貫穿到氣 體漩流空腔11。該第-電極1 2與第二電極丄3係由 金屬V電材質所製成，該金屬材質可為不導磁之銅 合金，且該電極之厚度可視實際運作考量之，厚度可 為3〜5mm。㈣—絕緣層1 2 1與該第二絕緣層α 3 2之材質可為鐵弗龍（pTFE)、聚芳賴（ρ酿）、 聚乙稀（ΡΕ)、陶兗、玻璃、石英等，厚度可為0.5〜3細。 而該高壓電源裝置i 2 2係為一高壓高頻 (>lkHz)交流電源裝置。 §便用本發明時 Λ ^ 丨f軋菔係先進入該氣體輸 入緩衝空腔1 6後’經由絕緣間隔層丄4該兩個或多 氣體輸入痒111 ’加快流速進入該氣體旋 *工腔1 1中。該氣體旋流空腔i i係、設有兩個 入璋i i ’該氣體輸入璋i i丄係採圓對 %叹置，以近切線角度鑽孔穿透該絕緣間隔層丄4， =口經極細，約在lmm左右，當該丄作氣體從該氣體 兩入埠1 1 1通入時，係於該絕緣間隔層丄4、該第 ::緣層1 2 1與該第二絕緣層i 3 2所構成之：體 竣流空腔1 1内之放電空間形成高速漩流，以加長^ 工作乳體在該放電空間内的流動路徑，增加碰撞次數 200917358 產生更多活性自由其。廿+ 氮氣、空氣、㈣該工作氣體係、可為氧氣、 可視欲清潔物件之污；：質匕碳等乾燥氣體，亦 。玄絶緣間隔層丄4之材 、 烯（PE)等，且糾❼/為鐵弗龍（ΡΊΤΕ)、聚乙 壓運作及放電間隙距離考 ^貫際呵 厚度可為亏里之’该絕緣間隔層14之 了為〇.5〜3mm，而在該第一電極 一絕緣層1 2 1盥钫楚_ ^ z彳】遭之5亥苐 π ^第—電極1 3側邊之第二絕绫禺 1 3 2間所形成之音隊私中 逐&乐一、毛緣層 貫際放電間隙距離係可為0.3〜lcm。 δ工作氣體在谁人士古t Μ +A 传與A j γ—Μ虱脰軛入緩衝空腔1 6後， 係错由邊軋體輸入埠1 、 工工 早111加速進入該氣體漩流空腔 於 二同速昶流，此時該高壓電源裝置1 2 2係 5亥弟一電極1 2 ’因而使在該氣體妒 流空腔1 i内之名聛m丄广 ^ 裝置15係因位在該氣體旋流空腔二 氣體噴射稱轴向磁力線，可協助導引控制游離 朽°且增加噴射速度’故該電漿係由該第 間之該中空圓柱通道13ι喷射而出，其 軋丨L運動方向如圖丨 私么 斤不虽尚壓放電產生電漿之 ^ ’於低電流情形 ^ . 主要於兩平板間之氣體漩流空 : 生放電，主要為絲光（STREAMER)放電，故 為絲光放電；但若再提升放電功率時隨 …*之升向’此時將轉為火花（SPARK)放電，其 10 200917358 放電主要產生於兩電極間之中空圓柱通道丄3工，故 柄此工作模式為火花放電。該令空圓柱通道i 3工之 管壁係為電絕緣材質，可為鐵弗龍（ptfe)、聚芳 賴（二咖）、聚乙稀（PE) #、絕緣材質，其通道 内之直徑可為〇 5〜1 5cm，而#上山 々 i.M01而该中空圓柱通道1 3 2之 出口亦可逐漸縮小成^一嗤峻处 % , 之流速，其噴嘴二二 =昇氣f端 、主如榀放〇 為〇·3〜0-8cm。本發明之欲 >月咏物件2只須放置於該中空圓柱通道ι 3丄 即可以電漿達到清潔之功效。該磁場產生裝置1 $可 為-水久磁鐵，或一可由電流控制磁場大小之 圈磁鐵。該氣體輸入緩衝空腔工6之作用除提供—氣 體輸入緩衝空間外’更作為聯結該第一電極、访 第二電極1 3及該磁場產生裝置i 5之絕緣^ 其材質可為鐵弗龍（PTFE)或聚芳咖（咖= 等可機械加工製作之絕緣材料。 第3圖，係本發明實例測試結果示意_ 發明雙模式工作之㈣反應器1置的實例_結果， 二壓下’以空氣為工作氣體，於低電流情形下， 為4光放電於兩平板電極間，主要為臭氧 電流升高時，轉為火花放電主要在於中 ^當 間，…有了，反而生成高濃度的“化物。 —故本發明可在一大氣壓下工作，且極易配> 平台的程序控制，並可依照不同清潔物件的污染^ 200917358 而^ ，藉由調整施加功率，改變放電模式，對欲清潔 小物件進行清潔。又因採先進電漿清潔方式，大幅減 乂傳”’先化學清潔溶劑之使用，為一綠色技術。 所迷’本發明之雙模式工作之電漿反應/; IL 4, bitter τ 〇 ' ' ό ό ό τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ τ The inner side of the gas turbulent first electrode 12 is covered with a hat shape. The ice of the first electrode has a first insulating layer 12, 5, and the first side is provided with a magnetic field generating device. The electrode 12 is connected to the high power device 122. The center of the second electrode i 3 is 3 1, the hollow channel 丄3 + the work trap is blocked by the concentric gas production, the bitter heart 丄Z and the second electrode 12 side: the cover; The 17th mysterious brother - the long pole 1 3 series grounding electrode. And the insulating layer 12 is provided between the first electrode and the second electrode 13, and the insulating spacer layer 14 and the insulating spacer layer 132 constitute a gas swirling space 1. The insulating spacer layer 14 is provided with Two or more circularly symmetrical fine gas intrusions 1 i ] are passed through the gas swirling cavity 11 . The first electrode 12 and the second electrode 丄3 are made of a metal V electric material, and the metal material can be a non-magnetic copper alloy, and the thickness of the electrode can be considered as a practical operation, and the thickness can be 3~ 5mm. (4) The material of the insulating layer 1 2 1 and the second insulating layer α 3 2 may be Teflon (pTFE), polyfang Lai (ρ Brew), polyethylene (ΡΕ), ceramic pot, glass, quartz, etc. The thickness can be 0.5 to 3 