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TW200848707A - Prism spectrometer with moveable detector element and with collimated input light - Google Patents

Prism spectrometer with moveable detector element and with collimated input light Download PDF

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Publication number
TW200848707A
TW200848707A TW97106675A TW97106675A TW200848707A TW 200848707 A TW200848707 A TW 200848707A TW 97106675 A TW97106675 A TW 97106675A TW 97106675 A TW97106675 A TW 97106675A TW 200848707 A TW200848707 A TW 200848707A
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Taiwan
Prior art keywords
spectrometer
light
optical
collimated
wavelength
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TW97106675A
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Chinese (zh)
Inventor
Dale A Harrison
Anthony T Hayes
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Metrosol Inc
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Priority claimed from US11/711,592 external-priority patent/US7684037B2/en
Priority claimed from US11/711,908 external-priority patent/US7579601B2/en
Priority claimed from US11/711,482 external-priority patent/US7485869B2/en
Application filed by Metrosol Inc filed Critical Metrosol Inc
Publication of TW200848707A publication Critical patent/TW200848707A/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0208Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/021Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using plane or convex mirrors, parallel phase plates, or particular reflectors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0232Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using shutters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0237Adjustable, e.g. focussing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0256Compact construction
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0262Constructional arrangements for removing stray light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0286Constructional arrangements for compensating for fluctuations caused by temperature, humidity or pressure, or using cooling or temperature stabilization of parts of the device; Controlling the atmosphere inside a spectrometer, e.g. vacuum
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12Generating the spectrum; Monochromators
    • G01J3/14Generating the spectrum; Monochromators using refracting elements, e.g. prisms
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • G01J3/2803Investigating the spectrum using photoelectric array detector
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • G01J3/30Measuring the intensity of spectral lines directly on the spectrum itself
    • G01J3/36Investigating two or more bands of a spectrum by separate detectors

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer.

Description

200848707 九、發明說明: 【發明所屬之技術領域】 本文中所揭示之技術及系統係關於光譜分析之領域。更 具體言之,可在被稱作真空紫外(vuv)之電磁光譜之區中 • 或以下執行的中解析度光譜分析所利用之高效構件。 【先前技術】 已在物質之特性化中採用光譜分析技術達一個多世紀。 k笞些最早的光譜工具採用色散稜鏡來使光波長空間分 ί 離,但絕大多數現代儀器出於此目的利用繞射元件。基於 光柵之系統一般具有高得多之解析能力且其利用已由於用 以製造高品質光柵元件之生產過程及後續複製過程的顯著 發展而變得普遍。 使用在νυν以上(在深紫外、可見或紅外中)或其以下(在 X射線區中)之波長來執行大多數通常利用之光譜技術。在 採用νυν波長之彼等技術中,實際上其全部涉及高解析度 _ 儀錶由於緊溱鬲;度源在此能量空間中一般不可用,故 k 許多此等系統在國家實驗室結合大規模同步輻射源加以使 用。 設計用於在vuv中操作之高效率光譜儀器已被證實為難 以克服的挑戰。標準反射光柵裝飾有一蒸發八丨塗層以增強 其反射率。此方法在自深紫外(DUV)延伸至近紅外(NIR)的 廣泛範圍之波長内適用。然而,對於在中操作而言, 有必要以一MgF2外塗層(〜250 A)保護鋁臈以防止氧化,氧 化可急劇地減小鋁在低於nm之波長下的反射率。 129206.doc 200848707 即使在添加保護塗層的情況下,在νυν中A1(及多數其 他金屬)之法線入射反射率仍顯著減小。因此,νυν單色 光鏡設計傳統上已出於效率原因而併有凹光栅以便消除反 射表面。該等單元件儀器之顯著實例包括基於羅蘭圓 (Rowland circle)及 Seya-Namoika 安裝台的裝置(參見 Masato Koike,Normal-Incidence Monochromators and Spectrometers ? Vacuum Ultraviolet Spectroscopy (J.A.R. Samson及 D.L. Ederer 編),第 n 卷,第 uo 頁。Academic Press,San Diego, 2000)。此等簡單設計之一共同缺點為存 在導致平行於入射狹縫之方向上的強度及空間解析度之損 失的政光。更重要的是,儘管精細刻線之光栅可達成高光 譜解析度,但其νυν效率輪廓一般相當低且常規地展現複 雜波長相依性。 為克服金屬在νυν中之縮減法線入射反射率,在一些情 況下已採用基於掠入射光栅安裝台之光譜分析系統。不幸 的是,該等系統通常針對在大型、高解析度、光束線實驗 中使用而設計且因此併有不適合併入小佔據面積商業儀器 中的光學元件(光柵及鏡面)。舉例而言,該等系統可具有 相對於光柵法線的非常大之入射角。該入射角及非常長之 焦距(大約100 cm)並不適宜於整合於小佔據面積系統中。 在解析度要求適度的情況下,在設計緊凑νυν光譜儀器 中將有益處,其藉由在緊湊光譜儀系統中採用使光分離、 展開或色散成空間分離波長的光學元件來克服上述缺點。 已特別針對科學研究應用設計若干基於稜鏡之VUV單色 129206.doc 200848707 光鏡。參見(例如)H.W· MOOS等人,αΡΡ1· Opt· 9, 601(1970)及 ρ·〇. M〇yssides等人,j M〇d 〇pt 47,i693 (2000)。此等儀器採用安裝於旋轉台上之色散稜鏡,連同 出射狹縫及單元件偵測器一起來提供波長掃描能力。 選擇數目之基於稜鏡之儀器已經設計而結合多元件陣列 偵測器操作,以使得能夠同時收集多個波長。一為海軍研 究實驗室(Naval Research Laboratory)建置之該儀器由L· Rickard 等人描述於 pr〇ceedings 〇f spiE 1937,173(1993) 中。為NASA建置之第二該儀器由J.T· Rayner等人描述 於Publications 〇f the Astronomical Society of the Pacific 115,262 (2003)中。Warren等人在美國專利第5,127,728號 中亦揭不一經設計而與多元件陣列偵測器結合使用之稜鏡 光譜儀。亦在先前技術中,Wang等人在美國專利第 6,744,505號中揭示一用於波長色散元件為稜鏡之一般光譜 應用中的成像光譜儀。 【發明内容】 本文中之揭示内容係關於光譜分析之領域。在一實施例 中,描述一種可在真空紫外(vuv)中執行中解析度光譜分 析所利用的高效構件。在一實施例中,該等技術可用作一 適合與一陣列偵測器結合使用之高通量光譜儀,該高通量 光譜儀用以使VUV中及周圍之波長以產生一大體上平場焦 平面之方式而空間色散。一些實施例利用基於稜鏡之光譜 儀。一些實施例利用可移動及/或可位於該光譜儀内之偵 測元件。在一些實施例中,可提供準直光作為至該光譜儀 129206.doc 200848707 之一輸入。本文中所揭示之各種實施例可單獨地或與本文 中所揭示之其他實施例結合使用。 在一實施例中,提供一種光譜儀。該光譜儀可包括至少 一稜鏡,該至少一稜鏡接收準直光且使該準直光色散為多 個空間分離之光波長,該至少一稜鏡用於一單程(singie pass)組態中。光譜儀可進一步包括:一第一光學器件,其 自該稜鏡接收準直光且使其聚焦至一焦平面上;及一位於 該焦平面處之陣列偵測器,其同時收集該多個空間分離之 光波長。 在另一實施例中,揭示一種反射儀,其用於處理至少包 括深UV波長以下之波長的光波長。該反射儀可包括:一 光源,其產生至少包括深uv波長以下之波長的光波長; 及一光譜儀,其用於接收自該光源產生且自一樣本反射之 光。該光譜儀可包含至少一稜鏡,該至少一稜鏡接收準直 光且使該準直光色散為多個空間分離之光波長。反射儀之 光譜儀可進-步包括:一第一光學器件,丨自該稜鏡接收 準直光且使其聚焦至一焦平面上;及一位於該焦平面處之 陣列偵測裔,其同時收集該多個空間分離之光波長。 亦揭示一種經由光譜分析技術分析光的方法。該方法可 I括·在環丨兄控制腔室内提供處於真空紫外(vuv)波長 耗圍或以下範圍之光;Μ一稜鏡使光色散;及以一偵測器 陣列接收該色散光之多個空間分離之波長。 在又-實施例中,揭示一種光譜儀,纟可包括一入射 口 4入射口經組態以自一在該光譜儀外部之光源接收 129206.doc 200848707 光’該入射口接收準直光。該光譜儀可進—步包括至少一 光學元件,該至少-光學元件在光穿過人射口之後自該光 源接收光,由該至少一光學元件接收之該光係準直的了該 光學元件使該所接收準I光分離成多個空間㈣之光波 長。另外,光譜儀可包括一陣列偵測器,其經定位以同時 收集該多個空間分離之光波長。200848707 IX. INSTRUCTIONS: [Technical Fields of the Invention] The techniques and systems disclosed herein relate to the field of spectral analysis. More specifically, high-efficiency components that can be utilized in mid-resolution spectral analysis performed in or below the region of the electromagnetic spectrum called vacuum ultraviolet (vuv). [Prior Art] Spectral analysis techniques have been used in the characterization of matter for more than a century. Some of the earliest spectral tools used dispersion 稜鏡 to separate the wavelengths of light, but most modern instruments use diffractive elements for this purpose. Grating-based systems generally have much higher resolution and their utilization has become commonplace due to the significant development of the manufacturing process and subsequent replication processes used to fabricate high quality grating elements. Most commonly used spectroscopy techniques are performed using wavelengths above ν υ ν (in deep ultraviolet, visible or infrared) or below (in the X-ray region). In their technology using νυν wavelengths, virtually all of them involve high resolution _ the meter is tight; the source is generally not available in this energy space, so many of these systems combine large-scale synchronization in national laboratories. The source of radiation is used. High efficiency spectroscopy instruments designed for operation in vuvs have proven to be difficult challenges to overcome. The standard reflective grating is decorated with an evaporation goblet coating to enhance its reflectivity. This method is applicable over a wide range of wavelengths from deep ultraviolet (DUV) to near infrared (NIR). However, for operation in the middle, it is necessary to protect the aluminum crucible with a MgF2 top coat (~250 A) to prevent oxidation, which can drastically reduce the reflectance of aluminum at wavelengths below nm. 129206.doc 200848707 Even with the addition of a protective coating, the normal incident reflectance of A1 (and most other metals) in νυν is significantly reduced. Therefore, νυν monochromatic mirror design has traditionally been used for efficiency reasons and has a concave grating to eliminate the reflective surface. Notable examples of such single-element instruments include those based on the Rowland circle and the Seya-Namoika mount (see Masato Koike, Normal-Incidence Monochromators and Spectrometers ? Vacuum Ultraviolet Spectroscopy (JAR Samson and DL Ederer), section n Volume, page uo. Academic Press, San Diego, 2000). One of the common shortcomings of these simple designs is the presence of political light that results in loss of intensity and spatial resolution parallel to the direction of the entrance slit. More importantly, although fine-grained gratings achieve high spectral resolution, their νυν efficiency profiles are generally quite low and conventionally exhibit complex wavelength dependence. In order to overcome the reduced normal incidence reflectivity of the metal in νυν, a spectral analysis system based on a grazing incidence grating mount has been used in some cases. Unfortunately, these systems are typically designed for use in large, high resolution, beamline experiments and therefore have optical components (gratings and mirrors) that are not suitable for incorporation into small footprint commercial instruments. For example, such systems can have very large angles of incidence with respect to the grating normal. This angle of incidence and very long focal length (approximately 100 cm) are not suitable for integration into a small footprint system. In the case of moderate resolution requirements, it would be advantageous to design compact ν ν spectroscopy instruments that overcome the above disadvantages by employing optical elements that separate, expand, or disperse light into spatially separated wavelengths in a compact spectrometer system. A number of VUV-based monochrome 129206.doc 200848707 light mirrors have been designed specifically for scientific research applications. See, for example, H.W. MOOS et al., αΡΡ1· Opt· 9, 601 (1970) and ρ·〇. M〇yssides et al, j M〇d 〇pt 47, i693 (2000). These instruments use a dispersion 安装 mounted on a rotating table, along with an exit slit and a single element detector to provide wavelength scanning capability. A select number of helium based instruments have been designed to operate in conjunction with a multi-element array detector to enable simultaneous collection of multiple wavelengths. The instrument, developed for the Naval Research Laboratory, is described by L. Rickard et al. in pr〇ceedings 〇f spiE 1937, 173 (1993). The second instrument developed for NASA is described by J.T. Rayner et al. in Publications thef the Astronomical Society of the Pacific 115, 262 (2003). Warren et al., U.S. Patent No. 5,127,728, also discloses a spectrometer that is designed to be used in conjunction with a multi-element array detector. An imaging spectrometer for use in general spectral applications where the wavelength dispersive element is 稜鏡 is disclosed in U.S. Patent No. 6,744,505. SUMMARY OF THE INVENTION The disclosure herein relates to the field of spectral analysis. In one embodiment, a high efficiency component that can be utilized in performing mid-resolution spectral analysis in vacuum ultraviolet (vuv) is described. In one embodiment, the techniques can be used as a high throughput spectrometer suitable for use with an array detector for wavelengths in and around the VUV to produce a substantially flat field focal plane. The way it is spatially dispersed. Some embodiments utilize a krypton-based spectrometer. Some embodiments utilize a detection element that is movable and/or can be located within the spectrometer. In some embodiments, collimated light can be provided as input to one of the spectrometers 129206.doc 200848707. The various embodiments disclosed herein can be used alone or in combination with other embodiments disclosed herein. In an embodiment, a spectrometer is provided. The spectrometer can include at least one turn that receives collimated light and disperses the collimated light into a plurality of spatially separated optical wavelengths, the at least one being used in a single pass configuration . The spectrometer may further include: a first optical device that receives collimated light from the crucible and focuses it onto a focal plane; and an array detector at the focal plane that simultaneously collects the plurality of spaces The wavelength of the separated light. In another embodiment, a reflectometer is disclosed for processing wavelengths of light comprising at least wavelengths below the deep UV wavelength. The reflectometer can include: a light source that produces a wavelength of light comprising at least a wavelength below a deep uv wavelength; and a spectrometer for receiving light generated from the source and reflected from the same. The spectrometer can include at least one turn that receives collimated light and disperses the collimated light into a plurality of spatially separated light wavelengths. The spectrometer of the reflectometer can further include: a first optical device from which the collimated light is received and focused onto a focal plane; and an array of detected artifacts at the focal plane The plurality of spatially separated light wavelengths are collected. A method of analyzing light via spectral analysis techniques is also disclosed. The method can include: providing light in a range of vacuum ultraviolet (vuv) wavelength or below in the ring control chamber; illuminating the light; and receiving the dispersion light in a detector array The wavelength of the spatial separation. In yet another embodiment, a spectrometer is disclosed that can include an entrance port 4 that is configured to receive light from a source external to the spectrometer 129206.doc 200848707 Lights that receive collimated light. The spectrometer can further include at least one optical component that receives light from the light source after it passes through the human ejection orifice, the light system received by the at least one optical component collimating the optical component The received quasi-I light is separated into light wavelengths of a plurality of spaces (four). Additionally, the spectrometer can include an array of detectors positioned to simultaneously collect the plurality of spatially separated wavelengths of light.

