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TW200902644A - Ink-jet ink - Google Patents

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Publication number
TW200902644A
TW200902644A TW097110816A TW97110816A TW200902644A TW 200902644 A TW200902644 A TW 200902644A TW 097110816 A TW097110816 A TW 097110816A TW 97110816 A TW97110816 A TW 97110816A TW 200902644 A TW200902644 A TW 200902644A
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TW
Taiwan
Prior art keywords
group
formula
ink
acid
bis
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TW097110816A
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Chinese (zh)
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TWI432531B (en
Inventor
Shinsuke Hanafusa
Takayuki Hattori
Kaori Eguchi
Tomotsugu Furuta
Tomoaki Shimizu
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Chisso Corp
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Publication of TW200902644A publication Critical patent/TW200902644A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/106Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Ink Jet (AREA)

Abstract

An ink-jet ink for forming thicker polyimide film (no less then 1 μm) by inkjetting one time is provided. This invention is related to an ink-jet ink including: selecting from a silicon compound (A) obtained by a compound (a1) having no less than 2 acid anhydride groups and a monoamine (a2), and a silicon compound (A') obtained by a compound (a1') having an acid anhydride group and a diamine (a2')

Description

200902644 27225pif 九、發明說明: 【發明所屬之技術領域】 本發明是關於一種噴墨用墨水,是關於一種含有例如 電子零件製作中用以形成絕緣膜層之矽化合物(A)以及/ 或者石夕化合物(A,)的噴墨用墨水、使用該喷墨用墨水而 形成的聚醯亞胺膜、以及形成有該聚醯亞胺膜的薄膜基 板、具有該薄膜基板的電子零件。 < 【先前技術】 聚醯亞胺之耐熱性、電絕緣性優異,因此是廣泛用於 電子通訊領域的材料[例如,參照日本專利特開 2000-039714號公報、日本專利特開2003-238683號公報、 曰本專利特開2004-094118號公報]。 於將聚醯亞胺用作所需之圖案膜之情形時,先前通常 是使用蝕刻(etching)或者感光性聚醯亞胺來形成圖案, 而近年來正研究一種藉由噴墨來形成所需圖案膜的方法。 本領域技術人員提出有各種喷墨用墨水[例如,參照日 、 本專利特開2003-213165號公報、日本專利特開 2006-131730號公報]’於製備聚醯亞胺系喷墨墨水時,因 聚酸亞胺系墨水是較為高分子的墨水,故而為了製備最適 合之黏度的墨水作為贺墨墨水’必須增加溶劑之比例且減 少墨水中之聚醯胺酸含量。而如此一來,存在噴墨丨次戶 得之膜的厚度變薄的問題。 人 另一方面,已知若矽醢胺酸化合物(矽烧偶合劑)與 環氣樹脂、酴樹脂併用,則由於與金屬發生反應或者开〈成 200902644 錯合物,故而膜的密著 resistance)提高[例如,爰日知幵,耐焊裂性(soIder crack 公報〗。 $照日本專利特開2003-105059號 於上述狀況下,謀忐 較厚之聚醯亞射(噴出)1讀可形成 【發明内容】 的噴墨用墨水。 化合述狀況,發現-種含有至少-财 墨水、進而含種魏合物(A')的嘴墨用 八古合物(B)的喷墨用墨水、進而 (C ^ ^ 恭贺气用墨水、進而含有溶劑(D)的喷墨用墨水。 本發明k供如下所述之噴墨用墨水等。 Π]-種噴墨用墨水’其含有:選自使用具有大於等於 個之酸酐基之化合物(al)與單胺(a2)而獲得的石夕化 合物(A)、以及使用具有丨個酸酐基之化合物(ar)與二 胺(a2’)而獲得的矽化合物(A,)中的至少一種。/、一 [2]如上述第[1]項所述之噴墨用墨水,其中具有大於等 於2個之酸酐基之化合物(al)為下述通式(1)所表/、、 四羧酸二酐,單胺(a2)為下述通式(2)所表示之 化合物, [化 16]BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inkjet ink, relating to a bismuth compound (A) and/or a stone eve for forming an insulating film layer in, for example, electronic component fabrication. An inkjet ink of the compound (A), a polyimide film formed using the inkjet ink, a film substrate on which the polyimide film is formed, and an electronic component including the film substrate. <Prior Art> Polyimine is excellent in heat resistance and electrical insulation, and is therefore widely used in the field of electronic communication [for example, see Japanese Patent Laid-Open Publication No. 2000-039714, Japanese Patent Laid-Open No. 2003-238683 Japanese Patent Laid-Open Publication No. 2004-094118. In the case where polyimine is used as a desired pattern film, it is conventionally to use etching or photosensitive polyimide to form a pattern, and in recent years, a need for formation by inkjet is being studied. The method of patterning a film. A person skilled in the art has proposed various types of inkjet inks, for example, when preparing a polyimide inkjet ink, for example, Japanese Patent Laid-Open Publication No. 2003-213165, Japanese Patent Laid-Open No. Hei. No. 2006-131730 Since the polyimide ink is a relatively high-molecular ink, in order to prepare an ink of the most suitable viscosity, it is necessary to increase the ratio of the solvent and reduce the polyamine content in the ink. As a result, there is a problem that the thickness of the film obtained by the ink jetting is reduced. On the other hand, it is known that if a proline compound (an oxime coupling agent) is used in combination with a cycloolefin resin or a ruthenium resin, it may react with a metal or open a compound of 200902644, so that the film has a close resistance. Improve [for example, the next day, the resistance to weld cracking (soIder crack bulletin.) According to the above-mentioned conditions under the Japanese Patent Special Open No. 2003-105059, it is possible to form a thicker polythene (spray) 1 reading. In the inkjet ink, the inkjet ink of the octagonal octagonal compound (B) containing at least a rich ink and further containing a fermented product (A') is found. Further, (C^^ Congratulations to the inkjet ink and the inkjet ink containing the solvent (D). The present invention k provides an inkjet ink or the like as described below. The inkjet ink of the inkjet ink contains: Obtaining the compound (A) obtained by using the compound (al) having an acid anhydride group equal to or more than the monoamine (a2), and using the compound (ar) having an anthracene acid group and the diamine (a2'). At least one of the hydrazine compounds (A,). /, a [2] as in the above item [1] In the inkjet ink, the compound (al) having two or more acid anhydride groups is represented by the following formula (1), tetracarboxylic dianhydride, and the monoamine (a2) is as follows. a compound represented by the formula (2), [Chem. 16]

(1) R1 H2N—Y—Si—r2(1) R1 H2N—Y—Si—r2

I R3 (2) 200902644 27225pif (通式(1)中,X為碳數2〜100之四價有機基,通 式(2)中,R1、R2以及R3為氫、鹵素或者一價有機基, 該些可相同或者不同,Y為碳數1〜20之有機基)。 [3] 如上述第[2]項所述之喷墨用墨水,其中上述四羧酸 二酐為選自均苯四甲酸二酐、3,3',4,4'-二苯基酮四羧酸二 酐、2,2',3,3’-二苯基酮四羧酸二酐、2,3,3',4'-二苯基酮四羧 酸二酐、3,3',4,4'-二苯基颯四羧酸二酐、2,2',3,3’-二苯基砜 四羧酸二酐、2,3,3',4'-二苯基颯四羧酸二酐、3,3’,4,4’-二苯 基醚四羧酸二酐、2,2',3,3|-二苯基醚四羧酸二酐、2,3,3’,4’-二苯基醚四羧酸二酐、2,2-[雙(3,4-二羧基苯基)]六氟丙烷 二酐、乙二醇雙(偏苯三甲酸酐酯)、環丁烷四羧酸二酐、 曱基環丁烷四羧酸二酐、環戊烷四羧酸二酐、1,2,4,5-環己 烷四羧酸二酐、乙烷四羧酸二酐以及丁烷四羧酸二酐所組 成之族群中的一種或一種以上, 上述胺基矽化合物為選自對胺基苯基三甲氧基矽烷、 對胺基笨基三乙氧基矽烷、間胺基苯基三曱氧基矽烷、間 胺基苯基三乙氧基石夕院、胺基丙基三曱氧基石夕烧以及胺基 丙基三乙氧基石夕烧所組成之族群中的一種或一種以上。 [4] 如上述第[1]項所述之喷墨用墨水,其中上述矽化合 物⑷為下述通式(3)所表示之矽酸胺酸(a), [化 17] (3)200902644 〇 〇 R1 H〇_I R3 (2) 200902644 27225pif (In the formula (1), X is a tetravalent organic group having a carbon number of 2 to 100, and in the formula (2), R1, R2 and R3 are hydrogen, a halogen or a monovalent organic group. These may be the same or different, and Y is an organic group having 1 to 20 carbon atoms. [3] The inkjet ink according to [2] above, wherein the tetracarboxylic dianhydride is selected from the group consisting of pyromellitic dianhydride and 3,3',4,4'-diphenyl ketone Carboxylic dianhydride, 2,2',3,3'-diphenyl ketone tetracarboxylic dianhydride, 2,3,3',4'-diphenyl ketone tetracarboxylic dianhydride, 3,3', 4,4'-diphenylphosphonium tetracarboxylic dianhydride, 2,2',3,3'-diphenylsulfone tetracarboxylic dianhydride, 2,3,3',4'-diphenylfluorene Carboxylic dianhydride, 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride, 2,2',3,3|-diphenyl ether tetracarboxylic dianhydride, 2,3,3 ',4'-diphenyl ether tetracarboxylic dianhydride, 2,2-[bis(3,4-dicarboxyphenyl)]hexafluoropropane dianhydride, ethylene glycol bis(trimellitic anhydride), Cyclobutane tetracarboxylic dianhydride, decylcyclobutane tetracarboxylic dianhydride, cyclopentane tetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, ethane tetracarboxylic acid One or more of the group consisting of acid dianhydride and butane tetracarboxylic dianhydride selected from the group consisting of p-aminophenyltrimethoxydecane and p-aminophenyltriethoxydecane , m-aminophenyl trimethoxy decane, m-aminophenyl triethoxy stone shed, One or more of the group consisting of aminopropyltrimethoxysilane and aminopropyltriethoxylate. [4] The inkjet ink according to [1], wherein the ruthenium compound (4) is a phthalic acid (a) represented by the following formula (3), [Chem. 17] (3) 200902644 〇〇R1 H〇_

H R2—Si—Y——N I R3 -NH—Y——R2 R3 ΌΗ 〇 〇 (通式(3)中,X為碳數2〜100之四價有機基,R1、 R2以及R3為氫、鹵素或者一價有機基,該些可相同或者 不同,Y為碳數1〜20之有機基)。 [5]如上述第[4]項所述之噴墨用墨水,其中上述矽醯胺 酸為下述通式(4-1)、(4-2)或者(4-3)所表示的矽醯胺 酸, [化 18] 〇 〇H R2—Si—Y—NI R3 —NH—Y—R 2 R 3 ΌΗ 〇〇 (In the formula (3), X is a tetravalent organic group having a carbon number of 2 to 100, and R 1 , R 2 and R 3 are hydrogen, Halogen or a monovalent organic group, which may be the same or different, and Y is an organic group having 1 to 20 carbon atoms. [5] The ink for inkjet according to the above [4], wherein the proline is a hydrazine represented by the following formula (4-1), (4-2) or (4-3) Proline, [Chem. 18] 〇〇

3 I R3 R1 (4-1) R2-Si—(H2C)— I R33 I R3 R1 (4-1) R2-Si—(H2C)— I R3

H〇〇CH〇〇C

Ri NH-(CH2)—Si—R2Ri NH-(CH2)-Si-R2

、COOH R3 (4-2) -Si—^ R3, COOH R3 (4-2) -Si—^ R3

R2-Si—(H2C)—HNR2-Si-(H2C)-HN

R1 I NH-(CH2)—Si—R2R1 I NH-(CH2)-Si-R2

HOOCHOOC

C〇〇H R3 (4-3) 200902644 (通式(4-1 )、(4-2)或者(4-3)中,R]、R2 以及 R中的至少一個含有碳數1〜2〇之烧氧基,a為1〜 整數)。 [6] 如上述第[1]項至第[5]項中任一項所述之喷墨用墨 水,其中上述具有大於等於2個之酸酐基之化合物(al) 與上述單胺(a2)之比為1莫耳:0.5莫耳〜8.0莫耳。 [7] 如上述第[1]項至第[6]項中任一項所述之喷墨用墨 水,其中上述具有1個酸酐基之化合物(al,)為下述通式 (1’)所表示之羧酸酐,上述二胺(a2’)為下述通式(2,) 所表示之二胺, [化 19] 〇C〇〇H R3 (4-3) 200902644 (In the formula (4-1), (4-2) or (4-3), at least one of R], R2 and R contains a carbon number of 1 to 2 〇 The alkoxy group, a is 1 to an integer). [6] The inkjet ink according to any one of [1] to [5] wherein the compound (al) having two or more acid anhydride groups and the above monoamine (a2) The ratio is 1 mole: 0.5 mole to 8.0 mole. [7] The inkjet ink according to any one of the above [1], wherein the compound (al) having one acid anhydride group is represented by the following formula (1'). The carboxylic anhydride represented by the above diamine (a2') is a diamine represented by the following formula (2,), [Chem. 19] 〇

(通式(Γ)中,R1、R2以及R3為氫、鹵素或者一價 有機基,該些可相同或者不同,Y1為碳數1〜20之有機基, 通式(2’)中,X·為碳數2〜100之二價有機基)。 [8]如上述第[7]項所述之喷墨用墨水’其中上述鲮酸酐 為選自對(三甲氧基矽烷基)苯基琥珀酸酐、對(三乙氧基石夕 烷基)苯基琥珀酸酐、間(三曱氧基矽烷基)苯基琥珀酸軒、 間(三乙氧基矽烷基)苯基琥珀酸酐、三甲氧基矽烷基丙基 琥珀酸酐以及三乙氧基矽烷基丙基琥珀酸酐所組成之姨群 中的一種或一種以上, 200902644 上述二胺為選自對笨二胺、間笨二胺、對二甲笨二胺、 4.4 -一胺基二苯基甲娱;、4,4’-二胺基-1,2-二笨基乙燒、4,4'_ 二胺基-1,3-二苯基丙烷、2,2-雙(4-胺基苯基)丙烷、雙(4_ 胺基-3-甲基苯基)甲烷、1,2-雙-(4-胺基_3_甲基苯基)乙烷、 雙(4-胺基-2-曱基苯基)甲烷、ι,2-雙_(4_胺基_2_甲基苯基) 乙烧、4,4’-二胺基二苯基醚、3,3'-二胺基二苯基醚、4,4匕 一胺基一本基石風、4,4f-二胺基二苯硫驗、4,4·-二胺基二苯 基酮、4,4-一胺基二苯基_2,2’_丙燒、ι,4·二胺基環己烧、 4.4 -二胺基二環己基甲烷、ι,4_雙[(4_胺基苯基)甲基]苯、 1,4-雙(4-胺基苯氧基)苯、ι,3-雙(4_胺基苯氧基)笨、2,2_雙 [4-(4-胺基苯氧基)苯基]丙烷、2,2_雙[4_(4_胺基笨氧基)苯基] 氟丙烧、雙[4_(4_胺基苯氧基)笨基]雙 苯基]聯苯、U-雙㈣·胺基細笨基娜、 胺基苄基)苯基]己烷、5_苯基曱基4,3·二胺基笨、5_[4_(4_ 烷基環己基)苯基]曱基_1,3_二胺基苯、5_[4_(4_(4_烷基環己 環己基)苯基]曱基_U-二胺基苯、5_[((烷基環己基 ,己基)苯基]曱基_U·二胺基苯、^^4♦胺基苯氧基) 苯基]環己烷、1,1-雙[4-(4-胺基苯氧基)苯基]_4_烷基環己 统1,1-雙[4-(4-胺基苄基)苯基]環己烧、I,〗·雙[‘(A•胺基 苄基)苯基]_4_烷基環己烷、1,3-雙(3-胺基丙基)_四甲基二矽 氧烷所組成之族群中的一種或一種以上。 [9]如上述第[1 ]項至第[6]項中任一項所述之嘴墨用墨 水,其中上述矽化合物(A,)為下述通式(3,)所表示之 矽醯胺酸(A,), 10 200902644 27225pif [化 20] Q Η H 〇 R2- .,一Y〈~C—N—X,一N—C--- r3 COOH / H〇〇c -Si—R2 I R3 (3,) 鹵素或者一價 20之有機基,(In the formula (Γ), R1, R2 and R3 are hydrogen, halogen or a monovalent organic group, which may be the same or different, Y1 is an organic group having a carbon number of 1 to 20, and in the formula (2'), X · A divalent organic group having a carbon number of 2 to 100). [8] The inkjet ink according to the above [7] wherein the above phthalic anhydride is selected from the group consisting of p-(trimethoxydecyl)phenyl succinic anhydride and p-(triethoxy oxalate)phenyl Succinic anhydride, m-(tridecyloxyalkyl)phenylsuccinic acid, m-(triethoxydecyl)phenyl succinic anhydride, trimethoxydecyl propyl succinic anhydride, and triethoxy decyl propyl One or more of the oxime groups composed of succinic anhydride, 200902644 The above diamine is selected from the group consisting of p-diamine, m-diamine, p-diphenylammonium, 4.4-monoaminodiphenylcarbene; 4,4'-diamino-1,2-diphenylethane, 4,4'-diamino-1,3-diphenylpropane, 2,2-bis(4-aminophenyl) Propane, bis(4-amino-3-methylphenyl)methane, 1,2-bis-(4-amino-3-methylphenyl)ethane, bis(4-amino-2-indenyl) Phenyl)methane, iota, 2-bis(4-amino-2-methylphenyl) ethidium, 4,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl Ether, 4,4 fluorene-amine-based stone, 4,4f-diaminodiphenylthioate, 4,4·-diaminodiphenyl ketone, 4,4-aminodiphenyl _2,2'_丙烧, ι,4·diaminocyclohexane, 4.4-diaminodicyclohexylmethane, iota, 4-bis[(4-aminophenyl)methyl]benzene, 1,4-bis(4-amine Phenyloxy)benzene, iota, bis(4-aminophenoxy) stupid, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2_double [4_(4_Aminophenyloxy)phenyl] fluoropropane, bis[4-(4-aminophenoxy)phenyl]diphenyl]biphenyl, U-bis(tetra)·amine-based Na, aminobenzyl) phenyl] hexane, 5-phenylindole 4,3. diamino stupid, 5-[4-(4-alkylcyclohexyl)phenyl]indolyl-1,3-diamine Benzene, 5-[4-(4-(4-alkylcyclohexyl)phenyl]indenyl-U-diaminobenzene, 5-[((alkylcyclohexyl, hexyl)phenyl]fluorenyl) Diaminobenzene, ^^4♦aminophenoxy)phenyl]cyclohexane, 1,1-bis[4-(4-aminophenoxy)phenyl]_4-alkylcyclohexene 1 , 1-bis[4-(4-aminobenzyl)phenyl]cyclohexene, I, bis['(A•aminobenzyl)phenyl]_4-alkylcyclohexane, 1, One or more of the groups consisting of 3-bis(3-aminopropyl)-tetramethyldioxane. [9] Any of the above items [1] to [6] The ink for the nozzle ink, wherein The above hydrazine compound (A,) is a proline (A,) represented by the following formula (3,), 10 200902644 27225pif [20] Q Η H 〇 R2-., a Y<~C-N —X,一N—C—- r3 COOH / H〇〇c -Si—R2 I R3 (3,) Halogen or an organic group of 20 valence,

(通式(3,)中,R〗、R2以及R3為氫、 ,機,,該些可相同或者不同,γ,為碳數 X為碳數2〜1〇〇之有機基)。 [1〇]如上述第[9]項所述之喷墨用墨水,其中上述矽醯 胺酸(A,)為下述通式或 者(4’_5)所表示的矽醯胺酸(八,), [化 21] 11 200902644(In the formula (3), R, R2 and R3 are hydrogen, and these may be the same or different, and γ is an organic group having a carbon number of X 2 to 1 Å). The inkjet ink according to the above [9], wherein the valine acid (A,) is a glycine represented by the following formula or (4'-5) (eight, ), [Chem. 21] 11 200902644

RR

RR

(4'-4) (CH2);早i—R: 0 D (4,-5) (4.-3) R1 R2-Si-(H2C) R3(4'-4) (CH2); early i-R: 0 D (4,-5) (4.-3) R1 R2-Si-(H2C) R3

R3 H〇y ^ (通式(4’-l)、(4’-2)、(4'-3)、(4,_4)或者(4,_5' 中,R1、R2以及R3中的至少一個含有碳數之烷』 基,通式(4’-3)之R_為碳數2〜30之有機基,通式(4,_4 之R為氧或者兔數1 j^·20之烧基’ a為1 ^之整數)。 [ilj如上述第[1]項至第[1〇]項中任一項所述之喷墨月 墨水’其中上述具有1個酸酐基之化合物(al,)與上述二 12 200902644 27225pif 胺(a2’)之比為0.5莫耳〜8.〇莫耳:1莫耳。 [12] 如上述第Π]項至第[11]項中任一項所述之喷墨用 墨水,其中此噴墨用墨水進而含有高分子化合物(Β)。 [13] 如上述第[12]項所述之噴墨用墨水,其中上述高分 子化合物(Β)為選自聚醯胺酸以及聚醯亞胺中的至少一 種。 [14] 如上述第[12]項或第[13]項所述之噴墨用墨水,其 f '中上述南分子化合物(B)之重量平均分子量為1,000〜 5,000 〇 [15] 如上述第[η項至第[14]項中任一項所述之喷墨用 墨水,其中此噴墨用墨水進而含有烯基取代納迪克酸醯亞 胺(C)。 [16] 如上述第[15]項所述之喷墨用墨水,其中上述烯基 =代納迪克酸醯亞胺(C)為使單胺、二胺、三胺或者四 胺與下式(5’)所表示之烯基取代納迪克酸酐進行反應而 成的烯基取代納迪克酸醯亞胺, 1 [化 22]R3 H〇y ^ (in the formula (4'-l), (4'-2), (4'-3), (4,_4) or (4,_5', at least R1, R2 and R3 An alkyl group having a carbon number, R_ of the formula (4'-3) is an organic group having a carbon number of 2 to 30, and the formula (4,_4 of R is oxygen or the number of rabbits is 1 j^·20) The ink jet ink according to any one of the above items [1] to [1], wherein the compound having one acid anhydride group (al, And the ratio of the above-mentioned two 12 200902644 27225pif amine (a2') is 0.5 mol to 8. 〇 Moule: 1 mol. [12] As described in any one of the above items [1] to [11] The inkjet ink according to the above [12], wherein the polymer compound (Β) is selected from the group consisting of the inkjet ink. [14] The inkjet ink according to the above [12] or [13], wherein the south molecular compound (B) of f' The weight average molecular weight is 1,000 to 5,000 〇 [15] as described in any one of the above [n item to [14] Inkjet ink, wherein the inkjet ink further contains an alkenyl group, the inkjet ink according to the above [15], wherein the alkenyl group is substituted. Nadick acid imide (C) is an alkenyl-substituted nadic acid bismuth formed by reacting a monoamine, diamine, triamine or tetraamine with an alkenyl-substituted nadic anhydride represented by the following formula (5'). Imine, 1 [22]

式(5 )中,R1以及R2分別獨立為氫、碳數j〜l2之 烷基、碳數3〜6之烯基、碳數5〜8之環烷基、碳數6〜 12之芳基或者苄基中的任一種。 [17]如上述第[15]項或第[16]項所述之喷墨用墨水,其 200902644 中上述稀基取代納迪克酸st亞胺(c)為下述通式(5)所 表示之化合物, [化 23]In the formula (5), R1 and R2 are each independently hydrogen, an alkyl group having a carbon number of j to 12, an alkenyl group having 3 to 6 carbon atoms, a cycloalkyl group having 5 to 8 carbon atoms, and an aryl group having 6 to 12 carbon atoms. Or any of the benzyl groups. [17] The inkjet ink according to [15] or [16] above, wherein the dilute-substituted nadic acid st imine (c) in the above-mentioned formula 2009- s. Compound, [Chem. 23]

式(5)中,R]以及R2分別獨立為氫、碳數之 烷基、碳數3〜ό之烯基、碳數5〜8之環烷基、碳數6〜 12之芳基或者苄基中的任一種,η為1〜4之整數, * η=1時’式(5)中之R3為氫、碳數1〜12之烷基、 碳數1〜12之羥烷基、碳數5〜8之環烷基、碳數6〜12 之芳基、节基、_{(CqH2q)〇t(CrH2rO)uCsH2sX}(其中,q、Γ、 s為分別獨立選擇之2〜6之整數,丨為〇或者丨之整數,u ^ 1 3〇之整數,X為氫或者羥基)所表示聚氧亞烷基烷 =-(R)a-C6H4-R4 (其巾,a表示〇或者J之整數,R表示 =一欠1〜4之亞烷基,R4表示氫或者碳數1〜4之烷基)所 二之t 團、、C6H4-T-C6H5 {其中,T 為-〇^_、_C(CH3)2一、 芳香产s或者·s〇2-l所表示之基團、或者於該些基團之 方二上直士接鍵結的1個〜3個氫經經基取代的基團, 烷基Hi,式,(5)中之r3為碳數2〜20之亞烷基{亞 取代,彳壬音互=鄰接的任意亞甲基可經或者-CH=CH_ 5^8 擇之2〜6之|九馬_ (其中,q、r、S為分別獨立選 數’ t為〇或者1之整數,u為1〜3〇之整 14 200902644 數)所表示之聚氧亞烧基(polyoxyalkylene)、石炭數6〜12 之亞芳基、_(R)a-C6H4-R5-(其中,a為0或者1之整數,r 以及R5分別獨立為碳數1〜4之亞烧基)所表示之基團、 由-C6H4-T-C6H4- 、 -C6H4_T-C6H4-T-C6H4-或者 -C6H4-T'-C6H4-T-C6H4-T’-C6H4- {其中,T 為單鍵、碳數 1 〜6 之亞烷基、-C(CH3)2-、-C(CF3)2-、-CO-、_〇_、 -OC6H4C(CH3)2C6H40-、-S-或者-S02-,Τ’為-CH2-或者 所表示之基團、或者於該些基團之芳香環上直接鍵結的】 個〜3個氫經羥基取代的基團、下式(卜丨)所表示之基團 或者下式(6-2)所表示之基團,式(6_1;)中,χ獨立為j 〜6之整數,y為1〜7〇之整數, [化 24]In the formula (5), R) and R2 are each independently hydrogen, an alkyl group having a carbon number, an alkenyl group having a carbon number of 3 to fluorene, a cycloalkyl group having 5 to 8 carbon atoms, an aryl group having 6 to 12 carbon atoms or benzyl group. Any one of the groups, η is an integer of 1 to 4, * when η = 1, R3 in the formula (5) is hydrogen, an alkyl group having 1 to 12 carbon atoms, a hydroxyalkyl group having 1 to 12 carbon atoms, carbon a 5 to 8 cycloalkyl group, an aryl group having a carbon number of 6 to 12, a benzyl group, _{(CqH2q)〇t(CrH2rO)uCsH2sX} (wherein q, Γ, s are independently selected from 2 to 6) An integer, 丨 is an integer of 〇 or 丨, an integer of u ^ 1 3〇, X is hydrogen or hydroxy), represented by polyoxyalkylene alkane = -(R)a-C6H4-R4 (its towel, a represents 〇 or An integer of J, R represents = an alkylene group of 1 to 4, R4 represents hydrogen or an alkyl group having 1 to 4 carbon atoms, and a group of t groups, C6H4-T-C6H5 {where T is -〇^ _, _C(CH3)2, a group represented by aromatic s or s〇2-l, or one to three hydrogen permeans bonded to a straight line on the square of the groups Substituted group, alkyl Hi, formula, r3 in (5) is an alkylene group having a carbon number of 2 to 20 {sub-substitution, arpeggio mutual = any methylene group adjacent to or may be -CH=CH_ 5 ^ 8 Select 2~6|九马_ (where q, r, S are the independent choices of 't is 〇 or an integer of 1, u is 1~3〇 of the whole 14 200902644 number) a polyoxyalkylene, an arylene group having a carbon number of 6 to 12, _(R)a-C6H4-R5- (where a is an integer of 0 or 1, and r and R5 are each independently a carbon number of 1 to 4; a group represented by a sub-alkyl group, consisting of -C6H4-T-C6H4-, -C6H4_T-C6H4-T-C6H4- or -C6H4-T'-C6H4-T-C6H4-T'-C6H4- {where T Is a single bond, an alkylene group having 1 to 6 carbon atoms, -C(CH3)2-, -C(CF3)2-, -CO-, _〇_, -OC6H4C(CH3)2C6H40-, -S- or -S02-, Τ' is -CH2- or a group represented by the group, or a group of -3 hydrogen-substituted groups which are directly bonded to the aromatic ring of the groups, the following formula (diwax) The group represented by the group represented by the following formula (6-2), in the formula (6_1;), χ is independently an integer of j 6 , and y is an integer of 1 to 7 ,, [Chem. 24]

n==3時,式(5)中之R3為下式 或者二Γ)所表示之基團 (7_1)所表示之基團 15 200902644When n==3, R3 in the formula (5) is a group represented by the group (7_1) represented by the following formula or two oxime) 15 200902644

(7-2) 式(7-1 )中 ’ R 為氫、氟、氯、_0H、_〇CF3、_〇Cf2H、 -CF3、-CF2H、-CFH2、-OCF2CF2H、-OCF2CFHCF3、或者 碳數1〜10之烷基, / 式(7-1)以及式(7-2)中,R4、R5、R6分別獨立為 單鍵、反-1,4-亞環己基、1,3-二噁烧_2,5_二基、1,4-亞苯基、 虱可經氟取代之1,4-亞苯基或者碳數1〜之亞烧基,亞 烧基中之相互不鄰接的任意亞甲基可經_〇_或者_CH=CH_ 取代,任意的氳可經氟取代, n = 4時,式(5)中之R3為下式(8)所表示之基團, [化 26] R\ /R4(7-2) In the formula (7-1), 'R is hydrogen, fluorine, chlorine,_0H, _〇CF3, _〇Cf2H, -CF3, -CF2H, -CFH2, -OCF2CF2H, -OCF2CFHCF3, or carbon number 1. In the alkyl group of ~10, / in the formula (7-1) and the formula (7-2), R4, R5 and R6 are each independently a single bond, a trans-1,4-cyclohexylene group, and a 1,3-dioxin. _2,5-diyl, 1,4-phenylene, fluorene-substituted 1,4-phenylene or a carbon number 1 to a sub-alkyl group, any sub-substrate in the sub-alkyl group The methyl group may be substituted by _〇_ or _CH=CH_, and any hydrazine may be substituted by fluorine. When n=4, R3 in the formula (5) is a group represented by the following formula (8), [Chem. 26] R\ /R4

式(8)中,R4、R5、r6、尺7分別獨立為單鍵、反 亞%己基、1,3-二噁烷-2,5-二基、1,4-亞苯基、氫可經氟取 代之1,4-亞苯基或者碳數丨〜…之亞烷基,亞烷基中之相 互不鄰接的任意亞甲基可經-0-或者-CH=CH-取代,任意的 氫可經氟取代。 [18]如上述第[17]項所述之喷墨用墨水,其中η為2。 、[19]如上述第[π]項所述之喷墨用墨水,其中^為2, 式(5)中之R為碳數2〜15之亞烷基{亞烷基中之相互 16 200902644 27225pif 不鄰接的任意亞甲基可經·〇·或者_CH=CH-取代,任意的氫 可經氟取/&lt;}、_(R)a_C6H4_R5吖其中,&amp;為〇或者i之整數, R以及R分別獨立為碳數〗〜4之亞烷基)所表示之基團、 由-QH4-T-C6H4_ 、 -c6h4-t-c6h4-t-c6h4-或者 -C6H4-T'-C6H4-T-C6H4-T’-C6H4- {其中,丁為單鍵、_ch2_、 -C(CH3)2- &gt; -C(CF3)2- ^ -CO- ^ -o-. -0C6H4C(CH3)2C6H40- &gt; _s-或者-SCV,T,為_CH2_或者_0_}所表示之基團。 Γ) [2y]如上述第[17]項所述之喷墨用墨水,其中式(5) 中之R以及r2分別獨立為氫或者碳數1〜6之烷基’ η為2,式(5)中之R3為碳數2〜15之亞烷基{亞烷 基中之相互不鄰接的任意亞甲基可經_〇_或者_CH=CH-取 代’任意的氫可喊取代卜式⑹)所表示之基團、式 (6_2)所表示之基團、式(6-3)所表示之基團、式(6_4) 所表示之基團或者式(6_5)所表示之基團, [化 27] 200902644In the formula (8), R4, R5, r6 and sizing 7 are each independently a single bond, a trans-y-hexyl group, a 1,3-dioxane-2,5-diyl group, a 1,4-phenylene group, a hydrogen group. a 1,4-phenylene group substituted by fluorine or an alkylene group having a carbon number of 丨~., any methylene group in the alkylene group which is not adjacent to each other may be substituted by -0- or -CH=CH-, any Hydrogen can be replaced by fluorine. [18] The ink for inkjet according to [17] above, wherein n is 2. [19] The ink for inkjet according to [π] above, wherein ^ is 2, and R in the formula (5) is an alkylene group having 2 to 15 carbon atoms; mutual phase in the alkylene group 16 200902644 27225pif Any methylene group not adjacent may be substituted by 〇· or _CH=CH-, and any hydrogen may be taken by fluorine /&lt;}, _(R)a_C6H4_R5吖, and &amp; is an integer of 〇 or i, The group represented by R and R are each independently an alkylene group having a carbon number of 〜4, and is composed of -QH4-T-C6H4_, -c6h4-t-c6h4-t-c6h4- or -C6H4-T'-C6H4- T-C6H4-T'-C6H4- {wherein, butyl is a single bond, _ch2_, -C(CH3)2- &gt; -C(CF3)2-^-CO-^-o-. -0C6H4C(CH3)2C6H40 - &gt; _s- or -SCV, T, is the group represented by _CH2_ or _0_}. [2] The ink for inkjet according to the above [17], wherein R and r2 in the formula (5) are each independently hydrogen or an alkyl group having a carbon number of 1 to 6 η is 2, 5) R3 is an alkylene group having 2 to 15 carbon atoms. Any methylene group in the alkylene group which is not adjacent to each other may be substituted by _〇_ or _CH=CH-'any hydrogen may be substituted. (6)) a group represented by the formula, a group represented by the formula (6-2), a group represented by the formula (6-3), a group represented by the formula (6-4), or a group represented by the formula (6-5). [化27] 200902644

(6-1)(6-1)

Me I Si一O Me Me I Si- I MeMe I Si-O Me Me I Si- I Me

(6-2)(6-2)

(64) (6-5) 式(6-1)中,X獨立為1〜6之整數,y為i〜7〇之整 數 式(6-3 )以及式(6-5 )中,R 為包含-CH2-、-CH2CH2-、 -Ο-、-C(CH3)2-、-C(CF3)2-、-S02_之有機基, 式(6-5)中’X為包含-CH2-、-〇-之有機基。 [21]如上述第[17]項所述之噴墨用墨水,其中式(5) 中之R1以及R2分別獨立為氫或者;ε炭數1〜6之烧基, η為3 ’式(5)中之R3是以式(7^)、式 或者式(7-2-2)表示, 18 200902644 27225pif [化 28](64) (6-5) In the formula (6-1), X is independently an integer of 1 to 6, and y is an integer formula (6-3) of i to 7〇 and (6-5), and R is An organic group comprising -CH2-, -CH2CH2-, -Ο-, -C(CH3)2-, -C(CF3)2-, -S02_, wherein 'X is -CH2- in the formula (6-5) , -〇 - the organic base. [21] The ink for inkjet according to [17] above, wherein R1 and R2 in the formula (5) are each independently hydrogen or; ε is a burning group of 1 to 6 carbon; and η is 3' ( 5) R3 is expressed by the formula (7^), the formula or the formula (7-2-2), 18 200902644 27225pif [28]

(7-1-1)(7-1-1)

