TW200900702A - Apparatus for detecting a probe location in a probe card - Google Patents
Apparatus for detecting a probe location in a probe card Download PDFInfo
- Publication number
- TW200900702A TW200900702A TW097113700A TW97113700A TW200900702A TW 200900702 A TW200900702 A TW 200900702A TW 097113700 A TW097113700 A TW 097113700A TW 97113700 A TW97113700 A TW 97113700A TW 200900702 A TW200900702 A TW 200900702A
- Authority
- TW
- Taiwan
- Prior art keywords
- probe
- camera
- target unit
- gap distance
- probe card
- Prior art date
Links
- 239000000523 sample Substances 0.000 title claims abstract description 183
- 230000000295 complement effect Effects 0.000 claims description 10
- 238000005259 measurement Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 230000000153 supplemental effect Effects 0.000 claims description 4
- 206010036790 Productive cough Diseases 0.000 claims 1
- 210000003802 sputum Anatomy 0.000 claims 1
- 208000024794 sputum Diseases 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 8
- 235000012431 wafers Nutrition 0.000 description 43
- 239000013078 crystal Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2891—Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
200900702200900702
, ,File:TW4563F 九、發明說明: 【發明所屬之技術領域】 本發明是有關於一種用以偵測探針卡中之探針位置 之設備,且特別是有關於一種用以正確測量在探針卡中之 探針與包含數個晶片之一晶圓之間的一間隙距離,並用以 將探針置於探針與晶圓彼此穩定接觸之位置之設備。 【先前技術】 f) 一般而言,多個晶片係有規則地配置在一個半導體晶 圓上。在用以從晶圓分離此些晶片之一封裝製程之前,晶 片之電氣特徵係於晶圓上檢驗’且電氣缺陷係從晶片被偵 測,藉以改善個別晶片之操作可靠度。 晶片之檢驗通常是藉由包含一探針卡之一探針測試 器來執行,其中多個探針接觸晶片之一導電焊墊。用以測 試晶圓上之晶片之探針測試器通常包含:探針卡;一探針 卡固持器,用以支持探針卡;以及一夾頭,其包含與探針 卡之探針接觸之晶圓。 習知之探針測試器通常偵測晶圓之一接觸位置,此接 觸位置就是在探針與晶片接觸之前,探針與晶片彼此接觸 之位置,俾能確保探針與晶片之間的接觸之可靠度與精 度。因此,探針測試器正確偵測探針卡之探針之位置,並 參考一預設位置使探針對準。 第1圖係為顯示用以偵測探針卡中之探針位置之一 習知設備之前視圖。 5 200900702, File: TW4563F IX. Description of the Invention: [Technical Field] The present invention relates to an apparatus for detecting the position of a probe in a probe card, and in particular to a method for correct measurement A gap between the probe in the card and a wafer containing one of the plurality of wafers, and a device for placing the probe in a position where the probe and the wafer are in stable contact with each other. [Prior Art] f) In general, a plurality of wafers are regularly arranged on a semiconductor crystal circle. Prior to the packaging process used to separate the wafers from the wafer, the electrical characteristics of the wafer are inspected on the wafer and the electrical defects are detected from the wafer to improve the operational reliability of the individual wafers. Inspection of the wafer is typically performed by a probe tester comprising a probe card that contacts one of the conductive pads of the wafer. A probe tester for testing a wafer on a wafer typically includes: a probe card; a probe card holder for supporting the probe card; and a collet including the probe of the probe card Wafer. Conventional probe testers typically detect a contact position of a wafer that is in contact with the wafer before the probe is in contact with the wafer, and ensures reliable contact between the probe and the wafer. Degree and precision. Therefore, the probe tester correctly detects the position of the probe of the probe card and aligns the probe with reference to a predetermined position. Figure 1 is a front view showing a conventional device for detecting one of the probe positions in the probe card. 5 200900702
Fiie:TW4563F 如第1圖所示,—相機C係設置一& 俾能使相機C _在探針卡之ϋ :探針卡PC之下, 並測量在探針N與包含複數個晶片—=之—探針區域, 距離。 之晶圓之間的一間隙 相機C依據在探針N與晶圓上之曰 隙距離,而對準在探針區域周圍之一二二之間的一參考間 距離係事先預設於探針測試器中。$插區域。參考間隙 當探針卡PC與具有一不同尺寸 時,探針卡固持ϋ PH之位置#改變,—個探針卡置 換 片之間的間隙距離,係依據探針卡在楝針與晶 所導致的變更而改變。 之種類以及由接觸 因此’當由探針相持器pH位置 導致的位置誤差係依據探針卡之重/拖彳木針N之接觸所 之實際間隙距離係遠脫離於參考㈣而累積時’探針 下’存在有相機C無法偵測探針卡之=種:: 泛被熟知為一間隙距離測量誤差。 ,其係廣 因此,當相機C無法價測探針時, 控相機C,以實際上掃描探針N之探針區域貝可手動操 此外’-微相機通常使用作為相機 叮 小掃描區域中正確測量在探 微相機可在一 距離。鈥而,者位ateJ之日日片之間的間隙 此離』《位置誤差累積時,探針之位 參考位置,從而存在有相機d 亦可超出一 夕門咽,並怂”,、次正確债洌探針N之位置 之問4 I係廣泛被热知為—位置_誤差。 可能需要一種用以掃描-大掃描區域之改良的相 6 200900702Fiie: TW4563F As shown in Figure 1, camera C is set to & 俾 to enable camera C _ under the probe card: probe card PC, and measured in probe N and contains multiple wafers - = - probe area, distance. A gap between the wafers of the camera C is based on the gap distance between the probe N and the wafer, and a reference distance between one of the two around the probe area is preset to the probe. In the tester. $ insert area. Reference gap When the probe card PC has a different size, the position of the probe card holding ϋ PH is changed, and the gap distance between the probe card replacement sheets is caused by the probe stuck in the needle and the crystal. Change with changes. The type and the positional error caused by the contact thus caused by the pH position of the probe holder is based on the actual gap distance of the contact of the probe card/the drag needle N is far from the reference (4) and accumulates Under the needle 'there is a camera C can not detect the probe card = species:: is generally known as a gap distance measurement error. Therefore, when the camera C cannot measure the probe, the camera C is actually scanned to probe the probe N. The probe area can be manually operated. In addition, the 'micro camera is usually used as the camera in the small scanning area. The measurement in the micro camera can be at a distance.鈥 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The position of the bond probe N is widely known as the position_error. It may be necessary to use a modified phase for scanning-large scan area.