在另一實施例中,提供-種光譜儀。此光譜儀可包括一 準直光人射孔,該準直光人射孔接收提供至光譜儀之輸入 準直光以為光譜儀内之一光路提供光,該輸入準直光包括 深uv光波長以下之波長。光譜儀可進—步包括:一光學 元件’其在該光路内展開光;及一偵測器,其接收該展; 提供另-種方法,其用於改良—光譜儀與—提供輸入光 至該光譜儀之光學系、統之間的對準容限。此方法可包含: 將^譜儀耦接至該光學系統;及將準直光自光學系統作為 光邊儀輸入光提供至光譜儀以便提供該準I光之光路與光 譜儀之間的較大對準容限。 〃 I、在再-實施例中,提供—種光譜儀。該光譜儀可包括至 少I光學元件,該至少一光學元件接收光且使該光分離以 使侍光之不同波長得以空間分離。光譜儀可進一步包括一In another embodiment, a spectrometer is provided. The spectrometer can include a collimated light perforation that receives input collimated light provided to the spectrometer to provide light to one of the optical paths of the spectrometer, the input collimated light comprising wavelengths below the wavelength of the deep uv light . The spectrometer can further include: an optical component 'which emits light in the optical path; and a detector that receives the display; and another method for improving the spectrometer and providing input light to the spectrometer The alignment tolerance between the optical system and the system. The method can include: coupling a spectrometer to the optical system; and providing collimated light from the optical system as an edge meter input light to the spectrometer to provide greater alignment between the quasi-I-light path and the spectrometer Tolerance. 〃 I. In a further embodiment, a spectrometer is provided. The spectrometer can include at least one optical component that receives light and separates the light to spatially separate the different wavelengths of the whisk. The spectrometer can further include a

貞測H ’該陣㈣測器在—受控環境内且位於該等不 2:間刀離之光波長之一焦平面處以便偵測不同空間分離 之光波長,該陣列偵測器係可調整的以有助於陣 相對於該焦平面之對帛。 I 129206.doc 200848707 又一實施例亦係關於一種光譜儀。該光譜儀可包括· 光路’其包括至少一光學元件;及一可調整陣列谓測器, 其位於該光路之一焦平面處。該可調整陣列债測器可位於 光路中之一在該至少一光學元件之後之點處,可調整陣列 偵測器偵測提供於該焦平面處之光。陣列偵測器可進一 + 可調整以有助於陣列偵測器相對於焦平面之對準。光★並儀 亦可包括一封閉體,其在光譜儀内,該封閉體完全環繞可 調整陣列偵測器。 在另一實施例中,提供一種光譜儀,其用於處理包括深 UV波長以下之波長的光波長。該光譜儀可包括至少一光 學元件,該至少一光學元件接收包括深uv波長以下之波 長的光,該光學元件將該光展開為多個空間分離之光波 長。光瑨儀可進一步包括一可調整陣列偵測器,該可調整 陣列偵測器接收該多個空間分離之光波長,該可調整陣列 偵測器係可移動的以使得可調整陣列偵測器可相對於多個 二間分離之光波長對準。 在又一方法實施例中,揭示一種操作一光譜儀以使得一 陣列偵測器可相對於該光譜儀内之一光路對準的方法。該 方法可包含在光譜儀内提供一内部空間,該光路至少部分 地在該内部空間内。内部空間可充分經環境控制以允許至 少部分地包括深UV波長以下之波長的光波長之透射及偵 測。方法可進一步包括調整該陣列偵測器相對於該光路之 位置,其中光路之位置之調整不會更改空間之一體積。 在查閱以下描述及相關聯之圖式之後可實現對本發明之 129206.doc 200848707 優勢之本質的進一步理解。 【實施方式】 明附圖式進行的以下描述來獲取對本發 字指示相_徵。^ = 圖相同參考數 發明之例…應注意的是’隨附圖式僅說明本 本發明可承認其他同等有效之實施例。 口為 為增強光學計量設備對於挑戰性應用之敏感性,需要延 伸執订4等量測之波長範圍。具體言之,利用延伸至且延 伸超^ ^稱作真空紫外(v u v)之電磁光譜之區的較短波長 (較同此里)光子係有利的。真空紫外(vuv)波長一般被認 為係小於深紫外(DUV)波長(亦即,小於約190 nm)之波 長。儘官不存在vuv範圍之底端的通用截止,但在該領域 中一些人可認為VUV終止且遠紫外(EUV)範圍開始(例如, 一些人可將小於100 nm之波長界定為EUV)。儘管本文中 所述之原理可適用於1〇〇 nm以上之波長,但該等原理一般 亦了適用於1〇〇 nm以下之波長。因此,如本文中所使用, 將認識到,術語VUV意謂指示一般小於約19〇 nm之波長, 然而,VUV並不意謂排除較低波長。因此,如本文中所 述’ VUV —般意謂涵蓋一般小於約190 nm之波長,而不排 除低端波長。此外,低端VUV可一般被看作約14〇 nm以下 之波長。 大體而言,在真空紫外中需要避免複雜光學系統,因為 有效反射器及合適之複合透鏡(能夠使VUV波長透射)通常 129206.doc 12 200848707贞 H ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' Adjusted to help the confrontation of the array relative to the focal plane. I 129206.doc 200848707 Yet another embodiment is also directed to a spectrometer. The spectrometer can include an optical path that includes at least one optical component; and an adjustable array predictor that is located at one of the focal planes of the optical path. The adjustable array detector can be located at a point in the optical path behind the at least one optical component, and the adjustable array detector detects light provided at the focal plane. The array detector can be adjusted to help the alignment of the array detector relative to the focal plane. The lighter can also include an enclosure within the spectrometer that completely surrounds the adjustable array detector. In another embodiment, a spectrometer is provided for processing wavelengths of light comprising wavelengths below the deep UV wavelength. The spectrometer can include at least one optical component that receives light comprising a wavelength below a deep uv wavelength that expands the light into a plurality of spatially separated light wavelengths. The light detector may further include an adjustable array detector that receives the plurality of spatially separated light wavelengths, the adjustable array detector being movable to enable the adjustable array detector It can be aligned with respect to a plurality of two separated wavelengths of light. In yet another method embodiment, a method of operating a spectrometer to align an array detector with respect to an optical path within the spectrometer is disclosed. The method can include providing an interior space within the spectrometer, the light path being at least partially within the interior space. The interior space can be sufficiently environmentally controlled to allow transmission and detection of light wavelengths at least partially including wavelengths below the deep UV wavelength. The method can further include adjusting a position of the array detector relative to the optical path, wherein the adjustment of the position of the optical path does not change a volume of the space. A further understanding of the nature of the advantages of the 129206.doc 200848707 of the present invention can be achieved upon review of the following description and associated drawings. [Embodiment] The following description of the drawings is made to obtain an indication of the present invention. 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 In order to enhance the sensitivity of optical metrology equipment to challenging applications, it is necessary to extend the wavelength range of the four measurements. In particular, it is advantageous to use a shorter wavelength (more similar) photonic system extending to and extending beyond the region of the electromagnetic spectrum called vacuum ultraviolet (v u v). The vacuum ultraviolet (vuv) wavelength is generally considered to be less than the wavelength of the deep ultraviolet (DUV) wavelength (i.e., less than about 190 nm). There is no universal cutoff at the bottom of the vuv range, but some in this field can be considered VUV terminated and the extreme ultraviolet (EUV) range begins (for example, some people can define wavelengths less than 100 nm as EUV). Although the principles described herein are applicable to wavelengths above 1 〇〇 nm, these principles are generally applicable to wavelengths below 1 〇〇 nm. Thus, as used herein, it will be recognized that the term VUV means indicating a wavelength generally less than about 19 〇 nm, however, VUV is not meant to exclude lower wavelengths. Thus, as used herein, "VUV" generally means wavelengths generally less than about 190 nm, without excluding low end wavelengths. In addition, low-end VUV can generally be viewed as wavelengths below about 14 〇 nm. In general, complex optical systems need to be avoided in vacuum UV because effective reflectors and suitable compound lenses (which can transmit VUV wavelengths) are usually 129206.doc 12 200848707

係不可用的。此外,光學表面易於逐漸形成薄污染層,該 薄污染層之特徵在於高νυν吸收截面,其可能使光學表面 在此等波長下之效能顯著降級。結果,應監視(且必要時 清潔)νυν儀器中之光學表面以確保穩定及可靠效能。一 用於達成此目的之構件揭示於2006年11月16曰申請之美國 申明案第1 1/600,414號中,該案之揭示内容明確地以引用 的方式併入本文中。因此,可能需要採用簡單光學設計 (具有最小數目之表面)以便在於此光譜區中操作時維持高 光學通量(與使用雙程稜鏡組態相對)。 另外,在一態樣中提供一適合結合一多元件偵測器使用 之簡單的基於稜鏡之VUV光譜儀將係有益的,該νυν光譜 儀能夠以#由再現-大體上平場焦平面而有助於波長之同 時收集的方式使波長空間分離。 在序多光谱應用中,所關注之特徵之線寬在光譜量測範 圍内保持怪定。亦g卩,量測之解析度要求作為波長之函數 保持怪疋。因@,光譜儀經常經設計以便傳遞展現線性空 間色散性質(亦即,1 Φ、士 〃中波長隨偵測器平面中之位置之變 化本質上係線性的)輪 J 先譜。百先,基於光柵之儀器 在很大程度上實現此曰辨 員兄此目^。在基於稜鏡之儀器的情況下 (其中空間色着支性暫 ^ 在價測器平面中經常非線性地改變),Not available. In addition, the optical surface tends to gradually form a thin contaminated layer characterized by a high ν ν absorbing cross section which may significantly degrade the performance of the optical surface at these wavelengths. As a result, the optical surface in the νυν instrument should be monitored (and cleaned if necessary) to ensure stable and reliable performance. A means for achieving this is disclosed in U.S. Patent Application Serial No. 1 1/600,414, the entire disclosure of which is incorporated herein by reference. Therefore, a simple optical design (with a minimum number of surfaces) may be required to maintain high optical flux when operating in this spectral region (as opposed to using a two-pass configuration). In addition, it would be beneficial to provide a simple 稜鏡-based VUV spectrometer suitable for use in conjunction with a multi-element detector that can be assisted by a reproducible-substantially flat field focal plane in one aspect. The manner of collecting at the same time as the wavelength separates the wavelength space. In sequential multispectral applications, the linewidth of the feature of interest remains within the spectral measurement range. Also, the resolution of the measurement is required as a function of wavelength to keep the quirks. Because of @, spectrometers are often designed to deliver a linear J-precursor that exhibits linear spatial dispersion properties (i.e., 1 Φ, the wavelength of the girth varies linearly with the position in the detector plane). Hundreds of first, grating-based instruments have largely achieved this. In the case of 稜鏡-based instruments (where spatial color persistence is often nonlinearly changed in the plane of the detector),

矣工系才木用棱鏡雙^ P 透鏡(包含由不同材料建構之兩個稜鏡) 以致力於改良線性度。 然而,對於νυν中之某此 要求可作為波長之函數變化 光譜應用而言,量測之解析度 。舉例而言,與薄半透明膜相 129206.doc 200848707 關聯之反射比及/或透射比光譜可展現週期隨著波長相當 急劇地減小之干涉條紋。此行為係膜在較短波長下折射率 增加之結果’導致橫過膜之光子所經受之光徑長度的相應 增加。由於已知許多常見材料之折射率以類似方式表現, 故由此得出結論·在設計一輸出光譜展現比習知儀器之空 間色散性質更緊湊地匹配應用之解析度要求的空間色散性 質之νυν光譜儀中存在益處。 在圖1中呈現一如先前技術中已知之典型VUV光柵攝譜 儀。基於羅蘭圓(Rowland circle)安裝台之此簡單儀器採用 一凹光柵101。該光栅經由來自一入射狹縫丨〇5之光丨〇2照 明,該光經繞射且聚焦至一彎曲焦面上以產生一光譜 103。該入射狹縫與該繞射光譜均位於羅蘭圓1〇4上。當結 合一出射狹縫、單元件偵測器及光栅旋轉機構加以採用 時,該系統能夠達成非常高之光譜解析度。然而,由於彎 曲焦平面,此設計並不適宜於需要同時收集多個波長之應 用。 先前技術νυν絲光譜儀之另一缺點係關於其不良光學 通量。光栅使光繞射成多個階數,藉此減小在任何給定波 長下到達偵測器之光之強度。用於法線人射安裝台之可構 得之νυν光柵通常展現可作為波長之函數顯著地變化之非 常低之光學效率(在120nm下,小於5%)。 基=像差校正之光柵之掠入射vuv光譜儀常規地用於光 束線只驗中。_多此等儀器能夠產生平焦場以適應多通道 偵測器。不幸的是,此等儀器幾乎專門地料有長焦距, 129206.doc -14- 200848707 從而排除將其整合至緊湊量測系統設計中。 一般而言,用於緊湊vuv光譜儀中之高效率、中解析度 繞射光柵通常係不可用^。由此得出結論:在設計一基於 一在此光譜區或較低波長中提供較高效率的色散元件之 νυν光譜儀中將存在益處。該儀器將提供較平坦效率輪廓 且將避免與基於光柵之系統相關聯的階數選擇問題。 在圖2中壬現一如先前技術中已知之典型色散稜鏡單色 光鏡。除提供比其基於光柵之對應儀器更高、更均一之光 子效率之外,該儀器可呈現避免固有地與使用繞射光栅相 關聯的光譜污染問題之另一優點。在操作中,光2〇〇穿過 一入射狹縫202,且由一第一透鏡2〇4使光2〇〇準直。準直 光束206接著穿過一色散稜鏡2〇8,該色散稜鏡2〇8用於使 入射光束中之組成波長分離。個別波長以包含稜鏡之材料 之折射率之波長相依性所確定的輕微不同之角度射出稜鏡 2〇8。射出稜鏡之光由一第二透鏡21〇收集,該第二透鏡 210用於將射出稜鏡之光聚焦至一偵測器212上。儘管未明 白地展示於圖中,但儀器之焦平面亦係彎曲的,藉此限制 系統在待同時記錄多個波長之應用中的有用性。 圖2之系統之另一缺點係關於其使用透鏡來使傳遞至色 散稜鏡之光準直且聚焦自色散稜鏡接收之光。單元件透鏡 固有地在光學系統中引入色像差,其可能限制效能。在較 長波長下,可購得之複合透鏡係廣泛可用的且可用以最小 化此等效應。不幸的是,此等高度校正之元件不能用於 VUV中,因為其並不使短波長光子透射。因此,一般採用 129206.doc 15 200848707 基於鏡面而非透鏡之反射光學設計。 νυν中之光學設計考慮因天然形成於實際上所有光學表 面上的薄污染層而進一步複雜化。此等污染物在中可 月b為回度吸收的且可能對光學通量具有較大影響。νυν中 與夕數反射裔所展現之減小之效率結合的此現象使採用最 小數目之光學表面的系統設計成為必需。結果,成功地用 於較長波長下之複合光學配置不能簡單地加以修改以用於 νυν中。因而,基於雙程組態之稜鏡光譜儀有時不適合用 於νυν中。如以下更詳細所述,在圖3中提供一利用一單 程稜鏡組態之光譜儀。在該組態中,與光兩次或兩次以上 牙過棱鏡之主體的多程組態相對,光單程地穿過稜鏡之主 體。因此,如圖3中所示,光自稜鏡之一入射表面傳遞至 稜鏡之一出射表面,而不多程地穿過稜鏡。 νυν輪射被氧與濕氣強力吸收。由此得出結論:該等物 貝之激度須維持於充分低之位準以便許可νυν或較低波長 在νυν光學儀器中之透射。此可藉由與一容納系統之光學 元件的氣密機殼結合採用真空、淨化或回填方法之某一組 百而貝現。在利用淨化或回填技術的情況下,可使用如氮 氣、氬氣或氦氣之高純度不吸收(至少在所關注之波長區 内)之氣體。 在圖3中呈現一克服先前技術設計之缺點且適合於在 VUV中操作的高效、緊湊光譜儀300之示意表示。圖3之光 "曰儀在一緊湊光譜儀系統中採用一使光分離、展開或色散 成空間分離波長的光學元件。如圖3中所示,使光分離、 129206.doc -16- 200848707 展開或色散成多個空間分離波長的該光學元件係一棱鏡 3 1 0。儘管在圖3中利用稜鏡色散效應,但將看出,關於本 文中所提供之其他實施例,亦可藉由利用一繞射光栅之繞 射性質來實現使光分離、展開或色散成多個空間分離波 長。 如圖3中很顯然,大多數系統組件容納於一環境控制腔 室302中。光經由一入射孔304耦合至儀器中。孔3〇4可在 真空相容總成306_凹入,其有助於以氣密方式將光譜 儀耦接至另一環境控制體。儘管原則上可經由該入射孔總 成父換氣體,但腔室亦可裝備有一專用氣體處置界面 以有助於此活動。氣體處置界面3〇7亦提供一用於以及時 方式排空及/或回填受控環境的有效機構。若需要在不吸 收之淨化氣體之連續流動下的操作,則腔室亦可裝備有一 可選淨化閥(未圖示)。 由一反射光學器件3 〇 8收集進入儀器之光且使該光準 直。準直光學器件308限制儀器之f數或光學速度且與聚焦 光學器件312結合工作以界定工具之解析度。在儀器之一 實施例中,準直光學器件係-經最佳化以在VUV中操作的 具有MgF2/A1外塗層之離軸拋物線反射器。在本發明之一 特別有用之實施例中,準直光學器件3〇8係一經設計以使 件離軸角或轉向角為9〇。的快速(f/2)離軸拋物線鏡面。該 組態簡化光譜儀與一外部光學系統之耦接,因為入射孔與 色散稜鏡之間的實體間距相對於較小角組態而增加。此考 慮在採用快速(亦~,低f數)光學設計之情況下可能係重要 129206.doc 200848707 的。 來自準直光學器件·之光入射於色散棱鏡3ι〇之正面 上。稜鏡材料可經選擇以使得其使vuv光子透射。特別適 合之材料係LiF,因為其展現最短透射截止波長中之一= 且並非雙折射。具有較長透射截止波長的替代稜鏡材料可 包括MgF2、CaF2、响、叫、—、推氟溶融二氧化 石夕、炼融二氧化矽、石英或其他材料。 穿過稜鏡310之光發生偏斜。偏斜角係波長之函數且視 稜鏡之幾何形狀、入射角及稜鏡材料之折射率而定。以此 方式,使不同波長之光以不同角度射出稜鏡。儘管存在與 色散稜鏡之使用相關聯的反射及透射損失,但此等元件特 別在νυν中經常比繞射光柵更有光效率。另外,稜鏡比光 栅具有顯著小之表面積,使得產线小之散射及較低雜散 光此特性在散射截面經常顯著增加之真空紫外波長下可 特別重要。 射出稜鏡之光由一聚焦光學器件312收集且聚焦至偵測 為3 14上。在一實施例中,該聚焦光學器件亦係一經最佳 化以在VUV中操作的具有MgFVAl外塗層之離軸拋物線反 射為°在一實施例中,離軸拋物線鏡面可經設計以使得離 轴角或轉向角為大約6(Γ。儘管較小離軸角之使用可改良 成像效能’但其亦可能使偵測器整合複雜化,因為偵測元 件與色散稜鏡之間的實體間距得以減小。 在一實施例中,聚焦光學器件3 12經選擇且經組態以使 得^貞’則為焦平面位於光譜儀外殼之邊界外側以便有助於與 129206.doc 200848707 可購得之债測系統的簡單整合。該摘測系統(亦即,偵、、列 元件及控制電子器件)一般連接至接收所量測光譜之電腦 (未圖示)。 儘官可結合儀器使用任何數目之vuv敏感偵測器,但提 供νυν光子之有㈣測同時提供廣泛動態範圍的陣列偵測 器係較佳的。在此方面,背面薄化、背面照明之CCD侦測 器係特別適合的。亦可使用塗碟正面照明之電荷輕合裝置 f (CCD);然而,塗層(用以向下轉化將通常在多晶矽閘極區 中被吸收的較高能量光子)使裝置之效率降低至少二分之 。或者,亦可與習知較長波長偵測器結合使用微通道板 (MCP) 〇 "為幫助致能νυν中之操作,f要將㈣元件安I於無如 氧及水之吸收物質的環境中。此可易於藉由安裝谓測器以 使得如圖4中所描緣’其形成制元件或陣列402之作用表 面與νυν光譜儀之體共用一共同環境而實現。如圖中所說 明,偵測H3U經由一密封機構4〇4形成針對光譜儀腔室之 外側表面406的氣密連接。以此方式,至少谓測器之侦測 7G件或陣列402滞留於光譜儀之共用體内側且經由一真空 饋通插座連接至其相關聯之控制電路(位於共用體外側)。 對脫氣及污染之關注—般阻止將控制電路安裝於受控環境 内側。 兄 在一替代實施例中,彳貞測器可安裝於-獨立受控環境中 以使得如圖5中所示,谓測元件或陣列402經由-保護性 VUV透射窗5〇2與光譜儀體界面接合。在採用谓測器冷卻 129206.doc -19- 200848707 之情況下,額外窗可提供 無意曝露的保護。不幸的曰“ “貞測器的對濕氣之 反射引起的重像效應。在某些組態中,該等重 非常顯著,因為較長μ像效應可成 長下之強信號可能自偵測器之表面 反=射離開窗之背側且在對應於較短波長之位置處 ^果中對應強度可能低得多)再次撞擊偵測器,其導致錯誤 如以上所述,圖3至圖5之本%成a ㈡之先瑨儀使偵測器314固定地安 衣至光譜儀之外壁。在 在4、、且恶令,可需要偵測器3 14與光 路之精確對準。為了提供偵 λ 诙扒1貝,則态之對準的更大簡易性,可 ^需要使偵測n相對於光路可移動。在—例示性實施例 可移動地安裝痛測元件或陣列以使得可相對於光路調 整偵測元件(諸如偵測器陣列)。 用於可移動地安裝偵測元件之實施例可包含以可移動 方式將偵測兀件安裝於光譜儀之體内。可能需要以使偵測 兀件與❹j器之至少_些其他組件分離的方式提供該安 裝。舉例而言,諸如電子電路及板之一些偵測組件可能並 不真空相纟。另外,儘管偵測元件可相對較小,但可購得 、貞別σσ之其他組件經常相對較大。較大型組件可能引起 硬雜性,因為在利用較小人射角時該等組件可能阻斷光路 之其他部分。 圖6呈現一例示性組態,其中偵測元件6〇2内部地安裝於 ^ i兄控制腔室302内。如圖中很顯然,偵測元件6〇2經由使 用一真空相容電纜總成604及電饋通組態而與其相關聯之 129206.doc -20- 200848707 拴制黾子态件606實體分離(注音 %、,偵測元件602及控制電 子卯件606不一定按比例繪勢 一 I且經㊉偵測電子器件比偵測 凡件相對大)。偵測元件6〇2 了女I於一調整機構上以便有 助於與聚焦光學器件之焦平 ^ t , 卸的精確對準。使偵測元件安 衣口與光譜儀外殼之側壁分離 土刀離’從而很大程度上簡化儀器 對準過miiu-益處在於其允許_元件與色散 棱鏡近得多地定位’藉此減小聚焦光學器件之離軸角。,士 果’可達成改良得多之成像性質。因此,如圖6中所示, 提供-位置可調整债測元件。另夕卜,該位置可調整伯測元 件與至少一些其他偵測元件分離。 制元件㈣、相關聯之控制電子器件6〇6及真空相容電 ㈣成_可以廣泛範圍之方式自廣泛範圍之零件建構。 f-例示性實施例中,—來自日本Ham_su的無窗背面 薄化之CCD區域影像感測器(型號S7請)可用於積測元件 602。该偵測器具有24 576 _⑻χ j 392 _⑺之尺寸且 具有1024(H) X 58(V)個像素。Ha_atsu製造廣泛種類其 他合適之偵測ϋ。UK之E2V亦製造類似偵測器產品,且可 自其他供應商獲得其他㈣器、例如可將影像感測器插入 -由諸如聚_醚酮(Ρ祖)之真空相容材料建構的插座。該 插座可固持於一運動光學器件安裝台中,該運動光學器件 戈· S 〇致肖b平移與傾斜之調整。插座上之插腳可連接至真 空相容電境總成604。電繞中之導體可(例如)以鑛銀銅線建 構。絕緣材料可為經塗覆且經熱處理以最小化截留氣體的 不收縮FEP擠壓之鐵氟龍。電纜總成6〇4接著連接至一真空 I29206.doc 200848707 相容電饋通,該真空相容電饋通為電纜中之線中之每一者 提供外部(亦即,受控機殼外側)連接。外側上之連接佈線 (經由屏蔽電纜)至控制電子器件6〇6之電子器件。控制電子 為件606之組件(感測器前置放大器、前端電子器件、界面 電子為件等)可購自包括(例如)德國tec5 AG之多個供應 商。合適之控制電子器件亦由UK2 Spectr〇nic Devi Js Ltd·及其他供應商製造。 可藉由以一像差校正之定製環形光學器件替換離軸聚焦 光學器件來進一步改良儀器之成像效能。此可引起偵測器 平面之垂直方向上(亦即,沿偵測器之高度)的改良之成像 效能,藉此使得能夠採用具有較小高度之偵測器而不折衷 信號收集效率。 亦可、、π合νυν光柵光譜儀設計實現與内部偵測器安裝相 關聯之益處。如圖7中所說明,一像差校正之平場成像光 柵兀件7G2可與-人射孔及内部安裝之侧元件術結合以 產生一緊凑VUV光譜儀7〇〇。類似於圖ό,偵測元件602經 由使用真空相容電纜總成604耦接至其相關聯之控制電 子$件606。可預期此儀器由於其改良之成像效能及精確 地對準彳貞測元件之能力而效能上優於習知光柵光譜儀。儘 吕可此不預期該儀器提供自其稜鏡對應物可達成之通量, 仁在使用稜鏡儀器可達成之最低透射波長以下的波長下操 作可係有利的。注意、,關於圖7,可利用—具有相對於光 二法線近似法線人射角之光的基於光栅之系統。舉例而 口可利用大約小於3〇度且更佳地小於20度之入射角。隔 129206.doc -22- 200848707 離偵測器之使用允許偵測元件602即使在該等近似法線角 的情況下使用時亦置放於光譜儀之體内,因為較小偵測元 件602並不與自孔304至光拇702之光之透射界面接合。因 此,在一實施例中,一為大約10度之入射角可用於圖7之 儀器中。 在圖8中呈現以類似於圖6中所描繪之系統之系統可達成 的代表性效肖b之一實例’其中對於在自12〇 nm至220 nm之 範圍内的10個離散波長(對應於12〇 nm之曲線802、對應於 130 nm之曲線804、對應於140 nm之曲線806、對應於150 nm之曲線808、對應於160 nm之曲線8丨〇、對應於pi) nm 之曲線812、對應於180 nm之曲線814、對應於丨⑽nm之曲 線816、對應於200 nm之曲線818、對應於22〇 之曲線 820)壬現作為沿偵測器之寬度之位置之函數的積分輻照 ^執行作為偵測裔南度(亦即,在垂直於波長空間分離 之方向的方向上)之函數之積分。如自圖很顯然,與個別 波長相關聯之峰值在偵測器之寬度上得以良好地解析。與 平方U米入射孔結合使用一具有4〇 mm之寬度及6 7 门度的偵测裔來達成圖中之結果。對於熟習此項技 術者而。將清楚’本發明之替代實施例可經組態以便有助 :與其他偵測器幾何形狀整合。舉例而言,其他實施例可 採用具有長度在白 、 w 小至1 mm至長達1 cm之範圍内的寬度之 價測裔。如所描b ' π徒及,亦可利用其他幾何形狀,且許多合適 司。列读'則盗可購自如英國e2V及日本Hamamatsu的公 129206.doc -23- 200848707 為幫助確保獲得準確結果’可能需要最小化所謂的”雜 散光"效應。