、r5wr4, r5wr4

/N ,R6 (7-2-2) ^ 、 /-丄-1 y τ '丄、尽、v 上 一 丄 式(7-2-2)中’ R4、R5、R6分別獨立為1,2-亞乙基 1,4-亞丁基。 中之R] [22]如上述第[I7]項所述之噴墨用墨水,苴中式(5) 炉以及R2分別獨立為氫或者 之、 η為4,式⑸中之尺3 :数1 6之烷基, [化29] 下式(8-1)表示, 19 200902644/N , R6 (7-2-2) ^ , /-丄-1 y τ '丄, 尽, v The last formula (7-2-2) 'R4, R5, R6 are independent of 1, 2 - ethylene 1,4-butylene. [R] [22] The inkjet ink according to the above [I7], wherein the furnace (5) and R2 are independently hydrogen or η, and η is 4, and the rule 3 in the formula (5) is: 6 alkyl, [Chemical 29] Formula (8-1), 19 200902644

[23] 如上述第[17]項所述之喷墨用墨水,其中此噴墨用 墨水含有選自η為〗之烯基取代納迪克酸醯亞胺(c)、η 為2之烯基取代納迪克酸醯亞胺(C)、η為3之烯基取代 納$克酸酿亞胺(C)、以及4 4之烯基取代納迪克酸酿 亞胺(c)中的至少兩種烯基取代納迪克酸醯亞胺(c)。 [24] 如上述第[17]項所述之噴墨用墨水,其中此噴墨用 墨水含有至少兩種如下之烯基取代納迪克酸醯亞胺(c): 式(5)中之R1以及R2分別獨立為氫或者碳數丨〜6之烷 基, 式(5)中之R3為碳數1〜12之烷基(n=1)、碳數6 〜12之芳基(n=r 1 )、_(CH2)對(n = 2,p為6〜12之整數)、 式(6-1-1)所表示之基團、式(6_2)所表示之基團、式 (6-3-1)所表示之基團、式(6_4)所表示之基團、式(6J-D 所表不之基團、式(74-2)所表示之基團、式所 表不之基團、&lt; (7-2_1)所表示之基團、式(7_2_3)所表 示之基團、式(8-1)所表示之基團, 20 200902644 27225pif [化 30][23] The ink for inkjet according to the above [17], wherein the ink for inkjet contains an alkenyl group selected from the group consisting of n-substituted nadic acid yttrium imide (c) and η of 2 Replacing at least two of Nadick's yttrium imine (C), η of 3 alkenyl substituted nano-gram acid-imine (C), and 4 4 alkenyl-substituted nadic acid-based imine (c) Alkenyl substituted nadic acid ylide (c). [24] The inkjet ink according to the above [17], wherein the inkjet ink contains at least two kinds of alkenyl groups substituted with nadic acid ylide (c): R1 in the formula (5) And R2 is independently hydrogen or an alkyl group having a carbon number of 66, and R3 in the formula (5) is an alkyl group having 1 to 12 carbon atoms (n=1) and an aryl group having 6 to 12 carbon atoms (n=r 1), _(CH2) pair (n = 2, p is an integer of 6 to 12), a group represented by the formula (6-1-1), a group represented by the formula (6-2), and a formula (6- 3-1) the group represented by the formula, the group represented by the formula (6-4), the group represented by the formula (6J-D, the group represented by the formula (74-2), and the group represented by the formula a group represented by a group, &lt; (7-2_1), a group represented by the formula (7_2_3), and a group represented by the formula (8-1), 20 200902644 27225pif [Chem. 30]

MeMe

Me -CH. -S i-〇—Si—(cH2'Me -CH. -S i-〇—Si—(cH2'

MeMe

MeMe

H3C\ /CH2— H3C&gt;J^CH3(6-2) n=2H3C\ /CH2—H3C>J^CH3(6-2) n=2

21 200902644 另外本發明之噴墨用墨水可為下述墨水。 如上述第[17]項所述之噴墨用墨水,其中此噴墨用墨 水含有至少一種如下之烯基取代納迪克酸醯亞胺(c) : η 為1 ’式(5)中之R3為碳數i〜l2之炫基、碳數5〜8之 環烷基、碳數6〜12之芳基、苄基、 :{(CqH2q)〇t(CrH2r〇)ucsH2s+1}(其巾,q、r、s 為分別獨立 I擇之2〜6之整數,t為〇或者}之整數,u為】〜孙之 整數)所表示聚氧亞垸基垸基、肌-⑽士4 (其中,a 表示0或者1之整數,R表示魏1〜4之亞烧基, 示氫或者碳數1〜4之烷基)所表示之基團、或者 -C6H4-T-C6H5 (其巾,τ 為项、_Cd〇、_s_ 或者S〇2·)所表示之基團;以及 至〆種n為2之稀基取代納迪克酸醯亞胺(c)。 又,本發明之噴墨用墨水可為下述墨水。 A如上述第[17]項所述之噴墨用墨水,其中此喷墨用墨 水3、^至)「種如下之稀基取代納迪克_亞胺(C):式 5之R以及R分別獨立為氫或者碳數丨〜6之烷基, n 式(5)中之RJ為碳數1〜12之垸基、碳數5〜8 之壤烧基、碳數6〜12之芳基、或者节基;以及 ^種η為2之埽基取代納迪克酸酿亞胺⑹。 進而、,本發明之噴墨用墨水為下述墨水。 如上述第[Π]項所述之喷墨用墨水,其中此喷墨用墨 水3有至J -種如下之烯基取代納适克酸酿亞胺⑹:式 22 200902644 27225pif (5 )中之R以及R2分別獨立為氫或者碳數1〜6之烧基, η為1,式(5)中之R為碳數1〜12之烧基或者碳數6〜 12之芳基;以及 至少一種如下之烯基取代納迪克酸醯亞胺(c):式(5) 中之R1以及R2分別獨立為氫或遗·碳數i〜6之烷基, 2,式(5)中之R3為-(CH2)6-、上式(6-3-1 )所表示之基 團或者上式(6-4)所表示之基團。 [25] 如上述第[1]項至第[24]項中任一項所述之喷墨用 墨水,其中此噴墨用墨水進而含有溶劑(D )。 [26] 如上述第[25]項所述之喷墨用墨水,其中溶劑 為選自乳酸乙醋、乙醇、乙二醇、丙二醇、甘油、二乙二 醇二曱醚 '二乙二醇二乙_、二乙二醇曱基乙基醚、二乙 二醇單乙虹㈣、乙二醇單頂、乙二 醚乙酸醋、 丙二醇單曱㈣_、3_甲氧基丙酸甲§旨、&gt; 乙氧基丙酸 乙酉旨、環己酮以及r-丁内醋所組成之 的,一種21 200902644 Further, the ink for inkjet of the present invention may be the following ink. The inkjet ink according to the above [17], wherein the inkjet ink contains at least one of the following alkenyl-substituted nadic acid ylides (c): η is 1' in the formula (5) a cyclyl group having a carbon number i to l2, a cycloalkyl group having 5 to 8 carbon atoms, an aryl group having 6 to 12 carbon atoms, a benzyl group, :{(CqH2q)〇t(CrH2r〇)ucsH2s+1} (the towel thereof) , q, r, s are independent integers of 2 to 6 integers, t is an integer of 〇 or }, u is 】 】 】 】 】 】 】 】 ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ Wherein, a represents an integer of 0 or 1, R represents a group represented by a sub-alkyl group of Wei 1 to 4, an alkyl group having hydrogen or a carbon number of 1 to 4, or -C6H4-T-C6H5 (the towel thereof, τ is a group represented by the term, _Cd〇, _s_ or S〇2·); and a rare group in which the n is 2 is substituted for the nadic acid ylide (c). Further, the ink for inkjet of the present invention may be the following ink. A. The ink for inkjet according to the above item [17], wherein the inkjet ink 3, "to the following thin base is substituted for Nadick-imine (C): R and R of Formula 5, respectively Independently hydrogen or an alkyl group having a carbon number of 6~6, n in the formula (5), RJ is a fluorenyl group having 1 to 12 carbon atoms, a carbonic acid group having 5 to 8 carbon atoms, an aryl group having 6 to 12 carbon atoms, Or a thiol group in which η is 2 is substituted for the nadic acid-based imine (6). Further, the ink for inkjet according to the present invention is the ink described below. Ink, wherein the inkjet ink 3 has the following alkenyl-substituted N-acrylic acid-imine (6): wherein R and R2 are independently hydrogen or carbon number 1 to 6 respectively. The alkyl group in the formula (5) wherein R is a carbon number of 1 to 12 or an aryl group having 6 to 12 carbon atoms; and at least one of the following alkenyl substituted nadic acid ylides (c) R1 and R2 in the formula (5) are each independently hydrogen or an alkyl group having a carbon number of i to 6, 2, and R3 in the formula (5) is -(CH2)6-, and the above formula (6-3) -1 ) a group represented by the group represented by the above formula (6-4). [25] The inkjet ink according to any one of [1], wherein the inkjet ink further contains a solvent (D). [26] The inkjet according to the above [25] Ink, wherein the solvent is selected from the group consisting of lactic acid ethyl acetate, ethanol, ethylene glycol, propylene glycol, glycerin, diethylene glycol dioxime ether, diethylene glycol diethylene glycol, diethylene glycol decyl ethyl ether, diethyl Glycol monoethylidene (tetra), ethylene glycol monotop, ethylene diether acetate vinegar, propylene glycol monoterpene (tetra) _, 3 methoxy propionic acid, gt, ethoxy propionate, cyclohexanone and r - Ding vinegar, one kind

=如上述_項至_]項中你 墨用 墨水,其中相對於議重量份之噴墨用墨水,上述石夕化洽 物(A)以及上述矽化合物(A,) 告i 99重量份。 之總含量為1重里份〜 [28]如上述第[η項至第[26] ^ 墨rf中相對於™之嘴墨:二 物(A)以及上述梦化合物(A,) &lt; 重量份〜 80重量份。 3里為丄 23 200902644 装述第[1]項至第[26]項中任一項所述之喷墨用 f水,其中相對於100重量份之嘴墨用墨水,上述石夕化合 ϋΓ及上述魏合物(A,)之總含量為22重量份〜 70重篁份。 ㈣亞胺膜或者圖案狀聚麵胺膜,此聚醢 ^^或者圖餘聚輕_是以如下方法獲得:藉由喷 墨f布方法,塗佈如上述第⑴項至第[29]項中任-項所述 =墨用墨水而形成塗膜後,對該塗膜進行固化處理而形 成聚醯亞胺膜。 [31]、料醢亞麵或者圖案絲麵賴之形成方 方法如下製程:藉由噴墨塗佈方法,塗佈如上 ^Ϊ至第[2 9 ]項巾任—項所述之喷墨用墨水而形成塗 ^、衣°,以及對該塗騎行固化纽㈣絲醯亞胺 的製程。 、 * [32卜種薄膜基板,其具有聚輕胺膜或者圖案 ^亞,膜’此《亞贿或者圖餘聚醯亞贿是藉由如 上述弟[31]項所述之方法而形成於基板上。 基板阳卜種電子零件,其具有如上述網項所述之薄膜 [發明效果] 右使用本發明之較佳形態之喷墨用墨水, 即可形成具有較厚之膜厚的聚醯亞胺膜。X,由本1日二人 W土形,%之喷墨用墨水形成的聚輕胺膜,例之 電絕緣性高,從而提高電子零件之可靠性、良率。、々生、 24 200902644 27225pif “為讓本發明之上述和其他目的、特徵和優點能更明顯 易懂,下文特舉實施例,並配合所附圖式,作詳細說明如 下。 【實施方式】 本發明提供一種含有矽化合物(A)以及/或者矽化合 物j A’)的噴墨用墨水、使用該墨水之聚醯亞胺膜形成方 法等。另外,本發明之喷墨用墨水可為無色,亦可為有色。 該嘴墨用墨水是含有至少一種石夕化合物(A)以及/或 者至少一種矽化合物(Αι)的喷墨用墨水、進而含有高分= Ink inks as in the above items _ to _], wherein the above-mentioned zebra chemical (A) and the above ruthenium compound (A,) are 99 parts by weight relative to the ink of the ink. The total content is 1 part by weight to [28] as in the above [nth item to [26] ^ ink rf in the mouth ink relative to TM: two things (A) and the above dream compound (A,) &lt; parts by weight ~ 80 parts by weight. The ink for inkjet according to any one of the items [1] to [26], wherein the above-mentioned stone is combined with 100 parts by weight of the ink for nozzle ink, and The total content of the above-mentioned Wei compound (A,) is from 22 parts by weight to 70% by weight. (4) an imine film or a patterned faceted amine film, and the polycondensation or the light absorption is obtained by the following method: by the inkjet f cloth method, coating the above items (1) to [29] After forming a coating film with the ink for ink, the coating film is cured to form a polyimide film. [31], the method of forming the side of the material or the surface of the pattern is as follows: by the inkjet coating method, coating the inkjet as described in the item [2 9] The ink forms a coating, a coating, and a process for curing the coating. , * [32 kinds of film substrate, which has a poly-amine film or a pattern, a film, which is formed by the method described in the above [31]. On the substrate. The substrate of the electronic component having the film as described in the above item [Effect of the Invention] The inkjet ink of the preferred embodiment of the present invention can be used right to form a polyimide film having a thick film thickness. . X, a poly-light amine film formed by the ink-based ink of W-shaped and % ink on the first day, for example, has high electrical insulation, thereby improving the reliability and yield of the electronic component. The above and other objects, features, and advantages of the present invention will become more apparent and understood. The invention provides an inkjet ink containing a ruthenium compound (A) and/or a ruthenium compound j A'), a method for forming a polyimide film using the ink, etc. Further, the ink for inkjet of the present invention may be colorless. The ink for ink jets is an inkjet ink containing at least one cerium compound (A) and/or at least one cerium compound (Αι), and further contains a high score.

子化合物(B)的喷墨用墨水、進而含有烯基取代納迪克 酸醯亞胺(nadicimide) (C)的喷墨用墨水、進 (D)的喷墨用墨水。 句公齊J 矽化合物⑷可藉由至少使用具有大於等於 酸酐基之化合物⑷與單胺(a2)而獲得,例如 使(al)與(a2)反應而獲得的生成物(石夕醒胺酸^ 例如,可f U◦與(a2)形成鹽的化合物,) 具有大於等於2個之酸酐基之化合物(ai)與=用 可獲得㈣化合物,舰不較於上軸子。 a 又,矽化合物(A)中之石夕,可來 個之酸酐基之化合物(al),π / 具有A於等於2 初U1),可來源於單胺(a2), 源於(al)與⑻兩者。於以下之詳細說明中,是^用 來源於車胺U2)之梦而獲得魏合 ^ 於等於2個之麟基之化合物⑻具有石夕之例=大 可列舉日本專利特開昭61趣285號公報、/林=開 25 200902644 平5-271245號公報或者日本專利特開平5_32〇i 等中揭示的化合物。 72號公報 又,矽化合物(A1)可藉由至少使用i + 之化合物Ur)與二胺⑷而獲得:有可1個酸酐基 與(a2·)反應而獲得的生成物(矽醯胺酸(八|、使(a1') 可為(al')與(a2')形成鹽的化合物,只要為,例如, 個酸酐基之化合物(al’)與二胺(a2i)可獲得的石用具有1 則並不限定於上述例子。 、、石夕化合物, 又’石夕化合物(A')中之石夕,可來源於 基之化合物(al,),可來源於二胺(a2,),亦可 ^駿酐 與U2”兩者。於以下之詳細說明中,是使用二二“1,) 1個酸酐基之化合物⑴,)之石夕而獲得石夕化合^A於具有 於-U2 )具有石夕之例,例如,可列舉下述通^至 所表示之矽氧烷系二胺等。 式(XV) 1_„梦酉&amp;胺酸胺酸 =日=噴墨用墨水中所含的石夕醯胺酸(A) 胺it :等於2個之酸酐基之化合物(al):由The inkjet ink of the sub-compound (B), the inkjet ink containing an alkenyl group substituted with nadicimide (C), and the inkjet ink of (D). The compound (4) can be obtained by using at least a compound (4) having an acid anhydride group or more and a monoamine (a2), for example, a product obtained by reacting (al) with (a2). ^ For example, a compound which can form a salt with (F2) and (a2), a compound (ai) having an acid anhydride group of 2 or more and a compound which can be obtained by using (4), is not comparable to the upper axis. a Further, in the ruthenium compound (A), the acid anhydride group compound (al), π / has A equal to 2 initial U1), may be derived from the monoamine (a2), derived from (al) Both with (8). In the following detailed description, the compound (8) which is obtained by the dream derived from the caramine U2) and which is equal to two of the linings (8) has the case of Shi Xi = the Japanese patent special opening 61 fun 285 The compound disclosed in Japanese Laid-Open Patent Publication No. Hei No. Hei-5-271245, or Japanese Patent Laid-Open No. Hei. Further, the oxime compound (A1) can be obtained by using at least the compound ir) of i + and the diamine (4): a product obtained by reacting an acid anhydride group with (a2·) (proline) (8), such that (a1') may be a compound in which (al') forms a salt with (a2'), as long as, for example, an acid anhydride group-containing compound (al') and a diamine (a2i) are available for use in the stone. The case of having one is not limited to the above examples. The compound of Shixi compound, and the compound of Shishi compound (A'), may be derived from a compound (al), which may be derived from a diamine (a2,). , in the following detailed description, in the detailed description below, the use of two or two "1," one anhydride group of the compound (1), the stone eve to obtain the stone 化 化 ^ ^ U2) has an example of a diarrhea, and examples thereof include a oxane-based diamine represented by the following. Formula (XV) 1_„Montmoral &amp; Aminate = Day = Astaxantine (A) contained in inkjet ink Amine it: Compound (al) equal to 2 acid anhydride groups:

之但並不限A ⑶所絲之化合物%^驗⑷可鱗上迷通式 或者(4_3)所表示之化^物的疋上述狀⑷)、(4-2) 又,本發明之噴累田 藉由至少使用且有、P用墨水中所含的矽醯胺酸(A,)可 ⑽,利用以下說明H軒基之化合物Μ)與二胺 &lt;衣法而獲得,但並不限定於利用 200902644 該製法獲得的矽醯胺酸。矽醯胺酸(A')可列舉上述通式 (3')所表示之化合物’較好的是上述通式(4,-1 )、(4,-2)、 (4-3)或者(4’-4)所表示之化合物。 以獲得石夕醯胺酸(A )以及矽醯胺酸(A')的及 應條件 本發明中可使用的矽醯胺酸(A)較好的是相對於1 莫耳之具有大於等於2個之酸酐基之化合物(al),與〇 5 莫耳〜8.0莫耳之單胺(a2)反應而獲得。又,進而好的是 相對於1莫耳之具有大於等於2嗰之酸酐基之化合物 (al) ’與1.〇莫耳〜4.〇莫耳之單胺(a2)反應而獲得。 更好的疋相對於1莫耳之具有大於等於2個之酸針基之化 合物U1),與L5莫耳〜2.5莫耳之單胺(a2)反應而獲 得。 又,本發明中可使用之矽醯胺酸(A,)較好的是相對 於1莫耳之二胺(a2’)’與0.5莫耳〜8 〇莫耳之具有)個 酸酐基之化合物(al,)反應而獲得。又,進而好的是相對However, it is not limited to the compound of A (3), and (4) the above-mentioned shape (4)), (4-2) of the chemical represented by the formula (4), and the spray of the present invention. The field can be obtained by using at least a phthalic acid (A) which is contained in the ink for P, and can be obtained by using the following formula (H) and diamine &lt; clothing method, but is not limited thereto. The proline acid obtained by the method of 200902644. The proline acid (A') may, for example, be a compound represented by the above formula (3'), preferably a compound of the above formula (4, -1), (4, -2), (4-3) or ( 4'-4) The compound represented. The valeric acid (A) which can be used in the present invention to obtain the lysine (A) and the valine (A') is preferably 2 or more with respect to 1 mol. The acid anhydride group-containing compound (al) is obtained by reacting with 〇5 mol to 8.0 mol of monoamine (a2). Further, it is further preferably obtained by reacting a compound (al)' having an acid anhydride group of 2 mol or more with 1 mol of monoamine (a2). More preferably, ruthenium is obtained by reacting with a compound of U1) having 1 or more acid needle groups of 1 mol, and L5 mol to 2.5 mol of monoamine (a2). Further, the proline (A,) which can be used in the present invention is preferably a compound having an acid anhydride group with respect to 1 mol of the diamine (a2')' and 0.5 mol to 8 mol%. (al,) obtained by reaction. Again, the better is relative

用於獲得本發明之㈣紐(A)以及㈣胺酸Used to obtain (4) New (A) and (4) Amino acids of the present invention

)以及矽醯胺酸(A,) 別限定,例如可列舉: ''乙二醇甲基乙基鱗、 200902644 二乙二醇單乙醚乙酸酯、乙二醇 甲謎乙酸酉旨、3-甲氧基丙酸甲酉旨、3 旨、丙二醇單 己嗣、r-丁内醋、N_m 基兩酸乙酉旨、環 醯胺等。 况酌以及Ν,Ν-二甲基乙 於上述溶劑中,若僙用 _ 0 基丙酸甲醋、環⑽、二乙二乙酸醋' 3-甲氧 甲醚以及7^丁内酯,則可夢為^ 土醚、二乙二醇二 水,故而較好。 衣備為對噴墨頭之損傷較少的墨 該些反應溶劑可單獨# 之混合溶劑。又,除上述反 作兩種或兩種以上 他溶劑。 谷訓以外,亦可混合使用其 物大於等於2個之酸酐基之化合 削重量份,或者相胁:十Γ0重量份’使用大於等於 之總計100重量份,使用大於等於100重量 份’則反應順利進行,故而較好 應系中的順年 另外’反應原料添加至反應系中的順序並無特別限 定即蜚十於石夕酿胺酸(A)而言,可使用如下方法中的 任方4 *具有大於等於2個之酸酐基之化合物(al ) 與單胺⑽同時添加至反應溶劑中的方法;將單胺(a2) 溶解於反應溶劑中後添加具有大於等於:個之酸針基之化 28 200902644 27225pif =物(al)的方法;於具有大於等於2個之酸酐基之化合 物(al)中添加單胺(a2)的方法等。 —又,對於矽醯胺酸(A1)而言,可使用如下方法中的 壬—種方法:將具有1個酸酐基之化合物(al,)與二胺(a2,) 、=^至反應溶劑中的方法;將二胺㈤,)溶解於反應 冷劑中後添加具有】個酸酐基之化合物(al,) ;有】個酸肝基之化合物⑽中添加二胺(a2,)的方法 γα_ 作=知若㈣胺酸(Α)與環氧概、_脂併用,則 ==劑,,與金屬發生反應或者形成錯合 使膜之饴者性提昇,耐焊裂性提高。又,對於石夕 則J預測若與環氧樹腊、轉脂併用, ^為Μ偶合劑而起作用’與金屬發生反 石物,從而使膜之密著性提昇,耐焊 一。形成'.曰 進而,本發明相經努力研究之 = (A)是可藉由加熱而水解、脫水 石酿胺酸 亞胺鍵之固體生成物(聚酸亞胺)的;固::ί:具有; Γ㈣胺酸“’)也是可藉由加熱而:=發 ==具之固體生成物(聚酸亞胺)“固 之聚=4=:聯相比先前之線狀 熱性,化時孔隙或二^ 29 200902644 或者積層材料之基質樹脂(matrix resin)而具有優異之特 性。 1.3用以獾得欲醯胺酸(A)以及石夕酿脸酴fA1)之久 成分的遞 以下,對可用以獲得矽醯胺酸(A)的具有大於等於2 個之酸針基之化合物(al)與單胺(a2)加以說明。進而, 對可用以獲得矽醯胺酸(A')的具有1個酸酐基之化合物 (al')與二胺(a2')加以說明。 1.3 (1)具有大么蔓^_2個之酸酐基之化合物ian 本發明中所使用的具有大於等於2個之酸酐基之化合 物(al),可列舉上述通式(1)所表示之四羧酸二酐。 本發明中所使用的具有大於等於2個之酸酐基之化合 物U1)之具體例’可列舉:苯乙烯_順丁烯二酸酐共聚物、 甲基丙烯酸甲8旨·順τ稀二_共聚物等具有酸酐基的自 由基聚合性單體與其他自由絲合性單體的共聚物,或者 四羧酸二酐等。四羧酸二酐例如可列舉:2,2ι,3,3,_二笨基 _四羧酸—酐、2,3,3’,4’_二笨基酮四舰二酐、2,2,,3,3,-二 苯基碾四㈣二酐、2,3,3’,4,•二苯基颯四緩酸二針、 2,2’,3,3’-二苯基醚四叛酸二軒、2,3,3,,4,_二苯基鍵四羧酸二 酐、乙二醇雙(偏苯三曱酸軒醋)、乙烧四魏酸二針、4_(2,5_ 二氧四氫吱喃-3-基)-1,2,3,4-四氫萘],2_二緩酸針、5_(2,5_ 二氧四氫咬喃基)_3_曱基_3_環己烯#二賊酐,具體而 言’可列舉下式(M·〗)〜(bU73)所表示之化合物等四 羧酸二酐。 30 200902644 [化 31]And valine acid (A,) are not limited, for example, ''ethylene glycol methyl ethyl scale, 200902644 diethylene glycol monoethyl ether acetate, ethylene glycol acetaminoacetate, 3- Methoxypropionate, 3, propylene glycol monohexyl ruthenium, r-butyrolactone, N-m-based acid, guanidine, and the like. And Ν, Ν-dimethyl ethane in the above solvent, if _ 0-methyl propionic acid methyl vinegar, ring (10), diacetic acid vinegar ' 3-methoxymethyl ether and 7 ^ butyrolactone, then It can be dreamed of ^ earth ether, diethylene glycol dihydrate, so it is better. The clothes are made of ink which is less damaged to the ink jet head. The reaction solvents may be a mixed solvent of #. Further, in addition to the above, two or more solvents are used. In addition to the net training, it is also possible to mix and use the combined weight fraction of the acid anhydride group of two or more substances, or the threat: ten Γ 0 parts by weight 'to use 100 parts by weight or more, use 100 parts by weight or more' Since it is carried out smoothly, it is preferable that the order of the addition of the reaction raw material to the reaction system is not particularly limited, that is, in the case of 石10 in the case of the ceramide (A), any of the following methods may be used. 4 * a method of simultaneously adding a compound (al ) having two or more acid anhydride groups to a reaction solvent with a monoamine (10); and dissolving the monoamine (a2) in a reaction solvent, and adding an acid needle having a ratio of equal to or greater than: The method of adding a monoamine (a2) to a compound (al) having an acid anhydride group of two or more is used. - Further, for the proline (A1), a method of the following method can be used: a compound having one acid anhydride group (al,) and a diamine (a2,), =^ to a reaction solvent The method of adding a diamine (f), a compound having an acid anhydride group (al,), and a method of adding a diamine (a2,) to a compound (10) having an acid liver group; If you know that (4) aminic acid (Α) is used together with epoxy and _lipid, then == agent, react with metal or form a mismatch to improve the film's performance and improve weld resistance. In addition, for Shi Xi, J predicts that if it is used together with epoxy wax and turning fat, ^ acts as a bismuth coupling agent, and an anti-rock material is formed with the metal, so that the adhesion of the film is improved and the welding resistance is improved. Forming '.曰 Further, the present invention has been studied with difficulty = (A) is a solid product (polyimide) which can be hydrolyzed by heating and dehydrated to make an amine imine bond; Γ (tetra) Amine acid "') is also available by heating: = = = = = solid product (polyimide) "solid poly = 4 =: combined with the previous linear heat, the pores Or ii 29 200902644 or a matrix resin of a laminate material with excellent properties. 1.3 for the long-term composition of the succinic acid (A) and the scorpion scorpion fA1), the compound having the acid needle group of 2 or more acids which can be used to obtain the valine acid (A) (al) is explained with the monoamine (a2). Further, a compound (al') having one anhydride group and a diamine (a2') which can be used to obtain valeric acid (A') will be described. (1) The compound (al) having an acid anhydride group of 2 or more, which is used in the present invention, may be exemplified by the above-mentioned compound (1). Acid dianhydride. Specific examples of the compound U1) having two or more acid anhydride groups used in the present invention include styrene-maleic anhydride copolymer, methacrylic acid, and cis-tau A copolymer of a radically polymerizable monomer having an acid anhydride group and another free-filable monomer, or a tetracarboxylic dianhydride or the like. Examples of the tetracarboxylic dianhydride include: 2,2,3,3,-di-p-stylene-tetracarboxylic acid-anhydride, 2,3,3',4'-di-p-propyl ketone, and 2,2 ,,3,3,-diphenyl-tetrakis(tetra) dianhydride, 2,3,3',4,•diphenylphosphonium sulphate, 2,2',3,3'-diphenyl ether Four rebel acid two Xuan, 2,3,3,,4,_diphenyl bond tetracarboxylic dianhydride, ethylene glycol double (p-benzoic acid Xuan vinegar), E-burning four-wet acid two needles, 4_( 2,5_ dihydrotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene], 2_di-acid acid needle, 5_(2,5-dioxotetrahydrotetrahydrocarbyl)_3_ The thiol_3_cyclohexene# thief anhydride is specifically a tetracarboxylic dianhydride such as a compound represented by the following formula (M·) to (bU73). 30 200902644 [Chem. 31]

[化 32] 31 200902644 b1-15 b1-14 b1-16[化32] 31 200902644 b1-15 b1-14 b1-16

b1-17B1-17

b1-18 b1-19 fB1-18 b1-19 f

b1-21 o oB1-21 o o

b1-20B1-20

b1-24 b1-23B1-24 b1-23

b1-25B1-25

32 200902644 [化 33]32 200902644 [Chem. 33]

b1-27 b1-28 b1-29B1-27 b1-28 b1-29

b1-34 〇 〇B1-34 〇 〇

[化 34] 33 200902644 b1-35 Ο 〇[化34] 33 200902644 b1-35 Ο 〇

b1-36o 〇 li 〇 久Ύ 八v令丫/' J 〇 L. ^ P Γ 〇 〇B1-36o 〇 li Ύ 久Ύ 八v丫丫/' J 〇 L. ^ P Γ 〇 〇

b1-43 b1-44 cB1-43 b1-44 c

b1-42B1-42

b1-45 〇 l &gt; b 〇B1-45 〇 l &gt; b 〇

Ω η Ο OΩ η Ο O

b1-50B1-50

34 200902644 27225pif [化 35] b1-51 b1-52 b1-5334 200902644 27225pif [化 35] b1-51 b1-52 b1-53

b1-54 b1-55B1-54 b1-55

b1-56 〇B1-56 〇

b1-60 b1-61 b1-62B1-60 b1-61 b1-62

b1-63 b1-64 〇 /P °^IX X^° 〇 0 35 200902644 [化 36]B1-63 b1-64 〇 /P °^IX X^° 〇 0 35 200902644 [Chem. 36]