. ,File:TW4563F 機,用以正確測量一間隙距離,並正確偵測探針N之位置。 然而,改良的相機是很昂貴的,因而增加半導體裝置之製 造成本。 因此,當相機C被設計成用以在一估計成本内掃描探 針卡之大區域時,就無法正確測量在探針與晶圓之晶片之 間的間隙距離,從而使探針N與晶圓可能彼此接觸不夠。 相較之下,當相機C係被設計成用以在一估計成本内 掃描探針卡之小區域時,位置偵測誤差可能由於相機C之 小掃描區域而頻繁地產生,從而對探針測試器之運作而 言,更頻繁需要手動控制。 【發明内容】 本發明是有關於一種用以正確測量在一探針卡中之 一探針與包含數個晶片之一晶圓之間的一間隙距離,並用 以將探針置於探針與晶圓彼此穩定接觸之位置之設備。 本發明亦有關於一種用以藉由補償一誤差而使間隙 距離測量誤差之產生減至最低之設備,此誤差係由一探針 卡固持器所導致,並在一相機偵測探針卡中之一探針時, 於相對於一探針卡之一第一測量中受到偵測。 本發明亦有關於一種用以藉由將由一第一相機所偵 測到的探針位置資料傳送至第二相機,而利用一第二相機 使位置偵測誤差之產生減至最低之設備。 根據本發明之第一方面,提供一種用以偵測一探針卡 中之一探針之位置以及在探針與一物件之間的一間隙距 7 200900702.File: TW4563F machine to correctly measure a gap distance and correctly detect the position of the probe N. However, an improved camera is expensive, thus increasing the manufacturing cost of the semiconductor device. Therefore, when the camera C is designed to scan a large area of the probe card within an estimated cost, the gap distance between the probe and the wafer of the wafer cannot be correctly measured, thereby making the probe N and the wafer It may not be enough to touch each other. In contrast, when the camera C is designed to scan a small area of the probe card within an estimated cost, the position detection error may be generated frequently due to the small scanning area of the camera C, thereby testing the probe. In terms of the operation of the device, manual control is required more frequently. SUMMARY OF THE INVENTION The present invention is directed to a method for correctly measuring a gap between a probe in a probe card and a wafer containing a plurality of wafers, and for placing the probe on the probe and Equipment where the wafers are in stable contact with each other. The invention also relates to a device for minimizing the generation of gap distance measurement errors by compensating for an error caused by a probe card holder and in a camera detection probe card One of the probes is detected in the first measurement relative to one of the probe cards. The present invention also relates to an apparatus for minimizing the occurrence of position detection errors by using a second camera by transmitting probe position data detected by a first camera to a second camera. According to a first aspect of the present invention, there is provided a method for detecting a position of a probe in a probe card and a gap between the probe and an object 7 200900702
• ‘ File:TW4563F 離之設備。此設備可包含一目標單元與一相機單元。目標 單元係配置在一探針卡固持器之下,探針卡係置入至探針 卡固持器中,而相機單元偵測目標單元之一補充位置並測 量在目標單元與物件之間的一補充間隙距離。在探針與物 件之間的間隙距離,係參考補充間隙距離而被測量。 於一例示實施例中,相機單元包含:一第一相機,用 以偵測補充位置、測量補充間隙距離並偵測探針之位置; 以及一第二相機,用以測量補充間隙距離以及在探針與物 f - 件之間的間隙距離。 於一例示實施例中,第二相機藉由使用由第一相機所 偵測之目標單元之補充位置來測量補充間隙距離,並藉由 使用由第一相機所偵測之探針之位置來測量探針與物件 之間的間隙距離。 於一例示實施例中,第二相機偵測目標單元之補充位 置,且在第二相機測量探針與物件之間的間隙距離之前, 第二相機之一相對位置係藉由一差異而相對於第一相機 CJ 作變化,此差異係在由第一與第二相機所偵測之目標單元 之此些補充位置之資料之間。 於一例示實施例中,目標單元係設置在與探針卡之探 針鄰接的探針卡固持器之下。 於一例示實施例中,目標單元包含:一目標盒,設置 在探針卡固持器之下並於其之一底部部分具有一透孔;以 及一目標區塊,設置於目標盒中並經由透孔露出,俾能使 第一與第二相機經由透孔偵測目標區塊。 8 200900702• ‘ File: TW4563F is off the device. The device can include a target unit and a camera unit. The target unit is disposed under a probe card holder, and the probe card is inserted into the probe card holder, and the camera unit detects one of the target units to replenish the position and measures a position between the target unit and the object. Supplement the gap distance. The gap distance between the probe and the object is measured with reference to the supplemental gap distance. In an exemplary embodiment, the camera unit includes: a first camera for detecting a complementary position, measuring a complementary gap distance, and detecting a position of the probe; and a second camera for measuring the complementary gap distance and detecting The gap distance between