在一般意義上,雜散光可為在一特定位置(亦 即,其又與一特定波長相關聯)處衝擊偵測器的不具有該 特定波長之光。通常,此光係多色的且由散射過程產生。 減少雜散光之習知方法為在儀器内之明斷的位置中插入光 隔板(亦即,光束擋板)以防止散射光到達偵測器。儘管未 明白地展示於此揭示案之示意表示中,但假定可將合適之 隔板併入所述實施例。熟習此項技術者所熟知,經由使用 可購得之射線追蹤套裝軟體來很大程度上輔助確定最適光 束擋板置放。 儘管本文中所述之一些實施例提供一適合結合一用於在 多個波長下之同時收集資料之多元件偵測器使用而能夠再 現一平場影像平面之VUV光譜儀,但熟習此項技術者將認 識到’此儀器可有利地用於其他應用中。舉例而言,若以 出射狹縫及適當之密封機構替換陣列偵測器,則本文中 所述之儀器亦可用作一有效VUV前置單色光鏡。又,若儀 器進一步經修改以使得稜鏡安裝於一旋轉台上且含有出射 狹縫之始、封機構裝備有一 VUV敏感單元件偵測器(如一光 電L礼管)’則儀器可有利地用作一掃描單色光鏡。在圖9 中k供此替代實施例之一實例。因此,例如,如圖9中所 不,一掃描單色光鏡9〇〇具備一有些類似於關於圖3之光譜 儀所述之結構的結構,然而,一稜鏡904安裝於一旋轉台 902上。另外,一單元件偵測器9〇6提供於一出射狹縫9〇8 處。 1292〇6.do, -24· 200848707 在又一實施例中,光譜儀1 〇〇〇可再次類似於圖3之光譜 儀300,不同之處在於經修改以使得移除圖3之入射狹縫 304及準直光學器件308。以此方式,儀器將易於適宜於與 現有光學系統整合,其限制條件為該等系統向儀器呈現一 準直輸入光束。在圖1 〇中呈現此組態之一實例。如圖丨〇中 所示,提供一經組態以接收一準直輸入光束1004之光入口 1002。如所示,接著將準直輸入光束1〇〇4提供至稜鏡 310 〇 如圖中所描繪,光經由一以氣密方式將儀器連接至一現 有光學系統的真空配件1006進入光譜儀1〇〇〇。進入光譜儀 之準直光1004由稜鏡310色散且由聚焦光學器件312收集並 聚焦至偵測為陣列3 14上。由於輸入光束之準直性質,光 譜儀與現有光學系統之對準比圖3或圖6之實施例中的對準 顯著寬谷。此係因為光譜儀與其輸入光束源之間的小平移 對準誤差使用圖10之組態將產生可忽略的信號損失,而在 需要將聚;t輸人光束精確地對準至一小人射孔上的圖3或 圖6之系統中可能產生顯著的信號損失。因此,光譜儀與 外部光源之間的對準容限要求將得以減輕。此允許光譜儀 更易於與一光學計量工具之其他組件整合。 在提供與一現有光學系統之對準之簡易性的又一實施例 中,圖10之光譜儀亦可裝備有一聚焦光學器件及入射孔。 在圖11中描繪此實施例之一實例。此組態比圖1〇之儀器提 供儀态之更大的解析度控制及聚光能力,圖10之儀器依光 譜儀耦接所至之光學系統的特性而界定此等性質。的又 129206.doc -25- 200848707 進入圖11之儀器1100的準直光1004類似於如圖10中所示 經由一將光譜儀連接至一現有光學系統的真空耦接件1006 如此進行。光由一第一聚焦光學器件11〇2聚焦至一入射孔 11 04上。在儀器11〇〇之一實施例中,第一聚焦光學器件係 一經最佳化以在VUV中操作的具有MgFVA1外塗層之離軸 抛物線反射器。穿過入射孔1 1 〇 4之光由一準直光學器件 308收木、準直且朝向色散稜鏡31〇導向。由棱鏡31〇色散The faculty is a prismatic double-P lens (containing two 稜鏡 constructed of different materials) to improve linearity. However, for some of the requirements in νυν can be used as a function of wavelength for spectral applications, the resolution of the measurement. For example, the reflectance and/or transmittance spectra associated with the thin translucent film phase 129206.doc 200848707 can exhibit interference fringes in which the period decreases drastically with wavelength. This behavior is the result of an increase in the refractive index of the film at shorter wavelengths' resulting in a corresponding increase in the length of the optical path experienced by the photons across the film. Since the refractive indices of many common materials are known to behave in a similar manner, it is concluded that the design of an output spectrum exhibits a spatially dispersive property that is more compactly matched to the resolution requirements of the application than the spatial dispersion properties of conventional instruments. There are benefits in the spectrometer. A typical VUV grating spectrograph as known in the prior art is presented in FIG. This simple instrument based on the Rowland circle mount employs a concave grating 101. The grating is illuminated by a stop 2 from an entrance slit 丨〇5 which is diffracted and focused onto a curved focal plane to produce a spectrum 103. The incident slit and the diffraction spectrum are both located on the Roland circle 1〇4. When combined with an exit slit, a single element detector, and a grating rotating mechanism, the system achieves very high spectral resolution. However, due to the curved focal plane, this design is not suitable for applications that require multiple wavelengths to be collected simultaneously. Another disadvantage of prior art νυν filament spectrometers relates to their poor optical flux. The grating diffracts light into multiple orders, thereby reducing the intensity of light reaching the detector at any given wavelength. Configurable νυν gratings for normal human firing mounts typically exhibit very low optical efficiencies (less than 5% at 120 nm) that can vary significantly as a function of wavelength. A grazing incidence vuv spectrometer with a base = aberration corrected grating is conventionally used in beam line only. _ Many of these instruments are capable of producing a flat focal field to accommodate multi-channel detectors. Unfortunately, these instruments are almost exclusively designed with a long focal length, 129206.doc -14- 200848707, thus eliminating the need to integrate them into a compact measurement system design. In general, high efficiency, medium resolution diffraction gratings used in compact vuv spectrometers are generally not available. It follows that there will be benefits in designing a νυν spectrometer based on a dispersive element that provides higher efficiency in this spectral region or in lower wavelengths. The instrument will provide a flatter efficiency profile and will avoid the order selection problem associated with grating based systems. A typical dispersion chirped monochromator as known in the prior art is shown in FIG. In addition to providing a higher, more uniform photon efficiency than its grating-based counterpart, the instrument can present another advantage that avoids the spectral contamination problems inherently associated with the use of diffraction gratings. In operation, light 2 passes through an entrance slit 202 and is collimated by a first lens 2〇4. The collimated beam 206 then passes through a dispersion 稜鏡2〇8 which is used to separate the constituent wavelengths in the incident beam. The individual wavelengths exit 稜鏡 2〇8 at slightly different angles determined by the wavelength dependence of the refractive index of the material containing germanium. The light emitted from the pupil is collected by a second lens 21, which is used to focus the light emitted from the pupil onto a detector 212. Although not explicitly shown in the figure, the focal plane of the instrument is also curved, thereby limiting the usefulness of the system in applications where multiple wavelengths are to be recorded simultaneously. Another disadvantage of the system of Figure 2 is that it uses a lens to collimate the light transmitted to the dispersion pupil and focus on the light received by the dispersion. Single element lenses inherently introduce chromatic aberrations in the optical system, which may limit performance. At longer wavelengths, commercially available composite lens systems are widely available and can be used to minimize these effects. Unfortunately, such highly calibrated components cannot be used in VUV because they do not transmit short wavelength photons. Therefore, 129206.doc 15 200848707 is generally used based on the reflective optical design of the mirror rather than the lens. The optical design in νυν is further complicated by the thin contamination layer that is naturally formed on virtually all optical surfaces. These contaminants are absorbable at the end of the month b and may have a large effect on the optical flux. This phenomenon in νυν combined with the reduced efficiency exhibited by the radix reflexes necessitates system design with a minimum number of optical surfaces. As a result, composite optical configurations that are successfully used at longer wavelengths cannot be simply modified for use in νυν. Therefore, a helium spectrometer based on a two-way configuration is sometimes not suitable for use in νυν. As described in more detail below, a spectrometer utilizing a single pass configuration is provided in FIG. In this configuration, the light passes through the body of the crucible one-way, as opposed to the multi-pass configuration of the body of the lens twice or more. Therefore, as shown in Fig. 3, light is transmitted from one of the incident surfaces of the crucible to one of the exit surfaces of the crucible without passing through the crucible in multiple passes. The νυν shot is strongly absorbed by oxygen and moisture. It follows that the excitation of these objects must be maintained at a sufficiently low level to permit transmission of νυν or lower wavelengths in the νυν optical instrument. This can be achieved by using a vacuum, purification or backfilling method in combination with a hermetic housing that houses the optical components of the system. In the case of purification or backfilling techniques, gases such as nitrogen, argon or helium may be used with high purity which does not absorb (at least in the wavelength region of interest). A schematic representation of an efficient, compact spectrometer 300 that overcomes the shortcomings of prior art designs and is suitable for operation in VUV is presented in FIG. Figure 3 Light " The instrument uses an optical component that separates, unfolds, or disperses light into spatially separated wavelengths in a compact spectrometer system. As shown in Fig. 3, the optical element is a prism 3 1 0 which is separated by light, 129206.doc -16 - 200848707, or dispersed into a plurality of spatially separated wavelengths. Although the 稜鏡 dispersion effect is utilized in FIG. 3, it will be seen that with respect to other embodiments provided herein, it is also possible to achieve separation, expansion, or dispersion of light by utilizing the diffraction properties of a diffraction grating. Space separation wavelengths. As is apparent from Figure 3, most of the system components are housed in an environmental control chamber 302. Light is coupled into the instrument via an entrance aperture 304. The aperture 3〇4 can be recessed in the vacuum compatible assembly 306_, which helps to couple the spectrometer to another environmental control body in a gastight manner. Although in principle the gas can be exchanged via the entrance aperture, the chamber can also be equipped with a dedicated gas disposal interface to facilitate this activity. The gas treatment interface 3〇7 also provides an effective mechanism for evacuating and/or backfilling the controlled environment in a timely manner. If operation is required under continuous flow of non-absorbed purge gas, the chamber may also be equipped with an optional purge valve (not shown). Light entering the instrument is collected by a reflective optics 3 〇 8 and the light is collimated. Collimating optics 308 limits the f-number or optical velocity of the instrument and works in conjunction with focusing optics 312 to define the resolution of the tool. In one embodiment of the instrument, the collimating optics are off-axis parabolic reflectors with a MgF2/A1 overcoat that are optimized for operation in VUV. In a particularly useful embodiment of the invention, the collimating optics 3〇8 are designed such that the off-axis or steering angle is 9 〇. Fast (f/2) off-axis parabolic mirror. This configuration simplifies the coupling of the spectrometer to an external optical system because the physical spacing between the entrance aperture and the dispersion enthalpy increases with respect to the smaller angular configuration. This consideration may be important in the case of fast (also ~ low f-number) optical design. 129206.doc 200848707. Light from the collimating optics is incident on the front side of the dispersing prism 3 〇. The germanium material can be selected such that it transmits the vuv photons. A particularly suitable material is LiF because it exhibits one of the shortest transmission cutoff wavelengths = and is not birefringent. Alternative tantalum materials having longer transmission cutoff wavelengths may include MgF2, CaF2, ring, squirrel, -, push fluorine to dissolve sulphur dioxide, smelting cerium oxide, quartz or other materials. The light passing through the 稜鏡310 is deflected. The skew angle is a function of the wavelength and depends on the geometry of the ridge, the angle of incidence, and the refractive index of the bismuth material. In this way, light of different wavelengths is emitted at different angles. Despite the reflection and transmission losses associated with the use of dispersive enthalpy, such elements are often more light efficient in ν υ ν than diffraction gratings. In addition, the germanium has a significantly smaller surface area than the grating, so that the small scattering of the line and the lower stray light are particularly important at vacuum ultraviolet wavelengths where the scattering cross section is often significantly increased. The light exiting the pupil is collected by a focusing optics 312 and focused to a detection of 314. In one embodiment, the focusing optics is also an off-axis parabolic reflection with an MgFVAl overcoat that is optimized for operation in VUV. In one embodiment, the off-axis parabolic mirror can be designed to The shaft angle or steering angle is about 6 (Γ. Although the use of smaller off-axis angles can improve imaging performance), it can also complicate the integration of the detector because the physical separation between the detection element and the dispersion 得以 is In an embodiment, the focusing optics 312 are selected and configured such that the focal plane is outside the boundary of the spectrometer housing to facilitate the acquisition of the 129206.doc 200848707 bond. Simple integration of the system. The system (ie, detectors, array components, and control electronics) is typically connected to a computer (not shown) that receives the measured spectrum. Any number of vuv sensitive instruments can be used in conjunction with the instrument. Detectors, but νυν photons are available. (4) Array detectors that provide a wide dynamic range are also preferred. In this respect, back-thinned, back-illuminated CCD detectors are particularly suitable. A charge-and-light coupling device f (CCD) is used to illuminate the front side of the plate; however, the coating (to lower the conversion of higher energy photons that would normally be absorbed in the polysilicon gate region) reduces the efficiency of the device by at least two cents. Alternatively, it can be combined with a conventional longer wavelength detector to use a microchannel plate (MCP) 为" to help enable the operation in νυν, f must be (4) components in the absence of oxygen and water absorbing substances In the environment, this can be easily accomplished by installing a predator such that the active surface of the forming element or array 402 as shown in Figure 4 shares a common environment with the body of the νυν spectrometer. As illustrated, Detecting that the H3U forms a hermetic connection to the outer surface 406 of the spectrometer chamber via a sealing mechanism 4〇4. In this manner, at least the detector 7G or array 402 of the detector is retained inside the common body of the spectrometer and via a The vacuum feedthrough socket is connected to its associated control circuit (located outside the manifold). The concern for degassing and contamination generally prevents the control circuit from being mounted inside the controlled environment. Brother In an alternative embodiment, speculation It can be mounted in an independently controlled environment such that, as shown in Figure 5, the presumping element or array 402 interfaces with the spectrometer body via a protective VUV transmissive window 5〇2. Cooling with a predator 129206.doc - In the case of 19-200848707, additional windows provide protection against unintentional exposure. Unfortunately, “the ghosting effect of the detector's reflection on moisture. In some configurations, this weight is very significant because The longer μ image effect can grow stronger signal may be from the surface of the detector reverse = shot away from the back side of the window and at the position corresponding to the shorter wavelength, the corresponding intensity may be much lower) re-shoot detection The resulting error, as described above, is shown in Figures 3 through 5 as a prior art device that causes the detector 314 to be fixedly attached to the outer wall of the spectrometer. In the 4th, and the evil, the precise alignment of the detector 3 14 with the optical path may be required. In order to provide