200900742 九、發明說明： 【發明所屬之技術領域】 本發明係有關於一種設置於光源裝置等，用以連續調節 光量之ND濾光器。特別係有關一種可在保持光的分光特 性、色溫及RGB比狀態下，連續地調節光量之ND濾光 器。進而，係有關一種包含有此種ND濾光器之光源農置 及攝像元件（CMOS感測器、CCD感測器等）之檢查裝置。 【先前技術】BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ND filter that is provided in a light source device or the like for continuously adjusting the amount of light. In particular, it relates to an ND filter which can continuously adjust the amount of light while maintaining the spectral characteristics, color temperature and RGB ratio of light. Further, it relates to an inspection apparatus for a light source agricultural and imaging element (CMOS sensor, CCD sensor, etc.) including such an ND filter. [Prior Art]
設置於攝像元件檢查裝置等上之光源裝置，係包含有可 令光量連續變化之ND濾光器。作為^^〇濾光器，一般係使 用在由玻璃等而構成之透明且薄的圓形或方形基板上，設 置有多數個透明光量不同之部位者。 圖4為說明ND濾光器之例圖。 圖4(A)之ND濾光器40，係於玻璃製之透明的薄圓形基 板41之—面上，蒸鍍有光反射性之材料（如鉻等）者。蒸^ 膜42係形成為由在基板41上之直徑方向延伸之線43開:，又 向圓周方向連續地變化膜厚。例如，形成為從線43開始而 順時針方向地讓膜厚連續增大。隨蒸制以膜厚逐漸增 大，透過基板4 1之光量係連續降低。 曰 於此種ND濾光器40中，透過滹杏架^ , 姑 尤、先态40之光的分光特性 4之特性，係隨蒸鍍膜42之膜厚而變The light source device provided on the image sensor inspection device or the like includes an ND filter that allows the amount of light to be continuously changed. As the ^^〇 filter, it is generally used on a transparent and thin circular or square substrate made of glass or the like, and a plurality of portions having different amounts of transparent light are provided. Fig. 4 is a view showing an example of an ND filter. The ND filter 40 of Fig. 4(A) is formed on the surface of a transparent thin circular substrate 41 made of glass, and is vapor-deposited with a material having light reflectivity (e.g., chromium). The vaporized film 42 is formed to be opened by a line 43 extending in the diameter direction of the substrate 41, and is continuously changed in thickness in the circumferential direction. For example, it is formed such that the film thickness is continuously increased from the line 43 in the clockwise direction. As the film thickness increases with steaming, the amount of light transmitted through the substrate 41 is continuously lowered.此种 In the ND filter 40, the characteristics of the spectroscopic characteristics 4 of the light passing through the apricot frame, the ancestors, and the precursor 40 are varied depending on the film thickness of the vapor deposition film 42.
J I化。例如，亦有RGB (Red-Green-Blue)比變化 10% 左右 <匱況。將此等ND濾光 器使用於攝像元件檢查裝置之光源“ ^ ^ 原時，具有難以獲得正確 才双查結果之問題。特別是將分光嘗 見的函素燈使用於光源 128452.doc 200900742 時，係要求可在保持該分光狀態下調整光量。 圖4(B)之ND,慮光器3G，係例如在玻璃製之薄圓板31 上’沿圓周方向而形成有透過率為階段性變化的過透率 可變部32_1〜32_6。此例中’係由可變部32-W32-6而順 時針方向地讓透過率依次升高。作為透過率可變部U， 係可使用如® 4(A)所*之與光反射性之蒸鍍膜的膜厚不 同的部材。J I. For example, there is also a RGB (Red-Green-Blue) ratio change of about 10% < When these ND filters are used in the light source of the image sensor inspection device, it is difficult to obtain the correct double check result. Especially when the light source is used for the light source 128452.doc 200900742 It is required to adjust the amount of light while maintaining the spectroscopic state. The ND of Fig. 4(B), the optical filter 3G, for example, is formed on the thin circular plate 31 made of glass in the circumferential direction with a change in transmittance. The permeation rate variable portions 32_1 to 32_6. In this example, the transmittance is sequentially increased by the variable portion 32-W32-6 in the clockwise direction. As the transmittance variable portion U, for example, A material having a film thickness different from that of the light-reflective vapor-deposited film of 4 (A).
