200903050 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種彩色濾光基板之製造方法，尤指一 種適用於用隔離層保護周緣電極端子之彩色濾光基板之製 5 造方法。 【先前技術】 (' 請參閱圖Ua)至1(c)，習知之液晶顯示裝置多以真空注 入液晶工法將液晶1 〇 1填充入框膠102、第一基板103、以及 10 第二基板104所構成之空槽中。由於真空注入液晶工法是利 用空槽之毛細管現象將液晶1 〇丨經由框膠i 〇2之開口 1 〇6注 入空槽中’待液晶i 〇 i填滿空槽之後，以封止劑1 〇5封閉開 口 106，再照射紫外線（UV)硬化封止劑105，藉此使液晶101 夾置於第一基板103與第二基板104之間。因此，不論是扭 15 轉向列型（twisted nematic mode, TN mode)、平面控制型 I、 （in_plane switching mode，IPS mode)、光學補償彎曲排列型 (optically compensation bend mode，OCB mode)、或垂直排 列型（vertically aligned mode，VA mode)之液晶顯示裝置， 只要採用真空注入液晶工法之液晶顯示裝置，在封止完畢 20 之液晶顯示裝置的框膠102外就會有多餘的液晶填充於第 一基板103以及第二基板104之間。所以，封止完畢之液晶 顯示裝置還需要以洗劑將框膠102外的液晶清除。 目前，常用於清洗已封止完畢之液晶顯示裝置之洗劑 為直鏈型脂肪族二醇的洗劑（Kao社的LC-841)。然而，洗劑 200903050 5 10BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of fabricating a color filter substrate, and more particularly to a method for fabricating a color filter substrate for protecting a peripheral electrode terminal with an isolation layer. [Prior Art] ('See FIGS. Ua) to 1(c), a conventional liquid crystal display device mostly fills a liquid crystal 1 〇1 into a sealant 102, a first substrate 103, and a second substrate 104 by a vacuum injection liquid crystal method. In the empty trough formed. Since the vacuum injection liquid crystal method utilizes the capillary phenomenon of the empty groove, the liquid crystal 1 注入 is injected into the empty space through the opening 1 〇6 of the frame rubber i 〇 2 'after the liquid crystal i 〇i fills the empty space, the sealing agent 1 〇 5, the opening 106 is closed, and the ultraviolet (UV) hardening stopper 105 is irradiated, whereby the liquid crystal 101 is interposed between the first substrate 103 and the second substrate 104. Therefore, whether it is twisted nematic mode (TN mode), plane control type I, (in_plane switching mode, IPS mode), optically compensated bend mode (OCB mode), or vertical alignment A liquid crystal display device of a vertically aligned mode (VA mode), as long as a vacuum injection liquid crystal display device is used, excess liquid crystal is filled on the first substrate outside the sealant 102 of the liquid crystal display device sealed 20 103 and between the second substrate 104. Therefore, the sealed liquid crystal display device also needs to remove the liquid crystal outside the sealant 102 with a lotion. At present, a lotion which is commonly used for cleaning a liquid crystal display device which has been sealed is a lotion of a linear aliphatic diol (LC-841 of Kao Corporation). However, lotion 200903050 5 10
的兩個醇基常會和液晶顯示裝置基板上的透明電極層，例 如氧化銦錫（ITO)或氧化銦鋅（IZO)，產生強大的氫鍵結合 (hydrogen bonding)，使洗劑殘留在液晶顯示裝置之基板 上。以垂直排列型之液晶顯示裝置為例（參閱圖2),彩色濾 光片201在框膠202外的透明電極層2〇3和洗劑204產生氫鍵 結合，造成洗劑204殘留在透明電極層203上。此框膠202外 的透明電極層203 —般作為液晶顯示裝置向外電性連接之 端子。因此，殘留的洗劑204經靜電電解或接觸空氣氧化為 有機酸後，就會腐蝕端子造成立即性或經時性斷路。 此外，液晶顯示裝置整個洗淨過程十，大約要花整個 洗淨時間的六分之五的時間在清除洗劑上，真正用來清洗 液晶的時間只佔整個洗淨時間的六分之一。換句話說，液 晶顯示裝置的洗淨過程消耗大部分的電力、純水、與時間 在洗劑的清除上，浪費报多時間和資源。 ^因此，曾有人揭露一種液晶顯示器及其製造方法，其 係利用真空引入的方式’使高黏度封膠37渗入液晶顯示襄 置轉34外第-基板36和第二基板33之間的間隙，以全面 緊t覆蓋整個端子部32(參閱圖3)。藉此，保護液晶顯示器 :Π32 ’避免端子腐蝕。然而，此方法需要額外的材 =黏度封膠37)以及額外的製程（真空引人方式）才能達 另外’也有揭露另—種液晶顯示裝置，其 有機黏祕於液晶顯示器外緣（框膠 = 板41和第二基板42的電極⑽仏與外界隔絕（參閱圖4)基 20 200903050 藉此，防止透明電極41a的消溶現象及抵抗濕氣。然而，此 方法同樣需要額外的材料（有機黏膠46)、以及額外的製程 (例如塗佈液狀有機黏膠46，再加熱硬化）才能達成。 因此，如何降低液晶顯示器端子腐蝕的發生，並且不 5會增加額外的材料以及製程，實為目前亟待解決之課題。 【發明内容】 (' 為解決上述問題，本發明於彩色濾光基板之周緣形成 1 =隔離層以保護透明電極層所形成的電極端子，藉此避免 10 ^劑和透明電極層（例如ITO層）接觸而形成氫鍵結合，進而 造成電極端子腐蝕。並且，該隔離層可與顯示裝置之間隔 物（spacer)或垂直酉己向型顯示襄置之凸塊（bump)同時形成， 故可避免增加額外的材料或製程。 f發明提供一種彩色濾光基板之製造方法，其步驟包 15括：提供一基板’該基板上包含一遮光層、一滤光層及一 冑明電極層；塗佈—第-光阻層於該基板上；以及圖案化 ’ 豸第-光阻層’以同時形成複數間隔物與一隔離層。 在本發明之製造方法中，該些間隔物是用以支樓顯示 f置之兩相對基板之間的間隙。該些間隔物之位置不限 佳係位於該遮光層上方。該隔離層係位於該基板之 ° 以保護位於該基板周緣之電極端子。 在本發明之製造方法中，由於該隔離層與該 同時形成’，該隔離層的高度與材料均會和該些間隔物 200903050 在本發明之製造方法中，該濾光層之位置不限定，# 佳，該遽光層與該遮光層位於該基板上，且該透明電極声乂 覆盍於該遮光層、該濾光層以及部分之該基板上。 s 在本發明之製造方法中，於塗佈該第一光阻層之亇， 可選擇性的包括··於該基板上方塗佈—第二光阻層，再圖 案化該第二光阻層，使該第二光阻層形成複數位於該透明 電極層上方之凸塊’且該凸塊之高度小於該隔離層。此 塊之位置不限定’較佳為位於透明電極上方， 該濾光層上方。 万、 —在本發明之製造方法中，該隔離層所形成之圖案不限 定’較佳㈣成-圍繞於該基板之周緣的密閉圖案。並且， 該隔離層可填滿或不填滿圍繞於該基板之周緣，較 滿該基板之周緣。該隔離層之材料可為任何感光性材料，、 較佳為疏水性之感光材料。 15 纟本發明之製造方法中’該透明電極之材料不限定， 較佳為氧化銦錫或氧化銦鋅。 