the detection of λ 诙扒 1 ,, the alignment of the state is more simple, and it is necessary to make the detection n movable relative to the optical path. In an exemplary embodiment, the pain sensing elements or arrays are movably mounted such that the detecting elements (such as the detector array) can be adjusted relative to the optical path. Embodiments for movably mounting a detection element can include movably mounting the detection element within the body of the spectrometer. It may be desirable to provide the installation in such a way that the detection component is separated from at least some of the other components of the device. For example, some of the detection components, such as electronic circuits and boards, may not be vacuumed. In addition, although the detection elements can be relatively small, other components that are commercially available and that discriminate σσ are often relatively large. Larger components can cause hard mating because they can block other parts of the light path when using smaller human angles. Figure 6 presents an exemplary configuration in which the sensing element 6〇2 is internally mounted within the ^i control chamber 302. As is apparent from the figure, the detecting element 6〇2 is physically separated from the associated scorpion state 606 via a vacuum compatible cable assembly 604 and an electrical feedthrough configuration (129206.doc -20-200848707) The phonetic %, the detecting component 602 and the control electronics 606 are not necessarily drawn to scale I and are relatively large by the detecting electronics than the detecting component. The detecting element 6〇2 is placed on the adjustment mechanism to facilitate accurate alignment with the focal plane of the focusing optics. Separating the detection element attachment opening from the side wall of the spectrometer housing away from the 'knife greatly simplifies instrument alignment over miiu--the benefit is that it allows the element to be positioned much closer to the dispersive prism' thereby reducing focusing optics The off-axis angle of the device. , the fruit can achieve much improved imaging properties. Thus, as shown in Figure 6, a position-adjustable debt measuring component is provided. In addition, the position adjustable sub-test element is separated from at least some other detecting elements. The components (4), the associated control electronics 6〇6 and the vacuum-compatible electricity (4) into a wide range of parts can be constructed from a wide range of parts. In the f-exemplary embodiment, the windowless backside thinned CCD area image sensor (model S7) from Ham_su, Japan can be used for the integration component 602. The detector has a size of 24 576 _(8) χ j 392 _(7) and has 1024 (H) X 58 (V) pixels. Ha_atsu manufactures a wide variety of other suitable detections. UK's E2V also manufactures similar detector products, and other (4) devices are available from other suppliers. For example, an image sensor can be inserted - a socket constructed of a vacuum compatible material such as polyetheretherketone. The socket can be held in a moving optics mounting table, and the moving optics can adjust the translation and tilt of the b. The pins on the socket can be connected to the vacuum compatible electrical assembly 604. The conductor in the electrical winding can be constructed, for example, from a silver ore copper wire. The insulating material can be a non-shrinking FEP extruded Teflon that is coated and heat treated to minimize trapped gas. The cable assembly 6〇4 is then connected to a vacuum I29206.doc 200848707 Compatible electrical feedthrough that provides external (ie, outside of the controlled enclosure) for each of the wires in the cable. connection. The connection wiring on the outside (via the shielded cable) to the electronics of the control electronics 6〇6. The components of the control electronics component 606 (sensor preamplifiers, front end electronics, interface electronics, etc.) are commercially available from a number of suppliers including, for example, tec5 AG, Germany. Suitable control electronics are also manufactured by UK2 Spectr〇nic Devi Js Ltd. and other suppliers. The imaging performance of the instrument can be further improved by replacing the off-axis focusing optics with a parallax-corrected custom ring optic. This can result in improved imaging performance in the vertical direction of the detector plane (i.e., along the height of the detector), thereby enabling the use of detectors having smaller heights without compromising signal collection efficiency. The π- and πυν grating spectrometers are designed to achieve the benefits associated with internal detector installation. As illustrated in Figure 7, an aberration corrected flat field imaging grating element 7G2 can be combined with a human perforation and internally mounted side elements to produce a compact VUV spectrometer. Similar to the figure, the detection element 602 is coupled to its associated control electronics 606 via a vacuum compatible cable assembly 604. This instrument is expected to be superior in performance to conventional grating spectrometers due to its improved imaging performance and ability to accurately align the sensing elements. It is not expected that the instrument will provide a throughput that can be achieved from its counterpart, and that it may be advantageous to operate at a wavelength below the lowest transmission wavelength achievable by the instrument. Note that with respect to Figure 7, a grating-based system having light that approximates the normal human angle of the light relative to the light normal can be utilized. For example, an angle of incidence of less than about 3 degrees and more preferably less than 20 degrees can be utilized. 129206.doc -22- 200848707 The use of the detector allows the detection component 602 to be placed within the spectrometer even when used at these approximate normal angles, since the smaller detection component 602 is not Engaged with the transmissive interface of light from aperture 304 to optical thumb 702. Thus, in one embodiment, an angle of incidence of about 10 degrees can be used in the apparatus of Figure 7. An example of a representative effect b that can be achieved in a system similar to the system depicted in Figure 6 is presented in Figure 8 where 10 discrete wavelengths are in the range from 12 〇 nm to 220 nm (corresponding to a curve 802 of 12 〇 nm, a curve 804 corresponding to 130 nm, a curve 806 corresponding to 140 nm, a curve 808 corresponding to 150 nm, a curve 8 对应 corresponding to 160 nm, a curve 812 corresponding to pi) nm, Corresponding to the curve 814 of 180 nm, the curve 816 corresponding to 丨(10) nm, the curve 818 corresponding to 200 nm, the curve 820 corresponding to 22〇), the integral irradiation as a function of the position along the width of the detector ^ The integration is performed as a function of the detected southness (i.e., in a direction perpendicular to the direction in which the wavelength space separates). As is apparent from the figure, the peaks associated with individual wavelengths are well resolved across the width of the detector. A square with a width of 4 〇 mm and a 67-degree threshold is used in conjunction with the square U-meter entrance hole to achieve the results in the figure. For those skilled in the art. It will be appreciated that alternative embodiments of the present invention can be configured to facilitate: integration with other detector geometries. For example, other embodiments may be priced with a width having a length in the range of white, w as small as 1 mm, and up to 1 cm. Other geometric shapes, as well as many suitable divisions, can be used as described in b' π. Readings can be purchased from the UK e2V and Japan Hamamatsu's public 129206.doc -23- 200848707 to help ensure accurate results 'may need to minimize the so-called "stray light" effect. In a general sense, stray light can The light of the impact detector that does not have the particular wavelength is at a particular location (ie, which is in turn associated with a particular wavelength). Typically, the light is multi-colored and produced by a scattering process. A conventional method is to insert a light baffle (i.e., a beam baffle) in a closed position within the instrument to prevent scattered light from reaching the detector. Although not explicitly shown in the schematic representation of this disclosure, it is assumed Suitable separators are incorporated into the examples. It is well known to those skilled in the art to assist in determining optimal beam baffle placement by using commercially available ray tracing kit software. Some embodiments provide a VUV spectrometer that is suitable for use in conjunction with a multi-element detector for collecting data simultaneously at multiple wavelengths to reproduce a flat field image plane, but is familiar with this The skilled artisan will recognize that 'this instrument can be advantageously used in other applications. For example, if the array detector is replaced with an exit slit and a suitable sealing mechanism, the apparatus described herein can also be used as an effective VUV front monochromator. Further, if the instrument is further modified so that the crucible is mounted on a rotating table and contains the exit slit, the sealing mechanism is equipped with a VUV sensitive unit detector (such as a photoelectric L tube) The instrument can advantageously be used as a scanning monochromator. An example of this alternative embodiment is provided in Figure 9. Thus, for example, as shown in Figure 9, a scanning monochromator 9〇〇 There is a structure somewhat similar to that described with respect to the spectrometer of Fig. 3. However, a stack 904 is mounted on a rotary table 902. In addition, a single element detector 9〇6 is provided in an exit slit 9〇. 8 〇 . . . 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱 光谱Slot 304 and collimating optics 308. In this way, the instrument will It is easy to integrate with existing optical systems, with the limitation that these systems present a collimated input beam to the instrument. An example of this configuration is presented in Figure 1. As shown in Figure ,, a configuration is provided. To receive a light entrance 1002 that collimates the input beam 1004. As shown, the collimated input beam 1 〇〇 4 is then provided to 稜鏡 310 〇 as depicted in the figure, the light is connected to the instrument via a gastight manner The vacuum fitting 1006 of an existing optical system enters the spectrometer 1. The collimated light 1004 entering the spectrometer is dispersed by the crucible 310 and collected by the focusing optics 312 and focused onto the array 314. Due to the input beam Straight property, the alignment of the spectrometer with the existing optical system is significantly wider than the alignment in the embodiment of Figure 3 or Figure 6. This is because the configuration of Figure 10 will result in negligible signal loss due to the small translational alignment error between the spectrometer and its input beam source, and the need to accurately align the poly-t beam into a small perforation. Significant signal loss can occur in the system of Figure 3 or Figure 6 above. Therefore, the alignment tolerance requirements between the spectrometer and the external source will be reduced. This allows the spectrometer to be more easily integrated with other components of an optical metrology tool. In yet another embodiment of providing ease of alignment with an existing optical system, the spectrometer of Figure 10 can also be equipped with a focusing optic and an entrance aperture. An example of this embodiment is depicted in FIG. This configuration provides greater resolution control and concentrating capabilities than the instrument provided in Figure 1. The instrument of Figure 10 defines these properties depending on the characteristics of the optical system to which the spectrometer is coupled. Further, 129206.doc -25- 200848707 The collimated light 1004 entering the apparatus 1100 of Figure 11 is similar to that shown in Figure 10 via a vacuum coupling 1006 that connects the spectrometer to an existing optical system. Light is focused by a first focusing optics 11 〇 2 onto an entrance aperture 194. In one embodiment of the apparatus 11, the first focusing optics is an off-axis parabolic reflector having an outer coating of MgFVA1 that is optimized for operation in VUV. Light passing through the entrance aperture 1 1 〇 4 is received by a collimating optic 308, collimated, and directed toward the dispersion 稜鏡 31〇. Dispersed by prism 31

之光由一第二聚焦光學器件3丨2收集且聚焦於偵測其之偵 測器3 14之表面上。圖丨丨之光譜儀仍提供光譜儀與外部光 源之間的更寬容之對準容限。儘管需要第一聚焦光學器件 1102與入射孔1104之對準,但由於此等元件均形成於光譜 儀内’故可更易於控制該對準。因此,圖u說明—入射孔 之使用,其中光譜儀與外部光源之間的對準要求仍較不苛 刻。 在第-聚焦光學器件11〇2與準直光學器件3〇8均為離軸 抛物線鏡面的情況下意’該等光學器件之相對定向可 能係重要的。圖η中所描繪之旋轉對稱組態比起替代線對 稱組態(其中鏡面經定向以使得其位於同—抛物線表面上) -般係較佳的,此係由於與前者配置相關聯的較高收集效 率。 注意’圖7中所表示的且有内邱 、, /、有内邛女裝之偵測器的VUV像 差权正之光拇儀器亦可以一如在同1 1 # μ ^ 如為圖11之稜鏡儀器描繪的額 外聚焦光學器件組態。該細能s — 亥組恶展不於圖12中。如圖ι2中所 不,基於光柵之光譜儀12〇〇#畢 叫便早直先10〇4類似於如圖1〇中 129206.doc -26- 200848707 所示經由:將光譜儀連接至一現有光學系統的真空麵接件 1006進入儀器。類似於如圖11中所示,圖12之光由一第一 聚焦光學器件聚焦至一入射孔11〇4上。穿過入射孔 _之光接著遇到一像差校正之平場成像光柵元件加。 自光柵元件702’光被朝向一内部安裝之價測元件6〇2導向 以產生一緊湊VUV光譜儀1200。類似於圖6及圖7,偵測元 件602經由使用一真空相容電纜總成6〇4耗接至其相關聯之 控制電子器件606。The light is collected by a second focusing optics 3丨2 and focused on the surface of the detector 314 that detects it. The spectrometer of Figure 仍 still provides a more tolerant alignment tolerance between the spectrometer and the external source. Although the alignment of the first focusing optics 1102 with the entrance aperture 1104 is required, the alignment can be more easily controlled since these components are all formed within the spectrometer. Thus, Figure u illustrates the use of an entrance aperture where the alignment requirements between the spectrometer and the external source are still less critical. Where the first focusing optics 11 〇 2 and the collimating optics 3 〇 8 are off-axis parabolic mirrors, the relative orientation of the optical devices may be important. The rotationally symmetric configuration depicted in Figure n is preferred over an alternative line symmetry configuration in which the mirror is oriented such that it lies on the same parabolic surface, which is preferred due to the higher correlation associated with the former configuration. Collect efficiency. Note that the light-recognition instrument of the VUV aberration right as shown in Figure 7 and having the internal Qiu, /, and the detector of the inner 邛 women can also be the same as 1 1 # μ ^ as shown in Figure 11.额外 Extra focus optics configuration depicted by the instrument. The fine energy s — the group of evils is not shown in Figure 12. As shown in Fig. ι2, the grating-based spectrometer 12〇〇# is called 10早4, similar to the one shown in Figure 1〇, 129206.doc -26- 200848707. By: connecting the spectrometer to an existing optical system. The vacuum face piece 1006 enters the instrument. Similar to that shown in Fig. 11, the light of Fig. 12 is focused by a first focusing optics onto an entrance aperture 11〇4. The light passing through the entrance aperture _ then encounters an aberration corrected flat field imaging grating element addition. Light from the grating element 702' is directed toward an internally mounted measurement element 6〇2 to produce a compact VUV spectrometer 1200. Similar to Figures 6 and 7, detection element 602 is consuming to its associated control electronics 606 via the use of a vacuum compatible cable assembly 6〇4.