此種ND濾光器30由於光量係階段性地變化，故有不易 進行透過光量之微調的問題點。 另一方面，提出有一種可藉由變化光徑之面積，而在不 變化色溫下調節光量之方法（參照專利文獻i)。此方法係將 來自光源之光以透鏡而集光，且在該光徑之徑程中，配置 由複數個葉片所構成之縫隙而改變光徑之面積。且透過鏡 箱或玻璃柱而讓光之照度均等化。 此方法中，雖不改變光源之色溫和分光特性，但需要葉 片之移動機構等較多種之構件，使得裝置複雜化。 [專利文獻1]日本專利特開2〇〇丨_3562〇3。 【發明内容】 [發明所欲解決之問題] 本發明係有鑑於上述問題點而創作完成者，目的在於提 仏種忐夠在保持光源之特性（分光特性、RGB比、色溫 等）之情況下進行光量調整之ND濾光器等。 [解決問題之技術手段] 本發明之濾光器，其特徵在於包含有透明基板，以及形 128452.doc 200900742 成於該基板表面上之光反射膜，且，於上述光反射膜上， 分散地開設有多數個該膜不存在之微小開口，並於該遽光 器中每個不同的部位，變化上述微小開口之合計面積的比 例，以依朝向該據光器之光入射部位，而變化透過及反射 光量。 依據本發明’由於可在基板表面上形成膜厚均勻的光反 射膜，且變化該膜上所形成之微小開口之合計面積的比 例故可不改變入射之光的分光特性和RGB比，即改變光 的透過率（反射率）。 本發明+，上述微小開口之面積比例，宜按照上述遽光 «^上之複數個部位的排列而連續且指數函數地變化。 此時’可連續地變化光的透過率（反射率），故可微調光量。 +本發明中，上述多數個微小開口係具有相同面積，且可 藉由在上述濾光器每個部位，改變每一單位面積之該微小 開口的個數，而改變該濾光器之透過及反射光量。 又，上述濾光器之每個部位，亦可藉由經過改變上述微 小開口之大小，而改變該部位之透過及反射光量。 本發明中，若在上述濾光器上隨機地配置上述微小開 口 ’係可避免通過開口的光的干涉。 本發明之光源裝置，特徵為其係包含有燈，以及用以使 從燈照射之光透過的濾光器者，且上述濾光器為上文所記 述之濾光器。 依據本發明，無需變化由燈照射之光的分光特性、rgb 比、色溫等即可改變光量。 128452.doc 200900742 本發明之攝像元件之檢查裝置，特徵為其係將檢查用光 ‘、、、射於攝像元件上，檢查s亥攝像元件之光電變換特性者， 且該攝像元件之檢查裝置’係包含有用以將檢查用光照射 於上述攝像元件之受光部之上述光源裝置。 依據本發明’由於不改變檢查光之分光特性、rgb比、 色溫等就可變化該光之光量，故可正確地進行攝像元件之 檢查。 [發明之效果] 如以上所闡明，本發明之顺慮光器，係藉由讓蒸鑛膜之 臈厚均等化，且改變微小開σ之個數和尺寸而變化透過 率，故可在保持光源特性（分光特性、RGB比、色溫等）狀 t下調正光里。並且，藉由於攝像元件檢查裝置使用具有 此種ND濾光器之光源裝置，而可獲得正確的檢查結果。 【實施方式】 乂下就本發明之實施方式參照圖示進行詳細說明。 圖H系說明本發明實施形態之NG濾光器之圖，圖1(A)為 整體平面圖、圖1(B)、（c)、（D)為圖1(A)其中部分的擴大 圖。 如圖1(A)所示，此ND濾光器1具有透明的薄圓板狀基板 2。基板2係用例如玻螭等而製成。其中一例可譬如基板2之 厚度為1 mm〜4 mm、直徑為1 〇〇 50 mm。如後述，基 板2之中央上，開有供可旋轉地支持濾光器丨之軸插入的孔 洞2a 〇 基板2其中一個面上，係藉由蒸鍍而均勻地形成有可反射 128452.doc 200900742 光之材料(如A1等)膜3。蒸鍍膜(光反射膜)3之膜厚在譬如 A1之情況時，係丨5〇 nm〜2μιη。在此蒸鍍膜3上，如圖 1(B)、（C)、（D)所示，係分散地開設有多數個微^、開口 4。 此例中，微小開口4之直徑相同，如為〇1麵〜1 〇 _。微 小開口4係配置成由在基板2上之直徑方向延伸之心開始， 沿圖UA)之箭頭所示之圓周方向，連續地增加每單位面積 的個數。例如，從線5在圓周方向上，於中心角度約9〇。之 邛位Ρ1，如圖1(B)所示，每一單位面積（丨⑽巧有“個微小 開口’於中心角度為18〇。之部位ρ2，如圖i(c)所示有Μ個 微小開口，於中心角度為27〇。之部位趵，如圖i(d)所示有 2820個微小開口。於各部位中，微小開口罐隨機分散地配 置。 如此，右於基板2之各部位而讓每個單位面積的微小開口 4之個數加以變化，於每一部位，微小開口 4之合計面積的 比例將有所變化。例如，從線5開始，於中心角度為9〇。之 部位P1(每一單位面積（lem2)有41個），合計面積之比例為 〇_41%，於中心角度18〇〇之部位p2(341個）為3 41%，於中心 角度270。之部位P3(282〇個）為28 2〇/〇。藉此，朝濾光器丄入 射之光的透過光量（反射光量）可依各部位而變化。即，微 小開口 4之合計面積比例越高，透過率就越高（反射率較 低）。透過率係例如每一單位面積之微小開口之合計面積比 例為0.41%的部位P1，透過率為〇·41%，於3.41%之部位p2 則透過率為3·41%，而28.2%之部位p3，透過率為28 2%。 如此，透過率係與微小開口 4之合計面積之比率成比例關係 128452.doc 200900742 而變化。 此ND濾光器1因蒸鍍膜3之膜厚均等，故於各部位中，光 的分光特性、色溫、RGB比不會變化。且’微小開口 4係隨 基地分散配置於各部位，因此可避免透過微小開口 *之光的 干涉。 、 此種ND濾光器1 一般係如下述般地加以製作。首先，準 備玻璃製之圓形基板，並在此基板上蒸鍍八丨膜。蒸鍍膜之In the ND filter 30, since the amount of light changes stepwise, there is a problem that it is difficult to finely adjust the amount of transmitted light. On the other hand, there has been proposed a method of adjusting the amount of light without changing the color temperature by changing the area of the optical path (refer to Patent Document i). In this method, light from a light source is collected by a lens, and a slit formed by a plurality of blades is disposed in a path length of the optical path to change an area of the optical path. The illumination of the light is equalized by a mirror box or a glass column. In this method, although the color temperature and the spectral characteristics of the light source are not changed, a plurality of members such as a moving mechanism of the blade are required, which complicates the device. [Patent