b1-72B1-72

於具有大於等於2個之酸酐之化合物之上述具體令 中,因苯乙烯-順丁烯二酸酐共聚物、由式(bl_i)、(bl_5) (bl-6Hbl-7Hbl-8)Kbl-9)^(bl-14)&gt;(bM8Hbl.20 所表示之化合物於溶劑中的溶解性高, 水’故而較好。又’根據喷墨用墨水之匕備 透明性,於此情形時,尤其好的是逆有時要求Η 的疋使用苯乙稀-順丁稀二酉 36 200902644 27225pif 軒共聚物、由式(bl-6)、(bl-7)、(bl_8)、(bl外(Μ_14)、 (bl-18)等所表示之化合物。 π又’上職示之具有切#於2個之酸酐基之化合物 可單獨使用-種’或者組合兩種或兩種以上使用。 L3 (2)單胺 本發明中所使用的單胺(a2),可列舉上述通式(2) 所表示之胺基矽化合物。 ( ' 本發明中所使用的單胺(a2)並無特別限定,具體例 可列舉:3-胺基丙基三甲氧基矽烷、3_胺基丙基三乙氧基 石夕烧、3-胺基丙基甲基二甲氧基石夕烷、3_胺基丙基甲基二 乙氧基矽烷、4-胺基丁基三曱氧基矽烷、4_胺基丁基三乙 氧基矽烷、4-胺基丁基甲基二乙氧基矽烷、對胺基苯基三 曱氧基矽烷、對胺基苯基三乙氧基矽烷、對胺基苯基甲基 一甲氧基矽烷、對胺基苯基甲基二乙氧基矽烧、間胺基笨 基三甲氧基矽烷、間胺基苯基三乙氧基矽烷以及間胺基苯 基甲基二乙氧基矽烷等。 / v 上述單胺之中’就所得膜之耐久性優異之方面而言, 較好的是對胺基苯基三甲氧基矽烷、對胺基苯基三乙氧基 石夕院、間胺基苯基三甲氧基矽烷、間胺基苯基三乙氧基矽 烧、3-胺基丙基三曱氧基矽烷以及3_胺基丙基三乙氧基矽 烧’尤其好的是3-胺基丙基三乙氧基矽烷。 該些單胺可單獨使用一種或者組合兩種或兩種以上使 用。 1^1X3) 具有1個醢酐基之化合物(an 37 200902644 本發明中所使用的具有1個酸酐基之化合物(al,), 可列舉上述通式(1')所表示之羧酸酐。 本發明中所使用的具有1個酸酐基之化合物(al,)並 無特別限定,具體例可列舉:三甲氧基矽烷基丙基琥珀酸 酐、三乙氧基矽烷基丙基琥珀酸酐、甲基二甲氧基矽烷基 丙基琥珀酸酐、曱基二乙氧基矽烷基丙基琥珀酸酐、三甲 氧基矽烷基丁基琥珀酸酐、三乙氧基矽烷基丁基琥珀酸 酐、甲基二乙氧基矽烷基丁基琥珀酸酐、對(三甲氧基矽烷 基)苯基琥珀酸酐、對(三乙氧基矽烷基)苯基琥珀酸酐、對 (甲基一甲氧基石夕烧基)苯基玻珀酸酐、對(甲基二乙氧基石夕 烷基)苯基琥珀酸酐、間(三曱氧基矽烷基)笨基琥珀酸酐、 間(二乙氧基石夕院基)苯基玻站酸酐、間(甲基二乙氧基石夕烧 基)苯基琥珀酸酐等。 於上述化合物中,就所得膜之耐久性優異之方面而 言,較好的是對(三曱氧基矽烷基)苯基琥珀酸酐、對(三乙 氧基矽烷基)苯基琥珀酸酐、間(三甲氧基矽烷基)苯基琥珀 酸酐、間(三乙氧基矽烷基)苯基琥珀酸酐、三曱氧基矽烷 基丙基琥珀酸酐以及三乙氧基矽烷基丙基琥珀酸酐:尤^ 好的是三乙氧基矽烷基丙基琥珀酸酐。 該些具有1個酸酐基之化合物可單獨使用—種或者組 合兩種或兩種以上使用。 L3 (4)二胺 本發明中所使用的一fee ( a2 ) ’可列舉上述通式(^,) 所表示之二胺。 38 200902644 本發明中所使用的二胺(a2')只要具有2個胺基,則 並無特別限定,例如可列舉:對苯二胺、間笨二胺、對二 甲笨二胺、4,4'-二胺基二苯基曱烷、4,4匕二胺基-l,2-二苯 基乙烧、4,4'-二胺基·1,3-二苯基丙烧、2,2-雙(4-胺基苯基) 丙烷、雙(4-胺基-3-甲基苯基)曱烷、1,2-雙-(4-胺基-3-甲基 苯基)乙院、雙(4-胺基-2-甲基苯基)曱烧、1,2-雙-(4-胺基-2-曱基苯基)乙烧、4,4'-二胺基二苯基醚、3,3'-二胺基二苯基 醚、4,4'-二胺基二苯基颯、4,4'-二胺基二苯硫醚、4,4,-二胺 基一本基_、4,4'-二胺基二苯基-2,2’-丙烧、1,4-二胺基環 己烷、4,4’-二胺基二環己基甲燒、ι,4_雙[(4-胺基笨基)曱基] 苯、1,4_雙(4-胺基苯氧基)苯、ι,3_雙(4-胺基笨氧基)笨、2,2- 雙[4-(4-胺基苯氧基)苯基]丙烷、2,2_雙[4_(4_胺基苯氧基) 苯基]氟丙烷、雙[4-(4_胺基苯氧基)苯基]颯、雙[4_(4_胺基 苯氧基)笨基]聯苯、1,3-雙[4-(4-胺基苄基)苯基]丙烷、 雙[4-(4_胺基苄基)苯基]己烷、5_苯基曱基_丨,3_二胺基苯、 5-[4_(4_烧基環己基)苯基]曱基_153_二胺基苯、5_[4_(4_(4_ 烷基環己基)環己基)苯基]曱基二胺基笨、5_[((烷基環 己基)乙基環己基)苯基]曱基4,3·二胺基苯、-雙[4_(4一胺 基苯^基)笨基]環己烷、U-雙[4-(4-胺基笨氧基)苯基]_4_ 烷基環己烷、丨,1·雙[4-(4_胺基苄基)苯基]環己烷、1,丨_雙 [4_(4_胺基节基)苯基]-4-烷基環己烷、1,3-雙(3_胺基丙基)_ 四甲基二錢烧,且可列舉下述通式(^ )〜㈤ 示之化合物。 [化 37] 39 200902644In the above specific order of the compound having two or more acid anhydrides, the styrene-maleic anhydride copolymer, from the formula (bl_i), (bl_5) (bl-6Hbl-7Hbl-8) Kbl-9) ^(bl-14)&gt;(The compound represented by bM8Hbl.20 has high solubility in a solvent, and water is preferred. Further, 'transparency according to inkjet ink is particularly good in this case. The reverse is sometimes required Η 疋 using styrene-cis-butyl bismuth 36 200902644 27225pif 轩 copolymer, from the formula (bl-6), (bl-7), (bl_8), (bl outside (Μ_14) (bl-18), etc. The compound represented by π and 'the above-mentioned job' has the acid anhydride group of the two cut-offs, and can be used alone or in combination of two or more. L3 (2) Monoamine The monoamine (a2) used in the above-mentioned general formula (2) is exemplified by the above formula (2). (' The monoamine (a2) used in the present invention is not particularly limited, and specific examples thereof For example, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxysulfate, 3-aminopropylmethyldimethoxycarbazide, 3-aminopropylmethyl Diethoxy矽, 4-aminobutyltrimethoxy decane, 4-aminobutyl triethoxy decane, 4-aminobutyl dimethyl diethoxy decane, p-aminophenyl trimethoxy decane, Aminophenyl triethoxy decane, p-aminophenylmethyl monomethoxy decane, p-aminophenyl methyl diethoxy oxime, m-aminophenyl methoxy decane, m-amino group Phenyltriethoxydecane, m-aminophenylmethyldiethoxydecane, etc. / v Among the above monoamines, in terms of excellent durability of the obtained film, p-aminobenzene is preferred. Trimethoxy decane, p-aminophenyl triethoxy sylvestre, m-aminophenyl trimethoxy decane, m-aminophenyl triethoxy oxime, 3-aminopropyl tridecyloxy The decane and the 3-aminopropyltriethoxysulfonate are particularly preferably 3-aminopropyltriethoxydecane. These monoamines may be used alone or in combination of two or more. ^1X3) A compound having one phthalic anhydride group (an 37 200902644 The compound (al) having one acid anhydride group used in the present invention, and the above formula (1') can be cited. The carboxylic anhydride represented by the present invention is not particularly limited as long as the compound (al) having one acid anhydride group used, and specific examples thereof include trimethoxydecylpropyl succinic anhydride and triethoxy decylpropyl group. Succinic anhydride, methyl dimethoxydecyl succinic anhydride, decyl diethoxy decyl propyl succinic anhydride, trimethoxy decyl butyl succinic anhydride, triethoxy decyl butyl succinic anhydride, Methyldiethoxydecyl butyl succinic anhydride, p-(trimethoxydecyl)phenyl succinic anhydride, p-(triethoxydecyl)phenyl succinic anhydride, p-(methyl-methoxy oxalate) Phenylboroic anhydride, p-(methyldiethoxycarbenyl)phenylsuccinic anhydride, m-(trimethoxydecyl)succinic succinic anhydride, m-(diethoxy-stone) Base glass station anhydride, m-(methyldiethoxy oxalate) phenyl succinic anhydride, and the like. Among the above compounds, in terms of excellent durability of the obtained film, p-(trimethoxydecylalkyl)phenylsuccinic anhydride, p-(triethoxydecyl)phenylsuccinic anhydride, and (trimethoxydecyl)phenyl succinic anhydride, m-(triethoxydecyl)phenyl succinic anhydride, tridecyloxy decyl succinic anhydride, and triethoxy decyl propyl succinic anhydride: especially Preferred is triethoxydecyl propyl succinic anhydride. These compounds having one acid anhydride group may be used singly or in combination of two or more kinds. L3 (4) Diamine The "fee ( a2 ) ' used in the present invention may, for example, be a diamine represented by the above formula (^,). 38 200902644 The diamine (a2') used in the present invention is not particularly limited as long as it has two amine groups, and examples thereof include p-phenylenediamine, m-diphenylamine, p-diphenylammonium diamine, and 4, 4'-Diaminodiphenylnonane, 4,4匕diamino-1,2-diphenylethene, 4,4'-diamino-1,3-diphenylpropane, 2 , 2-bis(4-aminophenyl)propane, bis(4-amino-3-methylphenyl)decane, 1,2-bis-(4-amino-3-methylphenyl)乙院, bis(4-amino-2-methylphenyl) oxime, 1,2-bis-(4-amino-2-mercaptophenyl) ethene, 4,4'-diamine Diphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfonium, 4,4'-diaminodiphenyl sulfide, 4,4,-di Amino-based, benzyl, 4,4'-diaminodiphenyl-2,2'-propan, 1,4-diaminocyclohexane, 4,4'-diaminodicyclohexyl Burned, i, 4_bis[(4-aminophenyl)indolyl] benzene, 1,4-bis(4-aminophenoxy)benzene, iota, 3-bis(4-aminophenyloxy) Stupid, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis[4-(4-aminophenoxy)phenyl]fluoropropane, double [4] -(4_Aminophenoxy)phenyl]indole, bis[4_(4-aminobenzene) Base)]biphenyl, 1,3-bis[4-(4-aminobenzyl)phenyl]propane, bis[4-(4-aminobenzyl)phenyl]hexane, 5-benzene Base 丨, 3, 3-diaminobenzene, 5-[4-(4-carbocyclohexyl)phenyl]fluorenyl-153-diaminobenzene, 5-[4_(4_(4-alkylcyclohexyl)) Cyclohexyl)phenyl]decyldiamine-based, 5-[((alkylcyclohexyl)ethylcyclohexyl)phenyl]indenyl 4,3·diaminobenzene,-bis[4_(4-amino) Benzene) Cyclohexane, U-bis[4-(4-aminophenyloxy)phenyl]_4_alkylcyclohexane, hydrazine, 1·bis[4-(4-aminobenzyl) Phenyl]cyclohexane, 1, 丨_bis[4_(4-aminophenyl)phenyl]-4-alkylcyclohexane, 1,3-bis(3-aminopropyl)_ Tetramethyl bismuth is calcined, and examples thereof include compounds represented by the following formulas (^) to (f). [化37] 39 200902644

H2N——A1一NH2H2N - A1 - NH2

(IV)(IV)

(V) (VI)(V) (VI)

(VII) H2N nh2 (通式(Π)中, A1為-(CH2)m-,其中m為1〜6之整數, 通式(IV)以及(VI)〜(Μ)中, Α1 為單鍵、-0-、-S-、-S-S_、-S02-、-CO-、-CONH-、 -NHCO-、-C(CH3)2-、-C(CF3)2-、-(CH2)m-、-0-(CH2)m-0-、 -S-(CH2)m-S-,其中m為1〜6之整數, A2 為單鍵、-Ο-、-S-、-CO-、-C(CH3)2-、-C(CF3)2-或 者碳數1〜3之亞烧基, 於環己烷環或者苯環上鍵結之氫可經-F、-CH3取代。) 40 200902644 27225pif 通式(Π )所表示之二胺,例如可列舉下式(Π-1) 〜(Π-3)所表示之二胺。 [化 38] 11-3 H-1 11-2 η2νγ η2ν/χ^ΝΗ2 η2ν&quot; 通式(ΠΙ )所表示之二胺,例如可列舉下式(ΠΙ-1) 以及(II-2)所表示之二胺。 [化 39] 111-1 II1-2 h2n-(VII) H2N nh2 (In the formula (Π), A1 is -(CH2)m-, wherein m is an integer of 1 to 6, in the formula (IV) and (VI) to (Μ), Α1 is a single bond , -0-, -S-, -S-S_, -S02-, -CO-, -CONH-, -NHCO-, -C(CH3)2-, -C(CF3)2-, -(CH2) M-, -0-(CH2)m-0-, -S-(CH2)mS-, wherein m is an integer from 1 to 6, and A2 is a single bond, -Ο-, -S-, -CO-, - C(CH3)2-, -C(CF3)2- or a calcined group having a carbon number of 1 to 3, and a hydrogen bonded to a cyclohexane ring or a benzene ring may be substituted by -F and -CH3.) 40 200902644 27225pif The diamine represented by the formula (Π) may, for example, be a diamine represented by the following formula (Π-1) to (Π-3). 11-3 H-1 11-2 η2νγ η2ν/χ^ΝΗ2 η2ν&quot; The diamine represented by the formula (ΠΙ) is, for example, represented by the following formulas (ΠΙ-1) and (II-2) Diamine. [化39] 111-1 II1-2 h2n-

-NH 2 H2N-f 7-NH2 通式(IV)所表示之二胺,例如可列舉下式(1Y-1) 〜(IV-3)所表示之二胺。 [化 40] IV-1 IV-2 IV-3-NH 2 H2N-f 7-NH2 The diamine represented by the formula (IV) is, for example, a diamine represented by the following formulas (1Y-1) to (IV-3). [IV 40] IV-1 IV-2 IV-3

通式(V)所表示之二胺,例如可列舉下式(V-1) 〜(V-5)所表示之二胺。 [化 41] 41 200902644 V-1 V-2 V-3The diamine represented by the formula (V) is, for example, a diamine represented by the following formulas (V-1) to (V-5). [41] 41 200902644 V-1 V-2 V-3

V-4 V-5 h2n-^^-nh2 h2n-^^-nh2V-4 V-5 h2n-^^-nh2 h2n-^^-nh2

通式(VI)所表示之二胺,例如可列舉下式(VI-1) 〜(VI-30)所表示之二胺。 k [化 42]The diamine represented by the formula (VI) is, for example, a diamine represented by the following formulas (VI-1) to (VI-30). k [化42]

[化 43] V I - 1 0 V I - 1 1 h2N-NH2 VI-12V I - 1 0 V I - 1 1 h2N-NH2 VI-12

42 200902644 27225pif [化 44] V I - 1 6 V I - 1 7 h2n-^^〇^〇'-{^-nh2 h2n-^&gt;-0-^0^^nh2 VI-18 VI-19 v I - 2 Ο V I - 2 1 H2N-x〇^S^G^NH2 h2n-&lt;Q&gt;^%^^-nh2 f ' [化 45] V I -2 2 V I -2 3 h2n-^Ks^s^j&gt;-nh2 h2n-^^s-^\s^j&gt;-nh2 V I-2 4 V I -2 5 吵―叫 H2N—^3kSn'/&quot;&quot;'&quot;n^x^s'n&lt;(^—叫42 200902644 27225pif [化44] VI - 1 6 VI - 1 7 h2n-^^〇^〇'-{^-nh2 h2n-^&gt;-0-^0^^nh2 VI-18 VI-19 v I - 2 Ο VI - 2 1 H2N-x〇^S^G^NH2 h2n-&lt;Q&gt;^%^^-nh2 f ' [Chem. 45] VI -2 2 VI -2 3 h2n-^Ks^s^j&gt ;-nh2 h2n-^^s-^\s^j&gt;-nh2 V I-2 4 VI -2 5 Noisy - called H2N-^3kSn'/&quot;&quot;'&quot;n^x^s'n&lt; (^-call

通式(w)所表示之二胺,例如可列舉下式(νπ-ι) 〜(W-6)所表示之二胺。 [化 46] 43 200902644 VII- 1 VII- 2The diamine represented by the formula (w) is, for example, a diamine represented by the following formula (νπ-ι) to (W-6). [Chem. 46] 43 200902644 VII- 1 VII- 2

VII- 5 VII- 6 通式(M)所表示之二胺,例如可列舉下式(M-Ι) 〜(VE-11 )所表示之二胺。 [化 47] 44 200902644 27225pif VIII-1 VIII-2 VIII-3 VIII-4VII-5 VII-6 The diamine represented by the formula (M) is, for example, a diamine represented by the following formula (M-Ι) to (VE-11). 44 200902644 27225pif VIII-1 VIII-2 VIII-3 VIII-4

VIII-5 VIII-6 VIII-7 VIII-8VIII-5 VIII-6 VIII-7 VIII-8

VIII-9VIII-9

通式(Π )〜(M)所表示之二胺(a2')之上述具體 例中,更好的可列舉由式(V-1)〜(V-5)、式(VI-1) 〜(VI-12)、式(VI-26)、式(YI-27)、式(YH-1)、式(ΥΠ 45 200902644 -2)、式(VH-6)、式(M-Ι)〜(M-5)所表示之二胺,進 而好的可列舉由式(V-6)、式(V-7)、式(VI-1)〜(VI -12)所表示之二胺。 本發明中所使用的二胺(a2〇,進而可列舉下述通式 (IX)所表示之二胺。 [化 48]In the above specific examples of the diamine (a2') represented by the formula (Π) to (M), the formula (V-1) to (V-5) and the formula (VI-1) are more preferable. (VI-12), Formula (VI-26), Formula (YI-27), Formula (YH-1), Formula (ΥΠ 45 200902644 -2), Formula (VH-6), Formula (M-Ι)~ Further, the diamine represented by the formula (V-5), preferably a diamine represented by the formula (V-6), the formula (V-7), or the formula (VI-1) to (VI-12). The diamine (a2〇 used in the present invention may furthermore be a diamine represented by the following formula (IX).

(通式(IX)中, A3 為單鍵、-0-、-COO-、-OCO-、-CO-、-CONH-或 者-(CH2)m-(式中,m為1〜6之整數), R6為具有類固醇骨架之基團、下述通式(X )所表示 之基團或者於苯環上鍵結之2個胺基之位置關係為對位時 為碳數1〜30的烷基、或該位置關係為間位時為碳數1〜 30之烷基或者苯基, 該烷基中,任意的-CH2-可經-CF2-、-CHF-、-0-、 -CH=CH-或者-C三C-取代,-CH3可經-CH2F、-CHF2或者 -CF3取代, 於該笨基之成環碳上鍵結的氫可經-F、-CH3、-OCH3、 -OCH2F、-OCHF2 或者-OCF3 取代。) [化 49] 46 (X ) 200902644 27225pif(In the formula (IX), A3 is a single bond, -0-, -COO-, -OCO-, -CO-, -CONH- or -(CH2)m- (wherein m is an integer of 1 to 6) And R6 is a group having a steroid skeleton, a group represented by the following formula (X) or a positional relationship of two amine groups bonded to a benzene ring, which is a carbon number of 1 to 30 in the para position. The base or the positional relationship is an alkyl group having a carbon number of 1 to 30 or a phenyl group, and any of the -CH2- may be -CF2-, -CHF-, -0-, -CH= in the alkyl group. CH- or -C tri-C-substitution, -CH3 may be substituted by -CH2F, -CHF2 or -CF3, and the hydrogen bonded to the ring-forming carbon of the stupid group may be via -F, -CH3, -OCH3, -OCH2F , -OCHF2 or -OCF3 is substituted.) [Chem. 49] 46 (X ) 200902644 27225pif

(通式(X)中, A4以及A5分別獨立為單鍵、-〇-、-COO-、-OCO-、 -CONH-、-CH=CH-或者碳數1〜12之亞烷基, R7以及R8分別獨立為-F或者_Ch3,(In the general formula (X), A4 and A5 are each independently a single bond, -〇-, -COO-, -OCO-, -CONH-, -CH=CH- or an alkylene group having 1 to 12 carbon atoms, R7 And R8 is independently -F or _Ch3,

環S為1,4-亞苯基、1,4-亞環己基、1,3-二嚼院_2,5-二 基、嘧啶-2,5-二基、吡啶-2,5-二基、萘_1,5_二基、萘_2,7_ 二基或者蒽-9,10-二基, R9為-H、-F、碳數1〜30之烷基、碳數1〜3〇之氟取 代院基、碳數1〜30之烷氧基、-CN、-〇CH2F、-〇CHF2 或者-〇CF3 , a以及b分別獨立表示0〜4之整數, 士 ^、d以及e分別獨立表示〇〜3之整數,e為2或者3 柃,多個環S可為相同基團,亦可為不同基團, f以及g分別獨立表示0〜2之整數,並且 c+d+e^i0 ) 於通式(K)中,2個胺基鍵結於笨環碳上,2個 之鍵結位置關係較好的是間位或者對位。進秘「土 =位=:=好的是2個胺基分別鍵結於3位」 所表示之二胺’例如可列舉下述通式(IX )〔仅-n)所表示之二胺。 、 [化 50] 47 200902644 ίRing S is 1,4-phenylene, 1,4-cyclohexylene, 1,3-two chewing compound _2,5-diyl, pyrimidine-2,5-diyl, pyridine-2,5-di Base, naphthalene_1,5-diyl, naphthalene_2,7-diyl or fluoren-9,10-diyl, R9 is -H, -F, alkyl having 1 to 30 carbon atoms, carbon number 1 to 3氟 氟 氟 院 院 院 院 取代 取代 取代 取代 取代 取代 取代 取代 取代 取代 取代 取代 取代 取代 取代 取代 取代 取代 氟 取代 取代 取代 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟 氟Individually representing an integer of 〇~3, e is 2 or 3 柃, multiple rings S may be the same group, or different groups, f and g respectively represent integers of 0~2, and c+d+ e^i0) In the general formula (K), two amine groups are bonded to the stupid ring carbon, and the two bonding positions are preferably the meta or para position. The diamine which is represented by the following general formula (IX) [only - n) is exemplified as the "diamine which is preferably bonded to the two amine groups at the three positions". , [50] 47 200902644 ί

I Χ-6I Χ-6

[化 51] I Χ_7 h2n[化 51] I Χ_7 h2n

I X-8I X-8

R 19 19R 19 19

R 於上述通式(IX-l)、aX-2)、(IX-7)以及(IX-8)中 48 200902644 R]8為虱或者碳數1〜30之有機基,該些中較好的是碳數3 〜12之烧基或者碳數3〜12之烧氧基,進而好的是碳數5 〜12之烧基或者$反數5〜12之烧氧基。又’於上述通式(汉 -3)〜(K-6)以及(K-9)〜(IX-11)中,R]9 為^ 或者 碳數1〜30之有機基,該些中較好的是碳數丨〜1〇之烷基 或者碳數1〜10之烷氧基,進而好的是碳數3〜1〇之烷^ 或者碳數3〜10之烷氧基。R is preferably an organic group having a hydrazine or a carbon number of 1 to 30 in the above formula (IX-1), aX-2), (IX-7), and (IX-8) 48 200902644 R]8. The alkyl group having a carbon number of 3 to 12 or an alkoxy group having a carbon number of 3 to 12 is preferably an alkoxy group having a carbon number of 5 to 12 or an inverse number of 5 to 12. Further, in the above formula (Han-3) to (K-6) and (K-9) to (IX-11), R]9 is an organic group having a carbon number of from 1 to 30, and Preferably, it is an alkyl group having a carbon number of 〇1〇 or an alkoxy group having a carbon number of 1 to 10, and further preferably an alkane having a carbon number of 3 to 1 Å or an alkoxy group having a carbon number of 3 to 10.

通式(IX)所表示之二胺,進而例如可列舉下述通式 (IX-12)〜(K-17)所表示之二胺。Further, examples of the diamine represented by the formula (IX) include diamines represented by the following formulae (IX-12) to (K-17).

[化 52][化52]

々、丄心必八、认_12)〜(κ·15)中, 二之有 數6〜16之说基。於通式(Κ-16)與式( 為碳數2〜30之有機基,較好 (Κ-17)中 而好的是碳數8〜2〇之烷基。、厌文6〜20之烷基’ 通式(IX)所表示之二 ^而例如可列舉下述ΐί 49 200902644 (K-18)〜(K-38)所表示之二胺。々, 丄心必八, _12) ~ (κ·15), two of which have a number of 6~16. In the formula (Κ-16) and the formula (which is an organic group having 2 to 30 carbon atoms, preferably (Κ-17), it is preferably an alkyl group having a carbon number of 8 to 2 Å. The alkyl group represented by the formula (IX) may, for example, be a diamine represented by the following 49 49 49 200902644 (K-18) to (K-38).

50 20090264450 200902644

51 20090264451 200902644

H2N 於上述通式(K-18)、(IX-19)、(K-22)、(ix_24)、(ix -25 )、2(2汉-28 )、( Κ-30 )、( K_3! )、( κ_36)以及(汉·”) 中,R為氫或者碳數1〜30之有機基,較好的是碳數 12之烷基、碳數ι〜12之烷氧基,進而好的是碳數3〜12 之烷基或者碳數3〜12之烷氧基。又,於上述通式(汉 -20)^(]Χ-21)&gt;(ιχ.23)&gt;(]Χ-26)&gt;(ΙΧ-27)&gt;(Ιχ.29)^(ΙΧ -32)〜(Κ-35)以及(κ·38)中,R23 為_H、-F、碳數 1 〜12之烷基、碳數1〜12之院氧基、_cn、_〇ch2F、-〇CHF2 或者-OCF3 ’進而好的是碳數3〜12之烧基或者碳數3〜12 之炫氧基。於上述通式(!χ_33)與(κ_34)中,A9為碳 52 200902644 數1〜12之亞烷基。H2N is in the above formula (K-18), (IX-19), (K-22), (ix_24), (ix -25), 2 (2 Han-28), (Κ-30), (K_3! , (κ_36) and (Han·), wherein R is hydrogen or an organic group having 1 to 30 carbon atoms, preferably an alkyl group having 12 carbon atoms and an alkoxy group having a carbon number of 1-4, and further preferably It is an alkyl group having 3 to 12 carbon atoms or an alkoxy group having 3 to 12 carbon atoms. Further, in the above formula (Han-20)^(]Χ-21)&gt;(ιχ.23)&gt;(]Χ -26)&gt;(ΙΧ-27)&gt;(Ιχ.29)^(ΙΧ -32)~(Κ-35) and (κ·38), R23 is _H, -F, carbon number 1 to 12 The alkyl group, the oxy group having 1 to 12 carbon atoms, _cn, _〇ch2F, -〇CHF2 or -OCF3' are further preferably a decyl group having a carbon number of 3 to 12 or a methoxy group having a carbon number of 3 to 12. In the above formula (!χ_33) and (κ_34), A9 is an alkylene group of carbon 52 200902644 number 1 to 12.

通式(IX)所表示之二胺,進而例如可列舉下式(IX -39)〜(IX-48)所表示之二胺。 [化 56]Further, the diamine represented by the formula (IX) may, for example, be a diamine represented by the following formulas (IX-39) to (IX-48). [化56]

[化 57] 53 200902644[化57] 53 200902644

於通式(IX)所表示之二胺(a2’)中,較好的是通式 (IX-1)〜(IX-11 )所表示之二胺,進而好的是由通式(IX -2)、(1X-4)、(IX-5)以及(IX-6)所表示之二胺。 本發明中所使用的二胺(a2〇,進而可列舉下述通式 (XI )以及(XU )所表示之化合物。 [化 58] 54Among the diamines (a2') represented by the formula (IX), preferred are the diamines represented by the formulae (IX-1) to (IX-11), and further preferably by the formula (IX). 2), a diamine represented by (1X-4), (IX-5), and (IX-6). The diamine (a2〇 used in the present invention may furthermore be a compound represented by the following formula (XI) and (XU). [Chem. 58] 54

(XI)200902644 M/ZZ^pU d11 R11 η2ν(XI)200902644 M/ZZ^pU d11 R11 η2ν

(XII) (通式(¾)與(XE)中, ΰΐο^ρΐΐ ν 6、 为別獨立為-Η或者碳數1〜20之烷基或烯基, A。分別獨立為單鍵、_c(=〇)_或者_CH2_, ^以及R14分別獨立為_H、碳數1〜2〇之烷基或者苯 \.(XII) (In the formulas (3⁄4) and (XE), ΰΐο^ρΐΐ ν 6 is an alkyl group or an alkenyl group which is independently -Η or a carbon number of 1 to 20, A. independently a single bond, _c ( =〇)_ or _CH2_, ^ and R14 are independently _H, carbon number 1~2〇 alkyl or benzene\.

R1 R14 基 上^式(XI )中’較好的是2個「顺2秦,〇-」 C、中,Ph表示亞苯基。)中的— 位’另一個鍵結於6位。又 '頰叫核之3 上’較好喊姆於W讀处^鍵於苯環破 通式(w所表示之二胺,立或者對位。 〜(XI-4)所表示之二胺。 式(XI 1) [化 59] 55 200902644R1 R14 is preferably in the formula (XI). Two are preferably "cis-Qin, 〇-" C, and Ph is a phenylene group. The - bit in the other is tied to 6 bits. Also, 'the buccal nucleus 3' is better than the yoke in the W reading ^ key in the benzene ring breaking formula (w represented by the diamine, standing or para position. ~ (XI-4) represented by the diamine. Formula (XI 1) [Chem. 59] 55 200902644

H〇fH〇f

Ph表示亞苯基。)分別鍵結於苯環碳上,較好的是鍵結於 相對於類固醇核所鍵結之碳為間位或者對位之碳上。又,2 個胺基分別鍵結於苯環碳上,較好的是相對於A6鍵結於間 位或者對位。 通式(XE)所表示之二胺,例如可列舉下式(XH-1 ) 〜(M-8)所表示之二胺。 [化 60] 56 200902644 27225pifPh represents a phenylene group. ) are respectively bonded to the benzene ring carbon, preferably bonded to the carbon which is meta or para to the carbon bonded to the steroid nucleus. Further, the two amine groups are bonded to the benzene ring carbon, respectively, and it is preferably bonded to the meta or para position with respect to A6. The diamine represented by the formula (XE) is, for example, a diamine represented by the following formula (XH-1) to (M-8). [化60] 56 200902644 27225pif

57 20090264457 200902644

Z /ZZDpiI 本發明中所使用的二胺(a2'),進而可列舉下述通式 (ΧΠΙ )以及(XIV)所表示之化合物。 [化 62]Z / ZZDpiI The diamine (a2') used in the present invention may, for example, be a compound represented by the following formula (ΧΠΙ) and (XIV). [化 62]

R15為-H或者碳數1〜20之烷基,該烷基中碳數2〜 20之烷基之任意的-CH2-可經-0-、-CH=CH-或者-CeC-取 代, A7分別獨立為-0-或者碳數1〜6之亞烷基, A8為單鍵或者碳數1〜3之亞烷基,R15 is -H or an alkyl group having 1 to 20 carbon atoms, and any -CH2- of the alkyl group having 2 to 20 carbon atoms in the alkyl group may be substituted by -0-, -CH=CH- or -CeC-, A7 Each is independently -0- or an alkylene group having 1 to 6 carbon atoms, and A8 is a single bond or an alkylene group having 1 to 3 carbon atoms.

環T為1,4-亞苯基或者1,4-亞環己基, h為0或者1。) [化 63] 〇16 d17Ring T is 1,4-phenylene or 1,4-cyclohexylene, and h is 0 or 1. ) [Chem. 63] 〇16 d17

(XIV) R16為碳數6〜22之烷基, R17為-H或者碳數1〜22之烷基, 58 200902644 27225pif A7分別獨立為_〇_或者碳數1〜6之亞烷基。) 於上述通式(xm)中,2個胺基分別鍵結於苯環碳 上,較好的是相對於A7鍵結於間位或者對位。 通式(xm)所表示之二胺,例如可列舉下述通式(χ 皿-ι)〜(xm-9)所表示之二胺。 [化 64](XIV) R16 is an alkyl group having 6 to 22 carbon atoms, R17 is -H or an alkyl group having 1 to 22 carbon atoms, and 58 200902644 27225pif A7 is independently an alkylene group having _〇_ or a carbon number of 1 to 6. In the above formula (xm), the two amine groups are bonded to the benzene ring carbon, respectively, and it is preferably bonded to the meta or para position with respect to A7. The diamine represented by the formula (xm) may, for example, be a diamine represented by the following formula (yttrium-ι) to (xm-9). [化 64]

[化 65] 59 200902644 ζ/ζζ^ρπ[Chem. 65] 59 200902644 ζ/ζζ^ρπ

R ,25R, 25

Ί、碳數l〜2〇之烷基,於(xm-4)〜(xm-9)中, R2S進而好的是·Η、碳數1〜10之烷基。 f 於上述通式(XIV)中,2個胺基分別鍵結於笨環碳 ,較好的是相對於Α7鍵結於間位或者對位。 通式(X IV )所表示之-聪;a丨/ 以~1)〜(XIV-3)所表示之' [化 66]Ί, an alkyl group having a carbon number of 1 to 2 Å, in (xm-4) to (xm-9), and further preferably R2S is an alkyl group having 1 to 10 carbon atoms. f In the above formula (XIV), the two amine groups are bonded to the stupid ring carbon, respectively, and it is preferably bonded to the meta or para position with respect to Α7. The formula (X IV ) is represented by - Cong; a丨 / expressed by ~1) ~ (XIV-3) '[66]

胺例如可列舉下述通式(X -胺0 60 200902644 27225pif X I V- 1 R26 R27 0¾ X I V— 2 r V R26 R27 \ /、 ^0¾ X I V— 3 Γ=·~~\ R(6护 於上述通式 (Χΐν·ι)〜 、θ~ΝΗ2 (XIV-3)中,r26 R27 1 —,丁入〜口、J是碳數ό〜20之卜人The amine may, for example, be exemplified by the following formula (X-amine 0 60 200902644 27225pif XI V-1 R26 R27 03⁄4 XIV-2 r V R26 R27 \ /, ^03⁄4 XIV-3 Γ=·~~\ R In the general formula (Χΐν·ι)~, θ~ΝΗ2 (XIV-3), r26 R27 1 —, Ding into the mouth, J is the carbon number ό~20

為碳數2〜30之有機基,該些中進而 =基,R 〜10之烷基。 七或者碳數 如上所述’本發明中所使用的 通式⑻〜(XIV)所表示之二胺,二如可使用 胺以外的二胺。例如,可將具有萃可使用該些二 ,結構之第系二胺、或者具有錢^,二胺、具有 早獨使用或者與其他二魏合使/❺贼系二胺等 矽氧烷系二胺並無特別限定, 下述通式(XV)所表示之产^中可較好地使 [化67] 乳几糸一胺。 (XV) (上逑通式(XV)令,r3 及R獨立為碳數i〜3 61 200902644 之烧基或者苯基,R5獨立為亞W、絲基或者經烧基取 代之亞苯基,X獨立為!〜6之整數為 其中,更好的是y為卜15之整數。) 之正數 進而好的是,本發明中所使用的二胺(a2,)可使用下 述通式(XVI-1 )〜(XV!_8)所表示之二胺。 [化 68]It is an organic group having 2 to 30 carbon atoms, and further wherein these are further a group and an alkyl group of R 10 to 10. Seven or carbon number As described above, the diamine represented by the general formulae (8) to (XIV) used in the present invention may be, for example, a diamine other than an amine. For example, it is possible to use a diamine which has a structure in which these two structures can be used, or a methane, a diamine, an early use alone or a dioxane-based diamine such as a diamine. The amine is not particularly limited, and the product represented by the following formula (XV) can preferably be a compound of the formula. (XV) (Upper 逑 (XV), r3 and R are independently a carbon group i~3 61 200902644 or a phenyl group, and R5 is independently a sub-W, a silk group or a pyridyl substituted phenylene group. X is independently an integer of ~6, and more preferably y is an integer of 152.) The positive number is further preferably, the diamine (a2,) used in the present invention can be represented by the following formula (XVI). -1 ) The diamine represented by ~(XV!_8). [68]

XVI-2 XVi'3XVI-2 XVi'3

另外二本發明中可使用的二胺(a2,)並不限定於本說 明書之二胺,可於達成本發明之目的的範圍内使用盆 種形態的二胺。 又,本發明中可使用的二胺(a2,)可單獨使用一種或 者^合兩種或兩種以上加以使用。#,兩種或兩種以上之 二胺的組合可使用:上述二胺彼此的組合、上述二胺與其 62 200902644 27225pif 一又,、=或者上述二胺以外之二胺彼此的組合。 此情形時用墨,树要“透雜,於 通式(xv)l;:—的是”二胺基二苯基石風以及上述 一 ^ 〜15之整數的二胺。 ^-^±dt±4^ (B) (B )可^本發明之嘴墨用墨水中的高分子化合物 亞胺、聚:胺酸性聚醯亞胺、聚醯胺、聚醯胺醯 物、聚乙烯醇、丙稀酸聚合物、丙稀酸西1聚合 所述化合物。私聚乳乙烯等向分子化合物,但並不限定於 醯亞胺系古父好的是聚醯胺酸或者可溶性聚醯亞胺等聚 &quot; 二向分子化合物,例如可較好地列兴拉願 2亞料之㈣賴、或者此«舰之醯 亞胺絲合物,但並不限定於所述化合物。 臭之可藉由至少制具有大於等於2個之酸野 並不限⑽_,但 物使㈣具有大於等於2個之酸祕之化合 的结女协f例,可使用與上述可用於獲得石夕紐酸(Α) 物/。、 ' :於2個之酸酐基之化合物(al)相同的化合 63Further, the diamine (a2) which can be used in the present invention is not limited to the diamine of the present specification, and a diamine in a pot form can be used within the range in which the object of the present invention is achieved. Further, the diamine (a2,) which can be used in the present invention may be used singly or in combination of two or more kinds. #, A combination of two or more kinds of diamines may be used: a combination of the above diamines, a combination of the above diamines and a diamine other than the above diamines. In this case, the ink is used, and the tree is "transparent" in the formula (xv);: - is a diamine diphenyl stone wind and the above-mentioned diamine of an integer of from -15. ^-^±dt±4^ (B) (B) The polymer compound imine, poly: amine acid polyimine, polyamine, polyamine, or the like in the ink for ink of the present invention. The compound is polymerized with polyvinyl alcohol, a acrylate polymer, and acrylic acid. Privately condensed ethylene ortho-molecule compound, but not limited to 醯imino-based ancient father, poly-phthalic acid or soluble polyimine, etc. I hope that the material of the arsenic of the arsenic is not limited to the compound. The odor can be obtained by at least making the acid field having two or more acid fields and not limited to (10) _, but the material is (4) having a combination of two or more acid secrets. Acid (Α) substance /. , ' : the same compound of the two acid anhydride group compounds (al) 63