在本發明之製造方法中，由於該些間隔物與該 Z用微影印刷製程咖Gg吻㈣叫同時形成，㈣ 隔離C製造方法不需要額外的的材料以及製程來形成該 本發明之製造方法所形成 何採用真空注入液晶工法之液 型、平面控制型、光學補償彎 液晶顯示裝置。 之彩色濾光基板可適用於任 晶顯示裝置，例如扭轉向列 曲排列型、或垂直排列型之 20 200903050 此外本發月提供另—種適用於垂直排列型顯示裝置 之彩色遽光基板之製造方法，其步驟包括：提供—基板， 該基板上包含一遮光層、-遽光層及-透明電極層；塗佈 -第-光阻層於該基板上’·以及圖案化該第—光阻層，以 同時形成複數凸塊與一隔離層。 10 15The two alcohol groups often form a transparent electrode layer on the substrate of the liquid crystal display device, such as indium tin oxide (ITO) or indium zinc oxide (IZO), which generates strong hydrogen bonding, leaving the lotion on the liquid crystal display. On the substrate of the device. Taking a vertical alignment type liquid crystal display device as an example (refer to FIG. 2), the color filter 201 generates a hydrogen bond between the transparent electrode layer 2〇3 outside the sealant 202 and the lotion 204, causing the lotion 204 to remain on the transparent electrode. On layer 203. The transparent electrode layer 203 outside the sealant 202 is generally used as a terminal for electrically connecting the liquid crystal display device to the outside. Therefore, after the residual lotion 204 is oxidized to an organic acid by electrostatic electrolysis or contact with air, the terminal is corroded to cause an immediate or time-dependent disconnection. In addition, the entire cleaning process of the liquid crystal display device is about ten-fifths of the entire cleaning time on the cleaning agent, and the time for actually cleaning the liquid crystal is only one-sixth of the total cleaning time. In other words, the cleaning process of the liquid crystal display device consumes most of the power, pure water, and time to remove the lotion, wasting time and resources. Therefore, there has been disclosed a liquid crystal display and a method of manufacturing the same, which utilizes a vacuum introduction method to cause a high-viscosity sealant 37 to infiltrate a gap between the first substrate 36 and the second substrate 33 outside the liquid crystal display device turn 34. The entire terminal portion 32 is covered with a full tightness t (see Fig. 3). In this way, protect the liquid crystal display: Π32 ‘to avoid terminal corrosion. However, this method requires additional material = viscosity seal 37) and an additional process (vacuum inductive way) to reach the other 'also reveal another liquid crystal display device, which is organically attached to the outer edge of the liquid crystal display (frame glue = The electrode (10) of the board 41 and the second substrate 42 is isolated from the outside (see Fig. 4). Base 20 200903050 Thereby, the dissolution of the transparent electrode 41a and the prevention of moisture are prevented. However, this method also requires an additional material (organic adhesive) 46), and an additional process (such as coating liquid organic adhesive 46, then heat hardening) can be achieved. Therefore, how to reduce the corrosion of the liquid crystal display terminal, and will not add additional materials and processes, it is currently SUMMARY OF THE INVENTION [In order to solve the above problems, the present invention forms 1 = isolation layer on the periphery of the color filter substrate to protect the electrode terminal formed by the transparent electrode layer, thereby avoiding 10 ^ agent and transparent electrode A layer (for example, an ITO layer) contacts to form a hydrogen bond, thereby causing corrosion of the electrode terminal, and the spacer layer can be spaced apart from the display device. Or the vertical bumps of the display device are formed at the same time, so that additional materials or processes can be avoided. The invention provides a method for manufacturing a color filter substrate, and the step package 15 includes: providing a substrate. The substrate comprises a light shielding layer, a filter layer and a coating electrode layer; a coating-first photoresist layer on the substrate; and a patterned '豸-thresist layer' to simultaneously form a plurality of spacers and In the manufacturing method of the present