Document 1] Japanese Patent Laid-Open Publication No. Hei No. Hei. SUMMARY OF THE INVENTION [Problems to be Solved by the Invention] The present invention has been made in view of the above problems, and aims to improve the characteristics of the light source (light splitting characteristics, RGB ratio, color temperature, etc.). ND filter for light quantity adjustment, etc. [Means for Solving the Problems] The optical filter of the present invention is characterized in that it comprises a transparent substrate, and a light reflecting film formed on the surface of the substrate by 128452.doc 200900742, and dispersedly on the light reflecting film a plurality of small openings that are not present in the film are opened, and a ratio of the total area of the small openings is changed at each different portion of the lighter to change through the light incident portion toward the light device And the amount of reflected light. According to the present invention, since a light reflection film having a uniform film thickness can be formed on the surface of the substrate, and the ratio of the total area of the minute openings formed on the film is changed, the spectral characteristics and the RGB ratio of the incident light can be changed without changing the light. Transmittance (reflectance). In the present invention, the area ratio of the above-mentioned minute opening should be continuously and exponentially changed in accordance with the arrangement of the plurality of parts on the above-mentioned «光«. At this time, the transmittance (reflectance) of the light can be continuously changed, so that the amount of light can be finely adjusted. In the present invention, the plurality of minute openings have the same area, and the transmission of the filter can be changed by changing the number of the minute openings per unit area in each portion of the filter. The amount of reflected light. Further, each portion of the filter may be changed in the amount of transmitted and reflected light of the portion by changing the size of the small opening. In the present invention, if the above-mentioned minute opening is randomly arranged on the above filter, interference of light passing through the opening can be avoided. The light source device of the present invention is characterized in that it includes a lamp and a filter for transmitting light irradiated from the lamp, and the filter is the above-described filter. According to the present invention, the amount of light can be changed without changing the spectral characteristics, the rgb ratio, the color temperature, and the like of the light irradiated by the lamp. 128452.doc 200900742 The inspection device for an image sensor of the present invention is characterized in that it is an inspection device that detects the light used for inspection, and emits light on the image pickup device, and checks the photoelectric conversion characteristics of the image sensor. The light source device includes a light-receiving portion for irradiating the inspection light to the light-receiving portion of the image pickup element. According to the present invention, since the amount of light of the light can be changed without