200902644 Z/ZZDpiT 具有大於等於2個之酸酐基之化合物(bl)可與具有 大於等於2個之酸酐基之化合物(al)相同,亦可不同。 又’上述揭示之具有酸酐基之化合物可單獨使用一種或者 組合兩種或兩種以上使用。 本發明中所使用的二胺(b2)之具體例,可使用與上 述可用於獲得矽醯胺酸(A,)的二胺(a2,)相同的二胺。 二胺(b2)與二胺(a2')可相同亦可不同。又,上述 揭不之二胺可單獨使用一種或者組合兩種或兩種以上使 用。 單胺㈤) 本發明中所使用的單胺(b3)之具體例,可使用與上 述可用於獲得矽醯胺酸(A)的單胺(a2)相同的單胺、。 單fee (b3)與單胺(a2)可相同亦可不同。又,上述 揭示之單胺可單獨❹-種或者組合兩種或兩種以上= 用。 2A聚醯胺酸之及廄蜂件 本發明中可使用的聚醯胺酸較好的是相對於1莫耳之 具有大於等於2個之酸酐基之化合物(bl),與〇〇5、莫 〜0.8莫耳之二胺(b2)、0.4莫耳〜19莫耳之單胺(b3) 反應而獲得。又,進而好的是相對於丨箪耳 於2個之酸酐基之化合物(bl),與〇1莫耳〜/〇·6莫耳等 二胺(b2)、0.8莫耳〜1.8莫耳之單胺(b3)反應而獲得之 更好的是相對於1莫耳之具有大於等於2個之峡基之化 64 200902644 27225pif -〇·35莫耳之二胺(b2)、1.3莫 反應而獲得。 合物(bl),與0.15莫耳 耳〜1.7莫耳之單胺(b3) 反應溶_彳 、發明中可使於獲得_胺賴麵,可使用 二上^可用於獲得^傾胺酸(A)或者⑧醯胺酸(A')的 /合;=1!相同的岭劑。反應溶射單獨使用,亦可用作兩種或 兩種、上之/tti 5溶劑。又,除上述反應溶劑以外 ,亦可混200902644 Z/ZZDpiT The compound (b1) having two or more acid anhydride groups may be the same as or different from the compound (al) having two or more acid anhydride groups. Further, the above-mentioned compounds having an acid anhydride group may be used singly or in combination of two or more kinds. As a specific example of the diamine (b2) used in the present invention, the same diamine as the above-mentioned diamine (a2) which can be used for obtaining valine acid (A,) can be used. The diamine (b2) and the diamine (a2') may be the same or different. Further, the above diamines may be used singly or in combination of two or more kinds. Monoamine (5)) As a specific example of the monoamine (b3) used in the present invention, the same monoamine as the above-mentioned monoamine (a2) which can be used for obtaining valine acid (A) can be used. The single fee (b3) may be the same as or different from the monoamine (a2). Further, the monoamines disclosed above may be used singly or in combination of two or more kinds. 2A Polyproline and oxime fraction The polyglycine which can be used in the present invention is preferably a compound (bl) having an acid anhydride group of 2 or more with respect to 1 mole, and 〇〇5, Mo It is obtained by reacting ~0.8 mol of diamine (b2) and 0.4 mol to 19 mol of monoamine (b3). Further, further preferably, it is a compound (b1) with respect to two acid anhydride groups, and a diamine (b2) such as 〇1 mol//〇·6 mol, 0.8 mol to 1.8 mol. The monoamine (b3) reaction is more preferably obtained by reacting with 1 mole of a compound having more than 2 gorges, 200902644 27225 pif - 〇 · 35 mol of diamine (b2), 1.3 mol. . Compound (bl), reacted with 0.15 moles to 1.7 moles of monoamine (b3), in the invention, can be used to obtain the amine surface, and can be used to obtain the acid. A) or 8 lysine (A') / 1:1! The same ridge. The reaction solution is used singly or as a solvent of two or two kinds of /tti 5 . Moreover, in addition to the above reaction solvent, it may be mixed

合使用其他溶劑。 反應溶劑若相對於具有大於等於2個之酸針基之化合 物(M)、一胺(b2)與單胺(b3)之總計1〇〇重量份,使 用大於等於100重量份,則反應順利進行,故而較好。較 好的是反應於o°c〜loot (較好的是8t〜7(rc)下進行 0.2小時〜20小時(較好的是2小時〜小時)。 2.4 ( 2 ) 添加至反應系中的川音年 另外,反應原料添加至反應系中的順序並無特別限 定。即,可使用如下方法中的任一種方法:將具&amp;大於等 於2個之酸酐基之化合物(bl)與二胺(b2)與單胺(乜3) 同時添加至反應;*谷劑中的方法,將二胺(b2 )與單胺(b3 ) 溶解於反應溶劑中後添加具有大於等於2個之酸肝基之化 合物(bl)的方法;先使具有大於等於2個之酸酐基之化 合物(bl)與單胺(b3)反應後添加二胺(b2)的方法; 先使具有大於等於2個之酸酐基之化合物(bl )與二胺(b2) 反應合成共聚物後,於此共聚物中添加單胺(b3)的方法 等。 65 200902644 '.ι^Δορη 重量平均分子量為咖〜糊Q之高分子化 尤其對溶劑之溶解性優異,作為用墨水較好标) 曰种,為了進—步提昇高分子化合物⑻對溶劑之 解性」,較好的是高分子化合物⑻的重量平均分= !,000〜聊0,更好的是⑽〜7,5GG,進而好的是= 〜5,000 ’尤其好的是ι,〇〇〇〜3,5〇〇。 ’ 其原因在於:具有大於等於1,000之重量平均分子旦 的高分子化合物⑻不會•祕理而蒸發,於化學性= 機械性方面穩定,具有小於等於2〇,〇〇〇之重量平均八 的高分子化合物⑻可提高對溶劑之溶解性,因:匕可二 大所得塗膜之膜厚,可較好地用作噴墨用墨水。 曰 高分子化合物⑻之重量平均分子量謂由凝朦渗 透層析(GPC)法而測定。具體而言,可藉由如下方法求 得··以四氫咬喃(THF)等將所得高分子化合物⑻之 濃度稀釋錢丨重量百分比(wt%),_ 了(_股份有限 公司製造之管柱(column ) G4000HXL、G3〇〇〇hxl、 g25〇〇hxl以及議0概,以THF為展開劑,藉由凝膠 滲透層析(GPC)法而測定,以聚苯乙烯進行換算。 尤烯基取代納迪克酸醯亞脍化合也m 本發明之喷墨用墨水中所含的稀基取代納迪克酸醯亞 胺化合物⑹’是分子内具有至少丨個烯絲代納迪克酸 醯亞胺結構的化合物,較好的是使單胺、二胺、三胺或者 四胺與上収(5')絲私烯絲代崎克酸酐反應而 66 200902644 27225pif 獲得的烯基取代納迪克酸醯亞胺,更好的是上述通式(5) 所表示之烯基取代納迪克酸醯亞胺化合物,但並不限定於 所述化合物。 烯基取代納迪克酸醯亞胺化合物(c)中存在:η為1 之烯基取代納迪克酸酿亞胺化合物(cl :以下,有時僅稱 為「烯基取代納迪克酸醯亞胺」)、以及η為2之烯基取代 納迪克酸醯亞胺化合物(C2 :以下,有時僅稱為「雙稀基 取代納迪克酸醯亞胺」)、n為3之烯基取代納迪克酸醯亞 胺化合物(c3 :以下,有時僅稱為「三烯基取代納迪克酸 醢亞胺」)、n為4之烯基取代納迪克酸醯亞胺化合物(c4 : 以下’有時僅稱為「四烯基取代納迪克酸醯亞胺」)。 ϋ烯某取代J内迪竞.酸醯亞眩k/n 本發明中所使用的η為1之烯基取代納迪克酸醯亞胺 化合物之具體例’例如可列舉以下化合物。 可列舉:烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 烯丙基曱基雙環[2.2.1]庚-5-烯·2,3-二羧基醯亞胺、 甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 曱基稀丙基曱基雙環[2.2.1]庚-5-烯-2,3-二缓基酸亞 胺、 Ν-經基-烤丙基雙環[m]庚_5_稀_2,3_二羧基醯亞胺、 N-羥基-烯丙基甲基雙環卩.21]庚_5_烯_2,3_二羧基醯 亞胺、 N-羥基-曱基烯丙基雙環[2·21]庚_5_烯_2,3·二羧基醯 亞胺、 67 200902644 Ν-羥基-甲基烯丙基甲基雙環[2.2.1]庚-5·烯-2,3·二羧 基醯亞胺、 Ν-甲基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 Ν-曱基-烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺、 Ν-曱基-甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺、 Ν-曱基-甲基烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺、 Ν-(2-乙基己基)-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺、 以及該些的寡聚物等。 又可列舉:Ν-(2-乙基己基)-烯丙基甲基雙環[2.2.1]庚 -5-烯-2,3-二羧基醯亞胺、 Ν-烯丙基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺、 Ν-烯丙基-烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺、 Ν-烯丙基-曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺、 Ν-異丙烯基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺、 Ν-異丙烯基-烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺、 68 200902644 27225pif N-異丙烯基-曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺、 N-環己基-烯丙基雙環[2.2.1]庚-5-烯_2,3-二羧基醯亞 胺、 N-環己基-烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基 酿亞胺、 N-環己基-甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 酸亞胺、 N-苯基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 以及該些的寡聚物等。 又可列舉:N-苯基-烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 N-苄基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 N-苄基-烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺、 N-苄基-曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺、 N-(2'-羥基乙基)-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 酿亞胺、 N-(2’-羥基乙基)-烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺、 1(2’-羥基乙基)-甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺、 以及該些的寡聚物等。 69 200902644 又可列舉:N-(2',2’-二曱基_3'-羥基丙基)-烯丙基雙環 [2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 N-(2’,2’-二甲基-3’-羥基丙基)-烯丙基甲基雙環[2.2.1] 庚-5-烯-2,3-二羧基醯亞胺、 Ν-(2^-二羥基丙基)·烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺、 Ν-(2\3'-二羥基丙基)·烯丙基曱基雙環[2.2.1 ]庚-5-烯 -2,3-二羧基醯亞胺、 Ν-(3^羥基-Γ-丙烯基)-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 N-(4'-羥基-環己基)-烯丙基甲基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺、 以及該些的寡聚物等。 又可列舉:N-(4’-羥基苯基)-烯丙基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺、 N-(4’-羥基苯基)_烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺、 N-(牝羥基苯基)-甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺、 Ν-(4’-羥基苯基)-曱基烯丙基曱基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺、 Ν-(3’-羥基苯基)-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺、 Ν-(3'-羥基苯基)-烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二 70 200902644 27225pif 羧基醯亞胺、 N-(對羥基苄基)-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 酸亞胺、 N-{2'-(2’-羥基乙氧基)乙基卜烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 以及該些的寡聚物等。 又可列舉:N-{2’-(2'-羥基乙氧基)乙基}-烯丙基曱基雙 環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 N-{2’-(2’-羥基乙氧基)乙基}-甲基烯丙基雙環[2.2.1]庚 -5-炸-2,3-二叛基酿亞胺、 Ν-Ρ'-β-羥基乙氧基)乙基}-曱基烯丙基曱基雙環 [2.2.1] 庚-5-細-2,3-二竣基酿亞胺、 Ν-[2’-{2'-(2”-羥基乙氧基)乙氧基}乙基]-烯丙基雙環 [2.2.1] 庚-5-烯-2,3-二羧基醯亞胺、 Ν-[2'-{2'-(2”-羥基乙氧基)乙氧基}乙基]-烯丙基曱基 雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 Ν-[2’-{2'-(2”-羥基乙氧基)乙氧基}乙基]-曱基烯丙基 雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 Ν-{4’-(4’-羥基苯基亞異丙基)苯基}-烯丙基雙環[2.2.1] 庚-5-^-2,3-二叛基酸亞胺、 N-{4’-(4'-羥基苯基亞異丙基)苯基}-烯丙基曱基雙環 [2.2.1] 庚-5-烯-2,3-二羧基醯亞胺、 N-{4'-(4'-羥基苯基亞異丙基)苯基}-曱基烯丙基雙環 [2.2.1] 庚-5-炸-2,3-二缓基酿亞胺、 71 200902644 z/iz^pu 以及該些的募聚物等。 又,該些烯基取代納迪克酸醯亞胺(cl)可罩 亦可作為該些的混合物而使用。 早獨使用, 上述烯基取代納迪克酸醯亞胺(c N-甲基,丙基雙環[2.2.临5 ^宁較好的可列舉: 曱基,丙基甲基雙環[2.2.1]庚』:二絲醯亞胺、 亞胺、 5-稀-2,3-二羧基醯 N-曱基-曱基烯丙基雙環[221] 亞胺、 次5·烯-2,3-二魏基醯 N-曱基-曱基烯丙基曱基雙環[2. 基酸亞胺、 ]庚-5-稀-2,3-二竣 N-(2-乙基己基烯丙基雙環[2.2 , 醢亞胺等。 庚5-稀-2,3-二缓基 又可列舉:N-(2-乙基己基),内基甲式 •5-烯-2,3-二羧基醯亞胺、 土又衣[2.2.]庚 胺Λ烯丙基咖基雙環[2.2.1]庚,办:綠醯亞 Ν-烯丙基-烯丙基曱基雙環[2.2. 醯亞胺、 庚~5-烯-2,3-二羧基 酿亞=糾基基烯丙基雙叛基 亞胺Ν•異_基郝基雙環叛基醢 ν·異丙稀基-稀丙基甲基雙環[2.21]庚、5_稀_2,3_二竣 72 200902644 27225pif 基酿亞胺、 N-異丙烯基-甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺、 N-環己基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺、 N-環己基-烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺、 N-環己基-曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 隨亞胺、 N-苯基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺 等。 又可列舉:N-苯基-烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 N-苄基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 N-苄基-烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺、 N-苄基-甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺等。 烯基取代納迪克酸醯亞胺(cl)更好的可列舉: N-甲基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺、 N-曱基-烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺、 N-曱基-曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺、 73 200902644 N-曱基-甲基烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺、 &gt;^-(2-乙基己基)-烯丙基雙環卩.2.1]庚-5-烯-2,3-二羧基 醯亞胺等。 又可列舉:N-(2-乙基己基)-烯丙基曱基雙環[2.2.1]庚 -5-細-2,3-二魏基酿亞胺、 N-烯丙基-烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺、 N-烯丙基-烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺、 N-烯丙基-甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 驢亞胺、 N-異丙烯基-烯丙基雙環[2.2.1]庚-5-烯_2,3-二羧基醯 亞胺' N-異丙烯基-烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺、 N-異丙烯基曱基烯丙基雙環P.2.1]庚-5_烯-2,3-二羧 基醯亞胺等。 3.2雙烯基取代納迪克酸醯亞胺(c2) 又,本發明中所使用的η為2之烯基取代納迪克酸醯 亞胺化合物之具體例,例如可列舉以下化合物。 可列舉:Ν,Ν’-亞乙基-雙(烯丙基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺)、 NW-亞乙基-雙(烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二 74 200902644 27225pif 羧基醯亞胺)、 Ν,Ν’-亞乙基-雙(曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺)、 N,N’-三亞曱基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 N,N’-六亞曱基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 N,N'-六亞曱基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 N,N’-十二亞曱基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺)、 Ν,Ν'-十二亞曱基-雙(烯丙基甲基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺)、 Ν,Ν'-亞環己基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 Ν,Ν’-亞環己基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 以及該些的寡聚物等。 又可列舉:1,2-雙{34烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)丙氧基}乙烷、 1.2- 雙{3’-(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺)丙氧基}乙烷、 1.2- 雙{3’-(曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺)丙氧基}乙烷、 75 200902644 雙[2'·{3'_(烯丙基雙環[2.2.1]庚-5-烯·2,3·二羧基醯亞 胺)丙氧基}乙基]醚、 雙[2’-{3’_(烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺)丙氧基}乙基]醚、 1,4-雙{3'-(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)丙氧基} 丁烷、 Μ-雙{3’-(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺)丙氧基} 丁烷、 以及該些的寡聚物等。 又可列舉:Ν,Ν'-對亞苯基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 Ν,Ν'-對亞笨基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 Ν,Ν'-間亞苯基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 Ν,Ν’-間亞苯基-雙(烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 Ν,Ν,-{(1-曱基)-2,4-亞苯基}-雙(烯丙基雙環[2.2.1]庚 -5-烯-2,3-二羧基醯亞胺)、 Ν,Ν’-對苯二曱基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺)、 Ν,Ν’-對苯二甲基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺)、 Ν,Ν'-間苯二曱基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二 76 200902644 27225pif 羧基醯亞胺)、 Ν,Ν’-間苯二曱基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺)、 以及該些的寡聚物等。 又可列舉:2,2-雙[4'-{4'-(烯丙基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺)苯氧基}苯基]丙烷、 2.2- 雙[[{4’-(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)苯氧基}苯基]丙烷、 2.2- 雙[4'-{4'-(甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)苯氧基}苯基]丙烷、 雙{4-(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)苯 基}曱烷、 雙{4-(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)苯基}曱烷、 以及該些的寡聚物等。 又可列舉:雙{4-(甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)苯基}甲烷、 雙{4-(曱基烯丙基曱基雙環[2.2.1]庚-5_烯-2,3-二羧基 醯亞胺)苯基}曱烷、 雙{4-(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)苯 基}鍵、 雙{4-(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)苯基}醚、 雙{4-(甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 77 200902644 胺)苯基}醚、 雙{4-(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)苯 基}石風、 雙{4-(烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)苯基}颯、 以及該些的寡聚物等。 又可列舉:雙{4-(曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)苯基}颯、 1,6-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)-3-¾基-己炫、 1,12-雙(曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺)-3,6-二輕基-十二烧、 1,3-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)-5-¾基-ί哀己烧、 1,5-雙{3'-(烯丙基雙環卩.2.1]庚-5-烯-2,3-二羧基醯亞 胺)丙氧基}_3_輕基-戊烧、 1,4-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)-2-羥基-苯、 以及該些的寡聚物等。 又可列舉:1,4-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二竣基酿亞胺)_2,5_二經基-苯、 N,N’-對(2-羥基)苯二甲基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 N,N'-對(2-羥基)苯二甲基-雙(烯丙基甲基環[2.2.1]庚 78 200902644 27225pif -5-婦-2,3-二叛基酿亞胺)、 Ν,Ν·-間(2-羥基)苯二曱基-雙(烯丙基雙環[2.21]庚_5_ 稀-2,3-二缓基酿亞胺)、 NW-間(2-羥基)苯二曱基-雙(曱基烯丙基雙環[2·2.1] 庚-5-稀-2,3-二敌基醯亞胺)、 Ν,Ν'-對(2,3-二羥基)苯二甲基-雙(烯丙基雙環[Hi]庚 -5-稀-2,3-二幾基酿亞胺)、 以及該些的寡聚物等。 又可列舉:2,2-雙(烯丙基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺)-2'-羥基-苯氧基}苯基]丙烷、 雙{4-(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)-2-羥基-苯基}曱烷、 雙{3-(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)-4-羥基-苯基}醚、 雙{3-(曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)-5-羥基-苯基}砜、 1,1,1-三{4’·(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)}苯氧基甲基丙烷、 N,N’,N”-三(亞乙基曱基烯丙基雙環[2.2.1]庚-5-烯-2,3· 二羧基醯亞胺)三聚異氰酸酯、 以及該些的寡聚物等。 進而亦可為包含非對稱之亞烷基•亞笨基的以下化合 物。 [化 69] 79 200902644Use other solvents together. When the reaction solvent is used in an amount of 100 parts by weight or more based on the total of 1 part by weight of the compound (M), the monoamine (b2) and the monoamine (b3) having two or more acid needle groups, the reaction proceeds smoothly. Therefore, it is better. Preferably, the reaction is carried out at o ° c ~ loot (preferably 8 t to 7 (rc) for 0.2 hours to 20 hours (preferably 2 hours to hours). 2.4 ( 2 ) added to the reaction system In addition, the order in which the reaction raw material is added to the reaction system is not particularly limited. That is, any one of the following methods may be used: a compound (bl) having an acid anhydride group of 2 or more and a diamine ( B2) is added to the reaction simultaneously with the monoamine (乜3); * in the method of the granule, the diamine (b2) and the monoamine (b3) are dissolved in the reaction solvent, and then the acid liver group having two or more is added. a method of compound (bl); a method of adding a diamine (b2) by reacting a compound (b1) having an acid anhydride group of 2 or more with a monoamine (b3); and first having an acid anhydride group of 2 or more A method in which a compound (b1) and a diamine (b2) are reacted to synthesize a copolymer, and a monoamine (b3) is added to the copolymer. 65 200902644 '.ι^Δορη The weight average molecular weight is a macromolecule of coffee = paste Q In particular, it is excellent in solubility in solvents, and it is better as a kind of ink. The molecular compound (8) is solvent-solving, and it is preferred that the weight average of the polymer compound (8) is =, 000, 0 to 0, more preferably (10) to 7, 5GG, and further preferably = 5,000 ' It is ι, 〇〇〇~3,5〇〇. The reason is that a polymer compound (8) having a weight average molecular size of 1,000 or more does not evaporate, is chemically stable, has a mechanical stability, and has an average weight of eight or less. The polymer compound (8) can improve the solubility in a solvent, and the film thickness of the obtained coating film can be preferably used as an ink for inkjet.重量 The weight average molecular weight of the polymer compound (8) is determined by a gel permeation chromatography (GPC) method. Specifically, it can be obtained by diluting the concentration of the obtained polymer compound (8) with a weight percentage (wt%) of the obtained polymer compound (8) by tetrahydroanthracene (THF) or the like, and _ Columns G4000HXL, G3〇〇〇hxl, g25〇〇hxl, and θ are determined by gel permeation chromatography (GPC) and converted to polystyrene using THF as a developing solvent. Substituted Nadick acid yttrium ytterbium compound also m The dilute-substituted nadic ylide ylide imine compound (6) contained in the inkjet ink of the present invention has at least one olefinic nadidonic acid yttrium imine in the molecule a compound of a structure, preferably a monoamine, a diamine, a triamine or a tetraamine, which is reacted with an upper (5') silk olefinic sinic acid anhydride. 66 200902644 27225pif obtained an alkenyl substituted nadic acid yttrium The amine is more preferably an alkenyl-substituted nadic acid ruthenium imide compound represented by the above formula (5), but is not limited to the compound. The alkenyl-substituted nadic acid ruthenium imide compound (c) is present. : η is an alkenyl group substituted with a nadic acid-based imine compound (cl: below, When it is only referred to as "alkenyl-substituted nadic acid ylide"), and η is 2 alkenyl-substituted nadic acid ylidene imine compound (C2: hereinafter, sometimes only referred to as "double-dilute substituted nadic acid"醯imino"), n is an alkenyl group substituted with a nadic acid ylide compound (c3: hereinafter, sometimes referred to simply as "trienyl substituted nadic ylide"), and n is an alkenyl group of 4 Substituting Nadick's yttrium imine compound (c4: hereinafter, sometimes referred to simply as "tetraalkenyl substituted nadic acid yttrium imine"). Terpene is substituted for J. Didi. Acid 醯 眩 眩 k/n The present invention Specific examples of the alkenyl-substituted nadic acid ruthenium imine compound having a η of 1 used include, for example, the following compounds: Allylbicyclo[2.2.1]hept-5-ene-2,3- Dicarboxy quinone imine, allyl fluorenyl bicyclo [2.2.1] hept-5-ene · 2,3-dicarboxy quinone imine, methallyl bicyclo [2.2.1] hept-5-ene - 2,3-dicarboxy quinone imine, fluorenyl propyl fluorenylbicyclo[2.2.1]hept-5-ene-2,3-di-trans-acid imine, fluorenyl-p-propyl-bromopropyl bicyclo [ m]g_5_diluted _2,3_dicarboxy quinone imine, N-hydroxy-allylmethylbicyclic hydrazine. 21]g _ 5-ene-2,3-dicarboxyarsenine, N-hydroxy-mercaptopropylbicyclo[2·21]hept-5-ene-2,3·dicarboxyarmine, 67 200902644 Ν-hydroxyl -methylallylmethylbicyclo[2.2.1]hept-5-ene-2,3.dicarboxyindolimine, Ν-methyl-allylbicyclo[2.2.1]hept-5-ene- 2,3-Dicarboxy quinone imine, fluorenyl-fluorenyl-allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, fluorenyl-fluorenyl-methylene Propylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine, fluorenyl-mercapto-methylallylhydrazinobicyclo[2.2.1]hept-5-ene-2, 3-dicarboxy quinone imine, Ν-(2-ethylhexyl)-allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, and oligomers thereof Wait. Further, Ν-(2-ethylhexyl)-allylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarminemine, Ν-allyl-allyl Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine, Ν-allyl-allylmethylbicyclo[2.2.1]hept-5-ene-2,3-di Carboxylimine, Ν-allyl-mercaptopropylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, Ν-isopropenyl-allyl bicyclo [2.2 .1]hept-5-ene-2,3-dicarboxy quinone imine, Ν-isopropenyl-allylhydrylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy fluorene Amine, 68 200902644 27225pif N-isopropenyl-mercaptopropyl bicyclo [2.2.1] hept-5-ene-2,3-dicarboxy quinone imine, N-cyclohexyl-allyl bicyclo [2.2. 1]hept-5-ene-2,3-dicarboxyindenine, N-cyclohexyl-allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyanimine, N-cyclohexyl-methylallylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid imine, N-phenyl-allylbicyclo[2.2.1]hept-5- Alkene-2,3-dicarboxy quinone imine, and oligomers thereof and the like. Further, N-phenyl-allylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarminemine, N-benzyl-allylbicyclo[2.2.1] Hg-5-ene-2,3-dicarboxy quinone imine, N-benzyl-allylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, N- Benzyl-mercaptopropylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine, N-(2'-hydroxyethyl)-allylbicyclo[2.2.1] Hg-5-ene-2,3-dicarboxyanimine, N-(2'-hydroxyethyl)-allylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyl Yttrium imine, 1(2'-hydroxyethyl)-methylallylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarmine, and oligomers thereof. 69 200902644 Also exemplified: N-(2',2'-dimercapto_3'-hydroxypropyl)-allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyfluorene Amine, N-(2',2'-dimethyl-3'-hydroxypropyl)-allylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, Ν-(2^-dihydroxypropyl)-allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, Ν-(2\3'-dihydroxypropyl) Allyl-mercaptobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarminemine, Ν-(3^hydroxy-purin-propenyl)-allylbicyclo[2.2.1] Hg-5-ene-2,3-dicarboxyindolimine, N-(4'-hydroxy-cyclohexyl)-allylmethylbicyclo[2.2.1]hept-5-ene-2,3-di Carboxylimine, and oligomers thereof. Further, N-(4'-hydroxyphenyl)-allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarminemine, N-(4'-hydroxyphenyl) _Allylmercaptobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindenine, N-(indolylphenyl)-methylallylbicyclo[2.2.1]heptane- 5-ene-2,3-dicarboxy quinone imine, Ν-(4'-hydroxyphenyl)-mercaptopropyl hydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyl Yttrium imine, Ν-(3'-hydroxyphenyl)-allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, Ν-(3'-hydroxyphenyl) -allylmethylbicyclo[2.2.1]hept-5-ene-2,3-di70 200902644 27225pif Carboxylimine, N-(p-hydroxybenzyl)-allylbicyclo[2.2.1]g -5-ene-2,3-dicarboxylic acid imine, N-{2'-(2'-hydroxyethoxy)ethylbuallylbicyclo[2.2.1]hept-5-ene-2, 3-dicarboxy quinone imine, and oligomers thereof and the like. Further, N-{2'-(2'-hydroxyethoxy)ethyl}-allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarlimine, N-{2'-(2'-hydroxyethoxy)ethyl}-methylallylbicyclo[2.2.1]hept-5-fried-2,3-di-rebasic imine, Ν-Ρ '-β-Hydroxyethoxy)ethyl}-mercaptopropylidenebicyclo[2.2.1]hept-5-fine-2,3-diindenyl iodide, Ν-[2'-{ 2'-(2"-Hydroxyethoxy)ethoxy}ethyl]-allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindenine, Ν-[2' -{2'-(2"-hydroxyethoxy)ethoxy}ethyl]-allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarminemine, hydrazine -[2'-{2'-(2"-hydroxyethoxy)ethoxy}ethyl]-mercaptopropylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindole Imine, Ν-{4'-(4'-hydroxyphenyl isopropylidene)phenyl}-allylbicyclo[2.2.1]hept-5-^-2,3-di-biotinimidate , N-{4'-(4'-hydroxyphenyl isopropylidene)phenyl}-allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, N-{4'-(4'-hydroxyphenyl-isopropylidene)phenyl}-mercaptopropylbicyclo[2.2.1] hept-5-fried-2,3-disulfonyl The imine, 71 200902644 z/iz^pu, and the like, etc. Further, the alkenyl-substituted nadic acid imide (cl) can be used as a mixture of these alkenos. The above alkenyl group is substituted with nadic acid ylidene imine (c N-methyl, propyl bicyclo [2.2. Pro 5 ^ Ning is preferably fluorenyl, propylmethyl bicyclo [2.2.1] g) : bis-imine, imine, 5-diuretic-2,3-dicarboxyindole N-fluorenyl-mercaptopropylbicyclo[221] imine, sub-5-ene-2,3-diweil醯N-fluorenyl-hydrazinopropyl hydrazinobicyclo[2. acid imide, ]hept-5-rare-2,3-dioxime N-(2-ethylhexylallylbicyclo[2.2醢iamine, etc. Geng 5 - dilute-2,3-dibolycyl group can also be exemplified by N-(2-ethylhexyl), internal group of 5-5-ene-2,3-dicarboxy quinone imine, Earth and clothing [2.2.] heptyl decyl propyl keyl double ring [2.2.1] gen, do: green 醯 Ν 烯 ally-allyl-allyl fluorenyl double ring [2.2. 醯 imine, g ~ 5 -ene-2,3-dicarboxy-branched = aryl-allyl bis-bis-iminoimine Ν 异 异 郝 郝 郝 双 双 双 · · · · · 异丙 异丙 异丙 异丙 · · · · · 2.2 2.2 2.2 2.2 2.2 2.2 2.2 2.2 2.2 2.2 G, 5_稀_2,3_二竣72 200902644 27225pif Basic imine, N-isopropenyl-methylallyl bicyclo [2.2.1] hept-5-ene-2,3-dicarboxy quinone imine, N-cyclohexyl-allyl bicyclo [2.2. 1]hept-5-ene-2,3-dicarboxy quinone imine, N-cyclohexyl-allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, N-cyclohexyl-mercaptopropylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyl with imine, N-phenyl-allylbicyclo[2.2.1]hept-5- Alkene-2,3-dicarboxy quinone imine, and the like. Further, N-phenyl-allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarminemine, N-benzyl-allylbicyclo[2.2.1] Hg-5-ene-2,3-dicarboxy quinone imine, N-benzyl-allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, N- Benzyl-methylallyl bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarminemine, and the like. More preferably, the alkenyl-substituted nadic acid ylide (cl) is: N-methyl-allyl bicyclo [2.2.1] hept-5-ene-2,3-dicarboxy quinone imine, N- Mercapto-allylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine, N-mercapto-mercaptopropylbicyclo[2.2.1]hept-5- Ace-2,3-dicarboxy quinone imine, 73 200902644 N-fluorenyl-methylallylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine, &gt; ^-(2-Ethylhexyl)-allylbicyclic guanidine .2.1]hept-5-ene-2,3-dicarboxy quinone imine, and the like. Also exemplified is: N-(2-ethylhexyl)-allylhydrazinobicyclo[2.2.1]hept-5- fine-2,3-diweiryimine, N-allyl-allyl Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine, N-allyl-allylmethylbicyclo[2.2.1]hept-5-ene-2,3- Dicarboxy quinone imine, N-allyl-methylallyl bicyclo [2.2.1] hept-5-ene-2,3-dicarboxy quinone imine, N-isopropenyl-allyl bicyclo [ 2.2.1]hept-5-ene-2,3-dicarboxyindolimine' N-isopropenyl-allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindole Imine, N-isopropenyl mercaptopropyl bicyclic P.2.1] hept-5-ene-2,3-dicarboxy quinone imine, and the like. 3.2 Dikenyl-substituted nadic acid ylide (c2) Further, specific examples of the alkenyl-substituted nadic acid ylide compound of η used in the present invention include, for example, the following compounds. Illustratively: Ν, Ν '-ethylene-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine), NW-ethylene-bis(allyl Methylbicyclo[2.2.1]hept-5-ene-2,3-di 74 200902644 27225pif carboxy quinone imine), hydrazine, Ν'-ethylene-bis(mercaptopropyl bicyclo [2.2.1 ]hept-5-ene-2,3-dicarboxyindenine), N,N'-triindolyl-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyl醯imino), N,N'-hexamethylene-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarmine), N,N'-hexa Mercapto-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindenine), N,N'-dodedecyl-bis(allylbicyclo) [2.2.1]hept-5-ene-2,3-dicarboxyindenine), hydrazine, Ν'-dodedecyl-bis(allylmethylbicyclo[2.2.1]hept-5- Alkene-2,3-dicarboxy quinone imine), hydrazine, Ν'-cyclohexylene-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinazoline), Ν, Ν'-cyclohexylene-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine), and oligomers thereof. Also exemplified are: 1,2-bis{34-allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolide)propoxy}ethane, 1.2-double {3'- (Allyl fluorenylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine)propoxy}ethane, 1.2-bis{3'-(nonylallylbicyclo[ 2.2.1]hept-5-ene-2,3-dicarboxyindolimine)propoxy}ethane, 75 200902644 bis [2'·{3'_(allylbicyclo[2.2.1]heptane- 5-ene·2,3·dicarboxyindolimine)propoxy}ethyl]ether, bis[2'-{3'-(allylmethylbicyclo[2.2.1]hept-5-ene- 2,3-Dicarboxyindolimine)propoxy}ethyl]ether, 1,4-double {3'-(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyl Yttrium imine) propoxy}butane, fluorene-bis{3'-(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)propoxy} Butane, and oligomers thereof and the like. Also exemplified by: Ν, Ν'-p-phenylene-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine), Ν, Ν'-pair Base-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine), fluorene, Ν'-m-phenylene-bis(allylbicyclo[2.2 .1]hept-5-ene-2,3-dicarboxy quinone imine), hydrazine, Ν'-m-phenylene-bis(allylmethylbicyclo[2.2.1]hept-5-ene-2 , 3-dicarboxy quinone imine), hydrazine, hydrazine, -{(1-indolyl)-2,4-phenylene}-bis(allylbicyclo[2.2.1]hept-5-ene-2 ,3-dicarboxy quinone imine), hydrazine, Ν'-p-phenylenediyl-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine), hydrazine ,Ν'-p-Oxyl-bis(allyl-decylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindenine), anthracene, Ν'-m-phenylenedifluoryl - bis (allylbicyclo[2.2.1]hept-5-ene-2,3-di 76 200902644 27225pif carboxy quinone imine), hydrazine, Ν'-m-phenylenedifluoryl-bis(allyl fluorenyl) Bicyclo [2.2.1] hept-5-ene-2,3-dicarboxy quinone imine), and oligomers thereof and the like. Further, exemplified by 2,2-bis[4'-{4'-(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarmineimine)phenoxy}phenyl] Propane, 2.2-bis[[{4'-(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)phenoxy}phenyl]propane, 2.2- Bis[4'-{4'-(methylallylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)phenoxy}phenyl]propane, double {4- (allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyinlimine)phenyl}decane, bis{4-(allylhydrazinobicyclo[2.2.1]heptane- 5-ene-2,3-dicarboxy quinone imine) phenyl} decane, and oligomers thereof and the like. Further, exemplified by: bis{4-(methylallylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarmineimine)phenyl}methane, double {4-(decyl allyl Base bisbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinazoline)phenyl}decane, bis{4-(allylbicyclo[2.2.1]hept-5-ene -2,3-dicarboxy quinone imine) phenyl} bond, bis{4-(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine) phenyl }ether, bis{4-(methylallylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyfluorene 77 200902644 amine)phenyl}ether, double {4-(allyl Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)phenyl}stone, bis{4-(allylmethylbicyclo[2.2.1]hept-5-ene- 2,3-dicarboxy quinone imine) phenyl} fluorene, and oligomers thereof and the like. Further, exemplified by: bis{4-(decylallylbiscyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolide)phenyl}anthracene, 1,6-bis(allyl) Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)-3-3⁄4yl-hexyl, 1,12-bis(nonylallylbicyclo[2.2.1]heptane- 5-ene-2,3-dicarboxy quinoid imine)-3,6-di-light-d-dodecyl, 1,3-bis(allylbicyclo[2.2.1]hept-5-ene-2, 3-Dicarboxy quinone imine)-5-3⁄4 base - 哀 己 己, 1,5-bis{3'-(allylbicycloindole.2.1)hept-5-ene-2,3-dicarboxyanthracene Imine)propoxy}_3_light-e-butyl, 1,4-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)-2-hydroxyl - benzene, and oligomers thereof and the like. Further, 1,4-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-diindenyl iodide)_2,5-di-di-phenyl, N, N'-p-(2-hydroxy)benzenedimethyl-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolide), N,N'-pair (2 -hydroxy)benzoyl-bis(allylmethylcyclo[2.2.1]hepta 78 200902644 27225pif -5-female-2,3-di-rebelletic imine), Ν, Ν·-between (2 -hydroxy)phenylenediyl-bis(allylbicyclo[2.21]hept-5-dilute-2,3-di-supplemental-i-imine), NW-m-(2-hydroxy)benzodiazepine-bis(曱Allylbicyclo[2·2.1]hept-5-rare-2,3-dicarbenylimine), hydrazine, Ν'-p-(2,3-dihydroxy)benzenedimethyl-bis(ene) Propylbicyclo[Hi]hept-5-rare-2,3-diyl-bromoimine), and oligomers thereof and the like. Further, 2,2-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)-2'-hydroxy-phenoxy}phenyl]propane, Double {4-(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)-2-hydroxy-phenyl}decane, double {3-(allyl Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)-4-hydroxy-phenyl}ether, bis{3-(decylallylbicyclo[2.2.1]g -5-ene-2,3-dicarboxy quinone imine)-5-hydroxy-phenyl}sulfone, 1,1,1-tris{4'·(allylhydrylbicyclo[2.2.1]heptane- 5-ene-2,3-dicarboxy quinone imine)}phenoxymethylpropane, N,N',N"-tris(ethylene decylallylbicyclo[2.2.1]hept-5- Alkene-2,3. dicarboxy quinone imine) trimeric isocyanate, and oligomers thereof, etc. Further, it may be the following compound containing an asymmetric alkylene group. [Chem. 69] 79 200902644