除提供改良之光學通量之外’相對於傳統vuv光譜儀設 計,本文中所述之技術提供產生—資料集之其他益處,該 資料集之光譜資容更好地利用在制真空料光譜技 術探測時經常由樣本展現的提高之量測回應。在反射比量 測之特定狀況下,㈣於在較長波長下收集之資料,vuv 中之較短波長資料可經常提供對材料性質之細微改變的鑑 別敏感性。此係許多材料之光學性mvuv巾較短波長下 比在較長波長下展現顯著多之結構的事實之直接結果。办 收集寬帶反射比資料集時,由此得出結論:在濱區中較 短波長下累積較多資料㈣應地在較長波長下累積較少資 料中將存在益處。以此方式,所收集資料集可比以線性色 散特性化之傳統資料集提供對樣本之性質之細微改 敏感指示。 為更好地說明此效應’考慮-沈積於-石夕基板上之15入 Si⑽膜的丽反射比光譜。—旦得以收集,所量測資料 之簡化便-般藉由結合用以描述包含樣本之材料之光學性 129206.doc -27- 200848707 質的一或多個模型來使用夫瑞奈方程式(Fresnel equation) 之某一形式而實現。通常,將所量測資料集與使用視關於 樣本之性質之一組參數而定的表達式而計算之資料集相比 較。所量測資料集與所計算資料集之間的差異藉由迭代地 調整該等參數之值直至達成充足一致的時間為止而最小 化。此差異通常按照一”擬合良度”(G〇F)參數量化。 圖13比較根據本文中所揭示之技術而使用一光栅光譜儀 及基於稜鏡之光譜儀收集的資料集之G0F參數之值(如為 膜之實際厚度處及周圍的一系列厚度所計算)。兩個光譜 儀均裝備有1024元件線性偵測器陣列。曲線13〇2說明用於 一基於光柵之光譜儀的資料且曲線1304說明用於一基於稜 鏡之光譜儀的資料。如圖中很顯然,相對於以光柵儀器獲 得之資料集,GOF參數之值對於與基於稜鏡之光譜儀相關 聯的資料集而言隨著移動離開膜之,,真實”厚度而顯著更快 地增加。此係因為SiON在較短波長下吸收更多且稜鏡光譜 儀比光栅光譜儀產生所量測光譜之短波長端在更大數目之 债測元件上色散的資料集。由於G0F曲線之斜率最終驅動 簡化過程至其最後結果,故來自稜鏡光譜儀之資料集將能 夠產生更準確之結果。因此,可認為由稜鏡光譜儀提供之 賓料集比其光拇對應物敏感。 儘管圖13之實例係關於對薄膜樣本執行之反射比量測, 但由本發明提供之增強之光譜資訊内容亦可用於其他 光譜應用中以便提供改良之量測能力。 因此,本文中所述之技術提供多種有利結果。舉例而 129206.doc -28 - 200848707 述可在真空紫外中執行中 的緊湊、古咚接处 竹厌尤。日刀析所利用 射^ 更特定言之,提供—特料合用於反 ==的νυν光譜分析系統以用於計量應用中。另外, 可用於一適合與一陣列侦測器一起使用之高通量 義中°亥阿通ΐ稜鏡光譜儀用以使νυν中及 之波長以產峰> 一 JU L X w 生大體上平場焦平面之方式而空間色散。 ^旦光譜分析系、统,其產生—具有空間分離之波長 刀里輪以束m經設計以使得該輸出光束之光譜 解析度緊4地匹配多色輸入光束内所含有之光譜資訊。 /此,如本文中所提供’描述若干有利概念。舉例而 吕’提供基於棱鏡之光譜儀及基於繞射光栅之光譜儀。另 (卜’描述不㈣測器配置。另外,提供將輸人光提供至光 。曰儀之不同技術。將認識到,此等概念中之每一者可單獨 地或與其他概念中之一或多者結合實施。因此,不必全部 起利用本文中所述之概念及優點以便利用本文中所述之 概念中的一或多者。 此外,儘管已關於VUV波長應用描述本文中所述之許多 技術,但將認識到,該等技術並不限於該等波長。因此, 本文中所述之概念可用於包括小於或大於νυν區的其他波 長區中。另外,本文中所述的特別適用於νυν區之許多優 點亦可同樣地適用於小於νυν區之波長區。 本文中所述之光譜儀技術可用於將得益於光譜儀之使用 的廣泛範圍之光學系統中。一該光學系統為反射儀。舉例 而吕’ 一可利用此等技術之特定類型之反射儀為νυν反射 129206.doc -29- 200848707 儀。一特別適合得益於本文中所述之方法之使用的νυν光 學計量儀器之實例揭示於下列案中:年9月23日申請 美國申。月案第10/668,642號,現美國專利第7,〇67,818 化〇4年7月3〇日申清之美國申請案第10/909,126號,現 美國料第7,126,131號;及扇時叫㈣巾請之美國申 各月木弟11/600 413號,該莖安4日 5寺案之揭示内容全部明確地以引 ( 用的方式併入本文中。泫計量儀器可為一特別經設計以在 廣泛範圍之波長(包括VUV)内操作的寬帶反射儀。 在圖η中呈現該儀器1400之一實例。如很顯然,源 1410光束凋即杈組M20、光學器件(未圖示)及光譜儀 1430係含有於一環丨兄控制儀器(或光學器件)腔室mm内。 光譜儀^30可經組態為以上所述之光譜儀類型中的任一 者。儘官圖14及圖15之反射儀經展示具有非準直輸入光, 但將d f’j ’提供至光譜儀之光可首先在提供至光譜儀之 前加以準直以使得以上所述之準直輸入光技術亦可適用藉 由圖14及圖15之反射儀來使用。樣本145〇、額外光學器件 1460、電動化台/樣本夾盤147〇(具有可選整合解吸器能力) 及參考樣本1455容納於一獨立環境控制樣本腔室14〇4中以 便使此夠裝載及卸載樣本而不會污染儀器腔室環境之品 質。儀器腔室及樣本腔室經由一許可發生光子之轉移及 (若如此係所要的)氣體之交換的可控耦接機構14〇6而連 接。儀器腔室1402與樣本腔室14〇4均連接至真空及淨化子 系統1475(其包括適當之真空連接件1476、閥、淨化連接 件1477及壓力計1478)以使得可在每一腔室中獨立地進行 129206.doc -30- 200848707 環境控制。 位於受控環境外側之處理器(未圖示)可用以協 屑及有助於自動化監視方法且分析所量測資料。認識到, 該處理為可為可提供合適之資料處理及/或所收集之資料 之儲存的廣泛種類計算構件中之任一者。 l吕未明白地展示於圖丨4中,但注意,系統可裝備有一 枝时人及其他相關聯之機械化組件來輔助以自動化方式裝 載及卸載樣本,藉此進一步增加量測通量。另外,如此項 技術中所已知,亦可結合樣本腔室利用裝載鎖定腔室以改 良環丨兄控制且增加用於互換樣本之系統通量。 在刼作中,來自源14 1〇之光經由光束調節模組142〇修改 且經由傳遞光學器件導向穿過耦接機構14〇6且導向至樣本 腔室1404中,在樣本腔室14〇4中,光由聚焦光學器件_ ♦焦至樣本1450上。自樣本145〇反射之光由聚焦光學器件 1460收集且經由耦接機構14〇6重導向出來其中,光由光譜 儀1430色散且由—如以上所述可具有在光譜儀内或搞接至 光譜儀之陣列的制器記錄。裝置之整個光徑維持於起作 用以移除吸收物質且許可VUV光子之透射的受控環境内。 在圖1 5中主現儀器之光學態樣的更詳細示意圖。儀器經 組態以在VUV及兩個額外光譜區中收集供參考之寬帶反射 比資料。在操作中,可以並行方式或串行方式獲得來自此 三個光譜區之光。當以串行方式操作時,首先獲得且參考 來自彻之反射比資料,其後收集且參考來自第二區及接 著第三區之反射比資料。一旦所有三個資料集得以記錄, 129206.doc -31- 200848707 〃便拼接在起以形成單一寬帶光譜。在並行操作中,在 資料拼接之前同時收集、參考且記錄來自所有三個區之反 射比資料。 儀器分離成兩個環境控制腔室(儀器腔室1402及樣本腔 至14〇4)。儀态腔室M02容納大多數系統光學器件且經常 佳地不曝路至大氣。樣本腔室14G4容納樣本及樣本及參考 光學為件,且經常性地打開以有助於改變樣本。舉例而 口 、儀器月工至1402可包括鏡面m-ι、M-2、M-3及M-4。内 翻式(Flip-in)鏡面FM_丨及FM_3可用以選擇性地挑選利用哪 一光源1501、1502及1503(各具有一不同光譜區)。内翻式 鏡面FM-2及FM-4可用以選擇性地挑選光譜儀15〇4、i5i6 及1514中之一者(再次視所挑選光譜區而定)。如在圖μ之 情況下,光譜儀1504、15 16及15 14可利用以上所述的包括 準直輸入光之技術。鏡面M_6、M_7、M_8及M_9可用以如 所示幫助導向光束。窗wq及W-2耦合儀器腔室14〇2與樣 本腔室1404之間的光。窗W_3、w_4、w_5&W-6將光耦合 至儀态腔室1402中及耦合出儀器腔室14〇2。光束分光器bs 及光閘S-1及S-2用以如所示在鏡面M_2&M-4之幫助下選擇 性地將光導向至一樣本1506或一參考1507(該參考在一實 施例中可為鏡面)。樣本光束穿過補償板cp。包括補償板 CP以消除在樣本與麥考路徑之間由於歸因於光束分光器之 操作性質在樣本通道中行進之光穿過光束分光器基板僅一 次,而在參考通道中行進之光穿過光束分光器基板三次的 事實而將出現之相位差。因此,補償板可由與光束分光器 129206.doc -32- 200848707 相同之材料建構且具有與光束分光器相同之厚度。此確保 行進穿過樣本通道之光亦穿過相同總厚度之光束分光器基 板材料。 當以串行方式操作時,首先藉由將第二光譜區内翻式源 鏡面FM-1及第三光譜區内翻式源鏡面fm-2切換至,,出,,位 置中以便允許來自VUV源之光由聚焦鏡面M-1收集、準直 且朝向光束分光器元件BS重導向來獲得VUV資料。使用一 近似平衡邁克生干涉儀(Michelson interferometer)配置來 將撞擊光束分光器之光分成兩個分量(樣本光束丨555及參 考光束1565)。樣本光束自光束分光器bs反射且穿過補償 板cp、樣本光閘s-丨及樣本窗W-1行進至樣本腔室中14〇4 中’在樣本腔室1404處’樣本光束經由一聚焦鏡面M-2重 導向且聚焦至樣本1506上。參考光閘S-2在此時間期間關 閉。樣本窗W-1由對於VUV波長充分透明以便維持高光學 通量的材料建構。 自樣本反射之光由樣本鏡面M-2收集、準直且重導向返 回穿過樣本窗,在此情況下,光穿過樣本光閘及補償板。 光接著不受第一光譜區内翻式偵測器鏡面FM-2及第二光级 區内翻式偵測器鏡面FM-4(切換至π出”位置)阻礙地繼續前 進’在此情況下,光由聚焦鏡面Μ-3重導向且聚焦至νυν 光譜儀15 14之入射狹縫上。此時,來自樣本光束之光由 VUV光譜儀色散且由其相關聯之偵測器記錄。 在收集樣本光束之後’量測參考光束。此藉由關閉樣本 光閘S-1及打開參考光閘S-2而實現。此使參考光束能夠穿 129206.doc -33- 200848707 過光束分光器BS、參考光閘s_2及參考窗w_2行進至樣本 腔室1404中,在樣本腔室丨4〇4處,光由鏡面M_4重導向且 聚焦至充當參考之平面參考鏡面15()7上。參考窗亦由對於 VUV波長充分透明以便維持高光學通量的材料建構。 自平面參考鏡面1 507之表面反射的光朝向聚焦參考鏡面 M-4行進返回,在聚焦參考鏡面M_4處,光得以收集、_ 直且穿過參考窗w_2及參考光閘s_2朝向光束分光器bs重 導向。光接著由光束分光器朝向聚焦鏡面M_3反射,在聚 焦鏡面M-3處,光重導向且聚焦至彻光譜儀i5i4之入射 狹縫。在環境控制腔室之每一者中,參考光束1565之路徑 長度可特別經設計以便匹配樣本光束丨555之路徑長度。In addition to providing improved optical fluxes, the techniques described herein provide additional benefits of generating-data sets relative to traditional vuv spectrometer designs. The spectral content of the data set is better utilized in vacuum material spectroscopy. The response is often measured by an increase in the sample presentation. In the specific case of reflectance measurements, (iv) for data collected at longer wavelengths, shorter wavelength data in vuvs often provide sensitivity to subtle changes in material properties. This is a direct result of the fact that the optical mvuv wipes of many materials exhibit a significantly more structure at shorter wavelengths than at longer wavelengths. When collecting broadband reflectance data sets, it was concluded that accumulating more data at shorter wavelengths in the coastal area (iv) would have benefits in accumulating less data at longer wavelengths. In this way, the collected data set provides a subtle change sensitivity indication of the nature of the sample over a conventional data set characterized by linear dispersion. To better illustrate this effect, consider the luminescence reflectance spectrum of a 15-into Si(10) film deposited on a slate substrate. Once collected, the simplification of the measured data is generally performed by combining one or more models used to describe the optical properties of the material containing the sample 129206.doc -27- 200848707 (Fresnel equation) ) is implemented in one form. Typically, the measured data set is compared to a data set calculated using an expression determined by a set of parameters relating to the nature of the sample. The difference between the measured data set and the calculated data set is minimized by iteratively adjusting the values of the parameters until a sufficient time is reached. This difference is usually quantified by a "fitness goodness" (G〇F) parameter. Figure 13 compares the values of the G0F parameters of a data set collected using a grating spectrometer and a krypton-based spectrometer according to the techniques disclosed herein (as calculated for a range of thicknesses at and around the actual thickness of the film). Both spectrometers are equipped with a 1024-element linear detector array. Curve 13 〇 2 illustrates data for a grating based spectrometer and curve 1304 illustrates data for a prism based spectrometer. As is apparent from the figure, the value of the GOF parameter relative to the data set obtained with the grating instrument is significantly faster and faster with respect to the data set associated with the 稜鏡-based spectrometer as it moves away from the film, the true "thickness" This is because SiON absorbs more at shorter wavelengths and the 稜鏡 spectrometer produces a data set that is scattered over a larger number of debt-measuring elements at the shorter wavelength end of the measured spectrum than the grating spectrometer. Due to the slope of the G0F curve, the final Driving the simplification process to its final result, the data set from the 稜鏡 spectrometer will be able to produce more accurate results. Therefore, it can be considered that the set of guest materials provided by the krypton spectrometer is more sensitive than its optical thumb counterpart. Although the example of Figure 13 The spectral reflectance measurements performed on the film samples are provided, but the enhanced spectral information provided by the present invention can also be used in other spectral applications to provide improved metrology capabilities. Accordingly, the techniques described herein provide a variety of advantageous results. For example, 129206.doc -28 - 200848707 describes the compact, ancient joints that can be executed in vacuum ultraviolet. More specifically, it provides a special νυν spectral analysis system for inverse == for metrology applications. In addition, it can be used in a high-throughput Yizhong that is suitable for use with an array detector. The Atong ΐ稜鏡 spectrometer is used to spatially disperse the wavelength of νυν neutralized by a peak > a JU LX w to generate a substantially flat field focal plane. The spectral analysis system, the system, which produces - has spatial separation The wavelength knife wheel is designed with a beam m such that the spectral resolution of the output beam closely matches the spectral information contained within the multi-color input beam. / /, as provided herein, describes a number of advantageous concepts. 'Providing a prism-based spectrometer and a spectrometer based on a diffraction grating. Another (describes not (four) detector configuration. In addition, it provides different technologies for providing input light to light. The instrument will recognize that in these concepts Each of these concepts can be implemented individually or in combination with one or more of the other concepts. Therefore, it is not necessary to fully utilize the concepts and advantages described herein in order to utilize one or more of the concepts described herein. Moreover, while many of the techniques described herein have been described in relation to VUV wavelength applications, it will be appreciated that such techniques are not limited to such wavelengths. Accordingly, the concepts described herein can be used to include other regions that are less than or greater than the νυν region. In the wavelength region, in addition, many of the advantages described herein that are particularly applicable to the νυν region can be equally applied to wavelength regions less than the νυν region. The spectrometer techniques described herein can be used to benefit from the wide use of spectrometers. In the range of optical systems, one of the optical systems is a reflector. For example, a specific type of reflector that can utilize these techniques is a νυν reflection 129206.doc -29- 200848707 instrument. One is particularly suitable for this article. An example of a νυν optical metrology instrument used in the method described is disclosed in the following: Application for US application on September 23, 2009. Lunar Case No. 10/668,642, now U.S. Patent No. 7, 〇67, 818, U.S. Application No. 10/909,126, which was filed on July 3, 2010, and U.S. Patent No. 7,126,131; At the time of the (four) towel, please apply for the United States to apply for the month of the brothers 11/600 413. The disclosure of the case of the 4th 5th Temple of the Stem is explicitly introduced in this article. The measuring instrument can be a special A broadband reflector designed to operate over a wide range of wavelengths, including VUV. An example of the instrument 1400 is presented in Figure η. As is apparent, the source 1410 beam is in the group M20, optics (not shown And the spectrometer 1430 is contained in a chamber mm of a loop control device (or optics). The spectrometer ^30 can be configured as any of the spectrometer types described above. Figure 14 and Figure 15 The reflectometer is shown to have non-collimated input light, but the light that provides d f'j ' to the spectrometer can be first collimated prior to being supplied to the spectrometer such that the collimated input light technique described above can also be applied by means of a map 14 and the reflector of Figure 15. Sample 145 〇, additional optics 1460 The motorized stage/sample chuck 147〇 (with optional integrated desorber capability) and the reference sample 1455 are housed in a separate environmental control sample chamber 14〇4 to enable loading and unloading of the sample without contaminating the instrument chamber The quality of the environment. The instrument chamber and the sample chamber are connected via a controllable coupling mechanism 14〇6 that permits the transfer of photons and, if so required, the exchange of gases. Instrument chamber 1402 and sample chamber 14 The crucible 4 is coupled to a vacuum and purge subsystem 1475 (which includes a suitable vacuum connector 1476, valve, purge connector 1477, and pressure gauge 1478) such that 129206.doc -30- can be independently performed in each chamber. 