the needle and the f-piece. In an exemplary embodiment, the second camera measures the supplemental gap distance by using the complementary position of the target unit detected by the first camera, and is measured by using the position of the probe detected by the first camera. The gap distance between the probe and the object. In an exemplary embodiment, the second camera detects the complementary position of the target unit, and before the second camera measures the gap distance between the probe and the object, the relative position of one of the second cameras is relative to the difference The first camera CJ changes, the difference being between the data of the complementary locations of the target unit detected by the first and second cameras. In an exemplary embodiment, the target unit is disposed below the probe card holder adjacent the probe of the probe card. In an exemplary embodiment, the target unit includes: a target box disposed under the probe card holder and having a through hole at a bottom portion thereof; and a target block disposed in the target box and configured to pass through The holes are exposed, and the first and second cameras can detect the target block through the through holes. 8 200900702
1 ' File:TW4563F 依據本發明之例示實施例,第一與第二相機首先偵測 位置並測量一目標單元之一第一間隙距離,然後,偵測位 置並測量一探針之一第二間隙距離,藉以避免關於探針之 偵測誤差,並正確測量在探針與晶圓之間的第二間隙距 離。因此,探針卡之探針可藉由設備而與晶圓穩定接觸。 為讓本發明之上述内容能更明顯易懂,下文特舉一較 佳實施例,並配合所附圖式,作詳細說明如下: (、 【實施方式】 以下特舉多個實施例詳細說明,並配合所附圖式。然 而,本發明可能以許多不同的形式所實施,且不應被解釋 為受限於於此所提出之實施例。反之,對熟習本項技藝者 而言,以下所提出之實施例是為了能使這個揭露書徹底且 完整的呈現,以完全傳達本發明之範疇。所附圖示為了清 楚說明,各層及各區域之大小可能較為誇飾。 當闡述一元件或層π位在另一個元件或層上11,”連接 I 至另一個元件或層"或”耦接至另一個元件或層''時,其可 直接位在另一個元件或層上,連接或耦接至另一個元件或 層,或者可能出現數個中介元件或中介層。相對地,當闡 述一元件或層π直接位在另一個元件或層上π,π直接連接 至另一個元件或層"或”直接耦接至另一個元件或層"時, 則元件或層與另一元件或另一層之間不具一中介元件或 一中介層。類似的標號係對應至類似的元件。於本文中, 用語「及/或」包括一或多個相關項目之任意或所有組合。 9 2009007021 ' File: TW4563F According to an exemplary embodiment of the present invention, the first and second cameras first detect a position and measure a first gap distance of a target unit, and then detect the position and measure a second gap of a probe. Distance to avoid detection errors with respect to the probe and to correctly measure the second gap distance between the probe and the wafer. Therefore, the probe of the probe card can be stably contacted with the wafer by the device. In order to make the above description of the present invention more comprehensible, the following detailed description of the preferred embodiments, together with the accompanying drawings, will be described in detail below: The present invention may be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Conversely, to those skilled in the art, the following The embodiments are presented in order to provide a thorough and complete representation of the disclosure so as to fully convey the scope of the present invention. The accompanying drawings, for clarity of illustration, the various layers and regions may be exaggerated in size. When placed on another element or layer 11, "connecting I to another element or layer" or "coupled to another element or layer" can be placed directly on another element or layer, connected or coupled To the other element or layer, or several intervening elements or interposers may be present. In contrast, when an element or layer π is placed directly on another element or layer, π is directly connected to another element or layer. Or "directly coupled to another element or layer" does not have an intervening element or an intervening layer between another element or another layer. Like reference numerals correspond to similar elements. In this document, the term "and/or" includes any or all combinations of one or more related items.