又,談些雙烯基取代納迪克酸醯亞胺(c2)可單獨使 用,亦可作為該些的混合物而使用。 上述雙烯基取代納迪克酸醯亞胺(c2)較好的可列舉: Ν,Ν1-亞乙基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺)、 Ν,Ν’-亞乙基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺)、 Ν,Ν'_亞乙基-雙(甲基烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺)、 Ν,Ν1-三亞曱基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 80 200902644 27225pif N,Ν'-六亞曱基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 N,NL六亞甲基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 N,N'-十二亞甲基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺)、 Ν,Ν1-十二亞甲基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯 # -2,3-二羧基醯亞胺)、 Ν,Ν’-亞環己基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 Ν,Ν'-亞環己基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)等。 又可列舉:Ν,Ν’-對亞苯基·雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 Ν,Ν’-對亞苯基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 I Ν,Ν’-間亞苯基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 Ν,Ν'-間亞苯基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 Ν,Ν’-{(1-曱基)-2,4-亞苯基}-雙(烯丙基雙環[2.2.1]庚 -5-烯-2,3-二羧基醯亞胺)、 风忡-對苯二甲基-雙(烯丙基雙環[2.2.1;|庚-5-烯-2,3-二 羧基醯亞胺)、 81 200902644 N,N’-對苯二甲基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯 -2,3-二叛基酿亞胺)、 Ν,Ν’-間苯二曱基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺)、 Ν,Ν'-間苯二曱基-雙(烯丙基甲基雙環[2.2.1]庚-5·烯 -2,3-二羧基醯亞胺)、 2.2- 雙[4’-{4'_(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯 亞胺)苯氧基}苯基]丙院、 2.2- 雙[4'-{4'-(烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)苯氧基}苯基]丙烷、 2.2- 雙[4'-{4|-(曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)苯氧基}苯基]丙烷、 雙{4-(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)苯 基}甲烷、 雙{4-(烯丙基甲基雙環[2.2.1]庚-5-烯-2,3_二羧基醯亞 胺)苯基}甲烷等。 又可列舉:雙{4-(曱基烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)苯基}甲烷、 雙{4-(曱基烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基 醯亞胺)苯基}甲烷、 雙{4-(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)苯 基}鍵、 雙{4-(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞 胺)苯基}醚、 82 200902644 27225pif 一幾基酸亞 雙(甲基烯丙基雙環[2.2.1]庚-5-埽·23_ 胺)苯基}_、 羧基醯亞胺)苯 雙{4_(婦丙基雙環[2.2,1]庚-5-烯-2,3- 雙{4-(烯丙基甲基雙環[^^庚^烯 胺)苯基}辦。 缓縫亞 又可列舉··雙{4_(曱基稀丙基雙環[2 二羧基醯亞胺)笨基}砜等。 』厌烯·2&gt; 雙烯基取代納迪克酸醯亞胺(C2)更好的可列舉. N,N’-亞乙基-雙(烯丙基雙環卩.21]庚_5_烯_2+3_二 醯亞胺)、 ,一级丞 N,N'-亞乙基-雙(稀丙基甲基雙環[^ ^庚士稀-^-二 敌基醯亞胺)、 n,n'-亞乙基-雙(甲基烯丙基雙環[2.2· :^庚^•婦_2,3_二 羧基醯亞胺)、 N,N’-三亞曱基_雙(烯丙基雙環[m]庚-5-烯_2,3_二緩 基酿亞胺)、 N,N'-六亞曱基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 AN1-六亞曱基-雙(稀丙基曱基雙環ρ.2·1]庚-5-烯-2,3-二羧基醯亞胺)、 Ν,Ν’-十二亞甲基-雙(烯丙基雙環[2.2.1]庚-5-烯_2,3_二 羧基醯亞胺)、 Ν,Ν’-十二亞甲基雙(烯丙基甲基雙環[2.2.1]庚-5_烯 83 200902644 -2,3-二羧基醯亞胺)、 Ν,Ν'-亞環己基·雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 Ν,Ν'-亞環己基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)等。 又可列舉:Ν,Ν’-對亞苯基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 Ν,Μ-對亞苯基-雙(烯丙基曱基雙環[2.2.1]庚-5_烯-2,3-二羧基醯亞胺)、 Ν,Ν’-間亞苯基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧 基醯亞胺)、 Ν,Ν'-間亞苯基-雙(烯丙基甲基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)、 Ν,Ν'-{(1-曱基)-2,4-亞苯基}-雙(烯丙基雙環[2.2.1]庚 -5-細-2,3-二竣基酿亞胺)、 Ν,Ν'-對苯二甲基-雙(烯丙基雙環[2.2.1]庚-5-烯-2,3-二 羧基醯亞胺)、 Ν,Ν’-對苯二曱基-雙(烯丙基曱基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺)、 Ν,Ν·-間苯二甲基-雙(烯丙基雙環[2.2_1]庚-5-烯-2,3-二 羧基醯亞胺)、 Ν,Ν'-間苯二曱基-雙(烯丙基甲基雙環[2.2.1]庚-5-烯 -2,3-二羧基醯亞胺)等。 又可列舉:2,2-雙[4'-{44烯丙基雙環[2.2.1]庚-5-烯 84 200902644 27225pif -2,3-二羧基醯亞胺)苯氧基}苯基]丙烷、 2.2- 雙[4'-{4'_(烯丙基曱基雙環[2.2.1]庚_5_稀_2,3_二叛 基醯亞胺)苯氧基}苯基]丙烷、 2.2- 雙[4|-{4’-(曱基烯丙基雙環[2.2.1]庚_5_烯_2,3_二叛 基醯亞胺)苯氧基}苯基]丙烷、 雙{4-(烯丙基雙環[2.2.1]庚-5-烯-2,3-二叛基醯亞胺)苯 基}曱烷、 雙{4·(稀丙基曱基雙環[2.2.1]庚-5-稀_2,3_二羧基醯亞 胺)苯基}曱烷等。 又可列舉:雙{4_(甲基烯丙基雙環[221]庚-5_烯_2,3_ 二羧基醯亞胺)苯基}甲烷、 雙{4-(曱基稀丙基甲基雙環[2.2.im_5_m· 醯亞胺)苯基}甲烷等。 二:¾基取代納迪克酸酸亞脖「1 ^發明中所使賴η為3之三烯基取代納迪克酸酿亞 胺化合物的合成可_如下方法進行:相對於L0莫耳之 ζί下二:” 3.G莫耳〜5·°莫耳之烯基取代納迪克酸酐,於 病於例如苯、甲苯、二甲笨、均三甲苯、甲基萘、 二不t:tralin)、氯仿、二氯乙烯、四氯乙烯、氯苯、二 虱呋喃、六亞甲基醚、苯甲趟Unis則、丙酉同、 _ : 土酮:、甲基異丁基酮、苯乙酮、二曱基曱醯胺、 由从等任思洛劑,或者混合兩種或兩種以上的溶劑 。[喊鮮储G.5小時〜3G小時騎反應。於20 〜C下減壓乾齡去上述溶劑,獲魏胺酸。將上述 85 200902644 醯於上述溶劑中、於溶劑之沛點附近圓流(reflux)〇.5 小時〜30小時,或者將化合物本身於I60t:〜20(TC下加 熱,使之進行脫水閉環後,減壓乾燥溶劑而獲得目標化合 物。可藉由核磁共振(Nmr)、紅外線(IR)確認為目標 化合物。 本發明中所使用的n為3之三烯基取代納迪克酸醯亞 胺化合物之具體例,例如可列舉以下化合物。 二{4-(稀丙基雙環[2.2.1]庚_5_稀_2,3_二羧基醯亞胺)三 乙基}胺(TrisANITAEA)、 三{4-(烯丙基雙環[2.2.1]庚-5-烯-2,3-二羧基醯亞胺)三 笨基}甲烷(TrisANITrisAM)、 三{4-(稀丙基雙環[2.2.1]庚-5-稀-2,3-二羧基醯亞胺)苯 基}羥基甲烷(TrisANIPARARO )、 「TrisANITAEA」之IR光譜以及1H-NMR光譜(400 MHz)分別示於圖1以及圖2。 IR光譜中,歸屬於烯烴C-H伸縮:3070 cm·1、2966 cm 1;歸屬於芳香族C-H伸縮:2966 cm-1;歸屬於垸烴C-H 伸縮:2938 cm·1 ;歸屬於醯亞胺C=0伸縮:1762 cm]、 1690 cm-1 ;歸屬於 C=C 伸縮:1640 cm-1 ;歸屬於-CH2-N-亞甲基剪式振動:1448 cm'1;歸屬於醯亞胺C-Ν伸縮:1382 cm·1 等。 [化 70] 86 200902644 27225pifFurther, it is mentioned that the dienyl substituted nadic acid imide (c2) may be used singly or as a mixture of these. The above dienyl substituted nadic acid ylide (c2) is preferably Ν, Ν1-ethylene-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-di Carboxylimine), hydrazine, Ν'-ethylidene-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarmine), hydrazine, Ν'_ Ethylene-bis(methylallylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine), fluorene, fluorene 1-trientylene-bis(allylbicyclo[2.2 .1]hept-5-ene-2,3-dicarboxyindenine), 80 200902644 27225pif N,Ν'-hexamethylene-bis(allylbicyclo[2.2.1]hept-5-ene- 2,3-dicarboxy quinone imine), N, NL hexamethylene-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine), N , N'-docamethylene-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarmine), hydrazine, fluorene 1-dodecyl-di- Allyl fluorenylbicyclo[2.2.1]hept-5-ene #-2,3-dicarboxy quinone imine), hydrazine, Ν'-cyclohexylene-bis(allylbicyclo[2.2.1]g -5-ene-2,3-dicarboxy quinone imine), hydrazine, Ν'-cyclohexylene-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyl醯imine) and so on. Also exemplified by: Ν, Ν'-p-phenylene bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine), hydrazine, Ν'-p-phenylene Base-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindenine), I Ν, Ν'-m-phenylene-bis(allylbicyclo[ 2.2.1] hept-5-ene-2,3-dicarboxy quinone imine), hydrazine, Ν'-m-phenylene-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene- 2,3-Dicarboxy quinone imine), hydrazine, Ν'-{(1-indolyl)-2,4-phenylene}-bis(allylbicyclo[2.2.1]hept-5-ene- 2,3-dicarboxy quinone imine), air enthalpy-p-xylylene-bis(allyl bicyclo[2.2.1; |hept-5-ene-2,3-dicarboxy quinone imine), 81 200902644 N,N'-p-Oxime-bis(allyl-decylbicyclo[2.2.1]hept-5-ene-2,3-di-rebasic imine), hydrazine, Ν'-m-phenylene Dimercapto-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindenine), hydrazine, Ν'-m-phenylenedifluoryl-bis(allylmethyl) Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine), 2.2-bis[4'-{4'-(allylbicyclo[2.2.1]hept-5-ene- 2,3-Dicarboxy quinone imine) phenoxy} phenyl] propyl, 2.2- bis [4'-{4'-( Propylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine)phenoxy}phenyl]propane, 2.2-bis[4'-{4|-(decylene) Propylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarsenazo)phenoxy}phenyl]propane, bis{4-(allylbicyclo[2.2.1]hept-5 -ene-2,3-dicarboxy quinone imine) phenyl}methane, bis{4-(allylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine) Phenyl}methane, etc. Also exemplified by: bis{4-(decylallylbiscyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolide)phenyl}methane, double {4-(decyl allyl Base bisbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinazomine)phenyl}methane, bis{4-(allylbicyclo[2.2.1]hept-5-ene- 2,3-dicarboxy quinone imine)phenyl} bond, bis{4-(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinazoline)phenyl} Ether, 82 200902644 27225pif a succinic acid sub-bis(methylallyl bicyclo [2.2.1] hept-5-oxime 23_amine) phenyl}_, carboxy quinone imine) benzene double {4_ (propyl Bicyclo[2.2,1]hept-5-ene-2,3-bis{4-(allylmethylbicyclo[^^heptene-2-enylamine)phenyl} can be exemplified. 4_(mercaptopropylidene bicyclo [2 dicarboxy quinone imine) phenyl] sulfone, etc. 『nekenene·2&gt; Dialkyl substituted nadic acid ylide (C2) is more preferable. N, N '-Ethylene-bis(allylbicyclopurine.21)hept-5-ene-2-2+3-diimineimine), first-order 丞N,N'-ethylene-bis(dilylpropyl) Methyl bicyclo [^ ^heptazepine-^-dicarbenyl imine), n, n'-ethylidene-bis(methylallylbicyclo[2.2· :^g^^^_2,3_ Carboxylimine), N,N'-triindolyl-bis(allylbicyclo[m]hept-5-ene-2,3_bis-supplemental imine), N,N'-hexamethylene Base-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimine), AN1-hexamethylene-bis(l-propyl fluorenylbicyclo ρ.2·1 ]hept-5-ene-2,3-dicarboxy quinone imine), hydrazine, Ν'-docamethylene-bis(allylbicyclo[2.2.1]hept-5-ene_2,3_ Dicarboxy quinone imine), hydrazine, Ν'-dodecyl bis(allylmethylbicyclo[2.2.1]hept-5-ene 83 200902644 -2,3-dicarboxy quinone imine), hydrazine ,Ν'-cyclohexylene·bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarmine), hydrazine, Ν'-cyclohexylene-bis(allyl Indenylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindenine), etc. Also exemplified by Ν,Ν'-p-phenylene-bis(allylbicyclo[2.2.1 ]hept-5-ene-2,3-dicarboxy quinone imine), fluorene, fluorene-p-phenylene-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3- Dicarboxy quinone imine), hydrazine, Ν'-m-phenylene-bis(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxy quinone imine), hydrazine, Ν'- M-phenylene-bis(allylmethylbicyclo[ 2.2.1]hept-5-ene-2,3-dicarboxyindolimine), hydrazine, Ν'-{(1-indolyl)-2,4-phenylene}-bis(allylbicyclo[ 2.2.1] hept-5-fine-2,3-diindenyl iodide), hydrazine, Ν'-p-xylylene-bis(allylbicyclo[2.2.1]hept-5-ene- 2,3-Dicarboxy quinone imine), hydrazine, Ν'-p-phenylenediyl-bis(allylhydrazinobicyclo[2.2.1]hept-5-ene-2,3-dicarboxyarmine ), Ν, Ν·-m-xylylene-bis(allylbicyclo[2.2_1]hept-5-ene-2,3-dicarboxy quinone imine), ruthenium, Ν'-m-phenylene fluorenyl - bis(allylmethylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyinlimine) and the like. Also exemplified is: 2,2-bis[4'-{44allylbicyclo[2.2.1]hept-5-ene 84 200902644 27225pif-2,3-dicarboxyindenine)phenoxy}phenyl] Propane, 2.2-bis[4'-{4'_(allyl-decylbicyclo[2.2.1]hept-5-diuretic-2,3-di-reoxypyridinium)phenoxy}phenyl]propane , 2.2-bis[4|-{4'-(decylallylbiscyclo[2.2.1]hept-5-ene-2,3_bis-decenary imine)phenoxy}phenyl]propane, Double {4-(allylbicyclo[2.2.1]hept-5-ene-2,3-dioxaliminium)phenyl}decane, bis{4·(Ltypropyl fluorenylbicyclo[2.2 .1] hept-5-diluted _2,3-dicarboxyarenimine)phenyl}decane, and the like. Further, exemplified by: bis{4_(methallylbicyclo[221]hept-5-ene-2,3-dicarboxyarenimine)phenyl}methane, double {4-(mercapto-l-propylmethylbicyclo) [2.2.im_5_m· quinone imine) phenyl}methane, etc. Two: 3⁄4-based substitution of Nadick acid acid sub-neck "1 ^In the invention, the synthesis of the 3rd alkenyl-substituted Nadick acid-imine compound in the invention can be carried out as follows: relative to the L0 moir 2:" 3.G Moer ~ 5 · ° Moer's alkenyl substituted nadic anhydride, in the case of diseases such as benzene, toluene, dimethyl strepto, mesitylene, methyl naphthalene, di-t-tralin, chloroform , dichloroethylene, tetrachloroethylene, chlorobenzene, dioxane, hexamethylene ether, benzamidine Unis, propionate, _: ketone: methyl isobutyl ketone, acetophenone, two Mercaptoamine, from a sirroin, or a mixture of two or more solvents. [Shouting fresh storage G. 5 hours ~ 3G hours ride reaction. The above solvent was obtained under reduced pressure at 20 to C to obtain proline. The above-mentioned 85 200902644 is immersed in the above solvent, and is refluxed for about 5 hours to 30 hours in the vicinity of the point of the solvent, or the compound itself is heated at I60t: 〜20 (TC) to cause dehydration ring closure. The solvent is dried under reduced pressure to obtain the target compound, which can be confirmed to be the target compound by nuclear magnetic resonance (Nmr) or infrared (IR). The n used in the present invention is a specific one of the 3rd trienyl substituted nadic acid ylide imine compound. For example, the following compounds can be exemplified. Two {4-(dilylbicyclo[2.2.1]hept-5-diluted-2,3-dicarboxyarenimine)triethyl}amine (TrisANITAEA), three {4 -(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboxyindolimide)trisyltrimethane (TrisANITrisAM), tris{4-(dipropylbicyclo[2.2.1] The IR spectrum and the 1H-NMR spectrum (400 MHz) of hept-5-sweet-2,3-dicarboxyarsenazo)phenyl}hydroxymethane (TrisANIPARARO) and "TrisANITAEA" are shown in Fig. 1 and Fig. 2, respectively. In the spectrum, it is attributed to olefin CH stretching: 3070 cm·1, 2966 cm 1; attributed to aromatic CH stretching: 2966 cm-1; attributed to terpene hydrocarbon CH stretching: 2938 cm·1; attributable to quinone imine C=0 Stretch Shrinkage: 1762 cm], 1690 cm-1; attributed to C=C expansion: 1640 cm-1; attributed to -CH2-N-methylene scissor vibration: 1448 cm'1; attributed to quinone imine C-Ν Telescopic: 1382 cm·1, etc. [Chem. 70] 86 200902644 27225pif

2.50卩111〜3.49卩111之峰;歸屬於』、]^、111、11質子(1況): 5.01??111〜6.27??111之峰;歸屬於11質子(611):1.251)1)111 〜1.76 ppm之峰等。2.50卩111~3.49卩111 peak; attributed to 』,]^, 111,11 proton (1 condition): 5.01??111~6.27??111 peak; belonging to 11 proton (611):1.251)1) 111 to 1.76 ppm peak and so on.

「TrisANITrisAM」之 IR 光譜以及 iH_NMR 光譜(4〇〇 MHz)分別示於圖3以及圖4。 IR光譜中,歸屬於烯烴C-H伸縮:3056 cm·1、2970 cm·1 ;歸屬於芳香族C-Η伸縮:2970 cm-1;歸屬於烧烴C-H 伸縮:2936 cm·1 ;歸屬於醯亞胺C=0伸縮:1772 cm·1、 1706 cm-1 ;歸屬於C=C伸縮:1638 cm·1 ;歸屬於醯亞胺 C-N 伸縮:1402(^1 等。 [化 71] 87 200902644 Z/ZZ3pilThe IR spectrum and the iH_NMR spectrum (4 〇〇 MHz) of "TrisANITrisAM" are shown in Fig. 3 and Fig. 4, respectively. In the IR spectrum, it is attributed to olefin CH stretching: 3056 cm·1, 2970 cm·1; belonging to aromatic C-Η stretching: 2970 cm-1; belonging to burning hydrocarbon CH stretching: 2936 cm·1; Amine C=0 stretching: 1772 cm·1, 1706 cm-1; belonging to C=C stretching: 1638 cm·1; belonging to quinone imine CN stretching: 1402 (^1, etc. [Chem. 71] 87 200902644 Z/ ZZ3pil

5.14 ppm、5.74 ppm〜6.34 ppm 之峰;歸屬於 〇 質子(1H): ί 5.30 ppm〜5.60 ppm 之峰等。 「TnsANIPARARO」之IR光譜以及iH_NMR光譜㈠〇〇 MHz)分別示於圖5以及圖6。 IR光譜中,歸屬於烯烴C-H伸縮:3056 cm-1、2972 cm-1;歸屬於芳香族C-H伸縮:四72 cm」;歸屬於烧烴C-H 伸縮:2936 cm·1 ;歸屬於醯亞胺〇0伸縮:1776 cm-i、 1706 cm ,細屬於C-C伸縮.1636 cm ;歸屬於醯亞胺 〇:^伸縮:1402 (;111-1等。 88 200902644 27225pif [化 72]5.14 ppm, 5.74 ppm to 6.34 ppm peak; attributed to 〇 proton (1H): ί 5.30 ppm to 5.60 ppm peak. The IR spectrum of "TnsANIPARARO" and the iH_NMR spectrum (I) 〇〇 MHz are shown in Fig. 5 and Fig. 6, respectively. In the IR spectrum, it is attributed to olefin CH stretching: 3056 cm-1, 2972 cm-1; attributed to aromatic CH stretching: four 72 cm"; attributed to burning hydrocarbon CH stretching: 2936 cm·1; attributable to yttrium imine 0 telescopic: 1776 cm-i, 1706 cm, fine belongs to CC telescopic. 1636 cm; attributed to yttrium imine: ^ telescopic: 1402 (; 111-1, etc. 88 200902644 27225pif [化72]

/N ]H-NMR光譜中,歸屬於3質子〜d ppm〜7·53 Ppm 之聲;歸屬於 e、f、g、卜 U2H) : 6.98 2.27 ppm〜3.60 ppm之峰;歸屬於h f』子(18H ): 〜⑽靜之峰;歸屬於j、k、m、n質子(伽)、:1·47啊 〜6.24 ppm 之奪等。 ppm 胺化合物的合成可利用如^ 土取代納迪克酸醯亞 四胺,混合4.0莫耳〜A 法進仃:相對於】·0莫耳之 常溫下溶解於例如甲f耳之烯基取代納迪克酸酐,於 十〒 -Ητ*· . 四氫萘、氯仿、三氯乙接 本、均三甲苯、曱基萘、 氫吱喊、六”基越,审四氣乙稀、氯苯、二嗓燒、四 甲蜒、丙酮、甲基乙基酮、甲基 89 200902644 f I基酮、笨乙蜩、N,N_二曱基曱醯胺、二甲基亞颯等任 思'合劑,或者混合兩種或兩種以上的溶劑中,作為溶液攪 持〇.5小時〜30小時進行反應。於20¾〜8〇。(:下減壓 乾燥除去上述溶劑,獲得醯胺酸。將上述醯胺酸於上述溶 』中、於溶劑之沸點附近回流(reflux) 0.5小時〜3〇小時, 或者將化合物本身於160。(:〜200°C下加熱,使之進行脫水 閉環後,減壓乾燥溶劑而獲得目標化合物。可藉由NMr、 IR確認為目標化合物。 本發明中所使用的η為4之四烯基取代納迪克酸醯亞 胺化合物之具體例,例如可列舉以下化合物。 ^四卜(稀丙基雙環[2.2.1]庚-5-烯-2,3-二綾基醯亞胺)四 苯基}曱烷(TetrakisANITAM ) 「TetrakisANlTAM」之 IR 光譜以及1H-NMR 光譜(400 MHz)分別示於圖7以及圖8。 IR光譜中’歸屬於烯烴C-H伸縮:3060 cm·1、2972 cm,歸屬於务香族C-Η伸縮:2972 cm」;歸屬於烧烴C-H 伸縮:2936 cm·1 ;歸屬於醯亞胺〇〇伸縮:1776 、 1706 cm 1 ;歸屬於C=C伸縮:1638 cm_1 ;歸屬於醯亞胺 C-N 伸縮:1404 cm_]等。 [化 73] 90 200902644 27225pif/N ]H-NMR spectrum, assigned to 3 protons ~d ppm~7·53 Ppm; attributed to e, f, g, Bu U2H): 6.98 2.27 ppm~3.60 ppm peak; attributed to hf (18H): ~(10) Jingzhifeng; belonging to j, k, m, n protons (gamma), :1·47 ah~6.24 ppm. The synthesis of the ppm amine compound can be carried out by substituting Nadickic acid yttrium tetramine, mixed with 4.0 mA~A method: at room temperature relative to 00 hr, dissolved in an alkenyl-substituted na Dick anhydride, in Shiyan - Ητ*·. tetrahydronaphthalene, chloroform, trichloroethylene, mesitylene, decylnaphthalene, hydrogen hydrazine, six" base, four gases, chlorobenzene, two Teriyaki, tetramethyl hydrazine, acetone, methyl ethyl ketone, methyl 89 200902644 f I ketone, stupid oxime, N, N-didecyl decylamine, dimethyl hydrazine, etc. Alternatively, a mixture of two or more kinds of solvents may be stirred as a solution for 5 hours to 30 hours. The reaction is carried out at 205⁄4 to 8 Torr. (The solvent is removed by drying under reduced pressure to obtain valine acid. The amine acid is refluxed in the above solvent at a boiling point of the solvent for 0.5 hours to 3 hours, or the compound itself is heated at 160°. (:~200° C., subjected to dehydration ring closure, and dried under reduced pressure. The target compound is obtained by a solvent, and can be confirmed as a target compound by NMr and IR. The η used in the present invention is 4 Specific examples of the alkenyl-substituted nadic acid ruthenium imine compound include the following compounds: ^Teb (dilylbicyclo[2.2.1]hept-5-ene-2,3-dimercaptoimine) IV The IR spectrum and 1H-NMR spectrum (400 MHz) of "Tetrakis ANITAM" "TetrakisANlTAM" are shown in Fig. 7 and Fig. 8. In the IR spectrum, 'attributed to olefin CH stretching: 3060 cm·1, 2972 cm, Attributable to the scented C-Η telescopic: 2972 cm"; attributed to hydrocarbon-burning CH stretching: 2936 cm·1; attributable to 醯imine 〇〇 stretching: 1776, 1706 cm 1 ; attributable to C=C expansion: 1638 cm_1 ; is attributed to 醯 imine CN stretching: 1404 cm_], etc. [Chem. 73] 90 200902644 27225pif

h-NMR光譜中,歸屬於a質子〜d質子(16H): 6.80 ppm 〜7.59 ppm 之峰;歸屬於 e、f、g、i、l 質子(24H): 2.25 ppm〜3·60 ppm 之峰;歸屬於 j、k、m、n 質子(16H): 5.04 ppm〜6.50 ppm 之峰;歸屬於 h 質子(8H) : 1.25 ppm 〜1.75 ppm之峰等。 本發明之較佳烯基取代納迪克酸醯亞胺化合物(C) 是具有蓬鬆結構之低分子量的醯亞胺單體,因此可溶於大 部分有機溶劑中,即使以溶液狀態長時間保存亦不會產生 結晶之析出或膠化而可穩定地使用。又,藉由加熱而形成 立體交聯結構之聚醯亞胺,該聚醯亞胺固化物顯示良好之 耐熱性、機械特性、電氣特性、封藥品性。 4溶劑(D) 200902644 取代納迪克酸醯亞胺化4f/^分子化合物(b)、婦基 賴胺酸⑷以水情含祕—要可溶解 分子化合物⑻、賊取2賊⑷,必要時可溶解高 則並無特舰制。X,義翻b合物(C), r At, 呎疋早獨無法溶解矽醯胺酸(A)、 石夕Me酸U,)、以及必要時的高分子化合 ) 取代納迪克酸醯亞胺化合物 烯土 他溶劑混合,而用作噴黑二的溶劑,亦可藉由與其 N-甲基-2•鱗細、lf^ (D)之具體例’可列舉: N-甲基丙_、聯:甲甲_、N-甲基己内醯胺、 曱基曱醯胺、Ν,Ν·二乙基^ 士、—曱基亞硬、聯二 酯、乳酸乙酉旨、3-甲基_3_甲4 ^、二乙基乙酿胺、Τ•丁内 乙二醇單頂、二乙二醇單^丁醇、四氫萘、異佛_、 二乙二醇二曱醚、二乙二醇甲二醇單乙醚乙酸醋、 丙二醇單頂、丙二醇單甲^/乙基_、三乙二醇單乙_、 3-甲氧基丙酸甲醋、3n乙,、二丙二醇單甲趟、 乙醇、2-丙醇、二噁烷、乙乙酯、丙二酸二乙酯、 一醇等。 如上所述,本發明之噴墨 別限制,絲射4印顯含的溶劑並無特 或者内部之過濾器材料有時J規格’其接合部件 生腐蝕或者膨脹。或者,乾&amp; 之溶劑之種類而產 木、度較快的溶劑會使喷墨頭 92 200902644 27225pif 產生等,因此溶劑(D)的選擇非常重要。 發明者經努力研究之結果發現,就提昇喷黑M 久性或者喷頭堵夷、罢^ +木士兄就徒幵賀墨頭之耐 乙二醇單丁鍵、二土乙二土醇^出性之方面而言,乳酸乙酉旨、 二乙二醇甲基乙㈣:乙醚乙酸醋、二乙二醇二甲醚、 酉文甲酉曰、y-丁内酉旨作為溶劑(D)尤其好。乳土丙 / 較大、,因^之表面張力對喷墨用墨水之塗佈性的影響 45 mN/m,:好:ί :墨水之表面張力調整為20 〜 圍,則墨水噴出口 H 5 mN/m之範 墨水之噴出良好 _面0^ _咖)變得穩定, 溶劑相整為―跑〜45 —之範圍, — Si要。可使用一種表面張力為—45 (例如,_ t溶劑’而若混合使用表面張力較大之溶劑 (例如,二,^^爾⑷以及表祕力較小之溶劑 —醇甲基乙基ϋ : 24 mN/m或者乙-醇嚴丁 r=/m),則可利賴組成鳴面張力 整,故而較好。 审疏〜N甲基甲酿胺、N,N_二曱基甲酸胺、N,N-二乙基 ’’胺、乙醯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、二 =基乙_、N_甲絲醯胺、Ν,Ν,Ν’,Ν,_四甲基脲、2· —— 土-2-。比哈烧明、ε _己内酿胺、曱基己内醯 胺、胺甲酸§旨等醯胺系溶劑是雜胺酸(A )、賴胺酸(Α,) 93 200902644In the h-NMR spectrum, it belongs to a proton to d proton (16H): peak of 6.80 ppm to 7.59 ppm; attributed to e, f, g, i, l proton (24H): peak of 2.25 ppm~3·60 ppm ; belonging to j, k, m, n proton (16H): 5.04 ppm ~ 6.50 ppm peak; attributed to h proton (8H): 1.25 ppm ~ 1.75 ppm peak. The preferred alkenyl-substituted nadic acid ylidene imide compound (C) of the present invention is a low molecular weight quinone imine monomer having a bulky structure, and thus is soluble in most organic solvents even when stored in a solution state for a long period of time. It can be used stably without precipitation or gelation of crystals. Further, the polyimine which is formed into a three-dimensional crosslinked structure by heating exhibits good heat resistance, mechanical properties, electrical properties, and drug sealing properties. 4 Solvent (D) 200902644 Substituting Nadickic acid hydrazide 4f / ^ molecular compound (b), gynecyl lysine (4) with water containing secret - to dissolve molecular compound (8), thief take 2 thief (4), if necessary Highly soluble, there is no special ship system. X, Yi b compound (C), r At, 呎疋 early alone can not dissolve lysine (A), Shixi me acid U,), and if necessary, polymer compound) Replace Nadick The amine compound is mixed with the solvent of the olefinic solvent, and is used as a solvent for the black blister. It can also be exemplified by the specific example of N-methyl-2•scale and lf^(D): N-methyl propyl _ , L: _, N-methyl caprolactam, decyl decylamine, hydrazine, hydrazine, diethyl hydrazine, hydrazinyl hard, bi-ester, lactic acid, 3-methyl _3_甲4^, diethyl ethanoamine, hydrazine, butane glycol monotop, diethylene glycol monobutanol, tetrahydronaphthalene, isophora, diethylene glycol dioxime, two Ethylene glycol methoxide monoethyl acetate vinegar, propylene glycol monotop, propylene glycol monomethyl / ethyl _, triethylene glycol monoethyl _, 3-methoxy propionic acid methyl vinegar, 3 n ethyl, dipropylene glycol monomethyl Anthracene, ethanol, 2-propanol, dioxane, ethyl ethyl ester, diethyl malonate, monool, and the like. As described above, the ink jet of the present invention is not limited, and the solvent contained in the silk imprint is not particularly limited or the internal filter material may be corroded or swelled in the J gauge. Alternatively, the solvent of the type of dry &amp; the faster-growing solvent causes the ink jet head 92 200902644 27225pif to be generated, etc., so the choice of the solvent (D) is very important. As a result of intensive research, the inventors found that it is possible to improve the long-lasting effect of the black-spraying M or the nozzles, and to stop the +--------------------------------------------------------------------------------------- In terms of properties, lactic acid ethyl ester, diethylene glycol methyl ethyl (tetra): diethyl ether acetate, diethylene glycol dimethyl ether, hydrazine, y-butane, as solvent (D) it is good. The size of the latex C/large is due to the influence of the surface tension of the ink on the coating properties of the inkjet ink 45 mN/m, good: ί: the surface tension of the ink is adjusted to 20 〜, the ink ejection port H 5 The spray of mN/m ink is good _ face 0^ _ coffee) becomes stable, the solvent phase is in the range of “run ~ 45 — — Si wants. A surface tension of -45 (for example, _ t solvent' can be used, and if a solvent having a large surface tension is mixed (for example, two, ^^ (4) and a solvent having a small surface activity - alcohol methyl ethyl hydrazine: 24 mN / m or B-alcohol succinct r = / m), it can be better to form the surface tension tension, so it is better. Review ~ N methyl amide, N, N dimethyl carbamide, N,N-diethyl''amine, acetamide, N-methylacetamide, N,N-dimethylacetamide, bis-ethylidene, N-methylamine, hydrazine, hydrazine , Ν', Ν, _ tetramethylurea, 2 · —— soil -2-. Bismuth, ε _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Hypoamic acid (A), lysine (Α,) 93 200902644