200848707 Environmental Control. Processors (not shown) located outside of the controlled environment can be used to assist with automated monitoring methods and to analyze measured data. It is recognized that this process can provide suitable data processing and / or any of a wide variety of computing components for the collection of data collected. l Lu is not clearly shown in Figure 4, but note that the system can be equipped with a man and other associated mechanization Components to assist in the automated loading and unloading of samples, thereby further increasing the throughput. Additionally, as is known in the art, the loading chamber can be utilized in conjunction with the sample chamber to improve loop control and increase In order to exchange the sample system flux, the light from the source 14 1〇 is modified via the beam conditioning module 142 and is guided through the coupling mechanism 14〇6 via the transfer optics and into the sample chamber 1404. In the sample chamber 14〇4, light is focused by the focusing optics _ ♦ onto the sample 1450. Light reflected from the sample 145 收集 is collected by the focusing optics 1460 and redirected out via the coupling mechanism 14 〇 6 Dispersion by spectrometer 1430 and by - as described above, can be recorded in the spectrometer or in an array of spectrometers. The overall optical path of the device is maintained within a controlled environment that acts to remove the absorbing material and permit transmission of VUV photons. A more detailed schematic diagram of the optical aspect of the instrument is shown in Figure 15. The instrument is configured to collect broadband reflectance data for reference in the VUV and two additional spectral regions. In operation, light from these three spectral regions can be obtained in parallel or in a serial manner. When operating in a serial manner, the reflectance data from the complete reflectance is first obtained and referenced, after which the reflectance data from the second zone and the third zone are referenced. Once all three data sets have been recorded, 129206.doc -31- 200848707 sputum spliced at the beginning to form a single broadband spectrum. In parallel operation, the reflectance data from all three zones are collected, referenced, and recorded simultaneously prior to data splicing. The instrument is separated into two environmental control chambers (instrument chamber 1402 and sample chamber to 14〇4). The state chamber M02 accommodates most of the system optics and is often well exposed to the atmosphere. The sample chamber 14G4 houses the sample and the sample and reference optics and is constantly opened to help change the sample. For example, the instrument and the monthly work to 1402 may include mirrors m-ι, M-2, M-3, and M-4. The Flip-in mirrors FM_丨 and FM_3 can be used to selectively select which of the light sources 1501, 1502, and 1503 (each having a different spectral region). Inverted mirrors FM-2 and FM-4 can be used to selectively select one of the spectrometers 15〇4, i5i6 and 1514 (depending on the selected spectral region). As in the case of Figure μ, spectrometers 1504, 15 16 and 15 14 may utilize the techniques described above including collimating input light. The mirrors M_6, M_7, M_8 and M_9 can be used to help guide the beam as shown. The windows wq and W-2 couple the light between the instrument chamber 14〇2 and the sample chamber 1404. The windows W_3, w_4, w_5 & W-6 couple the light into the state chamber 1402 and out of the instrument chamber 14〇2. The beam splitter bs and the shutters S-1 and S-2 are used to selectively direct light to the same 1506 or a reference 1507 with the aid of the mirror M_2 & M-4 as shown (this reference is in an embodiment) It can be mirrored). The sample beam passes through the compensation plate cp. A compensator plate CP is included to eliminate light traveling through the beam splitter substrate between the sample and the McCaw path due to the operational properties attributed to the beam splitter, while the light traveling through the reference channel passes through The phase difference will occur with the fact that the beam splitter substrate is three times. Therefore, the compensation plate can be constructed of the same material as the beam splitter 129206.doc -32- 200848707 and has the same thickness as the beam splitter. This ensures that light traveling through the sample channel also passes through the beam splitter substrate material of the same total thickness. When operating in a serial manner, first by switching the flip-source mirror FM-1 in the second spectral region and the flip-source mirror fm-2 in the third spectral region to, out, in position to allow from VUV The light of the source is collected by the focusing mirror M-1, collimated and redirected towards the beam splitter element BS to obtain VUV data. The light striking the beam splitter is split into two components (sample beam 555 and reference beam 1565) using an approximately balanced Michelson interferometer configuration. The sample beam is reflected from the beam splitter bs and travels through the compensator plate cp, the sample shutter s-丨 and the sample window W-1 into the sample chamber 14〇4 'at the sample chamber 1404' the sample beam is passed through a focus The mirror M-2 is redirected and focused onto the sample 1506. The reference shutter S-2 is turned off during this time. Sample window W-1 is constructed of a material that is sufficiently transparent to the VUV wavelength to maintain high optical flux. Light reflected from the sample is collected by the sample mirror M-2, collimated and redirected back through the sample window, in which case light passes through the sample shutter and compensator plate. The light is then prevented from proceeding without being obstructed by the flip detector mirror FM-2 in the first spectral region and the flip detector mirror FM-4 (switching to the π out position) in the second optical region. Next, the light is redirected by the focusing mirror Μ-3 and focused onto the entrance slit of the νυν spectrometer 15 14. At this point, the light from the sample beam is dissipated by the VUV spectrometer and recorded by its associated detector. After the beam, the reference beam is measured. This is achieved by closing the sample shutter S-1 and opening the reference shutter S-2. This enables the reference beam to pass through the 129206.doc -33-200848707 beam splitter BS, reference light The gate s_2 and the reference window w_2 travel into the sample chamber 1404 where the light is redirected by the mirror M_4 and focused onto the planar reference mirror 15() 7 serving as a reference. The reference window is also The VUV wavelength is sufficiently transparent to maintain high optical flux material construction. The light reflected from the surface of the plane reference mirror 1 507 travels back toward the focus reference mirror M-4, where the light is collected, _ straight and worn. Over the reference window w_2 and the reference shutter s_2 The beam splitter bs is redirected. The light is then reflected by the beam splitter towards the focusing mirror M_3, at the focusing mirror M-3, the light is redirected and focused to the entrance slit of the spectrometer i5i4. Each of the environmental control chambers The path length of the reference beam 1565 can be specifically designed to match the path length of the sample beam 丨 555.

C 、在量測彻資料集之後’以類似方式獲得第二光1普區資 料集。在收集第二區光譜資料期間,第二光譜區源内翻式 鏡面购與第二光譜區價測器内翻式鏡面FM-2均切換至 ”入”位置。結果’阻斷來自VUV源1501之光且允許來自第 二光譜區源1503之光在其由其聚焦鏡面m_6收隼、準直且 重導向之後穿過窗W·3。同樣地,將第二光_測器内 翻式鏡面鮮2切換至&quot;人”位置中將光自樣本光束(當打開 樣本光閘且關閉參考光閘時)及參考光束Μ㈣ 且關閉樣本光閘時)導向穿過相關聯之窗W-6且導向至將光 :焦至第二光譜區光譜儀⑽之入射狹縫上的鏡面Μ-9 :,在第二光譜區光譜儀1516處,光由其谓測器色散且收 票。 以類似方式藉由將笛—止4 由將弟二先瑨區源内翻式鏡面FM-3及第 129206.doc -34- 200848707 三光譜區偵測器内翻式鏡面1?]^-4翻”入&quot;同時將第二光譜區 源内翻式鏡面FM-1及第二光譜區偵測器内翻式鏡面 翻出來收集來自第三光譜區之資料。 一旦已執行對於光譜區中之每一者的樣本及參考量測, 便可使用一處理器(未圖示)來計算三個區中之每一者中的 供麥考之反射比光譜。最後,此等個別反射比光譜經組合 以產生涵蓋三個光譜區的單一反射比光譜。 當以並行模式操作時,以適當之光束分光器替換源内翻 式鏡面及偵測器内翻式鏡面以使得同時記錄來自所有三個 光譜區之資料。 圖14及圖15之系統可用作獨立工具或可與另一處理工具 整合。在一實施例中,圖14及圖15之系統可僅僅以允許在 一處理工具與計量工具樣本腔室之間傳送樣本的某一機構 附著至該處理J1具。在另—替代實施例中,樣本腔室可以 其在處理工具内得以共用以使得計量工具及處理工具可更 緊凑地整合在一起的方式建構。舉例而言,儀錶/光學器 件腔室可經由使用窗、閘閥或其他耦接機構與形成有處理 工具之樣本腔室連通。以此方式,樣本不需離開處理工具 之環境,相反,樣本可含有於處理工具之一區(諸如處理 腔室、傳送區或處理工具内之其他區)内。 鑒於本描述,熟習此項技術者將易見本發明之其他修改 及替代性實施例。因此,將本描述看作僅為說明性的且出 於教示熟習此項技術者執行本發明之方式的目的。應理解 的是,應將本文中所展示及描述的本發明之形式當^目前 129206.doc -35- 200848707 較佳之實施例。如熟習此項技術者在得益於本發明描述之 後將王邛易見,均等元件可代替本文中所說明及描述之元 件,且本發明之某些特徵可獨立於其他特徵之使用而加以 利用。 【圖式簡單說明】 圖1 —(先前技術)-羅蘭圓攝譜儀之示意表示。 圖2 -(先前技術)—稜鏡光譜儀之示意表示。 圖3 - VUV稜鏡光譜儀之示意表示。 圖4 -經組態以與光譜儀腔室共用受控環境的偵測器。 圖5 -以獨立受控環境組態之偵測器。 圖6 -具有與相關聯之控制電子器件分離之偵測器的 VUV稜鏡光譜儀之示意表示。 圖7 -具有内部安裝之偵測器的VUV像差校正之光柵光 譜儀之示意表示。 圖8 -偵測器對於對應於12〇 nm(左)、130 nm、140 nm、150 nm、160 nm、170 nm、180 nm、190 nm、200 nm及220 nm(右)之10個離散波長所接收的積分輻照度。 圖9 _具有旋轉台、出射狹縫及單元件偵測器之νυν單 色光鏡。 圖10 -不具有入射孔之VUV光譜儀的示意表示。 圖11-具有準直光入口之νυν光譜儀的示意表示。 圖12 -具有準直光入口之基於光柵之νυν光譜儀的示 意表示。 圖13 -以基於稜鏡之光譜儀設計及基於光柵之光譜儀 129206.doc -36- 200848707 設計獲得的反射比資料集之GOF對厚度之比較。對於沈積 於Si上之I5 A SiON膜使用1〇24元件偵測器獲得結果。 圖14 -反射儀之不意表示。 圖1 5 -反射儀之詳細示意表示 【主要元件符號說明】 101 凹光柵 102 光 103 光譜 104 羅蘭圓 105 入射狹縫 200 光 202 入射狹縫 204 第一透鏡 206 準直光束 208 色散稜鏡 210 第二透鏡 212 偵測器 300 光譜儀 302 環境控制腔室 304 入射孔 306 真空相容總成 307 氣體處置界面 308 反射光學器件/準直光學器件 310 稜鏡 129206.doc .37. 200848707 312 聚焦光學器件 314 偵測器 402 偵測元件或陣列 404 密封機構 406 外側表面 502 保護性VUV透射窗 602 偵測元件 604 真空相容電纜總成 606 控制電子器件 700 緊湊νυν光譜儀 702 像差校正之平場成像光柵元件 802 曲線 804 曲線 806 曲線 808 曲線 810 曲線 812 曲線 814 曲線 816 曲線 818 曲線 820 曲線 900 掃描單色光鏡 902 旋轉台 904 稜鏡 129206.doc -38- 200848707 906 單元件偵測器 908 出射狹縫 1000 光譜儀 1002 光入口 1004 準直輸入光束 1006 真空配件/真空耦接件 1100 儀器 1102 第一聚焦光學器件 1104 入射孑L 1200 光譜儀 1302 曲線 1304 曲線 1400 儀器 1402 環境控制儀器(或光學器件)腔室 1404 環境控制樣本腔室 1406 可控耦接機構 1410 源 1420 光束調節模組 1430 光譜儀 1450 樣本 1455 蒼考樣本 1460 額外光學器件/聚焦光學器件 1470 電動化台/樣本夾盤 1475 真空及淨化子系統 129206.doc -39- 200848707 1476 真空連接件 1477 淨化連接件 1478 壓力計 1501 光源 1502 光源 1503 光源 1504 光譜儀 1506 樣本 1507 參考/平面參考鏡面 1514 光譜儀 1516 光譜儀 1555 樣本光束 1565 參考光束 BS 光束分光器 CP 補償板 FM-1 内翻式鏡面 FM-2 内翻式鏡面 FM-3 内翻式鏡面 FM-4 内翻式鏡面 M-l 聚焦鏡面 M-2 聚焦樣本鏡面 M-3 聚焦鏡面 M-4 聚焦參考鏡面 M-6 聚焦鏡面 129206.doc -40- 200848707 M-7 鏡面 M-8 鏡面 M-9 鏡面 S-l 樣本光閘 S-2 參考光閘 W-l 樣本窗 W-2 參考窗 W-3 窗 W-4 窗 W-5 窗 W-6 窗 129206.docC. After measuring the data set, the second light 1 region data set is obtained in a similar manner. During the collection of the second region spectral data, the second spectral region source inversion mirror and the second spectral region inversion mirror FM-2 are switched to the "in" position. The result 'blocks light from the VUV source 1501 and allows light from the second spectral region source 1503 to pass through the window W·3 after it has been contracted, collimated, and redirected by its focusing mirror m_6. Similarly, the second photo-detector inverting mirror 2 is switched to the &quot;person&quot; position from the sample beam (when the sample shutter is opened and the reference shutter is closed) and the reference beam 四 (4) and the sample light is turned off The gate is guided through the associated window W-6 and directed to the mirror Μ-9 on the incident slit of the spectrometer (10) of the second spectral region (10), at the second spectral region spectrometer 1516, the light is It is said to be the dispersion of the detector and to collect the ticket. In a similar way, by using the flute-stop 4 from the second 瑨 瑨 瑨 source inverting mirror FM-3 and the 129206.doc -34- 200848707 three spectral region detector The mirror 1?]^-4 turns "in" and simultaneously dumps the second spectral region source inversion mirror FM-1 and the second spectral region detector inversion mirror to collect data from the third spectral region. Once the samples and reference measurements for each of the spectral regions have been performed, a processor (not shown) can be used to calculate the reflectance spectra for each of the three regions. Finally, these individual reflectance spectra are combined to produce a single reflectance spectrum covering the three spectral regions. When operating in parallel mode, the source inverting mirror and the detector inverting mirror are replaced with appropriate beam splitters to simultaneously record data from all three spectral regions. The system of Figures 14 and 15 can be used as a stand-alone tool or can be integrated with another processing tool. In one embodiment, the systems of Figures 14 and 15 can be attached to the process J1 only with a mechanism that allows the sample to be transferred between a processing tool and the metering tool sample chamber. In a further alternative embodiment, the sample chambers can be constructed in a manner that they can be shared within the processing tool to allow the metering tool and processing tool to be more compactly integrated. For example, the meter/optical device chamber can be in communication with a sample chamber formed with a processing tool via a window, gate valve, or other coupling mechanism. In this manner, the sample does not have to leave the processing tool environment; instead, the sample can be contained within an area of the processing tool (such as a processing chamber, a transfer area, or other area within the processing tool). Other modifications and alternative embodiments of the invention will be apparent to those skilled in the <RTIgt; Accordingly, the description is to be regarded as illustrative only and illustrative of the embodiments of the invention. It should be understood that the form of the invention as shown and described herein should be considered as a preferred embodiment of the present invention 129206.doc-35-200848707. As will be apparent to those skilled in the art after having the benefit of the description of the present invention, equivalent elements may be substituted for the elements illustrated and described herein, and certain features of the invention may be utilized independently of the use of other features. . BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 - (Prior Art) - Schematic representation of a Roland circular spectrograph. Figure 2 - (Prior Art) - Schematic representation of a helium spectrometer. Figure 3 - Schematic representation of the VUV helium spectrometer. Figure 4 - Detector configured to share a controlled environment with the spectrometer chamber. Figure 5 - Detector configured in an independently controlled environment. Figure 6 - Schematic representation of a VUV helium spectrometer with a detector separate from the associated control electronics. Figure 7 - Schematic representation of a VUV aberration corrected grating spectrometer with an internally mounted detector. Figure 8 - Detector for 10 discrete wavelengths corresponding to 12〇nm (left), 130 nm, 140 nm, 150 nm, 160 nm, 170 nm, 180 nm, 190 nm, 200 nm, and 220 nm (right) The integrated irradiance received. Figure 9 _ νυν single-color light mirror with rotating table, exit slit and single element detector. Figure 10 - Schematic representation of a VUV spectrometer without an entrance aperture. Figure 11 - Schematic representation of a νυν spectrometer with a collimated light entrance. Figure 12 - A schematic representation of a grating-based νυν spectrometer with a collimated light entrance. Figure 13 - Comparison of GOF versus thickness for a reflectance data set designed with a ruthenium based spectrometer and a grating based spectrometer 129206.doc -36- 200848707. The results were obtained using a 1〇24 element detector for the I5 A SiON film deposited on Si. Figure 14 - Unintentional representation of the reflectometer. Figure 1 5 - Detailed schematic representation of the reflector [Main component symbol description] 101 concave grating 102 light 103 spectrum 104 Roland circle 105 incident slit 200 light 202 incident slit 204 first lens 206 collimated beam 208 dispersion 稜鏡 210 Two lenses 212 detector 300 spectrometer 302 environmental control chamber 304 entrance aperture 306 vacuum compatible assembly 307 gas treatment interface 308 reflective optics / collimation optics 310 稜鏡 129206.doc .37. 