fine. The high voltage power supply unit i 2 2 is a high voltage high frequency (> 1 kHz) AC power supply unit. §When the invention is used, the Λ^丨f rolling system first enters the gas input buffer cavity 16 and then passes through the insulating spacer 丄4 the two or more gas input itch 111' to accelerate the flow rate into the gas swirling chamber 1 1 in. The gas swirling cavity ii is provided with two inlets ii 'the gas input 璋 丄 丄 采 采 对 % , , , , , , , , , , , , , , , 钻孔 钻孔 钻孔 钻孔 钻孔 钻孔 钻孔 钻孔 = = = = = = = = About about 1 mm, when the gas is introduced from the gas into the 埠1 1 1 , the insulating spacer 丄4, the first: the edge layer 1 2 1 and the second insulating layer i 3 2 The discharge space in the body turbulent cavity 1 1 forms a high-speed swirling flow to lengthen the flow path of the working milk body in the discharge space, and increase the number of collisions 200917358 to generate more active freedom.廿+ Nitrogen, air, (4) The working gas system, which can be oxygen, which can be used to clean the objects; dry gas such as carbon and carbon. Xuan insulation spacer layer 丄 4 material, ene (PE), etc., and entanglement / for Teflon (ΡΊΤΕ), polyethylene pressure operation and discharge gap distance test ^ thickness can be the loss of the 'insulation interval The layer 14 is 〇.5~3mm, and the first electrode-insulation layer 1 2 1 _ _ ^ z 彳 遭 5 5 ^ ^ ^ ^ — 电极 第 第 第禺1 3 2 The formation of the sound team in the private and the music, the edge of the interfacial discharge gap can be 0.3~lcm. After the δ working gas is transferred to the buffer cavity 1 6 by the ancient t Μ +A and A j γ-Μ虱脰, the error is input by the edge rolling body 埠1, and the worker is accelerated to enter the gas swirling space. The cavity is turbulent at the same speed. At this time, the high-voltage power supply device 1 2 2 is a 5 弟 一 1 electrode 1 2 ′ thus making the name of the device 15 in the gas turbulent cavity 1 i In the gas swirling cavity, two gas jets are called axial magnetic lines, which can help guide the control of the free decay and increase the jetting speed. Therefore, the plasma is ejected from the hollow cylindrical passage 131 of the first section, and the rolling is performed. L movement direction as shown in Fig. 丨 么 么 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不 不Mercerized discharge; but if the discharge power is increased again, the rise of ...* will turn into a spark (SPARK) discharge, and its 10 200917358 discharge mainly occurs in the hollow cylindrical channel between the two electrodes, so the handle is working. The mode is spark discharge. The wall of the empty cylindrical channel i 3 is made of electrically insulating material, which can be Teflon, Pf (poly), polyethylene (PE) #, insulating material, and the diameter of the channel. It can be 〇5~1 5cm, and #上山々i.M01 and the outlet of the hollow cylindrical passage 133 can be gradually reduced to a 嗤 嗤 % , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The main 榀 榀 〇 〇 3 3~0-8cm. The object of the present invention > the moon-shaped object 2 only needs to be placed in the hollow cylindrical channel ι 3 丄 to achieve the effect of cleaning by