changing the spectral characteristics, the rgb ratio, the color temperature, and the like of the inspection light, the inspection of the imaging element can be performed accurately. [Effects of the Invention] As explained above, the illuminator of the present invention can maintain the transmittance by equalizing the thickness of the vaporized film and changing the number and size of the minute opening σ. The light source characteristics (split characteristics, RGB ratio, color temperature, etc.) are t-down in the positive light. Further, since the image pickup device inspection apparatus uses the light source device having such an ND filter, accurate inspection results can be obtained. [Embodiment] The embodiments of the present invention will be described in detail with reference to the drawings. Fig. H is a view showing an NG filter according to an embodiment of the present invention, and Fig. 1(A) is an overall plan view, and Figs. 1(B), (c) and (D) are enlarged views of a part of Fig. 1(A). As shown in Fig. 1(A), this ND filter 1 has a transparent thin disk-shaped substrate 2. The substrate 2 is made of, for example, a glass crucible or the like. For example, the substrate 2 may have a thickness of 1 mm to 4 mm and a diameter of 1 〇〇 50 mm. As will be described later, the center of the substrate 2 is provided with a hole 2a for rotatably supporting the shaft of the filter 丨. One of the faces of the substrate 2 is uniformly formed by vapor deposition to have a reflection 128452.doc 200900742 Light material (such as A1, etc.) film 3. When the film thickness of the vapor deposited film (light reflecting film) 3 is, for example, A1, it is 〇5 〇 nm 〜 2 μιη. On the vapor deposited film 3, as shown in Figs. 1(B), (C) and (D), a plurality of micro openings and openings 4 are dispersedly provided. In this example, the diameters of the minute openings 4 are the same, such as 1 side to 1 〇 _. The minute openings 4 are arranged to start from the center extending in the diameter direction of the substrate 2, and continuously increase the number of units per unit area in the circumferential direction indicated by the arrow of Fig. UA). For example, from the line 5 in the circumferential direction, the center angle is about 9 〇. The position Ρ1, as shown in Fig. 1(B), each unit area (丨(10) has a "small opening" at a central angle of 18 〇. The part ρ2, as shown in Figure i(c) The small opening has a central angle of 27 〇. The part 趵 has 2820 tiny openings as shown in Figure i(d). In each part, the tiny open cans are randomly dispersed. Thus, the right part of the substrate 2 The number of the small openings 4 per unit area is changed, and the ratio of the total area of the minute openings 4 is changed at each portion. For example, starting from the line 5, the center angle is 9 〇. P1 (41 per unit area (lem2)), the ratio of the total area is 〇41%, and the part p2 (341) at the center angle of 18〇〇 is 341%, at the central angle 270. The part P3 (282 〇) is 28 2 〇 / 〇. Therefore, the amount of transmitted light (reflected light amount) of light incident on the filter 丄 can be changed depending on each part. That is, the higher the total area ratio of the small openings 4 