invention, the spacers are used to display the gap between the two opposite substrates of the f. The spacers are not limited to being located above the light shielding layer. The isolation layer is located at the substrate to protect the electrode terminals located at the periphery of the substrate. In the manufacturing method of the present invention, since the isolation layer is formed at the same time, the height and material of the isolation layer and the spacers In the manufacturing method of the present invention, the position of the filter layer is not limited, preferably, the light-emitting layer and the light-shielding layer are located on the substrate, and the transparent electrode is acoustically covered on the light-shielding layer, and the filter is Layer and part On the substrate, in the manufacturing method of the present invention, after coating the first photoresist layer, the second photoresist layer may be selectively coated on the substrate, and then patterned. The second photoresist layer is formed such that the second photoresist layer forms a plurality of bumps located above the transparent electrode layer and the height of the bump is smaller than the isolation layer. The position of the block is not limited to being preferably above the transparent electrode. Above the filter layer. In the manufacturing method of the present invention, the pattern formed by the spacer layer does not define a sealing pattern that is preferably (four) formed around the periphery of the substrate. Moreover, the isolation layer can be filled. The periphery of the substrate may be filled or not filled to fill the periphery of the substrate. The material of the isolation layer may be any photosensitive material, preferably a hydrophobic photosensitive material. 15 In the manufacturing method of the present invention The material of the transparent electrode is not limited, and is preferably indium tin oxide or indium zinc oxide. In the manufacturing method of the present invention, since the spacers are formed simultaneously with the Z lithography printing process, the (4) isolation C manufacturing method does not require additional materials and processes to form the manufacturing method of the present invention. A liquid type, planar control type, optical compensation curved liquid crystal display device using a vacuum injection liquid crystal method is formed. The color filter substrate can be applied to any crystal display device, such as a twisted nematic arrangement type or a vertical alignment type. 200903050 In addition, this month provides another color tantalum substrate suitable for vertical alignment type display devices. The method includes the steps of: providing a substrate, the substrate comprising a light shielding layer, a light-emitting layer and a transparent electrode layer; coating a first-photo-resist layer on the substrate; and patterning the first photoresist a layer to simultaneously form a plurality of bumps and an isolation layer. 10 15
在本發明之製造方法中，該些凸塊是用以改變液晶分 子之傾斜角度’使填充於液晶顯示裝置内之液晶分子產生 不同的預傾角，幫助液晶顯示裝置呈現廣視角。該些凸塊 之位置不限定’較佳係位於該濾光層上方。該隔離層係位 於該基板之周緣，以保護位於該基板周緣之電極端子。 在本發明之製造方法中，由於該隔離層與該些凸塊係 同時形成，故該隔離層的高度與材料均會和 /' 在本發明之製造方法中，該滤光層之位置不 佳2該遮光層與該遽光層位於該基板上，且該透明電極層 覆蓋於該遮光層、該濾光層以及部分之該基板上。 在本發明之製造方法中，於圖案化該第一光阻層之 後γ更包括：於該基板上方塗佈一第二光阻層，再圖案化 該第二光阻層，使該第二光阻層形成複數位於該遮光層上 方之間隔物’且該些間隔物之高度大於該隔離層。 在本發明之製造方法中，該隔離層所形成之圖案不限 疋，較佳為形成一圍繞於該基板之周緣的密閉圖案。並且， 該隔離層可填滿或不填滿圍繞於該基板之周緣，較佳為填 滿該基板之周緣。該隔離層之材料可為任何感光性材料， 車父佳為疏水性之感光材料。 20 200903050 在本發明之製造方法中，該透明電極之材料不限定， 交佳為氧化鋼锡或氧化銦辞。 ^本發月之I造方法中，由於該隔離層與該些凸塊可 亚用微W印刷製程同時形成’因此本發明之製造方法不需 要額外的的材料以及製程來形成該隔離層。