Z/ZZDpiT 或者高分子化合物(B)、烯基取代納迪克酸醯亞胺化合物 (C)的良溶劑,故而可較好地使用,但另一方面該些溶 劑會影響喷墨頭之耐久性,因此需要注意。 較好的是,於本發明之喷墨用墨水中所含的溶劑(D) 中70全不含醯胺系溶劑,或者至多相對於溶劑(D)之總 重量而含有小於等於20 wt%。 3玄些〉谷劑可僅使用—種,亦可混合兩種或兩種以上使 用。 水中的矽醯胺酸(A)、矽醯胗醅 ^ y/v. 7 /1 人 ti / —_ 丄以及烯某取代納浊色酸醯亞胺 也金·物 _本5明巾,噴錢墨水巾之賴胺酸(A)以及石夕酿 t。/夂^之總濃度並無特別限定,較好的是1 wt%〜99 70 wt%。若為舰、曲8〇心進而好的是22⑽〜 宜,噴射精度高則喷墨1次所得的膜厚最適 度並無定嘴.墨:墨水中之高分子化合物(B)的濃 wt%^25 wt〇/〇 0 . ^ 〇 Γ%^5° Wt% 5 予良好之特性,:而::農度範圍’則作為絕緣膜時可賦 化合讀絲朗迪核醯亞胺 ,制限定,較好的是 作為絕_時可職予良好之特性,故度範圍,則 94 200902644 27225pif 於用作噴墨用墨水之情形時 者石夕醯胺酸(A.)、高分子化合 隨㈣(A)以及/或 克酸醯亞胺化合物(C)夕,疮勒古以及烯基取代納廸 膜厚越厚,故而較好,但鬲,所得聚醯亞胺臈之 向,因此有時會出現無:自噴墨二在變高之傾 明者們經努力研究之結果 ^幾噴出的問題。本發 則可較好地用作可形較厚上述濃度範圍’ 水。 象醯亞胺膜的喷墨用墨 或者㈣胺酸(A,),胺酸⑷以及/ 稀基取代納迪克酸酿亞胺化二物&quot;二而分子化合物⑻、 (D)而獲得。 ),必要時亦混合溶劑 進而,根據所需特性, 下方法獲得:視需要選擇添加噴墨用墨水可藉由如 界面活性劑、抗靜電劑、偶人=氧細月旨、丙烯酸系樹脂、 劑、胺基矽化合物、ρΗ值調°整1、、偏笨三甲酸等環氧固化 劑、抗氧化劑、還原抑制劑=旅防録劑、防腐劑、防黴 /谷性聚合物、顏料、、、χ促進劑、螯合化劑、水 杨力,,料㈣㈣合溶解。 +本發明之噴墨用墨水可 噴墨用墨水中所含的環氧樹卜^有環氧樹月旨。本發明之 或者環氧丙垸(_ane)二、有環氧乙燒(Qxirane) 有大於等於2個之環氧乙垸的化=特別限定,較好的是具 95 200902644 本發明中,嘴黑 限定,較好的是〇1中之1衣氧樹脂的濃度並無特別 Wt%。若為所錢〖〜2G哪’更好的是1 wt%〜10 耐熱性、耐藥品性、 則由喷墨用墨水形成之塗膜的 環氧樹月旨例如可列Γί二型P 酯型環氧樹脂、妒S—雙酚Α型%氧樹脂、縮水甘油 聚合物、以及具有曰产衣:%氧樹脂、具有環氧乙烧之單體的 具有環氧乙與其他單體的共聚物等。 酸甲基縮水甘Li ,4·環氧環己醋以及(甲基)丙烯 具體例,;列:n燒之單,行共聚合之其他單體的 某)丙嬌(曱基)丙烯酸、(曱基)丙烯酸甲酯、(曱 二、(审^、·曰/ (曱基)丙烯酸異丙酯、(曱基)丙烯酸正丁 :席酸ίΐ己:稀酸異丁11:(曱基)丙烯酸第三丁酷、(曱基) t : &lt; 1、(曱基)丙烯酸苄酯、(曱基)丙烯酸2-羥基乙 酉曰、:基\丙稀酸2_經基丙醋、苯乙缚、甲基苯乙稀、氯 :基笨乙稀、(甲基)丙浠酸(3·乙基-3-環氧丙基)曱醋、N-環己基順丁烯二醯亞胺以及N_苯基順丁烯二醯亞胺等。 具有環氧乙烷之單體之聚合物以及具有環氧乙烷之單 體與其他單體之共聚物的較佳具體例,可列舉:聚曱基丙 烯酸縮水甘油酯、曱基丙烯酸曱酯-曱基丙烯酸縮水甘油酯 共歜物、曱基丙烯酸苄酯_甲基丙烯酸縮水甘油酯共聚物、 甲基丙烯酸正丁酯-曱基丙烯酸縮水甘油酯共聚物、曱基丙 烯酸2-羥基乙酯_甲基丙烯酸縮水甘油酯共聚物、曱基丙烯 96 200902644 27225pif 酸(3-乙基-3-環氧丙基)曱g旨-曱基丙烯酸縮水甘油酯共聚 物以及苯乙稀-曱基丙烯酸縮水甘油酯共聚物。若本發明之 喷墨用墨水含有該些環氧樹脂’則由喷墨用墨水形成之塗 膜的耐熱性良好,故而較好。 本發明之喷墨用墨水中可含有的環氧樹脂之具體例可 列舉:商品名「Epikote 807」、「Epikote 815」、「Epikote 825」、「Epikote 827」、「Epikote 828」、「Epikote 190P」、 「Epikote 191P」(以上,油化殼牌環氧(Yuka Shell Epoxy ) 股份有限公司製造),商品名「Epikote 1004」、「Epikote 1256」(以上,日本環氧樹脂股份有限公司製造),商品名 「Araldite CY177」、商品名「Araldite CY184」(日本汽巴· 劳·基(Ciba—Geigy)股份有限公司製造),商品名r Celloxide 2021P」、「Celloxide 3000」、「EHPE-3150」(Daicel 化學工 業股份有限公司製造),商品名「Techmore VG3101L」(三 井化學股份有限公司製造),ν,ν,ν’,ν,-四縮水甘油基-間二 甲苯二胺,1,3-雙(Ν,Ν-二縮水甘油基胺甲基)環己烷, Ν,Ν,Ν\Ν|-四縮水甘油基-4,4'-二胺基二苯基曱烷等。 該些中,若使用商品名「Araldite CY184」、商品名 「Celloxide 2021P」、商品名「Techmore VG3101L」、商品 名「Epikote 828」,則所得之聚醯亞胺膜之平坦性尤其良 好,故而較好。 環氧樹脂可僅使用一種,亦可混合兩種或兩種以上使 用。 6(2) 丙嫌酸糸樹脂 97 200902644 喷墨用墨水可進而含有丙烯酸系樹脂。嘴墨用墨水中 所含的丙烯酸系樹脂只要具有丙烯醯基或甲基丙稀醯基, 則並無特別限定。 喷墨用墨水中之丙烯酸系樹脂的濃度並無特別限定, 較好的是0.1 Wt%〜20 wt〇/。,更好的是! wt%〜1〇 wt%。 若為所述濃度範圍’則由噴墨用墨水形成之塗膜的耐熱 性、而才藥品性、平坦性良好。 丙烯酸系樹脂例如可列舉:具有羥基之單官能聚人性 I體、不具有絲之單官能聚合性單體、二官能(曱基口)丙 稀義、以及大於等於三官能之多官能(甲基)丙稀酸 具有經基之單官能聚合性單體的具體例,可列舉/ 基)丙烯酸2-羥基乙醋、(甲基)丙烯酸2_經基丙醋 丙烯酸4-經基丁酉旨、或者】,4_環己燒二甲 酸醋等。其中,就所形成之膜的柔軟性而言,尤盆ς 'θ 丙烯酸4-經基丁酉旨、li4•環己燒二甲醇單丙稀酸醋。、疋 % 具,基之單官能聚合性單體的具體例,可列舉. (甲基)丙_縮水甘油酯、(甲基)丙_3 . (甲基)丙烯酸甲基縮水甘油醋、3_甲基 丙、:、 甲基環氧丙烧、3-乙基-3-r甲其Γ基丙觸乳基 烷、3-甲基-3彳甲丙媒_土 ~酿氧基甲基環氧丙 乳基乙基環氧城、 A丙氧紅基環氧.對乙烯絲基 %&lt;氧丙-3-基f醚、2-苯基_3彳甲萁、二0 烷'2-:氣甲美3 π其、」甲基)烯醯氧基甲基環氧丙 氣氧基甲基環氧丙焼、4_三 風基)丙_氧基甲基環氧丙燒、(竭丙^ 98 200902644 27225pif 基)_,旨、(曱基)⑽酸乙g|、(曱基)丙稀酸 丁醋、::基)丙场酸環己醋'(甲基上 (3曰乙芙3 本乙烯、虱甲基苯乙烯、(曱基)丙烯酸 氧丙基)甲醋、N、環己基順丁稀二醯亞胺、Ν· 丁f—二酸亞胺、乙稀基甲笨、(甲基)丙稀酿胺、(甲 ^^^阳們癸^㈣㈣酸:環戊稀氧基 美二Γ基丙稀酸異获醋、(甲基)丙烯酸苯酉旨、甘油單(甲 =:SV聚苯乙烯巨單體、聚甲基丙烯酸甲:巨: 月桂醇之環m、H)丙稀酸5_四氫糠氧基羰氧戊醋、 酸、丁編r 成物之(甲基)丙烯酸醋、(甲基)丙稀 二酸、伊二、肉桂酸、順丁婦二酸、反丁烯 叛rf 順丁稀二酸、甲基反丁稀二酸、. 醋、^順丁烤二酸單[2-(甲基)丙烯酿氧基乙基] 等。己稀_3,4_二羧酸單[2_(甲基)丙_氧基乙基撺 氧乙(甲基)丙稀酸醋之具體例,可列舉:雙盼F環 酯、異: 衣氧乙烷改質二丙烯酸 稀酸酉旨:' 乙烧改質二⑽酸酉旨、聚乙二醇二丙 來丙一醇二丙浠酸酯、牽$ _ 戊四醇二丙烯酸酯單硬浐料14戊丙城酯、季 1 6-己曰夂®旨、认丁二醇二丙烯酸酯、 規一己:醇二两稀醆醋、以壬二醇二 甲知二丙騎m丁基心基丙二醇二^ 99 200902644 酸酉旨、三經曱基丙烧二丙稀酸酷、或者二季戊四醇二丙稀 酸醋等。 大於等於三官能之多官能(甲基)丙烯酸酯的具體例, 可列舉:三羥甲基丙烷三(曱基)丙烯酸酯、環氧乙烷改質 三羥曱基丙烷三(甲基)丙烯酸酯、環氧丙烷改質三羥曱基 丙烷三(曱基)丙烯酸酯、表氯醇改質三羥曱基丙烷三(曱基) 丙烯酸酯、二-三羥曱基丙烷四(曱基)丙烯酸酯、甘油三(曱 f 基)丙烯酸酯、表氯醇改質甘油三(曱基)丙烯酸酯、二甘油 四(曱基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇 四(甲基)丙烯酸酯、二季戊四醇五(曱基)丙烯酸酯、烷基改 質二季戊四醇五(曱基)丙稀酸酯、烧基改質二季戊四醇四 (曱基)丙烯酸酯、烷基改質二季戊四醇三(甲基)丙烯酸酯、 二季戊四醇六(曱基)丙烯酸酯、己内酯改質二季戊四醇六 (曱基)丙烯酸酯、環氧乙烷改質麟酸三(曱基)丙烯酸酯、三 聚異氰酸三[(曱基)丙烯醯氧基乙基]醋、己内酯改質三聚異 氰酸三[(曱基)丙烯醯氧基乙基]酯、或者胺基曱酸酯(甲基) 丙烯酸醋等。 該些丙烯酸系樹脂可僅使用一種,亦可混合兩種或兩 種以上使用。 6 (3) 界面活性部丨 於期望提高喷墨用墨水之塗佈性時,可添加實現此目 的之界面活性劑。於本發明之噴墨用墨水中添加的界面活 性劑的具體例,可列舉:商品名「Byk-300」、「Byk-306」、 「Byk-335」、「Byk-310」、「Byk-341」、「Byk-344」、「Byk-370」 100 200902644 27225pif (BYK Chemie股份有限公司製造)等發系界面活性劑; 商品名「Byk-354」、「Byk-358」、「Byk-361」(byk Chemie ^伤有限公司製造)荨丙;酸糸界面活性劑;商品名 「DFX-18」、「ftergent 250」、「ftergent 251」(Ne〇s 股份有 限公司製造)等氟系界面活性劑。 該些界面活性劑可僅使用一種,亦可混合兩種或兩種 以上使用。 界面活性劑疋用以提南對基礎基板的潘濕性、流平性 或者塗佈性’較好的是相對於喷墨用墨水 份 加讀重量份叫重量份而加以使用。 ^ K4)名靜雷劑 於本發明之嘴墨用墨水中添加的抗 定,可使用眾所周知的抗靜電 ^劑並無特別限 錫、氧化錫•氧化_ 體而言可列舉··氧化Z/ZZDpiT or a polymer compound (B) or an alkenyl group is a good solvent for the nadic acid ylidene imide compound (C), so that it can be preferably used, but on the other hand, the solvent affects the durability of the ink jet head. So need to pay attention. Preferably, 70 of the solvent (D) contained in the inkjet ink of the present invention contains no guanamine-based solvent, or at most 20% by weight or less based on the total weight of the solvent (D). 3 Xuanqing> The granules can be used alone or in combination of two or more. Hydramine (A), 矽醯胗醅^ y/v. 7 /1 person ti / —_ 丄 and ene substituted turbid acid yttrium imide also gold material _ this 5 Ming towel, spray The lysine (A) and the stone stalk t of the money ink towel. The total concentration of /夂^ is not particularly limited, and is preferably from 1 wt% to 99 70 wt%. If it is a ship, it is better to use 22(10)~, and the ejection precision is high. The film thickness obtained by one inkjet is optimal. The ink is not fixed. The ink: the concentrated wt% of the polymer compound (B) in the ink ^25 wt〇/〇0 . ^ 〇Γ%^5° Wt% 5 gives good characteristics, and:::the range of agronomics' can be used as an insulating film to read and read the silky nucleus imine, limited by It is better to use it as a good feature, but the degree range is 94 200902644 27225pif. When used as an ink for inkjet, it is the case of A. sulphate (A.) and polymer compound (4) (A) and/or the yttrium ylide compound (C), the thicker the sulphate and the alkenyl substituted Nadi film, the better, but the 醯, the resulting polyimine 臈 臈, so sometimes There will be no problems: the results of the efforts of the people who have been working hard since the inkjet two became high. The present invention is preferably used as a formable thicker concentration range of water. An inkjet ink such as a quinone imine film or (d) an amino acid (A,), an amine acid (4), and a dilute-substituted nadic acid-imidized second substance are obtained by molecular compounds (8) and (D). And if necessary, the solvent is further mixed, and according to the desired characteristics, the following method is obtained: if necessary, the ink for inkjet can be selected by using, for example, a surfactant, an antistatic agent, a doll, an oxygen resin, an acrylic resin, Agent, amine ruthenium compound, ρΗ value adjustment, 1, epoxy curing agent such as stupid tricarboxylic acid, antioxidant, reduction inhibitor = travel anti-recording agent, preservative, mildew/gluten polymer, pigment, , χ promoter, chelating agent, water Yang,, (4) (4) dissolved. + The ink for inkjet according to the present invention is an epoxy resin contained in an ink for inkjet ink. In the present invention, the epoxy bismuth (_ane) II, the epoxy bismuth (Qxirane) has two or more epoxy oximes = particularly limited, preferably 95 200902644 in the present invention, the mouth black Preferably, it is preferred that the concentration of the epoxy resin in the crucible 1 is not particularly Wt%. If the weight is 〖~2G, which is better than 1 wt% to 10, heat resistance and chemical resistance, the epoxy resin of the coating film formed by the inkjet ink may be, for example, a type II ester. Epoxy resin, bismuth S-bisphenol quinone type oxy-oxygen resin, glycidyl polymer, and copolymer with bismuth: % oxy resin, monomer with epoxy ethidene and epoxy resin and other monomers Wait. Specific examples of acid methyl glycosphate Li, 4·epoxycyclohexan vinegar and (meth) propylene; column: n-fired single, one of the other monomers copolymerized) propylene (mercapto) acrylic acid, ( Methyl methacrylate, (曱二, (审^,·曰/(曱)) isopropyl acrylate, (曱) acrylic acid n-butyl: aceamic acid ΐ ΐ: dilute acid isobutyl 11: (fluorenyl) Acrylic acid tributyl, (fluorenyl) t: &lt; 1, (benzyl) benzyl acrylate, (mercapto) acrylic acid 2-hydroxyacetamidine,: base \ acrylic acid 2 _ propyl acetoacetate, phenyl Tethered, methyl styrene, chlorine: stupid ethylene, (meth)propionic acid (3 · ethyl-3-epoxypropyl) vinegar, N-cyclohexyl maleimide and N-phenyl maleimide, etc. Preferred examples of the copolymer of a monomer having ethylene oxide and a copolymer of a monomer having ethylene oxide and another monomer include poly Glycidyl methacrylate, decyl methacrylate-glycidyl glycerol conjugate, benzyl methacrylate _ methacrylate glycidyl methacrylate copolymer, n-butyl methacrylate - methacrylic acid glycidol ester Polymer, 2-hydroxyethyl methacrylate-glycidyl methacrylate copolymer, mercapto propylene 96 200902644 27225pif acid (3-ethyl-3-epoxypropyl) 曱g--methacrylic acid glycidol The ester copolymer and the styrene-glycidyl methacrylate copolymer. If the inkjet ink of the present invention contains the epoxy resin, the coating film formed of the inkjet ink has good heat resistance, so it is preferable. Specific examples of the epoxy resin which can be contained in the inkjet ink of the present invention include "Epikote 807", "Epikote 815", "Epikote 825", "Epikote 827", "Epikote 828", and "Epikote". 190P", "Epikote 191P" (above, manufactured by Yuka Shell Epoxy Co., Ltd.), trade name "Epikote 1004", "Epikote 1256" (above, manufactured by Nippon Epoxy Co., Ltd.), Trade name "Araldite CY177", trade name "Araldite CY184" (manufactured by Ciba-Geigy Co., Ltd.), trade name r Celloxide 2021P", "Celloxide 3000", "EHPE- 3150" (manufactured by Daicel Chemical Industry Co., Ltd.), trade name "Techmore VG3101L" (manufactured by Mitsui Chemicals, Inc.), ν, ν, ν', ν, -tetraglycidyl-m-xylylenediamine, 1, 3-Bis(Ν,Ν-diglycidylaminemethyl)cyclohexane, hydrazine, hydrazine, hydrazine\Ν|-tetraglycidyl-4,4'-diaminodiphenyl decane. In the above, when the trade name "Araldite CY184", the trade name "Celloxide 2021P", the trade name "Techmore VG3101L", and the trade name "Epikote 828" are used, the flatness of the obtained polyimide film is particularly good, so that it is good. The epoxy resin may be used singly or in combination of two or more. 6(2) Acrylic acid resin 97 200902644 The ink for inkjet may further contain an acrylic resin. The acrylic resin contained in the ink for nozzle ink is not particularly limited as long as it has an acrylonitrile group or a methyl propyl group. The concentration of the acrylic resin in the ink for inkjet is not particularly limited, and is preferably 0.1 Wt% to 20 wt%. ,even better is! Wt%~1〇 wt%. In the case of the concentration range, the heat resistance of the coating film formed of the inkjet ink is good, and the chemical property and flatness are good. Examples of the acrylic resin include a monofunctional poly-I form having a hydroxyl group, a monofunctional polymerizable monomer having no silk, a difunctional (fluorenyl) propyl group, and a trifunctional polyfunctional group (methyl group). Specific examples of the monofunctional polymerizable monomer having a acrylic acid group include 2-hydroxyethyl acrylate, (meth)acrylic acid 2 methacrylic acid acrylate 4-pyridinium, or 】, 4_cyclohexene dicarboxylic acid vinegar and the like. Among them, in terms of the flexibility of the formed film, eucalyptus 'θ acrylic acid 4-pyridylpyridine, li4•cyclohexene dimethanol monoacrylic acid vinegar. Specific examples of the monofunctional polymerizable monomer are exemplified by (meth) propyl-glycidyl ester, (meth) propyl _3. (meth)acrylic acid methyl glycidol vinegar, 3 _Methyl propyl, :, methyl epoxidized, 3-ethyl-3-rmethyl decyl propyl lactopyl, 3-methyl-3 彳 methyl propylene _ soil ~ oxymethyl Epoxy propyl acrylate ethyl epoxide, A propoxy erythr epoxy, propylene methyl group % &lt; oxypropyl-3-yl f ether, 2-phenyl _ 3 fluorene hydrazine, dioxin '2 -: qijiamei 3 π, "methyl) ene methoxymethyl epoxide propylene oxymethyl epoxide, 4 _ triphos) propylene oxymethyl epoxide, ( Exhaustion C ^ 98 200902644 27225pif base) _, the purpose, (曱基) (10) acid ethyl g |, (mercapto) acrylic acid butyl vinegar, :: base) propane acid cyclohexanol ' (methyl (3 曰Ethene 3, ethylene, hydrazine methyl styrene, (oxyalkyl) propyl acrylate, N, cyclohexyl cis-butyl bis-imide, hydrazine, butyl-di-imide, ethylene Stupid, (meth) acrylamide, (A ^ ^ ^ yang 癸 ^ (4) (four) acid: cyclopentyloxy mercapto acrylic acid, vinegar, (meth) acrylate phthalate, glycerol ( =: SV polystyrene giant monomer, polymethyl methacrylate A: giant: lauryl alcohol ring m, H) acrylic acid 5_tetrahydrofurfuryloxycarbonyl pentane vinegar, acid, butyl s Methyl)acrylic acid vinegar, (meth) acrylic acid, yidi, cinnamic acid, cis-butanic acid, anti-butene rebel rf cis-succinic acid, methyl-butyric acid, vinegar, ^ Butadiene-succinic acid mono [2-(methyl)acrylic oxyethyl], etc. hexadeced _3,4_dicarboxylic acid mono[2_(methyl)propoxy-oxyethyl oxime (A Specific examples of the acrylic acid vinegar include: bis-F ring ester, iso: ethene ethane-modified diacrylic acid dilute acid 酉: 'Ethylene-burning modified two (10) acid hydrazine, polyethylene glycol two Propyl propanol dipropionate, keto-pentaerythritol diacrylate, single hard drink, 14 pento-propyl ester, quarter 16-hexane®, butyl diol diacrylate, : Alcohol two dilute vinegar, 壬 二甲 二甲 二 二 骑 骑 骑 丁基 丁基 丁基 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 Acid vinegar, etc. Specific examples of trifunctional polyfunctional (meth) acrylates, Listed: trimethylolpropane tris(mercapto) acrylate, ethylene oxide modified trishydroxypropyl propane tri (meth) acrylate, propylene oxide modified trihydroxy decyl propane tris(fluorenyl) acrylate Ester, epichlorohydrin modified trihydroxymercaptopropane tris(indenyl) acrylate, di-trihydroxydecylpropane tetra(indenyl) acrylate, glycerol tris(decyl) acrylate, epichlorohydrin modification Tris(meth)acrylate, diglyceryltetrakis(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(indenyl)acrylate, alkyl modification Dipentaerythritol penta(indenyl) acrylate, alkyl modified dipentaerythritol tetrakis(meth) acrylate, alkyl modified dipentaerythritol tri(meth) acrylate, dipentaerythritol hexakisyl acrylate , caprolactone modified dipentaerythritol hexa(indenyl) acrylate, ethylene oxide modified tris(mercapto) acrylate, trimeric isocyanate tris[(indenyl) propylene oxiranyl ethyl] Vinegar, caprolactone modified trimeric isocyanate tris[(indenyl)-propyl Acyl oxy ethyl] ester, or amine Yue ester (meth) acrylate vinegar. These acrylic resins may be used singly or in combination of two or more kinds. 6 (3) Interface active portion 界面 When it is desired to improve the coatability of the inkjet ink, a surfactant which achieves this purpose can be added. Specific examples of the surfactant to be added to the inkjet ink of the present invention include "Byk-300", "Byk-306", "Byk-335", "Byk-310", and "Byk-". 341", "Byk-344", "Byk-370" 100 200902644 27225pif (manufactured by BYK Chemie Co., Ltd.) and other hairline surfactants; trade names "Byk-354", "Byk-358", "Byk-361" (byk Chemie ^ Injury Co., Ltd.) 荨 ;; acid 糸 surfactant; trade name "DFX-18", "ftergent 250", "ftergent 251" (manufactured by Ne〇s Co., Ltd.) and other fluorine-based interfacial activity Agent. These surfactants may be used alone or in combination of two or more. The surfactant 疋 is used for the pan wetness, leveling property or coating property of the base substrate. It is preferably used in combination with the weight portion of the ink for inkjet printing. ^ K4) 名静雷剂 The anti-static agent added to the ink for ink of the present invention can be used without any particular limitation. Tin, tin oxide, oxidation, and oxidation can be exemplified.

V 以 化物等金屬氧化物或者二級録趟等!1化锡•氧化崎合氧 上使Γ些抗靜電财僅使用-種,亦可混合兩種或兩種, 抗靜電劑是用以防止 墨 水100重量份,夭 ,較好的是相對於噴墨用 &quot;J’、加〇·〇〗重量份〜】舌旦八 重置伤而加以使用。 於本發明之嘴II用里 燒氧基魏化合物“ 定’可使用眾所周二中添加的偶合劑並無特別限 烷偶合劑,具體而言可,二添加之偶合劑較好的是矽 院化合物箄。—烷氧基矽烷化合物或者二 可例示:7·乙烯基丙基 101 200902644 272 乃 ρΐί 三曱氧基珍烧、乙柄'基丙基二乙氧基碎院' Τ _丙細酿 基丙基曱基二甲氧基矽烷、7-丙烯醯基丙基三曱氧基矽 烷、丙烯醯基丙基曱基二乙氧基矽烷、7-丙烯醯基丙 基三乙氧基矽烷、Τ-曱基丙烯醯基丙基曱基二曱氧基矽 烷、甲基丙烯醯基丙基三甲氧基矽烷、r-曱基丙烯醯 基丙基甲基二乙氧基矽烷、r-曱基丙烯醯基丙基三乙氧基 矽烷、r-縮水甘油氧基丙基曱基二甲氧基矽烷、縮水 甘油氧基丙基三曱氧基石夕烧、τ-縮水甘油氧基丙基甲基二 、 乙氧基矽烷、r-縮水甘油氧基丙基三乙氧基矽烷、r-胺 基丙基曱基二曱氧基碎烧、7 _胺基丙基二曱氧基珍娱*、7&quot; -胺基丙基曱基二甲氧基矽烷、胺基丙基三乙氧基矽 烷、N-胺基乙基-r-亞胺基丙基曱基二曱氧基矽烷、N-胺 基乙基-7 -胺基丙基三甲氧基石夕焼&lt;、N-胺基乙基-7 -胺基丙 基二乙氧基石夕烧、N-苯基-7 -胺基丙基二曱氧基石夕烧、N-苯基_ T -胺基丙基三乙氧基碎烧、N-苯基-7 -胺基丙基曱基 二曱氧基碎烧、N-苯基-胺基丙基甲基二乙氧基碎烧、 ( T-Μ基丙基曱基二曱氧基矽烷、胺基丙基三曱氧基矽 烷、7-巯基丙基甲基二乙氧基矽烷、r-巯基丙基三乙氧 基矽烷、T-異氰酸酯丙基曱基二乙氧基矽烷、異氰酸 酯丙基三乙氧基矽烷等。該些中,可列舉乙烯基丙基三 曱氧基矽烷、7-丙烯醯基丙基三曱氧基矽烷、甲基丙 烯醯基丙基三曱氧基矽烷、T-異氰酸酯丙基三乙氧基矽烷 等。 該些偶合劑可僅使用一種,亦可混合兩種或兩種以上 102 200902644 27225pif 使用。 偶=劑較好的是相對於喷墨用墨水i〇〇重量份,添加 0.01重里伤〜3重量份而加以使用。 6-ί 6 ) —於本U之嘴墨用墨水巾添加的環氧固化劑並無特別 限疋可使用S所周知的環氧固化劑。具體而言可列舉: 有機酸二醯肼化合物、咪唑以及咪唑的衍生物、雙氰胺 (dic)andiamide)、芳香族胺、多元竣酸、多元緩酸酐等。 更具體而言可列舉:雙氰胺等雙氰胺類,己二酸二酿肼、 1,3-雙(肼基叛乙基)_5_異丙基乙内酿腺(物㈣如 carboethyl) 5 isopropyl hydantoin)等有機酸二醯肼,2 4_ j基乙基料基乙基三嗪、2_苯基♦坐、^ 苯土 4、甲^米°坐、2·苯基冰甲基·5令基曱基料等&quot;米°坐衍 二曱酸酐、偏苯三曱酸酐、U,4-環己烷三羧酸 -1,2-酐荨酸酐等。 的是翻性良好的偏苯三甲酸、以4·環己 统二叛酸-1,2-軒。 該些環氧固化劑可僅使用一種,亦可混合兩種或兩種 以上使用。 、%氧固化劑較好的是相對於嘴墨用墨水·重量份, 添加0.2重量份〜5重量份而加以使用。 可於本發明之噴墨用墨水中添加胺基矽化合物。胺基 石夕化合物可縣:軸絲基三?氧基雜、對胺基苯基 103 200902644 三乙氧基矽烷、間胺基苯基三甲氧基矽烷、間胺基笨基三 乙氧基矽烷、胺基丙基三甲氧基矽烷、胺基丙基三 矽烷等。 —虱i 亦可混合兩種或兩 該些胺基矽化合物可僅使用一種 種以上使用。 胺基矽化合物是用以提高與基板的密著性,較好V is a metal oxide such as a compound or a second-order recording! 1 锡 锡 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化 氧化Ink used &quot;J', plus 〇·〇〗 Weights ~] tongue and eight reset injury and use. In the mouth II of the present invention, the alkoxylated compound can be used. The coupling agent added in the prior art is not particularly limited to an alkane coupling agent. Specifically, the coupling agent of the second addition is preferably a brothel. The compound 箄--alkoxydecane compound or two can be exemplified: 7·vinyl propyl 101 200902644 272 ρ ί 曱 曱 曱 珍 、 、 、 、 、 、 、 、 、 、 、 、 、 、 基 基 基 基 基 基 基 基 _ _ Propyl decyl dimethoxy decane, 7-propylene decyl propyl tridecyl decane, propylene decyl propyl decyl diethoxy decane, 7-propylene decyl propyl triethoxy decane, Τ-mercaptopropenylpropyl decyl decyloxydecane, methacryl propyl propyl trimethoxy decane, r-mercapto propylene propyl propyl methyl diethoxy decane, r-fluorenyl Propylene decyl propyl triethoxy decane, r-glycidoxy propyl decyl dimethoxy decane, glycidoxy propyl trimethoxy oxycarbazide, τ-glycidoxy propyl methyl 2. Ethoxy decane, r-glycidoxypropyl triethoxy decane, r-aminopropyl decyl decyloxy calcined, 7-amino group曱 曱 珍 珍 **, 7&quot;-aminopropyl decyl dimethoxy decane, aminopropyl triethoxy decane, N-aminoethyl-r-iminopropyl fluorenyl Dimethoxydecane, N-Aminoethyl-7-aminopropyltrimethoxyxanthine&lt;,N-Aminoethyl-7-aminopropyldiethoxylate, N-Benzene Benzyl-7-aminopropyl decyloxylate, N-phenyl-T-aminopropyltriethoxy pulverization, N-phenyl-7-aminopropyl decyl decyloxy Crushed, N-phenyl-aminopropylmethyldiethoxyoxycene, (T-mercaptopropyl decyl decyloxydecane, aminopropyltrimethoxy decane, 7-mercaptopropyl Methyl diethoxy decane, r-mercaptopropyl triethoxy decane, T-isocyanate propyl decyl diethoxy decane, isocyanate propyl triethoxy decane, etc. Among these, ethylene is exemplified. Propyltrimethoxydecane, 7-propenylpropyltrimethoxydecane, methacryl propyltrimethoxydecane, T-isocyanatepropyltriethoxydecane, etc. The mixture may be used alone or in combination of two or more types. 102 200902644 27225p If the agent is used, it is preferable to add 0.01 weight loss to 3 parts by weight with respect to the inkjet ink i〇〇 part by weight. 6-ί 6 ) - Add to the ink pad of this U ink The epoxy curing agent is not particularly limited, and an epoxy curing agent known in the art can be used. Specific examples thereof include diterpene compounds of organic acids, derivatives of imidazoles and imidazoles, and dicyanamide and iamide. An aromatic amine, a polyvalent decanoic acid, a polybasic slow acid anhydride, etc. More specifically, dicyandiamides, such as dicyandiamide, adipic acid, and 1,3-bis(decyl-ethene)_5_ Isopropyl B inner gland (substance (4) such as carboethyl) 5 isopropyl hydantoin) and other organic acid diterpenes, 2 4_ j ethyl ethyl ethyl triazine, 2 phenyl ♦ sit, ^ benzoate 4, A ^米°坐,2·phenyl ice methyl·5 曱 曱 base materials, etc. &quot;米°坐衍二曱酸酸, trimellitic anhydride, U,4-cyclohexanetricarboxylic acid-1,2 - Anhydride anhydride or the like. It is a well-turned trimellitic acid with 4·cyclohexene di-oroxic acid-1,2-xuan. These epoxy curing agents may be used alone or in combination of two or more. The % oxygen curing agent is preferably used in an amount of from 0.2 part by weight to 5 parts by weight per part by weight of the ink for the nozzle ink. An amine sulfonium compound can be added to the inkjet ink of the present invention. Amine Shishi compound can county: axis silk base three? Oxyhetero, p-aminophenyl 103 200902644 triethoxy decane, m-aminophenyl trimethoxy decane, m-aminophenyl triethoxy decane, aminopropyl trimethoxy decane, amine propyl Base trioxane and the like. —虱i It is also possible to mix two or two of these amine-based ruthenium compounds, and it is possible to use only one type or more. The amine ruthenium compound is used to improve the adhesion to the substrate, preferably