200848707 312 focusing optics 314 Detector 402 Detecting Element or Array 404 Sealing Mechanism 406 Outer Surface 502 Protective VUV Transmissive Window 602 Detecting Element 604 Vacuum Compatible Cable Assembly 606 Control Electronics 700 Compact νυν Spectrometer 702 Aberration Corrected Flat Field Imaging Grating Element 802 Curve 804 Curve 806 Curve 808 Curve 810 Curve 812 Curve 814 Curve 816 Curve 818 Curve 820 Curve 900 Scan Monochrome 902 Rotary Table 904 稜鏡 129206.doc -38- 200848707 906 Single Component Detector 908 Exit Slit 1000 Spectrometer 1002 light entrance 1004 collimated input light 1006 Vacuum Accessories/Vacuum Couplings 1100 Instrument 1102 First Focusing Optics 1104 Incident 孑L 1200 Spectrometer 1302 Curve 1304 Curve 1400 Instrument 1402 Environmental Control Instrument (or Optics) Chamber 1404 Environmental Control Sample Chamber 1406 Controllable Coupling Mechanism 1410 Source 1420 Beam Conditioning Module 1430 Spectrometer 1450 Sample 1455 Cang Sample 1460 Additional Optics / Focusing Optics 1470 Motorized Table / Sample Chuck 1475 Vacuum and Purification Subsystem 129206.doc -39- 200848707 1476 Vacuum Connector 1477 Purification Connector 1478 Pressure Gauge 1501 Light Source 1502 Light Source 1503 Light Source 1504 Spectrometer 1506 Sample 1507 Reference / Plane Reference Mirror 1514 Spectrometer 1516 Spectrometer 1555 Sample Beam 1565 Reference Beam BS Beam Splitter CP Compensation Plate FM-1 Inverted Mirror FM-2 Flip mirror FM-3 flip mirror FM-4 flip mirror Ml focusing mirror M-2 focusing sample mirror M-3 focusing mirror M-4 focusing reference mirror M-6 focusing mirror 129206.doc -40- 200848707 M -7 Mirror M-8 Mirror M-9 Mirror Sl This optical shutter S-2 W-l shutter reference sample window reference window W-2 W-3 W-4 window windows W-5 W-6 windows the window 129206.doc

Claims (1)

200848707 十、申請專利範圍: 1 · 一種光譜儀,其包含: 至少一稜鏡,其接收準直光且使該準直光色散為多個 空間分離之光波長,該至少一稜鏡用於一單程組態中; • 一第一光學器件,其自該稜鏡接收該準直光且將其聚 焦至一焦平面上;及 陣列彳貞測器’其位於该焦平面處,該陣列偵測器同 時收集該多個空間分離之光波長。 f 2 ·如明求項1之光譜儀’其中該稜鏡係含有於一環境控制 腔室中。 3·如請求項2之光譜儀,其中該環境控制腔室經充分控制 以允許深UV波長以下之波長的透射。 4· 如請求項2之光譜儀,其中由該稜鏡接收之該準直光包 括深UV光波長以下之波長。 5·如請求項4之光譜儀,其中該第一光學器件係一反射光 學器件。 6.如請求項1之光譜儀,其中該第一光學器件係一反射光 學器件。 7· 如請求項1之光譜儀,其進一步包含: 一第一孔,入射光聚焦穿過該第一孔;及 弟一光學器件’其接收S入射光且使該入射光準直 以形成該準直光。 8·如請求項7之光譜儀,其中該第一孔係一接收提供至該 光譜儀之輸入入射光的入射孔。 129206.doc 200848707 9·如請求項7之光譜儀,其中由該稜鏡接收之該準直光包 括深UV光波長以下之波長。 10·如請求項9之光譜儀,其中該第一光學器件及該第二光 學器件中之至少一者係一反射光學器件。 11·如請求項7之光譜儀,其中該第一光學器件及該第二光 學器件中之至少一者係一反射光學器件。 1 2 ·如請求項7之光譜儀,其中該第一光學器件及該第二光 學器件均為反射光學器件。 13.如請求項7之光譜儀,其進一步包含: 一準直光入射孔,其接收提供至該光譜儀之輸入準直 光,及 一第三光學器件,其接收該輸入準直光且將該輸入準 直光聚焦至該第一孔上。 14·如請求項13之光譜儀,其中由該稜鏡接收之該準直光包 括深UV光波長以下之波長。 15·如請求項14之光譜儀,其中該第一光學器件、該第二光 學器件及該第三光學器件中之至少一者係一反射光學器 件。 16.如請求項13之光譜儀,其中該第一光學器件、該第二光 學器件及該第三光學器件中之複數者係反射光學器件。 17·如請求項13之光譜儀,其中該第一光學器件、該第二光 學器件及該第三光學器件皆為反射光學器件。 18·如請求項13之光譜儀,其中該第一孔及該第三光學器件 、口疋方式位於該光譜儀内’且輸入準直光之使用允 129206.doc 200848707 m瑨儀與一提供該輸入準直光之外部光源之間的較 大對準容限。 19.如請求項1之光譜儀,1 φ兮淮古、卜β上 , 凡曰m具中忒準直先係自提供至該光譜 儀之非準直輸入光在該光譜儀内得以準直。 20·如請求項1之光譜儀,直φ兮淮古&amp; ,么上 9 m 具干遑準直先係在該光譜儀外部 得以準直且作為準直輸入光提供至該光譜儀。 21·如請求項丨之光譜儀,其中該陣列偵測器係可移動的。 22· 一種反射儀,其用於處理至少包括深1;¥波長以下之波長 的光波長,該反射儀包含: 一光源,其產生至少包括深uv波長以下之波長的光波 長;及 光邊儀’其用於接收自該光源產生且自一樣本反射 的該光,該光譜儀包含: 至少一稜鏡,其接收準直光且使該準直光色散為多 個空間分離之光波長; 一第一光學器件,其自該稜鏡接收該準直光且將該 準直光聚焦至一焦平面上;及 一陣列偵測器,其位於該焦平面處,該陣列偵測器 同時收集該多個空間分離之光波長。 23 ·如請求項22之反射儀,其中該光譜儀進一步包含·· 一第一孔,入射光聚焦穿過該第一孔;及 一第二光學器件,其接收該入射光且使該入射光準直 以形成該準直光。 24.如請求項23之反射儀,其中該第一光學器件及該第二光 129206.doc 200848707 學器件為反射光學器件。 25 ·如請求項23之反射儀,其進一步包含: 一準直光入射孔,其接收提供至該光譜儀之輸入準直 光;及 一第三光學器件,其接收該輸入準直光且將該輪入準 直光聚焦至該第一孔上。 26·如請求項25之反射儀,其中該第一光學器件、該第二光 學器件及該第三光學器件為反射光學器件。 27·如請求項22之反射儀,其中該準直光係自提供至該光言致 儀之非準直輸入光在該光譜儀内得以準直。 28·如請求項22之反射儀,其中該準直光係在該光譜儀外部 得以準直且作為準直輸入光提供至該光譜儀。 29.如請求項22之反射儀,其中該至少一稜鏡係用於一單程 組態中。 3 0· —種經由光譜分析技術分析光的方法,其包含: 在一環境控制腔室内提供處於真空紫外(VUV)波長範 圍或以下範圍之光; 以一稜鏡使該光色散;及 以一偵測器陣列接收該色散光之多個空間分離之波 長。 3 1 ·如請求項30之方法,其中該光係在一含有該稜鏡之光譜 儀内得以準直。 32·如請求項30之方法,其中該光係在一含有該稜鏡之光譜 儀外部得以準直。 129206.doc 200848707 33. 如請求項30之 方 法, 其 中 該光係自該稜 鏡 經由一第一 反 射光學器件導 向 至該偵 測 器陣列。 34. 如請求項33之 方 法, 其 中 該光係經由一 第 二反射光學 器 件朝向該稜鏡 導 向0 35. 如請求項30之 方 法, 其 中 該光係經由一 第 一反射光學 器 件朝向該稜鏡 導 向。 36. 如請求項30之方 法, 其 中 該偵測器陣列係可移動的。 37. 一種光譜儀, 其 包含 : 至J 一光學元件,其接收光且使該光分離以使得該光 之不同波長得以空間分離;及 一陣列偵測器,其位於一受控環境内且位於該等不同 門刀離之光波長之一焦平面處以便偵測該等不同空間 刀離之光波長,該陣列偵測器係可調整的以有助於該陣 列债測器相對於該焦平面之對準。 38·如請求項37之光譜儀,其中該陣列偵測器係含有於該光 Q 譜儀之—腔室内。 39.如明求項37之光譜儀,其中該陣列偵測器之位置之調整 並不改變該受控環境之一體積。 4〇·=請求項39之光譜儀,其中該陣列偵測器輕接至位於該 • 叉控環境外側的偵測電子器件。 41 ·如明求項39之光譜儀,其中該光譜儀之一環境經充分控 制以允許深UV波長以下之波長的透射及偵測。 女明求項37之光譜儀,其中該光學元件係一稜鏡。 43 · 士明求項37之光譜儀,其中該光學元件係-繞射光柵。 129206.doc 200848707 44. 如請求項37之光譜儀’其中由該光學元件接收之該光包 括深UV光波長以下之波長。 45. 如請求項37之光譜儀,其中由言亥光學元件接收之該光係 準直的。 46. 如請求項45之光譜儀,其中由該光學元件接收之該準直 光包括深UV光波長以下之波長。 47·如清求項37之光譜儀,其中該p車列偵_器轉接至位於該 受控環境外側的偵測電子器件。 48· —種光譜儀,其包含: 一光路,其包括至少一光學元件; 一可調整陣列偵測器,其位於該光路之一焦平面處, 該可調整陣列偵測器位於該光路中之一在該至少一光學 凡件之後之點處,該可調整陣列偵測器偵測提供於該焦 平面處之光,該陣列偵測器係可調整的以有助於該陣列 偵測器相對於該焦平面之對準;及 一封閉體,其在該光譜儀内,該封閉體完全環繞該可 調整陣列偵測器。 49·如叫求項48之光譜儀,其中該可調整陣列偵測器耦接至 位於該光譜儀之該封閉體外側的偵測電子器件。 5 士明求項49之光错儀,其中該光譜儀之該封閉體經充分 控制以允許深UV波長以下之波長的透射及偵測。 5 1 ·如请求項48之光譜儀,其中該光譜儀之該封閉體經充分 控制以允許深UV波長以下之波長的透射及偵測。 52·如請求項51之光譜儀,其中由該光學元件接收之光係準 129206.doc 200848707 直的。 53·如明求項52之光譜儀,其中該光學元件係一棱鏡。 54·如明求項52之光譜儀,其中該光學元件係一繞射光柵。 55.如明求項48之光譜儀,其中由該光學元件接收之光包括 深UV光波長以下之波長。 56·如明求項48之光譜儀,其中由該光學元件接收之光係準 直的。200848707 X. Patent Application Range: 1 · A spectrometer comprising: at least one turn that receives collimated light and disperses the collimated light into a plurality of spatially separated wavelengths of light, the at least one being used for a single pass In the configuration; • a first optical device that receives the collimated light from the chirp and focuses it onto a focal plane; and an array detector that is located at the focal plane, the array detector The plurality of spatially separated light wavelengths are simultaneously collected. f 2 . The spectrometer of claim 1 wherein the lanthanide is contained in an environmental control chamber. 3. The spectrometer of claim 2, wherein the environmental control chamber is sufficiently controlled to permit transmission of wavelengths below the deep UV wavelength. 4. The spectrometer of claim 2, wherein the collimated light received by the crucible comprises a wavelength below a wavelength of deep UV light. 5. The spectrometer of claim 4, wherein the first optical device is a reflective optical device. 6. The spectrometer of claim 1, wherein the first optical device is a reflective optical device. 7. The spectrometer of claim 1, further comprising: a first aperture through which the incident light is focused; and an optical device that receives S incident light and collimates the incident light to form the alignment Straight light. 8. The spectrometer of claim 7, wherein the first aperture receives an entrance aperture for input incident light to the spectrometer. The spectrometer of claim 7, wherein the collimated light received by the crucible comprises a wavelength below a wavelength of deep UV light. 10. The spectrometer of claim 9, wherein at least one of the first optical device and the second optical device is a reflective optical device. 11. The spectrometer of claim 7, wherein at least one of the first optical device and the second optical device is a reflective optical device. The spectrometer of claim 7, wherein the first optical device and the second optical device are reflective optics. 13. The spectrometer of claim 7, further comprising: a collimated light entrance aperture that receives input collimated light provided to the spectrometer, and a third optical device that receives the input collimated light and inputs the input The collimated light is focused onto the first aperture. 14. The spectrometer of claim 13 wherein the collimated light received by the crucible comprises a wavelength below a wavelength of deep UV light. 15. The spectrometer of claim 14, wherein at least one of the first optical device, the second optical device, and the third optical device is a reflective optical device. 16. The spectrometer of claim 13, wherein the plurality of the first optical device, the second optical device, and the third optical device are reflective optics. 17. The spectrometer of claim 13, wherein the first optical device, the second optical device, and the third optical device are all reflective optics. 18. The spectrometer of claim 13, wherein the first hole and the third optical device and the port method are located in the spectrometer and the input collimated light is used 129206.doc 200848707 m Large alignment tolerance between external sources of direct light. 19. The spectrometer of claim 1, 1 φ 兮 Huai Gu, 卜 β, 曰 具 具 忒 忒 忒 忒 忒 忒 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 20. The spectrometer of claim 1 is straight φ 兮 兮 & , 么 么 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 21. A spectrometer as claimed, wherein the array detector is moveable. 22. A reflectometer for processing a wavelength of light comprising at least a wavelength of > 1 wavelength below the wavelength, the reflectometer comprising: a light source that produces a wavelength of light comprising at least a wavelength below a deep uv wavelength; and an edge meter 'It is for receiving the light generated from the light source and reflected from the same light, the spectrometer comprising: at least one turn that receives the collimated light and disperses the collimated light into a plurality of spatially separated light wavelengths; An optical device that receives the collimated light from the chirp and focuses the collimated light onto a focal plane; and an array detector located at the focal plane, the array detector simultaneously collecting the plurality of The spatially separated wavelength of light. The reflectometer of claim 22, wherein the spectrometer further comprises: a first aperture through which the incident light is focused; and a second optical device that receives the incident light and causes the incident light to Straight to form the collimated light. 24. The reflectometer of claim 23, wherein the first optical device and the second optical device are reflective optics. The reflector of claim 23, further comprising: a collimated light entrance aperture that receives input collimated light provided to the spectrometer; and a third optical device that receives the input collimated light and The wheeled collimated light is focused onto the first hole. 26. The reflectometer of claim 25, wherein the first optical device, the second optical device, and the third optical device are reflective optics. 27. The reflectometer of claim 22, wherein the collimated light is collimated within the spectrometer from the non-collimated input light provided to the optical detector. 28. The reflectometer of claim 22, wherein the collimated light is collimated outside the spectrometer and provided as collimated input light to the spectrometer. 29. The reflectometer of claim 22, wherein the at least one tether is used in a one-way configuration. 30. A method for analyzing light via a spectral analysis technique, comprising: providing light in a range of vacuum ultraviolet (VUV) wavelength range or below in an environmental control chamber; dispersing the light at a time; and The detector array receives a plurality of spatially separated wavelengths of the dispersive light. The method of claim 30, wherein the light is collimated in a spectrometer containing the crucible. 32. The method of claim 30, wherein the light system is collimated outside of a spectrometer containing the crucible. The method of claim 30, wherein the light is directed from the prism to the detector array via a first retroreflective optics. 34. The method of claim 33, wherein the light system is directed toward the crucible via a second reflective optic. 35. The method of claim 30, wherein the light system is oriented toward the crucible via a first reflective optic guide. 36. The method of claim 30, wherein the detector array is moveable. 37. A spectrometer comprising: to an optical component that receives light and separates the light such that different wavelengths of the light are spatially separated; and an array detector located in a controlled environment and located The array detector is adjustable to facilitate the array of the debt detector relative to the focal plane, such that the different doorknife is at a focal plane away from the wavelength of the light to detect the wavelength of the light from the different spaces. alignment. 38. The spectrometer of claim 37, wherein the array detector is contained within a chamber of the optical Q spectrometer. 39. The spectrometer of claim 37, wherein the adjustment of the position of the array detector does not change one of the volumes of the controlled environment. 4. The spectrometer of claim 39, wherein the array detector is lightly coupled to the detection electronics located outside of the forked environment. 41. The spectrometer of claim 39, wherein the environment of the spectrometer is sufficiently controlled to permit transmission and detection of wavelengths below the deep UV wavelength. The spectrometer of the invention 37, wherein the optical component is a glimpse. 