In the manufacturing method of the present invention, the bumps are used to change the tilt angle of the liquid crystal molecules to cause different liquid crystal molecules filled in the liquid crystal display device to have different pretilt angles, thereby helping the liquid crystal display device to exhibit a wide viewing angle. The positions of the bumps are not limited to being preferably located above the filter layer. The spacer layer is located on the periphery of the substrate to protect the electrode terminals located at the periphery of the substrate. In the manufacturing method of the present invention, since the isolation layer is formed simultaneously with the bumps, the height and material of the isolation layer may be in the manufacturing method of the present invention, and the position of the filter layer is not good. 2 The light shielding layer and the light-emitting layer are located on the substrate, and the transparent electrode layer covers the light shielding layer, the filter layer and a portion of the substrate. In the manufacturing method of the present invention, after patterning the first photoresist layer, γ further comprises: coating a second photoresist layer over the substrate, and patterning the second photoresist layer to make the second light The resist layer forms a plurality of spacers located above the light shielding layer and the height of the spacers is greater than the isolation layer. In the manufacturing method of the present invention, the pattern formed by the spacer layer is not limited, and it is preferable to form a hermetic pattern surrounding the periphery of the substrate. Also, the spacer layer may or may not fill the periphery of the substrate, preferably filling the periphery of the substrate. The material of the isolation layer can be any photosensitive material, and the father is a hydrophobic photosensitive material. 20 200903050 In the manufacturing method of the present invention, the material of the transparent electrode is not limited, and the intersection is preferably oxidized steel tin or indium oxide. In the method of manufacturing the present invention, since the spacer layer and the bumps can be simultaneously formed by the microW printing process, the manufacturing method of the present invention does not require additional materials and processes to form the spacer layer.
【實施方式J *本發明之實施例中該等圖式均為簡化之示意圖。惟該 j圖Γ僅顯示與本發明有關之元件，其所顯示支元件非為 1〇 3際貫施時之態樣’其實際實施時之元件數目、形狀等比 例為-選擇性之設計’且其元件佈局型態可能更複雜。 實施例1 15[Embodiment J * These drawings are simplified schematic views in the embodiments of the present invention. However, the figure only shows the elements related to the present invention, and the displayed branch elements are not in the form of a '3 interval. 'The number and shape of the components in the actual implementation are -selective design' And its component layout type may be more complicated. Example 1 15
百先’請參閱圖5,為本發明_較佳實施例之液晶顯示 裝置剖面示意圖。如圖5所示，本實施例之液晶顯示裝置主 要包括一第-基板50卜一第二基板5〇2、一框膠5〇3、一隔 離層504以及-液晶層5〇5。此棺膠5〇3係夾置於第一基板 5〇1與第二基板5〇2之間，且形成—密閉圖案，用以容置液 晶層505。此液晶層5G5，係'夾置於第—基板5〇ι與第二基板 502之間。至於隔離層5帽設置於第_基板測之周㈣且 位於該框膠503外，以保護位於第—基板5〇1周緣之透 極層5 11 (即電極端子）。 本實施例之隔離層504係形成於第一基板5〇1，並盘複 數間隔物506同時形成。請參閱圖6(a)至圖6⑷為第一基板 501之製造方法剖面示意圖。請參閱圖6(幻，首先，提供一 20 200903050 第一基板50卜此第一基板5〇1之表面包括有一紅色濾光層 5〇7、一藍色濾光層5〇8、一綠色濾光層5〇9、一遮光層 =及-透明電極層511。該遮光層為黑色，其材料為絡或是 树脂，用以遮蔽漏光。該透明電極層511係位於濾光層Μ?、 5 5〇8、509以及遮光層510表面，用以作為液晶顯示裝置的共 同電極。並且該透明電極層511向外延伸至第一基板5〇1周 緣，用以作為液晶顯示裝置的電極端子。在本實施例中， 該透明電極層5 11之材料為氧化銦錫（IT〇)。 【 接著，如圖6(b)所示，在透明電極層511上塗佈一第一 10光阻層（圖中未示），再對該第一光阻層進行曝光顯影以圖案 化該第一光阻層，使該第一光阻層形成複數凸塊512，用以 幫助液晶顯示裝置呈現廣視角。在本實施例中，該些凸塊 分別位濾光層507、508以及509之上方。 然後，於第一基板501上全面性塗佈一第二光阻層（圖 15中未示）’再對該第二光阻層進行曝光與顯影以圖案化該第 一光阻層，使該第二光阻層形成複數間隔物5〇6以及一隔離 層504 ’其結構如圖6⑷所示。請參閱圖6(c)，在本實施例 中°亥些間隔物506位於遮光層51 〇上方，以避免影響液晶 顯示裝置之亮度。該隔離層504位於第一基板5〇1之周緣， 20並且填滿該第一基板5〇1之周緣而形成一密閉圖案，藉此保 護位於第一基板501周緣的透明電極51卜在本實施例中， 該些間隔物506與該隔離層504之材料相同。本實施例之該 些間隔物506與該隔離層5G4之材料均為感光性樹脂，此材 11 200903050 料可為聚甲基丙婦酸甲g旨（Polyfmethyl methacrylate))或紛 藤樹脂（Navolac)。該些凸塊512之材料為感光性樹脂。 本實施例之該些間隔物506以及該隔離層504的高度相 同而且材料相同。該間隔物5〇6是用以支撐第一基板5〇1和 5 第二基板502之間的間隙。並且，由於間隔物506和第一基 板501之間還層疊有透明電極層5U、濾光層5〇7、5〇8、5〇9 以及遮光層5 10 ’因此’在本實施例中，隔離層5〇4的高度 會小於第一基板501和第二基板5〇2之間的間隙高度。此間 隙高度約等於框膠503的高度。 10 本實施例之第二基板502為主動式陣列基板，其包括有 複數薄膜電晶體5 14。將該第二基板502與該第一基板50 i組 立之後，以真空注入液晶工法（參閱圖1 (a)至1 (c))將液晶填 充於第一基板501和第二基板502之間並封止完畢，形成一 液晶層505。最後，以洗劑去除殘留於框膠5〇3外的液晶， 15即可得到如圖5所示之液晶顯示裝置。本實施例採用之洗劑 516為直鏈型脂肪族二醇的洗劑（Kao社的LC-841)。 因此，如圖5所示，洗劑516和透明電極層511之間隔著 隔離層504，使洗劑516和透明電極層511無法產生氫鍵結 σ而且，由於洗劑5 1 6為親水性材料，而隔離層504為疏 20 水性材料，使得洗劑516無法附著於第一基板5〇1，且更容 易被清洗乾淨。 