相對於噴墨用墨水1〇〇重量份,添加〇 〇5重量份〜2旦 份而加以使用。 里 於本發明中,喷墨用墨水之黏度並無特別限定, 溫下進行喷射之情形時,就提昇藉由噴墨塗佈方法之喷 精度之方面而言,較好的是ImPa.s〜50mpa.s(25r、) 更好的是5mPa.s〜3QmPa.s(25t),進而好的是8她a’· s〜20mPa · s (25°C )。 於加熱溫度(矽醯 〜120°C )下為] s〜30 mPa · s,更 於加熱噴墨頭進行噴射之情形時, 胺酸不會固化之溫度,較好的是4〇t: mPa. S〜5GmPa· s,較好的是 5mPa· 好的是8mPa· s〜2〇mPa 亞胺膜 =噴墨將本發明之噴墨用墨水塗佈於基板表面,以 素Ίίΐ烘箱等進行加熱處理,可形成整面或者預定圖 、廿大等)之聚酿亞胺膜。又,本發明之聚醯亞胺膜 去雜Β不侷限於加熱處理’亦可為紫外線(UV)處理或 子束、電子束、伽卿線(gammamy)等處理。 104 200902644 27225pif 先則’於形成圖案狀之㈣亞胺膜 微影技術,而此技娜錢絲阻㈣使用光 剝離液等多種大量化學藥品,並且需要、错。刻液、 於此,使用本發明之喷墨用墨水而形成的圖案對 膜具有如下特徵:由於是藉由魅印刷而僅於需要之f胺 而可多品種大量生產,且製造所需製程數Γ軍,故 根據墨水之噴出方法,喷墨塗佈方 舉:壓電元件型、氣泡嘴墨(bubbiejet)f_ 2)型、連續喷射型、靜電感應Uatie_ ^冊 =適當轉墨水巾所含的各成分,可財發明之=藉 ==行噴射,從而可將嘴墨用墨水塗佈為_ 元件之4水進行塗佈的更好之噴財法為壓電 備:具有多個喷嘴之喷心 件==:圍;:=料之壓力產生元 -.y^ 件之周圍充斥的墨水,藉由施加電壓 =力產生元件移位,從而使墨水之小㈣自噴嘴喷出。 、喷墨塗佈裝置並不限定於塗佈喷頭與墨水收容部兩者 ^的裝置’亦可使料兩者不可分離之化 不僅有以相對於塗佈喷頭可分離或二 刀離之方式與喷頭一體化並搭载於托架上的形態,亦有設 105 200902644 I rzz^pii 置於裝置之固定部位,經由墨水供給部 佈喷頭供給墨水的形態。 】如&amp;子,對塗 又,於墨盒中設置用以對塗佈噴頭作 =叫可採用於墨盒之墨水收 可撓性墨水收容袋、以及對此= 施力之彈簧部的形態等。塗佈 裝置木用如上所述之串行(serial)塗佈方 ==應塗佈媒體之整幅之範圍内排列塗佈元二 成的仃式印表機(line printer)的形態。 ^ΜΜΜΜ. 明之塗佈方法’藉由噴墨於基板上塗佈本發 熱使溶劑⑼氣化等而將溶劑⑼除去,即進二^, 藉此可形成矽醯胺酸(Α)以及/或者矽醯胺酸(Α,)之膜。 於喷墨用墨水進而含有高分子化合物⑻、稀基取代納迪 克酸酿亞胺化合物(C)之情形時,可形成梦醯胺酸(八) 以及域者㈣賴(Α,)、高分子化合物⑻以及稀基取 代納迪克酸醯亞胺化合物(C)之複合膜。 加熱條件根據各成分之種類以及調配比例而有所不 同,較好的是矽醯胺酸以及矽醯胺酸(Α,)不會固 化之溫度’通常為7〇t〜i2(rc,於使用供箱之情形時於5 分鐘〜15分鐘形成乾燥膜’於使用加熱板之情形時於】分 鐘〜5分鐘形成乾燥臈。 8.3聚醯亞胺胺 106 200902644 27225pif 形成矽醯胺酸(A)以及/或者矽醯胺酸(Ai)之膜, 或者石夕醯胺酸(A)以及/或者;g夕酿胺酸(A,)、高分子化合 物(B)以及烯基取代納迪克酸醯亞胺化合物(c)之複合 膜後,為了使矽醯胺酸(A)以及/或者矽醯胺酸(A,)進 行亞胺化•石夕部位之固化,較好的是於15〇。〇〜35〇艽, 更好的是2GGC〜3GGC下進行加祕理,藉此可獲得聚酿 亞胺膜(於使用烘箱之情形時進行3〇分鐘〜9〇分鐘,於 使用加熱板之情形時進行5分鐘〜3〇分鐘)。另外,於高 分子化合物⑻絲_酸或者.魏胺酸料之情形時, 亦同時進行藉由加熱處理之醯亞胺化反應。 於膜形成為圖案狀之情形時,形成圖案狀之聚醯亞胺 枯=本說明書巾,若未特财及,_為輯亞胺膜包 括圖案狀之聚醯亞胺膜。 如此獲得之雜亞賴是耐酿、電絕緣性優異的絕 於原料之噴錢墨水含有環氧樹脂之情形時, ==為_、耐藥品性、平坦性、密著性以及賴射性 優異的絕緣膜,故而較好。 ^薄膜基軛 噴蓴是以如下方式而獲得:例如於藉由 聚醯亞胺薄膜等基板上,藉由嗔 = Γ預定圖案狀(線狀等)塗佈本發明 醯妓燥該基板,進而進行加熱而形成聚 ϋ電子裳# 107 200902644 例如,於預先形成有配線之聚醯亞胺薄膜等薄膜基板 上,藉由喷墨塗佈方法塗佈本發明之噴墨用墨水,其後乾 燥該薄膜基板,進而進行加熱,藉此可形成由具有絕緣性 之聚醯亞胺膜被覆之可撓性電子零件。 [實施例] 以下,藉由實施例以及比較例說明本發明,但本發明 並不限定於該些實施例。 實施例以及比較例中所使用的具有大於等於2個之酸 、' 酐基之化合物(al)'單胺(a2)、具有】個酸酐基之化合 物(al')、二胺(〇、具有大於等於2個之酸酐基之化合 物(bl)、二胺(b2)、單胺(b3)、稀基取代納迪克酸^ 胺(◦、以及溶劑⑼之名稱記為略號。α下敍述中使 用此略號。 甚直太gl蔓於2個&lt;酸酐基之化奋 ODPA . 3,3',4,4'-二笨基鍵四叛酸二 BTDA · 3,3',4,4'-二苯基酮四叛酸二酐 。 6FDA : 4,4'_六氟亞丙基雙鄰苯二甲酸二軒 jL^,,Xa2) &gt; Cb3) APSE : 3-胺基丙基三乙氧基矽烷 UUJ固酸酐基之化合物fay) TESA :三乙氧基石夕烷基丙基琥珀酸酐 ^J£-Xa2' )&gt;(b2) DDS : 3,3'-二胺基二苯基颯 pDA :對苯二胺 108 200902644 27225pif 7ΗΗΡ·5'[((正庚基環己基)乙基環己基)苯基]甲基-1,3-二胺基苯 7HB 1’1雙[4-(4-胺基苄基)苯基]_4_正庚基環己燒 BAPP : 2,2_雙[4-(4-胺基苯氧基)苯基]丙烷 &amp;To 5 parts by weight of the ink for inkjet, 5 parts by weight to 2 parts by weight of ruthenium was added and used. In the present invention, the viscosity of the ink for inkjet is not particularly limited, and in the case of spraying at a temperature, it is preferable to improve the spray precision by the inkjet coating method, preferably ImPa.s~ 50mpa.s (25r,) is better 5mPa.s~3QmPa.s (25t), and then 8 is her a's s~20mPa · s (25°C). At a heating temperature (矽醯~120 ° C), it is s~30 mPa · s, and when the ink jet head is sprayed, the temperature at which the amine acid does not solidify is preferably 4 〇 t: mPa. S~5GmPa·s, preferably 5mPa·better 8mPa·s~2〇mPa imine film=inkjet The inkjet ink of the present invention is applied to the surface of the substrate, and heated in a ΊίΊ oven or the like. The treatment can form a full-size or predetermined pattern, a large-sized imine film. Further, the polyimine film of the present invention is not limited to heat treatment, and may be treated by ultraviolet (UV) treatment or sub-beam, electron beam, gammamy or the like. 104 200902644 27225pif The first step is to form a pattern of (4) imine film lithography technology, and this technique is used in a variety of large quantities of chemicals, such as light stripping liquid, and is required and wrong. In the engraving, the pattern-forming film formed by using the inkjet ink of the present invention is characterized in that it can be mass-produced in a variety of varieties by only the desired f-amine by charm printing, and the number of processes required for manufacturing is required. Qi Jun, so according to the ink ejection method, inkjet coating: piezoelectric element type, bubble mouth ink (bubbiejet) f_ 2) type, continuous injection type, electrostatic induction Uatie_ ^ booklet = appropriate to the ink towel Ingredients, can be invented = l == line jet, so that the mouth ink can be coated with ink as _ element of 4 water for coating better piezoelectric method: the nozzle with multiple nozzles Piece ==: Circumference;: = The pressure of the material is generated. The ink filled around the y-y member is displaced by the application of voltage = force, so that the ink is small (four) ejected from the nozzle. The inkjet coating device is not limited to the device of the coating head and the ink containing portion, and the material can not be separated from each other. In a form in which the method is integrated with the head and mounted on the bracket, there is also a configuration in which 105 200902644 I rzz^pii is placed in a fixed portion of the device, and ink is supplied through the ink supply portion. For example, if the &amp; sub-coating is applied, the ink cartridge is provided with an ink-receiving ink accommodating bag which can be used for the coating head, and the spring portion of the urging force. The coating apparatus wood is arranged in the form of a serial printer in which the coating medium is arranged in the range of the entire width of the coating medium as described above. ^ΜΜΜΜ. The coating method of 'Bright' by removing the solvent (9) by vaporizing the heat generated on the substrate by the application of the heat of the solvent (9), etc., thereby forming a proline (Α) and/or a membrane of proline (Α,). When the ink for inkjet further contains a polymer compound (8) or a dilute-substituted nadic acid-based imine compound (C), it can form a dream acid (8) and a domain (4) Lai (Α), a polymer. A composite film of the compound (8) and a dilute group-substituted nadic acid ruthenium imide compound (C). The heating conditions vary depending on the type of each component and the blending ratio. It is preferred that the temperature at which valine and glutamic acid do not solidify is usually 7 〇t to i2 (rc, used). In the case of a box, a dry film is formed in 5 minutes to 15 minutes. When the heating plate is used, a dry mash is formed in minutes to 5 minutes. 8.3 Polyimine amine 106 200902644 27225pif Forms proline (A) and / or a membrane of proline (Ai), or a sylvestreic acid (A) and / or; a glutamic acid (A,), a polymer compound (B) and an alkenyl substituted nadic acid After the composite film of the amine compound (c), in order to imidize the lysine (A) and/or the valine acid (A), it is preferably 15 Å. ~35〇艽, more preferably 2GGC~3GGC for the addition of the secret, to obtain the polyimide film (in the case of using the oven for 3 minutes ~ 9 minutes, when using the heating plate) 5 minutes to 3 minutes). In addition, in the case of the polymer compound (8) silk-acid or w-amic acid, When the film is formed into a pattern, the patterned polyimine is formed in the form of a pattern, and if it is not particularly expensive, the film is included. The patterned polyimide film is obtained in the case where the inkjet ink which is excellent in the resistance to brewing and electrical insulation is contained in the case where the ink is contained in the ink, and the chemical resistance is flat. It is preferable to use an insulating film excellent in adhesion and excellent visibility. ^The film-based yoke sneeze is obtained by, for example, on a substrate such as a polyimide film, by 嗔 = Γ a predetermined pattern The present invention dries the substrate and further heats it to form a polyelectron electron. #107200902644 For example, on a film substrate such as a polyimide film having a wiring formed in advance, by inkjet Coating method The inkjet ink of the present invention is applied, and then the film substrate is dried and further heated to form a flexible electronic component covered with an insulating polyimide film. Hereinafter, description will be made by way of examples and comparative examples. The present invention is not limited to the examples. The compound (al)' monoamine (a2) having two or more acids, 'anhydride group, used in the examples and the comparative examples, has an acid anhydride. a compound (al'), a diamine (anthracene, a compound having two or more acid anhydride groups (bl), a diamine (b2), a monoamine (b3), a dilute-substituted nadic acid amine (◦, And the name of the solvent (9) is written as abbreviated. This no. is used in the description of α. Very straight too gl vine in 2 &lt; acid anhydride based defensive ODPA. 3,3',4,4'-di-phenyl bond four 2,3',4,4'-diphenyl ketone tetrahydro acid dianhydride. 6FDA : 4,4'_hexafluoropropylene bisphthalate dixyl jL^,, Xa2) &gt; Cb3) APSE: 3-aminopropyltriethoxydecane UUJ solid anhydride group compound fay) TESA: triethoxy oxalyl propyl succinic anhydride ^J£-Xa2')&gt;(b2) DDS : 3,3'-diaminodiphenyl fluorene pDA: p-phenylenediamine 108 200902644 27225pif 7ΗΗΡ· 5'[((n-heptylcyclohexyl)ethylcyclohexyl)phenyl]methyl-1,3-diaminobenzene 7HB 1'1 bis[4-(4-aminobenzyl)phenyl]_4 _N-Heptylcyclohexene BAPP : 2,2_bis[4-(4-Aminophenoxy)phenyl]propane &amp;

_基取代趣造A酸醯亞胺icH ANIM : N-甲基-烯丙基雙環[2 21]庚_5_烯·2,3_二羧義 雙烯基取代納迪券.酴醢巧咹(c2) BANIM :雙{4_(烯丙基雙環[2.2.1]庚-5-烯-2,3-二幾其 醯亞胺)苯基}曱烷 一 ^ 三烯基取代納油克酸醯砟胺 (c3)_ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _咹(c2) BANIM: bis{4_(allylbicyclo[2.2.1]hept-5-ene-2,3-di-succinimide)phenyl}decane-trienyl substituted naphth Acid amide (c3)

TrisANITAEA :三{4-(烯丙基雙環[2.2.1]庚_5,_23_ 一竣基酿亞胺)二乙基}胺TrisANITAEA: three {4-(allylbicyclo[2.2.1]hepta-5,_23_monodecyl iodide)diethyl}amine

TrisANITrisAM :三{4-(烯丙基雙環[2.2.1]庚婦_23_ 二羧基醯亞胺)三苯基}曱烷 ’TrisANITrisAM: tris{4-(allylbicyclo[2.2.1]glycoside_23_dicarboxyindolimide)triphenyl}decane ’

TrisANIPARARO :三{4-(烯丙基雙環[2.2.1]庚歸 -2,3-二羧基醯亞胺)笨基}羥基曱烷 四烯基取代納迪充酸醯亞胺(c4)TrisANIPARARO: tris{4-(allylbicyclo[2.2.1]heptan-2,3-dicarboxyindolimide) phenyl hydroxy decane tetraalkenyl substituted nadi ruthenate (c4)

TetrakisANITAM :四{4-(烯丙基雙環[2.2.1]庚 _5_缚 -2,3-二羧基醯亞胺)四苯基}曱烷 溶劑(D) EDM :二乙二醇曱基乙基醚 GBL : 7&quot; -丁内酉旨 NMP : N-曱基-2-吡咯烷酮 109 200902644 [實施例1]噴墨用墨水(1) 广具備獅機以及原料投人供應口之 Μ之三口 ’供ί'如下所述之原料,於乾燥氮氣流、室溫下攪 、Γ ’獲知透明之矽醯胺酸(Α) 30 wt%溶液。直接將 該溶液1料制墨水⑴。 钱將 。該溶液之黏度為10.8 mPa · s (2亿),表面張力(25 〇為33 mN/m。溶液之黏度是以E型黏度計(Τ〇Κγ〇 ΚΕΙΚΙ製造之VISC〇NICELD)進行測定。表面張力是藉 由懸滴法以界面張力計(協和界面科學股份有限公司製^ 之 Drop Master500)進行測定。 、° al : 0DPA 12.4 g a2:APSE 17.6 g D : EDM 35.0 g D : GBL 35.0 g [實施例2]噴墨用墨水(2)TetrakisANITAM: tetra{4-(allylbicyclo[2.2.1]hept-5-bond-2,3-dicarboxyindolimide)tetraphenyl}decane solvent (D) EDM: diethylene glycol fluorenyl Ethyl ether GBL: 7&quot; - Ding Nike NMP: N-mercapto-2-pyrrolidone 109 200902644 [Example 1] Inkjet ink (1) Widely equipped with a lion machine and a raw material supply port 'Supply' The raw materials as described below were stirred in a dry nitrogen stream at room temperature to obtain a transparent phthalic acid (Α) 30 wt% solution. This solution was directly made into ink (1). Money will be. The viscosity of the solution was 10.8 mPa·s (200 million), and the surface tension (25 〇 was 33 mN/m. The viscosity of the solution was measured by an E-type viscosity meter (VISC〇NICELD manufactured by Τ〇Κγ〇ΚΕΙΚΙ). The tension was measured by a hanging drop method using an interfacial tensiometer (Drop Master 500 manufactured by Kyowa Interface Science Co., Ltd.), ° al : 0 DPA 12.4 g a2: APSE 17.6 g D : EDM 35.0 g D : GBL 35.0 g [ Example 2] Inkjet ink (2)

於具備溫度计、授拌機、原料投入供應口以及氮氣導 入口之500 ml之四口燒瓶中,供應如下所述之原料,於乾 燥氮氣流、40 C下擾拌5 hr,獲得淡黃色透明之聚醢胺酸 (B )之50 wt%溶液。 該溶液之黏度為586 mPa · s。以GPC測定之重量平 均分子量為2,100。聚酸胺酸之重量平均分子量以如下方 式求得:以聚醯胺酸之濃度成為約1 wt%之方式將所得聚 酿胺酸以四氫呋喃(THF)進行稀釋,使甩GPC裝置:曰 本分光股份有限公司製造,JASCO GULLIVER 1500(智能 110 200902644 27225pif 差示折射 β十(intelligent differential refractometer ) RI-1530),以上述稀釋液為展開劑,藉由Gpc法進行測 定’以聚苯乙稀進行換算。管柱是將T〇s〇h股份有限公司 製造之官柱(column ) G4000HXL、G3000HXL、G2500HXL 以及G2000HXL這4根以該順序連接而加以使用,於管柱 溫度40 C、流速1.0 ml/min之條件下進行測定。 bl : ODPA 55.0 g b2 : DDS li.Og b3 : APSE 59.0 g D : (3BL 291.0 g 如下述般供應實施例 1之矽醯胺酸(A)溶液與該聚 醯胺酸(0)溶液’攪拌2 hr ’獲得固體成分濃度30 wt〇/() 溶液。將該溶液用作喷墨用墨水(2)。該溶液之黏度為12.9 mPa *s(25C)’ 表面張力(25 c)為 31.7 mN/m。 石夕緣胺酸(A)溶液64.0 g 聚_胺酸(B)溶液32.0g D : GBL 24.0 g D : BDM 40.0 g [實施例3]噴墨用墨水(3) 如下述般供應實施例1之矽醯胺酸(A)溶液與烯基 取代納达克酸.亞胺(C) ’授拌至固體成分完全溶解,獲 得石夕醯胺酸(A ) /細基取代納迪克酸酿亞胺(C )之40 wty〇 溶液。將该溶液用作喷墨用墨水(3)。該溶液之黏度為18.1 mPa .s (25C),表面張力(25C)為 31.8 mN/m。 111 200902644 z/zzjpn 矽醯胺酸(Α)溶液 50 g c2 : BANIM 15g D : GBL 5 g D : EDM 5 g [實施例4] 將實施例1中製備之喷墨用墨水(1)用作噴墨墨水,In a 500 ml four-necked flask equipped with a thermometer, a mixer, a raw material supply port, and a nitrogen inlet, the following materials were supplied, and the mixture was stirred for 5 hr under a dry nitrogen stream at 40 C to obtain a pale yellow transparent. A 50 wt% solution of polylysine (B). The viscosity of the solution was 586 mPa·s. The weight average molecular weight measured by GPC was 2,100. The weight average molecular weight of the polyamic acid is determined by diluting the obtained poly-tanic acid with tetrahydrofuran (THF) in such a manner that the concentration of the polyamic acid is about 1 wt%, so that the 甩GPC apparatus: 曰本分光Manufactured by the company, JASCO GULLIVER 1500 (Intelligent 110 200902644 27225pif differential differential refractometer RI-1530), using the above dilution as a developing agent, measured by Gpc method's conversion with polystyrene . The column is connected by the four columns G4000HXL, G3000HXL, G2500HXL and G2000HXL manufactured by T〇s〇h Co., Ltd. in this order, at a column temperature of 40 C and a flow rate of 1.0 ml/min. The measurement was carried out under the conditions. Bl : ODPA 55.0 g b2 : DDS li.Og b3 : APSE 59.0 g D : (3BL 291.0 g The solution of the proline (A) solution of Example 1 and the solution of the poly (resource) (0) was stirred as follows. A solid concentration of 30 wt〇/() solution was obtained at 2 hr'. This solution was used as an inkjet ink (2). The viscosity of the solution was 12.9 mPa*s (25C)' Surface tension (25 c) was 31.7 mN. /m. Aspartic acid (A) solution 64.0 g Poly-amino acid (B) solution 32.0 g D : GBL 24.0 g D : BDM 40.0 g [Example 3] Inkjet ink (3) Supply as follows The solution of the proline (A) solution of Example 1 and the alkenyl group substituted nalacid. The imine (C) 'mixed until the solid component was completely dissolved to obtain the astaxantine acid (A) / fine base substituted Nadick A 40 wty solution of the acid-coated imine (C) was used as the ink for inkjet (3). The viscosity of the solution was 18.1 mPa·s (25 C) and the surface tension (25C) was 31.8 mN/m. 111 200902644 z/zzjpn Proline (Α) solution 50 g c2 : BANIM 15 g D : GBL 5 g D : EDM 5 g [Example 4] The inkjet ink (1) prepared in Example 1 was used as Inkjet ink,

以FUJIFILM Dimatix公司製造之喷墨塗佈裝置 DMP-2831,於1·5 mm厚之玻璃環氧樹脂雙面敷鋼板上設 定為1點寬且點距40微米,進行長5 cm之線塗佈。噴墨 頭之加熱器設定為30°C,壓電電壓為16 V,驅動頻率為5 kHz。將基板以80°C之加熱板乾燥5分鐘後,以23〇°c之 烘箱加熱30分鐘,獲得形成為線狀之聚醯亞胺之絕緣膜。 以光學顯微鏡觀察所得聚醯亞胺膜之線寬以及該線寬 之均勻性,測定膜厚。膜厚以如下方式測定:使用 KLA-Tencor Japan股份有限公司製造之觸針式膜厚計α -step 200 ’將3處之剛定值之平均值作為膜厚。將其結果 示於表1。線具有充分之厚度。 [實施例5] 又 將貫施例2中製備之唆 ^ ^ ^ , ^ &lt;貝墨用墨水(2)用作喷墨墨水’ 以與實施例4相同之條件霜〜 1 獲件聚醯亞胺之絕緣膜。 以與貫她例4相同之 價。將其結果示於表1 [實施例6] 將實施例3中製僑之嘴墨 ^ ^ ^ β ± 〈條件對所得聚醯亞胺膜進行評 綠具有充分之厚度。 用墨水(3)用作喷墨墨水 112 200902644 27225pif 將點距設為20微米,除此以外以與實施例4相同之條件獲 得聚醯亞胺之絕緣膜。 以與實施例4相同之條件對所得聚醯亞胺膜進行評 價。將其結果示於表1。線具有充分之厚度。 [比較例1]喷墨用墨水(4) 如下述般供應實施例2之聚醯胺酸(B) 50%溶液,於 乾燥氮氣流、室溫下加以攪拌,獲得淡黃色透明之聚醯胺 酸(B)之25 wt%溶液。將該溶液用作喷墨用墨水(4)。 該溶液之黏度為12.3 mPa · s,表面張力(25°C )為33.2 mN/m ° 聚醯胺酸(B)溶液40.0 g D : EDM 30.0 g D : GBL 10.0 g [比較例2] 將比較例1中製備之喷墨用墨水(4)用作喷墨墨水, 除此之外以與實施例4相同之條件獲得聚醯亞胺之絕緣 膜。 以與實施例4相同之條件對所得聚醯亞胺膜進行評 價。將其結果示於表1。線不具有超過1微米之程度的厚 度。 113 200902644 [表1] 線寬(/zm) 膜厚(//m) 墨水黏度(mPa · s) 實施例4 85.3 1.67 10.8 實施例5 77.4 2.13 12.9 實施例6 103.0 2.50 18.1 比較例2 66.0 0.89 12.3 [實施例7]噴墨用墨水(5)之製備以及聚醯亞胺絕緣 膜之形成 如下述般供應原料,除此之外以依據實施例1之方法 製備喷墨墨水, 測定黏度。 al : BTDA 12.6 g a2 : APSE 17.4 g D : EDM 35.0 g D : GBL 35.0 g 進而,以依據實施例4之方法形成聚醯亞胺絕緣膜。 [實施例8]噴墨用墨水(6)之製備以及聚醯亞胺絕緣 膜之形成 如下述般供應原料,除此之外以依據實施例1之方法 製備喷墨墨水,測定黏度。 al : 6FDA 15.0 g a2 : APSE 15.0 g D : EDM 35.0 g D : GBL 35.0 g 進而,以依據實施例4之方法形成聚醯亞胺絕緣膜。 114 200902644 27225pif [實施例9]喷墨用墨水(7)之製備以及聚醯亞胺絕緣 膜之形成 如下述般供應原料,除此之外以依據實施例1之方法 製備噴墨墨水,測定黏度。 al' : TESA 21.3 g a2’ : DDS 8.7 g D : EDM 35.0 g D : GBL 35.0 g 進而,以依據實施例4之方法形成聚醯亞胺絕緣膜。 [實施例10]喷墨用墨水(8)之製備以及聚醯亞胺絕 緣膜之形成 如下述般供應原料,除此之外以依據實施例1之方法 製備喷墨墨水,測定黏度。 al' : TESA 25.5 g a2' : PDA 4.5 g D : EDM 35.0 g D : GBL 35.0 g 進而,以依據實施例4之方法形成聚醯亞胺絕緣膜。 [實施例11]喷墨用墨水(9)之製備以及聚醯亞胺絕 緣膜之形成 如下述般供應原料,除此之外以依據實施例1之方法 製備喷墨墨水,測定黏度。 al,: TESA 16.6 g a2' : 7HHP 13.4 g 115 200902644 2/J.2^pn D : EDM 35.0 g D : GBL 35.0 g 進而,以依據實施例4之方法形成聚醯亞胺絕緣膜。 [實施例12]喷墨用墨水(10)之製備以及聚醯亞胺絕 緣膜之形成 如下述般供應原料,除此之外以依據實施例1之方法 製備喷墨墨水,測定黏度。 al’ : TESA 15.8 g a2' : 7HB 14.2 g D : EDM 35.0 g D : GBL 35.0 g 進而,以依據實施例4之方法形成聚醯亞胺絕緣膜。 [實施例13]喷墨用墨水(11)之製備以及聚醯亞胺絕 緣膜之形成 如下述般供應原料,除此之外以依據實施例1之方法 製備喷墨墨水, 測定黏度。 al' : TESA 17.9 g a2' : BAPP 12.1 g D : EDM 35.0 g D : GBL 35.0 g 對於實施例7〜實施例13,以與實施例4相同之條件 對所得聚醯亞胺膜進行評價。將其結果示於表2。線具有 充分之厚度。 116 200902644 27225pif [表2] 實施例7 線寬(//m) Q〇 η 膜厚(/zm) 實施例8 112.2 1.83 1.45 ^—— 實施例9 76.4 1.55 - 3·υ Ο Λ - 實施例10 實施例11 80.3 ------ 95.2 —------- 1.67 ---—~- 1.64 實施例12 實施例13胃 83.5 1 1.73 ----— 2.12 雖然本發明已以實施例揭露如上,然其 本發明’任何熟習此技藝者,在*麟本㈣之精神= 圍内’當可作些許之更動與潤飾,因此本發明之保護 當視後附之申請專利範圍所界定者為準。 [產業上之可利用性] 本發明之活用法例如可列舉:可撓性配線基板用絕緣 膜、使用此絕緣膜之電子零件。 【圖式簡單說明】 圖1為「TrisANITAEA」之IR光譜。 圖 2 為「TrisANITAEA」之1H-NMR 光譜。 圖3為「TrisANITrisAM」之IR光譜。 圖 4 為「TrisANITrisAM」之1H-NMR 光譜。 圖5為「TrisANIPARARO」之IR光譜。 圖 6 為「TrisANIPARARO」之1H-NMR 光譜。 圖 7 為「TetrakisANITAM」之 IR 光譜。 圖 8 為「TetrakisANITAM」之1H-NMR 光譜。 117 200902644 z/zz^pir 【主要元件符號說明】 無The inkjet coating device DMP-2831 manufactured by FUJIFILM Dimatix Co., Ltd. was set on a 1·5 mm thick glass epoxy double-coated steel sheet with a dot width of 1 μm and a dot pitch of 40 μm. . The heater of the ink jet head was set to 30 ° C, the piezoelectric voltage was 16 V, and the driving frequency was 5 kHz. The substrate was dried on a hot plate at 80 ° C for 5 minutes, and then heated in an oven at 23 ° C for 30 minutes to obtain an insulating film of a polyimine formed into a linear shape. The line width of the obtained polyimide film and the uniformity of the line width were observed with an optical microscope, and the film thickness was measured. The film thickness was measured by using the stylus type film thickness meter α-step 200' manufactured by KLA-Tencor Japan Co., Ltd. as the film thickness of the average value of the three places. The results are shown in Table 1. The wire has sufficient thickness. [Example 5] Further, 唆^^^, ^ &lt; ink for inkjet (2) prepared in Example 2 was used as the inkjet ink'. The same conditions as in Example 4 were obtained. An insulating film of imine. In the same price as her example 4. The results are shown in Table 1. [Example 6] The obtained polyimine film was evaluated to have sufficient thickness for the green polyimide film of Example 3. Ink (3) was used as the inkjet ink. In the same manner as in Example 4, an insulating film of polyimine was obtained except that the dot pitch was set to 20 μm. The obtained polyimide film was evaluated under the same conditions as in Example 4. The results are shown in Table 1. The wire has sufficient thickness. [Comparative Example 1] Inkjet ink (4) A polyamine acid (B) 50% solution of Example 2 was supplied as follows, and stirred under a nitrogen stream at room temperature to obtain a pale yellow transparent polyamine. 25 wt% solution of acid (B). This solution was used as an ink for inkjet (4). The viscosity of the solution was 12.3 mPa · s, the surface tension (25 ° C) was 33.2 mN/m ° Polyproline (B) solution 40.0 g D : EDM 30.0 g D : GBL 10.0 g [Comparative Example 2] An ink film for inkjet (4) prepared in Example 1 was used as an inkjet ink, and an insulating film of polyimide was obtained under the same conditions as in Example 4. The obtained polyimide film was evaluated under the same conditions as in Example 4. The results are shown in Table 1. The wire does not have a thickness of more than 1 micron. 113 200902644 [Table 1] Line width (/zm) Film thickness (//m) Ink viscosity (mPa · s) Example 4 85.3 1.67 10.8 Example 5 77.4 2.13 12.9 Example 6 103.0 2.50 18.1 Comparative example 2 66.0 0.89 12.3 [Example 7] Preparation of ink for inkjet (5) and formation of polyimide film The raw material was supplied as follows, except that the inkjet ink was prepared in accordance with the method of Example 1, and the viscosity was measured. Al : BTDA 12.6 g a2 : APSE 17.4 g D : EDM 35.0 g D : GBL 35.0 g Further, a polyimide film was formed in accordance with the method of Example 4. [Example 8] Preparation of ink for inkjet (6) and formation of polyimide film The inkjet ink was prepared in the same manner as in Example 1 except that the raw material was supplied as follows, and the viscosity was measured. Al : 6FDA 15.0 g a2 : APSE 15.0 g D : EDM 35.0 g D : GBL 35.0 g Further, a polyimide film was formed in accordance with the method of Example 4. 114 200902644 27225pif [Example 9] Preparation of inkjet ink (7) and formation of polyimide film The raw material was supplied as follows, except that the inkjet ink was prepared in accordance with the method of Example 1, and the viscosity was measured. . Al' : TESA 21.3 g a2' : DDS 8.7 g D : EDM 35.0 g D : GBL 35.0 g Further, a polyimide film was formed in accordance with the method of Example 4. [Example 10] Preparation of Inkjet Ink (8) and Formation of Polyimine Insulating Film The ink was prepared by the method of Example 1 except that the raw material was supplied as follows, and the viscosity was measured. Al' : TESA 25.5 g a2' : PDA 4.5 g D : EDM 35.0 g D : GBL 35.0 g Further, a polyimide film was formed in accordance with the method of Example 4. [Example 11] Preparation of ink for inkjet (9) and formation of polyimide film of insulating film An inkjet ink was prepared by the method of Example 1 except that the raw material was supplied as follows, and the viscosity was measured. Al,: TESA 16.6 g a2' : 7HHP 13.4 g 115 200902644 2/J.2^pn D : EDM 35.0 g D : GBL 35.0 g Further, a polyimide film was formed in accordance with the method of Example 4. [Example 12] Preparation of inkjet ink (10) and formation of polyimide film of insulating film An inkjet ink was prepared by the method of Example 1 except that the raw material was supplied as follows, and the viscosity was measured. Al' : TESA 15.8 g a2' : 7HB 14.2 g D : EDM 35.0 g D : GBL 35.0 g Further, a polyimide film was formed in accordance with the method of Example 4. [Example 13] Preparation of ink for inkjet (11) and formation of polyimide film of insulating film An inkjet ink was prepared by the method of Example 1 except that the raw material was supplied as follows, and the viscosity was measured. Al' : TESA 17.9 g a2' : BAPP 12.1 g D : EDM 35.0 g D : GBL 35.0 g For the examples 7 to 13, the obtained polyimine film was evaluated under the same conditions as in the example 4. The results are shown in Table 2. The wire has sufficient thickness. 116 200902644 27225pif [Table 2] Example 7 Line width (//m) Q〇η Film thickness (/zm) Example 8 112.2 1.83 1.45 ^ - Example 9 76.4 1.55 - 3 · υ Ο Λ - Example 10 Example 11 80.3 ------ 95.2 —------- 1.67 ----~- 1.64 Example 12 Example 13 Stomach 83.5 1 1.73 ----- 2.12 Although the present invention has been exemplified As disclosed above, the invention of the present invention is intended to be modified and retouched in the spirit of the present invention. Therefore, the protection of the present invention is defined by the scope of the patent application. Prevail. [Industrial Applicability] The active film of the present invention may, for example, be an insulating film for a flexible wiring board or an electronic component using the insulating film. [Simple diagram of the figure] Figure 1 shows the IR spectrum of "TrisANITAEA". Figure 2 shows the 1H-NMR spectrum of "TrisANITAEA". Figure 3 shows the IR spectrum of "TrisANITrisAM". Figure 4 shows the 1H-NMR spectrum of "TrisANITrisAM". Figure 5 shows the IR spectrum of "TrisANIPARARO". Figure 6 shows the 1H-NMR spectrum of "TrisANIPARARO". Figure 7 shows the IR spectrum of "TetrakisANITAM". Figure 8 shows the 1H-NMR spectrum of "TetrakisANITAM". 117 200902644 z/zz^pir [Key component symbol description] None

Claims (1)