is, the higher the ratio The higher the rate (lower reflectivity). The transmittance is, for example, the total area of the small openings per unit area. In the portion P1 with a ratio of 0.41%, the transmittance is 〇·41%, the transmittance at the portion of 3.41% is 3.41%, and the portion of p2 at 28.2%, the transmittance is 28 2%. Thus, the transmittance is The ratio of the total area of the micro openings 4 is proportional to the value of 128452.doc 200900742. Since the ND filter 1 has the same film thickness of the vapor deposition film 3, the spectral characteristics, color temperature, and RGB ratio of the light are not in each portion. The "micro-openings 4" are distributed in various places with the base, so that interference of light passing through the small openings* can be avoided. The ND filter 1 is generally produced as follows. First, prepare the glass. a circular substrate made of a tantalum film deposited on the substrate.
膜厚係可充分獲得反射率之膜厚，其中一例係譬如 nm。其次’在蒸鍍膜上塗布抗蝕劑，且將預先設定的微小 開口配置圖案描緣於抗蝕劑膜上。然後，經蝕刻去除微小 開口配置圖案’而除去微小開口上所存在之^膜。最後去 除抗钱劑膜。 圖2係說明本發明其他實施方式2NG濾光器之圖，圖 2(A)為整體之平面圖、圖2(B)、（C)、（D)為圖2(a)其中—部 分的擴大圖。 此例之ND濾光器Γ係與圖滤光器丨相同地，於基板 2其中-面所形成之膜厚均句的^蒸鍍膜3上，形成有微小 開口 4者，惟’在每一滤光器部位變化微小開口 *之大小（直 徑）。 微小開口 4之直徑，係例如由延伸於基板2之直徑方向上 的線5開始’於中心角度為9〇。之部位n，其直徑為 於中心角度為。之部位P2則直徑為⑽_，而中 心角度為270。之部位P3 ’直徑為⑽咖。於各部位中，微 小開口4係隨機地分散配置。又’於各部位，微小開口4係 128452.doc 200900742 ♦ 如圖2(B)〜（D)所示，既可 J心成為相同的配置圖柰， 成為不同的配置圖案。 〃、亦可形 如此，藉由於濾光器之夂Ar?, ^之各部位而改變微小開 亦可改變每個部位之每— 幻工 早位面積之微小開口4的合 比例。且，透過率係與微 D積 關係而變化。 4之“十面積之比率成比例 以下說明攝像元件檢查裝置。The film thickness can sufficiently obtain the film thickness of the reflectance, and one of them is, for example, nm. Next, a resist is applied onto the deposited film, and a predetermined minute opening arrangement pattern is drawn on the resist film. Then, the minute opening arrangement pattern ' is removed by etching to remove the film present on the minute opening. Finally, remove the anti-money film. 2 is a view illustrating a second embodiment of the present invention, wherein FIG. 2(A) is a plan view of the whole, and FIGS. 2(B), (C) and (D) are enlarged portions of FIG. Figure. In the same manner as the filter 丨, the ND filter of this example is formed on the vapor-deposited film 3 of the film thickness of the substrate 2, and the micro-opening 4 is formed, but The size of the filter is changed by the size of the small opening* (diameter). The diameter of the minute opening 4 is, for example, a line 5 extending in the diameter direction of the substrate 2 at a center angle of 9 Å. The part n has a diameter at the center angle. The portion P2 has a diameter of (10)_ and a center angle of 270. The portion P3' has a diameter of (10) coffee. The micro-openings 4 are randomly dispersed and arranged in each part. Further, in each part, the minute opening 4 is 128452.doc 200900742 ♦ As shown in Figs. 2(B) to (D), the same arrangement pattern can be obtained, and the arrangement pattern can be different. 〃 亦可 亦可 , , , , , , , , , 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂 夂Moreover, the transmittance changes with the micro D product relationship. 4 "The ratio of the ten areas is proportional. The imaging element inspection device will be described below.