因此，藉由形成隔離層504,本實施例之液晶顯示裝置 可避免殘留的洗劑516經靜電電解或接觸空氣氧化為有機 酸後，腐蝕透明導電層511造成立即性或經常性斷路。並 12 200903050 且’可減少液晶顯示裝置之整個洗淨過程中，清除洗劑川 的電力、純水、與時間。再者，本實施例之隔離層504是在 形成間隔物5G6時-併形成’因此不需要增加額外的材 製程來形成隔離層5〇4。 5 f' \ 10 15 o 20 本實施例之液晶顯示裝置為VA型之液晶顯示裝置，但 此實施例僅為說明之用，並非限定於此。 — 實施例2 本實施例之液晶顯示裝置以及形成方法與實施例工大 致相同’㊉了隔離層是與凸塊同時形成，且隔離層與凸塊 的材料和高度均相同。 百先，請參閱圖7，為本發明實施例2之液晶顯示裝置 剖面示意圖。如圖7所示，本實施例之液晶顯示裝置主要包 括第基板801、一第二基板802、一框膠803、一隔離層 8〇4、以及一液晶層8〇5。此框膠8〇3係夾置於第—基板8〇1 與第二基板802之間，且形成一密閉圖案，用以容置液晶。 匕液aa層805 ’係夹置於第一基板8〇1與第二基板之間。 =隔離層804，則言免置於第一基板801之周、緣並且位於該框 膠803外以保護位於第一基板801周緣之透明電極層 811(即電極端子）。 本實施例之隔離層804係形成於第一基板8〇1，並與複 數凸塊812同時形成。圖8⑷至圖8(e)為第―基板8()1之製造 方法剖面示意圖。請參閱圖8(a)n提供—第一基板 801此第基板801之表面包括有一紅色濾光層8〇7、一藍 色濾光層808、一綠色濾光層8〇9、—遮光層81〇、以及一透 13 200903050 明電極層811。該遮光層為黑色，其材料為鉻或是樹脂，用 以遮蔽漏光。該透明電極層811係位於濾光層8〇7、8〇8、8〇9 以及遮光層810表面，用以作為液晶顯示裝置的共同電極並 向外延伸形成液晶顯示裝置的電極端子。在本實施例中， 5該透明電極層811之材料為氧化銦錫（IT〇)。 接著，在透明電極層811全面性塗佈一第一光阻層（圖 中未不）’再對該第一光阻層進行曝光與顯影以圖案化該第 一光阻層，使該第一光阻層形成複數凸塊812以及一隔離層 8〇4，其結構如圖8(b)所示。在本實施例中，該些凸塊812 10與該隔離層804之材料相同。本實施例之該些凸塊812與該 隔離層804之材料均為感光性樹脂，此材料可為聚甲基丙稀 酸甲醋（Poly(methyl methacrylate))或紛駿樹脂（Nav〇lac)。 在本實施例中，由於凸塊812以及隔離層8〇4係同時形 成，因此兩者的高度相同。在本實施例中，凸塊812位於濾 15光層8〇7、808以及8〇9上方，用以幫助液晶顯示裝置呈現廣 視角。隔離層804填滿第一基板8〇1之周緣而形成一密閉圖 Ο 案，用以保護位於第一基板801周緣的透明電極811。 隨之，如圖8(c)所示，於第一基板8〇1上塗佈一第二光 阻層（圖中未示），再對該第二光阻層進行曝光與顯影以圖案 20化畫該第二光阻層，使該第二光阻層形成形成複數間隔物 8〇6，用以支撐第一基板8〇1和第二基板8〇2之間的間隙。此 間隔物可為非光阻型間隔物，例如Si〇2或者是光阻型間隔 物。在本實施例中，間隔物8〇6為光阻型間隔物，其材料為 14 200903050 感光性樹脂。並且，在本實施例中，隔離層8〇4的高度會小 於框膠803的高度。 本貫施例之第二基板與實施例1相同，在此不再贅述。 將§亥第一基板802與該第一基板go 1組立之後，以真空注入 5液晶工法（參閱圖Ua)至1(c))將液晶填充於第一基板801和 第二基板802之間並封止完畢，形成一液晶層8〇5。最後， 以洗劑去除殘留於框膠8〇3外的液晶，即可得到，就會形成 如圖7所示之液晶顯示裝置。本實施例採用之洗劑為為直鏈 型知肪族一醇的洗劑（Kao社的LC-841)。 10 因此，如圖7所示，洗劑816和透明電極層811之間隔著 隔離層804，使洗劑816和透明電極層811無法產生氫鍵結 合。而且，由於洗劑816為親水性材料，而隔離層8〇4為疏 水性材料，使得洗劑816無法附著於第一基板8〇1，而更容 易被清洗乾淨。 15 因此，藉由形成隔離層804’本實施例之液晶顯示裝置 可避免殘留的洗劑816經靜電電解或接觸空氣氧化為有機 〇 酸後，腐蝕透明導電層811造成立即性或經時性斷路。並 且，可減少液晶顯示裝置整個洗淨過程中清除洗劑的電 力、純水、與時間。再者，本實施例之隔離層8〇4是在形Referring to Figure 5, there is shown a cross-sectional view of a liquid crystal display device according to a preferred embodiment of the present invention. As shown in FIG. 5, the liquid crystal display device of the present embodiment mainly includes a first substrate 50, a second substrate 5, a mask 5, a spacer layer 504, and a liquid crystal layer 5?. The silicone 5〇3 is sandwiched between the first substrate 5〇1 and the second substrate 5〇2, and is formed in a hermetic pattern for accommodating the liquid crystal layer 505. The liquid crystal layer 5G5 is sandwiched between the first substrate 5'' and the second substrate 502. The spacer layer 5 is disposed on the circumference (4) of the first substrate and located outside the sealant 503 to protect the polarizing layer 5 11 (i.e., the electrode terminal) located on the periphery of the first substrate 5〇1. The isolation layer 504 of this embodiment is formed on the first substrate 5〇1, and the plurality of spacers 506 are simultaneously formed. 6(a) to 6(4) are schematic cross-sectional views showing a manufacturing method of the first substrate 501. Please refer to FIG. 6 (phantom, first, provide a 20 200903050 first substrate 50. The surface of the first substrate 5〇1 includes a red filter layer 5〇7, a blue filter layer 5〇8, and a green filter. The light layer 5〇9, a light shielding layer=and-the transparent electrode layer 511. The light shielding layer is black, and the material is a layer or a resin for shielding light leakage. The transparent electrode layer 511 is located in the filter layer 、?, 5 5〇8, 509 and the surface of the light shielding layer 510 are used as a common electrode of the liquid crystal display device, and the transparent electrode layer 511 extends outward to the periphery of the first substrate 5〇1 as an electrode terminal of the liquid crystal display device. In this embodiment, the material of the transparent electrode layer 511 is indium tin oxide (IT〇). [Next, as shown in FIG. 6(b), a first 10 photoresist layer is coated on the transparent electrode layer 511 ( The first photoresist layer is exposed