200902644 十、申請專利範圍: 1. 一種喷墨用墨水,其含有:選自使用具有大於等於 2個之酸酐基之化合物(al)與單胺(a2)而獲得的矽化 合物(A)、以及使用具有1個酸酐基之化合物(al')與二 胺(a2')而獲得的石夕化合物(A')中的至少一種。 2. 如申請專利範圍第1項所述之喷墨用墨水,其中具 有大於等於2個之酸酐基之化合物(al)為下述通式(1) 所表示之四羧酸二酐,單胺(a2)為下述通式(2)所表示 之胺基碎化合物, [化1]200902644 X. Patent Application Range: 1. An inkjet ink comprising: an anthracene compound (A) selected from the group consisting of a compound (al) having an acid anhydride group of 2 or more and a monoamine (a2), and At least one of the compound (A') obtained by using the compound (al') having one acid anhydride group and the diamine (a2') is used. 2. The ink for inkjet according to claim 1, wherein the compound (al) having two or more acid anhydride groups is a tetracarboxylic dianhydride represented by the following formula (1), a monoamine (a2) is an amine-based compound represented by the following formula (2), [Chemical Formula 1] 〇 〇 0 〇 (1)〇 〇 0 〇 (1) (通式(1)中,X為碳數2〜100之四價有機基,通 式(2)中,R1、R2以及R3為氫、鹵素或者一價有機基, 該些可相同或者不同,Y為碳數1〜20之有機基)。 3.如申請專利範圍第2項所述之喷墨用墨水,其中上 述四羧酸二酐為選自均苯四曱酸二酐、3,3',4,4'-二苯基酮 四羧酸二酐、2,2,,3,3’-二苯基酮四羧酸二酐、2,3,3',4'-二苯 基酮四羧酸二酐、3,3',4,4'-二苯基砜四羧酸二酐、2,2’,3,3’_ 二苯基砜四羧酸二酐、2,3,3’,I-二苯基颯四羧酸二酐、 3,3\4,4'-二苯基醚四羧酸二酐、2,2’,3,3^二苯基醚四羧酸二 酐、2,3,3',4'-二苯基醚四羧酸二酐、2,2-[雙(3,4-二羧基苯基)] 六氟丙烷二酐、乙二醇雙(偏苯三曱酸酐酯)、環丁烷四羧 119 200902644 z 酸一酐、甲基環丁烷四羧酸二酐、環戊烷四羧酸二酐、 1,2,4,5-環己烷四羧酸二酐、乙烷四羧酸二酐以及丁烷四羧 西文一酐所組成之族群中的一種或一種以上, 上述胺基石夕化合物為選自對胺基苯基三甲氧基矽烷、 對胺基笨基三乙氧基矽烷、間胺基苯基三曱氧基矽烷、間 胺基笨基三乙氧基残、胺基丙基三曱氧基㈣以及胺基 丙基二乙氧基石夕垸所組成之族群中的一 以(In the formula (1), X is a tetravalent organic group having a carbon number of 2 to 100, and in the formula (2), R1, R2 and R3 are hydrogen, halogen or a monovalent organic group, and these may be the same or different. Y is an organic group having 1 to 20 carbon atoms). 3. The ink for inkjet according to Item 2, wherein the tetracarboxylic dianhydride is selected from the group consisting of pyromellitic dianhydride and 3,3',4,4'-diphenyl ketone. Carboxylic dianhydride, 2,2,3,3'-diphenyl ketone tetracarboxylic dianhydride, 2,3,3',4'-diphenyl ketone tetracarboxylic dianhydride, 3,3', 4,4'-diphenyl sulfone tetracarboxylic dianhydride, 2,2',3,3'-diphenyl sulfone tetracarboxylic dianhydride, 2,3,3',I-diphenylstilbene tetracarboxylate Acid dianhydride, 3,3\4,4'-diphenyl ether tetracarboxylic dianhydride, 2,2',3,3^diphenyl ether tetracarboxylic dianhydride, 2,3,3',4 '-Diphenyl ether tetracarboxylic dianhydride, 2,2-[bis(3,4-dicarboxyphenyl)]hexafluoropropane dianhydride, ethylene glycol bis(trimellitic anhydride), cyclobutyl Alkane tetracarboxyl 119 200902644 z acid monoanhydride, methylcyclobutane tetracarboxylic dianhydride, cyclopentane tetracarboxylic dianhydride, 1,2,4,5-cyclohexane tetracarboxylic dianhydride, ethane four One or more of a group consisting of a carboxylic acid dianhydride and a butane tetracarboxy sialic anhydride selected from the group consisting of p-aminophenyltrimethoxydecane and p-aminophenyloxyl Base decane, m-aminophenyl trimethoxy decane, m-amino The group consisting of residues triethoxysilane, aminopropyl group, (iv) and three Yue aminopropyl diethoxy rock embankment of the evening to a .如申明專利範圍第1項所述之嗔墨用墨水,直中上 述⑷為下述通式⑶所表 &lt; ㈣胺酸&amp;,The ink for ink jet according to item 1 of the patent scope is as described in the following formula (3) &lt; (4) Aminic acid &amp; k逋只Λ 中 R2以及R3為氫 (3) 占主之四價有機基,Ri、 鹵素或者一價有機基,談此叮士 不同,Y為碳數1〜20之有機基)。 ^二1相同或者 5.如申請專利範圍第4項所述之喷墨 述矽醯胺酸為下述通式(44)444)或者,其中上 的矽醯胺酸, (4-3)所表示 [化3] 120 200902644 οk逋only Λ R2 and R3 are hydrogen (3) The tetravalent organic group of the main group, Ri, halogen or monovalent organic group, which is different from the gentleman, Y is an organic group having a carbon number of 1 to 20). ^二一等或5. The inkjet as described in claim 4, wherein the proline acid is of the following formula (44) 444) or wherein the proline acid, (4-3) Means [化3] 120 200902644 ο R1 R3 (4-1) R1 R3 K, 'NH-(CH2)--Si-R2 α I (4-2)R1 R3 (4-1) R1 R3 K, 'NH-(CH2)--Si-R2 α I (4-2) R1 NH-(CH2) —Si—r2 R3 COOH K (4-3) R2~Si—(H2C)—HN I 3 c4_3) f ,ri'r2^ 、夕—個含有碳數1〜2〇之烷氧基,a為1〜20之 登數)。 黑用6專如專利範圍第1項至第5項中任—項所述之噴 ^ /、中上述具有大於等於2個之酸酐基之化合物 耳a與上述單胺(a2)之比為丨莫耳:〇·5莫耳〜8 〇莫 黑用^申請專利範㈣1項至第5項巾任—項所述之噴 ’土 &quot;&quot;水,其中上述具有1個酸酐基之化合物(ar)為丁 1 )所表不之羧酸酐,上述二胺(a2,)為下述 式以)所表示之二胺, [化4] 121 200902644 ο Si—R2R1 NH-(CH2)—Si—r2 R3 COOH K (4-3) R2~Si—(H2C)—HN I 3 c4_3) f , ri'r2^ , 夕—Alkane with a carbon number of 1~2〇 Alkoxy, a is the number of 1 to 20). The ratio of the compound ear a of the above-mentioned monoamine (a2) to the above-mentioned single-amine (a2) having the acid anhydride group of two or more is as described in the above-mentioned. Moer: 〇·5莫耳~8 〇莫黑用^Applicable to the patent (4) 1 to 5th towel--the spray of 'soil' and water, wherein the above compound having one anhydride group ( Ar) is a carboxylic acid anhydride represented by the formula (1), and the diamine (a2,) is a diamine represented by the following formula: (Chemical Formula 4) 121 200902644 ο Si-R2 (r) η2ν—x'—νη2 (2·) R—以及為鼠、画素或者一價 有機基,該些可相同或者不同,Υ,為破數1〜20之有機基, 通式(2')中,X,為碳數2〜100之二價有機基)。 8.如申請專利範圍第7項所述之喷墨用墨水,其中上 述羧酸酐為選自對(三曱氧基矽烷基;)苯基琥珀酸酐、對(三 乙氧基石夕院基)笨基號轴酸酐、間(三曱氧基石夕燒基)苯基琥 珀酸酐、間(三乙氧基矽炫基)苯基破珀酸酐、三甲氧基矽 烷基丙基琥珀酸酐以及三乙氧基矽烷基丙基琥珀酸酐所組 成之族群中的一種或一種以上, 上述二胺為選自對苯二胺、間苯二胺、對二甲苯二胺、 4,4'-二胺基二苯基曱烷、4,4'_二胺基-1,2·二苯基乙烷、4,4'-二胺基-1,3-二苯基丙烷、2,2-雙(4-胺基苯基)两烷、雙(4-胺基-3-曱基苯基)甲烷、丨,2-雙_(4_胺基_3_曱基苯基)乙烷、 雙(4-胺基-2-甲基苯基)甲烷、12—雙&lt;4-胺基-2·曱基笨基) 乙烷、4,4’_二胺基二苯基醚、3,3,-二胺基二苯基醚、4,4,-二胺基二苯基颯、4,4’-二胺基二苯硫醚、4,4'-二胺基二苯 基酮、4,4'-二胺基二苯基-2,2’-丙烧、1,4-二胺基環己烧、 4,4’-二胺基二環己基甲烷、;[,4_雙[(4_胺基苯基)甲基]苯、 1,4-雙(4-胺基苯氧基)苯、1,3_雙(4_胺基苯氧基)苯、2,2_雙 [4-(4-胺基苯氧基)苯基]丙烷、2,2_雙[4_(4_胺基笨氧基)苯基] 122 200902644 27225ριί 氟丙烷、雙[4-(4-胺基苯氧基)苯基]礙、雙[4_(4-胺基笨氧基) 苯基]聯苯、U-雙[4-(4·胺基苄基)苯基]丙烷、1,6_雙[4_(^_ 胺基苄基)笨基]己烷、5_苯基甲基―^·二胺基苯、5_[4_(4_ 烧基環己基)本基]甲基_1,3_二胺基苯、5·[4_(4_(4·院基環己 ,)環己基)苯基]甲基二胺基苯、5_[((烧基環己基)乙基 f己基)苯基]曱基_1,3_二胺基苯、胺基苯氧基) 苯基]環己烷、1,1-雙[4-(4-胺基苯氧基)苯基]_4_烷基環己 ,、雙[4_(4_胺基苄基)苯基]環己烷、1,1-雙[4·(4-胺基 ,基)苯基]-4-烷基環己烷、;1,3_雙(3_胺基丙基)_四甲基二矽 氧烷所組成之族群中的一種或一種以上。 9.如申請專利範圍第i項至第5項中任—項所述之喷 墨用墨水,其中上述石夕化合物(AI)為下述通式⑺所 表示之ί夕醒胺酸(Α»), [化5] #4—、 〇 Η Η 〇 R1 Jl丨I II 〒 -C—N—X'-N—c—-r—Si—R2 (3-) r/3 C〇〇H HO〇/ 心 右媸耸L式(3)巾’ R、R以及R。為氫、卤素或者-價 些可相同或者不同,γ,為碳數1〜20之有機基, Α為厌數2〜100之有機基)。 〇·如申明專利範圍第9項所述之喷墨用墨水,苴中 為下述通式 〈5 )所表示的石夕酸胺酸(A,), [化6] 123 200902644 R1 I R2-Si-(H2C)(r) η2ν—x′—νη2 (2·) R—and for the mouse, pixel or monovalent organic group, which may be the same or different, Υ, is an organic group having a number of 1 to 20, and the formula (2' In the formula, X is a divalent organic group having a carbon number of 2 to 100). 8. The ink for inkjet according to Item 7, wherein the carboxylic acid anhydride is selected from the group consisting of p-(trimethoxydecylalkyl) phenylsuccinic anhydride, and p-(triethoxy-stone) Alkyl anhydride, m-(trimethoxy oxalate) phenyl succinic anhydride, m-(triethoxysulfonyl) phenyl cyanoic anhydride, trimethoxydecyl propyl succinic anhydride, and triethoxy One or more selected from the group consisting of p-phenylenediamine, m-phenylenediamine, p-xylenediamine, 4,4'-diaminodiphenyl Decane, 4,4'-diamino-1,2.diphenylethane, 4,4'-diamino-1,3-diphenylpropane, 2,2-bis(4-amino group Phenyl)alkane, bis(4-amino-3-indolylphenyl)methane, anthracene, 2-bis-(4-amino-3-indolylphenyl)ethane, bis(4-amine -2-methylphenyl)methane, 12-bis&lt;4-amino-2-indolyl) ethane, 4,4'-diaminodiphenyl ether, 3,3,-diamine Diphenyl ether, 4,4,-diaminodiphenylanthracene, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl ketone, 4,4'- Diaminodiphenyl-2,2 -propane, 1,4-diaminocyclohexane, 4,4'-diaminodicyclohexylmethane; [,4_bis[(4-aminophenyl)methyl]benzene, 1, 4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, 2,2-bis[4-(4-aminophenoxy)phenyl] Propane, 2,2_bis[4_(4-aminophenyloxy)phenyl] 122 200902644 27225ριί Fluoropropane, bis[4-(4-aminophenoxy)phenyl], double [4_(4 -aminophenyloxy)phenyl]biphenyl, U-bis[4-(4.aminobenzyl)phenyl]propane, 1,6-bis[4_(^-aminobenzyl)phenyl] Hexane, 5-phenylmethyl-^-diaminobenzene, 5-[4-(4-carbocyclohexyl)benyl]methyl-1,3-diaminobenzene, 5·[4_(4_(4) ·院基环己,) cyclohexyl)phenyl]methyldiaminobenzene, 5-[((alkylcyclohexyl)ethylf-hexyl)phenyl]decyl-1,3-diaminobenzene, amine Phenyloxy)phenyl]cyclohexane, 1,1-bis[4-(4-aminophenoxy)phenyl]_4-alkylcyclohexane, bis[4_(4-aminobenzyl) Phenyl]cyclohexane, 1,1-bis[4.(4-amino)phenyl]-4-alkylcyclohexane; 1,3_bis(3-aminopropyl) One or one of the groups consisting of tetramethyl dioxane on. 9. The ink for inkjet according to any one of the items of the present invention, wherein the above-mentioned compound (AI) is an oxime amine represented by the following formula (7). ), [Chemical 5] #4—, 〇Η Η 〇R1 Jl丨I II 〒 -C—N—X'-N—c—-r—Si—R2 (3-) r/3 C〇〇H HO 〇 / Right 媸 L L L (3) towel 'R, R and R. The hydrogen, halogen or - may be the same or different, γ is an organic group having 1 to 20 carbon atoms, and Α is an organic group having an anisotropy of 2 to 100).喷墨 如 如 如 如 如 如 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨 喷墨Si-(H2C) R3R3 R1 〇 I IIH R2-Si—(Η2〇^-ρ~Ν- R3 γ-ΟΗ 〇R1 〇 I IIH R2-Si—(Η2〇^-ρ~Ν- R3 γ-ΟΗ 〇 (通式(4’-l)、(斗’·^)、^」)、(4,-4)或者(4,-5) 中,R、R以及R3中的至少一個含有碳數丨〜2〇之烧氧 基,通式(4’-3)之R為碳數2〜3〇之有機基,通式(4,-4) 之R為氫或者碳數1〜20之烷基,a為1〜2〇之整數)。 U.如申請專利範圍第1項至第5項中任一項所述之噴 124 200902644(In the general formula (4'-l), (bucket '·^), ^"), (4, -4) or (4, -5), at least one of R, R and R3 contains a carbon number 丨~ 2 is an alkoxy group, R of the formula (4'-3) is an organic group having 2 to 3 carbon atoms, and R of the formula (4,-4) is hydrogen or an alkyl group having 1 to 20 carbon atoms. a is an integer from 1 to 2). U. The spray according to any one of claims 1 to 5, 200902644 】2.如申請專利範圍第】項至第5項中任一 一項所述之噴 其中此貰墨用墨水進而含有高分子化合物 墨用—. 述二 墨用墨水,其中此噴墨用墨水進而 13,如申請專利範圍第12項所述之嗔 上述问分子化合物(B)為選自聚醯胺酸 的至少一種。 範圍第12項所述之噴墨用墨水,其中 (B)為選自聚醯胺酸以及聚醯亞胺中 K如申請專纖_ 12項所狀噴㈣墨水,並中 上述高分子化合物(B)之重量平均分子量為丨’㈣〜^⑻。 15.如申請專利範圍第i項至第5項中任—項所述之喷 用墨水,其巾此喷墨用墨水進而含有稀基取代納迪克酸 酿亞胺(alkenyl-substituted nadimide) ( C )。 1,如申請專利範圍第15項所述之噴墨用墨水,其中 上述烯基取代納迪克酸醯亞胺(C)為使單胺、_脫/、一 胺或者四胺與下式⑺所表示之稀基取:::迪二: 行反應而成的烯基取代納迪克酸醯亞胺, [化7]2. The ink for ink jetting according to any one of the items of the present invention, wherein the ink for ink jetting further comprises a polymer ink for ink, wherein the ink for ink jetting is used. Further, as described in claim 12, the above-mentioned molecular compound (B) is at least one selected from the group consisting of polyamic acid. The ink for inkjet according to Item 12, wherein (B) is selected from the group consisting of poly-proline and polyimine, such as the spray (four) ink of the application of the special fiber -12, and the above polymer compound ( The weight average molecular weight of B) is 丨'(4)~^(8). 15. The ink for spray according to any one of clauses 1-5 to 5, wherein the inkjet ink further comprises a rare-substituted alkenyl-substituted nadimide (C) ). 1. The inkjet ink according to Item 15, wherein the alkenyl-substituted nadic acid imide (C) is a monoamine, a _de/, a monoamine or a tetraamine and the following formula (7) The dilute base is expressed as follows:::Di 2: Alkenyl substituted nadic acid ylide imine, [Chem. 7] 式(5,)中,R1以及R2分別獨立為氫、碳數之 烷基、碳數3〜6之烯基、碳數5〜8之環烷基、碳數6〜 12之芳基或者苄基中的任一種。 125 200902644 17.如申請專利範圍第15項所述之噴墨用墨水,其中 上述烯基取代納迪克酸醯亞胺(C)為下述通式(5)所表 示之化合物, [化8]In the formula (5,), R1 and R2 are each independently hydrogen, an alkyl group having a carbon number, an alkenyl group having 3 to 6 carbon atoms, a cycloalkyl group having 5 to 8 carbon atoms, an aryl group having 6 to 12 carbon atoms or benzyl group. Any of the bases. The ink for inkjet according to claim 15, wherein the alkenyl-substituted nadic acid ylide (C) is a compound represented by the following formula (5), [Chem. 8] N—R3 (5)N-R3 (5) 式(5)中,R1以及R2分別獨立為氫、碳數丨〜12之 烷基、妷數3〜6之烯基、碳數5〜8之環烷基、碳數6〜 12之务基或者苄基中的任一種,^為1〜4之整數, 時,式(5)中之R3為氫、碳數}〜12之烷基、 碳數1〜12之羥烷基、碳數5〜8之環烷基、碳數6〜12 之芳基、苄基、-{(CqH2q)Ot(CrH2r〇)uCsH2sX}(其中,q、r、 s為分別獨立選擇之2〜6之整數,t為〇或者丨之整數,u 為1〜30之整數,X為氫或者經基)所表示聚氧亞^基烧 基、-(R)a-C6H4-R4 (其中,a表示〇或者j之整數,R表示 碳數1〜4之亞烷基,R4表示氫或者碳數丨〜4之烷基)所 表示之基團、-C6H4-T-C6H5 {其中,T 為-CH2-、-C(CH3&gt;-、 〇-/-或者-S〇2-}所表示之基團、或者於該些基3團之 芳香環上直接鍵結的1個〜3個氫經羥基取代的基團, n = 2時,式(5)中之R3為碳數2〜2〇之亞烷基{亞 院基中之相互不鄰接的任意亞甲基可經_〇_或者_ch=ch 取代,任意的氫可經氟取代}、碳數5〜8之亞環烷基、 -{(CqH2ciO)t(CrH2rO)uCsH2s}_ (其中 ’ q、r、s 為分別獨立選 126 200902644 擇之2〜6之整數’ t為0或者1之整數,u為〗〜3〇之整 數)所表示之聚氧亞烷基、碳數6〜;12之亞芳基、 (其中,a為〇或者】之整數,R以及R5分 別獨立為碳數1〜4之亞烷基)所表示之基團、由 -c6h4-t-c6h4- 、 -c6h4-t-c6h4-t-c6h4-或 者 -C6H4-r-C6H4-T-C6H4-r-C6H4- {其中,T 為單鍵、碳數 j 〜6 之亞垸基、_C(Ch3)2_、_C(CF3)2_、_c〇…_〇·、 -〇C6H4C(CH3)2C6H40-、-s-或者-S02-,Γ為-CH2-或者_〇_} 斤表示之基團、或者於该些基團之芳香環上直接鍵結的1 個〜3個氫經羥基取代的基團、下式(64)所表示之基團 或者下式(6-2)所表示之基團,式(6_υ中,χ獨立為工 〜6之整數’ y為1〜70之整數, [化9]In the formula (5), R1 and R2 are each independently hydrogen, an alkyl group having a carbon number of 丨12, an alkenyl group having a number of 3 to 6 carbon atoms, a cycloalkyl group having a carbon number of 5 to 8, and a carbon number of 6 to 12; Or any one of the benzyl groups, wherein ^ is an integer of 1 to 4, wherein R3 in the formula (5) is hydrogen, an alkyl group having a carbon number of from 10 to 12, a hydroxyalkyl group having a carbon number of from 1 to 12, and a carbon number of 5 Cycloalkyl group of -8, aryl group of 6 to 12 carbon atoms, benzyl group, -{(CqH2q)Ot(CrH2r〇)uCsH2sX} (wherein q, r, s are independently selected as integers of 2 to 6, respectively t is an integer of 〇 or 丨, u is an integer from 1 to 30, X is hydrogen or a polyoxyalkylene group represented by a group, -(R)a-C6H4-R4 (where a represents 〇 or j An integer, R represents an alkylene group having 1 to 4 carbon atoms, R4 represents a hydrogen group or an alkyl group having a carbon number of 丨~4, and -C6H4-T-C6H5 {where T is -CH2-, - a group represented by C(CH3>-, 〇-/- or -S〇2-}, or a group of 1 to 3 hydrogen-substituted groups directly bonded to the aromatic ring of the group 3 , when n = 2, R3 in the formula (5) is an alkylene group having a carbon number of 2 to 2 Å. Any methylene group which is not adjacent to each other in the sub-system group may be _〇_ or _ch =ch is substituted, any hydrogen can be substituted by fluorine}, a cycloalkylene group having a carbon number of 5~8, -{(CqH2ciO)t(CrH2rO)uCsH2s}_ (where 'q, r, s are independently selected 126 200902644 Select an integer of 2 to 6 't is an integer of 0 or 1, u is an integer of 〜3〇), represented by a polyoxyalkylene group, a carbon number of 6 to 12, an arylene group, (where a is 〇 or an integer of the formula, R and R5 are each independently an alkylene group having 1 to 4 carbon atoms, represented by -c6h4-t-c6h4-, -c6h4-t-c6h4-t-c6h4- or - C6H4-r-C6H4-T-C6H4-r-C6H4- {where T is a single bond, an alkylene group having a carbon number of j 1-6, _C(Ch3)2_, _C(CF3)2_, _c〇..._〇· - 〇C6H4C(CH3)2C6H40-, -s- or -S02-, Γ is -CH2- or _〇_} groups represented by jin, or 1 directly bonded to the aromatic ring of the groups ~3 groups in which hydrogen is substituted by a hydroxyl group, a group represented by the following formula (64) or a group represented by the following formula (6-2), and in the formula (6_υ, χ is independently an integer of ~6) y An integer from 1 to 70, [Chem. 9] 武n==3時,式(5)中之R3為下式(7-1)所表示之基團 5 下式(7-2 )所表示之基團, [化 10] 127 200902644When n==3, R3 in the formula (5) is a group represented by the following formula (7-1): a group represented by the following formula (7-2), [Chem. 10] 127 200902644 .R6 R R4 R4 .N (7-1) R6 (7-2) 式(7_1 )中’ R 為氫、氟、氯、-OH、-OCF3、-〇CF2H、 -cf3、-cf2h、-cfh2、OCF2cF2H、_〇CF,CFHCF3、或者 碳數1〜10之烷基, 式(7-1)以及式(7_2)中,r4、r5、r6分別獨立為 树、反_M_亞環己基、u_n2,5二基、亞苯基、 氫可、.二氟取代之1,4_亞笨基或者《炭數卜;^之亞烧基,亞 燒基中之相互不__意亞甲基可㈣或者(Η·· 取代’任意的氫可經氟取代, η = 4時,式(5)中夕|&gt;3仏 為下式(8)所表示之基團, [化 11].R6 R R4 R4 .N (7-1) R6 (7-2) 'R in the formula (7_1) is hydrogen, fluorine, chlorine, -OH, -OCF3, -〇CF2H, -cf3, -cf2h, -cfh2 , OCF2cF2H, _〇CF, CFHCF3, or an alkyl group having a carbon number of 1 to 10, in the formula (7-1) and the formula (7_2), r4, r5, and r6 are each independently a tree, an inverse _M_cyclohexylene group, U_n2,5-diyl, phenylene, hydrogen, difluoro-substituted 1,4-phenylene or "charo-b]; sub-alkyl, sub-alkyl, not __ methylene (4) or (Η·· Substituting 'arbitrary hydrogen may be substituted by fluorine, and when η = 4, the formula (5) in the evening|&gt;3仏 is a group represented by the following formula (8), [Chem. 11] R6 R5 ,R4 (8) 班式(8)中,R、R3、R6、尺7分別獨立為單鍵、反_κ ^衣己基、1,3-二魏-2,5-二基、Μ_亞苯基、氫可經氟取 代之1,4-亞苯基或者碳數ho之亞絲,亞院基中之相 互不鄰接的任意亞曱基可經·(;)诚者_CH=CH_取代,任意的 氣可經氟取代。 、18.如申請專利範圍第17項所述之噴墨用墨水,其中 η為2 〇 19.如申5月專利範圍第ι7項所述之喷墨用墨水,其中 128 200902644 j /-υμιι n為2,式(5)中之R。為碳數2〜i5之亞烷基丨亞烷基中 之相互不鄰接的任意垚甲基可經或者_CH=CH-取代,任 意的氫可經氟取代}、-(RVQH^R5-(其中,a為〇或者】 之整數,R以及R5分別獨立為碳數】〜4之亞烷基)所表 不之基團、由-CHQH4- ' -C6H4-T-C6H4-T-C6H4-或者 -C6H4-r-C6H4-T-C6H4-r-C6H4- {其中,τ 為單鍵、-CH2-、 -C(CH3)2-' -C(CF3)2-' -CO- ^ -0-. -0C6H4C(CH3)2C6H40- ' f ' _S_或者_s〇2_ ’ r為_CH2·或者-〇-}所表示之基團。 20.如申請專利範圍第17項所述之喷墨用墨水,其中 式(5)中之R]以及R2分別獨立為氫或者碳數丨〜6之烷 基, η為2’式(5)中之R3為碳數2〜15之亞烷基{亞烷 基中之相互不鄰接的任意亞曱基可經-0-或者-CH=CH-取 代,任意的氫可經氟取代卜式(64 )所表示之基團、式 (6-2)所表示之基團、式(6_3)所表示之基團、式(6_4) 所表示之基團或者式(6-5)所表示之基團, , [化 12] 129 200902644 e 2 c X o e y Μ——si——M e π2 cR6 R5 , R4 (8) In class (8), R, R3, R6 and ruler 7 are each independently a single bond, anti-kappa hexyl, 1,3-di-wei-2,5-diyl, fluorene _ phenylene, hydrogen can be substituted by fluorine, 1,4-phenylene or carbon number ho, the sub-homogeneous non-adjacent of any fluorenyl group can be passed by (;) Cheng _CH= CH_ substituted, any gas can be substituted by fluorine. 18. The ink for inkjet according to claim 17, wherein n is 2 〇 19. The ink for inkjet according to the invention of claim 5, wherein 128 200902644 j /-υμιι n Is 2, R in the formula (5). Any fluorenylmethyl group which is not adjacent to each other in the alkylene sulfinyl group having 2 to i5 carbon atoms may be substituted by _CH=CH-, and any hydrogen may be substituted by fluorine}, -(RVQH^R5-( Wherein, a is an integer of 〇 or ], and R and R5 are each independently a carbon number of 1-4 alkylene groups, which are represented by -CHQH4-'-C6H4-T-C6H4-T-C6H4- or -C6H4-r-C6H4-T-C6H4-r-C6H4- {where τ is a single bond, -CH2-, -C(CH3)2-'-C(CF3)2-'-CO-^-0- -0C6H4C(CH3)2C6H40- 'f' _S_ or _s〇2_ 'r is a group represented by _CH2· or -〇-}. 20. For inkjet according to claim 17 In the ink, wherein R) and R2 in the formula (5) are each independently hydrogen or an alkyl group having a carbon number of 丨~6, and η is 2'. wherein R3 in the formula (5) is an alkylene group having 2 to 15 carbon atoms. Any of the alkylidene groups in the alkyl group which are not adjacent to each other may be substituted by -0- or -CH=CH-, and any hydrogen may be substituted by fluorine to the group represented by the formula (64), and the formula (6-2) a group represented by the formula, a group represented by the formula (6-3), a group represented by the formula (6-4), or a group represented by the formula (6-5), [Chemical 12] 129 200902644 e 2 c X o e y Μ——si——M e π2 c e X ώ /(\e X ώ /(\ (6-2) _ (6-3) (6~4) (6-5) 數 式(6-1)中,χ獨立為i〜6之整數,y為】〜7〇之整 式(6-3)以及式(6-5)中,R為包含_CH2…CH2cH2_、 -Ο-、-C(CH3)2-、-C(CF3)2_、_s〇2_之有機基, 式(6-5)中,X為包含_CH2…七·之有機基。 、21.如申π專利範圍第17項所述之噴墨用墨水,其中 ^⑸中之Rl以及r2分卿立為氫或者魏Μ之淀 暴, ^3’式⑴&amp;Κ3是以式(7-M)、式⑴·n 130 200902644 或者式(7-2-2)表示 [化 13](6-2) _ (6-3) (6~4) (6-5) In the equation (6-1), χ is an integer of i~6, and y is the whole formula of ~7〇(6- 3) and in the formula (6-5), R is an organic group containing _CH2...CH2cH2_, -Ο-, -C(CH3)2-, -C(CF3)2_, _s〇2_, formula (6- In 5), X is an organic group containing _CH2...七. 21. The ink for inkjet according to claim 17, wherein R1 and r2 in ^(5) are separated from hydrogen or Wei, and ^3' is (1) &amp; 7-M), Formula (1)·n 130 200902644 or Formula (7-2-2) means [Chem. 13] 式(7-1-1 )中,r為碳數1 V.. /N ,R6 (7^2-2) 10之燒基或者_〇H ^ , n- -un 7 式(7-2-2)中,r4、r5、R6分別獨立為亞乙基、 1,4-亞丁基。 ’ 土 22.如申請專利範圍第n項所述之噴墨用墨水,苴中 式(5)中之R]以及R2分別獨立為氫或者碳數 基, 几 η為4’式(5)中之V是以下 [化 14] ' U-1)表不’ 131 200902644In the formula (7-1-1), r is a carbon number of 1 V.. /N, R6 (7^2-2) 10 or a group of _〇H ^ , n- -un 7 (7-2- In 2), r4, r5 and R6 are each independently an ethylene group and a 1,4-butylene group. '土 22. In the inkjet ink according to item n of the patent application, R) and R2 in the formula (5) are each independently hydrogen or a carbon number group, and a few η is 4' in the formula (5) V is the following [Chem. 14] 'U-1) Table is not '131 200902644 23. 如申請專利範圍第I?項所述之噴墨用墨水,其中 此噴墨用墨水含有選自η為1之烯基取代納迪克酸醯亞胺 (C)、η為2之稀基取代納迪克酸酸亞胺(c)、η為3之 烯基取代納迪克酸醯亞胺(c)、以及η為4之烯基取代納 迪克酸醯亞胺(C)中的至少兩種烯基取代納迪克酸醯亞 胺(C)。 24. 如申請專利範圍第17項所述之噴墨用墨水,其中 ^噴墨用墨水含有至少兩種如下之烯基取代納迪克酸醒亞 胺(C): &lt;⑸中之Ri以及R2分別獨立為氫或者碳數i 〜6之烧基, 式〇)中之R3為碳數丨〜12之烷基(n=1)、碳數6 2之务基(n—1)、-(CH2)P (n = 2,p 為 6〜12 之整數)、 式(6-1-1)所表示之基團、式(6_2)所表示之基團、式 (6-3-1)所表示之基團、式(6_4)所表示之 所表示之基團、式(7以)所表示之基團、式(叫^) 表不之基團、式(7-2-1)所表示之基團、式(7_2_3)所 示之基團、式(8-1)所表示之基團, 132 200902644 27225pif [化 15] -CH' Me Me 0 岭 h3c ch2 ie ^^CHs Me (6-1-1) n=223. The ink for inkjet according to claim 1, wherein the ink for inkjet contains a base selected from the group consisting of an alkenyl-substituted nadic acid ylide (N) having a η of 1, and a η of 2. Replacing at least two of Nadick's acid imine (c), η of 3 alkenyl substituted nadic acid yttrium imide (c), and η of 4 alkenyl substituted nadic acid yttrium imine (C) Alkenyl substituted nadic acid ylide (C). 24. The ink for inkjet according to claim 17, wherein the ink for inkjet contains at least two kinds of alkenyl substituted nadic acid amide (C) as follows: &lt;R1 and R2 in (5) Each of which is independently hydrogen or a carbon number i 1-6, wherein R 3 is an alkyl group having a carbon number of 12 12 (n = 1), a carbon number of 6 2 (n-1), - ( CH2)P (n = 2, p is an integer of 6 to 12), a group represented by the formula (6-1-1), a group represented by the formula (6-2), and a formula (6-3-1) The group represented by the group represented by the formula (6-4), the group represented by the formula (7), the group represented by the formula (?), and the formula (7-2-1) a group, a group represented by the formula (7_2_3), a group represented by the formula (8-1), 132 200902644 27225pif [Chemical 15] -CH' Me Me 0 岭 h3c ch2 ie ^^CHs Me (6- 1-1) n=2 F3C CFF3C CF (6-2) n =2 (64) n=2(6-2) n = 2 (64) n=2 (6-5-1) n=2(6-5-1) n=2 'N (7-2-3) n=3'N (7-2-3) n=3 133 200902644 如申請專利範圍第1項至第5項中任—項所试 墨用墨水,其中此噴墨用墨水進而含有溶劑(D)。、贺 26.如申請專利範圍第25項所述之喷墨用墨水, 溶劑⑼為選自乳酸乙醋、乙醇、乙二醇、 :、: 油、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇 基峻、二乙二醇單乙越乙酸醋、乙二醇單丁峻、乙二^ 乙二乙:酯、丙二醇單甲峻乙酸、3_甲氧基丙酸甲醋早 環己酮以™所組成之族群中 27·如申請專利範圍帛1項至第5項中任一項所诚 墨用墨水,其中相騎1〇〇重量份之喷墨用墨水,:述石^ 化合物(A)以及上述石夕化合物(A,)之總含 份〜99重量份。 更里 ,28·如申請專利範圍帛1項至第5項中任-項所述之喷 墨用墨水,其中相對於100重量份之噴墨用墨水,上述矽 化合物(A)以及上述石夕化合物⑷之總含量為1〇重量 份〜80重量份。 29. 如申請專利範圍第1項至第5項中任-項所述之嗜 墨用墨水,其中相對於1〇〇重量份之喷墨用墨水,上述矽 化合物⑷以及上述石夕化合物U’)之總含量為22重量 份〜70重量份。 s 30. 種t酿亞胺膜或者圖案狀聚酿亞胺膜,此聚酿亞 胺膜或者圖案狀聚酸亞胺膜是以如下方法獲得:藉由喷墨 134 200902644 27225pit 塗佈方法,塗佈如申請專利範圍第1項至第29項中任一項 所述之噴墨用墨水而形成塗膜後,對該塗膜進行固化處理 而形成聚醯亞胺膜。 31.—種聚醯亞胺膜或者圖案狀聚醯亞胺膜之形成方 法,此方法包含如下製程:藉由噴墨塗佈方法,塗佈如申 請專利範圍第1項至第29項中任一項所述之喷墨用墨水而 形成塗膜的製程;以及對該塗膜進行固化處理而形成聚醯 亞胺膜的製程。 f 32.—種薄膜基板,其具有聚醯亞胺膜或者圖案狀聚醯 亞胺膜,此聚醯亞胺膜或者圖案狀聚醯亞胺膜是藉由如申 請專利範圍第31項所述之方法而形成於基板上。 33.—種電子零件,其具有如申請專利範圍第32項所 述之薄膜基板。 135133 200902644 Ink ink for use in any of items 1 to 5 of the patent application, wherein the inkjet ink further contains a solvent (D).贺26. The inkjet ink according to claim 25, wherein the solvent (9) is selected from the group consisting of lactic acid ethyl acetate, ethanol, ethylene glycol, :, oil, diethylene glycol dimethyl ether, and diethylene glycol. Alcohol diethyl ether, diethylene glycol base, diethylene glycol monoacetic acid vinegar, ethylene glycol monobutyl, ethylene diethylene glycol: propylene glycol monomethyl acetic acid, 3-methoxypropionic acid A group of methyl ketone early cyclohexanone in the group consisting of TM 27. For example, in the ink of any one of the scope of claims 1 to 5, in which 1 part by weight of inkjet ink is used, : 述石^ The compound (A) and the total content of the above-mentioned compound (A,) are ~99 parts by weight. The inkjet ink according to any one of the preceding claims, wherein the above-mentioned bismuth compound (A) and the above-mentioned stone eve are used with respect to 100 parts by weight of the ink for inkjet. The total content of the compound (4) is from 1 part by weight to 80 parts by weight. 29. The ink for ink according to any one of the preceding claims, wherein the above-mentioned bismuth compound (4) and the above-mentioned stone compound U' are used with respect to 1 part by weight of the ink for inkjet. The total content is 22 parts by weight to 70 parts by weight. s 30. A t-imine film or a patterned polyimine film, the polyimide film or the patterned polyimide film is obtained by the following method: by inkjet 134 200902644 27225pit coating method, coating A coating film is formed by applying the ink for inkjet according to any one of the first to the twenty-ninth aspects of the invention, and the coating film is cured to form a polyimide film. 31. A method for forming a polyimine film or a patterned polyimide film, the method comprising the following steps: coating by the inkjet coating method, as in claim 1 to item 29 A process for forming a coating film by using the inkjet ink; and a process of curing the coating film to form a polyimide film. f 32. A film substrate having a polyimide film or a patterned polyimide film, the polyimide film or the patterned polyimide film being as described in claim 31 The method is formed on the substrate. 33. An electronic component having a film substrate as described in claim 32. 135
TW097110816A 2007-03-29 2008-03-26 Inkjet ink TWI432531B (en)

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