圖3為本發明實施方式之攝像元件之檢查裝置的構成圖。 此檢查裝置2〇具有一用以對攝像元件（CCD感測器、 CMOS感測窃等)之受光部照射檢查用光之光源裝置1〇、及 一用以對由光源裝置10發出之光進行均勻化的機構21。 光源裝置1Q具有燈11、及用以使從燈11照射之光透過的 濾光^§ 1。燈11係可使用如鹵素燈。ND濾光器1可使用圖玉 或圖2之ND濾光器丨或丨，。ND濾光器丨中央處的孔洞内係 插入固定有電動機12(如步進電動機）之旋轉軸Ka。ND濾 光器1係與光軸成直角或稍微傾斜而配置於光路中。可藉由 %轉電動機12，而讓no渡光器1中所希望的部位定位於光 路。 在光路中之ND濾光器1之前部，係配置有用以使光均勻 化之機構（如均化器）21。藉由此機構21，可使透過ND濾光 裔1之光均勻化。出自此機構21之光，係經由透鏡等而照射 在攝像元件之受光面上。 【圖式簡單說明】 圖1為說明本發明實施方式之NG濾光器之圖，圖1(A)為 128452.doc 200900742 整體平面圖，）g| t 、 圖 1(B)、（c)、（D)為圖 1(A)其中一 大圖。 °卩分的擴 圖2為說明本發明其他實施方式之肌 :=平-叫(C)、(—：: 成=為顧示本發明實施方式之攝像元件之檢查裝置的構 圖4(A) (B)為說明nd德光器之例圖。 【主要元件符號說明】 ND濾光器 基板 蒸鍍膜 微小開口 線 光源裝置 燈 電動機 檢查裝置 光均勻化機構 1 2 3 4 5 10 11 12 20 21 128452.doc3 is a configuration diagram of an inspection device for an image pickup element according to an embodiment of the present invention. The inspection device 2A has a light source device 1 for illuminating the light-receiving portion of the image pickup device (CCD sensor, CMOS sensor, etc.), and a light source for emitting light from the light source device 10. Homogenized mechanism 21. The light source device 1Q has a lamp 11 and a filter 1 for transmitting light irradiated from the lamp 11. The lamp 11 can be used, for example, as a halogen lamp. The ND filter 1 can use the ND filter 丨 or 丨 of Fig. 2 or Fig. 2. The rotation axis Ka of the motor 12 (e.g., stepping motor) is inserted into the hole in the center of the ND filter. The ND filter 1 is disposed at an angle to the optical axis at a right angle or slightly inclined. The desired portion of the no irradiator 1 can be positioned in the optical path by the % motor 12 being turned. In front of the ND filter 1 in the optical path, a mechanism (e.g., a homogenizer) 21 for homogenizing the light is disposed. By this means 21, the light transmitted through the ND filter 1 can be made uniform. The light from this mechanism 21 is irradiated onto the light receiving surface of the image pickup element via a lens or the like. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a view illustrating an NG filter according to an embodiment of the present invention, and FIG. 1(A) is a general plan view of 128452.doc 200900742, g_t, FIG. 1(B), (c), (D) is a large picture of Figure 1 (A). FIG. 2 is a perspective view showing the other embodiment of the present invention: FIG. 4(A) showing the imaging device of the imaging element according to the embodiment of the present invention. (B) is an illustration of an example of a nd optical device. [Description of main component symbols] ND filter substrate evaporation film micro open line light source device lamp motor inspection device light homogenization mechanism 1 2 3 4 5 10 11 12 20 21 128452 .doc