and developed to pattern the first photoresist layer, so that the first photoresist layer forms a plurality of bumps 512 for helping the liquid crystal display device to exhibit a wide viewing angle. In this embodiment, the bumps are respectively above the filter layers 507, 508 and 509. Then, Applying a second photoresist layer (not shown in FIG. 15) on the first substrate 501, and then exposing and developing the second photoresist layer to pattern the first photoresist layer to make the second The photoresist layer forms a plurality of spacers 5〇6 and an isolation layer 504', and its structure is as shown in FIG. 6(4). Referring to FIG. 6(c), in the present embodiment, the spacers 506 are located above the light shielding layer 51. In order to avoid affecting the brightness of the liquid crystal display device, the isolation layer 504 is located on the periphery of the first substrate 510, and fills the periphery of the first substrate 510 to form a sealed pattern, thereby protecting the first substrate 501. In the present embodiment, the spacers 506 are the same as the material of the spacer layer 504. The spacers 506 and the spacer layer 5G4 of the embodiment are all photosensitive resins. 11 200903050 The material may be Polyfmethyl methacrylate or Navalac. The material of the bumps 512 is a photosensitive resin. The spacers 506 and the spacer layer 504 of this embodiment have the same height and the same material. The spacer 5〇6 is for supporting a gap between the first substrate 5〇1 and the second substrate 502. Moreover, since the transparent electrode layer 5U, the filter layers 5〇7, 5〇8, 5〇9, and the light shielding layer 5 10′′ are also laminated between the spacer 506 and the first substrate 501, in this embodiment, the isolation is performed. The height of the layer 5〇4 may be smaller than the gap height between the first substrate 501 and the second substrate 5〇2. This gap height is approximately equal to the height of the sealant 503. The second substrate 502 of this embodiment is an active array substrate including a plurality of thin film transistors 514. After the second substrate 502 is assembled with the first substrate 50 i, the liquid crystal is filled between the first substrate 501 and the second substrate 502 by a vacuum injection liquid crystal method (see FIGS. 1( a ) to 1 ( c )). After the sealing is completed, a liquid crystal layer 505 is formed. Finally, the liquid crystal remaining outside the frame rubber 5〇3 is removed by a lotion to obtain a liquid crystal display device as shown in FIG. The lotion 516 used in this embodiment is a lotion of a linear aliphatic diol (LC-841 of Kao Corporation). Therefore, as shown in FIG. 5, the spacer 504 is interposed between the lotion 516 and the transparent electrode layer 511, so that the detergent 516 and the transparent electrode layer 511 cannot generate hydrogen bonding σ and since the lotion 5 16 is a hydrophilic material. The spacer layer 504 is a water-repellent material, so that the lotion 516 cannot adhere to the first substrate 5〇1 and is more easily cleaned. Therefore, by forming the spacer layer 504, the liquid crystal display device of the present embodiment can prevent the residual lotion 516 from being oxidized to an organic acid by electrostatic electrolysis or contact with air, and corroding the transparent conductive layer 511 to cause immediate or frequent disconnection. And 12 200903050 can reduce the power, pure water, and time of the lotion in the entire cleaning process of the liquid crystal display device. Further, the spacer layer 504 of the present embodiment is formed when the spacer 5G6 is formed - and thus does not require an additional material process to form the spacer layer 5?. 5 f' \ 10 15 o 20 The liquid crystal display device of the present embodiment is a VA type liquid crystal display device, but this embodiment is for illustrative purposes only and is not limited thereto. - Embodiment 2 The liquid crystal display device and the forming method of the present embodiment are substantially the same as those of the embodiment. The ten isolation layer is formed simultaneously with the bump, and the material and height of the spacer layer and the bump are the same. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 7 is a cross-sectional view showing a liquid crystal display device according to Embodiment 2 of the present invention. As shown in FIG. 7, the liquid crystal display device of the present embodiment mainly includes a first substrate 801, a second substrate 802, a sealant 803, an isolation layer 8〇4, and a liquid crystal layer 8〇5. The frame glue 8〇3 is sandwiched between the first substrate 8〇1 and the second substrate 802, and forms a sealed pattern for accommodating the liquid crystal. The sputum aa layer 805' is sandwiched between the first substrate 8〇1 and the second substrate. The spacer layer 804 is disposed on the periphery and edge of the first substrate 801 and outside the mask 803 to protect the transparent electrode layer 811 (i.e., the electrode terminal) located at the periphery of the first substrate 801. The isolation layer 804 of this embodiment is formed on the first substrate 8〇1 and formed simultaneously with the plurality of bumps 812. 8(4) to 8(e) are schematic cross-sectional views showing a manufacturing method of the first substrate 8(). Please refer to FIG. 8( a ) n. The first substrate 801 has a red filter layer 8〇7, a blue filter layer 808, a green filter layer 8〇9, and a light shielding layer. 81〇, and a through 13 200903050 bright electrode layer 811. The light-shielding layer is black and its material is chromium or resin to shield light leakage. The transparent electrode layer 811 is located on the surfaces of the filter layers 8〇7, 8〇8, 8〇9 and the light shielding layer 810, and serves as a common electrode of the liquid crystal display device and extends outward to form an electrode terminal of the liquid crystal display device. In this embodiment, the material of the transparent electrode layer 811 is indium tin oxide (IT〇). Next, a transparent layer 811 is uniformly coated with a first photoresist layer (not shown). The first photoresist layer is exposed and developed to pattern the first photoresist layer to make the first The photoresist layer forms a plurality of bumps 812 and an isolation layer 8〇4, and its structure is as shown in FIG. 8(b). In this embodiment, the bumps 812 10 are the same material as the isolation layer 804. The materials of the bumps 812 and the spacer layer 804 in this embodiment are all photosensitive resins, and the material may be poly(methyl methacrylate) or Nav〇lac. . In the present embodiment, since the bump 812 and the spacer layer 8〇4 are simultaneously formed, the heights of the two are the same. In the present embodiment, the bumps 812 are located above the filter layers 8〇7, 808 and 8〇9 to help the liquid crystal display device to exhibit a wide viewing angle. The isolation layer 804 fills the periphery of the first substrate 〇1 to form a hermogram for protecting the transparent electrode 811 located on the periphery of the first substrate 801. Then, as shown in FIG. 8(c), a second photoresist layer (not shown) is coated on the first substrate 8〇1, and the second photoresist layer is exposed and developed to form a pattern 20. The second photoresist layer is patterned such that the second photoresist layer is formed to form a plurality of spacers 8〇6 for supporting a gap between the first substrate 8〇1 and the second substrate 8〇2. The spacer may be a non-resistive spacer such as Si〇2 or a photoresist spacer. In the present embodiment, the spacer 8〇6 is a photoresist type spacer, and the material thereof is 14 200903050 photosensitive resin. Also, in the present embodiment, the height of the spacer layer 8〇4 is smaller than the height of the sealant 803. The second substrate of the present embodiment is the same as that of Embodiment 1, and will not be described herein. After the first substrate 802 is assembled with the first substrate go 1 , the liquid crystal is