' 'FiIe:TW4563F 第 一 J弟三」等用語係用以描述 不同兀件、組件、區域、層及/或區段,這些元件、租件、 區域、層及/或區段不應受限制於這些名稱。這些名稱口 ^區別-個元件、組件、區域、層或區段與另—個區域、、 層或區段。因此,下述之第一元件、 元件、-反: 厂與空間相關如「底下」、「下方」、「下面的」、「上方」、 上面的」及相似之詞彙係用以描述圖示中n 與=:元件或特徵關係。另外,與空間相關之詞囊除了^ ㈤所、、、θ不之方位,亦包括裝置使用令或運作中之不同 ^舉例來說,若翻轉圖示之裝置,則原來元件「下方」 或底下J之另-元件或另一特徵係改變方位為元件「上」 一元件或另一特徵。因此,詞彙「下方」係可包 上方之朝向(orientation)。裳置可以其他方 朝向(旋轉90。或面對其他方位), 描述語對應說明。 m工間相關之 在本實施例中所使用之專門用語僅作為描述之用,並 「一以限疋本發明。除非本文明確地指出,否則單數形式 一個」亦包括複數形式「數個」。此外,當使用「包 ^說明書中時’係用以以詳述指定特徵、事物、步驟、操 特徵7^或:件的存在’但並不排除一或多個附加之、 寺徵、事物、v驟、操作、元件及/或部件的存在。 除非更進-步定義,否則所有在本文中使用之名稱 200900702'FiIe: TW4563F First J 3' and other terms are used to describe different components, components, regions, layers and/or sections. These components, leases, zones, layers and/or sections should not be restricted. For these names. These name ports ^ distinguish between a component, component, region, layer or section and another zone, layer or section. Therefore, the following first component, component, and reverse: factory-space related such as "bottom", "below", "below", "above", above, and similar words are used to describe the illustration. n and =: component or feature relationship. In addition, the spatially related terminology includes, in addition to the position of (5), and θ, the device usage order or the operation is different. For example, if the device is flipped, the original component is "below" or underneath. Another element or another feature of J is a change in orientation to the element "on" an element or another feature. Therefore, the word "below" can be used to cover the orientation above. The skirt can be oriented in the other direction (rotate 90. or face other orientations), the description of the description. The term "singular" and "singular" are used in the plural. In addition, when the use of "in the specification" is used to specify the specified features, things, steps, operating characteristics, or the existence of the pieces 'but does not exclude one or more additional, temple signs, things, v. The existence of operations, components, and/or components. Unless otherwise defined, all names used herein are 200900702.
k * File:TW4563F (包括技術性及科學性名稱)係與本發明所屬技術領域中 之通常知識具有相同意義。再者,除非文中明確地定義, 否則例如在一般字典裡所定義之名稱應被視為與相關技 術背景之意義一致,而不會被解讀為理想化或過度正規之 意義。 第2圖係為顯示依據本發明之一例示實施例之一種 用以偵測一探針卡中之一探針位置之設備之前視圖,而第 3圖係為第2圖中之一部分A之局部放大圖。第4圖係為 Ο 顯示藉由使用顯示於第2圖之設備來偵測一探針卡中之一 探針位置之一製程之視圖。 參見第2、3與4圖,用以偵測一探針卡中之一探針 位置之一設備900(以下以位置設備表示)可包含一目標單 元100與一相機單元200。 目標單元100可設置在一探針卡固持器PH之下,探 針卡PC係被容納至探針卡固持器PH中,而相機單元200 可設置於此設備之一底部部分並面向探針卡固持器PH與 I 探針卡PC之底部表面。 目標單元100可包含一目標盒110與一目標區塊 120,並被設置與探針卡PC之一探針N鄰接。亦即,目標 單元100係設置在與探針卡PC之探針N最鄰接的探針卡 固持器PH之底部表面。 目標盒110固定目標區塊120並確保目標區塊120待 被設置在探針卡固持器PH之下。一透孔111係形成通過 目標盒110之一底板,而目標區塊120係設置在目標盒110 200900702k * File: TW4563F (including technical and scientific names) has the same meaning as the ordinary knowledge in the technical field to which the present invention pertains. Furthermore, unless explicitly defined in the text, a name such as that defined in a general dictionary should be considered to be consistent with the meaning of the relevant technical background and is not to be interpreted as idealized or overly formal. 2 is a front view showing a device for detecting the position of a probe in a probe card according to an exemplary embodiment of the present invention, and FIG. 3 is a portion of a portion A of FIG. Enlarged image. Figure 4 is a view showing a process for detecting one of the probe positions in a probe card by using the device shown in Figure 2. Referring to Figures 2, 3 and 4, a device 900 (hereinafter referred to as a location device) for detecting one of the probe positions in a probe card can include a target unit 100 and a camera unit 200. The target unit 100 can be disposed under a probe card holder PH, the probe card PC is housed in the probe card holder PH, and the camera unit 200 can be disposed at one of the bottom portions of the device and facing the probe card Holder PH and the bottom surface of the I probe card PC. The target unit 100 can include a target box 110 and a target block 120 and is disposed adjacent to one of the probe cards PC. That is, the target unit 100 is disposed on the bottom surface of the probe card holder PH which is most adjacent to the probe N of the probe card PC. The target box 110 secures the target block 120 and ensures that the target block 120 is to be placed under the probe card holder PH. A through hole 111 is formed through one of the bottom plates of the target box 110, and the target block 120 is disposed in the target box 110 200900702