plasma. The magnetic field generating device 1 $ can be a long-lasting magnet, or a ring magnet of a magnitude that can be controlled by a current. The function of the gas input buffering cavity 6 is to provide the insulation of the first electrode, the second electrode 13 and the magnetic field generating device i 5, which is the material of the Teflon. (PTFE) or poly-aromatic coffee (coffee = etc. mechanically produced insulating material. Figure 3 is an example of the test results of the present invention - Example of the invention of the dual mode operation (IV) Reactor 1 set _ result, two under pressure Taking air as the working gas, in the case of low current, 4 light is discharged between the two plate electrodes, mainly when the ozone current is increased, and the spark discharge is mainly in the middle and the middle, ... but it generates a high concentration. 1. Therefore, the invention can work under one atmosphere, and is easy to match with the program control of the platform, and can be adjusted according to the pollution of different cleaning objects ^ 200917358 ^, by adjusting the applied power, changing the discharge mode, to clean Small objects are cleaned. Due to the advanced plasma cleaning method, the use of the first chemical cleaning solvent is greatly reduced. The plasma reaction of the dual mode operation of the present invention.
吧 Λ义’人 Q 口J :效改善習用之種種缺點，操作簡單，並只須將欲清 '物件放置於電漿噴射處，即可達到清潔之功效， 續清潔物件’達到省電及降低成本之功效，進 之所/百發明之産生能更進步、更實用、更符合使用者 專=請確已符合發明專利申請之要件，妥依法提出 =所述者’僅為本發明之較佳實施例而已， 申請專利範圍及發明’凡依本發明 化與…應仍屬:二内:，之簡單的等效變 知月寻利涵盍之範圍内。 200917358 【圖式簡單說明】 第1圖’係本發明使用狀態之側視剖面示意圖。 第2圖’係本發明使用狀態之俯視剖面示意圖。 第3圖’係本發明實例測試结果示意圖。 【主要元件符號說明】 電漿清潔裝置1 氣體漩流空腔1 1 氣體輸入埠1 1 1 第一電極1 2 第一絕緣層1 2 1 高壓電源裝置1 2 2 第二電極1 3 中空圓柱通道131 第二絕緣層1 3 2 絕緣間隔層1 4 磁場產生裝置15 氣體輸入緩衝空腔16 欲清潔之物件2Λ ' ' '人 Q 口 J: the effectiveness of the abuse of various shortcomings, easy to operate, and only need to clear the object placed in the plasma spray, you can achieve the effect of cleaning, continue to clean the object 'to achieve power saving and reduce The effect of cost, the production of the invention, the production of the invention can be more advanced, more practical, and more in line with the user's specialization. Please confirm that it has met the requirements of the invention patent application, and it is properly proposed according to the law. The scope of the patent application and the invention are all in the scope of the present invention. 200917358 [Simplified description of the drawings] Fig. 1 is a side cross-sectional view showing the state of use of the present invention. Fig. 2 is a schematic plan cross-sectional view showing the state of use of the present invention. Fig. 3 is a schematic view showing the test results of the examples of the present invention. [Main component symbol description] Plasma cleaning device 1 Gas swirling cavity 1 1 Gas input 埠 1 1 1 First electrode 1 2 First insulating layer 1 2 1 High voltage power supply device 1 2 2 Second electrode 1 3 Hollow cylindrical channel 131 second insulating layer 1 3 2 insulating spacer layer 1 4 magnetic field generating device 15 gas input buffer cavity 16 object to be cleaned 2