filled between the first substrate 801 and the second substrate 802 by a vacuum injection 5 liquid crystal method (see FIGS. Ua to 1 (c)). After the sealing is completed, a liquid crystal layer 8〇5 is formed. Finally, the liquid crystal remaining outside the frame rubber 8 is removed by a lotion, and a liquid crystal display device as shown in Fig. 7 is formed. The lotion used in this embodiment is a lotion of a linear type of aliphatic alcohol (LC-841 of Kao Corporation). Therefore, as shown in Fig. 7, the spacer 804 is interposed between the lotion 816 and the transparent electrode layer 811, so that the lotion 816 and the transparent electrode layer 811 cannot be hydrogen-bonded. Moreover, since the lotion 816 is a hydrophilic material and the release layer 8〇4 is a hydrophobic material, the lotion 816 cannot be attached to the first substrate 8〇1, and is more easily cleaned. Therefore, by forming the isolation layer 804', the liquid crystal display device of the embodiment can prevent the residual detergent 816 from being oxidized to the organic bismuth acid by electrostatic electrolysis or contact air, and corroding the transparent conductive layer 811 to cause immediate or time-dependent disconnection. . Moreover, the power, pure water, and time for removing the lotion during the entire cleaning process of the liquid crystal display device can be reduced. Furthermore, the isolation layer 8〇4 of the embodiment is in the shape
20凸塊812時一併形成，因此不需要增加額外的材料或製程 形成隔離層804。 A 上述實施例僅係為了方便說明而舉例而已，本發明 主張之權利範圍自應以申請專利範圍所述為準，而非僅限 15 200903050 【圖式簡單說明】 圖1係習知之真空注入液晶工法示意圖。 圖2係習知之液晶顯示裝置剖視示意圖。 5 圖3係習知之液晶顯示裝置剖視示意圖。 圖4係習知之液晶顯示裝置剖視示意圖。 圖5係本發明一較佳實施例之液晶顯示裝置剖視示意圖。 圖6係本發明一較佳實施例之液晶顯示裝置用第一基板之 製造方法剖視示意圖。 10 圖7係本發明另一較佳實施例之液晶顯示裝置剖視示意圖。 圖8係本發明另一較佳實施例之液晶顯示裝置用第一基板 之製造方法剖視示意圖。 【主要元件符號說明】 15 端子部3 2The 20 bumps 812 are formed together, so that no additional material or process is required to form the isolation layer 804. The above embodiments are merely examples for convenience of description, and the scope of the claims should be based on the scope of the patent application, and not limited to 15 200903050 [Simplified description of the drawings] FIG. 1 is a conventional vacuum injection liquid crystal. Schematic diagram of the method. 2 is a schematic cross-sectional view showing a conventional liquid crystal display device. 5 is a schematic cross-sectional view of a conventional liquid crystal display device. 4 is a schematic cross-sectional view showing a conventional liquid crystal display device. Figure 5 is a cross-sectional view showing a liquid crystal display device in accordance with a preferred embodiment of the present invention. Figure 6 is a cross-sectional view showing a method of manufacturing a first substrate for a liquid crystal display device according to a preferred embodiment of the present invention. 10 is a cross-sectional view showing a liquid crystal display device according to another preferred embodiment of the present invention. Figure 8 is a cross-sectional view showing a method of manufacturing a first substrate for a liquid crystal display device according to another preferred embodiment of the present invention. [Main component symbol description] 15 Terminal section 3 2
第二基板33、42、104、502、802 框膠34、43、102、202、503、803 第一基板36、41、103、5(Π、801 高黏度封膠37 有機黏膠46 封止劑105 彩色濾光片201 洗劑 204、516、816 電極 41 a、42a 液晶101 開口 106 透明電極層203、511、811 隔離層504、804 16 200903050 液晶層505、805 紅色濾光層507、807 綠色濾光層509、809 凸塊 5 12、8 12 間隔物506、806 藍色濾光層508、808 遮光層510、810 薄膜電晶體514Second substrate 33, 42, 104, 502, 802 frame glue 34, 43, 102, 202, 503, 803 first substrate 36, 41, 103, 5 (Π, 801 high viscosity sealant 37 organic adhesive 46 sealed Agent 105 color filter 201 lotion 204, 516, 816 electrode 41 a, 42a liquid crystal 101 opening 106 transparent electrode layer 203, 511, 811 isolation layer 504, 804 16 200903050 liquid crystal layer 505, 805 red filter layer 507, 807 Green filter layer 509, 809 bump 5 12, 8 12 spacer 506, 806 blue filter layer 508, 808 light shielding layer 510, 810 thin film transistor 514
U 17U 17