File:TW4563F 中之底板上。因此’目標區塊120係經由透孔⑴ 目標區塊12G可提供關於探針卡PC之置換之某此資 I給相機早兀200,而相機單元藉由使塊、 來债測由探針卡%之置換所導致的誤差。 更明確而言,目標區塊12〇係以下 置,在目標區塊120與—晶圓之 。=構以被設 探針N之-末稍尖端與晶圓之門// —間隙係大於在 隙小於第二間隙且目標隙。當第-間 接近晶圓時,目標區塊120可阻礙探針N斑之末賴^端更 觸。因此,在設備900中, ,、晶圓之物理接 隙。 可能需要大於第二間 相機單it2GG可#自1 -位置(位在探針卡固持器PH之下)移^-)而從一第 在探針卡pc之下),或從第二位置移動1弟-位置(位 相機單元200可能藉由附加驅 位置。亦即, 探針卡固持器PH與探針卡pc之;=平往返地移動於 目標單元100(位於探斜吏相機單元200可在 探針卡以 -與"元⑽^含—第一相機 光學角度之一宏::於而其第中t 一相機210係為具有大 角度之-微相機機^二相機220係為具有小光學 第一相機210可偵測目標單元1〇〇之位 Θ 標單元與晶圓之間的一 ,測量在目 弟㈤隙距離,並偵測探針N之位 12File: On the backplane in TW4563F. Therefore, the target block 120 can provide a certain amount of the replacement of the probe card PC to the camera 200 via the through-hole (1) target block 12G, and the camera unit measures the fingerprint by the block. The error caused by the replacement of %. More specifically, the target block 12 is below the target block 120 and the wafer. = The probe N is set to the end of the tip of the probe and the gate of the wafer // the gap is larger than the gap and smaller than the second gap and the target gap. When the first-to-wafer approaching the wafer, the target block 120 can block the end of the probe N-spot from being touched. Thus, in device 900, the physical gap of the wafer. It may be necessary to be larger than the second camera single it2GG can be moved from the 1-position (below the probe card holder PH) to the ^-) and from the first to the probe card pc, or from the second position 1 position-position (the camera unit 200 may be attached by the additional drive position. That is, the probe card holder PH and the probe card pc; = flatly moving to and from the target unit 100 (located in the camera unit 200) In the probe card with - and (yuan) (10) ^ - one of the first camera optical angle macro:: and its middle t - a camera 210 is a large angle - the micro camera 2 camera 220 has The small optical first camera 210 can detect the position between the target unit and the wafer of the target unit, measure the distance between the target (five) gap, and detect the position of the probe N.
200900702 ' 'File:TW4563F 置。第二相機220可測量第一間隙距離以及在探針N與晶 圓之間的一第二間隙距離。 第一相機210可掃描在目標單元100之下的大區域, 並偵測目標單元100之位置(以下以目標單元100之第一 位置資料表示),藉以完成第一相機210之一第一掃描。 然後,第一相機210可掃描在探針N之下的一大區域,並 偵測探針N之位置,藉以完成第一相機210之一第二掃描。 第二相機220可基於由位在目標單元100之下的第一 相機210所偵測的目標單元100之位置,來正確測量目標 單元100之第一間隙距離。 於一例示實施例中,第二相機220亦可偵測目標單元 100之位置(以下以目標單元100之第二位置資料表示), 且目標單元100之第一與第二位置資料係彼此作比較。因 此,第二相機220相對於第一相機210之一相對位置係參 考目標單元100之位置而決定。一旦第一與第二相機210 與220之相對位置係相對於目標單元100之位置而在上述 過程中被決定,第一與第二相機210與220之相同相對位 置就會維持於設備900中。因此,當探針N被相機單元200 偵測時,第一與第二相機210與220之相對位置仍然會維 持在探針卡PC之下,藉以利用相機單元200改善探針N 之偵測精度。 當以一新相機置換一舊相機以供設備900進行維修 時,舊相機中之第一與第二相機之上述所決定之相對位置 係與新相機中之第一與第二相機之實際相對位置不同,而 13 200900702200900702 ' 'File:TW4563F set. The second camera 220 can measure the first gap distance and a second gap distance between the probe N and the wafer. The first camera 210 can scan a large area under the target unit 100 and detect the position of the target unit 100 (hereinafter referred to as the first location data of the target unit 100), thereby completing a first scan of the first camera 210. Then, the first camera 210 can scan a large area under the probe N and detect the position of the probe N, thereby completing a second scan of the first camera 210. The second camera 220 can correctly measure the first gap distance of the target unit 100 based on the position of the target unit 100 detected by the first camera 210 located below the target unit 100. In an exemplary embodiment, the second camera 220 can also detect the location of the target unit 100 (hereinafter referred to as the second location data of the target unit 100), and the first and second location data of the target unit 100 are compared with each other. . Therefore, the relative position of the second camera 220 relative to the first camera 210 is determined by referring to the position of the target unit 100. Once the relative positions of the first and second cameras 210 and 220 are determined relative to the position of the target unit 100 in the above process, the same relative positions of the first and second cameras 210 and 220 are maintained in the device 900. Therefore, when the probe N is detected by the camera unit 200, the relative positions of the first and second cameras 210 and 220 are still maintained under the probe card PC, thereby improving the detection accuracy of the probe N by using the camera unit 200. . When an old camera is replaced with a new camera for servicing by the device 900, the relative position determined by the first and second cameras in the old camera is the actual relative position of the first and second cameras in the new camera. Different, and 13 200900702