43. The spectrometer of Shiming 37, wherein the optical element is a diffraction grating. 129206.doc 200848707 44. The spectrometer of claim 37, wherein the light received by the optical element comprises a wavelength below a wavelength of deep UV light. 45. The spectrometer of claim 37, wherein the light system received by the optical element is collimated. 46. The spectrometer of claim 45, wherein the collimated light received by the optical element comprises a wavelength below a wavelength of deep UV light. 47. The spectrometer of claim 37, wherein the p-trainer is transferred to detection electronics located outside of the controlled environment. 48. A spectrometer comprising: an optical path comprising at least one optical component; an adjustable array detector located at a focal plane of the optical path, the adjustable array detector being located in the optical path At an point after the at least one optical component, the adjustable array detector detects light provided at the focal plane, the array detector being adjustable to facilitate the array detector relative to The alignment of the focal plane; and an enclosure within the spectrometer that completely surrounds the adjustable array detector. 49. The spectrometer of claim 48, wherein the adjustable array detector is coupled to detection electronics located outside the enclosure of the spectrometer. 5 The optical error meter of claim 49, wherein the enclosure of the spectrometer is sufficiently controlled to allow transmission and detection of wavelengths below the deep UV wavelength. The spectrometer of claim 48, wherein the enclosure of the spectrometer is sufficiently controlled to permit transmission and detection of wavelengths below the deep UV wavelength. 52. The spectrometer of claim 51, wherein the light received by the optical element is 129206.doc 200848707 straight. 53. The spectrometer of claim 52, wherein the optical component is a prism. 54. The spectrometer of claim 52, wherein the optical component is a diffraction grating. 55. The spectrometer of claim 48, wherein the light received by the optical element comprises a wavelength below a wavelength of deep UV light. 56. The spectrometer of claim 48, wherein the light received by the optical element is collimated. Α如請求項56之光譜儀,其中該準直光係在該光譜儀内得 以準直。 如請求項56之光譜儀,其中該準直光係在該光譜儀外部 得以準直。 一種光譜儀,其用於處理包括深㈣波長以下之波長的光 波長,該光譜儀包含: 至少-光學元件,其接收包括波長以下之波長的 光,該光學元件將該光展開為多個空間分離之光波長;及 一可調整陣m貞測器’其接收該多個空間分離之光波 長,該可調整陣列偵測器係可移動的以使得該可調整陣 列偵測器可相對於該多個空間分離之光波長對準。 60.如請求項59之光譜儀,其中該可調整陣列偵測器係含有 於該光譜儀之-封閉腔室内且其中該可調整陣列她 之位置之調整並不改變該封閉腔室之一體積。 如請求項60之光㈣’其中該可調整陣列^貞測器轉接至 位於該光譜儀之該封閉腔室外側的偵測電子器件。 如請求項59之光譜儀,其中該光學元件係_二鏡。 58 59. 61 62 129206.doc 200848707 63. 如2求項外之光譜儀,其中該光學元件係一繞射光栅。 64. 如請求項59之光譜儀,其中由該光學元件接收之該光係 準直的D Μ如請求項Μ之光譜儀,其中該光譜儀經組態以接收在該 光譜儀外部準直之光。 種操作一光譜儀以使得一陣列偵測器可相對於該光譜 儀内之—光路對準的方法,其包含·· 上在该光譜儀内提供一内部空間,該光路至少部分地在 =亥内部空間内,該内部空間充分經環境控制以允許至少 部分地包括深UV波長以下之波長的光波長之透射及偵 測;及 &quot;周正δ亥陣列偵測器相對於該光路之位置, 八中&quot;亥光路之位置之調整不會更改該空間之一體積。 67·如請求項66之方法,其進一步包含: 將°亥陣列偵測裔耦接至偵測電子器件,該等偵測電子 裔件係位於該内部空間外側。 68. 如請求項67之方法,其中一稜鏡位於該光路内。 69. 如凊求項68之方法,其中由該稜鏡接收之光係準直的。 70. 如請求項67之方法,其中一繞射光栅位於該光路内。 7 士 °月求項70之方法,其中該光譜儀經組態以接收在該光 譜儀外部得以準直之光。 72· —種光譜儀,其包含: 入射口,其經組態以自一在該光譜儀外部之光源接 收光’該入射口接收準直光; 129206.doc 200848707 73. f . 至:一光學元件,其在光穿過該入射口之後自該光源 ^由3至乂 一光學元件接收之該光係準直的,該 光子70件使δ請接收準直光分離成多個空間分離之光波 長;及 車歹i偵測益,其經定位以同時收集該多個空間分離 之光波長。 如靖求項72之光譜儀’其中在該入射口處接收之該準直 光係在該至少-光學元件處得以接收而不被聚焦。 ι 74. 如請求項72之光譜儀,其進一步包含: -第-光學器件,其接收在該入射口處接收之該準直 光且將該準直光聚焦至一孔上;及 75. 一第二光學器件,其接收經由該孔提供之光且使該光 準直以形成由該至少一光學元件接收之該準直光。 如請求項74之光譜儀,其中該光學元件係一稜鏡。 76. 如:求項74之光譜儀,其中該光學元件係一繞射光柵。 t ?7· 78. 如請求項72之光譜儀,其中該光學元件係一稜鏡。 如2求項72之光譜儀,其中該光學元件係—繞射光概。 79. 如凊求項72之光譜儀,其中在該入射口處接收之該準直 光包括深UV光波長以下之波長。 ^ 80. t請求項72之光譜儀,其中該入射口係—用於耦接至一 又控環境的真空相容口。 81. 如請求項72之光譜儀,其中該陣列偵測器係可移動的。 82. 如請求項72之光譜儀,其中在該入射口處接收之該準直 光係自—反射儀提供。 129206.doc 200848707 83. 如请求項8 2之光譜儀’其中在該入射口處接收之該準直 光包括深UV光波長以下之波長。 84. 一種光譜儀,其包含: 準直光入射孔’其接收知·供至該光譜儀之輸入準直 光以為該光譜儀内之一光路提供光,該輸入準直光包括 深UV光波長以下之波長; 一光學元件,其在該光路内展開光;及 一偵測器,其接收該展開光。 85. 如明求項8 4之光譜儀’其中該债測器係一陣列债測器。 86. 如請求項85之光譜儀,其中該偵測器係一可移動陣列偵 測器。 ^ 87. 如請求項84之光譜儀,其中該偵測器係可移動的。 88. 如請求項84之光譜儀,其中該光學元件係一稜鏡。 89. 女叫求項8 8之光譜儀’其中該偵測器係一可移動陣列债 測器。 ' ο 90 · 91. 如请求項84之光譜儀,其中該光學元件係一繞射光栅。 如請求項89之光譜儀,其中該偵測器係一可移動陣列伯 測器。 ' ' 92. 士》月求項84之光譜冑,其中在準直&amp;人射孔處接收之該 輸入準直光係在該至少一光學元件處得以接收而不被聚 焦。 93. 如請求項84之光譜儀,其進一步包含: 二第〜光學器件,其接收在該準直光人射孔處接收之 μ别入準直光且將該輸入準直光聚焦至一第二孔上;及 129206.doc -10- 200848707 上:第二光學器件,其接收經由該第二孔提供之光且使 該光準直以形成由該至少一光學元件接收之該準直光。 94·如請求項93之光譜儀,其中該光學元件係一稜鏡。 95. 如請求項94之光譜儀,其中該偵測器係—可移動陣列 測器。 、 96. 如=求項93之光譜儀,其中該光學元件係一繞射光柵。 97. 如凊求項%之光譜儀,其中該偵測器係一可移動陣列 測器。 、 98· 士 π求項μ之光譜儀,其中在準直光入射孔處接收之該 準直光係自一反射儀提供。 99·如凊求項98之光譜儀,其中該光學元件係一稜鏡。 1〇〇·如晴求項99之光譜儀,其中該偵測器係—可移動陣列債 測器。 、 如凊求項98之光譜儀,其中該光學元件係—繞射光拇。 1〇2·如請求項101之光譜儀,其中該谓測器係一可移動陣列 偵測裔。 103· #改良—光譜儀與—將輸人光提供至該光譜儀之光學 系統之間的對準容限之方法,其包含: 將該光譜儀耦接至該光學系統;及 ;、將準直光作為光譜儀輸人光自該光學系統提供至該光 4儀以便提供該準直光之光路與該光譜儀之間的較大對 準容限。 104.如請求項103之方法’其中該光譜儀及該光學系統係以 一真空相容耦接件耦接。 129206.doc -11 - 200848707 1 05 ·如請求項1 〇3之方法 其中來自該光學系統之該準直光 包括深UV光波長以下之波長 1〇6·如請求項105之方法,其中該 其中該光學系統係一反射儀。 1〇7·如請求項103之方法,其中該光學系統係一反射儀。 1 0 8 ·如請求項1 07之方法,其中該光譜儀包括一使光分離成 多個空間分離之光波長的光學元件。 1〇9·如請求項1〇8之方法,其中該光學元件係一稜鏡。 η〇·如請求項109之方法,其中該偵測器係一可移動陣列偵 測器。 如請求項108之方法 如請求項111之方法 測器。A spectrometer of claim 56, wherein the collimated light system is collimated within the spectrometer. A spectrometer according to claim 56, wherein the collimated light system is collimated outside the spectrometer. A spectrometer for processing a wavelength of light comprising a wavelength below a deep (four) wavelength, the spectrometer comprising: at least an optical element that receives light comprising a wavelength below a wavelength, the optical element expanding the light into a plurality of spatially separated a wavelength of light; and an adjustable array of detectors that receive the plurality of spatially separated wavelengths of light, the adjustable array detector being movable such that the array of detectors is configurable relative to the plurality of The wavelength of the spatially separated light is aligned. 60. The spectrometer of claim 59, wherein the adjustable array detector is contained within an enclosed chamber of the spectrometer and wherein adjustment of the position of the adjustable array does not change a volume of the enclosed chamber. The light of claim 60 (four)' wherein the adjustable array detector is switched to the detection electronics located outside the closed cavity of the spectrometer. The spectrometer of claim 59, wherein the optical component is a second mirror. 58 59. 61 62 129206.doc 200848707 63. A spectrometer other than the one in which the optical element is a diffraction grating. 64. The spectrometer of claim 59, wherein the light system is collimated by the optical element, such as a spectrometer of claim ,, wherein the spectrometer is configured to receive light collimated externally of the spectrometer. A method of operating a spectrometer such that an array detector is alignable with respect to an optical path within the spectrometer, comprising: providing an internal space within the spectrometer, the optical path being at least partially within the interior of the interior The internal space is sufficiently environmentally controlled to allow transmission and detection of light wavelengths at least partially including wavelengths below the deep UV wavelength; and &quot;Zhou Zheng δ ray array detector relative to the position of the optical path, 八中&quot; The adjustment of the position of the Haiguang Road does not change the volume of one of the spaces. 67. The method of claim 66, further comprising: coupling the array of detected objects to the detection electronics, the detected electronic components being located outside of the interior space. 68. The method of claim 67, wherein one of the defects is located within the optical path. 69. The method of claim 68, wherein the light received by the raft is collimated. 70. The method of claim 67, wherein a diffraction grating is located within the optical path. The method of claim 70, wherein the spectrometer is configured to receive light that is collimated outside of the spectrometer. 72. A spectrometer comprising: an entrance port configured to receive light from a source external to the spectrometer 'the entrance port receives collimated light; 129206.doc 200848707 73. f. to: an optical component, The light is collimated from the light source from the light source to the first optical element, and the photon 70 is such that the δ receives the collimated light into a plurality of spatially separated light wavelengths; And the 歹i detection benefit is positioned to simultaneously collect the plurality of spatially separated light wavelengths. The collimator of the method 72, wherein the collimated light received at the entrance is received at the at least - optical element without being focused. The spectrometer of claim 72, further comprising: - a first optical device that receives the collimated light received at the entrance and focuses the collimated light onto a hole; and 75. A second optical device that receives light provided through the aperture and collimates the light to form the collimated light received by the at least one optical component. A spectrometer according to claim 74, wherein the optical element is a unit. 76. The spectrometer of claim 74, wherein the optical component is a diffraction grating. The ??. 78. The spectrometer of claim 72, wherein the optical element is a unit. A spectrometer of claim 72, wherein the optical component is a diffracted light. 79. The spectrometer of claim 72, wherein the collimated light received at the entrance comprises a wavelength below a wavelength of deep UV light. ^ 80. The spectrometer of claim 72, wherein the entrance port is a vacuum compatible port for coupling to a controlled environment. 81. The spectrometer of claim 72, wherein the array detector is moveable. 82. The spectrometer of claim 72, wherein the collimated light system received at the entrance is provided by a reflectometer. 129206.doc 200848707 83. The spectrometer of claim 8 wherein the collimated light received at the entrance comprises a wavelength below a wavelength of deep UV light. 84. A spectrometer comprising: a collimated light entrance aperture 'receiving an input collimated light supplied to the spectrometer to provide light to an optical path within the spectrometer, the input collimated light comprising a wavelength below a wavelength of deep UV light An optical component that emits light within the optical path; and a detector that receives the developed light. 85. The spectrometer of claim 8 wherein the debt detector is an array of debt detectors. 86. The spectrometer of claim 85, wherein the detector is a movable array detector. ^ 87. The spectrometer of claim 84, wherein the detector is moveable. 88. The spectrometer of claim 84, wherein the optical component is a unit. 89. The female operator is called the spectrometer of the item 8', wherein the detector is a movable array debt detector. </ RTI> 91. The spectrometer of claim 84, wherein the optical element is a diffraction grating. The spectrometer of claim 89, wherein the detector is a movable array detector. The spectrum of the '84.'s monthly finding 84, wherein the input collimated light received at the collimation &amp; man perforation is received at the at least one optical element without being focused. 93. The spectrometer of claim 84, further comprising: a second optical device that receives the collimated light received at the collimated light perforation and focuses the input collimated light to a second And 129206.doc -10- 200848707 Upper: a second optical device that receives light provided through the second aperture and collimates the light to form the collimated light received by the at least one optical component. 94. The spectrometer of claim 93, wherein the optical element is a unit. 95. The spectrometer of claim 94, wherein the detector is a movable array detector. 96. The spectrometer of claim 93, wherein the optical component is a diffraction grating. 97. If the spectrometer is a % of the spectrometer, wherein the detector is a movable array detector. The spectrometer of the π π 项 μ, wherein the collimated light received at the collimated light entrance aperture is provided by a reflectometer. 99. The spectrometer of claim 98, wherein the optical component is a unit. 1〇〇·如晴99 The spectrometer of the item 99, wherein the detector is a movable array debt detector. The spectrometer of claim 98, wherein the optical component is a diffractive optical thumb. 1. The spectrometer of claim 101, wherein the predator is a movable array of detectives. 103. A method for improving the alignment tolerance between an optical system of the spectrometer, comprising: coupling the spectrometer to the optical system; and; using collimated light as Spectrometer input light is supplied from the optical system to the light meter to provide a greater alignment tolerance between the optical path of the collimated light and the spectrometer. 104. The method of claim 103 wherein the spectrometer and the optical system are coupled by a vacuum compatible coupling. The method of claim 1 to 3, wherein the collimated light from the optical system comprises a wavelength below the wavelength of the deep UV light, and the method of claim 105, wherein the method The optical system is a reflectometer. The method of claim 103, wherein the optical system is a reflectometer. The method of claim 107, wherein the spectrometer comprises an optical element that separates light into a plurality of spatially separated wavelengths of light. The method of claim 1, wherein the optical component is one. The method of claim 109, wherein the detector is a movable array detector. The method of claim 108 is as in the method of claim 111. 可移動陣列偵 129206.doc -12-Removable array detection 129206.doc -12-
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