* File:TW4563F ΐ新相機之第二相機偵測探針卡pc之探針㈣,新相機 中之相對位置之偏差可導致—僧測誤差。 因此’在遇到相機置換時,第-與第二相機210與 220,相對位置係參考目標單元i〇〇而被正確決定,而第 :與弟二相機210與220之實際相對位置可能依據第一與 第一相機210與220之所決定的相對位置變化。因此,可 避免第二相機22G由於_ _誤差而錯過探針N。 ^亦即,第二與第二相機21〇與22〇之相對位置係於每 次置換相機單兀200時相對於目標單元1〇〇作變化,且 二相機220可基於探針N之探針位置(其係由第一相機21〇 隙距離。 正相讀針Ν距離晶圓之間 弟二相機220可包含一将i日她 , 小區域之-正確掃描,從而:以 置無法被_,除非目標單元* File: TW4563F The second camera of the new camera detects the probe of the probe card pc (4). The deviation of the relative position in the new camera can cause the measurement error. Therefore, when the camera replacement is performed, the relative positions of the first and second cameras 210 and 220 are correctly determined by referring to the target unit i, and the actual relative position of the second camera 210 and 220 may be based on the first A relative positional change determined by the first cameras 210 and 220. Therefore, the second camera 22G can be prevented from missing the probe N due to the __ error. ^ That is, the relative positions of the second and second cameras 21 〇 and 22 系 are changed with respect to the target unit 1 each time the camera unit 200 is replaced, and the two cameras 220 can be based on the probe of the probe N Position (which is the gap distance of the first camera 21. The positive phase reading pin Ν distance between the wafer and the second camera 220 can include a day i, a small area - correct scan, thus: can not be _, Unless the target unit
L 一相機210被傳送。因此,第機 立置係攸弟 持器PH與探針卡PC;mAt 21、0知描在探針卡固 與探針N之位置資料傳送至第二:機22:將目‘早70 10〇 當將探針卡PC裝設在夾頭之上 能被配置在-夾頭周圍,並被設置;針元咖可 探針卡K:之底部表面鄰接,於其中^卡固持器即與 圓周表面而設置於夾頭上。 曰曰圓係沿者夾頭之- 如下探針卡中之探針N之位置係在上述設備_中被_ 14 200900702L A camera 210 is transmitted. Therefore, the first machine is set up to hold the PH and the probe card PC; the mTa 21, 0 is described in the position of the probe and the probe N is transmitted to the second: machine 22: will be the first '70 10将When the probe card PC is mounted on the chuck, it can be placed around the chuck and set; the needle card can be probe card K: the bottom surface is adjacent, in which the card holder is the circumference The surface is placed on the chuck.曰曰 Round tie clip - The position of the probe N in the probe card below is in the above device _ 14 200900702
* * File:TW4563F 探針卡PC係被置入探針卡固持器PH中,且相機 200偵測在探針卡固持器PH之下的目標單元。亦凡 相機單元200之第一相機21〇掃描在目標單元1〇〇之下 一大區域’藉以積測目標單元1〇〇之位置以及在目標單、 100與夾頭上之晶圓之間的第一間隙距離。 兀 因為用以掃描一小區域之一微相機係使用作為第二 相機220,所以目標單元100之位置資料需要被傳送至— -相機220’俾能使目標單元⑽之位置係由第一相機加 卜當目標單元10 0之位置係由第一相機210所偵測時, 第二相機220可正確測量目標單元1〇〇距離晶圓之第—間 隙距離。亦即,第一相機21〇掃描在目標單元100之下^ 大區域,並將目標單元100之位置傳送至第二相機22〇, 且第二相機22〇基於由第一相機21〇所偵測之目標單元 00之位置^料,來正確測量目標單元距離晶 一間隙距離。 、 此外,第一相機220亦偵測目標單元1 〇〇之位置(已 从目標單元1〇〇之第二位置資料表示),且目標單元1〇〇 之第與第二位置資料係彼此作比較。第二相機22〇相對 於第—相機210之相對位置係參考目標單元1〇〇之位置而 後,相機單元200藉由驅動單元移動至在探針卡 A之下的第二位置,使相機單元200設置於探針卡%之 朱針N之下。第一相機210掃描在探針N之下的一大區域, 15* * File: The TW4563F probe card PC is placed in the probe card holder PH, and the camera 200 detects the target unit under the probe card holder PH. Also, the first camera 21 of the camera unit 200 scans a large area under the target unit 1 to "measure the position of the target unit 1" and the number between the target sheet, 100 and the wafer on the chuck. A gap distance.兀Because one of the micro cameras used to scan a small area is used as the second camera 220, the location data of the target unit 100 needs to be transmitted to the camera 220', so that the position of the target unit (10) can be increased by the first camera. When the position of the target unit 100 is detected by the first camera 210, the second camera 220 can correctly measure the first-gap distance of the target unit 1 from the wafer. That is, the first camera 21 scans the area under the target unit 100 and transmits the position of the target unit 100 to the second camera 22, and the second camera 22 is detected based on the first camera 21 The position of the target unit 00 is used to correctly measure the distance between the target unit and the crystal. In addition, the first camera 220 also detects the position of the target unit 1 (which has been represented from the second position data of the target unit 1), and the first unit and the second position data of the target unit 1 are compared with each other. . The relative position of the second camera 22 〇 relative to the first camera 210 is referenced to the position of the target unit 1 而, and then the camera unit 200 is moved to the second position under the probe card A by the driving unit to cause the camera unit 200 Set under the needle card N of the probe card. The first camera 210 scans a large area below the probe N, 15
200900702 File:TW4563F 藉以偵測探針N之位置,且第二相機220基於由第一相機 210所偵測之探針N之位置資料以及第一與第二相機210 與220之所決定的相對位置,正確測量在探針N與晶圓之 間的第二間隙距離。 於一例示實施例中,探針卡固持器PH可能與探針卡 PC隔開一微小距離,且目標單元100之一平整度可能與探 針N之平整度不同,因此在目標單元100與晶圓之間的第 一間隙距離,可能與在探針N與晶圓之間的第二間隙距離 不同。 然而,第一與第二間隙距離實質上可能彼此類似,其 乃因為探針卡固持器PH之位置誤差並未被累積至探針N 之預設參考間隙距離。因此,雖然第二相機220基於優先 於第二間隙距離被測量之第一間隙距離之目標單元100來 測量探針N之第二間隙距離,但第二相機220可充分測量 探針N之第二間隙距離,藉以避免由於掃描區域與探針區 域之不對準所造成的間隙距離測量誤差。 依據本發明之例示實施例,第一與第二相機首先偵測 位置並測量一目標單元之一第一間隙距離,然後,其次偵 測位置並測量一探針之一第二間隙距離,藉以避免關於探 針之偵測誤差,並正確測量在探針與一晶圓之間的第二間 隙距離。因此,一探針卡之探針可藉由一設備而與晶圓穩 定接觸。 又,一相機單元包含:第一相機,用以掃描一大區域, 藉以偵測探針與目標單元之位置;以及第二相機,用以掃 16 200900702200900702 File: TW4563F is used to detect the position of the probe N, and the second camera 220 is based on the position data of the probe N detected by the first camera 210 and the relative position determined by the first and second cameras 210 and 220. The second gap distance between the probe N and the wafer is correctly measured. In an exemplary embodiment, the probe card holder PH may be spaced a small distance from the probe card PC, and one of the flatness of the target unit 100 may be different from the flatness of the probe N, thus the target unit 100 and the crystal The first gap distance between the circles may be different than the second gap distance between the probe N and the wafer. However, the first and second gap distances may be substantially similar to each other because the positional error of the probe card holder PH is not accumulated to the preset reference gap distance of the probe N. Therefore, although the second camera 220 measures the second gap distance of the probe N based on the target unit 100 that is prioritized over the first gap distance measured by the second gap distance, the second camera 220 can sufficiently measure the second of the probe N The gap distance is used to avoid the gap distance measurement error caused by the misalignment between the scanning area and the probe area. According to an exemplary embodiment of the present invention, the first and second cameras first detect a position and measure a first gap distance of one of the target units, and then secondly detect the position and measure a second gap distance of one of the probes to avoid Regarding the detection error of the probe, and correctly measuring the second gap distance between the probe and a wafer. Therefore, the probe of a probe card can be stably contacted with the wafer by a device. Moreover, a camera unit includes: a first camera for scanning a large area to detect the position of the probe and the target unit; and a second camera for sweeping 16 200900702
. · File:TW4563F 描一小區域,藉以藉由使用目標單元與探針之位置資料分 別正確測量目標單元與探針之第一與第二間隙距離。因 此,目標單元與探針之間隙距離與位置分別可藉由設備而 容易並正確地被測量與偵測。 又,目標單元之位置係由第一與第二相機兩者所偵 測,俾能使第一與第二相機之相對位置係參考目標單元之 位置而被正確偵測。因此,第二相機可藉由使用由第一相 機所偵測之探針之位置以及第一與第二相機之相對位置 Π 而正確偵測探針之位置。 此外,相機單元包含用以掃描大區域之第一相機與用 以掃描小區域之第二相機,且由第一相機所偵測之目標單 元與探針之位置資料係被傳送至第二相機,藉以避免當第 二相機分別測量目標單元與探針之第一與第二間隙距離 時之位置偵測誤差。 綜上所述,雖然本發明已以一較佳實施例揭露如上, 然其並非用以限定本發明。本發明所屬技術領域中具有通 1 常知識者,在不脫離本發明之精神和範圍内,當可作各種 之更動與潤飾。因此,本發明之保護範圍當視後附之申請 專利範圍所界定者為準。 17 200900702• File: TW4563F Traces a small area by which the first and second gap distances of the target unit and the probe are correctly measured by using the position data of the target unit and the probe. Therefore, the gap distance and position between the target unit and the probe can be easily and correctly measured and detected by the device. Moreover, the position of the target unit is detected by both the first and second cameras, and the relative position of the first and second cameras can be correctly detected with reference to the position of the target unit. Therefore, the second camera can correctly detect the position of the probe by using the position of the probe detected by the first camera and the relative position of the first and second cameras. In addition, the camera unit includes a first camera for scanning a large area and a second camera for scanning a small area, and the position data of the target unit and the probe detected by the first camera is transmitted to the second camera. The position detection error is avoided when the second camera separately measures the first and second gap distances between the target unit and the probe. In view of the above, the present invention has been disclosed in a preferred embodiment, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims. 17 200900702
' ^ File:TW4563F 【圖式簡單說明】 第1圖係為顯示用以偵測探針卡中之探針位置之一 習知設備之剖面圖。 第2圖係為顯示依據本發明之一例示實施例之一種 用以偵測一探針卡中之一探針位置之設備之前視圖。 第3圖係為第2圖中之一部分A之局部放大圖。 第4圖係為顯示藉由使用顯示於第2圖之設備來偵測 一探針卡中之一探針位置之一製程之視圖。 f'. 【主要元件符號說明】 100 :目標單元 110 :目標盒 111 :透孔 120 :目標區塊 200 :相機單元 210 :第一相機 (: 220 :第二相機 9 0 0 :設備 18' ^ File: TW4563F [Simple description of the diagram] Figure 1 is a cross-sectional view showing a conventional device for detecting the position of a probe in a probe card. Figure 2 is a front elevational view of a device for detecting the position of a probe in a probe card in accordance with an exemplary embodiment of the present invention. Fig. 3 is a partially enlarged view of a portion A in Fig. 2. Figure 4 is a view showing a process for detecting one of the probe positions in a probe card by using the device shown in Figure 2. f'. [Main component symbol description] 100: Target unit 110: Target box 111: Through hole 120: Target block 200: Camera unit 210: First camera (: 220: Second camera 9 0 0: Device 18
Claims (1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020070063575A KR100878213B1 (en) | 2007-06-27 | 2007-06-27 | Probe Card Probe Positioning Device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200900702A true TW200900702A (en) | 2009-01-01 |
| TWI366673B TWI366673B (en) | 2012-06-21 |
Family
ID=40197026
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097113700A TWI366673B (en) | 2007-06-27 | 2008-04-15 | Apparatus for detecting a probe location in a probe card |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR100878213B1 (en) |
| CN (1) | CN101334265A (en) |
| TW (1) | TWI366673B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102386462B1 (en) | 2020-09-02 | 2022-04-15 | (주)티에스이 | Probe card and apparatus for aligning thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2913609B2 (en) * | 1991-03-08 | 1999-06-28 | 東京エレクトロン株式会社 | Probing apparatus, probing method and probe card |
| JP3156192B2 (en) * | 1994-04-19 | 2001-04-16 | 東京エレクトロン株式会社 | Probe method and apparatus |
| JP2004152916A (en) | 2002-10-29 | 2004-05-27 | Nec Corp | Inspecting device and inspecting method of semiconductor device |
| JP2004265895A (en) * | 2003-01-20 | 2004-09-24 | Tokyo Electron Ltd | PROBE DEVICE HAVING OPTICAL LENGTH MEASURER |
-
2007
- 2007-06-27 KR KR1020070063575A patent/KR100878213B1/en active Active
-
2008
- 2008-04-15 TW TW097113700A patent/TWI366673B/en active
- 2008-04-21 CN CNA2008100926796A patent/CN101334265A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20080114224A (en) | 2008-12-31 |
| CN101334265A (en) | 2008-12-31 |
| TWI366673B (en) | 2012-06-21 |
| KR100878213B1 (en) | 2009-01-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101551231B (en) | Calibration method, needle tip position detection device and probe device | |
| TWI431705B (en) | Method for detecting the position of the needle end of the probe, the alignment method, the needle end position detecting device, and the probe device | |
| TWI431703B (en) | A method of detecting the leading position of the probe, and a recording medium and a probe device for recording the method | |
| CN101082636B (en) | Detection method, calibration method and probe device of probe tip | |
| KR100196195B1 (en) | Probe card | |
| JP4495919B2 (en) | Planarization equipment | |
| TW409332B (en) | Method of probing a substrate | |
| JP2963603B2 (en) | Probe device alignment method | |
| JP4997127B2 (en) | Inspection method and program recording medium recording this inspection method | |
| KR100657105B1 (en) | Probing method and probing apparatus | |
| US7733108B2 (en) | Method and arrangement for positioning a probe card | |
| KR950015701A (en) | Probing method and probe device | |
| JP2005072143A (en) | Probe unit | |
| TW200925625A (en) | Registration technique of probe card and recording media with program stored thereon | |
| JP2005079253A (en) | Inspection method and inspection apparatus | |
| JP2018200314A (en) | Substrate inspection apparatus, inspection jig, and relative alignment method thereof | |
| TWI474010B (en) | Prober cleaning block assembly | |
| JP4646271B1 (en) | Semiconductor measuring apparatus and method | |
| US7187164B2 (en) | Apparatus for calibrating a probe station | |
| TW200900702A (en) | Apparatus for detecting a probe location in a probe card | |
| TWI418798B (en) | A semiconductor inspection device and alignment method with alignment function | |
| JP2005228788A (en) | Method for aligning wafer and probe card, probe inspection method and probe inspection apparatus | |
| CN101680929A (en) | Integrated circuit probe card analyzer | |
| JP2019028077A (en) | Substrate inspection device, positioning, and substrate inspection method | |
| JPH04280445A (en) | Probing device and probe card |